TW201825285A - Electrolytic copper foil substantially free of wrinkle defect, electrode including the same, secondary battery including the same, and method of manufacturing the same - Google Patents

Electrolytic copper foil substantially free of wrinkle defect, electrode including the same, secondary battery including the same, and method of manufacturing the same Download PDF

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TW201825285A
TW201825285A TW107101278A TW107101278A TW201825285A TW 201825285 A TW201825285 A TW 201825285A TW 107101278 A TW107101278 A TW 107101278A TW 107101278 A TW107101278 A TW 107101278A TW 201825285 A TW201825285 A TW 201825285A
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copper foil
electrolytic copper
electrolytic
secondary battery
layer
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TW107101278A
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TWI659827B (en
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金昇玟
金善花
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南韓商Ls美創有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • H01M4/661Metal or alloys, e.g. alloy coatings
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/38Selection of substances as active materials, active masses, active liquids of elements or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/58Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
    • H01M4/583Carbonaceous material, e.g. graphite-intercalation compounds or CFx
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Abstract

Provided are an electrolytic copper foil substantially free of a wrinkle defect, an electrode including the same, a secondary battery including the same, and a method of manufacturing the same. The electrolytic copper foil of the present invention has a first surface and a second surface opposite the first surface, each of the first and second surfaces has a profile maximum ratio (PMR) of 4.8 to 16.1, and the electrolytic copper foil has a texture coefficient [TC(220)] of a (220) plane of 0.49 to 1.28, a yield strength of 35 to 58 kgf/mm2, and a weight deviation of 3% or less.

Description

實質上沒有起皺缺陷的電解銅箔、包含其的電極、包含其的二次電池、及其製造方法Electrolytic copper foil having substantially no wrinkle defect, electrode including the same, secondary battery including the same, and method for manufacturing the same

本發明關於一種實質上沒有起皺缺陷的電解銅箔、包含其的電極、包含其的二次電池、及其製造方法。The present invention relates to an electrolytic copper foil having substantially no wrinkle defects, an electrode including the same, a secondary battery including the same, and a method for manufacturing the same.

電解銅箔用於製造各種產品,如二次電池的負極和可撓性印刷電路板(FPCBs)。Electrolytic copper foil is used to make various products, such as the negative electrode of secondary batteries and flexible printed circuit boards (FPCBs).

當電解銅箔製造過程中無法精確地控制生產條件時,無法防止典型的起皺缺陷在製造薄膜時產生。When the production conditions cannot be accurately controlled during the electrolytic copper foil manufacturing process, typical wrinkle defects cannot be prevented from being produced during the manufacture of the film.

具有起皺缺陷的電解銅箔會導致二次電池的產量和質量下降。具體而言,由於具有起皺缺陷的電解銅箔由於表面的不均勻性,電解銅箔的表面無法均勻地被負極活性物質覆蓋。負極活性材料的不均勻塗層會引起二次電池的短路或負極活性材料的分層。因此,電解銅箔的起皺缺陷是消費者退貨的原因之一。An electrolytic copper foil having a wrinkle defect causes a decrease in the yield and quality of a secondary battery. Specifically, the surface of the electrolytic copper foil cannot be uniformly covered with the negative electrode active material due to unevenness of the surface of the electrolytic copper foil having a wrinkle defect. The uneven coating of the negative active material may cause a short circuit of the secondary battery or delamination of the negative active material. Therefore, the wrinkle defect of electrolytic copper foil is one of the reasons for consumer returns.

已知減少電解銅箔的重量偏差是抑制電解銅箔的起皺缺陷的一種方法。但是,為提高二次電池容量而增加使用比例,在電解銅箔的厚度為8μm以下的情況下,即使其重量偏差被控制得非常低,仍然會出現起皺缺陷。It is known that reducing the weight deviation of an electrolytic copper foil is a method of suppressing a wrinkle defect of the electrolytic copper foil. However, in order to increase the secondary battery capacity and increase the usage ratio, wrinkle defects still occur when the thickness of the electrolytic copper foil is 8 μm or less, even if the weight deviation is controlled to be very low.

本發明涉及提供一種電解銅箔、包含其之電極、包含其之二次電池、以及其製造方法,可避免先前技術的限制和缺點。The invention relates to providing an electrolytic copper foil, an electrode including the same, a secondary battery including the same, and a manufacturing method thereof, which can avoid the limitations and disadvantages of the prior art.

另外,本發明涉及實質上沒有起皺缺陷的電解銅箔。The present invention also relates to an electrolytic copper foil having substantially no wrinkle defects.

此外,本發明涉及一種通過用實質上沒有起皺缺陷的電解銅箔製造的電極,能夠確保高生產率。In addition, the present invention relates to an electrode manufactured by using an electrolytic copper foil having substantially no wrinkle defects, thereby ensuring high productivity.

再者,本發明涉及一種通過用實質上沒有起皺缺陷的電解銅箔製造的二次電池,能確保高生產率。Furthermore, the present invention relates to a secondary battery manufactured by using an electrolytic copper foil having substantially no wrinkle defects, which can ensure high productivity.

此外,本發明涉及一種能夠防止起皺缺陷的電解銅箔的製造方法。Moreover, this invention relates to the manufacturing method of the electrolytic copper foil which can prevent a wrinkle defect.

除了本發明的上述方面外,本發明的其他特徵和優點描述如下;或者根據以下之描述,本發明的某些未描述的特徵和優點對於所屬技術領域之人員而言是可思及的。In addition to the above aspects of the present invention, other features and advantages of the present invention are described below; or, according to the following description, certain undescribed features and advantages of the present invention are conceivable to those skilled in the art.

本發明之一方面係提供一種電解銅箔,電解銅箔可以包含一第一表面、和相對於第一表面之一第二表面、一銅層、和一第一保護層,銅層包含面向第一表面之一無光澤面和面向第二表面之一光澤面;第一保護層置於銅層之無光澤面上,以及一第二保護層,置於該光澤面上;其中該第一表面和該第二表面各具有4.8 至16.1的一輪廓最大比率(profile maximum ratio,PMR),其中該輪廓最大比率為一最大高度粗糙度(Rmax )與一算術平均粗糙度(Ra )的一比率(Rmax /Ra );以及該電解銅箔的(220)面的織構係數[TC(220)]的範圍為0.49至1.28,降伏強度的範圍為35 kgf/mm2 至58 kgf/mm2 ,以及重量偏差的範圍為等於小於3%。An aspect of the present invention is to provide an electrolytic copper foil. The electrolytic copper foil may include a first surface, a second surface opposite to the first surface, a copper layer, and a first protective layer. A matte surface on one surface and a matte surface facing the second surface; a first protective layer on the matte surface of the copper layer, and a second protective layer on the glossy surface; wherein the first surface And the second surface each have a profile maximum ratio (PMR) of 4.8 to 16.1, wherein the maximum profile ratio is a ratio of a maximum height roughness (R max ) and an arithmetic average roughness (R a ) The ratio (R max / R a ); and the texture coefficient [TC (220)] of the (220) surface of the electrolytic copper foil ranges from 0.49 to 1.28, and the drop strength ranges from 35 kgf / mm 2 to 58 kgf / mm 2 , and the range of weight deviation is equal to or less than 3%.

該第一表面和該第二表面各具有1.2 μm至3.7 μm的一最大高度粗糙度(Rmax ) 以及0.15μm 至 0.45 μm的一算術平均粗糙度(Ra )。The first surface and the second surface each have a maximum height roughness (R max ) of 1.2 μm to 3.7 μm and an arithmetic average roughness (R a ) of 0.15 μm to 0.45 μm.

該第一保護層和該第二保護層各可以含鉻(Cr)。The first protective layer and the second protective layer may each contain chromium (Cr).

該電解銅箔具有4μm至30 μm的一厚度,且較佳厚度為4μm至8μm。The electrolytic copper foil has a thickness of 4 μm to 30 μm, and a preferred thickness is 4 μm to 8 μm.

