TWM557581U - Wetting device for cleaning elements and base having the same - Google Patents

Wetting device for cleaning elements and base having the same Download PDF

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Publication number
TWM557581U
TWM557581U TW106210317U TW106210317U TWM557581U TW M557581 U TWM557581 U TW M557581U TW 106210317 U TW106210317 U TW 106210317U TW 106210317 U TW106210317 U TW 106210317U TW M557581 U TWM557581 U TW M557581U
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TW
Taiwan
Prior art keywords
cleaning
cleaning element
application
dampening
zone
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TW106210317U
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Chinese (zh)
Inventor
Der Gaag Velina Van
Mikel Blum
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Vorwerk Co Interholding
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Publication of TWM557581U publication Critical patent/TWM557581U/en

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    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/34Machines for treating carpets in position by liquid, foam, or vapour, e.g. by steam
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L13/00Implements for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L13/10Scrubbing; Scouring; Cleaning; Polishing
    • A47L13/50Auxiliary implements

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Coating Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)

Abstract

本創作係有關於一種潤濕裝置(1),係用於潤濕濕式清潔設備之清潔元件(2),特別是清潔滾筒,其中該潤濕裝置(1)具有液箱(3)、泵(4)以及用於將液體施加於該清潔元件(2)之施加裝置(5)。為提供一種潤濕裝置,其可被配置為分立設備,因而不影響該濕式清潔設備之大小,本創作提出,該潤濕裝置(1)具有帶穿插區(7)之殼體(6),該穿插區可供該清潔元件(2)穿過以藉由該施加裝置(5)實施潤濕,其中該施加裝置(5)至少部分地圍繞該穿插區(7)形成,且其中該施加裝置(5)對應於指向該穿插區(7)之開關元件(8),該開關元件用於藉由穿過該穿插區(7)之清潔元件(2)對該施加裝置(5)實施操縱。 The present invention relates to a wetting device (1) for cleaning a cleaning element (2) of a wet cleaning device, in particular a cleaning roller, wherein the wetting device (1) has a tank (3), a pump (4) and an application device (5) for applying a liquid to the cleaning element (2). In order to provide a dampening device which can be configured as a separate device and thus does not affect the size of the wet cleaning device, the present authorise proposes that the dampening device (1) has a housing (6) with a perforation zone (7) The insertion zone is adapted to pass through the cleaning element (2) for wetting by the application device (5), wherein the application device (5) is at least partially formed around the insertion zone (7), and wherein the application The device (5) corresponds to a switching element (8) directed to the insertion zone (7) for manipulating the application device (5) by means of a cleaning element (2) passing through the insertion zone (7) .

Description

用於清潔元件之潤濕裝置及具有該潤濕裝置之基座 Wetting device for cleaning elements and base having the same

本創作係有關於一種潤濕裝置,係用於潤濕濕式清潔設備之清潔元件,特別是清潔滾筒,其中該潤濕裝置具有液箱、泵以及用於將液體施加於該清潔元件之施加裝置。 The present invention relates to a wetting device for cleaning a cleaning element of a wet cleaning device, in particular a cleaning roller, wherein the wetting device has a tank, a pump and an application for applying a liquid to the cleaning element. Device.

此外,本創作係有關於一種基座,可連接濕式清潔設備以在該濕式清潔設備上實施服務行為。 In addition, the present invention relates to a susceptor to which a wet cleaning device can be attached to perform service activities on the wet cleaning device.

在先前技術中,上述類型之潤濕裝置已為吾人所知。潤濕裝置通常直接安裝在濕式清潔設備中,使得濕式清潔設備之清潔元件能夠直接在濕式清潔設備上被潤濕。 In the prior art, wetting devices of the above type are known. The wetting device is typically mounted directly in the wet cleaning device so that the cleaning elements of the wet cleaning device can be wetted directly on the wet cleaning device.

DE 102 29 611 B3例如揭露一種濕式清潔設備,具有可受驅動而繞旋轉軸旋轉之擦拭體,其中自儲罐獲取清潔液並藉由沿擦拭體之旋轉軸方向佈置的噴嘴將該清潔液噴灑於擦拭體表面。以此方式被潤濕之擦拭體在擦拭操作期間在待清潔表面上移行,其中擦拭體收集待清潔表面上之污物。 DE 102 29 611 B3, for example, discloses a wet cleaning device having a wiping body that can be driven to rotate about a rotational axis, wherein the cleaning liquid is taken from the storage tank and the cleaning liquid is supplied by a nozzle arranged along the axis of rotation of the wiping body Spray on the surface of the wiper. The wiper wetted in this way travels over the surface to be cleaned during the wiping operation, wherein the wiper collects dirt on the surface to be cleaned.

在擦拭操作期間,擦拭體所收集之污物逐漸增多,故而有必要實施再生。為此,擦拭體與待清潔表面分離,被濕式清潔設備之可位移的殼體包圍且被噴灑未經使用之清潔液。擦拭體旋轉,致使清潔液及污物被排出擦拭體,到達殼體內側並被轉移至濕式清潔設備之收容罐。 During the wiping operation, the dirt collected by the wiping body gradually increases, so it is necessary to carry out regeneration. To this end, the wiper is separated from the surface to be cleaned, surrounded by a displaceable housing of the wet cleaning device and sprayed with unused cleaning liquid. The wiper rotates, causing the cleaning liquid and dirt to be discharged out of the wiper, reaching the inside of the casing and being transferred to the storage tank of the wet cleaning device.

其缺點在於,濕式清潔設備由於整合了包括液箱、泵及施加裝置在內之潤濕裝置而變得較大且較重。 The disadvantage is that the wet cleaning device becomes larger and heavier due to the integration of the wetting device including the tank, the pump and the application device.

基於上述之先前技術,本創作之目的在於提供一種潤濕裝置,其可被配置為分立設備,因而不影響濕式清潔設備之大小。 Based on the prior art described above, it is an object of the present invention to provide a wetting device that can be configured as a discrete device and thus does not affect the size of the wet cleaning device.

