TW202000759A - Hard coat film and transparent conductive film for providing both excellent bending resistance and scratch resistance, and excellent flexibility - Google Patents
Hard coat film and transparent conductive film for providing both excellent bending resistance and scratch resistance, and excellent flexibility Download PDFInfo
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- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
- B32B27/325—Layered products comprising a layer of synthetic resin comprising polyolefins comprising polycycloolefins
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- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
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- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/202—Conductive
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- B32B2307/00—Properties of the layers or laminate
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- B32B2307/412—Transparent
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/536—Hardness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/584—Scratch resistance
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
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Abstract
Description
本發明係關於一種硬塗膜及透明導電性膜,詳細而言,係關於一種硬塗膜及具備該硬塗膜之透明導電性膜。The present invention relates to a hard coating film and a transparent conductive film. Specifically, it relates to a hard coating film and a transparent conductive film provided with the hard coating film.
先前已知有於透明樹脂基板之單面具有硬塗層之硬塗膜。Conventionally, a hard coating film having a hard coating layer on one side of a transparent resin substrate has been known.
例如揭示有具備彈性模數為2.1~5.0 GPa之硬塗層之硬塗膜(例如參照日本專利特開2014-25061號公報)。For example, there is disclosed a hard coating film having a hard coating layer having an elastic modulus of 2.1 to 5.0 GPa (for example, refer to Japanese Patent Laid-Open No. 2014-25061).
然而,要求硬塗層具有優異之耐曲撓性,但日本專利特開2014-25061號公報中記載之硬塗膜中,硬塗層之彈性模數較高,為2.1~5.0 GPa,故無法充分地滿足上述之要求。However, the hard coating layer is required to have excellent bending resistance, but the hard coating film described in Japanese Patent Laid-Open No. 2014-25061 has a high elastic modulus of the hard coating layer of 2.1 to 5.0 GPa, so it is impossible Fully meet the above requirements.
另一方面,還要求硬塗膜具有優異之耐擦傷性。On the other hand, the hard coating film is also required to have excellent scratch resistance.
進而,還要求硬塗膜具有優異之耐曲撓性及耐擦傷性,並且柔軟。Furthermore, the hard coating film is also required to have excellent bending resistance and scratch resistance, and be soft.
本發明提供一種兼具優異之耐曲撓性及耐擦傷性以及優異之柔軟性的硬塗膜、及具備該硬塗膜之透明導電性膜。The present invention provides a hard coating film having excellent bending resistance, scratch resistance, and excellent flexibility, and a transparent conductive film provided with the hard coating film.
本發明(1)包含如下一種硬塗膜:其於厚度方向上依序具備透明基材及硬塗層,上述硬塗層包含樹脂基質及粒子,利用奈米壓痕法測定之上述硬塗層之硬度為0.320 GPa以上0.520 GPa以下,上述硬塗層之鉛筆硬度為B以下。The present invention (1) includes a hard coating film that is sequentially provided with a transparent substrate and a hard coating layer in the thickness direction. The hard coating layer includes a resin matrix and particles, and the hard coating layer is measured by a nanoindentation method The hardness is 0.320 GPa or more and 0.520 GPa or less, and the pencil hardness of the hard coat layer is B or less.
本發明(2)包含如(1)中記載之硬塗膜,其中上述硬塗層之厚度為3 μm以下。The present invention (2) includes the hard coating film as described in (1), wherein the thickness of the hard coating layer is 3 μm or less.
本發明(3)包含如(1)或(2)中記載之硬塗膜,其中上述硬塗層之算術平均粗糙度Ra為3 nm以上、14 nm以下。The present invention (3) includes the hard coating film as described in (1) or (2), wherein the arithmetic average roughness Ra of the hard coating layer is 3 nm or more and 14 nm or less.
