JP6716366B2 - Transparent conductive sheet and method for manufacturing the same - Google Patents
Transparent conductive sheet and method for manufacturing the same Download PDFInfo
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- JP6716366B2 JP6716366B2 JP2016128969A JP2016128969A JP6716366B2 JP 6716366 B2 JP6716366 B2 JP 6716366B2 JP 2016128969 A JP2016128969 A JP 2016128969A JP 2016128969 A JP2016128969 A JP 2016128969A JP 6716366 B2 JP6716366 B2 JP 6716366B2
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- transparent conductive
- conductive film
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- conductive sheet
- film
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- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title description 14
- 229920001940 conductive polymer Polymers 0.000 claims description 106
- 229920005989 resin Polymers 0.000 claims description 89
- 239000011347 resin Substances 0.000 claims description 89
- 230000002209 hydrophobic effect Effects 0.000 claims description 66
- 238000000576 coating method Methods 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 43
- 239000007788 liquid Substances 0.000 claims description 41
- 239000002904 solvent Substances 0.000 claims description 24
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- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 238000002834 transmittance Methods 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229920000123 polythiophene Polymers 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 claims description 3
- 229940005642 polystyrene sulfonic acid Drugs 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
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- 229920003023 plastic Polymers 0.000 claims description 2
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- 239000002245 particle Substances 0.000 description 21
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 12
- 230000000704 physical effect Effects 0.000 description 11
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- 230000015572 biosynthetic process Effects 0.000 description 10
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- 230000000052 comparative effect Effects 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000002033 PVDF binder Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 8
- 239000000523 sample Substances 0.000 description 8
- -1 poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 7
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 229920006243 acrylic copolymer Polymers 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000007611 bar coating method Methods 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LULAYUGMBFYYEX-UHFFFAOYSA-N 3-chlorobenzoic acid Chemical class OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 1
- 101100026251 Caenorhabditis elegans atf-2 gene Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical class CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical class ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 230000010399 physical interaction Effects 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
- H01B1/124—Intrinsically conductive polymers
- H01B1/127—Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Insulated Conductors (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Electric Cables (AREA)
- Paints Or Removers (AREA)
Description
本発明は、透明導電性シート及びその製造方法に関する。 The present invention relates to a transparent conductive sheet and a method for manufacturing the same.
近年、チオフェン系やアニリン系の高分子は優れた安定性及び導電性を有することから、有機導電性材料としてその活用が期待されている。その活用の一つとして、液晶ディスプレイ、透明タッチパネル等の各種デバイスに用いられる透明電極の形成に、導電性高分子を溶媒に分散させたコーティング組成物が用いられている。 In recent years, thiophene-based and aniline-based polymers have excellent stability and conductivity, so that their use as organic conductive materials is expected. As one of its applications, a coating composition in which a conductive polymer is dispersed in a solvent is used for forming transparent electrodes used in various devices such as liquid crystal displays and transparent touch panels.
特許文献1では、「導電性高分子と、樹脂と、溶媒とを含む透明導電性コーティング組成物であって、前記樹脂は、ポリフッ化ビニリデンを含み、前記溶媒は、プロトン性極性溶媒と、非プロトン性極性溶媒とを含み、前記コーティング組成物中における前記ポリフッ化ビニリデンの分散粒子径は、0.3μm以下であり、前記導電性高分子の含有量は、前記コーティング組成物に含まれる全固形成分の質量に対して3質量%以上45質量%以下であり、前記非プロトン性極性溶媒の含有量は、前記溶媒の全質量に対して25質量%以上50質量%以下」である透明導電性コーティング組成物が提案されている。 In Patent Document 1, "a transparent conductive coating composition comprising a conductive polymer, a resin, and a solvent, wherein the resin contains polyvinylidene fluoride, the solvent is a protic polar solvent, a non-polar A dispersion particle size of the polyvinylidene fluoride in the coating composition containing a protic polar solvent is 0.3 μm or less, and the content of the conductive polymer is a total solid content in the coating composition. 3% by mass or more and 45% by mass or less with respect to the mass of the component, and the content of the aprotic polar solvent is 25% by mass or more and 50% by mass or less with respect to the total mass of the solvent". Coating compositions have been proposed.
しかし、特許文献1に記載のコーティング組成物を用いて透明導電性シートを製造する場合、透明導電性シートの硬度が十分でなく、製造過程で透明導電性シートが破損又は損傷する可能性があり、物理特性に問題があることが判明した。 However, when a transparent conductive sheet is manufactured using the coating composition described in Patent Document 1, the hardness of the transparent conductive sheet is not sufficient, and the transparent conductive sheet may be damaged or damaged during the manufacturing process. , It turned out that there is a problem with the physical properties.
本発明は、上記問題を解消するためになされたものであり、特に物理特性に優れた透明導電性膜を有する透明導電性シート及びその製造方法を提供する。 The present invention has been made to solve the above problems, and particularly provides a transparent conductive sheet having a transparent conductive film having excellent physical properties, and a method for producing the same.
本発明の一例によれば、透明導電性シートは、透明基材と、前記透明基材の主面に形成された透明導電性膜とを含む透明導電性シートであって、前記透明導電性膜は、導電性高分子と、疎水性樹脂とを含み、前記疎水性樹脂は、複数の塊状体を形成し、前記導電性高分子は、前記塊状体の間に配置されて、三次元的に連結し、前記導電性高分子の一部が、前記透明導電性膜の表面にまで達する構成を有する。 According to an example of the present invention, the transparent conductive sheet is a transparent conductive sheet including a transparent base material and a transparent conductive film formed on the main surface of the transparent base material, wherein the transparent conductive film is a transparent conductive film. Includes a conductive polymer and a hydrophobic resin, the hydrophobic resin forms a plurality of lumps, the conductive polymer is disposed between the lumps, three-dimensionally The conductive polymer is connected and a part of the conductive polymer reaches the surface of the transparent conductive film.
本発明によれば、物理特性に優れた透明導電性膜を有する透明導電性シートを提供することができる。 According to the present invention, it is possible to provide a transparent conductive sheet having a transparent conductive film having excellent physical properties.
(透明導電性シート)
本発明の一実施形態による透明導電性シートは、透明基材と、上記透明基材の主面に形成された透明導電性膜とを備え、上記透明導電性膜は、導電性高分子と、疎水性樹脂とを含み、上記疎水性樹脂は、複数の塊状体を形成し、上記導電性高分子は、上記塊状体の間に配置されて、三次元的に連結し、上記導電性高分子の一部が、上記透明導電性膜の表面にまで達している。
(Transparent conductive sheet)
The transparent conductive sheet according to an embodiment of the present invention comprises a transparent substrate and a transparent conductive film formed on the main surface of the transparent substrate, the transparent conductive film is a conductive polymer, A hydrophobic resin, wherein the hydrophobic resin forms a plurality of lumps, the conductive polymer is disposed between the lumps, three-dimensionally connected, the conductive polymer Partially reaches the surface of the transparent conductive film.
より具体的には、本発明の一実施形態による透明導電性シートは、透明基材と、上記透明基材の主面に形成された透明導電性膜とを備え、上記透明導電性膜は、導電性高分子と、疎水性樹脂とを含み、上記透明導電性膜の鉛筆硬度が、B以上であり、上記透明導電性膜の表面電気抵抗値が、50Ω/スクエア以上200Ω/スクエア以下であり、上記透明導電性シートの全光線透過率が、85%以上となる。 More specifically, the transparent conductive sheet according to one embodiment of the present invention includes a transparent base material and a transparent conductive film formed on the main surface of the transparent base material, and the transparent conductive film is A conductive polymer and a hydrophobic resin are contained, the pencil hardness of the transparent conductive film is B or more, and the surface electric resistance value of the transparent conductive film is 50 Ω/square or more and 200 Ω/square or less. The total light transmittance of the transparent conductive sheet is 85% or more.
本発明の一実施形態による透明導電性シートの透明導電性膜においては、上記疎水性樹脂が複数の塊状体を形成し、上記導電性高分子が上記塊状体の間に配置されて三次元的に連結することにより、三次元的導電パスを形成し、三次元的導電パスを形成した導電性高分子の一部が上記透明導電性膜の表面にまで達しているため、電気特性、光学特性、物理特性及び耐湿熱性に優れている。 In the transparent conductive film of the transparent conductive sheet according to one embodiment of the present invention, the hydrophobic resin forms a plurality of lumps, and the conductive polymer is arranged between the lumps to form a three-dimensional structure. To form a three-dimensional conductive path, a part of the conductive polymer forming the three-dimensional conductive path reaches the surface of the transparent conductive film, electrical characteristics, optical characteristics , Excellent in physical properties and heat and humidity resistance.
上記塊状体は、上記疎水性樹脂の単一粒子からなるか、又は、上記疎水性樹脂の単一粒子の集合体からなり、また、単一粒子からなる塊状体と、単一粒子の集合体からなる塊状体とが混在していてもよい。 The agglomerate is composed of a single particle of the hydrophobic resin, or is composed of an aggregate of a single particle of the hydrophobic resin, and an aggregate of a single particle and an aggregate of a single particle. May be mixed.
また、上記疎水性樹脂は、上記透明導電性膜のバインダとして機能するため、上記透明導電性膜と上記透明基材との密着性を向上できる。特に、上記透明基材として樹脂フィルム等のフレキシブル基材を用いる場合に、上記透明導電性膜が疎水性樹脂を含むことは、上記透明導電性膜と上記透明基材との密着性や追従性の観点で好ましい。 Further, since the hydrophobic resin functions as a binder for the transparent conductive film, the adhesion between the transparent conductive film and the transparent substrate can be improved. In particular, when a flexible substrate such as a resin film is used as the transparent substrate, the fact that the transparent conductive film contains a hydrophobic resin means that the transparent conductive film and the transparent substrate have good adhesion and followability. From the viewpoint of.
上記導電性高分子とは、Conductive Polymers(CPs)と呼ばれる高分子であり、ドーパントによるドーピングによって、ポリラジカルカチオニック塩又はポリラジカルアニオニック塩が形成された状態で、それ自体が導電性を発揮し得る高分子をいう。具体的には、ポリチオフェン、ポリアニリン、ポリピロール及びこれらの誘導体等のπ共役系導電性高分子が挙げられる。 The conductive polymer is a polymer called Conductive Polymers (CPs), which itself exhibits conductivity in the state where a polyradical cationic salt or a polyradical anionic salt is formed by doping with a dopant. Refers to a possible polymer. Specific examples thereof include π-conjugated conductive polymers such as polythiophene, polyaniline, polypyrrole and their derivatives.
