TWI846961B - Curable composition, cured product, and method of using the curable composition - Google Patents
Curable composition, cured product, and method of using the curable composition Download PDFInfo
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- TWI846961B TWI846961B TW109133642A TW109133642A TWI846961B TW I846961 B TWI846961 B TW I846961B TW 109133642 A TW109133642 A TW 109133642A TW 109133642 A TW109133642 A TW 109133642A TW I846961 B TWI846961 B TW I846961B
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- curable composition
- component
- repeating unit
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- carbon atoms
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- 239000000203 mixture Substances 0.000 title claims abstract description 141
- 238000000034 method Methods 0.000 title claims abstract description 30
- 150000001875 compounds Chemical class 0.000 claims abstract description 110
- 229920000734 polysilsesquioxane polymer Polymers 0.000 claims abstract description 91
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 57
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 50
- 230000003287 optical effect Effects 0.000 claims abstract description 49
- 239000000463 material Substances 0.000 claims abstract description 47
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 30
- 125000003118 aryl group Chemical group 0.000 claims abstract description 23
- 239000000853 adhesive Substances 0.000 claims abstract description 18
- 230000001070 adhesive effect Effects 0.000 claims abstract description 18
- 239000003566 sealing material Substances 0.000 claims abstract description 11
- 125000000547 substituted alkyl group Chemical group 0.000 claims abstract description 4
- 125000003107 substituted aryl group Chemical group 0.000 claims abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000007787 solid Substances 0.000 claims description 15
- 239000011859 microparticle Substances 0.000 claims description 12
- 150000008065 acid anhydrides Chemical group 0.000 claims description 9
- 239000003085 diluting agent Substances 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 239000011164 primary particle Substances 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- -1 n-octyl Chemical group 0.000 description 44
- 239000000047 product Substances 0.000 description 31
- 150000004756 silanes Chemical class 0.000 description 29
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 19
- 125000001424 substituent group Chemical group 0.000 description 19
- 229910000077 silane Inorganic materials 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 17
- 229910052799 carbon Inorganic materials 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000001723 curing Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000003963 antioxidant agent Substances 0.000 description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000006467 substitution reaction Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 5
- 239000003377 acid catalyst Substances 0.000 description 5
- 150000008064 anhydrides Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000013007 heat curing Methods 0.000 description 5
- 239000004611 light stabiliser Substances 0.000 description 5
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 5
- 229940090181 propyl acetate Drugs 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 4
- 239000004202 carbamide Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZADOWCXTUZWAKL-UHFFFAOYSA-N 3-(3-trimethoxysilylpropyl)oxolane-2,5-dione Chemical compound CO[Si](OC)(OC)CCCC1CC(=O)OC1=O ZADOWCXTUZWAKL-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005370 alkoxysilyl group Chemical group 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 3
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 2
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 2
- 239000000920 calcium hydroxide Substances 0.000 description 2
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- LZKLAOYSENRNKR-LNTINUHCSA-N iron;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Fe].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O LZKLAOYSENRNKR-LNTINUHCSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 150000002605 large molecules Chemical class 0.000 description 2
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- AFILDYMJSTXBAR-UHFFFAOYSA-N (4-chlorophenyl)-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(Cl)C=C1 AFILDYMJSTXBAR-UHFFFAOYSA-N 0.000 description 1
- SWYZNMNIUXTWTF-UHFFFAOYSA-N (4-chlorophenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(Cl)C=C1 SWYZNMNIUXTWTF-UHFFFAOYSA-N 0.000 description 1
- HOBIHBQJHORMMP-UHFFFAOYSA-N 1,3-bis(3-triethoxysilylpropyl)urea Chemical compound CCO[Si](OCC)(OCC)CCCNC(=O)NCCC[Si](OCC)(OCC)OCC HOBIHBQJHORMMP-UHFFFAOYSA-N 0.000 description 1
- HSDGFGSXXVWDET-UHFFFAOYSA-N 1,3-bis(3-trimethoxysilylpropyl)urea Chemical compound CO[Si](OC)(OC)CCCNC(=O)NCCC[Si](OC)(OC)OC HSDGFGSXXVWDET-UHFFFAOYSA-N 0.000 description 1
- HIWIFPQPDHAOQH-UHFFFAOYSA-N 2,2-dichloroethoxy(phenyl)silane Chemical compound ClC(Cl)CO[SiH2]C1=CC=CC=C1 HIWIFPQPDHAOQH-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 description 1
- WRBRIRNGWAUZRF-UHFFFAOYSA-N 2-methyl-2-[(2-methylpropan-2-yl)oxy]propane;sodium Chemical compound [Na].CC(C)(C)OC(C)(C)C WRBRIRNGWAUZRF-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- UTJOYPOMCOXHOX-UHFFFAOYSA-N 3-(2,2-dichloroethoxysilyl)propanenitrile Chemical compound C(#N)CC[SiH2]OCC(Cl)Cl UTJOYPOMCOXHOX-UHFFFAOYSA-N 0.000 description 1
- KDBDBZBZEXGFEC-UHFFFAOYSA-N 3-(2-triethoxysilylethyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCC1CC(=O)OC1=O KDBDBZBZEXGFEC-UHFFFAOYSA-N 0.000 description 1
- FKPNWRXKYQBKIH-UHFFFAOYSA-N 3-(2-trimethoxysilylethyl)oxolane-2,5-dione Chemical compound CO[Si](OC)(OC)CCC1CC(=O)OC1=O FKPNWRXKYQBKIH-UHFFFAOYSA-N 0.000 description 1
- AXVNVVDHIOPJEY-UHFFFAOYSA-N 3-(dichloromethoxysilyl)propanenitrile Chemical compound C(#N)CC[SiH2]OC(Cl)Cl AXVNVVDHIOPJEY-UHFFFAOYSA-N 0.000 description 1
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- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
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- 239000010936 titanium Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- OOXSLJBUMMHDKW-UHFFFAOYSA-N trichloro(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)Cl OOXSLJBUMMHDKW-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- ABADVTXFGWCNBV-UHFFFAOYSA-N trichloro-(4-chlorophenyl)silane Chemical compound ClC1=CC=C([Si](Cl)(Cl)Cl)C=C1 ABADVTXFGWCNBV-UHFFFAOYSA-N 0.000 description 1
- NNWMTCDMYFZDHA-UHFFFAOYSA-N trichloro-(4-methoxyphenyl)silane Chemical compound COC1=CC=C([Si](Cl)(Cl)Cl)C=C1 NNWMTCDMYFZDHA-UHFFFAOYSA-N 0.000 description 1
- WOMUGKOOLXQCTQ-UHFFFAOYSA-N trichloro-(4-methylphenyl)silane Chemical compound CC1=CC=C([Si](Cl)(Cl)Cl)C=C1 WOMUGKOOLXQCTQ-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- PADYPAQRESYCQZ-UHFFFAOYSA-N triethoxy-(4-methylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C(C)C=C1 PADYPAQRESYCQZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- QLNOVKKVHFRGMA-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical group [CH2]CC[Si](OC)(OC)OC QLNOVKKVHFRGMA-UHFFFAOYSA-N 0.000 description 1
- ZESWBFKRPIRQCD-UHFFFAOYSA-N trimethoxy-(4-methoxyphenyl)silane Chemical compound COC1=CC=C([Si](OC)(OC)OC)C=C1 ZESWBFKRPIRQCD-UHFFFAOYSA-N 0.000 description 1
- XQEGZYAXBCFSBS-UHFFFAOYSA-N trimethoxy-(4-methylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=C(C)C=C1 XQEGZYAXBCFSBS-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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Abstract
本發明係含有下述(A)成分及(C)成分的硬化性組合物,由上述硬化性組合物硬化而成的硬化物,以及將上述硬化性組合物使用為光元件固定材用黏著劑或光元件固定材用密封材的方法。本發明的硬化性組合物係折射率高,頗適用於光學領域。 (A)成分:具有下式(a-1) [R1 係表示無取代的碳數6~12之芳基、或具取代基的碳數6~12之芳基] 所示重複單元[重複單元(1)];且具有下式(a-2) [R2 係表示無取代的碳數1~10之烷基、或具取代基的碳數1~10之烷基] 所示重複單元[重複單元(2)]的聚倍半矽氧烷化合物,且滿足相關分子構造的特定要件。 (C)成分:矽烷偶合劑。The present invention is a curable composition containing the following (A) components and (C) components, a cured product formed by curing the curable composition, and a method of using the curable composition as an adhesive for optical element fixing material or a sealing material for optical element fixing material. The curable composition of the present invention has a high refractive index and is suitable for use in the optical field. (A) component: has the following formula (a-1) [R 1 represents an unsubstituted aryl group having 6 to 12 carbon atoms, or a substituted aryl group having 6 to 12 carbon atoms] a repeating unit [repeating unit (1)]; and having the following formula (a-2): A polysilsesquioxane compound having a repeating unit [repeating unit (2)] represented by [R 2 represents an unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted alkyl group having 1 to 10 carbon atoms], and satisfying the specific requirements of the relevant molecular structure. (C) Component: silane coupling agent.
Description
本發明係關於折射率高、頗適用於光學領域的硬化性組合物,由上述硬化性組合物硬化而成的硬化物;以及將上述硬化性組合物使用為光元件固定材用黏著劑或光元件固定材用密封材的方法。The present invention relates to a curable composition having a high refractive index and being suitable for use in the optical field, a cured product obtained by curing the curable composition, and a method of using the curable composition as an adhesive for an optical element fixing material or a sealing material for an optical element fixing material.
習知硬化性組合物有配合用途進行各種改良,產業上廣泛利用為光學零件與成形體的原料、黏著劑、塗佈劑等。 再者,硬化性組合物備受矚目於使用為光元件固定材用黏著劑、光元件固定材用密封材等光元件固定材用組合物。It is known that curable compositions have been improved in various ways according to their uses, and are widely used in the industry as raw materials for optical parts and molded bodies, adhesives, coatings, etc. Furthermore, curable compositions are attracting attention for use as compositions for optical component fixing materials such as adhesives for optical component fixing materials and sealing materials for optical component fixing materials.
光元件係有如:半導體雷射(LD)等各種雷射、發光二極體(LED)等發光元件、受光元件、複合光元件、光積體電路等。 近年有開發出發光尖峰波長更短波長的藍色光、白色光之光元件,且已然廣泛使用。此種發光尖峰波長較短的發光元件之高亮度化大幅進步,隨此現象會有光元件發熱量變為更大的傾向。Optical components include: various lasers such as semiconductor lasers (LD), light-emitting diodes (LEDs) and other light-emitting components, light-receiving components, composite optical components, optical integrated circuits, etc. In recent years, optical components with shorter peak wavelengths of blue light and white light have been developed and widely used. The high brightness of these light-emitting components with shorter peak wavelengths has greatly improved, and with this phenomenon, the heat generated by the optical components tends to increase.
但是,近年隨光元件的高亮度化,光元件固定材用組合物的硬化物將長時間暴露於更高能量光、由光元件所產生更高溫的熱度中,會有發生黏著力降低的問題。However, with the recent increase in the brightness of optical components, the cured optical component fixing material composition is exposed to higher energy light and higher temperature heat generated by the optical component for a long time, which may cause a problem of reduced adhesion.
為解決此項問題,專利文獻1~3有提案:以聚倍半矽氧烷化合物為主成分的光元件固定材用組合物。To solve this problem, patent documents 1 to 3 propose a composition for optical element fixing material having a polysilsesquioxane compound as a main component.
但是,當使用硬化性組合物將光元件等固定時,為提高光取出效率,有時會配合周圍構件的折射率,選擇適當折射率的硬化性組合物。 例如為抑制密封劑與固定材界面處的反射,俾提高光取出效率,最好密封劑折射率與固定材折射率之差較小。 所以,當使用具較高折射率的密封劑時,必需使用同樣具有高折射率的硬化性組合物形成固定材。 [先前技術文獻] [專利文獻]However, when using a curable composition to fix an optical element, etc., in order to improve the light extraction efficiency, a curable composition with an appropriate refractive index is sometimes selected in accordance with the refractive index of the surrounding components. For example, in order to suppress reflection at the interface between the sealant and the fixing material to improve the light extraction efficiency, it is best that the difference between the refractive index of the sealant and the fixing material is small. Therefore, when using a sealant with a higher refractive index, it is necessary to use a curable composition with a high refractive index to form the fixing material. [Prior Art Literature] [Patent Literature]
[專利文獻1] 日本專利特開2004-359933號公報 [專利文獻2] 日本專利特開2005-263869號公報 [專利文獻3] 日本專利特開2006-328231號公報[Patent Document 1] Japanese Patent Publication No. 2004-359933 [Patent Document 2] Japanese Patent Publication No. 2005-263869 [Patent Document 3] Japanese Patent Publication No. 2006-328231
(發明所欲解決之課題)(The problem that the invention wants to solve)
本發明係有鑑於上述習知技術實情而完成,目的在於提供:折射率高、頗適用於光學領域的硬化性組合物、由上述硬化性組合物硬化而成的硬化物、以及將上述硬化性組合物使用為光元件固定材用黏著劑或光元件固定材用密封材的方法。 (解決課題之手段)The present invention is made in view of the above-mentioned known technical facts, and its purpose is to provide: a curable composition with a high refractive index and suitable for use in the optical field, a cured product formed by curing the curable composition, and a method of using the curable composition as an adhesive for optical element fixing material or a sealing material for optical element fixing material. (Means for solving the problem)
本發明者等為解決上述課題,針對含有聚倍半矽氧烷化合物的硬化性組合物進行深入鑽研。 結果發現: (i)藉由聚倍半矽氧烷化合物係使用含較多芳基的聚倍半矽氧烷化合物,便可獲得高折射率的硬化性組合物; (ii)含有具較多芳基之聚倍半矽氧烷化合物的硬化性組合物,其硬化物會有發生龜裂的可能性; (iii)含有具較多芳基之聚倍半矽氧烷化合物的硬化性組合物,其硬化物會有黏著性差的傾向; (iv)藉由:調節聚倍半矽氧烷化合物中的芳基量、在聚倍半矽氧烷化合物中導入特定分子構造、以及在硬化性組合物中添加矽烷偶合劑,便可解決上述(ii)與(iii)的問題, 遂完成本發明。In order to solve the above problems, the inventors of the present invention have conducted in-depth research on curable compositions containing polysilsesquioxane compounds. The results show that: (i) By using a polysilsesquioxane compound containing a relatively high number of aromatic groups as the polysilsesquioxane compound, a high refractive index curable composition can be obtained; (ii) The curable composition containing a polysilsesquioxane compound containing a relatively high number of aromatic groups may cause cracking of the cured product; (iii) The curable composition containing a polysilsesquioxane compound containing a relatively high number of aromatic groups may cause poor adhesion of the cured product; (iv) By adjusting the amount of aromatic groups in the polysilsesquioxane compound, introducing a specific molecular structure into the polysilsesquioxane compound, and adding a silane coupling agent to the curable composition, the above problems (ii) and (iii) can be solved, and the present invention is thus completed.