本發明之另一方面係提供一種二次電池電極,二次電池電極包含一電解銅箔,包含一第一表面、和相對第一表面之一第二表面;以及一第一活性材料層,第一活性材料層形成在第一表面上,其中電解銅箔包含具有面向第一表面之一無光澤面和面向第二表面之一光澤面的一銅層、在銅層之無光澤面上的一第一保護層以及在該光澤面上的第二保護層,其中該第一表面和該第二表面各具有4.8 至16.1的一輪廓最大比率(profile maximum ratio,PMR),該輪廓最大比率為一最大高度粗糙度(Rmax )與一算術平均粗糙度(Ra )的一比率(Rmax /Ra );以及該電解銅箔的具有0.49至1.28的一(220)面的一織構係數[TC(220)]、35 kgf/mm2 至58 kgf/mm2 的一降伏強度、以及小於或等於3%的一重量偏差。Another aspect of the present invention is to provide a secondary battery electrode including an electrolytic copper foil including a first surface and a second surface opposite to the first surface; and a first active material layer, the first An active material layer is formed on the first surface, wherein the electrolytic copper foil includes a copper layer having a matte surface facing the first surface and a gloss surface facing the second surface, and a copper layer on the matte surface of the copper layer. The first protective layer and the second protective layer on the glossy surface, wherein the first surface and the second surface each have a profile maximum ratio (PMR) of 4.8 to 16.1, and the maximum profile ratio is one A ratio (R max / R a ) of the maximum height roughness (R max ) to an arithmetic average roughness (R a ); and a texture coefficient of the (220) plane of the electrolytic copper foil having 0.49 to 1.28 [TC (220)], a drop strength of 35 kgf / mm 2 to 58 kgf / mm 2 , and a weight deviation of 3% or less.

該第一表面和該第二表面各具有1.2 μm至3.7 μm的一最大高度粗糙度(Rmax )以及0.15μm 至 0.45 μm的一算術平均粗糙度(Ra )。The first surface and the second surface each have a maximum height roughness (R max ) of 1.2 μm to 3.7 μm and an arithmetic average roughness (R a ) of 0.15 μm to 0.45 μm.

該第一保護層和該第二保護層各可以含鉻(Cr)。The first protective layer and the second protective layer may each contain chromium (Cr).

該電解銅箔具有4μm至30 μm的一厚度,且較佳厚度為4μm至8μm。The electrolytic copper foil has a thickness of 4 μm to 30 μm, and a preferred thickness is 4 μm to 8 μm.

二次電池電極更包含設置在該第二表面上之一第二活性材料層;其中該第一活性材料層和該第二活性材料層各包含至少一活性材料,該至少一活性材料選自如碳、矽、鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵的金屬或包含該金屬之合金、該金屬的氧化物、以及由該金屬和碳的組成物所組成的群組。The secondary battery electrode further includes a second active material layer disposed on the second surface; wherein the first active material layer and the second active material layer each include at least one active material, and the at least one active material is selected from, for example, carbon , Silicon, germanium, tin, lithium, zinc, magnesium, cadmium, cerium, nickel, or iron or a metal containing the metal, an oxide of the metal, and a group consisting of the metal and carbon .

本發明的另外一方面係提供一種二次電池,二次電池包含一陰極、包含二次電池電極的一陽極、一電解質以及一隔離膜,電解質配置成可提供一環境,且鋰離子在該環境中可於陰極和陽極之間移動,隔離膜配置成可使陽極與陰極電性絕緣。Another aspect of the present invention is to provide a secondary battery. The secondary battery includes a cathode, an anode including a secondary battery electrode, an electrolyte, and a separator. The electrolyte is configured to provide an environment, and lithium ions are in the environment. It can be moved between the cathode and the anode, and the separator is configured to electrically insulate the anode from the cathode.

本發明的另一方面係提供一種二次電池的電解銅箔的製造方法,方法包含形成一銅層,以及在銅層上形成一保護層,其中形成該銅層之步驟包含製備一電解液,該電解液包含70g/L至90g/L的銅離子、50g/L至150g/L的硫酸、2mg/ L至20mg/ L的N-烯丙基硫脲(ATU)、以及2mg/ L至20mg/ L的二(3-磺丙基)二硫化物(bis-(3-sulfopropyl) disulfide,SPS);以及透過從一電極板向一旋轉電極鼓(rotating electrode drum)施行具有40A/dm2 至80A/dm2 的密度的一電流來進行電鍍;其中使用粒徑(grit size)為800號至3000號之一拋光刷拋光該旋轉電極鼓的一表面;以及在該電鍍的步驟進行時,該電解液中的銀的濃度維持在小於或等於50 mg/L。Another aspect of the present invention is to provide a method for manufacturing an electrolytic copper foil for a secondary battery. The method includes forming a copper layer and forming a protective layer on the copper layer. The step of forming the copper layer includes preparing an electrolytic solution. The electrolyte contains 70 g / L to 90 g / L of copper ions, 50 g / L to 150 g / L of sulfuric acid, 2 mg / L to 20 mg / L of N-allyl thiourea (ATU), and 2 mg / L to 20 mg / L of bis- (3-sulfopropyl) disulfide (SPS); and the application of 40A / dm 2 to from a electrode plate to a rotating electrode drum A current of 80 A / dm 2 for electroplating; wherein a surface of the rotating electrode drum is polished using a polishing brush having a grit size of 800 to 3000; and when the electroplating step is performed, the The concentration of silver in the electrolyte was maintained at 50 mg / L or less.

製備該電解液的步驟可以包含在600°C至900°C的溫度範圍對一銅線進行熱處理30分鐘至60分鐘;酸洗熱處理過的該銅線;向該硫酸中置入酸洗過的該銅線;以及向置入該銅線的該硫酸中加入ATU和SPS。The step of preparing the electrolytic solution may include heat treating a copper wire at a temperature range of 600 ° C to 900 ° C for 30 minutes to 60 minutes; pickling the heat-treated copper wire; and placing the acid-washed copper wire into the sulfuric acid. The copper wire; and adding ATU and SPS to the sulfuric acid placed in the copper wire.

當電鍍進行時,對該電解液進行一連續過濾(Continuous Filtration);以及當該連續過濾進行時,該電解液的流速為39m3 /hr至46m3 /hr。When deposition was carried out, the electrolytic solution for a continuous filtration (Continuous Filtration); and when the continuous filtration, the flow rate of the electrolyte is 39m 3 / hr to 46m 3 / hr.

當電鍍進行時,流速的變化是等於或小於5%/sec。When plating is performed, the change in flow rate is equal to or less than 5% / sec.

形成該銅層的步驟更包含添加可與銀反應成氯化銀沉澱物的氯離子到該電解液中,以避免該電解液中的銀的濃度超過50 mg/L。The step of forming the copper layer further includes adding chloride ions that can react with silver to form a silver chloride precipitate to the electrolytic solution to prevent the concentration of silver in the electrolytic solution from exceeding 50 mg / L.

形成該保護層的步驟包含將該銅層浸泡在含有0.5g/L至1.5g/L的鉻的一防鏽溶液中。The step of forming the protective layer includes immersing the copper layer in a rust-proof solution containing 0.5 g / L to 1.5 g / L of chromium.

本發明如上所述的一般性描述僅旨在說明或解釋本發明,並不用於限制本發明的範圍。The general description of the invention as described above is only intended to illustrate or explain the invention and is not intended to limit the scope of the invention.

在下文中,將參照圖式詳細描述本發明的實施例。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

對於本發明可以進行各種修改和變更,各種修改和變更對於本領域技術人員是易於思及,且皆不脫離本發明的精神和範圍。因此,本發明包含落入所屬申請專利範圍及其均等物所限定之在本發明範圍內的所有修改和變更。Various modifications and changes can be made to the present invention, and various modifications and changes are easily conceivable by those skilled in the art without departing from the spirit and scope of the present invention. Therefore, the present invention includes all modifications and changes that fall within the scope of the present invention as defined by the scope of the patents to which they belong and their equivalents.

一種鋰離子二次電池,包含一陰極、一陽極、一電解液以及一隔離膜,電解液可提供環境讓鋰離子可於陰極和陽極之間移動,隔離膜可電性絕陰極和陽極,藉以避免二次電池的內部自其中一電極產生移動到另一電極的電子產生不必要的消耗。A lithium ion secondary battery includes a cathode, an anode, an electrolyte, and a separator. The electrolyte provides an environment for lithium ions to move between the cathode and the anode. The separator can electrically isolate the cathode and the anode, thereby Avoid unnecessary consumption of electrons that move from one electrode to another electrode inside the secondary battery.

