TW202103271A - Electronic package and manufacturing method thereof - Google Patents
Electronic package and manufacturing method thereof Download PDFInfo
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- TW202103271A TW202103271A TW108123412A TW108123412A TW202103271A TW 202103271 A TW202103271 A TW 202103271A TW 108123412 A TW108123412 A TW 108123412A TW 108123412 A TW108123412 A TW 108123412A TW 202103271 A TW202103271 A TW 202103271A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
- 238000005538 encapsulation Methods 0.000 claims abstract description 60
- 239000000463 material Substances 0.000 claims abstract description 45
- 239000010410 layer Substances 0.000 claims description 93
- 238000000034 method Methods 0.000 claims description 15
- 238000004806 packaging method and process Methods 0.000 claims description 12
- 229920000642 polymer Polymers 0.000 claims description 6
- 239000011241 protective layer Substances 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 9
- WABPQHHGFIMREM-NOHWODKXSA-N lead-200 Chemical compound [200Pb] WABPQHHGFIMREM-NOHWODKXSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229940125797 compound 12 Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000004100 electronic packaging Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16245—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18161—Exposing the passive side of the semiconductor or solid-state body of a flip chip
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本發明係有關一種半導體封裝製程,尤指一種電子封裝件及其製法。 The present invention relates to a semiconductor packaging manufacturing process, in particular to an electronic packaging component and its manufacturing method.
目前應用於晶片封裝領域之技術繁多,例如晶片尺寸構裝(Chip Scale Package,簡稱CSP)、晶片直接貼附封裝(Direct Chip Attached,簡稱DCA)或多晶片模組封裝(Multi-Chip Module,簡稱MCM)等覆晶型封裝製程、或將晶片立體堆疊化整合為三維積體電路(3D IC)晶片堆疊製程。 There are many technologies currently used in the field of chip packaging, such as Chip Scale Package (CSP), Direct Chip Attached (DCA), or Multi-Chip Module (Multi-Chip Module). MCM) and other flip-chip packaging processes, or the three-dimensional stacking and integration of chips into a three-dimensional integrated circuit (3D IC) chip stacking process.
如第1圖所示,習知四方平面無引腳(Quad Flat No leads,簡稱QFN)型式之半導體封裝件1,係將半導體晶片11藉由複數銲錫凸塊110以覆晶方式接置於一導線架10上,再以封裝膠體12包覆該半導體晶片11、導線架10及銲錫凸塊110,之後進行切割,以令該導線架10之各導腳100的側面(Side Surface)及底面(Bottom Surface)外露出該封裝膠體12,並使各該導腳100之底面與該封裝膠體12之底面齊平。
As shown in Figure 1, the conventional Quad Flat No leads (QFN) type semiconductor package 1 has a
另一方面,為符合薄化需求,需先降低該半導體晶片11之厚度d,再將該半導體晶片11接置於該導線架10上。
On the other hand, in order to meet the thinning requirement, the thickness d of the
惟,在多接點(I/O)數量且尺寸微小的封裝體積之需求下,尤其是該半導體封裝件1之整體厚度t小於0.3mm,該半導體晶片11所需之厚度d極小,故當該半導體晶片11接置於該導線架10上時,容易受壓而產生碎裂(crack)的狀況,造成該半導體封裝件1之信賴性不佳。
However, under the requirement of a multi-contact (I/O) number and a small size package, especially the overall thickness t of the semiconductor package 1 is less than 0.3mm, the required thickness d of the
因此,如何克服上述習知技術的問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the above-mentioned problems of the conventional technology has become an urgent problem to be solved at present.
