TW201814880A - Top emission microLED display and bottom emission microLED display and a method of forming the same - Google Patents

Top emission microLED display and bottom emission microLED display and a method of forming the same Download PDF

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TW201814880A
TW201814880A TW106115327A TW106115327A TW201814880A TW 201814880 A TW201814880 A TW 201814880A TW 106115327 A TW106115327 A TW 106115327A TW 106115327 A TW106115327 A TW 106115327A TW 201814880 A TW201814880 A TW 201814880A
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light
micro
emitting diode
blocking layer
diode display
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吳炳昇
吳昭文
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啟端光電股份有限公司
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Abstract

A microLED display includes a first main substrate, micrLEDs disposed above the first main substrate, a first light blocking layer disposed above the first main substrate to define emission areas, a light guiding layer disposed in the emission areas, and a plurality of connecting structures disposed in the emission areas respectively and electrically connected with the microLEDs.

Description

頂部發光型微發光二極體顯示器與底部發光型微發光二極體顯示器及其形成方法Top emission type micro light emitting diode display and bottom emission type micro light emitting diode display and forming method thereof

本發明係有關一種發光二極體顯示器,特別是關於一種頂部發光型(top emission)微發光二極體顯示器與底部發光型(bottom emission)微發光二極體顯示器。The present invention relates to a light emitting diode display, and more particularly to a top emission micro light emitting diode display and a bottom emission micro light emitting diode display.

微發光二極體(microLED、mLED或μLED)顯示面板為平板顯示器(flat panel display)的一種,其係由尺寸等級為1~10微米之個別精微(microscopic)發光二極體所組成。相較於傳統液晶顯示面板,微發光二極體顯示面板具較大對比度及較快反應時間,且消耗較少功率。微發光二極體與有機發光二極體(OLED)雖然同樣具有低功耗的特性,但是,微發光二極體因為使用三-五族二極體技術(例如氮化鎵),因此相較於有機發光二極體具有較高的亮度(brightness)、較高的發光效能(luminous efficacy)及較長的壽命。The micro-light emitting diode (microLED, mLED or μLED) display panel is a type of flat panel display composed of individual microscopic light-emitting diodes of a size scale of 1 to 10 micrometers. Compared with the conventional liquid crystal display panel, the micro-light-emitting diode display panel has a large contrast ratio and a fast response time, and consumes less power. Although the micro-light-emitting diode and the organic light-emitting diode (OLED) also have low power consumption characteristics, the micro-light-emitting diode uses three-five-group diode technology (for example, gallium nitride), so The organic light-emitting diode has higher brightness, higher luminous efficacy and longer lifetime.

使用薄膜電晶體(TFT)的主動驅動方式為一種普遍使用的驅動機制,其可以和微發光二極體結合以製造顯示面板。但是,薄膜電晶體使用的是互補金屬氧化物半導體(CMOS)製程,而微發光二極體則是使用覆晶(flip chip)技術,兩者會產生熱失配(thermal mismatch)問題,且薄膜電晶體的製程較為複雜。在低灰階顯示時,由於驅動電流很小,會受到微發光二極體的漏電流而影響灰階顯示。The active driving method using a thin film transistor (TFT) is a commonly used driving mechanism that can be combined with a micro light emitting diode to manufacture a display panel. However, the thin film transistor uses a complementary metal oxide semiconductor (CMOS) process, and the micro light emitting diode uses a flip chip technique, which causes thermal mismatch problems and a thin film. The process of the transistor is complicated. In the low gray scale display, since the driving current is small, the leakage current of the micro light emitting diode is affected to affect the gray scale display.

被動驅動方式為另一種驅動機制。傳統的被動式驅動顯示面板,其列驅動電路與行驅動電路係設於顯示面板的邊緣。然而,當顯示面板的尺寸變大或者解析度變高時,造成驅動器的輸出負載過大,過長的延遲時間使得顯示面板無法正常驅動。因此,被動式驅動機制無法適用於大尺寸的微發光二極體顯示面板。Passive drive is another drive mechanism. A conventional passive drive display panel has a column drive circuit and a row drive circuit disposed at an edge of the display panel. However, when the size of the display panel becomes large or the resolution becomes high, the output load of the driver is excessively large, and an excessively long delay time causes the display panel to be unable to drive normally. Therefore, the passive driving mechanism cannot be applied to a large-sized micro-light emitting diode display panel.

因此,亟需提出一種新穎的微發光二極體顯示面板,特別是大尺寸或高解析度的顯示面板,使其保有微發光二極體的優點且能改善傳統驅動機制的缺點。Therefore, there is a need to propose a novel micro-light-emitting diode display panel, particularly a large-sized or high-resolution display panel, which retains the advantages of the micro-light-emitting diode and can improve the disadvantages of the conventional driving mechanism.

由於相鄰微發光二極體之間的距離極小,很容易造成相鄰微發光二極體或相鄰像素之間的互相干擾,例如混色(color mixing),且降低對比度(contrast ratio)。此外,微發光二極體需要藉由連接導線與其他元件或電路作電性連接,這些連接導線通常包含不透明(opaque)材質或反射(reflective)材質,因此會造成不均勻(non-uniform)的顯示問題。Since the distance between adjacent micro-light-emitting diodes is extremely small, mutual interference between adjacent micro-light-emitting diodes or adjacent pixels, such as color mixing, and contrast ratio is easily caused. In addition, the micro-light-emitting diode needs to be electrically connected to other components or circuits by connecting wires, which usually include an opaque material or a reflective material, thereby causing non-uniform Show the problem.

因此,亟需提出一種新穎的微發光二極體顯示器,用以改善傳統微發光二極體顯示器的發光效能。Therefore, there is a need to propose a novel micro-light-emitting diode display for improving the luminous efficacy of a conventional micro-light-emitting diode display.

鑑於上述,本發明實施例的目的之一在於提出一種微發光二極體顯示面板,有效降低驅動器的負載,以實現單一大尺寸高解析度微發光二極體顯示面板。在一實施例中採用被動驅動方式,可簡化顯示面板的製程,縮短微發光二極體的開啟時間,提高驅動電流,有效降低微發光二極體因漏電流對於灰階顯示所造成的影響。In view of the above, one of the objects of the embodiments of the present invention is to provide a micro-light emitting diode display panel, which effectively reduces the load of the driver to realize a single large-size high-resolution micro-light-emitting diode display panel. In one embodiment, the passive driving method is adopted, which can simplify the manufacturing process of the display panel, shorten the opening time of the micro light emitting diode, improve the driving current, and effectively reduce the influence of the leakage current on the gray scale display of the micro light emitting diode.

根據本發明實施例,微發光二極體顯示面板包含複數微發光二極體、基板及複數驅動器。基板用以承載該些微發光二極體,且基板的表面劃分為複數次區域。該些驅動器分別相應設於該些次區域的表面。在一實施例中,該些微發光二極體使用被動驅動方式。驅動器包含行驅動電路,藉由行導線連接並傳送行驅動信號至同一行微發光二極體的第一電極;及列驅動電路,藉由列導線連接並傳送列驅動信號至同一列微發光二極體的第二電極。According to an embodiment of the invention, the micro-light-emitting diode display panel comprises a plurality of micro-light emitting diodes, a substrate and a plurality of drivers. The substrate is used to carry the micro-light emitting diodes, and the surface of the substrate is divided into a plurality of sub-regions. The drivers are respectively disposed on the surfaces of the sub-regions. In an embodiment, the micro-light emitting diodes use a passive driving method. The driver comprises a row driving circuit, and the row driving wire is connected to and transmits the row driving signal to the first electrode of the same row of the micro light emitting diode; and the column driving circuit is connected by the column wires and transmits the column driving signal to the same column of the micro light emitting diode The second electrode of the polar body.

根據本發明另一實施例,微發光二極體顯示面板包含複數微發光二極體、至少一積體電路及基板。基板承載該些微發光二極體與積體電路,且基板的頂面具有凹陷部,用以容置積體電路。According to another embodiment of the present invention, a micro light emitting diode display panel includes a plurality of micro light emitting diodes, at least one integrated circuit, and a substrate. The substrate carries the micro-light emitting diodes and the integrated circuit, and the top surface of the substrate has a recessed portion for accommodating the integrated circuit.

鑑於上述,本發明實施例的目的之一在於提出一種頂部發光型微發光二極體顯示器與底部發光型微發光二極體顯示器的結構與製造方法,有效避免干擾、混色或不均勻的顯示問題。In view of the above, one of the objects of the embodiments of the present invention is to provide a structure and a manufacturing method of a top-emitting micro-light-emitting diode display and a bottom-emitting micro-light-emitting diode display, thereby effectively avoiding interference, color mixing or uneven display problems. .

根據本發明實施例之一,頂部發光型微發光二極體顯示器包含第一主基板;底共電極層,設於第一主基板的頂面;複數微發光二極體,設於底共電極層之上;第一光阻斷層,設於底共電極層的上方,以定義複數發光區;導光層,設於該些發光區內;及複數連接結構,設於該些發光區內且分別電性連接於該些微發光二極體。According to one embodiment of the present invention, a top emission type micro light emitting diode display includes a first main substrate; a bottom common electrode layer is disposed on a top surface of the first main substrate; and a plurality of micro light emitting diodes are disposed on the bottom common electrode Above the layer; a first light blocking layer disposed above the bottom common electrode layer to define a plurality of light emitting regions; a light guiding layer disposed in the light emitting regions; and a plurality of connecting structures disposed in the light emitting regions And electrically connected to the micro-light emitting diodes respectively.

根據本發明又一實施例,底部發光型微發光二極體顯示器包含第一主基板;複數微發光二極體,設於第一主基板之上;第一光阻斷層,設於第一主基板的上方,以定義複數發光區;導光層,設於該些發光區內;複數連接結構,設於該些發光區內且分別電性連接於該些微發光二極體;及頂共電極層,設於第一光阻斷層與該些微發光二極體的頂面。According to still another embodiment of the present invention, a bottom emission type micro light emitting diode display includes a first main substrate; a plurality of micro light emitting diodes are disposed on the first main substrate; and the first light blocking layer is disposed at the first a plurality of light-emitting regions are defined above the main substrate; a light-guiding layer is disposed in the light-emitting regions; and a plurality of connection structures are disposed in the light-emitting regions and electrically connected to the micro-light emitting diodes respectively; The electrode layer is disposed on the top surface of the first light blocking layer and the micro light emitting diodes.

第一A圖顯示本發明實施例之微發光二極體(microLED)顯示面板9100的俯視圖,第一B圖顯示第一A圖之微發光二極體顯示面板9100的側視圖。本實施例之微發光二極體顯示面板9100的架構較佳適用於大尺寸高解析度顯示面板,例如解析度為3840RGBx2160的顯示面板。在本說明書中,微發光二極體的尺寸等級為1~10微米。然而,會因產品的應用領域或將來技術的發展而更小。在本說明書中,“大尺寸”顯示面板係依目前業界的習慣,定義為10吋以上的顯示面板。然而,對於“大尺寸”顯示面板的定義會因產品的應用領域或將來技術的發展而有所改變。在本說明書中,“高解析度”顯示面板係依目前業界的習慣,定義為1080掃描線以上的顯示面板。然而,對於“高解析度”顯示面板的定義同樣會因產品的應用領域或將來技術的發展而有所改變。1A shows a top view of a micro LED display panel 9100 according to an embodiment of the present invention, and FIG. 1B shows a side view of the micro LED display panel 9100 of FIG. The architecture of the micro-light-emitting diode display panel 9100 of the present embodiment is preferably applied to a large-sized high-resolution display panel, such as a display panel having a resolution of 3840 RGB x 2160. In the present specification, the micro-light emitting diode has a size rating of 1 to 10 μm. However, it will be smaller due to the application field of the product or the development of future technologies. In the present specification, the "large size" display panel is defined as a display panel of 10 inches or more according to the current industry practice. However, the definition of a "large size" display panel may vary depending on the application area of the product or the future development of the technology. In the present specification, the "high-resolution" display panel is defined as a display panel of 1080 or more scanning lines according to the current industry practice. However, the definition of a "high-resolution" display panel will also change depending on the application area of the product or the future development of the technology.

在本實施例中,微發光二極體顯示面板9100包含基板911,用以承載複數微發光二極體(未顯示於圖式)。基板911的材質較佳為絕緣體(例如玻璃、壓克力),也可以為其他適於承載微發光二極體的材質。In this embodiment, the micro-light-emitting diode display panel 9100 includes a substrate 911 for carrying a plurality of micro-light-emitting diodes (not shown). The material of the substrate 911 is preferably an insulator (for example, glass or acryl), and may be other materials suitable for carrying the micro-light emitting diode.

根據本實施例的特徵之一,基板911的表面劃分為複數次區域(sub-region)9101。經劃分的該些次區域9101並未實體切割開來,且基板911並非是將複數小區塊整合而成的,因此基板911為一個完整未切割的實體。換句話說,本實施例之微發光二極體顯示面板9100係為單一(single或whole)或未分割(uncut)的顯示面板。第一A圖僅顯示簡化的次區域9101劃分例子。以解析度3840RGBx2160的微發光二極體顯示面板9100為例,基板911可劃分為80x54個次區域9101,每一次區域9101的解析度為48RGBx40,但也可以劃分為較多或較少的次區域9101。According to one of the features of the embodiment, the surface of the substrate 911 is divided into a plurality of sub-regions 9101. The divided sub-regions 9101 are not physically cut, and the substrate 911 is not formed by integrating a plurality of cell blocks, so the substrate 911 is a complete uncut entity. In other words, the micro-light-emitting diode display panel 9100 of the present embodiment is a single (single or whole) or uncut display panel. The first A diagram shows only a simplified sub-area 9101 partitioning example. Taking the micro-light-emitting diode display panel 9100 with a resolution of 3840 RGB x 2160 as an example, the substrate 911 can be divided into 80×54 sub-regions 9101, and the resolution of each region 9101 is 48 RGB×40, but can also be divided into more or less sub-regions. 9101.

