TW201804949A - Wet-type cleaning apparatus with cleaning element and wetting device for achieving optimal cleaning effect with as little liquid usage as possible - Google Patents

Wet-type cleaning apparatus with cleaning element and wetting device for achieving optimal cleaning effect with as little liquid usage as possible Download PDF

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Publication number
TW201804949A
TW201804949A TW106120587A TW106120587A TW201804949A TW 201804949 A TW201804949 A TW 201804949A TW 106120587 A TW106120587 A TW 106120587A TW 106120587 A TW106120587 A TW 106120587A TW 201804949 A TW201804949 A TW 201804949A
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Taiwan
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liquid
cleaning
guide surface
cleaning element
wet
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TW106120587A
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Chinese (zh)
Inventor
漢納斯 布辛
約亨 耶特斯
克里斯多夫 岡特
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佛維爾克控股公司
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Publication of TW201804949A publication Critical patent/TW201804949A/en

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    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/408Means for supplying cleaning or surface treating agents
    • A47L11/4088Supply pumps; Spraying devices; Supply conduits
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4036Parts or details of the surface treating tools
    • A47L11/4041Roll shaped surface treating tools

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention relates to a wet-type cleaning apparatus (1) and, more particularly, to a wet mopping device, which comprises a cleaning element (2), in particular a cleaning roller rotatable about a rotating axle (3); and a wetting device (4) for applying liquid to the cleaning element (2). In order to achieve optimal cleaning effect with as little liquid usage as possible, the wetting device (4) is proposed to have a guide surface (6) for liquid, which is disposed above a liquid flow path and between a liquid nozzle ( 5) and the cleaning element (2), and which is displaceable relative to the cleaning element (2) in particular, wherein the guide surface (6) is configured relative to the fluid discharge direction (x) of the liquid nozzle (5) at an angle (<alpha>) between 90 degrees and 170 degrees, in particular between 90 degrees and 105 degrees, such that the liquid accelerated and discharged from the liquid nozzle (5) to the guide surface (6) spreads when impacting on the guide surface (6), and then reaches the cleaning element (2) along the guide surface (6) due to the force of gravity.

Description

具有清潔元件及潤濕裝置之濕式清潔設備 Wet cleaning equipment with cleaning element and wetting device

本發明係有關於一種濕式清潔設備,特別是濕擦設備,具有清潔元件,特別是可繞旋轉軸旋轉之清潔滾筒,以及,用於向清潔元件施加液體之潤濕裝置。 The invention relates to a wet cleaning device, in particular a wet wiping device, having a cleaning element, in particular a cleaning roller rotatable around a rotation axis, and a wetting device for applying liquid to the cleaning element.

此外,本發明係有關於一種操作濕式清潔設備之方法,其中,藉由潤濕裝置向清潔元件施加液體。 In addition, the present invention relates to a method of operating a wet cleaning apparatus in which a liquid is applied to a cleaning element by a wetting device.

在先前技術中,濕式清潔設備及操作濕式清潔設備之方法已為吾人所知。 In the prior art, wet cleaning equipment and methods of operating wet cleaning equipment have been known to me.

DE 102 29 611 B3例如揭露一種濕式清潔設備,具有可受驅動而繞旋轉軸旋轉的擦拭體,其中,自儲罐獲取清潔液,並藉由沿著擦拭體之旋轉軸之方向佈置的噴嘴,將清潔液噴灑於擦拭體表面。以此方式被潤濕之擦拭體在擦拭操作期間在待清潔表面上移行,其中,擦拭體收集了待清潔表面上之污物。 DE 102 29 611 B3, for example, discloses a wet cleaning device having a wiper body that can be driven to rotate around a rotation axis, wherein a cleaning liquid is obtained from a storage tank and a nozzle is arranged along the direction of the rotation axis of the wiper body. , Spray the cleaning solution on the surface of the wiper. The wiper body moistened in this way moves on the surface to be cleaned during the wiping operation, wherein the wiper body collects dirt on the surface to be cleaned.

擦拭體之此種潤濕方式的缺點在於,需要用大量液體來潤濕整個擦拭體。另外,擦拭體潤濕不均勻,致使待清潔表面之至少部分區域為過濕而非僅輕微潤濕。 The disadvantage of this method of wetting the wiper is that it requires a large amount of liquid to wet the entire wiper. In addition, the wiping body is unevenly wetted, causing at least a portion of the surface to be cleaned to be too wet rather than only slightly wetted.

基於上述之先前技術,本發明之目的在於改良前述類型之濕式清潔設備,以便以儘可能少的液體用量來使待清潔表面得 到最佳清潔。 Based on the foregoing prior art, the object of the present invention is to improve the wet cleaning equipment of the aforementioned type so that the surface to be cleaned can be obtained with as little liquid as possible. To the best cleaning.

為達成上述目的,本發明提出:潤濕裝置具有用於液體之導引面,其係在液體之流徑上設於液體噴嘴與清潔元件之間,且特別是相對於清潔元件為可位移,其中,導引面係相對於液體噴嘴之出液方向以介於90°與170°之間、特別是介於90°與105°之間的角度佈置,使得,自液體噴嘴被加速排出到導引面上的液體在射中導引面時擴展,且在重力作用下沿導引面到達清潔元件。 To achieve the above object, the present invention proposes that the wetting device has a guide surface for liquid, which is disposed between the liquid nozzle and the cleaning element on the flow path of the liquid, and is particularly displaceable relative to the cleaning element. The guide surface is arranged at an angle between 90 ° and 170 °, especially between 90 ° and 105 ° with respect to the liquid discharge direction of the liquid nozzle, so that the liquid is expelled from the liquid nozzle to the guide. The liquid on the guide surface expands when hitting the guide surface, and reaches the cleaning element along the guide surface under the action of gravity.

