TW201804562A - Adsorption unit plate-like member transporting unit resin sealing apparatus transporting method for plate-like member and sealing method for resin - Google Patents

Adsorption unit plate-like member transporting unit resin sealing apparatus transporting method for plate-like member and sealing method for resin Download PDF

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TW201804562A
TW201804562A TW106109690A TW106109690A TW201804562A TW 201804562 A TW201804562 A TW 201804562A TW 106109690 A TW106109690 A TW 106109690A TW 106109690 A TW106109690 A TW 106109690A TW 201804562 A TW201804562 A TW 201804562A
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pad
adsorption
plate
unit
adsorption unit
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TW106109690A
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Chinese (zh)
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TWI652760B (en
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Hiroki Owari
Naoki Takada
Keita Mizuma
Akito Oba
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Towa Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90Devices for picking-up and depositing articles or materials
    • B65G47/91Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
    • B65G47/918Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers with at least two picking-up heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02Articles
    • B65G2201/0214Articles of special size, shape or weigh
    • B65G2201/022Flat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)

Abstract

An adsorption unit (1) comprises: a main body unit (10); an inner hollow flow passage (5) of the main body unit (10); and an adsorption unit (110) of an adsorption surface of the main body unit (10). A through-hole (45) is provided to the adsorption unit (110), and the through-hole (45) and the flow passage (5) are connected. The adsorption unit (110) is configured to follow a curve of a planar member.

Description

吸附單元、板狀元件搬運單元、樹脂密封裝置、板狀元件搬運方法以及樹脂密封方法 Adsorption unit, plate-shaped component conveying unit, resin sealing device, plate-shaped component conveying method, and resin sealing method

本發明係有關於一種吸附單元、板狀元件搬運單元、樹脂密封裝置、板狀元件搬運方法以及樹脂密封方法。 The present invention relates to an adsorption unit, a plate-like element conveying unit, a resin sealing device, a plate-like element conveying method, and a resin sealing method.

以往係對各個電子元件進行樹脂密封,但是近年來進行在被搭載複數個電子元件之晶圓的狀態進行樹脂密封的晶圓位準封裝(WLP)者變多。因此,在樹脂密封裝置,要求在樹脂密封前及樹脂密封後固持晶圓並搬運之吸附裝置的事例逐漸增加。 In the past, each electronic component was resin-sealed. However, in recent years, more wafer level packages (WLPs) have been used to perform resin sealing on a state where a plurality of electronic components are mounted on a wafer. Therefore, in the resin sealing device, the number of examples of the adsorption device that holds and transports the wafer before and after the resin sealing is increasing.

在日本專利特開2013-42017號公報,記載在前端與底部側之3處形成可吸附工件之外周的吸附孔及與其連通之吸入路的機器手。 Japanese Patent Laid-Open No. 2013-42017 describes a robot in which suction holes for suctioning the outer periphery of a workpiece are formed at three positions on the front end and the bottom side, and a suction path communicating therewith.

例如在WLP,在樹脂密封前,將例如電子元件等搭載於晶圓,但是可能因該搭載而晶圓彎曲(變形)。 For example, in WLP, an electronic component or the like is mounted on a wafer before resin sealing, but the wafer may be bent (deformed) due to the mounting.

又,在樹脂密封後,在自成形模取出後樹脂密封後的晶圓被冷卻而收縮時,可能因晶圓與密封樹脂之間之熱膨脹率(熱膨脹係數)的差異,而晶圓彎曲(變形)。 In addition, after the resin is sealed, when the resin-sealed wafer is cooled and shrunk after being taken out of the mold, the wafer may be bent (deformed) due to the difference in thermal expansion coefficient (coefficient of thermal expansion) between the wafer and the sealing resin. ).

可是,在以往之專利文獻1所記載之晶圓固持裝 置,可能因為未設想固持彎曲(變形)之晶圓,所以無法穩定地固持晶圓。 However, wafer holding described in the conventional patent document 1 It may not be possible to hold the wafer stably because it is not envisaged to hold the warped (deformed) wafer.

此處所揭示之實施形態係一種吸附單元,其包括:本體部;本體部的內部之中空的流路;以及本體部之吸附面側的吸附部;貫穿孔被設置於吸附部;貫穿孔與流路係連通;吸附部係構成為可追蹤板狀元件的彎曲。 The embodiment disclosed herein is an adsorption unit including: a main body portion; a hollow flow path inside the main body portion; and an adsorption portion on an adsorption surface side of the main body portion; a through hole is provided in the adsorption portion; the through hole and the flow The road system is connected; the suction unit is configured to track the bending of the plate-shaped element.

此處所揭示之實施形態係一種吸附單元,其包括:本體部;本體部的內部之中空的流路;以及本體部之吸附面側的吸附部;貫穿孔被設置於吸附部;貫穿孔與流路係連通;吸附部係包括吸附墊;吸附墊係包括:墊中心部,係被設置墊開口部;從墊中心部所伸展之墊外周部;以及墊內側支撐部,係從比墊外周部更近位側之墊中心部的位置在與墊外周部係相異的方向伸展;缺口部被設置於墊內側支撐部;經由流路與貫穿孔排出氣體;進而,從板狀元件與缺口部之間排出氣體;使吸附部吸附板狀元件;構成為藉由使吸附部吸附板狀元件而使吸附墊產生彈性變形。 The embodiment disclosed herein is an adsorption unit including: a main body portion; a hollow flow path inside the main body portion; and an adsorption portion on an adsorption surface side of the main body portion; a through hole is provided in the adsorption portion; the through hole and the flow The road system is connected; the adsorption unit includes an adsorption pad; the adsorption pad system includes: a pad center portion, which is provided with a pad opening portion; a pad outer peripheral portion extending from the pad center portion; The position of the center portion of the pad on the closer side extends in a direction different from the outer peripheral portion of the pad; the notch portion is provided on the inner support portion of the pad; the gas is discharged through the flow path and the through hole; and further, the plate-shaped element and the notch portion Exhaust gas between them; the adsorption unit adsorbs the plate-like element; and is configured to elastically deform the adsorption pad by causing the adsorption unit to adsorb the plate-like element.

此處所揭示之實施形態係一種板狀元件搬運單元,其包括:上述之吸附單元;及用以使吸附單元移動的移動單元。 The embodiment disclosed herein is a plate-shaped component carrying unit, which includes: the above-mentioned adsorption unit; and a moving unit for moving the adsorption unit.

此處所揭示之實施形態係一種樹脂密封裝置,其包括:上述之板狀元件搬運單元、與樹脂密封單元。 The embodiment disclosed here is a resin sealing device including the above-mentioned plate-shaped component conveying unit and a resin sealing unit.

此處所揭示之實施形態係一種板狀元件搬運方法,其包括:定位步驟,係上述之吸附單元的吸附部位於板狀元件上;吸附步驟,係藉由通過貫穿孔及流路排出氣體,使吸 附部吸附板狀元件;以及移動步驟,係移動吸附部所吸附之板狀元件。 The embodiment disclosed herein is a method for transporting a plate-shaped element, which includes: a positioning step, in which the adsorption portion of the adsorption unit is located on the plate-shaped element; and an adsorption step, which is performed by exhausting gas through a through-hole and a flow path, so that Suck The attachment part adsorbs the plate-like element; and the moving step is to move the plate-like element adsorbed by the adsorption part.

此處所揭示之實施形態係一種樹脂密封方法,其包括:搬運步驟,係使用上述之板狀元件搬運方法來搬運板狀元件;及進行樹脂密封之步驟。 The embodiment disclosed herein is a resin sealing method, which includes a conveying step of conveying a plate-shaped component using the above-mentioned plate-shaped component conveying method; and a step of performing resin sealing.

若依據此處所揭示之實施形態,可穩定地固持彎曲(變形)的板狀元件。 According to the embodiment disclosed herein, a curved (deformed) plate-shaped element can be stably held.

本發明之上述及其他的目的、特徵、形態以及優點係從與附加之圖面相關聯地理解之關於本發明的如下之詳細的說明將明白。 The above and other objects, features, aspects, and advantages of the present invention will be understood from the following detailed description of the present invention understood in association with the attached drawings.

1‧‧‧吸附單元 1‧‧‧Adsorption unit

2‧‧‧吸附面側板 2‧‧‧ Adsorption surface side plate

2a‧‧‧外表面 2a‧‧‧outer surface

3‧‧‧吸附墊 3‧‧‧ Adsorption Pad

4‧‧‧配接器 4‧‧‧ adapter

5‧‧‧流路 5‧‧‧flow

6‧‧‧密封材料 6‧‧‧sealing material

6a‧‧‧O環槽 6a‧‧‧O ring groove

7‧‧‧背面側板 7‧‧‧ back side panel

8‧‧‧晶圓 8‧‧‧ wafer

10‧‧‧本體部 10‧‧‧Body

11‧‧‧離模薄膜 11‧‧‧ Release film

12‧‧‧框 12‧‧‧ frame

14‧‧‧樹脂供給機構 14‧‧‧Resin supply mechanism

15‧‧‧線性進給器 15‧‧‧ Linear Feeder

21‧‧‧凹部 21‧‧‧ recess

21a‧‧‧底面 21a‧‧‧ Underside

30‧‧‧墊中心部 30‧‧‧ pad center

31‧‧‧墊外周部 31‧‧‧ pad periphery

31a‧‧‧遠位端 31a‧‧‧far end

32‧‧‧墊內側支撐部 32‧‧‧ pad inner support

33‧‧‧缺口部 33‧‧‧ gap

35‧‧‧墊開口部 35‧‧‧ pad opening

40‧‧‧配接器本體部 40‧‧‧ adapter body

41‧‧‧配接器腳部 41‧‧‧ adapter feet

41a‧‧‧突起部 41a‧‧‧ protrusion

42‧‧‧凸緣 42‧‧‧ flange

45‧‧‧貫穿孔 45‧‧‧through hole

81‧‧‧密封樹脂(樹脂成形體) 81‧‧‧ sealing resin (resin molding)

