TW202113306A - Holding member, inspection mechanism, cutting device, manufacturing method of holding object and manufacturing method of holding member - Google Patents

Holding member, inspection mechanism, cutting device, manufacturing method of holding object and manufacturing method of holding member Download PDF

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TW202113306A
TW202113306A TW109113118A TW109113118A TW202113306A TW 202113306 A TW202113306 A TW 202113306A TW 109113118 A TW109113118 A TW 109113118A TW 109113118 A TW109113118 A TW 109113118A TW 202113306 A TW202113306 A TW 202113306A
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resin
holding
holding member
manufacturing
groove
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TW109113118A
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TWI737266B (en
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礒野早織
昔根鍋
宮田和志
高森雄大
石橋幹司
黄善夏
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日商Towa股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

Abstract

Provided is a holding member which can precisely perform edge detection of holding objects sucked and held respectively by a plurality of suction holes. The holding member holds a plurality of holding objects and is used for optical inspection. The holding member includes: a holding portion provided with a plurality of suction holes sucking to hold the holding objects and grooves arranged between the plurality of suction holes; and a reflection portion which is arranged in the grooves and has a higher reflection ratio than the holding portion, wherein the reflection portion has a flat surface.

Description

保持構件、檢查機構、切斷裝置、保持對象物的製造方法及保持構件的製造方法Holding member, inspection mechanism, cutting device, manufacturing method of holding object, and manufacturing method of holding member

本發明關於一種將保持對象物加以保持用於光學檢查的保持構件、使用保持構件的檢查機構及切斷裝置、使用切斷裝置的保持對象物的製造方法、以及保持構件的製造方法的技術。The present invention relates to a technique of a holding member for holding a holding object for optical inspection, an inspection mechanism and cutting device using the holding member, a method of manufacturing the holding object using the cutting device, and a method of manufacturing the holding member.

專利文獻1中公開了電子零件的外觀檢查裝置。所述電子零件的外觀檢查裝置檢測電子零件的被檢查部位的邊緣,基於所述邊緣的位置,測量被檢查部位的尺寸及判定其是否合格。所述電子零件的外觀檢查裝置的特徵在於包括:圖像輸入單元,從規定方向拍攝檢查零件;照明單元,能夠從與拍攝方向成銳角的至少兩個方向分別對檢查零件照射光;拍攝控制單元,根據利用照明單元產生的每個方向的光照射,使圖像輸入單元動作進行拍攝;及邊緣位置檢測單元,基於每個光照射獲得的圖像信號,檢測電極部的邊緣位置。Patent Document 1 discloses an appearance inspection device for electronic components. The visual inspection device of the electronic component detects the edge of the inspected portion of the electronic component, and based on the position of the edge, measures the size of the inspected portion and determines whether it is qualified. The appearance inspection device for electronic parts is characterized by including: an image input unit that photographs the inspection part from a prescribed direction; an illumination unit that can respectively irradiate the inspection part with light from at least two directions that form an acute angle with the photographing direction; and a photographing control unit According to the light irradiation in each direction generated by the lighting unit, the image input unit is operated to perform shooting; and the edge position detection unit detects the edge position of the electrode part based on the image signal obtained by each light irradiation.

習知技術文獻 專利文獻 專利文獻1:日本專利特開平8-184410號公報Known technical literature Patent literature Patent Document 1: Japanese Patent Laid-Open No. 8-184410

專利文獻1所公開的電子零件的外觀檢查裝置中,將照明器隔著相機的拍攝中心配置為左右對稱,從左側的照明器對檢查零件照射一方向的光,從右側的照明器對檢查零件照射另一方向的光。對來自兩個方向的照明所得的各圖像資料的亮度值進行比較,探索出因有無陰影及發色部而出現明暗差異的部分,檢測檢查零件的邊緣位置。然而,專利文獻1中,未記載用於由保持構件的多個吸附孔各自吸附保持的保持對象物的邊緣檢測。In the appearance inspection apparatus for electronic parts disclosed in Patent Document 1, the illuminator is arranged symmetrically across the imaging center of the camera, the inspection part is irradiated with light in one direction from the illuminator on the left, and the inspection part is irradiated from the illuminator on the right. Shine light in the other direction. The brightness value of each image data obtained from the illumination from two directions is compared, and the part where the difference in lightness and darkness occurs due to the presence or absence of shadows and color parts is explored, and the edge position of the inspection part is detected. However, in Patent Document 1, there is no description of edge detection for the holding object to be sucked and held by each of the plurality of suction holes of the holding member.

本發明是鑒於如上狀況而成,其所要解決的問題是提供一種能夠高精度地進行由多個吸附孔各自吸附保持的保持對象物的邊緣檢測的保持構件、檢查機構、切斷裝置、保持對象物的製造方法及保持構件的製造方法。The present invention is made in view of the above situation, and the problem to be solved is to provide a holding member, an inspection mechanism, a cutting device, and a holding object that can accurately perform edge detection of a holding object that is sucked and held by a plurality of suction holes. The manufacturing method of the object and the manufacturing method of the holding member.

本發明所要解決的問題如上所述,為了解決所述問題,本發明的保持構件保持多個保持對象物用於光學檢查,包括:保持部,設置有吸附保持所述保持對象物的多個吸附孔、及配置在多個所述吸附孔之間的槽;以及反射部,設置在所述槽,反射率比所述保持部高;且所述反射部具有平坦的表面。The problem to be solved by the present invention is as described above. In order to solve the problem, the holding member of the present invention holds a plurality of holding objects for optical inspection, and includes: a holding portion provided with a plurality of suction holding the holding objects A hole and a groove arranged between the plurality of suction holes; and a reflecting part provided in the groove and having a higher reflectivity than the holding part; and the reflecting part has a flat surface.

另外,本發明的檢查機構對由所述保持構件保持的所述保持對象物進行檢查。In addition, the inspection mechanism of the present invention inspects the holding object held by the holding member.

另外,本發明的切斷裝置包括:切斷機構,將切斷對象物加以切斷,獲得多個所述保持對象物;及所述檢查機構;利用所述檢查機構,對利用所述切斷機構所獲得的所述保持對象物進行檢查。In addition, the cutting device of the present invention includes: a cutting mechanism that cuts the cut object to obtain a plurality of the holding objects; and the inspection mechanism; The holding object obtained by the institution is inspected.

另外,本發明的保持對象物的製造方法使用所述切斷裝置製造所述保持對象物。In addition, the method of manufacturing the object to be held of the present invention uses the cutting device to produce the object to be held.

另外,本發明的保持構件的製造方法是一種保持構件的製造方法,所述保持構件保持多個保持對象物用於光學檢查,所述保持構件的製造方法包括:樹脂填充步驟,對於設置有槽的保持部,向所述槽中填充樹脂,所述槽配置在吸附保持所述保持對象物的多個吸附孔之間;及樹脂硬化步驟,使所述樹脂硬化。In addition, the method of manufacturing a holding member of the present invention is a method of manufacturing a holding member that holds a plurality of holding objects for optical inspection, and the method of manufacturing the holding member includes a resin filling step. The holding part of the resin is filled into the groove, and the groove is arranged between the plurality of suction holes for sucking and holding the holding object; and the resin hardening step is to harden the resin.

根據本發明,能夠高精度地進行由多個吸附孔各自吸附保持的保持對象物的邊緣檢測。According to the present invention, it is possible to accurately perform edge detection of the holding object adsorbed and held by each of the plurality of suction holes.

首先,使用圖1,對本實施方式的切斷裝置1的構成進行說明。在本實施方式中,例如對使用封裝基板P作為利用切斷裝置1的切斷對象物時的切斷裝置1的構成進行說明,所述封裝基板P是將安裝有半導體晶片的基板樹脂密封而成。First, using FIG. 1, the configuration of the cutting device 1 of the present embodiment will be described. In the present embodiment, for example, the configuration of the cutting device 1 when the package substrate P is used as the object to be cut by the cutting device 1, which is a resin-sealed substrate on which a semiconductor wafer is mounted, will be described. to make.

作為封裝基板P,例如使用球柵陣列(ball grid array,BGA)封裝基板、晶片尺寸封裝(chip size package,CSP)封裝基板、發光二極體(light emitting diode,LED)封裝基板等。另外,作為切斷對象物,不僅使用封裝基板P,有時也使用密封的導線架,所述密封的導線架是將安裝有半導體晶片的導線架(lead frame)樹脂密封而成。As the package substrate P, for example, a ball grid array (BGA) package substrate, a chip size package (CSP) package substrate, a light emitting diode (LED) package substrate, etc. are used. In addition, as the object to be cut, not only the package substrate P but also a sealed lead frame may be used. The sealed lead frame is formed by resin sealing a lead frame on which a semiconductor chip is mounted.

此外,以下,對於封裝基板P的兩面,分別將樹脂密封側的面稱為模面(mold face),將與模面相反側的面稱為焊球面(ball face)/導線面(lead face)。In addition, in the following, for both surfaces of the package substrate P, the surface on the resin sealing side is referred to as mold face, and the surface on the opposite side to the mold surface is referred to as ball face/lead face. .

切斷裝置1包括切斷模組A及檢查模組B作為構成要素。各構成要素相對於其它構成要素能夠裝卸且能夠更換。The cutting device 1 includes a cutting module A and an inspection module B as constituent elements. Each component is detachable and replaceable with respect to other components.

切斷模組A是主要進行封裝基板P的切斷的構成要素。切斷模組A主要包括基板供給部3、定位部4、切斷台5、主軸(spindle)6、搬送部7及控制部8。The cutting module A is a component that mainly performs cutting of the package substrate P. The cutting module A mainly includes a substrate supply unit 3, a positioning unit 4, a cutting table 5, a spindle 6, a conveying unit 7, and a control unit 8.

基板供給部3供給封裝基板P。基板供給部3從收容有多個封裝基板P的料盒(magazine)M逐片推出封裝基板P,向後述定位部4供給。將焊球面/導線面向上配置封裝基板P。The substrate supply unit 3 supplies the package substrate P. The substrate supply part 3 pushes out the package substrate P piece by piece from a magazine M in which a plurality of package substrates P are accommodated, and supplies it to the positioning part 4 described later. Place the package substrate P with the ball surface/wire facing upward.

