TW201707970A - Wound layered film body and method for producing the same - Google Patents

Wound layered film body and method for producing the same Download PDF

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TW201707970A
TW201707970A TW105105595A TW105105595A TW201707970A TW 201707970 A TW201707970 A TW 201707970A TW 105105595 A TW105105595 A TW 105105595A TW 105105595 A TW105105595 A TW 105105595A TW 201707970 A TW201707970 A TW 201707970A
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film
polymer
layer
piezoelectric
functional layer
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谷本一洋
小島一記
北河敏久
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三井化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/255Polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/09Forming piezoelectric or electrostrictive materials
    • H10N30/098Forming organic materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • H10N30/857Macromolecular compositions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Abstract

A wound layered film body obtained by rolling a layered film, the layered film including: a piezoelectric polymer film including a helical chiral polymer that has a weight-average molecular weight of from 50,000 to 1,000,000 and that has optical activity, the piezoelectric polymer film having a degree of crystallinity obtained by the DSC method of from 20% to 80%, and a product of the degree of crystallinity and a normalized molecular orientation MORc is from 40 to 700 in a case in which a standard thickness of the piezoelectric polymer film, which is measured with a microwave transmission molecular orientation meter, is made to be 50 [mu]m; and a functional layer (X) provided on at least one of the principal planes of the piezoelectric polymer film, wherein the piezoelectric polymer film obtained by removing the functional layer (X) from the layered film has a rate of dimensional change after heating for 30 minutes at 100 DEG C of 1.0% or less in the MD direction.

Description

膜捲層體及其製造方法Film roll layer and manufacturing method thereof

本發明是有關於一種具有高分子壓電膜的膜捲層體及其製造方法。The present invention relates to a film reel body having a polymer piezoelectric film and a method of manufacturing the same.

近年來,報告有使用具有光學活性的脂肪族系聚酯(例如聚乳酸系高分子)的高分子壓電材料。 例如,揭示有一種藉由對聚乳酸的成型物進行延伸處理,而於常溫下顯示出10 pC/N左右的壓電率的高分子壓電材料(例如,參照專利文獻1)。 另外,亦報告有為了使聚乳酸結晶變成高配向,藉由被稱為鍛造法的特殊的配向方法而達成18 pC/N左右的高壓電性(例如,參照專利文獻2)。 專利文獻1:日本專利特開平5-152638號公報 專利文獻2:日本專利特開2005-213376號公報In recent years, a polymer piezoelectric material using an optically active aliphatic polyester (for example, a polylactic acid-based polymer) has been reported. For example, a polymer piezoelectric material exhibiting a piezoelectric modulus of about 10 pC/N at room temperature by stretching a molded product of polylactic acid is disclosed (for example, see Patent Document 1). In addition, high-voltage electrical properties of about 18 pC/N are achieved by a special alignment method called a forging method in order to make the polylactic acid crystals have a high alignment (see, for example, Patent Document 2). Patent Document 1: Japanese Patent Laid-Open No. Hei 5-152638. Patent Document 2: Japanese Patent Laid-Open Publication No. 2005-213376

[發明所欲解決之課題] 然而,有時以高分子壓電體的保護、或高分子壓電體與其他構件(高分子膜、玻璃、電極等)的接著等為目的,而於高分子壓電體上設置至少一部分與高分子壓電體接觸的層。作為該層,有時使用接著層。 另外,當利用高分子壓電體來實際製造感測器或致動器作為元件時,於工業上,就生產性的觀點而言,較佳為採用利用輥對輥(roll to roll)的連續製程。因此,必須供給以長條捲取高分子壓電體而成的回捲體(輥體)。此時,若高分子壓電體的輥體具備接著層,則於後續步驟中無需形成接著層,可實現步驟的簡化。進而,可於形成有接著層的狀態下採用利用輥對輥的連續製程,因此至製造元件為止的總的生產性提昇。 此處,於輥對輥的連續製程中,必須使輥間的高分子壓電體中不產生彎曲,朝向步驟的前進方向(縱向(Machine Direction,MD)方向)而於高分子壓電體中產生張力。進而,含有聚乳酸等脂肪族系聚酯(螺旋手性高分子)的高分子壓電體的耐熱性低,若於將接著層形成在高分子壓電體上的步驟中受熱,則有時因張力而於高分子壓電體中產生伸展,使高分子壓電體的尺寸變化率惡化,或因熱而導致聚乳酸等脂肪族系聚酯分解,使高分子壓電體的耐濕熱性惡化。 另外,為了使高分子壓電體顯現壓電性,較佳為使分子鏈於一個方向上進行配向,但存在容易於配向方向上撕裂這一問題。 因此,當欲利用尺寸變化率惡化、且分子鏈主要於一個方向上進行配向的高分子壓電體作為元件時,存在因高分子壓電體與進行積層的其他構件的收縮差而於高分子壓電體中產生裂紋之虞。[Problems to be Solved by the Invention] However, in order to protect the polymer piezoelectric body or the polymer piezoelectric body and other members (polymer film, glass, electrode, etc.), the polymer may be used. At least a portion of the piezoelectric body is placed in contact with the piezoelectric polymer. As this layer, an adhesive layer is sometimes used. Further, when a polymer piezoelectric body is used to actually manufacture a sensor or an actuator as an element, industrially, from the viewpoint of productivity, it is preferable to employ a continuous roll to roll. Process. Therefore, it is necessary to supply a rewinding body (roller body) obtained by winding a polymer piezoelectric body in a long strip. At this time, if the roll body of the polymer piezoelectric body is provided with the adhesive layer, it is not necessary to form an adhesive layer in the subsequent step, and the simplification of the steps can be achieved. Further, since a continuous process using a roll-to-roller can be employed in a state in which an adhesive layer is formed, the total productivity up to the production of the component is improved. Here, in the continuous process of the roll-to-roll, it is necessary to prevent bending of the polymer piezoelectric body between the rolls, and to advance in the step (Machine Direction (MD) direction) in the polymer piezoelectric body. Produces tension. Further, the polymer piezoelectric body containing an aliphatic polyester (helical chiral polymer) such as polylactic acid has low heat resistance, and may be heated in the step of forming the adhesive layer on the polymer piezoelectric body. Stretching occurs in the polymer piezoelectric body due to the tension, the dimensional change rate of the polymer piezoelectric body is deteriorated, or the aliphatic polyester such as polylactic acid is decomposed by heat, and the heat resistance of the polymer piezoelectric body is deteriorated. deterioration. Further, in order to cause the piezoelectric polymer to exhibit piezoelectricity, it is preferred that the molecular chains are aligned in one direction, but there is a problem in that it is easily torn in the alignment direction. Therefore, when a polymer piezoelectric body in which the dimensional change rate is deteriorated and the molecular chain is aligned mainly in one direction is used as the element, there is a difference in shrinkage between the polymer piezoelectric body and another member in which the layer is laminated. Cracks in the piezoelectric body.

本發明者進行努力研究的結果,發現於將具有含有聚酯(螺旋手性高分子)的高分子壓電體與接著層等功能層的積層膜捲繞成輥狀而成的膜捲層體中,藉由減小含有螺旋手性高分子的高分子壓電體的尺寸變化率,進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜的耐濕熱性提昇。As a result of intensive research, the present inventors have found that a film-rolled layer obtained by winding a laminated film having a polymer layer containing a polyester (helical chiral polymer) and a functional layer such as an adhesive layer into a roll shape By reducing the dimensional change rate of the polymer piezoelectric body containing the helical chiral polymer, the occurrence of cracks in the piezoelectric polymer film during heating is suppressed, and the heat resistance of the polymer piezoelectric film is suppressed. Sexual improvement.

本發明是鑒於以上所述而完成的發明,其目的在於提供一種進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜的耐濕熱性優異的膜捲層體及其製造方法。 [解決課題之手段]The present invention has been made in view of the above, and it is an object of the invention to provide a film roll layer which is excellent in moisture heat resistance of a polymer piezoelectric film and which suppresses generation of cracks in a piezoelectric polymer film during heating. Body and its manufacturing method. [Means for solving the problem]

用以達成所述課題的具體手段例如如以下般。 <1> 一種膜捲層體,其是將積層膜捲繞成輥狀而成,所述積層膜包括:高分子壓電膜,包含重量平均分子量為5萬~100萬的具有光學活性的螺旋手性高分子(A),藉由示差掃描熱量(Differential Scanning Calorimetry,DSC)法所獲得的結晶度為20%~80%,且將藉由微波透過型分子配向計所測定的基準厚度設為50 μm時的標準化分子配向MORc與所述結晶度的積為40~700;以及功能層(X),設置於所述高分子壓電膜的至少一個主面上;且於100℃下對自所述積層膜中去除所述功能層(X)所獲得的所述高分子壓電膜進行30分鐘加熱時的尺寸變化率在MD方向上為1.0%以下。 <2> 如<1>所述的膜捲層體,其中所述功能層(X)的酸價為10 mgKOH/g以下。 <3> 如<1>或<2>所述的膜捲層體,其中所述功能層(X)為接著層。 <4> 如<1>至<3>中任一項所述的膜捲層體,其中所述功能層(X)的酸價為0.01 mgKOH/g以上。 <5> 如<1>至<4>中任一項所述的膜捲層體,其中所述功能層(X)中的總氮量為0.05質量%~10質量%。 <6> 如<1>至<5>中任一項所述的膜捲層體,其中所述功能層(X)與所述高分子壓電膜接觸。 <7> 如<1>至<6>中任一項所述的膜捲層體,其中所述積層膜在所述高分子壓電膜與所述功能層(X)之間具有折射率調整層、易接著層、硬塗層、抗靜電層、及抗黏連層的至少一種層。 <8> 如<1>至<7>中任一項所述的膜捲層體,其中所述高分子壓電膜相對於所述螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~60000的穩定劑(B)0.01質量份~10質量份。 <9> 如<8>所述的膜捲層體,其中所述穩定劑(B)包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~900的穩定劑(B1),及於1分子內具有兩個以上的選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為1000~60000的穩定劑(B2)。 <10> 如<1>至<9>中任一項所述的膜捲層體,其中所述高分子壓電膜的相對於可見光線的內部霧度為50%以下,且於25℃下藉由應力-電荷法所測定的壓電常數d14 為1 pC/N以上。 <11> 如<1>至<10>中任一項所述的膜捲層體,其中所述高分子壓電膜的相對於可見光線的內部霧度為13%以下,且相對於所述螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~60000的穩定劑(B)0.01質量份~2.8質量份。 <12> 如<1>至<11>中任一項所述的膜捲層體,其中所述螺旋手性高分子(A)為具有包含由下述式(1)所表示的重複單元的主鏈的聚乳酸系高分子。Specific means for achieving the above problems are as follows, for example. <1> A film roll layer obtained by winding a laminated film into a roll shape, the laminated film comprising: a polymer piezoelectric film comprising an optically active spiral having a weight average molecular weight of 50,000 to 1,000,000 The chiral polymer (A) has a crystallinity of 20% to 80% obtained by a differential scanning calorimetry (DSC) method, and a reference thickness measured by a microwave transmission type molecular alignment meter is set. The product of the normalized molecular alignment MORc at 50 μm and the crystallinity is 40 to 700; and the functional layer (X) is disposed on at least one main surface of the piezoelectric polymer film; and is self-contained at 100 ° C The dimensional change rate of the piezoelectric polymer film obtained by removing the functional layer (X) in the laminated film after heating for 30 minutes is 1.0% or less in the MD direction. <2> The film-rolled layer body according to <1>, wherein the functional layer (X) has an acid value of 10 mgKOH/g or less. <3> The film reel body according to <1> or <2>, wherein the functional layer (X) is an adhesive layer. The film roll layer body according to any one of <1> to <3> wherein the functional layer (X) has an acid value of 0.01 mgKOH/g or more. The film roll layer body according to any one of <1> to <4> wherein the total nitrogen amount in the functional layer (X) is 0.05% by mass to 10% by mass. The film roll layer body according to any one of <1> to <5> wherein the functional layer (X) is in contact with the polymer piezoelectric film. The film roll layer body according to any one of <1> to <6> wherein the laminated film has a refractive index adjustment between the polymer piezoelectric film and the functional layer (X) At least one layer of a layer, an easy adhesion layer, a hard coat layer, an antistatic layer, and an anti-blocking layer. The film-rolled layer body according to any one of <1> to <7> wherein the polymer piezoelectric film contains 100 parts by mass of the helical chiral polymer (A). The stabilizer (B) having a weight average molecular weight of from 200 to 60,000 to 0.01 parts by mass to 10 parts by mass per one or more functional groups in the group consisting of a free carboethylene imino group, an epoxy group, and an isocyanate group. <9> The film reel body according to <8>, wherein the stabilizer (B) comprises one or more selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group. a stabilizer (B1) having a functional group and a weight average molecular weight of 200 to 900, and having two or more groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group in one molecule A stabilizer (B2) having one or more functional groups and having a weight average molecular weight of 1,000 to 60,000. The film roll layer body according to any one of <1> to <9> wherein the polymer piezoelectric film has an internal haze of 50% or less with respect to visible light, and is at 25 ° C. The piezoelectric constant d 14 measured by the stress-charge method is 1 pC/N or more. The film roll layer body according to any one of <1> to <10> wherein the polymer piezoelectric film has an internal haze of 13% or less with respect to visible light, and is relative to the 100 parts by mass of the helical chiral polymer (A), comprising one or more functional groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group, and having a weight average molecular weight of 200 to 60,000 The stabilizer (B) is 0.01 parts by mass to 2.8 parts by mass. The film-rolled layer body according to any one of <1>, wherein the helical chiral polymer (A) has a repeating unit represented by the following formula (1) A polylactic acid-based polymer of the main chain.

[化1] [Chemical 1]

<13> 如<1>至<12>中任一項所述的膜捲層體,其中所述螺旋手性高分子(A)的光學純度為95.00%ee以上。 <14> 如<1>至<13>中任一項所述的膜捲層體,其中所述高分子壓電膜中的所述螺旋手性高分子(A)的含量為80質量%以上。 <15> 如<1>至<14>中任一項所述的膜捲層體,其中所述積層膜更包括配置在自所述功能層(X)觀察而與配置有所述高分子壓電膜之側相反的一側的脫模膜。 <16> 如<15>所述的膜捲層體,其中所述積層膜的MD方向的長度為10 m以上。The film-rolled layer body according to any one of <1> to <12> wherein the optical purity of the helical chiral polymer (A) is 95.00% or more. The film roll layer body according to any one of the above aspects, wherein the content of the helical chiral polymer (A) in the polymer piezoelectric film is 80% by mass or more . The film roll layer body according to any one of <1> to <14> wherein the laminated film further includes a configuration in which the polymer pressure is observed from the functional layer (X) A release film on the opposite side of the side of the electric film. <16> The film-rolled layer body according to <15>, wherein the laminated film has a length in the MD direction of 10 m or more.

<17> 一種膜捲層體的製造方法,其是製造如<15>或<16>所述的膜捲層體的方法,其包括:將用以形成所述功能層(X)的功能層形成劑賦予至所述脫模膜的主面上來形成所述功能層(X)的步驟;在自所述功能層(X)觀察而與配置有所述脫模膜之側相反的一側,將所述功能層(X)與所述高分子壓電膜貼合來形成所述積層膜的步驟;以及將所形成的所述積層膜捲繞成輥狀的步驟。 <18> 一種膜捲層體的製造方法,其是製造如<15>或<16>所述的膜捲層體的方法,其包括:將用以形成所述功能層(X)的功能層形成劑塗佈於所述高分子壓電膜的至少一個主面上,並以90℃以下的溫度使所塗佈的所述功能層形成劑乾燥來形成功能層(X)的步驟;在自所述功能層(X)觀察而與配置有所述高分子壓電膜之側相反的一側,將所述功能層(X)與所述脫模膜貼合來形成所述積層膜的步驟;以及將所形成的所述積層膜捲繞成輥狀的步驟。 <19> 如<17>或<18>所述的膜捲層體的製造方法,其中所述功能層(X)為接著層,所述功能層形成劑為接著劑。 [發明的效果]<17> A method of producing a film roll layer, which is a method of producing a film roll layer body according to <15> or <16>, comprising: a functional layer to form the functional layer (X) a step of forming a forming agent on the main surface of the release film to form the functional layer (X); on a side opposite to the side on which the release film is disposed, as viewed from the functional layer (X), a step of bonding the functional layer (X) to the polymer piezoelectric film to form the laminated film, and a step of winding the formed laminated film into a roll shape. <18> A method of producing a film roll layer, which is a method of producing a film roll layer body according to <15> or <16>, comprising: a functional layer to form the functional layer (X) a step of applying a forming agent to at least one main surface of the piezoelectric polymer film and drying the applied functional layer forming agent at a temperature of 90 ° C or lower to form a functional layer (X); a step of forming the laminated film by bonding the functional layer (X) and the release film to the side opposite to the side on which the piezoelectric film is disposed, as viewed from the functional layer (X) And a step of winding the formed laminated film into a roll shape. <19> The method for producing a film-rolled layer body according to <18>, wherein the functional layer (X) is an adhesive layer, and the functional layer forming agent is an adhesive. [Effects of the Invention]

根據本發明,可提供一種進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜的耐濕熱性優異的膜捲層體及其製造方法。According to the present invention, it is possible to provide a film roll layer body in which generation of cracks in the piezoelectric polymer film during heating is suppressed, and which is excellent in moisture heat resistance of the polymer piezoelectric film, and a method for producing the same.

以下,對本發明的膜捲層體的一實施形態進行說明。 於本說明書中,使用「~」所表示的數值範圍是指包含「~」的前後所記載的數值作為下限值及上限值的範圍。 另外,於本說明書中,「膜」是不僅包含通常被稱為「膜」者,亦包含通常被稱為「片」者的概念。 另外,於本說明書中,所謂「(甲基)丙烯酸基」,表示丙烯酸基及甲基丙烯酸基的至少一者。Hereinafter, an embodiment of the film wound layer body of the present invention will be described. In the present specification, the numerical range represented by "~" means a range including the numerical values described before and after "~" as the lower limit and the upper limit. In addition, in the present specification, the "film" includes not only a person generally referred to as a "film" but also a concept commonly referred to as a "sheet". In the present specification, the "(meth)acrylic group" means at least one of an acryl group and a methacryl group.

另外,於本說明書中,所謂膜面,是指膜的主面。此處,所謂「主面」,是指高分子壓電膜的表面之中,面積最大的面。本發明中所使用的高分子壓電膜亦可具有兩個以上的主面。例如,當高分子壓電膜分別具有各兩面的10 mm×0.3 mm見方的面A、3 mm×0.3 mm見方的面B、及10 mm×3 mm見方的面C時,該高分子壓電膜的主面為面C,並具有兩個主面。 再者,於本說明書中,所謂「MD方向」,是指膜的前進方向(Machine Direction),所謂「TD方向」,是指與所述MD方向正交、且與膜的主面平行的方向(Transverse Direction)。In addition, in this specification, a film surface means the main surface of a film. Here, the "main surface" means a surface having the largest area among the surfaces of the polymer piezoelectric film. The piezoelectric polymer film used in the present invention may have two or more main faces. For example, when the polymer piezoelectric film has a face A of 10 mm × 0.3 mm square on each side, a face B of 3 mm × 0.3 mm square, and a face C of 10 mm × 3 mm square, the piezoelectric polymer The main face of the film is face C and has two major faces. In the present specification, the "MD direction" means the direction of the film (Machine Direction), and the "TD direction" means the direction orthogonal to the MD direction and parallel to the main surface of the film. (Transverse Direction).

<膜捲層體> 本發明的一實施形態的膜捲層體是將積層膜捲繞成輥狀而成,所述積層膜包括:高分子壓電膜,包含重量平均分子量為5萬~100萬的具有光學活性的螺旋手性高分子(A),藉由DSC法所獲得的結晶度為20%~80%,且將藉由微波透過型分子配向計所測定的基準厚度設為50 μm時的標準化分子配向MORc與所述結晶度的積為40~700;以及功能層(X),設置於所述高分子壓電膜的至少一個主面上;且於100℃下對自所述積層膜中去除所述功能層(X)所獲得的所述高分子壓電膜進行30分鐘加熱時的尺寸變化率在MD方向上為1.0%以下。<Film roll layer> The film roll layer body according to the embodiment of the present invention is obtained by winding a laminated film into a roll shape, and the build-up film includes a polymer piezoelectric film containing a weight average molecular weight of 50,000 to 100. The optically active helical chiral polymer (A) has a crystallinity of 20% to 80% by the DSC method and a reference thickness of 50 μm as measured by a microwave transmission type molecular alignment meter. a product of the normalized molecular alignment MORc and the crystallinity of 40 to 700; and a functional layer (X) disposed on at least one main surface of the piezoelectric polymer film; and at 100 ° C The dimensional change rate of the polymer piezoelectric film obtained by removing the functional layer (X) in the laminated film after heating for 30 minutes is 1.0% or less in the MD direction.

本實施形態的膜捲層體是將具有高分子壓電膜與設置於高分子壓電膜的至少一個主面上的功能層(X)的積層膜捲繞成輥狀而成,且於100℃下對自積層膜中去除功能層(X)所獲得的高分子壓電膜進行30分鐘加熱時的尺寸變化率在MD方向上為1.0%以下。因此,例如當使用膜捲層體來形成積層體時,進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜中所含有的螺旋手性高分子(A)的分解得到抑制,高分子壓電膜的耐濕熱性優異。進而,於100℃下對所述高分子壓電膜進行30分鐘加熱時的尺寸變化率在MD方向上為1.0%以下,因此尺寸穩定性優異,當組裝入揚聲器或觸控面板等元件等中來使用時,尺寸難以變化,元件等的誤操作的產生得到抑制。The film roll layer of the present embodiment is obtained by winding a laminated film having a polymer piezoelectric film and a functional layer (X) provided on at least one main surface of the polymer piezoelectric film in a roll shape, and is 100 The dimensional change rate when the polymer piezoelectric film obtained by removing the functional layer (X) from the laminated film was heated for 30 minutes at a temperature of ° C was 1.0% or less in the MD direction. Therefore, for example, when a laminated body is formed using a film roll layer, generation of cracks in the piezoelectric polymer film during heating is suppressed, and a helical chiral polymer contained in the polymer piezoelectric film (A) The decomposition of the polymer film is suppressed, and the polymer piezoelectric film is excellent in moist heat resistance. Further, when the polymer piezoelectric film is heated at 100 ° C for 30 minutes, the dimensional change ratio is 1.0% or less in the MD direction, so that the dimensional stability is excellent, and it is incorporated in a device such as a speaker or a touch panel. When used, the size is hard to change, and the occurrence of malfunction of components and the like is suppressed.

另外,本實施形態的膜捲層體具有高分子壓電膜,該高分子壓電膜包含重量平均分子量(Mw)為5萬~100萬的具有光學活性的螺旋手性高分子(A)(以下,亦稱為「螺旋手性高分子(A)」)。藉由螺旋手性高分子(A)的重量平均分子量為5萬以上,將螺旋手性高分子(A)製成成形體時的機械強度提昇。藉由螺旋手性高分子(A)的重量平均分子量為100萬以下,藉由成形(例如擠出成形)來獲得高分子壓電膜時的成形性提昇。Further, the film wound layer body of the present embodiment has a polymer piezoelectric film comprising an optically active helical chiral polymer (A) having a weight average molecular weight (Mw) of 50,000 to 1,000,000 ( Hereinafter, it is also referred to as "spiral chiral polymer (A)"). When the weight average molecular weight of the helical chiral polymer (A) is 50,000 or more, the mechanical strength when the helical chiral polymer (A) is formed into a molded body is improved. When the weight average molecular weight of the helical chiral polymer (A) is 1,000,000 or less, the moldability of the polymer piezoelectric film is improved by molding (for example, extrusion molding).

高分子壓電膜的藉由DSC法所獲得的結晶度為20%~80%。因此,高分子壓電膜的壓電性、透明性及縱裂強度(對於特定方向的撕裂強度)的平衡良好,另外,當使高分子壓電膜進行延伸時,難以產生白化或斷裂而容易製造。 更詳細而言,藉由結晶度為20%以上,而將高分子壓電膜的壓電性維持得高,藉由結晶度為80%以下,而可抑制高分子壓電膜的縱裂強度及透明性下降。The crystallinity of the piezoelectric polymer film obtained by the DSC method is 20% to 80%. Therefore, the piezoelectric piezoelectric film has a good balance between piezoelectricity, transparency, and longitudinal crack strength (tear strength in a specific direction), and when the piezoelectric polymer film is stretched, it is difficult to cause whitening or cracking. Easy to manufacture. More specifically, the piezoelectricity of the piezoelectric polymer film is maintained high by the crystallinity of 20% or more, and the longitudinal crack strength of the piezoelectric polymer film can be suppressed by the crystallinity of 80% or less. And transparency has declined.

高分子壓電膜的將藉由微波透過型分子配向計所測定的基準厚度設為50 μm時的標準化分子配向MORc與結晶度的積為40~700。藉由調整成該範圍,高分子壓電膜的壓電性與透明性的平衡良好,且尺寸穩定性亦高,縱裂強度的下降得到抑制。In the piezoelectric polymer film, the product of the normalized molecular alignment MORc and the crystallinity when the reference thickness measured by the microwave transmission type molecular alignment meter is 50 μm is 40 to 700. By adjusting to this range, the piezoelectric piezoelectric film has a good balance between piezoelectricity and transparency, and also has high dimensional stability, and the decrease in longitudinal crack strength is suppressed.

