TW201737399A - Container storage facility - Google Patents

Container storage facility Download PDF

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Publication number
TW201737399A
TW201737399A TW106108142A TW106108142A TW201737399A TW 201737399 A TW201737399 A TW 201737399A TW 106108142 A TW106108142 A TW 106108142A TW 106108142 A TW106108142 A TW 106108142A TW 201737399 A TW201737399 A TW 201737399A
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Taiwan
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storage
container
wall portion
floor
supply
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TW106108142A
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Chinese (zh)
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TWI718270B (en
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河村真輔
吉本忠浩
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大福股份有限公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
    • B65G1/02—Storage devices
    • B65G1/04—Storage devices mechanical
    • B65G1/0407—Storage devices mechanical using stacker cranes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67379—Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67386—Closed carriers characterised by the construction of the closed carrier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Flow Control (AREA)

Abstract

A gas supplying device has a plurality of connectors each of which is configured to be connected to a container stored in the corresponding one of supplying storage sections, supply lines configured to divide and supply gas to the plurality of connectors, and a mass flow controller configured to control a flow rate of gas that flows through one of the supply lines. The supply lines include first supply lines each of which is installed to a corresponding supplying storage sections, a second supply line installed upstream of the first supply lines, and a branching supply line for dividing gas supplied from the second supply line into the first supply lines. The mass flow controller is installed in the second supply line and in an installation area.

Description

容器收納設備Container storage equipment

發明領域 本發明是關於一種容器收納設備，其具備在收納區域設置有複數個以收納容器之收納部，及將前述收納區域中的前述複數個收納部的一部分或全部設為供給收納部，且對收納於前述供給收納部的前述容器之內部供給氣體的氣體供給裝置，前述氣體供給裝置具備有複數個相對於複數個前述供給收納部的每一個來設置且被連接至收納在前述供給收納部的前述容器之連接部、將從設置在前述收納區域之外部的供給源所供給的氣體分歧供給至前述複數個連接部之配管、及控制於前述配管內流通之氣體的流量的質量流控制器。The present invention relates to a container storage device including a plurality of storage portions in which a plurality of storage portions are provided in a storage area, and a part or all of the plurality of storage portions in the storage region are provided as supply and storage portions, and In the gas supply device that supplies the gas to the inside of the container that is stored in the supply and storage unit, the gas supply device includes a plurality of the supply devices, and is connected to each of the plurality of supply and storage units, and is connected to the supply and storage unit. a connection portion of the container, a pipe for supplying a gas supplied from a supply source provided outside the storage region, a pipe to the plurality of connection portions, and a mass flow controller for controlling a flow rate of a gas flowing through the pipe .

發明背景 所述之容器收納設備的以往例已揭示在日本專利特開2013-133193號公報(專利文獻1)中。在專利文獻1的容器收納設備中，是由屬於1個區劃區的複數個供給收納部來構成供給收納部群組。氣體供給裝置是相對於構成供給收納部群組的2個以上之供給收納部的每一個而具備有2個以上的第1配管。並且，專利文獻1的氣體供給裝置，是使從第2配管供給的氣體藉由分歧配管分歧到2個以上之第1配管，且藉由2個以上的第1配管，對構成供給收納部群組的2個以上之供給收納部的每一個來供給氣體。 並且，在專利文獻1的容器收納設備中，氣體供給裝置中的質量流控制器，是設置在2個以上的第1配管之每一個中的流路上。又，質量流控制器是設置在設置有收納部的收納區域中。具體來說，質量流控制器是設置在以下位置：在收納部中收納有容器的情況下相鄰於該容器的橫向側邊之位置。Background of the Invention A conventional example of the above-described container storage device is disclosed in Japanese Laid-Open Patent Publication No. 2013-133193 (Patent Document 1). In the container storage device of Patent Document 1, the supply storage unit group is constituted by a plurality of supply storage units belonging to one division area. The gas supply device includes two or more first pipes for each of the two or more supply and storage units constituting the supply and storage unit group. In the gas supply device of the first aspect, the gas supplied from the second pipe is branched into two or more first pipes by the branch pipes, and the two or more first pipes are used to form the supply and storage unit group. Each of the two or more supply storage units of the group supplies gas. Further, in the container storage device of Patent Document 1, the mass flow controller in the gas supply device is a flow path provided in each of the two or more first pipes. Further, the mass flow controller is provided in a storage area in which the storage portion is provided. Specifically, the mass flow controller is disposed at a position adjacent to the lateral side of the container when the container is housed in the accommodating portion.

發明概要 課題、用以解決課題之手段 在上述之習知的容器收納設備中，由於是將質量流控制器設置在設置有收納部的收納區域中，因此在質量流控制器的溫度上升的情況下，其溫度上升的影響會有對收納於收納部的容器，特別是收容在容器的收容物造成影響之可能性。 又，第1配管是對應於複數個供給收納部的每一個而設置，且在複數個第1配管的每一個上設置有質量流控制器。因此，質量流控制器的設置數量多，而使氣體供給裝置的製造成本變高。SUMMARY OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION In the above-described conventional container storage device, since the mass flow controller is installed in the storage region in which the storage portion is provided, the temperature of the mass flow controller rises. In the following, the influence of the temperature rise may affect the container housed in the storage portion, particularly the contents stored in the container. Further, the first pipe is provided corresponding to each of the plurality of supply accommodating portions, and a mass flow controller is provided for each of the plurality of first pipes. Therefore, the number of mass flow controllers is set large, and the manufacturing cost of the gas supply device becomes high.

於是，所需求的是使收納區域的容器難以受到質量流控制器的溫度上升之影響，而且可以壓低氣體供給裝置的製造成本之容器收納設備。 用以解決課題之手段Therefore, what is required is a container storage apparatus that can make the container of the storage area difficult to be affected by the temperature rise of the mass flow controller and can reduce the manufacturing cost of the gas supply device. Means to solve the problem

本揭示之容器收納設備的特徵構成在於下述之點：一種容器收納設備，其具備在收納區域設置有複數個以收納容器之收納部、及將前述收納區域中的前述複數個收納部的一部分或全部設為供給收納部，且對收納於前述供給收納部的前述容器之內部供給氣體的氣體供給裝置，前述氣體供給裝置具備有複數個相對於複數個前述供給收納部的每一個而設置且連接至收納在前述供給收納部的前述容器之連接部、將從設置在前述收納區域之外部的供給源所供給的氣體分歧供給至前述複數個連接部之配管、及控制於前述配管內流通之氣體的流量的質量流控制器， 在該容器收納設備中， 前述配管是相對於由前述複數個供給收納部的一部分或全部所構成的供給收納部群組而具備： 2個以上之第1配管，對構成前述供給收納部群組的2個以上之前述供給收納部的每一個而設置； 第2配管，形成單一的流路，該單一的流路是設置在氣體的流通方向上比前述2個以上之第1配管更上游側；及 分歧配管，使從前述第2配管供給的氣體分歧到前述2個以上之第1配管， 前述質量流控制器是設置在前述第2配管中的前述單一的流路上，且設置在被設定於前述收納區域之外部的設置區域中。The container storage device of the present invention is characterized in that the container storage device includes a plurality of storage portions for storing the containers in the storage area, and a part of the plurality of storage portions in the storage area. In the gas supply device that supplies the gas to the inside of the container that is stored in the supply and storage unit, the gas supply device includes a plurality of the gas supply devices that are provided for each of the plurality of supply storage portions. a connection to the connection portion of the container accommodated in the supply and storage unit, a supply of gas supplied from a supply source provided outside the storage area to the plurality of connection portions, and control of circulation in the pipe In the container storage device, the piping is provided in the container storage device with respect to the supply storage unit group including a part or all of the plurality of supply storage units: two or more first pipes Each of the two or more supply and storage units constituting the supply and storage unit group The second pipe is formed as a single flow path which is provided on the upstream side of the two or more first pipes in the flow direction of the gas, and the branch pipe is supplied from the second pipe. The gas is branched into the two or more first pipes, and the mass flow controller is provided in the single flow path of the second pipe, and is provided in an installation area set outside the storage area.

根據此特徵構成，藉由在第2配管上設置質量流控制器，變得可相對於構成供給收納部群組的複數個供給收納部設置1個質量流控制器。因此，可以減少質量流控制器的設置數量，且可以壓低氣體供給裝置的製造成本。又，藉由在位於比第1配管更上游側之第2配管上設置質量流控制器，即可輕易地將質量流控制器設置在遠離收納部的位置。藉由在被設定於具備複數個收納部的收納區域之外部的區域中設置質量流控制器，可以使收容於該收納部的容器難以受到質量流控制器的溫度上升之影響。According to this characteristic configuration, by providing the mass flow controller in the second pipe, it is possible to provide one mass flow controller with respect to the plurality of supply accommodating portions constituting the supply accommodating portion group. Therefore, the number of sets of the mass flow controller can be reduced, and the manufacturing cost of the gas supply device can be depressed. Further, by providing the mass flow controller on the second pipe located on the upstream side of the first pipe, the mass flow controller can be easily disposed at a position away from the accommodating portion. By providing the mass flow controller in a region outside the storage region provided with the plurality of storage portions, it is possible to prevent the container accommodated in the storage portion from being affected by the temperature rise of the mass flow controller.

用以實施發明之形態 [第1實施形態] 以下根據圖式來說明容器收納設備之第1實施形態。 如圖1所示，容器收納設備具備有收納容器W之收納架1、搬送容器W之堆高式起重機2、及氣體供給裝置3。又，容器收納設備中具備有壁體K與搬送輸送帶4，該壁體K將設置有收納架1及堆高式起重機2之收納區域E1的側周圍包覆，該搬送輸送帶4是以貫穿壁體K的狀態設置並搬送容器W。[Embodiment of the Invention] [First Embodiment] A first embodiment of a container storage device will be described below based on the drawings. As shown in FIG. 1 , the container storage device includes a storage rack 1 that houses the container W, a stacker 2 that transports the container W, and a gas supply device 3. Further, the container storage device includes a wall body K and a conveyance belt 4 that covers the side of the storage area E1 in which the storage rack 1 and the stacker 2 are installed, and the conveyance belt 4 is The container W is placed and conveyed through the state of the wall K.

收納架1中具備有可收納容器W的複數個收納部1a。氣體供給裝置3是構成為對收納部1a所收納的容器W之內部，供給作為氣體之清潔乾燥空氣(以下，簡稱為乾燥空氣)。也就是說，藉由氣體供給裝置3而被供給到容器W的內部之氣體，相較於收納部1a中的氣體會成為濕度較低的氣體。 容器W是構成為可收容1片基板。在本實施形態中，是將基板設為光罩，又，將容器W設為收納光罩的容器W。The storage rack 1 is provided with a plurality of storage portions 1a that can accommodate the container W. The gas supply device 3 is configured to supply clean and dry air (hereinafter, simply referred to as dry air) as a gas to the inside of the container W housed in the storage portion 1a. In other words, the gas supplied to the inside of the container W by the gas supply device 3 becomes a gas having a lower humidity than the gas in the storage portion 1a. The container W is configured to accommodate one substrate. In the present embodiment, the substrate is a photomask, and the container W is a container W in which the photomask is housed.

搬送輸送帶4是設置成在位於壁體K的外側之外部地點與位於壁體K的內側之內部地點之間搬送容器W。搬送輸送帶4會設置在較高的位置與較低的位置。在對應於設置在較高的位置之搬送輸送帶4的外部地點上，是使天花板搬送車(圖中未示)進行容器W的裝載卸下。在對應於設置在較低的位置之搬送輸送帶4的外部地點上，是讓作業者進行容器W的裝載卸下。此外，圖中並未顯示設置在較低的位置之搬送輸送帶4。 而且，堆高式起重機2會在對應於搬送輸送帶4的內部地點與收納架1的收納部1a之間搬送容器W。The transport conveyor 4 is provided to transport the container W between an external location located outside the wall K and an internal location located inside the wall K. The conveyor belt 4 is placed at a higher position and a lower position. In a position corresponding to the conveyance belt 4 provided at a higher position, the ceiling transport vehicle (not shown) carries out the loading and unloading of the container W. The operator is allowed to load and unload the container W at an external position corresponding to the conveyance belt 4 provided at a lower position. Further, the conveyance belt 4 disposed at a lower position is not shown in the drawing. Further, the stacker crane 2 transports the container W between the internal position corresponding to the conveyance conveyor 4 and the storage portion 1a of the storage rack 1.

