TW202028320A - Biaxially oriented thermoplastic resin film - Google Patents

Biaxially oriented thermoplastic resin film Download PDF

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TW202028320A
TW202028320A TW108141227A TW108141227A TW202028320A TW 202028320 A TW202028320 A TW 202028320A TW 108141227 A TW108141227 A TW 108141227A TW 108141227 A TW108141227 A TW 108141227A TW 202028320 A TW202028320 A TW 202028320A
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film
thermoplastic resin
protrusions
resin film
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TWI840441B (en
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千代敏弘
鈴木維允
東大路卓司
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日商東麗股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/10Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial
    • B29C55/12Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial biaxial
    • B29C55/14Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial biaxial successively
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G13/00Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Laminated Bodies (AREA)
  • Magnetic Record Carriers (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

Provided is a biaxially oriented thermoplastic resin film, at least one surface of which satisfies the following conditions (1) and (2), and that has suitable smoothness and windability. (1) When the projection density for projections with a height of 10 nm or greater as measured by non-contact optical roughness measurement is denoted by A (projections/mm2), A is 2.0*10<SP>3</SP> to 2.5*10<SP>4</SP>. (2) When the projection density for projections with a height of 1 nm or greater but less than 10 nm as measured by atomic force microscopy (AFM) is denoted by B (projections/mm2), B is 1.8*10<SP>6</SP> to 1.0*10<SP>7</SP>.

Description

雙軸配向熱可塑性樹脂薄膜 Biaxially oriented thermoplastic resin film

本發明係關於具有粗大突起且於面層部具有細微突起之雙軸配向熱可塑性樹脂薄膜。 The present invention relates to a biaxially aligned thermoplastic resin film having coarse protrusions and fine protrusions on the surface layer.

熱可塑性樹脂由於其加工性優良而被利用於各種工業領域。又,將此等熱可塑性樹脂加工為薄膜狀的製品,已於工業用途、光學製品用途、包裝用途、磁性記錄帶等現今生活中擔任重要角色。近年來,在電子資訊機器方面正朝小型化、高積體化演進,隨此而對用於製造電子資訊機器的薄膜要求其加工性之提升。尤其在製作電子資訊機器時,大多採用於薄膜表面使其他材料積層,依各薄膜進行光阻等光學性加工的手法。因此,為了提升薄膜之光學加工性,一般手段係在保持薄膜之透明性之同時藉由提高薄膜表面之平滑性,使加工所使用之光阻用雷射光因薄膜表面之凹凸形狀而減低光散射。又,於磁性記錄帶用途中亦隨著記錄數據之高密度化,而要求藉由提高薄膜表面之平滑性以均勻保持與讀取頭間之距離,減低錯誤雜訊發生。尤其在塗佈型磁性記錄帶用途中,在使用為支撐體之薄膜之僅單面粗糙的情況下,存在於輥捲取時於較平滑之相反面(磁性記錄層面)側產生形狀轉印缺點(以下有時稱為轉印缺點),使磁性記錄層面之平滑性降低的課題。 Thermoplastic resins are used in various industrial fields due to their excellent workability. In addition, products made of these thermoplastic resins processed into films have played an important role in modern life such as industrial applications, optical product applications, packaging applications, and magnetic recording tapes. In recent years, the electronic information equipment has been evolving towards miniaturization and high integration, and the film used to manufacture electronic information equipment is required to improve its processability. Especially in the production of electronic information equipment, most of the methods are used to laminate other materials on the surface of the film, and perform optical processing such as photoresist for each film. Therefore, in order to improve the optical processability of the film, the general method is to improve the smoothness of the film surface while maintaining the transparency of the film, so that the laser light used for photoresist processing reduces light scattering due to the uneven shape of the film surface. . In addition, in the use of magnetic recording tapes, with the increase in the density of recorded data, it is required to improve the smoothness of the film surface to maintain the distance between the reading head and reduce the occurrence of error noise. Especially in the application of a coated magnetic recording tape, when only one side of the film used as a support is rough, there is a defect that the shape transfer occurs on the side of the smoother opposite side (magnetic recording layer) during roll winding. (Hereinafter, it may be referred to as a transfer defect), a problem that reduces the smoothness of the magnetic recording layer.

一般為了確保捲取.搬送性而於薄膜中含有粒子。藉 由減低粒子含量、或使所含粒子之粒徑小徑化,可提高薄膜之平滑性、或防止上述轉印缺點。然而,另一方面,於進行薄膜製造.加工時之捲取步驟中由於不存在突起高度較高之突起部,故有咬入至薄膜間之空氣無法釋出、上浮之部分成為皺紋而品質降低的情形。 Generally to ensure coiling. Conveyance and contains particles in the film. borrow By reducing the particle content or reducing the particle diameter of the contained particles, the smoothness of the film can be improved or the above-mentioned transfer defects can be prevented. However, on the other hand, since there are no protrusions with high protrusion height in the winding step during film manufacturing and processing, the air that bites between the films cannot be released, and the floating parts become wrinkles and the quality is reduced. Situation.

針對此種課題,例如專利文獻1中係使薄膜不含粒子,藉由使用添加劑而使表面粗糙化的技術。 In response to such a problem, for example, Patent Document 1 discloses a technique of making the film free of particles and using additives to roughen the surface.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

專利文獻1:日本專利特開2016-221853號公報 Patent Document 1: Japanese Patent Laid-Open No. 2016-221853

然而,在使用添加劑的情況,雖藉由添加劑之含有濃度可均勻控制表面粗度,但由於產生來自添加劑之粗大異物,而存在平滑性大幅降低的課題。 However, in the case of using additives, although the surface roughness can be uniformly controlled by the concentration of the additives, there is a problem that the smoothness is greatly reduced due to the generation of coarse foreign matter from the additives.

本案發明人等經潛心研究,為了解決上述課題,判明了藉由控制薄膜表面之形狀,依不發生轉印缺點之程度局部性地具有突起高度較高之突起,並使之與突起高度較低之突起共存,則可兼顧平滑性與捲取性(以下有時稱為空氣釋出性)。本發明係有鑑於上述情況,目的在於提供一種具有良好平滑性與捲取性的雙軸配向熱可塑性樹脂薄膜。 In order to solve the above-mentioned problems, the inventors of the present case have found that by controlling the shape of the film surface, there are protrusions with higher protrusion heights locally to the extent that no transfer defects occur, and the height of the protrusions is lower. The coexistence of the protrusions allows for both smoothness and winding properties (hereinafter sometimes referred to as air release properties). In view of the foregoing, the present invention aims to provide a biaxially oriented thermoplastic resin film with good smoothness and rollability.

為了解決上述課題,本發明採用以下構成。亦即, In order to solve the above-mentioned problems, the present invention adopts the following configuration. that is,

[I]一種雙軸配向熱可塑性樹脂薄膜,係至少單面之表面滿足下述(1)、(2); [I] A biaxially oriented thermoplastic resin film, the surface of at least one side meets the following (1) and (2);

(1)在將藉非接觸光學式粗度測定所測定之高度10nm以上的突起個數設為A(個/mm2)時,A為2.0×103以上且2.5×104以下; (1) When the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement is A (pieces/mm 2 ), A is 2.0×10 3 or more and 2.5×10 4 or less;

(2)藉原子力顯微鏡(AFM:Atomic Force Microscope)測定所測定之高度1nm以上且未滿10nm之突起個數設為B(個/mm2)時,B為1.8×106以上且1.0×107以下。 (2) When the number of protrusions with a height of 1 nm or more and less than 10 nm measured by an atomic force microscope (AFM: Atomic Force Microscope) is set to B (pieces/mm 2 ), B is 1.8×10 6 or more and 1.0×10 7 or less.

[II]如[I]之雙軸配向熱可塑性樹脂薄膜,其中,構成上述滿足(1)、(2)之表面的層係含有平均粒徑10nm以上且300nm以下的粒子。 [II] The biaxially oriented thermoplastic resin film according to [I], wherein the layer constituting the surface satisfying (1) and (2) contains particles having an average particle diameter of 10 nm or more and 300 nm or less.

[III]如[I]或[II]之雙軸配向熱可塑性樹脂薄膜,其中,上述滿足(1)、(2)之表面係在將藉非接觸光學式粗度測定所測定之高度60nm以上的突起個數設為C(個/mm2)時,C為90以下。 [III] The biaxially oriented thermoplastic resin film as in [I] or [II], wherein the surface that satisfies (1) and (2) is at a height of 60 nm or more as measured by non-contact optical roughness measurement When the number of protrusions is C (pieces/mm 2 ), C is 90 or less.

[IV]如[I]至[III]中任一項之雙軸配向熱可塑性樹脂薄膜,其中,其係使用為離型用薄膜。 [IV] The biaxially oriented thermoplastic resin film of any one of [I] to [III], wherein it is used as a release film.

[V]如[I]至[III]中任一項之雙軸配向熱可塑性樹脂薄膜,其係使用為乾膜光阻支撐體用薄膜。 [V] The biaxially oriented thermoplastic resin film of any one of [I] to [III], which is used as a film for dry film photoresist support.

[VI]如[I]至[III]中任一項之雙軸配向熱可塑性樹脂薄膜,其係在製造積層陶瓷電容器的步驟中使用為胚片成形之支撐體用薄膜。 [VI] The biaxially oriented thermoplastic resin film according to any one of [I] to [III], which is used as a support film formed as a green sheet in a step of manufacturing a multilayer ceramic capacitor.

[VII]如[I]至[III]中任一項之雙軸配向熱可塑性樹脂薄膜,其係使用於塗佈型數位記錄方式之磁性記錄媒體用底膜。 [VII] The biaxially oriented thermoplastic resin film as in any one of [I] to [III], which is a base film for magnetic recording media used in a coating type digital recording method.

本發明之雙軸配向熱可塑性樹脂薄膜係具有良好平滑性與捲取性。 The biaxially oriented thermoplastic resin film of the present invention has good smoothness and windability.

1:施行了突起形成處理之層(P1層) 1: The layer (P1 layer) that has been processed to form protrusions

2:非接觸光學式粗度測定及AFM測定中之基準面(高度0nm) 2: Reference surface in non-contact optical roughness measurement and AFM measurement (height 0nm)

3:高度1nm之線(R1nm) 3: Line with height of 1nm (R 1nm )

4:高度10nm之線(R10nm) 4: Line of height 10nm (R 10nm )

5:高度60nm之線(R60nm) 5: Line of height 60nm (R 60nm )

6:P2層 6: P2 layer

7:P3層 7: P3 layer

圖1為表示藉非接觸光學式粗度測定或AFM(Atomic Force Microscope,原子力顯微鏡)所測定之R1nm、R10nm、R60nm之概念圖。 Figure 1 is a conceptual diagram showing R 1nm , R 10nm , and R 60nm measured by non-contact optical roughness measurement or AFM (Atomic Force Microscope).

圖2為本發明之雙軸配向熱可塑性樹脂薄膜之2層構成之一態樣的概略圖。 Fig. 2 is a schematic view of one aspect of the two-layer structure of the biaxially aligned thermoplastic resin film of the present invention.

圖3為本發明之雙軸配向熱可塑性樹脂薄膜之3層構成之一態樣的概略圖。 Fig. 3 is a schematic view of one aspect of the three-layer structure of the biaxially aligned thermoplastic resin film of the present invention.

圖4為本發明之雙軸配向熱可塑性樹脂薄膜之異種3層構成之一態樣的概略圖。 Fig. 4 is a schematic view of one aspect of the heterogeneous 3-layer structure of the biaxially aligned thermoplastic resin film of the present invention.

以下,針對本發明進行詳細說明。 Hereinafter, the present invention will be described in detail.

本發明係關於一種雙軸配向熱可塑性樹脂薄膜。本發明中所謂熱可塑性樹脂,係指若進行加熱便顯示塑性的樹脂。代表性樹脂係可舉例如:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯、聚乙烯α,β-二羧酸酯、來自P-六氫伸茬基對酞酸酯之聚合物、來自1,4-環己烷二甲醇之聚合物、聚-P-乙烯氧基苯甲酸酯、聚芳酯、聚碳酸酯等及其等之共聚合體所代表般,於主鏈具有酯鍵的聚酯樹脂類;以及尼龍6、尼龍66、尼龍610、尼龍12、尼龍11等所代表般,於主鏈具有醯胺鍵的聚醯胺樹脂類;聚乙烯、聚丙烯、乙烯-醋酸乙烯酯共聚合體、聚甲基戊烯、聚丁烯、聚異丁烯、聚苯乙烯等所代表般,主要僅由碳氫化物構成的聚烯烴類;聚醚碸(PES)、聚伸苯醚(PPO)、聚醚醚酮(PEEK)、聚環氧乙烷、聚環氧丙烷、聚甲醛等所代表的聚醚類;聚氯乙烯、聚偏二氯乙烯、聚偏氟乙烯、聚三氟氯乙烯等所代表的鹵化聚合物類;及聚苯硫醚(PPS)、聚碸及其等的共聚合體或改質體;聚醯亞胺樹脂等。 The invention relates to a biaxially aligned thermoplastic resin film. In the present invention, the term “thermoplastic resin” refers to a resin that exhibits plasticity when heated. Representative resins include, for example: polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, polyethylene α, β-dicarboxylate, and P-hexahydro Polymers of stubble-based terephthalate, polymers from 1,4-cyclohexanedimethanol, poly-P-vinyloxybenzoate, polyarylate, polycarbonate, etc. and their copolymers Polyester resins with ester bonds in the main chain as represented by composites; and polyamide resins with amide bonds in the main chain as represented by nylon 6, nylon 66, nylon 610, nylon 12, and nylon 11 ; Polyolefins mainly composed of hydrocarbons as represented by polyethylene, polypropylene, ethylene-vinyl acetate copolymer, polymethylpentene, polybutene, polyisobutylene, polystyrene, etc.; polyether Polyethers such as PES, PPO, PEEK, polyethylene oxide, polypropylene oxide, and polyoxymethylene; polyvinyl chloride, polyvinylidene chloride Halogenated polymers represented by ethylene, polyvinylidene fluoride, polychlorotrifluoroethylene, etc.; and copolymers or modifications of polyphenylene sulfide (PPS), polysulfide and the like; polyimide resins, etc.

作為本發明中所使用之熱可塑性樹脂,由透明性、製膜性的觀點而言,較佳係以聚酯、聚烯烴、聚苯硫醚(PPS)、聚醯亞胺(PI)為主成分,其中特佳係聚酯。於此所謂「主成分」係指於薄膜之總成分100質量%中,含有超過50質量%且100質量%以下的成分。 As the thermoplastic resin used in the present invention, polyester, polyolefin, polyphenylene sulfide (PPS), and polyimide (PI) are preferred from the viewpoints of transparency and film forming properties. Ingredients, especially polyester. The term "main component" as used herein refers to a component that contains more than 50% by mass and 100% by mass or less in 100% by mass of the total components of the film.

又,本發明中所謂聚酯樹脂,係指由二羧酸構成成分與二醇構成成分進行縮聚合而成者。另外,本說明書中,所謂構成成分係指將聚酯進行水解而可獲得的最小單位。 In addition, the polyester resin in the present invention refers to a polycondensation polymerization of a dicarboxylic acid component and a diol component. In addition, in this specification, the so-called constituent means the smallest unit that can be obtained by hydrolyzing polyester.