定位部4對由基板供給部3供給的封裝基板P進行定位。定位部4將從基板供給部3推出的封裝基板P配置在軌道部4a進行定位。其後,定位部4將已定位的封裝基板P向後述切斷台5搬送。The positioning part 4 positions the package substrate P supplied from the substrate supply part 3. The positioning part 4 arranges and positions the package substrate P pushed out from the substrate supply part 3 on the rail part 4a. After that, the positioning unit 4 conveys the positioned package substrate P to a cutting table 5 described later.

切斷台5保持要切斷的封裝基板P。在本實施方式中,例示包括兩個切斷台5的雙切割台構成的切斷裝置1。在切斷台5,設置著保持構件5a,所述保持構件5a從下方吸附保持利用定位部4搬送來的封裝基板P。另外,在切斷台5,設置著能夠使保持構件5a向圖中θ方向旋轉的旋轉機構5b、及能夠使保持構件5a向圖中Y方向移動的移動機構5c。The cutting table 5 holds the package substrate P to be cut. In this embodiment, the cutting device 1 configured with a double cutting table including two cutting tables 5 is illustrated. The cutting table 5 is provided with a holding member 5 a that sucks and holds the package substrate P conveyed by the positioning portion 4 from below. In addition, the cutting table 5 is provided with a rotating mechanism 5b capable of rotating the holding member 5a in the θ direction in the figure, and a moving mechanism 5c capable of moving the holding member 5a in the Y direction in the figure.

主軸6將封裝基板P切斷,單片化成多個半導體封裝S(參照圖2的(a)、圖2的(b))。在本實施方式中,例示包括兩個主軸6的雙主軸構成的切斷裝置1。主軸6能夠向圖中X方向及Z方向移動。在主軸6,安裝著用於切斷封裝基板P的旋轉刀6a。The spindle 6 cuts the package substrate P and singulates it into a plurality of semiconductor packages S (see FIG. 2(a) and FIG. 2(b)). In this embodiment, the cutting device 1 having a dual-spindle configuration including two spindles 6 is exemplified. The main shaft 6 can move in the X direction and the Z direction in the figure. On the main shaft 6, a rotating knife 6a for cutting the package substrate P is installed.

在主軸6,設置著向高速旋轉的旋轉刀6a噴射切削水的切削水用噴嘴、噴射冷卻水的冷卻水用噴嘴、及噴射清洗切斷屑等的清洗水的清洗水用噴嘴(均未圖示)等。The main shaft 6 is provided with a cutting water nozzle that sprays cutting water to the rotating blade 6a rotating at a high speed, a cooling water nozzle that sprays cooling water, and a cleaning water nozzle that sprays cleaning water for cleaning cutting chips (all not shown) Show) etc.

切斷台5吸附封裝基板P後,利用第一位置確認相機5d確認封裝基板P的位置。其後,切斷台5以沿著圖中Y方向靠近主軸6的方式移動。當切斷台5移動到主軸6的下方後,使切斷台5與主軸6相對移動,由此切斷封裝基板P。每次利用主軸6切斷封裝基板P時,均利用第二位置確認相機6b確認封裝基板P的位置等。 此處,利用第一位置確認相機5d進行確認時,例如可以確認設置在封裝基板P的表示切斷位置的標記的位置。利用第二位置確認相機6b進行確認時,例如可以確認封裝基板P被切斷的位置、被切斷的寬度等。 此外,所述利用確認相機進行的確認也可以不使用第一位置確認相機5d,僅使用第二位置確認相機6b進行確認。After the cutting table 5 sucks the packaging substrate P, the position of the packaging substrate P is confirmed by the first position confirmation camera 5d. After that, the cutting table 5 moves so as to approach the main shaft 6 in the Y direction in the figure. After the cutting table 5 moves below the main shaft 6, the cutting table 5 and the main shaft 6 are moved relative to each other, thereby cutting the package substrate P. Every time the package substrate P is cut by the spindle 6, the position of the package substrate P and the like are confirmed by the second position confirmation camera 6b. Here, when confirming with the first position confirming camera 5d, for example, the position of the mark indicating the cutting position provided on the package substrate P can be confirmed. When confirming with the second position confirming camera 6b, for example, the position where the package substrate P is cut, the width of the cut, and the like can be confirmed. In addition, the confirmation using the confirmation camera may not use the first position confirmation camera 5d but only the second position confirmation camera 6b for confirmation.

切斷台5結束封裝基板P的切斷後,保持吸附著已單片化的多個半導體封裝S的狀態,以沿圖中Y方向離開主軸6的方式移動。此時,利用第一清潔器5e對半導體封裝S的上表面(焊球面/導線面)進行清洗及乾燥。After the cutting table 5 completes the cutting of the package substrate P, it maintains a state of adsorbing the plurality of singulated semiconductor packages S, and moves so as to move away from the main shaft 6 in the Y direction in the figure. At this time, the upper surface (ball surface/lead surface) of the semiconductor package S is cleaned and dried by the first cleaner 5e.

搬送部7向檢查模組B的檢查台11搬送半導體封裝S。搬送部7從上方吸附由切斷台5保持的半導體封裝S,向檢查模組B搬送。此時,利用第二清潔器7a對半導體封裝S的下表面(模面)進行清洗及乾燥。The transport unit 7 transports the semiconductor package S to the inspection table 11 of the inspection module B. The transport unit 7 sucks the semiconductor package S held by the cutting table 5 from above, and transports it to the inspection module B. At this time, the lower surface (mold surface) of the semiconductor package S is cleaned and dried by the second cleaner 7a.

控制部8控制切斷模組A的各部的動作。利用控制部8控制基板供給部3、定位部4、切斷台5、主軸6及搬送部7等的動作。另外,能夠使用控制部8任意變更(調整)切斷模組A的各部的動作。The control unit 8 controls the operation of each part of the cutting module A. The control unit 8 controls the operations of the substrate supply unit 3, the positioning unit 4, the cutting table 5, the spindle 6, the conveying unit 7, and the like. In addition, the operation of each part of the cutting module A can be arbitrarily changed (adjusted) using the control unit 8.

檢查模組B是主要進行半導體封裝S的檢查的構成要素。檢查模組B主要包括檢查台11、第一光學檢查相機12、第二光學檢查相機13、配置部14、抽取部15及控制部16。The inspection module B is a component that mainly performs inspection of the semiconductor package S. The inspection module B mainly includes an inspection table 11, a first optical inspection camera 12, a second optical inspection camera 13, a configuration unit 14, an extraction unit 15, and a control unit 16.

檢查台11保持半導體封裝S以進行光學檢查。檢查台11能夠沿著圖中X方向移動。另外,檢查台11能夠上下翻轉。在檢查台11設置有吸附保持半導體封裝S的保持構件100。The inspection station 11 holds the semiconductor package S for optical inspection. The inspection table 11 can move along the X direction in the figure. In addition, the inspection table 11 can be turned upside down. The inspection table 11 is provided with a holding member 100 that sucks and holds the semiconductor package S.

第一光學檢查相機12及第二光學檢查相機13對半導體封裝S的表面(焊球面/導線面及模面)進行光學檢查。第一光學檢查相機12及第二光學檢查相機13朝上配置在檢查台11附近。在第一光學檢查相機12及第二光學檢查相機13分別設置著能夠在檢查時照射光的照明裝置(未圖示)。The first optical inspection camera 12 and the second optical inspection camera 13 optically inspect the surface (ball surface/wire surface and mold surface) of the semiconductor package S. The first optical inspection camera 12 and the second optical inspection camera 13 are arranged in the vicinity of the inspection table 11 facing upward. The first optical inspection camera 12 and the second optical inspection camera 13 are each provided with an illumination device (not shown) capable of irradiating light during inspection.

第一光學檢查相機12對利用搬送部7搬送到檢查台11的半導體封裝S的模面進行檢查。其後,搬送部7將半導體封裝S載置於檢查台11的保持構件100。保持構件100吸附保持半導體封裝S後,檢查台11上下翻轉。檢查台11向第二光學檢查相機13的上方移動,利用第二光學檢查相機13對半導體封裝S的焊球面/導線面進行檢查。 例如,第一光學檢查相機12能夠檢查半導體封裝S的缺口或半導體封裝S上標示的文字等。另外,例如第二光學檢查相機13能夠檢查半導體封裝S的尺寸及形狀、焊球/導線的位置等。The first optical inspection camera 12 inspects the mold surface of the semiconductor package S transported to the inspection table 11 by the transport unit 7. After that, the transport unit 7 mounts the semiconductor package S on the holding member 100 of the inspection table 11. After the holding member 100 sucks and holds the semiconductor package S, the inspection table 11 is turned upside down. The inspection table 11 moves above the second optical inspection camera 13, and the second optical inspection camera 13 inspects the solder ball surface and the lead surface of the semiconductor package S. For example, the first optical inspection camera 12 can inspect the notch of the semiconductor package S or the characters marked on the semiconductor package S, and the like. In addition, for example, the second optical inspection camera 13 can inspect the size and shape of the semiconductor package S, the positions of solder balls/wires, and the like.

配置部14用於配置檢查結束的半導體封裝S。配置部14能夠沿著圖中Y方向移動。檢查台11將利用第一光學檢查相機12及第二光學檢查相機13的檢查結束的半導體封裝S配置於配置部14。The arranging unit 14 is used to arrange the semiconductor package S whose inspection has been completed. The arrangement part 14 can move along the Y direction in the figure. The inspection table 11 arranges the semiconductor package S that has been inspected by the first optical inspection camera 12 and the second optical inspection camera 13 in the arrangement portion 14.

抽取部15將配置在配置部14的半導體封裝S移送並收納到托盤。基於利用第一光學檢查相機12及第二光學檢查相機13獲得的檢查結果,區分良品與不良品,區分後的半導體封裝S利用抽取部15收納到托盤。此時,抽取部15分別將半導體封裝S中的良品收納到良品用托盤15a,將不良品收納到不良品托盤15b。當托盤中裝滿半導體封裝S時,適當供給另外的空托盤。The extraction part 15 transfers and stores the semiconductor package S arranged in the arrangement part 14 on the tray. Based on the inspection results obtained by the first optical inspection camera 12 and the second optical inspection camera 13, a good product and a defective product are distinguished, and the separated semiconductor package S is stored in the tray by the extraction part 15. At this time, the extraction unit 15 stores the good products in the semiconductor package S in the good product tray 15a and the defective products in the defective product tray 15b, respectively. When the tray is filled with semiconductor packages S, another empty tray is appropriately supplied.