容器收納設備是設置在使空氣(氣體)於內部區域E從天花板側朝向地板側向下方流動之降流式的無塵室內。進一步說明，於收納區域E1的正上方設置有使氣體朝向下方流動的送風風扇5。藉由此送風風扇5的送風作用，以使氣體在收納區域E1及設置區域E2從天花板側朝向地板側向下方流動。再者，送風風扇5相當於涵蓋收納區域E1與設置區域E2使設備內的氣體向下方流動的氣流產生裝置。The container storage device is installed in a downflow type clean room in which air (gas) flows downward from the ceiling side toward the floor side in the inner region E. Further, a blower fan 5 that allows the gas to flow downward is provided directly above the storage area E1. By the air blowing action of the blower fan 5, the gas flows downward from the ceiling side toward the floor side in the storage area E1 and the installation area E2. Further, the blower fan 5 corresponds to an airflow generating device that covers the storage area E1 and the installation area E2 so that the gas in the apparatus flows downward.

無塵室的地板部F，是由下地板部F2以及配設在比下地板部F2更上側的上地板部F1所構成。下地板部F2是沒有通氣孔的地板，在本實施形態中是由無孔狀的混凝土所構成。堆高式起重機2是在這個下地板部F2上行走。上地板部F1是格子地板，且形成有複數個朝上下方向Y貫穿的通氣孔。作業者是在這個上地板部F1上步行。再者，上地板部F1相當於作業地板，且該作業地板是設置在比下天花板部C2(參照圖5)更下方且設置在比下地板部F2更上方，並以可在上下方向Y上使氣體通氣的方式構成。The floor portion F of the clean room is composed of a lower floor portion F2 and an upper floor portion F1 disposed above the lower floor portion F2. The lower floor portion F2 is a floor having no vent holes, and in the present embodiment, it is composed of non-porous concrete. The stacker 2 is walking on this lower floor portion F2. The upper floor portion F1 is a lattice floor, and a plurality of vent holes penetrating in the vertical direction Y are formed. The operator walks on this upper floor portion F1. Further, the upper floor portion F1 corresponds to the work floor, and the work floor is disposed below the lower ceiling portion C2 (see FIG. 5) and above the lower floor portion F2, and is movable in the up and down direction Y. The method of venting the gas is constructed.

以下，從收納架1的長度方向(堆高式起重機2行走的行走方向)來看，將收納架1與堆高式起重機2排列的方向設為前後方向X，且將相對於收納架1而存在有堆高式起重機2的方向設為內側方向X1，並將其相反方向設為外側方向X2來進行說明。再者，前後方向X會成為地板上壁31的厚度方向。又，內側方向X1會成為相對於地板上壁31而存在有收納區域E1的方向之第1方向，且外側方向X2是成為與第1方向為相反方向之第2方向。又，由壁體K包覆的區域以及比上地板部F1更下方的區域為內部區域E。Hereinafter, from the longitudinal direction of the storage rack 1 (the traveling direction in which the stacker 2 travels), the direction in which the storage rack 1 and the stacker 2 are arranged is referred to as the front-rear direction X, and will be relative to the storage rack 1 The direction in which the stacker 2 is present is the inner direction X1, and the opposite direction is the outer direction X2. Further, the front-rear direction X becomes the thickness direction of the floor upper wall 31. Further, the inner direction X1 is the first direction in which the storage area E1 exists in the floor upper wall 31, and the outer direction X2 is the second direction opposite to the first direction. Moreover, the area covered by the wall K and the area below the upper floor part F1 are the internal area E.

壁體K會包覆收納區域E1。藉此，限制使空氣從流入口33以外的部分流通到收納區域E1之情形。壁體K具備有地板上壁31與地板下壁32。地板上壁31是位在比上地板部F1的上表面更上方且比天花板C更下方的位置。地板下壁32是位在比上地板部F1的上表面更下方且比下地板部F2更上方的位置。 如圖1所示，地板下壁32是形成為具備有4面地板下壁部32a的四角筒狀。於地板下壁部32a上形成有使空氣從地板下壁部32a的內側方向X1流出到外側方向X2的流出口(圖中未示)。The wall K covers the storage area E1. Thereby, the case where air is circulated from the part other than the inflow port 33 to the storage area E1 is restricted. The wall body K is provided with a floor upper wall 31 and a floor lower wall 32. The floor upper wall 31 is located above the upper surface of the upper floor portion F1 and below the ceiling C. The floor lower wall 32 is located below the upper surface of the upper floor portion F1 and above the lower floor portion F2. As shown in Fig. 1, the floor lower wall 32 is formed in a rectangular tubular shape having four floor lower wall portions 32a. An outlet (not shown) for allowing air to flow from the inner side direction X1 of the floor lower wall portion 32a to the outer direction X2 is formed in the floor lower wall portion 32a.

地板上壁31也是形成為具備4面地板上壁部31a的四角筒狀。地板上壁31除了地板上壁部31a之外，還具備有形成該地板上壁31的上表面之上壁部31b。地板上壁部31a是以限制空氣從流入口33以外的部分流通到收納區域E1之狀態被設置。再者，在圖1中所顯示的是，將前後方向X的其中一個方向堵塞之地板上壁部31a、將前後方向X的另一個方向堵塞之地板上壁部31a、以及形成上表面之上壁部31b。The floor upper wall 31 is also formed in a rectangular tubular shape having four floor upper wall portions 31a. The floor upper wall 31 is provided with an upper surface upper wall portion 31b forming the floor upper wall 31 in addition to the floor upper wall portion 31a. The floor upper wall portion 31a is provided in a state in which air is restricted from flowing from a portion other than the inflow port 33 to the storage region E1. Further, as shown in Fig. 1, the floor upper wall portion 31a which blocks one of the front-rear directions X, the floor upper wall portion 31a which blocks the other direction of the front-rear direction X, and the upper surface are formed. Wall portion 31b.

地板上壁31的上端形成有使空氣從地板上壁31的上方流入至收納區域E1的流入口33。進一步說明，於地板上壁31的上端具備有形成地板上壁31的上表面之上壁部31b，且在此上壁部31b的一部分上形成有在上下方向Y上容許空氣的流通的流入口33。送風風扇5是在上壁部31b設置成堵塞該流入口33。再者，地板上壁31相當於相對於下地板部F2在上方隔著間隔的位置上以沿著上下方向Y的形態而被設置之主壁部。 並且，藉由送風風扇5的送風作用而從形成在壁體K的上端之流入口33流入到壁體K的內部的空氣，會形成為在壁體K內的收納區域E1從上方流動到下方後，從形成在壁體K的地板下壁部32a之流出口流出到壁體K的外部。An inlet 33 for allowing air to flow from above the floor upper wall 31 to the storage area E1 is formed at the upper end of the floor upper wall 31. Further, the upper end of the floor upper wall 31 is provided with an upper surface upper wall portion 31b forming the floor upper wall 31, and a portion of the upper wall portion 31b is formed with an inlet for allowing air to flow in the vertical direction Y. 33. The blower fan 5 is provided in the upper wall portion 31b to block the inflow port 33. Further, the floor upper wall 31 corresponds to a main wall portion that is provided along the vertical direction Y at a position spaced apart from the lower floor portion F2. In addition, the air that flows into the inside of the wall K from the inlet 33 formed at the upper end of the wall K by the air blowing action of the blower fan 5 is formed so that the storage area E1 in the wall K flows from above to below. Thereafter, it flows out from the outlet of the floor lower wall portion 32a formed in the wall K to the outside of the wall body K.

[容器] 如圖4所示，於容器W的底部設有供氣部6與排氣部7。供氣部6是用於將從氣體供給裝置3的連接部18吐出的乾燥空氣供給至容器W的內部之部分。於供氣部6具備有供氣用開關閥(圖中未示)。排氣部7是用於將容器W的內部之氣體排氣到容器W的外部之部分。於排氣部7具備有排氣用開關閥(圖中未示)。[Container] As shown in FIG. 4, the air supply portion 6 and the exhaust portion 7 are provided at the bottom of the container W. The air supply unit 6 is a portion for supplying dry air discharged from the connection portion 18 of the gas supply device 3 to the inside of the container W. The air supply unit 6 is provided with an air supply on/off valve (not shown). The exhaust portion 7 is a portion for exhausting the gas inside the container W to the outside of the container W. The exhaust unit 7 is provided with an exhaust valve (not shown).

供氣部6的供氣用開關閥是藉由彈簧等賦與勢能體而被賦與勢能成關閉狀態。在對供氣部6連接有氣體供給裝置3的連接部18之狀態下，當從該連接部18噴出乾燥空氣時，會藉由該噴出的乾燥空氣之壓力對供給用開關閥進行開啟操作，而將乾燥空氣從供氣部6供給到容器W的內部。又，排氣部7的排氣用開關閥是藉由彈簧等賦與勢能體而被賦與勢能成關閉狀態。藉由氣體供給裝置3的乾燥空氣之供給而使容器W內部之壓力升高時，會藉由該壓力對排氣用開關閥進行開啟操作，而將容器W的內部之氣體從排氣部7進行排氣。The air supply switching valve of the air supply unit 6 is biased with a potential energy by a spring or the like to be in a closed state. When the connection portion 18 of the gas supply device 3 is connected to the air supply portion 6, when the dry air is discharged from the connection portion 18, the supply opening and closing valve is opened by the pressure of the discharged dry air. Dry air is supplied from the air supply unit 6 to the inside of the container W. Further, the exhaust switching valve of the exhaust unit 7 is biased with a potential energy by a spring or the like to be in a closed state. When the pressure inside the vessel W is increased by the supply of the dry air from the gas supply device 3, the exhaust gas switching valve is opened by the pressure, and the gas inside the vessel W is taken out from the exhaust portion 7 Exhaust.

[收納架] 如圖1所示，於收納架1上以在上下方向Y及橫向方向(架子的延伸方向)上排列的狀態配置有收納部1a。 如圖1及圖3所示，複數個收納部1a的每一個上均具備有從下方支撐容器W之支撐部9。收納部1a是構成為在藉由支撐部9從下方支撐容器W的狀態下，收納該容器W。於支撐部9具備有用於將在水平方向上的容器W的規定位置定位的突起9a。又，支撐部9支撐有與收納部1a所收納的容器W連接之連接部18。此連接部18會在已將容器W支撐在支撐部9的規定位置之狀態下，連接至該容器W的供氣部6。連接部18是配置在可相對於在規定位置上被支撐部9支撐的狀態之容器W，來連接到該容器W的供氣部6之位置。[Storage Rack] As shown in FIG. 1 , the storage unit 1 is provided with a storage unit 1 a in a state of being arranged in the vertical direction Y and the lateral direction (the extending direction of the rack). As shown in FIGS. 1 and 3, each of the plurality of storage portions 1a is provided with a support portion 9 for supporting the container W from below. The accommodating portion 1a is configured to accommodate the container W in a state in which the container W is supported from below by the support portion 9. The support portion 9 is provided with a projection 9a for positioning a predetermined position of the container W in the horizontal direction. Further, the support portion 9 supports a connection portion 18 that is connected to the container W housed in the storage portion 1a. The connecting portion 18 is connected to the air supply portion 6 of the container W in a state where the container W is supported at a predetermined position of the support portion 9. The connection portion 18 is a container W that is disposed in a state of being supported by the support portion 9 at a predetermined position, and is connected to the position of the air supply portion 6 of the container W.