鑑於上述習知技術之缺失,本發明係提供一種電子封裝件,係包括:承載件,係具有複數導腳;電子元件,係結合於該承載件上且電性連接該複數導腳;以及封裝層,係形成於該承載件上且包覆該電子元件,其中,該封裝層係定義有相對之第一表面與第二表面,該電子元件之一表面係齊平該封裝層之第一表面,且該導腳係齊平該封裝層之第二表面。 In view of the lack of the above-mentioned conventional technology, the present invention provides an electronic package, which includes: a carrier having a plurality of leads; an electronic component coupled to the carrier and electrically connected to the plurality of leads; and a package The layer is formed on the carrier and covers the electronic component, wherein the encapsulation layer is defined with a first surface and a second surface opposite to each other, and one surface of the electronic component is flush with the first surface of the encapsulation layer And the lead pin is flush with the second surface of the encapsulation layer.
本發明亦提供一種電子封裝件之製法,係包括:結合電子元件於一具有複數導腳之承載件上,且令該電子元件係電性連接該複數導腳;形成封裝層於該承載件上,使該封裝層包覆該電子元件;以及移除該封裝層之部分材質、該電子元件之部分材質及該承載件之部分材質,使該封裝層定義出相對之第一表面與第二表面,以令該電子元件之一表面齊平該封裝層之第一表面,且該導腳之一表面齊平該封裝層之第二表面。 The present invention also provides a method for manufacturing an electronic package, which includes: combining an electronic component on a carrier with a plurality of leads, and electrically connecting the electronic component with the plurality of leads; forming an encapsulation layer on the carrier , The packaging layer covers the electronic component; and removing part of the material of the packaging layer, part of the material of the electronic component and part of the material of the carrier, so that the packaging layer defines a first surface and a second surface opposite to each other , So that a surface of the electronic component is flush with the first surface of the encapsulation layer, and a surface of the lead pin is flush with the second surface of the encapsulation layer.
前述之製法中,係採用研磨方式移除該封裝層之部分材質、該電子元件之部分材質及該承載件之部分材質。 In the aforementioned manufacturing method, a grinding method is used to remove part of the material of the packaging layer, part of the material of the electronic component, and part of the material of the carrier.
前述之製法中,復包括進行切單作業。 In the aforementioned manufacturing method, multiple operations include cutting orders.
前述之電子封裝件及其製法中,該承載件係為導線架。 In the aforementioned electronic package and its manufacturing method, the carrier is a lead frame.
前述之電子封裝件及其製法中,該電子元件係具有相對之作用面與非作用面,該電子元件以該作用面藉由複數導電凸塊設於該導腳上,且該非作用面齊平該封裝層之第一表面。 In the aforementioned electronic package and its manufacturing method, the electronic component has an opposite active surface and a non-active surface, the electronic component is provided on the lead pin with the active surface through a plurality of conductive bumps, and the non-active surface is flush The first surface of the encapsulation layer.
前述之電子封裝件及其製法中,該封裝層係定義有鄰接該第一表面與第二表面之側面,且令該導腳之部分表面外露出該封裝層之側面。 In the aforementioned electronic package and its manufacturing method, the encapsulation layer is defined with side surfaces adjacent to the first surface and the second surface, and part of the surface of the lead pin is exposed to the side surface of the encapsulation layer.
前述之電子封裝件及其製法中,該電子元件係外露於該封裝層之第一表面。 In the aforementioned electronic package and its manufacturing method, the electronic component is exposed on the first surface of the package layer.
前述之電子封裝件及其製法中,復包括配置於該封裝層之第二表面上的絕緣層,其具有複數外露該導腳之開孔。 The aforementioned electronic package and its manufacturing method further include an insulating layer disposed on the second surface of the package layer, which has a plurality of openings exposing the lead pins.
前述之電子封裝件及其製法中,復包括配置於該電子元件與該封裝層之第一表面上的作用件。又包括配置於該封裝層之第二表面上的絕緣層,其具有複數外露該導腳之開孔,例如,該作用件之材質與該絕緣層之材質相同。或者,該作用件之材質係採用聚合物,以作為保護層。 In the aforementioned electronic package and its manufacturing method, it also includes active components arranged on the first surface of the electronic component and the package layer. It also includes an insulating layer disposed on the second surface of the encapsulation layer, which has a plurality of openings exposing the lead pins. For example, the material of the active part is the same as the material of the insulating layer. Alternatively, the material of the active part is made of polymer as a protective layer.