110‧‧‧吸附部 110‧‧‧ Adsorption Department

310a‧‧‧遠位端凸部 310a‧‧‧distal end protrusion

310b‧‧‧遠位端凹部 310b‧‧‧Distant recess

510‧‧‧離模薄膜切斷單元 510‧‧‧ Release film cutting unit

511‧‧‧薄膜固定座載置機構 511‧‧‧ film mounting base mounting mechanism

512‧‧‧輥狀離模薄膜 512‧‧‧ roll release film

513‧‧‧薄膜夾持器 513‧‧‧ film holder

520‧‧‧樹脂散布單元 520‧‧‧resin distribution unit

521‧‧‧樹脂載入器 521‧‧‧Resin Loader

522‧‧‧後處理機構 522‧‧‧ post-processing agency

523‧‧‧薄膜固定座移動機構 523‧‧‧ film fixed seat moving mechanism

530‧‧‧樹脂密封單元 530‧‧‧resin sealed unit

531‧‧‧下模 531‧‧‧mould

532‧‧‧下模空腔 532‧‧‧Die cavity

533‧‧‧彈性構件 533‧‧‧Elastic member

534‧‧‧下模底板 534‧‧‧ bottom plate

540‧‧‧搬運單元 540‧‧‧handling unit

541‧‧‧晶圓載入器 541‧‧‧Wafer Loader

542‧‧‧成形後晶圓收容部 542‧‧‧Wafer Containment after Forming

543‧‧‧成形前晶圓收容部 543‧‧‧Wafer Containment Section Before Forming

544‧‧‧移動單元 544‧‧‧mobile unit

第1圖係實施形態之吸附單元之模式上的平面圖。 Fig. 1 is a plan view of a mode of an adsorption unit according to an embodiment.

第2圖係第1圖所示之吸附單元之分叉狀的前端部分之一方之模式上的放大平面圖。 FIG. 2 is an enlarged plan view of one of the bifurcated front end portions of the adsorption unit shown in FIG. 1. FIG.

第3圖係沿著第2圖之Ⅲ-Ⅲ之模式上的剖面圖。 Fig. 3 is a sectional view taken along the line III-III of Fig. 2;

第4圖係沿著第2圖之Ⅳ-Ⅳ之模式上的剖面圖。 Fig. 4 is a sectional view taken along the line IV-IV of Fig. 2.

第5圖係墊外周部之遠位端之模式上的放大剖面圖。 Fig. 5 is an enlarged sectional view of a pattern of a distal end of a peripheral portion of a pad.

第6圖係表示實施形態之吸附單元吸附作為彎曲之板狀元件的例子之晶圓的狀態之模式上的剖面圖。 FIG. 6 is a cross-sectional view schematically showing a state where the adsorption unit of the embodiment adsorbs a wafer as an example of a curved plate-shaped element.

第7圖係晶圓的吸附前之實施形態的吸附單元之模式上的剖面圖。 FIG. 7 is a cross-sectional view in a pattern of an adsorption unit of an embodiment before wafer adsorption.

第8圖係晶圓的吸附時之實施形態的吸附單元之模式上的剖面圖。 FIG. 8 is a cross-sectional view of a mode of a suction unit according to an embodiment when a wafer is suctioned.

第9圖(a)係吸附面側板之外表面之模式上的平面圖,第9圖(b)係吸附面側板之與外表面是相反側的內表面之模式上的平面圖。 Fig. 9 (a) is a plan view on the pattern of the outer surface of the side surface of the suction surface, and Fig. 9 (b) is a plan view on the pattern of the inner surface of the side of the suction surface opposite to the outer surface.

第10圖(a)係背面側板之內表面之模式上的平面圖,第10圖(b)係背面側板之與內表面是相反側的外表面之模式上的平面圖。 Fig. 10 (a) is a plan view on the pattern of the inner surface of the back side plate, and Fig. 10 (b) is a plan view on the pattern of the outer surface of the back side plate on the opposite side to the inner surface.

第11圖(a)係配接器之模式上的平面圖,第11圖(b)係沿著第11圖(a)之XIB-XIB之模式上的剖面圖。 Fig. 11 (a) is a plan view of the adapter in a mode, and Fig. 11 (b) is a sectional view along the XIB-XIB mode in Fig. 11 (a).

第12圖係對實施形態之吸附單元的組裝方法之一例的步驟之一部分圖解之模式上的剖面圖。 FIG. 12 is a schematic cross-sectional view illustrating a part of the steps of an example of the method of assembling the adsorption unit of the embodiment.

第13圖係使用實施形態的吸附單元之實施形態的樹脂密封裝置之模式上的構成圖。 Fig. 13 is a schematic configuration diagram of a resin sealing device according to an embodiment using an adsorption unit according to the embodiment.

第14圖(a)係從側面觀察成形前晶圓收容部時之模式上的透視圖,第14圖(b)係從正面觀察成形前晶圓收容部時之模式上的正視圖。 Fig. 14 (a) is a perspective view of a mode when the pre-formed wafer storage section is viewed from the side, and Fig. 14 (b) is a front view of the mode when the pre-formed wafer storage section is viewed from the front.

第15圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 15 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第16圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 FIG. 16 is a schematic plan view illustrating an example of the resin sealing method of the embodiment.

第17圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 17 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第18圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 18 is a plan view schematically showing an example of a resin sealing method according to the embodiment.

第19圖係圖解實施形態之樹脂密封方法的一例之模式上 的平面圖。 FIG. 19 is a diagram illustrating an example of a resin sealing method of an embodiment Floor plan.

第20圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 20 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第21圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 21 is a plan view schematically showing an example of a resin sealing method according to the embodiment.

第22圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 22 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第23圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 23 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第24圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 24 is a plan view schematically illustrating an example of a resin sealing method according to the embodiment.

第25圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 25 is a plan view schematically showing an example of a resin sealing method according to the embodiment.

第26圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 26 is a plan view schematically showing an example of a resin sealing method according to the embodiment.

第27圖係圖解實施形態之樹脂密封方法的一例之模式上的平面圖。 Fig. 27 is a plan view schematically showing an example of a resin sealing method according to the embodiment.

第28圖係實施形態之吸附單元的變形例之模式上的平面圖。 Fig. 28 is a schematic plan view of a modification of the adsorption unit of the embodiment.

第29圖係實施形態之樹脂密封裝置的變形例之模式上的構成圖。 Fig. 29 is a schematic configuration diagram of a modification of the resin sealing device of the embodiment.

以下,說明實施形態。此外,在實施形態之說明所使用的圖面,同一符號係當作表示相同或相當之部分。 Hereinafter, embodiments will be described. In addition, in the drawings used in the description of the embodiments, the same symbols are used to indicate the same or corresponding parts.

在第1圖,表示是本發明之吸附單元的一例之實施形態的吸附單元之模式上的平面圖。第1圖所示之吸附單元1包括:分叉狀之本體部10;吸附部110,係被設置於構成本體部10之吸附面側的吸附面側板2;以及中空的流路5,係被設置於本體部10的內部。吸附部110係由吸附墊3、支撐吸附墊3之配接器4所構成。此外,本體部10的形狀係不特別地限定為分叉狀。亦可本體部10的形狀係例如是棒狀、C字形、圓形、或矩形。 Fig. 1 is a plan view showing a mode of an adsorption unit according to an embodiment of an example of the adsorption unit of the present invention. The adsorption unit 1 shown in FIG. 1 includes a bifurcated body portion 10, an adsorption portion 110, which is an adsorption surface side plate 2 provided on the adsorption surface side constituting the body portion 10, and a hollow flow path 5, which is It is provided inside the main body part 10. The adsorption unit 110 is composed of an adsorption pad 3 and an adapter 4 supporting the adsorption pad 3. The shape of the body portion 10 is not particularly limited to a branch shape. The shape of the body portion 10 may be, for example, a rod shape, a C shape, a circle, or a rectangle.

在第2圖,表示第1圖所示之吸附單元1之分叉狀的前端部分之一方之模式上的放大平面圖。又,在第3圖表示沿著第2圖之Ⅲ-Ⅲ之模式上的剖面圖,在第4圖表示沿著第2圖之Ⅳ-Ⅳ之模式上的剖面圖。 FIG. 2 is an enlarged plan view showing a pattern of one of the branched front ends of the adsorption unit 1 shown in FIG. 1. Fig. 3 is a cross-sectional view taken along the line III-III in Fig. 2 and Fig. 4 is a cross-sectional view taken along the line IV-IV in Fig. 2.

