JP6325364B2 - Transparent conductive coating composition, transparent conductive sheet and method for producing the same, and transparent conductive pattern forming method - Google Patents
Transparent conductive coating composition, transparent conductive sheet and method for producing the same, and transparent conductive pattern forming method Download PDFInfo
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- 239000008199 coating composition Substances 0.000 title claims description 46
- 238000000034 method Methods 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title description 6
- 239000002904 solvent Substances 0.000 claims description 33
- 229920001940 conductive polymer Polymers 0.000 claims description 27
- 239000002033 PVDF binder Substances 0.000 claims description 26
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 239000002798 polar solvent Substances 0.000 claims description 19
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- 239000007787 solid Substances 0.000 claims description 11
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229920000123 polythiophene Polymers 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 claims description 2
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- 239000005060 rubber Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 24
- 230000000052 comparative effect Effects 0.000 description 20
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- 238000005259 measurement Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000004815 dispersion polymer Substances 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
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- 239000000523 sample Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- LULAYUGMBFYYEX-UHFFFAOYSA-N 3-chlorobenzoic acid Chemical class OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical class CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
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- 125000000129 anionic group Chemical group 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
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- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical class ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- 229930192474 thiophene Natural products 0.000 description 1
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- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
本発明は、透明導電性コーティング組成物、透明導電性シート及びその製造方法、並びに透明導電パターン形成方法に関する。 The present invention relates to a transparent conductive coating composition, a transparent conductive sheet and a method for producing the same, and a transparent conductive pattern forming method.
近年、チオフェン系やアニリン系の高分子は優れた安定性及び導電性を有することから、有機導電性材料としてその活用が期待されている。その活用の一つとして、液晶ディスプレイ、透明タッチパネル等の各種デバイスに用いられる透明電極の形成に、上記高分子にドーパントを付加した導電性高分子を溶媒に分散させたコーティング組成物が用いられている。しかし、上記導電性高分子をコーティング組成物として使用し、このコーティング組成物を用いて基材上に導電性膜を形成した場合、導電性膜の硬さや導電性膜の基材への密着性が十分ではない。特に、基材がガラス等の非吸液性材料から形成されている場合、基材の透明性を損なわずに、十分な硬さの導電性膜を形成することは難しい。このような問題に対して、例えば、特許文献1では、透明導電性膜の硬度や透明導電性膜の基材への密着性を向上できるバインダが提案されている。 In recent years, thiophene-based and aniline-based polymers have excellent stability and conductivity, and are expected to be used as organic conductive materials. As one of the applications, a coating composition in which a conductive polymer in which a dopant is added to the above polymer is dispersed in a solvent is used to form a transparent electrode used in various devices such as a liquid crystal display and a transparent touch panel. Yes. However, when the conductive polymer is used as a coating composition and a conductive film is formed on the substrate using the coating composition, the hardness of the conductive film and the adhesion of the conductive film to the substrate Is not enough. In particular, when the substrate is formed from a non-liquid-absorbing material such as glass, it is difficult to form a sufficiently hard conductive film without impairing the transparency of the substrate. For example, Patent Document 1 proposes a binder that can improve the hardness of the transparent conductive film and the adhesion of the transparent conductive film to the base material.
特許文献1では、バインダとしてポリビニルアルコール(PVA)等の樹脂を用いることで、導電性膜の硬度、基材への密着性を改善できることが記載されている。しかし、得られた導電性膜の電気特性、光学特性、耐熱性及び耐湿性は十分ではなく、未だ改良の余地がある。 Patent Document 1 describes that the hardness of the conductive film and the adhesion to the substrate can be improved by using a resin such as polyvinyl alcohol (PVA) as the binder. However, the electrical properties, optical properties, heat resistance, and moisture resistance of the obtained conductive film are not sufficient, and there is still room for improvement.
本発明は、上記問題を解消するためになされたものであり、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を形成可能な透明導電性コーティング組成物を提供する。更に、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を有する透明導電性シート及びその製造方法、並びに導電パターン形成方法を提供する。 The present invention has been made to solve the above problems, and provides a transparent conductive coating composition capable of forming a transparent conductive film excellent in electrical characteristics, optical characteristics, heat resistance and moisture resistance. Furthermore, the present invention provides a transparent conductive sheet having a transparent conductive film excellent in electrical characteristics, optical characteristics, heat resistance and moisture resistance, a method for producing the same, and a method for forming a conductive pattern.
本発明の透明導電性コーティング組成物は、導電性高分子と、樹脂と、溶媒とを含む透明導電性コーティング組成物であって、前記樹脂は、ポリフッ化ビニリデンを含み、前記溶媒は、水、エタノール及び酢酸から選択される溶媒と、エチレングリコール、ジメチルスルホキシド、アセトニトリル及びアセトンから選択される溶媒とを含み、前記コーティング組成物中における前記ポリフッ化ビニリデンの分散粒子径は、0.3μm以下であり、前記導電性高分子の含有量は、前記コーティング組成物に含まれる全固形成分の質量に対して3質量%以上45質量%以下であり、前記非プロトン性極性溶媒の含有量は、前記溶媒の全質量に対して25質量%以上50質量%以下であること特徴とする。 The transparent conductive coating composition of the present invention is a transparent conductive coating composition containing a conductive polymer, a resin, and a solvent, wherein the resin contains polyvinylidene fluoride, and the solvent is water, A solvent selected from ethanol and acetic acid, and a solvent selected from ethylene glycol, dimethyl sulfoxide, acetonitrile and acetone, and the dispersion particle size of the polyvinylidene fluoride in the coating composition is 0.3 μm or less. In addition, the content of the conductive polymer is 3% by mass or more and 45% by mass or less with respect to the mass of all solid components contained in the coating composition, and the content of the aprotic polar solvent is the solvent It is characterized by being 25% by mass or more and 50% by mass or less based on the total mass of
本発明の透明導電性シートは、透明な基材と、前記基材の少なくとも一方の主面に形成された透明導電性膜とを含む透明導電性シートであって、前記透明導電性膜が、上記本発明の透明導電性コーティング組成物を用いて形成されていることを特徴とする。 The transparent conductive sheet of the present invention is a transparent conductive sheet comprising a transparent substrate and a transparent conductive film formed on at least one main surface of the substrate, and the transparent conductive film is It is formed using the transparent conductive coating composition of the present invention.
