TW201907017A - Additively-manufactured article - Google Patents

Additively-manufactured article Download PDF

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TW201907017A
TW201907017A TW107139043A TW107139043A TW201907017A TW 201907017 A TW201907017 A TW 201907017A TW 107139043 A TW107139043 A TW 107139043A TW 107139043 A TW107139043 A TW 107139043A TW 201907017 A TW201907017 A TW 201907017A
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laminate
mass
copper alloy
alloy powder
powder
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TW107139043A
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Chinese (zh)
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TWI730264B (en
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坪田龍介
岡陽平
岡本啟
中本貴之
菅原貴広
四宮徳章
武村守
內田壮平
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日商達誼恆股份有限公司
地方獨立行政法人大阪產業技術研究所
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20Direct sintering or melting
    • B22F10/25Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24After-treatment of workpieces or articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/0425Copper-based alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24After-treatment of workpieces or articles
    • B22F2003/248Thermal after-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10Processes characterised by the sequence of their steps
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Abstract

A copper alloy powder is a copper alloy powder for additive manufacturing. The copper alloy powder contains more than 1.00 mass% and not more than 2.80 mass% of chromium, and a balance of copper.

Description

積層造形物Laminated shape

本發明係關於一種銅合金粉末、積層造形物之製造方法及積層造形物。The present invention relates to a copper alloy powder, a method for producing a laminate, and a laminate.

日本專利特開2011-21218號公報揭示一種以金屬粉末為對象之雷射積層造形裝置(亦稱為「3D印表機」)。Japanese Laid-Open Patent Publication No. 2011-21218 discloses a laser laminate forming device (also referred to as a "3D printer") for metal powder.

作為金屬製品之加工技術,以金屬粉末為對象之積層造形法備受矚目。根據積層造形法,能夠實現藉由切削加工無法實現之複雜形狀之創製。迄今為止報告有基於鐵合金粉末、鋁合金粉末、鈦合金粉末等之積層造形物之製造例。即,報告有包含鐵合金、鋁合金或鈦合金等之積層造形物。然而,無包含銅合金之積層造形物之報告。 本發明之目的在於提供一種包含銅合金之積層造形物。 〔1〕銅合金粉末係積層造形用之銅合金粉末。銅合金粉末含有多於1.00質量%且2.80質量%以下之鉻、及其餘部分之銅。 〔2〕銅合金粉末亦可含有多於1.05質量%且2.80質量%以下之鉻。 〔3〕銅合金粉末亦可含有多於1.00質量%且2.00質量%以下之鉻。 〔4〕銅合金粉末亦可含有多於1.05質量%且2.00質量%以下之鉻。 〔5〕積層造形物之製造方法包括以下之第1步驟及第2步驟。 第1步驟;準備上述〔1〕至〔4〕中任一項之銅合金粉末。 第2步驟;利用銅合金粉末製造積層造形物。 積層造形物係藉由如下步驟製造:依序重複(i)形成包含銅合金粉末之粉末層、及(ii)藉由於粉末層使特定位置之銅合金粉末固化而形成造形層,且對造形層進行積層。 〔6〕積層造形物之製造方法亦可進而包括對積層造形物進行熱處理之第3步驟。 〔7〕於第3步驟中,亦可利用300℃以上之溫度對積層造形物進行熱處理。 〔8〕於第3步驟中,亦可利用400℃以上之溫度對積層造形物進行熱處理。 〔9〕於第3步驟中,亦可利用700℃以下之溫度對積層造形物進行熱處理。〔10〕於第3步驟中,亦可利用600℃以下之溫度對積層造形物進行熱處理。 〔11〕積層造形物係包含銅合金之積層造形物。積層造形物含有多於1.00質量%且2.80質量%以下之鉻、及其餘部分之銅。積層造形物相對於銅合金之理論密度具有96%以上且100%以下之相對密度,且具有10%IACS以上之導電率。 〔12〕積層造形物亦可含有多於1.05質量%且2.80質量%以下之鉻。 〔13〕積層造形物亦可含有多於1.00質量%且2.00質量%以下之鉻。 〔14〕積層造形物亦可含有多於1.05質量%且2.00質量%以下之鉻。 〔15〕積層造形物亦可具有30%IACS以上之導電率。 〔16〕積層造形物亦可具有50%IACS以上之導電率。 〔17〕積層造形物亦可具有70%IACS以上之導電率。 本發明之上述及其他目的、特徵、態樣及優點根據聯繫隨附圖式而理解之本發明相關之如下詳細說明可明確。As a processing technology for metal products, a laminate method for metal powder has attracted attention. According to the laminated method, it is possible to realize the creation of a complicated shape that cannot be realized by cutting. A manufacturing example based on a laminate of a ferroalloy powder, an aluminum alloy powder, a titanium alloy powder, or the like has been reported so far. That is, a laminate including a ferroalloy, an aluminum alloy, or a titanium alloy is reported. However, there are no reports of laminates containing copper alloys. It is an object of the present invention to provide a laminate comprising a copper alloy. [1] A copper alloy powder for forming a copper alloy powder. The copper alloy powder contains more than 1.00% by mass and 2.80% by mass or less of chromium, and the balance of copper. [2] The copper alloy powder may contain more than 1.05 mass% and 2.80 mass% or less of chromium. [3] The copper alloy powder may contain more than 1.00% by mass and 2.00% by mass or less of chromium. [4] The copper alloy powder may further contain more than 1.05 mass% and 2.00 mass% or less of chromium. [5] The manufacturing method of the laminated product includes the following first step and second step. The first step; the copper alloy powder according to any one of the above [1] to [4]. The second step; manufacturing a laminate product using copper alloy powder. The laminate is produced by sequentially repeating (i) forming a powder layer containing a copper alloy powder, and (ii) forming a shaped layer by solidifying a copper alloy powder at a specific position due to the powder layer, and forming a layer Carry out the layering. [6] The method for producing a laminate may further include a third step of heat-treating the laminate. [7] In the third step, the laminate may be heat-treated at a temperature of 300 ° C or higher. [8] In the third step, the laminate may be heat-treated at a temperature of 400 ° C or higher. [9] In the third step, the laminate may be heat-treated at a temperature of 700 ° C or lower. [10] In the third step, the laminate may be heat-treated at a temperature of 600 ° C or lower. [11] The build-up material comprises a laminate of a copper alloy. The laminate product contains more than 1.00% by mass and 2.80% by mass or less of chromium, and the rest of the copper. The laminate has a relative density of 96% or more and 100% or less with respect to the theoretical density of the copper alloy, and has a conductivity of 10% IACS or more. [12] The laminate may also contain more than 1.05 mass% and 2.80 mass% or less of chromium. [13] The laminate may also contain more than 1.00% by mass and 2.00% by mass or less of chromium. [14] The laminate may also contain more than 1.05 mass% and 2.00 mass% or less of chromium. [15] The laminate may also have a conductivity of 30% IACS or more. [16] The laminate may also have a conductivity of 50% IACS or more. [17] The laminate may also have a conductivity of 70% IACS or more. The above and other objects, features, aspects and advantages of the present invention will become apparent from