本発明の一実施形態では、上記導電性高分子として、ポリチオフェン系化合物とドーパントとを含むものを用いることができる。上記導電性高分子としては、ポリチオフェン系化合物としてポリ(3,4−エチレンジオキシチオフェン)と、ドーパントとしてポリスチレンスルホン酸とを含む混合物(PEDOT/PSSともいう。)を用いることができるが、これに限定されない。 In one embodiment of the present invention, as the conductive polymer, a polymer containing a polythiophene compound and a dopant can be used. As the conductive polymer, a mixture (also referred to as PEDOT/PSS) containing poly(3,4-ethylenedioxythiophene) as a polythiophene-based compound and polystyrene sulfonic acid as a dopant can be used. Not limited to.
上記PEDOT/PSSとしては、例えば、PEDOTとPSSとの組成比は、PEDOT100質量部に対しPSSは300質量部以下が好ましい。このような組み合わせのものとしては、例えば、ヘレウス社製のクレビオスシリーズで“PH1000”、“PH750”、“PH500”、“PHCV4”等が挙げられる。 As the PEDOT/PSS, for example, the composition ratio of PEDOT and PSS is preferably 300 parts by mass or less with respect to 100 parts by mass of PEDOT. Examples of such a combination include "PH1000", "PH750", "PH500", "PHCV4" and the like in the Clevios series manufactured by Heraeus.
続いて、上記PEDOT/PSSの形態を説明する。先ず、PEDOTの分子量は1000〜2500程度のオリゴマーであり、PSSの分子量は10000〜500000程度の高分子であり、これらからPEDOT/PSSの一次構造が形成される。次に、アニオニックのPSS鎖に対して、多数のカチオニックのPEDOT分子が吸着して塩となる二次構造を取る。更に、PSS鎖が相互に絡み合うことでゲル状に凝集した3次構造を形成し、水中に分散した場合、コロイド状態を形成する。また、導電性高分子であるPEDOT/PSSの形態は、透明導電性膜の形成時には疎水性樹脂の存在により、コロイド状態から一定の体積を保持しながら変形する。 Next, the form of the PEDOT/PSS will be described. First, PEDOT is an oligomer having a molecular weight of about 1000 to 2500, and PSS is a polymer having a molecular weight of about 10,000 to 500,000, from which a primary structure of PEDOT/PSS is formed. Next, a large number of Cationic PEDOT molecules are adsorbed to the anionic PSS chain to form a secondary structure that forms a salt. Furthermore, the PSS chains are entangled with each other to form a gel-like tertiary structure, and when dispersed in water, a colloidal state is formed. In addition, the morphology of PEDOT/PSS, which is a conductive polymer, deforms from the colloidal state while maintaining a constant volume due to the presence of the hydrophobic resin when the transparent conductive film is formed.
上記導電性高分子の水分散液における平均粒子径は10nm〜500nm程度であることが好ましく、電気特性、光学特性、物理特性及び耐湿熱性を向上させる観点から、10nm〜100nmがより好ましい。 The average particle size of the conductive polymer in the aqueous dispersion is preferably about 10 nm to 500 nm, and more preferably 10 nm to 100 nm from the viewpoint of improving electrical characteristics, optical characteristics, physical characteristics and wet heat resistance.
上記導電性高分子の平均粒子径は、次のようにして測定する。先ず、導電性高分子の水分散液を分取して凍結後、破断面を作製する。その後、FEI社製の電界放射形走査電子顕微鏡(FE−SEM)を用いて、加速電圧:1.0kV、倍率:50000倍で観察して、二次電子像を得る。得られた二次電子像について画像処理を施し、個々の粒子の最大長軸径を算出する。その後、算出した最大長軸径の算術平均値を求めて、導電性高分子の平均粒子径とする。 The average particle size of the conductive polymer is measured as follows. First, an aqueous dispersion of a conductive polymer is collected and frozen, and a fracture surface is prepared. Then, using a field emission scanning electron microscope (FE-SEM) manufactured by FEI, observation is performed at an acceleration voltage of 1.0 kV and a magnification of 50,000 times to obtain a secondary electron image. Image processing is performed on the obtained secondary electron image, and the maximum major axis diameter of each particle is calculated. After that, the arithmetic mean value of the calculated maximum major axis diameters is calculated and used as the average particle diameter of the conductive polymer.
上記導電性高分子の一部は、上記透明導電性膜の表面にまで達していることが必要であり、これにより、本発明の一実施形態による透明導電性シートの透明導電性膜の表面電気抵抗値を確実に低下させることができる。 It is necessary that a part of the conductive polymer reaches the surface of the transparent conductive film, whereby the surface electricity of the transparent conductive film of the transparent conductive sheet according to the embodiment of the present invention is reduced. The resistance value can be reliably reduced.
ここで上記透明導電性膜の電気特性及び物理特性が向上する理由について、従来の透明導電性膜と比較して、図面に基づき説明する。 Here, the reason why the electrical and physical properties of the transparent conductive film are improved will be described based on the drawings as compared with a conventional transparent conductive film.
図1は、本発明の一実施形態による透明導電性シートの模式断面図である。図1において、本発明の一実施形態による透明導電性シート10は、透明基材11と、透明基材11の上に形成された透明導電性膜12とを備えている。また、透明導電性膜12は、バインダとして機能する疎水性樹脂12aと、導電性高分子12bとから形成されている。疎水性樹脂12aは、塊状体を形成し、導電性高分子12bは、塊状体を形成した疎水性樹脂12aの間に配置されている。また、上記塊状体は、上記疎水性樹脂の単一粒子からなるか、又は、上記疎水性樹脂の単一粒子の集合体からなると考えられる。また、上記塊状体は、単一粒子からなる塊状体と、単一粒子の集合体からなる塊状体とが混在していてもよい。 FIG. 1 is a schematic sectional view of a transparent conductive sheet according to an embodiment of the present invention. In FIG. 1, a transparent conductive sheet 10 according to an embodiment of the present invention includes a transparent base material 11 and a transparent conductive film 12 formed on the transparent base material 11. The transparent conductive film 12 is formed of a hydrophobic resin 12a that functions as a binder and a conductive polymer 12b. The hydrophobic resin 12a forms a lump, and the conductive polymer 12b is arranged between the hydrophobic resins 12a forming the lump. Further, it is considered that the agglomerates consist of single particles of the hydrophobic resin or an aggregate of single particles of the hydrophobic resin. Further, the agglomerates may include agglomerates composed of single particles and agglomerates composed of aggregates of single particles.
また、導電性高分子12bは、透明導電性膜12の中で三次元的に連結することにより、三次元的導電パスを形成し、三次元的導電パスを形成した導電性高分子の一部が、透明導電性膜12の表面にまで達している。ここで、三次元的導電パスを形成することとは、導電性高分子が三次元方向に導通している状態をいう。上記三次元的導電パスを形成した導電性高分子は、透明導電性膜12の中において、完全に一体化されていてもよいし、三次元的導電パスを形成した導電性高分子が複数の集合を形成して連結して相互に電気的に接続していてもよい。即ち、透明導電性膜12の中で、導電性高分子12bが導電パス、即ち、導電性ネットワークを形成していればよい。これにより、透明導電性シート10の導電性を向上できると考えられる。 The conductive polymer 12b is three-dimensionally connected in the transparent conductive film 12 to form a three-dimensional conductive path, and a part of the conductive polymer forming the three-dimensional conductive path. However, it reaches the surface of the transparent conductive film 12. Here, forming a three-dimensional conductive path means a state in which the conductive polymer is conducted in the three-dimensional direction. The conductive polymer having a three-dimensional conductive path may be completely integrated in the transparent conductive film 12, or a plurality of conductive polymers having a three-dimensional conductive path may be formed. It is also possible to form a set and connect them to be electrically connected to each other. That is, in the transparent conductive film 12, it is sufficient that the conductive polymer 12b forms a conductive path, that is, a conductive network. It is considered that this can improve the conductivity of the transparent conductive sheet 10.
導電性高分子12bが、透明導電性膜12の中で三次元的に連結し、上記導電性高分子の一部が、透明導電性膜12の表面にまで達していることは、透明導電性膜12の表面及び断面について、原子間力顕微鏡(Atomic Force Microscope:AFM)を用いて、AFM/電流同時測定を行い、導電部を可視化することにより確認できる。 The conductive polymer 12b is three-dimensionally connected in the transparent conductive film 12, and a part of the conductive polymer has reached the surface of the transparent conductive film 12 means that the transparent conductive film 12 is transparent. The surface and cross section of the film 12 can be confirmed by performing simultaneous AFM/current measurement using an atomic force microscope (AFM) and visualizing the conductive part.
透明導電性膜12の表面には、導電性高分子と疎水性樹脂とが一定の比率で存在する。透明導電性膜12の表面近傍にも疎水性樹脂12aが存在し、強度的に弱い導電性高分子12bを補うことで、透明導電性膜12の表面硬度が向上できると考えられる。一方、表面の導電性高分子12bは、三次元的導電パスを形成する導電性高分子と、三次元的導電パスを形成しない導電性高分子とに二分されることが分かっている。三次元的導電パスを形成する導電性高分子は、疎水性樹脂12aに保護されているため、例え、表面摩擦を加えたとしても、透明導電性膜として機能する。また、透明導電性膜12の内部には、疎水性樹脂12aの塊状体が充填され、導電性高分子12bが疎水性樹脂12aの塊状体の間に散在する状態となる。このため、立体的構造として疎水性樹脂12aの塊状体同士がお互いに化学的相互作用と物理的相互作用とを与えながら、整然と配列するため、透明導電性膜12の内部硬度も向上すると考えられる。 On the surface of the transparent conductive film 12, the conductive polymer and the hydrophobic resin are present at a constant ratio. It is considered that the hydrophobic resin 12a also exists near the surface of the transparent conductive film 12 and the surface hardness of the transparent conductive film 12 can be improved by supplementing the conductive polymer 12b which is weak in strength. On the other hand, it is known that the conductive polymer 12b on the surface is divided into a conductive polymer that forms a three-dimensional conductive path and a conductive polymer that does not form a three-dimensional conductive path. Since the conductive polymer forming the three-dimensional conductive path is protected by the hydrophobic resin 12a, it functions as a transparent conductive film even if surface friction is applied. Further, the transparent conductive film 12 is filled with the lumps of the hydrophobic resin 12a, and the conductive polymer 12b is scattered between the lumps of the hydrophobic resin 12a. Therefore, it is considered that the lumps of the hydrophobic resin 12a as a three-dimensional structure are arranged in order while giving chemical interaction and physical interaction to each other, and the internal hardness of the transparent conductive film 12 is also improved. ..