本發明(4)包含如(1)至(3)中任一項所記載之硬塗膜,其中上述透明基材之材料為環烯烴聚合物。The present invention (4) includes the hard coating film according to any one of (1) to (3), wherein the material of the transparent substrate is a cycloolefin polymer.
本發明(5)包含一種透明導電性膜,其於厚度方向上依序具備如(1)至(4)中任一項所記載之硬塗膜、光學調整層及透明導電層。The present invention (5) includes a transparent conductive film including the hard coating film, the optical adjustment layer, and the transparent conductive layer as described in any one of (1) to (4) in the thickness direction.
本發明之硬塗膜及透明導電性膜由於硬塗層之硬度為0.320 GPa以上、0.520 GPa以下,硬塗層之鉛筆硬度為B以下,故兼具優異之耐曲撓性及耐擦傷性以及優異之柔軟性。The hard coating film and the transparent conductive film of the present invention have excellent hardness and scratch resistance as well as a hardness of 0.320 GPa or more and 0.520 GPa or less, and a pencil hardness of the hard coat layer of B or less. Excellent softness.
參照圖1說明本發明之硬塗膜之一實施形態。One embodiment of the hard coating film of the present invention will be described with reference to FIG.
硬塗膜1具有於厚度方向上互相隔開地對向配置之一面及另一面(2個主面)。硬塗膜1之一面及另一面為互相平行之平面。硬塗膜1具有於與厚度方向正交之面方向上延伸之大致膜狀。The
硬塗膜1例如為下述之透明導電性膜6(參照圖2)所具備之一零件,總之,並非為透明導電性膜6。即,硬塗膜1係用以製作透明導電性膜6之零件,不包含光學調整層4及透明導電層5,單獨作為零件而流通,係能夠於產業上利用之元件。The
硬塗膜1朝厚度方向之一側依序具備透明基材2及硬塗層3。即,硬塗膜1具備透明基材2及配置於透明基材2之厚度方向之一面之硬塗層3。又,較佳為硬塗膜1僅包含透明基材2及硬塗層3。The
透明基材2形成硬塗膜1之另一面。具體而言,透明基材2為確保硬塗膜1之機械強度之支持材料。透明基材2具有於面方向上延伸之膜狀。透明基材2具有於厚度方向上互相隔開地對向配置之一面及另一面。透明基材2之一面及另一面為互相平行之平面。透明基材2之厚度方向之另一面於厚度方向之另一側露出。The
透明基材2之材料只要透明,則並無特別限定。作為透明基材2之材料,例如可列舉樹脂(包含聚合物)。作為樹脂,可列舉:例如聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯樹脂、例如聚甲基丙烯酸酯等(甲基)丙烯酸樹脂(丙烯酸樹脂及/或甲基丙烯酸樹脂)、例如聚乙烯、聚丙烯、環烯烴聚合物(COP)等烯烴樹脂、例如聚碳酸酯樹脂、例如聚醚碸樹脂、例如聚芳酯樹脂、例如三聚氰胺樹脂、例如聚醯胺樹脂、例如聚醯亞胺樹脂、例如纖維素樹脂、例如聚苯乙烯樹脂、例如降𦯉烯樹脂等。該等樹脂可單獨使用或併用2種以上。就確保優異之光學特性(包括透明性)之觀點而言,較佳可列舉烯烴樹脂,更佳可列舉COP。The material of the
COP與聚酯樹脂相比,光學特性(各向同性)優異。另一方面,COP與聚酯樹脂相比,機械強度低(易破裂)。然而,該硬塗膜1由於具備具有所需之硬度及鉛筆硬度之硬塗層3,故即使透明基材2之機械強度低,硬塗膜1亦能夠抑制機械強度較大之降低(破裂之產生)。COP is superior to polyester resin in optical properties (isotropy). On the other hand, COP has lower mechanical strength (easy to break) than polyester resin. However, since the
透明基材2之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。The total light transmittance (JIS K 7375-2008) of the
透明基材2之厚度為一面及另一面之間之長度(於以下各層中都相同),具體而言,例如為2 μm以上,較佳為20 μm以上,且例如為300 μm以下,較佳為200 μm以下。The thickness of the