緣是,根據本發明將提供:下述[1]~[7]之硬化性組合物、[8]、[9]之硬化物、及[10]、[11]之硬化性組合物的使用方法。Therefore, according to the present invention, the following curable compositions [1] to [7], cured products [8] and [9], and methods of using the curable compositions [10] and [11] are provided.
[1] 一種硬化性組合物,係含有下述(A)成分、及(C)成分: (A)成分:具有下式(a-1)[1] A curable composition comprising the following components (A) and (C): Component (A): having the following formula (a-1):
[化1] [Chemistry 1]
[R1 係表示無取代的碳數6~12之芳基、或具取代基的碳數6~12之芳基] 所示重複單元[重複單元(1)];且具有下式(a-2)[R 1 represents an unsubstituted aryl group having 6 to 12 carbon atoms, or a substituted aryl group having 6 to 12 carbon atoms] a repeating unit [repeating unit (1)]; and having the following formula (a-2):
[化2] [Chemistry 2]
[R2 係表示無取代的碳數1~10之烷基、或具取代基的碳數1~10之烷基] 所示重複單元[重複單元(2)]的聚倍半矽氧烷(polysilsesquioxane)化合物,且滿足下述要件1與要件2的聚倍半矽氧烷化合物 [要件1] 相對於重複單元(1)與重複單元(2)合計量,重複單元(1)量係40mol%以上且未滿80mol%。 [要件2] 相對於下式(a-3)所示T位點(T1位點)、下式(a-4)所示T位點(T2位點)、及下式(a-5)所示T位點(T3位點)的合計量,上述T2位點的量係20~70mol%。A polysilsesquioxane compound having a repeating unit [repeating unit (2)] represented by [ R2 represents an unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted alkyl group having 1 to 10 carbon atoms], and a polysilsesquioxane compound satisfying the following requirements 1 and 2: [Requirement 1] The amount of the repeating unit (1) is 40 mol% or more and less than 80 mol% relative to the total amount of the repeating unit (1) and the repeating unit (2). [Requirement 2] The amount of the T2 site is 20 to 70 mol% relative to the total amount of the T site (T1 site) represented by the following formula (a-3), the T site (T2 site) represented by the following formula (a-4), and the T site (T3 site) represented by the following formula (a-5).
[化3] [Chemistry 3]
[G係表示R1 或R2 所示基。R3 係表示氫原子或碳數1~10之烷基。*係鍵結著矽原子。] (C)成分:矽烷偶合劑。 [2] 如[1]所記載的硬化性組合物,其中,(A)成分的質量平均分子量(Mw)係500~25,000。 [3] 如[1]或[2]所記載的硬化性組合物,其中,(A)成分中的重複單元(1)與重複單元(2)之合計量,佔(A)成分總重複單元中之90~100mol%。 [4] [1]~[3]中任一項所記載的硬化性組合物,其中,相對於(A)成分100質量份,(C)成分含有量係0.1~70質量份。 [5] 如[1]~[4]中任一項所記載的硬化性組合物,其中,(A)成分與(C)成分的合計量,佔硬化性組合物固含量中的50~100質量%。 [6] 如[1]~[5]中任一項所記載的硬化性組合物,其中,更進一步含有稀釋劑,固含量濃度係60質量%以上且未滿100質量%。 [7] 如[1]~[6]中任一項所記載的硬化性組合物,其中,25℃折射率(nD)係1.46~1.56。 [8] 一種硬化物,係由上述[1]~[7]中任一項所記載的硬化性組合物進行硬化而獲得。 [9] 如[8]所記載的硬化物,係光元件固定材。 [10] 一種方法,係將上述[1]~[7]中任一項所記載的硬化性組合物,使用為光元件固定材用黏著劑。 [11] 一種方法,係將上述[1]~[7]中任一項所記載的硬化性組合物,使用為光元件固定材用密封材。 [對照先前技術之功效][G represents a group represented by R1 or R2 . R3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. * is bonded to a silicon atom.] Component (C): a silane coupling agent. [2] The curable composition as described in [1], wherein the mass average molecular weight (Mw) of component (A) is 500 to 25,000. [3] The curable composition as described in [1] or [2], wherein the total amount of repeating units (1) and repeating units (2) in component (A) accounts for 90 to 100 mol% of the total repeating units in component (A). [4] The curable composition as described in any one of [1] to [3], wherein the content of component (C) is 0.1 to 70 parts by mass relative to 100 parts by mass of component (A). [5] The curable composition as described in any one of [1] to [4], wherein the total amount of component (A) and component (C) accounts for 50 to 100% by weight of the solid content of the curable composition. [6] The curable composition as described in any one of [1] to [5], wherein the curable composition further contains a diluent, and the solid content concentration is greater than 60% by weight and less than 100% by weight. [7] The curable composition as described in any one of [1] to [6], wherein the refractive index (nD) at 25°C is 1.46 to 1.56. [8] A cured product obtained by curing the curable composition as described in any one of [1] to [7]. [9] The cured product as described in [8] is an optical element fixing material. [10] A method of using the curable composition described in any one of [1] to [7] as an adhesive for an optical element fixing material. [11] A method of using the curable composition described in any one of [1] to [7] as a sealing material for an optical element fixing material. [Effects of the prior art]
根據本發明可提供:折射率高、且頗適用於光學領域的硬化性組合物、由上述硬化性組合物硬化而成的硬化物、及將上述硬化性組合物使用為光元件固定材用黏著劑或光元件固定材用密封材的方法。The present invention can provide a curable composition having a high refractive index and being suitable for use in the optical field, a cured product obtained by curing the curable composition, and a method of using the curable composition as an adhesive for an optical element fixing material or a sealing material for an optical element fixing material.
以下,針對本發明依照:1)硬化性組合物、2)硬化物、及3)硬化性組合物的使用方法逐項進行詳細說明。The present invention is described in detail below in terms of: 1) the curable composition, 2) the cured product, and 3) the method of using the curable composition.
1)硬化性組合物 本發明的硬化性組合物係含有下述(A)成分與(C)成分。 (A)成分:具有上述式(a-1)所示重複單元,且具有上述式(a-2)所示重複單元的聚倍半矽氧烷化合物,特徵在於滿足上述要件1與要件2的聚倍半矽氧烷化合物[以下稱「聚倍半矽氧烷化合物(A)」] (C)成分:矽烷偶合劑1) Curable composition The curable composition of the present invention comprises the following components (A) and (C). Component (A): A polysilsesquioxane compound having a repeating unit represented by the above formula (a-1) and a repeating unit represented by the above formula (a-2), characterized in that the polysilsesquioxane compound satisfies the above requirements 1 and 2 [hereinafter referred to as "polysilsesquioxane compound (A)"] Component (C): Silane coupling agent
[(A)成分] 構成本發明硬化性組合物的聚倍半矽氧烷化合物(A),係具有下式(a-1)所示重複單元[重複單元(1)]。[Component (A)] The polysilsesquioxane compound (A) constituting the curable composition of the present invention has a repeating unit [repeating unit (1)] represented by the following formula (a-1).
[化4] [Chemistry 4]
[R1 係表示無取代的碳數6~12之芳基、或具取代基的碳數6~12之芳基。][ R1 represents an unsubstituted aryl group having 6 to 12 carbon atoms, or a substituted aryl group having 6 to 12 carbon atoms.]
因為重複單元(1)具有R1 ,因而具重複單元(1)的聚倍半矽氧烷化合物便具有較高的折射率。所以,本發明硬化性組合物便成為折射率較高者。Since the repeating unit (1) has R 1 , the polysilsesquioxane compound having the repeating unit (1) has a higher refractive index. Therefore, the curable composition of the present invention has a higher refractive index.
R1 之「無取代的碳數6~12之芳基」係可舉例如:苯基、1-萘基、2-萘基等。 R1 的「無取代的碳數6~12之芳基」之碳數較佳係6。Examples of the "unsubstituted aryl group having 6 to 12 carbon atoms" of R 1 include phenyl, 1-naphthyl, 2-naphthyl, etc. The number of carbon atoms of the "unsubstituted aryl group having 6 to 12 carbon atoms" of R 1 is preferably 6.
R1 的「具取代基的碳數6~12之芳基」,碳數較佳係6。另外,該碳數係指取代基除外部分(芳基部分)的碳數。所以,當R1 係「具取代基的碳數6~12之芳基」的情況,R1 的碳數會有超過12的情況。 R1 的「具取代基的碳數6~12之芳基」,芳基係可例如與就「無取代的碳數6~12之芳基」所例示者同樣。The carbon number of "aryl group with 6 to 12 carbon atoms and having a substituent" of R1 is preferably 6. In addition, the carbon number refers to the carbon number of the part excluding the substituent (aryl part). Therefore, when R1 is "aryl group with 6 to 12 carbon atoms and having a substituent", the carbon number of R1 may exceed 12. The aryl group of "aryl group with 6 to 12 carbon atoms and having a substituent" of R1 may be the same as exemplified for "aryl group with 6 to 12 carbon atoms and having no substituent".
R1 的「具取代基的碳數6~12之芳基」,取代基的原子數(但,氫原子數除外)通常係1~30、較佳係1~20。 R1 的「具取代基的碳數6~12之芳基」,取代基係可舉例如:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基、正庚基、正辛基、異辛基等烷基;氯原子、溴原子等鹵素原子;甲氧基、乙氧基等烷氧基等。The "aryl group having a substituent and having 6 to 12 carbon atoms" of R 1 has a substituent having an atom number of 1 to 30 (excluding hydrogen atoms) and preferably 1 to 20. The "aryl group having a substituent and having 6 to 12 carbon atoms" of R 1 includes, for example, alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, and iso-octyl; halogen atoms such as chlorine and bromine; and alkoxy groups such as methoxy and ethoxy.
該等之中,就從可效率佳調製高折射率硬化性組合物的觀點,R1 較佳係無取代的碳數6~12之芳基、更佳係苯基。Among them, from the viewpoint of efficiently preparing a high refractive index curable composition, R 1 is preferably an unsubstituted aryl group having 6 to 12 carbon atoms, and more preferably a phenyl group.
聚倍半矽氧烷化合物(A)係可具有1種R1 、亦可具有2種以上的R1 。The polysilsesquioxane compound (A) may have one type of R 1 or may have two or more types of R 1 .
聚倍半矽氧烷化合物(A)亦可更進一步具有下式(a-2)所示重複單元[重複單元(2)]者。The polysilsesquioxane compound (A) may further have a repeating unit represented by the following formula (a-2) [repeating unit (2)].
[化5] [Chemistry 5]
[R2 係表示無取代的碳數1~10之烷基、或具取代基的碳數1~10之烷基。][ R2 represents an unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted alkyl group having 1 to 10 carbon atoms.]
聚倍半矽氧烷化合物係藉由具有重複單元(2),便可呈高分子量化,且可提升分子鏈的柔軟性。所以,本發明硬化性組合物的硬化物不易發生龜裂,且本發明硬化性組合物的黏著性優異。The polysilsesquioxane compound can have a high molecular weight by having a repeating unit (2), and can enhance the flexibility of the molecular chain. Therefore, the hardened material of the hardening composition of the present invention is not prone to cracking, and the hardening composition of the present invention has excellent adhesion.
R2 的「無取代的碳數1~10之烷基」的碳數較佳係1~6、更佳係1~3。 R2 的「無取代的碳數1~10之烷基」係可舉例如:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、正己基、正辛基、正壬基、正癸基等。The carbon number of the "unsubstituted alkyl group having 1 to 10 carbon atoms" of R 2 is preferably 1 to 6, more preferably 1 to 3. Examples of the "unsubstituted alkyl group having 1 to 10 carbon atoms" of R 2 include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-pentyl, n-hexyl, n-octyl, n-nonyl, and n-decyl.
R2 的「具取代基的碳數1~10之烷基」,碳數較佳係1~6、更佳係1~3。另外,該碳數係指取代基除外部(烷基部分)的碳數。所以,當R2 係「具取代基的碳數1~10之烷基」的情況,會有R2 的碳數超過10之情況。 R2 的「具取代基的碳數1~10之烷基」,烷基係可舉例如就與「無取代的碳數1~10之烷基」所例示者同樣。The "alkyl group with 1 to 10 carbon atoms having a substituent" of R2 preferably has 1 to 6 carbon atoms, more preferably 1 to 3 carbon atoms. In addition, the carbon number refers to the carbon number of the substituent excluding the carbon atoms outside (alkyl part). Therefore, when R2 is "alkyl group with 1 to 10 carbon atoms having a substituent", there may be a case where the carbon number of R2 exceeds 10. For example, the alkyl group of "alkyl group with 1 to 10 carbon atoms having a substituent" of R2 is the same as the example of "alkyl group with 1 to 10 carbon atoms having no substitution".
「具取代基的碳數1~10之烷基」,取代基原子數(但,氫原子數除外)通常係1~30、較佳係1~20。 「具取代基的碳數1~10之烷基」,取代基係可舉例如:氯原子、溴原子等鹵素原子;氰基等。"Alkyl group with 1 to 10 carbon atoms and having a substituent", the number of substituent atoms (excluding hydrogen atoms) is usually 1 to 30, preferably 1 to 20. "Alkyl group with 1 to 10 carbon atoms and having a substituent", the substituent can be, for example, halogen atoms such as chlorine atoms and bromine atoms; cyano group, etc.
該等之中,R2 較佳係無取代的碳數1~10之烷基、更佳係無取代的碳數1~6之烷基、特佳係無取代的碳數之1~3烷基。 藉由R2 係使用無取代的碳數1~10之烷基的聚倍半矽氧烷化合物(A),便可效率佳控制聚倍半矽氧烷化合物(A)的分子量。Among them, R2 is preferably an unsubstituted alkyl group having 1 to 10 carbon atoms, more preferably an unsubstituted alkyl group having 1 to 6 carbon atoms, and particularly preferably an unsubstituted alkyl group having 1 to 3 carbon atoms. By using a polysilsesquioxane compound (A) in which R2 is an unsubstituted alkyl group having 1 to 10 carbon atoms, the molecular weight of the polysilsesquioxane compound (A) can be efficiently controlled.
聚倍半矽氧烷化合物(A)係可具有1種R2 、亦可具有2種以上的R2 。The polysilsesquioxane compound (A) may have one type of R 2 or may have two or more types of R 2 .
