TW201927724A - Material for thermal spray, thermal spray coating using the same and manufacture methods thereof - Google Patents

Material for thermal spray, thermal spray coating using the same and manufacture methods thereof Download PDF

Info

Publication number
TW201927724A
TW201927724A TW107126592A TW107126592A TW201927724A TW 201927724 A TW201927724 A TW 201927724A TW 107126592 A TW107126592 A TW 107126592A TW 107126592 A TW107126592 A TW 107126592A TW 201927724 A TW201927724 A TW 201927724A
Authority
TW
Taiwan
Prior art keywords
thermal spray
spray coating
yttrium
plasma
thermal
Prior art date
Application number
TW107126592A
Other languages
Chinese (zh)
Other versions
TWI779071B (en
Inventor
李成煥
金茹郁
鄭彩鐘
高賢哲
Original Assignee
南韓商Komico有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商Komico有限公司 filed Critical 南韓商Komico有限公司
Publication of TW201927724A publication Critical patent/TW201927724A/en
Application granted granted Critical
Publication of TWI779071B publication Critical patent/TWI779071B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/50Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134Plasma spraying
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3217Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/44Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
    • C04B2235/444Halide containing anions, e.g. bromide, iodate, chlorite
    • C04B2235/445Fluoride containing anions, e.g. fluosilicate
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54Particle size related information
    • C04B2235/5418Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5436Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54Particle size related information
    • C04B2235/5418Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5445Particle size related information expressed by the size of the particles or aggregates thereof submicron sized, i.e. from 0,1 to 1 micron

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Medicinal Preparation (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

The present invention relates to a yttrium aluminum oxyfluoride spray coating material and, more particularly, to a spray coating material with excellent plasma resistance that is produced by mixing, assembling, and baking 30-70% by mass of yttrium fluoride (YF3) and a balance of alumina (Al2O3) and yttrium aluminum garnet (YAG), and to a spray coating.

Description

熱噴塗材料、其熱噴塗皮膜及其製造方法Thermal spraying material, thermal spraying film thereof and manufacturing method thereof

本發明涉及製造熱噴塗材料及熱噴塗皮膜的方法。The invention relates to a method for manufacturing a thermal spray material and a thermal spray coating.

在半導體製造步驟中,為了矽晶片等基板電路的高積體化所需的微細加工,電漿體乾式蝕刻步驟的重要性越來越重要。In the semiconductor manufacturing process, in order to perform the microfabrication required for the high integration of substrate circuits such as silicon wafers, the importance of the plasma dry etching step becomes more and more important.

為了在這種環境下使用,提出了將電漿體抵抗性優秀的材料用作腔室構件或將構件的表面用耐電漿體性優秀的物質形成皮膜而提高構件壽命的方案。In order to use it in such an environment, it is proposed to use a material having excellent resistance to plasma as a chamber member or to form a film on the surface of the member with a substance having excellent resistance to plasma to increase the life of the member.

其中,藉由用各種材料被覆基材的表面而賦予新的功能性的技術,以往已在多個領域利用。作為這種表面被覆技術之一,例如已知有將由陶瓷等材料構成的熱噴塗顆粒,藉助於燃燒或電能,以軟化或熔融狀態噴射於基材表面,從而形成熱噴塗皮膜的熱噴塗法。Among them, a technique for imparting new functionality by coating the surface of a substrate with various materials has been used in many fields in the past. As one of such surface coating technologies, for example, a thermal spray method is known in which thermal spray particles made of a material such as ceramics are sprayed on the surface of a substrate in a softened or molten state by means of combustion or electrical energy to form a thermal spray coating.

一般而言,熱噴塗塗布是藉由使微細的粉末加熱熔融,使熔融的粉末朝向母材的被塗布面噴射而執行。該噴射的熔融粉末被急劇冷卻,熔融粉末凝固,主要利用機械性結合力而層疊於該塗布對象面。Generally, thermal spray coating is performed by heating and melting a fine powder, and spraying the molten powder toward a coated surface of a base material. The sprayed molten powder is rapidly cooled, the molten powder is solidified, and it is laminated on the coating target surface mainly using a mechanical bonding force.

在該熱噴塗塗布中,利用高溫的電漿體火焰來熔融該粉末的電漿體熱噴塗塗布,在高熔點的諸如鎢或鉬的金屬和陶瓷的塗布中必須使用。該熱噴塗塗布不僅表現出保持母材的材質特性,有利於生產表現出耐磨損、耐腐蝕、耐熱及熱屏障、超硬、耐氧化、絕緣、摩擦特性、散熱、生物功能耐輻射性特性的高功能性材料,而且與化學氣相沉積或物理氣相沉積等其他塗布方法相比,可以在短時間內塗布寬闊面積的對象物。In this thermal spray coating, plasma thermal spray coating using a high-temperature plasma flame to melt the powder must be used in coating of metals and ceramics such as tungsten or molybdenum with high melting points. The thermal spray coating not only shows that it maintains the material characteristics of the base material, but also is beneficial to the production of wear resistance, corrosion resistance, heat resistance and thermal barrier, super hard, oxidation resistance, insulation, friction characteristics, heat dissipation, and biological function radiation resistance characteristics. Compared with other coating methods such as chemical vapor deposition or physical vapor deposition, it can coat a wide area of objects in a short time.

而且,在半導體裝置等的製造領域,一般藉助於使用氟、氯、溴等鹵素類氣體的電漿體的乾式蝕刻,進行在半導體基板表面實施微細加工。另外,在乾式蝕刻後,使用氧氣電漿體對取出半導體基板的腔室(真空容器)內部進行清潔。此時,在腔室內,暴露於反應性高的氧氣電漿體或鹵素氣體電漿體的構件存在被腐蝕的可能性。而且,如果腐蝕(侵蝕)部分從相應構件呈顆粒狀脫落,則這種顆粒附著於半導體基板,會成為導致電路缺陷的異物(以下將相應異物稱為顆粒)。Furthermore, in the manufacturing field of semiconductor devices and the like, micro-processing is generally performed on the surface of a semiconductor substrate by dry etching using a plasma of a halogen-based gas such as fluorine, chlorine, or bromine. In addition, after dry etching, the inside of the chamber (vacuum container) from which the semiconductor substrate was taken out was cleaned using an oxygen plasma. At this time, in the chamber, there is a possibility that the components exposed to the highly reactive oxygen plasma or halogen gas plasma may be corroded. In addition, if the corroded (eroded) portion comes off in a granular form from the corresponding member, such particles adhere to the semiconductor substrate and become foreign matter that causes circuit defects (hereinafter, the corresponding foreign matter is referred to as particles).

因此,自以往起,在半導體裝置製造裝置中,出於減小顆粒發生的目的,在暴露於氧氣或鹵素氣體等的電漿體的構件上,設置具備耐電漿體侵蝕性的陶瓷熱噴塗皮膜。Therefore, in the past, in a semiconductor device manufacturing apparatus, in order to reduce the generation of particles, a ceramic thermal spray coating having a resistance to plasma erosion has been provided on a member exposed to a plasma such as oxygen or halogen gas. .

作為這種顆粒發生因素,除了在真空腔室內附著的反應生成物的剝離之外,還會有使用鹵素氣體電漿體或氧氣電漿體而導致的腔室劣化。另外,根據本發明人的研究,確認了在乾式蝕刻環境下,從熱噴塗皮膜發生的顆粒數或大小受到熱噴塗皮膜組分的極大影響。As a cause of such particles, in addition to the peeling of the reaction products adhering in the vacuum chamber, there may be a deterioration of the chamber due to the use of a halogen gas plasma or an oxygen plasma. In addition, according to the study by the present inventors, it was confirmed that the number or size of particles generated from the thermal spray coating under the dry etching environment is greatly affected by the components of the thermal spray coating.

具體而言,蝕刻裝置的接觸鹵素類氣體電漿體的部件在金屬鋁或氣化鋁陶瓷基礎上,採用耐腐蝕性優秀的氧化釔或氟氧化釔作為皮膜。但是,氧化釔在工藝初期最上端表面與氟類氣體反應,使裝置內電漿體濃度變化,存在蝕刻步驟條件變得不穩定的問題(流程轉變)。另外,氟化釔熱噴塗皮膜雖然與氟類氣體的反應性小,但表面龜裂多,硬度比氧化釔低,因而蝕刻速度快,構件的更換週期變短。Specifically, the components of the etching device that are in contact with the halogen-based gas plasma are based on metallic aluminum or vaporized aluminum ceramics, and use yttrium oxide or yttrium oxide having excellent corrosion resistance as a coating. However, yttrium oxide reacts with a fluorine-based gas at the uppermost surface at the beginning of the process, which changes the plasma concentration in the device, and there is a problem that the conditions of the etching step become unstable (flow transition). In addition, although the yttrium fluoride thermal spray coating has low reactivity with fluorine-based gases, it has many surface cracks and lower hardness than yttrium oxide, so the etching speed is fast, and the replacement cycle of components is shortened.

