TW201922868A - Optical film being excellent in bending resistance and producing excellent stability in terms of optical properties under high temperature and high humidity - Google Patents

Optical film being excellent in bending resistance and producing excellent stability in terms of optical properties under high temperature and high humidity Download PDF

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TW201922868A
TW201922868A TW107136872A TW107136872A TW201922868A TW 201922868 A TW201922868 A TW 201922868A TW 107136872 A TW107136872 A TW 107136872A TW 107136872 A TW107136872 A TW 107136872A TW 201922868 A TW201922868 A TW 201922868A
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optical film
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片宝蓝
池內淳一
眞鍋佳久
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日商住友化學股份有限公司
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    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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    • G02B5/00Optical elements other than lenses
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Abstract

An object of the present invention is to provide an optical film which is excellent in bending resistance and producing excellent stability in terms of optical properties under high temperature and high humidity. The optical film of the present invention contains a polyamide-imide resin and satisfies the relationship in the formula (1): [Delta]Hz < 0.5 (1). (In the formula (1), [Delta]Hz represents Hza-Hzb; Hza represents the haze (%) of the optical film after the mandrel test (according to JIS K 5600-5-1:1999), which the bending radius of 1 mm is restored to a planar shape after bending once at room temperature; Hzb represents the haze (%) of the optical film before the mandrel test.).

Description

光學膜Optical film

本發明係關於一種用作可撓性顯示器之材料之光學膜。The invention relates to an optical film used as a material of a flexible display.

液晶顯示裝置或有機EL(Electroluminescence,電致發光)顯示裝置等圖像顯示裝置被廣泛應用於行動電話或智慧型手錶等各種用途。一直使用玻璃作為此種圖像顯示裝置之前面板,但玻璃非常剛直,容易破裂,因此難以用作可撓性顯示器之前面板材料。作為替代玻璃之材料之一,有聚醯胺醯亞胺樹脂,對使用該聚醯胺醯亞胺樹脂之耐熱性等較高之聚醯胺醯亞胺膜進行有研究(例如專利文獻1)。
[先前技術文獻]
[專利文獻]
Image display devices such as liquid crystal display devices or organic EL (Electroluminescence) display devices are widely used in various applications such as mobile phones or smart watches. Glass has been used as the front panel of such image display devices, but the glass is very rigid and easily broken, so it is difficult to use as a front panel material for flexible displays. As one of the materials for replacing glass, there is polyimide amide imide resin, and research has been conducted on a polyimide amide imide film having high heat resistance, etc., using the polyimide amide imide resin (for example, Patent Document 1) .
[Prior Technical Literature]
[Patent Literature]

[專利文獻1]日本專利特表2014-528490號公報[Patent Document 1] Japanese Patent Special Publication No. 2014-528490

[發明所欲解決之問題][Problems to be solved by the invention]

但是,根據本發明者之研究,可知於使用此種聚醯胺醯亞胺膜(光學膜)作為可撓性顯示器材料時,有耐彎曲性或高溫、高濕下之光學特性之穩定性並不充分之情形。However, according to the research of the present inventors, it is known that when such a polyimide amide imide film (optical film) is used as a flexible display material, it has stability in bending resistance or optical characteristics under high temperature and high humidity. Insufficient circumstances.

因此,本發明之目的在於提供一種具有優異之耐彎曲性且高溫、高濕下之光學特性之穩定性優異之光學膜。
[解決問題之技術手段]
Therefore, an object of the present invention is to provide an optical film having excellent bending resistance and excellent stability of optical characteristics at high temperature and high humidity.
[Technical means to solve the problem]

本發明者為了解決上述問題而努力研究,結果完成本發明。即,本發明包括以下之較佳態樣。
[1]一種光學膜,其係含有聚醯胺醯亞胺樹脂而成者,且
滿足式(1)之關係:
ΔHz<0.5 (1)
[式(1)中,ΔHz表示Hza -Hzb ,Hza 表示於室溫下以彎曲半徑1 mm彎折1次並恢復成平面狀之心軸試驗(依據JIS K 5600-5-1:1999)後之光學膜之霧度(%),Hzb 表示該心軸試驗前之光學膜之霧度(%)]。
[2]如[1]所記載之光學膜,其中上述聚醯胺醯亞胺樹脂係包含源自二羧酸化合物之結構單元、源自四羧酸化合物之結構單元、及源自二胺化合物之結構單元之樹脂,且進而包含平均一次粒徑為100 nm以下之二氧化矽粒子。
[3]如[2]所記載之光學膜,其中上述二氧化矽粒子之平均一次粒徑為80 nm以下。
[4]如[2]或[3]所記載之光學膜,其中構成上述聚醯胺醯亞胺樹脂之源自二羧酸化合物之結構單元包含源自式(I)
[化1]

[式(I)中,R1 及R2 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R3 ~R6 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R3 ~R6 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元,且
滿足式(2)之關係:
0<RSi ≦32+2/3×R(I) (2)
[式(2)中,RSi 表示二氧化矽粒子相對於光學膜之質量之含量(質量%),R(I) 表示源自式(I)所表示之化合物之結構單元相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數之含量(莫耳%)]。
[5]如[4]所記載之光學膜,其中上述式(2)為5≦RSi ≦50。
[6]如[2]至[5]中任一項所記載之光學膜,其中構成上述聚醯胺醯亞胺樹脂之源自四羧酸化合物之結構單元包含源自式(II)
[化2]

[式(II)中,R7 ~R14 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R7 ~R14 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元,且構成上述聚醯胺醯亞胺樹脂之源自二胺化合物之結構單元包含源自式(III)
[化3]

[式(III)中,R15 ~R22 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R15 ~R22 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元。
[7]如[2]至[6]中任一項所記載之光學膜,其中構成聚醯胺醯亞胺樹脂之源自二羧酸化合物之結構單元包含源自式(IV)
[化4]

[式(IV)中,R23 及R24 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R25 ~R32 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R25 ~R32 中所含之氫原子可分別獨立地經鹵素原子取代,A分別獨立地表示-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-NR33 -,R33 表示可經鹵素原子取代之碳數1~12之烴基,m表示1~4之整數]
所表示之化合物之結構單元。
[發明之效果]
The inventor of the present invention worked hard to solve the above-mentioned problems, and as a result, completed the present invention. That is, the present invention includes the following preferred aspects.
[1] An optical film, which is made of polyimide amide imide resin and satisfies the relationship of formula (1):
ΔHz < 0.5 (1)
[In formula (1), ΔHz represents Hz a- Hz b , Hz a represents a mandrel test that bends once at a bending radius of 1 mm and returns to a planar shape at room temperature (according to JIS K 5600-5-1: The haze (%) of the optical film after 1999), Hz b represents the haze (%) of the optical film before the mandrel test].
[2] The optical film according to [1], wherein the polyamidoamide resin includes a structural unit derived from a dicarboxylic acid compound, a structural unit derived from a tetracarboxylic acid compound, and a diamine compound The resin of the structural unit, and further contains silica particles with an average primary particle size of 100 nm or less.
[3] The optical film according to [2], wherein the average primary particle diameter of the silicon dioxide particles is 80 nm or less.
[4] The optical film according to [2] or [3], wherein the structural unit derived from the dicarboxylic acid compound constituting the polyamidoamide resin includes the formula (I)
[Chem 1]

[In formula (I), R 1 and R 2 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 3 to R 6 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 3 to R 6 may be independently substituted by halogen atoms]
The structural unit of the compound represented, and satisfy the relationship of formula (2):
0 < R Si ≦ 32 + 2/3 × R (I) (2)
[In formula (2), R Si represents the content (mass%) of silicon dioxide particles relative to the mass of the optical film, and R (I) represents the structural unit derived from the compound represented by formula (I) relative to the constituent polyacrylamide The content of the total number of moles of all structural units of the amide imine resin (mol%)].
[5] The optical film according to [4], wherein the above formula (2) is 5 ≦ R Si ≦ 50.
[6] The optical film according to any one of [2] to [5], wherein the structural unit derived from the tetracarboxylic acid compound that constitutes the polyamidoamide resin includes the formula (II)
[Chem 2]

[In formula (II), R 7 to R 14 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 7 to R 14 may be Independently substituted by a halogen atom]
The structural unit of the compound represented, and the structural unit derived from the diamine compound constituting the above-mentioned polyamidoamide resin includes the formula (III)
[Chemical 3]

[In formula (III), R 15 to R 22 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 15 to R 22 may be Independently substituted by a halogen atom]
The structural unit of the compound represented.
[7] The optical film as described in any one of [2] to [6], wherein the structural unit derived from the dicarboxylic acid compound constituting the polyimide amide imide resin contains a compound derived from formula (IV)
[Chem 4]

[In formula (IV), R 23 and R 24 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 25 to R 32 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 25 to R 32 may be independently substituted by halogen atoms, and A independently represents -O-, -CH 2- , -CH 2 -CH 2- , -CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2- , -S-, -CO- or -NR 33- , R 33 represents a C1-C12 hydrocarbon group which may be substituted by a halogen atom, m represents an integer of 1-4]
The structural unit of the compound represented.
[Effect of invention]

本發明之光學膜具有優異之耐彎曲性,且高溫、高濕下之光學特性之穩定性優異。The optical film of the present invention has excellent bending resistance and excellent stability of optical characteristics at high temperature and high humidity.

本發明之光學膜係含有聚醯胺醯亞胺樹脂而成。The optical film of the present invention is made of polyamidoamide resin.

<聚醯胺醯亞胺樹脂>
本說明書中,所謂聚醯胺醯亞胺樹脂表示含有包含醯亞胺基之重複結構單元與包含醯胺基之重複結構單元兩者的聚合物。聚醯胺醯亞胺樹脂較佳為由包含二羧酸化合物、四羧酸化合物、及視需要之三羧酸化合物之羧酸化合物與二胺化合物共聚而成之樹脂。因此,本發明之聚醯胺醯亞胺樹脂含有包含源自二羧酸化合物之結構單元、源自四羧酸化合物之結構單元、及視需要之源自三羧酸化合物之結構單元的源自羧酸化合物之結構單元與源自二胺化合物之結構單元。再者,本說明書中,有時將「源自化合物之結構單元」簡稱為「單元」。例如,有時將源自二羧酸「化合物之結構單元」稱為二羧酸「單元」,將源自四羧酸「化合物之結構單元」稱為四羧酸「單元」,將源自二胺「化合物之結構單元」稱為二胺「單元」。
< Polyamide amide imide resin >
In this specification, the polyimide amide imine resin means a polymer containing both a repeating structural unit containing an amide imide group and a repeating structural unit containing an amide imide group. The polyamide amide imine resin is preferably a resin obtained by copolymerizing a carboxylic acid compound containing a dicarboxylic acid compound, a tetracarboxylic acid compound, and a tricarboxylic acid compound if necessary, and a diamine compound. Therefore, the polyamidimide resin of the present invention contains a structural unit derived from a dicarboxylic acid compound, a structural unit derived from a tetracarboxylic acid compound, and a structural unit derived from a tricarboxylic acid compound as necessary The structural unit of the carboxylic acid compound and the structural unit derived from the diamine compound. In addition, in this specification, the "structural unit derived from a compound" may be simply referred to as "unit". For example, the “structural unit of compound” derived from dicarboxylic acid is sometimes referred to as “unit” of dicarboxylic acid, and the “structural unit of compound” derived from tetracarboxylic acid is referred to as “unit” of tetracarboxylic acid, which is derived from di The amine "structural unit of the compound" is called the diamine "unit".

構成聚醯胺醯亞胺樹脂之源自二羧酸化合物之結構單元較佳為包含源自式(I)
[化5]

[式(I)中,R1 及R2 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R3 ~R6 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R3 ~R6 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元(有時稱為源自二羧酸化合物(I)之結構單元)。
The structural unit derived from the dicarboxylic acid compound that constitutes the polyimide amide imine resin preferably contains a compound derived from the formula (I)
[Chemical 5]

[In formula (I), R 1 and R 2 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 3 to R 6 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 3 to R 6 may be independently substituted by halogen atoms]
The structural unit of the compound represented (sometimes referred to as the structural unit derived from the dicarboxylic acid compound (I)).

又,構成聚醯胺醯亞胺樹脂之源自四羧酸化合物之結構單元較佳為包含源自式(II)
[化6]

[式(II)中,R7 ~R14 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R7 ~R14 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元(有時稱為源自四羧酸化合物(II)之結構單元),構成聚醯胺醯亞胺樹脂之源自二胺化合物之結構單元較佳為包含源自式(III)
[化7]

[式(III)中,R15 ~R22 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R15 ~R22 中所含之氫原子可分別獨立地經鹵素原子取代]
所表示之化合物之結構單元(有時稱為源自二胺化合物(III)之結構單元)。此處,於聚醯胺醯亞胺樹脂中,源自二羧酸化合物(I)之結構單元可經由藉由二羧酸化合物(I)與二胺化合物之反應(縮聚)所形成之醯胺基而與源自二胺化合物之結構單元鍵結。源自四羧酸化合物(II)之結構單元可經由藉由四羧酸化合物(II)與二胺化合物之反應(縮聚)所形成之醯亞胺基而與源自二胺化合物之結構單元鍵結。源自二胺化合物(III)之結構單元可經由藉由二胺化合物(III)與二羧酸、三羧酸或四羧酸之反應(縮聚)所形成之醯胺基或醯亞胺基而與源自二羧酸化合物之結構單元、源自三羧酸化合物之結構單元或源自四羧酸化合物之結構單元鍵結。
In addition, the structural unit derived from the tetracarboxylic acid compound constituting the polyimide amide imine resin preferably contains the formula (II)
[化 6]

[In formula (II), R 7 to R 14 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 7 to R 14 may be Independently substituted by a halogen atom]
The structural unit of the compound represented (sometimes referred to as the structural unit derived from the tetracarboxylic acid compound (II)), the structural unit derived from the diamine compound constituting the polyimide amide imide resin preferably contains a formula derived from the formula (III)
[化 7]

[In formula (III), R 15 to R 22 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 15 to R 22 may be Independently substituted by a halogen atom]
The structural unit of the compound represented (sometimes referred to as the structural unit derived from the diamine compound (III)). Here, in the polyamidoamide resin, the structural unit derived from the dicarboxylic acid compound (I) can be formed by the reaction (condensation) of the diamine compound (I) with the diamine compound. Group bonded to the structural unit derived from the diamine compound. The structural unit derived from the tetracarboxylic acid compound (II) can be bonded to the structural unit derived from the diamine compound through the amide imide group formed by the reaction (polycondensation) of the tetracarboxylic acid compound (II) and the diamine compound Knot. The structural unit derived from the diamine compound (III) can be formed by the amide group or iminium group formed by the reaction (polycondensation) of the diamine compound (III) with a dicarboxylic acid, tricarboxylic acid or tetracarboxylic acid It is bonded to a structural unit derived from a dicarboxylic acid compound, a structural unit derived from a tricarboxylic acid compound, or a structural unit derived from a tetracarboxylic acid compound.

構成聚醯胺醯亞胺樹脂之二羧酸單元(較佳為源自二羧酸化合物(I)之結構單元)、四羧酸單元(較佳為源自四羧酸化合物(II)之結構單元)及二胺單元(較佳為源自二胺化合物(III)之結構單元)亦可分別含有1種或2種以上。The dicarboxylic acid unit (preferably a structural unit derived from the dicarboxylic acid compound (I)) and the tetracarboxylic acid unit (preferably derived from the structure of the tetracarboxylic acid compound (II)) constituting the polyimide amide imine resin Unit) and a diamine unit (preferably a structural unit derived from the diamine compound (III)) may contain one kind or two or more kinds, respectively.

式(I)中,R1 及R2 分別獨立為羥基(-OH)、甲氧基(-OMe)、乙氧基(-OEt)、正丙氧基(-OPr)、正丁氧基(-OBu)或氯原子(-Cl),較佳為氯原子(-Cl)。In formula (I), R 1 and R 2 are independently hydroxyl (-OH), methoxy (-OMe), ethoxy (-OEt), n-propoxy (-OPr), n-butoxy ( -OBu) or a chlorine atom (-Cl), preferably a chlorine atom (-Cl).

式(I)中,R3 、R4 、R5 及R6 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基。作為碳數1~6之烷基,例如可列舉甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基等。In formula (I), R 3 , R 4 , R 5 and R 6 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group. Examples of the alkyl group having 1 to 6 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, n-pentyl, and 2-methyl- Butyl, 3-methylbutyl, 2-ethyl-propyl, n-hexyl, etc.

作為碳數6~12之芳基,例如可列舉苯基、甲苯基、二甲苯基、萘基、聯苯基等。R3 ~R6 中所含之氫原子可分別獨立地經鹵素原子取代,作為鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子。又,作為可經鹵素原子取代之碳數6~12之芳基,例如可列舉:氯苯基、二氯苯基、溴苯基、二溴苯基、氯溴苯基、氯聯苯基、二氯聯苯基、溴苯基、二溴苯基、氯萘基、二氯萘基、溴萘基、二溴萘基等。Examples of the aryl group having 6 to 12 carbon atoms include phenyl, tolyl, xylyl, naphthyl, and biphenyl. The hydrogen atoms contained in R 3 to R 6 may each be independently substituted with a halogen atom, and examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the C 6-12 aryl group which may be substituted with a halogen atom include chlorophenyl, dichlorophenyl, bromophenyl, dibromophenyl, chlorobromophenyl, chlorobiphenyl, Dichlorobiphenyl, bromophenyl, dibromophenyl, chloronaphthyl, dichloronaphthyl, bromonaphthyl, dibromonaphthyl, etc.

於該等中,就光學膜之耐彎曲性之觀點而言,R3 ~R6 分別獨立地較佳為氫原子、甲基、氟基、氯基或三氟甲基,尤佳為氫原子。再者,本發明中,耐彎曲性(彎曲耐性)表示於重複將光學膜連續地彎折並恢復之情形時光學膜不易產生傷痕、破裂、白濁等之特性。Among these, from the viewpoint of the bending resistance of the optical film, R 3 to R 6 are each independently preferably a hydrogen atom, a methyl group, a fluoro group, a chloro group, or a trifluoromethyl group, particularly preferably a hydrogen atom . In addition, in the present invention, the bending resistance (bending resistance) refers to the characteristics that the optical film is less likely to cause scratches, cracks, white turbidity, etc. when the optical film is repeatedly bent and recovered continuously.

於本發明之更佳之實施態樣中,源自式(I)所表示之化合物之結構單元係源自式(I')
[化8]

所表示之化合物之結構單元(有時稱為源自二羧酸化合物(I')之結構單元)。若聚醯胺醯亞胺樹脂含有源自二羧酸化合物(I')之結構單元,則容易提高光學膜之機械強度、例如彈性模數或耐彎曲性。
In a better embodiment of the present invention, the structural unit derived from the compound represented by formula (I) is derived from formula (I ')
[Chem 8]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the dicarboxylic acid compound (I ′)). If the polyimide amide imine resin contains a structural unit derived from a dicarboxylic acid compound (I ′), it is easy to improve the mechanical strength of the optical film, such as elastic modulus or bending resistance.

於式(II)中,R7 、R8 、R9 、R10 、R11 、R12 、R13 及R14 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基。作為碳數1~6之烷基,可列舉R3 ~R6 之作為碳數1~6之烷基所例示者。又,作為碳數6~12之芳基,可列舉R3 ~R6 之作為碳數6~12之芳基所例示者。R7 ~R14 中所含之氫原子可分別獨立地經鹵素原子取代,作為鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子。又,作為可經鹵素原子取代之碳數6~12之芳基,可列舉R3 ~R6 之作為可經鹵素原子取代之碳數6~12之芳基所例示者。In formula (II), R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 and R 14 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or 6 to 6 carbon atoms The aryl group of 12. Examples of the alkyl group having 1 to 6 carbon atoms include those exemplified as the alkyl group having 1 to 6 carbon atoms in R 3 to R 6 . In addition, examples of the aryl group having 6 to 12 carbon atoms include those exemplified as the aryl group having 6 to 12 carbon atoms in R 3 to R 6 . The hydrogen atoms contained in R 7 to R 14 may each be independently substituted with a halogen atom, and examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the C 6-12 aryl group which may be substituted with a halogen atom include R 3 to R 6 exemplified as the C 6-12 aryl group which may be substituted with a halogen atom.