圖1係根據本發明一實施例之二次電池電極的剖面圖。FIG. 1 is a cross-sectional view of a secondary battery electrode according to an embodiment of the present invention.

如圖1所示,本發明實施例之二次電池電極100包含:一電解銅箔110,電解銅箔110包含一第一表面S1與相對於第一表面S1之一第二表面S2;設置於第一表面S1上之一第一活性材料層120a;以及設置於第二表面S2之一第二活性材料層120b。在圖1之一實施例中,第一活性材料層120a和第二活性材料層120b是分別形成在電解銅箔110的第一表面S1和第二表面S2上,不過本發明不限於此。在部分實施例中,本發明的二次電池電極100可僅包含第一活性材料層120a和第二活性材料層120b的其中一者以作為活性材料層。As shown in FIG. 1, the secondary battery electrode 100 according to the embodiment of the present invention includes: an electrolytic copper foil 110, the electrolytic copper foil 110 includes a first surface S1 and a second surface S2 opposite to the first surface S1; A first active material layer 120a on the first surface S1; and a second active material layer 120b provided on the second surface S2. In one embodiment of FIG. 1, the first active material layer 120 a and the second active material layer 120 b are respectively formed on the first surface S1 and the second surface S2 of the electrolytic copper foil 110, but the present invention is not limited thereto. In some embodiments, the secondary battery electrode 100 of the present invention may include only one of the first active material layer 120a and the second active material layer 120b as the active material layer.

通常,在一個鋰二次電池中,會用鋁箔作為正極集電器,正極集電器連接到正極活性材料,且會將電解銅箔作為負極集電器,負極集電器連接到負極活性材料。Generally, in a lithium secondary battery, aluminum foil is used as a positive current collector, the positive current collector is connected to a positive active material, and electrolytic copper foil is used as a negative current collector, and the negative current collector is connected to the negative active material.

根據本發明的一實施例,二次電池電極100作為鋰二次電池的陽極,其電解銅箔110作為負極集電器來使用,而且第一活性材料層120a和第二活性材料層120b各包含負極活性材料。According to an embodiment of the present invention, the secondary battery electrode 100 is used as an anode of a lithium secondary battery, and its electrolytic copper foil 110 is used as a negative electrode current collector, and the first active material layer 120a and the second active material layer 120b each include a negative electrode. Active material.

如圖1所示,本發明的電解銅箔110包含一銅層111、一第一保護層112a、以及一第二保護層112b。銅層111包含一無光澤面MS和一光澤面SS,第一保護層112a形成在銅層111之無光澤面MS上,第二保護層112b形成在銅層111之光澤面SS上。As shown in FIG. 1, the electrolytic copper foil 110 of the present invention includes a copper layer 111, a first protective layer 112a, and a second protective layer 112b. The copper layer 111 includes a matte surface MS and a glossy surface SS. A first protective layer 112a is formed on the matte surface MS of the copper layer 111, and a second protective layer 112b is formed on the matte surface SS of the copper layer 111.

無光澤面MS為銅層111上朝向電解銅箔110的第一表面S1的表面,而光澤面SS為銅層111上朝向電解銅箔110的第二表面S2的表面。The matte surface MS is the surface of the copper layer 111 that faces the first surface S1 of the electrolytic copper foil 110, and the matte surface SS is the surface of the copper layer 111 that faces the second surface S2 of the electrolytic copper foil 110.

本發明之銅層111可藉由電鍍形成於一旋轉電極鼓(rotating electrode drum)上。光澤面SS指的是在電鍍過程中與旋轉電極鼓接觸的表面,而無光澤面MS是指與光澤面SS相對的表面。The copper layer 111 of the present invention can be formed on a rotating electrode drum by electroplating. The glossy surface SS refers to a surface in contact with the rotating electrode drum during the plating process, and the matte surface MS refers to a surface opposite the glossy surface SS.

通常,光澤面SS比無光澤面MS低十點平均粗糙度(Rz),但是本發明不以此為限,且光澤面SS的十點平均粗糙度(Rz)可大於或等於無光澤面MS的表面粗糙度。Generally, the glossy surface SS has a ten-point average roughness (Rz) lower than the matte surface MS, but the present invention is not limited thereto, and the ten-point average roughness (Rz) of the glossy surface SS may be greater than or equal to the matte surface MS Surface roughness.

第一保護層112a和第二保護層112b可防止銅層111的腐蝕以及可改善銅層111耐熱性,且可含鉻(Cr)。The first protective layer 112a and the second protective layer 112b may prevent corrosion of the copper layer 111 and may improve heat resistance of the copper layer 111, and may contain chromium (Cr).

根據本發明的實施方式,第一表面S1和第二表面S2中鉻(Cr)附著量可以在1 mg/m2 至5 mg/m2According to an embodiment of the present invention, an adhesion amount of chromium (Cr) in the first surface S1 and the second surface S2 may be 1 mg / m 2 to 5 mg / m 2 .

如上所述,具有起皺缺陷的電解銅箔110會導致負極活性材料的不均勻塗覆,且負極活性材料的不均勻塗覆會導致二次電池短路和負極活性材料的分層。因此,製造電解銅箔110應考慮到引起電解銅箔110起皺缺陷的所有因素。As described above, the electrolytic copper foil 110 having a wrinkle defect may cause uneven coating of the negative electrode active material, and uneven coating of the negative electrode active material may cause short circuits in the secondary battery and delamination of the negative electrode active material. Therefore, all factors that cause the wrinkle defect of the electrolytic copper foil 110 should be considered in manufacturing the electrolytic copper foil 110.

根據本發明,發現如電解銅箔110的表面輪廓、表面的晶體結構、降伏強度、重量偏差(weight deviation)等因素會引起電解銅箔110的起皺缺陷。因此,為了使電解銅箔110的起皺缺陷最小化,需要精確地控制這些重要的因素。According to the present invention, it has been found that factors such as the surface contour, the crystal structure of the surface, the yield strength, and the weight deviation of the electrolytic copper foil 110 can cause wrinkle defects in the electrolytic copper foil 110. Therefore, in order to minimize the wrinkle defect of the electrolytic copper foil 110, it is necessary to accurately control these important factors.

與晶粒尺寸密切相關的表面輪廓可以由算術平均粗糙度(Ra )和最大高度粗糙度(Rmax )來表示,而表面的晶體結構可以由(220)面的織構係數[TC(220)]表示。The surface profile closely related to the grain size can be represented by the arithmetic average roughness (R a ) and the maximum height roughness (R max ), and the crystal structure of the surface can be represented by the texture coefficient of the (220) plane [TC (220 )] Said.

根據本發明,為了使電解銅箔110的起皺缺陷最小化,第一表面和第二表面具有4.8 至16.1的輪廓最大比率(profile maximum ratio,PMR)。電解銅箔的(220)面的織構係數[TC(220)]為0.49至1.28,且具有35 kgf/ mm 至58 kgf/ mm 的降伏強度,以及小於或等於3%的重量偏差。According to the present invention, in order to minimize the wrinkle defect of the electrolytic copper foil 110, the first surface and the second surface have a profile maximum ratio (PMR) of 4.8 to 16.1. Texture coefficient of (220) plane of the electrolytic copper foil [the TC (220)] is 0.49 to 1.28, and having 35 kgf / mm 2 to 58 kgf / mm 2 yield strength, and less than or equal to 3% by weight deviation.

PMR是指最大高度粗糙度(Rmax )與算術平均粗糙度(Ra )之比(Rmax /Ra )。在本發明中,算術平均粗糙度(Ra )和最大高度粗糙度(Rmax )是根據日本工業標準(JIS)B 0601-2001標準測量[測量長度:4mm(不包括截斷部分)]。PMR is the ratio of the maximum height roughness (R max ) to the arithmetic mean roughness (R a ) (R max / R a ). In the present invention, the arithmetic average roughness (R a ) and the maximum height roughness (R max ) are measured according to the Japanese Industrial Standard (JIS) B 0601-2001 standard [measurement length: 4 mm (excluding cut-off portions)].