根據本發明,此濕式清潔設備具有導引面,液體可在導引面上流向清潔元件。本發明所用之術語「液體」亦指蒸汽、液滴、噴霧或類似物質。自此,液體噴嘴所排出之液體不再直接施加於清潔元件,而是先施加於導引面,再由該處施加於清潔元件。為達此目的,液體噴嘴係相對於導引面佈置,使得,沿出液方向加速離開液體噴嘴的液體射中導引面,並於該處流向清潔元件。液體射中導引面後,液體射流擴展成液膜。離開液體噴嘴之液體有益地藉由泵而被加速,並且沿出液方向自液體噴嘴射出,而該出液方向係偏離於垂直方向。液體實質上係以此方向射中導引面,其中,泵施加於液體之力足以令液體到達導引面。液體在導引面上產生液斑,以該液斑為起點,液體分成若干部分實質上沿徑向朝各方向運動,例如,亦反向於重力方向。液體隨著與液體噴嘴間之距離的增大,受重力方向影響而愈發垂直,從而在導引面上實現液體擴展。透過液體射流之擴展,能夠在清潔元件之整個縱向延伸上均勻地潤濕清潔元件。清潔元件在潤濕過程中較佳地可相對於導引面運動,意即,若非呈平面狀之清潔元件可相對於導引面往復移動,則是被建構為清潔滾筒之清潔元件繞旋轉軸旋轉。透過清潔元件之相對於釋 放液膜的導引面的相對位移或旋轉,可均勻地潤濕清潔元件之整個表面。為了使得被施加於導引面之液體擴展得儘可能寬且進而能潤濕清潔元件上之儘可能寬的區域,較佳地應將液體近乎垂直地施加於導引面。建議在導引面與液體噴嘴之出液方向之間形成介於90°與170°間、特別是介於90°與105°之間的角度。實踐表明,導引面與出液方向之間大於105°之角度會嚴重縮小液體射流之擴展寬度。 According to the invention, this wet cleaning device has a guide surface on which liquid can flow towards the cleaning element. The term "liquid" as used in the present invention also refers to steam, droplets, sprays or the like. Since then, the liquid discharged from the liquid nozzle is no longer directly applied to the cleaning element, but is first applied to the guide surface, and then from there to the cleaning element. To this end, the liquid nozzle is arranged relative to the guide surface, so that the liquid exiting the liquid nozzle is accelerated in the direction of the liquid ejection into the guide surface and flows there toward the cleaning element. After the liquid hits the guide surface, the liquid jet expands into a liquid film. The liquid leaving the liquid nozzle is advantageously accelerated by the pump and is ejected from the liquid nozzle in the direction of the liquid which is deviated from the vertical direction. The liquid essentially hits the guide surface in this direction, wherein the force exerted by the pump on the liquid is sufficient to make the liquid reach the guide surface. The liquid generates a liquid spot on the guide surface. With the liquid spot as a starting point, the liquid is divided into several parts and moves substantially in radial directions in various directions, for example, it is also opposite to the direction of gravity. As the distance between the liquid and the liquid nozzle increases, it becomes more vertical due to the influence of the direction of gravity, so that the liquid expands on the guide surface. Through the expansion of the liquid jet, the cleaning element can be wetted uniformly over the entire longitudinal extension of the cleaning element. The cleaning element is preferably movable relative to the guide surface during the wetting process, that is, if the non-planar cleaning element can move back and forth with respect to the guide surface, the cleaning element configured as a cleaning roller is rotated about the rotation axis Spin. Relative release through cleaning elements The relative displacement or rotation of the guide surface of the liquid discharge film can evenly wet the entire surface of the cleaning element. In order to spread the liquid applied to the guide surface as wide as possible and thus to wet the widest area on the cleaning element, the liquid should preferably be applied almost perpendicularly to the guide surface. It is recommended to form an angle between 90 ° and 170 °, especially between 90 ° and 105 °, between the guide surface and the liquid discharge direction of the liquid nozzle. Practice has shown that an angle greater than 105 ° between the guide surface and the direction of liquid discharge will severely reduce the expansion width of the liquid jet.

根據本發明,導引面同時承擔數項任務,具體而言,一者係擴展自液體噴嘴射出之液體,其次係將沿著導引面流動之液扇面導向清潔元件。總體而言,藉此能全面、均勻卻僅輕微地潤濕清潔元件,從而總體上減少潤濕清潔元件所需之液體量。導引面之其他功能將在下文中結合附屬項加以詳細說明。 According to the present invention, the guide surface simultaneously performs several tasks. Specifically, one is to expand the liquid ejected from the liquid nozzle, and the other is to guide the liquid fan surface flowing along the guide surface to the cleaning element. Overall, this allows the cleaning element to be fully, uniformly, but only slightly moistened, thereby reducing the overall amount of liquid needed to wet the cleaning element. Other functions of the guide surface will be described in detail below in conjunction with the dependent items.

本發明特別建議:導引面亦相對於清潔元件為可位移。為達此目的,導引面例如能以可繞偏轉軸偏轉之方式支承於此濕式清潔設備上。如此一來,導引面能夠背離清潔元件運動或者朝向清潔元件運動,以便能例如在用於潤濕清潔元件、用於濕式清潔設備之擦拭操作(不持續潤濕清潔元件)及/或用於以清洗清潔元件為目的之再生操作的不同位置之間進行選擇。 The invention particularly suggests that the guide surface is also displaceable relative to the cleaning element. To this end, for example, the guide surface can be supported on the wet cleaning device in such a manner that it can be pivoted about a deflection axis. In this way, the guide surface can be moved away from or towards the cleaning element, so that it can be used, for example, in a wiping operation for wetting the cleaning element, for a wet cleaning device (not continuously wetting the cleaning element) and / or Choose between different positions of the regeneration operation for the purpose of cleaning the cleaning element.