聚倍半矽氧烷化合物(A)係可為無規共聚物、嵌段共聚物、接枝共聚物、交替共聚物等中之任一者,就從製造容易性等觀點,較佳係無規共聚物。 再者,聚倍半矽氧烷化合物(A)的構造係可為梯狀型構造、雙層型構造、籠型構造、部分開裂籠型構造、環狀型構造、無規型構造中之任一構造。The polysilsesquioxane compound (A) may be any of a random copolymer, a block copolymer, a graft copolymer, an alternating copolymer, etc., and preferably a random copolymer from the viewpoint of ease of production. Furthermore, the structure of the polysilsesquioxane compound (A) may be any of a ladder structure, a double-layer structure, a cage structure, a partially cracked cage structure, a ring structure, and a random structure.
重複單元(1)、重複單元(2)係下式(a-6)所示:Repeating unit (1) and repeating unit (2) are represented by the following formula (a-6):
[化6] [Chemistry 6]
[G係表示R1 或R2 所示基。R1 、R2 分別係表示同上述。O1/2 係表示與相鄰重複單元共有氧原子][G represents a group represented by R 1 or R 2. R 1 and R 2 are the same as above. O 1/2 represents sharing an oxygen atom with adjacent repeating units]
如式(a-6)所示,聚倍半矽氧烷化合物(A)係具有在一般統稱為「T位點」的矽原子上鍵結3個氧原子,而此外的基(G所示基)則鍵結著1個氧原子而形成的部分構造。 聚倍半矽氧烷化合物(A)所含的T位點係可舉例如:下式(a-3)所示T位點(T1位點)、下式(a-4)所示T位點(T2位點)、下式(a-5)所示T位點(T3位點)。As shown in formula (a-6), the polysilsesquioxane compound (A) has a partial structure in which three oxygen atoms are bonded to a silicon atom generally referred to as a "T site", and another group (group represented by G) is bonded to one oxygen atom. The T site contained in the polysilsesquioxane compound (A) can be, for example, a T site (T1 site) represented by the following formula (a-3), a T site (T2 site) represented by the following formula (a-4), and a T site (T3 site) represented by the following formula (a-5).
[化7] [Chemistry 7]
式(a-3)、(a-4)及(a-5)中,G係表示同上述意義。R3 係表示氫原子或碳數1~10之烷基。R3 的「碳數1~10之烷基」係可舉例如:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基等。複數R3 彼此間可完全相同、亦可為互異。又,上述式(a-3)~(a-5)中,*係鍵結著矽原子。In formula (a-3), (a-4) and (a-5), G has the same meaning as above. R 3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. Examples of "alkyl group having 1 to 10 carbon atoms" of R 3 include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, etc. Multiple R 3 may be completely the same or different from each other. In the above formulas (a-3) to (a-5), * is bonded to a silicon atom.
聚倍半矽氧烷化合物(A)合成時,在剛開始反應後,生成物中所含的T1位點、T2位點較多,但隨反應的進行,該等位點的量亦隨之減少,而逐漸增加T3位點的量。 所以,T1位點或T2位點含有比例較高的聚倍半矽氧烷化合物係屬於較低分子的化合物,相對於此,T3位點含有比例較高的聚倍半矽氧烷化合物則屬於較高分子的化合物,分子鏈的運動受限制。 再者,如殘存反應性基(-OR3 )數表示,T1位點或T2位點含有比例較高的聚倍半矽氧烷化合物係具有充分反應性,相對於此,T3位點含有比例較高的聚倍半矽氧烷化合物則有反應性差的傾向。When the polysilsesquioxane compound (A) is synthesized, the product contains more T1 sites and T2 sites at the beginning of the reaction, but as the reaction proceeds, the amount of these sites decreases, while the amount of T3 sites gradually increases. Therefore, a polysilsesquioxane compound containing a higher proportion of T1 sites or T2 sites is a low molecular weight compound, while a polysilsesquioxane compound containing a higher proportion of T3 sites is a high molecular weight compound, and the movement of the molecular chain is restricted. Furthermore, as indicated by the number of residual reactive groups (-OR 3 ), a polysilsesquioxane compound having a high ratio at the T1 site or the T2 site has sufficient reactivity, whereas a polysilsesquioxane compound having a high ratio at the T3 site tends to have poor reactivity.
聚倍半矽氧烷化合物(A)係滿足上述要件1。 即,聚倍半矽氧烷化合物(A)中,相對於重複單元(1)與重複單元(2)合計量,重複單元(1)的量係40mol%以上且未滿80mol%。 本發明的硬化性組合物係含有滿足要件1的聚倍半矽氧烷化合物,故,折射率高。又,藉由硬化性組合物滿足要件1,其硬化物便不易出現龜裂,且黏著性獲提升。 就從可均衡佳獲得該等效果的觀點,相對於重複單元(1)與重複單元(2)的合計量,重複單元(1)的量較佳係45~77mol%、更佳係50~74mol%、特佳係55~71mol%。The polysilsesquioxane compound (A) satisfies the above-mentioned requirement 1. That is, in the polysilsesquioxane compound (A), the amount of the repeating unit (1) is 40 mol% or more and less than 80 mol% relative to the total amount of the repeating unit (1) and the repeating unit (2). The curable composition of the present invention contains a polysilsesquioxane compound that satisfies requirement 1, and therefore has a high refractive index. In addition, since the curable composition satisfies requirement 1, the cured product is less likely to crack and has improved adhesion. From the perspective of being able to obtain these effects in a balanced manner, the amount of the repeating unit (1) relative to the total amount of the repeating unit (1) and the repeating unit (2) is preferably 45-77 mol%, more preferably 50-74 mol%, and particularly preferably 55-71 mol%.
聚倍半矽氧烷化合物(A)中的重複單元(1)與重複單元(2)比例,係例如測定聚倍半矽氧烷化合物(A)的29 Si-NMR而可求得。 聚倍半矽氧烷化合物(A)係可溶於例如:丙酮等酮系溶劑;苯等芳香族烴系溶劑;二甲亞碸等含硫系溶劑;四氫呋喃等醚系溶劑;醋酸乙酯等酯系溶劑;氯仿等含鹵素系溶劑;及由該等2種以上構成的混合溶劑等各種有機溶劑中。所以,使用該等溶劑,便可測定聚倍半矽氧烷化合物(A)呈溶液狀態的29 Si-NMR。The ratio of the repeating unit (1) to the repeating unit (2) in the polysilsesquioxane compound (A) can be obtained, for example, by measuring the 29 Si-NMR of the polysilsesquioxane compound (A). The polysilsesquioxane compound (A) is soluble in various organic solvents, for example, ketone solvents such as acetone; aromatic hydrocarbon solvents such as benzene; sulfur-containing solvents such as dimethyl sulfoxide; ether solvents such as tetrahydrofuran; ester solvents such as ethyl acetate; halogen-containing solvents such as chloroform; and mixed solvents composed of two or more of these solvents. Therefore, using these solvents, the 29 Si-NMR of the polysilsesquioxane compound (A) in a solution state can be measured.
聚倍半矽氧烷化合物(A)係滿足上述要件2。 即,聚倍半矽氧烷化合物(A)中,相對於T1位點、T2位點及T3位點的合計量,上述T2位點的量係20~70mol%,含T2位點較多。 本發明的硬化性組合物係藉由除滿足上述要件1之外,也要滿足要件2,本發明硬化性組合物的硬化物便不易發生龜裂,且黏著性獲更進一步提升。The polysilsesquioxane compound (A) satisfies the above requirement 2. That is, in the polysilsesquioxane compound (A), the amount of the above T2 site is 20-70 mol% relative to the total amount of the T1 site, the T2 site and the T3 site, and the T2 site is contained more. The curable composition of the present invention satisfies requirement 2 in addition to requirement 1, so that the cured product of the curable composition of the present invention is less likely to crack and the adhesion is further improved.
即,含有具較多T1位點之聚倍半矽氧烷化合物的硬化性組合物,在進行硬化之際,會過度發生水解反應、縮合反應,因硬化收縮而導致硬化物中容易發生龜裂。 再者,含有較多T3位點的聚倍半矽氧烷化合物,係較高分子的化合物,運動性差劣,所以含有此種聚倍半矽氧烷化合物的硬化性組合物之硬化物,容易發生殘留應力,而容易發生龜裂。That is, the curable composition containing polysilsesquioxane compounds with more T1 sites will undergo excessive hydrolysis and condensation reactions during curing, and cracks are likely to occur in the cured product due to the shrinkage during curing. Furthermore, polysilsesquioxane compounds containing more T3 sites are high molecular weight compounds with poor mobility, so the cured product of the curable composition containing such polysilsesquioxane compounds is prone to residual stress and cracks.
另一方面,具有含較多T2位點之聚倍半矽氧烷化合物的硬化性組合物,不會過度發生水解反應與縮合反應便可硬化而得,所以硬化物中不易發生龜裂。 再者,因為含較多T2位點的聚倍半矽氧烷化合物的分子量並不太高,具有適度運動性,因而具有含較多T2位點之聚倍半矽氧烷化合物的硬化性組合物之硬化物不易發生殘留應力,便不易發生龜裂。On the other hand, the curable composition containing polysilsesquioxane compounds with more T2 sites can be cured without excessive hydrolysis and condensation reactions, so the cured product is less likely to crack. Furthermore, since the molecular weight of the polysilsesquioxane compound containing more T2 sites is not too high and has moderate mobility, the cured product of the curable composition containing polysilsesquioxane compounds with more T2 sites is less likely to have residual stress and is less likely to crack.
就從容易獲得上述效果的觀點,相對於T1位點、T2位點及T3位點合計量,T2位點之量係20~70mol%、較佳係22~60mol%、更佳係24~55mol%、特佳係26~50mol%。From the viewpoint of easily obtaining the above-mentioned effect, the amount of the T2 site is 20-70 mol%, preferably 22-60 mol%, more preferably 24-55 mol%, and particularly preferably 26-50 mol%, relative to the total amount of the T1 site, the T2 site, and the T3 site.
再者,相對於T1位點、T2位點及T3位點合計量,T1位點之量較佳係0~40mol%、更佳係0~30mol%、特佳係0~20mol%、最佳係0~10mol%。 藉由聚倍半矽氧烷化合物(A)適度含有T1位點,便可獲得硬化性更優異的硬化性組合物。 再者,相對於T1位點、T2位點及T3位點合計量,T3位點之量較佳係10~80mol%、更佳係20~70mol%、特佳係30~50mol%。 藉由聚倍半矽氧烷化合物(A)適度含有T3位點,便可抑制因硬化時的縮合反應而生成副產物。Furthermore, the amount of the T1 site is preferably 0-40 mol%, more preferably 0-30 mol%, particularly preferably 0-20 mol%, and most preferably 0-10 mol% relative to the total amount of the T1 site, the T2 site, and the T3 site. By appropriately containing the T1 site in the polysilsesquioxane compound (A), a curable composition with better curability can be obtained. Furthermore, the amount of the T3 site is preferably 10-80 mol%, more preferably 20-70 mol%, and particularly preferably 30-50 mol% relative to the total amount of the T1 site, the T2 site, and the T3 site. By appropriately containing the T3 site in the polysilsesquioxane compound (A), the generation of byproducts due to the condensation reaction during curing can be suppressed.
T1位點、T2位點及T3位點的含有比例,係藉由測定聚倍半矽氧烷化合物(A)呈溶液狀態的29 Si-NMR便可求得。 例如當測定溶劑係使用丙酮、內標準係使用TMS(四甲基矽烷)時,式(a-3)~(a-6)中,G為苯基之T位點中源自矽原子的訊號,T1位點係在-65~-58ppm觀測到、T2位點係在-74~-65ppm觀測到、T3位點係在-82~-75ppm觀測到;在式(a-3)~(a-6)中,G為甲基之T位點中源自矽原子的訊號,T1位點係在-50~-46ppm觀測到、T2位點係在-61~-52ppm觀測到、T3位點係在-70~-61ppm觀測到。The content ratio of the T1 site, the T2 site, and the T3 site can be determined by measuring 29 Si-NMR of the polysilsesquioxane compound (A) in a solution state. For example, when acetone is used as the measurement solvent and TMS (tetramethylsilane) is used as the internal standard, in formulas (a-3) to (a-6), G is the signal derived from the silicon atom at the T site of the phenyl group, the T1 site is observed at -65 to -58 ppm, the T2 site is observed at -74 to -65 ppm, and the T3 site is observed at -82 to -75 ppm; in formulas (a-3) to (a-6), G is the signal derived from the silicon atom at the T site of the methyl group, the T1 site is observed at -50 to -46 ppm, the T2 site is observed at -61 to -52 ppm, and the T3 site is observed at -70 to -61 ppm.
聚倍半矽氧烷化合物(A)的質量平均分子量(Mw)較佳係500~25,000、較佳係700~20,000、特佳係1,000~15,000、最佳係2,000~10,000。藉由使用質量平均分子量(Mw)在上述範圍內的聚倍半矽氧烷化合物(A),便可輕易獲得硬化後不易發生龜裂的硬化性組合物。The mass average molecular weight (Mw) of the polysilsesquioxane compound (A) is preferably 500-25,000, more preferably 700-20,000, particularly preferably 1,000-15,000, and most preferably 2,000-10,000. By using a polysilsesquioxane compound (A) having a mass average molecular weight (Mw) within the above range, a curable composition that is less likely to crack after curing can be easily obtained.
聚倍半矽氧烷化合物(A)的分子量分佈(Mw/Mn)並無特別的限定,通常係1.0~10.0、較佳係1.1~6.0、更佳係1.1~4.0。藉由使用分子量分佈(Mw/Mn)在上述範圍內的聚倍半矽氧烷化合物(A),便可輕易獲得能提供耐熱性與黏著性更優異硬化物的硬化性組合物。 質量平均分子量(Mw)及數量平均分子量(Mn)係例如利用以四氫呋喃(THF)為溶劑的凝膠滲透層析法(GPC),求取標準聚苯乙烯換算值便可求得。The molecular weight distribution (Mw/Mn) of the polysilsesquioxane compound (A) is not particularly limited, and is generally 1.0 to 10.0, preferably 1.1 to 6.0, and more preferably 1.1 to 4.0. By using a polysilsesquioxane compound (A) having a molecular weight distribution (Mw/Mn) within the above range, a curable composition that can provide a cured product with better heat resistance and adhesion can be easily obtained. The mass average molecular weight (Mw) and the number average molecular weight (Mn) can be obtained, for example, by using gel permeation chromatography (GPC) with tetrahydrofuran (THF) as a solvent and obtaining a standard polystyrene conversion value.
聚倍半矽氧烷化合物(A)中的重複單元(1)與重複單元(2)合計量,佔聚倍半矽氧烷化合物(A)總重複單元中,較佳係90~100mol%、更佳係95~100mol%、特佳係98~100mol%。The total amount of the repeating units (1) and (2) in the polysilsesquioxane compound (A) is preferably 90 to 100 mol %, more preferably 95 to 100 mol %, and particularly preferably 98 to 100 mol % of the total repeating units in the polysilsesquioxane compound (A).
