TW202111017A - 高發射率氧化鈰塗層 - Google Patents
高發射率氧化鈰塗層 Download PDFInfo
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- TW202111017A TW202111017A TW109122428A TW109122428A TW202111017A TW 202111017 A TW202111017 A TW 202111017A TW 109122428 A TW109122428 A TW 109122428A TW 109122428 A TW109122428 A TW 109122428A TW 202111017 A TW202111017 A TW 202111017A
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- Prior art keywords
- oxide
- dopant
- coating
- composition
- coating composition
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- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 61
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 238000000576 coating method Methods 0.000 title claims description 66
- 239000011248 coating agent Substances 0.000 title claims description 62
- 239000000203 mixture Substances 0.000 claims abstract description 120
- 239000002019 doping agent Substances 0.000 claims abstract description 90
- 239000008199 coating composition Substances 0.000 claims abstract description 69
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical group [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 60
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims abstract description 47
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910000428 cobalt oxide Inorganic materials 0.000 claims abstract description 26
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910000423 chromium oxide Inorganic materials 0.000 claims abstract description 25
- 239000011230 binding agent Substances 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 10
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000000758 substrate Substances 0.000 claims description 49
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 36
- 239000000853 adhesive Substances 0.000 claims description 18
- 230000001070 adhesive effect Effects 0.000 claims description 18
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 18
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 claims description 17
- 239000011819 refractory material Substances 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- 239000000945 filler Substances 0.000 claims description 15
