TW201701418A - Package structure and the manufacture thereof - Google Patents
Package structure and the manufacture thereof Download PDFInfo
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- TW201701418A TW201701418A TW104120479A TW104120479A TW201701418A TW 201701418 A TW201701418 A TW 201701418A TW 104120479 A TW104120479 A TW 104120479A TW 104120479 A TW104120479 A TW 104120479A TW 201701418 A TW201701418 A TW 201701418A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
本發明係有關一種封裝結構,尤指一種具有複數電子元件之封裝結構。 The present invention relates to a package structure, and more particularly to a package structure having a plurality of electronic components.
隨著半導體封裝技術的演進,半導體裝置(Semiconductor device)已開發出不同的封裝型態。 With the evolution of semiconductor packaging technology, semiconductor devices have developed different package types.
由於電子產品之微小化以及高運作速度需求的增加,為提高單一半導體封裝結構之性能與容量以符合電子產品小型化(如節省封裝空間)之需求,半導體封裝結構採多晶片模組化(Multichip Module)乃成一趨勢,此種封裝方式能發揮系統封裝(SiP)異質整合特性,可將不同功用之電子元件。 Due to the miniaturization of electronic products and the increasing demand for high operating speeds, in order to improve the performance and capacity of a single semiconductor package structure to meet the needs of miniaturization of electronic products (such as saving package space), semiconductor package structures are multi-chip modularized (Multichip) Module) is a trend. This kind of package can take advantage of the heterogeneous integration of system package (SiP), which can be used for different electronic components.
例如:記憶體、中央處理器、繪圖處理器、影像應用處理器等,藉由封裝設計達到系統的整合,即將兩個或兩個以上之晶片組合在單一封裝結構中,不僅縮減電子產品整體電路結構體積,且能提昇電性功能。亦即,多晶片封裝結構可藉由將兩個或兩個以上之晶片組合在單一封裝結構中,來使系統運作速度之限制最小化。 For example: memory, central processing unit, graphics processor, image application processor, etc., through the package design to achieve system integration, that is, combining two or more wafers in a single package structure, not only reducing the overall circuit of the electronic product The structure is bulky and can enhance electrical functions. That is, the multi-chip package structure can minimize the limitation of the operating speed of the system by combining two or more wafers in a single package structure.
此外,多晶片封裝結構可減少晶片間連接線路之長度而降低訊號延遲以及存取時間。 In addition, the multi-chip package structure reduces the length of the connection line between the chips and reduces signal delay and access time.
如第1及1’圖所示,習知封裝結構1係包括:一基板10、設於該基板10上之複數電子元件11a,11b,11c、以及包覆該些電子元件11a,11b,11c之封裝層13,且各該電子元件11a,11b,11c係電性連接該基板10。 As shown in FIGS. 1 and 1 ′, the conventional package structure 1 includes a substrate 10, a plurality of electronic components 11a, 11b, 11c disposed on the substrate 10, and cladding the electronic components 11a, 11b, 11c. The encapsulation layer 13 and each of the electronic components 11a, 11b, 11c are electrically connected to the substrate 10.
惟,習知封裝結構1中,若欲以裸晶(即露出晶背)方式增加散熱功率,將因各該電子元件11a,11b,11c的高度(厚度)規格不同,而不能藉由研磨封裝層13之方式達到裸晶散熱之目的。 However, in the conventional package structure 1, if the heat dissipation power is to be increased by bare crystal (ie, the exposed crystal back), the height (thickness) of each of the electronic components 11a, 11b, and 11c may be different, and the package may not be polished. The way of layer 13 achieves the purpose of bare crystal heat dissipation.
因此,如何使習知封裝結構能散熱之問題,實已成目前亟欲解決的課題。 Therefore, how to make the conventional package structure capable of dissipating heat has become a problem that is currently being solved.