硬塗層3形成硬塗膜1之一面。具體而言,硬塗層3為既賦予硬塗膜1優異之耐曲撓性,又確保優異之耐擦傷性的硬層。又,硬塗層3亦為賦予硬塗膜1耐黏連性之抗黏連層。硬塗層3具有於面方向上延伸之膜狀。硬塗層3具有於厚度方向上互相隔開地對向配置之一面及另一面。硬塗層3之另一面與透明基材2之一面接觸。硬塗層3之一面例如於硬塗膜1之厚度方向之一側露出,具有微細之凹凸形狀(圖1中未圖示)。The
硬塗層3包含樹脂及粒子。硬塗層3較佳為僅包含樹脂及粒子。具體而言,硬塗層3之材料為包含樹脂及粒子之組合物。The
作為樹脂,只要為透明樹脂,則並無特別限定,例如可列舉:硬化性樹脂、熱塑性樹脂等,較佳可列舉硬化性樹脂,更佳可列舉光硬化性樹脂。作為光硬化性樹脂,例如可列舉丙烯酸樹脂、環氧樹脂、矽酮樹脂等,就確保優異之光學特性及優異之機械強度之觀點而言,較佳可列舉丙烯酸樹脂。該等樹脂可單獨使用或併用2種以上。The resin is not particularly limited as long as it is a transparent resin, and examples thereof include curable resins and thermoplastic resins, preferably curable resins, and more preferably photocurable resins. Examples of the photocurable resins include acrylic resins, epoxy resins, and silicone resins. From the viewpoint of ensuring excellent optical characteristics and excellent mechanical strength, acrylic resins are preferably used. These resins can be used alone or in combination of two or more.
作為粒子之材料,並無特別限定,只要透明則並無特別限定,例如可列舉:有機材料、無機材料。作為有機材料,例如可列舉丙烯酸聚合物、聚苯乙烯等聚合物,較佳可列舉丙烯酸聚合物。作為無機材料,可列舉:例如氧化矽、例如包含氧化鋯、氧化鈦、氧化鋅、氧化錫等之金屬氧化物、例如碳酸鈣等碳酸鹽等。較佳可列舉氧化矽。該等材料可單獨使用或併用2種以上。The material of the particles is not particularly limited, as long as it is transparent, and examples include organic materials and inorganic materials. Examples of organic materials include polymers such as acrylic polymers and polystyrene, and preferably acrylic polymers. Examples of the inorganic material include silicon oxide, metal oxides including zirconia, titanium oxide, zinc oxide, and tin oxide, and carbonates such as calcium carbonate. Preferably, silicon oxide is used. These materials can be used alone or in combination of two or more.
粒子之形狀並無特別限定,例如可列舉:大致球狀、大致針狀、大致板狀、不定形狀等,較佳可列舉大致球狀。The shape of the particles is not particularly limited, and examples thereof include a substantially spherical shape, a substantially needle shape, a substantially plate shape, and an indefinite shape, and preferably a substantially spherical shape.
粒子之最大長度之平均值(若為大致球狀,則為平均粒徑)較佳為較小,更佳為奈米尺寸。具體而言,粒子之最大長度之平均值例如為100 nm以下,較佳為80 nm以下,更佳為60 nm以下,且且例如為1 nm以上,較佳為5 nm以上,更佳為10 nm以上。The average value of the maximum length of the particles (the average particle diameter if it is roughly spherical) is preferably smaller, more preferably the nanometer size. Specifically, the average value of the maximum length of the particles is, for example, 100 nm or less, preferably 80 nm or less, more preferably 60 nm or less, and for example, 1 nm or more, preferably 5 nm or more, more preferably 10 Above nm.