- 239000000919 ceramic Substances 0.000 claims description 12
- 235000012239 silicon dioxide Nutrition 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 8
- 239000004033 plastic Substances 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 239000011449 brick Substances 0.000 claims description 6
- 238000009413 insulation Methods 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 239000011094 fiberboard Substances 0.000 claims description 3
- -1 fiberlite Substances 0.000 claims description 3
- 239000004570 mortar (masonry) Substances 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910016006 MoSi Inorganic materials 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 claims description 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 2
- 229910021343 molybdenum disilicide Inorganic materials 0.000 claims description 2
- NUSDCJCJVURPFV-UHFFFAOYSA-N silicon tetraboride Chemical compound B12B3B4[Si]32B41 NUSDCJCJVURPFV-UHFFFAOYSA-N 0.000 claims description 2
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- CFOAUMXQOCBWNJ-UHFFFAOYSA-N [B].[Si] Chemical compound [B].[Si] CFOAUMXQOCBWNJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 239000002987 primer (paints) Substances 0.000 description 35
- 239000000243 solution Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 11
- 238000005507 spraying Methods 0.000 description 11
- 239000004965 Silica aerogel Substances 0.000 description 10
- 239000000843 powder Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 8
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000000498 ball milling Methods 0.000 description 4
- 230000001680 brushing effect Effects 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
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- 229910017119 AlPO Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910000503 Na-aluminosilicate Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- SXQXMCWCWVCFPC-UHFFFAOYSA-N aluminum;potassium;dioxido(oxo)silane Chemical compound [Al+3].[K+].[O-][Si]([O-])=O.[O-][Si]([O-])=O SXQXMCWCWVCFPC-UHFFFAOYSA-N 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010942 ceramic carbide Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910001940 europium oxide Inorganic materials 0.000 description 1