於該等中,就容易提高光學膜之耐彎曲性及透明性之觀點而言,R7 ~R14 分別獨立地較佳為氫原子、甲基、氟基、氯基或三氟甲基,更佳為R7 、R8 、R9 、R12 、R13 、及R14 為氫原子,R10 及R11 為氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R10 及R11 為甲基或三氟甲基。Among these, from the viewpoint of easily improving the bending resistance and transparency of the optical film, R 7 to R 14 are each independently preferably a hydrogen atom, a methyl group, a fluoro group, a chloro group, or a trifluoromethyl group, More preferably, R 7 , R 8 , R 9 , R 12 , R 13 , and R 14 are hydrogen atoms, and R 10 and R 11 are hydrogen atoms, methyl groups, fluoro groups, chloro groups, or trifluoromethyl groups, particularly preferably R 10 and R 11 are methyl or trifluoromethyl.

於本發明之較佳之實施態樣中,源自式(II)所表示之化合物之結構單元係源自式(II')
[化9]

所表示之化合物之結構單元(有時稱為源自四羧酸化合物(II')之結構單元)。若聚醯胺醯亞胺樹脂含有源自四羧酸化合物(II')之結構單元,則可提高光學膜之耐彎曲性及透明性(例如霧度、全光線透過率)。進而,藉由含有氟元素之骨架,可提高聚醯胺醯亞胺樹脂對溶劑之溶解性,將聚醯胺醯亞胺清漆之黏度抑制為較低,又,容易製造光學膜。
In a preferred embodiment of the present invention, the structural unit derived from the compound represented by formula (II) is derived from formula (II ')
[化 9]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the tetracarboxylic acid compound (II ')). If the polyimide amide imine resin contains a structural unit derived from a tetracarboxylic acid compound (II '), the bending resistance and transparency (for example, haze and total light transmittance) of the optical film can be improved. Furthermore, the skeleton containing fluorine element can improve the solubility of the polyamidoamide imide resin in the solvent, suppress the viscosity of the polyamidoamide imine varnish to be low, and facilitate the manufacture of optical films.

於式(III)中,R15 、R16 、R17 、R18 、R19 、R20 、R21 、及R22 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基。作為碳數1~6之烷基,可列舉R3 ~R6 之作為碳數1~6之烷基所例示者。作為碳數6~12之芳基,可列舉R3 ~R6 之作為碳數6~12之芳基所例示者。R15 ~R22 中所含之氫原子可分別獨立地經鹵素原子取代,作為鹵素原子,例如可列舉氟原子、氯原子、溴原子、碘原子。又,作為可經鹵素原子取代之碳數6~12之芳基,可列舉R3 ~R6 之作為可經鹵素原子取代之碳數6~12之芳基所例示者。In formula (III), R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , and R 22 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or 6 carbon atoms ~ 12 aryl groups. Examples of the alkyl group having 1 to 6 carbon atoms include those exemplified as the alkyl group having 1 to 6 carbon atoms in R 3 to R 6 . Examples of the aryl group having 6 to 12 carbon atoms include those exemplified as the aryl group having 6 to 12 carbon atoms in R 3 to R 6 . The hydrogen atoms contained in R 15 to R 22 may each be independently substituted with a halogen atom, and examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the C 6-12 aryl group which may be substituted with a halogen atom include R 3 to R 6 exemplified as the C 6-12 aryl group which may be substituted with a halogen atom.

於該等中,就容易提高光學膜之透明性之觀點而言,R15 ~R22 分別獨立地較佳為氫原子、甲基、氟基、氯基或三氟甲基,更佳為R15 、R17 、R18 、R19 、R20 、及R22 為氫原子,R16 及R21 為氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R16 及R21 為甲基或三氟甲基。Among these, from the viewpoint of easily improving the transparency of the optical film, R 15 to R 22 are each independently preferably a hydrogen atom, a methyl group, a fluoro group, a chloro group, or a trifluoromethyl group, more preferably R 15 , R 17 , R 18 , R 19 , R 20 , and R 22 are hydrogen atoms, R 16 and R 21 are hydrogen atoms, methyl, fluoro, chloro or trifluoromethyl, particularly preferably R 16 and R 21 is methyl or trifluoromethyl.

於本發明之較佳之實施態樣中,源自式(III)所表示之化合物之結構單元係源自式(III')
[化10]

所表示之化合物之結構單元(有時稱為源自二胺化合物(III')之結構單元)。若聚醯胺醯亞胺樹脂含有源自二胺化合物(III')之結構單元,則可提高光學膜之機械強度(例如彈性模數、耐彎曲性)及透明性。進而,藉由含有氟元素之骨架,可提高聚醯胺醯亞胺樹脂對溶劑之溶解性,將聚醯胺醯亞胺清漆之黏度抑制為較低,又,容易製造光學膜。
In a preferred embodiment of the present invention, the structural unit derived from the compound represented by formula (III) is derived from formula (III ')
[化 10]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the diamine compound (III ')). If the polyimide amide imine resin contains structural units derived from the diamine compound (III '), the mechanical strength (eg, elastic modulus, bending resistance) and transparency of the optical film can be improved. Furthermore, the skeleton containing fluorine element can improve the solubility of the polyamidoamide imide resin in the solvent, suppress the viscosity of the polyamidoamide imine varnish to be low, and facilitate the manufacture of optical films.

就容易提高光學膜之耐彎曲性及透明性之觀點而言,本發明之光學膜中所含之聚醯胺醯亞胺樹脂較佳為含有源自2個以上之芳香族烴環以單鍵及除芳香族基以外之二價基連結而成之芳香族二羧酸化合物之結構單元作為二羧酸單元。作為芳香族烴環,例如可列舉:苯環等單環式烴環;萘等縮合二環式烴環、聯苯等集合環烴環等多環式烴環,較佳為苯環。具體而言,較佳為含有源自式(IV)
[化11]

[式(IV)中,R23 及R24 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R25 ~R32 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R25 ~R32 中所含之氫原子可分別獨立地經鹵素原子取代,A分別獨立地表示-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 、-S-、-CO-或-NR33 -,R33 表示氫原子、可經鹵素原子取代之碳數1~12之烴基,m表示1~4之整數]
所表示之化合物之結構單元(有時稱為源自二羧酸化合物(IV)之結構單元)。
From the viewpoint of easily improving the bending resistance and transparency of the optical film, the polyamidoamide resin contained in the optical film of the present invention preferably contains a single bond derived from two or more aromatic hydrocarbon rings with a single bond The structural unit of the aromatic dicarboxylic acid compound connected with the divalent group other than the aromatic group serves as a dicarboxylic acid unit. Examples of the aromatic hydrocarbon ring include monocyclic hydrocarbon rings such as benzene rings; polycyclic hydrocarbon rings such as condensed bicyclic hydrocarbon rings such as naphthalene, and polycyclic hydrocarbon rings such as bicyclic hydrocarbon rings such as biphenyl, and preferably benzene rings. Specifically, it is preferable to contain the formula (IV)
[化 11]

[In formula (IV), R 23 and R 24 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 25 to R 32 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 25 to R 32 may be independently substituted by halogen atoms, and A independently represents -O-, -CH 2- , -CH 2 -CH 2- , -CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2 , -S-, -CO- or- NR 33- , R 33 represents a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms which may be substituted with a halogen atom, and m represents an integer of 1 to 4]
The structural unit of the compound represented (sometimes referred to as the structural unit derived from the dicarboxylic acid compound (IV)).

式(IV)中,就容易使乾燥溫度低溫化,又,容易獲得具有良好之耐彎曲性之光學膜之觀點而言,A分別獨立地表示-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-NR33 -,就容易獲得耐彎曲性優異之光學膜之觀點而言,較佳為表示-O-、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 或-S-,更佳為表示-O-、-CH2 -、-C(CH3 )2 -或-SO2 -,進而較佳為表示-O-。R23 及R24 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R25 、R26 、R27 、R28 、R29 、R30 、R31 、及R32 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基。作為碳數1~6之烷基,可列舉R3 ~R6 之作為碳數1~6之烷基所例示者。作為碳數6~12之芳基,可列舉R3 ~R6 之作為碳數6~12之芳基所例示者。R25 ~R32 中所含之氫原子可分別獨立地經鹵素原子取代,作為鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子。又,作為可經鹵素原子取代之碳數6~12之芳基,可列舉R3 ~R6 之作為可經鹵素原子取代之碳數6~12之芳基所例示者。R33 表示可經鹵素原子取代之碳數1~12之烴基。作為碳數1~12之烴基,可列舉R3 ~R6 之作為碳數1~6之烷基所例示者或作為碳數6~12之芳基所例示者。In formula (IV), from the viewpoint of easily lowering the drying temperature and easily obtaining an optical film having good bending resistance, A independently represents -O-, -CH 2- , and -CH 2- CH 2- , -CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2- , -S-, -CO- or -NR 33- , it is easy From the viewpoint of obtaining an optical film excellent in bending resistance, it preferably represents -O-, -CH 2- , -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2 or -S -, More preferably represents -O-, -CH 2- , -C (CH 3 ) 2 -or -SO 2- , and more preferably represents -O-. R 23 and R 24 independently represent a hydroxyl group, a methoxy group, an ethoxy group, a n-propoxy group, a n-butoxy group or a chlorine atom, R 25 , R 26 , R 27 , R 28 , R 29 , R 30 , R 31 and R 32 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group. Examples of the alkyl group having 1 to 6 carbon atoms include those exemplified as the alkyl group having 1 to 6 carbon atoms in R 3 to R 6 . Examples of the aryl group having 6 to 12 carbon atoms include those exemplified as the aryl group having 6 to 12 carbon atoms in R 3 to R 6 . The hydrogen atoms contained in R 25 to R 32 may each be independently substituted with a halogen atom, and examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the C 6-12 aryl group which may be substituted with a halogen atom include R 3 to R 6 exemplified as the C 6-12 aryl group which may be substituted with a halogen atom. R 33 represents a C 1-12 hydrocarbon group which may be substituted by a halogen atom. Examples of the hydrocarbon group having 1 to 12 carbon atoms include those exemplified as alkyl groups having 1 to 6 carbon atoms for R 3 to R 6 or aryl groups having 6 to 12 carbon atoms.

於式(IV)中,m表示1~4之整數,若m為該範圍內,則容易獲得具有良好之耐彎曲性、彈性模數之光學膜。又,於式(IV)中,m較佳為1~3之整數,更佳為1或2,進而較佳為1,若m為該範圍內,則容易進一步提高彈性模數。In formula (IV), m represents an integer of 1 to 4. If m is within this range, it is easy to obtain an optical film having good bending resistance and elastic modulus. In addition, in formula (IV), m is preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1, if m is within this range, it is easy to further increase the elastic modulus.

於該等中,就容易提高光學膜之耐彎曲性之觀點而言,R25 ~R32 較佳為氫原子或碳數1~6之烷基,更佳為氫原子或碳數1~3之烷基,進而較佳為氫原子。Among these, from the viewpoint of easily improving the bending resistance of the optical film, R 25 to R 32 are preferably a hydrogen atom or a C 1-6 alkyl group, more preferably a hydrogen atom or a C 1 to 3 carbon atom The alkyl group is more preferably a hydrogen atom.

於本發明之較佳之實施態樣中,源自式(IV)所表示之化合物之結構單元係源自式(IV')
[化12]

所表示之化合物之結構單元(有時稱為源自二羧酸化合物(IV')之結構單元)。若聚醯胺醯亞胺樹脂含有源自二羧酸化合物(IV')之結構單元,則可提高光學膜之耐彎曲性及透明性。進而,藉由含有氟元素之骨架,可提高聚醯胺醯亞胺樹脂對溶劑之溶解性,將聚醯胺醯亞胺清漆之黏度抑制為較低,又,容易製造光學膜。
In a preferred embodiment of the present invention, the structural unit derived from the compound represented by formula (IV) is derived from formula (IV ')
[Chem 12]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the dicarboxylic acid compound (IV ')). If the polyimide amide imine resin contains the structural unit derived from the dicarboxylic acid compound (IV '), the bending resistance and transparency of the optical film can be improved. Furthermore, the skeleton containing fluorine element can improve the solubility of the polyamidoamide imide resin in the solvent, suppress the viscosity of the polyamidoamide imine varnish to be low, and facilitate the manufacture of optical films.

於本發明之較佳之態樣中,本發明之聚醯胺醯亞胺樹脂係包含源自二羧酸化合物之結構單元、源自四羧酸化合物之結構單元、及源自二胺化合物之結構單元的樹脂。又,於本發明之更佳之態樣中,本發明之聚醯胺醯亞胺樹脂係包含源自二羧酸化合物(I)之結構單元、源自四羧酸化合物(II)之結構單元、源自二胺化合物(III)之結構單元、及源自二羧酸化合物(IV)之結構單元的樹脂。於本發明之更佳之態樣中,本發明之聚醯胺醯亞胺樹脂係包含源自二羧酸化合物(I')之結構單元、源自四羧酸化合物(II')之結構單元、源自二胺化合物(III')之結構單元、及源自二羧酸化合物(IV')之結構單元的樹脂。包含具有此種結構單元之聚醯胺醯亞胺樹脂之光學膜於耐彎曲性及透明性(尤其是維持高溫、高濕環境下之透明性)之方面有利。In a preferred aspect of the present invention, the polyamidoamide resin of the present invention includes a structural unit derived from a dicarboxylic acid compound, a structural unit derived from a tetracarboxylic acid compound, and a structure derived from a diamine compound Unit resin. Furthermore, in a more preferred aspect of the present invention, the polyamidoamide resin of the present invention includes a structural unit derived from a dicarboxylic acid compound (I), a structural unit derived from a tetracarboxylic acid compound (II), Resin derived from the structural unit of the diamine compound (III) and derived from the structural unit of the dicarboxylic acid compound (IV). In a more preferred aspect of the present invention, the polyamidoamide resin of the present invention includes a structural unit derived from a dicarboxylic acid compound (I '), a structural unit derived from a tetracarboxylic acid compound (II'), The resin derived from the structural unit of the diamine compound (III ') and the structural unit derived from the dicarboxylic acid compound (IV'). The optical film including the polyamidoamide resin having such a structural unit is advantageous in terms of bending resistance and transparency (especially maintaining transparency under high temperature and high humidity environment).

於本發明之一實施態樣中,聚醯胺醯亞胺樹脂可於無損光學膜之各種物性之範圍內包含上述所例示之源自二羧酸化合物(I)之結構單元、源自二羧酸化合物(IV)之結構單元、源自四羧酸化合物(II)之結構單元、及源自二胺化合物(III)之結構單元以外之其他結構單元。In one embodiment of the present invention, the polyimide amide imine resin may contain the structural unit derived from the dicarboxylic acid compound (I) and the dicarboxyl group exemplified above within the range of non-destructive various physical properties of the optical film. Structural units other than the structural unit of the acid compound (IV), the structural unit derived from the tetracarboxylic acid compound (II), and the structural unit derived from the diamine compound (III).

作為其他結構單元,例如可列舉:源自二羧酸化合物(I)之結構單元及源自二羧酸化合物(IV)之結構單元以外之其他源自二羧酸化合物之結構單元、源自四羧酸化合物(II)之結構單元以外之其他源自四羧酸化合物之結構單元、源自三羧酸化合物之結構單元、源自二胺化合物(III)之結構單元以外之其他源自二胺化合物之結構單元等。又,上述二羧酸化合物表示二羧酸或二羧酸衍生物(例如二羧酸之醯氯或酸酐),上述三羧酸化合物表示三羧酸或三羧酸衍生物(例如三羧酸之醯氯或酸酐),上述四羧酸化合物表示四羧酸或四羧酸衍生物(例如四羧酸之醯氯或酸酐)。Examples of other structural units include structural units derived from the dicarboxylic acid compound (I) and structural units derived from the dicarboxylic acid compound other than the structural units derived from the dicarboxylic acid compound (IV), and derived from tetracarboxylic acid compounds. Other than the structural unit of the carboxylic acid compound (II), the structural unit derived from the tetracarboxylic acid compound, the structural unit derived from the tricarboxylic acid compound, and the structural unit derived from the diamine compound (III) are derived from the diamine Structural units of compounds, etc. In addition, the above-mentioned dicarboxylic acid compound represents a dicarboxylic acid or a dicarboxylic acid derivative (for example, dicarboxylic acid chloride or acid anhydride), and the above-mentioned tricarboxylic acid compound represents a tricarboxylic acid or a tricarboxylic acid derivative (for example, tricarboxylic acid (Acyl chloride or acid anhydride), the above-mentioned tetracarboxylic acid compound means a tetracarboxylic acid or a tetracarboxylic acid derivative (for example, tetracarboxylic acid chloride or acid anhydride).

作為其他二羧酸單元,例如可列舉源自式(V)
[化13]

所表示之化合物之結構單元(有時稱為源自二羧酸化合物(V)之結構單元)。作為二羧酸單元,可含有1種或2種以上之源自二羧酸化合物(V)之結構單元,於含有2種以上之情形時,於各源自二羧酸化合物(V)之結構單元中,Z之種類不同。
Examples of other dicarboxylic acid units include those derived from formula (V)
[Chem 13]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the dicarboxylic acid compound (V)). As the dicarboxylic acid unit, one or two or more structural units derived from the dicarboxylic acid compound (V) may be contained. When two or more structural units are included, each structure derived from the dicarboxylic acid compound (V) In the unit, the type of Z is different.

於式(V)中,Z表示式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(27)及式(29)所表示之基之鍵結鍵中之不鄰接之2個被取代為氫原子之基或碳數6以下之二價之鏈式烴基。R34 及R35 分別獨立為羥基(-OH)、甲氧基(-OMe)、乙氧基(-OEt)、正丙氧基(-OPr)、正丁氧基(-OBu)或氯原子(-Cl),較佳為氯原子(-Cl)。In formula (V), Z represents formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (27) and formula (29) The non-adjacent two of the bonding bonds of the base are substituted with hydrogen atoms or a divalent chain hydrocarbon group with a carbon number of 6 or less. R 34 and R 35 are independently hydroxyl (-OH), methoxy (-OMe), ethoxy (-OEt), n-propoxy (-OPr), n-butoxy (-OBu) or chlorine atom (-Cl), preferably a chlorine atom (-Cl).

作為構成二羧酸單元之二羧酸化合物之具體例,例如可列舉:4,4'-氧基雙苯甲酸、對苯二甲酸、間苯二甲酸、萘二羧酸、4,4'-聯苯二羧酸、3,3'-聯苯二羧酸、2個苯甲酸以單鍵、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物等芳香族二羧酸及其等之衍生物(例如醯氯、酸酐);碳數8以下之鏈式烴之二羧酸化合物等脂肪族二羧酸及其等之衍生物(例如醯氯、酯體)等。該等二羧酸化合物可單獨使用或組合使用2種以上。於該等中,為了達成兼顧光學膜之彈性模數與耐彎曲性,較佳為將式(I)所表示之化合物與上述式(IV)所表示之化合物併用。作為具體例,較佳為將4,4'-氧基雙(苯甲醯氯)與對苯二甲醯氯併用。Specific examples of the dicarboxylic acid compound constituting the dicarboxylic acid unit include, for example, 4,4′-oxybisbenzoic acid, terephthalic acid, isophthalic acid, naphthalene dicarboxylic acid, and 4,4′- Biphenyl dicarboxylic acid, 3,3'-biphenyl dicarboxylic acid, two benzoic acids with a single bond, -CH 2- , -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2- Aromatic dicarboxylic acids and their derivatives (such as acetyl chloride and acid anhydrides) linked by phenylene-linked compounds; aliphatic dicarboxylic acids such as dicarboxylic acid compounds of chain hydrocarbons with a carbon number of 8 or less And their derivatives (such as acetyl chloride, ester) and so on. These dicarboxylic acid compounds can be used individually or in combination of 2 or more types. Among these, in order to achieve both the elastic modulus and bending resistance of the optical film, it is preferable to use the compound represented by the formula (I) in combination with the compound represented by the above formula (IV). As a specific example, it is preferable to use 4,4′-oxybis (benzoyl chloride) and terephthaloyl chloride together.