當PMR大於16.1時,空氣會於通過電解電鍍製造的電解銅箔110纏繞在線軸(bobbin)上時被困在電解銅箔110之間,從而導致起皺缺陷。另一方面,當PMR小於4.8時,電解銅箔110會在卷對卷(roll-to-roll,RTR)處理中捲繞在卷上時局部地延伸,從而導致起皺缺陷。When the PMR is greater than 16.1, air is trapped between the electrolytic copper foils 110 when the electrolytic copper foil 110 manufactured by electrolytic plating is wound on a bobbin, thereby causing a wrinkle defect. On the other hand, when the PMR is less than 4.8, the electrolytic copper foil 110 may locally extend when wound on a roll in a roll-to-roll (RTR) process, thereby causing a wrinkle defect.

根據本發明的實施例,第一表面S1和第二表面S2可各具有1.2μm至3.7μm的最大高度粗糙度(Rmax )和0.15μm至0.45μm的算術平均粗糙度(Ra )。According to an embodiment of the present invention, the first surface S1 and the second surface S2 may each have a maximum height roughness (R max ) of 1.2 μm to 3.7 μm and an arithmetic average roughness (R a ) of 0.15 μm to 0.45 μm.

在本發明中,測量和計算電解銅箔110的(220)面的織構係數如下。In the present invention, the texture coefficient of the (220) surface of the electrolytic copper foil 110 is measured and calculated as follows.

首先,通過在30°至95°的繞射角(diffraction angle)( 2θ)內進行X射線繞射(X-ray diffraction,XRD) [標靶:銅 K α1,2θ之間隔:0.01°,和2θ之掃瞄速率:3°/min]獲得具有對應n個晶面的峰的一XRD圖(例如其中存在對應於平面(111)、(200)、(220)和(311)的峰的XRD圖)。並從XRD圖獲得各該晶面(hkl)的XRD繞射強度(diffraction intensity)[I(hkl)]。另外,得到由粉末繞射標準聯合委員會(Joint Committee on Power Diffraction standards,JCPDS)規定的標準銅粉末的n個晶面的XRD繞射強度[I0 (hkl)]。接下來,獲得n個晶面的I(hkl)/I0 (hkl)的算術平均值,然後藉由將(220)面之I(220)/I0 (220)除以算術平均值來計算(220)面的織構係數(texture coefficient)[TC(220)]。也就是說,將基於以下的方程式1來計算(220)面的織構係數[TC(220)]。First, by performing X-ray diffraction (XRD) within a diffraction angle (2θ) of 30 ° to 95 ° [target: copper K α1, interval between 2θ: 0.01 °, and Scanning rate of 2θ: 3 ° / min] to obtain an XRD pattern of peaks corresponding to n crystal planes (for example, XRDs of peaks corresponding to planes (111), (200), (220), and (311) exist Figure). The XRD diffraction intensity [I (hkl)] of each crystal plane (hkl) is obtained from the XRD diagram. In addition, the XRD diffraction intensity [I 0 (hkl)] of n crystal planes of a standard copper powder specified by the Joint Committee on Power Diffraction standards (JCPDS) was obtained. Next, get the arithmetic mean of I (hkl) / I 0 (hkl) for n crystal planes, and then calculate by dividing the I (220) / I 0 (220) of the (220) plane by the arithmetic mean Texture coefficient of the (220) plane [TC (220)]. That is, the texture coefficient [TC (220)] of the (220) plane will be calculated based on the following Equation 1.

[方程式1] [Equation 1]

當(220)面的織構係數[TC(220)]小於0.49時,電解銅箔110的晶體結構不夠密集,且電解銅箔110容易在纏繞於線軸上時變形而導致起皺缺陷。另一方面,當(220)面的織構係數[TC(220)]大於1.28時,電解銅箔110的晶體結構變得過密且具有高脆性,結果,使得電解銅箔110在製造過程中被撕裂(torn)。When the texture coefficient [TC (220)] of the (220) plane is less than 0.49, the crystal structure of the electrolytic copper foil 110 is not dense enough, and the electrolytic copper foil 110 is easily deformed when wound on a bobbin, causing wrinkle defects. On the other hand, when the texture coefficient [TC (220)] of the (220) plane is greater than 1.28, the crystal structure of the electrolytic copper foil 110 becomes too dense and has high brittleness. As a result, the electrolytic copper foil 110 is damaged during the manufacturing process. Torn.

在本發明中,降伏強度是在室溫25℃下並使用萬能試驗機(Universal testing machine,UTM)測得[樣品寬度:12.7mm,夾具之間的距離:50mm,測量速度:50mm/min)。In the present invention, the drop-down strength is measured at a room temperature of 25 ° C using a universal testing machine (UTM) [sample width: 12.7mm, distance between clamps: 50mm, measurement speed: 50mm / min) .

當電解銅箔110的降伏強度小於35kgf/ mm 時,電解銅箔110會於纏繞在線軸上時引起塑性變形,從而導致起皺缺陷的加速。另一方面,當電解銅箔110的降伏強度大於58kgf/ mm 時,電解銅箔110的脆性變高而讓相容性降低,並增加在製造過程中撕裂電解銅箔110的風險。When the drop strength of the electrolytic copper foil 110 is less than 35 kgf / mm 2 , the electrolytic copper foil 110 may cause plastic deformation when it is wound on a bobbin, thereby causing acceleration of wrinkle defects. On the other hand, when the yield strength electrodeposited copper foil 110 is greater than 58kgf / mm 2, the electrodeposited copper foil becomes brittle and 110 allow high compatibility decrease, and increase the risk of tearing of the electrolytic copper foil 110 in the manufacturing process.

在本發明中,重量偏差是指寬度方向重量偏差,並如下所測量和計算。In the present invention, the weight deviation means a weight deviation in the width direction, and is measured and calculated as follows.

從電解銅箔110的寬度方向上的左、中、右的點取5cm×5cm的樣品後,測量三個樣品的重量。使用所測量的值來計算算術平均重量和標準偏差,然後計算重量標準偏差和平均重量的比率(%),即[(重量標準偏差/平均重量)×100]。After taking 5 cm × 5 cm samples from the left, middle, and right points in the width direction of the electrolytic copper foil 110, the weights of the three samples were measured. Use the measured values to calculate the arithmetic average weight and standard deviation, and then calculate the ratio (%) of the weight standard deviation to the average weight, which is [(weight standard deviation / average weight) × 100].

當電解銅箔110的重量偏差大於3%時,電解銅箔110會在捲繞於線軸上時局部地延伸,從而導致起皺。When the weight deviation of the electrolytic copper foil 110 is greater than 3%, the electrolytic copper foil 110 may partially extend when wound on a spool, thereby causing wrinkling.

本發明之蓄電池的電解銅箔110在室溫(25 °C)下具有大於或等於3%的伸長率(Elongation)。當電解銅箔110的伸長率小於3%時,電解銅箔110不會因製造電解銅箔110的過程中或在製造二次電池電極100的過程中所施加的力而拉伸,從而增加了電解銅箔110撕裂的風險。The electrolytic copper foil 110 of the battery of the present invention has an elongation of 3% or more at room temperature (25 ° C). When the elongation of the electrolytic copper foil 110 is less than 3%, the electrolytic copper foil 110 will not be stretched by the force applied during the manufacturing of the electrolytic copper foil 110 or during the manufacturing of the secondary battery electrode 100, thereby increasing Risk of tearing of the electrolytic copper foil 110.

本發明之電解銅箔110可具有4μm至30μm的厚度,且較佳地具有4μm至8μm的厚度。當電解銅箔110的厚度小於4μm時,製造二次電池過程的加工性(workability)會降低。另一方面,當電解銅箔110的厚度大於30μm時,則難以保證鋰電池的足夠電容量。The electrolytic copper foil 110 of the present invention may have a thickness of 4 μm to 30 μm, and preferably a thickness of 4 μm to 8 μm. When the thickness of the electrolytic copper foil 110 is less than 4 μm, workability in the process of manufacturing a secondary battery may decrease. On the other hand, when the thickness of the electrolytic copper foil 110 is more than 30 μm, it is difficult to ensure a sufficient capacity of the lithium battery.

具體而言,由於具有8μm或更小的厚度的電解銅箔110(製造高容量二次電池的需求正在增加)難以僅通過降低其重量偏差來防止其皺摺缺陷,因此需要進一步應用本發明的技術特徵。Specifically, since the electrolytic copper foil 110 having a thickness of 8 μm or less (the demand for manufacturing a high-capacity secondary battery is increasing) is difficult to prevent wrinkle defects only by reducing its weight deviation, it is necessary to further apply the present invention Technical characteristics.

