TW201715095A - An electroplating machine and an electroplating method - Google Patents
An electroplating machine and an electroplating method Download PDFInfo
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- C—CHEMISTRY; METALLURGY
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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Abstract
Description
本發明係有關一種電鍍機器,特別是一種具有許多個可移動的工件載具之機器,及一種電鍍方法。 The present invention relates to an electroplating machine, and more particularly to a machine having a plurality of movable workpiece carriers, and an electroplating method.
在一傳統的電鍍機器中,如圖1所示,並概被標示為10,有許多個工件載具12係可相對於一槽14移動通過,該槽裝有一電鍍溶液。各工件載具12係與一各別的要被電鍍工件可釋離地銜接。當一工件與一工件載具12銜接時,該工件和該工件載具12係彼此互相電連接。該等工件載具12係可串列地,即依序排成一列,連續地移動通過該槽14,而來將該等工件串列地移動通過該槽14。要被電鍍的工件形狀概呈矩形且平坦的。當該等工件與該等工件載具12銜接並被其帶送時,該等工件的相反主要表面會朝向側邊,且該等工件係垂直地定向。故該電鍍機器係被稱為一垂直式連續電鍍機器。 In a conventional electroplating machine, as shown in Fig. 1, and generally designated 10, a plurality of workpiece carriers 12 are movable relative to a slot 14 containing a plating solution. Each workpiece carrier 12 is releasably coupled to a respective workpiece to be plated. When a workpiece is engaged with a workpiece carrier 12, the workpiece and the workpiece carrier 12 are electrically connected to each other. The workpiece carriers 12 are arranged in series, i.e., in a row, continuously moving through the slots 14 to move the workpieces in series through the slots 14. The shape of the workpiece to be plated is generally rectangular and flat. When the workpieces are engaged with and carried by the workpiece carriers 12, the opposite major surfaces of the workpieces are oriented toward the sides, and the workpieces are oriented vertically. Therefore, the electroplating machine is called a vertical continuous electroplating machine.
一陰極棒16係相對於該電鍍機器10的槽14固定,且每個該等工件載具12係藉一各別的滑動觸點18與陰極棒16電連接,俾能在該等工件載具12移動通過且相對於該槽 14時來與該陰極棒16呈電連接。有若干個陽極板20,各被以一各別的電源供應器22供電,係被置設在該槽14內並相對於它固定。如此,當該等工件被該等工件載具12移動通過該槽14中的電解溶液時,它們會在該陰極棒16與該陽極板20之間遭受一電場,而使該電解溶液中的金屬沉積在該等工件上。 A cathode rod 16 is fixed relative to the slot 14 of the electroplating machine 10, and each of the workpiece carriers 12 is electrically coupled to the cathode rod 16 by a respective sliding contact 18, which can be used in the workpiece carrier 12 moves through and relative to the slot The cathode rod 16 is electrically connected at 14 o'clock. There are a plurality of anode plates 20, each powered by a respective power supply 22, disposed within the slot 14 and fixed relative thereto. Thus, when the workpieces are moved by the workpiece carriers 12 through the electrolytic solution in the tank 14, they will experience an electric field between the cathode rod 16 and the anode plate 20, and the metal in the electrolytic solution. Deposited on the workpieces.
一般已知此一電鍍機器的有效覆蓋區可為短至一工件的寬度。因電鍍在一工件上的金屬之總量主要取決於當電鍍時該工件在該電鍍溶液中所用的安培小時之總量,此對控制供應至每一工件的電流之量是很重要的。但是,在該傳統的電鍍機器10中,若該等工件的電阻不相同,及若該等工件載具12不相同,則會非常難以控制供應至每個移動通過該槽14的工件之電流,因為,當電鍍時,具有一較低電阻的工件和工件載具12將會耗用較多的電流,而具有一較高電阻的工件和工件載具12將會耗用較少的電流。 It is generally known that the effective footprint of such an electroplating machine can be as short as a workpiece. Since the total amount of metal plated on a workpiece depends mainly on the total amount of ampere-hours used by the workpiece in the plating solution during plating, it is important to control the amount of current supplied to each workpiece. However, in the conventional electroplating machine 10, if the resistances of the workpieces are different, and if the workpiece carriers 12 are different, it is very difficult to control the current supplied to each of the workpieces moving through the slots 14, Because, when electroplating, the workpiece with a lower resistance and the workpiece carrier 12 will consume more current, while the workpiece with a higher resistance and the workpiece carrier 12 will consume less current.