鑑於上述習知技術之種種缺失,本發明係揭露一種封裝結構,係包括:基板;第一電子元件與第二電子元件,係設於該基板上,且該第一電子元件之高度係高於該第二電子元件之高度;散熱板,係設於該第二電子元件上,使該第一電子元件之高度等於該第二電子元件與該散熱板之總高度;以及封裝層,係形成於該基板上,使該封裝層包覆該散熱板、第一與第二電子元件,且該散熱板之表面與該第一電子元件之表面係外露於該封裝層。 In view of the above-mentioned various deficiencies of the prior art, the present invention discloses a package structure including: a substrate; a first electronic component and a second electronic component are disposed on the substrate, and the height of the first electronic component is higher than a height of the second electronic component; a heat dissipation plate disposed on the second electronic component such that a height of the first electronic component is equal to a total height of the second electronic component and the heat dissipation plate; and an encapsulation layer is formed on the The encapsulating layer covers the heat dissipating plate, the first and second electronic components, and the surface of the heat dissipating plate and the surface of the first electronic component are exposed on the encapsulating layer.
本發明復揭露一種封裝結構之製法,係包括:提供一基板,該基板之其中一側設有至少一第一電子元件與至少一第二電子元件,且該第一電子元件之高度係高於該第二 電子元件之高度;形成散熱板於該第二電子元件上,使該第一電子元件之高度等於該第二電子元件與該散熱板之總高度;以及形成封裝層於該基板上,使該封裝層包覆該散熱板、第一與第二電子元件,且該散熱板之表面與該第一電子元件之表面係外露於該封裝層。 The invention discloses a method for manufacturing a package structure, comprising: providing a substrate, wherein one side of the substrate is provided with at least one first electronic component and at least one second electronic component, and the height of the first electronic component is higher than The second a height of the electronic component; forming a heat dissipation plate on the second electronic component such that a height of the first electronic component is equal to a total height of the second electronic component and the heat dissipation plate; and forming an encapsulation layer on the substrate to enable the package The layer covers the heat dissipation plate, the first and second electronic components, and the surface of the heat dissipation plate and the surface of the first electronic component are exposed to the package layer.
前述之封裝結構及其製法中,該基板係電性連接該第一與第二電子元件。例如,該第一或第二電子元件係藉由複數導電元件電性連接該基板。 In the above package structure and method of manufacturing the same, the substrate is electrically connected to the first and second electronic components. For example, the first or second electronic component is electrically connected to the substrate by a plurality of conductive elements.
前述之封裝結構及其製法中,該第一或第二電子元件係為堆疊組合之模組。 In the foregoing package structure and method of manufacturing the same, the first or second electronic component is a module of a stacked combination.
前述之封裝結構及其製法中,形成該散熱板之材質係為陶瓷材或金屬材。 In the above package structure and method of manufacturing the same, the material of the heat dissipation plate is made of ceramic material or metal material.
前述之封裝結構及其製法中,該散熱板係為具有多孔之金屬板。 In the above package structure and method of manufacturing the same, the heat dissipation plate is a porous metal plate.
前述之封裝結構及其製法中,該散熱板之熱傳導係數大於230W/(m.K)或400W/(m.K)。 In the foregoing package structure and method of manufacturing the same, the heat dissipation coefficient of the heat dissipation plate is greater than 230 W/(m.K) or 400 W/(m.K).
前述之封裝結構及其製法中,該散熱板之投影面積係大於或等於該第二電子元件之投影面積。 In the foregoing package structure and method of manufacturing the same, the projected area of the heat dissipation plate is greater than or equal to the projected area of the second electronic component.
前述之封裝結構及其製法中,復包括該散熱板係藉由結合層結合於該第二電子元件上。 In the foregoing package structure and method of manufacturing the same, the heat dissipation plate is coupled to the second electronic component by a bonding layer.
前述之封裝結構及其製法中,復包括藉由研磨方式或雷射燒除方式移除該封裝層之部分材質,使該散熱板之表面、該第一電子元件之表面與該封裝層之表面齊平。 The package structure and the manufacturing method thereof include removing a part of the material of the encapsulation layer by a grinding method or a laser burn-off method, and the surface of the heat dissipation plate, the surface of the first electronic component, and the surface of the encapsulation layer Qi Ping.