第一活性材料層120a和第二活性材料層120b可各包含作為負極活性材料的至少一活性材料,活性材料選自如碳、矽、鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵之金屬、該金屬之合金、該金屬的氧化物、該金屬和碳的組成物所組成的群組。The first active material layer 120a and the second active material layer 120b may each include at least one active material as a negative electrode active material, and the active material is selected from, for example, carbon, silicon, germanium, tin, lithium, zinc, magnesium, cadmium, cerium, nickel, Or a group consisting of a metal of iron, an alloy of the metal, an oxide of the metal, a composition of the metal and carbon.

為了增加蓄電池的充放電容量,第一活性材料層120a和第二活性材料層120b可由定量之矽的混合物所構成。In order to increase the charge and discharge capacity of the battery, the first active material layer 120a and the second active material layer 120b may be composed of a mixture of a predetermined amount of silicon.

以下,將詳細描述根據本發明的實施例的電解銅箔110的製造方法。Hereinafter, a method of manufacturing the electrolytic copper foil 110 according to an embodiment of the present invention will be described in detail.

本發明的方法包括形成銅層111,以及在銅層111上形成第一保護層112a和第二保護層112b。The method of the present invention includes forming a copper layer 111, and forming a first protective layer 112a and a second protective layer 112b on the copper layer 111.

首先,製備含有70g/L至90g/L的銅離子、50g/L至150g/L的硫酸、2mg/ L至20mg/ L的N-烯丙基硫脲(ATU)以及2mg/ L至20mg/ L的二(3-磺丙基)二硫化物(bis-(3-sulfopropyl) disulfide,SPS)的電解液。First, a preparation containing 70 g / L to 90 g / L of copper ions, 50 g / L to 150 g / L of sulfuric acid, 2 mg / L to 20 mg / L of N-allyl thiourea (ATU), and 2 mg / L to 20 mg / L An electrolyte of L's bis- (3-sulfopropyl) disulfide (SPS).

電解銅箔110的降伏強度可以通過調整ATU的濃度來控制。隨著ATU濃度的增加,電解銅箔110的降伏強度也大幅增加。The drop strength of the electrolytic copper foil 110 can be controlled by adjusting the concentration of the ATU. As the ATU concentration increases, the drop strength of the electrolytic copper foil 110 also increases significantly.

電解銅箔110的第一表面S1和第二表面S2的(220)面的織構係數[TC(220)]可以通過調節SPS的濃度來控制。電解銅箔110的(220)面的織構係數[TC(220)]也隨著SPS濃度的增加而顯著地增加。The texture coefficient [TC (220)] of the (220) plane of the first surface S1 and the second surface S2 of the electrolytic copper foil 110 can be controlled by adjusting the concentration of SPS. The texture coefficient [TC (220)] of the (220) surface of the electrolytic copper foil 110 also increases significantly as the SPS concentration increases.

對高純度銅線進行溫度範圍為600°C至900°C之熱處理30分鐘至60分鐘以燒結有機物質,酸洗進行過熱處理之銅線,並藉由將酸洗過之銅線置入硫酸中以製備少量或不含雜質的電解液。然後,將ATU和SPS加入到電解液中。The high-purity copper wire is heat-treated at a temperature range of 600 ° C to 900 ° C for 30 minutes to 60 minutes to sinter organic substances, pickle the heat-treated copper wire, and place the acid-washed copper wire in sulfuric acid. In order to prepare an electrolyte with little or no impurities. Then, ATU and SPS were added to the electrolyte.

隨後,藉由在50℃至60℃的電解液中彼此間隔開的電極板和旋轉電極鼓之間產生40 A/dm2 至80 A/dm2 的電流密度的電流進行電鍍以在旋轉電極鼓上形成銅層111。Subsequently, in the electrolyte between the electrode plates by 50 deg.] C to 60 deg.] C of each other and spaced apart from the rotating drum electrode generating a current 40 A / dm 2 to 80 A / dm 2 of current density in electroplating to the rotating electrode drum A copper layer 111 is formed thereon.

電流密度影響電解銅箔110的算術平均粗糙度(Ra )。算術平均粗糙度(Ra )隨著電流密度的增加而顯著地降低。換句話說,隨著電流密度的降低,算術平均粗糙度(Ra )顯著地增加。Effect of current density arithmetic mean roughness electrolytic copper foil 110 (R a). The arithmetic mean roughness (R a ) decreases significantly as the current density increases. In other words, as the current density decreases, the arithmetic mean roughness (R a ) increases significantly.

使用粒徑(grit size)為800號至3000號之拋光刷拋光該旋轉電極鼓的表面(例如,通過執行電鍍沉澱銅的表面)。優選地,水在寬度方向上擴散的同時,通過對旋轉電極鼓的表面進行表面拋光,旋轉電極鼓的表面在寬度方向上均勻拋光。A polishing brush having a grit size of 800 to 3000 is used to polish the surface of the rotary electrode drum (for example, the surface on which copper is deposited by performing electroplating). Preferably, while the water is spreading in the width direction, the surface of the rotating electrode drum is polished uniformly in the width direction by surface polishing the surface of the rotating electrode drum.

旋轉電極鼓的表面(例如,通過執行電鍍沉澱銅的表面)的拋光程度會影響電解銅箔110的第二表面S2的算術平均粗糙度(Ra )、最大高度粗糙度(Rmax )等。The degree of polishing of the surface of the rotating electrode drum (for example, a surface where copper is deposited by performing electroplating) affects the arithmetic average roughness (R a ), the maximum height roughness (R max ), and the like of the second surface S2 of the electrolytic copper foil 110.

根據本發明,在進行電鍍時,電解液中的銀(Ag)的濃度保持在50mg/ L或以下。銀(Ag)的濃度會影響電解銅箔110的最大高度粗糙度(Rmax )。電解銅箔110的最大高度粗糙度(Rmax )隨著銀(Ag)的濃度降低而顯著地增加。According to the present invention, the concentration of silver (Ag) in the electrolytic solution is maintained at 50 mg / L or less when the plating is performed. The concentration of silver (Ag) affects the maximum height roughness (R max ) of the electrolytic copper foil 110. The maximum height roughness (R max ) of the electrolytic copper foil 110 significantly increases as the concentration of silver (Ag) decreases.

為了防止在電鍍期間銀流入電解液中使電解液中銀(Ag)的濃度超過50 mg/L,可與銀(Ag)反應成氯化銀(AgCl)的少量氯離子(例如15至25ppm)可以加到電解液中。結果,電解液中銀(Ag)可具有例如為1 mg/L至50mg/ L的濃度。In order to prevent silver from flowing into the electrolyte during electroplating so that the concentration of silver (Ag) in the electrolyte exceeds 50 mg / L, a small amount of chloride ions (for example, 15 to 25 ppm) that can react with silver (Ag) to silver chloride (AgCl) may Add to electrolyte. As a result, silver (Ag) in the electrolytic solution may have a concentration of, for example, 1 mg / L to 50 mg / L.

連續(或循環)過濾可以在39 m3 /hr至46 m3 /hr的流速下進行,以在進行電鍍的同時從電解液中除去固體雜質。當流量小於39 m3 /hr時,流速降低,過電壓升高,且銅層111不均勻地形成。另一方面,當流量超過46m3 /hr時,過濾器受損,且異物進入電解液。電解液的流量也會影響電解銅箔110的降伏強度。Continuous (or cyclic) filtration can be performed at a flow rate of 39 m 3 / hr to 46 m 3 / hr to remove solid impurities from the electrolyte while performing electroplating. When the flow rate is less than 39 m 3 / hr, the flow velocity decreases, the overvoltage increases, and the copper layer 111 is unevenly formed. On the other hand, when the flow rate exceeds 46 m 3 / hr, the filter is damaged and foreign matter enters the electrolytic solution. The flow rate of the electrolyte also affects the drop strength of the electrolytic copper foil 110.

為了製造具有重量偏差為3%以下的電解銅箔110,優選地將電鍍時的流速變化保持在5%/sec以下。當電解液的流速變化大於5%/sec時,銅層111的寬度方向的鍍銅效率的變化增大,且電解銅箔110的重量偏差超過3%。In order to manufacture the electrolytic copper foil 110 having a weight deviation of 3% or less, it is preferable to keep the variation in the flow rate during plating at 5% / sec or less. When the change in the flow rate of the electrolytic solution is greater than 5% / sec, the change in the copper plating efficiency in the width direction of the copper layer 111 increases, and the weight deviation of the electrolytic copper foil 110 exceeds 3%.