根據本實施例的另一特徵,微發光二極體顯示面板9100包含複數驅動器(driver)912,分別相應設於該些次區域9101的表面(例如頂面)。第一A圖所示驅動器912係設於相應次區域9101的表面的中央位置,但不限定於此。第一A圖例示每ㄧ次區域9101設有一驅動器912,然而在其他實施例中,每ㄧ次區域9101也可設有複數驅動器912。本實施例的驅動器912可製作為晶片形式的積體電路,藉由表面黏著技術(SMT),例如晶片玻璃(chip-on-glass, COG)或覆晶(flip chip)技術,將驅動器912接合(bond)於次區域9101的表面。在一例子中,驅動器912與微發光二極體係設於基板911的次區域9101的相同表面。According to another feature of the embodiment, the micro-light-emitting diode display panel 9100 includes a plurality of drivers 912 respectively disposed on surfaces (eg, top surfaces) of the sub-regions 9101. The driver 912 shown in FIG. 1A is disposed at a central position of the surface of the corresponding sub-region 9101, but is not limited thereto. The first A diagram illustrates that each of the sub-regions 9101 is provided with a driver 912. However, in other embodiments, each of the sub-regions 9101 may be provided with a plurality of drivers 912. The driver 912 of the present embodiment can be fabricated as an integrated circuit in the form of a wafer, and the driver 912 is bonded by surface mount technology (SMT), such as chip-on-glass (COG) or flip chip technology. Bonded to the surface of sub-region 9101. In one example, the driver 912 and the micro-light emitting diode system are disposed on the same surface of the sub-region 9101 of the substrate 911.

本實施例的微發光二極體顯示面板9100還包含複數時序控制器(TCON)913,其可藉由導線(例如軟性電路板,未顯示於圖式)電性連接至基板911,再經由設於基板911表面的走線(未顯示於圖式)而電性連接至相應的驅動器912。在本實施例中,一時序控制器913可電性連接至少二驅動器912。換句話說,時序控制器913的數目少於驅動器912的數目。時序控制器913可藉由走線分別直接連接至相應的驅動器912;也可藉由走線連接至一驅動器912,經信號緩衝後,再藉由走線連接至另一驅動器912。The micro-light-emitting diode display panel 9100 of the present embodiment further includes a complex timing controller (TCON) 913, which can be electrically connected to the substrate 911 by wires (for example, a flexible circuit board, not shown in the drawings), and then A trace (not shown) on the surface of the substrate 911 is electrically connected to the corresponding driver 912. In this embodiment, a timing controller 913 can electrically connect at least two drivers 912. In other words, the number of timing controllers 913 is less than the number of drivers 912. The timing controller 913 can be directly connected to the corresponding driver 912 by a trace; or can be connected to a driver 912 by a trace, buffered by a signal, and then connected to another driver 912 by a trace.

根據本實施例的又一特徵,微發光二極體顯示面板9100採用被動(passive)驅動方式以驅動微發光二極體。第二圖顯示被動驅動方式的微發光二極體顯示面板9100的示意圖。時序控制器913傳送時序控制信號與顯示資料信號給驅動器912。驅動器912包含行(column)驅動電路9121與列(row或scan)驅動電路9122,其中行驅動電路9121藉由行導線91211連接並傳送行驅動信號至同一行微發光二極體914的第一電極(例如陽極),列驅動電路9122則藉由列導線91221連接並傳送列驅動信號至同一列微發光二極體914的第二電極(例如陰極)。在本實施例中,行驅動電路9121與列驅動電路9122係製作為單一積體電路。According to still another feature of the embodiment, the micro-light-emitting diode display panel 9100 adopts a passive driving manner to drive the micro-light emitting diode. The second figure shows a schematic diagram of a passively driven micro-light emitting diode display panel 9100. The timing controller 913 transmits the timing control signal and the display data signal to the driver 912. The driver 912 includes a column driving circuit 9121 and a row or scan driving circuit 9122. The row driving circuit 9121 is connected by the row wiring 9111 and transmits the row driving signal to the first electrode of the same row of the micro light emitting diode 914. (e.g., the anode), the column driver circuit 9122 is coupled by the column conductors 91221 and transmits the column drive signals to the second electrode (e.g., the cathode) of the same column of micro-light emitting diodes 914. In the present embodiment, the row driving circuit 9121 and the column driving circuit 9122 are fabricated as a single integrated circuit.

根據上述實施例,由於微發光二極體顯示面板9100的基板911劃分為複數次區域9101,每一次區域9101設有相應的驅動器912,因而可以有效降低行驅動電路9121與列驅動電路9122的負載,以實現單一大尺寸高解析度微發光二極體顯示面板。此外,相對於使用薄膜電晶體(TFT)的主動驅動方式,本實施例之微發光二極體顯示面板9100因採用被動驅動方式以驅動微發光二極體914,因此可以簡化顯示面板的製程,縮短微發光二極體914的開啟(turn on)時間,提高驅動電流,有效降低微發光二極體914因漏電流對於灰階顯示所造成的影響。According to the above embodiment, since the substrate 911 of the micro-light-emitting diode display panel 9100 is divided into a plurality of sub-areas 9101, each of the regions 9101 is provided with a corresponding driver 912, so that the load of the row driving circuit 9121 and the column driving circuit 9122 can be effectively reduced. To achieve a single large-size high-resolution micro-light-emitting diode display panel. In addition, the micro-light-emitting diode display panel 9100 of the present embodiment can drive the micro-light-emitting diode 914 by using a passive driving method, so that the process of the display panel can be simplified, as compared with the active driving method using a thin film transistor (TFT). The turn-on time of the micro-light-emitting diode 914 is shortened, the driving current is increased, and the influence of the leakage current on the gray-scale display of the micro-light-emitting diode 914 is effectively reduced.

第三圖顯示本發明第一特定實施例之正面發光(frontside illuminating)的微發光二極體顯示面板9300的剖視圖。在本實施例中,微發光二極體914與驅動器912設於基板911的頂面。微發光二極體914所產生的光線主要從基板911的頂面向上發光(亦即正面發光),如箭號所示。The third figure shows a cross-sectional view of a frontside illuminating micro-light emitting diode display panel 9300 in accordance with a first particular embodiment of the present invention. In the embodiment, the micro-light emitting diode 914 and the driver 912 are disposed on the top surface of the substrate 911. The light generated by the micro-light-emitting diode 914 mainly emits light from the top surface of the substrate 911 (i.e., the front side emits light) as indicated by an arrow.

如第三圖所例示,每ㄧ像素包含有紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B。基板911的表面(例如頂面)與微發光二極體914、驅動器912之間設有走線層915,用以電性連接驅動器912、微發光二極體914與時序控制器913。於相鄰像素的微發光二極體914之間,形成光阻斷(light blocking)層916於走線層915的上方。本實施例的光阻斷層916的材質可為黑矩陣(black matrix, BM)或其他可遮蔽光線的適當材質。在一實施例中,同一像素的紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B之間也可以形成光阻斷層916,但是不一定要形成。As illustrated in the third figure, each pixel includes a red micro-light emitting diode 914R, a green micro-light emitting diode 914G, and a blue micro-light emitting diode 914B. A wiring layer 915 is disposed between the surface of the substrate 911 (eg, the top surface) and the micro-light-emitting diode 914 and the driver 912 for electrically connecting the driver 912, the micro-light-emitting diode 914, and the timing controller 913. Between the micro-light emitting diodes 914 of adjacent pixels, a light blocking layer 916 is formed above the wiring layer 915. The material of the light blocking layer 916 of this embodiment may be a black matrix (BM) or other suitable material that can shield light. In an embodiment, the light blocking layer 916 may also be formed between the red micro-light emitting diode 914R, the green micro light emitting diode 914G, and the blue micro light emitting diode 914B of the same pixel, but it is not necessarily formed.

紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B之上還可設有導光層917。本實施例的正面發光的微發光二極體顯示面板9300還包含蓋板918,設於基板911的底面。本實施例之蓋板918的材質可為不透明材質。A light guiding layer 917 may be further disposed on the red micro light emitting diode 914R, the green micro light emitting diode 914G, and the blue micro light emitting diode 914B. The front-illuminated micro-light-emitting diode display panel 9300 of the present embodiment further includes a cover plate 918 disposed on the bottom surface of the substrate 911. The material of the cover plate 918 of this embodiment may be an opaque material.

第四圖顯示本發明第二特定實施例之背面發光(backside illuminating)的微發光二極體顯示面板9400的剖視圖。在本實施例中,微發光二極體914與驅動器912設於基板911的頂面。微發光二極體914所產生的光線主要從基板11的背面向下發光(亦即背面發光),如箭號所示。The fourth figure shows a cross-sectional view of a backside illuminating micro-light emitting diode display panel 9400 of a second specific embodiment of the present invention. In the embodiment, the micro-light emitting diode 914 and the driver 912 are disposed on the top surface of the substrate 911. The light generated by the micro-light-emitting diode 914 mainly emits light downward from the back surface of the substrate 11 (i.e., the back surface emits light) as indicated by an arrow.

如第四圖所例示,每ㄧ像素包含有紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B。於相鄰像素的微發光二極體914之間,形成光阻斷層916於基板911的表面(例如頂面)。本實施例的光阻斷層916的材質可為黑矩陣(BM)或其他可遮蔽光線的適當材質。光阻斷層916的上方設有走線層915,用以電性連接驅動器912、微發光二極體914與時序控制器913。在一實施例中,同一像素的紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B之間也可以形成光阻斷層916,但是不一定要形成。As illustrated in the fourth figure, each pixel includes a red micro light emitting diode 914R, a green micro light emitting diode 914G, and a blue micro light emitting diode 914B. Between the micro-light emitting diodes 914 of adjacent pixels, a light blocking layer 916 is formed on the surface (for example, the top surface) of the substrate 911. The material of the light blocking layer 916 of this embodiment may be a black matrix (BM) or other suitable material that can shield light. A wiring layer 915 is disposed above the light blocking layer 916 for electrically connecting the driver 912, the micro LED 914, and the timing controller 913. In an embodiment, the light blocking layer 916 may also be formed between the red micro-light emitting diode 914R, the green micro light emitting diode 914G, and the blue micro light emitting diode 914B of the same pixel, but it is not necessarily formed.

紅色微發光二極體914R、綠色微發光二極體914G與藍色微發光二極體914B之上還可設有導光層917。本實施例的背面發光的微發光二極體顯示面板9400還包含蓋板918,設於驅動器912、走線層915、光阻斷層916、導光層917的上方。本實施例之蓋板918的材質可為不透明材質。A light guiding layer 917 may be further disposed on the red micro light emitting diode 914R, the green micro light emitting diode 914G, and the blue micro light emitting diode 914B. The back-illuminated micro-light-emitting diode display panel 9400 of the present embodiment further includes a cover plate 918 disposed above the driver 912, the wiring layer 915, the light blocking layer 916, and the light guiding layer 917. The material of the cover plate 918 of this embodiment may be an opaque material.

第五圖顯示基板911、驅動器912與微發光二極體914的局部放大側視圖,其中驅動器912與微發光二極體914設於基板911的頂面。一般來說,積體電路(例如驅動器912)的高度遠高於微發光二極體914的高度。舉例而言,驅動器912的高度為150微米,微發光二極體914的高度為10微米,而基板911的高度為500~1100微米。由於驅動器912與微發光二極體914的高度相差很大(例如,十倍以上),微發光二極體914從基板911的頂面向上發射的光線(如箭號所示)會被鄰近的驅動器912阻擋,因而降低某些視角的光線強度。為了解決此問題,本發明因此提出以下的實施例。The fifth figure shows a partially enlarged side view of the substrate 911, the driver 912 and the micro-light emitting diode 914, wherein the driver 912 and the micro-light emitting diode 914 are disposed on the top surface of the substrate 911. In general, the height of the integrated circuit (e.g., driver 912) is much higher than the height of the micro-light emitting diode 914. For example, the height of the driver 912 is 150 micrometers, the height of the micro-light emitting diode 914 is 10 micrometers, and the height of the substrate 911 is 500-1100 micrometers. Since the height of the driver 912 and the micro-light-emitting diode 914 are greatly different (for example, ten times or more), the light emitted from the top surface of the substrate 911 by the micro-light-emitting diode 914 (shown by an arrow) is adjacent. The driver 912 blocks, thereby reducing the light intensity at certain viewing angles. In order to solve this problem, the present invention therefore proposes the following embodiments.

第六A圖顯示本發明實施例之微發光二極體顯示面板的局部放大側視圖。在本實施例中,基板911的頂面具有凹陷部(recess)9110,用以容置積體電路(例如驅動器912)。在本實施例中,凹陷部9110的深度h1與微發光二極體914的高度之和等於驅動器912的高度。因此,驅動器912的頂面與微發光二極體914的頂面位於相同水平。相較於第五圖之微發光二極體顯示面板,本實施例之微發光二極體914所發射的光線不會被鄰近的驅動器912阻擋。Figure 6A is a partially enlarged side elevational view showing the micro-light emitting diode display panel of the embodiment of the present invention. In the present embodiment, the top surface of the substrate 911 has a recess 9110 for accommodating an integrated circuit (for example, the driver 912). In the present embodiment, the sum of the depth h1 of the recessed portion 9110 and the height of the micro-light emitting diode 914 is equal to the height of the driver 912. Therefore, the top surface of the driver 912 is at the same level as the top surface of the micro-light emitting diode 914. Compared with the micro-light-emitting diode display panel of the fifth embodiment, the light emitted by the micro-light-emitting diode 914 of the present embodiment is not blocked by the adjacent driver 912.