控制部16控制檢查模組B的各部的動作。利用控制部16控制檢查台11、第一光學檢查相機12、第二光學檢查相機13、配置部14及抽取部15等的動作。另外,能夠使用控制部16任意變更(調整)檢查模組B的各部的動作。The control unit 16 controls the operation of each unit of the inspection module B. The control unit 16 controls the operations of the inspection table 11, the first optical inspection camera 12, the second optical inspection camera 13, the placement unit 14, the extraction unit 15, and the like. In addition, the operation of each unit of the inspection module B can be arbitrarily changed (adjusted) using the control unit 16.

如上所述,本實施方式的切斷裝置1能夠將封裝基板P切斷,單片化成多個半導體封裝S。As described above, the cutting device 1 of the present embodiment can cut the package substrate P and singulate it into a plurality of semiconductor packages S.

接下來,使用圖2的(a)、圖2的(b),對設置在檢查台11的保持構件100的構成進行說明。此外,以下將圖中所示的箭頭U、箭頭D、箭頭L、箭頭R、箭頭F及箭頭B所表示的方向分別定義為上方向、下方向、左方向、右方向、前方向及後方向來進行說明。另外,為了便於說明,將圖中所示的保持構件100適當簡化圖示。實際的保持構件100的構成(例如後述吸附孔111及吸附面113的個數、配置等)並不限於圖示。Next, the structure of the holding member 100 provided in the inspection table 11 is demonstrated using FIG. 2 (a) and FIG. 2 (b). In addition, the directions indicated by arrow U, arrow D, arrow L, arrow R, arrow F, and arrow B shown in the figure are defined as the upper direction, the lower direction, the left direction, the right direction, the front direction, and the rear direction, respectively. To explain. In addition, for convenience of description, the holding member 100 shown in the figure is appropriately simplified for illustration. The actual structure of the holding member 100 (for example, the number and arrangement of the suction holes 111 and the suction surfaces 113 described later) is not limited to the illustration.

如上所述,保持構件100在對多個半導體封裝S進行光學檢查時保持所述多個半導體封裝S。保持構件100主要包括作為保持部的樹脂片材110、及作為反射部的樹脂反射部120。此外,圖2的(a)中,為了區分樹脂片材110與樹脂反射部120,用斜線表示樹脂反射部120。As described above, the holding member 100 holds the plurality of semiconductor packages S when the plurality of semiconductor packages S are optically inspected. The holding member 100 mainly includes a resin sheet 110 as a holding part and a resin reflection part 120 as a reflection part. In addition, in (a) of FIG. 2, in order to distinguish the resin sheet 110 and the resin reflection portion 120, the resin reflection portion 120 is indicated by diagonal lines.

樹脂片材110是形成為矩形板狀的構件。作為樹脂片材110的素材,例如使用矽酮系樹脂或氟系樹脂等。在本實施方式中,為了使要保持的半導體封裝S的靜電擴散,使樹脂片材110含碳來提升導電性(靜電擴散性)。因此,樹脂片材110形成為發黑的顏色。在樹脂片材110主要形成有吸附孔111及槽112。The resin sheet 110 is a member formed in a rectangular plate shape. As the material of the resin sheet 110, for example, silicone-based resin, fluorine-based resin, or the like is used. In this embodiment, in order to diffuse the static electricity of the semiconductor package S to be held, the resin sheet 110 is made to contain carbon to improve conductivity (static diffusivity). Therefore, the resin sheet 110 is formed in a blackish color. The resin sheet 110 is mainly formed with suction holes 111 and grooves 112.

吸附孔111是用來吸附半導體封裝S的孔。吸附孔111以沿上下方向(厚度方向)貫通樹脂片材110的方式形成。吸附孔111在前後及左右隔開固定間隔形成有多個。The adsorption hole 111 is a hole for adsorbing the semiconductor package S. The suction hole 111 is formed to penetrate the resin sheet 110 in the vertical direction (thickness direction). A plurality of suction holes 111 are formed at fixed intervals in the front and rear and left and right.

槽112是以使樹脂片材110的表面(上表面)凹陷的方式形成的部分。槽112形成為比如將鄰接的吸附孔111彼此前後及左右劃分的格子狀。如上所述,通過形成槽112,在樹脂片材110的上表面,在各吸附孔111的周邊形成矩形(正方形)的吸附面113。吸附面113形成為與要吸附的半導體封裝S的外形(矩形)大致同一形狀。The groove 112 is a part formed so as to dent the surface (upper surface) of the resin sheet 110. The groove 112 is formed, for example, in a lattice shape that partitions adjacent suction holes 111 back and forth and left and right. As described above, by forming the groove 112, on the upper surface of the resin sheet 110, a rectangular (square) suction surface 113 is formed around each suction hole 111. The suction surface 113 is formed in substantially the same shape as the outer shape (rectangular) of the semiconductor package S to be sucked.

樹脂反射部120以填埋樹脂片材110的槽112的方式設置。作為樹脂反射部120的素材,例如使用矽酮系樹脂或氟系樹脂等。在本實施方式中,使樹脂反射部120包括氧化鈦。因此,樹脂反射部120形成為發白的顏色。另外,由此,樹脂反射部120與樹脂片材110相比具有更高的反射率(反射的光束相對於入射的光束的比)。The resin reflection part 120 is provided so as to fill the groove 112 of the resin sheet 110. As the material of the resin reflection portion 120, for example, silicone-based resin, fluorine-based resin, or the like is used. In this embodiment, the resin reflection part 120 is made to include titanium oxide. Therefore, the resin reflection part 120 is formed in a whitish color. In addition, as a result, the resin reflection portion 120 has a higher reflectance (ratio of the reflected light beam to the incident light beam) than the resin sheet 110.

此外,作為用於對樹脂反射部120著色的材料,並不限於所述氧化鈦,只要能夠使樹脂反射部120與樹脂片材110相比具有更高的反射率即可。例如可以使用金屬顏料(除鉛以外的各種金屬片(flake)、鍍敷用合金、鋁、錫、鋅、鉻、金、銀、鉑等)、片狀氧化鋁、白色顏料(氧化鈦、氧化鋅等)、珠光顏料(雲母、二氧化矽、玻璃等)、逆反射材(玻璃珠等)、以及稀釋劑及增量劑(鈦酸鈣、氫氧化鋁、硫酸鋇等)等。In addition, the material used for coloring the resin reflection part 120 is not limited to the titanium oxide, as long as the resin reflection part 120 can have a higher reflectance than the resin sheet 110. For example, metallic pigments (flake other than lead, alloys for plating, aluminum, tin, zinc, chromium, gold, silver, platinum, etc.), flake alumina, white pigments (titanium oxide, oxide Zinc, etc.), pearlescent pigments (mica, silica, glass, etc.), retroreflective materials (glass beads, etc.), and diluents and extenders (calcium titanate, aluminum hydroxide, barium sulfate, etc.), etc.

樹脂反射部120以填充在樹脂片材110的槽112整體的方式設置。樹脂反射部120以具有平坦表面(即從槽112露出的上側面)的方式形成。如上所述,通過將樹脂反射部120的表面形成為平坦,能夠抑制光的漫反射。The resin reflection part 120 is provided so as to fill the entire groove 112 of the resin sheet 110. The resin reflection part 120 is formed to have a flat surface (that is, an upper side surface exposed from the groove 112 ). As described above, by forming the surface of the resin reflection portion 120 to be flat, it is possible to suppress the diffuse reflection of light.

使用圖3,對樹脂反射部120的平坦表面具體地進行說明。如圖3所示,相對於槽112的深度方向(上下方向)平行切斷保持構件100進行剖面觀察時,樹脂反射部120的表面形成為高低差L為規定值以下。此處,樹脂反射部120的表面的高低差L是指相對於樹脂片材110的表面(吸附面113)垂直的方向(圖例中為上下方向)上樹脂反射部120的表面的最高位置與最低位置的差。此外,圖3中,表示樹脂片材110的上表面的位置與樹脂反射部120的最高位置一致的例子。Using FIG. 3, the flat surface of the resin reflection part 120 is demonstrated concretely. As shown in FIG. 3, when the holding member 100 is cut in parallel to the depth direction (up-down direction) of the groove 112 and cross-sectional observation is performed, the surface of the resin reflection portion 120 is formed such that the height difference L is a predetermined value or less. Here, the height difference L of the surface of the resin reflection portion 120 refers to the highest position and the lowest position of the surface of the resin reflection portion 120 in a direction perpendicular to the surface (adsorption surface 113) of the resin sheet 110 (the up and down direction in the illustration). Poor location. In addition, FIG. 3 shows an example in which the position of the upper surface of the resin sheet 110 coincides with the highest position of the resin reflection part 120.

此處,對具體的測定方法進行說明。首先,在樹脂片材110的上表面指定兩點,劃出通過所述兩點的直線a。因為樹脂片材110的上表面的位置與樹脂反射部120的最高位置一致,所以直線a表示樹脂反射部120的最高位置。接下來,製作相對於直線a平行的直線b,使直線b移動到樹脂反射部120的表面的最低部分。基於直線a與直線b的距離,測定樹脂反射部120的表面的高低差L。此外,在樹脂反射部120的最高位置與樹脂片材110的上表面的位置不一致的情況下,基於樹脂反射部120的最高位置與最低位置(直線b)的距離測定高低差L。 測定樹脂反射部120的表面時使用基恩士(KEYENCE)公司製造的數位顯微鏡(型號:VHX-5000)。Here, a specific measurement method will be described. First, two points are designated on the upper surface of the resin sheet 110, and a straight line a passing through the two points is drawn. Since the position of the upper surface of the resin sheet 110 coincides with the highest position of the resin reflection part 120, the straight line a represents the highest position of the resin reflection part 120. Next, a straight line b parallel to the straight line a is made, and the straight line b is moved to the lowest part of the surface of the resin reflection part 120. Based on the distance between the straight line a and the straight line b, the height difference L of the surface of the resin reflection portion 120 is measured. In addition, when the highest position of the resin reflection part 120 does not match the position of the upper surface of the resin sheet 110, the height difference L is measured based on the distance between the highest position and the lowest position (straight line b) of the resin reflection part 120. When measuring the surface of the resin reflection part 120, a digital microscope (model: VHX-5000) manufactured by KEYENCE Corporation was used.