[高分子壓電膜] 本實施形態的膜捲層體包含具有光學活性的螺旋手性高分子(A),藉由DSC法所獲得的結晶度為20%~80%,且將藉由微波透過型分子配向計所測定的基準厚度設為50 μm時的標準化分子配向MORc與所述結晶度的積為40~700。 以下,對高分子壓電膜的物性、高分子壓電膜中所含有的成分等進行詳細說明。[Polymer piezoelectric film] The film wound layer body of the present embodiment contains an optically active helical chiral polymer (A), and the crystallinity obtained by the DSC method is 20% to 80%, and will be microwaved. The product of the normalized molecular alignment MORc and the crystallinity when the reference thickness measured by the transmission type molecular alignment meter is 50 μm is 40 to 700. Hereinafter, the physical properties of the piezoelectric polymer film, the components contained in the piezoelectric polymer film, and the like will be described in detail.

[具有光學活性的螺旋手性高分子(A)] 本實施形態中所使用的高分子壓電膜包含具有光學活性的螺旋手性高分子(A)。所謂具有光學活性的螺旋手性高分子(A),是指分子結構為螺旋結構的具有分子光學活性、重量平均分子量為5萬~100萬的高分子。 作為螺旋手性高分子(A),例如可列舉:多肽、纖維素、纖維素衍生物、聚乳酸系高分子、聚環氧丙烷、聚(β-羥基丁酸)等。作為所述多肽,例如可列舉:聚(戊二酸γ-苄基)、聚(戊二酸γ-甲基)等。作為所述纖維素衍生物,例如可列舉:乙酸纖維素、氰基乙基纖維素等。[The optically active helical chiral polymer (A)] The piezoelectric polymer film used in the present embodiment contains an optically active helical chiral polymer (A). The optically active helical chiral polymer (A) refers to a polymer having a molecular structure of a helical structure and having a molecular optical activity and a weight average molecular weight of 50,000 to 1,000,000. Examples of the helical chiral polymer (A) include a polypeptide, cellulose, a cellulose derivative, a polylactic acid-based polymer, polypropylene oxide, and poly(β-hydroxybutyric acid). Examples of the polypeptide include poly(glutaric acid γ-benzyl), poly(glutaric acid γ-methyl), and the like. Examples of the cellulose derivative include cellulose acetate and cyanoethyl cellulose.

就提昇高分子壓電膜的壓電性的觀點而言,螺旋手性高分子(A)的光學純度較佳為95.00%ee以上,更佳為97.00%ee以上,進而更佳為99.00%ee以上,特佳為99.99%ee以上。理想的是100.00%ee。可認為藉由將螺旋手性高分子(A)的光學純度設為所述範圍,顯現壓電性的高分子結晶的堆積性變高,其結果,壓電性變高。The optical purity of the helical chiral polymer (A) is preferably 95.00% ee or more, more preferably 97.00% ee or more, and still more preferably 99.00% ee from the viewpoint of improving the piezoelectricity of the piezoelectric polymer film. Above, it is particularly good at 99.99% ee or more. Ideally 100.00% ee. When the optical purity of the helical chiral polymer (A) is within the above range, the deposition property of the piezoelectric polymer crystal is increased, and as a result, the piezoelectricity is high.

於本實施形態中,螺旋手性高分子(A)的光學純度是藉由下述式所算出的值。   光學純度(%ee)=100×|L體量-D體量|/(L體量+D體量)   即,將『「螺旋手性高分子(A)的L體的量[質量%]與螺旋手性高分子(A)的D體的量[質量%]的量差(絕對值)」除以(相除)「螺旋手性高分子(A)的L體的量[質量%]與螺旋手性高分子(A)的D體的量[質量%]的合計量」所得的數值』乘以(相乘)『100』所得的值設為光學純度。In the present embodiment, the optical purity of the helical chiral polymer (A) is a value calculated by the following formula. Optical purity (%ee)=100×|L volume-D volume|/(L body mass + D volume) That is, "the amount of the L-body of the helical chiral polymer (A) [% by mass] The amount (absolute value) of the amount (% by mass) of the D body of the helical chiral polymer (A) is divided by (divisible) "the amount of the L body of the helical chiral polymer (A) [% by mass] The value obtained by multiplying (multiplied) "100" by the value obtained by the sum of the amounts (% by mass) of the D body of the helical chiral polymer (A) is set to optical purity.

再者,螺旋手性高分子(A)的L體的量[質量%]與螺旋手性高分子(A)的D體的量[質量%]使用藉由利用高速液相層析法(High Performance Liquid Chromatography,HPLC)的方法所獲得的值。具體的測定的詳細情況將後述。In addition, the amount [% by mass] of the L body of the helical chiral polymer (A) and the amount of the D body of the helical chiral polymer (A) [% by mass] are used by using high-speed liquid chromatography (High). The value obtained by the method of Performance Liquid Chromatography, HPLC). The details of the specific measurement will be described later.

以上的螺旋手性高分子(A)之中,就提高光學純度、提昇壓電性的觀點而言,較佳為具有包含由下述式(1)所表示的重複單元的主鏈的高分子。Among the above-mentioned helical chiral polymers (A), a polymer having a main chain including a repeating unit represented by the following formula (1) is preferred from the viewpoint of improving optical purity and improving piezoelectricity. .

[化2] [Chemical 2]

作為將由所述式(1)所表示的重複單元作為主鏈的化合物,可列舉聚乳酸系高分子。其中,較佳為聚乳酸,最佳為L-乳酸的均聚物(聚左旋乳酸(Poly-L-Lactic-Acid,PLLA))或D-乳酸的均聚物(聚右旋乳酸(Poly-D-Lactic-Acid,PDLA))。A polylactic acid-based polymer is exemplified as the compound having a repeating unit represented by the above formula (1) as a main chain. Among them, polylactic acid is preferred, and a homopolymer of L-lactic acid (Poly-L-Lactic-Acid (PLLA)) or a homopolymer of D-lactic acid (poly-L-lactic acid (Poly-) is preferred. D-Lactic-Acid, PDLA)).

所述聚乳酸系高分子是指「聚乳酸」、「L-乳酸或D-乳酸與可進行共聚的多官能性化合物的共聚物」、或兩者的混合物。已知所述「聚乳酸」是乳酸藉由酯鍵而進行聚合、且長長地連接而成的高分子,可藉由經由乳酸交酯(lactide)的乳酸交酯法,於溶媒中且在減壓下對乳酸進行加熱,一面去除水一面進行聚合的直接聚合法等來製造。作為所述「聚乳酸」,可列舉:L-乳酸的均聚物、D-乳酸的均聚物、包含L-乳酸及D-乳酸的至少一者的聚合體的嵌段共聚物、包含L-乳酸及D-乳酸的至少一者的聚合體的接枝共聚物。The polylactic acid-based polymer means "polylactic acid", "L-lactic acid or a copolymer of D-lactic acid and a polyfunctional compound copolymerizable", or a mixture of the two. It is known that the "polylactic acid" is a polymer obtained by polymerizing and polymerizing lactic acid by an ester bond, and can be obtained by a lactide method via lactide in a solvent and in a solvent. The lactic acid is heated under reduced pressure, and is produced by a direct polymerization method in which polymerization is carried out while removing water. Examples of the "polylactic acid" include a homopolymer of L-lactic acid, a homopolymer of D-lactic acid, a block copolymer of a polymer containing at least one of L-lactic acid and D-lactic acid, and L-containing copolymer. a graft copolymer of a polymer of at least one of lactic acid and D-lactic acid.

作為所述「可進行共聚的多官能性化合物」,可列舉:乙醇酸、二甲基乙醇酸、3-羥基丁酸、4-羥基丁酸、2-羥基丙酸、3-羥基丙酸、2-羥基戊酸、3-羥基戊酸、4-羥基戊酸、5-羥基戊酸、2-羥基己酸、3-羥基己酸、4-羥基己酸、5-羥基己酸、6-羥基己酸、6-羥基甲基己酸、苦杏仁酸等羥基羧酸,乙交酯(glycolide)、β-甲基-δ-戊內酯、γ-戊內酯、ε-己內酯等環狀酯,草酸、丙二酸、丁二酸、戊二酸、己二酸、庚二酸、壬二酸、癸二酸、十一烷二酸、十二烷二酸、對苯二甲酸等多元羧酸,該些的酐,乙二醇、二乙二醇、三乙二醇、1,2-丙二醇、1,3-丙二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇、1,5-戊二醇、1,6-己二醇、1,9-壬二醇、3-甲基-1,5-戊二醇、新戊二醇、四亞甲基二醇、1,4-己烷二甲醇等多元醇,纖維素等多糖類,α-胺基酸等胺基羧酸等。Examples of the "polyfunctional compound copolymerizable" include glycolic acid, dimethyl glycolic acid, 3-hydroxybutyric acid, 4-hydroxybutyric acid, 2-hydroxypropionic acid, and 3-hydroxypropionic acid. 2-hydroxyvaleric acid, 3-hydroxyvaleric acid, 4-hydroxyvaleric acid, 5-hydroxyvaleric acid, 2-hydroxyhexanoic acid, 3-hydroxyhexanoic acid, 4-hydroxyhexanoic acid, 5-hydroxyhexanoic acid, 6- Hydroxycarboxylic acid, 6-hydroxymethylhexanoic acid, hydroxycarboxylic acid such as mandelic acid, glycolide, β-methyl-δ-valerolactone, γ-valerolactone, ε-caprolactone, etc. Cyclic esters, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, sebacic acid, sebacic acid, undecanedioic acid, dodecanedioic acid, terephthalic acid Polycarboxylic acids, such anhydrides, ethylene glycol, diethylene glycol, triethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butane Alcohol, 2,3-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,9-nonanediol, 3-methyl-1,5-pentanediol, neopentyl Polyol such as alcohol, tetramethylene glycol or 1,4-hexanedimethanol; polysaccharides such as cellulose; aminocarboxylic acids such as α-amino acid.

作為所述「可進行共聚的多官能性化合物」,例如可列舉國際公開第2013/054918號手冊的段落0028中所記載的化合物。The "polyfunctional compound which can be copolymerized" is, for example, a compound described in paragraph 0028 of the International Publication No. 2013/054918.

作為所述「L-乳酸或D-乳酸與可進行共聚的多官能性化合物的共聚物」,可列舉具有可生成螺旋結晶的聚乳酸序列的嵌段共聚物或接枝共聚物。Examples of the "copolymer of L-lactic acid or D-lactic acid and a polyfunctional compound copolymerizable" include a block copolymer or a graft copolymer having a polylactic acid sequence capable of generating a spiral crystal.

另外,螺旋手性高分子(A)中的源自共聚物成分的結構的濃度較佳為20 mol%以下。例如當螺旋手性高分子(A)為聚乳酸系高分子時,相對於聚乳酸系高分子中的源自乳酸的結構與源自可與乳酸進行共聚的化合物(共聚物成分)的結構的莫耳數的合計,所述共聚物成分較佳為20 mol%以下。Further, the concentration of the structure derived from the copolymer component in the helical chiral polymer (A) is preferably 20 mol% or less. For example, when the helical chiral polymer (A) is a polylactic acid-based polymer, the structure derived from lactic acid in the polylactic acid-based polymer and the structure derived from a compound (copolymer component) copolymerizable with lactic acid are used. The copolymer component is preferably 20 mol% or less in total of the molar number.

螺旋手性高分子(A)(例如聚乳酸系高分子)例如可藉由如下方法等來製造:日本專利特開昭59-096123號公報、及日本專利特開平7-033861號公報中所記載的使乳酸直接進行脫水縮合來獲得螺旋手性高分子(A)的方法,或美國專利2,668,182號及美國專利4,057,357號等中所記載的使用作為乳酸的環狀二聚體的乳酸交酯進行開環聚合的方法。 進而,為了將藉由所述各製造方法所獲得的螺旋手性高分子(A)(例如聚乳酸系高分子)的光學純度設為95.00%ee以上,例如當利用乳酸交酯法製造聚乳酸時,較佳為使藉由晶析操作而將光學純度提昇至95.00%ee以上的光學純度的乳酸交酯進行聚合。The helical chiral polymer (A) (for example, a polylactic acid-based polymer) can be produced by, for example, the following method: Japanese Patent Laid-Open No. 59-096123, and Japanese Patent Laid-Open No. Hei 7-033861 A method of obtaining a helical chiral polymer (A) by directly dehydrating and condensing lactic acid, or using lactide as a cyclic dimer of lactic acid as described in U.S. Patent No. 2,668,182 and U.S. Patent No. 4,057,357. The method of ring polymerization. Furthermore, in order to set the optical purity of the helical chiral polymer (A) (for example, a polylactic acid-based polymer) obtained by each of the above-described production methods to 95.00% or more, for example, when the polylactic acid is produced by the lactide method, In the case, it is preferred to carry out polymerization by increasing the optical purity to a lactone having an optical purity of 95.00% ee or more by a crystallization operation.

≪螺旋手性高分子(A)的重量平均分子量≫ 本實施形態中所使用的螺旋手性高分子(A)的重量平均分子量(Mw)為5萬~100萬。 藉由螺旋手性高分子(A)的重量平均分子量為5萬以上,將螺旋手性高分子(A)製成成形體時的機械強度提昇。就進一步提昇製成成形體時的機械強度的觀點而言,螺旋手性高分子(A)的重量平均分子量較佳為10萬以上,更佳為15萬以上。 另一方面,藉由螺旋手性高分子(A)的重量平均分子量為100萬以下,藉由成形(例如擠出成形)來獲得高分子壓電膜時的成形性提昇。就進一步提昇獲得高分子壓電膜時的成形性的觀點而言,螺旋手性高分子(A)的重量平均分子量較佳為80萬以下,更佳為30萬以下。The weight average molecular weight of the helical chiral polymer (A) ≫ The weight average molecular weight (Mw) of the helical chiral polymer (A) used in the present embodiment is 50,000 to 1,000,000. When the weight average molecular weight of the helical chiral polymer (A) is 50,000 or more, the mechanical strength when the helical chiral polymer (A) is formed into a molded body is improved. The weight average molecular weight of the helical chiral polymer (A) is preferably 100,000 or more, and more preferably 150,000 or more, from the viewpoint of further improving the mechanical strength at the time of forming the molded body. On the other hand, when the weight average molecular weight of the helical chiral polymer (A) is 1,000,000 or less, the moldability of the polymer piezoelectric film is improved by molding (for example, extrusion molding). The weight average molecular weight of the helical chiral polymer (A) is preferably 800,000 or less, and more preferably 300,000 or less, from the viewpoint of further improving the moldability at the time of obtaining the polymer piezoelectric film.

另外,就高分子壓電膜的強度的觀點而言,螺旋手性高分子(A)的分子量分佈(Mw/Mn)較佳為1.1~5,更佳為1.2~4。進而更佳為1.4~3。再者,螺旋手性高分子(A)(例如聚乳酸系高分子)的重量平均分子量Mw與分子量分佈(Mw/Mn)是使用凝膠滲透層析儀(Gel Permeation Chromatograph,GPC),藉由下述GPC測定方法來測定。In addition, the molecular weight distribution (Mw/Mn) of the helical chiral polymer (A) is preferably from 1.1 to 5, more preferably from 1.2 to 4, from the viewpoint of the strength of the polymer piezoelectric film. More preferably, it is 1.4 to 3. Further, the weight average molecular weight Mw and the molecular weight distribution (Mw/Mn) of the helical chiral polymer (A) (for example, a polylactic acid-based polymer) are obtained by using a gel permeation chromatograph (GPC). The measurement was carried out by the following GPC measurement method.

-GPC測定裝置- 沃特世(Waters)公司製造的GPC-100 -管柱- 昭和電工股份有限公司製造的索得克斯(Shodex)LF-804 -樣品的製備- 於40℃下使螺旋手性高分子(A)溶解於溶媒(例如氯仿)中,而準備濃度為1 mg/mL的樣品溶液。 -測定條件- 以溶媒[氯仿]、溫度40℃、1 mL/min的流速將樣品溶液0.1 mL導入至管柱中。-GPC measuring device - GPC-100 - Pipe column manufactured by Waters - Shodex LF-804 - Preparation of sample - Spiral hand at 40 ° C The polymer (A) is dissolved in a solvent (for example, chloroform) to prepare a sample solution having a concentration of 1 mg/mL. - Measurement conditions - 0.1 mL of the sample solution was introduced into the column at a flow rate of a solvent [chloroform], a temperature of 40 ° C, and a flow rate of 1 mL/min.

利用示差折射計來測定藉由管柱而分離的樣品溶液中的樣品濃度。利用聚苯乙烯標準試樣製作通用校準曲線,並算出螺旋手性高分子(A)的重量平均分子量(Mw)及分子量分佈(Mw/Mn)。A sample refractometer is used to determine the concentration of the sample in the sample solution separated by the column. A general calibration curve was prepared using a polystyrene standard sample, and the weight average molecular weight (Mw) and molecular weight distribution (Mw/Mn) of the helical chiral polymer (A) were calculated.

作為螺旋手性高分子(A)的例子的聚乳酸系高分子亦可使用市售的聚乳酸。作為市售的聚乳酸,例如可列舉:普拉克(PURAC)公司製造的普拉索伯(PURASORB)(PD、PL)、三井化學股份有限公司製造的LACEA(H-100、H-400)、萘琪沃克有限責任公司(NatureWorks LLC)公司製造的英吉爾TM 生物聚合物(IngeoTM biopolymer)等。A commercially available polylactic acid can also be used as the polylactic acid-based polymer as an example of the helical chiral polymer (A). Examples of the commercially available polylactic acid include PURASORB (PD, PL) manufactured by PURAC Co., Ltd., and LACEA (H-100, H-400) manufactured by Mitsui Chemicals, Inc. naphthalene Qiwo Ke LLC (NatureWorks LLC) manufactured by British Gill TM biopolymers (Ingeo TM biopolymer) and the like.

當使用聚乳酸系高分子作為螺旋手性高分子(A)時,為了將聚乳酸系高分子的重量平均分子量(Mw)設為5萬以上,較佳為藉由乳酸交酯法、或直接聚合法來製造螺旋手性高分子(A)。When a polylactic acid-based polymer is used as the helical chiral polymer (A), the weight average molecular weight (Mw) of the polylactic acid-based polymer is preferably 50,000 or more, preferably by a lactide method or directly A spiral chiral polymer (A) is produced by a polymerization method.

本實施形態中所使用的高分子壓電膜可僅包含一種已述的螺旋手性高分子(A),亦可包含兩種以上。 關於本實施形態中所使用的高分子壓電膜,螺旋手性高分子(A)的含量(兩種以上的情況下為總含量。以下相同)並無特別限制,但相對於高分子壓電膜總質量,較佳為80質量%以上。 藉由所述含量為80質量%以上,而存在壓電常數進一步變大的傾向。The piezoelectric polymer film used in the present embodiment may contain only one type of helical chiral polymer (A), and may be contained in two or more types. In the piezoelectric polymer film used in the present embodiment, the content of the helical chiral polymer (A) (the total content in the case of two or more kinds, the same applies hereinafter) is not particularly limited, but is relative to the piezoelectric polymer. The total mass of the film is preferably 80% by mass or more. When the content is 80% by mass or more, the piezoelectric constant tends to be further increased.

≪MD尺寸變化率≫ 於本實施形態的膜捲層體中,於100℃下對自積層膜中去除功能層(X)所獲得的高分子壓電膜進行30分鐘加熱時的MD方向的尺寸變化率(MD尺寸變化率)為1.0%以下。尺寸變化率越小,表示尺寸穩定性越高。MD方向的尺寸變化率是以如下方式來求出。 首先,自積層膜中去除功能層(X),於延伸方向(MD方向)上切割50 mm,並在與延伸方向正交的方向(TD方向)上切割50 mm,而切出50 mm×50 mm的矩形膜。再者,當積層膜具有脫模膜、其他層等時,亦將脫模膜、其他層等與功能層(X)一同去除。將該矩形膜懸掛於設置為100℃的烘箱中,並進行30分鐘退火處理。其後,利用高精度數位測長機(三豐股份有限公司製造,力特麥奇克(Litematic)VL-50AS)測定退火處理前後的MD方向的膜矩形邊長的尺寸。而且,根據下式算出尺寸變化率(%),並評價尺寸穩定性。   (式)尺寸變化率(%)=100×|(退火前的MD方向的邊長)-(退火後的MD方向的邊長)|/(退火前的MD方向的邊長)≪MD size change rate MDIn the film roll layer of the present embodiment, the MD direction dimension when the polymer piezoelectric film obtained by removing the functional layer (X) from the build-up film is heated at 100 ° C for 30 minutes The rate of change (MD size change rate) is 1.0% or less. The smaller the dimensional change rate, the higher the dimensional stability. The dimensional change rate in the MD direction is obtained as follows. First, the functional layer (X) is removed from the laminated film, cut 50 mm in the extending direction (MD direction), and cut 50 mm in the direction orthogonal to the extending direction (TD direction), and cut out 50 mm × 50 A rectangular film of mm. Further, when the laminated film has a release film, another layer, or the like, the release film, other layers, and the like are also removed together with the functional layer (X). The rectangular film was suspended in an oven set at 100 ° C and annealed for 30 minutes. Thereafter, the size of the rectangular side length of the film in the MD direction before and after the annealing treatment was measured by a high-precision digital length measuring machine (manufactured by Mitutoyo Co., Ltd., Litematic VL-50AS). Further, the dimensional change ratio (%) was calculated according to the following formula, and the dimensional stability was evaluated. (Formula) dimensional change rate (%) = 100 × | (edge length in the MD direction before annealing) - (edge length in the MD direction after annealing) | / (edge length in the MD direction before annealing)

就進一步提高尺寸穩定性的觀點而言,所述MD方向的尺寸變化率較佳為0.9%以下,更佳為0.8%以下。From the viewpoint of further improving the dimensional stability, the dimensional change ratio in the MD direction is preferably 0.9% or less, more preferably 0.8% or less.

≪結晶度≫ 高分子壓電膜的結晶度為藉由DSC法所求出者。高分子壓電膜的結晶度為20%~80%,較佳為30%~70%,更佳為35%~60%。只要結晶度處於所述範圍內,則高分子壓電膜的壓電性、透明性、縱裂強度的平衡良好,另外,當使高分子壓電膜進行延伸時,難以產生白化或斷裂而容易製造。 藉由結晶度為20%以上,而將高分子壓電膜的壓電性維持得高。 另外,藉由結晶度為80%以下,而可抑制縱裂強度及透明性下降。≪ Crystallinity ≫ The crystallinity of the polymer piezoelectric film is determined by the DSC method. The polymer piezoelectric film has a crystallinity of 20% to 80%, preferably 30% to 70%, more preferably 35% to 60%. When the degree of crystallinity is within the above range, the piezoelectric piezoelectric film has a good balance of piezoelectricity, transparency, and longitudinal crack strength, and when the piezoelectric polymer film is stretched, it is difficult to cause whitening or cracking. Manufacturing. The piezoelectricity of the piezoelectric polymer film is maintained high by a crystallinity of 20% or more. Further, by having a crystallinity of 80% or less, the longitudinal crack strength and the transparency can be suppressed from being lowered.

例如,藉由調整製造高分子壓電膜時的結晶化及延伸的條件,而可將高分子壓電膜的結晶度調整成20%~80%的範圍。For example, the crystallinity of the piezoelectric polymer film can be adjusted to a range of 20% to 80% by adjusting the conditions of crystallization and elongation when the piezoelectric polymer film is produced.

≪標準化分子配向MORc≫ 高分子壓電膜的標準化分子配向MORc較佳為2.0~15.0。標準化分子配向MORc是根據作為表示螺旋手性高分子(A)的配向的程度的指標的「分子配向度MOR」來決定的值。若標準化分子配向MORc為2.0以上,則於延伸方向上排列的螺旋手性高分子(A)的分子鏈(例如聚乳酸分子鏈)多,其結果,配向結晶的生成率變高,高分子壓電膜可顯現更高的壓電性。若標準化分子配向MORc為15.0以下,則高分子壓電膜的縱裂強度進一步提昇。The normalized molecular alignment MORc of the ≪standardized molecular alignment MORc≫ polymer piezoelectric film is preferably 2.0 to 15.0. The normalized molecular alignment MORc is a value determined based on the "molecular alignment degree MOR" which is an index indicating the degree of alignment of the helical chiral polymer (A). When the normalized molecular alignment MORc is 2.0 or more, the molecular chain of the helical chiral polymer (A) arranged in the extending direction (for example, a polylactic acid molecular chain) is large, and as a result, the formation ratio of the alignment crystal becomes high, and the polymer pressure is high. The electric film can exhibit higher piezoelectricity. When the normalized molecular alignment MORc is 15.0 or less, the longitudinal crack strength of the piezoelectric polymer film is further improved.

此處,分子配向度MOR(Molecular Orientation Ratio)藉由如下的微波測定法來測定。即,於眾所周知的微波透過型分子配向計(亦稱為微波分子配向度測定裝置)的微波共振波導管中,以高分子壓電膜的面(膜面)垂直於微波的前進方向的方式配置高分子壓電膜。而且,於對試樣連續地照射振動方向偏向一個方向的微波的狀態下,使高分子壓電膜在與微波的前進方向垂直的面內旋轉0°~360°,並測定透過試樣的微波強度,藉此求出分子配向度MOR。Here, the molecular orientation degree MOR (Molecular Orientation Ratio) is measured by the following microwave measurement method. In other words, in the microwave resonance waveguide of a well-known microwave transmission type molecular alignment meter (also referred to as a microwave molecular alignment degree measuring apparatus), the surface (film surface) of the polymer piezoelectric film is arranged perpendicular to the traveling direction of the microwave. Polymer piezoelectric film. In the state in which the sample is continuously irradiated with the microwave in which the vibration direction is shifted in one direction, the polymer piezoelectric film is rotated by 0 to 360 in a plane perpendicular to the traveling direction of the microwave, and the microwave of the sample is measured. The strength is used to determine the molecular orientation MOR.

