TW201719114A - Slit light source, and vision inspection apparatus having the same - Google Patents

Slit light source, and vision inspection apparatus having the same Download PDF

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TW201719114A
TW201719114A TW105138656A TW105138656A TW201719114A TW 201719114 A TW201719114 A TW 201719114A TW 105138656 A TW105138656 A TW 105138656A TW 105138656 A TW105138656 A TW 105138656A TW 201719114 A TW201719114 A TW 201719114A
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slit
light source
light
optical system
cylindrical lens
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TWI644078B (en
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柳弘俊
李明國
裵秀珉
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宰體有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8812Diffuse illumination, e.g. "sky"
    • G01N2021/8816Diffuse illumination, e.g. "sky" by using multiple sources, e.g. LEDs
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0634Diffuse illumination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0638Refractive parts
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10004Still image; Photographic image
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
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  • Analytical Chemistry (AREA)
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  • General Health & Medical Sciences (AREA)
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  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Quality & Reliability (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present invention relates to a slit light source and, more specifically, to a slit light source for irradiating slit-shaped light, and a vision inspecting device comprising the same. Disclosed is a slit light source comprising: a light source unit (100) for generating light; a slit unit (200), which is installed on the front side of the light source unit (100), for converting the light generated by the light source unit (100) into slit-shaped light; and an optical system (300) for enabling the light which has passed through the slit unit (200) to be focused on a subject (10) as predetermined slit light.

Description

狹縫光源及具有狹縫光源的視覺檢查裝置 Slit light source and visual inspection device with slit light source

本發明涉及一種狹縫光源,尤其涉及一種照射狹縫形狀的光的狹縫光源及具有狹縫光源的視覺檢查裝置。 The present invention relates to a slit light source, and more particularly to a slit light source that illuminates a slit-shaped light and a visual inspection device having a slit light source.

對於半導體元件等,需要在製程中、製程後執行各種檢查以提高製程合格率等。 For semiconductor components and the like, it is necessary to perform various inspections in the process and after the process to improve the process qualification rate and the like.

並且,存在進行如下的2D檢查及3D檢查中的至少一種視覺檢查:在對視覺檢查物件(半導體元件等)的檢查中,將光照射於被檢查物件,並獲取對被光照射的被檢查物件的圖像,分析獲取的圖像。 Further, there is at least one of the following 2D inspections and 3D inspections: in the inspection of the visual inspection object (semiconductor element or the like), the light is irradiated onto the object to be inspected, and the object to be inspected is irradiated. The image is analyzed by the acquired image.

在此,一般用於執行視覺檢查的視覺檢查裝置的結構包括:從光源產生固定圖案的光,並將光照射於被檢查物件的光源;及獲取通過光源被光照射的被檢查物件的圖像的圖像獲取裝置(攝像機或者掃描器)。 Here, the structure of the visual inspection apparatus generally used for performing visual inspection includes: generating a fixed pattern of light from a light source, and irradiating the light to the light source of the object to be inspected; and acquiring an image of the object to be inspected by the light source being illuminated by the light source Image acquisition device (camera or scanner).

並且,所述光源根據檢查形狀可使用點光源、狹縫光源等。 Further, the light source may use a point light source, a slit light source or the like according to the inspection shape.

但是,如同韓國公開專利公報第10-2011-17158號公開的技術,光源中的狹縫光源一般由光源部、遠心透鏡及介入於光源部與遠心透鏡之間的狹縫部件構成。 However, as disclosed in Japanese Laid-Open Patent Publication No. 10-2011-17158, a slit light source in a light source is generally constituted by a light source portion, a telecentric lens, and a slit member interposed between the light source portion and the telecentric lens.

但是,以往的狹縫光源為,光源部、遠心透鏡及狹縫部件形成一體,因此不能控制對被檢查體的運行距離。 However, in the conventional slit light source, since the light source unit, the telecentric lens, and the slit member are integrally formed, the running distance to the object to be inspected cannot be controlled.

並且,以往的狹縫光源使用雷射或者光纖作為光源部,因此光損失較大,進而無法使用於將光均勻化的擴散部件,或者要求使用電力相對大的光源部。 Further, since the conventional slit light source uses a laser or an optical fiber as the light source portion, the light loss is large, and it is not possible to use the diffusion member for uniformizing the light, or to use a light source portion having a relatively large electric power.

