TW202031739A - Curable polysilsesquioxane compound, curable composition, cured product, and, method for using curable composition - Google Patents

Curable polysilsesquioxane compound, curable composition, cured product, and, method for using curable composition Download PDF

Info

Publication number
TW202031739A
TW202031739A TW108135111A TW108135111A TW202031739A TW 202031739 A TW202031739 A TW 202031739A TW 108135111 A TW108135111 A TW 108135111A TW 108135111 A TW108135111 A TW 108135111A TW 202031739 A TW202031739 A TW 202031739A
Authority
TW
Taiwan
Prior art keywords
curable
curable composition
polysilsesquioxane compound
component
compound
Prior art date
Application number
TW108135111A
Other languages
Chinese (zh)
Other versions
TWI831839B (en
Inventor
梅田明来子
宮脇学
中山秀一
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW202031739A publication Critical patent/TW202031739A/en
Application granted granted Critical
Publication of TWI831839B publication Critical patent/TWI831839B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/544Silicon-containing compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/541Silicon-containing compounds containing oxygen
    • C08K5/5435Silicon-containing compounds containing oxygen containing oxygen in a ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08Macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • C09J183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/011Nanostructured additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

The present invention is: a curable polysilsesquioxane compound having a repeating unit represented by the following formula (a-1), wherein said curable polysilsesquioxane compound is characterized by fulfilling a specified requirement relating to 29Si-NMR and having a mass-average molecular weight (Mw) in a specified range; a curable composition containing said curable polysilsesquioxane compound; a cured product made by curing the curable composition; and, a method for using the curable composition as an adhesive for an optical element fixing material or as a sealing material for an optical element fixing material. The curable composition according to the present invention has excellent curing properties and a low refractive index. In formula (a-1), R1 represents a fluoroalkyl group represented by a compositional formula CmH(2m-n+1)Fn. m represents an integer from 1-10, and n represents an integer of at least 2 and no more than (2m+1). D represents a connecting group (except for an alkylene group) which joins the R1 and Si, or represents a single bond.

Description

硬化性聚倍半矽氧烷化合物、硬化性組合物、硬化物以及硬化性組合物的使用方法Curable polysilsesquioxane compound, curable composition, cured product, and use method of curable composition

本發明係有關於一種硬化性聚倍半矽氧烷化合物、含有前述硬化性聚倍半矽氧烷化合物之具有優異的硬化性且折射率較低的硬化性組合物、將前述硬化性組合物硬化而成之接著強度較高的硬化物、及將前述硬化性組合物使用作為光學元件固定材用接著劑或光學元件固定材用密封劑之方法。The present invention relates to a curable polysilsesquioxane compound, a curable composition containing the aforementioned curable polysilsesquioxane compound having excellent curability and a low refractive index, and the aforementioned curable composition A cured product with high adhesive strength after curing, and a method of using the curable composition as an adhesive for an optical element fixing material or a sealing agent for an optical element fixing material.

先前,硬化性組合物係按照用途而進行各式各樣的改良且在產業上被廣泛地利用作為光學零件或成形體的原料、接著劑、塗佈劑等。又,硬化性組合物亦作為光學元件固定材用接著劑、光學元件固定材用密封劑等的光學元件固定材用組合物而受到關注。Previously, curable compositions were modified in various ways according to applications, and were widely used industrially as raw materials, adhesives, coating agents, and the like for optical parts or molded articles. In addition, the curable composition is also attracting attention as a composition for an optical element fixing material, such as an adhesive for an optical element fixing material and a sealant for an optical element fixing material.

光學元件係有半導體雷射(LD)等的各種雷射和發光二極體(LED)等的發光元件、受光元件、複合光學元件、光積體電路等。近年來,係開發且廣泛地使用發光尖峰波長為較短波長之藍色光或白色光的光學元件。此種發光尖峰波長較短的發光元件的高亮度化係飛躍性地進展且伴隨著該情形,光學元件的發熱量係有進一步變大之傾向。Optical components include various lasers such as semiconductor lasers (LD), light-emitting components such as light-emitting diodes (LED), light-receiving components, composite optical components, optical integrated circuits, and the like. In recent years, optical elements with blue light or white light whose emission peak wavelength is a shorter wavelength have been developed and widely used. The high-brightness system of such a light-emitting element with a short emission peak wavelength is advancing drastically, and with this situation, the calorific value of the optical element tends to increase further.

然而,伴隨著近年來之光學元件的高亮度化,光學元件固定材用組合物的硬化物係長時間被曝露在較高能量的光線和從光學元件所產生的高溫熱量,而產生接著力低落之問題。However, with the recent increase in brightness of optical elements, the hardened material of the composition for fixing optical elements has been exposed to high-energy light and high-temperature heat generated from optical elements for a long time, resulting in a decrease in adhesive strength. problem.

為了解決該問題,專利文獻1~3係提案一種將聚倍半矽氧烷化合物作為主成分之光學元件固定材用組合物。但是即便專利文獻1~3記載之組合物的硬化物,亦有難以在保持充分的接著力之同時,得到耐熱性之情形。In order to solve this problem, Patent Documents 1 to 3 propose a composition for an optical element fixing material containing a polysilsesquioxane compound as a main component. However, even in the cured product of the composition described in Patent Documents 1 to 3, it may be difficult to obtain heat resistance while maintaining sufficient adhesive force.

又,使用硬化性組合物將光學元件等固定時,多半的情形是形成具有配合目的之折射率之硬化物為重要的。特別是因為先前的硬化性組合物或其硬化物多半是折射率較高之物,所以要求折射率較低的硬化性組合物。In addition, when using a curable composition to fix an optical element, etc., it is important to form a cured product having a refractive index for the purpose in most cases. In particular, since most of the conventional curable compositions or their cured products have higher refractive indices, curable compositions with lower refractive index are required.

專利文獻4係記載一種含有具有氟烷基的硬化性聚倍半矽氧烷化合物之硬化性組合物,作為提供折射率較低的硬化物之硬化性組合物。 但是如專利文獻4的實施例所示,使用含有具有氟烷基的重複單元比率為較高的硬化性聚倍半矽氧烷化合物之硬化性組合物時,係難以得到接著強度較高的硬化物。如此,專利文獻4記載之硬化性組合物的硬化物,在較高的接著強度與較低的折射率之間具有取捨(trade‐off)的關係。因此,使用專利文獻4記載的硬化性組合物時,係難以得到具有較高的接著強度與較低的折射率之雙方的特性之硬化物。Patent Document 4 describes a curable composition containing a curable polysilsesquioxane compound having a fluoroalkyl group as a curable composition that provides a curable product with a lower refractive index. However, as shown in the examples of Patent Document 4, when a curable composition containing a curable polysilsesquioxane compound with a higher ratio of repeating units having a fluoroalkyl group is used, it is difficult to obtain a curable composition with higher adhesive strength. Things. In this way, the cured product of the curable composition described in Patent Document 4 has a trade-off relationship between higher adhesive strength and lower refractive index. Therefore, when the curable composition described in Patent Document 4 is used, it is difficult to obtain a cured product having the characteristics of both high adhesive strength and low refractive index.

又,已知藉由在硬化性組合物添加填料等來改善作業性等。 但是,因為通常含有填料等之硬化性組合物或其硬化物,其折射率係有變高之傾向,所以渴望一種即便添加填料等,折射率亦較低的硬化性組合物。 [先前技術文獻] [專利文獻]Moreover, it is known to improve workability etc. by adding filler etc. to a curable composition. However, usually curable compositions containing fillers and the like or their cured products tend to have a higher refractive index. Therefore, even if fillers are added, a curable composition with a lower refractive index is desired. [Prior Technical Literature] [Patent Literature]

[專利文獻1] 日本特開2004-359933號公報 [專利文獻2] 日本特開2005-263869號公報 [專利文獻3] 日本特開2006-328231號公報 [專利文獻4] WO2017/110948號(US2018/0355111 A1)[Patent Document 1] JP 2004-359933 A [Patent Document 2] Japanese Patent Application Publication No. 2005-263869 [Patent Document 3] Japanese Patent Application Publication No. 2006-328231 [Patent Document 4] WO2017/110948 (US2018/0355111 A1)

發明欲解決之課題 本發明係鑒於上述先前技術的實際情況而進行,其目的係提供一種具有優異的硬化性且折射率較低的硬化性組合物、作為該硬化性組合物的成分有用的硬化性聚倍半矽氧烷化合物、將前述硬化性組合物硬化而成之接著強度較高的硬化物、以及將前述硬化性組合物使用作為光學元件固定材用接著劑或光學元件固定材用密封劑之方法。 在本發明,所謂「硬化性組合物」,係指藉由滿足加熱等的預定條件而變化成為硬化物之組合物。 在本發明,所謂「硬化性聚倍半矽氧烷化合物」,係指藉由滿足加熱等的預定條件而單獨變化成為硬化物之聚倍半矽氧烷化合物、或在前述硬化性組合物達成作為硬化性成分的功能之聚倍半矽氧烷化合物。 用以解決課題之手段Problems to be solved by the invention The present invention was made in view of the actual situation of the above-mentioned prior art, and its object is to provide a curable composition having excellent curability and a low refractive index, and curable polysilsesquioxane useful as a component of the curable composition An oxane compound, a cured product with a high adhesive strength obtained by curing the curable composition, and a method of using the curable composition as an adhesive for an optical element fixing material or a sealing agent for an optical element fixing material. In the present invention, the "curable composition" refers to a composition that changes into a cured product by satisfying predetermined conditions such as heating. In the present invention, the "curable polysilsesquioxane compound" refers to a polysilsesquioxane compound that is individually changed into a cured product by satisfying predetermined conditions such as heating, or is achieved in the aforementioned curable composition A polysilsesquioxane compound that functions as a curable component. Means to solve the problem

本發明者等係為了解決上述課題,而針對具有氟烷基的硬化性聚倍半矽氧烷化合物進行專心研討。 其結果發現, (1)由於將氟烷基導入至硬化性聚倍半矽氧烷化合物致使硬化物的接著強度為低落之問題,係能夠藉由使用具有特定重複單元且同時滿足有關分子結構之必要條件(後述必要條件1)及有關分子量之必要條件(後述必要條件2)之硬化性聚倍半矽氧烷化合物(以下有稱為「硬化性聚倍半矽氧烷化合物(A)」之情形)而解決;及 (2)含有硬化性聚倍半矽氧烷化合物(A)之硬化性組合物,因為具有優異的硬化性之特性,所以亦具有能夠不過度地加熱而進行硬化反應之優點。 而且,發現含有硬化性聚倍半矽氧烷化合物(A)及具有254℃以上的沸點之溶劑之硬化性組合物,因為塗佈後即便被放置長時間,黏度變化亦較小,所以具有與剛塗佈後同樣的作業性。 本發明係基於該等見解而完成。In order to solve the above-mentioned problems, the inventors of the present invention conducted intensive studies on curable polysilsesquioxane compounds having a fluoroalkyl group. As a result, (1) The adhesive strength of the cured product is low due to the introduction of fluoroalkyl groups into the curable polysilsesquioxane compound. It is possible to use specific repeating units and meet the requirements of the molecular structure (described later) The necessary condition 1) and the necessary condition related to the molecular weight (required condition 2 described later) are cured polysilsesquioxane compound (hereinafter referred to as "curable polysilsesquioxane compound (A)"). ;and (2) The curable composition containing the curable polysilsesquioxane compound (A) has excellent curability characteristics, so it also has the advantage of being able to undergo a curing reaction without excessive heating. Furthermore, it has been found that a curable composition containing a curable polysilsesquioxane compound (A) and a solvent having a boiling point of 254°C or higher has little change in viscosity even after it is left for a long time after coating, so it has the advantages of Same workability immediately after coating. The present invention has been completed based on these findings.

如此,依照本發明,能夠提供下述[1]~[5]的硬化性聚倍半矽氧烷化合物、[6]~[9]的硬化性組合物、[10]、[11]的硬化物、及[12]、[13]之硬化性組合物的使用方法。Thus, according to the present invention, the following curable polysilsesquioxane compounds [1] to [5], curable compositions of [6] to [9], and curing of [10] and [11] can be provided物, and the use method of the curable composition of [12] and [13].

[1] 一種硬化性聚倍半矽氧烷化合物,係具有下述式(a-1)所示的重複單元之硬化性聚倍半矽氧烷化合物,其特徵在於:滿足下述必要條件1及必要條件2。[1] A curable polysilsesquioxane compound, which is a curable polysilsesquioxane compound having a repeating unit represented by the following formula (a-1), characterized in that it satisfies the following requirement 1 And necessary conditions 2.

Figure 02_image003
Figure 02_image003

[R1 表示組成式:Cm H(2m-n+1) Fn 所表示之氟烷基,m表示為1~10的整數,n表示為2以上且(2m+1)以下的整數,D表示將R1 與Si鍵結之連結基(但是伸烷基除外)或單鍵], [必要條件1] 測定硬化性聚倍半矽氧烷化合物的29 Si-NMR時,能夠在-62ppm以上且小於-52ppm的區域[區域(2)]觀測到1或2個以上的尖峰,能夠在-52ppm以上且小於-45ppm的區域[區域(1)]及-73ppm以上且小於-62ppm的區域[區域(3)]之至少一區域觀測到1或2個以上的尖峰,而且下述式導出之Z2為20~40%,[R 1 represents the composition formula: C m H (2m-n+1) fluoroalkyl group represented by F n , m represents an integer from 1 to 10, and n represents an integer from 2 to (2m+1), D represents the linking group (except the alkylene group) or the single bond that connects R 1 to Si. [Requirement 1] When measuring 29 Si-NMR of the curable polysilsesquioxane compound, it can be -62ppm 1 or more peaks are observed in the region above and below -52ppm [region (2)], and can be in the region above -52ppm and below -45ppm [region (1)] and region above -73ppm but below -62ppm [Area (3)] At least one area has 1 or 2 sharp peaks observed, and Z2 derived from the following formula is 20-40%,

Figure 02_image004
Figure 02_image004

P1:在區域(1)之積分值 P2:在區域(2)之積分值 P3:在區域(3)之積分值 [必要條件2] 硬化性聚倍半矽氧烷化合物的質量平均分子量(Mw)為4,000~11,000。P1: Integral value in area (1) P2: Integral value in area (2) P3: Integral value in area (3) [Required Condition 2] The mass average molecular weight (Mw) of the curable polysilsesquioxane compound is 4,000 to 11,000.

[2] 如[1]所述之硬化性聚倍半矽氧烷化合物,其中式(a-1)所示之重複單元比率係相對於總重複單元為25mol%以上。 [3] 如[1]或[2]所述之硬化性聚倍半矽氧烷化合物,其中進一步具有下述式(a-2)所示之重複單元。[2] The curable polysilsesquioxane compound as described in [1], wherein the ratio of the repeating unit represented by the formula (a-1) is 25 mol% or more with respect to the total repeating unit. [3] The curable polysilsesquioxane compound as described in [1] or [2], which further has a repeating unit represented by the following formula (a-2).

Figure 02_image006
Figure 02_image006

[R2 表示未取代之碳數1~10的烷基、或具有取代基、或未取代之碳數6~12的芳基]。 [4] 如[3]所述之硬化性聚倍半矽氧烷化合物,其中式(a-2)所示之重複單元比率係相對於總重複單元為大於0mol%且75mol%以下。 [5] 如[1]至[3]項中任一項所述之硬化性聚倍半矽氧烷化合物,其中測定29 Si-NMR時,能夠在區域(3)觀測到1或2個以上的尖峰且下述式所導出的Z3為60~80%。[R 2 represents an unsubstituted alkyl group having 1 to 10 carbons, or a substituted or unsubstituted aryl group having 6 to 12 carbons]. [4] The curable polysilsesquioxane compound according to [3], wherein the ratio of the repeating unit represented by the formula (a-2) is greater than 0 mol% and 75 mol% or less with respect to the total repeating units. [5] The curable polysilsesquioxane compound described in any one of [1] to [3], wherein when 29 Si-NMR is measured, 1 or 2 or more can be observed in the region (3) Z3 derived from the following formula is 60 to 80%.

Figure 02_image008
Figure 02_image008

[6] 一種硬化性組合物,其特徵在於含有下述(A)成分、及具有254℃以上的沸點之溶劑。 (A)成分:如[1]至[5]項中任一項所述之硬化性聚倍半矽氧烷化合物 [7] 如[6]所述之硬化性組合物,係進一步含有下述(B)成分。 (B)成分:在分子內具有氮原子之矽烷偶合劑 [8] 如[6]或[7]所述之硬化性組合物,係進一步含有下述(C)成分。 (C)成分:在分子內具有酸酐結構之矽烷偶合劑 [9] 如[6]至[8]項中任一項所述之硬化性組合物,係進一步含有下述(D)。 (D)成分:平均一次粒徑為5~40nm的微粒 [10] 一種硬化物,係將如前述[6]至[9]項中任一項所述之硬化性組合物硬化而得到。 [11] 如[10]所述之硬化物,係光學元件固定材。 [12] 一種方法,係將如前述[6]至[9]項中任一項所述之硬化性組合物使用作為光學元件固定材用接著劑。 [13] 一種方法,係將如前述[6]至[9]項中任一項所述之硬化性組合物使用作為光學元件固定材用密封劑。 發明效果[6] A curable composition characterized by containing the following (A) component and a solvent having a boiling point of 254°C or higher. (A) Component: the curable polysilsesquioxane compound as described in any one of [1] to [5] [7] The curable composition as described in [6], which further contains the following component (B). (B) Component: Silane coupling agent with nitrogen atom in the molecule [8] The curable composition as described in [6] or [7], which further contains the following (C) component. (C)Component: Silane coupling agent with acid anhydride structure in the molecule [9] The curable composition according to any one of [6] to [8], which further contains the following (D). (D)Component: Fine particles with an average primary particle size of 5-40nm [10] A cured product obtained by curing the curable composition described in any one of [6] to [9]. [11] The cured product described in [10] is an optical element fixing material. [12] A method of using the curable composition as described in any one of [6] to [9] as an adhesive for fixing an optical element. [13] A method of using the curable composition as described in any one of [6] to [9] as a sealant for fixing an optical element. Invention effect

依照本發明,能夠提供一種具有優異的硬化性且折射率較低的硬化性組合物、作為該硬化性組合物的成分有用的硬化性聚倍半矽氧烷化合物、將前述硬化性組合物硬化而成之接著強度較高的硬化物、以及將前述硬化性組合物使用作為光學元件固定材用接著劑或光學元件固定材用密封劑之方法。According to the present invention, it is possible to provide a curable composition having excellent curability and a low refractive index, a curable polysilsesquioxane compound useful as a component of the curable composition, and curing the aforementioned curable composition The resulting cured product with high adhesive strength and the method of using the curable composition as an adhesive for an optical element fixing material or a sealing agent for an optical element fixing material.

用以實施發明之形態 以下,將本發明分項成為1)硬化性聚倍半矽氧烷化合物、2)硬化性組合物、3)硬化物、及4)硬化性組合物的使用方法而詳細地說明。The form used to implement the invention Hereinafter, the method of using the present invention divided into 1) curable polysilsesquioxane compound, 2) curable composition, 3) curable product, and 4) curable composition will be described in detail.

1)硬化性聚倍半矽氧烷化合物 本發明的硬化性聚倍半矽氧烷化合物[硬化性聚倍半矽氧烷化合物(A)]係具有下述式(a-1)所示的重複單元之硬化性聚倍半矽氧烷化合物,其特徵在於滿足上述必要條件1及必要條件2。1) Curing polysilsesquioxane compound The curable polysilsesquioxane compound of the present invention [curable polysilsesquioxane compound (A)] is a curable polysilsesquioxane having a repeating unit represented by the following formula (a-1) The compound is characterized by satisfying the above-mentioned requirement 1 and requirement 2.