標準化分子配向MORc是將基準厚度tc設為50 μm時的分子配向度MOR,可藉由下述式來求出。   MORc=(tc/t)×(MOR-1)+1   (tc:欲修正的基準厚度,t:高分子壓電膜的厚度) 標準化分子配向MORc可藉由公知的分子配向計,例如王子計測機器(Oji Keisoku Kiki)股份有限公司製造的微波方式分子配向計MOA-2012A或MOA-6000等,以4 GHz或12 GHz附近的共振頻率進行測定。The normalized molecular alignment MORc is a molecular orientation MOR when the reference thickness tc is 50 μm, and can be obtained by the following formula. MORc=(tc/t)×(MOR-1)+1 (tc: reference thickness to be corrected, t: thickness of polymer piezoelectric film) Standardized molecular alignment MORc can be measured by a known molecular alignment meter, such as prince measurement The microwave molecular molecular alignment meter MOA-2012A or MOA-6000 manufactured by Oji Keisoku Kiki Co., Ltd. is measured at a resonance frequency around 4 GHz or 12 GHz.

高分子壓電膜的標準化分子配向MORc更佳為3.0~15.0,進而更佳為3.5~10.0,特佳為4.0~8.0。 另外,就進一步提昇高分子壓電膜與中間層的密接性的觀點而言,標準化分子配向MORc較佳為7.0以下。The normalized molecular alignment MORc of the polymer piezoelectric film is preferably from 3.0 to 15.0, more preferably from 3.5 to 10.0, particularly preferably from 4.0 to 8.0. Further, from the viewpoint of further improving the adhesion between the polymer piezoelectric film and the intermediate layer, the normalized molecular alignment MORc is preferably 7.0 or less.

例如當高分子壓電膜為延伸膜時,標準化分子配向MORc可藉由延伸前的加熱處理條件(加熱溫度及加熱時間)、延伸的條件(延伸倍率、延伸溫度及延伸速度)等來控制。For example, when the polymer piezoelectric film is a stretched film, the normalized molecular alignment MORc can be controlled by heat treatment conditions (heating temperature and heating time) before stretching, elongation conditions (stretching ratio, elongation temperature, and elongation speed).

再者,標準化分子配向MORc亦可轉換成相位差量(延遲)除以膜的厚度所得的雙折射率Δn。具體而言,延遲可使用大塚電子股份有限公司製造的RETS100進行測定。另外,MORc與Δn大致處於線性的比例關係,且當Δn為0時,MORc變成1。 例如,當螺旋手性高分子(A)為聚乳酸系高分子、且以測定波長550 nm測定高分子壓電膜的雙折射率Δn時,若標準化分子配向MORc為2.0,則可轉換成雙折射率Δn0.005,若標準化分子配向MORc為4.0,則可轉換成雙折射率Δn0.01。Furthermore, the normalized molecular alignment MORc can also be converted into a birefringence Δn obtained by dividing the phase difference (delay) by the thickness of the film. Specifically, the retardation can be measured using the RETS100 manufactured by Otsuka Electronics Co., Ltd. In addition, MORc is approximately in a linear proportional relationship with Δn, and when Δn is 0, MORc becomes 1. For example, when the helical chiral polymer (A) is a polylactic acid-based polymer and the birefringence Δn of the polymer piezoelectric film is measured at a measurement wavelength of 550 nm, if the normalized molecular alignment MORc is 2.0, it can be converted into a double The refractive index Δn 0.005, if the normalized molecular alignment MORc is 4.0, can be converted into a birefringence Δn0.01.

≪標準化分子配向MORc與結晶度的積≫ 於本實施形態中,高分子壓電膜的結晶度與標準化分子配向MORc的積為40~700。藉由調整成該範圍,高分子壓電膜的壓電性與透明性的平衡良好,且尺寸穩定性亦高,縱裂強度的下降得到抑制。 高分子壓電膜的標準化分子配向MORc與結晶度的積更佳為40~600,進而更佳為100~500,特佳為125~400,尤佳為150~300。≪ Standardized molecular alignment MORc and crystallinity accumulation In the present embodiment, the product of the crystallinity of the polymer piezoelectric film and the normalized molecular alignment MORc is 40 to 700. By adjusting to this range, the piezoelectric piezoelectric film has a good balance between piezoelectricity and transparency, and also has high dimensional stability, and the decrease in longitudinal crack strength is suppressed. The product of the normalized molecular alignment MORc and the crystallinity of the piezoelectric polymer film is preferably from 40 to 600, more preferably from 100 to 500, particularly preferably from 125 to 400, and particularly preferably from 150 to 300.

例如,藉由調整製造高分子壓電膜時的結晶化及延伸的條件,而可將所述積調整成所述範圍。For example, the product can be adjusted to the above range by adjusting the conditions of crystallization and elongation when the piezoelectric polymer film is produced.

另外,標準化分子配向MORc可藉由製造高分子壓電膜時的結晶化的條件(例如加熱溫度及加熱時間)及延伸的條件(例如延伸倍率、延伸溫度及延伸速度)來控制。Further, the normalized molecular alignment MORc can be controlled by conditions for crystallization (for example, heating temperature and heating time) and elongation conditions (for example, stretching ratio, elongation temperature, and elongation speed) when the polymer piezoelectric film is produced.

≪壓電常數d14 (應力-電荷法)≫ 高分子壓電膜的壓電性例如可藉由測定高分子壓電膜的壓電常數d14 來進行評價。 以下,對利用應力-電荷法的壓電常數d14 的測定方法的一例進行說明。≪Piezoelectric constant d 14 (stress-charge method) 压电 The piezoelectricity of the piezoelectric polymer film can be evaluated, for example, by measuring the piezoelectric constant d 14 of the piezoelectric polymer film. Hereinafter, an example of a method of measuring the piezoelectric constant d 14 by the stress-charge method will be described.

首先,將高分子壓電膜在相對於延伸方向(MD方向)呈45°的方向上切成150 mm,並在與呈45°的方向正交的方向上切成50 mm,而製作矩形的試驗片。繼而,將所獲得的試驗片設置於昭和真空股份有限公司製造的SIP-600的試驗台上,並以鋁(以下,稱為Al)的蒸鍍厚度變成約50 nm的方式,於試驗片的一面上蒸鍍Al。繼而,於試驗片的另一面上同樣地進行蒸鍍,而使Al包覆於試驗片的兩面上,從而形成Al的導電層。First, the piezoelectric polymer film was cut into 150 mm in a direction of 45° with respect to the extending direction (MD direction), and cut into 50 mm in a direction orthogonal to the direction of 45° to form a rectangular shape. Test piece. Then, the obtained test piece was placed on a test stand of SIP-600 manufactured by Showa Vacuum Co., Ltd., and the vapor deposition thickness of aluminum (hereinafter referred to as Al) was changed to about 50 nm, and the test piece was used. Al is evaporated on one side. Then, vapor deposition was performed on the other surface of the test piece in the same manner, and Al was coated on both surfaces of the test piece to form a conductive layer of Al.

將於兩面上形成有Al的導電層的150 mm×50 mm的試驗片在相對於高分子壓電膜的延伸方向(MD方向)呈45°的方向上切成120 mm,並在與呈45°的方向正交的方向上切成10 mm,而切出120 mm×10 mm的矩形的膜。將其作為壓電常數測定用樣品。A test piece of 150 mm × 50 mm in which a conductive layer of Al was formed on both sides was cut into 120 mm in a direction of 45° with respect to the extending direction (MD direction) of the polymer piezoelectric film, and was 45 The direction of the direction of ° was cut into 10 mm, and a rectangular film of 120 mm × 10 mm was cut out. This was used as a sample for measuring piezoelectric constants.

將所獲得的樣品以不會鬆弛的方式設置於將夾頭間距離設為70 mm的拉伸試驗機(艾安得(AND)公司製造,滕喜龍(TENSILON)RTG-1250)中。以十字頭速度為5 mm/min、施加力在4 N與9 N之間往返的方式週期性地施加力。此時,為了測定對應於施加力而於樣品中產生的電荷量,將靜電電容為Qm(F)的電容器與樣品並聯連接,並經由緩衝放大器而測定該電容器Cm(95 nF)的端子間電壓V。以上的測定是於25℃的溫度條件下進行。所產生的電荷量Q(C)作為電容器電容Cm與端子間電壓Vm的積來計算。壓電常數d14 藉由下式來計算。   d14 =(2×t)/L×Cm·ΔVm/ΔF   t:樣品厚度(m) L:夾頭間距離(m) Cm:並聯連接電容器電容(F) ΔVm/ΔF:相對於力的變化量的電容器端子間的電壓變化量比The obtained sample was placed in a tensile tester (manufactured by Ahn Thom, TENSILON RTG-1250) having a distance between the chucks of 70 mm in a manner that does not relax. The force is periodically applied in a manner that the crosshead speed is 5 mm/min and the applied force is reciprocated between 4 N and 9 N. At this time, in order to measure the amount of charge generated in the sample corresponding to the applied force, a capacitor having a capacitance of Qm (F) is connected in parallel with the sample, and the voltage between the terminals of the capacitor Cm (95 nF) is measured via a buffer amplifier. V. The above measurement was carried out at a temperature of 25 °C. The generated charge amount Q(C) is calculated as a product of the capacitor capacitance Cm and the inter-terminal voltage Vm. The piezoelectric constant d 14 is calculated by the following formula. d 14 =(2×t)/L×Cm·ΔVm/ΔF t: sample thickness (m) L: distance between chucks (m) Cm: capacitor capacitance connected in parallel (F) ΔVm/ΔF: change with respect to force Ratio of voltage change between capacitor terminals

壓電常數d14 越高,相對於施加至高分子壓電膜中的電壓的高分子壓電膜的位移,相反地,相對於施加至高分子壓電膜中的力,所產生的電壓變得越大,作為高分子壓電膜有用。 具體而言,於本實施形態中的高分子壓電膜中,25℃下的藉由應力-電荷法所測定的壓電常數d14 較佳為1 pC/N以上,更佳為3 pC/N以上,進而更佳為5 pC/N以上,特佳為6 pC/N以上。另外,壓電常數d14 的上限並無特別限定,但就透明性等的平衡的觀點而言,於使用螺旋手性高分子的高分子壓電膜中,較佳為50 pC/N以下,更佳為30 pC/N以下。 另外,同樣地就與透明性的平衡的觀點而言,藉由共振法所測定的壓電常數d14 較佳為15 pC/N以下。The higher the piezoelectric constant d 14 is, the more the displacement of the piezoelectric piezoelectric film applied to the piezoelectric polymer film is reversed, and the voltage generated is relatively higher with respect to the force applied to the piezoelectric polymer film. Large, useful as a polymer piezoelectric film. Specifically, in the piezoelectric polymer film of the present embodiment, the piezoelectric constant d 14 measured by the stress-charge method at 25 ° C is preferably 1 pC/N or more, more preferably 3 pC/. N or more, more preferably 5 pC/N or more, particularly preferably 6 pC/N or more. In addition, the upper limit of the piezoelectric constant d 14 is not particularly limited, but in terms of the balance of transparency and the like, the polymer piezoelectric film using the helical chiral polymer is preferably 50 pC/N or less. More preferably, it is 30 pC/N or less. Further, similarly, from the viewpoint of the balance of transparency, the piezoelectric constant d 14 measured by the resonance method is preferably 15 pC/N or less.

≪透明性(內部霧度)≫ 本實施形態中所使用的高分子壓電膜的透明性例如可藉由目視觀察或霧度測定來進行評價。 高分子壓電膜的相對於可見光線的內部霧度(以下,亦簡稱為「內部霧度」)較佳為50%以下,更佳為20%以下,進而佳為13%以下,進而更佳為5%以下,特佳為2.0%以下,最佳為1.0%以下。 本實施形態中所使用的高分子壓電膜的內部霧度越低越佳,但就與壓電常數等的平衡的觀點而言,較佳為0.01%~15%,更佳為0.01%~10%,進而更佳為0.1%~5%,特佳為0.1%~1.0%。≪Transparency (internal haze) 透明 The transparency of the piezoelectric polymer film used in the present embodiment can be evaluated, for example, by visual observation or haze measurement. The internal haze of the polymer piezoelectric film with respect to visible light (hereinafter also referred to as "internal haze") is preferably 50% or less, more preferably 20% or less, further preferably 13% or less, and further preferably It is 5% or less, particularly preferably 2.0% or less, and most preferably 1.0% or less. The piezoelectric vibrating membrane used in the present embodiment has a lower internal haze, and is preferably 0.01% to 15%, more preferably 0.01%, from the viewpoint of balance between piezoelectric constant and the like. 10%, more preferably 0.1% to 5%, particularly preferably 0.1% to 1.0%.

於本實施形態中,所謂「內部霧度」,是指除由高分子壓電膜的外表面的形狀所形成的霧度以外的霧度。 另外,此處所述的「內部霧度」是針對高分子壓電膜,依據JIS-K7105於25℃下進行測定時的值。In the present embodiment, the "internal haze" means a haze other than the haze formed by the shape of the outer surface of the polymer piezoelectric film. In addition, the "internal haze" described here is a value measured on a polymer piezoelectric film at 25 ° C in accordance with JIS-K7105.

更詳細而言,內部霧度(以下,亦稱為「內部霧度H1」)是指以如下方式所測定的值。 即,首先針對充滿矽油的光程長度為10 mm的單元,測定光程長度方向的霧度(以下,亦稱為「霧度H2」)。繼而,以單元的光程長度方向與膜的法線方向變成平行的方式,使高分子壓電膜浸漬於該單元的矽油中,並測定浸漬有高分子壓電膜的單元的光程長度方向的霧度(以下,亦稱為「霧度H3」)。霧度H2及霧度H3均依據JIS-K7105於25℃下進行測定。 基於所測定的霧度H2及霧度H3,並根據下述式求出內部霧度H1。   內部霧度(H1)=霧度(H3)-霧度(H2)More specifically, the internal haze (hereinafter also referred to as "internal haze H1") means a value measured as follows. In other words, first, the haze in the optical path length direction (hereinafter also referred to as "haze H2") is measured for a unit having an optical path length of 10 mm filled with eucalyptus oil. Then, the polymer piezoelectric film was immersed in the eucalyptus oil of the unit so that the optical path length direction of the unit became parallel to the normal direction of the film, and the optical path length direction of the unit immersed in the polymer piezoelectric film was measured. Haze (hereinafter, also referred to as "haze H3"). Both haze H2 and haze H3 were measured at 25 ° C according to JIS-K7105. Based on the measured haze H2 and haze H3, the internal haze H1 was obtained from the following equation. Internal haze (H1) = haze (H3) - haze (H2)

霧度H2及霧度H3的測定例如可使用霧度測定機[東京電色公司製造,TC-HIII DPK]來進行。 另外,作為矽油,例如可使用信越化學工業股份有限公司製造的「信越矽酮(Shin-Etsu Silicone)(商標),型號為KF-96-100CS」。The measurement of the haze H2 and the haze H3 can be performed, for example, using a haze measuring machine [manufactured by Tokyo Denshoku Co., Ltd., TC-HIII DPK]. In addition, as the eucalyptus oil, for example, Shin-Etsu Silicone (trademark) manufactured by Shin-Etsu Chemical Co., Ltd., model number KF-96-100CS can be used.

另外,高分子壓電膜的厚度並無特別限制,但較佳為10 μm~400 μm,更佳為20 μm~200 μm,進而更佳為20 μm~100 μm,特佳為20 μm~80 μm。Further, the thickness of the piezoelectric polymer film is not particularly limited, but is preferably 10 μm to 400 μm, more preferably 20 μm to 200 μm, still more preferably 20 μm to 100 μm, and particularly preferably 20 μm to 80 μm. Mm.

[穩定劑(B)] 本實施形態中所使用的高分子壓電膜亦可含有具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~60000的化合物作為穩定劑(B)。藉此,高分子壓電膜的耐濕熱性進一步提昇。 進而,高分子壓電膜中,作為穩定劑(B),較佳為於1分子內具有一個選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基。 作為穩定劑(B),可使用國際公開第2013/054918號的段落0039~段落0055中所記載的「穩定劑(B)」。[Stabilizer (B)] The piezoelectric polymer film used in the present embodiment may further contain one or more functional groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group. A compound having a weight average molecular weight of from 200 to 60,000 is used as the stabilizer (B). Thereby, the heat resistance of the polymer piezoelectric film is further improved. Further, in the polymer piezoelectric film, it is preferable that the stabilizer (B) has one or more selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group in one molecule. Functional group. As the stabilizer (B), "stabilizer (B)" described in paragraph 0039 to paragraph 0055 of International Publication No. 2013/054918 can be used.

作為可用作穩定劑(B)的於一分子中含有碳二醯亞胺基的化合物(碳二醯亞胺化合物),可列舉:單碳二醯亞胺化合物、聚碳二醯亞胺化合物、環狀碳二醯亞胺化合物。 作為單碳二醯亞胺化合物,適宜的是二環己基碳二醯亞胺、雙-2,6-二異丙基苯基碳二醯亞胺等。 另外,作為聚碳二醯亞胺化合物,可使用藉由各種方法所製造者。可使用藉由先前的聚碳二醯亞胺的製造方法(例如美國專利第2941956號說明書、日本專利特公昭47-33279號公報、「有機化學期刊(J.Org.Chem.)」28,2069-2075(1963)、「化學評論(Chemical Review)」1981,Vol.81 No.4、p619-621)所製造者。具體而言,亦可使用日本專利4084953號公報中所記載的碳二醯亞胺化合物。 作為聚碳二醯亞胺化合物,可列舉:聚(4,4'-二環己基甲烷碳二醯亞胺)、聚(N,N'-二-2,6-二異丙基苯基碳二醯亞胺)、聚(1,3,5-三異丙基伸苯基-2,4-碳二醯亞胺)等。 環狀碳二醯亞胺化合物可根據日本專利特開2011-256337號公報、日本專利特開2013-256485號公報中所記載的方法等來合成。 作為碳二醯亞胺化合物,亦可使用市售品,例如可列舉:東京化成工業股份有限公司製造的B2756(商品名),日清紡化學股份有限公司製造的卡保迪萊(Carbodilite)LA-1,萊茵化學(Rhein Chemie)公司製造的斯塔巴賽諾(Stabaxol)P、Stabaxol P400、Stabaxol I(均為商品名)等。As a compound (carbodiimide compound) containing a carbodiimide group in one molecule which can be used as a stabilizer (B), a monocarbodiimide compound or a polycarbodiimide compound can be cited. a cyclic carbodiimide compound. As the monocarbodiimide compound, dicyclohexylcarbodiimide, bis-2,6-diisopropylphenylcarbodiimide or the like is suitable. Further, as the polycarbodiimide compound, those produced by various methods can be used. A method for producing a polycarbodiimide by a prior art can be used (for example, U.S. Patent No. 2,941,956, Japanese Patent Publication No. Sho 47-33279, "J. Org. Chem." 28, 2069 Manufactured by -2075 (1963), "Chemical Review" 1981, Vol. 81 No. 4, p619-621). Specifically, a carbodiimide compound described in Japanese Patent No. 4,084,953 can also be used. Examples of the polycarbodiimide compound include poly(4,4'-dicyclohexylmethane carbodiimide) and poly(N,N'-di-2,6-diisopropylphenylcarbon). Dimethyleneimine), poly(1,3,5-triisopropylphenylene-2,4-carbodiimide), and the like. The cyclic carbodiimide compound can be synthesized by the method described in JP-A-2011-256337, JP-A-2013-256485, and the like. Commercially available products can be used as the carbodiimide compound, and, for example, B2756 (trade name) manufactured by Tokyo Chemical Industry Co., Ltd., and Carbodilite LA-1 manufactured by Nisshinbo Chemical Co., Ltd. , Stabaxol P, Stabaxol P400, and Stabaxol I (all trade names) manufactured by Rhein Chemie.

作為可用作穩定劑(B)的於一分子中含有異氰酸酯基的化合物(異氰酸酯化合物),可列舉:異氰酸3-(三乙氧基矽烷基)丙酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、間苯二異氰酸酯、對苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、2,4'-二苯基甲烷二異氰酸酯、2,2'-二苯基甲烷二異氰酸酯、伸二甲苯基二異氰酸酯、氫化伸二甲苯基二異氰酸酯、異佛爾酮二異氰酸酯等。As the compound (isocyanate compound) containing an isocyanate group in one molecule which can be used as the stabilizer (B), 3-(triethoxydecyl)propyl isocyanate and 2,4-toluene diisocyanate are mentioned. , 2,6-toluene diisocyanate, isophthalic diisocyanate, p-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4'-diphenylmethane diisocyanate, 2,2'-diphenyl Methane diisocyanate, xylylene diisocyanate, hydrogenated xylylene diisocyanate, isophorone diisocyanate, and the like.

作為可用作穩定劑(B)的於一分子中含有環氧基的化合物(環氧化合物),可列舉:苯基縮水甘油醚、二乙二醇二縮水甘油醚、雙酚A-二縮水甘油醚、氫化雙酚A-二縮水甘油醚、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、環氧化聚丁二烯等。Examples of the epoxy group-containing compound (epoxy compound) which can be used as the stabilizer (B) in one molecule include phenyl glycidyl ether, diethylene glycol diglycidyl ether, and bisphenol A-bi-condensation. Glycerol ether, hydrogenated bisphenol A-diglycidyl ether, phenol novolac type epoxy resin, cresol novolac type epoxy resin, epoxidized polybutadiene, and the like.

穩定劑(B)的重量平均分子量如上所述為200~60000,更佳為200~30000,進而更佳為300~18000。 若穩定劑(B)的重量平均分子量為所述範圍內,則穩定劑更容易移動,且更有效地取得耐濕熱性的改良效果。 穩定劑(B)的重量平均分子量特佳為200~900。再者,重量平均分子量為200~900與數量平均分子量為200~900大致一致。另外,於重量平均分子量為200~900的情況下,有時分子量分佈為1.0,於此情況下,亦可將「重量平均分子量為200~900」簡稱為「分子量為200~900」。The weight average molecular weight of the stabilizer (B) is from 200 to 60,000, more preferably from 200 to 30,000, still more preferably from 300 to 18,000, as described above. When the weight average molecular weight of the stabilizer (B) is within the above range, the stabilizer is more likely to move, and the effect of improving the moist heat resistance is more effectively obtained. The weight average molecular weight of the stabilizer (B) is particularly preferably from 200 to 900. Further, the weight average molecular weight is from 200 to 900, and the number average molecular weight is approximately from 200 to 900. Further, when the weight average molecular weight is from 200 to 900, the molecular weight distribution may be 1.0. In this case, the "weight average molecular weight of 200 to 900" may be simply referred to as "molecular weight of 200 to 900".

當高分子壓電膜含有穩定劑(B)時,高分子壓電膜可僅含有一種穩定劑(B),亦可含有兩種以上。 當高分子壓電膜含有螺旋手性高分子(A)及穩定劑(B)時,相對於螺旋手性高分子(A)100質量份,穩定劑(B)的含量(兩種以上的情況下為總含量。以下相同)較佳為0.01質量份~10質量份,更佳為0.01質量份~5質量份,進而佳為0.01質量份~3質量份,進而更佳為0.01質量份~2.8質量份,進而更佳為0.1質量份~2.8質量份,特佳為0.5質量份~2質量份。 若所述含量為0.01質量份以上,則耐濕熱性進一步提昇。 另外,若所述含量為10質量份以下,則透明性的下降得到進一步抑制。When the polymer piezoelectric film contains the stabilizer (B), the polymer piezoelectric film may contain only one stabilizer (B), or may contain two or more kinds. When the polymer piezoelectric film contains the helical chiral polymer (A) and the stabilizer (B), the content of the stabilizer (B) is 100 parts by mass relative to the helical chiral polymer (A) (two or more cases) The following is the total content. The same as the following) is preferably 0.01 parts by mass to 10 parts by mass, more preferably 0.01 parts by mass to 5 parts by mass, still more preferably 0.01 parts by mass to 3 parts by mass, still more preferably 0.01 parts by mass to 2.8 parts by mass. The mass part is more preferably from 0.1 part by mass to 2.8 parts by mass, particularly preferably from 0.5 part by mass to 2 parts by mass. When the content is 0.01 parts by mass or more, the moist heat resistance is further improved. In addition, when the content is 10 parts by mass or less, the decrease in transparency is further suppressed.

作為穩定劑(B)的較佳的形態,可列舉:將具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基,且數量平均分子量為200~900的穩定劑(B1)與1分子內具有兩個以上的選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基,且重量平均分子量為1000~60000的穩定劑(B2)併用這一形態。再者,數量平均分子量為200~900的穩定劑(B1)的重量平均分子量大致為200~900,穩定劑(B1)的數量平均分子量與重量平均分子量變成大致相同的值。 當併用穩定劑(B1)與穩定劑(B2)作為穩定劑(B)時,就透明性提昇的觀點而言,較佳為含有許多穩定劑(B1)。 具體而言,就使透明性與耐濕熱性並存這一觀點而言,相對於穩定劑(B1)100質量份,穩定劑(B2)較佳為10質量份~150質量份的範圍,更佳為30質量份~100質量份的範圍,特佳為50質量份~100質量份的範圍。Preferred examples of the stabilizer (B) include one or more functional groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group, and the number average molecular weight thereof. a stabilizer (B1) of 200 to 900 and one or more functional groups having two or more selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group in one molecule, and the weight The stabilizer (B2) having an average molecular weight of 1,000 to 60,000 is used in this form. Further, the stabilizer (B1) having a number average molecular weight of 200 to 900 has a weight average molecular weight of approximately 200 to 900, and the number average molecular weight of the stabilizer (B1) and the weight average molecular weight become substantially the same value. When the stabilizer (B1) and the stabilizer (B2) are used in combination as the stabilizer (B), it is preferred to contain a plurality of stabilizers (B1) from the viewpoint of improving transparency. Specifically, from the viewpoint of coexistence of transparency and moist heat resistance, the stabilizer (B2) is preferably in the range of 10 parts by mass to 150 parts by mass, more preferably 100 parts by mass of the stabilizer (B1). The range of 30 parts by mass to 100 parts by mass is particularly preferably in the range of 50 parts by mass to 100 parts by mass.

