TW201629626A - Blue photosensitive resin composition for color filters and uses thereof - Google Patents
Blue photosensitive resin composition for color filters and uses thereof Download PDFInfo
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本發明係有關一種液晶顯示器之彩色濾光片用藍色感光性樹脂組成物及其所形成之彩色濾光片。特別是提供一種氧化銦錫(以下簡稱ITO)濺鍍適性與顏料分散性佳之彩色濾光片用藍色感光性樹脂組成物。 The present invention relates to a blue photosensitive resin composition for a color filter of a liquid crystal display and a color filter formed therefor. In particular, a blue photosensitive resin composition for a color filter excellent in sputtering suitability and pigment dispersibility of indium tin oxide (hereinafter referred to as ITO) is provided.
近年來平板顯示器包括液晶顯示器和有機電激發光顯示器已廣泛使用,其中彩色濾光片係應用於顯示器中,而為了順應目前節能之趨勢,提高液晶顯示器之亮度及對比度是必要的。目前用於感光性樹脂組成物中之彩色濾光片中之顏料係用於提高亮度和高對比度,例如,橋爪清「色材協會誌」(1967年12月、608頁)揭示一種分散呈色波長小於1/2之顏料粒徑的方法;然而,藍色顏料和其他的紅色、綠色顏料相比其波長較短,在此情況下,需要額外的精細分散,因而衍生出成本提高與分散後之安定性不佳等問題。 In recent years, flat panel displays, including liquid crystal displays and organic electroluminescent displays, have been widely used, in which color filters are used in displays, and in order to comply with current energy saving trends, it is necessary to increase the brightness and contrast of liquid crystal displays. The pigments currently used in color filters in photosensitive resin compositions are used to improve brightness and high contrast. For example, Knife Clear "Color Materials Association" (December 1967, 608) reveals a dispersion of color a method of wavelength of a pigment having a wavelength of less than 1/2; however, the blue pigment has a shorter wavelength than other red and green pigments, in which case additional fine dispersion is required, and thus the cost is increased and dispersed. Problems such as poor stability.
另一方面,作為著色劑之染料也在開發中,例如,日本專利特開第2008-304766號公報揭示一種三芳基甲烷衍生物之染料,然而其具有亮度及耐熱度不足之缺點,為了改善此缺點,日本專利特開第2011-132492及2011-133844號公報揭示針對三芳基甲烷鹽之陰離子進行特定結構之分子修飾;此外,為提高染料之耐熱性,日本專利 特開第2009-122650及開2010-134278號公報揭示一種具有抗氧化劑之感光性樹脂組成物。 On the other hand, a dye as a coloring agent is also under development. For example, Japanese Laid-Open Patent Publication No. 2008-304766 discloses a dye of a triarylmethane derivative, which has disadvantages of insufficient brightness and heat resistance, in order to improve this. Disadvantages, Japanese Patent Laid-Open No. 2011-132492 and No. 2011-133844 disclose molecular modification of a specific structure for an anion of a triarylmethane salt; in addition, in order to improve the heat resistance of the dye, a Japanese patent JP-A-2009-122650 and JP-A-2010-134278 disclose a photosensitive resin composition having an antioxidant.
雖然現有技術中提高了感光性樹脂組成物之亮度及對比度,然而,上述各先前技術之感光性樹脂組成物其ITO濺鍍適性及顏料分散性尚未能令業界所接受。有鑑於此,如何同時提升ITO濺鍍適性與顏料分散性,以達到目前業界之要求,為本發明所屬技術領域中努力研究之目標。 Although the brightness and contrast of the photosensitive resin composition have been improved in the prior art, the ITO sputtering suitability and pigment dispersibility of the above-mentioned prior art photosensitive resin compositions have not been accepted by the industry. In view of this, how to simultaneously improve the ITO sputtering suitability and pigment dispersibility to meet the requirements of the current industry is an object of diligent research in the technical field to which the present invention pertains.
本發明利用提供特殊鹼可溶性樹脂及特殊染料之成分,而得到ITO濺鍍適性及顏料分散性俱佳之彩色濾光片用藍色感光性樹脂組成物。 The present invention provides a blue photosensitive resin composition for a color filter excellent in ITO sputtering suitability and pigment dispersibility by providing a component of a special alkali-soluble resin and a special dye.
因此,本發明提供一種彩色濾光片用藍色感光性樹脂組成物,其包含:有機顏料(A);染料(B);鹼可溶性樹脂(C);乙烯性不飽和基之化合物(D);光起始劑(E);及有機溶劑(F);其中:該染料(B)包含具有式(I)所示結構之紅色染料(B-1):
式(I)中,B1至B4各自獨立表示氫、-B6、C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-SO3 -、-SO3H、-SO3M、-COOH、-COOB6、-SO3B6、-SO2NHB8或-SO2NB8B9取代之C6至C10之芳香烴基;B5表示-SO3 -、-SO3H、-SO3M、-COOH、-COOR6、-SO3R6、-SO2NHR8或-SO2NR8R9;s表示0至5之整數;當s表示2至5時,複數個B5為相同或不同;T表示鹵素原子;a表示0或1;B6表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基,其中該C1至C10之烷基或經鹵素原子取代之C1至C10之烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;B7表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基;B8及B9各自獨立表示C1至C10之直鏈烷基、C1至C10之支鏈烷基、C3至C30之環烷基、或-Q;其中,C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之氫原子係未經取代或經一取代基所取代,該取代基係選自由羥基、鹵素原子、-Q、-CH=CH2及-CH=CH-B6所組成之群;C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;或
B8和B9結合形成C1至C10之雜環基,其中C1至C10之雜環基中之氫原子係未經取代或經B6、-OH、或-Q所取代;Q表示C6至C10之芳香烴基、C5至C10之雜芳香基、經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2或-CH=CH-B6取代之C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2及-CH=CH-B6取代之C5至C10之雜芳香基;及M表示鉀或鈉;及該鹼可溶性樹脂(C)包含第一鹼可溶性樹脂(C-1),該第一鹼可溶性樹脂(C-1)具有式(II)所示之結構:
其中,L表示氫原子或C1至C30之有機基團。 Wherein L represents a hydrogen atom or an organic group of C 1 to C 30 .
本發明亦提供一種彩色濾光片之製造方法,其係使用前述之彩色濾光片用藍色感光性樹脂組成物形成一畫素層。 The present invention also provides a method of producing a color filter, which comprises forming a pixel layer using a blue photosensitive resin composition using the color filter described above.
本發明又提供一種彩色濾光片,其係由前述之方法所製得。 The present invention further provides a color filter which is produced by the aforementioned method.
本發明再提供一種液晶顯示裝置,係包含前述之彩色濾光片。 The present invention further provides a liquid crystal display device comprising the above-described color filter.
1‧‧‧感光性樹脂層 1‧‧‧Photosensitive resin layer
2‧‧‧偏光板 2‧‧‧Polar plate
3‧‧‧偏光板 3‧‧‧Polar plate
4‧‧‧光源 4‧‧‧Light source
5‧‧‧輝度計 5‧‧‧luminometer
圖1為感光性樹脂層對比測定狀態(一)之示意圖。 Fig. 1 is a schematic view showing a comparative measurement state (1) of a photosensitive resin layer.
圖2為感光性樹脂層對比測定狀態(二)之示意圖。 Fig. 2 is a schematic view showing the comparative measurement state (2) of the photosensitive resin layer.
本發明提供一種彩色濾光片用藍色感光性樹脂組成物,其包含:
有機顏料(A);染料(B);鹼可溶性樹脂(C);乙烯性不飽和基之化合物(D);光起始劑(E);及有機溶劑(F);其中:該染料(B)包含具有式(I)所示結構之紅色染料(B-1):
式(I)中,B1至B4各自獨立表示氫、-B6、C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-SO3 -、-SO3H、-SO3M、-COOH、-COOB6、-SO3B6、-SO2NHB8或-SO2NB8B9取代之C6至C10之芳香烴基;B5表示-SO3 -、-SO3H、-SO3M、-COOH、-COOR6、-SO3R6、-SO2NHR8或-SO2NR8R9;s表示0至5之整數;當s表示2至5時,複數個B5為相同或不同;T表示鹵素原子;a表示0或1;B6表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基,其中該C1至C10之烷基或經鹵素原子取代之C1至C10之烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;
B7表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基;B8及B9各自獨立表示C1至C10之直鏈烷基、C1至C10之支鏈烷基、C3至C30之環烷基、或-Q;其中,C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之氫原子係未經取代或經一取代基所取代,該取代基係選自由羥基、鹵素原子、-Q、-CH=CH2及-CH=CH-B6所組成之群;C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;或B8和B9結合形成C1至C10之雜環基,其中C1至C10之雜環基中之氫原子係未經取代或經B6、-OH、或-Q所取代;Q表示C6至C10之芳香烴基、C5至C10之雜芳香基、經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2或-CH=CH-B6取代之C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2及-CH=CH-B6取代之C5至C10之雜芳香基;及M表示鉀或鈉;及該鹼可溶性樹脂(C)包含第一鹼可溶性樹脂(C-1),該第一鹼可溶性樹脂(C-1)具有式(II)所示之結構:
其中,L表示氫原子或C1至C30之有機基團。 Wherein L represents a hydrogen atom or an organic group of C 1 to C 30 .
根據本發明之該有機顏料(A)係提供藍色顏料。 The organic pigment (A) according to the present invention provides a blue pigment.
於本發明之一具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該有機顏料(A)之使用量為50重量份至450重量份;較佳為60重量份至400重量份;更佳為70重量份至350重量份。 In one embodiment of the present invention, the organic pigment (A) is used in an amount of 50 parts by weight to 450 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C); preferably 60 parts by weight. Up to 400 parts by weight; more preferably 70 parts by weight to 350 parts by weight.
較佳地,該有機顏料(A)包含一以銅酞菁結構為主之藍色有機顏料(A-1)。該以銅酞菁結構為主之藍色顏料(A-1)可單獨或混合使用,且該以銅酞菁結構為主之藍色顏料(A-1)包含但不限於C.I.顏料藍15:1(C.I.PB15:1)、C.I.顏料藍15:2(C.I.PB15:2)、C.I.顏料藍15:3(C.I.PB15:3)、C.I.顏料藍15:4(C.I.PB15:4)、C.I.顏料藍15:5(C.I.PB15:5)、或C.I.顏料藍15:6(C.I.PB15:6)。 Preferably, the organic pigment (A) comprises a blue organic pigment (A-1) mainly composed of a copper phthalocyanine structure. The blue pigment (A-1) mainly composed of a copper phthalocyanine structure may be used singly or in combination, and the blue pigment (A-1) mainly composed of a copper phthalocyanine structure includes, but is not limited to, CI Pigment Blue 15: 1 (CIPB 15:1), CI Pigment Blue 15:2 (CIPB 15:2), CI Pigment Blue 15:3 (CIPB 15:3), CI Pigment Blue 15:4 (CIPB 15:4), CI Pigment Blue 15:5 (CIPB 15:5), or CI Pigment Blue 15:6 (CIPB 15:6).
於本發明之一具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該以銅酞菁結構為主之藍色有機顏料(A-1)之使用量為30重量份至300重量份;較佳為40重量份至270重量份;更佳為50重量份至250重量份。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the amount of the blue organic pigment (A-1) mainly composed of the copper phthalocyanine structure is 30 parts by weight. A portion to 300 parts by weight; preferably 40 parts by weight to 270 parts by weight; more preferably 50 parts by weight to 250 parts by weight.
較佳地,該當該有機顏料(A)進一步包含一紫色有機顏料(A-2)。該紫色顏料(A-2)可單獨或混合使用,且該紫色顏料(A-2)包含但不限於C.I.顏料紫14(C.I.PV14)、C.I.顏料紫19(C.I.PV19)、C.I.顏料紫23(C.I.PV23)、C.I.顏料紫29(C.I.PV29)、C.I.顏料紫32(C.I.PV32)、C.I.顏料紫33(C.I.PV33)、C.I.顏料紫36(C.I.PV36)、C.I.顏料紫37(C.I.PV37)、C.I.顏料紫38(C.I.PV38)、C.I.顏料紫40(C.I.PV40)、或C.I.顏料紫50(C.I.PV50)。 Preferably, the organic pigment (A) further comprises a purple organic pigment (A-2). The purple pigment (A-2) may be used singly or in combination, and the purple pigment (A-2) includes, but is not limited to, CI Pigment Violet 14 (CIPV14), CI Pigment Violet 19 (CIPV19), CI Pigment Violet 23 ( CIPV23), CI Pigment Violet 29 (CIPV29), CI Pigment Violet 32 (CIPV32), CI Pigment Violet 33 (CIPV33), CI Pigment Violet 36 (CIPV36), CI Pigment Violet 37 (CIPV37), CI Pigment Violet 38 (CIPV38), CI Pigment Violet 40 (CIPV40), or CI Pigment Violet 50 (CIPV50).
於本發明之一具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該紫色有機顏料(A-2)之使用量為0重量份至150重量份;較佳為5重量份至120重量份;更佳為10重量份至100重量份。 In one embodiment of the present invention, the purple organic pigment (A-2) is used in an amount of from 0 part by weight to 150 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (C); preferably 5 parts by weight to 120 parts by weight; more preferably 10 parts by weight to 100 parts by weight.
該有機顏料(A)可包含一(A-1)以外之藍色顏料(A-3)。 The organic pigment (A) may contain a blue pigment (A-3) other than (A-1).
該(A-1)以外之藍色顏料(A-3)包含但不限於C.I.顏料藍1、C.I.顏料藍21、C.I.顏料藍22、C.I.顏料藍60、C.I.顏料藍61、C.I.顏料藍64,或此等組合。該(A-1)以外之藍色顏料(A-3)可單獨或混合使用。 The blue pigment (A-3) other than the (A-1) includes, but is not limited to, CI Pigment Blue 1, CI Pigment Blue 21, CI Pigment Blue 22, CI Pigment Blue 60, CI Pigment Blue 61, CI Pigment Blue 64, Or such a combination. The blue pigment (A-3) other than the (A-1) may be used singly or in combination.
於本發明之另一具體例中,為調整色度,該有機顏料(A)可包含一以鹵化酞菁結構為主之綠色顏料。 In another embodiment of the present invention, in order to adjust the chromaticity, the organic pigment (A) may comprise a green pigment mainly composed of a halogenated phthalocyanine structure.
較佳地,該以鹵化酞菁結構為主之綠色顏料包含但不限於C.I.顏料綠07、C.I.顏料綠36、C.I.顏料綠37、C.I.顏料綠42、或C.I.顏料綠58。更佳地,該以鹵化酞菁結構為主之綠色顏料組份係為C.I.顏料綠07、C.I.顏料綠36、C.I.顏料綠37、C.I.顏料綠42、C.I.顏料綠58、或此等組合。該以鹵化酞菁結構為主之綠色顏料可單獨或混合使用。 Preferably, the green pigment mainly composed of a halogenated phthalocyanine structure includes, but not limited to, C.I. Pigment Green 07, C.I. Pigment Green 36, C.I. Pigment Green 37, C.I. Pigment Green 42, or C.I. Pigment Green 58. More preferably, the green pigment component mainly composed of a halogenated phthalocyanine structure is C.I. Pigment Green 07, C.I. Pigment Green 36, C.I. Pigment Green 37, C.I. Pigment Green 42, C.I. Pigment Green 58, or such combinations. The green pigment mainly composed of a halogenated phthalocyanine structure may be used singly or in combination.
根據本發明之染料(B)有助於提升該彩色濾光片用藍色感光性樹脂組成物之亮度,同時可輔助調整該彩色濾光片用藍色感光性樹脂組成物之色度。 The dye (B) according to the present invention contributes to the improvement of the brightness of the blue photosensitive resin composition for the color filter, and at the same time assists in adjusting the chromaticity of the blue photosensitive resin composition for the color filter.
較佳地,該染料(B)包含具有式(I)所示結構之紅色染料(B-1):
式(I)中,B1至B4各自獨立表示氫、-B6、C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-SO3 -、-SO3H、-SO3M、-COOH、-COOB6、-SO3B6、-SO2NHB8或-SO2NB8B9取代之C6至C10之芳香烴基;B5表示-SO3 -、-SO3H、-SO3M、-COOH、-COOR6、-SO3R6、-SO2NHR8或-SO2NR8R9;s表示0至5之整數;當s表示2至5時,複數個B5為相同或不同; T表示鹵素原子;a表示0或1;B6表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基,其中該C1至C10之烷基或經鹵素原子取代之C1至C10之烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;B7表示C1至C10之烷基或經鹵素原子取代之C1至C10之烷基;B8及B9各自獨立表示C1至C10之直鏈烷基、C1至C10之支鏈烷基、C3至C30之環烷基、或-Q;其中,C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之氫原子係未經取代或經一取代基所取代,該取代基係選自由羥基、鹵素原子、-Q、-CH=CH2及-CH=CH-B6所組成之群;C1至C10之直鏈烷基、C1至C10之支鏈烷基或C3至C30之環烷基中之-CH2-係未經置換或經置換為-O-、羰基或-NB7-;或B8和B9結合形成C1至C10之雜環基,其中C1至C10之雜環基中之氫原子係未經取代或經B6、-OH、或-Q所取代;Q表示C6至C10之芳香烴基、C5至C10之雜芳香基、經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2或-CH=CH-B6取代之C6至C10之芳香烴基、或經鹵素原子、-B6、-OH、-OB6、-NO2、-CH=CH2及-CH=CH-B6取代之C5至C10之雜芳香基;及M表示鉀或鈉。 In the formula (I), B 1 to B 4 each independently represent hydrogen, -B 6 , a C 6 to C 10 aromatic hydrocarbon group, or a halogen atom, -B 6 , -OH, -OB 6 , -SO 3 - , -SO 3 H, -SO 3 M, -COOH, -COOB 6 , -SO 3 B 6 , -SO 2 NHB 8 or -SO 2 NB 8 B 9 substituted C 6 to C 10 aromatic hydrocarbon group; B 5 represents -SO 3 - , -SO 3 H, -SO 3 M, -COOH, -COOR 6 , -SO 3 R 6 , -SO 2 NHR 8 or -SO 2 NR 8 R 9 ;s represents an integer from 0 to 5; When s represents 2 to 5, a plurality of B 5 are the same or different; T represents a halogen atom; a represents 0 or 1; B 6 represents a C 1 to C 10 alkyl group or a halogen atom substituted C 1 to C 10 the alkyl group, wherein the C 1 to C 10 alkyl group of the halogen atom or substituted C 1 to C 10 alkyl group of the in -CH 2 - not based substitution or replaced by -O-, or a carbonyl group -NB 7 -; B 7 represents C 1 to C 10 alkyl group of the halogen atom or substituted C 1 to C 10 alkyl group of; B 8 and B 9 represent each independently a straight chain of C 1 to C 10 -alkyl, C 1 a branched alkyl group to C 10 , a C 3 to C 30 cycloalkyl group, or -Q; wherein, a C 1 to C 10 linear alkyl group, a C 1 to C 10 branched alkyl group or C 3 to based hydrogen atom of the C 30 cycloalkyl group without taking the Or substituted by a substituent, the substituent group selected from the group consisting of a hydroxyl group, a halogen atom, -Q, -CH = CH 2 and -CH = CH-B consisting of 6; C straight chain alkyl of 1 to C 10 The -CH 2 - in the C 1 to C 10 branched alkyl group or the C 3 to C 30 cycloalkyl group is unsubstituted or substituted with -O-, carbonyl or -NB 7 -; or B 8 and B 9 combined to form a C 1 to C 10 heterocyclic group, the heterocyclic group wherein the C 1 to C 10 of a hydrogen atom in the unsubstituted or line B 6, -OH, substituted or -Q; Q represents C 6 to C 10 aromatic hydrocarbon group, the hetero-aromatic C 5 to C 10 group, the halogen atom, -B 6, -OH, -OB 6 , -NO 2, -CH = CH 2 or -CH = CH-B 6-substituted the C 6 to C 10 aromatic hydrocarbon group of, or a halogen atom, -B 6, -OH, -OB 6 , -NO 2, -CH = CH 2 and -CH = CH-B of the substituted C 6 to C 10. 5 a heteroaromatic group; and M represents potassium or sodium.
較佳地,B6包含但不限於甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、異戊基、新戊基(neopentyl)、環戊基、己基、環己基、庚基、環庚烷、辛基、環辛基、2-乙基己基、壬基、癸基、三環[5.3.0.03,10]癸基[tricycle(5.3.0.03,10)decanyl]、甲氧基丙基、己氧基丙基、2-乙基己氧基丙基、甲氧基己基、或環氧基丙基。 Preferably, B 6 includes, but is not limited to, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, Cyclohexyl, heptyl, cycloheptane, octyl, cyclooctyl, 2-ethylhexyl, decyl, decyl, tricyclo [5.3.0.0 3,10 ] fluorenyl [tricycle (5.3.0.0 3,10) Decanyl], methoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, or epoxypropyl.
較佳地,C6至C10之芳香烴基包含但不限於苯基或萘基 等。 Preferably, the C 6 to C 10 aromatic hydrocarbon group includes, but is not limited to, a phenyl group or a naphthyl group and the like.
較佳地,-SO3B6包含但不限於甲基磺醯基(methanesulfonyl)、乙基磺醯基(ethanesulfonyl)、己基磺醯基(hexanesulfonyl)、或癸基磺醯基(decanesulfonyl)。 Preferably, -SO 3 B 6 includes, but is not limited to, methanesulfonyl, ethanesulfonyl, hexanesulfonyl, or decanesulfonyl.
較佳地,-COOB6包含但不限於甲氧基羰基(methyloxycarbonyl)、乙氧基羰基(ethyloxycarbonyl)、丙氧基羰基、異丙氧基羰基、丁氧基羰基、異丁氧基羰基、戊氧基羰基、異戊氧基羰基、新戊氧基羰基、環戊氧基羰基、己氧基羰基、環己氧基羰基、庚氧基羰基、環庚氧基羰基、辛氧基羰基、環辛氧基羰基、2-乙基己氧基羰基、壬氧基羰基、癸氧基羰基、三環[5.3.0.03,10]癸基羰基、甲氧基丙氧基羰基、己氧基丙氧基羰基、2-乙基己氧基丙氧基羰基、或甲氧基己氧基羰基。 Preferably, -COOB 6 includes, but is not limited to, methyloxycarbonyl, ethyloxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, pentyl Oxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl, cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxycarbonyl, ring Octyloxycarbonyl, 2-ethylhexyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl, tricyclo[5.3.0.0 3,10 ]decylcarbonyl, methoxypropoxycarbonyl, hexyloxypropyl Oxycarbonyl, 2-ethylhexyloxypropoxycarbonyl, or methoxyhexyloxycarbonyl.
較佳地,-SO2NHB8包含但不限於胺磺醯基(sulfamoyl)、甲基胺磺醯基、乙基胺磺醯基、丙基胺磺醯基、異丙基胺磺醯基、丁基胺磺醯基、異丁基胺磺醯基、戊基胺磺醯基、異戊基胺磺醯基、新戊基胺磺醯基、環戊基胺磺醯基、己基胺磺醯基、環己基胺磺醯基、庚基胺磺醯基、環庚烷胺磺醯基、辛基胺磺醯基、環辛基胺磺醯基、2-乙基己基胺磺醯基、壬基胺磺醯基、癸基胺磺醯基、三環[5.3.0.03,10]癸基胺磺醯基、甲氧基丙基胺磺醯基、己氧基丙基胺磺醯基、2-乙基己氧基丙基胺磺醯基、甲氧基己基胺磺醯基、環氧基丙基胺磺醯基、1,5-二甲基己基胺磺醯基、丙氧基丙基胺磺醯基、異丙氧
基丙基胺磺醯基、3-苯基-1-甲基丙基胺磺醯基、、
較佳地,-SO2NB8B9包含但不限於、、
較佳地,該染料(B)包括一具有式(I-1)所示結構之紅色染料:
於式(I-1)中,B11至B14各自獨立表示氫、-B6、C6至C10之芳香 烴基、或經鹵素原子、-B6、-OH、-OB6、-SO3 -、-SO3H、-SO3Na、-COOH、-COOB6、-SO3B6、-SO2NHB8或-SO2NB8B9取代之C6至C10之芳香烴基;B15表示氫、-SO3 -、-SO3H、-SO2NHB8或-SO2NB8B9;B16表示-SO3 -、-SO3H、-SO2NHB8或-SO2NB8B9;T1表示鹵素原子;a1表示0或1。 In the formula (I-1), B 11 to B 14 each independently represent hydrogen, -B 6 , a C 6 to C 10 aromatic hydrocarbon group, or a halogen atom, -B 6 , -OH, -OB 6 , -SO a C 6 to C 10 aromatic hydrocarbon group substituted with 3 - , -SO 3 H, -SO 3 Na, -COOH, -COOB 6 , -SO 3 B 6 , -SO 2 NHB 8 or -SO 2 NB 8 B 9 ; B 15 represents hydrogen, -SO 3 - , -SO 3 H, -SO 2 NHB 8 or -SO 2 NB 8 B 9 ; B 16 represents -SO 3 - , -SO 3 H, -SO 2 NHB 8 or -SO 2 NB 8 B 9 ; T 1 represents a halogen atom; a 1 represents 0 or 1.
較佳地,該染料(B)包括一具有式(I-2)所示結構之紅色染料:
於式(I-2)中,B21至B24各自獨立表示氫、-B26、C6至C10之芳香烴基、或經鹵素原子、-B26、-OH、-OB26、-SO3 -、-SO3H、-SO3Na、-COOH、-COOB26、-SO3B26、或-SO2NHB28取代之C6至C10之芳香烴基;B25表示-SO3 -、-SO3Na、-COOH、-COOB26、-SO3H、或-SO2NHB28;s1表示0至5之整數;當s1表示2至5時,複數個B25為相同或不同;T2表示鹵素原子;a2表示0或1;B26表示C1至C10之烷基、或經鹵素原子或-OB27取代之C1至C10 之烷基;B27表示C1至C10之烷基;及B28表示氫、-B26、-COOB26、C6至C10之芳香烴基、或經-B26或-OB26取代之C6至C10之芳香烴基。 In the formula (I-2), B 21 to B 24 each independently represent hydrogen, -B 26 , a C 6 to C 10 aromatic hydrocarbon group, or a halogen atom, -B 26 , -OH, -OB 26 , -SO 3 - , -SO 3 H, -SO 3 Na, -COOH, -COOB 26 , -SO 3 B 26 , or -SO 2 NHB 28 substituted C 6 to C 10 aromatic hydrocarbon group; B 25 represents -SO 3 - , -SO 3 Na, -COOH, -COOB 26 , -SO 3 H, or -SO 2 NHB 28 ; s 1 represents an integer from 0 to 5; when s 1 represents 2 to 5, a plurality of B 25 are the same or Different; T 2 represents a halogen atom; a 2 represents 0 or 1; B 26 represents a C 1 to C 10 alkyl group; or a C 1 to C 10 alkyl group substituted by a halogen atom or -OB 27 ; B 27 represents C 1 to C 10 alkyl; and B 28 represents hydrogen, -B 26 , -COOB 26 , C 6 to C 10 aromatic hydrocarbon group, or C 6 to C 10 aromatic hydrocarbon group substituted by -B 26 or -OB 26 .
較佳地,該染料(B)包括一具有式(I-3)結構之紅色染料:
於式(I-3)中,B31及B32各自獨立表示苯基、或經鹵素原子、-B26、-OB26、-COOB26、-SO3B26、或-SO2NHB28取代之苯基;B33表示-SO3 -、或-SO2NHB28;B34表示氫、-SO3 -、或-SO2NHB28;T3表示鹵素原子;a3表示0或1;B26表示C1至C10之烷基、或經鹵素原子或-OB27取代之C1至C10之烷基;B27表示C1至C10之烷基;及B28表示氫、-B26、-COOB26、C6至C10之芳香烴基、或經-B26或-OB26取代之C6至C10之芳香烴基。 In the formula (I-3), B 31 and B 32 each independently represent a phenyl group, or are substituted by a halogen atom, -B 26 , -OB 26 , -COOB 26 , -SO 3 B 26 or -SO 2 NHB 28 Phenyl group; B 33 represents -SO 3 - or -SO 2 NHB 28 ; B 34 represents hydrogen, -SO 3 - or -SO 2 NHB 28 ; T 3 represents a halogen atom; a 3 represents 0 or 1; 26 represents a C 1 to C 10 alkyl group, the halogen atom or a substituted or -OB 27 of the C 1 to C 10 alkyl group of; B 27 represents a C 1 to C 10 alkyl group of; represents hydrogen and B 28, -B 26, -COOB 26, C 6 to C 10 aromatic hydrocarbon group, the -B 26, or by a substituted or -OB 26 of C 6 to C 10 aromatic hydrocarbon group of.
較佳地,該染料(B)包括一具有式(I-4)結構之紅色染料:
於式(I-4)中,B41及B42各自獨立表示苯基、或經-B26或-SO2NHB28取代之苯基;B43表示-SO3 -、或-SO2NHB28;T4表示鹵素原子;a4表示0或1;B26表示C1至C10之烷基、或經鹵素原子或-OB27取代之C1至C10之烷基;B27表示C1至C10之烷基;及B28表示氫、-B26、-COOB26、C6至C10之芳香烴基、或經-B26或-OB26取代之C6至C10之芳香烴基。 In the formula (I-4), B 41 and B 42 each independently represent a phenyl group or a phenyl group substituted with -B 26 or -SO 2 NHB 28 ; and B 43 represents -SO 3 - or -SO 2 NHB 28 ; T 4 represents a halogen atom; a 4 represents 0 or 1; B 26 represents a C 1 to C 10 alkyl group; or a C 1 to C 10 alkyl group substituted by a halogen atom or -OB 27 ; B 27 represents C 1 the alkyl to C 10; and B 28 represents a hydrogen, -B 26, -COOB 26, C 6 to C 10 aromatic hydrocarbon group, the -B 26, or by a substituted or -OB 26 of C 6 to C 10 aromatic hydrocarbon group of.
於本發明之具體例中,該染料(B)包含但不限於如下式(1)至式(31):
Rc及Rd各自獨立表示氫、-SO3 -、-COOH或-SO2NHB81; B81表示2-乙基己基;T表示鹵素原子;a表示0或1。 R c and R d each independently represent hydrogen, -SO 3 - , -COOH or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl; T represents a halogen atom; and a represents 0 or 1.
Re表示氫、-SO3 -、-COOH或-SO2NHB81;B81表示2-乙基己基;T表示鹵素原子;a表示0或1。 R e represents hydrogen, -SO 3 - , -COOH or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl; T represents a halogen atom; and a represents 0 or 1.
Re表示氫、-SO3 -、-COOH或-SO2NHB81;B81表示2-乙基己基;T表示鹵素原子;a表示0或1。 R e represents hydrogen, -SO 3 - , -COOH or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl; T represents a halogen atom; and a represents 0 or 1.
Rf、Rg及Rh各自獨立表示-SO3 -、-SO3Na或-SO2NHB81;B81表示2-乙基己基。 R f , R g and R h each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Rf、Rg及Rh各自獨立表示-SO3 -、-SO3Na或-SO2NHB81;B81表示2-乙基己基。 R f , R g and R h each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Ri、Rj及Rk各自獨立表示氫、-SO3 -、-SO3H或-SO2NHB81;B81表示2-乙基己基。 R i , R j and R k each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Ri、Rj及Rk各自獨立表示氫、-SO3 -、-SO3H或-SO2NHB81;B81表示2-乙基己基。 R i , R j and R k each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Rl、Rm及Rn各自獨立表示-SO3 -、-SO3Na或-SO2NHB81;B81表示2-乙基己基。 R l , R m and R n each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Rl、Rm及Rn各自獨立表示-SO3 -、-SO3Na或-SO2NHB81;B81表示2-乙基己基。 R l , R m and R n each independently represent -SO 3 - , -SO 3 Na or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Rp、Rq及Rr各自獨立表示氫、-SO3 -、-SO3H或-SO2NHB81;B81表示2-乙基己基。 R p , R q and R r each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
Rp、Rq及Rr各自獨立表示氫、-SO3 -、-SO3H或-SO2NHB81;B81表示2-乙基己基。 R p , R q and R r each independently represent hydrogen, -SO 3 - , -SO 3 H or -SO 2 NHB 81 ; B 81 represents 2-ethylhexyl.
本發明該染料(B)之較佳具體例為式(1)(Rc與Rd為-SO3 -,a為0)[C.I.酸性紅色染料52]、式(22)[C.I.酸性紅色染料289]、式(28)、式(31)、或此等之組合。 A preferred specific example of the dye (B) of the present invention is a formula (1) (R c and R d are -SO 3 - , a is 0) [CI acid red dye 52], formula (22) [CI acid red dye 289], formula (28), formula (31), or a combination of these.
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該染料(B-1)之使用量為10重量份至90重量份;較佳為13重量份至80重量份;更佳為15重量份至70重量份。當未使用染料(B-1)時,則由此藍色感光性樹脂組成物所製得畫素層之顏料分散性與對比不佳。 In a specific example of the present invention, the dye (B-1) is used in an amount of 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C); preferably 13 parts by weight. To 80 parts by weight; more preferably 15 parts by weight to 70 parts by weight. When the dye (B-1) is not used, the pigment dispersibility and contrast of the pixel layer produced by the blue photosensitive resin composition are not good.
於本發明之較佳具體例中,該染料(B)可進一步包含其它染料(B-2)。 In a preferred embodiment of the invention, the dye (B) may further comprise other dyes (B-2).
較佳地,該其它染料(B-2)包含一偶氮系染料或蒽醌系染料,其中該偶氮系染料包含但不限於酸性紅37、酸性紅180、直接紅28、直接紅83、活性紅17、活性紅120、分散紅58、鹼性紅18或媒介紅7(mordant red 7)等;該蒽醌系染料包含但不限於分散紅60等。上述其它染料一般可單獨或混合多種使用。 Preferably, the other dye (B-2) comprises an azo dye or an anthraquinone dye, wherein the azo dye includes, but is not limited to, acid red 37, acid red 180, direct red 28, direct red 83, Reactive Red 17, Reactive Red 120, Disperse Red 58, Alkaline Red 18 or Morden Red 7, etc.; the lanthanide dyes include, but are not limited to, Disperse Red 60 and the like. The above other dyes may generally be used singly or in combination of two or more.
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該染料(B)之使用量為10重量份至90重量份;較佳為13重量份至80重量份;更佳為15重量份至70重量份。 In a specific example of the present invention, the dye (B) is used in an amount of 10 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (C); preferably 13 parts by weight to 80 parts by weight. Parts by weight; more preferably 15 parts by weight to 70 parts by weight.
根據本發明之鹼可溶性樹脂(C)包含第一鹼可溶性樹脂(C-1),該第一鹼可溶性樹脂(C-1)具有式(II)所示之結構:
其中,L表示氫原子或C1至C30之有機基團。 Wherein L represents a hydrogen atom or an organic group of C 1 to C 30 .
前述式(II)中,L的具體例包含但不限於氫原子;鏈狀飽和烴基包含但不限於甲基、乙基、n-丙基、i-丙基、n-丁基、s-丁基、t-丁基、n-戊基、s-戊基、t-戊基、n-己基、s-己基、n-庚基、n-辛基、s-辛基、t-辛基、2-乙基己基、辛酸、壬基、癸基、十一烷基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基、十九烷基、二十烷基、絲氨酰基或三十烷基(melissyl);以烷氧基將鏈狀飽和烴基之一部份氫原子取代的烷氧基取代鏈狀飽和烴基,其中該烷氧基包含但不限於甲氧基乙基、甲氧基乙氧基乙基、甲氧乙氧乙氧乙基、3-甲氧基-丁基、乙氧基乙基、乙氧基乙氧基乙基、苯氧乙基或苯氧乙氧基乙基;以烴基將鏈狀飽和烴基之一部份氫原子取代的烴基取代鏈狀飽和烴基,其中該烴基包含但不限於羥乙基、羥丙基或羥丁基;以鹵素將鏈狀飽和烴基之一部份氫原子取代的鹵素取代鏈狀飽和烴基,其中該鹵素包含但不限於氟乙基、二氟乙基、氯乙基、二氯乙基、溴乙基或二溴乙基;鏈狀不飽和烴基包含但不限於乙烯基、烯丙基、甲基烯丙基、丁烯基或丙炔基,及以烷氧基、烴基或鹵素將其一部份氫原子取代的鏈狀不飽和烴基;脂環式烴基包含但不限於環戊基、環己基、4-甲基環己基、4-第三丁基環己基、三環癸基、異冰片基、金剛烷基或二環戊二烯基,及以烷氧基、烴基或鹵素將其一部份氫原子取代的脂環式烴基;及芳香族烴基包含但不限於苯基、甲基苯基、二甲基苯基、三甲基苯基、4-第三丁基苯基、芐基、二苯基甲基、二苯基乙基、三苯基甲基、肉桂基、 萘基或蒽基,及以烷氧基、烴基或鹵素將其一部份氫原子取代的芳香族烴基。其中,上述之有機基團可進一步鍵結取代基。於式(II)中,L可為相同,亦可為不同之兩種以上。 In the above formula (II), specific examples of L include, but are not limited to, hydrogen atoms; chain-like saturated hydrocarbon groups include, but are not limited to, methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl Base, t-butyl, n-pentyl, s-pentyl, t-pentyl, n-hexyl, s-hexyl, n-heptyl, n-octyl, s-octyl, t-octyl, 2-ethylhexyl, octanoic acid, decyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, ten An octaalkyl group, a nonadecyl group, an eicosyl group, a seryl group or a melissyl group; an alkoxy group substituted with a part of a hydrogen atom of a chain saturated hydrocarbon group by an alkoxy group a hydrocarbyl group, wherein the alkoxy group includes, but is not limited to, methoxyethyl, methoxyethoxyethyl, methoxyethoxyethoxyethyl, 3-methoxy-butyl, ethoxyethyl, Ethoxyethoxyethyl, phenoxyethyl or phenoxyethoxyethyl; a hydrocarbyl group substituted with a hydrocarbyl group substituted with a part of a hydrogen atom of a chain saturated hydrocarbon group, wherein the hydrocarbyl group includes but not Limited to hydroxyethyl, hydroxypropyl or hydroxybutyl; saturated with halogen a halogen-substituted chain saturated hydrocarbon group substituted with a partial hydrogen atom of a hydrocarbon group, wherein the halogen includes, but is not limited to, a fluoroethyl group, a difluoroethyl group, a chloroethyl group, a dichloroethyl group, a bromoethyl group or a dibromoethyl group; The chain unsaturated hydrocarbon group includes, but is not limited to, a vinyl group, an allyl group, a methallyl group, a butenyl group or a propynyl group, and a chain having a part of hydrogen atoms substituted by an alkoxy group, a hydrocarbon group or a halogen. An unsaturated hydrocarbon group; the alicyclic hydrocarbon group includes, but is not limited to, a cyclopentyl group, a cyclohexyl group, a 4-methylcyclohexyl group, a 4-tert-butylcyclohexyl group, a tricyclodecyl group, an isobornyl group, an adamantyl group or a bicyclic ring. a pentadienyl group, and an alicyclic hydrocarbon group substituted with a part of hydrogen atoms thereof by an alkoxy group, a hydrocarbon group or a halogen; and an aromatic hydrocarbon group including, but not limited to, a phenyl group, a methylphenyl group, a dimethylphenyl group, Trimethylphenyl, 4-tert-butylphenyl, benzyl, diphenylmethyl, diphenylethyl, triphenylmethyl, cinnamyl, A naphthyl or an anthracenyl group, and an aromatic hydrocarbon group substituted with a part of hydrogen atoms thereof by an alkoxy group, a hydrocarbon group or a halogen. Wherein, the above organic group may further bond a substituent. In the formula (II), L may be the same or two or more different types.
本發明之具有式(II)所示之結構之第一鹼可溶性樹脂(C-1)其單元含量可根據目的、用途或本發明之第一鹼可溶性樹脂之分子量而適當調整,一般而言,該重複結構單元含量為5至80mole%,較佳為10至70mol%,更佳為15至60mol%。 The unit content of the first alkali-soluble resin (C-1) having the structure represented by the formula (II) of the present invention can be appropriately adjusted depending on the purpose, the use or the molecular weight of the first alkali-soluble resin of the present invention, in general, The repeating structural unit content is from 5 to 80 mole%, preferably from 10 to 70 mol%, more preferably from 15 to 60 mol%.
雖不願為理論所限制,但咸信由於該第一鹼可溶性樹脂(C-1)之主鏈中具有一四氫呋喃環,且兩側為亞甲基,故可推定其具有優異之有色材料分散穩定性,原因在於該四氫呋喃環會與路易斯鹼(孤電子對之供體)作用,藉由該強鹼基之作用可以使有色材料與分散劑不相互干擾;再者,由於該四氫呋喃環具有路易斯鹼基,因此易與其他基材表面之官能基相互作用,而表現出良好之密接性。此外,由於四氫呋喃環具有氧捕捉性,故可降低使用熱或活性能量線之自由基硬化中的氧對自由基硬化之抑制,具有使表面硬化性及薄膜硬化性提升之優點。 Although it is not intended to be limited by theory, it is presumed that the first alkali-soluble resin (C-1) has a tetrahydrofuran ring in its main chain and is methylene on both sides, so it is presumed that it has excellent dispersing of colored materials. Stability, because the tetrahydrofuran ring acts with a Lewis base (donor pair of donors), and the strong base can prevent the colored material from dispersing with the dispersant; further, since the tetrahydrofuran ring has Lewis Bases, therefore, easily interact with functional groups on the surface of other substrates to exhibit good adhesion. Further, since the tetrahydrofuran ring has oxygen trapping property, it is possible to reduce the suppression of radical hardening by oxygen in the radical hardening using heat or active energy rays, and has an advantage of improving surface hardenability and film hardenability.
再者,由於四氫呋喃具有極廣泛之物質溶解之能力,因此常用於工業分析用或研究用之溶劑,故本發明之鹼可溶性樹脂具有優異之相容性、乾燥再溶解性之優點。 Further, since tetrahydrofuran has a very broad ability to dissolve substances, it is often used for industrial analysis or research, so the alkali-soluble resin of the present invention has excellent compatibility and dry resolubility.
本發明之第一鹼可溶性樹脂(C-1)係由包含式(III)所示之單體(c-1)聚合而得,當其聚合時,會以高比例生成上述式(II)所示之結構,因此其不易引起異常之高分子量化或凝膠化。 The first alkali-soluble resin (C-1) of the present invention is obtained by polymerizing the monomer (c-1) represented by the formula (III), and when it is polymerized, the above formula (II) is produced at a high ratio. The structure shown is such that it is less likely to cause abnormal polymerization or gelation.
其中,L表示氫原子或C1至C30之有機基團。 Wherein L represents a hydrogen atom or an organic group of C 1 to C 30 .
在上式(III)中,L的定義與式(II)中的L的定義相同,在此不另贅述。 In the above formula (III), the definition of L is the same as the definition of L in the formula (II), and will not be further described herein.
作為上述式(III)所示之單體(c-1)的具體例,可列舉如:α-烯丙氧基甲基丙烯酸、α-烯丙氧基甲基丙烯酸甲酯、α-烯丙氧基甲基丙烯酸乙酯、α-烯丙氧基甲基丙烯酸-n-丙酯、α-烯丙氧基甲基丙烯酸-i-丙酯、α-烯丙氧基甲基丙烯酸-n-丁酯、α-烯丙氧基甲基丙烯酸-s-丁酯、α-烯丙氧基甲基丙烯酸-t-丁酯、α-烯丙氧基甲基丙烯酸-n-戊酯、α-烯丙氧基甲基丙烯酸-s-戊酯、α-烯丙氧基甲基丙烯酸-t-戊酯、α-烯丙氧基甲基丙烯酸-n-己酯、α-烯丙氧基甲基丙烯酸-s-己酯、α-烯丙氧基甲基丙烯酸-n-庚酯、α-烯丙氧基甲基丙烯酸-n-辛酯、α-烯丙氧基甲基丙烯酸-s-辛酯、α-烯丙氧基甲基丙烯酸-t-辛酯、α-烯丙氧基甲基丙烯酸-2-乙基己酯、α-烯丙氧基甲基丙烯酸辛酸、α-烯丙氧基甲基丙烯酸壬酯、α-烯丙氧基甲基丙烯酸癸酯、α-烯丙氧基甲基丙烯酸十一烷酯、α-烯丙氧基甲基丙烯酸十二烷酯、α-烯丙氧基甲基丙烯酸十三烷酯、α-烯丙氧基甲基丙烯酸十四酯酯、α-烯丙氧基甲基丙烯酸十五烷酯、α-烯丙氧基甲基丙烯酸十六烷酯、α-烯丙氧基甲基丙烯酸十七烷酯、α-烯丙氧基甲基丙烯酸十八烷酯、α-烯丙氧基甲基丙烯酸十九烷酯、α-烯丙氧基甲基丙烯酸二十烷酯、α-烯丙氧基甲基丙烯酸絲氨酰酯(α-allyloxymethyl acrylic acid seryl)、α-烯丙氧基甲基丙烯酸三十烷酯、α-烯丙氧基甲基丙烯酸甲氧基乙酯、α-烯丙氧基甲基丙烯酸甲氧基乙氧基乙酯、α-烯丙氧基甲基丙烯酸甲氧基乙氧基乙氧基乙酯、α-烯丙氧基甲基丙烯酸-3-甲氧基丁酯、α-烯丙氧基甲基丙烯酸乙氧基乙酯、α-烯丙氧基甲基丙烯酸乙氧基乙氧基乙酯、α-烯丙氧基甲基丙烯酸苯氧乙酯、α-烯丙氧基甲基丙烯酸苯氧乙氧基乙酯、α-烯丙氧基甲基丙烯酸羥乙酯、α-烯丙氧基甲基丙烯酸羥丙酯、α-烯丙氧基 甲基丙烯酸羥丁酯、α-烯丙氧基甲基丙烯酸氟乙酯、α-烯丙氧基甲基丙烯酸二氟乙酯、α-烯丙氧基甲基丙烯酸氯乙酯、α-烯丙氧基甲基丙烯酸二氯乙酯、α-烯丙氧基甲基丙烯酸溴乙酯、α-烯丙氧基甲基丙烯酸二溴乙酯、α-烯丙氧基甲基丙烯酸乙烯酯、α-烯丙氧基甲基丙烯酸烯丙酯、α-烯丙氧基甲基丙烯酸甲基烯丙酯、α-烯丙氧基甲基丙烯酸丁烯酯、α-烯丙氧基甲基丙烯酸炔丙酯、α-烯丙氧基甲基丙烯酸環戊酯、α-烯丙氧基甲基丙烯酸環己酯、α-烯丙氧基甲基丙烯酸-4-甲基環己酯、α-烯丙氧基甲基丙烯酸-4-t-丁基環己酯、α-烯丙氧基甲基丙烯酸三環癸酯、α-烯丙氧基甲基丙烯酸異冰片酯、α-烯丙氧基甲基丙烯酸金剛烷酯、α-烯丙氧基甲基丙烯酸二環戊二烯酯、α-烯丙氧基甲基丙烯酸苯酯、α-烯丙氧基甲基丙烯酸甲基苯酯、α-烯丙氧基甲基丙烯酸二甲基苯酯、α-烯丙氧基甲基丙烯酸三甲基苯酯、α-烯丙氧基甲基丙烯酸-4-t-丁基苯基酯、α-烯丙氧基甲基丙烯酸芐酯、α-烯丙氧基甲基丙烯酸二苯基甲酯、α-烯丙氧基甲基丙烯酸二苯基乙酯、α-烯丙氧基甲基丙烯酸三苯基甲酯、α-烯丙氧基甲基丙烯酸肉桂酯、α-烯丙氧基甲基丙烯酸萘酯、α-烯丙氧基甲基丙烯酸蒽酯。上述式(III)所示之單體(c-1)一般可單獨或混合多種使用。 Specific examples of the monomer (c-1) represented by the above formula (III) include α-allyloxymethacrylic acid, α-allyloxymethyl methacrylate, and α-allyl. Ethyl methacrylate, α-allyloxymethacrylate-n-propyl ester, α-allyloxymethacrylic acid-i-propyl ester, α-allyloxymethyl methacrylate-n- Butyl ester, α-allyloxymethacrylic acid-s-butyl ester, α-allyloxymethyl methacrylate-t-butyl ester, α-allyloxymethyl acrylate-n-pentyl ester, α- Allyloxymethacrylic acid-s-pentyl ester, α-allyloxymethyl methacrylate-t-amyl ester, α-allyloxymethyl methacrylate-n-hexyl ester, α-allyloxymethyl Acrylic acid-s-hexyl ester, α-allyloxymethyl methacrylate-n-heptyl ester, α-allyloxy methacrylic acid-n-octyl ester, α-allyloxy methacrylic acid-s- Octyl ester, α-allyloxymethyl methacrylate-t-octyl ester, α-allyloxymethyl methacrylate 2-ethylhexyl ester, α-allyloxymethyl acrylate octanoic acid, α-allyl Oxyl methacrylate, α-allyloxymethyl methacrylate, α-allyloxymethyl undecyl methacrylate, α-allyloxymethyl Dodecyl acrylate, tridecyl α-allyloxymethacrylate, tetradecyl α-allyloxymethacrylate, pentadecyl α-allyloxymethacrylate, α- Allyloxy hexadecane methacrylate, heptadecyl α-allyloxymethyl methacrylate, octadecyl α-allyloxymethyl methacrylate, α-allyloxy methacrylic acid Nonaalkyl ester, α-allyloxymethyl methacrylate, α-allyloxymethyl acrylic acid seryl, α-allyloxy methacrylic acid Decamate, methoxyethyl α-allyloxymethacrylate, methoxyethoxyethyl α-allyloxymethacrylate, methoxyethyl α-allyloxymethacrylate Oxyethoxyethyl ester, α-allyloxymethyl methacrylate-3-methoxybutyl ester, α-allyloxyethyl methacrylate ethoxyethyl ester, α-allyloxy methacrylic acid Ethoxyethoxyethyl ester, phenoxyethyl α-allyloxy methacrylate, phenoxyethoxyethyl α-allyloxy methacrylate, hydroxy group α-allyloxymethyl methacrylate Ethyl ester, α-allyloxymethyl Hydroxypropyl acrylate, α- allyloxy Hydroxybutyl methacrylate, fluoroethyl α-allyloxy methacrylate, difluoroethyl α-allyloxy methacrylate, chloroethyl α-allyloxy methacrylate, α-ene Diethyl ethyl propyl methacrylate, bromoethyl α-allyloxy methacrylate, dibromoethyl α-allyloxy methacrylate, vinyl α-allyloxy methacrylate, Allyl α-allyloxymethacrylate, methyl allyl α-allyloxymethacrylate, butenyl α-allyloxymethacrylate, α-allyloxymethacrylic acid Propargyl propyl ester, cyclopentyl α-allyloxymethyl methacrylate, cyclohexyl α-allyloxymethacrylate, α-allyloxy methacrylate-4-methylcyclohexyl ester, α- Allyloxymethacrylate 4-t-butylcyclohexyl ester, α-allyloxy methacrylate tricyclodecyl ester, α-allyloxy isoamyl methacrylate, α-allyloxy Adamantyl methacrylate, dicyclopentadienyl α-allyloxymethyl methacrylate, phenyl α-allyloxy methacrylate, methyl phenyl acrylate α-allyloxymethyl methacrylate Alpha-allyloxymethyl methacrylate Phenyl ester, trimethylphenyl α-allyloxymethacrylate, 4-t-butylphenyl α-allyloxymethacrylate, benzyl α-allyloxymethyl methacrylate, Diphenylmethyl α-allyloxymethacrylate, diphenylethyl α-allyloxymethacrylate, triphenylmethyl α-allyloxymethacrylate, α-allyloxy Cyanyl methacrylate, naphthyl α-allyloxymethacrylate, and α-allyloxymethacrylate. The monomer (c-1) represented by the above formula (III) can be generally used singly or in combination of two or more.
該式(III)所示之單體(c-1)含量可根據目的、用途或本發明之鹼溶性樹脂之分子量而適當調整,一般而言,該單體之含量為5至80mole%,較佳為10至70mol%,更佳為15至60mol%。 The content of the monomer (c-1) represented by the formula (III) can be appropriately adjusted depending on the purpose, use, or molecular weight of the alkali-soluble resin of the present invention. Generally, the content of the monomer is 5 to 80 mole%. It is preferably from 10 to 70 mol%, more preferably from 15 to 60 mol%.
當本發明之第一鹼可溶性樹脂為高分子量時,即使式(II)所示之結構單元之含量較少亦有表現出性能(顏料分散性優異)之傾向,當為低分子量時,增加含量則容易表現出性能之傾向。此原因與每1條主鏈中所含的式(II)所示之結構單元之個數(以下,表示為平均官能基數)有關,該平均官能基數較佳為0.5以上,更佳為1.0以上,尤佳為2.0以上。其中,該平均官能基數之表示方式如下: 平均官能基數=A/P A:單位質量所含的式(II)所示之結構單元之莫耳數[mol/g];P:單位質量所含的第一鹼可溶性樹脂(C-1)之莫耳數[mol/g];若式(II)所示之結構單元種類有兩種以上,則A可由下列算式計算而得;A=ΣAX(X=1,2,3,...);AX=單位質量×(CX/100)/FX;AX:單位質量所含之第X(X=1,2,3,...)種式(II)所示之結構單元之莫耳數[mol/g];CX:單位質量所含之第X(X=1,2,3,...)種式(II)所示之結構單元之質量比例[質量%];FX:第X(X=1,2,3,...)種式(II)所示之結構單元之分子量[g/mol];P表示第一鹼可溶性樹脂(C-1)之數量平均分子量(Mn),如下式所示:P=單位質量/Mn;及Mn:第一鹼可溶性樹脂(C-1)之數量平均分子量。 When the first alkali-soluble resin of the present invention has a high molecular weight, even if the content of the structural unit represented by the formula (II) is small, there is a tendency to exhibit performance (excellent pigment dispersibility), and when it is a low molecular weight, the content is increased. It is easy to show a tendency to performance. This reason is related to the number of structural units represented by the formula (II) contained in each main chain (hereinafter referred to as the average number of functional groups), and the number of the average functional groups is preferably 0.5 or more, more preferably 1.0 or more. , especially good for 2.0 or more. Wherein, the average functional group number is expressed as follows: Average functional group number = A / PA: Moir number of the structural unit represented by the formula (II) contained per unit mass [mol/g]; P: contained in the unit mass The molar number of the first alkali-soluble resin (C-1) [mol/g]; if there are two or more types of structural units represented by the formula (II), A can be calculated by the following formula; A=ΣA X ( X = 1, 2, 3, ...); A X = unit mass × (C X / 100) / F X ; A X : the Xth of the unit mass (X = 1, 2, 3, .. .) Moir number of structural unit represented by formula (II) [mol/g]; C X : X (X = 1, 2, 3, ...) of formula (II) contained in unit mass Mass ratio of the structural unit shown [% by mass]; F X : molecular weight [g/mol] of the structural unit represented by the formula (II) of X (X = 1, 2, 3, ...); The number average molecular weight (Mn) of the first alkali-soluble resin (C-1) is represented by the following formula: P = unit mass / Mn; and Mn: the number average molecular weight of the first alkali-soluble resin (C-1).
因此,該平均官能基數之表示方式如下:平均官能基數=Mn×Σ{(CX/100)×(1/FX)}(X=1,2,3,...) Therefore, the average functional group number is expressed as follows: average functional group number = Mn × Σ {(C X / 100) × (1/F X )} (X = 1, 2, 3, ...)
再者,若式(III)所示之單體其環化率(由式(III)所示之單體形成式(II)所示之結構單元的比例)較高,則CX及FX如下所示:CX:反應之第X(X=1,2,3,...)種式(III)所示之單體相對於反應之所有單體的質量比例[質量%];FX:第X(X=1,2,3,...)種式(III)所示之單體之分子量[g/mol]。 Further, if the cyclization ratio of the monomer represented by the formula (III) (the ratio of the monomer represented by the formula (III) to the structural unit represented by the formula (II)) is high, C X and F X As shown below: C X : mass ratio of the monomer represented by the formula (III) of the reaction formula (III) to all monomers of the reaction [% by mass]; F X : molecular weight [g/mol] of the monomer represented by the formula (III) of X (X = 1, 2, 3, ...).
當聚合中所用之各單體之反應率(轉化率)皆高(例如 反應率為90mol%以上)時,則CX如下所示:CX:單體成分中之第X(X=1,2,3,...)種式(III)所示之單體之質量比例[質量%]。 When the reaction rate (conversion ratio) of each monomer used in the polymerization is high (for example, the reaction rate is 90 mol% or more), C X is as follows: C X : the Xth in the monomer component (X=1, 2, 3, ...) The mass ratio [% by mass] of the monomer represented by the formula (III).
基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該式(III)所示之單體(c-1)之使用量為5重量份至80重量份;較佳為10重量份至70重量份;更佳為15重量份至60重量份。 The monomer (c-1) represented by the formula (III) is used in an amount of 5 based on 100 parts by weight of the total of the monomers (c-1), (c-2) and (c-3). The parts by weight to 80 parts by weight; preferably 10 parts by weight to 70 parts by weight; more preferably 15 parts by weight to 60 parts by weight.
於本發明之具體例中,該第一鹼可溶性樹脂(C-1)係由式(III)所示之單體(c-1)、具有一個或一個以上羧酸基之乙烯性不飽和單體(c-2)與其他可共聚合之乙烯性不飽和單體(c-3)進行聚合反應而得。 In a specific example of the present invention, the first alkali-soluble resin (C-1) is a monomer (c-1) represented by the formula (III), and an ethylenically unsaturated monomer having one or more carboxylic acid groups. The compound (c-2) is obtained by polymerization with another copolymerizable ethylenically unsaturated monomer (c-3).
該具有一個或一個以上羧酸基之乙烯性不飽和單體(c-2)可包含但不限於不飽和單羧酸單體、不飽和多羧酸單體、具有不飽和基及一個羧酸基之多環單體,或具有不飽和基及多個羧酸基之多環單體。 The ethylenically unsaturated monomer (c-2) having one or more carboxylic acid groups may include, but is not limited to, an unsaturated monocarboxylic acid monomer, an unsaturated polycarboxylic acid monomer, an unsaturated group, and a carboxylic acid. a polycyclic monomer, or a polycyclic monomer having an unsaturated group and a plurality of carboxylic acid groups.
該不飽和單羧酸單體可包含但不限於(甲基)丙烯酸、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、2-(甲基)丙烯醯乙氧基丁二酸酯(2-methacryloyloxyethyl succinate monoester)、2-(甲基)丙烯醯乙氧基六氫化苯二甲酸酯、2-(甲基)丙烯醯乙氧基苯二甲酸酯或omega-羧基聚己內酯多元醇單丙烯酸酯等。該omega-羧基聚己內酯多元醇單丙烯酸酯可為東亞合成製造,型號為ARONIX M-5300之商品。 The unsaturated monocarboxylic acid monomer may include, but is not limited to, (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, ethacrylic acid, cinnamic acid, 2-(methyl)acrylic acid ethoxylated succinate (2-methacryloyloxyethyl succinate monoester), 2-(meth) propylene oxime ethoxy hexahydrophthalate, 2-(meth) propylene ethoxy ethoxylate or omega-carboxy condensate Ester polyol monoacrylate and the like. The omega-carboxypolycaprolactone polyol monoacrylate can be manufactured by East Asia Synthetic, model ARONIX M-5300.
該不飽和多羧酸單體可包含但不限於馬來酸、富馬酸、甲基富馬酸、衣康酸或檸康酸等。 The unsaturated polycarboxylic acid monomer may include, but is not limited to, maleic acid, fumaric acid, methyl fumaric acid, itaconic acid or citraconic acid, and the like.
該具有不飽和基及一個羧酸基之多環單體可包含但不限於5-羧基雙環[2.2.1]庚-2-烯、5-羧基-5-甲基雙環[2.2.1]庚-2-烯、5-羧基-5-乙基雙環[2.2.1]庚-2-烯、5-羧基-6-甲基雙環 [2.2.1]庚-2-烯或5-羧基-6-乙基雙環[2.2.1]庚-2-烯等。 The polycyclic monomer having an unsaturated group and a carboxylic acid group may include, but is not limited to, 5-carboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2.1]g 2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo [2.2.1] Hept-2-ene or 5-carboxy-6-ethylbicyclo[2.2.1]hept-2-ene and the like.
該具有不飽和基及多個羧基的多環單體可例如5,6-二羧基二環[2.2.1]庚-2-烯等。 The polycyclic monomer having an unsaturated group and a plurality of carboxyl groups may be, for example, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene or the like.
上述之不飽和羧酸單體可單獨一種或混合複數種使用。 The above unsaturated carboxylic acid monomers may be used singly or in combination of plural kinds.
較佳地,該不飽和羧酸單體是選自於丙烯酸、甲基丙烯酸、2-甲基丙烯醯乙氧基丁二酸酯、2-甲基丙烯醯基乙氧基六氫化苯二甲酸酯,或上述單體之任意組合。 Preferably, the unsaturated carboxylic acid monomer is selected from the group consisting of acrylic acid, methacrylic acid, 2-methylpropenyl ethoxy succinate, 2-methylpropenyl ethoxy hexahydro phthalate An acid ester, or any combination of the above monomers.
該不飽和羧酸酐單體可包含但不限於不飽和羧酸酐單體或具有不飽和基與羧酸酐的多環單體。 The unsaturated carboxylic anhydride monomer may include, but is not limited to, an unsaturated carboxylic anhydride monomer or a polycyclic monomer having an unsaturated group and a carboxylic anhydride.
該不飽和羧酸酐單體可包含但不限於馬來酸酐、富馬酸酐、甲基富馬酸酐、衣康酸酐或檸康酸酐等。該具有不飽和基及羧酸酐的多環單體可包含但不限於5,6-二羧酸酐二環[2.2.1]庚-2-烯等。 The unsaturated carboxylic anhydride monomer may include, but is not limited to, maleic anhydride, fumaric anhydride, methyl fumaric anhydride, itaconic anhydride or citraconic anhydride, and the like. The polycyclic monomer having an unsaturated group and a carboxylic anhydride may include, but is not limited to, 5,6-dicarboxylic anhydride bicyclo[2.2.1]hept-2-ene and the like.
該不飽和羧酸酐單體可單獨一種或混合複數種使用。 The unsaturated carboxylic anhydride monomer may be used singly or in combination of plural kinds.
較佳地,該不飽和羧酸酐單體為馬來酸酐。 Preferably, the unsaturated carboxylic anhydride monomer is maleic anhydride.
基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該具有一個或一個以上羧酸基之乙烯性不飽和單體(c-2)之使用量為5重量份至50重量份;較佳為7重量份至45重量份;更佳為10重量份至40重量份。 The ethylenically unsaturated monomer having one or more carboxylic acid groups (c-2) based on 100 parts by weight of the total of the monomers (c-1), (c-2) and (c-3) used. The amount used is 5 parts by weight to 50 parts by weight; preferably 7 parts by weight to 45 parts by weight; more preferably 10 parts by weight to 40 parts by weight.
該其他可共聚合之乙烯性不飽和單體(c-3)可包含但不限於(甲基)丙烯酸烷基酯、(甲基)丙烯酸脂環族酯、(甲基)丙烯酸芳基酯、不飽和二羧酸酯、(甲基)丙烯酸羥烷酯、具有(甲基)丙烯酸酯基的聚醚、苯乙烯單體或上述單體以外的不飽和單體。 The other copolymerizable ethylenically unsaturated monomer (c-3) may include, but is not limited to, an alkyl (meth)acrylate, an alicyclic (meth)acrylate, an aryl (meth)acrylate, An unsaturated dicarboxylic acid ester, a hydroxyalkyl (meth)acrylate, a polyether having a (meth) acrylate group, a styrene monomer or an unsaturated monomer other than the above monomers.
上述之(甲基)丙烯酸烷基酯可包含但不限於(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁基酯或(甲基)丙烯酸第三丁基酯等。 The above alkyl (meth)acrylate may include, but is not limited to, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, ( N-butyl acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate or t-butyl (meth)acrylate.
上述之(甲基)丙烯酸脂環族酯可包含但不限於(甲基)丙烯酸環己酯、(甲基)丙烯酸-2-甲基環己酯、(甲基)丙烯酸雙環戊酯{或稱三環[5.2.1.02,6]癸-8-基(甲基)丙烯酸酯}、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸異冰片酯或(甲基)丙烯酸四氫呋喃酯等。 The above (meth) acrylate cycloaliphatic ester may include, but is not limited to, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, dicyclopentyl (meth) acrylate {or Tricyclo [5.2.1.0 2,6 ]癸-8-yl (meth) acrylate}, dicyclopentyloxy (meth) acrylate, isobornyl (meth) acrylate or (meth) acrylate Tetrahydrofuran ester and the like.
上述(甲基)丙烯酸芳基酯可包含但不限於(甲基)丙烯酸苯基酯或甲基丙烯酸苯甲酯等。 The above aryl (meth)acrylate may include, but is not limited to, phenyl (meth)acrylate or benzyl methacrylate.
該不飽和二羧酸酯可包含但不限於馬來酸二乙酯、富馬酸二乙酯或衣康酸二乙酯等。 The unsaturated dicarboxylic acid ester may include, but is not limited to, diethyl maleate, diethyl fumarate or diethyl itaconate, and the like.
該(甲基)丙烯酸羥烷酯可包含但不限於(甲基)丙烯酸-2-羥基乙酯或(甲基)丙烯酸-2-羥基丙酯等。 The hydroxyalkyl (meth)acrylate may include, but is not limited to, 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate, and the like.
該具有(甲基)丙烯酸酯基的聚醚可包含但不限於聚乙二醇單(甲基)丙烯酸酯或聚丙二醇單(甲基)丙烯酸酯等。 The (meth) acrylate group-containing polyether may include, but is not limited to, polyethylene glycol mono(meth) acrylate or polypropylene glycol mono (meth) acrylate, and the like.
該苯乙烯系單體可包含但不限於苯乙烯、α-甲基苯乙烯、間-甲基苯乙烯,對-甲基苯乙烯或對-甲氧基苯乙烯等。 The styrene monomer may include, but is not limited to, styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene or p-methoxystyrene.
上述單體以外之不飽和單體可包含但不限於丙烯腈、甲基丙烯腈、氯乙烯、偏二氯乙烯、丙烯醯胺、甲基丙烯醯胺、乙烯乙酯、1,3-丁二烯、異戊二烯、2,3-二甲基1,3-丁二烯、N-環己基馬來醯亞胺、N-苯基馬來醯亞胺、N-芐基馬來醯亞胺、N-丁二醯亞胺基-3-馬來醯亞胺苯甲酸酯、N-丁二醯亞胺基-4-馬來醯亞胺丁酸酯、N-丁二醯亞胺基-6-馬來醯亞胺己酸酯、N-丁二醯亞胺基-3-馬來醯亞胺丙酸酯或N-(9-吖啶基)馬來 醯亞胺等。 The unsaturated monomer other than the above monomers may include, but not limited to, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl ethyl ester, 1,3-butyl Alkene, isoprene, 2,3-dimethyl1,3-butadiene, N-cyclohexylmaleimide, N-phenylmaleimide, N-benzylmalayiya Amine, N-butyl succinimide-3-maleimide benzoate, N-butyl succinimide-4-maleimide butyrate, N-butylimine -6-maleimide caproate, N-butylenediamine-3-maleimide propionate or N-(9-acridinyl) mala 醯imine and so on.
該其他可共聚合之乙烯性不飽和單體(c-3)可單獨一種或混合複數種使用。 The other copolymerizable ethylenically unsaturated monomer (c-3) may be used singly or in combination of plural kinds.
較佳地,該其他可共聚合之乙烯性不飽和單體(c-3)是選自於(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸第三丁基酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸雙環戊酯、甲基丙烯酸異冰片酯、(甲基)丙烯酸二環戊氧基乙酯、苯乙烯、對-甲氧基苯乙烯或上述單體之任意組合。 Preferably, the other copolymerizable ethylenically unsaturated monomer (c-3) is selected from the group consisting of methyl (meth)acrylate, butyl (meth)acrylate, and 2-hydroxyethyl (meth)acrylate. Ester, tert-butyl (meth)acrylate, benzyl (meth)acrylate, dicyclopentanyl (meth)acrylate, isobornyl methacrylate, dicyclopentyloxyethyl (meth)acrylate , styrene, p-methoxystyrene or any combination of the above monomers.
基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該其他可共聚合之乙烯性不飽和單體(c-3)之使用量為10重量份至90重量份;較佳為15重量份至80重量份;更佳為20重量份至70重量份。 The amount of the other copolymerizable ethylenically unsaturated monomer (c-3) used based on the total amount of the monomers (c-1), (c-2), and (c-3) used is 100 parts by weight. It is 10 parts by weight to 90 parts by weight; preferably 15 parts by weight to 80 parts by weight; more preferably 20 parts by weight to 70 parts by weight.
上述聚合方法可根據目的或用途而適當選擇,例如:本體聚合、溶液聚合、乳化聚合等習知聚合之方法,較佳為溶液聚合,其分子量等之結構調整容易,故有利於工業上使用;再者,該聚合機制包括使用自由基聚合起始劑、陰離子聚合起始劑、陽離子聚合起始劑起始劑、配位聚合起始劑等習知聚合之方法,其中,該當使用自由基聚合起始劑時,其環化率(由式(III)所示之單體形成式(II)所示之結構單元的比例)越高則越利於工業上使用。 The above polymerization method can be appropriately selected depending on the purpose or use, for example, a conventional polymerization method such as bulk polymerization, solution polymerization, or emulsion polymerization, preferably solution polymerization, and the structural adjustment of the molecular weight or the like is easy, so that it is advantageous for industrial use; Further, the polymerization mechanism includes a conventional polymerization method using a radical polymerization initiator, an anionic polymerization initiator, a cationic polymerization initiator initiator, a coordination polymerization initiator, etc., wherein a radical polymerization is used. In the case of the initiator, the higher the cyclization rate (the ratio of the monomer represented by the formula (III) to the structural unit represented by the formula (II)), the more advantageous it is to industrial use.
作為上述單體成分之聚合起始方法,可採用習知方法進行,例如,自熱、電磁波(紅外線、紫外線、X射線等)或電子束等能量元將聚合所需知能量提供給單體成份即可,較佳為併用聚合起始劑,藉此可減少聚合起始所需能量且較易控制該反應。 The polymerization initiation method of the above monomer component can be carried out by a conventional method, for example, self-heating, electromagnetic waves (infrared rays, ultraviolet rays, X-rays, etc.) or electron beams and the like to supply the desired energy for polymerization to the monomer component. Preferably, a polymerization initiator is preferably used in combination, whereby the energy required for the initiation of polymerization can be reduced and the reaction can be controlled more easily.
作為控制上述分子量之方法可藉由控制聚合起始劑、聚和溫度、鏈轉移劑等習知之方法來進行調整。 The method for controlling the above molecular weight can be adjusted by a conventional method such as controlling a polymerization initiator, a polymerization temperature, and a chain transfer agent.
當單體採取溶液聚合方法時,該聚合中所使用之溶劑只要根據所使用之單體之種類或量、聚合溫度、聚合濃度等聚合條件適當設定即可,並無特別限制。 When the monomer is subjected to the solution polymerization method, the solvent to be used in the polymerization is not particularly limited as long as it is appropriately set depending on the polymerization conditions such as the kind or amount of the monomer to be used, the polymerization temperature, and the polymerization concentration.
該溶劑之具體例可包含但不限於單醇類,例如:甲醇、乙醇、異丙醇、n-丁醇、s-丁醇等;醇類,例如:乙二醇、丙二醇等;環醚類,例如:四氫呋喃、二惡烷等;乙二醇單乙醚類,例如:乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、二甘醇單甲醚、二甘醇單乙基醚、二甘醇單丁醚、丙二醇單甲醚、丙二醇單乙基醚、丙二醇單丁醚、3-甲氧基丁醇等;乙二醇醚類,例如:乙二醇二甲醚、乙二醇二乙醚、乙二醇乙基甲基醚、二甘醇二甲醚、二甘醇二乙醚、二乙二醇乙基甲基醚、丙二醇二甲醚、丙二醇二乙醚等;乙二醇單甲醚酯類,例如:乙二醇單甲基醚乙酸酯、乙二醇單乙醚醋酸酯、乙二醇單丁醚乙酸酯、二甘醇單甲醚乙酸酯、二甘醇單乙醚醋酸酯、二甘醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚醋酸酯、丙二醇單丁醚乙酸酯、二丙二醇單甲基醚乙酸酯、二丙二醇單乙醚乙酸酯、二丙二醇單甲基醚乙酸酯、3-甲氧基丁酸酯等;烷基酯類,例如:乙酸甲酯、乙酸乙酯、乙酸丙酯、異丙酯、乙酸丁酯、丙酸甲酯、丙酸乙酯、丙酸丁酯、乳酸甲酯、乳酸乙酯、乳酸丁酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酰乙酸甲酯、乙酰乙酸乙酯等;酮類類,例如:丙酮、甲基乙基酮、甲基異丁基酮、環己酮等;芳香烴類,例如:苯、甲苯、二甲苯、乙苯等;脂肪烴類,例如:正己烷、環己烷、辛烷等;酰胺類,例如:二甲基甲酰胺、二甲基乙酰胺、N-甲基吡咯烷酮等。上述之溶劑可單獨一種或混合複數種使用。 Specific examples of the solvent may include, but are not limited to, monoalcohols such as methanol, ethanol, isopropanol, n-butanol, s-butanol, etc.; alcohols such as ethylene glycol, propylene glycol, etc.; cyclic ethers For example: tetrahydrofuran, dioxane, etc.; ethylene glycol monoethyl ether, such as: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol single Ethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, 3-methoxybutanol, etc.; glycol ethers, for example: ethylene glycol dimethyl ether , ethylene glycol diethyl ether, ethylene glycol ethyl methyl ether, diglyme, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, etc.; Glycol monomethyl ether esters, for example: ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether acetate, two Glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol Methyl ether acetate, dipropylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, 3-methoxybutyrate, etc.; alkyl esters, such as methyl acetate, ethyl acetate, Propyl acetate, isopropyl ester, butyl acetate, methyl propionate, ethyl propionate, butyl propionate, methyl lactate, ethyl lactate, butyl lactate, methyl 3-methoxypropionate, 3 - ethyl methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl acetoacetate, ethyl acetoacetate, etc.; ketones, for example: acetone, methyl Ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.; aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, etc.; aliphatic hydrocarbons such as n-hexane, cyclohexane, octane, etc.; Amides such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. The above solvents may be used singly or in combination of plural kinds.
基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該溶劑之使用量為40重量份至1000重量份;較佳為100重量份至 400重量份。 The solvent is used in an amount of 40 parts by weight to 1000 parts by weight, based on 100 parts by weight of the total of the monomers (c-1), (c-2) and (c-3); preferably 100 parts by weight. to 400 parts by weight.
該自由基聚合起始劑只要能供給熱能而產生自由基者即可,並無特別限制,其中,藉由熱而產生自由基之聚合起始劑較有利於工業上使用。 The radical polymerization initiator is not particularly limited as long as it can supply heat energy to generate a radical, and a polymerization initiator which generates a radical by heat is advantageous for industrial use.
該自由基聚合起始劑之具體例可包含但不限於異丙苯過氧化氫、二異丙基苯氫過氧化物、2-t-丁基過氧化物、過氧化月桂酰、過氧化苯甲酰、t-丁基過氧化異丙基碳酸酯、t-丁基過氧化-2-己酸乙酯、偶氮二異丁腈、1,1'-偶氮二(環己烷腈)、2,2'-偶氮雙(2,4-二甲基)、2,2'-偶氮二(2-甲基丙酸酯)、過氧化氫、過硫酸鹽等。上述之自由基聚合起始劑可單獨一種或混合複數種使用。同時,該自由基聚合起始劑可與過度金屬鹽類或胺類一起併用。 Specific examples of the radical polymerization initiator may include, but are not limited to, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2-t-butyl peroxide, lauroyl peroxide, and benzoyl peroxide. Formyl, t-butylperoxyisopropyl carbonate, t-butylperoxy-2-hexanoate ethyl ester, azobisisobutyronitrile, 1,1'-azobis(cyclohexanecarbonitrile) 2,2'-azobis(2,4-dimethyl), 2,2'-azobis(2-methylpropionate), hydrogen peroxide, persulfate, and the like. The above-mentioned radical polymerization initiators may be used singly or in combination of plural kinds. Meanwhile, the radical polymerization initiator may be used in combination with an excessive metal salt or an amine.
該自由基聚合起始劑之使用量只要根據所使用之單體之種類或量、聚合溫度、聚合濃度等聚合條件適當設定即可,並無特別限制。然而為獲得重量平均分子量為數千至數萬之聚合物,基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該自由基聚合起始劑之使用量較佳為0.05重量份至20重量份;更佳為0.1重量份至15重量份。 The amount of the radical polymerization initiator to be used is not particularly limited as long as it is appropriately set depending on the polymerization conditions such as the type or amount of the monomer to be used, the polymerization temperature, and the polymerization concentration. However, in order to obtain a polymer having a weight average molecular weight of several thousands to several tens of thousands, the radical polymerization is based on the total amount of the monomers (c-1), (c-2) and (c-3) used in an amount of 100 parts by weight. The starting agent is preferably used in an amount of from 0.05 part by weight to 20 parts by weight; more preferably from 0.1 part by weight to 15 parts by weight.
在聚合過程中必要時,可使用併用鏈轉移劑,其中當使用鏈轉移劑時,會有抑制反應中聚合物之分子量分布以避免其凝膠化之傾向。該鏈轉移劑之具體例可包含但不限於巰基乙酸、3-巰基丙酸等巰基羧酸類;巰基乙酸甲酯、3-巰基丙酸甲酯、3-巰基丙酸-2-乙基己酯、3-巰基丙酸-n-辛酯、3-巰基丙酸甲氧基丁酯、3-巰基丙酸硬脂酯、三羥甲基丙烷三(3-巰基丙酸酯)、季戊四醇四(3-巰基丙酸酯)、二季戊四醇六(3-巰基丙酸酯)等巰基羧酸酯類;乙硫醇、t-丁基硫醇、n-十二烷基硫醇、1,2-二巰基乙烷等烷基硫醇類;2-巰基乙醇、4-巰基-1-丁醇等巰基醇類;苯硫醇、m-甲苯硫醇、p-甲苯硫醇、 2-萘硫醇等芳香族硫醇類;三[(3-巰基丙酰氧基)-乙基]異氰脲酸酯等巰基異氰脲酸酯類。 A chain transfer agent may be used in combination during the polymerization, wherein when a chain transfer agent is used, there is a tendency to suppress the molecular weight distribution of the polymer in the reaction to prevent gelation. Specific examples of the chain transfer agent may include, but are not limited to, mercaptocarboxylic acids such as mercaptoacetic acid and 3-mercaptopropionic acid; methyl mercaptoacetate, methyl 3-mercaptopropionate, 2-ethylhexyl propionate-2-ethylhexyl ester , 3-mercaptopropionic acid-n-octyl ester, 3-mercaptopropionic acid methoxybutyl ester, 3-mercaptopropionic acid stearyl ester, trimethylolpropane tris(3-mercaptopropionate), pentaerythritol tetra ( Mercaptocarboxylic acid esters such as 3-mercaptopropionate, dipentaerythritol hexa(3-mercaptopropionate); ethanethiol, t-butyl mercaptan, n-dodecyl mercaptan, 1,2- Alkyl mercaptans such as dimercaptoethane; mercapto alcohols such as 2-mercaptoethanol and 4-mercapto-1-butanol; phenyl mercaptan, m-toluene mercaptan, p-toluene mercaptan, An aromatic thiol such as 2-naphthylthiol or a fluorenyl isocyanurate such as tris[(3-mercaptopropionyloxy)-ethyl]isocyanurate.
作為上述鏈轉移劑,亦可使用具有硫基之化合物以外之鏈轉移劑,例如:2-羥基乙基二硫化物、四乙基秋蘭姆二硫化物(tetraethyl thiuram disulfide)等二硫化物;二乙基二芐等二硫代胺基甲酸酯類;α-甲基苯乙烯二聚物等單體二聚物類;四溴化碳等鹵代烷類。上述鏈轉移劑就獲取性、防交聯能力、降低聚合速度之程度較小等而言,較佳為巰基羧酸類、巰基羧酸酯類、烷基硫醇類、巰基醇類、芳香族硫醇類、巰基異氰脲酸酯類等具有巰基之化合物。上述之鏈轉移劑可單獨一種或混合複數種使用。 As the chain transfer agent, a chain transfer agent other than a compound having a sulfur group, for example, a disulfide such as 2-hydroxyethyl disulfide or tetraethyl thiuram disulfide; Dithiocarbamate such as diethyldibenzyl; monomeric dimers such as α-methylstyrene dimer; and halogenated alkane such as carbon tetrabromide. The chain transfer agent is preferably a mercaptocarboxylic acid, a mercaptocarboxylic acid ester, an alkyl mercaptan, a mercapto alcohol, or an aromatic sulfur in terms of availability, anti-crosslinking ability, and a low degree of polymerization. A compound having a mercapto group such as an alcohol or a mercapto isocyanurate. The above chain transfer agents may be used singly or in combination of plural kinds.
該鏈轉移劑之使用量只要根據所使用之單體之種類或量、聚合溫度、聚合濃度等聚合條件適當設定即可,並無特別限制。然而為獲得重量平均分子量為數千至數萬之聚合物,基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該鏈轉移劑之使用量較佳為0.1重量份至20重量份;更佳為0.5重量份至15重量份。 The amount of the chain transfer agent used is not particularly limited as long as it is appropriately set depending on the polymerization conditions such as the type or amount of the monomer to be used, the polymerization temperature, and the polymerization concentration. However, in order to obtain a polymer having a weight average molecular weight of several thousands to several tens of thousands, the chain transfer agent is based on the total amount of the monomers (c-1), (c-2) and (c-3) used in an amount of 100 parts by weight. The amount used is preferably from 0.1 part by weight to 20 parts by weight; more preferably from 0.5 part by weight to 15 parts by weight.
上述聚合反應之進行溫度根據所使用之單體之種類或量、聚合起始劑等聚合條件適當設定即可,較佳為50至200℃,更加為70至150℃。 The temperature at which the polymerization reaction is carried out may be appropriately set depending on the type or amount of the monomer to be used and the polymerization conditions such as a polymerization initiator, and is preferably from 50 to 200 ° C, more preferably from 70 to 150 ° C.
於本發明之另一具體例中,該第一鹼可溶性樹脂(C-1)可由單體(c-1)、(c-2)及(c-3)所共聚合而得之共聚合物與具有環氧基之乙烯性不飽和單體(c-4)進行聚合反應而得。 In another embodiment of the present invention, the first alkali-soluble resin (C-1) may be copolymerized by the monomers (c-1), (c-2) and (c-3). It is obtained by carrying out polymerization reaction with an ethylenically unsaturated monomer (c-4) having an epoxy group.
該具有環氧基之乙烯性不飽和單體(c-4)可包含但不限於具有環氧基的(甲基)丙烯酸酯單體、具有環氧基的α-烷基丙烯酸酯化合物或環氧丙醚單體等。 The epoxy group-containing ethylenically unsaturated monomer (c-4) may include, but is not limited to, a (meth) acrylate monomer having an epoxy group, an α-alkyl acrylate compound having an epoxy group or a ring. Oxypropyl ether monomer and the like.
該具有環氧基的(甲基)丙烯酸酯單體可包含但不限於(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸2-甲基環氧丙酯、(甲 基)丙烯酸3,4-環氧丁酯、(甲基)丙烯酸6,7-環氧庚酯、(甲基)丙烯酸3,4-環氧環己酯或(甲基)丙烯酸3,4-環氧環己基甲酯等。 The epoxy group-containing (meth) acrylate monomer may include, but is not limited to, glycidyl (meth) acrylate, 2-methyl epoxypropyl (meth) acrylate, (A) 3,4-epoxybutyl acrylate, 6,7-epoxyheptyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate or 3,4-(meth)acrylate Epoxycyclohexylmethyl ester and the like.
該具有環氧基的α-烷基丙烯酸酯單體可包含但不限於α-乙基丙烯酸環氧丙酯、α-正丙基丙烯酸環氧丙酯、α-正丁基丙烯酸環氧丙酯或α-乙基丙烯酸-6,7-環氧庚酯等。 The epoxy group-containing α-alkyl acrylate monomer may include, but is not limited to, α-ethyl methacrylate, propylene propyl α-n-propyl acrylate, and glycidyl α-n-butyl acrylate. Or α-ethyl acrylate-6,7-epoxyheptyl ester and the like.
該環氧丙醚單體可包含但不限於鄰-乙烯基苯甲基環氧丙醚(o-vinylbenzylglycidylether)、間-乙烯基苯甲基環氧丙醚(m-vinylbenzylglycidylether)或對-乙烯基苯甲基環氧丙醚(p-vinylbenzylglycidylether)等。 The propylene glycol ether monomer may include, but is not limited to, o-vinylbenzylglycidylether, m-vinylbenzylglycidylether or p-vinyl. P-vinylbenzylglycidylether or the like.
該具有環氧基之乙烯性不飽和單體(c-4)可單獨一種或混合複數種使用。 The epoxy group-containing ethylenically unsaturated monomer (c-4) may be used singly or in combination of plural kinds.
較佳地,該具有環氧基之乙烯性不飽和單體(c-4)是選自於甲基丙烯酸環氧丙酯、甲基丙烯酸3,4-環氧環己基甲酯、甲基丙烯酸6,7-環氧庚酯、鄰-乙烯基苯甲基環氧丙醚、間-乙烯基苯甲基環氧丙醚、對-乙烯基苯甲基環氧丙醚或上述單體之任意組合。 Preferably, the epoxy group-containing ethylenically unsaturated monomer (c-4) is selected from the group consisting of glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, and methacrylic acid. 6,7-epoxyheptyl ester, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether or any of the above monomers combination.
基於該單體(c-1)、(c-2)及(c-3)之使用量總和為100重量份,該具有環氧基之乙烯性不飽和單體(c-4)之使用量為3重量份至40重量份;較佳為5重量份至35重量份;更佳為10重量份至30重量份。 The amount of the epoxy group-containing ethylenically unsaturated monomer (c-4) used based on 100 parts by weight of the total of the monomers (c-1), (c-2), and (c-3) It is from 3 parts by weight to 40 parts by weight; preferably from 5 parts by weight to 35 parts by weight; more preferably from 10 parts by weight to 30 parts by weight.
當第一鹼可溶性樹脂(C-1)將上述式(III)所示之單體(c-1)、具有一個或一個以上羧酸基之乙烯性不飽和單體(c-2)以及其他可共聚合之乙烯性不飽和單體(c-3)進行聚合反應而得之共聚合物與具有環氧基之乙烯性不飽和單體(c-4)進行聚合反應時,其會反應生成具有乙烯性不飽和基之樹脂,例如式(IV)所示之結構:
其中,L1表示氫原子或甲基。本發明之第一鹼可溶性樹脂(C-1)之平均分子量只要根據目的、用途而適當設定即可,其中,為獲得良好之ITO濺鍍適性與顏料分散性,該平均分子量為2,000至250,000,較佳為3,000至200,000,更加為400至150,000。 Wherein L 1 represents a hydrogen atom or a methyl group. The average molecular weight of the first alkali-soluble resin (C-1) of the present invention may be appropriately set according to the purpose and use, and the average molecular weight is 2,000 to 250,000 in order to obtain good ITO sputtering suitability and pigment dispersibility. It is preferably from 3,000 to 200,000, more preferably from 400 to 150,000.
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該第一鹼可溶性樹脂(C-1)之使用量為5重量份至100重量份;較佳為7重量份至80重量份;更佳為10重量份至60重量份。當第一鹼可溶性樹脂(C-1)於合成時未使用式(III)所示之單體(c-1)時,則由此藍色感光性樹脂組成物所製得畫素層之ITO濺鍍適性與顏料分散性不佳;當第一鹼可溶性樹脂(C-1)具有乙烯性不飽和基時,則可進一步提升ITO濺鍍適性。 In a specific example of the present invention, the first alkali-soluble resin (C-1) is used in an amount of 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (C); It is from 7 parts by weight to 80 parts by weight; more preferably from 10 parts by weight to 60 parts by weight. When the first alkali-soluble resin (C-1) is not used in the synthesis of the monomer (c-1) represented by the formula (III), the ITO of the pixel layer is obtained from the blue photosensitive resin composition. The sputtering suitability and the pigment dispersibility are not good; when the first alkali-soluble resin (C-1) has an ethylenically unsaturated group, the ITO sputtering suitability can be further improved.
根據本發明之鹼可溶性樹脂(C)可進一步包含第二鹼可溶性樹脂(C-2),該第二鹼可溶性樹脂(C-2)是由一混合物進行聚合反應所製得,而該混合物含有一具有至少二個環氧基之環氧樹脂(c1),以及一具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c2)。除此之外,上述混合物更可選擇性地包含羧酸酐化合物(c3)及/或含環氧基的化合物(c4)。 The alkali-soluble resin (C) according to the present invention may further comprise a second alkali-soluble resin (C-2) which is obtained by polymerization of a mixture, and the mixture contains An epoxy resin (c1) having at least two epoxy groups, and a compound (c2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. Besides, the above mixture may more optionally contain a carboxylic anhydride compound (c3) and/or an epoxy group-containing compound (c4).
根據本發明之該具有至少二個環氧基之環氧樹脂(c1)可具有如下式(V)或下式(VI)所示之結構。在此處,「環氧樹脂(c1)可具有如下式(V)或下式(VI)所示之結構」的敘述亦涵蓋了具有如下式(V)
所示之結構的化合物及具有如下式(VI)所示之結構的化合物同時存在而作為環氧樹脂(c1)的情形。具體而言,前述具有至少二個環氧基之環氧樹脂(c1)例如是具有如下式(V)所示之結構:
其中:R61、R62、R63及R64係獨立選自由氫、鹵素及C1至C5之烷基所組成之群;前述式(V)之具有至少二個環氧基之環氧樹脂(c1)可包括由雙酚芴型化合物(bisphenol fluorene)與鹵化環氧丙烷(epihalohydrin)反應而得之含環氧基之雙酚芴型化合物,但並不限於此。 Wherein: R 61 , R 62 , R 63 and R 64 are independently selected from the group consisting of hydrogen, halogen and C 1 to C 5 alkyl; the epoxy of the above formula (V) having at least two epoxy groups The resin (c1) may include an epoxy group-containing bisphenol quinone type compound obtained by reacting a bisphenol fluorene with a halogenated propylene oxide (epihalohydrin), but is not limited thereto.
作為上述雙酚芴型化合物的具體例,可列舉:9,9-雙(4-羥基苯基)芴[9,9-bis(4-hydroxyphenyl)fluorene]、9,9-雙(4-羥基-3-甲基苯基)芴[9,9-bis(4-hydroxy-3-methylphenyl)fluorene]、9,9-雙(4-羥基-3-氯苯基)芴[9,9-bis(4-hydroxy-3-chlorophenyl)fluorene]、9,9-雙(4-羥基-3-溴苯基)芴[9,9-bis(4-hydroxy-3-bromophenyl)fluorene]、9,9-雙(4-羥基-3-氟苯基)芴[9,9-bis(4-hydroxy-3-fluorophenyl)fluorene]、9,9-雙(4-羥基-3-甲氧基苯基)芴[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene]、9,9-雙(4-羥基-3,5-二甲基苯基)芴[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene]、9,9-雙(4-羥基-3,5-二氯苯基)芴[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene]、9,9-雙(4-羥基-3,5-二溴苯基)芴[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene]等化合物。 Specific examples of the above bisphenol quinoid type compound include 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(4-hydroxyl group). -3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)fluorene [9,9-bis (4-hydroxy-3-chlorophenyl)fluorene], 9,9-bis(4-hydroxy-3-bromophenyl)fluorene, 9,9 - bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3-methoxyphenyl) [9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene [9,9-bis(4-hydroxy) -3,5-dimethylphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene, a compound such as 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene.
上述鹵化環氧丙烷(epihalohydrin)可包括但不限於3-氯- 1,2-環氧丙烷(epichlorohydrin)或3-溴-1,2-環氧丙烷(epibromohydrin)等。 The above-mentioned epihalohydrin may include, but is not limited to, 3-chloro- 1,2-propylene oxide (epichlorohydrin) or 3-bromo-1,2-epoxypropane (epibromohydrin).
上述由雙酚芴型化合物與鹵化環氧丙烷反應所得之含環氧基之雙酚芴型化合物包含但不限於:(1)新日鐵化學(Nippon Steel Chemical Co.,Ltd)所製造之商品:例如ESF-300等;(2)大阪瓦斯(Osaka Gas Co.,Ltd)所製造之商品:例如PG-100、EG-210等;(3)短信科技(S.M.S Technology Co.,Ltd)所製造之商品:例如SMS-F9PhPG、SMS-F9CrG、SMS-F914PG等。 The epoxy group-containing bisphenol quinone type compound obtained by reacting the bisphenol quinoid compound with the halogenated propylene oxide includes, but is not limited to: (1) a product manufactured by Nippon Steel Chemical Co., Ltd. : for example, ESF-300, etc.; (2) goods manufactured by Osaka Gas Co., Ltd.: for example, PG-100, EG-210, etc.; (3) manufactured by SMS Technology Co., Ltd. Goods such as SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, and the like.
其次,上述具有至少二個環氧基之環氧樹脂(c1)亦可具有如下式(VI)所示之結構:
其中,R65至R78係獨立選自由氫、鹵素、C1至C8之烷基及C6至C15之芳香基所組成之群;及n表示0至10之整數。 Wherein R 65 to R 78 are independently selected from the group consisting of hydrogen, halogen, C 1 to C 8 alkyl and C 6 to C 15 aromatic groups; and n represents an integer of 0 to 10.
前述式(VI)之具有至少二個環氧基之環氧樹脂(c1)例如是藉由在鹼金屬氫氧化物存在下,使具有下式(VI-1)結構之化合物與鹵化環氧丙烷進行反應而得:
在上式(VI-1)中,R65至R78以及n的定義分別與式(VI)中的R65至 R78以及n的定義相同,在此不另贅述。 In the above formula (VI-1), R 65 to R 78 and n are as defined to R 65 are the same as in 78, and the formula (Vl) R n are as defined, which is not repeated herein.
再者,前述式(VI)之具有至少二個環氧基之環氧樹脂(c1)例如是在酸觸媒存在下,使用具有下式(VI-2)結構之化合物與酚(phenol)類進行縮合反應後,形成具有式(VI-1)結構之化合物。接著,藉由加入過量的鹵化環氧丙烷進行脫鹵化氫反應(dehydrohalogenation),而獲得如式(VI)所示之具有至少二個環氧基之環氧樹脂(c1):
在上式(VI-2)中,R79與R80分別為相同或不同之氫原子、鹵素原子、C1至C8的烷基或C6至C15的芳香基;X5及X6分別為相同或不同之鹵素原子、C1至C6的烷基或C1至C6的烷氧基。較佳地,上述鹵素原子可例如氯或溴,上述烷基可例如甲基、乙基或第三丁基,上述烷氧基可例如甲氧基或乙氧基。 In the above formula (VI-2), R 79 and R 80 are each the same or different hydrogen atom, a halogen atom, a C 1 to C 8 alkyl group or a C 6 to C 15 aromatic group; X 5 and X 6 They are the same or different halogen atoms, C 1 to C 6 alkyl groups or C 1 to C 6 alkoxy groups, respectively. Preferably, the above halogen atom may be, for example, chlorine or bromine, and the above alkyl group may be, for example, a methyl group, an ethyl group or a third butyl group, and the above alkoxy group may be, for example, a methoxy group or an ethoxy group.
作為上述酚類的具體例,可列舉如:酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、異丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、環戊苯酚(cyclopentylphenol)、環己基酚(cyclohexylphenol)或環己基甲酚(cyclohexylcresol)等。上述酚類一般可單獨或混合多種使用。 Specific examples of the phenols include phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butyl phenol. (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinylphenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol. The above phenols can be generally used singly or in combination of two or more.
基於上述具有式(VI-2)結構之化合物的使用量為1莫耳,酚類的使用量為0.5莫耳至20莫耳,其中以2莫耳至15莫耳較佳。 The compound having the structure of the above formula (VI-2) is used in an amount of 1 mol, and the phenol is used in an amount of from 0.5 mol to 20 mol, preferably from 2 mol to 15 mol.
作為上述酸觸媒的具體例,可列舉:鹽酸、硫酸、對甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、無水氯化鋁(aluminium chloride anhydrous)、氯化鋅(zinc chloride)等,其中以對甲苯磺酸、硫酸或鹽酸較佳。上述酸觸媒可單獨或混合多種使用。 Specific examples of the acid catalyst include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, boron trifluoride, and anhydrous chloride anhydrous. ), zinc chloride or the like, wherein p-toluenesulfonic acid, sulfuric acid or hydrochloric acid is preferred. The above acid catalysts may be used singly or in combination of two or more.
另外,上述酸觸媒之使用量雖無特別之限制,但基於上述具有式(VI-2)結構之化合物的使用量為100重量百分比(wt%),酸觸媒的使用量較佳為0.1wt%至30wt%。 Further, the amount of the acid catalyst used is not particularly limited, but the amount of the acid catalyst used is preferably 0.1 based on the amount of the compound having the structure of the formula (VI-2) used in an amount of 100% by weight (% by weight). Wt% to 30wt%.
上述縮合反應可在無溶劑或是在有機溶劑存在下進行。其次,上述有機溶劑的具體例可列舉:甲苯(toluene)、二甲苯(xylene)或甲基異丁基酮(methyl isobutyl ketone)等。上述有機溶劑可單獨或混合多種使用。 The above condensation reaction can be carried out in the absence of a solvent or in the presence of an organic solvent. Specific examples of the organic solvent include toluene, xylene, and methyl isobutyl ketone. The above organic solvents may be used singly or in combination of two or more.
基於具有式(VI-2)結構之化合物及酚類的使用量總和為100wt%,上述有機溶劑的使用量為50wt%至300wt%,其中以100wt%至250wt%較佳。另外,上述縮合反應的操作溫度為40℃至180℃,且縮合反應的操作時間為1小時至8小時。 The total amount of the compound and the phenol used based on the structure of the formula (VI-2) is 100% by weight, and the above organic solvent is used in an amount of 50% by weight to 300% by weight, preferably 100% by weight to 250% by weight. Further, the above condensation reaction has an operation temperature of 40 ° C to 180 ° C, and the operation time of the condensation reaction is 1 hour to 8 hours.
在完成上述縮合反應後,可進行中和處理或水洗處理。上述中和處理是將反應後的溶液之pH值調整為pH 3至pH 7,其中以pH 5至pH 7較佳。上述水洗處理可使用中和劑來進行,此中和劑為鹼性物質,且其具體例可列舉:氫氧化鈉(sodium hydroxide)、氫氧化鉀(potassium hydroxide)等鹼金屬氫氧化物;氫氧化鈣(calcium hydroxide)、氫氧化鎂(magnesium hydroxide)等鹼土類金屬氫氧化物;二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylenetetramine)、苯胺(aniline)、苯二胺(phenylene diamine)等有機胺;以及氨(ammonia)、磷酸二氫鈉(sodium dihydrogen phosphate)等。上述水洗處理可採用習知方法進行,例如,在反應後的溶液中, 加入含中和劑的水溶液,反覆進行萃取即可。經中和處理或水洗處理後,經減壓加熱處理,將未反應的酚類及溶劑予以餾除,並進行濃縮,即可獲得具有式(VI-1)結構之化合物。 After completion of the above condensation reaction, a neutralization treatment or a water washing treatment may be carried out. The above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, preferably pH 5 to pH 7. The water washing treatment may be carried out using a neutralizing agent, and the neutralizing agent is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; and hydrogen; Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline, phenylenediamine (diethyltetramine) Organic amines such as phenylene diamine; and ammonia, sodium dihydrogen phosphate, and the like. The above washing treatment can be carried out by a known method, for example, in the solution after the reaction, An aqueous solution containing a neutralizing agent is added and extraction is repeated. After the neutralization treatment or the water washing treatment, the unreacted phenols and the solvent are distilled off by heating under reduced pressure, and concentrated to obtain a compound having the structure of the formula (VI-1).
作為上述鹵化環氧丙烷的具體例,可例舉:3-氯-1,2-環氧丙烷(3-chloro-1,2-epoxypropane)、3-溴-1,2-環氧丙烷(3-bromo-1,2-epoxypropane)或上述任意組合。在進行上述脫鹵化氫反應之前,可預先添加或於反應過程中添加氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物。上述脫鹵化氫反應的操作溫度為20℃至120℃,其操作時間範圍為1小時至10小時。 Specific examples of the above halogenated propylene oxide include 3-chloro-1,2-epoxypropane and 3-bromo-1,2-epoxypropane (3). -bromo-1, 2-epoxypropane) or any combination of the above. An alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added to the reaction before the dehydrohalogenation reaction. The above dehydrohalogenation reaction has an operating temperature of from 20 ° C to 120 ° C and an operation time ranging from 1 hour to 10 hours.
於本發明之具體例中,上述脫鹵化氫反應中所添加之鹼金屬氫氧化物亦可使用其水溶液。在此具體例中,將上述鹼金屬氫氧化物水溶液連續添加至脫鹵化氫反應系統內的同時,可於減壓或常壓下,連續蒸餾出水及鹵化環氧丙烷,藉此分離並除去水,同時可將鹵化環氧丙烷連續地回流至反應系統內。 In a specific example of the present invention, an aqueous solution of the alkali metal hydroxide added to the dehydrohalogenation reaction may be used. In this specific example, while the aqueous alkali metal hydroxide solution is continuously added to the dehydrohalogenation reaction system, water and halogenated propylene oxide can be continuously distilled off under reduced pressure or normal pressure, thereby separating and removing water. At the same time, the halogenated propylene oxide can be continuously refluxed into the reaction system.
上述脫鹵化氫反應進行前,亦可添加氯化四甲銨(tetramethyl ammonium chloride)、溴化四甲銨(tetramethyl ammonium bromide)、三甲基苄基氯化銨(trimethyl benzyl ammonium chloride)等的四級銨鹽作為觸媒,並在50℃至150℃下,反應1小時至5小時,再加入鹼金屬氫氧化物或其水溶液,於20℃至120℃的溫度下,使其反應1小時至10小時,以進行脫鹵化氫反應。 Before the dehydrohalogenation reaction is carried out, tetramethyl ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride or the like may be added. The ammonium salt is used as a catalyst, and reacted at 50 ° C to 150 ° C for 1 hour to 5 hours, and then an alkali metal hydroxide or an aqueous solution thereof is added thereto, and the reaction is carried out at a temperature of 20 ° C to 120 ° C for 1 hour. 10 hours for the dehydrohalogenation reaction.
基於上述具有式(VI-1)結構之化合物中的羥基總當量為1當量,上述鹵化環氧丙烷的使用量可為1當量至20當量,其中以2當量至10當量較佳。基於上述具有式(VI-1)結構之化合物中的羥基總當量為1當量,上述脫鹵化氫反應中添加的鹼金屬氫氧化物的使用量可為0.8當量至15當量,其中以0.9當量至11當量較佳。 The halogenated propylene oxide may be used in an amount of from 1 equivalent to 20 equivalents, preferably from 2 equivalents to 10 equivalents, based on 1 equivalent of the total hydroxyl group in the compound of the above formula (VI-1). The alkali metal hydroxide added in the above dehydrohalogenation reaction may be used in an amount of from 0.8 equivalents to 15 equivalents, wherein from 0.9 equivalents, based on 1 equivalent of the total hydroxyl group in the compound having the structure of the formula (VI-1). 11 equivalents are preferred.
此外,為了使上述脫鹵化氫反應順利進行,除了可添加 甲醇、乙醇等醇類之外,亦可添加二甲碸(dimethyl sulfone)、二甲亞碸(dimethyl sulfoxide)等非質子性(aprotic)的極性溶媒等來進行反應。在使用醇類的情況下,基於上述鹵化環氧丙烷的總量為100wt%,醇類的使用量可為2wt%至20wt%,較佳為4wt%至15wt%。在使用非質子性的極性溶媒的例子中,基於鹵化環氧丙烷的總量為100wt%,非質子性的極性溶媒的使用量可為5wt%至100wt%,其中,以10wt%至90wt%較佳。 In addition, in order to make the above dehydrohalogenation reaction proceed smoothly, in addition to being added In addition to an alcohol such as methanol or ethanol, a reaction may be carried out by adding an aprotic polar solvent such as dimethyl sulfone or dimethyl sulfoxide. In the case of using an alcohol, the alcohol may be used in an amount of 2% by weight to 20% by weight, preferably 4% by weight to 15% by weight based on the total amount of the above-mentioned halogenated propylene oxide being 100% by weight. In the case of using an aprotic polar solvent, the total amount of the aprotic polar solvent may be from 5 wt% to 100 wt%, wherein 10 wt% to 90 wt%, based on the total amount of the halogenated propylene oxide, is 100 wt%. good.
在完成脫鹵化氫反應後,可選擇性地進行水洗處理。之後,利用加熱減壓的方式除去鹵化環氧丙烷、醇類及非質子性的極性溶媒等。上述加熱減壓例如是於溫度為110℃至250℃,且壓力為1.3kPa(10mmHg)以下的環境下進行。 After completion of the dehydrohalogenation reaction, a water washing treatment can be selectively performed. Thereafter, the halogenated propylene oxide, the alcohol, and the aprotic polar solvent are removed by heating and decompression. The heating and depressing is performed, for example, in an environment having a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.
為了避免形成之環氧樹脂含有加水分解性鹵素,可將脫鹵化氫反應後的溶液加入甲苯、甲基異丁基酮(methyl isobutyl ketone)等溶劑,並加入氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物水溶液,再次進行脫鹵化氫反應。在脫鹵化氫反應中,基於上述具有式(VI-1)結構之化合物中的羥基總當量為1當量,鹼金屬氫氧化物的使用量為0.01莫耳至0.3莫耳,其中,以0.05莫耳至0.2莫耳較佳。另外,上述脫鹵化氫反應的操作溫度範圍為50℃至120℃,且其操作時間範圍為0.5小時至2小時。 In order to prevent the formed epoxy resin from containing a hydrolyzable halogen, the solution after the dehydrohalogenation reaction may be added to a solvent such as toluene or methyl isobutyl ketone, and a base such as sodium hydroxide or potassium hydroxide may be added. The metal hydroxide aqueous solution is again subjected to a dehydrohalogenation reaction. In the dehydrohalogenation reaction, the total equivalent weight of the hydroxyl group in the compound having the structure of the above formula (VI-1) is 1 equivalent, and the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol, wherein 0.05 mol is used. The ear is preferably 0.2 mu. Further, the above dehydrohalogenation reaction has an operating temperature in the range of 50 ° C to 120 ° C and an operation time ranging from 0.5 hour to 2 hours.
在完成脫鹵化氫反應後,藉由過濾及水洗等步驟去除鹽類。此外,亦可利用加熱減壓的方式,將甲苯、甲基異丁基酮等溶劑予以餾除,而可獲得如式(VI)所示之具有至少二個環氧基之環氧樹脂(c1)。上述式(VI)之具有至少二個環氧基之環氧樹脂(c1)可包含但不限於如商品名為NC-3000、NC-3000H、NC-3000S及NC-3000P等日本化藥(Nippon Kayaku Co.Ltd.)所製造之商品。 After completion of the dehydrohalogenation reaction, the salts are removed by filtration, washing, and the like. Further, a solvent such as toluene or methyl isobutyl ketone may be distilled off by heating and decompression to obtain an epoxy resin having at least two epoxy groups as shown in the formula (VI) (c1). ). The epoxy resin (c1) having at least two epoxy groups of the above formula (VI) may include, but is not limited to, Nippon Chemicals (Nippon) such as the trade names NC-3000, NC-3000H, NC-3000S, and NC-3000P. A product manufactured by Kayaku Co. Ltd.).
前述具有至少一個羧酸基及至少一個乙烯性不飽和基的 化合物(c2)例如是選自於由以下(1)至(3)所組成之群組:(1)丙烯酸、甲基丙烯酸、2-甲基丙烯醯氧乙基丁二酸(2-methacryloyloxyethylbutanedioic acid)、2-甲基丙烯醯氧丁基丁二酸、2-甲基丙烯醯氧乙基己二酸、2-甲基丙烯醯氧丁基己二酸、2-甲基丙烯醯氧乙基六氫鄰苯二甲酸、2-甲基丙烯醯氧乙基馬來酸、2-甲基丙烯醯氧丙基馬來酸、2-甲基丙烯醯氧丁基馬來酸、2-甲基丙烯醯氧丙基丁二酸、2-甲基丙烯醯氧丙基己二酸、2-甲基丙烯醯氧丙基四氫鄰苯二甲酸、2-甲基丙烯醯氧丙基鄰苯二甲酸、2-甲基丙烯醯氧丁基鄰苯二甲酸、或2-甲基丙烯醯氧丁基氫鄰苯二甲酸;(2)由含羥基之(甲基)丙烯酸酯與二元羧酸化合物反應而得之化合物,其中二元羧酸化合物包含但不限於己二酸、丁二酸、馬來酸、鄰苯二甲酸;(3)由含羥基之(甲基)丙烯酸酯與羧酸酐化合物(c3)反應而得之半酯化合物,其中含羥基之(甲基)丙烯酸酯包含但不限於2-羥基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羥基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羥基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羥基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羥基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羥基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]、或季戊四醇三甲基丙烯酸酯等。另外,此處所述之羧酸酐化合物可與下述第二鹼可溶性樹脂(C-2)之混合物所含的羧酸酐化合物(c3)相同,故於此不再贅述。 The foregoing having at least one carboxylic acid group and at least one ethylenically unsaturated group The compound (c2) is, for example, selected from the group consisting of (1) to (3): (1) acrylic acid, methacrylic acid, 2-methacryloyloxyethylbutanedioic acid (2-methacryloyloxyethylbutanedioic acid) ), 2-methylpropenyloxybutyl succinic acid, 2-methylpropenyl oxyethyl adipate, 2-methylpropenyloxybutyl adipate, 2-methylpropenyloxyethyl Hexahydrophthalic acid, 2-methylpropenyloxyethyl maleic acid, 2-methylpropenyloxypropyl maleic acid, 2-methylpropenyloxybutyl maleic acid, 2-methyl Propylene oxypropyl succinic acid, 2-methyl propylene sulfoxypropyl adipate, 2-methyl propylene oxypropyl tetrahydrophthalic acid, 2-methyl propylene oxypropyl phthalate Formic acid, 2-methylpropenyloxybutylphthalic acid, or 2-methylpropenyloxybutylphthalic acid; (2) Hydroxyl-containing (meth) acrylate and dicarboxylic acid a compound obtained by reacting a compound, wherein the dicarboxylic acid compound includes, but is not limited to, adipic acid, succinic acid, maleic acid, phthalic acid; (3) a hydroxyl group-containing (meth) acrylate and a carboxylic acid anhydride Semi-esterification of compound (c3) The hydroxyl group-containing (meth) acrylate includes, but is not limited to, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate or pentaerythritol trimethacrylate. Further, the carboxylic anhydride compound described herein may be the same as the carboxylic anhydride compound (c3) contained in the mixture of the second alkali-soluble resin (C-2) described below, and thus will not be described herein.
上述第二鹼可溶性樹脂(C-2)之混合物更可選擇性地包含羧酸酐化合物(c3)及/或含環氧基的化合物(c4)。上述羧酸酐化合物(c3)可選自由以下(1)至(2)所組成之群組:(1)丁二酸酐(butanedioic anhydride)、順丁烯二酸酐(maleic anhydride)、衣康酸酐(Itaconic anhydride)、鄰苯二甲酸酐(phthalic anhydride)、四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride)、六氫鄰苯二甲酸酐(hexahydrophthalic anhydride)、甲基四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基橋亞甲基四氫鄰苯二甲酸酐(methyl endo-methylene tetrahydro phthalic anhydride)、氯茵酸酐(chlorendic anhydride)、戊二酸酐或偏三苯甲酸酐(1,3-dioxoisobenzofuran-5-carboxylic anhydride)等二元羧酸酐化合物;以及(2)二苯甲酮四甲酸二酐(benzophenone tetracarboxylic dianhydride,簡稱BTDA)、雙苯四甲酸二酐或雙苯醚四甲酸二酐等四元羧酸酐化合物。 The mixture of the above second alkali-soluble resin (C-2) may more optionally contain a carboxylic anhydride compound (c3) and/or an epoxy group-containing compound (c4). The above carboxylic anhydride compound (c3) may be selected from the group consisting of (1) to (2): (1) butanedioic anhydride, maleic anhydride, itaconic anhydride (Itaconic) Anhydride), phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride Anhydride), methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endo-methylene tetrahydrophthalic anhydride, chlorinated anhydride Chlorinic anhydride), dimethyl carboxylic acid anhydride (1,3-dioxoisobenzofuran-5-carboxylic anhydride) and the like; and (2) benzophenone tetracarboxylic dianhydride (abbreviated as benzophenone tetracarboxylic dianhydride) A quaternary carboxylic anhydride compound such as BTDA), bisbenzenetetracarboxylic dianhydride or diphenyl ether tetracarboxylic dianhydride.
上述含環氧基的化合物(c4)例如是選自甲基丙烯酸環氧丙酯、3,4-環氧基環己基甲基丙烯酸酯、含不飽和基的縮水甘油醚化合物、含環氧基的不飽和化合物或上述之任意組合所組成的群組。前述含不飽和基的縮水甘油醚化合物包含但不限於商品名Denacol EX-111、EX-121 Denacol、Denacol EX-141、Denacol EX-145、Denacol EX-146、Denacol EX-171、Denacol EX-192等的化合物(以上為長瀨化成工業株式會社之商品)。 The epoxy group-containing compound (c4) is, for example, selected from the group consisting of glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, an unsaturated group-containing glycidyl ether compound, and an epoxy group-containing compound. A group of unsaturated compounds or any combination of the above. The unsaturated group-containing glycidyl ether compound includes, but is not limited to, the trade names Denacol EX-111, EX-121 Denacol, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, and Denacol EX-192. Compound (the above is a product of Nagase Chemical Industry Co., Ltd.).
前述第二鹼可溶性樹脂(C-2)可由式(V)之具有至少二個環氧基之環氧樹脂(c1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c2)進行聚合反應,形成含羥基的反應產物,接著,再添加羧酸酐化合物(c3)進行反應所製得。基於上述含羥基的反應產物的羥基總當量為1當量,羧酸酐化合物(c3)所含有的酸酐基的當量較佳為0.4當量至1當量,更佳為0.75當量至1當量。當使用多個羧酸酐化合物(c3)時,可於反應中依序添加或同時添加。當使用二元羧酸酐化合物及四元羧酸酐化合物作為羧酸酐化合物(c3)時,二元羧酸酐化合物及四元羧酸酐化合物的莫耳比例較佳為1/99至90/10,更佳為5/95至80/20。另外,上述反應的操作溫度範圍例如是在50℃至130℃的範圍。 The second alkali-soluble resin (C-2) may be an epoxy resin (c1) having at least two epoxy groups of the formula (V) and a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (c2) The polymerization reaction is carried out to form a hydroxyl group-containing reaction product, followed by addition of a carboxylic anhydride compound (c3) to carry out a reaction. The equivalent weight of the hydroxyl group-based reaction product is 1 equivalent, and the equivalent weight of the acid anhydride group contained in the carboxylic anhydride compound (c3) is preferably from 0.4 equivalents to 1 equivalent, more preferably from 0.75 equivalents to 1 equivalent. When a plurality of carboxylic anhydride compounds (c3) are used, they may be added sequentially or simultaneously in the reaction. When a dicarboxylic anhydride compound and a tetracarboxylic anhydride compound are used as the carboxylic anhydride compound (c3), the molar ratio of the dicarboxylic anhydride compound and the tetracarboxylic anhydride compound is preferably from 1/99 to 90/10, more preferably It is from 5/95 to 80/20. Further, the operating temperature range of the above reaction is, for example, in the range of 50 ° C to 130 ° C.
前述第二鹼可溶性樹脂(C-2)可由式(VI)之具有至少二個 環氧基之環氧樹脂(c1)與具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(c2)進行反應,形成含羥基的反應產物,接著,再藉由添加羧酸酐化合物(c3)及/或含環氧基之化合物(c4)進行聚合反應所製得。基於式(VI)之具有至少二個環氧基之環氧樹脂(c1)上的環氧基總當量為1當量,上述具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c2)的酸價當量較佳為0.8當量至1.5當量,更佳為0.9當量至1.1當量。基於上述含羥基的反應產物的羥基總量為100莫耳百分比(莫耳%),羧酸酐化合物(c3)的使用量較佳為10莫耳%至100莫耳%,更佳為20莫耳%至100莫耳%,特佳為30莫耳%至100莫耳%。 The second alkali-soluble resin (C-2) may have at least two of formula (VI) The epoxy group epoxy resin (c1) is reacted with a compound (c2) having at least one carboxylic acid group and at least one ethylenically unsaturated group to form a hydroxyl group-containing reaction product, followed by addition of a carboxylic anhydride compound ( The c3) and/or the epoxy group-containing compound (c4) is obtained by a polymerization reaction. The epoxy group (c1) having at least two epoxy groups has a total equivalent weight of 1 equivalent based on the formula (VI), and the above compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (c2) The acid value equivalent is preferably from 0.8 equivalents to 1.5 equivalents, more preferably from 0.9 equivalents to 1.1 equivalents. The total amount of hydroxyl groups based on the above hydroxyl group-containing reaction product is 100 mol% (mol%), and the carboxylic anhydride compound (c3) is preferably used in an amount of 10 mol% to 100 mol%, more preferably 20 mol%. % to 100% by mole, particularly preferably 30% by mole to 100% by mole.
在製備上述第二鹼可溶性樹脂(C-2)時,為了加速反應,通常會於反應溶液中添加鹼性化合物作為反應觸媒。上述反應觸媒可單獨或混合使用,且上述反應觸媒包含但不限於:三苯基膦(triphenyl phosphine)、三苯基銻(triphenyl stibine)、三乙胺(triethylamine)、三乙醇胺(triethanolamine)、氯化四甲基銨(tetramethylammonium chloride)、氯化苄基三乙基銨(benzyltriethylammonium chloride)等。基於上述具有至少二個環氧基之環氧樹脂(c1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c2)的使用量總和為100重量份,反應觸媒的使用量較佳為0.01重量份至10重量份,更佳為0.3重量份至5重量份。 In the preparation of the second alkali-soluble resin (C-2), in order to accelerate the reaction, a basic compound is usually added as a reaction catalyst to the reaction solution. The above reaction catalysts may be used singly or in combination, and the above reaction catalysts include, but are not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine. , tetramethylammonium chloride, benzyltriethylammonium chloride, and the like. The use amount of the reaction catalyst is based on the total amount of the epoxy resin (c1) having at least two epoxy groups and the compound (c2) having at least one carboxylic acid group and at least one ethylenically unsaturated group in an amount of 100 parts by weight. The amount is preferably from 0.01 part by weight to 10 parts by weight, more preferably from 0.3 part by weight to 5 parts by weight.
此外,為了控制聚合度,通常還會於反應溶液中添加聚合抑制劑(polymerization inhibitor)。上述聚合抑制劑可包含但不限於:甲氧基酚(methoxyphenol)、甲基氫醌(methylhydroquinone)、氫醌(hydroquinone)、2,6-二第三丁基對甲酚(2,6-di-t-butyl-p-cresol)或吩噻嗪(phenothiazine)等。一般而言,上述聚合抑制劑可單獨或混合多種使用。基於上述具有至少二個環氧基之環氧樹脂(c1)與具有至少一個羧酸基及至少一個乙烯性不飽和基的化合物(c2)的使用量總和為100 重量份,聚合抑制劑的使用量較佳為0.01重量份至10重量份,更佳為0.1重量份至5重量份。 Further, in order to control the degree of polymerization, a polymerization inhibitor is usually added to the reaction solution. The above polymerization inhibitor may include, but is not limited to, methoxyphenol, methylhydroquinone, hydroquinone, 2,6-di-t-butyl-p-cresol (2,6-di) -t-butyl-p-cresol) or phenothiazine. In general, the above polymerization inhibitors may be used singly or in combination of two or more. The total amount of use of the epoxy resin (c1) having at least two epoxy groups and the compound (c2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100 The polymerization inhibitor is preferably used in an amount of from 0.01 part by weight to 10 parts by weight, more preferably from 0.1 part by weight to 5 parts by weight, per part by weight.
在製備該第二鹼可溶性樹脂(C-2)時,必要時可使用聚合反應溶劑。作為上述聚合反應溶劑的具體例,可列舉如:乙醇、丙醇、異丙醇、丁醇、異丁醇、2-丁醇、己醇或乙二醇等醇類化合物;甲乙酮或環己酮等酮類化合物;甲苯或二甲苯等芳香族烴類化合物;賽珞素(cellosolve)或丁基賽珞素(butyl cellosolve)等賽珞素類化合物;卡必妥(carbitol)或丁基卡必妥(butyl carbitol)等卡必妥類化合物;丙二醇單甲醚(propylene glycol monomethyl ether)等丙二醇烷基醚類化合物;二丙二醇單甲醚[di(propylene glycol)methyl ether]等多丙二醇烷基醚[poly(propylene glycol)alkyl ether]類化合物;醋酸乙酯、醋酸丁酯、乙二醇乙醚醋酸酯(ethylene glycol monoethyl ether acetate)或丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate)等醋酸酯類化合物;乳酸乙酯(ethyl lactate)或乳酸丁酯(butyl lactate)等乳酸烷酯(alkyl lactate)類化合物;或二烷基二醇醚類。上述聚合反應溶劑一般可單獨或混合多種使用。另外,上述第一鹼可溶性樹脂(C-1)的酸價較佳為50mgKOH/g至200mgKOH/g,更佳為60mgKOH/g至150mgKOH/g。 In the preparation of the second alkali-soluble resin (C-2), a polymerization solvent can be used as necessary. Specific examples of the polymerization reaction solvent include alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol or ethylene glycol; methyl ethyl ketone or cyclohexanone; Ketone compounds; aromatic hydrocarbon compounds such as toluene or xylene; celecin compounds such as cellosolve or butyl cellosolve; carbitol or butyl carbene a carbaryl compound such as butyl carbitol; a propylene glycol alkyl ether compound such as propylene glycol monomethyl ether; and a polypropylene glycol alkyl ether such as di(propylene glycol) methyl ether [poly(propylene glycol) alkyl ether] compound; acetate such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate a compound; an alkyl lactate compound such as ethyl lactate or butyl lactate; or a dialkyl glycol ether. The above polymerization solvent can be generally used singly or in combination of two or more. Further, the acid value of the above first alkali-soluble resin (C-1) is preferably from 50 mgKOH/g to 200 mgKOH/g, more preferably from 60 mgKOH/g to 150 mgKOH/g.
另外,上述第二鹼可溶性樹脂(C-2)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的數目平均分子量較佳為800至8,000,更佳為1,000至6,000。 Further, the second alkali-soluble resin (C-2) has a polystyrene-equivalent number average molecular weight of from 800 to 8,000, more preferably from 1,000 to 6,000, as measured by Gel Permeation Chromatography (GPC). .
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該第二鹼可溶性樹脂(C-2)之使用量為0重量份至95重量份;較佳為20重量份至93重量份;更佳為40重量份至90重量份。當使用第二鹼可溶性樹脂(C-2)時,則由此藍色感光性樹脂組成物所製得畫素層之顏料分散性較佳。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the second alkali-soluble resin (C-2) is used in an amount of 0 parts by weight to 95 parts by weight; preferably. It is 20 parts by weight to 93 parts by weight; more preferably 40 parts by weight to 90 parts by weight. When the second alkali-soluble resin (C-2) is used, the pigment dispersibility of the pixel layer produced by the blue photosensitive resin composition is preferred.
較佳地,根據本發明之該鹼可溶性樹脂(C)可進一步包含第三鹼可溶性樹脂(C-3),該第三鹼可溶性樹脂(C-3)係由含一個或一個以上羧酸基之乙烯性不飽和單體,和其它可共聚合之乙烯性不飽和單體共聚合而得。基於共聚合用單體100重量份,較佳地,該第二鹼可溶性樹脂(C-3)係由50重量份至95重量份之含一個或一個以上羧酸基之乙烯性不飽和單體和5重量份至50重量份之其它可共聚合之乙烯性不飽和單體共聚合而得。 Preferably, the alkali-soluble resin (C) according to the present invention may further comprise a third alkali-soluble resin (C-3) containing one or more carboxylic acid groups. The ethylenically unsaturated monomer is obtained by copolymerization with other copolymerizable ethylenically unsaturated monomers. Preferably, the second alkali-soluble resin (C-3) is from 50 parts by weight to 95 parts by weight of the ethylenically unsaturated monomer having one or more carboxylic acid groups, based on 100 parts by weight of the monomer for copolymerization. It is obtained by copolymerizing 5 parts by weight to 50 parts by weight of other copolymerizable ethylenically unsaturated monomers.
該含一個或一個以上羧酸基之乙烯性不飽和單體可單獨或混合使用,且該含羧酸基之乙烯性不飽和單體包含但不限於丙烯酸、甲基丙烯酸(methacrylic acid,簡稱MAA)、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、2-丙烯醯乙氧基丁二酸酯、或2-甲基丙烯醯乙氧基丁二酸酯(2-methacryloyloxyethyl succinate monoester,簡稱HOMS)等之不飽和一元羧酸類;馬來酸、馬來酸酐、富馬酸、衣康酸、衣康酸酐、檸康酸及檸康酸酐等之不飽和二元羧酸(酐)類;三個羧酸基以上之之不飽和多元羧酸(酐)類。較佳地,該含羧酸基之乙烯性不飽和單體是擇自於丙烯酸、甲基丙烯酸、2-丙烯醯乙氧基丁二酸酯、或2-甲基丙烯醯乙氧基丁二酸酯。更佳地,該含羧酸基之乙烯性不飽和單體是擇自於2-丙烯醯乙氧基丁二酸酯、或2-甲基丙烯醯乙氧基丁二酸酯,可以提高顏料分散性及增進顯影速度以及減少殘渣發生。 The ethylenically unsaturated monomer having one or more carboxylic acid groups may be used singly or in combination, and the carboxylic acid group-containing ethylenically unsaturated monomer includes, but is not limited to, methacrylic acid (MAA). ), crotonic acid, α-chloroacrylic acid, ethacrylic acid, cinnamic acid, 2-propenyl ethoxylated succinate, or 2-methacryloyloxyethyl succinate monoester , referred to as HOMS), unsaturated monocarboxylic acids; maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid and citraconic anhydride, etc. a class of unsaturated polycarboxylic acids (anhydrides) having three or more carboxylic acid groups. Preferably, the carboxylic acid group-containing ethylenically unsaturated monomer is selected from the group consisting of acrylic acid, methacrylic acid, 2-propenyl ethoxy succinate, or 2-methyl propylene ethoxy ethoxylate Acid ester. More preferably, the carboxylic acid group-containing ethylenically unsaturated monomer is selected from 2-propenyl ethoxy succinate or 2-methyl propylene ethoxy succinate to enhance the pigment. Dispersibility and increase development speed and reduce residue.
該其它可共聚合之乙烯性不飽和單體可單獨或混合使用,且該其它可共聚合之乙烯性不飽和單體包含但不限於苯乙烯(styrene,簡稱SM)、α-甲基苯乙烯、乙烯基甲苯、對氯苯乙烯、甲氧基苯乙烯等之芳香族乙烯基化合物;氮-苯基馬來醯亞胺(N-phenylmaleimide,簡稱PMI)、氮-鄰-羥基苯基馬來醯亞胺、氮-間-羥基苯基馬來醯亞胺、氮-對-羥基苯基馬來醯亞胺、氮-鄰-甲基苯基馬 來醯亞胺、氮-間-甲基苯基馬來醯亞胺、氮-對-甲基苯基馬來醯亞胺、氮-鄰-甲氧基苯基馬來醯亞胺、氮-間-甲氧基苯基馬來醯亞胺、氮-對-甲氧基苯基馬來醯亞胺、氮-環己基馬來醯亞胺等之馬來醯亞胺類;丙烯酸甲酯(methyl acrylate,簡稱MA)、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸正丙酯、甲基丙烯酸正丙酯、丙烯酸異丙酯、甲基丙烯酸異丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸異丁酯、甲基丙烯酸異丁酯、丙烯酸第二丁酯、甲基丙烯酸第二丁酯、丙烯酸第三丁酯、甲基丙烯酸第三丁酯、丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、甲基丙烯酸2-羥基丙酯、丙烯酸3-羥基丙酯、甲基丙烯酸3-羥基丙酯、丙烯酸2-羥基丁酯、甲基丙烯酸2-羥基丁酯、丙烯酸3-羥基丁酯、甲基丙烯酸3-羥基丁酯、丙烯酸4-羥基丁酯、甲基丙烯酸4-羥基丁酯、丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸苯甲酯、甲基丙烯酸苯甲酯(benzyl methacrylate,簡稱BzMA)、丙烯酸苯酯、甲基丙烯酸苯酯、丙烯酸三乙二醇甲氧酯、甲基丙烯酸三乙二醇甲氧酯、甲基丙烯酸十二烷基酯、甲基丙烯酸十四烷基酯、甲基丙烯酸十六烷基酯、甲基丙烯酸十八烷基酯、甲基丙烯酸二十烷基酯、甲基丙烯酸二十二烷基酯、丙烯酸雙環戊烯基氧化乙酯(dicyclopentenyloxyethyl acrylate,簡稱DCPOA)等之不飽和羧酸酯類;丙烯酸-氮,氮-二甲基胺基乙酯、甲基丙烯酸-氮,氮-二甲基胺基乙酯、丙烯酸-氮,氮-二乙基胺基丙酯、甲基丙烯酸-氮,氮-二甲基胺基丙酯、丙烯酸氮,氮-二丁基胺基丙酯、氮-甲基丙烯酸異-丁基胺基乙酯;丙烯酸環氧丙基酯、甲基丙烯酸環氧丙基酯等之不飽和羧酸環氧丙基酯類;乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯等之羧酸乙烯酯類;乙烯基甲醚、乙烯基乙醚、烯丙基環氧丙基醚、甲代烯丙基環氧丙基醚等之不飽和醚類;丙烯腈、甲基丙烯腈、α-氯丙烯腈、氰化亞乙烯等之腈化乙烯基化合物;丙烯醯胺、甲 基丙烯醯胺、α-氯丙烯醯胺、氮-羥乙基丙烯醯胺、氮-羥乙基甲基丙烯醯胺等之不飽和醯胺;1,3-丁二烯、異戊二烯、氯化丁二烯等之脂肪族共軛二烯類。 The other copolymerizable ethylenically unsaturated monomers may be used singly or in combination, and the other copolymerizable ethylenically unsaturated monomers include, but are not limited to, styrene (SM), α-methyl styrene. , an aromatic vinyl compound such as vinyl toluene, p-chlorostyrene, methoxystyrene, etc.; N-phenylmaleimide (PMI), nitrogen-o-hydroxyphenyl Malay Yttrium imine, nitrogen-m-hydroxyphenyl maleimide, nitrogen-p-hydroxyphenyl maleimide, nitrogen-o-methylphenyl horse Iridium imine, nitrogen-m-methylphenylmaleimide, nitrogen-p-methylphenylmaleimide, nitrogen-o-methoxyphenylmaleimide, nitrogen- M-mercaptoimine of m-methoxyphenylmaleimide, nitrogen-p-methoxyphenylmaleimide, nitrogen-cyclohexylmaleimide, etc.; methyl acrylate ( Methyl acrylate (MA), methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, butyl acrylate Ester, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, second butyl acrylate, second butyl methacrylate, third butyl acrylate, third butyl methacrylate, acrylic acid 2-hydroxyethyl ester, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, acrylic acid 2- Hydroxybutyl ester, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, A 4-hydroxybutyl acrylate, allyl acrylate, allyl methacrylate, benzyl methacrylate, benzyl methacrylate (BzMA), phenyl acrylate, phenyl methacrylate, acrylic acid Triethylene glycol methoxylate, triethylene glycol methacrylate methacrylate, dodecyl methacrylate, tetradecyl methacrylate, cetyl methacrylate, methacrylic acid An octaalkyl ester, an eicosyl methacrylate, a behenyl methacrylate, an unsaturated carboxylic acid ester such as dicyclopentenyloxyethyl acrylate (DCPOA); Nitrogen, nitrogen-dimethylaminoethyl ester, methacrylic acid-nitrogen, nitrogen-dimethylaminoethyl ester, acrylic acid-nitrogen, nitrogen-diethylaminopropyl methacrylate, methacrylic acid-nitrogen, nitrogen- Dimethylaminopropyl acrylate, nitrogen acrylate, nitrogen-dibutylaminopropyl propyl ester, nitrogen-isobutylaminoethyl methacrylate; glycidyl acrylate, glycidyl methacrylate Equivalent carboxylic acid glycidyl esters; vinyl acetate, vinyl propionate, Vinyl carboxylates such as vinyl acetate; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl epoxypropyl ether, methallyl epoxypropyl ether; acrylonitrile, A Nitrile vinyl compound such as acrylonitrile, α-chloroacrylonitrile, vinyl cyanide, etc.; acrylamide, A Alkyl amide, α-chloropropenylamine, nitrogen-hydroxyethyl acrylamide, nitrogen-hydroxyethyl methacrylamide, etc., unsaturated decylamine; 1,3-butadiene, isoprene An aliphatic conjugated diene such as chlorinated butadiene.
較佳地,該其他可共聚合之乙烯性不飽和單體是擇自於苯乙烯、氮-苯基馬來醯亞胺、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基乙酯、丙烯酸苯甲酯、甲基丙烯酸苯甲酯、丙烯酸雙環戊烯基氧化乙酯、或此等組合。 Preferably, the other copolymerizable ethylenically unsaturated monomer is selected from the group consisting of styrene, nitrogen-phenyl maleimide, methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, benzyl acrylate, benzyl methacrylate, dicyclopentenyl acrylate, or combinations thereof.
於製備該第三鹼可溶性樹脂(C-3)時,可使用溶劑,該溶劑可單獨或混合使用,且該溶劑包含但不限於乙二醇甲醚、乙二醇乙醚、二甘醇甲醚、二甘醇乙醚、二甘醇正丙醚、二甘醇正丁醚、三甘醇甲醚、三甘醇乙醚、丙二醇甲醚、丙二醇乙醚、一縮二丙二醇甲醚、一縮二丙二醇乙醚、一縮二丙二醇正丙醚、一縮二丙二醇正丁醚、二縮三丙二醇甲醚、二縮三丙二醇乙醚等之(聚)亞烷基二醇單烷醚類;乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate,簡稱PGMEA)、丙二醇乙醚醋酸酯等之(聚)亞烷基二醇單烷醚醋酸酯類;二甘醇二甲醚、二甘醇甲乙醚、二甘醇二乙醚、四氫呋喃等之其他醚類;甲乙烷酮、環己酮、2-庚酮、3-庚酮等之酮類;2-羥基丙酸甲酯、2-羥基丙酸乙酯等之乳酸烷酯類;2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯(ethyl 3-ethoxypropionate,簡稱EEP)、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、乙酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-甲氧基丁 酸乙酯等之其他酯類;甲苯、二甲苯等之芳香族碳氫化合物類;氮-甲基吡咯烷酮、氮,氮-二甲基甲醯胺、或氮,氮-二甲基乙醯胺等醯胺類等。較佳地,該溶劑是擇自於丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯、或此等組合。該(聚)亞烷基二醇單烷醚類指之是亞烷基二醇單烷醚類或聚亞烷基二醇單烷醚類。該(聚)亞烷基二醇單烷醚醋酸酯類指之是亞烷基二醇單烷醚醋酸酯類或聚亞烷基二醇單烷醚醋酸酯類。 In the preparation of the third alkali-soluble resin (C-3), a solvent may be used, which may be used singly or in combination, and the solvent includes, but is not limited to, ethylene glycol methyl ether, ethylene glycol diethyl ether, diethylene glycol methyl ether. , diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol ether, one (poly)alkylene glycol monoalkyl ethers such as dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, and tripropylene glycol ethyl ether; ethylene glycol methyl ether acetate, (poly)alkylene glycol monoalkyl ether acetates such as ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate, etc.; diglyme , other ethers such as diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; methyl 2-hydroxypropionate An alkyl lactate such as ethyl 2-hydroxypropionate; methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2- Ethyl propyl propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate , referred to as EEP), ethyl ethoxylate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl 3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate Ester, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate Ethyl ester, 2-methoxybutyl Other esters such as ethyl acetate; aromatic hydrocarbons such as toluene and xylene; nitrogen-methylpyrrolidone, nitrogen, nitrogen-dimethylformamide, or nitrogen, nitrogen-dimethylacetamide Such as guanamines and the like. Preferably, the solvent is selected from the group consisting of propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, or combinations thereof. The (poly)alkylene glycol monoalkyl ethers are referred to as alkylene glycol monoalkyl ethers or polyalkylene glycol monoalkyl ethers. The (poly)alkylene glycol monoalkyl ether acetates are referred to as alkylene glycol monoalkyl ether acetates or polyalkylene glycol monoalkyl ether acetates.
該第三鹼可溶性樹脂(C-3)製備時所使用之起始劑一般為自由基型聚合起始劑,具體例如:2,2'-偶氮雙異丁腈、2,2'-偶氮雙(2,4-二甲基戊腈)、2,2'-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、2,2'-偶氮雙-2-甲基丁腈(2,2'-azobis-2-methyl butyronitrile,簡稱AMBN)等之偶氮(azo)化合物;過氧化二苯甲醯等之過氧化合物。 The initiator used in the preparation of the third alkali-soluble resin (C-3) is generally a radical polymerization initiator, specifically, for example, 2,2'-azobisisobutyronitrile, 2,2'-couple Nitrogen bis(2,4-dimethylvaleronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis-2 An azo compound such as 2,2'-azobis-2-methyl butyronitrile (abbreviated as AMBN); or a peroxy compound such as dibenzoguanidine peroxide.
另外,上述第三鹼可溶性樹脂(C-3)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的數目平均分子量較佳為3,000至30,000,更佳為5,000至25,000。 Further, the third alkali-soluble resin (C-3) preferably has a polystyrene-equivalent number average molecular weight of 3,000 to 30,000, more preferably 5,000 to 25,000, as measured by a gel permeation chromatography (GPC). .
本發明之該乙烯性不飽和基的化合物(D)是選自一第一乙烯性不飽和基之化合物(D-1)、一第二乙烯性不飽和基之化合物(D-2)或此等之一組合。 The ethylenically unsaturated group-containing compound (D) of the present invention is a compound (D-1) selected from a first ethylenically unsaturated group, a second ethylenically unsaturated group-containing compound (D-2) or the like. One of the combinations.
該第一乙烯性不飽和基之化合物(D-1)是由經己內酯改質之多元醇與(甲基)丙烯酸反應而得的(甲基)丙烯酸酯系化合物。 The first ethylenically unsaturated group-containing compound (D-1) is a (meth) acrylate-based compound obtained by reacting a caprolactone-modified polyol with (meth)acrylic acid.
該經己內酯改質之多元醇是由該己內酯與具有4個官能基以上之多元醇反應而製得,其中,該己內酯可以是γ-己內酯、δ-己內酯,或ε-己內酯,且以ε-己內酯為佳。該具有4個官能基以上之多元醇可以是季戊四醇、二三羥甲基丙烷、二季戊四醇。較佳地,以該具有4個官能基以上之多元醇的含量為1莫耳計,該己內酯的含量範圍為1至12莫耳。 The caprolactone-modified polyol is obtained by reacting the caprolactone with a polyol having four or more functional groups, wherein the caprolactone may be γ-caprolactone or δ-caprolactone. Or ε-caprolactone, and preferably ε-caprolactone. The polyol having four or more functional groups may be pentaerythritol, ditrimethylolpropane or dipentaerythritol. Preferably, the content of the caprolactone ranges from 1 to 12 moles based on the content of the polyol having 4 functional groups or more.
該第一乙烯性不飽和基之化合物(D-1)是選自於季戊四 醇己內酯改質之四(甲基)丙烯酸酯類化合物、二三羥甲基丙烷己內酯改質之四(甲基)丙烯酸酯類化合物、二季戊四醇己內酯改質之多(甲基)丙烯酸酯類化合物等,其中,該二季戊四醇己內酯改質之多(甲基)丙烯酸酯類化合物可以是二季戊四醇己內酯改質之二(甲基)丙烯酸酯類化合物、二季戊四醇己內酯改質之三(甲基)丙烯酸酯類化合物、二季戊四醇己內酯改質之四(甲基)丙烯酸酯類化合物、二季戊四醇己內酯改質之五(甲基)丙烯酸酯類化合物、二季戊四醇己內酯改質之六(甲基)丙烯酸酯類化合物。 The first ethylenically unsaturated group compound (D-1) is selected from the group consisting of pentaerythritol The modification of the tetrakis (meth) acrylate compound modified by the alcohol caprolactone, the tetrakis (meth) acrylate compound modified by ditrimethylolpropane caprolactone, and the dipentaerythritol caprolactone (A An acrylate compound or the like, wherein the dipentaerythritol caprolactone modified poly(meth) acrylate compound may be dipentaerythritol caprolactone modified di(meth) acrylate compound, dipentaerythritol Caprolactone modified tris(meth)acrylate compound, dipentaerythritol caprolactone modified tetra(meth)acrylate compound, dipentaerythritol caprolactone modified penta(meth)acrylate A hexa (meth) acrylate compound modified with a compound or dipentaerythritol caprolactone.
上述之第一乙烯性不飽和基之化合物(D-1)具有式(VII)所示結構:
其中:Z1及Z2各自獨立表示氫或甲基;t表示1至2之整數;及b表示1至6之整數;c表示0至5至整數,其中該b與該c之總和為2至6之整數。 Wherein: Z 1 and Z 2 each independently represent hydrogen or methyl; t represents an integer from 1 to 2; and b represents an integer from 1 to 6; c represents from 0 to 5 to an integer, wherein the sum of b and c is 2 An integer of up to 6.
基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該第一乙烯性不飽和基之化合物(D-1)之使用量為10重量份至50重量份,較佳為13重量份至45重量份,更佳為15重量份至40重量份。當使用該第一乙烯性不飽和基之化合物(D-1)時,由此藍色感光性樹脂組成物所製得之畫素層之ITO濺鍍適性較佳。 The first ethylenically unsaturated group compound (D-1) is used in an amount of 10 parts by weight to 50 parts by weight, preferably 13 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C). To 45 parts by weight, more preferably 15 parts by weight to 40 parts by weight. When the first ethylenically unsaturated group-containing compound (D-1) is used, the ITO sputtering suitability of the pixel layer obtained from the blue photosensitive resin composition is preferable.
該第二乙烯性不飽和基之化合物(D-2)具有如式(IX)所示
的官能基:
式(IX)中,Z3表示氫或甲基。 In the formula (IX), Z 3 represents hydrogen or a methyl group.
該第二乙烯性不飽和基之化合物(D-2)可選自於丙烯醯胺、(甲基)丙烯醯嗎啉、(甲基)丙烯酸-7-氨基-3,7-二甲基辛酯、異丁氧基甲基(甲基)丙烯醯胺、(甲基)丙烯酸異冰片基氧乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸-2-乙基己酯、乙基二甘醇(甲基)丙烯酸酯、第三辛基(甲基)丙烯醯胺、二丙酮(甲基)丙烯醯胺、(甲基)丙烯酸二甲氨基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸二環戊烯氧乙酯、(甲基)丙烯酸二環戊烯酯、氮,氮-二甲基(甲基)丙烯醯胺、(甲基)丙烯酸四氯苯酯、(甲基)丙烯酸-2-四氯苯氧基乙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸四溴苯酯、(甲基)丙烯酸-2-四溴苯氧基乙酯、(甲基)丙烯酸-2-三氯苯氧基乙酯、(甲基)丙烯酸三溴苯酯、(甲基)丙烯酸-2-三溴苯氧基乙酯、(甲基)丙烯酸-2-羥乙酯、(甲基)丙烯酸-2-羥丙酯、乙烯基己內醯胺、氮-乙烯基皮酪烷酮、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸五氯苯酯、(甲基)丙烯酸五溴苯酯、聚單(甲基)丙烯酸乙二醇酯、聚單(甲基)丙烯酸丙二醇酯、(甲基)丙烯酸冰片酯、乙二醇二(甲基)丙烯酸酯、二(甲基)丙烯酸二環戊烯酯、三甘醇二(甲基)丙烯酸酯、四甘醇二(甲基)丙烯酸酯、三(2-羥乙基)異氰酸酯二(甲基)丙烯酸酯、三(2-羥乙基)異氰酸酯三(甲基)丙烯酸酯、己內酯改質之三(2-羥乙基)異氰酸酯三(甲基)丙烯酸酯、三(甲基)丙烯酸三羥甲基丙酯、環氧乙烷(以下簡稱EO)改質之三(甲基)丙烯酸三羥甲基丙酯、環氧丙烷(以下簡稱PO)改質之三(甲基)丙烯酸三羥甲基丙 酯、新戊二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、聚酯二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯(日本東亞合成株式會社製造之商品名為TO-1382的商品)、二季戊四醇四(甲基)丙烯酸酯、己內酯改質之二季戊四醇六(甲基)丙烯酸酯、EO改質之二季戊四醇六丙烯酸酯、己內酯改質之二季戊四醇五(甲基)丙烯酸酯、四(甲基)丙烯酸二三羥甲基丙酯、EO改質之雙酚A二(甲基)丙烯酸酯、PO改質之雙酚A二(甲基)丙烯酸酯、EO改質之氫化雙酚A二(甲基)丙烯酸酯、PO改質之氫化雙酚A二(甲基)丙烯酸酯、PO改質之甘油三丙酸酯、EO改質之雙酚F二(甲基)丙烯酸酯、酚醛聚縮水甘油醚(甲基)丙烯酸酯、三丙烯酸三羥甲基丙酯、EO改質之三丙烯酸三羥甲基丙酯、PO改質之三丙烯酸三羥甲基丙酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇四丙烯酸酯、己內酯改質之二季戊四醇六丙烯酸酯、四丙烯酸二三羥甲基丙酯。 The second ethylenically unsaturated group-containing compound (D-2) may be selected from the group consisting of acrylamide, (meth) propylene morpholine, (meth) acrylate-7-amino-3,7-dimethyl octyl Ester, isobutoxymethyl (meth) acrylamide, isobornyl oxyethyl (meth) acrylate, isobornyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, Ethyl diglycol (meth) acrylate, third octyl (meth) acrylamide, diacetone (meth) acrylamide, dimethyl amino (meth) acrylate, (meth) acrylate Dialkyl ester, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentenyl (meth)acrylate, nitrogen, nitrogen-dimethyl(meth)acrylamide, (meth)acrylic acid Chlorophenyl ester, 2-tetrachlorophenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, tetrabromophenyl (meth)acrylate,-2-tetrabromo(meth)acrylate Phenoxyethyl ester, 2-trichlorophenoxyethyl (meth)acrylate, tribromophenyl (meth)acrylate, 2-tribromophenoxyethyl (meth)acrylate, (A) 2-hydroxyethyl acrylate, 2-hydroxypropyl (meth)acrylate, vinyl caprolactam, nitrogen-vinyl leather Alkanone, phenoxyethyl (meth)acrylate, pentachlorophenyl (meth)acrylate, pentabromophenyl (meth)acrylate, polyethylene glycol mono(meth)acrylate, poly (a) Base) propylene glycol acrylate, borneol (meth)acrylate, ethylene glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraganyl Alcohol di(meth)acrylate, tris(2-hydroxyethyl)isocyanate di(meth)acrylate, tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, caprolactone modified three (2-Hydroxyethyl)isocyanate tri(meth)acrylate, trimethylolpropyl tri(meth)acrylate, ethylene oxide (hereinafter referred to as EO) modified tris(meth)acrylic acid Propyl propyl acrylate, propylene oxide (hereinafter referred to as PO) modified tris (meth) acrylate trimethylol propyl Ester, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, pentaerythritol tris(methyl) Acrylate, pentaerythritol tetra(meth)acrylate, polyester di(meth)acrylate, polyethylene glycol di(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta (methyl) Acrylate (trade name: TO-1382, manufactured by Japan East Asia Synthetic Co., Ltd.), dipentaerythritol tetra(meth)acrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate, EO modification Dipentaerythritol hexaacrylate, caprolactone modified dipentaerythritol penta (meth) acrylate, tetrakis (meth) acrylate ditrimethylol propyl ester, EO modified bisphenol A di(meth) acrylate Ester, PO modified bisphenol A di(meth) acrylate, EO modified hydrogenated bisphenol A di(meth) acrylate, PO modified hydrogenated bisphenol A di(meth) acrylate, PO Modified triglyceride, EO modified bisphenol F di(meth) acrylate, phenolic polyglycidyl ether (meth) acrylate, trishydroxy methacrylate Propyl ester, EO modified trimethylol propyl triacrylate, PO modified trimethylol propyl triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate Dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, ditrimethylolpropyl methacrylate.
較佳地,該第二乙烯性不飽和基之化合物(D-2)是選自於三丙烯酸三羥甲基丙酯、EO改質之三丙烯酸三羥甲基丙酯、PO改質之三丙烯酸三羥甲基丙酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇四丙烯酸酯、己內酯改質之二季戊四醇六丙烯酸酯、四丙烯酸二三羥甲基丙酯、PO改質之甘油三丙酸酯、日本東亞合成株式會社製造之商品名為TO-1382的商品或此等之一組合。 Preferably, the second ethylenically unsaturated group compound (D-2) is selected from trimethylol propyl triacrylate, EO modified trimethylol propyl triacrylate, and PO modified three. Trimethylolpropyl acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, tetraacrylic acid Ditrimethylolpropyl propyl ester, PO-modified triglyceride, a product of the trade name TO-1382 manufactured by Japan East Asia Synthetic Co., Ltd., or a combination thereof.
基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該第二乙烯性不飽和基之化合物(D-2)之使用量為40重量份至400重量份,較佳為45重量份至350重量份,更佳為50重量份至300重量份。 The second ethylenically unsaturated group compound (D-2) is used in an amount of 40 parts by weight to 400 parts by weight, preferably 45 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C). It is preferably from 50 parts by weight to 300 parts by weight to 350 parts by weight.
基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該乙烯性不飽和基之化合物(D)之使用量為50重量份至450重量份,較佳為55重量份至400重量份,更佳為60重量份至350重量份。 The ethylenically unsaturated group-based compound (D) is used in an amount of 50 parts by weight to 450 parts by weight, preferably 55 parts by weight to 400 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (C). More preferably, it is 60 parts by weight to 350 parts by weight.
根據本發明之該光起始劑(E)包含一具有式(VIII)所示結構之光起始劑(E-1):
其中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵素、NO2或
,或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7
或R7及R8彼此獨立地為經取代之C2-C10烯基或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-;或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼
此獨立地共同為;但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係;R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、(CO)OH或(CO)O(C1-C4烷基);或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、CN、OR17、
SR18或NR19R20;或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中該等取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環;
或R9、R10、R11及R12彼此獨立地為、COR16或NO2;Y係O、S、NR26或直接鍵;p係整數0、1、2或3;q係整數1、2或3;X係CO或直接鍵;R13係C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、
PO(OCkH2k+1)2或;或R13係C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或係C2-C12烯基,其未經間雜或間雜有一或多個O、CO或NR26,其中經間雜之C2-C20烷基及未經間雜或經間雜之C2-C12烯基未經取代或經一或多個鹵素取代;或R13係C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基;或R13係苯基或萘基,其各未經取代或經一或多個以下基團取
代:OR17、SR18、NR19R20、、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基;或其各經C3-C10環烷基或間
雜有一或多個O、S、CO或NR26之C3-C10環烷基取代;k係整數1至10;R14係氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其未經取代或經一或多個鹵素、苯基、C1-C20烷基苯基或CN取代;或R14係苯基或萘基,其各未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及/或NR19R20;或R14係C3-C20雜芳基、C1-C8烷氧基、苄氧基或苯氧基,該苄氧基及苯氧基未經取代或經一或多個C1-C6烷基、C1-C4鹵代烷基及/或鹵素取代;R15係C6-C20芳基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基;或其各經C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R15係氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基;或R15係C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、
CONR19R20、PO(OCkH2k+1)2、、、苯
基;或該C1-C20烷基經苯基取代,該苯基經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代;或R15係C2-C20烷基,其間雜有一或多個O、SO或SO2,且該經間雜之C2-C20烷基未經取代或經一或多個以下基團取代:鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基;或R15係C2-C20烷醯基或苯甲醯基,其未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20;或R15係未經取代或經一或多個OR17取代之萘甲醯基或係C3-C14雜芳基羰基;或R15係C2-C12烷氧基羰基,其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基未經取代或經一或多個羥基取代;或R15係苯氧基羰基,其未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20;或R15係CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基;或R15係SO2O-苯基,其未經取代或經C1-C12烷基取代;或係二苯基膦醯基或二(C1-C4烷氧基)-膦醯基;m係1或2;R'14具有針對R14所給出含義中之一者;R'15具有針對R15所給出含義中之一者;X1係O、S、SO或SO2;
X2係O、CO、S或直接鍵;R16係C6-C20芳基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16係氫、C1-C20烷基,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16係C2-C12烷基,其間雜有一或多個O、S或NR26;或R16係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基;或R16係經SR18取代之苯基,其中基團R18表示鍵結至其中附接有COR16之咔唑部分之苯基或萘基環的直接鍵;n係1至20;R17係氫、苯基-C1-C3烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、OCO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基;或R17係C2-C20烷基,其間雜有一或多個O、S或NR26;或R17係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、
C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基;或R17係C1-C8烷基-C3-C10環烷基,其未經間雜或間雜有一或多個O;或R17係苯甲醯基,其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17係苯基、萘基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯
基硫基、N(C1-C12烷基)2、二苯基-胺基或;
或R17形成鍵結至其上具有基團或之苯基或萘基環之一個碳原子之直接鍵;R18係氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基,其中C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基未經間雜或間雜有一或多個O、S、CO、NR26或COOR17;或R18係C1-C20烷基,其未經取代或經一或多個以下基團取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17;或R18係C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18係(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基;或R18係苯甲醯基,其未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基;
或R18係苯基、萘基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或
該具有式(VIII)所示結構之光起始劑(E-1)之特徵在於其在咔唑部分上包含一或多個成環(annelated)不飽和環。換言之,R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對係
在一實施例中,該具有式(VIII)所示結構之光起始劑(E-1),該C1-C20烷基係直鏈或支鏈且係(例如)C1-C18-、C1-C4-、C1-C12-、C1-C8-、C1-C8-或C1-C4烷基或C4-C12-或C4-C8烷基。實例係甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C1-C6烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。 In one embodiment, having the formula (VIII) as shown in the optical configuration of initiator (E-1), the C 1 -C 20 straight or branched alkyl chain line and lines (e.g.) C 1 -C 18 -, C 1 -C 4 -, C 1 -C 12 -, C 1 -C 8 -, C 1 -C 8 - or C 1 -C 4 alkyl or C 4 -C 12 - or C 4 -C 8 alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, decyl, decyl, dodecyl, tetradecyl, fifteen, hexadecyl, octadecyl and decyl. The C 1 -C 6 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms.
該含有一或多個C-C多重鍵之未經取代或經取代之C1-C20烷基係指如下文所解釋之烯基。 The unsubstituted or substituted C 1 -C 20 alkyl group containing one or more CC multiple bonds means an alkenyl group as explained below.
該C1-C4鹵代烷基係如下文所定義經鹵素取代之如上文所定義C1-C4烷基。烷基基團係(例如)單-或多鹵化,直至所有H-原子替換為鹵素。其係(例如)CnHxHaly,其中x+y=2n+1且Hal係鹵素,較佳為F。具體實例係氯甲基、三氯甲基、三氟甲基或2-溴丙基,尤其為三氟甲基或三氯甲基。C2-C4羥基烷基意指經一或兩個O原子取代之C2-C4烷基。烷基基團係直鏈或支鏈。實例係2-羥基乙基、1-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基丁基、4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3-二羥基丙基或2,4-二羥基丁基。C2-C10烷氧基烷基係間雜有一個O原子之C2-C10烷基。C2-C10烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。實例係甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 The C 1 -C 4 haloalkyl group as defined below, based substituted with halogen or as hereinbefore defined C 1 -C 4 alkyl. The alkyl group is, for example, mono- or polyhalogenated until all H-atoms are replaced by halogen. It is, for example, C n H x Hal y , wherein x+y=2n+1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C 2 -C 4 hydroxyalkyl means a C 2 -C 4 alkyl group substituted with one or two O atoms. The alkyl group is straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C 2 -C 10 alkoxyalkyl lines interrupted by one O C 2 -C 10 alkyl group atoms. The C 2 -C 10 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.
該間雜有一或多個O、S、NR26或CO之C2-C20烷基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團,則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該等烷基 係直鏈或支鏈。舉例而言,將存在以下結構單元:-CH2-CH2-O-CH2CH3、-[CH2CH2O]y-CH3(其中y=1至9)、-(CH2-CH2O)7-CH2CH3、-CH2-CH(CH3)-O-CH2-CH2CH3、-CH2-CH(CH3)-O-CH2-CH3、-CH2-CH2-S-CH2CH3、-CH2-CH(CH3)-NR26-CH2-CH3、-CH2-CH2-COO-CH2CH3或-CH2-CH(CH3)-OCO-CH2-CH2CH3。 a C 2 -C 20 alkyl group having one or more O, S, NR 26 or CO intermixed with O, S, NR 26 or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, an extended ethyl group). These alkyl groups are linear or branched. For example, the following structural units will be present: -CH 2 -CH 2 -O-CH 2 CH 3 , -[CH 2 CH 2 O] y -CH 3 (where y = 1 to 9), -(CH 2 - CH 2 O) 7 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 3 ,- CH 2 -CH 2 -S-CH 2 CH 3 , -CH 2 -CH(CH 3 )-NR 26 -CH 2 -CH 3 , -CH 2 -CH 2 -COO-CH 2 CH 3 or -CH 2 - CH(CH 3 )-OCO-CH 2 -CH 2 CH 3 .
該C3-C10環烷基、C3-C10環烷基及C3-C8環烷基在本申請案上下文中應理解為至少包含一個環之烷基。其係(例如)環丙基、環丁基、環戊基、環己基、環辛基、戊基環戊基及環己基。C3-C10環烷基在本發明上下文中亦意欲涵蓋二環,換言之,橋聯環,例 如、、及相應環。其他實例係諸如、 、(例如)或等結構、以及橋 聯或稠合環系統,舉例而言,該術語亦意欲涵蓋、等。 The C 3 -C 10 cycloalkyl, C 3 -C 10 cycloalkyl and C 3 -C 8 cycloalkyl are understood in the context of the present application to mean an alkyl group containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C 3 -C 10 cycloalkyl is also intended to encompass a bicyclic ring in the context of the present invention, in other words, a bridging ring, for example , , And the corresponding ring. Other examples are such as , , (E.g )or Such structures, as well as bridging or fused ring systems, for example, the term is also intended to cover , Wait.
該間雜有O、S、CO、NR26之C3-C20環烷基具有上文給出之含義,其中烷基中至少一個CH2-基團替換為O、S、CO或 NR26。實例係諸如、、(例如 )、、、、、 或等結構。 The C 3 -C 20 cycloalkyl group interspersed with O, S, CO, NR 26 has the meaning given above wherein at least one CH 2 - group in the alkyl group is replaced by O, S, CO or NR 26 . Examples are such as , , (E.g ), , , , , or And other structures.
該C1-C8烷基-C3-C10環烷基係經一或多個具有最多8個 碳原子之烷基取代的如上文所定義之C3-C10環烷基。實例係、 等。 The C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group is a C 3 -C 10 cycloalkyl group as defined above substituted with one or more alkyl groups having up to 8 carbon atoms. Instance system , Wait.
該間雜有一或多個O之C1-C8烷基-C3-C10環烷基係經一或多個具有最多8個碳原子之烷基取代的如上文所定義之O間雜C3- C10環烷基。實例係、等。 a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group having one or more O groups substituted by one or more alkyl groups having up to 8 carbon atoms, as defined above, O interstitial C 3 - C 10 cycloalkyl. Instance system , Wait.
該C1-C12烷氧基係經一個O原子取代之C1-C12烷基。C1-C12烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。該C1-C4烷氧基係直鏈或支鏈,例如甲氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基或第三丁氧基。C1-C8烷氧基及C1-C4-烷氧基具有與上文所述相同之含義且具有最高相應C原子數。 The C 1 -C 12 alkoxy substituted with the system via a O atom C 1 -C 12 alkyl. The C 1 -C 12 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. The C 1 -C 4 alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Third butoxy. The C 1 -C 8 alkoxy group and the C 1 -C 4 -alkoxy group have the same meanings as described above and have the highest corresponding number of C atoms.
該C1-C12烷基硫基係經一個S原子取代之C1-C12烷基。C1-C20烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。該C1-C4烷基硫基係直鏈或支鏈,例如甲基硫基、乙基硫基、丙基硫基、異丙基硫基、正丁基硫基、第二丁基硫基、異丁基硫基、第三丁基硫基。 The C 1 -C 12 substituted alkylthio system S atom of a C 1 -C 12 alkyl. The C 1 -C 20 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. The C 1 -C 4 alkylthio group is linear or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, and second butyl sulfide. Base, isobutylthio, tert-butylthio.
該苯基-C1-C3烷基係(例如)苄基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基,尤其為苄基。 The phenyl-C 1 -C 3 alkyl group is, for example, benzyl, phenylethyl, α-methylbenzyl or α,α-dimethyl-benzyl, especially benzyl.
該苯基-C1-C3烷氧基係(例如)苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基,尤其為苄氧基。 The phenyl-C 1 -C 3 alkoxy is, for example, a benzyloxy group, a phenylethoxy group, an α-methylbenzyloxy group or an α,α-dimethylbenzyloxy group, especially a benzyloxy group. .
該C2-C12烯基係單-或多不飽和且係(例如)C2-C10-、C2-C8-、C2-C5-烯基,例如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基,尤其為烯丙基。C2-C5烯基具有與上文針對C2-C12烯基所給出相同之含義且具有最高相應C原子數。 The C 2 -C 12 alkenyl group is mono- or polyunsaturated and is, for example, C 2 -C 10 -, C 2 -C 8 -, C 2 -C 5 -alkenyl, such as vinyl, allyl , methallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl , 7-octenyl or dodecenyl, especially allyl. The C 2 -C 5 alkenyl group has the same meaning as given above for the C 2 -C 12 alkenyl group and has the highest corresponding number of C atoms.
該間雜有一或多個O、CO或NR26之C2-C12烯基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若 存在一個以上間雜基團,則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該烯基係直鏈或支鏈且如上文所定義。舉例而言,可形成以下結構單元:-CH=CH-O-CH2CH3、-CH=CH-O-CH=CH2等。 The C 2 -C 12 alkenyl group having one or more O, CO or NR 26 is heterogeneous (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time by O, S, NR 26 or CO. Or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, an extended ethyl group). The alkenyl group is straight or branched and is as defined above. For example, the following structural units can be formed: -CH=CH-O-CH 2 CH 3 , -CH=CH-O-CH=CH 2 and the like.
該C4-C8環烯基具有一或多個雙鍵且係(例如)C4-C6-環烯基或C6-C8-環烯基。實例係環丁烯基、環戊烯基、環己烯基或環辛烯基,尤其為環戊烯基及環己烯基,較佳為環己烯基。 The C 4 -C 8 cycloalkenyl group has one or more double bonds and is, for example, a C 4 -C 6 -cycloalkenyl group or a C 6 -C 8 -cycloalkenyl group. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.
該C3-C6烯氧基係單或多不飽和且具有上文針對烯基所給出含義中之一者,且附接氧基具有最高相應C原子數。實例係烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。 The C 3 -C 6 alkenyloxy group is mono- or polyunsaturated and has one of the meanings given above for an alkenyl group, and the attached oxy group has the highest corresponding number of C atoms. Examples are allyloxy, methylallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.
該C2-C12炔基係單或多不飽和直鏈或支鏈且係(例如)C2-C8-、C2-C6-或C2-C4炔基。實例係乙炔基、丙炔基、丁炔基、1-丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。 The C 2 -C 12 alkynyl group is mono- or polyunsaturated linear or branched and is, for example, a C 2 -C 8 -, C 2 -C 6 - or C 2 -C 4 alkynyl group. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octyl group and the like.
該C2-C20烷醯基係直鏈或支鏈且係(例如)C2-C18-、C2-C14-、C2-C12-、C2-C8-、C2-C6-或C2-C4烷醯基或C4-C12-或C4-C8烷醯基。實例係乙醯基、丙醯基、丁醯基、異丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基、十二醯基、十四醯基、十五醯基、十六醯基、十八醯基、二十醯基,較佳為乙醯基。C1-C8烷醯基具有與上文針對C2-C20烷醯基所給出相同之含義且具有最高相應C原子數。 The C 2 -C 20 alkenyl group is linear or branched and is, for example, C 2 -C 18 -, C 2 -C 14 -, C 2 -C 12 -, C 2 -C 8 -, C 2 -C 6 - or C 2 -C 4 alkyl fluorenyl or C 4 -C 12 - or C 4 -C 8 alkyl fluorenyl. Examples are ethyl acetyl, propyl, butyl, isobutyl, pentylene, hexyl, decyl, octyl, fluorenyl, fluorenyl, fluorenyl, tetradecyl, fifteen Base, hexadecanyl, octadecyl, and decyl, preferably acetyl. The C 1 -C 8 alkano group has the same meaning as given above for the C 2 -C 20 alkano group and has the highest corresponding number of C atoms.
該C2-C12烷氧基羰基係直鏈或支鏈且係(例如)甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、異丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基,尤其為甲氧基 羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或異丁氧基羰基,較佳為甲氧基羰基。 The C 2 -C 12 alkoxycarbonyl group is straight or branched and is, for example, a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group, an isobutoxycarbonyl group, 1, 1-Dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.
該間雜有一或多個O之C2-C12烷氧基羰基係直鏈或支鏈。兩個O原子由至少兩個亞甲基(即伸乙基)隔開。該經間雜之烷氧基羰基未經取代或經一或多個羥基取代。該C6-C20芳氧基羰基係(例如)苯基氧基羰基[=苯基-O-(CO)-]、萘氧基羰基、蒽氧基羰基等。C5-C20雜芳氧基羰基係C5-C20雜芳基-O-CO-。 The C 2 -C 12 alkoxycarbonyl group having one or more O is linear or branched. The two O atoms are separated by at least two methylene groups (ie, an extended ethyl group). The meta-alkyloxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C 6 -C 20 aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [=phenyl-O-(CO)-], a naphthyloxycarbonyl group, a decyloxycarbonyl group or the like. C 5 -C 20 heteroaryloxycarbonyl C 5 -C 20 heteroaryl-O-CO-.
該C3-C10環烷基羰基係C3-C10環烷基-CO-,其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。該間雜有一或多個O、S、CO、NR26之C3-C10環烷基羰基係指經間雜環烷基-CO-,其中經間雜環烷基係如上文所述所定義。 The C 3 -C 10 cycloalkylcarbonyl system is C 3 -C 10 cycloalkyl-CO-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkylcarbonyl group having one or more of O, S, CO, NR 26 refers to a heterocycloalkylene group-CO-, wherein the meta-heterocycloalkylene group is as defined above.
該C3-C10環烷氧基羰基係C3-C10環烷基-O-(CO)-,其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。間雜有一或多個O、S、CO、NR26之C3-C10環烷氧基羰基係指經間雜環烷基-O-(CO)-,其中經間雜環烷基係如上文所述所定義。 The C 3 -C 10 cycloalkoxycarbonyl group is C 3 -C 10 cycloalkyl-O-(CO)-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkoxycarbonyl group having one or more O, S, CO, NR 26 refers to a heterocycloalkylene-O-(CO)- group, wherein the meta-heterocycloalkyl group is as described above Defined.
該C1-C20烷基苯基係指經一或多個烷基取代之苯基,其中C原子之總和最多為20。 The C 1 -C 20 alkylphenyl group means a phenyl group substituted by one or more alkyl groups, wherein the sum of C atoms is at most 20.
該C6-C20芳基係(例如)苯基、萘基、蒽基、菲基、芘基、基、并四苯基、聯伸三苯基等,尤其為苯基或萘基,較佳為苯基。萘基係1-萘基或2-萘基。 The C 6 -C 20 aryl group (for example) phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl, A tetraphenyl, a triphenyl or the like, especially a phenyl or naphthyl group, preferably a phenyl group. Naphthyl 1-naphthyl or 2-naphthyl.
在本發明上下文中,該C3-C20雜芳基意欲包含單環或多環系統,例如稠合環系統。實例係噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、唏基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、噠嗪基、中氮茚基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、啉基、 喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-啉基、6-啉基、7-啉基、3-甲氧基-7-啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the present invention, the C 3 -C 20 heteroaryl is intended to include monocyclic or polycyclic systems, such as fused ring systems. Examples are thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, Sulfhydryl, xanthenyl, thioxanthyl, phenothiphenyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, carbazinyl, isodecyl, fluorenyl , carbazolyl, fluorenyl, quinazolyl, isoquinolyl, quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, Polinyl, acridinyl, oxazolyl, β-carbolinyl, phenanthryl, acridinyl, naphthyldiazophenyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazine , isoxazolyl, furazolyl, phenomethoxy, 7-phenanthryl, inden-2-yl (=9,10-di-oxy-9,10-dihydroindol-2-yl), 3 -benzo[b]thienyl, 5-benzo[b]thienyl, 2-benzo[b]thienyl, 4-dibenzofuranyl, 4,7-dibenzofuranyl, 4-methyl Base-7-dibenzofuranyl, 2-xanthene, 8-methyl-2-indenyl, 3-indolyl, 2-morphothinyl, 2,7-morphothinyl, 2 -pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indenyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indenyl, 1-methyl-3-oxazolyl, 2 ,7-dimethyl-8-fluorenyl, 2-methoxy-7-methyl-8-fluorene , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolyl, 2-methoxy-3-quinolyl, 2-methoxy-6-quinolinyl, 6-pyridazinyl, 7-pyridazinyl, 1-methoxy -6-oxazinyl, 1,4-dimethoxy-6-pyridazinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2, 3-Dimethyl-6-quinoxalinyl, 2,3-dimethoxy-6-quinoxalinyl, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino -6-quinazolinyl, 3- Lolinyl, 6- Olinyl group, 7- Lolinyl, 3-methoxy-7- Lolinyl, 2-acridinyl, 6-acridinyl, 7-acridinyl, 6,7-dimethoxy-2-acridinyl, 2-oxazolyl, 3-oxazolyl, 9- Methyl-2-oxazolyl, 9-methyl-3-oxazolyl, β-carboline-3-yl, 1-methyl-β-carboline-3-yl, 1-methyl-β- Porphyrin-6-yl, 3-phenanthryl, 2-acridinyl, 3-acridinyl, 2-naphthyldiazophenyl, 1-methyl-5-naphthyldiazophenyl, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenothiazine , 3-phenothiazine, 10-methyl-3-phenothiazinyl, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl, 4-methyl-3-furazan Base, 2-oxo group, 10-methyl-2-phenoxy group, and the like.
該C3-C20雜芳基尤其為噻吩基、苯并[b]噻吩基、噻蒽基、噻噸基、1-甲基-2-吲哚基或1-甲基-3-吲哚基;尤其為噻吩基。 The C 3 -C 20 heteroaryl is especially thienyl, benzo[b]thienyl, thioxyl, thioxanthyl, 1-methyl-2-indenyl or 1-methyl-3-indole a base; especially a thienyl group.
該C4-C20雜芳基羰基係經由CO基團連接至分子其餘部分之如上文所定義C3-C20雜芳基。 The C 4 -C 20 heteroarylcarbonyl group is attached to the remainder of the molecule via a CO group as defined above for a C 3 -C 20 heteroaryl group.
該經取代之芳基(苯基、萘基、C6-C20芳基或C5-C20雜芳基)係分別經1至7次、1至6次或1至4次、尤其1次、2次或3次取代。顯而易見,所定義芳基不能具有比芳基環處之自由位置為多之取代基。 The substituted aryl (phenyl, naphthyl, C 6 -C 20 aryl or C 5 -C 20 heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 Sub, 2 or 3 substitutions. It will be apparent that the defined aryl group cannot have more substituents than the free position at the aryl ring.
該苯基環上之取代基較佳在苯基環上之位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-group. state.
該間雜1次或多次之經間雜基團間雜(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、1至3次或1次或2次(顯而易見,間雜原子數取決於擬間雜之C原子數)。經1次或多次取代之經取代基團具有(例如)1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 1 or 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, such as 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times 1, 1 to 3 or 1 or 2 times (obviously, the number of heteroatoms depends on the number of C atoms in the interstitial). The substituted group substituted by one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.
該經一或多個所定義取代基取代之基團意欲具有一個取代基或多個如所給出相同或不同定義之取代基。鹵素係氟、氯、溴及碘,尤其為氟、氯及溴,較佳為氟及氯。若R1及R2、R2及R3、R3及
R4或R5及Re、R6及R7、R7及R8彼此獨立地共同為;則形成(例如)以下結構(Ia)-I(i):
亦或(例如)諸
如(Id)-(Ih)等結構:
較佳者係結構(Ia)。 The preferred structure is (Ia).
該具有式(VIII)所示結構之光起始劑(E-1)之特徵在於至少一個苯基環與咔唑部分稠合以形成「萘基」環。亦即上述結構中之一者係以式(VIII)所示結構給出。 The photoinitiator (E-1) having the structure represented by the formula (VIII) is characterized in that at least one phenyl ring is partially fused with a carbazole to form a "naphthyl" ring. That is, one of the above structures is given by the structure shown in the formula (VIII).
若R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-,則形成(例如)諸如 等結構。 If R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken to be -(CH 2 ) P -Y- (CH 2 ) q -, forming, for example, such as And other structures.
若苯基或萘基環上之取代基OR17、SR18、SOR18、SO2R18或NR19R20經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環,則獲得包含3個或更多個環(包括萘基環)之結構。 If the substituent OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 on the phenyl or naphthyl ring is via the radicals R 17 , R 18 , R 19 and/or R 20 and the naphthyl ring When a carbon atom forms a 5- or 6-membered ring, a structure comprising 3 or more rings including a naphthyl ring is obtained.
實例係
若R17形成鍵結至其上具有基團或 之苯基或萘基環之一個碳原子之直接鍵,則形成(例 如)諸如等結構。 If R 17 forms a bond to have a group thereon or a direct bond of a carbon atom of a phenyl or naphthyl ring, for example, such as And other structures.
若R16係經SR18取代之苯基,其中基團R19表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵,則形成 (例如)諸如等結構。亦即,若R16係經SR18取代之苯基,其中基團R18表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵,則噻噸基部分與咔唑部分之一個苯基或萘基環一起形成。 If R 16 is a phenyl group substituted by SR 18 , wherein the group R 19 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR 16 group is attached, for example, such as And other structures. That is, if R 16 is a phenyl group substituted by SR 18 , wherein the group R 18 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR 16 group is attached, the thioxanthene The base moiety is formed together with a phenyl or naphthyl ring of the carbazole moiety.
若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環,則形成飽和或不飽和環,例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉。較佳地,若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環,則形成未經間雜或間雜有O或NR17、尤其O之5員或6員飽和環。 If R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR 17 , a saturated or unsaturated ring, such as aziridine, is formed. Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, if R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring of O, S or NR 17 as appropriate, an inter- or inter-molecular O is formed. Or NR 17 , especially the 5- or 6-member saturated ring of O.
若R21及R22與其所附接之N原子一起形成視情況間雜有O、S或NR26之5員或6員飽和或不飽和環,且苯環視情況與該飽和或不飽和環稠合,則形成飽和或不飽和環,例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉或相應 成環環(例如)等。 If R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR 26 , and the benzene ring is optionally fused to the saturated or unsaturated ring. , forming a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or corresponding ring Ring (for example )Wait.
若R19及R20與其所附接之N原子一起形成雜芳香族環系統,則該環系統意欲包含一個以上環(例如2個或3個環)以及來自相同種類或不同種類之一個或一個以上雜原子。適宜雜原子係(例如)N、S、O或P、尤其N、S或O。實例係咔唑、吲哚、異吲哚、吲唑、 嘌呤、異喹啉、喹啉、哢啉、吩噻嗪等。 If R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to contain more than one ring (eg 2 or 3 rings) and one or one from the same or different species. Above heteroatoms. Suitable hetero atomic systems are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, indole, isoindole, carbazole, anthracene, isoquinoline, quinoline, porphyrin, phenothiazine and the like.
術語「及/或」或「或/及」在本發明上下文中意欲表達不僅可存在所定義替代物(取代基)中之一者,而且可存在總共若干所定義替代物(取代基),即不同替代物(取代基)之混合物。 The term "and/or" or "or/and" is intended to mean in the context of the present invention that not only one of the defined substitutes (substituents) but also a plurality of defined substitutes (substituents) may be present, ie A mixture of different substitutes (substituents).
術語「至少」意欲定義一者或一者以上,例如一者或兩者或三者、較佳一者或兩者。 The term "at least" is intended to define one or more, such as one or both or three, preferably one or both.
術語「視情況經取代」意指其提及之基團未經取代或經取代。 The term "optionally substituted" means that the group to which it is referred is unsubstituted or substituted.
術語「視情況經間雜」意指其提及之基團未經雜或經間雜。 The term "as appropriate" means that the group to which it is referred is not miscellaneous or interstitial.
在整個本說明書及下文之申請專利範圍中,除非上下文另有要求,否則詞語「包含(comprise)」或變體(例如,「comprises」或「comprising」)應理解為暗指包括所述整數或步驟或整數群組或步驟群組,但並不排除任一其他整數或步驟或整數群組或步驟群組。術語「(甲基)丙烯酸酯」在本申請案上下文中意欲指丙烯酸酯以及相應甲基丙烯酸酯。 Throughout this specification and the claims below, the words "comprise" or variant (eg, "comprises" or "comprising") are understood to include the integer or A step or integer group or group of steps, but does not exclude any other integer or step or integer group or group of steps. The term "(meth)acrylate" is intended in the context of the present application to mean acrylate and the corresponding methacrylate.
本發明上下文中用於本發明化合物之文字中所示較佳者意欲指所有申請專利範圍類別,亦即亦指針對組合物、用途、方法、彩色濾光片等之申請專利範圍。 The preferred embodiments shown in the text for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent applications, i.e., the scope of application for compositions, uses, methods, color filters, and the like.
該具有式(VIII)所示結構之光起始劑(E-1)係藉由文獻中所述方法來製備,例如藉由在以下條件下使相應肟與醯鹵、尤其氯化物或酸酐反應:在惰性溶劑(例如第三丁基甲基醚、四氫呋喃(THF)或二甲基甲醯胺)中,在鹼(例如三乙胺或吡啶)存在時,或在鹼性溶劑(例如吡啶)中。在下文中作為實例,闡述式Ia化合物之製備,其中R7係肟酯基團且X係直接鍵係[自適當肟開始實施化合物(Ib)-(Ih)之反應]:
R1、R2、R5、R6、R8、R13、R14及R15係如上文所定義,Hal意指鹵素原子、尤其Cl。 R 1 , R 2 , R 5 , R 6 , R 8 , R 13 , R 14 and R 15 are as defined above, and Hal means a halogen atom, especially Cl.
R14較佳為甲基。 R 14 is preferably a methyl group.
此等反應為彼等熟習此項技術者所熟知,且通常在-15℃至+50℃、較佳0至25℃之溫度下實施。 Such reactions are well known to those skilled in the art and are typically carried out at a temperature of from -15 ° C to +50 ° C, preferably from 0 to 25 ° C.
當X係CO時,相應肟係藉由用亞硝酸烷基酯(例如亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯)將亞甲基亞硝化來合成。然後,酯化係在與上文所述相同之條件下實施:
因此,本發明之標的亦係藉由在鹼或鹼之混合物存在下使相應肟化合物與式(a)之醯鹵或式(b)之酸酐反應來製備如上文所定義該具有式(VIII)所示結構之光起始劑(E-1)之方法。 Thus, the subject matter of the invention is also prepared by reacting the corresponding hydrazine compound with an hydrazine halide of formula (a) or an anhydride of formula (b) in the presence of a mixture of bases or bases, as defined above, having formula (VIII) A method of the photoinitiator (E-1) of the structure shown.
其中Hal係鹵素、尤其Cl,且R14係如上文所定義。 Wherein Hal is halogen, especially Cl, and R 14 is as defined above.
所需作為起始材料之肟可藉由標準化學教材(例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)或專著(例如S.R.Sandler & W.Karo,Organic functional group preparations,第3卷,Academic Press)中所述多種方法來獲得。 The desired material for the starting material can be obtained by standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg S.R. Sandler & W.Karo, Organic functional group). Various methods are described in Preparations, Vol. 3, Academic Press.
最便利的一種方法係(例如)在極性溶劑(例如二甲基乙醯胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮與羥胺或其鹽反應。在此情形下,添加諸如乙酸鈉或吡啶等鹼來控制反應混合物之pH。眾所周知,反應速度具有pH依賴性,且可在開始時或在反應期間連續地添加鹼。亦可使用諸如吡啶等鹼性溶劑作為鹼及/或溶劑或共溶劑。反應溫度通常為室溫至混合物之回流溫度,一般為約20℃至120℃。 One of the most convenient methods is, for example, reacting an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. An alkaline solvent such as pyridine can also be used as the base and/or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.
相應酮中間體係(例如)藉由文獻(例如標準化學教材,例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)中所述方法來製備。另外,連續弗裏德-克拉夫茨反應(Friedel-Crafts reaction)可有效用於合成中間體。此等反應為彼等熟習此項技術者所熟知。 The corresponding ketone intermediate system, for example, is prepared by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. Such reactions are well known to those skilled in the art.
肟之另一便利合成係用亞硝酸或亞硝酸烷基酯將「活性」亞甲基亞硝化。鹼性條件(如(例如)Organic Syntheses coll.第VI卷(J.Wiley & Sons,New York,1988),第199頁及第840頁中所述)與酸性條件(如)例如)Organic Synthesis coll.第V卷,第32頁及第373頁,coll.第III卷,第191頁及第513頁,coll.第II卷,第202頁、第204頁及第363頁中所述)二者適於製備在本發明中用作起始材料之肟。一般自亞硝酸鈉產生亞硝酸。亞硝酸烷基酯可為(例如)亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯。 Another convenient synthesis of hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (e.g., for example) Organic Synthesis coll Volume V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363) It is suitable for the preparation of hydrazine used as a starting material in the present invention. Nitrous acid is generally produced from sodium nitrite. The alkyl nitrite can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
本發明另一實施例係具有游離式(IA)所示結構之光起始劑(E-1):
其中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵素、NO2或
針對式(IA)所示結構之光起始劑(E-1)所定義基團之較佳者對應於如針對如下文所給出式(VIII)所示結構之光起始劑(E-1)給出 者,只是每一所定義肟酯基團(例如)皆替換為相應游離肟 基團。 The preferred group of the group defined by the photoinitiator (E-1) of the structure represented by the formula (IA) corresponds to a photoinitiator (E- as defined for the structure of the formula (VIII) given below. 1) given, just for each defined oxime ester group (eg Are replaced by corresponding free sulfonium groups .
每一肟酯基團可以兩種構型(Z)或(E)存在。可藉由習用方法來分離異構體,但亦可使用異構體混合物作為(例如)光起始物質。因此,本發明亦係關於式(VIII)所示結構之光起始劑(E-1)之構型異構體之混合物。 Each oxime ester group can exist in two configurations (Z) or (E). The isomers can be separated by conventional methods, but a mixture of isomers can also be used as, for example, a photoinitiator. Accordingly, the present invention is also a mixture of configurational isomers of the photoinitiator (E-1) of the structure represented by the formula (VIII).
較佳者係如上文所定義之式(VIII)所示結構之光起始劑(E-1),其中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為
氫、C1-C20烷基、、COR16或NO2,或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為
必須重視如上文所定義之式(VIII)所示結構之光起始劑 (E-1),其中R1、R2、R5、R6、R7及R8彼此獨立地為氫、 COR16或NO2,R3及R4一起為;R9、R10、R11及R12係氫;X係直接鍵;R13係C1-C20烷基;R14係C1-C20烷基;R15係C1-C20烷基或苯基,其經一或多個OR17或C1-C20烷基取代;R16係苯基,其經一或多個C1-C20烷基或OR17取代;且R17係未經取代或經一或多個鹵素取代之C1-C20烷基或係間雜有一或多個O之C2-C20烷基; 但條件為在該分子中存在至少一個基團。 It is necessary to pay attention to the photoinitiator (E-1) of the structure represented by the formula (VIII) as defined above, wherein R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 or NO 2 , R 3 and R 4 together ; R 9 , R 10 , R 11 and R 12 are hydrogen; X is a direct bond; R 13 is a C 1 -C 20 alkyl group; R 14 is a C 1 -C 20 alkyl group; and R 15 is a C 1 -C 20 group; An alkyl or phenyl group substituted with one or more OR 17 or C 1 -C 20 alkyl groups; R 16 is a phenyl group substituted with one or more C 1 -C 20 alkyl groups or OR 17 ; and R 17 based unsubstituted or substituted with one or more of halogen or C 1 -C 20 alkyl interrupted by one or more lines of C 2 -C 20 O-alkyl; with the proviso that there is in the molecule at least one group .
本發明之標的進一步係如上文所定義之式(VIII)所示結構之光起始劑(E-1),其中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫,或R1及R2、R3及R4或R5及R6彼此獨立地共同為
本發明化合物之實例係如上文所定義之式(Ia)-(Ig)化合物。式(Ia)、(Ib)、(Ic)、尤其式(Ia)或(Ic)、或式(Ia)、(Ic)或(Id)、尤其式(Ia)之化合物令人關注。 Examples of compounds of the invention are the compounds of formula (Ia)-(Ig) as defined above. Compounds of formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially formula (Ia) are of interest.
舉例而言,R1、R2、R3、R4、R5、R6、R7及R8彼此 獨立地為氫、或COR16,或R1及R2、R2及R3、R3及R4或 R5及R6、R6及R7、R7及R8彼此獨立地共同為。 For example, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, Or COR 16 , or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are independently of each other .
舉例而言,R3及R4或R1及R2共同為或R3及 R4及R5及R6共同為;R3及R4尤其共同為。 For example, R 3 and R 4 or R 1 and R 2 are Or R 3 and R 4 and R 5 and R 6 are ; R 3 and R 4 are especially common .
舉例而言,R1、R5、R6及R8係氫。 For example, R 1 , R 5 , R 6 and R 8 are hydrogen.
R7尤其為氫、或COR16。或R7係 或COR16、尤其為。 R 7 is especially hydrogen, Or COR 16 . Or R 7 series Or COR 16 , especially .
R2尤其為,COR16或或R2與R1一 起為。R2尤其為COR16。 R 2 is especially , COR 16 or Or R 2 together with R 1 . R 2 is especially COR 16 .
X較佳為直接鍵。 X is preferably a direct bond.
舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成 5員或6員環;或R9、R10、R11及R12彼此獨立地為或COR16。 For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 wherein the substituent OR 17 SR 18 or NR 19 R 20 optionally via a group R 17, R 18, R 19 and / or R 20 form a 5 or 6-membered ring with a carbon atom naphthyl ring; or R 9, R 10, R 11 And R 12 are independent of each other Or COR 16 .
具體而言,舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此獨 立地為或COR16。 Specifically, for example, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or substituted by one or more of the following groups Phenyl group: C 1 -C 6 alkyl group, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are independent of each other Or COR 16 .
舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個C1-C6烷基取代之苯基;或 R9、R10、R11及R12彼此獨立地為或COR16。 For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or substituted by one or more C 1 -C 6 alkyl groups. Phenyl; or R 9 , R 10 , R 11 and R 12 are independently of each other Or COR 16 .
在另一實施例中,舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環。 In another embodiment, for example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or one or more of the following groups a substituted phenyl group: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 Wherein the substituent OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a group R 17 , R 18 , R 19 and/or R 20 with one carbon atom of the naphthyl ring.
此外,舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18,或R9、R10、R11及R12彼此獨 立地為鹵素、OR17、SR18、NR19R20或COR16。 Further, for example, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 , NR 19 R 20 or COR 16 .
或舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18,或R9、R10、R11及R12彼此獨立地為鹵素、OR17、COR16或NR19R20。 Or by way of example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , COR 16 or NR 19 R 20 .
較佳地,R9、R11及R12係氫且R10係氫、OR17或COR16。 Preferably, R 9 , R 11 and R 12 are hydrogen and R 10 is hydrogen, OR 17 or COR 16 .
R13係(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、COOR17或CONR19R20;或R13係C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或係C2-C12烯基,其視情況間雜有一或多個O、CO或NR26,或R13係C3-C10環烷基,其視情況間雜有一或多個O、S、CO、NR26,或R13係苯基或萘基,此二者未經取代或經一或多個以下基團取代:OR17、SR18、 NR19R20、、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O;或係C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或係C2-C20烷基,其間雜有一或多個O。 R 13 is, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 or CONR 19 R 20 ; or R 13 C 2 -C 20 alkyl In the meantime, one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group, optionally having one or more O, CO or NR 26 or R 13 systems a C 3 -C 10 cycloalkyl group optionally having one or more O, S, CO, NR 26 or R 13 phenyl or naphthyl groups, either unsubstituted or having one or more of the following groups Group replacement: OR 17 , SR 18 , NR 19 R 20 , , COR 16, NO 2, halogen, alkyl C 1 -C 20, C 1 -C 4 haloalkyl, C 2 -C 20-alkyl, heteroalkyl have therebetween one or more O; or C 1 -C 20 alkyl-based , which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; or C 2 -C 20 alkyl group with one or more O in between.
此外,R13係(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或係C2-C20烷基,其間雜有一或多個O;或係C2-C12烯基、C3-C10環烷基;或R13係苯基或萘基,此二者未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、 、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O。 Further, R 13 is, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group with one or more O; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group; or R a 13 -phenyl or naphthyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , And COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, with one or more O intervening.
在另一實施例中,R13係(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或係C2-C20烷基,其間雜有一或多個O;或係C2-C12烯基、C3-C10環烷基、苯基或萘基。 In another embodiment, R 13 lines (e.g.) C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following radicals: halogen, R 17, OR 17, SR 18 or PO (OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group, a phenyl group or a naphthyl group; .
或R13係(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或係C2-C20烷基,其間雜有一或多個O;或係苯基、C2-C12烯基或C3-C10環烷基。 Or R 13 is, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H2 k+1 ) 2; or C 2 -C 20 alkyl-based, or more therebetween O mixed with a; or a phenyl-based, C 2 -C 12 alkenyl or C 3 -C 10 cycloalkyl.
或R13係(例如)C1-C20烷基、苯基、C2-C12烯基或C3-C10環烷基。 Or R 13 lines (e.g.) C 1 -C 20 alkyl, phenyl, C 2 -C 12 alkenyl or C 3 -C 10 cycloalkyl.
或R13係(例如)C1-C20烷基、C2-C12烯基或C3-C10環烷基。 Or R 13 is, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.
較佳地,R13係C1-C20烷基,尤其為C1-C8烷基,例如2-乙基己基。 Preferably, R 13 is C 1 -C 20 alkyl, especially C 1 -C 8 alkyl, such as 2-ethylhexyl.
R14係(例如)氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其未經取代或經一或多個鹵素或苯基取代;或R14係苯基或萘基,此二者未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20;或R14係C3-C5雜芳基,例如噻吩基,或係C1-C8烷氧基、苄氧基或苯氧基。 R 14 is, for example, hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, unsubstituted or via one or a plurality of halogen or phenyl substitutions; or R 14 phenyl or naphthyl, both unsubstituted or substituted by one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl , halogen, OR 17 , SR 18 and/or NR 19 R 20 ; or R 14 C 3 -C 5 heteroaryl, such as thienyl, or C 1 -C 8 alkoxy, benzyloxy or phenoxy base.
或R14係(例如)C1-C20烷基,其未經取代或經一或多個鹵素或苯基取代;或R14係C3-C5雜芳基(例如噻吩基)或係未經取代或經取代一或多個以下基團取代之苯基:C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20;或R14係C1-C8烷氧基、苄氧基或苯氧基。 Or R 14 is, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more halogen or phenyl groups; or an R 14 C 3 -C 5 heteroaryl group (e.g., thienyl) or a system a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, OR 17 , SR 18 and/or NR 19 R 20 ; R 14 is a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group.
在另一實施例中,R14表示C1-C20烷基,其未經取代或經苯基取代;或R14係苯基,其未經取代或經一或多個C1-C6烷基取代。 In another embodiment, R 14 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with phenyl; or R 14 is phenyl, unsubstituted or via one or more C 1 -C 6 Alkyl substitution.
較佳地,R14係C1-C20烷基、C3-C5雜芳基(例如噻吩基),或係苯基,尤其為C1-C20烷基或噻吩基,尤其為C1-C8烷基。 Preferably, R 14 is C 1 -C 20 alkyl, C 3 -C 5 heteroaryl (such as thienyl), or phenyl, especially C 1 -C 20 alkyl or thienyl, especially C 1- C 8 alkyl.
R15係(例如)C6-C20芳基或C5-C20雜芳基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、C1-C20烷基;或R15係氫、C3-C8環烷基,該C3-C8環烷基視情況間雜有一或多個O、CO或NR26;或R15係C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OR17、C3-C8環烷基、C5-C20雜芳基、C8-C20苯氧基羰基、C5-C20雜芳氧基-羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、 、苯基或經以下基團取代之苯基:鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17或NR19R20;或R15係C2-C20烷基,其間雜有一或多個O、S或SO2,或R15係C2-C20烷醯基、苯甲醯基、C2-C12烷氧基羰基、苯氧基羰基、CONR19R20、NO2或C1-C4鹵代烷基。 R 15 is, for example, a C 6 -C 20 aryl group or a C 5 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkane Base, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , C 1 -C 20 alkyl; or R 15 hydrogen, C 3 -C 8 cycloalkyl, C 3 -C 8 cycloalkyl Depending on the case, one or more O, CO or NR 26 ; or R 15 C 1 -C 20 alkyl groups which are unsubstituted or substituted by one or more of the following groups: halogen, OR 17 , C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 8 -C 20 phenoxycarbonyl, C 5 -C 20 heteroaryloxy group - carbonyl, NR 19 R 20, COOR 17 , CONR 19 R 20, PO (OC k H 2k+1 ) 2 , Phenyl or phenyl substituted by the following groups: halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 or NR 19 R 20 ; or R 15 C 2 -C 20 alkyl In between, one or more of O, S or SO 2 , or R 15 C 2 -C 20 alkyl fluorenyl, benzhydryl, C 2 -C 12 alkoxycarbonyl, phenoxycarbonyl, CONR 19 R 20 , NO 2 or C 1 -C 4 haloalkyl.
此外,R15係(例如)氫、C6-C20芳基,尤其為苯基或萘基,其各未經取代或經C1-C12烷基取代;或係C3-C5雜芳基,例如噻吩基;或係C3-C8環烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OR17、SR17、C3-C8-環烷基、NR19R20或COOR17;或R15係C2-C20烷基,其間雜有一或多個O或SO2。 Further, R 15 is, for example, hydrogen, C 6 -C 20 aryl, especially phenyl or naphthyl, each unsubstituted or substituted by C 1 -C 12 alkyl; or C 3 -C 5 hetero An aryl group, such as a thienyl group; or a C 3 -C 8 cycloalkyl group, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 - C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 C 2 -C 20 alkyl, heterogeneously having one or more O or SO 2 .
該具有式(VIII)所示結構之光起始劑(E-1)令人關注,其中R15係(例如)氫、苯基、萘基,其各未經取代或經C1-C8烷基取代;或R15係噻吩基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OR17、SR17、C3-C8-環烷基、NR19R20或COOR17;或R15係C2- C20烷基,其間雜有一或多個O或SO2。 The photoinitiator (E-1) having the structure of the formula (VIII) is interesting, wherein R 15 is, for example, hydrogen, phenyl, naphthyl, each unsubstituted or via C 1 -C 8 An alkyl group substituted; or an R 15 -based thienyl group, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 is a C 2 - C 20 alkyl group in which one or more O or SO 2 are heterogeneous.
R15尤其為(例如)C3-C8環烷基或C1-C20烷基,尤其為C1-C20烷基,尤其為C1-C12烷基。 R 15 is especially, for example, C 3 -C 8 cycloalkyl or C 1 -C 20 alkyl, especially C 1 -C 20 alkyl, especially C 1 -C 12 alkyl.
R'14及R'15之較佳者分別係如上文針對R14及R15所給出者。 The preferred ones of R' 14 and R' 15 are as set forth above for R 14 and R 15 , respectively.
X1係(例如)O、S或SO,例如O或S,尤其為O。 X 1 is, for example, O, S or SO, such as O or S, especially O.
R16係(例如)C6-C20芳基(尤其苯基或萘基、尤其苯基)或C5-C20雜芳基(尤其噻吩基),其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-G4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O之C1-C20烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C5-C20雜芳基、C6-C20芳氧基羰基、C5-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16係氫、C1-C20烷基,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16係C2-C12烷基,其間雜有一或多個O;或係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基,且n係1至20,例如1至12或1至8,尤其為1或2。 R 16 is, for example, a C 6 -C 20 aryl group (especially phenyl or naphthyl, especially phenyl) or a C 5 -C 20 heteroaryl (especially thienyl), each unsubstituted or one or more Substituted for: phenyl, halogen, C 1 -G 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O; or each with one or more C 1 -C 20 substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , benzyl , C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 5 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20; or R 16 based hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C 3 - C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO) OH or (CO)O(C 1 -C 4 alkyl); or R 16 C 2 -C 12 alkyl, heterogeneously having one or more O; or (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 naphthenic And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.
此外,R16係(例如)苯基或萘基,尤其為苯基、噻吩基或咔唑,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16係C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16 係C2-C12烷基,其間雜有一或多個O;或係(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基,且n係1至20,例如1至12或1至8,尤其為1或2。 Furthermore, R 16 is, for example, phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C 1 -C a 4- haloalkyl group, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or an R 16 C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) , O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl); or R 16 C 2 -C 12 alkyl, in which one or more O; or (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl And n is from 1 to 20, such as from 1 to 12 or from 1 to 8, especially 1 or 2.
此外,R16係(例如)苯基或萘基,尤其為苯基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16係C3-C3雜芳基,尤其為噻吩基。 Further, R 16 is, for example, phenyl or naphthyl, especially phenyl, each unsubstituted or substituted with one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 C 3 -C 3 heteroaryl, especially thienyl.
R16尤其為(例如)苯基,其未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或C1-C20烷基,或R16係噻吩基。 In particular, R 16 is (e.g.) phenyl, which is unsubstituted or substituted with one or more of the following groups: OR 17, SR 18, NR 19 R 20 or C 1 -C 20 alkyl group, or R 16 based thienyl .
較佳地,R16係(例如)苯基或萘基,其各未經取代或經一或多個C1-C20烷基取代。 Preferably, R 16 is, for example, phenyl or naphthyl, each unsubstituted or substituted with one or more C 1 -C 20 alkyl groups.
R16尤其為苯基,其經一或多個C1-C20烷基取代。 R 16 is especially phenyl which is substituted by one or more C 1 -C 20 alkyl groups.
R17係(例如)氫、苯基-C1-C3烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OH、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基;或R17係C2-C20烷基,其間雜有一或多個O;係(CH2CH2O)n+1H、(GH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或C3-C20環烷基,其視情況間雜有一或多個O;或R17係苯甲醯基,其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17係苯基、萘基或C5-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯 基-胺基或。 R 17 is, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)-benzene a C 3 -C 20 cycloalkyl group; or a R 17 system having one or more O groups; or (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl or inter-hetero a C 2 -C 20 alkyl group in which one or more O is hetero; a system of (CH 2 CH 2 O) n+1 H, (GH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl) a C 1 -C 8 alkanoyl group, a C 2 -C 12 alkenyl group, a C 3 -C 6 olefinic group or a C 3 -C 20 cycloalkyl group optionally having one or more O; or an R 17 system a benzhydryl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy groups; or R 17 phenyl, naphthyl or C5-C a 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl- C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N(C 1 -C 12 alkyl) 2 , diphenyl-amine or .
在另一實施例中,R17係(例如)氫、苯基-C1-C3烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基;或係C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基、間雜有一或多個O之C2-C20烷基、視情況間雜有一或多個O之C3-C20環烷基;或係苯甲醯基,其未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH或C1-C3烷氧基;或係苯基或萘基,其各未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基或C1-C12烷氧基。 In another embodiment, R 17 is, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O; or a C 1 -C 8 alkyl fluorenyl, C 2 -C 12 alkenyl, C 3 -C 6 olefinic group, heterochromic one or more C 2 -C 20 alkyl groups, optionally with one or more C 3 a -C 20 cycloalkyl group; or a benzhydryl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; Or a phenyl or naphthyl group, each unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl or C 1 -C 12 alkoxy.
R17亦為(例如)氫、苯基-C1-C3烷基、C1-C8烷醯基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、C3-C20環烷基、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基,或R17係C2-C20烷基,其間雜有一或多個O。 R 17 is also, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, unsubstituted or via one or more of the following groups Substitution: halogen, C 3 -C 20 cycloalkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or miscellaneous one or more O C 2 -C 20 alkyl, or R 17 C 2 -C 20 alkyl, heterogeneous with one or more O.
R17尤其為氫、C1-C8烷醯基、C1-C20烷基,其未經取代或經一或多個以下基團取代:O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基,或R17係C2-C20烷基,其間雜有一或多個O。 R 17 is especially hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or substituted by one or more of the following groups: O(CO)-(C 1 -C 4 alkane a group of O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O, or an R 17 C 2 -C 20 alkyl group, having one or more O.
R18係(例如)C3-C20環烷基,其未經間雜或間雜有一或多個O;或R18係C1-C20烷基,其未經取代或經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18係C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18係C2-C8烷醯基或C3-C6烯醯基、苯甲醯基;或R18係苯基、萘基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基或NO2。 R 18 is, for example, a C 3 -C 20 cycloalkyl group which has no or a hetero or one or more O; or an R 18 C 1 -C 20 alkyl group which is unsubstituted or one or more Group substitution: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 C 2 -C a 20 alkyl group having one or more of O, S, CO, NR 26 or COOR 17 in between ; or an R 18 C 2 -C 8 alkanoyl group or a C 3 -C 6 alkenyl group or a benzamidine group; R 18 is phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkane Base, C 1 -C 12 alkoxy or NO 2 .
在另一實施例中,R18係(例如)C3-C20環烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18係苯基或萘基, 其各未經取代或經一或多個鹵素或C1-C12烷基、尤其鹵素取代。 In another embodiment, R 18 is, for example, C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 phenyl or naphthyl, each unsubstituted or via One or more halogen or C 1 -C 12 alkyl groups, especially halogen.
R18係(例如)C1-C20烷基、C2-C12烯基、C3-C20環烷基、苯基-C1-C3烷基、C2-C8烷醯基、苯甲醯基、苯基或萘基。 R 18 is, for example, C 1 -C 20 alkyl, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 2 -C 8 alkanoyl , benzylidene, phenyl or naphthyl.
舉例而言,R18係C1-C20烷基,其經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17,或R18係苯基,其經一或多個鹵素取代。 For example, R 18 is a C 1 -C 20 alkyl group substituted with one or more of the following groups: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 , or R 18 -phenyl, substituted by one or more halogens.
較佳地,R18係C1-C8烷基,其如上文所定義經取代。 Preferably, R 18 is C 1 -C 8 alkyl, which is substituted as defined above.
舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、苯基或萘基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環;或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統未經取代或經一或多個以下基團取代:C1-C20烷 基、C1-C4鹵代烷基、或。 For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a phenyl or naphthyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkenyloxy group, a C 3 -C 12 alkenyl group or a benzhydryl group; or R 19 and R 20 The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, or .
此外,舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜有O或NR17之5員或6員飽和環;或R19及R20與其所附接之N原子一起形成咔唑環。 Further, for example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C a 3 alkyl group, a C 1 -C 8 alkyl fluorenyl group, a C 1 -C 8 alkyl fluorenyloxy group, a C 3 -C 12 olefinic fluorenyl group or a benzhydryl group; or R 19 and R 20 are attached thereto The atoms together form a 5- or 6-membered saturated ring, optionally mixed with O or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form an indazole ring.
舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜有O或NR17之5員或6員飽和環。 For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenyl group or a benzhydryl group; or R 19 and R 20 together with the N atom to which it is attached Form a 5- or 6-membered saturated ring with O or NR 17 as appropriate.
較佳地,R19及R20彼此獨立地為C1-C8烷醯基、C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成嗎啉環。 Preferably, R 19 and R 20 are, independently of each other, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkenyloxy group; or R 19 and R 20 together with the N atom to which they are attached form a morpholine ring.
舉例而言,R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基;或R21及R22與其所附接之N原子一起形成嗎啉環。R21及R22尤其彼此獨立地為氫或C1-C20烷基。 For example, R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 The attached N atoms together form a morpholine ring. R 21 and R 22 are, in particular, independently of one another hydrogen or C 1 -C 20 alkyl.
R23係(例如)氫、OH、苯基或C1-C20烷基。R23尤其為氫、OH或C1-C4烷基。 R 23 is, for example, hydrogen, OH, phenyl or C 1 -C 20 alkyl. R 23 is especially hydrogen, OH or C 1 -C 4 alkyl.
R24之較佳者係如針對R19及R20所給出。R25之較佳者係如針對R17所給出。 The preferred of R 24 is as given for R 19 and R 20 . The preferred of R 25 is as given for R 17 .
R26係(例如)氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O或CO;或係苯基-C1-C4烷基、C3-C8環烷基,其視情況間雜有一或多個O或CO;或係(CO)R19或苯基,其未經取代或經一或多個以下基團取代:C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20。 R 26 is, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, heterogeneously having one or more O or CO; or phenyl-C 1 - a C 4 alkyl group, a C 3 -C 8 cycloalkyl group optionally having one or more O or CO; or a (CO)R 19 or phenyl group which is unsubstituted or has one or more of the following groups Substitution: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 .
或R26表示(例如)氫、C1-C20烷基、C1-C4鹵代烷基;係苯基-C1-C4烷基、C3-C8環烷基、(CO)R19或苯基,其未經取代或經一或多個C1-C20烷基取代。此外,R26係(例如)氫或C1-C20烷基、尤其為C1-C4烷基。 Or R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl; phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, (CO)R 19 or a phenyl group which is unsubstituted or substituted by one or more C 1 -C 20 alkyl groups. Further, R 26 is, for example, hydrogen or a C 1 -C 20 alkyl group, especially a C 1 -C 4 alkyl group.
本發明該具有式(VIII)所示結構之光起始劑(E-1)之實例如下所示:
該具有式(VIII)所示結構之光起始劑(E-1)用於使包含至少一種烯系不飽和光可聚合化合物之組合物光聚合之用途。 The photoinitiator (E-1) having the structure represented by the formula (VIII) is used for photopolymerization of a composition comprising at least one ethylenically unsaturated photopolymerizable compound.
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該具有式(VIII)所示結構之光起始劑(E-1)之使用量為2重量份至20重量份,較佳為2重量份至15重量份,更佳為2重量份至10重量份。當使用該具有式(VIII)所示結構之光起始劑(E-1)時,則由此藍色感光性樹脂組成物所製得畫素層之ITO濺鍍適性較佳。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the photoinitiator (E-1) having the structure represented by the formula (VIII) is used in an amount of 2 parts by weight. The portion is 20 parts by weight, preferably 2 parts by weight to 15 parts by weight, more preferably 2 parts by weight to 10 parts by weight. When the photoinitiator (E-1) having the structure represented by the formula (VIII) is used, the ITO sputtering suitability of the pixel layer produced by the blue photosensitive resin composition is preferable.
該光起始劑(E)可進一步包含其它自由基型光起始劑(E-2)。 The photoinitiator (E) may further comprise other radical type photoinitiators (E-2).
該其它自由基型光起始劑(E-2)可選自於苯乙酮系化合物(acetophenone)、二咪唑系化合物(biimidazole)、醯肟系化合物(acyl oxime)或此等之一組合。 The other radical type photoinitiator (E-2) may be selected from the group consisting of an acetophenone compound, a biimidazole compound, an acyl oxime compound, or a combination thereof.
上述的苯乙酮系化合物是選自於對二甲胺苯乙酮(p-dimethylamino-acetophenone)、α,α’-二甲氧基氧化偶氮苯乙酮(α,α’-dimethoxyazoxy-acetophenone)、2,2’-二甲基-2-苯基苯乙酮(2,2’-dimethyl-2-phenyl-acetophenone)、對甲氧基苯乙酮(p-methoxy-acetophenone)、2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮〔2-methyl-1-(4-methylthio phenyl)-2-morpholino-1-propanone〕、2-苄基-2-氮,氮-二甲胺-1-(4-嗎啉代苯基)-1-丁酮〔2-benzyl-2-N,N-dimethylamino-1-(4-morpholinophenyl)-1-butanone〕。 The above acetophenone-based compound is selected from the group consisting of p-dimethylamino-acetophenone, α,α'-dimethoxyoxo acetophenone (α,α'-dimethoxyazoxy-acetophenone). , 2,2'-dimethyl-2-phenyl-acetophenone, p-methoxy-acetophenone, 2- Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2- Benzyl-2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone [2-benzyl-2-N, N-dimethylamino-1-(4-morpholinophenyl)- 1-butanone].
上述的二咪唑系化合物是選自於2,2’-雙(鄰-氯苯基)- 4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-chlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-氟苯基)-4,4,5,5’-四苯基二咪唑〔2,2’-bis(o-fluorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-甲基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-methyl phenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-methoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(鄰-乙基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(o-ethylphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(對甲氧基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(p-methoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2,2’,4,4’-tetramethoxyphenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2-chlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑〔2,2’-bis(2,4-dichlorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕。 The above diimidazole-based compound is selected from 2,2'-bis(o-chlorophenyl)- 4,4',5,5'-o-chlorophenyl-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-double ( O-fluorophenyl)-4,4,5,5'-tetraphenyl-biimidazole, 2,2'-bis(o-fluorophenyl)-4,4',5,5'-tetraphenyl-biimidazole , 2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis(o-methyl phenyl)-4,4',5, 5'-tetraphenyl-biimidazole], 2,2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis(o-methoxyphenyl) -4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-ethylphenyl)-4,4',5,5'-tetraphenyldiimidazole [2, 2'-bis(o-ethylphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(p-methoxyphenyl)-4,4',5,5'- 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2,2',4,4'- Tetramethoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis(2,2',4,4'-tetramethoxyphenyl)-4,4',5 , 5'-tetraphenyl-biimidazole], 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2,4-dichlorophenyl)-4,4' , 5,5'-tetraphenyl-biimidazole [2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole].
上述的醯肟系化合物是選自於乙烷酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)〔Ethanone,1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(O-acetyl oxime),例如Ciba Specialty Chemicals製之品名為CGI-242者,其結構如下式(32)所示〕、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮2-(O-苯醯基肟)〔1-[4-(benzoyl)phenyl]-heptane-1,2-dione 2-(O-benzoyloxime),例如Ciba Specialty Chemicals製造之商品名為CGI-124之商品,其結構如下式(33)所示〕、乙烷酮,1-[9-乙基-6-(2-氯-4-苯甲基-硫代-苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)〔Ethanone,1-[9-ethyl-6-(2-cholro-4-benzyl-thio-benzoyl)-9H-carbazole-3-yl]-,1-(O-acetyl oxime),例如旭電化公司製,其結構如下式(34)所示〕:
較佳地,該其它自由基型光起始劑(E-2)是2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮、2-苄基-2-氮,氮-二甲胺-1-(4-嗎啉代苯基)-1-丁酮、2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑、乙烷酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟)或此等之一組合。 Preferably, the other radical photoinitiator (E-2) is 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl Base-2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone, 2,2'-bis(o-chlorophenyl)-4,4',5, 5'-tetraphenyldiimidazole, ethyl ketone, 1-[9-ethyl-6-(2-methylbenzylidenyl)-9hydro-oxazol-3-substituted group]-, 1-( Oxygen-acetamidine) or a combination of these.
本發明之其它自由基型光起始劑(E-2)可進一步添加下列之化合物:噻噸酮(thioxanthone)、2,4-二乙基噻噸酮(2,4-diethyl-thioxanthanone)、噻噸酮-4-碸(thioxanthone-4-sulfone)、二苯甲酮(benzophenone)、4,4’-雙(二甲胺)二苯甲酮〔4,4’-bis(dimethylamino)benzophenone〕、4,4’-雙(二乙胺)二苯甲酮〔4,4’-bis(diethylamino)benzophenone〕等之二苯甲酮(benzophenone)類化合物;苯偶醯(benzil)、乙醯基(acetyl)等之α-二酮(α-diketone)類化合 物;二苯乙醇酮(benzoin)等之酮醇(acyloin)類化合物;二苯乙醇酮甲醚(benzoin methylether)、二苯乙醇酮乙醚(benzoin ethylether)、二苯乙醇酮異丙醚(benzoin isopropyl ether)等之酮醇醚(acyloin ether)類化合物;2,4,6-三甲基苯醯二苯基膦氧化物(2,4,6-trimethyl-benzoyl-diphenyl-phosphineoxide)、雙-(2,6-二甲氧基苯醯)-2,4,4-三甲基苯基膦氧化物〔bis-(2,6-dimethoxy-benzoyl)-2,4,4-trimethyl-benzyl-phosphineoxide〕等之醯膦氧化物(acylphosphineoxide)類化合物;蒽醌(anthraquinone)、1,4-萘醌(1,4-naphthoquinone)等之醌(quinone)類化合物;苯醯甲基氯(phenacyl chloride)、三溴甲基苯碸(tribromomethyl-phenylsulfone)、三(三氯甲基)-s-三嗪〔tris(trichloromethyl)-s-triazine〕等之鹵化物;以及二-第三丁基過氧化物(di-tertbutylperoxide)等之過氧化物。其中,以二苯甲酮(benzophenone)類化合物較佳,尤以4,4’-雙(二乙胺)二苯甲酮為最佳。 The other radical type photoinitiator (E-2) of the present invention may further contain the following compounds: thioxanthone, 2,4-diethyl-thioxanthanone, Thioxanthone-4-sulfone, benzophenone, 4,4'-bis(dimethylamino)benzophenone a benzophenone compound such as 4,4'-diethylaminobenzophenone; benzil or acetamidine Alpha-diketone compound (acetyl) a acyloin compound such as benzoin; benzoin methylether, benzoin ethylether, benzoin isopropyl Ethyl ether ether acyloin ether compound; 2,4,6-trimethyl-benzoyl-diphenyl-phosphine oxide, bis-( 2,6-dimethoxybenzoquinone-2,4,4-trimethoxy-benzoyl-2,4,4-trimethyl-benzyl-phosphineoxide And other acylphosphine oxide compounds; quinone compounds such as anthraquinone, 1,4-naphthoquinone, etc.; phenacyl chloride; , a halide of tribromomethyl-phenylsulfone, tris(trichloromethyl)-s-triazine, etc.; and di-tertiary butyl peroxide (di-tertbutylperoxide) and the like. Among them, a benzophenone-based compound is preferred, and 4,4'-bis(diethylamine)benzophenone is particularly preferred.
當同時併用該具有式(VIII)所示結構之光起始劑(E-1)及其它自由基型光起始劑(E-2)時,則由此藍色感光性樹脂組成物所製得畫素層之ITO濺鍍適性更佳。 When the photoinitiator (E-1) having the structure of the formula (VIII) and other radical photoinitiator (E-2) are used in combination, the blue photosensitive resin composition is used. The ITO sputtering of the pixel layer is more suitable.
本發明該彩色濾光片用藍色感光性樹脂組成物的製備,通常是先將該有機顏料(A)以外的各成份溶解於有機溶劑(F)中,調製成液狀組成物,再加入該有機顏料(A)均勻混合。該有機溶劑(F)需選擇可溶解該染料(B)、鹼可溶性樹脂(C)、乙烯性不飽和基之化合物(D)以及光起始劑(E),且需不與該等成份相互反應並具有適當揮發性。 In the preparation of the blue photosensitive resin composition for a color filter of the present invention, usually, each component other than the organic pigment (A) is first dissolved in an organic solvent (F) to prepare a liquid composition, and then added. The organic pigment (A) is uniformly mixed. The organic solvent (F) is selected to dissolve the dye (B), the alkali-soluble resin (C), the ethylenically unsaturated group (D), and the photoinitiator (E), and is not required to interact with the components. The reaction is carried out with appropriate volatility.
於本發明之具體例中,基於該鹼可溶性樹脂(C)之使用量總和為100重量份,該有機溶劑(F)之使用量範圍為介於500重量份至5,000重量份;較佳為550重量份至4500重量份;更佳為600重量份至4000重量份。 In a specific example of the present invention, the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the organic solvent (F) is used in an amount ranging from 500 parts by weight to 5,000 parts by weight; preferably 550. The parts by weight are 4,500 parts by weight; more preferably 600 parts by weight to 4,000 parts by weight.
此外,該有機溶劑(F)可與製備該鹼可溶性樹脂(C)所使 用的溶劑相同,在此不再贅述。較佳地,該有機溶劑(F)是擇自於丙二醇甲醚醋酸酯或3-乙氧基丙酸乙酯。 Further, the organic solvent (F) can be prepared by preparing the alkali-soluble resin (C) The solvent used is the same and will not be described here. Preferably, the organic solvent (F) is selected from propylene glycol methyl ether acetate or ethyl 3-ethoxypropionate.
較佳地,根據本發明之彩色濾光片用藍色感光性樹脂組成物可另包含功能性添加物(G)。 Preferably, the blue photosensitive resin composition for a color filter according to the present invention may further contain a functional additive (G).
