TW201739130A - Laser processing apparatus and laser processing method using the same - Google Patents

Laser processing apparatus and laser processing method using the same Download PDF

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TW201739130A
TW201739130A TW106113175A TW106113175A TW201739130A TW 201739130 A TW201739130 A TW 201739130A TW 106113175 A TW106113175 A TW 106113175A TW 106113175 A TW106113175 A TW 106113175A TW 201739130 A TW201739130 A TW 201739130A
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laser
processing
laser beam
oscillation
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TWI750164B (en
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朴憲旭
蘇二彬
趙珉煐
池昊眞
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Ap系統股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383Parallel arrangements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0331Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers for lift-off processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4087Array arrangements, e.g. constituted by discrete laser diodes or laser bar emitting more than one wavelength

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Laser Beam Processing (AREA)
  • Lasers (AREA)

Abstract

The present invention, which relates to a laser processing apparatus and a laser processing method, a problem in laser oscillation may be immediately detected and corrected, and an oscillation method for a plurality of lasers may be changed as necessary, and thus productivity of a laser processing process may be increased.

Description

雷射處理設備與使用其之雷射處理方法Laser processing device and laser processing method using same

本發明是有關於一種雷射處理設備(laser processing apparatus)以及使用所述雷射處理設備的雷射處理方法(laser processing method),且特別是有關於一種使得能夠容易地控制多個雷射源的雷射處理設備以及使用所述雷射處理設備的雷射處理方法。The present invention relates to a laser processing apparatus and a laser processing method using the same, and more particularly to a laser source capable of easily controlling a plurality of laser sources A laser processing apparatus and a laser processing method using the laser processing apparatus.

正積極地進行研究以開發作為下一代顯示器的柔性顯示器(flexible display),其薄而輕,並且可彎曲或可折疊但耐衝擊。實際上已開發出一些柔性顯示器,但其需要進一步改善。Research is actively being conducted to develop a flexible display as a next-generation display that is thin and light, and that is bendable or foldable but impact resistant. Some flexible displays have actually been developed, but they need further improvement.

矽電晶體將玻璃基板或藍寶石基板用作基底材料基板。歸因於矽電晶體的低柔性以及基底材料基板的限制而難以將矽電晶體應用於柔性顯示器。因此,正進行研究以開發通過使用薄玻璃板作為基板、使用金屬板作為基板或使用塑膠基板來製造柔性半導體裝置的方法。A germanium transistor uses a glass substrate or a sapphire substrate as a substrate material substrate. It is difficult to apply a germanium transistor to a flexible display due to the low flexibility of the germanium transistor and the limitation of the substrate of the base material. Therefore, research is being conducted to develop a method of manufacturing a flexible semiconductor device by using a thin glass plate as a substrate, using a metal plate as a substrate, or using a plastic substrate.

作為實施柔性顯示器的實例,TFT電路以及為發光裝置的OLED形成於薄膜上的特定結構中。此處,因為薄膜不容易處置,因此TFT成型工藝是在薄膜附接到載體玻璃的情況下執行的。As an example of implementing a flexible display, a TFT circuit and an OLED which is a light-emitting device are formed in a specific structure on a film. Here, since the film is not easily handled, the TFT molding process is performed with the film attached to the carrier glass.

因此,在薄膜上形成TFT之後需要從載體玻璃分離薄膜的過程,且此過程是使用雷射剝離(laser-lift-off,LLO)方法執行。也就是說,可以通過將雷射照射到載體玻璃與薄膜之間的粘合劑來將能量施加到所述粘合劑以降低粘合強度,且接著可以從載體玻璃分離並且移除薄膜。Therefore, a process of separating a film from a carrier glass after forming a TFT on a film is performed, and this process is performed using a laser-lift-off (LLO) method. That is, energy can be applied to the adhesive by irradiating the laser to the adhesive between the carrier glass and the film to reduce the adhesive strength, and then the film can be separated and removed from the carrier glass.

在雷射剝離過程中,在工作臺速度與雷射的振盪頻率同步時,在將工作臺移動多達雷射光束寬度的同時照射雷射光束,其中工作臺速度是由雷射光束寬度以及雷射頻率確定。In the laser stripping process, when the table speed is synchronized with the oscillation frequency of the laser, the laser beam is irradiated while moving the table up to the width of the laser beam, wherein the table speed is determined by the width of the laser beam and the Ray The firing frequency is determined.

根據當前的商品化雷射剝離過程,在使用多個雷射源時,誘發多個雷射源以恒定頻率同時振盪以便進行所述過程。According to the current commercial laser stripping process, when multiple laser sources are used, multiple laser sources are induced to oscillate simultaneously at a constant frequency to perform the process.

然而,因為多個雷射振盪器同時驅動,因此雷射振盪器的維護週期以及消耗性元件的替換週期短。此外,因為不可能在需要維護單個雷射振盪器時個別地驅動以及維護雷射振盪器,因此降低雷射剝離過程的效率以及生產率。However, since a plurality of laser oscillators are simultaneously driven, the maintenance period of the laser oscillator and the replacement period of the consumable components are short. Furthermore, since it is not possible to individually drive and maintain the laser oscillator when it is necessary to maintain a single laser oscillator, the efficiency and productivity of the laser stripping process are reduced.

本發明提供一種能夠容易地檢測多個雷射源的振盪狀態的雷射處理設備以及使用所述雷射處理設備的雷射處理方法。The present invention provides a laser processing apparatus capable of easily detecting an oscillation state of a plurality of laser sources and a laser processing method using the same.

本發明提供一種能夠個別地使用多個雷射源的雷射處理設備以及使用所述雷射處理設備的雷射處理方法。The present invention provides a laser processing apparatus capable of individually using a plurality of laser sources and a laser processing method using the same.

本發明提供一種能夠通過降低設備的維護次數而改善雷射處理過程的效率和生產率的雷射處理設備以及使用所述雷射處理設備的雷射處理方法。The present invention provides a laser processing apparatus capable of improving the efficiency and productivity of a laser processing process by reducing the number of maintenance of the apparatus, and a laser processing method using the same.

根據示範性實施例,一種雷射處理設備包含:雷射產生單元,其經配置以產生照射到用於處理的目標的雷射光束的振盪信號,且使多個雷射光束振盪;雷射處理單元,其安置於由所述雷射產生單元振盪的所述雷射光束的傳播路徑上,且經配置以處理所述雷射光束;以及雷射觀測單元,其在所述傳播路徑上連接到所述雷射產生單元和所述雷射處理單元中的至少一個以檢測所述雷射光束的振盪且通過處理以及分析檢測到的資料而確定所述雷射產生單元的操作狀態。According to an exemplary embodiment, a laser processing apparatus includes: a laser generating unit configured to generate an oscillating signal of a laser beam irradiated to a target for processing, and oscillate a plurality of laser beams; laser processing a unit disposed on a propagation path of the laser beam oscillated by the laser generating unit and configured to process the laser beam; and a laser observation unit coupled to the propagation path At least one of the laser generating unit and the laser processing unit determines an operational state of the laser generating unit by detecting an oscillation of the laser beam and processing and analyzing the detected data.

所述雷射觀測單元可以包含:檢測部件,其連接到所述雷射產生單元和所述雷射處理單元中的至少一個,且經配置以測量所述雷射光束的振盪頻率以及脈衝資料;轉換部件,其經配置以將從所述檢測部件接收的所述雷射光束的類比資料轉換成數位資料;以及確定部件,其經配置以通過分析由所述轉換部件轉換的數位信號而確定所述振盪信號是否異常。The laser observation unit may include: a detecting component coupled to at least one of the laser generating unit and the laser processing unit, and configured to measure an oscillation frequency of the laser beam and pulse data; a conversion component configured to convert analog data of the laser beam received from the detection component into digital data; and a determining component configured to determine by analyzing a digital signal converted by the conversion component Whether the oscillation signal is abnormal.

所述雷射觀測單元可以包含控制部件,所述控制部件經配置以根據確定所述振盪信號是否異常的結果而控制所述振盪信號,所述結果已從所述確定部件接收。The laser observation unit may include a control component configured to control the oscillating signal based on a result of determining whether the oscillating signal is abnormal, the result having been received from the determining component.

所述檢測部件可以設置於以下位置中的至少一個:在所述雷射光束的傳播方向上位於所述雷射產生單元前部的位置、用於將所述雷射光束朝向所述用於處理的目標反射的位置,和用於控制所述雷射光束的長度的位置。The detecting member may be disposed at at least one of a position at a front portion of the laser generating unit in a propagation direction of the laser beam for directing the laser beam toward the processing The position of the target reflection, and the position used to control the length of the laser beam.

所述雷射產生單元可以包含:雷射控制部件,其經配置以產生所述多個雷射光束中的每一個的所述振盪信號;以及雷射產生部件,其連接到所述雷射控制部件以根據所產生的振盪信號而使每一雷射光束振盪。The laser generating unit may include: a laser control component configured to generate the oscillating signal of each of the plurality of laser beams; and a laser generating component coupled to the laser control The component oscillates each of the laser beams in accordance with the generated oscillating signal.

所述雷射處理設備可以進一步包含調整單元,所述調整單元經配置以根據上面放置所述用於處理的目標的工作臺的位置而針對所述用於處理的目標的每一處理區域調整所述雷射光束的振盪模式以及所述工作臺的操作狀態。The laser processing apparatus may further include an adjustment unit configured to adjust the processing area for the processing target for the location of the work station on which the target for processing is placed The oscillation mode of the laser beam and the operating state of the table.

