TW201831266A - Method and apparatus for finishing glass sheets - Google Patents

Method and apparatus for finishing glass sheets Download PDF

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Publication number
TW201831266A
TW201831266A TW107101189A TW107101189A TW201831266A TW 201831266 A TW201831266 A TW 201831266A TW 107101189 A TW107101189 A TW 107101189A TW 107101189 A TW107101189 A TW 107101189A TW 201831266 A TW201831266 A TW 201831266A
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Taiwan
Prior art keywords
edge
glass plate
axis
polishing
grinding
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TW107101189A
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Chinese (zh)
Inventor
朱廷偉
傅學弘
蕭凱宇
許棋証
徐子恆
唐玉銀
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美商康寧公司
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Publication of TW201831266A publication Critical patent/TW201831266A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/068Table-like supports for panels, sheets or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/22Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • B24B55/03Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Surface Treatment Of Glass (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

Methods and apparatus for finishing an edge of a glass sheet are described. The edge of the glass sheet is finished using a grinding wheel mounted on one end of a spindle, the grinding wheel having a peripheral edge that contacts the edge of the glass sheet during the grinding. The edge of the glass sheet is further finished by polishing the edge of the glass sheet with a polishing wheel mounted on one end of a spindle, the polishing wheel having an end face which contacts the glass edge during polishing.

Description

用於加工玻璃板之方法與裝置Method and device for processing glass plate

本案係關於用於加工玻璃板之方法與裝置。This case relates to a method and apparatus for processing glass plates.

在各式產品的製造過程中藉由對玻璃板的邊緣進行研磨與拋光來加工玻璃板,例如一光導引板(LGP),其係用於邊緣發光式之液晶顯示器(LCD)裝置的背光,以在該顯示面板上均勻地分佈光源。用於該些裝置的側發式背光單元包括一LGP,其通常是由高透射塑膠材料製成,如聚甲基丙烯酸甲酯(PMMA)。對於薄型顯示器的趨勢一直受限於有關於聚合物光導引板(LGP)的使用上的挑戰。儘管這種塑料材料具有優良的性質例如透光性,但這些材料具有較差的機械性質如剛性、熱膨脹係數(CTE)和吸濕性。尤其,聚合物LGP缺乏在超薄型顯示器所需的尺寸的穩定性。當一聚合物LGP承受熱或濕度時,該LGP會變彎且膨脹,而犧牲了光學機械性質。聚合物LGP的不穩定性,需要設計者增加一更寬的邊框及具有氣隙的更厚的背光來補償這種移動。In the manufacturing process of various products, glass plates are processed by grinding and polishing the edges of the glass plates, such as a light guide plate (LGP), which is used as a backlight for edge-emitting liquid crystal display (LCD) devices. To evenly distribute the light source on the display panel. The side-emitting backlight unit for these devices includes an LGP, which is usually made of a highly transmissive plastic material, such as polymethyl methacrylate (PMMA). The trend for thin displays has been limited by challenges related to the use of polymer light guide plates (LGP). Although this plastic material has excellent properties such as light transmission, these materials have poor mechanical properties such as rigidity, coefficient of thermal expansion (CTE), and hygroscopicity. In particular, polymer LGP lacks the dimensional stability required for ultra-thin displays. When a polymer LGP is subjected to heat or humidity, the LGP will bend and swell, sacrificing opto-mechanical properties. The instability of polymer LGP requires designers to add a wider frame and a thicker backlight with an air gap to compensate for this movement.

玻璃板被用來當作顯示器的LGP替換方案,但該些玻璃板須具備適當的屬性以達到足夠的光效能,如傳輸、分散及光耦合。作為光導引板的玻璃板須達到這些邊緣的規格,如垂直度、真直度及平坦度。玻璃板經裁切尺寸以製作LGP,透過機械劃線以形成一「裂口」,其為部份地伸進玻璃表面的一凹入線。該裂口作用為一分離線,透過在裂口線處施加機械力於玻璃板,以控制向兩個不連續的片狀玻璃板的裂紋擴展。目前已具有1.78米對角線的玻璃LGP,以供具有範圍在0.7 mm與2.0 mm的厚度、+/–0.5 mm的尺寸公差及在邊緣處的小於0.2微米的平均粗糙度的顯示器。美商康寧公司銷售了能用於LGP的Corning IrisTM 玻璃,其呈現出在400與650 nm的波長範圍的接近90%或更高的高傳輸率。Glass plates are used as an LGP replacement for displays, but these glass plates must have appropriate properties to achieve sufficient light efficiency, such as transmission, dispersion, and optical coupling. The glass plate used as the light guide plate must meet these edge specifications, such as verticality, straightness, and flatness. The glass plate is cut to size to make an LGP, and a "crack" is formed by mechanical scribing, which is a recessed line partially protruding into the glass surface. The slit acts as a separation line, and applies mechanical force to the glass plate at the slit line to control the crack propagation to two discontinuous sheet glass plates. Glass LGPs with a 1.78-meter diagonal are currently available for displays with thicknesses ranging from 0.7 mm and 2.0 mm, dimensional tolerances of +/- 0.5 mm, and average roughness of less than 0.2 microns at the edges. Corning Corporation, which sells Corning Iris (TM) glass that can be used for LGP, exhibits high transmission rates close to 90% or higher in the wavelength range of 400 and 650 nm.

為了達到在劃線後的在邊緣處的所需粗糙度,玻璃邊緣的加工可透過以研磨與拋光輪對邊緣進行研磨與拋光來實現。可選地,亦可使用氫氟酸蝕刻及/或以研磨液拋光。然而,氫氟酸蝕刻具有安全性和環境方面的考慮,且經蝕刻的邊緣可能無法提供所需的玻璃穿透率。與拋光輪拋光相比,研磨液拋光需要更長的時間去除玻璃邊緣上的材料,並且使用以研磨液拋光難以控制玻璃邊緣尺寸。使用多數個輪的傳統的研磨與拋光,因需更換研磨與拋光輪而亦為十分耗時的,且拋光輪會磨耗很快。因此,需要提供用來加工玻璃板的邊緣的方法及裝置,特別是用作LGP的玻璃板。除了研磨和拋光之外,亦需要提供額外的功能的裝置和方法,例如在玻璃板上形成孔。In order to achieve the required roughness at the edges after scribing, the processing of the glass edges can be achieved by grinding and polishing the edges with grinding and polishing wheels. Alternatively, hydrofluoric acid can be used for etching and / or polishing with a polishing solution. However, hydrofluoric acid etching has safety and environmental considerations, and the etched edges may not provide the required glass penetration. Compared to polishing with a polishing wheel, polishing liquid polishing requires a longer time to remove the material on the edge of the glass, and it is difficult to control the size of the glass edge using polishing with a polishing liquid. The conventional grinding and polishing using many wheels is also very time consuming because the grinding and polishing wheels need to be replaced, and the polishing wheels will wear quickly. Therefore, there is a need to provide a method and an apparatus for processing an edge of a glass plate, particularly a glass plate used as an LGP. In addition to grinding and polishing, there is also a need for devices and methods that provide additional functions, such as forming holes in glass plates.

本案的一第一態樣係關於一種藉由對玻璃板的邊緣研磨與拋光來加工玻璃板的邊緣的裝置。在一實施例中,此一裝置包含一工作台,該工作台在當該些邊緣受到研磨與拋光時支撐該玻璃板,其中一X軸為在該工作台上的一玻璃板的一平面上的一橫向移動方向,一Y軸為在該平面上的垂直於該X軸的一縱向移動方向,且一Z軸為相對於該平面的一直立移動方向;一旋轉台可沿著該X軸與該Y軸移動,該旋轉台具有一旋轉台旋轉軸;一第一心軸與一第二心軸,安裝至具有一共同的主軸旋轉軸的該旋轉台,該第一心軸與該第二心軸繞著該共同的主軸旋轉軸旋轉,該共同的主軸旋轉軸正交於該旋轉台旋轉軸;以及,安裝在該第一心軸上的一研磨輪及安裝在該第二心軸上的一拋光輪,該研磨輪配置以研磨具有平行於該Z軸的該共同的主軸旋轉軸的該玻璃板的一邊緣,且該拋光輪配置以拋光具有平行於該X軸的該共同的主軸旋轉軸的該玻璃板的一邊緣。A first aspect of the present case relates to a device for processing the edge of a glass plate by grinding and polishing the edge of the glass plate. In one embodiment, the device includes a worktable that supports the glass plate when the edges are ground and polished, wherein an X-axis is on a plane of a glass plate on the worktable. A lateral movement direction, a Y-axis is a longitudinal movement direction on the plane perpendicular to the X-axis, and a Z-axis is an upright movement direction relative to the plane; a turntable can be along the X-axis Moving with the Y axis, the rotary table has a rotary table rotary axis; a first spindle and a second spindle are mounted to the rotary table having a common spindle rotation axis, the first spindle and the first spindle Two mandrels rotate around the common main shaft rotation axis, the common main shaft rotation axis is orthogonal to the rotary table rotation axis; and a grinding wheel mounted on the first mandrel and the second mandrel A polishing wheel configured to polish an edge of the glass plate having the common spindle rotation axis parallel to the Z axis, and the polishing wheel configured to polish the common An edge of the glass plate of the main shaft rotation axis.

本案的一第二態樣係關於一種加工一玻璃板的一邊緣的方法。在一實施例中,該方法包含步驟:支撐一玻璃板於一表面上,其中一X軸為在該表面上的一玻璃板的一平面上的一橫向移動方向,一Y軸為在該平面上的垂直於該X軸的一縱向移動方向,且一Z軸為正交於該平面的一移動方向;藉由安裝於一第一心軸的一端的一研磨輪研磨該玻璃板的該邊緣,該第一心軸在研磨期間定向成沿著該Z軸,且該研磨輪包含一周圍邊緣,該周圍邊緣在該研磨期間接觸該玻璃板的該邊緣;以及,藉由安裝於一第二心軸的一端的一拋光輪的一端面拋光該玻璃板的該邊緣,該第二心軸在拋光期間定位成平行於該平面。A second aspect of the present case relates to a method for processing an edge of a glass plate. In one embodiment, the method includes the steps of supporting a glass plate on a surface, wherein an X-axis is a lateral movement direction on a plane of a glass plate on the surface, and a Y-axis is on the plane. A longitudinal movement direction perpendicular to the X axis, and a Z axis is a movement direction orthogonal to the plane; the edge of the glass plate is ground by a grinding wheel mounted on one end of a first mandrel The first mandrel is oriented along the Z axis during grinding, and the grinding wheel includes a peripheral edge that contacts the edge of the glass plate during grinding; and is mounted on a second An end surface of a polishing wheel at one end of the mandrel polishes the edge of the glass plate, and the second mandrel is positioned parallel to the plane during polishing.

現在將詳細參考各種實施例,並在所附的例示和附圖中說明該些例子。Reference will now be made in detail to the various embodiments and examples are described in the accompanying illustrations and drawings.