若粒子之最大長度之平均值為上述之上限以下,則能夠容易且確實地將下述之硬塗層3之一面之算術平均粗糙度Ra設定為所需之範圍。If the average value of the maximum length of the particles is equal to or less than the above upper limit, the arithmetic mean roughness Ra of one surface of the
若粒子之最大長度之平均值為上述之下限以上,則能夠賦予硬塗膜1優異之抗黏連性。If the average value of the maximum length of the particles is equal to or higher than the above lower limit, the
再者,自上述之組合物形成硬塗層3,硬塗層3中具備樹脂基質及分散於該樹脂基質中之粒子。Furthermore, the
相對於樹脂100質量份,粒子之質量份數例如為0.1質量份以上,較佳為1質量份以上,且例如為75質量份以下,較佳為55質量份以下。The number of parts by mass of particles is, for example, 0.1 parts by mass or more, preferably 1 part by mass or more, and, for example, 75 parts by mass or less, preferably 55 parts by mass or less relative to 100 parts by mass of the resin.
硬塗層3之硬度為0.320 GPa以上,較佳為0.350 GPa以上,更佳為0.360 GPa以上。若硬塗層3之硬度低於上述之下限,則硬塗膜1無法確保優異之耐擦傷性。The hardness of the
又,硬塗層3之硬度為0.520 GPa以下,較佳為0.500 GPa以下,更佳為0.450 GPa以下,進而較佳為0.400 GPa以下,尤其佳為0.370 GPa以下。若硬塗層3之硬度超過上述之上限,則硬塗膜1無法確保優異之耐曲撓性。The hardness of the
硬塗層3之硬度為利用奈米壓痕法測定之23℃之壓入硬度,具體而言,為23℃下將奈米壓痕儀(壓頭)向硬塗層3按壓獲得之壓入硬度。硬度之測定方法詳細記載於之後之實施例中。The hardness of the
又,硬塗層3之鉛筆硬度為B以下,較佳為2B以下,更佳為3B以下,進而較佳為4B以下,尤其佳為5B以下。再者,硬塗層3之鉛筆硬度例如為10B以上,進而為9B以上。In addition, the pencil hardness of the
於硬塗層3之鉛筆硬度超過上述之上限(B)(超過B)之情形時,無法確保硬塗層3之優異之柔軟性。When the pencil hardness of the
硬塗層3之鉛筆硬度係按照JIS K5600-5-4「劃痕硬度(鉛筆法)」(1999)測定。The pencil hardness of the
硬塗層3之一面之算術平均粗糙度Ra例如為1 nm以上,較佳為3 nm以上,更佳為5 nm以上,且例如為20 nm以下,較佳為14 nm以下,更佳為12 nm以下。The arithmetic average roughness Ra of one surface of the
若硬塗層3之一面之算術平均粗糙度Ra為上述之下限以上,則能夠賦予硬塗膜1優異之抗黏連性。If the arithmetic average roughness Ra of one surface of the
若硬塗層3之一面之算術平均粗糙度Ra為上述之上限以下,則能夠抑制硬塗膜1之霧度之上升,確保優異之透明性。If the arithmetic average roughness Ra of one surface of the
硬塗層3之算術平均粗糙度Ra係按照JIS B 0601(2013)測定。The arithmetic average roughness Ra of the
硬塗層3較佳為較薄。具體而言,硬塗層3之厚度例如未達10 μm,較佳為9 μm以下,更佳為7 μm以下,進而較佳為5 μm以下,尤其佳為3 μm以下,最佳為2 μm以下。若硬塗層3之厚度為上述之上限以下,則能夠確保優異之耐曲撓性。The
又,硬塗層3之厚度例如為0.001 μm以上,較佳為0.01 μm以上,更佳為0.1 μm以上,進而較佳為0.5 μm以上。若硬塗層3之厚度為上述之下限以上,則能夠提昇硬塗層3之耐擦傷性。The thickness of the
硬塗層3之厚度係使用大塚電子公司製造之Intensified Multichannel Photodetector「MCPD2000」(商品名)得以測定。The thickness of the