所述調整單元可以包含:位置檢測部件,其經配置以測量所述工作臺的所述位置;調整部件,其連接到所述位置檢測部件以及所述雷射產生單元以根據所述工作臺的測量位置而調整所述雷射光束的所述振盪模式以及所述工作臺的移動速度;以及運動控制部件,其連接到所述調整部件以根據所述雷射光束的經調整振盪模式而控制所述工作臺的所述移動速度。The adjustment unit may include: a position detecting member configured to measure the position of the table; an adjustment member coupled to the position detecting member and the laser generating unit to be in accordance with the table Measuring the oscillation mode of the laser beam and the moving speed of the table by measuring a position; and a motion control component coupled to the adjustment component to control the adjusted oscillation mode according to the laser beam The moving speed of the workbench.

根據另一示例性實施例,一種雷射處理方法包含:根據用於處理的目標的處理條件而設定用於控制多個雷射光束的振盪的多個振盪條件;通過將所述所設定振盪條件傳遞到用於使所述多個雷射光束振盪的雷射產生部件而使所述多個雷射光束振盪;檢測振盪的所述多個雷射光束;以及通過使用檢測到的雷射光束資料而確定所述雷射產生部件的雷射光束振盪狀態。According to another exemplary embodiment, a laser processing method includes: setting a plurality of oscillation conditions for controlling oscillation of a plurality of laser beams according to processing conditions of a target for processing; by setting the set oscillation conditions Transmitting the plurality of laser beams to a laser generating component for oscillating the plurality of laser beams; detecting the plurality of laser beams that oscillate; and using the detected laser beam data And determining the oscillation state of the laser beam of the laser generating part.

所述設定所述多個振盪條件可以包含設定振盪模式,以使得所述多個雷射光束被同時驅動或交替地驅動。The setting the plurality of oscillation conditions may include setting an oscillation mode such that the plurality of laser beams are driven simultaneously or alternately.

所述確定所述雷射光束振盪狀態可以包含:比較所述檢測到的雷射光束資料與所述所設定振盪條件的資料;以及在所述檢測到的雷射光束資料的值不同於所述所設定振盪條件的所述資料時,確定所述雷射產生部件需要校正。The determining the oscillation state of the laser beam may include: comparing the detected laser beam data with the data of the set oscillation condition; and the value of the detected laser beam data is different from the When the data of the oscillation condition is set, it is determined that the laser generating part requires correction.

在所述檢測所述多個雷射光束期間,可以獲得所述多個雷射光束的振盪頻率以及脈衝資料。During the detecting of the plurality of laser beams, an oscillation frequency of the plurality of laser beams and pulse data may be obtained.

所述雷射處理方法可以包含:停止在所述多個雷射光束之間需要校正的雷射光束的振盪;以及在校正所述振盪停止雷射光束期間減小所述用於處理的目標的處理速度,在確定所述雷射產生部件需要校正之後,此時所述振盪模式為交替驅動。The laser processing method may include: stopping oscillation of a laser beam that needs to be corrected between the plurality of laser beams; and reducing the target for processing during correcting the oscillation to stop the laser beam Processing speed, after determining that the laser generating component requires correction, the oscillation mode is alternately driven at this time.

所述雷射處理方法可以包含:停止在所述多個雷射光束之間需要校正的雷射光束的振盪;以及在校正所述振盪停止雷射光束期間增大除所述振盪停止雷射光束以外的所述雷射光束的能量,在確定所述雷射產生部件需要校正之後,此時所述振盪模式為同時驅動。The laser processing method may include: stopping oscillation of a laser beam that needs to be corrected between the plurality of laser beams; and increasing a laser beam other than the oscillation during the correction of the oscillation to stop the laser beam The energy of the laser beam other than the one is determined to be simultaneously driven after determining that the laser generating component needs to be corrected.

所述雷射處理方法可以包含:檢測上面放置所述用於處理的目標的工作臺的位置;以及在所述工作臺的所述檢測到的位置為所述用於處理的目標的第一區域開始的位置時,通過同時驅動所述多個雷射光束而減小所述工作臺的移動速度,此時,在所述設定所述多個振盪條件期間,所述用於處理的目標劃分成包含在所述多個雷射光束的振盪方向上的邊緣的所述第一區域以及不包含所述邊緣的第二區域,且所述第一區域需要以高於所述第二區域的雷射光束能量的雷射光束能量進行處理。The laser processing method may include: detecting a position of the work table on which the target for processing is placed; and the detected position at the work station being the first area of the target for processing At the initial position, the moving speed of the table is reduced by simultaneously driving the plurality of laser beams, and at this time, during the setting of the plurality of oscillation conditions, the target for processing is divided into The first region including an edge in an oscillation direction of the plurality of laser beams and a second region not including the edge, and the first region requires a laser higher than the second region The laser beam energy of the beam energy is processed.

所述雷射處理方法可以包含在所述工作臺的所述檢測到的位置為所述用於處理的目標的第二區域開始的位置時,增大所述工作臺的移動速度,同時交替地驅動所述多個雷射光束。The laser processing method may include increasing a moving speed of the table when the detected position of the table is a position starting from a second region of the target for processing, while alternately Driving the plurality of laser beams.

根據又一示範性實施例,一種雷射處理方法包含:檢測上面放置用於處理的目標的工作臺的位置;以及根據所述工作臺的所述檢測到的位置而控制多個雷射光束的振盪條件以及所述用於處理的目標的處理速度。According to still another exemplary embodiment, a laser processing method includes: detecting a position of a stage on which a target for processing is placed; and controlling a plurality of laser beams according to the detected position of the stage The oscillation condition and the processing speed of the target for processing.

所述控制所述多個雷射光束的所述振盪條件以及所述用於處理的目標的所述處理速度可以包含在所述工作臺的所述檢測到的位置對應於所述用於處理的目標的邊緣時,同時驅動所述多個雷射光束且減小所述用於處理的目標的所述處理速度。The controlling the oscillation condition of the plurality of laser beams and the processing speed of the target for processing may be included in the detected position of the table corresponding to the processing for processing At the edge of the target, the plurality of laser beams are simultaneously driven and the processing speed of the target for processing is reduced.

所述控制所述多個雷射光束的所述振盪條件以及所述用於處理的目標的所述處理速度可以包含在所述工作臺的所述檢測到的位置偏離所述用於處理的目標的邊緣時,交替地驅動所述多個雷射光束且增大所述用於處理的目標的所述處理速度。The controlling the oscillation condition of the plurality of laser beams and the processing speed of the target for processing may include the target position of the table being deviated from the target for processing The edges of the plurality of laser beams are alternately driven and the processing speed of the target for processing is increased.

下文中將參考附圖詳細描述示範性實施例。然而,本發明可以用不同形式體現,且不應被解釋為限於本文中所陳述的實施例。而是,提供這些實施例是為了使得本發明將是透徹並且完整的,且這些實施例將把本發明的範圍完整地傳達給所屬領域的技術人員。在圖式中,可能會為了說明的清楚起見而誇示元件的尺寸,且相同參考數位始終指相同元件。Exemplary embodiments will hereinafter be described in detail with reference to the accompanying drawings. However, the invention may be embodied in different forms and should not be construed as being limited to the embodiments set forth herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention will be fully conveyed by those skilled in the art. In the drawings, the size of the elements may be exaggerated for clarity of the description, and the same reference numerals refer to the same elements.

根據一實施例的雷射處理設備旨在容易地檢測且控制照射到被處理的物件的雷射的振盪狀態,其可以確定用於使多個雷射振盪的振盪條件是否與實際振盪的雷射相同。此外,可以根據雷射的振盪狀態以及被處理的物件的處理區域而容易地可互換地使用多個雷射的振盪模式。此處,在一實施例中,雷射處理設備可以表示用於通過使用雷射剝離(LLO)方法從基板分離沉積於基板上的薄膜的設備。此外,被處理的物件可以是柔性有機發光二極體(flexible organic light-emitting diode,OLED)薄膜沉積於玻璃基板上的結構。A laser processing apparatus according to an embodiment is intended to easily detect and control an oscillation state of a laser that is irradiated to a processed object, which can determine whether or not an oscillation condition for causing a plurality of laser oscillations to oscillate with an actual oscillation the same. Furthermore, the oscillation modes of the plurality of lasers can be easily used interchangeably depending on the oscillation state of the laser and the processing region of the object being processed. Here, in an embodiment, the laser processing apparatus may represent an apparatus for separating a thin film deposited on a substrate from a substrate by using a laser lift-off (LLO) method. In addition, the object to be processed may be a structure in which a flexible organic light-emitting diode (OLED) film is deposited on a glass substrate.

然而,所述雷射處理設備不限於所述實施例,且因此可以應用於需要用於將雷射照射到被處理的物件的各種設備(例如雷射熱處理設備、雷射處理設備等等)的各種領域中,以確定經設定以使雷射振盪的振盪條件資料是否與實際振盪雷射的檢測到的資料相同並控制雷射振盪。However, the laser processing apparatus is not limited to the embodiment, and thus can be applied to various apparatuses (for example, a laser heat treatment apparatus, a laser processing apparatus, and the like) that are required to irradiate a laser to an object to be processed. In various fields, it is determined whether the oscillating condition data set to cause the laser oscillation is the same as the detected data of the actual oscillating laser and controls the laser oscillation.

在下文中,振盪雷射稱為雷射光束,且術語“振盪雷射”與術語“雷射光束”可以互換地使用,具有相同意義。In the following, an oscillating laser is referred to as a laser beam, and the term "oscillation laser" is used interchangeably with the term "laser beam" and has the same meaning.