作為其他四羧酸單元,例如可列舉源自式(VI)
[化14]

所表示之化合物之結構單元(有時稱為源自四羧酸化合物(VI)之結構單元)、及源自式(VII)
[化15]

所表示之化合物之結構單元(有時稱為源自四羧酸化合物(VII)之結構單元)。此處,於本發明之聚醯胺醯亞胺樹脂中,源自式(VI)所表示之四羧酸化合物之結構單元可與源自二胺化合物之結構單元經由形成於Y之兩側之醯亞胺基而鍵結。又,源自式(VII)所表示之四羧酸化合物之結構單元可與源自二胺化合物之結構單元經由形成於Y1 之一側之醯亞胺基及形成於Y1 之另一側之醯胺基而鍵結。作為四羧酸單元,可分別含有1種或2種以上之源自四羧酸化合物(VI)之結構單元及源自四羧酸化合物(VII)之結構單元。於分別含有2種以上之源自四羧酸化合物(VI)之結構單元及源自四羧酸化合物(VII)之結構單元之情形時,於2種以上之源自四羧酸化合物(VI)之結構單元中,Y之種類不同,於2種以上之源自四羧酸化合物(VII)之結構單元中,Y1 之種類不同。
Examples of other tetracarboxylic acid units include those derived from formula (VI)
[化 14]

Structural unit of the compound represented (sometimes referred to as structural unit derived from tetracarboxylic acid compound (VI)), and derived from formula (VII)
[化 15]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the tetracarboxylic acid compound (VII)). Here, in the polyamidoamide resin of the present invention, the structural unit derived from the tetracarboxylic acid compound represented by formula (VI) and the structural unit derived from the diamine compound may be formed on both sides of Y via The amide imino group is bonded. A structural unit of the tetracarboxylic acid compound and, from the formula (VII) may be represented by the structural unit derived from a diamine compound formed on one side of the Y via the imino acyl of 1 and formed on the other side of the Y 1 The amide group is bonded. As the tetracarboxylic acid unit, one or two or more structural units derived from a tetracarboxylic acid compound (VI) and a structural unit derived from a tetracarboxylic acid compound (VII) may be contained, respectively. When two or more structural units derived from a tetracarboxylic acid compound (VI) and a structural unit derived from a tetracarboxylic acid compound (VII) are contained, more than two types of structural units derived from a tetracarboxylic acid compound (VI) In the structural unit, the type of Y is different, and in the two or more structural units derived from the tetracarboxylic acid compound (VII), the type of Y 1 is different.

於式(VI)中,Y為四價之有機基,較佳為表示碳數4~40之四價之有機基。上述有機基係有機基中之氫原子可被取代為烴基或經鹵素原子取代之烴基的有機基,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。作為Y,表示:式(20)、式(21)、式(23)、式(24)、式(25)及式(27)、式(28)、式(29)所表示之基;該等式所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;或四價之碳數6以下之鏈式烴基。又,於式(VII)中,Y1 為四價之有機基,較佳為有機基中之氫原子可被取代為烴基或經鹵素原子取代之烴基的有機基,表示:式(20)、式(21)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)或式(29)所表示之基;該等式所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;或四價之碳數6以下之鏈式烴基。就容易降低光學膜之黃度之觀點而言,於式(VI)或式(VII)中,Y或Y1 較佳為:式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)或式(27)所表示之基;該等式所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基。又,R36 及R37 分別獨立為羥基(-OH)、甲氧基(-OMe)、乙氧基(-OEt)、正丙氧基(-OPr)、正丁氧基(-OBu)或氯原子(-Cl),較佳為氯原子(-Cl)。
[化16]
In formula (VI), Y is a tetravalent organic group, preferably a tetravalent organic group having 4 to 40 carbon atoms. The above-mentioned organic group is an organic group in which a hydrogen atom in an organic group may be substituted with a hydrocarbon group or a hydrocarbon group substituted with a halogen atom. In this case, the carbon number of the hydrocarbon group and the fluorine-substituted hydrocarbon group is preferably 1-8. As Y, it represents: the bases represented by formula (20), formula (21), formula (23), formula (24), formula (25) and formula (27), formula (28), formula (29); The hydrogen atom in the group represented by the equation is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; or a tetravalent chain hydrocarbon group with a carbon number of 6 or less. Furthermore, in formula (VII), Y 1 is a tetravalent organic group, preferably an organic group in which a hydrogen atom in the organic group may be substituted with a hydrocarbon group or a hydrocarbon group substituted with a halogen atom, which represents: formula (20), The bases represented by formula (21), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) or formula (29); A group in which the hydrogen atom in the group is substituted with a methyl group, a fluoro group, a chloro group, or a trifluoromethyl group; or a tetravalent chain hydrocarbon group with a carbon number of 6 or less. From the viewpoint of easily reducing the yellowness of the optical film, in formula (VI) or formula (VII), Y or Y 1 is preferably: formula (20), formula (21), formula (22), formula ( 23), the formula (24), the formula (25), the formula (26) or the formula (27) represents the group; the hydrogen atom in the group represented by the formula represents the methyl, fluoro, chloro or trifluoro Methyl substituted group. In addition, R 36 and R 37 are independently hydroxyl (-OH), methoxy (-OMe), ethoxy (-OEt), n-propoxy (-OPr), n-butoxy (-OBu) or The chlorine atom (-Cl) is preferably a chlorine atom (-Cl).
[Chem 16]

式(20)~式(29)中,
﹡表示鍵結鍵,
W1 表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-Ar-、-SO2 -、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-。Ar表示氫原子可經氟原子取代之碳數6~20之伸芳基,作為具體例,可列舉伸苯基。就容易提高所獲得之光學膜之彈性模數之觀點而言,於式(VI)或式(VII)中,Y或Y1 分別較佳為式(26)、式(28)或式(29)所表示之基。又,就容易抑制光學膜之黃度之觀點而言,W1 分別獨立地較佳為單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為單鍵、-O-、-CH2 -、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為-C(CH3 )2 -或-C(CF3 )2 -。
In formula (20) to formula (29),
﹡ Means bonding key,
W 1 represents a single bond, -O-, -CH 2- , -CH 2 -CH 2- , -CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2 -,- Ar -, - SO 2 -, - CO -, - O-Ar-O -, - Ar-O-Ar -, - Ar-CH 2 -Ar -, - Ar-C (CH 3) 2 -Ar- , or -Ar-SO 2 -Ar-. Ar represents a C 6-20 arylene group in which a hydrogen atom can be substituted with a fluorine atom, and specific examples include phenylene group. From the viewpoint of easily improving the elastic modulus of the obtained optical film, in formula (VI) or formula (VII), Y or Y 1 is preferably formula (26), formula (28), or formula (29), respectively ) Represents the basis. From the viewpoint of easily suppressing the yellowness of the optical film, W 1 is preferably a single bond, -O-, -CH 2- , -CH 2 -CH 2- , -CH (CH 3 )-, respectively. , -C (CH 3 ) 2 -or -C (CF 3 ) 2- , more preferably single bond, -O-, -CH 2- , -C (CH 3 ) 2 -or -C (CF 3 ) 2 -, And more preferably -C (CH 3 ) 2 -or -C (CF 3 ) 2- .

作為構成四羧酸單元之四羧酸化合物,可列舉:芳香族四羧酸及其酐、較佳為其二酐等芳香族四羧酸化合物;脂肪族四羧酸及其酐、較佳為其二酐等脂肪族四羧酸化合物等。四羧酸化合物除酸酐以外,亦可為醯氯等四羧酸化合物之衍生物,該等可單獨使用或組合使用2種以上。Examples of the tetracarboxylic acid compound constituting the tetracarboxylic acid unit include aromatic tetracarboxylic acid compounds and their anhydrides, preferably aromatic carboxylic acid compounds such as dianhydrides, and aliphatic tetracarboxylic acid compounds and their anhydrides, preferably Aliphatic tetracarboxylic acid compounds such as dianhydride and the like. The tetracarboxylic acid compound may be a derivative of a tetracarboxylic acid compound such as acetyl chloride in addition to acid anhydride, and these may be used alone or in combination of two or more kinds.

作為芳香族四羧酸二酐之具體例,可列舉非縮合多環式芳香族四羧酸二酐、單環式芳香族四羧酸二酐及縮合多環式芳香族四羧酸二酐。作為非縮合多環式芳香族四羧酸二酐,可列舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(有時亦表述為6FDA)、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐及4,4'-(間苯二氧基)二鄰苯二甲酸二酐。又,作為單環式芳香族四羧酸二酐,可列舉1,2,4,5-苯四羧酸二酐,作為縮合多環式芳香族四羧酸二酐,可列舉2,3,6,7-萘四羧酸二酐。
於該等中,較佳可列舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐及4,4'-(間苯二氧基)二鄰苯二甲酸二酐,更佳可列舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐、雙(3,4-二羧基苯基)甲烷二酐及4,4'-(對苯二氧基)二鄰苯二甲酸二酐。該等可單獨使用或組合使用2種以上。
Specific examples of the aromatic tetracarboxylic dianhydride include non-condensed polycyclic aromatic tetracarboxylic dianhydride, monocyclic aromatic tetracarboxylic dianhydride, and condensed polycyclic aromatic tetracarboxylic dianhydride. Examples of the non-condensed polycyclic aromatic tetracarboxylic dianhydride include: 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride , 2,2 ', 3,3'-benzophenone tetracarboxylic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, 2,2 ', 3,3'-bi Pyromellitic dianhydride, 3,3 ', 4,4'-diphenyl sulfone tetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2- Bis (2,3-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene) Diphthalic dianhydride (sometimes also expressed as 6FDA), 1,2-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ) Ethane dianhydride, 1,2-bis (3,4-dicarboxyphenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, bis (3, 4-dicarboxyphenyl) methane dianhydride, bis (2,3-dicarboxyphenyl) methane dianhydride, 4,4 '-(p-phenylenedioxy) diphthalic dianhydride and 4,4' -(M-phenylenedioxy) diphthalic dianhydride. In addition, examples of monocyclic aromatic tetracarboxylic dianhydride include 1,2,4,5-benzenetetracarboxylic dianhydride, and examples of condensed polycyclic aromatic tetracarboxylic dianhydride include 2,3, 6,7-Naphthalenetetracarboxylic dianhydride.
Among these, preferred examples include: 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 2,2', 3 , 3'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyltetracarboxylic dianhydride, 3,3 ', 4,4'-diphenyl ash tetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-di Carboxyphenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride , 1,2-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,2-bis (3,4 -Dicarboxyphenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (2, 3-dicarboxyphenyl) methane dianhydride, 4,4 '-(p-phenylenedioxy) diphthalic dianhydride and 4,4'-(m-phenylenedioxy) diphthalic dianhydride , More preferably: 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyl Tetracarboxylic dianhydride, 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride, bis (3,4-dicarboxyphenyl) methanedi Anhydride and 4,4 '-(p-phenylenedioxy) diphthalic dianhydride. These can be used alone or in combination of two or more.

作為脂肪族四羧酸二酐,可列舉環式或非環式脂肪族四羧酸二酐。所謂環式脂肪族四羧酸二酐係指具有脂環式烴結構之四羧酸二酐,作為其具體例,可列舉:1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐等環烷烴四羧酸二酐、雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、二環己基3,3'-4,4'-四羧酸二酐及該等之位置異構物。該等可單獨使用或組合使用2種以上。作為非環式脂肪族四羧酸二酐之具體例,可列舉1,2,3,4-丁烷四羧酸二酐、及1,2,3,4-戊烷四羧酸二酐等,該等可單獨使用或組合使用2種以上。又,亦可將環式脂肪族四羧酸二酐及非環式脂肪族四羧酸二酐組合使用。Examples of the aliphatic tetracarboxylic dianhydride include cyclic or non-cyclic aliphatic tetracarboxylic dianhydride. The cycloaliphatic tetracarboxylic dianhydride refers to a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure. Specific examples thereof include: 1,2,4,5-cyclohexanetetracarboxylic dianhydride, Cycloalkane tetracarboxylic dianhydride such as 1,2,3,4-cyclobutane tetracarboxylic dianhydride, 1,2,3,4-cyclopentane tetracarboxylic dianhydride, bicyclo [2.2.2] octane- 7-ene-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyl 3,3'-4,4'-tetracarboxylic dianhydride and positional isomers of these. These can be used alone or in combination of two or more. Specific examples of the non-cyclic aliphatic tetracarboxylic dianhydride include 1,2,3,4-butane tetracarboxylic dianhydride, 1,2,3,4-pentane tetracarboxylic dianhydride, etc. , These can be used alone or in combination of two or more. In addition, cyclic aliphatic tetracarboxylic dianhydride and non-cyclic aliphatic tetracarboxylic dianhydride may be used in combination.

於四羧酸化合物中,就容易提高光學膜之彈性模數、耐彎曲性、及光學特性之觀點而言,較佳為上述脂環式四羧酸二酐或非縮合多環式芳香族四羧酸二酐。作為具體例,較佳為4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐、以及該等之混合物,更佳為3,3',4,4'-聯苯四羧酸二酐及4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐、以及該等之混合物,進而較佳為4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐。Among the tetracarboxylic acid compounds, from the viewpoint of easily improving the elastic modulus, bending resistance, and optical properties of the optical film, the above-mentioned alicyclic tetracarboxylic dianhydride or non-condensed polycyclic aromatic tetra Carboxylic dianhydride. As a specific example, 4,4'-oxydiphthalic dianhydride, 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 3,3', 4,4 'are preferred -Biphenyltetracarboxylic dianhydride, 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-diphenyl sulfone tetracarboxylic dianhydride, 2,2 -Bis (3,4-dicarboxyphenyl) propane dianhydride, 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride, and mixtures thereof, more preferably 3,3' , 4,4'-biphenyltetracarboxylic dianhydride and 4,4 '-(hexafluoroisopropylidene) diphthalic dianhydride, and mixtures of these, further preferably 4,4'- (Hexafluoroisopropylidene) diphthalic dianhydride.

作為其他三羧酸單元,例如可列舉源自式(VIII)
[化17]

所表示之化合物之結構單元(有時稱為源自三羧酸化合物(VIII)之結構單元)。三羧酸化合物表示三羧酸或三羧酸衍生物,作為三羧酸衍生物,例如可列舉三羧酸之醯氯或酯體等。於本發明之聚醯胺醯亞胺樹脂含有源自三羧酸化合物(VIII)之結構單元之情形時,源自三羧酸化合物(VIII)之結構單元可與源自二胺化合物之結構單元經由形成於Y2 之兩側之醯亞胺基或醯胺基而鍵結。作為三羧酸單元,可含有1種或2種以上之三羧酸單元(VIII),於含有2種以上之情形時,於各三羧酸單元(VIII)中,Y2 之種類不同。又,R38 為-OH、-OMe、-OEt、-OPr、-OBu或-Cl,較佳為-Cl。Y2 為三價有機基,較佳為有機基中之氫原子可被取代為烴基或經鹵素原子取代之烴基的有機基。Y2 表示式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)或式(29)所表示之基之鍵結鍵之任一個被取代為氫原子之基、或三價之碳數6以下之鏈式烴基。
Examples of other tricarboxylic acid units include those derived from formula (VIII)
[化 17]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the tricarboxylic acid compound (VIII)). The tricarboxylic acid compound means a tricarboxylic acid or a tricarboxylic acid derivative. Examples of the tricarboxylic acid derivative include trichlorocarboxylic acid chloride and ester. In the case where the polyimide amide imine resin of the present invention contains a structural unit derived from the tricarboxylic acid compound (VIII), the structural unit derived from the tricarboxylic acid compound (VIII) may be the same as the structural unit derived from the diamine compound It is bonded via an amide imide group or amide group formed on both sides of Y 2 . As the tricarboxylic acid unit, one kind or two or more kinds of tricarboxylic acid units (VIII) may be contained. When two or more kinds of tricarboxylic acid units are contained, the type of Y 2 is different in each tricarboxylic acid unit (VIII). In addition, R 38 is -OH, -OMe, -OEt, -OPr, -OBu, or -Cl, preferably -Cl. Y 2 is a trivalent organic group, preferably an organic group in which a hydrogen atom in the organic group may be substituted with a hydrocarbon group or a hydrocarbon group substituted with a halogen atom. Y 2 represents formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28), or formula ( 29) Any one of the bonding bonds of the represented group is substituted with a hydrogen atom group or a trivalent C 6 or less chain hydrocarbon group.

於本發明之聚醯胺醯亞胺樹脂含有三羧酸單元之情形時,作為構成三羧酸單元之三羧酸化合物,可列舉芳香族三羧酸、脂肪族三羧酸及其等之衍生物(例如醯氯、酸酐等),作為其具體例,可列舉:1,2,4-苯三羧酸之酐;2,3,6-萘三羧酸-2,3-酐;鄰苯二甲酸酐與苯甲酸以單鍵、-O-、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物。該等三羧酸化合物可單獨使用或組合使用2種以上。When the polyimide amide imine resin of the present invention contains a tricarboxylic acid unit, examples of the tricarboxylic acid compound constituting the tricarboxylic acid unit include aromatic tricarboxylic acid, aliphatic tricarboxylic acid, and their derivatives Substances (for example, acetyl chloride, acid anhydride, etc.), and specific examples thereof include: 1,2,4-benzenetricarboxylic acid anhydride; 2,3,6-naphthalenetricarboxylic acid-2,3-anhydride; o-benzene Dicarboxylic anhydride and benzoic acid are connected by a single bond, -O-, -CH 2- , -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2 -or phenylene . These tricarboxylic acid compounds can be used individually or in combination of 2 or more types.

作為其他二胺單元,例如可列舉源自式(IX)
[化18]

所表示之化合物之結構單元(有時稱為源自二胺化合物(IX)之結構單元)。此處,於本發明之聚醯胺醯亞胺樹脂中,源自二胺化合物(IX)之結構單元可與源自二羧酸之結構單元經由形成於X之兩側之醯胺基而鍵結,可與源自四羧酸化合物之結構單元經由形成於X之兩側之醯亞胺基或醯胺基而鍵結,可與源自三羧酸化合物之結構單元經由形成於X之兩側之醯亞胺基或醯胺基而鍵結。又,作為二胺單元,可含有1種或2種以上之源自二胺化合物(IX)之結構單元,於含有2種以上之情形時,於各源自二胺化合物(IX)之結構單元中,X之種類不同。X表示二價之有機基,較佳為表示碳數4~40之二價之有機基。上述有機基亦可有機基中之氫原子被取代為烴基或經鹵素原子取代之烴基,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。作為X,表示:式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)或式(17)所表示之基;該等式所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;或碳數6以下之鏈式烴基。
Examples of other diamine units include those derived from formula (IX)
[Chemical 18]

The structural unit of the compound represented (sometimes referred to as the structural unit derived from the diamine compound (IX)). Here, in the polyamidoamide resin of the present invention, the structural unit derived from the diamine compound (IX) may be bonded to the structural unit derived from the dicarboxylic acid via the amide group formed on both sides of X It can be bonded to the structural unit derived from the tetracarboxylic acid compound through the amide imide group or amide group formed on both sides of X, and can be bonded to the structural unit derived from the tricarboxylic acid compound through the two formed in X The amide imide group or amide group on the side is bonded. In addition, as the diamine unit, one or two or more structural units derived from the diamine compound (IX) may be contained. When two or more structural units are included, each structural unit derived from the diamine compound (IX) In, the type of X is different. X represents a divalent organic group, and preferably represents a divalent organic group having 4 to 40 carbon atoms. The above-mentioned organic group may have a hydrogen atom in the organic group substituted with a hydrocarbon group or a hydrocarbon group substituted with a halogen atom. In this case, the carbon number of the hydrocarbon group and the fluorine-substituted hydrocarbon group is preferably 1-8. As X, it represents: the base represented by formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16) or formula (17); The group in which the hydrogen atom in the group represented by the equation is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; or a chain hydrocarbon group having a carbon number of 6 or less.