硬塗膜1之霧度於厚度為101 μm之情形時,例如未達0.5,較佳為0.40以下,更佳為0.30以下,進而較佳為0.20以下,尤其佳為0.15以下,通常為0.01以上。When the thickness of the
若硬塗膜1之霧度低於上述之上限,則硬塗膜1透明性優異。If the haze of the
硬塗膜1之厚度例如為150 μm以下,較佳為125 μm以下,且例如為5 μm以上,較佳為10 μm以上。The thickness of the
為製造該硬塗膜1,例如,首先準備透明基材2,之後,例如藉由濕式方式將組合物配置於透明基材2之厚度方向之一面。To manufacture the
具體而言,首先,製備利用溶劑稀釋組合物後所得之塗佈液(清漆)。可製備(準備)樹脂中預先分散有粒子之混合物(市售品)直接作為塗佈液,或者,亦可使粒子與樹脂混合,將粒子分散於樹脂中製備。再者,視需要可於塗佈液中添加起始劑,或者,亦可使用預先添加有起始劑之樹脂。Specifically, first, a coating liquid (varnish) obtained by diluting the composition with a solvent is prepared. A mixture (commercially available product) in which the particles are dispersed in the resin in advance can be prepared (prepared) as a coating liquid, or the particles can be mixed with the resin and the particles can be dispersed in the resin to prepare. Furthermore, if necessary, an initiator may be added to the coating liquid, or a resin to which an initiator has been added in advance may be used.
繼而,將塗佈液(清漆)塗佈於透明基材2之厚度方向之一面。之後,藉由加熱,去除溶劑,繼而,於組合物包含硬化性樹脂之情形時,使硬化性樹脂硬化。藉此,形成樹脂基質中分散有粒子之硬塗層3。Then, a coating liquid (varnish) is applied to one surface of the
藉此,於透明基材2之厚度方向之一面形成硬塗層3。With this, the
藉此,製造具備透明基材2及硬塗層3之硬塗膜1。By this, the
該硬塗膜1可用於各產業用途,例如用於透明導電性膜、調光膜等光學用途,進而用於電磁屏蔽用途等。較佳為用於光學用途,更佳為用於透明導電性膜。The
其次,參照圖2針對具備硬塗膜1之透明導電性膜6進行說明。Next, the transparent
透明導電性膜6具有於厚度方向上互相隔開地對向配置之一面及另一面(2個主面)。透明導電性膜6之一面及另一面為互相平行之平面。透明導電性膜6具有於面方向上延伸之大致膜狀。透明導電性膜6例如為光學裝置(例如圖像顯示裝置、調光裝置)所具備之觸控面板用基材或調光面板等之一零件,總之並非為光學裝置。即,透明導電性膜6為用以製作光學裝置等之零件,不包含LCD模組等圖像顯示元件或LED等光源,單獨作為零件而流通,為能夠於產業上利用之元件。The transparent
該透明導電性膜6朝厚度方向之一側依序具備硬塗膜1、光學調整層4及透明導電層5。具體而言,透明導電性膜6朝厚度方向之一側依序具備透明基材2、硬塗層3、光學調整層4及透明導電層5。較佳為透明導電性膜6僅包含透明基材2、硬塗層3、光學調整層4及透明導電層5。The transparent
光學調整層4係調整透明導電性膜6之光學物性之層(折射率匹配層),其使得當於之後之步驟中將透明導電層5形成為佈線圖案之後,無法辨識非圖案部分與圖案部分之差異(即,抑制佈線圖案之視認性)。光學調整層4具有於面方向上延伸之膜狀,具有於厚度方向上互相隔開地對向配置之一面及另一面。光學調整層4之材料例如可列舉:上述之樹脂(不含有粒子)、上述之組合物(含有粒子)等。光學調整層4之厚度例如為30 nm以上,較佳為80 nm以上,且例如為150 nm以下,較佳為130 nm以下。The
透明導電層5為用以於之後之步驟中形成為佈線圖案,形成圖案部分之導電層。透明導電層5形成透明導電性膜6之厚度方向之一面。透明導電層5具有於面方向上延伸之膜狀(包括片狀),具有於厚度方向上互相隔開地對向配置之一面及另一面。The transparent conductive layer 5 is a conductive layer for forming a wiring pattern and forming a pattern portion in a subsequent step. The transparent conductive layer 5 forms a surface in the thickness direction of the transparent