本實施形態中所使用的高分子壓電膜更佳為相對於螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基,且重量平均分子量為200~60000的穩定劑(B)0.01質量份~10質量份。 本實施形態中所使用的高分子壓電膜進而更佳為相對於可見光線的內部霧度為13%以下,且相對於螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基,且重量平均分子量為200~60000的穩定劑(B)0.01質量份~2.8質量份。藉此,高分子壓電膜的壓電性、透明性及耐濕熱性的平衡更優異。The piezoelectric polymer film used in the present embodiment is more preferably composed of a carbodiimide group, an epoxy group, and an isocyanate group, in an amount of 100 parts by mass based on 100 parts by weight of the helical chiral polymer (A). One or more functional groups in the group, and the stabilizer (B) having a weight average molecular weight of 200 to 60,000 is 0.01 parts by mass to 10 parts by mass. More preferably, the piezoelectric polymer film used in the present embodiment has an internal haze of 13% or less with respect to visible light, and 100 parts by mass of the helical chiral polymer (A), and has a selected from the group consisting of carbon two. One or more functional groups in the group consisting of a quinone imine group, an epoxy group, and an isocyanate group, and the stabilizer (B) having a weight average molecular weight of 200 to 60,000 is 0.01 parts by mass to 2.8 parts by mass. Thereby, the piezoelectric piezoelectric film is more excellent in balance of piezoelectricity, transparency, and moist heat resistance.

以下,表示穩定劑(B)的具體例(穩定劑SS-1~穩定劑SS-3)。Specific examples of the stabilizer (B) (stabilizer SS-1 to stabilizer SS-3) are shown below.

[化3] [Chemical 3]

以下,針對所述穩定劑SS-1~穩定劑SS-3,表示化合物名、市售品等。 ·穩定劑SS-1…化合物名為雙-2,6-二異丙基苯基碳二醯亞胺。重量平均分子量(於該例中,僅等同於「分子量」)為363。作為市售品,可列舉:萊茵化學公司製造的「Stabaxol I」、東京化成工業股份有限公司製造的「B2756」。 ·穩定劑SS-2…化合物名為聚(4,4'-二環己基甲烷碳二醯亞胺)。作為市售品,可列舉作為重量平均分子量約為2000者的日清紡化學股份有限公司製造的「Carbodilite LA-1」。 ·穩定劑SS-3…化合物名為聚(1,3,5-三異丙基伸苯基-2,4-碳二醯亞胺)。作為市售品,可列舉作為重量平均分子量約為3000者的萊茵化學公司製造的「Stabaxol P」。另外,作為重量平均分子量為20000者,可列舉萊茵化學公司製造的「Stabaxol P400」。Hereinafter, the stabilizer SS-1 to the stabilizer SS-3 are represented by a compound name, a commercially available product, and the like. Stabilizer SS-1... The compound name is bis-2,6-diisopropylphenylcarbodiimide. The weight average molecular weight (in this example, only equivalent to "molecular weight") was 363. As a commercial item, "Stabaxol I" manufactured by Rhein Chemie Co., Ltd., and "B2756" manufactured by Tokyo Chemical Industry Co., Ltd. are mentioned. Stabilizer SS-2... The compound name is poly(4,4'-dicyclohexylmethane carbodiimide). "Carbodilite LA-1" manufactured by Nisshinbo Chemical Co., Ltd., which is a weight average molecular weight of about 2,000, is mentioned as a commercial item. Stabilizer SS-3... The compound name is poly(1,3,5-triisopropylphenylene-2,4-carbodiimide). As a commercial item, "Stabaxol P" manufactured by Rhein Chemie Co., Ltd., which has a weight average molecular weight of about 3,000, is mentioned. In addition, as a weight average molecular weight of 20,000, "Stabaxol P400" by Rhein Chemie Co., Ltd. is mentioned.

(抗氧化劑) 另外,本實施形態中所使用的高分子壓電膜亦可含有抗氧化劑。抗氧化劑較佳為選自由受阻酚系化合物、受阻胺系化合物、亞磷酸酯系化合物及硫醚系化合物所組成的群組中的至少一種化合物。 另外,作為抗氧化劑,更佳為使用受阻酚系化合物或受阻胺系化合物。藉此,可提供耐濕熱性及透明性亦優異的高分子壓電膜。(Antioxidant) The piezoelectric polymer film used in the present embodiment may contain an antioxidant. The antioxidant is preferably at least one compound selected from the group consisting of a hindered phenol compound, a hindered amine compound, a phosphite compound, and a thioether compound. Further, as the antioxidant, a hindered phenol compound or a hindered amine compound is more preferably used. Thereby, a polymer piezoelectric film excellent in moisture heat resistance and transparency can be provided.

(其他成分) 於無損本發明的效果的限度內,本實施形態中所使用的高分子壓電膜亦可含有以聚偏二氟乙烯、聚乙烯樹脂或聚苯乙烯樹脂為代表的公知的樹脂,或二氧化矽、羥磷灰石(hydroxyapatite)、蒙脫石(montmorillonite)等無機填料,酞菁等公知的結晶成核劑等其他成分。 再者,當高分子壓電膜包含螺旋手性高分子(A)以外的成分時,相對於高分子壓電膜總質量,螺旋手性高分子(A)以外的成分的含量較佳為20質量%以下,更佳為10質量%以下。(Other components) The polymer piezoelectric film used in the present embodiment may contain a known resin typified by polyvinylidene fluoride, polyethylene resin or polystyrene resin, to the extent that the effects of the present invention are not impaired. Or an inorganic filler such as cerium oxide, hydroxyapatite or montmorillonite, or other components such as a known crystal nucleating agent such as phthalocyanine. In addition, when the polymer piezoelectric film contains a component other than the helical chiral polymer (A), the content of the component other than the helical chiral polymer (A) is preferably 20% based on the total mass of the piezoelectric polymer film. The mass% or less is more preferably 10% by mass or less.

於無損本發明的效果的限度內,本實施形態中所使用的高分子壓電膜亦可含有已述的螺旋手性高分子(A)(即,重量平均分子量(Mw)為5萬~100萬的具有光學活性的螺旋手性高分子(A))以外的具有光學活性的螺旋手性高分子。The polymer piezoelectric film used in the present embodiment may contain the helical chiral polymer (A) (that is, the weight average molecular weight (Mw) is 50,000 to 100, within the limits of the effects of the present invention. An optically active helical chiral polymer other than the optically active helical chiral polymer (A).

再者,就透明性的觀點而言,高分子壓電膜較佳為不含具有光學活性的螺旋手性高分子(A)以外的成分。Further, from the viewpoint of transparency, the piezoelectric polymer film preferably contains no components other than the optically active helical chiral polymer (A).

-高分子壓電膜的製造方法- 作為製造本實施形態中所使用的高分子壓電膜的方法,只要是可將結晶度調整成20%~80%,且可將標準化分子配向MORc與結晶度的積調整成40~700的方法,則並無特別限制。 作為該方法,例如可藉由包括將包含螺旋手性高分子(A)的組成物成形為膜狀的步驟(成形步驟)、及使所成形的膜進行延伸的步驟(延伸步驟)的方法來適宜地製造。例如可列舉國際公開第2013/054918號的段落0065~段落0099中所記載的製造方法。- Method for Producing Polymer Piezoelectric Film - As a method for producing the piezoelectric polymer film used in the present embodiment, the crystallinity can be adjusted to 20% to 80%, and the normalized molecules can be aligned to the MORc and crystallized. There is no particular limitation on the method of adjusting the product of the degree to 40 to 700. This method can be, for example, a method including a step of forming a composition containing a helical chiral polymer (A) into a film shape (forming step), and a step of stretching the formed film (extension step). It is suitably manufactured. For example, the production method described in paragraphs 0065 to 099 of International Publication No. 2013/054918 can be cited.

(成形步驟) 成形步驟是將包含螺旋手性高分子(A)、及視需要的穩定劑(B)等其他成分的組成物加熱至螺旋手性高分子(A)的熔點Tm(℃)以上的溫度來成形為膜形狀的步驟。藉由該成形步驟,可獲得包含螺旋手性高分子(A)、及視需要的穩定劑(B)等其他成分的膜。(Molding step) The molding step is to heat a composition containing other components such as a helical chiral polymer (A) and, if necessary, a stabilizer (B) to a melting point Tm (° C.) or more of the helical chiral polymer (A). The temperature is shaped to form a film shape. By this molding step, a film containing other components such as a helical chiral polymer (A) and, if necessary, a stabilizer (B) can be obtained.

再者,於本說明書中,螺旋手性高分子(A)的熔點Tm(℃)、及螺旋手性高分子(A)的玻璃轉移溫度(Tg)分別是指使用示差掃描型熱量計(Differential Scanning Calorimeter,DSC),根據於昇溫速度為10℃/min的條件下使螺旋手性高分子(A)的溫度上昇時的熔解吸熱曲線所求出的值。熔點(Tm)是作為吸熱反應的峰值所獲得的值。玻璃轉移溫度(Tg)是作為熔融吸熱曲線的臨界點所獲得的值。In the present specification, the melting point Tm (° C.) of the helical chiral polymer (A) and the glass transition temperature (Tg) of the helical chiral polymer (A) refer to the use of a differential scanning calorimeter (Differential). Scanning Calorimeter (DSC) is a value obtained by melting the endothermic curve when the temperature of the helical chiral polymer (A) is raised under the conditions of a temperature increase rate of 10 ° C/min. The melting point (Tm) is a value obtained as a peak of an endothermic reaction. The glass transition temperature (Tg) is a value obtained as a critical point of the melting endothermic curve.

所述組成物可藉由將螺旋手性高分子(A)、及視需要的穩定劑(B)等其他成分混合來製造。 所述混合亦可為熔融混練。 具體而言,所述組成物亦可藉由如下方式來製造:將螺旋手性高分子(A)、及視需要的穩定劑(B)等其他成分投入至熔融混練機[例如,東洋精機製作所製造的拉普磨機(Labo Plastomill)]中,並加熱至螺旋手性高分子(A)的熔點以上的溫度來進行熔融混練。於此情況下,在本步驟中,於維持為螺旋手性高分子(A)的熔點以上的溫度的狀態下,將藉由加熱至螺旋手性高分子(A)的熔點以上的溫度來進行熔融混練所製造的組成物成形為膜形狀。 作為熔融混練的條件,例如可列舉:混合機轉速為30 rpm~70 rpm、溫度為180℃~250℃,混練時間為5分鐘~20分鐘等條件。The composition can be produced by mixing other components such as a helical chiral polymer (A) and, if necessary, a stabilizer (B). The mixing can also be melt kneading. Specifically, the composition can be produced by adding a component such as a helical chiral polymer (A) and, if necessary, a stabilizer (B) to a melt kneading machine [for example, Toyo Seiki Co., Ltd. In the manufactured Labo mill (Labo Plastomill), it is heated to a temperature equal to or higher than the melting point of the helical chiral polymer (A) to carry out melt kneading. In this case, in the state where the temperature is equal to or higher than the melting point of the helical chiral polymer (A), the temperature is raised to a temperature equal to or higher than the melting point of the helical chiral polymer (A). The composition produced by melt kneading is formed into a film shape. Examples of the conditions for the melt kneading include a mixer rotation speed of 30 rpm to 70 rpm, a temperature of 180 ° C to 250 ° C, and a kneading time of 5 minutes to 20 minutes.

於本成形步驟中,作為將組成物成形為膜狀的方法,使用熔融擠出成形、壓製成形、射出成形、壓延成形、利用澆鑄法的成形方法。另外,亦可藉由T字模擠出成形法等來成形為膜狀。In the present molding step, as a method of forming the composition into a film shape, a melt extrusion molding, press molding, injection molding, calender molding, or a molding method by a casting method is used. Further, it may be formed into a film shape by a T-die extrusion molding method or the like.

當藉由T字模擠出成形法來將組成物成形為膜狀時,例如較佳為將擠出溫度調整成200℃~230℃,更佳為調整成220℃~230℃。When the composition is formed into a film shape by a T-die extrusion molding method, for example, the extrusion temperature is preferably adjusted to 200 to 230 ° C, more preferably to 220 to 230 ° C.

於成形步驟中,亦可將組成物加熱至所述溫度來進行成形而製成膜,並對所獲得的膜進行急速冷卻。藉由急速冷卻,可調整本步驟中所獲得的膜的結晶度。 此處,所謂「急速冷卻」,是指於剛擠出後至少冷卻至螺旋手性高分子(A)的玻璃轉移溫度Tg以下。 於本實施形態中,較佳為在朝膜的成形與急速冷卻之間不包含其他處理。In the forming step, the composition may be heated to the above temperature to form a film, and the obtained film may be rapidly cooled. The crystallinity of the film obtained in this step can be adjusted by rapid cooling. Here, "rapid cooling" means that the glass transition temperature Tg of at least the spiral chiral polymer (A) is cooled at least after the extrusion. In the present embodiment, it is preferred that no other treatment is included between the formation of the film and the rapid cooling.

急速冷卻的方法可列舉:使膜浸漬於水、冰水、乙醇、加入有乾冰的乙醇或甲醇、液態氮等冷媒中的方法;對膜吹附蒸氣壓低的液體噴霧,藉由蒸發潛熱來對膜進行冷卻的方法等。The method of rapid cooling may be a method of immersing the membrane in water, ice water, ethanol, ethanol or methanol to which dry ice is added, or a refrigerant such as liquid nitrogen; and blowing a liquid spray having a low vapor pressure on the membrane by evaporating latent heat A method in which a film is cooled, and the like.

另外,為了連續地對膜進行冷卻,亦可使管理成螺旋手性高分子(A)的玻璃轉移溫度Tg以下的溫度的金屬輥與膜接觸等,而進行急速冷卻。 另外,冷卻的次數可僅為一次,亦可為兩次以上。In addition, in order to continuously cool the film, the metal roll which is at a temperature lower than the glass transition temperature Tg of the helical chiral polymer (A) may be brought into contact with the film or the like to perform rapid cooling. In addition, the number of times of cooling may be only one time, or may be two or more times.

藉由成形步驟所獲得的膜(即,供於後述的延伸步驟的膜)可為非晶狀態的膜,亦可為經預結晶化的膜(以下,亦稱為「預結晶化膜」)。 此處,所謂非晶狀態的膜,是指結晶度未滿3%的膜。 另外,所謂預結晶化膜,是指結晶度為3%以上(較佳為3%~70%)的膜。 此處,結晶度是指藉由與高分子壓電膜的結晶度相同的方法所測定的值。The film obtained by the molding step (that is, the film to be subjected to the stretching step described later) may be an amorphous film or a pre-crystallized film (hereinafter also referred to as "pre-crystallized film"). . Here, the film in an amorphous state means a film having a crystallinity of less than 3%. In addition, the pre-crystallized film means a film having a crystallinity of 3% or more (preferably 3% to 70%). Here, the degree of crystallinity refers to a value measured by the same method as the crystallinity of the polymer piezoelectric film.

藉由成形步驟所獲得的膜(非晶狀態的膜、或預結晶化膜)的厚度主要根據最終所獲得的高分子壓電膜的厚度與延伸倍率來決定,但較佳為50 μm~1000 μm,更佳為100 μm~800 μm左右。The thickness of the film (the amorphous state film or the pre-crystallized film) obtained by the molding step is mainly determined depending on the thickness and the stretching ratio of the finally obtained polymer piezoelectric film, but is preferably 50 μm to 1000. Μm, more preferably from about 100 μm to about 800 μm.

預結晶化膜可藉由對包含螺旋手性高分子(A)、及視需要的穩定劑(B)等其他成分的非晶狀態的膜進行加熱處理來使其結晶化而獲得。 用以對非晶狀態的膜進行預結晶化的加熱溫度T並無特別限定,但就提高所製造的高分子壓電膜的壓電性或透明性等的觀點而言,較佳為以與螺旋手性高分子(A)的玻璃轉移溫度Tg滿足下式的關係,且結晶度變成3%~70%的方式設定。   Tg-40℃≦T≦Tg+40℃   (Tg表示螺旋手性高分子(A)的玻璃轉移溫度)The pre-crystallized film can be obtained by crystallization of a film in an amorphous state containing other components such as a helical chiral polymer (A) and, if necessary, a stabilizer (B). The heating temperature T for pre-crystallization of the film in an amorphous state is not particularly limited, but from the viewpoint of improving the piezoelectricity or transparency of the produced piezoelectric polymer film, etc., it is preferable to The glass transition temperature Tg of the helical chiral polymer (A) satisfies the relationship of the following formula, and the crystallinity is set to be 3% to 70%. Tg-40°C≦T≦Tg+40°C (Tg represents the glass transition temperature of the helical chiral polymer (A))

用以對非晶狀態的膜進行預結晶化的加熱時間可考慮最終所獲得的高分子壓電膜的標準化分子配向MORc或結晶度來適宜設定。 所述加熱時間較佳為5秒~60分鐘。存在隨著加熱時間變長,所述標準化分子配向MORc變高、且所述結晶度變高的傾向。 例如,當對包含聚乳酸系高分子作為螺旋手性高分子(A)的非晶狀態的膜進行預結晶化時,較佳為於20℃~170℃下加熱5秒~60分鐘。The heating time for pre-crystallizing the film in an amorphous state can be appropriately set in consideration of the normalized molecular alignment MORc or crystallinity of the polymer piezoelectric film finally obtained. The heating time is preferably from 5 seconds to 60 minutes. There is a tendency that the normalized molecular alignment MORc becomes higher as the heating time becomes longer, and the crystallinity becomes higher. For example, when a film containing an amorphous state of the polylactic acid-based polymer as the helical chiral polymer (A) is precrystallized, it is preferably heated at 20 to 170 ° C for 5 seconds to 60 minutes.

當對非晶狀態的膜進行預結晶化時,例如可使用調整成所述溫度範圍的鑄造輥。可利用所述靜電密接法,使高分子壓電膜密接於該預結晶化用的鑄造輥來進行預結晶化,並且調整厚度的峰值。例如,當採用使膜整個面密接的線釘紮時,可藉由電極的位置的調整或材質、施加電壓等來調整厚度的峰值。When the film in the amorphous state is pre-crystallized, for example, a casting roll adjusted to the above temperature range can be used. The polymer piezoelectric film can be adhered to the casting roll for precrystallization by the electrostatic adhesion method to perform precrystallization, and the peak of the thickness can be adjusted. For example, when a wire for adhering the entire surface of the film is used, the peak of the thickness can be adjusted by the adjustment of the position of the electrode, the material, the applied voltage, and the like.

(延伸步驟) 延伸步驟是使成形步驟中所獲得的膜(例如預結晶化膜)主要於單軸方向上進行延伸的步驟。藉由本步驟,可獲得主面的面積大的高分子壓電膜作為延伸膜。 再者,所謂主面的面積大,是指高分子壓電膜的主面的面積為5 mm2 以上。另外,主面的面積較佳為10 mm2 以上。(Extension Step) The stretching step is a step of stretching the film (for example, the pre-crystallized film) obtained in the forming step mainly in the uniaxial direction. By this step, a polymer piezoelectric film having a large main surface area can be obtained as a stretched film. In addition, the large area of the principal surface means that the area of the principal surface of the piezoelectric polymer film is 5 mm 2 or more. Further, the area of the main surface is preferably 10 mm 2 or more.

另外,推測藉由使膜主要於單軸方向上進行延伸,而可使膜中所含有的螺旋手性高分子(A)的分子鏈於一個方向上進行配向、且高密度地排列,可獲得更高的壓電性。作為利用連續製程於單軸方向上進行延伸的方法,可為製程的前進方向(MD方向)與延伸方向一致的縱向延伸,亦可為垂直於製程的前進方向的方向(TD方向)與延伸方向一致的橫向延伸。In addition, it is estimated that the molecular chain of the helical chiral polymer (A) contained in the film can be aligned in one direction and arranged at a high density by stretching the film mainly in the uniaxial direction. Higher piezoelectricity. As a method of extending in a uniaxial direction by using a continuous process, the longitudinal direction of the forward direction (MD direction) of the process may be the same as the extending direction, or may be the direction (TD direction) and the extending direction perpendicular to the advancing direction of the process. Consistent lateral extension.

當如朝單軸方向的延伸般僅藉由拉伸力來使膜進行延伸時,膜的延伸溫度較佳為比膜(或膜中的螺旋手性高分子(A))的玻璃轉移溫度高10℃~20℃左右的溫度範圍。When the film is stretched only by the stretching force as extending in the uniaxial direction, the film extending temperature is preferably higher than the glass transition temperature of the film (or the spiral chiral polymer (A) in the film). A temperature range of about 10 ° C to 20 ° C.

延伸處理中的延伸倍率(主延伸倍率)較佳為2倍~10倍,更佳為3倍~5倍,進而更佳為3倍~4倍。藉此,可獲得具有更高的壓電性及透明性的高分子壓電膜。The stretching ratio (main stretching ratio) in the stretching treatment is preferably 2 to 10 times, more preferably 3 to 5 times, still more preferably 3 to 4 times. Thereby, a polymer piezoelectric film having higher piezoelectricity and transparency can be obtained.

再者,於延伸步驟中,當進行用以提高壓電性的延伸(主延伸)時,可同時或依次地在與所述主延伸的方向交叉(較佳為正交)的方向上使成形步驟中所獲得的膜(例如預結晶化膜)進行延伸(亦稱為副延伸)。 再者,此處所述的「依次的延伸」是指首先於單軸方向上進行延伸後,在與所述延伸的方向交叉的方向上進行延伸的延伸方法。 當於延伸步驟中進行副延伸時,副延伸的延伸倍率較佳為1倍~3倍,更佳為1.1倍~2.5倍,進而更佳為1.2倍~2.0倍。藉此,可進一步提高高分子壓電膜的撕裂強度。Further, in the extending step, when the extension (main extension) for improving the piezoelectricity is performed, the forming may be simultaneously or sequentially formed in a direction crossing (preferably orthogonal) to the direction of the main extension. The film obtained in the step (for example, a pre-crystallized film) is extended (also referred to as a sub-extension). In addition, the "sequential extension" as used herein refers to an extension method of extending in a direction crossing the extending direction after first extending in the uniaxial direction. When the sub-stretching is performed in the stretching step, the stretching ratio of the sub-stretching is preferably from 1 to 3 times, more preferably from 1.1 to 2.5 times, still more preferably from 1.2 to 2.0 times. Thereby, the tear strength of the piezoelectric polymer film can be further improved.

當於延伸步驟中進行預結晶化膜的延伸時,亦可為了使膜容易延伸而於即將延伸前進行預熱。該預熱通常是為了使延伸前的膜變軟並容易延伸而進行,因此通常於不會對所述延伸前的膜進行結晶化而使膜變硬的條件下進行。但是,如所述般於本實施形態中,由於有時在延伸前進行預結晶化,因此亦可將所述預熱兼作預結晶化而進行。具體而言,對照預結晶化步驟中的加熱溫度或加熱處理時間,以比通常進行中的溫度更高的溫度或更長的時間進行預熱,藉此可兼作預熱與預結晶化。When the extension of the pre-crystallized film is carried out in the stretching step, preheating may be performed just before the extension in order to facilitate the stretching of the film. This preheating is usually carried out in order to soften the film before stretching and to easily extend it. Therefore, it is usually carried out under conditions which do not crystallize the film before stretching and harden the film. However, as described above, in the present embodiment, pre-crystallization may be performed before stretching, and the preheating may be performed as a pre-crystallization. Specifically, the heating temperature or the heat treatment time in the precrystallization step is preheated at a temperature higher than the temperature in the usual process or for a longer period of time, thereby allowing for both preheating and precrystallization.

(退火步驟) 本實施形態的製造方法視需要可具有退火步驟。 退火步驟是對在所述延伸步驟中進行了延伸的膜(以下,亦稱為「延伸膜」)進行退火(熱處理)的步驟。藉由退火步驟,可使延伸膜的結晶化進一步進行,而可獲得壓電性更高的高分子壓電膜。 另外,當主要藉由退火來對延伸膜進行結晶化時,有時可省略所述成形步驟中的預結晶化的操作。於此情況下,作為藉由成形步驟所獲得的膜(即,供於延伸步驟的膜),可選擇非晶狀態的膜。(Annealing Step) The production method of the present embodiment may have an annealing step as needed. The annealing step is a step of annealing (heat treatment) the film (hereinafter, also referred to as "stretch film") which is extended in the stretching step. By the annealing step, the crystallization of the stretched film can be further progressed, and a piezoelectric piezoelectric film having higher piezoelectricity can be obtained. Further, when the stretched film is mainly crystallized by annealing, the operation of pre-crystallization in the forming step may be omitted. In this case, as the film obtained by the forming step (that is, the film to be supplied to the stretching step), a film in an amorphous state can be selected.

於本實施形態中,退火的溫度較佳為80℃~160℃,更佳為100℃~155℃。In the present embodiment, the annealing temperature is preferably from 80 ° C to 160 ° C, more preferably from 100 ° C to 155 ° C.

退火(熱處理)的方法並無特別限定,可列舉:利用朝加熱輥的接觸、熱風加熱器或紅外線加熱器對經延伸的膜直接進行加熱的方法;藉由使經延伸的膜浸漬於經加熱的液體(矽油等)中來進行加熱的方法等。The method of annealing (heat treatment) is not particularly limited, and a method of directly heating the stretched film by contact with a heating roller, a hot air heater or an infrared heater; by immersing the stretched film in heating A method of heating in a liquid (such as eucalyptus oil).

退火較佳為對延伸膜施加一定的拉伸應力(例如0.01 MPa~100 MPa),一面不使延伸膜鬆弛一面進行。The annealing is preferably performed by applying a predetermined tensile stress (for example, 0.01 MPa to 100 MPa) to the stretched film without loosening the stretched film.

退火的時間較佳為1秒~5分鐘,更佳為5秒~3分鐘,進而更佳為10秒~2分鐘。若退火的時間為5分鐘以下,則生產性優異。另一方面,若退火的時間為1秒以上,則可進一步提昇膜的結晶度。The annealing time is preferably from 1 second to 5 minutes, more preferably from 5 seconds to 3 minutes, still more preferably from 10 seconds to 2 minutes. When the annealing time is 5 minutes or less, the productivity is excellent. On the other hand, if the annealing time is 1 second or longer, the crystallinity of the film can be further increased.