將參考圖1到圖4描述根據一實施例的雷射處理設備。圖1為說明根據一實施例的雷射處理設備的圖。圖2為說明圖1的雷射產生單元以及雷射觀測單元的詳細配置的圖。圖3a及圖3b為說明根據一實施例的雷射的振盪模式的圖。圖4為說明根據一實施例的包含調整單元的雷射處理設備的圖。A laser processing apparatus according to an embodiment will be described with reference to FIGS. 1 through 4. FIG. 1 is a diagram illustrating a laser processing apparatus in accordance with an embodiment. FIG. 2 is a view for explaining a detailed configuration of the laser generating unit and the laser observation unit of FIG. 1. FIG. 3a and 3b are diagrams illustrating an oscillation mode of a laser according to an embodiment. 4 is a diagram illustrating a laser processing apparatus including an adjustment unit, in accordance with an embodiment.

根據一實施例的雷射處理設備1用以將雷射光束L照射到用於處理的目標S且檢測並控制雷射光束L的振盪狀態。雷射處理設備1包含:雷射產生單元100,其產生照射到用於處理的目標S的雷射光束L的振盪信號,且根據所述振盪信號使多個雷射光束振盪;雷射處理單元300,其安置於雷射光束L的傳播路徑上,且處理雷射光束L;以及雷射觀測單元400,其在雷射光束L的傳播路徑上連接到雷射產生單元100和雷射處理單元300中的至少一個以確定雷射光束L是否振盪,且通過處理以及分析檢測到的資料而確定雷射產生單元100的操作狀態。The laser processing apparatus 1 according to an embodiment is for irradiating the laser beam L to the target S for processing and detecting and controlling the oscillation state of the laser beam L. The laser processing apparatus 1 includes: a laser generating unit 100 that generates an oscillation signal of a laser beam L that is irradiated to a target S for processing, and oscillates a plurality of laser beams in accordance with the oscillation signal; a laser processing unit 300, disposed on the propagation path of the laser beam L, and processing the laser beam L; and a laser observation unit 400 connected to the laser generating unit 100 and the laser processing unit on the propagation path of the laser beam L At least one of 300 determines whether the laser beam L oscillates, and determines an operational state of the laser generating unit 100 by processing and analyzing the detected data.

雷射產生單元100為用於產生雷射光束L的元件,其包含:雷射控制部件110,其產生多個雷射光束L的相應振盪信號;以及雷射產生部件130,其連接到雷射控制部件110以根據所產生的振盪信號而使每一雷射光束L振盪。此外,雷射產生單元100可以包含安置在雷射產生部件130的前部的光閥部件150,光閥部件150的數目對應於雷射產生部件130的數目。The laser generating unit 100 is an element for generating a laser beam L, comprising: a laser control unit 110 that generates respective oscillation signals of the plurality of laser beams L; and a laser generating unit 130 connected to the laser The control unit 110 oscillates each of the laser beams L in accordance with the generated oscillation signal. Further, the laser generating unit 100 may include a light valve member 150 disposed at a front portion of the laser generating member 130, the number of the light valve members 150 corresponding to the number of the laser generating members 130.

此處,根據要振盪的雷射的數目,雷射產生單元100可以包含多個雷射產生部件130以及分別佈置在雷射產生部件130的前部的多個光閥部件150。也就是說,因為在一實施例中使用兩個雷射,因此雷射產生部件130可以包含第一雷射產生部件130以及第二雷射產生部件130。此外,光閥部件150可以包含分別佈置在第一雷射產生部件130以及第二雷射產生部件130的前部的第一光閥部件150以及第二光閥部件150。儘管雷射產生部件130與光閥部件150在下文描述為單個部件,但以下描述也適用於多個雷射產生部件130以及多個光閥部件150。Here, depending on the number of lasers to be oscillated, the laser generating unit 100 may include a plurality of laser generating members 130 and a plurality of light valve members 150 respectively disposed at the front of the laser generating members 130. That is, since two lasers are used in one embodiment, the laser generating part 130 may include the first laser generating part 130 and the second laser generating part 130. Further, the light valve member 150 may include a first light valve member 150 and a second light valve member 150 that are disposed at the front portions of the first laser generating member 130 and the second laser generating member 130, respectively. Although the laser generating component 130 and the light valve component 150 are described below as a single component, the following description is also applicable to the plurality of laser generating components 130 and the plurality of light valve components 150.

雷射產生部件130為用於使雷射振盪的裝置,其可以稱為振盪器。各種已知雷射產生器(例如KrF准分子雷射產生器、ArF准分子雷射產生器,等)可以根據要使用的雷射光束的波長而採用為雷射產生部件130。此處,可以根據基板與包含於用於處理的目標S中的薄膜之間的結合能量而確定雷射光束L的光源的類型。The laser generating component 130 is a device for oscillating a laser, which may be referred to as an oscillator. Various known laser generators (e.g., KrF excimer laser generator, ArF excimer laser generator, etc.) can be employed as the laser generating component 130 depending on the wavelength of the laser beam to be used. Here, the type of the light source of the laser beam L can be determined according to the bonding energy between the substrate and the film contained in the object S for processing.

光閥部件150安置在雷射產生部件130的前部以阻斷雷射光束L的路徑。也就是說,光閥部件150可以與雷射產生部件130的雷射光束L的傳播方向平行地安置以打開雷射光束L的路徑,或可以安置在與雷射光束L的傳播方向相交的方向上以阻斷雷射光束L的路徑。The light valve member 150 is disposed at the front of the laser generating member 130 to block the path of the laser beam L. That is, the light valve member 150 may be disposed in parallel with the propagation direction of the laser beam L of the laser generating member 130 to open the path of the laser beam L, or may be disposed in a direction intersecting the propagation direction of the laser beam L. Upper to block the path of the laser beam L.

雷射處理單元300在雷射產生單元100的前部安置於雷射光束L的傳播路徑上,以將雷射光束L處理成直線形狀(直線束)且處理此直線的能量分佈。雷射處理單元300包含用於處理雷射光束L的形狀的透鏡系統(未示出)、用於通過反射雷射光束L而改變雷射光束L的傳播路徑的反射鏡310,以及用於控制雷射光束L的長度的射束切割器(beam cutter)350。為了確定並控制雷射光束L的振盪狀態,雷射觀測單元400包含:檢測部件410,其連接到雷射產生單元100和雷射處理單元300中的至少一個以測量雷射光束L的振盪頻率以及脈衝資料;轉換部件430,其連接到檢測部件410以將從檢測部件410接收的雷射光束L的資料轉換從數位資料;以及確定部件450,且通過分析經轉換數位信號而確定雷射光束L的振盪信號是否異常。此外,雷射觀測單元400包含控制部件470,其根據確定所述振盪信號是否異常的結果而控制雷射光束L的振盪信號,所述結果已從確定部件450接收。The laser processing unit 300 is disposed on the propagation path of the laser beam L at the front of the laser generating unit 100 to process the laser beam L into a linear shape (straight line beam) and process the energy distribution of the straight line. The laser processing unit 300 includes a lens system (not shown) for processing the shape of the laser beam L, a mirror 310 for changing the propagation path of the laser beam L by reflecting the laser beam L, and for controlling A beam cutter 350 of the length of the laser beam L. In order to determine and control the oscillation state of the laser beam L, the laser observation unit 400 includes a detecting part 410 connected to at least one of the laser generating unit 100 and the laser processing unit 300 to measure the oscillation frequency of the laser beam L. And a pulse data; a conversion component 430 coupled to the detection component 410 to convert data of the laser beam L received from the detection component 410 from the digital data; and determining component 450, and determining the laser beam by analyzing the converted digital signal Whether the oscillation signal of L is abnormal. Furthermore, the laser observation unit 400 includes a control component 470 that controls the oscillating signal of the laser beam L based on the result of determining whether the oscillating signal is abnormal, the result having been received from the determining component 450.

也就是說,雷射觀測單元400包含用於測量因雷射產生單元100而振盪的雷射光束L的傳播路徑上的雷射光束L的振盪頻率以及脈衝資料、比較所測量振盪頻率以及脈衝資料與從雷射控制部件110傳遞到雷射產生部件130的振盪信號資料以確定雷射光束L的振盪信號是否異常,以及根據所述確定的結果而控制雷射控制部件110的操作的配置。That is, the laser observation unit 400 includes an oscillation frequency and a pulse data of the laser beam L on the propagation path of the laser beam L oscillated by the laser generating unit 100, comparison of the measured oscillation frequency, and pulse data. The oscillating signal data transmitted from the laser control section 110 to the laser generating section 130 determines whether the oscillation signal of the laser beam L is abnormal, and the configuration of controlling the operation of the laser control section 110 in accordance with the result of the determination.

檢測部件410安置於雷射光束L的傳播路徑上以感測雷射光束L,其可以連接到雷射產生單元100和雷射觀測單元400中的至少一個。也就是說,檢測部件410可以設置於以下位置中的至少一個:在雷射產生單元100的前部的位置、用於將雷射光束L反射到用於處理的目標S的位置,以及用於控制雷射光束L在雷射光束L的傳播路徑上的長度的位置。The detecting part 410 is disposed on a propagation path of the laser beam L to sense the laser beam L, which may be connected to at least one of the laser generating unit 100 and the laser observation unit 400. That is, the detecting part 410 may be disposed at at least one of a position at the front of the laser generating unit 100, a position for reflecting the laser beam L to the target S for processing, and for The position of the length of the laser beam L on the propagation path of the laser beam L is controlled.

此處,檢測部件410可以包含:第一檢測器412,其安置於雷射產生單元100的前部;第二檢測器414,其安置於已透射穿過反射鏡310以改變朝向用於處理的目標S的雷射光束L的傳播路徑的雷射光束L到達的位置處;以及第三檢測器416,其安置於通過射束切割器350分隔開以控制雷射光束L的長度的殘餘雷射光束L到達的位置處。Here, the detecting component 410 may include a first detector 412 disposed at a front portion of the laser generating unit 100 and a second detector 414 disposed to be transmitted through the mirror 310 to change orientation toward processing. a position at which the laser beam L of the propagation path of the laser beam L of the target S arrives; and a third detector 416 disposed at a residual thunder separated by the beam cutter 350 to control the length of the laser beam L At the position where the beam L arrives.

