TW201642420A - Low-profile footed power package - Google Patents
Low-profile footed power package Download PDFInfo
- Publication number
- TW201642420A TW201642420A TW105113833A TW105113833A TW201642420A TW 201642420 A TW201642420 A TW 201642420A TW 105113833 A TW105113833 A TW 105113833A TW 105113833 A TW105113833 A TW 105113833A TW 201642420 A TW201642420 A TW 201642420A
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- Prior art keywords
- foot
- pin
- package
- wafer
- pad
- Prior art date
Links
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Classifications
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
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- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
本申請案係部份延續自申請於2013年10月17日的美國專利申請案第14/056,287號,並主張於2013年3月9日申請美國臨時申請案第61/775,540號及第61/775,544號的優先權權益。茲將該等案文依其整體而以參考方式併入本案。 This application is a continuation of U.S. Patent Application Serial No. 14/056,287, filed on Oct. 17, 2013, and filed on March 9, 2013, the U.S. Provisional Application Nos. 61/775,540 and 61/. Priority interest in 775,544. The texts are hereby incorporated by reference into their entirety in their entirety.
本發明涉及用於功率元件和功率積體電路的半導體封裝。 The present invention relates to a semiconductor package for a power component and a power integrated circuit.
半導體元件和積體電路程(ICs)一般被包含於半導體封裝中,該半導體封裝包括保護塗料或封裝材料以防止部件在處理和組裝期間、運輸過程中和將部件安裝到印刷電路板時的損壞。由於成本的原因,封裝材料通常是由塑料製成。塑料“模塑化合物”在液體狀態下,在未冷却並固 化為固體塑料之前注入到升至高温且其相互連通模具腔體中環繞元件。這類的封装通常被稱為是“轉注成型”。 Semiconductor components and integrated electrical traces (ICs) are typically included in a semiconductor package that includes a protective coating or encapsulating material to prevent damage during handling and assembly, during shipping, and when mounting components onto a printed circuit board. . The packaging material is usually made of plastic for cost reasons. Plastic "molding compound" in liquid state, without cooling and solid Before being turned into a solid plastic, it is injected to a high temperature and it communicates with the surrounding elements in the mold cavity. Such packages are often referred to as "return molding."
元件的互連藉由金屬導線架來執行,一般由銅製成,從半導體元件或晶片將電流和熱傳導到印刷電路板內及其周圍。晶片和導線架之間的連接一般包括以導電或絶緣的環氧樹脂將晶片黏著到導線架的“晶片墊”上,並且金屬銲線,通常以金、銅或鋁制成,由晶片的表面連接至導線架。其他的選擇,如焊球、金凸塊或銅柱可以直接用於晶片的上表面黏著連接到導線架上。 The interconnection of the components is performed by a metal leadframe, typically made of copper, that conducts current and heat from the semiconductor component or wafer into and around the printed circuit board. The connection between the wafer and the lead frame generally comprises bonding the wafer to the "wafer pad" of the lead frame with an electrically conductive or insulating epoxy resin, and the metal bonding wire, usually made of gold, copper or aluminum, from the surface of the wafer Connect to the lead frame. Other options, such as solder balls, gold bumps or copper posts, can be used directly on the upper surface of the wafer to be bonded to the lead frame.
雖然金屬導線架在成品中充當電和熱的導體,在製造過程中,導線架將暫時固定元件直到塑料硬化。在塑料固化後,透過機械切割,封裝的晶片被從同一導線架上相分隔開或“切割開”成其他的封裝。切割切斷開金屬導線架,並且在某些情況下也切開硬化的塑料。 While the metal leadframe acts as a conductor of electricity and heat in the finished product, the leadframe will temporarily hold the component until the plastic hardens during the manufacturing process. After the plastic is cured, the packaged wafers are separated or "cut" from the same leadframe into other packages by mechanical cutting. The cut cuts the metal lead frame and, in some cases, also cuts the hardened plastic.
在“底腳”半導體封裝中,即在金屬引腳或“針腳”突出到塑料及以在底腳為末端,然後用機械成型的方法彎曲引腳以成為為它們的最終形狀,最終的成品包裝進捲帶和捲軸,作為組裝`到客戶印刷電路板(printed circuit board,以下簡稱PCB)的準備。 In "foot" semiconductor packages, where metal pins or "pins" protrude into the plastic and end at the foot, then the pins are bent mechanically to become their final shape, the final finished package The tape and reel are prepared as a package to the customer's printed circuit board (PCB).
圖1A所示為底腳封裝1的一個示例,包括半導體晶片5、塑料2、接合銲線6C和6D、金屬引腳3B,3C,3D以及金屬晶片墊3A。金屬引腳和導線架包括製造過程中由單一的導線架3所相分隔開的元件。金屬引腳3B,3C和3D比晶片墊3A更薄,存在於塑封膠體2內在晶片墊3A的底表面8上方之一高度(也示於圖1B),並且必須在彎曲部分4B,4C和4D向下彎曲以便金屬引腳3B,3C和3D的非彎曲部分平躺或“共平面”在金屬晶片墊3A平坦底表面8的PCB上。這種封裝由於其彎曲引腳的形狀有時被稱為“鷗翼式”封裝。 1A shows an example of a foot package 1, including a semiconductor wafer 5, a plastic 2, bonding wires 6C and 6D, metal pins 3B, 3C, 3D, and a metal wafer pad 3A. The metal pins and leadframes include components that are separated by a single leadframe 3 during manufacture. The metal pins 3B, 3C and 3D are thinner than the wafer pad 3A, present in the molding compound 2 at a height above the bottom surface 8 of the wafer pad 3A (also shown in FIG. 1B), and must be in the curved portions 4B, 4C and 4D. Bend downward so that the non-bent portions of the metal pins 3B, 3C and 3D lie flat or "coplanar" on the PCB of the flat bottom surface 8 of the metal wafer pad 3A. This type of package is sometimes referred to as a "gull-wing" package due to the shape of its curved pins.
這樣的底腳封裝被製造成各種尺寸和引腳結構,範圍從用於封裝電晶體和簡單ICs如雙極接面電晶體、功率MOSFETs和分路電壓調節器的3個引腳,到用於封裝積體電路(ICs)的12個引腳。迄今為止,使用注射成型底腳塑料封裝已經製造了數十億計的產品。普通封裝包括像SC70和SOT23封裝之類的小型電晶體封裝、諸如SOP-8、SOP-16或SOP-24之類較小的外形封裝和用於更多引腳數的底腳式四方形扁平封裝或LQFP。LQFP的封裝可以具有64或更多引腳,以偶數量在其四個邊緣中的每個邊緣上分配其引腳,而SOT和SOP僅位於封裝兩邊上具有引腳。 Such foot packages are manufactured in a variety of sizes and pin configurations ranging from three pins for packaged transistors and simple ICs such as bipolar junction transistors, power MOSFETs and shunt voltage regulators. Enclose 12 pins of integrated circuits (ICs). To date, billions of products have been manufactured using injection molded foot plastic packages. Common packages include small transistor packages like the SC70 and SOT23 packages, smaller outline packages such as SOP-8, SOP-16 or SOP-24, and quad flats for more pin counts. Package or LQFP. LQFP packages can have 64 or more pins with even numbers on each of its four edges, while SOT and SOP have pins on only two sides of the package.
為了達到引腳彎曲工藝,SOP和LQFP的最小封裝高度通常超過1.8mm。包括諸如S0T23-3、S0T23-5、SOT23-6和SOT223外形的小型電晶體封裝、諸如SC70的小晶片封裝、TSOP-8薄小外型輪廓封裝和TSS0P-8薄型超小外型輪廓封裝,某些封裝已經設計為更薄型,薄如1mm。在1mm厚度以下,製造這些封裝中的任何一種都變得困難。即便對於更大的封裝高度,在引腳彎曲保持良好的引腳共面性在鷗翼式封裝的批量製造中也受到持續的關注。 In order to achieve the pin bending process, the minimum package height of SOP and LQFP is usually over 1.8mm. Includes small transistor packages such as S0T23-3, S0T23-5, SOT23-6, and SOT223, small chip packages such as SC70, TSOP-8 thin outline package, and TSS0P-8 thin ultra-small outline package. Some packages have been designed to be thinner and thinner than 1mm. It is difficult to manufacture any of these packages below 1 mm thickness. Even for larger package heights, pin coplanarity with good pin bending remains a constant concern in mass production of gull-wing packages.
引腳精確的成型以嚴格規範和誤差要求是有問題的。客戶考量將變形的引腳認為是質量缺陷,要求正式的糾正行動來回應並承諾改善進的計劃。在極端情況下,超出了特定誤差的製造可能導致製造中斷,這會引發經濟懲罰、取消供應商資格甚至訴訟。在製造過程中對引腳彎曲的缺乏控制不是這些封裝的唯一限制。因為在IC封裝中封裝高度是主要的考量,導線架的厚度被限制,通常為200μm或更小,由於無法有效地從晶片熱量傳播到印刷電路板或散熱器因此它表現出其相對較差的功率消散能力。 Pin-accurate molding is problematic with strict specifications and error requirements. The customer considers the deformed pin to be a quality defect and requires formal corrective action to respond and promise to improve the plan. In extreme cases, manufacturing that exceeds certain tolerances can result in manufacturing disruptions, which can lead to economic penalties, cancellation of supplier qualifications, and even litigation. The lack of control of pin bending during manufacturing is not the only limitation of these packages. Since the package height is a major consideration in IC packages, the thickness of the leadframe is limited, typically 200 μm or less, and it exhibits relatively poor power due to its inability to efficiently transfer heat from the wafer to the printed circuit board or heat sink. Dissipation ability.
功率封裝結構像圖1A中所示的DPAK或D2PAK,使用更厚的金屬,為積體電路封裝的2.5倍,具體約500μm(微米)。因此,隨著時間的演進ICs變得越來越“高科 技”,IC封裝和功率封裝在它們的製造方法已分道揚鑣,其需要複雜的製造和適用於僅使用在昂貴回焊印刷電路板(PCB)組裝線。反之,功率封裝依頼舊有的“低技術”的工廠和工法,一般黏著方式使用傳統PCB工廠“波峰焊接”技術。對於相同的PCB面積,以波峰焊接為基礎的工廠可以大大降低製造成本-是二分之一到四分之一的回焊組裝工廠的成本。 The power package structure is like the DPAK or D 2 PAK shown in Figure 1A, using a thicker metal, 2.5 times the package of the integrated circuit, specifically about 500 μm (microns). As a result, ICs have become more "high-tech" over time, and IC packaging and power packaging have gone a part in their manufacturing methods, which require complex manufacturing and are suitable for use only on expensive reflow printed circuit boards (PCBs). ) Assembly line. Conversely, the power package relies on the old "low-tech" factory and method, and the general adhesion method uses the "wave soldering" technology of the traditional PCB factory. For the same PCB area, a wave soldering based plant can significantly reduce manufacturing costs - from one-half to one-quarter of the cost of a reflow assembly plant.
由於年代久遠,功率封裝最小尺寸和誤差往往是大於新式的IC封裝,再次參照圖1A,引腳3C,3B和3D間的引腳間距為1.5mm。反之,現今的ICs引腳中心到中心的間距通常採用0.4mm。圖1B所示為取一條切線沿著並通過引腳3D封裝1的剖面圖,包括晶片墊3A、半導體晶片5、導體接合銲線6D和模具壓注塑料2。晶片墊3A包括一個上表面18和底表面8以及被模具壓注塑料2四面包覆。晶片墊3A也以距離16橫向延伸超過模具壓注塑料2並且包括一個沿著上表面18未被模具壓注塑料2所包覆的暴露表面。 Due to age, the minimum size and error of the power package is often greater than the new IC package. Referring again to Figure 1A, the pin spacing between pins 3C, 3B and 3D is 1.5 mm. Conversely, the center-to-center spacing of today's ICs pins is typically 0.4mm. 1B shows a cross-sectional view of a tangential line taken along and through the lead 3D package 1, including a wafer pad 3A, a semiconductor wafer 5, a conductor bond wire 6D, and a mold injection molding compound 2. The wafer pad 3A includes an upper surface 18 and a bottom surface 8 and is coated on all four sides by a mold injection molding plastic 2. The wafer pad 3A also extends laterally beyond the mold injection molding plastic 2 at a distance 16 and includes an exposed surface that is not covered by the mold injection plastic 2 along the upper surface 18.
導體引腳3D存在模具壓注塑料2平行於較低表面8,在較低表面8之上方高度,但低於模具壓注塑料2的上表面。導體引腳3D被以機械彎曲成彎曲部分4D,以便於導體引腳3D的尾端坐落位於上方並且與較低表面8共平 面。晶片5表面的特別金屬稱為接合銲墊,藉導體接合銲線6D銲接至導體引腳3D,使電路能夠從印刷電路板連接至接合銲墊。接合銲線6D可以包括是金、鋁或銅。該接合銲墊可是一個特定的專用金屬化區域組成,例:閘極銲墊,或在大功率元件的情況下可包含一大面積陣列金屬坐落於一大面積陣列的主動電晶體上方。 The conductor pin 3D is present in the mold injection plastic 2 parallel to the lower surface 8, above the lower surface 8, but below the upper surface of the mold injection plastic 2. The conductor pin 3D is mechanically bent into a bent portion 4D so that the tail end of the conductor pin 3D is seated above and is flush with the lower surface 8 surface. The special metal on the surface of the wafer 5 is referred to as a bond pad, which is soldered to the conductor pins 3D by a conductor bond wire 6D to enable the circuit to be connected from the printed circuit board to the bond pads. The bonding wire 6D may include gold, aluminum or copper. The bond pad can be composed of a specific dedicated metallization region, such as a gate pad, or in the case of a high power device, a large area of array metal can be placed over the active transistor of a large area array.
例如,在垂直功率MOSFET或絕緣閘雙極電晶體(insulate gate bipolar transistor,IGBT),通常晶片5的大面積頂部金屬電性連接到元件的源極,一更小的接合銲墊連接到它的閘極或輸入端,晶片5的背面電性連接至汲極或元件透過晶片黏著35輸出直接連接到晶片墊3A,一薄膠材或焊料的導電層。在製造中,接合銲線6D不能下垂並觸碰晶片墊3A否則該元件將變成電性短路。在非常高電流的元件,接合銲線6D可被以銅“焊夾”(clip)取代,一個彎曲的金屬片接通晶片5上大面積的導體表面和導體引腳3D。在一些封裝設計中,導體引腳3D的垂直位置與晶片墊3A的上表面18是不共平面的。 For example, in a vertical power MOSFET or an insulate gate bipolar transistor (IGBT), typically a large area of the top metal of the wafer 5 is electrically connected to the source of the component, and a smaller bond pad is connected to it. At the gate or input, the back side of the wafer 5 is electrically connected to the drain or the component is directly connected to the wafer pad 3A via a die bond 35 output, a thin layer of solder or a conductive layer of solder. In manufacturing, the bond wire 6D cannot sag and touch the wafer pad 3A or the component will become electrically shorted. In very high current components, bond wire 6D can be replaced with a copper "clip" that turns over a large area of conductor surface and conductor pins 3D on wafer 5. In some package designs, the vertical position of the conductor pins 3D is not coplanar with the upper surface 18 of the wafer pad 3A.
在製造過程中,由於彎腳發生於塑封成型後,彎曲部分4D使橫向距離17從模具壓注塑料2被分隔開或對塑封膠體2永久損壞,如裂痕、剝落以及導體引腳3D和模製塑料2之間的分層的可能結果。這種損害在目視檢查時 可導致產量損失,並且未捕獲其損害,可能導致可靠性失效。如果彎曲部分4D彎曲過多或過少,使得導體引腳3D的底面不與晶片墊3A的底面8共平面,可能會是發生的製造瑕疵的另一個來源。 In the manufacturing process, since the bent legs occur after the plastic molding, the curved portion 4D separates the lateral distance 17 from the mold injection molding plastic 2 or permanently damages the molding compound 2, such as cracks, peeling, and conductor pins 3D and mold. Possible results of delamination between plastics 2. This damage is during visual inspection It can result in loss of production and does not capture its damage, which can lead to reliability failure. If the curved portion 4D is bent too much or too little, so that the bottom surface of the conductor pin 3D is not coplanar with the bottom surface 8 of the wafer pad 3A, it may be another source of manufacturing defects.
一個相似,但稍有不同的剖面圖如圖1C所示,代表作為沿著並通過導體引腳3B切割線的剖面圖。在這種情況下,引腳3B是實際且電性地連接到晶片墊3A。像導體引腳3C和其他導體引腳,導體引腳3B不能用任何比橫向距離17最小更接近模具壓注塑料2的彎曲部分4B作彎腳,否則模具壓注塑料2可能被損壞。 A similar, but slightly different, cross-sectional view is shown in Figure 1C, which is a cross-sectional view taken along a line cut along and through conductor pin 3B. In this case, the pin 3B is actually and electrically connected to the wafer pad 3A. Like the conductor pin 3C and other conductor pins, the conductor pin 3B cannot be bent with any bent portion 4B which is closer to the mold injection plastic 2 than the lateral distance 17 minimum, otherwise the mold injection plastic 2 may be damaged.
封裝1的底面圖,即封裝的底部與底部面8是共平面,於圖1D中示出,晶片墊3A的露出底部三面被模具壓注塑料2所包覆除了金屬部分16或“散熱墊”延伸超出塑料。引腳3C,3B和3D不與底部表面8共平面的部分被以虛線示出,包括相應的彎曲部4C,4B和4D。 The bottom view of the package 1, that is, the bottom of the package and the bottom surface 8 are coplanar, as shown in FIG. 1D, the exposed bottom three sides of the wafer pad 3A are covered by the mold injection plastic 2 except for the metal portion 16 or "heat sink". Extends beyond plastic. Portions of pins 3C, 3B and 3D that are not coplanar with the bottom surface 8 are shown in dashed lines, including respective bends 4C, 4B and 4D.
圖2A示出製造的第一步驟,顯示了在兩個不同的剖面圖的晶片墊3A,上圖代表通過並沿著導體引腳3B的剖面圖,而下圖顯示代表通過和沿著導體引腳3C的剖面圖。製程以一個實心銅塊開始,選擇性鍍上錫的薄塗層用於改善可焊性,被保護層所屏蔽,即光罩30,典型地包括圖案 化的光阻材料或不易受到酸液影響的有機材料。光罩30可以被均勻地應用,然後選擇性地除去,例如使用光學曝光定義要刪除的區域,或者另一選擇是可以藉由鋼板光罩選擇性的應用。 Figure 2A shows a first step of fabrication showing wafer pads 3A in two different cross-sectional views, the upper graph representing a cross-section through and along conductor pin 3B, and the lower graph showing the pass and along conductor leads. A cross-sectional view of the foot 3C. The process begins with a solid copper block, and a thin coating of selectively tin-plated for improved solderability, shielded by a protective layer, ie, photomask 30, typically including a pattern A photoresist material or an organic material that is not susceptible to acid. The reticle 30 can be applied uniformly and then selectively removed, for example using optical exposure to define the area to be removed, or alternatively it can be selectively applied by a steel sheet reticle.