如第2圖~第4圖所示,貫穿孔45被設置於吸附部110的中心。以包圍貫穿孔45之周圍的方式配置吸附墊3。吸附墊3包括:墊中心部30,係被設置墊開口部35;墊外周部31,係從墊中心部30的遠位端在斜方向伸展(擴張、延長、延伸、伸長);以及墊內側支撐部32,係從墊中心部30之比墊外周部31更近位側之處在與墊外周部31相異的方向伸展。此外,「遠位端」意指遠離吸附部110之中心的貫穿孔45之側的端及其周邊部分,「近位端」意指接近吸附部110之中心的貫穿孔45之側的端及其周邊部分。又,「遠位側」意指遠離吸附部110之中心的貫穿孔45之側,「近位側」意指接近吸附部110之中心的貫穿孔45之側。此外,墊外周部31從墊中心部30之遠位端伸展的方向係未特別限定為斜方向。例如, 亦可在與吸附面側板2之外表面2a平行的方向伸展後,進而,對外表面2a在垂直方向伸展。 As shown in FIGS. 2 to 4, the through-hole 45 is provided at the center of the suction section 110. The suction pad 3 is arranged so as to surround the periphery of the through hole 45. The suction pad 3 includes: a pad center portion 30 provided with a pad opening portion 35; a pad outer peripheral portion 31 extended in an oblique direction (expansion, extension, extension, elongation) from a distal end of the pad center portion 30; and a pad inner portion The support portion 32 extends in a direction different from the pad outer peripheral portion 31 from a position closer to the side of the pad center portion 30 than the pad outer peripheral portion 31. In addition, the "distal end" means the end on the side of the through-hole 45 away from the center of the adsorption section 110 and its peripheral portion, and the "proximal end" means the end on the side of the through-hole 45 near the center of the adsorption section 110 and Its peripheral part. The “distal side” means the side of the through-hole 45 that is far from the center of the suction section 110, and the “proximal side” means the side of the through-hole 45 that is close to the center of the suction section 110. The direction in which the pad outer peripheral portion 31 extends from the distal end of the pad center portion 30 is not particularly limited to an oblique direction. E.g, After extending in a direction parallel to the outer surface 2a of the suction surface side plate 2, the outer surface 2a may be extended in a vertical direction.

如第2圖~第4圖所示,墊外周部31具有遠位端31a。在本實施形態,遠位端31a意指對墊中心部30之墊外周部31的伸展方向變化後之墊外周部31之遠位側的部分。遠位端31a之至少一部分的表面在吸附板狀元件時會與板狀元件接觸。實施形態之吸附單元1係因為至少包括墊外周部31及遠位端31a可追蹤板狀元件的彎曲之程度的柔軟性,所以藉吸附可穩定地固持彎曲的板狀元件。 As shown in FIGS. 2 to 4, the pad outer peripheral portion 31 has a distal end 31 a. In the present embodiment, the distal end 31 a means a portion on the far side of the pad outer peripheral portion 31 after the direction of extension of the pad outer peripheral portion 31 of the pad central portion 30 is changed. At least a part of the surface of the distal end 31a comes into contact with the plate-shaped element when the plate-shaped element is adsorbed. The suction unit 1 according to the embodiment includes at least the pad outer peripheral portion 31 and the distal end 31a so as to track the bending of the plate-like element so that the plate-like element can be stably held by the suction.

板狀元件係例如亦可是樹脂密封前的晶圓或樹脂密封前的基板,亦可是樹脂密封後的晶圓或樹脂密封後的基板。在板狀元件,亦可被安裝電子元件(晶片)等,亦可未被安裝。板狀元件的形狀係例如亦可在平面圖上是圓形,亦可是矩形。板狀元件係只要是可使用吸附單元1吸附,任何的形狀及形態都可。又,板狀元件(藉由作成單片,可製造透鏡、微透鏡陣列、光學模組、導光板、或連接器等)係亦可是樹脂成形品,亦可是汽車用元件。 The plate-shaped element may be, for example, a wafer before resin sealing or a substrate before resin sealing, or a wafer after resin sealing or a substrate after resin sealing. Electronic components (chips) and the like may be mounted on the plate-shaped components, or may not be mounted. The shape of the plate-like element may be circular or rectangular in a plan view, for example. As long as the plate-like element is capable of being adsorbed by the adsorption unit 1, any shape and form may be used. In addition, the plate-like element (a lens, a micro-lens array, an optical module, a light guide plate, or a connector can be manufactured as a single piece) may be a resin-molded article or an automobile element.

在第5圖表示墊外周部31之遠位端31a之模式上的放大剖面圖。如第5圖所示,墊外周部31之遠位端31a包括:2個遠位端凸部310a,係在墊外周部31的遠位側突出;及遠位端凹部310b,係在2個遠位端凸部310a之間從遠位端31a向近位側凹下。藉由採用這種構成,墊外周部31之遠位端31a的柔軟性提高,墊外周部31之遠位端31a更易追蹤彎曲的板狀元件,而可更穩定地固持彎曲的板狀元件。 FIG. 5 is an enlarged sectional view showing a pattern of the distal end 31 a of the pad outer peripheral portion 31. As shown in FIG. 5, the distal end 31 a of the pad outer peripheral portion 31 includes: two distal end convex portions 310 a protruding on the distal side of the pad outer peripheral portion 31; and a distal end concave portion 310 b attached to two The distal end convex portions 310a are recessed from the distal end 31a toward the proximal side. By adopting such a configuration, the flexibility of the distal end 31a of the pad outer peripheral portion 31 is improved, and the distal end 31a of the pad outer peripheral portion 31 can more easily track the curved plate-like element, and can hold the curved plate-like element more stably.

如第3圖及第4圖所示,凹部21被設置於本體部10的吸附面側板2之外表面2a的近位端。在本實施形態,可作成凹部21形成環形之槽狀。在板狀元件之吸附前,墊外周部31的遠位端31a係位於遠離環形之槽狀之凹部21的位置,而在吸附板狀元件時,墊外周部31的遠位端31a係與凹部21之底面21a接觸。又,可將墊內側支撐部32設定成比配接器4及吸附面側板2的外表面2a更高。藉由作成這種構成,可作成在吸附板狀元件時,板狀元件不會與吸附面側板2的外表面2a或配接器4接觸,而與墊外周部31的遠位端31a或墊內側支撐部32接觸,或者與墊外周部31的遠位端31a及墊內側支撐部32之雙方接觸。因此,在吸附板狀元件時,可抑制因吸附墊3產生彈性變形而板狀元件與吸附面側板2的外表面2a或配接器4接觸所造成之板狀元件的損壞(在吸附板狀元件時,因為以墊外周部31的遠位端31a或墊內側支撐部32支撐板狀元件,或以墊外周部31的遠位端31a與墊內側支撐部32之雙方支撐,所以可抑制與吸附面側板2的外表面2a或配接器4的接觸所造成之板狀元件的損壞)。又,可作成在吸附板狀元件時,吸附板狀元件之墊外周部31的遠位端31a與凹部21的底面21a接觸。藉此,可使在吸附板狀元件之狀態的吸附單元1之整體的厚度比未設置凹部21的情況減少僅凹部21之深度的量。又,以在吸附板狀元件時,和在墊外周部31的遠位端31a與凹部21的底面21a(不設置凹部21的情況係與吸附面側板2的外表面2a)接觸時之墊外周部31之遠位端31a的高度(遠位端31a與吸附面側板2之外表面2a的距離)成為相等的 方式設定墊內側支撐部32的高度(墊內側支撐部32與吸附面側板2之外表面2a的距離)為佳。而且,在吸附板狀元件時,若將墊外周部31之遠位端31a的高度與墊內側支撐部32的高度調整成板狀元件與吸附面側板2的外表面2a或配接器4不接觸而隔著微小之間隙的狀態,可減少在吸附板狀元件之狀態的吸附單元1之整體的厚度。又,設定成配接器4的吸附面與吸附面側板2的外表面2a為同一面,或配接器4的吸附面比吸附面側板2的外表面2a更低較佳。藉此,因為配接器4不會從吸附面側板2a的外表面2a突出,而可將在板狀元件的吸附時之墊外周部31之遠位端31a的高度與墊內側支撐部32的高度設定成低了該份量。藉此,例如即使是晶圓收容部是根據SEMI規格所規定之窄間距之槽(片匣)的情況,亦因為使晶圓8從槽出入,所以可在槽所收容之晶圓8與晶圓8之間的窄空間亦可易於插入吸附單元1。 As shown in FIGS. 3 and 4, the recessed portion 21 is provided on the proximal end of the outer surface 2 a of the suction surface side plate 2 of the main body portion 10. In this embodiment, the recessed portion 21 can be formed into a circular groove shape. Before the plate-shaped component is attracted, the distal end 31a of the pad outer peripheral portion 31 is located away from the annular groove-shaped recess 21, and when the plate-shaped component is adsorbed, the far end 31a of the pad outer peripheral portion 31 is connected to the concave portion. The bottom surface 21a of 21 is in contact. The pad inner support portion 32 can be set higher than the outer surface 2 a of the adapter 4 and the suction surface side plate 2. With such a configuration, when the plate-shaped element is adsorbed, the plate-shaped element does not come into contact with the outer surface 2a or the adapter 4 of the side surface 2 of the adsorption surface, and is in contact with the distal end 31a or the pad of the outer peripheral portion 31 of the pad. The inner support portion 32 is in contact with both the distal end 31 a of the pad outer peripheral portion 31 and the pad inner support portion 32. Therefore, when the plate-shaped element is adsorbed, damage to the plate-shaped element caused by the elastic deformation of the adsorption pad 3 and the contact of the plate-shaped element with the outer surface 2a of the side surface 2 of the adsorption surface or the adapter 4 can be suppressed ( In the case of a plate, since the plate-shaped element is supported by the distal end 31a of the pad outer peripheral portion 31 or the pad inner support portion 32, or by both the distal end 31a of the pad outer peripheral portion 31 and the pad inner support portion 32, it is possible to suppress the Damage to the plate-like element caused by the contact between the outer surface 2a of the suction side plate 2 or the adapter 4). In addition, when the plate-shaped element is adsorbed, the distal end 31 a of the pad outer peripheral portion 31 of the plate-shaped element may be in contact with the bottom surface 21 a of the recessed portion 21. Thereby, the thickness of the entire adsorption unit 1 in a state where the plate-shaped element is adsorbed can be reduced by the amount of only the depth of the recessed portion 21 as compared with a case where the recessed portion 21 is not provided. In addition, when the plate-shaped element is adsorbed, the outer periphery of the pad when the distal end 31a of the pad outer peripheral portion 31 is in contact with the bottom surface 21a of the recessed portion 21 (when the recessed portion 21 is not provided is the outer surface 2a of the adsorption surface side plate 2). The height of the distal end 31a of the portion 31 (the distance between the distal end 31a and the outer surface 2a of the adsorption surface side plate 2) becomes equal It is preferable to set the height of the pad inner support portion 32 (the distance between the pad inner support portion 32 and the outer surface 2 a of the suction surface side plate 2). Furthermore, when the plate-shaped component is adsorbed, if the height of the distal end 31a of the pad outer peripheral portion 31 and the height of the pad inner support portion 32 are adjusted so that the plate-shaped component and the outer surface 2a of the side surface 2 of the suction surface or the adapter 4 do not In a state of being in contact with a small gap therebetween, the entire thickness of the adsorption unit 1 in a state where the plate-shaped element is adsorbed can be reduced. The suction surface of the adapter 4 is set to be the same surface as the outer surface 2 a of the suction surface side plate 2, or the suction surface of the adapter 4 is preferably lower than the outer surface 2 a of the suction surface side plate 2. Thereby, because the adapter 4 does not protrude from the outer surface 2a of the suction surface side plate 2a, the height of the distal end 31a of the outer peripheral portion 31 of the pad at the time of the adsorption of the plate-shaped element and the The height is set lower for that amount. With this, for example, even in the case where the wafer receiving section is a narrow-pitch groove (chip cassette) prescribed by the SEMI standard, the wafer 8 can be inserted into and out of the groove, so that the wafer 8 and The narrow space between the circles 8 can also be easily inserted into the adsorption unit 1.