一方、図2は、疎水性樹脂に代えて親水性樹脂を用いた従来の透明導電性シートの模式断面図である。図2において、従来の透明導電性シート20は、透明基材21と、透明基材21の上に形成された透明導電性膜22とを備えている。また、透明導電性膜22は、親水性樹脂22aと、導電性高分子22bとから形成されている。導電性高分子と、疎水性樹脂と、溶媒とを含む透明導電性膜形成用塗布液において、溶媒が水の場合、疎水性樹脂は溶媒中でエマルジョン型の形態となるが、親水性樹脂22aはエマルジョン型の形態はとらず溶媒中に溶解する。また、親水性樹脂22aは、ほぼランダムに透明導電性膜22の中に分散し、導電性高分子22bは、親水性樹脂22aの間に配置されていると考えられる。 On the other hand, FIG. 2 is a schematic cross-sectional view of a conventional transparent conductive sheet using a hydrophilic resin instead of the hydrophobic resin. In FIG. 2, the conventional transparent conductive sheet 20 includes a transparent base material 21 and a transparent conductive film 22 formed on the transparent base material 21. The transparent conductive film 22 is formed of a hydrophilic resin 22a and a conductive polymer 22b. In a coating liquid for forming a transparent conductive film containing a conductive polymer, a hydrophobic resin, and a solvent, when the solvent is water, the hydrophobic resin becomes an emulsion type in the solvent, but the hydrophilic resin 22a Does not take the form of emulsion and dissolves in the solvent. Further, it is considered that the hydrophilic resin 22a is almost randomly dispersed in the transparent conductive film 22 and the conductive polymer 22b is arranged between the hydrophilic resins 22a.
また、導電性高分子22bは、透明導電性膜22の中でほぼ孤立しており、導電性高分子22bは、透明導電性膜22の中で三次元的導電パスを形成していないか、又はその形成が不十分であると考えられる。このため、導電性高分子22bが導電パスとして十分には機能せず、透明導電性シート20の導電性が向上できないと考えられる。即ち、親水性樹脂を用いた従来の透明導電性シートにおいて、導電パスを形成するためには、導電性高分子の含有率を上げるか、透明導電性膜の膜厚を増加させる必要があり、その場合の欠点として光学特性の悪化が考えられる。 In addition, the conductive polymer 22b is almost isolated in the transparent conductive film 22, and the conductive polymer 22b does not form a three-dimensional conductive path in the transparent conductive film 22. Or, it is considered that its formation is insufficient. Therefore, it is considered that the conductive polymer 22b does not sufficiently function as a conductive path and the conductivity of the transparent conductive sheet 20 cannot be improved. That is, in the conventional transparent conductive sheet using a hydrophilic resin, in order to form a conductive path, it is necessary to increase the content of the conductive polymer or increase the film thickness of the transparent conductive film, As a drawback in that case, deterioration of optical characteristics is considered.
更に、透明導電性膜22の内部には、親水性樹脂22aと導電性高分子22bとがランダムに絡み合って存在すると考えられるため、透明導電性膜22の外部応力に対する抵抗力が低下し、透明導電性膜22の硬度が低下すると考えられる。 Furthermore, since it is considered that the hydrophilic resin 22a and the conductive polymer 22b are randomly entangled inside the transparent conductive film 22, the resistance of the transparent conductive film 22 to external stress is reduced, and the transparent conductive film 22 is transparent. It is considered that the hardness of the conductive film 22 decreases.
上記疎水性樹脂としては、ポリフッ化ビニリデン樹脂(PVDF)、フッ化ビニリデン−アクリル共重合体、フッ化ビニリデン−ヘキサフルオロプロピレン共重合体、アクリル樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリカーボネート樹脂、ポリウレタン樹脂、ポリスチレン樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、ポリ酢酸ビニル樹脂、ポリオレフィン樹脂、ポリエチレングリコール(PEG)、ポリエチレンオキサイド、ポリプロピレンオキサイド等の樹脂が使用できる。本発明で疎水性樹脂とは、上記導電性高分子と比較して、水に対する溶解度が小さい樹脂を意味し、特に、好ましくは、樹脂骨格中に疎水性基を有する樹脂である。 Examples of the hydrophobic resin include polyvinylidene fluoride resin (PVDF), vinylidene fluoride-acrylic copolymer, vinylidene fluoride-hexafluoropropylene copolymer, acrylic resin, polyester resin, polyamide resin, polycarbonate resin, polyurethane resin, Resins such as polystyrene resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl acetate resin, polyolefin resin, polyethylene glycol (PEG), polyethylene oxide and polypropylene oxide can be used. In the present invention, the hydrophobic resin means a resin having a lower solubility in water as compared with the conductive polymer, and particularly preferably a resin having a hydrophobic group in the resin skeleton.
また、上記疎水性樹脂の使用形態としては、エマルジョン型が使用できる。特に、PVDFエマルジョン、フッ化ビニリデン−アクリル共重合体エマルジョン、フッ化ビニリデン−ヘキサフルオロプロピレン共重合体エマルジョン、アクリル樹脂エマルジョン、ポリエステルエマルジョン、ポリオレフィンエマルジョン等が好ましい。また、上記エマルジョンにおける樹脂粒子の平均粒子径は、10〜300nmであることが好ましく、その平均粒子径は既知の粒度分布計で測定することができる。 An emulsion type can be used as the usage form of the hydrophobic resin. Particularly, PVDF emulsion, vinylidene fluoride-acrylic copolymer emulsion, vinylidene fluoride-hexafluoropropylene copolymer emulsion, acrylic resin emulsion, polyester emulsion, polyolefin emulsion and the like are preferable. The average particle diameter of the resin particles in the emulsion is preferably 10 to 300 nm, and the average particle diameter can be measured by a known particle size distribution meter.
また、上記導電性高分子と上記疎水性樹脂との体積比は、1:99〜70:30とすることができる。上記導電性高分子と上記疎水性樹脂との体積比が上記範囲内であれば、透明導電性膜の立体的構造の形成において、導電性高分子と疎水性樹脂とが整然と配列するため、上記透明導電性膜の電気特性、光学特性、物理特性及び耐湿熱性を向上できる。特に、透明電極の形成において、より好ましい体積比は10:90〜35:65である。 The volume ratio of the conductive polymer to the hydrophobic resin can be 1:99 to 70:30. If the volume ratio of the conductive polymer and the hydrophobic resin is within the above range, in forming the three-dimensional structure of the transparent conductive film, the conductive polymer and the hydrophobic resin are arranged in an orderly manner. The electrical property, optical property, physical property and wet heat resistance of the transparent conductive film can be improved. Particularly, in forming the transparent electrode, a more preferable volume ratio is 10:90 to 35:65.
上記透明導電性シートの透明導電性膜の鉛筆硬度は、B以上であることが好ましく、HB以上であることがより好ましい。鉛筆硬度が高いほど良好な物理特性を示す。 The pencil hardness of the transparent conductive film of the transparent conductive sheet is preferably B or higher, and more preferably HB or higher. The higher the pencil hardness, the better the physical properties.
上記透明導電性シートの透明導電性膜の表面電気抵抗値は、50Ω/スクエア以上10000Ω/スクエア以下であることが好ましい。更に、上記透明導電性膜をタッチパネル用電極として用いる場合には、上記透明導電性膜の表面抵抗値は、50Ω/スクエア以上200Ω/スクエア以下が好ましい。表面電気抵抗値が小さいほど良好な電気特性を示す。 The surface electric resistance value of the transparent conductive film of the transparent conductive sheet is preferably 50 Ω/square or more and 10000 Ω/square or less. Furthermore, when the transparent conductive film is used as an electrode for a touch panel, the surface resistance value of the transparent conductive film is preferably 50Ω/square or more and 200Ω/square or less. The smaller the surface electric resistance value, the better the electric characteristics.
上記透明導電性シートの全光線透過率は、85%以上であることが好ましく、より好ましくは90%以上である。全光線透過率が高いほど良好な光学特性を示す。上記全光線透過率は、分光光度計、例えば、日本分光社製の“V−570”により測定可能である。 The total light transmittance of the transparent conductive sheet is preferably 85% or more, more preferably 90% or more. The higher the total light transmittance, the better the optical properties. The total light transmittance can be measured by a spectrophotometer, for example, "V-570" manufactured by JASCO Corporation.
上記透明導電性膜の膜厚は、用途に応じて適宜設定されるものであるが、通常、0.01〜10μm程度である。膜厚が薄すぎても厚すぎても、均一な透明導電性膜を形成することが困難となる。上記導電性高分子の割合にもよるが、膜厚が薄いと、表面電気抵抗値が増加する傾向にあり、膜厚が厚すぎると、全光線透過率が低下する傾向にある。本実施形態では、150〜300nmが好ましい。 The thickness of the transparent conductive film is appropriately set depending on the application, but is usually about 0.01 to 10 μm. If the film thickness is too thin or too thick, it becomes difficult to form a uniform transparent conductive film. Although it depends on the ratio of the conductive polymer, when the film thickness is thin, the surface electric resistance value tends to increase, and when the film thickness is too thick, the total light transmittance tends to decrease. In the present embodiment, 150 to 300 nm is preferable.
上記透明基材としては、例えば、プラスチック、ゴム、ガラス、セラミックス等の種々のものが使用できる。 Various materials such as plastic, rubber, glass, and ceramics can be used as the transparent substrate.
(透明導電性シートの製造方法)
本発明の一実施形態による透明導電性シートの製造方法は、導電性高分子と、疎水性樹脂と、溶媒とを含む透明導電性膜形成用塗布液を作製する工程と、上記透明導電性膜形成用塗布液を透明基材の上に塗布して加熱することにより、上記透明基材の上に透明導電性膜を形成する工程とを備える。
(Method for producing transparent conductive sheet)
A method for producing a transparent conductive sheet according to an embodiment of the present invention comprises a step of producing a transparent conductive film-forming coating liquid containing a conductive polymer, a hydrophobic resin, and a solvent, and the transparent conductive film. Forming the transparent conductive film on the transparent base material by applying the coating liquid for formation onto the transparent base material and heating.