然後,藉由在一防鏽溶液中浸泡如上所述所製造的銅層111(例如在室溫浸泡2秒至20秒),而形成位於銅層111上之第一保護層112a和第二保護層112b。防鏽溶液含有0.5g/L至1.5g/L的鉻。浸泡完後,乾燥銅層111。Then, the first protective layer 112a and the second protective layer on the copper layer 111 are formed by soaking the copper layer 111 manufactured as described above in a rust-proof solution (for example, soaking at room temperature for 2 seconds to 20 seconds). Layer 112b. The rust preventive solution contains 0.5 to 1.5 g / L of chromium. After soaking, the copper layer 111 is dried.

防鏽溶液還可以更包括矽烷化合物和氮化合物中的至少其中一者。例如防鏽溶液可以含有0.5g/ L至1.5g/ L的Cr和0.5g/ L至1.5g/ L的矽烷化合物。The antirust solution may further include at least one of a silane compound and a nitrogen compound. For example, the rust preventive solution may contain 0.5 g / L to 1.5 g / L of Cr and 0.5 g / L to 1.5 g / L of a silane compound.

本發明的二次電池電極 (即,陽極)可以通過在本發明的所得電解銅箔110上塗覆負極活性材料來製造。The secondary battery electrode (that is, the anode) of the present invention can be manufactured by coating a negative electrode active material on the obtained electrolytic copper foil 110 of the present invention.

負極活性材料選自如碳、矽、鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵的金屬、該金屬之合金、該金屬之氧化物、以及該金屬和碳的組成物所組成的群組。The negative electrode active material is selected from metals such as carbon, silicon, germanium, tin, lithium, zinc, magnesium, cadmium, cerium, nickel, or iron, alloys of the metal, oxides of the metal, and combinations of the metal and carbon. Group of people.

例如,藉由混合1至3重量比的苯乙烯-丁二烯橡膠(SBR.styrene butadiene rubber)和1至3重量比的羧甲基纖維素(CMC.carboxymethyl cellulose)以及100重量比的作為負極活性材料的碳,然後使用蒸餾水作為溶劑,以製備漿料(slurry)。隨後,藉由刮刀在電解銅箔110上塗佈厚度為20μm至100μm的漿料,並在100℃至130℃的溫度下以0.5 ton/cm2 至1.5 ton/cm2 的壓力加壓。For example, by mixing 1 to 3 weight ratio of styrene-butadiene rubber (SBR. Styrene butadiene rubber) and 1 to 3 weight ratio of carboxymethyl cellulose (CMC. Carboxymethyl cellulose) and 100 weight ratio as the negative electrode Carbon of the active material, and then distilled water was used as a solvent to prepare a slurry. Subsequently, the electrolytic copper foil 110 is coated with a slurry having a thickness of 20 μm to 100 μm by a doctor blade, and pressurized at a temperature of 100 ° C. to 130 ° C. under a pressure of 0.5 ton / cm 2 to 1.5 ton / cm 2 .

鋰二次電池可以使用傳統的陰極、一電解液和一隔膜以及如上所述所製造的二次電池電極(或陽極)來製造。The lithium secondary battery can be manufactured using a conventional cathode, an electrolyte and a separator, and a secondary battery electrode (or anode) manufactured as described above.

以下,參照實施例和比較例詳細說明本發明之內容。然而,以下實施例僅作為幫助了解本發明的實施例,本發明的範圍不限於這些實施例。Hereinafter, the contents of the present invention will be described in detail with reference to examples and comparative examples. However, the following examples are merely examples to help understand the present invention, and the scope of the present invention is not limited to these examples.

實施例1至6和比較例1至7Examples 1 to 6 and Comparative Examples 1 to 7

在電解液中被彼此間隔的電極板和旋轉電極鼓之間產生電流密度為60A/dm2 的電流以在旋轉電極鼓上形成銅層。電解液包含75g/L的銅離子、100g/L的硫酸、100g/L的ATU、和100g/L的SPS,並維持在55°C的溫度下。電解液的流速為42m3 /hr。用於電鍍的ATU濃度、SPS濃度、銀(Ag)濃度、電解液的流速的變化,以及用於研磨旋轉電極鼓的表面的拋光刷的粒徑如下表1所示。通過浸泡通過電鍍形成的銅層,然後乾燥銅層來製備電解銅箔。A current having a current density of 60 A / dm 2 was generated between the electrode plate and the rotating electrode drum spaced apart from each other in the electrolytic solution to form a copper layer on the rotating electrode drum. The electrolyte contains 75 g / L of copper ions, 100 g / L of sulfuric acid, 100 g / L of ATU, and 100 g / L of SPS, and is maintained at a temperature of 55 ° C. The flow rate of the electrolytic solution was 42 m 3 / hr. The changes in the ATU concentration, SPS concentration, silver (Ag) concentration, and electrolyte flow rate used for electroplating, and the particle size of the polishing brush used to polish the surface of the rotating electrode drum are shown in Table 1 below. An electrolytic copper foil is prepared by soaking a copper layer formed by electroplating, and then drying the copper layer.

[表1] [Table 1]

得到如上所述的實施例和比較例的電解銅箔的PMRs、(220)面的織構係數[TC(220)]、降伏強度、以及重量偏差,其結果示於表2。另外,表2所示實施例和比較例中電解銅箔製造過程中是否出現起皺和撕裂。The electrolytic copper foils of the examples and comparative examples described above were obtained with PMRs, a texture coefficient (TC (220)) of the (220) plane, a drop strength, and a weight deviation. The results are shown in Table 2. In addition, in the examples and comparative examples shown in Table 2, whether wrinkles and tears occurred during the manufacturing process of the electrolytic copper foil.

*輪廓最大比率 (PMR)* Maximum profile ratio (PMR)

根據JIS B 0601-2001標準,使用由Mitutoyo Co.製造的SJ-310照度計,測量電解銅箔的第一表面(銅層上與無光澤面相鄰的表面)和第二表面(銅層上與光澤面相鄰的表面)的算術平均粗糙度(Ra )和最大高度粗糙度(Rmax )[測量長度:4mm(不包括截斷部分)]。接下來,通過計算最大高度粗糙度(Rmax )與算術平均粗糙度(Ra )之比(Rmax /Ra )來獲得該第一表面和該第二表面的PMR。According to the JIS B 0601-2001 standard, using a SJ-310 light meter manufactured by Mitutoyo Co., the first surface (the surface on the copper layer adjacent to the matte surface) and the second surface (on the copper layer) were measured the surface adjacent to the shiny surface) of the arithmetic mean roughness (R a) and a maximum height roughness (R max) [measuring length: 4mm (not including the truncated portion)]. Next, the PMR of the first surface and the second surface is obtained by calculating the ratio (R max / R a ) of the maximum height roughness (R max ) to the arithmetic mean roughness (R a ).

*(220)面的織構係數[TC(220)]* Texture coefficient of (220) plane [TC (220)]

通過在30°至95°的繞射角(2θ)內進行X射線繞射(X-ray diffraction) [(i)標靶:銅 K α1,(ii)2θ之間隔:0.01°,(iii) 2θ之掃瞄速率:3degree/min]獲得具有對應n個晶面的峰的一XRD圖,並從XRD圖獲得各該晶面(hkl)的XRD繞射(光)強度[I(hkl)]。另外,得到由JCPDS規定的標準銅粉的n個晶面的繞射(光)強度[I0 (hkl)]。接下來,獲得n個晶面的I(hkl)/I0 (hkl)的算術平均值,然後藉由將(220)面之I(220)/I0 (220)除以算術平均值,來計算電解銅箔110之(220)面的織構係數(texture coefficient) [TC(220)]。也就是說,將基於以下的方程式1來計算(220)面的織構係數[TC(220)]。By performing X-ray diffraction within a diffraction angle (2θ) of 30 ° to 95 ° [(i) target: copper K α1, (ii) interval between 2θ: 0.01 °, (iii) Scanning rate of 2θ: 3degree / min] An XRD pattern with peaks corresponding to n crystal planes is obtained, and the XRD diffraction (light) intensity of each crystal plane (hkl) is obtained from the XRD graph [I (hkl)] . In addition, the diffraction (light) intensity [I 0 (hkl)] of the n crystal planes of the standard copper powder specified by JCPDS was obtained. Next, get the arithmetic mean of I (hkl) / I 0 (hkl) for n crystal planes, and then divide the I (220) / I 0 (220) of (220) plane by the arithmetic mean to Calculate the texture coefficient [TC (220)] of the (220) surface of the electrolytic copper foil 110. That is, the texture coefficient [TC (220)] of the (220) plane will be calculated based on Equation 1 below.