本発明の透明導電性シートの製造方法は、透明な基材の少なくとも一方の主面に、上記本発明の透明導電性コーティング組成物を塗布する工程と、前記透明導電性コーティング組成物を加熱することにより、透明導電性膜を形成する工程とを含むことを特徴とする。 The method for producing a transparent conductive sheet of the present invention includes a step of applying the transparent conductive coating composition of the present invention to at least one main surface of a transparent substrate, and heating the transparent conductive coating composition. And a step of forming a transparent conductive film.
本発明の導電パターン形成方法は、透明な基材上に導電パターンを形成する導電パターン形成方法であって、前記基材の一方の主面に、上記本発明の透明導電性コーティング組成物を塗布して透明導電性膜を形成する工程と、前記透明導電性膜上の導電パターンを形成する位置にレジスト膜を形成する工程と、導電性を失活させる不活性剤を用いて、前記レジスト膜をマスクとして、前記透明導電性膜の露出部の導電性を失活させる工程とを含むことを特徴とする。 The conductive pattern forming method of the present invention is a conductive pattern forming method of forming a conductive pattern on a transparent substrate, and the transparent conductive coating composition of the present invention is applied to one main surface of the substrate. Forming a transparent conductive film, forming a resist film at a position where a conductive pattern is formed on the transparent conductive film, and using an inert agent to deactivate the conductive film, the resist film And a step of deactivating the conductivity of the exposed portion of the transparent conductive film.
本発明の透明導電性コーティング組成物によれば、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を有する透明導電性シートを提供できる。 According to the transparent conductive coating composition of the present invention, a transparent conductive sheet having a transparent conductive film excellent in electrical properties, optical properties, heat resistance and moisture resistance can be provided.
(透明導電性コーティング組成物)
本発明の透明導電性コーティング組成物は、導電性高分子と、樹脂と、溶媒とを含んでいる。また、上記樹脂は、ポリフッ化ビニリデンを含み、上記溶媒は、プロトン性極性溶媒と、非プロトン性極性溶媒とを含んでいる。更に、上記コーティング組成物中における上記ポリフッ化ビニリデンの分散粒子径は、0.3μm以下であり、上記導電性高分子の含有量は、上記コーティング組成物に含まれる全固形成分の質量に対して3質量%以上45質量%以下であり、上記非プロトン性極性溶媒の含有量は、上記溶媒の全質量に対して25質量%以上50質量%以下である。
(Transparent conductive coating composition)
The transparent conductive coating composition of the present invention contains a conductive polymer, a resin, and a solvent. The resin contains polyvinylidene fluoride, and the solvent contains a protic polar solvent and an aprotic polar solvent. Furthermore, the dispersed particle diameter of the polyvinylidene fluoride in the coating composition is 0.3 μm or less, and the content of the conductive polymer is based on the mass of all solid components contained in the coating composition. It is 3 mass% or more and 45 mass% or less, and content of the said aprotic polar solvent is 25 mass% or more and 50 mass% or less with respect to the total mass of the said solvent.
上記透明導電性コーティング組成物を用いることにより、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を形成できる。 By using the transparent conductive coating composition, a transparent conductive film excellent in electrical characteristics, optical characteristics, heat resistance and moisture resistance can be formed.
<導電性高分子>
導電性高分子とは、Conductive Polymers(CPs)と呼ばれる高分子であり、ドーパントによるドーピングによって、ポリラジカルカチオニック塩又はポリラジカルアニオニック塩が形成された状態で、それ自体が導電性を発揮し得る高分子をいう。
<Conductive polymer>
The conductive polymer is a polymer called Conductive Polymers (CPs), which exhibits conductivity in a state where a polyradical cationic salt or a polyradical anionic salt is formed by doping with a dopant. It refers to the polymer obtained.
本発明では、上記導電性高分子として、ポリチオフェン系化合物とドーパントとを含むものを用いる。本発明における導電性高分子としては、ポリチオフェン系化合物としてポリ(3,4−エチレンジオキシチオフェン)と、ドーパントとしてポリスチレンスルホン酸とを含む混合物(PEDOT/PSSともいう。)を用いることができる。 In the present invention, the conductive polymer containing a polythiophene compound and a dopant is used. As the conductive polymer in the present invention, a mixture (also referred to as PEDOT / PSS) containing poly (3,4-ethylenedioxythiophene) as a polythiophene compound and polystyrene sulfonic acid as a dopant can be used.
上記導電性高分子の含有量は、上記コーティング組成物に含まれる全固形成分の質量に対して3質量%以上45質量%以下に設定する。上記導電性高分子の含有量が、上記コーティング組成物に含まれる全固形成分の質量に対して3質量%を下回ると透明導電性膜の導電性が低下し、45質量%を超えると透明導電性膜の耐湿性が低下する。 Content of the said conductive polymer is set to 3 mass% or more and 45 mass% or less with respect to the mass of all the solid components contained in the said coating composition. When the content of the conductive polymer is less than 3% by mass with respect to the mass of all solid components contained in the coating composition, the conductivity of the transparent conductive film is reduced. The moisture resistance of the conductive film decreases.