Figure 02_image003
Figure 02_image003

[R1 表示組成式Cm H(2m-n+1) Fn 所表示之氟烷基。m為1~10的整數,n表示2以上且(2m+1)以下的整數。D表示將R1 與Si鍵結之連結基(但是伸烷基除外)或單鍵]。[R 1 represents a fluoroalkyl group represented by the composition formula C m H (2m-n+1) F n . m is an integer of 1-10, and n represents an integer of 2 or more and (2m+1) or less. D represents a linking group (except for the alkylene group) or a single bond connecting R 1 and Si.

式(a-1)中,R1 表示組成式:Cm H(2m-n+1) Fn 所表示之氟烷基。m為1~10的整數,n表示2以上且(2m+1)以下的整數。m係較佳為1~5的整數,更佳為1~3的整數。 藉由使用具有R1 之硬化性聚倍半矽氧烷化合物,能夠得到折射率較低的硬化性組合物。In the formula (a-1), R 1 represents the composition formula: a fluoroalkyl group represented by C m H (2m-n+1) F n . m is an integer of 1-10, and n represents an integer of 2 or more and (2m+1) or less. m is preferably an integer of 1 to 5, more preferably an integer of 1 to 3. By using a curable polysilsesquioxane compound having R 1 , a curable composition with a low refractive index can be obtained.

作為組成式:Cm H(2m-n+1) Fn 所表示之氟烷基,可舉出CF3 、CF3 CF2 、CF3 (CF2 )2 、CF3 (CF2 )3 、CF3 (CF2 )4 、CF3 (CF2 )5 、CF3 (CF2 )6 、CF3 (CF2 )7 、CF3 (CF2 )8 、CF3 (CF2 )9 等的全氟烷基;CF3 CH2 CH2 、CF3 (CF2 )3 CH2 CH2 、CF3 (CF2 )5 CH2 CH2 、CF3 (CF2 )7 CH2 CH2 等的氫氟烷基。As the composition formula: fluoroalkyl represented by C m H (2m-n+1) F n , CF 3 , CF 3 CF 2 , CF 3 (CF 2 ) 2 , CF 3 (CF 2 ) 3 , CF 3 (CF 2 ) 4 , CF 3 (CF 2 ) 5 , CF 3 (CF 2 ) 6 , CF 3 (CF 2 ) 7 , CF 3 (CF 2 ) 8 , CF 3 (CF 2 ) 9, etc. Fluoroalkyl; CF 3 CH 2 CH 2 , CF 3 (CF 2 ) 3 CH 2 CH 2 , CF 3 (CF 2 ) 5 CH 2 CH 2 , CF 3 (CF 2 ) 7 CH 2 CH 2 and other hydrofluorine alkyl.

式(a-1)中,D表示將R1 與Si鍵結之連結基(但是伸烷基除外)或單鍵。 作為D的連結基,可舉出1,4-伸苯基、1,3-伸苯基、1,2-伸苯基、1,5-伸萘基等碳數為6~20的伸芳基。In the formula (a-1), D represents a linking group (except for the alkylene group) or a single bond that bonds R 1 to Si. Examples of the linking group of D include 1,4-phenylene, 1,3-phenylene, 1,2-phenylene, 1,5-naphthylene, and other carbon atoms with 6-20 carbon atoms. base.

硬化性聚倍半矽氧烷化合物(A)可為具有1種(R1 -D)之物(同元聚合物),亦可為具有2種以上的(R1 -D)之物(共聚物)。 硬化性聚倍半矽氧烷化合物(A)為共聚物時,硬化性聚倍半矽氧烷化合物(A)可為無規共聚物、嵌段共聚物、接枝共聚物、交替共聚物等的任一種,從製造容易性等觀點而言,係以無規共聚物為佳。 又,硬化性聚倍半矽氧烷化合物(A)的結構可為梯型(ladder type)結構、雙層型結構(double-decker)、籠型結構、部分開裂籠型結構、環狀型結構、無規型結構之任一種結構。The curable polysilsesquioxane compound (A) may have one type of (R 1 -D) (homopolymer), or may have two or more types of (R 1 -D) (copolymerization).物). When the curable polysilsesquioxane compound (A) is a copolymer, the curable polysilsesquioxane compound (A) can be a random copolymer, block copolymer, graft copolymer, alternating copolymer, etc. From the viewpoint of ease of manufacture and the like, random copolymers are preferred. In addition, the structure of the sclerosing polysilsesquioxane compound (A) may be a ladder type structure, a double-decker structure, a cage structure, a partially cracked cage structure, and a cyclic structure. , Any structure of random structure.

在硬化性聚倍半矽氧烷化合物(A)所含有之式(a-1)所示的重複單元的比率,係相對於總重複單元,良好為25mol%以上,較佳為25~90mol%,更佳為25~85mol%。 藉由使用式(a-1)所示之重複單元比率係相對於總重複單元為25mol%以上的硬化性聚倍半矽氧烷化合物(A),能夠得到折射率較低的硬化性組合物。The ratio of the repeating unit represented by the formula (a-1) contained in the curable polysilsesquioxane compound (A) is preferably 25 mol% or more, preferably 25 to 90 mol%, relative to the total repeating units , More preferably 25~85mol%. By using the curable polysilsesquioxane compound (A) whose repeating unit ratio represented by the formula (a-1) is 25 mol% or more with respect to the total repeating units, a curable composition with a lower refractive index can be obtained .

硬化性聚倍半矽氧烷化合物(A)亦可為進一步具有下述式(a-2)所示的重複單元之物(共聚物)。The curable polysilsesquioxane compound (A) may further have a repeating unit represented by the following formula (a-2) (copolymer).

Figure 02_image010
Figure 02_image010

式(a-2)中,R2 表示未取代之碳數1~10的烷基、或具有取代基、或是未取代之碳數6~12的芳基。In formula (a-2), R 2 represents an unsubstituted alkyl group having 1 to 10 carbons, or a substituted group, or an unsubstituted aryl group having 6 to 12 carbons.

作為R2 之未取代之碳數1~10的烷基,可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、正己基、正辛基、正壬基、正癸基等。Examples of the unsubstituted alkyl group having 1 to 10 carbon atoms in R 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, and tert-butyl. , N-pentyl, n-hexyl, n-octyl, n-nonyl, n-decyl, etc.

作為R2 之未取代之碳數6~12的芳基,可舉出苯基、1-萘基、2-萘基等。 作為R2 之具有取代基之碳數6~12的芳基的取代基,可舉出甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基、正庚基、正辛基、異辛基等的烷基;氟原子、氯原子、溴原子等的鹵素原子;甲氧基、乙氧基等的烷氧基。Examples of the unsubstituted aryl group having 6 to 12 carbon atoms for R 2 include phenyl, 1-naphthyl, 2-naphthyl and the like. Examples of the substituent of the substituted aryl group having 6 to 12 carbon atoms in R 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, Alkyl groups such as tertiary butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, and isooctyl groups; halogen atoms such as fluorine atom, chlorine atom, bromine atom, etc.; methoxy group, ethoxy group, etc. Alkoxy.

該等之中,作為R2 ,因為能容易得到接著強度較高且具有更優異的耐熱性之硬化物,係以未取代之碳數1~10的烷基為佳,以未取代之碳數1~6的烷基為較佳,以未取代之碳數1~3的烷基為特佳。Among these, as R 2 , it is easy to obtain a hardened product with higher bonding strength and better heat resistance. It is preferably an unsubstituted alkyl group with 1-10 carbon atoms, and an unsubstituted carbon number An alkyl group of 1 to 6 is preferred, and an unsubstituted alkyl group of 1 to 3 carbons is particularly preferred.

硬化性聚倍半矽氧烷化合物(A)係具有式(a-2)所示之重複單元時,硬化性聚倍半矽氧烷化合物(A)可為具有1種R2 之物,亦可為具有2種以上的R2 之物。When the curable polysilsesquioxane compound (A) has a repeating unit represented by formula (a-2), the curable polysilsesquioxane compound (A) may have one type of R 2 or It may have two or more types of R 2 .

硬化性聚倍半矽氧烷化合物(A)係具有式(a-2)所示之重複單元時,其比率係相對於總重複單元,良好為超過0mol%且75mol%以下,較佳為10~75mol%,更佳為15~75mol%。 藉由使用式(a-2)所示之重複單元比率為上述範圍內的硬化性聚倍半矽氧烷化合物(A),而容易得到接著強度較高且具有更優異的耐熱性之硬化物。When the curable polysilsesquioxane compound (A) has a repeating unit represented by the formula (a-2), the ratio is preferably more than 0 mol% and 75 mol% or less with respect to the total repeating units, preferably 10 ~75mol%, more preferably 15~75mol%. By using the curable polysilsesquioxane compound (A) whose repeating unit ratio represented by formula (a-2) is within the above range, it is easy to obtain a cured product with higher bonding strength and better heat resistance .

硬化性聚倍半矽氧烷化合物(A)中之式(a-1)或式(a-2)所示之重複單元比率,係例如能夠藉由測定硬化性聚倍半矽氧烷化合物(A)的29 Si-NMR而求取。The ratio of the repeating unit represented by formula (a-1) or formula (a-2) in the curable polysilsesquioxane compound (A) can be measured, for example, by measuring the curable polysilsesquioxane compound ( A) is determined by 29 Si-NMR.

因為硬化性聚倍半矽氧烷化合物(A)係對丙酮等的酮系溶劑;苯等的芳香族烴系溶劑;二甲基亞碸等的含硫系溶劑;四氫呋喃等的醚系溶劑;乙酸乙酯等的酯系溶劑;氯仿等的含鹵素系溶劑;及由該等2種以上所構成的混合溶劑等的各種有機溶劑為可溶,所以能夠使用該等溶劑而測定硬化性聚倍半矽氧烷化合物(A)在溶液狀態下的29 Si-NMR。Because the curable polysilsesquioxane compound (A) is a ketone-based solvent such as acetone; an aromatic hydrocarbon-based solvent such as benzene; a sulfur-containing solvent such as dimethyl sulfoxide; an ether-based solvent such as tetrahydrofuran; Ester solvents such as ethyl acetate; halogen-containing solvents such as chloroform; and various organic solvents such as mixed solvents composed of these two or more kinds are soluble, so it is possible to use these solvents to measure the curable polymer 29 Si-NMR of the semisiloxane compound (A) in a solution state.

式(a-1)所示之重複單元、式(a-2)所示之重複單元係下述式(a-3)所示之物。The repeating unit represented by the formula (a-1) and the repeating unit represented by the formula (a-2) are those represented by the following formula (a-3).

Figure 02_image011
Figure 02_image011

[G表示(R1 -D)或R2 。R1 、D、R2 係各自表示與上述相同意思。所謂O1/2 ,表示與相鄰的重複單元共有氧原子]。[G represents (R 1 -D) or R 2 . R 1 , D, and R 2 each have the same meaning as above. The so-called O 1/2 means that it shares an oxygen atom with the adjacent repeating unit].

如式(a-3)所示,硬化性聚倍半矽氧烷化合物(A)係具有通常被總稱為T-位置(T-site)之3個氧原子鍵結在矽原子且此外的1個基(G所表示之基)鍵結在矽原子而成之部分結構。 作為在硬化性聚倍半矽氧烷化合物(A)所含有的T-位置,可舉出下述式(a-4)~(a-6)所示之物。As shown in formula (a-3), the curable polysilsesquioxane compound (A) has three oxygen atoms commonly referred to as T-sites (T-site) bonded to silicon atoms and the other 1 A part of the structure formed by a group (group represented by G) bonded to a silicon atom. Examples of the T-position contained in the curable polysilsesquioxane compound (A) include those represented by the following formulas (a-4) to (a-6).

Figure 02_image013
Figure 02_image013

式(a-4)、(a-5)及(a-6)中,G表示與上述相同意思。R3 表示氫原子或碳數1~10的烷基。作為R3 之碳數1~10的烷基,可舉出甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基等。複數個R3 之間可全部相同亦可相不同。又,上述式(a-4)~(a-6)中,*係鍵結著矽原子。In formulas (a-4), (a-5) and (a-6), G represents the same meaning as above. R 3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. Examples of the alkyl group having 1 to 10 carbon atoms in R 3 include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, isobutyl, and tertiary butyl. The plurality of R 3 may all be the same or different. In addition, in the above formulas (a-4) to (a-6), * is a silicon atom.

式(a-4)及式(a-5)所示之T-位置,係含有能夠有助於聚縮合反應之基(R3 -O)。因而,含有多個該等T-位置之聚倍半矽氧烷化合物係具有優異的反應性。又,含有此種聚倍半矽氧烷化合物之組合物係具有優異的硬化性。 另一方面,式(a-5)及式(a-6)所示的T-位置係與2個以上的矽原子(相鄰的T-位置中的矽原子)鍵結著。因而,含有多個該等T-位置之聚倍半矽氧烷化合物係具有較大分子量之傾向。The T-position shown in formula (a-4) and formula (a-5) contains a group (R 3 -O) that can contribute to the polycondensation reaction. Therefore, polysilsesquioxane compounds containing a plurality of these T-positions have excellent reactivity. In addition, a composition containing such a polysilsesquioxane compound has excellent curability. On the other hand, the T-position represented by the formula (a-5) and the formula (a-6) is bonded to two or more silicon atoms (silicon atoms in adjacent T-positions). Therefore, polysilsesquioxane compounds containing a plurality of these T-positions tend to have larger molecular weights.

因而,含有多個式(a-5)所示的T-位置之聚倍半矽氧烷化合物係具有較大分子量且具有充分的反應性。 本發明係基於該見解而進行。亦即,本發明的硬化性聚倍半矽氧烷化合物(A)係滿足以下的必要條件1之物。Therefore, the polysilsesquioxane compound containing a plurality of T-positions represented by the formula (a-5) has a relatively large molecular weight and sufficient reactivity. The present invention was made based on this knowledge. That is, the curable polysilsesquioxane compound (A) of the present invention satisfies the following requirement 1.

(必要條件1) 在測定硬化性聚倍半矽氧烷化合物的29 Si-NMR時,係能夠在-62ppm以上且小於-52ppm的區域[區域(2)]觀測到1或2個以上的尖峰,而且能夠在-52ppm以上且小於-45ppm的區域[區域(1)]及-73ppm以上且小於-62ppm的區域[區域(3)]之至少一區域觀測到1或2個以上的尖峰且以下述式所導出之Z2為20~40%。 又,所謂「能夠在區域(1)觀測到之尖峰」,係指峰頂係位為區域(1)的範圍。針對「能夠在區域(2)觀測到之尖峰」、「能夠在區域(3)觀測到之尖峰」亦同樣。(Requirement 1) When measuring 29 Si-NMR of a curable polysilsesquioxane compound, one or more sharp peaks can be observed in the region of -62ppm or more and less than -52ppm [region (2)] , And more than one or two peaks and below can be observed in at least one of the region above -52ppm and below -45ppm [region (1)] and region above -73ppm but below -62ppm [region (3)] The Z2 derived from the formula is 20-40%. In addition, the so-called "peaks that can be observed in the area (1)" refers to the range where the peak position is in the area (1). The same applies to "spikes that can be observed in area (2)" and "spikes that can be observed in area (3)".

Figure 02_image004
Figure 02_image004

P1:在區域(1)之積分值 P2:在區域(2)之積分值 P3:在區域(3)之積分值P1: Integral value in area (1) P2: Integral value in area (2) P3: Integral value in area (3)

在本說明書,所謂「在區域(1)之積分值」、「在區域(2)之積分值」、「在區域(3)之積分值」,係指各自將-52ppm~-45ppm、-62ppm~-52ppm、-73ppm~-62ppm設為積分範圍且計算而得到之值。In this manual, the so-called "integrated value in area (1)", "integrated value in area (2)", and "integrated value in area (3)" refer to -52ppm~-45ppm and -62ppm respectively ~-52ppm, -73ppm~-62ppm are set as integral range and calculated value.

能夠在區域(1)、區域(2)、區域(3)觀測到之尖峰,係各自源自式式(a-4)、式(a-5)、式(a-6)所示之T-位置中的矽原子之物。The peaks that can be observed in area (1), area (2), and area (3) are derived from the T shown in formula (a-4), formula (a-5), and formula (a-6) respectively -The silicon atom in the location.

因而,滿足必要條件1之硬化性聚倍半矽氧烷化合物,係相對於T-位置全體,含有20~40%之式(a-5)所示的T-位置之物。 該硬化性聚倍半矽氧烷化合物係如上述,具有較大分子量且具有充分的反應性之物,作為硬化性組合物的硬化性成分為有用的。Therefore, the curable polysilsesquioxane compound that satisfies requirement 1 contains 20-40% of the T-position represented by the formula (a-5) with respect to the entire T-position. The curable polysilsesquioxane compound has a relatively large molecular weight and has sufficient reactivity as described above, and is useful as a curable component of a curable composition.

必要條件1中,Z2之值係較佳為24~36%,更佳為27~32%。Z2太小時反應性不充分,Z2太大時儲存安定性低落。In the necessary condition 1, the value of Z2 is preferably 24 to 36%, more preferably 27 to 32%. When Z2 is too small, the reactivity is insufficient, and when Z2 is too large, the storage stability will decrease.

硬化性聚倍半矽氧烷化合物(A)係在測定29 Si-NMR時,能夠在區域(3)觀測到1或2個以上的尖峰且以下述式所導出之Z3係以60~80%為佳。The curable polysilsesquioxane compound (A) can observe 1 or more peaks in the region (3) when 29 Si-NMR is measured. The Z3 system derived from the following formula is 60~80% Better.

Figure 02_image008
Figure 02_image008

Z3為60~80%之硬化性聚倍半矽氧烷化合物(A),係相對於T-位置全體,含有60~80%之式(a-6)所示的T-位置之物。Z3之值為60~80%的範圍內之硬化性聚倍半矽氧烷化合物(A),係分子量與反應性的平衡為更優異之物。 因為更容易得到該效果,Z3之值係以64~76%為較佳,以68~73%為更佳。Z3 is 60-80% curable polysilsesquioxane compound (A), which contains 60-80% of the T-position represented by the formula (a-6) with respect to the entire T-position. The curable polysilsesquioxane compound (A) whose value of Z3 is in the range of 60 to 80% has a more excellent balance between molecular weight and reactivity. Because this effect is easier to obtain, the value of Z3 is preferably 64~76%, and 68~73% is more preferred.

Z2或Z3之值,係例如能夠在實施例記載的條件下測定29 Si-NMR而得到P1~P3且依照上述式而算出。The value of Z2 or Z3 can be calculated by measuring 29 Si-NMR under the conditions described in the examples to obtain P1 to P3 and calculating according to the above formula.

硬化性聚倍半矽氧烷化合物(A)係滿足上述必要條件2之物。亦即,硬化性聚倍半矽氧烷化合物(A)的質量平均分子量(Mw)為4,000~11,000,較佳為4,000~8,000,更佳為6,000~7,000。The curable polysilsesquioxane compound (A) satisfies the requirement 2 above. That is, the mass average molecular weight (Mw) of the curable polysilsesquioxane compound (A) is 4,000 to 11,000, preferably 4,000 to 8,000, and more preferably 6,000 to 7,000.