聚倍半矽氧烷化合物(A)的25℃折射率(nD),較佳係1.46~1.56、更佳係1.48~1.55、特佳係1.50~1.55。 藉由聚倍半矽氧烷化合物(A)的25℃折射率(nD)在1.46~1.56範圍內,便可輕易獲得高折射率的硬化性組合物與硬化物。 聚倍半矽氧烷化合物(A)的折射率(nD)係使用阿貝式折射儀便可測定。The 25°C refractive index (nD) of the polysilsesquioxane compound (A) is preferably 1.46 to 1.56, more preferably 1.48 to 1.55, and particularly preferably 1.50 to 1.55. When the 25°C refractive index (nD) of the polysilsesquioxane compound (A) is in the range of 1.46 to 1.56, a high refractive index curable composition and a cured product can be easily obtained. The refractive index (nD) of the polysilsesquioxane compound (A) can be measured using an Abbe refractometer.
本發明中,聚倍半矽氧烷化合物(A)係可單獨使用1種、或組合使用2種以上。In the present invention, the polysilsesquioxane compound (A) may be used alone or in combination of two or more.
聚倍半矽氧烷化合物(A)的合成方法並無特別的限定。例如藉由使下式(a-7)所示矽烷化合物(1)中之至少1種、與下式(a-8)所示矽烷化合物(2)中之至少1種進行縮聚,便可合成聚倍半矽氧烷化合物(A)。The method for synthesizing the polysilsesquioxane compound (A) is not particularly limited. For example, the polysilsesquioxane compound (A) can be synthesized by condensing at least one of the silane compounds (1) represented by the following formula (a-7) with at least one of the silane compounds (2) represented by the following formula (a-8).
[化8] [Chemistry 8]
(式中,R1 係表示與上述同義。R4 係表示碳數1~10之烷基;X1 係表示鹵原子,p係表示0~3之整數。複數R4 及複數X1 係表示分別相互可為相同亦可為互異。)(In the formula, R 1 is synonymous with the above. R 4 is an alkyl group having 1 to 10 carbon atoms; X 1 is a halogen atom, and p is an integer of 0 to 3. Multiple R 4 and multiple X 1 may be the same or different from each other.)
[化9] [Chemistry 9]
(式中,R2 係表示與上述同義。R5 係表示碳數1~10之烷基;X2 係表示鹵原子;q係表示0~3之整數。複數R5 及複數X2 係表示分別相互可為相同亦可為互異。)(In the formula, R 2 is synonymous with the above. R 5 is an alkyl group having 1 to 10 carbon atoms; X 2 is a halogen atom; q is an integer of 0 to 3. Multiple R 5 and multiple X 2 may be the same or different from each other.)
R4 、R5 的「碳數1~10之烷基」係可例如與就R3 的「碳數1~10之烷基」所示者相同。 X1 、X2 的鹵原子係可舉例如:氯原子及溴原子等。The "alkyl group having 1 to 10 carbon atoms" for R 4 and R 5 may be the same as the "alkyl group having 1 to 10 carbon atoms" for R 3. Examples of the halogen atom for X 1 and X 2 include a chlorine atom and a bromine atom.
矽烷化合物(1)的具體例係可舉例如: 苯基三甲氧基矽烷、苯基三乙氧基矽烷等無取代之芳基三烷氧基矽烷化合物類; 苯基氯二甲氧基矽烷、苯基氯二乙氧基矽烷、苯基二氯甲氧基矽烷、苯基二氯乙氧基矽烷等無取代之芳基鹵烷氧基矽烷化合物類; 苯基三氯矽烷等無取代之芳基三鹵矽烷化合物類; 4-甲基苯基三甲氧基矽烷、4-甲氧基苯基三甲氧基矽烷、4-氯苯基三甲氧基矽烷、4-甲基苯基三乙氧基矽烷、4-甲氧基苯基三乙氧基矽烷、4-氯苯基三乙氧基矽烷等具取代基之芳基三烷氧基矽烷化合物類; 4-甲基苯基氯二甲氧基矽烷、4-甲氧基苯基氯二甲氧基矽烷、4-氯苯基氯二甲氧基矽烷、4-甲基苯基二氯甲氧基矽烷、4-甲氧基苯基二氯甲氧基矽烷、4-氯苯基二氯甲氧基矽烷等具取代基之芳基鹵烷氧基矽烷化合物類; 4-甲基苯基三氯矽烷、4-甲氧基苯基三氯矽烷、4-氯苯基三氯矽烷等具取代基之芳基三鹵矽烷化合物類等。 該等矽烷化合物(1)係可單獨使用1種、或組合使用2種以上。Specific examples of the silane compound (1) include: Unsubstituted aryl trialkoxysilane compounds such as phenyltrimethoxysilane and phenyltriethoxysilane; Unsubstituted aryl halogen alkoxysilane compounds such as phenylchlorodimethoxysilane, phenylchlorodiethoxysilane, phenyldichloromethoxysilane, phenyldichloroethoxysilane; Unsubstituted aryl trihalogen silane compounds such as phenyltrichlorosilane; 4-methylphenyltrimethoxysilane, 4-methoxyphenyltrimethoxysilane, 4-chlorophenyltrimethoxysilane, 4-methylphenyltriethoxysilane, 4-methoxy Aryl trialkoxysilane compounds with substitution such as phenyltriethoxysilane and 4-chlorophenyltriethoxysilane; Aryl halogen alkoxysilane compounds with substitution such as 4-methylphenylchlorodimethoxysilane, 4-methoxyphenylchlorodimethoxysilane, 4-chlorophenylchlorodimethoxysilane, 4-methylphenyldichloromethoxysilane, 4-methoxyphenyldichloromethoxysilane, 4-chlorophenyldichloromethoxysilane; Aryl trihalogen silane compounds with substitution such as 4-methylphenyltrichlorosilane, 4-methoxyphenyltrichlorosilane, 4-chlorophenyltrichlorosilane, etc. The silane compounds (1) can be used alone or in combination of two or more.
矽烷化合物(2)的具體例係可舉例如: 甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷等無取代之烷基三烷氧基矽烷化合物類; 甲基氯二甲氧基矽烷、甲基氯二乙氧基矽烷、甲基二氯甲氧基矽烷、甲基溴二甲氧基矽烷、乙基氯二甲氧基矽烷、乙基氯二乙氧基矽烷、乙基二氯甲氧基矽烷、乙基溴二甲氧基矽烷等無取代之烷基鹵烷氧基矽烷化合物類; 甲基三氯矽烷、甲基三溴矽烷、乙基三氯矽烷、乙基三溴矽烷等無取代之烷基三鹵矽烷化合物類; 2-氰乙基三甲氧基矽烷、3-氯丙基三甲氧基矽烷、2-氰乙基三乙氧基矽烷、3-氯丙基三乙氧基矽烷等具取代基之烷基三烷氧基矽烷化合物類; 2-氰乙基氯二甲氧基矽烷、3-氯丙基氯二甲氧基矽烷、2-氰乙基氯二乙氧基矽烷、3-氯丙基氯二乙氧基矽烷、2-氰乙基二氯甲氧基矽烷、3-氯丙基二氯甲氧基矽烷、2-氰乙基二氯乙氧基矽烷、3-氯丙基二氯乙氧基矽烷等具取代基之烷基鹵烷氧基矽烷化合物類; 2-氰乙基三氯矽烷、3-氯丙基三氯矽烷等具取代基之烷基三鹵矽烷化合物類等。 該等矽烷化合物(2)係可單獨使用1種、或組合使用2種以上。Specific examples of the silane compound (2) include: Unsubstituted alkyltrialkoxysilane compounds such as methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltripropoxysilane, etc.; Unsubstituted alkylhalogenalkoxysilane compounds such as methylchlorodimethoxysilane, methylchlorodiethoxysilane, methyldichloromethoxysilane, methylbromodimethoxysilane, ethylchlorodimethoxysilane, ethylchlorodiethoxysilane, ethyldichloromethoxysilane, ethylbromodimethoxysilane, etc.; Unsubstituted alkyltrihalogensilane compounds such as methyltrichlorosilane, methyltribromosilane, ethyltrichlorosilane, ethyltribromosilane, etc.; 2- Alkyl trialkoxysilane compounds with substitution such as cyanoethyl trimethoxysilane, 3-chloropropyl trimethoxysilane, 2-cyanoethyl triethoxysilane, 3-chloropropyl triethoxysilane, etc.; Alkyl halide alkoxysilane compounds with substitution such as 2-cyanoethyl chlorodimethoxysilane, 3-chloropropyl chlorodimethoxysilane, 2-cyanoethyl chlorodiethoxysilane, 3-chloropropyl chlorodiethoxysilane, 2-cyanoethyl dichloromethoxysilane, 3-chloropropyl dichloromethoxysilane, 2-cyanoethyl dichloroethoxysilane, 3-chloropropyl dichloroethoxysilane, etc.; Alkyl trihalide silane compounds with substitution such as 2-cyanoethyl trichlorosilane, 3-chloropropyl trichlorosilane, etc. The silane compounds (2) may be used alone or in combination of two or more.
使上述矽烷化合物進行縮聚的方法並無特別的限定。例如在溶劑中(或無溶劑下),於矽烷化合物中添加既定量的縮聚觸媒,再依既定溫度進行攪拌的方法。更具體而言,可例如:(a)在矽烷化合物中添加既定量的酸觸媒,再依既定溫度施行攪拌的方法;(b)在矽烷化合物中添加既定量的鹼觸媒,再依既定溫度施行攪拌的方法;(c)在矽烷化合物中添加既定量的酸觸媒,經依既定溫度施行攪拌後,添加過剩量的鹼觸媒,使反應系統形成鹼性,再依既定溫度施行攪拌的方法等。 該等之中,就從可效率佳獲得目標聚倍半矽氧烷化合物(A)的觀點,較佳係(a)之方法。There is no particular limitation on the method of polycondensing the above-mentioned silane compound. For example, a predetermined amount of polycondensation catalyst is added to the silane compound in a solvent (or in the absence of a solvent), and then the mixture is stirred at a predetermined temperature. More specifically, for example: (a) a predetermined amount of acid catalyst is added to the silane compound, and then the mixture is stirred at a predetermined temperature; (b) a predetermined amount of alkaline catalyst is added to the silane compound, and then the mixture is stirred at a predetermined temperature; (c) a predetermined amount of acid catalyst is added to the silane compound, and after stirring at a predetermined temperature, an excess amount of alkaline catalyst is added to make the reaction system alkaline, and then the mixture is stirred at a predetermined temperature, etc. Among these, method (a) is preferred from the viewpoint of being able to efficiently obtain the target polysilsesquioxane compound (A).
所使用的縮聚觸媒係酸觸媒與鹼觸媒任一者均可。又,亦可組合使用2種以上的縮聚觸媒,但最好至少有使用酸觸媒。 酸觸媒係可舉例如:磷酸、鹽酸、硼酸、硫酸、硝酸等無機酸;檸檬酸、醋酸、甲磺酸、三氟甲磺酸、苯磺酸、對甲苯磺酸等有機酸等。該等之中,較佳係從磷酸、鹽酸、硼酸、硫酸、檸檬酸、醋酸、及甲磺酸中選擇至少1種。The condensation catalyst used may be either an acid catalyst or an alkaline catalyst. Moreover, two or more condensation catalysts may be used in combination, but it is preferred to use at least an acid catalyst. The acid catalyst may be, for example, an inorganic acid such as phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, and nitric acid; an organic acid such as citric acid, acetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, and p-toluenesulfonic acid. Among them, it is preferred to select at least one from phosphoric acid, hydrochloric acid, boric acid, sulfuric acid, citric acid, acetic acid, and methanesulfonic acid.
鹼觸媒係可舉例如:氨水;三甲胺、三乙胺、二異丙基醯胺鋰、雙(三甲矽烷基)醯胺鋰、吡啶、1,8-二氮雜雙環[5.4.0]-7-十一烯、苯胺、甲吡啶、1,4-二氮雜雙環[2.2.2]辛烷、咪唑等有機鹼;氫氧化四甲銨、氫氧化四乙銨等有機氫氧化物;甲氧化鈉、乙氧化鈉、第三丁氧化鈉、第三丁醇鉀等金屬烷氧化物;氫化鈉、氫化鈣等金屬氫化物;氫氧化鈉、氫氧化鉀、氫氧化鈣等金屬氫氧化物;碳酸鈉、碳酸鉀、碳酸鎂等金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等金屬碳酸氫鹽等。Examples of the alkaline catalyst include aqueous ammonia; organic bases such as trimethylamine, triethylamine, lithium diisopropylamide, lithium bis(trimethylsilyl)amide, pyridine, 1,8-diazabicyclo[5.4.0]-7-undecene, aniline, picolinidine, 1,4-diazabicyclo[2.2.2]octane, and imidazole; tetramethylammonium hydroxide, tetraethyl hydroxide; Organic hydroxides such as ammonium; metal alkoxides such as sodium methoxide, sodium ethoxide, sodium tert-butyloxide, potassium tert-butylate; metal hydrides such as sodium hydroxide and calcium hydroxide; metal hydroxides such as sodium hydroxide, potassium hydroxide, and calcium hydroxide; metal carbonates such as sodium carbonate, potassium carbonate, and magnesium carbonate; metal bicarbonates such as sodium bicarbonate and potassium bicarbonate, etc.
相對於矽烷化合物總mol量,縮聚觸媒的使用量通常係0.05~10mol%、較佳係0.1~5mol%範圍內。The amount of the condensation catalyst used is generally in the range of 0.05-10 mol%, preferably 0.1-5 mol%, relative to the total mol amount of the silane compound.
當縮聚時有使用溶劑時,所使用的溶劑可配合矽烷化合物的種類等再行適當選擇。例如:水;苯、甲苯、二甲苯等芳香族烴類;醋酸甲酯、醋酸乙酯、醋酸丙酯、醋酸丁酯、丙酸甲酯等酯類;丙酮、甲乙酮、甲基異丁酮、環己酮等酮類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、第二丁醇、第三丁醇等醇類等。該等溶劑係可單獨使用1種、或組合使用2種以上。When a solvent is used during the polycondensation, the solvent used can be appropriately selected in combination with the type of silane compound. For example: water; aromatic hydrocarbons such as benzene, toluene, and xylene; esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, and methyl propionate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutyl alcohol, 2-butanol, and 3-butanol, etc. These solvents can be used alone or in combination of two or more.
相對於矽烷化合物的總莫耳量每1莫耳,溶劑的使用量係0.1公升以上且10公升以下、較佳係0.1公升以上且2公升以下。The amount of the solvent used is 0.1 liter or more and 10 liters or less, preferably 0.1 liter or more and 2 liters or less, per 1 mol of the total molar amount of the silane compound.
