TW201639186A - 輥道式太陽電池燒結和輻照退火一體連續爐 - Google Patents

輥道式太陽電池燒結和輻照退火一體連續爐 Download PDF

Info

Publication number
TW201639186A
TW201639186A TW105112859A TW105112859A TW201639186A TW 201639186 A TW201639186 A TW 201639186A TW 105112859 A TW105112859 A TW 105112859A TW 105112859 A TW105112859 A TW 105112859A TW 201639186 A TW201639186 A TW 201639186A
Authority
TW
Taiwan
Prior art keywords
roller
sintering
solar cell
zone
type solar
Prior art date
Application number
TW105112859A
Other languages
English (en)
Inventor
Xiang-Dong Yuan
Ying Xu
Xi Yuan
Original Assignee
Beijing Solarray Technoiogy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201510203266.0A external-priority patent/CN104810309B/zh
Application filed by Beijing Solarray Technoiogy Co Ltd filed Critical Beijing Solarray Technoiogy Co Ltd
Publication of TW201639186A publication Critical patent/TW201639186A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • F27B9/028—Multi-chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • F27B9/2407—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor the conveyor being constituted by rollers (roller hearth furnace)
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36—Arrangements of heating devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1864—Annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Photovoltaic Devices (AREA)
  • Tunnel Furnaces (AREA)
  • Furnace Details (AREA)

Abstract

本發明涉及一種輥道式太陽電池燒結和輻照退火一體連續爐，可用於太陽電池的燒結和輻照退火處理，由上料區、燒結區、燒結冷卻區、輻照退火區、退火冷卻區和下料區組成，電池片在一組水平排列的輥道上傳輸，並依次經過上述各區，一次性完成太陽電池的燒結和輻照退火過程。本發明從根本上解決輻照退火製程的規模化生產問題，從而最大限度地解決太陽電池在使用過程中的衰減問題。