也就是說，當容器W被收納部1a收納且被支撐部9支撐時，該容器W是藉由突起9a而被定位在規定位置，並且可將連接部18連接到供氣部6。 並且，構成為在將容器W支撐於支撐部9的狀態下，藉由從連接部18吐出乾燥空氣，將乾燥空氣從供氣部6供給到容器W的內部，並且將容器W的內部之氣體從排氣部7進行排氣。 在複數個收納部1a的每一個所具備有的支撐部9的全部均支撐有連接部18。因此，可將收納架1中的複數個收納部1a的全部都設為藉由氣體供給裝置3供給乾燥空氣之供給收納部。 因此，在以下的說明中，對於供給收納部會單純地稱為收納部1a來進行說明。That is, when the container W is housed by the accommodating portion 1a and supported by the support portion 9, the container W is positioned at a predetermined position by the projection 9a, and the connection portion 18 can be connected to the air supply portion 6. Further, in a state where the container W is supported by the support portion 9, the dry air is discharged from the connection portion 18, and the dry air is supplied from the air supply portion 6 to the inside of the container W, and the gas inside the container W is placed. Exhaust is performed from the exhaust unit 7. The connection portion 18 is supported by all of the support portions 9 provided in each of the plurality of storage portions 1a. Therefore, all of the plurality of accommodating portions 1a in the storage rack 1 can be supplied to the supply accommodating portion of the dry air by the gas supply device 3. Therefore, in the following description, the supply storage unit will be simply referred to as the storage unit 1a.

收納架1是設置在下地板部F2上。將收納架1中的複數個收納部1a的全部都配置成位在比上地板部F1更上方。因此，將在上下方向Y上排列的收納部1a當中的位於最下方的收納部1a作為最下段之收納部1a，於該最下段之收納部1a所具備的支撐部9是設置在比上地板部F1更上方。 將內部區域E之中，在比上地板部F1更上方且被壁體K所包圍的區域設為收納區域E1。將收納架1所具備的複數個收納部1a的全部都設置在收納區域E1中。又，在內部區域E之中，將比上地板部F1更下方的區域設為設置區域E2。此設置區域E2是位在比最下段之收納部1a所具備的支撐部9更下方的位置。也就是說，內部區域E是由收納區域E1與設置區域E2所構成，該收納區域E1是位在比上地板部F1更上方且被壁體K所包圍的區域，該設置區域E2是比上地板部F1更下方的區域。 再者，在本實施形態中，由於是將收納架1中的複數個收納部1a(供給收納部)的全部都設置在比上地板部F1更上方，因此將比上地板部F1更上方且被壁體K所包圍的區域設為收納區域E1。但是，在將收納架1中的收納部1a之一部分設置在比上地板部F1更下方的情況下，也可以將比上地板部F1更下方且被壁體K所包圍的區域之一部分或全部作為收納區域E1的一部分。例如，也可以做成將收納區域E1朝下方延伸到最下段之收納部1a(供給收納部)中的支撐部9之下端為止。在此情況下，成為主壁部會延伸到比上地板部F1更下方之情形。The storage rack 1 is provided on the lower floor portion F2. All of the plurality of storage portions 1a in the storage rack 1 are placed above the upper floor portion F1. Therefore, the storage portion 1a located at the lowermost position among the storage portions 1a arranged in the vertical direction Y is the lowermost storage portion 1a, and the support portion 9 provided in the lowermost storage portion 1a is provided on the upper floor. Part F1 is above. Among the internal regions E, a region that is higher than the upper floor portion F1 and surrounded by the wall K is referred to as a storage region E1. All of the plurality of storage portions 1a included in the storage rack 1 are placed in the storage area E1. Further, in the internal region E, a region lower than the upper floor portion F1 is referred to as an installation region E2. This installation area E2 is located below the support portion 9 provided in the storage unit 1a of the lowermost stage. That is, the inner region E is constituted by the storage region E1 and the installation region E2 which is a region which is positioned above the upper floor portion F1 and surrounded by the wall body K, which is higher than the upper portion The area below the floor portion F1. Further, in the present embodiment, since all of the plurality of storage portions 1a (supply storage portions) in the storage rack 1 are disposed above the upper floor portion F1, they are placed above the upper floor portion F1. The area surrounded by the wall K is the storage area E1. However, when one portion of the storage portion 1a in the storage rack 1 is disposed below the upper floor portion F1, part or all of the area that is lower than the upper floor portion F1 and surrounded by the wall body K may be used. As a part of the storage area E1. For example, the storage area E1 may be extended downward to the lower end of the support portion 9 in the storage portion 1a (supply storage portion) of the lowermost stage. In this case, the main wall portion extends to be lower than the upper floor portion F1.

於收納架1所具備的複數個收納部1a是屬於複數個供給收納部群組G的任一個。如圖1及圖2所示，供給收納部群組G是由僅在上下方向Y上排列的2個以上之收納部1a所構成。又，可將在收納架1中從最上段一直排列到最下段之1列上的複數個收納部1a區分為複數個供給收納部群組G。藉由在上下方向上排列的複數個供給收納部組群G，而形成有收納架1的1列。在本實施形態中，如圖1所示，在收納架1中於上下方向Y上排列有33個收納部1a，且供給收納部群組G是由排列於上下方向Y上的11個收納部1a所構成。也就是說，將在上下方向Y上排列為1列的33個收納部1a區分成3個供給收納部群組G。像這樣，供給收納部群組G是由於收納架1上所具備有的複數個收納部1a之一部分所構成，且構成供給收納部群組G的2個以上之收納部1a僅在上下方向Y上排列而配置。The plurality of storage portions 1a included in the storage rack 1 are any one of the plurality of supply storage unit groups G. As shown in FIGS. 1 and 2, the supply and storage unit group G is composed of two or more storage portions 1a arranged only in the vertical direction Y. Further, a plurality of storage portions 1a that are arranged in the first row from the uppermost stage to the lowermost stage in the storage rack 1 can be divided into a plurality of supply storage unit groups G. One row of the storage racks 1 is formed by a plurality of supply storage unit groups G arranged in the vertical direction. In the present embodiment, as shown in FIG. 1, 33 storage portions 1a are arranged in the vertical direction Y in the storage rack 1, and the supply storage portion group G is 11 storage portions arranged in the vertical direction Y. 1a is composed. In other words, the 33 storage portions 1a arranged in one row in the vertical direction Y are divided into three supply storage group groups G. In this way, the supply storage unit group G is constituted by one of a plurality of storage units 1a provided in the storage rack 1, and the two or more storage units 1a constituting the supply storage unit group G are only in the vertical direction Y. Arranged and arranged.

[堆高式起重機] 如圖1所示，堆高式起重機2具備有：行走台車11，在收納架1的前方且朝行走方向(橫向方向：架子的延伸方向)行走；桅桿12，豎立設置在行走台車11上；升降體13，沿著桅桿12而升降；及移載裝置14，被升降體13支撐。 移載裝置14是藉由行走台車11行走而沿著行走方向移動，且藉由升降體13升降而沿著桅桿12在上下方向Y上移動。又，雖然省略詳細的說明，但於移載裝置14上具備有支撐容器W之支撐體、及使該支撐體沿著前後方向(與上下方向及橫向方向正交的方向)移動之連桿機構。移載裝置14是構成為可在自身與收納部1a之間、或自身與搬送輸送帶4之間移載容器W。 並且，堆高式起重機2是藉由行走台車11的行走、升降體13的升降及移載裝置14的移載動作，而將容器W從搬送輸送帶4搬送到收納部1a、或者將容器W從收納部1a搬送到搬送輸送帶4。[Heavy Crane] As shown in Fig. 1, the stacker crane 2 is provided with a traveling carriage 11 that travels in front of the storage rack 1 in the traveling direction (lateral direction: the extending direction of the rack); the mast 12 is erected On the traveling trolley 11, the lifting body 13 is raised and lowered along the mast 12, and the transfer device 14 is supported by the lifting body 13. The transfer device 14 moves in the traveling direction by the traveling carriage 11 and moves up and down along the mast 12 in the vertical direction Y by the elevation body 13 moving up and down. Further, although the detailed description is omitted, the transfer device 14 is provided with a support for supporting the container W and a link mechanism for moving the support in the front-rear direction (direction orthogonal to the vertical direction and the lateral direction). . The transfer device 14 is configured to transfer the container W between itself and the storage portion 1a or between itself and the transfer conveyor 4. Further, the stacking crane 2 transports the container W from the transport conveyor 4 to the storage unit 1a or the container W by the traveling of the traveling vehicle 11, the lifting and lowering of the lifting and lowering body 13, and the transfer operation of the transfer device 14. The conveyance belt 4 is conveyed from the accommodating part 1a.

行走台車11是在設置於下地板部F2上的行走軌道15上沿著該行走軌道15而行走。行走台車11的至少一部分位在比最下段之收納部1a所具備有的支撐部9更下方。在本實施形態中，行走台車11整體是位於比最下段之收納部1a所具備有的支撐部9更下方，且比上地板部F1更下方。The traveling carriage 11 travels along the traveling rail 15 on the traveling rail 15 provided on the lower floor portion F2. At least a part of the traveling carriage 11 is located below the support portion 9 provided in the storage unit 1a of the lowermost stage. In the present embodiment, the traveling carriage 11 as a whole is located below the support portion 9 provided in the lowermost storage portion 1a and below the upper floor portion F1.

[氣體供給裝置] 氣體供給裝置3會將乾燥空氣供給到收納部1a所收納的容器W之內部。 氣體供給裝置3具備有連接部18、配管19及質量流控制器20。連接部18會在氣體供給裝置3上具備有複數個。又，連接部18是相對於複數個收納部1a的每一個而設置。此連接部18是連接到收納部1a所收納之容器W。配管19會將從設置在收納區域E1的外部之供給源21所供給的乾燥空氣分歧供給至複數個連接部18。質量流控制器20是控制於配管19內流通的乾燥空氣之流量的控制器。質量流控制器20會在氣體供給裝置3上具備有複數個。又，質量流控制器20是相對於供給收納部群組G的每一個而設置。順道一提，在圖2中，所顯示的僅是關於在複數個第1配管23及第2配管24當中，對於在橫向方向上相鄰的2列收納部1a之第1配管23及第2配管24。[Gas Supply Device] The gas supply device 3 supplies dry air to the inside of the container W housed in the storage unit 1a. The gas supply device 3 includes a connection portion 18, a pipe 19, and a mass flow controller 20. The connecting portion 18 is provided in a plurality of gas supply devices 3. Further, the connecting portion 18 is provided for each of the plurality of housing portions 1a. The connecting portion 18 is connected to the container W housed in the accommodating portion 1a. The pipe 19 supplies the dry air supplied from the supply source 21 provided outside the storage area E1 to a plurality of connection portions 18. The mass flow controller 20 is a controller that controls the flow rate of the dry air flowing through the pipe 19. The mass flow controller 20 is provided with a plurality of gas supply devices 3. Further, the mass flow controller 20 is provided for each of the supply storage unit groups G. By the way, in the second pipe 23 and the second pipe 24, the first pipe 23 and the second pipe of the two rows of the storage portions 1a adjacent in the lateral direction are shown. Piping 24.

配管19具備有第1配管23、第2配管24、第3配管25、第1分歧配管26及第2分歧配管27。第1配管23是相對於複數個收納部1a的每一個而設置。第2配管24是相對於複數個供給收納部群組G的每一個而設置。第3配管25是連接到乾燥空氣的供給源21。第1分歧配管26是沿著收納架1的上下方向Y而設置。The pipe 19 includes a first pipe 23 , a second pipe 24 , a third pipe 25 , a first branch pipe 26 , and a second branch pipe 27 . The first pipe 23 is provided for each of the plurality of storage portions 1a. The second pipe 24 is provided for each of the plurality of supply storage unit groups G. The third pipe 25 is a supply source 21 connected to dry air. The first branch pipe 26 is provided along the vertical direction Y of the storage rack 1 .