前述之封裝結構及其製法中,復包括藉由模壓方式直 接模壓出與該第一電子元件等高的封裝層,使該散熱板之表面、該第一電子元件之表面與該封裝層之表面齊平。 In the foregoing package structure and the method of manufacturing the same, the method includes The module is extruded to form an encapsulation layer equal to the first electronic component such that the surface of the heat dissipation plate and the surface of the first electronic component are flush with the surface of the encapsulation layer.
另外,前述之封裝結構及其製法中,復包括結合散熱件於該封裝層上,並使該散熱件接觸該散熱板。 In addition, in the foregoing package structure and the manufacturing method thereof, the heat sink is combined with the heat dissipation member and the heat dissipation member is contacted with the heat dissipation plate.
由上可知,本發明之封裝結構及其製法中,係藉由該散熱板設於該第二電子元件上,使該第一電子元件之高度等於該第二電子元件與該散熱板之總高度,故能藉由研磨該封裝層之方式露出該第一電子元件之表面,使該第一電子元件達到散熱之目的。 It can be seen that, in the package structure of the present invention, the heat dissipation plate is disposed on the second electronic component such that the height of the first electronic component is equal to the total height of the second electronic component and the heat dissipation plate. Therefore, the surface of the first electronic component can be exposed by grinding the encapsulation layer, so that the first electronic component can achieve the purpose of dissipating heat.
再者,於研磨該封裝層後,能露出該散熱板之表面,使該第二電子元件能利用該散熱板與空氣熱交換而達到散熱之目的,且相較於裸晶的散熱效果,本發明之第二電子元件的散熱效率可顯著提升30%以上。 Furthermore, after the encapsulation layer is polished, the surface of the heat dissipation plate can be exposed, so that the second electronic component can be heat-exchanged with the air to achieve heat dissipation, and compared with the heat dissipation effect of the bare crystal, The heat dissipation efficiency of the second electronic component of the invention can be significantly increased by more than 30%.
1,2,2’‧‧‧封裝結構 1,2,2’‧‧‧Package structure
10,20‧‧‧基板 10,20‧‧‧substrate
11a,11b,11c‧‧‧電子元件 11a, 11b, 11c‧‧‧ electronic components
13,23‧‧‧封裝層 13,23‧‧‧Encapsulation layer
20a‧‧‧第一表面 20a‧‧‧ first surface
20b‧‧‧第二表面 20b‧‧‧second surface
200‧‧‧線路層 200‧‧‧circuit layer
21a,21a’‧‧‧第一電子元件 21a, 21a’‧‧‧ first electronic components
21b,21b’‧‧‧第二電子元件 21b, 21b’‧‧‧Second electronic components
210,24‧‧‧導電元件 210,24‧‧‧Conductive components
22‧‧‧散熱板 22‧‧‧heating plate
220‧‧‧結合層 220‧‧‧bonding layer
221‧‧‧穿孔 221‧‧‧Perforation
240‧‧‧凸塊底下金屬層 240‧‧‧ Metal layer under the bump
25‧‧‧散熱件 25‧‧‧ Heat sink
9‧‧‧承載件 9‧‧‧Carrier
A,A’,B‧‧‧投影面積 A, A’, B‧‧‧ projected area
H,L‧‧‧高度 H, L‧‧‧ Height
R‧‧‧總高度 R‧‧‧ total height
t‧‧‧厚度 T‧‧‧thickness
S‧‧‧切割路徑 S‧‧‧ cutting path
第1圖係為習知封裝結構之立體示意圖;第1’圖係為第1圖之剖面示意圖;以及第2A至2F圖係為本發明之封裝結構之製法的剖面示意圖;其中,第2C’圖係為第2C圖之局部放大圖,第2F’圖係為第2F圖之另一實施例。 1 is a schematic perspective view of a conventional package structure; FIG. 1A is a schematic cross-sectional view of FIG. 1; and FIGS. 2A to 2F are schematic cross-sectional views showing a method of manufacturing the package structure of the present invention; wherein, 2C' The figure is a partial enlarged view of FIG. 2C, and the 2F' figure is another embodiment of the 2Fth figure.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.