如第2圖所示,在本實施形態,墊內側支撐部32被設置3個,缺口部33被設置於相鄰的墊內側支撐部32之間。缺口部33係在吸附板狀元件時,以板狀元件、墊外周部31之遠位端31a所包圍的空間以及貫穿孔45之間氣體(空氣)連通的方式被設置於墊內側支撐部32之間的部分。因此,缺口部33的高度係被設定成比墊內側支撐部32的高度更低。 As shown in FIG. 2, in this embodiment, three pad inner support portions 32 are provided, and notch portions 33 are provided between adjacent pad inner support portions 32. The notch portion 33 is provided on the pad inner support portion 32 so as to communicate with the air (air) between the plate-shaped element, the space surrounded by the distal end 31a of the pad outer peripheral portion 31, and the through hole 45 when the plate-shaped element is adsorbed. Between the sections. Therefore, the height of the notch portion 33 is set to be lower than the height of the pad inner support portion 32.

如第2圖及第4圖所示,貫穿孔45係與流路5連通成氣體移動自如。本體部10係將吸附面側之吸附面側板2、與和吸附面側係相反側之背面側的背面側板7重疊並固定這些構件,藉此所構成。流路5係利用被設置於本體部10的背面 側板7之一部分的凹部、與由被配置於背面側板7上之吸附面側的吸附面側板2或配接器4所包圍之空間所構成。 As shown in FIGS. 2 and 4, the through-hole 45 communicates with the flow path 5 so that the gas can move freely. The main body portion 10 is constructed by superimposing and fixing these members on the suction surface side plate 2 on the suction surface side and the rear surface side plate 7 on the back side opposite to the suction surface side system. The flow path 5 is provided on the back of the main body portion 10 A recessed portion of a part of the side plate 7 is composed of a space surrounded by the suction surface side plate 2 or the adapter 4 arranged on the suction surface side of the rear side plate 7.

如第3圖及第4圖所示,配接器4包括:被設置貫穿孔45的配接器本體部40;凸緣42,係從配接器本體部40之一方的端(在本實施形態係上端)在與本體部10之吸附面側的表面(在本實施形態係吸附面側板2的外表面2a)平行之方向伸展;以及配接器腳部41,係從配接器本體部40之另一方的端(下端)在與本體部10之吸附面側的表面平行之方向伸展。配接器腳部41包括從配接器腳部41的遠位端在凸緣42之方向(在本實施形態係上方)伸展的突起部41a。 As shown in FIGS. 3 and 4, the adapter 4 includes: an adapter body portion 40 provided with a through hole 45; and a flange 42, which is an end from one of the adapter body portions 40 (in this embodiment) The upper end of the morphology system) extends in a direction parallel to the surface on the suction surface side of the main body portion 10 (the outer surface 2a of the suction surface side plate 2 in this embodiment); and the adapter leg portion 41 is from the adapter body portion. The other end (lower end) of 40 extends in a direction parallel to the surface on the suction surface side of the main body portion 10. The adapter leg portion 41 includes a protruding portion 41 a that extends from the distal end of the adapter leg portion 41 in the direction of the flange 42 (above the embodiment).

配接器4係以凸緣42朝向吸附面側板2側之方式被配置於背面側板7上。藉由將配接器本體部40嵌入吸附墊3的墊開口部35,將吸附墊3安裝於配接器4。吸附墊3係以墊外周部31的遠位端31a位於遠離吸附面側板2的外表面2a之位置的方式被安裝於配接器4。 The adapter 4 is arranged on the back side plate 7 so that the flange 42 faces the suction side plate 2 side. The suction pad 3 is attached to the adapter 4 by fitting the adapter body 40 into the pad opening 35 of the suction pad 3. The suction pad 3 is attached to the adapter 4 such that the distal end 31 a of the pad outer peripheral portion 31 is located away from the outer surface 2 a of the suction surface side plate 2.

如第3圖及第4圖所示,為了抑制來自流路5之漏氣,將環形之密封材料6配置於配接器4之環形的配接器腳部41之周緣上。密封材料6的密封係在配接器4的配接器腳部41之遠位端的突起部41a與吸附面側板2之間所進行。如第3圖及第4圖所示,配接器腳部41之遠位端的突起部41a嵌入(壓入)密封材料6。藉此,可確實地密封。 As shown in FIGS. 3 and 4, in order to suppress air leakage from the flow path 5, a ring-shaped sealing material 6 is arranged on the periphery of the ring-shaped adapter leg 41 of the adapter 4. The sealing material 6 is sealed between the protruding portion 41 a at the distal end of the adapter leg portion 41 of the adapter 4 and the suction surface side plate 2. As shown in FIGS. 3 and 4, the protruding portion 41 a of the distal end of the adapter leg portion 41 is fitted (press-fitted) into the sealing material 6. Thereby, it can be reliably sealed.

在第6圖,係表示實施形態之吸附單元1吸附作為彎曲之板狀元件的例子之晶圓8的狀態之模式上的剖面圖。如第6圖所示,在實施形態之吸附單元1,因為構成為墊外周 部31的遠位端31a可追蹤晶圓8的彎曲,所以可穩定地固持彎曲的晶圓8。又,如第6圖所示,在晶圓8向下彎曲成凸狀的情況,從藉吸附墊3更堅固地吸附彎曲之晶圓8的觀點(使吸附墊3更易於追蹤彎曲之晶圓8的觀點),可將吸附墊3配置成接近晶圓8的中心。又,與第6圖相反,在晶圓8向上彎曲成凸狀的情況,從藉吸附墊3更堅固地吸附彎曲之晶圓8的觀點(使吸附墊3更易於追蹤彎曲之晶圓8的觀點),可將吸附墊3配置成遠離晶圓8的中心。配置之變更亦可藉由更換吸附面側板2等所進行,亦可預先設置複數個包含不使用吸附單元1的吸附部的部分,選擇使用部分,將不使用部分塞住貫穿孔45(在第6圖,例如,單純化地表示將吸附墊3的配置變更僅W之長度的份量)。 FIG. 6 is a cross-sectional view schematically showing a state in which the adsorption unit 1 of the embodiment adsorbs a wafer 8 as an example of a curved plate-shaped element. As shown in FIG. 6, the adsorption unit 1 of the embodiment is configured as a pad outer periphery. Since the distal end 31 a of the portion 31 can track the bending of the wafer 8, the bent wafer 8 can be stably held. In addition, as shown in FIG. 6, when the wafer 8 is bent downward into a convex shape, from the viewpoint of more firmly adsorbing the bent wafer 8 by the adsorption pad 3 (making the adsorption pad 3 easier to track the curved wafer 8 8), the suction pad 3 can be arranged close to the center of the wafer 8. Also, in contrast to FIG. 6, when the wafer 8 is bent upward into a convex shape, from the viewpoint of more strongly adsorbing the bent wafer 8 by the suction pad 3 (making the suction pad 3 easier to track the wafer 8 that is bent) (Viewpoint) The suction pad 3 may be disposed away from the center of the wafer 8. The configuration can also be changed by replacing the suction side plate 2 or the like, or a plurality of parts including the suction part not using the suction unit 1 can be set in advance, and the use part can be selected, and the through hole 45 (see Fig. 6 shows, for example, the amount of changing the arrangement of the adsorption pad 3 by a length of only W).