本發明特別提出:導引面以一接觸面貼靠於清潔元件。根據此項技術方案,導引面接觸清潔元件,其中,在導引面與清潔元件之間形成接觸面。在此情況下,被施加於清潔元件的液體無法順暢地在清潔元件之表面流動,而是較佳地蓄積於接觸面之區域,藉此,延長可供清潔元件之材料吸收液體的作用時間。此外,清潔元件(例如,清潔用覆蓋物之纖維)在接觸面上被壓縮,以防液體損失。若清潔元件為清潔滾筒,則在接觸面之區域產生楔形的蓄 積體積,該蓄積體積係沿清潔滾筒之縱向如溝槽般形成於導引面與清潔元件之間。當清潔滾筒旋轉時,此蓄積體積便沿周向順著清潔滾筒之旋轉方向分佈於清潔滾筒之表面。透過液體射流之在導引面上的擴展,可依具體的結構條件而在清潔元件之整個縱向延伸上實現擴展。此點主要取決於液體噴嘴到導引面之距離、排出噴嘴所排出的液體之速度、導引面相對於液體噴嘴之出液方向、及相對於重力方向之傾角及導引面之表面特性。 The invention particularly proposes that the guide surface bears against the cleaning element with a contact surface. According to this technical solution, the guide surface contacts the cleaning element, wherein a contact surface is formed between the guide surface and the cleaning element. In this case, the liquid applied to the cleaning element cannot flow smoothly on the surface of the cleaning element, but is preferably accumulated in the area of the contact surface, thereby extending the action time of the liquid available to the material of the cleaning element. In addition, cleaning elements (e.g., fibers of a cleaning cover) are compressed on the contact surface to prevent liquid loss. If the cleaning element is a cleaning roller, a wedge-shaped storage is generated in the area of the contact surface. The accumulated volume is formed between the guide surface and the cleaning element like a groove along the longitudinal direction of the cleaning drum. When the cleaning roller rotates, this accumulated volume is distributed on the surface of the cleaning roller in the circumferential direction along the rotation direction of the cleaning roller. Through the expansion of the liquid jet on the guide surface, the entire longitudinal extension of the cleaning element can be achieved according to specific structural conditions. This point mainly depends on the distance from the liquid nozzle to the guide surface, the speed of the liquid discharged by the discharge nozzle, the direction of liquid discharge from the guide surface with respect to the liquid nozzle, the inclination angle with respect to the direction of gravity, and the surface characteristics of the guide surface.

本發明特別提出:導引面係以5N至10N之壓緊力作用於清潔元件。此壓緊力一方面可僅透過作用於導引面之重力而獲得,即,取決於導引面之具體質量,或者,作為替代或補充方案,可藉由作用於導引面之壓緊裝置而獲得,該壓緊裝置例如為彈性元件,其復位力將導引面壓向清潔元件。導引面壓抵清潔元件時所施加之壓緊力係用來使導引面儘可能流體密封地貼靠於清潔元件,使得,導引面與清潔元件之間的蓄積體積內所蓄積的液體無法順暢地在清潔元件之表面流動,而是當清潔元件相對於導引面運動時,即,做前進與後退運動或旋轉時,針對性地掠過清潔元件之表面。 The invention particularly proposes that the guide surface acts on the cleaning element with a pressing force of 5N to 10N. This pressing force can be obtained only by the gravity acting on the guide surface, that is, depending on the specific quality of the guide surface, or, as an alternative or supplement, by a pressing device acting on the guide surface It is obtained that the pressing device is, for example, an elastic element, and its resetting force presses the guide surface against the cleaning element. The pressing force applied when the guide surface is pressed against the cleaning element is used to make the guide surface as close to the cleaning element as possible in a fluid-tight manner, so that the liquid accumulated in the accumulation volume between the guide surface and the cleaning element It cannot flow smoothly on the surface of the cleaning element, but when the cleaning element moves relative to the guide surface, that is, when it moves forward or backward, or rotates, it sweeps across the surface of the cleaning element in a targeted manner.

本發明特別推薦:接觸面在液體由其流徑所形成之入射平面內具有1cm至4cm、尤佳約為2cm之高度。其中,接觸面形成一區域,導引面在該區域內壓抵清潔元件。接觸面之大小尤其取決於導引面之可能具有的曲率、及/或清潔元件之可能具有的曲率。事實表明,在清潔元件被建構為滾筒直徑為4.5cm之清潔滾筒的情況下,若接觸面例如具有2cm之延伸度,則是有益的。接觸面之此延伸度有助於使蓄積體積得到最佳的密封。另外,透過清潔元件之清潔用覆蓋物在接觸面之區域之受控的壓縮,能防止液體損 失。再者,接觸面有助於液體在清潔元件上達到最佳的作用時間期。 The invention particularly recommends that the contact surface has a height of 1 cm to 4 cm, particularly preferably about 2 cm, in the incident plane formed by the liquid's flow path. Wherein, the contact surface forms a region, and the guide surface is pressed against the cleaning element in this region. The size of the contact surface depends in particular on the possible curvature of the guide surface and / or the possible curvature of the cleaning element. It has been shown that in the case of a cleaning element designed as a cleaning cylinder with a diameter of 4.5 cm, it is advantageous if the contact surface has an extension of 2 cm, for example. This extension of the contact surface helps to achieve an optimal seal of the accumulated volume. In addition, the controlled compression of the cleaning cover through the cleaning element in the area of the contact surface prevents liquid damage Missed. Furthermore, the contact surface helps the liquid to reach an optimal period of action on the cleaning element.

本發明進一步提出:潤濕裝置具有數個平行於清潔元件之縱向延伸佈置的液體噴嘴。若清潔元件例如為清潔滾筒,則液體噴嘴係平行於滾筒軸佈置。藉此,可為整個清潔元件施加液體,即,施加於其整個表面。此點一方面係透過數個液體噴嘴之分佈而實現,另一方面係透過清潔元件之相對於導引面的位移或旋轉而實現。沿著清潔元件之整個縱向延伸以潤濕清潔元件所需的液體噴嘴之數目,係流體射流在接觸面之區域之擴展寬度而定。舉例而言,液體噴嘴可採數公分之間距佈置,例如,以介於3cm與6cm之間的間距佈置。 The invention further proposes that the wetting device has a plurality of liquid nozzles arranged parallel to the longitudinal extension of the cleaning element. If the cleaning element is, for example, a cleaning drum, the liquid nozzles are arranged parallel to the drum axis. Thereby, a liquid can be applied to the entire cleaning element, that is, to the entire surface thereof. This is achieved on the one hand through the distribution of several liquid nozzles, and on the other hand through the displacement or rotation of the cleaning element relative to the guide surface. The number of liquid nozzles extending along the entire longitudinal direction of the cleaning element to wet the cleaning element depends on the spread of the fluid jet in the area of the contact surface. For example, the liquid nozzles can be arranged at a distance of several centimeters, for example, at a distance of between 3 cm and 6 cm.