在應用和圖案化之後,圖案化的光罩30進行烘烤以硬化材料。然後在酸液中蝕刻銅片,例如鹽酸包含HCL:FeCl3:H2O以比例4:1:5混合,硝酸包含HNO3:H2O2以比例1:20混合,或者氨包括NH3:H2O2以比例4:1混合。如果銅被預鍍上一層錫(Sn)的薄層,則首先必須使用氫氟酸將錫以蝕刻除去,包含HF:HCL以比例1:1混合、HF:HNO3以比例1:1混合、或HF:H2O以比例1:1混合。更詳細的列表的常見濕製程化學金屬蝕刻可以在半導體工藝教科書或在http://www.cleanroom.byu.edu/wet_etch.phtml網上被找到。錫和銅可以在一側進行蝕刻或通過浸漬在酸液浴中。在浸漬蝕刻的情況下,為了防止導線架過度的蝕刻以及薄化導線架而在背面必須塗佈另一保護層。為了清楚起見,此背面保護層未在圖中示出,但這些半導體封裝的技術是眾所皆知的。 After application and patterning, the patterned mask 30 is baked to harden the material. The copper flakes are then etched in an acid solution, for example hydrochloric acid comprising HCL:FeCl 3 :H 2 O mixed in a ratio of 4:1:5, nitric acid comprising HNO 3 :H 2 O 2 in a ratio of 1:20, or ammonia comprising NH 3 :H 2 O 2 was mixed in a ratio of 4:1. If the copper is pre-plated with a thin layer of tin (Sn), the tin must first be removed by etching using hydrofluoric acid, including HF:HCL mixed in a ratio of 1:1, HF:HNO 3 mixed in a ratio of 1:1, Or HF: H 2 O is mixed in a ratio of 1:1. A more detailed list of common wet process chemical metal etches can be found in semiconductor process textbooks or online at http://www.cleanroom.byu.edu/wet_etch.phtml . Tin and copper can be etched on one side or by immersion in an acid bath. In the case of immersion etching, in order to prevent excessive etching of the lead frame and thinning of the lead frame, another protective layer must be applied on the back side. For the sake of clarity, this backside protective layer is not shown in the figures, but the techniques of these semiconductor packages are well known.
回到圖2A,蝕刻後,銅形成L型,該L型較厚部分包括晶片墊3A以及投影設計的較薄“跳水板”3Z。在製 程繼續之前圖案化光罩30隨後被移除。在此步驟中的剖面圖顯示用於代表上述兩個截面一模一樣的插圖。在圖2B中,圖案化光罩31被採用來對跳水板投影3Z的部分進行重覆蝕刻穿透。在上部圖示中,跳水板投影3Z被保護而導致引腳3B,而在下部圖示的跳水板投影3Z經由蝕刻將晶片墊3A被分開產生獨立引腳3D和間隙32。引腳3D藉由連接至周圍未示出的導線架而被維持其位置。蝕刻後,光罩31被移除。 Returning to Figure 2A, after etching, the copper forms an L-shape, the L-shaped thicker portion including the wafer pad 3A and the thinner "diving plate" 3Z of the projection design. In system The patterned reticle 30 is then removed before the process continues. The cross-sectional view in this step shows an illustration that is identical to the two sections described above. In Figure 2B, a patterned mask 31 is employed to repeatedly etch the portion of the diving plate projection 3Z. In the upper illustration, the slab projection 3Z is protected to result in pin 3B, while the slab projection 3Z illustrated in the lower portion separates the wafer pad 3A by etching to create the individual pins 3D and gaps 32. Pin 3D is maintained in position by being connected to a lead frame not shown around. After etching, the mask 31 is removed.
接著,如圖2C所示,半導體晶片5被安裝到晶片墊3A上使用薄的晶片附著層35包括焊料不然就是導電環氧樹脂。在下部剖面圖2D,一個或多個接合銲線6D接合半導體晶片5的頂部,並將其連接至引腳3D。在上部剖面圖,無需接合銲線是因為晶片附著層35電性連接晶片5的背面到晶片墊3A並且直到引腳3B。銲線接合後,使用轉注成型技術的塑料成型被使用,如在圖2E中所描繪,為了形成模具壓注塑料2封裝半導體晶片5、接合銲線6D和其他接合銲線(未示出)、以及部分的晶片墊3A、引腳3B,3D和其它引腳(未示出)。在半導體領域中,轉注成型優於注射成型,因為它給予一個較少溢膠需去除的卓越模具。 Next, as shown in FIG. 2C, the semiconductor wafer 5 is mounted on the wafer pad 3A using a thin wafer adhesion layer 35 including solder or a conductive epoxy. In the lower cross-sectional view 2D, one or more bonding wires 6D engage the top of the semiconductor wafer 5 and connect it to the leads 3D. In the upper cross-sectional view, it is not necessary to bond the bonding wires because the wafer bonding layer 35 electrically connects the back surface of the wafer 5 to the wafer pad 3A and up to the lead 3B. After the wire bonding, plastic molding using a transfer molding technique is used, as depicted in FIG. 2E, in order to form a mold injection molding plastic 2 package semiconductor wafer 5, bonding wire 6D and other bonding wires (not shown), And a portion of the wafer pad 3A, pins 3B, 3D and other pins (not shown). In the semiconductor field, transfer molding is superior to injection molding because it gives a superior mold that requires less glue to be removed.
在圖2F中引腳3B和3D是由一個機械“成型”的工具所彎曲,在其相應的引腳產生彎曲部分4B和4D使得 引腳的底部與導線架架3A的底部表面8為共平面。最後,引腳被剪切,引腳3B和3D與導線架3G切斷連接。此切割操作被稱為“分割成單”(singulation),因為一個導線架包含許多已封裝晶粒被切割或切斷分開成“單顆”的已封裝晶粒。在彎曲成型操作中,機械成型工具牢固地夾住並支撐在引腳空間17中以防止因操作產生的應力造成模具壓注塑料2破裂。引腳空間17的長度由製造商機械成型的工具所設定的尺寸來決定並且不能在被減至小於指定的最小尺寸而不冒著在製造時封裝損壞的風險。從圖2F中,很明顯的引腳空間17和彎曲部分4B和4D代表著“浪費”了PCB面積,因為它們不包含主動半導體晶粒且它們也不代表一個有使用的PCB面積。由於不良的面積效率,因此這個封裝技術與空間敏感的應用是不協調,如智能手機和移動式個人電子產品。 In Figure 2F, pins 3B and 3D are bent by a mechanical "molding" tool that produces curved portions 4B and 4D at their respective pins. The bottom of the pin is coplanar with the bottom surface 8 of the leadframe 3A. Finally, the pins are clipped and pins 3B and 3D are disconnected from leadframe 3G. This cutting operation is referred to as "singulation" because a leadframe contains a number of encapsulated grains that have been packaged or cut into "single" pieces. In the bending forming operation, the mechanical forming tool is firmly clamped and supported in the lead space 17 to prevent the mold injection plastic 2 from being broken due to the stress generated by the operation. The length of the pin space 17 is determined by the size set by the manufacturer's mechanically formed tool and cannot be reduced to less than a specified minimum size without risking package damage during manufacture. From Figure 2F, it is apparent that the pin space 17 and the curved portions 4B and 4D represent "wasted" PCB area because they do not contain active semiconductor dies and they do not represent a used PCB area. Due to poor area efficiency, this packaging technology is not compatible with space-sensitive applications such as smartphones and mobile personal electronics.
俯視圖3A示出了一個印刷電路板100位於下方的該導電線路用於粘著底腳封裝1到PCB上,即為PCB引腳墊。引腳墊包含四個焊接封裝1元件到PCB上的區域:導體線路41C焊接引腳3C的末端,導體線路41B焊接引腳3B的末端,導體線路41D焊接引腳3D的末端,以及第四區域為包括導體線路41A的大型引腳墊,用於焊接封裝晶片墊3A的底部。在引腳3C,3B和3D的情況下,焊料的 應用可以從上述來使用波峰焊接。通過表面張力,焊料會自然濕潤到引腳和PCB導電線路。藉由膠水或膠帶使其機械性地暫時固定位置,熔融焊料本身粘附到引腳和PCB導電線路一旦冷卻硬化成固體後封裝位置即被固定。 The top view of FIG. 3A shows that the conductive line below the printed circuit board 100 is used to adhere the foot package 1 to the PCB, which is a PCB pin pad. The pin pad contains four soldered package 1 components to the area on the PCB: conductor line 41C solder pin 3C end, conductor line 41B solder pin 3B end, conductor line 41D solder pin 3D end, and fourth area It is a large lead pad including a conductor line 41A for soldering the bottom of the package wafer pad 3A. In the case of pins 3C, 3B and 3D, solder Applications can use wave soldering from the above. Through surface tension, the solder naturally wets to the pins and PCB conductive lines. By mechanically temporarily fixing the position by glue or tape, the molten solder itself adheres to the leads and the PCB conductive lines are fixed once cooled and solidified.
應用焊料的波峰焊接方法是無法做用在導體線路41A的大型引腳墊連接到封裝的晶片墊3A。(標記為虛線“3A”代表晶片墊3A被定位)。在此情況下,薄片狀焊料45,必須在封裝1被放置到印刷電路板之前以手動放置到PCB上,因此晶片墊3A必需在波峰焊接之前藉由在烘箱中加熱被熔接到位置上。於波峰焊接期間晶片墊3A可平躺在焊料上並且從其目標位置稍微移動,造成焊接過程些許不精確。為了防止在PCB上短路,元件間彼此不能安裝的太緊密。虛線44代表一個沒有其他元件可以安裝在此的”保留”區以避免電路短路。根據印刷電路板製造商的設計規則,這保留區44可能會大幅增加該區所需面積以便在PCB上安裝一個元件並且大大降低該產品的面積填充密度。 The wave soldering method using solder is not possible to connect the large pad pad of the conductor line 41A to the wafer pad 3A of the package. (Marked as dashed line "3A" means that wafer pad 3A is positioned). In this case, the flaky solder 45 must be manually placed onto the PCB before the package 1 is placed on the printed circuit board, so the wafer pad 3A must be fused to the position by heating in the oven prior to wave soldering. The wafer pad 3A can lie flat on the solder during the soldering of the wave and move slightly from its target position, causing a slight inaccuracy in the soldering process. In order to prevent short circuits on the PCB, the components cannot be mounted too tightly to each other. The dashed line 44 represents a "reserved" area where no other components can be mounted to avoid short circuits. Depending on the design rules of the printed circuit board manufacturer, this reserved area 44 may substantially increase the area required for the area to mount a component on the PCB and greatly reduce the area fill density of the product.
圖3B所示為封裝1被黏著到一個兩層PCB100的剖面圖,如圖所示,PCB100包括下層導體層43A和43B,上層導體層41A和41B以及介於中間絕緣層之導電通孔42位於PCB部分內。如圖所示,晶片墊3A是在封裝引腳 焊接前被安置在PCB100導體線路41B之上,藉由中間焊料層45被焊接到PCB。焊料層45通常在波峰焊接之前融接。波峰焊接後,焊料電性連接引腳3D到PCB導體線路41A。波峰焊接的一個特點是它藉由焊料34D連接引腳3D的側面到PCB導體線路41A,但在引腳3D和PCB導體線路41A間沒有中間焊料存在。 3B is a cross-sectional view showing the package 1 being adhered to a two-layer PCB 100. As shown, the PCB 100 includes lower conductor layers 43A and 43B, upper conductor layers 41A and 41B, and conductive vias 42 interposed therebetween. Inside the PCB section. As shown, wafer pad 3A is on the package leads It is placed on the PCB 100 conductor line 41B before soldering, and is soldered to the PCB by the intermediate solder layer 45. Solder layer 45 is typically fused prior to wave soldering. After the wave soldering, the solder is electrically connected to the lead 3D to the PCB conductor line 41A. One feature of the wave soldering is that it connects the side of the lead 3D to the PCB conductor line 41A by the solder 34D, but no intermediate solder exists between the lead 3D and the PCB conductor line 41A.
因此,在“低技術”PCB製造線,波峰焊接用於焊接所有元件除了功率封裝以外的大型晶片墊,這是取代在功率元件放置之前需要焊料或錫膏以手動來放置或分配。這種手動放置焊料的方法是緩慢和昂貴,因此,只用於較少元件時的成本效益。如圖所示,焊料34A從波峰焊接過程也逐漸增加到晶片墊3A的一側。雖然這種焊料接合可充分承載功率元件的額定電流,它並不保證晶片墊3A和PCB導體線路41B,42,和43B之間的低熱阻。如此,當功率元件與其它ICs混合時,在波峰焊接製造過程中使用錫膏45仍是不可避免。 Therefore, in "low-tech" PCB manufacturing lines, wave soldering is used to solder all components except large packages of power pads, which is a replacement for solder or solder paste to be placed or dispensed manually prior to placement of the power components. This method of manually placing the solder is slow and expensive, and therefore, is only cost effective when used for fewer components. As shown, the solder 34A is also gradually increased from the wave soldering process to one side of the wafer pad 3A. While this solder joint can sufficiently carry the rated current of the power component, it does not guarantee a low thermal resistance between the wafer pad 3A and the PCB conductor traces 41B, 42 and 43B. Thus, when the power components are mixed with other ICs, the use of solder paste 45 in the wave soldering manufacturing process is still unavoidable.
一種替代的PCB組裝方法,被稱為回焊製造,涉及在安裝部件之前印刷錫膏在遍及整個印刷電路板,這個過程中,雖然非常精確但是緩慢且因此昂貴,特別是因為高成本的回焊爐是被要求在控制方法中熔化焊料,以避免焊接時平躺的元件移動。雖然在智能手機,平板電腦,筆記 型電腦和移動產品製造中,回焊PCB組件很少被使用在較大的低成本消費電子產品,如電視,汽車電子,消費電子產品,大型家電,或供電模組。 An alternative PCB assembly method, known as reflow soldering, involves printing solder paste throughout the printed circuit board prior to mounting the component, although this process is very accurate but slow and therefore expensive, especially because of high cost reflow The furnace is required to melt the solder in a control method to avoid movement of the components lying flat during welding. While on a smartphone, tablet, notes In the manufacture of computer and mobile products, reflowed PCB components are rarely used in larger low-cost consumer electronics such as televisions, automotive electronics, consumer electronics, large appliances, or power modules.
在常見的產品封裝中封裝1如圖1A所示為一個垂直功率MOSFET包括三個電極端子,該MOSFET的汲極從半導體晶片5的背面電性連接,閘極輸入銲線連接是由晶片上方的閘極銲墊以單線連接,源極要求多數的源極接合銲線由大部分晶片表面以金屬大面積覆蓋的頂面接合。功率MOSFET的等效電路被安裝於上述的封裝內於圖3C中示出,其中功率MOSFET 47的閘極連接到導體引腳3C,功率MOSFET 47的源極藉由接合銲線6D連接到導體引腳3D,和背面汲極連接到晶片墊3A以及導體引腳3B。高電流路徑包括由源極連接銲線所造成的寄生電感49A大小LS,以及由汲極連接封裝導線架結構而產生的寄生電感49B大小LD。 In a common product package, package 1 is shown in FIG. 1A as a vertical power MOSFET comprising three electrode terminals. The drain of the MOSFET is electrically connected from the back side of the semiconductor wafer 5, and the gate input wire bond is connected from above the wafer. The gate pads are connected by a single wire. The source requires that most of the source bond wires be bonded by the top surface of most of the wafer surface covered by a large area of metal. The equivalent circuit of the power MOSFET is mounted in the above package as shown in FIG. 3C, in which the gate of the power MOSFET 47 is connected to the conductor pin 3C, and the source of the power MOSFET 47 is connected to the conductor by the bonding wire 6D. The leg 3D, and the back drain are connected to the wafer pad 3A and the conductor pin 3B. The high current path includes a parasitic inductance 49A size L S caused by the source connection bonding wire, and a parasitic inductance 49B size L D generated by the drain connection package lead frame structure.
在操作中,源極電感49A有幾個原因令人極為擔憂。首先,導體引腳3B可用於作為監測高電流流過晶片墊3A和其寄生電感49B後MOSFET 47的真實汲極電壓。源極電感49A包括接合銲線電感可能是巨大的,即使在LS>LD。不像在汲極連接,同時具有晶片墊3A背面和導體引腳3B作為連接,在封裝1中,一個單獨的感測引腳測 量出的MOSFET 47真實源極電壓是不可行,然而在電路操作中,雜散源極電感是有問題的,且比汲極電感更糟糕。 In operation, the source inductance 49A has several causes that are extremely worrying. First, the conductor pin 3B can be used as a true drain voltage of the MOSFET 47 after monitoring the high current flowing through the wafer pad 3A and its parasitic inductance 49B. The source inductance 49A including the bond wire inductance can be large, even at L S >L D . Unlike in the case of a drain connection, with the back of wafer pad 3A and conductor pin 3B as connections, in package 1, a single sense pin measures the true source voltage of MOSFET 47 is not feasible, however in circuit operation The stray source inductance is problematic and worse than the drain inductance.
特別是在功率MOSFET切換為關閉,在汲極電流的任何變化可導致MOSFET 47的源極電壓振盪。當源極電壓振盪時,閘極至源極電壓可能上升並失效於MOSFET的臨界電壓以上,多次的開關並相應的增加了開關損耗。於高速開關中,對於一個獨立導體連接到功率MOSFET 47的真實源極且繞過源極電感49A將是有利的。不幸的是,這種導體引腳在現今的DPAK和D2PAK封裝中是不可能的出現,因為導體引腳3B在封裝過程中被用於機械支撐且一定要與晶片墊3A緊緊連接在一起。 Especially when the power MOSFET is switched off, any change in the drain current can cause the source voltage of the MOSFET 47 to oscillate. When the source voltage oscillates, the gate-to-source voltage may rise and fail above the threshold voltage of the MOSFET, and multiple switches increase the switching losses accordingly. In high speed switching, it would be advantageous to connect a separate conductor to the true source of power MOSFET 47 and bypass source inductor 49A. Unfortunately, this conductor pin is not possible in today's DPAK and D 2 PAK packages because the conductor pin 3B is used for mechanical support during the packaging process and must be tightly connected to the wafer pad 3A. together.
導電引腳3B的作用於圖4A中示出,其中晶片墊3A藉由引腳3B連接導線架框條38。因此,當導體引腳3C和3D無需連接到晶片墊3A,導體引腳3B必須連接到晶片墊3A,否則在製造過程中將沒有東西可固定其位置,即在晶片黏著期間,銲線接合,封膠或裁切及成型步驟期間。 The function of the conductive pin 3B is shown in FIG. 4A, in which the wafer pad 3A is connected to the lead frame strip 38 by the lead 3B. Therefore, when the conductor pins 3C and 3D need not be connected to the wafer pad 3A, the conductor pin 3B must be connected to the wafer pad 3A, otherwise there will be nothing to fix its position during the manufacturing process, that is, during bonding of the wafer, the wire bonding, During the sealing or cutting and forming steps.
導線架還示出了每個晶片是藉由個別的模具壓注塑料2來被封裝,以多個模穴特別相匹配的導線架。相應的模具用以形成塑封膠體來封裝該晶片及其接合銲線如在圖4B中示出,包括上部模穴37B和下部底板37A,當被組合 在一起形成一個模穴腔體用於壓注塑料2,每次和任何導線架的間距或封裝尺寸的改變皆需要一個新的模具來作為製造之用,昂貴的組件要求涉及精密加工的堅固模具。 The leadframe also shows that each wafer is encapsulated by a separate mold injection of plastic 2, with a plurality of cavities specifically matching the leadframe. A corresponding mold is used to form a molding compound to encapsulate the wafer and its bonding wire as shown in FIG. 4B, including an upper cavity 37B and a lower substrate 37A, when combined Forming a cavity cavity together for injecting plastic 2, each time and any lead frame spacing or package size change requires a new mold for manufacturing, expensive components require a solid mold involving precision machining .
傳統的壓模機都很大,通常重達200噸,或250噸的壓模和模具基座。包括模穴治具,這樣一個系統的總成本通常是$15萬美元只是針對第一種封裝類型,此後每增加一個封裝類型另外加$10萬美元。新一代模壓機更昂貴,甚至為兩倍的價格。此外,只要封裝的導線架和封裝模穴寬度或間距被改變,則其他設備諸如裁切和成型機器也必須做修改而增加額外的$7萬美元或更多的費用以因應新的封裝外形。 Conventional presses are large, typically weighing up to 200 tons, or 250 tons of stampers and mold bases. Including the cavity fixture, the total cost of such a system is usually $150,000, just for the first package type, and an additional $100,000 for each additional package type. The new generation of molding presses is more expensive, even at twice the price. In addition, as long as the package leadframe and package cavity width or spacing are changed, other equipment such as cutting and forming machines must be modified to add an additional $70,000 or more to accommodate the new package form factor.