由上可知,本發明之電子封裝件及其製法中,主要藉由該電子元件上表面齊平該封裝層之第一表面,且該導腳下表面齊平該封裝層之第二表面,以縮小該承載件之厚度與該封裝層之厚度,故相較於習知技術,本發明之製法所得之電子封裝件之整體厚度能符合薄化需求,且能避免該電子元件產生碎裂的狀況。 It can be seen from the above that in the electronic package and the manufacturing method of the present invention, the upper surface of the electronic component is flush with the first surface of the encapsulation layer, and the lower surface of the lead pin is flush with the second surface of the encapsulation layer to reduce the size. The thickness of the carrier and the thickness of the packaging layer, compared with the prior art, the overall thickness of the electronic package obtained by the manufacturing method of the present invention can meet the thinning requirements, and can prevent the electronic component from being broken.
1‧‧‧半導體封裝件 1‧‧‧Semiconductor package
10‧‧‧導線架 10‧‧‧Wire frame
100,200‧‧‧導腳 100,200‧‧‧Guide foot
11‧‧‧半導體晶片 11‧‧‧Semiconductor chip
110‧‧‧銲錫凸塊 110‧‧‧Solder bump
12‧‧‧封裝膠體 12‧‧‧Packaging gel
2‧‧‧電子封裝件 2‧‧‧Electronic package
20‧‧‧承載件 20‧‧‧Carrier
20a‧‧‧第一側 20a‧‧‧First side
20b‧‧‧第二側 20b‧‧‧Second side
21‧‧‧電子元件 21‧‧‧Electronic components
21a‧‧‧作用面 21a‧‧‧working surface
21b‧‧‧非作用面 21b‧‧‧Inactive surface
210‧‧‧電極墊 210‧‧‧Electrode pad
211‧‧‧導電凸塊 211‧‧‧Conductive bump
22‧‧‧封裝層 22‧‧‧Encapsulation layer
22a‧‧‧第一表面 22a‧‧‧First surface
22b‧‧‧第二表面 22b‧‧‧Second surface
22c‧‧‧側面 22c‧‧‧Side
23‧‧‧絕緣層 23‧‧‧Insulation layer
230‧‧‧開孔 230‧‧‧Opening
24‧‧‧作用件 24‧‧‧action piece
A‧‧‧置晶部 A‧‧‧Crystal Placement Department
B‧‧‧外接部 B‧‧‧External part
d,h,h1,h2,r,t‧‧‧厚度 d,h,h1,h2,r,t‧‧‧thickness
第1圖係為習知半導體封裝件之剖面示意圖。 Figure 1 is a schematic cross-sectional view of a conventional semiconductor package.
第2A至2D圖係為本發明之電子封裝件之製法的剖面示意圖。 2A to 2D are schematic cross-sectional views of the manufacturing method of the electronic package of the present invention.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following specific examples illustrate the implementation of the present invention. Those familiar with the art can easily understand the other advantages and effects of the present invention from the content disclosed in this specification.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“第一”、“第二”、“上”、“下”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structure, ratio, size, etc. shown in the drawings in this manual are only used to match the content disclosed in the manual for the understanding and reading of those who are familiar with the art, and are not intended to limit the implementation of the present invention. Therefore, it does not have any technical significance. Any structural modification, proportional relationship change or size adjustment, without affecting the effects and objectives that can be achieved by the present invention, should still fall within the scope of the present invention. The technical content disclosed by the invention can be covered. At the same time, the terms such as "first", "second", "upper", "lower" and "one" cited in this specification are only for ease of description and are not intended to limit the scope of the present invention. The scope of implementation, the change or adjustment of the relative relationship, shall be regarded as the scope of the implementation of the present invention without substantive changes to the technical content.