須知,本說明書所附圖式所繪示之結構、比例、大小 等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上”、“第一”、“第二”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structure, proportion and size depicted in the drawings of this specification And the like, which are used for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the invention, and thus do not have technical significance, any structural modification, The change of the proportional relationship or the adjustment of the size should be within the scope of the technical content disclosed by the present invention without affecting the effects and the achievable effects of the present invention. In the meantime, the terms "upper", "first", "second" and "one" are used in the description, and are not intended to limit the scope of the invention. Changes or adjustments in the relative relationship are considered to be within the scope of the present invention.
第2A至2F圖係為本發明之封裝結構2之製法之剖面示意圖。 2A to 2F are schematic cross-sectional views showing the manufacturing method of the package structure 2 of the present invention.
如第2A圖所示,提供一承載件9,且將一具有相對之第一表面20a與第二表面20b的基板20設於該承載件9上。 As shown in FIG. 2A, a carrier member 9 is provided, and a substrate 20 having a first surface 20a and a second surface 20b opposite thereto is disposed on the carrier member 9.
於本實施例中,該基板20係為電路板或陶瓷板,其具有至少一線路層200,且該基板20以其第二表面20b結合該承載件9。然而,有關基板之種類繁多,並不限於上述。 In the present embodiment, the substrate 20 is a circuit board or a ceramic board having at least one wiring layer 200, and the substrate 20 is bonded to the carrier 9 with its second surface 20b. However, the variety of substrates involved is not limited to the above.
如第2B圖所示,設置複數第一電子元件21a,21a’與複數第二電子元件21b,21b’於該基板20之第一表面20a上,且該第一電子元件21a,21a’之高度H高於該第二電子元件21b,21b’之高度L。 As shown in FIG. 2B, a plurality of first electronic components 21a, 21a' and a plurality of second electronic components 21b, 21b' are disposed on the first surface 20a of the substrate 20, and the height of the first electronic components 21a, 21a' H is higher than the height L of the second electronic component 21b, 21b'.
於本實施例中,該第一與第二電子元件21a,21a’,21b,21b’係為主動元件、被動元件或其二者之組合(如堆疊組合、並排組合等)。具體地,該主動元件係 例如半導體元件(如晶片、中介板、封裝件、封裝基板等),而該被動元件係例如電阻、電容及電感。例如,部分該該第一電子元件21a係為主動元件,而部分該第一電子元件21a’亦可為堆疊組合之模組(如主動元件堆疊、被動元件堆疊或其二者之堆疊),且部分該第二電子元件21b係為堆疊組合之模組(如主動元件堆疊、被動元件堆疊或其二者之堆疊),而部分該第二電子元件21b’係為單一被動元件。 In the present embodiment, the first and second electronic components 21a, 21a', 21b, 21b' are active components, passive components or a combination of both (e.g., stacked combination, side-by-side combination, etc.). Specifically, the active component system For example, semiconductor components (such as wafers, interposers, packages, package substrates, etc.), such as resistors, capacitors, and inductors. For example, a portion of the first electronic component 21a is an active component, and a portion of the first electronic component 21a' may also be a stacked combination of modules (eg, an active component stack, a passive component stack, or a stack of both), and A portion of the second electronic component 21b is a stacked combination of modules (eg, an active component stack, a passive component stack, or a stack of both), and a portion of the second electronic component 21b' is a single passive component.