- AEBZCFFCDTZXHP-UHFFFAOYSA-N europium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Eu+3].[Eu+3] AEBZCFFCDTZXHP-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000002694 phosphate binding agent Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000429 sodium aluminium silicate Substances 0.000 description 1
- 235000012217 sodium aluminium silicate Nutrition 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000004230 steam cracking Methods 0.000 description 1
- RCKBMGHMPOIFND-UHFFFAOYSA-N sulfanylidene(sulfanylidenegallanylsulfanyl)gallane Chemical compound S=[Ga]S[Ga]=S RCKBMGHMPOIFND-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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Abstract
本發明係關於一種塗層組成物,其包含:
以該組成物之總重量計,10至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
以該組成物之總重量計,10至50 wt%之黏合劑。
Description
發明領域
本發明係關於一種塗層組成物(例如高發射率塗層組成物);一種用於製得該組成物之套組及方法;一種用該組成物塗佈基材之方法;及一種塗佈有該組成物之基材。
發明背景
高發射率塗層可用於在石化熔爐中降低能量及生產成本。高發射率材料用於覆蓋熔爐壁之內表面,使得其吸熱且重新發射熱量,且由此增加熱效率。習知地,氧化鉻用作蒸汽裂解熔爐中之高發射率塗層,但其僅可耐受1100℃或更低之溫度。高於此溫度,鉻之高蒸氣壓會引起塗層材料變得不穩定且開始崩解,引起其餘部分熔融。
氧化鈰為一種稀土類材料,其在化學上穩定且具有良好耐熱性,使得其適用於極端環境中(例如熔爐中)之高溫應用。
WO2016082610A1揭露一種耐高溫、防污及耐結渣陶瓷塗層,其按質量百分比計包含以下組分:15至30%填充劑、40至65%黏著劑,且其餘部分為水,其中該填充劑包含3至5%氧化鋯、3至5%碳化矽、3至5%氮化矽、1至3%氧化鈦、2至4%高嶺土及3至8%稀土氧化物。該稀土氧化物為氧化釔、氧化鈰及氧化銪之混合物。
US5668072A揭露一種用於塗佈在高於1100℃下操作之熔爐之內部的高發射率塗層組成物。較佳組成物包含氧化鈰及黏合劑。然而,該組成物在短於5微米之波長下產生的發射率較低。
發明概要
自第一態樣看,本發明提供一種塗層組成物,其包含:
以該組成物之總重量計,10至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
以該組成物之總重量計,10至50 wt%之黏合劑。
本發明之較佳塗層組成物進一步包含發射率劑(emissivity agent)。
自另一態樣看,本發明提供一種含有如上文所描述之塗層組成物的封裝體。
自另一態樣看,本發明提供一種用於製備如上文所描述之塗層組成物的套組,其包含:
(i) 含有包含摻雜劑之氧化鈰的第一容器,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
(ii) 混合該包含摻雜劑之氧化鈰與黏合劑之說明書。
自另一態樣看,本發明提供一種用於製備如上文中所定義之塗層組成物之方法,其包含以下步驟:
i) 用選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物之摻雜劑摻雜氧化鈰,得到包含摻雜劑之氧化鈰;及
ii) 將該包含摻雜劑之氧化鈰與黏合劑混合。
自另一態樣看,本發明提供一種用於製備經塗佈之基材之方法,其包含以下步驟:
a) 提供基材;
b) 將如上文所描述之塗層組成物塗覆至該基材之至少一個表面上;及
c) 加熱該塗層組成物以形成經塗佈之基材。
自另一態樣看,本發明提供一種可藉由如上文所描述之方法獲得或藉由其獲得的經塗佈之基材。
自另一態樣看,本發明提供一種包含或得自如上文所描述之組成物的經塗佈之基材。
自另一態樣看,本發明提供一種經塗佈之基材,其中該塗層包含:
以該塗層之總重量計,10至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
以該塗層之總重量計,20至55 wt%之黏合劑。
自另一態樣看,本發明提供一種熔爐,其包含如上文所描述之經塗佈之基材。
自另一態樣看,本發明提供如上文所描述之塗層組成物塗佈基材之用途。
較佳實施例之詳細說明
定義
如本文所用,術語「摻雜劑」係指以低濃度併入物質中以改變物質之電學或光學特性的痕量化合物。本發明之組成物中所存在的包含摻雜劑之氧化鈰可例如包含以包含摻雜劑之氧化鈰的總重量計,至多50 wt%之摻雜劑。較佳地,以包含摻雜劑之氧化鈰之總重量計,包含摻雜劑之氧化鈰包含40 wt%或更少之摻雜劑。
如本文所用,術語「黏合劑」係指使其他材料保持或聚集在一起之材料物質。
除非另外規定,否則如本文所用,術語「wt%」係基於組成物之總重量。
如本文所用,術語「乾wt%」係基於組成物之非液體化合物(例如,不包括水)之總重量。
如本文所用,術語「發射率」係指材料以熱輻射形式發射能量的有效度。通常使用發射率儀來量測發射率。
如本文所用,術語「發射率劑」係指增加其所添加至的塗層組成物之發射率的材料。
如本文所用,術語「填充劑」係指增加高發射率塗層組成物對應力及熱應力之抗性的材料。
如本文所用,術語「加熱」包括加熱及熱處理。
本發明提供一種塗層組成物,其包含:
以該組成物之總重量計,10至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;及
以該組成物之總重量計,10至50 wt%之黏合劑。
本發明有利地提供一種高發射率塗層組成物,其可承受高於1100℃之溫度且在高於1100℃之溫度下在寬波長範圍內亦具有至少0.9之高發射率。此等特性使得本發明之塗層組成物尤其適用於塗佈鍋爐之內表面以增加其熱效率。
本發明之較佳組成物包含以該組成物之總重量計,10至70 wt%、更佳10至60 wt% (例如40至60 wt%)、再更佳10至45 wt%之包含摻雜劑之氧化鈰。
本發明之較佳組成物包含以該組成物之總重量計,10至45 wt%,更佳10至40 wt%之黏合劑。
本發明之組成物之所有成分之總重量係100 wt%。
較佳地,摻雜劑金屬與鈰之原子比在0.01:1至0.5:1、更佳0.01:1至0.3:1、甚至更佳0.01:1至0.25:1、又更佳0.01:1至0.2:1且再更佳0.05:1至0.2:1範圍內。
在本發明之較佳組成物中,以包含摻雜劑之氧化鈰之總重量計,包含摻雜劑之氧化鈰包含0.4至50 wt%、更佳0.4至37 wt%、甚至更佳0.4至32 wt%、又更佳0.4至28 wt% (例如2至28 wt%)之摻雜劑。當摻雜劑為氧化鈷時,以包含摻雜劑之氧化鈰之總重量計,本發明之尤其較佳之組成物包含0.4至28 wt%、較佳0.4至25 wt%且再更佳0.4至18 wt%之摻雜劑。當摻雜劑為氧化鐵或氧化鉻時,以包含摻雜劑之氧化鈰之總重量計,本發明之尤其較佳之組成物包含0.4至37 wt%、較佳0.5至35 wt%且再更佳0.7至32 wt%之摻雜劑。當摻雜劑為氧化鑭時,以包含摻雜劑之氧化鈰之總重量計,本發明之尤其較佳之組成物包含1.0至50 wt%、較佳1.5至50 wt%且再更佳1.75至49 wt%之摻雜劑。
在本發明之較佳組成物中,摻雜劑係選自氧化鐵、氧化鈷、氧化鉻或其混合物。在其他較佳組成物中,摻雜劑為氧化鐵(Fe2
O3
)。在替代較佳組成物中,摻雜劑為氧化鈷(CoO)。
較佳地,黏合劑為磷酸鋁無機黏合劑。適合黏合劑包括(但不限於)磷酸(H3
PO4
)、鋁矽酸鈉及/或鋁矽酸鉀,以形成例如Al2
(H2
P2
O7
)、Al(PO3
)3
、AlPO4
及/或KAlSi3
O8
。
本發明之較佳塗層組成物進一步包含水。本發明之較佳塗層組成物進一步包含10至40 wt%水,且更佳20至30 wt%水(例如25 wt%)。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總重量計,40至60 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該組成物之總重量計,10至40 wt%之黏合劑;及
以該組成物之總重量計,10至40 wt%之水。
本發明之較佳塗層組成物進一步包含至少一種發射率劑。較佳地,以塗層組成物之總重量計,塗層組成物包含2至60 wt%、更佳5至50 wt%、甚至更佳5至40 wt% (例如35 wt%)之至少一種發射率劑。
較佳發射率劑包括(但不限於)二氧化鈦(TiO2
)、碳化矽(SiC)、氧化鉻(Cr2
O3
)、二氧化矽(SiO2
)、氧化鐵(Fe2
O3
)、矽化硼(B4
Si)、碳化硼(B4
C)、四硼化矽(SiB4
)、二矽化鉬(MoSi2
)、二矽化鎢(WSi2
)及二硼化鋯(ZrB2
)或其混合物。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總重量計,10至45 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該組成物之總重量計,10至40 wt%之黏合劑;