第2A至2D圖係為本發明之電子封裝件2之製法的剖面示意圖。
2A to 2D are schematic cross-sectional views of the manufacturing method of the
如第2A圖所示,提供一具有相對之第一側20a與第二側20b的承載件20。
As shown in FIG. 2A, a
於本實施例中,該承載件20係為導線架,其包含複數相分離之導腳200,其中,該些導腳200係定義有相鄰接之置晶部A與外接部B,且該置晶部A較該外接部B靠近中間區域。
In this embodiment, the
如第2B圖所示,結合至少一電子元件21於該承載件20之第一側20a上。接著,形成一封裝層22於該承載件20之第一側20a上,以包覆該電子元件21,並外露出該承載件20之第二側20b。
As shown in FIG. 2B, at least one
該電子元件21係為主動元件、被動元件或其二者組合等,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容及電感。於本實施例中,該電子元件21係為半導體晶片,其具有相對之作用面21a與非作用面21b,且該作用面21a具有複數電極墊210,使該電子元件21藉由複數接合該些電極墊210之導電凸塊211(如銲錫材料或其它導電材),而採用覆晶方式設於該些導腳200之置晶部A上,以令該電子元件21電性連接該些導腳200。
The
再者,形成該封裝層22之材質係為聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、環氧樹脂(epoxy)或封裝材(molding compound)或其它適當絕緣材。
Furthermore, the material forming the
如第2C圖所示,移除該封裝層22之部分材質、該電子元件21之部分材質及該承載件20(第二側20b)之部分材質,以令該電子元件21之非作用面21b外露於該封裝層22,且該承載件20之第二側20b仍外露於該封裝層22。
As shown in Figure 2C, part of the material of the
於本實施例中,藉由整平作業(如研磨方式)沿如第2B圖所示之上方與下方之預定移除區域L移除該封裝層22之部分材質、該電子元件21之非作用面21b之部分材質及該承載件20之第二側20b之部分材質,使該封裝層22定義出相對之第一表面22a與第二表面22b,以令該電子元件21之非作用面21b齊平該封裝層22之第一表面22a,且該些導腳200(或該承載件20之第二側20b)係齊平該封裝層22之第二表面22b。
In this embodiment, a leveling operation (such as a grinding method) is used to remove part of the material of the
如第2D圖所示,沿如第2C圖所示之切割路徑S進行切單作業,以製得電子封裝件2,其導腳200係外露於該封裝層22之側面22c。
As shown in FIG. 2D, the slicing operation is performed along the cutting path S shown in FIG. 2C to produce the
於本實施例中,該電子封裝件2係為四方平面無引腳(QFN)型式,且該些導腳200之底面及側面係齊平該封裝層22之第二表面22b與側面22c,俾供後續於該些導腳200之外露表面上形成如銲球之銲錫材料(圖略),以接置於如電路板或另一線路板之電子裝置(圖略)。
In this embodiment, the
再者,可依需求於該承載件20之第二側20b與該封裝層22之第二表面22b上形成一絕緣層23,如防銲材,其形成有複數外露部分該導腳200之開孔230,以於外露出該些開孔230中之導腳200上形成如銲球之銲錫材料(圖略)。
Furthermore, an insulating
又,可依需求於該封裝層22之第一表面22a與該電子元件21之非作用面21b上配置一作用件24,如薄膜、散熱材或其它構造,以保護該電子元件21或提供該電子元件21之散熱。例如,該作用件24之材質可採用聚合物(Polymer),以作為保護層;或者,該作用件24之材質與該絕緣層23之材質可相同。
In addition, an
因此,本發明之製法係藉由整平作業,以移除該封裝層22之部分材質、該電子元件21之部分材質及該承載件20之第二側20b之部分材質,以縮小該承載件20之厚度h1與該封裝層22之厚度h2(如第2C圖所示),故相較於習知技術,本發明之製法所得之電子封裝件2之整體厚度h(如第2D圖所示)能符合薄化需求,例如整體厚度h僅為0.135mm。
Therefore, the manufacturing method of the present invention uses a leveling operation to remove part of the material of the
再者,本發明之製法係先將該電子元件21設於該承載件20上,再以該封裝層22包覆該電子元件21,以於移除該封裝層22之部分材質及該電子元件21之非作用面21b之部分材質時,該封裝層22能分散應
力,故相較於習知技術,本發明之製法不僅能薄化該電子元件21之厚度r,且能避免該電子元件21破裂之問題。
Furthermore, the manufacturing method of the present invention is to first set the
本發明復提供一種電子封裝件2,其包括:一承載件20、一電子元件21以及一封裝層22。