本発明の一実施形態による透明導電性シートの製造方法によれば、電気特性、光学特性、物理特性及び耐湿熱性に優れた透明導電性膜を備えた透明導電性シートを製造できる。 According to the method for manufacturing a transparent conductive sheet according to an embodiment of the present invention, it is possible to manufacture a transparent conductive sheet including a transparent conductive film having excellent electric characteristics, optical characteristics, physical characteristics, and heat and humidity resistance.
<透明導電性膜形成用塗布液>
上記導電性高分子としては、前述のポリチオフェン系化合物としてポリ(3,4−エチレンジオキシチオフェン)と、ドーパントとしてポリスチレンスルホン酸とを含む混合物(PEDOT/PSS)を用いることができるが、これらに限定されない。通常、上記導電性高分子は、導電性高分子の水分散液の形態で供給される。
<Coating liquid for forming transparent conductive film>
As the conductive polymer, a mixture (PEDOT/PSS) containing poly(3,4-ethylenedioxythiophene) as the above polythiophene-based compound and polystyrene sulfonic acid as the dopant can be used. Not limited. Usually, the conductive polymer is supplied in the form of an aqueous dispersion of the conductive polymer.
上記透明導電性膜形成用塗布液における上記導電性高分子の含有量は、上記透明導電性膜形成用塗布液に含まれる全固形成分の質量に対して0.7質量%以上70.0質量%以下であることが好ましい。上記導電性高分子の含有量が、上記透明導電性膜形成用塗布液に含まれる全固形成分の質量に対して0.7質量%を下回ると透明導電性膜の導電性が低下し、70.0質量%を超えると透明導電性膜の物理特性や耐湿熱性が低下する傾向にある。 The content of the conductive polymer in the coating liquid for forming the transparent conductive film is 0.7% by mass or more and 70.0% by mass with respect to the mass of all solid components contained in the coating liquid for forming the transparent conductive film. % Or less is preferable. When the content of the conductive polymer is less than 0.7 mass% with respect to the mass of all solid components contained in the transparent conductive film-forming coating liquid, the conductivity of the transparent conductive film is lowered, and 70 If it exceeds 0.0% by mass, the physical properties and wet heat resistance of the transparent conductive film tend to deteriorate.
上記疎水性樹脂は、前述の透明導電性シートで説明した疎水性樹脂と同じ樹脂が使用できるが、その使用形態は、疎水性樹脂水系エマルジョンとして用いることが好ましい。上記導電性高分子は通常、導電性高分子水分散液として用いるため、上記疎水性樹脂水系エマルジョンを用いることにより、上記導電性高分子水分散液との混合性が向上する。 As the hydrophobic resin, the same resin as the hydrophobic resin described in the above-mentioned transparent conductive sheet can be used, but it is preferably used as a hydrophobic resin aqueous emulsion. Since the conductive polymer is usually used as a conductive polymer aqueous dispersion, the use of the hydrophobic resin aqueous emulsion improves the miscibility with the conductive polymer aqueous dispersion.
また、上記疎水性樹脂は、元々非水溶性樹脂であるため、疎水性樹脂水系エマルジョンとして用いることにより、上記透明導電性膜形成用塗布液を作製した際に、疎水性樹脂と導電性高分子とが分離して、疎水性樹脂が複数の塊状体を形成し、導電性高分子を上記疎水性樹脂の塊状体の間に配置させることができる。 Since the hydrophobic resin is originally a water-insoluble resin, the hydrophobic resin and the conductive polymer are used when the transparent conductive film-forming coating liquid is prepared by using the hydrophobic resin as an aqueous emulsion. Are separated, the hydrophobic resin forms a plurality of lumps, and the conductive polymer can be arranged between the lumps of the hydrophobic resin.
上記疎水性樹脂の含有量は、上記透明導電性膜形成用塗布液に含まれる全固形成分の質量に対して30.0質量%以上99.3質量%以下が好ましく、より好ましくは65.0質量%以上95.0質量%以下である。上記疎水性樹脂の含有量が少なすぎると、十分な硬度を有する透明導電性膜が得られにくい傾向にあり、上記疎水性樹脂の含有量が多すぎると、透明導電性膜が白濁化し、光学特性が悪化する傾向にある。 The content of the hydrophobic resin is preferably 30.0% by mass or more and 99.3% by mass or less, and more preferably 65.0% by mass based on the mass of all solid components contained in the coating liquid for forming the transparent conductive film. It is from 9% to 95.0% by mass. If the content of the hydrophobic resin is too small, it tends to be difficult to obtain a transparent conductive film having sufficient hardness, if the content of the hydrophobic resin is too large, the transparent conductive film becomes cloudy, optical The characteristics tend to deteriorate.
上記溶媒は、プロトン性極性溶媒と非プロトン性極性溶媒とを含んでいることが好ましい。プロトン性溶媒は、塗布液の状態において導電性高分子を均一に分散する効果を持つとともに、疎水性樹脂を均一に分散、もしくは溶解する効果がある。また、非プロトン性溶媒は、基材に塗布液を塗布した後、溶媒を乾燥により除去して導電性膜を形成する乾燥工程において、導電性高分子を配向、結晶化させ、導電性ネットワークを形成する効果がある。また、プロトン性極性溶媒と非プロトン性極性溶媒とを併用することにより、塗布液の作製から導電性膜の形成までを通して、それぞれの溶媒は導電性高分子と疎水性樹脂とに対して効果的に作用するため、比較的低い乾燥温度で透明性に優れた透明導電性膜を得ることができる。 The solvent preferably contains a protic polar solvent and an aprotic polar solvent. The protic solvent has an effect of uniformly dispersing the conductive polymer in the state of the coating liquid and an effect of uniformly dispersing or dissolving the hydrophobic resin. Further, the aprotic solvent, after applying the coating liquid to the substrate, in the drying step of removing the solvent by drying to form a conductive film, the conductive polymer is oriented and crystallized to form a conductive network. Has the effect of forming. Further, by using the protic polar solvent and the aprotic polar solvent in combination, each solvent is effective for the conductive polymer and the hydrophobic resin from the preparation of the coating liquid to the formation of the conductive film. Therefore, a transparent conductive film having excellent transparency can be obtained at a relatively low drying temperature.
上記プロトン性極性溶媒としては、例えば、水、エチルアルコール、メチルアルコール、n−プロピルアルコール、イソプロピルアルコール、n−ブチルアルコール、イソブチルアルコール、エチレングリコール、プロピレングリコール、酢酸等が挙げられ、上記非プロトン性極性溶媒としては、ジメチルスルホキシド、N−メチルピロリドン、N−エチルピロリドン、N,N−ジメチルホルムアミド、アセトニトリル、アセトン、テトラヒドロフラン等が挙げられる。 Examples of the protic polar solvent include water, ethyl alcohol, methyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol, ethylene glycol, propylene glycol, acetic acid, etc. Examples of the polar solvent include dimethyl sulfoxide, N-methylpyrrolidone, N-ethylpyrrolidone, N,N-dimethylformamide, acetonitrile, acetone and tetrahydrofuran.
上記非プロトン性極性溶媒の含有量は、上記溶媒の全質量に対して1.0質量%以上50.0質量%以下であることが好ましい。上記非プロトン性極性溶媒の含有量が、上記溶媒の全質量に対して1.0質量%を下回ると、導電性高分子の配向、結晶化が起こりにくいため、透明導電性膜の電気特性が低下する傾向にあり、50.0質量%を超えると、導電性高分子や疎水性樹脂の凝集が発生しやすくなるため、透明導電性膜の光学特性が低下する傾向にある。 The content of the aprotic polar solvent is preferably 1.0% by mass or more and 50.0% by mass or less based on the total mass of the solvent. When the content of the aprotic polar solvent is less than 1.0% by mass with respect to the total mass of the solvent, the orientation and crystallization of the conductive polymer are less likely to occur, so that the electrical characteristics of the transparent conductive film are If it exceeds 50.0 mass %, aggregation of the conductive polymer or the hydrophobic resin is likely to occur, so that the optical characteristics of the transparent conductive film tend to be deteriorated.
上記溶媒の含有量は特に限定されないが、上記透明導電性膜形成用塗布液の全質量に対して、50.0質量%以上99.5質量%以下とすればよい。また、上記溶媒には、無極性溶媒を含んでいてもよい。 The content of the solvent is not particularly limited, but may be 50.0% by mass or more and 99.5% by mass or less with respect to the total mass of the transparent conductive film-forming coating liquid. Moreover, the solvent may include a nonpolar solvent.
上記透明導電性膜形成用塗布液は、上記導電性高分子、上記疎水性樹脂、上記溶媒を混合することにより製造できる。また、上記透明導電性膜形成用塗布液は、更に分散機を用いて分散処理することが好ましい。上記分散機を用いて分散処理することにより、確実に疎水性樹脂が複数の塊状体を形成し、導電性高分子が上記塊状体の間に配置して三次元的に連結して三次元的導電パスを形成し、三次元的導電パスを形成する導電性高分子の一部を上記透明導電性膜の表面にまで到達させることができる。 The transparent conductive film forming coating solution can be produced by mixing the conductive polymer, the hydrophobic resin, and the solvent. Further, it is preferable that the coating liquid for forming the transparent conductive film is further subjected to a dispersion treatment using a disperser. By performing dispersion treatment using the above dispersing machine, the hydrophobic resin surely forms a plurality of lumps, and the conductive polymer is disposed between the lumps and three-dimensionally connected to form a three-dimensional body. A part of the conductive polymer that forms a conductive path and forms a three-dimensional conductive path can reach the surface of the transparent conductive film.
上記分散機としては、ボールミル、サンドミル、ピコミル、ペイントコンディショナー等のメディアを介在させたメディア分散機、及び超音波分散機、高圧ホモジナイザー、ホモミキサー、ディスパー、ジェットミル等のメディアレス分散機が使用できる。特に好ましいのは、高圧ホモジナイザーである。 As the disperser, a media disperser having a media such as a ball mill, a sand mill, a pico mill, and a paint conditioner interposed, and a medialess disperser such as an ultrasonic disperser, a high pressure homogenizer, a homomixer, a disper, a jet mill can be used .. Particularly preferred is a high pressure homogenizer.
更に、上記透明導電性膜形成用塗布液は、レベリング剤を含んでいることが好ましい。これにより、確実に疎水性樹脂が複数の塊状体を形成し、導電性高分子が上記塊状体の間に配置して三次元的に連結して三次元的導電パスを形成し、三次元的導電パスを形成する導電性高分子の一部を上記透明導電性膜の表面にまで到達させることができる。 Further, it is preferable that the transparent conductive film forming coating liquid contains a leveling agent. This ensures that the hydrophobic resin forms a plurality of lumps, and the conductive polymer is placed between the lumps and connected three-dimensionally to form a three-dimensional conductive path, thereby forming a three-dimensional conductive path. A part of the conductive polymer forming the conductive path can reach the surface of the transparent conductive film.