第六B圖顯示本發明另一實施例之微發光二極體顯示面板的局部放大側視圖。在本實施例中,基板911的頂面具有凹陷部9110,用以容置積體電路(例如驅動器912)。在本實施例中,凹陷部9110的深度h2大於驅動器912的高度。因此,驅動器912的頂面的水平低於微發光二極體914的頂面。相較於第五圖之微發光二極體顯示面板,本實施例之微發光二極體914所發射的光線不會被鄰近的驅動器912阻擋。Fig. 6B is a partially enlarged side elevational view showing the micro-light emitting diode display panel of another embodiment of the present invention. In the present embodiment, the top surface of the substrate 911 has a recessed portion 9110 for accommodating an integrated circuit (for example, the driver 912). In the present embodiment, the depth h2 of the recessed portion 9110 is greater than the height of the driver 912. Therefore, the level of the top surface of the driver 912 is lower than the top surface of the micro-light emitting diode 914. Compared with the micro-light-emitting diode display panel of the fifth embodiment, the light emitted by the micro-light-emitting diode 914 of the present embodiment is not blocked by the adjacent driver 912.

第六C圖顯示本發明又一實施例之微發光二極體顯示面板的局部放大側視圖。在本實施例中,基板911的頂面具有凹陷部9110,用以容置積體電路(例如驅動器912)。在本實施例中,凹陷部9110的深度h3與微發光二極體914的高度之和小於驅動器912的高度。因此,驅動器912的頂面的水平高於微發光二極體914的頂面。相較於第五圖之微發光二極體顯示面板,本實施例之微發光二極體914所發射光線受到鄰近驅動器912的阻擋程度有大量的改善。Figure 6C is a partially enlarged side elevational view showing a micro-light emitting diode display panel according to still another embodiment of the present invention. In the present embodiment, the top surface of the substrate 911 has a recessed portion 9110 for accommodating an integrated circuit (for example, the driver 912). In the present embodiment, the sum of the depth h3 of the recessed portion 9110 and the height of the micro-light emitting diode 914 is smaller than the height of the driver 912. Therefore, the level of the top surface of the driver 912 is higher than the top surface of the micro-light emitting diode 914. Compared with the micro-light-emitting diode display panel of the fifth embodiment, the light emitted by the micro-light-emitting diode 914 of the present embodiment is greatly improved by the degree of blocking by the adjacent driver 912.

根據上述實施例,設計者可根據各積體電路的高度以分別形成不同深度的凹陷部9110,用以分別容置不同高度的積體電路。設計者也可根據複數積體電路當中的最大高度,形成一個具凹陷部的溝槽(groove),用以同時容置該些積體電路。According to the above embodiment, the designer can respectively form the recesses 9110 of different depths according to the heights of the integrated circuits for respectively accommodating the integrated circuits of different heights. The designer can also form a groove having a recess according to the maximum height of the complex integrated circuit to accommodate the integrated circuits at the same time.

第七圖顯示頂部發光型(top emission)微發光二極體顯示器100的簡化側視圖。在本實施例中,使用接合(bonding)技術,於主基板11的頂面設有複數微發光二極體12,例如紅色微發光二極體12R、綠色微發光二極體12G與藍色微發光二極體12B。該些微發光二極體12所產生的光線從主基板11的頂面向上發射(如箭號所示),因此稱為頂部發光型微發光二極體顯示器。在本說明書中,微發光二極體的尺寸等級為1~10微米。然而,會因產品的應用領域或將來技術的發展而更小或更大。The seventh diagram shows a simplified side view of a top emission micro-light emitting diode display 100. In this embodiment, a plurality of micro-light emitting diodes 12 are disposed on the top surface of the main substrate 11 using a bonding technique, such as a red micro-light emitting diode 12R, a green micro-light emitting diode 12G, and a blue micro. Light-emitting diode 12B. The light generated by the micro-light-emitting diodes 12 is emitted from the top surface of the main substrate 11 (as indicated by an arrow), and is therefore referred to as a top-emission type micro-light-emitting diode display. In the present specification, the micro-light emitting diode has a size rating of 1 to 10 μm. However, it may be smaller or larger due to the application field of the product or the development of future technologies.

第八A圖顯示本發明第一實施例之頂部發光型微發光二極體顯示器200的俯視圖,第八B圖顯示第八A圖的剖面圖。在本實施例中,於(第一)主基板21A的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。相鄰的微發光二極體22之間設有(第一)光阻斷(light blocking)層23A,形成於(第一)主基板21A的頂面,用以避免相鄰微發光二極體22之間的互相干擾(例如混色),且能增進對比度。主基板21A與微發光二極體22之間可設有底共電極(bottom common electrode)層28。在本實施例(及後續實施例)中,微發光二極體22可為長方形。例如,長為25微米,寬為10微米。根據本發明實施例的特徵之一,微發光二極體22係垂直縱列設置。亦即,微發光二極體22的長邊平行於顯示器的縱向,且短邊平行於顯示器的橫向。由於人眼感覺垂直發射之光線會多於水平發射之光線,因此所述的設置方向可增加可視角的角度。8A is a plan view showing a top-emission type micro-light-emitting diode display 200 according to a first embodiment of the present invention, and FIG. 8B is a cross-sectional view showing an eighth-A diagram. In this embodiment, a plurality of micro-light-emitting diodes 22, such as a red micro-light-emitting diode 22R, a green micro-light-emitting diode 22G, and a blue micro-light-emitting diode, are disposed on the top surface of the (first) main substrate 21A. Body 22B. A (first) light blocking layer 23A is disposed between the adjacent micro light emitting diodes 22, and is formed on the top surface of the (first) main substrate 21A to avoid adjacent micro light emitting diodes. Interference between 22 (such as color mixing), and can improve contrast. A bottom common electrode layer 28 may be disposed between the main substrate 21A and the micro-light emitting diode 22. In the present embodiment (and subsequent embodiments), the micro-light emitting diode 22 may be rectangular. For example, it is 25 microns long and 10 microns wide. According to one of the features of embodiments of the present invention, the micro-light emitting diodes 22 are arranged in a vertical column. That is, the long side of the micro-light emitting diode 22 is parallel to the longitudinal direction of the display, and the short side is parallel to the lateral direction of the display. Since the human eye feels that the light emitted vertically is more than the light emitted horizontally, the set direction can increase the angle of view angle.

本實施例之(第一)光阻斷層23A可為黑矩陣(black matrix, BM)。在第八B圖所示實施例中,首先形成黑樹脂(black resin),再使用光學製程(photo process)及固化(curing)製程以形成黑矩陣(第一)光阻斷層23A。在另一實施例中,使用噴墨印刷(ink-jet printing)技術及固化製程以形成黑矩陣(第一)光阻斷層23A。The (first) light blocking layer 23A of the present embodiment may be a black matrix (BM). In the embodiment shown in the eighth embodiment, a black resin is first formed, and an optical process and a curing process are used to form a black matrix (first) light blocking layer 23A. In another embodiment, an ink-jet printing technique and a curing process are used to form a black matrix (first) light blocking layer 23A.

(第一)光阻斷層23A定義出發光區(emission area)24,亦即,未被(第一)光阻斷層23A覆蓋的區域稱為發光區24。換另一角度來說,發光區24以外的所有區域都覆蓋有(第一)光阻斷層23A。於發光區24內,形成有導光(light guiding)層25,包含導光材質,用以擴張微發光二極體22所產生的光線。導光材質一般為透明材質,並具高折射係數。在本實施例中,導光層25係全面形成於發光區24內。The (first) light blocking layer 23A defines an emission area 24, that is, an area not covered by the (first) light blocking layer 23A is referred to as a light emitting area 24. On the other hand, all areas except the light-emitting area 24 are covered with the (first) light blocking layer 23A. In the light-emitting region 24, a light guiding layer 25 is formed, which comprises a light guiding material for expanding the light generated by the micro-light emitting diode 22. The light guiding material is generally a transparent material and has a high refractive index. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,(第一)光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第八B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the (first) light blocking layer 23A is larger than the thickness of the light guiding layer 25. In addition, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22, as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第八C圖顯示本發明變化型第一實施例之頂部發光型微發光二極體顯示器200的剖面圖。相較於第八B圖,第八C圖所示實施例的(第一)光阻斷層23A的厚度小於導光層25的厚度。此外,(第一)光阻斷層23A與導光層25相鄰的區域互相部分重疊,且(第一)光阻斷層23A被導光層25部分覆蓋。在第八C圖所示實施例中,首先形成鉻/氧化鉻薄膜,再使用照相蝕刻(photo etching)技術以形成黑矩陣(第一)光阻斷層23A。Fig. C is a cross-sectional view showing the top emission type micro light-emitting diode display 200 of the first modification of the present invention. The thickness of the (first) light blocking layer 23A of the embodiment shown in the eighth C is smaller than the thickness of the light guiding layer 25 as compared with the eighth FIG. Further, the regions of the (first) light blocking layer 23A adjacent to the light guiding layer 25 partially overlap each other, and the (first) light blocking layer 23A is partially covered by the light guiding layer 25. In the embodiment shown in the eighth C diagram, a chromium/chromia film is first formed, and a photo etching technique is used to form a black matrix (first) light blocking layer 23A.

第八D圖顯示本發明第一實施例之頂部發光型微發光二極體顯示器200的另一俯視圖。每一個發光區24內包含有連接結構26,例如導電電極,設於微發光二極體22的頂面。根據本發明實施例的特徵之一,每一個發光區24的連接結構26的圖樣(pattern)都相同。連接結構26的材質包含透明材質(例如氧化銦錫)、非透明材質(例如金屬)或反射(reflective)材質。由於本實施例每一個發光區24內具有相同圖樣的連接結構26,因此可以避免不均勻的顯示問題。The eighth D diagram shows another top view of the top emission type micro light emitting diode display 200 of the first embodiment of the present invention. Each of the light-emitting regions 24 includes a connection structure 26, such as a conductive electrode, disposed on a top surface of the micro-light-emitting diode 22. According to one of the features of the embodiments of the present invention, the pattern of the connection structure 26 of each of the light-emitting regions 24 is the same. The material of the connection structure 26 includes a transparent material (for example, indium tin oxide), a non-transparent material (for example, metal), or a reflective material. Since the light-emitting area 24 of this embodiment has the connection structure 26 of the same pattern, uneven display problems can be avoided.

第九A圖顯示本發明第二實施例之頂部發光型微發光二極體顯示器300的俯視圖,第九B圖顯示第九A圖的剖面圖。本第二實施例類似於第一實施例,不同的地方在於,第二實施例的(第一)光阻斷層23A設於相鄰像素之間(而非相鄰的微發光二極體22之間),用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度。9A is a plan view showing a top emission type micro light-emitting diode display 300 according to a second embodiment of the present invention, and a ninth B is a cross-sectional view showing a ninth A chart. The second embodiment is similar to the first embodiment except that the (first) light blocking layer 23A of the second embodiment is disposed between adjacent pixels (instead of the adjacent micro-light emitting diodes 22). Between) to avoid mutual interference between adjacent pixels (for example, color mixing), and to improve contrast.

(第一)光阻斷層23A定義出發光區24,亦即,未被(第一)光阻斷層23A覆蓋的區域稱為發光區24(或像素區)。換另一角度來說,發光區24以外的所有區域都覆蓋有(第一)光阻斷層23A。在本實施例中,導光層25係全面形成於發光區24內。The (first) light blocking layer 23A defines the light emitting region 24, that is, the region not covered by the (first) light blocking layer 23A is referred to as a light emitting region 24 (or a pixel region). On the other hand, all areas except the light-emitting area 24 are covered with the (first) light blocking layer 23A. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,(第一)光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第九B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the (first) light blocking layer 23A is larger than the thickness of the light guiding layer 25. Further, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第九C圖顯示本發明變化型第二實施例之頂部發光型微發光二極體顯示器300的剖面圖。相較於第九B圖,第九C圖所示實施例的(第一)光阻斷層23A的厚度小於導光層25的厚度。此外,(第一)光阻斷層23A與導光層25相鄰的區域互相部分重疊,且(第一)光阻斷層23A被導光層25部分覆蓋。Fig. 9C is a cross-sectional view showing the top emission type micro light-emitting diode display 300 of the second modification of the present invention. The thickness of the (first) light blocking layer 23A of the embodiment shown in the ninth C is smaller than the thickness of the light guiding layer 25 compared to the ninth B. Further, the regions of the (first) light blocking layer 23A adjacent to the light guiding layer 25 partially overlap each other, and the (first) light blocking layer 23A is partially covered by the light guiding layer 25.

第九D圖顯示本發明第二實施例之頂部發光型微發光二極體顯示器300的另一俯視圖。每一個發光區24內包含有連接結構26,例如導電電極。根據本發明實施例的特徵之一,發光區24內每一微發光二極體22相應的連接結構26的圖樣都相同,且每一發光區24具有相同圖樣的連接結構26。由於本實施例的發光區24內每一微發光二極體22相應的連接結構26的圖樣都相同,且每一發光區24的連接結構26的圖樣也相同,因此可以避免不均勻的顯示問題。The ninth D diagram shows another top view of the top emission type micro light emitting diode display 300 of the second embodiment of the present invention. Each of the light-emitting regions 24 includes a connection structure 26, such as a conductive electrode. According to one of the features of the embodiments of the present invention, the respective connection structures 26 of each of the micro-light-emitting diodes 22 in the light-emitting region 24 have the same pattern, and each of the light-emitting regions 24 has the same pattern of connection structures 26. Since the patterns of the corresponding connection structures 26 of each of the micro-light-emitting diodes 22 in the light-emitting region 24 of the present embodiment are the same, and the patterns of the connection structures 26 of each of the light-emitting regions 24 are the same, uneven display problems can be avoided. .