為達成上述目的,本創作提出,該潤濕裝置具有帶穿插區之殼體,該穿插區可供該清潔元件穿過以藉由該施加裝置實施潤濕,其中該施加裝置至少部分地圍繞該穿插區形成,且其中該施加裝置對應於指向該穿插區之開關元件,該開關元件用於藉由穿過該穿插區之清潔元件對該施加裝置實施操縱。 In order to achieve the above object, the present invention proposes that the dampening device has a housing with a perforation zone through which the cleaning element can pass for wetting by means of the applicator, wherein the applicator at least partially surrounds the applicator The insertion zone is formed, and wherein the application means corresponds to a switching element directed to the insertion zone, the switching element for manipulating the application device by a cleaning element passing through the insertion zone.

根據本創作,該潤濕裝置可被配置為獨立設備,其具有實施再生操作所需之全部組件,即用於儲存未經使用之清潔液的液箱、泵、施加裝置,視情況亦具有污液收容罐。 According to the present invention, the dampening device can be configured as a stand-alone device having all the components required to carry out the regenerative operation, ie a tank, a pump, an application device for storing unused cleaning liquid, and optionally contaminated Liquid storage tank.

該潤濕裝置具有用於清潔元件之穿插區,清潔元件穿過穿插區且在此期間沿著施加裝置受導引,以便於該處被施加液體。施加裝置至少部分地圍繞穿插區形成,如此一來,清潔元件便無需為了均勻潤濕整個周面而旋轉。由於係沿穿插方向穿插清潔元件且該穿插方向較佳與清潔元件之縱向延伸相一致,清潔元件亦沿其整個長度被潤濕。此外,施加裝置對應於開關元件,當清潔元件被插入穿插區時,該開關元件自動地一同受到操縱。其中開關元件較佳對應於穿插區之入口。藉此確保清潔元件沿其整個縱向延伸皆被施加液體。可以不同方式配置開關元件。其較佳為接觸被插入之清潔元件的開關元件,如撥動開關般受到操縱並觸發液體被釋放到清潔元件上。作為替代方案,亦可採用其他開關元件,例如以光學、 聲學、電容或其他方式偵測到清潔元件穿過穿插區且隨即操縱施加裝置釋放液體之開關元件。因此,潤濕裝置之使用者不必對施加裝置實施手動操縱。 The dampening device has an insertion zone for the cleaning element, the cleaning element passing through the insertion zone and being guided along the application device during this time so that liquid is applied there. The application device is formed at least partially around the insertion zone, so that the cleaning element does not need to be rotated in order to uniformly wet the entire circumference. Since the cleaning element is inserted in the insertion direction and the insertion direction preferably coincides with the longitudinal extension of the cleaning element, the cleaning element is also wetted along its entire length. Furthermore, the application means correspond to the switching element which is automatically manipulated together when the cleaning element is inserted into the insertion zone. The switching element preferably corresponds to the entrance of the interposing zone. Thereby it is ensured that the cleaning element is applied with liquid along its entire longitudinal extension. The switching elements can be configured in different ways. It is preferably a switching element that contacts the inserted cleaning element, as manipulated by a toggle switch and triggering the release of liquid onto the cleaning element. As an alternative, other switching elements can also be used, for example optical, Acoustics, capacitance or other means detect that the cleaning element passes through the insertion zone and then manipulates the switching element of the application device to release the liquid. Therefore, the user of the dampening device does not have to perform manual manipulation of the applicator.

特定言之,該潤濕裝置可被設計用來潤濕清潔滾筒,該清潔滾筒呈圓柱形且具有與其直徑相比較大的縱向延伸。作為替代方案,該潤濕裝置亦可被配置為用於潤濕其他清潔元件,例如呈平面狀之清潔元件或例如設於平面載體上之清潔元件。其中有利地,清潔元件在任何情況下皆具有固有穩定性,該固有穩定性能使清潔元件穿過穿插區,從而有助於清潔元件被均勻潤濕。藉此確保清潔元件能對開關元件實施操縱,從而得以對本創作之功能加以利用。一旦清潔元件完全穿過穿插區且因而不再操縱開關元件,施加裝置遂自動再度關閉而停止向清潔元件施加液體。較佳地,使用者手動導引清潔元件穿過穿插區。如此便無需透過外部供能來使清潔元件位移。作為替代方案,清潔元件亦可自動穿過穿插區,例如在與濕式清潔設備配合作用之基座內部,該基座在濕式清潔設備上實施服務行為,例如為蓄電池充電或者藉由整合於該基座中之潤濕裝置潤濕清潔滾筒。其中,可藉由一機構自濕式清潔設備中取出清潔元件並送往潤濕裝置或者連同濕式清潔設備之一分區插入基座。採用此項實施方案時,使用者不再接觸液體。 In particular, the dampening device can be designed to wet the cleaning roller, which is cylindrical in shape and has a large longitudinal extension compared to its diameter. Alternatively, the dampening device can also be configured to wet other cleaning elements, such as planar cleaning elements or cleaning elements such as those provided on a planar carrier. Advantageously, the cleaning element in any case has an inherent stability which enables the cleaning element to pass through the insertion zone, thereby facilitating the uniform wetting of the cleaning element. This ensures that the cleaning element can manipulate the switching element, thereby enabling the use of the functions of the present creation. Once the cleaning element has completely passed through the insertion zone and thus no longer manipulates the switching element, the application device automatically closes again to stop applying liquid to the cleaning element. Preferably, the user manually guides the cleaning element through the insertion zone. This eliminates the need for external heating to displace the cleaning elements. As an alternative, the cleaning element can also automatically pass through the insertion zone, for example inside a base that cooperates with the wet cleaning device, which performs service behavior on the wet cleaning device, for example for charging the battery or by integrating A dampening device in the base wets the cleaning roller. Wherein, the cleaning element can be removed from the wet cleaning device by a mechanism and sent to the wetting device or inserted into the base along with one of the wet cleaning devices. With this embodiment, the user no longer contacts the liquid.