在以下面的說明中,在附圖中所示的幾個視圖中,相同的元件符號表示相同或相應的部分。亦應理解的是,除非另外指定,如「頂部」、「底部」、「向外」、「向內」等用語為方便說明的,並且不被解釋為限制性術語。此外,每當一群組被描述為包括一組元件中的至少一個及其組合,應當理解的是,該組可以包括基本上由所述元件所組成,或由任何數量的所述元件所組成。類似地,每當一群組被描述為由一組元件或其組合中的至少一個組所組成時,應該理解,該群組可以由任意數量的所列舉的這些元件單獨地或者相互地組成。除非另外指定,否則列舉的數值範圍包括範圍的上限和下限以及它們之間的任何範圍。如本文所使用的,不定冠詞「一」、「一個」和相應的定冠詞「該」,除非另有說明,意指「至少一個」或「一或多個」。還應當理解的是,說明書和附圖中所揭示的各種特徵可用於任何和所有的組合中。In the following description, in the several views shown in the drawings, the same element symbols represent the same or corresponding parts. It should also be understood that, unless otherwise specified, terms such as "top", "bottom", "outward", "inward" are for convenience of explanation and are not to be construed as limiting terms. In addition, whenever a group is described as including at least one of a group of elements and combinations thereof, it should be understood that the group may include essentially consisting of the elements, or consisting of any number of the elements . Similarly, whenever a group is described as consisting of at least one group of a group of elements or a combination thereof, it should be understood that the group may be composed of any number of the listed elements individually or mutually. Unless otherwise specified, the numerical ranges recited include the upper and lower limits of the range and any range therebetween. As used herein, the indefinite articles "a", "an" and the corresponding definite article "the", unless stated otherwise, mean "at least one" or "one or more". It should also be understood that the various features disclosed in the description and the drawings can be used in any and all combinations.

於此描述的是用於加工玻璃板的邊緣的方法及裝置。在特定實施例中,玻璃板係透過研磨與拋光來加工,以提供可用於與本案的實施例相符的背光單元中的光導引板。在特定實施例中,提供光導引板,其具有與以PMMA製成的光導引板類似的或更優越的光學特性,且其具有相較於PMMA光導引板更佳的力學特性,如剛性、熱膨脹係數(CTE)、及在高濕條件下的尺寸穩定性。Described herein is a method and apparatus for processing the edges of a glass sheet. In a specific embodiment, the glass plate is processed through grinding and polishing to provide a light guide plate that can be used in a backlight unit consistent with the embodiments of the present invention. In a specific embodiment, a light guide plate is provided, which has similar or superior optical characteristics to a light guide plate made of PMMA, and has better mechanical properties than PMMA light guide plates, Such as rigidity, coefficient of thermal expansion (CTE), and dimensional stability under high humidity conditions.

接著參照圖1–6,用來加工玻璃板10的邊緣12的一邊緣加工裝置100,包含工作台102,工作台102在當邊緣12受到研磨與拋光時能支撐玻璃板10。依據一或多個實施例,該裝置可用來研磨及/或拋光邊緣12、及/或第二邊緣14、第三邊緣13與第四邊緣15。儘管在所示實施例中工作台102係顯示為平行於一水平平面,本案並非限制工作台102為在該水平平面上。用語「水平平面」相對於圖1–6中為X-Y平面,其中在圖1與圖3中,標記為X的一X軸為在工作台102上的玻璃板10的一水平平面上的一橫向移動方向,標記為Y的一Y軸為在該水平平面上的垂直於該X軸的一縱向移動方向,且標記為Z的一Z軸為相對於該水平平面(X-Y平面)的一直立移動方向,以圖1與圖3中所示的X、Y及Z座標來代表。然而,依據替代的實施例,X-Y平面可為不同於水平平面的一個平面。1-6, an edge processing device 100 for processing the edge 12 of the glass plate 10 includes a table 102 that can support the glass plate 10 when the edge 12 is ground and polished. According to one or more embodiments, the device can be used to grind and / or polish the edge 12 and / or the second edge 14, the third edge 13, and the fourth edge 15. Although the workbench 102 is shown as being parallel to a horizontal plane in the illustrated embodiment, this case does not limit the workbench 102 to be on the horizontal plane. The term "horizontal plane" is relative to the XY plane in Figs. 1-6, wherein in Figs. 1 and 3, an X-axis marked X is a transverse direction on a horizontal plane of the glass plate 10 on the table 102. Movement direction, a Y axis marked Y is a longitudinal movement direction perpendicular to the X axis on the horizontal plane, and a Z axis marked Z is an upright movement relative to the horizontal plane (XY plane) The directions are represented by the X, Y, and Z coordinates shown in FIG. 1 and FIG. 3. However, according to an alternative embodiment, the X-Y plane may be a plane different from the horizontal plane.

參照圖5,邊緣加工裝置100更包含一旋轉台104且沿著X軸與Y軸為可移動的,旋轉台104具有一旋轉台旋轉軸105。如圖1–6中所示的邊緣加工裝置100更包括安裝至旋轉台104的第一心軸106與第二心軸108,旋轉台104具有一共同的主軸旋轉軸107,該第一心軸與該第二心軸係繞著共同的主軸旋轉軸107旋轉,該共同的主軸旋轉軸107正交於旋轉台旋轉軸105。邊緣加工裝置100更包含可移除地安裝在第一心軸106上的一研磨輪110及可移除地安裝在第二心軸108上的一拋光輪112,其中該研磨輪110經配置以研磨玻璃板10的邊緣12,其共同的主軸旋轉軸107位於一垂直方位(即,與Z軸平行),且拋光輪112經配置以拋光玻璃板10的邊緣12,其共同的主軸旋轉軸107位於一水平方位(亦即,平行於X軸或Y軸,或在X-Y平面或玻璃板10的水平平面內)。Referring to FIG. 5, the edge processing device 100 further includes a rotary table 104 and is movable along the X axis and the Y axis. The rotary table 104 has a rotary table rotation axis 105. The edge processing device 100 as shown in FIGS. 1-6 further includes a first mandrel 106 and a second mandrel 108 mounted to a rotating table 104, and the rotating table 104 has a common main shaft rotating shaft 107, the first mandrel The second spindle system rotates around a common spindle rotation axis 107 which is orthogonal to the rotary table rotation axis 105. The edge processing device 100 further includes a grinding wheel 110 removably mounted on the first mandrel 106 and a polishing wheel 112 removably mounted on the second mandrel 108, wherein the grinding wheel 110 is configured to The edge 12 of the glass plate 10 is ground, and its common main axis of rotation axis 107 is located in a vertical orientation (ie, parallel to the Z axis), and the polishing wheel 112 is configured to polish the edge 12 of the glass plate 10, and its common axis of rotation 107 Located in a horizontal orientation (ie, parallel to the X or Y axis, or in the XY plane or the horizontal plane of the glass plate 10).

邊緣加工裝置100的一或多個實施例更包含配置成一環形的複數個第一周圍液體冷卻噴嘴120,該複數個第一周圍液體冷卻噴嘴120設於鄰接研磨輪110,且經設置以將冷卻液體導引朝向研磨輪110的周圍研磨邊緣111。依據一或多個實施例,「鄰接」意指第一周圍液體冷卻噴嘴120具有與研磨輪110的周圍研磨邊緣111相距一距離,其範圍約1–10 cm、約1–8 cm、約1–6 cm、約1–4 cm、或約1–2 cm。用於第一周圍液體冷卻噴嘴120的冷卻液體可經由第一冷卻線路121流至該些第一周圍液體冷卻噴嘴120。在一或多個實施例中,裝置更包含配置成一環形的複數個第二周圍液體冷卻噴嘴130,該些第二周圍液體冷卻噴嘴130鄰接研磨輪110。用於第二周圍冷卻噴嘴的冷卻液體可藉由第二冷卻線路131流至該些第二周圍液體冷卻噴嘴130。提供至第一冷卻線路121與第二冷卻線路131的冷卻液體可由第一供應線路127(較佳見於圖2與圖4)來供應,第一供應線路127可連接至一冷卻劑來源(未圖示),如供應自來水的一水龍頭或連接至含有去離子水及/或去礦物質水的水槽(未圖示)的一泵。環狀配置的該些第一周圍液體冷卻噴嘴120與第二周圍液體冷卻噴嘴130提供了在研磨與拋光期間的輪的有效率的冷卻,以及將邊緣進行加工並且降低邊緣燒毀與玻璃板10的邊緣12的碎裂。One or more embodiments of the edge processing device 100 further include a plurality of first peripheral liquid cooling nozzles 120 configured in an annular shape. The plurality of first peripheral liquid cooling nozzles 120 are disposed adjacent to the grinding wheel 110 and are configured to cool the cooling wheel. The liquid is directed towards the peripheral grinding edge 111 of the grinding wheel 110. According to one or more embodiments, "adjacent" means that the first surrounding liquid cooling nozzle 120 has a distance from the surrounding grinding edge 111 of the grinding wheel 110, and has a range of about 1-10 cm, about 1-8 cm, about 1 –6 cm, about 1–4 cm, or about 1–2 cm. The cooling liquid for the first surrounding liquid cooling nozzles 120 may flow to the first surrounding liquid cooling nozzles 120 through the first cooling line 121. In one or more embodiments, the device further includes a plurality of second peripheral liquid cooling nozzles 130 configured in an annular shape, and the second peripheral liquid cooling nozzles 130 are adjacent to the grinding wheel 110. The cooling liquid for the second peripheral cooling nozzles may flow to the second peripheral liquid cooling nozzles 130 through the second cooling circuit 131. The cooling liquid provided to the first cooling circuit 121 and the second cooling circuit 131 can be supplied by a first supply circuit 127 (preferably shown in FIGS. 2 and 4), and the first supply circuit 127 can be connected to a coolant source (not shown) (Shown), such as a tap that supplies tap water or a pump connected to a water tank (not shown) containing deionized and / or demineralized water. The first peripheral liquid cooling nozzles 120 and the second peripheral liquid cooling nozzles 130 arranged in a ring shape provide efficient cooling of the wheels during grinding and polishing, and process edges and reduce edge burnout and Chipping of the edges 12.