因此,最近揭露了一種技術,將混合氧化釔與氟化釔而製造的氟氧化釔顆粒用作熱噴塗用材料,從而能夠形成對電漿體的耐蝕性高的熱噴塗皮膜(專利文獻1~5)。Therefore, a technique has recently been disclosed in which yttrium oxyfluoride particles produced by mixing yttrium oxide and yttrium fluoride are used as a material for thermal spraying, so that a thermal spraying film having high corrosion resistance to plasma can be formed (Patent Document 1 ~ 5).

首先,韓國公佈專利第10-2017-0078842號(2017.07.07.)涉及一種含有稀土類元素的氧氟化物(Ln-O-F)的成膜用粉末,對於粉末的平均粒徑(D50)為0.1μm以上10μm以下、藉助於水銀壓入法測量的直徑10μm以下的細孔容積為0.1cm3 /g以上0.5cm3 /g以下、對氯類電漿體的耐蝕性高的熱噴塗用料進行了記載。另外,韓國公佈專利第10-2016-0131916號(2016.11.16.)對熱噴塗用材料進行了記載,作為構成元素,包含稀土類元素(RE)、氧(O)及鹵素(X),稀土類元素氧鹵化物(RE-O-X)包含77質量%以上的比率。First, Korean Published Patent No. 10-2017-0078842 (2017.07.07.) Relates to a film-forming powder containing a rare earth element oxyfluoride (Ln-OF), and the average particle diameter (D50) of the powder is 0.1 Thermal spraying materials having a pore volume of 10 μm or less and a diameter of 10 μm or less measured by a mercury intrusion method of 0.1 cm 3 / g or more and 0.5 cm 3 / g or less and having high corrosion resistance to chlorine-based plasmas Got the record. In addition, Korean Published Patent No. 10-2016-0131916 (2016.11.16.) Describes materials for thermal spraying. As constituent elements, it includes rare earth elements (RE), oxygen (O), halogen (X), and rare earths. Element-like oxyhalide (RE-OX) contains a ratio of 77% by mass or more.

另外,韓國公佈專利第10-2016-0131917號(2016.11.16.)涉及一種稀土類元素氧鹵化物熱噴塗用材料,在熱噴塗用材料的X射線衍射圖中,相對於稀土類元素氧鹵化物的主峰的峰值強度IA,稀土類元素氧化物的主峰的峰值強度IB與稀土類元鹵化物的主峰的峰值強度IC的合計強度比[(IB+IC)/IA]不足0.02。In addition, Korean Published Patent No. 10-2016-0131917 (2016.11.16.) Relates to a rare-earth element oxyhalide thermal spraying material. In the X-ray diffraction pattern of the thermal spraying material, it is compared with the rare-earth element oxyhalogenation. The total intensity ratio [(IB + IC) / IA] of the peak intensity IA of the main peak of the substance, the peak intensity IB of the main peak of the rare earth element oxide and the peak intensity IC of the main peak of the rare earth element halide is less than 0.02.

該專利文獻2、3減少由於非晶特性而發生顆粒的稀土類元素氧化物和藉助於熱噴塗而可以變質成稀土類元素氧化物的稀土類元素氟化物的量,增加具有進一步提高的耐電漿體性的稀土類元素氧鹵化物的量,從而改善熱噴塗材料的物性。The patent documents 2 and 3 reduce the amount of rare-earth element oxides that have particles due to amorphous properties and rare-earth element fluorides that can be transformed into rare-earth element oxides by thermal spraying, and increase the plasma resistance. The amount of the rare earth element oxyhalide, which improves the physical properties of the thermal spray material.

另外,韓國公佈專利第10-2016-0131918號(2016.11.16.)揭露的熱噴塗用材料,作為構成元素,包括包含稀土類元素(RE)、氧(O)及鹵素(X)的稀土類元素氧鹵化物(RE-O-X),鹵素相對於稀土類元素的莫耳比(X/RE)為1.1以上,因此,耐電漿體性提高,氣孔率或硬度等的特性優秀。In addition, the material for thermal spraying disclosed in Korean Published Patent No. 10-2016-0131918 (2016.11.16.) Includes, as constituent elements, rare earths containing rare earth elements (RE), oxygen (O), and halogen (X). Elemental oxygen halide (RE-OX) has a molar ratio (X / RE) of halogen to rare earth elements of 1.1 or higher. Therefore, it has improved plasma resistance and excellent porosity and hardness.

另外,韓國公佈專利第10-2017-0015236號(2017.02.08.)涉及包括氧化釔、氟化釔及氟氧化釔的1種或2種以上的厚度為10至500μm的釔類熱噴塗皮膜,記載了藉由利用特定溶劑清洗相應皮膜表面,從而表面存在的粒徑300nm以下的顆粒數減小到1mm3 為5個以下,可以防止顆粒脫離現象的釔類熱噴塗皮膜製造技術。In addition, Korean Published Patent No. 10-2017-0015236 (2017.02.08.) Relates to one or two or more yttrium-based thermal spray coatings having a thickness of 10 to 500 μm including yttrium oxide, yttrium fluoride, and yttria. describes the phenomenon of particles from the thermal spray coating of yttrium-based manufacturing techniques by using a particular solvent cleaning the respective surfaces of the film, so that the number of particles present in the surface of the particle size is reduced below 300nm to 1mm 3 5 or less, it can be prevented.

如上所述,以往為了克服氧化釔或氟化釔熱噴塗材料的物性界限,提出了混合製造氧化釔及氟化釔,從而製造提高了電漿體侵蝕性、氣孔率、硬度等物性的氟氧化釔熱噴塗材料的技術。As described above, in order to overcome the physical property limits of yttrium oxide or yttrium fluoride thermal spray materials, a mixed production of yttrium oxide and yttrium fluoride has been proposed in the past, so as to produce fluorooxidation that has improved physical properties such as plasma erosion, porosity, and hardness. Technology for yttrium thermal spray materials.

但是,在製造釔的氧氟化物熱噴塗皮膜方面,熱噴塗皮膜的氟成份因高溫反應條件而部分減少,被氧取代,發生熱噴塗皮膜的組分差異,依然存在難以形成均一組分的熱噴塗皮膜的問題等,提高該現有文獻記載的氟氧化釔熱噴塗皮膜的耐電漿體特性,是產業方面持續不斷的要求。However, in the manufacture of yttrium oxyfluoride thermal spray coatings, the fluorine content of the thermal spray coatings is partially reduced due to high temperature reaction conditions and replaced by oxygen, resulting in differences in the composition of the thermal spray coatings. Problems such as spray coatings and the like, and improving the plasma-resistant properties of the yttrium oxyfluoride thermal spray coatings described in the prior literature are continuing industrial demands.

習知技術文獻Know-how

專利文獻 (專利文獻0001) 韓國公佈專利第10-2017-0078842號 (專利文獻0002) 韓國公佈專利第10-2016-0131916號 (專利文獻0003) 韓國公佈專利第10-2016-0131917號 (專利文獻0004) 韓國公佈專利第10-2016-0131918號 (專利文獻0005) 韓國公佈專利第10-2017-0015236號Patent Literature (Patent Literature 0001) Korean Published Patent No. 10-2017-0078842 (Patent Literature 0002) Korean Published Patent No. 10-2016-0131916 (Patent Literature 0003) Korean Published Patent No. 10-2016-0131917 (Patent Literature 0004) Korean Published Patent No. 10-2016-0131918 (Patent Document 0005) Korean Published Patent No. 10-2017-0015236

解決的技術問題Technical issues solved

本發明目的在於提供一種改善氟氧化釔熱噴塗材料及熱噴塗皮膜的耐電漿體特性的方法。The purpose of the present invention is to provide a method for improving the plasma-resistant properties of yttrium oxyfluoride thermal spray materials and thermal spray coatings.

技術方案Technical solutions

為了達成如上所述的目的,本發明的一個實施例提供一種製造Y-O-F-Al多成份類熱噴塗材料的方法,將氟化釔(YF3 )的比例為30至70質量%和餘份的氧化鋁(Al2 O3 )、釔鋁石榴石(YAG)進行混合、造粒、燒成,製造Y-O-F-Al多成份類熱噴塗材料。In order to achieve the above-mentioned object, an embodiment of the present invention provides a method for manufacturing a YOF-Al multi-component thermal spraying material. The ratio of yttrium fluoride (YF 3 ) is 30 to 70% by mass and the balance is oxidized. Aluminum (Al 2 O 3 ) and yttrium aluminum garnet (YAG) are mixed, granulated, and fired to produce YOF-Al multi-component thermal spray materials.