第十A圖顯示本發明第三實施例之頂部發光型微發光二極體顯示器400的俯視圖,第十B圖顯示第十A圖的剖面圖。在本實施例中,於(第一)主基板21A的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。每ㄧ微發光二極體22相應有一發光區24。本實施例包含框形的第一光阻斷層23A,其圍繞發光區24,且設於(第一)主基板21A的頂面。本實施例還包含阻斷基板27,位於(第一)主基板21A與第一光阻斷層23A的上方。第二光阻斷層23B形成於阻斷基板27的底面,其覆蓋發光區24與第一光阻斷層23A以外的區域。第一光阻斷層23A與第二光阻斷層23B相鄰的區域互相部分重疊。因此,第一光阻斷層23A的開口(aperture)內徑d1異於(例如小於)第二光阻斷層23B的開口內徑d2。在另一實施例中,第一光阻斷層23A的開口內徑可大於第二光阻斷層23B的開口內徑。本實施例之第一光阻斷層23A與第二光阻斷層23B可為黑矩陣(BM),阻斷基板27可為透光材質,例如石英、玻璃或塑膠材質。FIG. 10A is a plan view showing a top emission type micro light-emitting diode display 400 according to a third embodiment of the present invention, and FIG. 10B is a cross-sectional view showing a tenth A chart. In this embodiment, a plurality of micro-light-emitting diodes 22, such as a red micro-light-emitting diode 22R, a green micro-light-emitting diode 22G, and a blue micro-light-emitting diode, are disposed on the top surface of the (first) main substrate 21A. Body 22B. Each of the micro-light-emitting diodes 22 has a light-emitting region 24 corresponding thereto. This embodiment includes a frame-shaped first light blocking layer 23A that surrounds the light emitting region 24 and is disposed on the top surface of the (first) main substrate 21A. This embodiment further includes a blocking substrate 27 located above the (first) main substrate 21A and the first light blocking layer 23A. The second light blocking layer 23B is formed on the bottom surface of the blocking substrate 27, which covers the light emitting region 24 and a region other than the first light blocking layer 23A. The regions adjacent to the first light blocking layer 23A and the second light blocking layer 23B partially overlap each other. Therefore, the opening inner diameter d1 of the first light blocking layer 23A is different (for example, smaller than) the opening inner diameter d2 of the second light blocking layer 23B. In another embodiment, the opening inner diameter of the first light blocking layer 23A may be larger than the opening inner diameter of the second light blocking layer 23B. The first light blocking layer 23A and the second light blocking layer 23B of the embodiment may be a black matrix (BM), and the blocking substrate 27 may be a light transmissive material such as quartz, glass or plastic material.

於發光區24內,形成有導光層25,包含導光材質,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。A light guiding layer 25 is formed in the light emitting region 24, and includes a light guiding material for expanding the light generated by the micro light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,第一光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第十B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the first light blocking layer 23A is greater than the thickness of the light guiding layer 25. In addition, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22, as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第十C圖顯示本發明變化型第三實施例之頂部發光型微發光二極體顯示器400的剖面圖。相較於第十B圖,第十C圖所示實施例的第一光阻斷層23A的厚度小於導光層25的厚度。此外,第一光阻斷層23A被導光層25覆蓋。Fig. C is a cross-sectional view showing the top emission type micro light-emitting diode display 400 of the third modification of the present invention. The thickness of the first light blocking layer 23A of the embodiment shown in the tenth C is smaller than the thickness of the light guiding layer 25 compared to the tenth B. Further, the first light blocking layer 23A is covered by the light guiding layer 25.

根據本實施例的特徵之一,每一個發光區24內的連接結構(未顯示於圖式)的圖樣都相同。由於本實施例每一個發光區24內具有相同圖樣的連接結構,因此可以避免不均勻的顯示問題。According to one of the features of the embodiment, the pattern of the connection structure (not shown in the drawings) in each of the light-emitting regions 24 is the same. Since each of the light-emitting regions 24 of the present embodiment has the same pattern of connection structure, uneven display problems can be avoided.

第十一A圖顯示本發明第四實施例之頂部發光型微發光二極體顯示器500的俯視圖,第十一B圖顯示第十一A圖的剖面圖。本第四實施例類似於第三實施例,不同的地方在於,第四實施例的第一光阻斷層23A與第二光阻斷層23B設於相鄰像素之間(而非相鄰的微發光二極體22之間),用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度。11A is a plan view showing a top emission type micro light-emitting diode display 500 according to a fourth embodiment of the present invention, and FIG. 11B is a cross-sectional view showing FIG. 11A. The fourth embodiment is similar to the third embodiment, except that the first light blocking layer 23A and the second light blocking layer 23B of the fourth embodiment are disposed between adjacent pixels (not adjacent). The micro-light-emitting diodes 22 are used to avoid mutual interference (for example, color mixing) between adjacent pixels, and the contrast can be improved.

在本實施例中,每ㄧ像素(其包含紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B)相應有一發光區24。本實施例包含框形的第一光阻斷層23A,其圍繞發光區24,且設於(第一)主基板21A的頂面。本實施例還包含第二光阻斷層23B,形成於阻斷基板27的底面,用以覆蓋發光區24與第一光阻斷層23A以外的區域。第一光阻斷層23A與第二光阻斷層23B相鄰的區域,兩者互相部分重疊。因此,第一光阻斷層23A的開口內徑d1異於(例如小於)第二光阻斷層23B的開口內徑d2。本實施例之第一光阻斷層23A與第二光阻斷層23B可為黑矩陣(BM),阻斷基板27可為透光材質,例如石英、玻璃或塑膠材質。In the present embodiment, each of the pixels (which includes the red micro-light-emitting diode 22R, the green micro-light-emitting diode 22G, and the blue micro-light-emitting diode 22B) has a light-emitting region 24 corresponding thereto. This embodiment includes a frame-shaped first light blocking layer 23A that surrounds the light emitting region 24 and is disposed on the top surface of the (first) main substrate 21A. The embodiment further includes a second light blocking layer 23B formed on the bottom surface of the blocking substrate 27 for covering the light emitting region 24 and a region other than the first light blocking layer 23A. A region of the first light blocking layer 23A adjacent to the second light blocking layer 23B partially overlaps each other. Therefore, the opening inner diameter d1 of the first light blocking layer 23A is different (for example, smaller than) the opening inner diameter d2 of the second light blocking layer 23B. The first light blocking layer 23A and the second light blocking layer 23B of the embodiment may be a black matrix (BM), and the blocking substrate 27 may be a light transmissive material such as quartz, glass or plastic material.

於發光區24內,形成有導光層25,包含導光材質,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。A light guiding layer 25 is formed in the light emitting region 24, and includes a light guiding material for expanding the light generated by the micro light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,第一光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第十一B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the first light blocking layer 23A is greater than the thickness of the light guiding layer 25. Further, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第十一C圖顯示本發明變化型第四實施例之頂部發光型微發光二極體顯示器500的剖面圖。相較於第十一B圖,第十一C圖所示實施例的第一光阻斷層23A的厚度小於導光層25的厚度。此外,第一光阻斷層23A被導光層25部分覆蓋。Fig. 11C is a cross-sectional view showing a top emission type micro light-emitting diode display 500 according to a fourth modification of the present invention. The thickness of the first light blocking layer 23A of the embodiment shown in the eleventh C is smaller than the thickness of the light guiding layer 25 as compared with the eleventh B. Further, the first light blocking layer 23A is partially covered by the light guiding layer 25.

根據本實施例的特徵之一,發光區24內每一微發光二極體22相應的連接結構(未顯示於圖式)的圖樣都相同,且每一發光區24具有相同圖樣的連接結構。由於本實施例的發光區24內每一微發光二極體22相應的連接結構的圖樣都相同,且每一發光區24的連接結構的圖樣也相同,因此可以避免不均勻的顯示問題。According to one of the features of the present embodiment, the patterns of the respective connection structures (not shown in the drawings) of each of the micro-light-emitting diodes 22 in the light-emitting region 24 are the same, and each of the light-emitting regions 24 has the same pattern of connection structure. Since the patterns of the corresponding connection structures of the respective micro-light-emitting diodes 22 in the light-emitting region 24 of the present embodiment are the same, and the patterns of the connection structures of the respective light-emitting regions 24 are also the same, uneven display problems can be avoided.

第十二圖顯示本發明第五實施例之頂部發光型微發光二極體顯示器600的剖面圖。在本實施例中,頂部發光型微發光二極體顯示器600包含第一主基板21A與第二主基板21B,位於同一水平面但分別相應於各自的微發光二極體顯示面板。於第一主基板21A與第二主基板21B的頂面分別設有第一光阻斷層23A。類似於第四實施例的結構,頂部發光型微發光二極體顯示器600包含第二光阻斷層23B,形成於阻斷基板27的底面,用以覆蓋發光區24與第一光阻斷層23A以外的區域。如第十二圖所示,第一主基板21A與第二主基板21B對應於同一個阻斷基板27,且於第一主基板21A與第二主基板21B的相鄰處,第一主基板21A的第一光阻斷層23A與第二主基板21B的第一光阻斷層23A對應於同一個第二光阻斷層23B。藉此,可將複數微發光二極體顯示面板予以貼合(tiling)起來,形成一個無接縫(seamless)的頂部發光型微發光二極體顯示器600。Fig. 12 is a cross-sectional view showing a top emission type micro light-emitting diode display 600 according to a fifth embodiment of the present invention. In the present embodiment, the top-emitting micro-light-emitting diode display 600 includes a first main substrate 21A and a second main substrate 21B, which are located at the same horizontal plane but respectively correspond to the respective micro-light-emitting diode display panels. A first light blocking layer 23A is respectively disposed on the top surfaces of the first main substrate 21A and the second main substrate 21B. Similar to the structure of the fourth embodiment, the top-emitting micro-light-emitting diode display 600 includes a second light-blocking layer 23B formed on the bottom surface of the blocking substrate 27 for covering the light-emitting region 24 and the first light blocking layer. Areas other than 23A. As shown in the twelfth figure, the first main substrate 21A and the second main substrate 21B correspond to the same blocking substrate 27, and adjacent to the first main substrate 21A and the second main substrate 21B, the first main substrate The first light blocking layer 23A of 21A and the first light blocking layer 23A of the second main substrate 21B correspond to the same second light blocking layer 23B. Thereby, the plurality of micro-light-emitting diode display panels can be tiled to form a seamless top-emitting micro-light-emitting diode display 600.

第十三A圖至第十九B圖顯示本發明實施例之形成頂部發光型微發光二極體顯示器的各製程步驟的俯視圖與剖面圖。如第十三A圖與第十三B圖所示,首先提供(第一)主基板21A,其定義有一發光區24。如第十四A圖與第十四B圖所示,形成底共電極(bottom common electrode)層28於(第一)主基板21A的頂面。根據本發明實施例的特徵之一,底共電極層28係全面覆蓋發光區24,藉以避免不均勻的顯示問題。13A to 19B are plan views and cross-sectional views showing respective steps of forming a top emission type micro-light-emitting diode display according to an embodiment of the present invention. As shown in Figs. 13A and 13B, the (first) main substrate 21A is first provided, which defines a light-emitting region 24. As shown in Figs. 14A and 14B, a bottom common electrode layer 28 is formed on the top surface of the (first) main substrate 21A. According to one of the features of embodiments of the present invention, the bottom common electrode layer 28 substantially covers the light-emitting region 24 to avoid uneven display problems.

如第十五A圖與第十五B圖所示,使用結合(bonding)技術,於底共電極層28的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。如第十六A圖與第十六B圖所示,於發光區24以外的區域形成(第一)光阻斷層23A,用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度。As shown in FIG. 15A and FIG. 15B, a plurality of micro-light emitting diodes 22, such as a red micro-light emitting diode 22R, are disposed on the top surface of the bottom common electrode layer 28 using a bonding technique. The green micro-light-emitting diode 22G and the blue micro-light-emitting diode 22B. As shown in FIGS. 16A and 16B, a (first) light blocking layer 23A is formed in a region other than the light emitting region 24 to avoid mutual interference (for example, color mixing) between adjacent pixels, and Can improve contrast.

如第十七A圖與第十七B圖所示,於發光區24內形成導光層25,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。導光層25的厚度可大於微發光二極體22的厚度,如第十七B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。值得注意的是,形成(第一)光阻斷層23A的步驟(第十六A圖與第十六B圖)與形成導光層25的步驟(第十七A圖與第十七B圖)可以互換。As shown in FIGS. 17A and 17B, a light guiding layer 25 is formed in the light-emitting region 24 for expanding the light generated by the micro-light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24. The thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22. It is to be noted that the steps of forming the (first) light blocking layer 23A (the sixteenth A and sixteenth B) and the step of forming the light guiding layer 25 (the seventeenth A and the seventeenth Bth) ) can be interchanged.

如第十八A圖與第十八B圖所示,形成接觸洞(contact hole)於微發光二極體22的頂面。接著,如第十九A圖與第十九B圖所示,形成複數連接結構26,分別相應連接於該些微發光二極體22。其中,該些連接結構26的圖樣都相同,且每一發光區24具有相同圖樣的連接結構26。藉此,可以避免不均勻的顯示問題。As shown in FIG. 18A and FIG. 18B, a contact hole is formed on the top surface of the micro-light-emitting diode 22. Next, as shown in FIG. 19A and FIG. 19B, a plurality of connection structures 26 are formed, which are respectively connected to the micro-light-emitting diodes 22. The patterns of the connecting structures 26 are all the same, and each of the light-emitting regions 24 has the same pattern of connecting structures 26. Thereby, uneven display problems can be avoided.

第二十圖顯示底部發光型(bottom emission)微發光二極體顯示器100的簡化側視圖。在本實施例中,使用接合(bonding)技術,於主基板11的頂面設有複數微發光二極體12,例如紅色微發光二極體12R、綠色微發光二極體12G與藍色微發光二極體12B。該些微發光二極體12所產生的光線從主基板11的頂面向下發射(如箭號所示),因此稱為底部發光型微發光二極體顯示器。在本說明書中,微發光二極體的尺寸等級為1~10微米。然而,會因產品的應用領域或將來技術的發展而更小或更大。The twenty-fifth diagram shows a simplified side view of a bottom emission micro-light emitting diode display 100. In this embodiment, a plurality of micro-light emitting diodes 12 are disposed on the top surface of the main substrate 11 using a bonding technique, such as a red micro-light emitting diode 12R, a green micro-light emitting diode 12G, and a blue micro. Light-emitting diode 12B. The light generated by the micro-light-emitting diodes 12 is emitted downward from the top surface of the main substrate 11 (as indicated by an arrow), and is therefore referred to as a bottom-emission type micro-light-emitting diode display. In the present specification, the micro-light emitting diode has a size rating of 1 to 10 μm. However, it may be smaller or larger due to the application field of the product or the development of future technologies.