在一或多個實施例中,邊緣加工裝置100更包括複數個遠端液體冷卻噴嘴140設於遠離研磨輪110與拋光輪112,且遠端液體冷卻噴嘴140在研磨及/或拋光期間將冷卻液體導引朝向玻璃板的一邊緣12。在一或多個實施例中,「設於遠離」意指遠端液體冷卻噴嘴140與玻璃板的邊緣及/或研磨輪110與拋光輪112相距一距離,其範圍約10–200 cm、約40–200 cm、約80–200 cm、約100–200 cm或約150–200 cm。在圖1–4中,遠端液體冷卻噴嘴140係顯示為設置於殼體150上,殼體150將旋轉台104保持在支架152上。冷卻液體可藉由第三冷卻線路141流至遠端液體冷卻噴嘴140。提供至第三冷卻線路141的冷卻液體可由第二供應線路147(較佳見於圖2與圖4)來供應,第二供應線路147可連接至一冷卻劑來源(未圖示),如供應自來水的一水龍頭或連接至含有去離子水及/或去礦物質水的水槽(未圖示)的一泵。In one or more embodiments, the edge processing device 100 further includes a plurality of remote liquid cooling nozzles 140 disposed away from the grinding wheel 110 and the polishing wheel 112, and the remote liquid cooling nozzles 140 are cooled during grinding and / or polishing. The liquid is directed towards an edge 12 of the glass plate. In one or more embodiments, "located away from" means that the distal liquid cooling nozzle 140 is at a distance from the edge of the glass plate and / or the grinding wheel 110 and the polishing wheel 112 are in a range of about 10-200 cm, about 40–200 cm, about 80–200 cm, about 100–200 cm, or about 150–200 cm. In FIGS. 1-4, the distal liquid cooling nozzle 140 is shown as being disposed on the housing 150, which holds the rotating table 104 on the bracket 152. The cooling liquid may flow to the remote liquid cooling nozzle 140 through the third cooling line 141. The cooling liquid provided to the third cooling circuit 141 can be supplied by a second supply circuit 147 (preferably shown in Figs. 2 and 4). The second supply circuit 147 can be connected to a coolant source (not shown), such as supplying tap water A faucet or a pump connected to a water tank (not shown) containing deionized and / or demineralized water.

在一或多個實施例中,該複數個第一周圍液體冷卻噴嘴與遠端液體冷卻噴嘴140經配置以在玻璃板的研磨期間被開啟。該複數個第一周圍液體冷卻噴嘴120可包括任何合適數量的噴嘴,以在研磨及/或拋光期間提供足夠的冷卻。例如,可提供三個、四個、五個、六個、七個、八個、九個、十個、十一個、或十二個第一周圍液體冷卻噴嘴120。同樣地,該複數個第二周圍液體冷卻噴嘴130可包括任何合適數量的噴嘴,以在研磨及/或拋光期間提供足夠的冷卻。例如,可提供三個、四個、五個、六個、七個、八個、九個、十個、十一個、或十二個第二周圍液體冷卻噴嘴130。關於遠端液體冷卻噴嘴140,在殼體150上可提供並固定任何數量的噴嘴。如圖1–6所示,遠端液體冷卻噴嘴140係供應在殼體150的兩側。殼體的每一側能具有任何數量的噴嘴,例如一個、兩個、三個、四個、五個、六個、七個、八個、九個或十個遠端液體冷卻噴嘴140,以在研磨及/或拋光期間提供足夠的冷卻。在研磨及/或拋光期間,遠端液體冷卻噴嘴140可與該玻璃板的該邊緣10相距任何適當的距離。在研磨及/或拋光操作期間,遠端液體冷卻噴嘴140可與玻璃板10的邊緣12相距5 cm、10 cm、15 cm、20 cm、25 cm、30 cm、35 cm、40 cm、50 cm、60 cm、70 cm、80 cm、90 cm、100 cm、125 cm、150 cm、200 cm或長達500 cm。該些第一周圍液體冷卻噴嘴120、第二周圍液體冷卻噴嘴130及遠端液體冷卻噴嘴140的每一者可依需求調整大小並成型,以達到所需的冷卻效果。例如,該些第一周圍液體冷卻噴嘴120、第二周圍液體冷卻噴嘴130及遠端液體冷卻噴嘴140的開口直徑可為0.2 mm、0.3 mm、0.4 mm、0.5 mm、0.6 mm、0.8 mm、0.9 mm、1 mm、2 mm、3 mm、4 mm、5 mm或10 mm。傳統的聚氯乙烯(PVC)或其他塑膠配管或金屬配管可用於第一冷卻線路121、第二冷卻線路131、第三冷卻液線路141的每一者,以及第一供應線路127與第二供應線路147的每一者。冷卻液體可包含水、冷凍水或其他冷卻液體。In one or more embodiments, the plurality of first surrounding liquid cooling nozzles and the distal liquid cooling nozzle 140 are configured to be opened during the grinding of the glass plate. The plurality of first surrounding liquid cooling nozzles 120 may include any suitable number of nozzles to provide sufficient cooling during grinding and / or polishing. For example, three, four, five, six, seven, eight, nine, ten, eleven, or twelve first peripheral liquid cooling nozzles 120 may be provided. Likewise, the plurality of second surrounding liquid cooling nozzles 130 may include any suitable number of nozzles to provide sufficient cooling during grinding and / or polishing. For example, three, four, five, six, seven, eight, nine, ten, eleven, or twelve second peripheral liquid cooling nozzles 130 may be provided. Regarding the distal liquid cooling nozzle 140, any number of nozzles may be provided and fixed on the housing 150. As shown in FIGS. 1-6, the distal liquid cooling nozzle 140 is supplied on both sides of the housing 150. Each side of the housing can have any number of nozzles, such as one, two, three, four, five, six, seven, eight, nine, or ten remote liquid cooling nozzles 140, to Provide sufficient cooling during grinding and / or polishing. During grinding and / or polishing, the distal liquid cooling nozzle 140 may be any suitable distance from the edge 10 of the glass plate. The remote liquid cooling nozzle 140 may be 5 cm, 10 cm, 15 cm, 20 cm, 25 cm, 30 cm, 35 cm, 40 cm, 50 cm from the edge 12 of the glass plate 10 during the grinding and / or polishing operation. , 60 cm, 70 cm, 80 cm, 90 cm, 100 cm, 125 cm, 150 cm, 200 cm, or up to 500 cm. Each of the first surrounding liquid cooling nozzle 120, the second surrounding liquid cooling nozzle 130, and the remote liquid cooling nozzle 140 can be adjusted in size and shaped as required to achieve a desired cooling effect. For example, the opening diameters of the first surrounding liquid cooling nozzle 120, the second surrounding liquid cooling nozzle 130, and the distal liquid cooling nozzle 140 may be 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.8 mm, 0.9 mm, 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, or 10 mm. Conventional polyvinyl chloride (PVC) or other plastic pipes or metal pipes can be used for each of the first cooling circuit 121, the second cooling circuit 131, and the third cooling liquid circuit 141, and the first supply circuit 127 and the second supply Each of the lines 147. The cooling liquid may include water, chilled water, or other cooling liquids.

接著參照圖7A與9C及7B及9A與9B,在一或多個實施例中,研磨輪110包含一圓筒狀輪,該圓筒狀輪包括一周圍研磨邊緣111,且拋光輪112包含一杯子形狀的或杯形磨輪,其包括一周圍拋光邊緣161及一拋光端面162。如圖7B、9A與9B所示,杯形磨輪包含一凹形的區域164。圖9A中所示的拋光輪112包含設於拋光端面162上的溝槽166,拋光端面162上提供有一溝槽的表面,該表面在拋光期間接觸玻璃板的邊緣12。合適的杯形磨輪包括一2000網目(2000#)的具溝槽的環氧樹脂杯形磨輪、一5000網目(5000#)的環氧樹脂輪、及一9000網目(9000#)的環氧樹脂輪以用於精細拋光,且具有體積高達50%的Cu內容物以減低熱度。7A and 9C and 7B and 9A and 9B, in one or more embodiments, the grinding wheel 110 includes a cylindrical wheel, the cylindrical wheel includes a peripheral grinding edge 111, and the polishing wheel 112 includes a cup A shaped or cup-shaped grinding wheel includes a peripheral polished edge 161 and a polished end surface 162. As shown in FIGS. 7B, 9A, and 9B, the cup-shaped grinding wheel includes a concave region 164. The polishing wheel 112 shown in FIG. 9A includes a groove 166 provided on the polishing end surface 162, which is provided with a grooved surface that contacts the edge 12 of the glass plate during polishing. Suitable cup-shaped grinding wheels include a 2000 mesh (2000 #) grooved epoxy cup grinding wheel, a 5000 mesh (5000 #) epoxy wheel, and a 9000 mesh (9000 #) epoxy resin. Wheel for fine polishing and has Cu content up to 50% by volume to reduce heat.

如圖7A與9C所示,研磨輪110包括一導角125,其可用來在玻璃板10的邊緣12上形成一導角19。在一或多個實施例中,第一心軸106與研磨輪110經配置以在研磨期間,使周圍研磨邊緣111接觸玻璃板10的一邊緣12,且第二心軸108與拋光輪112經配置以在拋光期間,使拋光端面162接觸玻璃板的一邊緣。As shown in FIGS. 7A and 9C, the grinding wheel 110 includes a lead angle 125 that can be used to form a lead angle 19 on the edge 12 of the glass plate 10. In one or more embodiments, the first mandrel 106 and the grinding wheel 110 are configured such that during grinding, the surrounding grinding edge 111 contacts an edge 12 of the glass plate 10, and the second mandrel 108 and the polishing wheel 112 are It is configured such that the polishing end surface 162 contacts an edge of the glass plate during polishing.

參照回圖1–4,旋轉台104安裝於支架152上,支架152沿著Y軸為可移動的,且旋轉台104沿著X軸為可移動的。支架152在沿著軌道182的一Y軸載具180上為可移動的。可理解的是所示配置為例示性的,且支架152的沿著Y軸的線性運動可以其他方式達成,例如,使用一蝸形齒輪組件,其包含一螺紋桿、一旋轉螺帽及馬達驅動器(未圖示)。旋轉台104在沿著軌道192的一X軸載具190上為可移動的。可理解的是所示配置為例示性的,且旋轉台104的沿著X軸的線性運動可以其他方式達成,例如,一蝸形齒輪組件,其包含一螺紋桿、一旋轉螺帽及馬達驅動器(未圖示)。Referring back to FIGS. 1-4, the rotary table 104 is mounted on a bracket 152. The bracket 152 is movable along the Y axis, and the rotary table 104 is movable along the X axis. The bracket 152 is movable on a Y-axis carrier 180 along the track 182. It can be understood that the configuration shown is exemplary and the linear movement of the bracket 152 along the Y axis can be achieved in other ways, for example, using a worm gear assembly that includes a threaded rod, a rotary nut, and a motor driver (Not shown). The turntable 104 is movable on an X-axis carrier 190 along a track 192. It can be understood that the configuration shown is exemplary, and the linear movement of the rotary table 104 along the X axis can be achieved in other ways, for example, a worm gear assembly including a threaded rod, a rotary nut, and a motor driver (Not shown).