[化19]
[Chem 19]

式(10)~式(17)中,﹡表示鍵結鍵,
V1 、V2 及V3 分別獨立地表示單鍵、-O-、-S-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或-CO-。
一例為V1 及V3 為單鍵、-O-或-S-且V2 為-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -或-SO2 -。V1 與V2 之對各環之鍵結位置、及V2 與V3 之對各環之鍵結位置分別較佳為相對於各環為間位或對位,更佳為對位。又,就容易提高含有聚醯胺醯亞胺樹脂而成之光學膜之彈性模數之觀點而言,V1 、V2 及V3 分別獨立地較佳為單鍵、-O-或-S-,更佳為單鍵或-O-。
In formula (10) to formula (17), ﹡ represents a bonding bond,
V 1, V 2 and V 3 each independently represent a single bond, -O -, - S -, - CH 2 -, - CH 2 -CH 2 -, - CH (CH 3) -, - C (CH 3) 2- , -C (CF 3 ) 2- , -SO 2- , or -CO-.
As an example, V 1 and V 3 are single bonds, -O- or -S-, and V 2 is -CH 2- , -C (CH 3 ) 2- , -C (CF 3 ) 2- , or -SO 2- . The bonding positions of V 1 and V 2 to each ring and the bonding positions of V 2 and V 3 to each ring are preferably meta or para with respect to each ring, more preferably para. In addition, from the viewpoint of easily improving the elastic modulus of the optical film containing the polyamidoamide resin, V 1 , V 2 and V 3 are each independently preferably a single bond, -O- or -S -, More preferably single bond or -O-.

作為構成二胺單元之二胺化合物,例如可列舉脂肪族二胺、芳香族二胺及該等之混合物。再者,本實施形態中,所謂「芳香族二胺」表示胺基直接鍵結於芳香環之二胺,亦可於其結構之一部分含有脂肪族基或其他取代基。該芳香環可為單環,亦可為縮合環,可例示苯環、萘環、蒽環及茀環等,但並不限定於該等。該等中,較佳為苯環。又,所謂「脂肪族二胺」表示胺基直接鍵結於脂肪族基之二胺,亦可於其結構之一部分含有芳香環或其他取代基。Examples of the diamine compound constituting the diamine unit include aliphatic diamines, aromatic diamines, and mixtures of these. Furthermore, in the present embodiment, the term "aromatic diamine" means a diamine in which an amine group is directly bonded to an aromatic ring, and may contain an aliphatic group or other substituents in a part of its structure. The aromatic ring may be a single ring or a condensed ring, and examples include a benzene ring, a naphthalene ring, an anthracene ring, and a fused ring, but it is not limited thereto. Among these, a benzene ring is preferred. The "aliphatic diamine" means a diamine in which an amine group is directly bonded to an aliphatic group, and may contain an aromatic ring or other substituents in a part of its structure.

作為脂肪族二胺之具體例,可列舉:六亞甲基二胺等非環式脂肪族二胺;1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、降烷二胺、4,4'-二胺基二環己基甲烷等環式脂肪族二胺等。該等可單獨使用或組合使用2種以上。Specific examples of the aliphatic diamine include non-cyclic aliphatic diamines such as hexamethylenediamine; 1,3-bis (aminomethyl) cyclohexane, and 1,4-bis (amino Cycloaliphatic diamines such as methyl) cyclohexane, noranediamine, 4,4'-diaminodicyclohexylmethane, etc. These can be used alone or in combination of two or more.

作為芳香族二胺之具體例,可列舉:對苯二胺、間苯二胺、2,4-甲苯二胺、間苯二甲胺、對苯二甲胺、1,5-二胺基萘、2,6-二胺基萘等具有1個芳香環之芳香族二胺;4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、3,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯基碸、3,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、4,4'-二胺基二苯基碸、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(有時亦表述為TFMB)、4,4'-雙(4-胺基苯氧基)聯苯、9,9-雙(4-胺基苯基)茀、9,9-雙(4-胺基-3-甲基苯基)茀、9,9-雙(4-胺基-3-氯苯基)茀、9,9-雙(4-胺基-3-氟苯基)茀等具有2個以上之芳香環之芳香族二胺。該等可單獨使用或組合使用2種以上。Specific examples of the aromatic diamine include p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, and 1,5-diaminonaphthalene , 2,6-diaminonaphthalene and other aromatic diamines with one aromatic ring; 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4 '-Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4' -Diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy Group) benzene, 4,4'-diaminodiphenyl sulfone, bis [4- (4-aminophenoxy) phenyl] benzene, bis [4- (3-aminophenoxy) phenyl ] 碸, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2 '-Dimethylbenzidine, 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (sometimes also expressed as TFMB), 4,4'-bis (4-amine Phenoxy) biphenyl, 9,9-bis (4-aminophenyl) stilbene, 9,9-bis (4-amino-3-methylphenyl) stilbene, 9,9-bis (4 -Amino-3-chlorophenyl) stilbene, 9,9-bis (4-amino-3-fluorophenyl) stilbene, etc. with more than 2 aromatic rings Fragrant aromatic diamine. These can be used alone or in combination of two or more.

作為芳香族二胺,較佳為4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯、4,4'-雙(4-胺基苯氧基)聯苯,更佳為4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、4,4'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯、4,4'-雙(4-胺基苯氧基)聯苯。該等可單獨使用或組合使用2種以上。As the aromatic diamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 3,3 are preferred '-Diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 1,4-bis (4-aminophenoxy) benzene , Bis [4- (4-aminophenoxy) phenyl] satin, bis [4- (3-aminophenoxy) phenyl] satin, 2,2-bis [4- (4-amino Phenoxy) phenyl] propane, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2'-dimethylbenzidine, 2,2'-bis (tris Fluoromethyl) -4,4'-diaminobiphenyl, 4,4'-bis (4-aminophenoxy) biphenyl, more preferably 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylbenzene, 1,4-bis (4-aminophenoxy Group) benzene, bis [4- (4-aminophenoxy) phenyl] benzene, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2'-di Methylbenzidine, 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl, 4,4'-bis (4-aminophenoxy) biphenyl. These can be used alone or in combination of two or more.

於上述二胺化合物中,就容易提高光學膜之機械強度(例如耐彎曲性、彈性模數),又,容易提高光學特性、例如降低霧度之觀點而言,較佳為使用選自由具有聯苯結構之芳香族二胺所組成之群中之1種以上。更佳為使用選自由2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯、4,4'-雙(4-胺基苯氧基)聯苯及4,4'-二胺基二苯醚所組成之群中之1種以上,進而更佳為使用2,2'-雙(三氟甲基)-4,4'-二胺基聯苯。Among the above-mentioned diamine compounds, from the viewpoint of easily improving the mechanical strength (eg, bending resistance, elastic modulus) of the optical film, and easily improving the optical properties, such as reducing haze, it is preferable to use One or more of the group consisting of aromatic diamine with benzene structure. More preferably, it is selected from 2,2'-dimethylbenzidine, 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl, 4,4'-bis (4- (Aminophenoxy) biphenyl and 4,4'-diaminodiphenyl ether in one or more groups, and more preferably 2,2'-bis (trifluoromethyl) -4, 4'-diaminobiphenyl.

構成聚醯胺醯亞胺樹脂之羧酸單元中所包含之二羧酸單元之含量相對於羧酸單元之全部結構單元之總莫耳數,較佳為20莫耳%以上,更佳為30莫耳%以上,進而較佳為40莫耳%以上,尤佳為50莫耳%以上,最佳為60莫耳%以上,且較佳為90莫耳%以下,更佳為85莫耳%以下,進而較佳為80莫耳%以下。若二羧酸單元之含量為上述下限值以上,則藉由源自二羧酸單元之醯胺鍵間之氫鍵,容易提高光學膜之機械強度(例如彈性模數)。又,若二羧酸單元之含量為上述上限值以下,則藉由抑制由源自二羧酸單元之醯胺鍵間之氫鍵所致之增黏,可抑制下述聚醯胺醯亞胺清漆之黏度,可使光學膜之加工變得容易。The content of dicarboxylic acid units contained in the carboxylic acid units constituting the polyamidoamide resin is preferably 20 mol% or more relative to the total number of moles of all structural units of the carboxylic acid units, and more preferably 30 More than 40 mol%, more preferably more than 40 mol%, particularly preferably more than 50 mol%, most preferably more than 60 mol%, and most preferably less than 90 mol%, more preferably 85 mol% Below, further preferably 80 mol% or less. If the content of the dicarboxylic acid unit is equal to or higher than the above lower limit, the mechanical strength (eg, elastic modulus) of the optical film is easily improved by the hydrogen bond between the amide bonds derived from the dicarboxylic acid unit. Furthermore, if the content of the dicarboxylic acid unit is below the above upper limit, the following polyamidoamide can be suppressed by suppressing the thickening caused by the hydrogen bond between the amide bonds derived from the dicarboxylic acid unit The viscosity of the amine varnish can make the processing of optical films easier.

構成聚醯胺醯亞胺樹脂之羧酸單元中所包含之四羧酸單元之含量相對於羧酸單元之總莫耳數,較佳為10莫耳%以上,更佳為20莫耳%以上,且較佳為60莫耳%以下,更佳為50莫耳%以下,進而較佳為40莫耳%以下。若四羧酸單元之含量為上述上限值以下,則有可提高機械強度(例如彈性模數)之傾向。若四羧酸單元之含量為上述下限值以上,則有可提高對溶劑之溶解性或光學特性(例如霧度或黃度)之傾向。The content of the tetracarboxylic acid unit contained in the carboxylic acid unit constituting the polyamidoamide resin relative to the total number of moles of the carboxylic acid unit is preferably 10 mol% or more, and more preferably 20 mol% or more , And preferably 60 mol% or less, more preferably 50 mol% or less, and further preferably 40 mol% or less. If the content of the tetracarboxylic acid unit is equal to or lower than the above upper limit, the mechanical strength (eg, elastic modulus) tends to be improved. If the content of the tetracarboxylic acid unit is equal to or higher than the above lower limit, there is a tendency that the solubility in the solvent or the optical characteristics (such as haze or yellowness) can be improved.

於上述聚醯胺醯亞胺樹脂中所包含之羧酸單元中,二羧酸單元之含量相對於四羧酸單元1莫耳,較佳為0.1莫耳以上,更佳為1莫耳以上,進而較佳為2莫耳以上,且較佳為5莫耳以下,更佳為4莫耳以下,進而較佳為3莫耳以下。若二羧酸單元之含量為上述下限值以上,則光學膜有機械強度(例如彈性模數)變高之傾向,若為上述上限值以下,則可抑制由二羧酸單元中之醯胺鍵間之氫鍵所致之增黏,降低聚醯胺醯亞胺清漆之黏度,使光學膜之製造變得容易。In the carboxylic acid unit contained in the polyamidoamide resin, the content of the dicarboxylic acid unit is preferably 1 mole or more relative to the tetracarboxylic acid unit, preferably 0.1 mole or more, and more preferably 1 mole or more, Furthermore, it is preferably 2 moles or more, and preferably 5 moles or less, more preferably 4 moles or less, and still more preferably 3 moles or less. If the content of the dicarboxylic acid unit is more than the above lower limit, the optical film tends to increase in mechanical strength (e.g., elastic modulus), and if it is below the above upper limit, it can be suppressed The viscosity increase caused by the hydrogen bond between the amine bonds reduces the viscosity of the polyamidoamide imide varnish, making the manufacture of optical films easier.

源自式(I)所表示之化合物之結構單元(源自二羧酸化合物(I)之結構單元)之含量(R(I) )相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數,較佳為大於0莫耳%,更佳為5莫耳%以上,進而較佳為10莫耳%以上,尤佳為15莫耳%以上,最佳為20莫耳%以上,尤其為25莫耳%以上,且較佳為40莫耳%以下,更佳為35莫耳%以下。又,源自上述式(I)所表示之化合物之結構單元(源自二羧酸化合物(I)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之羧酸單元之總莫耳數,較佳為大於0莫耳%,更佳為10莫耳%以上,進而較佳為20莫耳%以上,尤佳為30莫耳%以上,最佳為40莫耳%以上,尤其為50莫耳%以上,且較佳為80莫耳%以下,更佳為70莫耳%以下。若源自二羧酸化合物(I)之結構單元之含量為上述下限值以上,則藉由來源於源自二羧酸化合物(I)之結構單元之結構之剛性,容易提高光學膜之機械強度(例如彈性模數),又,若為上述上限值以下,則可藉由抑制來源於源自二羧酸化合物(I)之結構單元之醯胺鍵間之氫鍵所致之增黏,而抑制下述聚醯胺醯亞胺清漆之黏度,可使光學膜之加工變得容易。再者,本說明書中,將源自上述式(I)所表示之化合物之結構單元相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數的含量(莫耳%)稱為R(I)The content (R (I) ) of the structural unit derived from the compound represented by the formula (I) (structural unit derived from the dicarboxylic acid compound (I) ) is relative to the total structural unit constituting the polyimide amide imide resin The total mole number is preferably greater than 0 mole%, more preferably 5 mole% or more, and further preferably 10 mole% or more, particularly preferably 15 mole% or more, and most preferably 20 mole% or more In particular, it is 25 mol% or more, and preferably 40 mol% or less, and more preferably 35 mol% or less. Moreover, the content of the structural unit derived from the compound represented by the above formula (I) (structural unit derived from the dicarboxylic acid compound (I)) relative to the total moles of the carboxylic acid units constituting the polyimide amide imide resin The number is preferably greater than 0 mol%, more preferably 10 mol% or more, and further preferably 20 mol% or more, particularly preferably 30 mol% or more, and most preferably 40 mol% or more, especially 50 mol% or more, and preferably 80 mol% or less, more preferably 70 mol% or less. If the content of the structural unit derived from the dicarboxylic acid compound (I) is at least the above lower limit, the rigidity of the structure derived from the structural unit derived from the dicarboxylic acid compound (I) easily improves the mechanical properties of the optical film If the strength (for example, elastic modulus) is below the above upper limit, it is possible to suppress the thickening caused by hydrogen bonding between amide bonds derived from the structural unit derived from the dicarboxylic acid compound (I) And to suppress the viscosity of the following polyamide amide imine varnish, can make the processing of optical film easy. Furthermore, in this specification, the content (mol%) of the structural units derived from the compound represented by the above formula (I) relative to the total number of moles of all the structural units constituting the polyamidoamide resin is referred to as R (I) .

源自式(II)所表示之化合物之結構單元(源自四羧酸化合物(II)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數,較佳為5莫耳%以上,更佳為10莫耳%以上,且較佳為30莫耳%以下,更佳為25莫耳%以下,進而較佳為20莫耳%以下。又,源自式(II)所表示之化合物之結構單元(源自四羧酸化合物(II)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之羧酸單元之總莫耳數,較佳為10莫耳%以上,更佳為20莫耳%以上,且較佳為60莫耳%以下,更佳為50莫耳%以下,進而較佳為40莫耳%以下。若源自四羧酸化合物(II)之結構單元之含量為上述下限值以上,則容易提高光學膜之機械強度(例如彈性模數),又,若為上述上限值以下,則容易提高對溶劑之溶解性或光學特性(例如霧度或黃度)。The content of the structural unit derived from the compound represented by the formula (II) (the structural unit derived from the tetracarboxylic acid compound (II)) is less than the total moles of all the structural units constituting the polyimide amide imide resin. It is preferably 5 mol% or more, more preferably 10 mol% or more, and preferably 30 mol% or less, more preferably 25 mol% or less, and further preferably 20 mol% or less. Moreover, the content of the structural unit derived from the compound represented by the formula (II) (the structural unit derived from the tetracarboxylic acid compound (II)) relative to the total number of moles of the carboxylic acid unit constituting the polyamidoamide resin It is preferably 10 mol% or more, more preferably 20 mol% or more, and preferably 60 mol% or less, more preferably 50 mol% or less, and further preferably 40 mol% or less. If the content of the structural unit derived from the tetracarboxylic acid compound (II) is above the lower limit, the mechanical strength (eg, elastic modulus) of the optical film is easily improved, and if it is below the above upper limit, it is easy to increase Solubility to solvents or optical properties (such as haze or yellowness).

源自式(III)所表示之化合物之結構單元(源自二胺化合物(III)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數,較佳為20莫耳%以上,更佳為30莫耳%以上,進而較佳為40莫耳%以上,尤佳為45莫耳%以上,且較佳為80莫耳%以下,更佳為70莫耳%以下,進而較佳為60莫耳%以下,尤佳為55莫耳%以下。又,源自式(III)所表示之化合物之結構單元(源自二胺化合物(III)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之二胺單元之總莫耳數,較佳為30莫耳%以上,更佳為50莫耳%以上,進而較佳為70莫耳%以上,且較佳為100莫耳%以下。若源自二胺化合物(III)之結構單元之含量為上述範圍,則可容易提高光學膜之耐彎曲性及透明性,進而進一步提高聚醯胺醯亞胺樹脂對溶劑之溶解性,將聚醯胺醯亞胺清漆之黏度抑制為更低,又,容易製造光學膜。The content of the structural unit derived from the compound represented by the formula (III) (the structural unit derived from the diamine compound (III)) is preferably relative to the total moles of all the structural units constituting the polyimide amide imine resin 20 mol% or more, more preferably 30 mol% or more, and further preferably 40 mol% or more, particularly preferably 45 mol% or more, and preferably 80 mol% or more, more preferably 70 mol% Ear% or less, more preferably 60 mole% or less, particularly preferably 55 mole% or less. Moreover, the content of the structural unit derived from the compound represented by the formula (III) (structural unit derived from the diamine compound (III)) relative to the total moles of the diamine unit constituting the polyimide amide imine resin, It is preferably 30 mol% or more, more preferably 50 mol% or more, and further preferably 70 mol% or more, and preferably 100 mol% or less. If the content of the structural unit derived from the diamine compound (III) is in the above range, the bending resistance and transparency of the optical film can be easily improved, and further the solubility of the polyamidoamide imine resin in the solvent can be further improved, and the poly The viscosity of the amide imide varnish is suppressed to be lower, and it is easy to manufacture optical films.