在本發明的一個較佳的實施例中,該氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)顆粒的平均顆粒直徑可以為0.01μm以上、7μm以下。In a preferred embodiment of the present invention, the average particle diameter of the yttrium fluoride (YF 3 ), aluminum oxide (Al 2 O 3 ), and yttrium aluminum garnet (YAG) particles may be 0.01 μm or more and 7 μm or less. .

在本發明的一個較佳的實施例中,該燒成的溫度可以為500至1100℃。In a preferred embodiment of the present invention, the firing temperature may be 500 to 1100 ° C.

本發明的又一實施例提供一種Y-O-F-Al多成份類熱噴塗材料,以該Y-O-F-Al多成份類熱噴塗材料的製造方法而製造,平均顆粒直徑為5μm以上、100μm以下。Another embodiment of the present invention provides a Y-O-F-Al multi-component thermal spraying material, which is manufactured by the manufacturing method of the Y-O-F-Al multi-component thermal spraying material, and has an average particle diameter of 5 μm or more and 100 μm or less.

本發明的又一實施例提供一種製造Y-O-F-Al多成份類熱噴塗皮膜的方法,對該Y-O-F-Al多成份類熱噴塗材料進行熱噴塗而在基材上形成皮膜。Another embodiment of the present invention provides a method for manufacturing a Y-O-F-Al multi-component thermal spray coating film, and thermally sprays the Y-O-F-Al multi-component thermal spray coating material to form a film on a substrate.

在本發明的一個較佳的實施例中,該熱噴塗可以為電漿體熱噴塗。In a preferred embodiment of the present invention, the thermal spraying may be plasma thermal spraying.

本發明的又一實施例提供一種Y-O-F-Al多成份類熱噴塗皮膜,以該Y-O-F-Al多成份類熱噴塗皮膜的製造方法形成,厚度為50至400μm。Another embodiment of the present invention provides a Y-O-F-Al multi-component thermal spray coating film, which is formed by the manufacturing method of the Y-O-F-Al multi-component thermal spray coating film, and has a thickness of 50 to 400 μm.

本發明的又一實施例提供一種Y-O-F-Al多成份類熱噴塗皮膜,其特徵在於,作為構成元素,包括釔(Y)、氧(O)、氟(F)及鋁(Al),鋁元素相對於該釔和氟的重量比(Al/Y+F)為0.025至0.25。Another embodiment of the present invention provides a YOF-Al multi-component thermal spray coating film, which is characterized in that as constituent elements, it includes yttrium (Y), oxygen (O), fluorine (F), aluminum (Al), and aluminum elements. The weight ratio (Al / Y + F) to the yttrium and fluorine is 0.025 to 0.25.

在本發明的一個較佳的實施例中,氟相對於該釔的重量比(F/Y)可以為0.7至1.3。In a preferred embodiment of the present invention, the weight ratio (F / Y) of fluorine to the yttrium may be 0.7 to 1.3.

發明效果Invention effect

本發明的Y-O-F-Al多成份類熱噴塗材料在熱噴塗製造步驟時,不發生熱噴塗皮膜包含的氧成份及氟成份的組分變化,抑制以往塗布層內發生的裂紋和氣孔的形成,因而可以形成比以往塗布層更緻密的熱噴塗皮膜。In the YOF-Al multi-component thermal spraying material of the present invention, during the thermal spraying manufacturing step, the composition of the oxygen and fluorine components contained in the thermal spraying film does not change, and the formation of cracks and pores in the conventional coating layer is suppressed. It is possible to form a denser thermal spray coating than conventional coating layers.

因此,本發明的Y-O-F-Al多成份類熱噴塗皮膜比以往的氟化釔及氧化釔硬度增加,具有低氣孔率,耐電漿體特性提高,可以延長Y-O-F-Al多成份類熱噴塗皮膜構件的更換週期。Therefore, the YOF-Al multi-component thermal spray coating of the present invention has higher hardness than the conventional yttrium fluoride and yttrium oxide, has a low porosity, and has improved resistance to plasma. It can extend the YOF-Al multi-component thermal spray coating film member. Replacement cycle.

只要未以其他方式定義,本說明書中使用的所有技術性及科學性術語具有與本發明所屬技術領域具有通常知識者通常所理解的內容相同的意義。一般而言,本說明書中使用的命名法是本技術領域熟知和常用的。As long as it is not defined otherwise, all technical and scientific terms used in this specification have the same meaning as those commonly understood by those having ordinary knowledge in the technical field to which the present invention belongs. In general, the nomenclature used in this specification is well known and commonly used in the art.

在本申請通篇說明書中,當提到某部分「包括」某種構成要素時,只要沒有特別相反的記載,則意味著不排除其他構成要素,可以進一步包括其他構成要素。Throughout this application, when referring to a certain part as "including" a certain constituent element, as long as there is no particularly contrary description, it means that other constituent elements are not excluded, and other constituent elements may be further included.

在半導體的製造步驟中,利用閘極蝕刻裝置、絕緣膜蝕刻裝置、抗蝕膜蝕刻裝置、濺射裝置、CVD裝置等。另一方面,在液晶的製造步驟中,利用用於形成薄膜電晶體的蝕刻裝置等。另外,在這些製造裝置中,以基於微細加工的高積體化等為目的,採用具備電漿體發生機構的構成。In the manufacturing steps of the semiconductor, a gate etching device, an insulating film etching device, a resist film etching device, a sputtering device, a CVD device, and the like are used. On the other hand, in the manufacturing steps of the liquid crystal, an etching device or the like for forming a thin film transistor is used. Moreover, in these manufacturing apparatuses, the structure provided with the plasma generating means is employ | adopted for the purpose of high volume accumulation etc. by micromachining.

在這些製造步驟中,作為處理氣體的氟類、氯類等鹵素類腐蝕氣體由於他們的高反應性而用於該裝置。作為氟類氣體,可以為SF6 、CF4 、CHF3 、ClF3 、HF、NF3 等,氯類氣體可以例如Cl2 、BCl3 、HCl、CCl4 、SiCl4 等,在導入這些氣體的氣氛下如果接入微波或高頻等,則這些氣體被電漿體化。暴露於這些鹵素類氣體或其電漿體的裝置構件,在表面上除材料成份之外的金屬很少,並要求具有高耐蝕性,因此,本發明目的在於提供一種對電漿體蝕刻裝置用構件進行被覆的耐電漿體性優秀的Y-O-F-Al多成份類熱噴塗材料及熱噴塗皮膜的製造方法。In these manufacturing steps, halogen-based corrosive gases such as fluorine-based and chlorine-based processes are used in the device because of their high reactivity. Examples of the fluorine-based gas include SF 6 , CF 4 , CHF 3 , ClF 3 , HF, and NF 3. The chlorine-based gas may include Cl 2 , BCl 3 , HCl, CCl 4 , and SiCl 4 . When microwaves or high frequencies are connected in the atmosphere, these gases are plasmatized. Device components exposed to these halogen-based gases or their plasmas have few metals other than material components on their surfaces and require high corrosion resistance. Therefore, the present invention aims to provide a plasma etching device. A method for manufacturing a YOF-Al multi-component thermal spraying material and a thermal spraying film having excellent plasma-resistant properties for coating a component.

下面對製造Y-O-F-Al多成份類熱噴塗材料的方法進行詳細說明。The method for manufacturing the Y-O-F-Al multi-component thermal spray material is described in detail below.

根據本發明的一種觀點,提供一種將氟化釔(YF3 )的比例為30至70質量%和餘份的氧化鋁(Al2 O3 )、釔鋁石榴石(YAG)進行混合、造粒、燒成而製造YO-F-Al多成份類熱噴塗材料的方法。According to an aspect of the present invention, there is provided a method for mixing and granulating alumina (Al 2 O 3 ) and yttrium aluminum garnet (YAG) in a proportion of 30 to 70 mass% of yttrium fluoride (YF 3 ). 2. A method for firing and manufacturing a YO-F-Al multi-component thermal spraying material.

雖然研究了作為一次材料的該氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)材料作為未造粒的粉末來使用,或作為包含未造粒的粉末的漿料來使用,但材料的流動性無法達到熱噴塗需要的水平,較佳地,經過製造成球形形態的混合、造粒及燒成步驟,構成造粒顆粒。Although the yttrium fluoride (YF 3 ), aluminum oxide (Al 2 O 3 ), and yttrium aluminum garnet (YAG) materials have been studied as primary materials, they are used as ungranulated powders, or as ungranulated powders. The slurry can be used, but the fluidity of the material cannot reach the level required for thermal spraying. Preferably, the granulated particles are formed after the mixing, granulation and firing steps that are made into a spherical shape.

較佳地,作為造粒的粉末的熱噴塗材料填充至內部,這在處置粉末方面不破碎而是保持穩定,如果存在空隙部,則在該空隙部容易含有較不佳的氣體成份,因而從可以迴避這種情況的角度而言是需要的。Preferably, the thermal spray material as a granulated powder is filled into the inside, which does not break but is stable in handling the powder. If there is a void portion, the void portion is likely to contain a poorer gas component. It is necessary to avoid this situation.