以下,參照第7圖及第8圖之模式上的剖面圖,實施形態之吸附單元1吸附彎曲之板狀元件之機構的一例。第7圖係作為板狀元件的例子之晶圓8的吸附前之實施形態的吸附單元1之模式上的剖面圖,第8圖係作為板狀元件的例子之晶圓8的吸附時之實施形態的吸附單元1之模式上的剖面圖。此外,為了便於說明,在第7圖及第8圖,對配接器4及密封材料6係未圖示。 Hereinafter, referring to the cross-sectional views in the mode of FIGS. 7 and 8, an example of a mechanism for the adsorption unit 1 of the embodiment to adsorb a curved plate-shaped element. FIG. 7 is a cross-sectional view of a model of the adsorption unit 1 before the adsorption of the wafer 8 as an example of a plate-like element. FIG. 8 is a diagram illustrating the implementation of the adsorption of the wafer 8 as an example of a plate-like element. A sectional view of the adsorption unit 1 in a mode. In addition, for convenience of explanation, the adapter 4 and the sealing material 6 are not shown in FIGS. 7 and 8.

首先,如第7圖所示,使實施形態之吸附單元1的吸附墊3位於晶圓8上。此處,晶圓8之與吸附單元1係相反側是以硬化的密封樹脂(樹脂成形體)81所密封,晶圓8係彎曲成在吸附單元1側成為凸形。 First, as shown in FIG. 7, the adsorption pad 3 of the adsorption unit 1 of the embodiment is placed on the wafer 8. Here, the opposite side of the wafer 8 from the adsorption unit 1 is sealed with a hardened sealing resin (resin molded body) 81, and the wafer 8 is bent into a convex shape on the adsorption unit 1 side.

接著,如第8圖所示,使存在於藉吸附墊3所包 圍之晶圓8上的空間之空氣9經由流路5排出至外部。在此時,墊外周部31之遠位端31a與墊內側支撐部32之間的空氣係通過缺口部33移至墊內側支撐部32之內側的空間,然後,通過貫穿孔45及流路5並被排出至外部。藉此,晶圓8係被挪近至吸附單元1側,因所挪近之晶圓8而吸附墊3產生彈性變形,吸附墊3追蹤(倣照)晶圓8的形狀,晶圓8係與墊外周部31之遠位端31a或墊內側支撐部32(或者墊外周部31之遠位端31a與墊內側支撐部32的雙方)接觸,並被吸附墊3所固持。在實施形態之吸附單元1,構成為至少墊外周部31及遠位端31a係藉遠位端凹部310b的形成等而可追蹤晶圓8的彎曲。因此,實施形態之吸附單元1係可穩定地吸附並固持彎曲的晶圓8。又,藉由將缺口部33設置於墊內側支撐部32之間,能以比在吸附墊3不存在缺口部33時之吸附徑D1(吸附面積)更大的吸附徑D2(吸附面積)固持晶圓8。藉此,因為可抑制吸附晶圓8之吸附力變小,所以可進行晶圓8之高速搬運或晶圓8之表背反轉(flip)的動作。又,吸附單元1係構成為在晶圓8之吸附時,主要僅與晶圓8接觸的部分突出至吸附面側板2的外側。吸附墊3之其他的部分係被收容於吸附單元1。即,可將吸附單元1構成變薄。 Next, as shown in FIG. The air 9 in the space on the surrounding wafer 8 is exhausted to the outside through the flow path 5. At this time, the air between the distal end 31a of the pad outer peripheral portion 31 and the pad inner support portion 32 moves to the space inside the pad inner support portion 32 through the notch portion 33, and then passes through the through hole 45 and the flow path 5 And discharged to the outside. As a result, the wafer 8 is moved to the suction unit 1 side, and the suction pad 3 is elastically deformed by the approached wafer 8. The suction pad 3 tracks (imitates) the shape of the wafer 8 and the wafer 8 is It is in contact with the distal end 31a of the pad outer peripheral portion 31 or the pad inner support portion 32 (or both of the far end 31a of the pad outer peripheral portion 31 and the pad inner support portion 32) and is held by the adsorption pad 3. In the adsorption unit 1 according to the embodiment, at least the pad outer peripheral portion 31 and the distal end 31 a are configured to track the bending of the wafer 8 by the formation of the distal end recessed portion 310 b or the like. Therefore, the adsorption unit 1 of the embodiment can stably adsorb and hold the curved wafer 8. In addition, by providing the notch portion 33 between the pad inner support portions 32, the adsorption diameter D2 (adsorption area) larger than the adsorption diameter D1 (adsorption area) when the adsorption pad 3 does not have the notch portion 33 can be held Wafer 8. Thereby, since the adsorption force of the adsorption wafer 8 can be suppressed from being reduced, high-speed conveyance of the wafer 8 or the flipping operation of the front and back of the wafer 8 can be performed. In addition, the adsorption unit 1 is configured such that, when the wafer 8 is adsorbed, only a portion mainly in contact with the wafer 8 protrudes to the outside of the adsorption surface side plate 2. The other parts of the adsorption pad 3 are housed in the adsorption unit 1. That is, the structure of the adsorption unit 1 can be made thin.

藉吸附單元1所吸附並固持之晶圓8係可藉包括用以移動吸附單元1之移動單元(未圖示)的板狀元件搬運裝置搬運至別的位置。 The wafer 8 that is adsorbed and held by the adsorption unit 1 can be transported to another location by a plate-shaped component handling device including a moving unit (not shown) for moving the adsorption unit 1.

以下,參照第9圖~第12圖,說明實施形態之吸附單元1之組裝方法的一例。在第9圖(a)表示吸附面側板2 之外表面之模式上的平面圖,在第9圖(b)表示吸附面側板2之與外表面是相反側的內表面之模式上的平面圖。又,在第10圖(a)表示背面側板7之內表面之模式上的平面圖,在第10圖(b)表示背面側板7之與內表面是相反側的外表面之模式上的平面圖。又,在第11圖(a)表示配接器4之模式上的平面圖,在第11圖(b)表示沿著第11圖(a)之XIB-XIB之模式上的剖面圖。此外,亦可以螺栓固定吸附面側板2與背面側板7之2片板,亦可以黏著材料固定。 Hereinafter, an example of an assembling method of the adsorption unit 1 according to the embodiment will be described with reference to FIGS. 9 to 12. Fig. 9 (a) shows the suction surface side plate 2 FIG. 9 (b) is a plan view of the outer surface pattern, and is a plan view of the inner surface of the suction surface side plate 2 opposite to the outer surface. Fig. 10 (a) is a plan view showing the pattern of the inner surface of the back side plate 7 and Fig. 10 (b) is a plan view showing the pattern of the outer surface of the back side plate 7 on the opposite side to the inner surface. Fig. 11 (a) shows a plan view of the adapter 4 in a mode, and Fig. 11 (b) shows a cross-sectional view in a mode along the XIB-XIB of Fig. 11 (a). In addition, two plates of the suction side plate 2 and the back side plate 7 may be fixed by bolts, or may be fixed by an adhesive material.

首先,如第12圖之模式上的剖面圖所示,將第11圖所示之例如金屬製的配接器4設置於第10圖(a)所示之例如金屬製之背面側板7的內表面上。接著,將例如橡膠製之密封材料6設置於配接器4的配接器腳部41之遠位端的凸部41a上。然後,以第9圖(b)所示之例如金屬製之吸附面側板2的內表面朝向配接器4側的方式將吸附面側板2設置於背面側板7上。接著,固定吸附面側板2與背面側板7。然後,如第3圖及第4圖所示,藉由將例如橡膠製之吸附墊3的墊開口部35嵌入配接器4的配接器本體部40,將吸附墊3安裝於配接器4。根據以上,實施形態之吸附單元1的組裝結束。 First, as shown in the sectional view of the pattern in FIG. 12, the adapter 4 made of, for example, a metal shown in FIG. 11 is set in the back side plate 7 made of, for example, a metal shown in FIG. 10 (a). On the surface. Next, a sealing material 6 made of, for example, rubber is provided on the convex portion 41 a of the distal end of the adapter leg portion 41 of the adapter 4. Then, the suction surface side plate 2 is provided on the back side plate 7 such that the inner surface of the metal suction surface side plate 2 shown in FIG. 9 (b) faces the adapter 4 side, for example. Next, the suction side plate 2 and the back side plate 7 are fixed. Then, as shown in FIG. 3 and FIG. 4, for example, the pad opening portion 35 of the suction pad 3 made of rubber is fitted into the adapter main body portion 40 of the adapter 4 to attach the suction pad 3 to the adapter. 4. As described above, the assembly of the adsorption unit 1 according to the embodiment is completed.

此外,如第9圖及第10圖所示,分別將O環槽6a設置於吸附面側板2及背面側板7之內表面,在將O環設置於O環槽6a之狀態固定於吸附面側板2與背面側板7,藉此,可更確實地密封。 In addition, as shown in FIG. 9 and FIG. 10, the O-ring groove 6a is provided on the inner surfaces of the suction surface side plate 2 and the back side plate 7, respectively, and the O ring is fixed to the suction surface side plate in a state where the O ring is provided in the O ring groove 6a. 2 and the back side plate 7 can be sealed more reliably.

在如上述所示製作之實施形態的吸附單元1,不必分解吸附單元1,就可簡單地更換吸附墊3。 In the adsorption unit 1 of the embodiment manufactured as described above, the adsorption pad 3 can be easily replaced without disassembling the adsorption unit 1.

又,作為吸附面側板2及背面側板7的材質,例如,可使用鐵、鋼以及陶瓷等。 Moreover, as a material of the adsorption surface side plate 2 and the back surface side plate 7, for example, iron, steel, ceramics, or the like can be used.