再者,該基板20係電性連接該第一與第二電子元件21a,21a’,21b,21b’。例如,該些第一與第二電子元件21a,21a’,21b,21b’係以覆晶方式電性連接該基板20。具體地,該些第一與第二電子元件21a,21a’,21b,21b’係藉由複數如凸塊之導電元件210電性連接該基板20之線路層200。 Further, the substrate 20 is electrically connected to the first and second electronic components 21a, 21a', 21b, 21b'. For example, the first and second electronic components 21a, 21a', 21b, 21b' are electrically connected to the substrate 20 in a flip chip manner. Specifically, the first and second electronic components 21a, 21a', 21b, 21b' are electrically connected to the circuit layer 200 of the substrate 20 by a plurality of conductive elements 210 such as bumps.
於其它方式中,該些第一與第二電子元件21a,21a’,21b,21b’可以打線方式電性連接該基板20,即該些第一與第二電子元件21a,21a’,21b,21b’以銲線(圖未示)電性連接該基板20之線路層200。 In other modes, the first and second electronic components 21a, 21a', 21b, 21b' can be electrically connected to the substrate 20, that is, the first and second electronic components 21a, 21a', 21b. 21b' is electrically connected to the circuit layer 200 of the substrate 20 by a bonding wire (not shown).
另外,該些第一與第二電子元件21a,21a’,21b,21b’亦可以其它方式電性連接該基板20,並不限於上述。 In addition, the first and second electronic components 21a, 21a', 21b, 21b' may be electrically connected to the substrate 20 in other manners, and are not limited to the above.
如第2C圖所示,形成一散熱板22於該第二電子元件21b,21b’上,使該第一電子元件21a,21a’之高度H等於該第二電子元件21b,21b’與該散熱板22之總高度R。 As shown in FIG. 2C, a heat dissipation plate 22 is formed on the second electronic component 21b, 21b' such that the height H of the first electronic component 21a, 21a' is equal to the second electronic component 21b, 21b' and the heat dissipation. The total height R of the plates 22.
於本實施例中,形成該散熱板22之材質係為陶瓷材或 金屬材,例如具有多孔之金屬板(如第2C’圖所示之穿孔221)。具體地,於溫度300K條件下,該散熱板22之熱傳導係數(Heat Transfer Coefficient)需大於80W/(m.K),較佳大於230W/(m.K),最佳為大於400W/(m.K)。 In this embodiment, the material of the heat dissipation plate 22 is made of ceramic material or The metal material, for example, has a porous metal plate (such as the perforation 221 shown in Fig. 2C'). Specifically, the heat transfer coefficient (Heat Transfer Coefficient) of the heat dissipation plate 22 needs to be greater than 80 W/(m.K), preferably greater than 230 W/(m.K), and most preferably greater than 400 W/(m) at a temperature of 300 K. .K).
再者,該散熱板22之投影面積A係等於該第二電子元件21b,21b’之投影面積B。或者,該散熱板22之投影面積A’亦可大於該第二電子元件21b,21b’之投影面積B(可參考後述之第2F’圖)。 Furthermore, the projected area A of the heat sink 22 is equal to the projected area B of the second electronic components 21b, 21b'. Alternatively, the projected area A' of the heat sink 22 may be larger than the projected area B of the second electronic components 21b, 21b' (see the 2F' diagram described later).
又,該散熱板22係藉由一結合層220結合於該第二電子元件21b,21b’上。例如,該散熱板22係為黏膠,如散熱膠。 Further, the heat dissipation plate 22 is bonded to the second electronic components 21b, 21b' by a bonding layer 220. For example, the heat sink 22 is an adhesive such as a heat sink.
另外,所述之總高度R係包含該第二電子元件21b,21b’之高度L與該散熱板22之厚度t,且該結合層220之厚度極薄因而能忽略。 In addition, the total height R includes the height L of the second electronic component 21b, 21b' and the thickness t of the heat dissipation plate 22, and the thickness of the bonding layer 220 is extremely thin and can be ignored.
如第2D圖所示,形成一封裝層23於該基板20之第一表面20a上,使該封裝層23包覆該散熱板22、第一與第二電子元件21a,21a’,21b,21b’。 As shown in FIG. 2D, an encapsulation layer 23 is formed on the first surface 20a of the substrate 20, so that the encapsulation layer 23 covers the heat dissipation plate 22, the first and second electronic components 21a, 21a', 21b, 21b. '.