本創作進一步提出,該穿插區至少部分呈圓柱形,尤其可供同樣呈圓柱形之清潔滾筒以形狀對應之方式沿軸向穿過。此項實施方案特別適合用來穿插圓柱形清潔滾筒,因為例如穿插區之壁部可按導引滑座樣式為清潔元件規定穿插方向。該穿插區例如可被配置為圓柱形半殼,具有相應直徑之清潔元件可沿著此半殼受導 引。 The present invention further proposes that the insertion zone is at least partially cylindrical, in particular for a likewise cylindrical cleaning drum to pass axially in a correspondingly corresponding manner. This embodiment is particularly suitable for inserting a cylindrical cleaning drum, since for example the wall of the insertion zone can define the direction of insertion of the cleaning element in the direction of the guide carriage. The intervening zone can be configured, for example, as a cylindrical half-shell, along which the cleaning elements of corresponding diameter can be guided lead.

有利地,該施加裝置呈環形。若潤濕裝置例如被配置為用於潤濕清潔滾筒,則施加裝置橫截面可呈圓環形。但若清潔元件具有其他橫截面形狀,則施加裝置亦可例如形成橢圓形環、矩形環或其他幾何形狀。施加裝置有利地設於穿插區之入口區域且較佳形成穿插區之入口,清潔元件可經該入口進入穿插區。如此一來,施加裝置同時具有兩項功能。其一,施加裝置規定潤濕裝置內部可供潤濕裝置之使用者將清潔元件插入穿插區之位置,再者,施加裝置係用於向清潔元件施加液體。最後,施加裝置本身亦在清潔元件穿過穿插區期間提供導引,尤其與匹配於清潔元件之形狀的形狀配合作用。 Advantageously, the application device is annular. If the dampening device is for example configured to wet the cleaning roller, the applicator device may have a circular cross section. However, if the cleaning element has other cross-sectional shapes, the application means may, for example, form an elliptical ring, a rectangular ring or other geometric shape. The application means is advantageously provided in the inlet region of the insertion zone and preferably forms the inlet of the insertion zone through which the cleaning element can enter the insertion zone. In this way, the application device has two functions at the same time. First, the application means that the user of the dampening device inside the dampening device inserts the cleaning element into the insertion zone, and the applicator is used to apply the liquid to the cleaning element. Finally, the application device itself also provides guidance during the passage of the cleaning element through the insertion zone, in particular with a form fit that matches the shape of the cleaning element.

本創作提出,該施加裝置較佳可拆卸地設於該潤濕裝置上以便更換。藉此可根據待潤濕之清潔元件的大小來為潤濕裝置配設不同施加裝置,例如配設不同大小的環形施加裝置以用於不同直徑之清潔元件。原則上可以不同方式安裝施加裝置。特別推薦卡接或螺接。此外亦可設置如下:施加裝置可動地支承於潤濕裝置上,必要時以方便清潔元件插入穿插區。該可動支承使得施加裝置例如能相對於潤濕裝置偏轉較小角度範圍,例如最大+/-5°之角度範圍。針對以下情形,此係有益的:潤濕裝置之使用者在將清潔元件例如插入施加裝置時致使清潔元件傾斜。 The present application proposes that the application device is preferably detachably mounted on the dampening device for replacement. In this way, different application devices can be provided for the dampening device depending on the size of the cleaning element to be wetted, for example with differently sized ring applicators for cleaning elements of different diameters. In principle, the application device can be mounted in different ways. It is especially recommended to snap or screw. Furthermore, it can also be provided that the application device is movably supported on the dampening device, if necessary, to facilitate the insertion of the cleaning element into the insertion region. The movable support allows the application device to be deflected, for example, by a small angular range relative to the dampening device, for example an angular range of up to +/- 5[deg.]. This is beneficial in situations where the user of the wetting device causes the cleaning element to tilt when the cleaning element is inserted, for example, into the application device.

此外可設置如下:該施加裝置具有數個指向該穿插區之施加噴嘴,該等施加噴嘴特別呈環形沿該施加裝置之周向依次佈置。施加噴嘴較佳等距佈置,從而能均勻潤濕清潔元件之表面。若施加裝置橫截面例如呈圓環形,則施加噴嘴之排出孔較佳沿徑向朝 圓心定向,即朝清潔滾筒之縱軸方向定向。施加噴嘴較佳位於一垂直於清潔元件之縱向延伸的公共平面內。施加噴嘴可特別簡單地為單純的出液孔且/或具有一能提高施加裝置之出液速度的形狀。 Furthermore, it can be provided that the application device has a plurality of application nozzles which are directed toward the insertion region, the application nozzles being arranged in particular annularly in the circumferential direction of the application device. The application nozzles are preferably equidistantly arranged to uniformly wet the surface of the cleaning elements. If the cross-section of the application device is, for example, circular, the discharge orifice of the application nozzle is preferably oriented radially The center of the circle is oriented towards the longitudinal axis of the cleaning roller. The application nozzle is preferably located in a common plane that extends perpendicular to the longitudinal direction of the cleaning element. The application nozzle can be particularly simple as a simple liquid outlet and/or has a shape which increases the velocity of the application device.

較佳地,該開關元件與閥門處於作用性連接,尤其與活塞連接,該活塞用於打開及/或關閉該液箱與該施加裝置之間的流徑。據此,施加裝置對應於閥門,該閥門阻止或允許釋放液箱中之液體。閥門設於液箱與施加裝置之間且具有封閉流徑之活塞。透過開關元件之開關操作來關閉或打開閥門。若開關元件例如為藉由接觸清潔元件而受操縱之開關,則閥挺桿及活塞發生位移。若開關元件為電子組件且該電子組件例如根據光學、電容式或聲學感測裝置之偵測過程來實施開關操作,則可藉由致動器來使閥挺桿及活塞位移。 Preferably, the switching element is in operative connection with the valve, in particular with a piston for opening and/or closing the flow path between the tank and the application device. Accordingly, the application device corresponds to a valve that blocks or allows the liquid in the tank to be released. The valve is disposed between the tank and the application device and has a piston with a closed flow path. The valve is closed or opened by the switching operation of the switching element. If the switching element is, for example, a switch that is manipulated by contact with the cleaning element, the valve tappet and the piston are displaced. If the switching element is an electronic component and the electronic component performs a switching operation, for example, according to a detection process of an optical, capacitive or acoustic sensing device, the valve tappet and the piston can be displaced by the actuator.