在本實施方式中,樹脂反射部120的表面以高低差L為50μm以下的方式形成。如上所述,在高低差L為50μm以下的情況下,樹脂反射部120的表面平坦。此外,樹脂反射部120的表面的高低差L越小越容易抑制光的漫反射。因此樹脂反射部120的表面更優選以高低差L為45μm以下、40μm以下、35μm以下、30μm以下、25μm以下、或20μm以下的方式形成。In this embodiment, the surface of the resin reflection part 120 is formed so that the height difference L may be 50 micrometers or less. As described above, when the height difference L is 50 μm or less, the surface of the resin reflection portion 120 is flat. In addition, the smaller the height difference L of the surface of the resin reflection portion 120 is, the easier it is to suppress the diffuse reflection of light. Therefore, the surface of the resin reflection part 120 is more preferably formed so that the height difference L is 45 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, 25 μm or less, or 20 μm or less.

使用以上述方式構成的保持構件100來保持被檢查的半導體封裝S。具體來說,如圖2的(a)、圖2的(b)所示,在半導體封裝S逐個載置於各吸附面113的狀態下,經由吸附孔111從保持構件100的下方抽吸空氣,由此將半導體封裝S吸附保持於吸附面113。利用第二光學檢查相機13(參照圖1)拍攝由保持構件100保持的半導體封裝S,檢查外形部分的尺寸等。The holding member 100 configured in the above-described manner is used to hold the semiconductor package S to be inspected. Specifically, as shown in FIGS. 2(a) and 2(b), in a state where the semiconductor packages S are placed one by one on each suction surface 113, air is sucked from below the holding member 100 through the suction holes 111 As a result, the semiconductor package S is sucked and held on the sucking surface 113. The semiconductor package S held by the holding member 100 is photographed by the second optical inspection camera 13 (refer to FIG. 1 ), and the size of the outer shape portion and the like are inspected.

此處,當從上方觀察保持構件100時,在半導體封裝S的周圍配置有反射率相對較高的樹脂反射部120。如上所述,通過配置樹脂反射部120,利用第二光學檢查相機13進行拍攝時,能夠使半導體封裝S的邊緣部分(半導體封裝S與樹脂反射部120的邊界部分)的對比度明確。由此,能夠利用第二光學檢查相機13容易且高精度地進行半導體封裝S的邊緣的檢測。伴隨於此,能夠縮短用於檢測半導體封裝S的邊緣的時間。Here, when the holding member 100 is viewed from above, a resin reflection portion 120 having a relatively high reflectance is arranged around the semiconductor package S. As described above, by arranging the resin reflection part 120, the contrast of the edge part of the semiconductor package S (the boundary part between the semiconductor package S and the resin reflection part 120) can be made clear when imaging with the second optical inspection camera 13. As a result, the second optical inspection camera 13 can easily and accurately detect the edge of the semiconductor package S. Along with this, the time for detecting the edge of the semiconductor package S can be shortened.

進而,在本實施方式中,樹脂反射部120的表面形成得平坦(高低差L為50μm以下)。通過將樹脂反射部120的表面形成得平坦,能夠抑制光的漫反射。由此,利用第二光學檢查相機13拍攝時,能夠使半導體封裝S的邊緣部分的對比度明確。Furthermore, in this embodiment, the surface of the resin reflection part 120 is formed flat (the height difference L is 50 μm or less). By forming the surface of the resin reflection part 120 flat, the diffuse reflection of light can be suppressed. Thereby, when shooting with the second optical inspection camera 13, the contrast of the edge portion of the semiconductor package S can be made clear.

<實施例1> 接下來,使用圖4及圖5的(a)~圖5的(c),對使用分配器D的保持構件100的製造方法進行說明。<Example 1> Next, a method of manufacturing the holding member 100 using the dispenser D will be described using FIGS. 4 and 5(a) to 5(c).

如圖4所示,實施例1的保持構件100的製造方法主要包括等離子體照射步驟S11、樹脂填充步驟S12及樹脂硬化步驟S13。As shown in FIG. 4, the manufacturing method of the holding member 100 of Embodiment 1 mainly includes a plasma irradiation step S11, a resin filling step S12, and a resin curing step S13.

等離子體照射步驟S11是對樹脂片材110進行等離子體照射的步驟。等離子體照射步驟S11中,首先準備形成有吸附孔111及槽112的樹脂片材110。接下來,對樹脂片材110(尤其是槽112)照射等離子體(參照圖5的(a))。通過對樹脂片材尤其是槽112進行等離子體照射(等離子體處理),能夠控制樹脂片材110的表面張力(提升樹脂片材110的潤濕性),使後述樹脂反射部120的表面形成得平坦。等離子體照射例如可以使用氬氣。The plasma irradiation step S11 is a step of irradiating the resin sheet 110 with plasma. In the plasma irradiation step S11, first, the resin sheet 110 on which the suction holes 111 and grooves 112 are formed is prepared. Next, plasma is irradiated to the resin sheet 110 (especially the groove 112) (see FIG. 5(a)). By applying plasma (plasma treatment) to the resin sheet, especially the groove 112, the surface tension of the resin sheet 110 can be controlled (the wettability of the resin sheet 110 is improved), and the surface of the resin reflection portion 120 described later can be formed. flat. For plasma irradiation, for example, argon gas can be used.

等離子體照射步驟S11後,進行樹脂填充步驟S12。樹脂填充步驟S12是向樹脂片材110的槽112中填充成為樹脂反射部120的素材的樹脂R的步驟。樹脂填充步驟S12中,利用分配器D噴出樹脂R,向樹脂片材110的槽112供給樹脂R(參照圖5的(b))。分配器D向長邊方向的槽112中填充樹脂R後,向短邊方向的槽112中填充樹脂R。此時,供給充分量的樹脂R使槽112被樹脂R填滿。樹脂R的填充並不限於上述順序,也可以在向短邊方向的槽112中填充樹脂R後,向長邊方向的槽112中填充樹脂R。After the plasma irradiation step S11, a resin filling step S12 is performed. The resin filling step S12 is a step of filling the groove 112 of the resin sheet 110 with the resin R used as the material of the resin reflection portion 120. In the resin filling step S12, the resin R is discharged by the dispenser D, and the resin R is supplied to the groove 112 of the resin sheet 110 (refer to FIG. 5(b)). After the dispenser D fills the groove 112 in the longitudinal direction with the resin R, it fills the groove 112 in the short direction with the resin R. At this time, a sufficient amount of resin R is supplied so that the groove 112 is filled with the resin R. The filling of the resin R is not limited to the above-mentioned order, and the resin R may be filled in the groove 112 in the longitudinal direction after the resin R is filled in the groove 112 in the short side direction.

分配器D例如優選使用噴射分配器,可以使用壓電噴射分配器。壓電噴射分配器是使用壓電元件的分配器,壓電元件當施加電壓時會產生細微的變形,利用由壓電元件產生的細微的位移來使所連結的杆重複往返運動,高速開閉閥門,由此能夠噴出適當量的樹脂R。另外,即便在使用高粘度的樹脂R的情況下,如果使用壓電噴射分配器,也能夠減少噴出後的樹脂R產生拉絲。For the dispenser D, for example, a jet dispenser is preferably used, and a piezoelectric jet dispenser can be used. Piezoelectric jet dispenser is a dispenser that uses piezoelectric elements. The piezoelectric element generates slight deformation when voltage is applied. The micro displacement generated by the piezoelectric element causes the connected rod to repeatedly move back and forth, opening and closing the valve at high speed. Therefore, an appropriate amount of resin R can be ejected. In addition, even in the case of using a high-viscosity resin R, if a piezoelectric jet dispenser is used, it is possible to reduce the occurrence of stringiness in the resin R after ejection.

樹脂填充步驟S12後,進行樹脂硬化步驟S13。樹脂硬化步驟S13是使樹脂R硬化的步驟。例如利用60℃的烘箱對樹脂片材110等加熱一小時。作為加熱方法,並不限於使用烘箱的加熱,例如也可以使用加熱板進行加熱。由此,使槽112中填充的樹脂R硬化,形成樹脂反射部120(參照圖5的(c))。After the resin filling step S12, the resin curing step S13 is performed. The resin hardening step S13 is a step of hardening the resin R. For example, the resin sheet 110 and the like are heated in an oven at 60°C for one hour. The heating method is not limited to heating using an oven, and for example, a hot plate may be used for heating. Thereby, the resin R filled in the groove 112 is hardened, and the resin reflection part 120 is formed (refer FIG.5(c)).

<實施例2> 接下來,使用圖6至圖8的(a)~圖8的(c),對另一保持構件100的製造方法進行說明。<Example 2> Next, a method of manufacturing another holding member 100 will be described using FIGS. 6 to 8(a) to 8(c).

如圖6所示,實施例2的保持構件100的製造方法主要包括樹脂填充步驟S21、樹脂脫泡步驟S22、平坦構件配置步驟S23、樹脂硬化步驟S24、平坦構件卸載步驟S25、樹脂去除步驟S26及二次硬化步驟S27。As shown in FIG. 6, the manufacturing method of the holding member 100 of Embodiment 2 mainly includes a resin filling step S21, a resin defoaming step S22, a flat member arranging step S23, a resin hardening step S24, a flat member unloading step S25, and a resin removing step S26. And the secondary hardening step S27.

樹脂填充步驟S21是在樹脂片材110的槽112中填充成為樹脂反射部120的素材的樹脂R的步驟。樹脂填充步驟S21中,首先準備形成有吸附孔111及槽112的樹脂片材110(參照圖7的(a))。接下來,對樹脂片材110的上側面(形成有槽112的面)供給樹脂R(參照圖7的(b))。此時,供給充分量的樹脂R以使槽112被樹脂R填滿。通過對樹脂片材110的上側面供給樹脂R,樹脂R不僅滲入槽112的內部,也會滲入吸附孔111的內部,在樹脂片材110的表面也會附著樹脂R。The resin filling step S21 is a step of filling the groove 112 of the resin sheet 110 with the resin R used as the material of the resin reflection portion 120. In the resin filling step S21, first, the resin sheet 110 in which the suction holes 111 and the grooves 112 are formed is prepared (see FIG. 7(a)). Next, the resin R is supplied to the upper surface (the surface on which the groove 112 is formed) of the resin sheet 110 (see FIG. 7(b)). At this time, a sufficient amount of resin R is supplied so that the groove 112 is filled with resin R. By supplying the resin R to the upper side of the resin sheet 110, the resin R not only penetrates into the inside of the groove 112 but also penetrates into the inside of the adsorption hole 111, and the resin R also adheres to the surface of the resin sheet 110.