經退火的延伸膜(即,高分子壓電膜)較佳為於退火後進行急速冷卻。有時於退火步驟中進行的「急速冷卻」與有時於已述的成形步驟中進行的「急速冷卻」相同。 冷卻的次數可僅為一次,亦可為兩次以上,進而,亦可交替地反覆進行退火與冷卻。The annealed stretched film (i.e., the polymer piezoelectric film) is preferably subjected to rapid cooling after annealing. The "rapid cooling" performed in the annealing step may be the same as the "rapid cooling" which may be performed in the molding step described above. The number of times of cooling may be only one time, or may be two or more times, and further, annealing and cooling may be alternately repeated.

[功能層(X)] 功能層(X)是設置於高分子壓電膜的至少一個主面上的層。功能層(X)作為用以保護高分子壓電膜的層、將其他層與高分子壓電膜貼合的層等發揮功能。功能層(X)較佳為與高分子壓電膜接觸。[Functional Layer (X)] The functional layer (X) is a layer provided on at least one main surface of the piezoelectric polymer film. The functional layer (X) functions as a layer for protecting the piezoelectric film of the polymer, a layer for bonding the other layer to the piezoelectric film of the polymer, and the like. The functional layer (X) is preferably in contact with the polymer piezoelectric film.

作為功能層(X),較佳為接著層。再者,於本說明書中,「接著」是包含黏著的概念,「接著層」亦包含黏著層。以下,對作為功能層(X)的一形態的接著層進行說明。As the functional layer (X), a bonding layer is preferred. Furthermore, in this specification, "subsequent" is a concept that includes adhesion, and "adhesive layer" also includes an adhesive layer. Hereinafter, an adhesive layer which is one form of the functional layer (X) will be described.

接著層是具有接著性的層,作為接著層,可使用利用間隔片對兩面進行層壓的雙面膠(光學透明膠(Optical Clear Adhesive,OCA))。 另外,所述接著層亦可使用溶劑系、無溶劑系、水系等的黏著塗佈液,紫外線(Ultraviolet,UV)硬化型光學透明樹脂(Optical Clear Resin,OCR),熱熔接著劑等來形成。Next, the layer is a layer having an adhesive property, and as the adhesive layer, a double-sided tape (Optical Clear Adhesive (OCA)) in which both faces are laminated by a spacer can be used. Further, the adhesive layer may be formed by using an adhesive coating liquid such as a solvent system, a solventless system or an aqueous system, an ultraviolet (UV) curing optical transparent resin (OCR), a hot melt adhesive or the like. .

作為OCA,可列舉:光學用透明黏著片LUCIACS系列(日東電工股份有限公司製造)或高透明雙面膠5400A系列(積水化學工業股份有限公司製造)、光學黏著片Opteria系列(琳得科(Lintec)股份有限公司製造)、高透明性接著劑轉印膠帶系列(住友3M股份有限公司製造),SANCUARY系列(三櫻化研(Sun A.Kaken)股份有限公司製造)等。As the OCA, the transparent adhesive sheet for optical use LUCIACS series (manufactured by Nitto Denko Corporation) or the high transparent double-sided tape 5400A series (manufactured by Sekisui Chemical Co., Ltd.) and the optical adhesive sheet Opteria series (Lintec) )), a highly transparent adhesive transfer tape series (manufactured by Sumitomo 3M Co., Ltd.), SANCUARY series (manufactured by Sun A. Kaken Co., Ltd.), and the like.

作為黏著塗佈液(接著塗敷液),可列舉:SK-Dyne系列(綜研化學股份有限公司製造),Finetac系列(迪愛生(DIC)股份有限公司製造),Voncoat系列、LKG系列(藤倉化成股份有限公司製造),Corponiel系列(日本合成化學工業股份有限公司製造)等。Examples of the adhesive coating liquid (the coating liquid) include SK-Dyne series (manufactured by Synthetic Chemical Co., Ltd.), Finetec series (manufactured by Dickson Co., Ltd.), Voncoat series, and LKG series (Fujikura Kasei Co., Ltd. manufactured by Co., Ltd., Corponiel series (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.).

作為接著層,就防止高分子壓電膜的加熱的觀點而言,較佳為OCA的接著層、使用OCR所形成的接著層、將黏著塗佈液塗佈於高分子壓電膜以外的構件(例如後述的脫模膜)上所形成的接著層、將熱熔接著劑用於高分子壓電膜以外的構件所形成的接著層。As the adhesive layer, from the viewpoint of preventing heating of the piezoelectric polymer film, an adhesive layer of OCA, an adhesive layer formed using OCR, and a member other than the polymer piezoelectric film coated with the adhesive coating liquid are preferable. An adhesive layer formed on (for example, a release film to be described later) and a thermal-melting adhesive are used for the adhesive layer formed of a member other than the polymer piezoelectric film.

作為接著層的材料,並無特別限定,但較佳為含有樹脂。 作為樹脂,例如可列舉:丙烯酸系樹脂、甲基丙烯酸系樹脂、胺基甲酸酯系樹脂、纖維素系樹脂、乙酸乙烯酯系樹脂、乙烯-乙酸乙烯酯系樹脂、環氧系樹脂、尼龍-環氧系樹脂、氯乙烯系樹脂、氯丁二烯橡膠系樹脂、氰基丙烯酸酯系樹脂、矽酮系樹脂、改性矽酮系樹脂、水性高分子-異氰酸酯系樹脂、苯乙烯-丁二烯橡膠系樹脂、腈橡膠系樹脂、縮醛樹脂、酚樹脂、聚醯胺樹脂、聚醯亞胺樹脂、三聚氰胺樹脂、脲樹脂、溴樹脂、澱粉系樹脂、聚酯樹脂、聚烯烴樹脂等。The material of the adhesive layer is not particularly limited, but preferably contains a resin. Examples of the resin include an acrylic resin, a methacrylic resin, a urethane resin, a cellulose resin, a vinyl acetate resin, an ethylene-vinyl acetate resin, an epoxy resin, and a nylon. - epoxy resin, vinyl chloride resin, chloroprene rubber resin, cyanoacrylate resin, fluorenone resin, modified fluorenone resin, aqueous polymer - isocyanate resin, styrene - butyl Diene rubber resin, nitrile rubber resin, acetal resin, phenol resin, polyamide resin, polyimide resin, melamine resin, urea resin, bromine resin, starch resin, polyester resin, polyolefin resin, etc. .

功能層(X)的膜厚並無特別限定,但就抑制功能層(X)的密接力的維持與透過率的下降的觀點而言,較佳為將厚度設為5 μm以上,更佳為設為7 μm~100 μm,進而更佳為設為7 μm~60 μm,特佳為設為10 μm~30 μm。The thickness of the functional layer (X) is not particularly limited. However, from the viewpoint of suppressing the maintenance of the adhesion between the functional layer (X) and the decrease in the transmittance, the thickness is preferably 5 μm or more, and more preferably It is set to 7 μm to 100 μm, more preferably 7 μm to 60 μm, and particularly preferably 10 μm to 30 μm.

-功能層(X)的酸價- 就抑制積層膜於濕熱環境下的劣化的觀點而言,功能層(X)的酸價較佳為10 mgKOH/g以下,更佳為5 mgKOH/g以下,進而更佳為1 mgKOH/g以下。 就進一步提昇高分子壓電膜與功能層(X)的密接力的觀點而言,功能層(X)的酸價較佳為0.01 mgKOH/g以上,更佳為0.05 mgKOH/g以上,進而更佳為0.1 mgKOH/g以上。 於本說明書中,功能層(X)的酸價是指中和功能層(X)1 g中的游離酸所需的KOH的量(mg)。該KOH的量(mg)藉由如下方式來測定:將酚酞作為指示劑,藉由0.005M KOH(氫氧化鉀)乙醇溶液來對在溶媒中溶解或膨潤的功能層(X)進行滴定。- Acid value of the functional layer (X) - The acid value of the functional layer (X) is preferably 10 mgKOH/g or less, more preferably 5 mgKOH/g or less, from the viewpoint of suppressing deterioration of the laminated film in a hot and humid environment. More preferably, it is 1 mgKOH/g or less. The acid value of the functional layer (X) is preferably 0.01 mgKOH/g or more, more preferably 0.05 mgKOH/g or more, from the viewpoint of further improving the adhesion between the polymer piezoelectric film and the functional layer (X). Preferably it is 0.1 mgKOH/g or more. In the present specification, the acid value of the functional layer (X) means the amount (mg) of KOH required to neutralize the free acid in 1 g of the functional layer (X). The amount (mg) of the KOH was measured by using phenolphthalein as an indicator, and titrating the functional layer (X) dissolved or swollen in a solvent by a 0.005 M KOH (potassium hydroxide) ethanol solution.

功能層(X)的總氮量較佳為0.05質量%~10質量%,更佳為0.2質量%~5質量%。藉此,脂肪族系聚酯高分子壓電膜的耐濕熱性提昇。The total nitrogen content of the functional layer (X) is preferably from 0.05% by mass to 10% by mass, more preferably from 0.2% by mass to 5% by mass. Thereby, the heat resistance of the aliphatic polyester polymer piezoelectric film is improved.

[其他層] 於本實施形態的膜捲層體中,積層膜亦可在高分子壓電膜與功能層(X)之間具有其他層。作為其他層,例如可列舉:易接著層、硬塗層、折射率調整層、抗反射層、防眩層、易滑層、抗黏連層、保護層、抗靜電層、散熱層、紫外線吸收層、抗牛頓環層、光散射層、偏光層、阻氣層、色相調整層等。另外,作為其他層,可為兼具所述其他層分別具有的功能中的兩個以上的層,亦可按順序積層兩個以上的層。該些之中,作為其他層,較佳為折射率調整層、易接著層、硬塗層、抗靜電層、及抗黏連層的至少一種層。 當於高分子壓電膜的兩個主面側具備其他層時,兩個其他層可為相同的層,亦可為不同的層。[Other Layers] In the film roll layer of the present embodiment, the build-up film may have another layer between the polymer piezoelectric film and the functional layer (X). Examples of the other layer include an easy adhesion layer, a hard coat layer, a refractive index adjusting layer, an antireflection layer, an antiglare layer, a slip layer, an anti-blocking layer, a protective layer, an antistatic layer, a heat dissipation layer, and ultraviolet absorption. Layer, anti-Newton ring layer, light scattering layer, polarizing layer, gas barrier layer, hue adjustment layer, and the like. Further, as the other layer, two or more layers of the functions of the other layers may be combined, and two or more layers may be laminated in this order. Among these, as the other layer, at least one of a refractive index adjusting layer, an easy-adhesion layer, a hard coat layer, an antistatic layer, and an anti-blocking layer is preferable. When other layers are provided on the two main surface sides of the piezoelectric polymer film, the two other layers may be the same layer or different layers.

作為其他層的材料,並無特別限定,例如可列舉:金屬或金屬氧化物等無機物;樹脂等有機物;包含樹脂與微粒子的複合組成物等。作為樹脂,例如亦可利用藉由以溫度或活性能量線來進行硬化所獲得的硬化物。即,作為樹脂,亦可利用硬化性樹脂。The material of the other layer is not particularly limited, and examples thereof include an inorganic substance such as a metal or a metal oxide, an organic substance such as a resin, and a composite composition containing a resin and fine particles. As the resin, for example, a cured product obtained by curing by temperature or an active energy ray can also be used. That is, as the resin, a curable resin can also be used.

作為硬化性樹脂,例如可列舉:選自由丙烯酸系化合物、甲基丙烯酸系化合物、乙烯基系化合物、烯丙基系化合物、胺基甲酸酯系化合物、環氧系化合物、環氧化物系化合物、縮水甘油基系化合物、氧雜環丁烷系化合物、三聚氰胺系化合物、纖維素系化合物、酯系化合物、矽烷系化合物、矽酮系化合物、矽氧烷系化合物、二氧化矽-丙烯酸混合化合物、及二氧化矽-環氧樹脂混合化合物所組成的群組中的至少一種材料(硬化性樹脂)。 該些之中,更佳為丙烯酸系化合物、環氧系化合物、矽烷系化合物。 作為金屬,例如可列舉:選自Al、Si、Ti、V、Cr、Fe、Co、Ni、Cu、Zn、In、Sn、W、Ag、Au、Pd、Pt、Sb、Ta及Zr中的至少一種,或該些的合金。 作為金屬氧化物,例如可列舉:氧化鈦、氧化鋯、氧化鋅、氧化鈮、氧化銻、氧化錫、氧化銦、氧化鈰、氧化鋁、氧化矽、氧化鎂、氧化釔、氧化鐿、及氧化鉭、及該些的複合氧化物的至少一種。 作為微粒子,可列舉如上所述的金屬氧化物的微粒子,或氟系樹脂、矽酮系樹脂、苯乙烯系樹脂、丙烯酸系樹脂等的樹脂微粒子等。進而,亦可列舉於該些微粒子的內部具有空孔的中空微粒子。 作為微粒子的平均一次粒徑,就透明性的觀點而言,較佳為1 nm以上、500 nm以下,更佳為5 nm以上、300 nm以下,進而更佳為10 nm以上、200 nm以下。藉由為500 nm以下,可見光的散射得到抑制,藉由為1 nm以上,微粒子的二次凝聚得到抑制,就維持透明性的觀點而言理想。The curable resin is, for example, selected from the group consisting of an acrylic compound, a methacrylic compound, a vinyl compound, an allyl compound, a urethane compound, an epoxy compound, and an epoxide compound. , a glycidyl compound, an oxetane compound, a melamine compound, a cellulose compound, an ester compound, a decane compound, an anthrone compound, a siloxane compound, a cerium oxide-acrylic compound And at least one material (curable resin) of the group consisting of cerium oxide-epoxy resin mixed compounds. Among these, an acrylic compound, an epoxy compound, and a decane compound are more preferable. Examples of the metal include, for example, Al, Si, Ti, V, Cr, Fe, Co, Ni, Cu, Zn, In, Sn, W, Ag, Au, Pd, Pt, Sb, Ta, and Zr. At least one, or alloy of the same. Examples of the metal oxide include titanium oxide, zirconium oxide, zinc oxide, cerium oxide, cerium oxide, tin oxide, indium oxide, cerium oxide, aluminum oxide, cerium oxide, magnesium oxide, cerium oxide, cerium oxide, and oxidation. At least one of cerium, and a composite oxide thereof. Examples of the fine particles include fine particles of a metal oxide as described above, resin fine particles such as a fluorine resin, an anthrone resin, a styrene resin, and an acrylic resin. Further, hollow fine particles having pores inside the fine particles may be mentioned. The average primary particle diameter of the fine particles is preferably 1 nm or more and 500 nm or less, more preferably 5 nm or more and 300 nm or less, and still more preferably 10 nm or more and 200 nm or less from the viewpoint of transparency. By 500 nm or less, scattering of visible light is suppressed, and secondary aggregation of fine particles is suppressed by 1 nm or more, and it is preferable from the viewpoint of maintaining transparency.

其他層的膜厚並無特別限定,但較佳為0.01 μm~10 μm的範圍。所述厚度的上限值更佳為6 μm以下,進而更佳為3 μm以下。另外,下限值更佳為0.2 μm以上,進而更佳為0.3 μm以上。 但是,於其他層為包含多個層的多層膜的情況下,所述厚度表示多層膜整體的厚度。The film thickness of the other layer is not particularly limited, but is preferably in the range of 0.01 μm to 10 μm. The upper limit of the thickness is more preferably 6 μm or less, and still more preferably 3 μm or less. Further, the lower limit value is more preferably 0.2 μm or more, and still more preferably 0.3 μm or more. However, in the case where the other layer is a multilayer film including a plurality of layers, the thickness indicates the thickness of the entire multilayer film.

藉由形成其他層,亦具有高分子壓電膜表面的模線或撞痕等缺陷得到彌補,外觀提昇這一效果。於此情況下,高分子壓電膜與其他層的折射率差越小,高分子壓電膜與其他層與界面的反射越減少,外觀進一步提昇。By forming other layers, defects such as mold lines or bumps on the surface of the piezoelectric film of the polymer are compensated, and the appearance is improved. In this case, the smaller the refractive index difference between the polymer piezoelectric film and the other layers, the smaller the reflection between the polymer piezoelectric film and the other layers and the interface, and the appearance is further improved.

作為形成所述其他層的方法,可適宜使用先前通常所使用的公知的方法,例如可列舉:蒸鍍法、濺鍍法、離子鍍法、化學蒸鍍(化學氣相沈積(Chemical Vapor Deposition,CVD))法、鍍敷法等乾式塗佈法,濕式塗佈法。作為濕式塗佈法,例如可列舉:輥塗法、旋塗法、浸塗法、棒塗法、凹版塗佈法。 例如,當自硬化性樹脂來形成其他層時,藉由塗佈分散或溶解有包含硬化性樹脂、添加劑、溶劑等的材料的塗佈液,而形成其他層。As a method of forming the other layer, a known method which has been conventionally used can be suitably used, and examples thereof include a vapor deposition method, a sputtering method, an ion plating method, and a chemical vapor deposition (Chemical Vapor Deposition). Dry coating method such as CVD)) method, plating method, wet coating method. Examples of the wet coating method include a roll coating method, a spin coating method, a dip coating method, a bar coating method, and a gravure coating method. For example, when another layer is formed from a curable resin, another layer is formed by coating a coating liquid in which a material containing a curable resin, an additive, a solvent, or the like is dispersed or dissolved.

進而,視需要亦可針對如所述般進行了塗佈的所述材料(硬化性樹脂等),藉由乾燥來使溶劑揮發、或藉由熱或活性能量線(紫外線、電子束、放射線等)照射來使硬化性樹脂硬化。Further, the material (curable resin or the like) coated as described above may be volatilized by drying or by heat or active energy rays (ultraviolet rays, electron beams, radiation, etc.). Irradiation to harden the curable resin.

再者,所述硬化性樹脂之中,較佳為藉由活性能量線(紫外線、電子束、放射線等)照射而硬化的活性能量線硬化樹脂。藉由包含活性能量線硬化樹脂,製造效率提昇,另外,可進一步抑制由其他層的形成所產生的高分子壓電膜的性能下降。Further, among the curable resins, an active energy ray-curable resin which is cured by irradiation with an active energy ray (ultraviolet rays, electron beams, radiation, or the like) is preferable. By including the active energy ray-curing resin, the production efficiency is improved, and the performance deterioration of the polymer piezoelectric film caused by the formation of the other layers can be further suppressed.

另外,當自硬化性樹脂來形成所述其他層時,就提高交聯密度的觀點而言,其他層較佳為包含具有三維交聯結構的三維交聯樹脂。Further, when the other layer is formed from a curable resin, the other layer preferably contains a three-dimensional crosslinked resin having a three-dimensional crosslinked structure from the viewpoint of increasing the crosslinking density.

作為製作具有三維交聯結構的硬化物的方法,可列舉使用具有3個以上的聚合性官能基的單體(三官能以上的單體)作為硬化性樹脂的方法、使用具有3個以上的聚合性官能基的交聯劑(三官能以上的交聯劑)的方法等,另外,亦可列舉使用有機過氧化物等交聯劑作為交聯劑的方法。再者,亦可將該些方法的多個組合使用。The method of producing a cured product having a three-dimensional crosslinked structure includes a method of using a monomer having three or more polymerizable functional groups (a trifunctional or higher monomer) as a curable resin, and a method of using three or more polymerizations. A method of using a functional group-based crosslinking agent (trifunctional or higher crosslinking agent), and the like, and a method using a crosslinking agent such as an organic peroxide as a crosslinking agent. Furthermore, a plurality of combinations of the methods may be used.

作為三官能以上的單體,例如可列舉:1分子中具有3個以上的(甲基)丙烯酸基的(甲基)丙烯酸化合物、或1分子中具有3個以上的環氧基的環氧化合物等。Examples of the trifunctional or higher monomer include a (meth)acrylic compound having three or more (meth)acrylic groups in one molecule, or an epoxy compound having three or more epoxy groups in one molecule. Wait.

另外,所謂「1分子中具有3個以上的(甲基)丙烯酸基」,是指1分子中具有丙烯酸基及甲基丙烯酸基的至少一者、且1分子中的丙烯酸基及甲基丙烯酸基的總數為3個以上。In addition, the term "having three or more (meth)acrylic groups in one molecule" means at least one of an acrylic group and a methacrylic group in one molecule, and an acrylic group and a methacrylic group in one molecule. The total number is more than three.

此處,作為確認其他層中所含有的材料是否為具有三維交聯結構的硬化物的方法,可列舉測定凝膠分率的方法。 具體而言,可自使其他層於溶劑中浸漬24小時後的不溶物導出凝膠分率。尤其,可推斷不論溶劑是水等親水性的溶媒,還是如甲苯般的親油性的溶媒,凝膠分率為一定以上者具有三維交聯結構。Here, as a method of confirming whether or not the material contained in the other layer is a cured product having a three-dimensional crosslinked structure, a method of measuring the gel fraction is exemplified. Specifically, the gel fraction can be derived from the insoluble matter after the other layer is immersed in the solvent for 24 hours. In particular, it can be inferred that the solvent is a hydrophilic solvent such as water or a lipophilic solvent such as toluene, and the gel fraction is a certain amount or more and has a three-dimensional crosslinked structure.

於濕式塗佈法的情況下,可於將塗佈液塗敷在高分子壓電膜的延伸前原膜上後使高分子壓電膜進行延伸,亦可於使高分子壓電膜原膜進行延伸後塗佈塗佈液。 作為由濕式塗佈法所形成的其他層的(1層的)厚度,較佳為幾十nm~10 μm的範圍。 另外,亦可對應於其目的而將折射率調整劑或紫外線吸收劑、調平劑、抗靜電劑、抗黏連劑等各種有機物、無機物添加至其他層中。 再者,就提昇高分子壓電膜表面與其他層的密接性、或提昇對於高分子壓電膜表面的塗敷性的觀點而言,亦可藉由電暈處理或ITRO處理、臭氧處理、電漿處理等來對高分子壓電膜表面進行處理。In the case of the wet coating method, the coating liquid can be applied to the pre-extended original film of the piezoelectric polymer film to extend the polymer piezoelectric film, or the polymer piezoelectric film can be used. The coating liquid was applied after the stretching. The thickness of the (one layer) of the other layer formed by the wet coating method is preferably in the range of several tens of nm to 10 μm. Further, various organic substances and inorganic substances such as a refractive index adjusting agent, an ultraviolet absorber, a leveling agent, an antistatic agent, and an anti-blocking agent may be added to other layers in accordance with the purpose. Further, from the viewpoint of improving the adhesion between the surface of the piezoelectric polymer film and other layers, or improving the coating property on the surface of the piezoelectric polymer film, corona treatment, ITRO treatment, ozone treatment, The surface of the polymer piezoelectric film is treated by plasma treatment or the like.

[脫模膜] 於本實施形態的膜捲層體中,積層膜較佳為進而具有配置在自功能層(X)觀察而與配置有高分子壓電膜之側相反的一側的脫模膜。本實施形態的膜捲層體藉由將具有高分子壓電膜、功能層(X)、及脫模膜的積層膜捲繞成輥狀而獲得,該積層膜較佳為MD方向的長度為10 m以上。[Release film] In the film roll layer of the present embodiment, the build-up film preferably has a mold release disposed on the side opposite to the side on which the polymer piezoelectric film is disposed, as viewed from the functional layer (X). membrane. The film roll layer of the present embodiment is obtained by winding a laminated film having a polymer piezoelectric film, a functional layer (X), and a release film into a roll shape, and the laminated film preferably has a length in the MD direction. More than 10 m.

作為脫模膜的材料,可適宜地使用具有脫模性(剝離性)的材料。脫模膜可為單獨的膜,亦可為包含多個層的多層膜。當脫模膜為包含多個層的多層膜時,脫模膜較佳為形成為將具有脫模性的材料設置在與接著層對向的面上的結構。於此情況下,脫模膜亦可形成為包含基材與具有脫模性的材料的結構。As the material of the release film, a material having mold release property (peelability) can be suitably used. The release film may be a separate film or a multilayer film comprising a plurality of layers. When the release film is a multilayer film including a plurality of layers, the release film is preferably formed to have a material having mold release property on a surface facing the adhesive layer. In this case, the release film may be formed into a structure including a substrate and a material having mold release properties.

作為具有脫模性的材料,例如,具體可列舉:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯等聚酯樹脂;聚乙烯、聚丙烯、聚甲基戊烯等烯烴樹脂;聚四氟乙烯、聚偏二氟乙烯等氟樹脂;聚氯乙烯、苯乙烯(甲基)丙烯酸共聚物、苯乙烯(甲基)丙烯酸酯共聚物、聚苯乙烯、乙烯-乙酸乙烯酯等乙烯基樹脂等。 另外,作為具有脫模性的材料,除所述以外,亦可列舉:聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚醯胺樹脂、矽酮樹脂、丙烯酸矽酮樹脂、三聚氰胺樹脂、醇酸樹脂、蠟樹脂等。 脫模膜可為該些的單獨的膜,亦可為包含多個層的多層膜。於此情況下,脫模膜較佳為形成為將具有脫模性的材料設置在與接著層對向的面上的結構。其中,就進一步提昇與接著層的剝離性的觀點而言,設置在與接著層對向的面上的具有脫模性的材料更佳為使用矽酮樹脂、氟樹脂、聚酯樹脂、聚烯烴樹脂、醇酸樹脂、蠟樹脂,進而更佳為使用矽酮樹脂。Specific examples of the material having releasability include polyester resins such as polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate; polyethylene, polypropylene, and the like. Olefin resin such as polymethylpentene; fluororesin such as polytetrafluoroethylene or polyvinylidene fluoride; polyvinyl chloride, styrene (meth)acrylic acid copolymer, styrene (meth) acrylate copolymer, polyphenylene A vinyl resin such as ethylene or ethylene-vinyl acetate. Further, as the material having mold release property, in addition to the above, examples thereof include a polyurethane resin, a polyimide resin, a polyamide resin, an anthrone resin, an acrylic resin, a melamine resin, and the like. Alkyd resin, wax resin, and the like. The release film may be a separate film of these or a multilayer film comprising a plurality of layers. In this case, the release film is preferably formed to have a material having mold release property on a surface facing the adhesive layer. Among them, from the viewpoint of further improving the releasability from the adhesive layer, it is more preferable to use a material having mold release property on the surface facing the adhesive layer to use an fluorenone resin, a fluororesin, a polyester resin, or a polyolefin. A resin, an alkyd resin, a wax resin, and more preferably an anthrone resin.

