CN110359089A - Dust tank, single crystal growth apparatus and method for monocrystal growth - Google Patents
Dust tank, single crystal growth apparatus and method for monocrystal growth Download PDFInfo
- Publication number
- CN110359089A CN110359089A CN201910671773.5A CN201910671773A CN110359089A CN 110359089 A CN110359089 A CN 110359089A CN 201910671773 A CN201910671773 A CN 201910671773A CN 110359089 A CN110359089 A CN 110359089A
- Authority
- CN
- China
- Prior art keywords
- tank body
- tank
- dust
- filtration core
- separator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/24—Particle separators, e.g. dust precipitators, using rigid hollow filter bodies
- B01D46/2403—Particle separators, e.g. dust precipitators, using rigid hollow filter bodies characterised by the physical shape or structure of the filtering element
- B01D46/2418—Honeycomb filters
- B01D46/2422—Mounting of the body within a housing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/66—Regeneration of the filtering material or filter elements inside the filter
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
- Y02A50/2351—Atmospheric particulate matter [PM], e.g. carbon smoke microparticles, smog, aerosol particles, dust
Abstract
The present invention provides a kind of dust tank, single crystal growth apparatus and method for monocrystal growth.Dust tank includes: tank body；Filter device is located in tank body；Filter device includes separator and at least one filtration core；Filtration core one end is connected with separator and the opening of filtration core is exposed to the surface of separator, and the other end extends to the lower part of tank body；Air inlet is located on the side wall of tank body lower part, and exhaust outlet is located on the side wall on tank body top；Cleaning device is located in tank body；Cleaning device includes connecting rod, fixed plate and cleaning unit；Driving device is connected with the connecting rod of cleaning device, is cleaned for driving cleaning device to move up and down with the side wall to filtration core.Dust tank of the invention can be after each technique produces, filtering wicking surface is cleaned using its included cleaning device, it helps to improve the cleannes of filtering wicking surface, extend the service life of vacuum pump, advantageously reduce human cost and support personnel's health.
Description
Technical field
The present invention relates to wafer manufacturing fields, more particularly to a kind of dust tank, single crystal growth apparatus and crystal growth side
Method.
Background technique
Monocrystalline silicon piece is one of most important raw material in chip production manufacture, and manufacturing process generally includes: to siliceous
Material (quartz sand) carries out deoxidation purification to obtain the crystalline silicon of high-purity, and crystalline silicon is through high-temperature molding and through the side such as circumgyration stretch
Farad at round crystal bar, after the techniques such as cut and ground and obtain monocrystalline silicon piece.It refines the crystalline silicon of high-purity and pulls into
The process of crystal bar is known as crystal growth, carries out usually in single crystal growing furnace, this process determines the purity of monocrystalline silicon piece, and chip
Manufacturing is higher and higher to the purity requirement of monocrystalline silicon piece, thus reduces the pollution in single crystal growth process to improve monocrystalline silicon
Purity is the target that fab is seek assiduously.
Oxide particle is inevitably resulted from single crystal growth process, currently used way is by oxycompound
The tail gas of grain is emitted into dust tank by vacuum pump, and dust tank generally includes tank body and is located at the intracorporal filtration core of tank, oxygen
Compound particle is deposited in tank body after being filtered by filtration core, and filtered gas is then discharged by the exhaust outlet on tank body.But
It is the surface that oxide particle is liable to stick to filtration core during this, influences the strainability of filtration core, when serious even
It will lead to the blocking of filtration core.Although fab when each completion draws crystal bar, can clean filtration core using manual type, or
Blow-back is carried out using pressure difference to achieve the effect that clean filtration core, but manually cleaning filtration core needs to carry out tank body
Dismantling, it is not only time-consuming and laborious, but also may threaten to human health；Blow-back is although relatively convenient, but if mistake
Cartridge surface has been blocked full before carrying out blowback, and the effect of that blowback almost zero can seriously affect pressure when subsequent crystal pulling,
The screw rod of vacuum pump can be also damaged simultaneously.If the oxide particle on filtration core cannot be removed in time, monocrystalline silicon will affect
Exhaust emissions in growth course influences the quality of monocrystalline silicon, or even in device fails, oxide particle may flow backward
Into in single crystal growing furnace, serious production accident is caused.
Summary of the invention
In view of the foregoing deficiencies of prior art, the purpose of the present invention is to provide a kind of dust tank, crystal growths to set
Standby and method for monocrystal growth, it is time-consuming and laborious using manual type cleaning dust tank in the prior art for solving, and blow-back
Effect is poor, and the problems such as cannot remove the monocrystalline silicon quality decline of initiation in time because of oxide particle.