第1分歧配管26會連接1個第2配管24、與對應於構成1個供給收納部群組G的複數個收納部1a(為2個以上之收納部1a，在本實施形態中為11個收納部1a)的複數個第1配管23(為2個以上之第1配管23，在本實施形態中為11個第1配管23)，並使從第2配管24所供給的乾燥空氣分歧到複數個第1配管23。第2分歧配管27會連接1個第3配管25、與複數個第2配管24(在圖2之例中為6個第2配管24)，且使從第3配管25所供給的乾燥空氣分歧到複數個第2配管24。再者，第1分歧配管26相當於分歧配管。The first branch pipe 26 is connected to one of the second pipes 24 and a plurality of storage portions 1a corresponding to one of the supply and storage unit groups G (two or more storage portions 1a, and in the present embodiment, 11 The plurality of first pipes 23 (two or more first pipes 23, in the present embodiment, eleven first pipes 23) in the accommodating portion 1a), and the dry air supplied from the second pipe 24 is branched to A plurality of first pipes 23 are provided. The second branch pipe 27 is connected to one of the third pipes 25 and the plurality of second pipes 24 (the six second pipes 24 in the example of FIG. 2), and the dry air supplied from the third pipe 25 is divided. A plurality of second pipes 24 are provided. Furthermore, the first branch pipe 26 corresponds to a branch pipe.

在第2配管24的每一個上均設置有質量流控制器20。換句話說，質量流控制器20是設置在第2配管24中的單一的流路上。質量流控制器20會測量流通於第2配管24的乾燥空氣之質量流量，以控制流通於第2配管24的乾燥空氣之流量。 複數個第1配管23的每一個上均設置有孔口(orifice)29與過濾器30。藉由在連接到1個第2配管24的複數個第1配管23的每一個上均設置孔口29之作法可將第1配管23的管徑縮小，因此可謀求從第2配管24供給到複數個收納部1a的乾燥空氣之流量的均一化。又，藉由過濾器30可以去除流通於第1配管23的塵埃。A mass flow controller 20 is provided on each of the second pipes 24. In other words, the mass flow controller 20 is a single flow path provided in the second pipe 24. The mass flow controller 20 measures the mass flow rate of the dry air flowing through the second pipe 24 to control the flow rate of the dry air flowing through the second pipe 24. An orifice 29 and a filter 30 are provided on each of the plurality of first pipes 23. By providing the orifices 29 in each of the plurality of first pipes 23 connected to the one second pipe 24, the pipe diameter of the first pipe 23 can be reduced, so that it can be supplied from the second pipe 24 to The flow rate of the dry air in the plurality of storage portions 1a is uniformized. Further, the dust flowing through the first pipe 23 can be removed by the filter 30.

像這樣，藉由不在按每個收納部1a而設置的第1配管23上，而是在按每個供給收納部群組G而設置的第2配管24的每一個上設置質量流控制器20之作法，可以將其配置在遠離收納部1a的位置。也就是說，可以容易地將質量流控制器20設置在被設定於收納區域E1的外部之設置區域E2中。藉由將質量流控制器20設置在設置區域E2中，可以抑制容器W受到質量流控制器20的發熱之影響的情形。也就是說，在本實施形態中，質量流控制器20是設置在第2配管24中的單一的流路上且在被設定於收納區域E1的外部之設置區域E2中。In this way, the mass flow controller 20 is provided on each of the second pipes 24 provided for each of the supply and storage unit groups G, not on the first pipe 23 provided for each of the storage portions 1a. Alternatively, it may be disposed at a position away from the accommodating portion 1a. That is, the mass flow controller 20 can be easily installed in the setting area E2 set outside the storage area E1. By arranging the mass flow controller 20 in the setting area E2, it is possible to suppress the situation in which the container W is affected by the heat generation of the mass flow controller 20. In other words, in the present embodiment, the mass flow controller 20 is provided in a single flow path of the second pipe 24 and is disposed in the installation area E2 outside the storage area E1.

設置質量流控制器20的設置區域E2會延伸到比最下段之收納部1a所具備的支撐部9更下方、或者超過在上下方向Y上排列的複數個收納部1a之外側方向X2之端並朝外側方向X2延伸。在本實施形態中，設置區域E2是在比最下段之收納部1a所具備的支撐部9更下方，且相對於在上下方向Y上排列的複數個收納部1a的外側方向X2之端涵蓋前後方向X而設定。 並且，質量流控制器20是設置在地板上壁31的下端與下地板部F2之間。又，質量流控制器20是以在前後方向X上貫穿地板下壁32的地板下壁部32a的狀態而設置，並且設置成朝上下方向Y來看使質量流控制器20的一部分比地板下壁部32a更位於外側方向X2。由於地板上壁部31a與地板下壁部32a是在前後方向X上設置於相同的位置上，因此相對於地板上壁部31a，也是設置成朝上下方向Y來看使質量流控制器20的一部分位於外側方向X2。The installation area E2 in which the mass flow controller 20 is provided extends to be lower than the support portion 9 provided in the storage unit 1a of the lowermost stage or exceeds the end of the outer side direction X2 of the plurality of storage portions 1a arranged in the vertical direction Y. Extending toward the outer direction X2. In the present embodiment, the installation region E2 is lower than the support portion 9 provided in the storage unit 1a of the lowermost stage, and covers the front side of the outer side direction X2 of the plurality of storage portions 1a arranged in the vertical direction Y. Set in direction X. Further, the mass flow controller 20 is disposed between the lower end of the floor upper wall 31 and the lower floor portion F2. Further, the mass flow controller 20 is provided in a state of penetrating the floor lower wall portion 32a of the floor lower wall 32 in the front-rear direction X, and is disposed such that a part of the mass flow controller 20 is lower than the floor in the vertical direction Y. The wall portion 32a is located further in the outer direction X2. Since the floor upper wall portion 31a and the floor lower wall portion 32a are disposed at the same position in the front-rear direction X, the mass flow controller 20 is also disposed in the vertical direction Y with respect to the floor upper wall portion 31a. One part is located in the outer direction X2.

從形成在地板上壁31的上端之流入口33流入到壁體K的內部之空氣，會依收納區域E1、設置區域E2的順序於壁體K的內部向下方流動，且從形成在地板下壁32的流出口流出到壁體K的外部。質量流控制器20是設置在空氣的流動方向上比收納區域E1更下游側。因此，可使因質量流控制器20而受熱的空氣難以於收納區域E1流動。The air that flows into the inside of the wall K from the inflow port 33 formed at the upper end of the floor upper wall 31 flows downward in the order of the storage area E1 and the installation area E2 in the interior of the wall K, and is formed under the floor. The outflow port of the wall 32 flows out to the outside of the wall body K. The mass flow controller 20 is disposed on the downstream side of the storage region E1 in the flow direction of the air. Therefore, it is difficult for the air heated by the mass flow controller 20 to flow in the storage region E1.

[第2實施形態] 接著，根據圖式說明本發明之物品搬送設備的第2實施形態。 再者，在說明第2實施形態時，關於壁體K的形狀及質量流控制器20的配置等，主要是針對與第1實施形態的不同點來說明，針對與第1實施形態同樣的構成則省略說明。[Second Embodiment] Next, a second embodiment of the article transporting device of the present invention will be described based on the drawings. In the second embodiment, the shape of the wall body K and the arrangement of the mass flow controller 20 are mainly described with respect to differences from the first embodiment, and the same configuration as that of the first embodiment is described. The description is omitted.

無塵室的天花板C是由上天花板部C1、以及設置在比上天花板部C1更下方的下天花板部C2所構成。上天花板部C1是不具有通氣孔的天花板，且限制空氣的流通。下天花板部C2是可在上下方向Y上通氣的天花板。在本實施形態中，上天花板部C1是由無孔狀的混凝土所構成。下天花板部C2是由HEPA過濾器等的過濾器所構成。 再者，具備有過濾器的下天花板部C2相當於具備有使清淨空氣向下方流出之流出部的天花板。下地板部F2相當於在上下方向Y上限制氣體的流通的設置地板。The ceiling C of the clean room is composed of an upper ceiling portion C1 and a lower ceiling portion C2 that is disposed below the upper ceiling portion C1. The upper ceiling portion C1 is a ceiling that does not have a vent hole, and restricts the circulation of air. The lower ceiling portion C2 is a ceiling that can be ventilated in the vertical direction Y. In the present embodiment, the upper ceiling portion C1 is made of concrete having no pores. The lower ceiling portion C2 is composed of a filter such as a HEPA filter. Further, the lower ceiling portion C2 including the filter corresponds to a ceiling provided with an outflow portion for allowing the clean air to flow downward. The lower floor portion F2 corresponds to an installation floor that restricts the flow of gas in the vertical direction Y.

如圖5所示，壁體K是設置在下天花板部C2的正下方。壁體K具備有地板上壁31與地板下壁32。地板上壁31位於比上地板部F1更上方且比下天花板部C2更下方的位置。地板下壁32位於比上地板部F1更下方且比下地板部F2更上方的位置。地板下壁32相較於地板上壁31會在前後方向X上形成得較寬。壁體K是作為整體而形成為從長度方向來看是使其上下翻轉的T字形。As shown in FIG. 5, the wall body K is disposed directly below the lower ceiling portion C2. The wall body K is provided with a floor upper wall 31 and a floor lower wall 32. The floor upper wall 31 is located above the upper floor portion F1 and below the lower ceiling portion C2. The floor lower wall 32 is located below the upper floor portion F1 and above the lower floor portion F2. The floor lower wall 32 is formed wider in the front-rear direction X than the floor upper wall 31. The wall body K is formed in a T shape which is turned upside down as viewed from the longitudinal direction.

地板上壁31是形成為上方為開放的四角筒狀。也就是說，在第2實施形態中，和第1實施形態同樣地，地板上壁31是形成為具備4面地板上壁部31a的四角筒狀。但是，並不具備有第1實施形態所示的上壁部31b。再者，在圖5中所顯示的是將前後方向X的其中一個方向堵塞之地板上壁部31a、以及將前後方向X的另一個方向堵塞的地板上壁部31a。The floor upper wall 31 is formed in a quadrangular tubular shape in which the upper portion is open. In other words, in the second embodiment, the floor upper wall 31 is formed in a rectangular tubular shape having four floor upper wall portions 31a as in the first embodiment. However, the upper wall portion 31b shown in the first embodiment is not provided. Further, shown in FIG. 5 is a floor upper wall portion 31a that blocks one of the front-rear directions X and a floor upper wall portion 31a that blocks the other direction of the front-rear direction X.

地板下壁32是形成為上表面的一部分為開口之四角箱狀。進一步說明，地板下壁32具備有4面的地板下壁部32a、形成該地板下壁32的上表面之一對遮斷壁部32b、形成該地板下壁32的下表面之底壁部32c。在圖5中所顯示的是將收納區域E1中的前後方向X的其中一個方向堵塞的地板下壁部32a、將前後方向X的另一個方向堵塞的地板下壁部32a、形成地板下壁32的上表面之一對遮斷壁部32b、與形成下表面之底壁部32c。形成地板下壁32中的上表面之一對遮斷壁部32b是成為相對於下地板部F2而在上方隔著間隔的位置上，沿著下地板部F2而設置並且限制空氣的流通之構成。再者，遮斷壁部32b相當於副壁部。The floor lower wall 32 is formed in a rectangular box shape in which a part of the upper surface is an opening. Further, the floor lower wall 32 is provided with four floor lower wall portions 32a, one of the upper surfaces forming the floor lower wall 32, the partition wall portion 32b, and the bottom wall portion 32c forming the lower surface of the floor lower wall 32. . The floor lower wall portion 32a that blocks one of the front-rear directions X in the storage area E1, the floor lower wall portion 32a that blocks the other direction of the front-rear direction X, and the floor lower wall 32 are shown in FIG. One of the upper surfaces is opposite to the blocking wall portion 32b and the bottom wall portion 32c forming the lower surface. One of the upper surfaces of the floor lower wall 32 is formed so as to be spaced apart from the lower floor portion F2 at a position spaced apart from the lower floor portion F2, and is disposed along the lower floor portion F2 and restricts the circulation of air. . Further, the blocking wall portion 32b corresponds to the auxiliary wall portion.