將第一檢測器412、第二檢測器414以及第三檢測器416安置在上述位置的原因描述如下。在安置第一檢測器412的位置處,雷射光束L最初被振盪以照射到用於處理的目標S,且因此第一檢測器412可以容易地檢測雷射光束L。此外,在安置第二檢測器414的位置處,第二檢測器414可以容易地檢測雷射光束L,即使第二檢測器414不安置於雷射光束L的傳播路徑上也是如此,歸因於反射鏡310的材料特性因此反射鏡310部分地透射雷射光束L而非將全部雷射光束L朝向用於處理的目標S反射。最後,在安置第三檢測器416的位置處,第三檢測器416可以容易地檢測雷射光束L,即使第三檢測器416不安置於雷射光束L的傳播路徑上也是如此,因為射束切割器350用以調整雷射光束L的長度,且可以容易地在所述位置處檢測到長度調整之後分離的殘餘雷射光束L。也就是說,實施例的檢測部件410安置在可以檢測雷射光束L而不阻斷雷射光束L朝向用於處理的目標S傳播的位置處。The reason why the first detector 412, the second detector 414, and the third detector 416 are placed at the above positions is described below. At the position where the first detector 412 is disposed, the laser beam L is initially oscillated to illuminate the target S for processing, and thus the first detector 412 can easily detect the laser beam L. Further, at the position where the second detector 414 is disposed, the second detector 414 can easily detect the laser beam L even if the second detector 414 is not disposed on the propagation path of the laser beam L, due to The material properties of mirror 310 are therefore that mirror 310 partially transmits laser beam L rather than reflecting all of the laser beam L toward the target S for processing. Finally, at the position where the third detector 416 is disposed, the third detector 416 can easily detect the laser beam L even if the third detector 416 is not disposed on the propagation path of the laser beam L because the beam The cutter 350 is used to adjust the length of the laser beam L, and the residual laser beam L separated after the length adjustment can be easily detected at the position. That is, the detecting part 410 of the embodiment is disposed at a position where the laser beam L can be detected without blocking the laser beam L from propagating toward the target S for processing.

能夠感測光(例如雷射光束L)的元件(例如,光電二極體)可以用作檢測部件410。也就是說,用於通過將光自身或包含於光中的資訊轉換成電信號而檢測光的裝置被用於檢測單元410中,且因此檢測單元410可以即時地(in real time)獲得雷射光束L的振盪頻率以及脈衝資料。An element capable of sensing light (for example, a laser beam L) (for example, a photodiode) can be used as the detecting part 410. That is, a means for detecting light by converting light itself or information contained in light into an electrical signal is used in the detecting unit 410, and thus the detecting unit 410 can obtain the laser in real time. The oscillation frequency of the beam L and the pulse data.

轉換部件430將由檢測部件410檢測到的雷射光束L的類比資料轉換成數位格式。也就是說,數位轉換器(digitizer)用以將由用於檢測雷射的光學信號檢測器測量的信號轉換成數位信號,以使得經轉換信號可以輸入到下文描述的控制部件。The conversion section 430 converts the analog data of the laser beam L detected by the detecting section 410 into a digital format. That is, a digitizer is used to convert a signal measured by an optical signal detector for detecting a laser into a digital signal, so that the converted signal can be input to a control section described below.

確定單元450顯示從轉換部件430傳遞的雷射光束L的數位資料,且分析從轉換部件430傳遞的雷射光束L的數位資料以確定雷射光束L的振盪信號是否異常。也就是說,確定單元450比較由檢測部件410檢測到的雷射光束L的資料(下文稱為檢測到的資料)與從雷射控制部件110傳遞到雷射產生部件130的振盪信號的資料以使雷射產生單元100中的雷射光束L振盪(下文稱為設定資料)。在檢測到的資料與設定資料具有相同值時,確定部件450確定雷射光束L的振盪的異常尚未發生。然而,在檢測到的資料與設定資料具有不同值時,確定部件450確定已發生雷射光束L的振盪的異常。如上文所描述,檢測到的資料與設定資料可以是雷射光束L的頻率資料與脈衝資料。The determining unit 450 displays the digital data of the laser beam L transmitted from the converting unit 430, and analyzes the digital data of the laser beam L transmitted from the converting unit 430 to determine whether the oscillation signal of the laser beam L is abnormal. That is, the determination unit 450 compares the data of the laser beam L detected by the detecting section 410 (hereinafter referred to as detected data) with the data of the oscillation signal transmitted from the laser control section 110 to the laser generating section 130. The laser beam L in the laser generating unit 100 is oscillated (hereinafter referred to as setting data). When the detected data has the same value as the setting data, the determining section 450 determines that the abnormality of the oscillation of the laser beam L has not occurred. However, when the detected data has a different value from the setting data, the determining section 450 determines that the abnormality of the oscillation of the laser beam L has occurred. As described above, the detected data and the set data may be the frequency data and the pulse data of the laser beam L.

用以根據確定部件450的確定結果控制雷射產生單元100的控制部件470根據確定雷射光束L的振盪的異常是否已發生的結果而控制雷射產生部件130的振盪操作,所述結果已從確定部件450接收。也就是說,在從確定部件450接收到的確定結果指示設定資料不同于測量資料時,控制部件470將校正信號傳遞到雷射控制部件110,以使得設定資料與測量資料可以彼此相等。The control section 470 for controlling the laser generating unit 100 according to the determination result of the determining section 450 controls the oscillation operation of the laser generating section 130 based on the result of determining whether the abnormality of the oscillation of the laser beam L has occurred, the result has been The determining component 450 receives. That is, when the determination result received from the determination section 450 indicates that the setting material is different from the measurement material, the control section 470 transmits the correction signal to the laser control section 110 so that the setting data and the measurement data can be equal to each other.

雷射處理設備1可以進一步包含調整單元500,所述調整單元根據上面放置用於處理的目標S的工作臺50的位置而針對用於處理的目標S的每一處理區域調整雷射光束L的振盪模式以及工作臺50的移動速度。The laser processing apparatus 1 may further comprise an adjustment unit 500 that adjusts the laser beam L for each processing region of the target S for processing in accordance with the position of the table 50 on which the target S for processing is placed. The oscillation mode and the moving speed of the table 50.

調整單元500為用於根據雷射光束L照射到的用於處理的目標S的位置而容易地改變雷射光束L的處理條件的元件,且包含:位置檢測部件510,其測量工作臺50的位置;調整部件530,其連接到位置檢測部件510以及雷射產生單元100以根據工作臺50的所測量位置而調整雷射光束L的振盪模式以及工作臺50的操作狀態;以及運動控制部件550,其連接到調整部件530以根據雷射光束L的經調整振盪模式而控制工作臺50的速度。The adjustment unit 500 is an element for easily changing the processing condition of the laser beam L according to the position of the target S for processing irradiated by the laser beam L, and includes: a position detecting part 510 that measures the stage 50 Positioning unit 530 coupled to the position detecting unit 510 and the laser generating unit 100 to adjust an oscillation mode of the laser beam L and an operation state of the stage 50 according to the measured position of the stage 50; and the motion control unit 550 It is connected to the adjustment component 530 to control the speed of the table 50 in accordance with the adjusted oscillation mode of the laser beam L.

位置檢測部件510為用於測量工作臺50的位置(因為工作臺50移動)的元件,其例如可以使用位置編碼器。也就是說,位置檢測部件510即時地檢測工作臺50的位置,且將工作臺50的位置資料傳遞到調整部件530。更詳細地,儘管位置檢測部件510收集工作臺50的位置資料,但位置檢測部件510可以用來檢測放置在工作臺50上的用於處理的目標S的位置。舉例來說,假定工作臺50橫向劃分成第一部分到第十部分,且用於處理的目標S放置在工作臺50上並覆蓋第三部分到第七部分。因此,位置檢測部件510可以認識到用於處理的目標S不存在於第一部分和第二部分上,但存在於第三部分以及後續部分上。也就是說,為了根據工作臺50的位置而檢測用於處理的目標S的位置,預先設定工作臺50與用於處理的目標S之間的位置關係,以使得可以根據所述位置關係而檢測用於處理的目標S的位置。The position detecting member 510 is an element for measuring the position of the table 50 (because the table 50 is moved), which may use, for example, a position encoder. That is, the position detecting section 510 instantly detects the position of the table 50 and transmits the positional data of the table 50 to the adjusting section 530. In more detail, although the position detecting section 510 collects the positional material of the table 50, the position detecting section 510 can be used to detect the position of the target S for processing placed on the table 50. For example, it is assumed that the work table 50 is laterally divided into the first portion to the tenth portion, and the target S for processing is placed on the work table 50 and covers the third portion to the seventh portion. Therefore, the position detecting section 510 can recognize that the target S for processing does not exist on the first portion and the second portion, but exists on the third portion and the subsequent portion. That is, in order to detect the position of the target S for processing according to the position of the work table 50, the positional relationship between the work table 50 and the target S for processing is set in advance so that it can be detected according to the positional relationship The location of the target S for processing.

調整部件530用以根據從位置檢測部件510接收的工作臺50的位置而改變雷射光束L的振盪模式或控制工作臺50的移動,其將用於改變雷射光束L的振盪模式的控制信號與用於改變工作臺50的移動速度的控制信號分別傳遞到雷射控制部件110與運動控制部件550。The adjusting unit 530 is configured to change the oscillation mode of the laser beam L or the movement of the control table 50 according to the position of the table 50 received from the position detecting unit 510, which will be used to change the control signal of the oscillation mode of the laser beam L. Control signals for changing the moving speed of the table 50 are transmitted to the laser control unit 110 and the motion control unit 550, respectively.

