TW202104684A - Dust container, apparatus and process of single crystal growth - Google Patents

Abstract

The present application provides a dust container, an apparatus and a process of single crystal growth. The dust container comprises: a container body; a filtration device in the container body; the filtration device comprises a separation plate and at least one filter cartridge; the filter cartridge has one terminal connecting to the separation plate and an opening exposed to the surface of the separation plate, and another terminal extending toward the lower part of the container body; a gas inlet located on side wall of the lower part of the container body, an exhaust vent located on side wall of the upper part of the container body; a cleaning device in the container body comprising a connecting rod, a fixing plate and a cleaning unit; a driving device connecting to the connecting rod to driving the cleaning device to move up and down to clean the side wall of the filter cartridge. By applying the dust container, after each manufacturing process, the surface of the filter cartridge can be cleaned by the cleaning device installed within the dust container. It facilitates to improve surface cleanness of the filter cartridge, prolong life time of the vacuum pump, reduce labor costs and guarantee personnel health.

Description

Dust collecting tank, single crystal growth equipment and single crystal growth method

The present invention relates to the field of wafer manufacturing, in particular to a dust collecting tank, single crystal growth equipment and single crystal growth method.

Monocrystalline silicon wafers are one of the most important raw materials in wafer production. The manufacturing process usually includes: deoxidizing and purifying silicon-containing materials (quartz sand) to obtain high-purity crystalline silicon. The crystalline silicon is formed by high-temperature molding and spinning. It is drawn into a round crystal rod by stretching and other methods, and then a single crystal silicon wafer is obtained through processes such as cutting and grinding. The process of refining high-purity crystalline silicon and pulling it into ingots is called single crystal growth, which is usually carried out in a single crystal furnace. This process determines the purity of the single crystal silicon wafer. As the wafer manufacturing industry has increasingly higher requirements for the purity of single crystal silicon wafers, fabs are committed to reducing pollution during the growth of single crystals in order to improve the purity of single crystal silicon.

Oxide particles are inevitably produced during the growth of single crystals. The current common method is to discharge the exhaust gas containing oxide particles into a dust collecting tank via a vacuum pump. The dust collecting tank usually includes a tank body and a filter element located in the tank body. , The oxide particles are filtered by the filter element and deposited in the tank, and the filtered gas is discharged through the exhaust port on the tank. However, in this process, the oxide particles are easy to adhere to the surface of the filter element, which affects the filtration performance of the filter element, and even causes the blockage of the filter element in severe cases. Although the fab will manually clean the filter element every time the ingot is drawn, or use the pressure difference back blow to achieve the effect of cleaning the filter element, the manual cleaning of the filter element requires disassembly of the tank body, not only It is time-consuming and laborious, and may pose a threat to human health; although gas back-blowing is more convenient, if the surface of the filter element is blocked before back-blowing, the effect of back-blowing is almost zero, which will seriously affect the subsequent crystal pulling. Pressure will also damage the screw of the vacuum pump. If the oxide particles on the filter element cannot be removed in time, it will affect the exhaust emissions during the growth of the single crystal silicon, and affect the quality of the single crystal silicon. Even when the equipment fails, the oxide particles may be poured into the single crystal furnace. Cause serious production accidents.

In view of the shortcomings of the above-mentioned conventional technology, the purpose of the present invention is to provide a dust collecting tank, a single crystal growth device and a single crystal growth method, which are used to solve the time-consuming and laborious cleaning of the dust collecting tank in the prior art, and the gas blowback effect Poor, and the single crystal silicon quality degradation caused by the inability to remove oxide particles in time.