於本實施例中,該散熱板22之表面與該第一電子元件21a,21a’之表面外露於該封裝層23,俾供該第一與第二電子元件21a,21a’,21b,21b’散熱。例如,該散熱板22之表面、該第一電子元件21a,21a’之表面與該封裝層23之表面齊平,如第2D圖所示;或者,可於該封裝層23之表面形成開口,以露出該散熱板22之表面與該第一電子元件21a,21a’之表面(圖未示)。 In this embodiment, the surface of the heat dissipation plate 22 and the surface of the first electronic component 21a, 21a' are exposed on the package layer 23, and the first and second electronic components 21a, 21a', 21b, 21b' are provided. Cooling. For example, the surface of the heat dissipation plate 22, the surface of the first electronic component 21a, 21a' is flush with the surface of the package layer 23, as shown in FIG. 2D; or an opening may be formed on the surface of the package layer 23, The surface of the heat dissipation plate 22 and the surface of the first electronic component 21a, 21a' (not shown) are exposed.
再者,若該散熱板22之表面、該第一電子元件21a,21a’之表面與該封裝層23之表面齊平,可使用模壓(molding)方式直接模壓出與該第一電子元件21a,21a’等高的封裝層23。 Furthermore, if the surface of the heat dissipation plate 22 and the surface of the first electronic component 21a, 21a' are flush with the surface of the package layer 23, the first electronic component 21a can be directly molded by using a molding method. 21a' contoured encapsulation layer 23.
或者,先形成厚度超過該第一電子元件21a,21a’之封裝材,再以研磨方式移除部分封裝材,直到露出該散熱板22之表面與該第一電子元件21a,21a’之表面。 Alternatively, a package having a thickness exceeding the first electronic component 21a, 21a' is formed first, and then a portion of the package is removed by grinding until the surface of the heat dissipation plate 22 and the surface of the first electronic component 21a, 21a' are exposed.
又,當形成厚度超過該第一電子元件21a,21a’之封裝材時,除了上述研磨方式外,亦可利用雷射燒除方式移除部分封裝材。 Further, when a package having a thickness exceeding the first electronic components 21a, 21a' is formed, in addition to the above-described polishing method, a part of the package may be removed by laser burn-off.
如第2E圖所示,移除該承載件9,再形成複數導電元件24於該基板20之第二表面20b上。 As shown in FIG. 2E, the carrier member 9 is removed, and a plurality of conductive members 24 are formed on the second surface 20b of the substrate 20.
於本實施例中,該些導電元件24係為銲球、銅凸塊、銅針等,且電性連接該基板20之線路層200。 In the embodiment, the conductive elements 24 are solder balls, copper bumps, copper pins, etc., and are electrically connected to the circuit layer 200 of the substrate 20 .
再者,該些導電元件24與該線路層200之間可形成凸塊底下金屬層(Under Bump Metallurgy,簡稱UBM)240。 Furthermore, an under bump metallurgy (UBM) 240 may be formed between the conductive elements 24 and the circuit layer 200.
如第2F圖所示,進行切單作業,即沿如第2E圖所示之切割路徑S切割該基板20及其上之封裝層23,以獲得複數個封裝結構2。 As shown in FIG. 2F, a singulation operation is performed, that is, the substrate 20 and the encapsulation layer 23 thereon are cut along the cutting path S as shown in FIG. 2E to obtain a plurality of package structures 2.
另外,於一實施例中,如第2F’圖所示之封裝結構2’,可於該封裝層23上結合一散熱件25,如散熱鰭片。例如,該散熱件25與該散熱板22相接觸。於其它實施例中,該散熱件25與該散熱板22可一體成型。 In addition, in an embodiment, as shown in FIG. 2F, the package structure 2' can be combined with a heat sink 25 such as a heat sink fin. For example, the heat sink 25 is in contact with the heat sink 22. In other embodiments, the heat sink 25 and the heat sink 22 can be integrally formed.
