TW201836751A - Laser scribing apparatus - Google Patents
Laser scribing apparatus Download PDFInfo
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- TW201836751A TW201836751A TW106126282A TW106126282A TW201836751A TW 201836751 A TW201836751 A TW 201836751A TW 106126282 A TW106126282 A TW 106126282A TW 106126282 A TW106126282 A TW 106126282A TW 201836751 A TW201836751 A TW 201836751A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0007—Applications not otherwise provided for
Abstract
Description
本發明涉及一種雷射劃刻裝置。更具體地,本發明涉及一種雷射劃刻裝置,其測量與脆性材料基板的距離並且根據與脆性材料基板的距離來主動調節雷射的焦距。 The invention relates to a laser scribing device. More specifically, the present invention relates to a laser scribing device that measures a distance from a brittle material substrate and actively adjusts a focal length of the laser according to the distance from the brittle material substrate.
存在雷射作為切割待切割的物體的方法而被用於精密切割的情形。使用雷射的切割不僅用於切割金屬板材,而且用於切割諸如玻璃的脆性材料。 There are cases where a laser is used for precision cutting as a method of cutting an object to be cut. Laser cutting is used not only for cutting sheet metal but also for brittle materials such as glass.
例如,利用雷射來切割諸如液晶顯示裝置的平面顯示面板。現有技術中的用於切割液晶顯示裝置的劃刻裝置在對基板表面施加預定壓力的同時以可旋轉的方式移動由鑽石或硬質合金製成的刀輪,以在基板表面上形成刻線並通過斷裂過程來切割基板。 For example, a laser is used to cut a flat display panel such as a liquid crystal display device. The scoring device for cutting a liquid crystal display device in the prior art moves a cutter wheel made of diamond or cemented carbide in a rotatable manner while applying a predetermined pressure to a substrate surface to form a score line on the substrate surface and pass Breaking process to cut the substrate.
在這方面,使用雷射的劃刻裝置通過向基板照射雷射並利用冷卻氣體等冷卻基板來產生熱應力,以在基板中形成裂縫。可替代地,提出了通過向基板順序地照射不同雷射來切割基板。同時,在一些情況下,可以利用雷射來切割粘接構成液晶顯示裝置的兩塊基板的密封劑或者形成在基板中的黑色矩陣等,並且此後可以利用刀輪來切割基板。 In this regard, a scribe device using a laser generates thermal stress by irradiating a substrate with a laser and cooling the substrate with a cooling gas or the like to form a crack in the substrate. Alternatively, it is proposed to cut the substrate by sequentially irradiating the substrate with different lasers. Meanwhile, in some cases, a laser may be used to cut a sealant that bonds two substrates constituting a liquid crystal display device or a black matrix formed in the substrate, and the like, and thereafter the substrate may be cut by a cutter wheel.
然而,當待切割的基板不平時或者當需要控制雷射照射深度時,存在難以立即調整的問題。 However, when the substrate to be cut is uneven or when the laser irradiation depth needs to be controlled, there is a problem that it is difficult to adjust immediately.
例如,韓國專利公開公報No.10-2005-0106156(“用於在平面型顯示器的製造過程中切割玻璃基板的裝置以及用於控制玻璃基板的切割深度的方法”,公佈於2005年11月9日)公開了一種結構,其包括一種提升裝置,該提升裝置測量離基板的距離並且提升照射雷射光束的照射孔的高度,以控制雷射光束的焦距。 For example, Korean Patent Publication No. 10-2005-0106156 ("A device for cutting a glass substrate in the manufacturing process of a flat-type display and a method for controlling the cutting depth of a glass substrate", published on November 9, 2005 Japan) discloses a structure including a lifting device that measures a distance from a substrate and raises a height of an irradiation hole that irradiates a laser beam to control a focal length of the laser beam.
然而,在現有技術中,機械地控制照射雷射光束的照射孔的高度在響應方面延遲,結果是難以提高基板切割速度。此外,在現有技術中,測量離基板的距離的距離傳感器與照射雷射光束的照射孔之間的水平距離是隔開的,結果是無法以準確深度來照射雷射光束。 However, in the related art, mechanically controlling the height of the irradiation hole that irradiates the laser beam is delayed in response, and as a result, it is difficult to increase the substrate cutting speed. In addition, in the prior art, the horizontal distance between the distance sensor that measures the distance from the substrate and the irradiation hole that irradiates the laser beam is separated, as a result, the laser beam cannot be irradiated at an accurate depth.
本發明的目的在於提供一種雷射劃刻裝置,其根據與基板的距離的測量結果來提高雷射照射深度控制精度。 An object of the present invention is to provide a laser scribing device, which improves the accuracy of laser irradiation depth control according to a measurement result of a distance from a substrate.
本發明的目的還在於提供一種雷射劃刻裝置,其通過根據與基板的距離的測量位置與用於切割的雷射照射位置之間的差異而使誤差最小化來提高劃線精度。 It is also an object of the present invention to provide a laser scribing device that improves scribing accuracy by minimizing an error according to a difference between a measurement position of a distance from a substrate and a laser irradiation position for cutting.
本發明的一個示例性實施方式提供了一種雷射劃刻裝置,其包括:劃線頭單元;以及托台,基板被裝載在該托台上,劃線頭單元相對於托台移動,並且劃線頭單元包括透鏡組件和距離測量傳感器組件,所述透鏡組件從雷射產生裝置接收切割用雷射光束以改變切割用雷射光束的焦點,所述距離測量傳感器組件包括距離測量傳感器並且具有光束通過單元,所述距離測量傳感器包括產生測量用雷射光束的光發射單元和接收測量用雷射光束的光接收單元,在透鏡組件中被控制焦距的切割用雷射光束 通過所述光束通過單元。 An exemplary embodiment of the present invention provides a laser scribing device including: a scribing head unit; and a pallet on which a substrate is loaded, the scribing head unit moves relative to the pallet, and scribing The wire head unit includes a lens assembly that receives a cutting laser beam from a laser generating device to change a focus of the cutting laser beam, and a distance measuring sensor assembly that includes a distance measuring sensor and has a light beam. A passing unit, the distance measuring sensor includes a light emitting unit that generates a laser beam for measurement and a light receiving unit that receives the laser beam for measurement, and a cutting laser beam whose focus is controlled in a lens assembly passes through the beam passing unit .
在示例性實施方式中,透鏡組件可以包括形成切割用雷射光束的焦點的聚焦透鏡和調整聚焦透鏡的位置的透鏡驅動單元。 In an exemplary embodiment, the lens assembly may include a focusing lens that forms a focus of the laser beam for cutting and a lens driving unit that adjusts a position of the focusing lens.
光發射單元可以以非直角的角度向基板照射測量用雷射光束,並且光接收單元可以以非直角的角度接收到達基板的測量用雷射光束。 The light emitting unit may irradiate the substrate with a measurement laser beam at an angle other than a right angle, and the light receiving unit may receive the measurement laser beam reaching the substrate at an angle other than a right angle.
光束通過單元可以形成在光發射單元與光接收單元之間。 The light beam passing unit may be formed between the light emitting unit and the light receiving unit.
向基板照射測量用雷射光束的點可以在切割用雷射光束的照射位置之前。 The point at which the laser beam for measurement is irradiated to the substrate may be before the irradiation position of the laser beam for cutting.
雷射劃刻裝置還可以包括從距離測量傳感器接收距離感測信息並且控制透鏡驅動單元的驅動的主控制單元。 The laser scoring device may further include a main control unit that receives distance sensing information from the distance measurement sensor and controls the driving of the lens driving unit.
在該示例性實施方式中,主控制單元可以通過考慮要向距離測量傳感器的感測點照射切割用雷射光束的時間來計算透鏡驅動單元的驅動完成時間。 In this exemplary embodiment, the main control unit may calculate the driving completion time of the lens driving unit by considering the time to irradiate the laser beam for cutting to the sensing point of the distance measurement sensor.
主控制單元可以通過考慮距離測量傳感器的處理時間Ts、主控制單元的處理時間Tm和時間Td來計算透鏡驅動單元的驅動完成時間,時間Td是直到通過從主控制單元輸出控制信號而實際地驅動透鏡驅動單元所需的時間。 The main control unit can calculate the driving completion time of the lens driving unit by considering the processing time Ts of the distance measurement sensor, the processing time Tm and the time Td of the main control unit. The time required for the lens drive unit.
主控制單元可以通過考慮距離測量傳感器的感測點與切割用雷射光束的照射點之間的距離來限定劃線頭單元與基板之間的相對移動速度的上限值。 The main control unit may define an upper limit value of the relative moving speed between the scribing head unit and the substrate by considering the distance between the sensing point of the distance measurement sensor and the irradiation point of the cutting laser beam.
主控制單元可以根據劃線頭單元與基板之間的相對移動速度來設定距離測量傳感器的感測週期。 The main control unit can set the sensing period of the distance measurement sensor according to the relative moving speed between the scribing head unit and the substrate.
根據本發明的示例性實施方式,能夠根據與基板的距離測量結果而快速和精確地控制雷射照射深度。 According to the exemplary embodiment of the present invention, it is possible to quickly and accurately control the laser irradiation depth according to the distance measurement result from the substrate.
根據本發明的示例性實施方式,能夠通過整合用於測量與基板的距離的距離測量傳感器和用於切割基板的雷射照射裝置,而使取決於距離測量位置與雷射照射位置之間的差異的誤差最小化。 According to the exemplary embodiment of the present invention, it is possible to make a difference depending on a distance measurement position and a laser irradiation position by integrating a distance measurement sensor for measuring a distance from a substrate and a laser irradiation device for cutting a substrate. The error is minimized.
根據本發明的示例性實施方式,通過綜合地考慮距離測量傳感器的感測週期、劃線頭單元相對於基板的相對移動速度、距離測量傳感器的感測點與切割用雷射光束的照射點之間的距離差等來精確地控制雷射光束的焦距。 According to an exemplary embodiment of the present invention, by comprehensively considering the sensing period of the distance measurement sensor, the relative moving speed of the scribe head unit relative to the substrate, the sensing point of the distance measurement sensor and the irradiation point of the cutting laser beam The distance between the laser beams can be used to precisely control the focal length of the laser beam.
結果,根據本發明的示例性實施方式,通過根據離諸如基板的被處理對象的距離改變切割用雷射光束的焦距而能夠在被處理對象中形成具有均勻深度的刻線。 As a result, according to the exemplary embodiment of the present invention, it is possible to form a score line with a uniform depth in a processed object by changing the focal length of the laser beam for cutting according to the distance from the processed object such as a substrate.
以上概述僅僅是說明性的,並且並非旨在以任何方式加以限制。除上述說明性的方面、實施方式和特徵以外,通過參考附圖和以下詳細描述,進一步的方面、實施方式和特徵將變得顯而易見。 The above summary is merely illustrative and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features will become apparent by reference to the drawings and the following detailed description.
1‧‧‧基板 1‧‧‧ substrate
2‧‧‧托台 2‧‧‧ pallet
10‧‧‧劃線頭單元 10‧‧‧ scribing head unit
12‧‧‧反射鏡 12‧‧‧Mirror
20‧‧‧距離測量傳感器組件 20‧‧‧Distance measurement sensor assembly
22‧‧‧距離測量傳感器 22‧‧‧Distance measurement sensor
24‧‧‧光發射單元 24‧‧‧light emitting unit
25‧‧‧測量用雷射光束 25‧‧‧ laser beam for measurement
26‧‧‧光接收單元 26‧‧‧light receiving unit
28‧‧‧光束通過單元 28‧‧‧ Beam Passing Unit
30‧‧‧透鏡組件 30‧‧‧ lens assembly
32‧‧‧聚焦透鏡 32‧‧‧ Focusing lens
34‧‧‧透鏡驅動單元 34‧‧‧ lens drive unit
40‧‧‧雷射產生裝置 40‧‧‧laser generating device
42‧‧‧切割用雷射光束 42‧‧‧ Cutting laser beam
50‧‧‧主控制單元 50‧‧‧Main Control Unit
F‧‧‧焦點 F‧‧‧ Focus
P1‧‧‧點 P1‧‧‧point
P2‧‧‧點 P2‧‧‧point
V‧‧‧相對移動速度 V‧‧‧ Relative moving speed
△L‧‧‧距離 △ L‧‧‧distance
S100、S102、S104、S106‧‧‧步驟 S100, S102, S104, S106 ‧‧‧ steps
圖1是示出了根據本發明的示例性實施方式的雷射劃刻裝置的配置的示意圖。 FIG. 1 is a schematic diagram illustrating a configuration of a laser scribing device according to an exemplary embodiment of the present invention.
圖2是示出了設置在根據本發明的示例性實施方式的雷射劃刻裝置中的距離測量傳感器組件的配置的示意圖。 FIG. 2 is a schematic diagram illustrating a configuration of a distance measurement sensor assembly provided in a laser scoring device according to an exemplary embodiment of the present invention.
圖3是示出了根據本發明的示例性實施方式的雷射劃刻裝置的控制配 置的方塊圖。 Fig. 3 is a block diagram showing a control configuration of a laser scoring device according to an exemplary embodiment of the present invention.
圖4是示出了根據本發明的示例性實施方式的雷射劃刻裝置的距離測量傳感器與雷射照射位置之間的關係的示意圖。 FIG. 4 is a schematic diagram illustrating a relationship between a distance measurement sensor of a laser scoring device and a laser irradiation position according to an exemplary embodiment of the present invention.
圖5是示出了根據本發明的另一個示例性實施方式的雷射劃刻裝置的控制方法的流程圖。 FIG. 5 is a flowchart illustrating a control method of a laser scribing device according to another exemplary embodiment of the present invention.
應當理解的是,附圖不一定按比例繪製,從而呈現說明本發明的基本原理的各種特徵的稍微簡化的表示。如本文中公開的本發明的特定設計特徵(例如包括特定尺寸、取向、位置和形狀)將部分地由具體的預期應用和使用環境來決定。 It should be understood that the drawings are not necessarily drawn to scale, thereby presenting a slightly simplified representation of various features illustrating the basic principles of the invention. The specific design features of the invention, as disclosed herein, including, for example, specific sizes, orientations, locations, and shapes, will be determined in part by the particular intended application and use environment.
在圖中,全部附圖的多個圖中的參考符號表示本發明的相同或相當的部件。 In the figures, reference characters in the several figures of the whole drawing denote the same or equivalent parts of the present invention.
以下將參照附圖詳細描述本發明的示例性實施方式。首先,當參考符號表示每一個圖的組件時,應指出的是,儘管相同的組件在不同的圖中被示出,但是盡可能由相同的參考符號表示相同的組件。此外,在以下描述中,可以省略已知的相關配置和功能的詳細說明,以避免不必要地模糊本發明的主題。此外,以下將描述本發明的示例性實施方式,但本發明的技術精神不限於此或由其限制,並且本領域的技術人員可以修改和以各種方式實施示例性實施方式。 Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. First, when the reference symbol indicates a component of each figure, it should be noted that although the same component is shown in different drawings, the same component is denoted by the same reference symbol as much as possible. In addition, in the following description, detailed descriptions of known related configurations and functions may be omitted to avoid unnecessarily obscuring the subject matter of the present invention. In addition, exemplary embodiments of the present invention will be described below, but the technical spirit of the present invention is not limited thereto or limited thereto, and those skilled in the art can modify and implement the exemplary embodiments in various ways.
圖1是示出了根據本發明的示例性實施方式的雷射劃刻裝置的配置的示意圖,而圖2是示出了設置在根據本發明的示例性實施方式的雷射劃刻裝置中的距離測量傳感器組件的配置的示意圖。 FIG. 1 is a schematic diagram illustrating a configuration of a laser scoring device according to an exemplary embodiment of the present invention, and FIG. 2 is a diagram illustrating a laser scoring device provided in the exemplary embodiment of the present invention. Schematic diagram of the configuration of the distance measurement sensor assembly.
根據本發明的示例性實施方式的雷射劃刻裝置包括:基板1被裝載到其上的托台2和設置成相對於托台2移動的劃線頭單元10。托台2是固定的且劃線頭單元10是可移動的、劃線頭單元10是固定的且托台2是可移動的、或者托台2和劃線頭單元10兩者都是可移動的。劃線頭單元10可以設置在台架(未示出)中,台架設置成跨越托台2的上側。雷射劃刻裝置的基本配置可以遵循被描述為相關技術的韓國專利公開公報No.10-2005-0106156的圖1中所示的配置。 The laser scribing device according to the exemplary embodiment of the present invention includes a pallet 2 on which the substrate 1 is loaded and a scribing head unit 10 provided to move relative to the pallet 2. The pallet 2 is fixed and the scribing head unit 10 is movable, the scribing head unit 10 is fixed and the pallet 2 is movable, or both the pallet 2 and the scribing head unit 10 are movable of. The scribing head unit 10 may be provided in a stand (not shown) provided to straddle the upper side of the pallet 2. The basic configuration of the laser scribing device may follow the configuration shown in FIG. 1 of Korean Patent Laid-Open Publication No. 10-2005-0106156 described as a related art.
在理想情況下,裝載到托台2的頂部的基板1是共平面的,但在實際情況下,基板1與水平面有微小的高度差。根據本發明的雷射劃刻裝置根據與基板1的距離來調整切割用雷射光束的焦距,即切割用雷射光束的照射深度。這裡,切割用雷射光束的照射深度可以是基板的表面上或基板中的一個點,並且在一些情況下,切割用雷射光束的照射深度可以是用於將接合基板接合的密封劑的一個點或者是與基板中存在的黑色矩陣對應的位置。 Ideally, the substrate 1 loaded on the top of the pallet 2 is coplanar, but in reality, there is a slight height difference between the substrate 1 and the horizontal plane. The laser scoring device according to the present invention adjusts the focal length of the laser beam for cutting, that is, the irradiation depth of the laser beam for cutting according to the distance from the substrate 1. Here, the irradiation depth of the cutting laser beam may be one point on the surface of the substrate or in the substrate, and in some cases, the irradiation depth of the cutting laser beam may be one of the sealant used to bond the bonding substrate. The dots are positions corresponding to the black matrix existing in the substrate.
劃線頭單元10包括距離測量傳感器組件20和透鏡組件30,透鏡組件30設置在距離測量傳感器組件20的頂部上。此外,劃線頭單元10可以包括至少一個反射鏡12,至少一個反射鏡12用於將從單獨的雷射產生裝置40產生的切割用雷射光束42傳輸到透鏡組件30。 The scribing head unit 10 includes a distance measurement sensor assembly 20 and a lens assembly 30, and the lens assembly 30 is disposed on top of the distance measurement sensor assembly 20. In addition, the scribing head unit 10 may include at least one mirror 12 for transmitting the cutting laser beam 42 generated from the separate laser generating device 40 to the lens assembly 30.
距離測量傳感器組件20可以設置成固定於劃線頭單元10的托架類型。在距離測量傳感器組件20下方可設置有距離測量傳感器22,距離測量傳感器22包括光發射單元24和光接收單元26,光發射單元24以預定角度(例如非直角的角度)向基板1照射測量用雷射光束25,光接收單元26在 從光發射單元24產生的測量用雷射光束25在基板1上反射之後接收反射的測量用雷射光束25。在光發射單元24與光接收單元26之間設置有被垂直地穿透的光束通過單元28。 The distance measurement sensor assembly 20 may be provided in a bracket type fixed to the scribing head unit 10. A distance measurement sensor 22 may be provided below the distance measurement sensor assembly 20. The distance measurement sensor 22 includes a light emitting unit 24 and a light receiving unit 26. The light emitting unit 24 irradiates the substrate 1 with a measurement mine at a predetermined angle (such as an angle other than a right angle). The radiation beam 25 is received by the light receiving unit 26 after the measurement laser beam 25 generated from the light emitting unit 24 is reflected on the substrate 1. A light beam passing unit 28 is provided between the light emitting unit 24 and the light receiving unit 26 and penetrates vertically.
在透鏡組件30中被調整焦距的切割用雷射光束42通過光束通過單元28。 The cutting laser beam 42 whose focal length is adjusted in the lens unit 30 passes through the beam passing unit 28.
測量用雷射光束25和切割用雷射光束42可以優選地具有不同波段。這是為了在光接收單元26接收測量用雷射光束25時防止切割用雷射光束42的干涉。 The measurement laser beam 25 and the cutting laser beam 42 may preferably have different wavelength bands. This is to prevent interference of the cutting laser beam 42 when the light receiving unit 26 receives the measuring laser beam 25.
在透鏡組件30中設置有調整切割用雷射光束42的焦距的聚焦透鏡32。聚焦透鏡32可以是單個透鏡或通過組合多個透鏡而獲得的組件。此外,在透鏡組件30中設置有調整聚集透鏡32的位置的透鏡驅動單元(在圖1和圖2中未示出)。 The lens unit 30 is provided with a focusing lens 32 for adjusting the focal length of the laser beam 42 for cutting. The focusing lens 32 may be a single lens or a component obtained by combining a plurality of lenses. Further, a lens driving unit (not shown in FIGS. 1 and 2) that adjusts the position of the focusing lens 32 is provided in the lens assembly 30.
透鏡驅動單元設置成音圈型或線性馬達型,以調整聚焦透鏡32的位置。距離測量傳感器22測量與基板1的距離,而透鏡驅動單元根據測定的距離來調整聚焦透鏡32的位置,以調整向基板1照射的雷射光束42的焦距。 The lens driving unit is set to a voice coil type or a linear motor type to adjust the position of the focus lens 32. The distance measurement sensor 22 measures the distance from the substrate 1, and the lens driving unit adjusts the position of the focusing lens 32 according to the measured distance to adjust the focal length of the laser beam 42 irradiated to the substrate 1.
可以通過考慮劃線頭單元10與基板1之間的相對移動速度V來獲得透鏡驅動單元對聚焦透鏡32的位置調整時間。 The position adjustment time of the lens driving unit for the focus lens 32 can be obtained by considering the relative moving speed V between the scribe head unit 10 and the substrate 1.
在圖1中,示出的是,透鏡組件30位於距離測量傳感器組件20的頂部上,而通過透鏡組件30的切割用雷射光束42通過位於透鏡組件30的下方的光束通過單元28,結果,在基板1的預定位置處形成了焦點。然而,在本發明的示例性實施方式中,從透鏡組件30輸出的切割用雷射光束42可 以配置成在切割用雷射光束42的光路通過單獨的反射鏡(未示出)變換的同時通過光束通過單元28。 In FIG. 1, it is shown that the lens assembly 30 is located on the top of the distance measurement sensor assembly 20, and the cutting laser beam 42 passing through the lens assembly 30 passes through the beam passing unit 28 located below the lens assembly 30. As a result, A focus is formed at a predetermined position of the substrate 1. However, in the exemplary embodiment of the present invention, the cutting laser beam 42 output from the lens assembly 30 may be configured to pass while the optical path of the cutting laser beam 42 is changed by a separate mirror (not shown). The light beam passes through the unit 28.
在本發明中,距離測量傳感器22測量與基板1的距離的水平面上的位置和被切割用雷射光束42照射的水平面上的位置彼此間隔開。在示例性實施方式中,距離測量傳感器22測量與基板1的距離的位置在切割用雷射光束42的照射位置之前。即,該位置被設定成使得通過距離測量傳感器22來測量與基板1的距離並且此後向基板1照射切割用雷射光束42。 In the present invention, the position on the horizontal plane where the distance measurement sensor 22 measures the distance from the substrate 1 and the position on the horizontal plane irradiated by the cutting laser beam 42 are spaced apart from each other. In the exemplary embodiment, the position at which the distance measurement sensor 22 measures the distance from the substrate 1 precedes the irradiation position of the cutting laser beam 42. That is, the position is set such that the distance from the substrate 1 is measured by the distance measurement sensor 22 and thereafter the substrate 1 is irradiated with the laser beam 42 for cutting.
圖3是示出了根據本發明的示例性實施方式的雷射劃刻裝置的控制配置的方塊圖,而圖4是示出了根據本發明的示例性實施方式的雷射劃刻裝置的距離測量傳感器與雷射照射位置之間的關係的示意圖。 FIG. 3 is a block diagram illustrating a control configuration of a laser scoring device according to an exemplary embodiment of the present invention, and FIG. 4 is a diagram illustrating a distance of the laser scoring apparatus according to an exemplary embodiment of the present invention Schematic diagram of the relationship between the measurement sensor and the laser irradiation position.
參照圖3,根據本發明的雷射劃刻裝置包括主控制單元50,主控制單元50從距離測量傳感器22接收與基板1的距離測量結果,並且控制透鏡組件30的透鏡驅動單元34。 Referring to FIG. 3, the laser scribing device according to the present invention includes a main control unit 50 that receives a distance measurement result from the distance measurement sensor 22 to the substrate 1 and controls the lens driving unit 34 of the lens assembly 30.
距離測量傳感器22測量與基板1的距離,並且根據由主控制單元50進行的控制或每預定週期將測定的距離傳送到主控制單元50。 The distance measurement sensor 22 measures a distance from the substrate 1 and transmits the measured distance to the main control unit 50 according to control performed by the main control unit 50 or every predetermined period.
主控制單元50通過根據距離測量傳感器22的測量結果控制透鏡組件30的透鏡驅動單元34的驅動來調整聚焦透鏡32的位置。 The main control unit 50 adjusts the position of the focus lens 32 by controlling the driving of the lens driving unit 34 of the lens assembly 30 according to the measurement result of the distance measurement sensor 22.
參照圖4,從距離測量傳感器22的光發射單元24產生的測量用雷射光束25在基板的點P1上照射並反射,並且此後入射在光接收單元26中。距離測量傳感器22可以基於從光發射單元24產生的測量用雷射光束25入射在光接收單元26中之前的時間來計算離基板1的垂直距離。此外,可以通過光發射單元24和光接收單元26的佈置以及離基板1的垂直距離來計算 點P1。 Referring to FIG. 4, a measurement laser beam 25 generated from the light emitting unit 24 of the distance measurement sensor 22 is irradiated and reflected on the point P1 of the substrate, and thereafter is incident in the light receiving unit 26. The distance measurement sensor 22 can calculate the vertical distance from the substrate 1 based on the time before the measurement laser beam 25 generated from the light emitting unit 24 is incident in the light receiving unit 26. Further, the point P1 can be calculated by the arrangement of the light emitting unit 24 and the light receiving unit 26 and the vertical distance from the substrate 1.
切割用雷射光束42在基板1上形成焦點F,並且其中形成了焦點F的基板1的表面上的點是P2。在根據本發明的雷射劃刻裝置的安裝方向上,當該方向顯示在相對於水平面彼此正交的X和Y軸上時,P1和P2可以位於X軸方向或Y軸方向上的同一直線上或者位於對角線方向上。 The laser beam 42 for cutting forms a focal point F on the substrate 1, and a point on the surface of the substrate 1 in which the focal point F is formed is P2. In the installation direction of the laser scoring device according to the present invention, when the directions are displayed on the X and Y axes orthogonal to each other with respect to a horizontal plane, P1 and P2 may be located in the same direction in the X axis direction or the Y axis direction. On the line or diagonally.
P1和P2的水平距離通過△L來表示。在示例性實施方式中,△L可以具有數毫米的值。此外,△L可以在0.5mm至2mm的範圍內。隨著△L越小,可以越快地反映根據距離測量傳感器22的感測結果而對切割用雷射光束42的焦距的調整。然而,由於根據距離測量傳感器22的感測結果控制透鏡驅動單元34的驅動所需的時間,可能難以將△L設定為過小。在本發明中,可以通過考慮△L、劃線頭單元10與基板1之間的相對移動速度、控制所需的時間等來實現光學劃刻控制。 The horizontal distance between P1 and P2 is represented by ΔL. In an exemplary embodiment, ΔL may have a value of several millimeters. In addition, ΔL may be in a range of 0.5 mm to 2 mm. As ΔL is smaller, the adjustment of the focal length of the cutting laser beam 42 according to the sensing result of the distance measurement sensor 22 can be reflected more quickly. However, it may be difficult to set ΔL too small due to the time required to control the driving of the lens driving unit 34 according to the sensing result of the distance measurement sensor 22. In the present invention, the optical scribing control can be realized by considering ΔL, the relative moving speed between the scribing head unit 10 and the substrate 1, the time required for control, and the like.
當劃線頭單元10與基板1之間的相對移動速度為V時,可以通過△L/V來獲得切割用雷射光束42從點P2到位於點P1處所需的時間△T。 When the relative moving speed between the scribing head unit 10 and the substrate 1 is V, the time ΔT required for the laser beam 42 for cutting from the point P2 to the point P1 can be obtained by ΔL / V.
主控制單元50通過借助於考慮△T而計算透鏡驅動單元34的驅動時間來控制透鏡驅動單元34的驅動。 The main control unit 50 controls the driving of the lens driving unit 34 by calculating the driving time of the lens driving unit 34 by considering ΔT.
在示例性實施方式中,主控制單元50可以通過考慮時間Ts、主控制單元50中的處理時間Tm和時間Td來確定透鏡驅動單元34的驅動完成時間T2,時間Ts是自距離測量傳感器22向P1照射測量用雷射光束的時間T1起距離測量傳感器22的內部處理所需的時間,時間Td是直到通過借助於主控制單元50輸出控制信號而實際地驅動透鏡驅動單元34所需的時間。 In an exemplary embodiment, the main control unit 50 may determine the driving completion time T2 of the lens driving unit 34 by considering the time Ts, the processing time Tm, and the time Td in the main control unit 50, and the time Ts is a distance from the distance measurement sensor 22 to The time T1 at which P1 irradiates the laser beam for measurement starts from the time required for the internal processing of the distance measuring sensor 22, and the time Td is the time until the lens driving unit 34 is actually driven by outputting a control signal by means of the main control unit 50.
由於在切割用雷射光束42的位置到達P1時需要驅動透鏡驅 動單元34,所以此時需要滿足根據式1的關係。 Since it is necessary to drive the lens driving unit 34 when the position of the cutting laser beam 42 reaches P1, the relationship according to Equation 1 needs to be satisfied at this time.
主控制單元50可以設定劃線頭單元10與基板1之間的相對移動速度V的上限值,以滿足式1的條件。 The main control unit 50 may set an upper limit value of the relative movement speed V between the scribe head unit 10 and the substrate 1 so as to satisfy the condition of Expression 1.
主控制單元50可以設定透鏡驅動單元34的控制延遲時間,以使得透鏡驅動單元34的驅動在透鏡驅動單元34的驅動完成時間T2完成,並且除控制延遲時間以外還調整向透鏡驅動單元34輸出控制信號的時間。 The main control unit 50 may set the control delay time of the lens driving unit 34 so that the driving of the lens driving unit 34 is completed at the driving completion time T2 of the lens driving unit 34 and adjusts the output control to the lens driving unit 34 in addition to the control delay time. The time of the signal.
可以將距離測量傳感器22的感測週期設定為△T,以滿足式1的條件。 The sensing period of the distance measurement sensor 22 may be set to ΔT to satisfy the condition of Equation 1.
可以將距離測量傳感器22的感測週期設定為與劃線頭單元10和基板1之間的相對移動速度V建立關聯。當相對移動速度V高時,可以縮短距離測量傳感器22的感測週期,而當相對移動速度V低時,可以延長距離測量傳感器22的感測週期。 The sensing period of the distance measurement sensor 22 may be set to be correlated with the relative moving speed V between the scribing head unit 10 and the substrate 1. When the relative movement speed V is high, the sensing period of the distance measurement sensor 22 can be shortened, and when the relative movement speed V is low, the sensing period of the distance measurement sensor 22 can be extended.
圖5是示出了根據本發明的另一個示例性實施方式的雷射劃刻裝置的控制方法的流程圖。 FIG. 5 is a flowchart illustrating a control method of a laser scribing device according to another exemplary embodiment of the present invention.
首先,設定切割用雷射光束42在基板1中的照射深度,即焦距(S100)。 First, the irradiation depth of the cutting laser beam 42 on the substrate 1, that is, the focal length is set (S100).
距離測量傳感器22週期性地或連續地測量與基板1的距離,而主控制單元50從距離測量傳感器22接收測量結果(S102)。 The distance measurement sensor 22 measures the distance from the substrate 1 periodically or continuously, and the main control unit 50 receives a measurement result from the distance measurement sensor 22 (S102).
主控制單元50從距離測量傳感器22接收測量結果,並且此後通過考慮要向距離測量傳感器22的感測點P1照射切割用雷射光束42的時間 來計算雷射照射深度控制時間(S104)。這裡,雷射照射深度控制時間可以理解為透鏡驅動單元34的驅動完成時間T2之前的時間。 The main control unit 50 receives the measurement result from the distance measurement sensor 22, and thereafter calculates the laser irradiation depth control time by considering the time at which the sensing point P1 of the distance measurement sensor 22 is to be irradiated with the cutting laser beam 42 (S104). Here, the laser irradiation depth control time can be understood as a time before the driving completion time T2 of the lens driving unit 34.
根據主控制單元50的控制來控制透鏡驅動單元34(S106)。 The lens driving unit 34 is controlled according to the control of the main control unit 50 (S106).
在對基板1執行雷射劃線操作的同時反復執行步驟S102至S106。可以根據距離測量傳感器22的感測週期反復執行步驟S102至S106。 Steps S102 to S106 are repeatedly performed while performing a laser scribing operation on the substrate 1. Steps S102 to S106 may be repeatedly performed according to the sensing period of the distance measurement sensor 22.
如上所述,在附圖和說明書中已描述和圖示了示例性實施方式。為了說明本發明的某些原理及其實踐應用而選擇和描述示例性實施方式,從而使本領域的其他技術人員能夠製造和利用本發明的各種示例性實施方式以及它們的各種替代方案和修改方案。如從以上描述顯而易見的是,本發明的某些方面不受這裡所示的例子的具體細節限制,並且因此設想本領域的技術人員將想到其它修改方案和應用或者其等同方式。然而,在查閱說明書和附圖之後,本發明的諸多改變、修改、變化以及其它用途和應用對本領域的技術人員來說將變得明顯。不背離本發明的精神和範圍的所有這些改變、修改、變化以及其它用途和應用被視為由本發明所涵蓋,本發明僅通過以下申請專利範圍來限定。 As described above, the exemplary embodiments have been described and illustrated in the drawings and the specification. The exemplary embodiments were chosen and described in order to explain certain principles of the invention and their practical applications, to thereby enable others skilled in the art to make and utilize the various exemplary embodiments of the invention, and their various alternatives and modifications. . As is apparent from the above description, certain aspects of the present invention are not limited by the specific details of the examples shown here, and it is therefore envisaged that those skilled in the art will envision other modifications and applications or equivalents thereof. However, many changes, modifications, variations and other uses and applications of the present invention will become apparent to those skilled in the art after reviewing the specification and drawings. All these changes, modifications, variations and other uses and applications without departing from the spirit and scope of the present invention are deemed to be covered by the present invention, and the present invention is limited only by the scope of the following patent applications.
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KR1020170041521A KR20180111089A (en) | 2017-03-31 | 2017-03-31 | Laser scribing appratus |
KR10-2017-0041521 | 2017-03-31 |
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TW201836751A true TW201836751A (en) | 2018-10-16 |
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TW106126282A TWI695748B (en) | 2017-03-31 | 2017-08-03 | Laser scribing apparatus |
TW106211441U TWM556643U (en) | 2017-03-31 | 2017-08-03 | Laser scribing apparatus |
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KR20180111089A (en) * | 2017-03-31 | 2018-10-11 | 주식회사 탑 엔지니어링 | Laser scribing appratus |
CN109332913A (en) * | 2018-09-29 | 2019-02-15 | 无锡恒领科技有限公司 | A kind of laser scribing means and a kind of method for adjusting height applied to scribing machine |
CN113735429B (en) * | 2021-08-24 | 2023-09-08 | 芜湖东旭光电科技有限公司 | Glass scribing and cutting device and cutting method thereof |
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JPH0810949A (en) * | 1994-06-23 | 1996-01-16 | Fanuc Ltd | Method for controlling welding robot system in multi-layer over laying |
CA2251243C (en) * | 1998-10-21 | 2006-12-19 | Robert Dworkowski | Distance tracking control system for single pass topographical mapping |
JP4299185B2 (en) * | 2004-04-27 | 2009-07-22 | 株式会社ディスコ | Laser processing equipment |
JP2011237348A (en) * | 2010-05-12 | 2011-11-24 | Disco Abrasive Syst Ltd | Height position measuring device for workpiece held by chuck table and laser processing apparatus |
JP2012192415A (en) * | 2011-03-15 | 2012-10-11 | Disco Corp | Laser processing device |
US9289850B2 (en) * | 2011-04-08 | 2016-03-22 | Mitsubishi Electric Corporation | Laser machining device |
CN202317434U (en) * | 2011-10-10 | 2012-07-11 | 华中科技大学 | Laser processing automatic focusing adjustment device |
JP2015050282A (en) * | 2013-08-30 | 2015-03-16 | 株式会社日立情報通信エンジニアリング | Laser annealing device and laser annealing method |
JP5743123B1 (en) * | 2014-03-14 | 2015-07-01 | 株式会社東京精密 | Laser dicing apparatus and dicing method |
DE102015115803A1 (en) * | 2015-09-18 | 2017-03-23 | Precitec Gmbh & Co. Kg | Method for guiding a machining head along a track to be processed |
KR20180111089A (en) * | 2017-03-31 | 2018-10-11 | 주식회사 탑 엔지니어링 | Laser scribing appratus |
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- 2017-06-14 CN CN201710446715.3A patent/CN107186349A/en active Pending
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KR20180111089A (en) | 2018-10-11 |
CN107186349A (en) | 2017-09-22 |
TWI695748B (en) | 2020-06-11 |
CN207043571U (en) | 2018-02-27 |
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