Description

輥道式太陽電池燒結和輻照退火一體連續爐
本發明涉及一種輥道式太陽電池燒結和輻照退火一體連續爐，可用於太陽電池的燒結和輻照退火處理。
在太陽電池的整個生產製程流程中，擴散、印刷和燒結三道製程是最主要的。其中，燒結製程主要用於烘乾印刷在矽片表面的漿料，燒掉從漿料中揮發出的有機溶劑，同步燒結太陽電池矽片的正反面，使印刷至矽片上漿料中的金屬電極與矽片形成良好的歐姆接觸，燒結品質的好壞直接影響太陽電池的轉換效率。通常情況下，太陽電池用鏈式燒結爐燒結後，即可做成元件，投入太陽能電站使用。
太陽電池因為硼氧對的存在，在使用過程中長期光照環境下會發生效率衰減，尤其是近幾年興起的PERC電池，這種衰減尤為嚴重。研究表明，預先使用一種特定的光源在一定溫度條件下對電池片進行輻照退火處理，會有效防止這種衰減現象發生。但是，目前尚沒有專門對電池片進行輻照退火處理的設備。
為此，申請人發明了一種輥道式太陽電池燒結和輻照退火一體連續爐，使電池片在輥式爐中完成燒結後、直接連續完成輻照退火處理，從根本上解決輻照退火製程的規模化生產問題。
根據以上習知技術的不足，本發明所要解決的技術問題是：提供一種輥道式太陽電池燒結和輻照退火一體連續爐，從根本上解決輻照退火製程的規模化生產問題，從而最大限度地解決太陽電池在使用過程中的衰減問題。
本發明所述的輥道式太陽電池燒結和輻照退火一體連續爐，由上料區、燒結區、燒結冷卻區、輻照退火區、退火冷卻區和下料區 組成，電池片在一組水平排列的輥道上傳輸，並依次經過上述各區，一次性完成太陽電池的燒結和輻照退火過程。
在所述輥道的上方設置有光源、在輥道的下方設置有加熱裝置，或者在輥道的下方設置有光源、在輥道的上方設置有加熱裝置，電池片在傳輸過程中，其正面朝向光源，其背面朝向加熱裝置。
所述的光源為鹵素燈、氙燈、白熾燈或LED燈。
所述的加熱裝置為紅外線燈管、電熱絲或熱風機。
在所述光源與電池片之間，設置一層透光隔熱材料層，將光源隔離在電池片加熱區域之外。
在安裝光源的腔室內，設置有對光源進行冷卻的吹風冷卻裝置或排風裝置，對光源進行冷卻。
所述的透光隔熱材料層材質為石英玻璃或鋼化玻璃。
通過加熱裝置對電池片的加熱溫度是100℃-300℃，較佳150℃-250℃。
較佳的是，光源的輻照度是50mW/cm2-200mW/cm2，80mW/cm2-150mW/cm2。
所述輥道的材質為石英陶瓷、石英玻璃、氧化鋁陶瓷、氮化矽陶瓷、不銹鋼或鋁合金等對電池片沒有污染、耐高溫的材料。
所述的輥道為實心輥道或空心輥道，輥道的形狀為等徑的圓柱狀、臺階狀、圓錐台狀、螺紋狀或圓環狀，輥道可以單向轉動、也可以往復轉動。
在燒結冷卻區和輻照退火區之間設置有緩衝區，緩衝區內設置有可對燒結後的電池片進行加熱及保溫的加熱保溫裝置，或者緩衝區內設置將燒結後的電池片暫時儲存的儲存裝置，或者緩衝區內設置將燒結後的電池片單列分成多列傳輸到輻照退火區的分列裝置。在緩衝區可以保持一定的溫度將燒結後的電池片直接送入輻照退火區，也可以將燒結後的電池片暫時儲存，也可以將單列分成多列傳輸到輻照退火區。
所述的緩衝區加熱保溫裝置的設定溫度是50℃-200℃。
與習知技術相比，本發明具有的有益效果是：
本發明提供的輥道式太陽電池燒結和輻照退火一體連續爐，將燒結製 程和輻照退火製程有機地組合在一起、形成一條連續的生產線，並且電池片通過一組水平排列的輥道連續傳輸、在水平行進過程中連續完成燒結和輻照退火處理，具有能耗低、運行平穩、產能大、連續化生產的特點，推廣應用後，可以最大限度地解決太陽電池使用過程中衰減的問題。
1‧‧‧上料區
2‧‧‧燒結區
3‧‧‧燒結冷卻區
4‧‧‧緩衝區
5‧‧‧輻照退火區
6‧‧‧退火冷卻區
7‧‧‧下料區
8‧‧‧電池片
9‧‧‧輥道
10‧‧‧加熱裝置
11‧‧‧光源
12‧‧‧透光隔熱材料層
第1圖是本發明的結構示意圖。
下面結合附圖對本發明的實施例做進一步描述。
《實施例1》
如第1圖所示，本發明的輥道式太陽電池燒結和輻照退火一體連續爐由上料區1、燒結區2、燒結冷卻區3、緩衝區4、輻照退火區5、退火冷卻區6、下料區7組成，輥道9沿水平方向排列並依次穿過各區，電池片8在輥道9上隨輥道9轉動向前輸送，電池片8進入上料區1後，在輥道9的傳輸下進入燒結區2，完成燒結後，進入燒結冷卻區3，然後進入緩衝區4，在輥道9的傳輸下繼續進入輻照退火區5。電池片8完成輻照退火後，通過退火冷卻區6冷卻，進入下料區7，即完成了整個燒結和輻照退火過程。
燒結區2在輥道9的上方、或下方、或上方和下方設置有加熱器，燒結冷卻區3設有冷卻裝置。
緩衝區4設置在燒結冷卻區3、與輻照退火區5之間，可以保持一定的溫度將燒結後的電池片8直接送入輻照退火區5，也可以將燒結後的電池片8暫時儲存，也可以將單列分成多列傳輸到輻照退火區5。
輻照退火區5包括光源11、上爐殼、透光隔熱材料層12、下爐殼和加熱裝置10的組成，上爐殼、下爐殼形成爐腔，輥道9穿過爐腔，電池片8在輥道9的傳輸下水平行進，進入輻照退火區5，在輻照退火區5的下部設置有加熱裝置10，在輻照退火區5的上部設置有光源11，在安裝光源11的腔室內，設置有對光源11進行冷卻的吹風冷卻裝置或排風裝置，在光源11的下部設置有透光隔熱材料層12，將加熱區域和光源11隔開，以防止熱量把光源11燒壞。退火冷卻區6設有冷卻風機，電池片8完成輻照退火後，通過冷卻風機冷卻，即完成了整個輻照退火過程。
光源11可以為鹵素燈、氙燈、白熾燈或LED燈，加熱裝置 10可以為紅外線燈管、電熱絲或熱風機，輥道9為實心輥道或空心輥道，輥道9的形狀為等徑的圓柱狀、臺階狀、圓錐台狀、螺紋狀或圓環狀，輥道9的材質為石英陶瓷、石英玻璃、氧化鋁陶瓷、氮化矽陶瓷、不銹鋼或鋁合金，透光隔熱材料層12材質為石英玻璃或鋼化玻璃。本實施例中，使用的輥道9是石英陶瓷輥、光源11是鹵鎢燈、加熱裝置10是紅外線燈管、透光隔熱材料是石英玻璃板；燒結溫度是800-850℃；緩衝區4的溫度一般是50-200℃，最好是100-200℃；輻照退火區5的加熱溫度是100℃-300℃，較好是150℃-250℃，光源11的輻照度是50mW/cm2-200mW/cm2，較好是80mW/cm2-150mW/cm2。
《實施例2》
輻照退火區5的下部設置有光源11，在輻照退火爐的上部設置有加熱裝置10，在光源11與輥道9底面之間設置有透光隔熱材料層12，透光隔熱材料層12將上部加熱區域和光源11隔開，其餘同實施例1。
儘管本發明的實施方案已公開如上，但其並不僅僅限於說明書和實施方式中所列運用，它完全可以被適用於各種適合本發明的領域，對於熟悉本領域的人員而言，可容易地實現另外的修改，因此在不背離申請專利範圍及等同範圍所限定的一般概念下，本發明並不限於特定的細節和這裡示出與描述的圖例。
1‧‧‧上料區
2‧‧‧燒結區
3‧‧‧燒結冷卻區
4‧‧‧緩衝區
5‧‧‧輻照退火區
6‧‧‧退火冷卻區
7‧‧‧下料區
8‧‧‧電池片
9‧‧‧輥道
10‧‧‧加熱裝置
11‧‧‧光源
12‧‧‧透光隔熱材料層