因此,每個模穴是一個固定寬度針對單一特定的封裝及導線架,例如DPAK和D2PAK是不同。使用標準的引腳間距,每封裝只有三個導電引腳可能無需修改模具和模穴寬度。但是,由於如先前所描述的,晶片墊一定連接著中心導電引腳,這些標準化的封裝僅可提供多達三個獨立的電性連接。 Therefore, each cavity is a fixed width for a single specific package and lead frame, such as DPAK and D 2 PAK are different. With standard pin pitch, there are only three conductive pins per package that may not require modification of the mold and cavity width. However, since the wafer pads must be connected to the center conductive pins as previously described, these standardized packages can only provide up to three separate electrical connections.
產品利用限於三個電性連接大致可分為三種類型,即雙極元件、三極垂直元件、和三極橫向元件。圖5A示出為雙極垂直元件例子的簡化剖面圖,其中包括上層金屬 23A,塊材半導體材料20和覆磊晶層(overlying epitaxial layer)21,背面接通22坐落在一個晶片墊(未示出)位於平面表面18上。由保護層48的一個開口來界定的接合銲墊區域,作為接合銲線6D與表面金屬層23A接通。保護層48之下,氧化層或玻璃層25保護元件表面免受污染。在操作中,電流由表面金屬層23A垂直流經磊晶層21和基板20到背面金屬層22接通。接面存在於磊晶層21中的,即半導體元件的結構,主電流的流向對於理解上在下文並不重要而且未示出。雖然保護裝置和電壓鉗也是個例子,雙極元件通常包括半導體二極體和整流器。 Product utilization is limited to three types of electrical connections that can be broadly classified into three types, namely bipolar elements, three-pole vertical elements, and three-pole transverse elements. Figure 5A shows a simplified cross-sectional view of an example of a bipolar vertical element including an upper metal 23A, a bulk semiconductor material 20 and an overlying epitaxial layer 21, the backside turn-on 22 is situated on a planar surface 18 of a wafer pad (not shown). The bonding pad region defined by one opening of the protective layer 48 is connected to the surface metal layer 23A as the bonding bonding wire 6D. Below the protective layer 48, an oxide or glass layer 25 protects the surface of the component from contamination. In operation, current flows from the surface metal layer 23A vertically through the epitaxial layer 21 and the substrate 20 to the back metal layer 22. The junction is present in the epitaxial layer 21, that is, the structure of the semiconductor element, and the flow of the main current is not important to the understanding and is not shown. While protective devices and voltage clamps are also examples, bipolar components typically include a semiconductor diode and a rectifier.
圖5B示出了三端垂直功率元件簡化剖面圖,如先前說明其中包括表面金屬層23A,塊材半導體材料20和磊晶層21,以及位於平面表面18上的晶片墊(未示出)上面的背面金屬22,如圖所示,由保護層48上的一個開口來界定接合墊的區域,當中的接合銲線6D使表面金屬層23A被接通,表示高電流連接元件的主要電流是垂直由表面金屬23流到背面金屬22連接。 Figure 5B shows a simplified cross-sectional view of a three-terminal vertical power device including a surface metal layer 23A, a bulk semiconductor material 20 and an epitaxial layer 21, as well as a wafer pad (not shown) on the planar surface 18, as previously described. The back metal 22, as shown, defines an area of the bond pad by an opening in the protective layer 48, wherein the bond wire 6D causes the surface metal layer 23A to be turned on, indicating that the main current of the high current connection element is vertical The surface metal 23 flows to the back metal 22 to be connected.
在表面金屬23A除出區域,氧化物層25保護該元件表面免受污染。金屬層23B座落氧化物層25上不被保護層48所覆蓋的區域,包括藉由接合銲線6C而接通的第二接合墊。這種類型的連接被用於閘極或輸入到元件。三極 垂直功率元件的例子,包括功率雙極電晶體、垂直功率MOSFET、絕緣閘雙極性電晶體(IGBT)和閘流管。剖面圖所示不包括存在於每個特定元件類型結構的接面,除了為了說明主要電流的流動是垂直和第二接合墊被含括作為閘極輸入。 In the area where the surface metal 23A is removed, the oxide layer 25 protects the surface of the element from contamination. The metal layer 23B sits on a region of the oxide layer 25 that is not covered by the protective layer 48, and includes a second bonding pad that is turned on by bonding the bonding wires 6C. This type of connection is used for the gate or input to the component. Tripolar Examples of vertical power components include power bipolar transistors, vertical power MOSFETs, insulated gate bipolar transistors (IGBTs), and thyristors. The cross-sectional views do not include junctions present in each particular component type structure, except that the flow of the primary current is vertical and the second bond pad is included as a gate input.
圖6示出相同封裝也可被用於三極橫向元件,電性藉由接合銲線6B和表面金屬23B連接到磊晶層45和基板44並不構成該元件的高電流路徑。相反,元件內的主電流在接合銲線6D接通的接合墊23D與接合銲線6A接通的接合墊23A間橫向流動。因為主要電流流通經兩條接合銲線取代僅一條接合線,如同垂直元件的情況,橫向元件的封裝不可避免遭受來自更高的寄生封裝,即銲線、電阻。另一個不同之處在於在橫向元件的情況下,該元件的主要電流並非垂直流動,所以基板44的背面和背面金屬的連接是不需要的。 Figure 6 shows that the same package can also be used for a three-pole lateral element that is electrically connected to the epitaxial layer 45 and the substrate 44 by bond wires 6B and surface metal 23B and does not constitute a high current path for the element. On the contrary, the main current in the element flows laterally between the bonding pad 23D to which the bonding wire 6D is turned on and the bonding pad 23A to which the bonding wire 6A is turned on. Since the main current flows through only two bonding wires instead of only one bonding wire, as in the case of vertical components, the packaging of the lateral components is inevitably subject to higher parasitic packages, namely wire bonds and resistors. Another difference is that in the case of a transverse element, the main current of the element does not flow vertically, so the connection of the back and back metal of the substrate 44 is not required.
總之,現今高產量的功率封裝自幾十年前開始以來僅似乎只見到小小的進步。DPAK和D2PAK封裝的工廠生產線過於呆板,需要大量的費用來適應多種封裝類型。固有的封裝被限制最多三個電極端子,限制了它們只適用於少數產品類型。封裝的中心導電引腳是必須短路連接到晶片墊,進一步限制對半導體元件佈局的選擇性。該封裝是 低面積效率,需要大“保留”區以及長導電引腳必需於引腳彎折而不損壞壓模塑膠封裝。大的封裝尺寸和長的接合銲線產生無用的寄生電阻和電感。引腳彎折的不精確,使得要確保引腳和暴露的晶片墊底部的良好共平面性變得困難以及造成PCB裝配良率不利的影響。所有上述的限制,加強現今功率封裝設計和製造能力的可能性以適應薄型或多引腳封裝在技術上和經濟上仍然是個問題。 In short, today's high-volume power packages have only seen small advances since the beginning of decades. The factory line of DPAK and D 2 PAK packages is too rigid and requires a lot of expense to accommodate multiple package types. The inherent package is limited to a maximum of three electrode terminals, limiting their use to only a few product types. The center conductive pin of the package must be shorted to the wafer pad, further limiting the selectivity to the layout of the semiconductor component. The package is low-area efficacies, requiring large "reserved" areas and long conductive leads that must be bent over the pins without damaging the molded plastic package. Large package sizes and long bond wires create unwanted parasitic resistance and inductance. The inaccuracy of the pin bends makes it difficult to ensure good coplanarity of the pins and the exposed wafer pad bottom and adversely affect PCB assembly yield. All of the above limitations, the possibility of enhancing today's power package design and manufacturing capabilities to accommodate thin or multi-pin packages remains technically and economically problematic.
新一代的功率封裝能力所需要的是提供薄型、低電感,和多引腳具有優越的共面能力,有著靈活,多用途且具有成本效益的生產線。 What is needed for a new generation of power packaging capabilities is the ability to provide thin, low inductance, multi-pin superior coplanarity, flexible, versatile and cost-effective production lines.
如本文所使用的術語“功率封裝”指的半導體封裝是包含一個或多個的半導體功率元件和/或一個或多個的功率積體電路。功率元件是帶有高電流的半導體元件,一般是1A到數百安培。功率元件可傳導高電流在低壓降,即包括低工作電阻元件,其功率消散是最小。或者,功率元件可包括元件能傳導中至高電流於其較大電壓降,損耗1瓦至幾十瓦的功率,並要求散熱片來將熱量傳導出去,以避免過熱而損壞元件或其封裝。功率元件可包括二極電晶體;多種類型和構造的功率MOSFETs;絕緣閘雙極電晶體(IGBT);或多種類 型和構造的閘流管,包括的SCR或矽控整流器。功率積體電路包括一個或多個具有閘極驅動器和一般具邏輯和數位控制電路的功率電路。 The term "power package" as used herein refers to a semiconductor package that is comprised of one or more semiconductor power components and/or one or more power integrated circuits. Power components are semiconductor components with high currents, typically 1A to hundreds of amps. Power components can conduct high currents at low dropouts, including low operating resistance components, with minimal power dissipation. Alternatively, the power component can include components capable of conducting medium to high currents at a large voltage drop, depleting 1 watt to tens of watts of power, and requiring a heat sink to conduct heat away to avoid overheating and damaging the component or its package. Power components can include dipolar transistors; power MOSFETs of various types and configurations; insulated gate bipolar transistors (IGBT); or various types Type and construction of thyristors, including SCR or 矽 controlled rectifiers. The power integrated circuit includes one or more power circuits having gate drivers and generally logic and digital control circuits.
本發明的底腳功率封裝包括半導體晶片,晶片墊,引腳和一個塑封膠體。在許多實施方案中,封裝還包括至少一個散熱片用來將熱從封裝的該晶片傳到PCB的散熱。為了協助熱傳遞的過程,晶片墊可以被暴露於塑封膠體的底面。在垂直的剖面圖時引腳通常被看成Z形且包括一個垂直柱段,一個懸臂部分和一個底腳。從剖面圖來看,懸臂段朝著垂直柱段頂部的晶片墊水平向內突出,且底腳在垂直柱段的底部水平朝外突出。該垂直柱段一般是與懸臂段與底腳形成直角且銳角。引腳的底表面與塑封膠體的底表面是共平面。 The foot power package of the present invention includes a semiconductor wafer, a wafer pad, a lead and a plastic encapsulant. In many embodiments, the package further includes at least one heat sink for dissipating heat from the packaged wafer to the heat sink of the PCB. To aid in the heat transfer process, the wafer pad can be exposed to the underside of the molding compound. In a vertical profile view, the pin is typically viewed as a Z-shape and includes a vertical column segment, a cantilever portion and a foot. From the cross-sectional view, the cantilever segment protrudes horizontally inward toward the wafer pad at the top of the vertical column segment, and the foot protrudes horizontally outward at the bottom of the vertical column segment. The vertical column section generally forms a right angle and an acute angle with the cantilever section and the foot. The bottom surface of the pin is coplanar with the bottom surface of the molding compound.
在一些實施方案中,垂直柱段水平延伸超出塑封膠體的側面,以形成一突出的部分。在其他實施方案中,所述塑封膠體的側表面向外延伸超出垂直柱段並覆蓋部分底腳的上表面。底腳的上表面全部或部分被暴露。 In some embodiments, the vertical column segments extend horizontally beyond the sides of the molding gel to form a protruding portion. In other embodiments, the side surface of the molding compound extends outward beyond the vertical column section and covers the upper surface of a portion of the foot. The upper surface of the foot is exposed in whole or in part.
在許多實施方案中,散熱片是從塑封膠體突出之 晶片墊的延伸。散熱片可能有一底腳類似於引腳的底腳,或散熱片可能在兩側或三側有底腳。散熱片可以包括一個洞用於螺栓安裝。散熱片可以形成為一連串的手指用以增加其周邊邊緣相對其面積的長度,從而改善波峰焊接熱阻。在一些實施方案中有兩個或三個散熱片分別從晶片墊的兩側或三側延伸。 In many embodiments, the heat sink is protruded from the plastic sealant The extension of the wafer pad. The heat sink may have a foot that is similar to the foot of the pin, or the heat sink may have feet on either or both sides. The heat sink can include a hole for bolt mounting. The heat sink can be formed as a series of fingers to increase the length of its peripheral edge relative to its area, thereby improving the wave soldering thermal resistance. In some embodiments, two or three fins extend from either or both sides of the wafer pad.
本發明獨特地底腳功率封裝結合傳統底腳封裝,如圖1B所示,和那些無引腳封裝的特性。因此,垂直柱段的垂直邊緣形成一個垂直平面並且不是被塑封膠體覆蓋就是略微位於塑封膠體的外側。在垂直柱段的垂直外邊緣被塑封膠體所覆蓋的實施方案中,該底腳在塑封膠體側表面的底部向外突出。底腳的底表面至少從相鄰塑封膠體側面的位置到底腳的末端部是平坦的。這些功能將封裝的水平尺寸最小化。 The unique foot power package of the present invention incorporates a conventional foot package, as shown in Figure 1B, and the characteristics of those leadless packages. Thus, the vertical edges of the vertical column segments form a vertical plane and are either not covered by the molding gel or slightly outside the molding gel. In embodiments where the vertical outer edge of the vertical column section is covered by a molding compound, the foot projects outwardly at the bottom of the side surface of the molding gel. The bottom surface of the foot is at least flat from the side of the adjacent molding gel and the end portion of the foot is flat. These features minimize the horizontal size of the package.
本發明還包括用於形成一個功率封裝的製程。該製程包括在金屬片的第一面上形成第一光罩層,然後部分蝕刻穿該金屬片在第一光罩層區域藉由形成開口成為所述的晶片墊,引腳的懸臂段和引腳與晶片墊之間的間隙被定位。或者,如果晶片墊暴露於該塑封膠體的底部,光罩層覆蓋的晶片墊也被定位則該區域不 會被蝕刻。局部蝕刻不會切穿整個金屬片,以及蝕刻區域維持金屬薄層。 The invention also includes a process for forming a power package. The process includes forming a first mask layer on a first side of the metal sheet, and then partially etching through the metal sheet to form the wafer pad by forming an opening in the first mask layer region, the cantilever segment of the lead and the lead The gap between the foot and the wafer pad is positioned. Alternatively, if the wafer pad is exposed to the bottom of the molding compound, the wafer pad covered by the mask layer is also positioned, and the area is not Will be etched. Local etching does not cut through the entire metal sheet, and the etched area maintains a thin metal layer.
該製程進一步還包括在金屬片的第二面上形成第二光罩層,第二光罩層具有第一和第二開口,在第二光罩層的第一開口覆蓋了該晶片墊和該引腳之間的間隙,在第二光罩層的第二開口覆蓋了引腳的底腳區域被定位。如果多封裝從該金屬片被形成,所述第二光罩層的第二開口也可覆蓋分隔相鄰封裝的區域。 The process further includes forming a second mask layer on the second side of the metal sheet, the second mask layer having first and second openings, the first opening of the second mask layer covering the wafer pad and the The gap between the pins is located in the second opening of the second mask layer covering the pin area of the pin. If a plurality of packages are formed from the metal sheet, the second opening of the second mask layer may also cover an area separating adjacent packages.
然後該金屬片藉由第二光罩層的第一和第二開口被蝕刻。該蝕刻持續進行直至在晶片墊和引腳間被定位間隙區域內的金屬完全被移除,但在被定位的底腳區域僅部分被移除(和區域內分割的相鄰封裝)。第一光罩層的第一開口和第二光罩層的第二開口是彼此的垂直偏移,如此金屬片的部分在蝕刻過程維持不受影響。這部分將形成引腳的垂直柱段。 The metal sheet is then etched by the first and second openings of the second mask layer. The etch continues until the metal in the interposed gap region between the wafer pad and the leads is completely removed, but only partially removed (and adjacent packages that are divided within the region) in the positioned foot region. The first opening of the first photomask layer and the second opening of the second photomask layer are vertically offset from each other such that portions of the metal sheet remain unaffected during the etching process. This section will form the vertical column segments of the pins.
可替代地,金屬沖壓製程可以用來替代上述的蝕刻製程。第一金屬沖模被應用到金屬片的第一側,用以擠壓和輾薄金屬片成為引腳懸臂段以及晶片墊和引腳間被定位的間隙(也可選擇晶片墊被定位的地方)。 第二金屬沖模被應用到金屬片的第二面,用以切斷金屬片上晶片墊與引線間被定位的間隙以及用以擠壓和輾薄金屬片上引腳之底腳定位的地方(也可選擇在相鄰封裝之間的區域)。 Alternatively, a metal stamping process can be used in place of the etching process described above. A first metal die is applied to the first side of the metal sheet for squeezing and thinning the metal sheet into a pin cantilever segment and a gap between the wafer pad and the pin (also where the wafer pad is positioned) . A second metal die is applied to the second side of the metal sheet to cut the gap between the wafer pad and the lead on the metal piece and to place the pin for pinching and thinning the pin on the metal piece (also Select the area between adjacent packages).
不論是使用是蝕刻或是沖壓製程,結果通常是一個導線架有多個晶片墊,每個晶片墊與多個引腳相連接。如果封裝是只要有晶片墊相對的兩個側(一個“雙側”封裝)有引腳,晶片墊通常在導線架中至少藉由一個的連接槓固定位置。如果封裝在晶片墊的四邊(一個“四邊”封裝)皆有引腳,該晶片墊通常至少留有一邊被連接到相連繫的引腳,在晶片墊和上述蝕刻或沖壓製程中至少一邊相連繫的引腳之間形成無間隙存在。無論哪種方式,晶片墊保持被連接到導線架。 Whether using an etch or stamp process, the result is typically a leadframe with multiple wafer pads, each wafer pad being connected to multiple pins. If the package is provided with pins on opposite sides of the wafer pad (a "double side" package), the wafer pads are typically held in position in the lead frame by at least one of the tie bars. If the package is provided with pins on all four sides of the wafer pad (a "four-sided" package), the wafer pad typically has at least one side connected to the pins of the interconnect, at least one side of the wafer pad and the etching or stamping process described above. There is no gap between the pins. Either way, the wafer pad remains attached to the leadframe.
然後,半導體晶片被黏著到晶片墊,並在晶片墊和引腳間通常使用接合銲線或倒裝晶片技術而形成一個電性連接。可替代地,晶片的表面可用一個銲夾連接到引腳。晶片、晶片墊和引腳的一部分被包入在塑膠壓模混合物中被固化以形成一個塑封膠體,所謂塑封膠體至少留下引腳一部分底腳未覆蓋。在一些實施方案中,塑封膠體並不覆蓋所述垂直柱段的垂直外表面,在引腳的頂部形成一個突 出部。 The semiconductor wafer is then bonded to the wafer pad and an electrical bond is typically formed between the wafer pad and the leads using bond wire or flip chip technology. Alternatively, the surface of the wafer can be attached to the pins with a solder clip. A portion of the wafer, wafer pad and leads are encapsulated in a plastic mold mixture to be cured to form a plastic encapsulant, the so-called plastic encapsulant leaving at least a portion of the pin uncovered. In some embodiments, the molding compound does not cover the vertical outer surface of the vertical column segment, forming a protrusion at the top of the pin Out.
然後導線架和半導體晶片被分割成單獨的封裝。 The leadframe and semiconductor wafer are then divided into individual packages.