以該組成物之總重量計,5至40 wt%之至少一種發射率劑;及
以該組成物之總重量計,10至40 wt%之水。
本發明之較佳塗層組成物進一步包含至少一種填充劑。較佳地,以塗層組成物之總重量計,塗層組成物包含5至50 wt%、更佳5至40 wt%、再更佳5至35 wt%、且再更佳8至30 wt%之至少一種填充劑。
填充劑為增加高發射率塗層組成物對應力及熱應力之抗性的材料。較佳填充劑包括(但不限於)氧化鋁、二氧化矽、陶瓷硼化物、陶瓷碳化物、陶瓷氮化物或其混合物。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總重量計,10至45 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該組成物之總重量計,10至40 wt%之黏合劑;
以該組成物之總重量計,5至40 wt%之至少一種發射率劑;
以該組成物之總重量計,5至35 wt%之至少一種填充劑;及
以該組成物之總重量計,10至40 wt%之水。
本發明之塗層組成物為高發射率塗層組成物,意謂其能夠高效吸收且重新發射熱量。本發明之塗層組成物因此較佳產生在1至25 μm之波長範圍內發射率為0.85至0.98、更佳0.90至0.98、甚至更佳0.95至0.98之塗層。較佳根據在本文中之實例章節中所述之方法,例如在600℃、900℃、1200℃及/或1600℃之溫度下測試發射率。
本發明之塗層組成物亦具有充當高發射率塗層所需的其他特性,例如,熱衝擊抗性、耐磨性及黏著力。
本發明亦提供一種封裝體,其含有如上文所描述之塗層組成物。本發明之封裝體包括容器、桶、瓶、盒、罐、廣口瓶、小袋等。
本發明亦提供一種用於製備如上文所描述之塗層組成物的套組,其包含:
(i) 含有包含摻雜劑之氧化鈰的第一容器,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
(ii) 混合該包含摻雜劑之氧化鈰與黏合劑之說明。
較佳套組進一步包含含有黏合劑之第二容器。
本發明亦提供一種用於製備如上文中所定義之塗層組成物之方法,其包含以下步驟:
i) 用選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物之摻雜劑摻雜氧化鈰,得到包含摻雜劑之氧化鈰;及
ii) 將該包含摻雜劑之氧化鈰與黏合劑混合。
較佳地,步驟(i)包含將氧化鈰及摻雜劑在一起研磨(例如藉由球磨),且較佳在100至120℃之溫度下乾燥所得混合物。較佳地,將氧化鈰及摻雜劑研磨至粒度小於150 μm,更佳小於100 μm。甚至更佳地,將氧化鈰及摻雜劑研磨至粒度在10至60 μm範圍內,最佳在20至60 μm範圍內。該等粒度提供由塗層組成物產生的具有良好機械特性之塗層。
本發明亦提供一種用於製備經塗佈之基材之方法,其包含以下步驟:
a) 提供基材;
b) 將如上文所描述之塗層組成物塗覆至該基材之至少一個表面上;及
c) 加熱該塗層組成物以形成經塗佈之基材。
在本發明之較佳方法中,基材係選自以下中之至少一者:二氧化矽隔熱磚、陶瓷纖維、陶瓷模組、耐火磚、塑膠耐火材料、可鑄性耐火材料、耐火砂漿、飛薄萊特(fiberlite)、瓷磚、纖維板陣列及金屬。基材可為在熔爐(例如裂解熔爐)、火焰加熱器、預熱器、重組器(reformer)、領域內之其他耐火設備之內襯套、結構及/或部件、使用時經歷高溫之陶瓷汽車用部件、耐火航太部件或船舶部件。在本發明之較佳方法中,在熔爐中之耐火材料上原位進行塗佈及加熱步驟。
在本發明之較佳方法中,基材為耐火材料,較佳塑膠耐火材料。塑膠耐火材料為不需要另外製備即用於塗覆的在硬性塑膠條件下製備的耐火材料之混合物。其一般用氣動錘原位衝壓或用槌進行舂搗。歸因於其低孔隙率,塑膠耐火材料可容易適用於進行快速、經濟的緊急修復,且可衝壓成任何形狀或輪廓。
在本發明之較佳方法中,基材具有底塗劑塗層(亦即,底塗層)。底塗劑塗層起作用以改良最終塗層組成物之隔熱性。較佳地,用於形成底塗劑塗層之底塗劑包含氧化矽與二氧化矽氣凝膠之混合物。較佳地,用於形成底塗劑塗層之底塗劑包含氧化矽與二氧化矽氣凝膠之混合物,其重量比為9:1至1:1,更佳8:2至4:6 (例如8:2)。較佳地,用於形成底塗劑塗層組成物之底塗劑進一步包含磷酸鋁溶液。
在本發明之較佳方法中,藉由選自噴塗、刷塗、浸塗或其組合之方法在步驟(b)中塗覆塗層組成物。更佳地,藉由噴塗,甚至更佳藉由空氣噴塗或無空氣噴塗在步驟(b)中塗覆塗層組成物。
在本發明之較佳方法中,步驟(c)提供厚度為100至300 μm,更佳150至250 μm (例如200 μm)的塗層組成物之層。
在本發明之較佳方法中,加熱步驟(c)係在500℃至1700℃,更佳1000℃至1500℃(例如1200℃)之溫度下進行。
在本發明之較佳方法中,加熱步驟(c)係持續1至5小時,更佳1至4小時(例如2小時)。
本發明方法中所用之加熱步驟(c)較佳自塗層組成物移除水(例如藉由蒸發)。
本發明之較佳組成物包含以該組成物之總乾重計,10至80乾wt% (例如53至80乾wt%)、更佳10至70乾wt%、再更佳13.3至60乾wt%之包含摻雜劑之氧化鈰。