樹脂填充步驟S21後,進行樹脂脫泡步驟S22。樹脂脫泡步驟S22是進行樹脂R的脫泡的步驟。具體來說,將已供給樹脂R的樹脂片材110配置在規定容器內,使用真空泵將該容器設為真空狀態。由此,去除樹脂R所含的空氣(氣泡)。After the resin filling step S21, the resin defoaming step S22 is performed. The resin defoaming step S22 is a step of defoaming the resin R. Specifically, the resin sheet 110 to which the resin R has been supplied is placed in a predetermined container, and the container is brought into a vacuum state using a vacuum pump. Thereby, the air (air bubbles) contained in the resin R is removed.

樹脂脫泡步驟S22後,進行平坦構件配置步驟S23。平坦構件配置步驟S23是在樹脂片材110的上側面配置平坦構件F的步驟。平坦構件配置步驟S23中,首先從供給到樹脂片材110的上側面的樹脂R之上載置平坦構件F(參照圖7的(c))。After the resin defoaming step S22, a flat member arranging step S23 is performed. The flat member arranging step S23 is a step of arranging the flat member F on the upper surface of the resin sheet 110. In the flat member arrangement step S23, first, the flat member F is placed on the resin R supplied to the upper surface of the resin sheet 110 (see FIG. 7(c)).

此處,作為平坦構件F,使用具有平坦表面的構件。在本實施方式中,作為平坦構件F,使用具有鏡面(拋光成可利用光的反射映出物體的表面)的膜狀構件(鏡面膜)。Here, as the flat member F, a member having a flat surface is used. In the present embodiment, as the flat member F, a film-like member (mirror film) having a mirror surface (a surface polished to reflect the object by light reflection) is used.

接下來,對樹脂片材110(樹脂R)壓抵平坦構件F(參照圖7的(d))。例如,通過使用刮片等道具從平坦構件F的中央側向外側依次施力,將平坦構件F壓抵於樹脂片材110。由此,去除平坦構件F與樹脂R之間的空氣(氣泡)。另外,通過將平坦構件F壓抵於樹脂R,將平坦構件F的表面形狀(鏡面)轉印到樹脂R的表面,使樹脂R的表面變得平坦。Next, the resin sheet 110 (resin R) is pressed against the flat member F (refer to FIG. 7(d)). For example, the flat member F is pressed against the resin sheet 110 by sequentially applying force from the center side to the outside of the flat member F using a tool such as a blade. Thereby, the air (air bubbles) between the flat member F and the resin R is removed. In addition, by pressing the flat member F against the resin R, the surface shape (mirror surface) of the flat member F is transferred to the surface of the resin R, and the surface of the resin R is made flat.

此外,通過對樹脂片材110壓抵平坦構件F,將平坦構件F與樹脂片材110之間的樹脂R擠出到外部。不過,平坦構件F與樹脂片材110之間的樹脂R並非完全被排出,堆積在樹脂片材110的上側面的樹脂R的厚度變小,在樹脂片材110的上側面(吸附面113)殘留有樹脂R的薄膜。In addition, by pressing the resin sheet 110 against the flat member F, the resin R between the flat member F and the resin sheet 110 is extruded to the outside. However, the resin R between the flat member F and the resin sheet 110 is not completely discharged, and the thickness of the resin R accumulated on the upper side of the resin sheet 110 is reduced, and the resin R is on the upper side of the resin sheet 110 (adsorption surface 113). A thin film of resin R remains.

平坦構件配置步驟S23後,進行樹脂硬化步驟S24。樹脂硬化步驟S24是使樹脂R硬化(一次硬化)的步驟。樹脂硬化步驟S24中,將配置有平坦構件F的樹脂片材110上下翻轉(參照圖8的(a))。接下來,使用規定的成形模具,以上下夾住樹脂片材110及平坦構件F的方式施力(按壓)。接下來,保持按壓樹脂片材110等的狀態進行適當加熱。例如用60℃的烘箱對樹脂片材110等加熱一小時。由此,使樹脂R某種程度上硬化(一次硬化)。如上所述,通過按壓樹脂片材110等,維持利用平坦構件F對樹脂片材110的樹脂R施加壓力的狀態進行硬化,能夠抑制加熱造成樹脂R的表面變形,使樹脂R的表面保持平坦。After the flat member arranging step S23, the resin curing step S24 is performed. The resin curing step S24 is a step of curing the resin R (primary curing). In the resin curing step S24, the resin sheet 110 on which the flat member F is arranged is turned upside down (see FIG. 8(a)). Next, using a predetermined molding die, force is applied (pressing) so as to sandwich the resin sheet 110 and the flat member F up and down. Next, the resin sheet 110 and the like are kept pressed and appropriately heated. For example, the resin sheet 110 and the like are heated in an oven at 60°C for one hour. As a result, the resin R is cured to some extent (primary curing). As described above, by pressing the resin sheet 110 and the like, the resin R of the resin sheet 110 is hardened while maintaining the pressure applied to the resin R of the resin sheet 110 by the flat member F, the surface deformation of the resin R caused by heating can be suppressed, and the surface of the resin R can be kept flat.

此外,樹脂硬化步驟S24中將樹脂片材110上下翻轉後進行一次硬化,但並非必須使樹脂片材110上下翻轉。In addition, in the resin curing step S24, the resin sheet 110 is turned upside down and then cured once, but it is not necessary to turn the resin sheet 110 upside down.

樹脂硬化步驟S24後,進行平坦構件卸載步驟S25。平坦構件卸載步驟S25是將平坦構件F從樹脂片材110卸載的步驟。平坦構件卸載步驟S25中,將樹脂片材110再次上下翻轉。接下來,將平坦構件F從樹脂片材110(更詳細來說是經一次硬化的樹脂R)卸載(參照圖8的(b))。After the resin hardening step S24, the flat member unloading step S25 is performed. The flat member unloading step S25 is a step of unloading the flat member F from the resin sheet 110. In the flat member unloading step S25, the resin sheet 110 is turned upside down again. Next, the flat member F is unloaded from the resin sheet 110 (in more detail, the resin R that has been cured once) (see FIG. 8(b)).

平坦構件卸載步驟S25後,進行樹脂去除步驟S26。樹脂去除步驟S26是從樹脂片材110去除無用的樹脂R的步驟。樹脂去除步驟S26中,將填充在樹脂片材110的槽112中的樹脂R以外的樹脂R去除(參照圖8的(c))。具體來說,將殘留在樹脂片材110的上側面(吸附面113)的樹脂R的薄膜去除。另外,將滲入樹脂片材110的吸附孔111的內部的樹脂R去除。另外,如果有附著在樹脂片材110的其它部分(例如外側面等)的樹脂R,也將所述樹脂R去除。After the flat member unloading step S25, the resin removing step S26 is performed. The resin removal step S26 is a step of removing useless resin R from the resin sheet 110. In the resin removal step S26, the resin R other than the resin R filled in the groove 112 of the resin sheet 110 is removed (see FIG. 8(c)). Specifically, the thin film of resin R remaining on the upper side surface (adsorption surface 113) of the resin sheet 110 is removed. In addition, the resin R that has penetrated into the inside of the adsorption hole 111 of the resin sheet 110 is removed. In addition, if there is resin R adhering to other parts of the resin sheet 110 (for example, the outer surface, etc.), the resin R is also removed.

此外,去除樹脂R的方法並無特別限定。樹脂R可以由作業者手動去除,也可以另外使用適當的工具或裝置去除。例如,可以使用磨床(grinder)等研削裝置去除樹脂R,或使用鐳射等去除樹脂R。In addition, the method of removing resin R is not specifically limited. The resin R can be removed manually by the operator, or can be removed using an appropriate tool or device. For example, a grinding device such as a grinder can be used to remove the resin R, or a laser or the like can be used to remove the resin R.

樹脂去除步驟S26後,進行二次硬化步驟S27。二次硬化步驟S27是使樹脂片材110的槽112中填充的樹脂R進一步硬化(二次硬化)的步驟。二次硬化步驟S27中,對樹脂片材110等適當進行加熱。例如對於樹脂片材110等,用60℃的烘箱加熱四小時,或使用150度的烘箱加熱一小時。由此,使槽112中填充的樹脂R進一步硬化(二次硬化),形成樹脂反射部120。After the resin removal step S26, a secondary hardening step S27 is performed. The secondary hardening step S27 is a step of further hardening (secondary hardening) the resin R filled in the groove 112 of the resin sheet 110. In the secondary curing step S27, the resin sheet 110 and the like are appropriately heated. For example, the resin sheet 110, etc., are heated in an oven at 60°C for four hours, or heated in an oven at 150°C for one hour. Thereby, the resin R filled in the groove 112 is further cured (secondary curing), and the resin reflection portion 120 is formed.

如上所述,本實施方式的保持構件100保持多個半導體封裝S(保持對象物)用於光學檢查,包括:樹脂片材110(保持部),設置有吸附保持所述半導體封裝S的多個吸附孔111、及配置在多個所述吸附孔111之間的槽112;及樹脂反射部120(反射部),設置在所述槽112,反射率比所述樹脂片材110高。所述樹脂反射部120具有平坦的表面。As described above, the holding member 100 of the present embodiment holds a plurality of semiconductor packages S (holding objects) for optical inspection, and includes: a resin sheet 110 (holding portion) provided with a plurality of semiconductor packages S for sucking and holding the semiconductor packages S The suction hole 111 and the groove 112 arranged between the plurality of suction holes 111; and the resin reflection part 120 (reflecting part), which is provided in the groove 112, has a higher reflectance than the resin sheet 110. The resin reflection part 120 has a flat surface.