作為構成此種聚酯之二羧酸構成成分,可舉例如:對酞酸、異酞酸、酞酸、1,4-萘二羧酸、1,5-萘二羧酸、2,6-萘二羧酸、1,8-萘二羧酸、4,4'-二苯基二羧酸、4,4'-二苯醚二羧酸等之芳香族二羧酸或其酯衍生物。 Examples of the dicarboxylic acid constituents constituting such polyester include terephthalic acid, isophthalic acid, phthalic acid, 1,4-naphthalenedicarboxylic acid, 1,5-naphthalenedicarboxylic acid, 2,6- Aromatic dicarboxylic acids such as naphthalenedicarboxylic acid, 1,8-naphthalenedicarboxylic acid, 4,4'-diphenyl dicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, or their ester derivatives.

又,構成此種聚酯之二醇構成成分,可舉例如:乙二醇、1,2-丙二醇、1,3-丙二醇、1,4-丁二醇、1,2-丁二醇、1,3-丁二醇等脂肪族二醇類;環己烷二甲醇、螺二醇等脂環式二醇類;上述二醇複數個連接者等。其中,由機械特性、透明性的觀點而言,適合使用聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯(PBT)、聚乙烯-2,6-萘二羧酸酯(PEN)及對PET之二羧酸成分之一部分使異酞酸或萘二酸進行共聚合者,對PET之二醇成分之一部分使環己烷二甲醇、螺二醇、二乙二醇進行共聚合的聚酯。 In addition, the diol constituents constituting the polyester include, for example, ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,4-butanediol, 1,2-butanediol, 1 Aliphatic diols such as ,3-butanediol; alicyclic diols such as cyclohexanedimethanol and spirodiol; plural linkers of the above diols, etc. Among them, from the viewpoint of mechanical properties and transparency, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), and polyethylene-2,6-naphthalenedicarboxylic acid are suitable for use. Ester (PEN) and copolymerization of isophthalic acid or naphthalene dicarboxylic acid for part of the dicarboxylic acid component of PET, and cyclohexanedimethanol, spirodiol, diethylene glycol for part of the glycol component of PET Copolymerized polyester.

本發明之雙軸配向熱可塑性樹脂薄膜必須進行雙軸配向。藉由進行雙軸配向,可提升薄膜之機械強度而不易發生皺紋,並可提升捲取性。於此所謂雙軸配向,係指廣角X射線繞射時顯示雙軸配向之圖案者。雙軸配向熱可塑性樹脂薄膜一般係將未延 伸狀態之熱可塑性樹脂片材朝片材長邊方向及寬度方向進行延伸,其後施行熱處理而完成結晶配向而可獲得。其細節將於後述。 The biaxially aligned thermoplastic resin film of the present invention must be biaxially aligned. By carrying out biaxial alignment, the mechanical strength of the film can be improved and wrinkles are not prone to occur, and the rollability can be improved. The so-called dual-axis alignment here refers to the pattern that shows the dual-axis alignment when wide-angle X-rays are diffracted. Biaxially oriented thermoplastic resin film is generally not stretched The stretched thermoplastic resin sheet can be obtained by extending it in the longitudinal direction and the width direction of the sheet, and then performing heat treatment to complete the crystal alignment. The details will be described later.

本發明之雙軸配向熱可塑性樹脂薄膜係至少單面之表面中,在將依後述方法藉非接觸光學式粗度測定器所測定之10nm以上的突起個數設為A(個/mm2),將藉AFM(Atomic Force Microscope,原子力顯微鏡)所測定之高度1nm以上且未滿10nm的突起個數設為B(個/mm2)時,必須A為2.0×103以上且2.5×104以下,且設為B(個/mm2)時,B為1.8×106以上且1.0×107以下(以下,有時將A為2.0×103以上且2.5×104以下,且設為B(個/mm2)時,B為1.8×106以上且1.0×107以下的薄膜表面,簡稱為上述表面)。 In the biaxially oriented thermoplastic resin film of the present invention, on at least one surface, the number of protrusions of 10 nm or more measured by a non-contact optical roughness measuring device according to the method described below is defined as A (pieces/mm 2 ) When the number of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM (Atomic Force Microscope) is set to B (pieces/mm 2 ), A must be 2.0×10 3 or more and 2.5×10 4 Below, and set as B (pieces/mm 2 ), B is 1.8×10 6 or more and 1.0×10 7 or less (Hereinafter, A is sometimes 2.0×10 3 or more and 2.5×10 4 or less, and set as In the case of B (pieces/mm 2 ), B is the film surface of 1.8×10 6 or more and 1.0×10 7 or less, which is simply referred to as the above surface).

本發明之藉非接觸光學式粗度測定器所測定之高度10nm以上的突起個數A(個/mm2),係反映了於捲取時負責空氣釋出之突起的個數。由於突起個數A(個/mm2)變多則與其他薄膜面間之接觸面積(以下有時稱為接觸面積)降低而確保空氣脫逸的空間,故捲取性提升。另一方面,突起個數A(個/mm2)過多時,由於較高之突起變多而有產生較多轉印缺點的情形。又,突起個數A(個/mm2)較少時,由於薄膜變得平坦而與其他面間之接觸面積增加、空氣釋出性惡化,不論後述突起個數B(個/mm2)存在較多的情況,於薄膜捲取時乃發生因殘留於薄膜內之空氣所引起之皺紋而品質降低。高度10nm以上之突起個數A(個/mm2)更佳為3.0×103以上且2.0×104以下、又更佳為4.0×103以上且2.0×104以下。 The number A (number/mm 2 ) of protrusions with a height of 10 nm or more measured by the non-contact optical roughness measuring device of the present invention reflects the number of protrusions responsible for air release during winding. As the number of protrusions A (pieces/mm 2 ) increases, the contact area with other film surfaces (hereinafter, sometimes referred to as contact area) decreases and a space for air escape is ensured, so the windability improves. On the other hand, when the number of protrusions A (pieces/mm 2 ) is too large, the number of higher protrusions may increase, which may cause more transfer defects. Also, when the number of protrusions A (pieces/mm 2 ) is small, the contact area with other surfaces increases due to the flatness of the film, and the air release property deteriorates, regardless of the number of protrusions B (pieces/mm 2 ) described later. In many cases, wrinkles caused by the air remaining in the film occur during film winding and the quality is reduced. The number A (pieces/mm 2 ) of protrusions with a height of 10 nm or more is more preferably 3.0×10 3 or more and 2.0×10 4 or less, and still more preferably 4.0×10 3 or more and 2.0×10 4 or less.

本發明之藉AFM(Atomic Force Microscope,原子力顯微鏡)所測定之高度1nm以上且未滿10nm之突起個數設為B(個/mm2),係反映了於上述表面之面層部所存在之細微之突起個數; 其藉由使面層部與其他面間之接觸面積降低,同時因細微之突起凹凸構造增加空氣脫逸通道,而具有顯著促進因上述10nm以上之突起所得之空氣釋出性的效果。又,藉由於面層部存在較多高度1nm以上且未滿10nm之突起,可減低薄膜間或與製程輥間之摩擦,具有減低薄膜表面損傷的效果。在突起個數B(個/mm2)過多時,有薄膜之滑性提升,於捲取時或其後之切割機(slitter)步驟中發生捲繞偏差而輥之捲繞情況惡化的情形。又,在突起個數B(個/mm2)較少時,由於薄膜變得平坦而與其他面間之接觸面積增加、空氣釋出性惡化,於薄膜捲取時發生因殘留於薄膜內之空氣所引起之皺紋而品質降低。高度1nm以上且未滿10nm之突起個數B(個/mm2)更佳為3.0×106以上且8.5×106以下。 In the present invention, the number of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM (Atomic Force Microscope) is set to B (pieces/mm 2 ), which reflects the presence of the surface layer on the surface The number of fine protrusions: By reducing the contact area between the surface layer part and other surfaces, and at the same time increasing the air escape channel due to the fine protrusion and concave structure, it can significantly promote the release of air from the above 10nm protrusions The effect of sex. In addition, because there are many protrusions with a height of 1 nm or more and less than 10 nm in the surface layer, the friction between the film or the process roll can be reduced, and the film surface damage can be reduced. When the number of protrusions B (pieces/mm 2 ) is too large, the slipperiness of the film may increase, and the winding deviation may occur during the winding or the subsequent slitter step, and the winding condition of the roll may deteriorate. In addition, when the number of protrusions B (pieces/mm 2 ) is small, the contact area with other surfaces increases due to the flatness of the film, and the air release performance deteriorates. The quality of wrinkles caused by air is reduced. The number B (number/mm 2 ) of protrusions having a height of 1 nm or more and less than 10 nm is more preferably 3.0×10 6 or more and 8.5×10 6 or less.

習知技術中,作為使藉非接觸光學式粗度測定器所測定之高度10nm以上的突起的個數A(個/mm2)增多的方法,可舉例如含有粒徑較大之粒子的方法。又,作為使藉AFM(Atomic Force Microscope,原子力顯微鏡)所測定之高度1nm以上且未滿10nm之突起個數B(個/mm2)增多的方法,可舉例如含有粒徑較小之粒子的方法。然而,藉由此種方法,用於增加突起個數B而含有之粒子之粒徑減小,故無法忽視粒子彼此之凝集,結果造成突起粗大化而突起個數B減少,故難以使突起個數B成為一定以上。本發明中係藉由後述方法,可將突起個數A、B控制於上述範圍。 In the conventional technique, as a method of increasing the number A (pieces/mm 2 ) of protrusions with a height of 10 nm or more measured by a non-contact optical roughness measuring device, for example, a method containing particles with a larger particle size . In addition, as a method of increasing the number of protrusions B (number/mm 2 ) having a height of 1 nm or more and less than 10 nm as measured by AFM (Atomic Force Microscope), for example, a method containing particles with a smaller particle size method. However, with this method, the particle size of the particles contained to increase the number of protrusions B is reduced, so the aggregation of the particles cannot be ignored. As a result, the protrusions become coarser and the number of protrusions B is reduced. The number B becomes a certain value or more. In the present invention, the number of protrusions A and B can be controlled within the above range by the method described later.

又,本發明之雙軸配向熱可塑性樹脂薄膜中,較佳係上述表面之藉非接觸光學式粗度測定器所測定之高度60nm以上的突起個數C(個/mm2)為90以下。高度60nm以上的突起個數C(個/mm2)係反映了引起轉印缺點之高度的突起個數。在突起個數C(個 /mm2)超過90時,產生較多轉印缺點,而與上述表面相反之面的平滑性降低,故在將薄膜使用於磁性帶用途時將產生較多雜訊。突起個數C(個/mm2)更佳為80以下。突起個數C(個/mm2)之下限值並未特別存在,最佳為0。 Furthermore, in the biaxially oriented thermoplastic resin film of the present invention, it is preferable that the number C (pieces/mm 2 ) of protrusions with a height of 60 nm or more measured by a non-contact optical roughness measuring device on the surface is 90 or less. The number C (number/mm 2 ) of protrusions with a height of 60 nm or more reflects the number of protrusions with a height that causes transfer defects. When the number of protrusions C (pieces/mm 2 ) exceeds 90, more transfer defects will occur, and the smoothness of the surface opposite to the above-mentioned surface will decrease, so more noise will be generated when the film is used for magnetic tape. . The number of protrusions C (number/mm 2 ) is more preferably 80 or less. The lower limit of the number of protrusions C (pieces/mm 2 ) does not particularly exist, and 0 is best.

本發明之雙軸配向熱可塑性樹脂薄膜中,用於將藉非接觸光學式粗度測定器所測定之高度10nm以上的突起個數A設為上述範圍的方法並無特別限定,可使用含有粒子之方法或含有與薄膜主成分相異之樹脂的方法等。由不論製膜條件而形成均勻突起的觀點而言,較佳係含有粒子,藉由此所含有粒子之平均粒徑或含量進行控制。 In the biaxially aligned thermoplastic resin film of the present invention, the method for setting the number A of protrusions with a height of 10 nm or more as measured by a non-contact optical roughness measuring device within the above range is not particularly limited, and particles containing The method or the method of containing a resin that is different from the main component of the film. From the viewpoint of forming uniform protrusions regardless of film forming conditions, it is preferable to contain particles, and to control the average particle diameter or content of the particles contained thereby.

關於本發明之雙軸配向熱可塑性樹脂薄膜所含有之粒子並無特別限定,可使用無機粒子、有機粒子之任一種,亦可併用2種以上之粒子。作為無機粒子,可舉例如碳酸鈣、碳酸鎂、碳酸鋅、氧化鈦、氧化鋅、氧化鈰、氧化鎂、硫酸鋇、硫化鋅、磷酸鈣、氧化鋁(α氧化鋁、β氧化鋁、γ氧化鋁、δ氧化鋁)、雲母、雲母、雲母鈦、矽藻土、滑石、黏土、高嶺石、氟化鋰、氟化鈣、蒙脫土、氧化鋯、濕式二氧化矽、乾式二氧化矽、膠體二氧化矽等。可例示以丙烯酸系樹脂、苯乙烯系樹脂、聚矽氧樹脂、聚醯亞胺樹脂等作為構成成分的有機粒子、核殼型有機粒子等。 The particles contained in the biaxially oriented thermoplastic resin film of the present invention are not particularly limited, and any one of inorganic particles and organic particles may be used, or two or more kinds of particles may be used in combination. As the inorganic particles, for example, calcium carbonate, magnesium carbonate, zinc carbonate, titanium oxide, zinc oxide, cerium oxide, magnesium oxide, barium sulfate, zinc sulfide, calcium phosphate, alumina (α alumina, β alumina, γ oxide Aluminum, delta alumina), mica, mica, titanium mica, diatomaceous earth, talc, clay, kaolinite, lithium fluoride, calcium fluoride, montmorillonite, zirconia, wet silica, dry silica , Colloidal silica, etc. Examples include organic particles, core-shell organic particles, and the like that have acrylic resins, styrene resins, silicone resins, polyimide resins, and the like as constituent components.

作為上述粒子之粒徑尺寸,較佳係藉後述方法所得平均1次粒徑為10nm以上且300nm以下。在平均1次粒徑未滿10nm時,粒子彼此之凝集力變大、形成粗大之凝集體,而有超過上述突起個數A之範圍的情形。在上述平均1次粒徑超過300nm時,所形成之各個之突起尺寸變大、有超過上述突起個數A之範圍的情 形。上述粒子之平均1次粒徑之較佳範圍為15nm以上且200nm以下。 As the particle size of the above-mentioned particles, it is preferable that the average primary particle size obtained by the method described later is 10 nm or more and 300 nm or less. When the average primary particle size is less than 10 nm, the cohesive force of the particles increases to form coarse aggregates, which may exceed the range of the number A of protrusions. When the above average primary particle size exceeds 300 nm, the size of each protrusion formed may become larger, which may exceed the range of the number A of protrusions. shape. The preferred range of the average primary particle diameter of the particles is 15 nm or more and 200 nm or less.