故本發明之一目的係為提供一種電鍍機器及一種電鍍方法,其中上述的缺點會被緩解,或至少能對該業界和公眾提供一種有用的另類選擇。特別是,已發現,利用依據中國專利申請公開案No.CN 103436946 A中所揭之一種自動化電鍍系統的進一步改良和創新,其係可能至少緩解上述的缺點。 It is therefore an object of the present invention to provide an electroplating machine and an electroplating method wherein the above disadvantages are alleviated or at least provide a useful alternative to the industry and the public. In particular, it has been found that it is possible to at least alleviate the above disadvantages by using further improvements and innovations of an automated plating system as disclosed in Chinese Patent Application Publication No. CN 103436946 A.
依據本發明之一第一態樣,係提供一種電鍍機器,包含至少一槽用以容裝一電鍍溶液;一第一載具可釋離地與一要被電鍍的第一工件銜接並可相對於該槽移動;一第二載具可釋離地與一要被電鍍的第二工件銜接並可相對於該槽移動;其中該第一載具係與至少一第一電源供應器電連接並可同時地移動;其中該第二載具係與至少一第二電源供應器電連接並可同時移動;且其中該第一電源供應器和該第二電源供應器係與至少一第一共同陽極或至少一接地的共同導體電連接。 According to a first aspect of the present invention, there is provided an electroplating apparatus comprising at least one groove for accommodating a plating solution; a first carrier releasably engaging a first workpiece to be plated and Moving in the slot; a second carrier releasably engaging with a second workpiece to be plated and movable relative to the slot; wherein the first carrier is electrically coupled to the at least one first power supply and Simultaneously moving; wherein the second carrier is electrically connected to the at least one second power supply and can move at the same time; and wherein the first power supply and the second power supply are coupled to the at least one first common anode Or at least one grounded common conductor is electrically connected.
依據本發明之一第二態樣,係提供一種電鍍至少一工件的方法,包含以下步驟:(a)可釋離地銜接並電連接一第一工件與一第一載具;(b)移動該第一載具通過並相對於一裝有一電鍍溶液的槽;(c)將至少一第一電源供應器與該第一載具相關聯成為可與該第一載具同時地移動;(d)該第一電源供應器供應一電力至該第一載具;(e)可釋離地銜接並電連接一第二工件與一第二載具;(f)移動該第二載具通過並相對於該裝有該電鍍溶液的槽;(g)將至少一第二電源供應器與該第二載具相關聯成為可與該第二載具同時地移動;(h)該第二電源供應器供應一電力至該第二載具;及(i)獨立地調整一供應至該第一載具的電流及一供應至該第二載具的電流。 According to a second aspect of the present invention, there is provided a method of electroplating at least one workpiece comprising the steps of: (a) releasably engaging and electrically connecting a first workpiece to a first carrier; (b) moving The first carrier passes through and is opposite to a slot containing a plating solution; (c) associates at least one first power supply with the first carrier to be movable simultaneously with the first carrier; The first power supply supplies a power to the first carrier; (e) releasably engages and electrically connects a second workpiece and a second carrier; (f) moves the second carrier through Relative to the slot containing the plating solution; (g) associating at least one second power supply with the second carrier to be movable simultaneously with the second carrier; (h) the second power supply Supplying a power to the second carrier; and (i) independently adjusting a current supplied to the first carrier and a current supplied to the second carrier.