上記レベリング剤としては、例えば、ポリジメチルシロキサン構造を有するシリコーン系化合物が挙げられる。具体的には、ビックケミー社製のBYK−300、BYK−302、BYK−306、BYK−307、BYK−310、BYK−315、BYK−320、BYK−322、BYK−323、BYK−325、BYK−330、BYK−331、BYK−333、BYK−337、BYK−344、BYK−370、BYK−375、BYK−377、BYK−UV3500、BYK−UV3510、BYK−UV3570;デグサ社製のTEGO−RAD2100、TEGO−RAD2200N、TEGO−RAD2250、TEGO−RAD2300、TEGO−RAD2500、TEGO−RAD2600、TEGO−RAD2700;共栄社化学社製のグラノール100、グラノール115、グラノール400、グラノール410、グラノール435、グラノール440、グラノール450、B−1484、ポリフローATF−2、KL−600、UCR−L72、UCR−L93等が挙げられる。これらは単独で又は複数混合して使用してもよい。これらの中でも、ビックケミー社製のBYK−337やBYK−377がより好ましい。上記レベリング剤の含有量は、上記透明導電性膜形成用塗布液の全質量に対して0.01〜5.0質量%程度とすればよい。 Examples of the leveling agent include silicone compounds having a polydimethylsiloxane structure. Specifically, BYK-300, BYK-302, BYK-306, BYK-307, BYK-310, BYK-315, BYK-320, BYK-322, BYK-323, BYK-325, BYK manufactured by Big Chemie. -330, BYK-331, BYK-333, BYK-337, BYK-344, BYK-370, BYK-375, BYK-377, BYK-UV3500, BYK-UV3510, BYK-UV3570; TEGO-RAD2100 manufactured by Degussa. , TEGO-RAD2200N, TEGO-RAD2250, TEGO-RAD2300, TEGO-RAD2500, TEGO-RAD2600, TEGO-RAD2700; Granol 100, Granol 115, Granol 400, Granol 410, Granol 435, Granol 440, Granol 450 manufactured by Kyoeisha Chemical Co., Ltd. , B-1484, Polyflow ATF-2, KL-600, UCR-L72, UCR-L93 and the like. You may use these individually or in mixture of 2 or more. Among these, BYK-337 and BYK-377 manufactured by Big Chemie are more preferable. The content of the leveling agent may be about 0.01 to 5.0 mass% with respect to the total mass of the transparent conductive film-forming coating liquid.
<透明導電性膜の形成>
上記透明導電性膜形成用塗布液を透明基材の上に塗布する方法としては、例えば、バーコート法、リバース法、グラビアコート法、マイクログラビアコート法、ダイコート法、ディッピング法、スピンコート法、スリットコート法、スプレーコート法等の塗布方法を用いることができる。
<Formation of transparent conductive film>
Examples of the method for applying the transparent conductive film-forming coating liquid on a transparent substrate include, for example, bar coating method, reverse method, gravure coating method, micro gravure coating method, die coating method, dipping method, spin coating method, A coating method such as a slit coating method or a spray coating method can be used.
上記塗布後の加熱は、上記透明導電性膜形成用塗布液の溶媒成分が蒸発する条件であればよく、100〜150℃で1〜60分間行うことが好ましい。溶媒が透明導電性膜に残っていると強度が劣る傾向にある。加熱方法としては、例えば、熱風乾燥法、加熱乾燥法、真空乾燥法、自然乾燥等により行うことができる。また、必要に応じて、塗膜にUV光やEB光を照射して塗膜を硬化させたりして、透明導電性膜を形成してもよい。 The heating after the coating may be performed under the condition that the solvent component of the coating liquid for forming the transparent conductive film is evaporated, and is preferably performed at 100 to 150° C. for 1 to 60 minutes. If the solvent remains in the transparent conductive film, the strength tends to be poor. As a heating method, for example, a hot air drying method, a heating drying method, a vacuum drying method, a natural drying method or the like can be used. In addition, the transparent conductive film may be formed by irradiating the coating film with UV light or EB light to cure the coating film, if necessary.
<導電パターンの形成工程>
本発明の一実施形態による透明導電性シートの製造方法は、上記透明導電性膜上の導電パターンを形成する位置にレジスト膜を形成する工程と、導電性を失活させる不活性剤を用いて、上記レジスト膜をマスクとして、上記透明導電性膜の露出部の導電性を失活させる工程とを更に備えることができる。これにより、簡単且つ安価に高精度の導電パターンを透明基材の上に形成できる。
<Conductive pattern forming step>
A method for manufacturing a transparent conductive sheet according to an embodiment of the present invention uses a step of forming a resist film at a position where a conductive pattern is formed on the transparent conductive film, and a deactivator for deactivating conductivity. And a step of deactivating the conductivity of the exposed portion of the transparent conductive film using the resist film as a mask. This makes it possible to easily and inexpensively form a highly accurate conductive pattern on a transparent substrate.
上記レジスト膜は、例えば、レジスト剤を上記透明導電性膜上にスクリーン印刷することにより形成できる。上記レジスト剤は特に限定されず、適宜選択できる。 The resist film can be formed, for example, by screen-printing a resist agent on the transparent conductive film. The resist agent is not particularly limited and can be appropriately selected.
上記不活性剤としては、上記導電性高分子を失活できるものであればよく、例えば、酸化性化合物、塩基性化合物が挙げられる。 The deactivator may be any one that can deactivate the conductive polymer, and examples thereof include an oxidizing compound and a basic compound.
上記酸化性化合物としては、例えば、過酸化水素系化合物、過塩素酸系化合物、次亜塩素酸系化合物、過酢酸系化合物、メタクロロ安息香酸系化合物、亜硫酸系化合物等が挙げられる。 Examples of the oxidizable compound include hydrogen peroxide compounds, perchloric acid compounds, hypochlorous acid compounds, peracetic acid compounds, metachlorobenzoic acid compounds, and sulfite compounds.
また、上記塩基性化合物としては、例えば、アンモニア、モノメチルアミン、ジメチルアミン、トリメチルアミン、モノエチルアミン、ジエチルアミン、トリエチルアミン、ピリジン、4−メチルピリジン、水酸化テトラメチルアンモニウム等が挙げられる。 Examples of the basic compound include ammonia, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, pyridine, 4-methylpyridine, tetramethylammonium hydroxide and the like.
以下、本発明の実施例を述べる。但し、本発明は以下の実施例に限定されるものではない。特に指摘がない場合、下記において、「部」は「質量部」を意味する。 Examples of the present invention will be described below. However, the present invention is not limited to the following examples. In the following, "part" means "part by mass" unless otherwise specified.
(実施例1)
<透明導電性膜形成用塗布液の調製>
先ず、以下の成分を添加、混合して透明導電性膜形成用混合液を調製した。
(1)導電性高分子水分散液(ヘレウス社製、商品名“クレビオスPH1000”、導電性高分子:PEDOT−PSS、固形分濃度:1.2質量%、PEDOT−PSSの平均粒子径:70nm):40.00部
(2)疎水性樹脂エマルジョン(アルケマ社製のPVDFエマルジョン、固形分濃度:24質量%、溶媒:水):6.00部
(3)非プロトン性極性溶媒(ジメチルスルホキシド):12.70部
(4)プロトン性極性溶媒(エチルアルコール):33.20部
(5)プロトン性極性溶媒(イオン交換水):8.10部
(Example 1)
<Preparation of coating liquid for forming transparent conductive film>
First, the following components were added and mixed to prepare a mixed liquid for forming a transparent conductive film.
(1) Conductive polymer aqueous dispersion (trade name "Clevios PH1000" manufactured by Heraeus, conductive polymer: PEDOT-PSS, solid content concentration: 1.2% by mass, average particle diameter of PEDOT-PSS: 70 nm ): 40.00 parts (2) Hydrophobic resin emulsion (PVDF emulsion manufactured by Arkema, solid content concentration: 24% by mass, solvent: water): 6.00 parts (3) aprotic polar solvent (dimethyl sulfoxide) : 12.70 parts (4) Protic polar solvent (ethyl alcohol): 33.20 parts (5) Protic polar solvent (ion-exchanged water): 8.10 parts
次に、上記透明導電性膜形成用混合液を、高圧ホモジナイザーを用いて80MPaの圧力で分散処理して透明導電性膜形成用塗布液を作製した。 Next, the transparent conductive film forming mixed liquid was subjected to a dispersion treatment using a high pressure homogenizer at a pressure of 80 MPa to prepare a transparent conductive film forming coating liquid.
<透明導電性シートの形成>
次に、厚さ100μmのポリエチレンテレフタレート(PET)フィルム(東洋紡社製、商品名“コスモシャインA4300”、全光線透過率:92.3%)を基板として用い、その基板の一方の主面の全面に上記透明導電性膜形成用塗布液をバーコート法により塗布し、その後120℃で2分間加熱した。これにより、一方の主面に透明導電性膜が形成された実施例1の透明導電性シートを作製した。上記透明導電性膜の膜厚は、290nmであった。
<Formation of transparent conductive sheet>
Next, a 100 μm-thick polyethylene terephthalate (PET) film (manufactured by Toyobo Co., Ltd., trade name “COSMOSHINE A4300”, total light transmittance: 92.3%) was used as a substrate, and the entire one main surface of the substrate was used. The above coating solution for forming a transparent conductive film was applied to the above by a bar coating method, and then heated at 120° C. for 2 minutes. As a result, the transparent conductive sheet of Example 1 having the transparent conductive film formed on one main surface was produced. The film thickness of the transparent conductive film was 290 nm.