本發明提出:液體噴嘴具有孔徑為0.1mm至2mm、特別是約為1mm之排出孔。液體噴嘴例如為管狀噴嘴。透過小的孔徑,可獲得速度足夠高的細的液體射流,以便克服液體噴嘴之排出孔與導引面上之射中點之間的距離。 The invention proposes that the liquid nozzle has a discharge hole with a diameter of 0.1 mm to 2 mm, especially about 1 mm. The liquid nozzle is, for example, a tubular nozzle. Through a small aperture, a fine liquid jet with a sufficiently high speed can be obtained in order to overcome the distance between the discharge hole of the liquid nozzle and the midpoint of the shot on the guide surface.

根據較佳實施方式,液體噴嘴係設於導引面上。因此,液體噴嘴並非單獨固定於此濕式清潔設備上,而是直接設於導引面上,從而能避免或至少減少液體噴嘴之排出孔與導引面之間的距離所造成之液體損失。除了液體噴嘴外,亦可在導引面上設置一或數個導偏元件,該等導偏元件係對沿著導引面流動的液體進行分配且/或導引。導偏元件例如可被建構為設於導引面上之凸起、或形成於導引面中之溝槽。 According to a preferred embodiment, the liquid nozzle is provided on the guide surface. Therefore, the liquid nozzle is not fixed on the wet cleaning device alone, but is directly provided on the guide surface, so that the liquid loss caused by the distance between the discharge hole of the liquid nozzle and the guide surface can be avoided or at least reduced. In addition to the liquid nozzle, one or more deflection elements may be provided on the guide surface. The deflection elements distribute and / or guide the liquid flowing along the guide surface. The deflection element can be configured, for example, as a protrusion provided on the guide surface or as a groove formed in the guide surface.

本發明進一步提出:導引面在接觸清潔元件時相對於水平面具有約30°至60°、特別是45°之角度。導引面之相對於水平面的上述的斜置能使液體在重力作用下流向清潔元件,此外,能實 現相對於液體噴嘴之出液方向的斜置,此斜置有助於實現本發明所提出之擴展。 The invention further proposes that when the guide surface contacts the cleaning element, it has an angle of about 30 ° to 60 °, especially 45 °, relative to the horizontal plane. The above-mentioned oblique positioning of the guide surface with respect to the horizontal plane enables liquid to flow to the cleaning element under the action of gravity. The oblique position is relative to the liquid discharge direction of the liquid nozzle, and this oblique position helps to achieve the expansion proposed by the present invention.

本發明提出:導引面在指向清潔元件的一側呈內凹彎曲,且/或具有表面塗層,且/或具有表面結構。據此,除了將導引面建構為最簡單的光滑平面之外,導引面亦可具有彎曲部,具體而言,係在其貼靠於清潔元件的一側具有內凹的彎曲部。藉此,增大了導引面與清潔元件之間的接觸面,進而特別亦延長了可供液體進入清潔元件之作用時間期。此外,導引面亦可具有表面塗層,例如,具親水或疏水作用的塗層,此塗層改變了液體在導引面上之流動特性,具體而言,例如,主要改變了液體在導引面上向下流動時之流速。另外,亦可設置表面結構,例如,以溝、槽、凸塊等結構,對表面進行導流性的結構化處理。 The invention proposes that the guide surface is concavely curved on the side directed to the cleaning element, and / or has a surface coating, and / or has a surface structure. According to this, in addition to constructing the guide surface as the simplest smooth plane, the guide surface may also have a curved portion, specifically, a curved portion with a recess on the side thereof abutting on the cleaning element. As a result, the contact surface between the guide surface and the cleaning element is increased, and in particular, the period of time during which liquid can enter the cleaning element is also extended. In addition, the guide surface may also have a surface coating, for example, a coating having a hydrophilic or hydrophobic effect. This coating changes the flow characteristics of the liquid on the guide surface. Specifically, for example, it mainly changes the liquid on the guide surface. Velocity when the surface is flowing downward. In addition, a surface structure may be provided, for example, the surface may be structured with a conductive property by a structure such as a groove, a groove, or a bump.

除了本發明之濕式清潔設備外,此外亦提出一種操作濕式清潔設備之方法,其中,藉由潤濕裝置向清潔元件施加液體,而其中,液體自潤濕裝置之液體噴嘴出發而被加速排出到一導引面上,在射中該導引面時擴展,且在重力作用下沿導引面到達清潔元件,其中,以介於90°與170°之間、特別是介於90°與105°之間的角度向導引面施加液體。除此之外,前文聯繫濕式清潔設備所說明之特徵亦適用於此濕式清潔設備之操作方法。 In addition to the wet cleaning apparatus of the present invention, a method for operating a wet cleaning apparatus is also proposed, in which a liquid is applied to a cleaning element by a wetting device, and the liquid is accelerated from a liquid nozzle of the wetting device. It is discharged onto a guide surface, expands when hitting the guide surface, and reaches the cleaning element along the guide surface under the action of gravity, wherein it is between 90 ° and 170 °, especially between 90 ° The angle between and 105 ° applies liquid to the guide surface. In addition, the features described above in connection with wet cleaning equipment are also applicable to the operation method of this wet cleaning equipment.

本發明最後提出:清潔元件為清潔滾筒,在施加液體期間特別是以介於每分鐘100轉與每分鐘600轉間之轉速、尤佳地以介於每分鐘200轉與每分鐘450轉間之轉速繞旋轉軸旋轉。清潔滾筒之轉速應主要係根據清潔滾筒之直徑及有待施加於清潔滾筒之液體量來加以設計。特別是,藉由被施加於清潔滾筒之液體量而 實現的作用時間期應至少等於清潔滾筒旋轉一圈之時間期。本發明所提出的較佳為每分鐘200至450轉之轉速特別適用於直徑為4.5cm之旋轉滾筒。 The invention finally proposes that the cleaning element is a cleaning roller, during the application of the liquid, particularly at a rotation speed between 100 revolutions per minute and 600 revolutions per minute, particularly preferably between 200 revolutions per minute and 450 revolutions per minute. The rotation speed rotates around the rotation axis. The rotation speed of the cleaning drum should be mainly designed based on the diameter of the cleaning drum and the amount of liquid to be applied to the cleaning drum. In particular, by the amount of liquid applied to the cleaning roller, The effected period of time should be at least equal to the period of time that the cleaning roller rotates one revolution. The rotation speed proposed by the present invention, which is preferably 200 to 450 revolutions per minute, is particularly suitable for a rotating drum having a diameter of 4.5 cm.

