TW202018844A - Apparatus and method for monitoring chamber - Google Patents

Abstract

The present invention relates to a vacuum chamber monitoring device and method. Disclosed is a technical idea related to a chamber monitoring device and method, the chamber monitoring device comprising: at least one process chamber having a plurality of halogen lamps provided therein; a vacuum pump for supplying a vacuum to the process chamber; at least one valve for opening and closing a vacuum line connected to the process chamber and the vacuum pump; a gas detection unit connected to the vacuum line and having at least two gas analyzers disposed therein; and a control unit.

Description

Chamber monitoring device and method

The present invention relates to a vacuum chamber monitoring apparatus and method, and more specifically, to a chamber monitoring apparatus and method that senses gas released from a chamber that dries semiconductor equipment or components.

When a vacuum drying operation is performed to dry materials such as semiconductor elements, a vacuum pump is used to maintain a vacuum state in the chamber where the vacuum drying operation is performed. At this time, the vacuum line connects the vacuum pump and the vacuum chamber.

When the heat source for vacuum drying generates impurity gas, it acts as a bad element of the work in the chamber. In addition, even if there is impurity gas in the vacuum line connected to the vacuum chamber, it may become a bad element of the work, and there is a problem of flowing backward into the chamber.

According to the prior art of a wafer drying device, a wafer drying device and a coil as a heating device are disclosed. The wafer drying device includes a chamber and a guide chuck that is provided in the chamber and fixes the wafer, and is characterized by including: A device mounted on the upper part of the chamber and spraying isopropyl alcohol supplied from the outside; a heating device mounted on the outer peripheral surface of the chamber so that the inside of the chamber maintains a predetermined temperature; a mounted on the bottom surface of the chamber The device that discharges the isopropyl alcohol sprayed inside to the outside; a device that is attached to one side of the isopropyl alcohol discharge device and provides a vacuum to the chamber.

However, if a metal such as a coil is used, the heat source itself releases gas, which may contaminate the work in the vacuum chamber. In addition, there is a problem that the gas released from the heat source cannot be controlled.

Technical problems solved

The present invention was developed to solve the above problems, and the object is to provide a chamber monitoring device and method for real-time sensing of the gas generated in the vacuum chamber.

The technical problems of the present invention are not limited to those mentioned above, and other technical problems that are not mentioned are clearly understood by practitioners from the following description.

Technical solutions

An embodiment of the present invention provides a chamber monitoring device, including: more than one process chamber equipped with a plurality of halogen lamps inside; a vacuum pump used to supply vacuum to the process chamber; more than one valve, It is used to open and close the vacuum line connected to the process chamber and the vacuum pump; the gas sensing part, which is connected to the vacuum line, is equipped with more than two gas analyzers; and the control part; the two or more gas analyzers are mutually Different types.

In an embodiment of the present invention, the two or more gas analyzers can be respectively emitted in a photoluminescence analyzer (SP-OES), quadrupole mass spectrometer (QMS), non-dispersive infrared sensor (NDIR), inductively coupled plasma emission Choose from optical (ICP-OE) analyzer, infrared absorption spectrometer and Fourier transform infrared (FTIR) analyzer.

In one embodiment of the present invention, the two or more gas analyzers may be a photoluminescence analyzer (SP-OES) and a quadrupole mass spectrometer (QMS).

In an embodiment of the present invention, the control unit may compare the peak value of the component analyzed by the photoluminescence analyzer (SP-OES) with the mass value of the component analyzed by the quadrupole mass spectrometer (QMS), and analyze the The type and amount of gas released by the sample.

In an embodiment of the present invention, the two or more gas analyzers may be respectively configured to branch a plurality of vacuum lines from the vacuum line between the process chamber and the vacuum pump, so that the vacuum degree of the gas analyzer can be controlled .

In one embodiment of the present invention, the process chamber may be a chamber for drying by applying heat to the work.

In one embodiment of the present invention, the process chamber may include: a tray that can load work items inside; and a plurality of thermocouples (thermocouples) that sense the temperature of the chamber.

In an embodiment of the present invention, a part of the thermocouple may be configured to be able to adjust the position.

In one embodiment of the present invention, the halogen lamp can be arranged at predetermined intervals along the inner wall of the chamber, so that the heat generated by the lamp can be evenly transferred to the surface of the work object, and the halogen lamp can be provided with quartz (Qiarts )cover.

In an embodiment of the present invention, the process chamber may be equipped with a fixing wall capable of fixing one end of the halogen lamp on the door side of the chamber body so that the halogen lamp does not contact the product being loaded.

In one embodiment of the present invention, the control unit may include: a display unit that displays information in real time; and an alarm generation unit that notifies a warning sound when abnormal information occurs based on pre-set information.

In one embodiment of the present invention, the control section may further include: a chamber adjustment section that adjusts the vacuum and temperature of the chamber; and an analyzer adjustment section that confirms whether the two or more gas analyzers are abnormal, each independently Adjust whether to run.

In one embodiment of the present invention, the one or more valves may include: a first valve, which is arranged in a vacuum line adjacent to the process chamber; and a second valve, which is arranged in a quadrupole mass spectrometer and a photoluminescence analyzer, respectively The adjacent vacuum line; and the third valve, which is arranged on the vacuum line adjacent to the vacuum pump; the control unit can independently adjust the valve.

In one embodiment of the present invention, the one or more process chambers may be two chambers with different sizes and shapes, and the two chambers can adjust vacuum and heat independently at the same time or separately.

An embodiment of the present invention may provide a chamber monitoring method, which is characterized by adjusting the vacuum and temperature of a process chamber equipped with a plurality of halogen lamps inside, and a gas sensing part equipped with more than two gas analyzers to analyze from The components released in the process chamber are notified and controlled by the control unit in real time.

In an embodiment of the present invention, the two or more gas analyzers may be a photoluminescence analyzer (SP-OES) and a quadrupole mass spectrometer (QMS), and the control unit may use a process chamber in the photoluminescence analyzer Based on the peak value of the plasma light image of the component produced by the indoor sample, after monitoring the data about the specific element, after monitoring the data of the mass value of the component detected by the quadrupole mass spectrometer, the data is analyzed and the component released in the chamber is notified in real time .

In one embodiment of the present invention, the gas analyzer may further include a non-dispersive infrared sensor (NDIR), and the control section may further include a step of monitoring the concentration of the component detected by the non-dispersive infrared sensor.

In an embodiment of the present invention, the chamber adjustment section of the control section can control the operation of the process chamber when abnormal information occurs based on preset information, and the analyzer adjustment section can confirm whether the gas analyzer is abnormal or not. To control whether it is running.

Invention effect

The chamber monitoring device and method of the present invention use a halogen lamp as a heat source, thus having the effect that the heat source itself does not release impurity gas into the chamber. In addition, since two or more gas analyzers are used to analyze the gas, there is an advantage that the types of the residual gas in the chamber and the residual gas in the vacuum line can be accurately sensed. In addition, real-time monitoring of gas has the advantage that process control can be efficiently managed.

The effects of the present invention are not limited to the contents mentioned above, and other effects not mentioned are clearly understood by the person having ordinary knowledge in the technical field to which the present invention belongs from the following description.

The chamber monitoring device and method of the present invention can be subjected to various changes, and can have various embodiments. Specific embodiments are schematically illustrated in the drawings and explained in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and should be understood to include all changes, equivalents, and substitutes included in the technical idea and technical scope of the present invention. In this specification, even if the embodiments are different from each other, the same or similar structures are given the same or similar drawings, and the description is replaced by the original description. The expressions in the singular number used in this specification include plural expressions as long as they are not expressly different in terms of literature and science.

Fig. 1 shows various components according to an embodiment of the invention, Fig. 2 shows a vacuum chamber according to an embodiment of the invention, and Fig. 3 shows a photoluminescence analyzer and a quadrupole mass spectrometer according to an embodiment of the invention Figure 4, Figure 4 shows the structure of the control unit of an embodiment of the present invention, Figure 5 is a sequence diagram showing a chamber monitoring method of an embodiment of the present invention.

An embodiment of the present invention provides a chamber monitoring device, including: more than one process chamber 100 equipped with a plurality of halogen lamps 10 inside; a vacuum pump 500 for supplying vacuum to the process chamber 100; one The above valves 412, 414, 416, and 418 are used to open and close the vacuum line 400 connected to the process chamber 100 and the vacuum pump 500; the gas sensing unit 200 includes photoluminescence connected to the vacuum line 400 and arranged Analyzer (SP-0ES) 210 and quadrupole mass spectrometer (QMS) 220; and control unit 300.

In the device and method of an embodiment of the present invention, the two or more gas analyzers may be respectively a photoluminescence analyzer (SP-OES) 210, a quadrupole mass spectrometer (QMS) 220, and a non-dispersive infrared sensor (NDIR) ( (Not shown in the figure), inductively coupled plasma emission light (ICP-0E) analyzer (not shown in the figure), infrared absorption spectrometer (not shown in the figure), Fourier transform infrared (Fourier) transform infrared: FTIR) analyzer (not shown in the figure). Specifically, a photoluminescence analyzer (SP-OES) 210 and a quadrupole mass spectrometer (QMS) 220 may be included. Alternatively, it may include one of a photoluminescence analyzer (SP-OES) 210 and a quadrupole mass spectrometer (QMS) 220, and may include one of the remaining gas analyzers. Alternatively, it may include a photoluminescence analyzer (SP-OES) 210 and a quadrupole mass spectrometer (QMS) 220, and may include one of the remaining gas analyzers. Or it may include three or more different ones in the analyzer.

As shown in FIG. 1, the chamber monitoring device of the present invention may include a process chamber 100, a gas sensing unit 200, a control unit 300, a vacuum line 400, valves 412, 414, 416, 418, and a vacuum pump 500.

In one embodiment of the present invention, the process chamber 100 is a chamber for drying by applying heat to the work.

The process chamber maintains a process atmosphere such as a predetermined vacuum pressure and temperature and performs the process. The process chamber has a chamber housing that forms an appearance and supports various equipment used for inspection and the like.

In one embodiment of the present invention, the halogen lamp 10 can be used as a heat source in the process chamber. Halogen lamps emit heat from 300°C to 2000°C, which has the advantage of high operating efficiency. The halogen lamp can appropriately adjust and set the temperature according to the drying temperature required for vacuum drying the work. For example, in order to dry a specific work, it can be adjusted to maintain a temperature of 400 ℃ ~ 500 ℃, with the advantage of rapid heating. In addition, halogen lamps have the advantage that the heat source itself does not generate gas.

In the conventional heat source, a metal coil is used, or the inner wall of the chamber is made of metal. When the temperature in the chamber is increased by heating the metal, the metal itself is vaporized by heating to generate gas. In addition, the gas generated by the work material adheres to the metal as a heat source and is fixed when the chamber is cooled, and when the temperature is raised again for the next drying operation, there is a problem that the gas generated and fixed in the previous process is re-vaporized.

However, if a halogen lamp is used as a heat source, it has the advantage of preventing the heat source itself from generating gas, and has the advantage that the gas generated by the work object does not adhere to the heat source. In addition, there is an advantage that the gas generated in the previous step does not affect the next step. Moreover, the halogen lamp is provided in the form of parts, so if the lamp is damaged or defective during use, it has the advantage of easy replacement, thus greatly improving the maintenance efficiency of the chamber.

Referring to FIG. 2, the halogen lamp 10 may be arranged at predetermined intervals along the inner wall of the chamber, so that the heat generated by the lamp can be evenly transferred to the surface of the work object. Alternatively, in order to transfer heat evenly to the surface of the work object, the shape of the halogen lamp may be made according to the shape of the work object.

In order to prevent damage to the lamp, the halogen lamp 10 may be provided with a quartz (Qiarts) cover for each lamp so as not to hinder heat release.

Referring to FIG. 2, the process chamber may be provided with a fixing wall 30 on the door side of the chamber body to fix one end of the halogen lamp so that the halogen lamp does not contact the product being loaded.

In one embodiment of the present invention, the door of the process chamber may be hingedly combined with the chamber body, or a perspective window may be provided on the door that can confirm the working state.

After the work items for vacuum drying are transferred to the predetermined process chamber, the tray can support and load the work items, including various types such as transfer conveyors and shelves.

Referring to FIG. 2, the process chamber 100 may include a tray 20 capable of loading work items inside. In this process chamber, in order to easily load work items, rails 40 and brackets 50 may be provided on the left and right inner walls. In addition, an exhaust port 420 connected to the vacuum line 400 may be provided.

In an embodiment of the present invention, the one or more process chambers 100 are two chambers with different sizes and shapes, and the two chambers can adjust vacuum and heat simultaneously or independently.

If referring to FIG. 2, the chamber is two chambers of different sizes, and the first chamber 110 as one chamber in the two chambers may be a hexahedron, and the second chamber as the other chamber 120 may be cylindrical. For example, if it is a small-sized work object, you can use a hexahedral chamber, if it is a large-sized work object, you can also use a cylindrical chamber, so it can be based on the size and shape of the work object, The advantage of selecting a suitable chamber shape by heating the temperature is that it can drive two chambers, so it has the advantages of improving work efficiency and saving time.

In one embodiment of the present invention, the process chamber 100 may include a plurality of thermocouples that sense the temperature of the chamber. Some of the thermocouples can be configured to adjust the position.

For example, when a process chamber includes 6 thermocouples, it can be configured to flexibly adjust the position of 2 thermocouples. In order to improve accuracy and efficiency, the distance from the work object can be considered, the position of the thermocouple is configured, and the temperature in the chamber is measured.

If referring to FIG. 5, an embodiment of the present invention provides a chamber monitoring method, which is characterized by adjusting the vacuum and temperature S100 of a process chamber equipped with a plurality of halogen lamps inside, including a photoluminescence analyzer: ( The gas sensing part of SP-OES: Self Plasma Optical Emission Spectroscope) and quadrupole mass spectrometer (QMS: quadrupole mass spectrometer) analyzes the component S200 released in the process chamber, and the control part notifies the analyzed component in real time and controls S300.

If referring to FIG. 1, in one embodiment of the present invention, the photoluminescence analyzer 210 and the quadrupole mass spectrometer 220 may be respectively configured to branch off a plurality of vacuum lines 400 between the process chamber 100 and the vacuum pump 500 Each vacuum line 400 in order to be able to control the vacuum level of the analyzer. Furthermore, even when a non-dispersive infrared sensor (not shown in the figure) is provided, it may be arranged in a vacuum line 400 different from the branch vacuum line so that the vacuum degree can be controlled.

One or more valves 410 for opening and closing the vacuum line 400 connected to the process chamber 100 and the vacuum pump 500 may be provided.

The first valve 412 of the vacuum line adjacent to the process chamber may be arranged and controlled, and the third valve 418 of the vacuum line adjacent to the vacuum pump may be arranged and controlled. The control unit can independently adjust the valve to adjust the vacuum of the process chamber.

In addition, second valves 414 and 416 can be arranged and controlled in the vacuum line adjacent to each gas analyzer. For example, a second valve 414 may be arranged and controlled on the vacuum line adjacent to the photoluminescence analyzer, and a second valve 416 may be arranged and controlled on the vacuum line adjacent to the quadrupole mass spectrometer. At this time, when the pressure in the piping reaches the preset pressure value due to the inability to operate, the second valve that reaches the preset pressure value among the second valves can be controlled to automatically adjust to the off state.

In order to maintain the vacuum and prevent damage to the analyzer and other equipment, it is very important that the control section can independently adjust and control.

In one embodiment of the present invention, the control unit 300 may compare the peak value of the component analyzed by the photoluminescence analyzer 210 with the mass value of the component analyzed by the quadrupole mass spectrometer 220, and analyze the type of gas released by the sample in the process chamber 100 And amount.

More specifically, the control unit 300 may store data about specific elements in the photoluminescence analyzer 210 based on the peak value of the plasma light image of the component generated in the sample in the process chamber, and store the quadrupole mass spectrum After the data of the mass value of the component detected by the instrument 220, the data is analyzed and the component released in the chamber is notified in real time. In addition, when the gas analyzer further includes a non-dispersive infrared sensor, the control section may further include a step of monitoring the concentration of the component detected by the non-dispersive infrared sensor, analyzing data on the type and amount of gas, and notifying the released component in the chamber in real time .

At this time, the number of peaks of the plasma light image may vary from process to process, and there may be a plurality of tens to thousands.

The photoluminescence analyzer can detect data on specific elements constituting the peak of the plasma light image, and for example, can check data on types and amounts.

The quadrupole mass spectrometer can detect the data of the mass value of the detected component.

The control unit may compare the data of the quality value corresponding to the data of the peak value of the light image, and analyze the released components. The data on the analyzed components can be displayed on the display unit of the control unit. If referring to Figure 3, H and 0H are analyzed in the peak of the light image, and if it is detected as 18 in the corresponding quality value, the released component can be analyzed as water (H ₂ O).

The quadrupole mass spectrometer only analyzes the mass value, and the photoluminescence analyzer analyzes each element. Therefore, when only one of the two devices is used for analysis, the type of gas can only be analyzed according to the judgment of the analyst, so the analysis is accurate The degree will decrease. That is, when the analysis is performed by a photoluminescence analyzer, if the detection amount of the H component rises abruptly, there is a problem that it is impossible to know whether it is H ₂ 0 or another component. However, since two kinds of analyzers are used, the respective analysis data of the analyzers correspond to each other and an accurate gas analysis can be realized in real time, which has the advantage that measures can be taken quickly and accurately.

In addition, carbon monoxide (CO), carbon dioxide (CO ₂ ), sulfur dioxide (SO ₂ ), nitric oxide (NO), nitrogen dioxide (NO ₂ ), ammonia gas (NH ₃ ), hydrogen chloride (HC1), hydrogen fluoride (HF) , Methane (CH ₄ ), water vapor (H ₂ O) and other gases have a fixed infrared absorption wavelength, so when applying a non-dispersive infrared sensor, the concentration of a specific gas can be sensed. If a non-dispersive infrared sensor is used, and one of a quadrupole mass spectrometer and a photoluminescence analyzer is used, the accuracy of gas analysis can be improved in real time. Or, if all non-dispersive infrared sensors, quadrupole mass spectrometers, and photoluminescence analyzers are used, the accuracy of gas analysis can be further improved, and it has the advantage that measures can be taken quickly and accurately.

The control unit calculates whether each peak level and each quality value correspond to the preset normal value range. When it does not correspond to the normal range, it is determined that the gas is released into the vacuum chamber. When it corresponds to the normal value, it is determined as The gas is not released into the vacuum chamber.

Referring to FIG. 4, in one embodiment of the present invention, the control unit 300 may include: a display unit 310 that displays information in real time; and an alarm generation unit 320 that notifies a warning when abnormal information occurs based on preset information sound.

If the control unit determines that the gas is being released, it may display a message on the display unit 310 and notify a warning sound. The display unit can display the temperature of the chamber, component analysis data, and information about abnormality indication.

If referring to FIG. 4, in one embodiment of the present invention, the control part 300 may further include: a chamber adjustment part 330, which adjusts the vacuum and temperature of the chamber; and an analyzer adjustment part 340, which confirms the photoluminescence analysis Whether the instrument 210 and the quadrupole mass spectrometer 220 are abnormal, they are independently adjusted for operation.

The chamber adjustment unit of the control unit 300 controls the operation of the process chamber when abnormality information occurs based on information set in advance, and the analyzer adjustment unit confirms whether the gas analyzer is abnormal or not, and controls whether to operate independently. Because more than two analyzers can be independently controlled, when an abnormality occurs in one analyzer, the control enables the operation of the remaining one or more analyzers, which has the advantage of enabling continuous analysis.

The scope of rights of the present invention is determined by the matters contained in the scope of patent application. The brackets used in the scope of patent application are not described for selective limitation, but are used to make the constituent elements clearer. The description in parentheses should also be interpreted as necessary Constituent elements.

10: halogen lamp 20: tray 30: fixed wall 100: process chamber 110: first chamber 120: second chamber 200: Gas sensing part 210: Photoluminescence analyzer 220: quadrupole mass spectrometer 300: control department 310: Display unit 320: Alarm generation unit 330: chamber adjustment section 340: analyzer adjustment section 400: Vacuum lines 412, 414, 416, 418: valves 500: vacuum pump

Figure 1 shows the components according to an embodiment of the present invention. Figure 2 shows a vacuum chamber according to an embodiment of the invention. Figure 3 shows data of a photoluminescence analyzer and quadrupole mass spectrometer according to an embodiment of the present invention. Fig. 4 shows the configuration of the control unit according to an embodiment of the present invention. Figure 5 shows a sequence diagram of a chamber monitoring method according to an embodiment of the invention.

no.

10: Halogen lamp

20: tray

30: fixed wall

100: process chamber

110: the first chamber

120: Second chamber

200: Gas Sensing Department

210: Photoluminescence analyzer

220: quadrupole mass spectrometer

300: Control Department

310: Display

320: Alarm occurrence department

330: Chamber adjustment section

340: Analyzer adjustment section

400: vacuum line

412, 414, 416, 418: Valve

500: vacuum pump

Claims (19)