<透明導電性膜の表面及び断面の観察>
作製した透明導電性シートの透明導電性膜の断面構造の観察を次にようにして行った。先ず、作製した透明導電性シートの透明導電性膜の上にエポキシ樹脂を塗布して包埋して、そのエポキシ樹脂面を機械研磨法にて整面した。その後、日本電子社製の断面試料作製装置“SM−09010”(商品名)を用いてイオンポリッシングにより断面を作製し、フラットミリング処理して断面観察用試料を得た。その断面観察用試料を日立製作所製の電界放射形走査電子顕微鏡(FE−SEM)を用いて、加速電圧:2.0kV、倍率:100000倍で観察して、二次・反射電子混成像を得た。その観察像を図3に示す。
<Observation of surface and cross section of transparent conductive film>
The cross-sectional structure of the transparent conductive film of the produced transparent conductive sheet was observed as follows. First, an epoxy resin was applied and embedded on the transparent conductive film of the produced transparent conductive sheet, and the surface of the epoxy resin was subjected to mechanical polishing. After that, a cross section was prepared by ion polishing using a cross-section sample preparation device "SM-09010" (trade name) manufactured by JEOL Ltd., and flat milling was performed to obtain a cross-section observation sample. Using a field emission scanning electron microscope (FE-SEM) manufactured by Hitachi, Ltd., the cross-section observation sample is observed at an accelerating voltage of 2.0 kV and a magnification of 100,000 times to obtain a secondary/reflection electron hybrid image. It was The observed image is shown in FIG.
図3から、透明導電性シート30において、PETフィルム31の上には、透明導電性膜32が形成され、透明導電性膜32の上には、エポキシ樹脂層33が形成され、疎水性樹脂32aは、複数の層状の連続膜を形成し、導電性高分子32bは、複数の層状の膜を形成し、導電性高分子32bの膜が疎水性樹脂32aの連続膜の間に配置されていることが確認できる。また、図3から、疎水性樹脂32aの連続膜の厚さは、約20〜100nmであった。 From FIG. 3, in the transparent conductive sheet 30, the transparent conductive film 32 is formed on the PET film 31, the epoxy resin layer 33 is formed on the transparent conductive film 32, and the hydrophobic resin 32a is formed. Forms a plurality of layered continuous films, the conductive polymer 32b forms a plurality of layered films, and the film of the conductive polymer 32b is disposed between the continuous films of the hydrophobic resin 32a. You can confirm that. Further, from FIG. 3, the thickness of the continuous film of the hydrophobic resin 32a was about 20 to 100 nm.
<透明導電性膜の表面及び断面で三次元的導電パスを形成する導電性高分子の可視化>
上記透明導電性シートの透明導電性膜の加工面の周囲に導電性材料として銀ペーストを塗布した後、透明導電性シートの表面と断面に対してAFM/電流同時測定を行い、三次元的導電パスを形成する導電性高分子(導電性ネットワーク)の可視化を行った。
<Visualization of the conductive polymer that forms a three-dimensional conductive path on the surface and cross section of the transparent conductive film>
After applying a silver paste as a conductive material around the processed surface of the transparent conductive film of the transparent conductive sheet, AFM/current simultaneous measurement is performed on the surface and the cross section of the transparent conductive sheet to obtain three-dimensional conductivity. The conductive polymer (conductive network) forming the path was visualized.
具体的には、日立ハイテクサイエンス社製の原子間力顕微鏡“Nano NaviII/E−Sweep”を用い、SIS(サンプルインテリジェンススキャン)モードで電流同時測定を行った。表面分析においては、探針は表面AuコートSi3N4製のもの(バネ定数0.1N/m)を使用し、スキャン面積を1μm2、印加電圧を0.3Vとし、アンプはナノアンプを使用した。また、断面分析においては、探針はPtコートSi製のもの(バネ定数3N/m)を使用し、スキャン面積は2μm2、印加電圧を0.7Vとし、アンプはピコアンプを使用した。 Specifically, an atomic force microscope "Nano NaviII/E-Sweep" manufactured by Hitachi High-Tech Science Co., Ltd. was used to perform current simultaneous measurement in SIS (Sample Intelligence Scan) mode. In the surface analysis, the tip used was made of Au-coated Si 3 N 4 (spring constant 0.1 N/m), the scanning area was 1 μm 2 , the applied voltage was 0.3 V, and the amplifier was a nano-amplifier. did. Further, in the cross-sectional analysis, a probe made of Pt-coated Si (spring constant 3 N/m) was used, a scan area was 2 μm 2 , an applied voltage was 0.7 V, and a pico-amplifier was used as an amplifier.
図4に透明導電性膜の表面のAFM/電流同時測定によるAFM電流像を示す。図4から、透明導電性膜の表面には、非導電部41と、点状の導電部42とが確認できる。非導電部41は、PVDFから形成され、導電部42は、三次元的導電パスを形成する導電性高分子の一部が透明導電性膜の表面にまで達した状態を示している。但し、表面に存在するすべての導電性高分子が三次元的導電パスを形成している訳ではないと考えられる。 FIG. 4 shows an AFM current image obtained by simultaneous AFM/current measurement on the surface of the transparent conductive film. From FIG. 4, the non-conductive part 41 and the dot-shaped conductive part 42 can be confirmed on the surface of the transparent conductive film. The non-conductive part 41 is formed of PVDF, and the conductive part 42 shows a state in which a part of the conductive polymer forming the three-dimensional conductive path reaches the surface of the transparent conductive film. However, it is considered that not all conductive polymers existing on the surface form a three-dimensional conductive path.
また、図5に透明導電性膜の断面のAFM/電流同時測定によるAFM電流像を示す。図5から、透明導電性膜40は、非導電部41と導電部42とから形成され、導電部42が、三次元的導電パスを形成する導電性高分子により、透明導電性膜40の内部に導電性ネットワークを形成していることが確認できる。 Further, FIG. 5 shows an AFM current image of the cross section of the transparent conductive film by simultaneous AFM/current measurement. From FIG. 5, the transparent conductive film 40 is formed of the non-conductive portion 41 and the conductive portion 42, and the conductive portion 42 is formed of the conductive polymer that forms a three-dimensional conductive path inside the transparent conductive film 40. It can be confirmed that a conductive network is formed in the.
図3〜図5から、上記透明導電性膜において、疎水性樹脂は複数の塊状体を形成し、上記導電性高分子は上記塊状体の間に配置されて三次元的に連結して三次元的導電パスを形成し、三次元的導電パスを形成する導電性高分子の一部が、上記透明導電性膜の表面にまで達していることが分かる。 From FIGS. 3 to 5, in the transparent conductive film, the hydrophobic resin forms a plurality of lumps, and the conductive polymer is arranged between the lumps and three-dimensionally connected to form a three-dimensional structure. It can be seen that a part of the conductive polymer that forms a three-dimensional conductive path forming a specific conductive path reaches the surface of the transparent conductive film.
(実施例2)
以下の成分を添加、混合して透明導電性膜形成用混合液を調製し、その透明導電性膜形成用混合液を実施例1と同様にして高圧ホモジナイザーを用いて分散処理して透明導電性膜形成用塗布液を作製し、その透明導電性膜形成用塗布液を用い、透明導電性膜の膜厚を180nmとした以外は、実施例1と同様にして実施例2の透明導電性シートを作製した。
(1)導電性高分子水分散液(ヘレウス社製、商品名“クレビオスPH1000”、導電性高分子:PEDOT−PSS、固形分濃度:1.2質量%、PEDOT−PSSの平均粒子径:70nm):60.00部
(2)疎水性樹脂エマルジョン(ダイセルファインケム社製のアクリル樹脂エマルジョン、商品名“AST499”固形分濃度:41.7質量%、溶媒:水):3.00部
(3)レベリング剤(ビックケミージャパン社製、商品名“BYK−337”、ポリエーテル変性ポリジメチルシロキサン15質量%とジプロピレングリコールモノメチルエーテル85質量%との混合液):0.20部
(4)非プロトン性極性溶媒(エチレングリコール):10.00部
(5)プロトン性極性溶媒(n−プロピルアルコール):20.00部
(6)プロトン性極性溶媒(イオン交換水):6.80部
(Example 2)
The following components were added and mixed to prepare a transparent conductive film-forming mixed solution, and the transparent conductive film-forming mixed solution was subjected to a dispersion treatment using a high-pressure homogenizer in the same manner as in Example 1 to obtain a transparent conductive film. A transparent conductive sheet of Example 2 was prepared in the same manner as in Example 1 except that a coating liquid for forming a film was prepared and the coating liquid for forming a transparent conductive film was used to form a film having a thickness of 180 nm. Was produced.
(1) Conductive polymer aqueous dispersion (manufactured by Heraeus, trade name "Clevios PH1000", conductive polymer: PEDOT-PSS, solid content concentration: 1.2 mass%, PEDOT-PSS average particle size: 70 nm ): 60.00 parts (2) Hydrophobic resin emulsion (acrylic resin emulsion manufactured by Daicel Finechem, trade name “AST499” solid content concentration: 41.7% by mass, solvent: water): 3.00 parts (3) Leveling agent (manufactured by BYK Japan KK, trade name "BYK-337", mixed solution of 15% by mass of polyether-modified polydimethylsiloxane and 85% by mass of dipropylene glycol monomethyl ether): 0.20 parts (4) aprotic Polar solvent (ethylene glycol): 10.00 parts (5) protic polar solvent (n-propyl alcohol): 20.00 parts (6) protic polar solvent (ion-exchanged water): 6.80 parts
作製した透明導電性シートの透明導電性膜の断面の観察を実施例1と同様にして行ったところ、図3と同様の観察像を得て、その観察像から疎水性樹脂の連続膜の厚さは、約30〜150nmであった。また、上記透明導電性膜の表面及び断面で三次元的導電パスを形成する導電性高分子の可視化を実施例1と同様にして行ったところ、図4及び図5と同様のAFM電流像を得た。 When the cross section of the transparent conductive film of the produced transparent conductive sheet was observed in the same manner as in Example 1, an observation image similar to that in FIG. 3 was obtained, and the thickness of the continuous film of the hydrophobic resin was obtained from the observation image. The length was about 30 to 150 nm. Further, when a conductive polymer forming a three-dimensional conductive path on the surface and cross section of the transparent conductive film was visualized in the same manner as in Example 1, AFM current images similar to those in FIGS. 4 and 5 were obtained. Obtained.
(実施例3)
高圧ホモジナイザーを用いた分散処理をせずに透明導電性膜形成用混合液をそのまま透明導電性膜形成用塗布液として用いた以外は、実施例1と同様にして実施例3の透明導電性シートを作製した。
(Example 3)
The transparent conductive sheet of Example 3 was carried out in the same manner as in Example 1 except that the mixed liquid for forming a transparent conductive film was used as it was as a coating liquid for forming a transparent conductive film without performing a dispersion treatment using a high pressure homogenizer. Was produced.