遮斷壁部32b中的內側方向X1之端部，是在前後方向X上位在地板下壁部32a的內表面與支撐部9的外側方向X2之端部之間。遮斷壁部32b中的外側方向X2之端部，比地板下壁部32a的外表面更位在外側方向X2之側。 於地板下壁32的外側方向X2之端部上，形成有朝向外側方向X2開口的流出口34。此流出口34可藉由可使空氣在前後方向X上通氣的地板下壁部32a而被關閉。更具體地來說，於地板下壁32的外側方向X2之端部上，形成有空氣流出的流出口34，並可將該流出口34藉由地板下壁部32a而局部地關閉。The end portion of the blocking wall portion 32b in the inner direction X1 is located between the inner surface of the floor lower wall portion 32a and the end portion of the outer side direction X2 of the support portion 9 in the front-rear direction X. The end portion of the blocking wall portion 32b in the outer direction X2 is located closer to the outer side direction X2 than the outer surface of the floor lower wall portion 32a. An end portion 34 that opens in the outer direction X2 is formed at an end portion of the floor lower wall 32 in the outer direction X2. This outflow port 34 can be closed by the floor lower wall portion 32a which can ventilate the air in the front-rear direction X. More specifically, at the end portion of the outer side direction X2 of the floor lower wall 32, an outflow port 34 through which air flows out is formed, and the outflow port 34 can be partially closed by the floor lower wall portion 32a.

形成在地板上壁31的下端之開口與形成在地板下壁32的上表面之開口，會在上下方向Y中的上地板部F1的位置上連接。被地板上壁31所包圍的收納區域E1與遮斷壁部32b的正下方之設置區域E2是連通的。又，於地板上壁31的上端形成有使空氣從地板上壁31的上方流入至收納區域E1的流入口33。又，地板下壁32的外側方向X2之端部上形成有使空氣從設置區域E2流出到地板下壁32的外側方向X2側的流出口34。這個流出口34是形成在從遮斷壁部32b中的外側方向X2之端部朝下方遠離的位置上。The opening formed at the lower end of the floor upper wall 31 and the opening formed on the upper surface of the floor lower wall 32 are connected at the position of the upper floor portion F1 in the up and down direction Y. The storage area E1 surrounded by the floor upper wall 31 is in communication with the installation area E2 directly below the blocking wall portion 32b. Further, an inflow port 33 for allowing air to flow from above the floor upper wall 31 to the storage area E1 is formed at the upper end of the floor upper wall 31. Further, an end portion of the floor lower wall 32 in the outer direction X2 is formed with an outflow port 34 for allowing air to flow out from the installation region E2 to the outer side direction X2 side of the floor lower wall 32. This outflow port 34 is formed at a position away from the end portion of the outer side direction X2 of the blocking wall portion 32b.

並且，遮斷壁部32b中的內側方向X1之部分，是以限制遮斷壁部32b與地板上壁31之間之空氣的流通的狀態相鄰於地板上壁31中的下端而配置。 進一步說明，遮斷壁部32b是連結於上地板部F1的下表面，且地板上壁31的地板上壁部31a之下端是連結於上地板部F1的上表面。像這樣，以在地板上壁部31a的下端與遮斷壁部32b的上表面之間夾著上地板部F1的狀態，來設置地板上壁31及遮斷壁部32b。藉此，在本實施形態中，成為在地板上壁31與遮斷壁部32b之間上地板部F1為限制空氣的流通的狀態。 再者，遮斷壁部32b中的內側方向X1之部分，是設為從遮斷壁部32b中的內側方向X1之端到1/3的部分。Further, a portion of the inner wall direction X1 of the blocking wall portion 32b is disposed adjacent to the lower end of the floor upper wall 31 in a state in which the flow of air between the blocking wall portion 32b and the floor upper wall 31 is restricted. Further, the blocking wall portion 32b is coupled to the lower surface of the upper floor portion F1, and the lower end of the floor upper wall portion 31a of the floor upper wall 31 is coupled to the upper surface of the upper floor portion F1. In this manner, the floor upper wall 31 and the blocking wall portion 32b are provided in a state in which the upper floor portion F1 is interposed between the lower end of the floor upper wall portion 31a and the upper surface of the blocking wall portion 32b. As a result, in the present embodiment, the floor portion F1 is in a state in which the air is restricted from flowing between the floor upper wall 31 and the blocking wall portion 32b. In addition, the portion of the inner wall direction X1 of the blocking wall portion 32b is a portion from the end of the inner side direction X1 of the blocking wall portion 32b to 1/3.

在本實施形態中，設置區域E2是設定在比最下段之收納部1a所具備的支撐部9更下方，且比在上下方向Y上排列的複數個收納部1a之外側方向X2的端部更位在外側方向X2之側。質量流控制器20是設置在設置區域E2中。質量流控制器20的整體是比遮斷壁部32b的內側方向X1之端部更位於外側方向X2之側，且比遮斷壁部32b的外側方向X2之端部更位於內側方向X1之側。又，質量流控制器20是相對於支撐部9而在外側方向X2側設置成朝上下方向Y來看與支撐部9不重疊。In the present embodiment, the installation region E2 is set lower than the support portion 9 provided in the storage unit 1a of the lowermost stage, and is more than the end portion of the outer side direction X2 of the plurality of storage portions 1a arranged in the vertical direction Y. It is located on the side of the outer direction X2. The mass flow controller 20 is disposed in the setting area E2. The mass flow controller 20 is located on the side of the outer side direction X2 from the end portion of the inner side direction X1 of the blocking wall portion 32b, and is located on the side of the inner side direction X1 from the end portion of the outer side direction X2 of the blocking wall portion 32b. . Further, the mass flow controller 20 is provided on the outer side X2 side with respect to the support portion 9 so as not to overlap the support portion 9 as viewed in the vertical direction Y.

在對應於壁體K的位置上從下天花板部C2向下方流出的空氣，會從形成在地板上壁31的上端之流入口33流入到壁體K的內部。並且，已流入地板上壁31內的空氣會在收納區域E1向下方流動後，在設置區域E2中朝外側方向X2流動，之後，從流出口34流出至壁體K的外部。 質量流控制器20是設置在空氣的流動方向上比收納區域E1更下游側。因此，可使因質量流控制器20而受熱的空氣難以於收納區域E1流動。The air that flows downward from the lower ceiling portion C2 at a position corresponding to the wall body K flows into the inside of the wall body K from the inflow port 33 formed at the upper end of the floor upper wall 31. Then, the air that has flowed into the floor upper wall 31 flows downward in the storage area E1, flows in the outer direction X2 in the installation area E2, and then flows out from the outflow port 34 to the outside of the wall K. The mass flow controller 20 is disposed on the downstream side of the storage region E1 in the flow direction of the air. Therefore, it is difficult for the air heated by the mass flow controller 20 to flow in the storage region E1.

[其他實施形態] (1)在上述第1及第2實施形態中，雖然是將設置區域設定在比複數個收納部中的最下段之收納部所具備的支撐部更下方處，但設定設置區域的位置並不限定於此。也就是說，也可以將設置區域設定在比複數個收納部中的最上段之收納部更上方處、或者在包覆收納架的壁體之外部，具體來說，只要將設置區域以設定在上下方向中的下地板部與上地板部之間，且在前後方向上比地板下壁部更位於外側方向的方式進行設置亦可。[Other Embodiments] (1) In the above-described first and second embodiments, the installation area is set lower than the support portion provided in the storage unit of the lowermost stage among the plurality of storage units, but the setting is set. The location of the area is not limited to this. In other words, the installation area may be set to be higher than the uppermost storage portion of the plurality of storage portions or outside the wall of the storage storage rack. Specifically, the installation area may be set at The lower floor portion and the upper floor portion in the up-and-down direction may be disposed in the outer direction from the floor lower wall portion in the front-rear direction.

(2)在上述第1及第2實施形態中，構成供給收納部群組的2個以上之供給收納部僅在上下方向上排列。但是，將構成供給收納部群組的2個以上之供給收納部僅在橫向方向上排列亦可、或者在上下方向上及橫向方向上排列亦可。又，在上述實施形態中，是用以下的例子進行說明：將在收納架中從最上段一直到最下段的1列上排列的複數個收納部區分為複數個供給收納部群組。但是，以在收納架的1列上排列之全部的收納部，來形成1個供給收納部群組G亦可。(2) In the above-described first and second embodiments, the two or more supply and storage units constituting the supply and storage unit group are arranged only in the vertical direction. However, the two or more supply and storage units constituting the supply and storage unit group may be arranged only in the lateral direction or in the vertical direction and the lateral direction. Moreover, in the above-described embodiment, a description will be given of a case where a plurality of storage portions arranged in one row from the uppermost stage to the lowermost stage in the storage rack are divided into a plurality of supply storage unit groups. However, one supply storage unit group G may be formed by all the storage units arranged in one row of the storage rack.

(3)在上述第1及第2實施形態中，是將容器設為收納光罩(reticle、Photomask)的容器來說明。但是，容器也可以是收容FOUP等半導體晶圓的容器，也可以是收容食品的容器。(3) In the first and second embodiments described above, the container is described as a container that houses a reticle (photomask). However, the container may be a container for accommodating a semiconductor wafer such as a FOUP, or may be a container for accommodating food.

(4)在上述第1及第2實施形態中，是將藉由氣體供給裝置而供給到容器內部的氣體設為乾燥空氣。但是，藉由氣體供給裝置而供給到容器內部的氣體，也可以是乾燥空氣以外的氣體，例如，氮氣或氬氣等惰性氣體亦可。(4) In the first and second embodiments described above, the gas supplied to the inside of the container by the gas supply device is set as dry air. However, the gas supplied to the inside of the container by the gas supply device may be a gas other than dry air, for example, an inert gas such as nitrogen or argon.

(5)在上述實施形態中，是將收納架所具備的複數個收納部的全部均設為供給收納部。但是，也可以只將收納架所具備的複數個收納部的一部分設為供給收納部。 也就是說，將複數個收納部當中的一部分設為藉由氣體供給裝置供給氣體之供給收納部，並將複數個收納部當中的剩餘部分設為不藉由氣體供給裝置供給氣體之普通的收納部亦可。(5) In the above embodiment, all of the plurality of storage portions included in the storage rack are provided as supply and storage portions. However, only a part of the plurality of storage portions provided in the storage rack may be used as the supply storage portion. In other words, a part of the plurality of storage portions is a supply storage portion that supplies a gas by the gas supply device, and the remaining portion of the plurality of storage portions is an ordinary storage that does not supply the gas by the gas supply device. The department can also.

[上述實施形態的概要] 以下，針對在上述所說明之容器收納設備的概要進行說明。[Outline of the above embodiment] Hereinafter, an outline of the container storage device described above will be described.

一種容器收納設備，要點在於其具備在收納區域設置有複數個以收納容器之收納部、及將前述收納區域中的前述複數個收納部的一部分或全部設為供給收納部，且對收納於前述供給收納部的前述容器之內部供給氣體的氣體供給裝置，前述氣體供給裝置具備有複數個相對於複數個前述供給收納部的每一個而設置且連接至收納在前述供給收納部的前述容器之連接部、將從設置在前述收納區域之外部的供給源所供給的氣體分歧供給至前述複數個連接部之配管、及控制於前述配管內流通之氣體的流量的質量流控制器，在該容器收納設備中，前述配管是相對於由前述複數個供給收納部的一部分或全部所構成的供給收納部群組而具備： 2個以上之第1配管，對構成前述供給收納部群組的2個以上之前述供給收納部的每一個而設置； 第2配管，形成單一的流路，該單一的流路是設置在氣體的流通方向上比前述2個以上之第1配管更上游側；及 分歧配管，使從前述第2配管供給的氣體分歧到前述2個以上之第1配管， 前述質量流控制器是設置在為前述第2配管中的前述單一的流路上，且設置在被設定於前述收納區域之外部的設置區域中。A container storage device is characterized in that a storage unit having a plurality of storage containers is provided in a storage area, and a part or all of the plurality of storage units in the storage area are provided as supply and storage units, and are housed in the storage unit. a gas supply device that supplies a gas to the inside of the container of the storage unit, wherein the gas supply device includes a plurality of connections to the plurality of the supply and storage units and is connected to the container that is housed in the supply and storage unit. a mass flow controller that supplies a gas supplied from a supply source provided outside the storage area to the plurality of connecting portions and a flow rate controller that controls a flow rate of the gas flowing through the pipe, and stores the same in the container In the equipment, the piping is provided with two or more first pipes, and two or more of the supply and storage unit groups are provided in a group of supply and storage units including a part or all of the plurality of supply and storage units. Provided in each of the supply and storage units; the second pipe forms a single flow path, the single The flow path is provided on the upstream side of the two or more first pipes in the flow direction of the gas, and the branch pipe branches the gas supplied from the second pipe to the two or more first pipes, the mass The flow controller is provided in the single flow path of the second pipe, and is provided in an installation area set outside the storage area.

根據此特徵構成，藉由在第2配管上設置質量流控制器，變得可相對於構成供給收納部群組的複數個供給收納部設置1個質量流控制器。因此，可以減少質量流控制器的設置數量，且可以壓低氣體供給裝置的製造成本。又，藉由在位於比第1配管更上游側之第2配管上設置質量流控制器，即可輕易地將質量流控制器設置在遠離收納部的位置。藉由在被設定於具備複數個收納部的收納區域之外部之區域中設置質量流控制器，可以使收容於該收納部的容器難以受到質量流控制器的溫度上升之影響。According to this characteristic configuration, by providing the mass flow controller in the second pipe, it is possible to provide one mass flow controller with respect to the plurality of supply accommodating portions constituting the supply accommodating portion group. Therefore, the number of sets of the mass flow controller can be reduced, and the manufacturing cost of the gas supply device can be depressed. Further, by providing the mass flow controller on the second pipe located on the upstream side of the first pipe, the mass flow controller can be easily disposed at a position away from the accommodating portion. By providing the mass flow controller in a region outside the storage region provided with the plurality of storage portions, it is possible to prevent the container accommodated in the storage portion from being affected by the temperature rise of the mass flow controller.

在此，較理想的是將前述複數個收納部在上下方向上排列而配置，前述複數個收納部的每一個均具備從下方支撐前述容器的底面部之支撐部，且前述設置區域是設定在比前述複數個收納部中的最下段之前述收納部所具備的前述支撐部更下方。Here, it is preferable that the plurality of storage portions are arranged in the vertical direction, and each of the plurality of storage portions includes a support portion that supports the bottom surface portion of the container from below, and the installation region is set at The support portion provided in the storage portion of the lowermost stage among the plurality of storage portions is lower than the support portion.

根據此構成，可以利用比於最下段之收納部所具備的支撐部更下方之空出的空間，並在該空出的空間設置質量流控制器。進一步說明，在例如堆高式起重機相對於收納部搬送容器的情況下，可將於最下段之收納部所具備的支撐部設置在可以使該堆高式起重機相對於最下段之收納部搬送容器的高度上。在這種情況下，在最下段之收納部所具備的支撐部之下方大多為形成有空出的空間之情況。因此，可以利用此空出的空間，並在該空出的空間設置質量流控制器。 又，在容器收納設備中，藉由使收納區域內的氣體向下方流動的氣流產生裝置而有產生下向流(downflow)的情況。在產生有下向流的情況下，因質量流控制器的溫度上升而溫度已上升之周圍的氣體會變得難以向上方流動。因此，可使設置在比質量流控制器更上方的收納部中所收納之容器，變得難以受到質量流控制器的溫度上升所造成的熱之影響。According to this configuration, it is possible to use a space that is smaller than the support portion provided in the storage portion of the lowermost stage, and to provide a mass flow controller in the vacant space. In the case where the stacking crane transports the container with respect to the accommodating portion, for example, the support portion provided in the lowermost storage portion can be provided so that the stacker can transport the container with respect to the lowermost storage portion. On the height. In this case, a space that is vacant is often formed below the support portion provided in the accommodating portion of the lowermost stage. Therefore, it is possible to utilize this vacated space and set the mass flow controller in the vacated space. Further, in the container storage device, a downflow may occur due to the airflow generating device that causes the gas in the storage region to flow downward. When a downward flow is generated, the surrounding gas whose temperature has risen due to the temperature rise of the mass flow controller becomes difficult to flow upward. Therefore, it is possible to make it difficult for the container accommodated in the accommodating portion provided above the mass flow controller to be affected by the heat caused by the temperature rise of the mass flow controller.

又，較理想的是具備有涵蓋前述收納區域與前述設置區域來使設備內的氣體向下方流動的氣流產生裝置。Further, it is preferable to provide an airflow generating device that covers the storage region and the installation region to allow the gas in the device to flow downward.

根據此構成，可藉由氣流產生裝置，涵蓋收納區域與設置區域來產生使設備內的氣體向下方流動之下向流。因此，因質量流控制器的溫度上升而溫度已上升之周圍的氣體會變得難以向上方流動，並使設置在比質量流控制器更上方的收納部中所收納之容器變得難以受到質量流控制器的溫度上升所造成的熱之影響。According to this configuration, the airflow generating device can cover the storage area and the installation area to generate a flow in which the gas in the apparatus flows downward. Therefore, the gas around the temperature rises due to the temperature rise of the mass flow controller becomes difficult to flow upward, and the container accommodated in the storage portion provided above the mass flow controller becomes difficult to receive quality. The effect of heat caused by the temperature rise of the flow controller.

又，較理想的是構成前述供給收納部群組的前述2個以上之供給收納部僅在上下方向上排列而配置。Moreover, it is preferable that the two or more supply storage units constituting the supply and storage unit group are arranged only in the vertical direction.

根據此構成，可將藉由配管而被供給氣體的2個以上之供給收納部在上下方向上排列。並且，由於對該2個以上之供給收納部供給氣體的配管，主要是以在上下方向上延伸的狀態設置，因此配管中的在水平方向上延伸的部分是比較少的。因此，使配管難以遮斷下向流，而易於藉由氣流產生裝置適當地使氣體流動。According to this configuration, two or more supply and storage portions that are supplied with gas by the pipes can be arranged in the vertical direction. In addition, since the piping for supplying the gas to the two or more supply and storage units is mainly provided in a state of extending in the vertical direction, the portion of the piping that extends in the horizontal direction is relatively small. Therefore, it is difficult to block the downward flow of the piping, and it is easy to appropriately flow the gas by the airflow generating means.

又，較理想的是，前述複數個收納部在上下方向上及與該上下方向正交的橫向方向上排列而配置，前述複數個收納部的每一個均具備從下方支撐前述容器的底面部之支撐部，且具備將前述容器搬送到前述收納部之堆高式起重機，前述堆高式起重機具備在前述橫向方向上行走的行走台車、豎立設置在前述行走台車上的桅桿、及沿著前述桅桿而在上下方向上移動且將前述容器從自身移載到前述收納部的移載裝置，並且前述行走台車的至少一部分位於比於最下段之收納部所具備的前述支撐部更下方。Further, preferably, the plurality of storage portions are arranged in the vertical direction and in the lateral direction orthogonal to the vertical direction, and each of the plurality of storage portions is provided to support the bottom surface portion of the container from below. a support unit having a stacker that transports the container to the storage unit, the stacker having a traveling carriage that travels in the lateral direction, a mast that is erected on the traveling vehicle, and a mast along the mast The transfer device that moves in the vertical direction and transfers the container from itself to the storage unit, and at least a part of the traveling vehicle is located below the support portion provided in the storage portion of the lowermost stage.

根據此構成，由於在最下段之收納部所具備的支撐部是設置在可以使堆高式起重機的行走台車之至少一部分位於其下方的高度上，因此容易在最下段之收納部所具備的支撐部下方形成空出的空間。因此，可以利用該空出的空間，將質量流控制器設置在該空出的空間。According to this configuration, since the support portion provided in the storage portion of the lowermost stage is provided at a height at which at least a part of the traveling carriage of the stacker crane can be positioned below the support portion, it is easy to support the storage portion in the lowermost stage. A space is formed below the section. Therefore, the vacant space can be utilized to set the mass flow controller in the vacated space.

又，較理想的是，前述氣體供給裝置在前述第1配管的每一個上均具備有孔口。Moreover, it is preferable that the gas supply device has an orifice in each of the first pipes.

根據此構成，變得可輕易地將由第2配管所供給的氣體相對於構成供給收納部群組的2個以上之供給收納部的每一個均等地供給。According to this configuration, it is possible to easily supply the gas supplied from the second pipe to each of the two or more supply and storage units constituting the supply and storage unit group.

又，較理想的是，前述容器是收納光罩的容器，且藉由前述氣體供給裝置供給到前述容器的內部之氣體，和前述收納部中的氣體相比為濕度較低的氣體。Moreover, it is preferable that the container is a container that houses the photomask, and the gas supplied to the inside of the container by the gas supply device is a gas having a lower humidity than the gas in the storage portion.

根據此構成，可以使收容在容器的光罩難以受到質量流控制器發出之熱的影響。又，藉由在第2配管設置質量流控制器以形成為對複數個供給收納部設置1個質量流控制器的情況下，和藉由在第1配管設置質量流控制器而形成為對複數個供給收納部的每一個都設置質量流控制器的情況相比，易於使供給到複數個供給收納部的氣體供給量之變動變大。但是，一般而言，在容器中收容有光罩的情況下，和收容有半導體晶圓等的情況相比，對於容器之氣體供給量的變動之容許值較大。因此，即使在相對於複數個供給收納部設置1個質量流控制器的情況下，仍易於使氣體供給量的變動落在容許值以內。According to this configuration, it is possible to make the mask housed in the container difficult to be affected by the heat generated by the mass flow controller. Further, when the mass flow controller is provided in the second pipe so as to form one mass flow controller for the plurality of supply storage portions, and the mass flow controller is provided in the first pipe, the plural is formed In comparison with the case where each of the supply and storage units is provided with the mass flow controller, it is easy to increase the fluctuation of the supply amount of the gas supplied to the plurality of supply and storage units. However, in general, when the photomask is housed in the container, the allowable value of the variation in the gas supply amount of the container is larger than in the case where the semiconductor wafer or the like is accommodated. Therefore, even when one mass flow controller is provided for a plurality of supply accommodating portions, it is easy to make the fluctuation of the gas supply amount fall within the allowable value.