各式各樣的底腳功率封裝根據本發明可以被製造。由於引腳與封裝和晶片墊的底部是共平面的,這些引腳在本文中稱為“底腳”,將所產生的封裝稱為“底腳封裝”。這些包括: A wide variety of foot power packages can be made in accordance with the present invention. Since the pins are coplanar with the bottom of the package and wafer pad, these pins are referred to herein as "foot" and the resulting package is referred to as a "foot package." These include:
●底腳功率封裝在一側上有多數個底腳且在相對側上有一散熱片。一個或多數個的底腳的可直接從晶片墊延伸。在不同實施例的底腳的數量不同,例如,三底腳、五底腳到七底腳。 The foot power package has a plurality of feet on one side and a heat sink on the opposite side. One or more of the feet can extend directly from the wafer pad. The number of feet in different embodiments differs, for example, three feet, five feet to seven feet.
●底腳功率封裝在一側上有多數個底腳而散熱片從晶片墊上相對與底腳直角的兩側延伸。 The foot power package has a plurality of legs on one side and the heat sinks extend from the wafer pads at opposite sides of the wafer.
●底腳功率封裝在一側上有多數個底腳而一個三側面散熱片從封裝的其餘側延伸。 The foot power package has a plurality of feet on one side and a three side heat sink extending from the remaining side of the package.
●雙底腳功率封裝在兩側有多數個底腳而散熱片從晶片墊上相對直角引腳的兩側延伸。有些底腳是以電性和機械相互連接或連接至該晶片墊。 The double foot power package has a plurality of legs on both sides and the heat sink extends from opposite sides of the wafer pad to the right angle pins. Some of the feet are electrically and mechanically connected to each other or to the wafer pad.
●底腳功率封裝包括兩個晶片墊、底腳在封裝上相對兩側而散熱片從封裝上的晶片墊相對直角底腳兩側延伸。 The foot power package includes two wafer pads, the legs are on opposite sides of the package, and the heat sink extends from the wafer pads on the package to opposite sides of the right angle foot.
●底腳功率封裝在三側上有多數個底腳而散熱片在第四側。在一實施方案中,有五底腳分別在三側。 ● The foot power package has a plurality of legs on three sides and a heat sink on the fourth side. In one embodiment, there are five feet on each of the three sides.
●底腳功率封裝有多數個引腳,其中至少有一個底腳被藉由焊夾連接到黏著在晶片墊上的晶片表面。 The foot power package has a plurality of pins, at least one of which is connected to the surface of the wafer adhered to the wafer pad by a solder clip.
根據本發明上述之目的,本發明提供一種底腳功率封裝,包括:一塑封膠體;該第一引腳部分包在塑封膠體內,該第一引腳包括底腳,該底腳在塑封膠體的底部第一侧向外突出;該一晶片銲墊至少部分包在塑封膠體內;以及一第一散熱片從該晶片銲墊延伸至該塑封膠體以外的位置。 According to the above object of the present invention, the present invention provides a foot power package comprising: a plastic encapsulant; the first pin portion is wrapped in a plastic encapsulant, the first pin includes a foot, and the foot is in a plastic encapsulant The first side of the bottom protrudes outwardly; the wafer pad is at least partially enclosed in the molding compound; and a first heat sink extends from the wafer pad to a position other than the molding compound.
較佳地,該散熱片包括一底腳。 Preferably, the heat sink comprises a foot.
較佳地,該第一引腳的該底腳之底面和該先前散熱片的底面是共平面。 Preferably, the bottom surface of the foot of the first pin and the bottom surface of the previous heat sink are coplanar.
較佳地,該第一引腳包括一立柱段和一懸臂段,該懸臂段的上表面與該晶片銲墊的一上表面是共平面。 Preferably, the first pin includes a column segment and a cantilever segment, and an upper surface of the cantilever segment is coplanar with an upper surface of the die pad.
較佳地,更包括一晶片安裝在該晶片銲墊上表面,該晶片被電路連接到該第一引腳的該懸臂段。 Preferably, a wafer is mounted on the upper surface of the wafer pad, and the wafer is electrically connected to the cantilever segment of the first pin.
較佳地,該晶片藉由焊夾的方法被電路連接到該第一引腳的該懸臂段。 Preferably, the wafer is electrically connected to the cantilever section of the first pin by a solder clip.
較佳地,包括一第二引腳,該第二引腳從該晶片銲墊延伸,該第二引腳部分被包住於塑封膠體內,該第二引腳包括一底腳,該第二引腳的底腳在該塑封膠體的底部一側向外突出。 Preferably, a second pin is extended from the die pad, the second pin portion is enclosed in the molding compound, and the second pin includes a foot, the second pin The foot of the pin protrudes outward on the bottom side of the molding compound.
較佳地,其中該晶片的一底表面與該晶片墊是形成為電路連接。 Preferably, a bottom surface of the wafer is formed in electrical connection with the wafer pad.
較佳地,更包括一第三引腳,該第一引腳、該第二引腳和該第三引腳從該塑封膠體的該第一側延伸,該第一散熱片從該塑封膠體的另一端延伸。 Preferably, the method further includes a third pin, the first pin, the second pin and the third pin extending from the first side of the molding compound, the first heat sink from the plastic sealing body The other end extends.
較佳地,其中該第二引腳位於該第一引腳和該第三引腳之間。 Preferably, the second pin is located between the first pin and the third pin.
較佳地,其中該第一引腳從該塑封膠體的該第一側延伸,和其中該第一散熱片從該塑封膠體的該第一側對面的第二側延伸。 Preferably, the first pin extends from the first side of the molding compound, and wherein the first heat sink extends from a second side opposite the first side of the molding compound.
較佳地,其中該散熱片從塑封膠體的第二、第三和第四側延伸。 Preferably, the heat sink extends from the second, third and fourth sides of the molding compound.
較佳地,更包括一第二散熱片,該第二散熱片從該塑封膠體的第二側延伸,該第三散熱片從該塑封膠體的第三側延伸。 Preferably, the second heat sink further extends from the second side of the molding compound, and the third heat sink extends from the third side of the molding compound.
較佳地,其中塑封膠體的每個第二和第三側垂直於塑封膠體的第一側。 Preferably, each of the second and third sides of the molding compound is perpendicular to the first side of the molding compound.
較佳地,其中該散熱片包括一螺栓安裝孔。 Preferably, the heat sink comprises a bolt mounting hole.
較佳地,其中該散熱片包括一系列平行指狀物。 Preferably, wherein the heat sink comprises a series of parallel fingers.
根據本發明上述之目的,本發明提供一種利用金屬片製造一底腳功率封裝之方法,包括:放置一第一光罩層於該金屬片的第一表面上,該第一光罩層覆蓋的面積是晶片銲墊和散熱片被形成的區域以及引腳的底腳被形成的區域,該第一光罩層有一第一開口的面積是該引腳一懸臂段形成的區域;以及蝕刻通過該金屬片在該第一光罩層的該第一開口。 In accordance with the above objects, the present invention provides a method of fabricating a foot power package using a metal sheet, comprising: placing a first mask layer on a first surface of the metal sheet, the first mask layer covering The area is a region where the wafer pad and the heat sink are formed, and a region where the pin of the pin is formed, the area of the first mask layer having a first opening is a region where the pin is formed by a cantilever segment; and etching is performed A metal sheet is in the first opening of the first mask layer.
較佳地,更包括:放置一第二光罩層於該金屬片 的第二表面上,該第二光罩層的第一開口是該引腳的該底腳被形成的區域;以及該方法包括蝕刻該金屬片通過在該第二光罩層的該第一開口。 Preferably, the method further includes: placing a second mask layer on the metal sheet a second opening of the second mask layer is a region of the pin where the foot is formed; and the method includes etching the metal sheet through the first opening of the second mask layer .
較佳地,其中該第二光罩層的第二開口的面積是於該散熱片的該底腳被形成的區域,該方法包括蝕刻該金屬片通過在第二光罩層的該第二開口。 Preferably, wherein the area of the second opening of the second mask layer is the area where the foot of the heat sink is formed, the method includes etching the metal sheet through the second opening of the second mask layer .
較佳地,其中在該第一光罩層的該第一開口延伸的面積是該引腳和該晶片銲墊間被形成的一間隙區域,和其中該第二光罩層的該第二開口的面積是該散熱片的一底腳被形成的區域,該方法包括蝕刻該金屬片通過在該第二光罩層的該第二開口。 Preferably, an area extending in the first opening of the first mask layer is a gap region formed between the pin and the wafer pad, and wherein the second opening of the second mask layer The area is the area in which a foot of the heat sink is formed, the method comprising etching the metal sheet through the second opening in the second mask layer.
本發明將藉由參照下列附圖和詳細描述可被更全面地理解。 The invention will be more fully understood by reference to the appended claims appended claims.
1‧‧‧底腳封裝 1‧‧‧foot package
2‧‧‧模壓塑料 2‧‧‧Molded plastic
3‧‧‧導線架 3‧‧‧ lead frame
3A‧‧‧金屬晶片墊 3A‧‧‧metal wafer pad
3B、3C、3D‧‧‧金屬引腳 3B, 3C, 3D‧‧‧ metal pins
3G‧‧‧導線架 3G‧‧‧ lead frame
3Z‧‧‧投影 3Z‧‧·projection
4B、4C、4D‧‧‧彎折部分 4B, 4C, 4D‧‧‧ bent parts
5‧‧‧半導體晶片 5‧‧‧Semiconductor wafer
6A、6C、6D‧‧‧接合銲線 6A, 6C, 6D‧‧‧ joint wire
8‧‧‧表面 8‧‧‧ surface
17‧‧‧橫向距離/引腳空間 17‧‧‧Transverse distance/pin space
18‧‧‧表面 18‧‧‧ surface
20‧‧‧主體半導體材料 20‧‧‧Main semiconductor materials
21‧‧‧磊晶層 21‧‧‧ epitaxial layer
22‧‧‧背面金屬 22‧‧‧Back metal
23A‧‧‧表面金屬/接合焊墊 23A‧‧‧Surface metal/joint pad
23B‧‧‧金屬層 23B‧‧‧ metal layer
23D‧‧‧接合焊墊 23D‧‧‧Joint pad
25‧‧‧氧化物/玻璃層 25‧‧‧Oxide/glass layer
30‧‧‧光罩 30‧‧‧Photomask
31‧‧‧光罩 31‧‧‧Photomask
32‧‧‧間隙 32‧‧‧ gap
34A、34D‧‧‧焊料 34A, 34D‧‧‧ solder
35‧‧‧晶片粘接/晶片附著層 35‧‧‧ wafer bonding/wafer adhesion layer
37A‧‧‧下部底板 37A‧‧‧lower bottom plate
37B‧‧‧上部模穴 37B‧‧‧Upper cavity
38‧‧‧導線架條 38‧‧‧ lead wire strip
41A、41B、41C、41D‧‧‧導體 41A, 41B, 41C, 41D‧‧‧ conductor
42‧‧‧通孔 42‧‧‧through hole
43A、43B‧‧‧導體層 43A, 43B‧‧‧ conductor layer
44‧‧‧虛線/保留區 44‧‧‧Dash/reserved area
45‧‧‧焊料層/錫膏 45‧‧‧Solder layer/solder paste
47‧‧‧MOSFET 47‧‧‧ MOSFET
48‧‧‧保護層 48‧‧‧Protective layer
49A、49B‧‧‧電感 49A, 49B‧‧‧Inductance
70‧‧‧底腳功率封裝 70‧‧‧foot power package
72‧‧‧模壓塑料 72‧‧‧Molded plastic
73A‧‧‧銅晶片墊 73A‧‧‧ copper wafer pad
73B、73C、73D‧‧‧導電引腳 73B, 73C, 73D‧‧‧ conductive pins
73E、73F、73G‧‧‧導電引腳 73E, 73F, 73G‧‧‧ conductive pins
73H‧‧‧晶片墊 73H‧‧‧ wafer pad
75‧‧‧半導體晶片 75‧‧‧Semiconductor wafer
76C、76D‧‧‧接合銲線 76C, 76D‧‧‧ Bonding wire
78‧‧‧表面 78‧‧‧ Surface
78C‧‧‧底腳 78C‧‧‧ feet
79A、79B、79C、79D‧‧‧底腳 79A, 79B, 79C, 79D‧‧‧ feet
80X、80Y‧‧‧切割線 80X, 80Y‧‧‧ cutting line
81Y‧‧‧橫向長度 81Y‧‧‧Horizontal length
86‧‧‧散熱片 86‧‧‧ Heat sink
87‧‧‧突出部 87‧‧‧Protruding
88‧‧‧表面 88‧‧‧Surface
89‧‧‧蝕刻間隙 89‧‧‧etching gap
90‧‧‧銅焊夾 90‧‧‧ Brazing clamp
91A‧‧‧蝕刻區域 91A‧‧‧etched area
91B‧‧‧焊料或導電環氧樹脂層 91B‧‧‧ Solder or conductive epoxy layer
91Z‧‧‧光罩特徵 91Z‧‧‧Photo Mask Features
91Y‧‧‧光罩邊緣 91Y‧‧‧mask edge
99‧‧‧緩衝距離 99‧‧‧ Buffer distance
100‧‧‧PCB 100‧‧‧PCB
101‧‧‧光罩 101‧‧‧Photomask
101A、101B‧‧‧導電層 101A, 101B‧‧‧ conductive layer
102‧‧‧導通孔 102‧‧‧through hole
103‧‧‧光罩 103‧‧‧Photomask
104A、104B、104C‧‧‧開口 104A, 104B, 104C‧‧‧ openings
105‧‧‧導熱層 105‧‧‧Conducting layer
105A‧‧‧蝕刻區 105A‧‧‧etched area
105B‧‧‧銅 105B‧‧‧Copper
111A、111H‧‧‧台階狀墊延伸 111A, 111H‧‧‧stepped pad extension
115A‧‧‧金屬/連接槓 115A‧‧‧Metal/Connecting Bar
115C、115B、115D‧‧‧連接槓 115C, 115B, 115D‧‧‧ Connecting bars
116A、116B‧‧‧連接槓 116A, 116B‧‧‧Connecting bars
120A、120B‧‧‧框架 120A, 120B‧‧‧ framework
120C、120D‧‧‧交叉框架 120C, 120D‧‧‧ cross frame
130~139‧‧‧步驟 130~139‧‧‧Steps
135‧‧‧導電環氧樹脂/焊料層 135‧‧‧ Conductive epoxy/solder layer
下面列出的附圖中,一般都是類似的部件給出相同的參考標號。 In the drawings listed below, generally similar components are given the same reference numerals.
圖1A係為一個先前技術DPAK或D2PAK類型結構典型的功率封裝俯視圖; 圖1B係為一個先前技術DPAK功率封裝在沿著並通過獨立引腳的切割線剖面圖;圖1C係為一個先前技術DPAK功率封裝在沿著並通過連接引腳的切割線剖面圖;圖1D係為一個先前技術DPAK功率封裝的底面俯視圖;圖2A示出一個先前技術DPAK在製造過程中銅導線架背面側蝕刻之後連接及獨立引腳的剖面圖;圖2B示出一個相同的DPAK正面蝕刻後的剖面圖;圖2C示出一個相同的DPAK晶片黏著後的剖面圖;圖2D示出一個相同的DPAK銲線接合後的剖面圖;圖2E示出一個相同的DPAK塑封成型後的剖面圖;圖2F示出一個相同的DPAK引腳彎折後的剖面圖;圖3A示出一個黏著先前技術DPAK功率封裝的印刷電路板佈局俯視圖;圖3B示出一個黏著於印刷電路板的DPAK功率封裝剖面圖;圖3C示出一個功率MOSFET黏著於DPAK功率封裝的的等效電路,顯示寄生封裝電感;圖4A示出一個DPAK功率封裝的導線架俯視圖;圖4B示出一個DPAK功率封裝的模具的剖面圖;圖5A示出一個通用的雙極功率元件的剖面圖;圖5B示出一個通用的三極垂直功率元件的剖面圖; 圖6示出一個通用的三極橫向功率元件的剖面圖;圖7A係為根據本發明的一個底腳功率封裝俯視圖;圖7B係為一個底腳功率封裝沿著並通過底腳沒有連接到晶片墊之切割線的剖面圖;圖7C係為一個底腳功率封裝沿著並通過底腳連接到晶片墊之切割線的剖面圖;圖7D係為一個底腳功率封裝底面的俯視圖;圖7E係為一個黏著在PCB上的底腳功率封裝剖面圖;圖7F係為一個底腳功率封裝的立體圖;圖7G係為另一種底腳功率封裝的立體圖;圖8A係為根據本發明所有的一種替代散熱片設計的底腳功率封裝的立體圖圖8B係為另一種替代散熱片設計的底腳功率封裝的立體圖;圖9A係為一個底腳功率封裝的銅導線架剖面圖,概略地示出了在製造過程中被產生和移除的各個部分;圖9B係為一個背面蝕刻之前的導線架剖面圖;圖9C係為一個正面蝕刻之前的導線架剖面圖;圖9D係為一個蝕刻後的導線架剖面圖;圖9E係為一個晶片黏著和銲線接合後的導線架剖面圖;圖9F係為一個導線架塑封成型後的剖面圖;圖9G係為一個底腳功率封裝替代版本的導線架於塑封成 型後之剖面圖;圖9H係為根據本發明的底腳功率封裝的製造流程圖;圖10A係為根據本發明用於單晶片底腳功率封裝的導線架俯視圖;圖10B係為用於具有兩個導線架框架的多晶片底腳功率封裝導線架之俯視圖;圖10C係為用於具有單個導線架框架的多晶片底腳功率封裝導線架之俯視圖;圖10D係為用於具有兩個導線架框架的多晶片底腳功率封裝導線架之俯視圖;圖10E係為用於具有兩個導線架框架的多晶片底腳功率封裝替代版本導線架之俯視圖;圖10F係為多晶片底腳功率封裝導線架具有兩個導線架框架其中晶片墊沒有與引腳相連接版本的俯視圖;圖11係為用於底腳功率封裝導線架的俯視圖和剖面圖;圖12A係為一種底腳功率封裝導線架具替代形式散熱片俯視圖;圖12B係為另一種底腳功率封裝導線架具替代形式散熱片的俯視圖;圖13A係為一種底腳功率封裝導線架具有三面散熱片的俯視圖;圖13B係為一種底腳功率封裝導線架具有側面散熱片的俯 視圖;圖14A係為一種雙邊底腳功率封裝導線架具有側面散熱片的俯視圖;圖14B係為另一種雙邊底腳功率封裝導線架具有側面散熱片的俯視圖;圖14C係為一種雙邊底腳功率封裝導線架具有側面散熱片和隔絕的晶片墊之俯視圖;圖14D係為另一種雙邊底腳功率封裝導線架具有側面散熱片的俯視圖;圖15A係為一種底腳功率封裝導線架具有側面散熱片和雙晶片墊的俯視圖和剖面圖;圖15B係為一種底腳功率封裝導線架具有側面散熱片和超尺寸雙晶片墊的俯視圖和剖面圖;圖16A係為一種具有5個引腳的底腳功率封裝導線架俯視圖;圖16B係為一種具有7個引腳的底腳功率封裝導線架俯視圖;圖17係為一種15個引腳之底腳功率封裝並具散熱片的導線架俯視圖;圖18係為一種底腳功率封裝導線架具有焊夾表面連接的俯視圖和剖面圖;圖19係為傳統功率封裝和根據本發明的底腳功率封裝的 剖面比較圖。 1A is a top view of a typical power package of a prior art DPAK or D 2 PAK type structure; FIG. 1B is a cross-sectional view of a prior art DPAK power package along a cutting line passing through and through separate pins; FIG. 1C is a previous Technical DPAK power package is a cut-away line view along and through the connection pins; Figure 1D is a bottom plan view of a prior art DPAK power package; Figure 2A shows a prior art DPAK etched on the back side of a copper lead frame during fabrication Figure 2B shows a cross-sectional view of the same DPAK front side etched; Figure 2C shows a cross-sectional view of the same DPAK wafer after bonding; Figure 2D shows an identical DPAK bonding line FIG. 2E shows a cross-sectional view of the same DPAK after molding; FIG. 2F shows a cross-sectional view of the same DPAK pin after bending; FIG. 3A shows an adhesive prior art DPAK power package. Printed circuit board layout top view; Figure 3B shows a DPAK power package profile attached to a printed circuit board; Figure 3C shows the equivalent of a power MOSFET adhered to a DPAK power package Figure 4A shows a top view of a lead frame of a DPAK power package; Figure 4B shows a cross-sectional view of a die of a DPAK power package; Figure 5A shows a cross-sectional view of a general-purpose bipolar power element; 5B shows a cross-sectional view of a general three-pole vertical power component; FIG. 6 shows a cross-sectional view of a general three-pole lateral power component; FIG. 7A is a top view of a foot power package according to the present invention; A cross-sectional view of a foot power package along a cutting line that is not connected to the wafer pad by the foot; FIG. 7C is a cross-sectional view of a cutting line of the foot power package connected to the wafer pad through the foot; 7D is a top view of the bottom of a foot power package; Figure 7E is a cross-sectional view of the power package of the foot adhered to the PCB; Figure 7F is a perspective view of a foot power package; Figure 7G is another foot power FIG. 8A is a perspective view of a foot power package of an alternative heat sink design according to the present invention. FIG. 8B is a perspective view of another foot power package for replacing the heat sink design. Figure 9A is a cross-sectional view of a copper lead frame of a foot power package, schematically showing portions that are created and removed during the manufacturing process; Figure 9B is a cross-sectional view of the lead frame before back etching; 9C is a cross-sectional view of the lead frame before the front side etching; FIG. 9D is a cross-sectional view of the etched lead frame; FIG. 9E is a cross-sectional view of the lead frame after the die bonding and wire bonding; FIG. 9F is a FIG. 9G is a cross-sectional view of a lead frame of a foot power package instead of a plastic package; FIG. 9H is a manufacturing flow chart of a foot power package according to the present invention; FIG. Figure 10B is a plan view of a lead frame for a single-wafer foot power package according to the present invention; Figure 10B is a plan view of a multi-chip foot power package lead frame having two lead frame frames; Figure 10C is for a single Top view of the multi-chip foot power package lead frame of the lead frame; FIG. 10D is a top view of the multi-chip foot power package lead frame with two lead frame; FIG. 10E is for A top view of the multi-wafer foot power package of the two leadframe frames in place of the version of the lead frame; FIG. 10F is a top view of the multi-wafer foot power package lead frame having two lead frame frames in which the wafer pads are not connected to the pins; Figure 11 is a top view and a cross-sectional view of a lead power package lead frame; Figure 12A is a top view of a foot power package lead frame with an alternative heat sink; Figure 12B is another foot power package lead frame replacement FIG. 13A is a top view of a three-sided heat sink of a foot power package lead frame; FIG. 13B is a top view of a foot power package lead frame having a side heat sink; FIG. 14A is a bilateral foot; The power package lead frame has a top view of the side heat sink; FIG. 14B is a top view of another bilateral foot power package lead frame with a side heat sink; FIG. 14C is a bilateral foot power package lead frame with side heat sink and isolation a top view of the wafer pad; FIG. 14D is a top view of another bilateral foot power package lead frame having a side heat sink; 15A is a top view and a cross-sectional view of a foot power package lead frame having a side heat sink and a dual wafer pad; FIG. 15B is a top view and a cross-sectional view of a foot power package lead frame having a side heat sink and an oversized dual wafer pad Figure 16A is a top view of a 5-pin foot power package lead frame; Figure 16B is a top view of a 7-pin foot power package lead frame; Figure 17 is a 15 pin bottom FIG. 18 is a top view and a cross-sectional view of a foot power package lead frame having a solder clip surface connection; FIG. 19 is a conventional power package and a foot power package according to the present invention; Section comparison chart.