本發明之雙軸配向熱可塑性樹脂薄膜所含之粒子的含量並無特別限定,但為了不損及透明性,相對於薄膜全體,粒子之含有濃度較佳係設為3.0質量%以下。若超過3.0質量%,則即使使用平均1次粒徑為較佳範圍內的粒子,薄膜仍部分地白濁,有後述霧值脫離較佳範圍的情形。更佳係2.0質量%以下、又更佳1.0質量%以下。又,藉由將本發明之雙軸配向熱可塑性樹脂薄膜設為2層以上之積層構成,並僅使具有上述表面之層含有粒子,則使透明性良好,同時容易將上述突起個數A設為目標範圍。具有上述表面之層的粒子含量,係相對於具有表面之層全體,較佳為0.1~0.5質量%。 The content of particles contained in the biaxially oriented thermoplastic resin film of the present invention is not particularly limited, but in order not to impair transparency, the content of particles is preferably 3.0% by mass or less relative to the entire film. If it exceeds 3.0% by mass, even if particles having an average primary particle size within a preferable range are used, the film is partially cloudy, and the haze value described later may deviate from the preferable range. It is more preferably 2.0% by mass or less, and still more preferably 1.0% by mass or less. In addition, by making the biaxially oriented thermoplastic resin film of the present invention into a laminated structure of two or more layers, and only the layer having the above-mentioned surface contains particles, the transparency is improved and the number of protrusions A is easy to set Is the target range. The content of particles in the layer having the surface is preferably 0.1 to 0.5% by mass relative to the entire layer having the surface.

又,本發明之雙軸配向熱可塑性樹脂薄膜中,由以更加提升捲取性為目的之觀點而言,較佳係將本發明之雙軸配向熱可塑性樹脂薄膜作成3層以上之構成,並於與設置具有上述表面之層者相反的最表層含有粒子的態樣。關於所含有之粒子的種類,可應用與具有上述表面之層相同者,但由確保薄膜之透明性的觀點而言,較佳係平均1次粒徑為10nm以上且100nm以下。又,與上述表面相反之最表層所含有的粒子的含量,係相對於最表層全體,較佳為1.5質量%以下。作為更佳態樣,可舉例如:相對於雙軸配向熱可塑性樹脂薄膜全體,粒子含量係如上述般設為3.0質量%以下,使具有上述表面之層、與具有上述表面之層相反側之最表層含有粒子,同時使不具表層之層實質上不含粒子的薄膜;若作成此種薄膜,則透明性良好。 In addition, in the biaxially oriented thermoplastic resin film of the present invention, from the viewpoint of further improving the rollability, it is preferable to make the biaxially oriented thermoplastic resin film of the present invention into three or more layers, and The outermost layer opposite to the layer with the above-mentioned surface contains particles. Regarding the types of particles contained, the same ones as the layer having the above-mentioned surface can be applied, but from the viewpoint of ensuring the transparency of the film, it is preferable that the average primary particle size is 10 nm or more and 100 nm or less. In addition, the content of particles contained in the outermost layer opposite to the above-mentioned surface is preferably 1.5% by mass or less with respect to the entire outermost layer. As a more preferable aspect, for example, with respect to the entire biaxially oriented thermoplastic resin film, the particle content is set to 3.0% by mass or less as described above, so that the layer having the above surface is on the opposite side of the layer having the above surface. A film in which the outermost layer contains particles, and the layer without the surface layer is substantially free of particles; if such a film is made, the transparency will be good.

本發明之雙軸配向熱可塑性樹脂薄膜之上述表面中,用於將上述藉AFM所測定之高度1nm以上且未滿10nm之突起之個數B設為上述範圍的方法並無特別限定,可舉例如:如奈米壓印般使用模具於表面轉印形狀的方法;對未延伸片材利用大氣壓輝光放電進行電漿表面處理後,進行後述雙軸延伸的方法等。由生產線上之製膜適應性或細微突起之形成個數的觀點而言,更佳係利用大氣壓輝光放電進行電漿處理後進行雙軸延伸。於此所謂大氣壓係指700Torr~780Torr之範圍。 On the surface of the biaxially oriented thermoplastic resin film of the present invention, the method for setting the number B of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM in the above range is not particularly limited, and examples can be given For example: a method of transferring a shape to the surface using a mold like nanoimprinting; after plasma surface treatment of an unstretched sheet by atmospheric pressure glow discharge, the method of biaxial stretching described later is performed. From the viewpoint of film-forming adaptability on the production line or the number of micro-protrusions formed, it is more preferable to perform biaxial stretching after plasma treatment by atmospheric pressure glow discharge. The atmospheric pressure here refers to the range of 700 Torr to 780 Torr.

大氣壓輝光放電處理係將處理對象之薄膜導入至相對向的電極與接地輥之間,於裝置中導入電漿激發性氣體,對電極間施加高頻電壓,藉此使該氣體產生電漿激發而在電極間進行輝光放電。一般而言,藉大氣壓輝光放電處理對熱可塑性樹脂薄膜之表面進行處理時,藉由因輝光放電所產生之電漿的能量,發生薄膜表面之分子鏈切斷、或所產生之低分子量體氣化、薄膜表面被切削之現象(以下有時稱為分解去除)。藉此使薄膜表面被細微加工(分解去除)而形成突起。 Atmospheric pressure glow discharge treatment is to introduce the thin film of the object to be processed between the opposing electrodes and the ground roller, introduce a plasma exciting gas into the device, and apply a high-frequency voltage between the electrodes, thereby causing the gas to generate plasma excitation. Glow discharge is performed between the electrodes. Generally speaking, when the surface of the thermoplastic resin film is treated by atmospheric pressure glow discharge treatment, the molecular chain on the surface of the film is cut or the low molecular weight gas generated by the plasma energy generated by the glow discharge The phenomenon that the surface of the film is cut (hereinafter sometimes referred to as decomposition and removal). As a result, the surface of the film is finely processed (decomposed and removed) to form protrusions.

所謂電漿激發性氣體,係指在如上述條件下可被電漿激發的氣體。電漿激發性氣體可舉例如氬、氦、氖、氪、氙等稀有氣體;氮、二氧化碳、氧、或四氟甲烷般之氯氟烴類及此等的混合物等。又,電漿激發性氣體可單獨使用1種、亦可依任意混合比組合使用2種以上。由藉電漿所激發時活性變高的觀點而言,較佳係含有氬、氧、二氧化碳中之至少1種,更佳為含有氧。藉由使用活性較高之電漿激發性氣體,有促進薄膜表面之分解去除而所形成之突起之高度增大的傾向,或因粒子添加所造成之突起的高度增大, 藉非接觸光學式粗度測定器所測定之高度10nm以上的突起的個數A增加的情形。 The so-called plasma excitable gas refers to the gas that can be excited by plasma under the above-mentioned conditions. Examples of plasma-excitable gases include rare gases such as argon, helium, neon, krypton, and xenon; nitrogen, carbon dioxide, oxygen, or chlorofluorocarbons such as tetrafluoromethane, and mixtures thereof. In addition, the plasma excitation gas may be used singly, or two or more types may be used in combination according to any mixing ratio. From the viewpoint that the activity becomes higher when excited by the plasma, it is preferable to contain at least one of argon, oxygen, and carbon dioxide, and it is more preferable to contain oxygen. By using a plasma excitation gas with higher activity, there is a tendency to increase the height of the protrusions formed by promoting the decomposition and removal of the film surface, or the height of protrusions caused by the addition of particles. When the number A of protrusions with a height of 10 nm or more measured by a non-contact optical roughness measuring device increases.

電漿處理時之高頻電壓之頻率較佳為1kHz~100kHz之範圍。又,由突起形成之觀點而言,依以下方法所求得之放電處理強度(E值)較佳係依10~2000W.min/m2之範圍進行處理,更佳係40~500W.min/m2。若放電處理強度(E值)過低,則有突起未充分形成之情況,若放電處理強度(E值)過高,則有對熱可塑性樹脂薄膜造成損傷、或分解去除進行而未形成較佳突起的情形。 The frequency of the high-frequency voltage during plasma processing is preferably in the range of 1 kHz to 100 kHz. In addition, from the viewpoint of protrusion formation, the discharge treatment intensity (E value) obtained by the following method is preferably 10~2000W. Min/m 2 range for processing, preferably 40~500W. min/m 2 . If the discharge treatment strength (E value) is too low, the protrusions may not be formed sufficiently. If the discharge treatment strength (E value) is too high, the thermoplastic resin film may be damaged or decomposed and removed without forming. Protruding situation.

<放電處理強度(E值)之求法> <How to find the intensity of discharge treatment (E value)>

E=Vp×Ip/(S×Wt) E=Vp×Ip/(S×Wt)

E:E值(W.min/m2) E: E value (W.min/m 2 )

Vp:施加電壓(V) Vp: Applied voltage (V)

Ip:施加電流(A) Ip: Applied current (A)

S:處理速度(m/min) S: Processing speed (m/min)

Wt:處理寬度(m)。 Wt: Processing width (m).

圖1表示藉非接觸光學式粗度測定器及AFM所測定之R1nm、R10nm、R60nm之概念圖。圖1中,所謂基準面係指將測定表面距基準面之距離規定為0的高度(較基準面高時為正值,較基準面低時為負值)。 Figure 1 shows a conceptual diagram of R 1nm , R 10nm , and R 60nm measured by a non-contact optical roughness measuring device and AFM. In Fig. 1, the so-called reference surface refers to a height where the distance between the measurement surface and the reference surface is defined as 0 (a positive value when it is higher than the reference surface, and a negative value when it is lower than the reference surface).

一般而言,在藉由大氣壓輝光放電處理使熱可塑性樹脂薄膜、尤其如PET或PEN般具有非晶部與結晶部之薄膜的表面進行分解去除時,將由較柔軟之非晶部開始被分解去除。藉由將結晶部與非晶部細分化,利用大氣壓輝光放電處理可形成更細微之突起,再者,藉由事先增加結晶部則較柔軟之非晶部被較深地切削, 而可增加突起高度。 Generally speaking, when the surface of a thermoplastic resin film, especially a film with an amorphous part and a crystalline part like PET or PEN, is decomposed and removed by atmospheric pressure glow discharge treatment, the softer amorphous part will be decomposed and removed. . By subdividing the crystalline part and the amorphous part, the atmospheric pressure glow discharge treatment can form finer protrusions. Furthermore, by increasing the crystalline part in advance, the softer amorphous part is cut deeper. The height of the protrusion can be increased.

因此,本發明之熱可塑性樹脂薄膜之具有上述表面之層的固有黏度(IV)較佳為0.50dL/g以上、更佳0.60dL/g以上。IV係反映了分子鏈長度的數字,分子鏈較長者由於在同一分子鏈中容易明確地形成結晶部與非晶部,故藉由大氣壓輝光放電處理容易形成更細微之突起,而較佳。又,在IV未滿0.50dL/g時,由於分子鏈短而結晶化容易進行,故有延伸步驟時頻繁發生破斷而製膜困難的情形。 Therefore, the intrinsic viscosity (IV) of the layer having the above-mentioned surface of the thermoplastic resin film of the present invention is preferably 0.50 dL/g or more, more preferably 0.60 dL/g or more. The IV is a number reflecting the length of the molecular chain. The longer molecular chain is easier to clearly form the crystalline part and the amorphous part in the same molecular chain, so it is easier to form finer protrusions by atmospheric pressure glow discharge treatment, which is preferred. In addition, when the IV is less than 0.50 dL/g, since the molecular chain is short and crystallization is easy to proceed, breakage frequently occurs during the stretching step, and film formation may be difficult.

作為於本發明之雙軸配向熱可塑性樹脂薄膜之上述表面,將突起個數A、B設為上述範圍的方法,可舉例如使具有上述表面之層含有上述粒子,同時於進行電漿處理後進行雙軸延伸。又,藉由於構成薄膜之熱可塑性樹脂中使其他熱可塑性樹脂成分依奈米等級分散,有上述突起個數A增加的傾向。又,若提升上述電漿處理中之大氣壓輝光放電處理之強度、或大氣壓輝光放電處理時所使用之電漿激發性氣體之活性,則有上述突起個數B增加的傾向。 As a method of setting the number of protrusions A and B in the above-mentioned range on the above-mentioned surface of the biaxially oriented thermoplastic resin film of the present invention, for example, the layer having the above-mentioned surface contains the above-mentioned particles while performing plasma treatment. Perform biaxial extension. In addition, there is a tendency for the number of protrusions A described above to be increased by dispersing other thermoplastic resin components in the thermoplastic resin constituting the film in a nanometer level. In addition, if the intensity of the atmospheric pressure glow discharge treatment in the plasma treatment, or the activity of the plasma exciting gas used in the atmospheric pressure glow discharge treatment is increased, the number of protrusions B tends to increase.

本發明之雙軸配向熱可塑性樹脂薄膜可為單膜構成、亦可為積層了其他樹脂的2層以上之構成。於作成2層構成時,在將具有上述表面之層稱為P1層並將所積層之層稱為P2層時,較佳係配置成使P1層之具有突起之表面成為最外層的P1層/P2層之構成。於作成3層構成時,可為2種3層構成(P1層/P2層/P1層),亦可為進一步積層了其他樹脂的異種3層構成(P1層/P2層/P3層)。 The biaxially oriented thermoplastic resin film of the present invention may have a single-film structure or a structure in which two or more layers of other resins are laminated. In the case of a two-layer structure, when the layer having the above-mentioned surface is called the P1 layer and the laminated layer is called the P2 layer, it is preferable to arrange the P1 layer so that the protrusion surface of the P1 layer becomes the outermost P1 layer/ The composition of the P2 layer. In the case of a three-layer structure, it may be a two-type three-layer structure (P1 layer/P2 layer/P1 layer), or a heterogeneous three-layer structure (P1 layer/P2 layer/P3 layer) in which other resins are further laminated.

作為將P1層與P2層、P3層等其他樹脂層進行積層的方法,並無特別限制,可使用後述之共擠出法,或將其他樹脂層 原料投入至擠出機進行熔融擠出並由模口擠出而層合至製膜途中之薄膜上的方法(熔融層合法),將製膜後之薄膜彼此經由接黏劑層進行積層的方法等;其中,較佳係使用可同時進行上述處理之突起形成與積層的共擠出法。 There are no particular restrictions on the method of laminating the P1 layer with other resin layers such as the P2 layer and the P3 layer. The co-extrusion method described later can be used, or other resin layers Raw materials are fed into an extruder, melted, extruded from a die, and laminated to a film on the way of film formation (melt lamination method). The film after film formation is laminated with each other through an adhesive layer. Among them, it is preferable to use a co-extrusion method for forming protrusions and lamination that can simultaneously perform the above-mentioned processing.