<樹脂>
本発明の透明導電性コーティング組成物を構成する樹脂には、ポリフッ化ビニリデン(PVDF)が含まれる。上記PVDFは、バインダとしての役割を果たすものであり、これにより透明導電性膜と基材との密着性を向上できる。上記PVDFは、本発明の透明導電性コーティング組成物を用いて形成される透明導電性膜中に均一に分散させて透光性を向上させるため、上記コーティング組成物中における分散粒子径は0.3μm以下に設定される。上記PVDFを乳化重合により形成することにより、その分散粒子径を0.3μm以下にすることができる。本発明において、PVDFの分散粒子径は、動的光散乱法の粒度分布系により測定することができる。例えば、コールター社製の粒度分布測定装置“N4 Plus”を用い、希釈溶媒として蒸留水を使用して測定することができる。
<Resin>
The resin constituting the transparent conductive coating composition of the present invention includes polyvinylidene fluoride (PVDF). The PVDF plays a role as a binder, thereby improving the adhesion between the transparent conductive film and the substrate. Since the PVDF is uniformly dispersed in a transparent conductive film formed using the transparent conductive coating composition of the present invention to improve translucency, the dispersed particle size in the coating composition is 0.00. It is set to 3 μm or less. By forming the PVDF by emulsion polymerization, the dispersed particle diameter can be reduced to 0.3 μm or less. In the present invention, the dispersed particle size of PVDF can be measured by a particle size distribution system of a dynamic light scattering method. For example, measurement can be performed using a particle size distribution measuring device “N4 Plus” manufactured by Coulter, Inc. using distilled water as a diluent solvent.
上記樹脂には、PVDF以外にフッ化ビニリデン−アクリル共重合体、フッ化ビニリデン−ヘキサフルオロプロピレン共重合体、ヒドロキシエチルセルロース、ポリビニルアルコール、ポリエチレンオキサイド、シラン化合物、ポリエステルエマルジョン、ポリオレフィンエマルジョン等の樹脂を含んでいてもよい。 In addition to PVDF, the above resins include resins such as vinylidene fluoride-acrylic copolymer, vinylidene fluoride-hexafluoropropylene copolymer, hydroxyethyl cellulose, polyvinyl alcohol, polyethylene oxide, silane compound, polyester emulsion, and polyolefin emulsion. You may go out.
上記PVDFの含有量は、上記コーティング組成物に含まれる全固形成分の質量に対して55質量%以上97質量%以下であることが好ましい。上記PVDFの含有量が少なすぎると、形成した透明導電性膜の基材への密着性が低下し、また透明導電性膜に亀裂が発生しやすい傾向にある。また、上記PVDFの含有量が多すぎると電気特性が悪化する傾向にある。 The PVDF content is preferably 55% by mass or more and 97% by mass or less with respect to the mass of all solid components contained in the coating composition. When there is too little content of the said PVDF, it exists in the tendency for the adhesiveness to the base material of the formed transparent conductive film to fall, and to be easy to generate | occur | produce a crack in a transparent conductive film. Moreover, when there is too much content of the said PVDF, it exists in the tendency for an electrical property to deteriorate.
<溶媒>
本発明の透明導電性コーティング組成物を構成する溶媒には、プロトン性極性溶媒と非プロトン性極性溶媒とを含んでいる。プロトン性極性溶媒と非プロトン性極性溶媒とを併用することにより、比較的低い乾燥温度で透明性に優れた透明導電膜を得ることができる。
<Solvent>
The solvent constituting the transparent conductive coating composition of the present invention includes a protic polar solvent and an aprotic polar solvent. By using a protic polar solvent and an aprotic polar solvent in combination, a transparent conductive film excellent in transparency can be obtained at a relatively low drying temperature.
上記プロトン性極性溶媒としては、例えば、水、エタノール、酢酸等が挙げられ、上記非プロトン性極性溶媒としては、エチレングリコール、ジメチルスルホキシド、アセトニトリル、アセトン等が挙げられる。 Examples of the protic polar solvent include water, ethanol, acetic acid, and the like, and examples of the aprotic polar solvent include ethylene glycol, dimethyl sulfoxide, acetonitrile, acetone, and the like.
上記非プロトン性極性溶媒の含有量は、上記溶媒の全質量に対して25質量%以上50質量%以下に設定される。上記非プロトン性極性溶媒の含有量が、上記溶媒の全質量に対して25質量%を下回ると透明導電性膜の光学特性が低下し、50質量%を超えると透明導電性膜の耐湿性が低下する。 The content of the aprotic polar solvent is set to 25% by mass or more and 50% by mass or less with respect to the total mass of the solvent. When the content of the aprotic polar solvent is less than 25% by mass with respect to the total mass of the solvent, the optical properties of the transparent conductive film are deteriorated, and when it exceeds 50% by mass, the moisture resistance of the transparent conductive film is decreased. descend.
上記溶媒の含有量は特に限定されないが、本発明の透明導電性コーティング組成物の全質量に対して、70質量%以上99.5質量%以下とすればよい。また、上記溶媒には、無極性溶媒を含んでいてもよい。 Although content of the said solvent is not specifically limited, What is necessary is just to be 70 mass% or more and 99.5 mass% or less with respect to the total mass of the transparent conductive coating composition of this invention. The solvent may contain a nonpolar solvent.
本発明の透明導電性コーティング組成物の調製方法は、特に限定されず、上記導電性高分子、上記樹脂、上記溶媒を公知の手法により適宜混合すればよい。 The method for preparing the transparent conductive coating composition of the present invention is not particularly limited, and the conductive polymer, the resin, and the solvent may be appropriately mixed by a known method.