在本發明範圍內,濕式清潔設備原則上係指所有以濕式清潔為唯一或主要功能之設備。此類設備包括手持式及自動移行式濕式清潔設備,尤其亦包括清潔機器人。除此之外,組合式乾式與濕式清潔設備亦為本發明所稱之濕式清潔設備。另外,除了用於地板的普通地板清潔設備外,亦指用於清潔地板上方區域之濕式清潔設備,例如,窗戶清潔設備。 Within the scope of the present invention, wet cleaning equipment refers in principle to all equipment with wet cleaning as its sole or main function. Such equipment includes handheld and automatic wet cleaning equipment, and particularly cleaning robots. In addition, the combined dry and wet cleaning equipment is also referred to as the wet cleaning equipment of the present invention. In addition, in addition to ordinary floor cleaning equipment used for floors, it also refers to wet cleaning equipment used to clean the area above the floor, such as window cleaning equipment.

1‧‧‧濕式清潔設備 1‧‧‧ Wet cleaning equipment

2‧‧‧清潔元件 2‧‧‧ Cleaning Elements

3‧‧‧旋轉軸 3‧‧‧rotation axis

4‧‧‧潤濕裝置 4‧‧‧ Wetting device

5‧‧‧液體噴嘴 5‧‧‧ liquid nozzle

6‧‧‧導引面 6‧‧‧ Guide surface

7‧‧‧接觸面 7‧‧‧ contact surface

8‧‧‧排出孔 8‧‧‧ discharge hole

9‧‧‧基本裝置 9‧‧‧ basic equipment

10‧‧‧附加件 10‧‧‧ Add-ons

11‧‧‧柄部 11‧‧‧ handle

12‧‧‧把手 12‧‧‧handle

13‧‧‧加注管 13‧‧‧ Filling tube

14‧‧‧偏轉軸 14‧‧‧deflection axis

15‧‧‧清潔用覆蓋物 15‧‧‧Cleaning Cover

16‧‧‧蓄積體積 16‧‧‧ Accumulated volume

17‧‧‧纖維 17‧‧‧ fiber

α‧‧‧(導引面相對於出液方向)角度 α‧‧‧ (guide surface relative to the direction of liquid discharge) angle

β‧‧‧(導引面相對於水平面)角度 β‧‧‧ (Guiding plane relative to horizontal plane) angle

r‧‧‧旋轉方向 r‧‧‧rotation direction

x‧‧‧出液方向 x‧‧‧ discharge direction

圖1為本發明之濕式清潔設備之示意圖;圖2為濕式清潔設備之具有清潔元件及潤濕裝置的分區之示意圖;圖3為具有潤濕裝置的清潔元件之放大圖;圖4為圖2所示之清潔元件及潤濕裝置之俯視圖;圖5為導引面之面向清潔元件的一側之側面透視立體圖。 Fig. 1 is a schematic diagram of a wet cleaning device of the present invention; Fig. 2 is a schematic diagram of a partition of a wet cleaning device having a cleaning element and a wetting device; Fig. 3 is an enlarged view of a cleaning element having a wetting device; FIG. 2 is a top view of the cleaning element and the wetting device; FIG. 5 is a side perspective perspective view of a side of the guide surface facing the cleaning element.

下面結合實施例詳細闡述本發明。圖1示出濕式清潔設備1,在此係被建構為具有基本裝置9及附加件10的手持式濕式清潔設備1。附加件10可拆卸地保持在基本裝置9上。此外,基本裝置9具有柄部11,在此例如採用可伸縮設計,以便濕式清潔設備1之使用者能夠根據其身高來調整柄部11之長度。柄部11上進一步設有把手12,使用者在常規的擦拭操作期間,可利用該把手操 控、即在待清潔表面上推移濕式清潔設備1。在擦拭操作期間,使用者通常操控濕式清潔設備1在待清潔表面上以相反之運動方向移行。在此過程中,使用者交替地推開及拉近濕式清潔設備1。 The present invention is described in detail below with reference to the examples. FIG. 1 shows a wet cleaning device 1, which is here configured as a handheld wet cleaning device 1 with a basic device 9 and an attachment 10. The attachment 10 is detachably held on the base device 9. In addition, the basic device 9 has a handle 11, for example, a telescopic design is adopted here, so that a user of the wet cleaning device 1 can adjust the length of the handle 11 according to his height. A handle 12 is further provided on the handle 11, and the user can use the handle to operate during the normal wiping operation. The wet cleaning device 1 is moved on the surface to be cleaned. During the wiping operation, the user usually manipulates the wet cleaning device 1 to move on the surface to be cleaned in the opposite direction of movement. During this process, the user alternately pushes and pulls the wet cleaning device 1 away.

附加件10具有殼體,清潔元件2係保持在該殼體中,而該清潔元件在此為清潔滾筒。殼體上設有加注管13,液體可透過該加注管被裝入液箱(未示出)。儲存於液箱中之液體用於從外部潤濕清潔元件2。 The attachment 10 has a housing in which the cleaning element 2 is held, and the cleaning element is here a cleaning roller. The casing is provided with a filling pipe 13 through which liquid can be filled into a liquid tank (not shown). The liquid stored in the tank is used to wet the cleaning element 2 from the outside.

清潔元件2在此係以可繞旋轉軸3旋轉之方式支承於附加件10之殼體之內部。在擦拭操作期間,清潔元件2例如以每分鐘350轉之轉速繞著旋轉軸3旋轉,使清潔元件2之周面連續地在待清潔表面上滾動。清潔元件2上通常包裹有清潔用覆蓋物15,二者間視情況夾設有附加性地起儲液作用之海綿體。清潔用覆蓋物15在此例如為紡織清潔布,其諸多纖維17之間可容納液體。清潔元件2之包括纖維17在內的外徑在此例如為46mm。 The cleaning element 2 is supported inside the housing of the attachment 10 in a rotatable manner about a rotation axis 3. During the wiping operation, the cleaning element 2 is rotated around the rotation shaft 3 at a rotation speed of 350 revolutions per minute, for example, so that the peripheral surface of the cleaning element 2 continuously rolls on the surface to be cleaned. The cleaning member 2 is usually wrapped with a cleaning cover 15, and a sponge body that additionally functions as a liquid storage is sandwiched between the two as appropriate. The cleaning cover 15 is, for example, a textile cleaning cloth, and a plurality of fibers 17 can contain a liquid between them. The outer diameter of the cleaning element 2 including the fibers 17 is 46 mm, for example.