運動控制部件550從調整部件530接收用於改變工作臺50的移動速度的控制信號,且根據接收到的信號而提供用於移動工作臺50的功率。The motion control section 550 receives a control signal for changing the moving speed of the stage 50 from the adjusting section 530, and supplies power for moving the stage 50 in accordance with the received signal.

如上文所描述而配置的雷射處理設備1即時地比較具有用於使雷射光束L振盪的振盪信號的設定資料與在根據所設定的振盪信號使雷射光束L振盪(在通過使用多個雷射光束L處理用於處理的目標S期間)之後測量的雷射光束L的測量資料。因此,可以容易地確定雷射光束L的振盪狀態的異常是否已發生。The laser processing apparatus 1 configured as described above instantaneously compares setting data having an oscillation signal for oscillating the laser beam L with oscillating the laser beam L according to the set oscillation signal (by using a plurality of The laser beam L processes the measurement data of the laser beam L measured after the target S for processing. Therefore, it can be easily determined whether or not an abnormality of the oscillation state of the laser beam L has occurred.

此外,可以基於工作臺50的位置而容易地檢測用於處理的目標S的位置,且可以針對用於處理的目標S的每一檢測到的位置而調整雷射光束L的振盪模式以及工作臺50的移動速度。因此,不同工藝條件可以容易地應用在用於處理的目標S的每一位置,且因此可以增大處理效率以及生產率。Further, the position of the target S for processing can be easily detected based on the position of the stage 50, and the oscillation mode of the laser beam L and the table can be adjusted for each detected position of the target S for processing. 50 movement speed. Therefore, different process conditions can be easily applied to each position of the target S for processing, and thus processing efficiency and productivity can be increased.

將參考圖5到8描述根據一實施例的雷射處理方法。圖5為說明根據一實施例的雷射處理方法的流程圖。圖6為說明根據一實施例的基於是否校正雷射產生部件的雷射處理方法的流程圖。圖7為說明根據一實施例的基於用於處理的目標的處理條件的雷射處理方法的流程圖。圖8為說明圖7的實例的圖。A laser processing method according to an embodiment will be described with reference to FIGS. FIG. 5 is a flow chart illustrating a laser processing method in accordance with an embodiment. FIG. 6 is a flow chart illustrating a laser processing method based on whether to correct a laser generating component, according to an embodiment. 7 is a flow chart illustrating a laser processing method based on processing conditions of a target for processing, in accordance with an embodiment. FIG. 8 is a diagram illustrating an example of FIG. 7.

根據一實施例的雷射處理方法包含:根據用於處理的目標S的處理條件而設定用於控制多個雷射光束的振盪的多個振盪條件;通過將所述所設定振盪條件傳遞到用於使所述多個雷射光束L振盪的雷射產生部件130而使所述多個雷射光束振盪;檢測振盪的所述多個雷射光束L;以及通過使用檢測到的雷射光束資料而確定所述雷射產生部件130的雷射光束振盪狀態。A laser processing method according to an embodiment includes: setting a plurality of oscillation conditions for controlling oscillation of a plurality of laser beams in accordance with processing conditions of a target S for processing; transmitting the set oscillation conditions to Detecting the plurality of laser beams by oscillating the plurality of laser beams L to oscillate the plurality of laser beams; detecting the plurality of laser beams L that oscillate; and using the detected laser beam data The laser beam oscillation state of the laser generating section 130 is determined.

首先,檢查將以雷射光束L處理的用於處理的目標S的處理條件,且根據用於處理的目標S的處理條件而設定雷射光束L的振盪條件(S110)。用於處理的目標S的處理條件可以包含材料以及與要分離的薄膜的結合能量。此外,用於處理的目標S的處理條件可以包含在通過使用雷射光束L處理時可能受雷射光束L的能量影響的任何條件。另外,多個雷射光束L的振盪條件可以設定為同時驅動或交替驅動,以使得多個雷射光束L同時振盪或交替地振盪。此處,在需要高能雷射光束照射到用於處理的目標S時,可以設定多個雷射光束L的同時驅動,且在需要比同時驅動低的能量的雷射光束照射到用於處理的目標S時,可以設定交替驅動。First, the processing conditions of the target S for processing to be processed by the laser beam L are checked, and the oscillation condition of the laser beam L is set in accordance with the processing condition of the target S for processing (S110). The processing conditions of the target S for processing may include materials and binding energy to the film to be separated. Further, the processing conditions of the target S for processing may include any conditions that may be affected by the energy of the laser beam L when processed by using the laser beam L. In addition, the oscillation conditions of the plurality of laser beams L may be set to be simultaneously driven or alternately driven so that the plurality of laser beams L are simultaneously oscillated or alternately oscillated. Here, when a high-energy laser beam is required to be irradiated to the target S for processing, a plurality of laser beams L can be simultaneously driven, and a laser beam that is required to drive lower energy at the same time is irradiated to the processing for processing. When the target S is set, alternate driving can be set.

在根據用於處理的目標S的處理條件而設定雷射光束振盪條件時,雷射光束L根據所設定的雷射光束振盪條件(下文稱為所設定振盪條件)而振盪(S120)。也就是說,在所設定振盪條件指示多個雷射光束(雷射光束L1與雷射光束L2)的同時驅動振盪模式(如圖3a中所示)時,雷射控制部件110將振盪信號傳遞到每一雷射產生部件130,以使得雷射產生部件130使雷射光束L1與雷射光束L2同時振盪。或者,在所設定振盪條件指示多個雷射光束(雷射光束L1與雷射光束L2)的交替驅動振盪模式(如圖3b中所示)時,雷射控制部件110將振盪信號傳遞到每一雷射產生部件130,以使得雷射產生部件130使雷射光束L1與雷射光束L2在不同時間振盪。When the laser beam oscillation condition is set in accordance with the processing condition of the target S for processing, the laser beam L oscillates according to the set laser beam oscillation condition (hereinafter referred to as the set oscillation condition) (S120). That is, when the set oscillation condition indicates a plurality of laser beams (the laser beam L1 and the laser beam L2) while driving the oscillation mode (as shown in FIG. 3a), the laser control section 110 transmits the oscillation signal. Each of the laser generating members 130 is caused to cause the laser generating member 130 to oscillate the laser beam L1 and the laser beam L2 at the same time. Alternatively, when the set oscillation condition indicates an alternate drive oscillation mode (as shown in FIG. 3b) of the plurality of laser beams (the laser beam L1 and the laser beam L2), the laser control section 110 transmits the oscillation signal to each A laser generating part 130 is such that the laser generating part 130 oscillates the laser beam L1 and the laser beam L2 at different times.

此處,在用於處理的目標S劃分成包含在雷射光束L的振盪方向上的邊緣的第一區域以及不包含所述邊緣的第二區域且需要以比第二區域的雷射光束能量高的雷射光束能量處理第一區域的情況下,設定多個雷射光束(雷射光束L1以及雷射光束L2)的振盪條件可以包含檢測上面放置用於處理的目標S的工作臺50的位置以及在工作臺50的檢測到的位置為第一區域的開始位置時減小工作臺50的移動速度,同時使多個雷射光束(雷射光束L1與雷射光束L2)同時地驅動。Here, the target S for processing is divided into a first region including an edge in the oscillation direction of the laser beam L and a second region not including the edge and requires laser beam energy in comparison with the second region. In the case where the high laser beam energy processes the first region, the oscillation condition of setting the plurality of laser beams (the laser beam L1 and the laser beam L2) may include detecting the table 50 on which the target S for processing is placed. The position and the moving position of the table 50 are reduced when the detected position of the table 50 is the start position of the first area, while the plurality of laser beams (the laser beam L1 and the laser beam L2) are simultaneously driven.

此外,在工作臺50的檢測到的位置為第二區域的開始位置時,可以增大工作臺50的移動速度,同時交替地驅動多個雷射光束(雷射光束L1與雷射光束L2),以進行雷射光束L的照射。Further, when the detected position of the table 50 is the start position of the second region, the moving speed of the table 50 can be increased while simultaneously driving a plurality of laser beams (the laser beam L1 and the laser beam L2) To irradiate the laser beam L.

在雷射光束L回應於雷射控制部件110的振盪信號而振盪時,檢測振盪的雷射光束L(S130)。此處,可以通過使用提供到檢測部件410的檢測器來測量雷射光束L的振盪頻率以及脈衝資料而檢測雷射光束L。When the laser beam L oscillates in response to the oscillation signal of the laser control section 110, the oscillated laser beam L is detected (S130). Here, the laser beam L can be detected by measuring the oscillation frequency of the laser beam L and the pulse data using the detector supplied to the detecting part 410.

如上文所描述,可以通過檢測雷射光束L而確定雷射光束L的振盪狀態。通過檢測雷射光束L而確定雷射光束L的振盪狀態包含比較檢測到的雷射光束資料與所設定振盪條件的資料(S140),以及在檢測到的雷射光束資料的值不同於所設定振盪條件的資料時,確定需要校正雷射產生部件130。As described above, the oscillation state of the laser beam L can be determined by detecting the laser beam L. Determining the oscillation state of the laser beam L by detecting the laser beam L includes comparing the detected laser beam data with the data of the set oscillation condition (S140), and the value of the detected laser beam data is different from the set value. When the data of the condition is oscillated, it is determined that the laser generating part 130 needs to be corrected.

也就是說,確定檢測到的雷射光束資料是否匹配所設定振盪條件的資料(S150),且在檢測到的雷射光束資料等於所設定振盪條件的資料時,確定雷射光束L的振盪狀態令人滿意(S160)。然而,在檢測到的雷射光束資料不等於所設定振盪條件的資料時,確定需要校正雷射光束L的振盪狀態(S200)。That is, it is determined whether the detected laser beam data matches the data of the set oscillation condition (S150), and when the detected laser beam data is equal to the data of the set oscillation condition, the oscillation state of the laser beam L is determined. Satisfactory (S160). However, when the detected laser beam data is not equal to the data of the set oscillation condition, it is determined that the oscillation state of the laser beam L needs to be corrected (S200).

如上文所描述,根據用於處理的目標S的處理條件設定雷射振盪條件(S110)、根據所設定振盪條件使雷射光束L振盪(S120)、檢測振盪的雷射光束L(S130)以及比較檢測到的雷射光束資料與所設定振盪條件的資料(S140,S150)包含於觀測雷射振盪狀態(S100)中。As described above, the laser oscillation condition is set according to the processing condition of the target S for processing (S110), the laser beam L is oscillated according to the set oscillation condition (S120), the oscillated laser beam L is detected (S130), and The data of the detected laser beam data and the set oscillation condition (S140, S150) are included in the observed laser oscillation state (S100).

在觀測到雷射振盪狀態(S100)之後,在確定需要校正用於產生雷射光束L的雷射產生部件130(S200)時,控制部件470檢查雷射光束L的振盪模式(S210),且應用根據振盪模式調整用於處理的目標S的處理速度或雷射光束L的能量的方法。After the laser oscillation state is observed (S100), when it is determined that the laser generating part 130 for generating the laser beam L needs to be corrected (S200), the control section 470 checks the oscillation mode of the laser beam L (S210), and A method of adjusting the processing speed of the target S for processing or the energy of the laser beam L according to the oscillation mode is applied.

在確定需要校正雷射產生部件130(S200)且雷射光束L的振盪模式為同時驅動的情況下,在所述確定之後執行停止在多個雷射光束(雷射光束L1與雷射光束L2)之間需要校正的雷射光束L的振盪(S220B),且在校正振盪停止雷射光束L期間增大除振盪停止雷射光束L以外的雷射光束的能量(S230B)。In the case where it is determined that the laser generating section 130 needs to be corrected (S200) and the oscillation mode of the laser beam L is simultaneously driven, the stop of the plurality of laser beams (the laser beam L1 and the laser beam L2) is performed after the determination. The oscillation of the laser beam L to be corrected is required between (S220B), and the energy of the laser beam other than the oscillation stop laser beam L is increased during the correction of the oscillation stop laser beam L (S230B).

也就是說,停止在多個雷射光束(雷射光束L1與雷射光束L2)之間需要校正的雷射光束L的振盪(S220B),且控制部件470將控制信號傳遞到雷射控制部件110,以使得不需要校正的雷射光束L以較高能量振盪,以便補償應由需要校正的雷射光束L遞送到用於處理的目標S的雷射光束能量。That is, the oscillation of the laser beam L that needs correction between the plurality of laser beams (the laser beam L1 and the laser beam L2) is stopped (S220B), and the control unit 470 transmits the control signal to the laser control unit. 110, such that the laser beam L that does not require correction oscillates at a higher energy in order to compensate for the laser beam energy that should be delivered by the laser beam L that needs to be corrected to the target S for processing.

相反,在確定雷射產生部件130需要校正(S200)且雷射光束L的振盪模式為交替驅動的情況下,在所述確定之後執行停止在多個雷射光束(雷射光束L1與雷射光束L2)之間需要校正的雷射光束L的振盪(S220A),且在校正振盪停止雷射光束L期間減小用於處理的目標S的處理速度(S230A)。此處,用於處理的目標S的處理速度可以設定為通過以下方程式1計算的值。In contrast, in the case where it is determined that the laser generating section 130 requires correction (S200) and the oscillation mode of the laser beam L is alternately driven, the stop of the plurality of laser beams (the laser beam L1 and the laser are performed after the determination) The oscillation of the corrected laser beam L is required between the light beams L2) (S220A), and the processing speed of the target S for processing is reduced during the correction of the oscillation stop laser beam L (S230A). Here, the processing speed of the target S for processing can be set to a value calculated by the following Equation 1.

[方程式1][Equation 1]

V = V0(n-x)/nV = V0(n-x)/n

(其中V表示用於處理的目標的所計算的處理速度,V0表示用於處理的目標的當前處理速度,n表示所使用的雷射產生部件的數目,x表示需要校正的雷射產生部件的數目)(where V represents the calculated processing speed of the target for processing, V0 represents the current processing speed of the target for processing, n represents the number of laser generating components used, and x represents the laser generating component that needs to be corrected number)

在完成雷射產生部件130的校正,且因此需要校正的雷射產生部件被歸一化(S240)時,啟動經校正雷射產生部件130的操作,以啟動需要校正的雷射光束L的振盪(S250)。此外,在校正期間調整的雷射光束能量或用於處理的目標S的處理速度可以在校正之前恢復為先前值(S260A,S260B),以完成雷射光束L的照射。Upon completion of the correction of the laser generating part 130, and thus the laser generating part requiring correction is normalized (S240), the operation of the corrected laser generating part 130 is initiated to initiate oscillation of the laser beam L to be corrected. (S250). Further, the laser beam energy adjusted during the correction or the processing speed of the target S for processing may be restored to the previous value (S260A, S260B) before the correction to complete the irradiation of the laser beam L.

同時,根據另一實施例的雷射處理方法為用於根據基板的位置應用不同處理條件的方法,其包含:檢測上面放置用於處理的目標S的工作臺50的位置;以及根據工作臺50的檢測到的位置而控制多個雷射光束(雷射光束L1和雷射光束L2)的振盪條件以及用於處理的目標S的處理速度。Meanwhile, the laser processing method according to another embodiment is a method for applying different processing conditions according to the position of the substrate, including: detecting a position of the stage 50 on which the target S for processing is placed; and according to the work table 50 The detected position controls the oscillation conditions of the plurality of laser beams (the laser beam L1 and the laser beam L2) and the processing speed of the target S for processing.

在控制多個雷射光束(雷射光束L1和雷射光束L2)的振盪條件以及用於處理的目標S的處理速度期間,在工作臺50的檢測到的位置對應於用於處理的目標S的邊緣時,多個雷射光束(雷射光束L1與雷射光束L2)可以同時驅動,且可以減小用於處理的目標S的處理速度。During the control of the oscillation conditions of the plurality of laser beams (the laser beam L1 and the laser beam L2) and the processing speed of the target S for processing, the detected position at the table 50 corresponds to the target S for processing. At the edge of the plurality of laser beams (the laser beam L1 and the laser beam L2) can be simultaneously driven, and the processing speed of the target S for processing can be reduced.

然而,在控制多個雷射光束(雷射光束L1和雷射光束L2)的振盪條件以及用於處理的目標S的處理速度期間,在工作臺50的檢測到的位置偏離用於處理的目標S的邊緣時,多個雷射光束(雷射光束L1與雷射光束L2)可以交替地驅動,且可以增大用於處理的目標S的處理速度。However, during the control of the oscillation conditions of the plurality of laser beams (the laser beam L1 and the laser beam L2) and the processing speed of the target S for processing, the detected position at the table 50 deviates from the target for processing. At the edge of S, a plurality of laser beams (laser beam L1 and laser beam L2) can be alternately driven, and the processing speed of the target S for processing can be increased.

也就是說,在啟動雷射光束L的照射(S410)時,工作臺50開始以第一速度移動(S420)。此處,參考圖8,工作臺50的位置可以劃分成三個區段,也就是說,區段A、區段B以及區段C,其中在區段A中,用於處理的目標S不存在於工作臺50上。區段B表示用於處理的目標S存在於工作臺50上的區段,且包含用於處理的目標S在工作臺50的移動方向上的邊緣。區段C表示用於處理的目標S的不包含邊緣的區域存在於工作臺50上的區段。此處,區段B包含玻璃與用於處理的目標S的薄膜之間的結合強度高於其它區域的結合強度的接合區域。That is, when the irradiation of the laser beam L is started (S410), the stage 50 starts moving at the first speed (S420). Here, referring to FIG. 8, the position of the workbench 50 can be divided into three sections, that is, section A, section B, and section C, wherein in section A, the target S for processing is not It exists on the work table 50. The section B indicates a section in which the target S for processing exists on the stage 50, and includes an edge of the target S for processing in the moving direction of the stage 50. Section C represents a section of the target S for processing that does not include an edge, which exists on the workbench 50. Here, the segment B contains a bonding region where the bonding strength between the glass and the film of the target S for processing is higher than that of the other regions.

在位置檢測部件510通過檢測工作臺50的位置而認識到工作臺50進入用於處理的目標S的接合區域(S430)時,調整部件530將用於將多個雷射光束(雷射光束L1與雷射光束L2)的振盪模式改變為同時驅動振盪模式的信號傳遞到雷射控制部件110,以將能量比當前雷射光束L的能量高的雷射光束L照射到接合區域,並且還將用於緩慢移動工作臺50的信號傳遞到運動控制部件550,以使得雷射光束L充分地照射到接合區域。因此,雷射控制部件110可以通過控制多個雷射光束(雷射光束L1與雷射光束L2)以使得多個雷射光束(雷射光束L1與雷射光束L2)以相同振盪頻率和相同脈衝同時振盪而增大照射到用於處理的目標S的雷射光束L的能量。此外,運動控制部件550可以通過減緩工作臺50的移動而允許雷射光束L充分地照射到用於處理的目標S(S440)。When the position detecting section 510 recognizes that the table 50 enters the joint area of the target S for processing by detecting the position of the stage 50 (S430), the adjusting part 530 is used to apply a plurality of laser beams (laser beam L1) A signal that changes to an oscillation mode of the laser beam L2) to simultaneously drive the oscillation mode is transmitted to the laser control section 110 to irradiate the laser beam L having a higher energy than the energy of the current laser beam L to the junction area, and The signal for slowly moving the stage 50 is transmitted to the motion control section 550 so that the laser beam L is sufficiently irradiated to the joint area. Therefore, the laser control section 110 can control a plurality of laser beams (the laser beam L1 and the laser beam L2) such that the plurality of laser beams (the laser beam L1 and the laser beam L2) have the same oscillation frequency and the same The pulses simultaneously oscillate to increase the energy of the laser beam L that is irradiated to the target S for processing. Further, the motion control section 550 can allow the laser beam L to be sufficiently irradiated to the target S for processing by slowing the movement of the table 50 (S440).