In order to achieve the above-mentioned objects and other related objects, the present invention provides a dust-collecting tank. The dust-collecting tank includes: a tank body with an air inlet, an exhaust port, and a dust removal port; and a filter device located in the tank body. The tank body; the filter device includes an isolation disk and at least one filter core, the isolation disk divides the tank body into an upper part and a lower part; one end of the filter core is connected with the isolation disk and the filter core The opening is exposed on the surface of the isolation disc, and the other end extends toward the lower part of the tank body; the air inlet is located on the side wall of the lower part of the tank body, and the exhaust port is located on the side wall of the upper part of the tank body The cleaning device is located in the tank; the cleaning device includes a connecting rod, a fixing plate and a cleaning unit; the connecting rod is connected to the fixing plate, and the connecting rod penetrates the isolation disc and faces the The upper part of the tank body extends; the fixing plate is located below the isolation disc; the cleaning unit is connected to the fixing plate and is in contact with the side wall of the filter element; a driving device is connected to the cleaning device The connecting rod is connected to drive the cleaning device to move up and down to clean the side wall of the filter element.

In an embodiment, the cleaning unit includes a rubber scraper, and the number of the cleaning unit is the same as the number of the filter element; the cleaning unit is correspondingly sleeved on the outer wall of the filter element.

In one embodiment, the tank body further has a top opening, a three-way valve is provided at the top opening, and the driving device can extend into the tank body and the cleaning device through the top opening. The rods are connected.

In one embodiment, the isolation disc is an isolation flange, the number of the filter element is multiple, and the multiple filter elements are evenly distributed; the driving device is an air cylinder.

In an embodiment, the cleaning device further includes a sealing ring sleeved on the connecting rod, and the sealing ring is in contact with the fixing plate.

In an embodiment, the dust collecting tank further includes a plurality of uprights connected to the bottom of the tank body for supporting the tank body; the lower part of the tank body is in the shape of a funnel, and the dust removal port is located at The bottom of the tank.

In an embodiment, the dust collection tank further includes a guide post and a spring, which are located in the tank body; one end of the guide post is connected with the isolation disk, and the other end extends toward the lower part of the tank body; The spring is located below the fixed plate of the cleaning device and the spring is sleeved on the fixed rod.

The present invention also provides a single crystal growth equipment. The single crystal growth equipment includes a furnace body, an exhaust device, and the dust collecting tank as described in any of the foregoing embodiments; the air inlet of the dust collecting tank and the The exhaust port of the furnace body is connected, and the exhaust port of the dust collecting tank is connected with the exhaust device.

The exhaust device includes a vacuum pump and an exhaust gas processing unit, one end of the vacuum pump is connected with the exhaust port of the dust collecting tank, and the other end is connected with the exhaust gas processing unit.

The present invention also provides a single crystal growth method, which is performed based on the single crystal growth device described in any one of the foregoing solutions.

As mentioned above, the dust collecting tank, single crystal growth equipment and single crystal growth method of the present invention have the following beneficial effects: the dust collecting tank of the present invention can use its own cleaning device to filter after each production process. Cleaning the surface of the core can effectively make up for the deficiencies of the existing cleaning methods, help improve the cleanliness of the surface of the filter element, and extend the service life of the vacuum pump; and the entire cleaning process can be fully automated, which is beneficial to reduce labor costs and protect personnel health ; Using the single crystal growth equipment and single crystal production method of the present invention for single crystal growth helps stabilize the internal pressure in the single crystal growth process, helps to improve the single crystal growth quality and reduce production costs.

The following specific examples illustrate the implementation of the present invention. Those familiar with this technology can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

Please refer to Figure 1 to Figure 4. It should be noted that the structures, proportions, sizes, etc. shown in the accompanying drawings in this specification are only used to match the content disclosed in the specification for people familiar with this technology to understand and read, and are not intended to limit the implementation of the present invention. Limited conditions, so it has no technical significance. Any structural modification, proportional relationship change or size adjustment should still fall under the present invention without affecting the effects and objectives that can be achieved by the present invention. Within the scope of the disclosed technical content. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" cited in this specification are only for convenience of description, rather than limiting the scope of the present invention. The scope of implementation, and the change or adjustment of the relative relationship, shall also be regarded as the scope of the implementation of the present invention without substantial changes to the technical content.