在第13圖表示使用實施形態的吸附單元1之實施形態的樹脂密封裝置之模式上的構成圖。如第13圖所示,實施形態之樹脂密封裝置包括搬運單元540、樹脂密封單元530、樹脂散布單元520以及離模薄膜切斷單元510。實施形態之吸附單元1係被配置於搬運單元540。 FIG. 13 is a schematic configuration diagram of a resin sealing device according to an embodiment using the adsorption unit 1 according to the embodiment. As shown in FIG. 13, the resin sealing device of the embodiment includes a conveying unit 540, a resin sealing unit 530, a resin spreading unit 520, and a release film cutting unit 510. The adsorption unit 1 according to the embodiment is arranged on the transfer unit 540.

搬運單元540包括晶圓載入器541、成形後晶圓收容部542、成形前晶圓收容部543以及移動單元544。晶圓載入器541係固持晶圓8,並可在搬運單元540、樹脂密封單元530、樹脂散布單元520以及離模薄膜切斷單元510之間移動。成形後晶圓收容部542可收容樹脂密封後的晶圓8。成形前晶圓收容部543可收容樹脂密封前的晶圓8。移動單元544可移動吸附單元1。 The transfer unit 540 includes a wafer loader 541, a post-forming wafer storage portion 542, a pre-forming wafer storage portion 543, and a moving unit 544. The wafer loader 541 holds the wafer 8 and is movable between a transfer unit 540, a resin sealing unit 530, a resin spreading unit 520, and a release film cutting unit 510. The formed wafer accommodating portion 542 can accommodate the resin-sealed wafer 8. The pre-mold wafer storage portion 543 can store the wafer 8 before the resin sealing. The moving unit 544 can move the adsorption unit 1.

樹脂密封單元530包括上模(未圖示)、與含有下模空腔532的下模531。可將離模薄膜11設置於下模空腔532上。在樹脂密封單元530,可進行被搭載電子元件等之晶圓8的樹脂密封。 The resin sealing unit 530 includes an upper mold (not shown) and a lower mold 531 including a lower mold cavity 532. The release film 11 can be disposed on the lower mold cavity 532. The resin sealing unit 530 can perform resin sealing of the wafer 8 on which electronic components and the like are mounted.

樹脂散布單元520包括樹脂載入器521、後處理機構522、薄膜固定座移動機構523、線性進給器15、樹脂供給機構14以及框12。樹脂散布單元520係可在使用樹脂載入器521將離模薄膜11吸附並固定於由例如圓形框架所構成之框12的下端面後,從樹脂供給機構14經由線性進給器15將顆粒樹脂散布於離模薄膜11上。此外,框14係不特別限定為圓形 框架,例如亦可是矩形框架。 The resin dispersing unit 520 includes a resin loader 521, a post-processing mechanism 522, a film holder moving mechanism 523, a linear feeder 15, a resin supply mechanism 14, and a frame 12. The resin dispersing unit 520 can absorb and fix the release film 11 to the lower end surface of the frame 12 made of, for example, a circular frame using a resin loader 521, and then the particles are fed from the resin supply mechanism 14 through the linear feeder 15 The resin is spread on the release film 11. The frame 14 is not particularly limited to a circular shape. The frame may be, for example, a rectangular frame.

離模薄膜切斷單元510包括輥狀離模薄膜512、薄膜固定座載置機構511以及薄膜夾持器513。在離模薄膜切斷單元510,從輥狀離模薄膜512抽出長條的離模薄膜11後,將其一部分設置於被載置於薄膜固定座載置機構511上的薄膜固定座(未圖示),將其切割成圓形,藉此,可得到圓形之離模薄膜11。薄膜夾持器513係可固定從輥狀離模薄膜512所抽出之離模薄膜的前端,並可從輥狀離模薄膜512抽出離模薄膜。 The release film cutting unit 510 includes a roll-shaped release film 512, a film fixing base mounting mechanism 511, and a film holder 513. In the release film cutting unit 510, the long release film 11 is drawn from the roll-shaped release film 512, and a part of the release film 11 is set on a film fixing base (not shown) placed on the film fixing base mounting mechanism 511. (Shown), and cut it into a circle, thereby obtaining a circular release film 11. The film holder 513 can fix the front end of the release film withdrawn from the roll-shaped release film 512 and can withdraw the release film from the roll-shaped release film 512.

以下,參照第14圖~第27圖,說明使用實施形態的樹脂密封裝置之實施形態的樹脂密封方法之一例。首先,如第14圖(a)及第14圖(b)所示,將吸附單元1插入被搭載成形前晶圓收容部543所收容的電子元件13之晶圓8的下側,在將晶圓8吸附於吸附單元1後,從成形前晶圓收容部543取出吸附單元1。此處,晶圓8係將電子元件13的搭載側當作上側,從成形前晶圓收容部543被取出。此外,第14圖(a)係從側面觀察成形前晶圓收容部543時之模式上的透視圖,第14圖(b)係從正面觀察成形前晶圓收容部543時之模式上的正視圖。 An example of a resin sealing method according to an embodiment using the resin sealing device according to the embodiment will be described below with reference to FIGS. 14 to 27. First, as shown in FIGS. 14 (a) and 14 (b), the suction unit 1 is inserted into the lower side of the wafer 8 on which the electronic component 13 accommodated in the pre-mold wafer accommodation portion 543 is mounted, and the wafer After the circle 8 is adsorbed on the adsorption unit 1, the adsorption unit 1 is taken out from the pre-mold wafer accommodation portion 543. Here, the wafer 8 is taken out from the wafer housing portion 543 before the molding with the mounting side of the electronic component 13 as the upper side. In addition, Fig. 14 (a) is a perspective view of a mode when the pre-mold wafer accommodation portion 543 is viewed from the side, and Fig. 14 (b) is a front view of the mode when the pre-mold wafer accommodation portion 543 is viewed from the front. Illustration.

接著,如第15圖之模式上的側視圖所示,使吸附單元1所吸附之晶圓8反轉,並將晶圓8之電子元件13的搭載側作為下側。然後,藉移動單元544使吸附單元1移動,如第16圖之模式上的側視圖所示,將吸附單元1所吸附之晶圓8之電子元件13的搭載側作為下側,將晶圓8設置於晶圓載入器541上。 Next, as shown in the side view on the pattern in FIG. 15, the wafer 8 adsorbed by the adsorption unit 1 is reversed, and the mounting side of the electronic component 13 of the wafer 8 is taken as the lower side. Then, the suction unit 1 is moved by the moving unit 544. As shown in the side view on the pattern in FIG. It is set on the wafer loader 541.

接著,如第17圖之模式上的側視圖所示,使被設 置晶圓8之晶圓載入器541在樹脂密封單元530的上模551與下模531之間移動。然後,將電子元件13的搭載側作為下側,將晶圓8設置於上模551。下模531包括構成下模空腔532的側面構件531a、底面構件531b、彈性構件533以及下模底板534。 Next, as shown in the side view on the pattern in FIG. The wafer loader 541 on which the wafer 8 is placed moves between the upper mold 551 and the lower mold 531 of the resin sealing unit 530. Then, the wafer 8 is set in the upper mold 551 with the mounting side of the electronic component 13 as the lower side. The lower mold 531 includes a side member 531a, a bottom member 531b, an elastic member 533, and a lower mold base plate 534, which constitute a lower mold cavity 532.

接著,如第18圖之模式上的側視圖所示,在被設置晶圓8的上模551與下模531之間,將收容顆粒樹脂81a的離模薄膜11搬運至框12內。離模薄膜11之搬運係藉樹脂載入器521所進行。在本實施形態,使用顆粒樹脂81a,但是亦可替代顆粒樹脂81a,使用粉狀樹脂或液狀(流動性)樹脂。 Next, as shown in the side view on the pattern in FIG. 18, the release film 11 containing the particulate resin 81 a is transported into the frame 12 between the upper mold 551 and the lower mold 531 on which the wafer 8 is set. The release film 11 is conveyed by the resin loader 521. In this embodiment, the particulate resin 81a is used, but instead of the particulate resin 81a, a powdery resin or a liquid (fluid) resin may be used.

然後,如第19圖之模式上的側視圖所示,將被設置顆粒樹脂81a之離模薄膜11設置於下模531的下模空腔532上。接著,如第20圖之模式上的側視圖所示,藉由從側面構件531a與底面構件531b之間排出下模空腔532內的空氣,使離模薄膜11與下模空腔532的內面密接。藉此,將顆粒樹脂81a供給至下模空腔532內。 Then, as shown in the side view on the mode in FIG. 19, the mold release film 11 on which the granular resin 81 a is set is set on the lower mold cavity 532 of the lower mold 531. Next, as shown in the side view on the pattern in FIG. 20, the air in the lower mold cavity 532 is exhausted from between the side member 531a and the bottom member 531b, so that the inside of the mold release film 11 and the lower mold cavity 532 are discharged. Face tightly. Thereby, the granular resin 81a is supplied into the lower mold cavity 532.

然後,如第21圖之模式上的側視圖所示,利用在加熱部(未圖示)被升溫的下模531對下模空腔532內的顆粒樹脂81a加熱,藉此,熔化而作為熔化樹脂81b,再使下模531上升。在此時(使下模531上升,上模551與下模531經由晶圓8及離模薄膜11接觸之前),亦可作成在成形模內藉外氣遮斷構件(未圖示)遮斷外氣,再使用真空泵等排出成形模內的空氣。接著,如第22圖之模式上的側視圖所示,上模551與下模531經由晶圓8及離模薄膜11接觸,使下模531更上升, 藉此,將熔化樹脂81b浸漬於晶圓8上的電子元件13,並經過固定時間,藉此,使熔化樹脂81b變硬,進行電子元件13之樹脂密封。 Then, as shown in the side view on the pattern in FIG. 21, the granular resin 81a in the cavity 532 of the lower mold is heated by the lower mold 531 heated in the heating section (not shown), thereby melting and melting as a melt. The resin 81b raises the lower mold 531 again. At this time (before the lower mold 531 is raised, and the upper mold 551 and the lower mold 531 are in contact with each other through the wafer 8 and the mold release film 11), it can also be made to be interrupted by an external air blocking member (not shown) in the forming mold. Outside air, and then use a vacuum pump to exhaust the air in the mold. Next, as shown in the side view on the pattern in FIG. 22, the upper mold 551 and the lower mold 531 contact through the wafer 8 and the release film 11 to raise the lower mold 531, Thereby, the molten resin 81b is immersed in the electronic component 13 on the wafer 8, and a fixed time elapses, whereby the molten resin 81b is hardened, and the resin sealing of the electronic component 13 is performed.