本發明之製法中,主要藉由將該散熱板22設於該第二 電子元件21b,21b’上,使該第一電子元件21a,21a’之高度H等於該第二電子元件21b,21b’與該散熱板22之總高度R,即該散熱板22之表面與該第一電子元件21a,21a’之表面齊平,故能藉由研磨該封裝層23之方式露出該第一電子元件21a,21a’之表面,使該第一電子元件21a,21a’達到散熱之目的。 In the manufacturing method of the present invention, the heat dissipation plate 22 is mainly disposed in the second The height H of the first electronic component 21a, 21a' is equal to the total height R of the second electronic component 21b, 21b' and the heat sink 22, that is, the surface of the heat sink 22 and the electronic component 21b, 21b' The surface of the first electronic component 21a, 21a' is flush, so that the surface of the first electronic component 21a, 21a' can be exposed by polishing the encapsulation layer 23, so that the first electronic component 21a, 21a' can be dissipated. purpose.
再者,於研磨該封裝層23後,雖無法露出該第二電子元件21b,21b’之表面,但藉由露出該散熱板22之表面,使該第二電子元件21b,21b’的熱能會傳導至該散熱板22,再利用該散熱板22與空氣熱交換,以令該第二電子元件21b,21b’達到散熱之目的,且相較於電子元件之表面直接與空氣熱交換的散熱效果,本發明之第二電子元件21b,21b’的散熱效率係提升30%以上。 Furthermore, after the encapsulation layer 23 is polished, the surface of the second electronic component 21b, 21b' cannot be exposed, but by exposing the surface of the heat dissipation plate 22, the thermal energy of the second electronic component 21b, 21b' is Conducted to the heat dissipation plate 22, and then heat exchanged with the heat dissipation plate 22 to make the second electronic component 21b, 21b' achieve the purpose of heat dissipation, and the heat dissipation effect of directly exchanging heat with the air surface of the electronic component The heat dissipation efficiency of the second electronic component 21b, 21b' of the present invention is increased by 30% or more.
本發明復提供一種封裝結構2,2’,其包括:一具有相對之第一表面20a與第二表面20b的基板20、設於該基板20之第一表面20a上的第一電子元件21a,21a’與第二電子元件21b,21b’、設於該第二電子元件21b上之散熱板22、以及設於該基板20之第一表面20a上的封裝層23。 The present invention further provides a package structure 2, 2' comprising: a substrate 20 having a first surface 20a and a second surface 20b opposite thereto, and a first electronic component 21a disposed on the first surface 20a of the substrate 20, 21a' and second electronic components 21b, 21b', a heat dissipation plate 22 provided on the second electronic component 21b, and an encapsulation layer 23 provided on the first surface 20a of the substrate 20.
所述之第一電子元件21a,21a’之高度H係高於該第二電子元件21b,21b’之高度L,且該第一電子元件21a,21a’之高度H係等於該第二電子元件21b,21b’與該散熱板22之總高度R。 The height H of the first electronic component 21a, 21a' is higher than the height L of the second electronic component 21b, 21b', and the height H of the first electronic component 21a, 21a' is equal to the second electronic component. 21b, 21b' and the total height R of the heat sink 22.
所述之封裝層23係包覆該散熱板22、第一與第二電子元件21a,21a’,21b,21b’,且該散熱板22之上表面與該 第一電子元件21a之上表面係外露於該封裝層23。 The encapsulation layer 23 covers the heat dissipation plate 22, the first and second electronic components 21a, 21a', 21b, 21b', and the upper surface of the heat dissipation plate 22 and the The upper surface of the first electronic component 21a is exposed to the encapsulation layer 23.