10、100、200‧‧‧電鍍機器 10, 100, 200‧‧‧ plating machine
12、104、204‧‧‧工件載具 12, 104, 204‧‧‧ workpiece carriers
14、102、202‧‧‧槽 14, 102, 202‧‧‧ slots
16‧‧‧陰極棒 16‧‧‧ cathode rod
18、112a、112b、212a、212b、229‧‧‧滑動觸點 18, 112a, 112b, 212a, 212b, 229‧‧ ‧ sliding contacts
20、114、214‧‧‧陽極板 20, 114, 214‧‧ ‧ anode plate
22、106a、106b、206a、206b‧‧‧電源供應器 22, 106a, 106b, 206a, 206b‧‧‧ power supply
108‧‧‧第一共同陽極 108‧‧‧First common anode
110‧‧‧第二共同陽極 110‧‧‧Second common anode
205‧‧‧工件 205‧‧‧Workpiece
208、210‧‧‧分段陽極 208, 210‧‧‧section anode
220、224‧‧‧分裂位置 220, 224‧‧ ‧ split position
222、226、228‧‧‧各段 Sections 222, 226, 228‧‧
230‧‧‧共同導體 230‧‧‧Common conductor
本發明的實施例現將參照所附圖式僅作為舉例來被說明,其中: 圖1為一傳統的電鍍機器之一示意圖;圖2為一依據本發明之一第一實施例的電鍍機器之一示意圖;及圖3為一依據本發明之一第二實施例的電鍍機器之一示意圖。 Embodiments of the present invention will now be described by way of example only with reference to the accompanying drawings in which: 1 is a schematic view of a conventional electroplating machine; FIG. 2 is a schematic view of a plating machine according to a first embodiment of the present invention; and FIG. 3 is a plating machine according to a second embodiment of the present invention. A schematic diagram.
一依據本發明之一第一實施例的垂直式連續電鍍機器之一示意圖係示於圖2中,且概被標示為100。 A schematic diagram of a vertical continuous plating machine in accordance with a first embodiment of the present invention is shown in FIG. 2 and is generally designated 100.
該電鍍機器100包含一槽102用以容裝一電鍍溶液。眾多個工件載具104(在圖2中係示出五個)係可串列地移動通過並相對於該槽102。每一工件載具104係可釋離地與一要被電鍍的工件銜接成為實體地連接並且電連接,而來與其建立實體和電的連接。 The electroplating machine 100 includes a tank 102 for containing a plating solution. A plurality of workpiece carriers 104 (five shown in FIG. 2) are movable in series and relative to the slot 102. Each workpiece carrier 104 is releasably coupled to a workpiece to be electroplated to be physically and electrically connected to establish a physical and electrical connection therewith.
每一工件載具104係與一對的電源供應器106a、106b譬如電流調節器固定地連接並且電連接。該等電源供應器106a係各藉一各別的滑動觸點112a來與一第一共同陽極108電連接,而可在與其保持電連接時相對於該陽極108相對滑移;且該等電源供應器106b係各藉一各別的滑動觸點112b來與一第二共同陽極110電連接,而可在與其保持電連接時相對於該陽極110相對滑移。故每一對的電源供應器106a、106b係可彼此一起並與它們所實體連接且電連接的工件載具104一起同時地相對於該槽102移動。該電源供應器106a係電連接於該陽極108與該工件載具104之間;且該 電源供應器106b係電連接於該陽極110與該工件載具104之間。眾多個陽極板114(在圖2中係示出六個)被置設於該槽102內並相對於該槽固定。 Each workpiece carrier 104 is fixedly and electrically connected to a pair of power supplies 106a, 106b, such as a current regulator. The power supplies 106a are each electrically coupled to a first common anode 108 by a respective sliding contact 112a, and are relatively slidable relative to the anode 108 when electrically connected thereto; and the power supply The switches 106b are each electrically coupled to a second common anode 110 by a respective sliding contact 112b, and are relatively slidable relative to the anode 110 while being electrically connected thereto. Thus, each pair of power supplies 106a, 106b can be moved together with the workpiece carrier 104 to which they are physically and electrically connected, simultaneously with respect to the slot 102. The power supply 106a is electrically connected between the anode 108 and the workpiece carrier 104; The power supply 106b is electrically connected between the anode 110 and the workpiece carrier 104. A plurality of anode plates 114 (six shown in Figure 2) are disposed within the slot 102 and secured relative to the slot.
該二陽極108、110皆可被接地。或者,該二陽極108、110可被設在一電壓為例如5V。假使需要,該二陽極108、110可各被設在一不同的電壓。 Both of the anodes 108, 110 can be grounded. Alternatively, the two anodes 108, 110 can be placed at a voltage of, for example, 5V. The two anodes 108, 110 can each be set to a different voltage, if desired.