又，較理想的是，具備包覆前述收納區域而限制該收納區域之周圍的氣體的流通的壁體，前述壁體具備主壁部，該主壁部是相對於限制氣體的流通的設置地板而在上方隔著間隔的位置上以沿著上下方向的形態設置，並且限制氣體的流通，將朝上下方向來看在前述主壁部的厚度方向上相對於前述主壁部而存在有前述收納區域的方向設為第1方向，並將與前述第1方向相反的方向設為第2方向，前述主壁部的上端形成有使氣體從前述主壁部的上方流入到前述收納區域的流入口，前述質量流控制器是設置成位在前述主壁部的下端與前述設置地板之間，且朝上下方向來看前述質量流控制器的至少一部分比前述主壁部更位於前述第2方向側。Moreover, it is preferable to provide a wall body that covers the storage area and restricts the flow of the gas around the storage area, and the wall body includes a main wall portion that is provided with respect to the flow of the restricting gas. In the upper portion of the main wall portion, the above-described main wall portion is present in the thickness direction of the main wall portion as viewed in the vertical direction. The direction of the region is the first direction, and the direction opposite to the first direction is the second direction, and the upper end of the main wall portion is formed with an inflow that allows gas to flow from above the main wall portion to the storage region. The mass flow controller is disposed between the lower end of the main wall portion and the installation floor, and at least a portion of the mass flow controller is located closer to the second direction than the main wall portion in the vertical direction. .

根據此構成，從形成在主壁部的上端之流入口流入到壁體的內部之氣體，會在壁體內部中的收納區域中朝下方流動後，在主壁部與設置地板之間朝第2方向流動並流出到壁體的外部。並且，將質量流控制器設置成位在主壁部的下端與設置地板之間且朝上下方向來看該質量流控制器的至少一部分比主壁部更位在第2方向側。藉此，可以相對於收納區域在氣體流動的下游側設置質量流控制器。因此，使因質量流控制器而受熱之質量流控制器的周圍的氣體難以流動到收納區域，而可以抑制以因質量流控制器而受熱的氣體將收納於收納部的容器加熱之情形。According to this configuration, the gas which flows into the inside of the wall body from the inlet port formed at the upper end of the main wall portion flows downward in the storage region in the interior of the wall body, and then faces between the main wall portion and the floor. The two directions flow and flow out to the outside of the wall. Further, the mass flow controller is disposed to be positioned between the lower end of the main wall portion and the installation floor, and at least a part of the mass flow controller is positioned further in the second direction side than the main wall portion as viewed in the vertical direction. Thereby, the mass flow controller can be disposed on the downstream side of the gas flow with respect to the storage area. Therefore, it is difficult to cause the gas around the mass flow controller that is heated by the mass flow controller to flow into the storage area, and it is possible to suppress heating of the container stored in the storage unit by the gas heated by the mass flow controller.

又，較理想的是，前述壁體除了前述主壁部之外還具備副壁部，該副壁部是相對於前述設置地板而在上方隔著間隔的位置上沿著前述設置地板設置，並且限制氣體的流通，前述收納區域與比前述副壁部更下方的前述設置區域連通，且前述副壁部中的前述第2方向之端部的下方形成有使氣體從前述設置區域流出到比前述副壁部更靠近前述第2方向側的流出口，使前述副壁部中的前述第1方向之部分以限制前述副壁部與前述主壁部之間之氣體的流通的狀態連接於前述主壁部的下端，前述質量流控制器是設置在前述副壁部與前述設置地板之間，且設置成前述質量流控制器的至少一部分比前述主壁部更位於前述第2方向、且前述質量流控制器的至少一部分比前述副壁部中的前述第1方向之端部更位於前述第2方向。Further, it is preferable that the wall body further includes a sub-wall portion provided along the installation floor at a position spaced apart from above with respect to the installation floor, in addition to the main wall portion, and Restricting the flow of the gas, the storage region communicates with the installation region below the auxiliary wall portion, and the lower portion of the second wall portion of the auxiliary wall portion is formed such that gas flows out from the installation region to the front side The auxiliary wall portion is closer to the flow outlet on the second direction side, and the portion of the auxiliary wall portion in the first direction is connected to the main body in a state of restricting the flow of gas between the auxiliary wall portion and the main wall portion. a lower end of the wall portion, wherein the mass flow controller is disposed between the auxiliary wall portion and the installation floor, and at least a portion of the mass flow controller is located in the second direction and is of a quality higher than the main wall portion At least a portion of the flow controller is located in the second direction than an end portion of the auxiliary wall portion in the first direction.

根據此構成，在壁體的內部之收納區域中向下方流動的氣體會在主壁部與設置地板之間朝第2方向流動，且在流經形成在副壁部的正下方之設置區域後，從形成在副壁部的端部下方之流出口流出到壁體的外部。也就是說，並不是使壁體內的空氣直接地從主壁部流出到壁體的外部，而是使空氣在藉由設置副壁部而形成的設置區域中流動後，流出到壁體的外部，藉此可在設置區域中流動的期間攪拌氣體。 進一步說明，例如，收納架所收納的物品是收容半導體基板的容器之情況下，會有充滿於容器內的氮氣等惰性氣體從容器中流出的情況。像這樣從容器產生氣體的情況下，有時會使該氣體的濃度局部地變高，換句話說，有時會使氧氣的濃度局部地變低。但是，藉由使壁體內的空氣在藉由設置副壁部而形成的設置區域中流動，且在此設置區域中使氣體攪拌後使其流出到壁體的外部，可以謀求從流出口流出的氣體之氧氣濃度的均一化。According to this configuration, the gas flowing downward in the storage region inside the wall body flows in the second direction between the main wall portion and the installation floor, and flows through the installation region formed directly below the sub wall portion. The outflow from the outlet formed below the end of the auxiliary wall portion flows out to the outside of the wall body. That is, the air in the wall body is not caused to flow directly from the main wall portion to the outside of the wall body, but the air flows in the installation region formed by providing the auxiliary wall portion, and then flows out to the outside of the wall body. Thereby, the gas can be stirred during the flow in the set area. Further, for example, when the article stored in the storage rack is a container for accommodating the semiconductor substrate, an inert gas such as nitrogen gas filled in the container may flow out of the container. When a gas is generated from the container as described above, the concentration of the gas may be locally increased, in other words, the concentration of oxygen may be locally lowered. However, by flowing the air in the wall body in the installation region formed by providing the auxiliary wall portion, and stirring the gas in the installation region to flow out to the outside of the wall body, it is possible to flow out from the outlet port. The homogenization of the oxygen concentration of the gas.

又，較理想的是，前述壁體除了前述主壁部之外，還具備副壁部，該副壁部是相對於前述設置地板而在上方隔著間隔的位置上沿著前述設置地板設置，並且限制氣體的流通，前述壁體是設置在具備有使清淨空氣朝向下方流出的流出部之天花板的正下方，且在比前述副壁部更上方處更具備可供作業者步行且在上下方向上可通氣之作業地板，前述副壁部是以在上下方向上與前述作業地板並列的狀態設置，前述作業地板中的在上下方向上與前述副壁部並列的部分是藉由前述副壁部來限制往上下方向的通氣。Further, it is preferable that the wall body includes a sub-wall portion provided along the installation floor at a position spaced apart from the floor surface in addition to the main wall portion. In addition, the wall body is disposed directly below the ceiling provided with the outflow portion that allows the clean air to flow downward, and is provided above the sub-wall portion to allow the operator to walk and to move up and down. In the upper permeable work floor, the auxiliary wall portion is provided in a state of being juxtaposed with the work floor in the vertical direction, and a portion of the work floor that is parallel to the auxiliary wall portion in the vertical direction is by the auxiliary wall portion To limit ventilation in the up and down direction.

根據此構成，由於作業地板是設置在比副壁部更上方，而副壁部是設置在相對於設置地板而在上方隔著間隔的位置上，因此作業者可以對收納架中的較高的部分進行作業。並且，由於可以利用作業地板下方的空間來形成設置區域，因而可以在難以成為周圍的障礙物之狀態下形成設置區域。 此外，由於作業地板中的在上下方向上與副壁部並列的部分可藉由副壁部的存在而限制通氣，因此可以抑止在收納架附近從作業地板流出氣體之情形。因此，對收納架進行物品的取出放入作業之作業者即使存在於壁體的附近，由於會形成使氣體在比該作業者所存在的地點更位於第2方向之側的地點上朝上方流動，因此可以抑制流出的氣體對作業者的影響。According to this configuration, since the work floor is provided above the auxiliary wall portion and the auxiliary wall portion is provided at a position spaced apart from the upper side with respect to the floor, the operator can have a higher position in the storage rack. Part of the work. Further, since the installation area can be formed by the space below the work floor, the installation area can be formed in a state where it is difficult to become an obstacle in the surroundings. Further, since the portion of the work floor which is juxtaposed with the sub-wall portion in the up-and-down direction can restrict the ventilation by the presence of the sub-wall portion, it is possible to suppress the flow of gas from the work floor in the vicinity of the storage rack. Therefore, the operator who takes out the loading and unloading of the article on the storage rack, even if it exists in the vicinity of the wall, is formed so that the gas flows upward at a position on the side closer to the second direction than the place where the operator exists. Therefore, it is possible to suppress the influence of the outflowing gas on the operator.

1‧‧‧收納架
1a‧‧‧收納部
2‧‧‧堆高式起重機
3‧‧‧氣體供給裝置
4‧‧‧搬送輸送帶
5‧‧‧送風風扇(氣流產生裝置)
6‧‧‧供氣部
7‧‧‧排氣部
9‧‧‧支撐部
9a‧‧‧突起
11‧‧‧行走台車
12‧‧‧桅桿
13‧‧‧升降體
14‧‧‧移載裝置
15‧‧‧行走軌道
18‧‧‧連接部
19‧‧‧配管
20‧‧‧質量流控制器
21‧‧‧供給源
23‧‧‧第1配管
24‧‧‧第2配管
25‧‧‧第3配管
26‧‧‧第1分歧配管(分歧配管)
27‧‧‧第2分歧配管
29‧‧‧孔口
30‧‧‧過濾器
31‧‧‧地板上壁(主壁部)
31a‧‧‧地板上壁部
31b‧‧‧上壁部
32‧‧‧地板下壁
32a‧‧‧地板下壁部
32b‧‧‧遮斷壁部(副壁部)
32c‧‧‧底壁部
33‧‧‧流入口
34‧‧‧流出口
C‧‧‧天花板
C1‧‧‧上天花板部
C2‧‧‧下天花板部
E‧‧‧內部區域
E1‧‧‧收納區域
E2‧‧‧設置區域
F‧‧‧地板部
F1‧‧‧上地板部(作業地板)
F2‧‧‧下地板部(設置地板)
G‧‧‧供給收納部群組
K‧‧‧壁體
W‧‧‧容器
X‧‧‧前後方向
X1‧‧‧內側方向
X2‧‧‧外側方向
Y‧‧‧上下方向1‧‧‧ storage rack
1a‧‧‧Storage Department
2‧‧‧Head height crane
3‧‧‧ gas supply device
4‧‧‧Transport conveyor belt
5‧‧‧Air supply fan (airflow generating device)
6‧‧‧Air Supply Department
7‧‧‧Exhaust Department
9‧‧‧Support
9a‧‧‧ Protrusion
11‧‧‧ Walking trolley
12‧‧‧Mast
13‧‧‧ Lifting body
14‧‧‧Transfer device
15‧‧‧walking track
18‧‧‧Connecting Department
19‧‧‧Pipe
20‧‧‧mass flow controller
21‧‧‧Supply source
23‧‧‧1st piping
24‧‧‧2nd piping
25‧‧‧3rd piping
26‧‧‧1st divergent piping (differential piping)
27‧‧‧2nd divergent piping
29‧‧‧孔口
30‧‧‧Filter
31‧‧‧The upper wall of the floor (main wall)
31a‧‧‧The upper wall of the floor
31b‧‧‧Upper wall
32‧‧‧The lower wall of the floor
32a‧‧‧The lower part of the floor
32b‧‧‧cutting wall (sub-wall)
32c‧‧‧ bottom wall
33‧‧‧Inlet
34‧‧‧Exit
C‧‧‧Ceiling
C1‧‧‧Upper ceiling
C2‧‧‧ under the ceiling
E‧‧‧Internal area
E1‧‧‧ Storage area
E2‧‧‧Setting area
F‧‧‧Floor Department
F1‧‧‧Upper floor (work floor)
F2‧‧‧Under the floor (flooring)
G‧‧‧Supply storage group
K‧‧‧ wall
W‧‧‧ Container
X‧‧‧ direction
X1‧‧‧Inside direction
X2‧‧‧ outside direction
Y‧‧‧Up and down direction

圖1是第1實施形態中的容器收納設備的側面圖。 圖2是第1實施形態中的容器收納設備的正面圖。 圖3是顯示第1實施形態中相對於供給收納部群組的配管之圖。 圖4是第1實施形態中的容器的正面圖。 圖5是第2實施形態中的容器收納設備的側面圖。Fig. 1 is a side view of the container storage device in the first embodiment. Fig. 2 is a front elevational view of the container storage device in the first embodiment. Fig. 3 is a view showing a pipe with respect to a supply storage unit group in the first embodiment. Fig. 4 is a front elevational view of the container in the first embodiment. Fig. 5 is a side view of the container storage device in the second embodiment.

