TW202132423A - Method for producing polyamide-based resin powder including bringing a polyamide-based resin solution (a) into contact with a poor solvent solution (b1) - Google Patents

Method for producing polyamide-based resin powder including bringing a polyamide-based resin solution (a) into contact with a poor solvent solution (b1) Download PDF

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TW202132423A
TW202132423A TW110100608A TW110100608A TW202132423A TW 202132423 A TW202132423 A TW 202132423A TW 110100608 A TW110100608 A TW 110100608A TW 110100608 A TW110100608 A TW 110100608A TW 202132423 A TW202132423 A TW 202132423A
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polyamide
polyamide resin
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poor solvent
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西山奈津美
山下裕樹
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日商住友化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/12Powdering or granulating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/46Post-polymerisation treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/1028Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
    • C08G73/1032Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous characterised by the solvent(s) used

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  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Polyamides (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

The present invention provides a method for producing polyamide-based resin powder that can easily and efficiently manufacture polyamide-based resin powders with smaller particle diameters and smaller particle size differences. The manufacturing method of the polyamide-based resin powder of the present invention at least includes a contact step of bringing a polyamide-based resin solution (a) into contact with a poor solvent solution (b1). The polyamide-based resin solution (a) is obtained by dissolving polyamide-based resins in a good solvent for the polyamide-based resin. The poor solvent solution (b1) contains at least one poor solvent for the polyamide-based resin. An area of a supply interface region in the contact step above is set to Xm2. When an addition rate of the polyamide-based resin solution (a) or the poor solvent solution (b) is set to Y kg/min, an addition flux below 400 is calculated according to the formula (A): addition flux ((kg/min)/m2)=Y/X.

Description

聚醯胺系樹脂粉體之製造方法Manufacturing method of polyamide resin powder

本發明係關於一種聚醯胺系樹脂粉體之製造方法。The present invention relates to a manufacturing method of polyamide resin powder.

目前,液晶顯示裝置或有機EL顯示裝置等圖像顯示裝置不僅用於電視,亦廣泛用於行動電話或智慧型手錶等各種用途。隨著此種用途擴大,正在追求一種具有可撓性特性之圖像顯示裝置(可撓性顯示器)。At present, image display devices such as liquid crystal display devices or organic EL display devices are not only used in televisions, but also widely used in various applications such as mobile phones and smart watches. With the expansion of such uses, an image display device (flexible display) with flexible characteristics is being sought.

圖像顯示裝置包含液晶顯示元件或有機EL顯示元件等顯示元件,此外亦包含偏光板、相位差板及前面板等構成構件。為了達成可撓性顯示器,該等所有構成構件必須具有柔軟性。The image display device includes display elements such as a liquid crystal display element or an organic EL display element, and also includes constituent members such as a polarizing plate, a phase difference plate, and a front panel. In order to achieve a flexible display, all the constituent members must have flexibility.

迄今為止,一直使用玻璃作為前面板。玻璃之透明度高,根據玻璃之種類可表現高硬度,但另一方面,剛性非常高,容易破裂,因此難以用作可撓性顯示器之前面板材料。So far, glass has been used as the front panel. Glass has high transparency and can exhibit high hardness according to the type of glass, but on the other hand, it has very high rigidity and is easy to break, so it is difficult to use as a front panel material for flexible displays.

因此,正在研究利用高分子材料作為代替玻璃之材料。包含高分子材料之前面板容易表現可撓性特性,因此有望用於各種用途。作為具有柔軟性之樹脂,可例舉各種樹脂,例如有聚醯胺系樹脂及聚醯亞胺系樹脂。Therefore, research is underway to use polymer materials as a material to replace glass. Before the polymer material is included, the panel tends to exhibit flexibility characteristics, so it is expected to be used in various applications. As the resin having flexibility, various resins may be mentioned, for example, polyamide resins and polyimide resins.

於使用聚醯胺系樹脂及聚醯亞胺系樹脂製造前面板等構件之情形時,使用該等樹脂之粉體以便容易操作。例如,於專利文獻1中揭示有一種聚醯亞胺粉體,其具有特定平均粒徑,可獲得450 nm下之光線透過率為80%以上之膜。 [先前技術文獻] [專利文獻]When using polyamide-based resins and polyimide-based resins to manufacture front panels and other components, powders of these resins are used for easy handling. For example, Patent Document 1 discloses a polyimide powder, which has a specific average particle size and can obtain a film with a light transmittance of 80% or more at 450 nm. [Prior Technical Literature] [Patent Literature]

[專利文獻1]國際公開第2017/179367號[Patent Document 1] International Publication No. 2017/179367

[發明所欲解決之問題][The problem to be solved by the invention]

本發明人研究聚醯胺系樹脂粉體之製造方法時發現,關於粒徑較小且粒徑之差異較小之聚醯胺系樹脂粉體,於製造聚醯胺系樹脂粉體時之乾燥步驟中,乾燥時間變短,不易產生乾燥不均,並且於使用聚醯胺系樹脂粉體製造光學膜時之溶解步驟、例如清漆製造步驟中,溶解時間變短,不易產生溶解不均。例如,於專利文獻1中記載有一種聚醯亞胺粉體之製造方法,其係於聚醯亞胺溶液中加入聚醯亞胺之不良溶劑,使聚醯亞胺析出而形成粉體。然而,根據本發明人之研究可知,於聚醯胺系樹脂之情形時,根據不良溶劑之添加條件等,有時無法獲得粒徑較小且粒徑之差異較小之聚醯胺系樹脂粉體。The inventor of the present invention studied the production method of polyamide-based resin powder and found that the drying of polyamide-based resin powder with small particle size and small difference in particle size during the production of polyamide-based resin powder In the step, the drying time is shortened and uneven drying is less likely to occur. In addition, in the dissolving step when the polyamide-based resin powder is used to manufacture an optical film, such as the varnish manufacturing step, the dissolution time becomes shorter and the dissolution unevenness is less likely to occur. For example, Patent Document 1 describes a method for producing polyimide powder, which is to add a polyimine poor solvent to a polyimide solution to precipitate the polyimine to form a powder. However, according to the research of the present inventors, in the case of polyamide resins, depending on the addition conditions of poor solvents, etc., it is sometimes impossible to obtain polyamide resin powders with smaller particle diameters and smaller differences in particle diameters. body.

因此,本發明之目的在於提供一種容易有效率地製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體的聚醯胺系樹脂粉體之製造方法。 [解決問題之技術手段]Therefore, the object of the present invention is to provide a method for producing polyamide-based resin powders that can easily and efficiently produce polyamide-based resin powders with smaller particle diameters and smaller particle diameter differences. [Technical means to solve the problem]

本發明人為了解決上述問題,而著眼於不良溶劑之添加方法,進行銳意研究。結果發現,藉由包括使聚醯胺系樹脂溶解於良溶劑中而成之聚醯胺系樹脂溶液(a)於特定條件下與不良溶劑接觸之步驟的聚醯胺系樹脂粉體之製造方法,可解決上述問題,從而完成本發明。In order to solve the above-mentioned problems, the inventors focused on the method of adding poor solvents and conducted intensive research. As a result, it was discovered that a method for producing polyamide-based resin powder including the step of dissolving polyamide-based resin in a good solvent (a) in contact with a poor solvent under specific conditions , The above-mentioned problems can be solved, thereby completing the present invention.

即,本發明包含以下之適宜形態。 [1]一種聚醯胺系樹脂粉體之製造方法,其至少包括使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟,上述聚醯胺系樹脂溶液(a)係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b)包含針對上述聚醯胺系樹脂之至少1種不良溶劑;於將上述接觸步驟中之供給界面區域之面積設為X m2 ,將聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加速度設為Y kg/分鐘時,根據式(A)算出之添加通量為400以下: 添加通量((kg/分鐘)/m2 )=Y/X 式(A)。 [2]如上述[1]所記載之製造方法,其中上述接觸步驟藉由於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)而進行。 [3]如上述[1]或[2]所記載之製造方法,其中於上述接觸步驟中,於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)之情形時將聚醯胺系樹脂溶液(a)之攪拌功率設為Z kW/m3 ,於不良溶劑液(b)中添加聚醯胺系樹脂溶液(a)之情形時將不良溶劑液(b)之攪拌功率設為Z kW/m3 ,根據式(B)算出之上述添加通量相對於攪拌功率之比率R為300以下: 比率R=(Y/X)/Z 式(B)。 [4]如上述[1]至[3]中任一項所記載之製造方法,其中上述接觸步驟至少包括比率R互不相同之第1接觸步驟及第2接觸步驟,且第1接觸步驟中之比率R1 小於第2接觸步驟中之比率R2 。 [5]如上述[4]所記載之製造方法,其中第1接觸步驟中之比率R1 為150以下。 [6]如上述[1]至[5]中任一項所記載之製造方法,其中聚醯胺系樹脂溶液(a)之黏度為0.5~100 Pa・s。 [7]如上述[1]至[6]中任一項所記載之製造方法,其中聚醯胺系樹脂選自由聚醯胺樹脂及聚醯胺醯亞胺樹脂所組成之群。 [8]如上述[1]至[7]中任一項所記載之製造方法,其中於上述接觸步驟中,聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加係使用選自由噴霧器、滴液噴嘴、噴水器及噴嘴分散板所組成之群中之1種以上而進行。 [9]如上述[8]所記載之製造方法,其中上述添加係使用噴霧器進行。 [10]如上述[1]至[9]中任一項所記載之製造方法,其中聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑。 [11]如上述[10]所記載之製造方法,其進而包括使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸而獲得上述聚醯胺系樹脂溶液(a)之步驟,上述聚醯胺系樹脂溶液(a0 )係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b0 )包含針對上述聚醯胺系樹脂之至少1種不良溶劑。 [12]如上述[11]所記載之製造方法,其中將獲得聚醯胺系樹脂溶液(a)之步驟中使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸時之供給界面區域之面積設為P m2 ,將聚醯胺系樹脂溶液(a0 )或不良溶劑液(b0 )之添加速度設為Q kg/分鐘時,根據式(C)算出之添加通量超過400: 添加通量((kg/分鐘)/m2 )=Q/P  式(C)。 [發明之效果]That is, the present invention includes the following suitable forms. [1] A method for producing polyamide-based resin powder, which includes at least a contact step of contacting a polyamide-based resin solution (a) with a poor solvent solution (b), the above-mentioned polyamide-based resin solution (a) It is prepared by dissolving a polyamide resin in a good solvent for the polyamide resin, and the poor solvent liquid (b) contains at least one poor solvent for the polyamide resin; in the contact step When the area of the supply interface area in the middle is set to X m 2 , and the addition rate of the polyamide resin solution (a) or the poor solvent solution (b) is set to Y kg/min, the addition rate calculated according to the formula (A) The amount is 400 or less: Add flux ((kg/min)/m 2 )=Y/X formula (A). [2] The production method as described in the above [1], wherein the contact step is performed by adding a poor solvent solution (b) to the polyamide resin solution (a). [3] The production method as described in [1] or [2] above, wherein in the contact step, when the poor solvent solution (b) is added to the polyamide resin solution (a), the polyamide The stirring power of the resin solution (a) is set to Z kW/m 3 , when the polyamide resin solution (a) is added to the poor solvent solution (b), the stirring power of the poor solvent solution (b) is set to Z kW/m 3 , the ratio R of the above-mentioned added flux to the stirring power calculated according to formula (B) is 300 or less: ratio R=(Y/X)/Z formula (B). [4] The manufacturing method described in any one of [1] to [3] above, wherein the contact step includes at least a first contact step and a second contact step in which the ratio R is different from each other, and in the first contact step The ratio R 1 is smaller than the ratio R 2 in the second contact step. [5] The production method described in [4] above, wherein the ratio R 1 in the first contact step is 150 or less. [6] The production method as described in any one of [1] to [5] above, wherein the viscosity of the polyamide resin solution (a) is 0.5 to 100 Pa·s. [7] The production method as described in any one of [1] to [6] above, wherein the polyamide resin is selected from the group consisting of polyamide resins and polyimide resins. [8] The production method as described in any one of [1] to [7] above, wherein in the contact step, the addition of the polyamide resin solution (a) or the poor solvent solution (b) is selected Free sprayer, drip nozzle, water sprayer and nozzle dispersion plate consisting of more than one type. [9] The production method as described in the above [8], wherein the addition is performed using a sprayer. [10] The production method as described in any one of [1] to [9] above, wherein the polyamide-based resin solution (a) further contains at least one poor solvent. [11] The production method described in [10] above, which further comprises contacting the polyamide-based resin solution (a 0 ) with the poor solvent solution (b 0 ) to obtain the above-mentioned polyamide-based resin solution (a) Step, the polyamide resin solution (a 0 ) is prepared by dissolving the polyamide resin in a good solvent for the polyamide resin, and the poor solvent solution (b 0 ) contains the polyamide resin At least one poor solvent for resin. When [12] As the above-mentioned [11] according to the manufacturing method, wherein the step of obtaining a polyamide resin solution (a) of the manipulation polyamide resin solution (a 0) and the poor solvent solution (b 0) in contact The area of the supply interface area is set to P m 2 , and the addition rate of the polyamide resin solution (a 0 ) or poor solvent solution (b 0 ) is set to Q kg/min, the addition calculated according to formula (C) Flux exceeds 400: Add flux ((kg/min)/m 2 )=Q/P formula (C). [Effects of Invention]

根據本發明,可提供一種容易製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體的聚醯胺系樹脂粉體之製造方法。According to the present invention, it is possible to provide a method for producing polyamide-based resin powder that is easy to produce a polyamide-based resin powder with a small particle size and a small difference in particle size.

以下,對本發明之實施方式詳細地進行說明。再者,本發明之範圍並不限定於此處說明之實施方式,可於不脫離本發明之宗旨之範圍內進行各種變更。Hereinafter, embodiments of the present invention will be described in detail. Furthermore, the scope of the present invention is not limited to the embodiments described here, and various changes can be made without departing from the scope of the present invention.

本發明之聚醯胺系樹脂粉體之製造方法(以下,亦稱為「本發明之製造方法」)至少包括使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟,上述聚醯胺系樹脂溶液(a)係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b)包含針對上述聚醯胺系樹脂之至少1種不良溶劑;於將上述接觸步驟中之供給界面區域之面積設為X m2 ,將聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加速度設為Y kg/分鐘時,根據式(A)算出之添加通量為400以下: 添加通量((kg/分鐘)/m2 )=Y/X 式(A)。The manufacturing method of the polyamide resin powder of the present invention (hereinafter also referred to as "the manufacturing method of the present invention") includes at least a contact step of bringing the polyamide resin solution (a) into contact with the poor solvent solution (b) , The polyamide resin solution (a) is prepared by dissolving a polyamide resin in a good solvent for the polyamide resin, and the poor solvent solution (b) contains a solution for the polyamide resin. At least one poor solvent; set the area of the supply interface area in the above contact step as X m 2 , and set the addition rate of the polyamide resin solution (a) or the poor solvent solution (b) to Y kg/min When the addition flux calculated according to formula (A) is 400 or less: addition flux ((kg/min)/m 2 )=Y/X formula (A).

本發明之製造方法至少包括使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟,且該接觸步驟中之添加通量為400以下。The production method of the present invention includes at least a contact step of bringing the polyamide resin solution (a) into contact with the poor solvent solution (b), and the flux of addition in the contact step is 400 or less.

(聚醯胺系樹脂溶液(a)) 聚醯胺系樹脂溶液(a)係使聚醯胺系樹脂溶解於良溶劑中而成之溶液。此處,於本說明書中,聚醯胺系樹脂表示選自由聚醯胺樹脂、聚醯胺醯亞胺樹脂及聚醯胺醯亞胺前驅物樹脂所組成之群中之至少1種樹脂。聚醯胺樹脂係含有包含醯胺基之重複結構單元之樹脂,聚醯胺醯亞胺樹脂係含有包含醯胺基及醯亞胺基兩者之重複結構單元之樹脂。又,聚醯胺醯亞胺前驅物樹脂係藉由醯亞胺化而賦予聚醯胺醯亞胺樹脂之醯亞胺化前之前驅物,係亦被稱為聚醯胺酸之樹脂。於本說明書中,亦將上述聚醯胺醯亞胺前驅物樹脂稱為「聚醯胺酸樹脂」。(Polyamide resin solution (a)) The polyamide resin solution (a) is a solution obtained by dissolving a polyamide resin in a good solvent. Here, in this specification, the polyamide resin means at least one resin selected from the group consisting of polyamide resin, polyamide resin, and polyamide precursor resin. The polyamide resin is a resin containing repeating structural units containing an amido group, and the polyimide resin is a resin containing repeating structural units containing both an amido group and an imide group. In addition, the polyamide imide precursor resin is a polyamide imide resin that is imparted to the polyamide imide resin by the imidization precursor resin, and is also called a polyamide acid resin. In this specification, the aforementioned polyimide precursor resin is also referred to as "polyamide resin".

聚醯胺系樹脂溶液(a)例如可為使聚醯胺系樹脂之原料單體於溶劑(其中尤其是針對聚醯胺系樹脂之良溶劑)中聚合所獲得之反應溶液,可為使單離之聚醯胺系樹脂溶解於良溶劑中所獲得之溶液,亦可為於該等溶液中進而添加不良溶劑所獲得之溶液。基於容易有效率地實施聚醯胺系樹脂之合成至聚醯胺系樹脂粉體之製造之步驟之觀點,較佳為於下述良溶劑中進行單體之聚合反應,使用所獲得之反應溶液作為聚醯胺系樹脂溶液(a),或者於所獲得之反應溶液中添加不良溶劑,使用所獲得之溶液作為聚醯胺系樹脂溶液(a)。The polyamide resin solution (a) can be, for example, a reaction solution obtained by polymerizing the raw material monomers of the polyamide resin in a solvent (especially a good solvent for the polyamide resin). The solution obtained by dissolving the isolated polyamide resin in a good solvent may also be a solution obtained by adding a poor solvent to these solutions. From the viewpoint of easy and efficient implementation of the steps from the synthesis of the polyamide resin to the production of the polyamide resin powder, it is preferable to perform the polymerization reaction of the monomer in the following good solvent and use the obtained reaction solution As the polyamide-based resin solution (a), or adding a poor solvent to the obtained reaction solution, the obtained solution is used as the polyamide-based resin solution (a).

聚醯胺系樹脂溶液(a)中所包含之良溶劑係容易溶解聚醯胺系樹脂之溶劑,例如指於室溫(20~30℃)下對聚醯胺系樹脂之溶解度為1質量%以上之溶劑。聚醯胺系樹脂溶液中所包含之良溶劑可為1種溶劑,亦可為2種以上之溶劑之混合物。作為良溶劑,例如可例舉:丙酮、N,N-二甲基甲醯胺(有時記為DMF)、二甲基亞碸(有時記為DMSO)、γ-丁內酯(有時記為GBL)、N,N-二甲基乙醯胺(有時記為DMAc)等。再者,使用之溶劑是否為良溶劑可藉由下述方法確認。將聚醯胺系樹脂以成為1質量%之方式加入至溶劑中,視需要進行加熱、攪拌等,藉此使樹脂溶解於溶劑中,若室溫(20~30℃)狀態下之溶液變得均勻且透明,則該溶劑為良溶劑,若溶液未變得均勻且透明,則該溶劑為不良溶劑而非良溶劑。例如,於本實施例中,於容器中量取溶劑,進行攪拌,以成為1質量%之方式向其中加入聚醯胺系樹脂,於室溫(24℃)下進行3小時攪拌。結果可判斷,若不存在溶解殘留,溶液變得均勻且透明,則為良溶劑,若存在溶解殘留,則為不良溶劑而非良溶劑。The good solvent contained in the polyamide-based resin solution (a) is a solvent that easily dissolves the polyamide-based resin, for example, the solubility of the polyamide-based resin at room temperature (20-30°C) is 1% by mass The above solvent. The good solvent contained in the polyamide resin solution may be one solvent or a mixture of two or more solvents. As a good solvent, for example, acetone, N,N-dimethylformamide (sometimes referred to as DMF), dimethyl sulfide (sometimes referred to as DMSO), γ-butyrolactone (sometimes Denoted as GBL), N,N-dimethylacetamide (sometimes denoted as DMAc), etc. Furthermore, whether the solvent used is a good solvent can be confirmed by the following method. The polyamide-based resin is added to the solvent so that it becomes 1% by mass, heating, stirring, etc. as necessary, so that the resin is dissolved in the solvent, and the solution at room temperature (20-30°C) becomes If the solution is uniform and transparent, the solvent is a good solvent. If the solution does not become uniform and transparent, the solvent is a poor solvent and not a good solvent. For example, in this embodiment, the solvent is measured in a container and stirred, the polyamide resin is added to it so that it becomes 1% by mass, and stirring is performed at room temperature (24° C.) for 3 hours. As a result, it can be judged that if there is no dissolution residue and the solution becomes uniform and transparent, it is a good solvent, and if there is a dissolution residue, it is a poor solvent rather than a good solvent.

就容積效率之觀點而言,良溶劑對聚醯胺系樹脂之溶解度較佳為3質量%以上,更佳為5質量%以上。良溶劑對聚醯胺系樹脂之溶解度之上限並無特別限定,基於可減少不良溶劑之使用量之觀點,較佳為40質量%以下,更佳為25質量%以下。再者,於本說明書中,某種溶劑S對聚醯胺系樹脂之溶解度係於可溶於G質量份之溶劑S中之聚醯胺系樹脂之量為H質量份之情形時,根據溶解度(%)=G/(G+H)×100這一式算出的值。From the viewpoint of volumetric efficiency, the solubility of the good solvent to the polyamide resin is preferably 3% by mass or more, more preferably 5% by mass or more. The upper limit of the solubility of the good solvent to the polyamide resin is not particularly limited. From the viewpoint of reducing the amount of poor solvent used, it is preferably 40% by mass or less, and more preferably 25% by mass or less. Furthermore, in this specification, the solubility of a certain solvent S to the polyamide resin is based on the case where the amount of polyamide resin soluble in G parts by mass of solvent S is H parts by mass (%)=G/(G+H)×100 is the value calculated by the formula.

於聚醯胺系樹脂溶液(a)含有良溶劑且不含有不良溶劑之情形時,基於操作上容易調整為容易操作之黏度之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液(a)中之良溶劑之含量較佳為60質量%以上,更佳為75質量%以上。又,基於可減少不良溶劑之使用量之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液中之良溶劑之含量較佳為98質量%以下,更佳為95質量%以下。When the polyamide-based resin solution (a) contains a good solvent and does not contain a poor solvent, based on the viewpoint that the viscosity is easy to adjust to easy-to-handle, relative to the total amount of the polyamide-based resin solution, the polyamide The content of the good solvent in the resin solution (a) is preferably 60% by mass or more, more preferably 75% by mass or more. In addition, from the viewpoint of reducing the amount of poor solvent used, relative to the total amount of the polyamide resin solution, the content of the good solvent in the polyamide resin solution is preferably 98% by mass or less, more preferably 95% by mass %the following.

於聚醯胺系樹脂溶液(a)含有良溶劑且不含有不良溶劑之情形時,就容積效率之觀點而言,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂之含量較佳為1質量%以上,更佳為3質量%以上。又,基於操作上容易調整為容易操作之黏度之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液中之聚醯胺系樹脂之含量較佳為20質量%以下,更佳為10質量%以下。When the polyamide-based resin solution (a) contains a good solvent and does not contain a poor solvent, from the viewpoint of volumetric efficiency, the polyamide-based resin solution (a The content of the polyamide resin in) is preferably 1% by mass or more, more preferably 3% by mass or more. In addition, from the viewpoint of easy adjustment in operation to a viscosity that is easy to handle, relative to the total amount of the polyamide-based resin solution, the content of the polyamide-based resin in the polyamide-based resin solution is preferably 20% by mass or less, More preferably, it is 10% by mass or less.

於聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑之情形時,基於操作上容易調整為容易操作之黏度之觀點,相對於聚醯胺系樹脂溶液(a)之總量,聚醯胺系樹脂溶液(a)中之良溶劑之含量較佳為40質量%以上,更佳為50質量%以上,進而較佳為60質量%以上。又,基於可減少不良溶劑之使用量之觀點,相對於聚醯胺系樹脂溶液(a)之總量,聚醯胺系樹脂溶液(a)中之良溶劑之含量較佳為95質量%以下,更佳為90質量%以下。When the polyamide-based resin solution (a) further contains at least one poor solvent, based on the viewpoint that the viscosity is easy to adjust to the easy-to-handle viscosity, relative to the total amount of the polyamide-based resin solution (a), the polyamide resin solution (a) The content of the good solvent in the amide resin solution (a) is preferably 40% by mass or more, more preferably 50% by mass or more, and still more preferably 60% by mass or more. In addition, from the viewpoint of reducing the amount of poor solvent used, relative to the total amount of the polyamide resin solution (a), the content of the good solvent in the polyamide resin solution (a) is preferably 95% by mass or less , More preferably 90% by mass or less.

於聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑之情形時,就容積效率之觀點而言,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂之含量較佳為1質量%以上,更佳為2質量%以上。又,基於操作上容易調整為容易操作之黏度之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液中之聚醯胺系樹脂之含量較佳為20質量%以下,更佳為10質量%以下。When the polyamide-based resin solution (a) further contains at least one poor solvent, from the viewpoint of volumetric efficiency, the polyamide-based resin solution (a) is relative to the total amount of the polyamide-based resin solution The content of the polyamide resin is preferably 1% by mass or more, more preferably 2% by mass or more. In addition, from the viewpoint of easy adjustment in operation to a viscosity that is easy to handle, relative to the total amount of the polyamide-based resin solution, the content of the polyamide-based resin in the polyamide-based resin solution is preferably 20% by mass or less, More preferably, it is 10% by mass or less.

於聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑之情形時,不良溶劑可為1種溶劑,亦可為2種以上之溶劑之混合物。本說明書中之不良溶劑係不易使聚醯胺系樹脂溶解之溶劑,例如係指於室溫(20~30℃)下對聚醯胺系樹脂之溶解度未達1質量%之溶劑。作為不良溶劑,例如可例舉:甲醇、2-丙醇等醇系溶劑(例如碳數1~4之醇)、乙酸乙酯、四氫呋喃、甲苯、己烷、水。再者,對使用之溶劑是否為不良溶劑進行評價之方法如上所述。於該情形時,聚醯胺系樹脂溶液(a)可進而含有1種不良溶劑,亦可進而含有2種以上之不良溶劑之混合溶劑。When the polyamide resin solution (a) further contains at least one poor solvent, the poor solvent may be one solvent or a mixture of two or more solvents. The poor solvent in this specification is a solvent that is not easy to dissolve the polyamide resin, for example, refers to a solvent whose solubility to the polyamide resin does not reach 1% by mass at room temperature (20-30°C). Examples of poor solvents include alcohol-based solvents such as methanol and 2-propanol (for example, alcohols with 1 to 4 carbon atoms), ethyl acetate, tetrahydrofuran, toluene, hexane, and water. Furthermore, the method for evaluating whether the solvent used is a poor solvent is as described above. In this case, the polyamide-based resin solution (a) may further contain one kind of poor solvent, or may further contain a mixed solvent of two or more kinds of poor solvents.