作為本發明之雙軸配向熱可塑性樹脂薄膜之P2層、P3層之構成,並無特別限制,由確保薄膜透明性的觀點而言,較佳係實質上不含粒子。所謂實質上不含粒子,係指相對於熱可塑性樹脂薄膜,粒子含量為500ppm以下、更佳50ppm以下、最佳10ppm以下。又,在不損及本發明效果之範圍,P1層、P2層、P3層中亦可調配耐熱穩定劑、耐氧化穩定劑、抗靜電劑、有機系/無機系之易滑劑、核劑、染料、分散劑、偶合劑、波長轉換材料等添加劑。 The structure of the P2 layer and the P3 layer of the biaxially oriented thermoplastic resin film of the present invention is not particularly limited, but from the viewpoint of ensuring the transparency of the film, it is preferable that it contains substantially no particles. The term "substantially free of particles" means that the content of particles relative to the thermoplastic resin film is 500 ppm or less, more preferably 50 ppm or less, and most preferably 10 ppm or less. In addition, in the range that does not impair the effects of the present invention, heat-resistant stabilizers, oxidation-resistant stabilizers, antistatic agents, organic/inorganic slip agents, nucleating agents, etc. can also be blended in the P1, P2, and P3 layers. Additives such as dyes, dispersants, coupling agents, wavelength conversion materials, etc.

本發明之熱可塑性樹脂薄膜係在使用於乾膜光阻支撐體用薄膜等要求高光線穿透性的用途時,薄膜之霧度較佳為0.60%以下。在霧度超過0.60%時,使用薄膜時穿透光將產生散射,而在例如乾膜光阻支撐體用途中將於光阻佈線產生缺點。更佳係0.50%以下、更佳0.45%以下。 When the thermoplastic resin film of the present invention is used in applications requiring high light transmittance, such as a dry film photoresist support film, the haze of the film is preferably 0.60% or less. When the haze exceeds 0.60%, the penetrating light will be scattered when the film is used, and the photoresist wiring will be disadvantageous in applications such as dry film photoresist support. More preferably, it is 0.50% or less, more preferably 0.45% or less.

接著,針對本發明之雙軸配向熱可塑性樹脂薄膜之製造方法,列舉雙軸配向聚酯薄膜為例進行說明,但本發明不應解釋為僅侷限於由此種例所得之物。 Next, the method for manufacturing the biaxially oriented thermoplastic resin film of the present invention will be described by taking a biaxially oriented polyester film as an example, but the present invention should not be construed as being limited to the products obtained from this example.

作為獲得本發明所使用之聚酯的方法,可採用依常法進行的聚合方法。例如使對酞酸等二羧酸成分或其之酯形成性衍生物、與乙二醇等二醇成分或其之酯形成性衍生物,藉由公知方法進行酯交換反應或酯化反應後,進行熔融聚合反應則可獲得。又,視需要亦可將藉由熔融聚合反應所得之聚酯,於聚酯之熔點溫度以下 進行固相聚合反應。 As a method for obtaining the polyester used in the present invention, a polymerization method carried out according to a conventional method can be adopted. For example, a dicarboxylic acid component such as terephthalic acid or an ester-forming derivative thereof, and a glycol component such as ethylene glycol or an ester-forming derivative thereof are subjected to a transesterification reaction or an esterification reaction by a known method, It can be obtained by melt polymerization. In addition, if necessary, the polyester obtained by melt polymerization can be lower than the melting temperature of the polyester Carry out solid-phase polymerization.

本發明之雙軸配向熱可塑性樹脂薄膜可依習知公知之製造方法而獲得。具體而言,本發明之雙軸配向熱可塑性樹脂薄膜,可使用將視需要經乾燥之原料於擠出機內進行加熱熔融,從模口擠出至經冷卻之澆鑄滾筒上而加工成片材狀的方法(熔融澆鑄法)。作為其他方法,可使用使原料溶解於溶媒中,將此溶液從模口擠出至澆鑄滾筒、環形帶等支撐體上而作成膜狀,接著從此種膜層中將溶媒乾燥除去而加工為片材狀的方法(溶液澆鑄法)等。 The biaxially oriented thermoplastic resin film of the present invention can be obtained according to conventionally known manufacturing methods. Specifically, the biaxially oriented thermoplastic resin film of the present invention can be processed into a sheet by heating and melting the dried raw material in an extruder, and extruding it from the die to the cooled casting drum. Shape method (melt casting method). As another method, it is possible to dissolve the raw material in a solvent, extrude the solution from the die onto a support such as a casting drum or an endless belt to form a film, and then dry and remove the solvent from the film to be processed into a sheet Material-like method (solution casting method), etc.

在藉由熔融澆鑄法製造2層以上之積層聚酯樹脂薄膜時,適合使用依照構成積層聚酯薄膜之各層,使用擠出機使各層原料熔融,使此等在設於擠出裝置與模口之間的合流裝置依熔融狀態進行積層後,引導於模口,再從模口擠出至澆鑄滾筒上而加工成片材狀的方法(共擠出法)。該積層片材係藉由靜電而密接於表面溫度冷卻至20℃以上且60℃以下之滾筒上而冷卻固化,製作未延伸片材。澆鑄滾筒之溫度更佳為25℃以上且60℃以下、再更佳30℃以上且55℃以下。為20℃以下時,有照射電漿、並經雙軸延伸後的薄膜表面之突起形成不足的情形。若超過60℃,則有薄膜貼附於澆鑄滾筒,難以獲得未延伸薄膜的情形。 When manufacturing two-layer or more laminated polyester resin film by melt casting method, it is suitable to use each layer according to the composition of the laminated polyester film, use an extruder to melt the raw materials of each layer, and set these in the extrusion device and die. The merging device between the layers is laminated in the molten state, guided to the die, and then extruded from the die to the casting drum to be processed into a sheet (co-extrusion method). The laminated sheet is statically attached to a roller whose surface temperature is cooled to 20°C or more and 60°C or less, and then cooled and solidified to produce an unstretched sheet. The temperature of the casting drum is more preferably 25°C or more and 60°C or less, still more preferably 30°C or more and 55°C or less. When the temperature is below 20°C, there may be insufficient formation of protrusions on the surface of the film after irradiated with plasma and biaxially stretched. If it exceeds 60°C, the film may stick to the casting roll and it may be difficult to obtain an unstretched film.

接著,對於此所得之未延伸薄膜施行大氣壓輝光放電之電漿處理等的表面處理。此等表面處理可在剛獲得未延伸薄膜後馬上施行,亦可進行微延伸後再施行,亦可朝縱及/或橫方向延伸後才施行,本發明中較佳係對未延伸薄膜進行表面處理。又,施行表面處理之面可為接觸至澆鑄滾筒之面(滾筒面)、或未接觸至澆鑄滾筒之面(非滾筒面)的任一者。 Next, the unstretched film thus obtained is subjected to surface treatment such as plasma treatment of atmospheric pressure glow discharge. These surface treatments can be performed immediately after the unstretched film is obtained, or after micro-stretching, or after stretching in the longitudinal and/or transverse directions. In the present invention, it is preferable to perform surface treatment on the unstretched film. deal with. In addition, the surface to be subjected to the surface treatment may be either a surface contacting the casting drum (roller surface) or a surface not contacting the casting drum (non-roller surface).

其後,對未延伸薄膜進行雙軸延伸,而使其雙軸配向。作為延伸方法,可使用逐次雙軸延伸法或同步雙軸延伸法。最初於長邊方向進行延伸、接著進行寬度方向之延伸的逐次雙軸延伸法,可無延伸破裂地有效獲得本發明之雙軸配向熱可塑性樹脂薄膜。 Thereafter, the unstretched film is biaxially stretched to be biaxially aligned. As the stretching method, a successive biaxial stretching method or a synchronized biaxial stretching method can be used. The sequential biaxial stretching method, which initially stretches in the longitudinal direction and then stretches in the width direction, can effectively obtain the biaxially aligned thermoplastic resin film of the present invention without stretching fracture.

(雙軸延伸) (Biaxial extension)

有關對未延伸薄膜進行雙軸延伸時的延伸條件並無特別限定,在本發明之雙軸配向熱可塑性樹脂薄膜係以聚酯為主成分時,作為長邊方向之延伸,較佳係將未延伸片材引導至加熱為70℃以上之輥群,朝長邊方向(縱方向、亦即片材之行進方向)進行延伸,並藉20~50℃之溫度的輥群進行冷卻。長邊方向之延伸時加熱輥溫度的下限,係在不損及片材延伸性之前提下並無特別限定,較佳係超過所使用之聚酯樹脂之玻璃轉移溫度。又,長邊方向之延伸倍率之較佳範圍為3倍~5倍。更佳範圍為3倍~4倍。若長邊方向之延伸倍率未滿3倍,則配向結晶化不進行而薄膜強度顯著降低。另一方面,在延伸倍率超過5倍時,由於延伸所伴隨之聚酯樹脂之配向結晶化進行,而有在變脆之同時製膜時發生破斷的情形。 There are no particular restrictions on the stretching conditions when biaxially stretching the unstretched film. When the biaxially oriented thermoplastic resin film of the present invention is made of polyester as the main component, it is preferable to stretch the unstretched film in the longitudinal direction. The stretched sheet is guided to a group of rollers heated above 70°C, stretches in the longitudinal direction (longitudinal direction, that is, the direction of travel of the sheet), and is cooled by a group of rollers at a temperature of 20-50°C. The lower limit of the temperature of the heating roller during stretching in the longitudinal direction is not particularly limited without impairing the extensibility of the sheet, and preferably exceeds the glass transition temperature of the polyester resin used. In addition, the preferred range of the stretching ratio in the longitudinal direction is 3 to 5 times. The more preferable range is 3 times to 4 times. If the stretching ratio in the longitudinal direction is less than 3 times, the orientation crystallization does not proceed and the film strength is significantly reduced. On the other hand, when the stretching ratio exceeds 5 times, the orientation crystallization of the polyester resin accompanying the stretching progresses, and the film may be broken while becoming brittle.

接著,關於與長邊方向呈直角之方向(寬度方向)的延伸,係以夾具把持著薄膜兩端而引導至拉輻機,於加熱為70~160℃之溫度的環境中,朝與長邊方向呈直角之方向(寬度方向)進行3~5倍之延伸,及其後對經延伸之薄膜進行熱處理,而使薄膜內部之分子配向構造穩定化。關於熱處理時薄膜所受到之熱履歷溫度,可藉由以後述示差掃描熱量計(DSC)所測定之融點溫度之正下方所出現 的微小吸熱波峰(以下有時稱為Tmeta)溫度而確認,作為拉輻機裝置設定溫度,在例如以聚酯(融點255℃)為主成分時,較佳係將拉輻機內之最高溫度設定為200℃以上且250℃以下;在以其他熱可塑性樹脂為主成分時,較佳設定為樹脂融點-55℃以上且樹脂融點-5℃以下。在熱處理溫度小於200℃的情況,藉由上述大氣壓輝光放電處理所形成之突起無法充分成長,結果難以形成上述較佳範圍的突起。另一方面,在依超過250℃施行熱處理的情況,有薄膜熔解而多數發生破斷、生產性降低的情形。更佳範圍為220℃以上且245℃以下。 Next, regarding the extension in the direction perpendicular to the longitudinal direction (width direction), the two ends of the film are held by a clamp and guided to the stretcher, heated to a temperature of 70 to 160 ℃, facing the long side The direction is at right angles (width direction) to extend 3~5 times, and then heat the stretched film to stabilize the molecular alignment structure inside the film. Regarding the thermal history temperature of the film during heat treatment, it can be displayed directly below the melting point temperature measured by the differential scanning calorimeter (DSC) described later The temperature of the micro endothermic peak (hereinafter sometimes referred to as Tmeta) is confirmed. As the set temperature of the stretcher device, for example, when polyester (melting point 255℃) is the main component, it is better to set the highest temperature in the stretcher The temperature is set to 200°C or more and 250°C or less; when other thermoplastic resins are used as the main component, it is preferably set to a resin melting point of -55°C or more and a resin melting point of -5°C or less. In the case where the heat treatment temperature is less than 200°C, the protrusions formed by the above-mentioned atmospheric pressure glow discharge treatment cannot grow sufficiently, as a result, it is difficult to form the protrusions in the above-mentioned preferred range. On the other hand, when the heat treatment is performed at a temperature exceeding 250°C, the film melts and breaks in many cases and productivity is reduced. A more preferable range is 220°C or higher and 245°C or lower.

作為表示熱處理時薄膜所受到之熱履歷溫度的Tmeta的範圍,在以聚酯為主成分時,基於上述理由較佳為190℃以上且245℃以下。更佳範圍為210℃以上且240℃以下。 The range of Tmeta representing the heat history temperature received by the film during the heat treatment is preferably 190°C or higher and 245°C or lower when polyester is the main component. A more preferable range is 210°C or higher and 240°C or lower.

進而經熱處理後,以賦予尺寸穩定性為目的,亦可於0%以上且6%以下之範圍進行鬆弛(弛緩)處理。 Furthermore, after the heat treatment, for the purpose of imparting dimensional stability, a relaxation (relaxation) treatment may be performed in the range of 0% or more and 6% or less.

延伸倍率係於長邊方向與寬度方向分別設為3~5倍,其面積倍率(縱延伸倍率×橫延伸倍率)較佳為9~22倍、更佳9~20倍。若面積倍率未滿9倍,則所得雙軸延伸片材之耐久性不足;若面積倍率超過22倍則有延伸時容易發生破裂的傾向。 The stretch magnification is set to 3 to 5 times in the longitudinal direction and the width direction, respectively, and the area magnification (longitudinal stretch magnification×lateral stretch magnification) is preferably 9 to 22 times, more preferably 9 to 20 times. If the area magnification is less than 9 times, the durability of the obtained biaxially stretched sheet is insufficient; if the area magnification exceeds 22 times, cracks tend to occur during stretching.

[特性之評價方法] [Characteristic evaluation method]

A.藉非接觸光學式粗度測定器進行之評價 A. Evaluation by non-contact optical roughness tester

(i)高度10nm以上的突起個數A(個/mm2) (i) The number of protrusions with a height of 10nm or more A (pieces/mm 2 )

由本發明之雙軸配向熱可塑性樹脂薄膜進行10cm×10cm之採樣,針對各樣本,使用非接觸光學式粗度測定器(裝置:Zygo公司 製New View 7300),使用50倍接物鏡,於測定面積139μm×104μm,無規變更處所進行80視野測定。樣本設置係依使測定Y軸成為樣本薄膜之長邊方向(所謂長邊方向,係指薄膜之製造步驟中薄膜進行之方向)的方式將樣本設置於台。針對所得之測定數據,藉由該粗度測定器所內裝之表面分析軟體Metro Pro 8.1.3,將截止值於High Filter Wavelen設定為1.65μm,於Low Filter Wavelen設定為50.00μm。Reference Band(頻寬)指定為100nm,將10nm之截剪位準中之波峰換算為個/mm2單位。於80個視野均進行相同操作,以其等之平均值作為本發明之高度10nm以上的突起個數A(個/mm2)。 A sample of 10cm×10cm is taken from the biaxially aligned thermoplastic resin film of the present invention. For each sample, a non-contact optical roughness measuring device (device: New View 7300 manufactured by Zygo Corporation) is used to measure the area using a 50-fold lens 139μm×104μm, random change of location, 80 field of view measurement. The sample setting is to set the sample on the table in such a way that the Y-axis of the measurement becomes the long side direction of the sample film (the so-called long side direction refers to the direction in which the film progresses in the film manufacturing step). For the obtained measurement data, the cut-off value is set to 1.65μm in High Filter Wavelen and 50.00μm in Low Filter Wavelen with the surface analysis software Metro Pro 8.1.3 installed in the roughness tester. The Reference Band (bandwidth) is designated as 100nm, and the peak in the cut level of 10nm is converted into units/mm 2 unit. The same operation was performed in all 80 fields of view, and the average value thereof was used as the number A (number/mm 2 ) of protrusions with a height of 10 nm or more in the present invention.