通過以所述方式構成,能夠高精度地進行由多個吸附孔111各自吸附保持的半導體封裝S的邊緣檢測。即,通過設置反射率相對較高的樹脂反射部120,能夠使樹脂反射部120與由吸附孔111吸附的半導體封裝S的邊界部分的對比度明確。另外,因為將樹脂反射部120的表面形成得平坦,所以能夠抑制光的漫反射,使對比度更加明確。By configuring in this manner, the edge detection of the semiconductor package S sucked and held by each of the plurality of suction holes 111 can be performed with high accuracy. That is, by providing the resin reflection portion 120 with a relatively high reflectance, the contrast between the resin reflection portion 120 and the boundary portion of the semiconductor package S sucked by the suction hole 111 can be made clear. In addition, since the surface of the resin reflection portion 120 is formed flat, the diffuse reflection of light can be suppressed, and the contrast can be made clearer.

另外,樹脂反射部120的表面在相對於所述槽112的深度方向平行切斷的剖面觀察時,高低差為50μm以下。In addition, when the surface of the resin reflection portion 120 is viewed in a cross section cut in parallel with the depth direction of the groove 112, the height difference is 50 μm or less.

通過以所述方式構成,能夠更高精度地進行半導體封裝S的邊緣檢測。即,通過將樹脂反射部120的表面的高低差抑制在規定值以下,能夠有效抑制光的漫反射。By configuring in this way, the edge detection of the semiconductor package S can be performed with higher accuracy. That is, by suppressing the height difference of the surface of the resin reflection part 120 to a predetermined value or less, the diffuse reflection of light can be suppressed effectively.

另外,本實施方式的檢查模組B(檢查機構)對由保持構件100保持的半導體封裝S進行檢查。In addition, the inspection module B (inspection mechanism) of the present embodiment inspects the semiconductor package S held by the holding member 100.

通過以所述方式構成,能夠用簡單的構成高精度地進行半導體封裝S的邊緣檢測。By configuring in this manner, it is possible to perform edge detection of the semiconductor package S with high accuracy with a simple configuration.

另外,本實施方式的切斷裝置1包括:切斷模組A(切斷機構),切斷封裝基板P(切斷對象物),獲得多個所述半導體封裝S;及檢查模組B。利用所述檢查模組B,對利用所述切斷模組A所得的所述半導體封裝S進行檢查。In addition, the cutting device 1 of the present embodiment includes: a cutting module A (cutting mechanism), cutting the package substrate P (cutting object) to obtain a plurality of the semiconductor packages S; and an inspection module B. Using the inspection module B, the semiconductor package S obtained by the cutting module A is inspected.

通過以所述方式構成,能夠用簡單的構成高精度地進行半導體封裝S的邊緣檢測。By configuring in this manner, it is possible to perform edge detection of the semiconductor package S with high accuracy with a simple configuration.

另外,本實施方式的半導體封裝S的製造方法使用切斷裝置1製造半導體封裝S。In addition, the manufacturing method of the semiconductor package S of the present embodiment uses the cutting device 1 to manufacture the semiconductor package S.

通過以所述方式構成,能夠用簡單的構成高精度地進行半導體封裝S的邊緣檢測。進而,能夠提升半導體封裝S的生產性。By configuring in this manner, it is possible to perform edge detection of the semiconductor package S with high accuracy with a simple configuration. Furthermore, the productivity of the semiconductor package S can be improved.

另外,本實施方式的保持構件100的製造方法中,保持構件100保持多個半導體封裝S(保持對象物)用於光學檢查,保持構件100的製造方法包括:樹脂填充步驟S12(樹脂填充步驟S21),對於設置有槽112的樹脂片材110(保持部),在所述槽112中填充樹脂R,所述槽112配置在吸附保持所述半導體封裝S的多個吸附孔111之間;及樹脂硬化步驟S13(樹脂硬化步驟S24),使所述樹脂R硬化。In addition, in the method of manufacturing the holding member 100 of this embodiment, the holding member 100 holds a plurality of semiconductor packages S (holding objects) for optical inspection, and the method of manufacturing the holding member 100 includes: a resin filling step S12 (resin filling step S21 ), for the resin sheet 110 (holding portion) provided with grooves 112, the grooves 112 are filled with resin R, and the grooves 112 are arranged between the plurality of suction holes 111 for sucking and holding the semiconductor package S; and In the resin hardening step S13 (resin hardening step S24), the resin R is hardened.

通過以所述方式構成,能夠容易地製造保持構件100。另外,通過使用利用本實施方式的保持構件100的製造方法所得的保持構件100,能夠用簡單的構成高精度地進行半導體封裝S的邊緣檢測。By configuring in this way, the holding member 100 can be easily manufactured. In addition, by using the holding member 100 obtained by the method of manufacturing the holding member 100 of the present embodiment, it is possible to perform edge detection of the semiconductor package S with high accuracy with a simple configuration.

另外,所述樹脂填充步驟S12利用分配器D噴出所述樹脂R,向所述槽112中填充所述樹脂R。In addition, in the resin filling step S12, a dispenser D is used to eject the resin R, and the resin R is filled into the groove 112.

通過以所述方式構成,能夠容易地製造保持構件100。即,通過利用樹脂R的噴出精度相對較高的分配器D向槽112中填充樹脂R,能夠容易且高精度地向槽112中填充樹脂R。By configuring in this way, the holding member 100 can be easily manufactured. That is, by filling the groove 112 with the resin R by the dispenser D with a relatively high ejection accuracy of the resin R, it is possible to easily and accurately fill the groove 112 with the resin R.

另外,本實施方式的保持構件100的製造方法還包括等離子體照射步驟S11,在所述樹脂填充步驟S12之前,對所述樹脂片材110進行等離子體照射。In addition, the manufacturing method of the holding member 100 of the present embodiment further includes a plasma irradiation step S11 in which plasma irradiation is performed on the resin sheet 110 before the resin filling step S12.

通過以所述方式構成,能夠容易地將樹脂反射部120的表面形成得平坦。即,通過提升樹脂片材110(尤其是槽112)的潤濕性,能夠使槽112中填充的樹脂R的表面平坦,進而能夠使通過使樹脂R硬化形成的樹脂反射部120的表面平坦。By configuring in this manner, the surface of the resin reflection portion 120 can be easily formed flat. That is, by improving the wettability of the resin sheet 110 (especially the groove 112), the surface of the resin R filled in the groove 112 can be flattened, and the surface of the resin reflection portion 120 formed by curing the resin R can be flattened.

另外,本實施方式的保持構件100的製造方法還包括樹脂脫泡步驟S22,在所述樹脂填充步驟S21之後,進行所述樹脂R的脫泡。In addition, the manufacturing method of the holding member 100 of the present embodiment further includes a resin defoaming step S22. After the resin filling step S21, the resin R is defoamed.

通過以所述方式構成,能夠容易地使樹脂R(樹脂反射部120)的表面形成得更加平坦。即,通過去除樹脂R所含的空氣(氣泡),能夠抑制因氣泡導致的樹脂R的表面的凹凸或變形。By configuring in this way, the surface of the resin R (resin reflection portion 120) can be easily formed more flat. That is, by removing the air (air bubbles) contained in the resin R, it is possible to suppress the unevenness or deformation of the surface of the resin R due to the air bubbles.

另外,本實施方式的保持構件100的製造方法還包括平坦構件配置步驟S23,在所述樹脂填充步驟S21之後,在所述樹脂片材110的表面配置平坦構件F。In addition, the manufacturing method of the holding member 100 of the present embodiment further includes a flat member arranging step S23. After the resin filling step S21, a flat member F is arranged on the surface of the resin sheet 110.

通過以所述方式構成,能夠容易地使樹脂R(樹脂反射部120)的表面形成得更加平坦。即,通過在樹脂片材110的表面配置平坦構件F,能夠將槽112中填充的樹脂R的表面形成得平坦。By configuring in this way, the surface of the resin R (resin reflection portion 120) can be easily formed more flat. That is, by arranging the flat member F on the surface of the resin sheet 110, the surface of the resin R filled in the groove 112 can be formed flat.

另外,在本實施方式的保持構件100的製造方法,在所述樹脂硬化步驟S24中,在所述平坦構件F對所述槽112中填充的所述樹脂R施加壓力的狀態下使所述樹脂R硬化。In addition, in the method of manufacturing the holding member 100 of this embodiment, in the resin curing step S24, the resin R filled in the groove 112 is pressed by the flat member F. R hardened.

通過以所述方式構成,能夠容易地使樹脂R(樹脂反射部120)的表面形成得更加平坦。即,能夠抑制樹脂R的表面伴隨硬化而引起的變形。By configuring in this way, the surface of the resin R (resin reflection portion 120) can be easily formed more flat. That is, it is possible to suppress the deformation of the surface of the resin R accompanying hardening.

另外,在所述樹脂填充步驟21中,也向多個所述吸附孔111中填充所述樹脂R,且本實施方式的保持構件100的製造方法更包括:平坦構件卸載步驟S25,在所述樹脂硬化步驟S24之後,從所述樹脂片材110的表面卸載所述平坦構件F;及樹脂去除步驟S26,在所述平坦構件卸載步驟S25之後,去除附著在所述樹脂片材110的所述槽112以外的所述樹脂R。In addition, in the resin filling step 21, the resin R is also filled into the plurality of adsorption holes 111, and the manufacturing method of the holding member 100 of this embodiment further includes: a flat member unloading step S25, in the After the resin hardening step S24, the flat member F is unloaded from the surface of the resin sheet 110; and the resin removing step S26, after the flat member unloading step S25, the resin attached to the resin sheet 110 is removed The resin R other than the groove 112.

通過以所述方式構成,能夠獲得去除了無用的樹脂R的保持構件100。即,配置在槽112的樹脂R(樹脂反射部120)以外的樹脂R對於提升半導體封裝S的邊緣檢測的精度而言是無用的,通過去除所述樹脂R,能夠抑制因殘留無用的樹脂R導致產生不良情況(例如阻礙半導體封裝S的吸附等)。By configuring in this manner, it is possible to obtain the holding member 100 from which the useless resin R is removed. That is, the resin R other than the resin R (resin reflecting portion 120) arranged in the groove 112 is useless for improving the accuracy of edge detection of the semiconductor package S. By removing the resin R, it is possible to suppress the remaining useless resin R. This leads to problems (such as hindering the adsorption of the semiconductor package S, etc.).

另外,本實施方式的保持構件100的製造方法還包括二次硬化步驟S27,在所述樹脂硬化步驟S24之後,使所述樹脂R進一步硬化。In addition, the manufacturing method of the holding member 100 of the present embodiment further includes a secondary hardening step S27, after the resin hardening step S24, the resin R is further hardened.