Claims (12)

  1. 一種輥道式太陽電池燒結和輻照退火一體連續爐，係由上料區(1)、燒結區(2)、燒結冷卻區(3)、輻照退火區(5)、退火冷卻區(6)和下料區(7)組成，電池片(8)在一組水平排列的輥道(9)上傳輸，並依次經過上述各區，一次性完成太陽電池的燒結和輻照退火過程。
  2. 根據申請專利範圍第1項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，在所述輥道(9)的上方設置有光源(11)，在所述輥道(9)的下方設置有加熱裝置(10)，或者在所述輥道(9)的下方設置有光源(11)，在所述輥道(9)的上方設置有所述加熱裝置(10)，所述電池片(8)在傳輸過程中，其正面朝向所述光源(11)，其背面朝向所述加熱裝置(10)。
  3. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述光源(11)為鹵素燈、氙燈、白熾燈或LED燈。
  4. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述加熱裝置(10)為紅外線燈管、電熱絲或熱風機。
  5. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，在所述光源(11)與所述電池片(8)之間設置一層透光隔熱材料層(12)，將所述光源(11)隔離在所述電池片(8)加熱區域之外。
  6. 根據申請專利範圍第5項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，在安裝所述光源(11)的腔室內，設置有對所述光源(11)進行冷卻的吹風冷卻裝置或排風裝置。
  7. 根據申請專利範圍第5項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述透光隔熱材料層(12)材質為石英玻璃或鋼化玻璃。
  8. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，通過所述加熱裝置(10)對所述電池片(8)的加熱溫度是100℃-300℃。
  9. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述光源(11)的輻照度是50mW/cm2-200mW/cm2。
  10. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述輥道(9)的材質為石英陶瓷、石英玻璃、氧化鋁陶瓷、氮化矽陶瓷、不銹鋼或鋁合金。
  11. 根據申請專利範圍第2項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，所述輥道(9)為實心輥道或空心輥道，所述輥道(9)的形狀為等徑的圓柱狀、臺階狀、圓錐台狀、螺紋狀或圓環狀。
  12. 根據申請專利範圍第1項至第11項中任一項所述的輥道式太陽電池燒結和輻照退火一體連續爐，其中，在所述燒結冷卻區(3)和所述輻照退火區(5)之間設置有緩衝區(4)，所述緩衝區(4)內設置有可對燒結後的所述電池片(8)進行加熱及保溫的加熱保溫裝置，或者所述緩衝區(4)內設置將燒結後的所述電池片(8)暫時儲存的儲存裝置，或者所述緩衝區(4)內設置將燒結後的所述電池片(8)單列分成多列傳輸到所述輻照退火區(5)的分列裝置。
TW105112859A 2015-04-25 2016-04-25 輥道式太陽電池燒結和輻照退火一體連續爐 TW201639186A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510203266.0A CN104810309B (zh) 2015-04-25 辊道式太阳电池烧结和辐照退火一体连续炉