如上述,滿足必要條件1之硬化性聚倍半矽氧烷化合物係具有較大分子量之傾向。必要條件2係使其分子量的範圍明確化。藉由將質量平均分子量(Mw)在上述範圍內之硬化性聚倍半矽氧烷化合物(A)使用作為硬化性成分,而能夠得到提供接著強度較高且具有優異的耐熱性的硬化物之硬化性組合物。As described above, the curable polysilsesquioxane compound that satisfies the requirement 1 tends to have a larger molecular weight. Requirement 2 is to clarify the molecular weight range. By using a curable polysilsesquioxane compound (A) having a mass average molecular weight (Mw) within the above range as a curable component, it is possible to obtain a cured product with high adhesive strength and excellent heat resistance. Hardening composition.

硬化性聚倍半矽氧烷化合物(A)的分子量分布(Mw/Mn)係沒有特別限制,通常1.0~10.0,較佳為1.1~6.0的範圍。藉由將分子量分布(Mw/Mn)在上述範圍內的硬化性聚倍半矽氧烷化合物(A)使用作為硬化性成分,而能夠得到提供具有優異的接著性及耐熱性的硬化物之硬化性組合物。 質量平均分子量(Mw)及數量平均分子量(Mn)係例如能夠藉由將四氫呋喃(THF)作為溶劑之凝膠滲透層析法(GPC)且以標準聚苯乙烯換算值之方式而求取。The molecular weight distribution (Mw/Mn) of the curable polysilsesquioxane compound (A) is not particularly limited, and it is usually 1.0 to 10.0, preferably 1.1 to 6.0. By using a curable polysilsesquioxane compound (A) having a molecular weight distribution (Mw/Mn) within the above range as a curable component, it is possible to obtain a cured product that provides a cured product with excellent adhesion and heat resistance Sexual composition. The mass average molecular weight (Mw) and the number average molecular weight (Mn) can be obtained, for example, by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent and in terms of standard polystyrene conversion values.

硬化性聚倍半矽氧烷化合物(A)係例如能夠藉由下述式(a-7)所示之化合物(以下有稱為「矽烷化合物(1)」之情形)、或矽烷化合物(1)及以下述式(a-8)所示之化合物(以下有稱為「矽烷化合物(2)」之情形)在聚縮合觸媒的存在下使其聚縮合而製造。The curable polysilsesquioxane compound (A) can be, for example, a compound represented by the following formula (a-7) (hereinafter referred to as "silane compound (1)"), or a silane compound (1) ) And a compound represented by the following formula (a-8) (hereinafter referred to as "silane compound (2)") in the presence of a polycondensation catalyst to produce it by polycondensation.

Figure 02_image015
Figure 02_image015

式(a-7)、(a-8)中,R1 、R2 、D表示與上述相同意思。R4 、R5 係各自獨立地表示碳數1~10的烷基,X1 、X2 係各自獨立地表示鹵素原子,p、q係各自獨立地表示0~3的整數。複數個R4 、R5 、及複數個X1 、X2 係各自可互相相同亦可互相不同。In formulas (a-7) and (a-8), R 1 , R 2 , and D have the same meanings as above. R 4 and R 5 each independently represent an alkyl group having 1 to 10 carbon atoms, X 1 and X 2 each independently represent a halogen atom, and p and q each independently represent an integer of 0 to 3. The plurality of R 4 , R 5 , and the plurality of X 1 , X 2 systems may be the same or different from each other.

作為R4 、R5 之碳數1~10的烷基,可舉出與作為R2 之碳數1~10的烷基已出示之物同樣物。 作為X1 、X2 的鹵素原子,可舉出氯原子、及溴原子等。Examples of the alkyl group having 1 to 10 carbon atoms of R 4 and R 5 include the same ones as those already shown as the alkyl group having 1 to 10 carbon atoms of R 2 . Examples of the halogen atom of X 1 and X 2 include a chlorine atom and a bromine atom.

作為矽烷化合物(1),可舉出CF3 Si(OCH3 )3 、CF3 CF2 Si(OCH3 )3 、CF3 CF2 CF2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 Si(OCH3 )3 、CF3 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH3 )3 、CF3 (C6 H4 )Si(OCH3 )3 (4-(三氟甲基)苯基三甲氧基矽烷)、CF3 Si(OCH2 CH3 )3 、CF3 CF2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 Si(OCH2 CH3 )3 、CF3 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 Si(OCH2 CH3 )3 、CF3 (C6 H4 )Si(OCH2 CH3 )3 、4-(三氟甲基)苯基三乙氧基矽烷等的氟烷基三烷氧基矽烷化合物類; CF3 SiCl(OCH3 )2 、CF3 CF2 SiCl(OCH3 )2 、CF3 CF2 CF2 SiCl(OCH3 )2 、CF3 SiBr(OCH3 )2 、CF3 CF2 SiBr(OCH3 )2 、CF3 CF2 CF2 SiBr(OCH3 )2 、CF3 CF2 CF2 CF2 SiCl(OCH3 )2 、CF3 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH3 )2 、CF3 (C6 H4 )SiCl(OCH3 )2 、4-(三氟甲基)苯基氯二甲氧基矽烷、CF3 SiCl(OCH2 CH3 )2 、CF3 CF2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 SiCl(OCH2 CH3 )2 、CF3 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl(OCH2 CH3 )2 、CF3 (C6 H4 )SiCl(OCH2 CH3 )2 、4-(三氟甲基)苯基氯二乙氧基矽烷等的氟烷基鹵基二烷氧基矽烷化合物類;CF3 SiCl2 (OCH3 )、CF3 CF2 SiCl2 (OCH3 )、CF3 CF2 CF2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 SiCl2 (OCH3 )、CF3 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH3 )、CF3 (C6 H4 )SiCl2 (OCH3 )、4-(三氟甲基)苯基二氯甲氧基矽烷、CF3 SiCl2 (OCH2 CH3 )、CF3 CF2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 SiCl2 (OCH2 CH3 )、CF3 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )2 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl2 (OCH2 CH3 )、CF3 (C6 H4 )SiCl2 (OCH2 CH3 )、4-(三氟甲基)苯基二氯乙氧基矽烷等的氟烷基二鹵基烷氧基矽烷化合物類; CF3 SiCl3 、CF3 CF2 SiCl3 、CF3 SiBr3 、CF3 CF2 SiBr3 、CF3 CF2 CF2 SiCl3 、CF3 CF2 CF2 CF2 SiCl3 、CF3 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 (C6 H4 )SiCl3 、4-三氟甲基苯基三氯矽烷、CF3 SiCl3 、CF3 CF2 SiCl3 、CF3 CF2 CF2 SiCl3 、CF3 CF2 CF2 CF2 SiCl3 、CF3 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 CF2 CF2 CF2 CF2 CF2 CF2 CF2 CH2 CH2 SiCl3 、CF3 (C6 H4 )SiCl3 、4-(三氟甲基)苯基三氯矽烷等的氟烷基三鹵基矽烷化合物類。 矽烷化合物(1)係能夠單獨1種或組合2種以上而使用。 該等之中,作為矽烷化合物(1),係以在氟烷基三烷氧基矽烷化合物類所含有之物為佳。As the silane compound (1), CF 3 Si(OCH 3 ) 3 , CF 3 CF 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 Si(OCH 3 ) 3 , CF 3 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 (C 6 H 4 )Si( OCH 3 ) 3 (4-(trifluoromethyl)phenyltrimethoxysilane), CF 3 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 Si(OCH 2 CH 3 ) 3 , CF 3 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 3 , CF 3 (C 6 H 4 )Si(OCH 2 CH 3 ) 3 , 4-(trifluoromethyl)phenyl triethoxysilane, etc. Fluoroalkyl trialkoxysilane compounds; CF 3 SiCl(OCH 3 ) 2 , CF 3 CF 2 SiCl(OCH 3 ) 2 , CF 3 CF 2 CF 2 SiCl(OCH 3 ) 2 , CF 3 SiBr(OCH 3 ) 2 , CF 3 CF 2 SiBr(OCH 3 ) 2 , CF 3 CF 2 CF 2 SiBr(OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 SiCl(OCH 3 ) 2 , CF 3 CH 2 CH 2 SiCl (OCH 3 ) 2 、CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 3 ) 2 , CF 3 (C 6 H 4 ) SiCl(OCH 3 ) 2 , 4-(trifluoromethyl)phenylchlorodimethoxysilane, CF 3 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 SiCl(OCH 2 CH 3 ) 2 、CF 3 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 、CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 、CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl(OCH 2 CH 3 ) 2 , CF 3 (C 6 H 4 ) SiCl (OCH 2 CH 3 ) 2 , 4-(trifluoromethyl)phenylchlorodiethoxysilane and other fluoroalkyl halide dialkoxysilane compounds; CF 3 SiCl 2 (OCH 3 ), CF 3 CF 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 SiCl 2 (OCH 3 ), CF 3 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 3 ), CF 3 (C 6 H 4 ) SiCl 2 (OCH 3 ), 4-(trifluoromethyl)phenyldichloromethoxysilane , CF 3 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 CF 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ), CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ) 2 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 2 (OCH 2 CH 3 ), CF 3 (C 6 H 4 ) SiCl 2 (OCH 2 CH 3 ), 4-(trifluoromethyl)phenyldichloroethoxysilane and other fluoroalkyl dihalo alkoxysilane compounds; CF 3 SiCl 3 , CF 3 CF 2 SiCl 3 , CF 3 SiBr 3 , CF 3 CF 2 SiBr 3 , CF 3 CF 2 CF 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 SiCl 3 , CF 3 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 (C 6 H 4 ) SiCl 3 , 4-trifluoromethyl phenyl trichlorosilane, CF 3 SiCl 3 , CF 3 CF 2 SiCl 3 , CF 3 CF 2 CF 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 SiCl 3 , CF 3 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 SiCl 3 , CF 3 (C 6 H 4 ) SiCl 3. Fluoroalkyl trihalosilane compounds such as 4-(trifluoromethyl)phenyltrichlorosilane. The silane compound (1) can be used individually by 1 type or in combination of 2 or more types. Among these, as the silane compound (1), what is contained in the fluoroalkyltrialkoxysilane compound is preferable.

作為矽烷化合物(2),可舉出甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、正丙基三丙氧基矽烷、正丙基三丁氧基矽烷、正丁基三甲氧基矽烷、異丁基三甲氧基矽烷、正戊基三甲氧基矽烷、正己基三甲氧基矽烷、異辛基三乙氧基矽烷等的烷基三烷氧基矽烷化合物類;Examples of the silane compound (2) include methyl trimethoxy silane, methyl triethoxy silane, ethyl trimethoxy silane, ethyl triethoxy silane, ethyl tripropoxy silane, n-propyl Trimethoxysilane, n-propyltriethoxysilane, n-propyltripropoxysilane, n-propyltributoxysilane, n-butyltrimethoxysilane, isobutyltrimethoxysilane, n- Alkyl trialkoxysilane compounds such as pentyltrimethoxysilane, n-hexyltrimethoxysilane, and isooctyltriethoxysilane;

甲基氯二甲氧基矽烷、甲基氯二乙氧基矽烷、甲基二氯甲氧基矽烷、甲基溴二甲氧基矽烷、乙基氯二甲氧基矽烷、乙基氯二乙氧基矽烷、乙基二氯甲氧基矽烷、乙基溴二甲氧基矽烷、正丙基氯二甲氧基矽烷、正丙基二氯甲氧基矽烷、正丁基氯二甲氧基矽烷、正丁基二氯甲氧基矽烷等的烷基鹵基烷氧基矽烷化合物類;Methylchlorodimethoxysilane, methylchlorodiethoxysilane, methyldichloromethoxysilane, methylbromodimethoxysilane, ethylchlorodimethoxysilane, ethylchlorodiethyl Oxysilane, ethyldichloromethoxysilane, ethylbromodimethoxysilane, n-propylchlorodimethoxysilane, n-propyldichloromethoxysilane, n-butylchlorodimethoxysilane Alkyl halide alkoxy silane compounds such as silane and n-butyl dichloromethoxy silane;

甲基三氯矽烷、甲基三溴矽烷、乙基三三氯矽烷、乙基三溴矽烷、正丙基三氯矽烷、正丙基三溴矽烷、正丁基三氯矽烷、異丁基三氯矽烷、正戊基三氯矽烷、正己基三氯矽烷、異辛基三氯矽烷等的烷基三鹵基矽烷合物類等。矽烷化合物(21係能夠單獨1種或組合2種以上而使用。 該等之中,作為矽烷化合物(2),係以在烷基三烷氧基矽烷化合物類所含有之物為佳。Methyltrichlorosilane, methyltribromosilane, ethyltrichlorosilane, ethyltribromosilane, n-propyltrichlorosilane, n-propyltribromosilane, n-butyltrichlorosilane, isobutyltrichlorosilane Alkyl trihalosilane compounds such as chlorosilane, n-pentyl trichlorosilane, n-hexyl trichlorosilane, isooctyl trichlorosilane, etc. Silane compounds (series 21 can be used alone or in combination of two or more. Among these, as the silane compound (2), what is contained in alkyltrialkoxysilane compounds is preferable.

使上述矽烷化合物聚縮合之方法係沒有特別限定,能夠利用習知的方法。但是因為在硬化性聚倍半矽氧烷化合物(A)的製造係有以下所示之問題,所以必須特別地對反應條件進行研討。The method of polycondensing the silane compound is not particularly limited, and a conventional method can be used. However, since the production system of the curable polysilsesquioxane compound (A) has the following problems, it is necessary to study the reaction conditions in particular.

製造硬化性聚倍半矽氧烷化合物(A)時的問題之一,係在上述專利文獻4所示。亦即,觀看上述專利文獻4的表1時,得知隨著具有氟烷基之矽烷化合物的使用比率增加,所得到的聚合物有低分子量化之傾向。 如此,因為矽烷化合物(1)的反應性與矽烷化合物(2)的反應性為大大地不同,所以直接利用有關矽烷化合物(2)的聚縮合反應之先前的見解,係難以得到滿足必要條件1及必要條件2之硬化性聚倍半矽氧烷化合物。One of the problems in the production of the curable polysilsesquioxane compound (A) is disclosed in Patent Document 4 mentioned above. That is, when looking at Table 1 of Patent Document 4, it is found that as the use ratio of the fluoroalkyl group-containing silane compound increases, the resulting polymer tends to have a lower molecular weight. As such, because the reactivity of the silane compound (1) is greatly different from the reactivity of the silane compound (2), it is difficult to directly use the previous knowledge about the polycondensation reaction of the silane compound (2) to satisfy the necessary conditions 1 And the curable polysilsesquioxane compound of necessary condition 2.

在專利文獻4的實施例,實際上係使用具有氟烷基矽烷化合物而進行聚縮合反應來製造聚合物。但是如上述,在該文獻記載之製造方法,反應所使用的矽烷化合物之混合比率係大大地影響反應,所以無法控制聚合物的分子量。 又,如後述,雖然藉由使用專利文獻4的實施例記載的反應條件,而能夠將反應性較差之矽烷化合物(具有氟烷基之矽烷化合物)使用作為單體,但是即便使用該反應條件,亦難以得到滿足必要條件1及必要條件2之硬化性聚倍半矽氧烷化合物(比較例1~3)。In the examples of Patent Document 4, a polycondensation reaction is actually performed using a compound having a fluoroalkyl silane to produce a polymer. However, as described above, in the production method described in this document, the mixing ratio of the silane compound used in the reaction greatly affects the reaction, so the molecular weight of the polymer cannot be controlled. In addition, as described later, although the reaction conditions described in the Examples of Patent Document 4 can be used as monomers with poor reactivity (silane compounds having a fluoroalkyl group), even if the reaction conditions are used, It was also difficult to obtain a curable polysilsesquioxane compound that satisfies requirement 1 and requirement 2 (Comparative Examples 1 to 3).

本發明者等係針對使用矽烷化合物(1)之聚縮合反應進行研討之結果,得知藉由在較溫和的條件下花費時間進行聚縮合反應,而能夠得到滿足必要條件1及必要條件2之硬化性聚倍半矽氧烷化合物。 具體而言,係在溶劑中、或無溶劑且使用適量的酸觸媒在預定溫度進行矽烷化合物的聚縮合反應而得到含有製造中間體的反應液之後,添加鹼而將反應液中和,而且藉由進行聚縮合反應而能夠製造硬化性聚倍半矽氧烷化合物(A)。The inventors of the present invention conducted studies on the polycondensation reaction using the silane compound (1), and found that by taking time to carry out the polycondensation reaction under milder conditions, it is possible to obtain those that satisfy the requirements 1 and 2 Curing polysilsesquioxane compound. Specifically, after the polycondensation reaction of the silane compound is carried out in a solvent or without a solvent and an appropriate amount of acid catalyst is used at a predetermined temperature to obtain a reaction solution containing a production intermediate, an alkali is added to neutralize the reaction solution, and The curable polysilsesquioxane compound (A) can be produced by performing a polycondensation reaction.

作為溶劑,可舉出水;苯、甲苯、二甲苯等的芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、丙酸甲酯等的酯類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮等的酮類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、第二丁醇、第三丁醇類等的醇類等。該等溶劑係能夠單獨1種或組合2種以上而使用。 使用溶劑時,其使用量係矽烷化合物的總mol量每1mol通常0.001~10.000升,較佳為0.010~0.9升。Examples of solvents include water; aromatic hydrocarbons such as benzene, toluene, and xylene; esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, and methyl propionate; acetone, methyl Ketones such as ethyl ketone, methyl isobutyl ketone, cyclohexanone; methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, second butanol, tertiary butanol, etc. The alcohols and so on. These solvent systems can be used individually by 1 type or in combination of 2 or more types. When the solvent is used, the amount used is usually 0.001 to 10.000 liters per 1 mol of the total mol of the silane compound, preferably 0.010 to 0.9 liters.

作為酸觸媒,可舉出磷酸、鹽酸、硼酸、硫酸、硝酸等的無機酸;檸檬酸、乙酸、甲磺酸、三氟甲磺酸、苯磺酸、對甲苯磺酸等的有機酸等。該等之中,係以選自磷酸、鹽酸、硼酸、硫酸、檸檬酸、乙酸、及甲磺酸之至少1種為佳。 酸觸媒的使用量係相對於矽烷化合物的總mol量,通常0.01~2.00mol%,較佳為0.05~1.00mol%,更佳為0.10~0.30的範圍。Examples of acid catalysts include inorganic acids such as phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, and nitric acid; organic acids such as citric acid, acetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, and p-toluenesulfonic acid, etc. . Among them, at least one selected from phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, citric acid, acetic acid, and methanesulfonic acid is preferred. The usage amount of the acid catalyst is relative to the total mol amount of the silane compound, usually 0.01 to 2.00 mol%, preferably 0.05 to 1.00 mol%, and more preferably in the range of 0.10 to 0.30.

在酸觸媒存在下之反應的反應溫度係通常20~90℃,較佳為25~80℃。 在酸觸媒存在下之反應的反應時間係通常1~48小時,較佳為3~24小時。The reaction temperature of the reaction in the presence of an acid catalyst is usually 20 to 90°C, preferably 25 to 80°C. The reaction time of the reaction in the presence of an acid catalyst is usually 1 to 48 hours, preferably 3 to 24 hours.

藉由酸觸媒存在下的反應而得到之製造中間體的質量平均分子量(Mw)係通常800~5,000,較佳為1,200~4,000。The mass average molecular weight (Mw) of the production intermediate obtained by the reaction in the presence of an acid catalyst is usually 800 to 5,000, preferably 1,200 to 4,000.