源自式(IV)所表示之化合物之結構單元(源自二羧酸化合物(IV)之結構單元)之含量相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數,較佳為1.5莫耳%以上,更佳為2.5莫耳%以上,進而較佳為3.5莫耳%以上,尤佳為5莫耳%以上,且較佳為35莫耳%以下,更佳為30莫耳%以下。又,源自二羧酸化合物(IV)之結構單元之含量相對於構成聚醯胺醯亞胺樹脂之羧酸單元之總莫耳數,較佳為3莫耳%以上,更佳為5莫耳%以上,進而較佳為7莫耳%以上,尤佳為10莫耳%以上,且較佳為70莫耳%以下,更佳為65莫耳%以下,進而較佳為60莫耳%以下。若源自二羧酸化合物(IV)之結構單元之含量為上述下限值以上,則容易提高耐彎曲性,又,若為上述上限值以下,則可藉由抑制來源於源自二羧酸化合物(IV)之結構單元之醯胺鍵間之氫鍵所致之增黏,而抑制下述聚醯胺醯亞胺清漆之黏度,可使光學膜之加工變得容易。The content of the structural unit derived from the compound represented by formula (IV) (the structural unit derived from the dicarboxylic acid compound (IV)) relative to the total moles of all the structural units constituting the polyimide amide imine resin is less than It is preferably 1.5 mol% or more, more preferably 2.5 mol% or more, and further preferably 3.5 mol% or more, particularly preferably 5 mol% or more, and preferably 35 mol% or less, more preferably 30 Moore% below. Moreover, the content of the structural unit derived from the dicarboxylic acid compound (IV) is preferably 3 mol% or more, and more preferably 5 mol relative to the total number of mols of carboxylic acid units constituting the polyamidoamide resin. Ear% or more, more preferably 7 mole% or more, particularly preferably 10 mole% or more, and preferably 70 mole% or less, more preferably 65 mole% or less, still more preferably 60 mole% the following. If the content of the structural unit derived from the dicarboxylic acid compound (IV) is above the lower limit, the bending resistance is easily improved, and if it is below the above upper limit, it is possible to suppress the source derived from the dicarboxylic acid The viscosity increase of the hydrogen bond between the amide bond of the structural unit of the acid compound (IV), and the inhibition of the viscosity of the following polyamide amide imine varnish can facilitate the processing of the optical film.

於本發明之較佳之實施態樣中,上述聚醯胺醯亞胺樹脂如上所述可含有鹵素原子。作為含氟取代基之具體例,可列舉氟基及三氟甲基。藉由使聚醯胺醯亞胺樹脂含有鹵素原子,容易提高含有聚醯胺醯亞胺樹脂而成之光學膜之透明性。就光學膜之透明性之觀點而言,鹵素原子較佳為氟原子。In a preferred embodiment of the present invention, the polyimide amide imine resin may contain halogen atoms as described above. Specific examples of fluorine-containing substituents include fluorine groups and trifluoromethyl groups. By containing a halogen atom in the polyamidoimide resin, the transparency of the optical film made of the polyamidoimide resin is easily improved. From the viewpoint of transparency of the optical film, the halogen atom is preferably a fluorine atom.

就容易進一步提高光學膜之透明性之觀點而言,聚醯胺醯亞胺樹脂中之鹵素原子之含量相對於聚醯胺醯亞胺樹脂之質量,較佳為1~40質量%,更佳為3~35質量%,進而較佳為5~32質量%。From the viewpoint of easily improving the transparency of the optical film, the content of halogen atoms in the polyamidoamide resin is preferably 1 to 40% by mass relative to the mass of the polyamidoamide resin, and more preferably It is 3 to 35% by mass, and more preferably 5 to 32% by mass.

如上所述,本發明之聚醯胺醯亞胺樹脂係藉由使包含上述二羧酸化合物、上述四羧酸化合物、及視需要之上述三羧酸化合物之羧酸化合物與上述二胺化合物進行反應而製造。尤佳為藉由式(I)所表示之化合物、式(II)所表示之化合物、式(III)所表示之化合物、視需要之式(IV)所表示之化合物、其他羧酸、及其他二胺之反應、例如縮聚而製造。於本發明之一實施態樣中,於聚醯胺醯亞胺樹脂之合成中亦可存在醯亞胺化觸媒。作為醯亞胺化觸媒,例如可列舉:三丙胺、二丁基丙胺、乙基二丁胺等脂肪族胺;N-乙基哌啶、N-丙基哌啶、N-丁基吡咯啶、N-丁基哌啶、及N-丙基六氫氮呯等脂環式胺(單環式);氮雜雙環[2.2.1]庚烷、氮雜雙環[3.2.1]辛烷、氮雜雙環[2.2.2]辛烷、及氮雜雙環[3.2.2]壬烷等脂環式胺(多環式);以及吡啶、2-甲基吡啶、3-甲基吡啶、4-甲基吡啶、2-乙基吡啶、3-乙基吡啶、4-乙基吡啶、2,4-二甲基吡啶、2,4,6-三甲基吡啶、3,4-環戊烯吡啶、5,6,7,8-四氫異喹啉、及異喹啉等芳香族胺。As described above, the polyimide amide imine resin of the present invention is carried out by using the carboxylic acid compound containing the above-mentioned dicarboxylic acid compound, the above-mentioned tetracarboxylic acid compound, and optionally the above-mentioned tricarboxylic acid compound and the above-mentioned diamine compound Manufactured by reaction. Particularly preferred are compounds represented by formula (I), compounds represented by formula (II), compounds represented by formula (III), compounds represented by formula (IV) as needed, other carboxylic acids, and others It is produced by the reaction of diamine, for example, polycondensation. In one embodiment of the present invention, an amide imidization catalyst may also be present in the synthesis of the amide imide resin. Examples of the imidate catalyst include aliphatic amines such as tripropylamine, dibutylpropylamine, and ethyldibutylamine; N-ethylpiperidine, N-propylpiperidine, and N-butylpyrrolidine. , N-butylpiperidine, and N-propyl hexahydroazepine and other alicyclic amines (monocyclic); azabicyclo [2.2.1] heptane, azabicyclo [3.2.1] octane Alicyclic amines (polycyclic) such as azabicyclo [2.2.2] octane and azabicyclo [3.2.2] nonane; and pyridine, 2-methylpyridine, 3-methylpyridine, 4- Picoline, 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2,4-dimethylpyridine, 2,4,6-trimethylpyridine, 3,4-cyclopentenepyridine , 5,6,7,8-tetrahydroisoquinoline, and isoquinoline and other aromatic amines.

於聚醯胺醯亞胺樹脂之製造中,反應溫度並無特別限定,例如為50~350℃。反應時間亦無特別限定,例如為30分鐘~10小時左右。視需要可於惰性環境或減壓之條件下進行反應。又,反應可於溶劑中進行,作為溶劑,例如可列舉製備聚醯胺醯亞胺清漆所使用之下述溶劑。In the production of polyimide amide imine resin, the reaction temperature is not particularly limited, for example, 50 to 350 ° C. The reaction time is also not particularly limited, and is, for example, about 30 minutes to 10 hours. If necessary, the reaction can be carried out in an inert environment or under reduced pressure. In addition, the reaction can be carried out in a solvent. Examples of the solvent include the following solvents used for preparing polyamidoamide imine varnish.

於聚醯胺醯亞胺樹脂中,其標準聚苯乙烯換算之重量平均分子量較佳為210,000以上,更佳為300,000以上,進而較佳為350,000以上,且較佳為750,000以下,更佳為600,000以下,進而較佳為500,000以下。若聚醯胺醯亞胺樹脂之重量平均分子量為上述下限值以上,則可提高含有聚醯胺醯亞胺樹脂而成之光學膜之耐彎曲性。又,若聚醯胺醯亞胺樹脂之重量平均分子量為上述上限值以下,則可將聚醯胺醯亞胺清漆之黏度抑制為較低,又,容易進行光學膜之延伸,因此加工性變得良好。再者,本說明書中,重量平均分子量例如可進行GPC(Gel Permeation Chromatography,凝膠滲透層析法)測定,藉由標準聚苯乙烯換算而求出,具體而言可藉由實施例所記載之方法求出。The weight average molecular weight in terms of standard polystyrene of polyamidoamide resin is preferably 210,000 or more, more preferably 300,000 or more, further preferably 350,000 or more, and preferably 750,000 or less, more preferably 600,000 The following is further preferably 500,000 or less. If the weight average molecular weight of the polyimide amide imide resin is above the lower limit, the bending resistance of the optical film containing the polyimide amide imide resin can be improved. In addition, if the weight average molecular weight of the polyamidoimide resin is below the upper limit, the viscosity of the polyamidoimide varnish can be suppressed to be low, and the optical film can be easily extended, so the processability Become good. In addition, in this specification, the weight average molecular weight can be measured by, for example, GPC (Gel Permeation Chromatography), and can be obtained by standard polystyrene conversion, and specifically, it can be described in Examples. Method.

於光學膜中,聚醯胺醯亞胺樹脂之含量相對於光學膜之質量,較佳為30~99質量%,更佳為35~95質量%,進而較佳為40~90質量%,尤佳為50~90質量%。若聚醯胺醯亞胺樹脂之含量為上述範圍,則容易獲得耐彎曲性及透明性優異之光學膜。In the optical film, the content of the polyamidimide resin relative to the mass of the optical film is preferably 30 to 99% by mass, more preferably 35 to 95% by mass, and further preferably 40 to 90% by mass, especially It is preferably 50 to 90% by mass. If the content of the polyimide amide imine resin is within the above range, it is easy to obtain an optical film excellent in bending resistance and transparency.

更具體而言,本發明之較佳之實施形態之聚醯胺醯亞胺樹脂具有式(30)所表示之重複結構單元與式(33)所表示之重複結構單元。進而,本發明之較佳之實施形態之聚醯胺醯亞胺樹脂亦可於無損所獲得之聚醯胺醯亞胺系高分子膜之各種物性之範圍內含有式(31)及式(32)之任一者所表示之重複結構單元之任一種以上。又,該聚醯胺醯亞胺樹脂亦可分別含有2種以上之式(30)、式(31)、式(32)、及式(33)所表示之重複結構單元。式(33)所表示之重複結構單元係二羧酸化合物與二胺化合物進行反應所形成之結構單元,且係將源自二羧酸化合物之結構單元與源自二胺化合物之結構單元一起表示之結構單元。式(30)所表示之重複結構單元係四羧酸化合物與二胺化合物進行反應所形成之結構單元,且係將源自四羧酸化合物之結構單元與源自二胺化合物之結構單元一起表示之結構單元。式(32)所表示之重複結構單元係三羧酸化合物與二胺化合物進行反應所形成之結構單元,且係將源自三羧酸化合物之結構單元與源自二胺化合物之結構單元一起表示之結構單元。式(31)所表示之重複結構單元係四羧酸化合物與二胺化合物進行反應所形成之結構單元,且係將源自四羧酸化合物之結構單元與源自二胺化合物之結構單元一起表示之結構單元。More specifically, the polyamidoamide resin of a preferred embodiment of the present invention has a repeating structural unit represented by formula (30) and a repeating structural unit represented by formula (33). Furthermore, the polyimide amide imine resin according to the preferred embodiment of the present invention may also contain formula (31) and formula (32) within the range of various properties of the polyimide amide imide-based polymer film obtained without damaging Any one or more of the repeating structural units represented by any one. In addition, the polyamidoamide resin may contain two or more types of repeating structural units represented by formula (30), formula (31), formula (32), and formula (33), respectively. The repeating structural unit represented by formula (33) is a structural unit formed by the reaction of a dicarboxylic acid compound and a diamine compound, and represents the structural unit derived from the dicarboxylic acid compound together with the structural unit derived from the diamine compound The structural unit. The repeating structural unit represented by formula (30) is a structural unit formed by the reaction of a tetracarboxylic acid compound and a diamine compound, and represents the structural unit derived from the tetracarboxylic acid compound together with the structural unit derived from the diamine compound The structural unit. The repeating structural unit represented by formula (32) is a structural unit formed by the reaction of a tricarboxylic acid compound and a diamine compound, and represents the structural unit derived from the tricarboxylic acid compound together with the structural unit derived from the diamine compound The structural unit. The repeating structural unit represented by formula (31) is a structural unit formed by the reaction of a tetracarboxylic acid compound and a diamine compound, and represents the structural unit derived from the tetracarboxylic acid compound together with the structural unit derived from the diamine compound The structural unit.

[化20]
[化 20]

於式(30)~式(33)中,K1 及K3 表示式(b)、式(VI)中之Y或式(VII)中之Y1 ,K2 表示式(a)、式(d)、或式(V)中之Z,K4 表示式(VIII)中之Y2 ,L1 ~L4 分別表示式(c)或式(IX)中之X。In formula (30) to formula (33), K 1 and K 3 represent formula (b), Y in formula (VI) or Y 1 in formula (VII), and K 2 represents formula (a) and formula ( d), or Z and K 4 in formula (V) represent Y 2 in formula (VIII), and L 1 to L 4 represent X in formula (c) or formula (IX), respectively.

[化21]
[化 21]

式(a)中之R3 ~R6 與式(I)中之R3 ~R6 相同,式(b)中之R7 ~R14 與式(II)中之R7 ~R14 相同,式(c)中之R15 ~R22 與式(III)中之R15 ~R22 相同,式(d)中之R25 ~R32 與式(IV)中之R25 ~R32 相同,﹡表示鍵結鍵。 6 3 ~ R the same as R (a) in the formula 3 ~ R as in the formula (I) R 6, same as in the formula (b) R 7 ~ R 14 in the formula (II), the R 7 ~ R 14, the same as the R R (c) of the formula 15 ~ R 22 in the formula (III) 15 ~ R 22, the same as the in the formula (d) R 25 ~ R 32 in the formula (IV) R 25 ~ R 32 , ﹡ Means bonding key.

<二氧化矽粒子>
本發明之光學膜可含有二氧化矽粒子。二氧化矽粒子之平均一次粒徑較佳為10 nm以上,更佳為15 nm以上,進而較佳為20 nm以上,且較佳為100 nm以下,更佳為80 nm以下,進而較佳為60 nm以下,尤佳為40 nm以下。若二氧化矽粒子之平均一次粒徑為上述範圍,則可抑制二氧化矽粒子之凝集,提高光學膜之透明性,並且亦可提高耐彎曲性。又,若二氧化矽粒子之平均一次粒徑為上述上限以下,則即便光學膜之厚度相對較厚,亦容易降低霧度值。尤其,若二氧化矽粒子之平均一次粒徑較佳為80 nm以下、更佳為60 nm以下,則例如即便光學膜之厚度為30 μm以上,亦可顯示出較低之霧度值、較佳為1.0%以下、更佳為0.8%以下之霧度值(與Hzb 對應)。再者,本發明中,平均一次粒徑可藉由BET(Brunauer-Emmett-Teller,布厄特)法進行測定。
<Silica dioxide particles>
The optical film of the present invention may contain silicon dioxide particles. The average primary particle diameter of the silicon dioxide particles is preferably 10 nm or more, more preferably 15 nm or more, further preferably 20 nm or more, and preferably 100 nm or less, more preferably 80 nm or less, and more preferably Below 60 nm, particularly preferably below 40 nm. If the average primary particle diameter of the silica particles is within the above range, the aggregation of the silica particles can be suppressed, the transparency of the optical film can be improved, and the bending resistance can also be improved. In addition, if the average primary particle size of the silica particles is below the upper limit, even if the thickness of the optical film is relatively thick, the haze value is easily reduced. In particular, if the average primary particle size of the silicon dioxide particles is preferably 80 nm or less, and more preferably 60 nm or less, for example, even if the thickness of the optical film is 30 μm or more, it can show a lower haze value, more The haze value is preferably 1.0% or less, and more preferably 0.8% or less (corresponding to Hz b ). In addition, in the present invention, the average primary particle size can be measured by the BET (Brunauer-Emmett-Teller, Buert) method.

<光學膜>
本發明之光學膜係含有上述聚醯胺醯亞胺樹脂而成,且滿足式(1)
ΔHz<0.5 (1)
[式(1)中,ΔHz表示Hza -Hzb ,Hza 表示於室溫下以彎曲半徑1 mm彎折1次並恢復成平面狀之心軸試驗(依據JIS K 5600-5-1:1999)後之光學膜之霧度(%),Hzb 表示該心軸試驗前之光學膜之霧度(%)]
之關係。本發明之光學膜由於滿足式(1)之關係,因此具有優異之耐彎曲性,並且高溫、高濕下之光學特性之穩定性優異。又,本發明之光學膜之霧度等較低,透明性亦優異。即,本發明之光學膜即便重複進行將光學膜連續地彎折並恢復之操作,光學膜亦不易產生傷痕、破裂、白濁等,可維持透明性等優異之光學特性。並且,即便於高溫高濕下、例如於溫度85℃、相對濕度85%之環境下,將光學膜於彎折之狀態下保管,光學膜亦不易產生傷痕、破裂、白濁等,可維持透明性等優異之光學特性。因此,本發明之光學膜可用於圖像顯示裝置之構件、尤其是可撓性顯示器之前面板(視窗膜)等。為了用於可撓性顯示器之前面板(視窗膜),就重複使用時之耐久性之觀點而言,於溫度85℃、相對濕度85%之環境下保管24小時前後之上述ΔHz'宜未達0.4,較佳為0.3以下,更佳為0.2以下。再者,ΔHz'可藉由實施例所記載之方法進行測定並算出。
<Optical film>
The optical film of the present invention contains the above-mentioned polyamidoamide resin and satisfies formula (1)
ΔHz < 0.5 (1)
[In formula (1), ΔHz represents Hz a- Hz b , Hz a represents a mandrel test that bends once at a bending radius of 1 mm and returns to a planar shape at room temperature (according to JIS K 5600-5-1: The haze (%) of the optical film after 1999), Hz b represents the haze (%) of the optical film before the mandrel test]
Relationship. Since the optical film of the present invention satisfies the relationship of formula (1), it has excellent bending resistance and excellent stability of optical characteristics at high temperature and high humidity. In addition, the optical film of the present invention has low haze and the like, and is excellent in transparency. That is, even if the operation of continuously folding and recovering the optical film of the present invention is repeated, the optical film is less likely to cause scratches, cracks, white turbidity, etc., and excellent optical characteristics such as transparency can be maintained. Moreover, even if the optical film is stored in a folded state under high temperature and high humidity, such as an environment of 85 ° C and 85% relative humidity, the optical film is less likely to cause scratches, cracks, white turbidity, etc., and transparency can be maintained Excellent optical properties. Therefore, the optical film of the present invention can be used as a component of an image display device, especially a front panel (window film) of a flexible display. For use in the front panel (window film) of a flexible display, from the viewpoint of durability during repeated use, the above-mentioned ΔHz 'before and after storage for 24 hours in an environment of a temperature of 85 ° C and a relative humidity of 85% should preferably not reach 0.4 , Preferably 0.3 or less, and more preferably 0.2 or less. In addition, ΔHz 'can be measured and calculated by the method described in the examples.

上述前面板具有保護可撓性顯示器內之圖像顯示元件之功能。作為圖像顯示裝置,可列舉:電視、智慧型手機、行動電話、汽車導航、平板PC、攜帶型遊戲機、電子紙、指示器、公告板、時鐘、及智慧型手錶等可穿戴設備等。作為可撓性顯示器,可列舉具有可撓性特性之圖像顯示裝置、例如電視、智慧型手機、行動電話、汽車導航、平板PC、攜帶型遊戲機、電子紙、指示器、公告板、時鐘、及可穿戴設備等。The front panel has the function of protecting the image display element in the flexible display. Examples of image display devices include wearable devices such as TVs, smart phones, mobile phones, car navigation, tablet PCs, portable game consoles, electronic paper, indicators, bulletin boards, clocks, and smart watches. Examples of flexible displays include image display devices with flexible characteristics, such as TVs, smart phones, mobile phones, car navigation, tablet PCs, portable game consoles, electronic paper, indicators, bulletin boards, and clocks. , And wearable devices.