第二十一A圖顯示本發明第六實施例之底部發光型微發光二極體顯示器200的俯視圖,第二十一B圖顯示第二十一A圖的剖面圖。在本實施例中,於(第一)主基板21A的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。相鄰的微發光二極體22之間設有(第一)光阻斷(light blocking)層23A,形成於(第一)主基板21A的頂面,用以避免相鄰微發光二極體22之間的互相干擾(例如混色),且能增進對比度。微發光二極體22與光阻斷層23A之上可設有頂共電極(top common electrode)層28,其與光阻斷層23A之間藉由絕緣層29而彼此隔離。21A shows a plan view of a bottom emission type micro light-emitting diode display 200 according to a sixth embodiment of the present invention, and FIG. 21B shows a cross-sectional view of FIG. In this embodiment, a plurality of micro-light-emitting diodes 22, such as a red micro-light-emitting diode 22R, a green micro-light-emitting diode 22G, and a blue micro-light-emitting diode, are disposed on the top surface of the (first) main substrate 21A. Body 22B. A (first) light blocking layer 23A is disposed between the adjacent micro light emitting diodes 22, and is formed on the top surface of the (first) main substrate 21A to avoid adjacent micro light emitting diodes. Interference between 22 (such as color mixing), and can improve contrast. A top common electrode layer 28 may be disposed over the light-emitting diode 22 and the light blocking layer 23A, and is separated from the light blocking layer 23A by an insulating layer 29.

本實施例之(第一)光阻斷層23A可為黑矩陣(black matrix, BM)。在第二十一B圖所示實施例中,首先形成黑樹脂(black resin),再使用光學製程(photo process)及固化(curing)製程以形成黑矩陣(第一)光阻斷層23A。在另一實施例中,使用噴墨印刷(ink-jet printing)技術及固化製程以形成黑矩陣(第一)光阻斷層23A。The (first) light blocking layer 23A of the present embodiment may be a black matrix (BM). In the embodiment shown in FIG. 11B, a black resin is first formed, and an optical process and a curing process are used to form a black matrix (first) light blocking layer 23A. In another embodiment, an ink-jet printing technique and a curing process are used to form a black matrix (first) light blocking layer 23A.

(第一)光阻斷層23A定義出發光區(emission area)24,亦即,未被(第一)光阻斷層23A覆蓋的區域稱為發光區24。換另一角度來說,發光區24以外的所有區域都覆蓋有(第一)光阻斷層23A。於發光區24內,形成有導光(light guiding)層25,包含導光材質,用以擴張微發光二極體22所產生的光線。導光材質一般為透明材質,並具高折射係數。在本實施例中,導光層25係全面形成於發光區24內。The (first) light blocking layer 23A defines an emission area 24, that is, an area not covered by the (first) light blocking layer 23A is referred to as a light emitting area 24. On the other hand, all areas except the light-emitting area 24 are covered with the (first) light blocking layer 23A. In the light-emitting region 24, a light guiding layer 25 is formed, which comprises a light guiding material for expanding the light generated by the micro-light emitting diode 22. The light guiding material is generally a transparent material and has a high refractive index. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,(第一)光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第二十一B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the (first) light blocking layer 23A is larger than the thickness of the light guiding layer 25. In addition, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22, as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第二十一C圖顯示本發明變化型第六實施例之底部發光型微發光二極體顯示器200的剖面圖。相較於第二十一B圖,第二十一C圖所示實施例的(第一)光阻斷層23A的厚度小於導光層25的厚度。此外,(第一)光阻斷層23A與導光層25相鄰的區域互相部分重疊,且(第一)光阻斷層23A被導光層25部分覆蓋。在第二十一C圖所示實施例中,首先形成鉻/氧化鉻薄膜,再使用照相蝕刻(photo etching)技術以形成黑矩陣(第一)光阻斷層23A。Fig. 21C is a cross-sectional view showing the bottom emission type micro light-emitting diode display 200 of the sixth modification of the present invention. The thickness of the (first) light blocking layer 23A of the embodiment shown in the twenty-first C diagram is smaller than the thickness of the light guiding layer 25 as compared with the twenty-first B diagram. Further, the regions of the (first) light blocking layer 23A adjacent to the light guiding layer 25 partially overlap each other, and the (first) light blocking layer 23A is partially covered by the light guiding layer 25. In the embodiment shown in Fig. 21C, a chromium/chromia film is first formed, and a photo etching technique is used to form a black matrix (first) light blocking layer 23A.

第二十一D圖顯示本發明第六實施例之底部發光型微發光二極體顯示器200的另一俯視圖。每一個發光區24內包含有連接結構26,設於微發光二極體22與主基板21A之間。根據本發明實施例的特徵之一,每一個發光區24的連接結構26的圖樣(pattern)都相同。連接結構26的材質可為透明材質(例如氧化銦錫)、非透明材質(例如金屬)或反射(reflective)材質。由於本實施例每一個發光區24內具有相同圖樣的連接結構26,因此可以避免不均勻的顯示問題。The twenty-first D diagram shows another top view of the bottom emission type micro light-emitting diode display 200 of the sixth embodiment of the present invention. Each of the light-emitting regions 24 includes a connection structure 26 disposed between the micro-light-emitting diodes 22 and the main substrate 21A. According to one of the features of the embodiments of the present invention, the pattern of the connection structure 26 of each of the light-emitting regions 24 is the same. The material of the connecting structure 26 can be a transparent material (such as indium tin oxide), a non-transparent material (such as metal) or a reflective material. Since the light-emitting area 24 of this embodiment has the connection structure 26 of the same pattern, uneven display problems can be avoided.

第二十二A圖顯示本發明第七實施例之底部發光型微發光二極體顯示器300的俯視圖,第二十二B圖顯示第二十二A圖的剖面圖。本第七實施例類似於第六實施例,不同的地方在於,第七實施例的(第一)光阻斷層23A設於相鄰像素之間(而非相鄰的微發光二極體22之間),用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度。FIG. 22A is a plan view showing a bottom emission type micro light-emitting diode display 300 according to a seventh embodiment of the present invention, and FIG. 22B is a cross-sectional view showing a twenty-second A picture. The seventh embodiment is similar to the sixth embodiment, except that the (first) light blocking layer 23A of the seventh embodiment is disposed between adjacent pixels (instead of the adjacent micro-light emitting diodes 22). Between) to avoid mutual interference between adjacent pixels (for example, color mixing), and to improve contrast.

(第一)光阻斷層23A定義出發光區24,亦即,未被(第一)光阻斷層23A覆蓋的區域稱為發光區24(或像素區)。換另一角度來說,發光區24以外的所有區域都覆蓋有(第一)光阻斷層23A。在本實施例中,導光層25係全面形成於發光區24內。The (first) light blocking layer 23A defines the light emitting region 24, that is, the region not covered by the (first) light blocking layer 23A is referred to as a light emitting region 24 (or a pixel region). On the other hand, all areas except the light-emitting area 24 are covered with the (first) light blocking layer 23A. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,(第一)光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第二十二B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the (first) light blocking layer 23A is larger than the thickness of the light guiding layer 25. In addition, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22, as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第二十二C圖顯示本發明變化型第七實施例之底部發光型微發光二極體顯示器300的剖面圖。相較於第二十二B圖,第二十二C圖所示實施例的(第一)光阻斷層23A的厚度小於導光層25的厚度。此外,(第一)光阻斷層23A與導光層25相鄰的區域互相部分重疊,且(第一)光阻斷層23A被導光層25部分覆蓋。Fig. 22C is a cross-sectional view showing the bottom emission type micro light-emitting diode display 300 of the seventh modification of the present invention. The thickness of the (first) light blocking layer 23A of the embodiment shown in the twenty-second C-picture is smaller than the thickness of the light guiding layer 25 as compared with the twenty-second B-picture. Further, the regions of the (first) light blocking layer 23A adjacent to the light guiding layer 25 partially overlap each other, and the (first) light blocking layer 23A is partially covered by the light guiding layer 25.

第二十二D圖顯示本發明第七實施例之底部發光型微發光二極體顯示器300的另一俯視圖。每一個發光區24內包含有連接結構26。根據本發明實施例的特徵之一,發光區24內每一微發光二極體22相應的連接結構26的圖樣都相同,且每一發光區24具有相同圖樣的連接結構26。由於本實施例的發光區24內每一微發光二極體22相應的連接結構26的圖樣都相同,且每一發光區24的連接結構26的圖樣也相同,因此可以避免不均勻的顯示問題。The twenty-second D diagram shows another top view of the bottom emission type micro light-emitting diode display 300 of the seventh embodiment of the present invention. A connection structure 26 is included in each of the light-emitting areas 24. According to one of the features of the embodiments of the present invention, the respective connection structures 26 of each of the micro-light-emitting diodes 22 in the light-emitting region 24 have the same pattern, and each of the light-emitting regions 24 has the same pattern of connection structures 26. Since the patterns of the corresponding connection structures 26 of each of the micro-light-emitting diodes 22 in the light-emitting region 24 of the present embodiment are the same, and the patterns of the connection structures 26 of each of the light-emitting regions 24 are the same, uneven display problems can be avoided. .

第二十三A圖顯示本發明第八實施例之底部發光型微發光二極體顯示器400的俯視圖,第二十三B圖顯示第二十三A圖的剖面圖。在本實施例中,於(第一)主基板21A的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。每ㄧ微發光二極體22相應有一發光區24。本實施例包含框形的第一光阻斷層23A,其圍繞發光區24,且設於(第一)主基板21A的頂面。本實施例還包含阻斷基板27,位於(第一)主基板21A的下方。第二光阻斷層23B形成於阻斷基板27的頂面,其覆蓋發光區24與第一光阻斷層23A以外的區域。第一光阻斷層23A與第二光阻斷層23B相鄰的區域互相部分重疊。因此,第一光阻斷層23A的開口(aperture)內徑d1異於(例如小於)第二光阻斷層23B的開口內徑d2。在另一實施例中,第一光阻斷層23A的開口內徑可大於第二光阻斷層23B的開口內徑。本實施例之第一光阻斷層23A與第二光阻斷層23B可為黑矩陣(BM),阻斷基板27可為透光材質,例如石英、玻璃或塑膠材質。Fig. 23A shows a plan view of the bottom emission type micro light-emitting diode display 400 of the eighth embodiment of the present invention, and Fig. 23B shows a cross-sectional view of the twenty-third embodiment. In this embodiment, a plurality of micro-light-emitting diodes 22, such as a red micro-light-emitting diode 22R, a green micro-light-emitting diode 22G, and a blue micro-light-emitting diode, are disposed on the top surface of the (first) main substrate 21A. Body 22B. Each of the micro-light-emitting diodes 22 has a light-emitting region 24 corresponding thereto. This embodiment includes a frame-shaped first light blocking layer 23A that surrounds the light emitting region 24 and is disposed on the top surface of the (first) main substrate 21A. This embodiment further includes a blocking substrate 27 located below the (first) main substrate 21A. The second light blocking layer 23B is formed on the top surface of the blocking substrate 27, which covers the light emitting region 24 and a region other than the first light blocking layer 23A. The regions adjacent to the first light blocking layer 23A and the second light blocking layer 23B partially overlap each other. Therefore, the opening inner diameter d1 of the first light blocking layer 23A is different (for example, smaller than) the opening inner diameter d2 of the second light blocking layer 23B. In another embodiment, the opening inner diameter of the first light blocking layer 23A may be larger than the opening inner diameter of the second light blocking layer 23B. The first light blocking layer 23A and the second light blocking layer 23B of the embodiment may be a black matrix (BM), and the blocking substrate 27 may be a light transmissive material such as quartz, glass or plastic material.

於發光區24內,形成有導光層25,包含導光材質,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。A light guiding layer 25 is formed in the light emitting region 24, and includes a light guiding material for expanding the light generated by the micro light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,第一光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第二十三B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the first light blocking layer 23A is greater than the thickness of the light guiding layer 25. Further, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第二十三C圖顯示本發明變化型第八實施例之底部發光型微發光二極體顯示器400的剖面圖。相較於第二十三B圖,第二十三C圖所示實施例的第一光阻斷層23A的厚度小於導光層25的厚度。此外,第一光阻斷層23A被導光層25覆蓋。Fig. 23C is a cross-sectional view showing the bottom emission type micro light-emitting diode display 400 of the eighth modification of the present invention. The thickness of the first light blocking layer 23A of the embodiment shown in the twenty-third embodiment is smaller than the thickness of the light guiding layer 25 as compared with the twenty-third figure B. Further, the first light blocking layer 23A is covered by the light guiding layer 25.

根據本實施例的特徵之一,每一個發光區24內的連接結構(未顯示於圖式)的圖樣都相同。由於本實施例每一個發光區24內具有相同圖樣的連接結構,因此可以避免不均勻的顯示問題。According to one of the features of the embodiment, the pattern of the connection structure (not shown in the drawings) in each of the light-emitting regions 24 is the same. Since each of the light-emitting regions 24 of the present embodiment has the same pattern of connection structure, uneven display problems can be avoided.

第二十四A圖顯示本發明第九實施例之底部發光型微發光二極體顯示器500的俯視圖,第二十四B圖顯示第二十四A圖的剖面圖。本第九實施例類似於第八實施例,不同的地方在於,第九實施例的第一光阻斷層23A與第二光阻斷層23B設於相鄰像素之間(而非相鄰的微發光二極體22之間),用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度。Fig. 24A is a plan view showing a bottom emission type micro light-emitting diode display 500 according to a ninth embodiment of the present invention, and Fig. 24B is a sectional view showing a twenty-fourth A picture. The ninth embodiment is similar to the eighth embodiment except that the first light blocking layer 23A and the second light blocking layer 23B of the ninth embodiment are disposed between adjacent pixels (not adjacent). The micro-light-emitting diodes 22 are used to avoid mutual interference (for example, color mixing) between adjacent pixels, and the contrast can be improved.