作為透明導電層5之材料,例如可列舉:包含選自In、Sn、Zn、Ga、Sb、Ti、Si、Zr、Mg、Al、Au、Ag、Cu、Pd、W所組成之群中之至少1種金屬之金屬氧化物。進而可視需要於金屬氧化物中摻雜上述群中所示之金屬原子。作為材料,較佳可列舉銦錫複合氧化物(ITO)、銻錫複合氧化物(ATO)等。As a material of the transparent conductive layer 5, for example, it may include: selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W Metal oxide of at least one metal. Furthermore, if necessary, the metal oxide is doped with the metal atoms shown in the above group. As the material, preferably, indium-tin composite oxide (ITO), antimony-tin composite oxide (ATO), etc. are mentioned.
透明導電層5之厚度例如為10 nm以上,較佳為20 nm以上,且例如為35 nm以下,較佳為30 nm以下。The thickness of the transparent conductive layer 5 is, for example, 10 nm or more, preferably 20 nm or more, and for example 35 nm or less, preferably 30 nm or less.
透明導電性膜6之厚度例如為150 μm以下,較佳為125 μm以下,且例如為5 μm以上,較佳為10 μm以上。The thickness of the transparent
為製造透明導電性膜6,於上述之硬塗膜1之硬塗層3之厚度方向之一面,根據公知之方法依序配置光學調整層4及透明導電層5。In order to manufacture the transparent
並且,該硬塗膜1及透明導電性膜6中,硬塗層3之硬度為0.320 GPa以上,故能夠確保優異之耐擦傷性。In addition, in the
又,硬塗層3之硬度為0.520 GPa以下,故能夠確保優異之耐曲撓性。In addition, the hardness of the
進而,硬塗層3之鉛筆硬度為B以下,故具有優異之耐曲撓性及耐擦傷性,並且能夠確保柔軟性。Furthermore, the pencil hardness of the
又,若硬塗層3之厚度為3 μm以下,則能夠確保優異之耐曲撓性。In addition, if the thickness of the
又,若硬塗層3之算術平均粗糙度Ra為3 nm以上、14 nm以下,則能夠賦予硬塗膜1優異之抗黏連性,並且能夠確保硬塗膜1之優異之透明性。In addition, if the arithmetic average roughness Ra of the
若透明基材2之材料為COP,則透明基材2光學特性優異,另一方面,雖機械強度變低(變的易破裂),但由於該硬塗膜1具備具有上述之硬度及鉛筆硬度之硬塗層3,故能夠抑制硬塗膜1中之硬塗層3之機械強度較大之降低(破裂之產生)。If the material of the
變化例 於以下之各變化例中,關於與上述之一實施形態相同之構件及步驟,賦予相同之參照符號,省略其詳細之說明。又,各變化例除特別標記以外,能夠發揮與一實施形態相同之作用效果。進而,能夠適當組合一實施形態及變化例。Variations In each of the following modifications, the same reference numerals are given to the same components and steps as in the above-mentioned embodiment, and detailed descriptions thereof are omitted. In addition, each modified example can exert the same effect as the first embodiment except for special marks. Furthermore, an embodiment and a modified example can be combined as appropriate.