在擦拭操作期間,污物不斷地積聚於清潔元件2上,即,積聚於清潔用覆蓋物15上。因此,工作一定時間後可能需要將清潔元件2再生(regeneration),其中,在再生操作期間,自清潔元件2移除污物及帶有污物之液體。 During the wiping operation, dirt is continuously accumulated on the cleaning element 2, that is, on the cleaning cover 15. Therefore, it may be necessary to regenerate the cleaning element 2 after working for a certain period of time, wherein during the regeneration operation, dirt and liquid with dirt are removed from the cleaning element 2.

圖2示出附加件10之一分區,清潔元件2係以可繞旋轉軸3旋轉之方式保持在該分區中。清潔元件2被清潔用覆蓋物15所包圍,該清潔用覆蓋物在此具有大量的纖維17。清潔元件2對應於潤濕裝置4,該潤濕裝置總共具有四個液體噴嘴5(參見圖4)以及導引面6。導引面6係以可繞偏轉軸14偏轉之方式支承於附加件10上,且在圖2中受重力影響而貼靠於清潔用覆蓋物15,其 中,清潔用覆蓋物15之諸多纖維17受作用於導引面6的重力影響而被壓縮。在此區域內,在導引面6與清潔元件2之間存在有接觸面7,該接觸面在此沿清潔元件2之周向具有約2cm之延伸度。接觸面7一方面沿旋轉軸3之軸向延伸覆蓋清潔元件2之整個縱向延伸,另一方面如圖所示,沿清潔元件2之周向延伸。液體噴嘴5係沿著旋轉軸3之軸向並排佈置(參見圖4),且分別具有孔徑在此約為1mm之排出孔8。液體噴嘴5對應於泵(未示出),該泵輸送來自於濕式清潔設備1之液箱的液體。液體釋放之時間期在此例如為清潔元件2旋轉二至三轉之時間期。所釋放的液體之量係為每液體噴嘴5例如3ml。液體噴嘴5之排出孔8與導引面6之間沿出液方向x的距離在此約為10mm。液體係以大約每秒11m之速度射中導引面6,且在導引面6上向下流動例如25mm之距離,直至到達清潔元件2之表面。其間,液體例如擴展至50mm至60mm之寬度。為了清楚起見,圖式中未按比例繪示。在接觸面7前方之區域內,液體匯聚形成蓄積體積16。清潔元件2沿旋轉方向r逆時針旋轉,其中,包含於蓄積體積16中之液體係藉由導引面6而被分配到清潔用覆蓋物15上及其當中,尤其是被壓入清潔用覆蓋物15之諸多纖維17之間。 FIG. 2 shows a section of the attachment 10 in which the cleaning element 2 is held in such a way that it can be rotated about the rotation axis 3. The cleaning element 2 is surrounded by a cleaning cover 15, which has a large number of fibers 17. The cleaning element 2 corresponds to a wetting device 4 having a total of four liquid nozzles 5 (see FIG. 4) and a guide surface 6. The guide surface 6 is supported on the attachment 10 in such a manner that it can be deflected about the deflection axis 14 and is abutted against the cleaning cover 15 under the influence of gravity in FIG. 2. The plurality of fibers 17 of the cleaning cover 15 are compressed by the gravity acting on the guide surface 6. In this region, there is a contact surface 7 between the guide surface 6 and the cleaning element 2, which in this case has an extension of approximately 2 cm in the circumferential direction of the cleaning element 2. On the one hand, the contact surface 7 extends along the axial direction of the rotating shaft 3 and covers the entire longitudinal extension of the cleaning element 2; on the other hand, as shown in the figure, it extends along the circumferential direction of the cleaning element 2. The liquid nozzles 5 are arranged side by side along the axial direction of the rotation axis 3 (see FIG. 4), and each has a discharge hole 8 with a diameter of about 1 mm. The liquid nozzle 5 corresponds to a pump (not shown) that conveys liquid from a liquid tank of the wet cleaning apparatus 1. The period of time during which the liquid is released is, for example, a period of time during which the cleaning element 2 rotates two to three revolutions. The amount of liquid released is 5 for example 3 ml per liquid nozzle. The distance between the discharge hole 8 of the liquid nozzle 5 and the guide surface 6 in the liquid discharge direction x is about 10 mm. The liquid system hits the guide surface 6 at a speed of about 11 m per second, and flows downward on the guide surface 6 by a distance of, for example, 25 mm until it reaches the surface of the cleaning element 2. In the meantime, the liquid extends, for example, to a width of 50 mm to 60 mm. For clarity, the figures are not drawn to scale. In the area in front of the contact surface 7, liquids converge to form an accumulation volume 16. The cleaning element 2 rotates counterclockwise in the direction of rotation r, wherein the liquid system contained in the accumulation volume 16 is dispensed onto and into the cleaning cover 15 through the guide surface 6, and is particularly pressed into the cleaning cover. Between the many fibers 17 of the object 15.