在該混合及造粒步驟中,在該氟化釔(YF3 )、氧化鋁(Al2 O3 )、釔鋁石榴石(YAG)中添加燒結助劑及分散介質,進行粉碎、混合後,經過脫水和乾燥過程。根據需要,追加與結合劑一同混合,製造漿料液滴後進行造粒、燒成,從而可以製造造粒顆粒。作為結合劑,較佳為有機化合物,可以為由碳、氫及氧或由碳、氫、氧及氮構成的有機化合物,例如可以為羧甲基纖維素(CMC)、聚乙烯醇(PVA)、聚乙烯吡咯烷酮(PVP)等。In the mixing and granulating step, a sintering aid and a dispersion medium are added to the yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG), and after pulverization and mixing, After dehydration and drying process. If necessary, it can be mixed with a binding agent to produce slurry droplets, and then granulated and calcined to produce granulated particles. The binding agent is preferably an organic compound, and may be an organic compound composed of carbon, hydrogen, and oxygen, or carbon, hydrogen, oxygen, and nitrogen. For example, it may be carboxymethyl cellulose (CMC) or polyvinyl alcohol (PVA). , Polyvinylpyrrolidone (PVP) and so on.

該氟化釔(YF3 )、氧化鋁(Al2 O3 )、 釔鋁石榴石(YAG)顆粒經過造粒過程。作為造粒裝置,例如可以利用噴霧乾燥(spray drying)裝置。在噴霧乾燥裝置中,包含經粉碎的多個顆粒的漿料液滴,在熱風中滴下,液滴因此而固化,製造成包括多個顆粒的中間顆粒。The yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG) particles undergo a granulation process. As the granulation device, for example, a spray drying device can be used. In the spray-drying device, the slurry droplets containing the pulverized plurality of particles are dropped in hot air, and the droplets are thereby solidified to produce intermediate particles including the plurality of particles.

在造粒步驟方面,較佳地,該氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)顆粒的平均顆粒直徑為0.01μm以上、7μm以下。在該顆粒的直徑不足約0.01μm的情況下,包括該氧化釔顆粒的具有造粒結構的熱噴塗塗布用粉末的平均直徑會減小,該顆粒的控制困難,難以形成球形的造粒顆粒。當該顆粒的直徑超過約7μm時,該顆粒成團而形成的造粒顆粒的平均直徑過大,會難以形成均一的熱噴塗皮膜。In terms of the granulation step, the average particle diameter of the yttrium fluoride (YF 3 ), aluminum oxide (Al 2 O 3 ), and yttrium aluminum garnet (YAG) particles is preferably 0.01 μm or more and 7 μm or less. In the case where the diameter of the particles is less than about 0.01 μm, the average diameter of the thermal spray coating powder having a granulated structure including the yttrium oxide particles is reduced, the control of the particles is difficult, and it is difficult to form spherical granulated particles. When the diameter of the particles exceeds about 7 μm, the average diameter of the granulated particles formed by the agglomeration of the particles is too large, and it may be difficult to form a uniform thermal spray coating.

然後,該造粒顆粒經過燒成步驟,較佳的燒成的溫度為500至1100℃。藉由在該溫度範圍內燒成,從而氟氧化釔與鋁化合物充分反應。當燒成溫度不足500℃時,混合反應不充分,存在氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)的一部分殘留的可能性。更佳地,該燒成的溫度為800至1000℃,這在提高多成份類熱噴塗皮膜的耐電漿體性方面有效。具體而言,當該燒成溫度不足800℃時,熱噴塗皮膜的硬度不充分,因此,熱噴塗材料的耐電漿體性低下。Then, the granulated particles are subjected to a firing step, and the preferred firing temperature is 500 to 1100 ° C. By firing in this temperature range, yttrium oxyfluoride and the aluminum compound are sufficiently reacted. When the firing temperature is less than 500 ° C, the mixing reaction is insufficient, and there is a possibility that a part of yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG) may remain. More preferably, the firing temperature is 800 to 1000 ° C, which is effective in improving the plasma resistance of the multi-component thermal spray coating film. Specifically, when the firing temperature is less than 800 ° C., the hardness of the thermal spray coating is insufficient, and therefore, the plasma resistance of the thermal spray material is low.

按照燒成溫度為該範圍的條件,燒成時間較佳為2小時以上、8小時以下。如果是該範圍,則Y-O-F-Al多成份類化合物充分生成,能量消耗也最小化。Under the condition that the firing temperature is within this range, the firing time is preferably 2 hours or more and 8 hours or less. Within this range, Y-O-F-Al multi-component compounds are sufficiently formed, and energy consumption is minimized.

燒成氣氛可以使用大氣氣氛等含氧氣氛,但較佳為氬氣等惰性氣體氣氛或真空氣氛。The firing atmosphere may be an oxygen-containing atmosphere such as an atmospheric atmosphere, but an inert gas atmosphere such as argon or a vacuum atmosphere is preferred.

進行混合、造粒、燒成而製造的熱噴塗材料的平均顆粒直徑為5μm以上、100μm以下,這在提高熱噴塗皮膜品質方面有利。如果平均顆粒直徑不足5μm,則在熱噴塗塗布時,粉末的流動性低,無法展現均一的膜,在粉末傳遞到框架之前被氧化,或未傳遞到框架中心,難以滿足形成緻密膜所需的液滴飛濺速度及熱量,導致形成氣孔多或硬度低的膜。如果平均顆粒直徑超過100μm,則在粉末注入電漿體內時,無法完全熔融,在塗膜內發生未熔融部分,難以滿足本發明要求的熱噴塗皮膜的品質。The thermal spray material produced by mixing, granulating, and firing has an average particle diameter of 5 μm or more and 100 μm or less, which is advantageous in improving the quality of the thermal spray coating film. If the average particle diameter is less than 5 μm, during thermal spray coating, the powder has low fluidity and cannot exhibit a uniform film, is oxidized before the powder is transferred to the frame, or is not transferred to the center of the frame, and it is difficult to meet the requirements for forming a dense film. The speed and heat of the droplets cause a film with many pores or low hardness. If the average particle diameter exceeds 100 μm, the powder cannot be completely melted when the powder is injected into the plasma body, and an unmelted portion occurs in the coating film, making it difficult to meet the quality of the thermal spray coating film required by the present invention.

本發明的熱噴塗材料粉末的縱橫比(aspect ratio)用顆粒的長直徑與短直徑之比表示,1.0以上、5.0以下者在形成緻密、均一的膜方面有利,從這種觀點而言,縱橫比更較佳為1.0以上、4.0以下,特佳為1.0以上、1.5以下。The aspect ratio of the powder of the thermal spray material of the present invention is expressed by the ratio of the long diameter to the short diameter of the particles. 1.0 or more and 5.0 or less are advantageous in forming a dense and uniform film. From this viewpoint, the aspect ratio The ratio is more preferably 1.0 or more and 4.0 or less, and particularly preferably 1.0 or more and 1.5 or less.

就熱噴塗材料粉末而言,流動性作為熱噴塗膜品質的重要要素,較佳地,製作成球形,否則在製造熱噴塗皮膜時,既定量的粉末無法傳遞到框架,無法形成我們要求的水平的膜。As far as thermal spray material powder is concerned, fluidity is an important element of the quality of thermal spray film. It is preferably made into a sphere. Otherwise, when manufacturing a thermal spray film, the given amount of powder cannot be transferred to the frame and cannot form the level we require. Of the film.

另外,說明對該Y-O-F-Al多成份類熱噴塗材料進行電漿體熱噴塗,在基材上形成鋁氟氧化釔膜的Y-O-F-Al多成份類熱噴塗皮膜的製造方法。In addition, a method for manufacturing a Y-O-F-Al multi-component thermal spray coating film by subjecting the Y-O-F-Al multi-component thermal spray coating material to plasma thermal spraying to form an aluminum yttrium oxide film on a substrate will be described.

該電漿體熱噴塗法一般包括將熱噴塗用材料投入電漿體噴射器後加熱、加速並堆積於基材而獲得熱噴塗皮膜的塗布方法。另外,電漿體熱噴塗法可以是在大氣中進行的大氣電漿體熱噴塗(APS:atmospheric plasma spraying)或在低於大氣壓的氣壓下進行熱噴塗的減壓電漿體熱噴塗(LPS: low pressure plasma spraying)、在高於大氣壓的氣壓容器內進行電漿體熱噴塗的加壓電漿體熱噴塗(high pressure plasmaspraying)等形態。根據這種電漿體熱噴塗,例如作為一個示例,使熱噴塗材料藉助於10000K至15000K左右的電漿體噴射器而熔融及加速,從而可以使熱噴塗顆粒以300m/s至1000m/s左右的速度碰撞基材並堆積於基材。The plasma thermal spraying method generally includes a coating method in which a material for thermal spraying is put into a plasma sprayer, heated, accelerated, and deposited on a substrate to obtain a thermal sprayed film. In addition, the plasma thermal spraying method may be atmospheric plasma spraying (APS: atmospheric plasma spraying) performed in the atmosphere or reduced pressure plasma thermal spraying (LPS: low pressure plasma spraying), high pressure plasma spraying in the form of high pressure plasma spraying in a pressure vessel above atmospheric pressure. According to this plasma thermal spraying, for example, as an example, the thermal spraying material is melted and accelerated by means of a plasma sprayer of about 10000K to 15000K, so that the thermal spraying particles can be about 300m / s to 1000m / s. The speed hits the substrate and accumulates on the substrate.