聚醯胺系樹脂溶液(a)中所包含之不良溶劑較佳為包含碳數1~4之醇之不良溶劑。作為碳數1~4之醇,例如可例舉:甲醇、乙醇、2-丙醇、丁醇等。聚醯胺系樹脂溶液(a)中所包含之不良溶劑可為1種碳數1~4之醇,可為2種以上之碳數1~4之醇的混合物,亦可為1種或2種以上之碳數1~4之醇與其他不良溶劑的混合物。The poor solvent contained in the polyamide resin solution (a) is preferably a poor solvent containing an alcohol having 1 to 4 carbon atoms. As a C1-C4 alcohol, methanol, ethanol, 2-propanol, butanol, etc. are mentioned, for example. The poor solvent contained in the polyamide-based resin solution (a) can be one alcohol with 1 to 4 carbon atoms, a mixture of two or more alcohols with 1 to 4 carbon atoms, or one or two alcohols. A mixture of more than one kind of alcohols with 1 to 4 carbon atoms and other poor solvents.

於聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑之情形時,基於操作上容易調整為容易操作之黏度,且容易有效率地製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液(a)中之不良溶劑之含量較佳為5質量%以上,更佳為10質量%以上,進而較佳為15質量%以上。又,基於防止聚醯胺系樹脂溶液(a)中析出聚醯胺系樹脂,且提高生產效率之觀點,相對於聚醯胺系樹脂溶液之總量,聚醯胺系樹脂溶液(a)中之不良溶劑之含量較佳為40質量%以下,更佳為30質量%以下。When the polyamide-based resin solution (a) further contains at least one poor solvent, it is easy to adjust the viscosity to be easy to handle based on the operation, and it is easy to efficiently produce a smaller particle size and smaller difference in particle size From the viewpoint of the powder of polyamide-based resin, the content of the poor solvent in the polyamide-based resin solution (a) is preferably 5% by mass or more, more preferably 10% relative to the total amount of the polyamide-based resin solution. % By mass or more, more preferably 15% by mass or more. In addition, from the viewpoint of preventing the precipitation of polyamide-based resin in the polyamide-based resin solution (a) and improving production efficiency, relative to the total amount of the polyamide-based resin solution, the polyamide-based resin solution (a) The content of the poor solvent is preferably 40% by mass or less, more preferably 30% by mass or less.

於聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑之情形時,本發明之製造方法可進而包括使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸而獲得上述聚醯胺系樹脂溶液(a)之步驟,上述聚醯胺系樹脂溶液(a0 )係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b0 )包含針對上述聚醯胺系樹脂之至少1種不良溶劑。於將獲得聚醯胺系樹脂溶液(a)之步驟中使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸時之供給界面區域之面積設為P m2 ,將聚醯胺系樹脂溶液(a0 )或不良溶劑液(b0 )之添加速度設為Q kg/分鐘時,根據式(C)算出之添加通量並無特別限定,基於容易提高生產效率之觀點,較佳為超過400。 添加通量((kg/分鐘)/m2 )=Q/P  式(C)When the polyamide-based resin solution (a) further contains at least one poor solvent, the production method of the present invention may further include contacting the polyamide-based resin solution (a 0 ) with the poor solvent solution (b 0 ) and The step of obtaining the polyamide resin solution (a), wherein the polyamide resin solution (a 0 ) is obtained by dissolving a polyamide resin in a good solvent for the polyamide resin, and the disadvantages are The solvent liquid (b 0 ) contains at least one poor solvent for the polyamide resin. Obtained in the step polyamide resin solution (a) of the manipulation polyamide resin solution (a 0) and the poor solvent solution (b 0) is supplied when the area of the interface area of the contact to P m 2, poly When the addition rate of the amide resin solution (a 0 ) or the poor solvent solution (b 0 ) is set to Q kg/min, the addition flux calculated according to formula (C) is not particularly limited, based on the viewpoint that it is easy to improve production efficiency , Preferably more than 400. Adding flux ((kg/min)/m 2 )=Q/P formula (C)

基於於後續之與不良溶劑液(b)之接觸步驟等中,容易有效率地製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體之觀點,基於聚醯胺系樹脂溶液(a)中所包含之聚醯胺系樹脂之總量,聚醯胺系樹脂溶液(a)中所包含之析出之聚醯胺系樹脂之量較佳為10質量%以下,更佳為5質量%以下,進而較佳為3質量%以下,進而更佳為1質量%以下,尤佳為0質量%。再者,聚醯胺系樹脂溶液(a)中所包含之析出之聚醯胺系樹脂之量係藉由對聚醯胺系樹脂溶液(a)進行過濾等而進行固液分離,測定所獲得之固形物之質量而獲得。又,聚醯胺系樹脂溶液(a)中所包含之析出之聚醯胺系樹脂之量可為於進行與不良溶劑液(b)之接觸步驟之溫度下測得的量。聚醯胺系樹脂溶液(a)中所包含之析出之聚醯胺系樹脂之量為0質量%表示於聚醯胺系樹脂溶液(a)中未析出聚醯胺系樹脂。Based on the point of view that in the subsequent contact step with the poor solvent liquid (b), etc., it is easy to efficiently produce polyamide-based resin powders with smaller particle diameters and smaller differences in particle diameters. The total amount of polyamide resin contained in the resin solution (a), and the amount of precipitated polyamide resin contained in the polyamide resin solution (a) is preferably 10% by mass or less, more preferably It is 5% by mass or less, more preferably 3% by mass or less, still more preferably 1% by mass or less, and particularly preferably 0% by mass. In addition, the amount of precipitated polyamide resin contained in the polyamide resin solution (a) is obtained by performing solid-liquid separation by filtering the polyamide resin solution (a), etc., and measuring The quality of the solid object. In addition, the amount of the precipitated polyamide-based resin contained in the polyamide-based resin solution (a) may be the amount measured at the temperature at which the step of contacting with the poor solvent solution (b) is performed. The amount of the precipitated polyamide-based resin contained in the polyamide-based resin solution (a) being 0% by mass means that the polyamide-based resin is not deposited in the polyamide-based resin solution (a).

基於經過使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之下述接觸步驟,容易製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體之觀點,尤其重要的是,以聚醯胺系樹脂之粉體開始析出之時間作為基準,調整該時間前後及該時間以後之添加通量。因此,較佳為於與不良溶劑液(b)接觸前之聚醯胺系樹脂溶液(a)中不會析出聚醯胺系樹脂。又,就相同之觀點而言,於聚醯胺系樹脂溶液(a)不含有不良溶劑或含有不良溶劑之情形時,較佳為相對於接觸步驟後獲得之混合物(固液分離步驟前之混合物)中所包含之不良溶劑之量,聚醯胺系樹脂溶液(a)中所包含之不良溶劑之量較佳為60質量%以下,更佳為50質量%以下,進而較佳為45質量%以下。Based on the following contact steps of contacting the polyamide resin solution (a) with the poor solvent solution (b), it is easy to produce polyamide resin powder with a smaller particle size and smaller difference in particle size It is especially important to adjust the addition flux before and after this time based on the time when the powder of the polyamide-based resin starts to precipitate. Therefore, it is preferable that the polyamide-based resin does not precipitate in the polyamide-based resin solution (a) before contact with the poor solvent solution (b). In addition, from the same viewpoint, when the polyamide resin solution (a) does not contain a poor solvent or contains a poor solvent, it is preferably relative to the mixture obtained after the contact step (the mixture before the solid-liquid separation step) The amount of poor solvent contained in ), the amount of poor solvent contained in the polyamide resin solution (a) is preferably 60% by mass or less, more preferably 50% by mass or less, and still more preferably 45% by mass the following.

聚醯胺系樹脂溶液(a)之黏度視聚醯胺系樹脂溶液(a)之聚醯胺系樹脂含量、聚醯胺系樹脂之分子量等而定,基於容易提高生產效率之觀點,較佳為0.5 Pa・s以上,更佳為0.6 Pa・s以上,進而較佳為0.7 Pa・s以上,基於容易操作,又,容易製造粒徑較小且粒徑之差異較小之聚醯胺系樹脂之粉體之觀點,較佳為100 Pa・s以下,更佳為50 Pa・s以下,進而較佳為10 Pa・s以下。黏度之測定可使用黏度計進行,例如可藉由實施例所記載之測定條件進行測定。The viscosity of the polyamide-based resin solution (a) depends on the content of the polyamide-based resin in the polyamide-based resin solution (a), the molecular weight of the polyamide-based resin, etc., based on the viewpoint that the production efficiency can be easily improved, preferably It is 0.5 Pa·s or more, more preferably 0.6 Pa·s or more, and even more preferably 0.7 Pa·s or more, because it is easy to handle, and it is easy to produce a polyamide series with smaller particle size and smaller difference in particle size. From the viewpoint of the resin powder, it is preferably 100 Pa·s or less, more preferably 50 Pa·s or less, and still more preferably 10 Pa·s or less. The viscosity can be measured using a viscometer, for example, it can be measured under the measurement conditions described in the examples.

(不良溶劑液(b)) 於本發明之製造方法中所包含之接觸步驟中,使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸。不良溶劑液(b)係包含至少1種不良溶劑之溶劑,可為1種不良溶劑,可為2種以上之不良溶劑之混合溶劑,亦可為包含1種以上之不良溶劑及良溶劑之混合溶劑,只要作為不良溶劑液(b)之混合溶劑對聚醯胺系樹脂表現出不良溶劑性即可。作為不良溶劑,例如可例舉:甲醇、2-丙醇等醇系溶劑(例如碳數1~4之醇)、乙酸乙酯、四氫呋喃、甲苯、己烷、水。再者,對使用之溶劑是否為不良溶劑進行評價之方法如上所述。(Poor solvent liquid (b)) In the contact step included in the production method of the present invention, the polyamide resin solution (a) is brought into contact with the poor solvent solution (b). Poor solvent solution (b) is a solvent containing at least one poor solvent, which can be one poor solvent, a mixed solvent of two or more poor solvents, or a mixed solvent containing more than one poor solvent and a good solvent The solvent should just show poor solvent properties to the polyamide resin as a mixed solvent of the poor solvent liquid (b). Examples of poor solvents include alcohol-based solvents such as methanol and 2-propanol (for example, alcohols with 1 to 4 carbon atoms), ethyl acetate, tetrahydrofuran, toluene, hexane, and water. Furthermore, the method for evaluating whether the solvent used is a poor solvent is as described above.

與聚醯胺系樹脂溶液(a)接觸之不良溶劑液(b)較佳為包含水之溶劑,更佳為包含70質量%以上之水之溶劑。於不良溶劑液(b)包含水之情形時,基於容易去除視情形可包含於析出之聚醯胺系樹脂中之良溶劑或醇之觀點,基於不良溶劑液(b)之總量,其比率較佳為30質量%以上,更佳為40質量%以上,進而較佳為50質量%以上,進而更佳為60質量%以上,尤佳為70質量%以上,尤其更佳為75質量%以上,尤其進而較佳為80質量%以上,尤佳為85質量%以上,尤其更佳為90質量%以上。又,相對於不良溶劑(b)之總質量,不良溶劑(b)中所包含之醇之含量較佳為20質量%以下,更佳為10質量%以下,進而較佳為5質量%以下,進而更佳為3質量%以下。The poor solvent liquid (b) in contact with the polyamide resin solution (a) is preferably a solvent containing water, more preferably a solvent containing 70% by mass or more of water. When the poor solvent solution (b) contains water, the ratio is based on the total amount of the poor solvent solution (b) based on the viewpoint that it is easy to remove the good solvent or alcohol that may be contained in the precipitated polyamide resin It is preferably 30% by mass or more, more preferably 40% by mass or more, still more preferably 50% by mass or more, still more preferably 60% by mass or more, particularly preferably 70% by mass or more, especially more preferably 75% by mass or more In particular, it is more preferably 80% by mass or more, particularly preferably 85% by mass or more, and even more preferably 90% by mass or more. In addition, relative to the total mass of the poor solvent (b), the content of the alcohol contained in the poor solvent (b) is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 5% by mass or less, More preferably, it is 3% by mass or less.

(接觸步驟) 本發明之製造方法至少包括使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟,且該接觸步驟中之添加通量為400以下。於本發明之製造方法中,使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟可為1個階段之接觸步驟,亦可為2個階段以上之接觸步驟。此處,接觸步驟為2階段以上意指攪拌速度、添加速度、所用不良溶劑之種類等互不相同之階段為2個以上。(Contact step) The production method of the present invention includes at least a contact step of bringing the polyamide resin solution (a) into contact with the poor solvent solution (b), and the flux of addition in the contact step is 400 or less. In the production method of the present invention, the contact step of bringing the polyamide resin solution (a) into contact with the poor solvent solution (b) may be a one-step contact step or a two-step or more contact step. Here, that the contact step has two or more stages means that there are two or more stages in which the stirring speed, the addition speed, the type of poor solvent used, and the like are different from each other.

於使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟為2個階段以上之情形時,只要至少包括使添加通量為400以下之聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟即可。When the contact step of bringing the polyamide resin solution (a) and the poor solvent solution (b) into contact is two or more stages, as long as it includes at least the polyamide resin solution (a ) The step of contacting with the poor solvent solution (b) is sufficient.

作為使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之方法,並無特別限定,只要該等接觸即可,例如可例舉:於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)之方法、或於不良溶劑液(b)中添加聚醯胺系樹脂溶液(a)之方法。基於容易獲得粒徑較小且粒徑之差異較小之粉體之觀點,較佳為藉由於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)而使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸。又,基於容易調整添加速度之觀點,更佳為藉由滴加而進行添加。藉由上述接觸,析出聚醯胺系樹脂,獲得包含析出之聚醯胺系樹脂之混合物。再者,只要於包含析出之聚醯胺系樹脂之混合物中,析出溶解於聚醯胺系樹脂溶液中之聚醯胺系樹脂之至少一部分聚醯胺系樹脂即可。The method of contacting the polyamide resin solution (a) with the poor solvent solution (b) is not particularly limited, as long as the contact is carried out. For example, in the polyamide resin solution (a) The method of adding the poor solvent solution (b) or the method of adding the polyamide resin solution (a) to the poor solvent solution (b). From the viewpoint that it is easy to obtain a powder with a smaller particle size and a smaller difference in particle size, it is preferable to make the polyamide-based resin solution by adding a poor solvent solution (b) to the polyamide-based resin solution (a) (a) Contact with poor solvent liquid (b). In addition, from the viewpoint of easy adjustment of the addition speed, it is more preferable to add by dripping. Through the aforementioned contact, the polyamide resin is precipitated, and a mixture containing the precipitated polyamide resin is obtained. Furthermore, it is only necessary to precipitate at least a part of the polyamide-based resin of the polyamide-based resin dissolved in the polyamide-based resin solution in the mixture containing the precipitated polyamide-based resin.

關於上述接觸步驟中之添加通量,於將上述接觸步驟中之供給界面區域之面積設為X m2 ,將聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加速度設為Y kg/分鐘時,根據式(A)算出: 添加通量((kg/分鐘)/m2 )=Y/X 式(A) 於本發明之製造方法中所包含之接觸步驟中,上述添加通量為400以下。Regarding the addition flux in the above contact step, the area of the supply interface region in the above contact step is set to X m 2 , and the addition rate of the polyamide resin solution (a) or poor solvent solution (b) is set to When Y kg/min, calculate according to formula (A): Add flux ((kg/min)/m 2 )=Y/X formula (A) In the contact step included in the manufacturing method of the present invention, the above-mentioned addition The flux is below 400.

接觸步驟中之供給界面區域之面積(X m2 )係藉由對不良溶劑液(b)供給聚醯胺系樹脂溶液(a)或者對聚醯胺系樹脂溶液(a)供給不良溶劑液(b),而於該等各接觸步驟中最初產生接觸的界面區域之面積。聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加(供給)較佳為使用選自由噴霧器、滴液噴嘴、噴水器及噴嘴分散板所組成之群中之1種以上而進行。例如,於藉由對聚醯胺系樹脂溶液(a)供給不良溶劑液(b)而進行上述接觸步驟之情形時,對於不良溶劑液(b),例如可自一支或複數支噴嘴供給,可使用具有複數個分支之噴嘴供給,可使用一個或複數個噴水器、噴霧器供給,亦可藉由於噴嘴前端安裝分散板之方法進行供給。例如可使用池內股份有限公司製造之實心圓錐形噴嘴JJXP、多頭噴嘴7JJXP、廣角實心圓錐形噴嘴BBXP、山形扇形噴嘴VP、偏心均等扇形噴嘴INOVVE、MISUMI股份有限公司製造之扇形噴嘴NZRVF等作為噴霧器,供給不良溶劑(b)。例如可使用SANEI股份有限公司製造之噴淋頭S1040F1或旋轉噴淋頭S1040F5等作為噴水器,供給不良溶劑(b)。於藉由對不良溶劑液(b)供給聚醯胺系樹脂溶液(a)而進行上述接觸步驟之情形時,自上述噴嘴等供給聚醯胺系樹脂溶液(a)。 The area (X m 2 ) of the supply interface area in the contact step is obtained by supplying the polyamide resin solution (a) to the poor solvent solution (b) or supplying the poor solvent solution (a) to the polyamide resin solution (a). b), and the area of the interface area where contact is first generated in each of these contact steps. The addition (supply) of the polyamide resin solution (a) or the poor solvent solution (b) is preferably carried out using one or more selected from the group consisting of sprayers, drip nozzles, water jets, and nozzle dispersion plates. . For example, when the above-mentioned contacting step is performed by supplying the poor solvent solution (b) to the polyamide resin solution (a), the poor solvent solution (b) can be supplied from one or more nozzles, for example, It can be supplied by nozzles with multiple branches, can be supplied by one or more water jets and sprayers, or can be supplied by the method of installing a dispersion plate at the tip of the nozzle. For example, the solid cone nozzle JJXP manufactured by Ikeuchi Co., Ltd., the multi-head nozzle 7JJXP, the wide-angle solid cone nozzle BBXP, the mountain fan nozzle VP, the eccentric equal fan nozzle INOVVE, and the fan nozzle NZRVF manufactured by MISUMI Co., Ltd. can be used as sprayers. , Supply poor solvent (b). For example, the shower head S1040F1 or rotary shower head S1040F5 manufactured by SANEI Co., Ltd. can be used as a water sprayer to supply the poor solvent (b). In the case of performing the contact step by supplying the polyamide-based resin solution (a) to the poor solvent solution (b), the polyamide-based resin solution (a) is supplied from the nozzle or the like.

例如,於使用具有1個噴出口之1支噴嘴進行供給之情形時,將該噴出口之內徑截面積設為供給界面區域之面積。於使用具有2個以上之噴出口之1支噴嘴進行供給之情形時,將設置於噴嘴之所有噴出口之內徑截面積之合計設為供給界面區域之面積。於使用2支以上具有1個或2個以上之噴出口之噴嘴進行供給之情形時,以與使用1支噴嘴之情形相同之方式算出各噴嘴之供給界面區域,將該等之合計設為供給界面區域之面積。於使用噴水器之情形時,亦將設置於1個或2個以上之噴水器之所有噴出口之內徑截面積之合計設為供給界面區域之面積。於使用噴霧器之情形時,噴霧器具有自噴出口向較廣區域噴灑之功能,故而將供給液之噴灑面積設為供給界面區域之面積。換言之,於使用1個或2個以上之滴液噴嘴及/或噴水器進行供給之情形時,將設置於該滴液噴嘴及/或噴水器之所有噴出口之內徑截面積之合計設為供給界面區域之面積,於使用噴霧器進行供給之情形時,將自該噴霧器噴出之噴出液噴灑至供給界面之噴灑面積設為供給界面區域之面積。於使用噴嘴分散板之情形時,將自該噴嘴分散板噴出之噴灑面積設為供給界面區域之面積。此處,例如於使用2支以上之噴嘴進行供給之情形時,於各噴嘴之供給界面區域之一部分或全部區域重疊之情形時,將自各供給界面區域之面積之合計除去該重疊區域之面積所得的面積設為供給界面區域之面積。於使用2個以上之噴水器、噴霧器等之情形時,當存在重疊區域時,亦以相同方式算出供給界面區域之面積。For example, in the case of supplying using one nozzle with one ejection port, the cross-sectional area of the inner diameter of the ejection port shall be the area of the supply interface area. When using one nozzle with two or more ejection ports for supply, the total internal diameter cross-sectional area of all ejection ports provided in the nozzle is set as the area of the supply interface area. When using two or more nozzles with one or two or more nozzles for supply, calculate the supply interface area of each nozzle in the same way as when using one nozzle, and set the total of these as supply The area of the interface area. In the case of using sprinklers, the total cross-sectional area of the inner diameters of all spouting outlets of one or more sprinklers is also set as the area of the supply interface area. In the case of using a sprayer, the sprayer has the function of spraying from the spray outlet to a wider area, so the spraying area of the supply liquid is set as the area of the supply interface area. In other words, when one or more liquid drop nozzles and/or water jets are used for supply, the sum of the cross-sectional areas of the inner diameters of all the nozzles provided in the liquid drop nozzles and/or water jets is set as The area of the supply interface area, when a sprayer is used for supply, the spray area of the spray liquid sprayed from the sprayer to the supply interface is set as the area of the supply interface area. In the case of using a nozzle dispersion plate, the spray area sprayed from the nozzle dispersion plate is set as the area of the supply interface area. Here, for example, when two or more nozzles are used for supply, when part or all of the supply interface area of each nozzle overlaps, the total area of each supply interface area is divided by the area of the overlapped area. The area of is set as the area of the supply interface area. In the case of using more than two sprinklers, sprayers, etc., when there is an overlapping area, the area of the supply interface area is also calculated in the same way.

於使用噴霧嘴之情形時,基於容易獲得粒徑較小且粒徑之差異較小之粉體之觀點,較佳為於供給界面區域與釜截面積之比(供給界面區域/釜截面積)之下限值成為較佳為0.1以上、更佳為0.2以上、進而較佳為0.25以上之條件下進行供給。藉此,容易抑制粒子急遽析出或粗大化。上述比之上限值並無特別限定,基於容易操作之觀點,較佳為0.9以下,更佳為0.7以下,進而較佳為0.5以下,進而較佳為0.45以下。When using a spray nozzle, based on the viewpoint that it is easy to obtain a powder with a smaller particle size and a smaller difference in particle size, the ratio of the supply interface area to the cross-sectional area of the tank (supply interface area/cross-sectional area of the tank) is preferred. The lower limit is preferably 0.1 or more, more preferably 0.2 or more, and still more preferably 0.25 or more. This makes it easy to suppress rapid precipitation or coarsening of particles. The upper limit of the ratio is not particularly limited, but from the viewpoint of ease of handling, it is preferably 0.9 or less, more preferably 0.7 or less, still more preferably 0.5 or less, and still more preferably 0.45 or less.

關於添加速度Y(kg/分鐘),例如,於藉由將不良溶劑液(b)添加至聚醯胺系樹脂溶液(a)中而進行接觸步驟之情形時,可藉由將該接觸步驟中所添加之不良溶劑液(b)之量除以不良溶劑液(b)之添加所需之時間而算出。於藉由將聚醯胺系樹脂溶液(a)添加至不良溶劑液(b)中而進行接觸步驟之情形時,可藉由將該接觸步驟中所添加之聚醯胺系樹脂溶液(a)之量除以聚醯胺系樹脂溶液(a)之添加所需之時間而算出。於接觸步驟包括添加速度不同之2個以上之步驟之情形時,只要於至少1個步驟中添加通量為400以下即可,較佳為基於各步驟中所添加之不良溶劑之量,進行加權平均而算出加權平均添加速度Y,使用上述加權平均添加速度Y算出之添加通量為400以下。Regarding the addition rate Y (kg/min), for example, in the case of performing the contact step by adding the poor solvent solution (b) to the polyamide resin solution (a), the contact step can be It is calculated by dividing the amount of the added poor solvent solution (b) by the time required for the addition of the poor solvent solution (b). When the contact step is performed by adding the polyamide resin solution (a) to the poor solvent solution (b), the polyamide resin solution (a) added in the contact step can be used The amount is calculated by dividing the time required for the addition of the polyamide resin solution (a). When the contact step includes two or more steps with different addition speeds, the flux should be 400 or less in at least one step, and it is preferably weighted based on the amount of poor solvent added in each step The weighted average addition rate Y is calculated by averaging, and the addition flux calculated using the above-mentioned weighted average addition rate Y is 400 or less.

於根據上述式算出之添加通量(Y/X)超過400之情形時,容易產生不良溶劑之濃度局部較高之部分。又,不良溶劑之濃度容易急遽產生變化。若不良溶劑之濃度局部過高,則局部急遽析出聚醯胺系樹脂粉體,聚醯胺系樹脂粉體與雜質一起析出,或者固體化之聚醯胺系樹脂包含溶劑,因此難以獲得微細之粉體。因不良溶劑之濃度急遽變高,亦會導致難以獲得微細之粉體。進而,結果,亦容易產生粒徑之差異。若根據上述式算出之添加通量(Y/X)為400以下,則可獲得粒徑較小且粒徑之差異較小之粉體。基於容易獲得此種粉體之觀點,添加通量較佳為400以下,更佳為300以下,進而較佳為100以下,進而更佳為80以下。添加通量(Y/X)之下限並無特別限定,基於容易提高生產效率之觀點,較佳為0.1以上,更佳為0.5以上,進而較佳為1.0以上。When the addition flux (Y/X) calculated according to the above formula exceeds 400, the concentration of the poor solvent is likely to be locally higher. In addition, the concentration of the poor solvent tends to change rapidly. If the concentration of the poor solvent is locally too high, the polyamide resin powder will be precipitated locally, and the polyamide resin powder will precipitate together with impurities, or the solidified polyamide resin contains a solvent, so it is difficult to obtain fine particles. Powder. Due to the rapid increase in the concentration of poor solvents, it is also difficult to obtain fine powders. Furthermore, as a result, the difference in particle size is also likely to occur. If the addition flux (Y/X) calculated according to the above formula is 400 or less, a powder with a smaller particle size and a smaller difference in particle size can be obtained. From the viewpoint of easy availability of such powders, the addition flux is preferably 400 or less, more preferably 300 or less, still more preferably 100 or less, and still more preferably 80 or less. The lower limit of the addition flux (Y/X) is not particularly limited. From the viewpoint of easy improvement of production efficiency, it is preferably 0.1 or more, more preferably 0.5 or more, and still more preferably 1.0 or more.

添加可連續進行,亦可間歇進行。於間歇進行添加之情形時,可使用進行添加之步驟之添加速度算出添加通量。The addition can be carried out continuously or intermittently. In the case of intermittent addition, the addition flux can be calculated using the addition speed of the addition step.

上述添加通量可藉由調整使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟中之添加速度(Y kg/分鐘)及供給界面區域之面積(X m2 ),而調整為上述所需之範圍。如上所述,添加速度係藉由將接觸步驟中所添加之不良溶劑液(b)之量除以添加所需之時間而算出,從而可藉由調整添加量及添加時間進行調整。供給界面區域之面積(X m2 )可藉由如下方法調整:調整所使用之噴嘴之內徑截面積及支數之方法;於使用噴霧嘴之情形時,除該等以外,亦調整噴霧嘴距供給界面之高度或噴出壓力之方法等。The above-mentioned addition flux can be adjusted by adjusting the addition rate (Y kg/min) and the area of the supply interface area (X m 2 ) in the contact step of the polyamide resin solution (a) and the poor solvent solution (b). , And adjust to the above required range. As described above, the addition rate is calculated by dividing the amount of the poor solvent solution (b) added in the contact step by the time required for the addition, and can be adjusted by adjusting the addition amount and the addition time. The area of the supply interface area (X m 2 ) can be adjusted by the following methods: the method of adjusting the inner diameter cross-sectional area and the number of nozzles used; in the case of using spray nozzles, in addition to these, the spray nozzles are also adjusted The height from the supply interface or the method of ejection pressure, etc.