[方程式1] [Equation 1]

降伏強度 (kgf/ mm )Falling strength (kgf / mm 2 )

在25℃的室溫下使用UTM測量電解銅箔的降伏強度。樣品的寬度為12.7mm,夾具之間的距離為50mm,測量速度為50mm/min。The drop strength of the electrolytic copper foil was measured using UTM at a room temperature of 25 ° C. The width of the sample is 12.7mm, the distance between the clamps is 50mm, and the measurement speed is 50mm / min.

*重量偏差(%)* Weight deviation (%)

從電解銅箔沿寬度方向在左、中、右的點取5cm×5cm的樣品後,測量三個樣品的重量。使用測量值計算算術平均重量和標準偏差,然後計算重量標準偏差和平均重量的比率(%),[即,(重量標準偏差/平均重量)×100]。A 5 cm × 5 cm sample was taken from left, middle, and right points of the electrolytic copper foil in the width direction, and the weights of the three samples were measured. Calculate the arithmetic average weight and standard deviation using the measured values, and then calculate the ratio (%) of the weight standard deviation and the average weight, [ie, (weight standard deviation / average weight) × 100].

[表 2] [Table 2]

參考上表2,在電解銅箔包含PMR小於4.8的表面的情況下(在比較例1中);在電解銅箔包含PMR大於16.1的表面的情況下(在比較例2中);在電解銅箔包含(220)面的織構係數[TC(220)]小於0.49的表面的情況下(在比較例6中);在電解銅箔的表面包含降伏強度小於35 kgf/ mm 的情況下(在比較例3中),並且在電解銅箔包含重量偏差大於3%的表面的情況下(在比較例5中),在電解銅箔的製造過程中出現起皺。圖3是比較例1的發生起皺缺陷的電解銅箔的照片。Referring to Table 2 above, in the case where the electrolytic copper foil contains a surface with a PMR less than 4.8 (in Comparative Example 1); in the case where the electrolytic copper foil contains a surface with a PMR greater than 16.1 (in Comparative Example 2); When the foil contains a surface with a texture coefficient [TC (220)] of less than 0.49 (in Comparative Example 6); when the surface of the electrolytic copper foil contains a drop strength of less than 35 kgf / mm 2 ( In Comparative Example 3), and in the case where the electrolytic copper foil contains a surface having a weight deviation of more than 3% (in Comparative Example 5), wrinkles occur during the manufacturing process of the electrolytic copper foil. FIG. 3 is a photograph of an electrolytic copper foil having a wrinkle defect in Comparative Example 1. FIG.

此外,在電解銅箔包含降伏強度大於58 kgf/ mm 的表面的情況下(在比較例4中),發生了電解銅箔的撕裂。圖4是比較例4的製造過程中電解銅箔撕裂的照片。In addition, when the electrolytic copper foil includes a surface having a drop strength of more than 58 kgf / mm 2 (in Comparative Example 4), tearing of the electrolytic copper foil occurs. FIG. 4 is a photograph of an electrolytic copper foil tearing during the manufacturing process of Comparative Example 4. FIG.

具體而言,在電解銅箔包含(220)面的織構係數[TC(220)]大於1.28的表面的情況下(在比較例7中),發生起皺和撕裂。Specifically, when the electrolytic copper foil includes a surface having a texture coefficient [TC (220)] of (220) plane greater than 1.28 (in Comparative Example 7), wrinkling and tearing occur.

根據本發明,可以製造實質上沒有起皺缺陷的電解銅箔,結果,該電解銅箔可於製造二次電池的負極時均勻地塗覆負極活性材料。因此,根據本發明,可以防止由於負極活性材料的不均勻塗覆導致的二次電池的短路和負極活性材料的分層。結果,根據本發明,可以提高二次電池的壽命和容量保持率。According to the present invention, an electrolytic copper foil having substantially no wrinkle defects can be manufactured. As a result, the electrolytic copper foil can be uniformly coated with a negative electrode active material when manufacturing a negative electrode of a secondary battery. Therefore, according to the present invention, it is possible to prevent a short circuit of the secondary battery and delamination of the negative electrode active material due to uneven coating of the negative electrode active material. As a result, according to the present invention, it is possible to improve the life and capacity retention rate of the secondary battery.

100‧‧‧電極100‧‧‧ electrode

110‧‧‧電解銅箔110‧‧‧electrolytic copper foil

111‧‧‧銅層111‧‧‧ Copper

112a‧‧‧第一保護層112a‧‧‧First protective layer

112b‧‧‧第二保護層112b‧‧‧Second protective layer

120a‧‧‧第一活性材料層120a‧‧‧first active material layer

120b‧‧‧第二活性材料層120b‧‧‧Second active material layer

S1‧‧‧第一表面S1‧‧‧First surface

S2‧‧‧第二表面S2‧‧‧Second surface

MS‧‧‧無光澤面MS‧‧‧ Matte surface

SS‧‧‧光澤面SS‧‧‧Glossy

圖1係根據本發明一實施例之二次電池電極的剖面圖。 圖2是電解銅箔的X射線繞射(XRD)圖。 圖3是比較例1發生起皺缺陷的電解銅箔的照片。 圖4是比較例4在其製造過程中電解銅箔撕裂的照片。FIG. 1 is a cross-sectional view of a secondary battery electrode according to an embodiment of the present invention. FIG. 2 is an X-ray diffraction (XRD) diagram of an electrolytic copper foil. FIG. 3 is a photograph of an electrolytic copper foil having a wrinkle defect in Comparative Example 1. FIG. FIG. 4 is a photograph of tearing of electrolytic copper foil in the manufacturing process of Comparative Example 4. FIG.

Claims (16)