本發明的對基材的熱噴塗可以藉助於大氣壓電漿體熱噴塗而進行。此時,作為電漿體氣體,不特別限定,可以適當選擇,例如可以使用氮/氫、氬/氫、氬/氦、氬/氮等,在本發明中較佳為熱噴塗氬/氫。The thermal spraying of the substrate of the present invention can be performed by means of thermal spraying of atmospheric piezoelectric slurry. In this case, the plasma gas is not particularly limited and may be appropriately selected. For example, nitrogen / hydrogen, argon / hydrogen, argon / helium, argon / nitrogen, and the like can be used. In the present invention, thermal spraying argon / hydrogen is preferred.

作為熱噴塗的具體例,當為氬/氫電漿體熱噴塗時,可以是在大氣氣氛中使用了氬和氫的混合氣體的大氣壓電漿體熱噴塗。熱噴塗距離或電流值、電壓值、氬氣供應量、氫氣供應量等熱噴塗條件,根據熱噴塗構件的用途等進行條件設置。在粉末供應裝置中填充預定量的熱噴塗材料,使用乾粉軟管,藉助於運載氣體(氬),將乾粉供應到電漿體熱噴塗槍前端部。向電漿體火花中連續供應乾粉,從而熱噴塗材料熔融、液化,因電漿體噴射器的力而實現液態框架化。液態框架碰到基板上,從而熔融的乾粉附著、固化並堆積。利用該原理,使框架向左右、上下移動並在基板上的預定塗布範圍內形成Y-O-F-Al多成份類熱噴塗皮膜,從而可以製造Y-O-F-Al多成份類成膜部件(熱噴塗構件)。As a specific example of thermal spraying, in the case of argon / hydrogen plasma thermal spraying, atmospheric piezoelectric slurry thermal spraying using a mixed gas of argon and hydrogen in an atmospheric atmosphere may be used. Thermal spraying conditions such as thermal spraying distance or current value, voltage value, argon gas supply amount, hydrogen gas supply amount, etc. are set according to the application of the thermal spraying member and the like. The powder supply device is filled with a predetermined amount of thermal spraying material, and a dry powder hose is used to supply dry powder to the front end portion of the plasma thermal spraying gun by means of a carrier gas (argon). The dry powder is continuously supplied to the plasma spark, so that the thermal spray material is melted and liquefied, and the liquid framing is achieved due to the force of the plasma sprayer. The liquid frame hits the substrate, so that the molten dry powder adheres, solidifies, and accumulates. By using this principle, the frame is moved left and right, up and down, and a Y-O-F-Al multi-component thermal spray coating is formed in a predetermined coating range on the substrate, so that a Y-O-F-Al multi-component film-forming component (thermal spray member) can be manufactured.

在本發明中,被覆熱噴塗皮膜的基材不特別限定。例如,如果是提供用於這種熱噴塗用材料的熱噴塗並包括可具備所需耐性的材料的基材,則其材質或形狀等不特別限制。作為構成這種進行熱噴塗的基材的材料,例如,較佳地,在構成半導體製造裝置用構件等的鋁、鎳、鉻、鋅及其合金、氧化鋁、氮化鋁、氮化矽、碳化矽及石英玻璃中的至少一種以上的組合中選擇。In the present invention, the substrate coated with the thermal spray coating is not particularly limited. For example, if it is a substrate that provides thermal spraying for such a thermal spraying material and includes a material that can have the required resistance, the material, shape, and the like are not particularly limited. As a material constituting such a base material for thermal spraying, for example, aluminum, nickel, chromium, zinc and alloys thereof, aluminum oxide, aluminum nitride, silicon nitride, A combination of at least one or more of silicon carbide and quartz glass is selected.

這種基材例如為構成半導體裝置製造裝置的構件,也可以為暴露於反應性高的氧氣電漿體或鹵素氣體電漿體的構件。Such a substrate is, for example, a member constituting a semiconductor device manufacturing device, or may be a member exposed to a highly reactive oxygen plasma or a halogen gas plasma.

較佳地,該基材表面在電漿體熱噴塗之前,根據JIS H 9302規定的陶瓷熱噴塗作業標準進行處理。例如,去除其基材表面的鏽或油脂等後,噴射Al2 O3 、SiC等磨削顆粒而進行表面粗糙化,預處理成氟化物熱噴塗顆粒容易附著的狀態。Preferably, the surface of the substrate is treated according to the ceramic thermal spraying operation standard specified by JIS H 9302 before the plasma thermal spraying. For example, after removing rust, grease, and the like on the surface of the substrate, the surface is roughened by spraying abrasive particles such as Al 2 O 3 and SiC, and the surface is pretreated into a state where the thermal sprayed fluoride particles are easily attached.

另外,該熱噴塗皮膜的製造方法除電漿體熱噴塗之外,可以將在此公開的熱噴塗材料提供給基於習知的熱噴塗方法的熱噴塗裝置,從而形成。適宜地熱噴塗這種熱噴塗用材料的熱噴塗方法,例如採用高速框架熱噴塗法、框架熱噴塗法、爆炸熱噴塗法等熱噴塗方法。In addition, the manufacturing method of the thermal spray coating film may be formed by supplying a thermal spray material disclosed herein to a thermal spray device based on a conventional thermal spray method in addition to plasma thermal spray. Suitable thermal spraying methods for thermal spraying such thermal spraying materials include, for example, thermal spraying methods such as high-speed frame thermal spraying, frame thermal spraying, and explosive thermal spraying.

熱噴塗皮膜的特性會有在某種程度上依賴於熱噴塗方法及其熱噴塗條件的情形。但是,無論採用哪種熱噴塗方法及熱噴塗條件,藉由使用在此揭露的熱噴塗用材料,從而與使用其他熱噴塗材料的情形相比,能夠形成耐電漿體侵蝕性優秀的熱噴塗皮膜。The characteristics of the thermal spray coating may depend to some extent on the thermal spray method and the thermal spray conditions. However, no matter which thermal spraying method and thermal spraying conditions are used, by using the thermal spraying materials disclosed herein, a thermal spraying film having excellent resistance to plasma erosion can be formed compared to the case of using other thermal spraying materials. .

較佳地,該Y-O-F-Al多成份類熱噴塗皮膜以50~400μm的厚度形成。此時,如果厚度不足50μm,則有無法獲得充分耐腐蝕性的情形,另外,由於清洗操作,也存在基材表面部分地露出的可能性。另一方面,即使構成得較厚,超過400μm,也無法期待提高耐腐蝕性的效果,僅僅導致高費用而已。Preferably, the Y-O-F-Al multi-component thermal spray coating is formed in a thickness of 50 to 400 μm. At this time, if the thickness is less than 50 μm, sufficient corrosion resistance may not be obtained, and the surface of the substrate may be partially exposed due to the cleaning operation. On the other hand, even if the structure is thick and exceeds 400 μm, the effect of improving the corrosion resistance cannot be expected, and it only causes high costs.

以往的YF3 、YOF熱噴塗膜作為晶質膜,在粉末熔融凝固時,從非晶變成晶質,形成塗布層內裂紋(Crack)及氣孔。在本發明中,在粉末內添加一部分Al2 O3 成份,相應物質在形成熱噴塗膜時具有非晶特性。包含具有這種特性的物質的粉末在藉助於電漿體而熔融凝固時,大部分從非晶變成晶質,但一部分Al2 O3 物質保留為非晶,預計將抑制以往塗布層內曾發生的裂紋和氣孔的形成。結果,顯示出在晶界(grain boundary)內發生的裂紋(crack)及因此發生的顆粒(particle)數顯著減少的效果。Conventional YF 3 and YOF thermal sprayed films are crystalline films. When the powder melts and solidifies, it changes from amorphous to crystalline, forming cracks and pores in the coating layer. In the present invention, a part of the Al 2 O 3 component is added to the powder, and the corresponding substance has an amorphous characteristic when forming a thermal spray film. When a powder containing a substance having such characteristics is melted and solidified by means of a plasma, most of the powder changes from amorphous to crystalline, but a part of the Al 2 O 3 substance remains amorphous, which is expected to suppress the occurrence in the coating layer in the past. The formation of cracks and pores. As a result, the effect of cracks occurring in the grain boundary and the number of particles generated thereby was significantly reduced.