於接觸步驟包括添加通量互不相同之2個以上之步驟之情形時,只要於至少1個步驟中添加通量(Y/X)為400以下即可,較佳為根據各步驟之添加通量,基於各步驟中所添加之不良溶劑之量進行加權平均而算出平均添加通量,上述平均添加通量為400以下。對於該情形時之平均添加通量,上述與添加通量相關之較佳記載及較佳數值範圍亦同樣適用。When the contact step includes two or more steps with different fluxes, the flux (Y/X) should be 400 or less in at least one step. The amount is calculated based on the weighted average of the amount of poor solvent added in each step to calculate the average addition flux. The above average addition flux is 400 or less. For the average added flux in this case, the above-mentioned preferred descriptions and preferred numerical ranges related to the added flux also apply.

於接觸步驟中,通常,於將不良溶劑液(b)添加至聚醯胺系樹脂溶液(a)中之情形時,一面攪拌聚醯胺系樹脂溶液(a)一面進行接觸步驟,於將聚醯胺系樹脂溶液(a)添加至不良溶劑液(b)中之情形時,一面攪拌不良溶劑液(b)一面進行接觸步驟。此處,於將不良溶劑液(b)添加至聚醯胺系樹脂溶液(a)中之情形時,將聚醯胺系樹脂溶液(a)之攪拌功率設為Z kW/m3 ,於將聚醯胺系樹脂溶液(a)添加至不良溶劑液(b)中之情形時,將不良溶劑液(b)之攪拌功率設為Z kW/m3 ,根據式(B)算出之上述添加通量相對於攪拌功率之比率R較佳為300以下,更佳為150以下,進而較佳為100以下,進而更佳為50以下: 比率R=(Y/X)/Z 式(B) 又,比率R較佳為1以上,更佳為2以上,進而較佳為3以上。若比率R為上述上限以下,則粒徑之差異變小,若為下限以上,則容易提高生產效率。In the contact step, generally, when the poor solvent solution (b) is added to the polyamide resin solution (a), the contact step is performed while stirring the polyamide resin solution (a), and the polyamide resin solution (a) is stirred while performing the contact step. When the amide resin solution (a) is added to the poor solvent solution (b), the contact step is performed while stirring the poor solvent solution (b). Here, when the poor solvent solution (b) is added to the polyamide-based resin solution (a), the stirring power of the polyamide-based resin solution (a) is set to Z kW/m 3 , and then When the polyamide resin solution (a) is added to the poor solvent solution (b), the stirring power of the poor solvent solution (b) is set to Z kW/m 3 , and the above addition rate calculated according to the formula (B) The ratio R of the amount to the stirring power is preferably 300 or less, more preferably 150 or less, still more preferably 100 or less, and even more preferably 50 or less: Ratio R=(Y/X)/Z Formula (B) In addition, The ratio R is preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. If the ratio R is less than the above upper limit, the difference in particle size becomes small, and if it is more than the lower limit, it is easy to improve production efficiency.

攪拌功率(Z[kW/m3 ])根據式(D)算出: Z=Np×ρ×(n/60)3 ×d5 /V/1000   式(D) (式(D)中,Np表示功率數,ρ表示液體密度[kg/m3 ],n表示攪拌轉速[rpm],d表示攪拌葉之葉片直徑[m],V表示液體之體積[m3 ]) 功率數Np可根據以往之文獻式或製造商目錄所記載之功率數Np與雷諾數Re之關係求出,雷諾數Re根據式(E)算出。 Re=ρ×n/60×d2 /μ    式(E) (式(E)中,μ表示液體黏度[Pa・s],ρ表示液體密度[kg/m3 ],n表示攪拌轉速[rpm],d表示攪拌葉之葉片直徑[m]) 例如,於本實施例中,使用3片後掠葉片,根據神鋼環境舒立淨股份有限公司之目錄「Glasslined Reactor」(No.114E, Printed in Japan Mar. 2018)8頁所記載之Np-Re線圖((3) Oval Section Three-blades retreat impeller with beaver-tail baffle,參照https://www.kobelco-eco.co.jp/product/process/punf_pdf/p_glasslinedreactor.pdf),求出功率數Np。The stirring power (Z[kW/m 3 ]) is calculated according to the formula (D): Z=Np×ρ×(n/60) 3 ×d 5 /V/1000 formula (D) (in formula (D), Np represents Power number, ρ represents the density of the liquid [kg/m 3 ], n represents the stirring speed [rpm], d represents the blade diameter of the stirring blade [m], V represents the volume of the liquid [m 3 ]) The power number Np can be based on the previous The relationship between the power number Np and the Reynolds number Re described in the literature formula or the manufacturer's catalog is calculated, and the Reynolds number Re is calculated according to the formula (E). Re=ρ×n/60×d 2 /μ Formula (E) (In formula (E), μ represents liquid viscosity [Pa·s], ρ represents liquid density [kg/m 3 ], n represents stirring speed [rpm ], d represents the blade diameter of the stirring blade [m]) For example, in this embodiment, three swept blades are used, according to the catalog of Kobelco Environmental Shulijing Co., Ltd. "Glasslined Reactor" (No.114E, Printed in Japan Mar .2018) Np-Re line diagram described on page 8 ((3) Oval Section Three-blades retreat impeller with beaver-tail baffle, refer to https://www.kobelco-eco.co.jp/product/process/punf_pdf /p_glasslinedreactor.pdf), find the power number Np.

作為調整攪拌功率而調整比率R之方法,可例舉調整攪拌轉速之方法或變更液體之體積之方法。As a method of adjusting the stirring power to adjust the ratio R, a method of adjusting the stirring speed or a method of changing the volume of the liquid can be exemplified.

上述接觸步驟較佳為至少包括比率R互不相同之第1接觸步驟及第2接觸步驟。又,於該情形時,較佳為第1接觸步驟中之比率R1 小於第2接觸步驟中之比率R2 。進而,於該情形時,基於使粒徑之差異較小之觀點,第1接觸步驟中之比率R1 較佳為150以下,更佳為100以下,進而較佳為50以下,且較佳為1以上,更佳為2以上,進而較佳為3以上。又,基於容易提高生產效率之觀點,第2接觸步驟中之比率R2 較佳為300以下,更佳為150以下,進而較佳為100以下,且較佳為2以上,更佳為3以上,進而較佳為5以上。The aforementioned contact step preferably includes at least a first contact step and a second contact step in which the ratio R is different from each other. Furthermore, in this case, it is preferable that the ratio R 1 in the first contact step is smaller than the ratio R 2 in the second contact step. Furthermore, in this case, from the viewpoint of making the difference in particle size smaller, the ratio R 1 in the first contact step is preferably 150 or less, more preferably 100 or less, still more preferably 50 or less, and more preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. In addition, from the viewpoint of easy improvement of production efficiency, the ratio R 2 in the second contact step is preferably 300 or less, more preferably 150 or less, still more preferably 100 or less, and preferably 2 or more, more preferably 3 or more , And more preferably 5 or more.

(固液分離步驟) 經過上述接觸步驟,獲得至少包含析出之聚醯胺系樹脂、良溶劑及不良溶劑之混合物。藉由對該混合物進行固液分離,而獲得聚醯胺系樹脂粉體。再者,若對經過接觸步驟所獲得之混合物進行固液分離,則可獲得包含該混合物中所包含之析出之聚醯胺系樹脂及該混合物中所包含之一部分溶劑的聚醯胺系樹脂組合物。該聚醯胺系樹脂組合物係亦被稱為濕濾餅之組合物,係用以獲得聚醯胺系樹脂粉體之中間物。(Solid-liquid separation step) After the above-mentioned contact step, a mixture containing at least the precipitated polyamide resin, a good solvent and a poor solvent is obtained. By subjecting the mixture to solid-liquid separation, a polyamide-based resin powder is obtained. Furthermore, if the mixture obtained through the contacting step is subjected to solid-liquid separation, a polyamide-based resin combination containing the precipitated polyamide resin contained in the mixture and a part of the solvent contained in the mixture can be obtained Things. The polyamide-based resin composition is also called a wet cake composition, and is used to obtain an intermediate of polyamide-based resin powder.

固液分離方法並無特別限定,例如可例舉一般被稱為過濾之方法,具體而言,可例舉:經由析出物及溶劑之透過性不同之過濾器,藉由重力進行分離之方法;藉由離心力進行分離之方法;藉由壓力差進行分離之方法。作為可使用之過濾器之例,可例舉:離心過濾器、Druck過濾器、抽氣過濾器、減壓過濾器等。The solid-liquid separation method is not particularly limited. For example, a method generally referred to as filtration can be mentioned. Specifically, it can be exemplified: a method of separation by gravity through filters with different permeability of precipitates and solvents; The method of separation by centrifugal force; the method of separation by pressure difference. Examples of filters that can be used include centrifugal filters, Druck filters, suction filters, and pressure reduction filters.

(乾燥步驟) 本發明之製造方法可進而包括使聚醯胺系樹脂組合物乾燥而獲得聚醯胺系樹脂粉體之乾燥步驟。乾燥條件並無特別限定,只要可去除聚醯胺系樹脂組合物中之溶劑即可,例如可為於減壓或大氣壓條件下,於約50~250℃左右之溫度下加熱1~48小時左右等條件。基於容易提高生產效率之觀點,可於較佳為100℃以上、更佳為150℃以上之溫度下,加熱較佳為0.5~10小時、更佳為1~5小時,進行乾燥。(Drying step) The production method of the present invention may further include a drying step of drying the polyamide-based resin composition to obtain polyamide-based resin powder. The drying conditions are not particularly limited, as long as the solvent in the polyamide resin composition can be removed. For example, it can be heated at a temperature of about 50 to 250°C for about 1 to 48 hours under reduced pressure or atmospheric pressure. And other conditions. From the viewpoint of easy improvement of production efficiency, drying may be performed by heating at a temperature of preferably 100°C or higher, more preferably 150°C or higher, preferably 0.5-10 hours, more preferably 1-5 hours.

<聚醯胺系樹脂粉體> 藉由本發明之製造方法所製造之聚醯胺系樹脂粉體較佳為於基於L* a* b* 表色系統之色差測定(依據JIS Z 8781-4:2013)中,滿足L* ≧90、-10≦a* ≦10及-10≦b* ≦10。基於容易提高最終獲得之高分子材料之透明性、視認性之觀點,上述色差測定中之L* 較佳為90以上,更佳為93以上,進而較佳為95以上。L* 之上限並無特別限定,只要為100以下即可。上述色差測定中之a* 表示紅色度之指標,基於容易提高最終獲得之高分子材料之視認性之觀點,較佳為-10以上10以下,更佳為-7以上7以下,進而較佳為-5以上5以下。上述色差測定中之b* 表示藍色度之指標,基於容易提高最終獲得之高分子材料之視認性之觀點,較佳為-10以上10以下,更佳為-5以上10以下,進而較佳為-3以上7以下。上述色差可使用色差計進行測定。根據本發明之製造方法,可抑制聚醯胺系樹脂粉體析出時聚醯胺樹脂溶液中所包含之雜質等包含於析出物中。因此,根據本發明之製造方法,容易製造具有如上所述之色差值之聚醯胺系樹脂粉體。<Polyamide resin powder> The polyamide resin powder produced by the production method of the present invention is preferably used for color difference measurement based on the L * a * b * color system (according to JIS Z 8781-4: In 2013), L * ≧90, -10≦a * ≦10, and -10≦b * ≦10 are satisfied. From the viewpoint of easily improving the transparency and visibility of the finally obtained polymer material, the L * in the above-mentioned color difference measurement is preferably 90 or more, more preferably 93 or more, and still more preferably 95 or more. The upper limit of L * is not particularly limited, as long as it is 100 or less. In the above color difference measurement, a * represents an index of redness. Based on the viewpoint that it is easy to improve the visibility of the finally obtained polymer material, it is preferably -10 or more and 10 or less, more preferably -7 or more and 7 or less, and still more preferably -5 above 5 below. In the above-mentioned color difference measurement, b * represents an index of blueness. Based on the viewpoint that it is easy to improve the visibility of the polymer material finally obtained, it is preferably -10 or more and 10 or less, more preferably -5 or more and 10 or less, and more preferably It is above -3 and below 7. The above-mentioned color difference can be measured using a color difference meter. According to the production method of the present invention, it is possible to prevent impurities contained in the polyamide resin solution from being included in the precipitate when the polyamide resin powder is deposited. Therefore, according to the manufacturing method of the present invention, it is easy to manufacture the polyamide resin powder having the above-mentioned color difference value.

就製造該粉體時容易使粉體乾燥,及使用該粉體製造高分子材料時之粉體之溶解性之觀點而言,對藉由本發明之製造方法所製造之聚醯胺系樹脂粉體進行測定所獲得之體積基準之粒度分佈中的中值徑(d50 )較佳為10~1,000 μm,更佳為50~800 μm,進而較佳為100~600 μm,進而更佳為200~500 μm。粒度分佈可使用粒度分析儀進行測定,例如可藉由實施例所記載之方法進行測定。From the viewpoints of easy drying of the powder when manufacturing the powder and the solubility of the powder when manufacturing polymer materials using the powder, the polyamide resin powder manufactured by the manufacturing method of the present invention The median diameter (d 50 ) in the volume-based particle size distribution obtained by the measurement is preferably 10 to 1,000 μm, more preferably 50 to 800 μm, still more preferably 100 to 600 μm, and still more preferably 200 to 500 μm. The particle size distribution can be measured using a particle size analyzer, for example, by the method described in the examples.

對藉由本發明之製造方法所製造之聚醯胺系樹脂粉體進行測定而獲得體積基準之粒度分佈,根據粒度分佈中之d10 、d50 及d90 ,藉由式(F)算出之參數δ較佳為5.0以下,更佳為4.5以下,進而較佳為4.0以下,進而更佳為3.0以下,尤佳為1.5以下,尤其更佳為1.0以下: δ=(d90 -d10 )/d50 式(F) 此處,dx 表示於所獲得之粒度分佈中頻度(自小徑側起之累積體積)成為x%之時間之粒徑,參數δ越小,表示粒徑之差異越小。於參數δ為上述上限以下之情形時,容易降低製造該粉體時之粉體之乾燥不均、及使用該粉體製造高分子材料時之粉體之溶解性之不均。The polyamide resin powder produced by the production method of the present invention is measured to obtain a volume-based particle size distribution. Based on the d 10 , d 50 and d 90 in the particle size distribution, the parameters calculated by the formula (F) δ is preferably 5.0 or less, more preferably 4.5 or less, still more preferably 4.0 or less, still more preferably 3.0 or less, particularly preferably 1.5 or less, particularly preferably 1.0 or less: δ=(d 90 -d 10 )/ d 50 formula (F) Here, d x represents the particle size at the time when the frequency (cumulative volume from the small diameter side) in the obtained particle size distribution becomes x%, the smaller the parameter δ, the greater the difference in particle size small. When the parameter δ is less than the above upper limit, it is easy to reduce the uneven drying of the powder during the production of the powder and the uneven solubility of the powder during the production of polymer materials using the powder.

<聚醯胺系樹脂> 於本發明之製造方法中,聚醯胺系樹脂可為選自由聚醯胺樹脂、聚醯胺醯亞胺樹脂及聚醯胺酸樹脂所組成之群中之至少1種樹脂。聚醯胺系樹脂可為1種聚醯胺系樹脂,亦可為2種以上之聚醯胺系樹脂之混合物。就制膜性之觀點而言,聚醯胺系樹脂較佳為聚醯胺醯亞胺樹脂。聚醯胺系樹脂較佳為芳香族系之聚醯胺系樹脂。所謂聚醯胺系樹脂為芳香族系,表示構成聚醯胺系樹脂之結構單元之較佳為50莫耳%以上、更佳為70莫耳%以上、進而較佳為100莫耳%為包含芳香族系結構之結構單元。<Polyamide resin> In the manufacturing method of the present invention, the polyamide resin may be at least one resin selected from the group consisting of polyamide resin, polyamide resin, and polyamide resin. The polyamide resin may be one type of polyamide resin, or a mixture of two or more types of polyamide resin. From the viewpoint of film forming properties, the polyamide resin is preferably a polyamide resin. The polyamide resin is preferably an aromatic polyamide resin. The so-called polyamide resin is aromatic, which means that the structural unit constituting the polyamide resin is preferably 50 mol% or more, more preferably 70 mol% or more, and more preferably 100 mol%. The structural unit of the aromatic structure.

於本發明之一個較佳實施方式中,聚醯胺系樹脂較佳為具有式(2)所表示之結構單元之聚醯胺樹脂、或具有式(1)所表示之結構單元及式(2)所表示之結構單元之聚醯胺醯亞胺樹脂。以下對式(1)及式(2)進行說明,對式(2)進行之說明係與聚醯胺樹脂及聚醯胺醯亞胺樹脂兩者相關,對式(1)進行之說明係與聚醯胺醯亞胺樹脂相關。 [化1]

Figure 02_image001
[式(1)中,Y表示四價有機基,X表示二價有機基,*表示鍵結鍵。式(2)中,Z及X彼此獨立地表示二價有機基,*表示鍵結鍵。]In a preferred embodiment of the present invention, the polyamide resin is preferably a polyamide resin having a structural unit represented by formula (2), or a structural unit represented by formula (1) and formula (2) ) Polyimide resin of the structural unit represented. The formula (1) and formula (2) are described below. The description of formula (2) is related to both polyamide resin and polyimide resin. The description of formula (1) is related to Polyimide resin is related. [化1]
Figure 02_image001
[In formula (1), Y represents a tetravalent organic group, X represents a divalent organic group, and * represents a bonding bond. In formula (2), Z and X independently represent a divalent organic group, and * represents a bonding bond. ]

式(1)所表示之結構單元係四羧酸化合物與二胺化合物反應所形成之結構單元,式(2)所表示之結構單元係二羧酸化合物與二胺化合物反應所形成之結構單元。於聚醯胺系樹脂為芳香族系之聚醯胺系樹脂的本發明之一個較佳形態中,較佳為構成式(1)所表示之結構單元及式(2)所表示之結構單元之四羧酸化合物、二胺化合物及二羧酸化合物之至少一者為芳香族化合物(芳香族四羧酸化合物、芳香族二胺化合物及/或芳香族二羧酸化合物)。The structural unit represented by formula (1) is a structural unit formed by the reaction of a tetracarboxylic acid compound and a diamine compound, and the structural unit represented by formula (2) is a structural unit formed by the reaction of a dicarboxylic acid compound and a diamine compound. In a preferred embodiment of the present invention in which the polyamide resin is an aromatic polyamide resin, it is preferable to constitute one of the structural unit represented by formula (1) and the structural unit represented by formula (2) At least one of the tetracarboxylic acid compound, the diamine compound, and the dicarboxylic acid compound is an aromatic compound (aromatic tetracarboxylic acid compound, aromatic diamine compound, and/or aromatic dicarboxylic acid compound).

於式(2)中,Z表示二價有機基,較佳為表示可經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可經鹵素原子、(較佳為氟原子取代)取代的碳數4~40之二價有機基,更佳為表示可經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可經鹵素原子、較佳為氟原子取代)取代的具有環狀結構之碳數4~40之二價有機基。再者,作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基之例,下述與式(3)中之R3a 及R3b 相關之例示同樣適用。作為環狀結構,可例舉:脂環、芳香環、雜環結構。作為有機基Z,可例舉式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基之鍵結鍵中之不相鄰之2個被取代為氫原子而成的基;及碳數6以下之二價鏈式烴基: [化2]

Figure 02_image003
[式(20)~式(29)中,W1 表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-Ar-、-SO2 -、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-,此處,Ar彼此獨立地表示氫原子可經氟原子取代之碳數6~20之伸芳基(例如伸苯基),*表示鍵結鍵], 作為Z之雜環結構,可例舉具有噻吩環骨架之基。基於容易抑制聚醯胺系樹脂粉體及所獲得之光學構件之黃度(降低YI值)之觀點,較佳為式(20)~式(29)所表示之基及具有噻吩環骨架之基,更佳為式(26)、式(28)及式(29)所表示之基。In formula (2), Z represents a divalent organic group, preferably an alkyl group having 1 to 6 carbons, an alkoxy group having 1 to 6 carbons, or an aryl group having 6 to 12 carbons (such The hydrogen atom in the group may be substituted by a halogen atom, (preferably substituted by a fluorine atom), a divalent organic group with 4 to 40 carbons, more preferably an alkyl group with 1 to 6 carbons, and a carbon number of 1 to Alkoxy group of 6 or aryl group of 6 to 12 carbons (the hydrogen atoms in these groups can be substituted by halogen atoms, preferably fluorine atoms) substituted with cyclic structure and a divalent organic group of 4 to 40 carbons Furthermore, as examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons, the following are the same as R 3a and R 3b in formula (3) Related exemplifications also apply. Examples of cyclic structures include alicyclic, aromatic, and heterocyclic structures. Examples of organic group Z include formula (20), formula (21), formula (22), and formula ( 23), formula (24), formula (25), formula (26), formula (27), formula (28) and formula (29) among the bonding bonds of the base represented by two non-adjacent bonds are substituted A group formed from a hydrogen atom; and a bivalent chain hydrocarbon group with a carbon number of 6 or less: [化2]
Figure 02_image003
[In formulas (20) to (29), W 1 represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -Ar-, -SO 2 -, -CO-, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2 -Ar-,- Ar-C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-, where Ar represents independently of each other an aryl group having 6 to 20 carbon atoms (such as benzene Group), * represents a bonding bond], as the heterocyclic structure of Z, a group having a thiophene ring skeleton can be exemplified. From the viewpoint of easily suppressing the yellowness (lowering YI value) of the polyamide resin powder and the obtained optical member, the group represented by the formula (20) to the formula (29) and the group having a thiophene ring skeleton are preferred , More preferably the base represented by formula (26), formula (28) and formula (29).

作為有機基Z,更佳為式(20')、式(21')、式(22')、式(23')、式(24')、式(25')、式(26')、式(27')、式(28')及式(29')所表示之二價有機基: [化3]

Figure 02_image005
[式(20')~式(29')中,W1 及*如式(20)~式(29)中所定義] 再者,式(20)~式(29)及式(20')~式(29')中之環上之氫原子可經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基取代(該等基中之氫原子可經鹵素原子(較佳為氟原子)取代)。As the organic group Z, it is more preferably formula (20'), formula (21'), formula (22'), formula (23'), formula (24'), formula (25'), formula (26'), The divalent organic group represented by formula (27'), formula (28') and formula (29'): [化3]
Figure 02_image005
[In formulas (20') to (29'), W 1 and * are as defined in formulas (20) to (29)] Furthermore, formulas (20) to (29) and (20') ~The hydrogen atom on the ring in formula (29') can be substituted by an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons or an aryl group with 6 to 12 carbons (the hydrogen in these groups The atom may be substituted by a halogen atom (preferably a fluorine atom)).

於聚醯胺系樹脂具有式(2)中之Z由上述式(20')~式(29')之任一者表示之結構單元的情形時,尤其於聚醯胺系樹脂具有式(2)中之Z由下述式(3')表示之結構單元的情形時,基於容易提高清漆之成膜性,容易提高光學膜之均一性之觀點,較佳為聚醯胺系樹脂具有該結構單元,此外進而具有下式(d1)所表示之源自羧酸之結構單元: [化4]

Figure 02_image007
[式(d1)中,R24 係對下述式(3)中之R3a 定義之基或氫原子,R25 表示R24 或-C(=O)-*,*表示鍵結鍵] 作為結構單元(d1),具體而言,可例舉:R24 及R25 均為氫原子之結構單元(源自二羧酸化合物之結構單元);R24 均為氫原子且R25 表示-C(=O)-*之結構單元(源自三羧酸化合物之結構單元)等。When the polyamide-based resin has a structural unit in which Z in the formula (2) is represented by any one of the above-mentioned formulas (20') to (29'), especially when the polyamide-based resin has the formula (2) In the case where Z in) is a structural unit represented by the following formula (3'), it is preferable that the polyamide-based resin has this structure from the viewpoint that it is easy to improve the film-forming properties of the varnish and the uniformity of the optical film The unit further has a carboxylic acid-derived structural unit represented by the following formula (d1): [化4]
Figure 02_image007
[In formula (d1), R 24 is the group or hydrogen atom defined for R 3a in the following formula (3) , R 25 represents R 24 or -C(=O)-*, * represents a bonding bond] As The structural unit (d1), specifically, can be exemplified: structural units in which R 24 and R 25 are both hydrogen atoms (structural units derived from dicarboxylic acid compounds); R 24 are both hydrogen atoms and R 25 represents -C (=O)-*The structural unit (the structural unit derived from the tricarboxylic acid compound) and so on.

關於聚醯胺系樹脂,作為式(2)中之Z,可包含複數種Z,複數種Z可彼此相同,亦可互不相同。基於容易提高使用本發明之聚醯胺系樹脂粉體所獲得之光學膜之耐彎曲性、耐衝擊性,且容易提高光學特性之觀點,較佳為至少具有式(2)中之Z較佳為由式(3)表示: [化5]

Figure 02_image009
[式(3)中,R3a 及R3b 彼此獨立地表示碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R3a 及R3b 中所包含之氫原子彼此獨立地可經鹵素原子取代, W彼此獨立地表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R9 )-, R9 表示氫原子、可經鹵素原子取代之碳數1~12之一價烴基, s為0~4之整數,t為0~4之整數,u為0~4之整數,*表示鍵結鍵], 更佳為由式(3')表示的結構單元: [化6]
Figure 02_image011
[式(3')中,R3a 、R3b 、s、t、u、W及*如式(3)中所定義] 再者,於本說明書中,聚醯胺系樹脂具有式(2)中之Z由式(3)表示之結構單元,及聚醯胺系樹脂具有式(3)所表示之結構作為式(2)中之Z具有相同之含義,意指聚醯胺系樹脂中所包含之複數個式(2)所表示之結構單元中之至少一部分結構單元中的Z由式(3)表示。該記載亦適用於其他相同之記載。Regarding the polyamide-based resin, as Z in the formula (2), a plurality of types of Z may be included, and the plurality of types of Z may be the same or different from each other. From the viewpoint that it is easy to improve the bending resistance and impact resistance of the optical film obtained by using the polyamide resin powder of the present invention, and it is easy to improve the optical properties, it is preferable to have at least Z in formula (2) It is expressed by formula (3): [化5]
Figure 02_image009
[In formula (3), R 3a and R 3b independently represent an alkyl group having 1 to 6 carbons, an alkoxy group having 1 to 6 carbons, or an aryl group having 6 to 12 carbons. In R 3a and R 3b The included hydrogen atoms can be substituted by halogen atoms independently of each other, and W independently of each other represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C( CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 9 )-, R 9 represents a hydrogen atom, the number of carbons that can be substituted by a halogen atom 1-12 monovalent hydrocarbon group, s is an integer of 0-4, t is an integer of 0-4, u is an integer of 0-4, * represents a bonding bond], more preferably represented by formula (3') Structural unit: [化6]
Figure 02_image011
[In the formula (3'), R 3a , R 3b , s, t, u, W, and * are as defined in the formula (3)] Furthermore, in this specification, the polyamide resin has the formula (2) The Z in the formula (3) represents the structural unit, and the polyamide resin has the structure represented by the formula (3) as Z in the formula (2) has the same meaning, which means the polyamide resin Z in at least a part of the structural units represented by the plurality of structural units represented by the formula (2) is represented by the formula (3). This record also applies to other similar records.