(ii)高度60nm以上的突起個數C(個/mm2) (ii) The number C of protrusions above 60nm in height (pcs/mm 2 )

與前項(i)同樣進行,將60nm之截剪位準中之波峰換算為個/mm2單位,將所觀察之80個視野之平均值作為本發明之高度60nm以上的突起個數C。 In the same manner as in the preceding paragraph (i), the peaks in the cut level of 60 nm are converted into units/mm 2 and the average value of the observed 80 fields of view is taken as the number C of protrusions with a height of 60 nm or more in the present invention.

B. AFM(Atomic Force Microscope,原子力顯微鏡)所進行之評價 B. Evaluation by AFM (Atomic Force Microscope)

(iii)高度1nm以上且未滿10nm的突起個數B(個/mm2) (iii) The number B of protrusions with a height of 1 nm or more and less than 10 nm (pieces/mm 2 )

對藉以下測定方法所得之薄膜表面的影像,使用附屬之解析軟體(NanoScope Analysis Version 1.40)進行解析。對所得薄膜表面之Height Sensor影像僅施行下述Flatten處理後,將Particle Analysis解析模式如下述般設定,而自動地決定薄膜表面之基準面。由該基準面,將突起高度之閾值(Threshold Height)為1nm(R1nm)時之每1μm2的突起密度之平均值(Density列,Mean行的值)換算為每1mm2的數值設為N1nm(個/mm2),將10nm(R10nm)時之每1μm2的突起密度 之平均值(Density列,Mean行的值)換算為每1mm2的數值設為N10nm(個/mm2)時,將由下式求得之值作為其測定影像之高度1nm以上且未滿10nm的突起個數B(個/mm2)。 Use the attached analysis software (NanoScope Analysis Version 1.40) to analyze the image of the film surface obtained by the following measurement method. After only performing the following Flatten processing on the height sensor image of the obtained film surface, the Particle Analysis analysis mode is set as follows, and the reference plane of the film surface is automatically determined. From this reference plane, the average value of the protrusion density per 1μm 2 when the threshold height of the protrusion (Threshold Height) is 1nm (R 1nm ) (the value in the Density column, Mean row) is converted to the value per 1mm 2 as N 1nm (pieces/mm 2 ), the average value of the protrusion density per 1μm 2 at 10nm (R 10nm ) (Density column, Mean row value) is converted to a value per 1mm 2 as N 10nm (pieces/mm 2 In the case of ), the value obtained by the following formula is regarded as the number B (number/mm 2 ) of protrusions with a height of 1 nm or more and less than 10 nm of the measured image.

B(個/mm2)=N1nm(個/mm2)-N10nm(個/mm2) B (pieces/mm 2 )=N 1nm (pieces/mm 2 )-N 10nm (pieces/mm 2 )

於各樣本之20處之測定影像全部進行上述解析,將其平均值作為樣本之高度1nm以上且未滿10nm的突起個數B(個/mm2) Perform the above analysis on all 20 measurement images of each sample, and use the average value as the number of protrusions B (pieces/mm 2 ) with a height of 1 nm or more and less than 10 nm of the sample

[AFM測定方法] [AFM measurement method]

˙裝置:Bruker公司製原子力顯微鏡(AFM)Dimention Icon with ScanAsyst ˙Device: Atomic Force Microscope (AFM) Dimention Icon with ScanAsyst manufactured by Bruker

˙懸臂:氮化矽製探針ScanAsyst Air ˙Cantilever: silicon nitride probe ScanAsyst Air

˙掃描模式:ScanAsyst ˙Scan mode: ScanAsyst

˙掃描速度:0.977Hz ˙Scanning speed: 0.977Hz

˙掃描方向:朝依後述方法所製作之測定樣本之寬度方向進行掃描 ˙Scan direction: scan toward the width direction of the measurement sample made according to the method described below

˙測定視野:5μm四方 ˙Measurement field of view: 5μm square

˙樣本管線512 ˙Sample pipeline 512

˙Peak Force SetPoint:0.0195V~0.0205V ˙Peak Force SetPoint: 0.0195V~0.0205V

˙Feedback Gain:10~20 ˙Feedback Gain: 10~20

˙LP Deflection BW:40kHz ˙LP Deflection BW: 40kHz

˙ScanAsyst Noise Threshold:0.5nm ˙ScanAsyst Noise Threshold: 0.5nm

˙樣本調整:23℃、65%RH、靜置24小時 ˙Sample adjustment: 23℃, 65%RH, stand for 24 hours

˙AFM測定環境:23℃、65%RH ˙AFM measurement environment: 23℃, 65%RH

˙測定樣本作成方法:於AFM試料碟(直徑15mm)之單面貼附 雙面膠帶,將AFM試料碟、及切出為約15mm×13mm(長邊方向×寬度方向)之本發明之雙軸配向熱可塑性樹脂薄膜之上述表面(測定面)的相反面貼合,作為測定樣本。 ˙Method of preparing the measurement sample: Attach it on one side of the AFM sample disc (diameter 15mm) Double-sided tape, the AFM sample disc and the biaxially oriented thermoplastic resin film of the present invention cut out to about 15mm×13mm (long side direction×width direction) are pasted on the opposite side of the above-mentioned surface (measurement surface) as Measure the sample.

˙樣本測定次數:依各樣本彼此至少相距5μm以上的方式變更場所,進行20次測定。 ˙Number of sample measurements: Change the location so that each sample is at least 5μm away from each other, and perform 20 measurements.

˙測定值:對所測定之20處之影像進行上述解析,測定各數值並以其平均值作為樣本所具有之各數值。 ˙Measured value: Perform the above analysis on the measured 20 images, measure each value and use the average value as the value of the sample.

[Flatten處理] [Flatten processing]

˙Flatten Order:3rd ˙Flatten Order: 3 rd

˙Flatten Z Threshholding Direction:No thresholding ˙Flatten Z Threshholding Direction: No thresholding

˙Find Threshold for:the whole image ˙Find Threshold for: the whole image

˙Flatten Z Threshold %:0.00% ˙Flatten Z Threshold %: 0.00%

˙Mark Excluded Data:Yes ˙Mark Excluded Data: Yes

[Particle Analysis模式設定] [Particle Analysis mode setting]

(Detect tab) (Detect tab)

˙Threshold Height:配合各值輸入 ˙Threshold Height: cooperate with each value input

˙Feature Direction:Above ˙Feature Direction: Above

˙X Axis:Absolute ˙X Axis: Absolute

˙Number Histogram Bins:512 ˙Number Histogram Bins: 512

˙Histogram Filter Cutoff:0.00nm ˙Histogram Filter Cutoff: 0.00nm

˙Min Peak to Peak:1.00nm ˙Min Peak to Peak: 1.00nm

˙Left Peak Cutoff:0.00000% ˙Left Peak Cutoff: 0.00000%

˙Right Peak Cutoff:0.00000% ˙Right Peak Cutoff: 0.00000%

(Modify tab) (Modify tab)

˙Beughbirhood Size:3 ˙Beughbirhood Size: 3

˙Number Pixels off:1 ˙Number Pixels off: 1

˙所有Dilate/Erode操作均不進行。 ˙All Dilate/Erode operations are not performed.

(Select tab) (Select tab)

˙Image Cursor Mode:Particle Select ˙Image Cursor Mode: Particle Select

˙Bound Particles:Yes ˙Bound Particles: Yes

˙Non-Representative Particles:No ˙Non-Representative Particles: No

˙Height Reference:Relative To Max Peak ˙Height Reference: Relative To Max Peak

˙Number Histogram Bins:50 ˙Number Histogram Bins: 50

˙在求取上述數值時,不選擇解析影像中之特定波峰、區域 ˙When calculating the above values, do not choose to analyze specific peaks and regions in the image

˙於Diameter、Height、Area之所有直方圖不選擇特定處。 ˙No specific place is selected for all histograms of Diameter, Height, and Area.

C.平均1次粒徑 C. Average primary particle size

對本發明之雙軸配向熱可塑性樹脂薄膜之剖面,使用穿透型電子顯微鏡(TEM)依1萬倍進行觀察。此時,在觀察視野中確認到200nm以下之粒子時係將TEM觀察倍率變更為10萬倍進行觀察。改變場所測定100視野,對照片中所拍攝到之分散之所有粒子換算等效圓直徑,以橫徑為等效圓直徑、縱軸為粒子個數描繪粒子之個數分佈,將其波峰值之等效圓直徑作為粒子之平均1次粒徑。於此,上述繪圖中並不包括依1萬倍觀察之照片上確認到凝集粒子的情況。在薄膜中存在粒徑不同之2種以上粒子的情況,上述等效圓直徑之個數分佈成為具有2個以上波峰的分佈。此時,將各別之波峰作為各別之粒子的平均1次粒徑。最大粒子之粒徑係於依1萬倍進行觀察的照片中,具有最大粒徑之粒子的粒徑。 The cross-section of the biaxially aligned thermoplastic resin film of the present invention was observed at 10,000 times using a transmission electron microscope (TEM). At this time, when particles of 200 nm or less were confirmed in the observation field, the TEM observation magnification was changed to 100,000 times for observation. Change the location to measure the 100 field of view, and convert the equivalent circle diameter of all the scattered particles taken in the photo. Use the horizontal diameter as the equivalent circle diameter and the vertical axis as the number of particles to describe the particle number distribution, and divide the wave peak value The equivalent circle diameter is taken as the average primary particle size of the particles. Here, the above drawing does not include the case where agglomerated particles are confirmed on the photograph observed at 10,000 times. When there are two or more types of particles with different particle diameters in the film, the number distribution of the equivalent circle diameter is a distribution having two or more peaks. At this time, the respective peaks are regarded as the average primary particle size of the respective particles. The particle size of the largest particle is the particle size of the particle with the largest particle size in the photograph observed at 10,000 times.

凝集粒子之平均1次粒徑係使用上述裝置依20萬倍進行觀察。針對100個凝集粒子,換算構成凝集粒子之各個1次粒子的等效圓直徑,依與上述相同之方法進行描繪,以波峰值之等效圓直徑作為凝集粒子之平均1次粒徑。 The average primary particle size of agglomerated particles was observed at 200,000 times using the above-mentioned device. For 100 agglomerated particles, the equivalent circle diameter of each primary particle constituting the agglomerated particle is converted and drawn in the same way as above, and the equivalent circle diameter of the peak value is taken as the average primary particle diameter of the agglomerated particle.

D.粒子含量 D. Particle content

將本發明之雙軸配向熱可塑性樹脂薄膜之P1層部分1g投入至1N-KOH甲醇溶液200mL進行加熱回流,將聚合物溶解。對溶解結束之該溶液加入200mL水,接著將該液體藉由離心機使粒子沉降,去除上清液。進一步對粒子加水進行洗淨、離心並重複2次。將如此所得之粒子乾燥,秤量其質量算出粒子含量。 1 g of the P1 layer part of the biaxially oriented thermoplastic resin film of the present invention was put into 200 mL of 1N-KOH methanol solution and heated to reflux to dissolve the polymer. 200 mL of water was added to the solution after dissolution, and then the liquid was centrifuged to settle the particles, and the supernatant was removed. Further wash the particles with water, centrifuge and repeat 2 times. The particles thus obtained are dried, and the mass is weighed to calculate the particle content.

E.空氣釋出指標 E. Air release index

使用DIGI-BEKK平滑度試驗機(東洋精機製(股)),依25℃、65%RH進行測定。將本發明之雙軸配向熱可塑性樹脂薄膜依具有上述表面之面與試料台相接的方式設置。此時,設置成使薄膜完全覆蓋試料台上之空洞。依此狀態施加1kg/cm2之負重,將初期減壓度(距常壓之減壓度)設定為385mmHg。由於常壓減壓385mmHg後欲回復至常壓,故空氣流入至薄膜與試料台間,此時,測定距常壓之減壓度由382mmHg成為381mmHg的時間(空氣釋出時間)。針對10個樣本測定上述空氣釋出時間,以其平均值作為薄膜之空氣釋出指標。 The DIGI-BEKK smoothness tester (Toyo Seiki Co., Ltd.) was used to measure at 25°C and 65% RH. The biaxially aligned thermoplastic resin film of the present invention is arranged in such a way that the surface having the above-mentioned surface is in contact with the sample table. At this time, it is set so that the film completely covers the cavity on the sample table. Apply a load of 1kg/cm 2 in this state, and set the initial decompression degree (the decompression degree from normal pressure) to 385mmHg. Since the normal pressure is decompressed to 385mmHg to return to normal pressure, air flows between the film and the sample stage. At this time, the time (air release time) from 382mmHg to 381mmHg from normal pressure is measured. The above-mentioned air release time was measured for 10 samples, and the average value was used as the air release index of the film.

A:空氣釋出時間未滿2400秒 A: The air release time is less than 2400 seconds

B:空氣釋出時間為2400秒以上且未滿2700秒 B: The air release time is more than 2400 seconds and less than 2700 seconds

C:空氣釋出時間為2700秒以上且未滿2900秒 C: The air release time is more than 2700 seconds and less than 2900 seconds

D:空氣釋出時間為2900秒以上 D: Air release time is more than 2900 seconds

空氣釋出指標係A~C為良好,其中最優良為A。 The air release index is good from A to C, and the best is A.

F.薄膜之固有黏度 F. The inherent viscosity of the film

使本發明之薄膜溶解於鄰氯苯酚100ml(溶液濃度C=1.2g/dL),使用奧氏黏度計測定此溶液之25℃黏度。又,同樣地測定溶媒黏度。使用所得溶液黏度、溶媒黏度,藉下式(a)算出[η](dL/g),以所得值作為固有黏度(IV)。 The film of the present invention was dissolved in 100 ml of o-chlorophenol (solution concentration C=1.2g/dL), and the 25°C viscosity of the solution was measured using an Austen Viscometer. Also, the viscosity of the solvent was measured in the same manner. Using the obtained solution viscosity and solvent viscosity, [η] (dL/g) is calculated by the following formula (a), and the obtained value is taken as the intrinsic viscosity (IV).

(a)ηsp/C=[η]+K[η]2.C (a) ηsp/C=[η]+K[η] 2 . C

(於此,ηsp=(溶液黏度(dL/g)/溶媒黏度(dL/g))-1,K為赫金斯常數(設為0.343))。 (Here, ηsp=(solution viscosity (dL/g)/solvent viscosity (dL/g))-1, K is the Herkins constant (set to 0.343)).

在本發明之雙軸配向熱可塑性樹脂薄膜為積層構成時,具有上述表面之層(P1層)之IV係藉常法僅切削出P1層,依上述方法進行測定。 When the biaxially oriented thermoplastic resin film of the present invention has a laminated structure, only the P1 layer is cut out of the IV system of the layer (P1 layer) having the above-mentioned surface by a conventional method, and the measurement is performed according to the above method.