作為矽酮樹脂,例如可列舉:於有機錫系觸媒的存在下,使兩末端矽烷醇官能性二甲基聚矽氧烷與甲基氫聚矽氧烷或甲基甲氧基矽氧烷進行反應而成者(熱縮合反應型);於鉑系觸媒的存在下,使於分子鏈兩末端或兩末端及側鏈上具有乙烯基的甲基乙烯基聚矽氧烷與甲基氫聚矽氧烷進行反應而成者(熱加成反應型);向含有烯基與巰基的矽氧烷中添加光聚合劑而成者(紫外線硬化型(自由基加成型));使用與熱加成反應型相同的鉑系觸媒者(紫外線硬化型(氫化矽烷基型));向含有(甲基)丙烯酸基的矽氧烷中添加光聚合劑而成者(紫外線硬化型(自由基聚合型));向含有環氧基的矽氧烷中添加鎓鹽光起始劑而成者(紫外線硬化型(陽離子聚合型));含有自由基聚合性基的矽氧烷(電子束硬化型,其中,亦可不存在官能基,另外,亦可不存在光起始劑)。另外,矽酮樹脂的形態可自溶劑型、乳液型、無溶劑型等中適宜選擇來使用。Examples of the fluorenone resin include a terminal stanol-functional dimethyl polyoxyalkylene and methyl hydrogen polyoxy siloxane or methyl methoxy decane in the presence of an organotin-based catalyst. The reaction is carried out (thermal condensation reaction type); in the presence of a platinum-based catalyst, methyl vinyl polyoxyalkylene having a vinyl group at both ends or both ends of the molecular chain and a side chain, and methyl hydrogen A polysiloxane is used for the reaction (thermal addition reaction type); a photopolymerization agent is added to a decyl alkane containing an alkenyl group and a mercapto group (ultraviolet curing type (radical addition molding)); use and heat A platinum-based catalyst having the same addition reaction type (ultraviolet curing type (hydrogenated alkylene group)); a photopolymerization agent added to a (meth)acrylic group-containing oxirane (ultraviolet curing type (free radical) Polymerized)); a sulfonium salt photoinitiator added to an epoxy group-containing oxirane (ultraviolet curing type (cationic polymerization type)); a radical polymerizable group-containing oxime (electron beam hardening) a type in which a functional group is not present, and Photoinitiator). Further, the form of the fluorenone resin can be appropriately selected from the group consisting of a solvent type, an emulsion type, and a solventless type.

[基材] 當將脫模膜形成為包含基材與具有脫模性的材料的結構時,作為基材,可列舉聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸丁二酯、聚乙烯、聚丙烯、聚甲基戊烯、三乙醯基纖維素、賽珞玢、嫘縈、聚苯乙烯、聚碳酸酯、聚醯亞胺、聚醯胺、聚苯硫醚、聚醚醯亞胺、聚醚碸、芳香族聚醯胺、或聚碸等樹脂,且可列舉該些的單軸延伸膜或雙軸延伸膜、不織布、發泡體等。另外,作為基材,亦可自玻璃、金屬箔、陶瓷、紙等中選擇。[Substrate] When the release film is formed into a structure including a substrate and a material having mold release properties, examples of the substrate include polyethylene terephthalate, polyethylene naphthalate, and polybutylene. Butylene phthalate, polyethylene, polypropylene, polymethylpentene, triacetyl cellulose, cellophane, hydrazine, polystyrene, polycarbonate, polyimine, polyamine, Examples of the polyphenylene sulfide, the polyether quinone, the polyether fluorene, the aromatic polyamine, or the polyfluorene resin include uniaxially stretched films, biaxially stretched films, nonwoven fabrics, and foams. Further, the substrate may be selected from glass, metal foil, ceramics, paper, and the like.

於脫模膜中,視需要亦可在與接著層對向的面以外的層上設置包含抗靜電劑、寡聚物轉移抑制劑、平滑化劑、易接著劑等其他材料的層。例如,當將脫模膜形成為包含基材與具有脫模性的材料的結構時,可在基材與具有脫模性的材料相互對向的面、及基材的與具有脫模性的材料對向的面其相反側的面中的任一者或兩者的面上設置包含所述其他材料的層。In the release film, a layer containing another material such as an antistatic agent, an oligomer transfer inhibitor, a smoothing agent, or an easy adhesive may be provided on a layer other than the surface facing the adhesive layer as needed. For example, when the release film is formed into a structure including a substrate and a material having mold release property, the surface of the substrate and the material having the release property and the release property of the substrate can be released. A layer comprising the other material is disposed on the face of either or both of the opposing faces of the material.

脫模膜的膜厚並無特別限定,但就脫模的容易性及操作的觀點而言,較佳為5 μm以上的範圍,更佳為10 μm~100 μm的範圍,進而更佳為20 μm~80 μm的範圍,特佳為30 μm~80 μm的範圍。The film thickness of the release film is not particularly limited, but is preferably in the range of 5 μm or more, more preferably in the range of 10 μm to 100 μm, and still more preferably 20 in terms of ease of release and handling. The range of μm to 80 μm is particularly preferably in the range of 30 μm to 80 μm.

為了可適宜地剝離脫模膜,較佳為接著層與高分子壓電膜的接著力大於接著層與脫模膜的接著力。In order to suitably peel off the release film, it is preferred that the adhesion of the adhesive layer to the polymer piezoelectric film is greater than the adhesion of the adhesive layer to the release film.

作為形成脫模膜的方法,可適宜使用先前通常所使用的公知的方法。例如,脫模膜可藉由利用製膜機對形成脫模膜的樹脂進行擠出製膜來形成。當脫模膜為包含多個層的多層膜時,可藉由接著劑來將經製膜的各個脫模膜形成為多層,亦可利用多層製膜機進行共擠出製膜來形成為多層。 另外,當脫模膜是形成為包含基材與具有脫模性的材料的結構的包含多個層的多層膜時,可藉由接著劑來將經製膜的基材與經製膜的具有脫模性的材料形成為多層,亦可於經製膜的基材上對具有脫模性的材料進行擠出製膜來形成為多層、或利用多層製膜機對構成基材的材料與具有脫模性的材料進行共擠出製膜來形成為多層。As a method of forming the release film, a known method which has been conventionally used can be suitably used. For example, the release film can be formed by extrusion-forming a resin forming a release film by a film forming machine. When the release film is a multilayer film including a plurality of layers, each of the film-formed release films may be formed into a plurality of layers by an adhesive, or may be formed into a plurality of layers by co-extrusion film formation using a multilayer film forming machine. . Further, when the release film is a multilayer film including a plurality of layers including a structure of a substrate and a material having mold releasability, the film-formed substrate and the film-formed film can be formed by an adhesive agent. The release material is formed into a plurality of layers, and the material having mold release property may be extrusion-molded on the film-formed substrate to form a plurality of layers, or a material of the substrate may be formed by using a multilayer film machine. The release material is coextruded to form a film.

進而,亦可藉由濕式塗佈法來形成。例如,當藉由濕式塗佈法來形成脫模膜時,可藉由將分散或溶解有用以形成脫模膜的材料(樹脂、添加劑等)的塗佈液(脫模膜用塗敷液)塗佈於接著層上來形成。另外,當脫模膜是形成為包含基材與具有脫模性的材料的結構的包含多個層的多層膜時,可藉由將脫模膜用塗敷液塗佈於基材上來形成。Further, it can also be formed by a wet coating method. For example, when a release film is formed by a wet coating method, a coating liquid (a release coating film) for dissolving or dissolving a material (resin, additive, etc.) which is useful for forming a release film can be used. ) is formed by coating on the adhesive layer. Further, when the release film is a multilayer film including a plurality of layers including a substrate and a material having a release property, it can be formed by applying a coating liquid for a release film onto a substrate.

當藉由濕式塗佈法來形成具有脫模性的材料時,可藉由將所述具有脫模性的材料設為溶液或乳液等塗佈液,利用輥塗機、缺角輪塗佈機、模塗機、邁耶棒(Meyer bar)塗佈機、反向輥塗機、凹版塗佈機等公知的方法將其塗佈於接著層上、或基材上並進行乾燥來形成。 再者,當脫模膜為包含多個層的多層膜時,亦可對脫模膜的與接著層對向的面相反側的面、或接觸脫模膜的與接著層對向的面其相反側的面的基材等實施電暈放電處理、火焰處理、臭氧處理等表面活化處理,或使用增黏處理劑的增黏塗佈處理。多層膜的密接性藉由此種處理而提昇,因此可進一步提昇與接著層的脫模性。When a material having mold release property is formed by a wet coating method, the material having mold release property can be used as a coating liquid such as a solution or an emulsion, and can be coated by a roll coater or a notch wheel. A known method such as a machine, a die coater, a Meyer bar coater, a reverse roll coater, or a gravure coater is applied to an adhesive layer or a substrate and dried. Further, when the release film is a multilayer film including a plurality of layers, the surface of the release film opposite to the surface facing the adhesive layer or the surface of the release film facing the adhesive layer may be The base material of the surface on the opposite side is subjected to surface activation treatment such as corona discharge treatment, flame treatment, ozone treatment, or tackifying coating treatment using a tackifier. The adhesion of the multilayer film is enhanced by such treatment, so that the release property from the adhesive layer can be further improved.

<膜捲層體的製造方法> 以下對本發明的膜捲層體的製造方法的實施形態進行說明。作為膜捲層體的製造方法,例如可列舉:於脫模膜上形成功能層(X),將功能層(X)與高分子壓電膜貼合後製成膜捲層體的方法;於高分子壓電膜上形成功能層(X),將功能層(X)與脫模膜貼合後製成膜捲層體的方法等。<Method for Producing Film Reel Body> Hereinafter, an embodiment of the method for producing a film reel body of the present invention will be described. Examples of the method for producing the film roll layer include a method of forming a functional layer (X) on a release film, and bonding the functional layer (X) and the polymer piezoelectric film to form a film roll layer; A method of forming a functional layer (X) on a polymer piezoelectric film, bonding a functional layer (X) to a release film, and forming a film roll layer.

[第一實施形態] 第一實施形態的膜捲層體的製造方法包括:將用以形成功能層(X)的功能層形成劑賦予至脫模膜的主面上來形成功能層(X)的步驟;在自功能層(X)觀察而與配置有脫模膜之側相反的一側,將功能層(X)與高分子壓電膜貼合來形成積層膜的步驟;以及將所形成的積層膜捲繞成輥狀的步驟。於該製造方法中,將形成於脫模膜上的功能層(X)與高分子壓電膜貼合來形成積層膜,並將所形成的積層膜捲繞成輥狀來製造膜捲層體。[First Embodiment] A method for producing a film roll layer body according to the first embodiment includes applying a functional layer forming agent for forming a functional layer (X) to a main surface of a release film to form a functional layer (X). a step of forming a laminated film by bonding a functional layer (X) and a piezoelectric polymer film on the side opposite to the side on which the release film is disposed, as viewed from the functional layer (X); and forming the laminated film The step of winding the laminated film into a roll shape. In the manufacturing method, the functional layer (X) formed on the release film is bonded to the piezoelectric polymer film to form a laminated film, and the formed laminated film is wound into a roll to produce a film wound body. .

-功能層(X)的形成- 本實施形態的膜捲層體的製造方法包括將用以形成功能層(X)的功能層形成劑賦予至脫模膜的主面上來形成功能層(X)的步驟。此時,可將膜狀或片狀的材料(例如,所述OCA)作為功能層形成劑賦予至脫模膜的主面上來形成功能層(X),亦可將液狀的功能層形成劑(例如,黏著塗佈液)賦予至脫模膜的主面上,並使所賦予的功能層形成劑乾燥來形成功能層(X)。此時,功能層形成劑的乾燥溫度較佳為50℃~150℃,更佳為70℃~130℃。另外,當將功能層(X)賦予至脫模膜的主面上時,亦可使用塗敷裝置。- Formation of Functional Layer (X) - The method for producing a film wound layer according to the present embodiment includes applying a functional layer forming agent for forming the functional layer (X) to the main surface of the release film to form a functional layer (X) A step of. In this case, a film-like or sheet-like material (for example, the OCA) may be applied as a functional layer forming agent to the main surface of the release film to form the functional layer (X), or a liquid functional layer forming agent may be used. (for example, an adhesive coating liquid) is applied to the main surface of the release film, and the functional layer forming agent to be applied is dried to form a functional layer (X). At this time, the drying temperature of the functional layer forming agent is preferably from 50 ° C to 150 ° C, more preferably from 70 ° C to 130 ° C. Further, when the functional layer (X) is applied to the main surface of the release film, a coating device can also be used.

此處,作為功能層(X),較佳為接著層,作為功能層形成劑,較佳為接著劑。因此,亦可將接著劑賦予至脫模膜的主面上來形成接著層。作為接著劑,可列舉:所述OCA,溶劑系、無溶劑系、水系等的黏著塗佈液,UV硬化型OCR,熱熔接著劑等。Here, as the functional layer (X), a bonding layer is preferable, and as a functional layer forming agent, an adhesive is preferable. Therefore, an adhesive may be applied to the main surface of the release film to form an adhesive layer. Examples of the adhesive agent include an OCA, a solvent-based, solvent-free, water-based adhesive coating liquid, a UV-curable OCR, and a hot-melt adhesive.

-積層膜的形成- 本實施形態的膜捲層體的製造方法如上所述,於形成功能層(X)後,包括在自功能層(X)觀察而與配置有脫模膜之側相反的一側,將功能層(X)與高分子壓電膜貼合來形成積層膜的步驟。藉此,可獲得於高分子壓電膜的主面的鉛垂方向上依次積層有高分子壓電膜、功能層(X)及脫模膜的三層的積層膜。- Formation of laminated film - As described above, after the formation of the functional layer (X), the method for producing the laminated film of the present embodiment includes the opposite to the side on which the release film is disposed, as viewed from the functional layer (X). On one side, a step of laminating the functional layer (X) and the piezoelectric polymer film to form a laminated film. As a result, a laminated film of a polymer piezoelectric film, a functional layer (X), and a release film can be sequentially laminated in the vertical direction of the main surface of the piezoelectric polymer film.

進而,亦可於另一脫模膜的主面上形成功能層(X),並在自該功能層(X)觀察而與配置有脫模膜之側相反的一側,將該功能層(X)與構成如所述般形成的三層的積層膜的高分子壓電膜貼合。藉此,可獲得於高分子壓電膜的主面的鉛垂方向上依次積層有脫模膜、功能層(X)、高分子壓電膜、功能層(X)及脫模膜的五層的積層膜。Further, the functional layer (X) may be formed on the main surface of the other release film, and the functional layer may be formed on the side opposite to the side on which the release film is disposed as viewed from the functional layer (X). X) is bonded to a polymer piezoelectric film constituting a three-layer laminated film formed as described above. Thereby, the release film, the functional layer (X), the polymer piezoelectric film, the functional layer (X), and the release film can be laminated in the vertical direction of the main surface of the piezoelectric polymer film. Laminated film.

另外,用於積層膜的形成的高分子壓電膜亦可於至少一個主面上配置有所述其他層。藉此,當形成積層膜時,在功能層(X)與高分子壓電膜之間配置其他層。Further, the polymer piezoelectric film used for forming the buildup film may be provided with the other layer on at least one main surface. Thereby, when a laminated film is formed, another layer is disposed between the functional layer (X) and the polymer piezoelectric film.

-膜捲層體的製造- 本實施形態的膜捲層體的製造方法包括將所形成的積層膜捲繞成輥狀的步驟。藉此,可獲得輥狀的膜捲層體。 於本實施形態的製造方法中,並非於高分子壓電膜上形成功能層(X),而是於脫模膜上形成功能層(X),且將所形成的功能層(X)與高分子壓電膜貼合。因此,無需對高分子壓電膜進行加熱,於高分子壓電膜中產生伸展的情況得到抑制。其結果,於MD方向上,可將以所述方式測定的尺寸變化率設為1.0%以下。進而,藉由本實施形態的製造方法所獲得的膜捲層體的尺寸穩定性高,因此進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜的耐濕熱性優異。- Manufacture of Film Reel Body - The method for producing a film reel body of the present embodiment includes a step of winding the formed laminated film into a roll shape. Thereby, a roll-shaped film wrap layer can be obtained. In the manufacturing method of the present embodiment, the functional layer (X) is not formed on the polymer piezoelectric film, but the functional layer (X) is formed on the release film, and the functional layer (X) formed is high. The molecular piezoelectric film is bonded. Therefore, it is not necessary to heat the piezoelectric polymer film, and the occurrence of stretching in the polymer piezoelectric film is suppressed. As a result, the dimensional change rate measured in the above manner can be set to 1.0% or less in the MD direction. Further, since the film roll layer obtained by the production method of the present embodiment has high dimensional stability, the occurrence of cracks in the polymer piezoelectric film during heating is suppressed, and the heat resistance of the polymer piezoelectric film is suppressed. Excellent sex.

以下,使用圖1表示藉由輥對輥的連續製程來製造膜捲層體的方法的一例。圖1是表示於本發明的第一實施形態中,在脫模膜上形成接著層來製造膜捲層體的方法的概略圖。Hereinafter, an example of a method of producing a film wrap by a continuous process of a roll-to-roller will be described with reference to FIG. Fig. 1 is a schematic view showing a method of producing a film roll layer by forming an adhesive layer on a release film in the first embodiment of the present invention.

首先,於膜捲層體製造裝置10中,自固定於輥體上的輥狀脫模膜1中抽出脫模膜2,並利用另一個輥體捲取所抽出的脫模膜2。而且,使用塗敷裝置8將接著劑3塗敷於輥間的脫模膜2上。將接著劑3塗敷於脫模膜2上後,藉由乾燥機構(乾燥爐)9來使接著劑3乾燥,而於脫模膜2的主面上形成接著層4。First, in the film roll layer production apparatus 10, the release film 2 is taken out from the roll-shaped release film 1 fixed to the roll body, and the extracted release film 2 is taken up by the other roll body. Further, the adhesive 3 is applied onto the release film 2 between the rolls using the coating device 8. After the adhesive 3 is applied onto the release film 2, the adhesive 3 is dried by a drying mechanism (drying furnace) 9, and the adhesive layer 4 is formed on the main surface of the release film 2.

另外,自固定於輥體上的輥狀高分子壓電膜5中抽出高分子壓電膜6,將所抽出的高分子壓電膜6貼合於脫模膜2上後,與脫模膜2一同由輥體捲取。因此,當於脫模膜2的主面上形成有接著層4時,藉由將接著層4與高分子壓電膜6貼合,而形成積層膜。而且,藉由將所形成的積層膜捲繞成輥狀,可獲得膜捲層體7。In addition, the piezoelectric polymer film 6 is taken out from the roll-shaped polymer piezoelectric film 5 fixed to the roll body, and the extracted polymer piezoelectric film 6 is bonded to the release film 2, and then released from the release film. 2 is taken together by the roller body. Therefore, when the adhesive layer 4 is formed on the main surface of the release film 2, the adhesive layer is formed by bonding the adhesive layer 4 to the polymer piezoelectric film 6. Further, the film laminated body 7 can be obtained by winding the formed laminated film into a roll shape.

於輥對輥的連續製程中,朝向膜的前進方向(MD方向)而在輥間的膜中產生張力。因此,於將含有聚乳酸等脂肪族系聚酯的高分子壓電膜設置於輥間,並在形成接著層時對高分子壓電膜施加熱的情況下,因高分子壓電膜的耐熱性低,故存在因所產生的張力而於高分子壓電膜中產生伸展,高分子壓電膜的尺寸穩定性惡化之虞。In the continuous process of the roll-to-roll, tension is generated in the film between the rolls in the advancing direction (MD direction) of the film. Therefore, when a piezoelectric polymer film containing an aliphatic polyester such as polylactic acid is placed between rolls, and heat is applied to the polymer piezoelectric film when the adhesive layer is formed, heat resistance of the polymer piezoelectric film is caused. Since the properties are low, stretching occurs in the piezoelectric polymer film due to the generated tension, and the dimensional stability of the polymer piezoelectric film is deteriorated.

另一方面,於如圖1所示的輥對輥的連續製程中,因於脫模膜上形成有接著層,故無需對高分子壓電膜施加熱。因此,高分子壓電膜的伸展得到抑制,可維持高分子壓電膜的尺寸穩定性。On the other hand, in the continuous process of the roll-to-roll as shown in Fig. 1, since the adhesive layer is formed on the release film, it is not necessary to apply heat to the polymer piezoelectric film. Therefore, the stretching of the polymer piezoelectric film is suppressed, and the dimensional stability of the polymer piezoelectric film can be maintained.

[第二實施形態] 繼而,對第二實施形態的膜捲層體的製造方法進行說明。再者,關於與第一實施形態共通的事項,省略其說明。第二實施形態的膜捲層體的製造方法包括:將用以形成所述功能層(X)的功能層形成劑塗佈於所述高分子壓電膜的至少一個主面上,並以90℃以下的溫度使所塗佈的所述功能層形成劑乾燥來形成功能層(X)的步驟;在自所述功能層(X)觀察而與配置有所述高分子壓電膜之側相反的一側,將所述功能層(X)與所述脫模膜貼合來形成所述積層膜的步驟;以及將所形成的所述積層膜捲繞成輥狀的步驟。於該製造方法中,以90℃以下的溫度使功能層形成劑乾燥來將功能層(X)形成於高分子壓電膜上後,將形成於高分子壓電膜上的功能層(X)與脫模膜貼合來形成積層膜,並將所形成的積層膜捲繞成輥狀來製造膜捲層體。[Second Embodiment] Next, a method of manufacturing the film wound layer body of the second embodiment will be described. In addition, the description of the matter common to the first embodiment will be omitted. The method for producing a film roll layer body according to the second embodiment includes applying a functional layer forming agent for forming the functional layer (X) to at least one main surface of the polymer piezoelectric film, and a step of drying the applied functional layer forming agent to form the functional layer (X) at a temperature lower than ° C; opposite to the side on which the piezoelectric film is disposed, as viewed from the functional layer (X) One side, a step of bonding the functional layer (X) to the release film to form the laminated film, and a step of winding the formed laminated film into a roll shape. In the production method, the functional layer forming agent is dried at a temperature of 90 ° C or lower to form the functional layer (X) on the piezoelectric polymer film, and then the functional layer (X) formed on the piezoelectric film of the polymer is formed. The laminated film is formed by laminating with a release film, and the formed laminated film is wound into a roll shape, and a film roll body is manufactured.

-功能層(X)的形成- 本實施形態的膜捲層體的製造方法包括將用以形成功能層(X)的功能層形成劑塗佈於高分子壓電膜的至少一個主面上,並以90℃以下的溫度使所塗佈的功能層形成劑乾燥來形成功能層(X)的步驟。此時,功能層形成劑的乾燥溫度較佳為50℃~90℃,更佳為60℃~80℃。藉此,可更適宜地維持高分子壓電膜的尺寸穩定性。- Formation of Functional Layer (X) - The method for producing a film wound layer according to the present embodiment includes applying a functional layer forming agent for forming a functional layer (X) on at least one main surface of the piezoelectric polymer film. The step of forming the functional layer (X) by drying the applied functional layer forming agent at a temperature of 90 ° C or lower. At this time, the drying temperature of the functional layer forming agent is preferably from 50 ° C to 90 ° C, more preferably from 60 ° C to 80 ° C. Thereby, the dimensional stability of the polymer piezoelectric film can be more suitably maintained.

此處,作為功能層(X),較佳為接著層,作為功能層形成劑,較佳為接著劑。因此,亦可將接著劑賦予至高分子壓電膜的主面上來形成接著層。作為接著劑,可列舉:所述OCA,溶劑系、無溶劑系、水系等的黏著塗佈液,UV硬化型OCR,熱熔接著劑等。Here, as the functional layer (X), a bonding layer is preferable, and as a functional layer forming agent, an adhesive is preferable. Therefore, an adhesive may be applied to the main surface of the piezoelectric polymer film to form an adhesive layer. Examples of the adhesive agent include an OCA, a solvent-based, solvent-free, water-based adhesive coating liquid, a UV-curable OCR, and a hot-melt adhesive.

-積層膜的形成- 本實施形態的膜捲層體的製造方法如上所述,於形成功能層(X)後,包括在自功能層(X)觀察而與配置有高分子壓電膜之側相反的一側,將功能層(X)與脫模膜貼合來形成積層膜的步驟。當於高分子壓電膜的一個主面上形成功能層(X)時,可獲得於高分子壓電膜的主面的鉛垂方向上依次積層有高分子壓電膜、功能層(X)及脫模膜的三層的積層膜。當於高分子壓電膜的兩個主面上形成功能層(X)時,可獲得於高分子壓電膜的主面的鉛垂方向上依次積層有脫模膜、功能層(X)、高分子壓電膜、功能層(X)及脫模膜的五層的積層膜。- Formation of laminated film - As described above, after the formation of the functional layer (X), the method for producing the laminated film includes the side of the functional layer (X) and the side on which the piezoelectric film is disposed. On the opposite side, a step of bonding the functional layer (X) to the release film to form a laminated film. When the functional layer (X) is formed on one main surface of the piezoelectric polymer film, the polymer piezoelectric film and the functional layer (X) are sequentially laminated in the vertical direction of the main surface of the piezoelectric polymer film. And a three-layer laminated film of the release film. When the functional layer (X) is formed on the two main surfaces of the piezoelectric polymer film, a release film, a functional layer (X), and a functional layer (X) are sequentially laminated in the vertical direction of the main surface of the piezoelectric polymer film. A five-layer laminated film of a polymer piezoelectric film, a functional layer (X), and a release film.