然後,如第23圖之模式上的側視圖所示,藉由使下模531移至下方,從硬化後之密封樹脂(樹脂成形體)81剝離離模薄膜11。接著,如第24圖之模式上的側視圖所示,晶圓載入器541從上模551卸下藉密封樹脂(樹脂成形體)81之樹脂密封後的晶圓8,將電子元件13的搭載側作為下側,載置於晶圓載入器541上。然後,被設置樹脂密封後之晶圓8的晶圓載入器541係從樹脂密封單元530移至搬運單元540。 Then, as shown in the side view on the pattern in FIG. 23, the lower mold 531 is moved downward, and the release film 11 is peeled from the cured sealing resin (resin molded body) 81. Next, as shown in the side view on the pattern in FIG. 24, the wafer loader 541 removes the wafer 8 sealed with the resin of the sealing resin (resin molding) 81 from the upper mold 551, and The mounting side is placed on the wafer loader 541 as a lower side. Then, the wafer loader 541 provided with the resin-sealed wafer 8 is moved from the resin sealing unit 530 to the transfer unit 540.

接著,如第25圖之模式上的側視圖所示,樹脂密封後的晶圓8係將電子元件13的搭載側作為下側,藉吸附單元1吸附。然後,如第26圖之模式上的側視圖所示,使吸附單元1所吸附之晶圓8反轉,將電子元件13的搭載側作為上側,藉移動單元544使吸附單元1移動。接著,吸附單元1係如第27圖(a)之模式上的側視圖及第27圖(b)之模式上的正視圖所示,在將電子元件13的搭載側作為上側之狀態將晶圓8收容於成形後晶圓收容部542內的片匣後,解除吸附。根據以上,使用實施形態之吸附單元1的樹脂密封及之後之晶圓的收容結束。 Next, as shown in the side view on the pattern in FIG. 25, the resin-sealed wafer 8 has the mounting side of the electronic component 13 as the lower side and is sucked by the suction unit 1. Then, as shown in the side view on the pattern in FIG. 26, the wafer 8 sucked by the suction unit 1 is inverted, the mounting side of the electronic component 13 is set as the upper side, and the suction unit 1 is moved by the moving unit 544. Next, as shown in the side view in the mode of FIG. 27 (a) and the front view in the mode of FIG. 27 (b), the suction unit 1 sets the wafer with the mounting side of the electronic component 13 as the upper side. 8 After accommodating the cassettes in the post-forming wafer accommodating portion 542, the adsorption is released. As described above, the resin sealing using the adsorption unit 1 of the embodiment and the subsequent wafer storage are completed.

作為上述之實施形態的樹脂密封方法,表示是壓縮成形之一例的晶片朝下(chip down)成形。使晶圓8的電子元件13之搭載側的表面朝下(即,晶片朝下),將晶圓8設定於上模551,並將樹脂供給至下模531,藉(在加熱部被升溫之)下模 531對樹脂加熱器而熔化(在所供給之樹脂為液狀況係因被加熱而變成低黏度)後,使下模531上升,將電子元件13浸漬於熔化樹脂81b並鎖模,(經過固定時間後)樹脂變硬,而成形結束。 As the resin sealing method of the above-mentioned embodiment, chip down molding is shown as an example of compression molding. With the surface on the mounting side of the electronic component 13 of the wafer 8 facing downward (that is, the wafer is facing downward), the wafer 8 is set in the upper mold 551, and the resin is supplied to the lower mold 531. Lower mold 531 is melted by the resin heater (because the supplied resin is in a liquid state due to being heated and becomes low in viscosity), the lower mold 531 is raised, the electronic component 13 is dipped in the molten resin 81b, and the mold is locked, (after a fixed time After) the resin hardens and the molding is finished.

相對地,在是使晶圓8的電子元件13之搭載側的表面朝下並進行樹脂密封之壓縮成形之其他的例子之晶片朝下成形,因為使晶圓8的電子元件13之搭載側的表面朝上,所以晶圓8係被設定於下模531。因此,樹脂就被供給至晶圓8上。在樹脂密封,使用在熱硬化性樹脂含有填充劑(氧化矽等)者。因此,即使是液狀樹脂亦在常溫大多黏度高。因此,在設置電子元件13等的情況,顆粒狀樹脂、粉狀樹脂、或預成形樹脂等係理所當然,即使是液狀樹脂,亦供給至電子元件13等上時,因為以不均勻之狀態(在設置電子元件13等之部分與未設置之部分樹脂之供給狀態成為不均勻。又,電子元件13係常在晶圓8被配置多個,若在避開電子元件13下供給,亦因為供給位置偏差而供給狀態成為不均勻。)供給樹脂,所以在成形後之密封樹脂發生未填充(內部空隙或外部之密封樹脂的不足)的可能性高。 On the other hand, in the other example where the surface of the electronic component 13 on the wafer 8 is faced down and resin-sealed compression molding is performed, the wafer is formed downward because the electronic component 13 on the wafer 8 is placed on the side The surface is facing up, so the wafer 8 is set in the lower mold 531. Therefore, the resin is supplied onto the wafer 8. For resin sealing, a thermosetting resin containing a filler (such as silica) is used. Therefore, even liquid resins have high viscosity at room temperature. Therefore, when the electronic component 13 and the like are provided, it is taken for granted that granular resin, powdered resin, or pre-formed resin, etc. Even when a liquid resin is supplied to the electronic component 13 and the like, it is in an uneven state ( The supply state of the resin between the part where the electronic component 13 is installed and the part where it is not provided becomes uneven. Also, the electronic component 13 is often arranged on the wafer 8 in a plurality. The position is uneven and the supply state becomes non-uniform.) Since the resin is supplied, there is a high possibility that the sealing resin after molding is not filled (internal gaps or insufficient sealing resin on the outside).

因此,樹脂密封係以晶片朝下成形進行較佳。可是,在樹脂密封步驟之前後步驟的裝置,常以晶片朝上將晶圓8供給至裝置,並以晶片朝上排出晶圓8。因此,在前後步驟的兼顧,在如實施形態般以晶片朝下成形進行樹脂密封的情況,使在晶片朝上之狀態從前步驟所供給之晶圓8表背反轉(flip),設定成晶片朝下之狀態,將晶圓8設定於上模551並進 行成形,使成形後的晶圓8再表背反轉(flip),為了後步驟,需要以晶片朝上排出晶圓8。 Therefore, the resin sealing is preferably performed by the wafer being formed downward. However, in the device before and after the resin sealing step, the wafer 8 is usually supplied to the device with the wafer facing upward, and the wafer 8 is discharged with the wafer facing upward. Therefore, in consideration of both the front and back steps, in the case of resin sealing by forming the wafer downward as in the embodiment, the front and back of the wafer 8 supplied from the previous step with the wafer facing up is flipped to set the wafer. With the wafer 8 facing downward, the wafer 8 is set in the upper mold 551 and moved forward. Row forming is performed to flip the formed wafer 8 back and front. For later steps, the wafer 8 needs to be discharged with the wafer facing up.

在第28圖,表示實施形態之吸附單元1的變形例之模式上的平面圖。第28圖所示之吸附單元1的變形例係其特徵為:具有四叉狀的本體部10,並可吸附矩形的板狀元件。除此以外,具有與實施形態之吸附單元1相同的構成。 Fig. 28 is a plan view showing a modified example of the adsorption unit 1 according to the embodiment. The modified example of the adsorption unit 1 shown in FIG. 28 is characterized in that it has a quadrilateral body portion 10 and can adsorb rectangular plate-shaped elements. Other than that, it has the same structure as the adsorption unit 1 of the embodiment.

在第29圖,表示實施形態之樹脂密封裝置的變形例之模式上的構成。特徵為:具有3個第29圖所示之實施形態的樹脂密封單元,並構成為樹脂密封單元的個數可增減。除此以外,具有與實施形態之樹脂密封裝置相同的構成。 FIG. 29 shows a schematic configuration of a modification of the resin sealing device of the embodiment. It is characterized by having three resin sealing units according to the embodiment shown in FIG. 29, and the number of resin sealing units can be increased or decreased. Other than that, it has the same configuration as the resin sealing device of the embodiment.

如以上所示,說明了實施形態及變形例,但是適當地組合上述之各實施形態及變形例的構成亦從最初預定。 As mentioned above, although embodiment and modification were demonstrated, the structure which combined each said embodiment and modification suitably is also planned from the beginning.

說明了本發明之實施形態,但是應認為這次所揭示之實施形態係在所有的事項上是舉例表示,不是用以限制者。本發明的範圍係根據申請專利範圍所表示,設法包含與申請專利範圍同等之意義及在範圍內之所有的變更。 Although the embodiment of the present invention has been described, the embodiment disclosed this time should be considered as an example in all matters and not intended to be a limitation. The scope of the present invention is based on the scope of the patent application, and it is intended to include all changes within the meaning and scope equivalent to the scope of the patent application.