Publications (1)

Publication Number Publication Date
TW201639186A true TW201639186A (zh) 2016-11-01

Family

ID=53695032

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105112859A TW201639186A (zh) 2015-04-25 2016-04-25 輥道式太陽電池燒結和輻照退火一體連續爐

Country Status (3)

Country Link
EP (1) EP3291287B1 (zh)
TW (1) TW201639186A (zh)
WO (1) WO2016173472A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10591216B2 (en) 2017-10-02 2020-03-17 Industrial Technology Research Institute Solidifying device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111863661A (zh) * 2020-07-23 2020-10-30 东方日升（常州）新能源有限公司 一种烧结设备、电池的烧结退火方法及电池
KR20230012817A (ko) 2021-07-16 2023-01-26 현대자동차주식회사 하이브리드 부품의 제조 방법 및 제조 시스템
CN115235219A (zh) * 2022-06-29 2022-10-25 浙江晶科能源有限公司 一种烧结系统及烧结方法、太阳能电池生产线

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001330370A (ja) * 2000-05-23 2001-11-30 Kubota Corp 鋳鉄管の熱処理装置
CN101478882B (zh) * 2006-06-26 2013-07-10 Tp太阳能公司 具有高强度加热区段的快速热烧结红外线传送带式热处理炉
CN202549905U (zh) * 2012-04-11 2012-11-21 无锡嘉瑞光伏有限公司 一种晶体硅太阳电池烧结装置
CN103681964A (zh) * 2013-11-29 2014-03-26 奥特斯维能源（太仓）有限公司 太阳能电池片效率衰减后恢复方法
CN204537995U (zh) * 2015-04-25 2015-08-05 北京金晟阳光科技有限公司 辊道式太阳电池烧结和辐照退火一体连续炉

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10591216B2 (en) 2017-10-02 2020-03-17 Industrial Technology Research Institute Solidifying device

Also Published As

Publication number Publication date
EP3291287A1 (en) 2018-03-07
EP3291287B1 (en) 2020-06-10
EP3291287A4 (en) 2018-11-21
CN104810309A (zh) 2015-07-29
WO2016173472A1 (zh) 2016-11-03

Similar Documents

Publication Publication Date Title
WO2016173471A1 (zh) 辊道式太阳电池辐照退火炉
TW201639186A (zh) 輥道式太陽電池燒結和輻照退火一體連續爐
US20200292236A1 (en) Light annealing in a cooling chamber of a firing furnace
TWI513028B (zh) 處理裝置
WO2008002904A3 (en) Rapid thermal firing ir conveyor furnace having high intensity heating section
TWI505332B (zh) 熱處理方法及熱處理裝置
JP2016028418A (ja) 光起電装置の光誘起劣化を抑止するための方法および装置
CN106229385B (zh) 太阳电池辐照退火炉
JP2011075132A (ja) 太陽電池用連続焼成炉
CN107146828A (zh) 均匀高效退火的太阳电池辐照退火炉
US20160172220A1 (en) Selenization process apparatus for glass substrate
CN204537995U (zh) 辊道式太阳电池烧结和辐照退火一体连续炉
WO2019033810A1 (zh) 太阳能电池浆料的干燥方法及系统
KR101546320B1 (ko) 기판 열처리 장치
CN213733997U (zh) 一种太阳能电池硅片干燥用烘干设备
CN102953123B (zh) 抗下垂制动装置及侧壁加热器扩散炉的超低质量运送系统
CN207808757U (zh) 用于感光油墨加工的预热烘干装置
CN104908417B (zh) 一种印刷用uv led固化灯
TW201810705A (zh) 太陽能電池片之氫鈍化處理方法及其處理裝置
TWM493756U (zh) 處理裝置
JP2004031867A (ja) 熱処理装置
CN111634116A (zh) 一种太阳能电池硅片干燥或固化用烘箱
CN116913776A (zh) 一种快速链式退火设备
CN202229570U (zh) 辊道烧成窑炉快速进入烧结温度的机构
CN103846207A (zh) 红外烘烤炉