使矽烷化合物進行縮聚時的溫度,通常係0℃至所使用溶劑沸點為止的溫度範圍、較佳係20℃以上且100℃以下的範圍。若反應溫度偏低,會有縮聚反應進行不足的情況。另一方面,若反應溫度偏高,則較難抑制凝膠化。反應通常係30分鐘至30小時便完成。The temperature for polycondensing the silane compound is generally in the range of 0°C to the boiling point of the solvent used, preferably in the range of 20°C to 100°C. If the reaction temperature is too low, the polycondensation reaction may not proceed sufficiently. On the other hand, if the reaction temperature is too high, it is difficult to suppress gelation. The reaction is generally completed in 30 minutes to 30 hours.
當利用上述方法合成聚倍半矽氧烷化合物(A)時,矽烷化合物(1)的OR4 或X1 、矽烷化合物(2)的OR5 或X2 中,未引發脫醇等的部分會殘存於聚倍半矽氧烷化合物(A)中。所以,在聚倍半矽氧烷化合物(A)中,除上述式(a-5)所示重複單元之外,尚亦含有上述式(a-3)、式(a-4)所示重複單元。When the polysilsesquioxane compound (A) is synthesized by the above method, the part of OR4 or X1 of the silane compound (1) and OR5 or X2 of the silane compound (2) that has not been subjected to dealcoholization etc. will remain in the polysilsesquioxane compound (A). Therefore, in addition to the repeating unit represented by the above formula (a-5), the polysilsesquioxane compound (A) also contains the repeating units represented by the above formula (a-3) and formula (a-4).
[(C)成分] 構成本發明硬化性組合物的(C)成分係矽烷偶合劑。 本發明的硬化性組合物係因為含有(C)成分,因而本發明硬化性組合物的硬化物在常溫時與高溫時的黏著性更優異。[Component (C)] The component (C) constituting the curable composition of the present invention is a silane coupling agent. Since the curable composition of the present invention contains the component (C), the cured product of the curable composition of the present invention has better adhesion at room temperature and at high temperature.
所謂「矽烷偶合劑」係指具有:矽原子、官能基、以及鍵結在上述矽原子的水解性基的矽烷化合物。 所謂「官能基」係指與其他化合物(主要為有機物)具有反應性的基,例如:胺基、取代胺基、異氰酸酯基、脲(ureido)基、具三聚異氰酸酯骨架的基等具氮原子基;酸酐基(具酸酐構造基);乙烯基;烯丙基;環氧基;(甲基)丙烯酸基;巰基等。 本發明中,矽烷偶合劑係可單獨使用1種、或組合使用2種以上。The so-called "silane coupling agent" refers to a silane compound having: a silicon atom, a functional group, and a hydrolyzable group bonded to the above silicon atom. The so-called "functional group" refers to a group that is reactive with other compounds (mainly organic substances), such as: an amine group, a substituted amine group, an isocyanate group, a urea group, a group having an isocyanurate skeleton, and other nitrogen atom groups; an anhydride group (having an anhydride structural group); a vinyl group; an allyl group; an epoxy group; a (meth) acrylic group; a hydroxyl group, etc. In the present invention, the silane coupling agent can be used alone or in combination of two or more.
矽烷偶合劑的含有量,相對於聚倍半矽氧烷化合物(A)100質量份,較佳係0.1~70質量份、更佳係1~60質量份、特佳係5~55質量份、最佳係10~50質量份、最最佳係15~45質量份。 藉由使用矽烷偶合劑含有量係在上述範圍內的硬化性組合物,便可形成在常溫時與高溫時的黏著性更優異的硬化物。The content of the silane coupling agent is preferably 0.1 to 70 parts by mass, more preferably 1 to 60 parts by mass, particularly preferably 5 to 55 parts by mass, optimally 10 to 50 parts by mass, and most optimally 15 to 45 parts by mass relative to 100 parts by mass of the polysilsesquioxane compound (A). By using a curable composition having a silane coupling agent content within the above range, a cured product having better adhesion at room temperature and at high temperature can be formed.
矽烷偶合劑較佳係分子內具有氮原子的矽烷偶合劑、分子內具有酸酐構造的矽烷偶合劑,更佳係分子內具有三聚異氰酸酯(isocyanurate)構造的矽烷偶合劑、分子內具有琥珀酸酐構造的矽烷偶合劑。The silane coupling agent is preferably a silane coupling agent having a nitrogen atom in the molecule or a silane coupling agent having an acid anhydride structure in the molecule, and is more preferably a silane coupling agent having an isocyanurate structure or a silane coupling agent having a succinic anhydride structure in the molecule.
分子內具有氮原子的矽烷偶合劑,係可舉例如:下式(c-1)所示三烷氧基矽烷化合物、式(c-2)所示二烷氧基烷基矽烷化合物或二烷氧基芳基矽烷化合物等。Examples of the silane coupling agent having a nitrogen atom in the molecule include a trialkoxysilane compound represented by the following formula (c-1), a dialkoxyalkylsilane compound represented by the following formula (c-2), or a dialkoxyarylsilane compound.
[化10] [Chemistry 10]
上述式中,Ra 係表示甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、第三丁氧基等碳數1~6之烷氧基。複數Ra 彼此間係可為相同、亦可為互異。 Rb 係表示甲基、乙基、正丙基、異丙基、正丁基、第三丁基等碳數1~6之烷基;或苯基、4-氯苯基、4-甲基苯基、1-萘基等具取代基、或未具取代基之芳基。In the above formula, Ra represents an alkoxy group having 1 to 6 carbon atoms, such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, tert-butoxy, etc. Multiple Ra groups may be the same or different from each other. Rb represents an alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, etc.; or an aryl group having a substituent or no substituent, such as phenyl, 4-chlorophenyl, 4-methylphenyl, 1-naphthyl, etc.
Rc 係表示具有氮原子之碳數1~10的有機基。又,Rc 可更進一步鍵結著其他含矽原子基。 Rc 的碳數1~10之有機基具體例係可舉例如:N-2-(胺乙基)-3-胺丙基、3-胺丙基、N-(1,3-二甲基-亞丁基)胺丙基、3-脲丙基、N-苯基-胺丙基等。R c represents an organic group having 1 to 10 carbon atoms and having a nitrogen atom. In addition, R c may further bond to other silicon-containing groups. Specific examples of organic groups having 1 to 10 carbon atoms of R c include N-2-(aminoethyl)-3-aminopropyl, 3-aminopropyl, N-(1,3-dimethyl-butylene)aminopropyl, 3-ureapropyl, N-phenyl-aminopropyl, etc.
上述式(c-1)或(c-2)所示化合物中,當Rc 係鍵結著其他含矽原子基的有機基時,化合物係可舉例如:經由三聚異氰酸酯骨架鍵結著其他矽原子而構成三聚異氰酸酯系矽烷偶合劑者、經由脲骨架鍵結著其他矽原子而構成脲系矽烷偶合劑者。In the compound represented by the above formula (c-1) or (c-2), when R c is bonded to other silicon-containing organic groups, the compound may be, for example, a silane coupling agent of the isocyanurate type bonded to other silicon atoms via an isocyanurate skeleton, or a silane coupling agent of the urea type bonded to other silicon atoms via a urea skeleton.
該等之中,分子內具有氮原子的矽烷偶合劑,就從可輕易獲得黏著性更優異硬化物的觀點,較佳係三聚異氰酸酯系矽烷偶合劑、及脲系矽烷偶合劑,更佳係分子內在矽原子上所鍵結的烷氧基達4個以上者。 所謂「在矽原子上所鍵結烷氧基達4以上」係只在同一矽原子上所鍵結烷氧基、與在不同矽原子上所鍵結烷氧基的總合計數達4以上。Among these, silane coupling agents having nitrogen atoms in the molecule are preferably isocyanurate-based silane coupling agents and urea-based silane coupling agents from the viewpoint of being able to easily obtain a cured product with better adhesion, and more preferably silane coupling agents having 4 or more alkoxy groups bonded to the silicon atom in the molecule. The so-called "4 or more alkoxy groups bonded to the silicon atom" means that the total number of alkoxy groups bonded to the same silicon atom and alkoxy groups bonded to different silicon atoms is 4 or more.
在矽原子上所鍵結烷氧基達4以上的三聚異氰酸酯系矽烷偶合劑,係可舉例如下式(c-3)所示化合物。在矽原子上所鍵結烷氧基達4以上的脲系矽烷偶合劑,係可舉例如下式(c-4)所示化合物。An example of an isocyanurate-based silane coupling agent having 4 or more alkoxy groups bonded to a silicon atom is a compound represented by the following formula (c-3). An example of an urea-based silane coupling agent having 4 or more alkoxy groups bonded to a silicon atom is a compound represented by the following formula (c-4).
[化11] [Chemistry 11]
式中,Ra 係表示與上述同義。t1~t5分別係表示獨立的1~10之整數,較佳係1~6之整數、更佳係3。In the formula, Ra has the same meaning as above. t1-t5 are independent integers of 1-10, preferably 1-6, and more preferably 3.
該等之中,分子內具有氮原子的矽烷偶合劑較佳係使用例如:1,3,5-N-參(3-三甲氧基矽烷基丙基)三聚異氰酸酯、1,3,5-N-參(3-三乙氧基矽烷基丙基)三聚異氰酸酯(以下稱「三聚異氰酸酯化合物」)、N,N’-雙(3-三甲氧基矽烷基丙基)脲、N,N’-雙(3-三乙氧基矽烷基丙基)脲(以下稱「脲化合物」)、及上述三聚異氰酸酯化合物與脲化合物的組合。Among them, the silane coupling agent having a nitrogen atom in the molecule is preferably used, for example: 1,3,5-N-tris(3-trimethoxysilylpropyl)isocyanurate, 1,3,5-N-tris(3-triethoxysilylpropyl)isocyanurate (hereinafter referred to as "isocyanurate compound"), N,N'-bis(3-trimethoxysilylpropyl)urea, N,N'-bis(3-triethoxysilylpropyl)urea (hereinafter referred to as "urea compound"), and a combination of the above-mentioned isocyanurate compounds and urea compounds.
當本發明的硬化性組合物係含有分子內具氮原子之矽烷偶合劑的情況,含有量並無特別的限定,該量依上述(A)成分與分子內具氮原子的矽烷偶合劑之質量比[(A)成分:分子內具氮原子的矽烷偶合劑]計,較佳係100:0.1~100:65、更佳係100:0.3~100:60、特佳係100:1~100:50、最佳係100:3~100:40、最最佳係100:5~100:35。 依此種比例含有(A)成分、與分子內具氮原子的矽烷偶合劑之硬化性組合物,硬化物的耐熱性與黏著性將更優異。When the curable composition of the present invention contains a silane coupling agent having a nitrogen atom in the molecule, the amount contained is not particularly limited. The amount is preferably 100:0.1 to 100:65, more preferably 100:0.3 to 100:60, particularly preferably 100:1 to 100:50, most preferably 100:3 to 100:40, and most preferably 100:5 to 100:35, based on the mass ratio of the above-mentioned component (A) to the silane coupling agent having a nitrogen atom in the molecule [component (A): silane coupling agent having a nitrogen atom in the molecule]. The curable composition containing the component (A) and the silane coupling agent having a nitrogen atom in the molecule in such a ratio will have better heat resistance and adhesion of the cured product.
分子內具有酸酐構造的矽烷偶合劑,係一個分子中合併具有具酸酐構造基、與水解性基二者的有機矽化合物。具體係可舉例如下式(c-5)所示化合物:The silane coupling agent having an acid anhydride structure in the molecule is an organic silicon compound having both an acid anhydride structure group and a hydrolyzable group in one molecule. Specifically, the compound represented by the following formula (c-5) can be cited:
[化12] [Chemistry 12]
式中,Q係表示具酸酐構造基;Rd 係表示碳數1~6之烷基、或具有取代基(或未具取代基)的苯基;Re 係表示碳數1~6之烷氧基或鹵原子;i、k係表示1~3之整數,j係表示0~2之整數,i+j+k=4。當j係2時,Rd 彼此間係可為相同、亦可為互異。當k為2或3時,複數Re 彼此間係可為相同、亦可為互異。當i為2或3時,複數Q彼此間係可為相同、亦可為互異。 Q係可舉例如下式:In the formula, Q represents an anhydride structural group; Rd represents an alkyl group with 1 to 6 carbon atoms, or a phenyl group with a substituent (or without a substituent); Re represents an alkoxy group with 1 to 6 carbon atoms, or a halogen atom; i and k represent integers of 1 to 3, j represents an integer of 0 to 2, and i+j+k=4. When j is 2, Rd can be the same or different from each other. When k is 2 or 3, multiple Re can be the same or different from each other. When i is 2 or 3, multiple Q can be the same or different from each other. Q can be exemplified by the following formula:
[化13] [Chemistry 13]
(式中,h係表示0~10之整數)所示基等,更佳係(Q1)所示基。(wherein h is an integer from 0 to 10), and more preferably a group represented by (Q1).
分子內具有酸酐構造的矽烷偶合劑,係可舉例如:2-(三甲氧基矽烷基)乙基琥珀酸酐、2-(三乙氧基矽烷基)乙基琥珀酸酐、3-(三甲氧基矽烷基)丙基琥珀酸酐、3-(三乙氧基矽烷基)丙基琥珀酸酐等的三(碳數1~6)烷氧矽烷基(碳數2~8)烷基琥珀酸酐; 2-(二甲氧基甲矽烷基)乙基琥珀酸酐等的二(碳數1~6)烷氧基甲矽烷基(碳數2~8)烷基琥珀酸酐; 2-(甲氧基二甲矽烷基)乙基琥珀酸酐等的(碳數1~6)烷氧基二甲矽烷基(碳數2~8)烷基琥珀酸酐;Silane coupling agents having an acid anhydride structure in the molecule include, for example, tri(carbon number 1-6) alkoxysilyl(carbon number 2-8) alkyl succinic anhydrides such as 2-(trimethoxysilyl) ethyl succinic anhydride, 2-(triethoxysilyl) ethyl succinic anhydride, 3-(trimethoxysilyl) propyl succinic anhydride, 3-(triethoxysilyl) propyl succinic anhydride, di(carbon number 1-6) alkoxysilyl(carbon number 2-8) alkyl succinic anhydrides such as 2-(dimethoxysilyl) ethyl succinic anhydride, (carbon number 1-6) alkoxydisilyl(carbon number 2-8) alkyl succinic anhydrides such as 2-(methoxydimethylsilyl) ethyl succinic anhydride,
2-(三氯矽烷基)乙基琥珀酸酐、2-(三溴矽烷基)乙基琥珀酸酐等的三鹵矽烷基(碳數2~8)烷基琥珀酸酐; 2-(二氯甲矽烷基)乙基琥珀酸酐等的二鹵化甲矽烷基(碳數2~8)烷基琥珀酸酐; 2-(氯二甲矽烷基)乙基琥珀酸酐等的鹵二甲矽烷基(碳數2~8)烷基琥珀酸酐等。Trihalosilyl (carbon number 2~8) alkyl succinic anhydrides such as 2-(trichlorosilyl)ethyl succinic anhydride and 2-(tribromosilyl)ethyl succinic anhydride; Dihalosilyl (carbon number 2~8) alkyl succinic anhydrides such as 2-(dichlorosilyl)ethyl succinic anhydride; Halogenated disilyl (carbon number 2~8) alkyl succinic anhydrides such as 2-(chlorodimethylsilyl)ethyl succinic anhydride.