本發明的目的在於提供一種如下的狹縫光源及具有狹縫光源視覺檢查裝置:結構簡單,並且能夠更換結構的一部分,因此能夠控制運行距離。 An object of the present invention is to provide a slit light source and a slit light source visual inspection device which are simple in structure and capable of replacing a part of a structure, and thus can control a running distance.

本發明是為了達成如上所述的本發明的目的而提出的,本發明揭露了一種狹縫光源,其特徵在於,包括:產生光的光源部100;及狹縫部200,設置於所述光源部100的前方,並將從所述光源部100產生的光變換為狹縫形狀的光;及光學系統300,將通過所述狹縫部200的光以提前設定的狹縫光集光於被檢查體10。 The present invention has been made in order to achieve the object of the present invention as described above, and a slit light source comprising: a light source unit 100 that generates light; and a slit portion 200 disposed in the light source unit In front of 100, light generated from the light source unit 100 is converted into slit-shaped light; and optical system 300 collects slit light set in advance by the slit portion 200 on the object to be inspected 10.

在所述光源部100及所述狹縫部200之間可設置光擴散部件130,用於擴散從所述光源部100產生的光。 A light diffusing member 130 for diffusing light generated from the light source unit 100 may be disposed between the light source unit 100 and the slit unit 200.

所述光擴散部件130可附著於所述狹縫部200中向著所述光源部100的面。 The light diffusing member 130 may be attached to a surface of the slit portion 200 that faces the light source portion 100.

所述光源部100可包括基板120與多個LED元件110,所述多個LED元件110沿著所述狹縫光的長度方向配置於所述基板120。 The light source unit 100 may include a substrate 120 and a plurality of LED elements 110 disposed on the substrate 120 along a longitudinal direction of the slit light.

所述光學系統300可位於所述狹縫光的深度從所述光學系統300被提前設定的運行距離上。 The optical system 300 can be located at an operating distance in which the depth of the slit light is set in advance from the optical system 300.

所述光學系統300可包括:第一柱透鏡320,集光通過所述狹縫部200擴散的光;第二柱透鏡310,將通過所述第一柱透鏡320的光集光於所述被檢查體10。 The optical system 300 may include: a first cylindrical lens 320 that collects light diffused through the slit portion 200; and a second cylindrical lens 310 that collects light passing through the first cylindrical lens 320 to be inspected Body 10.

所述光學系統300可包括光圈部件330,設置於所述第一柱透鏡320及所述第二柱透鏡310之間,在通過所述第一柱透鏡320的光中切除除了提前設定的近軸光線以外的光。 The optical system 300 may include a diaphragm member 330 disposed between the first cylindrical lens 320 and the second cylindrical lens 310, and cut off the short axis set in advance in the light passing through the first cylindrical lens 320. Light outside the light.

本發明可包括框架部件190,可拆卸地結合於所述光源部100、所述狹縫部200及所述光學系統300,並且固定所述光源部100、所述狹縫部200及所述光學系統300的位置。 The present invention may include a frame member 190 detachably coupled to the light source portion 100, the slit portion 200, and the optical system 300, and fixing the light source portion 100, the slit portion 200, and the optical system 300 s position.

可沿著所述狹縫光的長度方向插拔所述光源部100、所述狹縫部200及所述光學系統300。 The light source unit 100, the slit unit 200, and the optical system 300 can be inserted and removed along the longitudinal direction of the slit light.

本發明揭露了一種視覺檢查裝置,包括:狹縫光源20,作為將光照射於被檢查體10的光源,具有上述結構;圖像獲取部30,獲取被通過所述狹縫光源20的狹縫光照射的被檢查體10的圖像。 The present invention discloses a visual inspection apparatus comprising: a slit light source 20 having the above-described structure as a light source that illuminates the object 10 to be inspected; and an image acquisition unit 30 that acquires a slit that passes through the slit light source 20. An image of the object 10 to be inspected by light.