於式(3)及式(3')中,W彼此獨立地表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R9 )-,就光學膜之耐彎曲性之觀點而言,較佳為表示-O-或-S-,更佳為表示-O-。 R3a 及R3b 彼此獨立地表示碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三基、正戊基、2-甲基丁基、3-甲基丁基、2-乙基丙基、正己基等。作為碳數1~6之烷氧基,例如可例舉:甲氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、正戊氧基、正己氧基、環己氧基等。作為碳數6~12之芳基,例如可例舉:苯基、甲苯基、二甲苯基、萘基、聯苯基等。就光學膜之表面硬度及柔軟性之觀點而言,R3a 及R3b 彼此獨立地較佳為表示碳數1~6之烷基,更佳為表示碳數1~3之烷基。此處,R3a 及R3b 中所包含之氫原子彼此獨立地可經鹵素原子取代。 R9 表示氫原子、可經鹵素原子取代之碳數1~12之一價烴基。作為碳數1~12之一價烴基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三基、正戊基、2-甲基丁基、3-甲基丁基、2-乙基丙基、正己基、正庚基、正辛基、第三辛基、正壬基、正癸基等,該等可經鹵素原子取代。作為上述鹵素原子,可例舉:氟原子、氯原子、溴原子、碘原子等。聚醯胺系樹脂可包含複數種A,複數種A可彼此相同,亦可互不相同。In formula (3) and formula (3'), W independently represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 9 )-, from the viewpoint of the bending resistance of the optical film, preferably It represents -O- or -S-, and more preferably represents -O-. R 3a and R 3b independently represent an alkyl group having 1 to 6 carbons, an alkoxy group having 1 to 6 carbons, or an aryl group having 6 to 12 carbons. Examples of alkyl groups having 1 to 6 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tertiary, n-pentyl, 2-methylbutyl, 3-methylbutyl, 2-ethylpropyl, n-hexyl, etc. Examples of alkoxy groups having 1 to 6 carbon atoms include: methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, isobutoxy, second butoxy, and Tributoxy, n-pentyloxy, n-hexyloxy, cyclohexyloxy, etc. As the aryl group having 6 to 12 carbon atoms, for example, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and a biphenyl group may be mentioned. From the viewpoint of the surface hardness and flexibility of the optical film, R 3a and R 3b independently of each other preferably represent an alkyl group having 1 to 6 carbon atoms, and more preferably represent an alkyl group having 1 to 3 carbon atoms. Here, the hydrogen atoms contained in R 3a and R 3b may be substituted with halogen atoms independently of each other. R 9 represents a hydrogen atom, a monovalent hydrocarbon group of 1 to 12 carbons which may be substituted with a halogen atom. Examples of monovalent hydrocarbon groups with 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, tertiary, and n-pentyl. , 2-methylbutyl, 3-methylbutyl, 2-ethylpropyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl, n-decyl, etc., which can be Substituted by halogen atoms. As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned. The polyamide-based resin may include a plurality of A, and the plurality of A may be the same or different from each other.

式(3)及式(3')中之t及u彼此獨立地為0~4之整數,較佳為0~2之整數,更佳為0或1,進而較佳為0。In formula (3) and formula (3′), t and u are independently an integer of 0-4, preferably an integer of 0-2, more preferably 0 or 1, and still more preferably 0.

式(3)中及式(3')中之s為0~4之範圍之整數,若s處於該範圍內,則包含該聚醯胺系樹脂之膜之耐彎曲性及彈性模數容易變得良好。基於容易進一步提昇包含該聚醯胺系樹脂之膜之耐衝擊性、彈性模數及耐彎曲性之觀點,式(3)及式(3')中之s較佳為0~3之範圍之整數,更佳為0~2之範圍之整數,進而較佳為0或1,進而更佳為0。較佳為包含式(2)中之Z由s為0之式(3)或式(3')表示之結構的結構單元例如為源自對苯二甲酸或間苯二甲酸之結構單元,該結構單元為包含式(3)或式(3')中之s為0且u為0之結構的結構單元。基於容易提昇光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,聚醯胺系樹脂較佳為包含源自對苯二甲酸之結構單元。聚醯胺系樹脂可包含1種或2種以上之Z由式(3)或式(3')表示之結構單元。基於容易降低聚醯胺系樹脂粉體及所獲得之光學構件之黃度之觀點,以及基於容易提昇光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,關於聚醯胺系樹脂,作為式(2)中之Z,較佳為包含式(3)中或式(3')中之s之值不同之2種以上之結構,更佳為包含式(3)或式(3')中之s之值不同之2種或3種結構。於該情形時,基於容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,以及基於容易降低聚醯胺系樹脂粉體及所獲得之光學膜之黃度之觀點,進而較佳為聚醯胺系樹脂含有式(2)所表示之結構單元中之Z由s為0之式(3)表示之結構,除包含該結構之結構單元以外,進而含有包含s為1之式(3)所表示之結構的結構單元。又,亦較佳為除具有s為0之式(3)所表示之Z的式(2)所表示之結構單元以外,進而具有上述式(d1)所表示之結構單元。In formula (3) and formula (3'), s is an integer in the range of 0-4. If s is in this range, the bending resistance and elastic modulus of the film containing the polyamide resin are likely to change Well. From the viewpoint that it is easy to further improve the impact resistance, elastic modulus and bending resistance of the film containing the polyamide resin, s in formula (3) and formula (3') is preferably in the range of 0 to 3 An integer is more preferably an integer in the range of 0-2, still more preferably 0 or 1, and still more preferably 0. Preferably, the structural unit comprising the structure represented by the formula (3) or the formula (3') in which Z in the formula (2) is 0 is, for example, a structural unit derived from terephthalic acid or isophthalic acid, the The structural unit is a structural unit including a structure in which s is 0 and u is 0 in formula (3) or formula (3′). From the viewpoint of easily improving the impact resistance, elastic modulus, and bending resistance of the optical film, the polyamide-based resin preferably contains structural units derived from terephthalic acid. The polyamide-based resin may include one or two or more types of Z structural units represented by formula (3) or formula (3'). Based on the viewpoint that it is easy to reduce the yellowness of the polyamide-based resin powder and the obtained optical member, and based on the viewpoint that it is easy to improve the impact resistance, elastic modulus, and bending resistance of the optical film, regarding the polyamide-based resin, Z in formula (2) preferably includes two or more structures in formula (3) or formula (3') with different values of s, and more preferably includes formula (3) or formula (3') 2 or 3 structures with different values of s in ). In this case, based on the viewpoint that it is easy to improve the impact resistance, elastic modulus, and bending resistance of the optical film, and based on the viewpoint that it is easy to reduce the yellowness of the polyamide resin powder and the obtained optical film, it is more Preferably, the polyamide resin contains a structure in which Z in the structural unit represented by formula (2) is represented by formula (3) where s is 0, and in addition to the structural unit containing the structure, it further contains a formula containing s as 1 (3) The structural unit of the structure shown. Furthermore, it is also preferable to have a structural unit represented by the above-mentioned formula (d1) in addition to the structural unit represented by the formula (2) having Z represented by the formula (3) where s is 0.

於本發明之一個較佳實施方式中,關於聚醯胺系樹脂,作為式(3)或式(3')所表示之結構(二價基),具有s=0且u=0之結構。於本發明之一個更佳實施方式中,關於聚醯胺系樹脂,作為式(3)或式(3')所表示之結構,具有s=0且u=0之結構、及式(3'')所表示之結構: [化7]

Figure 02_image013
於該情形時,容易提昇光學膜之耐衝擊性、彈性模數及耐彎曲性,並且容易降低聚醯胺系樹脂粉體及光學膜之黃度。In a preferred embodiment of the present invention, regarding the polyamide-based resin, as the structure (divalent group) represented by formula (3) or formula (3'), it has a structure of s=0 and u=0. In a more preferable embodiment of the present invention, regarding the polyamide resin, as the structure represented by the formula (3) or the formula (3'), it has a structure of s=0 and u=0, and a formula (3') The structure represented by'): [化7]
Figure 02_image013
In this case, it is easy to improve the impact resistance, elastic modulus and bending resistance of the optical film, and it is easy to reduce the yellowness of the polyamide resin powder and the optical film.

於聚醯胺系樹脂具有式(2)中之Z由式(3)或式(3')表示之結構單元之情形時,於將聚醯胺系樹脂之式(1)所表示之結構單元及式(2)所表示之結構單元之合計設為100莫耳%時,其比率較佳為20莫耳%以上,更佳為30莫耳%以上,進而較佳為40莫耳%以上,進而更佳為50莫耳%以上,尤佳為60莫耳%以上,且較佳為90莫耳%以下,更佳為85莫耳%以下,進而較佳為80莫耳%以下。若式(2)中之Z由式(3)或式(3')表示之結構單元之比率為上述下限以上,則容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性。若式(2)中之Z由式(3)或式(3')表示之結構單元之比率為上述上限以下,則容易抑制因源自式(3)之醯胺鍵間之氫鍵而導致含樹脂之清漆之黏度上升,容易提昇膜之加工性。When the polyamide resin has the structural unit represented by the formula (3) or formula (3') in the formula (2), the structural unit represented by the formula (1) of the polyamide resin When the total of the structural units represented by formula (2) is set to 100 mol%, the ratio is preferably 20 mol% or more, more preferably 30 mol% or more, and still more preferably 40 mol% or more, It is still more preferably 50 mol% or more, particularly preferably 60 mol% or more, and more preferably 90 mol% or less, more preferably 85 mol% or less, and still more preferably 80 mol% or less. If the ratio of the structural unit represented by the formula (3) or the formula (3') in Z in the formula (2) is more than the above lower limit, it is easy to improve the impact resistance, elastic modulus, and bending resistance of the optical film. If the ratio of the structural units represented by the formula (3) or the formula (3') of Z in the formula (2) is less than the above upper limit, it is easy to suppress the hydrogen bond derived from the amide bond of the formula (3). The viscosity of resin-containing varnish increases, which easily improves the processability of the film.

又,於聚醯胺系樹脂具有式(2)中之Z由s=1~4之式(3)或式(3')表示之結構的情形時,於將聚醯胺系樹脂之式(1)所表示之結構單元及式(2)所表示之結構單元之合計設為100莫耳%時,具有s為1~4之式(3)或式(3')所表示之Z之式(2)所表示之結構單元的比率較佳為3莫耳%以上,更佳為5莫耳%以上,進而較佳為7莫耳%以上,進而更佳為9莫耳%以上,且較佳為90莫耳%以下,更佳為70莫耳%以下,進而較佳為50莫耳%以下,進而更佳為30莫耳%以下。若具有s為1~4之式(3)或式(3')所表示之Z之式(2)所表示之結構單元的比率為上述下限以上,則容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性。若具有s為1~4之式(3)或式(3')所表示之Z之式(2)所表示之結構單元的比率為上述上限以下,則容易抑制因源自式(3)或式(3')所表示之結構之醯胺鍵間之氫鍵而導致含樹脂之清漆之黏度上升,容易提昇膜之加工性。再者,式(1)、式(2)、式(2)中之Z由式(3)或式(3')表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In addition, when the polyamide resin has a structure in which Z in the formula (2) is represented by the formula (3) or formula (3') where s=1 to 4, the formula ( 1) When the total of the structural unit represented by the formula (2) and the structural unit represented by the formula (2) is set to 100 mol%, the formula (3) with s of 1 to 4 or the formula with Z represented by the formula (3') (2) The ratio of the structural unit represented is preferably 3 mol% or more, more preferably 5 mol% or more, still more preferably 7 mol% or more, still more preferably 9 mol% or more, and more It is preferably 90 mol% or less, more preferably 70 mol% or less, further preferably 50 mol% or less, and still more preferably 30 mol% or less. If the ratio of the structural unit represented by the formula (2) having the formula (3) represented by the formula (3') or the formula (3') with s of 1 to 4 is more than the above lower limit, the impact resistance and elasticity of the optical film are easily improved Modulus and bending resistance. If the ratio of the structural unit represented by the formula (2) having the formula (3) or Z represented by the formula (3') with s of 1 to 4 is less than the above upper limit, it is easily suppressed because it is derived from the formula (3) or The hydrogen bonds between the amide bonds of the structure represented by the formula (3') cause the viscosity of the resin-containing varnish to increase, and it is easy to improve the processability of the film. Furthermore, the ratio of structural units represented by formula (3) or formula (3') in Z in formula (1), formula (2), and formula (2) can be measured, for example, using 1 H-NMR, or can also be Calculate based on the addition ratio of raw materials.

於本發明之一個較佳實施方式中,聚醯胺系樹脂中之Z之較佳為30莫耳%以上、更佳為40莫耳%以上、進而較佳為45莫耳%以上、進而更佳為50莫耳%以上由s為0~4之式(3)或式(3')表示。若Z之上述下限以上由s為0~4之式(3)或式(3')表示,則容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性。又,只要聚醯胺系樹脂中之Z之100莫耳%以下由s為0~4之式(3)或式(3')表示即可。再者,樹脂中之具有s為0~4之式(3)或式(3')所表示之Z之式(2)所表示之結構單元的比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In a preferred embodiment of the present invention, Z in the polyamide resin is preferably 30 mol% or more, more preferably 40 mol% or more, further preferably 45 mol% or more, and even more Preferably, 50 mol% or more is represented by formula (3) or formula (3') where s is 0-4. If the above lower limit of Z is expressed by formula (3) or formula (3') in which s is 0-4, the impact resistance, elastic modulus, and bending resistance of the optical film are easily improved. In addition, it is sufficient that 100 mol% or less of Z in the polyamide-based resin is represented by formula (3) or formula (3') where s is 0-4. Furthermore, the ratio of the structural unit represented by formula (2) with s of 0-4 or Z represented by formula (3') in the resin can be measured using 1 H-NMR, or It can also be calculated based on the addition ratio of the raw materials.

於本發明之一個較佳實施方式中,聚醯胺系樹脂中之Z之較佳為5莫耳%以上、更佳為8莫耳%以上、進而較佳為10莫耳%以上、進而更佳為12莫耳%以上由s為1~4之式(3)或式(3')表示。於聚醯胺系樹脂之Z之上述下限以上由s為1~4之式(3)或式(3')表示之情形時,容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性。又,Z之較佳為90莫耳%以下、更佳為70莫耳%以下、進而較佳為50莫耳%以下、進而更佳為30莫耳%以下由s為1~4之式(3)或式(3')表示。於Z之上述上限以下由s為1~4之式(3)或式(3')表示之情形時,容易抑制因源自s為1~4之式(3)或式(3')所表示之結構之醯胺鍵間之氫鍵而導致含樹脂之清漆之黏度上升,容易提昇膜之加工性。再者,樹脂中之具有s為1~4之式(3)或式(3')所表示之Z之式(2)所表示之結構單元的比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In a preferred embodiment of the present invention, Z in the polyamide resin is preferably 5 mol% or more, more preferably 8 mol% or more, further preferably 10 mol% or more, and even more Preferably, 12 mol% or more is represented by formula (3) or formula (3') in which s is 1 to 4. When the above lower limit of Z of the polyamide resin is expressed by formula (3) or formula (3') where s is 1 to 4, it is easy to improve the impact resistance, elastic modulus and bending resistance of the optical film . In addition, Z is preferably 90 mol% or less, more preferably 70 mol% or less, still more preferably 50 mol% or less, and still more preferably 30 mol% or less. 3) Or expressed by formula (3'). Below the upper limit of Z, when represented by formula (3) or formula (3') in which s is 1 to 4, it is easy to suppress that it is derived from formula (3) or formula (3') in which s is 1 to 4 The hydrogen bonds between the amide bonds of the indicated structure cause the viscosity of the resin-containing varnish to increase, which is easy to improve the processability of the film. Furthermore, the ratio of the structural unit represented by formula (2) with s of 1 to 4 or Z represented by formula (3') in the resin can be measured using 1 H-NMR, or It can also be calculated based on the addition ratio of the raw materials.

於式(1)及式(2)中,X彼此獨立地表示二價有機基,較佳為表示碳數4~40之二價有機基,更佳為表示具有環狀結構之碳數4~40之二價有機基。作為環狀結構,可例舉:脂環、芳香環、雜環結構。關於上述有機基,有機基中之氫原子可經烴基或經氟取代之烴基取代,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。於本發明之一實施方式中,本發明之聚醯胺系樹脂可包含複數種X,複數種X可彼此相同,亦可互不相同。作為X,可例舉:式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;該式(10)~式(18)所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;以及碳數6以下之鏈式烴基。In formula (1) and formula (2), X independently represents a divalent organic group, preferably represents a divalent organic group having 4 to 40 carbons, and more preferably represents a carbon number of 4 to 4 having a cyclic structure. 40 divalent organic base. The cyclic structure may, for example, be an alicyclic ring, an aromatic ring, or a heterocyclic structure. Regarding the above-mentioned organic group, the hydrogen atom in the organic group may be substituted with a hydrocarbyl group or a fluorine-substituted hydrocarbyl group. In this case, the carbon number of the hydrocarbyl group and the fluorine-substituted hydrocarbyl group is preferably 1-8. In one embodiment of the present invention, the polyamide resin of the present invention may include a plurality of types of X, and the plurality of types of X may be the same or different from each other. Examples of X include: formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), formula (17), and formula (18) ); a group in which the hydrogen atom in the group represented by the formula (10) to formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and a chain formula with a carbon number of 6 or less Hydrocarbyl.

[化8]

Figure 02_image015
[化8]
Figure 02_image015

[式(10)~式(18)中,*表示鍵結鍵, V1 、V2 及V3 彼此獨立地表示單鍵、-O-、-S-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-CO-或-N(Q)-。此處,Q表示可經鹵素原子取代之碳數1~12之一價烴基。] 作為碳數1~12之一價烴基,可例舉上文中對R9 所述之基。 1個例係V1 及V3 為單鍵、-O-或-S-,且V2 為-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -或-SO2 -。V1 與V2 對各環之鍵結位置、及V2 與V3 對各環之鍵結位置彼此獨立地相對於各環,較佳為間位或對位,更佳為對位。[In formulas (10) to (18), * represents a bonding bond, and V 1 , V 2 and V 3 independently represent a single bond, -O-, -S-, -CH 2 -, -CH 2- CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -CO- or -N(Q)-. Here, Q represents a monovalent hydrocarbon group with 1 to 12 carbons which may be substituted with a halogen atom. ] As the monovalent hydrocarbon group having 1 to 12 carbon atoms, the groups described above for R 9 can be exemplified. One example is that V 1 and V 3 are single bonds, -O- or -S-, and V 2 is -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -or -SO 2 -. The bonding position of V 1 and V 2 to each ring and the bonding position of V 2 and V 3 to each ring are independent of each other, preferably meta or para, and more preferably para.

於式(10)~式(18)所表示之基中,基於容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,較佳為式(13)、式(14)、式(15)、式(16)及式(17)所表示之基,更佳為式(14)、式(15)及式(16)所表示之基。又,基於容易提高光學膜之耐衝擊性、彈性模數及柔軟性之觀點,V1 、V2 及V3 彼此獨立地較佳為單鍵、-O-或-S-,更佳為單鍵或-O-。In the base represented by formulas (10) to (18), from the viewpoint of easily improving the impact resistance, elastic modulus, and bending resistance of the optical film, formulas (13), (14), and formulas are preferred The groups represented by (15), formula (16) and formula (17) are more preferably groups represented by formula (14), formula (15) and formula (16). In addition, from the viewpoint of easily improving the impact resistance, elastic modulus, and flexibility of the optical film, V 1 , V 2 and V 3 are independently of each other preferably a single bond, -O- or -S-, more preferably a single bond Key or -O-.

於本發明之一個較佳實施方式中,關於聚醯胺系樹脂,作為式(1)中之X或式(2)中之X,包含式(4)所表示之結構: [化9]

Figure 02_image017
[式(4)中,R10 ~R17 彼此獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R10 ~R17 中所包含之氫原子彼此獨立地可經鹵素原子取代,*表示鍵結鍵] 若式(1)及式(2)所表示之複數個結構單元中之X之至少一部分為式(4)所表示之結構,則容易提高光學膜之耐衝擊性、彈性模數及透明性。In a preferred embodiment of the present invention, the polyamide resin, as X in formula (1) or X in formula (2), includes the structure represented by formula (4): [化9]
Figure 02_image017
[In formula (4), R 10 to R 17 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R 10 to The hydrogen atoms contained in R 17 can be independently substituted by halogen atoms, and * represents a bonding bond] If at least a part of X in the plural structural units represented by formula (1) and formula (2) is formula (4) The structure represented by) can easily improve the impact resistance, elastic modulus and transparency of the optical film.

於式(4)中,R10 、R11 、R12 、R13 、R14 、R15 、R16 及R17 彼此獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,可例舉作為式(3)中之碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基所例示之基。R10 ~R17 彼此獨立地較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,此處,R10 ~R17 中所包含之氫原子彼此獨立地可經鹵素原子取代。作為鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子。就光學膜之耐衝擊性、彈性模數、透明性及耐彎曲性之觀點而言,進而較佳為R10 ~R17 彼此獨立地表示氫原子、甲基、氟基、氯基或三氟甲基,進而更佳為R10 、R12 、R13 、R14 、R15 及R16 表示氫原子,R11 及R17 表示氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R11 及R17 表示甲基或三氟甲基。In formula (4), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and R 17 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbons, and a carbon number of 1 to Alkoxy group of 6 or aryl group of 6-12 carbons. Examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons include the alkyl groups having 1 to 6 carbons in formula (3), The group exemplified by the alkoxy group having 1 to 6 or the aryl group having 6 to 12 carbon atoms. R 10 to R 17 independently of each other preferably represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and more preferably represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. Here, R 10 to R 17 are The included hydrogen atoms can be substituted by halogen atoms independently of each other. As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, for example. From the viewpoint of impact resistance, elastic modulus, transparency, and bending resistance of the optical film, it is more preferred that R 10 to R 17 independently of each other represent a hydrogen atom, a methyl group, a fluorine group, a chlorine group, or a trifluoride group. Methyl group, more preferably R 10 , R 12 , R 13 , R 14 , R 15, and R 16 represent a hydrogen atom, and R 11 and R 17 represent a hydrogen atom, a methyl group, a fluoro group, a chloro group, or a trifluoromethyl group It is particularly preferable that R 11 and R 17 represent methyl or trifluoromethyl.

於本發明之一個較佳實施方式中,式(4)所表示之結構單元為式(4')所表示之結構單元: [化10]

Figure 02_image019
即,式(1)及式(2)所表示之複數個結構單元中之X之至少一部分為式(4')所表示之結構單元。於該情形時,藉由含有氟元素之骨架,容易提高聚醯胺系樹脂於溶劑中之溶解性,容易提昇含有該樹脂之清漆之保管穩定性,並且容易降低該清漆之黏度,容易提昇光學膜之加工性。又,藉由含有氟元素之骨架,容易提昇光學膜之光學特性。In a preferred embodiment of the present invention, the structural unit represented by formula (4) is the structural unit represented by formula (4'): [化10]
Figure 02_image019
That is, at least a part of X in the plural structural units represented by formula (1) and formula (2) is a structural unit represented by formula (4'). In this case, it is easy to improve the solubility of the polyamide resin in the solvent by the skeleton containing the fluorine element, and it is easy to improve the storage stability of the varnish containing the resin, and it is easy to reduce the viscosity of the varnish, and it is easy to improve the optics. The processability of the film. In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film.

於本發明之一個較佳實施方式中,上述聚醯胺系樹脂中之X之較佳為30莫耳%以上、更佳為50莫耳%以上、進而較佳為70莫耳%以上由式(4)、尤其是式(4')表示。於聚醯胺系樹脂中之上述範圍內之X由式(4)、尤其是式(4')表示之情形時,關於所獲得之光學膜,藉由含有氟元素之骨架,容易提高樹脂於溶劑中之溶解性,容易提昇含有該樹脂之清漆之保管穩定性,並且容易降低該清漆之黏度,容易提昇光學膜之加工性。又,藉由含有氟元素之骨架,亦容易提昇光學膜之光學特性。再者,較佳為上述聚醯胺系樹脂中之X之100莫耳%以下由式(4)、尤其是式(4')表示。上述樹脂中之X可為式(4)、尤其是式(4')。上述樹脂中之X由式(4)表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In a preferred embodiment of the present invention, X in the polyamide resin is preferably 30 mol% or more, more preferably 50 mol% or more, and more preferably 70 mol% or more. (4) Especially expressed by formula (4'). When X in the above-mentioned range in the polyamide-based resin is represented by formula (4), especially formula (4'), the obtained optical film has a fluorine-containing skeleton, which makes it easy to improve the resin’s The solubility in the solvent can easily improve the storage stability of the varnish containing the resin, and it is easy to reduce the viscosity of the varnish, and it is easy to improve the processability of the optical film. In addition, it is easy to improve the optical properties of the optical film by the skeleton containing the fluorine element. Furthermore, it is preferable that 100 mol% or less of X in the polyamide resin is represented by formula (4), especially formula (4'). X in the above resin may be formula (4), especially formula (4'). The ratio of the structural unit represented by the formula (4) of X in the above resin can be measured, for example, using 1 H-NMR, or can also be calculated based on the addition ratio of the raw materials.

於式(1)中,Y表示四價有機基,較佳為表示碳數4~40之四價有機基,更佳為表示具有環狀結構之碳數4~40之四價有機基。作為環狀結構,可例舉:脂環、芳香環、雜環結構,基於容易提高耐衝擊性及彈性模數之觀點,較佳為可例舉芳香環。上述有機基係有機基中之氫原子可經烴基或經氟取代之烴基取代者,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。於本發明之一實施方式中,聚醯胺系樹脂為聚醯胺醯亞胺樹脂,該聚醯胺醯亞胺樹脂可包含複數種Y,複數種Y可彼此相同,亦可互不相同。作為Y,可例舉:以下之式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基;該式(20)~式(29)所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;以及碳數6以下之四價鏈式烴基。In formula (1), Y represents a tetravalent organic group, preferably a tetravalent organic group having 4 to 40 carbons, and more preferably a tetravalent organic group having 4 to 40 carbons having a cyclic structure. The cyclic structure may, for example, be an alicyclic ring, an aromatic ring, or a heterocyclic structure. From the viewpoint of easy improvement in impact resistance and elastic modulus, an aromatic ring may be preferably mentioned. The above-mentioned organic groups are those in which the hydrogen atoms in the organic groups may be substituted by a hydrocarbon group or a fluorine-substituted hydrocarbon group. In this case, the carbon number of the hydrocarbon group and the fluorine-substituted hydrocarbon group is preferably 1-8. In one embodiment of the present invention, the polyamide resin is a polyamide resin, and the polyamide resin may include a plurality of types of Y, and the plurality of types of Y may be the same or different from each other. Examples of Y include: the following formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) and the group represented by the formula (29); the hydrogen atom in the group represented by the formula (20) to the formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and A tetravalent chain hydrocarbon group with a carbon number of 6 or less.