Example one

As shown in Figures 1 to 3, the present invention provides a dust collecting tank 1, the dust collecting tank 1 includes: a tank body 11, the tank body 11 has an air inlet 111, an exhaust port 112, and a dust removal port 113 The filter device 12 is located in the tank body 11; the filter device 12 includes an isolation disc 121 and at least one filter element 122, the isolation disc 121 separates the tank body 11 into an upper part and a lower part; the filter element One end of 122 is connected to the isolation disc 121 and the opening of the filter element 122 is exposed to the surface of the isolation disc 121, and the other end extends toward the lower part of the tank body 11 and is preferably connected to the bottom of the tank body 11. The air inlet 111 is located on the side wall of the lower part of the tank body 11, and the air outlet 112 is located on the side wall of the upper part of the tank body 11; enters the tank body 11 through the air inlet 111 After the exhaust gas containing oxide particles and other impurities is filtered by the filter element 122, the gas rises from the filter element 122 to the upper part of the tank body 11 and is discharged through the exhaust port 112, and the oxide Particles and other impurities settle to the bottom of the tank 11 and are discharged through the dust removal port 113; the cleaning device 13 is located in the tank 11; the cleaning device 13 includes a connecting rod 131, a fixing plate 132, and a cleaning device. Unit 133; the connecting rod 131 is connected to the fixing plate 132, and the connecting rod 131 penetrates the isolation plate 121 and extends to the upper part of the tank 11; the fixing plate 132 is located on the isolation plate 121 below; the cleaning unit 133 is connected to the fixed plate 132 and is in contact with the side wall of the filter element 122; the driving device 14 is connected to the connecting rod 131 of the cleaning device 13 for driving The cleaning device 13 moves up and down to clean the side wall of the filter element 122. The dust collecting tank 1 of the present invention can use its own cleaning device 13 to clean the surface of the filter element 122 after each production process, which can effectively make up for the deficiencies of the existing cleaning methods and help improve the surface of the filter element 122. Cleanliness, prolongs the service life of the vacuum pump; and the entire cleaning process can be fully automated, which is beneficial to reduce labor costs and protect personnel health.

The main body shape of the tank body 11 can be cylindrical, rectangular or any other shape. In this embodiment, as an example, the main body of the tank body 11 is cylindrical, the lower part is funnel-shaped, the dust removal port 113 is located at the bottom of the tank body 11, and a valve (not shown) is provided at the dust removal port 113. Mark), so that the dust removal opening 113 can be opened for dust removal when needed. Such a structure helps prevent oxide particles and other impurities from accumulating in the corners of the tank 11. The material of the tank body 11 is preferably a metal material with excellent thermal conductivity, such as stainless steel, aluminum alloy, amalgam, copper alloy, molybdenum alloy, manganese alloy, niobium alloy and titanium alloy, etc., considering that the exhaust gas may contain various corrosion The tank body 11 is preferably made of stainless steel, and the inner wall of the tank 11 is preferably subjected to further anti-corrosion treatment. In an example, the tank 11 is provided with a transparent visible window (not shown), such as a visible window made of tempered glass. The visible window can be arranged at the lower part of the tank 11 and located at the same position as the tank. The height of the side wall opposite to the air inlet 111 is preferably higher than the height of the air inlet 111, so that the inside of the tank 11 can be observed through the visual window, such as an observation station. The state of oxide particles precipitation in the tank 11 and whether the air inlet 111 is blocked or not, etc. The tank body 11 may be an integral structure, or may be a detachable structure from top to bottom so that the inside of the tank body 11 can be cleaned and maintained when needed. For example, it can be divided into two detachable upper and lower parts from the isolation disc 121, but it is necessary to ensure that the upper and lower parts of the tank body 11 are in a completely sealed state during operation. In order to ensure good isolation between the upper and lower parts of the tank 11, the size of the isolation disc 121 needs to be equal to the area of the horizontal plane of the tank 11 where it is located, so that the filtered gas can only pass through the The filter element 122 rises to the upper part of the tank body 11 and is discharged through the exhaust port 112. Therefore, it is very important to ensure the normal filtering function of the filter element 122. If the filter element 122 is blocked, the filtered gas cannot be discharged through the filter element 122, which will easily cause abnormal air pressure in the tank 11 In severe cases, it may even cause the tank body 11 to explode. Therefore, this application has made improvements to clean the filter element 122 deeply. In one example, the isolation disk 121 is a metallic isolation flange, and its material is preferably stainless steel with a smooth surface to ensure the structure of the isolation disk 121 is stable, while reducing the deposition of oxide particles on the isolation flange. The surface of the disc 121 is possible.