為了推動當今的功率封裝技術,某些根本性的改變化必須進行,在製造過程中,封裝和導線架架的設計上。希望改進下一代功率封裝,包括:●保證引腳和外露晶片墊的背面共平面;●可焊的,同時可使用波峰焊接和回焊PCB製造;●合理地低熱阻在無使用焊料預置於散熱片下;●薄型的能力;●降低電感,更短的引腳和接合銲線的長度;●良好的PCB面積效率,即大的晶片面積用於給定的PCB底腳面積;●靈活性針腳輸出,不要求引腳連接在晶片墊;●靈活性導電引腳數目,可用於一側,二側或三側面上;●免除引腳彎折(成型)的機器;●壓模模具的最小花費;使用本發明的揭露,上述這樣的特徵和優點是容易獲得的,用最小或沒有新投資在重組一條生產線,包括用於製造高產量的DPAK和D2PAK封裝的生產線。本文所揭露作為應用於積體電路封裝的方法在上 述所引用的美國申請號14/056,287中被揭露。功率封裝通常用於封裝功率元件或功率積體電路。雖然該功率封裝可被用於非功率應用,一般功率封裝有更少的引腳,更低的熱阻,以及比具有相似引腳數目的IC封裝需更高的材料成本,因此通常只用於封裝功率元件和功率積體電路。 In order to advance today's power packaging technology, some fundamental changes must be made in the manufacturing process, packaging and lead frame design. Hope to improve next-generation power packages, including: ● Ensure that the pins and the exposed wafer pads are coplanar on the back side; ● Solderable, and can be fabricated using wave soldering and reflow soldering PCBs; ● Reasonably low thermal resistance in solderless presets Under the heat sink; ● thin capability; ● reduced inductance, shorter lead and bond wire length; ● good PCB area efficiency, ie large wafer area for a given PCB foot area; Pin output, does not require pins to be connected to the wafer pad; ● flexible number of conductive pins, can be used on one side, two sides or three sides; ● machine that eliminates pin bending (forming); ● minimum of die Costs; using the disclosure of the present invention, such features and advantages are readily available, reorganizing a production line with minimal or no new investment, including production lines for manufacturing high throughput DPAK and D2PAK packages. Disclosed herein as a method for applying integrated circuit packages It is disclosed in U.S. Application Serial No. 14/056,287, which is incorporated herein by reference. Power packages are typically used to package power components or power integrated circuits. Although this power package can be used for non-power applications, the general power package has fewer pins, lower thermal resistance, and higher material cost than IC packages with similar pin counts, so it is usually only used for The power component and the power integrated circuit are packaged.
功率元件是承載大電流通常為1A到幾百安培的半導體元件。功率元件可在低電壓降下的情況下傳導高電流,即包括低工作電阻元件,其功率耗散被最小化。替代的功率元件包括可傳導中到高電流具有較大電壓降,耗散1瓦到幾十瓦的功率,並要求散熱片來將熱量傳導帶走,以避免過熱而損壞元件或其封裝。功率元件可以包括雙極電晶體;各種類型和構造的功率MOSFET;絕緣閘雙極電晶體(IGBT);或各種類型和構造的閘流電晶體,包括的SCR或矽控整流器。功率積體電路包括一個或多數個具有閘極驅動器的功率元件以及一般具有類比和數位的控制電路。 Power components are semiconductor components that carry large currents typically ranging from 1A to hundreds of amperes. Power components can conduct high currents with low voltage drops, including low operating resistance components, with power dissipation being minimized. Alternative power components include a medium to high current that has a large voltage drop, dissipates 1 watt to tens of watts of power, and requires a heat sink to carry away heat conduction to avoid overheating and damage the component or its package. Power components can include bipolar transistors; power MOSFETs of various types and configurations; insulated gate bipolar transistors (IGBTs); or thyristor transistors of various types and configurations, including SCR or step-controlled rectifiers. The power integrated circuit includes one or more power components having gate drivers and control circuits generally having analog and digital bits.
底腳封裝設計不是依賴於導體“引腳”從半導體功率封裝的中心延伸並機械彎折成一個不精確位置,本發明所揭露的包括一個具有短導體的“長腳” 封裝,或精確的是“底腳”與散熱片和晶片墊的底部共平面,在封裝的底部橫向延伸以方便焊接。圖7A示出本文所揭露的底腳功率封裝70的一個實施例。 The foot package design does not rely on the conductor "pin" extending from the center of the semiconductor power package and mechanically bending into an inaccurate position. The present invention includes a "long leg" having a short conductor. The package, or precisely the "foot", is coplanar with the bottom of the heat sink and wafer pad and extends laterally at the bottom of the package to facilitate soldering. FIG. 7A illustrates one embodiment of a foot power package 70 disclosed herein.
該底腳功率封裝70包括一個銅晶片墊73A連接到延伸至模壓塑料72之外的導體引腳73B作為底腳79B。封裝70內部的兩個獨立的導體引腳73C和73D也延伸至模壓塑料72之外擁有相應的底腳79C和79D。同樣地,但在該封裝的相對邊緣,一個散熱片86延伸至模壓塑料72之外,主要是為了藉由一個大面積將從功率封裝的熱擴散至PCB導體。不同於傳統的彎折引腳功率封裝,在底腳功率封裝中底腳79C,79B和79D的底部與晶片墊73A和散熱片86的底部沿著表面78是精確的共平面,因為它們是從一個單一的銅片所製造出的,而無經任何彎折或機械成型的步驟。 The foot power package 70 includes a copper wafer pad 73A coupled to a conductor pin 73B extending beyond the molded plastic 72 as a foot 79B. The two separate conductor pins 73C and 73D inside the package 70 also extend beyond the molded plastic 72 with corresponding feet 79C and 79D. Similarly, but at the opposite edge of the package, a heat sink 86 extends beyond the molded plastic 72 primarily to diffuse heat from the power package to the PCB conductor over a large area. Unlike conventional bent pin power packages, the bottoms of the legs 79C, 79B and 79D and the bottom of the wafer pad 73A and the heat sink 86 along the surface 78 are precisely coplanar in the foot power package because they are A single piece of copper that is manufactured without any bending or mechanical forming steps.
如圖7B的側視圖所示,藉由沿著且通過導電引腳73D的切割線,內部導電引腳73D的頂部與表面88平面一致,與晶片墊73A的頂部共平面。如圖所示,半導體晶片75,藉由焊料或導電環氧樹脂層135黏著於晶片墊73A,其表面金屬的一部分藉由接合銲線76D,其包括金,鋁,銅或其它導電金屬線連接到導電引腳73D。導電引腳73D略為凸出於模壓塑料72的外部具有垂直厚度大於底腳79D的突 出部87。突出部87的下方,導電引腳73D的側壁同樣的被暴露出來,即不被覆蓋或封閉於模壓塑料2之內。底腳79D的厚度低於晶片墊73A的目的是提高焊料潤濕,即表面張力將熔融焊料拉至銅底腳79D,並由此提高波峰焊接過程在PCB組裝中封裝70的可焊性。散熱片86的底腳79A相應的厚度同樣地提高了散熱片86的可焊性。同樣的,暴露突出部87於模壓塑料2之外的好處是,在垂直邊緣上被暴露的金屬,即導體73D的垂直側壁,增加了可用於焊接的表面積。然而,如果需要的話,在一個替代實施方案中突出部87沒有被暴露以及導體73D的垂直側壁可以維持封裝在模壓塑料2內並且只有底腳79D橫向突出於模壓塑料2之外。 As shown in the side view of FIG. 7B, the top of inner conductive pin 73D coincides with surface 88 plane by a dicing line along and through conductive pin 73D, coplanar with the top of wafer pad 73A. As shown, the semiconductor wafer 75 is adhered to the wafer pad 73A by a solder or conductive epoxy layer 135, a portion of which is joined by a bonding wire 76D comprising gold, aluminum, copper or other conductive metal wires. To the conductive pin 73D. The conductive pin 73D is slightly protruded from the outside of the molded plastic 72 and has a vertical thickness greater than that of the foot 79D. Out of 87. Below the projections 87, the side walls of the conductive pins 73D are likewise exposed, i.e., are not covered or enclosed within the molded plastic 2. The purpose of the lower leg 79D being lower than the wafer pad 73A is to increase solder wetting, i.e., surface tension pulls the molten solder to the copper foot 79D and thereby improves the solderability of the package 70 in the PCB assembly process. The corresponding thickness of the foot 79A of the heat sink 86 similarly improves the solderability of the heat sink 86. Similarly, the advantage of exposing the protrusions 87 to the molded plastic 2 is that the exposed metal on the vertical edges, i.e., the vertical sidewalls of the conductor 73D, increases the surface area available for soldering. However, if desired, the protrusion 87 is not exposed in an alternate embodiment and the vertical sidewalls of the conductor 73D can remain encapsulated within the molded plastic 2 and only the foot 79D protrudes laterally beyond the molded plastic 2.
此外,在示出的例子中,內部導電引腳73D的內端,朝向晶片墊73A,不是在沿著平坦表面78的封裝的底面暴露,但取而代之的是藉由間隙89由封裝的底面向上垂直地被隔開並以模壓塑料2相同的塑膠模壓混合物填充。以塑料嵌入導電引腳73D的內端而不是在表面78暴露的好處,是減少晶片墊73A與引腳73D之間電氣短路的風險。該金屬包括底腳79A的橫向長度81Y可以藉由化學蝕刻、沖壓、或切割於導線架製造時來被確定,或在切割成單時可選擇地藉由切割、沖壓、或雷射。該底腳79D的橫向長度80Y,即底腳79D的長度由切割、沖壓、或雷射於切割成單過程中 被確定。 Moreover, in the illustrated example, the inner end of the inner conductive pin 73D, toward the wafer pad 73A, is not exposed at the bottom surface of the package along the flat surface 78, but instead is vertically upward from the bottom surface of the package by the gap 89. The ground is separated and filled with the same plastic molded mixture of molded plastic 2. The benefit of embedding the plastic in the inner end of the conductive pin 73D instead of the surface 78 is to reduce the risk of electrical shorting between the wafer pad 73A and the pin 73D. The lateral length 81Y of the metal including the foot 79A can be determined by chemical etching, stamping, or cutting at the time of manufacture of the lead frame, or alternatively by cutting, stamping, or laser cutting when cut into a single sheet. The lateral length 80Y of the foot 79D, that is, the length of the foot 79D is cut, stamped, or lasered into a single process It is determined.
圖7C示出了底腳功率封裝70的另一個剖面圖,取由晶片墊73A延伸沿著並通過導電引腳73B切割線。如同在先前所示出的導電引腳線73D和導電引腳73C(未示出)的情況下,內部導電引腳73B的表面,與表面78是平面一致,與晶片墊73A為共平面且連接。導電引腳73B稍微突出模壓塑料72之外形成具有垂直厚度大於底腳79B的突出部87。底腳79B的厚度小於晶片墊73A的目的是為了提高焊料潤濕,即,表面張力牽拉熔融焊料上到銅底腳,並由此提高封裝70在波峰焊接過程PCB組裝中的可焊性。如在導電引腳73C和73D的情況下,突出部87於模壓塑料2外的好處是具暴露金屬在垂直邊緣,即導體73B的垂直側壁上的暴露金屬增加了可用於焊接的表面積。然而,如果需要的話,在一個替代實施方案中突出部87沒有被暴露以及導體73D的垂直側壁可以維持封裝在模壓塑料2內並且只有底腳79D橫向突出於模壓塑料2之外。如連接之圖7B所述,該金屬的橫向長度81Y包括底腳79A可以藉由化學蝕刻、沖壓、或導線架製造時的切割,或者可選擇性地藉由切割、沖壓、或雷射於切割成單時來確定。該底腳79B的橫向長度80Y,即底腳79B的長度由切割、沖壓、或雷射切割成單期間來被確定。 Figure 7C shows another cross-sectional view of the foot power package 70 taken along the wafer pad 73A and cut through the conductive pins 73B. As in the case of the conductive pin line 73D and the conductive pin 73C (not shown) previously shown, the surface of the inner conductive pin 73B is planar with the surface 78 and is coplanar and connected to the wafer pad 73A. . The conductive pin 73B slightly protrudes beyond the molded plastic 72 to form a projection 87 having a vertical thickness greater than the foot 79B. The purpose of the foot 79B being less than the wafer pad 73A is to increase solder wetting, i.e., surface tension pulls the molten solder onto the copper foot and thereby improves the solderability of the package 70 in the wave soldering process PCB assembly. As in the case of the conductive pins 73C and 73D, the advantage of the protrusions 87 over the molded plastic 2 is that the exposed metal with exposed metal at the vertical edges, i.e., the vertical sidewalls of the conductor 73B, increases the surface area available for soldering. However, if desired, the protrusion 87 is not exposed in an alternate embodiment and the vertical sidewalls of the conductor 73D can remain encapsulated within the molded plastic 2 and only the foot 79D protrudes laterally beyond the molded plastic 2. As described in connection with Figure 7B, the lateral length 81Y of the metal includes the cutting of the foot 79A by chemical etching, stamping, or lead frame fabrication, or alternatively by cutting, stamping, or laser cutting. Determine when you are in a single order. The lateral length 80Y of the foot 79B, i.e., the length of the foot 79B, is determined by cutting, stamping, or laser cutting into a single period.
此外,在示出的例子中,導電引腳73D的內部部分不是在沿著平坦表面78的封裝的底面暴露,但取而代之的是藉由間隙89垂直地由封裝的底面向上被隔開並以模壓塑料2相同的塑膠壓混合物填充。以塑料嵌入導電引腳並不將其暴露於PCB表面上的好處是減少PCB電氣短路的風險。 Moreover, in the illustrated example, the inner portion of the conductive pin 73D is not exposed at the bottom surface of the package along the flat surface 78, but instead is vertically separated from the bottom surface of the package by the gap 89 and molded. Plastic 2 is filled with the same plastic pressure mixture. The benefit of embedding a conductive pin in plastic without exposing it to the surface of the PCB is to reduce the risk of electrical shorting of the PCB.
具有一個空隙89在引腳73D和73B之間的好處分別是藉由揭露的底腳功率封裝晶片墊73A更清楚地被呈現,如圖7D背面俯視圖所示,其中導電引腳73D,73B,和73C出現在封裝底面的僅有部分是橫向突出於模壓塑料72之外相應的底腳79D,79B,和79C。同樣的,一個暴露於封裝背面的模壓塑料72寬度所定義的橫向空間與底腳79D和79C間提供一個緩衝距離99,分別的,用以避免底腳功率封裝70下暴露的晶片墊73A發生電氣短路,該緩衝器距離99理想上應與金屬底腳79C,79B和79D間的間隙一樣寬。也示於圖7D剖面圖中,示出了整個封裝的剖面圖,即在通過其封裝上沒有引腳的側面的切割線,該模壓塑料72將晶片墊73A完全的封裝,使得沒有金屬片或底腳伸出穿過封裝的側面。 The benefit of having a void 89 between pins 73D and 73B is more clearly presented by the disclosed foot power package wafer pad 73A, as shown in the back top view of Figure 7D, wherein the conductive pins 73D, 73B, and The only portion of the 73C that appears on the bottom surface of the package is the corresponding legs 79D, 79B, and 79C that protrude laterally beyond the molded plastic 72. Similarly, a lateral space defined by the width of the molded plastic 72 exposed to the back of the package provides a buffer distance 99 between the legs 79D and 79C, respectively, to avoid electrical exposure of the exposed wafer pad 73A under the foot power package 70. Short circuit, the buffer distance 99 should ideally be as wide as the gap between the metal legs 79C, 79B and 79D. Also shown in the cross-sectional view of Fig. 7D, a cross-sectional view of the entire package is shown, i.e., the dicing plastic 72 completely encapsulates the wafer pad 73A through a dicing line through the side of the package without pins, such that there is no metal sheet or The foot extends through the side of the package.