同時,在位置檢測部件510通過檢測工作臺50的位置而認識到工作臺50退出用於處理的目標S的接合區域(S450)時,調整部件530將用於將多個雷射光束(雷射光束L1與雷射光束L2)的振盪模式改變為交替驅動振盪模式的信號傳遞到雷射控制部件110,以將能量比當前雷射光束L的能量低的雷射光束L照射到接合區域,且增大工作臺50的移動速度(S460)。Meanwhile, when the position detecting section 510 recognizes that the table 50 exits the joint area of the target S for processing by detecting the position of the table 50 (S450), the adjusting section 530 is used to apply a plurality of laser beams (laser) A signal in which the oscillation mode of the light beam L1 and the laser beam L2) is changed to alternately drive the oscillation mode is transmitted to the laser control section 110 to irradiate the laser beam L having a lower energy than the energy of the current laser beam L to the junction region, and The moving speed of the table 50 is increased (S460).

也就是說,可互換地使用雷射光束L的振盪模式以通過增大對於用於處理的目標S的邊緣部分的雷射光束L的照射密度而容易地移除接合且快速進行對於除邊緣部分以外的部分的處理。That is, the oscillation mode of the laser beam L is used interchangeably to easily remove the bonding by increasing the irradiation density of the laser beam L for the edge portion of the target S for processing and to quickly perform the de-edge portion Processing of the other parts.

根據實施例,可以在用於處理的目標的雷射處理過程期間容易地檢測且控制多個雷射源的振盪狀態。也就是說,可以通過比較振盪雷射的檢測到的資料與根據用於處理的目標的處理條件而設定的雷射振盪條件資料來確定雷射振盪狀態是否異常。此外,可以容易地控制多個雷射中的每一個的振盪,且因此可以根據用於處理的目標的處理區域以及雷射產生部件是否異常而容易地可互換地使用使多個雷射同時振盪的方法與使多個雷射交替地振盪的方法。According to an embodiment, the oscillation states of the plurality of laser sources can be easily detected and controlled during the laser processing process of the target for processing. That is to say, whether or not the laser oscillation state is abnormal can be determined by comparing the detected data of the oscillating laser with the laser oscillation condition data set according to the processing condition of the target for processing. Further, the oscillation of each of the plurality of lasers can be easily controlled, and thus the plurality of lasers can be simultaneously oscillated easily according to the processing region of the target for processing and whether the laser generating member is abnormal or not. The method is a method of oscillating a plurality of lasers alternately.

因此,可以立即檢測到且校正雷射振盪中的問題,且可以視需要改變用於多個雷射的振盪方法,且因此可以增大雷射處理過程的生產率。Therefore, the problem in the laser oscillation can be detected and corrected immediately, and the oscillation method for the plurality of lasers can be changed as needed, and thus the productivity of the laser processing process can be increased.

另外,雷射產生部件的使用時間可能會減小,因為視需要選擇性地使用多個雷射,且因此可以防止增大雷射產生部件的維護次數。In addition, the use time of the laser generating member may be reduced because a plurality of lasers are selectively used as needed, and thus it is possible to prevent an increase in the number of maintenance of the laser generating member.

雖然已參考特定實施例描述雷射處理設備以及使用所述雷射處理設備的雷射處理方法,但它們並不限於此。因此,所屬領域的技術人員將容易地理解,可對其進行各種修改和改變而不脫離由所附權利要求書限定的本發明的精神和範圍。Although the laser processing apparatus and the laser processing method using the laser processing apparatus have been described with reference to specific embodiments, they are not limited thereto. Accordingly, it will be readily understood by those skilled in the art that

1‧‧‧雷射處理設備
50‧‧‧工作臺
100‧‧‧雷射產生單元
110‧‧‧雷射控制部件
130、130a、130b‧‧‧雷射產生部件
150、150a、150b‧‧‧光閥部件
300‧‧‧雷射處理單元
310‧‧‧反射鏡
350‧‧‧射束切割器
400‧‧‧雷射觀測單元
410‧‧‧檢測部件
412‧‧‧第一檢測器
414‧‧‧第二檢測器
416‧‧‧第三檢測器
430‧‧‧轉換部件
450‧‧‧確定部件
470‧‧‧控制部件
500‧‧‧調整單元
510‧‧‧位置檢測部件
530‧‧‧調整部件
550‧‧‧運動控制部件
A、B、C‧‧‧區段
L、L1、L2‧‧‧雷射光束
S‧‧‧用於處理的目標
S100~S300、S410~S470‧‧‧步驟
1‧‧ ‧ laser processing equipment
50‧‧‧Workbench
100‧‧‧Laser generating unit
110‧‧‧Road control unit
130, 130a, 130b‧‧‧ laser generating parts
150, 150a, 150b‧‧‧ light valve parts
300‧‧‧Laser processing unit
310‧‧‧Mirror
350‧‧‧beam cutter
400‧‧‧Surface Observation Unit
410‧‧‧Detection parts
412‧‧‧First detector
414‧‧‧Second detector
416‧‧‧ third detector
430‧‧‧ conversion parts
450‧‧‧Determining parts
470‧‧‧Control components
500‧‧‧Adjustment unit
510‧‧‧ position detection unit
530‧‧‧Adjustment parts
550‧‧‧Motion control unit
Sections A, B, C‧‧‧
L, L1, L2‧‧‧ laser beam
S‧‧‧ Targets for processing
S100~S300, S410~S470‧‧‧ steps

可以從結合附圖所作的以下描述中更詳細地理解示例性實施例,其中: 圖1為說明根據一實施例的雷射處理設備的圖。 圖2為說明圖1的雷射產生單元以及雷射觀測單元的詳細配置的圖。 圖3a及圖3b為說明根據一實施例的雷射的振盪模式的圖。 圖4為說明根據一實施例的包含調整單元的雷射處理設備的圖。 圖5為說明根據一實施例的雷射處理方法的流程圖。 圖6為說明根據一實施例的基於是否校正雷射產生部件的雷射處理方法的流程圖。 圖7為說明根據一實施例的基於用於處理的目標的處理條件的雷射處理方法的流程圖。 圖8為說明圖7的實例的圖。The exemplary embodiments may be understood in more detail in the following description in conjunction with the drawings, in which: FIG. 1 is a diagram illustrating a laser processing apparatus in accordance with an embodiment. FIG. 2 is a view for explaining a detailed configuration of the laser generating unit and the laser observation unit of FIG. 1. FIG. 3a and 3b are diagrams illustrating an oscillation mode of a laser according to an embodiment. 4 is a diagram illustrating a laser processing apparatus including an adjustment unit, in accordance with an embodiment. FIG. 5 is a flow chart illustrating a laser processing method in accordance with an embodiment. FIG. 6 is a flow chart illustrating a laser processing method based on whether to correct a laser generating component, according to an embodiment. 7 is a flow chart illustrating a laser processing method based on processing conditions of a target for processing, in accordance with an embodiment. FIG. 8 is a diagram illustrating an example of FIG. 7.

1‧‧‧雷射處理設備 1‧‧ ‧ laser processing equipment

50‧‧‧工作臺 50‧‧‧Workbench

100‧‧‧雷射產生單元 100‧‧‧Laser generating unit

300‧‧‧雷射處理單元 300‧‧‧Laser processing unit

310‧‧‧反射鏡 310‧‧‧Mirror

350‧‧‧射束切割器 350‧‧‧beam cutter

400‧‧‧雷射觀測單元 400‧‧‧Surface Observation Unit

L‧‧‧雷射光束 L‧‧‧Laser beam

S‧‧‧用於處理的目標 S‧‧‧ Targets for processing

Claims (18)