The filter element 122 may be a metal filter, the top of which may be slightly higher than the upper surface of the isolation disc 121, and the number is preferably multiple, such as 2, 3, 4 or more. Specifically, it can be determined according to the area of the horizontal plane of the tank 11 and the diameter of the filter element 122. The size and material of the plurality of filter elements 122 are preferably the same, and the plurality of filter elements 122 are preferably uniform. The interval distribution helps to ensure that the air pressure in the tank 11 is balanced. The horizontal diameter of the filter element 122 is preferably between 2-10 cm (including the end point value) to avoid the failure of timely filtration of the gas containing oxide particles due to the small filter diameter of the filter element 122. The air pressure in the tank body 11 rises, while avoiding problems such as a decrease in the filtering effect due to a too large filter diameter. The specific specifications can be determined according to the usual diameter of the oxide particles. For example, the pore diameter of the filter element 122 is usually not greater than 0.1 micron. . The number of the cleaning unit 133 is preferably the same as the number of the filter element 122, and the cleaning unit 133 is preferably sleeved on the outer wall of the filter element 122 in a one-to-one correspondence; the cleaning unit 133 can be completely sleeved. It is arranged on the outer wall of the filter element 122, and the inner diameter of the cleaning unit 133 is the same as the outer diameter of the filter element 122, or it can be only partially sleeved, such as a semicircular ring shape, preferably a completely sleeved The form helps to speed up the cleaning speed.

The cleaning unit 133 can be any structure with a cleaning function. In one example, the cleaning unit 133 is a rubber scraper ring, and the surface of the rubber scraper ring in contact with the filter element 122 is preferably a non-flat structure, such as uniformly distributed bumps, corrugations, or any other non-flat structure. It is flat to increase the friction between it and the outer wall of the filter element 122 during the cleaning process to improve the cleaning effect.

In another example, the cleaning unit 133 is a brush, such as a brush made of plastic or stainless steel, and the size of the bristles of the brush is not greater than the size of the pores on the filter core 122, so that the bristles can be Extend into the pores of the filter element 122 for deep cleaning.

In order to ensure a high degree of sealing of the tank body 11 during operation, as an example, the tank body 11 also has a top opening 114, and a three-way valve 115 is provided at the top opening 114 to control the opening and closing of the top opening 114 . When the filter element 122 needs to be cleaned after the end of the production process, the driving device 14 can extend into the tank 11 through the top opening 114 to be connected to the connecting rod 131 of the cleaning device 13, The driving device 14 can drive the cleaning device 13 to move up and down to clean the side wall of the filter element 122, and the driving device 14 can also drive the cleaning device 13 to rotate around the filter element 122 as required In order to clean the outer wall of the filter element 122 comprehensively. The driving device 14 may be an air cylinder or a servo motor.

To further ensure the isolation of the upper and lower parts of the tank body 11, as an example, the cleaning device 13 further includes a sealing ring 134 sleeved on the connecting rod 131, the sealing ring 134 and the fixing plate 132 Contact, as shown in Figure 2.

In order to facilitate the collection of precipitated oxide particles, as an example, the dust collecting tank 1 further includes a plurality of uprights 15 connected to the bottom of the tank body 11 for supporting the tank body 11. The column 15 and the tank body 11 may be integrally fixedly connected, or may be detachably connected. For example, a plurality of the columns 15 may be a detachable bracket to support the tank body 11. The detachable design helps For the transportation and movement of the tank 11.