In order to achieve the above objects and other related objects, the present invention provides a kind of dust tank, and the dust tank includes: tank
Body has air inlet, exhaust outlet and dust removal port on the tank body；Filter device is located in the tank body；The filter device packet
Separator and at least one filtration core are included, the tank body is separated into upper and lower part by the separator；Described filtration core one end
It is connected with the separator and the opening of the filtration core is exposed to the surface of the separator, the other end is to the tank body
Lower part extends；The air inlet is located on the side wall of the tank body lower part, and the exhaust outlet is located at the side wall on the tank body top
On；Cleaning device is located in the tank body；The cleaning device includes connecting rod, fixed plate and cleaning unit；The connecting rod
It is connected with the fixed plate, and the connecting rod extends through the separator and to the top of the tank body；The fixation
Plate is located at the lower section of the separator；The cleaning unit is connected with the fixed plate, and the side wall phase with the filtration core
Contact；Driving device is connected with the connecting rod of the cleaning device, for driving the cleaning device to move up and down to institute
The side wall for stating filtration core is cleaned.
Optionally, the cleaning unit includes vulcanite scraper circle, the quantity of the quantity of the cleaning unit and the filtration core
It is identical；The corresponding outer wall for being sheathed on the filtration core of the cleaning unit.
Optionally, the tank body also has top opening, and the top open part is provided with triple valve, the driving device
It can be stretched in the tank body by the top opening and be connected with the connecting rod of the cleaning device.
Optionally, the separator is isolation flange, the quantity of the filtration core be it is multiple, multiple filtration cores are uniform
Distribution；The driving device is cylinder.
Optionally, the cleaning device further includes the sealing ring being sheathed in the connecting rod, the sealing ring with it is described
Fixed plate is in contact.
Optionally, the dust tank further includes multiple columns, is connected with the bottom of the tank body, and the tank is used to support
Body；The lower part of the tank body is funnel-shaped, and the dust removal port is located at the bottom of the tank body.
Optionally, the dust tank further includes guide post and spring, is located in the tank body；One end of the guide post with
The separator is connected, and the other end extends to the lower part of the tank body；The spring is located at the described solid of the cleaning device
The lower section of fixed board and the spring pocket are set in the fixed link.
The present invention also provides a kind of single crystal growth apparatus, the single crystal growth apparatus include furnace body, exhaust apparatus and as before
State dust tank described in either a program；The air inlet of the dust tank is connected with the exhaust outlet of the furnace body, the dust
The exhaust outlet of tank is connected with the exhaust apparatus.
The exhaust apparatus includes vacuum pump and tail gas treating unit, the exhaust of described vacuum pump one end and the dust tank
Mouth is connected, and the other end is connected with the tail gas treating unit.
The present invention also provides a kind of method for monocrystal growth, the method for monocrystal growth is based on described in aforementioned either a program
Single crystal growth apparatus carries out.
As described above, dust tank of the invention, single crystal growth apparatus and method for monocrystal growth, have the advantages that
Dust tank of the invention can carry out filtering wicking surface using its included cleaning device clear after each technique produces
It is clean, the deficiency of existing cleaning mode can be effectively made up, the cleannes of filtering wicking surface is helped to improve, extends the use of vacuum pump
Service life；And entire cleaning process can realize complete automation, advantageously reduce human cost and support personnel's health；Using this
The single crystal growth apparatus and monocrystalline production method of invention carry out crystal growth, help to stablize the internal pressure in single crystal growth process,
It helps to improve crystal growth quality and reduces production cost.
Detailed description of the invention
Fig. 1 is shown as the cross section structure schematic diagram of the dust tank in the embodiment of the present invention one.
Fig. 2 is shown as the structural schematic diagram of the cleaning device of the dust tank in the embodiment of the present invention one.
Fig. 3 is shown as the overlooking structure diagram of the separator of the dust tank in the embodiment of the present invention one.
Fig. 4 is shown as the structural schematic diagram of the single crystal growth apparatus in the embodiment of the present invention two.