所述被檢查體10,對於所述狹縫光源20以水平方向線型移動,從通過所述圖像獲取部30獲取的圖像可測量所述被檢查體10的三維形狀。 The subject 10 is linearly moved in the horizontal direction with respect to the slit light source 20, and the three-dimensional shape of the subject 10 can be measured from the image acquired by the image acquiring unit 30.

根據本發明的狹縫光源及具有狹縫光源的視覺檢查裝置由光源部、狹縫部及光學系統構成,進而具有結構簡單容易製造的優點。 The slit light source and the visual inspection device having the slit light source according to the present invention are composed of a light source unit, a slit portion, and an optical system, and have an advantage that the structure is simple and easy to manufacture.

並且,根據本發明的狹縫光源及具有狹縫光源的視覺檢查裝置使用沿著狹縫光的長度方向配置的多個LED元件作為光源,進而可使用擴散部件,因此具有能夠形成更加均勻的狹縫光的優點。 Further, the slit light source and the visual inspection device having the slit light source according to the present invention use a plurality of LED elements arranged along the longitudinal direction of the slit light as a light source, and further, a diffusion member can be used, so that a more uniform narrow shape can be formed. The advantages of stitching light.

並且,根據本發明的狹縫光源及具有狹縫光源的視覺檢查裝置由光源部、狹縫部及光學系統構成,並且對於光學系統的結構使用兩個柱透鏡及設置在兩個柱透鏡之間的光圈,進而具有整體結構簡單容易製造的優點。 Further, the slit light source and the visual inspection device having the slit light source according to the present invention are composed of a light source portion, a slit portion, and an optical system, and two cylindrical lenses are used for the structure of the optical system and are disposed between the two cylindrical lenses. The aperture, in turn, has the advantage that the overall structure is simple and easy to manufacture.

尤其是,能夠更換在兩個柱透鏡中的至少一個的柱透鏡,進而具有能夠控制對被檢查體的運行距離的優點。 In particular, it is possible to replace the cylindrical lens of at least one of the two cylindrical lenses, and further has an advantage of being able to control the running distance to the test object.

10‧‧‧被檢查體 10‧‧‧Inspected body

20‧‧‧狹縫光源 20‧‧‧Slit light source

30‧‧‧圖像獲取部 30‧‧‧Image Acquisition Department

100‧‧‧光源部 100‧‧‧Light source department

110‧‧‧LED元件 110‧‧‧LED components

120‧‧‧基板 120‧‧‧Substrate

130‧‧‧光擴散元件 130‧‧‧Light diffusing elements

190‧‧‧框架部件 190‧‧‧Frame parts

200‧‧‧狹縫部 200‧‧‧Slits

210‧‧‧狹縫開口 210‧‧‧ slit opening

220‧‧‧擴張部 220‧‧‧Expansion Department

300‧‧‧光學系統 300‧‧‧Optical system

310‧‧‧第二柱透鏡 310‧‧‧Second cylindrical lens

320‧‧‧第一柱透鏡 320‧‧‧First cylindrical lens

330‧‧‧光圈部件 330‧‧‧ aperture components

331‧‧‧貫通口 331‧‧‧through

WD‧‧‧運行距離 WD‧‧‧ running distance

圖1是示出本發明的視覺檢查裝置的一示例的概念圖;圖2是示出根據本發明的狹縫光源的立體圖;以及圖3是示出圖2的狹縫光源的縱剖面圖。 1 is a conceptual view showing an example of a visual inspection device of the present invention; FIG. 2 is a perspective view showing a slit light source according to the present invention; and FIG. 3 is a longitudinal sectional view showing the slit light source of FIG.

以下,參照附圖對根據本發明的狹縫光源及視覺檢查裝置的說明如下。 Hereinafter, a description will be given of a slit light source and a visual inspection device according to the present invention with reference to the accompanying drawings.

如圖1所示,根據本發明的視覺檢查裝置包括:作為使光照射於被檢查體10的光源的狹縫光源20;及獲取被通過狹縫光源20的狹縫光照射的被檢查體10的圖像的圖像獲取部30。 As shown in FIG. 1, a visual inspection apparatus according to the present invention includes: a slit light source 20 as a light source that illuminates light to the subject 10; and an object 10 to be inspected which is irradiated with slit light passing through the slit light source 20. Image acquisition unit 30 of the image.