As an example, the dust collection tank 1 further includes a guide column 16 and a spring 17 located in the tank body 11; one end of the guide column 16 is connected to the isolation disc 121, and the other end faces the tank body 11. The spring 17 is located below the fixing plate 132 of the cleaning device 13 and the spring 17 is sleeved on the fixing rod. The longitudinal length of the guide column 16 is preferably greater than that of the filter The longitudinal length of the core 122 (that is, the bottom of the guide column 16 protrudes more downward than the bottom of the filter core 122); the arrangement of the guide column 16 and the spring 17 helps to ensure production in the process During the period, that is, when the cleaning device 13 is not working, the fixing plate 132 is attached to the lower surface of the isolation disc 121 to avoid obstructing the normal filtering work of the filter element 122, and to ensure the At the same time, during non-process production, that is, when the cleaning device 13 cleans the filter element 122, the guide post 16 and the spring 17 help increase the movement of the cleaning device 13 Resistance, thereby helping to enhance the friction between the cleaning unit 133 and the filter element 122, and helping to improve the cleaning effect. The guide posts 16 are also preferably multiple, such as 2, 3, 4 or more (preferably the number of the filter element 122 is the same, for example, 4), and the multiple The guide posts 16 are evenly spaced, as shown in FIG. 3. It should be particularly noted that the guide post 16 shown in FIG. 3 does not mean that the guide post 16 must extend to the upper surface of the isolation disc 121, but only shows that the guide post 16 and the The position where the isolation disc 121 is in contact.

As an example, the dust collecting tank 1 is further provided with a cooling device 18, which can be arranged inside and/or outside the tank body 11 according to the specific structure of the cooling device 18. For example, the cooling device 18 may be an air cooling device or a water cooling device, which is preferably located outside the tank 11 and preferably covers at least the lower part of the tank 11. The cooling device 18 helps the tank 11 The cooling in 11 helps to accelerate the precipitation of oxide particles. When the cooling device 18 is a water cooling device, the cooling pipeline of the cooling device 18 may also be connected to the heating system at the service end of the factory to realize heat recovery and utilization. Since the single crystal growth process is usually carried out at a high temperature, the heat carried by the exhaust gas can be recovered and reused in this way.

When the dust collecting tank 1 is used for particulate matter collection, the three-way valve 115 at the top opening 114 and the valve at the dust removal port 113 can be opened after the end of the production process, and the driving device 14 drives the cleaning device 13 Move up and down to clean the outer wall of the filter element 122; in this process, the cooling device 18 can be activated to quickly cool the dust collecting tank 1 to accelerate the precipitation of oxide particles and deposit to the tank body The dust particles at the bottom of 11 are discharged through the dust removal port 113. After the cleaning of the filter element 122 is completed, the driving device 14 leaves the tank body 11 and the top opening 114 is closed; the cleaning device 13 returns to the original position, that is, returns to be attached to the isolation disc 121. According to needs, the pressure difference of the gas can be used to clean the filter element 122 in a deeper level, so as to further improve the cleanliness of the surface of the filter element 122, ensure that the air pressure in the tank body 11 is balanced, and This stabilizes the internal pressure of the equipment connected to the dust collecting tank 1, such as the single crystal growth furnace, and prolongs the service life of the vacuum pump. The opening and closing of the driving device 14, the valve and the dust removal port 113 can be controlled by equipment, so the entire cleaning process can be fully automated, which can reduce labor costs and avoid possible harm to the human body caused by oxide particles and impurities . The dust collecting tank of this embodiment can be used in any production environment where dust particles need to be collected and controlled. For example, it can be applied to the exhaust gas treatment of single crystal growth, chemical vapor deposition and other processes. Therefore, the present invention can be widely used in wafer manufacturing. Factory, chip manufacturer, LCD panel manufacturer and solar cell factory, etc.

Example two

As shown in FIG. 4, the present invention also provides a single crystal growth equipment, which includes a furnace body 2, an exhaust device 3, and the dust collecting tank 1 as described in the first embodiment. For the description of the dust tank 1, please refer to the first embodiment, which is not repeated here for the sake of brevity; the air inlet 111 of the dust collecting tank 1 is connected with the air outlet 112 of the furnace body 2, and the dust collecting The exhaust port 112 of the tank 1 is connected to the exhaust device 3.