圖1所示之一實施形態中,硬塗膜1具備僅配置於透明基材2之一面之硬塗層3。然而,硬塗層3之配置並不限定於上述,例如,雖未圖示,但亦可具備配置於透明基材2之一面及另一面(2個主面)該兩面之硬塗層3。In one embodiment shown in FIG. 1, the
圖2所示之一實施形態中,透明導電性膜6具備僅配置於透明基材2之厚度方向之一側之硬塗層3、光學調整層4及透明導電層5,但硬塗層3、光學調整層4及透明導電層5之配置並不限定於上述,例如,亦可具備於透明基材2之厚度方向之一側及另一側該兩側分別依序配置之硬塗層3、光學調整層4及透明導電層5。
實施例In one embodiment shown in FIG. 2, the transparent
以下展示實施例及比較例,進一步具體地說明本發明。再者,本發明並不限定於任何實施例及比較例。又,於以下之記載中使用之調配比率(比率)、物性值、參數等具體的數值,可代替為上述之「實施方式」中記載之相當於與彼等對應之調配比率(比率)、物性值、參數等記載之上限(定義為「以下」、「未達」之數值)或下限(定義為「以上」、「超過」之數值)。Examples and comparative examples are shown below to further illustrate the present invention. Furthermore, the present invention is not limited to any examples and comparative examples. In addition, the specific values such as the blending ratio (ratio), physical property values, and parameters used in the following description can be replaced by the blending ratio (ratio) and physical properties corresponding to those described in the above-mentioned "embodiments". The upper limit (defined as the value of "below" and "not reached") or the lower limit (defined as the value of "above" and "exceeded") described in the values and parameters.
實施例1
作為透明基材2,準備100 μm之厚度之COP膜(ZEONOR ZF-16、日本ZEON公司製造)。Example 1
As the
繼而,使用線棒塗佈器#6,將按照表1中記載之配方製備之塗佈液(組合物)塗佈於透明基材2之一面,之後,利用80℃之1分鐘之加熱去除溶劑之後,以230 mJ/cm2
之累計光量使其光硬化,形成硬塗層3。再者,表1中記載之各成分詳細記載於表2。Next, using a wire
藉此,製造具備透明基材2及硬塗層3之硬塗膜1。By this, the
實施例2~比較例2
按照表1中記載之配方改變塗佈液(組合物),除此以外,以與實施例1相同之方式形成硬塗層3。Example 2 to Comparative Example 2
The
<評價> 評價下述之項目,將該結果記載於表3。<Evaluation> The following items were evaluated, and the results are shown in Table 3.
厚度
使用MCPD2000(大塚電子(股份)製造)測定硬塗層3之厚度。thickness
The thickness of the
硬度
藉由奈米壓痕法測定硬塗層3之硬度。hardness
The hardness of the
奈米壓痕法中,將奈米壓痕儀(探針、壓頭)按壓於硬塗層3之一面,利用測定裝置附帶之軟體(triboscan)對藉此獲得之位移-荷重磁滯曲線進行數值處理,藉此獲得壓入硬度。In the nano-indentation method, the nano-indenter (probe, indenter) is pressed against one side of the
奈米壓痕儀裝置及測定條件如下述。
奈米壓痕儀裝置:「Tribo Indenter」、Hysitron Inc公司製造
測定方法:單一按壓法
按壓速度:60 μN/秒
最大按壓力:300 μN
最大按壓力保持時間:2秒
探針:三角錐型(三角錐型)
溫度:23℃
按壓深度:硬塗層3之厚度之1/10
鉛筆硬度
根據JIS K5600-5-4「劃痕硬度(鉛筆法)」(1999)測定硬塗層3之鉛筆硬度。The nano indenter device and measurement conditions are as follows.