該多成份類熱噴塗皮膜由釔(Y)、氧(O)、氟(F)及鋁(Al)構成,較佳地,鋁元素相對於該釔和氟的重量比[Al/(Y+F)]為0.025至0.25。在熱噴塗皮膜內,當鋁元素相對於釔和氟的重量比[Al/(Y+F)]不足0.025時,Al2 O3 非晶部分不充分,熱噴塗皮膜的硬度低,無法達成提高耐電漿體性的效果。The multi-component thermal spray coating is composed of yttrium (Y), oxygen (O), fluorine (F), and aluminum (Al). Preferably, the weight ratio of the aluminum element to the yttrium and fluorine [Al / (Y + F)] is 0.025 to 0.25. In the thermal spray coating, when the weight ratio [Al / (Y + F)] of aluminum to yttrium and fluorine is less than 0.025, the amorphous portion of Al 2 O 3 is insufficient, and the hardness of the thermal spray coating is low, and the improvement cannot be achieved. Effect of plasma resistance.

較佳地,在該熱噴塗皮膜的構成成份中,氟相對於釔的重量比(F/Y)為0.7至1.3。在氟相對於該釔的重量比(F/Y)超過1.3的情況下,由於氟濃度高,熱噴塗皮膜的硬度下降,導致蝕刻速度增加。Preferably, in the constituents of the thermal spray coating, the weight ratio (F / Y) of fluorine to yttrium is 0.7 to 1.3. When the weight ratio (F / Y) of fluorine to this yttrium exceeds 1.3, the fluorine concentration is high, the hardness of the thermal spray coating is reduced, and the etching rate is increased.

因此,藉助於大氣電漿體而生成的Y-O-F-Al多成份類熱噴塗膜,與原有氟化物釔及氧氟化物釔熱噴塗皮膜相比,硬度及氣孔率水平優秀,具有比原有蝕刻步驟中使用的半導體腔室所應用的氧化釔熱噴塗皮膜更優秀的水平。Therefore, the YOF-Al multi-component thermal spraying film produced by means of atmospheric plasma is superior in hardness and porosity compared with the original thermal spraying film of yttrium fluoride and oxyfluoride yttrium, and has better etching than the original The yttrium oxide thermal spray coating applied to the semiconductor chamber used in the step has a better level.

另外,在該混合、造粒、燒成的熱噴塗材料中確認的Y-O-F-Al成份,在藉助於大氣電漿體方式而生成的熱噴塗皮膜中也被相同地檢測到,利用這點,容易地控制不同組分下的熱噴塗皮膜物性。In addition, the YOF-Al composition confirmed in the mixed, granulated, and fired thermal spray material is also detected in the thermal spray coating film generated by the atmospheric plasma method. Using this, it is easy to use Control the physical properties of the thermal spray coating under different components.

下面藉由實施例,更詳細地說明本發明。但是,下述實施例只是對本發明的示例,並非本發明由該實施例所限定。Hereinafter, the present invention will be described in more detail through examples. However, the following embodiments are merely examples of the present invention, and the present invention is not limited by the embodiments.

<實施例><Example>

適宜地對氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)進行混合、造粒、燒成,獲得了粉末狀態熱噴塗材料。變更由30至70質量%的YF3 、(Al2 O3 +YAG)餘份構成的一次材料的成份比而製造了熱噴塗材料。The yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG) were appropriately mixed, granulated, and fired to obtain a powdered thermal spray material. The thermal spray material was produced by changing the composition ratio of the primary material composed of 30 to 70% by mass of YF 3 and (Al 2 O 3 + YAG).

<實施例 1><Example 1>

(1) 熱噴塗材料的製造過程(1) Manufacturing process of thermal spray materials

在氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)粉末中混合黏合劑後,藉助於噴霧乾燥器而獲得了造粒粉末。對該造粒粉末脫脂後進行燒結,獲得了燒結粉末。A granulated powder was obtained by mixing a binder with yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG) powders by means of a spray dryer. This granulated powder was sintered after degreasing to obtain a sintered powder.

(2) 熱噴塗皮膜的製造過程(2) Manufacturing process of thermal spray coating

利用在(1)步驟中製備的熱噴塗材料及電漿槍,作為熱源氣體而流入氬和氫氣,在使熱噴塗槍移動的同時,在40~50 kW功率下,生成電漿體,利用生成的電漿體,使原料粉末熔融,在母材上形成了塗布膜。該塗布膜的厚度形成得具有150~200μm,收得的熱噴塗皮膜的成份比率如下表1記載所示。Using the thermal spray material and the plasma gun prepared in step (1), argon and hydrogen flow into the heat source gas. While moving the thermal spray gun, the plasma is generated at a power of 40 to 50 kW. The raw material powder is melted to form a coating film on the base material. The thickness of the coating film was formed to have a thickness of 150 to 200 μm, and the component ratio of the obtained thermal spray coating film is shown in Table 1 below.

<實施例2至6及比較例1至6><Examples 2 to 6 and Comparative Examples 1 to 6>

配備原材料,以製造一次材料的配合比率具有下述表1記載的成份比率的熱噴塗皮膜,並對熱噴塗材料進行了造粒,造粒的熱噴塗材料的熱處理溫度如下述表1記載所示。然後,利用收得的熱噴塗材料,在與實施例1相同的條件下,實施了熱噴塗皮膜的形成。Raw materials are provided to produce a thermal spray coating having a composition ratio of the primary material as shown in Table 1 below, and the thermal spray material is granulated. The heat treatment temperature of the granulated thermal spray material is shown in Table 1 below. . Then, a thermal spray coating film was formed on the obtained thermal spray material under the same conditions as in Example 1.

對根據實施例1至6及比較例1至6而製造的熱噴塗皮膜進行分析,獲得了如表1所示顯示出各元素的成份比的實驗數據。為了測量各個實施例的熱噴塗皮膜的物性,進行了如下實驗,將由此獲得的物性值摘要顯示於下表1。另外,為了參考,在比較例7至9中一同顯示了以往使用的熱噴塗皮膜的物性。Y-O-F-Al多成份類熱噴塗皮膜在利用掃描電子顯微鏡(SEM)進行x-射線光譜分析法(EDS)分析時,檢測出Y、O、F、Al成份,具有x-射線衍射分析法(XRD)分析時的晶質特性。The thermal spray coatings produced according to Examples 1 to 6 and Comparative Examples 1 to 6 were analyzed, and experimental data showing the component ratio of each element as shown in Table 1 were obtained. In order to measure the physical properties of the thermal spray coatings of the respective examples, the following experiments were performed, and the physical property values thus obtained are summarized in Table 1 below. In addition, for reference, Comparative Examples 7 to 9 also show the physical properties of the thermal spray coatings conventionally used. The YOF-Al multi-component thermal spray coating was analyzed by scanning electron microscope (SEM) for x-ray spectroscopy (EDS), and detected Y, O, F, and Al components. It has x-ray diffraction analysis (XRD) ) Crystal properties during analysis.

表1 Table 1

<實驗例1-熱噴塗皮膜的成份濃度測量>< Experimental Example 1-Measurement of Concentration of Components in Thermal Spray Coatings >

為了分析該實施例1至實施例6和比較例1至比較例9中製造的熱噴塗皮膜內Y、O、F及Al成份含量變化,實施EDS分析,將其結果顯示於表1中。In order to analyze the changes in the Y, O, F, and Al component contents in the thermal sprayed films produced in Examples 1 to 6 and Comparative Examples 1 to 9, the EDS analysis was performed, and the results are shown in Table 1.

成份含量分析是將熱噴塗皮膜切斷成與基材表面直交的面,對獲得的剖面進行樹脂內嵌研磨後,使用電子顯微鏡(JEOL, JS-6010),對其剖面圖像進行了EDS測量。在EDS測量時,利用CPS數值在1分鐘期間確認100,000計數以上的數值標本進行了成份確認。The analysis of the component content is to cut the thermal spray coating into a surface orthogonal to the surface of the base material, and then grind the obtained cross section with embedded resin. Then use an electron microscope (JEOL, JS-6010) to measure the cross section of the cross section image by EDS. . In the EDS measurement, the composition was confirmed by using a CPS value to confirm a value of 100,000 counts or more in one minute.

<實驗例2-熱噴塗皮膜的觀察>< Experimental Example 2-Observation of Thermal Spray Coatings >

第1圖是本發明的比較例(比較例7、8、9)及實施例(實施例1)的熱噴塗皮膜側面的掃描電子顯微鏡(SEM)照片,藉由第1圖的熱噴塗皮膜側面的掃描電子顯微鏡(SEM)照片,確認了根據實施例1製造的多成份類熱噴塗皮膜的氣孔面積比根據比較例7、8、9製造的熱噴塗皮膜小。FIG. 1 is a scanning electron microscope (SEM) photograph of a side of a thermal spray film of Comparative Examples (Comparative Examples 7, 8, 9) and Examples (Example 1) of the present invention. Scanning electron microscope (SEM) photographs confirming that the pore area of the multi-component thermal spray coating produced in Example 1 is smaller than the thermal spray coating produced in Comparative Examples 7, 8, and 9.