雖然先前的圖7B和圖7C示出的剖面圖分別表示切 割線通過晶片墊73A到獨立的導電引腳73D,或是到連接的導電引腳73B,可以理解是通過任何其他獨立的導電引腳或晶片連接導電引腳的剖面圖是相似的。例如,通過獨立的導電引腳73C的剖面圖將顯示類似於圖7B,除了具有導電引腳79D的底腳79D將重新標記為具有導電引腳79C的底腳79C,且相應的接合銲線76D將重新標記為接合銲線76C。 Although the cross-sectional views shown in the previous FIGS. 7B and 7C respectively show the cut The secant passes through wafer pad 73A to a separate conductive pin 73D, or to a connected conductive pin 73B, it being understood that the cross-sectional view of the conductive pin is similar through any other separate conductive pin or wafer. For example, a cross-sectional view through a separate conductive pin 73C will be similar to FIG. 7B except that foot 79D with conductive pin 79D will be relabeled as foot 79C with conductive pin 79C, and the corresponding bond wire 76D It will be relabeled as the bond wire 76C.
在另一個實施例中,獨立的導電引腳73C和73D的上表面不與晶片墊73A的上表面(平坦表面88)共平面,取而代之的是被定位在導線架73A上表面之上的高度。 In another embodiment, the upper surfaces of the individual conductive leads 73C and 73D are not coplanar with the upper surface (flat surface 88) of the wafer pad 73A, but instead are positioned at a height above the upper surface of the lead frame 73A.
再次參照圖7A,半導體晶片75包含兩個獨立的金屬區域藉由導電環氧樹脂或焊料層135被黏著到晶片墊73A。一個或多數個接合銲線76D連接半導體晶片75的大面積金屬區域到內部導體73D和底腳79D。在垂直功率元件的情況下,這種連接通常包括垂直功率MOSFET的源極,陽極的是IGBT、SCR、或閘流體,或是垂直功率雙極型電晶體的基極。半導體晶片75較小面積金屬區域藉由接合銲線76C連接到內部導體73C和底腳79C。在垂直功率元件的情況下,這種連接通常包括垂直功率MOSFET或IGBT的閘極,或垂直功率雙極型電晶體、SCR、或閘流體的基極。 Referring again to FIG. 7A, semiconductor wafer 75 includes two separate metal regions bonded to wafer pad 73A by a conductive epoxy or solder layer 135. One or more bond wires 76D connect the large area metal regions of the semiconductor wafer 75 to the inner conductor 73D and the foot 79D. In the case of vertical power components, such connections typically include the source of a vertical power MOSFET, the anode being an IGBT, SCR, or thyristor, or the base of a vertical power bipolar transistor. The smaller area metal region of the semiconductor wafer 75 is connected to the inner conductor 73C and the foot 79C by bond wires 76C. In the case of vertical power components, such connections typically include the gate of a vertical power MOSFET or IGBT, or the base of a vertical power bipolar transistor, SCR, or thyristor.
該晶片墊73A和其相關的內部導體73B和底腳79B提供電性連接至半導體晶片75的背面。類似於先前圖5B所示,一般的半導體晶片75需要背面金屬層以便確保良好的歐姆接通到具有低工作電阻的半導體基板。相比之下,背面金屬層在積體電路封裝中是不常見和不需要的,因為基板晶圓作為垂直功率元件時沒有乘載適當的電流。在功率應用中,晶片墊73A和其被暴露於平坦表面78的導體背面的目的不是只能簡單地傳導電流,並且也能導熱。 The wafer pad 73A and its associated inner conductor 73B and foot 79B are electrically connected to the back side of the semiconductor wafer 75. Similar to the previous Figure 5B, a typical semiconductor wafer 75 requires a back metal layer to ensure good ohmic turn-on to a semiconductor substrate with low operating resistance. In contrast, the back metal layer is uncommon and undesirable in integrated circuit packages because the substrate wafer does not carry the proper current when used as a vertical power component. In power applications, the wafer pad 73A and its back exposed to the back surface of the flat surface 78 are not intended to simply conduct current and are also thermally conductive.
為提高散熱能力及降低封裝的熱阻,散熱片86,包括底腳79A,被用來增加總表面積。在功率封裝70上最大的熱傳導由晶片墊73A和散熱片86到PCB上,其功率封裝70被黏著到PCB之前,被要求使用焊料以手動置放於PCB上。底腳功率封裝70的一個獨特的特徵,底腳79A在波峰焊接時可以很容易被焊接並且達到良好的電性接通不需要將晶片墊73A底面焊接到PCB來實現。結果,底腳功率封裝70可避免需要額外的焊接操作將焊料層135應用於封裝70和晶片墊73A(參見圖7B)間,藉著使用任何熱傳導化合物,包括導熱環氧樹脂或導熱膏取替焊料層135以達到低熱阻,即使該化合物的導電性不如焊料一樣。半導體晶片75和晶片墊73A之間的低電阻被實現是因為散墊片86的底腳 79A是可波峰焊接的。 To improve heat dissipation and reduce thermal resistance of the package, heat sink 86, including foot 79A, is used to increase the total surface area. The greatest thermal conduction on the power package 70 is from the wafer pad 73A and the heat sink 86 to the PCB, and before the power package 70 is adhered to the PCB, solder is required to be manually placed on the PCB. A unique feature of the foot power package 70, the foot 79A can be easily soldered during wave soldering and achieves a good electrical turn-on without the need to solder the bottom surface of the wafer pad 73A to the PCB. As a result, the foot power package 70 can avoid the need for additional soldering operations to apply the solder layer 135 between the package 70 and the wafer pad 73A (see Figure 7B), by using any thermally conductive compound, including a thermally conductive epoxy or thermal paste. Solder layer 135 to achieve low thermal resistance even though the conductivity of the compound is not as good as solder. The low resistance between the semiconductor wafer 75 and the wafer pad 73A is achieved because of the foot of the spacer 86 79A is wave solderable.
如圖所示,在圖7A中實施例中所示是被設計來與外部連接,即導電引腳,類似在DPAK和D2PAK的位置,代表一個可互換之引腳對引腳相容以替代現今共同表面黏著功率封裝,能夠輕鬆適應現有的PCB設計。雖然焊接墊的外部放置保持不變,所揭露的元件在相同的PCB面積上可容納一個更大的晶片。或者,藉由消除對連接銲線的需要來節省PCB面積,一個較小的封裝可被設計作為容納相同尺寸大小的半導體晶片。雖然提高了PCB面積效率,客制封裝的缺點是需要不同區域的PCB和焊接墊,這樣的設計並不與傳統的DPAK和D2PAK封裝所產生的現有PCB前後相容。 As shown, the embodiment shown in Figure 7A is designed to be externally connected, i.e., conductive pins, similar to the DPAK and D 2 PAK locations, representing an interchangeable pin-to-pin compatible It replaces today's common surface mount power packages and can easily accommodate existing PCB designs. Although the external placement of the solder pads remains the same, the disclosed components can accommodate a larger wafer over the same PCB area. Alternatively, by eliminating the need to bond wire bonds to save PCB area, a smaller package can be designed to accommodate semiconductor wafers of the same size. Despite the increased PCB area efficiency, the disadvantage of custom packaging is the need for different areas of PCB and solder pads, which are not compatible with the existing PCBs produced by conventional DPAK and D 2 PAK packages.
圖7E示出的是黏著底腳封裝在PCB上,其中PCB100包括底部的導電層103A和103B、表面的導電層101A和101B,和導通孔102。如圖所示,焊料層34D電性連接由底腳79D和導電引腳73D至PCB的導電層101A,而焊料層34A電性連接由底腳79A或散熱片86和晶片墊73A至PCB導電層101B。導熱層105包括一個熱傳導化合物或焊料,改善了從晶片墊73A和散熱片86至PCB表面導電層101B,導通孔102以及PCB底部導電層103B的熱傳導性。如果導熱層 105是不導電的,例如包括有機熱化合物,所有從晶片墊73A而來的電流都必須流經由焊料層34A和底腳79A所代表的導電路徑。如果導熱層105包括焊料,電性傳導也直接從晶片墊73A發生進入PCB導電層101B。 Figure 7E shows the adhesive foot packaged on a PCB, wherein the PCB 100 includes conductive layers 103A and 103B at the bottom, conductive layers 101A and 101B at the surface, and vias 102. As shown, the solder layer 34D is electrically connected to the conductive layer 101A of the PCB by the foot 79D and the conductive pin 73D, and the solder layer 34A is electrically connected to the conductive layer of the PCB by the foot 79A or the heat sink 86 and the wafer pad 73A. 101B. The thermally conductive layer 105 includes a thermally conductive compound or solder that improves the thermal conductivity from the wafer pad 73A and the heat sink 86 to the PCB surface conductive layer 101B, the via 102, and the PCB bottom conductive layer 103B. If the thermal layer 105 is non-conductive, including, for example, an organic thermal compound, and all current from wafer pad 73A must flow through the conductive path represented by solder layer 34A and foot 79A. If the thermally conductive layer 105 includes solder, electrical conduction also occurs directly from the wafer pad 73A into the PCB conductive layer 101B.
如圖所示,因為表面張力,焊料層34A被拉到底腳79A上以完成底腳功率封裝與PCB100間的電性連接,同樣地,焊料層34D被拉到底腳79D上,甚至接到導電引腳73D被暴露的垂直側壁。在這種方式中,底腳功率封裝與傳統的底腳封裝所使用的波峰焊接方法是皆可行的。 As shown, the solder layer 34A is pulled onto the bottom leg 79A to complete the electrical connection between the foot power package and the PCB 100 because of the surface tension. Similarly, the solder layer 34D is pulled onto the bottom leg 79D, even to the conductive lead. The foot 73D is exposed to the vertical side walls. In this way, the wave soldering method used in the foot power package and the conventional foot package is feasible.
DPAK和D2PAK相容的底腳功率封裝立體圖在圖7F中示出。展示了從散熱片86所延伸出之底腳79A的獨特功能,該封裝底部包括模壓塑料72,晶片墊73A(不可見),散熱片86,底腳79A和79C以及其它底腳(未示出)所有都和平坦表面78共平面,且不依賴任何的金屬彎折和機械成型。一個替代的立體圖如圖7G所示,說明底腳79C、79B和79D共平面以及在突出部87之下相對應暴露的引腳73C、73B和73D的垂直側壁。所有底腳都是精確的共平面,因為所有的底腳79A、79C、79B和79D和晶片墊73以及散墊片86皆從相同之銅片所製造出的,沒有任何的金屬彎折或機械成型。 A perspective view of the DPAK and D 2 PAK compatible foot power package is shown in Figure 7F. The unique function of the foot 79A extending from the heat sink 86 is shown, the bottom of the package including molded plastic 72, wafer pad 73A (not visible), heat sink 86, feet 79A and 79C, and other feet (not shown) All are coplanar with the flat surface 78 and do not rely on any metal bending and mechanical forming. An alternative perspective view, as shown in Figure 7G, illustrates the vertical planes of the feet 79C, 79B, and 79D coplanar and the corresponding exposed pins 73C, 73B, and 73D below the protrusions 87. All feet are precisely coplanar because all of the feet 79A, 79C, 79B and 79D and the wafer pad 73 and the spacers 86 are made from the same copper sheet without any metal bending or mechanical forming.
圖8A示出一種替代的散熱片設計包括散熱片86及圍繞散熱片86的三邊底腳79A以取代僅一邊。圖8B所示為消除所有斜角的散熱片另一個版本。這個簡單的直線設計在導線架製造中使用沖壓工具更容易製造,在導線架製造中較精細的幾何形狀更適用於化學或雷射基礎來製造。 FIG. 8A shows an alternative heat sink design including a heat sink 86 and a three-sided foot 79A surrounding the heat sink 86 in place of only one side. Figure 8B shows another version of the heat sink that eliminates all bevels. This simple linear design is easier to manufacture in the manufacture of leadframes using stamping tools, and the finer geometry in leadframe fabrication is more suitable for chemical or laser based fabrication.
底腳封裝製造在本揭露的底腳封裝70的製造從實體銅片110開始,通常是400微米厚。該厚度可依據封裝的目的和用途被調整為更厚或更薄。如圖9A所示,透過化學蝕刻,沖壓,切割,或雷射切割工序的結合,一開始的銅片以虛線按圖式的定義將被加工成各種部分以便製造特徵獨特的底腳功率封裝。由垂直線80Y和81Y所限定的標記說明製造和去框後封裝的橫向延伸,即,蝕刻後的分別獨立封裝從同一導線架的相鄰中被分開。所有後續的剖面圖將以相對於該起始圖示來說明。作為參考,銅片的底部形成該封裝背面和銅導線架的背面與平坦表面78共平面。 Foot Package Fabrication The fabrication of the foot package 70 of the present disclosure begins with a solid copper sheet 110, typically 400 microns thick. This thickness can be adjusted to be thicker or thinner depending on the purpose and use of the package. As shown in Figure 9A, through a combination of chemical etching, stamping, cutting, or laser cutting processes, the initial copper sheet will be machined into various portions in a dashed line definition to create a unique foot power package. The indicia defined by the vertical lines 80Y and 81Y illustrate the lateral extension of the fabricated and de-framed packages, i.e., the separately etched individual packages are separated from the adjacent sides of the same lead frame. All subsequent cross-sectional views will be described with respect to the starting diagram. For reference, the bottom of the copper sheet forms the back side of the package and the back side of the copper lead frame is coplanar with the flat surface 78.
在圖9B中,在銅片110的背面以圖案化保護塗層,即光罩101,具有選擇性的開口102A和102B來定義銅片110被蝕刻的地方。而該圖是二維的,可以理解的是在光罩上的開口102延伸到在該二維圖中未示出的第三維。光罩101可 以包括任何材料,包括有機化合物或光阻劑,不會被攻擊或經由濕化學金屬蝕刻如硫酸、硝酸、氫氟酸(HF)、氨及其它腐蝕性化學品。光罩101可以被均勻地敷塗並隨後圖案化,或從一開始就以圖案形式被敷塗。例如,光罩101有機塗層的敷塗可藉由一個網板光罩或印刷來定義它的圖案。替代地,光罩101可以包括有機光阻劑,均勻地塗佈,輕輕的烘烤以防止其移動,然後藉由光罩暴露於光中用光學傳輸圖案到光罩上。曝光後,用有機顯影液將開口102A和102B位置的光阻劑去除,僅留下光罩101以保護其餘區域。區域89示意性地表示透過隨後蝕刻除去的銅面積。 In FIG. 9B, a protective coating, i.e., reticle 101, is patterned on the back side of copper sheet 110 with selective openings 102A and 102B to define where copper sheet 110 is etched. While the figure is two dimensional, it will be understood that the opening 102 in the reticle extends to a third dimension not shown in the two dimensional map. Photomask 101 can To include any material, including organic compounds or photoresists, will not be attacked or etched through wet chemical metals such as sulfuric acid, nitric acid, hydrofluoric acid (HF), ammonia, and other corrosive chemicals. The reticle 101 can be uniformly applied and subsequently patterned, or applied in a pattern from the beginning. For example, the application of the organic coating of the reticle 101 can be defined by a screen reticle or printing. Alternatively, the reticle 101 may comprise an organic photoresist, uniformly coated, lightly baked to prevent it from moving, and then optically transmitted to the reticle by exposure of the reticle to the light. After exposure, the photoresist at the locations of openings 102A and 102B is removed with an organic developer leaving only the mask 101 to protect the remaining areas. Region 89 schematically represents the area of copper removed by subsequent etching.
其敷塗和圖案化之後,圖案化光罩101然後被烘烤以硬化材料。該術語“硬烤”有時被用來定義烘烤溫度高到足以越過碳鍵鏈結成為一個如分子的強烈聚合物能夠經受持續延長時效的酸蝕刻。對比於軟烘烤,其中的有機光阻劑保留其感光性,硬烘烤之後,抗蝕劑的感光性不再。雖然烘烤溫度依光罩化學的選擇而不同,例如軟烘烤可發生在100℃為約1至4分鐘,而硬烘烤可以發生於一個較高的溫度,例如130℃至140℃。在該光罩層硬烘焙之後,然後該銅在一種酸液中被蝕刻,例如使用鹽酸包括HCL:FeCl3:H2O以使用4:1:5比例混合,硝酸包括HNO3:H2O2以比例1:20混合,或氨包括NH3:H2O2以比例4:1混合。 After application and patterning, the patterned mask 101 is then baked to harden the material. The term "hard roast" is sometimes used to define an acid etch that is sufficiently high in baking temperature to cross the carbon bond to become a strong polymer such as a molecule that can withstand extended aging. Compared to soft baking, the organic photoresist retains its photosensitivity, and after hard baking, the sensitivity of the resist is no longer. Although the baking temperature varies depending on the choice of mask chemistry, for example, soft baking can occur at 100 ° C for about 1 to 4 minutes, while hard baking can occur at a higher temperature, such as 130 ° C to 140 ° C. After the photomask layer is hard baked, the copper is then etched in an acid solution, for example using hydrochloric acid including HCL:FeCl 3 :H 2 O for mixing in a 4:1:5 ratio, and nitric acid including HNO 3 :H 2 O 2 is mixed in a ratio of 1:20, or ammonia including NH 3 :H 2 O 2 is mixed in a ratio of 4:1.
如果銅預鍍上一層薄的錫(Sn)用在PCB製造中改進可焊性,則錫必須首先使用蝕刻來除去,例如,氫氟酸包含HF:HLC以比例1:1混合,HF:HNO3以1:1的混合,或HF:H2O以1:1的混合。常見的濕製程化學金屬蝕刻可以更詳細的列表在半導體工藝教科書或在http://www.cleanroom.byu.edu/wet_etch.phtml網上被找到。錫和銅可以在一側或藉由浸漬在酸浴中進行蝕刻。在浸漬蝕刻的情況下,為了防止過度蝕刻以及導線架整個變薄,該金屬導線架的背面必須塗層另一個保護層。為了清楚起見,此背面保護層未在圖中所示,但也為半導體封裝領域的技術人員所公知的。 If copper is pre-plated with a thin layer of tin (Sn) for improved solderability in PCB fabrication, the tin must first be removed using etching. For example, hydrofluoric acid contains HF:HLC in a 1:1 ratio, HF:HNO 3 with 1:1 mixing, or HF:H 2 O with 1:1 mixing. A common wet process chemical metal etch can be found in a more detailed list in semiconductor technology textbooks or at http://www.cleanroom.byu.edu/wet_etch.phtml . Tin and copper can be etched on one side or by dipping in an acid bath. In the case of immersion etching, in order to prevent over-etching and the entire thinning of the lead frame, the back side of the metal lead frame must be coated with another protective layer. For the sake of clarity, this backside protective layer is not shown in the figures, but is also well known to those skilled in the art of semiconductor packaging.
在可替代的製造方法中,濕式化學蝕刻可以被電漿或反應離子蝕刻所取代,也被稱為“乾蝕刻”,使用非腐蝕性氣體如HBr或Cl2/Ar在射頻調變電場中分解成作用元素(reactive components)。在電漿中將射頻氣體離子化然後對金屬銅離子進行化學蝕刻,移除它們成為氣體。一旦電漿離子化被消除,氣體返回到一非腐蝕性的形式。在大多數情況下,乾蝕刻只發生在銅的一側面上,因此銅片的另一側不需要保護層覆蓋。 In an alternative manufacturing process, wet chemical etching can be replaced by plasma or reactive ion etching, also known as "dry etching", using a non-corrosive gas such as HBr or Cl 2 /Ar in an RF modulated electric field. Decomposed into reactive components. The radio frequency gas is ionized in the plasma and then the metal copper ions are chemically etched to remove them into a gas. Once the plasma ionization is eliminated, the gas returns to a non-corrosive form. In most cases, dry etching occurs only on one side of the copper, so the other side of the copper sheet does not need to be covered by a protective layer.