接著描述邊緣加工裝置100的操作。邊緣加工裝置100可為一電腦數值控制(CNC)機200的部分。包含一柄195的研磨輪110可透過一卡盤或一夾套(未圖示)安裝於第一心軸106上,該卡盤或夾套可受一馬達(未圖示)的驅動以繞著旋轉軸107旋轉第一心軸106與研磨輪110。類似地,包含一柄197的拋光輪112可透過一卡盤或一夾套(未圖示)安裝於第二心軸108上,該卡盤或夾套可受一馬達(未圖示)的驅動以繞著旋轉軸107旋轉心軸與拋光輪112。研磨輪110在當沿著邊緣12於Y軸的方向上平移時可旋轉,以從玻璃板10的邊緣12移除物料。CNC機200包括一控制器210,其控制研磨輪110與拋光輪112的旋轉和平移。控制器210與CNC機200經由硬體接線或無線連接來進行通訊。控制器210可為能控制CNC機200與邊緣加工裝置100的元件平移及旋轉的任意合適的元件。例如,控制器210可為包括一中央處理單元、記憶體、適當的電路與蓄電的一電腦。CNC機200可更包括一或多個位置感測器212,其可例如,包含一機器視覺系統包括一攝影機,例如,電荷耦合裝置(CCD)攝影機,以精確地追蹤研磨輪、拋光輪、被研磨與拋光的玻璃板邊緣的該邊緣的位置,並且提供資訊至控制器210以將研磨輪與拋光輪對齊。一個具有0.001微米的解析度的攝影機,可監控一平的單個邊緣、矩形的部分、與圓的部分。The operation of the edge processing apparatus 100 is described next. The edge processing device 100 may be part of a computer numerical control (CNC) machine 200. The grinding wheel 110 including a handle 195 can be mounted on the first mandrel 106 through a chuck or a jacket (not shown), and the chuck or jacket can be driven by a motor (not shown) to be wound. The first mandrel 106 and the grinding wheel 110 are rotated about the rotation shaft 107. Similarly, the polishing wheel 112 including a handle 197 can be mounted on the second mandrel 108 through a chuck or a jacket (not shown), which can be received by a motor (not shown) It is driven to rotate the mandrel and the polishing wheel 112 around the rotation shaft 107. The grinding wheel 110 is rotatable when translated in the direction of the Y axis along the edge 12 to remove material from the edge 12 of the glass plate 10. The CNC machine 200 includes a controller 210 that controls the rotation and translation of the grinding wheel 110 and the polishing wheel 112. The controller 210 communicates with the CNC machine 200 via hardware wiring or wireless connection. The controller 210 may be any suitable component capable of controlling the translation and rotation of the components of the CNC machine 200 and the edge processing device 100. For example, the controller 210 may be a computer including a central processing unit, a memory, appropriate circuits, and power storage. The CNC machine 200 may further include one or more position sensors 212, which may, for example, include a machine vision system including a camera, such as a charge coupled device (CCD) camera, to accurately track the grinding wheel, polishing wheel, The edge position of the edge of the ground and polished glass plate, and information is provided to the controller 210 to align the grinding wheel with the polishing wheel. A camera with a resolution of 0.001 microns can monitor a flat single edge, a rectangular part, and a round part.

研磨輪110與拋光輪112在X-Y平面內的定位可透過滾輪式或滑動式軌道系統來控制,以實現研磨輪110與拋光輪112在X方向及Y方向上的移動。如以上所提,支架152的Y軸平移藉由在軌道182上的Y軸載具180來實現,且X軸平移藉由在軌道192上的X軸載具190來實現。位置感測器212與控制器210進行通訊以對該控制器提供研磨輪110與拋光輪112的位置的反饋,及在玻璃板加工期間的玻璃板10的位置的反饋。CNC機200的控制器210亦可用來控制冷卻液體的流動,其可與閥與泵(未圖示)進行通訊以藉由該些第一周圍液體冷卻噴嘴120、第二周圍液體冷卻噴嘴130及遠端液體冷卻噴嘴140的每一者來控制壓力、流速及冷卻液體流的時間間隔。The positioning of the grinding wheel 110 and the polishing wheel 112 in the X-Y plane can be controlled by a roller type or a sliding track system to realize the movement of the grinding wheel 110 and the polishing wheel 112 in the X direction and the Y direction. As mentioned above, the Y-axis translation of the bracket 152 is achieved by the Y-axis carrier 180 on the track 182, and the X-axis translation is achieved by the X-axis carrier 190 on the track 192. The position sensor 212 communicates with the controller 210 to provide the controller with feedback of the positions of the grinding wheel 110 and the polishing wheel 112 and feedback of the position of the glass plate 10 during the glass plate processing. The controller 210 of the CNC machine 200 can also be used to control the flow of the cooling liquid, which can communicate with a valve and a pump (not shown) to pass the first surrounding liquid cooling nozzles 120, the second surrounding liquid cooling nozzles 130, and Each of the distal liquid cooling nozzles 140 controls the pressure, flow rate, and time interval of the cooling liquid flow.

依據一或多個實施例,旋轉台104允許研磨輪110與拋光輪112繞著旋轉軸105旋轉,旋轉軸105係正交於第一心軸106與第二心軸108的旋轉軸107。旋轉台104能以任何所需數量的增量作為標示或旋轉,例如,1度、5度、10度、15度、20度、45度、90度及180度的增量。適合的旋轉台104為出自於臺灣的德川機械股份有限公司(Detron Machine Co., Ltd.)型號為Detron GX-170P的旋轉台。根據一些實施例,於使用中,在一研磨操作期間,第一心軸106係處於平行於或沿著如圖1所示的Z軸的一垂直方位。第一心軸106繞著軸107旋轉並且沿著Y軸平移,以將物料從邊緣12去除。在一或多個實施例中,可透過繞著旋轉軸107旋轉第一心軸106來加工邊緣13、15,同時沿著X軸平移該第一心軸以從邊緣13、15去除物料。當研磨操作完成時,CNC機200的控制器210傳送一訊號以繞旋轉軸105將第一心軸106旋轉九十度,以使第二心軸108在此時位於平行於X-Y平面或工作台102與玻璃板10的水平平面,以使端面162在一拋光操作期間能接觸玻璃板10的邊緣12。可理解的是,工作台102與該玻璃板的方位可為非水平的,且在一些實施例中,工作台102與該玻璃板可相對於水平而傾斜一角度。在邊緣12的一拋光操作期間,第二心軸108繞著旋轉軸107旋轉,且第二心軸108沿著Y軸平移。拋光操作亦可以類似的方式在邊緣14上執行。According to one or more embodiments, the rotating table 104 allows the grinding wheel 110 and the polishing wheel 112 to rotate about a rotation axis 105 which is orthogonal to the rotation axis 107 of the first and second mandrels 106 and 108. The turntable 104 can be labeled or rotated in any desired number of increments, for example, 1 degree, 5 degree, 10 degree, 15 degree, 20 degree, 45 degree, 90 degree, and 180 degree increments. A suitable rotary table 104 is a rotary table of Detron GX-170P model from Detron Machine Co., Ltd. of Taiwan. According to some embodiments, during use, during a grinding operation, the first mandrel 106 is in a vertical orientation parallel to or along the Z axis as shown in FIG. 1. The first mandrel 106 rotates around the axis 107 and translates along the Y axis to remove material from the edge 12. In one or more embodiments, the edges 13, 15 can be processed by rotating the first mandrel 106 about the rotation axis 107, while the first mandrel is translated along the X axis to remove material from the edges 13, 15. When the grinding operation is completed, the controller 210 of the CNC machine 200 sends a signal to rotate the first mandrel 106 by ninety degrees around the rotation axis 105 so that the second mandrel 108 is located parallel to the XY plane or the table at this time. 102 is a horizontal plane with the glass plate 10 so that the end surface 162 can contact the edge 12 of the glass plate 10 during a polishing operation. It can be understood that the orientation of the worktable 102 and the glass plate may be non-horizontal, and in some embodiments, the worktable 102 and the glass plate may be inclined at an angle relative to the horizontal. During a polishing operation of the edge 12, the second mandrel 108 is rotated about the rotation axis 107, and the second mandrel 108 is translated along the Y axis. The polishing operation can also be performed on the edge 14 in a similar manner.

因此,可理解的是,旋轉台104允許對於在一垂直方位(平行於Z軸)的第一心軸106的研磨,以及對於在一水平方位(平行於水平平面或X-Y平面)的第二心軸108的拋光。藉由安裝在第一心軸106上的一研磨輪110及安裝在第二心軸108上的一拋光輪112,不須變換輪具,即可快速地並有效地在玻璃板10的邊緣12、14上進行拋光與研磨操作。由該些第一周圍液體冷卻噴嘴120、第二周圍液體冷卻噴嘴130及遠端液體冷卻噴嘴所提供的冷卻,能在加工的同時有效地冷卻玻璃板的該些邊緣,並且在研磨與拋光過程中,冷卻該研磨輪與拋光輪。Therefore, it can be understood that the rotating table 104 allows grinding of the first mandrel 106 in a vertical orientation (parallel to the Z axis) and the second center in a horizontal orientation (parallel to the horizontal plane or XY plane) Polishing of the shaft 108. With a grinding wheel 110 mounted on the first mandrel 106 and a polishing wheel 112 mounted on the second mandrel 108, the wheel 12 can be quickly and effectively placed on the edge 12 of the glass plate 10 without changing the wheel. , 14 for polishing and grinding operations. The cooling provided by the first surrounding liquid cooling nozzle 120, the second surrounding liquid cooling nozzle 130, and the remote liquid cooling nozzle can effectively cool the edges of the glass plate while processing, and during the grinding and polishing process Then, the grinding wheel and the polishing wheel are cooled.

一般而言,難以將平坦端面162保持在拋光輪112上,尤其是在拋光輪112被拋光掉許多邊緣之後。一修整製程可使輪具更平坦,並能去除燒毀區域以提升拋光效率。接著參照圖8,整修工具300係顯示包括一馬達302與修整輪304,修整輪304朝箭號305的方向旋轉。在修整輪304接觸拋光輪112的端面162的同時,拋光輪112繞著旋轉軸107旋轉並且沿著方向309平移。整修工具300可為線下的,亦即,位在遠離或與邊緣加工裝置100不同處。可選地,整修工具300可安裝在或鄰接於邊緣加工裝置100。當拋光輪112以3000 rpm的轉速旋轉時,透過具有75 mm的外徑、12.7 mm的內孔徑及25 mm的厚度的一GC(綠色碳化矽)120網目(120#)的修整輪,以147 rpm的轉速修整拋光輪112,同時以800 mm/min的速度平移拋光輪於0.01 mm的深度對玻璃邊緣的裁切,可得到修整後的一改良的端面162平坦度,從14微米及至小於1微米。In general, it is difficult to hold the flat end surface 162 on the polishing wheel 112, especially after the polishing wheel 112 has been polished off many edges. A trimming process can make the wheel flatter and remove burned areas to improve polishing efficiency. Referring next to FIG. 8, the dressing tool 300 is shown to include a motor 302 and a dressing wheel 304. The dressing wheel 304 is rotated in the direction of the arrow 305. While the dressing wheel 304 contacts the end surface 162 of the polishing wheel 112, the polishing wheel 112 rotates about the rotation axis 107 and translates in the direction 309. The finishing tool 300 may be off-line, that is, located away from or different from the edge processing device 100. Alternatively, the finishing tool 300 may be mounted on or adjacent to the edge processing device 100. When the polishing wheel 112 was rotated at 3000 rpm, a GC (green silicon carbide) 120 mesh (120 #) dressing wheel having an outer diameter of 75 mm, an inner diameter of 12.7 mm, and a thickness of 25 mm was passed through at 147. Trim the polishing wheel 112 at rpm, and translate the polishing wheel to a depth of 0.01 mm at 800 mm / min to trim the edge of the glass to obtain an improved flatness of the end surface 162 after trimming, from 14 microns to less than 1 Microns.