The present invention further provides an
所述之承載件20係為導線架,其包含複數相分離之導腳200。
The
所述之電子元件21係結合於該承載件20上且電性連接該導腳200。
The
所述之封裝層22係形成於該承載件20上且包覆該電子元件21,其中,該封裝層22係定義有相對之第一表面22a與第二表面22b,且該電子元件21之上表面係齊平該封裝層22之第一表面22a,而該導腳200之下表面係齊平該封裝層22之第二表面22b,以令該電子元件21與該導腳200外露於該封裝層22。
The
於一實施例中,該電子元件21係具有相對之作用面21a與非作用面21b,且該作用面21a藉由複數導電凸塊211設於該導腳200上,而該非作用面21b齊平該封裝層22之第一表面22a。
In one embodiment, the
於一實施例中,該封裝層22係定義有鄰接該第一與第二表面22a,22b之側面22c,以令該導腳200外露於該封裝層22之側面22c。
In one embodiment, the
於一實施例中,該電子元件21係外露於該封裝層22之第一表面22a。
In one embodiment, the
於一實施例中,所述之電子封裝件2復包括配置於該封裝層22之第二表面22b上的絕緣層23,其具有複數外露該導腳200之開孔230。
In one embodiment, the
於一實施例中,所述之電子封裝件2復包括配置於該電子元件21與該封裝層22之第一表面22a上的作用件24。例如,該作用件24之材
質與該絕緣層23之材質相同。或者,該作用件24之材質係採用聚合物,以作為保護層。
In one embodiment, the
綜上所述,本發明之電子封裝件及其製法係藉由上、下方向研磨之整平過程,以縮小該電子封裝件之整體厚度,因而能符合薄化之需求,且能避免該電子元件破裂之問題。 To sum up, the electronic package and its manufacturing method of the present invention reduce the overall thickness of the electronic package through the leveling process of grinding in the upper and lower directions, so that it can meet the needs of thinning, and can avoid the electronic The problem of component cracking.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-mentioned embodiments are used to exemplify the principles and effects of the present invention, but not to limit the present invention. Anyone who is familiar with this technique can modify the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of patent application described later.
2‧‧‧電子封裝件 2‧‧‧Electronic package
20‧‧‧承載件 20‧‧‧Carrier
20b‧‧‧第二側 20b‧‧‧Second side
200‧‧‧導腳 200‧‧‧Guide foot
21‧‧‧電子元件 21‧‧‧Electronic components
21b‧‧‧非作用面 21b‧‧‧Inactive surface
22‧‧‧封裝層 22‧‧‧Encapsulation layer
22a‧‧‧第一表面 22a‧‧‧First surface
22b‧‧‧第二表面 22b‧‧‧Second surface
22c‧‧‧側面 22c‧‧‧Side
23‧‧‧絕緣層 23‧‧‧Insulation layer
230‧‧‧開孔 230‧‧‧Opening
24‧‧‧作用件 24‧‧‧action piece
h‧‧‧厚度 h‧‧‧Thickness
Claims (20)
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CN113675102A (en) * | 2021-10-22 | 2021-11-19 | 深圳新声半导体有限公司 | Method for chip packaging and chip particles |
US11616044B2 (en) | 2021-10-20 | 2023-03-28 | Shenzhen Newsonic Technologies Co., Ltd. | Chip packaging method and particle chips |
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TW463342B (en) * | 2000-08-18 | 2001-11-11 | Siliconware Precision Industries Co Ltd | Flip-chip quad-flat nolead package |
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