由各該電源供應器106a、106b供應至它們所連接的每一各別工件載具104之電力係可獨立地調整。特別是,該等電源供應器106a、106b可被設為受控的電流模式,而使不論個別的工件載具104和個別的工件之可能不同的電阻如何,該等不同的電源供應器106a、106b皆會被控制成使供應至每一工件載具104(並因此及於由每一工件載具104所帶送的各別工件)之電流係為相同。因電鍍在一工件上的金屬總量主要取決於當在該槽102中電鍍時該工件所用的安培小時之量,故藉著控制全部的電源供應器106a、106b以相同的電流來提供給全部的工件載具104(並因此及於被該等工件載具104帶送的全部工件),則不論個別的工件載具104和個別的工件之可能不同的電阻如何,一更均一且一致的電鍍成果將能被達成。 The power supplied by each of the power supplies 106a, 106b to each of the individual workpiece carriers 104 to which they are connected can be independently adjusted. In particular, the power supplies 106a, 106b can be set to a controlled current mode such that the different power supplies 106a, regardless of the possibly different resistance of the individual workpiece carriers 104 and individual workpieces, 106b will be controlled such that the current supplied to each workpiece carrier 104 (and therefore to the individual workpieces carried by each workpiece carrier 104) is the same. The total amount of metal plated on a workpiece depends primarily on the amount of ampere-hours used by the workpiece when electroplating in the bath 102, and is provided to all by the same current by controlling all of the power supplies 106a, 106b. The workpiece carrier 104 (and thus all of the workpieces carried by the workpiece carriers 104), a more uniform and consistent plating regardless of the possibly different resistance of the individual workpiece carriers 104 and individual workpieces The results will be achieved.
一依據本發明之一第二實施例的垂直式連續電鍍機器之一示意圖係示於圖3中,且概被標示為200。 A schematic diagram of a vertical continuous plating machine in accordance with a second embodiment of the present invention is shown in FIG. 3 and is generally designated 200.
該電鍍機器200包含一槽202用以容裝一電鍍溶液。眾多個工件載具204係可串列通過並相對於該槽202移動。每一工件載具204係可釋離地與一要被電鍍的各別工件 205銜接成為實體地連接並且電連接,而來建立與其的實體連接和電連接。 The electroplating machine 200 includes a tank 202 for containing a plating solution. A plurality of workpiece carriers 204 are traversable and move relative to the slot 202. Each workpiece carrier 204 is releasable and a separate workpiece to be plated The 205 interfaces are physically connected and electrically connected to establish physical and electrical connections thereto.
每一工件載具204係與一對的電源供應器206a、206b譬如電流調節器固定地連接並且電連接。該等電源供應器206a係各藉一各別的滑動觸點212a來與一分段陽極208電連接,而可在與其保持電連接時相對於該分段陽極208相對滑移。該等電源供應器206b係各藉一各別的滑動觸點212b來與一分段陽極210電連接,而能在與其保持電連接時相對於該分段陽極210相對滑移。如此每一對的電源供應器206a、206b係可彼此一起,並與它們所電連接且實體連接的工件載具204一起同時地相對於該槽202移動。該電源供應器206a係電連接於該分段陽極208與工件載具204之間;且該電源供應器206b係電連接於該分段陽極210與工件載具204之間。 Each workpiece carrier 204 is fixedly and electrically connected to a pair of power supplies 206a, 206b, such as a current regulator. The power supplies 206a are each electrically coupled to a segmented anode 208 by a respective sliding contact 212a, and are relatively slidable relative to the segmented anode 208 when in electrical communication therewith. The power supplies 206b are each electrically coupled to a segmented anode 210 by a respective sliding contact 212b that is relatively slipable relative to the segmented anode 210 when in electrical communication therewith. Thus each pair of power supplies 206a, 206b can be moved together with one another and simultaneously with their physically connected and physically connected workpiece carriers 204 relative to the slot 202. The power supply 206a is electrically connected between the segmented anode 208 and the workpiece carrier 204; and the power supply 206b is electrically connected between the segmented anode 210 and the workpiece carrier 204.