通過以所述方式構成,能夠抑制保持構件100的變形。即,通過分多次使樹脂R硬化,能夠抑制保持構件100的變形(翹曲等)。By configuring in this manner, deformation of the holding member 100 can be suppressed. That is, by hardening the resin R in multiple times, it is possible to suppress deformation (warpage, etc.) of the holding member 100.

另外,所述樹脂填充步驟21中,也向多個所述吸附孔111中填充所述樹脂R,且本實施方式的保持構件100的製造方法更包括:平坦構件卸載步驟S25,在所述樹脂硬化步驟S24之後,從所述樹脂片材110的表面卸載所述平坦構件F;樹脂去除步驟S26,在所述平坦構件卸載步驟S25之後,去除附著在所述樹脂片材110的所述槽112以外的所述樹脂R;及二次硬化步驟S27,在所述樹脂去除步驟S26後,使所述樹脂R進一步硬化。In addition, in the resin filling step 21, the resin R is also filled into the plurality of the adsorption holes 111, and the manufacturing method of the holding member 100 of this embodiment further includes: a flat member unloading step S25, in which the resin R After the curing step S24, the flat member F is unloaded from the surface of the resin sheet 110; the resin removal step S26, after the flat member unloading step S25, the groove 112 attached to the resin sheet 110 is removed Other than the resin R; and the secondary hardening step S27, after the resin removing step S26, the resin R is further hardened.

通過以所述方式構成,能夠容易地去除無用的樹脂R。即,能夠在使樹脂R硬化的中途(樹脂硬化步驟S24之後且二次硬化步驟S27之前)去除樹脂R,因此能夠容易地去除樹脂R。By configuring in this manner, the useless resin R can be easily removed. That is, the resin R can be removed in the middle of curing the resin R (after the resin curing step S24 and before the secondary curing step S27), so the resin R can be easily removed.

此外,本實施方式的半導體封裝S是本發明的保持對象物的一個實施方式。 另外,本實施方式的樹脂片材110是本發明的保持部的一個實施方式。 另外,本實施方式的樹脂反射部120是本發明的反射部的一個實施方式。 另外,本實施方式的切斷模組A是本發明的切斷機構的一個實施方式。 另外,本實施方式的檢查模組B是本發明的檢查機構的一個實施方式。 另外,本實施方式的封裝基板P是本發明的切斷對象物的一個實施方式。In addition, the semiconductor package S of this embodiment is an embodiment of the holding object of the present invention. Moreover, the resin sheet 110 of this embodiment is an embodiment of the holding part of this invention. In addition, the resin reflection part 120 of this embodiment is an embodiment of the reflection part of this invention. In addition, the cutting module A of this embodiment is an embodiment of the cutting mechanism of the present invention. In addition, the inspection module B of this embodiment is an embodiment of the inspection mechanism of the present invention. In addition, the package substrate P of this embodiment is an embodiment of the cutting object of the present invention.

以上,對本發明的一實施方式進行了說明,但本發明並不限定於所述實施方式,能夠在權利要求書的範圍所記載的發明的技術思想的範圍內適當變更。As mentioned above, although an embodiment of this invention was described, this invention is not limited to the said embodiment, It can change suitably within the range of the technical idea of the invention described in the scope of the claim.

例如,本實施方式中例示的切斷裝置1的構成為一例,具體構成可以適當變更。For example, the configuration of the cutting device 1 illustrated in this embodiment is an example, and the specific configuration can be changed as appropriate.

例如,在本實施方式中,切斷模組A及檢查模組B各自包括控制部(控制部8及控制部16),但本發明並不限於此,可以將各控制部匯總為一個控制部,或分割成三個以上控制部。另外,本實施方式的切斷裝置1為包括兩個切斷台5的雙切割台構成,但本發明並不限於此,也可以僅包括一個切斷台5。另外,本實施方式的切斷裝置1為包括兩個主軸6的雙主軸構成,但本發明並不限於此,也可以僅包括一個主軸6。For example, in this embodiment, the cutting module A and the inspection module B each include a control section (control section 8 and control section 16), but the present invention is not limited to this, and each control section may be integrated into one control section. , Or divided into three or more control parts. In addition, the cutting device 1 of the present embodiment has a dual cutting table configuration including two cutting tables 5, but the present invention is not limited to this, and only one cutting table 5 may be included. In addition, the cutting device 1 of the present embodiment has a dual-spindle configuration including two spindles 6, but the present invention is not limited to this, and may include only one spindle 6.

另外,在本實施方式中,設為將保持構件100設置在檢查台11的構成,本發明並不限於此,可以將保持構件100設置在搬送部7,也可以在檢查台11及搬送部7雙方設置保持構件100。切斷裝置1也可以是僅包括與設置保持構件100的搬送部7對應的第一光學檢查相機12、或與設置保持構件100的檢查台11對應的第二光學檢查相機13中的任一個的構成。In addition, in the present embodiment, the holding member 100 is provided on the inspection table 11, but the present invention is not limited to this. The holding member 100 may be provided on the transport section 7, or at the inspection table 11 and the transport section 7. The holding member 100 is provided on both sides. The cutting device 1 may include only the first optical inspection camera 12 corresponding to the conveying unit 7 on which the holding member 100 is provided, or the second optical inspection camera 13 corresponding to the inspection table 11 on which the holding member 100 is provided. constitute.

另外,在本實施方式中,樹脂反射部120與樹脂片材110相比具有更高的反射率,但並非一定要全波長的光的反射率均更高。即,保持構件100是用於利用相機(在本實施方式中為第二光學檢查相機13)進行的光學檢查,所以至少對與所述相機的特性(可獲取的波長資訊)相應的波長的光,樹脂反射部120與樹脂片材110相比具有更高的反射率即可。In addition, in the present embodiment, the resin reflection portion 120 has a higher reflectance than the resin sheet 110, but it does not necessarily have to have a higher reflectance for all wavelengths of light. That is, the holding member 100 is used for the optical inspection performed by the camera (the second optical inspection camera 13 in this embodiment), so at least the light of the wavelength corresponding to the characteristics of the camera (the available wavelength information) It is only necessary that the resin reflection portion 120 has a higher reflectance than the resin sheet 110.

另外,反射率是對用於檢查的光源的反射率,作為光源,可以使用單一光源,可以使用出射光(照明光)的波長區域相同的多個光源,也可以使用出射光(照明光)的波長區域不同的多個光源。另外,反射率基於利用相機進行的檢測,但利用相機進行的檢測可以是單一或多個光源的全波長區域中的檢測,可以是多個光源中的一部分光源的波長區域中的檢測,也可以是單一光源的一部分波長區域的檢測。In addition, the reflectance is the reflectance of the light source used for inspection. As the light source, a single light source can be used, multiple light sources with the same wavelength range of the emitted light (illumination light) can be used, or the emitted light (illumination light) can be used. Multiple light sources with different wavelength regions. In addition, the reflectance is based on the detection by the camera, but the detection by the camera can be the detection in the full wavelength region of a single or multiple light sources, the detection in the wavelength region of a part of the multiple light sources, or It is the detection of a part of the wavelength region of a single light source.

另外,本實施方式的保持構件100的製造方法是一例,步驟的順序及具體內容可以任意變更。In addition, the manufacturing method of the holding member 100 of this embodiment is an example, and the order of steps and specific content can be changed arbitrarily.

例如,在本實施方式中,例示在二次硬化步驟S27之前進行平坦構件卸載步驟S25及樹脂去除步驟S26,也可以在二次硬化步驟S27之後進行平坦構件卸載步驟S25及樹脂去除步驟S26。具體來說,可以設為樹脂硬化步驟S24、平坦構件卸載步驟S25、樹脂去除步驟S26、二次硬化步驟S27的順序、樹脂硬化步驟S24、平坦構件卸載步驟S25、二次硬化步驟S27、樹脂去除步驟S26的順序、或樹脂硬化步驟S24、二次硬化步驟S27、平坦構件卸載步驟S25、樹脂去除步驟S26的順序。For example, in this embodiment, it is illustrated that the flat member unloading step S25 and the resin removing step S26 are performed before the secondary hardening step S27, and the flat member unloading step S25 and the resin removing step S26 may be performed after the secondary hardening step S27. Specifically, it can be set as the order of resin hardening step S24, flat member unloading step S25, resin removing step S26, secondary hardening step S27, resin hardening step S24, flat member unloading step S25, secondary hardening step S27, resin removal The order of step S26, or the order of resin hardening step S24, secondary hardening step S27, flat member unloading step S25, and resin removing step S26.

另外,也可以在實施例1(參照圖4)中與實施例2(參照圖6)同樣地進行樹脂脫泡步驟S22、平坦構件配置步驟S23、平坦構件卸載步驟S25、樹脂去除步驟S26、二次硬化步驟S27。在此情況下,步驟的順序及具體內容也可以任意變更。In addition, the resin defoaming step S22, the flat member arranging step S23, the flat member unloading step S25, the resin removing step S26, and the second embodiment can also be performed in the same manner as in the second embodiment (refer to FIG. 6) in the first embodiment (refer to FIG. 4). Secondary hardening step S27. In this case, the order and specific content of the steps can also be changed arbitrarily.

另外,在本實施方式中,在製造保持構件100的情況下,分兩次(樹脂硬化步驟S24及二次硬化步驟S27)使樹脂R硬化,但本發明並不限於此。例如,也可以僅通過樹脂硬化步驟S24(即僅用一個步驟)使樹脂R最終硬化。由此,能夠實現保持構件100的製造步驟的簡化。在此情況下,可用60℃的烘箱加熱五小時等,適當調整加熱溫度及加熱時間,以使樹脂R能夠在樹脂硬化步驟S24中充分硬化。另外,在此情況下,不需要二次硬化步驟S27,因此通過在樹脂硬化步驟S24之後進行平坦構件卸載步驟S25及樹脂去除步驟S26,結束保持構件100的製造。In addition, in the present embodiment, in the case of manufacturing the holding member 100, the resin R is cured twice (resin curing step S24 and secondary curing step S27), but the present invention is not limited to this. For example, the resin R may be finally hardened only through the resin hardening step S24 (that is, only one step). Thereby, the manufacturing process of the holding member 100 can be simplified. In this case, it can be heated in an oven at 60° C. for five hours, etc., and the heating temperature and heating time can be appropriately adjusted so that the resin R can be fully cured in the resin curing step S24. In addition, in this case, the secondary hardening step S27 is not required, so by performing the flat member unloading step S25 and the resin removing step S26 after the resin hardening step S24, the manufacturing of the holding member 100 is ended.