此外可設置如下:該開關元件對應於彈性元件,該彈性元件之復位力反向於該開關元件之操縱方向。在此項技術方案中,開關元件具有首選位置,該首選位置對應於前述閥門之關閉位置。因此,開關元件基本上處於施加裝置不釋放液體之位置。惟當穿過穿插區之清潔元件對開關元件實施操縱時,開關元件方克服彈性元件之復位力而位移,並使液體能夠到達清潔元件上。彈性元件較佳可呈環形圍繞穿插區形成,例如按螺簧或彈性塑膠密封件樣式。當清潔元件穿過穿插區時,清潔元件接觸開關元件並且一方面使開關元件克服彈性元件之復位力而位移,另一方面使閥挺桿位移。藉此打開液箱與施加裝置之間的流徑,使得液體能夠到達清潔元件上。 Furthermore, it can be provided that the switching element corresponds to an elastic element whose restoring force is opposite to the steering direction of the switching element. In this solution, the switching element has a preferred position that corresponds to the closed position of the aforementioned valve. Therefore, the switching element is substantially in a position where the application device does not release the liquid. Only when the switching element is manipulated by the cleaning element passing through the insertion zone, the switching element is displaced against the restoring force of the elastic element and enables liquid to reach the cleaning element. Preferably, the resilient member is formed in a ring shape around the insertion region, such as in the form of a coil spring or an elastomeric plastic seal. When the cleaning element passes through the insertion zone, the cleaning element contacts the switching element and on the one hand displaces the switching element against the restoring force of the elastic element and on the other hand displaces the valve tappet. Thereby the flow path between the tank and the application device is opened so that liquid can reach the cleaning element.

尤佳地,該開關元件可具有操縱方向,該操縱方向大 致平行於該清潔元件在該穿插區內之穿插方向。此項技術方案係依靠清潔元件之持續運動來控制施加裝置。如此一來,開關元件並非在施加裝置內部單純存在清潔元件時即已受到操縱,意即,被在施加裝置之平面內徑向向外作用的力操縱,而是被垂直於此(即較佳係平行於清潔元件在穿插區內之穿插方向)作用的力操縱。由此,開關元件僅在目前有力沿此方向作用於開關元件時實施開關操作,一般而言,此種情形僅發生於清潔元件相對於開關元件運動時。因此,若清潔元件雖被插入穿插區,但於該處保持不動,則平行於穿插方向之方向上不存在對施加裝置實施操縱之作用力。藉此可依靠彈性元件之復位力來避免以下情形:當清潔元件在穿插區內靜止不動時,清潔元件之分區被過度潤濕。較佳如此佈置並配置開關元件,使得開關元件在清潔元件被插入穿插區時接觸清潔元件,並且在清潔元件進一步移入穿插區時基於摩擦阻力而沿操縱方向被一併拉動,且在此期間壓縮前文所提出之彈性元件並打開閥門。若使用者在此情形下鬆開清潔元件或者減小操縱方向上的力,則依彈性元件之復位力而會出現以下結果:彈性元件之復位力超過使用者所施加的力並將閥門關閉。在此情況下,不再有液體能透過施加裝置到達清潔元件上。惟當使用者繼續使清潔元件在穿插區內位移時,閥門方再度打開而釋放液體。 More preferably, the switching element can have a steering direction that is large So as to be parallel to the direction of insertion of the cleaning element in the intervening zone. This technical solution relies on the continuous movement of the cleaning elements to control the application device. In this way, the switching element is not manipulated when the cleaning element is simply present inside the application device, that is to say, it is manipulated by a force acting radially outward in the plane of the application device, but is perpendicular thereto (ie preferably Forced in parallel with the force acting in the direction of insertion of the cleaning element in the insertion zone. Thereby, the switching element performs the switching operation only when it is currently forced to act on the switching element in this direction. In general, this situation only occurs when the cleaning element is moved relative to the switching element. Therefore, if the cleaning element is inserted into the insertion region, but remains there, there is no force for manipulating the application device in the direction parallel to the insertion direction. Thereby, the restoring force of the elastic element can be relied upon to avoid the situation where the partition of the cleaning element is excessively wetted when the cleaning element is stationary in the insertion zone. Preferably, the switching element is arranged and arranged such that the switching element contacts the cleaning element when the cleaning element is inserted into the insertion zone and is pulled together in the steering direction based on frictional resistance when the cleaning element is further moved into the insertion zone, and compressed during this time The elastic element proposed above and open the valve. If the user loosens the cleaning element or reduces the force in the steering direction in this situation, the following result occurs depending on the restoring force of the elastic element: the restoring force of the elastic element exceeds the force applied by the user and closes the valve. In this case, no more liquid can pass through the application device to the cleaning element. However, when the user continues to displace the cleaning element within the insertion zone, the valve opens again to release the liquid.