作為將反應液中和時所使用的鹼,可舉出氨水;三甲胺、三乙胺、吡啶、1,8-二氮雜雙環[5.4.0]-7-十一烯、苯胺、甲吡啶、1,4-二氮雜雙環[2.2.2]辛烷、咪唑等的有機鹼;氫氧化四甲基銨、氫氧化四乙基銨等的有機鹽氫氧化物;甲氧化鈉、乙氧化鈉、第三丁氧化鈉、第三丁氧化鉀等的金屬烷氧化物;氫化鈉、氫化鈣等的金屬氫化物;氫氧化鈉、氫氧化鉀、氫氧化鈣等的金屬氫氧化物;碳酸鈉、碳酸鉀、碳酸鎂等的金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等的金屬碳酸氫鹽等。The base used when neutralizing the reaction solution includes ammonia; trimethylamine, triethylamine, pyridine, 1,8-diazabicyclo[5.4.0]-7-undecene, aniline, picoline , 1,4-diazabicyclo[2.2.2]octane, imidazole and other organic bases; tetramethylammonium hydroxide, tetraethylammonium hydroxide and other organic salt hydroxides; sodium methoxide, ethoxylation Metal alkoxides such as sodium, sodium tert-butoxide, and potassium tert-butoxide; metal hydrides such as sodium hydride and calcium hydride; metal hydroxides such as sodium hydroxide, potassium hydroxide, and calcium hydroxide; carbonic acid Metal carbonates such as sodium, potassium carbonate and magnesium carbonate; metal bicarbonates such as sodium bicarbonate and potassium bicarbonate, etc.

在反應液之中和所使用的鹼之量,係相對於矽烷化合物的總mol量,通常0.01~2.00mol%,較佳為0.05~1.00mol%,更佳為0.10~0.70的範圍。 又,在反應液之中和所使用的鹼之量(mol),係以在1步驟所使用的酸觸媒之量(mol)的0.5~5.0倍為佳,較佳為0.8~3.0倍,更佳為1.0~2.0倍。 中和後的反應液的pH係通常6.0~8.0,較佳為6.2~7.0,更佳為6.4~6.9。The amount of the alkali used in the reaction solution is usually 0.01 to 2.00 mol%, preferably 0.05 to 1.00 mol%, and more preferably in the range of 0.10 to 0.70 relative to the total mol of the silane compound. In addition, the amount (mol) of the alkali used in the reaction solution is preferably 0.5 to 5.0 times the amount (mol) of the acid catalyst used in step 1, and preferably 0.8 to 3.0 times, More preferably, it is 1.0 to 2.0 times. The pH of the neutralized reaction liquid is usually 6.0 to 8.0, preferably 6.2 to 7.0, and more preferably 6.4 to 6.9.

中和後之反應的反應溫度,係通常40~90℃,較佳為50~80℃。 中和後之反應的反應時間,係通常20~200分鐘,較佳為30~150分鐘。The reaction temperature of the reaction after neutralization is usually 40 to 90°C, preferably 50 to 80°C. The reaction time of the reaction after neutralization is usually 20 to 200 minutes, preferably 30 to 150 minutes.

上述的製造方法之在酸觸媒存在下的反應,係將水解設為主要的目的,在中和後的反應係將脫水縮合設為主要的目的。 藉由如此而進行矽烷化合物的聚縮合反應,而能夠效率良好地製造目標硬化性聚倍半矽氧烷化合物(A)。In the above-mentioned production method, the main purpose of the reaction in the presence of an acid catalyst is hydrolysis, and the main purpose of the reaction system after neutralization is dehydration and condensation. By proceeding the polycondensation reaction of the silane compound in this way, the target curable polysilsesquioxane compound (A) can be produced efficiently.

反應結束後,係進行習知的精製處理而能夠將硬化性聚倍半矽氧烷化合物(A)離析。After the reaction is completed, a conventional refining treatment can be performed to isolate the curable polysilsesquioxane compound (A).

本發明的硬化性聚倍半矽氧烷化合物係具備具有氟烷基的重複單元之物,而且具有充分的反應性且具有較大分子量之物。 此種硬化性聚倍半矽氧烷化合物,係使用作為具有優異的硬化性且折射率較低的硬化性組合物的硬化性成分為有用的。The curable polysilsesquioxane compound of the present invention has a repeating unit having a fluoroalkyl group, has sufficient reactivity, and has a relatively large molecular weight. Such a curable polysilsesquioxane compound is useful as a curable component of a curable composition having excellent curability and a low refractive index.

2)硬化性組合物 本發明的硬化性組合物之特徵在於含有下述(A)成分、及具有254℃以上的沸點之溶劑(以下有記載為「溶劑(S1)」之情形)。 (A)成分:本發明的硬化性聚倍半矽氧烷化合物(硬化性聚倍半矽氧烷化合物(A))2) Hardening composition The curable composition of the present invention is characterized by containing the following (A) component and a solvent having a boiling point of 254°C or higher (hereinafter, it may be described as "solvent (S1)"). (A) Component: The curable polysilsesquioxane compound of the present invention (curable polysilsesquioxane compound (A))

在本發明的硬化性組合物,硬化性聚倍半矽氧烷化合物(A)係能夠單獨1種或組合2種以上而使用。In the curable composition of the present invention, the curable polysilsesquioxane compound (A) can be used alone or in combination of two or more types.

本發明的硬化性組合物中的硬化性聚倍半矽氧烷化合物(A)之含量,係將硬化性組合物的固體成分全體作為基準,通常40~80質量%,較佳為50~70質量%。The content of the curable polysilsesquioxane compound (A) in the curable composition of the present invention is based on the total solid content of the curable composition, usually 40 to 80% by mass, preferably 50 to 70 quality%.

溶劑(S1)的沸點為254℃以上,以254~300℃為佳。在此,沸點係指在1013hPa之沸點(在本說明書為相同)。The boiling point of the solvent (S1) is above 254°C, preferably 254~300°C. Here, the boiling point refers to the boiling point at 1013 hPa (the same in this specification).

作為溶劑(S1),係只要沸點為254℃以上且能夠將硬化性聚倍半矽氧烷化合物(A)溶解之物,就沒有特別限制。 此種溶劑(S1)係揮發速度較慢。因此,因為含有溶劑(S1)之硬化性組合物係在塗佈後即便被放置長時間,黏度變化亦較小,所以能夠與剛塗佈後同樣地將光學元件等良好地裝配。The solvent (S1) is not particularly limited as long as it has a boiling point of 254°C or higher and can dissolve the curable polysilsesquioxane compound (A). This solvent (S1) has a slower volatilization rate. Therefore, even if the curable composition containing the solvent (S1) is left for a long time after application, the viscosity change is small, and therefore optical elements and the like can be assembled well just after application.

作為溶劑(S1),具體而言係可舉出三丙二醇正丁醚(沸點274℃)、1,6-己二醇二丙烯酸酯(沸點260℃)、二乙二醇二丁醚(沸點256℃)、三乙二醇丁基甲醚(沸點261℃)、聚乙二醇二甲醚(沸點264~294℃)、四乙二醇二甲醚(沸點275℃)、聚乙二醇單甲醚(沸點、290~310℃)等。 該等之中,作為溶劑(S1),從更容易得到本發明的效果的觀點而言,係以三丙二醇正丁醚、1,6-己二醇二丙烯酸酯為佳。 溶劑(S1)係能夠單獨1種或組合2種以上而使用。As the solvent (S1), specifically, tripropylene glycol n-butyl ether (boiling point 274°C), 1,6-hexanediol diacrylate (boiling point 260°C), diethylene glycol dibutyl ether (boiling point 256 ℃), triethylene glycol butyl methyl ether (boiling point 261℃), polyethylene glycol dimethyl ether (boiling point 264~294℃), tetraethylene glycol dimethyl ether (boiling point 275℃), polyethylene glycol monomethyl ether (Boiling point, 290~310℃) etc. Among these, as the solvent (S1), from the viewpoint of obtaining the effects of the present invention more easily, tripropylene glycol n-butyl ether and 1,6-hexanediol diacrylate are preferred. The solvent (S1) can be used individually by 1 type or in combination of 2 or more types.

本發明的硬化性組合物亦可含有溶劑(S1)以外的溶劑。作為溶劑(S1)以外的溶劑,係以沸點為200℃以上且小於254℃的溶劑(以下有記載為「溶劑(S2)」之情形)為佳。 作為溶劑(S2),係只要沸點為200℃以上且小於254℃而且能夠將硬化性聚倍半矽氧烷化合物(A)溶解之物,就沒有特別限制。藉由併用溶劑(S1)與溶劑(S2),硬化性組合物的硬化性提升。The curable composition of the present invention may contain a solvent other than the solvent (S1). As a solvent other than the solvent (S1), a solvent having a boiling point of 200° C. or higher and less than 254° C. (hereinafter referred to as "solvent (S2)") is preferred. The solvent (S2) is not particularly limited as long as it has a boiling point of 200°C or higher and less than 254°C and can dissolve the curable polysilsesquioxane compound (A). By using the solvent (S1) and the solvent (S2) together, the curability of the curable composition is improved.

作為溶劑(S2)的具體例,可舉出二乙二醇單丁醚乙酸酯(沸點247℃)、二丙二醇正丁醚(沸點229℃)、苄醇(沸點204.9℃)、二丙二醇甲醚乙酸酯(沸點209℃)、二乙二醇丁基甲醚(沸點212℃)、二丙二醇正丙基醚(沸點212℃)、三丙二醇二甲醚(沸點215℃)、三乙二醇二甲醚(沸點216℃)、二乙二醇單乙醚乙酸酯(沸點217.4℃)、二乙二醇正丁醚(沸點230℃)、乙二醇單苯基醚(沸點245℃)、三丙二醇甲醚(沸點242℃)、丙二醇苯基醚(沸點、243℃)、三乙二醇單甲醚(沸點249℃)等。 該等之中,作為溶劑(S2),因為容易得到其效果,係以二醇系溶劑為佳,以二乙二醇單丁醚乙酸酯、二丙二醇正丁醚為佳,以二乙二醇單丁醚乙酸酯為較佳。Specific examples of the solvent (S2) include diethylene glycol monobutyl ether acetate (boiling point 247°C), dipropylene glycol n-butyl ether (boiling point 229°C), benzyl alcohol (boiling point 204.9°C), and dipropylene glycol methyl ether. Ether acetate (boiling point 209℃), diethylene glycol butyl methyl ether (boiling point 212℃), dipropylene glycol n-propyl ether (boiling point 212℃), tripropylene glycol dimethyl ether (boiling point 215℃), triethylene glycol two Methyl ether (boiling point 216°C), diethylene glycol monoethyl ether acetate (boiling point 217.4°C), diethylene glycol n-butyl ether (boiling point 230°C), ethylene glycol monophenyl ether (boiling point 245°C), tripropylene glycol Methyl ether (boiling point 242°C), propylene glycol phenyl ether (boiling point, 243°C), triethylene glycol monomethyl ether (boiling point 249°C), etc. Among them, as the solvent (S2), because it is easy to obtain its effect, the glycol-based solvent is preferred, diethylene glycol monobutyl ether acetate and dipropylene glycol n-butyl ether are preferred, and diethylene glycol Alcohol monobutyl ether acetate is preferred.

併用溶劑(S1)與溶劑(S2)時,具體而言係以三丙二醇正丁醚(溶劑(S1))與二乙二醇單丁醚乙酸酯(溶劑(S2))的組合、1,6-己二醇二丙烯酸酯(溶劑(S1))與二乙二醇單丁醚乙酸酯(溶劑(S2))的組合、三丙二醇正丁醚(溶劑(S1))與二丙二醇正丁醚(溶劑(S2))的組合、1,6-己二醇二丙烯酸酯(溶劑(S1))與二丙二醇正丁醚(有機溶劑(S2))的組合為佳。When solvent (S1) and solvent (S2) are used together, specifically, it is a combination of tripropylene glycol n-butyl ether (solvent (S1)) and diethylene glycol monobutyl ether acetate (solvent (S2)), 1, Combination of 6-hexanediol diacrylate (solvent (S1)) and diethylene glycol monobutyl ether acetate (solvent (S2)), tripropylene glycol n-butyl ether (solvent (S1)) and dipropylene glycol n-butyl The combination of ether (solvent (S2)), 1,6-hexanediol diacrylate (solvent (S1)) and dipropylene glycol n-butyl ether (organic solvent (S2)) are preferred.

本發明的硬化性組合物,係含有固體成分濃度成為較佳50~95質量%、更佳60~85質量%之量的溶劑。藉由固體成分濃度為該範圍內,能夠充分地發揮溶劑(S1)或溶劑(S2)的效果。The curable composition of the present invention contains a solvent having a solid content concentration of preferably 50 to 95% by mass, more preferably 60 to 85% by mass. When the solid content concentration is within this range, the effect of the solvent (S1) or the solvent (S2) can be sufficiently exhibited.

在本發明的硬化性組合物所含有之溶劑(S1)與溶劑(S2)的合計量,係相對於總溶劑,通常50~100質量%,較佳為70~100質量%,更佳為90~100質量%。 在本發明的硬化性組合物所含有的溶劑(S1)之含量,係相對於溶劑(S1)與溶劑(S2)的合計量,通常20~100質量%,較佳為30~85質量%,更佳為50~80質量%。 以此種比率含有溶劑(S1)或溶劑(S2)之硬化性組合物,係成為接著性與濕潤擴大性(後述之有關液滴的擴大之特性)能夠適當地平衡之物。The total amount of solvent (S1) and solvent (S2) contained in the curable composition of the present invention is usually 50-100% by mass, preferably 70-100% by mass, more preferably 90% relative to the total solvent. ~100% by mass. The content of the solvent (S1) contained in the curable composition of the present invention is relative to the total amount of the solvent (S1) and the solvent (S2), usually 20-100% by mass, preferably 30-85% by mass, More preferably, it is 50 to 80% by mass. The curable composition containing the solvent (S1) or the solvent (S2) at such a ratio is a thing that can appropriately balance the adhesiveness and the wetness expandability (characteristics related to the expansion of droplets described later).

本發明的硬化性組合物亦可含有在分子內具有氮原子之矽烷偶合劑(以下有記載為「矽烷偶合劑(B)」之情形)作為(B)成分。The curable composition of the present invention may also contain a silane coupling agent having a nitrogen atom in the molecule (hereinafter, it may be described as "silane coupling agent (B)") as the (B) component.

含有矽烷偶合劑(B)之硬化性組合物,係在塗佈步驟具有優異的作業性且提供具有更優異的接著性、耐剝離性、及耐熱性之硬化物。 在此,所謂在塗佈步驟具有優異的作業性,係指在塗佈步驟,將硬化性組合物從吐出管吐出,隨後提高吐出管時,拉絲量較少、或立刻中斷之情形。藉由使用具有該性質之硬化性組合物,能夠防止樹脂飛濺和液滴擴大引起周圍的污染。The curable composition containing the silane coupling agent (B) has excellent workability in the coating step and provides a cured product with more excellent adhesion, peel resistance, and heat resistance. Here, the excellent workability in the coating step refers to a situation in which the amount of wire drawing is small or is immediately interrupted when the curable composition is discharged from the discharge tube in the coating step and then the discharge tube is raised. By using a curable composition with this property, it is possible to prevent the pollution of the surroundings caused by resin splashing and droplet expansion.

作為矽烷偶合劑(B),係只要在分子內具有氮原子之矽烷偶合劑,就沒有特別限制。例如可舉出下述式(b-1)所表示之三烷氧基矽烷化合物、式(b-2)所表示之二烷氧基烷基矽烷化合物或二烷氧基芳基矽烷化合物等。The silane coupling agent (B) is not particularly limited as long as it has a nitrogen atom in the molecule. For example, a trialkoxysilane compound represented by the following formula (b-1), a dialkoxyalkylsilane compound or a dialkoxyarylsilane compound represented by the formula (b-2), etc. can be mentioned.

Figure 02_image017
Figure 02_image017

上述式中,Ra 表示甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、第三丁氧基等碳數1~6的烷氧基。複數個Ra 彼此可相同亦可不同。 Rb 表示甲基、乙基、正丙基、異丙基、正丁基、第三丁基等碳數1~6的烷基;或苯基、4-氯苯基、4-甲基苯基、1-萘基等具有取代基、或不具有取代基之芳基。In the above formulas, R a represents methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, tert-butoxy and other alkoxy having 1 to 6. Plural R a may be identical or different from each other. R b represents a C1-C6 alkyl group such as methyl, ethyl, n-propyl, isopropyl, n-butyl, tertiary butyl, etc.; or phenyl, 4-chlorophenyl, 4-methylbenzene Substituent or unsubstituted aryl groups, such as phenyl group and 1-naphthyl group.

Rc 表示具有氮原子之碳數1~10的有機基。又,Rc 亦可進一步與含有其它矽原子之基鍵結。 作為Rc 之碳數1~10的有機基的具體例,可舉出N-2-(胺乙基)-3-胺丙基、3-胺丙基、N-(1,3-二甲基-亞丁基)胺丙基、3-脲丙基、N-苯基-胺丙基等R c represents an organic group having 1 to 10 carbon atoms with a nitrogen atom. In addition, R c may be further bonded to groups containing other silicon atoms. Specific examples of the organic group having 1 to 10 carbon atoms in R c include N-2-(aminoethyl)-3-aminopropyl, 3-aminopropyl, N-(1,3-dimethyl -Butylene) aminopropyl, 3-ureapropyl, N-phenyl-aminopropyl, etc.

上述式(b-1)或(b-2)所表示的化合物之中,作為Rc 係與含有其它矽原子之基鍵結而成之有機基時的化合物,可舉出透過異三聚氰酸酯骨架而與其它矽原子鍵結來構成異三聚氰酸酯系矽烷偶合劑之物、或透過脲骨架而與其它矽原子鍵結來構成脲系矽烷偶合劑之物。Among the compounds represented by the above formula (b-1) or (b-2), when R c is an organic group formed by bonding with a group containing other silicon atoms, examples include heterocyanuric cyanide An acid ester skeleton is bonded with other silicon atoms to form an isocyanurate-based silane coupling agent, or through a urea skeleton to bond with other silicon atoms to form a urea-based silane coupling agent.

該等之中,作為矽烷偶合劑(B),因為容易得到接著強度較高的硬化物,以異三聚氰酸酯系矽烷偶合劑、及脲系矽烷偶合劑為佳,而且,以在分子內具有4個以上之鍵結在矽原子的烷氧基之物為佳。所謂具有4個以上之鍵結在矽原子的烷氧基,係意味著鍵結在相同的矽原子之烷氧基、與鍵結在不同的矽原子之烷氧基的總合計數為4以上。Among them, as the silane coupling agent (B), since it is easy to obtain a cured product with higher bonding strength, the isocyanurate-based silane coupling agent and the urea-based silane coupling agent are preferred. It is preferable to have 4 or more alkoxy groups bonded to silicon atoms. The so-called having 4 or more alkoxy groups bonded to silicon atoms means that the total count of alkoxy groups bonded to the same silicon atom and alkoxy groups bonded to different silicon atoms is 4 or more .

作為具有4個以上之鍵結在矽原子的烷氧基之異三聚氰酸酯系矽烷偶合劑,可舉出下述式(b-3)所表示之化合物;作為具有4個以上之鍵結在矽原子的烷氧基之脲系矽烷偶合劑,可舉出下述式(b-4)所表示之化合物。As an isocyanurate-based silane coupling agent having 4 or more alkoxy groups bonded to a silicon atom, a compound represented by the following formula (b-3) can be mentioned; as having 4 or more bonds The urea-based silane coupling agent of the alkoxy group bound to the silicon atom includes a compound represented by the following formula (b-4).

Figure 02_image019
Figure 02_image019

式中,Ra 表示與上述相同意思。t1~t5係各自獨立地表示1~10的整數,以1~6的整數為佳,以3為特佳。Wherein, R a represents the same meaning as described above. t1 to t5 each independently represent an integer of 1 to 10, preferably an integer of 1 to 6, and particularly preferably 3.