於一實施例中,該基板20係電性連接該第一與第二電子元件21a,21a’,21b,21b’,且該第一與第二電子元件21a,21a’,21b,21b’係藉由複數導電元件210電性連接該基板20。 In one embodiment, the substrate 20 is electrically connected to the first and second electronic components 21a, 21a', 21b, 21b', and the first and second electronic components 21a, 21a', 21b, 21b' are The substrate 20 is electrically connected by a plurality of conductive elements 210.
於一實施例中,該第一電子元件21a’係為堆疊組合之模組。 In one embodiment, the first electronic component 21a' is a module of a stacked combination.
於一實施例中,該第二電子元件21b係為堆疊組合之模組。於一實施例中,形成該散熱板22之材質係為陶瓷材或金屬材。例如,該散熱板22係為具有多孔之金屬板。 In an embodiment, the second electronic component 21b is a module of a stacked combination. In one embodiment, the material of the heat dissipation plate 22 is made of ceramic material or metal material. For example, the heat sink 22 is a metal plate having a porous shape.
於一實施例中,該散熱板22之熱傳導係數大於230W/(m.K)或大於400W/(m.K)。 In one embodiment, the heat sink 22 has a thermal conductivity greater than 230 W/(m.K) or greater than 400 W/(m.K).
於一實施例中,該散熱板22之投影面積A可大於或等於該第二電子元件21b,21b’之投影面積B。 In one embodiment, the projected area A of the heat sink 22 can be greater than or equal to the projected area B of the second electronic component 21b, 21b'.
於一實施例中,該散熱板22係藉由結合層220結合於該第二電子元件21b,21b’上。 In one embodiment, the heat sink 22 is bonded to the second electronic component 21b, 21b' by a bonding layer 220.
於一實施例中,所述之封裝結構2’復包括一散熱件25,係結合於該封裝層23上並接觸該散熱板22。 In one embodiment, the package structure 2' includes a heat sink 25 bonded to the package layer 23 and contacting the heat sink 22.
綜上所述,本發明之封裝結構及其製法中,主要藉由將該散熱板設於該第二電子元件上,使該第一電子元件之高度等於該第二電子元件與該散熱板之總高度,故能藉由研磨該封裝層之方式露出該第一電子元件之表面,使該第一電子元件達到散熱之目的。 In summary, in the package structure of the present invention, the heat dissipation plate is disposed on the second electronic component, and the height of the first electronic component is equal to the second electronic component and the heat dissipation plate. The total height is such that the surface of the first electronic component can be exposed by grinding the encapsulation layer to achieve the purpose of dissipating the first electronic component.
再者,於研磨該封裝層後,會露出該散熱板之表面, 使該第二電子元件能經由該散熱板以與空氣熱交換而達到散熱之目的,且相較於該第二電子元件直接與空氣熱交換的散熱效果,該第二電子元件的散熱效率可顯著提升30%以上。 Furthermore, after the encapsulation layer is polished, the surface of the heat dissipation plate is exposed. The second electronic component can achieve heat dissipation through heat exchange with the air through the heat dissipation plate, and the heat dissipation efficiency of the second electronic component can be remarkable compared to the heat dissipation effect of the second electronic component directly exchanging heat with the air. Increase by more than 30%.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.
2‧‧‧封裝結構 2‧‧‧Package structure
20‧‧‧基板 20‧‧‧Substrate
20a‧‧‧第一表面 20a‧‧‧ first surface
20b‧‧‧第二表面 20b‧‧‧second surface
21a‧‧‧第一電子元件 21a‧‧‧First electronic component
21b‧‧‧第二電子元件 21b‧‧‧Second electronic components
210,24‧‧‧導電元件 210,24‧‧‧Conductive components
22‧‧‧散熱板 22‧‧‧heating plate
220‧‧‧結合層 220‧‧‧bonding layer
23‧‧‧封裝層 23‧‧‧Encapsulation layer
240‧‧‧凸塊底下金屬層 240‧‧‧ Metal layer under the bump
H,L‧‧‧高度 H, L‧‧‧ Height
R‧‧‧總高度 R‧‧‧ total height
t‧‧‧厚度 T‧‧‧thickness
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