Component label instructions
1 dust tank
11 tank bodies
111 air inlets
112 exhaust outlets
113 dust removal ports
114 top openings
115 triple valves
12 filter devices
121 separators
122 filtration cores
13 cleaning devices
131 connecting rods
132 fixed plates
133 cleaning units
134 sealing rings
14 driving devices
15 columns
16 guide posts
17 springs
18 cooling devices
2 furnace bodies
3 exhaust apparatus
31 vacuum pumps
32 tail gas treating units
4 control devices
Specific embodiment
Embodiments of the present invention are illustrated by particular specific embodiment below, those skilled in the art can be by this explanation
Content disclosed by book is understood other advantages and efficacy of the present invention easily.
It please refers to Fig.1 to Fig.4.It should be clear that this specification structure depicted in this specification institute accompanying drawings, ratio, size etc., only to
Cooperate the revealed content of specification, so that those skilled in the art understands and reads, being not intended to limit the invention can be real
The qualifications applied, therefore do not have technical essential meaning, the tune of the modification of any structure, the change of proportionate relationship or size
It is whole, in the case where not influencing the effect of present invention can be generated and the purpose that can reach, it should all still fall in disclosed skill
In the range of art content can cover.Meanwhile in this specification it is cited as "upper", "lower", "left", "right", " centre " and
The term of " one " etc. is merely convenient to being illustrated for narration, rather than to limit the scope of the invention, relativeness
It is altered or modified, under the content of no substantial changes in technology, when being also considered as the enforceable scope of the present invention.
Embodiment one
As shown in Figure 1 to Figure 3, the present invention provides a kind of dust tank 1, and the dust tank 1 includes: tank body 11, the tank body
There is air inlet 111, exhaust outlet 112 and dust removal port 113 on 11；Filter device 12 is located in the tank body 11；The filtering dress
Setting 12 includes separator 121 and at least one filtration core 122, and the tank body 11 is separated into top under by the separator 121
Portion；Described 122 one end of filtration core is connected with the separator 121 and the opening of the filtration core 122 is exposed to described be isolated
The surface of disk 121, the other end extend to the lower part of the tank body 11 and preferably have spacing with the bottom of the tank body 11；It is described
Air inlet 111 is located on the side wall of 11 lower part of tank body, and the exhaust outlet 112 is located on the side wall on 11 top of tank body；
Enter the exhaust gas containing oxide particle and other impurities in the tank body 11 through the air inlet 111, through the filtration core
After 122 filterings, gas rises to the top of the tank body 11 from the filtration core 122 and is discharged through the exhaust outlet 112, and oxygen
Compound particle and other impurities are then precipitated to the bottom of the tank body 11, are discharged through the dust removal port 113；Cleaning device 13, position
In in the tank body 11；The cleaning device 13 includes connecting rod 131, fixed plate 132 and cleaning unit 133；The connecting rod
131 are connected with the fixed plate 132, and the connecting rod 131 is through the separator 121 and to the top of the tank body 11
Extend；The fixed plate 132 is located at the lower section of the separator 121；The cleaning unit 133 is connected with the fixed plate 132
It connects, and is in contact with the side wall of the filtration core 122；Driving device 14 is connected with the connecting rod 131 of the cleaning device 13
It connects, is cleaned for driving the cleaning device 13 to move up and down with the side wall to the filtration core 122.Dust of the invention
Tank 1 can clean 122 surface of filtration core using its included cleaning device 13 after each technique produces, can
The deficiency for effectively making up existing cleaning mode helps to improve the cleannes on 122 surface of filtration core, extends the use longevity of vacuum pump
Life；And entire cleaning process can realize complete automation, advantageously reduce human cost and support personnel's health.
The body shape of the tank body 11 can be cylindrical, rectangle or other arbitrary shapes.In the present embodiment, as showing
Example, the body shape of the tank body 11 is cylindrical, and lower part is funnel-shaped, and the dust removal port 113 is located at the bottom of the tank body 11
Portion is provided with valve (not indicating) at the dust removal port 113, is dusted with that can open the dust removal port 113 when needed
Operation, such structure help avoid the corner for accumulating in the tank body 11 of oxide particle and other impurities.The tank
The excellent metal material of the preferred heat-conducting effect of the material of body 11, for example, stainless steel, aluminium alloy, mercury alloy, copper alloy, molybdenum alloy,
Manganese alloy, niobium alloy and titanium alloy etc., it is contemplated that corrosivity and poisonous and harmful property gas there are many may containing in exhaust gas, and meanwhile it is simultaneous
Economy and the characteristics such as firm, the preferred stainless steel of material of the tank body 11 are cared for, and inner wall preferably does further anticorrosion
Processing.In one example, it is provided with transparent visual window (not shown) on the tank body 11, for example is a tempered glass material
Visual windows, the visual windows may be disposed at the lower part of the tank body 11 and are located on the side wall opposite with the air inlet 111,
The highly preferred height higher than where the air inlet 111 where it, with by the visual windows to the tank body 11 inside
The case where observed, such as observe in the tank body 11 oxide particle precipitating situation and the air inlet 111 whether have
Stopping state etc..The tank body 11 can be an integral structure, or can be to institute when dismountable structure is up and down to need
It states and carries out cleaning maintenance inside tank body 11.For example can punish from the separator 121 is dismountable two parts up and down, but is needed true
Protecting the tank body 11, two parts are in the state being fully sealed up and down at work.For the upper and lower part for ensuring the tank body 11
Good isolation, the size of the separator 121 need to the area equation of the horizontal plane of the tank body 11 of its position, by
This makes filtered gas that can only rise to the top of the tank body 11 by the filtration core 122 and through the exhaust outlet
112 discharges.Therefore ensure that the normal filtration function of the filtration core 122 is extremely important, and if the filtration core 122 is blocked, mistake
Gas after filter cannot be discharged by the filtration core 122, will easily lead to the pressure abnormity in the tank body 11, when serious very
To the explosion that will lead to the tank body 11, thus the application improve to carry out deep clean to the filtration core 122.?
In one example, the separator 121 is the isolation flange of metal material, and material is preferably the smooth stainless steel in surface, with true
The stable structure of the separator 121 is protected, while reducing the possibility that oxide particle is deposited on 121 surface of separator.
The filtration core 122 can be the filter of metal material, and top can be slightly higher than the upper table of the separator 121
Face, quantity is preferably several, for example is 2,3,4 or more, specifically can be according to the face of the horizontal plane of the tank body 11
Depending on long-pending and the filtration core 122 diameter, the size and material of multiple filtration cores 122 are preferably identical, and multiple described
Filtration core 122 is perfectly even spaced apart, and helps to ensure the air pressure equalisation in the tank body 11.The water of the filtration core 122
Planar diameter is preferably between 2~10cm (including endpoint value), leads to avoid the filtering bore because of the filtration core 122 is too small
Causing the gas of oxycompound particle not filter in time causes air pressure in the tank body 11 to rise, while avoiding because of filtering bore too
Filter effect is led to problems such as to decline greatly, specific specification can be such as described depending on the general diameter of oxide particle
The hole diameter of filtration core 122 is usually more than 0.1 micron.The quantity of the cleaning unit 133 preferably with the filtration core 122
Quantity it is identical, and the cleaning unit 133 is preferred corresponds the outer wall for being sheathed on the filtration core 122；The cleaning is single
Member 133 can be sheathed on the outer wall of the filtration core 122 and the internal diameter of the cleaning unit 133 and the filtration core 122 completely
Outer diameter it is identical, only can also partially be arranged, for example be semi-annular shape, the form being preferably arranged completely, help speed up clear
Clean speed.
The cleaning unit 133 can be any structure with cleaning function.In one example, the cleaning unit 133
For vulcanite scraper circle, and the surface that the vulcanite scraper circle is contacted with the filtration core 122 is preferably non-planar structures, such as in uniform
Salient point, ripple or any other non-flat forms shape of distribution, to increase itself and the outer wall of the filtration core 122 during cleaning
Friction improves cleaning effect.
In another example, the cleaning unit 133 is hairbrush, for example is plastic material or the hairbrush of stainless steel material,
And the bristle size of the hairbrush is not more than the pore size on the filtration core 122, so that bristle can stretch to the filtering
Deep clean is carried out in the stomata of core 122.
To ensure the high-seal of the tank body 11 at work, as an example, the tank body 11 also has top opening
114, triple valve 115, which is provided with, at the top opening 114 is controlled with the opening and closing to the top opening 114.In technique
When needing to clean the filtration core 122 after production, the driving device 14 can be protruded by the top opening 114
It is connected in the tank body 11 with the connecting rod 131 of the cleaning device 13, the driving device 14 can drive the cleaning
Device 13 is moved up and down to be cleaned with the side wall to the filtration core 122, and the driving device 14 can be with as needed
The cleaning device 13 is driven to be rotated around the filtration core 122 comprehensively clear with the outer wall progress to the filtration core 122
It is clean.The driving device 14 can be cylinder or servo motor.
For the upper and lower two-part isolation for further ensuring that the tank body 11, as an example, the cleaning device 13 also wraps
The sealing ring 134 being sheathed in the connecting rod 131 is included, the sealing ring 134 is in contact with the fixed plate 132, specifically such as
Shown in Fig. 2.
For the collection convenient for the oxide particle after precipitating, as an example, the dust tank 1 further includes multiple columns 15,
It is connected with the bottom of the tank body 11, is used to support the tank body 11.The column 15 and the tank body 11 can be integrated solid
Fixed connection, may be a detachable connection, for example multiple columns 15 can be a removable support to support the tank
Body 11, the carrying that design for disassembly facilitates the tank body 11 are mobile.
As an example, the dust tank 1 further includes guide post 16 and spring 17, it is located in the tank body 11；The guiding
One end of column 16 is connected with the separator 121, and the other end extends to the lower part of the tank body 11；The spring 17 is located at institute
The lower section and the spring 17 for stating the fixed plate 132 of cleaning device 13 are sheathed in the fixed link, the guide post 16
Longitudinal length be preferably greater than the longitudinal length of the filtration core 122 (bottom of the i.e. described guide post 16 be compared to the filtering
The bottom of core 122 more extends downwardly)；The setting of the guide post 16 and the spring 17 helps to ensure in technique production period
Between, i.e., it posts the fixed plate 132 in the lower surface of the separator 121, avoids
The normal filtration of the filtration core 122 is interfered to work, it is ensured that the sealing in the tank body 11, while during non-process production,
I.e. during the cleaning device 13 carries out clean to the filtration core 122, the guide post 16 and the spring 17 have
Help increase the moving resistance of the cleaning device 13, to help to enhance the cleaning unit 133 and the filtration core 122
Frictional force, help to improve cleaning effect.The guide post 16 is preferably again multiple, for example is 2,3,4 or more
Multiple (preferably consistent with the quantity of the filtration core 122, for example be 4), multiple guide posts 16 are evenly spaced on,
It is specific as shown in Figure 3.It should be strongly noted that the guide post 16 illustrated in Fig. 3 does not represent the guide post 16
It has to extend to the upper surface of the separator 121 and only illustrates the guide post 16 and 121 phase of separator
The position of contact.
As an example, the dust tank 1 is additionally provided with cooling device 18, not according to the specific structure of the cooling device 18
Together, it may be disposed at the tank body 11 internally and/or externally.For example the cooling device 18 can fill for air-cooling apparatus or water cooling
It sets, is preferably placed at the outside of the tank body 11, and preferably at least cover 11 lower part of tank body, the cooling device 18 facilitates
Cooling in the tank body 11, to help speed up the precipitating of oxide particle.When the cooling device 18 is water cooling plant
When, the cooling line of the cooling device 18 can also be connected with the heating system of the factory service end of factory, to realize heat
It recycles.Since single crystal growth process usually carries out at high temperature, the carrying heat for discharging exhaust gas in this way may be used
Realize recycling and reusing.
When carrying out particulate collection using the dust tank 1, the top opening can be opened after technique produces
The valve at triple valve 115 and the dust removal port 113 at 114, the driving device 14 drive about 13 cleaning device
Movement is cleaned with the outer wall to the filtration core 122；The cooling device 18 be can star in the process to described
1 fast cooling of dust tank deposits to the dust granule of 11 bottom of tank body described in the precipitating of accelerated oxidation composition granule
Dust removal port 113 is discharged.The driving device 14 leaves the tank body 11, the top after completing the cleaning of the filtration core 122
Opening 114 is closed；The cleaning device 13 returns to original position, that is, is retracted into and posts with the separator 121.May be used also as needed
Deeper cleaning is carried out to the filtration core 122 with the pressure difference blowback using gas, to further increase the mistake
The cleannes on 122 surface of filter core, it is ensured that the air pressure balance in the tank body 11, and thus stable be connected with the dust tank 1
Equipment, such as the internal pressure of monocrystal growing furnace, while extending the service life of vacuum pump.The driving device 14, the valve
And the opening and closing of the dust removal port 113 can be controlled by equipment, thus entire cleaning process may be implemented completely to automate, it can
To reduce human cost, and the harm for avoiding oxide particle and impurity from may cause human body.The dust tank of the present embodiment can
To be collected the production environment of control to dust granule for any need, for example it can be applied to crystal growth, chemical gaseous phase
The vent gas treatment of the techniques such as deposition, thus the present invention can be widely applied to wafer manufacturing enterprise, chip manufacturing enterprise, liquid crystal surface
Plate manufacturing enterprise and solar battery sheet manufacturing enterprise etc..
Embodiment two
As shown in figure 4, the single crystal growth apparatus includes furnace body 2, exhaust the present invention also provides a kind of single crystal growth apparatus
Device 3 and the dust tank 1 as described in embodiment one, therefore embodiment one is please referred to the introduction of the dust tank 1, for succinct
Purpose do not repeat；The air inlet 111 of the dust tank 1 is connected with the exhaust outlet 112 of the furnace body 2, the dust tank 1
Exhaust outlet 112 is connected with the exhaust apparatus 3.
As an example, the exhaust apparatus 3 include vacuum pump 31 and tail gas treating unit 32, described 31 one end of vacuum pump with
The exhaust outlet 112 of the dust tank 1 is connected, and the other end is connected with the tail gas treating unit 32；The vent gas treatment list
Member 32 can be rinsing type tail gas treating unit, be also possible to combustion-type tail gas treating unit, can also be contain burning and
The tail gas treating unit (Gas Scrubber) for washing two kinds of functions, by the dust tank 1 to the tail being discharged from the furnace body 2
Gas carries out the filtering precipitating of particulate matter, and the blocking of the vacuum pump 31 can be caused to avoid particulate matter, reduces the vacuum pump 31
Cleaning maintenance frequency and cost, extend the service life of the vacuum pump 31；Filtered gas is through 31 row of vacuum pump
It puts and is discharged again after doing further purified treatment to the tail gas treating unit 32, help to reduce environmental pollution.
It is the furnace body 2, described as an example, the single crystal growth apparatus further includes a control device 4, such as a computer
Exhaust apparatus 3 and the dust tank 1 (including the triple valve 115 above-mentioned, the driving device 14 and the cleaning device 13
Deng) be connected with the control device 4, thus the single crystal growth apparatus can be realized and fully be automated.For example, the control
Close the exhaust outlet 112 of the furnace body 2 after technique production of the device 4 processed in furnace body 2, open the dust removal port 113 and
The triple valve 115 is controlled to open so that the driving device 14 enters the tank by the top opening 114 of the tank body 11
In body 11 and drive the cleaning device 13 to move up and down to clean with the outer wall to the filtration core 122, through it is preset when
Between after the driving device 14 is retracted into the tank body 11 again outer and close the triple valve 115 and the exhaust outlet 112, benefit
With the vacuum pump 31 to carrying out blow-back in the tank body 11 further to be cleaned to the filtration core 122.Clear
All devices reset to standby mode all to start crystal growth next time after the completion of clean process.Using monocrystalline of the invention
Growth apparatus carries out crystal growth, can ensure the intracorporal oxygen of the furnace because being maintained at preferable working condition in the dust tank
Compound particle and other impurities are discharged in time, it is possible thereby to which oxide particle is avoided to pollute the monocrystalline of growth, are improved
The quality of monocrystalline facilitates the raising of production yield.And entire single crystal growth process can realize complete automation, help to drop
Low production cost.
The present invention also provides a kind of method for monocrystal growth, the method for monocrystal growth is raw based on monocrystalline described in embodiment two
Long equipment carries out, and in addition to the cleaning process for increasing the filtration core, the method for monocrystal growth and conventional method have no other
Notable difference since this partial content is known in the industry, therefore is not further spread out.Method for monocrystal growth of the invention due to
It has used single crystal growth apparatus above-mentioned to carry out, thus crystal growth quality can be improved, improve working efficiency.
In conclusion the present invention provides a kind of dust tank, single crystal growth apparatus and method for monocrystal growth.Dust of the invention
Tank can clean filtering wicking surface using its included cleaning device after each technique produces, can effectively more
The deficiency for mending existing cleaning mode helps to improve the cleannes of filtering wicking surface, extends the service life of vacuum pump；And it is entire
Cleaning process can realize complete automation, advantageously reduce human cost and support personnel's health.Using monocrystalline of the invention
Growth apparatus and method for monocrystal growth can effectively improve production yield, reduce production cost.
The above-described embodiments merely illustrate the principles and effects of the present invention, and is not intended to limit the present invention.It is any ripe
The personage for knowing this technology all without departing from the spirit and scope of the present invention, carries out modifications and changes to above-described embodiment.Cause
This, institute is complete without departing from the spirit and technical ideas disclosed in the present invention by those of ordinary skill in the art such as
At all equivalent modifications or change, should be covered by the claims of the present invention.
Claims (10)
1. a kind of dust tank, which is characterized in that the dust tank includes:
Tank body has air inlet, exhaust outlet and dust removal port on the tank body；
Filter device is located in the tank body；The filter device includes separator and at least one filtration core, the separator
The tank body is separated into upper and lower part；Described filtration core one end is connected with the separator and the opening of the filtration core
It is exposed to the surface of the separator, the other end extends to the lower part of the tank body；The air inlet is located at the tank body lower part
Side wall on, the exhaust outlet is located on the side wall on the tank body top；
Cleaning device is located in the tank body；The cleaning device includes connecting rod, fixed plate and cleaning unit；The connection
Bar is connected with the fixed plate, and the connecting rod extends through the separator and to the top of the tank body；
The fixed plate is located at the lower section of the separator；The cleaning unit is connected with the fixed plate, and with the mistake
The side wall of filter core is in contact；
Driving device is connected with the connecting rod of the cleaning device, for driving the cleaning device to move up and down to institute
The side wall for stating filtration core is cleaned.
2. dust tank according to claim 1, it is characterised in that: the cleaning unit includes vulcanite scraper circle, the cleaning
The quantity of unit is identical as the quantity of the filtration core；The corresponding outer wall for being sheathed on the filtration core of the cleaning unit.
3. dust tank according to claim 1, it is characterised in that: the tank body also has top opening, and the top is opened
Be provided with triple valve at mouthful, the driving device can be stretched to by the top opening in the tank body with the cleaning device
Connecting rod be connected.
4. dust tank according to claim 1, it is characterised in that: the separator is isolation flange, the filtration core
Quantity be it is multiple, multiple filtration cores are uniformly distributed；The driving device is cylinder.
5. dust tank according to claim 1, it is characterised in that: the cleaning device further includes being sheathed on the connecting rod
On sealing ring, the sealing ring is in contact with the fixed plate.
6. dust tank according to claim 1, it is characterised in that: the dust tank further includes multiple columns, with the tank
The bottom of body is connected, and is used to support the tank body；The lower part of the tank body is funnel-shaped, and the dust removal port is located at the tank body
Bottom.
7. dust tank according to any one of claims 1 to 6, it is characterised in that: the dust tank further include guide post and
Spring is located in the tank body；One end of the guide post is connected with the separator, and the other end is to the lower part of the tank body
Extend；The spring is located at the lower section of the fixed plate of the cleaning device and the spring pocket is set in the fixed link.
8. a kind of single crystal growth apparatus, it is characterised in that: the single crystal growth apparatus includes furnace body, exhaust apparatus and as right is wanted
Seek 1 to 7 described in any item dust tanks；The air inlet of the dust tank is connected with the exhaust outlet of the furnace body, the dust
The exhaust outlet of tank is connected with the exhaust apparatus.
9. single crystal growth apparatus according to claim 8, it is characterised in that: the exhaust apparatus includes vacuum pump and tail gas
Processing unit, described vacuum pump one end are connected with the exhaust outlet of the dust tank, the other end and the tail gas treating unit phase
Connection.
10. a kind of method for monocrystal growth, it is characterised in that: the method for monocrystal growth is based on list described in claim 8 or 9
Crystals growth equipment carries out.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910671773.5A CN110359089B (en) | 2019-07-24 | 2019-07-24 | Dust collecting tank, single crystal growing apparatus and single crystal growing method |
| TW109114749A TWI762920B (en) | 2019-07-24 | 2020-05-04 | Dust container, apparatus and process of single crystal growth |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910671773.5A CN110359089B (en) | 2019-07-24 | 2019-07-24 | Dust collecting tank, single crystal growing apparatus and single crystal growing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110359089A true CN110359089A (en) | 2019-10-22 |
| CN110359089B CN110359089B (en) | 2021-04-20 |
Family
ID=68220681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910671773.5A Active CN110359089B (en) | 2019-07-24 | 2019-07-24 | Dust collecting tank, single crystal growing apparatus and single crystal growing method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN110359089B (en) |
| TW (1) | TWI762920B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115243782A (en) * | 2020-01-28 | 2022-10-25 | 埃尔丁过滤技术有限公司 | Method for dry-filtering a gas flow carrying foreign bodies and filter device for cleaning a raw gas carrying foreign bodies |
| EP4306683A1 (en) * | 2022-07-13 | 2024-01-17 | Siltronic AG | Device for purifying waste gases from a crystal pulling system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020014156A1 (en) * | 1999-04-16 | 2002-02-07 | Hans Leibold | Method and arrangement for cleaning pipe-shaped filter elements |
| CN204429011U (en) * | 2014-12-24 | 2015-07-01 | 北京优势同翔科技有限公司 | A kind of single crystal growing furnace vacuum apparatus |
| CN105056646A (en) * | 2015-07-28 | 2015-11-18 | 侯继伟 | Automatic dust collector for vacuum tail gas of monocrystal silicon growing furnace |
| CN105863910A (en) * | 2016-06-12 | 2016-08-17 | 吴春雷 | Demounting-free electric cleanable filter |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030033188A (en) * | 2001-10-18 | 2003-05-01 | 주식회사 실트론 | A filtering apparatus using in a single crystalline silicon grower |
| KR101304743B1 (en) * | 2011-03-10 | 2013-09-05 | 주식회사 엘지실트론 | Filtering apparatus for Manufacturing Single Crystal Ingot and Single Crystal Ingot Grower including the same |
-
2019
- 2019-07-24 CN CN201910671773.5A patent/CN110359089B/en active Active
-
2020
- 2020-05-04 TW TW109114749A patent/TWI762920B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020014156A1 (en) * | 1999-04-16 | 2002-02-07 | Hans Leibold | Method and arrangement for cleaning pipe-shaped filter elements |
| CN204429011U (en) * | 2014-12-24 | 2015-07-01 | 北京优势同翔科技有限公司 | A kind of single crystal growing furnace vacuum apparatus |
| CN105056646A (en) * | 2015-07-28 | 2015-11-18 | 侯继伟 | Automatic dust collector for vacuum tail gas of monocrystal silicon growing furnace |
| CN105863910A (en) * | 2016-06-12 | 2016-08-17 | 吴春雷 | Demounting-free electric cleanable filter |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115243782A (en) * | 2020-01-28 | 2022-10-25 | 埃尔丁过滤技术有限公司 | Method for dry-filtering a gas flow carrying foreign bodies and filter device for cleaning a raw gas carrying foreign bodies |
| EP4306683A1 (en) * | 2022-07-13 | 2024-01-17 | Siltronic AG | Device for purifying waste gases from a crystal pulling system |
| WO2024012990A1 (en) * | 2022-07-13 | 2024-01-18 | Siltronic Ag | Device for cleaning exhaust gases from a crystal growing system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202104684A (en) | 2021-02-01 |
| CN110359089B (en) | 2021-04-20 |
| TWI762920B (en) | 2022-05-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110359089A (en) | Dust tank, single crystal growth apparatus and method for monocrystal growth | |
| KR101401310B1 (en) | Apparatus for cleaning exhaust passage for semiconductor crystal manufacturing device and method for cleaning same | |
| CN202185205U (en) | Filter for cooling water of monocrystal furnace | |
| CN102259870A (en) | Purifying and pickling device for high-purity quartz sand | |
| CN105056646A (en) | Automatic dust collector for vacuum tail gas of monocrystal silicon growing furnace | |
| CN202876512U (en) | Circulating device of cleaning filter | |
| CN204865286U (en) | Automatic dust collector of monocrystalline silicon growth stove vacuum tail gas | |
| CN106890494A (en) | Benzalkonium chloride suction filtration purifying plant | |
| CN108115130A (en) | Gas circulation for selective laser fusing manufacture purifies equipment of working continuously | |
| CN201023064Y (en) | Fluid iron-removing device | |
| CN208770947U (en) | A kind of soft knife filter of online deslagging self-cleaning of artificial intelligent type | |
| CN209438988U (en) | High purity silica powder grading plant | |
| CN209318095U (en) | A kind of helminth larvae separator | |
| CN202606169U (en) | Test box with cleaning and sterilizing functions | |
| CN220424915U (en) | Phosphate fertilizer blast furnace tail gas dust remover | |
| CN207827871U (en) | A kind of energy-saving type quartz purifying plant | |
| CN213793390U (en) | Laboratory fume chamber that can convenient change perspective window | |
| CN216136801U (en) | Automatic cleaning device for sewage filtration | |
| CN206273328U (en) | A kind of filter plant | |
| CN204447380U (en) | A kind of integrated fine chemical products purified crystals device | |
| CN216409386U (en) | Cooling equipment for metal material processing | |
| CN211864323U (en) | Dust collector in graphite products calcination workshop | |
| CN219630887U (en) | Flue gas dirt separator | |
| CN203556173U (en) | Filter unit of water purifying plant | |
| CN103894008A (en) | Coating filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |