TW202010726A - Semiconductor device - Google Patents
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- TW202010726A TW202010726A TW108121450A TW108121450A TW202010726A TW 202010726 A TW202010726 A TW 202010726A TW 108121450 A TW108121450 A TW 108121450A TW 108121450 A TW108121450 A TW 108121450A TW 202010726 A TW202010726 A TW 202010726A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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- H—ELECTRICITY
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- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
Abstract
Description
本發明係關於一種半導體裝置。The present invention relates to a semiconductor device.
於將功率裝置模組化之情形時，作為用於功率裝置間之連接之基板，使用帶有成為晶片座之金屬配線（以下表示為晶片座）之絕緣基板即DBC（Direct Bonded Copper，直接覆銅）基板、或AMC（Active Metal Brazed Copper，活性金屬焊銅）基板（專利文獻1）。關於下一代功率裝置，預估會小型化，功率密度提高，使用溫度範圍自以往之Max175℃變為Max250℃。來自功率裝置之散熱變得重要。 [先前技術文獻] [專利文獻]In the case of modularization of power devices, as a substrate for connection between power devices, an insulating substrate with a metal wiring (hereinafter referred to as a chip holder) that becomes a wafer holder, DBC (Direct Bonded Copper, directly covered Copper) substrate, or AMC (Active Metal Brazed Copper) substrate (Patent Document 1). Regarding the next-generation power devices, it is estimated that the miniaturization and power density will be improved, and the operating temperature range will be changed from Max175°C to Max250°C. Heat dissipation from power devices becomes important. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開平10－152384號公報[Patent Document 1] Japanese Patent Laid-Open No. 10-152384
[發明所欲解決之課題][Problems to be solved by the invention]
根據本發明人之見解，於如上述之構成之陶瓷基板、成為晶片座之金屬配線、及晶片之結構體中，為了進一步提高散熱特性，有增加成為晶片座之金屬配線所使用的金屬板（例如銅板）之厚度的手段。然而，已知於僅增加晶片座之厚度的情形時，因製作DBC基板或AMC基板時熱特性（例如熱膨脹係數）之差異，而容易發生陶瓷基板裂開、或晶片座自陶瓷基板剝離等不良情形。According to the findings of the present inventors, in the ceramic substrate configured as described above, the metal wiring that becomes the wafer holder, and the structure of the wafer, in order to further improve the heat dissipation characteristics, there are increased metal plates used for the metal wiring that becomes the wafer holder ( Such as the thickness of copper plate). However, it is known that when only the thickness of the wafer holder is increased, defects such as cracking of the ceramic substrate or peeling of the wafer holder from the ceramic substrate are likely to occur due to the difference in thermal characteristics (such as coefficient of thermal expansion) when manufacturing the DBC substrate or the AMC substrate situation.
因此，本發明之目的在於提供一種半導體裝置，其使用接合於陶瓷基板之金屬板即以往使用之程度之厚度的金屬板作為晶片座，且提高散熱特性。 [解決課題之技術手段]Therefore, an object of the present invention is to provide a semiconductor device that uses a metal plate that is bonded to a ceramic substrate, that is, a metal plate of a thickness that is conventionally used as a wafer holder, and improves heat dissipation characteristics. [Technical means to solve the problem]
本發明人經迄今潛心研究後，結果發現將用於接著晶片與晶片座之燒結型晶片黏著材料特意地塗佈至超出被晶片覆蓋之區域的較廣區域，同時特意地增大其厚度，藉此可提高來自晶片之散熱特性，從而達成本發明。After intensive research so far, the inventors found that the sintered wafer adhesive material used for bonding the wafer and the wafer holder was intentionally applied to a wider area beyond the area covered by the wafer, and the thickness was intentionally increased by This can improve the heat dissipation characteristics from the chip, thereby achieving cost invention.
因此，本發明包含以下之（1）之內容。 （1） 一種半導體裝置，包含接合於陶瓷基板上之晶片座、及接著於晶片座上之晶片， 晶片藉由金屬粉末漿料之燒結體接著於晶片座上， 金屬粉末漿料之燒結體係塗佈於晶片座表面上之金屬粉末漿料的燒結體， 金屬粉末漿料之燒結體係於晶片座之表面上被覆載置有晶片之區域及未載置晶片之區域的燒結體， 金屬粉末漿料之燒結體的厚度處於50～200 μm之範圍。 [發明之效果]Therefore, the present invention includes the following (1). (1) A semiconductor device includes a wafer holder bonded to a ceramic substrate, and a wafer attached to the wafer holder, The wafer is adhered to the wafer base by a sintered body of metal powder paste, The sintering system of metal powder paste is applied to the sintered body of metal powder paste on the surface of the wafer seat, The sintering system of the metal powder paste covers the surface of the wafer holder with the sintered body in the area where the wafer is placed and the area where the wafer is not placed, The thickness of the sintered body of the metal powder paste is in the range of 50 to 200 μm. [Effect of invention]
若根據本發明，可使用以往使用之程度之厚度的銅板作為晶片座，且提高半導體裝置之散熱特性，由於未伴隨有較大構成之變更，故而就生產性之方面而言不會變得不利。According to the present invention, a copper plate with a thickness of the conventionally used thickness can be used as a wafer holder, and the heat dissipation characteristics of the semiconductor device are improved, and there is no accompanying change in a large configuration, so it does not become disadvantageous in terms of productivity .
以下列舉實施態樣詳細地說明本發明。本發明並不限定於以下所列舉之具體實施態樣。
[半導體裝置之製造]
本發明之半導體裝置可藉由如下製造方法而製造，該製造方法包含將金屬粉末漿料塗佈於DBC（Direct Bonding Copper，直接覆銅）基板、或AMC（Active Metal Copper，活性金屬銅）基板（以下設為絕緣性基板4）之晶片座3，將晶片1載置於其上後進行燒結之步驟，將金屬粉末漿料塗佈於晶片座3之表面上載置有晶片1之區域及未載置晶片1之區域。The present invention will be described in detail below with examples of embodiments. The invention is not limited to the specific embodiments listed below.
[Manufacture of semiconductor devices]
The semiconductor device of the present invention can be manufactured by a manufacturing method including coating a metal powder slurry on a DBC (Direct Bonding Copper) substrate or an AMC (Active Metal Copper) substrate The wafer holder 3 (hereinafter referred to as an insulating substrate 4) is a step of sintering after placing the
以此方式所獲得之半導體裝置，具有藉由金屬粉末漿料之燒結體2接著晶片1及晶片座3之黏晶體，金屬粉末漿料之燒結體2係塗佈於晶片座3之表面上之金屬粉末漿料的燒結體2，金屬粉末漿料之燒結體2成為於晶片座3之表面上被覆載置有晶片1之區域及未載置晶片1之區域的燒結體2。The semiconductor device obtained in this way has a sintered body 2 of metal powder paste followed by sticky crystals of the
[晶片] 晶片（半導體晶片）接著並固定於晶片座。進而，對於經固定之晶片（半導體晶片）之各電極與內部引線藉由接合線等進行連接，並藉由矽酮凝膠或塑模樹脂進行包埋，從而製成半導體裝置。作為晶片，可使用利用公知材質所製造之晶片（半導體晶片），作為材質，例如可使用：Si（矽）、SiC（碳化矽）、GaN（氮化鎵）、Ga2 O3 （氧化鎵）。[Wafer] The wafer (semiconductor wafer) is then fixed to the wafer holder. Furthermore, each electrode of the fixed wafer (semiconductor wafer) and internal leads are connected by bonding wires or the like, and are embedded by silicone gel or molding resin to complete a semiconductor device. As the wafer, a wafer (semiconductor wafer) manufactured using a known material can be used. As the material, for example, Si (silicon), SiC (silicon carbide), GaN (gallium nitride), and Ga 2 O 3 (gallium oxide) can be used. .
[晶片座] 晶片座之材質例如可使用：Cu（銅）、Al（鋁）、CuW（銅鎢）、CuMo（銅鉬）。[Wafer holder] For example, the material of the wafer holder can be Cu (copper), Al (aluminum), CuW (copper tungsten), and CuMo (copper molybdenum).
[黏晶體] 晶片與晶片座經接著而形成黏晶體。該黏晶體之晶片部分與引線框架電連接，被塑模樹脂或矽酮凝膠包埋，而成為耐熱性（散熱性）優異之半導體裝置。該黏晶體具備於晶片座之表面上被覆載置有晶片之區域及未載置晶片之區域的燒結體，可實現導熱性優異之特性，本發明亦關於一種黏晶體及其製造方法。[Sticky crystal] The wafer and the wafer holder are then bonded to form a sticky crystal. The wafer part of the adhesive crystal is electrically connected to the lead frame and is embedded in the molding resin or silicone gel, thereby becoming a semiconductor device with excellent heat resistance (heat dissipation). The sticky crystal is provided with a sintered body covering the area where the wafer is mounted and the area where the wafer is not mounted on the surface of the wafer holder, and can realize the characteristics of excellent thermal conductivity. The present invention also relates to a sticky crystal and a manufacturing method thereof.
[晶片與晶片座之接著] 晶片與晶片座係藉由在塗佈於晶片座表面上之金屬粉末漿料上載置晶片後進行燒結而接著。該接著部分成為金屬粉末漿料之燒結體，藉由該燒結體之形成而進行接著。該接著係以具備於晶片座之表面上被覆載置有晶片之區域與未載置晶片之區域的燒結體之方式進行，可實現導熱性優異之特性。[Continuation of wafer and wafer holder] The wafer and the wafer holder are sintered by placing the wafer on the metal powder paste coated on the surface of the wafer holder and then sintering. The adhering portion becomes a sintered body of metal powder paste, and adhering is performed by forming the sintered body. This is carried out in such a manner as to include a sintered body on the surface of the wafer holder covered with a region where the wafer is placed and a region where the wafer is not placed, and it is possible to realize the characteristics of excellent thermal conductivity.
[金屬粉末漿料] 作為金屬粉末漿料，若為可於不損害半導體裝置之特性之程度的低溫進行燒結者，則無特別限制，可使用公知之金屬粉末漿料。例如可使用含有金屬粉末、溶劑、黏合劑樹脂、及想要之添加劑的金屬粉末漿料。於較佳之實施態樣中，溶劑、黏合劑樹脂、添加劑使用可藉由燒結而去除之化合物。於較佳之實施態樣中，作為金屬粉末，例如可使用平均粒徑為10 nm～500 nm範圍之尺寸、奈米尺寸、次微米尺寸、將該等尺寸之粉末與扁平之金屬粉末進行組合而得之金屬粉末。金屬粉末之形狀無特別限制，例如可使用球狀、旋轉橢球體狀、或該等變為扁平之形狀的金屬粉末，亦可為混合有該等形狀之金屬粉末的金屬粉末。作為金屬粉末之金屬，例如可使用選自Ag、Cu、Ag－Cu之合金之金屬。或者，可將金屬粉末設為經Ag被覆之Cu粉末之形態。於較佳之實施態樣中，可使用Cu粉作為金屬粉。作為溶劑，可使用製作漿料公知之溶劑，作為此種溶劑，例如可列舉：α－萜品醇、丁基卡必醇。作為黏合劑樹脂，可使用製作漿料公知之黏合劑樹脂，只要為於燒結溫度分解者即可，例如可列舉：纖維素系、丙烯酸系、環氧系、酚系等黏合劑樹脂。進而，作為此種黏合劑樹脂，例如可列舉：聚乙烯醇縮丁醛樹脂、乙基纖維素。[Metal powder paste] The metal powder paste is not particularly limited as long as it can be sintered at a low temperature that does not impair the characteristics of the semiconductor device, and a known metal powder paste can be used. For example, a metal powder slurry containing metal powder, solvent, binder resin, and desired additives can be used. In a preferred embodiment, the solvent, the binder resin, and the additive use compounds that can be removed by sintering. In a preferred embodiment, as the metal powder, for example, a size with an average particle diameter in the range of 10 nm to 500 nm, a nanometer size, a submicron size, a powder of these sizes and a flat metal powder can be combined The obtained metal powder. The shape of the metal powder is not particularly limited, and for example, a spherical shape, a spheroid shape, or these flattened metal powders may be used, or a metal powder mixed with metal powders of these shapes. As the metal of the metal powder, for example, a metal selected from Ag, Cu, and Ag-Cu alloys can be used. Alternatively, the metal powder may be in the form of Ag-coated Cu powder. In a preferred embodiment, Cu powder can be used as the metal powder. As the solvent, a known solvent for preparing a slurry can be used. Examples of such a solvent include α-terpineol and butyl carbitol. As the binder resin, a binder resin that is well-known for preparing a slurry can be used as long as it decomposes at a sintering temperature, and examples include cellulose-based, acrylic-based, epoxy-based, and phenol-based binder resins. Furthermore, examples of such binder resins include polyvinyl butyral resin and ethyl cellulose.
[燒結] 金屬粉末漿料之燒結，例如可藉由200～400℃、較佳為200～300℃範圍之溫度，例如針對表面氧化物不穩定之Ag等金屬於大氣環境下進行，而針對表面氧化物穩定之Cu等金屬則於非活性氣體環境下或還原氣體環境下、較佳為還原氣體環境下進行。[sintering] The sintering of the metal powder slurry can be performed at a temperature in the range of 200 to 400°C, preferably 200 to 300°C, for example, a metal such as Ag whose surface oxide is unstable is carried out in an atmospheric environment, and is stable against the surface oxide The metals such as Cu are carried out in an inert gas environment or a reducing gas environment, preferably a reducing gas environment.
[被覆區域比率] 於晶片載置前，於晶片座之表面上塗佈金屬粉末漿料。由於塗佈之金屬粉末漿料會藉由燒結而成為燒結體，故而晶片座表面上塗佈有金屬粉末漿料之區域會藉由燒結而成為由金屬粉末漿料之燒結體所被覆的區域。於本發明中，由金屬粉末漿料之燒結體所被覆的區域於晶片座之表面上包含載置有晶片之區域、及未載置晶片之區域。[Covered area ratio] Before the wafer is placed, the metal powder slurry is coated on the surface of the wafer holder. Since the applied metal powder paste will become a sintered body by sintering, the area coated with the metal powder paste on the wafer holder surface will become the area covered by the sintered body of metal powder paste by sintering. In the present invention, the area covered by the sintered body of the metal powder paste includes the area where the wafer is mounted and the area where the wafer is not mounted on the surface of the wafer holder.
於晶片座之表面上的金屬粉末漿料之燒結體所被覆的區域中，載置有晶片之區域之面積與未載置晶片之區域之面積的比率，例如可設為1.05以上、1.1以上、1.2以上、1.3以上、1.4以上、1.5以上、1.8以上、1.9以上、2.0以上，例如可設為1.05～10.0之範圍、1.5～10.0之範圍、2.0～10.0之範圍。In the area covered by the sintered body of the metal powder paste on the surface of the wafer holder, the ratio of the area of the area where the wafer is mounted to the area of the area where the wafer is not mounted can be, for example, 1.05 or more, 1.1 or more, 1.2 or more, 1.3 or more, 1.4 or more, 1.5 or more, 1.8 or more, 1.9 or more, or 2.0 or more, for example, the range of 1.05 to 10.0, the range of 1.5 to 10.0, and the range of 2.0 to 10.0 can be set.
自晶片座之接合側之單面的表面面積減去所載置之晶片之面積所得之面積相對於自晶片座之表面上的金屬粉末漿料之燒結體所被覆之區域之面積減去所載置之晶片之面積所得之面積的比率，即下式：[晶片座之表面之面積－所載置之晶片之面積]／[晶片座之表面上的金屬粉末漿料之燒結體的被覆區域之面積－所載置之晶片之面積]所表示之比率，例如可設為1.1以上、1.2以上、1.3以上，例如可設為1.1～4.0之範圍、1.5～4.0之範圍、1.0～3.0之範圍。The area obtained by subtracting the area of the mounted wafer from the surface area of one side of the wafer holder on the surface of the wafer holder relative to the area covered by the sintered body of the metal powder paste on the surface of the wafer holder minus the load The ratio of the area obtained by the area of the placed wafer is the following formula: [Area of the surface of the wafer holder-area of the mounted wafer] / [Covered area of the sintered body of the metal powder paste on the surface of the wafer holder The area represented by the area-the area of the mounted wafer can be set to, for example, 1.1 or more, 1.2 or more, or 1.3 or more, for example, 1.1 to 4.0, 1.5 to 4.0, and 1.0 to 3.0.
於較佳之實施態樣中，於金屬粉末漿料之燒結體中，可將在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積相對於載置有晶片之區域之面積的比（「在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積」／「載置有晶片之區域之面積」）的值設為例如2.50以上，可較佳地設為2.50～5.00之範圍。In a preferred embodiment, in the sintered body of metal powder paste, the ratio of the area covered by the sintered body of metal powder paste on the surface of the wafer holder to the area of the area where the wafer is mounted ( The value of "the area covered by the sintered body of the metal powder paste on the surface of the wafer seat"/"the area of the area where the wafer is placed") is set to, for example, 2.50 or more, preferably in the range of 2.50 to 5.00 .
於較佳之實施態樣中，於金屬粉末漿料之燒結體，可將在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積相對於形成有燒結體之側的晶片座之表面之面積的比（「在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積」／「晶片座之面積」）之值設為例如0.40～1.00之範圍。In a preferred embodiment, in the sintered body of the metal powder paste, the area covered by the sintered body of the metal powder paste on the surface of the wafer holder can be relative to the surface of the wafer holder on the side where the sintered body is formed The value of the area ratio ("the area covered by the sintered body of the metal powder paste on the surface of the wafer holder"/"the area of the wafer holder") is set to, for example, a range of 0.40 to 1.00.
本發明人認為，以此方式亦將由金屬粉末漿料之燒結體所被覆之區域設置於晶片座表面上未載置晶片之區域，藉此，於作動時能夠有效率地消除晶片之發熱。The inventor believes that in this way, the area covered by the sintered body of the metal powder paste is also provided in the area where the wafer is not placed on the surface of the wafer seat, thereby effectively eliminating the heat generation of the wafer during operation.
[空隙率] 於較佳之實施態樣中，燒結體為呈現網狀結構者。於本發明中，網狀結構係指燒結金屬粉末所得之結構體成為由熔融之金屬粉末連結而成且於燒結之金屬粉末之間具有空間部的結構，而非成為經燒結之金屬粉末之間無間隙的緻密結構。於該網狀結構，包含例如0.1 μm～數μm左右之多個空隙，其程度表現為空隙率。於本發明中，空隙率係指藉由對將燒結體沿與晶片座垂直之平面切斷所得之剖面進行SEM觀察，表現於視為空隙之黑色區域之面積與填充有經燒結之材料的灰色區域之面積的總和中視為空隙之黑色區域之面積所占之比率的值。於較佳之實施態樣中，空隙率例如可設為0.15～0.5之範圍，較佳為0.2～0.4之範圍，進而較佳為0.25～0.35之範圍。本發明人認為，於設為此種空隙率之情形時，有利於緩和伴隨晶片座部分之厚度因燒結體而變厚所產生的應力。[Void ratio] In a preferred embodiment, the sintered body has a network structure. In the present invention, the network structure refers to a structure obtained by sintering metal powder into a structure formed by connecting molten metal powder and having a space between the sintered metal powder, rather than between sintered metal powder Dense structure without gaps. The mesh structure includes, for example, a plurality of voids of about 0.1 μm to several μm, the degree of which is expressed as a porosity. In the present invention, the porosity refers to the SEM observation of the cross section obtained by cutting the sintered body along a plane perpendicular to the wafer holder, which is expressed in the area of the black area regarded as the void and the gray color filled with the sintered material The value of the ratio of the area of the black area regarded as the void in the total area of the area. In a preferred embodiment, the porosity can be set, for example, in the range of 0.15 to 0.5, preferably in the range of 0.2 to 0.4, and more preferably in the range of 0.25 to 0.35. The inventor believes that when such a porosity is used, it is advantageous to alleviate the stress caused by the thickness of the wafer holder portion being thickened by the sintered body.
[燒結體之厚度] 於較佳之實施態樣中，金屬粉末漿料之燒結體例如可設為50～200 μm範圍、較佳為60～180 μm範圍之厚度。金屬粉末漿料之塗佈厚度係以燒結體成為此種範圍之厚度為標準，可進行適當設定。本案發明之金屬粉末漿料之燒結體的厚度範圍為較以往晶片與晶片座之接合被認為所需之厚度之範圍更大的值。本發明人認為藉此可提高來自晶片之散熱特性。又，如上所述，於較佳之實施態樣中，於本案發明中，亦將由金屬粉末漿料之燒結體所被覆之區域設置於晶片座之表面上未載置晶片之區域，將燒結體形成區域擴展至如此乍看之下預估會無助於接合之範圍，同時使接合體之厚度變厚到乍看之下會認為不利於散熱之程度，藉此，與該等之預估相反，本案發明之晶片座接合體提高來自晶片之散熱特性。[Thickness of sintered body] In a preferred embodiment, the sintered body of the metal powder paste can be set to a thickness in the range of 50 to 200 μm, preferably in the range of 60 to 180 μm. The coating thickness of the metal powder slurry is based on the thickness of the sintered body in such a range, and can be appropriately set. The thickness range of the sintered body of the metal powder paste of the present invention is a larger value than the range of thicknesses that are conventionally required for the bonding of the wafer and the wafer holder. The inventor believes that this can improve the heat dissipation characteristics from the chip. In addition, as described above, in a preferred embodiment, in the present invention, the area covered by the sintered body of the metal powder paste is also provided on the surface of the wafer holder where no wafer is placed, and the sintered body is formed Expansion of the area to such an extent at first glance would not help the extent of the joint, and at the same time, the thickness of the joint body would be thickened to the extent that it would be considered unfavorable for heat dissipation at first glance, thereby, contrary to these estimates, The wafer base assembly of the present invention improves the heat dissipation characteristics from the wafer.
[較佳之實施態樣] 於較佳之實施態樣中，本發明亦關於下述（1）以下之內容。 （1） 一種半導體裝置，包含接合於陶瓷基板上之晶片座、及接著於晶片座上之晶片， 晶片藉由金屬粉末漿料之燒結體接著於晶片座上， 金屬粉末漿料之燒結體係塗佈於晶片座表面上之金屬粉末漿料的燒結體， 金屬粉末漿料之燒結體係於晶片座之表面上被覆載置有晶片之區域及未載置晶片之區域的燒結體， 金屬粉末漿料之燒結體的厚度處於50～200 μm之範圍。 （2） 如（1）記載之半導體裝置，其中，金屬粉末漿料為銅粉末漿料。 （3） 如（1）至（2）中任一項所記載之半導體裝置，其中，於金屬粉末漿料之燒結體中，在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積相對於載置有晶片之區域之面積之比（「在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積」／「載置有晶片之區域之面積」）的值為2.50以上。 （4） 如（1）至（3）中任一項所記載之半導體裝置，其中，「在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積」／「載置有晶片之區域之面積」之值處於2.50～5.00之範圍。 （5） 如（1）至（2）中任一項所記載之半導體裝置，其中，於金屬粉末漿料之燒結體中，在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積相對於形成有燒結體之側的晶片座之表面之面積的比（「在晶片座之表面上金屬粉末漿料之燒結體所被覆之面積」／「晶片座之面積」）之值處於0.40～1.00之範圍。 [實施例][Preferred embodiment] In a preferred embodiment, the present invention also relates to the following (1). (1) A semiconductor device includes a wafer holder bonded to a ceramic substrate, and a wafer attached to the wafer holder, The wafer is adhered to the wafer base by a sintered body of metal powder paste, The sintering system of metal powder paste is applied to the sintered body of metal powder paste on the surface of the wafer seat, The sintering system of the metal powder paste covers the surface of the wafer holder with the sintered body in the area where the wafer is placed and the area where the wafer is not placed, The thickness of the sintered body of the metal powder paste is in the range of 50 to 200 μm. (2) The semiconductor device according to (1), wherein the metal powder paste is a copper powder paste. (3) The semiconductor device according to any one of (1) to (2), wherein in the sintered body of the metal powder paste, the area covered by the sintered body of the metal powder paste on the surface of the wafer seat is The ratio of the area of the area where the wafer is placed ("the area covered by the sintered body of the metal powder paste on the surface of the wafer holder"/"the area of the area where the wafer is placed") is 2.50 or more. (4) The semiconductor device according to any one of (1) to (3), wherein "the area covered by the sintered body of the metal powder paste on the surface of the wafer holder" / "the area of the area where the wafer is mounted" The value is in the range of 2.50 to 5.00. (5) The semiconductor device according to any one of (1) to (2), wherein in the sintered body of the metal powder paste, the area covered by the sintered body of the metal powder paste on the surface of the wafer holder is formed with respect to The ratio of the area of the surface of the wafer holder on the side with the sintered body ("the area covered by the sintered body of metal powder paste on the surface of the wafer holder"/"the area of the wafer holder") is in the range of 0.40 to 1.00 . [Example]
以下列舉實施例，進而詳細地說明本發明。本發明並不限定於以下之實施例。The following examples are given to further explain the present invention in detail. The present invention is not limited to the following embodiments.
[實施例1] 作為Cu漿料，使次微米Cu粉（JX金屬製造）以Cu粉之比率相對於漿料整體成為85 wt%之方式分散於含有丙烯酸樹脂之萜品醇中，從而製備Cu漿料。 使用DBC基板作為絕緣性基板，該DBC基板中，於符合試製之晶片尺寸的尺寸為0.63 mm之AlN陶瓷基板使用150 μm厚之Cu板作為Cu晶片座。晶片座部之尺寸為25 mm×17 mm，陶瓷之大小為33 mm×30 mm。 為了測定晶片溫度，使用模仿半導體晶片（晶片）之帶有溫度測定用電阻器及加熱器用電阻器之虛擬晶片（Si基板、9.25 mm見方、厚度0.2 mm）。[Example 1] As the Cu slurry, sub-micron Cu powder (manufactured by JX Metal) was dispersed in terpineol containing acrylic resin so that the ratio of Cu powder to the entire slurry was 85 wt% to prepare a Cu slurry. A DBC substrate was used as an insulating substrate. In this DBC substrate, a 150 μm-thick Cu plate was used as a Cu wafer base on an AlN ceramic substrate with a size of 0.63 mm that conformed to the size of the prototype wafer. The size of the wafer seat is 25 mm × 17 mm, and the size of the ceramic is 33 mm × 30 mm. In order to measure the wafer temperature, a dummy wafer (Si substrate, 9.25 mm square, thickness 0.2 mm) with a resistor for temperature measurement and a resistor for heater imitating a semiconductor wafer (wafer) is used.
為了接合晶片與晶片座，於晶片座之接合之側的整個面，以成為厚度200 μm之方式塗佈漿料，並將晶片靜置、燒結於其上。 以此方式，獲得接合有晶片與晶片座之黏晶體。 關於所獲得之黏晶體，漿料之燒結體以厚度120 μm存在於晶片與晶片座之間，從而接合晶片與晶片座。 藉由使用Au接合線之打線接合對黏晶體之晶片、與引線框架之內部引線進行接線，從而獲得打線接合體In order to bond the wafer and the wafer holder, the entire surface of the wafer holder on the bonding side was coated with a slurry so as to have a thickness of 200 μm, and the wafer was left to stand and sintered thereon. In this way, a sticky crystal bonded with a wafer and a wafer holder is obtained. Regarding the obtained viscous crystals, the sintered body of the paste exists between the wafer and the wafer holder with a thickness of 120 μm, thereby joining the wafer and the wafer holder. Wire bonding with Au bonding wire is used to wire the bonded crystal wafer and the internal lead of the lead frame to obtain a wire bonding body
經由潤滑脂使所獲得之打線接合體與水冷散熱器接觸，從而進行散熱性試驗。
散熱性試驗係藉由向晶片（虛擬晶片）施加100 W之功率，根據晶片之電阻值計算出成為恆定狀態之溫度而進行。由該散熱性試驗之結果可知，自施加功率開始3分鐘後，晶片溫度於120℃成為恆定狀態。
彙總該結果並示於表1。再者，塗佈有漿料之區域成為藉由燒結而直接由燒結體被覆之區域，燒結前後，區域之面積無變化。The obtained wire bonding body was brought into contact with the water-cooled radiator via grease to conduct a heat dissipation test.
The heat dissipation test is performed by applying 100 W of power to the chip (virtual chip) and calculating the temperature at a constant state from the resistance value of the chip. From the results of this heat dissipation test, it can be seen that the wafer temperature becomes constant at 120°
[表1]
（實施例2） 準備與實施例1相同之材料，除漿料之塗佈面積以外，進行同樣之操作，塗佈漿料，從而獲得接合體。 關於上述漿料之塗佈面積，漿料之塗佈係以於Cu晶片座上僅覆蓋80%之區域的方式塗佈Cu漿料而進行。更具體而言，以Cu漿料之中心與Cu晶片座之中心重疊的方式，且以Cu漿料形狀與Cu晶片座形狀變得相同之方式塗佈Cu漿料。 對虛擬晶片施加相當於100 W之功率，利用晶片之電阻計算出成為恆定狀態之溫度。測定溫度為123℃。(Example 2) The same material as in Example 1 was prepared, and the same operation was performed except for the coating area of the slurry to apply the slurry to obtain a bonded body. Regarding the coating area of the above-mentioned slurry, the application of the slurry is performed by coating the Cu slurry so that only 80% of the area on the Cu wafer holder is covered. More specifically, the Cu paste is applied in such a manner that the center of the Cu paste overlaps the center of the Cu wafer holder, and in such a manner that the shape of the Cu paste and the shape of the Cu wafer holder become the same. Apply a power equivalent to 100 W to the virtual wafer, and use the resistance of the wafer to calculate the temperature in a constant state. The measurement temperature was 123°C.
（實施例3） 準備與實施例1相同之材料，除漿料之塗佈面積以外，進行同樣之操作塗佈漿料，從而獲得接合體。 關於上述漿料之塗佈面積，漿料之塗佈係以於Cu晶片座上僅覆蓋60%之區域的方式塗佈Cu漿料而進行。更具體而言，以Cu漿料之中心與Cu晶片座之中心重疊之方式，且以Cu漿料形狀與Cu晶片座形狀變得相同之方式塗佈Cu漿料。 對虛擬晶片施加相當於100 W之功率，利用晶片之電阻計算出成為恆定狀態之溫度。測定溫度為130℃。(Example 3) The same material as in Example 1 was prepared, and the slurry was applied in the same manner except for the coating area of the slurry to obtain a bonded body. Regarding the coating area of the above-mentioned slurry, the application of the slurry is carried out by coating the Cu slurry so as to cover only 60% of the area on the Cu wafer holder. More specifically, the Cu paste is applied in such a manner that the center of the Cu paste overlaps the center of the Cu wafer holder, and in such a manner that the shape of the Cu paste and the shape of the Cu wafer holder become the same. Apply a power equivalent to 100 W to the virtual wafer, and use the resistance of the wafer to calculate the temperature in a constant state. The measurement temperature was 130°C.
（實施例4） 關於漿料之塗佈，除變更面積及厚度以外，以與實施例1相同方式進行實施例4。(Example 4) Regarding the application of the slurry, Example 4 was carried out in the same manner as Example 1 except that the area and thickness were changed.
（實施例5、6） 關於漿料之塗佈，除變更厚度以外，以與實施例2相同方式進行實施例5、6。(Examples 5 and 6) Regarding the application of the slurry, Examples 5 and 6 were carried out in the same manner as Example 2 except that the thickness was changed.
（比較例1） 準備與實施例1相同之材料，除漿料之塗佈面積以外，進行同樣之操作，塗佈漿料，從而獲得接合體。 關於上述漿料之塗佈面積，漿料之塗佈係以於Cu板上僅覆蓋由晶片所覆蓋之四邊形之區域的方式塗佈Cu漿料而進行。測定溫度為135℃。(Comparative example 1) The same material as in Example 1 was prepared, and the same operation was performed except for the coating area of the slurry to apply the slurry to obtain a bonded body. Regarding the coating area of the above-mentioned slurry, the application of the slurry is performed by applying the Cu slurry so as to cover only the area of the quadrangle covered by the wafer on the Cu plate. The measurement temperature was 135°C.
（比較例2） 準備與實施例1相同之材料，除漿料之塗佈面積以外，進行同樣之操作，塗佈漿料，從而獲得接合體。 關於上述漿料之塗佈面積，漿料之塗佈係以於Cu晶片座上僅覆蓋40%之區域的方式塗佈Cu漿料而進行。 對虛擬晶片施加相當於100 W之功率，利用晶片之電阻計算出成為恆定狀態之溫度。測定溫度為134℃。 [產業上之可利用性](Comparative example 2) The same material as in Example 1 was prepared, and the same operation was performed except for the coating area of the slurry to apply the slurry to obtain a bonded body. Regarding the coating area of the above-mentioned slurry, the application of the slurry is performed by coating the Cu slurry in such a manner that only 40% of the area is covered on the Cu wafer holder. Apply a power equivalent to 100 W to the virtual wafer, and use the resistance of the wafer to calculate the temperature in a constant state. The measurement temperature was 134°C. [Industry availability]
若根據本發明，可獲得散熱特性經提高之半導體裝置。本發明係於產業上有用之發明。According to the present invention, a semiconductor device with improved heat dissipation characteristics can be obtained. The present invention is an industrially useful invention.
1:晶片 2:燒結體 3:晶片座 4:絕緣性基板 5:銅板1: chip 2: sintered body 3: Wafer holder 4: Insulating substrate 5: Copper plate
圖1係表示晶片座體之結構的說明圖。FIG. 1 is an explanatory diagram showing the structure of a wafer holder.
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