接著參照圖10,鑽孔工具400可耦接至第一心軸106或第二心軸108,以在玻璃板10內形成孔。因此,在一或多個實施例中,方法可包括藉由與該第一心軸或該第二心軸耦接的一鑽孔工具在該玻璃板內形成一孔的步驟。在該玻璃板內形成該孔的步驟,可在此處所述研磨與拋光之前或之後進行。Referring next to FIG. 10, the drilling tool 400 may be coupled to the first mandrel 106 or the second mandrel 108 to form a hole in the glass plate 10. Therefore, in one or more embodiments, the method may include the step of forming a hole in the glass plate by a drilling tool coupled to the first mandrel or the second mandrel. The step of forming the holes in the glass plate may be performed before or after the grinding and polishing described herein.

依據一或多個實施例,邊緣加工裝置100可形成垂直於一玻璃板的主平面的一邊緣12,並且提供具有改良的邊緣粗糙度至Ra<0.5微米、Ra <0.4微米、Ra <0.3微米或Ra <0.2微米的一邊緣,而不需要以氫氟酸蝕刻該邊緣及/或以研磨液拋光該邊緣。以另一方式說明,具有Ra<0.5微米、Ra <0.4微米、Ra <0.3微米或Ra <0.2微米的邊緣粗糙度的一玻璃板,可使用本案所揭示的依據一或多個實施例的邊緣加工裝置100透過研磨與拋光來製作。經研磨與拋光後的玻璃板的邊緣的平均粗糙度(Ra),係依據ISO 4288:1996而使用在www.keyence.com可見的Keyence公司的型號為VK-8510/VK-8500的Keyence超深形狀量測顯微鏡來量測。邊緣加工裝置100可加工各種不同的玻璃板大小,例如,具有X-Y的維度在範圍10 ´ 10 mm至3600 mm ´ 1725 mm的玻璃板及更大者。According to one or more embodiments, the edge processing device 100 may form an edge 12 perpendicular to a main plane of a glass plate, and provide improved edge roughness to Ra <0.5 micron, Ra <0.4 micron, Ra <0.3 micron Or an edge with Ra <0.2 micron without the need to etch the edge with hydrofluoric acid and / or polish the edge with an abrasive. Stated another way, a glass plate with edge roughness Ra <0.5 micron, Ra <0.4 micron, Ra <0.3 micron, or Ra <0.2 micron can use the edge according to one or more embodiments disclosed in this case. The processing device 100 is manufactured by grinding and polishing. The average roughness (Ra) of the edges of the glass plate after grinding and polishing, according to ISO 4288: 1996, Keyence company model VK-8510 / VK-8500, which is visible at www.keyence.com, is used. Shape measurement microscope to measure. The edge processing device 100 can process various glass plate sizes, for example, glass plates having X-Y dimensions ranging from 10 ´ 10 mm to 3600 mm ´ 1725 mm and larger.

本案的另一態樣關於研磨與拋光一玻璃板的一邊緣的方法。在一實施例中,該方法包含步驟:支撐該玻璃板於一表面上,例如圖1–2中所示的工作台102,其中X軸為在該表面上的一玻璃板的一平面上的一橫向移動方向,Y軸為在該平面上的垂直於該X軸的一縱向移動方向,且Z軸為正交於該平面的一移動方向。在特定實施例中,X軸為在水平表面上的一玻璃板的一水平平面上的一橫向移動方向,Y軸為該水平平面上的垂直於該X軸的一縱向移動方向,且Z軸為相對於該水平平面的一直立移動方向。該方法更包括步驟:藉由安裝於一第一心軸的一端的一研磨輪研磨該玻璃板的該邊緣,該第一心軸在研磨期間定向成沿著該Z軸,且該研磨輪具有一周圍邊緣,該周圍邊緣在該研磨期間接觸該玻璃板的該邊緣。該方法更包含步驟:藉由安裝於一第二心軸的一端的一拋光輪的一端面拋光該玻璃板的該邊緣,該第二心軸在拋光期間定位成平行於該平面且該拋光輪具有在拋光期間能接觸該邊緣的一端面。在工作台與玻璃板為水平的特定實施例中,在拋光期間,該第二心軸水平地定位(亦即,平行於X-Y平面)。Another aspect of this case relates to a method of grinding and polishing an edge of a glass plate. In one embodiment, the method includes the steps of supporting the glass plate on a surface, such as the table 102 shown in Figures 1-2, where the X-axis is on a plane of a glass plate on the surface. In a lateral movement direction, the Y axis is a longitudinal movement direction on the plane perpendicular to the X axis, and the Z axis is a movement direction orthogonal to the plane. In a specific embodiment, the X axis is a lateral movement direction on a horizontal plane of a glass plate on a horizontal surface, the Y axis is a longitudinal movement direction on the horizontal plane perpendicular to the X axis, and the Z axis It is an erect moving direction with respect to this horizontal plane. The method further includes the steps of grinding the edge of the glass plate by a grinding wheel mounted on one end of a first mandrel, the first mandrel being oriented along the Z axis during grinding, and the grinding wheel having A peripheral edge that contacts the edge of the glass plate during the grinding. The method further includes the step of polishing the edge of the glass plate by an end surface of a polishing wheel mounted on one end of a second mandrel, the second mandrel being positioned parallel to the plane and the polishing wheel during polishing. There is an end surface that can touch the edge during polishing. In a particular embodiment where the table is level with the glass plate, the second mandrel is positioned horizontally (ie, parallel to the X-Y plane) during polishing.

在一或多個實施例中,方法包含步驟:藉由配置成一環狀的第一周圍液體冷卻噴嘴在該研磨輪的該周圍邊緣處導引冷卻流體,該些第一周圍液體冷卻噴嘴在研磨期間鄰接於該研磨輪的該周圍邊緣。在一或多個實施例中,方法包含步驟:藉由設於遠離於該玻璃板的該邊緣的該複數個遠端液體冷卻噴嘴,於拋光期間在該玻璃板的該邊緣處,及/或於拋光期間在研磨輪110與拋光輪112處,導引冷卻流體。在一或多個實施例中,方法包含步驟:藉由設於遠離於該玻璃板的該邊緣的該複數個遠端液體冷卻噴嘴,於研磨期間在該邊緣處,及/或於研磨期間在研磨輪110與拋光輪112處,導引冷卻流體。In one or more embodiments, the method includes the steps of directing a cooling fluid at the peripheral edge of the grinding wheel by first peripheral liquid cooling nozzles configured in a ring shape, and the first peripheral liquid cooling nozzles are grinding It abuts the peripheral edge of the grinding wheel. In one or more embodiments, the method includes the steps of: at the edge of the glass plate during polishing, by the plurality of distal liquid cooling nozzles located away from the edge of the glass plate, and / or The cooling fluid is guided at the grinding wheel 110 and the polishing wheel 112 during polishing. In one or more embodiments, the method includes the steps of: by the plurality of distal liquid cooling nozzles disposed away from the edge of the glass plate, at the edge during grinding, and / or during grinding The grinding wheel 110 and the polishing wheel 112 guide cooling fluid.

在一或多個實施例中,方法包括步驟:在該玻璃板的該邊緣的研磨與拋光期間,在沿著該Y軸的一方向上相對於該玻璃板移動該第一心軸與該第二心軸。在該方法的一或多個實施例中,第一心軸與第二心軸具有一共同的主軸旋轉軸107,該第一心軸與第二心軸繞著共同的主軸旋轉軸107旋轉。In one or more embodiments, the method includes the steps of: during the grinding and polishing of the edge of the glass plate, moving the first mandrel and the second relative to the glass plate in one direction along the Y axis Mandrel. In one or more embodiments of the method, the first spindle and the second spindle have a common spindle rotation axis 107, and the first spindle and the second spindle rotate about the common spindle rotation axis 107.

在該方法的一或多個實施例中,拋光輪係一杯形磨輪。在該方法的一或多個實施例中,拋光輪係一杯形磨輪,該杯形磨輪包含在該杯形磨輪的該端面上的溝槽。在該方法的一或多個實施例中,加工後的玻璃板可用來作為一光導引板,其中該邊緣為研磨與拋光後的經加工的邊緣,該經加工的邊緣具有小於0.2微米的一平均粗糙度。In one or more embodiments of the method, the polishing wheel is a cup-shaped grinding wheel. In one or more embodiments of the method, the polishing wheel is a cup-shaped grinding wheel that includes a groove on the end surface of the cup-shaped grinding wheel. In one or more embodiments of the method, the processed glass plate can be used as a light guide plate, wherein the edge is a processed edge after grinding and polishing, and the processed edge has a An average roughness.

在該方法的一或多個實施例中,經加工的邊緣具有一垂直性,使得玻璃板在邊緣的研磨與拋光之後能用來作為具有一光源注入邊緣的光導引板,該光源注入邊緣將光線分散於小於12.8度的半峰全寬(FWHM)的穿透度的一角度內。在該方法的一或多個實施例中,其中該玻璃板的經加工的邊緣具有對450 nm波長的至少95%的一光穿透度。具有這樣高穿透度的玻璃板係適於作為一光導引板,該In one or more embodiments of the method, the processed edge has a perpendicularity, so that the glass plate can be used as a light guide plate with a light source injection edge after grinding and polishing of the edge, and the light source injection edge The light is dispersed within an angle of less than 12.8 degrees FWHM. In one or more embodiments of the method, wherein the processed edge of the glass plate has a light transmission of at least 95% to a wavelength of 450 nm. A glass plate having such a high transmittance is suitable as a light guide plate.

在一或多個實施例中,玻璃板的該邊緣為受到研磨與拋光的一第一邊緣,以提供可使用為一光導引板製品的一第一光源注入邊緣的一邊緣。該方法可更包括研磨與拋光鄰接該第一光源注入邊緣的兩個邊緣。在該方法的一或多個實施例中,玻璃板包含在50莫耳百分比濃度(mol%)至80莫耳百分比濃度(mol%)的一範圍內的SiO2 ,在0莫耳百分比濃度(mol%)至20莫耳百分比濃度(mol%)的一範圍內的Al2 O3 ,及在0莫耳百分比濃度(mol%)至25莫耳百分比濃度(mol%)的一範圍內的B2 O3 ,以及少於50 ppm重量濃度的鐵(Fe)。In one or more embodiments, the edge of the glass plate is a first edge subjected to grinding and polishing to provide an edge that can be used as a light source injection edge of a light guide plate product. The method may further include grinding and polishing two edges adjacent to the injection edge of the first light source. In one or more embodiments of the method, the glass plate comprises SiO 2 in a range of 50 mole percent concentration (mol%) to 80 mole percent concentration (mol%), and 0 mole percent concentration ( mol%) to Al 2 O 3 in a range of 20 mol% concentration (mol%) and B in a range of 0 mol% (mol%) to 25mol% concentration (mol%) 2 O 3 , and iron (Fe) at a concentration of less than 50 ppm by weight.

如上所指示,於此所述的裝置及方法可利用於玻璃光導引板的製造。圖11顯示一光導引板的例示實施例,該光導引板可由本案的方法及裝置製成,以透過研磨與拋光一邊緣來加工一玻璃板。該玻璃板具有一般的光導引板的形狀與結構,其包含一玻璃板,該玻璃板具有可為一前表面的一第一面610,及相對於該第一面的可為一後表面的一第二面。第一與第二面具有一高度H及一寬度W。在一或多個實施例中,第一及/或第二面具有小於0.6 nm的一平均粗糙度(Ra )。As indicated above, the devices and methods described herein can be used in the manufacture of glass light guide plates. FIG. 11 shows an exemplary embodiment of a light guide plate that can be made by the method and apparatus of the present case to process a glass plate by grinding and polishing an edge. The glass plate has a general shape and structure of a light guide plate, and includes a glass plate having a first surface 610 that may be a front surface, and a rear surface that may be opposite to the first surface. A second side. The first and second masks have a height H and a width W. In one or more embodiments, the first and / or the second surface has an average roughness (R a ) of less than 0.6 nm.

玻璃板600具有在該前表面與該後表面之間的一厚度T,其中該厚度形成四個邊緣。該玻璃板的厚度一般而言小於該前、後表面的高度與寬度。在不同實施例中,光導引板的厚度小於前及/或後表面的高度的1.5%。在一或多個實施例中,該厚度T可為約2 mm、約1.9 mm、約1.8 mm、約1.7 mm、約1.6 mm、約1.5 mm、約1.4 mm、約1.3 mm、約1.2 mm、約1.1 mm、約1 mm、約0.9 mm、約0.8 mm、約0.7 mm、約0.6 mm、約0.5 mm、約0.4 mm或約0.3 mm。光導引板的高度、寬度、及厚度經配置及定大小以用於一LCD背光應用中的一LGP。The glass plate 600 has a thickness T between the front surface and the rear surface, wherein the thickness forms four edges. The thickness of the glass plate is generally smaller than the height and width of the front and rear surfaces. In various embodiments, the thickness of the light guide plate is less than 1.5% of the height of the front and / or rear surface. In one or more embodiments, the thickness T may be about 2 mm, about 1.9 mm, about 1.8 mm, about 1.7 mm, about 1.6 mm, about 1.5 mm, about 1.4 mm, about 1.3 mm, about 1.2 mm, About 1.1 mm, about 1 mm, about 0.9 mm, about 0.8 mm, about 0.7 mm, about 0.6 mm, about 0.5 mm, about 0.4 mm, or about 0.3 mm. The height, width, and thickness of the light guide plate are configured and sized for an LGP in an LCD backlight application.

在所示實施例中,第一邊緣630為一光源注入邊緣,其接收例如發光二極體(LED)所提供的光源。在一些實施例中,該光源注入邊緣在小於12.8度的傳輸中的半峰全寬(FWHM)的一角度之內散射光線。光源注入邊緣可透過與本案所述的裝置及方法相符的研磨與拋光第一邊緣630而獲得。In the illustrated embodiment, the first edge 630 is a light source injection edge that receives, for example, a light source provided by a light emitting diode (LED). In some embodiments, the light source injection edge scatters light within an angle of full-width-at-half-width (FWHM) in transmissions of less than 12.8 degrees. The light source injection edge can be obtained by grinding and polishing the first edge 630 in accordance with the device and method described in this case.

玻璃板更包含鄰接光源注入邊緣630的一第二邊緣640,以及相對於第二邊緣640且鄰接光源注入邊緣630的一第三邊緣660,其中該第二邊緣640及/或該第三邊緣660在小於12.8度的反射中的半峰全寬(FWHM)的一角度內散射光。第二邊緣640及/或第三邊緣660可包含反射中的小於6.4度的一擴散角。玻璃板包括相對於第一邊緣630的一第四邊緣650。The glass plate further includes a second edge 640 adjacent to the light source injection edge 630 and a third edge 660 opposite to the second edge 640 and adjacent to the light source injection edge 630, wherein the second edge 640 and / or the third edge 660 Scatter light within an angle of full-width at half maximum (FWHM) in reflections less than 12.8 degrees. The second edge 640 and / or the third edge 660 may include a diffusion angle of less than 6.4 degrees in the reflection. The glass plate includes a fourth edge 650 opposite to the first edge 630.

依據一或多個實施例的,LGP的四個邊緣之中的三個具有一鏡面拋光的表面,係因以下兩個原因:LED耦合及在兩個邊緣處的全內反射(TIR)。依據一或多個實施例,及如圖12中所示,注入一第一邊緣630的光可在鄰接於該注入邊緣的一第二邊緣640及鄰接於該注入邊緣的一第三邊緣660為入射光,其中該第二邊緣640係相對於第三邊緣660。在不具有氫氟酸蝕刻及/或以研磨液拋光邊緣的情形下,該第二與第三邊緣亦可包含在小於0.5微米、0.4微米、0.3微米、或0.2微米的邊緣處的一低平均粗糙度,使得該入射光經歷從鄰接該第一邊緣的兩個邊緣的全內反射。According to one or more embodiments, three of the four edges of the LGP have a mirror-polished surface for two reasons: LED coupling and total internal reflection (TIR) at the two edges. According to one or more embodiments, and as shown in FIG. 12, light injected into a first edge 630 may be at a second edge 640 adjacent to the injection edge and a third edge 660 adjacent to the injection edge as Incident light, where the second edge 640 is relative to the third edge 660. In the absence of hydrofluoric acid etching and / or polishing edges with abrasive fluid, the second and third edges may also include a low average at edges less than 0.5 microns, 0.4 microns, 0.3 microns, or 0.2 microns The roughness is such that the incident light undergoes total internal reflection from two edges adjacent to the first edge.

光可從沿著第一邊緣630而設置的LED的一陣列700注入第一邊緣630。該些LED可位於離第一邊緣630小於0.5 mm的距離。依據一或多個實施例的,該些LED可具有小於或等於該玻璃板的厚度的一厚度或高度,以對光導引板600提供有效率的光耦合。依據一或多個實施例,該兩個邊緣640、660亦可包含小於6.4度的反射中的一擴散角。Light may be injected into the first edge 630 from an array 700 of LEDs disposed along the first edge 630. These LEDs may be located at a distance less than 0.5 mm from the first edge 630. According to one or more embodiments, the LEDs may have a thickness or height that is less than or equal to the thickness of the glass plate to provide efficient light coupling to the light guide plate 600. According to one or more embodiments, the two edges 640, 660 may also include a diffusion angle in reflections less than 6.4 degrees.

例子example

穿透率值,係以多個具有200 mm ´ 200 mm ´ 1.1mm的X-Y-Z維度的玻璃板,在受到使用邊緣加工裝置100及以下所述的不同的研磨與拋光輪的研磨與拋光來決定。在研磨與拋光之後的穿透率,係使用在www.keyence.com可見的Keyence公司的型號為VK-8510/VK-8500的Keyence超深形狀量測顯微鏡來量測。以200 mm ´ 200 mm ´ 1.1 mm的玻璃板在Y維度(200 mm)上,使用雷射光源(美商Energetiq科技公司的EQ-99X LDLS)以範圍在400 nm至700 nm之間的一波長,藉由導引光源於底面與經拋光的邊緣,並且以顯微鏡量測由該樣品在相反的邊緣所傳輸的光,來量測穿透率。量測係在400 nm、560 nm、及630 nm的波長下進行。將具有底面與拋光的邊緣的該些樣品的穿透率的量測值,與經由在剪裁之後但在邊緣的研磨與拋光之前的具有相同的X-Y-Z維度的一玻璃板在Y維度(200 mm)上所量測到的穿透率值進行比較,以提供相比於裁切邊緣樣品的一百分比值。透過導引光源於該裁切邊緣並且於相對的邊緣處量測傳輸經過該樣品的光,來量測具有裁切邊緣的樣品的穿透率。在被裁切後但在邊緣的研磨與拋光之前經量測的一個樣品具有在裁切邊緣的100.00%的一玻璃穿透率。以下所提供的穿透率值係在波長為400 nm、560 nm、及630 nm時所完成量測的一平均值。The transmittance value is determined by a plurality of glass plates having an X-Y-Z dimension of 200 mm ´ 200 mm ´ 1.1 mm, which are subjected to grinding and polishing using different grinding and polishing wheels described below using the edge processing apparatus 100 and the following. The transmittance after grinding and polishing was measured using Keyence's Model VK-8510 / VK-8500 Keyence Ultra-Deep Shape Measuring Microscope visible from www.keyence.com. A 200 mm ´ 200 mm ´ 1.1 mm glass plate is used in the Y dimension (200 mm) using a laser light source (EQ-99X LDLS from Energetiq Technology, Inc.) at a wavelength ranging from 400 nm to 700 nm The transmittance is measured by guiding the light source on the bottom surface and the polished edge, and measuring the light transmitted by the sample on the opposite edge with a microscope. Measurements were performed at wavelengths of 400 nm, 560 nm, and 630 nm. The measured values of the transmittance of the samples with the bottom surface and the polished edges were measured in the Y dimension (200 mm) with a glass plate having the same XYZ dimension after cutting but before grinding and polishing of the edges. The measured transmission values above are compared to provide a percentage value compared to the cut edge sample. The light transmitted through the sample is measured by guiding the light source at the cutting edge and at the opposite edge to measure the transmittance of the sample with the cutting edge. A sample measured after being cut but before grinding and polishing of the edges has a glass penetration of 100.00% at the cut edges. The transmittance values provided below are an average of measurements performed at wavelengths of 400 nm, 560 nm, and 630 nm.

平均粗糙度,係以多個具有1219 mm ´ 150 mm ´ 1.1 mm的X-Y-Z維度的玻璃板,在受到使用邊緣加工裝置100及以下所述的不同的研磨與拋光輪的研磨與拋光來決定。在研磨與拋光之後的邊緣的表面粗糙度,係依據ISO 4288:1996而使用在www.keyence.com可見的Keyence公司的型號為VK-8510/VK-8500的Keyence超深形狀量測顯微鏡來量測。The average roughness is determined by a plurality of glass plates having X-Y-Z dimensions of 1219 mm ´ 150 mm ´ 1.1 mm, which are subjected to grinding and polishing using different grinding and polishing wheels described below using the edge processing apparatus 100 and the following. The surface roughness of the edges after grinding and polishing is measured in accordance with ISO 4288: 1996 using Keyence's Model VK-8510 / VK-8500 from Keyence, which is visible at www.keyence.com. Measurement.

例1example 1

使用有凹角的金屬鍵結的一800網目(800#)的鑽石研磨輪,以6000 mm/min的平移速度移除0.10 mm的邊緣的方式,來研磨一玻璃板的一邊緣。接著,進行以端面為有凹槽的環氧樹脂鍵結的一2000網目(2000#)的具有體積50%以上的Cu含量的杯形磨輪,以6000 mm/min的平移速度在一次通過後能移除0.03 mm的方式的一第二邊緣拋光步驟。一第三步驟,涉及了以具無凹槽的端面的一5000網目(5000#)的具有體積50%以上的Cu含量的樹脂杯形磨輪,以6000 mm/min的平移速度在一次通過後能移除0.005 mm的方式來進行拋光。使用Keyence顯微鏡,利用以上所述技術所量測出的平均粗糙度Ra為0.04微米。透光性係如上所述來量測,且透光性超過99.5%,量測到99.8%。An 800 mesh (800 #) diamond grinding wheel with a concave metal bond was used to grind an edge of a glass plate by removing a 0.10 mm edge at a translation speed of 6000 mm / min. Next, a 2000 mesh (2000 #) cup-shaped grinding wheel with a Cu content of more than 50% by using a grooved epoxy resin bond as the end surface can be passed at a translation speed of 6000 mm / min. A 0.03 mm way to remove a second edge polishing step. A third step involves using a 5000-mesh (5000 #) resin cup-shaped grinding wheel with a Cu content of 50% by volume with a groove-free end surface at a translation speed of 6000 mm / min. Remove 0.005 mm for polishing. Using a Keyence microscope, the average roughness Ra measured using the techniques described above was 0.04 microns. The light transmittance was measured as described above, and the light transmittance exceeded 99.5%, and the measurement was 99.8%.

例2Example 2

使用直式(無凹角的)金屬鍵結的一800網目(800#)鑽石研磨輪,以6000 mm/min的平移速度移除0.10 mm的邊緣的方式,來研磨一玻璃板的一邊緣。接著,進行以一800網目(800#)的有凹角的金屬鍵結的鑽石研磨輪以6000 mm/min的平移速度在一次通過後能移除0.05 mm的方式的一第二邊緣研磨步驟。一第三步驟,涉及了以具無凹槽的端面的一5000網目(5000#)的具有體積50%以上的Cu含量的樹脂杯形磨輪,以6000 mm/min的平移速度在三次通過後能移除0.005 mm的方式來進行拋光。使用Keyence顯微鏡,利用以上所述技術所量測出的平均粗糙度Ra為0.035微米。An 800 mesh (800 #) diamond grinding wheel with a straight (non-concave) metal bond was used to remove a 0.10 mm edge at a translation speed of 6000 mm / min to grind an edge of a glass plate. Next, a second edge grinding step is performed with a 800 mesh (800 #) concave metal bonded diamond grinding wheel at a translation speed of 6000 mm / min, which can remove 0.05 mm after one pass. A third step involves using a 5000-mesh (5000 #) resin cup-shaped grinding wheel with a Cu content of 50% by volume with an end surface without grooves at a translation speed of 6000 mm / min. Remove 0.005 mm for polishing. Using a Keyence microscope, the average roughness Ra measured using the techniques described above was 0.035 microns.

透光性是使用上述技術來量測的,且超過99.5%,量測到99.8%。The light transmittance is measured using the above technique, and it exceeds 99.5%, and the measurement is 99.8%.

於此所述的材料,方法和物品可以進行各種修改和變化。於此所述的材料、方法及物品的其他態樣,在考量了本案的說明書與實務上的材料、方法及物品後應為顯而易見的。說明書和實例應被認為是示例性的。對於本領域技術人員顯而易見的是,在不脫離本公開的精神或範圍的情況下可以進行各種修改和變化。The materials, methods, and articles described herein are subject to various modifications and changes. Other aspects of the materials, methods, and articles described herein should be apparent after considering the materials, methods, and articles in the description and practice of this case. The description and examples should be considered exemplary. It will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit or scope of the disclosure.

10‧‧‧玻璃板10‧‧‧ glass plate

12‧‧‧邊緣12‧‧‧ edge

13‧‧‧邊緣13‧‧‧ edge

14‧‧‧邊緣14‧‧‧ edge

15‧‧‧邊緣15‧‧‧ edge

19‧‧‧導角19‧‧‧Leading angle

100‧‧‧邊緣加工裝置100‧‧‧Edge processing device

102‧‧‧工作台102‧‧‧Workbench

104‧‧‧旋轉台104‧‧‧Turntable

105‧‧‧旋轉軸105‧‧‧rotation axis

106‧‧‧第一心軸106‧‧‧ first mandrel

107‧‧‧主軸旋轉軸107‧‧‧ Spindle rotation axis

108‧‧‧第二心軸108‧‧‧ second mandrel

110‧‧‧研磨輪110‧‧‧ grinding wheel

111‧‧‧周圍研磨邊緣111‧‧‧ around ground edges

112‧‧‧拋光輪112‧‧‧Polishing Wheel

120‧‧‧第一冷卻線路120‧‧‧first cooling circuit

121‧‧‧第一周圍液體冷卻噴嘴121‧‧‧The first surrounding liquid cooling nozzle

125‧‧‧導角125‧‧‧lead angle

127‧‧‧第一供應線路127‧‧‧The first supply line

130‧‧‧第二周圍液體冷卻噴嘴130‧‧‧Second ambient liquid cooling nozzle

131‧‧‧第二冷卻線路131‧‧‧second cooling circuit

140‧‧‧遠端液體冷卻噴嘴140‧‧‧ distal liquid cooling nozzle

141‧‧‧第三冷卻線路141‧‧‧Third cooling circuit

147‧‧‧第二供應線路147‧‧‧Second Supply Line

150‧‧‧殼體150‧‧‧shell

152‧‧‧支架152‧‧‧ Bracket

161‧‧‧周圍拋光邊緣161‧‧‧ around polished edges

162‧‧‧拋光端面162‧‧‧polished face

164‧‧‧凹形的區域164‧‧‧ concave area

166‧‧‧溝槽166‧‧‧Trench

180‧‧‧Y軸載具180‧‧‧Y-axis carrier

182‧‧‧軌道182‧‧‧ track

190‧‧‧X軸載具190‧‧‧X-axis carrier

195‧‧‧柄195‧‧‧ handle

197‧‧‧柄197‧‧‧ handle

200‧‧‧電腦數值控制(CNC)機200‧‧‧ computer numerical control (CNC) machine

210‧‧‧控制器210‧‧‧ Controller

212‧‧‧位置感測器212‧‧‧Position Sensor

300‧‧‧整修工具300‧‧‧ Renovation tools

302‧‧‧馬達302‧‧‧Motor

304‧‧‧修整輪304‧‧‧dressing round

305‧‧‧箭號305‧‧‧Arrow

309‧‧‧方向309‧‧‧direction

400‧‧‧鑽孔工具400‧‧‧ Drilling tools

600‧‧‧玻璃板600‧‧‧ glass plate

610‧‧‧第一面610‧‧‧First

630‧‧‧第一邊緣630‧‧‧first edge

640‧‧‧第二邊緣640‧‧‧Second Edge

650‧‧‧第四邊緣650‧‧‧ fourth edge

660‧‧‧第三邊緣660‧‧‧ Third Edge

700‧‧‧陣列700‧‧‧ array

結合在本說明書中並構成其一部分的所附圖示,圖示出了以下描述的多個態樣。The accompanying drawings incorporated in and forming a part of this specification illustrate a number of aspects described below.

圖1為用於加工一玻璃板的一邊緣的裝置的立體圖,顯示了依據一或多個實施例的一研磨輪,其經定位以研磨玻璃板的一邊緣;1 is a perspective view of a device for processing an edge of a glass plate, showing a grinding wheel according to one or more embodiments, which is positioned to grind an edge of the glass plate;

圖2為圖1所示裝置的一部份的詳細立體圖;2 is a detailed perspective view of a part of the device shown in FIG. 1;

圖3為用於加工一玻璃板的一邊緣的裝置的立體圖,顯示了依據一或多個實施例的一拋光輪,其經定位以研磨玻璃板的一邊緣;3 is a perspective view of a device for processing an edge of a glass plate, showing a polishing wheel according to one or more embodiments, which is positioned to grind an edge of the glass plate;

圖4為圖3所示裝置的一部份的詳細立體圖;4 is a detailed perspective view of a part of the device shown in FIG. 3;

圖5為依據一或多個實施例的一心軸上的一拋光輪的詳細立體圖;5 is a detailed perspective view of a polishing wheel on a mandrel according to one or more embodiments;

圖6為依據一或多個實施例的圖1所示裝置的研磨輪的詳細立體圖;6 is a detailed perspective view of a grinding wheel of the apparatus shown in FIG. 1 according to one or more embodiments;

圖7A為顯示研磨一玻璃板的一邊緣的一研磨輪的側面圖;7A is a side view of a grinding wheel showing an edge of a glass plate;

圖7B為顯示拋光一玻璃板的一邊緣的一拋光輪的側面圖;7B is a side view of a polishing wheel showing an edge of a glass plate;

圖8顯示出依據一或多個實施例的一拋光輪的側面圖,該拋光輪經由一修整輪作修整;FIG. 8 shows a side view of a polishing wheel according to one or more embodiments, the polishing wheel being trimmed by a trimming wheel;

圖9A為依據一或多個實施例的一拋光輪的立體圖;9A is a perspective view of a polishing wheel according to one or more embodiments;

圖9B為依據一或多個實施例的一拋光輪的立體圖;9B is a perspective view of a polishing wheel according to one or more embodiments;

圖9C為依據一或多個實施例的一研磨輪的立體圖;9C is a perspective view of a grinding wheel according to one or more embodiments;

圖10為依據一實施例的一鑽孔工具的立體圖;10 is a perspective view of a drilling tool according to an embodiment;

圖11圖示出光導引板的一例示實施例;及FIG. 11 illustrates an exemplary embodiment of a light guide plate; and

圖12圖示出在一玻璃LGP的兩相鄰邊緣處的光的全內反射。FIG. 12 illustrates the total internal reflection of light at two adjacent edges of a glass LGP.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic hosting information (please note in order of hosting institution, date, and number) None

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Claims (23)

一種用於加工一玻璃板的一邊緣的裝置,包括: 一工作台,該工作台在當該些邊緣受到研磨與拋光時支撐該玻璃板,其中一X軸為在該工作台上的一玻璃板的一平面上的一橫向移動方向,一Y軸為在該平面上的垂直於該X軸的一縱向移動方向,且一Z軸為相對於該平面的一直立移動方向;一旋轉台,可沿著該X軸與該Y軸移動,該旋轉台具有一旋轉台旋轉軸;一第一心軸與一第二心軸,安裝至具有一共同的主軸旋轉軸的該旋轉台,該第一心軸與該第二心軸繞著該共同的主軸旋轉軸旋轉,該共同的主軸旋轉軸正交於該旋轉台旋轉軸;以及安裝在該第一心軸上的一研磨輪及安裝在該第二心軸上的一拋光輪,該研磨輪配置以研磨具有平行於該Z軸的該共同的主軸旋轉軸的該玻璃板的一邊緣,且該拋光輪配置以拋光具有平行於該X軸的該共同的主軸旋轉軸的該玻璃板的一邊緣。An apparatus for processing an edge of a glass plate includes: a table supporting the glass plate when the edges are ground and polished, wherein an X axis is a glass on the table A lateral movement direction on a plane of the board, a Y axis is a longitudinal movement direction on the plane perpendicular to the X axis, and a Z axis is an upright movement direction with respect to the plane; a rotary table, Movable along the X-axis and the Y-axis, the rotary table has a rotary table rotary axis; a first spindle and a second spindle are mounted to the rotary table having a common spindle rotation axis, the first A mandrel and the second mandrel rotate around the common main shaft rotation axis, the common main shaft rotation axis is orthogonal to the rotary table rotation axis; and a grinding wheel mounted on the first mandrel and mounted on A polishing wheel on the second mandrel, the grinding wheel is configured to grind an edge of the glass plate having the common main axis rotation axis parallel to the Z axis, and the polishing wheel is configured to polish having an edge parallel to the X The glass plate of the common spindle rotation axis An edge. 如請求項1所述的裝置,更包含複數個第一周圍液體冷卻噴嘴,配置成一環狀,該些第一周圍液體冷卻噴嘴鄰接該第一心軸,且經設置以將冷卻液體導引朝向該研磨輪的一周圍邊緣。The device according to claim 1, further comprising a plurality of first peripheral liquid cooling nozzles arranged in a ring shape, the first peripheral liquid cooling nozzles adjoining the first mandrel and arranged to guide the cooling liquid toward A peripheral edge of the grinding wheel. 如請求項2所述的裝置,更包含複數個第二周圍液體冷卻噴嘴,配置成一環狀,該些第二周圍液體冷卻噴嘴鄰接該第二心軸。The device according to claim 2, further comprising a plurality of second peripheral liquid cooling nozzles arranged in a ring shape, and the second peripheral liquid cooling nozzles are adjacent to the second mandrel. 如請求項2所述的裝置,更包含複數個遠端液體冷卻噴嘴,係設置成遠離該研磨輪與該拋光輪,且經設置以將冷卻液體導引朝向該玻璃板的一邊緣。The device according to claim 2, further comprising a plurality of remote liquid cooling nozzles, which are arranged away from the grinding wheel and the polishing wheel, and are arranged to guide the cooling liquid toward an edge of the glass plate. 如請求項4所述的裝置,其中該複數個第一周圍液體冷卻噴嘴與遠端液體冷卻噴嘴經配置以在該玻璃板的研磨期間被開啟。The device of claim 4, wherein the plurality of first ambient liquid cooling nozzles and distal liquid cooling nozzles are configured to be turned on during grinding of the glass plate. 如請求項2所述的裝置,其中該複數個第一周圍液體冷卻噴嘴包括四個冷卻噴嘴。The device of claim 2, wherein the plurality of first ambient liquid cooling nozzles include four cooling nozzles. 如請求項2所述的裝置,其中該複數個第一周圍液體冷卻噴嘴包括六個冷卻噴嘴。The device of claim 2, wherein the plurality of first ambient liquid cooling nozzles include six cooling nozzles. 如請求項1所述的裝置,其中該研磨輪包含一圓筒狀輪,該圓筒狀輪包括一周圍研磨邊緣,且該拋光輪包含一杯形磨輪,該杯形磨輪包括一周圍拋光邊緣及一拋光端面。The device according to claim 1, wherein the grinding wheel includes a cylindrical wheel, the cylindrical wheel includes a peripheral grinding edge, and the polishing wheel includes a cup-shaped grinding wheel, the cup-shaped grinding wheel includes a peripheral polishing edge and a Polished end faces. 如請求項8所述的裝置,其中該第一心軸與該研磨輪經配置以在研磨期間透過該周圍研磨邊緣接觸該玻璃板的一邊緣,且該第二心軸與該拋光輪經配置以透過由該拋光端面接觸該玻璃板的一邊緣。The device according to claim 8, wherein the first mandrel and the grinding wheel are configured to contact an edge of the glass plate through the surrounding grinding edge during grinding, and the second mandrel and the polishing wheel are configured An edge of the glass plate is contacted through the polished end surface. 如請求項9所述的裝置,其中該杯形磨輪的該拋光端面包含一有溝槽的表面。The apparatus of claim 9, wherein the polished end surface of the cup-shaped grinding wheel includes a grooved surface. 如請求項1所述的裝置,其中該旋轉台係安裝於沿著該y軸為可移動的一支架上,且該旋轉台沿著該x軸為可移動。The device according to claim 1, wherein the rotary table is mounted on a bracket that is movable along the y-axis, and the rotary table is movable along the x-axis. 如請求項11所述的裝置,其中該支架沿著一y軸載具為可移動,且該旋轉台沿著一x軸載具為可移動。The device according to claim 11, wherein the support is movable along a y-axis carrier, and the turntable is movable along an x-axis carrier. 一種研磨與拋光一玻璃板的一邊緣的方法,包含下列步驟: 支撐一玻璃板於一表面上,其中一X軸為在該表面上的一玻璃板的一平面上的一橫向移動方向,一Y軸為在該平面上的垂直於該X軸的一縱向移動方向,且一Z軸為正交於該平面的一移動方向;藉由安裝於一第一心軸的一端的一研磨輪研磨該玻璃板的該邊緣,該第一心軸在研磨期間定向成沿著該Z軸,且該研磨輪包含一周圍邊緣,該周圍邊緣在該研磨期間接觸該玻璃板的該邊緣;以及藉由安裝於一第二心軸的一端的一拋光輪的一端面拋光該玻璃板的該邊緣,該第二心軸在拋光期間定位成平行於該平面。A method of grinding and polishing an edge of a glass plate includes the following steps: supporting a glass plate on a surface, wherein an X axis is a lateral movement direction on a plane of a glass plate on the surface, a Y axis is a longitudinal movement direction on the plane perpendicular to the X axis, and a Z axis is a movement direction orthogonal to the plane; grinding is performed by a grinding wheel mounted on one end of a first mandrel The edge of the glass plate, the first mandrel is oriented along the Z axis during grinding, and the grinding wheel includes a peripheral edge that contacts the edge of the glass plate during grinding; and An end surface of a polishing wheel mounted on one end of a second mandrel polishes the edge of the glass plate, and the second mandrel is positioned parallel to the plane during polishing. 如請求項13所述的方法,更包含步驟:藉由配置成一環狀的複數個第一周圍液體冷卻噴嘴,在該研磨輪的該周圍邊緣處導引冷卻流體,該些第一周圍液體冷卻噴嘴鄰接於該研磨輪的該周圍邊緣。The method according to claim 13, further comprising the step of: directing a cooling fluid at the peripheral edge of the grinding wheel by a plurality of first peripheral liquid cooling nozzles arranged in a ring shape, the first peripheral liquid cooling The nozzle abuts the peripheral edge of the grinding wheel. 如請求項14所述的方法,更包含步驟:在拋光期間,藉由設於遠離於該玻璃板的該邊緣的該複數個遠端液體冷卻噴嘴,在該邊緣處導引冷卻流體。The method according to claim 14, further comprising the step of: during the polishing, directing a cooling fluid at the edge by the plurality of distal liquid cooling nozzles provided away from the edge of the glass plate. 如請求項15所述的方法,更包含步驟:在研磨期間,藉由設於遠離於該玻璃板的該邊緣的該複數個遠端液體冷卻噴嘴,在該邊緣處導引冷卻流體。The method according to claim 15, further comprising the step of directing a cooling fluid at the edge during the grinding by the plurality of distal liquid cooling nozzles provided away from the edge of the glass plate. 如請求項15所述的方法,更包含步驟:在該玻璃板的該邊緣的研磨與拋光期間,在沿著該Y軸的一方向上相對於該玻璃板移動該第一心軸與該第二心軸。The method according to claim 15, further comprising the step of: during the grinding and polishing of the edge of the glass plate, moving the first mandrel and the second relative to the glass plate in a direction along the Y axis. Mandrel. 如請求項17所述的方法,其中該第一心軸與第二心軸繞著一共同的主軸旋轉軸旋轉。The method according to claim 17, wherein the first mandrel and the second mandrel rotate around a common main axis rotation axis. 如請求項15所述的方法,其中該拋光輪係一杯形磨輪。The method according to claim 15, wherein the polishing wheel is a cup-shaped grinding wheel. 如請求項19所述的方法,其中該杯形磨輪包含在該杯形磨輪的該端面上的溝槽。The method of claim 19, wherein the cup-shaped grinding wheel includes a groove on the end surface of the cup-shaped grinding wheel. 如請求項13所述的方法,更包含步驟:藉由與該第一心軸或該第二心軸耦接的一鑽孔工具,在該玻璃板內形成一孔。The method according to claim 13, further comprising the step of: forming a hole in the glass plate by a drilling tool coupled to the first mandrel or the second mandrel. 如請求項13所述的方法,該邊緣係在研磨與拋光之後的一經加工的邊緣,該經加工的邊緣具有小於約0.2微米的一平均粗糙度。The method of claim 13, wherein the edge is a processed edge after grinding and polishing, and the processed edge has an average roughness of less than about 0.2 microns. 如請求項22所述的方法,其中該玻璃板包含在50莫耳百分比濃度至80莫耳百分比濃度的一範圍內的SiO2 ,在0莫耳百分比濃度至20莫耳百分比濃度的一範圍內的Al2 O3 ,及在0莫耳百分比濃度至25莫耳百分比濃度的一範圍內的B2 O3 ,以及少於50ppm的重量的Fe。The method of claim 22, wherein the glass plate comprises SiO 2 in a range of 50 mol% to 80 mol%, and in a range of 0 mol% to 20 mol%. Al 2 O 3 , and B 2 O 3 in a range of 0 mol% to 25 mol%, and Fe less than 50 ppm by weight.
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