-膜捲層體的製造- 本實施形態的膜捲層體的製造方法包括將所形成的積層膜捲繞成輥狀的步驟。藉此,可獲得輥狀的膜捲層體。 於本實施形態的製造方法中,當於高分子壓電膜上形成功能層(X)時,以90℃以下的溫度使高分子壓電膜上的功能層形成劑乾燥。因此,與以超過90℃的溫度使高分子壓電膜上的功能層形成劑乾燥來形成功能層(X)時相比,高分子壓電膜的伸展得到抑制。其結果,於MD方向上,可將以所述方式測定的尺寸變化率設為1.0%以下。進而,藉由本實施形態的製造方法所獲得的膜捲層體的尺寸穩定性高,因此進行了加熱時的高分子壓電膜中的裂紋的產生得到抑制、且高分子壓電膜的耐濕熱性優異。- Manufacture of Film Reel Body - The method for producing a film reel body of the present embodiment includes a step of winding the formed laminated film into a roll shape. Thereby, a roll-shaped film wrap layer can be obtained. In the production method of the present embodiment, when the functional layer (X) is formed on the piezoelectric polymer film, the functional layer forming agent on the piezoelectric polymer film is dried at a temperature of 90 ° C or lower. Therefore, the stretching of the polymer piezoelectric film is suppressed as compared with the case where the functional layer forming agent on the piezoelectric polymer film is dried at a temperature exceeding 90 ° C to form the functional layer (X). As a result, the dimensional change rate measured in the above manner can be set to 1.0% or less in the MD direction. Further, since the film roll layer obtained by the production method of the present embodiment has high dimensional stability, the occurrence of cracks in the polymer piezoelectric film during heating is suppressed, and the heat resistance of the polymer piezoelectric film is suppressed. Excellent sex.

以下,使用圖2表示藉由輥對輥的連續製程來製造膜捲層體的方法的一例。圖2是表示於本發明的第二實施形態中,在脫模膜上形成接著層來製造膜捲層體的方法的概略圖。Hereinafter, an example of a method of producing a film corrugated body by a continuous process of a roll-to-roller will be described with reference to FIG. 2 is a schematic view showing a method of producing a film roll layer by forming an adhesive layer on a release film in the second embodiment of the present invention.

首先,於膜捲層體製造裝置20中,自固定於輥體上的輥狀高分子壓電膜11中抽出高分子壓電膜12,並利用另一個輥體捲取所抽出的高分子壓電膜12。而且,使用塗敷裝置18將接著劑13塗敷於輥間的高分子壓電膜12上。將接著劑13塗敷於高分子壓電膜12上後,藉由乾燥機構(乾燥爐)19並以90℃以下的溫度來使接著劑13乾燥,而於高分子壓電膜12的主面上形成接著層14。First, in the film roll layer manufacturing apparatus 20, the polymer piezoelectric film 12 is taken out from the roll-shaped polymer piezoelectric film 11 fixed to the roll body, and the extracted polymer pressure is taken up by the other roll body. Electrical film 12. Further, the adhesive 13 is applied onto the piezoelectric polymer film 12 between the rolls by using the coating device 18. After the adhesive 13 is applied onto the polymer piezoelectric film 12, the adhesive 13 is dried by a drying means (drying furnace) 19 at a temperature of 90 ° C or lower, and is applied to the main surface of the piezoelectric polymer film 12. An adhesive layer 14 is formed thereon.

另外,自固定於輥體上的輥狀脫模膜15中抽出脫模膜16,將所抽出的脫模膜16貼合於高分子壓電膜12上後,高分子壓電膜12均由輥體捲取。因此,當於高分子壓電膜12的主面上形成有接著層14時,藉由將接著層14與脫模膜16貼合而形成積層膜。而且,藉由將所形成的積層膜捲繞成輥狀,可獲得膜捲層體17。Further, the release film 16 is taken out from the roll-shaped release film 15 fixed to the roll body, and the extracted release film 16 is bonded to the polymer piezoelectric film 12, and the polymer piezoelectric film 12 is Roller coiling. Therefore, when the adhesive layer 14 is formed on the main surface of the piezoelectric polymer film 12, the adhesive layer 16 is bonded to the release film 16 to form a laminated film. Further, the film laminated body 17 can be obtained by winding the formed laminated film into a roll shape.

於輥對輥的連續製程中,朝向膜的前進方向(MD方向)而在輥間的膜中產生張力。因此,於將含有聚乳酸等脂肪族系聚酯的高分子壓電膜設置於輥間,並在形成接著層時對高分子壓電膜施加熱的情況下,因高分子壓電膜的耐熱性低,故存在因所施加的熱、且因所產生的張力而於高分子壓電膜中產生伸展,高分子壓電膜的尺寸穩定性惡化之虞。In the continuous process of the roll-to-roll, tension is generated in the film between the rolls in the advancing direction (MD direction) of the film. Therefore, when a piezoelectric polymer film containing an aliphatic polyester such as polylactic acid is placed between rolls, and heat is applied to the polymer piezoelectric film when the adhesive layer is formed, heat resistance of the polymer piezoelectric film is caused. Since the properties are low, stretching occurs in the piezoelectric polymer film due to the applied heat, and the dimensional stability of the piezoelectric polymer film is deteriorated.

另一方面,於本實施形態中的輥對輥的連續製程中,因將於高分子壓電膜上形成接著層時的接著劑的乾燥溫度設為90℃以下,故高分子壓電膜的伸展得到抑制,可維持高分子壓電膜的尺寸穩定性。On the other hand, in the continuous process of the roll-to-roll process of the present embodiment, since the drying temperature of the adhesive when the adhesive layer is formed on the polymer piezoelectric film is 90 ° C or lower, the piezoelectric film of the polymer The stretching is suppressed, and the dimensional stability of the polymer piezoelectric film can be maintained.

<膜捲層體的用途> 膜捲層體可用於揚聲器、頭戴式耳機、觸控面板、遙控器、麥克風、水中麥克風、超音波轉換器(ultrasonic transducer)、超音波應用測量器、壓電振盪器、機械過濾器、壓電變壓器、延遲裝置、感測器、加速度感測器、衝擊感測器、振動感測器、感壓感測器、觸覚感測器、電場感測器、聲壓感測器、顯示器、風扇、泵、可變焦點鏡、隔音材料、防音材料、鍵盤、音響機器、資訊處理機、測量機器、醫用機器等各種領域中,就可將用於元件時的感測器感度維持得高的方面而言,特佳為於各種感測器的領域中利用膜捲層體。 另外,膜捲層體亦可用作與顯示裝置組合而成的觸控面板。作為顯示裝置,例如亦可使用液晶面板、有機電致發光(Electroluminescence,EL)面板等。 另外,膜捲層體亦可作為感壓感測器而與其他方式的觸控面板(位置檢測構件)組合來使用。作為位置檢測構件的檢測方式,可列舉:抗膜方式、靜電電容方式、表面彈性波方式、紅外線方式、光學方式等。 [實施例]<Uses of film roll layer> Film roll body can be used for speakers, headphones, touch panels, remote controls, microphones, underwater microphones, ultrasonic transducers, ultrasonic application measuring instruments, piezoelectric Oscillator, mechanical filter, piezoelectric transformer, delay device, sensor, acceleration sensor, impact sensor, vibration sensor, pressure sensor, touch sensor, electric field sensor, Sound pressure sensors, displays, fans, pumps, variable focus mirrors, soundproofing materials, soundproofing materials, keyboards, audio equipment, information processing machines, measuring machines, medical machines, etc., can be used in components In terms of the sensor sensitivity being maintained high, it is particularly advantageous to utilize a film roll layer in the field of various sensors. In addition, the film roll layer body can also be used as a touch panel combined with a display device. As the display device, for example, a liquid crystal panel, an organic electroluminescence (EL) panel, or the like can be used. Further, the film roll layer body can also be used as a pressure sensitive sensor in combination with another type of touch panel (position detecting member). Examples of the detection method of the position detecting member include an anti-film method, a capacitance method, a surface elastic wave method, an infrared method, and an optical method. [Examples]

以下,藉由實施例來更具體地說明本發明的膜捲層體,但本發明只要不超出其主旨,則並不限定於以下的實施例。Hereinafter, the film wound layer body of the present invention will be more specifically described by way of examples, but the present invention is not limited to the following examples as long as the scope of the invention is not exceeded.

<製造例1:高分子壓電膜的製作> 作為螺旋手性高分子(A),準備萘琪沃克有限責任公司公司製造的聚乳酸(PLA)(品名:IngeoTM biopolymer,商標:4032D,重量平均分子量Mw:20萬),相對於該聚乳酸99質量份,添加下述添加劑X(穩定劑(B))1質量份並進行乾摻來製備原料。 將所製備的原料投入至擠出成形機料斗中,一面加熱至220℃~230℃一面自T字模中擠出,並接觸50℃的鑄造輥0.5分鐘,而對厚度為150 μm的預結晶化膜進行製膜(成形步驟)。對所獲得的預結晶化膜的結晶度進行測定,結果為4.91%。 一面將所獲得的預結晶化膜加熱至70℃,一面藉由輥對輥以1650 mm/min的延伸速度開始延伸,於MD方向上單軸延伸至3.5倍為止,而獲得單軸延伸膜(延伸步驟)。 其後,藉由輥對輥,使單軸延伸膜接觸加熱至130℃的輥上78秒來進行退火處理後(退火步驟),利用設定成50℃的輥進行急速冷卻,進而捲取成輥狀,藉此獲得高分子壓電膜。<Production Example 1: Preparation of polymer piezoelectric film> As a helical chiral polymer (A), polylactic acid (PLA) manufactured by Natchi Walker Co., Ltd. was prepared (product name: Ingeo TM biopolymer, trademark: 4032D, weight The average molecular weight Mw: 200,000, and 1 part by mass of the following additive X (stabilizer (B)) was added to 99 parts by mass of the polylactic acid, and dry blending was carried out to prepare a raw material. The prepared raw materials were placed in an extruder hopper, and extruded from a T-shaped mold while being heated to 220 ° C to 230 ° C, and contacted with a casting roll at 50 ° C for 0.5 minutes to pre-crystallize the thickness of 150 μm. The film is formed into a film (forming step). The crystallinity of the obtained precrystallized film was measured and found to be 4.91%. The obtained pre-crystallized film was heated to 70 ° C while being stretched by a roll-to-roll roll at an elongation speed of 1,650 mm/min, and uniaxially stretched to 3.5 times in the MD direction to obtain a uniaxially stretched film ( Extension step). Thereafter, the uniaxially stretched film was brought into contact with a roll heated to 130 ° C for 78 seconds by a roll-to-roller to perform annealing treatment (annealing step), and was rapidly cooled by a roll set to 50 ° C, and further wound into a roll. In this manner, a polymer piezoelectric film is obtained.

-添加劑X(穩定劑(B))- 作為添加劑X,使用萊茵化學公司製造的Stabaxol I(70質量份)、及日清紡化學股份有限公司製造的Carbodilite LA-1(30質量份)的混合物。 所述混合物中的各成分的詳細情況如下所述。 Stabaxol I…雙-2,6-二異丙基苯基碳二醯亞胺(分子量(=重量平均分子量):363) Carbodilite LA-1…聚(4,4'-二環己基甲烷碳二醯亞胺)(重量平均分子量:約2000)- Additive X (stabilizer (B)) - As the additive X, a mixture of Stabaxol I (70 parts by mass) manufactured by Rhein Chemie Co., Ltd. and Carbodilite LA-1 (30 parts by mass) manufactured by Nisshinbo Chemical Co., Ltd. was used. The details of the components in the mixture are as follows. Stabaxol I...bis-2,6-diisopropylphenylcarbodiimide (molecular weight (=weight average molecular weight): 363) Carbodilite LA-1...poly(4,4'-dicyclohexylmethane carbon dioxide Imine) (weight average molecular weight: about 2000)

藉由以下的方法來測定製造例1中所使用的聚乳酸的物性。結果如表1所示。The physical properties of the polylactic acid used in Production Example 1 were measured by the following methods. The results are shown in Table 1.

<光學純度> 以如下方式測定製造例1中所製作的高分子壓電膜中所含有的聚乳酸的光學純度。 首先,向50 mL的三角燒瓶中秤入1.0 g的樣品(所述高分子壓電膜),並向其中添加異丙醇(Isopropyl Alcohol,IPA)2.5 mL與5.0 mol/L氫氧化鈉溶液5 mL,而製成樣品溶液。 繼而,將加入有該樣品溶液的三角燒瓶放入至溫度為40℃的水浴中,攪拌約5小時直至聚乳酸完全進行水解為止。 將所述約5小時的攪拌後的樣品溶液冷卻至室溫為止後,添加1.0 mol/L鹽酸溶液20 mL進行中和,然後將三角燒瓶封口並充分地攪拌混合。 繼而,將所述經攪拌混合的樣品溶液的1.0 mL分取至25 mL的定量瓶中,並向其中添加下述組成的流動相,而獲得25 mL的HPLC試樣溶液1。 將5 μL的所獲得的HPLC試樣溶液1注入至HPLC裝置中,於下述HPLC測定條件下進行HPLC測定。根據所獲得的測定結果,求出源自聚乳酸的D體的峰值的面積與源自聚乳酸的L體的峰值的面積,並算出L體的量與D體的量。根據所獲得的結果,求出光學純度(%ee)。 其結果,光學純度為97.0%ee。再者,於下述表1中,「LA」表示聚乳酸。 -HPLC測定條件- ·管柱 光學分割管柱,住化分析中心(股份)製造的蘇米齊若(SUMICHIRAL)OA5000 ·HPLC裝置 日本分光股份有限公司製造的液相層析儀 ·管柱溫度 25℃ ·流動相的組成 1.0 mM-硫酸銅(II)緩衝液/IPA=98/2(V/V) (於該流動相中,硫酸銅(II)、IPA、及水的比率為硫酸銅(II)/IPA/水=156.4 mg/20 mL/980 mL) ·流動相流量 1.0 mL/min ·檢測器 紫外線檢測器(UV254 nm)<Optical Purity> The optical purity of the polylactic acid contained in the piezoelectric polymer film produced in Production Example 1 was measured in the following manner. First, a 1.0 g sample (the polymer piezoelectric membrane) was weighed into a 50 mL Erlenmeyer flask, and Isopropyl Alcohol (IPA) 2.5 mL and 5.0 mol/L sodium hydroxide solution were added thereto. mL, and make a sample solution. Then, the Erlenmeyer flask to which the sample solution was added was placed in a water bath at a temperature of 40 ° C, and stirred for about 5 hours until the polylactic acid was completely hydrolyzed. After the stirred sample solution of about 5 hours was cooled to room temperature, 20 mL of a 1.0 mol/L hydrochloric acid solution was added for neutralization, and then the Erlenmeyer flask was sealed and thoroughly stirred and mixed. Then, 1.0 mL of the stirred mixed sample solution was dispensed into a 25 mL dosing bottle, and a mobile phase of the following composition was added thereto to obtain 25 mL of the HPLC sample solution 1. 5 μL of the obtained HPLC sample solution 1 was injected into an HPLC apparatus, and HPLC measurement was performed under the following HPLC measurement conditions. From the measurement results obtained, the area of the peak of the D body derived from polylactic acid and the area of the peak of the L body derived from polylactic acid were determined, and the amount of the L body and the amount of the D body were calculated. Based on the obtained results, the optical purity (% ee) was determined. As a result, the optical purity was 97.0% ee. In addition, in the following Table 1, "LA" means polylactic acid. - HPLC measurement conditions - - Column optical separation column, SUMICHIRAL OA5000 manufactured by Sumitomo Chemical Co., Ltd. (HPLC) Liquid chromatograph manufactured by Japan Seiko Co., Ltd. °C · Composition of mobile phase 1.0 mM - copper (II) sulfate buffer / IPA = 98 / 2 (V / V) (in this mobile phase, the ratio of copper (II) sulfate, IPA, and water is copper sulfate ( II) / IPA / water = 156.4 mg / 20 mL / 980 mL) · Mobile phase flow 1.0 mL / min · Detector UV detector (UV254 nm)

<重量平均分子量及分子量分佈> 使用凝膠滲透層析儀(GPC),並藉由下述GPC測定方法來測定聚乳酸的重量平均分子量(Mw)及分子量分佈(Mw/Mn)。 -GPC測定方法- ·測定裝置 沃特世公司製造的GPC-100 ·管柱 昭和電工股份有限公司製造的Shodex LF-804 ·樣品的製備 於40℃下使製造例1中所製作的高分子壓電膜溶解於溶媒[氯仿]中,而準備濃度為1 mg/mL的樣品溶液。 ·測定條件 以溶媒(氯仿)、溫度40℃、1 mL/min的流速將樣品溶液0.1 mL導入至管柱中,利用示差折射計來測定藉由管柱而分離的樣品溶液中的樣品濃度。聚乳酸的分子量是利用聚苯乙烯標準試樣製作通用校準曲線,並算出聚乳酸的重量平均分子量(Mw)。<Weight Average Molecular Weight and Molecular Weight Distribution> The weight average molecular weight (Mw) and molecular weight distribution (Mw/Mn) of the polylactic acid were measured by a gel permeation chromatography (GPC) by the following GPC measurement method. -GPC measurement method - - Measurement apparatus GPC-100 manufactured by Waters Corporation - Shodex LF-804 by Pipeline Showa Denko Co., Ltd. - Preparation of sample The polymer pressure produced in Production Example 1 was produced at 40 °C. The electro-membrane was dissolved in a solvent [chloroform], and a sample solution having a concentration of 1 mg/mL was prepared. - Measurement conditions 0.1 mL of the sample solution was introduced into the column at a flow rate of a solvent (chloroform), a temperature of 40 ° C, and a flow rate of 1 mL/min, and the concentration of the sample in the sample solution separated by the column was measured by a differential refractometer. The molecular weight of polylactic acid is a general calibration curve prepared using a polystyrene standard sample, and the weight average molecular weight (Mw) of polylactic acid is calculated.

藉由以下的方法來測定製造例1中所製作的高分子壓電膜的特性。結果如表1所示。The properties of the piezoelectric polymer film produced in Production Example 1 were measured by the following methods. The results are shown in Table 1.

<結晶度> 準確地秤量製造例1中所製作的高分子壓電膜10 mg,使用示差掃描型熱量計(珀金埃爾默(PerkinElmer)公司製造的DSC-1),於昇溫速度為10℃/min的條件下進行測定,而獲得熔解吸熱曲線。根據所獲得的熔解吸熱曲線而獲得結晶度。<Crystallinity> 10 mg of the piezoelectric polymer film produced in Production Example 1 was accurately weighed, and a differential scanning calorimeter (DSC-1 manufactured by PerkinElmer Co., Ltd.) was used at a temperature elevation rate of 10 The measurement was carried out under the conditions of ° C/min to obtain a melting endothermic curve. Crystallinity was obtained from the obtained melting endothermic curve.

<標準化分子配向MORc> 針對製造例1中所製作的高分子壓電膜,藉由王子計測機器股份有限公司製造的微波方式分子配向計MOA-6000來測定標準化分子配向MORc。基準厚度tc是設定成50 μm。<Standardized Molecular Alignment MORc> For the polymer piezoelectric film produced in Production Example 1, the standardized molecular alignment MORc was measured by a microwave molecular alignment meter MOA-6000 manufactured by Oji Scientific Instruments Co., Ltd. The reference thickness tc is set to 50 μm.

<內部霧度> 藉由以下的方法來獲得製造例1中所製作的高分子壓電膜的內部霧度(以下,亦稱為內部霧度(H1))。 首先,準備於兩片玻璃板之間僅夾持有矽油(信越化學工業股份有限公司製造的信越矽酮(Shin-Etsu Silicone)(商標),型號:KF96-100CS)的積層體,並測定該積層體的厚度方向的霧度(以下,設為霧度(H2))。 繼而,準備於所述兩片玻璃板之間夾持有利用矽油均勻地塗抹表面的所述高分子壓電膜的積層體,並測定該積層體的厚度方向的霧度(以下,設為霧度(H3))。 繼而,如下述式般取得兩者的差,藉此獲得高分子壓電膜的內部霧度(H1)。   內部霧度(H1)=霧度(H3)-霧度(H2)<Internal Haze> The internal haze (hereinafter also referred to as internal haze (H1)) of the piezoelectric polymer film produced in Production Example 1 was obtained by the following method. First, it is prepared to sandwich only a laminate of eucalyptus oil (Shin-Etsu Silicone (trademark), model: KF96-100CS manufactured by Shin-Etsu Chemical Co., Ltd.) between two glass plates, and measure the The haze of the laminate in the thickness direction (hereinafter, the haze (H2)). Then, a laminate of the polymer piezoelectric film having a surface uniformly coated with eucalyptus oil is sandwiched between the two glass sheets, and the haze of the laminate in the thickness direction is measured (hereinafter, it is set as a mist) Degree (H3)). Then, the difference between the two was obtained as shown in the following formula, whereby the internal haze (H1) of the piezoelectric polymer film was obtained. Internal haze (H1) = haze (H3) - haze (H2)

此處,霧度(H2)及霧度(H3)的測定分別於下述測定條件下使用下述裝置來進行。 測定裝置:東京電色公司製造,霧度計 TC-HIII DPK 試樣尺寸:寬度30 mm×長度30 mm 測定條件:依據JIS-K7105 測定溫度:室溫(25℃)Here, the measurement of haze (H2) and haze (H3) was performed using the following apparatus under the following measurement conditions. Measuring device: manufactured by Tokyo Denshoku Co., Ltd., haze meter TC-HIII DPK Sample size: width 30 mm × length 30 mm Measurement conditions: Temperature according to JIS-K7105: room temperature (25 ° C)

<壓電常數d14 (應力-電荷法)> 根據所述「利用應力-電荷法的壓電常數d14 的測定方法的一例」,測定高分子壓電膜的壓電常數(詳細而言,壓電常數d14 (應力-電荷法))。<Piezoelectric constant d 14 (stress-charge method)> The piezoelectric constant of the piezoelectric polymer film is measured based on the "an example of the measurement method of the piezoelectric constant d 14 by the stress-charge method" (in detail, Piezoelectric constant d 14 (stress-charge method)).

[表1] [Table 1]

<製造例2:接著塗敷液的製備> 將丙烯酸系黏著劑SK-Dyne1811L(綜研化學股份有限公司製造)10 kg、硬化劑TD-75(綜研化學股份有限公司製造)20 g、及甲苯1 kg混合,而獲得接著塗敷液。<Production Example 2: Preparation of a coating liquid> 10 kg of an acrylic adhesive SK-Dyne 1811L (manufactured by Soken Chemical Co., Ltd.), a hardener TD-75 (manufactured by Soken Chemical Co., Ltd.) 20 g, and toluene 1 The kg was mixed to obtain a subsequent coating liquid.

<製造例3:具有硬塗層的高分子壓電膜的製作> 藉由輥對輥來將丙烯酸系樹脂塗佈液(東洋油墨公司製造,抗黏連硬塗力奧都萊斯(LIODURAS)TYAB-014)塗敷於製造例1中所製作的高分子壓電膜的一個主面上。利用80℃的加熱爐對塗敷有塗佈液的高分子壓電膜進行乾燥後,照射累計光量為500 mJ/cm2 的紫外線來形成厚度為2 μm的硬塗層。進而,於高分子壓電膜的另一個主面上亦同樣地形成厚度為2 μm的硬塗層,而獲得於兩面形成有硬塗層的高分子壓電膜。<Production Example 3: Preparation of a polymer piezoelectric film having a hard coat layer> An acrylic resin coating liquid (manufactured by Toyo Ink Co., Ltd., anti-adhesive hard coating force Ulduras) by a roll-to-roller TYAB-014) was applied to one main surface of the piezoelectric polymer film produced in Production Example 1. The polymer piezoelectric film coated with the coating liquid was dried in a heating furnace at 80 ° C, and then irradiated with ultraviolet rays having an integrated light amount of 500 mJ/cm 2 to form a hard coat layer having a thickness of 2 μm. Further, a hard coat layer having a thickness of 2 μm was formed on the other main surface of the polymer piezoelectric film in the same manner, and a polymer piezoelectric film having a hard coat layer formed on both surfaces was obtained.