如上所述,該等陽極208、210皆是分段的。詳言之,該陽極208係在若干個位置220處分裂,而來形成多數個電分離段222等。故,當該電鍍機器200在操作,且該等工件205通過並在該槽202內移動時,該等電源供應器206a會相對於該陽極208之串列但電分離的各段222移行並連續地與它們電連接;而該等電源供應器206b會相對於該陽極210之串列但電分離的各段226移行並連續地與它們電連接。例如,當與該電源供應器206電連接的工件載具204相對於該電鍍機器200的槽202移動並通過時,該電源供應器206a會移動來連續地與該陽極208之一第一段222,嗣一第二段 222,及再一第三段222電連接,其中該第一、第二和第三段222係一段接一段地縱向串列並且彼此互相電分離。 As noted above, the anodes 208, 210 are all segmented. In particular, the anode 208 is split at a number of locations 220 to form a plurality of electrically separated segments 222 and the like. Thus, when the electroplating machine 200 is in operation and the workpieces 205 pass through and move within the trough 202, the power supplies 206a will travel and continue with respect to the series but electrically separated segments 222 of the anode 208. They are electrically connected to them; and the power supplies 206b are moved relative to the series but electrically separated segments 226 of the anode 210 and are continuously electrically connected thereto. For example, when the workpiece carrier 204 electrically coupled to the power supply 206 moves and passes relative to the slot 202 of the plating machine 200, the power supply 206a will move continuously with one of the first segments 222 of the anode 208. Second paragraph 222, and a further third segment 222 are electrically connected, wherein the first, second, and third segments 222 are longitudinally serially connected one after another and electrically separated from each other.
藉由此一安排,其乃可以獨立地控制該陽極208的各段222之每一段的電壓,而使不同的電鍍效果能被獲得,或不同的產品可被電鍍。類似地,該陽極210係在若干個位置224處分裂,而來形成多數個電分離段226等。藉由此一安排,其乃可以獨立地控制該陽極210的各段226之每一段的電壓,而使不同的電鍍效果能被獲得,或不同的產品可被電鍍。該等電源供應器206a、206b的各別陰極側係藉一各別的滑動觸點229電連接於一共同導體230,其係接地的,因此該等電源供應器206a、206b的各別陰極側(以及被該等工件載具204帶送的工件205等)亦會彼此互相連接。該接地的共同導體230可為該電鍍機器200之一接地的框架。 With this arrangement, it is possible to independently control the voltage of each segment of each segment 222 of the anode 208 so that different plating effects can be obtained, or different products can be plated. Similarly, the anode 210 is split at a number of locations 224 to form a plurality of electrical separation sections 226 and the like. With this arrangement, it is possible to independently control the voltage of each segment of each segment 226 of the anode 210 so that different plating effects can be obtained, or different products can be plated. The respective cathode sides of the power supplies 206a, 206b are electrically connected to a common conductor 230 by a respective sliding contact 229, which is grounded, so that the respective cathode sides of the power supplies 206a, 206b (and the workpieces 205 and the like carried by the workpiece carriers 204) are also connected to each other. The grounded common conductor 230 can be a frame to which one of the electroplating machines 200 is grounded.
由每一該等電源供應器206a、206b供應至每一個它們所連接的各別工件載具204之電力係可獨立地調整。特別是,該等電源供應器206a、206b可被設為受控電流模式,因此,不論個別的工件載具204和個別的工件之可能不同的電阻如何,與該陽極210之同一段226連接的不同電源供應器206a、206b等皆會被控制,而使供應至每一個該等工件載具204(並因此及於被各工件載具204所帶送的各別工件)之電流係為相同。類似地,與該陽極208之同一段222連接的不同電源供應器206a、206b等皆會被控制,而使供應至每一個該等工件載具204(並因此及於被各工件載具204所 帶送的各別工件)之電流係為相同。因電鍍在一工件上的金屬總量主要取決於該工件當在該槽202內電鍍時所用的安培小時之量,故藉著控制全部的電源供應器206a、206b來在各別的陽極208、210之每一各別段222、226中以相同的電流提供給全部的工件載具204(及被該等工件載具204帶送的全部工件),則不論該等個別的工件載具204和個別的工件之可能不同的電阻如何,一更均一且一致的電鍍成果將能被達成。 The power supplied by each of the power supplies 206a, 206b to each of the individual workpiece carriers 204 to which they are connected can be independently adjusted. In particular, the power supplies 206a, 206b can be set to a controlled current mode, thus, regardless of the possibly different resistance of the individual workpiece carriers 204 and individual workpieces, connected to the same segment 226 of the anode 210. The different power supplies 206a, 206b, etc. are controlled such that the current supplied to each of the workpiece carriers 204 (and therefore to the individual workpieces carried by the workpiece carriers 204) is the same. Similarly, different power supplies 206a, 206b, etc., connected to the same section 222 of the anode 208 are controlled to be supplied to each of the workpiece carriers 204 (and thus to each workpiece carrier 204) The currents of the individual workpieces sent are the same. The total amount of metal plated on a workpiece is primarily determined by the amount of ampere-hours used by the workpiece when electroplating in the bath 202, by controlling all of the power supplies 206a, 206b at the respective anodes 208, Each of the individual segments 222, 226 of 210 is supplied to all of the workpiece carriers 204 (and all of the workpieces carried by the workpiece carriers 204) at the same current, regardless of the individual workpiece carriers 204 and individual A more uniform and consistent plating result can be achieved with the possible different resistance of the workpiece.