圖3示出具有潤濕裝置4的另一個清潔元件2之放大概略圖。清潔元件2在此亦仍然被建構為繞旋轉軸3旋轉之清潔滾筒,其係繞旋轉軸3以逆時針方向旋轉。清潔用覆蓋物15在此具有微細纖維結構。潤濕裝置4在此例如由兩個液體噴嘴5(參見圖5之透視立體圖)及導引面6所組成,該導引面可繞偏轉軸14相對於清潔元件2偏轉。在導引面6之面向清潔元件2的一側,在液體噴 嘴5之出液方向x與導引面6之間形成角度α,在此約為105°。此外,導引面6相對於水平面具有在此為75°之傾斜度。由液體噴嘴5之排出孔8排出的液體射中導引面6,且首先在導引面6上形成實質上呈圓形之液斑。接著,此液斑在液體朝清潔元件2之方向向下運動時受重力影響而擴展,使得,所形成之液扇面在清潔元件2之軸向上具有較最初被施加於導引面6之液斑為大的寬度。在導引面6上向下流動的液體進入導引面6與清潔元件2之間的接觸面7之區域,在此係到達已形成於導引面6與清潔元件2之間的蓄積體積16。導引面6僅基於作用於導引面6之重力,而以在此為8N之壓緊力壓抵清潔元件2之清潔用覆蓋物15。如此一來,清潔用覆蓋物15之纖維17被壓縮,並且,液體無法再從導引面6與清潔元件2之間穿過。清潔元件2繞旋轉軸3以逆時針方向旋轉,其中,清潔用覆蓋物15始終以不同的分區沿周向掠過液體之蓄積體積16。液體由此分佈於清潔用覆蓋物15之周面上,且分佈於清潔用覆蓋物15之諸多纖維17之間,特別是,亦沿旋轉軸3之方向分佈於清潔用覆蓋物15之整個縱向延伸上。蓄積體積16形成駐留於清潔用覆蓋物15上之液體量,此液體量係連續地向清潔用覆蓋物15釋放液體分量體積,且自導引面6吸取新的液體分量體積。基於蓄積體積16之大小及清潔元件2之轉速,產生一段時間期,在此時間期內,蓄積體積16駐留於清潔元件2之周面之分區上,且可於該處潤濕清潔用覆蓋物15。聯結於圖2所示之實施方式所給出的尺寸,亦可示例性地應用於圖3所示之實施方式。 FIG. 3 shows an enlarged schematic view of another cleaning element 2 with a wetting device 4. Here, the cleaning element 2 is still configured as a cleaning drum that rotates around the rotation axis 3, which rotates counterclockwise around the rotation axis 3. The cleaning cover 15 has a fine fiber structure. The wetting device 4 here comprises, for example, two liquid nozzles 5 (see the perspective perspective view of FIG. 5) and a guide surface 6, which can be deflected about the deflection axis 14 relative to the cleaning element 2. On the side of the guide surface 6 facing the cleaning element 2, An angle α is formed between the liquid discharge direction x of the mouth 5 and the guide surface 6, which is about 105 °. In addition, the guide surface 6 has an inclination of 75 ° with respect to the horizontal plane. The liquid discharged from the discharge hole 8 of the liquid nozzle 5 hits the guide surface 6, and a substantially circular liquid spot is first formed on the guide surface 6. Then, the liquid spot expands under the influence of gravity when the liquid moves downward in the direction of the cleaning element 2, so that the formed liquid fan surface has a liquid spot in the axial direction of the cleaning element 2 than the liquid spot originally applied to the guide surface 6. For large width. The liquid flowing down on the guide surface 6 enters the area of the contact surface 7 between the guide surface 6 and the cleaning element 2, where it reaches the accumulation volume 16 which has been formed between the guide surface 6 and the cleaning element 2. . The guide surface 6 is solely based on the gravity acting on the guide surface 6 and is pressed against the cleaning cover 15 of the cleaning element 2 with a pressing force of 8 N here. As a result, the fibers 17 of the cleaning cover 15 are compressed, and the liquid can no longer pass between the guide surface 6 and the cleaning element 2. The cleaning element 2 rotates counterclockwise around the rotation axis 3, wherein the cleaning cover 15 always sweeps the accumulated volume 16 of the liquid in the circumferential direction in different sections. The liquid is thus distributed on the peripheral surface of the cleaning cover 15 and among the fibers 17 of the cleaning cover 15, and in particular, is distributed along the rotation axis 3 in the entire longitudinal direction of the cleaning cover 15. Extend on. The accumulation volume 16 forms the amount of liquid residing on the cleaning cover 15. This liquid amount continuously releases the liquid component volume to the cleaning cover 15, and a new liquid component volume is sucked from the guide surface 6. Based on the size of the accumulation volume 16 and the rotation speed of the cleaning element 2, a period of time is generated. During this time, the accumulation volume 16 resides on the partition of the peripheral surface of the cleaning element 2, and the cleaning cover can be wetted there. 15. The dimensions given in conjunction with the embodiment shown in FIG. 2 can also be exemplarily applied to the embodiment shown in FIG. 3.

圖4示出附加件10如圖2所示具有清潔元件2及潤濕裝置4的分區之俯視圖。潤濕裝置4在此具有四個以約30mm之 間距佈置的液體噴嘴5。 FIG. 4 shows a top view of the partition 10 with the cleaning element 2 and the wetting device 4 as shown in FIG. 2. The wetting device 4 has four Spacing arrangement of liquid nozzles 5.

圖5示出導引面6之面向清潔元件2的一側之透視立體圖。潤濕裝置4與圖3所示之結構基本上相符。在圖式中能看到導引面6上之液斑,此等液斑係由液體噴嘴5之排出孔8所排出的液體所形成,且在重力作用下沿著導引面6朝清潔元件2之方向擴展,從而,沿著清潔元件2之整個縱向延伸,即,沿旋轉軸3之方向,潤濕清潔元件2之清潔用覆蓋物15。 FIG. 5 shows a perspective perspective view of the side of the guide surface 6 facing the cleaning element 2. The wetting device 4 basically corresponds to the structure shown in FIG. 3. The liquid spots on the guide surface 6 can be seen in the drawing. These liquid spots are formed by the liquid discharged from the discharge hole 8 of the liquid nozzle 5 and are guided along the guide surface 6 toward the cleaning element under the action of gravity. The direction of 2 extends so as to extend along the entire longitudinal direction of the cleaning element 2, that is, in the direction of the rotation axis 3, to wet the cleaning cover 15 of the cleaning element 2.

2‧‧‧清潔元件 2‧‧‧ Cleaning Elements

3‧‧‧旋轉軸 3‧‧‧rotation axis

4‧‧‧潤濕裝置 4‧‧‧ Wetting device

5‧‧‧液體噴嘴 5‧‧‧ liquid nozzle

6‧‧‧導引面 6‧‧‧ Guide surface

7‧‧‧接觸面 7‧‧‧ contact surface

8‧‧‧排出孔 8‧‧‧ discharge hole

10‧‧‧附加件 10‧‧‧ Add-ons

13‧‧‧加注管 13‧‧‧ Filling tube

14‧‧‧偏轉軸 14‧‧‧deflection axis

15‧‧‧清潔用覆蓋物 15‧‧‧Cleaning Cover

16‧‧‧蓄積體積 16‧‧‧ Accumulated volume

17‧‧‧纖維 17‧‧‧ fiber

r‧‧‧旋轉方向 r‧‧‧rotation direction

x‧‧‧出液方向 x‧‧‧ discharge direction

Claims (10)