作製した透明導電性シートの透明導電性膜の断面の観察を実施例1と同様にして行ったところ、図3と同様の観察像を得て、その観察像から疎水性樹脂の連続膜の厚さは、約40〜200nmであった。また、上記透明導電性膜の表面及び断面の三次元的導電パスを形成する導電性高分子の可視化を実施例1と同様にして行ったところ、図4及び図5と同様のAFM電流像を得た。 When the cross section of the transparent conductive film of the produced transparent conductive sheet was observed in the same manner as in Example 1, an observation image similar to that in FIG. 3 was obtained, and the thickness of the continuous film of the hydrophobic resin was obtained from the observation image. The length was about 40 to 200 nm. Further, when a conductive polymer forming a three-dimensional conductive path on the surface and cross section of the transparent conductive film was visualized in the same manner as in Example 1, AFM current images similar to those in FIGS. 4 and 5 were obtained. Obtained.
(実施例4)
レベリング剤(ビックケミージャパン社製、商品名“BYK−337”)を0.20部添加し、プロトン性極性溶媒(イオン交換水)の添加量を7.90部に変更し、高圧ホモジナイザーを用いた分散処理をしなかった以外は、実施例1と同様にして透明導電性膜形成用塗布液を作製し、この透明導電性膜形成用塗布液を用いた以外は、実施例1と同様にして実施例4の透明導電性シートを作製した。
(Example 4)
0.20 part of a leveling agent (manufactured by BYK Japan KK, trade name "BYK-337") was added, the amount of the protic polar solvent (ion-exchanged water) was changed to 7.90 parts, and a high-pressure homogenizer was used. A transparent conductive film-forming coating liquid was prepared in the same manner as in Example 1 except that the dispersion treatment was not performed, and the same procedure as in Example 1 was performed except that this transparent conductive film-forming coating liquid was used. A transparent conductive sheet of Example 4 was produced.
作製した透明導電性シートの透明導電性膜の断面の観察を実施例1と同様にして行ったところ、図3と同様の観察像を得て、その観察像から疎水性樹脂の連続膜の厚さは、約30〜175nmであった。また、上記透明導電性膜の表面及び断面の三次元的導電パスを形成する導電性高分子の可視化を実施例1と同様にして行ったところ、図4及び図5と同様のAFM電流像を得た。 When the cross section of the transparent conductive film of the produced transparent conductive sheet was observed in the same manner as in Example 1, an observation image similar to that in FIG. 3 was obtained, and the thickness of the continuous film of the hydrophobic resin was obtained from the observation image. The length was about 30 to 175 nm. Further, when a conductive polymer forming a three-dimensional conductive path on the surface and cross section of the transparent conductive film was visualized in the same manner as in Example 1, AFM current images similar to those in FIGS. 4 and 5 were obtained. Obtained.
(比較例1)
以下の成分を添加、混合して透明導電性膜形成用混合液を調製し、その透明導電性膜形成用混合液を実施例1と同様にして高圧ホモジナイザーを用いて分散処理し、透明導電性膜形成用塗布液を作製し、その透明導電性膜形成用塗布液を用い、透明導電性膜の膜厚を389nmとした以外は、実施例1と同様にして比較例1の透明導電性シートを作製した。
(1)導電性高分子水分散液(ヘレウス社製、商品名“クレビオスPH1000”、導電性高分子:PEDOT−PSS、固形分濃度:1.2質量%、PEDOT−PSSの平均粒子径:70nm):39.20部
(2)親水性樹脂(クラレ社製のポリビニルアルコール、商品名“PVA−217”):1.41部
(3)非プロトン性極性溶媒(ジメチルスルホキシド):12.70部
(4)プロトン性極性溶媒(エチルアルコール):33.20部
(5)プロトン性極性溶媒(イオン交換水):13.49部
(Comparative Example 1)
The following components were added and mixed to prepare a mixed liquid for transparent conductive film formation, and the mixed liquid for transparent conductive film formation was subjected to a dispersion treatment using a high pressure homogenizer in the same manner as in Example 1 to obtain a transparent conductive film. A transparent conductive sheet of Comparative Example 1 was prepared in the same manner as in Example 1 except that a coating solution for forming a film was prepared and the coating solution for forming a transparent conductive film was used to change the thickness of the transparent conductive film to 389 nm. Was produced.
(1) Conductive polymer aqueous dispersion (trade name "Clevios PH1000" manufactured by Heraeus, conductive polymer: PEDOT-PSS, solid content concentration: 1.2% by mass, average particle diameter of PEDOT-PSS: 70 nm ): 39.20 parts (2) Hydrophilic resin (polyvinyl alcohol manufactured by Kuraray Co., Ltd., trade name "PVA-217"): 1.41 parts (3) Aprotic polar solvent (dimethyl sulfoxide): 12.70 parts (4) Protic polar solvent (ethyl alcohol): 33.20 parts (5) Protic polar solvent (ion-exchanged water): 13.49 parts
作製した透明導電性シートの透明導電性膜の断面の観察を実施例1と同様にして行ったところ、図3とは異なり、透明導電性膜の断面構造は均一な単層構造であることを確認した。また、上記透明導電性膜の表面及び断面の三次元的導電パスを形成する導電性高分子の可視化を実施例1と同様にして行ったところ、図4及び図5とは異なり、導電性高分子による導電性ネットワークの形成が不十分であることが分かった。 When the cross section of the transparent conductive film of the produced transparent conductive sheet was observed in the same manner as in Example 1, it was confirmed that, unlike FIG. 3, the cross sectional structure of the transparent conductive film was a uniform single-layer structure. confirmed. Further, when a conductive polymer that forms a three-dimensional conductive path on the surface and cross section of the transparent conductive film was visualized in the same manner as in Example 1, unlike in FIGS. 4 and 5, high conductivity was obtained. It was found that the formation of the conductive network by the molecules was insufficient.
(比較例2)
<透明導電性膜形成用塗布液の調製>
先ず、以下の成分を添加、混合して透明導電性膜形成用塗布液を調製した。本比較例2では、高圧ホモジナイザーを用いた分散処理は行わなかった。
(1)導電性高分子水分散液(ヘレウス社製、商品名“PH−500”、導電性高分子:PEDOT−PSS、固形分濃度:1.0質量%、PEDOT−PSSの平均粒子径:120nm):2.5部
(2)疎水性樹脂エマルジョン(アルケマ社製のPVDFエマルジョン、固形分濃度:20質量%、溶媒:水):2.4部
(3)非プロトン性極性溶媒(ジメチルスルホキシド):3.9部
(4)プロトン性極性溶媒(エチルアルコール):1.2部
(Comparative example 2)
<Preparation of coating liquid for forming transparent conductive film>
First, the following components were added and mixed to prepare a coating liquid for forming a transparent conductive film. In Comparative Example 2, the dispersion treatment using the high pressure homogenizer was not performed.
(1) Conductive polymer aqueous dispersion (manufactured by Heraeus, trade name "PH-500", conductive polymer: PEDOT-PSS, solid content concentration: 1.0% by mass, average particle diameter of PEDOT-PSS: 120 nm): 2.5 parts (2) Hydrophobic resin emulsion (PVDF emulsion manufactured by Arkema, solid content concentration: 20% by mass, solvent: water): 2.4 parts (3) aprotic polar solvent (dimethyl sulfoxide) ): 3.9 parts (4) Protic polar solvent (ethyl alcohol): 1.2 parts
<透明導電性シートの形成>
次に、厚さ0.7mmの10cm角の無アルカリガラス(全光線透過率:91.2%)を基板として用い、基板の一方の主面に上記透明導電性膜形成用塗布液をスピンコーティング法により回転速度800rpmで、30秒間塗布し、その後100℃で5分間加熱した。これにより、一方の主面に透明導電膜性膜が形成された比較例2の透明導電性シートを作製した。上記透明導電性膜の膜厚は、500nmであった。
<Formation of transparent conductive sheet>
Next, a 0.7-cm thick 10 cm square alkali-free glass (total light transmittance: 91.2%) was used as a substrate, and one of the main surfaces of the substrate was spin-coated with the above coating liquid for forming a transparent conductive film. Method was applied at a rotation speed of 800 rpm for 30 seconds, and then heated at 100° C. for 5 minutes. As a result, a transparent conductive sheet of Comparative Example 2 having a transparent conductive film formed on one main surface was produced. The film thickness of the transparent conductive film was 500 nm.
次に、上記で得られた実施例1〜4及び比較例1〜2の透明導電性シートについて、下記に示す各評価を行った。 Next, the following evaluations were performed on the transparent conductive sheets of Examples 1 to 4 and Comparative Examples 1 and 2 obtained above.
<電気特性>
透明導電性シートの電気特性は、下記のように透明導電性シートの透明導電性膜の表面電気抵抗値を測定することで評価した。
<Electrical characteristics>
The electrical characteristics of the transparent conductive sheet were evaluated by measuring the surface electrical resistance value of the transparent conductive film of the transparent conductive sheet as described below.
透明導電性シートの透明導電性膜の表面電気抵抗値は、三菱化学アナリテック社製の抵抗率測定装置“Loresta−GP”(MCP−T610型)とLSPプローブを用いて測定した。 The surface electric resistance value of the transparent conductive film of the transparent conductive sheet was measured using a resistivity measuring device “Loresta-GP” (MCP-T610 type) manufactured by Mitsubishi Chemical Analytech Co., Ltd. and an LSP probe.
<光学特性>
透明導電性シートの光学特性は、下記のように透明導電性シートの全光線透過率を測定することで評価した。
<Optical properties>
The optical characteristics of the transparent conductive sheet were evaluated by measuring the total light transmittance of the transparent conductive sheet as described below.
透明導電性シートの全光線透過率は、日本電色工業社製のヘイズメータ"NDH2000"を用いて測定した。 The total light transmittance of the transparent conductive sheet was measured using a haze meter "NDH2000" manufactured by Nippon Denshoku Industries Co., Ltd.
<物理特性>
透明導電性シートの物理特性は、下記のように透明導電性シートの透明導電性膜の鉛筆硬度を測定することで評価した。
<Physical properties>
The physical properties of the transparent conductive sheet were evaluated by measuring the pencil hardness of the transparent conductive film of the transparent conductive sheet as described below.
透明導電性シートの透明導電性膜の鉛筆硬度は、日本工業規格(JIS)K5400に規定された鉛筆硬度の測定方法に基づき、新東科学社製の表面性試験機“HEIDON−14DR”を用いて測定した。 The pencil hardness of the transparent conductive film of the transparent conductive sheet is based on the pencil hardness measuring method specified in Japanese Industrial Standard (JIS) K5400 using a surface property tester “HEIDON-14DR” manufactured by Shinto Scientific Co., Ltd. Was measured.