As an example, the exhaust device 3 includes a vacuum pump 31 and an exhaust gas processing unit 32. One end of the vacuum pump 31 is connected to the exhaust port 112 of the dust collecting tank 1, and the other end is connected to the exhaust gas processing unit 32; The exhaust gas processing unit 32 may be a water scrubbing exhaust gas processing unit, a combustion exhaust gas processing unit, or an exhaust gas processing unit (gas scrubber) that includes both combustion and water scrubbing functions. The exhaust gas discharged from the furnace body 2 is filtered and precipitated by particulate matter, which can avoid the clogging of the vacuum pump 31 caused by particulate matter, reduce the frequency and cost of cleaning and maintenance of the vacuum pump 31, and prolong the service life of the vacuum pump 31; The gas is discharged through the vacuum pump 31 to the tail gas processing unit 32 for further purification treatment before being discharged, which helps reduce environmental pollution.

As an example, the single crystal growth equipment further includes a control device 4, such as a computer. The control device 4 is connected to the furnace body 2, the exhaust device 3, and the dust collecting tank 1 (including the aforementioned The three-way valve 115, the driving device 14 and the cleaning device 13, etc.) are connected, so the single crystal growth equipment can be fully automated. For example, the control device 4 closes the exhaust port 112 of the furnace body 2 after the process production in the furnace body 2 is completed, opens the dust removal port 113, and controls the three-way valve 115 to open so that the driving device 14 enters into the tank 11 through the top opening 114 of the tank 11 and drives the cleaning device 13 to move up and down to clean the outer wall of the filter element 122. After a preset time, the drive The device 14 is retracted to the outside of the tank 11 and the three-way valve 115 and the exhaust port 112 are closed. The vacuum pump 31 is used to blow back the inside of the tank 11 to blow the filter element 122. Further cleaning. After the cleaning process is completed, all devices are reset to the standby state to start the next single crystal growth. Using the single crystal growth equipment of the present invention for single crystal growth can ensure that the oxide particles and other impurities in the furnace body are discharged in time because the dust collecting tank is kept in a better working state, thereby avoiding oxidation Particles cause pollution to the growing single crystal, improve the quality of the single crystal, and contribute to the improvement of production yield. And the entire single crystal growth process can be fully automated, which helps reduce production costs.

The present invention also provides a single crystal growth method. The single crystal growth method is performed based on the single crystal growth equipment described in the second embodiment. In addition to increasing the cleaning process of the filter element, the single crystal growth method is the same as the conventional method. There are no other obvious differences. Since this part of the content is well known in the technical field, further description is omitted. Since the single crystal growth method of the present invention is performed using the aforementioned single crystal growth equipment, the single crystal growth quality and work efficiency can be improved.

In summary, the present invention provides a dust collecting tank, single crystal growth equipment and single crystal growth method. The dust collector of the present invention can use its own cleaning device to clean the surface of the filter element after each production process, which can effectively make up for the shortcomings of the existing cleaning methods, and help to improve the cleanliness and lengthen the surface of the filter element. The service life of the vacuum pump; and the entire cleaning process can be fully automated, which is conducive to reducing labor costs and ensuring personnel health. Adopting the single crystal growth equipment and single crystal growth method of the present invention can effectively improve the production yield and reduce the production cost.

The above-mentioned embodiments only exemplarily illustrate the principles and effects of the present invention, and are not used to limit the scope of the present invention. Anyone with ordinary knowledge in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, all the equivalent modifications or changes completed by those with ordinary knowledge in the field without departing from the spirit and technical ideas disclosed in the present invention fall into the scope of the patent application of the present invention.

1: Dust collecting tank 11: Tank 111: air inlet 112: exhaust port 113: Dust removal port 114: top opening 115: Three-way valve 12: Filtering device 121: Isolation Disk 122: filter element 13: Cleaning device 131: connecting rod 132: fixed plate 133: Cleaning unit 134: Sealing ring 14: drive device 15: Column 16: guide column 17: Spring 18: Cooling device 2: Furnace 3: Exhaust device 31: Vacuum pump 32: Exhaust gas treatment unit 4: control device

Fig. 1 shows a schematic diagram of a cross-sectional structure of a dust collecting tank according to the first embodiment of the present invention.