(透明導電性シート)
本発明の透明導電性シートは、透明な基材と、上記基材の少なくとも一方の主面に形成された透明導電性膜とを備え、上記透明導電性膜が、上記本発明の透明導電性コーティング組成物を用いて形成されている。
(Transparent conductive sheet)
The transparent conductive sheet of the present invention comprises a transparent substrate and a transparent conductive film formed on at least one main surface of the substrate, and the transparent conductive film is the transparent conductive film of the present invention. It is formed using a coating composition.
上記透明導電性コーティング組成物を用いることにより、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を有する透明導電性シートを提供可能である。 By using the transparent conductive coating composition, it is possible to provide a transparent conductive sheet having a transparent conductive film excellent in electrical characteristics, optical characteristics, heat resistance and moisture resistance.
上記基材としては、例えば、プラスチック、ゴム、ガラス、セラミックス等の種々のものが使用できる。 As said base material, various things, such as a plastics, rubber | gum, glass, ceramics, can be used, for example.
本発明の透明導電性膜の表面抵抗値は、500Ω/スクエア以下であることが好ましい。表面抵抗値が小さいほど良好な電気特性を示す。 The surface resistance value of the transparent conductive film of the present invention is preferably 500 Ω / square or less. The smaller the surface resistance, the better the electrical characteristics.
上記透明導電性膜の波長範囲380〜780nmにおける全光線透過率は、85%以上であることが好ましく、より好ましくは88%以上である。全光線透過率が高いほど良好な光学特性を示す。上記全光線透過率は、分光光度計、例えば、日本分光社製の“V−570”により測定可能である。 The total light transmittance in the wavelength range of 380 to 780 nm of the transparent conductive film is preferably 85% or more, and more preferably 88% or more. The higher the total light transmittance, the better the optical properties. The total light transmittance can be measured with a spectrophotometer, for example, “V-570” manufactured by JASCO Corporation.
本発明の透明導電性膜の膜厚は、用途に応じて適宜設定されるものであるが、通常、0.01〜10μm程度である。膜厚が薄すぎても厚すぎても、均一な透明導電性膜を形成することが困難となる。前述の透明導電性コーティング組成物中に含まれる導電性高分子の割合にもよるが、膜厚が薄いと、表面抵抗値が増加する傾向にあり、膜厚が厚すぎると、全光線透過率が低下する傾向にある。 Although the film thickness of the transparent conductive film of this invention is suitably set according to a use, it is about 0.01-10 micrometers normally. If the film thickness is too thin or too thick, it becomes difficult to form a uniform transparent conductive film. Although depending on the proportion of the conductive polymer contained in the transparent conductive coating composition, the surface resistance tends to increase when the film thickness is thin, and the total light transmittance is increased when the film thickness is too thick. Tend to decrease.
(透明導電性シートの製造方法)
本発明の透明導電性シートの製造方法は、透明な基材の少なくとも一方の主面に上記本発明の透明導電性コーティング組成物を塗布する工程と、上記透明導電性コーティング組成物を加熱することにより、透明導電性膜を形成する工程とを備えている。これにより、電気特性、光学特性、耐熱性及び耐湿性に優れた透明導電性膜を有する透明導電性シートを製造できる。
(Transparent conductive sheet manufacturing method)
The method for producing a transparent conductive sheet of the present invention includes a step of applying the transparent conductive coating composition of the present invention to at least one main surface of a transparent substrate, and heating the transparent conductive coating composition. And a step of forming a transparent conductive film. Thereby, the transparent conductive sheet which has a transparent conductive film excellent in an electrical property, an optical characteristic, heat resistance, and moisture resistance can be manufactured.
上記透明導電性コーティング組成物を塗布する方法としては、例えば、バーコート法、リバース法、グラビア印刷法、マイクログラビア印刷法、ディッピング法、スピンコート法、スプレー法等の塗布方法を用いることができる。 As a method for applying the transparent conductive coating composition, for example, a coating method such as a bar coating method, a reverse method, a gravure printing method, a micro gravure printing method, a dipping method, a spin coating method, or a spray method can be used. .
上記加熱は、透明導電性コーティング組成物中の溶媒成分が蒸発する条件であればよく、100〜150℃で5〜60分間行うことが好ましい。溶媒が透明導電膜に残っていると強度が劣る傾向にある。加熱方法としては、例えば、熱風乾燥法等を用いることができる。 The heating may be performed under the condition that the solvent component in the transparent conductive coating composition evaporates, and is preferably performed at 100 to 150 ° C. for 5 to 60 minutes. If the solvent remains in the transparent conductive film, the strength tends to be inferior. As the heating method, for example, a hot air drying method or the like can be used.
(導電パターン形成方法)
本発明の導電パターン形成方法は、透明な基材上に導電パターンを形成する方法であり、上記基材の一方の主面に、上記本発明の透明導電性コーティング組成物を塗布して透明導電性膜を形成する工程と、上記透明導電性膜上の導電パターンを形成する位置にレジスト膜を形成する工程と、導電性を失活させる不活性剤を用いて、上記レジスト膜をマスクとして、上記透明導電性膜の露出部の導電性を失活させる工程とを備えている。これにより、簡単且つ安価に高精度の導電パターンを形成できる。
(Conductive pattern formation method)
The conductive pattern forming method of the present invention is a method of forming a conductive pattern on a transparent substrate, and the transparent conductive coating composition of the present invention is applied to one main surface of the substrate to form a transparent conductive layer. A step of forming a conductive film, a step of forming a resist film at a position where a conductive pattern on the transparent conductive film is formed, and an inert agent that deactivates the conductivity, using the resist film as a mask, And a step of deactivating the conductivity of the exposed portion of the transparent conductive film. Thereby, a highly accurate conductive pattern can be formed easily and inexpensively.
上記レジスト膜は、例えば、レジスト剤を上記透明導電性膜上にスクリーン印刷することにより形成できる。上記レジスト剤は特に限定されず、適宜選択できる。 The resist film can be formed, for example, by screen printing a resist agent on the transparent conductive film. The said resist agent is not specifically limited, It can select suitably.
上記不活性剤としては、導電性高分子を失活できるものであればよく、例えば、酸化性化合物、塩基性化合物が挙げられる。 The inactive agent is not particularly limited as long as it can deactivate the conductive polymer, and examples thereof include an oxidizing compound and a basic compound.
上記酸化性化合物としては、例えば、過酸化水素系化合物、過塩素酸系化合物、次亜塩素酸系化合物、過酢酸系化合物、メタクロロ安息香酸系化合物、亜硫酸系化合物等が挙げられる。 Examples of the oxidizing compound include hydrogen peroxide compounds, perchloric acid compounds, hypochlorous acid compounds, peracetic acid compounds, metachlorobenzoic acid compounds, sulfite compounds, and the like.
上記塩基性化合物としては、例えば、アンモニア、モノメチルアミン、ジメチルアミン、トリメチルアミン、モノエチルアミン、ジエチルアミン、トリエチルアミン、ピリジン、4−メチルピリジン、水酸化テトラメチルアンモニウム等が挙げられる。 Examples of the basic compound include ammonia, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, pyridine, 4-methylpyridine, and tetramethylammonium hydroxide.
以下、実施例を用いて本発明を詳細に述べる。但し、本発明は以下の実施例に限定されるものではない。特に指摘がない場合、下記において、「部」は「質量部」を意味する。 Hereinafter, the present invention will be described in detail using examples. However, the present invention is not limited to the following examples. Unless otherwise indicated, in the following, “part” means “part by mass”.
(実施例1)
<透明導電性コーティング液の調製>
先ず、以下の成分を添加、混合して透明導電性コーティング液を調製した。調製した下記透明導電性コーティング液に含まれるPVDFの分散粒子径は0.3μm以下であった。
(1)導電性高分子分散液(ヘレウス社製、商品名“PH−500”、導電性高分子:PEDOT−PSS、固形分濃度:1.0質量%、溶媒:水):2.5部
(2)樹脂分散液(樹脂:PVDF、PVDFの平均分散粒子径:0.2μm、固形分濃度:20質量%、溶媒:水):2.4部
(3)プロトン性極性溶媒(エタノール):1.2部
(4)非プロトン性極性溶媒(エチレングリコール):3.9部
Example 1
<Preparation of transparent conductive coating solution>
First, the following components were added and mixed to prepare a transparent conductive coating solution. The dispersion particle diameter of PVDF contained in the prepared transparent conductive coating liquid below was 0.3 μm or less.
(1) Conductive polymer dispersion (manufactured by Heraeus, trade name “PH-500”, conductive polymer: PEDOT-PSS, solid content concentration: 1.0 mass%, solvent: water): 2.5 parts (2) Resin dispersion (resin: PVDF, PVDF average dispersion particle size: 0.2 μm, solid content concentration: 20 mass%, solvent: water): 2.4 parts (3) Protic polar solvent (ethanol): 1.2 parts (4) aprotic polar solvent (ethylene glycol): 3.9 parts
<透明導電性シートの形成>
次に、厚さ0.7mmの10cm角の無アルカリガラス(全光線透過率:91.2%)を基板として用い、基板の一方の主面に上記透明導電性コーティング液をスピンコーティング法により回転速度800rpmで、30秒間塗布し、その後100℃で5分間加熱した。これにより、一方の主面に透明導電膜性膜が形成された実施例1の透明導電性シートを作製した。上記透明導電性膜の膜厚は、0.5μmであった。
<Formation of transparent conductive sheet>
Next, a 10 cm square non-alkali glass (total light transmittance: 91.2%) having a thickness of 0.7 mm is used as a substrate, and the transparent conductive coating solution is rotated on one main surface of the substrate by a spin coating method. It was applied at a speed of 800 rpm for 30 seconds, and then heated at 100 ° C. for 5 minutes. This produced the transparent conductive sheet of Example 1 in which the transparent conductive film was formed on one main surface. The film thickness of the transparent conductive film was 0.5 μm.
(実施例2)
透明導電性コーティング液のプロトン性極性溶媒をエタノールと水との質量比50:50の混合溶媒に変更した以外は、実施例1と同様にして実施例2の透明導電性シートを作製した。
(Example 2)
A transparent conductive sheet of Example 2 was produced in the same manner as in Example 1 except that the protic polar solvent of the transparent conductive coating solution was changed to a mixed solvent of 50:50 mass ratio of ethanol and water.
(実施例3)
透明導電性コーティング液の非プロトン性極性溶媒をジメチルスルホキシドに変更した以外は、実施例1と同様にして実施例3の透明導電性シートを作製した。
(Example 3)
A transparent conductive sheet of Example 3 was produced in the same manner as in Example 1 except that the aprotic polar solvent of the transparent conductive coating solution was changed to dimethyl sulfoxide.
(実施例4)
基板を厚さ100μmのポリエチレンテレフタレートフィルム(東洋紡社製、商品名“コスモシャインA4300”)に変更した以外は、実施例1と同様にして実施例4の透明導電性シートを作製した。
Example 4
A transparent conductive sheet of Example 4 was produced in the same manner as in Example 1 except that the substrate was changed to a polyethylene terephthalate film having a thickness of 100 μm (trade name “Cosmo Shine A4300” manufactured by Toyobo Co., Ltd.).
(実施例5)
透明導電性コーティング液の各成分の量を下記のように変更した以外は、実施例1と同様にして実施例5の透明導電性シートを作製した。
(1)導電性高分子分散液:10.0部
(2)樹脂分散液:2.0部
(3)プロトン性極性溶媒:3.0部
(4)非プロトン性極性溶媒:10.0部
(Example 5)
A transparent conductive sheet of Example 5 was produced in the same manner as in Example 1 except that the amount of each component of the transparent conductive coating liquid was changed as follows.
(1) Conductive polymer dispersion: 10.0 parts (2) Resin dispersion: 2.0 parts (3) Protic polar solvent: 3.0 parts (4) Aprotic polar solvent: 10.0 parts
(実施例6)
透明導電性コーティング液の非プロトン性極性溶媒の量を2.2部に変更した以外は、実施例1と同様にして実施例6の透明導電性シートを作製した。
(Example 6)
A transparent conductive sheet of Example 6 was produced in the same manner as in Example 1 except that the amount of the aprotic polar solvent in the transparent conductive coating liquid was changed to 2.2 parts.
(比較例1)
透明導電性コーティング液の樹脂分散液に含まれるPVDFの平均分散粒子径を0.5μmに変更した以外は、実施例1と同様にして比較例1の透明導電性シートを作製した。比較例1で調製した透明導電性コーティング液に含まれるPVDFの分散粒子径は0.3μmを超えるものが存在する。
(Comparative Example 1)
A transparent conductive sheet of Comparative Example 1 was produced in the same manner as in Example 1 except that the average dispersed particle size of PVDF contained in the resin dispersion of the transparent conductive coating liquid was changed to 0.5 μm. The dispersion particle diameter of PVDF contained in the transparent conductive coating liquid prepared in Comparative Example 1 exceeds 0.3 μm.
(比較例2)
透明導電性コーティング液の樹脂分散液の分散樹脂をPVDFからテトラエトキシシランに変更した以外は、実施例1と同様にして比較例2の透明導電性シートを作製した。
(Comparative Example 2)
A transparent conductive sheet of Comparative Example 2 was prepared in the same manner as in Example 1 except that the dispersion resin of the resin dispersion of the transparent conductive coating liquid was changed from PVDF to tetraethoxysilane.
(比較例3)
透明導電性コーティング液の樹脂分散液の分散樹脂をPVDFからポリエチレンオキサイド(明星化学社製、商品名“アルコックスE−45”)に変更した以外は、実施例1と同様にして比較例3の透明導電性シートを作製した。
(Comparative Example 3)
Comparative Example 3 was the same as Example 1 except that the dispersion resin of the transparent conductive coating liquid resin dispersion was changed from PVDF to polyethylene oxide (trade name “Alcox E-45” manufactured by Meisei Chemical Co., Ltd.). A transparent conductive sheet was produced.
(比較例4)
透明導電性コーティング液の各成分の量を下記のように変更した以外は、実施例1と同様にして比較例4の透明導電性シートを作製した。
(1)導電性高分子分散液:25.0部
(2)樹脂分散液:1.3部
(3)プロトン性極性溶媒:6.6部
(4)非プロトン性極性溶媒:29.7部
(Comparative Example 4)
A transparent conductive sheet of Comparative Example 4 was produced in the same manner as in Example 1 except that the amount of each component of the transparent conductive coating liquid was changed as follows.
(1) Conductive polymer dispersion: 25.0 parts (2) Resin dispersion: 1.3 parts (3) Protic polar solvent: 6.6 parts (4) Aprotic polar solvent: 29.7 parts
(比較例5)
透明導電性コーティング液の非プロトン性極性溶媒の量を1.0部に変更した以外は、実施例1と同様にして比較例5の透明導電性シートを作製した。
(Comparative Example 5)
A transparent conductive sheet of Comparative Example 5 was produced in the same manner as in Example 1 except that the amount of the aprotic polar solvent in the transparent conductive coating liquid was changed to 1.0 part.
(比較例6)
透明導電性コーティング液の非プロトン性極性溶媒の量を6.7部に変更した以外は、実施例1と同様にして比較例6の透明導電性シートを作製した。
(Comparative Example 6)
A transparent conductive sheet of Comparative Example 6 was produced in the same manner as in Example 1 except that the amount of the aprotic polar solvent in the transparent conductive coating liquid was changed to 6.7 parts.
表1に、実施例1〜6及び比較例1〜6で用いた透明導電性コーティング液に含まれる導電性高分子の全固形成分に対する質量割合(導電性高分子/全固形成分)及び上記透明導電性コーティング液に用いた溶媒に含まれる非プロトン性極性溶媒の全溶媒に対する質量割合(非プロトン性極性溶媒/全溶媒)を示した。 In Table 1, the mass ratio (conductive polymer / total solid component) to the total solid component of the conductive polymer contained in the transparent conductive coating liquids used in Examples 1 to 6 and Comparative Examples 1 to 6 and the above transparent The mass ratio of the aprotic polar solvent contained in the solvent used for the conductive coating solution to the total solvent (aprotic polar solvent / total solvent) is shown.
次に、上記で得られた透明導電性シートについて、下記に示す各評価を行った。 Next, each evaluation shown below was performed about the transparent conductive sheet obtained above.
<電気特性>
透明導電性シートの電気特性は、下記のように透明導電性シートの透明導電性膜の表面抵抗値を測定することで評価した。
<Electrical characteristics>
The electrical characteristics of the transparent conductive sheet were evaluated by measuring the surface resistance value of the transparent conductive film of the transparent conductive sheet as follows.
透明導電性シートの透明導電性膜の表面抵抗値は、三菱化学アナリテック社製の抵抗率測定装置“Loresta−GP”(MCP−T610型)とLSPプローブを用いて測定した。また、その測定の結果、上記抵抗率測定装置の表面抵抗値が“OVER”と表示された場合には、上記表面抵抗値を三菱化学アナリテック社製の抵抗率測定装置“Hiresta−UP”(MCP−HT450型)とURSPプローブを用いて測定した。 The surface resistance value of the transparent conductive film of the transparent conductive sheet was measured using a resistivity measuring apparatus “Loresta-GP” (MCP-T610 type) manufactured by Mitsubishi Chemical Analytech Co., Ltd. and an LSP probe. As a result of the measurement, when the surface resistance value of the resistivity measuring device is displayed as “OVER”, the surface resistance value is set to the resistivity measuring device “Hiresta-UP” (manufactured by Mitsubishi Chemical Analytech Co., Ltd.). MCP-HT450 type) and URSP probe.
上記測定の結果、表面抵抗値が500Ω/スクエア以下の場合、電気特性は良好と判断し、表面抵抗値が500Ω/スクエアより大きい場合、電気特性は不良と判断した。 As a result of the measurement, when the surface resistance value was 500 Ω / square or less, it was determined that the electrical characteristics were good, and when the surface resistance value was greater than 500 Ω / square, the electrical characteristics were determined to be poor.
<光学特性>
透明導電性シートの光学特性は、下記のように透明導電性シートのヘイズを測定することで評価した。
<Optical characteristics>
The optical characteristics of the transparent conductive sheet were evaluated by measuring the haze of the transparent conductive sheet as follows.
透明導電性シートのヘイズは、日本分光社製の分光光度計"V−570"を用いて測定した。具体的には、積分球“ILN−472”を組み合わせ、ヘイズ値計算モードで、レスポンスがFast、バンド幅が2.0nm、近赤外バンド幅が8.0nm、走査速度が400nm/分の条件で波長範囲380〜780nmにおける光透過スペクトルを測定し、該光透過スペクトルの測定結果を用いて、C光源、視野2度の条件でヘイズを算出した。 The haze of the transparent conductive sheet was measured using a spectrophotometer “V-570” manufactured by JASCO Corporation. Specifically, the integrating sphere “ILN-472” is combined, and in the haze value calculation mode, the response is Fast, the bandwidth is 2.0 nm, the near infrared bandwidth is 8.0 nm, and the scanning speed is 400 nm / min. Then, a light transmission spectrum in a wavelength range of 380 to 780 nm was measured, and using the measurement result of the light transmission spectrum, haze was calculated under the conditions of a C light source and a visual field of 2 degrees.
上記測定の結果、ヘイズが1.0%以下の場合、光学特性は良好と判断し、ヘイズが1.0%を上回った場合、光学特性は不良と判断した。 As a result of the above measurement, when the haze was 1.0% or less, it was judged that the optical characteristics were good, and when the haze exceeded 1.0%, the optical characteristics were judged to be poor.
<耐熱性>
透明導電性シートの耐熱性は、下記のように透明導電性シートの保存試験を行うことで評価した。
<Heat resistance>
The heat resistance of the transparent conductive sheet was evaluated by conducting a storage test of the transparent conductive sheet as follows.
先ず、透明導電性シートの透明導電性膜の初期の表面抵抗値を前述の電気特性の評価と同様にして測定した。次に、透明導電性シートを恒温槽に入れて85℃で240時間保存した。続いて、保存後の透明導電性シートの透明導電性膜の表面抵抗値を上記と同様にして測定した。最後に、下記式(1)により表面抵抗値の変化度を算出した。
表面抵抗値の変化度=保存後の表面抵抗値/初期の表面抵抗値 (1)
First, the initial surface resistance value of the transparent conductive film of the transparent conductive sheet was measured in the same manner as in the evaluation of the electrical characteristics described above. Next, the transparent conductive sheet was placed in a thermostatic bath and stored at 85 ° C. for 240 hours. Subsequently, the surface resistance value of the transparent conductive film of the transparent conductive sheet after storage was measured in the same manner as described above. Finally, the degree of change in the surface resistance value was calculated by the following formula (1).
Change in surface resistance value = surface resistance value after storage / initial surface resistance value (1)
上記測定の結果、表面抵抗値の変化度が1.2以下の場合、耐熱性は良好と判断し、表面抵抗値の変化度が1.2を上回った場合、耐熱性は不良と判断した。 As a result of the measurement, when the degree of change in the surface resistance value was 1.2 or less, the heat resistance was judged to be good, and when the degree of change in the surface resistance value exceeded 1.2, the heat resistance was judged to be poor.
<耐湿性>
透明導電性シートの耐湿性は、下記のように透明導電性シートの保存試験を行うことで評価した。
<Moisture resistance>
The moisture resistance of the transparent conductive sheet was evaluated by conducting a storage test of the transparent conductive sheet as follows.
先ず、透明導電性シートの透明導電性膜の初期の表面抵抗値を前述の電気特性の評価と同様にして測定した。次に、透明導電性シートを恒温恒湿槽に入れて60℃、相対湿度90%で240時間保存した。続いて、保存後の透明導電性シートの透明導電性膜の表面抵抗値を上記と同様にして測定した。最後に、前述の式(1)により表面抵抗値の変化度を算出した。 First, the initial surface resistance value of the transparent conductive film of the transparent conductive sheet was measured in the same manner as in the evaluation of the electrical characteristics described above. Next, the transparent conductive sheet was placed in a constant temperature and humidity chamber and stored at 60 ° C. and a relative humidity of 90% for 240 hours. Subsequently, the surface resistance value of the transparent conductive film of the transparent conductive sheet after storage was measured in the same manner as described above. Finally, the degree of change in the surface resistance value was calculated by the above-described equation (1).
上記測定の結果、表面抵抗値の変化度が1.2以下の場合、耐湿性は良好と判断し、表面抵抗値の変化度が1.2を上回った場合、耐湿性は不良と判断した。 As a result of the measurement, when the degree of change in the surface resistance value was 1.2 or less, it was judged that the moisture resistance was good, and when the degree of change in the surface resistance value exceeded 1.2, the moisture resistance was judged as poor.
上記評価の結果を表2に示す。 The results of the evaluation are shown in Table 2.
表2から、本発明の透明導電性コーティング液を用いて作製した実施例1〜6の透明導電性シートは、電気特性、光学特性、耐熱性及び耐湿性の全てで良好との評価を得たことが分かる。 From Table 2, the transparent conductive sheets of Examples 1 to 6 produced using the transparent conductive coating liquid of the present invention obtained evaluations that were good in all of electric characteristics, optical characteristics, heat resistance and moisture resistance. I understand that.
一方、透明導電性コーティング液に含まれるPVDFの分散粒子径が0.3μmを超えたものが存在する比較例1では光学特性が劣り、透明導電性コーティング液に含まれる分散樹脂をPVDFからテトラエトキシシランに変更した比較例2では耐熱性が劣り、透明導電性コーティング液に含まれる分散樹脂をPVDFからポリエチレンオキサイドに変更した比較例3では耐熱性及び耐湿性が劣り、透明導電性コーティング液に含まれる導電性高分子の全固形成分に対する質量割合が45質量%を超えた比較例4では耐湿性が劣り、透明導電性コーティング液に用いた溶媒に含まれる非プロトン性極性溶媒の全溶媒に対する質量割合が25質量%を下回った比較例5では光学特性が劣り、透明導電性コーティング液に用いた溶媒に含まれる非プロトン性極性溶媒の全溶媒に対する質量割合が50質量%を超えた比較例6では電気特性及び耐湿性が劣った。 On the other hand, in Comparative Example 1 where the dispersion particle diameter of PVDF contained in the transparent conductive coating liquid exceeds 0.3 μm, the optical properties are inferior, and the dispersion resin contained in the transparent conductive coating liquid is changed from PVDF to tetraethoxy. In Comparative Example 2 in which silane was changed, heat resistance was inferior, and in Comparative Example 3 in which the dispersion resin contained in the transparent conductive coating liquid was changed from PVDF to polyethylene oxide, heat resistance and moisture resistance were inferior and included in the transparent conductive coating liquid. In Comparative Example 4 in which the mass ratio of the conductive polymer to the total solid component exceeds 45 mass%, the moisture resistance is inferior, and the mass of the aprotic polar solvent contained in the solvent used in the transparent conductive coating liquid is based on the total solvent. In Comparative Example 5 in which the ratio was less than 25% by mass, the optical properties were inferior, and the non-contained solvent contained in the transparent conductive coating liquid was used. Weight percentage of the total solvent of protic polar solvents are poor electrical properties and moisture resistance in Comparative Example 6 exceeds 50 wt%.
Claims (6)
前記樹脂は、ポリフッ化ビニリデンを含み、
前記溶媒は、水、エタノール及び酢酸から選択される溶媒と、エチレングリコール、ジメチルスルホキシド、アセトニトリル及びアセトンから選択される溶媒とを含み、
前記コーティング組成物中における前記ポリフッ化ビニリデンの分散粒子径は、0.3μm以下であり、
前記導電性高分子の含有量は、前記コーティング組成物に含まれる全固形成分の質量に対して3質量%以上45質量%以下であり、
前記非プロトン性極性溶媒の含有量は、前記溶媒の全質量に対して25質量%以上50質量%以下であることを特徴とする透明導電性コーティング組成物。 A transparent conductive coating composition comprising a conductive polymer, a resin, and a solvent,
The resin includes polyvinylidene fluoride,
The solvent includes a solvent selected from water, ethanol and acetic acid, and a solvent selected from ethylene glycol, dimethyl sulfoxide, acetonitrile and acetone ,
The dispersion particle diameter of the polyvinylidene fluoride in the coating composition is 0.3 μm or less,
The content of the conductive polymer is 3% by mass or more and 45% by mass or less with respect to the mass of all solid components contained in the coating composition,
Wherein the non-content of the protonic polar solvent, a transparent conductive coating composition, wherein the total mass with respect to at most 50 wt% to 25 wt% of said solvent.
前記透明導電性膜が、請求項1又は2に記載の透明導電性コーティング組成物を用いて形成されていることを特徴とする透明導電性シート。 A transparent conductive sheet comprising a transparent substrate and a transparent conductive film formed on at least one main surface of the substrate,
The said transparent conductive film is formed using the transparent conductive coating composition of Claim 1 or 2, The transparent conductive sheet characterized by the above-mentioned.
前記透明導電性コーティング組成物を加熱することにより、透明導電性膜を形成する工程とを含むことを特徴とする透明導電性シートの製造方法。 Applying the transparent conductive coating composition according to claim 1 or 2 to at least one main surface of the transparent substrate;
And a step of forming a transparent conductive film by heating the transparent conductive coating composition.
前記基材の一方の主面に、請求項1又は2に記載の透明導電性コーティング組成物を塗布して透明導電性膜を形成する工程と、
前記透明導電性膜上の導電パターンを形成する位置にレジスト膜を形成する工程と、
導電性を失活させる不活性剤を用いて、前記レジスト膜をマスクとして、前記透明導電性膜の露出部の導電性を失活させる工程とを含むことを特徴とする導電パターン形成方法。 A conductive pattern forming method for forming a conductive pattern on a transparent substrate,
Applying the transparent conductive coating composition according to claim 1 or 2 to one main surface of the substrate to form a transparent conductive film;
Forming a resist film at a position to form a conductive pattern on the transparent conductive film;
And a step of deactivating the conductivity of the exposed portion of the transparent conductive film using an inert agent that deactivates the conductivity, using the resist film as a mask.
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