作為式(b-3)所表示之化合物的具體例,可舉出1,3,5-N-參(3-三甲氧矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-三乙氧矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-三異丙氧矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-三丁氧矽烷基丙基)異三聚氰酸酯等的1,3,5-N-參[(三(碳數1~6)烷氧基)矽烷基(碳數1~10)烷基]異三聚氰酸酯;1,3,5,-N-參(3-二氧基甲基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二甲氧基乙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二甲氧基異丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二甲氧基正丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二甲氧基苯基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二乙氧基甲基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二乙氧基乙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二乙氧基異丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二乙氧基正丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二乙氧基苯基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二異丙氧基甲基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二異丙氧基乙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二異丙氧基異丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二異丙氧基正丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二異丙氧基苯基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二丁氧基甲基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二丁氧基乙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二丁氧基異丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二丁氧基正丙基矽烷基丙基)異三聚氰酸酯、1,3,5,-N-參(3-二丁氧基苯基矽烷基丙基)異三聚氰酸酯等的1,3,5-N-參[(二(碳數1~6)烷氧基)矽烷基(碳數1~10)烷基]異三聚氰酸酯等。As specific examples of the compound represented by the formula (b-3), 1,3,5-N-para(3-trimethoxysilylpropyl) isocyanurate, 1,3,5, -N-ginseng (3-triethoxysilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-triisopropyloxysilylpropyl) isocyanurate , 1,3,5,-N-parameter (3-tributoxysilylpropyl) isocyanurate and other 1,3,5-N-parameter [(three (carbon number 1~6) alkane (Oxy) silyl group (carbon number 1~10) alkyl] isocyanurate; 1,3,5,-N-parameter (3-dioxymethylsilylpropyl) isocyanuric acid Esters, 1,3,5,-N-ginseng (3-dimethoxyethylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-dimethoxy Isopropylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-dimethoxy n-propylsilylpropyl) isocyanurate, 1,3 ,5,-N-(3-Dimethoxyphenylsilylpropyl) isocyanurate, 1,3,5,-N-(3-diethoxymethylsilylpropyl) Group) isocyanurate, 1,3,5,-N-parameter (3-diethoxyethylsilylpropyl) isocyanurate, 1,3,5,-N-parameter (3-diethoxy isopropylsilyl propyl) isocyanurate, 1,3,5,-N-ginseng (3-diethoxy n-propylsilyl propyl) isotrimer Cyanate ester, 1,3,5,-N-parameter (3-diethoxyphenylsilylpropyl) isocyanurate, 1,3,5,-N-parameter (3-diisocyanate Propoxymethylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-diisopropoxyethylsilylpropyl) isocyanurate, 1 ,3,5,-N-ginseng (3-diisopropoxyisopropylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-diisopropoxy N-Propylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-diisopropoxyphenylsilylpropyl) isocyanurate, 1,3 ,5,-N-(3-dibutoxymethylsilylpropyl) isocyanurate, 1,3,5,-N-(3-dibutoxyethylsilylpropyl) Group) isocyanurate, 1,3,5,-N-ginseng (3-dibutoxyisopropylsilylpropyl) isocyanurate, 1,3,5,-N- Ginseng (3-dibutoxy n-propylsilylpropyl) isocyanurate, 1,3,5,-N-ginseng (3-dibutoxyphenyl silyl propyl) isotrimer 1,3,5-N-parameter [(bis(carbon number 1~6)alkoxy)silyl group (carbon number 1~10)alkyl]isocyanurate etc. such as cyanate ester.

作為式(b-4)所表示之化合物的具體例,可舉出N,N’-雙(3-三甲氧矽烷基丙基)脲、N,N’-雙(3-三乙氧矽烷基丙基)脲、N,N’-雙(3-三丙氧矽烷基丙基)脲、N,N’-雙(3-三丁氧矽烷基丙基)脲、N,N’-雙(2-三甲氧矽烷基乙基)脲等的N,N’-雙[(三(碳數1~6)烷氧基矽烷基)(碳數1~10)烷基]脲; N,N’-雙(3-二甲氧基甲基矽烷基丙基)脲、N,N’-雙(3-二甲氧基乙基矽烷基丙基)脲、N,N’-雙(3-二乙氧基甲基矽烷基丙基)脲等的N,N’-雙((二(碳數1~6)烷氧基(碳數1~6)烷基矽烷基(碳數1~10)烷基)脲; N,N’-雙(3-二甲氧基苯基矽烷基丙基)脲、N,N’-雙(3-二乙氧基苯基矽烷基丙基)脲等的N,N’-雙[(二(碳數1~6)烷氧基(碳數6~20)芳基矽烷基(碳數1~10)烷基)脲等。 矽烷偶合劑(B)係能夠單獨1種或組合2種以上而使用。As specific examples of the compound represented by formula (b-4), N,N'-bis(3-trimethoxysilylpropyl)urea, N,N'-bis(3-triethoxysilyl) Propyl)urea, N,N'-bis(3-tripropoxysilylpropyl)urea, N,N'-bis(3-tributoxysilylpropyl)urea, N,N'-bis( N,N'-bis[(tris(carbon number 1~6)alkoxysilyl)(carbon number 1~10)alkyl]urea such as 2-trimethoxysilylethyl)urea; N,N'-bis(3-dimethoxymethylsilylpropyl)urea, N,N'-bis(3-dimethoxyethylsilylpropyl)urea, N,N'-bis (3-diethoxymethylsilylpropyl)urea and other N,N'-bis((bis(carbon number 1~6) alkoxy (carbon number 1~6) alkylsilyl group (carbon number 1~10) Alkyl) urea; N,N'-bis(3-dimethoxyphenylsilylpropyl)urea, N,N'-bis(3-diethoxyphenylsilylpropyl)urea and other N,N'- Bis[(Di(C1~6)alkoxy(C6~20)arylsilyl(C1~10)alkyl)urea etc. The silane coupling agent (B) can be used individually by 1 type or in combination of 2 or more types.

該等之中,作為矽烷偶合劑(B),係以使用1,3,5-N-參(3-三甲氧矽烷基丙基)異三聚氰酸酯、1,3,5-N-參(3-三乙氧矽烷基丙基)異三聚氰酸酯(以下稱為「異三聚氰酸酯化合物」)、N,N’-雙(3-三甲氧矽烷基丙基)脲、N,N’-雙(3-三乙氧矽烷基丙基)脲(以下稱為「脲化合物」)、及上述異三聚氰酸酯化合物與脲化合物的組合為佳。Among them, as the silane coupling agent (B), 1,3,5-N-(3-trimethoxysilylpropyl) isocyanurate, 1,3,5-N- Ginseng (3-triethoxysilylpropyl) isocyanurate (hereinafter referred to as "isocyanurate compound"), N,N'-bis(3-trimethoxysilylpropyl)urea , N,N'-bis(3-triethoxysilylpropyl)urea (hereinafter referred to as "urea compound"), and a combination of the above isocyanurate compound and urea compound are preferred.

將上述異三聚氰酸酯化合物與脲化合物組合而使用時,兩者的使用比例係(異三聚氰酸酯化合物)與(脲化合物)之質量比,以100:1~100:200為佳,以100:10~100:110為較佳。藉由採用此種比例而將異三聚氰酸酯化合物與脲化合物組合而使用,能夠得到提供接著強度較高且具有更優異的耐熱性的硬化物之硬化性組合物。When the above isocyanurate compound and urea compound are used in combination, the use ratio of the two is the mass ratio of (isocyanurate compound) and (urea compound), 100:1~100:200 Best, preferably 100:10~100:110. By using this ratio in combination with the isocyanurate compound and the urea compound, it is possible to obtain a curable composition that provides a cured product with higher adhesive strength and better heat resistance.

本發明的硬化性組合物係含有矽烷偶合劑(B)[(B)成分]時,(B)成分的含量係沒有特別限定,其量係上述(A)成分與(B)成分的質量比[(A)成分:(B)成分],良好為100:0.1~100:90,較佳為100:0.3~100:60,較佳為100:1~100:50,更佳為100:3~100:40,特佳是成為100:5~100:30之量。 採用此種比例而含有(A)成分與(B)成分之硬化性組合物的硬化物,係成為接著強度較高且具有更優異的耐熱性之物。When the curable composition of the present invention contains the silane coupling agent (B) [(B) component], the content of (B) component is not particularly limited, and the amount is the mass ratio of the above-mentioned (A) component and (B) component [(A) component: (B) component], good is 100:0.1~100:90, preferably 100:0.3~100:60, preferably 100:1~100:50, more preferably 100:3 ~100:40, it is particularly good to be 100:5~100:30. The cured product of the curable composition containing the (A) component and the (B) component at such a ratio becomes a product with higher adhesive strength and better heat resistance.

本發明的硬化性組合物亦可含有在分子內具有酸酐結構之矽烷偶合劑(以下有記載為「矽烷偶合劑(C)」之情形)作為(C)成分。 含有矽烷偶合劑(C)之硬化性組合物,係在塗佈步驟具有優異的作業性且提供接著強度較高且具有更優異的耐剝離性及耐熱性之硬化物。The curable composition of the present invention may also contain a silane coupling agent having an acid anhydride structure in the molecule (hereinafter, it may be described as "silane coupling agent (C)") as the (C) component. The curable composition containing the silane coupling agent (C) has excellent workability in the coating step and provides a cured product with higher adhesion strength and better peel resistance and heat resistance.

作為矽烷偶合劑(C),可舉出2-(三甲氧矽烷基)乙基琥珀酸酐、2-(三乙氧基矽烷基)乙基琥珀酸酐、3-(三甲氧矽烷基)丙基琥珀酸酐、3-(三乙氧基矽烷基)丙基琥珀酸酐等的三(碳數1~6)烷氧矽烷基(碳數2~8)烷基琥珀酸酐;2-(二甲氧基甲基矽烷基)乙基琥珀酸酐等的二(碳數1~6)烷氧基甲基矽烷基(碳數2~8)烷基琥珀酸酐;2-(甲氧基二甲基矽烷基)乙基琥珀酸酐等的(碳數1~6)烷氧基二甲基矽烷基(碳數2~8)烷基琥珀酸酐;Examples of the silane coupling agent (C) include 2-(trimethoxysilyl)ethyl succinic anhydride, 2-(triethoxysilyl)ethyl succinic anhydride, and 3-(trimethoxysilyl)propyl succinic anhydride. Acid anhydride, 3-(triethoxysilyl) propyl succinic anhydride, etc. Tris (carbon number 1~6) alkoxysilyl (carbon number 2~8) alkyl succinic anhydride; 2-(dimethoxymethyl Di (carbon number 1~6) alkoxymethylsilyl group (carbon number 2~8) alkyl succinic anhydride; 2-(methoxydimethylsilyl) ethyl (Carbon number 1~6) alkoxy dimethylsilyl group (carbon number 2~8) alkyl succinic anhydride such as succinic anhydride;

2-(三氯矽烷基)乙基琥珀酸酐、2-(三溴矽烷基)乙基琥珀酸酐等的三鹵基矽烷基(碳數2~8)烷基琥珀酸酐;2-(二氯甲基矽烷基)乙基琥珀酸酐等的二鹵基甲基矽烷基(碳數2~8)烷基琥珀酸酐;2-(氯二甲基矽烷基)乙基琥珀酸酐等的鹵基二甲基矽烷基(碳數2~8)烷基琥珀酸酐等。矽烷偶合劑(C)係能夠單獨1種或組合2種以上而使用。2-(Trichlorosilyl) ethyl succinic anhydride, 2-(tribromosilyl) ethyl succinic anhydride, etc. Trihalosilyl (carbon number 2~8) alkyl succinic anhydride; 2-(Dichloromethane Dihalomethylsilyl (carbon number 2~8) alkyl succinic anhydride such as ethyl silyl) ethyl succinic anhydride; halo dimethyl such as 2-(chlorodimethylsilyl) ethyl succinic anhydride Silyl group (carbon number 2-8) alkyl succinic anhydride, etc. The silane coupling agent (C) can be used individually by 1 type or in combination of 2 or more types.

該等之中,作為矽烷偶合劑(C),係以三(碳數1~6)烷氧矽烷基(碳數2~8)烷基琥珀酸酐為佳,以3-(三甲氧矽烷基)丙基琥珀酸酐或3-(三乙氧基矽烷基)丙基琥珀酸酐為特佳。Among them, as the silane coupling agent (C), tris(carbon number 1~6) alkoxysilyl (carbon number 2~8) alkyl succinic anhydride is preferred, and 3-(trimethoxysilyl) Propyl succinic anhydride or 3-(triethoxysilyl) propyl succinic anhydride is particularly preferred.

本發明的硬化性組合物係含有矽烷偶合劑(C)[(C)成分]時,(C)成分的含量係沒有特別限定,其量係上述(A)成分與(C)成分的質量比[(A)成分:(C)成分],良好為100:0.1~100:30,較佳為100:0.3~100:20,較佳為100:0.5~100:15,更佳是成為100:1~100:10之量。 採用此種比例含有(C)成分之硬化性組合物的硬化物係成為接著強度較高之物。When the curable composition of the present invention contains a silane coupling agent (C) [(C) component], the content of (C) component is not particularly limited, and the amount is the mass ratio of the above-mentioned (A) component to (C) component [(A) component: (C) component], good is 100:0.1~100:30, preferably 100:0.3~100:20, preferably 100:0.5~100:15, more preferably 100: 1~100: 10 amount. The cured product of the curable composition containing the component (C) in such a ratio has a higher adhesive strength.

本發明的硬化性組合物亦可含有平均一次粒徑為5~40nm的微粒(以下有記載為「微粒(D)」之情形)作為(D)成分。含有微粒(D)之硬化性組合物,係在塗佈步驟具有優異的作業性。因為更容易得到該效果,微粒(D)的平均一次粒徑係較佳為5~30nm,更佳為5~20nm。The curable composition of the present invention may contain fine particles having an average primary particle diameter of 5 to 40 nm (in the following, they may be described as "fine particles (D)") as the (D) component. The curable composition containing fine particles (D) has excellent workability in the coating step. Because this effect is easier to obtain, the average primary particle size of the fine particles (D) is preferably 5-30 nm, more preferably 5-20 nm.

微粒(D)的平均一次粒徑係能夠藉由使用穿透式電子顯微鏡觀察微粒的形狀而求取。The average primary particle size of the particles (D) can be obtained by observing the shape of the particles using a transmission electron microscope.

微粒(D)的比表面積係較佳為10~500m2 /g,更佳為20~300m2 /g。藉由比表面積為上述範圍內,容易得到在塗佈步驟具有更優異的作業性之硬化性組合物。 比表面積係能夠使用BET多點法而求取。The specific surface area of the fine particles (D) is preferably 10 to 500 m 2 /g, more preferably 20 to 300 m 2 /g. When the specific surface area is in the above range, it is easy to obtain a curable composition having more excellent workability in the coating step. The specific surface area can be obtained using the BET multipoint method.

微粒(D)的形狀可為球狀、鏈狀、針狀、板狀、片狀、棒狀、纖維狀等的任一種,以球狀為佳。在此,所謂球狀,係意味著除了包含正球狀之外,也能包含旋轉橢圓體、卵形、糖球狀、繭狀等能夠近似球體的多面體形狀之大略球狀。The shape of the particles (D) may be any of spherical, chain-like, needle-like, plate-like, sheet-like, rod-like, and fiber-like shapes, and a spherical shape is preferred. Here, the term “spherical shape” means that in addition to a true spherical shape, it can also include a polyhedral shape that can approximate a spherical shape, such as a spheroid, an oval shape, a sugar spherical shape, and a cocoon shape.

作為微粒(D)的構成成分,係沒有特別限制,可舉出金屬;金屬氧化物;礦物;碳酸鈣、碳酸鎂等的金屬碳酸鹽;硫酸鈣、硫酸鋇等的金屬硫酸鹽;氫氧化鋁等的金屬氫氧化物;矽酸鋁、矽酸鈣、矽酸鎂等的金屬矽酸鹽;氧化矽等的無機成分;聚矽氧;丙烯酸系聚合物等的有機成分等。 又,所使用的微粒(D)亦可為表面經改性之物。The constituent components of the fine particles (D) are not particularly limited, and examples include metals; metal oxides; minerals; metal carbonates such as calcium carbonate and magnesium carbonate; metal sulfates such as calcium sulfate and barium sulfate; aluminum hydroxide Metal hydroxides such as aluminum silicate, calcium silicate, and magnesium silicate; inorganic components such as silicon oxide; polysiloxane; organic components such as acrylic polymers. In addition, the microparticles (D) used may be those whose surface has been modified.

所謂金屬,係指屬於在周期表之第1族(H除外)、第2~11族、第12族(Hg除外)、第13族(B除外)、第14族(C及Si除外)、第15族(N、P、As及Sb除外)、或第16族(O、S、Se、Te及Po除外)之元素。The so-called metal refers to the periodic table in Group 1 (except H), 2-11, 12 (except Hg), 13 (except B), 14 (except C and Si), Group 15 (except N, P, As, and Sb), or group 16 (except O, S, Se, Te, and Po) elements.

作為金屬氧化物,可舉出例如氧化鈦、氧化鋁、水鋁礦(boehmite)、氧化鉻、氧化鎳、氧化銅、氧化鈦、氧化鋯、氧化銦、氧化鋅、及該等複合氧化物等。金屬氧化物的微粒亦包含由該等金屬氧化物所構成之溶膠(sol)粒子。Examples of metal oxides include titanium oxide, aluminum oxide, boehmite, chromium oxide, nickel oxide, copper oxide, titanium oxide, zirconium oxide, indium oxide, zinc oxide, and these composite oxides. . The fine particles of metal oxides also include sol particles composed of the metal oxides.

作為礦物,可舉出膨潤石(smectite)、膨土等。 作為膨潤石,可舉出例如蒙脫石(montmorillonite)、貝得石(beidellite)、鋰膨潤石(hectorite)、皂石(saponite)、矽鎂石(stevensite)、矽鐵石(nontronite)、鋅蒙脫石(sauconite)等。 作為氧化矽,可舉出乾式氧化矽、濕式氧化矽、表面改性氧化矽(表面經改性之氧化矽)等。Examples of minerals include smectite and bentonite. As the bentonite, for example, montmorillonite, beidellite, hectorite, saponite, stevensite, nontronite, zinc montmorillonite Sauconite and so on. Examples of silica include dry silica, wet silica, and surface-modified silica (silicon oxide with a modified surface).

微粒(D)係能夠單獨1種或組合2種以上而使用。該等之中,因為容易得到具有優異的透明性之硬化物,作為微粒(D),係以氧化矽、金屬氧化物、礦物為佳,以氧化矽為較佳。The fine particle (D) system can be used individually by 1 type or in combination of 2 or more types. Among them, since it is easy to obtain a cured product with excellent transparency, as the fine particles (D), silicon oxide, metal oxide, and mineral are preferred, and silicon oxide is preferred.