本創作提出,該潤濕裝置之該泵為可手動操縱的空氣泵,該空氣泵用於在該液箱中產生工作壓力,該工作壓力在該施加裝置受到操縱時致使液體排出至穿插區內。透過此項技術方案,並結合以手動方式將清潔元件穿過穿插區,該潤濕裝置得以完全不依賴於外部供能而運行,可在任意場所使用且以節約資源之方式工 作。該泵將空氣輸送入液箱內部且具有止回閥,使得空氣能夠被送入液箱,但空氣及液體皆無法透過該泵離開液箱。使用者藉由對該泵實施一次或數次操縱來提高液箱內部壓力。一旦施加裝置打開,即施加裝置之閥門打開,液體遂經由液箱與施加裝置之間的流徑流向清潔元件。為此可在液箱內部設置立管,其一端位於液箱底部區域,另一端位於施加裝置之閥門上。 The present invention proposes that the pump of the dampening device is a manually operable air pump for generating a working pressure in the tank, the working pressure causing liquid to be discharged into the intervening zone when the applicator is manipulated . Through this technical solution, and in combination with manually passing the cleaning element through the insertion zone, the dampening device can be operated completely independent of external energy supply, can be used in any place and is saved in a resource-saving manner. Work. The pump delivers air into the interior of the tank and has a check valve that allows air to be sent to the tank, but neither air nor liquid can escape the tank through the pump. The user increases the internal pressure of the tank by performing one or several manipulations of the pump. Once the application device is opened, ie the valve of the application device is opened, the liquid helium flows to the cleaning element via the flow path between the liquid tank and the application device. For this purpose, a riser can be arranged inside the tank, one end of which is located in the bottom region of the tank and the other end on the valve of the application device.

除前文所提出之潤濕裝置外,本創作最後同樣提出一種可連接濕式清潔設備之基座,該基座具有前述之潤濕裝置。該基座例如可被設計用來實施不同的服務行為,例如為被配置為清潔機器人之濕式清潔設備的蓄電池充電且同時潤濕該濕式清潔設備之清潔元件。此外,該基座亦可具有一機構,該機構將清潔元件自濕式清潔設備中取出並導引清潔元件進入潤濕裝置之穿插區。 In addition to the wetting device proposed above, the present application finally proposes a base that can be connected to a wet cleaning device having the aforementioned wetting device. The pedestal can be designed, for example, to perform different service activities, such as charging a battery that is configured to clean the robot's wet cleaning device while simultaneously wetting the cleaning elements of the wet cleaning device. In addition, the base may also have a mechanism that removes the cleaning element from the wet cleaning apparatus and directs the cleaning element into the insertion zone of the dampening unit.

其中,該基座可被配置為用於不同類型之濕式清潔設備,例如既用於手持式清潔設備,亦用於自動移行式清潔設備,例如清潔機器人。另外,該濕式清潔設備亦可為既執行擦拭任務亦執行抽吸任務之清潔設備。 Therein, the base can be configured for different types of wet cleaning devices, for example for both hand held cleaning devices and automatic moving cleaning devices, such as cleaning robots. In addition, the wet cleaning device can also be a cleaning device that performs both a wiping task and a suction task.

根據本創作,該潤濕裝置較佳被配置為分立設備(單機),但該潤濕裝置亦可為濕式清潔設備的一部分且固定地設於該濕式清潔設備中。其中,該濕式清潔設備具有能將清潔元件轉移至潤濕裝置中之機構。 According to the present invention, the dampening device is preferably configured as a discrete device (single machine), but the dampening device can also be part of the wet cleaning device and fixedly disposed in the wet cleaning device. Among other things, the wet cleaning device has a mechanism that can transfer the cleaning element into the dampening unit.

1‧‧‧潤濕裝置 1‧‧‧ Wetting device

2‧‧‧清潔元件 2‧‧‧ cleaning components

3‧‧‧液箱 3‧‧‧liquid tank

4‧‧‧泵 4‧‧‧ pump

5‧‧‧施加裝置 5‧‧‧Applying device

6‧‧‧殼體 6‧‧‧Shell

7‧‧‧穿插區 7‧‧‧Insert zone

8‧‧‧開關元件 8‧‧‧Switching elements

9‧‧‧施加噴嘴 9‧‧‧Applying a nozzle

10‧‧‧流徑 10‧‧‧ flow path

11‧‧‧彈性元件 11‧‧‧Flexible components

12‧‧‧操縱方向 12‧‧‧Management direction

13‧‧‧泵按鍵 13‧‧‧ pump button

14‧‧‧加注管 14‧‧‧Adding tube

15‧‧‧吸入閥 15‧‧‧Inhalation valve

16‧‧‧立管 16‧‧‧Riser

17‧‧‧閥挺桿 17‧‧‧ valve tappet

18‧‧‧活塞 18‧‧‧Piston

19‧‧‧閥座 19‧‧‧ valve seat

20‧‧‧閥門 20‧‧‧ valve

下面結合實施例詳細闡述本創作。其中:圖1為本創作之潤濕裝置;圖2為潤濕裝置縱剖面; 圖3為潤濕裝置之上部分區,該分區包含施加裝置且該施加裝置處於關閉位置;圖4為如圖3之分區,施加裝置處於打開位置;圖5為施加裝置立體圖;圖6為施加裝置之立體縱剖面;圖7為清潔元件部分插入時之潤濕裝置;圖8為清潔元件完全插入時之潤濕裝置;圖9為清潔元件已被取出時之潤濕裝置;圖10為潤濕裝置後視圖。 The present invention will be described in detail below in conjunction with the embodiments. Wherein: Figure 1 is the wetting device of the present invention; Figure 2 is a longitudinal section of the wetting device; Figure 3 is a partial region above the wetting device, the partition containing the application device and the application device in the closed position; Figure 4 is the partition of Figure 3, the application device is in the open position; Figure 5 is a perspective view of the application device; Figure 6 is the application 3 is a longitudinal section of the device; FIG. 7 is a wetting device when the cleaning element is partially inserted; FIG. 8 is a wetting device when the cleaning element is completely inserted; FIG. 9 is a wetting device when the cleaning element has been taken out; Rear view of the wet device.

圖1示出具有殼體6之潤濕裝置1,該殼體中形成有穿插區7。在穿插區7內設有清潔元件2,該清潔元件在此為濕式清潔設備之清潔滾筒。清潔元件2上包裹有清潔用覆蓋物,二者間視情況夾設有附加性地產生儲液作用之海綿體。該清潔用覆蓋物在此例如為紡織清潔布。 Figure 1 shows a dampening device 1 having a housing 6 in which a perforation zone 7 is formed. In the insertion zone 7, a cleaning element 2 is provided, which is here a cleaning roller of the wet cleaning device. The cleaning element 2 is covered with a cleaning cover, and a sponge body which additionally generates a liquid storage function is optionally sandwiched between them. The cleaning cover is here, for example, a textile cleaning cloth.