所述狹縫光源20作為將狹縫光照射於被檢查體10的結構,將在後面進行詳細說明。 The slit light source 20 has a configuration in which slit light is irradiated onto the test object 10, and will be described in detail later.

所述圖像獲取部30作為獲取對通過狹縫光源20被狹縫光照射的被檢查體10的圖像的結構,可以是數位相機、掃描器等,只要是能夠獲取圖像的結構任何結構都可以。 The image acquisition unit 30 is configured to acquire an image of the subject 10 that is irradiated with the slit light by the slit light source 20, and may be a digital camera, a scanner, or the like, as long as it is a structure capable of acquiring an image. Yes.

具有如上所述結構的視覺檢查裝置,執行通過狹縫光源20照射狹縫光以及通過圖像獲取部30獲取圖像,通過與圖像獲取部30集成或者另外的控制部(未示出)獲取圖像,並分析獲取的圖像,執行平面形狀等的二維檢查、凸塊的高度、是否形成裂紋等三維檢查等。 The visual inspection apparatus having the structure as described above performs the irradiation of the slit light by the slit light source 20 and the acquisition of the image by the image acquisition section 30, and is integrated with the image acquisition section 30 or another control section (not shown). The image is analyzed, and the acquired image is analyzed, and a two-dimensional inspection such as a planar shape, a height of the bump, a three-dimensional inspection such as formation of a crack, or the like is performed.

作為一示例,所述被檢查體10對於所述狹縫光源20以水平方向線型移動,而視覺檢查裝置從通過圖像獲取部30獲取的圖像可測量被檢查體10的三維形狀。 As an example, the subject 10 is linearly moved in the horizontal direction with respect to the slit light source 20, and the visual inspection device can measure the three-dimensional shape of the subject 10 from the image acquired by the image acquisition unit 30.

另一方面,如上所述的視覺檢查裝置等需要對被檢查體10照射狹縫光,進而根據被檢查體10的種類、檢查種類等需要具有對被檢查體10的運行距離(測量距離)的狹縫光源20。 On the other hand, in the visual inspection device or the like as described above, it is necessary to irradiate the subject 10 with the slit light, and it is necessary to have the running distance (measured distance) to the subject 10 depending on the type of the subject 10, the type of the examination, and the like. Slit light source 20.

據此,如圖2及圖3所示,根據本發明的狹縫光源20包括:產生光的光源部100;設置於光源部100的前方將光源部100產生的光變換為狹縫形狀的光的狹縫部200;及將通過狹縫部200的光以提前設定的狹縫光集光於被檢查體10的光學系統300。 Accordingly, as shown in FIGS. 2 and 3, the slit light source 20 according to the present invention includes: a light source unit 100 that generates light; and light that is provided in front of the light source unit 100 to convert light generated by the light source unit 100 into a slit shape. The slit portion 200; and the slit light that is set in advance by the light passing through the slit portion 200 is collected by the optical system 300 of the test object 10.

所述光源部100作為產生光以形成狹縫光的結構,只要是可產生光的結構,可以是雷射發生裝置、LED照明裝置等任何裝置都可以。 The light source unit 100 is configured to generate light to form slit light, and may be any device such as a laser generating device or an LED lighting device as long as it can generate light.

作為一示例,所述光源部100可使用一個以上的LED元件,如圖2所示,可包括基板120與多個LED元件110,其中多個LED元件110沿著狹縫光的長度方向配置於基板120。 As an example, the light source part 100 may use one or more LED elements, as shown in FIG. 2, and may include a substrate 120 and a plurality of LED elements 110, wherein the plurality of LED elements 110 are disposed along the length direction of the slit light. Substrate 120.

所述基板120只要是可設置LED元件110的基板,任何基板都可以使用,可使用PCB、FPCB、金屬PCB等。 As long as the substrate 120 is a substrate on which the LED element 110 can be disposed, any substrate can be used, and a PCB, an FPCB, a metal PCB, or the like can be used.