以下說明本發明之一實施形態(以下記為「本實施形態」)。但以下之說明並不限定本發明之發明範圍。 首先說明發現本實施形態之經過。 於需要機械強度及較高之導電率之機械零件中較多用銅。作為包含銅之機械零件,例如可列舉焊接槍、配電設備之零件等。 首先,研究人員研究了藉由純銅粉末製造積層造形物。然而,藉由純銅粉末無法獲得所需之積層造形物。具體而言,藉由純銅粉末製造之積層造形物具有大量之空隙,相對於緻密之熔製材密度大幅度降低。密度之降低意指機械強度(例如拉伸強度等)之降低。進而相對於緻密之熔製材導電率亦大幅度降低。為了改善密度及導電率,研究人員對各種製造條件進行了研究。然而,無論於任一製造條件下,加工物性均不穩定,難以實現密度及導電率之改善。 因此研究人員對銅合金粉末進行了研究。其結果發現藉由使用特定組成之銅合金粉末,可製造具有實用密度及導電率之積層造形物;進而藉由利用特定溫度以上對積層造形物進行熱處理可顯著地提高積層造形物之機械強度及導電率。以下詳細地說明本實施形態。 <銅合金粉末> 本實施形態之銅合金粉末相當於二維印表機之碳粉或油墨。於本實施形態中,只要可準備下述特定組成之銅合金粉末,則其製造方法無特別限定。 銅合金粉末例如可藉由氣體霧化法或水霧化法而製造。例如,首先製備銅合金之熔液。將熔液放入餵槽中。自餵槽滴加熔液。使滴加中之熔液與高壓氣體或高壓水接觸。藉此,熔液急冷、凝固,從而形成銅合金粉末。此外,亦可藉由電漿霧化法、離心力霧化法等製造銅合金粉末。 於本實施形態中,使用特定組成之銅合金粉末。即銅合金粉末係含有多於1.00質量%且2.80質量%以下之鉻(Cr)、及其餘部分之銅(Cu)之銅合金之粉末。其餘部分中除Cu以外,亦可含有雜質元素。雜質元素例如亦可為於銅合金粉末之製造時刻意地添加之元素(記為以下「添加元素」)。即,其餘部分亦可包含Cu及添加元素。作為添加元素,例如可列舉鎳(Ni)、鋅(Zn)、錫(Sn)、銀(Ag)、鈹(Be)、鋯(Zr)、鋁(Al)、矽(Si)、鈷(Co)、鈦(Ti)、鎂(Mg)、碲(Te)等。雜質元素例如亦可為於銅合金粉末之製造時不可避免地混入之元素(以下記為「不可避免雜質元素」)。即,其餘部分亦可包含Cu及不可避免雜質元素。作為不可避免雜質元素,例如可列舉氧(O)、磷(P)、鐵(Fe)等。其餘部分亦可包含Cu、添加元素及不可避免雜質元素。銅合金粉末例如亦可合計含有未達0.30質量%之添加元素及不可避免雜質元素。例如銅合金粉末之氧含量可藉由依據「JIS H 1067:銅中之氧定量方法」之方法而測定。 銅合金粉末之Cr含量藉由依據「JIS H 1071:銅及銅合金中之鉻定量方法」之ICP(Inductively Coupled Plasma,感應耦合電漿)發光分析法而測定。Cr含量至少測定3次。採用至少3次之平均值作為Cr含量。Cr含量可為1.01質量%以上,或亦可為多於1.05質量%,或亦可為1.10質量%以上,或亦可為1.20質量%以上,或亦可為1.22質量%以上,或亦可為1.78質量%以上。Cr含量亦可為2.70質量%以下,或亦可為2.60質量%以下,或亦可為2.30質量%以下,或亦可為2.00質量%以下,或亦可為1.90質量%以下,或亦可為1.80質量%以下,或亦可為1.78質量%以下,或亦可為1.46質量%以下。 銅合金粉末之Cu含量可藉由依據「JIS H 1051:銅及銅合金中之銅定量方法」之方法而測定。Cu含量至少測定3次。採用至少3次之平均值作為Cu含量。Cu含量例如亦可為高於97.9質量%且未達99.0質量%。 銅合金粉末例如亦可具有1~200 μm之平均粒徑。「平均粒徑」表示於藉由雷射繞射散射法而測定之體積基準之粒度分佈中自微粒側累積50%之粒徑。以下平均粒徑亦可記為「d50」。d50例如可藉由氣體霧化時之氣體壓力、分級等而調整。d50亦可根據積層造形物之積層間距而調整。d50例如可為5~50 μm,或亦可為50~100 μm,或亦可為100~200 μm。粒子形狀並無特別限定。粒子可為大致球狀,或亦可為不規則形狀。 <積層造形物之製造方法> 圖1係表示本實施形態之積層造形物之製造方法之概略之流程圖。本實施形態之製造方法包括第1步驟(S100)及第2步驟(S200)。本實施形態之製造方法亦可進而於第2步驟(S200)之後包括第3步驟(S300)。以下依序說明各步驟。 《第1步驟(S100)》 於第1步驟(S100)中,準備上述銅合金粉末。 《第2步驟(S200)》 於第2步驟(S200)中,利用銅合金粉末製造積層造形物。 此處說明粉末床熔融結合法。其中亦可使用除粉末床熔融結合法以外之附加製造法。例如亦可使用定向性能量沈積法等。於造形中亦可實施切削加工。 此處說明藉由雷射使銅合金粉末固化之態樣。其中雷射僅為一例,只要可使銅合金粉末固化,則固化機構不限定於雷射。例如亦可使用電子束、電漿等。 (資料處理(S201)) 首先藉由3D-CAD等製成三維形狀資料。 三維形狀資料例如亦可轉換為STL資料。圖2係STL資料之一例。於STL資料中,例如可實施利用有限元素法進行之元素分割(所謂「網目化」)。 根據STL資料製成切片資料。圖3係切片資料之一例。STL資料分割為n層。即STL資料分割為第1造形層p1、第2造形層p2、・・・、第n造形層pn。各層之厚度(切片厚度d)例如為10~150 μm即可。 (粉末層之形成(S202)) 形成包含銅合金粉末之粉末層。 圖4係圖解積層造形物之製造過程之第1概略圖。雷射積層造形裝置100具備活塞101、台102、及雷射輸出部103。台102由活塞101支持。活塞101以可升降台102之方式構成。於台102上對積層造形物進行造形。 粉末層之形成(S202)及下述造形層之形成(S203)例如亦可於惰性氣體氛圍中實施。用於抑制積層造形物之氧化。惰性氣體例如亦可為氬氣(Ar)、氮氣(N2 )、氦氣(He)等。亦可使用還原性氣體氛圍代替惰性氣體氛圍。還原性氣體例如為氫氣(H2 )等。進而亦可使用減壓氛圍代替惰性氣體氛圍。 基於切片資料,活塞101使台102降下1層份。於台102上鋪滿1層份之銅合金粉末。藉此,形成包含銅合金粉末之第1粉末層1。例如亦可藉由壓實刮刀(未圖示)等使第1粉末層1之表面平滑化。第1粉末層1亦可實質上僅由銅合金粉末形成。第1粉末層1除銅合金粉末外亦可包含雷射吸收材(例如樹脂粉末等)。 (造形層之形成(S203)) 繼而形成造形層。 造形層構成積層造形物之一部分。圖5係圖解積層造形物之製造過程之第2概略圖。雷射輸出部103基於切片資料向第1粉末層1之特定位置照射雷射光。亦可於雷射光之照射之前預先對第1粉末層1進行加熱。受到雷射光之照射之銅合金粉末經過熔融或燒結而固化。藉此形成第1造形層p1。即,藉由於粉末層中使特定位置之銅合金粉末固化而形成造形層。 雷射輸出部103可為通用之雷射裝置。雷射光之光源例如可為光纖雷射、YAG(Yttrium Aluminum Garnet,釔鋁石榴石)雷射、CO2 雷射、半導體雷射、綠光雷射等。雷射光之輸出例如可為20~1000 W,或亦可為200~500W。雷射光之掃描速度例如可於50~2000 mm/s之範圍內進行調整。 雷射光之能量密度可於10~2000 J/mm3 之範圍內進行調整。能量密度藉由下述式(I): E=P÷(v×s×d)・・・(I) 算出。式(I)中,「E」表示雷射光之能量密度[單位:J/mm3 ]。「P」表示雷射之輸出[單位:W]。「v」表示掃描速度[單位:mm/s]。「s」表示掃描寬度[單位:mm]。「d」表示切片厚度[單位:mm]。 圖6係圖解積層造形物之製造過程之第3概略圖。形成第1造形層p1後,活塞101使台102降下1層份。藉由與上述相同之順序形成第2粉末層2,繼而形成第2造形層p2。其後,藉由依序重複粉末層之形成(202)及造形層之形成(203)並對造形層進行積層而製造積層造形物。 圖7係圖解積層造形物之製造過程之第4概略圖。最終藉由對第n造形層pn進行積層而完成積層造形物10。於本實施形態中,因使用特定組成之銅合金粉末,故而積層造形物10可具有較高之相對密度。 《第3步驟(S300)》 本實施形態之製造方法亦可進而包括對積層造形物進行熱處理之第3步驟(S300)。藉此,可期待積層造形物之機械強度(例如拉伸強度、維氏硬度等)、以及積層造形物之導電率飛躍性地提高。 於本實施形態中,可使用一般之熱處理爐。熱處理溫度藉由熱處理爐附帶之溫度感測器測定。例如,若熱處理爐之設定溫度為300℃,則視作利用300℃對積層造形物進行熱處理。 積層造形物例如可接受1分鐘以上且10小時以下之熱處理,或亦可接受10分鐘以上且5小時以下之熱處理,或亦可接受30分鐘以上且3小時以下之熱處理,或亦可接受1小時以上且2小時以下之熱處理。熱處理之氛圍例如可為大氣、氮氣、氬氣、氫氣、真空等。 於第3步驟中,可利用300℃以上之溫度對積層造形物進行熱處理,或亦可利用400℃以上之溫度進行熱處理,或亦可利用450℃以上之溫度進行熱處理。藉此可期待機械強度及導電率之進一步提高。 於第3步驟中,可利用700℃以下之溫度對積層造形物進行熱處理,或亦可利用600℃以下之溫度進行熱處理,或亦可利用550℃以下之溫度進行熱處理。藉此,例如可期待機械強度與導電率之平衡提高。亦可利用超過700℃之溫度對積層造形物進行熱處理。但是,利用超過700℃之溫度亦存在機械強度及導電率之提高效果變小之可能性。 <積層造形物> 本實施形態之積層造形物典型而言係藉由上述製造方法而製造。 本實施形態之積層造形物可具有藉由切削加工無法實現之複雜形狀。進而本實施形態之積層造形物可機械強度及導電率兩者均優異。作為本實施形態之積層造形物之一例可為電漿槍。 (組成) 積層造形物包含銅合金。積層造形物含有多於1.00質量%且2.80質量%以下之Cr、及其餘部分之Cu。與上述銅合金粉末相同,其餘部分亦可包含添加元素及不可避免雜質元素之至少一者。積層造形物之Cr含量藉由與銅合金粉末之Cr含量之測定方法同樣之測定方法而測定。Cr含量可為1.01質量%以上,或亦可為多於1.05質量%,或亦可為1.10質量%以上,或亦可為1.20質量%以上,或亦可為1.22質量%以上,或亦可為1.78質量%以上。Cr含量可為2.70質量%以下,或亦可為2.60質量%以下,或亦可為2.30質量%以下,或亦可為2.00質量%以下,或亦可為1.90質量%以下,或亦可為1.80質量%以下,或亦可為1.78質量%以下,或亦可為1.46質量%以下。 積層造形物之Cu含量亦可藉由與銅合金粉末之Cu含量之測定方法同樣之測定方法而測定。Cu含量例如亦可為高於97.9質量%且未達99.0質量%。 (相對密度) 積層造形物相對於銅合金之理論密度具有96%以上且100%以下之相對密度。「相對密度」藉由積層造形物之實測密度除以理論密度而算出。理論密度表示具有與積層造形物相同之組成之熔製材之密度。實測密度藉由依據「JIS Z 2501:燒結金屬材料-密度、含油率及開放氣孔率試驗方法」之方法而測定。液體使用水。相對密度至少測定3次。採用至少3次之平均值作為相對密度。 相對密度較高之積層造形物適於需要較高氣密性之零件。又,相對密度越高,亦越可期待機械強度。相對密度可為97%以上,或亦可為98%以上,或亦可為99%以上,或亦可為99.2%以上,或亦可為99.4%以上,或亦可為99.8%以上。 (機械強度) 積層造形物可具有優異之機械強度。例如,積層造形物可具有250 MPa以上之拉伸強度。即本實施形態之積層造形物可具有與無氧銅(UNS(Unified Numberring System,統一編號系統)編號C10200)同等以上之拉伸強度。 「拉伸強度」藉由以下順序測定。 測定中使用「JIS B 7721:拉伸試驗機、壓縮試驗機-力測量系統之校正方法及驗證方法」所規定之等級1級以上之拉伸試驗裝置。圖8係拉伸試驗所使用之試片之俯視圖。準備圖8所示之啞鈴狀試片20。將啞鈴狀試片20安裝於拉伸試驗裝置之夾具。於夾具使用適於啞鈴狀試片20之形狀之物。啞鈴狀試片20以向其軸方向施加拉伸應力之方式安裝。 利用2 mm/min之速度拉拽啞鈴狀試片20。連續拉拽直至啞鈴狀試片20斷裂。測定直至啞鈴狀試片20斷裂所呈現之最大拉伸應力。 藉由最大拉伸應力除以平行部21之截面面積,而算出拉伸強度。平行部21之截面面積為9.616 mm2 (=π×3.5 mm×3.5 mm÷4)。拉伸強度至少測定3次。採用至少3次之平均值作為拉伸強度。再者啞鈴狀試片20之各部之尺寸如下所示。 啞鈴狀試片20之總長(L0):36 mm 平行部21之長度(L1):18±0.5 mm 平行部21之直徑(D1):3.5±0.05 mm 肩部23之半徑(R):10 mm 夾持部22之長度(L2):4.0 mm 夾持部22之直徑(D2):6.0 mm 拉伸強度可藉由第3步驟之熱處理溫度而調整。拉伸強度例如可為300 MPa以上,或亦可為400 MPa以上,或亦可為600 MPa以上,或亦可為700 MPa以上。拉伸強度例如可為800 MPa以下,或亦可為750 MPa以下。 積層造形物可具有90 HV以上之維氏硬度。「維氏硬度」藉由依據「JIS Z 2244:維氏硬度試驗-試驗方法」之方法而測定。維氏硬度亦可藉由第3步驟之熱處理溫度而調整。維氏硬度例如可為100 HV以上,或亦可為150 HV以上,或亦可為200 HV以上,或亦可為250 HV以上。維氏硬度例如亦可為300 HV以下。 (導電率) 積層造形物具有10%IACS以上之導電率。「導電率」係由市售之渦流式電導計測定。將退火標準軟銅(International Annealed Copper Standard,IACS)之導電率作為基準對導電率進行評價。即積層造形物之導電率以相對於IACS之導電率之百分率之形式表示。例如,積層造形物之導電率為50%IACS意指積層造形物之導電率為IACS之導電率之一半。導電率至少測定3次。採用至少3次之平均值作為導電率。 導電率可藉由第3步驟之熱處理溫度而調整。積層造形物可具有20%IACS以上之導電率,或亦可具有30%IACS以上之導電率,或亦可具有50%IACS以上之導電率,或亦可具有70%IACS以上之導電率,或亦可具有80%IACS以上之導電率,或亦可具有90%IACS以上之導電率。積層造形物例如亦可具有100%IACS以下之導電率。 [實施例] 以下對實施例進行說明。但以下之例並不限定本發明之發明範圍。 根據圖1所示之流程圖製造積層造形物。 首先,準備含有下述表1所示之化學成分之銅合金粉末A1~A7(S100)。該等銅合金粉末藉由特定霧化法製造。作為比較亦準備純銅粉末X及銅合金粉末Y。純銅粉末X係以市售純銅為原料之粉末。銅合金粉末Y係以市售銅合金(製品名「AMPCO940」)為原料之粉末。以下有時將該等粉末總稱為「金屬粉末」。 [表1] 準備以下規格之雷射積層造形裝置。 雷射:光纖雷射、最大輸出400 W 點徑:0.05~0.20 mm 掃描速度:~7000 mm/s 積層間距:0.02~0.08 mm 造形尺寸:250 mm×250 mm×280 mm 1.純銅粉末X 製成三維形狀資料(S201)。依序重複(i)形成包含金屬粉末之粉末層(S202)、及(ii)藉由於粉末層使特定位置之金屬粉末固化而形成造形層(S203),並對造形層進行積層。如此藉由純銅粉末X製造No.X-1~X-40之積層造形物(S200)。積層造形物係直徑14 mm×高度15 mm之圓柱(只要無特別說明,則以下積層造形物亦相同)。積層造形物之製造條件示於下述表2及3。根據上述方法測定積層造形物之相對密度及導電率。結果示於下述表2及3。 [表2] [表3] 如上述表2及3所示,於藉由純銅粉末X製造之積層造形物中,即便製造條件固定,加工物性亦不穩定,範圍較大不均一。於表2及3之「相對密度」之欄中「不可測定」表示因積層造形物包含較多之空隙,故而無法測定可靠性較高之密度。考慮為純銅具有100%IACS之導電率即可。藉由純銅粉末X製造之積層造形物與純銅相比導電率大幅度降低。可認為藉由純銅粉末X難以製造實用機械零件。 2.銅合金粉末Y(市售銅合金之粉末) 藉由下述表4所示之製造條件,以與上述相同之方式製造No.Y-1~Y-7之積層造形物。於氮氣氛圍中利用下述表4之「熱處理溫度」之欄所示之溫度對積層造形物進行3小時熱處理(S300)。「熱處理溫度」之欄中記為「無」之積層造形物不進行熱處理。根據上述方法測定積層造形物之相對密度及導電率。結果示於下述表4。 [表4] 如上述表4所示,藉由銅合金粉末Y(市售銅合金之粉末)製造之積層造形物之導電率與市售銅合金之導電率(45.5%IACS左右)相比大幅度降低。 3.銅合金粉末A1(Cr含量:0.22質量%) 藉由下述表5所示之製造條件,以與上述相同之方式製造No.A1-1~A1-14之積層造形物。於氮氣氛圍中利用下述表5之「熱處理溫度」之欄所示之溫度對積層造形物進行3小時熱處理。根據上述方法測定相對密度、導電率及拉伸強度。拉伸強度於另行製造之啞鈴狀試片20(參照圖8)中測定(以下相同)。結果示於下述表5。 [表5] 如上述表5所示,於藉由銅合金粉末A1製造之積層造形物中抑制了加工物性之不均一。可認為該等積層造形物具有可用作機械零件之機械強度及導電率。 4.銅合金粉末A2(Cr含量:0.51質量%) 藉由下述表6所示之製造條件,以與上述相同之方式製造No.A2-1~A2-12之積層造形物。於氮氣氛圍中利用下述表6之「熱處理溫度」之欄所示之溫度對積層造形物進行3小時熱處理。根據上述方法測定相對密度、導電率及拉伸強度。結果示於下述表6。 [表6] 如上述表6所示,於藉由銅合金粉末A2製造之積層造形物中抑制了加工物性之不均一。可認為該等積層造形物具有可用作機械零件之機械強度及導電率。 5.銅合金粉末A3(Cr含量:0.94質量%) 藉由下述表7所示之製造條件,以與上述相同之方式製造No.A3-1~A3-7之積層造形物。於氮氣氛圍中利用下述表7之「熱處理溫度」之欄所示之溫度對積層造形物進行3小時熱處理。根據上述方法測定相對密度、導電率及拉伸強度。結果示於下述表7。 [表7] 如上述表7所示,於藉由銅合金粉末A3製造之積層造形物中抑制了加工物性之不均一。可認為該等積層造形物具有可用作機械零件之機械強度及導電率。 6.熱處理溫度之研究 藉由下述表8、9及10所示之製造條件製造積層造形物。藉由上述方法測定積層造形物之相對密度。進而於氮氣氛圍中利用下述表8、9及10之「熱處理溫度」之欄所示之溫度對積層造形物進行1小時熱處理。熱處理後,測定積層造形物之拉伸強度、導電率及維氏硬度。再者,維氏硬度之測定方法如上所述。結果示於下述表8、9及10。 [表8] [表9] [表10] 如上述表8、9及10所示,包含銅合金且Cr含量為多於1.00質量%且2.80質量%以下之積層造形物具有穩定且99%以上且100%以下之相對密度。可確認如下傾向:藉由進而利用300℃以上之溫度對積層造形物進行熱處理,機械強度及導電率大幅度提高。 以下藉由圖9~11對結果進行說明。於圖9~11中,例如凡例之「1.5Cr」表示Cr含量為1.46質量%。方便起見於凡例中四捨五入小數點第2位。未進行熱處理之積層造形物視作已利用25℃進行熱處理,並製成曲線圖。 圖9係表示第3步驟之熱處理溫度與導電率之關係之曲線圖。於熱處理溫度為300℃以上之範圍中,積層造形物之導電率顯著地提高。於熱處理溫度為700℃之情形時亦可確認導電率之提高效果。因此,熱處理溫度之上限亦可為700℃。其中,預想於熱處理溫度超過700℃之範圍中亦可獲得導電率之提高效果。 圖10係表示第3步驟之熱處理溫度與拉伸強度之關係之曲線圖。如圖10所示,於熱處理溫度為300℃以上之範圍中,積層造形物之拉伸強度顯著地提高。熱處理溫度自400℃變更為450℃時之拉伸強度之提高幅度尤其顯著。拉伸強度於500℃附近為峰值,其後平穩地減少。 圖11係表示第3步驟之熱處理溫度與維氏硬度之關係之曲線圖。維氏硬度亦顯示與拉伸強度同樣之傾向。 根據圖9~11,就機械強度與導電率之平衡之觀點而言,可認為熱處理溫度可為300℃以上且700℃以下,或亦可為400℃以上且600℃以下,或亦可為450℃以上且550℃以下,或亦可為450℃以上且500℃以下。 以上對本發明之實施形態進行了說明,但應認為本次所揭示之實施形態於所有方面而言均為例示而非限制性者。意指本發明之範圍藉由申請專利範圍表示,包含與申請專利範圍均等之含義及範圍內之所有變更。Hereinafter, an embodiment of the present invention (hereinafter referred to as "this embodiment") will be described. However, the following description does not limit the scope of the invention. First, the passage of this embodiment will be described. More copper is used in mechanical parts that require mechanical strength and higher electrical conductivity. Examples of the mechanical component including copper include a welding gun, a component of a power distribution device, and the like. First, the researchers studied the fabrication of laminates from pure copper powder. However, the desired laminate is not obtained by pure copper powder. Specifically, the laminate formed of pure copper powder has a large number of voids, and the density of the dense melted material is greatly reduced. The decrease in density means a decrease in mechanical strength (e.g., tensile strength, etc.). Further, the electrical conductivity of the molten material is also greatly reduced relative to the dense molten material. In order to improve density and conductivity, the researchers studied various manufacturing conditions. However, the processing properties are unstable under any of the manufacturing conditions, and it is difficult to achieve an improvement in density and conductivity. Therefore, researchers have studied copper alloy powder. As a result, it has been found that by using a copper alloy powder having a specific composition, a laminate having a practical density and conductivity can be produced; and further, by using a heat treatment of the laminate on a specific temperature or higher, the mechanical strength of the laminate can be remarkably improved. Conductivity. The present embodiment will be described in detail below. <Copper alloy powder> The copper alloy powder of the present embodiment corresponds to a toner or ink of a two-dimensional printer. In the present embodiment, the method for producing the copper alloy powder having the specific composition described below is not particularly limited. The copper alloy powder can be produced, for example, by a gas atomization method or a water atomization method. For example, a molten copper alloy is first prepared. Place the melt in the feed tank. The melt is added dropwise from the feed tank. The molten metal in the dropwise addition is brought into contact with a high pressure gas or high pressure water. Thereby, the melt is quenched and solidified to form a copper alloy powder. Further, a copper alloy powder can also be produced by a plasma atomization method, a centrifugal force atomization method, or the like. In the present embodiment, a copper alloy powder having a specific composition is used. That is, the copper alloy powder contains a powder of more than 1.00% by mass and 2.80% by mass or less of chromium (Cr) and the remaining copper (Cu) copper alloy. The remainder may contain impurity elements in addition to Cu. The impurity element may be, for example, an element (hereinafter referred to as "addition element") which is intentionally added at the time of manufacture of the copper alloy powder. That is, the remaining portion may also contain Cu and added elements. Examples of the additive element include nickel (Ni), zinc (Zn), tin (Sn), silver (Ag), beryllium (Be), zirconium (Zr), aluminum (Al), cerium (Si), and cobalt (Co). ), titanium (Ti), magnesium (Mg), tellurium (Te), and the like. The impurity element may be, for example, an element which is inevitably mixed in the production of the copper alloy powder (hereinafter referred to as "inevitable impurity element"). That is, the remaining portion may also contain Cu and inevitable impurity elements. Examples of the unavoidable impurity element include oxygen (O), phosphorus (P), and iron (Fe). The remainder may also contain Cu, added elements, and inevitable impurity elements. The copper alloy powder may contain, for example, a total of less than 0.30% by mass of an additive element and an unavoidable impurity element. For example, the oxygen content of the copper alloy powder can be measured by the method of "JIS H 1067: Oxygen quantification method in copper". The Cr content of the copper alloy powder is measured by an ICP (Inductively Coupled Plasma) luminescence analysis method in accordance with "JIS H 1071: Method for Quantizing Chromium in Copper and Copper Alloys". The Cr content was measured at least 3 times. The average value of at least 3 times is used as the Cr content. The Cr content may be 1.01% by mass or more, or may be more than 1.05% by mass, or may be 1.10% by mass or more, or may be 1.20% by mass or more, or may be 1.22% by mass or more, or may be 1.78% by mass or more. The Cr content may be 2.70% by mass or less, or may be 2.60% by mass or less, or may be 2.30% by mass or less, or may be 2.00% by mass or less, or may be 1.90% by mass or less, or may be 1.80% by mass or less, or 1.78% by mass or less, or 1.46% by mass or less. The Cu content of the copper alloy powder can be measured by the method of "JIS H 1051: Method for Quantifying Copper in Copper and Copper Alloys". The Cu content was measured at least 3 times. The average of at least 3 times is used as the Cu content. The Cu content may be, for example, more than 97.9 mass% and less than 99.0 mass%. The copper alloy powder may have an average particle diameter of, for example, 1 to 200 μm. The "average particle diameter" indicates a particle diameter which is 50% accumulated from the particle side in the particle size distribution of the volume basis measured by the laser diffraction scattering method. The following average particle diameter can also be referred to as "d50". D50 can be adjusted, for example, by gas pressure, classification, or the like at the time of gas atomization. D50 can also be adjusted according to the lamination distance of the laminate. D50 may be, for example, 5 to 50 μm, or may be 50 to 100 μm, or may be 100 to 200 μm. The shape of the particles is not particularly limited. The particles may be substantially spherical or may be irregularly shaped. <Manufacturing Method of Laminated Shaped Article> Fig. 1 is a flow chart showing the outline of a method for producing a laminated formed article of the present embodiment. The manufacturing method of this embodiment includes the first step (S100) and the second step (S200). The manufacturing method of the present embodiment may further include the third step (S300) after the second step (S200). The steps are described in order below. <<First Step (S100)>> In the first step (S100), the copper alloy powder is prepared. <<Second Step (S200)>> In the second step (S200), a layered shaped article is produced from a copper alloy powder. The powder bed fusion bonding method will be described here. Additional manufacturing methods other than the powder bed fusion bonding method can also be used. For example, a directional energy deposition method or the like can also be used. Cutting can also be carried out in the forming process. The aspect in which the copper alloy powder is cured by laser is described here. The laser is only an example, and the curing mechanism is not limited to the laser as long as the copper alloy powder can be cured. For example, an electron beam, a plasma, or the like can also be used. (Data Processing (S201)) First, three-dimensional shape data is produced by 3D-CAD or the like. The three-dimensional shape data can also be converted into STL data, for example. Figure 2 is an example of STL data. In the STL data, for example, element division using the finite element method (so-called "meshing") can be performed. Sliced data was made from STL data. Figure 3 is an example of slice data. The STL data is divided into n layers. That is, the STL data is divided into the first forming layer p1, the second forming layer p2, and the nth forming layer pn. The thickness (slice thickness d) of each layer may be, for example, 10 to 150 μm. (Formation of Powder Layer (S202)) A powder layer containing a copper alloy powder is formed. Fig. 4 is a first schematic view showing a manufacturing process of a laminate. The laser laminated forming apparatus 100 includes a piston 101, a stage 102, and a laser output unit 103. Stage 102 is supported by piston 101. The piston 101 is constructed in such a manner as to be able to lift the table 102. The laminate is shaped on the stage 102. The formation of the powder layer (S202) and the formation of the following shaped layer (S203) can also be carried out, for example, in an inert gas atmosphere. Used to suppress oxidation of laminates. The inert gas may be, for example, argon (Ar), nitrogen (N 2 ), helium (He) or the like. A reducing gas atmosphere can also be used instead of the inert gas atmosphere. The reducing gas is, for example, hydrogen (H 2 ) or the like. Further, a reduced pressure atmosphere may be used instead of the inert gas atmosphere. Based on the slice data, the piston 101 lowers the stage 102 by one layer. One layer of copper alloy powder is spread on the stage 102. Thereby, the first powder layer 1 containing the copper alloy powder is formed. For example, the surface of the first powder layer 1 may be smoothed by a compacting blade (not shown) or the like. The first powder layer 1 may also be formed substantially only of a copper alloy powder. The first powder layer 1 may contain a laser absorbing material (for example, a resin powder or the like) in addition to the copper alloy powder. (Formation of a forming layer (S203)) A forming layer is then formed. The shaped layer forms part of the laminated body. Fig. 5 is a second schematic view showing a manufacturing process of a laminate. The laser output unit 103 irradiates the laser beam to the specific position of the first powder layer 1 based on the slice data. The first powder layer 1 may be heated in advance before the irradiation of the laser light. The copper alloy powder irradiated with the laser light is solidified by melting or sintering. Thereby, the first shaped layer p1 is formed. That is, the shaped layer is formed by solidifying the copper alloy powder at a specific position in the powder layer. The laser output 103 can be a general purpose laser device. The light source of the laser light may be, for example, a fiber laser, a YAG (Yttrium Aluminum Garnet) laser, a CO 2 laser, a semiconductor laser, a green laser, or the like. The output of the laser light may be, for example, 20 to 1000 W, or may be 200 to 500 W. The scanning speed of the laser light can be adjusted, for example, in the range of 50 to 2000 mm/s. The energy density of the laser light can be adjusted within the range of 10 to 2000 J/mm 3 . The energy density is calculated by the following formula (I): E=P÷(v×s×d)·(I). In the formula (I), "E" represents the energy density of the laser light [unit: J/mm 3 ]. "P" indicates the output of the laser [unit: W]. "v" indicates the scanning speed [unit: mm/s]. "s" indicates the scanning width [unit: mm]. "d" indicates the slice thickness [unit: mm]. Fig. 6 is a third schematic view showing a manufacturing process of a laminated formed article. After the first forming layer p1 is formed, the piston 101 lowers the stage 102 by one layer. The second powder layer 2 is formed in the same order as described above, and then the second shaped layer p2 is formed. Thereafter, the formation of the powder layer (202) and the formation of the shaped layer (203) are repeated in this order, and the formed layer is laminated to produce a laminate. Fig. 7 is a fourth schematic view showing a manufacturing process of a laminate. Finally, the build-up article 10 is completed by laminating the n-th build layer pn. In the present embodiment, since the copper alloy powder having a specific composition is used, the laminated formed article 10 can have a relatively high relative density. <<Third Step (S300)>> The manufacturing method of the present embodiment may further include a third step of heat-treating the laminated shaped object (S300). Thereby, it is expected that the mechanical strength (for example, tensile strength, Vickers hardness, etc.) of the laminated shaped article and the electrical conductivity of the laminated shaped article are drastically improved. In the present embodiment, a general heat treatment furnace can be used. The heat treatment temperature was measured by a temperature sensor attached to the heat treatment furnace. For example, when the set temperature of the heat treatment furnace is 300 ° C, it is considered that the laminate is heat-treated at 300 ° C. The laminate may be heat treated for, for example, 1 minute or more and 10 hours or less, or may be heat treated for 10 minutes or more and 5 hours or less, or may be heat treated for 30 minutes or more and 3 hours or less, or may be accepted for 1 hour. Heat treatment above and below 2 hours. The atmosphere of the heat treatment may be, for example, air, nitrogen, argon, hydrogen, vacuum, or the like. In the third step, the laminate may be heat-treated at a temperature of 300 ° C or higher, or may be heat-treated at a temperature of 400 ° C or higher, or may be heat-treated at a temperature of 450 ° C or higher. Thereby, further improvement in mechanical strength and electrical conductivity can be expected. In the third step, the laminate may be heat-treated at a temperature of 700 ° C or lower, or may be heat-treated at a temperature of 600 ° C or lower, or may be heat-treated at a temperature of 550 ° C or lower. Thereby, for example, the balance between the mechanical strength and the electrical conductivity can be expected to be improved. The laminate may also be heat treated using a temperature in excess of 700 °C. However, the use of a temperature exceeding 700 ° C also has the possibility that the effect of improving mechanical strength and electrical conductivity becomes small. <Laminated molded article> The laminated formed article of the present embodiment is typically produced by the above-described production method. The laminated article of the present embodiment may have a complicated shape that cannot be realized by cutting. Further, the laminate product of the present embodiment is excellent in both mechanical strength and electrical conductivity. An example of the laminated article of the present embodiment may be a plasma gun. (Composition) The laminate product contains a copper alloy. The laminate product contains more than 1.00% by mass and 2.80% by mass or less of Cr, and the remainder of Cu. Like the above copper alloy powder, the remaining portion may also contain at least one of an additive element and an unavoidable impurity element. The Cr content of the laminate was measured by the same measurement method as the method for measuring the Cr content of the copper alloy powder. The Cr content may be 1.01% by mass or more, or may be more than 1.05% by mass, or may be 1.10% by mass or more, or may be 1.20% by mass or more, or may be 1.22% by mass or more, or may be 1.78% by mass or more. The Cr content may be 2.70% by mass or less, or may be 2.60% by mass or less, or may be 2.30% by mass or less, or may be 2.00% by mass or less, or may be 1.90% by mass or less, or may be 1.80. The mass% or less may be 1.78% by mass or less, or may be 1.46% by mass or less. The Cu content of the laminate can also be measured by the same measurement method as the method for measuring the Cu content of the copper alloy powder. The Cu content may be, for example, more than 97.9 mass% and less than 99.0 mass%. (Relative Density) The laminate has a relative density of 96% or more and 100% or less with respect to the theoretical density of the copper alloy. The "relative density" is calculated by dividing the measured density of the laminated object by the theoretical density. The theoretical density indicates the density of the molten material having the same composition as the laminate. The measured density was measured by the method of "JIS Z 2501: sintered metal material - density, oil content, and open porosity test method". The liquid uses water. The relative density was measured at least 3 times. The average of at least 3 times is used as the relative density. A laminate having a relatively high density is suitable for parts requiring higher airtightness. Moreover, the higher the relative density, the more mechanical strength can be expected. The relative density may be 97% or more, or may be 98% or more, or may be 99% or more, or may be 99.2% or more, or may be 99.4% or more, or may be 99.8% or more. (Mechanical strength) The laminate can have excellent mechanical strength. For example, the laminate may have a tensile strength of 250 MPa or more. That is, the laminated article of the present embodiment may have a tensile strength equal to or higher than that of oxygen-free copper (Unified Numbering System No. C10200). The "tensile strength" was measured by the following procedure. In the measurement, a tensile test device of a grade 1 or higher specified in "JIS B 7721: Tensile Tester, Compression Tester - Calibration Method and Verification Method of Force Measurement System" is used. Fig. 8 is a plan view of a test piece used in a tensile test. The dumbbell-shaped test piece 20 shown in Fig. 8 was prepared. The dumbbell-shaped test piece 20 was attached to a jig of a tensile test apparatus. A shape suitable for the shape of the dumbbell-shaped test piece 20 is used for the jig. The dumbbell-shaped test piece 20 is attached in such a manner as to apply tensile stress to its axial direction. The dumbbell-shaped test piece 20 was pulled at a speed of 2 mm/min. The tension was continuously pulled until the dumbbell-shaped test piece 20 was broken. The maximum tensile stress exhibited until the dumbbell-shaped test piece 20 was broken was measured. The tensile strength was calculated by dividing the maximum tensile stress by the cross-sectional area of the parallel portion 21. The cross-sectional area of the parallel portion 21 is 9.616 mm 2 (= π × 3.5 mm × 3.5 mm ÷ 4). The tensile strength was measured at least 3 times. The average of at least 3 times is used as the tensile strength. Further, the dimensions of the respective portions of the dumbbell-shaped test piece 20 are as follows. Total length (L0) of the dumbbell-shaped test piece 20: 36 mm Length of the parallel portion 21 (L1): 18 ± 0.5 mm Diameter of the parallel portion 21 (D1): 3.5 ± 0.05 mm Radius of the shoulder portion 23 (R): 10 mm Length of the grip portion 22 (L2): 4.0 mm Diameter of the grip portion 22 (D2): 6.0 mm The tensile strength can be adjusted by the heat treatment temperature of the third step. The tensile strength may be, for example, 300 MPa or more, or may be 400 MPa or more, or may be 600 MPa or more, or may be 700 MPa or more. The tensile strength may be, for example, 800 MPa or less, or may be 750 MPa or less. The laminate can have a Vickers hardness of 90 HV or more. "Vickers hardness" is measured by the method of "JIS Z 2244: Vickers hardness test - test method". The Vickers hardness can also be adjusted by the heat treatment temperature of the third step. The Vickers hardness may be, for example, 100 HV or more, or may be 150 HV or more, or may be 200 HV or more, or may be 250 HV or more. The Vickers hardness may be, for example, 300 HV or less. (Electrical conductivity) The laminate has a conductivity of 10% IACS or more. "Electrical conductivity" is measured by a commercially available eddy current conductivity meter. The electrical conductivity of the Annealed Copper Standard (IACS) was used as a reference to evaluate the electrical conductivity. That is, the electrical conductivity of the laminate is expressed as a percentage of the electrical conductivity of the IACS. For example, the conductivity of the laminate is 50% IACS means that the conductivity of the laminate is one-half the conductivity of the IACS. The conductivity was measured at least 3 times. The average value of at least 3 times is used as the conductivity. The conductivity can be adjusted by the heat treatment temperature of the third step. The laminate may have a conductivity of 20% IACS or more, or may have a conductivity of 30% IACS or more, or may have a conductivity of 50% IACS or more, or may have a conductivity of 70% IACS or more, or It may also have a conductivity of 80% IACS or more, or may have a conductivity of 90% IACS or more. The laminate may, for example, also have a conductivity of 100% IACS or less. [Examples] Hereinafter, examples will be described. However, the following examples do not limit the scope of the invention. A laminate is produced according to the flow chart shown in FIG. First, copper alloy powders A1 to A7 (S100) containing the chemical components shown in Table 1 below were prepared. These copper alloy powders are produced by a specific atomization method. Pure copper powder X and copper alloy powder Y were also prepared for comparison. Pure copper powder X is a powder based on commercially available pure copper. The copper alloy powder Y is a powder of a commercially available copper alloy (product name "AMPCO 940"). Hereinafter, these powders are collectively referred to as "metal powders". [Table 1] Prepare the laser laminate forming device of the following specifications. Laser: Fiber laser, maximum output 400 W Dot diameter: 0.05 to 0.20 mm Scanning speed: ~7000 mm/s Laminated distance: 0.02 to 0.08 mm Dimensions: 250 mm × 250 mm × 280 mm 1. Pure copper powder X In three-dimensional shape data (S201). The (i) formation of the powder layer containing the metal powder (S202), and (ii) formation of the shaped layer by solidification of the metal powder at a specific position by the powder layer (S203), and lamination of the shaped layer. Thus, a laminate of No. X-1 to X-40 (S200) was produced from pure copper powder X. The laminated body is a cylinder with a diameter of 14 mm × a height of 15 mm (the same laminated material is the same unless otherwise specified). The manufacturing conditions of the laminate are shown in Tables 2 and 3 below. The relative density and conductivity of the laminate were measured according to the above method. The results are shown in Tables 2 and 3 below. [Table 2] [table 3] As shown in the above Tables 2 and 3, in the laminate product produced by the pure copper powder X, even if the production conditions are fixed, the physical properties of the workpiece are unstable, and the range is not uniform. In the column of "relative density" in Tables 2 and 3, "unmeasurable" means that the laminated body has a large number of voids, so that it is impossible to measure the density with high reliability. It is considered that pure copper has a conductivity of 100% IACS. The laminate produced by pure copper powder X has a significantly lower electrical conductivity than pure copper. It is considered that it is difficult to manufacture a practical mechanical part by pure copper powder X. 2. Copper alloy powder Y (powder of commercially available copper alloy) A laminate of No. Y-1 to Y-7 was produced in the same manner as described above by the production conditions shown in Table 4 below. The laminate was subjected to heat treatment for 3 hours in a nitrogen atmosphere by using the temperature shown in the column of "heat treatment temperature" in Table 4 below (S300). The laminate formed as "None" in the column of "heat treatment temperature" is not subjected to heat treatment. The relative density and conductivity of the laminate were measured according to the above method. The results are shown in Table 4 below. [Table 4] As shown in the above Table 4, the electrical conductivity of the laminate formed by the copper alloy powder Y (a commercially available copper alloy powder) was significantly lower than that of the commercially available copper alloy (about 45.5% IACS). 3. Copper alloy powder A1 (Cr content: 0.22% by mass) A laminate product of No. A1-1 to A1-14 was produced in the same manner as described above by the production conditions shown in Table 5 below. The laminate was heat-treated for 3 hours in a nitrogen atmosphere by using the temperature shown in the column of "heat treatment temperature" in Table 5 below. The relative density, electrical conductivity and tensile strength were measured according to the methods described above. The tensile strength was measured in a separately prepared dumbbell-shaped test piece 20 (see Fig. 8) (the same applies hereinafter). The results are shown in Table 5 below. [table 5] As shown in the above Table 5, the unevenness of the processed physical properties was suppressed in the laminated body produced by the copper alloy powder A1. These laminates are believed to have mechanical strength and electrical conductivity that can be used as mechanical parts. 4. Copper alloy powder A2 (Cr content: 0.51% by mass) A laminate product of No. A2-1 to A2-12 was produced in the same manner as described above by the production conditions shown in Table 6 below. The laminate was heat-treated for 3 hours in a nitrogen atmosphere by using the temperature shown in the column of "heat treatment temperature" in Table 6 below. The relative density, electrical conductivity and tensile strength were measured according to the methods described above. The results are shown in Table 6 below. [Table 6] As shown in the above Table 6, the unevenness of the processed physical properties was suppressed in the laminated body produced by the copper alloy powder A2. These laminates are believed to have mechanical strength and electrical conductivity that can be used as mechanical parts. 5. Copper alloy powder A3 (Cr content: 0.94% by mass) A laminate product of No. A3-1 to A3-7 was produced in the same manner as described above by the production conditions shown in Table 7 below. The laminate was heat-treated for 3 hours in a nitrogen atmosphere by using the temperature shown in the column of "heat treatment temperature" in Table 7 below. The relative density, electrical conductivity and tensile strength were measured according to the methods described above. The results are shown in Table 7 below. [Table 7] As shown in the above Table 7, the unevenness of the processed physical properties was suppressed in the laminated body produced by the copper alloy powder A3. These laminates are believed to have mechanical strength and electrical conductivity that can be used as mechanical parts. 6. Study of Heat Treatment Temperature A laminate product was produced by the production conditions shown in Tables 8, 9, and 10 below. The relative density of the laminates was measured by the above method. Further, the laminate was subjected to heat treatment for 1 hour in a nitrogen atmosphere by using the temperatures shown in the columns of "heat treatment temperatures" in Tables 8, 9, and 10 below. After the heat treatment, the tensile strength, electrical conductivity, and Vickers hardness of the laminate were measured. Further, the method of measuring the Vickers hardness is as described above. The results are shown in Tables 8, 9, and 10 below. [Table 8] [Table 9] [Table 10] As shown in the above Tables 8, 9 and 10, the laminate product containing a copper alloy and having a Cr content of more than 1.00% by mass and 2.80% by mass or less has a stable relative density of 99% or more and 100% or less. It has been confirmed that the mechanical strength and the electrical conductivity are greatly improved by further heat-treating the laminated shaped article by using a temperature of 300 ° C or higher. The results will be described below with reference to Figs. In Figs. 9 to 11, for example, "1.5Cr" as an example means that the Cr content is 1.46% by mass. For convenience, it is rounded off to the second decimal place in the case. The laminate formed without heat treatment is considered to have been heat-treated at 25 ° C and made into a graph. Fig. 9 is a graph showing the relationship between the heat treatment temperature and the electrical conductivity in the third step. In the range where the heat treatment temperature is 300 ° C or more, the electrical conductivity of the laminate is remarkably improved. When the heat treatment temperature is 700 ° C, the effect of improving the conductivity can also be confirmed. Therefore, the upper limit of the heat treatment temperature may also be 700 °C. Among them, it is expected that an effect of improving conductivity can be obtained in a range in which the heat treatment temperature exceeds 700 °C. Fig. 10 is a graph showing the relationship between the heat treatment temperature and the tensile strength in the third step. As shown in Fig. 10, in the range of the heat treatment temperature of 300 ° C or more, the tensile strength of the laminate was remarkably improved. The increase in the tensile strength at the heat treatment temperature from 400 ° C to 450 ° C is particularly remarkable. The tensile strength peaked around 500 ° C and then decreased steadily thereafter. Fig. 11 is a graph showing the relationship between the heat treatment temperature and the Vickers hardness in the third step. Vickers hardness also shows the same tendency as tensile strength. 9 to 11, from the viewpoint of the balance between the mechanical strength and the electrical conductivity, the heat treatment temperature may be 300 ° C or more and 700 ° C or less, or may be 400 ° C or more and 600 ° C or less, or may be 450. °C or more and 550 ° C or less, or 450 ° C or more and 500 ° C or less. The embodiments of the present invention have been described above, but the embodiments disclosed herein are intended to be illustrative and not restrictive. It is intended that the scope of the invention be defined by the scope of the claims

1‧‧‧第1粉末層1‧‧‧1st powder layer

2‧‧‧第2粉末層2‧‧‧2nd powder layer

10‧‧‧積層造形物10‧‧‧Multilayered objects

20‧‧‧啞鈴狀試片20‧‧‧Dumbbell test piece

21‧‧‧平行部21‧‧‧Parallel

22‧‧‧夾持部22‧‧‧Clamping Department

23‧‧‧肩部23‧‧‧ Shoulder

100‧‧‧雷射積層造形裝置100‧‧‧Laser laminated device

101‧‧‧活塞101‧‧‧Piston

102‧‧‧台102‧‧‧

103‧‧‧雷射輸出部103‧‧‧Laser output

d‧‧‧切片厚度D‧‧‧ slice thickness

D1‧‧‧平行部21之直徑D1‧‧‧diameter of parallel section 21

D2‧‧‧夾持部22之直徑D2‧‧‧diameter of the clamping portion 22

L0‧‧‧啞鈴狀試片20之總長The total length of the L0‧‧‧ dumbbell test piece 20

L1‧‧‧平行部21之長度Length of parallel section 21 of L1‧‧

L2‧‧‧夾持部22之長度L2‧‧‧ Length of the clamping portion 22

p1‧‧‧第1造形層P1‧‧‧1st layer

p2‧‧‧第2造形層P2‧‧‧2nd layer

pn‧‧‧第n造形層Pn‧‧‧ nth layer

R‧‧‧肩部23之半徑R‧‧‧ Radius of the shoulder 23

圖1係表示本發明之實施形態之積層造形物之製造方法之概略之流程圖。 圖2係STL(Standard Template Library,標準模板庫)資料之一例。 圖3係切片資料之一例。 圖4係圖解積層造形物之製造過程之第1概略圖。 圖5係圖解積層造形物之製造過程之第2概略圖。 圖6係圖解積層造形物之製造過程之第3概略圖。 圖7係圖解積層造形物之製造過程之第4概略圖。 圖8係拉伸試驗所使用之試片之俯視圖。 圖9係表示第3步驟之熱處理溫度與導電率之關係之曲線圖。 圖10係表示第3步驟之熱處理溫度與拉伸強度之關係之曲線圖。 圖11係表示第3步驟之熱處理溫度與維氏硬度之關係之曲線圖。Fig. 1 is a flow chart showing the outline of a method for producing a laminated article according to an embodiment of the present invention. FIG. 2 is an example of an STL (Standard Template Library) data. Figure 3 is an example of slice data. Fig. 4 is a first schematic view showing a manufacturing process of a laminate. Fig. 5 is a second schematic view showing a manufacturing process of a laminate. Fig. 6 is a third schematic view showing a manufacturing process of a laminated formed article. Fig. 7 is a fourth schematic view showing a manufacturing process of a laminate. Fig. 8 is a plan view of a test piece used in a tensile test. Fig. 9 is a graph showing the relationship between the heat treatment temperature and the electrical conductivity in the third step. Fig. 10 is a graph showing the relationship between the heat treatment temperature and the tensile strength in the third step. Fig. 11 is a graph showing the relationship between the heat treatment temperature and the Vickers hardness in the third step.

Claims (7)

一種積層造形物,其係包含銅合金者,且 含有多於1.00質量%且2.80質量%以下之鉻、及其餘部分之銅, 相對於上述銅合金之理論密度具有96%以上且100%以下之相對密度,且 具有10%IACS以上之導電率。A laminated article comprising a copper alloy and containing more than 1.00% by mass and 2.80% by mass or less of chromium, and the balance of copper having a theoretical density of 96% or more and 100% or less with respect to the theoretical density of the copper alloy. Relative density, and has a conductivity of 10% IACS or more. 如請求項1之積層造形物,其含有多於1.05質量%且2.80質量%以下之鉻。The laminate according to claim 1, which contains more than 1.05 mass% and 2.80 mass% or less of chromium. 如請求項1之積層造形物,其含有多於1.00質量%且2.00質量%以下之鉻。The laminate according to claim 1, which contains more than 1.00% by mass and 2.00% by mass or less of chromium. 如請求項3之積層造形物,其含有多於1.05質量%且2.00質量%以下之鉻。The laminate according to claim 3, which contains more than 1.05 mass% and 2.00 mass% or less of chromium. 如請求項1或2之積層造形物,其具有30%IACS以上之導電率。A laminate according to claim 1 or 2 which has a conductivity of 30% IACS or more. 如請求項1或2之積層造形物,其具有50%IACS以上之導電率。A laminate according to claim 1 or 2 which has a conductivity of 50% IACS or more. 如請求項1或2之積層造形物,其具有70%IACS以上之導電率。A laminate according to claim 1 or 2 which has a conductivity of 70% IACS or more.
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