1‧‧‧吸附單元 1‧‧‧Adsorption unit

2‧‧‧吸附面側板 2‧‧‧ Adsorption surface side plate

3‧‧‧吸附墊 3‧‧‧ Adsorption Pad

4‧‧‧配接器 4‧‧‧ adapter

5‧‧‧流路 5‧‧‧flow

10‧‧‧本體部 10‧‧‧Body

110‧‧‧吸附部 110‧‧‧ Adsorption Department

Claims (19)

一種吸附單元,包括:本體部;該本體部的內部之中空的流路;以及該本體部之吸附面側的吸附部;貫穿孔被設置於該吸附部;該貫穿孔與該流路係連通;該吸附部係構成為可追蹤板狀元件的彎曲。 An adsorption unit includes: a main body portion; a hollow flow path inside the main body portion; and an adsorption portion on an adsorption surface side of the main body portion; a through hole is provided in the adsorption portion; the through hole is in communication with the flow path system The adsorption unit is configured to track the bending of the plate-like element. 如申請專利範圍第1項之吸附單元,其中該吸附部係包括吸附墊;該吸附墊係包括:墊中心部,係被設置墊開口部;及從該墊中心部所伸展之墊外周部。 For example, the adsorption unit of the first patent application range, wherein the adsorption unit includes an adsorption pad; the adsorption pad system includes: a pad central portion, which is provided with an opening portion of the pad; and an outer peripheral portion of the pad extending from the central portion of the pad. 如申請專利範圍第2項之吸附單元,其中構成為在該板狀元件之吸附時該墊外周部之遠位端的至少一部分之表面與該板狀元件接觸,並可追蹤該板狀元件的彎曲。 For example, the adsorption unit of the patent application No. 2 is configured such that at least a part of the surface of the distal end of the outer peripheral portion of the pad is in contact with the plate-like element when the plate-like element is being suctioned, and can track the bending of the plate-like element . 如申請專利範圍第3項之吸附單元,其中該墊外周部之該遠位端包括從該遠位端至近位側凹下的遠位端凹部。 For example, in the adsorption unit of claim 3, the distal end of the outer peripheral portion of the pad includes a distal end recess that is recessed from the distal end to the proximal side. 如申請專利範圍第3項之吸附單元,其中凹部被設置於該本體部之該吸附面側;在該板狀元件之吸附前,該墊外周部之該遠位端係位於遠離該凹部的位置,而在該板狀元件之吸附時,該墊外周部之該遠位端係位於與該凹部接觸的位置。 For example, the adsorption unit of the patent application No. 3, wherein the concave portion is provided on the adsorption surface side of the body portion; before the adsorption of the plate-shaped element, the distal end of the outer peripheral portion of the pad is located away from the concave portion. When the plate-shaped element is adsorbed, the distal end of the outer peripheral portion of the pad is located in contact with the concave portion. 如申請專利範圍第5項之吸附單元,其中該凹部係環形之槽。 For example, the adsorption unit of the patent application No. 5 wherein the recess is a ring-shaped groove. 如申請專利範圍第2項之吸附單元,其中該吸附墊係更包括墊內側支撐部,該墊內側支撐部係從比該墊外周部更近位側之該墊中心部的位置在與該墊外周部係相異的方向伸展;在該板狀元件之吸附時,該墊內側支撐部與該墊外周部一起支撐該板狀元件。 For example, the adsorption unit of the second patent application range, wherein the adsorption pad further includes a pad inner support portion, and the pad inner support portion is located at a position closer to the pad than the pad center portion on the side closer to the pad than the outer peripheral portion of the pad. The outer peripheral portion stretches in different directions; during the adsorption of the plate-shaped element, the inner support portion of the pad supports the plate-shaped element together with the outer peripheral portion of the pad. 如申請專利範圍第7項之吸附單元,其中缺口部被設置於該墊內側支撐部。 For example, the adsorption unit of the seventh scope of the patent application, wherein the notch portion is provided on the inner support portion of the pad. 如申請專利範圍第2項之吸附單元,其中該吸附部係包括支撐該吸附墊的配接器;該配接器係包括:被設置該貫穿孔之配接器本體部;凸緣,係從該配接器本體部之該貫穿孔之一方的端在與該本體部之該吸附面側的表面平行的方向伸展;以及配接器腳部,係從該配接器本體部之該貫穿孔之另一方的端在與該本體部之該吸附面側的表面平行的方向伸展;該配接器腳部係包括從該配接器腳部的遠位端在該凸緣之方向所伸展的突起部。 For example, the adsorption unit of the second patent application range, wherein the adsorption unit includes an adapter supporting the adsorption pad; the adapter includes: an adapter body portion provided with the through hole; a flange, from One end of the through-hole of the adapter body portion extends in a direction parallel to the surface on the suction surface side of the body portion; and the adapter leg portion is from the through-hole of the adapter body portion The other end extends in a direction parallel to the surface on the side of the suction surface of the body portion; the adapter foot portion includes an extension from the distal end of the adapter foot portion in the direction of the flange. Protrusion. 如申請專利範圍第9項之吸附單元,其中藉由該配接器本體部嵌入該墊開口部,該吸附墊係被安裝於該配接器。 For example, the suction unit of the patent application No. 9 wherein the pad body is embedded in the opening of the pad through the adapter body, and the suction pad is mounted on the adapter. 如申請專利範圍第1項之吸附單元,其中配合該板狀元件之彎曲,該吸附部之配置是可變更。 For example, if the adsorption unit of the first patent application scope is adapted to the bending of the plate-shaped element, the configuration of the adsorption unit can be changed. 如申請專利範圍第1項之吸附單元,其中可插入隔著既定間隙收容於該板狀元件之複數個的各個之板狀元件收容部的該間隙。 For example, the adsorption unit of the scope of patent application No. 1 can be inserted into the gap of a plurality of plate-shaped element accommodating portions accommodated in the plurality of plate-shaped elements via a predetermined gap. 一種吸附單元,包括:本體部;該本體部的內部之中空的流路;以及該本體部之吸附面側的吸附部;貫穿孔被設置於該吸附部;該貫穿孔與該流路係連通;該吸附部係包括吸附墊;該吸附墊係包括:墊中心部,係被設置墊開口部;從該墊中心部所伸展之墊外周部;以及墊內側支撐部,係從比該墊外周部更近位側之該墊中心部的位置在與該墊外周部係相異的方向伸展;缺口部被設置於該墊內側支撐部;經由該流路與該貫穿孔排出氣體;進而,從板狀元件與該缺口部之間排出氣體;使該吸附部吸附該板狀元件;構成為藉由使該吸附部吸附該板狀元件而使該吸附墊產生彈性變形。 An adsorption unit includes: a main body portion; a hollow flow path inside the main body portion; and an adsorption portion on an adsorption surface side of the main body portion; a through hole is provided in the adsorption portion; the through hole is in communication with the flow path system The adsorption unit includes an adsorption pad; the adsorption pad system includes: a pad center portion, which is provided with a pad opening portion; a pad outer peripheral portion extending from the pad center portion; and a pad inner support portion, which extends from the outer periphery of the pad The position of the center portion of the pad closer to the portion extends in a direction different from the outer peripheral portion of the pad; the notch portion is provided on the inner support portion of the pad; the gas is discharged through the flow path and the through hole; The gas is exhausted between the plate-shaped element and the notch portion; the adsorption portion adsorbs the plate-shaped element; and the structure is configured to elastically deform the adsorption pad by causing the adsorption portion to adsorb the plate-shaped element. 一種板狀元件搬運單元,包括:如申請專利範圍第1項之吸附單元;及用以使該吸附單元移動的移動單元。 A plate-shaped component handling unit includes: an adsorption unit such as the first item in the scope of patent application; and a moving unit for moving the adsorption unit. 一種樹脂密封裝置,包括:如申請專利範圍第14項之板狀元件搬運單元、與樹脂密封單元。 A resin sealing device includes: a plate-shaped component handling unit such as the item No. 14 of the scope of patent application, and a resin sealing unit. 如申請專利範圍第15項之樹脂密封裝置,其中可增減該樹脂密封單元的台數。 For example, the number of resin sealing units can be increased or decreased by applying the resin sealing device of the 15th patent scope. 一種板狀元件搬運方法,包括:定位步驟,係使如申請專利範圍第1或13項之吸附單元的該吸附部位於該板狀元件上;吸附步驟,係藉由通過該貫穿孔及該流路排出氣體,使該吸附部吸附該板狀元件;以及移動步驟,係移動該吸附部所吸附之該板狀元件。 A method for conveying a plate-shaped component includes: a positioning step of positioning the suction portion of the suction unit such as the item 1 or 13 of the patent application on the plate-shaped component; and a suction step of passing the through-hole and the flow The gas is exhausted from the path to cause the adsorption portion to adsorb the plate-shaped element; and the moving step is to move the plate-shaped element adsorbed by the adsorption portion. 如申請專利範圍第17項之板狀元件搬運方法,其中更包括使該吸附部所吸附之該板狀元件反轉的步驟。 For example, the method for conveying a plate-shaped component according to item 17 of the scope of patent application, further comprising the step of reversing the plate-shaped component adsorbed by the adsorption unit. 一種樹脂密封方法,包括:搬運步驟,係使用如申請專利範圍第17項之板狀元件搬運方法來搬運該板狀元件;及進行樹脂密封之步驟。 A resin sealing method includes: a conveying step of conveying the plate-shaped element using a plate-shaped element conveying method such as the item 17 of the scope of patent application; and a step of performing resin sealing.
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