本發明之較佳組成物包含以該組成物之總乾重計,20至55乾wt%,更佳20至50乾wt%之黏合劑。適合黏合劑係如上文所描述。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總乾重計,53至80乾wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;及
以該組成物之總重量計,20至50乾wt%之黏合劑。
本發明之較佳塗層組成物進一步包含如上文所描述之至少一種發射率劑。較佳地,塗層組成物包含以該組成物之總乾重計,2至60乾wt%、更佳5至55乾wt%、甚至更佳6.7至53.3乾wt% (例如50乾wt%)之至少一種發射率劑。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總乾重計,13.3至60乾wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該組成物之總乾重計,20至50乾wt%之黏合劑;
以該組成物之總乾重計,6.7至53.3乾wt%之至少一種發射率劑。
本發明之較佳塗層組成物進一步包含如上文所描述之至少一種填充劑。較佳地,塗層組成物包含以該組成物之總乾重計,5至60乾wt%、更佳5至50乾wt%、再更佳6.7至46.7乾wt%之至少一種填充劑。
尤其較佳的本發明之塗層組成物包含:
以該組成物之總重量計,13.3至60乾wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該組成物之總乾重計,20至50乾wt%之黏合劑;
以該組成物之總乾重計,6.7至53.3乾wt%之至少一種發射率劑;及
以該組成物之總乾重計,6.7至46.7乾wt%之至少一種填充劑。
本發明之一較佳方法包含以下步驟:
a)提供基材;
ai) 將底塗劑塗覆於該基材之至少一個表面上;
aii) 乾燥該底塗劑,得到具有底塗劑塗層之基材;
b) 將如上文中所定義之塗層組成物塗覆於具有底塗劑塗層之該基材的該底塗劑塗層上;及
c) 加熱該塗層組成物以形成經塗佈之基材。
在本發明之較佳方法中,底塗劑包含氧化矽與二氧化矽氣凝膠之混合物。更佳地,氧化矽與二氧化矽氣凝膠之混合物中的氧化矽與二氧化矽氣凝膠之比率為9:1至1:1、更佳8:2至4:6 (例如8:2)。
較佳地,底塗劑進一步包含磷酸鋁溶液。
較佳地,底塗劑包含以該底塗劑之總重量計,10至50 wt%之磷酸鋁溶液;及以該底塗劑之總重量計,50至90 wt%之二氧化矽氧化物與二氧化矽氣凝膠之混合物。更佳地,底塗劑包含以該底塗劑之總重量計,25至50 wt%之磷酸鋁溶液;及以該底塗劑之總重量計,50至75 wt%之二氧化矽氧化物與二氧化矽氣凝膠之混合物。例如,該底塗劑較佳包含以該底塗劑之總重量計,50 wt%之磷酸鋁溶液;及以該底塗劑之總重量計,50 wt%之二氧化矽氧化物與二氧化矽氣凝膠之混合物。
在本發明之較佳方法中,藉由選自噴塗、刷塗、浸塗或其組合之方法在步驟(ai)中塗覆底塗劑。更佳地,藉由噴塗,甚至更佳藉由空氣噴塗在步驟(ai)中塗覆底塗劑。
在本發明之較佳方法中,步驟(aii)提供厚度為100至300 μm,更佳150至250 μm (例如200 μm)之底塗劑之層。
在本發明之較佳方法中,乾燥步驟(aii)係在室溫下進行。
在本發明之較佳方法中,乾燥步驟(aii)係持續0.5至5小時,更佳1至4小時(例如2小時)。
在本發明之較佳方法中,加熱步驟(c)係在500℃至1700℃,更佳1000℃至1500℃(例如1200℃)之溫度下進行。
在本發明之較佳方法中,加熱步驟(c)係持續1至5小時,更佳1.5至4小時(例如2小時)。
在本發明之較佳方法中,藉由選自噴塗、刷塗、浸塗或其組合之方法在步驟(b)中塗覆塗層組成物。更佳地,藉由噴塗,甚至更佳藉由空氣噴塗在步驟(b)中塗覆塗層組成物。
在本發明之較佳方法中,步驟(c)提供厚度為100至300 μm,更佳150至250 μm (例如200 μm)的塗層組成物之層。
本發明亦提供一種可由如上文所描述之方法獲得或由其獲得的經塗佈之基材。
本發明亦提供一種包含如上文所描述之組成物的經塗佈之基材。
本發明亦提供一種經塗佈之基材,其中該塗層包含:
以該塗層之總重量計,10至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;及
以該塗層之總重量計,20至55 wt%之黏合劑。
較佳塗層包含以該塗層之總重量計,53至80 wt%、更佳10至70 wt%且再更佳13.3至60 wt%之氧化鈰。
較佳摻雜劑及摻雜劑之量係如上文關於塗層組成物所闡述。摻雜劑金屬與鈰之較佳原子比率係如上文關於塗層組成物所闡述。
本發明之較佳塗層包含以該塗層之總重量計,20至50 wt%之黏合劑。適合黏合劑係如上文所描述。
尤其較佳的本發明之塗層包含:
以該塗層之總重量計,53至80 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;及