氧化矽之中,因為容易得到在塗佈步驟具有更優異的作業性之硬化性組合物,係以表面改性氧化矽為佳,以疏水性表面改性氧化矽為較佳。 作為疏水性表面改性氧化矽,可舉出使三甲基矽烷基等三個碳數1~20的三烷基矽烷基、二甲基矽烷基等二個碳數1~20的烷基矽烷基;辛基矽烷基等的碳數1~20的烷基矽烷基鍵結在表面而成之氧化矽;及使用聚矽氧油處理表面而成之氧化矽等。 疏水性表面改性氧化矽係例如能夠藉由使用具有三個碳數1~20的三烷基矽烷基、二個碳數1~20的烷基矽烷基、碳數1~20的烷基矽烷基等之矽烷偶合劑對氧化矽粒子進行表面改性、或使用聚矽氧油處理氧化矽粒子而得到。又,亦能夠直接使用市售之表面改性氧化矽。Among silica, since it is easy to obtain a curable composition having better workability in the coating step, surface-modified silica is preferred, and hydrophobic surface-modified silica is preferred. Examples of hydrophobic surface-modified silica include three trialkylsilyl groups with 1-20 carbon atoms, such as trimethylsilyl group, and two alkylsilane groups with 1-20 carbon atoms, such as dimethylsilyl group. Group; Silicon oxide formed by bonding alkylsilyl groups with 1-20 carbon atoms such as octylsilyl group on the surface; and silicon oxide formed by treating the surface with polysiloxane oil. The hydrophobic surface-modified silica system can be used, for example, by using three trialkylsilyl groups with 1 to 20 carbons, two alkylsilyl groups with 1 to 20 carbons, and alkylsilanes with 1 to 20 carbons. It can be obtained by surface modification of silica particles with silane coupling agent such as base, or treatment of silica particles with silicone oil. In addition, it is also possible to directly use commercially available surface-modified silica.

本發明的硬化性組合物係含有微粒(D)[(D)成分]時,(D)成分的含量係沒有特別限定,其量係上述(A)成分與(D)成分的質量比[(A)成分:(D)成分],良好為100:0.1~100:90,較佳為100:0.2~100:60,較佳為100:0.3~100:50,較佳為100:0.5~100:40,較佳是成為100:0.8~100:30之量。藉由在上述範圍使用(D)成分,而能夠進一步顯現添加(D)成分之效果。When the curable composition of the present invention contains fine particles (D) [(D) component], the content of (D) component is not particularly limited, and the amount is the mass ratio of the above-mentioned (A) component to (D) component [( A) component: (D) component], good is 100:0.1~100:90, preferably 100:0.2~100:60, preferably 100:0.3~100:50, preferably 100:0.5~100 : 40, preferably 100:0.8~100:30. By using the component (D) in the above range, the effect of adding the component (D) can be further expressed.

本發明的硬化性組合物亦可含有平均一次粒徑為大於0.04μm且8μm以下的微粒(以下有記載為「微粒(E)」之情形)作為(E)成分。藉由使用含有微粒(E)之硬化性組合物,能夠形成具有優異的耐剝離性之硬化物。 因為更容易得到該效果,微粒(E)的平均一次粒徑係良好為0.06~7μm,較佳為0.3~6μm,更佳為0.5~4μm。The curable composition of the present invention may contain fine particles having an average primary particle diameter of more than 0.04 μm and 8 μm or less (hereinafter, described as "fine particles (E)") as the (E) component. By using a curable composition containing fine particles (E), a cured product with excellent peel resistance can be formed. Since this effect is easier to obtain, the average primary particle size of the fine particles (E) is preferably 0.06-7 μm, preferably 0.3-6 μm, and more preferably 0.5-4 μm.

微粒(E)的平均一次粒徑,係能夠藉由使用雷射繞射‧散射式粒度分布測定裝置(例如股份公司堀場製作所製、製品名「LA-920」)等,藉由雷射散射法而進行測定粒度分布來求取。The average primary particle size of the particles (E) can be determined by using a laser diffraction and scattering particle size distribution measuring device (for example, manufactured by Horiba Co., Ltd., product name "LA-920"), etc., by laser scattering It is determined by measuring the particle size distribution.

微粒(E)的形狀可為球狀、鏈狀、針狀、板狀、片狀、棒狀、纖維狀等的任一種,以球狀為佳。在此,所謂球狀,係意味著除了包含正球狀之外,也能包含旋轉橢圓體、卵形、糖球狀、繭狀等能夠近似球體的多面體形狀之大略球狀。The shape of the fine particles (E) may be any of spherical, chain-like, needle-like, plate-like, sheet-like, rod-like, and fiber-like shapes, and a spherical shape is preferred. Here, the term “spherical shape” means that in addition to a true spherical shape, it can also include a polyhedral shape that can approximate a spherical shape, such as a spheroid, an oval shape, a sugar spherical shape, and a cocoon shape.

作為微粒(E)的構成成分,可舉出作為微粒(D)的構成成分已例示之物同樣物。 微粒(E)係能夠單獨1種或組合2種以上而使用。該等之中,因為容易得到上述效果,作為微粒(E),係以選自由經聚矽氧被覆表面之金屬氧化物、氧化矽及聚矽氧所組成群組之至少一種微粒為佳,以氧化矽、聚矽氧為較佳。As the structural component of the microparticle (E), the same thing as exemplified as the structural component of the microparticle (D) can be mentioned. The microparticle (E) system can be used individually by 1 type or in combination of 2 or more types. Among them, because the above-mentioned effects are easily obtained, as the particles (E), at least one kind of particles selected from the group consisting of metal oxides, silicon oxides and polysiloxanes coated on the surface of polysiloxy is preferably used. Silicon oxide and polysiloxane are preferred.

本發明的硬化性組合物係含有微粒(E)[(E)成分]時,(E)成分的含量係沒有特別限定,其量係(A)成分與(E)成分的質量比[(A)成分:(E)成分],良好為100:0.1~100:40,較佳為100:0.2~100:30,較佳為100:0.3~100:20,較佳為100:0.5~100:15,更佳是成為100:0.8~100:12之量。藉由在上述範圍使用(E)成分,能夠進一步顯現添加(E)成分之效果。When the curable composition of the present invention contains fine particles (E) [(E) component], the content of (E) component is not particularly limited, and the amount is the mass ratio of (A) component to (E) component [(A) ) Ingredient: (E) Ingredient], good is 100:0.1~100:40, preferably 100:0.2~100:30, preferably 100:0.3~100:20, preferably 100:0.5~100: 15. It is better to be 100:0.8~100:12. By using the component (E) in the above range, the effect of adding the component (E) can be further expressed.

本發明的硬化性組合物係在不阻礙本發明的目的之範圍,亦可含有上述(A)~(E)成分以外的其它成分((F)成分)。 作為(F)成分,可舉出抗氧化劑、紫外線吸收劑、光安定劑等。The curable composition of the present invention may contain other components ((F) component) other than the above-mentioned (A) to (E) components within a range that does not hinder the purpose of the present invention. As (F) component, antioxidant, ultraviolet absorber, light stabilizer, etc. are mentioned.

抗氧化劑係為了防止加熱時的氧化劣化而添加。作為抗氧化劑,可舉出磷系抗氧化劑、酚系抗氧化劑、硫系抗氧化劑等。The antioxidant is added in order to prevent oxidative deterioration during heating. Examples of antioxidants include phosphorus-based antioxidants, phenol-based antioxidants, and sulfur-based antioxidants.

作為磷系抗氧化劑,可舉出亞磷酸酯類、氧雜磷雜菲氧化物(oxa phosphaphenanthrene oxide)類等。作為酚系抗氧化劑,可舉出單酚類、雙酚類、高分子型酚類等。作為硫系抗氧化劑,可舉出3,3’-硫代二丙酸二月桂酯、3,3’-硫代二丙酸二肉豆蔻酯、3,3’-硫代二丙酸二硬脂酸酯等。Examples of phosphorus-based antioxidants include phosphites, oxa phosphaphenanthrene oxides, and the like. Examples of phenolic antioxidants include monophenols, bisphenols, and polymer phenols. Examples of sulfur-based antioxidants include 3,3'-thiodipropionate dilauryl ester, 3,3'-thiodipropionate dimyristate, 3,3'-thiodipropionate distearate Fatty acid esters and so on.

該等抗氧化劑係能夠單獨1種或組合2種以上而使用。抗氧化劑的使用量係相對於(A)成分,通常10質量%以下。These antioxidants can be used individually by 1 type or in combination of 2 or more types. The amount of antioxidant used is usually 10% by mass or less with respect to (A) component.

紫外線吸收劑係為了使所得到的硬化物之耐光性提升而添加。 作為紫外線吸收劑,可舉出水楊酸類、二苯基酮類、苯并三唑類、受阻胺類等。 紫外線吸收劑係能夠單獨1種或組合2種以上而使用。 紫外線吸收劑的使用量係相對於(A)成分,通常10質量%以下。The ultraviolet absorber is added in order to improve the light resistance of the obtained cured product. Examples of ultraviolet absorbers include salicylic acids, diphenylketones, benzotriazoles, hindered amines, and the like. The ultraviolet absorber system can be used individually by 1 type or in combination of 2 or more types. The amount of the ultraviolet absorber used is usually 10% by mass or less with respect to the component (A).

光安定劑係為了使所得到的硬化物的耐光性提升之目的而添加。 作為光安定劑,例如可舉出聚[{6-(1,1,3,3,-四甲基丁基)胺-1,3,5-三嗪-2,4-二基}{(2,2,6,6-四甲基-4-哌啶)亞胺}六亞甲基{(2,2,6,6-四甲基-4-哌啶)亞胺}]等的受阻胺類等。 該等光安定劑係能夠單獨1種或組合2種以上而使用。 (F)成分的總使用量係相對於(A)成分,通常20質量%以下。The light stabilizer is added for the purpose of improving the light resistance of the obtained cured product. As the light stabilizer, for example, poly[{6-(1,1,3,3,-tetramethylbutyl)amine-1,3,5-triazine-2,4-diyl}{( 2,2,6,6-Tetramethyl-4-piperidine)imine}hexamethylene{(2,2,6,6-tetramethyl-4-piperidine)imine}] etc. are hindered Amines, etc. These light stabilizers can be used individually by 1 type or in combination of 2 or more types. The total usage amount of (F) component is usually 20% by mass or less with respect to (A) component.

本發明的硬化性組合物,係例如能夠藉由將上述(A)成分、溶劑(S1)、及依照需要之該等以外的成分以預定比率混合且除氣來調製。混合方法、除氣方法係沒有特別限定,能夠利用習知的方法。The curable composition of the present invention can be prepared, for example, by mixing the above-mentioned (A) component, the solvent (S1), and components other than these as necessary at a predetermined ratio and degassing. The mixing method and degassing method are not particularly limited, and conventional methods can be used.

本發明的硬化性組合物係含有硬化性聚倍半矽氧烷化合物(A)。因而,本發明的硬化性組合物係具有優異的硬化性且折射率較低。又,本發明的硬化性組合物係作為接著強度較高的硬化物的形成材料為有用的。The curable composition of the present invention contains a curable polysilsesquioxane compound (A). Therefore, the curable composition system of the present invention has excellent curability and a low refractive index. In addition, the curable composition system of the present invention is useful as a material for forming a cured product with high adhesive strength.

本發明的硬化性組合物在25℃之折射率(nD)係通常為1.380~1.434,良好為1.380~1.430,較佳為1.380~1.428,更佳為1.380~1.425。 硬化性組合物的折射率(nD)係能夠使用實施例記載的方法而測定。The refractive index (nD) of the curable composition of the present invention at 25°C is usually 1.380 to 1.434, preferably 1.380 to 1.430, preferably 1.380 to 1.428, and more preferably 1.380 to 1.425. The refractive index (nD) of the curable composition can be measured using the method described in the examples.

而且,本發明的硬化性組合物係含有溶劑(S1)。因而,本發明的硬化性組合物係塗佈後即便被放置長時間之後,亦能夠與剛塗佈後同樣地進行光學元件的裝配等的作業。 例如,在本發明的硬化性組合物係塗佈後,即便經過通常20分鐘以上、較佳為30分鐘以上、更佳為60分鐘以上後,亦能夠進行與剛塗佈後同樣的作業。Furthermore, the curable composition system of this invention contains a solvent (S1). Therefore, even after the curable composition system of the present invention is left to stand for a long time after application, operations such as assembly of optical elements can be performed in the same manner as immediately after application. For example, after the curable composition system of the present invention is applied, even after 20 minutes or more, preferably 30 minutes or more, and more preferably 60 minutes or more, the same operation as immediately after the application can be performed.

3)硬化物 本發明的硬化物係將本發明的硬化性組合物硬化而得到之物。作為使本發明的硬化性組合物硬化之方法,可舉出加熱硬化。使其硬化時之加熱溫度係通常為100~200℃,加熱時間係通常從10分鐘起至20小時,較佳為30分鐘起至10小時。3) Hardening The cured product of the present invention is obtained by curing the curable composition of the present invention. As a method of curing the curable composition of the present invention, heat curing can be cited. The heating temperature for curing is usually 100~200°C, and the heating time is usually from 10 minutes to 20 hours, preferably from 30 minutes to 10 hours.

本發明的硬化物係接著強度較高且具有優異的耐熱性之物。本發明的硬化物具有該等特性係例如能夠如以下地進行而確認。亦即,將本發明的硬化性組合物以預定量塗佈在矽晶片的鏡面且使塗佈面載置在被接著物上,而且進行壓黏及加熱處理使其硬化。將其放置在預先加熱至預定溫度(例如23℃、100℃)之黏結強度試驗機(bond tester)的測定載物台上30秒鐘,從被接著物起算50μm的高度之位置,對接著面在水平方向(剪切方向)施加應力來測定試片與被接著物的接著力。The cured product of the present invention is a product with high adhesive strength and excellent heat resistance. The cured product of the present invention has these characteristics, for example, it can be confirmed as follows. That is, the curable composition of the present invention is coated on the mirror surface of the silicon wafer in a predetermined amount, the coated surface is placed on the adherend, and pressure bonding and heat treatment are performed to harden it. Place it on the measuring stage of a bond tester (bond tester) preheated to a predetermined temperature (for example, 23°C, 100°C) for 30 seconds, at a height of 50μm from the object to be bonded, facing the adhesive surface Stress is applied in the horizontal direction (shear direction) to measure the adhesion between the test piece and the substrate.

本發明的硬化物之接著力係在23℃以60N/4mm2 以上為佳,以80N/4mm2 以上為較佳,以100N/4mm2 以上為特佳。又,硬化物的接著力係在100℃以30N/4mm2 以上為佳,以40N/4mm2 以上為較佳,以50N/4mm2 以上為更佳,以60N/4mm2 以上為特佳。在本說明書,所謂「4mm2 」係意味著2mm×2mm(1邊為2mm的正方形)。The adhesive force of the cured product of the present invention is preferably 60N/4mm 2 or more at 23°C, preferably 80N/4mm 2 or more, and particularly preferably 100N/4mm 2 or more. In addition, the adhesive force of the cured product at 100°C is preferably 30N/4mm 2 or more, preferably 40N/4mm 2 or more, more preferably 50N/4mm 2 or more, and particularly preferably 60N/4mm 2 or more. In this specification, "4mm 2 "means 2mm×2mm (one side is a square of 2mm).

因為具有上述特性,所以本發明的硬化物係能夠適合使用作為光學元件固定材。Because of the above-mentioned characteristics, the cured product system of the present invention can be suitably used as an optical element fixing material.

4)硬化性組合物的使用方法 本發明的方法係將本發明的硬化性組合物使用作為光學元件固定材用接著劑或光學元件固定材用密封劑之方法。作為光學元件,可舉出LED、LD等的發光元件、受光元件、複合光學元件、光積體電路等。4) How to use the curable composition The method of the present invention is a method of using the curable composition of the present invention as an adhesive for an optical element fixing material or a sealing agent for an optical element fixing material. Examples of optical elements include light-emitting elements such as LEDs and LDs, light-receiving elements, composite optical elements, and optical integrated circuits.

>光學元件固定材用接著劑> 本發明的硬化性組合物係能夠適合使用作為光學元件固定材用接著劑。作為將本發明的硬化性組合物使用作為光學元件固定材用接著劑之方法,係將該組合物塗佈在作為接著對象之材料(光學元件及其基板等)的一方或雙方的接著面且壓黏之後,使其加熱硬化來使作為接著對象之材料彼此堅固地接著之方法。本發明的硬化性組合物的塗佈量係沒有特別限定,藉由使其硬化而能夠使作為接著對象之材料彼此堅固地接著之量即可。通常,硬化性組合物的塗膜之厚度為0.5~5μm,較佳是成為1~3μm之量。>Adhesives for optical element fixing materials> The curable composition system of this invention can be used suitably as an adhesive agent for optical element fixing materials. As a method of using the curable composition of the present invention as an adhesive for an optical element fixing material, the composition is applied to one or both of the adhesive surfaces of the material (optical element and its substrate, etc.) to be adhered. After pressure bonding, it is a method to heat and harden the materials to be bonded to each other firmly. The coating amount of the curable composition of the present invention is not particularly limited, and it is sufficient to harden the materials to be bonded to each other firmly. Generally, the thickness of the coating film of the curable composition is 0.5 to 5 μm, preferably 1 to 3 μm.

作為用以將光學元件接著之基板材料,可舉出鈉鈣玻璃、耐熱性硬質玻璃等的玻璃類;陶瓷;藍寶石;鐵、銅、鋁、金、銀、白金、鉻、鈦及該等金屬的合金、不鏽鋼(SUS302、SUS304、SUS304L、SUS309等)等的金屬類;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、乙烯-乙酸乙烯酯共聚物、聚苯乙烯、聚碳酸酯、聚甲基戊烯、聚碸、聚醚醚酮、聚醚碸、聚苯硫醚(polyphenylene sulfide)、聚醚醯亞胺、聚醯亞胺、聚醯胺、丙烯酸樹脂、降莰烯系樹脂、環烯烴樹脂、玻璃環氧樹脂等的合成樹脂等。As the substrate material for bonding optical elements, glass such as soda lime glass and heat-resistant hard glass; ceramics; sapphire; iron, copper, aluminum, gold, silver, platinum, chromium, titanium and such metals Alloys, stainless steel (SUS302, SUS304, SUS304L, SUS309, etc.) and other metals; polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ethylene-vinyl acetate Copolymer, polystyrene, polycarbonate, polymethylpentene, polyether, polyetheretherketone, polyetherether, polyphenylene sulfide, polyetherimine, polyimide, polyimide Synthetic resins such as amide, acrylic resin, norbornene resin, cycloolefin resin, glass epoxy resin, etc.

使其加熱硬化時的加熱溫度,亦取決於所使用的硬化性組合物等,通常100~200℃。加熱時間係通常10分鐘至20小時,較佳為30分鐘至10小時。The heating temperature when heat-curing is also dependent on the curable composition used, and is usually 100 to 200°C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.

>光學元件固定材用密封劑> 本發明的硬化性組合物係能夠適合使用作為光學元件固定材用密封劑。作為將本發明的硬化性組合物使用作為光學元件固定材用密封劑之方法,例如可舉出將該組合物成形為所需要的形狀而得到內包光學元件之成形體之後,藉由使該物加熱硬化,來製造光學元件密封體之方法等。 作為將本發明的硬化性組合物成形為所需要的形狀之方法,係沒有特別限定,能夠採用通常的轉移成型法、澆鑄法等習知的造模法。>Sealant for optical element fixing material> The curable composition system of the present invention can be suitably used as a sealant for an optical element fixing material. As a method of using the curable composition of the present invention as a sealant for an optical element fixing material, for example, after molding the composition into a desired shape to obtain a molded body encapsulating an optical element, by making the composition The material is heated and hardened to manufacture the optical element sealing body. The method for molding the curable composition of the present invention into a desired shape is not particularly limited, and conventional molding methods such as a general transfer molding method and a casting method can be used.

加熱硬化時的加熱溫度亦取決於所使用的硬化性組合物等,通常100~200℃。加熱時間係通常10分鐘至20小時,較佳為30分鐘至10小時。The heating temperature during heat curing also depends on the curable composition used, etc., and is usually 100 to 200°C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.