該等之中,分子內具有酸酐構造的矽烷偶合劑較佳係三(碳數1~6)烷氧基矽烷基(碳數2~8)烷基琥珀酸酐,更佳係3-(三甲氧基矽烷基)丙基琥珀酸酐或3-(三乙氧基矽烷基)丙基琥珀酸酐。Among them, the silane coupling agent having an anhydride structure in the molecule is preferably tri(1-6 carbon atoms)alkoxysilyl(2-8 carbon atoms)alkylsuccinic anhydride, more preferably 3-(trimethoxysilyl)propylsuccinic anhydride or 3-(triethoxysilyl)propylsuccinic anhydride.
當本發明的硬化性組合物係分子內具有酸酐構造的矽烷偶合劑之情況,含有量並無特別的限定,依上述(A)成分與分子內具有酸酐構造的矽烷偶合劑之質量比[(A)成分:分子內具有酸酐構造的矽烷偶合劑]計,其量較佳係100:0.1~100:30、更佳係100:0.3~100:20、特佳係100:0.5~100:15、最佳係100:1~100:10。 依此種比例含有(A)成分及分子內具有酸酐構造的矽烷偶合劑之硬化性組合物之硬化物的黏著性將更優異。When the curable composition of the present invention is a silane coupling agent having an acid anhydride structure in the molecule, the content is not particularly limited. According to the mass ratio of the above-mentioned component (A) to the silane coupling agent having an acid anhydride structure in the molecule [component (A): silane coupling agent having an acid anhydride structure in the molecule], the amount is preferably 100:0.1~100:30, more preferably 100:0.3~100:20, particularly preferably 100:0.5~100:15, and most preferably 100:1~100:10. The curable composition containing the component (A) and the silane coupling agent having an acid anhydride structure in the molecule according to this ratio will have better adhesion.
[硬化性組合物] 本發明的硬化性組合物係(A)成分與(C)成分的合計量,佔硬化性組合物的固含量中,較佳係50~100質量%、更佳係70~100質量%。 本發明中,所謂「固含量」係指硬化性組合物中除溶劑以外的成分。[Curing composition] The curable composition of the present invention is the total amount of component (A) and component (C), which preferably accounts for 50-100% by mass, and more preferably 70-100% by mass, of the solid content of the curable composition. In the present invention, the so-called "solid content" refers to the components in the curable composition excluding the solvent.
本發明的硬化性組合物中,亦可含有(B)成分之平均初級粒徑5nm以上且40nm以下的微粒子(以下稱「微粒子(B)」)。 含有微粒子(B)的硬化性組合物在塗佈步驟中的作業性優異。 就從可輕易獲得此項效果的觀點,微粒子(B)的平均初級粒徑較佳係5~30nm、更佳係5~20nm。The curable composition of the present invention may also contain microparticles (hereinafter referred to as "microparticles (B)") having an average primary particle size of 5 nm or more and 40 nm or less of component (B). The curable composition containing microparticles (B) has excellent workability in the coating step. From the perspective of easily obtaining this effect, the average primary particle size of microparticles (B) is preferably 5 to 30 nm, more preferably 5 to 20 nm.
微粒子(B)的平均初級粒徑係藉由使用穿透式電子顯微鏡,觀察微粒子的形狀便可求得。The average primary particle size of the microparticles (B) can be obtained by observing the shape of the microparticles using a transmission electron microscope.
微粒子(B)的材質係可舉例如:金屬;金屬氧化物;礦物;碳酸鈣、碳酸鎂等金屬碳酸鹽;硫酸鈣、硫酸鋇等金屬硫酸鹽;氫氧化鋁等金屬氫氧化物;矽酸鋁、矽酸鈣、矽酸鎂等金屬矽酸鹽;二氧化矽等無機成分;聚矽氧;丙烯酸系聚合體等有機成分等。 再者,所使用微粒子(B)亦可表面經修飾。The material of the microparticles (B) may be, for example, metals; metal oxides; minerals; metal carbonates such as calcium carbonate and magnesium carbonate; metal sulfates such as calcium sulfate and barium sulfate; metal hydroxides such as aluminum hydroxide; metal silicates such as aluminum silicate, calcium silicate and magnesium silicate; inorganic components such as silicon dioxide; polysilicon; organic components such as acrylic polymers, etc. Furthermore, the surface of the microparticles (B) used may also be modified.
微粒子(B)係可單獨使用1種、或組合使用2種以上。 當本發明的硬化性組合物係含有微粒子(B)[(B)成分]的情況,(B)成分的含有量並無特別的限定,依上述(A)成分與(B)成分的質量比[(A)成分:(B)成分]計,該量較佳係100:0.1~100:90、更佳係100:0.2~100:60、特佳係100:0.3~100:50、最佳係100:0.5~100:40、最最佳係100:0.8~100:30。藉由(B)成分係依上述範圍內使用,便可更加顯現加權(B)成分的效果。The microparticles (B) may be used alone or in combination of two or more. When the curable composition of the present invention contains microparticles (B) [(B) component], the content of the (B) component is not particularly limited. According to the mass ratio of the (A) component to the (B) component [(A) component: (B) component], the content is preferably 100:0.1~100:90, more preferably 100:0.2~100:60, particularly preferably 100:0.3~100:50, optimally 100:0.5~100:40, and most optimally 100:0.8~100:30. By using the (B) component within the above range, the effect of the weighted (B) component can be more pronounced.
本發明的硬化性組合物係在不致損害本發明目的範圍內,亦可含有其他成分。 該其他成分係可舉例如:抗氧化劑、紫外線吸收劑、光安定劑等。The curable composition of the present invention may also contain other ingredients within the scope that does not harm the purpose of the present invention. Such other ingredients may include, for example, antioxidants, ultraviolet absorbers, light stabilizers, etc.
抗氧化劑係為防止加熱時出現氧化劣化而添加。抗氧化劑係可舉例如:磷系抗氧化劑、酚系抗氧化劑、硫系抗氧化劑等。Antioxidants are added to prevent oxidation degradation during heating. Examples of antioxidants include phosphorus-based antioxidants, phenol-based antioxidants, and sulfur-based antioxidants.
磷系抗氧化劑係可舉例如:亞磷酸酯類、氧雜膦菲氧化物類等。酚系抗氧化劑係可舉例如:單酚類、雙酚類、高分子型酚類等。硫系抗氧化劑係可舉例如:3,3’-硫代二丙酸二月桂酯、3,3’-硫代二丙酸二肉荳蔻酯、3,3’-硫代二丙酸二硬脂酯等。Examples of phosphorus-based antioxidants include phosphites, oxophosphine phenanthroline oxides, etc. Examples of phenol-based antioxidants include monophenols, bisphenols, and polymer phenols, etc. Examples of sulfur-based antioxidants include dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-thiodipropionate, and distearyl 3,3'-thiodipropionate, etc.
該等抗氧化劑係可單獨使用1種、或組合使用2種以上。抗氧化劑的含有量並無特別的限定,相對於(A)成分通常係在10質量%以下。The antioxidants may be used alone or in combination of two or more. The amount of the antioxidant contained is not particularly limited, but is usually 10% by mass or less relative to the component (A).
紫外線吸收劑係在提升所獲得硬化物之耐光性目的下添加。 紫外線吸收劑係可舉例如:水楊酸類、二苯基酮類、苯并三唑類、受阻胺類等。 紫外線吸收劑係可單獨使用1種、或組合使用2種以上。紫外線吸收劑的含有量並無特別的限定,相對於(A)成分通常係在10質量%以下。The UV absorber is added for the purpose of improving the light resistance of the obtained cured product. Examples of UV absorbers include salicylic acid, diphenyl ketone, benzotriazole, hindered amine, etc. UV absorbers can be used alone or in combination of two or more. The content of the UV absorber is not particularly limited, but is usually less than 10% by mass relative to component (A).
光安定劑係在提升所獲得硬化物之耐光性目的下添加。 光安定劑係可舉例如:聚[{6-(1,1,3,3,-四甲基丁基)胺基-1,3,5-三嗪-2,4-二基}{(2,2,6,6-四甲基-4-哌啶)亞胺基}六亞甲基{(2,2,6,6-四甲基-4-哌啶)亞胺基}]等受阻胺類等。 該等光安定劑係可單獨使用1種、或組合使用2種以上。光安定劑的含有量,相對於(A)成分通常係在20質量%以下。Light stabilizers are added for the purpose of improving the light resistance of the obtained cured product. Light stabilizers include hindered amines such as poly[{6-(1,1,3,3,-tetramethylbutyl)amino-1,3,5-triazine-2,4-diyl}{(2,2,6,6-tetramethyl-4-piperidinyl)imino}hexamethylene{(2,2,6,6-tetramethyl-4-piperidinyl)imino}], etc. Such light stabilizers can be used alone or in combination of two or more. The content of light stabilizers is usually less than 20% by mass relative to component (A).
本發明的硬化性組合物亦可含有稀釋劑。稀釋劑係在能溶解(或分散)本發明硬化性組合物之成分前提下,其餘並無特別的限定。稀釋劑係可使用1種、亦可併用2種以上。The curable composition of the present invention may also contain a diluent. The diluent is not particularly limited as long as it can dissolve (or disperse) the components of the curable composition of the present invention. The diluent may be used alone or in combination of two or more.
當本發明硬化性組合物係含有稀釋劑的情況,含有量係固含量濃度成為較佳60質量%以上且未滿100質量%、更佳係65~98質量%、特佳係70~95質量%的量。 本發明所使用聚倍半矽氧烷化合物(A)大多係分子量較小。含有此種聚倍半矽氧烷化合物(A)的硬化性組合物,即便未大量含有稀釋劑(即,即使固含量濃度較高),仍具有良好的塗佈性。 當使用固含量濃度高之硬化性組合物的情況,即使塗膜的乾燥條件、硬化條件未嚴格管理,但因為硬化物幾乎未含溶劑,因而可安定地形成具一定特性的硬化物。When the curable composition of the present invention contains a diluent, the content is preferably 60% by mass or more and less than 100% by mass, more preferably 65 to 98% by mass, and particularly preferably 70 to 95% by mass. The polysilsesquioxane compound (A) used in the present invention is mostly of a small molecular weight. The curable composition containing such a polysilsesquioxane compound (A) has good coating properties even if it does not contain a large amount of diluent (i.e., even if the solid content concentration is high). When a curable composition with a high solid content concentration is used, even if the drying conditions and curing conditions of the coating are not strictly controlled, because the cured product contains almost no solvent, a cured product with certain characteristics can be stably formed.
本發明的硬化性組合物係因為含有聚倍半矽氧烷化合物(A),因而折射率高。 本發明硬化性組合物的25℃折射率(nD)通常係達1.46以上、較佳係1.46~1.56、特佳係1.46~1.54、最佳係1.47~1.53。 硬化性組合物的折射率(nD)係使用實施例所記載方法便可測定。The curable composition of the present invention has a high refractive index because it contains a polysilsesquioxane compound (A). The refractive index (nD) of the curable composition of the present invention at 25°C is usually 1.46 or more, preferably 1.46 to 1.56, particularly preferably 1.46 to 1.54, and most preferably 1.47 to 1.53. The refractive index (nD) of the curable composition can be measured using the method described in the embodiments.
本發明的硬化性組合物係例如將上述(A)成分與(C)成分、以及視所需的該等以外之成分,依既定比例進行混合,並利用脫泡便可調製。 混合方法、脫泡方法並無特別的限定,可利用公知方法。The curable composition of the present invention is prepared by mixing the above-mentioned component (A) and component (C), and other components as needed, in a predetermined ratio and defoaming. The mixing method and defoaming method are not particularly limited, and known methods can be used.
2)硬化物 本發明的硬化物係使本發明硬化性組合物進行硬化而獲得。 使本發明硬化性組合物進行硬化的方法係可例如加熱硬化。硬化時的加熱溫度通常係100~200℃,加熱時間通常係10分鐘至20小時、較佳係30分鐘至10小時。2) Cured product The cured product of the present invention is obtained by curing the curable composition of the present invention. The method for curing the curable composition of the present invention is, for example, heat curing. The heating temperature during curing is usually 100-200°C, and the heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
本發明的硬化物係耐熱性與黏著性均優異。 本發明的硬化物具有該等特性之事,例如可依如下述進行確認。即,在矽晶片的鏡面上既定量塗佈本發明的硬化性組合物,使塗佈面載置於被黏物上,經壓接,施行加熱處理而使硬化。將其放置於經預先加熱至既定溫度(例如23℃、100℃)的焊合測試儀之測定平台上30秒中,從距被黏物50μm高度位置處,對黏著面朝水平方向(剪切方向)施加應力,並測定試驗片與被黏物的黏著力。The hardened material of the present invention has excellent heat resistance and adhesion. The fact that the hardened material of the present invention has these characteristics can be confirmed, for example, as follows. That is, a predetermined amount of the hardening composition of the present invention is applied on the mirror surface of a silicon wafer, and the coated surface is placed on an adherend, pressed, and heat-treated to harden. It is placed on a measuring platform of a welding tester that has been preheated to a predetermined temperature (e.g., 23°C, 100°C) for 30 seconds, and a stress is applied to the adhesive surface in the horizontal direction (shear direction) from a height of 50μm from the adherend, and the adhesion between the test piece and the adherend is measured.
本發明硬化物的黏著力,在23℃下較佳係達100N/4mm2 以上、更佳係達120N/4mm2 以上。 本發明硬化物的黏著力,在100℃下較佳係達40N/4mm2 以上、更佳係達45N/4mm2 以上。 本說明書中,所謂「4mm2 」係指「2mm平方」,即2mm×2mm(邊長2mm的正方形)。The adhesive force of the cured product of the present invention is preferably 100N/ 4mm2 or more at 23°C, more preferably 120N/ 4mm2 or more. The adhesive force of the cured product of the present invention is preferably 40N/ 4mm2 or more at 100°C, more preferably 45N/ 4mm2 or more. In this specification, " 4mm2 " means "2mm square", i.e., 2mm×2mm (a square with a side length of 2mm).