所述LED元件110沿著所述狹縫光的長度方向在基板上120配置有多個,進而透過後述的光擴散部件130及狹縫部200可形成狹縫光。 A plurality of the LED elements 110 are arranged on the substrate 120 along the longitudinal direction of the slit light, and slit light can be formed by transmitting the light diffusion member 130 and the slit portion 200 which will be described later.

另外,所述LED元件110根據視覺檢查等的使用用途,可使用單色光、白色光等各種LED元件。 Further, the LED element 110 can use various LED elements such as monochromatic light and white light depending on the intended use such as visual inspection.

另一方面,從所述光源部100產生的光為沿著狹縫光的長度方向光量(亮度)有所不同,為了改善這一現象,較佳為如圖2所示在光源部100與狹縫部200之間設置光擴散部件130,以擴散從光源部100產生的光。 On the other hand, the light generated from the light source unit 100 differs in the amount of light along the longitudinal direction of the slit light (brightness), and in order to improve this phenomenon, it is preferable that the light source unit 100 and the narrow portion are as shown in FIG. Light diffusing members 130 are provided between the slits 200 to diffuse light generated from the light source section 100.

所述光擴散部件130作為散射透過的光並沿著狹縫光的長度方向均勻地照射光的結構,可以是光擴散薄膜、塗布光擴散物質的透明部件等各種結構。 The light diffusing member 130 has a structure in which light transmitted through the slit is uniformly irradiated with light along the longitudinal direction of the slit light, and may be various structures such as a light diffusing film and a transparent member to which the light diffusing material is applied.

另一方面,所述光擴散部件130可被設置成各種結構,可附著於狹縫部200中向著光源部100的面,或者可通過螺栓等緊固部件結合。 On the other hand, the light diffusing member 130 may be provided in various structures, may be attached to the surface of the slit portion 200 toward the light source portion 100, or may be joined by a fastening member such as a bolt.

所述狹縫部200作為設置於光源部100前方並將從光源部100產生的光變換為狹縫形狀的光的結構,根據設計可實現各種結構。 The slit portion 200 has a configuration in which light generated from the light source unit 100 is converted into a slit shape in front of the light source unit 100, and various configurations can be realized according to the design.

作為一示例,所述狹縫部200可由形成有提前設定的寬度的狹縫開口210的板件構成,以形成狹縫光。 As an example, the slit portion 200 may be constituted by a plate member formed with a slit opening 210 of a previously set width to form slit light.

另外,較佳為,所述板件形成有擴張部220,所述擴張部220以光軸(Y軸方向)為標準向光源部100擴張上下寬度(Z軸方向),以從光源部100照射大光量的光。 Further, it is preferable that the plate member is formed with an expansion portion 220 that expands the vertical width (Z-axis direction) toward the light source unit 100 with the optical axis (Y-axis direction) as a standard to be irradiated from the light source unit 100. A large amount of light.

所述光學系統300作為使通過狹縫部200的光以提前設定的狹縫光集光於被檢查體10的結構,可實現各種結構。 The optical system 300 has a configuration in which slit light set in advance by the light passing through the slit portion 200 is collected on the test object 10, and various structures can be realized.

尤其是,所述光學系統300可包括:集光通過狹縫部200擴散的光的第一柱透鏡320;及將通過第一柱透鏡320的光集光於被檢查體10的第二柱透鏡310。 In particular, the optical system 300 may include: a first cylindrical lens 320 that collects light diffused through the slit portion 200; and a second cylindrical lens 310 that collects light passing through the first cylindrical lens 320 to the subject 10 .

所述第一柱透鏡320及第二柱透鏡310作為以狹縫光的長度方向(X軸方向)構成圓筒形的一部分的柱透鏡,各個柱透鏡根據對被檢查體的運行距離(WD)可選擇適當的曲率(R1、R2)。 The first cylindrical lens 320 and the second cylindrical lens 310 are cylindrical lenses that form a part of a cylindrical shape in the longitudinal direction (X-axis direction) of the slit light, and each cylindrical lens is operated according to a running distance (WD) to the object to be inspected. The appropriate curvature (R1, R2) can be selected.

另一方面,所述光學系統300較佳被設計為位於狹縫光的深度從光學系統300被提前設定的運行距離(WD)上。 On the other hand, the optical system 300 is preferably designed to be located at a running distance (WD) in which the depth of the slit light is set in advance from the optical system 300.

在此,可控制所述運行距離(WD),並且在要改變運行距離(WD)的情況下,更換第一柱透鏡320及第二柱透鏡310中的至少一個,較佳為更換第二柱透鏡310,進而可改變運行距離(WD)。 Here, the running distance (WD) may be controlled, and in the case where the running distance (WD) is to be changed, at least one of the first cylindrical lens 320 and the second cylindrical lens 310 is replaced, preferably the second column is replaced. The lens 310, in turn, can vary the travel distance (WD).

為此,所述第一柱透鏡320及第二柱透鏡310可設置為更換所述第一柱透鏡320及第二柱透鏡310中的至少一個,尤其是可更換第二柱透鏡310。 To this end, the first cylindrical lens 320 and the second cylindrical lens 310 may be disposed to replace at least one of the first cylindrical lens 320 and the second cylindrical lens 310, in particular, the second cylindrical lens 310.

具體地說,根據本發明的狹縫光源20可包括框架部件190,該框架部件190可拆卸地結合於光源部100、狹縫部200及光學系統300,並固定光源部100、狹縫部200及光學系統300的位置。 Specifically, the slit light source 20 according to the present invention may include a frame member 190 detachably coupled to the light source portion 100, the slit portion 200, and the optical system 300, and fixing the light source portion 100, the slit portion 200, and the optical The location of system 300.

在此,可在框架部件190中以狹縫光的長度方向插拔所述光源部100、狹縫部200及光學系統300。 Here, the light source unit 100, the slit unit 200, and the optical system 300 can be inserted and removed in the longitudinal direction of the slit light in the frame member 190.

尤其是,可在框架部件190中插拔所述光學系統300,以替換第一柱透鏡320及第二柱透鏡310中的至少一個而不是全部,尤其是可更換第二柱透鏡310。 In particular, the optical system 300 can be inserted and removed in the frame member 190 to replace at least one of the first cylindrical lens 320 and the second cylindrical lens 310 instead of all, and in particular, the second cylindrical lens 310 can be replaced.

另一方面,所述光學系統300可包括光圈部件330,該光圈部件330設置於第一柱透鏡320及第二柱透鏡310之間,在通過第一柱透鏡320的光中切除除了提前設定的近軸光線以外的光。 On the other hand, the optical system 300 may include a diaphragm member 330 disposed between the first cylindrical lens 320 and the second cylindrical lens 310, and cut off in the light passing through the first cylindrical lens 320 except for being set in advance. Light other than paraxial rays.

所述光圈部件330作為切除除了提前設定的近似值以內的近軸光線以外的其餘光的部件,可實現各種結構。 The diaphragm member 330 can be realized as a member that cuts off the rest of the light other than the paraxial rays within the approximate value set in advance.

作為一示例,如圖2及圖3所示,所述光圈部件330可由形成有貫通口331的板件構成,其中貫通口331位於與近軸光線對應的位置,進而只使近軸光線通過。 As an example, as shown in FIGS. 2 and 3, the diaphragm member 330 may be formed of a plate member having a through hole 331 in which the through hole 331 is located at a position corresponding to the paraxial ray, thereby allowing only the paraxial ray to pass therethrough.

以上,不過是說明了可被本發明實現的較佳實施例的一部分,本發明的範圍不得被以上的實施例限定,並且在以上說明的本發明的技術思想與其根本的技術思想應該都包括在本發明的範圍內。 The above description is only a part of a preferred embodiment that can be implemented by the present invention, and the scope of the present invention is not limited by the above embodiments, and the technical idea of the present invention and its fundamental technical idea described above should be included in Within the scope of the invention.