因為所得到的光學元件密封體係使用本發明的硬化性組合物,所以具有優異的耐熱性且接著強度較高。 [實施例]Since the obtained optical element sealing system uses the curable composition of the present invention, it has excellent heat resistance and high adhesive strength. [Example]

以下,舉出實施例而更詳細地說明本發明。但是本發明係完全不被以下的實施例限定。各例中的份及%係只要未預先告知,就是質量基準。Hereinafter, the present invention will be explained in more detail with examples. However, the present invention is not limited by the following examples at all. The parts and% in each example are quality standards unless notified in advance.

(實施例1) 在300mL的茄子型燒瓶添加3,3,3-三氟丙基三甲氧基矽烷17.0g(77.7mmo1)、及甲基三乙氧基矽烷32.33g(181.3mmol)後,將其邊攪拌邊添加將35%鹽酸0.0675g(HCl的量為0.65mmol,相對於矽烷化合物的合計量為0.25mol%)溶解在蒸餾水14.0g而得到的水溶液,將全部內容物在30℃攪拌2小時,其次升溫至70℃攪拌20小時。邊繼續攪拌內容物,邊在此添加28%氨水0.0394g(NH3 的量為0.65mmol)與乙酸丙酯46.1g的混合溶液使反應液的pH成為6.9,而且直接在70℃攪拌60分鐘。 將反應液放冷至室溫為止後,在此,添加乙酸丙酯50g及水100g而進行分液處理,來得到含有反應生成物之有機層。在該有機層添加硫酸鎂而進行乾燥處理。將硫酸鎂過濾分開而除去後,使用蒸發器將有機層濃縮,其次,藉由將所得到的濃縮物進行真空乾燥來得到硬化性聚倍半矽氧烷化合物(1)。(Example 1) After adding 17.0 g (77.7 mmol) of 3,3,3-trifluoropropyltrimethoxysilane and 32.33 g (181.3 mmol) of methyltriethoxysilane to a 300 mL eggplant type flask, An aqueous solution obtained by dissolving 0.0675 g of 35% hydrochloric acid (the amount of HCl is 0.65 mmol and the total amount of the silane compound is 0.25 mol%) in 14.0 g of distilled water was added while stirring, and the whole content was stirred at 30°C. It was heated to 70°C and stirred for 20 hours. While continuing to stir the contents, a mixed solution of 0.0394 g of 28% ammonia water (amount of NH 3 0.65 mmol) and 46.1 g of propyl acetate was added here to make the pH of the reaction liquid 6.9, and the mixture was stirred at 70° C. for 60 minutes. After the reaction liquid was allowed to cool to room temperature, 50 g of propyl acetate and 100 g of water were added here to perform liquid separation treatment to obtain an organic layer containing the reaction product. Magnesium sulfate was added to the organic layer to perform drying treatment. After the magnesium sulfate was separated by filtration and removed, the organic layer was concentrated using an evaporator, and then, the obtained concentrate was vacuum dried to obtain a curable polysilsesquioxane compound (1).

在硬化性聚倍半矽氧烷化合物(1)100份,添加平均一次粒徑為7nm的氧化矽填料20份、平均一次粒徑為0.8μm的聚矽氧填料10份。而且,添加作為溶劑之二乙二醇單丁醚乙酸酯:三丙二醇正丁醚=40:60(質量比)的混合溶劑30份後,將全部內容物進行攪拌。 使用三輥磨機進行分散處理後,添加1,3,5-N-參[3-(三甲氧矽烷基)丙基]異三聚氰酸酯30份、3-(三甲氧矽烷基)丙基琥珀酸酐3份、及作為溶劑之二乙二醇單丁醚乙酸酯:三丙二醇正丁醚=40:60(質量比)的混合溶劑,而且藉由將全部內容物充分地混合、除氣來得到固體成分濃度82%的硬化性組合物(1)。To 100 parts of the curable polysilsesquioxane compound (1), 20 parts of a silica filler having an average primary particle diameter of 7 nm and 10 parts of a polysiloxane filler having an average primary particle diameter of 0.8 μm were added. Furthermore, after adding 30 parts of a mixed solvent of diethylene glycol monobutyl ether acetate:tripropylene glycol n-butyl ether=40:60 (mass ratio) as a solvent, the entire contents were stirred. After dispersing treatment using a three-roll mill, add 30 parts of 1,3,5-N-parameter [3-(trimethoxysilyl)propyl] isocyanurate and 3-(trimethoxysilyl) propyl 3 parts of base succinic anhydride, and a mixed solvent of diethylene glycol monobutyl ether acetate:tripropylene glycol n-butyl ether=40:60 (mass ratio) as a solvent, and by fully mixing all the contents to remove To obtain a curable composition (1) having a solid content concentration of 82%.

(實施例2) 除了將添加28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更成為120分鐘以外,係與實施例1同樣地進行而得到硬化性聚倍半矽氧烷化合物(2)、及硬化性組合物(2)。(Example 2) Except that the stirring time after adding the mixed solution of 28% ammonia and propyl acetate was changed to 120 minutes, the same procedure as in Example 1 was carried out to obtain a curable polysilsesquioxane compound (2) and a curable combination物(2).

(實施例3) 除了將添加28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更成為90分鐘以外,係與實施例1同樣地進行而得到硬化性聚倍半矽氧烷化合物(3)、及硬化性組合物(3)。(Example 3) Except that the stirring time after adding the mixed solution of 28% ammonia and propyl acetate was changed to 90 minutes, the same procedure as in Example 1 was carried out to obtain a curable polysilsesquioxane compound (3) and a curable combination物(3).

(實施例4) 除了將添加28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更成為50分鐘以外,係與實施例1同樣地進行而得到硬化性聚倍半矽氧烷化合物(4)、及硬化性組合物(4)。(Example 4) A curable polysilsesquioxane compound (4) and curable combination were obtained in the same manner as in Example 1, except that the stirring time after adding the mixed solution of 28% ammonia and propyl acetate was changed to 50 minutes物(4).

(實施例5) 除了將添加28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更成為40分鐘以外,係與實施例1同樣地進行而得到硬化性聚倍半矽氧烷化合物(5)、及硬化性組合物(5)。(Example 5) A curable polysilsesquioxane compound (5) and curable combination were obtained in the same manner as in Example 1, except that the stirring time after adding the mixed solution of 28% ammonia and propyl acetate was changed to 40 minutes物(5).

(比較例1) 依照WO2017/110948號之實施例8的方法而得到硬化性聚倍半矽氧烷化合物(6)。 其次,在硬化性聚倍半矽氧烷化合物(6)100份,添加平均一次粒徑為7nm的氧化矽填料20份、平均一次粒徑為0.8μm的聚矽氧填料10份。而且,添加作為溶劑之二乙二醇單丁醚乙酸酯30份之後,將全部內容物進行攪拌。 使用三輥磨機進行分散處理後,添加1,3,5-N-參[3-(三甲氧矽烷基)丙基]異三聚氰酸酯10份、3-(三甲氧矽烷基)丙基琥珀酸酐3份、及使用E型黏度計在25℃、200s-1 的條件下測定時的黏度成為4.5Pa‧s之二乙二醇單丁醚乙酸酯,而且藉由將全部內容物充分地混合且除氣來得到硬化性組合物(6)。 又,在WO2017/110948號的段落(0115),係以鹽酸的使用量之方式記載「相對於矽烷化合物的合計量為0.25mol%」,但是從添加量計算時,正確為「相對於矽烷化合物的合計量為約1.6mol%」。在以下的比較例2、3亦同樣。(Comparative Example 1) The curable polysilsesquioxane compound (6) was obtained in accordance with the method of Example 8 of WO2017/110948. Next, to 100 parts of the curable polysilsesquioxane compound (6), 20 parts of a silica filler having an average primary particle size of 7 nm and 10 parts of a polysiloxane filler having an average primary particle size of 0.8 μm were added. And after adding 30 parts of diethylene glycol monobutyl ether acetate as a solvent, the whole content was stirred. After dispersing treatment using a three-roll mill, add 10 parts of 1,3,5-N-parameter [3-(trimethoxysilyl)propyl] isocyanurate and 3-(trimethoxysilyl) propyl 3 parts of base succinic anhydride, and the viscosity when measured under the conditions of 25°C and 200s -1 with an E-type viscometer becomes 4.5 Pa‧s of diethylene glycol monobutyl ether acetate, and the entire content is The hardenable composition (6) was obtained by thoroughly mixing and degassing. In addition, in the paragraph (0115) of WO2017/110948, the amount of hydrochloric acid used is described as "0.25 mol% relative to the total amount of the silane compound", but when calculated from the added amount, it is correct as "relative to the silane compound The total amount of is about 1.6mol%". The same applies to Comparative Examples 2 and 3 below.

(比較例2) 依照WO2017/110948號之實施例9的方法而得到硬化性聚倍半矽氧烷化合物(7)。 其次,使用與比較例1同樣的方法來得到硬化性組合物(7)。(Comparative example 2) The curable polysilsesquioxane compound (7) was obtained according to the method of Example 9 of WO2017/110948. Next, the same method as in Comparative Example 1 was used to obtain a curable composition (7).

(比較例3) 依照WO2017/110948號之實施例10的方法而得到硬化性聚倍半矽氧烷化合物(8)。 其次,使用與比較例1同樣的方法來得到硬化性組合物(8)。(Comparative example 3) The curable polysilsesquioxane compound (8) was obtained according to the method of Example 10 of WO2017/110948. Next, the same method as in Comparative Example 1 was used to obtain a curable composition (8).

(比較例4) 在300mL的茄子型燒瓶添加甲基三乙氧基矽烷71.37g(400mmol)後,將其邊攪拌邊添加將35%鹽酸0.1g(相對於矽烷化合物的合計量為0.25mol%)溶解在蒸餾水21.6g而得到的水溶液,將全部內容物在30℃攪拌2小時,其次升溫至70℃攪拌5小時。 邊繼續攪拌內容物,邊在此添加乙酸丙酯140g、及28%氨水0.12g(相對於矽烷化合物的合計量,NH3 為0.5mol%)且在70℃攪拌3小時。 將反應液冷卻至室溫為止後,使用純化水將有機層洗淨至水層的pH成為7為止。 藉由使用蒸發器將有機層濃縮且將濃縮物進行真空乾燥,來得到硬化性聚倍半矽氧烷化合物(9)。 其次,使用與實施例1同樣的來得到硬化性組合物(9)。(Comparative Example 4) After adding 71.37 g (400 mmol) of methyltriethoxysilane to a 300 mL eggplant-type flask, adding 0.1 g of 35% hydrochloric acid (relative to the total amount of the silane compound is 0.25 mol%) while stirring. ) An aqueous solution obtained by dissolving 21.6 g of distilled water, and stirring the entire content at 30°C for 2 hours, and then raising the temperature to 70°C and stirring for 5 hours. While continuing to stir the contents, 140 g of propyl acetate and 0.12 g of 28% ammonia water (with respect to the total amount of the silane compound, NH 3 is 0.5 mol%) were added here, and the mixture was stirred at 70° C. for 3 hours. After cooling the reaction liquid to room temperature, the organic layer was washed with purified water until the pH of the water layer reached 7. The organic layer was concentrated using an evaporator and the concentrate was vacuum dried to obtain a curable polysilsesquioxane compound (9). Next, the same procedure as in Example 1 was used to obtain a curable composition (9).

(比較例5) 除了將添加28%氨水與乙酸丙酯的混合溶液後的攪拌時間變更成為240分鐘以外,係與實施例1同樣地進行而得到硬化性聚倍半矽氧烷化合物(10)、及硬化性組合物(10)。(Comparative Example 5) A curable polysilsesquioxane compound (10) and curable combination were obtained in the same manner as in Example 1, except that the stirring time after adding the mixed solution of 28% ammonia and propyl acetate was changed to 240 minutes物(10).

使用實施例、及比較例所得到的硬化性聚倍半矽氧烷化合物(1)~(10)、及硬化性組合物(1)~(10),各自進行以下的測定、試驗。將結果顯示在表1。Using the curable polysilsesquioxane compounds (1) to (10) and curable compositions (1) to (10) obtained in the examples and comparative examples, the following measurements and tests were performed, respectively. The results are shown in Table 1.

[質量平均分子量測定] 硬化性聚倍半矽氧烷化合物的質量平均分子量(Mw)係在以下的裝置及條件下進行測定。 裝置名:HLC-8220GPC、TOSOH股份公司製 管柱:依次將TSKgel GMHXL、TSKgelGMHXL、及TSKgel2000HXL連結而成 溶劑:四氫呋喃 標準物質:聚苯乙烯 注入量:20μl 測定溫度:40℃ 流速:0.6ml/分鐘 檢測器:差示折射計[Determination of mass average molecular weight] The mass average molecular weight (Mw) of the curable polysilsesquioxane compound is measured under the following equipment and conditions. Device name: HLC-8220GPC, TOSOH Corporation Column: Connect TSKgel GMHXL, TSKgelGMHXL, and TSKgel2000HXL in sequence Solvent: Tetrahydrofuran Standard material: Polystyrene Injection volume: 20μl Measuring temperature: 40℃ Flow rate: 0.6ml/min Detector: differential refractometer

[29 Si-NMR測定] 裝置:Bruker BioSpin公司製 AV-50029 Si-NMR共振頻率:99.352MHz 探測器:5mmϕ溶液探測器 測定溫度:室溫(25℃) 試料轉數:20kHz 測定法:反門控去偶法(inverse gated decoupling method)29 Si 偏折角(flip angle):90°29 Si 90°脈衝寬度:8.0μs 重複時間:5s 累計次數:9200次 觀測寬度:30kHz[ 29 Si-NMR measurement] Apparatus: AV-500 29 Si-NMR manufactured by Bruker BioSpin Co., Ltd. Resonance frequency: 99.352MHz Detector: 5mmϕ solution detector Measuring temperature: Room temperature (25°C) Sample revolution: 20kHz Measuring method: reverse Inverse gated decoupling method 29 Si Flip angle: 90° 29 Si 90° Pulse width: 8.0μs Repetition time: 5s Cumulative times: 9200 times Observation width: 30kHz

>29 Si-NMR試料製造方法> 為了緩和時間縮短,係添加Fe(acac)3 作為緩和試藥且測定。 聚倍半矽氧烷濃度:15% Fe(acac)3 濃度:0.6% 測定溶劑:丙酮 內部標準:TMS> 29 Si-NMR sample manufacturing method> In order to shorten the relaxation time, Fe(acac) 3 was added as a relaxation reagent and measured. Polysilsesquioxane concentration: 15% Fe(acac) 3 concentration: 0.6% Measurement solvent: Acetone Internal standard: TMS

>波形處理解析> 針對傅立葉轉換(Fourier transformation)後的光譜之各尖峰,依照峰頂的位置而求取化學位移且進行積分。>Waveform processing analysis> For each peak of the spectrum after Fourier transformation, the chemical shift is obtained and integrated according to the position of the peak top.

[折射率測定] 將硬化性組合物吐出至水平面上,藉由使其在25℃壓黏筆式折射計(ATAGO公司製、PEN-RI)的測定面而測定折射率(nD)。[Measurement of refractive index] The curable composition was discharged on a horizontal surface, and the refractive index (nD) was measured by pressing the measurement surface of a pen-type refractometer (manufactured by ATAGO, PEN-RI) at 25°C.

[硬化性評價] 使用流變計(Anton Paar公司製、MCR302)且使用20mm的平行板在試驗起始溫度80℃、升溫速度5℃/分鐘、剪切應變1%、頻率1Hz的條件下測定剪切應力。將剪切應力成為2000Pa之溫度設為硬化溫度。[Sclerosis Evaluation] Using a rheometer (manufactured by Anton Paar, MCR302) and using a 20 mm parallel plate, the shear stress was measured under the conditions of a test starting temperature of 80°C, a heating rate of 5°C/min, a shear strain of 1%, and a frequency of 1 Hz. The temperature at which the shear stress becomes 2000 Pa is the hardening temperature.

[黏度評價] 使用流變計(Anton Paar公司製、MCR301)且使用半徑50mm、錐角0.5°的圓錐/平板(cone and plate),各自測定在25℃、剪切速度為2s-1 、及剪切速度為200s-1 的黏度。從所得到的測定值求取觸變指數(剪切速度為2s-1 的黏度/剪切速度為200s-1 的黏度)。[Viscosity evaluation] A rheometer (manufactured by Anton Paar, MCR301) was used, and a cone and plate with a radius of 50 mm and a cone angle of 0.5° were used, and each was measured at 25° C., a shear rate of 2 s -1 , and The shear rate is 200s -1 viscosity. The thixotropy index (viscosity at a shear rate of 2 s -1 /viscosity at a shear rate of 200 s -1 ) was calculated from the obtained measured values.

[接著強度測定] 將硬化性組合物以各自厚度為約2μm之方式塗佈在一邊為2mm的正方形(面積為4mm2 )的矽晶片之鏡面上,使塗佈面載置在被接著物(鍍銀銅板)上且壓黏。隨後,在170℃進行加熱處理2小時且硬化而得到附有試片的被接著物。將該附有試片的被接著物放置在預先在預定溫度(23℃、100℃)加熱之黏結強度試驗機(Dage公司製、Series 4000)的測定載物台上30秒鐘,而且從被接著物起100μm的高度之位置,以速度200um/s對接著面於水平方法(剪切方向)施加應力,來測定在23℃及100℃之試片與被接著物的接著強度(N/4mm2 )。[Measurement of Adhesive Strength] The curable composition was applied to the mirror surface of a square (4mm 2 ) silicon wafer with a side of 2mm in thickness of about 2μm, and the coated surface was placed on the substrate ( Silver-plated copper plate) and pressure-bonded. Subsequently, heat treatment was performed at 170° C. for 2 hours and cured to obtain a substrate with a test piece. The substrate with the test piece was placed on the measuring stage of a bonding strength tester (manufactured by Dage Corporation, Series 4000) heated in advance at a predetermined temperature (23°C, 100°C) for 30 seconds, and the substrate Then, at a height of 100μm from the object, apply stress to the adhesive surface in a horizontal method (shear direction) at a speed of 200um/s to measure the adhesive strength between the test piece and the substrate at 23℃ and 100℃ (N/4mm 2 ).

[耐龜裂性評價] 將硬化性組合物以各自厚度為約2μm之方式塗佈在一邊為0.5mm的正方形(面積為0.25mm2 )的矽晶片之鏡面上,使塗佈面載置在被接著物(鍍銀銅板)上且壓黏。隨後,在170℃進行加熱處理2小時且硬化而得到附有試片的被接著物。使用數位顯微鏡(VHX-1000、KEYENCE製)且觀察從玻璃晶片擠出之樹脂部(圓角(fillet)部),而且計算具有龜裂之試樣的數目,將龜裂產生率為0%以上且小於25%評定為「A」,將25%以上且小於50%評定為「B」,將50%以上至100%評定為「C」。[Crack resistance evaluation] The curable composition was applied to the mirror surface of a square (area of 0.25 mm 2 ) silicon wafer with a thickness of about 2 μm each with a thickness of 0.5 mm, and the coated surface was placed on On the substrate (silver-plated copper plate) and pressure-bonded. Subsequently, heat treatment was performed at 170° C. for 2 hours and cured to obtain a substrate with a test piece. Use a digital microscope (VHX-1000, manufactured by KEYENCE) to observe the resin part (fillet part) extruded from the glass wafer, and calculate the number of samples with cracks, and the crack generation rate is 0% or more And less than 25% is evaluated as "A", 25% and less than 50% are evaluated as "B", and 50% to 100% is evaluated as "C".