穿插區7對應於施加裝置5,藉由該施加裝置可將液體自潤濕裝置1之液箱3釋放至清潔元件2之表面。液箱3具有用於裝灌液箱3之加注管14。液箱3透過立管16連接施加裝置5。此外,液箱3對應於泵4,在此為空氣泵,藉由泵按鍵13可手動操縱該泵。藉由一次或數次操縱,潤濕裝置1之使用者可將空氣泵入液箱3,其中空氣經吸入閥15進入液箱3。因此,藉由操縱泵4提高液箱3內部之壓力,此壓力在施加裝置5打開之情況下致使立管16內部之液體上升。 The insertion zone 7 corresponds to the application device 5 by which the liquid can be released from the tank 3 of the dampening device 1 to the surface of the cleaning element 2. The tank 3 has a filling tube 14 for filling the tank 3. The tank 3 is connected to the application device 5 through a riser 16. Furthermore, the tank 3 corresponds to the pump 4, here an air pump, which can be manually operated by the pump button 13. By one or several manipulations, the user of the dampening unit 1 can pump air into the tank 3, wherein the air enters the tank 3 via the suction valve 15. Therefore, the pressure inside the liquid tank 3 is raised by operating the pump 4, which causes the liquid inside the riser 16 to rise when the application device 5 is opened.

儘管潤濕裝置1在此被配置為分立設備,係獨立於容 置有清潔元件2之濕式清潔設備,但潤濕裝置1亦可為濕式清潔設備的一部分或者為用於濕式清潔設備之基座的一部分,除潤濕清潔元件2外,該基座亦實施其他服務行為,例如為蓄電池充電、在清潔元件2上實施再生程序等等。其中,亦可如此配置基座,使得濕式清潔設備例如作為自動移行式機器人能至少部分地移入基座。基座可有利地具有一機構,該機構將清潔元件2自濕式清潔設備中取出並轉移至形成潤濕裝置1之基座分區內。 Although the wetting device 1 is here configured as a discrete device, it is independent of the capacity a wet cleaning device provided with a cleaning element 2, but the dampening device 1 may also be part of a wet cleaning device or part of a base for a wet cleaning device, except for the wetting cleaning element 2, the base Other service activities are also implemented, such as charging the battery, implementing a regeneration program on the cleaning element 2, and the like. Therein, the base can also be configured such that the wet cleaning device can be at least partially moved into the base, for example as an automatic mobile robot. The base may advantageously have a mechanism that removes the cleaning element 2 from the wet cleaning apparatus and transfers it into the base section forming the dampening unit 1.

圖2示出潤濕裝置1之縱剖面。潤濕裝置1在圖中的上部分區內具有施加裝置5,該施加裝置呈環形圍繞清潔元件2之一分區形成。施加裝置5具有數個施加噴嘴9,該等施加噴嘴徑向朝內且形成在同一個垂直於清潔元件2之縱向延伸的平面內。施加噴嘴9為開關元件8的一部分,該開關元件同樣呈環形圍繞清潔元件2形成且可沿操縱方向12(參見圖4)平行於清潔元件2之縱向延伸位移。開關元件8對應於彈性元件11,該彈性元件在此被配置為彈性環。彈性元件11之復位力反向於開關元件8之操縱方向12作用。透過開關元件8沿操縱方向12位移或反向於操縱方向12位移,可打開或關閉在液箱3與施加噴嘴9間延伸之流徑10。在流徑10中設有包含閥挺桿17、活塞18及閥座19之閥門20。開關元件8位移的同時,活塞18透過閥挺桿17發生位移並向液箱3打開流徑10。 Figure 2 shows a longitudinal section of the dampening unit 1. The dampening device 1 has an application device 5 in the upper partial region of the drawing, which is formed in an annular shape around one of the cleaning elements 2. The application device 5 has a plurality of application nozzles 9, which are radially inwardly formed and formed in the same plane extending perpendicularly to the longitudinal direction of the cleaning element 2. The application nozzle 9 is part of a switching element 8, which is likewise formed annularly around the cleaning element 2 and is displaceable in the longitudinal direction of the cleaning element 2 in the direction of manipulation 12 (see FIG. 4). The switching element 8 corresponds to the elastic element 11 , which is here configured as an elastic ring. The restoring force of the elastic element 11 acts against the steering direction 12 of the switching element 8. The flow path 10 extending between the tank 3 and the application nozzle 9 can be opened or closed by displacement of the switching element 8 in the steering direction 12 or in the opposite direction to the steering direction 12. A valve 20 including a valve lifter 17, a piston 18 and a valve seat 19 is provided in the flow path 10. While the switching element 8 is being displaced, the piston 18 is displaced through the valve lifter 17 and opens the flow path 10 to the tank 3.

圖3及圖4以放大圖示出潤濕裝置1之上端區,其中圖3示出閥門20關閉時之施加裝置5(穿插區7內無清潔元件2),且其中圖4示出閥門20打開時之施加裝置5(穿插區7內有清潔元件2)。 Figures 3 and 4 show the upper end region of the dampening device 1 in an enlarged view, wherein Figure 3 shows the applicator 5 when the valve 20 is closed (no cleaning element 2 in the interposing zone 7), and Figure 4 shows the valve 20 The application device 5 is opened (the cleaning element 2 is present in the insertion zone 7).