Fig. 2 shows a schematic structural diagram of a cleaning device for a dust collecting tank according to the first embodiment of the present invention.

Fig. 3 shows a schematic top view of the isolation plate of the dust collecting tank according to the first embodiment of the present invention.

FIG. 4 shows a schematic diagram of the structure of the single crystal growth equipment according to the second embodiment of the present invention.

1: Dust collecting tank

11: Tank

111: air inlet

112: exhaust port

113: Dust removal port

114: top opening

115: Three-way valve

12: Filtering device

121: Isolation Disk

122: filter element

131: connecting rod

132: fixed plate

133: Cleaning unit

14: drive device

15: Column

16: guide column

17: Spring

18: Cooling device

Claims (10)

A dust collecting tank, including: A tank, the tank is provided with an air inlet, an air outlet and a dust removal port; The filter device is located in the tank body; the filter device includes an isolation disc and at least one filter element, the isolation disc separates the tank body into an upper part and a lower part; one end of the filter element is connected to the isolation disc and The opening of the filter element is exposed on the surface of the isolation disc, and the other end extends toward the lower part of the tank; the air inlet is located on the side wall of the lower part of the tank, and the exhaust port is located on the tank. On the side wall of the upper part of the body; The cleaning device is located in the tank; the cleaning device includes a connecting rod, a fixing plate, and a cleaning unit; the connecting rod is connected to the fixing plate, and the connecting rod penetrates the isolation disc and faces the tank The upper part of the body extends; the fixed plate is located below the isolation disk; the cleaning unit is connected to the fixed plate and is in contact with the side wall of the filter element; and The driving device is connected with the connecting rod of the cleaning device, and is used for driving the cleaning device to move up and down to clean the side wall of the filter element. For example, the dust collecting tank of item 1 of the scope of patent application, wherein the cleaning unit includes a rubber scraper, the number of the cleaning unit is the same as the number of the filter element; the cleaning unit is correspondingly sleeved on the filter element The outer wall. For example, the dust collecting tank of item 1 of the scope of patent application, wherein the tank body also has a top opening, a three-way valve is provided at the top opening, and the driving device can extend into the tank body through the top opening The inner part is connected with the connecting rod of the cleaning device. For example, in the dust collecting tank of item 1 of the scope of patent application, the isolation disk is an isolation flange, the number of the filter elements is multiple, and the multiple filter elements are uniformly distributed; and the driving device is an air cylinder. For example, in the dust collecting tank of item 1 of the scope of patent application, the cleaning device further includes a sealing ring sleeved on the connecting rod, and the sealing ring is in contact with the fixed plate. For example, the dust collection tank of item 1 of the scope of patent application, wherein the dust collection tank further includes a plurality of uprights connected to the bottom of the tank body for supporting the tank body; the lower part of the tank body is Funnel shape, the dust removal port is located at the bottom of the tank body. Such as the dust collection tank of any one of items 1 to 6 in the scope of the patent application, wherein the dust collection tank further comprises a guide post and a spring, which are located in the tank body; one end of the guide post is connected to the isolation disc , The other end extends to the lower part of the tank; the spring is located below the fixing plate of the cleaning device and the spring is sleeved on the fixing rod. A single crystal growth equipment, comprising: a furnace body, an exhaust device, and a dust collecting tank according to any one of items 1 to 6 in the scope of patent application; the air inlet of the dust collecting tank and the exhaust gas of the furnace body The outlet is connected, and the exhaust port of the dust collecting tank is connected with the exhaust device. For example, the single crystal growth equipment of item 8 of the scope of patent application, wherein the exhaust device includes a vacuum pump and an exhaust gas processing unit. One end of the vacuum pump is connected to the exhaust port of the dust collecting tank, and the other end is connected to the exhaust gas. The processing unit is connected. A single crystal growth method includes: using the single crystal growth equipment of item 8 or 9 in the scope of patent application.

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