<耐湿熱性>
透明導電性シートの耐湿熱性は、下記のように透明導電性シートの保存試験を行うことで評価した。
<Moisture and heat resistance>
The moist heat resistance of the transparent conductive sheet was evaluated by conducting a storage test on the transparent conductive sheet as described below.
先ず、透明導電性シートの透明導電性膜の初期の表面電気抵抗値を前述の電気特性の評価と同様にして測定した。次に、透明導電性シートを恒温恒湿槽に入れて65℃、相対湿度90%で500時間保存した。続いて、保存後の透明導電性シートの透明導電性膜の表面電気抵抗値を上記と同様にして測定した。最後に、下記式(1)により表面電気抵抗値の変化度を算出した。
表面電気抵抗値の変化度=保存後の表面電気抵抗値/初期の表面電気抵抗値 (1)
First, the initial surface electric resistance value of the transparent conductive film of the transparent conductive sheet was measured in the same manner as the above-mentioned evaluation of electric characteristics. Next, the transparent conductive sheet was placed in a thermo-hygrostat and stored at 65° C. and 90% relative humidity for 500 hours. Subsequently, the surface electric resistance value of the transparent conductive film of the transparent conductive sheet after storage was measured in the same manner as above. Finally, the degree of change in surface electric resistance value was calculated by the following formula (1).
Degree of change in surface electric resistance value=surface electric resistance value after storage/initial surface electric resistance value (1)
上記測定の結果、表面電気抵抗値の変化度が1.2以下の場合、耐湿熱性は良好と判断し、表面抵抗値の変化度が1.2を上回った場合、耐湿熱性は不良と判断した。 As a result of the above measurement, when the degree of change in the surface electrical resistance value was 1.2 or less, it was determined that the moist heat resistance was good, and when the degree of change in the surface resistance value was more than 1.2, the moisture heat resistance was judged to be poor. ..
上記評価の結果を表1に示す。 The results of the above evaluations are shown in Table 1.
表1から、本発明の実施例1〜4の透明導電性シートは、透明導電性膜の表面電気抵抗値が全て180Ω/スクエアを下回って電気特性が良好であり、全光線透過率が全て85%以上となって光学特性が良好であり、また耐湿熱性も全て良好との評価を得ることができ、更に物理特性である鉛筆硬度も全てB以上を得たことが分かる。特に、高圧ホモジナイザーを用いて分散処理した透明導電性膜形成用塗布液を用いた実施例1及び2は、分散処理していない透明導電性膜形成用塗布液を用いた実施例3及び4に比べて電気特性がより向上することが分かる。また、いずれも高圧ホモジナイザーを用いて分散処理を行わなかった実施例3及び4では、透明導電性膜形成用塗布液にレベリング剤を添加した実施例4は、レベリング剤を添加しなかった実施例3に比べて電気特性が向上した。 From Table 1, in the transparent conductive sheets of Examples 1 to 4 of the present invention, the surface electric resistance values of the transparent conductive films are all below 180 Ω/square, the electric characteristics are good, and the total light transmittances are all 85. It can be seen that the optical characteristics were good, and the wet heat resistance was all good, and the pencil hardness, which is a physical property, was all B or higher. In particular, Examples 1 and 2 using the coating liquid for forming a transparent conductive film which was subjected to dispersion treatment using a high-pressure homogenizer were the same as Examples 3 and 4 using a coating liquid for forming a transparent conductive film which was not subjected to dispersion treatment. It can be seen that the electrical characteristics are further improved in comparison. In addition, in Examples 3 and 4 in which neither dispersion treatment was performed using a high-pressure homogenizer, Example 4 in which a leveling agent was added to the transparent conductive film-forming coating liquid was an example in which no leveling agent was added. The electrical characteristics were improved as compared with 3.
一方、親水性樹脂を用いた比較例1では光学特性及び耐湿熱性が劣り、鉛筆硬度も5B以下となり物理特性も劣ることが分かる。また、特許文献1の実施例3に相当する比較例2では、電気特性及び鉛筆硬度が劣ることが分かる。 On the other hand, it can be seen that in Comparative Example 1 using the hydrophilic resin, the optical characteristics and the wet heat resistance are inferior, the pencil hardness is 5 B or less, and the physical characteristics are inferior. Further, it can be seen that in Comparative Example 2 corresponding to Example 3 of Patent Document 1, the electrical characteristics and the pencil hardness are poor.
続いて、上記で得られた透明導電性シートについて、下記とおりパターニング適性の評価を行った。 Subsequently, the patterning suitability of the transparent conductive sheet obtained above was evaluated as follows.
<レジスト膜の形成>
先ず、透明導電性シートの透明導電性膜側の主面の中央部の5cm角の面積にスクリーン印刷法によりレジスト剤(ヘレウス社製、商品名“Clvious SET S”)を印刷し、その後100℃で5分間加熱した。これにより、透明導電性膜上にレジスト膜を形成した。
<Formation of resist film>
First, a resist agent (made by Heraeus, trade name "Clvious SET S") is printed by a screen printing method on a 5 cm square area of the central portion of the main surface of the transparent conductive sheet on the transparent conductive film side, and then 100°C. Heated for 5 minutes. As a result, a resist film was formed on the transparent conductive film.
<導電性の低下>
次に、透明導電性膜上にレジスト膜が形成された透明導電性シートを、塩素系不活性剤(ヘレウス社製、商品名“Clvious Etch”)を10%水溶液に調製した溶液に20分間浸漬した後、蒸留水で洗浄し、100℃で5分間加熱した。これにより、透明導電性膜の露出部の導電性を低下させた。
<Reduction in conductivity>
Next, the transparent conductive sheet having a resist film formed on the transparent conductive film is dipped in a solution prepared by preparing a 10% aqueous solution of a chlorine-based deactivator (product name "Clvious Etch" manufactured by Heraeus) for 20 minutes. After that, it was washed with distilled water and heated at 100° C. for 5 minutes. This reduced the conductivity of the exposed portion of the transparent conductive film.
<レジスト膜の剥離>
次に、上記透明導電性シートをトルエンに3分間浸漬し、レジスト膜を剥離した後、蒸留水で洗浄し、100℃で5分間乾燥した。
<Removal of resist film>
Next, the transparent conductive sheet was immersed in toluene for 3 minutes, the resist film was peeled off, washed with distilled water, and dried at 100° C. for 5 minutes.
次に、得られた透明導電性シートの電気特性を評価した。評価方法については以下に説明する。 Next, the electrical characteristics of the obtained transparent conductive sheet were evaluated. The evaluation method will be described below.
<電気特性>
先ず、透明導電性シートの導電パターン形成面において、導電パターンが形成されている導電部の表面電気抵抗値を、三菱化学アナリテック社製の抵抗率測定計“Loresta−GP”(MCP−T610型)とLSPプローブを用いて測定した。また、透明導電性シートの導電パターン形成面において、導電パターンが形成されていない非導電部の表面電気抵抗値を、三菱化学アナリテック社製の抵抗率測定計“Hiresta−UP”(MCP−HT450型)とURSプローブを用いて測定した。ここでは、導電部と非導電部の表面電気抵抗値の差が、1×106Ω/スクエア以上である場合は、良好な電気的コントラストが得られていると評価する。
<Electrical characteristics>
First, on the conductive pattern forming surface of the transparent conductive sheet, the surface electrical resistance value of the conductive portion on which the conductive pattern is formed is measured by a resistivity measuring instrument “Loresta-GP” (MCP-T610 type manufactured by Mitsubishi Chemical Analytech Co., Ltd.). ) And an LSP probe. Further, on the conductive pattern forming surface of the transparent conductive sheet, the surface electric resistance value of the non-conductive portion where the conductive pattern is not formed is measured by a resistivity measuring instrument “Hiresta-UP” (MCP-HT450 manufactured by Mitsubishi Chemical Analytech Co., Ltd.). Type) and a URS probe. Here, when the difference between the surface electrical resistance values of the conductive portion and the non-conductive portion is 1×10 6 Ω/square or more, it is evaluated that good electrical contrast is obtained.
その結果、実施例1〜4の透明導電性シートでは、良好な電気的コントラストが得られたことが分かり、比較例1及び2の透明導電性シートでは、良好な電気的コントラストが得られなかったことが分かった。 As a result, it was found that good electrical contrast was obtained with the transparent conductive sheets of Examples 1 to 4, and good electrical contrast was not obtained with the transparent conductive sheets of Comparative Examples 1 and 2. I found out.
10、20、30 透明導電性シート
11、21 透明基材
31 PETフィルム
12、22、32、40 透明導電性膜
12a、22a、32a 疎水性樹脂
12b、22b、32b 導電性高分子
33 エポキシ樹脂層
41 非導電部
42 導電部
10, 20, 30 Transparent conductive sheet 11, 21 Transparent base material 31 PET film 12, 22, 32, 40 Transparent conductive film 12a, 22a, 32a Hydrophobic resin 12b, 22b, 32b Conductive polymer 33 Epoxy resin layer 41 Non-conductive part 42 Conductive part
Claims (9)
前記透明導電性膜は、導電性高分子と、疎水性樹脂とを含み、
前記疎水性樹脂は、複数の塊状体を形成し、
前記導電性高分子は、前記塊状体の間に配置されて、三次元的に連結し、
前記導電性高分子の一部が、前記透明導電性膜の表面にまで達していることを特徴とする透明導電性シート。 A transparent substrate, a transparent conductive sheet comprising a transparent conductive film formed on the main surface of the transparent substrate,
The transparent conductive film contains a conductive polymer and a hydrophobic resin,
The hydrophobic resin forms a plurality of lumps,
The conductive polymer is disposed between the lumps, three-dimensionally connected,
A transparent conductive sheet, wherein a part of the conductive polymer reaches the surface of the transparent conductive film.
導電性高分子と、疎水性樹脂と、溶媒とを含む透明導電性膜形成用塗布液を作製する工程と、
前記透明導電性膜形成用塗布液を透明基材の上に塗布して加熱することにより、前記透明基材の上に透明導電性膜を形成する工程とを含むことを特徴とする透明導電性シートの製造方法。 It is a manufacturing method of the transparent conductive sheet in any one of Claims 1-6, Comprising :
A step of producing a transparent conductive film-forming coating liquid containing a conductive polymer, a hydrophobic resin, and a solvent,
A step of forming a transparent conductive film on the transparent base material by applying the coating liquid for forming the transparent conductive film on a transparent base material and heating the same. Sheet manufacturing method.
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