1a‧‧‧收納部 1a‧‧‧Storage Department

3‧‧‧氣體供給裝置 3‧‧‧ gas supply device

9‧‧‧支撐部 9‧‧‧Support

9a‧‧‧突起 9a‧‧‧ Protrusion

18‧‧‧連接部 18‧‧‧Connecting Department

19‧‧‧配管 19‧‧‧Pipe

20‧‧‧質量流控制器 20‧‧‧mass flow controller

23‧‧‧第1配管 23‧‧‧1st piping

24‧‧‧第2配管 24‧‧‧2nd piping

26‧‧‧第1分歧配管(分歧記管) 26‧‧‧1st divergence (differential management)

29‧‧‧孔口 29‧‧‧孔口

30‧‧‧過濾器 30‧‧‧Filter

E1‧‧‧收納區域 E1‧‧‧ Storage area

E2‧‧‧設置區域 E2‧‧‧Setting area

F‧‧‧地板部 F‧‧‧Floor Department

F1‧‧‧上地板部(作業地板) F1‧‧‧Upper floor (work floor)

G‧‧‧供給收納部群組 G‧‧‧Supply storage group

W‧‧‧容器 W‧‧‧ Container

Claims (10)

一種容器收納設備，具備以下： 收納部，在收納區域設置有複數個以收納容器；及 氣體供給裝置，將前述收納區域中的前述複數個收納部的一部分或全部設為供給收納部，且對收納於前述供給收納部的前述容器之內部供給氣體， 該容器收納設備之特徵在於： 前述氣體供給裝置具備： 複數個連接部，相對於複數個前述供給收納部的每一個而設置且連接至收納在前述供給收納部的前述容器； 配管，將從設置在前述收納區域之外部的供給源所供給的氣體分歧供給至前述複數個連接部；及 質量流控制器，控制於前述配管內流通之氣體的流量， 前述配管是相對於由前述複數個供給收納部的一部分或全部所構成的供給收納部群組而具備： 2個以上之第1配管，相對於構成前述供給收納部群組的2個以上之前述供給收納部的每一個而設置； 第2配管，形成單一的流路，該單一的流路是設置在氣體的流通方向上比前述2個以上之第1配管更上游側；及 分歧配管，使從前述第2配管供給的氣體分歧到前述2個以上之第1配管， 前述質量流控制器是設置在前述第2配管中的前述單一的流路上，且設置在被設定於前述收納區域之外部的設置區域中。A container storage device comprising: a storage unit in which a plurality of storage containers are provided in a storage area; and a gas supply device that supplies a part or all of the plurality of storage units in the storage area to a storage unit, and In the container storage device, the gas supply device includes a plurality of connection portions that are provided for each of the plurality of supply storage portions and that are connected to the storage device. The container in the supply and storage unit; the pipe supplies the gas supplied from the supply source provided outside the storage area to the plurality of connection portions; and the mass flow controller controls the gas flowing through the pipe In the flow rate, the piping is provided in a supply storage unit group including a part or all of the plurality of supply storage units: two or more first pipes, and two of the supply storage unit groups Each of the above-described supply and storage units is provided; the second pipe is formed as a single unit In the flow path, the single flow path is provided on the upstream side of the two or more first pipes in the flow direction of the gas, and the branch pipes are branched so that the gas supplied from the second pipe branches to the two or more (1) The mass flow controller is provided in the single flow path provided in the second pipe, and is provided in an installation area set outside the storage area. 如請求項1之容器收納設備，其中， 前述複數個收納部是在上下方向上排列而配置， 前述複數個收納部的每一個均具備從下方支撐前述容器的底面部之支撐部， 且前述設置區域是設定在比前述複數個收納部中的最下段之前述收納部所具備的前述支撐部更下方。The container storage device according to claim 1, wherein the plurality of storage portions are arranged in a vertical direction, and each of the plurality of storage portions includes a support portion that supports a bottom surface portion of the container from below, and the foregoing The region is set below the support portion provided in the storage portion of the lowermost portion of the plurality of storage portions. 如請求項1或2之容器收納設備，其具備有： 氣流產生裝置，涵蓋前述收納區域與前述設置區域來使設備內的氣體向下方流動。The container storage device according to claim 1 or 2, further comprising: an airflow generating device that covers the storage area and the installation area to allow gas in the apparatus to flow downward. 如請求項1或2之容器收納設備，其中， 構成前述供給收納部群組的前述2個以上之供給收納部僅在上下方向上排列而配置。The container storage device according to claim 1 or 2, wherein the two or more supply storage units constituting the supply and storage unit group are arranged only in the vertical direction. 如請求項1或2之容器收納設備，其中， 前述複數個收納部是在上下方向上及與該上下方向正交的橫向方向上排列而配置， 前述複數個收納部的每一個均具備從下方支撐前述容器的底面部之支撐部， 且前述容器收納設備具備將前述容器搬送到前述收納部之堆高式起重機， 前述堆高式起重機具備在前述橫向方向上行走的行走台車、豎立設置在前述行走台車上的桅桿、及沿著前述桅桿而在上下方向上移動且將前述容器從自身移載到前述收納部的移載裝置， 並且前述行走台車的至少一部分位於比最下段之收納部所具備的前述支撐部更下方。The container storage device according to claim 1 or 2, wherein the plurality of storage portions are arranged in a vertical direction orthogonal to the vertical direction, and each of the plurality of storage portions is provided from below a stacking unit that supports the bottom surface of the container, and the container storage device includes a stacker that transports the container to the storage unit, and the stacker includes a traveling vehicle that travels in the lateral direction and is erected on the front side a mast on the traveling trolley, and a transfer device that moves in the vertical direction along the mast and transfers the container from itself to the storage portion, and at least a portion of the traveling vehicle is located in a storage portion that is lower than the lowermost portion The aforementioned support portion is further below. 如請求項1或2之容器收納設備，其中， 前述氣體供給裝置在前述第1配管的每一個上具備有孔口。The container storage device according to claim 1 or 2, wherein the gas supply device is provided with an orifice in each of the first pipes. 如請求項1或2之容器收納設備，其中， 前述容器是收納光罩的容器， 且藉由前述氣體供給裝置而供給到前述容器的內部之氣體，和前述收納部中的氣體相比為濕度較低的氣體。The container storage device according to claim 1 or 2, wherein the container is a container for accommodating the reticle, and the gas supplied to the inside of the container by the gas supply device is humidified compared with the gas in the accommodating portion Lower gas. 如請求項1或2之容器收納設備，其具備： 壁體，包覆前述收納區域而限制該收納區域之周圍的空氣的流通， 前述壁體具備主壁部，該主壁部是相對於限制空氣的流通的設置地板而在上方隔著間隔的位置上以沿著上下方向的形態設置，並且限制空氣的流通， 將朝上下方向來看在前述主壁部的厚度方向上相對於前述主壁部而存在有前述收納區域的方向設為第1方向，並將與前述第1方向相反的方向設為第2方向， 前述主壁部的上端形成有使空氣從前述主壁部的上方流入到前述收納區域的流入口， 前述質量流控制器是設置成位在前述主壁部的下端與前述設置地板之間，且朝上下方向來看前述質量流控制器的至少一部分比前述主壁部更位於前述第2方向側。The container storage device according to claim 1 or 2, further comprising: a wall body that covers the storage area to restrict circulation of air around the storage area, wherein the wall body includes a main wall portion that is opposite to the restriction The floor in which the air is circulated is provided in a vertically spaced position at a position spaced apart from each other, and restricts the flow of air, and is viewed in the vertical direction in the thickness direction of the main wall portion with respect to the main wall. a direction in which the storage area exists is a first direction, and a direction opposite to the first direction is a second direction, and an upper end of the main wall portion is formed to allow air to flow from above the main wall portion In the inflow port of the storage area, the mass flow controller is disposed between the lower end of the main wall portion and the installation floor, and at least a part of the mass flow controller is seen in the vertical direction more than the main wall portion Located on the second direction side. 如請求項8之容器收納設備，其中， 前述壁體除了前述主壁部之外還具備副壁部，該副壁部是相對於前述設置地板而在上方隔著間隔的位置上沿著前述設置地板設置，並且限制空氣的流通， 前述收納區域與比前述副壁部更下方的前述設置區域連通， 且前述副壁部中的前述第2方向之端部的下方形成有使空氣從前述設置區域流出到比前述副壁部更靠近前述第2方向側的流出口， 前述副壁部中的前述第1方向之部分是以限制前述副壁部與前述主壁部之間之空氣的流通的狀態鄰接於前述主壁部的下端而配置； 前述質量流控制器是設置在前述副壁部與前述設置地板之間，且是設置成前述質量流控制器的至少一部分比前述主壁部更位於前述第2方向、且前述質量流控制器的至少一部分比前述副壁部中的前述第1方向之端部更位於前述第2方向。The container storage device according to claim 8, wherein the wall body further includes a sub-wall portion in addition to the main wall portion, and the sub-wall portion is disposed along the upper side with respect to the floor surface The floor is provided to restrict the flow of air, and the storage area communicates with the installation area below the auxiliary wall portion, and air is formed from the installation area below the end portion of the auxiliary wall portion in the second direction. An outflow port that is closer to the second direction side than the auxiliary wall portion, and a portion of the auxiliary wall portion in the first direction is a state in which air circulation between the sub wall portion and the main wall portion is restricted Arranging adjacent to a lower end of the main wall portion; the mass flow controller is disposed between the auxiliary wall portion and the installation floor, and is disposed such that at least a portion of the mass flow controller is located further than the main wall portion At least a part of the mass flow controller in the second direction is located further in the second direction than an end portion of the auxiliary wall portion in the first direction. 如請求項8之容器收納設備，其中， 前述壁體除了前述主壁部之外還具備副壁部，該副壁部是相對於前述設置地板而在上方隔著間隔的位置上沿著前述設置地板設置，並且限制空氣的流通， 前述壁體是設置在具備有使清淨空氣朝向下方流出的流出部之天花板的正下方， 且在比前述副壁部更上方處更具備可供作業者步行且在上下方向上可通氣的作業地板， 前述副壁部是以在上下方向上與前述作業地板並列的狀態設置， 前述作業地板中的在上下方向上與前述副壁部並列的部分是藉由前述副壁部來限制往上下方向的通氣。The container storage device according to claim 8, wherein the wall body further includes a sub-wall portion in addition to the main wall portion, and the sub-wall portion is disposed along the upper side with respect to the floor surface The floor is provided, and the air is restricted from flowing. The wall body is disposed directly below the ceiling provided with the outflow portion that allows the clean air to flow downward, and is provided for the operator to walk more than the sub-wall portion. a work floor that is ventilated in the vertical direction, the auxiliary wall portion is provided in a state of being aligned with the work floor in the vertical direction, and a portion of the work floor that is parallel to the auxiliary wall portion in the vertical direction is by the aforementioned The auxiliary wall portion restricts ventilation in the up and down direction.
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