在本實施例中,每ㄧ像素(其包含紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B)相應有一發光區24。本實施例包含框形的第一光阻斷層23A,其圍繞發光區24,且設於(第一)主基板21A的頂面。本實施例還包含第二光阻斷層23B,形成於阻斷基板27的頂面,用以覆蓋發光區24與第一光阻斷層23A以外的區域。第一光阻斷層23A與第二光阻斷層23B相鄰的區域,兩者互相部分重疊。因此,第一光阻斷層23A的開口內徑d1異於(例如小於)第二光阻斷層23B的開口內徑d2。本實施例之第一光阻斷層23A與第二光阻斷層23B可為黑矩陣(BM),阻斷基板27可為透光材質,例如石英、玻璃或塑膠材質。In the present embodiment, each of the pixels (which includes the red micro-light-emitting diode 22R, the green micro-light-emitting diode 22G, and the blue micro-light-emitting diode 22B) has a light-emitting region 24 corresponding thereto. This embodiment includes a frame-shaped first light blocking layer 23A that surrounds the light emitting region 24 and is disposed on the top surface of the (first) main substrate 21A. The embodiment further includes a second light blocking layer 23B formed on the top surface of the blocking substrate 27 for covering the light emitting region 24 and a region other than the first light blocking layer 23A. A region of the first light blocking layer 23A adjacent to the second light blocking layer 23B partially overlaps each other. Therefore, the opening inner diameter d1 of the first light blocking layer 23A is different (for example, smaller than) the opening inner diameter d2 of the second light blocking layer 23B. The first light blocking layer 23A and the second light blocking layer 23B of the embodiment may be a black matrix (BM), and the blocking substrate 27 may be a light transmissive material such as quartz, glass or plastic material.

於發光區24內,形成有導光層25,包含導光材質,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。A light guiding layer 25 is formed in the light emitting region 24, and includes a light guiding material for expanding the light generated by the micro light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24.

在本實施例中,第一光阻斷層23A的厚度大於導光層25的厚度。此外,導光層25的厚度可大於微發光二極體22的厚度,如第二十四B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。In the present embodiment, the thickness of the first light blocking layer 23A is greater than the thickness of the light guiding layer 25. Further, the thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22.

第二十四C圖顯示本發明變化型第九實施例之底部發光型微發光二極體顯示器500的剖面圖。相較於第二十四B圖,第二十四C圖所示實施例的第一光阻斷層23A的厚度小於導光層25的厚度。此外,第一光阻斷層23A被導光層25部分覆蓋。Fig. 24C is a cross-sectional view showing the bottom emission type micro light-emitting diode display 500 of the ninth embodiment of the present invention. The thickness of the first light blocking layer 23A of the embodiment shown in the twenty-fourth C diagram is smaller than the thickness of the light guiding layer 25 as compared with the twenty-fourth B diagram. Further, the first light blocking layer 23A is partially covered by the light guiding layer 25.

根據本實施例的特徵之一,發光區24內每一微發光二極體22相應的連接結構(未顯示於圖式)的圖樣都相同,且每一發光區24具有相同圖樣的連接結構。由於本實施例的發光區24內每一微發光二極體22相應的連接結構的圖樣都相同,且每一發光區24的連接結構的圖樣也相同,因此可以避免不均勻的顯示問題。According to one of the features of the present embodiment, the patterns of the respective connection structures (not shown in the drawings) of each of the micro-light-emitting diodes 22 in the light-emitting region 24 are the same, and each of the light-emitting regions 24 has the same pattern of connection structure. Since the patterns of the corresponding connection structures of the respective micro-light-emitting diodes 22 in the light-emitting region 24 of the present embodiment are the same, and the patterns of the connection structures of the respective light-emitting regions 24 are also the same, uneven display problems can be avoided.

第二十五圖顯示本發明第十實施例之底部發光型微發光二極體顯示器600的剖面圖。在本實施例中,底部發光型微發光二極體顯示器600包含第一主基板21A與第二主基板21B,位於同一水平面但分別相應於各自的微發光二極體顯示面板。於第一主基板21A與第二主基板21B的頂面分別設有第一光阻斷層23A。類似於第九實施例的結構,底部發光型微發光二極體顯示器600包含第二光阻斷層23B,形成於阻斷基板27的頂面,用以覆蓋發光區24與第一光阻斷層23A以外的區域。如第二十五圖所示,第一主基板21A與第二主基板21B對應於同一個阻斷基板27,且於第一主基板21A與第二主基板21B的相鄰處,第一主基板21A的第一光阻斷層23A與第二主基板21B的第一光阻斷層23A對應於同一個第二光阻斷層23B。藉此,可將複數微發光二極體顯示面板予以貼合(tiling)起來,形成一個無接縫(seamless)的底部發光型微發光二極體顯示器600。Fig. 25 is a cross-sectional view showing a bottom emission type micro light-emitting diode display 600 of a tenth embodiment of the present invention. In the present embodiment, the bottom emission type micro-light-emitting diode display 600 includes a first main substrate 21A and a second main substrate 21B, which are located at the same horizontal plane but respectively correspond to the respective micro-light-emitting diode display panels. A first light blocking layer 23A is respectively disposed on the top surfaces of the first main substrate 21A and the second main substrate 21B. Similar to the structure of the ninth embodiment, the bottom emission type micro light emitting diode display 600 includes a second light blocking layer 23B formed on the top surface of the blocking substrate 27 for covering the light emitting region 24 and the first light blocking An area other than layer 23A. As shown in the twenty-fifth figure, the first main substrate 21A and the second main substrate 21B correspond to the same blocking substrate 27, and adjacent to the first main substrate 21A and the second main substrate 21B, the first main The first light blocking layer 23A of the substrate 21A and the first light blocking layer 23A of the second main substrate 21B correspond to the same second light blocking layer 23B. Thereby, the plurality of micro-light-emitting diode display panels can be tiling to form a seamless bottom-emitting micro-light-emitting diode display 600.

第二十六A圖至第三十二B圖顯示本發明實施例之形成底部發光型微發光二極體顯示器的各製程步驟的俯視圖與剖面圖。如第二十六A圖與第二十六B圖所示,首先提供(第一)主基板21A,其定義有一發光區24。如第二十七A圖與第二十七B圖所示,形成複數連接結構26。其中,該些連接結構26的圖樣都相同,且每一發光區24具有相同圖樣的連接結構26。藉此,可以避免不均勻的顯示問題。26A to 32B show top and cross-sectional views of respective process steps for forming a bottom emission type micro-light-emitting diode display according to an embodiment of the present invention. As shown in the twenty-sixth and twenty-sixth B, the (first) main substrate 21A is first provided, which defines a light-emitting region 24. As shown in the twenty-seventh A and twenty-seventh B, a plurality of connection structures 26 are formed. The patterns of the connecting structures 26 are all the same, and each of the light-emitting regions 24 has the same pattern of connecting structures 26. Thereby, uneven display problems can be avoided.

如第二十八A圖與第二十八B圖所示,使用結合(bonding)技術,於連接結構26的頂面設有複數微發光二極體22,例如紅色微發光二極體22R、綠色微發光二極體22G與藍色微發光二極體22B。如第二十九A圖與第二十九B圖所示,於發光區24以外的區域形成(第一)光阻斷層23A,用以避免相鄰像素之間的互相干擾(例如混色),且能增進對比度,再於光阻斷層23A上形成絕緣層29。As shown in FIG. 28A and FIG. 28B, a plurality of micro-light-emitting diodes 22, such as a red micro-light-emitting diode 22R, are disposed on the top surface of the connection structure 26 using a bonding technique. The green micro-light-emitting diode 22G and the blue micro-light-emitting diode 22B. As shown in FIG. 29A and FIG. 29B, the (first) light blocking layer 23A is formed in a region other than the light emitting region 24 to avoid mutual interference between adjacent pixels (for example, color mixing). And the contrast can be enhanced, and the insulating layer 29 is formed on the light blocking layer 23A.

如第三十A圖與第三十B圖所示,於發光區24內形成導光層25,用以擴張微發光二極體22所產生的光線。在本實施例中,導光層25係全面形成於發光區24內。導光層25的厚度可大於微發光二極體22的厚度,如第三十B圖所示。然而,在其他實施例中,導光層25的厚度可小於或等於微發光二極體22的厚度。值得注意的是,形成(第一)光阻斷層23A的步驟(第二十九A圖與第二十九B圖)與形成導光層25的步驟(第三十A圖與第三十B圖)可以互換。As shown in FIG. 30A and FIG. 30B, a light guiding layer 25 is formed in the light emitting region 24 for expanding the light generated by the micro light emitting diode 22. In the present embodiment, the light guiding layer 25 is formed entirely in the light emitting region 24. The thickness of the light guiding layer 25 may be greater than the thickness of the micro light emitting diode 22 as shown in FIG. However, in other embodiments, the thickness of the light guiding layer 25 may be less than or equal to the thickness of the micro light emitting diode 22. It is noted that the steps of forming the (first) light blocking layer 23A (the twenty-ninth A picture and the twenty-ninth B picture) and the step of forming the light guiding layer 25 (thirtieth A and thirtieth) B) can be interchanged.

如第三十一A圖與第三十一B圖所示,形成接觸洞(contact hole)於微發光二極體22的頂面。接著,如第三十二A圖與第三十二B圖所示,形成頂共電極(top common electrode)層28於絕緣層29與導光層25的上方。根據本發明實施例的特徵之一,頂共電極層28係全面覆蓋發光區24,藉以避免不均勻的顯示問題。As shown in FIG. 31A and FIG. 31B, a contact hole is formed on the top surface of the micro-light-emitting diode 22. Next, as shown in FIG. 32A and FIG. 32B, a top common electrode layer 28 is formed over the insulating layer 29 and the light guiding layer 25. According to one of the features of the embodiments of the present invention, the top common electrode layer 28 completely covers the light-emitting area 24 to avoid uneven display problems.

以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。The above description is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention; all other equivalent changes or modifications which are not departing from the spirit of the invention should be included in the following Within the scope of the patent application.

9100‧‧‧微發光二極體顯示面板9100‧‧‧Micro LED display panel

9101‧‧‧次區域9101‧‧‧ subregion

9300‧‧‧正面發光的微發光二極體顯示面板9300‧‧‧Front-emitting micro-light emitting diode display panel

9400‧‧‧背面發光的微發光二極體顯示面板9400‧‧‧Backlight-emitting micro-light emitting diode display panel