於式(1)中,ΔHz表示Hza -Hzb ,Hza 表示於室溫、大氣中之環境下以彎曲半徑1 mm彎折1次後立即恢復之心軸試驗後之光學膜之霧度(%)。更詳細而言,ΔHz可藉由實施例所記載之方法進行測定並算出。Hzb 表示該心軸試驗前之光學膜之霧度(%)。ΔHz表示心軸試驗(耐彎曲性試驗)前後之光學膜之霧度之變化量,該值越小,表示彎折下之光學特性之穩定性越高。又,藉由適當調整光學膜之組成、例如構成形成光學膜之聚醯胺醯亞胺樹脂之重複結構之種類或構成比、及光學膜中所含之二氧化矽粒子或紫外線吸收劑等添加劑之種類或含量等、光學膜之厚度、或光學膜之製造條件、例如清漆溶劑之種類、乾燥溫度、乾燥時間等,可調整為式(1)之範圍。尤其,若使用平均一次粒徑為上述上限以下之二氧化矽粒子,則透明性變得良好,因此容易調整為式(1)之範圍。In formula (1), ΔHz represents Hz a- Hz b , Hz a represents the haze of the optical film after the mandrel test that is restored immediately after bending once at a bending radius of 1 mm in an environment of room temperature and atmosphere (%). In more detail, ΔHz can be measured and calculated by the method described in the examples. Hz b represents the haze (%) of the optical film before the mandrel test. ΔHz represents the amount of change in the haze of the optical film before and after the mandrel test (bending resistance test). The smaller the value, the higher the stability of the optical characteristics under bending. In addition, by appropriately adjusting the composition of the optical film, for example, the type or composition ratio of the repeating structure of the polyimide amide imide resin forming the optical film, and additives such as silicon dioxide particles or ultraviolet absorbers contained in the optical film The type or content, etc., the thickness of the optical film, or the manufacturing conditions of the optical film, such as the type of varnish solvent, drying temperature, drying time, etc., can be adjusted within the range of formula (1). In particular, if silica particles having an average primary particle diameter of not more than the above upper limit are used, the transparency becomes good, so it is easy to adjust to the range of formula (1).

式(1)中,Hzb 通常較佳為20.0%以下,更佳為2.0%以下,進而較佳為1.0%以下,尤佳為0.8%以下。若為上述範圍,則光學膜可具有良好之透明性,於用於圖像顯示裝置之前面板之情形時,可有助於較高之視認性。又,ΔHz未達0.5%,更佳為0.4%以下,進而較佳為0.3%以下,進而更佳為0.1%以下。若ΔHz為上述範圍,則光學膜具有更良好之耐彎曲性,即便於高溫、高濕下,亦可有效地維持透明性等光學特性。In formula (1), Hz b is usually preferably 20.0% or less, more preferably 2.0% or less, further preferably 1.0% or less, and particularly preferably 0.8% or less. If it is within the above range, the optical film can have good transparency, and when used in the case of a front panel of an image display device, it can contribute to higher visibility. In addition, ΔHz is less than 0.5%, more preferably 0.4% or less, further preferably 0.3% or less, and still more preferably 0.1% or less. If ΔHz is in the above range, the optical film has better bending resistance, and even at high temperature and high humidity, the optical characteristics such as transparency can be effectively maintained.

又,本發明之光學膜較佳為含有上述二氧化矽粒子,且較佳為滿足式(2)之關係:
0<RSi ≦32+2/3×R(I) (2)
[式(2)中,RSi 表示二氧化矽粒子相對於光學膜之質量之含量(質量%),R(I) 表示源自式(I)所表示之化合物之結構單元相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數之含量(莫耳%)]。
Moreover, the optical film of the present invention preferably contains the above-mentioned silicon dioxide particles, and preferably satisfies the relationship of formula (2):
0 < R Si ≦ 32 + 2/3 × R (I) (2)
[In formula (2), R Si represents the content (mass%) of silicon dioxide particles relative to the mass of the optical film, and R (I) represents the structural unit derived from the compound represented by formula (I) relative to the constituent polyacrylamide The content of the total number of moles of all structural units of the amide imine resin (mol%)].

式(2)中,RSi 較佳為5質量%以上,更佳為10質量%以上,進而較佳為15質量%以上,且較佳為未達60質量%,更佳為50質量%以下。若二氧化矽粒子之含量為上述下限值以上,則可進一步提高光學膜之彈性模數或耐彎曲性,又,若二氧化矽粒子之含量為上述上限值以下,則例如可降低霧度,進一步提高透明性。又,於一實施態樣中,本發明之光學膜即便二氧化矽粒子之含量相對較多,亦可抑制二氧化矽粒子之凝集,確保良好之透明性,高溫、高濕下之光學特性之穩定性優異,並且亦可獲得良好之耐彎曲性,因此亦可將RSi 設為20質量份以上、30質量份以上、40質量份以上、50質量份以上。In formula (2), R Si is preferably 5 mass% or more, more preferably 10 mass% or more, and further preferably 15 mass% or more, and preferably less than 60 mass%, more preferably 50 mass% or less . If the content of silica particles is above the above lower limit, the elastic modulus or bending resistance of the optical film can be further improved, and if the content of silica particles is below the above upper limit, for example, fogging can be reduced Degree to further improve transparency. Moreover, in one embodiment, even if the content of the silicon dioxide particles is relatively large, the optical film of the present invention can suppress the aggregation of the silicon dioxide particles, ensure good transparency, optical characteristics at high temperature and high humidity Since the stability is excellent and good bending resistance can also be obtained, R Si may be 20 parts by mass or more, 30 parts by mass or more, 40 parts by mass or more, and 50 parts by mass or more.

本發明之光學膜可進而含有紫外線吸收劑。作為紫外線吸收劑,例如可列舉:苯并三唑衍生物(苯并三唑系紫外線吸收劑)、1,3,5-三苯基三衍生物等三衍生物(三系紫外線吸收劑)、二苯甲酮衍生物(二苯甲酮系紫外線吸收劑)、及水楊酸酯衍生物(水楊酸酯系紫外線吸收劑),可使用選自由該等所組成之群中之至少1種。就具有良好之紫外線吸收能力之方面而言,較佳為使用選自由苯并三唑系紫外線吸收劑及三系紫外線吸收劑所組成之群中之至少1種,更佳為苯并三唑系紫外線吸收劑。The optical film of the present invention may further contain an ultraviolet absorber. Examples of the ultraviolet absorber include tri-derivatives (tri-based ultraviolet absorbers) such as benzotriazole derivatives (benzotriazole-based ultraviolet absorbers) and 1,3,5-triphenyl tri-derivatives, At least one kind selected from the group consisting of benzophenone derivatives (benzophenone-based ultraviolet absorbers) and salicylate derivatives (salicylate-based ultraviolet absorbers) . In terms of having a good ultraviolet absorption capability, it is preferable to use at least one selected from the group consisting of benzotriazole-based ultraviolet absorbers and three-series ultraviolet absorbers, more preferably a benzotriazole-based UV absorber.

作為苯并三唑系紫外線吸收劑之具體例,可列舉式(A)所表示之化合物,該等可單獨使用或組合使用2種以上。作為式(A)所表示之化合物之具體例,可列舉:住友化學股份有限公司製造之商品名:Sumisorb(註冊商標)200(2-(2-羥基-5-甲基苯基)苯并三唑)、Sumisorb 300(2-(3-第三丁基-2-羥基-5-甲基苯基)-5-氯苯并三唑)、Sumisorb 340(2-(2-羥基-5-第三辛基苯基)苯并三唑)、Sumisorb 350(2-(2-羥基3,5-二第三戊基苯基)苯并三唑)。Specific examples of the benzotriazole-based ultraviolet absorber include compounds represented by formula (A), and these may be used alone or in combination of two or more. Specific examples of the compound represented by formula (A) include: Sumitomo Chemical Co., Ltd. trade name: Sumisorb (registered trademark) 200 (2- (2-hydroxy-5-methylphenyl) benzotriazine Azole), Sumisorb 300 (2- (3-third butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzotriazole), Sumisorb 340 (2- (2-hydroxy-5- Trioctylphenyl) benzotriazole), Sumisorb 350 (2- (2-hydroxy3,5-di-third-pentylphenyl) benzotriazole).

[化22]
[化 22]

式(A)中,T為氫原子、氟原子、氯原子、碳數1~5之烷基或碳數1~5之烷氧基,R39 及R40 分別獨立為氫原子或碳數1~20之烴基,R39 或R40 中之至少任一者為碳數1~20之烴基。In formula (A), T is a hydrogen atom, a fluorine atom, a chlorine atom, a C 1-5 alkyl group or a C 1-5 alkoxy group, and R 39 and R 40 are each independently a hydrogen atom or a carbon number 1 A hydrocarbon group of ~ 20, at least one of R 39 or R 40 is a hydrocarbon group having 1 to 20 carbon atoms.

作為T中之碳數1~5之烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基等。
作為T中之碳數1~5之烷氧基,可列舉:甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、第二丁氧基、第三丁氧基、正戊氧基、2-甲基-丁氧基、3-甲基丁氧基、2-乙基-丙氧基等。
T較佳為氫原子、氟原子、氯原子或甲基,更佳為氫原子、氟原子或氯原子。
Examples of the alkyl group having 1 to 5 carbon atoms in T include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, n-pentyl, and 2- Methyl-butyl, 3-methylbutyl, 2-ethyl-propyl, etc.
Examples of the alkoxy group having 1 to 5 carbon atoms in T include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, second butoxy, and third butoxy Group, n-pentyloxy, 2-methyl-butoxy, 3-methylbutoxy, 2-ethyl-propoxy, etc.
T is preferably a hydrogen atom, a fluorine atom, a chlorine atom or a methyl group, and more preferably a hydrogen atom, a fluorine atom or a chlorine atom.

R39 及R40 分別為氫原子或碳數1~20之烴基,R39 及R40 中之至少任一者為烴基。R39 及R40 於分別為烴基之情形時,較佳為碳數1~12之烴基,更佳為碳數1~8之烴基。具體而言,可例示甲基、第三丁基、第三戊基及第三辛基。R 39 and R 40 are each a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, and at least one of R 39 and R 40 is a hydrocarbon group. When R 39 and R 40 are each a hydrocarbon group, it is preferably a hydrocarbon group having 1 to 12 carbon atoms, and more preferably a hydrocarbon group having 1 to 8 carbon atoms. Specifically, a methyl group, a third butyl group, a third pentyl group, and a third octyl group can be exemplified.

於光學膜中,紫外線吸收劑之含量相對於聚醯胺醯亞胺樹脂與二氧化矽粒子之總質量100質量份,較佳為0.01~10質量份,更佳為1~8質量份,進而較佳為3~7質量份。若紫外線吸收劑之含量為上述下限值以上,則可提高紫外線吸收性。若紫外線吸收劑之含量為上述上限值以下,則可抑制由光學膜製造時之熱所致之紫外線吸收劑之分解,容易提高光學膜之透明性。In the optical film, the content of the ultraviolet absorber is preferably 0.01 to 10 parts by mass, more preferably 1 to 8 parts by mass relative to 100 parts by mass of the total mass of the polyamidoamide resin and the silica particles. It is preferably 3 to 7 parts by mass. If the content of the ultraviolet absorber is more than the above lower limit, the ultraviolet absorbability can be improved. If the content of the ultraviolet absorber is less than the above upper limit, the decomposition of the ultraviolet absorber due to heat during the manufacture of the optical film can be suppressed, and the transparency of the optical film can be easily improved.

本發明之光學膜可含有上述聚醯胺醯亞胺樹脂、上述二氧化矽粒子及上述紫外線吸收劑以外之其他添加劑。作為其他添加劑,例如可列舉:聚醯胺醯亞胺樹脂以外之其他樹脂、抗氧化劑、脫模劑、穩定劑、上藍劑等著色劑、阻燃劑、潤滑劑、及調平劑。其他添加劑可單獨使用或組合使用兩種以上。於光學膜含有添加劑之情形時,添加劑之含量相對於光學膜之質量,較佳為0.01~20質量%,更佳為0.1~10質量%。The optical film of the present invention may contain additives other than the above-mentioned polyamidoamide resin, the above-mentioned silica particles, and the above-mentioned ultraviolet absorber. Examples of other additives include resins other than polyamidoamide resins, antioxidants, mold release agents, stabilizers, coloring agents such as bluing agents, flame retardants, lubricants, and leveling agents. Other additives may be used alone or in combination of two or more. When the optical film contains an additive, the content of the additive relative to the mass of the optical film is preferably 0.01 to 20% by mass, and more preferably 0.1 to 10% by mass.

作為其他樹脂,並無特別限定,可列舉:慣用樹脂、例如聚烯烴系樹脂、纖維素系樹脂、聚酯系樹脂、聚碳酸酯系樹脂、(甲基)丙烯酸系樹脂、聚苯乙烯系樹脂、聚醚醚酮系樹脂、聚碸系樹脂、聚醯亞胺系樹脂等。其他樹脂可單獨使用或組合使用兩種以上。The other resins are not particularly limited, and include conventional resins such as polyolefin resins, cellulose resins, polyester resins, polycarbonate resins, (meth) acrylic resins, and polystyrene resins. , Polyether ether ketone-based resins, poly lanthanide-based resins, polyimide-based resins, etc. Other resins can be used alone or in combination of two or more.

光學膜之厚度係視用途而適當調整,通常為10~200 μm,較佳為20~100 μm,更佳為25~80 μm,進而較佳為30~50 μm。若光學膜之厚度為上述範圍,則耐彎曲性及透明性變得良好。再者,本發明中,光學膜之厚度例如可藉由實施例所記載之方法進行測定。The thickness of the optical film is appropriately adjusted depending on the application, and is usually 10 to 200 μm, preferably 20 to 100 μm, more preferably 25 to 80 μm, and still more preferably 30 to 50 μm. If the thickness of the optical film is within the above range, bending resistance and transparency become good. In addition, in the present invention, the thickness of the optical film can be measured by the method described in the Examples, for example.

於本發明之光學膜中,厚度50 μm時之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上,尤佳為91%以上,最佳為92%以上。光學膜之全光線透過率為上述下限值以上的光學膜之透明性良好,於用於圖像顯示裝置之前面板之情形時,可有助於較高之視認性。又,全光線透過率之上限值通常為99.99%以下。再者,全光線透過率例如可藉由斯加試驗機股份有限公司製造之全自動直讀霧度電腦HGM-2DP、或日本分光股份有限公司製造之紫外可見近紅外分光光度計V-670進行測定。於將光學膜應用於例如液晶顯示裝置時,由於該膜之透過率較高,故而與透過率較低之情形相比,即便降低背光源等光源之電力,亦可於視認側獲得相同之亮度。In the optical film of the present invention, the total light transmittance at a thickness of 50 μm is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more, particularly preferably 91% or more, and most preferably 92 %the above. An optical film having a total light transmittance of more than the above lower limit has good transparency, and when used in a front panel of an image display device, can contribute to higher visibility. In addition, the upper limit of total light transmittance is usually 99.99% or less. Furthermore, the total light transmittance can be performed by, for example, a fully automatic direct-reading haze computer HGM-2DP manufactured by Sega Testing Machine Co., Ltd., or an ultraviolet-visible near-infrared spectrophotometer V-670 manufactured by Japan Spectroscopy Co., Ltd. Determination. When an optical film is applied to, for example, a liquid crystal display device, the transmittance of the film is high, so even if the power of a light source such as a backlight is reduced, the same brightness can be obtained on the viewing side compared to a case where the transmittance is low .

本發明之光學膜之彈性模數較佳為3 GPa以上,更佳為4 GPa以上,進而較佳為5 GPa以上,尤佳為6 GPa以上,且較佳為10 GPa以下,更佳為8 GPa以下,進而較佳為7 GPa以下。若光學膜之彈性模數為上述範圍,則容易提高光學膜之耐彎曲性。再者,彈性模數例如可使用島津製作所股份有限公司製造之自動立體測圖儀AG-IS,對寬度10 mm之試片於夾頭間距離500 mm、拉伸速度20 mm/min之條件下測定S-S曲線,並根據其斜率而測得。The elastic modulus of the optical film of the present invention is preferably 3 GPa or more, more preferably 4 GPa or more, further preferably 5 GPa or more, particularly preferably 6 GPa or more, and preferably 10 GPa or less, more preferably 8 GPa or less, and more preferably 7 GPa or less. If the elastic modulus of the optical film is within the above range, it is easy to improve the bending resistance of the optical film. In addition, for the elastic modulus, for example, an auto-stereograph AG-IS manufactured by Shimadzu Corporation can be used. For a test piece with a width of 10 mm, the distance between the chucks is 500 mm and the drawing speed is 20 mm / min. The SS curve is measured and measured according to its slope.

光學膜之製造方法並無特別限定,例如可藉由包括以下之步驟之方法進行製造:
(a)製備含有聚醯胺醯亞胺樹脂及二氧化矽粒子之液體(有時稱為聚醯胺醯亞胺清漆)之步驟(聚醯胺醯亞胺清漆製備步驟);及
(b)將聚醯胺醯亞胺清漆塗佈於基材而形成塗膜之步驟(塗佈步驟);以及
(c)使所塗佈之液體(塗膜)乾燥而形成光學膜之步驟(光學膜形成步驟)。
The manufacturing method of the optical film is not particularly limited. For example, it can be manufactured by a method including the following steps:
(a) the step of preparing a liquid containing polyamidimide resin and silica particles (sometimes referred to as polyamidimide varnish) (preparation step of polyamidimide varnish); and
(b) The step of applying the polyamidoamide imine varnish to the substrate to form a coating film (coating step); and
(c) A step of drying the applied liquid (coating film) to form an optical film (optical film forming step).

於聚醯胺醯亞胺清漆製備步驟中,為了製備聚醯胺醯亞胺清漆,將上述二羧酸化合物、上述四羧酸化合物、上述二胺化合物、及視需要之上述三羧酸化合物、以及作為醯亞胺化觸媒發揮作用之三級胺、脫水劑等其他成分進行混合,使其反應,而製備聚醯胺醯亞胺樹脂混合液。作為三級胺,可列舉上述芳香族胺或脂肪族胺等。作為脫水劑,可列舉乙酸酐或丙酸酐、異丁酸酐、特戊酸酐、丁酸酐、異戊酸酐等。於該聚醯胺醯亞胺樹脂混合液中添加不良溶劑,藉由再沈澱法使聚醯胺醯亞胺樹脂析出,並加以乾燥,取出沈澱物。視需要利用甲醇等溶劑將沈澱物洗淨並使其乾燥,獲得聚醯胺醯亞胺樹脂。繼而,將聚醯胺醯亞胺樹脂溶解於溶劑中,添加上述二氧化矽粒子及視需要之上述紫外線吸收劑或上述其他添加劑並進行攪拌,藉此製備聚醯胺醯亞胺清漆。再者,亦可將使含有二氧化矽粒子之二氧化矽溶膠之分散介質與能夠溶解聚醯胺醯亞胺樹脂之溶劑、例如下述聚醯胺醯亞胺清漆之製備所使用之溶劑進行置換所得之二氧化矽溶膠添加至聚醯胺醯亞胺樹脂中。In the preparation step of the polyimide amide imide varnish, in order to prepare the polyamide amide imide varnish, the dicarboxylic acid compound, the tetracarboxylic acid compound, the diamine compound, and the tricarboxylic acid compound as needed, And the tertiary amine, dehydrating agent and other components that function as an amide imidization catalyst are mixed and reacted to prepare a polyimide amide imide resin mixed solution. Examples of the tertiary amines include the above-mentioned aromatic amines and aliphatic amines. Examples of the dehydrating agent include acetic anhydride, propionic anhydride, isobutyric anhydride, pivalic anhydride, butyric anhydride, and isovaleric anhydride. A poor solvent is added to this polyamidoamide resin mixture, and the polyamidoamide resin is precipitated by the reprecipitation method, dried, and the precipitate is taken out. If necessary, the precipitate is washed with a solvent such as methanol and dried to obtain a polyamidoamide resin. Then, the polyamide amide imide resin is dissolved in a solvent, and the silica particles and the above-mentioned ultraviolet absorber or other additives described above are added and stirred to prepare a polyamide amide imide varnish. Furthermore, a dispersion medium containing silica dioxide sol containing silica particles and a solvent capable of dissolving the polyimide amide imine resin, for example, the solvent used in the preparation of the following poly amide amide imide varnish The silica sol obtained by the replacement is added to the polyamidoamide resin.