一種濕式清潔設備,特別是濕擦設備,具有清潔元件(2),特別是可繞旋轉軸(3)旋轉之清潔滾筒,以及用於向該清潔元件(2)施加液體之潤濕裝置(4),其特徵在於:該潤濕裝置(4)具有用於液體之導引面(6),其係在液體之流徑上設於一液體噴嘴(5)與該清潔元件(2)之間,且特別是相對於該清潔元件(2)為可位移,其中,該導引面(6)係相對於該液體噴嘴(5)之出液方向(x)以介於90°與170°間、特別是介於90°與105°間之角度(α)佈置,使得,自該液體噴嘴(5)被加速排出到該導引面(6)上的液體在射中該導引面(6)時擴展,且在重力作用下沿該導引面(6)到達該清潔元件(2)。 A wet-type cleaning device, particularly a wet-wiping device, having a cleaning element (2), in particular a cleaning roller rotatable about a rotation axis (3), and a wetting device for applying liquid to the cleaning element (2) ( 4), characterized in that the wetting device (4) has a guide surface (6) for liquid, which is provided on a liquid flow path between a liquid nozzle (5) and the cleaning element (2) And is particularly displaceable relative to the cleaning element (2), wherein the guide surface (6) is between 90 ° and 170 ° with respect to the liquid discharge direction (x) of the liquid nozzle (5) Angle (α) between 90 ° and 105 °, so that the liquid expelled from the liquid nozzle (5) onto the guide surface (6) hits the guide surface ( 6) when expanding, and reach the cleaning element (2) along the guide surface (6) under the action of gravity. 如請求項1之濕式清潔設備,其中,該導引面(6)以一接觸面(7)貼靠於該清潔元件(2),特別是以5N至10N之壓緊力作用於該清潔元件(2),而其中,該接觸面(7)在由其流徑所形成之入射平面內特別是具有1cm至4cm、尤佳為約2cm之高度。 The wet-type cleaning device as claimed in claim 1, wherein the guide surface (6) abuts the cleaning element (2) with a contact surface (7), and in particular, the pressing force acts on the cleaning with a pressing force of 5N to 10N. The element (2), wherein the contact surface (7) has a height of 1 cm to 4 cm, particularly preferably about 2 cm in an incident plane formed by its flow path. 如請求項1或2之濕式清潔設備,其中,該導引面(6)作用於該清潔元件(2)時所施加之壓緊力係與作用於該導引面(6)之重力相符,且/或取決於促使該導引面(6)朝該清潔元件(2)位移的彈性元件之彈力。 For example, the wet cleaning device of claim 1 or 2, wherein the pressing force exerted by the guide surface (6) on the cleaning element (2) is consistent with the gravity acting on the guide surface (6). , And / or depends on the elastic force of the elastic element that urges the guide surface (6) toward the cleaning element (2). 如前述請求項中任一項之濕式清潔設備,其中,該潤濕裝置(4)具有數個平行於該清潔元件(2)之縱向延伸佈置的液體噴嘴(5)。 The wet cleaning device according to any one of the preceding claims, wherein the wetting device (4) has a plurality of liquid nozzles (5) arranged parallel to the longitudinal extension of the cleaning element (2). 如前述請求項中任一項之濕式清潔設備,其中,該液體噴嘴(5)具有孔徑為0.1mm至2mm、特別是約為1mm之排出孔(8)。 The wet-type cleaning apparatus according to any one of the preceding claims, wherein the liquid nozzle (5) has a discharge hole (8) having a hole diameter of 0.1 mm to 2 mm, particularly about 1 mm. 如前述請求項中任一項之濕式清潔設備,其中,該液體噴嘴(5) 係設於該導引面(6)上。 The wet cleaning apparatus according to any one of the preceding claims, wherein the liquid nozzle (5) It is set on the guide surface (6). 如前述請求項中任一項之濕式清潔設備,其中,該導引面(6)在接觸該清潔元件(2)時相對於水平面具有約30°至90°、特別是45°之角度(β)。 The wet cleaning device according to any one of the preceding claims, wherein when the guide surface (6) contacts the cleaning element (2), it has an angle of about 30 ° to 90 ° with respect to the horizontal plane, in particular 45 ° ( β). 如前述請求項中任一項之濕式清潔設備,其中,該導引面(6)在指向該清潔元件(2)的一側呈內凹彎曲,且/或具有表面塗層,且/或具有表面結構。 The wet cleaning device according to any one of the preceding claims, wherein the guide surface (6) is concavely curved on a side directed to the cleaning element (2), and / or has a surface coating, and / or Has a surface structure. 一種操作濕式清潔設備之方法,特別是操作前述請求項中任一項之濕式清潔設備(1)之方法,其中,藉由潤濕裝置(4)向清潔元件(2)施加液體,其特徵在於:液體自該潤濕裝置(4)之液體噴嘴(5)出發而被加速排出到一導引面(6)上,在射中該導引面(6)時擴展,且在重力作用下沿該導引面(6)到達該清潔元件(2),其中,以介於90°與170°之間、特別是介於90°與105°之間的角度(α)向該導引面(6)施加液體。 A method for operating a wet cleaning device, in particular a method for operating a wet cleaning device (1) according to any one of the preceding claims, wherein a liquid is applied to the cleaning element (2) by a wetting device (4), which It is characterized in that the liquid is accelerated to be discharged from a liquid nozzle (5) of the wetting device (4) onto a guide surface (6), expands when hitting the guide surface (6), and acts on gravity The lower edge of the guide surface (6) reaches the cleaning element (2), wherein the guide is directed at an angle (α) between 90 ° and 170 °, especially between 90 ° and 105 °. The surface (6) applies a liquid. 如請求項9之方法,其中,該清潔元件(2)為清潔滾筒,在施加液體期間特別是以介於100轉/分鐘與600轉/分鐘間之轉速、尤佳地以介於200轉/分鐘與450轉/分鐘間之轉速繞旋轉軸(3)旋轉。 The method according to claim 9, wherein the cleaning element (2) is a cleaning roller, during the application of the liquid, particularly at a rotation speed between 100 rpm and 600 rpm, particularly preferably at 200 rpm The rotation speed between the minute and 450 rpm rotates around the rotation axis (3).
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