[化11]

Figure 02_image021
[化11]
Figure 02_image021

式(20)~式(29)中,*表示鍵結鍵,W1 表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-Ar-、-SO2 -、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-。Ar表示氫原子可經氟原子取代之碳數6~20之伸芳基,作為具體例,可例舉伸苯基。In formulas (20) to (29), * represents a bonding bond, W 1 represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C (CH 3 ) 2 -, -C(CF 3 ) 2 -, -Ar-, -SO 2 -, -CO-, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2 -Ar-, -Ar-C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-. Ar represents an arylene group having 6 to 20 carbon atoms in which a hydrogen atom can be substituted with a fluorine atom, and as a specific example, a phenylene group may be mentioned.

於式(20)~式(29)所表示之基中,基於容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,較佳為式(26)、式(28)或式(29)所表示之基,更佳為式(26)所表示之基。又,基於容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,並且容易降低聚醯胺系樹脂粉體及光學膜之黃度,W1 彼此獨立地較佳為單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為單鍵、-O-、-CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而更佳為單鍵或-C(CF3 )2 -。In the base represented by formulas (20) to (29), from the viewpoint of easily improving the impact resistance, elastic modulus, and bending resistance of the optical film, formulas (26), (28) or formulas are preferred The group represented by (29) is more preferably the group represented by formula (26). And, based on easy to improve the impact resistance of the optical film, the elastic modulus and the bending resistance of view, and tends to decrease yellowness of polyamide resin powder, and the optical film, W 1 is independently preferably a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond,- O-, -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond or -C(CF 3 ) 2 -.

於本發明之一個較佳實施方式中,聚醯胺醯亞胺樹脂中之Y之較佳為50莫耳%以上、更佳為60莫耳%以上、進而較佳為70莫耳%以上由式(26)表示。若聚醯胺醯亞胺樹脂中之上述範圍內之Y由式(26)、較佳為W1 為單鍵、-C(CH3 )2 -或-C(CF3 )2 -之式(26)、更佳為W1 為單鍵或-C(CF3 )2 -之式(26)表示,則容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性,並且容易降低聚醯胺系樹脂粉體及光學膜之黃度。聚醯胺醯亞胺樹脂中之Y由式(26)表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In a preferred embodiment of the present invention, Y in the polyimide resin is preferably 50 mol% or more, more preferably 60 mol% or more, and more preferably 70 mol% or more. Formula (26) represents. If Y in the above-mentioned range in the polyamide imide resin is represented by formula (26), preferably W 1 is a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2- 26). More preferably, W 1 is a single bond or -C(CF 3 ) 2 -represented by the formula (26), it is easy to improve the impact resistance, elastic modulus and bending resistance of the optical film, and it is easy to reduce the polyamide The yellowness of amine resin powder and optical film. The ratio of the structural unit represented by formula (26) for Y in the polyamide imide resin can be measured, for example, using 1 H-NMR, or can also be calculated based on the addition ratio of the raw materials.

於本發明之一個較佳實施方式中,式(1)中之複數種Y之至少一部分由式(5)表示: [化12]

Figure 02_image023
[式(5)中,R18 ~R25 彼此獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R18 ~R25 中所包含之氫原子彼此獨立地可經鹵素原子取代,*表示鍵結鍵], 及/或由式(9)表示 [化13]
Figure 02_image025
[式(9)中,R35 ~R40 彼此獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R35 ~R40 中所包含之氫原子彼此獨立地可經鹵素原子取代,*表示鍵結鍵] 若式(1)中之複數種Y之至少一部分由式(5)表示,及/或由式(9)表示,則容易提昇光學膜之耐衝擊性、彈性模數及光學特性。In a preferred embodiment of the present invention, at least a part of the plural kinds of Y in formula (1) is represented by formula (5): [化12]
Figure 02_image023
[In formula (5), R 18 to R 25 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R 18 to The hydrogen atoms contained in R 25 can be substituted by halogen atoms independently of each other, * represents a bonding bond], and/or is represented by formula (9) [formation 13]
Figure 02_image025
[In formula (9), R 35 to R 40 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbons or an aryl group having 6 to 12 carbons, and the hydrogen atoms contained in R 35 to R 40 are independent of each other The ground can be substituted by a halogen atom, * represents a bonding bond] If at least a part of the plurality of Y in the formula (1) is represented by the formula (5), and/or is represented by the formula (9), the durability of the optical film is easily improved Impact, elastic modulus and optical properties.

於式(5)中,R18 、R19 、R20 、R21 、R22 、R23 、R24 及R25 彼此獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,可例舉上文中作為式(3)中之碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基所例示者。R18 ~R25 彼此獨立地較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,此處,R18 ~R25 中所包含之氫原子彼此獨立地可經鹵素原子取代。作為該鹵素原子,可例舉:氟原子、氯原子、溴原子及碘原子。基於容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性之觀點,以及基於容易提高透明性,並且容易維持該透明性之觀點,進而較佳為R18 ~R25 彼此獨立地表示氫原子、甲基、氟基、氯基或三氟甲基,進而更佳為R18 、R19 、R20 、R23 、R24 及R25 表示氫原子且R21 及R22 表示氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R21 及R22 表示甲基或三氟甲基。In formula (5), R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 and R 25 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbons, and a carbon number of 1 to Alkoxy group of 6 or aryl group of 6-12 carbons. Examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons include the above-mentioned alkyl groups having 1 to 6 carbons in formula (3), The alkoxy group having 1 to 6 carbons or the aryl group having 6 to 12 carbons are exemplified. R 18 ~ R each independently preferably represents a hydrogen atom or an alkyl group with 1-25 carbon atoms of 1 to 6, more preferably represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, the where, R 18 ~ R 25 as The included hydrogen atoms can be substituted by halogen atoms independently of each other. As this halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned. From the viewpoint of easy improvement of the impact resistance, elastic modulus, and bending resistance of the optical film, and the viewpoint of easy improvement of transparency and easy maintenance of the transparency, it is further preferred that R 18 to R 25 independently represent hydrogen. Atom, methyl group, fluoro group, chloro group or trifluoromethyl group, more preferably R 18 , R 19 , R 20 , R 23 , R 24 and R 25 represent a hydrogen atom and R 21 and R 22 represent a hydrogen atom, A methyl group, a fluoro group, a chloro group or a trifluoromethyl group, particularly preferably, R 21 and R 22 represent a methyl group or a trifluoromethyl group.

於式(9)中,基於容易提高光學膜之化學穩定性、耐衝擊性、彈性模數及耐彎曲性之觀點,以及基於容易提高透明性,並且容易維持該透明性之觀點,R35 ~R40 較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,進而較佳為表示氫原子。此處,R35 ~R40 中所包含之氫原子彼此獨立地可經鹵素原子取代,作為該鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子。作為R35 ~R40 中之碳數1~6之烷基及碳數6~12之芳基,分別可例舉上文所例示者。In formula (9), R 35 ~ R 40 preferably represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and still more preferably represents a hydrogen atom. Here, the hydrogen atoms contained in R 35 to R 40 may be independently substituted with a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. As the alkyl group having 1 to 6 carbons and the aryl group having 6 to 12 carbons in R 35 to R 40, those exemplified above can be mentioned, respectively.

於本發明之一個較佳實施方式中,式(5)由式(5')表示,式(9)由式(9')表示: [化14]

Figure 02_image027
即,複數種Y之至少一部分由式(5')及/或式(9')表示。於該情形時,容易提高光學膜之耐衝擊性、彈性模數及耐彎曲性。進而,於式(5)由式(5')表示之情形時,藉由含有氟元素之骨架,容易提高聚醯胺系樹脂於溶劑中之溶解性,容易提昇含有該樹脂之清漆之保管穩定性,並且容易降低該清漆之黏度,容易提昇光學膜之加工性。又,藉由含有氟元素之骨架,容易提昇光學膜之光學特性。In a preferred embodiment of the present invention, formula (5) is represented by formula (5'), and formula (9) is represented by formula (9'): [化14]
Figure 02_image027
That is, at least a part of the plural kinds of Y is represented by the formula (5') and/or the formula (9'). In this case, it is easy to improve the impact resistance, elastic modulus, and bending resistance of the optical film. Furthermore, in the case where the formula (5) is represented by the formula (5'), the fluorine-containing skeleton can easily improve the solubility of the polyamide resin in the solvent, and it is easy to improve the storage stability of the varnish containing the resin It is easy to reduce the viscosity of the varnish, and it is easy to improve the processability of the optical film. In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film.

於本發明之一個較佳實施方式中,聚醯胺醯亞胺樹脂中之Y之較佳為50莫耳%以上、更佳為60莫耳%以上、進而較佳為70莫耳%以上由式(5)、尤其是式(5')表示。若聚醯胺醯亞胺樹脂中之上述範圍內之Y由式(5)、尤其是式(5')表示,則藉由含有氟元素之骨架,容易提高聚醯胺系樹脂於溶劑中之溶解性,容易降低含有該樹脂之清漆之黏度,容易提昇光學膜之加工性。又,藉由含有氟元素之骨架,容易提昇光學膜之光學特性。再者,較佳為上述聚醯胺醯亞胺樹脂中之Y之100莫耳%以下由式(5)、尤其是式(5')表示。聚醯胺醯亞胺樹脂中之Y可為式(5)、尤其是式(5')。聚醯胺醯亞胺樹脂中之Y由式(5)表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In a preferred embodiment of the present invention, Y in the polyimide resin is preferably 50 mol% or more, more preferably 60 mol% or more, and more preferably 70 mol% or more. It is represented by formula (5), especially formula (5'). If Y in the above-mentioned range in the polyamide resin is represented by formula (5), especially formula (5'), it is easy to improve the polyamide resin in the solvent by the skeleton containing the fluorine element. Solubility, easy to reduce the viscosity of varnish containing the resin, easy to improve the processability of the optical film. In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film. Furthermore, it is preferable that 100 mol% or less of Y in the polyimide resin is represented by formula (5), especially formula (5'). Y in the polyimide resin may be formula (5), especially formula (5'). The ratio of the structural unit represented by formula (5) of Y in the polyamide imide resin can be measured, for example, using 1 H-NMR, or can also be calculated based on the addition ratio of the raw materials.

於本發明之一個較佳實施方式中,式(1)所表示之複數個結構單元較佳為包含Y由式(5)表示之結構單元,此外進而包含Y由式(9)表示之結構單元。於進而包含Y由式(9)表示之結構單元之情形時,容易進一步提昇光學膜之耐衝擊性及彈性模數。In a preferred embodiment of the present invention, the plurality of structural units represented by formula (1) preferably comprise a structural unit represented by formula (5), and further comprise a structural unit represented by formula (9). . When the structural unit represented by formula (9) is further included, it is easy to further improve the impact resistance and elastic modulus of the optical film.

聚醯胺醯亞胺樹脂可包含式(30)所表示之結構單元及/或式(31)所表示之結構單元,又,亦可除式(1)所表示之結構單元及視情形包含之式(2)所表示之結構單元以外,還包含式(30)所表示之結構單元及/或式(31)所表示之結構單元。 [化15]

Figure 02_image029
The polyimide imine resin may include the structural unit represented by formula (30) and/or the structural unit represented by formula (31), in addition to the structural unit represented by formula (1) and optionally included In addition to the structural unit represented by the formula (2), the structural unit represented by the formula (30) and/or the structural unit represented by the formula (31) are also included. [化15]
Figure 02_image029

於式(30)中,Y1 表示四價有機基,較佳為表示有機基中之氫原子可經烴基或經氟取代之烴基取代的有機基。作為Y1 ,可例舉:式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基;該式(20)~式(29)所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;以及碳數6以下之四價鏈式烴基。於本發明之一實施方式中,聚醯胺系樹脂可包含複數種Y1 ,複數種Y1 可彼此相同,亦可互不相同。In the formula (30), Y 1 represents a tetravalent organic group, and preferably represents an organic group in which the hydrogen atom in the organic group can be substituted by a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 1 , formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula ( 28) and the group represented by the formula (29); the hydrogen atom in the group represented by the formula (20) to the formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and carbon A tetravalent chain hydrocarbon group with a number of 6 or less. In one embodiment of the present invention, the polyamide resin may include a plurality of Y 1 , and the plurality of Y 1 may be the same as each other or different from each other.

於式(31)中,Y2 表示三價有機基,較佳為表示有機基中之氫原子可經烴基或經氟取代之烴基取代的有機基。作為Y2 ,可例舉:上述式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基之鍵結鍵之任一者被取代為氫原子而成的基;及碳數6以下之三價鏈式烴基。於本發明之一實施方式中,聚醯胺醯亞胺樹脂可包含複數種Y2 ,複數種Y2 可彼此相同,亦可互不相同。In formula (31), Y 2 represents a trivalent organic group, and preferably represents an organic group in which the hydrogen atom in the organic group can be substituted by a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 2 , the above formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) A group in which any one of the bonding bonds of the group represented by the formula (29) is substituted with a hydrogen atom; and a trivalent chain hydrocarbon group with 6 or less carbon atoms. In an embodiment of the present invention, the polyimide resin may include multiple types of Y 2 , and the multiple types of Y 2 may be the same or different from each other.

於式(30)及式(31)中,X1 及X2 彼此獨立地表示二價有機基,較佳為表示有機基中之氫原子可經烴基或經氟取代之烴基取代的有機基。作為X1 及X2 ,可例舉:上述式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;該式(10)~式(18)所表示之基中之氫原子經甲基、氟基、氯基或三氟甲基取代之基;以及碳數6以下之鏈式烴基。In formula (30) and formula (31), X 1 and X 2 independently represent a divalent organic group, and preferably represent an organic group in which a hydrogen atom in the organic group can be substituted by a hydrocarbon group or a fluorine-substituted hydrocarbon group. Examples of X 1 and X 2 include the above-mentioned formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), and formula (17) ) And the group represented by the formula (18); the hydrogen atom in the group represented by the formula (10) to the formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and the number of carbons Chain hydrocarbon group of 6 or less.

於本發明之一實施方式中,聚醯胺系樹脂包含式(1)及/或式(2)所表示之結構單元,以及視情形包含式(30)及/或式(31)所表示之結構單元。又,基於容易提高光學膜之光學特性、耐衝擊性、彈性模數及耐彎曲性之觀點,於上述聚醯胺系樹脂中,基於式(1)及式(2)所表示之結構單元、以及視情形包含之式(30)及式(31)所表示之所有結構單元,式(1)及式(2)所表示之結構單元之比率較佳為80莫耳%以上,更佳為90莫耳%以上,進而較佳為95莫耳%以上。再者,於聚醯胺系樹脂中,基於式(1)及式(2)所表示之結構單元、以及視情形包含之式(30)及式(31)所表示之所有結構單元,式(1)及式(2)所表示之結構單元之比率通常為100%以下。再者,上述比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比算出。In one embodiment of the present invention, the polyamide resin includes the structural unit represented by formula (1) and/or formula (2), and optionally includes the structural unit represented by formula (30) and/or formula (31) Structural units. In addition, based on the viewpoints of easily improving the optical properties, impact resistance, elastic modulus, and bending resistance of the optical film, in the above-mentioned polyamide-based resin, based on the structural units represented by formulas (1) and (2), And as the case may include all the structural units represented by formula (30) and formula (31), the ratio of the structural units represented by formula (1) and formula (2) is preferably 80 mol% or more, more preferably 90 Mole% or more, more preferably 95 mole% or more. Furthermore, in the polyamide-based resin, based on the structural units represented by formula (1) and formula (2), and all the structural units represented by formula (30) and formula (31) included as appropriate, the formula ( The ratio of the structural unit represented by 1) and formula (2) is usually 100% or less. In addition, the above-mentioned ratio can be measured using 1 H-NMR, for example, or it can also be calculated based on the addition ratio of raw materials.

於本發明之一實施方式中,相對於構成光學膜之基材層100質量份,光學膜中所包含之基材層中之聚醯胺系樹脂之含量較佳為10質量份以上,更佳為30質量份以上,進而較佳為50質量份以上,且較佳為99.5質量份以下,更佳為95質量份以下。若聚醯胺系樹脂之含量處於上述範圍內,則容易將光學膜之中間層之厚度及比率(A/B)調整為上述範圍,容易提高耐彎曲性,並且容易提昇光學膜之光學特性、耐衝擊性及彈性模數。In one embodiment of the present invention, relative to 100 parts by mass of the base material layer constituting the optical film, the content of the polyamide resin in the base material layer contained in the optical film is preferably 10 parts by mass or more, more preferably It is 30 parts by mass or more, more preferably 50 parts by mass or more, and preferably 99.5 parts by mass or less, more preferably 95 parts by mass or less. If the content of the polyamide resin is within the above range, it is easy to adjust the thickness and ratio (A/B) of the intermediate layer of the optical film to the above range, it is easy to improve the bending resistance, and it is easy to improve the optical properties of the optical film. Impact resistance and elastic modulus.

基於容易將光學膜之中間層之厚度及比率(A/B)調整為上述範圍之觀點,以及基於容易提高耐衝擊性、彈性模數及耐彎曲性之觀點,聚醯胺系樹脂之重量平均分子量以標準聚苯乙烯換算,較佳為200,000以上,更佳為230,000以上,進而較佳為250,000以上,進而更佳為270,000以上,尤佳為280,000以上。又,基於更容易提高製備清漆時之聚醯胺系樹脂粉體之溶解性之觀點,以及基於容易提昇光學膜之延伸性及加工性之觀點,聚醯胺系樹脂之重量平均分子量較佳為1,000,000以下,更佳為800,000以下,進而較佳為700,000以下,進而更佳為500,000以下。重量平均分子量例如可進行凝膠滲透層析法(以下,有時記為GPC)測定,藉由標準聚苯乙烯換算而求出,例如可藉由實施例所記載之方法算出。Based on the viewpoint that it is easy to adjust the thickness and ratio (A/B) of the intermediate layer of the optical film to the above range, and based on the viewpoint that it is easy to improve impact resistance, elastic modulus and bending resistance, the weight of polyamide resin is average The molecular weight is calculated in terms of standard polystyrene, and is preferably 200,000 or more, more preferably 230,000 or more, still more preferably 250,000 or more, still more preferably 270,000 or more, and particularly preferably 280,000 or more. In addition, from the viewpoint that it is easier to improve the solubility of the polyamide resin powder in the preparation of varnishes, and from the viewpoint that it is easier to improve the extensibility and processability of the optical film, the weight average molecular weight of the polyamide resin is preferably 1,000,000 or less, more preferably 800,000 or less, still more preferably 700,000 or less, and still more preferably 500,000 or less. The weight average molecular weight can be measured by gel permeation chromatography (hereinafter, sometimes referred to as GPC), and can be calculated by standard polystyrene conversion, and can be calculated, for example, by the method described in the examples.

於本發明之一個較佳實施方式中,於聚醯胺系樹脂為聚醯胺醯亞胺樹脂之情形時,相對於式(1)所表示之結構單元1莫耳,該聚醯胺醯亞胺樹脂中之式(2)所表示之結構單元之含量較佳為0.1莫耳以上,更佳為0.5莫耳以上,進而較佳為1.0莫耳以上,進而更佳為1.5莫耳以上,且較佳為6.0莫耳以下,更佳為5.0莫耳以下,進而較佳為4.5莫耳以下。若式(2)所表示之結構單元之含量為上述下限以上,則容易提高光學膜之耐衝擊性及彈性模數。又,若式(2)所表示之結構單元之含量為上述上限以下,則容易抑制因式(2)中之醯胺鍵間之氫鍵而導致增黏,容易提昇光學膜之加工性。In a preferred embodiment of the present invention, when the polyamide resin is a polyamide resin, relative to 1 mol of the structural unit represented by formula (1), the polyamide resin The content of the structural unit represented by the formula (2) in the amine resin is preferably 0.1 mol or more, more preferably 0.5 mol or more, still more preferably 1.0 mol or more, and even more preferably 1.5 mol or more, and It is preferably 6.0 mol or less, more preferably 5.0 mol or less, and still more preferably 4.5 mol or less. If the content of the structural unit represented by formula (2) is more than the above lower limit, it is easy to improve the impact resistance and elastic modulus of the optical film. Moreover, if the content of the structural unit represented by the formula (2) is below the above upper limit, it is easy to suppress the increase in viscosity due to the hydrogen bonding between the amide bonds in the formula (2), and it is easy to improve the processability of the optical film.

於本發明之一個較佳實施方式中,聚醯胺系樹脂例如可包含可藉由上述含氟取代基等導入之氟原子等鹵素原子。於聚醯胺系樹脂包含鹵素原子之情形時,容易提昇光學膜之彈性模數,且容易降低聚醯胺系樹脂粉體及光學膜之黃度。若光學膜之彈性模數較高,則容易抑制產生損傷及皺褶等。又,若光學膜之黃度較低,則容易提昇該膜之透明性及視認性。鹵素原子較佳為氟原子。作為用以使聚醯胺系樹脂含有氟原子之較佳含氟取代基,例如可例舉氟基及三氟甲基。In a preferred embodiment of the present invention, the polyamide-based resin may include, for example, halogen atoms such as fluorine atoms that can be introduced by the above-mentioned fluorine-containing substituents and the like. When the polyamide resin contains halogen atoms, it is easy to increase the elastic modulus of the optical film, and it is easy to reduce the yellowness of the polyamide resin powder and the optical film. If the elastic modulus of the optical film is high, it is easy to suppress the occurrence of damage and wrinkles. In addition, if the yellowness of the optical film is low, the transparency and visibility of the film can be easily improved. The halogen atom is preferably a fluorine atom. As a preferable fluorine-containing substituent for making the polyamide resin contain a fluorine atom, a fluorine group and a trifluoromethyl group can be mentioned, for example.

分別以聚醯胺系樹脂之質量作為基準,聚醯胺系樹脂中之鹵素原子之含量較佳為1~40質量%,更佳為5~40質量%,進而較佳為5~30質量%。若鹵素原子之含量為上述下限以上,則容易進一步提昇光學膜之彈性模數,降低吸水率,進一步降低聚醯胺系樹脂粉體及光學膜之黃度,進一步提昇透明性及視認性。若鹵素原子之含量為上述上限以下,則容易進行合成。Based on the quality of the polyamide resin as a reference, the content of halogen atoms in the polyamide resin is preferably 1-40% by mass, more preferably 5-40% by mass, and still more preferably 5-30% by mass . If the content of halogen atoms is above the above lower limit, it is easy to further increase the elastic modulus of the optical film, reduce the water absorption rate, further reduce the yellowness of the polyamide resin powder and the optical film, and further improve the transparency and visibility. If the content of halogen atoms is less than the above upper limit, synthesis is easy.

聚醯胺醯亞胺樹脂之醯亞胺化率較佳為90%以上,更佳為93%以上,進而較佳為96%以上。基於容易提高光學膜之光學特性之觀點,醯亞胺化率較佳為上述下限以上。又,醯亞胺化率之上限為100%以下。醯亞胺化率表示聚醯胺醯亞胺樹脂中之醯亞胺鍵之莫耳量相對於聚醯胺醯亞胺樹脂中之源自四羧酸化合物之結構單元之莫耳量之2倍之值的比率。再者,於聚醯胺醯亞胺樹脂包含三羧酸化合物之情形時,醯亞胺化率表示聚醯胺醯亞胺樹脂中之醯亞胺鍵之莫耳量相對於聚醯胺醯亞胺樹脂中之源自四羧酸化合物之結構單元之莫耳量之2倍之值與源自三羧酸化合物之結構單元之莫耳量之合計的比率。又,醯亞胺化率可藉由IR(infrared radiation,紅外輻射)法、NMR(nuclear magnetic resonance,核磁共振)法等求出。The imidization rate of the polyimide resin is preferably 90% or more, more preferably 93% or more, and still more preferably 96% or more. From the viewpoint that it is easy to improve the optical properties of the optical film, the imidization rate is preferably at least the above lower limit. In addition, the upper limit of the imidization rate is 100% or less. The rate of imidization means that the molar amount of the amide bond in the polyamide resin is 2 times the molar amount of the structural unit derived from the tetracarboxylic acid compound in the polyamide resin. The ratio of the value. Furthermore, in the case where the polyamide resin contains a tricarboxylic acid compound, the imidization rate represents the molar amount of the amide bond in the polyamide resin relative to the polyamide resin The ratio of the value of twice the molar amount of the structural unit derived from the tetracarboxylic acid compound to the total molar amount of the structural unit derived from the tricarboxylic acid compound in the amine resin. In addition, the imidization rate can be obtained by IR (infrared radiation) method, NMR (nuclear magnetic resonance, nuclear magnetic resonance) method, or the like.

聚醯胺系樹脂可使用市售品。作為聚醯胺樹脂之市售品,例如可例舉:三菱瓦斯化學股份有限公司製造之Neopulim(註冊商標)、河村產業股份有限公司製造之KPI-MX300F等。Commercially available products can be used for the polyamide resin. As a commercially available product of polyamide resin, for example, Neopulim (registered trademark) manufactured by Mitsubishi Gas Chemical Co., Ltd., KPI-MX300F manufactured by Kawamura Sangyo Co., Ltd., etc. may be mentioned.

<樹脂之製造方法> 聚醯胺樹脂例如可以二胺化合物及二羧酸化合物作為主原料製造。聚醯胺醯亞胺樹脂及聚醯胺醯亞胺前驅物樹脂例如可以四羧酸化合物、二羧酸化合物及二胺化合物作為主原料製造。此處,二羧酸化合物較佳為至少包含式(3'')所表示之化合物。 [化16]

Figure 02_image031
[式(3'')中,R1 ~R8 彼此獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R1 ~R8 中所包含之氫原子彼此獨立地可經鹵素原子取代, A表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R9 )-, R9 表示氫原子、可經鹵素原子取代之碳數1~12之一價烴基, m為0~4之整數, R31 及R32 彼此獨立地表示羥基、甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基或氯原子。]<Method for producing resin> Polyamide resin can be produced, for example, from a diamine compound and a dicarboxylic acid compound as main raw materials. The polyamide imide resin and the polyamide imide precursor resin can be produced, for example, from a tetracarboxylic acid compound, a dicarboxylic acid compound, and a diamine compound as main raw materials. Here, the dicarboxylic acid compound preferably contains at least the compound represented by formula (3''). [化16]
Figure 02_image031
[In formula (3''), R 1 to R 8 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R The hydrogen atoms contained in 1 to R 8 can be independently substituted by halogen atoms, and A represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-,- C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 9 )-, R 9 represents a hydrogen atom, which can be substituted by a halogen atom A monovalent hydrocarbon group with 1 to 12 carbon atoms, m is an integer of 0 to 4, R 31 and R 32 independently represent hydroxyl, methoxy, ethoxy, n-propoxy, isopropoxy, and n-butoxy Group, isobutoxy group, second butoxy group, third butoxy group or chlorine atom. ]

於本發明之一個較佳實施方式中,二羧酸化合物係由m為0之式(3'')表示之化合物。作為二羧酸化合物,更佳為除使用m為0之式(3'')所表示之化合物以外,亦使用A為氧原子之式(3'')所表示之化合物。又,於另一較佳實施方式中,二羧酸化合物係R31 及R32 為氯原子之式(3'')所表示之化合物。又,可使用二異氰酸酯化合物代替二胺化合物。In a preferred embodiment of the present invention, the dicarboxylic acid compound is a compound represented by formula (3") where m is 0. As the dicarboxylic acid compound, in addition to the compound represented by the formula (3'') in which m is 0, it is more preferable to use the compound represented by the formula (3'') in which A is an oxygen atom. Furthermore, in another preferred embodiment, the dicarboxylic acid compound is a compound represented by formula (3") in which R 31 and R 32 are chlorine atoms. In addition, a diisocyanate compound may be used instead of the diamine compound.

作為製造樹脂時使用之二胺化合物,例如可例舉:脂肪族二胺、芳香族二胺及該等之混合物。再者,於本實施方式中,「芳香族二胺」表示胺基直接鍵結於芳香環之二胺,其結構之一部分可包含脂肪族基或其他取代基。該芳香環可為單環,亦可為縮合環,可例舉:苯環、萘環、蒽環及茀環等,但並不限定於該等。其中,較佳為苯環。又,「脂肪族二胺」表示胺基直接鍵結於脂肪族基之二胺,其結構之一部分可包含芳香環或其他取代基。As the diamine compound used when manufacturing resin, for example, aliphatic diamine, aromatic diamine, and mixtures of these can be mentioned. Furthermore, in this embodiment, "aromatic diamine" means a diamine in which an amine group is directly bonded to an aromatic ring, and a part of its structure may include an aliphatic group or other substituents. The aromatic ring may be a monocyclic ring or a condensed ring, and examples thereof include a benzene ring, a naphthalene ring, an anthracene ring, and a sulphur ring, but are not limited to these. Among them, a benzene ring is preferred. In addition, "aliphatic diamine" refers to a diamine in which an amine group is directly bonded to an aliphatic group, and a part of its structure may include an aromatic ring or other substituents.

作為脂肪族二胺,例如可例舉:六亞甲基二胺等非環式脂肪族二胺;以及1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、降𦯉烷二胺及4,4'-二胺基二環己基甲烷等環式脂肪族二胺等。該等可單獨使用或組合2種以上而使用。As aliphatic diamines, for example, acyclic aliphatic diamines such as hexamethylene diamine; and 1,3-bis(aminomethyl)cyclohexane, 1,4-bis(amino) Cycloaliphatic diamines such as methyl)cyclohexane, noralkylene diamine and 4,4'-diaminodicyclohexylmethane, etc. These can be used individually or in combination of 2 or more types.

作為芳香族二胺,例如可例舉:對苯二胺、間苯二胺、2,4-甲苯二胺、間苯二甲胺、對苯二甲胺、1,5-二胺基萘、2,6-二胺基萘等具有1個芳香環之芳香族二胺;4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯基醚、3,4'-二胺基二苯基醚、3,3'-二胺基二苯基醚、4,4'-二胺基二苯基碸、3,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基二苯基(有時記為TFMB)、4,4'-雙(4-胺基苯氧基)聯苯、9,9-雙(4-胺基苯基)茀、9,9-雙(4-胺基-3-甲基苯基)茀、9,9-雙(4-胺基-3-氯苯基)茀、9,9-雙(4-胺基-3-氟苯基)茀等具有2個以上芳香環之芳香族二胺。該等可單獨使用或組合2種以上而使用。As aromatic diamines, for example, p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene and other aromatic diamines with one aromatic ring; 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4' -Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3, 4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-amino) Phenoxy) benzene, bis[4-(4-aminophenoxy)phenyl] ash, bis[4-(3-aminophenoxy)phenyl] ash, 2,2-bis[4- (4-aminophenoxy)phenyl)propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, 2,2 '-Bis(trifluoromethyl)-4,4'-diaminodiphenyl (sometimes referred to as TFMB), 4,4'-bis(4-aminophenoxy)biphenyl, 9,9 -Bis (4-aminophenyl) pyrene, 9,9-bis(4-amino-3-methylphenyl) pyrene, 9,9-bis(4-amino-3-chlorophenyl) pyrene , 9,9-bis(4-amino-3-fluorophenyl) pyridine and other aromatic diamines with more than two aromatic rings. These can be used individually or in combination of 2 or more types.

作為芳香族二胺,較佳為可例舉:4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯基醚、3,3'-二胺基二苯基醚、4,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、TFMB、4,4'-雙(4-胺基苯氧基)聯苯,更佳為可例舉:4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯基醚、4,4'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、TFMB、4,4'-雙(4-胺基苯氧基)聯苯。該等可單獨使用或組合2種以上而使用。As the aromatic diamine, preferably, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl Ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 1,4-bis(4-amine Phenyloxy)benzene, bis[4-(4-aminophenoxy)phenyl]sulfuric acid, bis[4-(3-aminophenoxy)phenyl]sulfuric acid, 2,2-bis[4 -(4-Aminophenoxy)phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, TFMB, 4,4'-bis(4-aminophenoxy)biphenyl, more preferably, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane , 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 1,4-bis(4-aminophenoxy)benzene, bis[4-(4- Aminophenoxy) phenyl] chrysene, 2,2-bis[4-(4-aminophenoxy) phenyl] propane, 2,2'-dimethylbenzidine, TFMB, 4,4' -Bis(4-aminophenoxy)biphenyl. These can be used individually or in combination of 2 or more types.

於上述二胺化合物中,就光學膜之高彈性模數、高透明性、高柔軟性、高耐彎曲性及低著色性之觀點而言,較佳為使用選自由具有聯苯結構之芳香族二胺所組成之群中之1種以上。更佳為使用選自由2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)聯苯胺、4,4'-雙(4-胺基苯氧基)聯苯及4,4'-二胺基二苯基醚所組成之群中之1種以上,進而更佳為使用TFMB。Among the above-mentioned diamine compounds, from the viewpoints of high elastic modulus, high transparency, high flexibility, high bending resistance, and low coloring properties of the optical film, it is preferable to use aromatic compounds having a biphenyl structure. One or more of the group consisting of diamines. More preferably, use selected from 2,2'-dimethylbenzidine, 2,2'-bis(trifluoromethyl)benzidine, 4,4'-bis(4-aminophenoxy)biphenyl and At least one of the group consisting of 4,4'-diaminodiphenyl ether, and it is more preferable to use TFMB.

作為製造樹脂時所使用之四羧酸化合物,可例舉:芳香族四羧酸二酐等芳香族四羧酸化合物;及脂肪族四羧酸二酐等脂肪族四羧酸化合物等。四羧酸化合物可單獨使用,亦可組合2種以上而使用。四羧酸化合物除二酐以外,亦可為醯氯化合物等四羧酸化合物相關物。Examples of the tetracarboxylic acid compound used in the production of the resin include aromatic tetracarboxylic acid compounds such as aromatic tetracarboxylic dianhydride; and aliphatic tetracarboxylic acid compounds such as aliphatic tetracarboxylic dianhydride. The tetracarboxylic acid compound may be used alone or in combination of two or more kinds. In addition to the dianhydride, the tetracarboxylic acid compound may also be a tetracarboxylic acid compound related product such as a chlorine compound.

作為芳香族四羧酸二酐之具體例,可例舉:非縮合多環式芳香族四羧酸二酐、單環式芳香族四羧酸二酐及縮合多環式芳香族四羧酸二酐。作為非縮合多環式芳香族四羧酸二酐,例如可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐(有時記為BPDA)、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(有時記為6FDA)、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐、4,4'-(間苯二氧基)二鄰苯二甲酸二酐。又,作為單環式芳香族四羧酸二酐,例如可例舉1,2,4,5-苯四羧酸二酐,作為縮合多環式芳香族四羧酸二酐,例如可例舉2,3,6,7-萘四羧酸二酐。Specific examples of aromatic tetracarboxylic dianhydrides include: non-condensed polycyclic aromatic tetracarboxylic dianhydrides, monocyclic aromatic tetracarboxylic dianhydrides, and condensed polycyclic aromatic tetracarboxylic dianhydrides anhydride. Examples of non-condensed polycyclic aromatic tetracarboxylic dianhydrides include 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic acid Dianhydride, 2,2',3,3'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride (sometimes referred to as BPDA), 2, 2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl) ) Propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenoxyphenyl)propane dianhydride, 4,4' -(Hexafluoroisopropylidene)diphthalic dianhydride (sometimes referred to as 6FDA), 1,2-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis( 2,3-Dicarboxyphenyl)ethane dianhydride, 1,2-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane Alkyl dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(p-phenylenedioxy)diphthalate Formic acid dianhydride, 4,4'-(isophthalic acid dianhydride). In addition, as the monocyclic aromatic tetracarboxylic dianhydride, for example, 1,2,4,5-benzenetetracarboxylic dianhydride can be exemplified, and as the condensed polycyclic aromatic tetracarboxylic dianhydride, for example, 2,3,6,7-Naphthalenetetracarboxylic dianhydride.

其中,較佳為可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、BPDA、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、6FDA、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐及4,4'-(間苯二氧基)二鄰苯二甲酸二酐,更佳為可例舉:4,4'-氧二鄰苯二甲酸二酐、BPDA、2,2',3,3'-聯苯四羧酸二酐、6FDA、雙(3,4-二羧基苯基)甲烷二酐及4,4'-(對苯二氧基)二鄰苯二甲酸二酐。該等可單獨使用或組合2種以上而使用。Among them, preferred examples include 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2',3, 3'-benzophenone tetracarboxylic dianhydride, BPDA, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic acid Dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4 -Dicarboxyphenoxyphenyl)propane dianhydride, 6FDA, 1,2-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis(2,3-dicarboxyphenyl) Ethane dianhydride, 1,2-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride, bis(3,4 -Dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(terephthaloxy)diphthalic dianhydride and 4,4'- (Isophthalenedioxy)diphthalic dianhydride, more preferably 4,4'-oxydiphthalic dianhydride, BPDA, 2,2',3,3'-biphenyl Tetracarboxylic dianhydride, 6FDA, bis(3,4-dicarboxyphenyl)methane dianhydride, and 4,4'-(terephthalic acid) dianhydride. These can be used individually or in combination of 2 or more types.

作為脂肪族四羧酸二酐,可例舉環式或非環式脂肪族四羧酸二酐。環式脂肪族四羧酸二酐係具有脂環式烴結構之四羧酸二酐,作為其具體例,可例舉:1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐等環烷烴四羧酸二酐;雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、二環己基-3,3',4,4'-四羧酸二酐及該等之位置異構物。該等可單獨使用或組合2種以上而使用。作為非環式脂肪族四羧酸二酐之具體例,可例舉1,2,3,4-丁烷四羧酸二酐及1,2,3,4-戊烷四羧酸二酐等,該等可單獨使用或組合2種以上而使用。又,亦可組合使用環式脂肪族四羧酸二酐及非環式脂肪族四羧酸二酐。The aliphatic tetracarboxylic dianhydride may, for example, be a cyclic or acyclic aliphatic tetracarboxylic dianhydride. Cycloaliphatic tetracarboxylic dianhydride is a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure. Specific examples include: 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 1 ,2,3,4-Cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride and other cycloalkane tetracarboxylic dianhydrides; Bicyclo[2.2.2]oct-7 -En-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyl-3,3',4,4'-tetracarboxylic dianhydride and their positional isomers. These can be used individually or in combination of 2 or more types. As a specific example of acyclic aliphatic tetracarboxylic dianhydride, 1,2,3,4-butane tetracarboxylic dianhydride and 1,2,3,4-pentane tetracarboxylic dianhydride, etc. may be mentioned These can be used alone or in combination of two or more kinds. Moreover, cycloaliphatic tetracarboxylic dianhydride and acyclic aliphatic tetracarboxylic dianhydride can also be used in combination.

於上述四羧酸二酐中,就光學膜之高耐衝擊性、高彈性模數、高表面硬度、高透明性、高柔軟性、高耐彎曲性及低著色性之觀點而言,更佳為可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、BPDA、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、6FDA及該等之混合物,進而較佳為可例舉:BPDA及6FDA以及該等之混合物,進而更佳為可例舉6FDA及BPDA。Among the above-mentioned tetracarboxylic dianhydrides, the optical film is more preferable in terms of high impact resistance, high modulus of elasticity, high surface hardness, high transparency, high flexibility, high bending resistance and low colorability. Examples are: 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, BPDA, 2,2',3,3' -Biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 6FDA and These mixtures are further preferably exemplified: BPDA and 6FDA and their mixtures, and more preferably, 6FDA and BPDA can be exemplified.

作為製造樹脂時所使用之二羧酸化合物,較佳為使用對苯二甲酸、間苯二甲酸、4,4'-氧雙苯甲酸或該等之醯氯化合物。除對苯二甲酸、間苯二甲酸、4,4'-氧雙苯甲酸或該等之醯氯化合物以外,亦可使用其他二羧酸化合物。作為其他二羧酸化合物,可例舉:芳香族二羧酸、脂肪族二羧酸及該等之相關醯氯化合物、酸酐等,可組合2種以上而使用。作為具體例,可例舉:間苯二甲酸;萘二羧酸;4,4'-聯苯二羧酸;3,3'-聯苯二羧酸;碳數為8以下之鏈式烴之二羧酸化合物、及2個苯甲酸經單鍵、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結之化合物、以及該等之醯氯化合物。作為具體例,較佳為4,4'-氧雙(苯甲醯氯)(有時記為OBBC)、對苯二甲醯氯(有時記為TPC)或間苯二甲醯氯,進而較佳為組合使用OBBC與TPC。As the dicarboxylic acid compound used in the production of the resin, it is preferable to use terephthalic acid, isophthalic acid, 4,4'-oxydibenzoic acid, or these chlorinated compounds. In addition to terephthalic acid, isophthalic acid, 4,4'-oxybisbenzoic acid or these chlorinated compounds, other dicarboxylic acid compounds may also be used. Examples of other dicarboxylic acid compounds include aromatic dicarboxylic acids, aliphatic dicarboxylic acids, and these related chlorinated compounds, acid anhydrides, etc., and two or more of them can be used in combination. Specific examples include: isophthalic acid; naphthalenedicarboxylic acid; 4,4'-biphenyldicarboxylic acid; 3,3'-biphenyldicarboxylic acid; A dicarboxylic acid compound, and a compound in which two benzoic acids are linked via a single bond, -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -or phenylene, and These chlorinated compounds. As a specific example, 4,4'-oxybis(benzoic acid chloride) (sometimes referred to as OBBC), terephthalic acid chloride (sometimes referred to as TPC) or isophthalic acid chloride is preferred, and further Preferably, OBBC and TPC are used in combination.

再者,聚醯胺醯亞胺樹脂亦可於不損害光學膜之各種物性之範圍內,除上述四羧酸化合物以外,進而使四羧酸及三羧酸以及該等之酐及衍生物進行反應而成。Furthermore, the polyamide imide resin can also be used in addition to the above-mentioned tetracarboxylic acid compounds within the range of not damaging the various physical properties of the optical film, and further the tetracarboxylic acid, tricarboxylic acid, and these anhydrides and derivatives The reaction becomes.

作為四羧酸,可例舉上述四羧酸化合物之酐之水加成物。Examples of the tetracarboxylic acid include water adducts of the anhydrides of the above-mentioned tetracarboxylic acid compounds.

作為三羧酸化合物,可例舉:芳香族三羧酸、脂肪族三羧酸及該等之相關醯氯化合物、酸酐等,可組合2種以上而使用。作為其具體例,可例舉:1,2,4-苯三羧酸之酐;1,3,5-苯三羧酸之酐;2,3,6-萘三羧酸-2,3-酐;鄰苯二甲酸酐與苯甲酸經單鍵、-O-、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結之化合物。The tricarboxylic acid compound may, for example, be aromatic tricarboxylic acid, aliphatic tricarboxylic acid, and these related chlorinated compounds, acid anhydrides, etc., and two or more of them may be used in combination. As a specific example, anhydrides of 1,2,4-benzenetricarboxylic acid; anhydrides of 1,3,5-benzenetricarboxylic acid; 2,3,6-naphthalenetricarboxylic acid-2,3- Anhydride; Phthalic anhydride and benzoic acid are linked via single bond, -O-, -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -or phenylene The compound.

製造樹脂時,二胺化合物、四羧酸化合物及/或二羧酸化合物之使用量可根據所需之聚醯胺系樹脂之各結構單元之比率適當選擇。When manufacturing the resin, the usage amount of the diamine compound, the tetracarboxylic acid compound and/or the dicarboxylic acid compound can be appropriately selected according to the required ratio of each structural unit of the polyamide resin.

製造樹脂時,二胺化合物、四羧酸化合物及二羧酸化合物之反應溫度並無特別限定,例如為5~350℃,較佳為20~200℃,更佳為25~100℃。反應時間亦無特別限定,例如為30分鐘~10小時左右。可視需要於惰性氛圍或減壓之條件下進行反應。於較佳形態中,反應係於常壓及/或惰性氣體氛圍下攪拌而進行。又,反應較佳為於具有反應惰性之溶劑中進行。作為溶劑,並無特別限定,只要不會對反應造成影響即可,例如可例舉:水、甲醇、乙醇、乙二醇、異丙醇、丙二醇、乙二醇甲醚、乙二醇丁醚、1-甲氧基-2-丙醇、2-丁氧基乙醇、丙二醇單甲醚等醇系溶劑;乙酸乙酯、乙酸丁酯、乙二醇甲醚乙酸酯、GBL、γ-戊內酯、丙二醇甲醚乙酸酯、乳酸乙酯等酯系溶劑;丙酮、甲基乙基酮、環戊酮、環己酮、2-庚酮、甲基異丁基酮等酮系溶劑;戊烷、己烷、庚烷等脂肪族烴溶劑;乙基環己烷等脂環式烴溶劑;甲苯、二甲苯等芳香族烴溶劑;乙腈等腈系溶劑;四氫呋喃及二甲氧基乙烷等醚系溶劑;氯仿及氯苯等含氯溶劑;DMAc、DMF等醯胺系溶劑;二甲基碸、DMSO、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及該等之組合等。其中,就溶解性之觀點而言,適宜使用醯胺系溶劑。When the resin is produced, the reaction temperature of the diamine compound, the tetracarboxylic acid compound, and the dicarboxylic acid compound is not particularly limited, and is, for example, 5 to 350°C, preferably 20 to 200°C, and more preferably 25 to 100°C. The reaction time is also not particularly limited, and is, for example, about 30 minutes to 10 hours. The reaction can be carried out in an inert atmosphere or under reduced pressure as needed. In a preferred embodiment, the reaction is carried out with stirring under normal pressure and/or an inert gas atmosphere. In addition, the reaction is preferably carried out in a solvent having reaction inertness. The solvent is not particularly limited, as long as it does not affect the reaction. Examples include water, methanol, ethanol, ethylene glycol, isopropanol, propylene glycol, ethylene glycol methyl ether, and ethylene glycol butyl ether. , 1-methoxy-2-propanol, 2-butoxyethanol, propylene glycol monomethyl ether and other alcoholic solvents; ethyl acetate, butyl acetate, ethylene glycol methyl ether acetate, GBL, γ-pentan Lactone, propylene glycol methyl ether acetate, ethyl lactate and other ester solvents; acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, methyl isobutyl ketone and other ketone solvents; Aliphatic hydrocarbon solvents such as pentane, hexane and heptane; alicyclic hydrocarbon solvents such as ethylcyclohexane; aromatic hydrocarbon solvents such as toluene and xylene; nitrile solvents such as acetonitrile; tetrahydrofuran and dimethoxyethane Ether solvents; chlorinated solvents such as chloroform and chlorobenzene; amide solvents such as DMAc and DMF; sulfur-containing solvents such as dimethyl sulfide, DMSO, and cyclobutyl sulfide; carbonic acid such as ethylene carbonate and propylene carbonate Ester solvents; and combinations of these. Among them, from the viewpoint of solubility, amide-based solvents are suitably used.

於製造聚醯胺醯亞胺樹脂時之醯亞胺化步驟中,可於醯亞胺化觸媒之存在下進行醯亞胺化。作為醯亞胺化觸媒,例如可例舉:三丙基胺、二丁基丙基胺、乙基二丁基胺等脂肪族胺;N-乙基哌啶、N-丙基哌啶、N-丁基吡咯啶、N-丁基哌啶及N-丙基六氫氮呯等脂環式胺(單環式);氮雜雙環[2.2.1]庚烷、氮雜雙環[3.2.1]辛烷、氮雜雙環[2.2.2]辛烷及氮雜雙環[3.2.2]壬烷等脂環式胺(多環式);以及吡啶、2-甲基吡啶(2-picoline)、3-甲基吡啶(3-picoline)、4-甲基吡啶(4-picoline)、2-乙基吡啶、3-乙基吡啶、4-乙基吡啶、2,4-二甲基吡啶、2,4,6-三甲基吡啶、3,4-環戊烯并吡啶、5,6,7,8-四氫異喹啉及異喹啉等芳香族胺。又,基於容易促進醯亞胺化反應之觀點,較佳為與醯亞胺化觸媒一起使用酸酐。酸酐可例舉用於醯亞胺化反應之慣用酸酐等,作為其具體例,可例舉:乙酸酐、丙酸酐、丁酸酐等脂肪族酸酐;鄰苯二甲酸等芳香族酸酐等。In the imidization step in the production of the polyimidimide resin, the imidization can be carried out in the presence of an imidization catalyst. As the imidization catalyst, for example, aliphatic amines such as tripropylamine, dibutylpropylamine, and ethyldibutylamine; N-ethylpiperidine, N-propylpiperidine, Alicyclic amines (monocyclic) such as N-butylpyrrolidine, N-butylpiperidine, and N-propylhexahydroazepine; azabicyclo[2.2.1]heptane, azabicyclo[3.2. 1] Octane, azabicyclo[2.2.2]octane and azabicyclo[3.2.2]nonane and other alicyclic amines (polycyclic); and pyridine, 2-picoline (2-picoline) , 3-picoline, 4-picoline, 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2,4-lutidine, Aromatic amines such as 2,4,6-trimethylpyridine, 3,4-cyclopentenopyridine, 5,6,7,8-tetrahydroisoquinoline and isoquinoline. In addition, from the viewpoint that it is easy to promote the imidization reaction, it is preferable to use an acid anhydride together with the imidization catalyst. As the acid anhydride, commonly used acid anhydrides used in the imidization reaction may be mentioned, and specific examples thereof may include aliphatic acid anhydrides such as acetic anhydride, propionic anhydride, and butyric anhydride; aromatic acid anhydrides such as phthalic acid and the like.

聚醯胺系樹脂可藉由慣用方法、例如過濾、濃縮、提取、晶析、再結晶、管柱層析法等分離方法、或組合該等之分離方法進行分離精製而單離,於較佳形態中,可於包含透明聚醯胺系樹脂之反應液中加入大量甲醇等醇,使樹脂析出,進行濃縮、過濾、乾燥等,藉此進行單離。Polyamide resins can be separated and purified by conventional methods, such as filtration, concentration, extraction, crystallization, recrystallization, column chromatography and other separation methods, or a combination of these separation methods. In the form, a large amount of alcohol such as methanol is added to the reaction liquid containing the transparent polyamide-based resin to precipitate the resin, and the separation can be performed by performing concentration, filtration, drying, etc.

藉由本發明之製造方法所製造之聚醯胺系樹脂粉體例如可用作光學構件。作為光學構件,例如可例舉光學膜。該光學構件由於柔軟性、耐彎曲性及表面硬度優異,故而適合作為圖像顯示裝置之前面板、尤其是可撓性顯示器之前面板即窗膜。光學構件可為單層,亦可為複層。於光學構件為複層之情形時,各層可為相同組成,亦可為不同組成。The polyamide resin powder produced by the production method of the present invention can be used, for example, as an optical member. As an optical member, an optical film can be mentioned, for example. Since this optical member is excellent in flexibility, bending resistance, and surface hardness, it is suitable as a window film that is a front panel of an image display device, particularly a front panel of a flexible display. The optical member may be a single layer or a multiple layer. When the optical member is a multiple layer, each layer may have the same composition or different compositions.

於將藉由本發明之製造方法所製造之聚醯胺系樹脂粉體用作光學構件之情形時,相對於光學構件之總質量,光學構件中之聚醯胺系樹脂之含有率較佳為40質量%以上,更佳為50質量%以上,進而較佳為70質量%以上,進而更佳為80質量%以上,尤其為90質量%以上。若聚醯胺系樹脂之含有率為上述下限以上,則光學構件之耐彎曲性良好。再者,相對於光學構件之總質量,光學構件中之聚醯胺系樹脂之含有率通常為100質量%以下。When the polyamide-based resin powder produced by the manufacturing method of the present invention is used as an optical member, the content of the polyamide-based resin in the optical member is preferably 40 relative to the total mass of the optical member. Mass% or more, more preferably 50% by mass or more, still more preferably 70% by mass or more, still more preferably 80% by mass or more, especially 90% by mass or more. If the content of the polyamide-based resin is greater than or equal to the above lower limit, the bending resistance of the optical member is good. Furthermore, relative to the total mass of the optical member, the content of the polyamide resin in the optical member is usually 100% by mass or less.

(無機材料) 於光學構件中,除聚醯胺系樹脂以外,可進而含有無機粒子等無機材料。作為無機材料,例如可例舉:氧化鈦粒子、氧化鋁粒子、氧化鋯粒子、二氧化矽粒子等無機粒子;及原矽酸四乙酯等四級烷氧基矽烷等矽化合物等。就包含用以製造光學構件之聚醯胺系樹脂之清漆之穩定性的觀點而言,無機材料較佳為無機粒子,尤佳為二氧化矽粒子。無機粒子彼此可經具有矽氧烷鍵之分子鍵結。(Inorganic materials) In addition to the polyamide-based resin, the optical member may further contain inorganic materials such as inorganic particles. Examples of the inorganic material include inorganic particles such as titanium oxide particles, aluminum oxide particles, zirconium oxide particles, and silica particles; and silicon compounds such as quaternary alkoxysilanes such as tetraethyl orthosilicate. From the viewpoint of the stability of the varnish containing the polyamide-based resin used to manufacture the optical member, the inorganic material is preferably inorganic particles, and particularly preferably silica particles. Inorganic particles can be bonded to each other via molecules with siloxane bonds.

就光學構件之透明性、機械物性及無機粒子之凝集抑制之觀點而言,無機粒子之平均一次粒徑通常為1~100 nm,較佳為5~80 nm,更佳為7~50 nm,進而較佳為10~30 nm。於本發明中,平均一次粒徑可藉由利用穿透式電子顯微鏡測定定向直徑之10點平均值而確定。From the viewpoints of the transparency of the optical member, the mechanical properties, and the inhibition of the aggregation of inorganic particles, the average primary particle size of the inorganic particles is usually 1-100 nm, preferably 5-80 nm, more preferably 7-50 nm, More preferably, it is 10 to 30 nm. In the present invention, the average primary particle size can be determined by measuring the 10-point average of the orientation diameter using a transmission electron microscope.

以光學構件之總質量作為基準,光學構件中之無機材料之含有率較佳為0質量%以上90質量%以下,更佳為0.01質量%以上60質量%以下,進而較佳為5質量%以上40質量%以下。若無機材料之含有率處於上述範圍內,則有容易兼顧光學構件之透明性及機械物性之趨勢。Based on the total mass of the optical component, the content of the inorganic material in the optical component is preferably 0 mass% or more and 90 mass% or less, more preferably 0.01 mass% or more and 60 mass% or less, and more preferably 5 mass% or more 40% by mass or less. If the content of the inorganic material is within the above range, it tends to be easy to balance the transparency and mechanical properties of the optical member.

(紫外線吸收劑) 光學構件可含有1種或2種以上之紫外線吸收劑。紫外線吸收劑可自樹脂材料之領域中通常用作紫外線吸收劑者中適當選擇。紫外線吸收劑可包含吸收波長400 nm以下之光之化合物。作為紫外線吸收劑,例如可例舉選自由二苯甲酮系化合物、水楊酸酯系化合物、苯并三唑系化合物及三𠯤系化合物所組成之群中之至少1種化合物。藉由光學構件含有紫外線吸收劑,聚醯胺系樹脂之劣化得到抑制,因此可提高光學構件之視認性。 再者,於本說明書中,「系化合物」係指該「系化合物」隨附之化合物之衍生物。例如,「二苯甲酮系化合物」係指具有作為母骨架之二苯甲酮、及鍵結於二苯甲酮之取代基之化合物。(Ultraviolet absorber) The optical member may contain one kind or two or more kinds of ultraviolet absorbers. The ultraviolet absorber can be appropriately selected from those generally used as ultraviolet absorbers in the field of resin materials. The ultraviolet absorber may include a compound that absorbs light with a wavelength below 400 nm. As the ultraviolet absorber, for example, at least one compound selected from the group consisting of a benzophenone-based compound, a salicylate-based compound, a benzotriazole-based compound, and a triazole-based compound may be mentioned. Since the optical member contains the ultraviolet absorber, the deterioration of the polyamide-based resin is suppressed, and therefore the visibility of the optical member can be improved. In addition, in this specification, the "system compound" refers to a derivative of the compound accompanying the "system compound". For example, "benzophenone-based compound" refers to a compound having benzophenone as a parent skeleton and a substituent bonded to benzophenone.

於光學構件含有紫外線吸收劑之情形時,相對於光學構件之總質量,紫外線吸收劑之含有率較佳為1質量%以上,更佳為2質量%以上,進而較佳為3質量%以上,且較佳為10質量%以下,更佳為8質量%以下,進而較佳為6質量%以下。適宜含有率根據所使用之紫外線吸收劑而不同,但若以400 nm之光線透過率成為20~60%左右之方式調節紫外線吸收劑之含有率,則可提高光學構件之耐光性,並且可獲得透明性較高之光學構件。When the optical member contains an ultraviolet absorber, relative to the total mass of the optical member, the content of the ultraviolet absorber is preferably 1% by mass or more, more preferably 2% by mass or more, and still more preferably 3% by mass or more, And it is preferably 10% by mass or less, more preferably 8% by mass or less, and still more preferably 6% by mass or less. The appropriate content rate varies according to the UV absorber used, but if the content rate of the UV absorber is adjusted so that the light transmittance of 400 nm becomes about 20-60%, the light resistance of the optical member can be improved, and it can be obtained. Optical components with high transparency.

(其他添加劑) 光學構件亦可進而含有其他添加劑。作為其他成分,例如可例舉:抗氧化劑、離型劑、穩定劑、上藍劑、阻燃劑、pH調整劑、二氧化矽分散劑、潤滑劑、增黏劑及調平劑等。(Other additives) The optical member may further contain other additives. Examples of other components include antioxidants, release agents, stabilizers, bluing agents, flame retardants, pH adjusters, silica dispersants, lubricants, thickeners, and levelers.

於含有其他添加劑之情形時,相對於光學構件之質量,其含有率較佳為0.001質量%以上20質量%以下,更佳為0.001質量%以上10質量%以下。When other additives are contained, relative to the mass of the optical member, the content is preferably from 0.001% by mass to 20% by mass, and more preferably from 0.001% by mass to 10% by mass.

例如,作為光學膜之光學構件之厚度可根據用途適當調整,通常為10~1,000 μm,較佳為15~500 μm,更佳為20~400 μm,進而較佳為25~300 μm。再者,於本發明中,厚度可藉由接觸式數位式量表進行測定。For example, the thickness of the optical member as an optical film can be appropriately adjusted according to the application, and is usually 10 to 1,000 μm, preferably 15 to 500 μm, more preferably 20 to 400 μm, and still more preferably 25 to 300 μm. Furthermore, in the present invention, the thickness can be measured by a contact type digital gauge.

於光學構件中,依據JIS K 7105:1981之全光線透過率Tt較佳為70%以上,更佳為80%以上,進而較佳為85%以上,進而更佳為90%以上。若光學構件之全光線透過率Tt為上述下限以上,則於將光學構件組裝至圖像顯示裝置時,容易確保充分之視認性。再者,光學構件之全光線透過率Tt之上限值通常為100%以下。光學構件之霧度係藉由須賀試驗機股份有限公司製造之直讀霧度計(型號HGM-2DP)進行測定,較佳為1.0%以下,更佳為0.8%以下,進而較佳為0.5%以下,進而更佳為0.3%以下。若光學構件之霧度為上述上限以下,則於將光學構件組裝至圖像顯示裝置等可撓性電子裝置時,容易確保充分之視認性。再者,上述霧度之下限值並無特別限定,只要為0%以上即可。本發明之製造方法中所使用之溶解於聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂、及/或藉由本發明之製造方法所獲得之聚醯胺系樹脂之粉體較佳為具有上述全光線透過率Tt及/或霧度。聚醯胺系樹脂及聚醯胺系樹脂粉體之全光線透過率Tt及/或霧度係以成形體(例如膜)之形狀測定。測定試樣之製作方法及測定方法之詳細內容如實施例所記載。In the optical component, the total light transmittance Tt according to JIS K 7105:1981 is preferably 70% or more, more preferably 80% or more, still more preferably 85% or more, and still more preferably 90% or more. If the total light transmittance Tt of the optical member is more than the above lower limit, it is easy to ensure sufficient visibility when the optical member is assembled to the image display device. Furthermore, the upper limit of the total light transmittance Tt of the optical component is usually 100% or less. The haze of the optical component is measured by a direct reading haze meter (model HGM-2DP) manufactured by Suga Testing Machine Co., Ltd., preferably 1.0% or less, more preferably 0.8% or less, and even more preferably 0.5% Below, more preferably 0.3% or less. If the haze of the optical member is below the above upper limit, it is easy to ensure sufficient visibility when the optical member is assembled into a flexible electronic device such as an image display device. In addition, the lower limit of the haze is not particularly limited, as long as it is 0% or more. The polyamide-based resin dissolved in the polyamide-based resin solution (a) used in the production method of the present invention and/or the powder of the polyamide-based resin obtained by the production method of the present invention are preferred It has the above-mentioned total light transmittance Tt and/or haze. The total light transmittance Tt and/or haze of the polyamide resin and the polyamide resin powder is measured by the shape of the molded body (for example, film). The preparation method of the measurement sample and the details of the measurement method are as described in the examples.

(光學構件之製造方法) 可使用藉由本發明之製造方法所製造之聚醯胺系樹脂粉體,製造如上所述之光學構件,例如光學膜。製造方法並無特別限定。例如可藉由包括以下之步驟之製造方法製造光學構件: (a)使聚醯胺系樹脂粉體溶解於溶劑中,將所獲得之包含聚醯胺系樹脂之液體(聚醯胺系樹脂之清漆)塗佈於基材而形成塗膜之步驟(塗佈步驟);及 (b)使所塗佈之液體(聚醯胺系樹脂之清漆)乾燥而形成光學構件(較佳為光學膜、聚醯胺系樹脂膜)之步驟(形成步驟)。 步驟(a)及(b)通常可依序進行。(Method of manufacturing optical components) The polyamide resin powder produced by the production method of the present invention can be used to produce the above-mentioned optical member, such as an optical film. The manufacturing method is not particularly limited. For example, the optical component can be manufactured by a manufacturing method including the following steps: (a) The step of dissolving polyamide-based resin powder in a solvent, and applying the obtained liquid (polyamide-based resin varnish) containing polyamide-based resin to a substrate to form a coating film (coating Cloth step); and (b) The step (forming step) of drying the applied liquid (varnish of polyamide resin) to form an optical member (preferably an optical film or polyamide resin film). Steps (a) and (b) can usually be performed sequentially.

於塗佈步驟中,使聚醯胺系樹脂粉體溶解於溶劑中,視需要添加上述紫外線吸收劑及其他添加劑,進行攪拌,藉此製備包含聚醯胺系樹脂之液體(聚醯胺系樹脂之清漆)。In the coating step, the polyamide-based resin powder is dissolved in a solvent, the above-mentioned ultraviolet absorber and other additives are added as necessary, and stirred, thereby preparing a polyamide-based resin-containing liquid (polyamide-based resin Of varnish).

用於製備清漆之溶劑並無特別限定,只要可溶解聚醯胺系樹脂即可。作為該溶劑,例如可例舉:DMAc、DMF等醯胺系溶劑;GBL、γ-戊內酯等內酯系溶劑;二甲基碸、DMSO、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及該等之組合。於該等溶劑中,較佳為醯胺系溶劑或內酯系溶劑。又,清漆中亦可包含水、醇系溶劑、酮系溶劑、非環狀酯系溶劑、醚系溶劑等。The solvent used to prepare the varnish is not particularly limited as long as it can dissolve the polyamide resin. Examples of the solvent include amide-based solvents such as DMAc and DMF; lactone-based solvents such as GBL and γ-valerolactone; sulfur-containing solvents such as dimethyl sulfide, DMSO, and cyclobutane; ethylene carbonate Carbonate-based solvents such as esters, propylene carbonate, etc.; and combinations of these. Among these solvents, an amide-based solvent or a lactone-based solvent is preferred. In addition, the varnish may contain water, alcohol-based solvents, ketone-based solvents, acyclic ester-based solvents, ether-based solvents, and the like.

其次,例如可藉由公知之卷對卷或分批方式,於樹脂基材、SUS帶或玻璃基材等基材上,使用聚醯胺系樹脂之清漆,藉由流延成形等形成塗膜。Secondly, for example, by a well-known roll-to-roll or batch method, a polyamide resin varnish can be used on a resin substrate, SUS tape or glass substrate, etc., to form a coating film by casting. .

於形成步驟中,可使塗膜乾燥,自基材剝離,藉此形成光學構件。可於剝離後進而進行使光學構件乾燥之乾燥步驟。塗膜之乾燥通常可於50~350℃之溫度下進行。可視需要於惰性氛圍或減壓之條件下進行塗膜之乾燥。In the forming step, the coating film can be dried and peeled from the substrate, thereby forming an optical member. After peeling, a drying step of drying the optical member may be further performed. The drying of the coating film can usually be carried out at a temperature of 50 to 350°C. The coating film can be dried in an inert atmosphere or under reduced pressure as needed.

亦可進行對光學構件之至少一表面實施表面處理之表面處理步驟。作為表面處理,例如可例舉:UV臭氧處理、電漿處理及電暈放電處理。It is also possible to perform a surface treatment step of performing surface treatment on at least one surface of the optical component. The surface treatment may, for example, be UV ozone treatment, plasma treatment, and corona discharge treatment.

作為樹脂基材之例,可例舉:PET膜、PEN膜、聚醯胺膜及聚醯胺醯亞胺膜等。其中,基於使耐熱性優異之觀點,較佳為PET膜、PEN膜、聚醯胺膜及其他聚醯胺醯亞胺膜。進而,就與光學構件之密接性及成本之觀點而言,更佳為PET膜。As an example of a resin base material, PET film, PEN film, polyamide film, polyamide imide film, etc. are mentioned. Among them, from the viewpoint of excellent heat resistance, PET films, PEN films, polyamide films, and other polyimide films are preferred. Furthermore, from the viewpoint of adhesion to the optical member and cost, a PET film is more preferable.

可使用藉由本發明之製造方法所獲得之聚醯胺系樹脂粉體製造光學構件。此種光學構件具有較高之彈性模數及柔軟性。於本發明之適宜實施方式中,上述光學構件之彈性模數較佳為3.0 GPa以上,更佳為4.0 GPa以上,進而較佳為5.0 GPa以上,進而更佳為6.0 GPa以上,且較佳為10.0 GPa以下。若光學構件之彈性模數為上述上限以下,則於可撓性顯示器彎曲時,可抑制因上述光學構件而導致其他構件損傷。彈性模數例如可使用島津製作所股份有限公司製造之Autograph AG-IS,對於10 mm寬度之試驗片,於夾頭間距離50 mm、拉伸速度20 mm/分鐘之條件下測定應力-應變曲線,根據其斜率進行測定。本發明之製造方法中所使用之溶解於聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂、及/或藉由本發明之製造方法所獲得之聚醯胺系樹脂之粉體較佳為具有上述彈性模數。聚醯胺系樹脂及聚醯胺系樹脂粉體之彈性模數係以成形體(例如膜)之形狀測定。測定試樣之製作方法及測定方法之詳細內容如實施例所記載。The polyamide resin powder obtained by the production method of the present invention can be used to produce an optical member. This kind of optical component has high elastic modulus and flexibility. In a suitable embodiment of the present invention, the elastic modulus of the above-mentioned optical member is preferably 3.0 GPa or more, more preferably 4.0 GPa or more, still more preferably 5.0 GPa or more, still more preferably 6.0 GPa or more, and preferably Below 10.0 GPa. If the elastic modulus of the optical member is less than or equal to the above upper limit, when the flexible display is bent, it is possible to suppress damage to other members due to the above optical member. The modulus of elasticity can be, for example, Autograph AG-IS manufactured by Shimadzu Corporation. For a test piece with a width of 10 mm, the stress-strain curve can be measured under the conditions of a distance between the chucks of 50 mm and a tensile speed of 20 mm/min. It is determined based on its slope. The polyamide-based resin dissolved in the polyamide-based resin solution (a) used in the production method of the present invention and/or the powder of the polyamide-based resin obtained by the production method of the present invention are preferred To have the above-mentioned modulus of elasticity. The elastic modulus of polyamide resin and polyamide resin powder is measured by the shape of the molded body (for example, film). The preparation method of the measurement sample and the details of the measurement method are as described in the examples.

上述光學構件具有優異之耐彎曲性。於本發明之適宜實施方式中,光學構件以R=1 mm於負荷0.75 kgf下以速度175 cpm以135°進行測定時斷裂為止之往復彎曲次數較佳為10,000次以上,更佳為20,000次以上,進而較佳為30,000次以上,進而更佳為40,000次以上,尤佳為50,000次以上。 若光學構件之往復彎曲次數為上述下限以上,則可進而抑制光學構件彎曲時可能會產生之折痕。再者,光學構件之往復彎曲次數並無限制,若通常可彎曲1,000,000次則充分實用。往復彎曲次數例如可藉由東洋精機制作所股份有限公司製造之MIT耐折疲勞試驗機(型號0530),使用厚度50 μm、寬度10 mm之試驗片(光學構件)求出。本發明之製造方法中所使用之溶解於聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂、及/或藉由本發明之製造方法所獲得之聚醯胺系樹脂之粉體較佳為具有上述耐彎曲性。聚醯胺系樹脂及聚醯胺系樹脂粉體之耐彎曲性係以成形體(例如膜)之形狀測定。The above-mentioned optical member has excellent bending resistance. In a suitable embodiment of the present invention, the number of reciprocating bendings to break when the optical member is measured at R=1 mm under a load of 0.75 kgf at a speed of 175 cpm at 135° is preferably 10,000 or more, more preferably 20,000 or more , More preferably 30,000 times or more, still more preferably 40,000 times or more, and particularly preferably 50,000 times or more. If the number of reciprocating bending of the optical member is more than the above lower limit, the creases that may be generated when the optical member is bent can be further suppressed. Furthermore, there is no limit to the number of reciprocating bending of the optical member, and it is fully practical if it can be bent 1,000,000 times in general. The number of reciprocating bending can be obtained, for example, by using a test piece (optical member) having a thickness of 50 μm and a width of 10 mm using an MIT bending fatigue tester (model 0530) manufactured by Toyo Seiki Seisakusho Co., Ltd. The polyamide-based resin dissolved in the polyamide-based resin solution (a) used in the production method of the present invention and/or the powder of the polyamide-based resin obtained by the production method of the present invention are preferred To have the above-mentioned bending resistance. The bending resistance of the polyamide resin and the polyamide resin powder is measured by the shape of the molded body (for example, film).

上述光學構件可表現優異之透明性。因此,上述光學構件作為圖像顯示裝置、尤其是窗膜非常有用。於本發明之適宜實施方式中,光學構件依據JIS K 7373:2006之黃度YI較佳為5以下,更佳為3以下,進而較佳為2.5以下,進而更佳為2.0以下。黃度YI為上述上限以下之光學構件可有助於顯示裝置等之高視認性。再者,上述光學構件之黃度較佳為0以上。本發明之製造方法中所使用之溶解於聚醯胺系樹脂溶液(a)中之聚醯胺系樹脂、及/或藉由本發明之製造方法所獲得之聚醯胺系樹脂之粉體較佳為具有上述黃度YI。聚醯胺系樹脂及聚醯胺系樹脂粉體之黃度YI係以成形體、例如膜之形狀測定。The above-mentioned optical member can express excellent transparency. Therefore, the above-mentioned optical member is very useful as an image display device, especially a window film. In a suitable embodiment of the present invention, the yellowness YI of the optical member according to JIS K 7373:2006 is preferably 5 or less, more preferably 3 or less, still more preferably 2.5 or less, and still more preferably 2.0 or less. An optical member whose yellowness YI is below the above upper limit can contribute to high visibility of display devices and the like. Furthermore, the yellowness of the above-mentioned optical member is preferably 0 or more. The polyamide-based resin dissolved in the polyamide-based resin solution (a) used in the production method of the present invention and/or the powder of the polyamide-based resin obtained by the production method of the present invention are preferred It has the above-mentioned yellowness YI. The yellowness YI of polyamide resin and polyamide resin powder is measured by the shape of a molded body, such as a film.

上述光學構件可具備紫外線吸收層、黏著層、色相調整層、折射率調整層等功能層、硬塗層。The above-mentioned optical member may include functional layers such as an ultraviolet absorbing layer, an adhesive layer, a hue adjustment layer, and a refractive index adjustment layer, and a hard coat layer.

使用本發明之聚醯胺系樹脂粉體所製造之光學構件、例如光學膜可用作圖像顯示裝置之前面板、尤其是窗膜。上述光學構件可作為前面板配置於圖像顯示裝置、尤其是可撓性顯示器之視認側表面。該前面板具有保護可撓性顯示器內之圖像顯示元件之功能。具備上述光學構件之圖像顯示裝置具有較高之柔軟性及耐彎曲性,同時具有較高之表面硬度,因此彎曲時不會損傷其他構件,又,光學構件本身亦不易產生折痕,進而可有利地抑制表面之損傷。An optical member, such as an optical film, manufactured using the polyamide resin powder of the present invention can be used as a front panel of an image display device, especially a window film. The above-mentioned optical member can be used as a front panel to be arranged on the visible side surface of an image display device, especially a flexible display. The front panel has the function of protecting the image display elements in the flexible display. The image display device equipped with the above-mentioned optical member has high flexibility and bending resistance, and at the same time has a high surface hardness, so it will not damage other members when bending, and the optical member itself is not easy to produce creases, and thus can Beneficially inhibit surface damage.

作為圖像顯示裝置,可例舉:電視、智慧型手機、行動電話、汽車導航、平板PC(personal computer,個人電腦)、可攜式遊戲機、電子紙、指示器、指示板、鐘錶及智慧型手錶等可穿戴式裝置等。作為可撓性顯示器,可例舉:具有可撓性特性之圖像顯示裝置,例如電視、智慧型手機、行動電話、汽車導航、平板PC、可攜式遊戲機、電子紙、指示器、指示板、鐘錶及可穿戴式裝置等。 [實施例]Examples of image display devices include televisions, smart phones, mobile phones, car navigation, tablet PCs (personal computers), portable game consoles, electronic paper, indicators, indicator boards, clocks, and smarts Wearable devices such as type watches, etc. Examples of flexible displays include: image display devices with flexible characteristics, such as TVs, smart phones, mobile phones, car navigation, tablet PCs, portable game consoles, electronic paper, indicators, and instructions Boards, clocks and wearable devices, etc. [Example]

以下,藉由實施例更詳細地說明本發明。例中之「%」及「份」只要無特別記載,則意指質量%及質量份。Hereinafter, the present invention will be explained in more detail with examples. The "%" and "parts" in the examples mean mass% and parts by mass unless otherwise stated.

[樹脂之物性測定][Determination of resin properties]

[重量平均分子量] 重量平均分子量係使用GPC進行測定。測定試樣之製備方法及測定條件如下所述。 (1)試樣調整方法 稱取樹脂粉體20 mg,加入10 mL之DMF(添加10 mmol/L溴化鋰),使該等完全溶解。藉由層析盤(孔徑0.45 μm)過濾該溶液,獲得試樣溶液。 (2)測定條件 裝置:HLC-8020GPC 管柱:保護管柱+TSKgelα-M(300×7.8 mm)×2根+α-2500(300×7.8 mm)×1根 溶離液:DMF(添加10 mmol/L之溴化鋰) 流量:1.0 mL/分鐘 檢測器:RI檢測器 管柱溫度:40℃ 注入量:100 μL 分子量標準:標準聚苯乙烯[Weight average molecular weight] The weight average molecular weight is measured using GPC. The preparation method and measurement conditions of the measurement sample are as follows. (1) Sample adjustment method Weigh 20 mg of resin powder and add 10 mL of DMF (add 10 mmol/L lithium bromide) to completely dissolve it. The solution was filtered through a chromatography disc (pore size 0.45 μm) to obtain a sample solution. (2) Measurement conditions Device: HLC-8020GPC Column: protection column + TSKgelα-M(300×7.8 mm)×2 pieces+α-2500(300×7.8 mm)×1 pieces Eluent: DMF (add 10 mmol/L lithium bromide) Flow rate: 1.0 mL/min Detector: RI detector Column temperature: 40℃ Injection volume: 100 μL Molecular weight standard: standard polystyrene

[製造例:聚醯胺醯亞胺樹脂之製備] 將具備攪拌機及溫度計之反應容器用氮氣進行置換,冷卻至10℃,將作為溶劑之DMAc加入至容器中。進而,以表1中之條件1所示之莫耳比加入TFMB、6FDA、OBBC及TPC,製備包含聚醯胺酸1之溶液1。 [表1]    聚醯胺酸 莫耳比 TFMB 6FDA OBBC TPC 條件1 1 1.0000 0.3078 0.1026 0.6156 條件2 2 0.3020 0.1007 0.6039 [Production example: Preparation of polyimide resin] A reaction vessel equipped with a stirrer and a thermometer was replaced with nitrogen, cooled to 10°C, and DMAc as a solvent was added to the vessel. Furthermore, TFMB, 6FDA, OBBC, and TPC were added at the molar ratio shown in Condition 1 in Table 1 to prepare a solution 1 containing polyamide acid 1. [Table 1] Polyamide Molby TFMB 6FDA OBBC TPC Condition 1 1 1.0000 0.3078 0.1026 0.6156 Condition 2 2 0.3020 0.1007 0.6039

繼而,於聚醯胺酸溶液中加入二異丙基乙基胺(DIEA)、乙酸酐及4-甲基吡啶(4-PC),將反應容器升溫至70℃,藉此獲得作為反應液之聚醯胺醯亞胺樹脂溶液(a0 )。將各原料相對於TFMB 1.0000莫耳之莫耳比示於表2。 [表2]    莫耳比 DIEA 乙酸酐 4-PC 條件1 0.7182 2.1545 0.7182 條件2 0.7046 2.1137 0.7046 Then, diisopropylethylamine (DIEA), acetic anhydride, and 4-picoline (4-PC) were added to the polyamide acid solution, and the reaction vessel was heated to 70°C, thereby obtaining a reaction solution Polyimide resin solution (a 0 ). Table 2 shows the molar ratio of each raw material to 1.0000 molar of TFMB. [Table 2] Molby DIEA Acetic anhydride 4-PC Condition 1 0.7182 2.1545 0.7182 Condition 2 0.7046 2.1137 0.7046

冷卻所獲得之反應液,降溫至45℃以下時,相對於TFMB 1.0000莫耳,以表3中之條件1所示之莫耳比加入甲醇,獲得聚醯胺醯亞胺樹脂溶液(a1)(密度:910 kg/m3 ,取得量2,000 kg)。聚醯胺醯亞胺樹脂溶液(a1)之黏度為1 Pa・s,於聚醯胺醯亞胺樹脂溶液(a1)中,未發現聚醯胺醯亞胺樹脂之析出。又,基於聚醯胺醯亞胺樹脂溶液(a1)之總量,聚醯胺醯亞胺樹脂溶液(a1)中所包含之聚醯胺醯亞胺樹脂之量為5質量%,作為良溶劑之DMAc之量為70質量%,作為不良溶劑之甲醇之量為21質量%。進而,聚醯胺醯亞胺樹脂溶液(a1)中所包含之聚醯胺醯亞胺樹脂之重量平均分子量為33萬。以下亦將聚醯胺醯亞胺樹脂溶液(a1)稱為溶液(a1)。 [表3]    莫耳比 甲醇 條件1 72.32 條件2 71.67 The obtained reaction solution was cooled, and when the temperature was lowered to 45°C, relative to TFMB 1.0000 mol, methanol was added at the molar ratio shown in Condition 1 in Table 3 to obtain a polyamide imide resin solution (a1) ( Density: 910 kg/m 3 , the amount obtained is 2,000 kg). The viscosity of the polyimide resin solution (a1) was 1 Pa·s. In the polyimide resin solution (a1), no precipitation of the polyimide resin was found. In addition, based on the total amount of the polyimide resin solution (a1), the amount of the polyimide resin solution (a1) contained in the polyimide resin solution (a1) is 5% by mass, which serves as a good solvent The amount of DMAc is 70% by mass, and the amount of methanol as a poor solvent is 21% by mass. Furthermore, the weight average molecular weight of the polyimide resin contained in the polyimide resin solution (a1) was 330,000. Hereinafter, the polyimide resin solution (a1) is also referred to as the solution (a1). [table 3] Molby Methanol Condition 1 72.32 Condition 2 71.67

將各成分之莫耳比變更為表1~表3中之條件2所示之莫耳比,除此以外,以與條件1之情形相同之方式獲得聚醯胺醯亞胺樹脂溶液(a2)(密度:910 kg/m3 ,取得量2 kg)。聚醯胺醯亞胺樹脂溶液(a2)之黏度為5 Pa・s,於聚醯胺醯亞胺樹脂溶液(a2)中,未發現聚醯胺醯亞胺樹脂之析出。又,基於聚醯胺醯亞胺樹脂溶液(a2)之總量,聚醯胺醯亞胺樹脂溶液(a2)中所包含之聚醯胺醯亞胺樹脂之量為5質量%,作為良溶劑之DMAc之量為70質量%,作為不良溶劑之甲醇之量為21質量%。進而,聚醯胺醯亞胺樹脂溶液(a2)中所包含之聚醯胺醯亞胺樹脂之重量平均分子量為60萬。以下亦將聚醯胺醯亞胺樹脂溶液(a2)稱為溶液(a2)。The molar ratio of each component was changed to the molar ratio shown in Condition 2 in Tables 1 to 3, except that the polyimide resin solution (a2) was obtained in the same manner as in Condition 1 (Density: 910 kg/m 3 , the amount obtained is 2 kg). The viscosity of the polyimide resin solution (a2) was 5 Pa·s. In the polyimide resin solution (a2), no precipitation of the polyimide resin was found. In addition, based on the total amount of the polyimide resin solution (a2), the amount of the polyimide resin solution (a2) contained in the polyimide resin solution (a2) is 5% by mass, which serves as a good solvent The amount of DMAc is 70% by mass, and the amount of methanol as a poor solvent is 21% by mass. Furthermore, the weight average molecular weight of the polyimide resin contained in the polyimide resin solution (a2) was 600,000. Hereinafter, the polyimide resin solution (a2) is also referred to as the solution (a2).

[黏度之測定] (1)測定樣本 將上述製造例所製備之聚醯胺醯亞胺樹脂溶液(a1)及聚醯胺醯亞胺樹脂溶液(a2)分別抽出一部分作為測定樣本,於以下之測定條件下求出黏度。 (2)測定條件 裝置名:LVDV-II+Pro(Brookfield公司製造) 測定溫度:10℃ 主軸:CPE-52 樣本量:0.55 mL 轉子轉速:0.3 rpm[Determination of Viscosity] (1) Measurement sample A part of the polyimide resin solution (a1) and the polyimide resin solution (a2) prepared in the above-mentioned production example were taken out as measurement samples, and the viscosity was determined under the following measurement conditions. (2) Measurement conditions Device name: LVDV-II + Pro (manufactured by Brookfield) Measuring temperature: 10℃ Spindle: CPE-52 Sample size: 0.55 mL Rotor speed: 0.3 rpm

[樹脂粉體之粒徑測定] 於以下所示之測定條件下,藉由雷射繞射式散射法,求出實施例及比較例所獲得之濕潤固體之體積基準之中值徑,將所獲得之值作為樹脂粉體之粒徑。又,關於表示粒徑之均一性之參數δ,將所獲得之粒度分佈中頻度為x%時之粒徑設為dx,藉由式(F)計算而求出。 δ=(d90 -d10 )/d50 式(F) (測定條件) 裝置名:Mastersizer 3000(malvern公司製造) 測定溫度:常溫 樣本量:40~50 mL 折射率:1.53[Measurement of particle size of resin powder] Under the measurement conditions shown below, the volume-based median diameter of the wet solid obtained in the examples and comparative examples was obtained by the laser diffraction scattering method, and the obtained The obtained value is used as the particle size of the resin powder. In addition, regarding the parameter δ representing the uniformity of the particle size, the particle size when the frequency in the obtained particle size distribution is x% is taken as dx, and it is calculated by the formula (F). δ=(d 90- d 10 )/d 50 formula (F) (Measurement conditions) Device name: Mastersizer 3000 (manufactured by Malvern) Measurement temperature: Normal temperature Sample volume: 40-50 mL Refractive index: 1.53

基於粒徑測定結果,根據如下基準評價粒徑、均一性及最終品質。再者,於各評價基準中,◎為非常良好,〇為良好,×為不良。 (粒徑之評價基準) ◎:粒徑為200 μm以上且未達500 μm 〇:粒徑未達200 μm或粒徑為500 μm以上且未達1000 μm ×:粒徑為1000 μm以上 (均一性之評價基準) ◎:參數δ為1.0以下 〇:參數δ大於1.0且為5.0以下 ×:參數δ大於5.0 (最終品質) A:粒徑及均一性兩者均為◎ B:粒徑及均一性之一者為◎,另一者為〇 C:粒徑及均一性兩者均為〇 D:粒徑及均一性之一者為〇或◎,另一者為× E:粒徑及均一性兩者均為× 再者,A~C為合格,D及E為不合格。Based on the results of the particle size measurement, the particle size, uniformity, and final quality were evaluated according to the following criteria. In addition, in each evaluation standard, ◎ is very good, ○ is good, and × is bad. (Evaluation criteria for particle size) ◎: The particle size is 200 μm or more and less than 500 μm ○: The particle size is less than 200 μm or the particle size is more than 500 μm and less than 1000 μm ×: The particle size is 1000 μm or more (Evaluation criteria for uniformity) ◎: The parameter δ is 1.0 or less ○: The parameter δ is greater than 1.0 and less than 5.0 ×: The parameter δ is greater than 5.0 (Final quality) A: Both particle size and uniformity are ◎ B: One of particle size and uniformity is ◎, and the other is ○ C: Both particle size and uniformity are 〇 D: One of particle size and uniformity is ○ or ◎, and the other is × E: Both particle size and uniformity are × Furthermore, A to C are qualified, and D and E are unqualified.

(攪拌功率之算出) 攪拌功率(Z[kW/m3 ])係藉由(D)式計算而求出。 Z=Np×ρ×(n/60)3 ×d5 /V/1000   式(D) 式(D)中,Np表示功率數,ρ表示液體密度[kg/m3 ],n表示攪拌轉速[rpm],d表示攪拌葉之葉片直徑[m],V表示液體之體積[m3 ]。 功率數Np係根據神鋼環境舒立淨股份有限公司之目錄所記載之功率數Np與雷諾數Re之關係求出。 雷諾數Re根據式(E)算出。 Re=ρ×n/60×d2 /μ    式(E) (式(E)中,μ表示液體黏度[Pa・s],ρ表示液體密度[kg/m3 ],n表示攪拌轉速[rpm],d表示攪拌葉之葉片直徑[m]。)(Calculation of stirring power) The stirring power (Z [kW/m 3 ]) is calculated by the formula (D). Z=Np×ρ×(n/60) 3 ×d 5 /V/1000 Formula (D) In formula (D), Np represents power number, ρ represents liquid density [kg/m 3 ], n represents stirring speed [ rpm], d represents the blade diameter of the stirring blade [m], and V represents the volume of the liquid [m 3 ]. The power number Np is calculated based on the relationship between the power number Np and the Reynolds number Re recorded in the catalog of Kobelco Environmental Shulijing Co., Ltd. The Reynolds number Re is calculated according to formula (E). Re=ρ×n/60×d 2 /μ Formula (E) (In formula (E), μ represents liquid viscosity [Pa·s], ρ represents liquid density [kg/m 3 ], n represents stirring speed [rpm ], d represents the blade diameter of the stirring blade [m].)

(樹脂於溶劑中之溶解性之確認) 對於上述製造例所獲得之樹脂,藉由下述方法確認其於溶劑中之溶解性。 於30 mL之玻璃製螺旋管中量取溶劑9.9 g,進而放入磁力攪拌器進行攪拌。向其中加入樹脂粉體0.1 g,於室溫(24℃)下攪拌3小時,確認溶解性。結果,該樹脂粉體於DMAc中溶解,但於甲醇及離子交換水中不溶解。因此,DMAc為良溶劑,甲醇及離子交換水為不良溶劑。再者,於本實施例及比較例中,將離子交換水簡稱為水。(Confirmation of the solubility of resin in solvent) For the resin obtained in the above production example, the solubility in the solvent was confirmed by the following method. Measure 9.9 g of solvent in a 30 mL glass spiral tube, and then put it into a magnetic stirrer for stirring. 0.1 g of resin powder was added thereto, stirred at room temperature (24°C) for 3 hours, and the solubility was confirmed. As a result, the resin powder dissolved in DMAc, but did not dissolve in methanol and ion-exchanged water. Therefore, DMAc is a good solvent, and methanol and ion exchange water are poor solvents. Furthermore, in the present examples and comparative examples, the ion-exchanged water is simply referred to as water.

<實施例1> 一面將聚醯胺醯亞胺樹脂溶液(a1)870 kg用3片後掠葉片(d=1.2 m)以轉速125 rpm進行攪拌,一面於該溶液(a1)中,自噴霧嘴(池內股份有限公司製造之實心圓錐形噴嘴(1/2M JJXP 010S303)以0.6 kg/分鐘之添加速度(Y)連續添加合計92 kg之水。此時,自噴霧嘴噴灑之水與溶液(a1)接觸時之供給界面區域之面積(X)為0.5m2 ,添加通量(Y/X)為1.2((kg/分鐘)/m2 )(前半段添加)。92 kg之水添加結束後,進而以5 kg/分鐘之添加速度,自不同之噴霧嘴(池內股份有限公司製造之實心圓錐形噴嘴(1/2M JJXP 20 S303)連續添加153 kg之水(後半段添加)。此時之供給界面區域之面積為0.5m2 ,添加通量(Y/X)為10(kg/分鐘)/m2 。再者,前半段添加及後半段添加之加權平均添加速度為3.35 kg/分鐘,加權平均添加通量為6.7(kg/分鐘)/m2 。又,實施例1中之供給界面區域與釜截面積之比(供給界面區域/釜截面積)為0.37。 於20~80 kPa下藉由加壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為460 μm之粒狀,表示粒徑之均一性之參數δ為1.0。<Example 1> While 870 kg of polyimide resin solution (a1) was stirred with three sweeping blades (d=1.2 m) at a rotation speed of 125 rpm, the solution (a1) was self-sprayed Nozzle (a solid cone nozzle (1/2M JJXP 010S303) manufactured by Ikeuchi Co., Ltd.) continuously add a total of 92 kg of water at an addition rate (Y) of 0.6 kg/min. At this time, the water and solution sprayed from the spray nozzle (a1) The area (X) of the supply interface area at the time of contact is 0.5m 2 , and the flux (Y/X) is 1.2 ((kg/min)/m 2 ) (added in the first half). 92 kg of water is added After the completion, continue to add 153 kg of water (addition in the second half) from different spray nozzles (a solid cone nozzle manufactured by Ikenei Co., Ltd. (1/2M JJXP 20 S303)) at an addition rate of 5 kg/min. The area of the supply interface area at this time is 0.5m 2 , and the addition flux (Y/X) is 10 (kg/min)/m 2. Furthermore, the weighted average addition rate of the first half of the addition and the second half of the addition is 3.35 kg /Min, the weighted average flux is 6.7 (kg/min)/m 2. In addition, the ratio of the supply interface area to the cross-sectional area of the tank (supply interface area/the cross-sectional area of the tank) in Example 1 is 0.37. The precipitated white solid is captured by pressure filtration at 80 kPa to obtain a wet solid. The wet solid is a granular particle with a particle size of 460 μm, and the parameter δ indicating the uniformity of the particle size is 1.0.

<實施例2> 一面將聚醯胺醯亞胺樹脂溶液(a1)680 kg用3片後掠葉片(d=1.2 m)以轉速114 rpm進行攪拌,一面於該溶液(a1)中,自噴霧嘴(池內股份有限公司製造之實心圓錐形噴嘴(1/2M JJXP 20 S303)以5 kg/分鐘之添加速度(Y)間歇添加合計71 kg之水(於水之添加結束之前持續攪拌,水之添加時間與僅進行攪拌之時間之比率為1:8。具體而言,以5 kg/分鐘之添加速度(Y)添加水30秒,不添加水而攪拌4分鐘,反覆實施該作業)。此時之供給界面區域之面積(X)為0.5m2 ,添加通量(Y/X)為10(kg/分鐘)/m2 。又,實施例2中之供給界面區域與釜截面積之比(供給界面區域/釜截面積)為0.37。 於20~80 kPa下藉由加壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為310 μm之粒狀,參數δ為0.8。<Example 2> While 680 kg of polyimide resin solution (a1) was stirred with 3 sweeping blades (d=1.2 m) at 114 rpm, the solution (a1) was self-sprayed Nozzle (a solid conical nozzle (1/2M JJXP 20 S303) manufactured by Ikenei Co., Ltd.) intermittently add a total of 71 kg of water at an addition speed (Y) of 5 kg/min (continuous stirring before the end of the water addition, the water The ratio of the addition time to the mixing time is 1:8. Specifically, water is added at an addition speed (Y) of 5 kg/min for 30 seconds, and water is not added and stirred for 4 minutes, and this operation is repeated). The area (X) of the supply interface area at this time is 0.5m 2 , and the flux (Y/X) is 10 (kg/min)/m 2. Moreover, the supply interface area and the cross-sectional area of the tank in Example 2 The ratio (supply interface area/pot cross-sectional area) is 0.37. The precipitated white solid is captured by pressure filtration at 20 to 80 kPa to obtain a wet solid. The wet solid is granular with a particle size of 310 μm, and the parameter δ is 0.8.

<實施例3> 一面將聚醯胺醯亞胺樹脂溶液(a1)2,700 g用3片後掠葉片(d=0.11 m)以轉速323 rpm進行攪拌,一面於該溶液(a1)中,自滴液噴嘴以1.2 g/分鐘(1.2×10-3 kg/分鐘)之添加速度(Y)連續滴加合計320 g之水。此時之供給界面區域之面積(X)為1.4×10-5 m2 ,添加通量(Y/X)為86(kg/分鐘)/m2 。 藉由減壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為630 μm之粒狀,參數δ為1.3。<Example 3> While 2,700 g of the polyimide resin solution (a1) was stirred with 3 sweeping blades (d=0.11 m) at a rotation speed of 323 rpm, the solution (a1) was dripped. The liquid nozzle continuously drips a total of 320 g of water at an addition rate (Y) of 1.2 g/min (1.2×10 -3 kg/min). The area (X) of the supply interface area at this time is 1.4×10 -5 m 2 , and the added flux (Y/X) is 86 (kg/min)/m 2 . The precipitated white solid was captured by filtration under reduced pressure to obtain a wet solid. The wet solid is granular with a particle size of 630 μm, and the parameter δ is 1.3.

<實施例4> 一面將聚醯胺醯亞胺樹脂溶液(a1)260 g用3片後掠葉片(d=0.11 m)以轉速520 rpm進行攪拌,一面於該溶液(a1)中,自滴液噴嘴以9.0 g/分鐘(9.0×10-3 kg/分鐘)之添加速度(Y)連續滴加合計70 g之水。此時之供給界面區域之面積(X)為2.8×10-5 m2 ,添加通量(Y/X)為321(kg/分鐘)/m2 。 藉由減壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為80 μm之粒狀,參數δ為3.1。<Example 4> While 260 g of the polyimide resin solution (a1) was stirred with 3 sweeping blades (d=0.11 m) at 520 rpm, the solution (a1) was dripped. The liquid nozzle continuously drips a total of 70 g of water at an addition rate (Y) of 9.0 g/min (9.0×10 -3 kg/min). The area (X) of the supply interface area at this time is 2.8×10 -5 m 2 , and the added flux (Y/X) is 321 (kg/min)/m 2 . The precipitated white solid was captured by filtration under reduced pressure to obtain a wet solid. The wet solid is granular with a particle size of 80 μm, and the parameter δ is 3.1.

<實施例5> 一面將聚醯胺醯亞胺樹脂溶液(a2)260 g用3片後掠葉片(d=0.11 m)以轉速520 rpm進行攪拌,一面於該溶液(a2)中,自滴液噴嘴以9.0 g/分鐘(9.0×10-3 kg/分鐘)之添加速度(Y)連續滴加70 g之水。此時之供給界面區域之面積(X)為2.8×10-5 m2 ,添加通量(Y/X)為321(kg/分鐘)/m2 。 藉由減壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為40 μm之粒狀,參數δ為2.0。<Example 5> While stirring 260 g of the polyimide resin solution (a2) with 3 sweeping blades (d=0.11 m) at a rotation speed of 520 rpm, drip it into the solution (a2). The liquid nozzle continuously drips 70 g of water at an addition rate (Y) of 9.0 g/min (9.0×10 -3 kg/min). The area (X) of the supply interface area at this time is 2.8×10 -5 m 2 , and the added flux (Y/X) is 321 (kg/min)/m 2 . The precipitated white solid was captured by filtration under reduced pressure to obtain a wet solid. The wet solid is granular with a particle size of 40 μm, and the parameter δ is 2.0.

<比較例1> 一面將聚醯胺醯亞胺樹脂溶液(a1)260 g用3片後掠葉片(d=0.11 m)以轉速532 rpm進行攪拌,一面於該溶液(a1)中,自滴液噴嘴以17.0 g/分鐘(17.0×10-3 kg/分鐘)之添加速度(Y)連續滴加75 g之水。此時之供給界面區域之面積(X)為2.8×10-5 m2 ,添加通量(Y/X)為607(kg/分鐘)/m2 。 藉由減壓過濾而捕獲析出之白色固體,獲得濕潤固體。濕潤固體係粒徑為1000 μm以上之塊狀。<Comparative Example 1> While stirring 260 g of the polyimide resin solution (a1) with 3 sweeping blades (d=0.11 m) at a rotation speed of 532 rpm, drip it into the solution (a1). The liquid nozzle continuously drips 75 g of water at an addition rate (Y) of 17.0 g/min (17.0×10 -3 kg/min). The area (X) of the supply interface area at this time is 2.8×10 -5 m 2 , and the flux (Y/X) is 607 (kg/min)/m 2 . The precipitated white solid was captured by filtration under reduced pressure to obtain a wet solid. The wet solid is a block with a particle size of 1000 μm or more.

將實施例及比較例中於聚醯胺醯亞胺樹脂溶液中添加不良溶劑之條件、及所獲得之粉體之評價結果示於表4及表5。The conditions for adding a poor solvent to the polyimide resin solution in the Examples and Comparative Examples and the evaluation results of the obtained powder are shown in Tables 4 and 5.

[表4]    添加方法 溶液黏度[Pa•s] 添加速度(Y) [kg/分鐘] 供給界面區域之面積(X)[m2 ] 添加通量(Y/X) [(kg/分鐘)/m2 ] 攪拌功率(Z) [kW/m3 ] 比率R [(Y/X)/Z] 實施例 1 噴霧嘴 1 0.6 0.5 1.2 0.4 3 5 0.5 10 0.4 25 2 噴霧嘴 1 5 0.5 10 (間歇) 0.4 25 3 滴液噴嘴 (1支) 1 1.2×10-3 1.4×10-5 86 0.5 171 4 滴液噴嘴 (2支) 1 9.0×10-3 2.8×10-5 321 3.1 104 5 滴液噴嘴 (2支) 5 9.0×10-3 2.8×10-5 321 14.1 23 比較例 1 滴液噴嘴 (2支) 1 17.0×10-3 2.8×10- 5 607 1.7 357 [Table 4] Add method Solution viscosity [Pa•s] Adding speed (Y) [kg/min] The area of the supply interface area (X) [m 2 ] Add flux (Y/X) [(kg/min)/m 2 ] Stirring power (Z) [kW/m 3 ] Ratio R [(Y/X)/Z] Example 1 Spray nozzle 1 0.6 0.5 1.2 0.4 3 5 0.5 10 0.4 25 2 Spray nozzle 1 5 0.5 10 (intermittent) 0.4 25 3 Dropping nozzle (1 piece) 1 1.2×10 -3 1.4×10- 5 86 0.5 171 4 Dropping nozzle (2 pcs) 1 9.0×10 -3 2.8×10 -5 321 3.1 104 5 Dropping nozzle (2 pcs) 5 9.0×10 -3 2.8×10 -5 321 14.1 twenty three Comparative example 1 Dropping nozzle (2 pcs) 1 17.0×10 -3 2.8 × 10 - 5 607 1.7 357

[表5]    粒徑 均一性 最終品質 [μm] 評價 δ 評價 實施例 1 460 1.0 A 2 310 0.8 A 3 630 1.3 C 4 80 3.1 C 5 40 2.0 C 比較例 1 >1000 × 5.6 × E [table 5] Particle size Uniformity Final quality [μm] Evaluation δ Evaluation Example 1 460 1.0 A 2 310 0.8 A 3 630 1.3 C 4 80 3.1 C 5 40 2.0 C Comparative example 1 >1000 X 5.6 X E

確認到,如實施例1~5所示,藉由包括如下步驟之本發明之製造方法所獲得之聚醯胺系樹脂粉體係粒徑較小且粒徑之差異較小的粉體,上述步驟係使聚醯胺系樹脂溶液(a)與包含針對上述聚醯胺系樹脂之至少1種不良溶劑之不良溶劑液(b)於添加通量400以下接觸。相對於此,如比較例1所示,於添加通量超過400之情形時,所獲得之聚醯胺系樹脂粉體係粒徑較大且粒徑之差異亦較大之粉體。It was confirmed that, as shown in Examples 1 to 5, the polyamide resin powder obtained by the manufacturing method of the present invention including the following steps has a smaller particle size and a smaller difference in particle size. The polyamide resin solution (a) is brought into contact with a poor solvent solution (b) containing at least one poor solvent for the polyamide resin at an addition flux of 400 or less. In contrast, as shown in Comparative Example 1, when the flux exceeds 400, the obtained polyamide resin powder system has a larger particle size and a larger difference in particle size.

Claims (12)

一種聚醯胺系樹脂粉體之製造方法,其至少包括使聚醯胺系樹脂溶液(a)與不良溶劑液(b)接觸之接觸步驟,上述聚醯胺系樹脂溶液(a)係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b)包含針對上述聚醯胺系樹脂之至少1種不良溶劑;於將上述接觸步驟中之供給界面區域之面積設為X m2 ,將聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加速度設為Y kg/分鐘時,根據式(A)算出之添加通量為400以下: 添加通量((kg/分鐘)/m2 )=Y/X 式(A)。A method for producing a polyamide resin powder, which at least includes a contact step of contacting a polyamide resin solution (a) with a poor solvent solution (b), and the polyamide resin solution (a) is a The amide resin is dissolved in a good solvent for the polyamide resin, and the poor solvent solution (b) contains at least one poor solvent for the polyamide resin; the supply in the contact step The area of the interface area is set to X m 2 , and the addition rate of the polyamide resin solution (a) or the poor solvent solution (b) is set to Y kg/min, the addition flux calculated according to the formula (A) is 400 The following: Adding flux ((kg/min)/m 2 )=Y/X formula (A). 如請求項1之製造方法,其中上述接觸步驟係藉由於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)而進行。The manufacturing method of claim 1, wherein the contact step is performed by adding a poor solvent solution (b) to the polyamide resin solution (a). 如請求項1或2之製造方法,其中於上述接觸步驟中,於聚醯胺系樹脂溶液(a)中添加不良溶劑液(b)之情形時將聚醯胺系樹脂溶液(a)之攪拌功率設為Z kW/m3 ,於不良溶劑液(b)中添加聚醯胺系樹脂溶液(a)之情形時將不良溶劑液(b)之攪拌功率設為Z kW/m3 ,根據式(B)算出之上述添加通量相對於攪拌功率之比率R為300以下: 比率R=(Y/X)/Z 式(B)。The manufacturing method of claim 1 or 2, wherein in the above-mentioned contact step, the polyamide-based resin solution (a) is stirred when the poor solvent solution (b) is added to the polyamide-based resin solution (a) The power is set to Z kW/m 3 , when the polyamide resin solution (a) is added to the poor solvent solution (b), the stirring power of the poor solvent solution (b) is set to Z kW/m 3 , according to the formula (B) The calculated ratio R of the above-mentioned addition flux to the stirring power is 300 or less: Ratio R=(Y/X)/Z Formula (B). 如請求項1或2之製造方法,其中上述接觸步驟至少包括比率R互不相同之第1接觸步驟及第2接觸步驟,且第1接觸步驟中之比率R1 小於第2接觸步驟中之比率R2The manufacturing method of claim 1 or 2, wherein the contact step includes at least a first contact step and a second contact step in which the ratio R is different from each other, and the ratio R 1 in the first contact step is smaller than the ratio in the second contact step R 2 . 如請求項4之製造方法,其中第1接觸步驟中之比率R1 為150以下。The manufacturing method of claim 4, wherein the ratio R 1 in the first contact step is 150 or less. 如請求項1或2之製造方法,其中聚醯胺系樹脂溶液(a)之黏度為0.5~100 Pa・s。Such as the manufacturing method of claim 1 or 2, wherein the viscosity of the polyamide resin solution (a) is 0.5-100 Pa·s. 如請求項1或2之製造方法,其中聚醯胺系樹脂選自由聚醯胺樹脂及聚醯胺醯亞胺樹脂所組成之群。According to the manufacturing method of claim 1 or 2, wherein the polyamide resin is selected from the group consisting of polyamide resin and polyimide resin. 如請求項1或2之製造方法,其中於上述接觸步驟中,聚醯胺系樹脂溶液(a)或不良溶劑液(b)之添加係使用選自由噴霧器、滴液噴嘴、噴水器及噴嘴分散板所組成之群中之1種以上而進行。The manufacturing method of claim 1 or 2, wherein in the above-mentioned contact step, the addition of the polyamide resin solution (a) or the poor solvent solution (b) is selected from sprayers, drip nozzles, water sprayers, and nozzle dispersions One or more of the group consisting of the board. 如請求項8之製造方法,其中上述添加係使用噴霧器進行。The manufacturing method of claim 8, wherein the above-mentioned addition is carried out using a sprayer. 如請求項1或2之製造方法,其中聚醯胺系樹脂溶液(a)進而包含至少1種不良溶劑。According to the manufacturing method of claim 1 or 2, wherein the polyamide resin solution (a) further contains at least one poor solvent. 如請求項10之製造方法,其進而包括使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸而獲得上述聚醯胺系樹脂溶液(a)之步驟,上述聚醯胺系樹脂溶液(a0 )係使聚醯胺系樹脂溶解於針對上述聚醯胺系樹脂之良溶劑中而成,上述不良溶劑液(b0 )包含針對上述聚醯胺系樹脂之至少1種不良溶劑。According to the manufacturing method of claim 10, which further includes the step of contacting the polyamide resin solution (a 0 ) with the poor solvent solution (b 0 ) to obtain the polyamide resin solution (a), the polyamide resin solution (a) The resin solution (a 0 ) is prepared by dissolving a polyamide resin in a good solvent for the polyamide resin, and the poor solvent solution (b 0 ) contains at least one of the polyamide resins. Poor solvent. 如請求項11之製造方法,其中將獲得聚醯胺系樹脂溶液(a)之步驟中使聚醯胺系樹脂溶液(a0 )與不良溶劑液(b0 )接觸時之供給界面區域之面積設為P m2 ,將聚醯胺系樹脂溶液(a0 )或不良溶劑液(b0 )之添加速度設為Q kg/分鐘時,根據下式算出之添加通量超過400: 添加通量((kg/分鐘)/m2 )=Q/P。The manufacturing method of claim 11, wherein the area of the supply interface area when the polyamide resin solution (a 0 ) is in contact with the poor solvent solution (b 0 ) in the step of obtaining the polyamide resin solution (a) Set as P m 2 and the addition rate of the polyamide resin solution (a 0 ) or poor solvent solution (b 0 ) is set to Q kg/min, the addition flux calculated according to the following formula exceeds 400: Addition flux ((kg/minute)/m 2 )=Q/P.
TW110100608A 2020-01-17 2021-01-07 Method for producing polyamide-based resin powder including bringing a polyamide-based resin solution (a) into contact with a poor solvent solution (b1) TW202132423A (en)

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