聚醯胺醯亞胺清漆之製備所使用之溶劑只要能夠溶解聚醯胺醯亞胺樹脂,則無特別限定。作為該溶劑,例如可列舉:N,N-二甲基乙醯胺、N,N-二甲基甲醯胺等醯胺系溶劑;γ-丁內酯、γ-戊內酯等內酯系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及其等之組合(混合溶劑)。於該等溶劑中,於製備添加有二氧化矽溶膠之清漆時,較佳為γ-丁內酯、γ-戊內酯等內酯系溶劑。又,於聚醯胺醯亞胺清漆中亦可含有水、醇系溶劑、酮系溶劑、非環狀酯系溶劑、醚系溶劑等。The solvent used in the preparation of the polyamidoamide imine varnish is not particularly limited as long as it can dissolve the polyamidoamide imide resin. Examples of the solvent include: acrylamide-based solvents such as N, N-dimethylacetamide and N, N-dimethylformamide; lactone-based solvents such as γ-butyrolactone and γ-valerolactone Solvents; sulphur-containing solvents such as dimethyl ballast, dimethyl sulfoxide, ciprofloxane; carbonate-based solvents such as ethylene carbonate and propylene carbonate; and combinations of these (mixed solvents). Among these solvents, lactone-based solvents such as γ-butyrolactone and γ-valerolactone are preferred when preparing a varnish to which silica sol is added. In addition, the polyamidoamide imide varnish may contain water, alcohol-based solvents, ketone-based solvents, acyclic ester-based solvents, ether-based solvents, and the like.

於塗佈步驟中,藉由公知之塗佈方法於基材上塗佈聚醯胺醯亞胺清漆而形成塗膜。作為公知之塗佈方法,例如可列舉:線棒塗佈法、反向塗佈、凹版塗佈等輥塗法、模嘴塗佈法、卡馬(comma)塗佈法、模唇塗佈法、旋轉塗佈法、網版塗佈法、噴注式塗佈法、浸漬法、噴霧法、流延成形法等。In the coating step, a polyimide amide imine varnish is coated on the substrate by a known coating method to form a coating film. Known coating methods include, for example, roll coating methods such as wire bar coating methods, reverse coating methods, and gravure coating methods, die coating methods, comma coating methods, and die lip coating methods. , Spin coating method, screen coating method, spray coating method, dipping method, spray method, casting method, etc.

於光學膜形成步驟中,可藉由將塗膜加以乾燥並自基材剝離而形成光學膜。亦可於剝離後進一步進行將光學膜進行乾燥之乾燥步驟。塗膜之乾燥通常可於50~350℃之溫度下進行。視需要可於惰性環境或減壓之條件下進行塗膜之乾燥。In the optical film forming step, the optical film can be formed by drying and peeling the coating film from the substrate. After peeling, a drying step of drying the optical film may be further performed. The drying of the coating film can usually be carried out at a temperature of 50 to 350 ° C. If necessary, the coating film can be dried under an inert environment or under reduced pressure.

作為基材之例,可列舉PET膜、PEN膜、聚醯亞胺膜、及聚醯胺醯亞胺膜等。其中,就耐熱性優異之觀點而言,較佳為PET膜、PEN膜、聚醯亞胺膜、及其他聚醯胺醯亞胺膜。進而,就與光學膜之密接性及成本之觀點而言,更佳為PET膜。Examples of the base material include PET film, PEN film, polyimide film, and polyimide film. Among them, from the viewpoint of excellent heat resistance, a PET film, a PEN film, a polyimide film, and other polyimide amide imide films are preferred. Furthermore, from the viewpoint of adhesion to the optical film and cost, the PET film is more preferable.

亦可於本發明之光學膜形成附加有硬塗層、黏著層、色相調整層等功能層之積層膜。
進而,於將本發明之光學膜供於對顯示裝置之安裝時,為了於光學膜之輸送時防止該膜之污染等,可於該膜之表面貼合保護膜。
[實施例]
It is also possible to form a laminated film with additional functional layers such as a hard coat layer, an adhesive layer, and a hue adjustment layer on the optical film of the present invention.
Furthermore, when the optical film of the present invention is provided for mounting on a display device, in order to prevent contamination of the film during transportation of the optical film, a protective film may be attached to the surface of the film.
[Example]

以下,基於實施例及比較例更具體地說明本發明,但本發明並不限定於以下之實施例。例中之「%」及「份」若無特別說明,則係指質量%及質量份。首先,對測定及評價方法進行說明。Hereinafter, the present invention will be described more specifically based on examples and comparative examples, but the present invention is not limited to the following examples. Unless otherwise specified, "%" and "parts" in the examples refer to mass% and mass parts. First, the measurement and evaluation method will be described.

<室溫(25℃)下之ΔHz>
使用啞鈴切割機將實施例及比較例中獲得之光學膜切割為68 mm×28 mm之大小,使用霧度電腦(斯加試驗機股份有限公司製造,「HGM-2DP」)測定心軸試驗前之光學膜之霧度Hzb (%)。其後,進行如下心軸試驗(依據JIS K 5600-5-1:1999),測定Hza (%)。首先,於室溫(25℃)下,沿彎曲半徑1 mm之圓筒形心軸,將測定光學膜之霧度Hzb (%)之部位均等地彎折。其後(1~2秒後)立即將彎折之光學膜恢復成平面狀,測定該平面狀之光學膜之彎折部位之霧度Hza (%)。根據測定結果,算出ΔHz(=Hza -Hzb ),如以下所述進行評價。
○ … ΔHz<0.5
× … ΔHz≧0.5
< ΔHz at room temperature (25 ℃) >
Using a dumbbell cutter, the optical films obtained in the examples and comparative examples were cut to a size of 68 mm × 28 mm, and a haze computer (manufactured by Sega Testing Machine Co., Ltd., "HGM-2DP") was used to measure the mandrel test. The haze of the optical film is Hz b (%). Thereafter, the following mandrel test (according to JIS K 5600-5-1: 1999) was performed to measure Hz a (%). First, at room temperature (25 ° C), the part where the haze Hz b (%) of the optical film is measured is bent equally along a cylindrical mandrel with a bending radius of 1 mm. Immediately thereafter (after 1 to 2 seconds), the bent optical film was restored to a planar shape, and the haze Hz a (%) of the bent portion of the planar optical film was measured. Based on the measurement results, ΔHz (= Hz a- Hz b ) was calculated and evaluated as follows.
○… ΔHz < 0.5
×… ΔHz ≧ 0.5

<溫度85℃、相對濕度85%保管時之ΔHz'>
使用啞鈴切割機將實施例及比較例中獲得之光學膜切割為68 mm×28 mm之大小,使用霧度電腦(斯加試驗機股份有限公司製造,「HGM-2DP」)測定所獲得之光學膜之霧度Hzd (%)。其後,進行如下耐久試驗,測定試驗後之Hzc (%)。首先,於恆溫恆濕環境耐久試驗機(Yuasa system股份有限公司製造,「CL09-type01D01-FSC90」)中,投入將測定霧度Hzd (%)之部位以彎曲半徑1 mm彎折之光學膜,於彎曲半徑1 mm(以彎折之光學膜之兩端變得平行之方式保持)、溫度85℃、相對濕度85%之環境下,將該光學膜保管24小時。其後,將彎折之光學膜恢復成平面狀,於30℃、相對濕度50%環境下定置30分鐘。測定該平面狀之光學膜之彎折部位之霧度Hzc (%)。根據測定結果,算出ΔHz'(=Hzc -Hzd ),如以下所述進行評價。
○ … ΔHz'<0.4
× … ΔHz'≧0.4
<ΔHz during storage at a temperature of 85 ° C and a relative humidity of 85%>
Using a dumbbell cutter, the optical films obtained in Examples and Comparative Examples were cut to a size of 68 mm × 28 mm, and the obtained optical measurements were performed using a haze computer (manufactured by Ska Tester Co., Ltd., "HGM-2DP"). Film haze Hz d (%). Thereafter, the following endurance test was performed, and the Hz c (%) after the test was measured. First, put an optical film that bends the part where the haze Hz d (%) is measured with a bending radius of 1 mm in a constant temperature and humidity environment durability tester (manufactured by Yuasa system Co., Ltd., "CL09-type01D01-FSC90") , Keep the optical film for 24 hours in an environment with a bending radius of 1 mm (maintained so that the ends of the bent optical film become parallel), a temperature of 85 ° C, and a relative humidity of 85%. After that, the bent optical film was restored to a flat shape, and set at 30 ° C and 50% relative humidity for 30 minutes. The haze Hz c (%) of the bent portion of the planar optical film was measured. Based on the measurement results, ΔHz '(= Hz c- Hz d ) was calculated and evaluated as described below.
○… ΔHz '< 0.4
×… ΔHz '≧ 0.4

<耐彎曲性試驗>
使用啞鈴切割機將實施例及比較例中獲得之光學膜切割為10 mm×100 mm之大小。將所切割之膜設置於MIT耐折疲勞試驗機(東洋精機製作所股份有限公司製造之「MIT-DA」,型號:0530)本體,於試驗速度175cpm、彎折角度135°、負重750g、彎折夾板之R 1.0 mm之條件下,實施向正背兩方向之彎折試驗,測定各膜之耐彎曲次數(不斷裂而能夠彎折之次數)。如以下所述進行評價。
○ … 耐彎曲次數為1萬次以上,良好。
× … 耐彎曲次數未達1萬次,不良。
<Bending resistance test>
Using a dumbbell cutter, the optical films obtained in the examples and comparative examples were cut to a size of 10 mm × 100 mm. Set the cut film on the body of MIT Folding Fatigue Testing Machine ("MIT-DA" manufactured by Toyo Seiki Co., Ltd., model: 0530) at a test speed of 175 cpm, a bending angle of 135 °, a load of 750 g, and bending Under the condition of R 1.0 mm of the splint, the bending test in the two directions of the front and back was carried out, and the bending resistance times (the number of bending times without breaking) of each film were measured. The evaluation is performed as described below.
○… The number of bending resistance times is 10,000 or more, which is good.
×… The number of times of bending resistance is less than 10,000, which is bad.

<重量平均分子量(Mw)>
凝膠滲透層析法(GPC)測定
・預處理方法
於實施例及比較例中獲得之聚醯胺醯亞胺樹脂中以成為濃度2mg/mL之方式添加DMF溶析液(10 mmol溴化鋰溶液),於80℃下一面攪拌30分鐘一面加熱,於冷卻後,利用0.45μm膜濾器進行過濾,將所獲得者作為測定溶液。
・測定條件
管柱:TSKgel SuperAWM-H×2+SuperAW2500×1(6.0 mm I.D.×150 mm×3根)
溶析液:DMF(添加10mM之溴化鋰)
流量:1.0mL/min.
檢測器:RI檢測器
管柱溫度:40℃
注入量:100μL
分子量標準:標準聚苯乙烯
<Weight average molecular weight (Mw)>
Gel Permeation Chromatography (GPC) measurement and pretreatment method DMF eluate (10 mmol lithium bromide solution) was added to the polyamidoamide resin obtained in Examples and Comparative Examples so as to have a concentration of 2 mg / mL. After heating at 80 ° C with stirring for 30 minutes, after cooling, filtration was performed using a 0.45 μm membrane filter, and the obtained one was used as a measurement solution.
・ Measurement conditions: TSKgel SuperAWM-H × 2 + SuperAW2500 × 1 (6.0 mm ID × 150 mm × 3 pieces)
Eluent: DMF (addition of 10 mM lithium bromide)
Flow rate: 1.0mL / min.
Detector: RI detector column temperature: 40 ℃
Injection volume: 100μL
Molecular weight standard: standard polystyrene

<光學膜之厚度>
對於實施例及比較例中獲得之光學膜,使用ABS數位式指示器(Mitutoyo股份有限公司製造,「ID-C112BS」)測定光學膜之厚度。
<Thickness of optical film>
For the optical films obtained in Examples and Comparative Examples, the thickness of the optical film was measured using an ABS digital indicator (manufactured by Mitutoyo Co., Ltd., "ID-C112BS").

(二氧化矽溶膠之製備)
將藉由溶膠-凝膠法所製作之BET徑(藉由BET法所測得之平均一次粒徑)為27 nm之非晶形二氧化矽溶膠作為原料,藉由溶劑置換,製備γ-丁內酯(以下,有時亦表述為GBL)置換二氧化矽溶膠。利用網眼10 μm之膜濾器對所獲得之溶膠進行過濾,獲得GBL置換二氧化矽溶膠。所獲得之GBL置換二氧化矽溶膠之二氧化矽成分(無機粒子)為30質量%。
(Preparation of silica sol)
Amorphous silica sol with a BET diameter (average primary particle diameter measured by the BET method) of 27 nm produced by the sol-gel method is used as a raw material, and γ-butyrolene is prepared by solvent replacement An ester (hereinafter sometimes referred to as GBL) replaces the silica sol. The obtained sol was filtered with a 10 μm mesh filter to obtain GBL-substituted silica sol. The silica component (inorganic particles) of the obtained GBL-substituted silica sol was 30% by mass.

(聚醯胺醯亞胺樹脂之製備)
1.合成例1
於氮氣環境下,於具備攪拌葉之1L可分離式燒瓶中添加2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(TFMB)65g(202.97 mmol)及N,N-二甲基乙醯胺(DMAc)834.69g,一面於室溫下攪拌一面使TFMB溶解於DMAc。其次,於燒瓶中添加4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(6FDA)27.09g(60.98 mmol),於室溫下攪拌3小時。其後,於燒瓶中添加4,4'-氧基雙(苯甲醯氯)(OBBC)12.00g(40.66 mmol)、繼而添加對苯二甲醯氯(TPC)20.63g(101.64 mmol),於室溫下攪拌1小時。繼而,於燒瓶中添加4-甲基吡啶6.63g(71.15 mmol)與乙酸酐18.68g(182.95 mmol),於室溫下攪拌30分鐘後,使用油浴升溫至70℃,進而攪拌3小時,獲得反應液。
將所獲得之反應液冷卻至室溫,呈絲狀投入至大量甲醇中,取出所析出之沈澱物,於甲醇中浸漬6小時後,利用甲醇洗淨。其次,於100℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(TPC/6FDA/OBBC/TFMB=50/30/20/100)。聚醯胺醯亞胺樹脂之重量平均分子量(Mw)為310,000。
(Preparation of Polyamide Amide Imide Resin)
1. Synthesis Example 1
Under a nitrogen atmosphere, add 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (TFMB) 65g (202.97 mmol) and N to a 1L separable flask equipped with a stirring blade , N-dimethylacetamide (DMAc) 834.69g, dissolving TFMB in DMAc while stirring at room temperature. Next, 27.09g (60.98 mmol) of 4,4'- (hexafluoroisopropylidene) diphthalic dianhydride (6FDA) was added to the flask, and it stirred at room temperature for 3 hours. Thereafter, 12.4 g (40.66 mmol) of 4,4'-oxybis (benzoyl chloride) (OBBC) was added to the flask, followed by 20.63 g (101.64 mmol) of terephthaloyl chloride (TPC), in Stir at room temperature for 1 hour. Then, 6.63 g (71.15 mmol) of 4-methylpyridine and 18.68 g (182.95 mmol) of acetic anhydride were added to the flask, and after stirring at room temperature for 30 minutes, the temperature was raised to 70 ° C using an oil bath, and further stirred for 3 hours to obtain The reaction solution.
The obtained reaction liquid was cooled to room temperature, put into a large amount of methanol in the form of a filament, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 100 ° C to obtain a polyamidoamide resin (TPC / 6FDA / OBBC / TFMB = 50/30/20/100). The weight average molecular weight (Mw) of the polyamide amide imide resin is 310,000.

2.合成例2
於氮氣環境下,於具備攪拌葉之1L可分離式燒瓶中添加TFMB40g(124.91 mmol)及DMAc682.51g,一面於室溫下攪拌一面使TFMB溶解於DMAc。其次,於燒瓶中添加6FDA16.78g(37.77 mmol),於室溫下攪拌3小時。其後,於燒瓶中添加OBBC3.72g(12.59 mmol)、繼而添加TPC15.34g(75.55 mmol),於室溫下攪拌1小時。繼而,於燒瓶中添加4-甲基吡啶8.21g(88.14 mmol)與乙酸酐15.43g(151.10 mmol),於室溫下攪拌30分鐘後,使用油浴升溫至70℃,進而攪拌3小時,獲得反應液。
將所獲得之反應液冷卻至室溫,呈絲狀投入至大量甲醇中,取出所析出之沈澱物,於甲醇中浸漬6小時後,利用甲醇洗淨。其次,於100℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(TPC/6FDA/OBBC/TFMB=60/30/10/100)。聚醯胺醯亞胺樹脂之重量平均分子量(Mw)為400,000。
2. Synthesis Example 2
Under a nitrogen atmosphere, 40 g (124.91 mmol) of TFMB and 682.51 g of DMAc were added to a 1 L separable flask equipped with a stirring blade, and TFMB was dissolved in DMAc while stirring at room temperature. Next, 6FDA16.78g (37.77 mmol) was added to the flask and stirred at room temperature for 3 hours. Thereafter, 3.72 g (12.59 mmol) of OBBC was added to the flask, followed by 15.34 g (75.55 mmol) of TPC, and stirred at room temperature for 1 hour. Then, 8.21 g (88.14 mmol) of 4-methylpyridine and 15.43 g (151.10 mmol) of acetic anhydride were added to the flask, and after stirring at room temperature for 30 minutes, the temperature was raised to 70 ° C using an oil bath, followed by stirring for 3 hours to obtain The reaction solution.
The obtained reaction liquid was cooled to room temperature, put into a large amount of methanol in the form of a filament, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 100 ° C to obtain a polyamidoamide resin (TPC / 6FDA / OBBC / TFMB = 60/30/10/100). The weight average molecular weight (Mw) of the polyamide amide imide resin is 400,000.

3.合成例3
於氮氣環境下,於具備攪拌葉之1L可分離式燒瓶中添加TFMB53.05g(165.66 mmol)及DMAc670.91g,一面於室溫下攪拌一面使TFMB溶解於DMAc。其次,於燒瓶中添加6FDA22.11g(49.77 mmol)、3,3',4,4'-聯苯四羧酸二酐(BPDA)4.88g(16.59 mmol),繼而,添加TPC20.21g(99.54 mmol),於室溫下攪拌1小時。繼而,於燒瓶中添加吡啶10.53g(133.08 mmol)與乙酸酐13.77g(134.83 mmol),於室溫下攪拌30分鐘後,使用油浴升溫至70℃,進一步攪拌3小時,獲得反應液。
將所獲得之反應液冷卻至室溫,呈絲狀投入至大量甲醇中,取出所析出之沈澱物,於甲醇中浸漬6小時後,利用甲醇洗淨。其次,於100℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺。聚醯胺醯亞胺之重量平均分子量(Mw)為190,000。
3. Synthesis Example 3
Under a nitrogen atmosphere, TFMB53.05g (165.66 mmol) and DMAc670.91g were added to a 1L separable flask equipped with a stirring blade, and TFMB was dissolved in DMAc while stirring at room temperature. Next, add 6FDA22.11g (49.77 mmol), 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) 4.88g (16.59 mmol) to the flask, and then add TPC20.21g (99.54 mmol) ), Stirred at room temperature for 1 hour. Then, 10.53 g (133.08 mmol) of pyridine and 13.77 g (134.83 mmol) of acetic anhydride were added to the flask, and after stirring at room temperature for 30 minutes, the temperature was raised to 70 ° C using an oil bath and further stirred for 3 hours to obtain a reaction liquid.
The obtained reaction liquid was cooled to room temperature, put into a large amount of methanol in the form of a filament, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 100 ° C to obtain polyamidoamide. The weight average molecular weight (Mw) of polyamidoamide imine is 190,000.

4.合成例4
於氮氣環境下,於連接有安裝了溶劑阱及過濾器之真空泵的反應容器中投入1.25g之異喹啉。其次,於反應容器中投入GBL375.00g、及TFMB104.12g,攪拌混合物使之溶解。進而,於將6FDA145.88g添加至反應容器中後,一面攪拌混合物一面利用油浴開始升溫。所添加之TFMB與6FDA之莫耳比為1.00:0.99,混合物中之單體濃度為40質量%。於反應容器之內溫達到80℃時減壓至650 mmHg,繼而升溫至內溫180℃。於內溫達到180℃後,進一步進行4小時加熱攪拌。其後,複壓至大氣壓,將內溫冷卻至155℃,獲得聚醯亞胺溶液。於155℃下添加GBL而製備聚醯亞胺之固形物成分為24質量%之均勻溶液,其後,自反應容器取出作為均勻溶液之聚醯亞胺清漆(1)。對所獲得之聚醯亞胺清漆中之聚醯亞胺進行GPC測定,結果重量平均分子量(Mw)為360,000。
4. Synthesis Example 4
Under a nitrogen atmosphere, 1.25 g of isoquinoline was put into a reaction vessel connected with a vacuum pump equipped with a solvent trap and a filter. Next, GBL375.00g and TFMB104.12g were put into the reaction vessel, and the mixture was stirred to dissolve. Furthermore, after 145.88 g of 6FDA was added to the reaction vessel, the temperature of the mixture was started using an oil bath while stirring the mixture. The molar ratio of the added TFMB to 6FDA is 1.00: 0.99, and the monomer concentration in the mixture is 40% by mass. When the internal temperature of the reaction vessel reached 80 ° C, the pressure was reduced to 650 mmHg, and then the temperature was increased to 180 ° C. After the internal temperature reached 180 ° C, heating and stirring were further performed for 4 hours. Thereafter, the pressure was increased to atmospheric pressure, and the internal temperature was cooled to 155 ° C to obtain a polyimide solution. GBL was added at 155 ° C to prepare a uniform solution of polyimide with a solid content of 24% by mass. Thereafter, the polyimide varnish (1) as a uniform solution was taken out from the reaction vessel. The polyimide in the obtained polyimide varnish was subjected to GPC measurement. As a result, the weight average molecular weight (Mw) was 360,000.

(光學膜)
1.實施例1~4
藉由將合成例1中獲得之聚醯胺醯亞胺樹脂(TPC/6FDA/OBBC/TFMB=50/30/20/100)利用GBL進行稀釋,添加GBL置換二氧化矽溶膠並充分進行混合,而獲得表1所記載之組成即樹脂/二氧化矽粒子混合清漆。此時,以樹脂與二氧化矽粒子之濃度成為8.0~15.0質量%之方式製備混合清漆。利用網眼10 μm之過濾器對所獲得之聚醯胺醯亞胺清漆進行過濾後,使用敷料器以自立膜之膜厚成為55μm之方式塗佈於聚酯基材(東洋紡股份有限公司製造,商品名「A4100」)之平滑面上,於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘後,將所獲得之塗膜自聚酯基材剝離而獲得自立膜。將自立膜固定於金屬框,進一步於大氣下、於200℃下乾燥40分鐘,獲得具有50 μm之厚度之聚醯胺醯亞胺膜(光學膜)。
(Optical film)
1. Examples 1 to 4
By diluting the polyamidoamide resin obtained in Synthesis Example 1 (TPC / 6FDA / OBBC / TFMB = 50/30/20/100) with GBL, adding GBL to replace the silica sol and thoroughly mixing, A resin / silica particle mixed varnish having the composition described in Table 1 was obtained. At this time, the mixed varnish was prepared in such a manner that the concentration of the resin and silica particles became 8.0 to 15.0% by mass. After filtering the obtained polyamidoamide imide varnish with a filter with a mesh of 10 μm, it was applied to a polyester substrate (manufactured by Toyobo Co., Ltd.) with a film thickness of 55 μm as a free-standing film using an applicator. The smooth surface of the trade name "A4100") was dried at 50 ° C for 30 minutes and then at 140 ° C for 15 minutes, and the obtained coating film was peeled off from the polyester substrate to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and further dried at 200 ° C for 40 minutes in the atmosphere to obtain a polyamidoimide film (optical film) having a thickness of 50 μm.

2.實施例5~8及比較例1
將合成例2中獲得之聚醯胺醯亞胺樹脂(TPC/6FDA/OBBC/TFMB=50/30/20/100)變更為TPC/6FDA/OBBC/TFMB=60/30/10/100,除此以外,與實施例1~4同樣地獲得含有二氧化矽粒子之聚醯胺醯亞胺膜(光學膜)。
2. Examples 5 to 8 and Comparative Example 1
The polyimide amide imine resin obtained in Synthesis Example 2 (TPC / 6FDA / OBBC / TFMB = 50/30/20/100) was changed to TPC / 6FDA / OBBC / TFMB = 60/30/10/100, except Except for this, in the same manner as in Examples 1 to 4, a polyamidoimide film (optical film) containing silicon dioxide particles was obtained.

3.實施例9
將合成例1中獲得之聚醯胺醯亞胺樹脂變更為合成例3中獲得之聚醯胺醯亞胺樹脂(TPC/6FDA/BPDA/TFMB=60/30/10/100),除此以外,與實施例2同樣地獲得具有50 μm之厚度之聚醯胺醯亞胺膜(光學膜)。
3. Example 9
The polyimide amide imine resin obtained in Synthesis Example 1 was changed to the polyimide amide imide resin obtained in Synthesis Example 3 (TPC / 6FDA / BPDA / TFMB = 60/30/10/100) except In the same manner as in Example 2, a polyimide amide imide film (optical film) having a thickness of 50 μm was obtained.

4.實施例10
將二氧化矽粒子之平均一次粒徑變更為20 nm,除此以外,與實施例6同樣地獲得具有50 μm之厚度之聚醯胺醯亞胺膜(光學膜)。
4. Example 10
Except that the average primary particle diameter of the silicon dioxide particles was changed to 20 nm, in the same manner as in Example 6, a polyamidoimide film (optical film) having a thickness of 50 μm was obtained.

5.實施例11
將二氧化矽粒子相對於聚醯胺醯亞胺膜(光學膜)之含量RSi 設為10質量%,將二氧化矽粒子之平均一次粒徑變更為83 nm,除此以外,與實施例5同樣地獲得具有50 μm之厚度之聚醯胺醯亞胺膜(光學膜)。
5. Example 11
The content of silicon dioxide particles relative to the polyimide amide imine film (optical film) R Si was set to 10% by mass, and the average primary particle size of the silicon dioxide particles was changed to 83 nm. 5 Similarly, a polyimide amide imide film (optical film) having a thickness of 50 μm was obtained.

6.比較例2
將合成例3中獲得之聚醯胺醯亞胺樹脂(TPC/6FDA/BPDA/TFMB=60/30/10/100)利用DMAc進行稀釋而製備濃度22質量%之聚醯胺醯亞胺清漆。利用網眼10 μm之過濾器對所獲得之聚醯胺醯亞胺清漆進行過濾後,使用敷料器以自立膜之膜厚成為55μm之方式塗佈於聚酯基材(東洋紡股份有限公司製造,商品名「A4100」)之平滑面上,於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘後,將所獲得之塗膜自聚酯基材剝離而獲得自立膜。將自立膜固定於金屬框,進一步於大氣下、於200℃下乾燥40分鐘,獲得具有50 μm之厚度之聚醯胺醯亞胺膜(光學膜)。
6. Comparative Example 2
The polyamide amide imide resin (TPC / 6FDA / BPDA / TFMB = 60/30/10/100) obtained in Synthesis Example 3 was diluted with DMAc to prepare a polyamide amide imide varnish with a concentration of 22% by mass. After filtering the obtained polyamidoamide imide varnish with a filter with a mesh of 10 μm, it was applied to a polyester substrate (manufactured by Toyobo Co., Ltd.) with a film thickness of 55 μm as a free-standing film using an applicator. The smooth surface of the trade name "A4100") was dried at 50 ° C for 30 minutes and then at 140 ° C for 15 minutes, and the obtained coating film was peeled off from the polyester substrate to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and further dried at 200 ° C for 40 minutes in the atmosphere to obtain a polyamidoimide film (optical film) having a thickness of 50 μm.

7.比較例3
將合成例4中獲得之聚醯亞胺樹脂(6FDA/TFMB=100/100)以GBL/DMAc=10/90比進行稀釋而製備濃度15.7質量%之聚醯亞胺清漆。利用網眼10 μm之過濾器對所獲得之聚醯亞胺清漆進行過濾後,使用敷料器以自立膜之膜厚成為55μm之方式塗佈於聚酯基材(東洋紡股份有限公司製造,商品名「A4100」)之平滑面上,於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘後,將所獲得之塗膜自聚酯基材剝離而獲得自立膜。將自立膜固定於金屬框,進一步於大氣下、於200℃下乾燥40分鐘,獲得具有50 μm之厚度之聚醯亞胺膜(光學膜)。
7. Comparative Example 3
The polyimide resin (6FDA / TFMB = 100/100) obtained in Synthesis Example 4 was diluted with a GBL / DMAc = 10/90 ratio to prepare a polyimide varnish with a concentration of 15.7% by mass. After filtering the obtained polyimide varnish with a filter with a mesh of 10 μm, it was applied to a polyester base material (manufactured by Toyobo Co., Ltd.) so that the thickness of the free-standing film became 55 μm using an applicator "A4100") on the smooth surface, after drying at 50 ° C for 30 minutes and then at 140 ° C for 15 minutes, the obtained coating film was peeled off from the polyester substrate to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and further dried at 200 ° C for 40 minutes in the atmosphere to obtain a polyimide film (optical film) having a thickness of 50 μm.

8.比較例4
藉由將合成例4中獲得之聚醯亞胺樹脂(6FDA/TFMB=100/100)利用GBL進行稀釋,添加GBL置換二氧化矽溶膠並充分進行混合,而獲得樹脂/二氧化矽粒子混合清漆。此時,以樹脂與二氧化矽粒子之濃度成為15.0質量%之方式製備混合清漆。利用網眼10 μm之過濾器對所獲得之聚醯亞胺清漆進行過濾後,使用敷料器以自立膜之膜厚成為55μm之方式塗佈於聚酯基材(東洋紡股份有限公司製造,商品名「A4100」)之平滑面上,於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘後,將所獲得之塗膜自聚酯基材剝離而獲得自立膜。將自立膜固定於金屬框,進一步於大氣下、於200℃下乾燥40分鐘,獲得具有50 μm之厚度之聚醯亞胺膜(光學膜)。
8. Comparative Example 4
By diluting the polyimide resin (6FDA / TFMB = 100/100) obtained in Synthesis Example 4 with GBL, adding GBL to replace the silica sol and thoroughly mixing, a resin / silica particle mixed varnish is obtained . At this time, a mixed varnish was prepared so that the concentration of the resin and silica particles became 15.0% by mass. After filtering the obtained polyimide varnish with a filter with a mesh of 10 μm, it was applied to a polyester base material (manufactured by Toyobo Co., Ltd.) so that the film thickness of the free-standing film became 55 μm using an applicator. "A4100") on the smooth surface, after drying at 50 ° C for 30 minutes and then at 140 ° C for 15 minutes, the obtained coating film was peeled off from the polyester substrate to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and further dried at 200 ° C for 40 minutes in the atmosphere to obtain a polyimide film (optical film) having a thickness of 50 μm.

表1中表示實施例1~11、及比較例1~4中獲得之光學膜於室溫下之ΔHz、溫度85℃、相對濕度85%下之ΔHz、及耐彎曲性試驗之評價結果。再者,表1中,構成聚醯胺醯亞胺樹脂之結構單元之比率關於實施例1~8、10、11及比較例1,表示源自TPC之結構單元/源自6FDA之結構單元/源自OBBC之結構單元/源自TFMB之結構單元之比率(莫耳%),關於實施例9及比較例2,表示源自TPC之結構單元/源自6FDA之結構單元/源自BPDA之結構單元/源自TFMB之結構單元之比率(莫耳%),關於比較例3、4,表示源自6FDA之結構單元/源自TFMB之結構單元之比率(莫耳%)。Table 1 shows the ΔHz at room temperature, the ΔHz at a temperature of 85 ° C, and the ΔHz at a relative humidity of 85% of the optical films obtained in Examples 1 to 11 and Comparative Examples 1 to 4, and the evaluation results of the bending resistance test. In addition, in Table 1, the ratio of the structural unit which comprises a polyimide amide imine resin regarding Examples 1-8, 10, 11 and Comparative Example 1 shows the structural unit derived from TPC / the structural unit derived from 6FDA / The ratio of structural units derived from OBBC / structural units derived from TFMB (mol%), regarding Example 9 and Comparative Example 2, the structural units derived from TPC / the structural units derived from 6FDA / the structure derived from BPDA The ratio of units / structural units derived from TFMB (mol%), and Comparative Examples 3 and 4 represent the ratio of structural units derived from 6FDA / structural units derived from TFMB (mol%).

[表1]
[Table 1]

確認到實施例1~11之光學膜於耐彎曲性試驗中之耐彎曲次數均為1萬次以上,耐彎曲性優異,並且與比較例1~4之光學膜相比,溫度85℃、相對濕度85%保管時之ΔHz明顯較低。因此,實施例1~11之光學膜可同時實現優異之耐彎曲性與高溫、高濕下之優異之光學特性之穩定性。It was confirmed that the optical films of Examples 1 to 11 all had a bending resistance of 10,000 or more in the bending resistance test, and were excellent in bending resistance. Compared with the optical films of Comparative Examples 1 to 4, the temperature was 85 ° C. The ΔHz when stored at 85% humidity is significantly lower. Therefore, the optical films of Examples 1 to 11 can achieve both excellent bending resistance and excellent stability of optical characteristics under high temperature and high humidity.

Claims (7)

一種光學膜,其係含有聚醯胺醯亞胺樹脂而成者,且 滿足式(1)之關係: ΔHz<0.5 (1) [式(1)中,ΔHz表示Hza -Hzb ,Hza 表示於室溫下以彎曲半徑1 mm彎折1次並恢復成平面狀之心軸試驗(依據JIS K 5600-5-1:1999)後之光學膜之霧度(%),Hzb 表示該心軸試驗前之光學膜之霧度(%)]。An optical film, which is made of polyimide amide imide resin and satisfies the relationship of formula (1): ΔHz <0.5 (1) [In formula (1), ΔHz means Hz a- Hz b , Hz a Represents the haze (%) of the optical film after the mandrel test (according to JIS K 5600-5-1: 1999) bent once with a bending radius of 1 mm at room temperature and restored to a planar shape, Hz b represents the Haze (%) of optical film before mandrel test]. 如請求項1之光學膜,其中上述聚醯胺醯亞胺樹脂係包含源自二羧酸化合物之結構單元、源自四羧酸化合物之結構單元、及源自二胺化合物之結構單元之樹脂,且進而包含平均一次粒徑為100 nm以下之二氧化矽粒子。The optical film according to claim 1, wherein the polyamidoamide resin is a resin containing a structural unit derived from a dicarboxylic acid compound, a structural unit derived from a tetracarboxylic acid compound, and a structural unit derived from a diamine compound , And further contains silica particles with an average primary particle size of 100 nm or less. 如請求項2之光學膜,其中上述二氧化矽粒子之平均一次粒徑為80 nm以下。The optical film according to claim 2, wherein the average primary particle diameter of the silica particles is 80 nm or less. 如請求項2或3之光學膜,其中構成上述聚醯胺醯亞胺樹脂之源自二羧酸化合物之結構單元包含源自式(I) [化23] [式(I)中,R1 及R2 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R3 ~R6 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R3 ~R6 中所含之氫原子可分別獨立地經鹵素原子取代] 所表示之化合物之結構單元,且 滿足式(2)之關係 0<RSi ≦32+2/3×R(I) (2) [式(2)中,RSi 表示二氧化矽粒子相對於光學膜之質量之含量(質量%),R(I) 表示源自式(I)所表示之化合物之結構單元相對於構成聚醯胺醯亞胺樹脂之全部結構單元之總莫耳數之含量(莫耳%)]。The optical film according to claim 2 or 3, wherein the structural unit derived from the dicarboxylic acid compound constituting the above-mentioned polyimide amide imide resin contains the formula (I) [Chem. 23] [In formula (I), R 1 and R 2 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 3 to R 6 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 3 to R 6 may be independently substituted by halogen atoms, respectively, and the structural unit of the compound represented by and satisfies the formula (2) Relation 0 <R Si ≦ 32 + 2/3 × R (I) (2) [In formula (2), R Si represents the content (mass%) of silicon dioxide particles relative to the mass of the optical film, R ( I) represents the content (mol%) of the structural units derived from the compound represented by the formula (I) relative to the total number of moles of all the structural units constituting the polyamidoamide resin.] 如請求項4之光學膜,其中上述式(2)為5≦RSi ≦50。The optical film according to claim 4, wherein the above formula (2) is 5 ≦ R Si ≦ 50. 如請求項2至5中任一項之光學膜,其中構成上述聚醯胺醯亞胺樹脂之源自四羧酸化合物之結構單元包含源自式(II) [化24] [式(II)中,R7 ~R14 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R7 ~R14 中所含之氫原子可分別獨立地經鹵素原子取代] 所表示之化合物之結構單元,且構成上述聚醯胺醯亞胺樹脂之源自二胺化合物之結構單元包含源自式(III) [化25] [式(III)中,R15 ~R22 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R15 ~R22 中所含之氫原子可分別獨立地經鹵素原子取代] 所表示之化合物之結構單元。The optical film according to any one of claims 2 to 5, wherein the structural unit derived from the tetracarboxylic acid compound that constitutes the above-mentioned polyamidoamide resin contains a compound derived from formula (II) [Chem. 24] [In formula (II), R 7 to R 14 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 7 to R 14 may be It is independently substituted with a halogen atom] the structural unit of the compound represented by, and the structural unit derived from the diamine compound constituting the above-mentioned polyamidoamide resin includes the formula (III) [Chem. 25] [In formula (III), R 15 to R 22 each independently represent a hydrogen atom, a C 1-6 alkyl group or a C 6-12 aryl group, and the hydrogen atoms contained in R 15 to R 22 may be The structural unit of the compound represented by independently substituted by a halogen atom]. 如請求項2至6中任一項之光學膜,其中構成聚醯胺醯亞胺樹脂之源自二羧酸化合物之結構單元包含源自式(IV) [化26] [式(IV)中,R23 及R24 分別獨立地表示羥基、甲氧基、乙氧基、正丙氧基、正丁氧基或氯原子,R25 ~R32 分別獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R25 ~R32 中所含之氫原子可分別獨立地經鹵素原子取代,A分別獨立地表示-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-NR33 -,R33 表示可經鹵素原子取代之碳數1~12之烴基,m表示1~4之整數] 所表示之化合物之結構單元。The optical film according to any one of claims 2 to 6, wherein the structural unit derived from the dicarboxylic acid compound constituting the polyimide amide imine resin contains a compound derived from formula (IV) [Chem 26] [In formula (IV), R 23 and R 24 each independently represent a hydroxyl group, a methoxy group, an ethoxy group, n-propoxy group, n-butoxy group or a chlorine atom, and R 25 to R 32 each independently represent a hydrogen atom , An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, the hydrogen atoms contained in R 25 to R 32 may be independently substituted by halogen atoms, and A independently represents -O-, -CH 2- , -CH 2 -CH 2- , -CH (CH 3 )-, -C (CH 3 ) 2- , -C (CF 3 ) 2- , -SO 2- , -S-, -CO- or -NR 33- , R 33 represents a C 1-12 hydrocarbon group which may be substituted with a halogen atom, and m represents an integer of 1 to 4] a structural unit of the compound represented by
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