一種電解銅箔,包含一第一表面和相對於該第一表面之一第二表面,該電解銅箔包含: 一銅層,包含面向該第一表面之一無光澤面和面向該第二表面之一光澤面; 一第一保護層,在該無光澤面上;以及 一第二保護層,在該光澤面上; 其中該第一表面和該第二表面各具有4.8 至16.1的一輪廓最大比率(profile maximum ratio,PMR),其中該輪廓最大比率為一最大高度粗糙度(Rmax )與一算術平均粗糙度(Ra )的一比率(Rmax /Ra );以及 該電解銅箔的(220)面的織構係數[TC(220)]的範圍為0.49至1.28,降伏強度的範圍為35 kgf/mm2 至58 kgf/mm2 ,以及重量偏差的範圍為等於小於3%。An electrolytic copper foil includes a first surface and a second surface opposite to the first surface. The electrolytic copper foil includes: a copper layer including a matte surface facing the first surface and facing the second surface A glossy surface; a first protective layer on the matte surface; and a second protective layer on the glossy surface; wherein the first surface and the second surface each have a maximum profile of 4.8 to 16.1 ratio (profile maximum ratio, PMR), wherein the maximum profile height ratio is a maximum roughness (R max) with an arithmetic mean roughness (R a) of a ratio (R max / R a); and the electrodeposited copper foil The texture coefficient [TC (220)] of the (220) plane ranges from 0.49 to 1.28, the drop strength ranges from 35 kgf / mm 2 to 58 kgf / mm 2 , and the weight deviation ranges from less than 3%. 如請求項1之電解銅箔,其中該第一表面和該第二表面各具有1.2 μm至3.7 μm 的一最大高度粗糙度(Rmax )以及0.15 μm至 0.45 μm的一算術平均粗糙度(Ra )。The electrolytic copper foil of claim 1, wherein the first surface and the second surface each have a maximum height roughness (R max ) of 1.2 μm to 3.7 μm and an arithmetic average roughness (R of 0.15 μm to 0.45 μm) a ). 如請求項1之電解銅箔,其中該第一保護層和該第二保護層各含鉻(Cr)。The electrolytic copper foil of claim 1, wherein the first protective layer and the second protective layer each contain chromium (Cr). 如請求項1之電解銅箔,其中該電解銅箔具有4μm至30 μm的一厚度。The electrolytic copper foil of claim 1, wherein the electrolytic copper foil has a thickness of 4 μm to 30 μm. 一種二次電池電極,包含: 一電解銅箔,包含一第一表面和相對該第一表面之一第二表面;以及 一第一活性材料層,形成在該第一表面上; 其中該電解銅箔包含: 一銅層,包含面向該第一表面之一無光澤面和面向該第二表面之一光澤面; 一第一保護層,在該無光澤面上;以及 一第二保護層,在該光澤面上; 其中該第一表面和該第二表面各具有4.8 至16.1的一輪廓最大比率(profile maximum ratio,PMR),該輪廓最大比率為一最大高度粗糙度(Rmax )與一算術平均粗糙度(Ra )的一比率(Rmax /Ra );以及 該電解銅箔的具有0.49至1.28的一(220)面的一織構係數[TC(220)]、35 kgf/mm2 至58 kgf/mm2 的一降伏強度、以及小於等於3%的一重量偏差。A secondary battery electrode includes: an electrolytic copper foil including a first surface and a second surface opposite to the first surface; and a first active material layer formed on the first surface; wherein the electrolytic copper The foil includes: a copper layer including a matte surface facing the first surface and a glossy surface facing the second surface; a first protective layer on the matte surface; and a second protective layer on the The glossy surface; wherein the first surface and the second surface each have a profile maximum ratio (PMR) of 4.8 to 16.1, the maximum profile ratio is a maximum height roughness (R max ) and an arithmetic the average roughness (R a) of a ratio (R max / R a); and a texture coefficient of 0.49 to 1.28 with a (220) surface of the electrodeposited copper foil [TC (220)], 35 kgf / mm A drop strength of 2 to 58 kgf / mm 2 and a weight deviation of 3% or less. 如請求項5之二次電池電極,其中該第一表面和該第二表面各具有1.2 μm至3.7 μm的一最大高度粗糙度(Rmax ) 以及0.15μm 至 0.45 μm的一算術平均粗糙度(Ra )。The secondary battery electrode of claim 5, wherein the first surface and the second surface each have a maximum height roughness (R max ) of 1.2 μm to 3.7 μm and an arithmetic average roughness (0.15 μm to 0.45 μm) ( R a ). 如請求項5之二次電池電極,其中該第一保護層和該第二保護層各含鉻(Cr)。The secondary battery electrode of claim 5, wherein the first protective layer and the second protective layer each contain chromium (Cr). 如請求項5之二次電池電極,其中該電解銅箔具有4μm至30 μm的一厚度。The secondary battery electrode of claim 5, wherein the electrolytic copper foil has a thickness of 4 μm to 30 μm. 如請求項5之二次電池電極,更包含設置在該第二表面上之一第二活性材料層; 其中該第一活性材料層和該第二活性材料層各包含至少一活性材料,該至少一活性材料選自如碳、矽、鍺、錫、鋰、鋅、鎂、鎘、鈰、鎳、或鐵的金屬或包含該金屬之合金、該金屬的氧化物、以及由該金屬和碳的組成物所組成的群組。The secondary battery electrode of claim 5, further comprising a second active material layer disposed on the second surface; wherein the first active material layer and the second active material layer each include at least one active material, and the at least one An active material is selected from a metal such as carbon, silicon, germanium, tin, lithium, zinc, magnesium, cadmium, cerium, nickel, or iron, or an alloy containing the metal, an oxide of the metal, and a composition consisting of the metal and carbon A group of things. 一種二次電池,包含: 一陰極; 一陽極,包含如請求項5至9中任一項所述的該二次電池電極; 一電解液,用以提供讓鋰離子可在該陰極和該陽極之間移動的一環境;以及 一隔離膜,用以電性絕緣該陰極和該陽極。A secondary battery comprising: a cathode; an anode including the secondary battery electrode according to any one of claims 5 to 9; an electrolyte for providing lithium ions to the cathode and the anode An environment moving between; and an isolation film for electrically insulating the cathode and the anode. 一種電解銅箔的製造方法,該方法包含: 形成一銅層;以及 形成一保護層於該銅層上; 其中形成該銅層之步驟包含: 製備一電解液,該電解液包含70g/L至90g/L的銅離子、50g/L至150g/L的硫酸、2至20mg/L的N-烯丙基硫脲(ATU)以及2mg/ L至20mg/L的二(3-磺丙基)二硫化物(bis-(3-sulfopropyl) disulfide,SPS);以及 透過從一電極板向一旋轉電極鼓(rotating electrode drum)施行具有40A/dm2 至80A/dm2 的密度的一電流來進行電鍍; 其中使用粒徑(grit size)為800號至3000號之一拋光刷拋光該旋轉電極鼓的一表面;以及 在該電鍍的步驟進行時,該電解液中的銀的濃度維持在小於或等於50 mg/L。A method for manufacturing an electrolytic copper foil, the method includes: forming a copper layer; and forming a protective layer on the copper layer; wherein the step of forming the copper layer includes: preparing an electrolytic solution, the electrolytic solution contains 70 g / L to 90 g / L copper ion, 50 g / L to 150 g / L sulfuric acid, 2 to 20 mg / L N-allyl thiourea (ATU), and 2 mg / L to 20 mg / L bis (3-sulfopropyl) Disulfide (bis- (3-sulfopropyl) disulfide (SPS)); and by applying a current having a density of 40 A / dm 2 to 80 A / dm 2 from an electrode plate to a rotating electrode drum Electroplating; wherein a surface of the rotary electrode drum is polished using a polishing brush having a grit size of 800 to 3000; and when the electroplating step is performed, the concentration of silver in the electrolyte is maintained at less than or It is equal to 50 mg / L. 如請求項11之電解銅箔的製造方法,其中製備該電解液的步驟包含: 在600°C至900°C的溫度範圍對一銅線進行熱處理30分鐘至60分鐘; 酸洗熱處理過的該銅線; 將酸洗過的該銅線置入一硫酸中;以及 向置入該銅線的該硫酸中加入ATU和SPS。The method for manufacturing an electrolytic copper foil according to claim 11, wherein the step of preparing the electrolyte comprises: heat treating a copper wire at a temperature ranging from 600 ° C to 900 ° C for 30 minutes to 60 minutes; Copper wire; placing the pickled copper wire into a sulfuric acid; and adding ATU and SPS to the sulfuric acid into the copper wire. 如請求項11之電解銅箔的製造方法,其中: 當電鍍進行時,對該電解液進行一連續過濾(Continuous Filtration);以及 當該連續過濾進行時,該電解液的流速為39m3 /hr至46m3 /hr。The method for manufacturing an electrolytic copper foil according to claim 11, wherein: when electroplating is performed, the electrolytic solution is subjected to continuous filtration (Continuous Filtration); and when the continuous filtration is performed, the flow rate of the electrolytic solution is 39m 3 / hr To 46m 3 / hr. 如請求項13之電解銅箔的製造方法,其中當該電鍍進行時,該流速的變化小於等於5%/sec。The method for manufacturing an electrolytic copper foil according to claim 13, wherein the change in the flow rate is less than or equal to 5% / sec when the electroplating is performed. 如請求項11之電解銅箔的製造方法,其中形成該銅層的步驟更包含添加可與銀反應成氯化銀沉澱物的氯離子到該電解液中,以避免該電解液中的銀的濃度超過50 mg/L。The method of manufacturing an electrolytic copper foil according to claim 11, wherein the step of forming the copper layer further comprises adding chloride ions that can react with silver to form a silver chloride precipitate to the electrolytic solution to avoid the silver in the electrolytic solution. Concentrations exceed 50 mg / L. 如請求項11之電解銅箔的製造方法,其中形成該保護層的步驟包含將該銅層浸泡在含有0.5g/L至1.5g/L的鉻的一防鏽溶液中。The method for manufacturing an electrolytic copper foil as claimed in claim 11, wherein the step of forming the protective layer includes immersing the copper layer in a rust-proof solution containing 0.5 g / L to 1.5 g / L of chromium.
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