如圖所示,蝕刻銅片110的被設計用來生產一個蝕刻區域89,不完全穿透銅片110且保留銅片一些未腐蝕的部分,如銅片110剩下厚度的50%至90%。例如,一400微米厚的銅片110被蝕刻以除去300微米,留下局部的薄銅100微米厚。該的區域89不僅通過在導電引腳附近的開口102A且也在穿越垂直線81Y“切割道”通過的開口102B被蝕刻。蝕刻後,光罩101被化學移除或在特殊的蝕刻機中稱為“灰化”,等離子蝕刻機用於去除有機化合物。由此產生的圖案化銅片110在圖9C的剖面圖中被示出。在製造中的觀點中,背面蝕刻後,蝕刻後的銅片110現在可以在視覺上被識別為半導體封裝製造的導線架部分。(因此,銅片110此後有時將被稱為“導線架110”)。該導線架110通常包括由銅“框架”和“連接槓”暫時維持許多相同的單位在一起的,部分銅件將實際的導線架銅片固定住直到之後模壓塑料來黏結他們。 As shown, the etched copper sheet 110 is designed to produce an etched region 89 that does not completely penetrate the copper sheet 110 and retains some of the unetched portions of the copper sheet, such as 50% to 90% of the remaining thickness of the copper sheet 110. . For example, a 400 micron thick copper sheet 110 is etched to remove 300 microns, leaving a local thin copper 100 microns thick. This region 89 is etched not only through the opening 102A near the conductive pin but also through the opening 102B that passes through the vertical line 81Y "cutting lane". After etching, the mask 101 is chemically removed or referred to as "ashing" in a special etching machine used to remove organic compounds. The resulting patterned copper sheet 110 is shown in the cross-sectional view of Figure 9C. In the manufacturing view, after backside etching, the etched copper sheet 110 can now be visually identified as a leadframe portion of a semiconductor package fabrication. (Thus, the copper sheet 110 will sometimes be referred to as "lead frame 110"). The leadframe 110 typically includes a plurality of identical units temporarily held by a copper "frame" and a "connecting bar" that hold the actual leadframe copper sheets until the plastic is molded to bond them.
下一步是利用光罩103來遮蔽先前的操作被蝕刻銅導線架110背面,即在其正面。圖案化後,光罩103包括開口104A,104B和104C。如圖所示,開口104A,用於定義被蝕刻區域105A,坐落於蝕刻區域89的上方,由先前蝕刻工序使其變薄,同時開口104B用於在導線架110先前未刻蝕的部分產生蝕刻區域91A,其中導線架110的30%到80% 之間的銅被移除,保留一塊薄薄的銅包括蝕刻後底腳79D。在開口104A,坐落於蝕刻區域89的上方,該區域被蝕刻,即區域105與先前蝕刻區域89合併完全移除在導線架110上的所有銅。然後蝕刻用乾蝕刻或濕化學蝕刻來執行,一般方法類似於先前的蝕刻步驟。蝕刻後光罩103被移除。 The next step is to use a reticle 103 to mask the back of the previously etched copper leadframe 110, i.e., on the front side. After patterning, the reticle 103 includes openings 104A, 104B and 104C. As shown, the opening 104A defines an etched region 105A that sits above the etched region 89 and is thinned by a prior etch process while the opening 104B is used to etch portions of the leadframe 110 that have not previously been etched. Region 91A, wherein 30% to 80% of the lead frame 110 The copper between them is removed, leaving a thin piece of copper including the etched foot 79D. Above opening 104A, which sits above etched region 89, the region is etched, i.e., region 105 merges with previously etched region 89 to completely remove all of the copper on leadframe 110. The etching is then performed using dry etching or wet chemical etching, which is similar to the previous etching step. The reticle 103 is removed after etching.
因此,儘管對於背面蝕刻和正面蝕刻的特定蝕刻時間是靈活的,用來確保正確封裝製造的一個製程標準是導線架110的厚度藉由背面蝕刻和正面蝕刻的結合被除去可能超過銅片110整個起始的厚度。例如,如果背面蝕刻(圖9B)移除銅導線架110厚度的60%,正面蝕刻(圖9C)移除大於銅導線架110厚度的40%。如果背面蝕刻移除銅導線架架110厚度的50%,那麼正面蝕刻移除大於銅導線架110厚度的50%。由於封裝設計的一個目標是實現封裝底腳的易焊性,然後在較佳的實施例中的底腳不應該太厚,即它正面蝕刻的益處遠遠大於背面蝕刻。 Thus, while the specific etching time for backside etching and frontside etching is flexible, one process standard for ensuring proper package fabrication is that the thickness of leadframe 110 may be removed by a combination of backside etching and frontside etching that may exceed the entire copper wafer 110. The starting thickness. For example, if the backside etch (FIG. 9B) removes 60% of the thickness of the copper leadframe 110, the front side etch (FIG. 9C) removes more than 40% of the thickness of the copper leadframe 110. If the backside etch removes 50% of the thickness of the copper leadframe 110, the front side etch removes more than 50% of the thickness of the copper leadframe 110. Since one goal of the package design is to achieve solderability of the package foot, then in the preferred embodiment the foot should not be too thick, i.e., the benefit of front side etching is much greater than back side etching.
例如,如果一個100μm厚的底腳需要正面蝕刻一個400μm銅片110的75%,則背面蝕刻需要移除至少25%銅厚度。如果需要一個150μm厚的底腳,則銅片110厚度的71%應該由正面蝕刻來移除,且至少29%的銅應該由背面蝕刻來被移除。作為良好製造規範事項,至少10%的過度 蝕刻應被執行以確保該區域內銅金屬清楚的被完全移除,如在光阻劑開口104A之下。因此,一個100μm厚的底腳應該有著75%正面蝕刻和35%的背面蝕刻被執行,且同樣的一個150μm底腳應該有著71%正面蝕刻和39%背面蝕刻被執行。 For example, if a 100 [mu]m thick foot needs to be front etched by 75% of a 400 [mu]m copper sheet 110, backside etching requires removal of at least 25% copper thickness. If a 150 μm thick foot is required, 71% of the thickness of the copper sheet 110 should be removed by front side etching, and at least 29% of the copper should be removed by backside etching. At least 10% excess as a matter of good manufacturing practices Etching should be performed to ensure that the copper metal in this region is clearly removed completely, such as under the photoresist opening 104A. Therefore, a 100μm thick foot should have a 75% front etch and 35% back etch performed, and the same 150μm foot should have 71% front etch and 39% back etch performed.
開口104C包括兩個區域-垂直線81Y之內和封裝“切割道”81Y之外。在垂直線81Y內,導線架91B被移除保留底腳79A。垂直線81Y之外,被移除的銅部分105B與先前蝕刻部分89結合從封裝切割道垂直線81Y之外完全移除。以這種方式,被總結在下表中,使用這兩種蝕刻製程四個可能的區域依序可形成:
如上所述,背面蝕刻和正面蝕刻的各種組合產生底腳功率封裝製造所有必要的結構。任何未蝕刻區域產生導線架110的厚度形成晶片墊73A、散熱片86、突出部87和垂直導體連接到一個相應的底腳,例如導電引腳73D的垂直部分連接到底腳79D。這樣區域的底部電性接通到PCB。 As described above, various combinations of backside etching and frontside etching result in all necessary structures for the fabrication of the foot power package. Any unetched regions create a thickness of leadframe 110 that forms wafer pad 73A, heat sink 86, tabs 87, and vertical conductors that are connected to a corresponding foot, such as a vertical portion of conductive pin 73D that is coupled to foot 79D. The bottom of such a region is electrically connected to the PCB.
僅背面蝕刻的結果是帶有懸掛導電引腳的突出部,即高架樑,如73B是蝕刻區域89利用在模穴內進行塑膠壓模底部填充所形成的。此高架樑區域無底部暴露的導體。僅正前面蝕刻所產生是用於焊接的底腳並帶有一暴露接通到PCB的導電表面。背面和正面蝕刻兩者的組合蝕刻完全清除所有無底面暴露導體的銅。這種組合在封裝切割道和在導電引腳間的間隙以及獨立引腳和晶片墊73A的間隙是有用的,例如導電引腳73D和晶片墊73D的間隙或導電引腳73B和73D間的間隙。 The result of only backside etching is a projection with a suspended conductive pin, i.e., an elevated beam, such as 73B, which is formed by etching a plastic stamper under the cavity. This elevated beam area has no exposed conductors at the bottom. Only the front front etch produces a foot for soldering with a conductive surface that is exposed to the PCB. The combination of both the backside and frontside etches completely removes all copper without the exposed conductors on the underside. This combination is useful in packaging the scribe lines and the gaps between the conductive pins and the gap between the individual leads and the wafer pads 73A, such as the gap between the conductive leads 73D and the wafer pads 73D or the gap between the conductive leads 73B and 73D. .
正面蝕刻之後,所產生的導線架於圖9D中示出,其中導線架未蝕刻部分現在可以被標識為晶片墊73A和散墊片86,在圖中右手邊的邊緣蝕刻區域91B下方變薄的金屬可以被識別為底腳79A,在圖中左手邊的邊緣蝕刻區域91A下方變薄的金屬可以被識別為底腳79D,其與導電引腳73D合併以形成底腳封裝引腳的鏡像“Z形”特徵。如圖所示,正面蝕刻區域105A與背面蝕刻區89相結合,完全切斷了獨立導電引腳73D和晶片墊73A之間的任何連接。同樣地,在超出垂直線81Y封裝切割道,所有金屬是由一個正面蝕刻和一個背面蝕刻的組合所移除。在製造上這一個工序,獨立的導電引腳線73D是藉由其連接於超出垂直線80Y 的導線架框架所固定其位置(在此二維剖面圖中不可見)。 After front side etching, the resulting leadframe is shown in Figure 9D, wherein the leadframe unetched portions can now be identified as wafer pads 73A and spacers 86, which are thinned under the edge-etched regions 91B on the right hand side of the figure. The metal can be identified as the foot 79A, and the metal thinned under the edge etched region 91A on the left-hand side of the figure can be identified as the foot 79D, which is combined with the conductive pin 73D to form a mirror image of the foot package pin. Shape" feature. As shown, the front etched region 105A is combined with the back etched region 89 to completely sever any connections between the individual conductive leads 73D and the wafer pads 73A. Similarly, the package scribe line is beyond the vertical line 81Y and all metal is removed by a combination of a front side etch and a back side etch. In the manufacturing process, the independent conductive pin line 73D is connected to the vertical line 80Y by it. The position of the leadframe frame is fixed (not visible in this two-dimensional section).
在圖9C也應該被提及的是開口104A應從光罩103的特徵被排除,然後所得的底腳導電引腳將不會如圖9D所示的從晶片墊73A被切斷,但保持該形狀與先前藉由後續蝕刻步驟所繪製圖面不變,因此,所得到的引腳與晶片墊保持連接,具有一如圖7C所示的包括連接的導電引腳73B的結構。 It should also be mentioned in Figure 9C that the opening 104A should be excluded from the features of the reticle 103 and the resulting foot conductive pins will not be severed from the wafer pad 73A as shown in Figure 9D, but retain the shape The resulting surface is unchanged from the previous etch step, and thus the resulting pin remains connected to the wafer pad, having a structure including the connected conductive pins 73B as shown in FIG. 7C.
於圖9E中,半導體晶片75藉由導熱化合物或焊料135被黏著到晶片墊73A,並隨後銲線接合,接合銲線76D連接半導體晶片75的金屬表面的一部分到獨立導電引腳線73D和底腳79D。在另一剖面圖(未示出),接合銲線76C連接半導體晶片75的金屬表面的一部分到獨立的導電引腳73C和底腳79C。 In FIG. 9E, the semiconductor wafer 75 is adhered to the wafer pad 73A by a thermally conductive compound or solder 135, and then wire bonding, and the bonding wire 76D connects a portion of the metal surface of the semiconductor wafer 75 to the independent conductive pin line 73D and the bottom. Foot 79D. In another cross-sectional view (not shown), bond wire 76C connects a portion of the metal surface of semiconductor wafer 75 to separate conductive pins 73C and feet 79C.
最後,於圖9F中,進行塑料壓模成型,通常使用半導體封裝領域所熟知的轉注成型技術,形成模壓塑料72來封裝半導體晶片75、接合銲線76D和其他,並填充蝕刻區89和105A。一旦塑料固化,底腳79B,79C和79D使用沖壓,切割,或雷射沿著垂直線80Y從導線架框架(未示出)被裁切下,產生一從導線架分割成單的底腳功率封裝成品並 準備電性測試。 Finally, in FIG. 9F, plastic compression molding is performed, typically using a transfer molding technique well known in the art of semiconductor packaging, to form a molded plastic 72 to encapsulate the semiconductor wafer 75, bond wires 76D and others, and to fill the etch regions 89 and 105A. Once the plastic is cured, the feet 79B, 79C and 79D are stamped, cut, or lasered from the lead frame (not shown) along the vertical line 80Y to produce a foot power that is split from the lead frame into a single. Package the finished product Prepare for electrical testing.
一個替代實施例,如圖9G所示,底腳79A,如帶有導電引腳的底腳78C,79B,和79D,通過金屬115A也被連接於導線架框架,因為超出垂直線81Y沒有執行背面蝕刻。藉由留下底腳79A連接至導線架框架,實現了銲線接合過程中額外的穩定性。不然,在銲線接合操作過程中背面機械支撐是必須的,以防止“翹翹板”如振盪效應。 As an alternative embodiment, as shown in Fig. 9G, the foot 79A, such as the legs 78C, 79B, and 79D with conductive pins, is also connected to the lead frame by the metal 115A because the back is not performed beyond the vertical line 81Y. Etching. Additional stability during wire bonding is achieved by leaving the foot 79A attached to the leadframe frame. Otherwise, back mechanical support is necessary during wire bonding operations to prevent "warping" such as oscillating effects.
圖9H所示為用於底腳功率封裝製造順序開始於銅片的步驟130。該銅片可預鍍一可焊金屬如錫(Sn)或包括純銅。在步驟131該銅片的背面被遮蔽且部分被蝕刻至一最終厚度名義上小於50%,例如29%。在步驟132該銅片的正面被遮蔽且部分被蝕刻至最終厚度名義上大於50%,例如61%。其後,在步驟133完成了導線架被鍍上一可焊金屬如錫。如果該導線架已被預鍍,此步驟可以略過。在步驟134,使用環氧樹脂或焊料執行晶片黏著,接著在步驟135銲線接合,其包括閘極輸入的銲線接合以及銲線接合或銅銲夾兩者任一接合到晶片的高電流連接。接下來,在步驟中136使用轉注成型的塑料模壓被執行,隨後在可選的步驟137錫鍍。在步驟138中,該單獨封裝晶片被分割成單,也就是由導線架分離,使用切割,沖壓,或雷射技術,隨後在步 驟139做電性測試。 Figure 9H shows a step 130 for the foot power package fabrication sequence beginning with a copper sheet. The copper sheet may be pre-plated with a solderable metal such as tin (Sn) or include pure copper. At step 131 the back side of the copper sheet is masked and partially etched to a final thickness nominally less than 50%, such as 29%. At step 132 the front side of the copper sheet is masked and partially etched to a final thickness nominally greater than 50%, such as 61%. Thereafter, in step 133, the leadframe is finished plated with a solderable metal such as tin. This step can be skipped if the leadframe has been pre-plated. At step 134, wafer bonding is performed using epoxy or solder, followed by wire bonding at step 135, which includes wire bond bonding of the gate input and high current connection of either wire bond or braze bond to the wafer. . Next, in step 136, a plastic molding using a transfer molding is performed, followed by tin plating in an optional step 137. In step 138, the individual packaged wafers are divided into single, that is, separated by leadframes, using cutting, stamping, or laser techniques, followed by Step 139 to do electrical testing.
導線架設計該底腳功率封裝容納一靈活性陣列分佈的導線架設計。圖10A所示出的是導線架一部分的俯視圖,包括暴露晶片盤73A,散熱片86,和底腳79A,導電引腳73C,73B和73D作為高架樑於正面蝕刻區域89,垂直地連接突出部87下方至底腳79C、79B和79D由線91B定義為蝕刻區域開始並延伸到銅框架120B。連接槓115C,115B、和115D連接底腳79C,79B和79D至銅框架120B並且分割成單過程中沿切口線80Y被切斷。同樣,底腳79A由線91A定義為蝕刻區域開始並延伸到銅框架120A經由連接槓115A連接到銅框架120A並且分割成單過程中沿線81Y被切斷。該模壓塑料72可以建構成單一條,由切割刀沿著線80X切割或藉由模具穴位限制規定的區域。元件90在同一導線架重複多次。 Leadframe Design The foot power package accommodates a flexible array of leadframe designs. Figure 10A shows a top view of a portion of the leadframe, including exposed wafer tray 73A, heat sink 86, and foot 79A, conductive pins 73C, 73B and 73D as elevated beams in front etched region 89, vertically connecting the projections The lower 87 to the bottom legs 79C, 79B, and 79D are defined by the line 91B as an etched region and extend to the copper frame 120B. The connecting bars 115C, 115B, and 115D connect the legs 79C, 79B, and 79D to the copper frame 120B and are cut into a single process to be cut along the slit line 80Y. Similarly, the foot 79A is defined by the line 91A as an etched area and extends until the copper frame 120A is connected to the copper frame 120A via the connecting bar 115A and is cut along the line 81Y during the division into a single process. The molded plastic 72 can be constructed as a single strip that is cut by the cutting knife along line 80X or by a mold acupoint to define a defined area. Element 90 is repeated multiple times on the same lead frame.
圖10B示出一導線架顯示兩個晶片墊73A藉由底腳79A和連接槓115A連接到框架120A和藉由導電引腳73C,73B,73D連接到框架120B。藉由兩個相對的框架之間支撐晶片墊,晶片墊73A被安全地固定,以消除銲線接合時像跳水板一樣振動。增加交叉框架120C和120D以提供額外的機械支撐。 Fig. 10B shows a lead frame showing that two wafer pads 73A are connected to the frame 120A by the foot 79A and the connecting bar 115A and to the frame 120B by the conductive pins 73C, 73B, 73D. The wafer pad 73A is securely held by supporting the wafer pads between the two opposing frames to eliminate vibration like a diving plate when the wire bonds. Cross frames 120C and 120D are added to provide additional mechanical support.
為了改善分割成單並減少切割磨損,切割線81Y經由減薄銅厚來切割,即,底腳79A的相同厚度是藉由光罩特徵91A和91Z所限定。同樣地切割線80Y經由藉由光罩邊緣91B和91Y所定義減薄銅厚來切割。如圖10A所示該垂直切割線80X同樣適用於其它導線架的設計以及為了說明清楚起見被排除於繪圖之外。 In order to improve the division into a single shape and reduce the cutting wear, the cutting line 81Y is cut by thinning the copper thickness, that is, the same thickness of the foot 79A is defined by the reticle features 91A and 91Z. Similarly, the cutting line 80Y is cut by thinning the copper thickness as defined by the mask edges 91B and 91Y. The vertical cut line 80X, as shown in Fig. 10A, is equally applicable to the design of other lead frames and is excluded from the drawing for clarity of illustration.