Nano indenter device: "Tribo Indenter", manufactured by Hysitron Inc
Measurement method: single press method
Compression speed: 60 μN/sec
Maximum pressing force: 300 μN
Maximum pressing time: 2 seconds
Probe: triangular cone type (triangular cone type)
Temperature: 23℃
Depth of pressing: 1/10 of the thickness of
算術平均粗糙度Ra
根據JIS B 0601(2013)測定硬塗層3之算術平均粗糙度Ra。Arithmetic mean roughness Ra
The arithmetic average roughness Ra of the
抗黏連性
以指壓將另一透明基材(ZEONOR ZF-16、日本ZEON公司製造)壓接於硬塗層3之表面,以如下方式評價另一透明基材對硬塗層3之黏連(抗黏連性)。
○:未發生另一透明基材對硬塗層3之黏連。
△:另一透明基材雖暫時貼附於硬塗層3,但經過10秒則自硬塗層3脫離。
×:另一透明基材對硬塗層3黏連,之後,即使經過10秒亦未自硬塗層3脫離。Anti-blocking
The other transparent substrate (ZEONOR ZF-16, manufactured by ZEON Japan) was pressed against the surface of the
霧度 藉由測霧計(HM-150、村上色彩技術研究所公司製造)測定硬塗膜1(厚度101 μm)之霧度。Haze The haze of the hard coating film 1 (thickness 101 μm) was measured by a haze meter (HM-150, manufactured by Murakami Color Technology Research Institute).
耐曲撓性
藉由180度彎曲試驗評價硬塗膜1之耐曲撓性。評價標準如以下。
○:硬塗膜1即使180度彎曲亦不斷裂
×:硬塗膜1彎曲180度後斷裂
耐擦傷性
藉由用100 g之鋼絲絨往返摩擦硬塗膜1之厚度方向之一面10次,評價硬塗膜1之耐擦傷性。
評價標準如以下。
○:只觀察到未達10條擦痕
×:觀察到10條以上擦痕
[表1]
1‧‧‧硬塗膜
2‧‧‧透明基材
3‧‧‧硬塗層
4‧‧‧光學調整層
5‧‧‧透明導電層
6‧‧‧透明導電性膜1‧‧‧
圖1係表示本發明之硬塗膜之一實施形態之剖視圖。 圖2係表示具備圖1所示之硬塗膜之透明導電性膜之剖視圖。FIG. 1 is a cross-sectional view showing an embodiment of the hard coating film of the present invention. 2 is a cross-sectional view showing a transparent conductive film provided with the hard coating film shown in FIG. 1.
1‧‧‧硬塗膜 1‧‧‧ Hard coating
2‧‧‧透明基材 2‧‧‧Transparent substrate
3‧‧‧硬塗層 3‧‧‧hard coating
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JP2016225270A (en) * | 2015-05-27 | 2016-12-28 | 日東電工株式会社 | Transparent conductive film |
JP2017177808A (en) * | 2016-03-24 | 2017-10-05 | 東レフィルム加工株式会社 | Base film for gas barrier film, gas barrier film and organic el device |
JP6716366B2 (en) * | 2016-06-29 | 2020-07-01 | マクセルホールディングス株式会社 | Transparent conductive sheet and method for manufacturing the same |
JP6858503B2 (en) * | 2016-07-22 | 2021-04-14 | 日東電工株式会社 | Transparent conductive film |
CN107068246A (en) * | 2016-12-19 | 2017-08-18 | 南昌欧菲显示科技有限公司 | Transparent conducting film |
-
2018
- 2018-06-12 JP JP2018111531A patent/JP7395244B2/en active Active
-
2019
- 2019-06-05 KR KR1020190066807A patent/KR20190140839A/en active IP Right Grant
- 2019-06-12 CN CN201910506869.6A patent/CN110600164B/en active Active
- 2019-06-12 TW TW108120215A patent/TW202000759A/en unknown
Also Published As
Publication number | Publication date |
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JP2019215408A (en) | 2019-12-19 |
KR20190140839A (en) | 2019-12-20 |
CN110600164B (en) | 2022-12-02 |
CN110600164A (en) | 2019-12-20 |
JP7395244B2 (en) | 2023-12-11 |
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