圖5及圖6以立體圖示出施加裝置5。具體而言,圖5所示之施加裝置5呈環形且在其內壁上承載數個施加噴嘴9,該等施加噴嘴等距佈置且指向中軸線。開關元件8之內側在施加噴嘴9區域具有凸出部,因而橫截面呈V形,參見圖6所示。該V形之尖端被配置為用於接觸插入穿插區7之清潔元件2。 5 and 6 show the application device 5 in a perspective view. In particular, the application device 5 shown in Figure 5 is annular and carries several application nozzles 9 on its inner wall, which are arranged equidistantly and directed towards the central axis. The inner side of the switching element 8 has a projection in the region of the application nozzle 9, and thus has a V-shaped cross section, as shown in Fig. 6. The V-shaped tip is configured to contact the cleaning element 2 inserted into the insertion zone 7.

圖5進一步在施加裝置5之開關元件8下方示出同樣呈環形之彈性元件11。彈性元件11在此例如由彈性材料構成,例如PTFE或類似材料。 FIG. 5 further shows an elastic element 11 which is likewise annular below the switching element 8 of the application device 5. The elastic element 11 here consists, for example, of an elastic material, for example PTFE or a similar material.

圖7至圖9示出具有清潔元件2之潤濕裝置1,其中自圖7開始,清潔元件2首先僅部分插入潤濕裝置1之穿插區7,而後在圖8中完全設於穿插區7內,最後如圖9所示,再度自潤濕裝置1中被取出。 7 to 9 show a dampening device 1 having a cleaning element 2, wherein starting from Fig. 7, the cleaning element 2 is first only partially inserted into the insertion zone 7 of the dampening device 1, and then completely in the interposing zone 7 in Fig. 8. Inside, finally, as shown in Fig. 9, the self-wetting device 1 is taken out again.

最後,圖10以相對於圖7至圖9的後視角度示出潤濕裝置1,其中可看到用於操縱泵4之泵按鍵13。泵按鍵13可平行於潤濕裝置1之縱向延伸位移,以便對泵4實施操縱。 Finally, Figure 10 shows the wetting device 1 in a rear view angle relative to Figures 7 to 9, in which the pump button 13 for operating the pump 4 can be seen. The pump button 13 can be displaced parallel to the longitudinal extension of the dampening unit 1 for manipulation of the pump 4.

本創作之工作原理如下:首先,潤濕裝置1之使用者將液體(尤指水)裝入液箱3。為此,使用者打開與液箱3連接之加注管14。裝灌完畢後再度關閉液箱3,即關閉加注管14。接著,使用者藉由泵按鍵13對泵4實施操縱,其實現方式為,使用者向下(即沿潤濕裝置1之縱向延伸)按壓泵按鍵13一次或數次。如此一來,空氣經吸入閥15進入液箱3並提高液箱3內部之壓力。由於吸入閥15被配置為止回閥,而使此壓力得以保持。 The working principle of the present creation is as follows: First, the user of the dampening device 1 loads a liquid (especially water) into the liquid tank 3. To this end, the user opens the filling tube 14 connected to the tank 3. After the filling is completed, the tank 3 is closed again, that is, the filling tube 14 is closed. Next, the user manipulates the pump 4 by means of the pump button 13 in such a way that the user presses the pump button 13 one or several times downwards (i.e., in the longitudinal direction of the dampening device 1). As a result, air enters the tank 3 through the suction valve 15 and increases the pressure inside the tank 3. This pressure is maintained because the suction valve 15 is configured to return the valve.

接著,使用者將清潔元件2之端區穿過環形施加裝置5插入穿插區7,藉此將清潔元件2插入潤濕裝置1。在此過程中, 清潔元件2接觸開關元件8,即接觸開關元件8徑向向內凸出之尖端,施加噴嘴9設於該尖端上。其間產生於開關元件8與清潔元件2之間的摩擦阻力使得開關元件8沿操縱方向12位移,意即,在圖中係垂直向下位移。開關元件8在此係反向於彈性元件11之復位力位移,此復位力試圖使開關元件8返回初始關閉位置。 Next, the user inserts the end region of the cleaning element 2 through the annular applicator 5 into the insertion zone 7, whereby the cleaning element 2 is inserted into the wetting device 1. during this process, The cleaning element 2 contacts the switching element 8, i.e. the tip of the contact switching element 8, which projects radially inwardly, on which the application nozzle 9 is arranged. The frictional resistance generated between the switching element 8 and the cleaning element 2 causes the switching element 8 to be displaced in the steering direction 12, that is, vertically downward in the figure. In this case, the switching element 8 is displaced against the restoring force of the elastic element 11, which attempts to return the switching element 8 to the initial closed position.

在潤濕裝置1之使用者將清潔元件2進一步移入穿插區7期間,清潔元件2與開關元件8之間保持所消耗之摩擦力且該摩擦力超過復位力,使得開關元件8繼續朝彈性元件11方向位移。開關元件8之位移使得閥門20之閥挺桿17及活塞18朝液箱3方向位移,其中流徑10打開,並且液體基於液箱3內部之升高壓力而可經由立管16及流徑10到達施加噴嘴9並被釋放到清潔元件2上。 During the further movement of the cleaning element 2 by the user of the dampening device 1 into the insertion zone 7, the frictional force consumed between the cleaning element 2 and the switching element 8 is maintained and the frictional force exceeds the restoring force, so that the switching element 8 continues towards the elastic element 11 direction displacement. The displacement of the switching element 8 causes the valve tappet 17 and the piston 18 of the valve 20 to be displaced toward the tank 3, wherein the flow path 10 is opened, and the liquid can pass through the riser 16 and the flow path 10 based on the elevated pressure inside the tank 3. The application nozzle 9 is reached and released onto the cleaning element 2.

使用者將清潔元件2繼續移入穿插區7,其中清潔元件2之周面既在周向上亦在軸向上被完全潤濕。一旦清潔元件2上不再有分區位於施加裝置5內部,作用於開關元件8之摩擦力遂消失,並且閥門20之活塞18在彈性元件11之復位力作用下再度位移到閥座19上,從而不再有液體到達施加裝置5。 The user continues to move the cleaning element 2 into the insertion zone 7, wherein the circumferential surface of the cleaning element 2 is completely wetted both in the circumferential direction and in the axial direction. Once the cleaning element 2 no longer has a partition inside the application device 5, the frictional force acting on the switching element 8 disappears, and the piston 18 of the valve 20 is again displaced to the valve seat 19 by the restoring force of the elastic element 11, thereby No more liquid reaches the application device 5.