本發明的硬化物係折射率高、且具優異黏著性。所以,本發明的硬化物較佳係使用為高折射率的黏著劑層等。 本發明硬化物的25℃折射率(nD)通常係1.46以上、較佳係1.46~1.56、更佳係1.46~1.54、特佳係1.47~1.53。 硬化物的折射率(nD)係使用阿貝式折射儀便可測定。The hardened material of the present invention has a high refractive index and excellent adhesion. Therefore, the hardened material of the present invention is preferably used as an adhesive layer with a high refractive index. The 25°C refractive index (nD) of the hardened material of the present invention is usually above 1.46, preferably 1.46~1.56, more preferably 1.46~1.54, and particularly preferably 1.47~1.53. The refractive index (nD) of the hardened material can be measured using an Abbe refractometer.
因為具有上述特性,因而本發明的硬化物較佳係使用為光元件固定材。Due to the above characteristics, the hardened material of the present invention is preferably used as an optical element fixing material.
3)硬化性組合物的使用方法 本發明的方法係將本發明的硬化性組合物,使用為光元件固定材用黏著劑或光元件固定材用密封材的方法。 光元件係可舉例如:LED、LD等發光元件、以及受光元件、複合光元件、光積體電路等。3) Method of using the curable composition The method of the present invention is a method of using the curable composition of the present invention as an adhesive for optical element fixing material or a sealing material for optical element fixing material. The optical element may be, for example, a light-emitting element such as LED, LD, a light-receiving element, a composite optical element, an optical integrated circuit, etc.
<光元件固定材用黏著劑> 本發明的硬化性組合物較佳係使用為光元件固定材用黏著劑。 將本發明的硬化性組合物使用為光元件固定材用黏著劑的方法,係可例如:在黏著對象材料(光元件與其基板等)其中一者(或雙方)的黏著面上塗佈該組合物,經壓接後,施行加熱硬化,使黏著對象材料彼此間進行牢固黏著的方法。本發明硬化性組合物的塗佈量並無特別的限定,只要利用使硬化,便能將黏著對象材料彼此間牢固黏著的量便可。通常係使硬化性組合物的塗膜厚度成為0.5~5μm、較佳1~3μm的量。<Adhesive for optical element fixing material> The curable composition of the present invention is preferably used as an adhesive for optical element fixing material. The method of using the curable composition of the present invention as an adhesive for optical element fixing material is, for example, to apply the composition on the adhesive surface of one (or both) of the bonding materials (optical element and its substrate, etc.), and after pressing, heat curing is performed to make the bonding materials firmly adhere to each other. There is no particular limitation on the amount of the curable composition applied, as long as the amount is used to make the bonding materials firmly adhere to each other. Usually, the coating thickness of the curable composition is 0.5~5μm, preferably 1~3μm.
供黏著光元件用的基板材料係可舉例如:鈉鈣玻璃、耐熱性硬質玻璃等玻璃類;陶瓷;藍寶石;鐵、銅、鋁、金、銀、白金、鉻、鈦及該等金屬合金;不鏽鋼(SUS302、SUS304、SUS304L、SUS309等)等金屬類;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、乙烯-醋酸乙烯酯共聚物、聚苯乙烯、聚碳酸酯、聚甲基戊烯、聚碸、聚醚醚酮、聚醚碸、聚苯硫醚、聚醚醯亞胺、聚醯亞胺、聚醯胺、丙烯酸樹脂、降莰烯系樹脂、環烯烴樹脂、玻璃環氧樹脂等合成樹脂等等。The substrate material for bonding optical components can be exemplified by: glass such as sodium calcium glass and heat-resistant hard glass; ceramics; sapphire; iron, copper, aluminum, gold, silver, platinum, chromium, titanium and their metal alloys; metals such as stainless steel (SUS302, SUS304, SUS304L, SUS309, etc.); polyethylene terephthalate; Ester, polybutylene terephthalate, polyethylene naphthalate, ethylene-vinyl acetate copolymer, polystyrene, polycarbonate, polymethylpentene, polysulfone, polyetheretherketone, polyethersulfone, polyphenylene sulfide, polyetherimide, polyimide, polyamide, acrylic resin, norbornene resin, cycloolefin resin, glass epoxy resin and other synthetic resins, etc.
加熱硬化時的加熱溫度係依照所使用硬化性組合物等,通常係100~200℃。加熱時間通常係10分鐘至20小時、較佳係30分鐘至10小時。The heating temperature during heat curing depends on the curable composition used, etc., and is usually 100-200°C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
<光元件固定材用密封材> 本發明的硬化性組合物頗適用為光元件固定材用密封材。 將本發明的硬化性組合物使用為光元件固定材用密封材的方法,係可例如:將該組合物成形為所需形狀,而獲得內含有光元件的成形體之後,再使其進行加熱硬化,而製造光元件密封體的方法等。 將本發明的硬化性組合物成形為所需形狀的方法並無特別的限定,可採用通常的轉印成形法、注模法等公知造模法。<Sealing material for optical element fixing material> The curable composition of the present invention is suitable for use as a sealing material for optical element fixing material. The method of using the curable composition of the present invention as a sealing material for optical element fixing material is, for example, a method of forming the composition into a desired shape to obtain a molded body containing an optical element, and then heat-curing it to produce an optical element sealed body. The method of forming the curable composition of the present invention into a desired shape is not particularly limited, and a conventional transfer molding method, injection molding method, or other known molding method can be used.
加熱硬化時的加熱溫度係依照所使用硬化性組合物等,通常係100~200℃。加熱時間通常係10分鐘至20小時、較佳係30分鐘至10小時。The heating temperature during heat curing depends on the curable composition used, etc., and is usually 100-200°C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
所獲得的光元件密封體因為有使用本發明的硬化性組合物,所以耐熱性與黏著性均優異。 [實施例]The obtained optical component sealed body has excellent heat resistance and adhesion because it uses the curable composition of the present invention. [Example]
以下,舉實施例針對本發明進行更詳細說明。惟,本發明並不僅侷限以下實施例。The present invention is described in more detail below with reference to the following embodiments. However, the present invention is not limited to the following embodiments.
(平均分子量測定) 聚倍半矽氧烷化合物的質量平均分子量(Mw)與數量平均分子量(Mn),係屬於標準聚苯乙烯換算值,依照以下的裝置及條件進行測定。 裝置名:HLC-8220GPC、東曹股份有限公司製 管柱:由TSKgelGMHXL、TSKgelGMHXL、及TSKge12000HXL依序連結 溶劑:四氫呋喃 注入量:20μl 測定溫度:40℃ 流速:0.6ml/分 檢測器:示差折射計(Average molecular weight measurement) The mass average molecular weight (Mw) and number average molecular weight (Mn) of polysilsesquioxane compounds are standard polystyrene conversion values and are measured according to the following equipment and conditions. Apparatus name: HLC-8220GPC, manufactured by Tosoh Corporation Column: TSKgelGMHXL, TSKgelGMHXL, and TSKge12000HXL connected in sequence Solvent: Tetrahydrofuran Injection volume: 20μl Measurement temperature: 40℃ Flow rate: 0.6ml/min Detector: Differential refractometer
(29 Si-NMR測定) 為調查聚倍半矽氧烷化合物的重複單元與量,便依以下條件施行29 Si-NMR測定。 裝置:Bruker BioSpin公司製 AV-50029 Si-NMR共振頻率:99.352MHz 探針:5mmϕ溶液探針 測定溫度:室溫(25℃) 試料轉數:20kHz 測定法:反門控去偶法29 Si偏向角:90°29 Si 90°脈衝寬:8.0μs 反覆時間:5s 積分次數:9200次 觀測寬:30kHz( 29 Si-NMR measurement) In order to investigate the repeating unit and amount of polysilsesquioxane compounds, 29 Si-NMR measurement was performed under the following conditions. Apparatus: AV-500 manufactured by Bruker BioSpin 29 Si-NMR resonance frequency: 99.352MHz Probe: 5mmϕ solution probe Measurement temperature: room temperature (25°C) Sample rotation speed: 20kHz Measurement method: reverse gated decoupling method 29 Si deflection angle: 90° 29 Si 90° Pulse width: 8.0μs Repeat time: 5s Number of integrations: 9200 times Observation width: 30kHz
(29 Si-NMR試料製作方法) 為縮短鬆弛時間,便添加鬆弛試劑之Fe(acac)3 進行測定。 聚倍半矽氧烷化合物濃度:15質量% Fe(acac)3 濃度:0.6質量% 測定溶劑:丙酮 內部標準:TMS( 29 Si-NMR sample preparation method) In order to shorten the relaxation time, Fe(acac) 3 , a relaxation reagent, was added for measurement. Polysilsesquioxane compound concentration: 15 mass % Fe(acac) 3 concentration: 0.6 mass % Measurement solvent: Acetone Internal standard: TMS
(波形處理分析) 針對經傅立葉轉換後的質譜各尖峰,由峰頂位置求取化學位移,並依以下範圍施行各尖峰的積分。從所獲得的值計算出T1位點、T2位點、T3位點的比例。 具有苯基的T位點(T1:-65~-58ppm、T2:-74~-65ppm、T3:-82~-75ppm) 具有甲基的T位點(T1:-50~-46ppm、T2:-61~-52ppm、T3:-70~-61ppm)(Waveform processing analysis) For each peak of the mass spectrum after Fourier transformation, the chemical shift is obtained from the peak top position, and each peak is integrated according to the following range. The ratio of the T1 site, T2 site, and T3 site is calculated from the obtained value. T site with phenyl group (T1: -65~-58ppm, T2: -74~-65ppm, T3: -82~-75ppm) T site with methyl group (T1: -50~-46ppm, T2: -61~-52ppm, T3: -70~-61ppm)
(折射率) 使用多波長阿貝式折射儀(ATAGO股份有限公司製、DR-M2),在25℃下,測定聚倍半矽氧烷化合物的折射率(nD)。(Refractive index) The refractive index (nD) of the polysilsesquioxane compound was measured at 25°C using a multi-wavelength Abbe refractometer (DR-M2, manufactured by ATAGO Co., Ltd.).
(製造例1) 在300ml茄型燒瓶中,裝入苯基三甲氧基矽烷9.34g(47.1mmol)及甲基三乙氧基矽烷8.40g(47.1mmol)後,一邊攪拌,一邊添加已在蒸餾水5.09g中溶解35質量%鹽酸0.025g(相對於矽烷化合物總量,HCl為0.25mol%)的水溶液,整體在30℃下攪拌2小時,接著升溫至80℃並攪拌20小時。 將反應液放置冷卻至室溫後,在其中添加醋酸丙酯50g與水100g,施行分液處理,獲得含有反應生成物的有機層。在該有機層中添加硫酸鎂施行乾燥處理。經過濾除去硫酸鎂後,有機層利用蒸發器濃縮,接著將所獲得濃縮物施行真空乾燥,獲得聚倍半矽氧烷化合物(A1)。(Production Example 1) After placing 9.34 g (47.1 mmol) of phenyltrimethoxysilane and 8.40 g (47.1 mmol) of methyltriethoxysilane in a 300 ml eggplant-shaped flask, an aqueous solution of 0.025 g of 35 mass% hydrochloric acid (0.25 mol% of HCl relative to the total amount of silane compounds) dissolved in 5.09 g of distilled water was added while stirring, and the whole was stirred at 30°C for 2 hours, and then the temperature was raised to 80°C and stirred for 20 hours. After the reaction solution was left to cool to room temperature, 50 g of propyl acetate and 100 g of water were added thereto, and a separation treatment was performed to obtain an organic layer containing the reaction product. Magnesium sulfate was added to the organic layer for drying. After removing magnesium sulfate by filtration, the organic layer is concentrated using an evaporator, and then the obtained concentrate is vacuum dried to obtain a polysilsesquioxane compound (A1).
(製造例2) 在300ml茄型燒瓶中,裝入苯基三甲氧基矽烷12.55g(63.3mmol)及甲基三乙氧基矽烷4.83g(27.1mmol)後,一邊攪拌,一邊添加已在蒸餾水4.88g中溶解35質量%鹽酸0.024g(相對於矽烷化合物總量,HCl為0.25mol%)的水溶液,整體在30℃下攪拌2小時,接著升溫至80℃並攪拌20小時。 一邊持續攪拌內容物,一邊在其中添加醋酸丙酯17g、與28質量%氨水0.149g(相對於苯基三乙氧基矽烷為2.5mol%),升溫至80℃並攪拌20小時。 將反應液放置冷卻至室溫後,依照與製造例1同樣地施行分液、乾燥處理等,而獲得聚倍半矽氧烷化合物(A2)。(Production Example 2) In a 300 ml eggplant-shaped flask, 12.55 g (63.3 mmol) of phenyltrimethoxysilane and 4.83 g (27.1 mmol) of methyltriethoxysilane were placed, and an aqueous solution of 0.024 g of 35% by mass hydrochloric acid (0.25 mol% of HCl relative to the total amount of silane compounds) dissolved in 4.88 g of distilled water was added while stirring, and the whole was stirred at 30°C for 2 hours, and then the temperature was raised to 80°C and stirred for 20 hours. While continuing to stir the contents, 17 g of propyl acetate and 0.149 g of 28% by mass ammonia water (2.5 mol% relative to phenyltriethoxysilane) were added thereto, and the temperature was raised to 80°C and stirred for 20 hours. After the reaction solution was left to cool to room temperature, liquid separation, drying treatment, etc. were performed in the same manner as in Production Example 1 to obtain a polysilsesquioxane compound (A2).
(製造例3) 在300ml茄型燒瓶中,裝入苯基三甲氧基矽烷9.34g(47.1mmol)及甲基三乙氧基矽烷8.40g(47.1mmol)後,一邊攪拌,一邊添加已在蒸餾水5.09g中溶解35質量%鹽酸0.294g(相對於矽烷化合物總量,HCl為3.00mol%)的水溶液,整體在30℃下攪拌2小時,接著升溫至80℃並攪拌20小時。 將反應液放置冷卻至室溫後,在其中添加醋酸丙酯50g與水100g,施行分液處理,獲得含有反應生成物的有機層。在該有機層中添加硫酸鎂施行乾燥處理。經過濾除去硫酸鎂後,有機層利用蒸發器濃縮,接著將所獲得濃縮物施行真空乾燥,獲得聚倍半矽氧烷化合物(A3)。(Production Example 3) After placing 9.34 g (47.1 mmol) of phenyltrimethoxysilane and 8.40 g (47.1 mmol) of methyltriethoxysilane in a 300 ml eggplant-shaped flask, an aqueous solution of 0.294 g (3.00 mol% of HCl relative to the total amount of silane compounds) of 35% by mass of hydrochloric acid dissolved in 5.09 g of distilled water was added while stirring, and the whole was stirred at 30°C for 2 hours, and then the temperature was raised to 80°C and stirred for 20 hours. After the reaction solution was left to cool to room temperature, 50 g of propyl acetate and 100 g of water were added thereto, and a separation treatment was performed to obtain an organic layer containing the reaction product. Magnesium sulfate was added to the organic layer for drying. After removing magnesium sulfate by filtration, the organic layer is concentrated by an evaporator, and then the concentrate is vacuum dried to obtain a polysilsesquioxane compound (A3).