另外,在表1中顯示了藉由比較例(比較例7、8、9)及實施例(實施例1)中製造的熱噴塗皮膜的剖面中顯示的氣孔面積而獲得的氣孔率(porosity)。氣孔率的測量如下所示進行。即,將熱噴塗皮膜截斷成與基材表面直交的面,對獲得的剖面進行樹脂內嵌研磨後,使用電子顯微鏡(JEOL、JS-6010),拍攝了其剖面圖像(第1圖)。將該圖像使用圖像分析軟體(MEDIA CYBERNETICS,Image Pro)進行了解析,從而對剖面圖像中的氣孔部分的面積進行特定,算出這種氣孔部分的面積占截面的比率,從而求出了氣孔率。In addition, Table 1 shows the porosity obtained from the pore area shown in the cross sections of the thermal spray coatings produced in Comparative Examples (Comparative Examples 7, 8, 9) and Examples (Example 1). . The porosity was measured as shown below. That is, the thermal spray coating was cut into a surface orthogonal to the surface of the substrate, and the obtained cross-section was embedded with resin, and then the cross-sectional image was taken using an electron microscope (JEOL, JS-6010) (Fig. 1). This image was analyzed using image analysis software (MEDIA CYBERNETICS, Image Pro) to specify the area of the stomata in the cross-sectional image, and the area ratio of the area of the stomata to the cross-section was calculated to obtain the Porosity.

比較例8及比較例9中製造的熱噴塗皮膜的氣孔率(porosity)顯示出3~4%的值,根據比較例7而形成的氟化釔(YF3)熱噴塗皮膜的氣孔率顯示出2~3%。但是,實施例1、2顯示出氣孔率1至2%的值,顯示出本發明的多成份類熱噴塗皮膜的緻密度比以往利用的組分的熱噴塗皮膜增加。The porosity of the thermal spray coatings produced in Comparative Example 8 and Comparative Example 9 showed a value of 3 to 4%, and the porosity of the yttrium fluoride (YF3) thermal spray coating formed according to Comparative Example 7 showed a value of 2 ~ 3%. However, Examples 1 and 2 show a porosity value of 1 to 2%, and show that the density of the multi-component thermal sprayed film of the present invention is higher than that of conventionally used components of the thermal sprayed film.

第2圖是本發明比較例(比較例7、8)及實施例(實施例1)的熱噴塗皮膜表面的掃描電子顯微鏡(SEM)照片。藉由第2圖的熱噴塗皮膜表面的掃描電子顯微鏡(SEM)照片,觀察到根據比較例7、8而製造的熱噴塗皮膜表面出現的裂紋數在根據實施例1而製造的多成份類熱噴塗皮膜表面顯著減少。FIG. 2 is a scanning electron microscope (SEM) photograph of the surfaces of the thermal spray coatings of Comparative Examples (Comparative Examples 7, 8) and Examples (Example 1) of the present invention. From the scanning electron microscope (SEM) photograph of the surface of the thermally sprayed film in FIG. 2, it was observed that the number of cracks appearing on the surface of the thermally sprayed film produced according to Comparative Examples 7 and 8 was higher than that of the multi-component heat produced according to Example 1. Significant reduction in spray film surface.

<實驗例3-硬度測量>< Experimental Example 3- Hardness Measurement >

表1中的「Hardness」欄,顯示出各熱噴塗皮膜的維氏硬度測量結果。維氏硬度的測量是使用微波硬度測量計,藉助於相對面間夾角136°的金剛石壓頭,施加試驗力294.2 mN時求出的維氏硬度(Hv0.2)。The "Hardness" column in Table 1 shows the Vickers hardness measurement results of each thermal spray coating. The Vickers hardness is measured using a microwave hardness tester and a Vickers hardness (Hv0.2) obtained when a test force of 294.2 mN is applied by means of a diamond indenter with an angle of 136 ° between opposite surfaces.

如表1所示,比較例7至9的釔類熱噴塗皮膜表現出300至400Hv硬度,但實施例1、2中Y-O-F-Al多成份類熱噴塗皮膜表現出450至500Hv硬度,因而本發明具有比以往的釔熱噴塗皮膜提高的機械物性。As shown in Table 1, the yttrium-based thermal spray coatings of Comparative Examples 7 to 9 exhibited a hardness of 300 to 400 Hv, but the YOF-Al multi-component thermal spray coatings of Examples 1 and 2 exhibited a hardness of 450 to 500 Hv. Therefore, the present invention It has higher mechanical properties than conventional yttrium thermal spray coatings.

<實驗例4-蝕刻速度測量><Experimental Example 4-Measurement of Etching Speed>

表1中的「Plasma Etch Rate」欄顯示出以以下條件使各熱噴塗皮膜暴露於電漿體時評價蝕刻速度的結果。即,首先,將附著有比較例7至9和實施例1、2的熱噴塗皮膜的構件,安裝於與平行平板型的半導體裝置製造裝置腔室內的上部電極相接的構件。而且,將矽晶片安裝於腔室內的平台,實施了為期2小時的進行電漿體乾式蝕刻的試運行。將腔室內壓力保持為0.1torr,供應包含四氟化碳的蝕刻氣體,在2小時期間內,上部接入700W的高頻電力,下部接入250W的高頻電力,從而發生了蝕刻處理中的電漿體。The "Plasma Etch Rate" column in Table 1 shows the results of evaluating the etching rate when each thermal spray coating was exposed to the plasma under the following conditions. That is, first, the members to which the thermal spray coatings of Comparative Examples 7 to 9 and Examples 1 and 2 were attached were mounted on a member that was in contact with an upper electrode in a chamber of a parallel flat-type semiconductor device manufacturing apparatus. In addition, a silicon wafer was mounted on a platform in a chamber, and a trial operation of plasma dry etching was performed for two hours. The pressure in the chamber was kept at 0.1torr, and an etching gas containing carbon tetrafluoride was supplied. During a period of 2 hours, 700W high-frequency power was connected to the upper part, and 250W high-frequency power was connected to the lower part. Plasma.

在該電漿體蝕刻步驟之後,對曾安裝於半導體裝置製造裝置的腔室內的構件進行三維分析(KEYENCE, VK-X150K 3D analysis),從而獲得了熱噴塗皮膜的蝕刻速度。After the plasma etching step, three-dimensional analysis (KEYENCE, VK-X150K 3D analysis) was performed on the components that were installed in the chamber of the semiconductor device manufacturing device, thereby obtaining the etching rate of the thermal spray coating.

如表1所示,比較例7至9顯示出3.12 ~ 3.99μm/h範圍的蝕刻速度(etch rate),相反,實施例1、2顯示出2.88 ~ 3.01μm/h範圍的蝕刻速度,顯示出本發明的電漿體蝕刻速度減小。As shown in Table 1, Comparative Examples 7 to 9 showed an etch rate in the range of 3.12 to 3.99 μm / h, and Examples 1 and 2 showed an etch rate in the range of 2.88 to 3.01 μm / h, showing The plasma etching speed of the present invention is reduced.

以上詳細記述了本發明內容的特定部分,這種具體的記述只是較佳的實施形態,並非本發明的範圍限定於此,這是所屬技術領域具有通常知識者不言而喻的。因此,本發明的實質性範圍由附帶的申請專利範圍請求項及其等價物所定義。The specific part of the content of the present invention has been described in detail above. This specific description is only a preferred embodiment, and the scope of the present invention is not limited thereto. It is self-evident that those skilled in the art can belong to this field. Therefore, the substantial scope of the present invention is defined by the appended claims for patent scope and their equivalents.

no

第1圖是本發明的比較例(比較例7、8、9)及實施例(實施例1)的熱噴塗皮膜側面的掃描電子顯微鏡(SEM)照片。FIG. 1 is a scanning electron microscope (SEM) photograph of the side of a thermal spray coating of Comparative Examples (Comparative Examples 7, 8, 9) and Examples (Example 1) of the present invention.

第2圖是本發明的比較例(比較例7、8)及實施例(實施例1)的熱噴塗皮膜表面的掃描電子顯微鏡(SEM)照片。FIG. 2 is a scanning electron microscope (SEM) photograph of the surfaces of the thermal spray coatings of Comparative Examples (Comparative Examples 7, 8) and Examples (Example 1) of the present invention.