以該塗層之總重量計,20至50 wt%之黏合劑。
本發明之較佳塗層進一步包含如上文所描述之至少一種發射率劑。較佳地,塗層包含以該塗層之總重量計,2至60 wt%、更佳5至55 wt%、甚至更佳6.7至53.3 wt% (例如50 wt%)之至少一種發射率劑。
尤其較佳的本發明之塗層包含:
以該塗層之總重量計,13.3至60 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該塗層之總重量計,20至50 wt%之黏合劑;
以該塗層之總重量計,6.7至53.3 wt%之至少一種發射率劑。
本發明之較佳塗層進一步包含如上文所描述之至少一種填充劑。較佳地,塗層包含以該塗層之總重量計,5至60 wt%、更佳5至50 wt%、再更佳6.7至46.7 wt%之至少一種填充劑。
尤其較佳的本發明之塗層包含:
以該塗層之總重量計,13.3至60 wt%之包含摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物;
以該塗層之總重量計,20至50 wt%之黏合劑;
以該塗層之總重量計,6.7至53.3 wt%之至少一種發射率劑;及
以該塗層之總重量計,6.7至46.7 wt%之至少一種填充劑。
較佳經塗佈之基材包括經塗佈之耐火材料,更佳選自以下之經塗佈之耐火材料:二氧化矽隔熱磚、陶瓷纖維、陶瓷模組、耐火磚、塑膠耐火材料、可鑄性耐火材料、耐火砂漿、飛薄萊特(fiberlite)、瓷磚、纖維板陣列及金屬。
本發明亦提供一種熔爐,其包含如上文所描述之經塗佈之基材。
本發明亦提供如上文所描述之塗層組成物塗佈基材之用途。
將瞭解,儘管本發明之具體實施例已出於說明目的描述於本文中,但仍可在不脫離本揭露內容之範疇之情況下進行各種修改。因此,本揭露內容不受除所附申請專利範圍之外之限制。
在以下部分中,藉助於實例示出本發明之其他優點及特徵。
實例
材料
全部起始材料均可購自西格瑪奧德里奇(Sigma Aldrich)。
量測方法
在600℃、900℃、1300℃及1600℃之溫度下使用FTIR紅外發射率儀量測發射率,該發射率儀經改良以包括配備有黑體參考物及基於CO2
雷射之整合式軸對稱加熱系統的計算機受控之圓形轉台。在量測期間,藉由CO2
雷射加熱樣品,使其進行輻射。由FTIR儀器偵測此輻射/發射。藉由計算樣品光譜發射率強度與黑體光譜發射率強度之比率來測定光譜發射率。
製備實例:底塗劑塗層之製備
將氧化矽及二氧化矽氣凝膠以8:2之重量比混合在一起。隨後,藉由將50 wt%之氧化矽/二氧化矽氣凝膠混合物與含有50% v/v磷酸鋁之50 wt%之磷酸鋁溶液混合來製備底塗劑。
使用塑膠耐火材料作為基材,其係藉由模鑄成115 × 76 × 25 mm之尺寸而製得。用底塗劑塗佈之前,將基材在大氣條件下乾燥隔夜且隨後在1500℃下熱處理2小時。隨後在塗佈之前將基材冷卻至室溫。
藉由噴塗至厚度為300 μm而將塗佈溶液噴至冷卻基材上。隨後將其在室溫下乾燥30分鐘,獲得經底塗劑塗佈之基材。
非摻雜型氧化鈰之製備比較實例 1
藉由將50 wt%之氧化鈰(CeO2
)粉末與含有50% v/v磷酸鋁之50 wt%之磷酸鋁水溶液混合來製備塗佈溶液。
將非摻雜型氧化鈰塗佈溶液直接噴至根據製備實例製備的經底塗劑塗佈之基材上達至300 μm厚度。隨後將經塗佈之試樣在1200℃下以1℃/分鐘之加熱速率燒結3小時。
根據上文所述之方法量測經塗佈之基材之發射率。
發現非摻雜型CeO2
塗層在1300℃及1600℃二者下在中紅外波長(亦即,5至25 μm)下顯示在0.8至0.98範圍內之高發射率,然而在近紅外波長(亦即,低於5 μm)下,二個溫度下之發射率下降至約0.22。
摻雜型氧化鈰之製備實例 2
製備84.3 wt%氧化鈰(CeO2
)粉末與15.7 wt%氧化鐵(Fe2
O3
) (亦即,原子比為1:0.2)之混合物,其中wt%值係以混合物之總重量計。藉由球磨研磨且混合混合組成物。隨後,去除球且將組成物在110℃下乾燥隔夜,獲得呈粉末形式之混合組成物。
藉由將50 wt%之粉末與含有50% v/v磷酸鋁之50 wt%之磷酸鋁水溶液混合來製備塗佈溶液。
將經Fe2
O3
摻雜之氧化鈰塗佈溶液直接噴至根據製備實例製備的經底塗劑塗佈之基材上達至300 μm厚度。隨後將塗佈試樣在1200℃下以1℃/分鐘之加熱速率燒結3小時。
根據上文所述之方法量測經塗佈之基材之發射率。
發現經Fe2
O3
摻雜之CeO2
塗層顯示發射率隨溫度增加而增加。基於300℃下之發射率,經Fe2
O3
摻雜之CeO2
塗層在600℃下之發射率增加45%,且在1300℃及1600℃之溫度下在整個波長範圍(1至25 μm)內達至0.90至0.98之發射率值。實例 3
製備92.0 wt%氧化鈰粉末與8.0 wt%氧化鈷(CoO) (亦即,原子比為1:0.2)之混合物,其中wt%值係以混合物之總重量計。藉由球磨研磨且混合混合組成物。隨後,去除球且將組成物在110℃下乾燥隔夜,獲得呈粉末形式之混合組成物。
藉由將50 wt%之粉末與含有50% v/v磷酸鋁之50 wt%之磷酸鋁水溶液混合來製備塗佈溶液。