藉著將該等電源供應器206a、206b的各別陰極側電連接於該接地的共同導體230(譬如該機器200之接地的框架),通過該等工件載具204所帶送的工件205之電壓係為相同的,故會減少邊緣效應。此外,在既有的電鍍機器中,一大電流會沿一共同的陰極導體通過,其會造成該等工件205間之更多的電位差。另一方面,在依據本發明的電鍍機器200中,因該等電源供應器206a、206b會局部地產生電力,故不需要通過一大電流,且此會更減少該等工件205之間的電位差。 The workpieces 205 carried by the workpiece carriers 204 are electrically connected to the grounded common conductors 230 (such as the grounded frame of the machine 200) by the respective cathode sides of the power supplies 206a, 206b. The voltage system is the same, so the edge effect is reduced. Moreover, in existing electroplating machines, a large current will pass along a common cathode conductor, which will cause more potential differences between the workpieces 205. On the other hand, in the electroplating machine 200 according to the present invention, since the power supplies 206a, 206b generate electricity locally, there is no need to pass a large current, and this further reduces the potential difference between the workpieces 205. .
應請瞭解以上僅為本發明可被實施的舉例說明,且各種修正及/或變化可被作成而不超出本發明的精神。 The above description is only illustrative of the invention, and various modifications and/or changes may be made without departing from the spirit of the invention.
亦請瞭解本發明的某些特徵,其係為了清楚之故而被描述在分開的實施例之內容中者,可被組合提供在單一實施例中。相反地,本發明的各種不同特徵,其係為了簡要之故而被描述在單一實施例的內容中者,亦可被分開地提供,或以任何適當的次組合來提供。 The features of the present invention are also described in the context of separate embodiments for clarity and may be combined in a single embodiment. Conversely, various features of the invention are described in the <RTI ID=0.0>>
100‧‧‧電鍍機器 100‧‧‧Electroplating machine
102‧‧‧槽 102‧‧‧ slots
104‧‧‧工件載具 104‧‧‧Workpiece carrier
106a、106b‧‧‧電源供應器 106a, 106b‧‧‧Power supply
108‧‧‧第一共同陽極 108‧‧‧First common anode
110‧‧‧第二共同陽極 110‧‧‧Second common anode
112a、112b‧‧‧滑動觸點 112a, 112b‧‧‧ sliding contacts
114‧‧‧陽極板 114‧‧‧Anode plate
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JP2017061071A JP6903459B2 (en) | 2015-10-20 | 2017-03-27 | Electroplating equipment and electroplating method |
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JPS4724684Y1 (en) * | 1968-11-26 | 1972-08-03 | ||
JPS5354131A (en) * | 1976-10-28 | 1978-05-17 | Sansha Electric Mfg Co Ltd | Automatic plating treatment apparatus |
JPS53128546A (en) * | 1977-04-15 | 1978-11-09 | Sansha Electric Mfg Co Ltd | Automatic plating treatment device |
JPS58100697A (en) * | 1981-12-10 | 1983-06-15 | Fujitsu Ltd | Plating method |
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