Claims (10)

一種製造Y-O-F-Al多成份類熱噴塗材料的方法,其包括: 將氟化釔(YF3 )的比例為30至70質量%和餘份的氧化鋁(Al2 O3 )、釔鋁石榴石(YAG)進行混合、造粒、燒成,製造Y-O-F-Al多成份類熱噴塗材料。A method for manufacturing a YOF-Al multi-component thermal spraying material, comprising: changing the ratio of yttrium fluoride (YF 3 ) to 30 to 70% by mass and the remainder of alumina (Al 2 O 3 ), yttrium aluminum garnet (YAG) Mix, granulate, and fire to produce YOF-Al multi-component thermal spray materials. 如申請專利範圍第1項所述的方法,其中,該氟化釔(YF3 )、氧化鋁(Al2 O3 )及釔鋁石榴石(YAG)顆粒的平均顆粒直徑為0.01μm以上、7μm以下。The method according to item 1 of the scope of patent application, wherein the average particle diameter of the yttrium fluoride (YF 3 ), alumina (Al 2 O 3 ), and yttrium aluminum garnet (YAG) particles is 0.01 μm or more and 7 μm the following. 如申請專利範圍第1項所述的方法,其中,該燒成的溫度為500至1100℃。The method of claim 1, wherein the firing temperature is 500 to 1100 ° C. 一種Y-O-F-Al多成份類熱噴塗材料,以如申請專利範圍第1項至第3項中任一項的方法而製得,平均顆粒直徑為5μm以上、100μm以下。A Y-O-F-Al multi-component thermal spraying material is prepared by a method according to any one of items 1 to 3 of the scope of patent application, and has an average particle diameter of 5 μm or more and 100 μm or less. 一種製造Y-O-F-Al多成份類熱噴塗皮膜的方法,其包括: 對如申請專利範圍第4項所述的Y-O-F-Al多成份類熱噴塗材料進行熱噴塗,在基材上形成皮膜。A method for manufacturing a Y-O-F-Al multi-component thermal spray coating film, comprising: thermally spraying the Y-O-F-Al multi-component thermal spray coating material described in item 4 of the patent application scope, to form a film on a substrate. 如申請專利範圍第5項所述的方法,其中,該熱噴塗為電漿體熱噴塗。The method according to item 5 of the patent application scope, wherein the thermal spraying is plasma thermal spraying. 一種Y-O-F-Al多成份類熱噴塗皮膜,以如申請專利範圍第5項所述的製造Y-O-F-Al多成份類熱噴塗皮膜的方法形成,厚度為50至400μm。A Y-O-F-Al multi-component thermal spray coating is formed by the method of manufacturing a Y-O-F-Al multi-component thermal spray coating as described in item 5 of the patent application scope, and has a thickness of 50 to 400 μm. 一種Y-O-F-Al多成份類熱噴塗皮膜,以如申請專利範圍第5項所述的Y-O-F-Al多成份類熱噴塗皮膜的方法形成,厚度為50至400μm。A Y-O-F-Al multi-component thermal spray coating is formed by the method of the Y-O-F-Al multi-component thermal spray coating described in item 5 of the scope of patent application, and has a thickness of 50 to 400 μm. 一種Y-O-F-Al多成份類熱噴塗皮膜,其中,作為構成元素,包括釔(Y)、氧(O)、氟(F)及鋁(Al),鋁元素相對於該釔和氟的重量比(Al/Y+F)為0.025至0.25。A YOF-Al multi-component thermal spray coating film, which includes yttrium (Y), oxygen (O), fluorine (F), and aluminum (Al) as constituent elements. The weight ratio of the aluminum element to the yttrium and fluorine ( Al / Y + F) is 0.025 to 0.25. 如申請專利範圍第9項所述的Y-O-F-Al多成份類熱噴塗皮膜,其中,氟相對於釔的重量比(F/Y)為0.7至1.3。The Y-O-F-Al multi-component thermal spray coating according to item 9 of the scope of the patent application, wherein the weight ratio (F / Y) of fluorine to yttrium is 0.7 to 1.3.
TW107126592A 2017-12-19 2018-07-31 Material for thermal spray, thermal spray coating using the same and manufacture methods thereof TWI779071B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020170174942A KR102395660B1 (en) 2017-12-19 2017-12-19 Powder for thermal spray and thermal spray coating using the same
KR10-2017-0174942 2017-12-19
??10-2017-0174942 2017-12-19

Publications (2)

Publication Number Publication Date
TW201927724A true TW201927724A (en) 2019-07-16
TWI779071B TWI779071B (en) 2022-10-01

Family

ID=66992748

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107126592A TWI779071B (en) 2017-12-19 2018-07-31 Material for thermal spray, thermal spray coating using the same and manufacture methods thereof

Country Status (3)

Country Link
KR (1) KR102395660B1 (en)
TW (1) TWI779071B (en)
WO (1) WO2019124660A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7115582B2 (en) * 2020-04-30 2022-08-09 Toto株式会社 COMPOSITE STRUCTURES AND SEMICONDUCTOR MANUFACTURING EQUIPMENT WITH COMPOSITE STRUCTURES

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4277973B2 (en) * 2001-07-19 2009-06-10 日本碍子株式会社 Yttria-alumina composite oxide film production method, yttria-alumina composite oxide film, and corrosion-resistant member
JP2008251765A (en) * 2007-03-30 2008-10-16 Hitachi High-Technologies Corp Plasma etching equipment
JP4591722B2 (en) * 2008-01-24 2010-12-01 信越化学工業株式会社 Manufacturing method of ceramic sprayed member
US20090214825A1 (en) * 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
JP2010156009A (en) * 2008-12-26 2010-07-15 Hitachi High-Technologies Corp Method for forming thermal spray coating in plasma etching apparatus
JP5670862B2 (en) * 2011-11-02 2015-02-18 トーカロ株式会社 Method for forming densified layer in thermal spray coating
US20130288037A1 (en) * 2012-04-27 2013-10-31 Applied Materials, Inc. Plasma spray coating process enhancement for critical chamber components
JP6128362B2 (en) 2015-02-10 2017-05-17 日本イットリウム株式会社 Film forming powder and film forming material
US10106466B2 (en) 2015-05-08 2018-10-23 Tokyo Electron Limited Thermal spray material, thermal spray coating and thermal spray coated article
TWI751106B (en) 2015-05-08 2022-01-01 日商東京威力科創股份有限公司 Thermal spray material, thermal spray coating and thermal spray coated article
US10138167B2 (en) 2015-05-08 2018-11-27 Tokyo Electron Limited Thermal spray material, thermal spray coating and thermal spray coated article
JP6500681B2 (en) 2015-07-31 2019-04-17 信越化学工業株式会社 Yttrium-based thermal spray coating and method for producing the same
KR101721232B1 (en) * 2015-10-02 2017-03-29 주식회사 싸이노스 Method for forming plasma resistant coating layer
JP6384536B2 (en) * 2015-10-23 2018-09-05 信越化学工業株式会社 Yttrium fluoride spray material and method for producing yttrium oxyfluoride film-forming component

Also Published As

Publication number Publication date
WO2019124660A1 (en) 2019-06-27
KR102395660B1 (en) 2022-05-10
TWI779071B (en) 2022-10-01
KR20190073790A (en) 2019-06-27

Similar Documents

Publication Publication Date Title
TWI427188B (en) Thermal spray powder, method for forming thermal spray coating, and plasma resistant member
KR102266656B1 (en) Yittrium granular powder for thermal spray and thermal spray coating produced using the same
KR102266655B1 (en) The method of producing thermal spray coating using the yittrium powder and the yittrium coating produced by the mothod
JP4560387B2 (en) Thermal spray powder, thermal spraying method and thermal spray coating
TW201825437A (en) Thermal spray material and thermal spray coated article
JP6926095B2 (en) Material for thermal spraying
TWI786884B (en) Yittrium granular powder for thermal spray and thermal spray coating produced using the same
JP6926096B2 (en) Material for thermal spraying
TWI779071B (en) Material for thermal spray, thermal spray coating using the same and manufacture methods thereof
JP2017061738A (en) Thermal spray material
JP2009280483A (en) Corrosion resistant member, method for producing the same and treatment device
JP2009029686A (en) Corrosion-resistant member, its production method, and its treatment apparatus
JP2007081218A (en) Member for vacuum device
US20240043982A1 (en) Thermal spray material, thermal spray coating, method for forming thermal spray coating, and component for plasma etching device
US20240229216A1 (en) Method for manufacturing thermal spray coating and yttrium-based thermal spray coating manufactured by the same
JP2006097114A (en) Corrosion-resistant spray deposit member
TW202144597A (en) Novel tungsten-based thermal-sprayed coating and thermal-spraying material for obtaining the same
CN118326314A (en) Method for preparing thermal spraying coating and yttrium-based thermal spraying coating prepared by using same
CN118291906A (en) Material for thermal spraying
JP2006265619A (en) Corrosion resistant member and method for producing the same

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent