TW201630103A - Purge device, purge stocker, and purge abnormality detection method - Google Patents

Abstract

To provide a purge device with which the increase of the number of sensors to be used for the purpose of detecting purge abnormality can be suppressed. Provided is a purge device (4) that is equipped with: a flow rate control device (32) that controls the flow rate of a purge gas in piping (34) connected to a container (F); and a determining unit (33) that determines whether purging with respect to the container (F) is acceptable or not on the basis of an output signal of the flow rate control device (32).

Description

Purification device, purification storage, and purification abnormality detection method

The present invention relates to a purification device, a purification storage, and a purification abnormality detecting method.

When a container such as a FOUP, a SMIF Pod, or a grating Pod that accommodates a wafer or a grating is stored, the container is filled with a clean gas such as dry air or nitrogen gas by a purification device to suppress contamination or oxidation of the stored product. The purification device is known to be equipped with a purification reservoir for storing containers. In the case where a purification abnormality such as a shortage of the purge gas by the purification device occurs, and the contamination of the stored product occurs, the flow rate of the purge gas supplied to the container is measured, and the purification abnormality is detected (refer to, for example, the patent document). 1). In Patent Document 1, the flow rate of the purge gas supplied to the inside of the container is measured by a sensor, and it is determined whether or not good purification is performed.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent No. 4670808

As shown in the patent document 1, in order to determine whether or not the purification is performed, the number of components constituting the sensor or the like is increased in the method of using the dedicated flow rate measuring means, which not only complicates the configuration but also increases the cost of the device. . Further, in the configuration of the sensor in which the flow rate measuring unit is disposed for each scaffold in the purification storage, it is necessary to have a space for arranging the sensor or the like, and there is a problem that the storage size is increased.

The present invention has been made in view of the above circumstances, and an object thereof is to provide a purification apparatus, a purification storage, and a purification abnormality detecting method which can easily and surely detect a purification abnormality and can suppress an increase in the cost of the apparatus.

The purification apparatus according to the present invention includes: a flow rate control device that controls a flow rate of the purge gas in the pipe connected to the container; and a determination unit that performs the purification of the container based on the output signal of the flow rate control device determination.

Further, a notification unit may be provided, which is a result of the determination by the notification unit. Further, the flow control device may include a flow control gate that adjusts a flow rate of the purge gas in the pipe, and a flow meter that measures a flow rate of the purge gas in the flow control gate and outputs a state indicating the flow control gate Or the signal of the flowmeter detection result is used as the output signal. In addition, the flow control device may also output an applied voltage to the flow control gate. In the case of the output signal, the determination unit determines that the purification is defective if the applied voltage is lower than the predetermined value. Further, when the opening degree of the flow rate control gate is set to a predetermined value, the determination unit may determine the quality of the purification by comparing the detection result of the flow meter with a predetermined value. Further, the flow rate control device may output an output signal in accordance with an output command from the determination unit.

Further, the purification storage of the present invention is provided with: the above-described purification device; and a scaffold which holds a container which is purified by the purification device.

Further, the method for detecting an abnormality of purification according to the present invention includes: a step of controlling a flow rate of a purge gas in a pipe connected to a container by a flow rate control device; and a purification of the container according to an output signal of the flow control device The step of the decision.

According to the purification apparatus of the present invention, the determination unit performs the determination of whether or not the container is cleaned based on the output signal of the flow rate control device that controls the flow rate of the purge gas. Therefore, the increase in the sensor used for the detection of the purge abnormality can be suppressed. Further, since the increase in the sensor used for the detection of the cleaning abnormality can be suppressed, the increase in the cost of the device can be suppressed.

In addition, if the notification unit includes the determination result of the notification determination unit, the operator or the like can easily determine the determination result of the purification. Further, the flow rate control device includes a flow rate control gate that adjusts a flow rate of the purge gas in the pipe, and a flow rate meter that measures a flow rate of the purge gas in the flow rate control gate, and outputs a flow rate control gate or a flow meter detection. result The signal as the output signal can be judged based on the state of the flow control gate or the detection result of the flow meter, so that the quality can be accurately determined. Further, when the flow rate control device outputs an applied voltage to the flow rate control gate as an output signal, the determination unit determines that the purge voltage is poor if the applied voltage is lower than a predetermined value, and the applied voltage indicating the state of the flow control gate is The predetermined value is compared to determine whether or not the purification is defective, so that the quality determination can be easily and accurately performed. Further, when the degree of opening of the flow rate control gate is set to a predetermined value for the determination unit, the quality of the flow rate control gate is controlled by comparing the detection result of the flow rate with the predetermined value to perform the purification. Since the flow rate of the degree is compared with the predetermined value to determine the quality, the quality determination can be easily and accurately performed. Further, if the flow rate control device outputs an output signal in accordance with an output command from the determination unit, the quality of the purification can be determined at any timing.

Further, according to the purification storage container of the present invention, it is possible to suppress a situation in which the device cost is increased by the installation of the purification device, and it is possible to suppress an increase in the arrangement space of the sensor, thereby preventing an increase in the size of the storage.

Further, according to the purification abnormality detecting method of the present invention, the quality of the purification of the container is determined based on the output signal of the flow rate control device that controls the flow rate of the purge gas, so that the abnormality of the purification can be easily and surely detected.

1‧‧‧purification storage

2‧‧‧ frame

2a‧‧‧Internal space

3‧‧‧Storage scaffolding

4‧‧‧purification device

5‧‧‧Head height crane

6‧‧‧Control device

7‧‧‧ Input Department

8‧‧‧Display Department

10‧‧‧ Walking trolley

11‧‧‧Support column

12‧‧‧Support desk

13‧‧‧Transfer device

14‧‧‧ Wheels

15‧‧‧ Track

20‧‧ ‧ sales

21‧‧‧ Body Department

21a‧‧‧ Opening

22‧‧‧ 盖部

23‧‧‧ recess

24‧‧‧ gas inlet

25‧‧‧ check valve

26‧‧‧Exhaust port

27‧‧‧ check valve

28‧‧‧Flange

30‧‧‧Supply nozzle

31‧‧‧Exhaust nozzle

32‧‧‧Flow control device

33‧‧‧Decision Department

34‧‧‧Pipe

35‧‧‧Pipe

36‧‧‧Pipe

40‧‧‧ Purified gas source

41‧‧‧ Purified gas exhaust

50, 51‧‧‧ Connections

52‧‧‧pipe

53‧‧‧ flowmeter

54‧‧‧Flow control gate

55‧‧‧Control circuit

56‧‧‧Flow Measurement Department

57‧‧‧ Bypass

58‧‧‧ laminar flow components

60, 61‧‧‧ resistance

62‧‧‧Bridge Circuit

63‧‧‧Amplifier

65‧‧‧Power supply

66‧‧‧Reporting Department

F‧‧‧ Container

Fa‧‧‧ internal

Fig. 1 is a view showing a purification storage unit including the purification apparatus of the embodiment. A diagram of an example.

Fig. 2 is a view showing an example of a flow rate control device.

Fig. 3 is a view showing an example of temporal changes in applied voltage when performing purification.

Fig. 4 is a view showing an example of temporal changes in the detected value of the flow rate at the time of purifying.

Fig. 5 is a flow chart showing an example of the purification abnormality detecting method of the embodiment.

Fig. 6 is a flow chart showing a modification of the abnormality determining method.

Fig. 7 is a view showing the operation corresponding to the purification storage of Fig. 6.

Hereinafter, embodiments will be described with reference to the drawings. In addition, in order to demonstrate the embodiment in the drawing, a part of the scale is enlarged or emphasized, and the scale is appropriately changed and expressed. In the following figures, the direction in the figure is illustrated using the XYZ coordinate system. In the XYZ coordinate system, the vertical direction is the Z direction, and the horizontal direction is the X direction and the Y direction. The respective directions in the X direction, the Y direction, and the Z direction are set such that the direction of the arrow in the figure is the + direction, and the direction opposite to the direction of the arrow is the - direction.

Fig. 1(A) is a view showing an example of the purification storage 1 of the present embodiment, and Fig. 1(B) is a view showing an example of the container F and the purification device 4. The purification storage 1 stores an automatic warehouse that stores, for example, a container F used for manufacturing a wafer or a grating of a semiconductor element. The container F is, for example, a FOUP, a SMIF Pod, a grating Pod, or the like.

As shown in Fig. 1(A), the purification storage 1 includes a housing 2, a plurality of storage racks 3, a plurality of purification devices 4, a stacking crane 5 as a conveying device, a control device 6, and an input unit 7, And the display unit 8. The frame 2 has an internal space 2a that is separable from the outside. The housing 2 is provided with an inlet/outlet container (not shown) for receiving the container F outside the housing 2 and the internal space 2a. The plurality of storage scaffolding 3, the plurality of purification devices 4, and the stacking crane 5 are disposed in the internal space 2a of the casing 2. The control device 6 controls the purification device 4 and the stacker crane 5. Among them, the control device for controlling the purification device 4 and the control device for controlling the stacker crane 5 may be separately provided.

The stacker 5 can transport the container F in the X direction, the Y direction, and the Z direction, for example, between the storage tray and the storage rack 3, or the storage rack 3 can be transported to the other storage rack 3 Container F. The stacker 5 includes, for example, a traveling carriage 10, a support column 11, a support table 12, and a transfer device 13. The traveling vehicle 10 has a plurality of wheels 14 that move in a horizontal direction (X direction) along a rail 15 provided on a bottom surface of the casing 2.

The support column 11 is extended from the upper surface of the traveling carriage 10 in the vertical direction (Z direction). The support table 12 is supported by the support column 11 so as to be slidable along the support column 11 in the Z direction. The transfer device 13 is provided with, for example, a telescopic arm portion and a mounting portion on which the container F can be placed. In the conveyance of the container F, for example, the flange portion 28 (see FIG. 1(b)) provided in the upper portion of the container F may be gripped, and the container F may be suspended to carry the carrier or the side surface of the container F to be transported. Come to Generation of high-rise cranes 5. In addition, in FIG. 1, one stacker 5 is shown, but the stacker 5 arrange|positioned in the frame 2 may be two or more.

The storage scaffolding 3 is arranged in a plurality of stages in the height direction (Z direction), and is arranged in a plurality of rows in the horizontal direction (X direction). The container F can be placed on each of the plurality of storage racks 3 . As shown in Fig. 1(B), a pin 20 is attached to the upper surface of the storage rack 3, and is used for positioning of the container F. The container F is an example of a FOUP shown in FIG. 1(B), and includes a box-shaped main body portion 21 having an opening 21a and a lid portion 22 that closes the opening 21a. An article such as a wafer is housed in the interior Fa of the container F through the opening 21a. The main body portion 21 is provided with a positioning recess 23 on the bottom surface side thereof. The recess 23 is, for example, a groove that radially extends from the center of the bottom surface of the body portion 21. The recessed portion 23 enters a pin (not shown) provided on the mounting table of the transfer device 13 to perform positioning when the container F is transported.

The storage scaffolding 3 has a slit (not shown) through which the mounting table of the transfer device 13 can pass in the vertical direction. The transfer device 13 moves the mounting table on the upper surface of the storage rack 3 by moving the mounting table downward from the upper side of the storage rack 3 through the notch portion. At this time, the container F is inserted into the concave portion 23 by the pin 20 of the storage shelving 3, and is positioned relative to the storage shelf 3. The main body portion 21 is provided with a gas introduction port 24, a check valve 25, an exhaust port 26, and a check valve 27 on the bottom surface side. The inlet port 24 and the exhaust port 26 are in communication with the interior Fa of the body portion 21 and the outside, respectively. The check valves 25 and 27 are provided in the inlet port 24 and the exhaust port 26, respectively.

The purification device 4 is provided with a supply nozzle 30 and an exhaust gas spray The nozzle 31, the flow rate control device 32, and the determination unit 33. The supply nozzle 30 and the exhaust nozzle 31 are provided on the upper surface of the storage rack 3. The supply nozzle 30 and the exhaust nozzle 31 are disposed so as to be connected to the inlet port 24 and the exhaust port 26 when the container rack F is placed on the storage rack 3 . When the container F is placed on the storage rack 3, the inlet port 24 of the container F is connected to the pipe 34 through the supply nozzle 30, and is connected to the purge gas source 40 through the flow rate control device 32. The exhaust nozzle 31 is connected to the exhaust gas path (purified gas exhaust gas 41) of the purge gas through the pipe 35.

The purge gas source 40 supplies, for example, a gas inert to the stored article such as nitrogen as a purge gas. The purge gas system is selected in accordance with the article accommodated in the container F, and for example, a gas which suppresses oxidation of the article, suppresses molecular contamination, or a gas which reduces water in the container F, or the like is used. The purge gas system uses nitrogen or clean dry air (CDA) or the like. The purge gas source 40 may be a part of the purification storage 1, or may be an apparatus for purifying the exterior of the storage 1, or may be, for example, a facility in the factory in which the storage storage 1 is disposed.

When the container F is purified, the purge gas system from the purge gas source 40 passes through the flow rate control device 32 and the pipe 34, is supplied to the inside Fa by the introduction port 24 of the container F, and is filled in the interior Fa of the container F. Further, the gas system of the internal Fa is discharged to the outside of the container F through the exhaust port 26, passes through the pipe 35, and is exhausted to the outside by the purge gas exhaust 41. Among them, the purge gas exhaust gas 41 may be provided with a device that attracts a gas by a pump or the like.

The flow control device 32 is, for example, a mass flow controller, controlled by The flow rate of the purge gas in the piping 34 is controlled to control the flow rate of the purge gas supplied to the supply nozzle 30 by the purge gas source 40. The flow rate control device 32 is connected to the control device 6 in a communicable manner, and the control device 6 supplies the flow rate control device 32 with a set value of the flow rate. The flow rate control device 32 controls so that the flow rate of the purge gas approaches a set value.

FIG. 2 is a view showing an example of the flow rate control device 32. The flow rate control device 32 includes connection portions 50 and 51, a line 52, a flow meter 53, a flow rate control gate 54, and a control circuit 55. The connecting portions 50, 51 are, for example, fluid joints. The connection portion 50 is connected to the purge gas source 40 through the pipe 36, and the connection portion 51 is connected to the supply nozzle 30 through the pipe 34.

The conduit 52 is formed as a flow passage that connects the connection portion 50 and the connection portion 51. The line 52 is branched into a flow rate measuring unit 56 and a bypass unit 57. The flow rate measuring unit 56 is a capillary tube or the like and merges with the bypass portion 57 via the position of the flow meter 53. The bypass unit 57 is provided with a laminar flow element 58, and the flow rate measuring unit 56 is configured to flow a purge gas formed into a laminar flow by the laminar flow element 58. The flow rate ratio (split ratio) of the flow rate in the flow rate measuring unit 56 and the flow rate in the bypass unit 57 is set in advance, and the flow rate in the flow rate measuring unit 56 is detected, and the flow rate in the line 52 can be measured by using the flow rate ratio. .

The flow rate control gate 54 is provided on the downstream side of the bypass portion 57 in the line 52. The flow rate control gate 54 adjusts the flow rate of the purge gas flowing through the line 52 to the connection portion 50. The flow control gate 54 is a solenoid valve Etc., the opening degree (flow path sectional area) changes depending on the applied voltage. The flow control gate 54 is formed to have a closed state in which the opening degree is the smallest (for example, fully closed) when the applied voltage is the minimum (for example, 0), and the opening degree is increased as the applied voltage is increased. The flow meter 53 measures the flow rate in the line 52 by detecting the flow rate in the flow rate measuring unit 56. The flow meter 53 is, for example, a thermal flow meter, and includes resistors 60 and 61 provided in the flow rate measuring unit 56, a bridge circuit 62, and an amplifier 63.

The resistors 60 and 61 are self-heating resistors, and the resistor 60 is provided on the upstream side of the resistor 61. The resistors 60, 61 are connected to the bridge circuit 62, respectively. When the purge gas flows to the flow rate measuring unit 56 while the electric power is supplied to the resistors 60 and 61, the heat is taken up by the resistor 60, so that a temperature difference occurs between the resistors 60 and 61. The bridge circuit 62 detects the difference in resistance values due to the temperature difference between the resistors 60, 61. The bridge circuit 62 is connected to the amplifier 63, and outputs a signal indicating the difference in resistance between the resistors 60 and 61, that is, a signal corresponding to the flow rate in the flow rate measuring unit 56, to the amplifier 63. The amplifier 63 amplifies the signal output by the bridge circuit 62. The flow rate meter 53 converts the flow rate corresponding to the flow rate measuring unit 56 and the bypass unit 57 by the flow rate measuring unit 56, for example, and generates a flow rate signal indicating the flow rate (for example, liters/minute) in the line 52. The flow meter 53 outputs a flow signal to the control circuit 55.

The control circuit 55 controls the opening of the flow control gate 54 by controlling the applied voltage to the flow control gate 54, and controls the flow rate in the line 52. The control circuit 55 uses the detected value of the flow rate obtained by the flow meter 53, and the flow rate in the line 52 approaches the set value. The control gate 54 performs feedback control. For example, the control circuit 55 increases the applied voltage to the flow rate control gate 54 so that the flow rate increases as the detected value is smaller than the set value of the flow rate, and decreases the flow rate when the detected value is larger than the set value of the flow rate. The applied voltage to the flow control gate 54 is reduced. Here, the conversion unit that converts the flow rate in the flow rate measuring unit 56 into the flow rate in the line 52 may be provided in the control circuit 55 or may be a part of the flow meter 53. Further, the flow meter 53 is, for example, a Coriolis type flow meter or a nozzle type flow meter.

The flow rate control device 32 supplies electric power consumed by the flow meter 53, the control circuit 55, the flow rate control gate 54, and the like by the electric power from the power source 65. For example, the flow rate control device 32 includes a power supply circuit that adjusts a current value or a voltage value of electric power supplied from the power source 65, and the electric power is supplied from the power supply circuit to each unit of the flow rate control device 32. The control circuit 55 controls the flow rate control gate 54 by, for example, adjusting the voltage of the power supplied to the flow control gate 54 by the power supply circuit. The power supply circuit may be provided in the control circuit 55 or may be separately provided separately from the control circuit 55.

Further, the flow rate control device 32 receives the flow rate setting signal in which the set value of the flow rate is set by the control device 6, and controls the flow rate so as to approach the set value. Further, the flow rate control device 32 receives an operation command from the control device 6, and performs various operations. The operation command is, for example, a command for controlling ON/OFF of the flow control device 32, a command for designating a state of the flow control gate 54 (for example, an opening degree), and a command for requesting output of various output signals by the flow control device 32. Wait. Flow control device The output signal of 32 is, for example, a flow signal indicating a detected value of the flow rate in the line 52, a state signal indicating a state of the flow control gate 54 (for example, an applied voltage, an opening degree), and the like. The flow rate control device 32 outputs an output signal to the control device 6 as a response to the operation command when, for example, an operation command for outputting the signal is received.

The input unit 7 and the display unit 8 are connected to the control device 6. The input unit 7 is, for example, an operation panel, a touch panel, a keyboard, a mouse, a trackball, or the like. The input unit 7 detects an input from an operator and supplies the input information to the control device 6. For example, the operator can set and change the flow rate of the purge gas or the like by operating the input unit 7. The display unit 8 is, for example, a liquid crystal display or the like, and displays an image that is supplied by the control device 6. For example, the control device 6 displays an image indicating the operation state of the purification storage 1 , various settings, and a cleaned state on the display unit 8 .

When the container F is connected to the purification device 4, there is a possibility that the connection between the inlet port 24 of the container F and the supply nozzle 30 is defective due to the positional deviation of the container F and the purification device 4. At this time, since the purge gas leaks from the gap between the introduction port 24 and the supply nozzle 30, the purge gas supplied to the inside Fa of the container F is insufficient, and purification failure occurs. In addition, when the pipes 34 and 35 are clogged or the like, or the purge gas leaks from the gap between the lid portion 22 of the container F and the main body portion 21, the purification failure also occurs. In the present embodiment, the function of the flow rate control device 32 is used to determine whether or not the purification is good.

The determination unit 33 determines whether or not the container F is cleaned based on the output signal of the flow rate control device 32. Control device 6 The determination result of the fixed portion 33 is displayed on the display unit 8. The display unit 8 functions as the notification unit 66 that is the determination result of the notification determination unit 33. The notification unit 66 may not be the display unit 8. For example, the determination result may be reported by the change or the brightness of the light emitted by the light source such as an LED, and the determination result may be reported by sound or the like. Further, the determination unit 33 may be, for example, a result of a determination as to whether or not the purification device 4 has a purification failure or the like, and may not be provided with the notification unit 66.

The determination unit 33 determines whether or not the purification is good or not based on, for example, a status signal or a flow signal output from the flow rate control device 32. For example, the flow rate control device 32 outputs a signal indicating the voltage applied to the flow rate control gate 54 as a status signal, and the determination unit 33 determines whether or not the voltage is compared with a predetermined value (threshold value). At this time, the control device 6 transmits a command requesting the output of the applied voltage of the flow control gate 54 to the flow rate control device 32, and the flow rate control device 32 outputs a signal indicating the applied voltage to the control device 6 as a response to the command. . However, the determination unit 33 may be formed separately from the control device 6 instead of being formed in the control device 6.

3(A) to 3(D) are diagrams showing an example of temporal changes in applied voltage when performing purification. In the drawings (A) to (D), the fluctuation of the supply pressure on the upstream side (the side of the purge gas source 40) from the flow rate control device 32 is ignored and the concept is displayed. Fig. 3(A) shows an example in which the purification is normal. At time t0, the time before the container F (hereinafter referred to as the container to be connected) connected to the purification device 4 is transported to the stacker 5 is started, and the purification device 4 is placed in the standby state at time t0. For example, at time t0, the flow control gate applies a voltage of 0 to form a closed state.

Time t1 is the time at which the purification device 4 starts supplying the purge gas. The time t1 is, for example, the time at which the container F that is to be connected is started to be transported by the entrance or exit. For example, at time t1, the control device 6 transmits a command to start the conveyance to the stacker crane 5, and transmits an operation command (command) for starting the supply of the purge gas to the purification device 4. At the time t1, the flow rate control device 32 sets the applied voltage of the flow rate control gate 54 to V1, and controls the flow rate of the purge gas so that the purge gas of the flow rate of the set value is supplied to the supply nozzle 30.

The time t2 is the time at which the container F is connected to the purification device 4. At the time t2, the flow rate is reduced by the pressure loss when the purge gas flows into the interior Fa of the container F from the supply nozzle 30, so that the flow rate control device 32 increases the applied voltage to the flow control gate 54 to V2, and increases the flow rate. The opening of the control gate 54 is corresponding. Further, after time t2, the internal pressure of the container F rises with the filling of the purge gas, and the flow rate control device 32 applies the flow rate control gate 54 so as to compensate for the decrease in the flow rate due to the increase in the internal pressure of the container F. The voltage gradually increases. At time t3, when the container F is filled with the purge gas, after the time t3, the inflow amount of the purge gas to the container F is proportional to the discharge amount, and the applied voltage is stabilized at V3.

Fig. 3(B) shows an example in which the cleaning of the container F and the purification device 4 is poor, and the cleaning is abnormal. At this time, after the time t2 at which the container F is connected to the purification device 4, the purge gas leaks from the supply nozzle 30 to the volume. Outside the device F, the applied voltage is a value that does not reach V2 (for example, V1).

(C) is an example in which the piping 34 or the like between the flow rate control device 32 and the supply nozzle 30 is clogged or the like, and the cleaning is abnormal. At this time, since the flow rate control device 32 starts the supply of the purge gas at time t1, since the purge gas is difficult to flow, the applied voltage is, for example, V4 higher than V3. Further, even when the piping 36 between the flow rate control device 32 and the purge gas source 40 is clogged, the amount of inflow to the flow rate control device 32 is insufficient, and therefore the same.

(D) is an example in which the piping 35 or the like on the exhaust side of the container F is clogged or the like, and the cleaning is abnormal. At this time, the time t3 until the purge gas is filled in the container F is the same as the case where the purification is normal (see FIG. 3(A)), but after the time t3, the purge gas is difficult to be discharged from the container F, and the container F The internal pressure rises and the applied voltage rises.

The determination unit 33 determines whether or not the purification is normal (the determination of the quality of the purification) by the change in the applied voltage as described above. For example, the determination unit 33 determines that the purge is abnormal (bad) if the applied voltage is less than the predetermined value after the time t2. The predetermined value is, for example, set to a voltage greater than V1 and less than V2. At this time, the determination unit 33 can determine that the normal purification (see FIG. 3(A)) or the abnormal purification (see FIG. 3(B)). As described above, the determination unit 33 can determine that the purge gas supply to the container F is abnormal.

The timing at which the determination unit 33 performs the determination is set, for example, by adding a margin to the time from the start to the completion of the conveyance of the container F. For example, when the time required for the conveyance of the container F is 30 seconds and the margin is 30 seconds, the determination unit 33 uses the applied voltage one minute after the start of the conveyance to determine the quality. However, the determination unit 33 may determine that the purge is abnormal (defective) if the applied voltage after the time t3 exceeds a predetermined value if the threshold value of V3 is relatively exceeded. At this time, the determination unit 33 can determine that the cleaning is normal or the cleaning of the abnormality of FIG. 3(C) or FIG. 3(D).

In addition, the determination unit 33 may perform the determination (abnormality detection) of the purification using two or more predetermined values. For example, the determination unit 33 compares the predetermined value greater than V1 and smaller than V2 with the applied voltage after the time t2, detects a purification abnormality as shown in FIG. 3(B), and sets a predetermined value greater than V3 with the time t3. The subsequent applied voltages are compared to detect the purification abnormalities as shown in Figs. 3(C) and 3(D).

Further, the determination unit 33 may compare the detection result of the flow meter 53 with a predetermined value to determine the quality. At this time, the control device 6 transmits a command to the flow rate control device 32 to fix the opening degree of the flow rate control gate 54 to a predetermined value. Further, the control device 6 transmits a command for outputting the detected value of the flow rate obtained by the flow meter 53 to the flow rate control device 32, and the flow rate control device 32 outputs a flow rate signal indicating the detected value of the flow rate to the control device 6, as The response to the command.

4(A) to 4(D) are diagrams showing an example of temporal changes in the detected value of the flow rate at the time of purifying. In the case of FIG. 4 (A) to (D), the fluctuation of the supply pressure in the upstream side (the purge gas source 40 side) of the flow rate control device 32 is ignored, and the concept is displayed. Fig. 4(A) shows an example in which the purification is normal (corresponding to Fig. 3(A)). Traffic is in The standby state at time t0 is, for example, 0. At time t1, when the supply of the purge gas by the flow rate control device 32 is started, it becomes Q3. Further, the flow rate is at time t2, and if the container F is connected to the supply nozzle 30, it is reduced to Q2 due to pressure loss. Further, after the time t2, since the internal pressure of the container F due to the filling of the purge gas rises, the flow rate is reduced. Further, the flow rate is stabilized at Q1 after time t3 when the purge gas is full.

Fig. 4(B) shows an example in which the connection between the container F and the purification device 4 is poor and the cleaning is abnormal (corresponding to Fig. 3(B)). At this time, after the flow rate is at time t2 (when the container F is connected to the purification device 4), the purge gas leaks more than Q2 (for example, Q3).

FIG. 4(C) shows an example in which the piping 34 or the like between the flow rate control device 32 and the supply nozzle 30 is clogged or the like, and the cleaning is abnormal (corresponding to FIG. 3(C)). At this time, since the purge gas does not easily flow due to clogging at time t1, it is a value lower than Q3 (for example, 0).

Fig. 4(D) shows an example in which the piping 35 or the like on the exhaust side of the container F is clogged or the like, and the cleaning is abnormal (corresponding to Fig. 3(D)). At this time, the time t3 until the purge gas is filled in the container F is the same as when the purge is normal (see FIG. 4(A)). However, after the time t3, the purge gas is hard to be discharged from the container F, and the flow rate is high. cut back.

The determination unit 33 determines whether or not the purification is normal (the determination of the quality of the purification) based on the change in the detected value of the flow rate as described above. For example, the determination unit 33 determines that the purge is abnormal (bad) if the detected value of the flow rate exceeds a predetermined value after time t2. The predetermined value is set to For example, traffic greater than Q1 and less than Q2. At this time, the determination unit 33 can determine that it is normal purification (see FIG. 4(A)) or abnormal cleaning (see FIG. 4(B)).

However, the determination unit 33 is relatively smaller than the predetermined value of Q1, and if the flow rate after the time t3 is smaller than the predetermined value, it can be determined that the purification is abnormal (bad). At this time, the determination unit 33 can determine that the cleaning is normal or the cleaning of the abnormality of FIG. 4(C) or FIG. 4(D). However, the predetermined value may be one type or two or more types as in the case of using the applied voltage.

However, the parameter (for example, the applied voltage and the detected value of the flow rate) used for the determination of the quality is affected by the pressure fluctuation on the upstream side of the flow rate control device 32. For example, when the supply system of the purge gas is common to the plurality of purification devices 4, the supply pressure to the flow rate control device 32 varies depending on the operation state (the number of operation units) of the other purification devices 4, and as a result, the applied voltage changes. The situation. In this case, for example, a predetermined number of predetermined values in response to the operation state of the purification device 4 may be prepared in advance, and the predetermined value may be switched in accordance with the operation state at the time of the determination of the quality. Further, a pressure adjustment gate may be provided on the upstream side of the flow rate control gate 54, and the pressure fluctuation in the upstream side of the flow rate control gate 54 may be suppressed.

Fig. 5(A) is a flowchart showing an example of the purification abnormality detecting method of the embodiment. As shown in FIG. 5(A), in step S1, the control device 6 causes the purification device 4 to start supplying the purge gas. Next, in step S2, the flow rate control device 32 controls the flow rate of the purge gas. Next, in step S3, first, the control device 6 is paired with the flow control device. 32 transmits a command requesting an output signal. The flow rate control device 32 outputs an output signal to the control device 6, whereby the determination unit 33 acquires the output signal of the flow rate control device 32. Next, in step S4, the determination unit 33 determines whether or not the purification is based on the output signal by the method described in FIG. 3 or FIG. Next, in step S5, the notification unit 66 reports the result of the determination of the result of the determination by, for example, displaying the determination result.

Fig. 5(B) is a flowchart showing a modification of the purification abnormality detecting method. In FIG. 5(B), the processing of step S10 is followed by the processing of steps S1 to S3 shown in FIG. 5(A). In the step S10, the determination unit 33 determines whether or not the purification is normal (determination of the quality or not), similarly to, for example, step S4 of FIG. 5(A). When the determination unit 33 determines that the purification is not normal (step S10; No), the notification unit 66 notifies the determination result in step S5. Further, when the determination unit 33 determines that the purification is normal (step S10; Yes), the notification unit 66 does not need to report the determination result, that is, ends the series of processing. As described above, the notification unit 66 may notify the determination result only when it is determined that the purification is not normal (abnormal or defective).

Fig. 6 is a flowchart showing another modification of the purification abnormality detecting method, and Fig. 7 is a view showing the operation corresponding to the purification storage 1 of Fig. 6. The flowchart of Fig. 6 will be described with reference to Fig. 7 as appropriate. In FIG. 7, the symbol Fx indicates the container F when it is determined that the purification is abnormal. In Fig. 6, the processing of step S20 is followed by the processing of steps S1 to S3 shown in Fig. 5(A). In step S20, the determination unit 33 determines whether or not the purification is normal, similarly to, for example, step S4 of FIG. 5(A). The control device 6 determines that the purification is normal if the determination unit 33 (step S20; Yes), that is, a series of processing ends.

When the determination unit 33 determines that the purification is not normal (step S20; No), the control device 6 reconnects the container F and the purification device 4 by the stacking crane 5 in step S21. As shown in Fig. 7, the stacker crane 5 lifts the container Fx from the storage rack 3 and places it on the storage rack 3 again. Next, in step S22, after the container Fx is reconnected to the purification device 4, the control device 6 purifies the container Fx by the purification device 4. Next, in step S23, the determination unit 33 determines whether or not the purification in step S22 is normal, similarly to, for example, step S4 in Fig. 5(A). When the determination unit 33 determines that the purification is normal (step S23; Yes), the control unit 6 ends the series of processes.

When the determination unit 33 determines that the purification is not normal (step S23; No), the control unit 6 determines whether or not the retry (the processing of steps S21 to S23) is completed a predetermined number of times in step S24. When the control device 6 determines that the retry has not been completed until the predetermined number of times has elapsed (step S24; No), the processing of steps S21 to S23 is performed again. When the control device 6 determines that the retry has been completed until the predetermined number of times has elapsed (step S24; Yes), the notification unit 66 is notified of the result of the quality determination in step S5, and the series of processes is terminated.

Among them, the purification device 4 is provided for each storage shelf 3 as shown in FIG. 1, but may not be provided in a part of the storage shelf 3. For example, the plurality of storage racks 3 (one-stage storage racks) arranged in the X direction or the Z direction may be one or two or more. If the storage rack 3 does not have the purification device 4, the stacking height is The heavy machine 5 can also mount the container F on the storage rack 3 having the purification device 4, and place the container F purified by the purification device 4 on the storage rack 3 without the purification device 4. Further, the purification device 4 may be provided outside the storage rack 3 .

However, the container F may not have a check valve in at least one of the inlet port 24 and the exhaust port 26. For example, a filter may be provided at the inlet port 24 instead of the check valve 25. At this time, when the container F is connected to the purification device 4, the flow rate changes due to the pressure loss of the filter, and the applied voltage of the flow control gate 54 due to the flow rate change or the flow rate obtained by the flow meter 53 can be used. The detection value, etc., is judged whether it is good or not.

However, the flow rate control device 32 may be such that when the applied voltage is minimum, the flow rate control gate 54 is formed in a fully open state, and as the applied voltage increases, the opening degree of the flow rate control gate 54 decreases. At this time, the predetermined value used for the determination of the quality is changed according to the change in the applied voltage. Further, the flow rate control device 32 may output various output signals to the control circuit 55, or may be outputted by other components different from the control circuit 55. For example, the flow control device 32 can also output a flow signal to the flow meter 53.

The embodiment of the present invention has been described above, but the technical scope of the present invention is not limited to the above embodiment or modification. Further, the elements described in the above embodiment or modification can be combined as appropriate.

1‧‧‧purification storage

2‧‧‧ frame

2a‧‧‧Internal space

3‧‧‧Storage scaffolding

4‧‧‧purification device

5‧‧‧Head height crane

6‧‧‧Control device

7‧‧‧ Input Department

8‧‧‧Display Department

10‧‧‧ Walking trolley

11‧‧‧Support column

12‧‧‧Support desk

13‧‧‧Transfer device

14‧‧‧ Wheels

15‧‧‧ Track

20‧‧ ‧ sales

21‧‧‧ Body Department

21a‧‧‧ Opening

22‧‧‧ 盖部

23‧‧‧ recess

24‧‧‧ gas inlet

25‧‧‧ check valve

26‧‧‧Exhaust port

27‧‧‧ check valve

28‧‧‧Flange

30‧‧‧Supply nozzle

31‧‧‧Exhaust nozzle

32‧‧‧Flow control device

33‧‧‧Decision Department

34‧‧‧Pipe

35‧‧‧Pipe

36‧‧‧Pipe

40‧‧‧ Purified gas source

41‧‧‧ Purified gas exhaust

66‧‧‧Reporting Department

F‧‧‧ Container

Fa‧‧‧ internal

Claims (8)

A purification device comprising: a flow rate control device for controlling a flow rate of a purge gas in a pipe connected to a container; and a determination unit for purifying the container according to an output signal of the flow rate control device Good or not. A purification apparatus according to claim 1, wherein the notification unit includes a notification unit that reports the determination result of the determination unit. The purification device according to claim 1 or 2, wherein the flow rate control device includes: a flow rate control gate that adjusts a flow rate of the purge gas in the pipe; and a flow meter that measures the flow rate The flow rate of the purge gas in the gate is controlled, and a signal indicating the state of the flow control gate or the detection result of the flow meter is output as the output signal. The purification device according to claim 3, wherein the flow rate control device outputs the applied voltage to the flow rate control gate as the output signal, and the determining unit determines that the applied voltage is lower than a predetermined value. Bad. The purification device according to the third aspect of the invention, wherein the determination unit determines whether the detection result of the flow rate is compared with a predetermined value to determine whether the opening degree of the flow rate control gate is set to a predetermined value. . The purifying device of claim 1, wherein the flow is The quantity control device outputs the output signal in accordance with an output command from the determination unit. A purification storage tank comprising: a purification device as claimed in claim 1; and a scaffold which holds the aforementioned container purified by the aforementioned purification device. A method for detecting a cleanup abnormality, comprising: a step of controlling a flow rate of a purge gas in a pipe connected to a vessel by a flow rate control device; and performing a purification of the container according to an output signal of the flow control device The step of the decision.