儘管圖中未示出,但原則上亦可如此配置施加裝置5,使得開關元件8具有操縱方向12,該操縱方向平行於施加噴嘴9所定義之平面,如此一來,清潔元件2被安置於穿插區7時即已觸發開關元件8位移,而無論清潔元件2目前有否運動且由此使清潔元件2與開關元件8之間受到摩擦力作用。在此情況下,施加裝置5之流徑10將總是在清潔元件2被安置於穿插區7時打開。若如此,則潤濕裝置1之使用者須自己費心來導引清潔元件2經過施 加裝置5,以便以較均勻之速度儘可能均勻地潤濕清潔元件。 In principle, the application device 5 can also be configured in such a way that the switching element 8 has a steering direction 12 which is parallel to the plane defined by the application nozzle 9 , so that the cleaning element 2 is placed in FIG. When the insertion zone 7 is inserted, the displacement of the switching element 8 has already been triggered, regardless of whether the cleaning element 2 is currently moving and thus the frictional force between the cleaning element 2 and the switching element 8 is affected. In this case, the flow path 10 of the application device 5 will always open when the cleaning element 2 is placed in the insertion zone 7. If so, the user of the dampening device 1 has to bother to guide the cleaning element 2 through the application. The device 5 is applied to wet the cleaning element as uniformly as possible at a relatively uniform speed.

Claims (11)

一種潤濕裝置,係用於潤濕濕式清潔設備之清潔元件(2),其中該潤濕裝置(1)具有液箱(3)、泵(4)以及用於將液體施加於該清潔元件(2)之施加裝置(5),其特徵在於:該潤濕裝置(1)具有帶穿插區(7)之殼體(6),該穿插區(7)可供該清潔元件(2)穿過以藉由該施加裝置(5)實施潤濕,其中該施加裝置(5)至少部分地圍繞該穿插區(7)形成,且其中該施加裝置(5)對應於指向該穿插區(7)之開關元件(8),該開關元件(8)用於藉由穿過該穿插區(7)之該清潔元件(2)對該施加裝置(5)實施操縱。 A dampening device for wetting a cleaning element (2) of a wet cleaning device, wherein the dampening device (1) has a tank (3), a pump (4) and a liquid for applying the cleaning element to the cleaning element (2) Application device (5), characterized in that the dampening device (1) has a housing (6) with a perforation zone (7), which can be worn by the cleaning element (2) The wetting is carried out by means of the application device (5), wherein the application device (5) is formed at least partially around the insertion region (7), and wherein the application device (5) corresponds to the insertion region (7) A switching element (8) for manipulating the application device (5) by means of the cleaning element (2) passing through the insertion zone (7). 如請求項1之潤濕裝置,其中,該穿插區(7)至少部分呈圓柱形。 A dampening device according to claim 1, wherein the intervening zone (7) is at least partially cylindrical. 如請求項1或2之潤濕裝置,其中,該施加裝置(5)呈環形。 A dampening device according to claim 1 or 2, wherein the applicator (5) is annular. 如請求項1之潤濕裝置,其中,該施加裝置(5)可拆卸地設於該潤濕裝置(1)上以便更換。 A dampening device according to claim 1, wherein the applicator (5) is detachably provided on the dampening device (1) for replacement. 如請求項1之潤濕裝置,其中,該施加裝置(5)具有數個指向該穿插區(7)之施加噴嘴(9)。 A dampening device according to claim 1, wherein the applicator (5) has a plurality of application nozzles (9) directed to the interposing zone (7). 如請求項5之潤濕裝置,其中,該等施加噴嘴(9)特別呈環形沿該施加裝置(5)之周向依次佈置。 A dampening device according to claim 5, wherein the applicator nozzles (9) are arranged in a particular annular shape in the circumferential direction of the applicator (5). 如請求項1之潤濕裝置,其中,該開關元件(8)與閥門(20)處於作用性連接,尤其與活塞(18)連接,該活塞(18)用於打開及/或關閉該液箱(3)與該施加裝置(5)之間的流徑(10)。 The dampening device of claim 1, wherein the switching element (8) is in operative connection with a valve (20), in particular connected to a piston (18) for opening and/or closing the liquid tank (3) A flow path (10) with the application device (5). 如請求項1之潤濕裝置,其中,該開關元件(8)對應於彈性元件(11),該彈性元件(11)之復位力反向於該開關元件(8)之操縱方向(12)。 A dampening device according to claim 1, wherein the switching element (8) corresponds to the elastic member (11), and the restoring force of the elastic member (11) is opposite to the steering direction (12) of the switching member (8). 如請求項1之潤濕裝置,其中,該開關元件(8)具有操縱方向(12),該操縱方向(12)平行於該清潔元件(2)在該穿插區(7)內之穿插方向。 A dampening device according to claim 1, wherein the switching element (8) has a steering direction (12) which is parallel to the insertion direction of the cleaning element (2) in the insertion zone (7). 如請求項1之潤濕裝置,其中,該泵(4)為可手動操縱的空氣泵,該空氣泵用於在該液箱(3)中產生工作壓力,該工作壓力在該施加裝置(5)受到操縱時致使液體排出至該穿插區(7)內。 The dampening device of claim 1, wherein the pump (4) is a manually operable air pump for generating a working pressure in the tank (3), the working pressure being at the applying device (5) When it is manipulated, liquid is discharged into the intervening zone (7). 一種基座,可連接濕式清潔設備以在該濕式清潔設備上實施服務行為,其特徵在於如請求項1之潤濕裝置(1)。 A susceptor to which a wet cleaning apparatus can be attached to perform a service behavior on the wet cleaning apparatus, characterized by a wetting device (1) of claim 1.
TW106210317U 2016-07-20 2017-07-13 Wetting device for cleaning elements and base having the same TWM557581U (en)

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