該功能性添加物(G)可單獨或混合使用,且該功能性添加物(G)包含但不限於玻璃、鋁等填充劑;聚乙烯醇、聚乙二醇單烷基醚、聚氟丙烯酸烷酯等鹼可溶性樹脂(C以外的高分子化合物;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧乙氧基)矽烷、氮-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、氮-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙醇丙基三甲氧基矽烷、3-環氧丙醇丙基甲基二甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯氧基丙基三甲氧基矽烷、3-硫醇基丙基三甲氧基矽烷等密著促進劑;2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚等抗氧化劑;2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯基疊氮、烷氧基苯酮等紫外線吸收劑;及聚丙烯酸鈉等防凝集劑。 The functional additive (G) may be used singly or in combination, and the functional additive (G) includes, but is not limited to, a filler such as glass or aluminum; polyvinyl alcohol, polyethylene glycol monoalkyl ether, polyfluoroacrylic acid Alkali-soluble resin such as alkyl ester (polymer compound other than C; vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris(2-methoxyethoxy) decane, nitrogen-(2-amino group) Ethyl)-3-aminopropylmethyldimethoxydecane, nitrogen-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxylate Decane, 3-glycidylpropyltrimethoxydecane, 3-glycidylpropylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyldimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxydecane, 3-thiolpropyltrimethoxydecane, etc. Promoter; 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol and other antioxidants; 2-(3-tert-butyl a UV absorber such as -5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide or alkoxyphenone; Anti-aggregating agent and sodium methacrylate.
本發明亦提供一種彩色濾光片之製造方法,其係使用前述之彩色濾光片用藍色感光性樹脂組成物形成一畫素層。 The present invention also provides a method of producing a color filter, which comprises forming a pixel layer using a blue photosensitive resin composition using the color filter described above.
本發明又提供一種彩色濾光片,其係由前述之方法所製得。 The present invention further provides a color filter which is produced by the aforementioned method.
較佳地,該彩色濾光片包含有畫素層,且該畫素層係使用前述彩色濾光片用感光性樹脂組成物所形成。 Preferably, the color filter includes a pixel layer, and the pixel layer is formed using the photosensitive resin composition for the color filter.
本發明之彩色濾光片之形成方法,主要係藉由迴轉塗佈、流延塗佈、噴墨塗佈(ink-jet)或輥式塗佈等塗佈方式,將混合成溶液狀態之前述彩色濾光片用感光性組成物塗佈在基板上。塗佈後, 先以減壓乾燥之方式,去除大部分之溶劑,再以預烤(pre-bake)方式將溶劑去除而形成一預烤塗膜。其中,減壓乾燥及預烤之條件,依各成份之種類,配合比率而異,通常,減壓乾燥乃是在0至200mmHg之壓力下進行1秒鐘至60秒鐘,而預烤乃是在70至110℃溫度下進行1分鐘至15分鐘。預烤後,該預烤塗膜於所指定之光罩(mask)下曝光,於23±2℃溫度下浸漬於顯影液15秒至5分鐘進行顯影,除去不要之部分而形成圖案。曝光使用之光線,以g線、b線、i線等之紫外線為佳,而紫外線裝置可為(超)高壓水銀燈或金屬鹵素燈。 The method for forming a color filter of the present invention is mainly a method of mixing into a solution state by a coating method such as rotary coating, cast coating, ink-jet coating or roll coating. The color filter is coated on the substrate with a photosensitive composition. After coating, Most of the solvent is removed by drying under reduced pressure, and the solvent is removed by pre-bake to form a pre-baked film. The conditions for drying under reduced pressure and pre-baking vary depending on the type of each component and the blending ratio. Usually, the drying under reduced pressure is carried out at a pressure of 0 to 200 mmHg for 1 second to 60 seconds, and the pre-baking is It is carried out at a temperature of 70 to 110 ° C for 1 minute to 15 minutes. After prebaking, the prebaked coating film is exposed to a designated mask, immersed in a developing solution at a temperature of 23 ± 2 ° C for 15 seconds to 5 minutes for development, and the unnecessary portion is removed to form a pattern. The light used for exposure is preferably ultraviolet rays such as g-line, b-line, and i-line, and the ultraviolet device may be a (ultra) high-pressure mercury lamp or a metal halide lamp.
前述基板之具體例如:用於液晶顯示裝置等之無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃及於此等玻璃上附著透明導電膜者;或用於固體攝影裝置等之光電變換裝置基板(如:矽基板)等等。此等基板一般係先形成隔離各畫素著色層之黑色矩陣(black matrix)。 Specific examples of the substrate include: alkali-free glass, soda-lime glass, hard glass (Pyrus glass), quartz glass, and the like, and a transparent conductive film attached to the glass; or a solid-state imaging device; A photoelectric conversion device substrate (such as a germanium substrate) or the like. These substrates generally form a black matrix that separates the colored layers of each pixel.
再者,顯影液之具體例如:氫氧化鈉,氫氧化鉀,碳酸鈉,碳酸氫鈉,碳酸鉀,碳酸氫鉀,矽酸鈉,甲基矽酸鈉,氨水,乙胺,二乙胺,二甲基乙醇胺,氫氧化四甲銨,氫氧化四乙銨,膽鹼,吡咯,呱啶,1,8-二氮雜二環-(5,4,0)-7-十一烯等鹼性化合物所構成之鹼性水溶液,其濃度一般為0.001至10重量%,較佳為0.005至5重量%,更佳為0.01至1重量%。 Further, specific examples of the developer include: sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium methyl citrate, ammonia, ethylamine, diethylamine, Dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine, 1,8-diazabicyclo-(5,4,0)-7-undecene The alkaline aqueous solution of the compound is generally present in a concentration of from 0.001 to 10% by weight, preferably from 0.005 to 5% by weight, more preferably from 0.01 to 1% by weight.
使用前述鹼性水溶液所構成之顯影液時,一般係於顯影後再以水洗淨,其次以壓縮空氣或壓縮氮氣將圖案風乾。 When the developer composed of the alkaline aqueous solution is used, it is usually washed with water after development, and then air-dried with compressed air or compressed nitrogen.
風乾後之具有光硬化塗膜層的基板,利用熱板或烘箱等加熱裝置,在溫度100至280℃下加熱1至15分鐘,將塗膜中的揮發性成分去除,並且使塗膜中未反應的乙烯性不飽和雙鍵進行熱硬化反應。使用各色(主要包括紅、綠、藍三色)之感光性樹脂組成物在預定的畫素上以同樣的步驟重複操作三次,即可得到紅、綠、藍三色之 光硬化畫素著色層。 After drying, the substrate having the photo-curing coating layer is heated by a heating means such as a hot plate or an oven at a temperature of 100 to 280 ° C for 1 to 15 minutes to remove volatile components in the coating film, and the coating film is not The reacted ethylenically unsaturated double bond undergoes a thermosetting reaction. The photosensitive resin composition of each color (mainly including red, green, and blue colors) is repeatedly operated in the same step on the predetermined pixel three times to obtain red, green, and blue colors. Light hardened pixel coloring layer.
其次,在畫素著色層上,以220℃至250℃溫度於真空下形成ITO(氧化銦錫)蒸鍍膜,必要時,對ITO蒸鍍膜施行蝕刻暨佈線之後,再塗佈液晶配向膜用聚醯亞胺,進而燒成之,即可作為液晶顯示器用之彩色濾光片。 Next, on the pixel colored layer, an ITO (indium tin oxide) deposited film is formed under vacuum at a temperature of 220 ° C to 250 ° C, and if necessary, after etching and wiring the ITO deposited film, the liquid crystal alignment film is coated. The quinone imine, which is then fired, can be used as a color filter for liquid crystal displays.
本發明又一目的在於提供一種液晶顯示裝置,該液晶顯示裝置包含前述彩色濾光片。 It is still another object of the present invention to provide a liquid crystal display device comprising the aforementioned color filter.
本發明之液晶顯示元件,主要係藉由上述彩色濾光片形成方法所形成之彩色濾光片基板,以及設置有薄膜電晶體(TFT,Thin Film Transistor)之驅動基板所構成,其中,在2片基板間介入間隙(晶胞間隔,cell gap)作對向配置,2片基板的周圍部位用封止劑貼合,在基板表面以及封止劑所區分出的間隙內充填注入液晶,封住注入孔而構成液晶晶胞(cell)。然後,在液晶晶胞的外表面,亦即構成液晶晶胞的各個基板的其他側面上,貼合偏光板而製得液晶顯示元件。 The liquid crystal display device of the present invention is mainly composed of a color filter substrate formed by the above-described color filter forming method and a driving substrate provided with a thin film transistor (TFT), wherein The inter-substrate gap (cell gap) is arranged in the opposite direction, and the peripheral portions of the two substrates are bonded together with a sealing agent, and the liquid crystal is filled in the gap between the surface of the substrate and the sealing agent to seal the injection. The holes constitute a liquid crystal cell. Then, a polarizing plate is bonded to the outer surface of the liquid crystal cell, that is, the other side surface of each of the substrates constituting the liquid crystal cell, to obtain a liquid crystal display element.
茲以下列實例予以詳細說明本發明,唯並不意謂本發明僅侷限於此等實例所揭示之內容。 The invention is illustrated by the following examples, which are not intended to be limited to the scope of the invention.
製備例1至5:式(III)所示之單體之合成 Preparation Examples 1 to 5: Synthesis of a monomer represented by the formula (III)
依據日本專利特開平10-226669號公報,使用1,4-二氮雜雙環[2.2.2]辛烷作為觸媒,如表1所示,由烯丙醇及對應之各α-羥基甲基丙烯酸酯(HMA-R)來合成式(III)所示之單體。 According to Japanese Patent Laid-Open No. Hei 10-226669, 1,4-diazabicyclo[2.2.2]octane is used as a catalyst, as shown in Table 1, from allyl alcohol and corresponding α-hydroxymethyl groups. Acrylate (HMA-R) to synthesize the monomer of formula (III).
合成例1:第一鹼可溶性樹脂(C-1-1)之製造方法 Synthesis Example 1: Method for Producing First Alkali Soluble Resin (C-1-1)
在一四頸錐瓶上設置攪拌器、溫度計、冷凝管及氮氣入口,並導入氮氣。然後,加入100重量份之丙二醇單甲醚乙酸酯,並將溫度升溫至100℃。接著,將5重量份製備例1中所得之α-烯丙氧基甲基丙烯酸甲酯(AMA-M)、40重量份之甲基丙烯酸(簡稱為MAA)、10重量份之甲基丙烯酸2-羥基乙酯(簡稱為HEMA)、40重量份之甲基丙烯酸苯甲酯(簡稱為BzMA)及5重量份之甲基丙烯酸異冰片酯(簡稱為IBOMA)及4重量份之偶氮二異戊腈溶於100重量份之丙二醇單甲醚乙酸酯中,並將此混合溶液於2小時內逐滴滴入四頸錐瓶中。於100℃反應6.5小時後,將15重量份之甲基丙烯酸環氧丙酯(簡稱為GMA)及10重量份之甲基丙烯酸-6,7-環氧庚酯(簡稱EP-MA)加至充滿氮氣之四頸錐瓶中,並將溫度上升至110℃。反應6小時後,即可製得合成例1之第一鹼可溶性樹脂(C-1-1)。 A stirrer, thermometer, condenser, and nitrogen inlet were placed on a four-necked flask and nitrogen was introduced. Then, 100 parts by weight of propylene glycol monomethyl ether acetate was added, and the temperature was raised to 100 °C. Next, 5 parts by weight of α-allyloxymethyl methacrylate (AMA-M) obtained in Preparation Example 1, 40 parts by weight of methacrylic acid (abbreviated as MAA), and 10 parts by weight of methacrylic acid 2 were added. -hydroxyethyl ester (abbreviated as HEMA), 40 parts by weight of benzyl methacrylate (abbreviated as BzMA) and 5 parts by weight of isobornyl methacrylate (abbreviated as IBOMA) and 4 parts by weight of azobis The valeronitrile was dissolved in 100 parts by weight of propylene glycol monomethyl ether acetate, and the mixed solution was dropwise added to a four-necked flask over 2 hours. After reacting at 100 ° C for 6.5 hours, 15 parts by weight of glycidyl methacrylate (abbreviated as GMA) and 10 parts by weight of -6,7-epoxyheptyl methacrylate (abbreviated as EP-MA) were added. In a four-necked flask filled with nitrogen, the temperature was raised to 110 °C. After reacting for 6 hours, the first alkali-soluble resin (C-1-1) of Synthesis Example 1 was obtained.
合成例2至6:第一鹼可溶性樹脂(C-1-2)至(C-1-6)之製造方法 Synthesis Examples 2 to 6: Method for Producing First Alkali Soluble Resin (C-1-2) to (C-1-6)
合成例C-1-2至C-1-6是以與合成例C-1-1相同的步驟來製備該第一鹼可溶性樹脂(C-1),不同的地方在於:改變成份的種類、使用量及反應條件,且詳載於表2。 Synthesis Examples C-1-2 to C-1-6 The first alkali-soluble resin (C-1) was prepared in the same manner as in Synthesis Example C-1-1 except that the kind of the component was changed, The amount used and the reaction conditions are detailed in Table 2.
合成例7:第二鹼可溶性樹脂(C-2-1)之製造方法 Synthesis Example 7: Method for Producing Second Alkali Soluble Resin (C-2-1)
將100重量份的芴環氧化合物(型號ESF-300,新日鐵化學製;環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯連續添加至500mL的四口燒瓶中,且入料速度控制在25重量份/分鐘,將溫度維持在100℃至110℃的範圍內,反應15小時後,即可獲得固體成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of an antimony epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 part by weight 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-mL four-necked flask, and the feed rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 ° C. After reacting for 15 hours in the range of 110 ° C, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.
接著,將100重量份的上述混合液溶於25重量份的乙二醇乙醚醋酸酯中,同時添加6重量份的四氫鄰苯二甲酸酐及13重量份的二苯甲酮四甲酸二酐,並加熱至110℃至115℃,反應2小時後,即可獲得酸價為98.0mgKOH/g,且數目平均分子量為1,623之第二鹼可溶性樹脂(C-2-1)。 Next, 100 parts by weight of the above mixture was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, while 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride were added. And heating to 110 ° C to 115 ° C, after reacting for 2 hours, a second alkali-soluble resin (C-2-1) having an acid value of 98.0 mgKOH/g and a number average molecular weight of 1,623 was obtained.
合成例8:第二鹼可溶性樹脂(C-2-2)之製造方法 Synthesis Example 8: Method for Producing Second Alkali Soluble Resin (C-2-2)
將100重量份的芴環氧化合物(型號ESF-300,新日鐵化學製;環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯連續添加至500mL的四口燒瓶中,且入料速度控制在25重量份/分鐘,將溫度維持在100℃至110℃的範圍內,反應15小時後,即可獲得固體成分濃度為50wt%之淡黃色透明混合液。 100 parts by weight of an antimony epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 part by weight 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-mL four-necked flask, and the feed rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 ° C. After reacting for 15 hours in the range of 110 ° C, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.
接著,將100重量份的上述混合液溶於25重量份的乙二醇乙醚醋酸酯中,同時添加13重量份的二苯甲酮四甲酸二酐,在90℃至95℃下反應2小時,接著,添加6重量份的四氫鄰苯二甲酸酐,並於90℃至95℃下反應4小時,即可獲得酸價為99.0mgKOH/g,且數目平均分子量為2,162之第二鹼可溶性樹脂(C-2-2)。 Next, 100 parts by weight of the above mixture was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, while 13 parts by weight of benzophenone tetracarboxylic dianhydride was added, and the reaction was carried out at 90 ° C to 95 ° C for 2 hours. Next, 6 parts by weight of tetrahydrophthalic anhydride is added and reacted at 90 ° C to 95 ° C for 4 hours to obtain a second alkali-soluble resin having an acid value of 99.0 mgKOH/g and a number average molecular weight of 2,162. (C-2-2).
合成例9:第二鹼可溶性樹脂(C-2-3)之製造方法 Synthesis Example 9: Method for Producing Second Alkali Soluble Resin (C-2-3)
將400重量份的環氧化合物(型號NC-3000,日本化藥 (株)製;環氧當量288)、102重量份的丙烯酸、0.3重量份的甲氧基酚(methoxyphenol)、5重量份的三苯基膦及264重量份的丙二醇甲醚醋酸酯置於反應瓶中,將溫度維持在95℃,反應9小時後,即可獲得酸價為2.2mgKOH/g之中間產物。接著,加入151重量份的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride),在95℃下反應4小時,即可獲得酸價為102mgKOH/g,且數目平均分子量為2,589之第二鹼可溶性樹脂(C-2-3)。 400 parts by weight of epoxy compound (Model NC-3000, Nippon Chemical Manufactured by the company; epoxy equivalent 288), 102 parts by weight of acrylic acid, 0.3 parts by weight of methoxyphenol, 5 parts by weight of triphenylphosphine, and 264 parts by weight of propylene glycol methyl ether acetate. In the bottle, the temperature was maintained at 95 ° C, and after 9 hours of reaction, an intermediate product having an acid value of 2.2 mg KOH / g was obtained. Next, 151 parts by weight of tetrahydrophthalic anhydride was added and reacted at 95 ° C for 4 hours to obtain a second alkali-soluble resin having an acid value of 102 mgKOH/g and a number average molecular weight of 2,589 ( C-2-3).
合成例10:第三鹼可溶性樹脂(C-3-1)之製造方法 Synthesis Example 10: Method for Producing Third Alkali Soluble Resin (C-3-1)
將1重量份的2,2’-偶氮雙異丁腈、240重量份的丙二醇甲醚醋酸酯、30重量份的2-甲基丙烯醯乙氧基丁二酸酯(簡稱為HOMS)、10重量份的甲基丙烯酸-2-羥基乙酯(簡稱為HEMA)、30重量份的甲基丙烯酸異冰片酯(簡稱為IBOMA)、10重量份的丁二烯、20重量份的苯乙烯置於一裝有攪拌器及冷凝器之圓底燒瓶中,並使該燒瓶內部充滿氮氣。然後,緩慢攪拌並升溫至80℃,使各反應物均勻混合並進行聚合反應4小時。接著,再將其升溫至100℃,並添加0.5重量份的2,2’-偶氮二異丁腈。進行聚合反應1小時後,即可製得第三鹼可溶性樹脂(C-3-1)。 1 part by weight of 2,2'-azobisisobutyronitrile, 240 parts by weight of propylene glycol methyl ether acetate, 30 parts by weight of 2-methylpropenyl ethoxy succinate (referred to as HOMS), 10 parts by weight of 2-hydroxyethyl methacrylate (abbreviated as HEMA), 30 parts by weight of isobornyl methacrylate (abbreviated as IBOMA), 10 parts by weight of butadiene, 20 parts by weight of styrene In a round bottom flask equipped with a stirrer and a condenser, the inside of the flask was filled with nitrogen. Then, the mixture was slowly stirred and heated to 80 ° C, and the respective reactants were uniformly mixed and subjected to polymerization for 4 hours. Then, it was further heated to 100 ° C, and 0.5 part by weight of 2,2'-azobisisobutyronitrile was added. After the polymerization reaction was carried out for 1 hour, a third alkali-soluble resin (C-3-1) was obtained.
合成例11:第三鹼可溶性樹脂(C-3-2)之製造方法 Synthesis Example 11: Method for producing third alkali-soluble resin (C-3-2)
在一四頸錐瓶上設置攪拌器、溫度計、冷凝管及氮氣入口,並導入氮氣。然後,加入135重量份之丙二醇單甲醚乙酸酯,並將溫度升溫至100℃。接著,將15重量份之甲基丙烯酸(簡稱為MAA)、15重量份之2-甲基丙烯醯乙氧基丁二酸酯(簡稱為HOMS)、30重量份之甲基丙烯酸苯甲酯(簡稱為BzMA)、20重量份之甲基丙烯酸異冰片酯(簡稱為IBOMA)、20重量份之苯乙烯及2.6重量份之偶氮二異丁腈溶於100重量份之丙二醇單甲醚乙酸酯中,並將此混合溶液於2小時內逐滴滴入四頸錐瓶中。於100℃反應5小時後,將10重量份之甲 基丙烯酸環氧丙酯(簡稱為GMA)及5重量份之甲基丙烯酸-6,7-環氧庚酯加至充滿氮氣之四頸錐瓶中,並將溫度上升至110℃。反應6小時後,即可製得第三鹼可溶性樹脂(C-3-2)。 A stirrer, thermometer, condenser, and nitrogen inlet were placed on a four-necked flask and nitrogen was introduced. Then, 135 parts by weight of propylene glycol monomethyl ether acetate was added, and the temperature was raised to 100 °C. Next, 15 parts by weight of methacrylic acid (abbreviated as MAA), 15 parts by weight of 2-methylpropenyl ethoxy succinate (referred to as HOMS), and 30 parts by weight of benzyl methacrylate ( Abbreviated as BzMA), 20 parts by weight of isobornyl methacrylate (abbreviated as IBOMA), 20 parts by weight of styrene and 2.6 parts by weight of azobisisobutyronitrile dissolved in 100 parts by weight of propylene glycol monomethyl ether acetate. And the mixed solution was dropped into a four-necked flask in 2 hours. After reacting at 100 ° C for 5 hours, 10 parts by weight of A Glycidyl acrylate (abbreviated as GMA) and 5 parts by weight of -6,7-epoxyheptyl methacrylate were added to a four-necked flask filled with nitrogen and the temperature was raised to 110 °C. After reacting for 6 hours, a third alkali-soluble resin (C-3-2) was obtained.
實施例1: Example 1:
使用前述合成例所得之第一鹼可溶性樹脂(C-1-1)100重量份、有機顏料(A-1)50重量份、染料(B-1)10重量份、式(VII)所示之化合物(其中t為1,b為3,c為3,Z1與Z2皆為氫)(以下簡稱D-1-1)10重量份、二季戊四醇六丙烯酸酯(以下簡稱D-2-1)40重量份、E-1-1 1重量份、1-[4-(苯硫基)苯基]-1,2-辛烷二酮2-(O-苯甲酰肟)(以下簡稱E-2-1)15重量份,加入有機溶劑3-乙氧基丙酸乙酯(以下簡稱F-1)500重量份後,以搖動式攪拌器,加以溶解混合,即可調製而得彩色濾光片用感光性樹脂組成物,該彩色濾光片用藍色感光性樹脂組成物以下述之各測定評價方式進行評價,所得結果如表3所示。 100 parts by weight of the first alkali-soluble resin (C-1-1) obtained in the above Synthesis Example, 50 parts by weight of the organic pigment (A-1), 10 parts by weight of the dye (B-1), and the formula (VII) a compound (wherein t is 1, b is 3, c is 3, and both Z 1 and Z 2 are hydrogen) (hereinafter referred to as D-1-1) 10 parts by weight, dipentaerythritol hexaacrylate (hereinafter referred to as D-2-1) 40 parts by weight, E-1-1 1 part by weight, 1-[4-(phenylthio)phenyl]-1,2-octanedione 2-(O-benzohydrazide) (hereinafter referred to as E -2-1) 15 parts by weight, 500 parts by weight of an organic solvent 3-ethoxypropionate ethyl ester (hereinafter referred to as F-1) was added, and then dissolved and mixed by a shaking stirrer to prepare a color filter. The photosensitive resin composition for a light sheet was used, and the blue photosensitive resin composition of this color filter was evaluated by the following measurement evaluation methods, and the results are shown in Table 3.
實施例2至13及比較例1至7: Examples 2 to 13 and Comparative Examples 1 to 7:
實施例2至13及比較例1至7係使用與實施例1彩色濾光片用藍色感光性樹脂組成物製作方法相同之操作方法,不同之處在於實施例2至13及比較例1至7係改變彩色濾光片用藍色感光性樹脂組成物中原料的種類及使用量,其配方及下列之評價結果如表3及表4所示。 Examples 2 to 13 and Comparative Examples 1 to 7 used the same operation method as the method for producing a blue photosensitive resin composition for a color filter of Example 1, except that Examples 2 to 13 and Comparative Example 1 were used. The type and amount of the raw materials in the blue photosensitive resin composition for the color filter were changed, and the formulation and the following evaluation results are shown in Tables 3 and 4.
表3及表4中:
評價方式: Evaluation method:
對比: Compared:
將感光性樹脂組成物以旋轉塗佈的方式,塗佈在100mm×100mm之玻璃基板上,先進行減壓乾燥,壓力100mmHg、時間30秒鐘,然後再進行預烤,溫度80℃、時間2分鐘,可形成一膜厚2.5μm之預烤塗膜。再以紫外光(曝光機Canon PLA-501F)100mJ/cm2的光量照射該預烤塗膜後,該預烤塗膜再浸漬於23℃之顯影液1分鐘,以純水洗淨。 The photosensitive resin composition was applied by spin coating to a glass substrate of 100 mm × 100 mm, and dried under reduced pressure at a pressure of 100 mmHg for 30 seconds, and then pre-baked at a temperature of 80 ° C and time 2 In a minute, a pre-baked film having a film thickness of 2.5 μm can be formed. Further, the prebaked coating film was irradiated with ultraviolet light (exposure machine Canon PLA-501F) at a light amount of 100 mJ/cm 2 , and then the prebaked coating film was further immersed in a developing solution at 23 ° C for 1 minute, and washed with pure water.
其次,再以235℃後烤30分鐘,即可在玻璃基板上形成一膜厚2.0μm之感光性樹脂層。 Next, after baking at 235 ° C for 30 minutes, a photosensitive resin layer having a film thickness of 2.0 μm was formed on the glass substrate.
由所得之感光性樹脂層,以圖1及圖2所示之方法所測得之輝度計算對比;其中,將所得的感光性樹脂層1置於兩枚偏光板2、3之間,從光源4所照射出來的光依序透過偏光板2、感光性樹脂層1、偏光板3,而最後透過偏光板3的輝度(cd/cm2)則以輝度計5(日本Topcon公司製,型號BM-5A)進行測量。 From the obtained photosensitive resin layer, the luminance measured by the method shown in FIGS. 1 and 2 is calculated and compared; wherein the obtained photosensitive resin layer 1 is placed between the two polarizing plates 2 and 3, and the light source is obtained from the light source. The light emitted by the fourth light is sequentially transmitted through the polarizing plate 2, the photosensitive resin layer 1, and the polarizing plate 3, and finally the luminance (cd/cm 2 ) transmitted through the polarizing plate 3 is measured by a luminance meter 5 (manufactured by Japan Topcon Co., Ltd., model BM). -5A) Take measurements.
如圖1所示,當偏光板3的偏光方向與偏光板2的偏光方向互相平行時,所測得之輝度為A(cd/cm2);另外,如圖2所示,當偏光板3的偏光方向與偏光板2的偏光方向互相垂直時,所測得之輝度為B(cd/cm2);則對比度可藉由輝度A與輝度B的比值(輝度A/輝度B)而得,其評價標準如下。 As shown in FIG. 1, when the polarizing direction of the polarizing plate 3 and the polarizing direction of the polarizing plate 2 are parallel to each other, the measured luminance is A (cd/cm 2 ); in addition, as shown in FIG. 2, when the polarizing plate 3 is used When the polarization direction is perpendicular to the polarization direction of the polarizing plate 2, the measured luminance is B (cd/cm 2 ); the contrast can be obtained by the ratio of luminance A to luminance B (luminance A/luminance B). The evaluation criteria are as follows.
◎:(輝度A/輝度B)≧3500 ◎: (luminance A / luminance B) ≧ 3500
○:3300≦(輝度A/輝度B)<3500 ○: 3300 ≦ (luminance A / luminance B) < 3500
△:3000≦(輝度A/輝度B)<3300 △: 3000 ≦ (luminance A / luminance B) < 3300
×:(輝度A/輝度B)<3000 ×: (luminance A/luminance B) <3000
顏料分散性: Pigment dispersion:
製備一不含光聚合起始劑感光性樹脂組成物,製備完成後於40℃的恆溫槽靜置7天後以E型黏度計測定,其評價標準如下。 A photosensitive resin composition containing no photopolymerization initiator was prepared, and after completion of the preparation, it was allowed to stand in a thermostat at 40 ° C for 7 days, and then measured by an E-type viscosity meter, and the evaluation criteria were as follows.
◎:黏度變化率<15% ◎: viscosity change rate <15%
○:15%<黏度變化率<20% ○: 15% < viscosity change rate <20%
△:20%<黏度變化率<25% △: 20% < viscosity change rate <25%
×:25%<黏度變化率 ×: 25% <viscosity change rate
ITO濺鍍適性: ITO sputtering suitability:
依照常規方法將ITO進行氣相沉積(膜厚1400Å;氣相沉積溫度為200℃)後,以原子力顯微鏡(SPA-400AFM,精工電子有限公司製)進行Ra值測定,其評價標準如下。 The ITO was subjected to vapor deposition (film thickness: 1400 Å; vapor deposition temperature: 200 ° C) according to a conventional method, and then Ra value was measured by an atomic force microscope (SPA-400 AFM, manufactured by Seiko Instruments Inc.), and the evaluation criteria were as follows.
◎:Ra<3nm ◎: Ra<3nm
○:3nm<Ra<8nm ○: 3 nm < Ra < 8 nm
△:8nm<Ra<10nm △: 8 nm < Ra < 10 nm
×:10nm<Ra ×: 10 nm < Ra
上述實施例僅為說明本發明之原理及其功效,而非限制本發明。習於此技術之人士對上述實施例所做之修改及變化仍不違背本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。 The above-described embodiments are merely illustrative of the principles and effects of the invention, and are not intended to limit the invention. Modifications and variations of the embodiments described above will be apparent to those skilled in the art without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.
1‧‧‧感光性樹脂層 1‧‧‧Photosensitive resin layer
2‧‧‧偏光板 2‧‧‧Polar plate
3‧‧‧偏光板 3‧‧‧Polar plate
4‧‧‧光源 4‧‧‧Light source
5‧‧‧輝度計 5‧‧‧luminometer
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CN201610069696.2A CN105867068A (en) | 2015-02-06 | 2016-02-01 | Blue photosensitive resin composition for color filter and application thereof |
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TW104125670A TWI648597B (en) | 2015-02-06 | 2015-08-06 | Blue photosensitive resin composition for color filters and uses thereof |
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Cited By (2)
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TWI731033B (en) * | 2017-02-10 | 2021-06-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
CN113336876A (en) * | 2021-06-11 | 2021-09-03 | 湖北固润科技股份有限公司 | Use of gamma, delta-unsaturated oxime ester compounds as photoinitiators |
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JP2009265641A (en) * | 2008-03-31 | 2009-11-12 | Sumitomo Chemical Co Ltd | Color filter |
TWI483955B (en) * | 2009-09-28 | 2015-05-11 | Nippon Catalytic Chem Ind | Α-allyloxymethyl methacrylate copolymer, resin composition and use thereof |
EP2788325B1 (en) * | 2011-12-07 | 2016-08-10 | Basf Se | Oxime ester photoinitiators |
TWI463257B (en) * | 2012-11-23 | 2014-12-01 | Chi Mei Corp | Photosensitive resin composition for color filters and uses thereof |
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TWI731033B (en) * | 2017-02-10 | 2021-06-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
CN113336876A (en) * | 2021-06-11 | 2021-09-03 | 湖北固润科技股份有限公司 | Use of gamma, delta-unsaturated oxime ester compounds as photoinitiators |
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