G.末端羧基量(表中記載為COOH量) G. The amount of terminal carboxyl groups (indicated as COOH amount in the table)

關於末端羧基量,係依照Maulice之方法,依以下方法進行測定。(文獻M.J.Maulice,F.Huizinga,Anal.Chim.Acta,22 363(1960)) The amount of terminal carboxyl groups was measured in accordance with Maulice's method according to the following method. (Document M.J.Maulice, F.Huizinga, Anal.Chim.Acta, 22 363 (1960))

將測定試料2g依溫度80℃溶解於鄰甲酚/氯份(重量比7/3)50mL,藉由0.05N之KOH/甲醇溶液進行滴定,測定末端羧基濃度,依當量/聚酯樹脂1t之值表示。又,滴定時之指示劑係使用酚紅,以由黃綠色變為淡紅色時作為滴定終點。又,在溶解了測定試料之溶液中有無機粒子等不溶物時,係過濾溶液並進行不溶物之 質量測定,實施以由測定試料質量減去不溶物質量之值作為測定試料質量的校正。 Dissolve 2 g of the measurement sample in 50 mL of o-cresol/chlorine (weight ratio 7/3) at a temperature of 80°C, and titrate with a 0.05N KOH/methanol solution to determine the concentration of terminal carboxyl groups. Value representation. In addition, phenol red is used as an indicator for titration, and the end point of the titration is when it changes from yellow-green to light red. In addition, when there are insoluble matter such as inorganic particles in the solution in which the measurement sample is dissolved, the solution is filtered and the insoluble matter is removed. For mass measurement, a calibration is performed by subtracting the mass of the insoluble matter from the mass of the measurement sample as the mass of the measurement sample.

H.捲取性 H. Coilability

將本發明之雙軸配向熱可塑性樹脂薄膜依4.5m寬進行製膜並進行連續5000m之輥捲取10次,由所得之10根輥的情況如下述評價薄膜捲取性。 The biaxially oriented thermoplastic resin film of the present invention was formed into a film with a width of 4.5 m and was continuously wound with a roll of 5000 m for 10 times, and the film rollability was evaluated as follows in the case of the obtained 10 rolls.

A:10根輥內,發生皺紋之輥為1根以下。 A: Within 10 rolls, the number of rolls with wrinkles is less than 1 roll.

B:10根輥內,發生皺紋之輥為2根。 B: Among 10 rolls, 2 rolls have wrinkles.

C:10根輥內,發生皺紋之輥為3根以上且4根以下。 C: Among 10 rolls, the number of rolls with wrinkles is 3 or more and 4 or less.

D:10根輥內,發生皺紋之輥為5根以上且6根以下。 D: Among 10 rolls, the number of rolls with wrinkles is 5 or more and 6 or less.

E:10根輥內,發生皺紋之輥為7根以上。 E: Among 10 rolls, there are 7 or more rolls with wrinkles.

捲取性係A~D為良好,其中最優良為A。 The coilability is good from A to D, and the best is A.

I.捲繞情況 I. Winding situation

針對前項採用之本發明之雙軸配向熱可塑性樹脂薄膜輥10根,依各寬1.5m進行切條採取30根之條輥。由條輥之情況依下述評價薄膜輥之捲繞情況。 Regarding the 10 biaxially oriented thermoplastic resin film rolls of the present invention used in the previous paragraph, 30 rolls were cut into strips with a width of 1.5m each. From the condition of the strip roll, the winding condition of the film roll was evaluated as follows.

A:30根條輥中,發生了捲繞偏差的輥為2根以下。 A: Among 30 rolls, the number of rolls with winding deviation is 2 or less.

B:30根條輥中,發生了捲繞偏差的輥為3根以上且5根以下。 B: Among 30 rolls, the number of rolls with winding deviation is 3 or more and 5 or less.

C:30根條輥中,發生了捲繞偏差的輥為6根以上且8根以下。 C: Among 30 rolls, the number of rolls with winding deviation is 6 or more and 8 or less.

D:30根條輥中,發生了捲繞偏差的輥為9根以上。 D: Among 30 rolls, there are 9 or more rolls with winding deviation.

J.形狀轉印缺點評價 J. Evaluation of shortcomings of shape transfer

本發明之雙軸配向熱可塑性樹脂薄膜之形狀轉印缺點評價,係依下述方法進行評價。將切條為1m寬之本發明之雙軸配向熱可塑性樹脂薄膜依張力200N進行搬送,於本發明之雙軸配向熱可塑性樹脂薄膜之與上述表面相反的面側,將後述非磁性層形成用塗佈液與磁性層形成用塗佈液進行重層塗佈,並於上述表面側塗佈後述背塗層形成用塗佈液,進而切條為12.65mm(1/2吋)寬,作成薄餅(pancake)。 The evaluation of the defect of the shape transfer of the biaxially oriented thermoplastic resin film of the present invention was evaluated according to the following method. The biaxially oriented thermoplastic resin film of the present invention cut to a width of 1 m is conveyed under a tension of 200N. On the side of the biaxially oriented thermoplastic resin film of the present invention opposite to the above surface, the non-magnetic layer described later is used for forming The coating liquid and the coating liquid for forming a magnetic layer are coated in a double layer, and the coating liquid for forming a back coat layer described later is applied to the surface side, and then cut into strips with a width of 12.65 mm (1/2 inch) to make a pancake ( pancake).

(以下,「份」係指「質量份」。) (Hereinafter, "parts" means "parts by mass".)

Figure 108141227-A0101-12-0024-2
Figure 108141227-A0101-12-0024-2

Figure 108141227-A0101-12-0025-3
Figure 108141227-A0101-12-0025-3

針對上述各塗佈液,分別將各成分藉捏合機進行混練。在裝有1.0mmΦ二氧化鋯球珠依相對於分散部容積填充65體積%之量的臥式砂磨機中,將塗佈液利用泵進行通液,依2,000rpm進行120分鐘(實質上於分散部中滯留的時間)分散。在非磁性層之塗料時於所獲得分散液中添加聚異氰酸酯5.0份,在磁性層之塗料時則添加2.5份,並進一步添加甲基乙基酮3份,使用具1μm平均孔徑之過濾器進行過濾,而分別調製非磁性層形成用及磁性層形成用之塗佈液。 For each of the above-mentioned coating liquids, the respective components were kneaded with a kneader. In a horizontal sand mill equipped with 1.0mmΦ zirconia balls filled with an amount of 65% by volume relative to the volume of the dispersion part, the coating liquid was passed through a pump and carried out at 2,000rpm for 120 minutes (essentially The time spent in the dispersion part) is dispersed. For the coating of the non-magnetic layer, add 5.0 parts of polyisocyanate to the obtained dispersion, and for the coating of the magnetic layer, add 2.5 parts, and further add 3 parts of methyl ethyl ketone, using a filter with a 1μm average pore size. After filtering, the coating solutions for forming the non-magnetic layer and the coating solution for forming the magnetic layer were prepared separately.

將所得非磁性層形成用塗佈液,於本發明之雙軸配向熱可塑性樹脂薄膜之與上述表面相反的面上,依乾燥後之厚度成為 0.8μm之方式進行塗佈乾燥後,將磁性層形成用塗佈液依乾燥後之磁性層厚度成為0.07μm方式進行塗佈,在磁性層尚呈濕潤狀態的期間,利用具6,000G(600mT)磁力之鈷磁石與具6,000G(600mT)磁力之螺線管使其進行配向並乾燥。 The obtained coating solution for forming a non-magnetic layer is applied to the surface of the biaxially oriented thermoplastic resin film of the present invention opposite to the above-mentioned surface, and the thickness after drying becomes After coating and drying by 0.8μm method, apply the coating solution for forming the magnetic layer so that the thickness of the magnetic layer after drying becomes 0.07μm. When the magnetic layer is still wet, use a 6,000G (600mT) The magnetic cobalt magnet and the solenoid with 6,000G (600mT) magnetic force are aligned and dried.

其後,依軋光後之厚度成為0.5μm之方式,在上述表面側塗佈背塗層形成用塗佈液(使碳黑平均粒子尺寸17nm:100份、碳酸鈣平均粒子尺寸40nm:80份、及α氧化鋁平均粒子尺寸200nm:5份,分散於聚胺基甲酸酯樹脂、聚異氰酸酯中)。接著,利用軋光機依溫度90℃、線壓300kg/cm(294kN/m)進行軋光處理後,依65℃進行72小時硬化。又,對在具有切條物之送出、捲取裝置的裝置依壓抵於磁性面之方式安裝不織布與剃刀,利用帶清洗裝置進行磁性層表面清洗,獲得磁性帶。 Thereafter, the coating solution for forming a back coat layer was applied to the surface side so that the thickness after calendering became 0.5 μm (the average particle size of carbon black was 17 nm: 100 parts, and the average particle size of calcium carbonate was 40 nm: 80 parts. , And α alumina average particle size 200nm: 5 parts, dispersed in polyurethane resin, polyisocyanate). Next, after calendering at a temperature of 90°C and a line pressure of 300kg/cm (294kN/m) using a calender, curing was performed at 65°C for 72 hours. In addition, a non-woven fabric and a razor are installed on a device with a device for discharging and reeling strips by pressing against the magnetic surface, and the surface of the magnetic layer is cleaned by the tape cleaning device to obtain a magnetic tape.

將所得帶原料切條為12.65mm(1/2吋)寬,將其組裝於LTO用箱體中,製成磁性記錄帶長度為960m之資料儲存匣。將此資料儲存匣使用IBM公司製LTO7驅動器,於23℃、50%RH環境下進行記錄(記錄波長0.55μm),接著將匣在50℃、80%RH環境下保存7天。將匣於常溫保存1天後,進行全長播放,測定播放時的信號錯誤率。錯誤率係由驅動器所輸出的錯誤資訊(錯誤位元數),依下式(b)進行計算。 The obtained tape material was cut into strips with a width of 12.65 mm (1/2 inch), and assembled in a box for LTO to form a data storage cassette with a magnetic recording tape length of 960 m. This data storage cartridge was used for recording in an environment of 23°C and 50% RH using an LTO7 driver manufactured by IBM (recording wavelength 0.55 μm), and then the cartridge was stored at 50°C and 80% RH for 7 days. After the cassette was stored at room temperature for 1 day, full-length playback was performed, and the signal error rate during playback was measured. The error rate is calculated by the error information (number of error bits) output by the driver according to the following formula (b).

(a)錯誤率=(錯誤位元數)/(寫入位元數) (a) Error rate = (number of error bits)/(number of written bits)

A:錯誤率未滿1.0×10-6A: The error rate is less than 1.0×10 -6 .

B:錯誤率為1.0×10-6以上、且未滿1.0×10-5B: The error rate is 1.0×10 -6 or more and less than 1.0×10 -5 .

C:錯誤率為1.0×10-5以上、未滿1.0×10-4C: The error rate is 1.0×10 -5 or more and less than 1.0×10 -4 .

D:錯誤率為1.0×10-4以上。 D: The error rate is 1.0×10 -4 or more.

形狀轉印缺點評價係以A~C為良好,其中最優良為A。 The shape transfer defect evaluation is based on A~C as good, and the best is A.

K.胚片特性評價 K. Evaluation of characteristics of embryonic tablets

以下利用a.至b.的方法進行胚片特性評價。 The following methods a. to b. are used to evaluate the characteristics of the green sheet.

a.離型層之塗佈 a. Coating of release layer

於本發明之雙軸配向熱可塑性樹脂薄膜之與上述表面相反的面,將由交聯底漆層(Toray.Dow Corning.Silicones(股)製商品名BY24-846)調整為固形份1質量%的塗佈液進行塗佈/乾燥,依乾燥後之塗佈厚度成為0.1μm之方式利用凹版塗佈機進行塗佈,再依100℃進行20秒鐘乾燥硬化。其後,於1小時以內將由加成反應型聚矽氧樹脂(Toray.Dow Corning.Silicones(股)製商品名LTC750A)100質量份、白金觸媒(Toray.Dow Corning.Silicones(股)製商品名SRX212)2質量份調整為固形份5質量%的塗佈液,依乾燥後之塗佈厚度成為0.1μm之方式,利用凹版塗佈機進行塗佈,依120℃進行30秒鐘乾燥硬化後進行捲取,獲得離型薄膜。 On the surface of the biaxially oriented thermoplastic resin film of the present invention opposite to the above-mentioned surface, the cross-linked primer layer (trade name BY24-846 manufactured by Toray, Dow Corning, Silicones (stock)) is adjusted to a solid content of 1% by mass The coating solution is coated/dried, and then coated with a gravure coater so that the coating thickness after drying becomes 0.1μm, and then dried and cured at 100°C for 20 seconds. Thereafter, within 1 hour, 100 parts by mass of addition reaction type silicone resin (Toray Dow Corning Silicones (stock) product name LTC750A), platinum catalyst (Toray Dow Corning Silicones (stock) product product Name SRX212) 2 parts by mass of a coating solution adjusted to a solid content of 5% by mass. After drying, the coating thickness becomes 0.1μm, and then apply it with a gravure coater. After drying and curing at 120°C for 30 seconds Reel to obtain release film.

b.胚片之塗佈狀態的評價(陶瓷漿料之塗佈性) b. Evaluation of the coating state of the green sheet (coating property of ceramic slurry)

於鈦酸鋇(富士鈦工業(股)製商品名HPBT-1)100質量份、聚乙烯丁醛(積水化學(股)製商品名BL-1)10質量份、酞酸二丁酯5質量份、與甲苯-乙醇(質量比30:30)60質量份中,添加數量平均粒徑2mm之玻璃珠,利用噴射粉碎機進行20小時混合.分散後,進行過濾而製得糊狀之陶瓷漿料。對所得陶瓷漿料,利用模塗機在離型薄膜之藉前項a設置了離型層的面上、依乾燥後之厚度成為2μm之方式進行塗佈並使其乾燥,捲取而獲得胚片。將上述所捲取的胚片繞出,依未從離型薄膜剝離的狀態,目視觀察確認有無針孔、或片材 表面及端部的塗佈狀態。又,所觀察之面積係寬300mm、長500mm。針對離型薄膜上所成形之胚片,從背面依1000勒克斯的背光單元進行照射,並觀察因漏塗所造成的針孔、或離型薄膜背面之因表面轉印所造成的凹陷狀態。 Based on 100 parts by mass of barium titanate (trade name HPBT-1 manufactured by Fuji Titanium Industry Co., Ltd.), 10 parts by mass of polyvinyl butyral (trade name BL-1 manufactured by Sekisui Chemical Co., Ltd.), and 5 mass parts of dibutyl phthalate Toluene-ethanol (mass ratio 30:30) 60 parts by mass, add glass beads with a number average particle size of 2mm, and mix with a jet mill for 20 hours. After the dispersion, filtration is performed to prepare a paste-like ceramic slurry. The resulting ceramic slurry was coated with a die coater on the surface of the release film with the release layer provided in the previous paragraph a, and dried so that the thickness after drying became 2μm, and then rolled to obtain a green sheet . Take out the rolled up green sheet, and visually observe whether there are pinholes or sheet material in a state where it is not peeled off from the release film Coating state of surface and end. In addition, the observed area is 300mm wide and 500mm long. For the green sheet formed on the release film, irradiate it from the back with a 1000 lux backlight unit, and observe the pinholes caused by missing coating, or the concave state on the back of the release film caused by surface transfer.