[耐剝離性評價] 將硬化性組合物以0.4mmϕ左右塗佈在LED導線框架(益能達(ENOMOTO)公司製、5050D/G PKG LEADFRAME)上,而且壓黏在一邊為0.5mm之正方形(面積為0.25mm2 )的藍寶石晶片。隨後,在170℃加熱處理2小時使其硬化之後,將密封劑(信越化學工業公司製、LPS-3419)流入杯內,在120℃加熱1小時且在150℃加熱1小時而得到試片。 將該試片曝露在85℃、85%RH的環境168小時之後,藉由預熱160℃且最高溫度成為260℃之加熱時間1分鐘的IR回流(回流爐:相模理工公司製、製品名「WL-15-20DNX型」)進行處理。隨後,使用熱循環試驗機,將在-40℃及+100℃各放置30分鐘之試驗設為1循環且實施500循環。隨後,進行將密封劑除去操作且調查此時元件是否一起剝落。針對各硬化性組合物各自進行該試驗100次。計算元件一起剝落之次數,剝離產生率為25%以下時評定為「A」,大於25%且50%以下時評定為「B」,大於50%時評定為「C」。[Evaluation of resistance to peeling] The curable composition was coated on an LED lead frame (made by ENOMOTO, 5050D/G PKG LEADFRAME) at a thickness of about 0.4mmϕ, and pressure-bonded to a 0.5mm square ( A sapphire wafer with an area of 0.25mm 2 ). Then, after heat treatment at 170°C for 2 hours to harden, a sealant (manufactured by Shin-Etsu Chemical Co., Ltd., LPS-3419) was poured into the cup and heated at 120°C for 1 hour and at 150°C for 1 hour to obtain a test piece. After exposing the test piece to an environment of 85°C and 85% RH for 168 hours, it was preheated at 160°C and the maximum temperature was 260°C with a heating time of 1 minute IR reflow (reflow oven: manufactured by Sagami Riko Co., product name " WL-15-20DNX type") for processing. Subsequently, a thermal cycle tester was used to set the test at -40°C and +100°C for 30 minutes each as 1 cycle and implement 500 cycles. Subsequently, the sealant removal operation was performed and it was investigated whether the components were peeled off together at this time. This test was performed 100 times for each curable composition. Count the number of times that the components peel off together. If the peel generation rate is less than 25%, it is evaluated as "A", if it is greater than 25% and less than 50%, it is evaluated as "B", and if it is greater than 50%, it is evaluated as "C".

[表1]   硬化性聚倍半矽氧烷化合物 硬化性組合物 硬化物 含F原子的 單體之比率 [添加量] 質量平均 分子量 [Mw] 29 Si-NMR測定 折射率 硬化性 [硬化溫度] 黏度評價 [觸變指數] 接著強度 (N/4mm2 ) 耐龜裂性 耐剝離性 Z2值 Z3值 23℃ 100℃ 實施例1 30mol% 5900 28% 70% 1.425 186℃ 4.2 140.2 72.5 A A 實施例2 30mol% 7100 25% 73% 1.424 189℃ 3.8 143.7 74.3 A A 實施例3 30mol% 6500 28% 71% 1.425 186℃ 4.3 135.0 66.2 A A 實施例4 30mol% 5800 27% 71% 1.424 191℃ 4.3 127.4 70.9 A A 實施例5 30mol% 5500 27% 71% 1.424 193℃ 4.7 134.1 72.5 A A 比較例1 30mol% 3500 16% 84% 1.416 204℃ 4.5 115 85 A A 比較例2 20mol% 4600 16% 84% 1.421 203℃ 5.1 110 86 A A 比較例3 10mol% 5300 17% 83% 1.423 203℃ 4.2 118 88 A A 比較例4 0mol% 9500 17% 83% 1.435 202℃ 5.1 136 90 A A 比較例5 30mol% 13000 20% 79% 1.423 200℃ 3.8 88.8 55.9 A A [Table 1] Curing polysilsesquioxane compound Hardening composition Hardening Ratio of monomers containing F atoms [addition amount] Mass average molecular weight [Mw] 29 Si-NMR measurement Refractive index Hardening [hardening temperature] Viscosity evaluation [thixotropy index] Adhesion strength (N/4mm 2 ) Crack resistance Peel resistance Z2 value Z3 value 23℃ 100℃ Example 1 30mol% 5900 28% 70% 1.425 186°C 4.2 140.2 72.5 A A Example 2 30mol% 7100 25% 73% 1.424 189°C 3.8 143.7 74.3 A A Example 3 30mol% 6500 28% 71% 1.425 186°C 4.3 135.0 66.2 A A Example 4 30mol% 5800 27% 71% 1.424 191°C 4.3 127.4 70.9 A A Example 5 30mol% 5500 27% 71% 1.424 193°C 4.7 134.1 72.5 A A Comparative example 1 30mol% 3500 16% 84% 1.416 204°C 4.5 115 85 A A Comparative example 2 20mol% 4600 16% 84% 1.421 203°C 5.1 110 86 A A Comparative example 3 10mol% 5300 17% 83% 1.423 203°C 4.2 118 88 A A Comparative example 4 0mol% 9500 17% 83% 1.435 202°C 5.1 136 90 A A Comparative example 5 30mol% 13000 20% 79% 1.423 200°C 3.8 88.8 55.9 A A

從表1得知以下情形。得知以實施例1~5所得到的硬化性聚倍半矽氧烷化合物(1)~(5),29 Si-NMR測定的結果係Z2的值在20~40%的範圍內。又,硬化性聚倍半矽氧烷化合物(1)~(5)的質量平均分子量係任一者均在4000~11000的範圍內。 含有該等硬化性聚倍半矽氧烷化合物之硬化性組合物(1)~(5)係折射率(nD)為較低且在較低的溫度充分地硬化。又,硬化性組合物(1)~(5)的硬化物之接著強度為較高。From Table 1, the following situations are known. It was found that the curable polysilsesquioxane compounds (1) to (5) obtained in Examples 1 to 5 were measured by 29 Si-NMR and the value of Z2 was in the range of 20 to 40%. In addition, any of the mass average molecular weights of the curable polysilsesquioxane compounds (1) to (5) is in the range of 4000 to 11000. The curable compositions (1) to (5) containing these curable polysilsesquioxane compounds have a low refractive index (nD) and are fully cured at a relatively low temperature. In addition, the adhesive strength of the cured products of the curable compositions (1) to (5) is relatively high.

另一方面,比較例1~3係各自使用專利文獻4之實施例8~10的硬化性聚倍半矽氧烷化合物(硬化性聚倍半矽氧烷化合物(6)~(8)之物。 在專利文獻4的實施例,為了補足具有氟烷基之矽烷化合物的反應性較低而使用多量的酸觸媒。但是在該方法,係只能夠得到Z2值較小的硬化性聚倍半矽氧烷化合物。又,依照3,3,3-三氟丙基三甲氧基矽烷的添加量增加,硬化性聚倍半矽氧烷化合物的質量平均分子量降低。 由於該等原因,相較於實施例1~5的硬化性組合物(1)~(5),比較例1~3的硬化性組合物(6)~(8)係在硬化性、硬化物的接著強度為較差。On the other hand, Comparative Examples 1 to 3 use the curable polysilsesquioxane compounds of Examples 8 to 10 in Patent Document 4 (curable polysilsesquioxane compounds (6) to (8)). . In the example of Patent Document 4, a large amount of acid catalyst is used in order to supplement the low reactivity of the silane compound having a fluoroalkyl group. However, in this method, only curable polysilsesquioxane compounds with a small Z2 value can be obtained. Furthermore, as the addition amount of 3,3,3-trifluoropropyltrimethoxysilane increases, the mass average molecular weight of the curable polysilsesquioxane compound decreases. For these reasons, compared with the curable compositions (1) to (5) of Examples 1 to 5, the curable compositions (6) to (8) of Comparative Examples 1 to 3 are based on curable and hardened compositions. The bonding strength is poor.

比較例4所得到的硬化性聚倍半矽氧烷化合物(9),係不具有源自3,3,3-三氟丙基三甲氧基矽烷的重複單元。 因此,硬化性組合物(9)的折射率(nD)係成為較大的值。又,因為硬化性聚倍半矽氧烷化合物(9)之Z2值較小,所以硬化性組合物(9)的硬化性不充分。The curable polysilsesquioxane compound (9) obtained in Comparative Example 4 does not have a repeating unit derived from 3,3,3-trifluoropropyltrimethoxysilane. Therefore, the refractive index (nD) of the curable composition (9) becomes a large value. In addition, since the Z2 value of the curable polysilsesquioxane compound (9) is small, the curable composition (9) has insufficient curability.

比較例5所得到的硬化性聚倍半矽氧烷化合物(10),係分子量太大之物。該結果,相較於實施例1~5的硬化性組合物(1)~(5),硬化性組合物(10)係在硬化性、硬化物的接著強度為較差。The curable polysilsesquioxane compound (10) obtained in Comparative Example 5 has a too large molecular weight. As a result, compared with the curable compositions (1) to (5) of Examples 1 to 5, the curable composition (10) is inferior in curability and adhesive strength of the cured product.

無。no.

無。no.

Figure 108135111-A0101-11-0001-2
Figure 108135111-A0101-11-0001-2

Claims (13)

一種硬化性聚倍半矽氧烷化合物,係具有下述式(a-1)所示的重複單元之硬化性聚倍半矽氧烷化合物,其特徵在於:滿足下述必要條件1及必要條件2,
Figure 03_image001
[R1 表示組成式:Cm H(2m-n+1) Fn 所表示之氟烷基,m表示為1~10的整數,n表示為2以上且(2m+1)以下的整數,D表示將R1 與Si鍵結之連結基(但是伸烷基除外)或單鍵], [必要條件1] 測定硬化性聚倍半矽氧烷化合物的29 Si-NMR時,能夠在-62ppm以上且小於-52ppm的區域[區域(2)]觀測到1或2個以上的尖峰,能夠在-52ppm以上且小於-45ppm的區域[區域(1)]及-73ppm以上且小於-62ppm的區域[區域(3)]之至少一區域觀測到1或2個以上的尖峰,而且下述式導出之Z2為20~40%,
Figure 03_image004
P1:在區域(1)之積分值 P2:在區域(2)之積分值 P3:在區域(3)之積分值 [必要條件2] 硬化性聚倍半矽氧烷化合物的質量平均分子量(Mw)為4,000~11,000。
A curable polysilsesquioxane compound, a curable polysilsesquioxane compound having a repeating unit represented by the following formula (a-1), characterized in that it satisfies the following requirements 1 and requirements 2,
Figure 03_image001
[R 1 represents the composition formula: C m H (2m-n+1) fluoroalkyl group represented by F n , m represents an integer from 1 to 10, and n represents an integer from 2 to (2m+1), D represents the linking group (except the alkylene group) or the single bond that connects R 1 to Si. [Requirement 1] When measuring 29 Si-NMR of the curable polysilsesquioxane compound, it can be -62ppm 1 or more peaks are observed in the region above and below -52ppm [region (2)], and can be in the region above -52ppm and below -45ppm [region (1)] and region above -73ppm but below -62ppm [Area (3)] At least one area has 1 or 2 sharp peaks observed, and Z2 derived from the following formula is 20-40%,
Figure 03_image004
P1: Integral value in area (1) P2: Integral value in area (2) P3: Integral value in area (3) [Required Condition 2] Mass average molecular weight of curable polysilsesquioxane compound (Mw ) Is 4,000~11,000.
如請求項1所述之硬化性聚倍半矽氧烷化合物,其中式(a-1)所示之重複單元比率係相對於總重複單元為25mol%以上。The curable polysilsesquioxane compound according to claim 1, wherein the ratio of the repeating unit represented by the formula (a-1) is 25 mol% or more with respect to the total repeating unit. 如請求項1所述之硬化性聚倍半矽氧烷化合物,其中進一步具有下述式(a-2)所示之重複單元,
Figure 03_image021
[R2 表示未取代之碳數1~10的烷基、或具有取代基、或未取代之碳數6~12的芳基]。
The curable polysilsesquioxane compound according to claim 1, which further has a repeating unit represented by the following formula (a-2),
Figure 03_image021
[R 2 represents an unsubstituted alkyl group having 1 to 10 carbons, or a substituted or unsubstituted aryl group having 6 to 12 carbons].
如請求項3所述之硬化性聚倍半矽氧烷化合物,其中式(a-2)所示之重複單元比率係相對於總重複單元為大於0mol%且75mol%以下。The curable polysilsesquioxane compound according to claim 3, wherein the ratio of the repeating unit represented by the formula (a-2) is greater than 0 mol% and 75 mol% or less with respect to the total repeating units. 如請求項1所述之硬化性聚倍半矽氧烷化合物,其中測定29 Si-NMR時,能夠在區域(3)觀測到1或2個以上的尖峰且下述式所導出的Z3為60~80%,
Figure 03_image008
The curable polysilsesquioxane compound described in claim 1, wherein when 29 Si-NMR is measured, 1 or more peaks can be observed in the region (3) and Z3 derived from the following formula is 60 ~80%,
Figure 03_image008
.
一種硬化性組合物,其特徵在於含有下述(A)成分、及具有254℃以上的沸點之溶劑, (A)成分:如請求項1至5中任一項所述之硬化性聚倍半矽氧烷化合物。A curable composition characterized by containing the following (A) component and a solvent having a boiling point of 254°C or higher, (A) Component: The curable polysilsesquioxane compound according to any one of claims 1 to 5. 如請求項6所述之硬化性組合物,係進一步含有下述(B)成分, (B)成分:在分子內具有氮原子之矽烷偶合劑。The curable composition according to claim 6, which further contains the following (B) component, (B) Component: Silane coupling agent with nitrogen atom in the molecule. 如請求項6所述之硬化性組合物,係進一步含有下述(C)成分, (C)成分:在分子內具有酸酐結構之矽烷偶合劑。The curable composition according to claim 6, which further contains the following (C) component, (C) Component: Silane coupling agent with acid anhydride structure in the molecule. 如請求項6所述之硬化性組合物,係進一步含有下述(D), (D)成分:平均一次粒徑為5~40nm的微粒。The curable composition according to claim 6, which further contains the following (D), (D) Component: Fine particles with an average primary particle size of 5-40 nm. 一種硬化物,係將如請求項6至9中任一項所述之硬化性組合物硬化而得到。A hardened product obtained by hardening the hardenable composition according to any one of claims 6 to 9. 如請求項10項所述之硬化物,係光學元件固定材。The cured product described in claim 10 is an optical element fixing material. 一種方法,係將如請求項6至9中任一項所述之硬化性組合物使用作為光學元件固定材用接著劑。A method is to use the curable composition according to any one of claims 6 to 9 as an adhesive for fixing an optical element. 一種方法,係將如請求項6至9中任一項所述之硬化性組合物使用作為光學元件固定材用密封劑。A method is to use the curable composition according to any one of claims 6 to 9 as a sealant for an optical element fixing material.
TW108135111A 2018-09-28 2019-09-27 Curable polysilsesquioxane compound, curable composition, cured product and method of using the curable composition TWI831839B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018183181 2018-09-28
JP2018-183181 2018-09-28

Publications (2)

Publication Number Publication Date
TW202031739A true TW202031739A (en) 2020-09-01
TWI831839B TWI831839B (en) 2024-02-11

Family

ID=69952791

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108135111A TWI831839B (en) 2018-09-28 2019-09-27 Curable polysilsesquioxane compound, curable composition, cured product and method of using the curable composition

Country Status (5)

Country Link
JP (1) JP6830563B2 (en)
KR (1) KR20210066800A (en)
CN (1) CN112739748B (en)
TW (1) TWI831839B (en)
WO (1) WO2020067451A1 (en)

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5026813A (en) * 1989-12-27 1991-06-25 General Electric Company Polysilsequioxane and polymethyl-N-hexylsilsesquioxane coating compositions
JP4205368B2 (en) * 2002-06-11 2009-01-07 株式会社Adeka Curable composition for optical materials
CN100451070C (en) * 2003-04-07 2009-01-14 陶氏康宁公司 Curable organopolysiloxane resin composition for optical transmission components, optical transmission components, and fabrication process thereof
JP4734832B2 (en) 2003-05-14 2011-07-27 ナガセケムテックス株式会社 Encapsulant for optical element
JP2005263869A (en) 2004-03-16 2005-09-29 Nagase Chemtex Corp Resin composition for sealing optical semiconductor
JP2006328231A (en) 2005-05-26 2006-12-07 Nagase Chemtex Corp Resin composition for encapsulating optical element
US8507044B2 (en) * 2008-02-14 2013-08-13 Lintec Corporation Molding material composed of polyorganosiloxane compound, sealing material, and sealed optical device
CN102190956B (en) * 2010-03-11 2013-08-28 财团法人工业技术研究院 Antireflection coating material and antireflection film containing same
JP2012116990A (en) * 2010-12-02 2012-06-21 Seiko Instruments Inc Composition for sealant, and light-emitting device and solar cell module using the composition for sealant
KR101983423B1 (en) * 2012-03-23 2019-09-10 린텍 가부시키가이샤 Curable composition, cured product, and method for using curable composition
TWI700314B (en) * 2014-05-07 2020-08-01 日商琳得科股份有限公司 Curable polysilsesquioxane compound, its manufacturing method, curing composition, curing product, curing composition, etc. use method
JP6534034B2 (en) * 2014-05-14 2019-06-26 学校法人神奈川大学 Curable composition, method for producing cured product using the same and method for re-dissolving the same
US10308850B2 (en) * 2014-07-23 2019-06-04 Lintec Corporation Curable composition, method for manufacturing curable composition, cured product, method for using curable composition, and optical device
KR102672356B1 (en) 2015-12-22 2024-06-04 린텍 가부시키가이샤 Curable composition, method of producing the curable composition, cured product, method of using the curable composition, and optical device
JPWO2018110550A1 (en) * 2016-12-15 2019-10-24 ナガセケムテックス株式会社 Thermosetting resin composition, photocurable resin composition, cured product and heat resistance improver
JP2018178003A (en) * 2017-04-17 2018-11-15 株式会社ダイセル Fluorine-containing epoxy-modified silsesquioxane and curable composition containing the same

Also Published As

Publication number Publication date
TWI831839B (en) 2024-02-11
JPWO2020067451A1 (en) 2021-02-15
WO2020067451A1 (en) 2020-04-02
CN112739748A (en) 2021-04-30
CN112739748B (en) 2022-07-12
KR20210066800A (en) 2021-06-07
JP6830563B2 (en) 2021-02-17

Similar Documents

Publication Publication Date Title
TWI663213B (en) Curable composition, method for producing curable composition, cured product, method of using curable composition, and optical device
TWI690564B (en) Curable composition, method for producing curable composition, method for using cured material, curable composition, and optical device
TWI696662B (en) Curable composition, cured product, method of using curable composition, and optical device
TWI815979B (en) Curable composition, cured product and method of using curable composition
JP2018168286A (en) Optical element adhesive and method for producing the same
TWI735496B (en) Curable composition, production method of curable composition, cured product and use method of curable composition
TWI825299B (en) Curable composition, cured product and method of using curable composition
TWI831839B (en) Curable polysilsesquioxane compound, curable composition, cured product and method of using the curable composition
TWI660010B (en) Curable composition, cured product, method of using curable composition, and optical device
TWI810371B (en) Curable composition, hardened product, and method of using the curable composition
TWI846961B (en) Curable composition, cured product, and method of using the curable composition
TW202118832A (en) Curable composition, cured product, and method for using curable composition
TW202043370A (en) Curable composition, cured product, and method for using curable composition
TWI660009B (en) Curable composition, cured product, method of using curable composition, and optical device
TW202142605A (en) Curable composition, cured product, and method for using curable composition
JP2020158609A (en) Curable composition, cured product and method for using curable composition
JP2024136511A (en) Silane compound polymer, thermosetting composition, semiconductor element fixing composition, and cured product