A chamber monitoring device, including: More than one process chamber, which is equipped with multiple halogen lamps inside; A vacuum pump for supplying vacuum to the process chamber; One or more valves for opening and closing the vacuum line connected to the process chamber and the vacuum pump; A gas sensing part connected to the vacuum line and equipped with more than two gas analyzers; and A control department; The two or more gas analyzers are of different types. The chamber monitoring device as described in item 1 of the patent application scope, wherein the two or more gas analyzers are respectively a photoluminescence analyzer (SP-OES), a quadrupole mass spectrometer (QMS), and a non-dispersive infrared sensor (NDIR ), inductively coupled plasma emission light (ICP-OE) analyzer, infrared absorption spectrometer (infrared absorption spectrometer) and Fourier transform infrared (Fourier transform infrared, FTIR) analyzer. The chamber monitoring device as described in item 1 of the patent application scope, wherein the two or more gas analyzers are a photoluminescence analyzer (SP-OES) and a quadrupole mass spectrometer (QMS). The chamber monitoring device according to item 3 of the patent application scope, wherein the control section compares the peak value of the component analyzed by the photoluminescence analyzer with the mass value of the component analyzed by the quadrupole mass spectrometer, and analyzes the The type and amount of gas released by the sample. The chamber monitoring device according to item 1 of the patent application scope, wherein the two or more gas analyzers are respectively configured to branch a plurality of vacuum lines from the vacuum line between the process chamber and the vacuum pump so as to be able to Control the vacuum of the gas analyzer. The chamber monitoring device according to item 1 of the patent application scope, wherein the process chamber is a chamber for drying by applying heat to the work. The chamber monitoring device as described in item 1 of the patent application scope, wherein the process chamber includes: A pallet capable of loading work items inside; and A plurality of thermocouples (thermocouples), which sense the temperature of the process chamber. The chamber monitoring device according to item 7 of the patent application scope, wherein a part of the thermocouple is configured to be able to adjust the position. The chamber monitoring device according to item 1 of the patent application scope, wherein the chamber body on the door side of the process chamber is provided with a fixing wall that enables one end of the halogen lamp to be fixed, so that the halogen lamp is loaded with Products are not in contact. The chamber monitoring device according to item 1 of the patent application scope, wherein the halogen lamp is arranged at predetermined intervals along the inner wall of the chamber so that the heat generated by the lamp can be evenly transferred to the surface of the work object, the halogen The lamps are equipped with a quartz (Qiarts) cover. The chamber monitoring device according to item 1 of the patent application scope, wherein the control unit includes: A display section, which displays information in real time; and An alarm generating part, which informs the warning sound when abnormal information occurs based on the preset information. The chamber monitoring device according to item 11 of the patent application scope, wherein the control section further includes: A chamber adjustment part, which adjusts the vacuum and temperature of the process chamber; An analyzer adjustment section, which confirms whether two or more gas analyzers are abnormal, and independently adjusts whether to operate. The chamber monitoring device as described in item 1 of the patent application scope, wherein the one or more valves include: A first valve, which is arranged in a vacuum line adjacent to the process chamber; A second valve arranged in a vacuum line adjacent to more than two gas analyzers; and A third valve, which is arranged in the vacuum line adjacent to the vacuum pump; The control section independently adjusts the first valve, the second valve, and the third valve. The chamber monitoring device as described in item 1 of the patent application range, wherein the one or more process chambers are two chambers with different sizes and shapes, and the two chambers can simultaneously or independently adjust vacuum and heating. A chamber monitoring method, including: Adjust the vacuum and temperature of a process chamber equipped with multiple halogen lamps inside; A gas sensing unit equipped with more than two gas analyzers analyzes the components released from the process chamber; and A control unit informs and controls the analyzed components in real time. The chamber monitoring method as described in item 15 of the patent application scope, wherein the two or more gas analyzers are respectively in the photoluminescence analyzer (SP-OES), quadrupole mass spectrometer (QMS), non-dispersive infrared sensor (NDIR ), inductively coupled plasma emission light (ICP-OE) analyzer, infrared absorption spectrometer (infrared absorption spectrometer) and Fourier transform infrared (Fourier transform infrared: FTIR) analyzer select different gas analyzers from each other. The chamber monitoring method as described in item 15 of the patent application scope, wherein, The two or more gas analyzers are photoluminescence analyzer (SP-OES) and quadrupole mass spectrometer (QMS), The control department, The photoluminescence analyzer monitors the data about specific elements based on the peak value of the plasma light image of the components generated by the sample in the process chamber, After monitoring the data of the mass value of the components detected by the quadrupole mass spectrometer, Analyze the data and inform the components released in the process chamber in real time. The chamber monitoring method as described in item 17 of the patent application range, wherein the gas analyzer further includes a non-dispersive infrared sensor (NDIR), and the control section further includes a step of monitoring the concentration of the component detected by the non-dispersive infrared sensor. The chamber monitoring method as described in item 15 of the patent application scope, wherein, A chamber adjustment unit of the control unit controls the operation of the process chamber when abnormal information occurs based on information set in advance, An analyzer adjusting section confirms whether the gas analyzer is abnormal or not, and controls whether to operate independently.

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