911‧‧‧基板911‧‧‧Substrate

912‧‧‧驅動器912‧‧‧ drive

9121‧‧‧行驅動電路9121‧‧‧ drive circuit

91211‧‧‧行導線91211‧‧‧ wire

9122‧‧‧列驅動電路9122‧‧‧ column drive circuit

91221‧‧‧列導線91221‧‧‧Wires

913‧‧‧時序控制器913‧‧‧Sequence Controller

914‧‧‧微發光二極體914‧‧‧microluminescent diode

914R‧‧‧紅色微發光二極體914R‧‧‧Red micro-light emitting diode

914G‧‧‧綠色微發光二極體914G‧‧‧Green micro-light emitting diode

914B‧‧‧藍色微發光二極體914B‧‧‧Blue micro-light emitting diode

915‧‧‧走線層915‧‧‧Line layer

916‧‧‧光阻斷層916‧‧‧Light blocking layer

917‧‧‧導光層917‧‧‧Light guide layer

918‧‧‧蓋板918‧‧‧ cover

9110‧‧‧凹陷部9110‧‧‧Depression

h1‧‧‧深度H1‧‧‧depth

h2‧‧‧深度H2‧‧‧depth

h3‧‧‧深度H3‧‧‧depth

100‧‧‧頂部發光型微發光二極體顯示器100‧‧‧Top-emitting micro-light emitting diode display

200‧‧‧頂部發光型微發光二極體顯示器200‧‧‧Top-emitting micro-light emitting diode display

300‧‧‧頂部發光型微發光二極體顯示器300‧‧‧Top-emitting micro-light emitting diode display

400‧‧‧頂部發光型微發光二極體顯示器400‧‧‧Top-emitting micro-light emitting diode display

500‧‧‧頂部發光型微發光二極體顯示器500‧‧‧Top-emitting micro-light emitting diode display

600‧‧‧頂部發光型微發光二極體顯示器600‧‧‧Top-emitting micro-light emitting diode display

1400‧‧‧底部發光型微發光二極體顯示器1400‧‧‧Bottom-emitting micro-light emitting diode display

1500‧‧‧底部發光型微發光二極體顯示器1500‧‧‧Bottom-emitting micro-light emitting diode display

1600‧‧‧底部發光型微發光二極體顯示器1600‧‧‧Bottom-emitting micro-light emitting diode display

1700‧‧‧底部發光型微發光二極體顯示器1700‧‧‧Bottom-emitting micro-light emitting diode display

1800‧‧‧底部發光型微發光二極體顯示器1800‧‧‧Bottom-emitting micro-light emitting diode display

1900‧‧‧底部發光型微發光二極體顯示器1900‧‧‧Bottom-emitting micro-light emitting diode display

11‧‧‧主基板11‧‧‧Main substrate

12‧‧‧微發光二極體12‧‧‧microluminescent diode

12R‧‧‧紅色微發光二極體12R‧‧‧Red micro-light emitting diode

12G‧‧‧綠色微發光二極體12G‧‧‧Green micro-light emitting diode

12B‧‧‧藍色微發光二極體12B‧‧‧Blue micro-light emitting diode

21A‧‧‧第一主基板21A‧‧‧First main substrate

21B‧‧‧第二主基板21B‧‧‧Second main substrate

22‧‧‧微發光二極體22‧‧‧microluminescent diode

22R‧‧‧紅色微發光二極體22R‧‧‧Red micro-light emitting diode

22G‧‧‧綠色微發光二極體22G‧‧‧Green micro-light emitting diode

22B‧‧‧藍色微發光二極體22B‧‧‧Blue micro-light emitting diode

23A‧‧‧第一光阻斷層23A‧‧‧First light blocking layer

23B‧‧‧第二光阻斷層23B‧‧‧Second light blocking layer

24‧‧‧發光區24‧‧‧Lighting area

25‧‧‧導光層25‧‧‧Light guide layer

26‧‧‧連接結構26‧‧‧ Connection structure

27‧‧‧阻斷基板27‧‧‧Blocking the substrate

28‧‧‧(底/頂)共電極層28‧‧‧(bottom/top) common electrode layer

29‧‧‧絕緣層29‧‧‧Insulation

d1‧‧‧開口內徑D1‧‧‧opening inner diameter

d2‧‧‧開口內徑D2‧‧‧opening inner diameter

第一A圖顯示本發明實施例之微發光二極體顯示面板的俯視圖。 第一B圖顯示第一A圖之微發光二極體顯示面板的側視圖。 第二圖顯示被動驅動方式的微發光二極體顯示面板的示意圖。 第三圖顯示本發明第一特定實施例之正面發光的微發光二極體顯示面板的剖視圖。 第四圖顯示本發明第二特定實施例之背面發光的微發光二極體顯示面板的剖視圖。 第五圖顯示基板、驅動器與微發光二極體的局部放大側視圖。 第六A圖顯示本發明實施例之微發光二極體顯示面板的局部放大側視圖。 第六B圖顯示本發明另一實施例之微發光二極體顯示面板的局部放大側視圖。 第六C圖顯示本發明又一實施例之微發光二極體顯示面板的局部放大側視圖。 第七圖顯示頂部發光型微發光二極體顯示器的簡化側視圖。 第八A圖顯示本發明第一實施例之頂部發光型微發光二極體顯示器的俯視圖。 第八B圖顯示第八A圖的剖面圖。 第八C圖顯示本發明變化型第一實施例之頂部發光型微發光二極體顯示器的剖面圖。 第八D圖顯示本發明第一實施例之頂部發光型微發光二極體顯示器的另一俯視圖。 第九A圖顯示本發明第二實施例之頂部發光型微發光二極體顯示器的俯視圖。 第九B圖顯示第九A圖的剖面圖。 第九C圖顯示本發明變化型第二實施例之頂部發光型微發光二極體顯示器的剖面圖。 第九D圖顯示本發明第二實施例之頂部發光型微發光二極體顯示器的另一俯視圖。 第十A圖顯示本發明第三實施例之頂部發光型微發光二極體顯示器的俯視圖。 第十B圖顯示第十A圖的剖面圖。 第十C圖顯示本發明變化型第三實施例之頂部發光型微發光二極體顯示器的剖面圖。 第十一A圖顯示本發明第四實施例之頂部發光型微發光二極體顯示器的俯視圖。 第十一B圖顯示第十一A圖的剖面圖。 第十一C圖顯示本發明變化型第四實施例之頂部發光型微發光二極體顯示器的剖面圖。 第十二圖顯示本發明第五實施例之頂部發光型微發光二極體顯示器的剖面圖。 第十三A圖至第十九B圖顯示本發明實施例之形成頂部發光型微發光二極體顯示器的各製程步驟的俯視圖與剖面圖。 第二十圖顯示底部發光型微發光二極體顯示器的簡化側視圖。 第二十一A圖顯示本發明第六實施例之底部發光型微發光二極體顯示器的俯視圖。 第二十一B圖顯示第二十一A圖的剖面圖。 第二十一C圖顯示本發明變化型第六實施例之底部發光型微發光二極體顯示器的剖面圖。 第二十一D圖顯示本發明第六實施例之底部發光型微發光二極體顯示器的另一俯視圖。 第二十二A圖顯示本發明第七實施例之底部發光型微發光二極體顯示器的俯視圖。 第二十二B圖顯示第二十二A圖的剖面圖。 第二十二C圖顯示本發明變化型第七實施例之底部發光型微發光二極體顯示器的剖面圖。 第二十二D圖顯示本發明第七實施例之底部發光型微發光二極體顯示器的另一俯視圖。 第二十三A圖顯示本發明第八實施例之底部發光型微發光二極體顯示器的俯視圖。 第二十三B圖顯示第二十三A圖的剖面圖。 第二十三C圖顯示本發明變化型第八實施例之底部發光型微發光二極體顯示器的剖面圖。 第二十四A圖顯示本發明第九實施例之底部發光型微發光二極體顯示器的俯視圖。 第二十四B圖顯示第二十四A圖的剖面圖。 第二十四C圖顯示本發明變化型第九實施例之底部發光型微發光二極體顯示器的剖面圖。 第二十五圖顯示本發明第十實施例之底部發光型微發光二極體顯示器的剖面圖。 第二十六A圖至第三十二B圖顯示本發明實施例之形成底部發光型微發光二極體顯示器的各製程步驟的俯視圖與剖面圖。FIG. 1A is a plan view showing a micro-light emitting diode display panel according to an embodiment of the present invention. The first B-picture shows a side view of the micro-light-emitting diode display panel of the first A-picture. The second figure shows a schematic diagram of a passively driven micro-light emitting diode display panel. The third figure shows a cross-sectional view of a front-illuminated micro-light-emitting diode display panel in accordance with a first specific embodiment of the present invention. The fourth figure shows a cross-sectional view of a back-illuminated micro-light emitting diode display panel in accordance with a second specific embodiment of the present invention. The fifth figure shows a partial enlarged side view of the substrate, the driver and the micro-light emitting diode. Figure 6A is a partially enlarged side elevational view showing the micro-light emitting diode display panel of the embodiment of the present invention. Fig. 6B is a partially enlarged side elevational view showing the micro-light emitting diode display panel of another embodiment of the present invention. Figure 6C is a partially enlarged side elevational view showing a micro-light emitting diode display panel according to still another embodiment of the present invention. The seventh figure shows a simplified side view of a top-emitting micro-light emitting diode display. Fig. 8A is a plan view showing a top emission type micro light-emitting diode display of the first embodiment of the present invention. Figure 8B shows a cross-sectional view of the eighth A diagram. Figure 8C is a cross-sectional view showing a top emission type micro light-emitting diode display of a variation first embodiment of the present invention. The eighth D diagram shows another top view of the top emission type micro light emitting diode display of the first embodiment of the present invention. Fig. 9A is a plan view showing a top emission type micro light-emitting diode display of a second embodiment of the present invention. Figure IXB shows a cross-sectional view of Figure IX. Figure IX is a cross-sectional view showing a top emission type micro light-emitting diode display of a second modification of the present invention. The ninth D diagram shows another top view of the top emission type micro light emitting diode display of the second embodiment of the present invention. Fig. 10A is a plan view showing a top emission type micro light-emitting diode display of a third embodiment of the present invention. Figure 10B shows a cross-sectional view of the tenth A. Fig. C is a cross-sectional view showing a top emission type micro light-emitting diode display of a third modification of the present invention. Fig. 11A is a plan view showing a top emission type micro light-emitting diode display of a fourth embodiment of the present invention. Figure 11B shows a cross-sectional view of Figure 11A. Fig. 11C is a cross-sectional view showing a top emission type micro light-emitting diode display of a variation fourth embodiment of the present invention. Fig. 12 is a cross-sectional view showing a top emission type micro light-emitting diode display according to a fifth embodiment of the present invention. 13A to 19B are plan views and cross-sectional views showing respective steps of forming a top emission type micro-light-emitting diode display according to an embodiment of the present invention. Figure 20 shows a simplified side view of a bottom-emitting micro-light emitting diode display. Fig. 21A is a plan view showing a bottom emission type micro light-emitting diode display of a sixth embodiment of the present invention. The twenty-first B diagram shows a cross-sectional view of the twenty-first A diagram. Fig. 21C is a cross-sectional view showing a bottom emission type micro light-emitting diode display of a sixth modification of the present invention. The twenty-first D diagram shows another top view of the bottom emission type micro light-emitting diode display of the sixth embodiment of the present invention. Fig. 22A is a plan view showing a bottom emission type micro light-emitting diode display of a seventh embodiment of the present invention. Figure 22B shows a cross-sectional view of the twenty-second A diagram. Fig. 22C is a cross-sectional view showing the bottom emission type micro light-emitting diode display of the seventh modification of the present invention. The twenty-second D diagram shows another top view of the bottom emission type micro light-emitting diode display of the seventh embodiment of the present invention. Fig. 23A is a plan view showing a bottom emission type micro light-emitting diode display of an eighth embodiment of the present invention. Figure 23B shows a cross-sectional view of Figure 23A. Fig. 23 is a cross-sectional view showing the bottom emission type micro light-emitting diode display of the eighth embodiment of the present invention. Fig. 24A is a plan view showing a bottom emission type micro light-emitting diode display of a ninth embodiment of the present invention. The twenty-fourth B diagram shows a cross-sectional view of the twenty-fourth A diagram. Fig. 24C is a cross-sectional view showing the bottom emission type micro light-emitting diode display of the ninth embodiment of the present invention. Fig. 25 is a cross-sectional view showing a bottom emission type micro light-emitting diode display of a tenth embodiment of the present invention. 26A to 32B show top and cross-sectional views of respective process steps for forming a bottom emission type micro-light-emitting diode display according to an embodiment of the present invention.

Claims (56)