A:無針孔亦無凹陷。 A: No pinholes and no dents.

B:無針孔,凹陷為3個以內。 B: There is no pinhole, and the number of depressions is less than 3.

C:無針孔,凹陷為5個以內。 C: There is no pinhole, and the number of depressions is less than 5.

D:一部分有針孔,或凹陷為6個以上。 D: There are pinholes in a part, or 6 or more dents.

胚片特性評價係以A~C為良好,其中最優良為A。 The evaluation system of green sheet characteristics is good from A to C, and A is the best.

L.霧度 L. Haze

由本發明之雙軸配向熱可塑性樹脂薄膜採集3件(3個)一邊5cm之正方形狀之樣本。接著將樣本於23℃、60%RH中放置40小時。針對各樣品使用日本電色工業(股)製濁度計「NDH5000」,依照根據JIS「透明材料之霧度求法」(K7136 2000年版)的方式實施。將各3件(3個)的霧度之值平均,設為薄膜的霧度之值。 From the biaxially oriented thermoplastic resin film of the present invention, 3 pieces (3 pieces) of square samples with a side of 5 cm are collected. The sample was then placed at 23°C and 60%RH for 40 hours. The turbidity meter "NDH5000" manufactured by Nippon Denshoku Industries Co., Ltd. was used for each sample, and it was implemented in accordance with the JIS "Method of Obtaining Haze of Transparent Materials" (K7136 2000 Edition). The haze value of each 3 pieces (3 pieces) is averaged, and it is set as the haze value of a film.

M.光阻評價 M. Photoresist evaluation

藉以下a.至c.之方法進行光阻評價。 Use the following methods a. to c. for photoresist evaluation.

a.在經單面鏡面研磨之6吋Si晶圓上,塗佈東京應化(股)製負型光阻「PMERN-HC600」,利用大型旋塗機使其旋轉而製作厚7μm之光阻層。接著,使用氮循環之通風爐,依70℃溫度條件進行約20分鐘的前熱處理。 a. Coat the negative photoresist "PMERN-HC600" manufactured by Tokyo Ohka Co., Ltd. on a single-sided mirror-polished 6-inch Si wafer, and spin it with a large spin coater to produce a photoresist with a thickness of 7μm Floor. Then, using a ventilated furnace with nitrogen circulation, the pre-heat treatment is performed for about 20 minutes at a temperature of 70°C.

b.將本發明之雙軸配向熱可塑性樹脂薄膜之與上述表面相反之 面,依接觸於光阻層的方式重疊,使用橡膠製輥,於光阻層上層合雙軸配向熱可塑性樹脂薄膜,於其上配置藉由鉻金屬所圖案化的光柵,由此光罩上使用I射線(在波長365nm具有尖峰之紫外線)步進器進行曝光。 b. The biaxially aligned thermoplastic resin film of the present invention is opposite to the above-mentioned surface The surface is overlapped in the way that it touches the photoresist layer. Using a rubber roller, a biaxially oriented thermoplastic resin film is laminated on the photoresist layer, and a grating patterned by chromium metal is placed on the photomask. An I-ray (ultraviolet with a sharp peak at a wavelength of 365 nm) stepper was used for exposure.

c.由光阻層剝離聚酯薄膜後,將光阻層放入於裝有顯影液N-A5之容器中進行顯影約1分鐘。其後,由顯影液中取出,藉水進行約1分鐘之洗淨。使用掃描式電子顯微鏡SEM依約800~3000倍率觀察顯影後所作成之光阻圖案的L/S(μm)(Line and Space)=10/10μm之30條的狀態,依圖案中有缺損的條數,如下述進行評價。 c. After peeling off the polyester film from the photoresist layer, put the photoresist layer in a container with developer N-A5 for development for about 1 minute. After that, it was taken out of the developing solution and washed with water for about 1 minute. Use scanning electron microscope SEM to observe the state of L/S(μm)(Line and Space)=10/10μm of 30 strips of the photoresist pattern made after development at a magnification of about 800~3000. According to the defective strips in the pattern The number is evaluated as follows.

A:有缺損的條數為5條以下 A: The number of defective bars is less than 5

B:有缺損的條數為6條以上且10條以下 B: The number of defective bars is 6 or more and 10 or less

C:有缺損的條數為11條以上且15條以下 C: The number of defective bars is 11 or more and 15 or less

D:有缺損的條數為16條以上 D: The number of defective bars is 16 or more

光阻特性評價係以A~C為良好,其中最優良為A。 The evaluation of photoresist properties is based on A to C as good, and the best is A.

[實施例] [Example]

以下,針對本發明列舉實施例進行說明,但本發明並不侷限於此等。 Hereinafter, the present invention will be described with reference to embodiments, but the present invention is not limited to these.

[PET-1之製造]由對酞酸及乙二醇,以三氧化銻作為觸媒,依常法進行聚合,得到實質上不含粒子之熔融聚合PET。所得熔融聚合PET之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.62。其後,依常法進行固相聚合,得到固相聚合PET。所得固相聚合PET之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.81。 [Production of PET-1] From terephthalic acid and ethylene glycol, using antimony trioxide as a catalyst, polymerization is carried out according to the usual method to obtain substantially no particles of melt polymerized PET. The obtained melt polymerized PET has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.62. Thereafter, solid-phase polymerization was carried out according to the usual method to obtain solid-phase polymerized PET. The obtained solid-phase polymerized PET has a glass transition temperature of 81°C, a melting point of 255°C, and an inherent viscosity of 0.81.

[MB-A之製造]在前項PET-1之聚合時,以相對於PET 之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑為21nm的δ氧化鋁(氧化鋁-1),得到PET基底母粒MB-A。所得之熔融聚合MB-A之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-A] During the polymerization of PET-1 in the preceding paragraph, the With the content of 2.0% by weight, δ alumina (alumina-1) with an average primary particle size of 21nm dispersed in ethylene glycol was added to obtain the PET base masterbatch MB-A. The obtained melt polymerized MB-A has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-B之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑16nm的δ氧化鋁(氧化鋁-2),得到PET基底母料MB-B。所得之熔融聚合MB-B之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-B] During the polymerization of PET-1 in the preceding paragraph, δ alumina (alumina-alumina) dispersed in ethylene glycol with an average primary particle size of 16 nm was added so that the content of PET was 2.0% by weight. 2) Obtain the PET base masterbatch MB-B. The obtained melt polymerized MB-B had a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-C之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑11nm的δ氧化鋁(氧化鋁-3),得到PET基底母料MB-C。所得之熔融聚合MB-C之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-C] During the polymerization of PET-1 in the preceding paragraph, δ alumina (alumina-alumina) dispersed in ethylene glycol with an average primary particle size of 11 nm was added so that the content of PET was 2.0% by weight. 3) Obtain the PET base masterbatch MB-C. The obtained melt polymerized MB-C has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-D之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑210nm的二氧化矽(二氧化矽-1),得到PET基底母料MB-D。所得之熔融聚合MB-D之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-D] During the polymerization of PET-1 in the preceding paragraph, silica (silica dioxide) with an average primary particle size of 210nm dispersed in ethylene glycol was added to 2.0% by weight relative to the content of PET. -1) to obtain the PET base masterbatch MB-D. The obtained melt polymerization MB-D has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-E之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑265nm的二氧化矽(二氧化矽-2),得到PET基底母料MB-E。所得之熔融聚合MB-E之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-E] During the polymerization of PET-1 in the preceding paragraph, silica (silica dioxide) with an average primary particle size of 265 nm dispersed in ethylene glycol was added at 2.0% by weight relative to the content of PET. -2) to obtain the PET base masterbatch MB-E. The obtained melt polymerization MB-E has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-F之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑320nm的二氧化矽(二氧化矽-3),得到PET基底母料MB-F。所得之熔融聚合MB-F之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-F] During the polymerization of PET-1 in the preceding paragraph, silica (silica dioxide) with an average primary particle diameter of 320nm dispersed in ethylene glycol was added to 2.0% by weight relative to the content of PET. -3) to obtain the PET base masterbatch MB-F. The obtained melt polymerized MB-F has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-G之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑72nm的二氧化矽(二氧化矽-4),得到PET基底母料MB-G。所得之熔融聚合MB-G之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-G] During the polymerization of PET-1 in the preceding paragraph, silica (silica dioxide) dispersed in ethylene glycol with an average primary particle size of 72nm was added at 2.0% by weight relative to the content of PET. -4) to obtain the PET base masterbatch MB-G. The obtained melt polymerized MB-G had a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-H之製造]在前項PET-1之聚合時,以相對於PET之含量為2.0重量%之方式,添加分散於乙二醇之平均1次粒徑370nm的二氧化矽(二氧化矽-5),得到PET基底母料MB-H。所得之熔融聚合MB-H之玻璃轉移溫度為81℃、融點為255℃、固有黏度為0.70。 [Manufacturing of MB-H] During the polymerization of PET-1 in the preceding paragraph, silica (silica dioxide) with an average primary particle size of 370 nm dispersed in ethylene glycol was added at 2.0% by weight relative to the content of PET. -5) to obtain the PET base masterbatch MB-H. The obtained melt polymerized MB-H has a glass transition temperature of 81°C, a melting point of 255°C, and an intrinsic viscosity of 0.70.

[MB-I之製造]將前項PET-1與硬脂酸鈉(結晶核劑-1),依硬脂酸鈉(結晶核劑-1)相對於前項PET-1之含量成為5.0重量%之方式進行雙軸混練擠出,得到PET基底母料MB-I。所得之熔融聚合MB-I之玻璃轉移溫度為83℃、融點為255℃、固有黏度為0.65。 [Manufacturing of MB-I] The content of PET-1 and sodium stearate (crystal nucleating agent-1) in the preceding paragraph is 5.0% by weight based on the content of sodium stearate (crystal nucleating agent-1) relative to the PET-1 in the preceding paragraph The method carries out biaxial kneading and extrusion to obtain the PET base masterbatch MB-I. The obtained melt polymerized MB-I has a glass transition temperature of 83°C, a melting point of 255°C, and an intrinsic viscosity of 0.65.

(實施例1) (Example 1)

將PET-1及母粒MB-A依180℃進行半減壓乾燥2小時後,依粒子含有濃度成為表1記載之P1層及P2層之量的方式進行調配, 供給至各別之擠出機,進行熔融擠出並藉過濾器過濾後,於進料區依積層與P1層/P2層之方式使其合流後,經由T字模使用可外加靜電之澆鑄法捲繞於保持為37℃之冷卻輥上並冷卻固化,得到未延伸薄膜。將此未延伸薄膜導入至相對向之電極與接地輥之間,於裝置中導入氮氣,依E值成為160W.min/m2之條件進行大氣壓輝光放電處理。 After the PET-1 and MB-A masterbatch were dried under semi-reduced pressure at 180°C for 2 hours, they were blended so that the particle concentration would become the amount of the P1 layer and the P2 layer described in Table 1, and then supplied to each extrusion After melt-extrusion and filtering with a filter, in the feed zone, the layers merge with the P1 layer/P2 layer, and then wind it at 37°C through a T-die casting method that can be applied with static electricity. It was placed on a cooling roll and cooled to solidify to obtain an unstretched film. The unstretched film is introduced between the opposite electrode and the grounding roller, and nitrogen is introduced into the device, and the E value becomes 160W. Under the condition of min/m 2 , atmospheric pressure glow discharge treatment is performed.

將處理後之未延伸薄膜藉由逐次雙軸延伸機依表1、2記載之條件,分別朝長邊方向延伸3.6倍、及朝寬度方向延伸4.0倍、合計14.4倍的延伸後,在定長下依240℃進行熱處理。其後,朝寬度方向進行鬆弛處理,獲得厚度4.5μm的雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。為捲取性、捲繞情況、轉印缺點均良好的薄膜。 The unstretched film after the treatment was stretched 3.6 times in the longitudinal direction, 4.0 times in the width direction, and 14.4 times in total by using a sequential biaxial stretching machine under the conditions described in Tables 1 and 2. Heat treatment at 240°C. Thereafter, relaxation treatment was performed in the width direction to obtain a biaxially aligned film with a thickness of 4.5 μm. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4. It is a film with good reelability, winding condition, and transfer defects.

(實施例2~4) (Examples 2~4)

於實施例2~4,除了將所使用之母粒變更如表1記載之粒子含有濃度以外,其餘與實施例1同樣地進行,得到厚4.5μm之雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 In Examples 2 to 4, the same procedure as in Example 1 was carried out except that the used master particles were changed to the particle content concentration described in Table 1 to obtain a biaxially oriented film with a thickness of 4.5 μm. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

實施例2係添加了多量之較實施例1更大徑之平均1次粒徑250nm的粒子,結果藉非接觸光學式粗度測定所測定之高度10nm以上的突起個數增加,故轉印缺點雖較實施例1降低但仍為實用範圍內,且捲取性、捲繞偏差良好的薄膜。 Example 2 added a large amount of particles with a larger diameter and an average primary particle size of 250 nm than that of Example 1. As a result, the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement increased, so the transfer defect Although it is lower than Example 1, it is still in a practical range, and it is a film with good windability and winding deviation.

實施例3、4係使用了較實施例1更小徑之平均1次粒徑15nm及10nm的粒子,結果藉非接觸光學式粗度測定所測定 之高度10nm以上的突起個數減少,捲取性亦較實施例1惡化,或藉AFM所測定之高度1nm以上且未滿10nm的突起個數增加而因捲繞偏差使其捲繞情況較實施例1惡化,但仍為實用範圍內,且為轉印缺點良好的薄膜。 Examples 3 and 4 used particles with an average primary particle size of 15nm and 10nm with a smaller diameter than that of Example 1. The results were measured by non-contact optical roughness measurement The number of protrusions with a height of 10nm or more decreases, and the coilability is worse than that of Example 1, or the number of protrusions with a height of 1nm or more and less than 10nm as measured by AFM increases, and the winding condition is more effective due to the winding deviation Example 1 deteriorated, but it was still in the practical range and was a film with good transfer defects.

(實施例5) (Example 5)

實施例5係除了將大氣壓輝光放電處理如表2般依E值為450W.min/m2之條件進行以外,其餘與實施例1同樣地進行,得到厚4.5μm之雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 In Example 5, except for the atmospheric pressure glow discharge treatment as shown in Table 2, the E value is 450W. Except for the conditions of min/m 2 , the same procedure as in Example 1 was carried out to obtain a biaxially oriented film with a thickness of 4.5 μm. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

實施例5係實施例1之對比,藉AFM所測定之高度1nm以上且未滿10nm的突起個數增加,雖然因捲繞偏差使其捲繞情況惡化,但仍為實用範圍內,且為捲取性、轉印缺點均良好的薄膜。 Example 5 is a comparison of Example 1. The number of protrusions with a height of 1 nm or more and less than 10 nm as measured by AFM has increased. Although the winding condition is deteriorated due to winding deviation, it is still within the practical range and is a roll A film with good pick-up and transfer defects.