(比較製造例1) 在300ml茄型燒瓶中裝入苯基三甲氧基矽烷14.455g(72.9mmol)後,一邊攪拌,一邊添加已在蒸餾水3.937g中溶解35質量%鹽酸0.0188g(相對於苯基三甲氧基矽烷,HCl為0.25mol%)的水溶液,整體在30℃下攪拌2小時,接著升溫至70℃並攪拌22小時。 一邊持續攪拌內容物,一邊在其中添加醋酸丙酯15g、與28質量%氨水0.0109g(相對於苯基三乙氧基矽烷為0.25mol%),升溫至80℃並攪拌20小時。 將反應液放置冷卻至室溫後,依照與製造例1同樣地施行分液、乾燥處理等,而獲得聚倍半矽氧烷化合物(A4)。(Comparative Production Example 1) After placing 14.455 g (72.9 mmol) of phenyltrimethoxysilane in a 300 ml eggplant-shaped flask, an aqueous solution of 0.0188 g of 35 mass% hydrochloric acid (0.25 mol% of HCl relative to phenyltrimethoxysilane) dissolved in 3.937 g of distilled water was added while stirring, and the whole was stirred at 30°C for 2 hours, and then the temperature was raised to 70°C and stirred for 22 hours. While continuing to stir the contents, 15 g of propyl acetate and 0.0109 g of 28 mass% ammonia water (0.25 mol% relative to phenyltriethoxysilane) were added thereto, and the temperature was raised to 80°C and stirred for 20 hours. After the reaction solution was left to cool to room temperature, liquid separation, drying treatment, etc. were performed in the same manner as in Production Example 1 to obtain a polysilsesquioxane compound (A4).
(比較製造例2) 在300ml茄型燒瓶中裝入苯基三甲氧基矽烷28.77g(145.1mmol)及甲基三乙氧基矽烷0.2675g(1.5mmol)後,一邊攪拌,一邊添加已在蒸餾水8.24g中溶解35質量%鹽酸0.477g(相對於矽烷化合物總量,HCl為3mol%)的水溶液,整體在30℃下攪拌2小時,接著升溫至80℃並攪拌20小時。 將反應液放置冷卻至室溫後,依照與製造例1同樣地施行分液、乾燥處理等,而獲得聚倍半矽氧烷化合物(A5)。(Comparative Preparation Example 2) After placing 28.77 g (145.1 mmol) of phenyltrimethoxysilane and 0.2675 g (1.5 mmol) of methyltriethoxysilane in a 300 ml eggplant-shaped flask, an aqueous solution of 0.477 g (3 mol% of HCl relative to the total amount of the silane compound) of 35% by mass of hydrochloric acid dissolved in 8.24 g of distilled water was added while stirring, and the whole was stirred at 30°C for 2 hours, and then the temperature was raised to 80°C and stirred for 20 hours. After the reaction solution was left to cool to room temperature, liquid separation and drying treatment were performed in the same manner as in Preparation Example 1 to obtain a polysilsesquioxane compound (A5).
所獲得聚倍半矽氧烷化合物(PSQ)的詳細內容,如第1表所示。The detailed contents of the obtained polysilsesquioxane compound (PSQ) are shown in Table 1.
[表1]
第1表
實施例、比較例及參考例所使用的化合物,係如下示:The compounds used in the Examples, Comparative Examples and Reference Examples are as follows:
(矽烷偶合劑) 矽烷偶合劑(C1):1,3,5-N-三[3-(三甲氧基矽烷基)丙基]三聚異氰酸酯 矽烷偶合劑(C2):3-(三甲氧基矽烷基)丙基琥珀酸酐(Silane coupling agent) Silane coupling agent (C1): 1,3,5-N-tris[3-(trimethoxysilyl)propyl]triisocyanate Silane coupling agent (C2): 3-(trimethoxysilyl)propylsuccinic anhydride
(填充劑) 二氧化矽微粒子:(日本矽石股份有限公司製、製品名「AEROSIL RX300」、平均初級粒徑:7nm、比表面積:210m2 /g)(Filling agent) Silica particles: (manufactured by Nippon Silica Co., Ltd., product name "AEROSIL RX300", average primary particle size: 7nm, specific surface area: 210m2 /g)
(實施例1) 在聚倍半矽氧烷化合物(A1)100質量份中,添加二氧化矽微粒子5質量份,更進一步添加二乙二醇單丁醚醋酸酯:三丙二醇正丁醚=40:60(質量比)的混合溶劑,整體施行攪拌。利用三輥研磨機施行分散處理後,添加矽烷偶合劑(C1)30質量份、矽烷偶合劑(C2)3質量份,整體充分混合、脫泡,獲得固含量濃度80質量%的硬化性組合物。(Example 1) In 100 parts by mass of polysilsesquioxane compound (A1), 5 parts by mass of silica microparticles are added, and a mixed solvent of diethylene glycol monobutyl ether acetate: tripropylene glycol n-butyl ether = 40:60 (mass ratio) is further added, and the whole is stirred. After dispersion treatment using a three-roll mill, 30 parts by mass of silane coupling agent (C1) and 3 parts by mass of silane coupling agent (C2) are added, and the whole is fully mixed and defoamed to obtain a curable composition with a solid content concentration of 80% by mass.
(實施例2) 在實施例1中,除取代聚倍半矽氧烷化合物(A1),改為使用聚倍半矽氧烷化合物(A2),且將二氧化矽微粒子含有量變更為20質量份,更變更混合溶劑量之外,其餘均依照與實施例1同樣地獲得固含量濃度80質量%的硬化性組合物。(Example 2) In Example 1, except that the polysilsesquioxane compound (A1) was replaced with the polysilsesquioxane compound (A2), the content of the silicon dioxide particles was changed to 20 parts by mass, and the amount of the mixed solvent was changed, the rest was the same as in Example 1 to obtain a curable composition with a solid content concentration of 80% by mass.
(實施例3) 除在實施例1中,取代聚倍半矽氧烷化合物(A1),改為使用聚倍半矽氧烷化合物(A3)之外,其餘均依照與實施例1同樣地獲得固含量濃度80質量%的硬化性組合物。(Example 3) Except that in Example 1, the polysilsesquioxane compound (A1) is replaced with the polysilsesquioxane compound (A3), the rest is the same as in Example 1 to obtain a curable composition with a solid content concentration of 80 mass %.
(比較例1) 在實施例1中,除取代聚倍半矽氧烷化合物(A1),改為使用聚倍半矽氧烷化合物(A4),且將二氧化矽微粒子含有量變更為20質量份,更變更混合溶劑量之外,其餘均依照與實施例1同樣地獲得固含量濃度80質量%的硬化性組合物。(Comparative Example 1) In Example 1, except that the polysilsesquioxane compound (A1) was replaced with the polysilsesquioxane compound (A4), the content of the silicon dioxide particles was changed to 20 parts by mass, and the amount of the mixed solvent was changed, the rest was the same as in Example 1 to obtain a curable composition with a solid content concentration of 80% by mass.
(比較例2) 在實施例1中,除取代聚倍半矽氧烷化合物(A1),改為使用聚倍半矽氧烷化合物(A5),且未使用矽烷偶合劑(C1)與矽烷偶合劑(C2),並變更混合溶劑量之外,其餘均依照與實施例1同樣地獲得固含量濃度78質量%的硬化性組合物。(Comparative Example 2) In Example 1, except that the polysilsesquioxane compound (A1) was replaced with the polysilsesquioxane compound (A5), the silane coupling agent (C1) and the silane coupling agent (C2) were not used, and the amount of the mixed solvent was changed, the rest was the same as in Example 1 to obtain a curable composition with a solid content concentration of 78 mass %.
(比較例3) 在實施例1中,除未使用矽烷偶合劑(C1)與矽烷偶合劑(C2),且變更混合溶劑量之外,其餘均依照與實施例1同樣地獲得固含量濃度75質量%的硬化性組合物。(Comparative Example 3) In Example 1, except that silane coupling agent (C1) and silane coupling agent (C2) were not used and the amount of mixed solvent was changed, the rest was the same as Example 1 to obtain a curable composition with a solid content concentration of 75 mass%.
使用實施例、比較例及參考例所獲得的硬化性組合物,分別施行以下的測定、試驗。 [折射率測定] 使用多波長阿貝式折射儀(ATAGO股份有限公司製、DR-M2),在25℃下測定硬化性組合物的折射率(nD)。The following measurements and tests were performed using the curable compositions obtained in the Examples, Comparative Examples, and Reference Examples. [Refractive index measurement] The refractive index (nD) of the curable composition was measured at 25°C using a multi-wavelength Abbe refractometer (manufactured by ATAGO Co., Ltd., DR-M2).
[耐龜裂性評價] 在邊長0.5mm的正方形玻璃晶片之鏡面上,分別依成為厚度約2μm的方式塗佈實施例及比較例所獲得的硬化性組合物,將塗佈面載置於被黏物(鍍銀銅板)上並施行壓接。然後,依170℃施行2小時加熱處理而使硬化,獲得具試驗片之被黏物。另外,針對1種硬化性組合物製作20個具試驗片之被黏物。使用掃描式電子顯微鏡(KEYENCE公司製、VE-9800S),觀察從玻璃晶片滲出的樹脂部(填角部),計數有出現龜裂的樣品數,將龜裂產生率0%以上且未滿25%者評為「A」,25%以上且未滿50%者評為「B」,50%以上且100%以下者評為「C」。[Evaluation of crack resistance] The curable compositions obtained in the examples and comparative examples were coated on the mirror surface of a square glass wafer with a side length of 0.5 mm to a thickness of about 2 μm, and the coated surface was placed on an adherend (silver-plated copper plate) and pressed. Then, the adherend was cured by heating at 170°C for 2 hours to obtain a test piece. In addition, 20 test pieces were prepared for each curable composition. The resin portion (fillet portion) exuded from the glass wafer was observed using a scanning electron microscope (KEYENCE VE-9800S), and the number of samples with cracks was counted. Samples with a crack occurrence rate of 0% or more and less than 25% were rated "A", those with a crack occurrence rate of 25% or more and less than 50% were rated "B", and those with a crack occurrence rate of 50% or more and less than 100% were rated "C".
[黏著強度評價] 在邊長2mm的正方形(面積4mm2 )矽晶片之鏡面上,分別依成為厚度約2μm的方式塗佈實施例及比較例所獲得的硬化性組合物,將塗佈面載置於被黏物(鍍銀銅板)上並施行壓接。然後,依170℃施行2小時加熱處理而使硬化,獲得具試驗片之被黏物。將該具試驗片之被黏物,放置於經預先加熱至既定溫度(23℃、100℃)的焊合測試儀(Dage公司製、系列4000)之測定平台上30秒中,從距被黏物50μm高度位置處,依速度200μm/s對黏著面朝水平方向(剪切方向)施加應力,測定23℃與100℃的試驗片與被黏物之黏著力(N/4mm2 )。[Evaluation of Adhesion Strength] The curable compositions obtained in the Example and the Comparative Example were coated on the mirror surface of a 2mm square ( 4mm2 area) silicon wafer to a thickness of about 2μm, and the coated surface was placed on an adherend (silver-plated copper plate) and pressed. Then, the adhesive was cured by heating at 170℃ for 2 hours to obtain an adherend with a test piece. The adherend with the test piece was placed on the measuring platform of a welding tester (Dage, Series 4000) preheated to a predetermined temperature (23°C, 100°C) for 30 seconds. A stress was applied to the adhesive surface in the horizontal direction (shear direction) at a speed of 200 μm/s from a height of 50 μm from the adherend. The adhesion (N/4mm 2 ) between the test piece at 23°C and 100°C and the adherend was measured.
測定結果、評價結果,如第2表所示。The measurement results and evaluation results are shown in Table 2.
[表2]
第2表
由上述實施例、比較例及參考例得知下述。 實施例1~3的硬化性組合物,因為具有含重複單元(1)之聚倍半矽氧烷化合物(PSQ(A1)、PSQ(A2)、PSQ(A3)),因而折射率獲適度提高。 再者,實施例1~3的硬化性組合物係含有矽烷偶合劑。又,PSQ(A1)、PSQ(A2)及PSQ(A3)任一者均含有重複單元(2),且適度含有T2位點。所以,實施例1~3的硬化物係耐龜裂性與黏著性均優異。 另一方面,比較例1的硬化性組合物亦是含有重複單元(1)含有比例較高的聚倍半矽氧烷化合物(PSQ(A4)),因而折射率高。 然而,PSQ(A4)並未具有重複單元(2),且T2位點的比例不高,因而比較例1的硬化性組合物之硬化物係耐龜裂性差。 另一方面,比較例2及比較例3所獲得硬化性組合物,因為未含有矽烷偶合劑,因而硬化物未具有充分的黏著強度。The following is known from the above-mentioned Examples, Comparative Examples and Reference Examples. The curable compositions of Examples 1 to 3 have a polysilsesquioxane compound (PSQ(A1), PSQ(A2), PSQ(A3)) containing a repeating unit (1), and thus the refractive index is appropriately improved. Furthermore, the curable compositions of Examples 1 to 3 contain a silane coupling agent. Moreover, any one of PSQ(A1), PSQ(A2) and PSQ(A3) contains a repeating unit (2) and appropriately contains a T2 site. Therefore, the cured materials of Examples 1 to 3 are excellent in both crack resistance and adhesion. On the other hand, the curable composition of Comparative Example 1 also contains a polysilsesquioxane compound (PSQ(A4)) containing a high proportion of the repeating unit (1), and thus the refractive index is high. However, PSQ (A4) does not have a repeating unit (2) and the ratio of the T2 site is not high, so the hardened material of the hardening composition of Comparative Example 1 has poor crack resistance. On the other hand, the hardening compositions obtained in Comparative Examples 2 and 3 do not contain a silane coupling agent, so the hardened materials do not have sufficient adhesion strength.
無。without.
無。without.
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- 2020-09-28 TW TW109133642A patent/TWI846961B/en active
- 2020-09-28 KR KR1020217027785A patent/KR20220068952A/en unknown
- 2020-09-28 CN CN202080067177.7A patent/CN114402036B/en active Active
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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TW201922933A (en) * | 2013-09-20 | 2019-06-16 | 日商琳得科股份有限公司 | Curable composition, curing product, and method for using curable composition |
JP2019119804A (en) * | 2018-01-05 | 2019-07-22 | スリーエム イノベイティブ プロパティズ カンパニー | Curable composition and optical member |
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JP7569794B2 (en) | 2024-10-18 |
KR20220068952A (en) | 2022-05-26 |
JPWO2021060562A1 (en) | 2021-04-01 |
CN114402036B (en) | 2023-11-21 |
TW202120601A (en) | 2021-06-01 |
CN114402036A (en) | 2022-04-26 |
WO2021060562A1 (en) | 2021-04-01 |
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