一種頂部發光型微發光二極體顯示器,包含: 一第一主基板; 一底共電極層,設於該第一主基板的頂面; 複數微發光二極體,設於該底共電極層之上; 一第一光阻斷層,設於該底共電極層的上方,以定義複數發光區; 一導光層,設於該些發光區內;及 複數連接結構,設於該些發光區內且分別電性連接於該些微發光二極體。A top-emitting micro-light-emitting diode display comprising: a first main substrate; a bottom common electrode layer disposed on a top surface of the first main substrate; and a plurality of micro-light emitting diodes disposed on the bottom common electrode layer a first light blocking layer disposed above the bottom common electrode layer to define a plurality of light emitting regions; a light guiding layer disposed in the light emitting regions; and a plurality of connecting structures disposed on the light emitting regions The regions are electrically connected to the micro-light emitting diodes. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該些連接結構具相同圖樣。The top emission type micro light emitting diode display according to claim 1, wherein the connection structures have the same pattern. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該些連接結構包含透明材質。The top-emitting micro-light emitting diode display according to claim 1, wherein the connection structures comprise a transparent material. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該些連接結構包含非透明材質。The top-emitting micro-light emitting diode display according to claim 1, wherein the connection structures comprise a non-transparent material. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該第一光阻斷層為黑矩陣。The top emission type micro light emitting diode display according to claim 1, wherein the first light blocking layer is a black matrix. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該第一光阻斷層的厚度大於該導光層的厚度。The top emission type micro light emitting diode display according to claim 1, wherein the first light blocking layer has a thickness greater than a thickness of the light guiding layer. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該第一光阻斷層的厚度小於該導光層的厚度,該第一光阻斷層與該導光層相鄰的區域互相部分重疊,且該第一光阻斷層被該導光層部分覆蓋。The top emission type micro light emitting diode display according to claim 1, wherein the first light blocking layer has a thickness smaller than a thickness of the light guiding layer, and the first light blocking layer and the light guiding layer Adjacent regions partially overlap each other, and the first light blocking layer is partially covered by the light guiding layer. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中每ㄧ該發光區相應於一微發光二極體。The top-emitting micro-light-emitting diode display of claim 1, wherein each of the light-emitting regions corresponds to a micro-light emitting diode. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中每ㄧ該發光區相應於一紅色微發光二極體、一綠色微發光二極體與一藍色微發光二極體。The top-emitting micro-light-emitting diode display according to claim 1, wherein each of the light-emitting regions corresponds to a red micro-light emitting diode, a green micro-light emitting diode and a blue micro-light emitting diode Polar body. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該發光區內的紅色微發光二極體、綠色微發光二極體與藍色微發光二極體分別相應於相同圖樣的連接結構。The top emission type micro light emitting diode display according to claim 1, wherein the red micro light emitting diode, the green micro light emitting diode and the blue micro light emitting diode in the light emitting region respectively correspond to The connection structure of the same pattern. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該連接結構全面形成於該發光區內。The top emission type micro light emitting diode display according to claim 1, wherein the connection structure is formed entirely in the light emitting region. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,更包含: 一阻斷基板,位於該第一主基板與該第一光阻斷層的上方;及 一第二光阻斷層,形成於該阻斷基板的底面,該第二光阻斷層覆蓋該發光區與該第一光阻斷層以外的區域; 其中該第一光阻斷層具框形以圍繞該發光區,該第一光阻斷層與該第二光阻斷層相鄰的區域互相部分重疊。The top-emitting micro-light-emitting diode display according to claim 1, further comprising: a blocking substrate located above the first main substrate and the first light blocking layer; and a second light a blocking layer formed on a bottom surface of the blocking substrate, the second light blocking layer covering the light emitting region and a region other than the first light blocking layer; wherein the first light blocking layer has a frame shape to surround the In the light emitting region, the regions of the first light blocking layer adjacent to the second light blocking layer partially overlap each other. 根據申請專利範圍第12項所述之頂部發光型微發光二極體顯示器,其中該第一光阻斷層的開口內徑異於該第二光阻斷層的開口內徑。The top emission type micro light emitting diode display according to claim 12, wherein an opening inner diameter of the first light blocking layer is different from an opening inner diameter of the second light blocking layer. 根據申請專利範圍第12項所述之頂部發光型微發光二極體顯示器,其中該第二光阻斷層為黑矩陣。The top emission type micro light emitting diode display according to claim 12, wherein the second light blocking layer is a black matrix. 根據申請專利範圍第12項所述之頂部發光型微發光二極體顯示器,其中該阻斷基板的材質包含透光材質。The top-emitting micro-light-emitting diode display according to claim 12, wherein the material of the blocking substrate comprises a light-transmitting material. 根據申請專利範圍第12項所述之頂部發光型微發光二極體顯示器,更包含: 一第二主基板,與該第一主基板位於同一水平面,但分別相應於各自的微發光二極體顯示面板,該第一主基板與該第二主基板之上分別設有第一光阻斷層; 其中該第一主基板與該第二主基板對應於同一個阻斷基板,且於該第一主基板與該第二主基板的相鄰處,該第一主基板的第一光阻斷層與該第二主基板的第一光阻斷層對應於同一個第二光阻斷層。The top-emitting micro-light-emitting diode display according to claim 12, further comprising: a second main substrate at the same horizontal plane as the first main substrate, but corresponding to the respective micro-light-emitting diodes a first light blocking layer is disposed on the first main substrate and the second main substrate, wherein the first main substrate and the second main substrate correspond to the same blocking substrate, and Adjacent to the second main substrate, the first light blocking layer of the first main substrate and the first light blocking layer of the second main substrate correspond to the same second light blocking layer. 根據申請專利範圍第1項所述之頂部發光型微發光二極體顯示器,其中該些微發光二極體為長方形,且垂直縱列設置。The top-emitting micro-light-emitting diode display according to claim 1, wherein the micro-light-emitting diodes are rectangular and arranged in a vertical column. 一種形成頂部發光型微發光二極體顯示器的方法,包含: 提供一第一主基板; 形成複數微發光二極體於該第一主基板之上; 形成第一光阻斷層於該第一主基板的上方,以定義複數發光區; 形成一導光層於該些發光區內;及 形成複數連接結構於該些發光區內且分別電性連接於該些微發光二極體。A method for forming a top-emitting micro-light-emitting diode display, comprising: providing a first main substrate; forming a plurality of micro-light-emitting diodes on the first main substrate; forming a first light-blocking layer on the first An upper portion of the main substrate defines a plurality of light-emitting regions; a light guiding layer is formed in the light-emitting regions; and a plurality of connecting structures are formed in the light-emitting regions and electrically connected to the micro-light emitting diodes. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中該些連接結構具相同圖樣。A method of forming a top emission type micro-light-emitting diode display according to claim 18, wherein the connection structures have the same pattern. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中該些連接結構包含透明材質。A method of forming a top emission type micro light emitting diode display according to claim 18, wherein the connection structures comprise a transparent material. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中該些連接結構包含非透明材質。A method of forming a top-emitting micro-light-emitting diode display according to claim 18, wherein the connection structures comprise a non-transparent material. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,於形成該些微發光二極體之前,更全面形成一導電層於該第一主基板的複數發光區內。According to the method of forming a top-emitting micro-light-emitting diode display according to claim 18, before forming the micro-light-emitting diodes, a conductive layer is more completely formed in the plurality of light-emitting regions of the first main substrate. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,於形成該些連接結構之前,更形成接觸洞於該些微發光二極體的頂面。According to the method of forming the top-emitting type micro-light-emitting diode display according to claim 18, before the formation of the connection structures, contact holes are formed on the top surfaces of the micro-light-emitting diodes. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中該第一光阻斷層為黑矩陣。A method of forming a top emission type micro light emitting diode display according to claim 18, wherein the first light blocking layer is a black matrix. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中該發光區內的紅色微發光二極體、綠色微發光二極體與藍色微發光二極體分別相應於相同圖樣的連接結構。A method for forming a top-emitting micro-light-emitting diode display according to claim 18, wherein the red micro-light emitting diode, the green micro-light emitting diode, and the blue micro-light emitting diode in the light-emitting region are respectively Corresponding to the connection structure of the same pattern. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 形成黑樹脂;及 使用光學製程及固化製程處理該黑樹脂,以形成黑矩陣光阻斷層。A method of forming a top emission type micro light emitting diode display according to claim 18, wherein the step of forming the first light blocking layer comprises: forming a black resin; and processing the black resin using an optical process and a curing process To form a black matrix light blocking layer. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 使用噴墨印刷技術及固化製程以形成黑矩陣光阻斷層。A method of forming a top emission type micro light emitting diode display according to claim 18, wherein the step of forming the first light blocking layer comprises: using an inkjet printing technique and a curing process to form a black matrix light blocking Floor. 根據申請專利範圍第18項所述形成頂部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 形成鉻/氧化鉻薄膜;及 使用照相蝕刻技術處理該鉻/氧化鉻薄膜,以形成黑矩陣光阻斷層。A method of forming a top emission type micro light emitting diode display according to claim 18, wherein the step of forming the first light blocking layer comprises: forming a chromium/chromia film; and treating the chromium using a photo etching technique / chrome oxide film to form a black matrix light blocking layer. 一種底部發光型微發光二極體顯示器,包含: 一第一主基板; 複數微發光二極體,設於該第一主基板之上; 一第一光阻斷層,設於該第一主基板的上方,以定義複數發光區; 一導光層,設於該些發光區內; 複數連接結構,設於該些發光區內且分別電性連接於該些微發光二極體;及 一頂共電極層,設於該第一光阻斷層與該些微發光二極體的頂面。A bottom-emitting micro-light-emitting diode display, comprising: a first main substrate; a plurality of micro-light emitting diodes disposed on the first main substrate; a first light blocking layer disposed on the first main a plurality of light-emitting regions are defined above the substrate; a light guiding layer is disposed in the light-emitting regions; a plurality of connecting structures are disposed in the light-emitting regions and electrically connected to the micro-light emitting diodes respectively; and a top portion The common electrode layer is disposed on the top surface of the first light blocking layer and the micro light emitting diodes. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該些連接結構具相同圖樣。The bottom emission type micro light emitting diode display according to claim 29, wherein the connection structures have the same pattern. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該些連接結構包含透明材質。The bottom emission type micro light emitting diode display according to claim 29, wherein the connection structures comprise a transparent material. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該些連接結構包含非透明材質。The bottom emission type micro light emitting diode display according to claim 29, wherein the connection structures comprise a non-transparent material. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該第一光阻斷層為黑矩陣。The bottom emission type micro light emitting diode display according to claim 29, wherein the first light blocking layer is a black matrix. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該第一光阻斷層的厚度大於該導光層的厚度。The bottom emission type micro light emitting diode display according to claim 29, wherein the thickness of the first light blocking layer is greater than the thickness of the light guiding layer. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該第一光阻斷層的厚度小於該導光層的厚度,該第一光阻斷層與該導光層相鄰的區域互相部分重疊,且該第一光阻斷層被該導光層部分覆蓋。The bottom emission type micro light emitting diode display according to claim 29, wherein the first light blocking layer has a thickness smaller than a thickness of the light guiding layer, the first light blocking layer and the light guiding layer Adjacent regions partially overlap each other, and the first light blocking layer is partially covered by the light guiding layer. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中每ㄧ該發光區相應於一微發光二極體。A bottom-emitting micro-light-emitting diode display according to claim 29, wherein each of the light-emitting regions corresponds to a micro-light emitting diode. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中每ㄧ該發光區相應於一紅色微發光二極體、一綠色微發光二極體與一藍色微發光二極體。The bottom emission type micro light emitting diode display according to claim 29, wherein each of the light emitting regions corresponds to a red micro light emitting diode, a green micro light emitting diode and a blue micro light emitting diode Polar body. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該發光區內的紅色微發光二極體、綠色微發光二極體與藍色微發光二極體分別相應於相同圖樣的連接結構。The bottom emission type micro light emitting diode display according to claim 29, wherein the red micro light emitting diode, the green micro light emitting diode and the blue micro light emitting diode in the light emitting region respectively correspond to The connection structure of the same pattern. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該連接結構全面形成於該發光區內。The bottom emission type micro light emitting diode display according to claim 29, wherein the connection structure is formed entirely in the light emitting region. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,更包含: 一阻斷基板,位於該第一主基板的下方;及 一第二光阻斷層,形成於該阻斷基板的頂面,該第二光阻斷層覆蓋該發光區與該第一光阻斷層以外的區域; 其中該第一光阻斷層具框形以圍繞該發光區,該第一光阻斷層與該第二光阻斷層相鄰的區域互相部分重疊。The bottom-emitting micro-light-emitting diode display according to claim 29, further comprising: a blocking substrate located below the first main substrate; and a second light blocking layer formed on the resistor Breaking a top surface of the substrate, the second light blocking layer covers the light emitting region and a region other than the first light blocking layer; wherein the first light blocking layer has a frame shape to surround the light emitting region, the first light The regions of the blocking layer adjacent to the second light blocking layer partially overlap each other. 根據申請專利範圍第40項所述之底部發光型微發光二極體顯示器,其中該第一光阻斷層的開口內徑異於該第二光阻斷層的開口內徑。The bottom emission type micro light emitting diode display according to claim 40, wherein an opening inner diameter of the first light blocking layer is different from an opening inner diameter of the second light blocking layer. 根據申請專利範圍第40項所述之底部發光型微發光二極體顯示器,其中該第二光阻斷層為黑矩陣。The bottom emission type micro light emitting diode display according to claim 40, wherein the second light blocking layer is a black matrix. 根據申請專利範圍第40項所述之底部發光型微發光二極體顯示器,其中該阻斷基板的材質包含透光材質。The bottom-emitting micro-light-emitting diode display according to claim 40, wherein the material of the blocking substrate comprises a light-transmitting material. 根據申請專利範圍第40項所述之底部發光型微發光二極體顯示器,更包含: 一第二主基板,與該第一主基板位於同一水平面,但分別相應於各自的微發光二極體顯示面板,該第一主基板與該第二主基板之上分別設有第一光阻斷層; 其中該第一主基板與該第二主基板對應於同一個阻斷基板,且於該第一主基板與該第二主基板的相鄰處,該第一主基板的第一光阻斷層與該第二主基板的第一光阻斷層對應於同一個第二光阻斷層。The bottom-emitting micro-light-emitting diode display according to claim 40, further comprising: a second main substrate located at the same horizontal plane as the first main substrate, but corresponding to the respective micro-light emitting diodes a first light blocking layer is disposed on the first main substrate and the second main substrate, wherein the first main substrate and the second main substrate correspond to the same blocking substrate, and Adjacent to the second main substrate, the first light blocking layer of the first main substrate and the first light blocking layer of the second main substrate correspond to the same second light blocking layer. 根據申請專利範圍第29項所述之底部發光型微發光二極體顯示器,其中該些微發光二極體為長方形,且垂直縱列設置。The bottom-emitting micro-light-emitting diode display according to claim 29, wherein the micro-light-emitting diodes are rectangular and arranged in a vertical column. 一種形成底部發光型微發光二極體顯示器的方法,包含: 提供一第一主基板; 形成複數連接結構於複數發光區內; 形成複數微發光二極體電性連接於該些連接結構之上; 形成第一光阻斷層於該第一主基板的上方,以定義該些發光區,其涵蓋該些連接結構;及 形成一導光層於該些發光區內。A method for forming a bottom-emitting micro-light-emitting diode display, comprising: providing a first main substrate; forming a plurality of connection structures in the plurality of light-emitting regions; forming a plurality of micro-light-emitting diodes electrically connected to the connection structures Forming a first light blocking layer above the first main substrate to define the light emitting regions to cover the connecting structures; and forming a light guiding layer in the light emitting regions. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中該些連接結構具相同圖樣。A method of forming a bottom emission type micro-light-emitting diode display according to claim 46, wherein the connection structures have the same pattern. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中該些連接結構包含透明材質。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the connection structures comprise a transparent material. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中該些連接結構包含非透明材質。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the connection structures comprise a non-transparent material. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,於形成該導光層或該第一光阻斷層之後,更全面形成一導電層於該第一主基板的複數發光區內。According to the method of forming a bottom emission type micro light emitting diode display according to claim 46, after forming the light guiding layer or the first light blocking layer, a conductive layer is further formed on the first main substrate. The complex number of light-emitting areas. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,於形成該導電層之前,更形成接觸洞於該些微發光二極體的頂面。According to the method of forming a bottom-emitting type micro-light-emitting diode display according to claim 46 of the patent application, before forming the conductive layer, a contact hole is formed on the top surface of the micro-light-emitting diodes. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中該第一光阻斷層為黑矩陣。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the first light blocking layer is a black matrix. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中該發光區內的紅色微發光二極體、綠色微發光二極體與藍色微發光二極體分別相應於相同圖樣的連接結構。A method for forming a bottom emission type micro light emitting diode display according to claim 46, wherein the red light emitting diode, the green micro light emitting diode and the blue micro light emitting diode in the light emitting region respectively Corresponding to the connection structure of the same pattern. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 形成黑樹脂;及 使用光學製程及固化製程處理該黑樹脂,以形成黑矩陣光阻斷層。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the step of forming the first light blocking layer comprises: forming a black resin; and processing the black resin using an optical process and a curing process To form a black matrix light blocking layer. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 使用噴墨印刷技術及固化製程以形成黑矩陣光阻斷層。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the step of forming the first light blocking layer comprises: using an inkjet printing technique and a curing process to form a black matrix light blocking Floor. 根據申請專利範圍第46項所述形成底部發光型微發光二極體顯示器的方法,其中形成該第一光阻斷層的步驟包含: 形成鉻/氧化鉻薄膜;及 使用照相蝕刻技術處理該鉻/氧化鉻薄膜,以形成黑矩陣光阻斷層。A method of forming a bottom emission type micro light emitting diode display according to claim 46, wherein the step of forming the first light blocking layer comprises: forming a chromium/chromia film; and treating the chromium using a photo etching technique / chrome oxide film to form a black matrix light blocking layer.
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US11990499B2 (en) 2020-08-24 2024-05-21 PlayNitride Display Co., Ltd. Display apparatus and method of fabricating the same

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