導線架設計如圖10C所示,晶片墊73A沿著線80Y橫向延伸是藉由導線架蝕刻程中的蝕刻來決定而不是分割成單過程。但是在該晶片墊的兩個邊緣缺乏支撐,線接合過程中需要背側支持。在另一個實施例,如圖10D所示,晶片墊73A包括在三側的散熱片,其中該側散熱片73A延伸到連接槓116A和116B連接到框架120A和120B。圖10E所示為另一導線架設計,該晶片墊互相提供機械支撐,於分割成單過程中沿鋸線82Y被分離出來。 The leadframe design is shown in Figure 10C. The lateral extension of wafer pad 73A along line 80Y is determined by etching in the leadframe etch process rather than being split into a single process. However, there is a lack of support at both edges of the wafer pad, and backside support is required during wire bonding. In another embodiment, as shown in FIG. 10D, wafer pad 73A includes heat sinks on three sides, wherein the side heat sinks 73A extend to connecting bars 116A and 116B to frames 120A and 120B. Figure 10E shows another leadframe design that provides mechanical support to each other and is separated along the saw wire 82Y during the split into a single process.
導線架設計如圖10F所示,晶片墊73A由框架120A所支撐而導電引腳73C,73B和73D由框架軌120B所支撐。不像先前所示的實施例,然而,在此實施例中中心引腳73B沒有電連接到晶片墊73A,從而使能夠在一個三底腳封裝有四種不同的電性連接,分別的,經由各導電引腳73C, 73B和73D三個單獨的連接,以及經由晶片墊73A的一個連接。增加交叉框架120C和120D以提供額外的機械支撐。 The lead frame design is shown in Fig. 10F, the wafer pad 73A is supported by the frame 120A and the conductive pins 73C, 73B and 73D are supported by the frame rail 120B. Unlike the previously shown embodiment, however, in this embodiment the center pin 73B is not electrically connected to the wafer pad 73A, thereby enabling four different electrical connections in a three-foot package, respectively, via Each conductive pin 73C, Three separate connections, 73B and 73D, and one connection via wafer pad 73A. Cross frames 120C and 120D are added to provide additional mechanical support.
圖11所示為一簡化的俯視圖和剖面圖代表一用於底腳功率封裝的導線架設計在正視圖和側視圖之兩者中,藉由消除導線架框架和模壓塑料72所表現的是藉由製造的模具穴位而不是切割所定義的。如圖所示,由晶片墊73A所限定的金屬,散熱片86,底腳79A和導電引腳73C,73B和73D的部分被暴露於封裝的底面除了斜線部分是表示該導體坐落於蝕刻區域89上的塑料填充。如所示導電引腳73D的一部分比其底腳79D較寬。此較寬的T形部分包括用以作為額外的接合銲線針對更高的電流連接至該功率元件。 Figure 11 shows a simplified top view and cross-sectional view representing a leadframe design for a foot power package in both front and side views, which is illustrated by the elimination of the leadframe frame and molded plastic 72. Defined by the manufactured mold points rather than the cut. As shown, the metal defined by wafer pad 73A, heat sink 86, foot 79A and portions of conductive pins 73C, 73B and 73D are exposed to the bottom surface of the package except that the diagonal portion indicates that the conductor is located in etched region 89. Filled with plastic. A portion of the conductive pin 73D is wider than the foot 79D as shown. This wider T-shaped portion includes connections to the power component for higher currents as an additional bond wire.
圖12A代表散熱片86的三邊底腳79A包圍並包括螺栓安裝孔的變型封裝。圖12B示出了另一種散熱片86的設計,其中該週圍邊緣藉由將散熱片86形成如同一系列平行手指而增加散熱片相對於所散熱的面積,一個較長邊有助於底腳79A改善波峰焊接的熱阻。 Figure 12A represents a variant package surrounded by three-sided feet 79A of the heat sink 86 and including bolt mounting holes. Figure 12B shows a design of another heat sink 86 in which the peripheral edge increases the area of the heat sink relative to the heat dissipated by forming the heat sink 86 as a series of parallel fingers, one longer side contributing to the foot 79A Improve the thermal resistance of wave soldering.
圖13A示出一種具散熱片86和該封裝的三側被底腳79所包圍的底腳功率封裝的變型。圖13B示出了另一種底腳封裝變型,其中散熱片86和底腳79A僅存在於封裝的一 側。 Figure 13A shows a variation of the foot power package with the heat sink 86 and the three sides of the package surrounded by the foot 79. Figure 13B shows another foot package variant in which the heat sink 86 and foot 79A are only present in the package. side.
圖14A示出了該底腳封裝的設計和技術還可以容納一封裝包括一單一的晶片墊73A與其散熱片86,並底腳79A在其相對的兩側,而底腳79B至79G在其另外的兩側邊,從而產生一個六底腳封裝帶有5種電性連接。在此版本中導電引腳73B和73E都緊連於晶片墊73A,在封裝時提供額外的剛性和機械支撐。在此封裝的一個變型,如圖14B所示,導電引腳線73E由晶片墊73A被斷開,使得功率封裝成為一個六底腳封裝具有六種不同的電性連接。圖14C表示該相同的封裝除了晶片墊73A暴露的背側被去除並晶片被替代黏著在修改之絕緣導電晶片墊73A的未暴露部分,用塑料填充位於該晶片墊下方的蝕刻區域86。然而,兩側確實包括散熱片86和底腳79A以達到合理的功率耗散能力。圖14D所示為另一個變型,獨立的導電引腳線73C和73D被短路連接在一起增加銲線接合的可用空間,且以類似的方式獨立的導電引腳73F和73G也被短路連接在一起。 Figure 14A shows that the design and technique of the foot package can also accommodate a package comprising a single wafer pad 73A and its heat sink 86, with feet 79A on opposite sides thereof, and feet 79B to 79G in their other The two sides of the side create a six-foot package with five electrical connections. In this version, conductive pins 73B and 73E are all in close contact with wafer pad 73A, providing additional rigidity and mechanical support during packaging. In one variation of this package, as shown in Figure 14B, the conductive pin line 73E is broken by the wafer pad 73A such that the power package becomes a six-foot package with six different electrical connections. Figure 14C shows the same package except that the exposed back side of the wafer pad 73A is removed and the wafer is instead bonded to the unexposed portion of the modified insulated conductive wafer pad 73A, and the etched region 86 under the wafer pad is filled with plastic. However, the sides do include the heat sink 86 and the foot 79A to achieve reasonable power dissipation. Another variation is shown in Figure 14D. The individual conductive pin lines 73C and 73D are shorted together to increase the available space for wire bond bonding, and in a similar manner the individual conductive pins 73F and 73G are also shorted together. .
圖15A示出多引腳底腳功率封裝如何用於支撐兩個分離的晶片墊73A和73H。獨立導電引腳73C和73D提供一個用於接合一個三極元件黏著於晶片墊73A的方法而晶片墊連接導電引腳73B在封裝過程中對晶片墊73A提供了額 外的機械支撐。類似地,第二晶片墊73H對於獨立的導電引腳73G和73F提供了一個用於接合一個三極元件黏著於晶片墊73H的法方而晶片墊連接導電引腳73E在封裝過程中對晶片墊73H提供了額外的機械支撐。然而,由於晶片墊73A和晶片墊73H兩者皆暴露於封裝的底部,存在一些從一個晶片墊到另一個的間隔可能過小而導致於PCB上短路的風險。 Figure 15A illustrates how a multi-pin foot power package can be used to support two separate wafer pads 73A and 73H. The individual conductive leads 73C and 73D provide a method for bonding a three-pole element to the wafer pad 73A while the wafer pad connection conductive pin 73B provides a wafer pad 73A during the package process. External mechanical support. Similarly, the second wafer pad 73H provides a separate bond for the individual conductive pins 73G and 73F for bonding a three-pole device to the wafer pad 73H while the wafer pad is connected to the conductive pin 73E during the package process. The 73H provides additional mechanical support. However, since both wafer pad 73A and wafer pad 73H are exposed to the bottom of the package, there is a risk that some of the spacing from one wafer pad to another may be too small resulting in a short on the PCB.
一個用來增加暴露的晶片墊到另一個的空間,而不減少晶片最大尺寸的方法,在晶片墊上可以使用圖15B所示的設計來實現。其中晶片墊73A的一部分形成台階狀到墊延伸處111A和111H。以這種方式在先前示出的雙晶片墊底腳封裝中相同的晶片尺寸可被達成,但暴露的晶片間隔可根據需要而增加以支撐任何PCB設計規則。在所有所描述的封裝中,任何未使用的封裝的側面可以被修改為包括一個散熱片和用於提高熱傳導到PCB的一對應的底腳。 A method for increasing the area of the exposed wafer pad to another without reducing the maximum size of the wafer can be achieved on the wafer pad using the design shown in Figure 15B. A portion of the wafer pad 73A is formed in a stepped shape to the pad extensions 111A and 111H. In this manner the same wafer size can be achieved in the previously shown dual wafer pad foot package, but the exposed wafer spacing can be increased as needed to support any PCB design rule. In all of the described packages, the sides of any unused package can be modified to include a heat sink and a corresponding foot for improved heat transfer to the PCB.
圖16A示出該底腳功率封裝可被擴展到用以支撐在該封裝的一邊的5個電性連接,如果需要的話可被製成引腳對引腳佈局與5個引腳之DPAK相容。類似地,圖16B示出了底腳功率封裝可被擴展到用以支撐在該封裝的一邊的7個電性連接,且如果需要可以被製成引腳對引腳佈局與7 個引腳之DPAK相容。 Figure 16A shows that the foot power package can be extended to support five electrical connections on one side of the package, and can be made into a pin-to-pin layout and a 5-pin DPAK if required. . Similarly, Figure 16B shows that the foot power package can be extended to support seven electrical connections on one side of the package, and can be made into a pin-to-pin layout and if desired. The pins are DPAK compatible.
圖17所示為底腳功率封裝可適合於功率積體電路或具有散熱片86和底腳79A的單一晶片墊73A可以支撐多引腳功率積體電路的功率系統。在所示的設計,一個十五引腳功率封裝被演示包括獨立的導電引腳73C到73P與相應的底腳79C到79P且晶片墊連接導電引腳73B和相關聯的底腳79B。 Figure 17 shows a power system in which the foot power package can be adapted to a power integrated circuit or a single wafer pad 73A having heat sink 86 and foot 79A can support a multi-pin power integrated circuit. In the illustrated design, a fifteen-pin power package is shown to include separate conductive pins 73C through 73P and corresponding legs 79C through 79P and the wafer pads are coupled to conductive pins 73B and associated legs 79B.
圖18示出在底腳功率封裝中使用一焊夾的俯視圖和側視圖兩者。如圖所示,使用導電環氧樹脂或焊料層135,半導體晶片75被黏著於暴露的晶片墊73A。然後使用焊料或導電環氧樹脂層91B將銅焊夾90黏著於半導體晶片75的表面,並且使用焊料或導電環氧樹脂層91A黏著銅焊夾90到導電引腳73D。對於具有三個或更多個電性連接的功率元件,銅焊夾90不覆蓋整個半導體晶片75以容許接合銲線與低電流閘極驅動和信號連接。例如,如圖所示,銅焊夾90不覆蓋半導體晶片75的閘極連接墊,以允許接合銲線76C連接閘極墊至導電引腳73C。所示的側示圖沒有示出接合線76C的存在是因為它採取沿著封裝長度的剖面切割線通過底腳79D且通過導電引腳73D。 Figure 18 shows both a top view and a side view of a solder clip used in a foot power package. As shown, a semiconductor wafer 75 is adhered to the exposed wafer pad 73A using a conductive epoxy or solder layer 135. The brazing clip 90 is then adhered to the surface of the semiconductor wafer 75 using a solder or conductive epoxy layer 91B, and the brazing clip 90 is adhered to the conductive pins 73D using a solder or conductive epoxy layer 91A. For power components having three or more electrical connections, the braze clip 90 does not cover the entire semiconductor wafer 75 to allow the bond wires to be driven and signaled with low current gates. For example, as shown, the braze clip 90 does not cover the gate connection pads of the semiconductor wafer 75 to allow the bond wires 76C to connect the gate pads to the conductive pins 73C. The side view shown does not show the presence of bond wire 76C because it takes a cross-sectional cut line along the length of the package through foot 79D and through conductive pin 73D.
傳統封裝的比較:本發明的底腳封裝與傳統的表面黏著功率封裝,如DPAK的底腳功率封裝的比較示於圖19,對兩個封裝其中橫向距離y1到y0被認為是相同。如圖所示,在傳統封裝上橫向尺寸y1到y5是相當大,因為先天不良的製造公差,其必需於彎折時藉由引腳延伸17夾鉗引腳,沿續的引腳彎曲4D是被浪費的空間。結果是本發明在面積效率有顯著的改進,特別是於更小的封裝下,其中額外固定用的高架空間是更加明顯。 Comparison of conventional packages: A comparison of the foot package of the present invention with a conventional surface mount power package, such as the DPAK foot power package, is shown in Figure 19, where the lateral distances y1 through y0 are considered identical for the two packages. As shown in the figure, the lateral dimensions y1 to y5 on the conventional package are quite large, because of the inherently poor manufacturing tolerances, it must be bent by the pin extension 17 clamp pin, the continuous pin bend 4D is The wasted space. The result is a significant improvement in area efficiency of the present invention, particularly in smaller packages where the extra space for additional fixation is more pronounced.
相對於傳統的功率封裝的類似改進在底腳封裝的垂直高度(X'2-X'O)是明顯的。因不涉及引腳彎折,該底腳封裝的封裝高度是由所期望的導線架厚度和封裝接合銲線所需之模壓塑料2的高度所限制。一種解決這個問題的方法,在接合銲線必須乘載高電流時,採用銅焊夾90來代替銲線是特別有用。銅焊夾90黏著於半導體晶片75的金屬表面並且連接至導電引腳73D使用如所示焊料或導電環氧樹脂91B和91A。因為沒有必要以一個大的銲線弧高來適應大直徑的銲線,模壓塑料72的厚度可大大減薄。像閘極偏壓的輸入信號可以用一個小直徑的接合銲線76C來連接並不影響薄型封裝的高度。 A similar improvement over conventional power packages is evident in the vertical height (X' 2 -X' O ) of the foot package. Since the pin bending is not involved, the package height of the foot package is limited by the desired leadframe thickness and the height of the molded plastic 2 required to package the bond wires. One way to solve this problem is to use a brazing clip 90 instead of a wire when the bond wire must be loaded with a high current. Brazing clips 90 are adhered to the metal surface of semiconductor wafer 75 and to conductive pins 73D using solder or conductive epoxy 91B and 91A as shown. Since it is not necessary to accommodate a large diameter wire with a large wire arc height, the thickness of the molded plastic 72 can be greatly reduced. Input signals like gate bias can be connected with a small diameter bond wire 76C without affecting the height of the thin package.
此外,由於底腳的厚度藉由蝕刻來決定且該底腳和 該封裝的底部是精確的共平面,沒有必要以不精確之機械製程來補償增加封裝高度,如引腳彎折。結果是,底腳功率封裝可以製造在封裝高度比QFN且薄型鷗翼IC封裝更有競爭力。 In addition, since the thickness of the foot is determined by etching and the foot and The bottom of the package is precisely coplanar, and there is no need to compensate for increased package height, such as pin bending, with inaccurate mechanical processes. As a result, the foot power package can be manufactured at a package height that is more competitive than the QFN and thin gull-wing IC package.
總結,如本文所揭露的底腳功率封裝保證引腳的底部和暴露的晶片墊背部將是共平面的,因為它們是由一銅片所形成,沒有彎折或機械成型。該薄型底腳同時支援PCB組裝使用波峰焊接和回焊技術。因為底腳與其散熱片合併提供一個大範圍焊接該封裝甚至在沒有焊料被預置於散熱片下的情況下提供低熱阻。沒有長的接合銲線和長引腳的彎折需要,底腳封裝展現出降低電感和提高PCB面積效率,對於給定的PCB面積提供一個比傳統的功率封裝較大的晶片面積。另外,底腳功率封裝能夠提供任何數量的引腳或引腳間距並且分佈於封裝的一、二或三邊上無需連結引腳到晶片墊。藉由完全去除彎折引腳的需要,引腳彎折機械成本和隨後的良率損失可以完全消除。最後,精心的設計,底腳封裝的靈活性可支援於有限數量模具和客制化模具相關成本的大範圍封裝選擇。 In summary, the foot power package as disclosed herein ensures that the bottom of the lead and the exposed back of the wafer pad will be coplanar because they are formed from a piece of copper without bending or mechanical forming. The thin foot supports both wave soldering and reflow soldering techniques for PCB assembly. Because the foot is combined with its heat sink to provide a wide range of soldering the package provides low thermal resistance even without solder being placed under the heat sink. Without the need for long bond wires and long lead bends, the foot package exhibits reduced inductance and increased PCB area efficiency, providing a larger die area for a given PCB area than conventional power packages. In addition, the foot power package can provide any number of pin or pin pitches and is distributed over one, two or three sides of the package without the need to bond pins to the wafer pads. By completely removing the need for bent pins, the mechanical cost of the bend bend and subsequent yield loss can be completely eliminated. Finally, with careful design, the flexibility of the foot package supports a wide range of package options for a limited number of molds and custom mold related costs.
根據本發明之一實施例,本發明提供一種底腳功率封裝,包括:一塑封膠體;該第一引腳部分包在塑 封膠體內,該第一引腳包括底腳,該底腳在塑封膠體的底部第一侧向外突出;該一晶片銲墊至少部分包在塑封膠體內;以及一第一散熱片從該晶片銲墊延伸至該塑封膠體以外的位置。 According to an embodiment of the present invention, the present invention provides a foot power package comprising: a plastic encapsulant; the first pin portion is wrapped in a plastic In the encapsulant, the first pin includes a foot protruding outwardly from a first side of the bottom of the molding compound; the wafer pad is at least partially wrapped in the molding compound; and a first heat sink is from the wafer The pad extends to a location other than the molding compound.
根據本發明之一實施例,本發明提供一種從一金屬片製造一底腳功率封裝之方法,包括:放置一第一光罩層於該金屬片的第一表面上,該第一光罩層覆蓋的面積是晶片銲墊和散熱片被形成的區域以及引腳的底腳被形成的區域,該第一光罩層有一第一開口的面積是該引腳一懸臂段形成的區域;以及蝕刻通過該金屬片在該第一光罩層的該第一開口。 According to an embodiment of the present invention, there is provided a method of fabricating a foot power package from a metal sheet, comprising: placing a first mask layer on a first surface of the metal sheet, the first mask layer The area covered is the area where the wafer pad and the heat sink are formed, and the area where the foot of the pin is formed. The area of the first mask layer having a first opening is the area formed by the cantilever section of the pin; and etching Passing the metal sheet to the first opening of the first mask layer.
以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。 The above description is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention; all other equivalent changes or modifications which are not departing from the spirit of the invention should be included in the following Within the scope of the patent application.
70‧‧‧底腳功率封裝 70‧‧‧foot power package
72‧‧‧模壓塑料 72‧‧‧Molded plastic
73A‧‧‧晶片墊 73A‧‧‧ wafer pad
73B、73C、73D‧‧‧引腳 73B, 73C, 73D‧‧‧ pins
75‧‧‧晶片 75‧‧‧ wafer
76C、76D‧‧‧接合銲線 76C, 76D‧‧‧ Bonding wire
78‧‧‧切割面 78‧‧‧cut face
79B、79C、79D‧‧‧底腳 79B, 79C, 79D‧‧‧ feet
86‧‧‧散熱片 86‧‧‧ Heat sink
87‧‧‧突出部 87‧‧‧Protruding
89‧‧‧蝕刻間隙 89‧‧‧etching gap
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US10121742B2 (en) * | 2017-03-15 | 2018-11-06 | Amkor Technology, Inc. | Method of forming a packaged semiconductor device using ganged conductive connective assembly and structure |
US10727151B2 (en) * | 2017-05-25 | 2020-07-28 | Infineon Technologies Ag | Semiconductor chip package having a cooling surface and method of manufacturing a semiconductor package |
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US6891256B2 (en) * | 2001-10-22 | 2005-05-10 | Fairchild Semiconductor Corporation | Thin, thermally enhanced flip chip in a leaded molded package |
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