[實施例1] 藉由反向凹版塗佈方式、線速度2.5 m/min來將製造例2中所獲得的接著塗敷液塗佈於脫模膜(三井化學東賽璐(Mitsui Chemicals Tohcello)股份有限公司製造的SP-PET O3-BU)的脫模面上。穿過溫度為100℃的乾燥爐而於塗佈有接著塗敷液的脫模膜上形成接著層。進而,一面將脫模膜(三井化學東賽璐股份有限公司製造的SP-PET O3-BU)的脫模面層壓於接著層上一面捲取,而製成輥狀的積層體A(脫模膜/接著層/脫模膜)。而且,將輥狀的積層體A於室溫下保管1週來完成硬化。接著層的厚度為25 μm。 藉由R to R(輥對輥)來剝離以所述方式獲得的輥狀的積層體A的一側的脫模膜,一面將製造例1中所製作的高分子壓電膜層壓於接著層上一面捲取,而獲得輥狀的積層體B(脫模膜/接著層/高分子壓電膜)。 進而,藉由R to R來剝離另一個輥狀的積層體A(脫模膜/接著層/脫模膜)的一側的脫模膜,一面將積層體B的高分子壓電膜面層壓於所露出的接著層上一面捲取,而獲得輥狀的積層體(膜捲層體:脫模膜/接著層/高分子壓電膜/接著層/脫模膜)。[Example 1] The coating liquid obtained in Production Example 2 was applied to a release film by a reverse gravure coating method at a line speed of 2.5 m/min (Mitsui Chemicals Tohcello) The release surface of SP-PET O3-BU manufactured by the company. An adhesive layer was formed on the release film coated with the subsequent coating liquid through a drying oven at a temperature of 100 °C. Furthermore, the release surface of the release film (SP-PET O3-BU manufactured by Mitsui Chemicals, Inc.) was laminated on the adhesive layer and wound up to form a roll-like laminated body A. Mold/layer/release film). Further, the roll-shaped layered product A was stored at room temperature for one week to complete the hardening. The thickness of the layer is then 25 μm. The release film of one side of the roll-shaped layered product A obtained as described above was peeled off by R to R (roll-to-roll), and the polymer piezoelectric film produced in Production Example 1 was laminated on the subsequent layer. The layer was wound up on one side to obtain a roll-shaped laminated body B (release film/adhesion layer/polymer piezoelectric film). Further, the release film on the side of the other roll-shaped layered product A (release film/adhesion layer/release film) is peeled off by R to R, and the polymer piezoelectric film surface layer of the laminate B is laminated. The film was wound up on the exposed adhesive layer to obtain a roll-shaped laminate (film roll layer: release film / adhesive layer / polymer piezoelectric film / adhesive layer / release film).

[實施例2] 藉由反向凹版塗佈方式、線速度2.5 m/min來將製造例2中所獲得的接著塗敷液塗佈於製造例1中所製造的高分子壓電膜上。穿過溫度為70℃的乾燥爐而於塗佈有接著塗敷液的高分子壓電膜上形成接著層。進而,一面將脫模膜(三井化學東賽璐股份有限公司製造的SP-PET O3-BU)的脫模面層壓於接著層上一面捲取,而獲得輥狀的積層體C(脫模膜/接著層/高分子壓電膜)。 進而,以與所述相同的方式於輥狀的積層體C的高分子壓電膜面上形成接著層,一面層壓脫模膜(三井化學東賽璐股份有限公司製造的SP-PET O3-BU)的脫模面一面捲取,而獲得輥狀的積層體(膜捲層體:脫模膜/接著層/高分子壓電膜/接著層/脫模膜)。而且,將輥狀的積層體於室溫下保管1週來完成硬化。接著層的厚度分別為25 μm。[Example 2] The adhesive coating liquid obtained in Production Example 2 was applied onto the piezoelectric polymer film produced in Production Example 1 by a reverse gravure coating method at a linear velocity of 2.5 m/min. An adhesive layer was formed on the polymer piezoelectric film coated with the subsequent coating liquid through a drying furnace having a temperature of 70 °C. Furthermore, the release surface of the release film (SP-PET O3-BU manufactured by Mitsui Chemicals, Inc., Co., Ltd.) was laminated on the adhesive layer to obtain a roll-shaped laminated body C (released). Film/adhesion layer/polymer piezoelectric film). Further, a release film was formed on the surface of the piezoelectric polymer film of the roll-shaped layered product C in the same manner as described above, and a release film (SP-PET O3- manufactured by Mitsui Chemicals, Inc.) was laminated. The release surface of BU) was taken up to obtain a roll-shaped laminate (film laminate body: release film / adhesive layer / polymer piezoelectric film / adhesive layer / release film). Further, the roll-shaped laminated body was stored at room temperature for one week to complete the hardening. The thickness of the layer is then 25 μm.

[實施例3] 除將製造例1中所製作的高分子壓電膜變更成製造例3中所製作的具有硬塗層的高分子壓電膜以外,以與實施例1相同的方式獲得輥狀的積層體(膜捲層體:脫模膜/接著層/具有硬塗層的高分子壓電膜/接著層/脫模膜)。[Example 3] A roll was obtained in the same manner as in Example 1 except that the piezoelectric polymer film produced in Production Example 1 was changed to the polymer piezoelectric film having a hard coat layer produced in Production Example 3. A laminated body (film roll layer: release film / adhesive layer / polymer piezoelectric film / adhesive layer / release film having a hard coat layer).

[實施例4] 除將製造例1中所製作的高分子壓電膜變更成製造例3中所製作的具有硬塗層的高分子壓電膜以外,以與實施例2相同的方式獲得輥狀的積層體(膜捲層體:脫模膜/接著層/具有硬塗層的高分子壓電膜/接著層/脫模膜)。而且,將輥狀的積層體於室溫下保管1週來完成硬化。[Example 4] A roll was obtained in the same manner as in Example 2 except that the piezoelectric polymer film produced in Production Example 1 was changed to the polymer piezoelectric film having a hard coat layer produced in Production Example 3. A laminated body (film roll layer: release film / adhesive layer / polymer piezoelectric film / adhesive layer / release film having a hard coat layer). Further, the roll-shaped laminated body was stored at room temperature for one week to complete the hardening.

[比較例1] 除將乾燥爐的溫度自70℃變更成100℃以外,以與實施例2相同的方式獲得輥狀的積層體(膜捲層體:脫模膜/接著層/高分子壓電膜/接著層/脫模膜)。而且,將輥狀的積層體於室溫下保管1週來完成硬化。接著層的厚度分別為25 μm。[Comparative Example 1] A roll-like laminate (film roll layer: release film/adhesion layer/polymer pressure) was obtained in the same manner as in Example 2 except that the temperature of the drying furnace was changed from 70 °C to 100 °C. Electric film / adhesive layer / release film). Further, the roll-shaped laminated body was stored at room temperature for one week to complete the hardening. The thickness of the layer is then 25 μm.

[比較例2] 利用敷料器將製造例2中所獲得的接著塗敷液手工塗佈於製造例1中所製作的高分子壓電膜上,並於溫度為100℃的烘箱中進行乾燥,而形成接著層。進而,利用輥將脫模膜(三井化學東賽璐股份有限公司製造的SP-PET O3-BU)的脫模面貼合於接著層上,而獲得單片的積層體(脫模膜/接著層/高分子壓電膜)。 進而,以與所述相同的方式於所述單片的積層體的高分子壓電膜面上形成接著層,並利用輥來貼合脫模膜(三井化學東賽璐股份有限公司製造的SP-PET O3-BU)的脫模面,而獲得單片的積層體(脫模膜/接著層/高分子壓電膜/接著層/脫模膜)。而且,將單片的積層體於室溫下保管1週來完成硬化。接著層的厚度分別為25 μm。[Comparative Example 2] The coating liquid obtained in Production Example 2 was manually applied onto the piezoelectric polymer film produced in Production Example 1 by an applicator, and dried in an oven at a temperature of 100 ° C. The formation of the next layer. Further, the release surface of the release film (SP-PET O3-BU manufactured by Mitsui Chemicals, Inc.) was attached to the adhesive layer by a roll to obtain a single-layer laminated body (release film/following) Layer/polymer piezoelectric film). Further, in the same manner as described above, an adhesive layer is formed on the surface of the polymer piezoelectric film of the monolithic laminate, and the release film is bonded by a roll (SP manufactured by Mitsui Chemicals, Inc.) A release sheet of -PET O3-BU) to obtain a monolithic laminate (release film/adhesion layer/polymer piezoelectric film/adhesion layer/release film). Further, the monolithic laminate was stored at room temperature for one week to complete the hardening. The thickness of the layer is then 25 μm.

[比較例3] 除將製造例1中所製作的高分子壓電膜變更成製造例3中所製作的具有硬塗層的高分子壓電膜以外,以與比較例1相同的方式獲得輥狀的積層體(膜捲層體:脫模膜/接著層/具有硬塗層的高分子壓電膜/接著層/脫模膜)。[Comparative Example 3] A roll was obtained in the same manner as in Comparative Example 1, except that the piezoelectric polymer film produced in Production Example 1 was changed to the polymer piezoelectric film having a hard coat layer produced in Production Example 3. A laminated body (film roll layer: release film / adhesive layer / polymer piezoelectric film / adhesive layer / release film having a hard coat layer).

針對實施例1~實施例4及比較例1、比較例3中所獲得的輥狀的積層體以及比較例2中所獲得的單片的積層體,以如下方式評價接著層的酸價、MD尺寸變化率、MD裂紋及耐濕熱性。 將評價結果示於表2中。再者,表2中的「-」表示無測定資料。With respect to the roll-shaped laminate obtained in Examples 1 to 4, Comparative Example 1, and Comparative Example 3, and the monolithic laminate obtained in Comparative Example 2, the acid value and MD of the subsequent layer were evaluated as follows. Dimensional change rate, MD crack and heat and humidity resistance. The evaluation results are shown in Table 2. Furthermore, "-" in Table 2 indicates that there is no measurement data.

<接著層的酸價> 自積層體中剝離脫模膜,使所露出的接著層0.5 g溶解於溶媒(氯仿)中,將酚酞作為指示劑,藉由0.005M KOH(氫氧化鉀)乙醇溶液來進行滴定,藉此求出酸價。<Acid Value of Adhesive Layer> The release film was peeled off from the laminate, and 0.5 g of the exposed adhesive layer was dissolved in a solvent (chloroform), and phenolphthalein was used as an indicator by a 0.005 M KOH (potassium hydroxide) ethanol solution. The titration is carried out to determine the acid value.

<MD尺寸變化率> 將自積層體中去除脫模膜及接著層所獲得的高分子壓電膜於延伸方向(MD方向)上切割50 mm,並在與延伸方向正交的方向(TD方向)上切割50 mm,而切出50 mm×50 mm的矩形膜。將該矩形膜懸掛於設置為100℃的烘箱中,並進行30分鐘退火處理。其後,利用高精度數位測長機(三豐股份有限公司製造,Litematic VL-50AS)測定退火處理前後的MD方向的膜矩形邊長的尺寸。而且,根據下式算出尺寸變化率(%),並評價尺寸穩定性。尺寸變化率越小,表示尺寸穩定性越高。   (式)尺寸變化率(%)=100×|(退火前的MD方向的邊長)-(退火後的MD方向的邊長)|/(退火前的MD方向的邊長)<MD size change rate> The polymer piezoelectric film obtained by removing the release film and the adhesive layer from the laminate is cut in the extending direction (MD direction) by 50 mm and in the direction orthogonal to the extending direction (TD direction). ) Cut 50 mm on top and cut out a 50 mm × 50 mm rectangular film. The rectangular film was suspended in an oven set at 100 ° C and annealed for 30 minutes. Then, the size of the rectangular side length of the film in the MD direction before and after the annealing treatment was measured by a high-precision digital length measuring machine (manufactured by Mitutoyo Co., Ltd., Litematic VL-50AS). Further, the dimensional change ratio (%) was calculated according to the following formula, and the dimensional stability was evaluated. The smaller the dimensional change rate, the higher the dimensional stability. (Formula) dimensional change rate (%) = 100 × | (edge length in the MD direction before annealing) - (edge length in the MD direction after annealing) | / (edge length in the MD direction before annealing)

<MD裂紋> 將積層體的兩面的脫模膜剝離,並使用2 kg輥將東麗製造的聚對苯二甲酸乙二酯樹脂(Polyethylene terephthalate,PET)(商標:露米勒(Lumirror)T60-50)貼附於所露出的接著層上。藉此,製成積層有5個層的積層結構體。即,積層結構體包含PET/接著層/高分子壓電膜/接著層/PET這5層。 利用尖頂型刀(Pinnacle blade)將所述積層結構體沖裁成50 mm×50 mm的正方形。而且,於85℃下對所獲得的積層結構體(50 mm×50 mm)進行500小時加熱。其後,於室溫下放置24小時,以目視觀察MD方向上有無產生裂紋,並藉由以下的基準來進行評價。 A:於積層結構體的高分子壓電膜中無裂紋。 B:於積層結構體的高分子壓電膜中產生裂紋。<MD crack> The release film on both sides of the laminate was peeled off, and a polyethylene terephthalate (PET) manufactured by Toray was used using a 2 kg roller (trademark: Lumirror T60) -50) attached to the exposed adhesive layer. Thereby, a laminated structure in which five layers are laminated is produced. That is, the laminated structure includes five layers of a PET/adhesion layer/polymer piezoelectric film/adhesion layer/PET. The laminated structure was punched out into a square of 50 mm × 50 mm using a Pinnacle blade. Further, the obtained laminated structure (50 mm × 50 mm) was heated at 85 ° C for 500 hours. Thereafter, it was allowed to stand at room temperature for 24 hours, and the presence or absence of cracks in the MD direction was visually observed, and the evaluation was performed by the following criteria. A: There is no crack in the polymer piezoelectric film of the laminated structure. B: Cracks are generated in the piezoelectric polymer film of the laminated structure.

<耐濕熱性> 測定積層體的製造後24小時以內的高分子壓電膜的重量平均分子量(初始Mw)。繼而,自製造後24小時以內的積層體,準備長度方向50 mm×寬度方向50 mm的矩形的試驗片,將該試驗片懸掛於保持為85℃、85%RH的恆溫恆濕器內,並保持120小時。對該試驗片測定高分子壓電膜的重量平均分子量(耐濕熱試驗後Mw),並藉由以下的基準來對由下述式所表示的Mw維持率進行評價。   式:Mw維持率=耐濕熱試驗後Mw/初始Mw   [評價基準] A:Mw維持率≧0.6 B:0.6>Mw維持率≧0.35 C:Mw維持率<0.35<Heat and Heat Resistance> The weight average molecular weight (initial Mw) of the piezoelectric polymer film within 24 hours after the production of the laminate was measured. Then, a rectangular test piece having a length of 50 mm × a width of 50 mm was prepared from the laminate within 24 hours after the production, and the test piece was hung in a thermo-hygrostat maintained at 85 ° C and 85% RH, and Hold for 120 hours. The weight average molecular weight (Mw after the wet heat resistance test) of the polymer piezoelectric film was measured for the test piece, and the Mw maintenance ratio represented by the following formula was evaluated by the following criteria. Formula: Mw maintenance rate = Mw / initial Mw after moisture heat resistance test [Evaluation criteria] A: Mw maintenance rate ≧ 0.6 B: 0.6 > Mw maintenance rate ≧ 0.35 C: Mw maintenance rate < 0.35

[表2] [Table 2]

於實施例1~實施例4中,製作高分子壓電膜的MD尺寸變化率為1.0%以下的膜捲層體。於該膜捲層體中,進行了加熱時在高分子壓電膜中未產生裂紋、且高分子壓電膜的耐濕熱性優異(特別是實施例1)。 另一方面,於比較例1、比較例3中,製作高分子壓電膜的MD尺寸變化率為1.0%以上的膜捲層體,但於該膜捲層體中,進行了加熱時在高分子壓電膜中產生了裂紋。另外,於比較例2中,製作單片的積層體,但高分子壓電膜的耐濕熱性並不充分。In the first to fourth embodiments, a film-rolled layer body having a MD dimensional change ratio of 1.0% or less was produced. In the film roll layer, no crack was generated in the polymer piezoelectric film during heating, and the polymer piezoelectric film was excellent in moist heat resistance (particularly, Example 1). On the other hand, in Comparative Example 1 and Comparative Example 3, a film wound layer body having a MD dimensional change ratio of 1.0% or more was produced in the piezoelectric polymer film, but in the film roll layer, heating was performed at a high level. Cracks are generated in the molecular piezoelectric film. Further, in Comparative Example 2, a single-layer laminated body was produced, but the heat-resistant property of the polymer piezoelectric film was not sufficient.

2015年3月2日申請的日本專利申請案2015-040385中所揭示的全部內容可藉由參照而被倂入至本說明書中。 本說明書中所記載的所有文獻、專利申請案、及技術規格是以與如下情況相同的程度,藉由參照而被倂入至本說明書中,所述情況是具體地且個別地記載藉由參照而倂入各個文獻、專利申請案、及技術規格的情況。The entire disclosure of Japanese Patent Application No. 2015-040385, filed on March 2, 2015, is hereby incorporated by reference. All documents, patent applications, and technical specifications described in the present specification are incorporated herein by reference to the same extent as the following, which are specifically and individually described by reference. And break into the literature, patent applications, and technical specifications.

1、15‧‧‧輥狀脫模膜
2、16‧‧‧脫模膜
3、13‧‧‧接著劑
4、14‧‧‧接著層
5、11‧‧‧輥狀高分子壓電膜
6、12‧‧‧高分子壓電膜
7、17‧‧‧膜捲層體
8、18‧‧‧塗敷裝置
9、19‧‧‧乾燥機構
10、20‧‧‧膜捲層體製造裝置
1, 15‧‧‧ Roll release film
2, 16‧‧‧ release film
3, 13‧‧‧ adhesive
4, 14‧‧‧Next layer
5, 11‧‧‧ Roller polymer piezoelectric film
6,12‧‧‧Polymer piezoelectric film
7, 17‧ ‧ film reel
8, 18‧‧‧ coating device
9, 19 ‧ ‧ drying institutions
10, 20‧ ‧ film roll layer manufacturing device

圖1是表示於本發明的第一實施形態中,在脫模膜上形成接著層來製造膜捲層體的方法的概略圖。 圖2是表示於本發明的第二實施形態中,在高分子壓電膜上形成接著層來製造膜捲層體的方法的概略圖。Fig. 1 is a schematic view showing a method of producing a film roll layer by forming an adhesive layer on a release film in the first embodiment of the present invention. 2 is a schematic view showing a method of producing a film roll layer by forming an adhesive layer on a polymer piezoelectric film in a second embodiment of the present invention.

no

Claims (19)

一種膜捲層體,其是將積層膜捲繞成輥狀而成,所述積層膜包括: 高分子壓電膜,包含重量平均分子量為5萬~100萬的具有光學活性的螺旋手性高分子(A),藉由示差掃描熱量法所獲得的結晶度為20%~80%,且將藉由微波透過型分子配向計所測定的基準厚度設為50 μm時的標準化分子配向MORc與所述結晶度的積為40~700;以及 功能層(X),設置於所述高分子壓電膜的至少一個主面上;且 於100℃下對自所述積層膜中去除所述功能層(X)所獲得的所述高分子壓電膜進行30分鐘加熱時的尺寸變化率在縱向方向上為1.0%以下。A film roll layer obtained by winding a laminated film into a roll shape, the laminated film comprising: a polymer piezoelectric film comprising an optically active helical chirality having a weight average molecular weight of 50,000 to 1,000,000 The molecular (A), the crystallinity obtained by the differential scanning calorimetry method is 20% to 80%, and the reference molecular thickness measured by the microwave transmission type molecular alignment meter is set to 50 μm. The product of crystallinity is 40 to 700; and the functional layer (X) is disposed on at least one main surface of the piezoelectric polymer film; and the functional layer is removed from the laminated film at 100 ° C The dimensional change rate of the piezoelectric polymer film obtained in (X) when heated for 30 minutes is 1.0% or less in the longitudinal direction. 如申請專利範圍第1項所述的膜捲層體,其中所述功能層(X)的酸價為10 mgKOH/g以下。The film-rolled layer body according to claim 1, wherein the functional layer (X) has an acid value of 10 mgKOH/g or less. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述功能層(X)為接著層。The film reel body according to claim 1 or 2, wherein the functional layer (X) is an adhesive layer. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述功能層(X)的酸價為0.01 mgKOH/g以上。The film-rolled body according to the first or second aspect of the invention, wherein the functional layer (X) has an acid value of 0.01 mgKOH/g or more. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述功能層(X)中的總氮量為0.05質量%~10質量%。The film-rolled layer body according to the first or second aspect of the invention, wherein the total amount of nitrogen in the functional layer (X) is from 0.05% by mass to 10% by mass. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述功能層(X)與所述高分子壓電膜接觸。The film roll layer body according to the above aspect, wherein the functional layer (X) is in contact with the polymer piezoelectric film. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述積層膜在所述高分子壓電膜與所述功能層(X)之間具有折射率調整層、易接著層、硬塗層、抗靜電層、及抗黏連層的至少一種層。The film roll layer body according to the above-mentioned item, wherein the laminated film has a refractive index adjusting layer between the polymer piezoelectric film and the functional layer (X), and is easy to follow. At least one of a layer, a hard coat layer, an antistatic layer, and an anti-blocking layer. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述高分子壓電膜相對於所述螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~60000的穩定劑(B)0.01質量份~10質量份。The film-rolled layer body according to the first or second aspect of the invention, wherein the polymer piezoelectric film comprises, with respect to 100 parts by mass of the helical chiral polymer (A), having a carbon dioxide selected from the group consisting of carbon dioxide One or more functional groups in the group consisting of an imine group, an epoxy group, and an isocyanate group, and the stabilizer (B) having a weight average molecular weight of 200 to 60,000 is 0.01 parts by mass to 10 parts by mass. 如申請專利範圍第8項所述的膜捲層體,其中所述穩定劑(B)包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~900的穩定劑(B1),及於1分子內具有兩個以上的選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為1000~60000的穩定劑(B2)。The film reel body according to claim 8, wherein the stabilizer (B) comprises one or more selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group. a stabilizer (B1) having a functional group and a weight average molecular weight of 200 to 900, and having two or more groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group in one molecule A stabilizer (B2) having one or more functional groups and having a weight average molecular weight of 1,000 to 60,000. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述高分子壓電膜的相對於可見光線的內部霧度為50%以下,且於25℃下藉由應力-電荷法所測定的壓電常數d14 為1 pC/N以上。The film-rolled layer body according to claim 1 or 2, wherein the polymer piezoelectric film has an internal haze of 50% or less with respect to visible light, and is stressed at 25 ° C - The piezoelectric constant d 14 measured by the charge method is 1 pC/N or more. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述高分子壓電膜的相對於可見光線的內部霧度為13%以下,且相對於所述螺旋手性高分子(A)100質量份,包含具有選自由碳二醯亞胺基、環氧基、及異氰酸酯基所組成的群組中的一種以上的官能基且重量平均分子量為200~60000的穩定劑(B)0.01質量份~2.8質量份。The film reel body according to the first or second aspect of the invention, wherein the polymer piezoelectric film has an internal haze of 13% or less with respect to visible light, and is high with respect to the spiral chirality. 100 parts by mass of the molecule (A), comprising a stabilizer having one or more functional groups selected from the group consisting of a carbodiimide group, an epoxy group, and an isocyanate group, and having a weight average molecular weight of 200 to 60,000 ( B) 0.01 parts by mass to 2.8 parts by mass. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述螺旋手性高分子(A)為具有包含由下述式(1)所表示的重複單元的主鏈的聚乳酸系高分子,The film-rolled layer body according to claim 1 or 2, wherein the helical chiral polymer (A) is a polymer having a main chain comprising a repeating unit represented by the following formula (1) Lactic acid polymer, . 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述螺旋手性高分子(A)的光學純度為95.00%ee以上。The film-rolled layer body according to the first or second aspect of the invention, wherein the optical purity of the helical chiral polymer (A) is 95.00% or more. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述高分子壓電膜中的所述螺旋手性高分子(A)的含量為80質量%以上。The film-rolled layer body according to the first or second aspect of the invention, wherein the content of the helical chiral polymer (A) in the polymer piezoelectric film is 80% by mass or more. 如申請專利範圍第1項或第2項所述的膜捲層體,其中所述積層膜更包括配置在自所述功能層(X)觀察而與配置有所述高分子壓電膜之側相反的一側的脫模膜。The film reel body according to claim 1 or 2, wherein the laminated film further comprises a side disposed from the functional layer (X) and disposed on the side of the polymer piezoelectric film The release film on the opposite side. 如申請專利範圍第15項所述的膜捲層體,其中所述積層膜的縱向方向的長度為10 m以上。The film reel body according to claim 15, wherein the length of the laminated film in the longitudinal direction is 10 m or more. 一種膜捲層體的製造方法,其是製造如申請專利範圍第15項所述的膜捲層體的方法,其包括: 將用以形成所述功能層(X)的功能層形成劑賦予至所述脫模膜的主面上來形成所述功能層(X)的步驟; 在自所述功能層(X)觀察而與配置有所述脫模膜之側相反的一側,將所述功能層(X)與所述高分子壓電膜貼合來形成所述積層膜的步驟;以及 將所形成的所述積層膜捲繞成輥狀的步驟。A method for producing a film roll layer, which is a method for producing a film roll layer body according to claim 15, which comprises: imparting a functional layer forming agent for forming the functional layer (X) to a step of forming the functional layer (X) on the main surface of the release film; the function is viewed from a side opposite to the side on which the release film is disposed as viewed from the functional layer (X) a step of bonding the layer (X) to the polymer piezoelectric film to form the laminated film, and a step of winding the formed laminated film into a roll shape. 一種膜捲層體的製造方法,其是製造如申請專利範圍第15項所述的膜捲層體的方法,其包括: 將用以形成所述功能層(X)的功能層形成劑塗佈於所述高分子壓電膜的至少一個主面上,並以90℃以下的溫度使所塗佈的所述功能層形成劑乾燥來形成功能層(X)的步驟; 在自所述功能層(X)觀察而與配置有所述高分子壓電膜之側相反的一側,將所述功能層(X)與所述脫模膜貼合來形成所述積層膜的步驟;以及 將所形成的所述積層膜捲繞成輥狀的步驟。A method for producing a film roll layer, which is a method for producing a film roll layer body according to claim 15, comprising: coating a functional layer forming agent for forming the functional layer (X) a step of forming the functional layer (X) by drying the applied functional layer forming agent on at least one main surface of the piezoelectric polymer film at a temperature of 90 ° C or lower; (X) a step of forming the laminated film by bonding the functional layer (X) to the release film on the side opposite to the side on which the piezoelectric polymer film is disposed, and the side opposite to the side on which the piezoelectric polymer film is disposed; The formed laminated film is wound into a roll shape. 如申請專利範圍第17項或第18項所述的膜捲層體的製造方法,其中所述功能層(X)為接著層,所述功能層形成劑為接著劑。The method for producing a film reel body according to claim 17 or claim 18, wherein the functional layer (X) is an adhesive layer, and the functional layer forming agent is an adhesive.
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