另外,在本實施方式中,作為壓抵於樹脂R的平坦構件F,使用鏡面片材,但本發明並不限於此。即,只要在使樹脂R硬化之後(保持構件100製造結束的時點)能夠獲得具有平坦表面的樹脂反射部120,平坦構件F並無限定。例如,平坦構件F也可以不具有鏡面。另外,平坦構件F並不限於片狀。In addition, in the present embodiment, as the flat member F pressed against the resin R, a mirror surface sheet is used, but the present invention is not limited to this. That is, as long as the resin reflection portion 120 having a flat surface can be obtained after the resin R is cured (at the time when the manufacturing of the holding member 100 is finished), the flat member F is not limited. For example, the flat member F may not have a mirror surface. In addition, the flat member F is not limited to a sheet shape.

1:切斷裝置 3:基板供給部 4:定位部 4a:軌道部 5:切斷台 5a:保持構件 5b:旋轉機構 5c:移動機構 5d:第一位置確認相機 5e:第一清潔器 6:主軸 6a:旋轉刀 6b:第二位置確認相機 7:搬送部 7a:第二清潔器 8:控制部 11:檢查台 12:第一光學檢查相機 13:第二光學檢查相機 14:配置部 15:抽取部 15a:良品托盤 15b:不良品托盤 16:控制部 100:保持構件 110:樹脂片材 111:吸附孔 112:槽 113:吸附面 120:樹脂反射部 A:切斷模組 B:檢查模組 D:分配器 F:平坦構件 M:料盒 P:封裝基板 R:樹脂 S:半導體封裝1: Cut off device 3: Substrate supply section 4: Positioning part 4a: Track part 5: Cut off the table 5a: Holding member 5b: Rotating mechanism 5c: mobile mechanism 5d: Confirm the camera in the first position 5e: first cleaner 6: Spindle 6a: Rotary knife 6b: The second position to confirm the camera 7: Transport Department 7a: Second cleaner 8: Control Department 11: Inspection table 12: The first optical inspection camera 13: The second optical inspection camera 14: Configuration Department 15: Extraction section 15a: Good product tray 15b: Defective product tray 16: Control Department 100: holding member 110: Resin sheet 111: adsorption hole 112: Slot 113: Adsorption surface 120: Resin reflector A: Cut off the module B: Check the module D: Allocator F: Flat member M: Material box P: Package substrate R: Resin S: Semiconductor package

圖1是表示本發明的一實施方式的切斷裝置的整體構成的俯視示意圖。 圖2的(a)是保持構件的俯視示意圖。圖2的(b)是X-X剖面圖。 圖3是表示樹脂反射部的表面的形狀的剖面示意圖。 圖4是表示實施例1的保持構件的製造方法的圖。 圖5的(a)~圖5的(c)是依次表示在實施例1中製造保持構件的情況的剖面示意圖。 圖6是表示實施例2的保持構件的製造方法的圖。 圖7的(a)~圖7的(d)是依次表示在實施例2中製造保持構件的情況的剖面示意圖。 圖8的(a)~圖8的(c)是表示圖7的(a)~圖7的(d)的後續的剖面示意圖。Fig. 1 is a schematic plan view showing the overall configuration of a cutting device according to an embodiment of the present invention. Fig. 2(a) is a schematic plan view of the holding member. Fig. 2(b) is an X-X cross-sectional view. 3 is a schematic cross-sectional view showing the shape of the surface of the resin reflection part. 4 is a diagram showing a method of manufacturing the holding member of Example 1. FIG. 5(a) to 5(c) are schematic cross-sectional views sequentially showing how the holding member was manufactured in Example 1. FIG. FIG. 6 is a diagram showing a method of manufacturing a holding member of Example 2. FIG. 7(a) to 7(d) are schematic cross-sectional views sequentially showing how the holding member is manufactured in Example 2. FIG. 8(a) to 8(c) are schematic cross-sectional views showing continuation of FIGS. 7(a) to 7(d).

100:保持構件 100: holding member

110:樹脂片材 110: Resin sheet

111:吸附孔 111: adsorption hole

112:槽 112: Slot

113:吸附面 113: Adsorption surface

120:樹脂反射部 120: Resin reflector

Claims (14)

一種保持構件,其保持多個保持對象物,用於光學檢查,包括: 保持部,設置有吸附保持所述保持對象物的多個吸附孔、及配置在多個所述吸附孔之間的槽;以及 反射部,設置在所述槽,反射率比所述保持部高, 其中所述反射部具有平坦的表面。A holding member, which holds a plurality of holding objects for optical inspection, includes: The holding portion is provided with a plurality of adsorption holes for adsorbing and holding the object to be held, and a groove arranged between the plurality of adsorption holes; and The reflecting part is arranged in the groove and has a higher reflectivity than the holding part, Wherein the reflecting part has a flat surface. 如請求項1所述的保持構件,其中所述表面在相對於所述槽的深度方向平行切斷的剖面觀察時,高低差為50μm以下。The holding member according to claim 1, wherein the surface has a height difference of 50 μm or less when viewed in a cross section cut in parallel with the depth direction of the groove. 一種檢查機構,其對由如請求項1或2所述的保持構件所保持的所述保持對象物進行檢查。An inspection mechanism that inspects the holding object held by the holding member according to claim 1 or 2. 一種切斷裝置,包括: 如請求項3所述的檢查機構;以及 切斷機構,將切斷對象物切斷,獲得多個所述保持對象物, 其中利用所述檢查機構,對利用所述切斷機構所獲得的所述保持對象物進行檢查。A cutting device includes: The inspection agency as described in claim 3; and The cutting mechanism cuts the cut object to obtain a plurality of the holding objects, The inspection mechanism is used to inspect the holding object obtained by the cutting mechanism. 一種保持對象物的製造方法,其使用如請求項4所述的切斷裝置製造所述保持對象物。A method for manufacturing a holding object, which uses the cutting device according to claim 4 to produce the holding object. 一種保持構件的製造方法,所述保持構件保持多個保持對象物,用於光學檢查,所述保持構件的製造方法包括: 樹脂填充步驟,對於設置有槽的保持部,向所述槽中填充樹脂,所述槽配置在吸附保持所述保持對象物的多個吸附孔之間;及 樹脂硬化步驟,使所述樹脂硬化。A manufacturing method of a holding member, wherein the holding member holds a plurality of holding objects for optical inspection, and the manufacturing method of the holding member includes: In the resin filling step, for the holding portion provided with the groove, the groove is filled with resin, and the groove is arranged between a plurality of suction holes for sucking and holding the holding object; and The resin hardening step hardens the resin. 如請求項6所述的保持構件的製造方法,其中所述樹脂填充步驟利用分配器噴出所述樹脂,向所述槽中填充所述樹脂。The method of manufacturing a holding member according to claim 6, wherein the resin filling step uses a dispenser to eject the resin and fill the groove with the resin. 如請求項7所述的保持構件的製造方法,還包括: 等離子體照射步驟,在所述樹脂填充步驟前,對所述保持部進行等離子體照射。The manufacturing method of the holding member according to claim 7, further comprising: In the plasma irradiation step, plasma irradiation is performed on the holding portion before the resin filling step. 如請求項6所述的保持構件的製造方法,還包括: 樹脂脫泡步驟,在所述樹脂填充步驟後,進行所述樹脂的脫泡。The manufacturing method of the holding member according to claim 6, further comprising: In the resin defoaming step, after the resin filling step, the resin is defoamed. 如請求項6所述的保持構件的製造方法,還包括: 平坦構件配置步驟,在所述樹脂填充步驟後,在所述保持部的表面配置平坦構件。The manufacturing method of the holding member according to claim 6, further comprising: A flat member arranging step includes arranging a flat member on the surface of the holding portion after the resin filling step. 如請求項10所述的保持構件的製造方法,其中在所述樹脂硬化步驟中,在利用所述平坦構件對填充在所述槽中的所述樹脂施加壓力的狀態下使所述樹脂硬化。The method of manufacturing a holding member according to claim 10, wherein in the resin hardening step, the resin is hardened in a state where pressure is applied to the resin filled in the groove by the flat member. 如請求項10或11所述的保持構件的製造方法,其中在所述樹脂填充步驟中,也向多個所述吸附孔中填充所述樹脂,且 所述保持構件的製造方法還包括: 平坦構件卸載步驟,在所述樹脂硬化步驟後,從所述保持部的表面卸載所述平坦構件;及 樹脂去除步驟,在所述平坦構件卸載步驟後,去除附著在所述保持部的所述槽以外的所述樹脂。The method of manufacturing a holding member according to claim 10 or 11, wherein in the resin filling step, the resin is also filled into the plurality of adsorption holes, and The manufacturing method of the holding member further includes: A flat member unloading step, after the resin hardening step, unloading the flat member from the surface of the holding portion; and In the resin removal step, after the flat member unloading step, the resin attached to the groove of the holding portion is removed. 如請求項6至請求項求11任一項所述的保持構件的製造方法,還包括: 二次硬化步驟,在所述樹脂硬化步驟後,使所述樹脂進一步硬化。The manufacturing method of the holding member according to any one of claim 6 to claim 11, further comprising: In the secondary hardening step, after the resin hardening step, the resin is further hardened. 如請求項10或11所述的保持構件的製造方法,其中在所述樹脂填充步驟中,也向多個所述吸附孔中填充所述樹脂,且 所述保持構件的製造方法還包括: 平坦構件卸載步驟,在所述樹脂硬化步驟後,從所述保持部的表面卸載所述平坦構件; 樹脂去除步驟,在所述平坦構件卸載步驟後,去除附著在所述保持部的所述槽以外的所述樹脂;及 二次硬化步驟,在所述樹脂去除步驟後,使所述樹脂進一步硬化。The method of manufacturing a holding member according to claim 10 or 11, wherein in the resin filling step, the resin is also filled into the plurality of adsorption holes, and The manufacturing method of the holding member further includes: A flat member unloading step, after the resin hardening step, unload the flat member from the surface of the holding portion; A resin removing step, after the flat member unloading step, removing the resin attached to the groove of the holding portion; and In the secondary hardening step, after the resin removing step, the resin is further hardened.
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