一種雷射處理設備,包括: 雷射產生單元,其經配置以產生照射到用於處理的目標的雷射光束的振盪信號,且使多個雷射光束振盪; 雷射處理單元,其安置於由所述雷射產生單元振盪的所述雷射光束的傳播路徑上,且經配置以處理所述雷射光束;以及 雷射觀測單元,其在所述傳播路徑上連接到所述雷射產生單元和所述雷射處理單元中的至少一個以檢測所述雷射光束的振盪且通過處理以及分析檢測到的資料而確定所述雷射產生單元的操作狀態。A laser processing apparatus comprising: a laser generating unit configured to generate an oscillating signal of a laser beam illuminating a target for processing, and oscillating a plurality of laser beams; a laser processing unit disposed on a propagation path of the laser beam oscillated by the laser generating unit and configured to process the laser beam; and a laser observation unit coupled to the laser on the propagation path At least one of the unit and the laser processing unit determines an operational state of the laser generating unit by detecting an oscillation of the laser beam and by processing and analyzing the detected data. 如申請專利範圍第1項所述的雷射處理設備,其中所述雷射觀測單元包括: 檢測部件,其連接到所述雷射產生單元和所述雷射處理單元中的至少一個,且經配置以測量所述雷射光束的振盪頻率以及脈衝資料; 轉換部件,其經配置以將從所述檢測部件接收的所述雷射光束的類比資料轉換成數位資料;以及 確定部件,其經配置以通過分析由所述轉換部件轉換的數位信號而確定所述振盪信號是否異常。The laser processing apparatus of claim 1, wherein the laser observation unit comprises: a detecting component connected to at least one of the laser generating unit and the laser processing unit, and Configuring to measure an oscillating frequency of the laser beam and pulse data; a conversion component configured to convert analog data of the laser beam received from the detecting component into digital data; and a determining component configured Whether the oscillation signal is abnormal is determined by analyzing a digital signal converted by the conversion section. 如申請專利範圍第2項所述的雷射處理設備,其中所述雷射觀測單元包括控制部件,所述控制部件經配置以根據確定所述振盪信號是否異常的結果而控制所述振盪信號,所述結果已從所述確定部件接收。The laser processing apparatus of claim 2, wherein the laser observation unit includes a control unit configured to control the oscillation signal according to a result of determining whether the oscillation signal is abnormal, The result has been received from the determining component. 如申請專利範圍第2項所述的雷射處理設備,其中所述檢測部件設置於以下位置中的至少一個:在所述雷射光束的傳播方向上位於所述雷射產生單元前部的位置、用於將所述雷射光束朝向所述用於處理的目標反射的位置,和用於控制所述雷射光束的長度的位置。A laser processing apparatus according to claim 2, wherein the detecting means is disposed at at least one of a position at a front portion of the laser generating unit in a propagation direction of the laser beam a position for reflecting the laser beam toward the target for processing, and a position for controlling the length of the laser beam. 如申請專利範圍第1項所述的雷射處理設備,其中所述雷射產生單元包括: 雷射控制部件,其經配置以產生所述多個雷射光束中的每一個的所述振盪信號;以及 雷射產生部件,其連接到所述雷射控制部件以根據所產生的振盪信號而使每一雷射光束振盪。The laser processing apparatus of claim 1, wherein the laser generating unit comprises: a laser control component configured to generate the oscillating signal of each of the plurality of laser beams And a laser generating component coupled to the laser control component to oscillate each of the laser beams in accordance with the generated oscillating signal. 如申請專利範圍第1項所述的雷射處理設備,更包括調整單元,所述調整單元經配置以根據上面放置所述用於處理的目標的工作臺的位置而針對所述用於處理的目標的每一處理區域調整所述雷射光束的振盪模式以及所述工作臺的操作狀態。The laser processing apparatus of claim 1, further comprising an adjustment unit configured to be for the processing according to a position of the work table on which the target for processing is placed Each processing region of the target adjusts an oscillation mode of the laser beam and an operational state of the table. 如申請專利範圍第6項所述的雷射處理設備,其中所述調整單元包括: 位置檢測部件,其經配置以測量所述工作臺的所述位置; 調整部件,其連接到所述位置檢測部件以及所述雷射產生單元以根據所述工作臺的測量位置而調整所述雷射光束的所述振盪模式以及所述工作臺的移動速度;以及 運動控制部件,其連接到所述調整部件以根據所述雷射光束的經調整振盪模式而控制所述工作臺的所述移動速度。The laser processing apparatus of claim 6, wherein the adjustment unit comprises: a position detecting component configured to measure the position of the table; and an adjustment component connected to the position detection a component and the laser generating unit to adjust the oscillation mode of the laser beam and a moving speed of the table according to a measurement position of the table; and a motion control component connected to the adjustment component The moving speed of the table is controlled in accordance with an adjusted oscillation mode of the laser beam. 一種雷射處理方法,包括: 根據用於處理的目標的處理條件而設定用於控制多個雷射光束的振蕩的多個振盪條件; 通過將所述所設定振盪條件傳遞到用於使所述多個雷射光束振蕩的雷射產生部件而使所述多個雷射光束振盪; 檢測振蕩的所述多個雷射光束;以及 通過使用檢測到的雷射光束資料而確定所述雷射產生部件的雷射光束振盪狀態。A laser processing method, comprising: setting a plurality of oscillation conditions for controlling oscillation of a plurality of laser beams according to processing conditions of a target for processing; transmitting the set oscillation condition to a plurality of laser beam oscillating laser generating components to oscillate the plurality of laser beams; detecting the oscillated plurality of laser beams; and determining the laser generation by using the detected laser beam data The laser beam oscillating state of the component. 如申請專利範圍第8項所述的雷射處理方法,其中所述設定所述多個振盪條件包括設定振盪模式,以使得所述多個雷射光束被同時驅動或交替地驅動。The laser processing method of claim 8, wherein the setting the plurality of oscillation conditions comprises setting an oscillation mode such that the plurality of laser beams are simultaneously driven or alternately driven. 如申請專利範圍第9項所述的雷射處理方法,其中所述確定所述雷射光束振盪狀態包括: 比較所述檢測到的雷射光束資料與所述所設定振盪條件的資料;以及 在所述檢測到的雷射光束資料的值不同於所述所設定振盪條件的所述資料時,確定所述雷射產生部件需要校正。The laser processing method of claim 9, wherein the determining the oscillation state of the laser beam comprises: comparing the detected laser beam data with the data of the set oscillation condition; When the value of the detected laser beam data is different from the data of the set oscillation condition, it is determined that the laser generating component requires correction. 如申請專利範圍第10項所述的雷射處理方法,其中在所述檢測所述多個雷射光束期間,獲得所述多個雷射光束的振盪頻率以及脈衝資料。The laser processing method of claim 10, wherein during the detecting the plurality of laser beams, an oscillation frequency of the plurality of laser beams and pulse data are obtained. 如申請專利範圍第10項所述的雷射處理方法,包括: 停止在所述多個雷射光束之間需要校正的雷射光束的振盪;以及 在校正所述振盪停止雷射光束期間減小所述用於處理的目標的處理速度, 在確定所述雷射產生部件需要校正之後,此時所述振盪模式為交替驅動。The laser processing method of claim 10, comprising: stopping oscillation of a laser beam that needs to be corrected between the plurality of laser beams; and reducing during the correction of the oscillation to stop the laser beam The processing speed of the target for processing is determined to be alternately driven after determining that the laser generating component requires correction. 如申請專利範圍第10項所述的雷射處理方法,包括: 停止在所述多個雷射光束之間需要校正的雷射光束的振盪;以及 在校正所述振盪停止雷射光束期間增大除所述振盪停止雷射光束以外的所述雷射光束的能量, 在確定所述雷射產生部件需要校正之後,此時所述振盪模式為同時驅動。The laser processing method of claim 10, comprising: stopping oscillation of a laser beam that needs to be corrected between the plurality of laser beams; and increasing during the correction of the oscillation to stop the laser beam The energy of the laser beam other than the oscillating stop laser beam is determined to be simultaneously driven after determining that the laser generating component requires correction. 如申請專利範圍第8項所述的雷射處理方法,包括: 檢測上面放置所述用於處理的目標的工作臺的位置;以及 在所述工作臺的所述檢測到的位置為所述用於處理的目標的第一區域開始的位置時,通過同時驅動所述多個雷射光束而減小所述工作臺的移動速度, 此時,在所述設定所述多個振盪條件期間,所述用於處理的目標劃分成包含在所述多個雷射光束的振盪方向上的邊緣的所述第一區域以及不包含所述邊緣的第二區域,且所述第一區域需要以高於所述第二區域的雷射光束能量的雷射光束能量進行處理。The laser processing method of claim 8, comprising: detecting a position of the work table on which the target for processing is placed; and the detected position at the work station is the use Decreasing the moving speed of the table by simultaneously driving the plurality of laser beams at a position where the first region of the processed target starts, at which time, during the setting of the plurality of oscillation conditions, The object for processing is divided into the first region including edges at the oscillation directions of the plurality of laser beams and the second region not including the edges, and the first region needs to be higher than The laser beam energy of the laser beam energy of the second region is processed. 如申請專利範圍第8項所述的雷射處理方法,包括: 在所述工作臺的所述檢測到的位置為所述用於處理的目標的第二區域開始的位置時,增大所述工作臺的移動速度,同時交替地驅動所述多個雷射光束。The laser processing method of claim 8, comprising: increasing the position when the detected position of the workbench is a position of the second region of the target for processing The moving speed of the table simultaneously drives the plurality of laser beams alternately. 一種雷射處理方法,包括: 檢測上面放置用於處理的目標的工作臺的位置;以及 根據所述工作臺的所述檢測到的位置而控制多個雷射光束的振盪條件以及所述用於處理的目標的處理速度。A laser processing method comprising: detecting a position of a stage on which a target for processing is placed; and controlling an oscillation condition of the plurality of laser beams according to the detected position of the stage and the The processing speed of the processed target. 如申請專利範圍第16所述的雷射處理方法,其中所述控制所述多個雷射光束的所述振盪條件以及所述用於處理的目標的所述處理速度包括在所述工作臺的所述檢測到的位置對應於所述用於處理的目標的邊緣時,同時驅動所述多個雷射光束且減小所述用於處理的目標的所述處理速度。The laser processing method of claim 16, wherein the controlling the oscillation condition of the plurality of laser beams and the processing speed of the target for processing are included in the workbench The detected position corresponds to the edge of the target for processing, simultaneously driving the plurality of laser beams and reducing the processing speed of the target for processing. 如申請專利範圍第16所述的雷射處理方法,其中所述控制所述多個雷射光束的所述振盪條件以及所述用於處理的目標的所述處理速度包括在所述工作臺的所述檢測到的位置偏離所述用於處理的目標的邊緣時,交替地驅動所述多個雷射光束且增大所述用於處理的目標的所述處理速度。The laser processing method of claim 16, wherein the controlling the oscillation condition of the plurality of laser beams and the processing speed of the target for processing are included in the workbench The detected position is offset from the edge of the target for processing, alternately driving the plurality of laser beams and increasing the processing speed of the target for processing.
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