100‧‧‧光源部 100‧‧‧Light source department

110‧‧‧LED元件 110‧‧‧LED components

120‧‧‧基板 120‧‧‧Substrate

130‧‧‧光擴散元件 130‧‧‧Light diffusing elements

200‧‧‧狹縫部 200‧‧‧Slits

210‧‧‧狹縫開口 210‧‧‧ slit opening

220‧‧‧擴張部 220‧‧‧Expansion Department

300‧‧‧光學系統 300‧‧‧Optical system

310‧‧‧第二柱透鏡 310‧‧‧Second cylindrical lens

320‧‧‧第一柱透鏡 320‧‧‧First cylindrical lens

330‧‧‧光圈部件 330‧‧‧ aperture components

331‧‧‧貫通口 331‧‧‧through

Claims (17)

一種狹縫光源,包括:產生光的光源部(100);狹縫部(200),設置於所述光源部(100)的前方,並將從所述光源部(100)產生的光變換為狹縫形狀的光;以及光學系統(300),用於將提前設定的狹縫光集光於被檢查體(10),所述狹縫光為通過所述狹縫部(200)的光。 A slit light source comprising: a light source portion (100) for generating light; a slit portion (200) disposed in front of the light source portion (100) and converting light generated from the light source portion (100) into a narrow a slit-shaped light; and an optical system (300) for collecting slit light set in advance to the object to be inspected (10), the slit light being light passing through the slit portion (200). 根據申請專利範圍第1項所述的狹縫光源,其中,在所述光源部(100)與所述狹縫部(200)之間設置有光擴散部件(130),用於擴散從所述光源部(100)產生的光。 The slit light source according to claim 1, wherein a light diffusing member (130) is provided between the light source portion (100) and the slit portion (200) for diffusing from the light source The light produced by the part (100). 根據申請專利範圍第2項所述的狹縫光源,其中,所述光擴散部件(130)附著於所述狹縫部(200)中向著所述光源部(100)的面。 The slit light source according to claim 2, wherein the light diffusing member (130) is attached to a surface of the slit portion (200) facing the light source portion (100). 根據申請專利範圍第1項至第3項中任一項所述的狹縫光源,其中,所述光源部(100)包括:基板(120);多個LED元件(110),沿著所述狹縫光的長度方向配置於所述基板(120)。 The slit light source according to any one of claims 1 to 3, wherein the light source portion (100) comprises: a substrate (120); a plurality of LED elements (110) along the The longitudinal direction of the slit light is disposed on the substrate (120). 根據申請專利範圍第1項至第3項中任一項所述的狹縫光源,其中,所述光學系統(300)位於所述狹縫光的深度從所述光學系統(300)被提前設定的運行距離上。 The slit light source according to any one of claims 1 to 3, wherein the depth of the optical system (300) located in the slit light is set in advance from the optical system (300) The running distance is on. 根據申請專利範圍第1項至第3項中任一項所述的狹縫光源,其中,所述光學系統(300)包括:第一柱透鏡(320),集光通過所述狹縫部(200)擴散的光;第二柱透鏡(310),將通過所述第一柱透鏡(320)的光集光於所述被檢查體(10)。 The slit light source according to any one of claims 1 to 3, wherein the optical system (300) includes: a first cylindrical lens (320) through which light is collected (200) The diffused light; the second cylindrical lens (310) collects light passing through the first cylindrical lens (320) to the object to be inspected (10). 根據申請專利範圍第1項至第3項中任一項所述的狹縫光源,其中,所述光學系統(300)包括:光圈部件(330),設置於所述第一柱透鏡(320)與所述第二柱透鏡(310) 之間,在通過所述第一柱透鏡(320)的光中切除除了提前設定的近軸光線以外的光。 The slit light source according to any one of claims 1 to 3, wherein the optical system (300) includes: an aperture member (330) disposed on the first cylindrical lens (320) And the second cylindrical lens (310) Between the light passing through the first cylindrical lens (320), light other than the paraxial rays set in advance is cut off. 根據申請專利範圍第1項至第3項中任一項所述的狹縫光源,其中,包括:框架部件(190),可拆卸地結合於所述光源部(100)、所述狹縫部(200)及所述光學系統(300),並且固定所述光源部(100)、所述狹縫部(200)及所述光學系統(300)的位置。 The slit light source according to any one of claims 1 to 3, further comprising: a frame member (190) detachably coupled to the light source portion (100) and the slit portion ( 200) and the optical system (300), and fixing the positions of the light source unit (100), the slit portion (200), and the optical system (300). 根據申請專利範圍第8項所述的狹縫光源,其中,沿著所述狹縫光的長度方向插拔所述光源部(100)、所述狹縫部(200)及所述光學系統(300)。 The slit light source according to Item 8, wherein the light source unit (100), the slit portion (200), and the optical system (300) are inserted and removed along a longitudinal direction of the slit light. ). 一種視覺檢查裝置,包括:狹縫光源(20),作為將光照射於被檢查體(10)的光源,具有根據申請專利範圍第1項至第3項中任一項的結構;以及圖像獲取部(30),獲取被通過所述狹縫光源(20)的狹縫光照射的被檢查體(10)的圖像。 A visual inspection device comprising: a slit light source (20) as a light source that illuminates light to the object to be inspected (10), having a structure according to any one of items 1 to 3 of the patent application; and an image The acquisition unit (30) acquires an image of the object to be inspected (10) that is illuminated by the slit light of the slit light source (20). 根據申請專利範圍第10項所述的視覺檢查裝置,其中,所述被檢查體(10)對於所述狹縫光源(20)以水平方向線型移動,從通過所述圖像獲取部(30)獲取的圖像測量所述被檢查體(10)的三維形狀。 The visual inspection device according to claim 10, wherein the object to be inspected (10) is linearly moved in the horizontal direction with respect to the slit light source (20), and passes through the image acquisition unit (30). The acquired image measures the three-dimensional shape of the object to be inspected (10). 根據申請專利範圍第10項所述的視覺檢查裝置,其中,所述光源部(100)包括:基板(120);多個LED元件(110),沿著所述狹縫光的長度方向配置於所述基板(120)。 The visual inspection device according to claim 10, wherein the light source unit (100) includes a substrate (120), and a plurality of LED elements (110) are disposed along a longitudinal direction of the slit light. The substrate (120). 根據申請專利範圍第10項所述的視覺檢查裝置,其中,所述光學系統(300)位於所述狹縫光的深度從所述光學系統(300)被提前設定的運行距離上。 The visual inspection apparatus according to claim 10, wherein the optical system (300) is located at an operating distance in which the depth of the slit light is set in advance from the optical system (300). 根據申請專利範圍第10項所述的視覺檢查裝置,其中,所述光學系統(300)包括:第一柱透鏡(320),集光通過所述狹縫部(200)擴散的光; 第二柱透鏡(310),將通過所述第一柱透鏡(320)的光集光於所述被檢查體(10)。 The visual inspection device according to claim 10, wherein the optical system (300) comprises: a first cylindrical lens (320) that collects light diffused through the slit portion (200); The second cylindrical lens (310) collects light passing through the first cylindrical lens (320) to the object to be inspected (10). 根據申請專利範圍第14項所述的視覺檢查裝置,其中,所述光學系統(300)包括:光圈部件(330),設置於所述第一柱透鏡(320)及所述第二柱透鏡(310)之間,在通過所述第一柱透鏡(320)的光中切除除了提前設定的近軸光線以外的光。 The visual inspection device of claim 14, wherein the optical system (300) comprises: an aperture member (330) disposed on the first cylindrical lens (320) and the second cylindrical lens ( Between 310), light other than the paraxial rays set in advance is cut out in the light passing through the first cylindrical lens (320). 根據申請專利範圍第10項所述的視覺檢查裝置,其中,包括:框架部件(190),可拆卸地結合於所述光源部(100)、所述狹縫部(200)及所述光學系統(300),並且固定所述光源部(100)、所述狹縫部(200)及所述光學系統(300)的位置。 The visual inspection device according to claim 10, comprising: a frame member (190) detachably coupled to the light source portion (100), the slit portion (200), and the optical system ( 300) and fixing the positions of the light source unit (100), the slit portion (200), and the optical system (300). 根據申請專利範圍第16項所述的視覺檢查裝置,其中,沿著所述狹縫光的長度方向插拔所述光源部(100)、所述狹縫部(200)及所述光學系統(300)。 The visual inspection device according to claim 16, wherein the light source unit (100), the slit portion (200), and the optical system (300) are inserted and removed along a longitudinal direction of the slit light. ).
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