(實施例6、7) (Examples 6, 7)

實施例6、7係除了將所使用之母粒變更為表1記載之粒子添加濃度,及將大氣壓輝光放電處理如表2般變更以外,其餘與實施例1同樣地進行,得到厚4.5μm之雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 Examples 6 and 7 were performed in the same manner as in Example 1, except that the used master particles were changed to the particle concentration described in Table 1 and the atmospheric pressure glow discharge treatment was changed as in Table 2 to obtain a thickness of 4.5 μm. Biaxial alignment film. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

實施例6、7係藉AFM所測定之高度1nm以上且未滿10nm的突起個數較實施例1減少。實施例6係藉非接觸光學式粗度測定所測定之高10nm以上之突起個數與實施例1同等,捲取性為實施範圍內但較實施例1惡化。另一方面,實施例7係藉非接觸光學式粗度測定所測定之高10nm以上之突起個數較實施例1增加,故捲取 性與實施例1同等良好,惟轉印缺點雖為實用範圍內但較實施例1惡化。 In Examples 6 and 7, the number of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM was reduced compared to Example 1. In Example 6, the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement was the same as that in Example 1, and the coilability was within the scope of implementation but worse than Example 1. On the other hand, in Example 7, the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement increased compared with that in Example 1, so the winding The performance is as good as Example 1, but the transfer defect is within the practical range but worse than Example 1.

(實施例8、9) (Examples 8, 9)

實施例8、9係除了將所使用之母粒變更為表1記載之粒子添加濃度以外,其餘與實施例1同樣進行,得到厚4.5μm之雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 Examples 8 and 9 were performed in the same manner as in Example 1, except that the used master particles were changed to the particle addition concentration described in Table 1, to obtain a biaxially aligned film with a thickness of 4.5 μm. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

實施例8、9均藉非接觸光學式粗度測定所測定之高度10nm以上之突起個數、及藉AFM所測定之高度1nm以上且未滿10nm的突起個數為較佳範圍,但由於使用粒徑較大之200nm及300nm之粒子,故藉非接觸光學式粗度測定所測定之高度60nm以上的突起個數較實施例1增加。結果,實施例8、9之轉印缺點雖較實施例1惡化但仍為實用範圍內,並為捲取性良好的薄膜。 In both Examples 8 and 9, the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement and the number of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM are preferable ranges, but due to the use For the larger particles of 200 nm and 300 nm, the number of protrusions with a height of 60 nm or more measured by non-contact optical roughness measurement is greater than that of Example 1. As a result, although the transfer disadvantages of Examples 8 and 9 were worse than those of Example 1, they were still in the practical range and were films with good windability.

(實施例10) (Example 10)

除了使用於氮氣中混合了氧氣0.5體積%的氣體作為大氣壓輝光放電處理所使用之氣體種以外,其餘依與實施例3同樣的方法得到雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價如表3、表4所示。 Except for the use of a gas mixed with 0.5% by volume of oxygen in nitrogen as the gas used in the atmospheric pressure glow discharge treatment, the remaining biaxial alignment film was obtained in the same manner as in Example 3. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Table 3 and Table 4.

實施例10由於使用了活性高之電漿激發性氣體,故來自添加粒子之突起的尺寸變大而突起個數A亦較實施例3增大,並為捲取性、轉印缺點良好的薄膜。 Since Example 10 uses a plasma excitable gas with high activity, the size of the protrusions from the added particles becomes larger and the number of protrusions A is also larger than that of Example 3. It is a film with good rollability and transfer defects .

(實施例11) (Example 11)

除了將薄膜厚度設為25μm以外,其餘依與實施例1同樣的方法得到雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價如表3、表4所示。實施例11係與實施例1同等之捲取性、捲繞情況、轉印缺點均良好的薄膜。 Except for setting the film thickness to 25 μm, a biaxial alignment film was obtained in the same manner as in Example 1. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Table 3 and Table 4. Example 11 is a film that is equivalent to Example 1 and has good winding properties, winding conditions, and transfer defects.

對實施例11之薄膜依上述方法實施胚片評價及光阻評價,結果雖然因薄膜厚度增加而霧度較實施例1稍微增加,但如表5、表6所示般均為良好結果,可適合使用作為乾膜光阻支撐體用薄膜或胚片成形之支撐體用薄膜。 The film of Example 11 was evaluated for green sheet and photoresist according to the above methods. Although the haze was slightly increased compared with Example 1 due to the increase in film thickness, the results were good as shown in Table 5 and Table 6. It is suitable for use as a dry film photoresist support film or a green sheet forming support film.

(實施例12) (Example 12)

除了使用3種之擠出機依表1記載之配方擠出各層,依成為P1層/P2層/P3層之異種3層構成的方式進行積層,使薄膜厚度成為25μm以外,其餘依與實施例1同樣的方法得到雙軸配向薄膜。所得雙軸配向薄膜之物性、表面突起形狀、特性評價如表3、表4所示。實施例12係與實施例1同等之捲繞情況、轉印缺點均良好的薄膜;進而,藉由將含有粒子之P3層設於與上述表面相反的最表面,而成為捲取性較實施例1更優越的薄膜。 Except that three types of extruders are used to extrude each layer according to the formula described in Table 1, and the layers are laminated in a different three-layer structure of P1 layer/P2 layer/P3 layer to make the film thickness 25μm, the rest follow the example 1 The same method is used to obtain a biaxial alignment film. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Table 3 and Table 4. Example 12 is a film with the same winding conditions and good transfer defects as those of Example 1. Furthermore, by placing the P3 layer containing particles on the outermost surface opposite to the above-mentioned surface, the winding performance is better than that of the example. 1 Better film.

對實施例12之薄膜依上述方法實施胚片評價及光阻評價,結果由於設置含有粒子之P3層,雖然霧度較實施例11增加而光阻評價降低,但仍為實用範圍內,可適合使用作為乾膜光阻支撐體用薄膜或胚片成形之支撐體用薄膜。 The film of Example 12 was subjected to the evaluation of the green sheet and the photoresist according to the above methods. As a result, the P3 layer containing particles was provided. Although the haze was increased and the photoresist evaluation was lower than that of Example 11, it was still within the practical range and suitable Use as a dry film photoresist support film or a green sheet forming support film.

(比較例1) (Comparative example 1)

除了依與實施例1相同之方法獲得未延伸薄膜後,未進行大氣壓輝光放電處理而導入至逐次雙軸延伸機以外,其餘依與實施例1相同之方法獲得雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 Except that the unstretched film was obtained by the same method as in Example 1, and was introduced into the sequential biaxial stretching machine without atmospheric glow discharge treatment, the other biaxially aligned film was obtained in the same way as in Example 1. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

由於未實施大氣壓輝光放電處理,故藉AFM所測定之高度1nm以上且未滿10nm的突起個數大幅減少,結果為捲取性大幅劣化的薄膜。 Since the atmospheric pressure glow discharge treatment was not performed, the number of protrusions having a height of 1 nm or more and less than 10 nm measured by AFM was greatly reduced, and the result was a film with greatly deteriorated windability.

(比較例2) (Comparative example 2)

除了P1層實質上不含粒子以外,其餘依與實施例1相同之方法獲得雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 Except that the P1 layer is substantially free of particles, the other is the same method as in Example 1 to obtain a biaxially aligned film. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

由於未添加粒子而有效率地於面層部形成突起,藉AFM所測定之高度1nm以上且未滿10nm的突起個數增加,另一方面,藉非接觸光學式粗度測定所測定之高度10nm以上的突起個數則大幅減少,故捲取性降低,結果為捲取性大幅劣化的薄膜。 Since no particles are added, protrusions are efficiently formed on the surface layer. The number of protrusions with a height of 1 nm or more and less than 10 nm as measured by AFM increases. On the other hand, the height as measured by non-contact optical roughness measurement is 10 nm. The number of the above protrusions is greatly reduced, so the windability is reduced, and the result is a film whose windability is greatly deteriorated.

(比較例3) (Comparative example 3)

除了將實施例1所添加之粒子之平均1次粒徑設為如表1記載般之350nm以外,其餘依與實施例1相同之方法獲得雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。 Except that the average primary particle size of the particles added in Example 1 was set to 350 nm as described in Table 1, the rest was the same as in Example 1 to obtain a biaxially aligned film. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4.

由於使用粒徑大之粒子,故藉非接觸光學式粗度測定所測定之高10nm以上的突起個數大幅增加,結果轉印缺點大幅惡化。 Since particles with a large particle size are used, the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement has greatly increased, as a result, the transfer defect has been greatly deteriorated.

(比較例4) (Comparative Example 4)

除了將作為P1層原料之PET-1、與屬於結晶核劑之硬脂酸鈉(結晶核劑-1)如表1記載量進行調配,且未進行大氣壓輝光放電處理而導入至逐次雙軸延伸機以外,其餘依與實施例1相同之方法獲得雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表4、表5。 Except that PET-1, which is the raw material of the P1 layer, and sodium stearate (crystal nucleating agent-1) belonging to the crystallization nucleating agent are blended in the amounts described in Table 1, and the atmospheric pressure glow discharge treatment is not carried out, it is introduced to the sequential biaxial stretching Except for the machine, the remaining biaxial alignment film was obtained by the same method as in Example 1. Table 4 and Table 5 show the physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film.

比較例4由於添加結晶核劑,故藉AFM所測定之高度1nm以上且未滿10nm的突起個數較實施例1大幅減低,捲取性大幅惡化。 In Comparative Example 4, since a crystal nucleating agent was added, the number of protrusions with a height of 1 nm or more and less than 10 nm measured by AFM was significantly reduced compared to Example 1, and the coilability was greatly deteriorated.

(比較例5) (Comparative Example 5)

除了將薄膜厚度設為25μm以外,其餘依與比較例1相同之方法獲得雙軸配向薄膜。將所得雙軸配向薄膜之物性、表面突起形狀、特性評價示於表3、表4。比較例5係與比較例1同等地捲取性大幅劣化之薄膜。對比較例5之薄膜依上述方法實施胚片評價及光阻評價,結果因捲取性劣化而於薄膜表面發生皺紋或損傷,同時薄膜之霧度亦增加。結果,如表5、表6所示般,胚片評價及光阻評價大幅惡化。 Except that the film thickness is set to 25 μm, the biaxial alignment film is obtained in the same manner as in Comparative Example 1. The physical properties, surface protrusion shape, and characteristic evaluation of the obtained biaxially aligned film are shown in Tables 3 and 4. Comparative Example 5 is a film whose windability is greatly deteriorated as in Comparative Example 1. The film of Comparative Example 5 was subjected to green sheet evaluation and photoresist evaluation according to the above methods. As a result, wrinkles or damage occurred on the film surface due to the deterioration of the rollability, and the haze of the film also increased. As a result, as shown in Table 5 and Table 6, the green sheet evaluation and the photoresist evaluation deteriorated significantly.

[表1]

Figure 108141227-A0101-12-0038-4
[Table 1]
Figure 108141227-A0101-12-0038-4

[表2]

Figure 108141227-A0101-12-0039-5
[Table 2]
Figure 108141227-A0101-12-0039-5

[表3]

Figure 108141227-A0101-12-0040-6
[table 3]
Figure 108141227-A0101-12-0040-6

[表4]

Figure 108141227-A0101-12-0041-7
[Table 4]
Figure 108141227-A0101-12-0041-7

[表5]

Figure 108141227-A0101-12-0041-8
[table 5]
Figure 108141227-A0101-12-0041-8

[表6]

Figure 108141227-A0101-12-0042-9
[Table 6]
Figure 108141227-A0101-12-0042-9

(產業上之可利用性) (Industrial availability)

本發明之熱可塑性樹脂薄膜係具有良好的透明性、平滑性、易滑性,進而亦可使製膜.加工步驟中之耐損傷性提升,故可適合使用作為於單面積層感光樹脂組成物而使用的乾膜光阻支撐體用聚酯薄膜或光學裝置基材薄膜、陶瓷電容器用離型薄膜、磁性記錄媒體用薄膜。 The thermoplastic resin film of the present invention has good transparency, smoothness, and slipperiness, and can also be used for film formation. The damage resistance in the processing step is improved, so it can be suitably used as a polyester film for a dry film photoresist support used as a single-area layer photosensitive resin composition or an optical device substrate film, a release film for a ceramic capacitor, and a magnetic Film for recording media.

Claims (7)

一種雙軸配向熱可塑性樹脂薄膜,係至少單面之表面滿足下述(1)、(2); A biaxially oriented thermoplastic resin film, the surface of at least one side meets the following (1) and (2); (1)在將藉非接觸光學式粗度測定所測定之高度10nm以上的突起個數設為A(個/mm2)時,A為2.0×103以上且2.5×104以下; (1) When the number of protrusions with a height of 10 nm or more measured by non-contact optical roughness measurement is A (pieces/mm 2 ), A is 2.0×10 3 or more and 2.5×10 4 or less; (2)藉原子力顯微鏡(AFM:Atomic Force Microscope)測定所測定之高度1nm以上且未滿10nm之突起個數設為B(個/mm2)時,B為1.8×106以上且1.0×107以下。 (2) When the number of protrusions with a height of 1 nm or more and less than 10 nm measured by an atomic force microscope (AFM: Atomic Force Microscope) is set to B (pieces/mm 2 ), B is 1.8×10 6 or more and 1.0×10 7 or less. 如請求項1之雙軸配向熱可塑性樹脂薄膜,其中,構成上述滿足(1)、(2)之表面的層係含有平均粒徑10nm以上且300nm以下的粒子。 The biaxially oriented thermoplastic resin film according to claim 1, wherein the layer constituting the surface satisfying (1) and (2) contains particles having an average particle diameter of 10 nm or more and 300 nm or less. 如請求項1或2之雙軸配向熱可塑性樹脂薄膜,其中, Such as the biaxially oriented thermoplastic resin film of claim 1 or 2, in which, 上述滿足(1)、(2)之表面係在將藉非接觸光學式粗度測定所測定之高度60nm以上的突起個數設為C(個/mm2)時,C為90以下。 The surface satisfying (1) and (2) is defined as C (pieces/mm 2 ) when the number of protrusions with a height of 60 nm or more measured by non-contact optical roughness measurement is 90 or less. 如請求項1至3中任一項之雙軸配向熱可塑性樹脂薄膜,其中,其係使用為離型用薄膜。 The biaxially oriented thermoplastic resin film according to any one of claims 1 to 3, wherein it is used as a release film. 如請求項1至3中任一項之雙軸配向熱可塑性樹脂薄膜,其係使用為乾膜光阻支撐體用薄膜。 The biaxially oriented thermoplastic resin film of any one of claims 1 to 3 is used as a dry film photoresist support film. 如請求項1至3中任一項之雙軸配向熱可塑性樹脂薄膜,其係在製造積層陶瓷電容器的步驟中使用為胚片成形之支撐體用薄膜。 The biaxially aligned thermoplastic resin film according to any one of claims 1 to 3, which is used as a support film formed as a green sheet in the step of manufacturing a multilayer ceramic capacitor. 如請求項1至3中任一項之雙軸配向熱可塑性樹脂薄膜,其係使用於塗佈型數位記錄方式之磁性記錄媒體用底膜。 Such as the biaxially oriented thermoplastic resin film of any one of claims 1 to 3, which is a base film for magnetic recording media used in a coating type digital recording method.
TW108141227A 2018-11-19 2019-11-13 Biaxially oriented thermoplastic resin film TWI840441B (en)

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