將經CoO摻雜之氧化鈰塗佈溶液直接噴至未經塗佈之基材上達至300 μm厚度。隨後將塗佈試樣在1200℃下以1℃/分鐘之加熱速率燒結3小時。
根據上文所述之方法量測經塗佈之基材之發射率。
基於600℃下之發射率,經CoO摻雜之CeO2
塗層在900℃下之發射率增加50%,且在整個波長範圍(1至25 μm)內達成呈約0.9之發射率的飽和值。實例 4
製備72.5 wt%氧化鈰(CeO2
)粉末與27.5 wt%氧化鑭(La2
O3
) (亦即,原子比為1:0.2)之混合物,其中wt%值係以混合物之總重量計。藉由球磨研磨且混合混合組成物。隨後,去除球且將組成物在110℃下乾燥隔夜,獲得呈粉末形式之混合組成物。
藉由將50 wt%之粉末與含有50% v/v磷酸鋁之50 wt%之磷酸鋁水溶液混合來製備塗佈溶液。
將經La2
O3
摻雜之氧化鈰塗佈溶液直接噴至根據製備實例製備的經底塗劑塗佈之基材上達至300 μm厚度。隨後將塗佈試樣在1200℃下以1℃/分鐘之加熱速率燒結3小時。
燒結之後檢查所有實例之外觀,且在所有情況下均發現,塗層呈現緻密且在表面上不存在裂縫。
圖1係根據下文所述之實例4製備的塗佈樣品之截面之光學相片。
圖2係根據下文所述之實例2及實例4製備的塗佈樣品之頂部表面之光學相片。
Claims (13)
- 一種塗層組成物,其包含: 以該組成物之總重量計,10至80 wt%、且較佳為10至70 wt%之包含一摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且較佳為氧化鐵、氧化鈷或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;以及 以該組成物之總重量計,10至50 wt%,且較佳為10至45 wt%之黏合劑。
- 如請求項1之塗層組成物,其中摻雜劑金屬與鈰之該原子比在0.05:1至0.5:1範圍內。
- 如請求項1或2之塗層組成物,其中該黏合劑為一種磷酸鋁無機黏合劑。
- 如請求項1至3中任一項之塗層組成物,其進一步包含一發射率劑(emissivity agent)及/或一填充劑。
- 如請求項4之塗層組成物,其中該發射率劑係選自二氧化鈦(TiO2 )、碳化矽(SiC)、氧化鉻(Cr2 O3 )、二氧化矽(SiO2 )、氧化鐵(Fe2 O3 )、矽化硼(B4 Si)、碳化硼(B4 C)、四硼化矽(SiB4 )、二矽化鉬(MoSi2 )、二矽化鎢(WSi2 )以及二硼化鋯(ZrB2 )或其混合物。
- 一種封裝體,其含有如請求項1至5中任一項之組成物。
- 一種套組,其用於製備如請求項1至5中任一項之塗層組成物,該套組包含: (i) 含有包含一摻雜劑之氧化鈰的一第一容器,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且摻雜劑金屬與鈰之原子比在0.01:1至0.5:1範圍內;以及 (ii) 混合該包含一摻雜劑之氧化鈰與一黏合劑之說明。
- 一種用於製備如請求項1至5中任一項之塗層組成物之方法,其包含以下步驟: i) 用選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物之一摻雜劑摻雜氧化鈰,以得到包含一摻雜劑之氧化鈰;以及 ii) 將該包含一摻雜劑之氧化鈰與一黏合劑混合。
- 一種用於製備一經塗佈之基材之方法,其包含以下步驟: a)提供一基材,其較佳選自二氧化矽隔熱磚、陶瓷纖維、陶瓷模組、耐火磚、塑膠耐火材料、可鑄性耐火材料、耐火砂漿、飛薄萊特(fiberlite)、瓷磚、一纖維板陣列以及金屬; b)將如請求項1至5中任一項中之塗層組成物塗覆至該基材之至少一個表面上;以及 c) 加熱該塗層組成物以形成該經塗佈之基材。
- 一種經塗佈之基材,其包含如請求項1至5中任一項中之組成物,且較佳為一經塗佈之耐火材料。
- 一種經塗佈之基材,其較佳為經塗佈之耐火材料,其中該塗層包含: 以該塗層之總重量計,10至80 wt%之包含一摻雜劑之氧化鈰,其中該摻雜劑係選自氧化鐵、氧化鈷、氧化鉻、氧化鑭或其混合物,且較佳為氧化鐵、氧化鈷或其混合物,其中摻雜劑與氧化鈰之原子比在0.01:1至0.5:1,且較佳為0.05:1至0.5:1範圍內;以及 以該塗層之總重量計,20至55 wt%之黏合劑。
- 一種熔爐,其包含如請求項10或11之經塗佈之基材。
- 一種如請求項1至5中任一項中之塗層組成物之用途,係用於塗佈一基材。
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CN115637065B (zh) * | 2022-09-29 | 2023-10-13 | 包头市安德窑炉科技有限公司 | 一种含氧化铈铁渣在制备辐射材料中的应用 |
CN115975453B (zh) * | 2023-03-07 | 2023-09-08 | 诺斯科技(天津)有限公司 | 一种片状稀土基高辐射散热涂料及其制备方法和应用 |
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