TW201623948A - Particle detection apparatus and metal mask detection apparatus - Google Patents
Particle detection apparatus and metal mask detection apparatus Download PDFInfo
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Abstract
Description
本發明係關於一種雜質微粒檢測裝置及金屬遮罩檢測裝置,尤其涉及一種用以檢測具有紋路的金屬表面的雜質微粒檢測裝置及金屬遮罩檢測裝置。 The present invention relates to an impurity particle detecting device and a metal mask detecting device, and more particularly to an impurity particle detecting device and a metal mask detecting device for detecting a metal surface having a grain.
有機發光二極體(OLED)顯示技術,具有低操作電壓、厚度薄、主動發光、全彩色而無需背光源、無視角限制、高應答速度,及製作容易等優點。因此,OLED顯示器成為發展潛力相當被看好的下一代顯示技術。隨著消費者對電子產品高顯示畫質的期待,OLED顯示器的影像解析度必須朝向高畫素(SVGA,XGA,SXGA...)發展,OLED重複蒸鍍製程中的金屬遮罩(Metal Mask)不可避免地亦須滿足高精密度的尺寸公差要求。 Organic light-emitting diode (OLED) display technology has the advantages of low operating voltage, thin thickness, active illumination, full color without backlight, no viewing angle limitation, high response speed, and easy fabrication. Therefore, OLED displays have become a next-generation display technology with considerable development potential. With consumers' expectations for high image quality of electronic products, the image resolution of OLED displays must be developed toward high pixels (SVGA, XGA, SXGA...), and metal masks in OLED repeated evaporation processes (Metal Mask) Inevitably, high-precision dimensional tolerance requirements must also be met.
金屬遮罩在OLED顯示器中的主要功能,在於提供不同顏色發光薄膜之高解析度蒸鍍量產化製程所需之遮罩。如果蒸鍍用金屬遮罩上有雜質微粒,將嚴重影響各有機發光層的精密度,進而影響了OLED顯示器畫質的均勻性(不均勻的Mura或Moire)。 The main function of metal masks in OLED displays is to provide masks for high resolution vapor deposition mass production processes of different color luminescent films. If there are impurity particles on the metal mask for vapor deposition, the precision of each organic light-emitting layer will be seriously affected, thereby affecting the uniformity of the image quality of the OLED display (uneven Mura or Moire).
然而,在進行蒸鍍過程中,有機材料可能會附著於金屬遮罩上,例如附著於金屬遮罩的表面上,更或者是部份的或全面的堵塞在開孔中。這造成後續蒸鍍製程之蒸鍍精度會明顯降低。再者,金屬遮罩的製備不易且成本高,因此金屬遮罩不單只使用在一個蒸鍍製程,而是在多個蒸鍍製程中不斷地被重覆使用。而且在每個蒸鍍製程之間,金屬遮罩必須往返被搬運到欲進行蒸鍍製程的設備腔室中。因此金屬遮罩難免會受到汙染,例如沾附了前次蒸鍍製程的有機材料或者是因搬運過程而附著於金屬 遮罩上的纖維、泥土、粉塵等雜質微粒。 However, during the evaporation process, the organic material may adhere to the metal mask, for example, to the surface of the metal mask, or may be partially or completely blocked in the opening. This causes the evaporation accuracy of the subsequent evaporation process to be significantly reduced. Furthermore, the metal mask is not easy to prepare and costly, so the metal mask is not only used in one evaporation process, but is continuously reused in a plurality of vapor deposition processes. Also, between each evaporation process, the metal mask must be transported back and forth to the equipment chamber where the evaporation process is to be performed. Therefore, the metal mask is inevitably contaminated, such as organic materials that have been adhered to the previous evaporation process or adhered to the metal due to the handling process. Impurity particles such as fibers, dirt, and dust on the mask.
綜上所述,為了維持蒸鍍精度,在完成一個蒸鍍製程之後,勢必得清洗金屬遮罩,並確認附著於其上的雜質顆已被確實地清除。 In summary, in order to maintain the vapor deposition precision, after completing an evaporation process, it is necessary to clean the metal mask and confirm that the impurity particles attached thereto have been reliably removed.
本發明提供一種雜質微粒檢測裝置及金屬遮罩檢測裝置,可檢測金屬表面的雜質微粒,以確認金屬表面是否清潔。 The present invention provides an impurity particle detecting device and a metal mask detecting device which can detect impurity particles on a metal surface to confirm whether the metal surface is clean.
在本發明之一實施例中,本發明提供了一種雜質微粒檢測裝置,用以檢測水平之一金屬表面之雜質微粒。雜質微粒檢測裝置包含一檢測光源以及一影像感測器。檢測光源具有一第一發光源及一第二發光源,以分別提供一第一帶狀光束及一第二帶狀光束入射至金屬表面。影像感測器具有一鏡頭及一條狀感測件,鏡頭用以接收來自金屬表面之光以聚焦至條狀感測件且鏡頭之一光軸垂直於金屬表面。其中,第一帶狀光束及第二帶狀光束之長軸為前後方向,條狀感測件之一長軸為前後方向,第一帶狀光束以一第一入射角入射至金屬表面之一檢測區,第一入射角係為大於等於45度並小於90度之一角度,第二發光源與第一發光源左右對稱,使第二帶狀光束入射至金屬表面的一第二入射角之角度相同於第一入射角之角度,且金屬表面具有沿左右方向之複數條紋路。 In one embodiment of the present invention, the present invention provides an impurity particle detecting device for detecting foreign particles of a metal surface of a level. The impurity particle detecting device includes a detecting light source and an image sensor. The detecting light source has a first light source and a second light source to respectively provide a first strip beam and a second strip beam to the metal surface. The image sensor has a lens and a strip-shaped sensing member for receiving light from the metal surface to focus on the strip-shaped sensing member and one of the optical axes of the lens is perpendicular to the metal surface. The long axis of the first strip beam and the second strip beam is a front-rear direction, and one of the long-axis directions of the strip-shaped sensing elements is a front-rear direction, and the first strip-shaped beam is incident on the metal surface at a first incident angle. In the detection area, the first incident angle is an angle greater than or equal to 45 degrees and less than 90 degrees, and the second illumination source is bilaterally symmetric with the first illumination source, so that the second ribbon beam is incident on a second incident angle of the metal surface. The angle is the same as the angle of the first angle of incidence, and the metal surface has a plurality of stripe paths in the left and right direction.
在本發明之另一實施例中,本發明提供了一種金屬遮罩檢測裝置,包含一機台、一承座以及一雜質微粒檢測裝置。機台係具有一傳送裝置及一架體,架體係跨設於傳送裝置上方,傳送裝置具有長方形之一置放座用以固定具有長方形之一框架,使框架可相對於架體以一第一水平軸向位移,其中置放座具有一框架上貼有至少一金屬遮罩,金屬表面具有同方向之複數條紋路,於框架固定於置放座時,複數條紋路呈左右方向。承座設於架體上,並可相對架體以一第二水平軸向位移,且第二水平軸向與第一水平軸向彼此垂直。雜質微粒檢測裝置,設於承座,並可相對承座垂直位移,雜質微粒檢測裝置包含一第一弧形槽、一第一發光源、一第二弧形槽、一第二發光源及一影像感測器,第一發光源,可移動地設於第一弧形槽,用以提供垂直第一弧形槽之一切線之一第一帶狀光束以入射至金屬遮罩之一檢測區,且第一弧形槽為以檢測區為一軸心之一圓弧槽,第二 弧形槽,與第一弧形槽以檢測區的中心點為一鏡射點,水平左右鏡向對稱,第二發光源,可移動地設於第二弧形槽,用以提供垂直第二弧形槽之一切線之一第二帶狀光束,第二帶狀光束入射至檢測區。 In another embodiment of the present invention, the present invention provides a metal mask detecting apparatus comprising a machine table, a socket and an impurity particle detecting device. The machine base has a conveying device and a frame body. The frame system is arranged above the conveying device. The conveying device has a rectangular one seat for fixing a frame having a rectangle, so that the frame can be first with respect to the frame body. The horizontal axial displacement, wherein the placement seat has a frame with at least one metal mask attached thereto, and the metal surface has a plurality of stripe paths in the same direction. When the frame is fixed to the placement seat, the plurality of stripe paths are in the left-right direction. The socket is disposed on the frame body and is axially displaceable relative to the frame body in a second horizontal direction, and the second horizontal axis is perpendicular to the first horizontal axis. The impurity particle detecting device is disposed on the socket and vertically displaceable relative to the socket, and the impurity particle detecting device comprises a first arc groove, a first light source, a second arc groove, a second light source and a An image sensor, the first illumination source, is movably disposed in the first arcuate groove for providing a first strip beam of all the lines of the first first arcuate slot to be incident on one of the detection regions of the metal mask And the first curved slot is an arc groove with the detection zone as an axis, and the second The arcuate groove is opposite to the center point of the detection zone by the first arcuate groove, the mirror is horizontally symmetrical, and the second illumination source is movably disposed in the second arcuate groove for providing a vertical second One of the lines of the arcuate groove is a second strip beam, and the second strip beam is incident on the detection zone.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.
1‧‧‧雜質微粒檢測裝置 1‧‧‧ Impurity particle detection device
4‧‧‧機台 4‧‧‧ machine
5‧‧‧傳送裝置 5‧‧‧Transfer device
6‧‧‧架體 6‧‧‧ ‧ body
7‧‧‧框架 7‧‧‧Frame
8‧‧‧金屬遮罩 8‧‧‧Metal mask
9‧‧‧承座 9‧‧‧ socket
10‧‧‧檢測光源 10‧‧‧Detection light source
16‧‧‧金屬表面 16‧‧‧Metal surface
16a‧‧‧檢測區 16a‧‧‧Detection area
20‧‧‧影像感測器 20‧‧‧Image Sensor
22‧‧‧鏡頭 22‧‧‧ lens
23‧‧‧光軸 23‧‧‧ optical axis
24‧‧‧散熱模組 24‧‧‧ Thermal Module
30‧‧‧四軸微調座 30‧‧‧ Four-axis fine tuning seat
31‧‧‧夾持座 31‧‧‧Clamping seat
32‧‧‧垂直平台 32‧‧‧Vertical platform
33‧‧‧旋轉軸座 33‧‧‧Rotary shaft seat
34‧‧‧旋轉基座 34‧‧‧Spinning base
35‧‧‧L基座 35‧‧‧L base
36‧‧‧第一旋轉台 36‧‧‧First Rotary Table
51‧‧‧置放座 51‧‧‧Places
52‧‧‧置放輪 52‧‧‧Place wheel
53‧‧‧氣壓缸 53‧‧‧ pneumatic cylinder
54‧‧‧滑軌 54‧‧‧rails
55‧‧‧槽座 55‧‧‧Seat
56‧‧‧軌道平台 56‧‧‧Track platform
57‧‧‧磁性導軌 57‧‧‧Magnetic rail
61‧‧‧滑軌 61‧‧‧rails
100‧‧‧第一支撐平台 100‧‧‧First support platform
101‧‧‧滑塊 101‧‧‧ Slider
102‧‧‧滑塊平台 102‧‧‧ Slider platform
122‧‧‧第一發光源 122‧‧‧First light source
123‧‧‧帶狀光束 123‧‧‧Belt beam
124‧‧‧馬達 124‧‧‧Motor
126‧‧‧第一驅動機構 126‧‧‧First drive mechanism
128‧‧‧第一弧形槽 128‧‧‧First curved slot
142‧‧‧第二發光源 142‧‧‧second source of illumination
143‧‧‧帶狀光束 143‧‧‧Belt beam
144‧‧‧馬達 144‧‧‧Motor
146‧‧‧第二驅動機構 146‧‧‧Second drive mechanism
148‧‧‧第二弧形槽 148‧‧‧Second curved groove
161‧‧‧開口 161‧‧‧ openings
163‧‧‧光束 163‧‧‧ Beam
165‧‧‧紋路 165‧‧‧ lines
166‧‧‧支撐架 166‧‧‧Support frame
200‧‧‧第二支撐平台 200‧‧‧second support platform
201‧‧‧滑軌 201‧‧‧Slide rails
202‧‧‧馬達 202‧‧‧Motor
221‧‧‧發光口 221‧‧‧Lighting mouth
261‧‧‧L型平台 261‧‧‧L-type platform
262‧‧‧滑塊 262‧‧‧ Slider
263‧‧‧軌道 263‧‧‧ Track
264‧‧‧軌平台 264‧‧‧Track platform
265‧‧‧馬達座 265‧‧‧Motor seat
266‧‧‧齒輪 266‧‧‧ Gears
268‧‧‧夾緊件 268‧‧‧Clamping parts
281‧‧‧弧形滑塊 281‧‧‧Shade slider
282‧‧‧弧形滑軌 282‧‧‧Shaped rails
283‧‧‧弧形平台 283‧‧‧ curved platform
284‧‧‧弧形齒條 284‧‧‧Shaped rack
311、312‧‧‧夾持孔 311, 312‧‧‧ holding holes
315‧‧‧旋轉塊 315‧‧‧ rotating block
316‧‧‧旋轉板 316‧‧‧Rotating plate
319‧‧‧方架 319‧‧‧ square frame
321‧‧‧垂直滑軌 321‧‧‧Vertical rails
322‧‧‧垂直滑塊 322‧‧‧ vertical slider
323‧‧‧垂直調整塊 323‧‧‧ vertical adjustment block
324‧‧‧螺絲 324‧‧‧ screws
328‧‧‧穿孔 328‧‧‧Perforation
329‧‧‧垂直架 329‧‧‧ vertical frame
331‧‧‧螺絲 331‧‧‧ screws
332‧‧‧旋轉塊 332‧‧‧ rotating block
333‧‧‧旋轉凹座 333‧‧‧Rotating recess
334、335‧‧‧螺絲 334, 335‧‧‧ screws
336‧‧‧凹槽 336‧‧‧ Groove
337、338‧‧‧片體塊 337, 338‧‧ ‧ body blocks
339‧‧‧旋轉架 339‧‧‧Rotating frame
341、342‧‧‧旋轉塊 341, 342‧‧‧ rotating blocks
343、344‧‧‧螺絲 343, 344‧‧‧ screws
349‧‧‧旋轉台 349‧‧‧Rotary table
361、362‧‧‧螺絲 361, 362‧‧‧ screws
363、364‧‧‧凸塊 363, 364‧‧ ‧ bumps
365‧‧‧凹口 365‧‧‧ notch
371、372、373、374‧‧‧弧形螺孔 371, 372, 373, 374‧‧‧ arc-shaped screw holes
381、382‧‧‧夾持板 381, 382‧‧‧ clamping plate
391‧‧‧表面 391‧‧‧ surface
a、c、d‧‧‧軸方向 a, c, d‧‧‧ axis direction
b‧‧‧垂直方向 b‧‧‧Vertical direction
θ 1‧‧‧入射角 θ 1‧‧‧ incident angle
θ 2‧‧‧入射角 θ 2‧‧‧ incident angle
第一圖為本發明之一較佳實施例的雜質微粒檢測裝置的立體結構示意圖。 The first figure is a schematic perspective view of an impurity particle detecting device according to a preferred embodiment of the present invention.
第二圖為本發明之一較佳實施例的雜質微粒檢測裝置的分解示意圖。 The second figure is an exploded perspective view of an impurity particle detecting device according to a preferred embodiment of the present invention.
第三圖為本發明之一較佳實施例的檢測光源的分解圖。 The third figure is an exploded view of a detection light source in accordance with a preferred embodiment of the present invention.
第四圖為第三圖所示的檢測光源的另一視角的分解圖。 The fourth figure is an exploded view of another perspective of the detection light source shown in the third figure.
第五圖為本發明之一較佳實施例的四軸微調座的分解圖。 Figure 5 is an exploded view of a four-axis fine adjustment seat in accordance with a preferred embodiment of the present invention.
第六圖為第五圖所示的四軸微調座的另一視角的分解圖。 The sixth figure is an exploded view of another perspective of the four-axis fine adjustment seat shown in the fifth figure.
第七圖為雜質微粒檢測裝置作動的前視圖。 The seventh drawing is a front view of the operation of the impurity particle detecting device.
第八圖為利用本發明的雜質微粒檢測裝置所拍攝之照片。 The eighth drawing is a photograph taken by the impurity particle detecting device of the present invention.
第九圖為根據本發明之一較佳實施例之金屬遮罩檢測裝置的立體結構示意圖。 Figure 9 is a perspective view showing the structure of a metal mask detecting device in accordance with a preferred embodiment of the present invention.
第十圖為根據本發明之一較佳實施例之置放座的立體結構示意圖。 Figure 11 is a perspective view of a three-dimensional structure of a placement base in accordance with a preferred embodiment of the present invention.
第一至三圖顯示本發明之沾黏機構的一個較佳實施例,其請參見第一圖,為本發明之一較佳實施例的雜質微粒檢測裝置的立體結構示意圖。雜質微粒檢測裝置係用以檢測一金屬表面是否存在雜質微粒。雜質微粒檢測裝置包含一檢測光源10以及一影像感測器20。在本實施例中,檢測光源10包含一第一發光源122及一第二發光源142;在實際應用時,可僅使用單一發光源作為檢測光源。第一發光源122與第二發光源142係左右對稱,以提供對稱的帶狀光束123、143至水平放置的金屬表面16的一檢測區16a。即,帶狀光束123、143之大小相同,且入射至檢測區16a的入射 角相等但左右相反。金屬表面可以是任何金屬材料之表面,其表面大致為一平面,例如:OLED製程所使用的金屬遮罩之表面。入射角的角度係在大於等於45度並小於90度之一角度之間,較佳為大於等於60度並等於小於80度。在本實施例中,帶狀光束123、143為前後長,左右窄之光束,入射至金屬表面16的檢測區16a時,照射區域仍為前後長,左右窄之形狀。 1 to 3 are a view showing a preferred embodiment of the adhesive mechanism of the present invention. Referring to the first drawing, a perspective view of the impurity particle detecting device according to a preferred embodiment of the present invention is shown. The impurity particle detecting device is for detecting the presence or absence of foreign particles on a metal surface. The impurity particle detecting device includes a detecting light source 10 and an image sensor 20. In this embodiment, the detecting light source 10 includes a first light source 122 and a second light source 142; in practical applications, only a single light source may be used as the detecting light source. The first illumination source 122 and the second illumination source 142 are bilaterally symmetric to provide a symmetrical strip beam 123, 143 to a detection zone 16a of the horizontally placed metal surface 16. That is, the strip beams 123, 143 are the same in size and incident on the detection region 16a. The angles are equal but the opposite is true. The metal surface can be the surface of any metallic material, the surface of which is substantially a flat surface, such as the surface of a metal mask used in an OLED process. The angle of incidence is between an angle of greater than or equal to 45 degrees and less than 90 degrees, preferably greater than or equal to 60 degrees and equal to less than 80 degrees. In the present embodiment, the strip beams 123 and 143 are long and narrow, and the left and right narrow beams are incident on the detection region 16a of the metal surface 16, and the irradiation region is still long and narrow, and the left and right are narrow.
請同時參見第二圖,為本發明之一較佳實施例的雜質微粒檢測裝置的分解示意圖。檢測光源10以及影像感測器20均設置於一第一支撐平台100之上。影像感測器20包含一條狀感測件(未繪出)以及一鏡頭22,垂直固設於第一支撐平台100。第一支撐平台100較佳可為倒Y形狀。檢測光源10中的第一發光源122及第二發光源142分別設置在倒Y形狀的第一支撐平台100的兩側支架上,而影像感測器20設置在倒Y形狀的第一支撐平台100的中央支架上。相較於方形的支撐平台,第一支撐平台100的倒Y形狀可以減輕整體重量,並且在左右兩側邊及下方的凹槽也可以降低雜質微粒檢測裝置於位置調整時碰撞周邊的元件的可能。條狀感測件可以為CCD或CMOS等感光元件,其長軸方向為前後方向,與帶狀光束123、143的方向平行,以對應帶狀光束123、143所照射之區域進行檢測。為了協助條狀感測件進行散熱,影像感測器20之上方,位於條狀感測件所在該測邊上固設有一散熱模組24,使條狀感測件於操作時,其溫度被控制一可操作溫度區間內,以避免過高的溫度,造成條狀感測件的雜訊過多,而影響檢測。鏡頭22係用以接收來自金屬表面16之反射光以聚焦至條狀感測件。 Please also refer to the second figure, which is an exploded perspective view of the impurity particle detecting device according to a preferred embodiment of the present invention. The detecting light source 10 and the image sensor 20 are both disposed on a first supporting platform 100. The image sensor 20 includes a strip of sensing elements (not shown) and a lens 22 that is vertically fixed to the first support platform 100. The first support platform 100 preferably has an inverted Y shape. The first illumination source 122 and the second illumination source 142 of the detection light source 10 are respectively disposed on the two side brackets of the inverted Y-shaped first support platform 100, and the image sensor 20 is disposed on the first support platform of the inverted Y shape. 100 on the center bracket. Compared with the square support platform, the inverted Y shape of the first support platform 100 can reduce the overall weight, and the grooves on the left and right sides and below can also reduce the possibility of the impurity particle detecting device colliding with the surrounding components during position adjustment. . The strip-shaped sensing member may be a photosensitive element such as a CCD or a CMOS, and its long-axis direction is a front-rear direction, which is parallel to the direction of the strip-shaped light beams 123 and 143, and is detected by the area irradiated by the strip-shaped light beams 123 and 143. In order to assist the heat dissipation of the strip-shaped sensing component, a heat-dissipating module 24 is fixed on the measuring edge of the strip-shaped sensing component above the image sensor 20, so that the temperature of the strip-shaped sensing component during operation is Controlling an operable temperature range to avoid excessive temperatures, causing excessive noise in the strip-shaped sensing member and affecting detection. The lens 22 is for receiving reflected light from the metal surface 16 to focus on the strip-shaped sensing member.
檢測光源10可更包含一第一驅動機構126及一第一弧形槽128,使第一發光源122藉由第一驅動機構126及第一弧形槽128,而可移動地設置於第一支撐平台100。第一發光源122固設於第一驅動機構126之上。一馬達124提供一動力,使第一驅動機構126沿著第一弧形槽128移動,進而使第一發光源122進行弧形移動。第一弧形槽128為以檢測區16a之中心點為圓心之一圓弧之一段,且第一發光源122所提供之帶狀光束123垂直於第一弧形槽128之一切線。因此,當第一驅動機構126帶動第一發光源122於第一弧形槽128移動時,第一發光源122與檢測區16a距離不變,且帶狀光束123維持照射檢測區16a,不受第一發光源122移動之影響。 The detecting light source 10 further includes a first driving mechanism 126 and a first curved slot 128, so that the first light source 122 is movably disposed on the first by the first driving mechanism 126 and the first curved slot 128. Support platform 100. The first illumination source 122 is fixed on the first driving mechanism 126. A motor 124 provides a power to move the first drive mechanism 126 along the first arcuate slot 128 to cause the first illumination source 122 to move in an arc. The first arcuate groove 128 is a segment of a circular arc centered on the center point of the detection zone 16a, and the strip beam 123 provided by the first illumination source 122 is perpendicular to the line of the first arcuate slot 128. Therefore, when the first driving mechanism 126 drives the first light source 122 to move in the first arcuate groove 128, the distance between the first light source 122 and the detecting area 16a is constant, and the strip beam 123 maintains the illumination detecting area 16a. The influence of the movement of the first illumination source 122.
同樣地,檢測光源10具有第二發光源142時,也可更包含 一第二驅動機構146及一第二弧形槽148(參見第二圖)。第二發光源142係藉由第二驅動機構146及第二弧形槽148,可移動地設置於第一支撐平台100。第二發光源142固設於第二驅動機構146之上。一馬達144提供一動力,使第二驅動機構146沿著第二弧形槽148移動,進而使第二發光源142進行弧形移動。第二弧形槽148為以檢測區16a之中心點為圓心之一圓弧之一段,且與第一弧形槽128左右對稱。即,第二弧形槽148與第一弧形槽128以檢測區16a的中心點為一鏡射點,水平左右鏡向對稱。第二發光源142所提供之帶狀光束143垂直於第二弧形槽148之一切線。因此,當第二驅動機構146帶動第二發光源142於第二弧形槽148移動時,第二發光源142與檢測區16a距離不變,且帶狀光束143維持照射檢測區16a,不受第二發光源142移動之影響。 Similarly, when the detection light source 10 has the second illumination source 142, it may be further included A second drive mechanism 146 and a second arcuate slot 148 (see second figure). The second illumination source 142 is movably disposed on the first support platform 100 by the second driving mechanism 146 and the second curved slot 148. The second illumination source 142 is fixed on the second driving mechanism 146. A motor 144 provides a power to move the second drive mechanism 146 along the second arcuate slot 148, thereby causing the second illumination source 142 to move in an arc. The second arcuate groove 148 is a segment of a circular arc centered on the center point of the detection zone 16a, and is bilaterally symmetrical with the first arcuate groove 128. That is, the second arcuate groove 148 and the first arcuate groove 128 have a mirror point with the center point of the detection zone 16a, and the horizontal left and right mirrors are symmetrical. The strip beam 143 provided by the second illumination source 142 is perpendicular to the line of the second arcuate slot 148. Therefore, when the second driving mechanism 146 drives the second illumination source 142 to move in the second arcuate groove 148, the distance between the second illumination source 142 and the detection area 16a is constant, and the strip beam 143 maintains the illumination detection area 16a. The influence of the movement of the second illumination source 142.
請同時參見第一圖及第二圖,第一支撐平台100可垂直移動地設置於一第二支撐平台200上。第二支撐平台200之兩側各有一垂直之滑軌201。第一支撐平台100對應滑軌201各有有垂直排列之二滑塊101,滑塊101卡於對應的滑軌201之溝槽。一滑塊平台102連接該些滑塊101,而第一支撐平台100固設於滑塊平台102上。當滑塊101於滑軌201上移動時,第一支撐平台100可相對於第二支撐平台200移動。一馬達202固設於第二支撐平台200上,於其旋轉軸轉動時推動滑塊平台102相對於第二支撐平台200於垂直方向移動。 Please refer to the first figure and the second figure at the same time, the first support platform 100 can be vertically movably disposed on a second support platform 200. Each of the two sides of the second support platform 200 has a vertical slide rail 201. The first support platform 100 has two sliders 101 arranged vertically corresponding to the slide rails 201, and the slider 101 is stuck to the groove of the corresponding slide rail 201. A slider platform 102 connects the sliders 101, and the first support platform 100 is fixed on the slider platform 102. When the slider 101 moves on the slide rail 201, the first support platform 100 can move relative to the second support platform 200. A motor 202 is fixed to the second support platform 200 and pushes the slider platform 102 to move in a vertical direction relative to the second support platform 200 when the rotating shaft thereof rotates.
當第一支撐平台100相對於第二支撐平台200進行垂直上下移動時,可以調整帶狀光束123、143照射於金屬表面16之位置。由於帶狀光束123、143之入射角相同,當帶狀光束123、143照射區域完全重疊時,帶狀光束123、143所照射的區域即為檢測區16a。為了使影像感測器20正確對焦,第一發光源122、第二發光源142除可作為檢測光源外,也可同時作為對焦光源,以提供足夠之光照明以進行對焦。影像感測器20可以調整鏡頭22及/或條狀感測件之位置,以調整鏡頭22與條狀感測件之間的相對距離,藉此使檢測區16a之光線正確聚焦於條狀感測件。或者,鏡頭22可垂直移動地設置於第一支撐平台100,藉由上下調整鏡頭22與檢測區16a之間的距離(此時鏡頭22與條狀感測件之間的相對距離可以維持不變),使調整檢測區16a之光線正確聚焦於條狀感測件。 When the first support platform 100 is vertically moved up and down relative to the second support platform 200, the position of the strip beams 123, 143 on the metal surface 16 can be adjusted. Since the incident angles of the strip beams 123 and 143 are the same, when the irradiation areas of the strip beams 123 and 143 are completely overlapped, the area irradiated by the strip beams 123 and 143 is the detection area 16a. In order to make the image sensor 20 correctly focus, the first illumination source 122 and the second illumination source 142 can be used as a detection source as well as a focus source to provide sufficient illumination for focusing. The image sensor 20 can adjust the position of the lens 22 and/or the strip sensing member to adjust the relative distance between the lens 22 and the strip sensing member, thereby correcting the light of the detecting portion 16a to the strip shape. Measuring piece. Alternatively, the lens 22 can be vertically movably disposed on the first support platform 100, and the distance between the lens 22 and the detection area 16a can be adjusted up and down (the relative distance between the lens 22 and the strip-shaped sensing element can be maintained at this time). ), the light of the adjustment detection area 16a is correctly focused on the strip-shaped sensing member.
在本實施例,額外以一第三發光源162,提供一光束163(參見第一圖)作為對焦光源,以一第三入射角入射至金屬表面16。在本實施例,第三發光源162所產生之光束163亦為帶狀光束,因此也可以同時作為檢測光源。實際應用時,光束可以為圓形、方形或其他形狀之光束,而不會影響對焦。第三發光源162透過一支撐架166固設於第一支撐平台100。相對於第一發光源122、第二發光源142,第三發光源162的光束與金屬表面16較接近垂直,故第三入射角小於帶狀光束123、143之入射角。對於鏡頭22而言,較小的入射角度的光束163可提供金屬表面更加的照明(較強的反射光強度),使鏡頭22更易於進行對焦。 In this embodiment, a third light source 162 is additionally provided, and a light beam 163 (see the first figure) is provided as a focus light source, incident on the metal surface 16 at a third incident angle. In the present embodiment, the light beam 163 generated by the third light source 162 is also a strip beam, and thus can also serve as a detection light source at the same time. In practical applications, the beam can be a circular, square or other shaped beam without affecting the focus. The third light source 162 is fixed to the first support platform 100 through a support frame 166 . The light beam of the third light source 162 is closer to the metal surface 16 than the first light source 122 and the second light source 142, so the third incident angle is smaller than the incident angle of the strip beams 123 and 143. For lens 22, a smaller angle of incidence of light beam 163 provides more illumination of the metal surface (stronger reflected light intensity), making lens 22 easier to focus.
請參見第三圖及第四圖,為本發明之一較佳實施例的檢測光源的兩個不同視角之分解圖。由於第一發光源、第一驅動機構及第一弧形槽與第二發光源、第二驅動機構及第二弧形槽係相同,但左右相反對應,故在此僅以檢測光源的第一發光源、第一驅動機構及第一弧形槽為例說明。 Please refer to the third and fourth figures, which are exploded views of two different viewing angles of the detecting light source according to a preferred embodiment of the present invention. Since the first illumination source, the first driving mechanism, and the first arcuate slot are the same as the second illumination source, the second driving mechanism, and the second arcuate slot, but the left and right are oppositely opposite, only the first detecting source is used here. The light source, the first driving mechanism and the first curved groove are taken as an example.
第一發光源122上具有狹長的發光口221,用以提供帶狀光束。發光口221的長軸方向為水平方向。第一驅動機構包含一L型平台261、一滑塊262、一軌道263、一軌平台264、一馬達座265、一齒輪266(第四圖)以及一夾緊件268。L型平台261連接滑塊262,而第一發光源122設置於L型平台261上。軌道263設置於軌平台264上。滑塊262卡於軌道263的溝槽上,使滑塊262可線性地於軌道263上滑動;較佳地,其滑動方向與帶狀光束的方向平行。夾緊件268連接L型平台261,並可夾緊軌道263,使第一發光源122固定軌道263上的一預定位置。 The first illumination source 122 has an elongated light-emitting opening 221 for providing a strip beam. The long axis direction of the light emitting port 221 is a horizontal direction. The first drive mechanism includes an L-shaped platform 261, a slider 262, a track 263, a rail platform 264, a motor mount 265, a gear 266 (fourth view), and a clamping member 268. The L-shaped platform 261 is connected to the slider 262, and the first illumination source 122 is disposed on the L-shaped platform 261. The track 263 is disposed on the rail platform 264. The slider 262 is snapped onto the groove of the track 263 so that the slider 262 can slide linearly on the track 263; preferably, the sliding direction is parallel to the direction of the strip beam. The clamping member 268 is coupled to the L-shaped platform 261 and can clamp the rail 263 such that the first illumination source 122 is fixed to a predetermined position on the track 263.
弧形槽包含一弧形滑塊281、一弧形滑軌282、一弧形平台283及一弧形齒條284。弧形齒條284設置於弧形平台283上。馬達座265與馬達124連接,其旋轉軸套設有齒輪266,而齒輪266與弧形齒條284相囓合。弧形滑塊281與軌平台264連接,並卡於弧形滑軌282的溝槽上,使弧形滑塊281可弧向地於弧形滑軌282上滑動。藉此,當馬達124帶動齒輪266轉動時,第一發光源122可相對於弧形平台283進行弧向移動。較佳地,弧形滑軌282為一圓弧,以第一圖中所提的檢測區16a的中心為圓心,而且帶狀光束與弧形滑軌282的切線垂直。藉此,當第一發光源122進行弧向移動時,第一發光源122相對於金屬表面,僅改變其入射角之角度,而與檢 測區16a的距離保持不變,且帶狀光束仍照射檢測區16a。因此,本發明之檢測光源在調整入射角時,帶狀光束仍可維持原照射之區域,即檢測區16a,避免調整入射角後須再重新調整帶狀光束的照射區域之問題。再者,帶狀光束的截面積會隨著照射區域與第一發光源122的距離改變。也就是說,帶狀光束在檢測區16a的照度也會跟第一發光源122與檢測區16a的距離有關。本發明的檢測光源在調整入射角時,第一發光源122與檢測區16a的距離不會改變,因此可避免距離改變對照度的影響。 The curved slot includes an arcuate slider 281, an arcuate rail 282, an arcuate platform 283, and a curved rack 284. The curved rack 284 is disposed on the curved platform 283. The motor base 265 is coupled to the motor 124, the rotating sleeve of which is provided with a gear 266, and the gear 266 is engaged with the curved rack 284. The curved slider 281 is coupled to the rail platform 264 and is captured on the groove of the curved rail 282 such that the curved slider 281 can slide on the curved rail 282 in an arc. Thereby, when the motor 124 drives the gear 266 to rotate, the first illumination source 122 can move in an arc direction with respect to the curved platform 283. Preferably, the curved slide rail 282 is a circular arc, centered on the center of the detection zone 16a mentioned in the first figure, and the strip beam is perpendicular to the tangent of the curved slide rail 282. Thereby, when the first light source 122 performs the arc direction movement, the first light source 122 changes the angle of the incident angle with respect to the metal surface, and the inspection The distance of the test area 16a remains unchanged, and the strip beam still illuminates the detection area 16a. Therefore, when the detection light source of the present invention adjusts the incident angle, the strip beam can still maintain the original illumination area, that is, the detection area 16a, and the problem of re-adjusting the illumination area of the strip beam after adjusting the incident angle is avoided. Furthermore, the cross-sectional area of the strip beam varies with the distance of the illumination area from the first illumination source 122. That is to say, the illuminance of the strip beam in the detection area 16a is also related to the distance between the first illumination source 122 and the detection area 16a. When the detection light source of the present invention adjusts the incident angle, the distance between the first illumination source 122 and the detection area 16a does not change, so that the influence of the distance change contrast can be avoided.
請參見第五圖及第六圖,為本發明之一較佳實施例的四軸微調座的不同視角之分解圖。影像感測器(未繪出)架設於四軸微調座30之上,而可進行四個軸向的微調,使影像感測器的鏡頭可以垂直於第一圖所示金屬表面的檢測區16a,且可以調整與檢測區16a的距離,使影像感測器可以正確對焦。 Please refer to the fifth and sixth figures, which are exploded views of different viewing angles of the four-axis fine adjustment base according to a preferred embodiment of the present invention. The image sensor (not shown) is mounted on the four-axis fine adjustment seat 30, and four axial adjustments can be made, so that the lens of the image sensor can be perpendicular to the detection area 16a of the metal surface shown in the first figure. And the distance from the detection area 16a can be adjusted so that the image sensor can focus correctly.
四軸微調座30包含一夾持座31、一垂直平台32、一旋轉軸座33、一旋轉基座34及一L基座35。夾持座31包含上下垂直對齊的二夾持孔311、312,使鏡頭可以穿設於二夾持孔311、312之上。夾持孔312係由兩個內側為半圓缺口之夾持板381、382合併所形成,藉由調整夾持板381、382之間距,可以調整可夾持鏡頭的口徑大小,並使鏡頭被緊夾持於夾持板381、382之上。而鏡頭僅穿過夾持孔311,而不緊夾住鏡頭,因此鏡頭可以相對於夾持孔311轉動。 The four-axis fine adjustment seat 30 includes a clamping seat 31, a vertical platform 32, a rotating shaft seat 33, a rotating base 34 and an L base 35. The clamping seat 31 includes two clamping holes 311, 312 vertically aligned with the upper and lower sides, so that the lens can be disposed on the two clamping holes 311, 312. The clamping hole 312 is formed by combining two clamping plates 381 and 382 having inner semicircular notches. By adjusting the distance between the clamping plates 381 and 382, the size of the lens can be adjusted and the lens is tight. It is clamped on the clamping plates 381, 382. The lens only passes through the clamping hole 311 without gripping the lens, so the lens can be rotated relative to the clamping hole 311.
夾持板381、382固設於一旋轉板316,一旋轉塊315(第五圖)固設於旋轉板316之下方。旋轉板316具有四個弧形螺孔371、372、373、374,以透過弧形螺孔371、372、373、374以螺絲鎖固於夾持座31之一方架319上。一第一旋轉台36固設於方架319,具有兩個凸塊363、364以形成一凹口365(第五圖)。旋轉塊315位於凹口365之內。兩螺絲361、362分別螺入兩個凸塊363、364,以分別推抵旋轉塊315兩相對之側面。藉由調整兩螺絲361、362,而可以調整旋轉塊315於凹口365之位置,而使旋轉板316得以在軸方向a上相對於夾持座31進行旋轉。而弧形螺孔371、372、373、374為橢圓螺孔。於旋轉板316旋轉時,在弧形螺孔371、372、373、374之上的螺絲未鎖死旋轉板316及夾持座31時提供旋轉轉動之空間,並於鎖死時,可固定旋轉板316不再轉動。 The clamping plates 381, 382 are fixed to a rotating plate 316, and a rotating block 315 (fifth figure) is fixed below the rotating plate 316. The rotating plate 316 has four arcuate screw holes 371, 372, 373, 374 to be screwed to a square frame 319 of the clamping seat 31 through the arcuate screw holes 371, 372, 373, 374. A first rotary table 36 is fixed to the square frame 319 and has two projections 363, 364 to form a notch 365 (fifth view). The rotating block 315 is located within the recess 365. The two screws 361 and 362 are respectively screwed into the two protrusions 363 and 364 to respectively push against the opposite sides of the rotating block 315. By adjusting the two screws 361, 362, the position of the rotating block 315 at the notch 365 can be adjusted, so that the rotating plate 316 can be rotated relative to the holder 31 in the axial direction a. The curved screw holes 371, 372, 373, and 374 are elliptical screw holes. When the rotating plate 316 rotates, the screws above the curved screw holes 371, 372, 373, 374 provide a space for rotational rotation when the rotating plate 316 and the clamping seat 31 are not locked, and can be fixedly rotated when locked. Plate 316 is no longer rotating.
由於鏡頭係被夾持板381、382所緊夾,藉由螺絲361、362提供旋轉板316之旋轉微調,可調整鏡頭於a軸上的角度;即,可以使鏡頭上的條狀感測件之長軸方向可微調至適當的角度。條狀感測件之長軸方向較佳為與帶狀光束平行,即前後方向。 Since the lens is clamped by the clamping plates 381, 382, the rotation of the rotating plate 316 is provided by the screws 361, 362, and the angle of the lens on the a-axis can be adjusted; that is, the strip-shaped sensing member on the lens can be adjusted. The long axis direction can be fine-tuned to an appropriate angle. The long axis direction of the strip-shaped sensing member is preferably parallel to the strip beam, that is, the front-rear direction.
垂直平台32包含二垂直滑軌321、四垂直滑塊322、一垂直調整塊323、一螺絲324及一垂直架329。二垂直滑軌321彼此平行地連接夾持座31,垂直滑塊322連接垂直架329並倆倆對應垂直滑軌321。垂直滑軌321卡於對應的垂直滑塊322之溝槽,使夾持座31可相對於垂直平台32進行垂直方向上的移動。兩個垂直滑軌321彼此平行,可減少垂直滑塊322與垂直滑軌321之間間隙所造成垂直軸向以外的移動量。垂直調整塊323固設於垂直架329。而螺絲324螺入垂直調整塊323,以推抵夾持座31的方架319的一表面391,藉此調整夾持座31與垂直平台32在垂直方向b上的相對位置。 The vertical platform 32 includes two vertical slides 321 , four vertical slides 322 , a vertical adjustment block 323 , a screw 324 and a vertical frame 329 . The two vertical slide rails 321 are connected to the holders 31 in parallel with each other, and the vertical sliders 322 are connected to the vertical frame 329 and the two of them correspond to the vertical slide rails 321. The vertical rail 321 is clamped to the groove of the corresponding vertical slider 322, so that the holder 31 can move in the vertical direction with respect to the vertical platform 32. The two vertical slide rails 321 are parallel to each other, and the amount of movement other than the vertical axis caused by the gap between the vertical slider 322 and the vertical slide rail 321 can be reduced. The vertical adjustment block 323 is fixed to the vertical frame 329. The screw 324 is screwed into the vertical adjustment block 323 to push against a surface 391 of the square frame 319 of the holder 31, thereby adjusting the relative position of the holder 31 and the vertical platform 32 in the vertical direction b.
旋轉軸座33包含一旋轉塊332、一旋轉凹座333、二螺絲334、335以及旋轉架339。一螺絲331穿過垂直架329之一穿孔328,以結合旋轉架339及垂直架329,並使旋轉架339及垂直架329可相對於軸方向d上旋轉。旋轉塊332固設於垂直架329--於與二垂直滑塊322相反之一側面上。旋轉凹座333設置於旋轉架339上,並具有一凹槽336。旋轉塊332位於凹槽336內,而二螺絲334、335分別螺入凹槽336兩側的凸塊,以推抵旋轉塊332之相對兩側面,藉以調整旋轉架339及垂直架329之相對角度。 The rotating shaft seat 33 includes a rotating block 332, a rotating recess 333, two screws 334, 335, and a rotating frame 339. A screw 331 passes through a perforation 328 of one of the vertical frames 329 to engage the rotating frame 339 and the vertical frame 329, and rotates the rotating frame 339 and the vertical frame 329 with respect to the axial direction d. The rotating block 332 is fixed to the vertical frame 329 on one side opposite to the two vertical sliders 322. The rotary recess 333 is disposed on the rotating frame 339 and has a recess 336. The rotating block 332 is located in the recess 336, and the two screws 334 and 335 are respectively screwed into the bumps on both sides of the recess 336 to push against opposite sides of the rotating block 332, thereby adjusting the relative angles of the rotating frame 339 and the vertical frame 329. .
旋轉基座34具有二旋轉塊341、342、二螺絲343、344及一旋轉台349。另外,旋轉軸座33還包含二片體塊337、338,分別以螺絲鎖於旋轉架339的兩側壁上。旋轉台349固設於二片體塊337、338之上。二旋轉塊341、342設於旋轉台349的同一邊之上方與下方。二螺絲343、344各自螺入二旋轉塊341、342,以推抵旋轉架339之背面。藉由調整二螺絲343、344,可使旋轉架339相對於旋轉台349於軸方向c上進行旋轉微調。其中,二片體塊337、338的上下兩側的螺孔為橢圓螺孔,於其上螺絲未鎖死時,旋轉軸座33可相對於旋轉基座34進行軸方向c上的旋轉,於螺絲鎖死時,固定旋轉軸座33與旋轉基座34的相對角度。旋轉基座34固設於L基座35之上。 The rotating base 34 has two rotating blocks 341, 342, two screws 343, 344 and a rotating table 349. In addition, the rotating shaft base 33 further includes two body blocks 337, 338 which are respectively screwed to the two side walls of the rotating frame 339. The rotary table 349 is fixed on the two body blocks 337, 338. The two rotating blocks 341, 342 are disposed above and below the same side of the rotating table 349. The two screws 343, 344 are each screwed into the two rotating blocks 341, 342 to push against the back surface of the rotating frame 339. By adjusting the two screws 343, 344, the rotating frame 339 can be finely adjusted in the axial direction c with respect to the rotating table 349. The screw holes on the upper and lower sides of the two body blocks 337 and 338 are elliptical screw holes. When the screw is not locked, the rotating shaft seat 33 can rotate in the axial direction c with respect to the rotating base 34. When the screw is locked, the relative angle between the rotating shaft base 33 and the rotating base 34 is fixed. The spin base 34 is fixed to the L base 35.
第三圖所示的弧形平台283與第五圖所示的L基座35共同架設於第一圖所示的第一支撐平台100上。藉此,當第一支撐平台100相對於第二支撐平台200於垂直方向上移動時,可使檢測光源10及影像感測器20同步移動。而如前述,檢測光源10具有至少兩軸向的調整,而影像感測器20具有至少四軸向的調整,而可配合應用環境進一步調整至所需的位置及角度。 The curved platform 283 shown in the third figure is erected on the first support platform 100 shown in the first figure together with the L base 35 shown in the fifth figure. Thereby, when the first support platform 100 moves in the vertical direction relative to the second support platform 200, the detection light source 10 and the image sensor 20 can be synchronously moved. As mentioned above, the detection light source 10 has at least two axial adjustments, and the image sensor 20 has at least four axial adjustments that can be further adjusted to the desired position and angle in accordance with the application environment.
接著,請參見第七圖,為雜質微粒檢測裝置作動的前視圖。首先,先對雜質微粒檢測裝置進行調校,以得到較佳的檢測效果。第一發光源122、第二發光源142及第三發光源162分別產生帶狀光束123、143、光束163照射至金屬表面16的檢測區16a(或調校基準板)。鏡頭22垂直於金屬表面16,以對準檢測區16a,即檢測區16a位在鏡頭22的一光軸23上。鏡頭22之前端可以旋轉,以調整鏡頭之等效焦長,即調整鏡頭之倍率。檢測控制系統(未繪出)控制馬達202(參見第一圖),使鏡頭22移動至距金屬表面16一預定高度。預定高度係參照鏡頭之規格而定。接著,使用者反覆手動進行影像感測器20的四軸向的調整及第二發光源142及第三發光源162的兩軸向的調整,使鏡頭22正確對焦檢測區16a且雜質微粒檢測裝置的誤檢率及檢出率達到一最佳的平衡點。 Next, please refer to the seventh drawing, which is a front view of the operation of the impurity particle detecting device. First, the impurity particle detecting device is first calibrated to obtain a better detection effect. The first light source 122, the second light source 142, and the third light source 162 respectively generate strip beams 123, 143, and the light beam 163 is irradiated onto the detection region 16a (or the calibration reference plate) of the metal surface 16. The lens 22 is perpendicular to the metal surface 16 to align the detection zone 16a, i.e., the detection zone 16a is positioned on an optical axis 23 of the lens 22. The front end of the lens 22 can be rotated to adjust the equivalent focal length of the lens, that is, to adjust the magnification of the lens. A detection control system (not shown) controls the motor 202 (see the first figure) to move the lens 22 to a predetermined height from the metal surface 16. The predetermined height is determined by the specifications of the lens. Then, the user manually performs the four-axis adjustment of the image sensor 20 and the two-axis adjustment of the second illumination source 142 and the third illumination source 162, so that the lens 22 correctly focuses the detection area 16a and the impurity particle detecting device. The false detection rate and the detection rate reach an optimal balance point.
一般而言,光入射一平面的入射角越大,垂直平面的觀測位置(如:本發明中的鏡頭)所接收的由平面所反射的光強度就越弱。因此,相較於帶狀光束123、143,光束163以比較接近垂直之入射角θ 1入射至金屬表面16,受金屬表面16反射的光強度較強,適合作為對焦之用。相對地,帶狀光束123、143比較大的入射角θ 2入射,被金屬表面16反射的光強度較弱。然而,雜質微粒並非如金屬表面般為平面,原則上,雜質微粒反射的光強度受入射角的變化較小。藉此,以較大的入射角,可拉大雜質微粒反射的光亮度與金屬表面反射的光亮度的對比,使雜質微粒更容易被檢測出來。 In general, the greater the angle of incidence of light incident on a plane, the weaker the intensity of the light reflected by the plane received by the observation of the vertical plane (eg, the lens of the present invention). Therefore, compared to the strip beams 123, 143, the light beam 163 is incident on the metal surface 16 at a relatively close incident angle θ 1 , and the light reflected by the metal surface 16 is strong, which is suitable for focusing. In contrast, the strip beams 123, 143 are incident at a relatively large incident angle θ 2 , and the intensity of light reflected by the metal surface 16 is weak. However, the impurity particles are not as flat as the metal surface, and in principle, the intensity of the light reflected by the impurity particles is less changed by the incident angle. Thereby, at a larger incident angle, the brightness of the light reflected by the impurity particles can be compared with the brightness of the light reflected by the metal surface, so that the impurity particles are more easily detected.
當然,實際操作時,入射角會影響檢出率和誤檢率,而100%的檢出率及0%的誤檢率為最理想的狀態。然而,入射角的角度越大,光亮度的對比變高,誤檢率下降,然而整體的亮度也下降,所以檢出率也會下降。相反地,入射角的角度越小,整體的亮度也上升,檢出率也會上升, 然而光亮度的對比變低,所以誤檢率也會上升。再者,雜質微粒反射的光亮度與與雜質微粒的大小及形狀有關多少也會影響角度與反射亮度之間的關係。因此,並非一定愈大的入射角可以得到最佳的雜質微粒檢測。本發明的第一發光源122及第二發光源142可以弧形槽及驅動機構來調整其入射角θ 2。由於第一發光源122及第二發光源142的弧形槽係左右對應,而且第一帶狀光束123及第二帶狀光束143垂直於各自弧形槽的切線。在調整入射角過程,第一發光源122及第二發光源142可以檢測區16a為軸心轉動以與檢測區16a維持等距且第一發光源122及第二發光源142的入射角可對稱調整。因此,調整入射角後的第一帶狀光束123及第二帶狀光束143仍可維持入射至檢測區16。 Of course, in actual operation, the incident angle affects the detection rate and the false detection rate, and the 100% detection rate and the 0% false detection rate are the most ideal. However, the larger the angle of incidence, the higher the contrast of light, the lower the false detection rate, but the overall brightness also decreases, so the detection rate also decreases. Conversely, the smaller the angle of incidence, the higher the overall brightness, and the higher the detection rate. However, the contrast of light is low, so the false detection rate will also rise. Furthermore, how much the brightness of the light reflected by the impurity particles is related to the size and shape of the impurity particles affects the relationship between the angle and the brightness of the reflection. Therefore, it is not necessarily the larger incident angle that the best impurity particle detection can be obtained. The first illumination source 122 and the second illumination source 142 of the present invention can adjust the incident angle θ 2 by the arcuate groove and the driving mechanism. The arcuate grooves of the first illumination source 122 and the second illumination source 142 correspond to each other, and the first strip beam 123 and the second strip beam 143 are perpendicular to the tangent of the respective arcuate slots. During the adjustment of the incident angle, the first illumination source 122 and the second illumination source 142 can rotate the detection region 16a to be equidistant from the detection region 16a and the incident angles of the first illumination source 122 and the second illumination source 142 can be symmetric. Adjustment. Therefore, the first strip beam 123 and the second strip beam 143 after adjusting the incident angle can still remain incident to the detection region 16.
請參見第八圖,為利用本發明的雜質微粒檢測裝置所拍攝之之照片。如照片所示,金屬表面16上有複數個開口161及複數條紋路165。複數條紋路165係於製作過程產生於金屬表面16上,為同一方向排列之紋路,照片所示的紋路為左右方向。紋路主要為凹凸相間的條紋所構成。為避免複數條紋路165干擾雜質微粒檢測裝置對雜質微粒之判斷,第一發光源122及第二發光源142的帶狀光束123、143的光前進方向在垂直於複數條紋路的排列方向上並無分量。舉例來說,複數條紋路的排列方向為左右方向,則帶狀光束123、143的長軸為前後方向,其入射方向(光前進方向)為左右方向並以向下入射至金屬表面16,因此在垂直於複數條紋路的排列方向(前後方向)上並無分量。如此,帶狀光束123、143的照射下,凹凸相間、高低起伏的條紋不易產生陰影,而且也不會因複數條紋路的側面也不易帶狀光束123、143的光。即,可避免金屬表面16的複數條紋路165本身檢測到明暗落差大、對比強烈的影像,而影響雜質微粒之檢測判斷。 Please refer to the eighth drawing, which is a photograph taken by the impurity particle detecting device of the present invention. As shown in the photograph, the metal surface 16 has a plurality of openings 161 and a plurality of stripe paths 165. The plurality of stripe paths 165 are formed on the metal surface 16 during the manufacturing process, and are arranged in the same direction. The lines shown in the photograph are in the left-right direction. The texture is mainly composed of stripes between the concave and convex. In order to prevent the plurality of stripe paths 165 from interfering with the determination of the impurity particles by the impurity particle detecting means, the light traveling directions of the strip beams 123, 143 of the first light source 122 and the second light source 142 are perpendicular to the arrangement direction of the plurality of stripe paths and No component. For example, the arrangement direction of the plurality of stripe paths is the left-right direction, and the long axes of the strip beams 123 and 143 are the front-rear direction, and the incident direction (the light advancing direction) is the left-right direction and is incident downward to the metal surface 16, so There is no component in the direction of alignment (front and rear direction) perpendicular to the complex stripe path. As described above, under the irradiation of the strip beams 123 and 143, the streaks of the unevenness and the undulations are less likely to cause shadows, and the light beams 123 and 143 are not easily banded by the side faces of the plurality of stripe paths. That is, it is possible to prevent the complex stripe path 165 of the metal surface 16 from detecting an image having a large contrast and a strong contrast, and affecting the detection of the impurity particles.
再者,以左右對應的第一發光源122及第二發光源142作為雙檢測光源,可以消除單一檢測光源時單一方向照射可能產生的陰影,也可進一步提高檢測判斷之精準度。 Furthermore, the first illumination source 122 and the second illumination source 142 corresponding to the left and right sides are used as the dual detection light source, and the shadow that may be generated by the single direction illumination when the single detection source is used can be eliminated, and the accuracy of the detection and determination can be further improved.
請參見第九圖,為根據本發明之一較佳實施例之金屬遮罩檢測裝置的立體結構示意圖。一機台4具有一傳送裝置5及一架體6。架體6係跨設於傳送裝置5上方。傳送裝置5包含長方形之一置放座51。置放座51中間具有一槽座55,用以固定長方形之一框架7。框架7上貼有至少一 金屬遮罩8,例如:金屬遮罩8的兩側貼於框架7的周邊。當框架7被固定於置放座51時,金屬遮罩8呈水平。傳送裝置5兩側具有二滑軌54,且各側二滑軌54之間具有磁性導軌57,可程式控制地將置放座51以一第一水平軸向(即,前後方向)依控制指令而精準位移,例如:使框架7上的金屬遮罩8移動至架體6的下方之一預定初始位置。架體6具有兩滑軌61,而一承座9可移動地設於滑軌61上,例如:第一、二圖所示的第二支撐平台200即可做為本實施例的承座9。雜質微粒檢測裝置1(在此,以虛線表示)設置在承座9之上,使雜質微粒檢測裝置1可相對架體6以一第二水平軸向(即,左右方向)位移,且該第二水平軸向與該第一水平軸向彼此垂直。 Referring to a ninth drawing, a perspective view of a metal mask detecting device according to a preferred embodiment of the present invention is shown. A machine table 4 has a conveyor 5 and a frame 6. The frame body 6 is spanned above the conveyor 5. The conveying device 5 comprises a rectangular one-piece seating 51. In the middle of the placement base 51, there is a slot 55 for fixing a rectangular frame 7. At least one of the frame 7 is attached The metal mask 8 is, for example, attached to the periphery of the frame 7 on both sides of the metal mask 8. When the frame 7 is fixed to the placement base 51, the metal cover 8 is horizontal. The conveyor 5 has two slide rails 54 on both sides, and a magnetic rail 57 is disposed between each side of the two slide rails 54 to programably control the placement base 51 in a first horizontal axis (ie, front and rear direction) according to a control command. The precise displacement, for example, causes the metal mask 8 on the frame 7 to move to a predetermined initial position below the frame 6. The frame body 6 has two slide rails 61, and a socket 9 is movably disposed on the slide rails 61. For example, the second support platform 200 shown in the first and second figures can be used as the socket 9 of the embodiment. . The impurity particle detecting device 1 (herein indicated by a broken line) is disposed on the socket 9 so that the impurity particle detecting device 1 can be displaced relative to the frame 6 in a second horizontal axis (ie, the left-right direction), and the first The two horizontal axes are perpendicular to the first horizontal axis.
請同時參見第十圖,為根據本發明之一較佳實施例之置放座的立體結構示意圖。置放座51內部之四側各具有至少一置放輪52,其中三側之置放輪52各自連接一氣壓缸53,而氣壓缸53固定於置放座51上,最後一側之置放輪52則固定於置放座51之上。在本實施例中,共有七個置放輪52及五個氣壓缸53,在第十圖的右上側兩個置放輪52直接固定於置放座51之上,而其於三側的置放輪52則透過氣壓缸53與置放座51連接。另外,右下側的氣壓缸53為可調行程氣壓缸,可控制氣壓缸的桿移動距離。置放輪52之外側為塑膠材質,以避免與置放座51碰撞時造成置放座51周邊的磨耗。而且,置放輪52可以滾動,避免置放輪52與置放座51碰撞時,置放輪52本身的磨耗集中而快速改變置放輪52的大小影響框架7的定位精準度,且可延長置放輪52的使用次數。而置放輪52為可更換,於磨耗至一定程度時可更換。 Please also refer to the tenth embodiment, which is a schematic perspective view of a placement base according to a preferred embodiment of the present invention. Each of the four sides of the inside of the placing base 51 has at least one placing wheel 52, wherein the three side placing wheels 52 are respectively connected to a pneumatic cylinder 53, and the pneumatic cylinder 53 is fixed to the placing base 51, and the last side is placed. The wheel 52 is fixed to the placement base 51. In the present embodiment, there are seven placement wheels 52 and five pneumatic cylinders 53. On the upper right side of the tenth figure, the two placement wheels 52 are directly fixed on the placement base 51, and the three placement sides are disposed on the three sides. The pulley 52 is connected to the placement base 51 through the pneumatic cylinder 53. In addition, the pneumatic cylinder 53 on the lower right side is an adjustable stroke pneumatic cylinder, and can control the rod moving distance of the pneumatic cylinder. The outer side of the placement wheel 52 is made of a plastic material to avoid wear around the placement base 51 when it collides with the placement base 51. Moreover, the placement wheel 52 can roll, avoiding the wear concentration of the placement wheel 52 itself when the placement wheel 52 collides with the placement seat 51, and rapidly changing the size of the placement wheel 52 affects the positioning accuracy of the frame 7, and can be extended The number of uses of the placement wheel 52. The setting wheel 52 is replaceable and can be replaced when the wear is reached to a certain extent.
當框架7置放於置放座51時,氣壓缸53推動置放輪52向置放座51的內側移動,以推抵框架7的側邊。如此,框架7被置放輪52固定於置放座51上。由於右上側的置放輪52直接固定於置放座51之上,因此位置為固定,可作為框架7定位時該軸向之基準。右下側的氣壓缸53為可調行程氣壓缸,因此,亦可控制其位置點而作為框架7定位時,另一軸向之基準,而且可以根據框架規格、大小之不同,而配合調整其定位點。 When the frame 7 is placed on the placement base 51, the pneumatic cylinder 53 pushes the placement wheel 52 toward the inside of the placement base 51 to push against the side of the frame 7. Thus, the frame 7 is fixed to the placement base 51 by the placement wheel 52. Since the upper right side of the placement wheel 52 is directly fixed to the placement base 51, the position is fixed and can be used as a reference for the axial direction when the frame 7 is positioned. The pneumatic cylinder 53 on the lower right side is an adjustable stroke pneumatic cylinder. Therefore, the position of the position can be controlled as the frame 7 and the other axial reference can be adjusted according to the frame size and size. location point.
由於置放座51的槽座55為長方形,對應框架7的長方形,且框架7的長邊長於槽座55的短邊。因此,放置框架7於槽座55內時,必須框架7的長邊對應槽座55的長邊,方能使框架7放置於槽座55內。如此, 即可確保金屬遮罩8上的紋路的方向為預定方向。在本實施例,預定方向為第二水平向。 Since the seat 55 of the placing base 51 has a rectangular shape, it corresponds to the rectangular shape of the frame 7, and the long side of the frame 7 is longer than the short side of the housing 55. Therefore, when the frame 7 is placed in the housing 55, the long side of the frame 7 must correspond to the long side of the housing 55 so that the frame 7 can be placed in the housing 55. in this way, It is ensured that the direction of the grain on the metal mask 8 is a predetermined direction. In this embodiment, the predetermined direction is the second horizontal direction.
置放座51的兩側各具有一軌道平台56,分別與傳送裝置5兩側具有二滑軌54可移動地連接。而且軌道平台56具有一磁控裝置(未繪出),與磁性導軌57之間有磁力作用而提供置放座51移動的動力。 Each of the two sides of the placement base 51 has a rail platform 56 that is movably coupled to the two sides of the conveyor 5 with two slide rails 54, respectively. Moreover, the track platform 56 has a magnetron (not shown) that interacts with the magnetic rail 57 to provide power for the placement of the mount 51.
請再參見第九圖。當框架7固定後,置放座51被傳送裝置5移動至架體6的下方的預定初始位置。然後,雜質微粒檢測裝置1的第一支撐平台100(參見第一圖)相對承座9(例如:第一圖所示的第二支撐平台200)下降至一預定高度。金屬遮罩8會因重力而中心會相較兩側略為下垂。因此,預定高度可由以下方式來決定:預先掃描金屬遮罩8以得到一平均水平高度,藉此以補償因重力所造成的影響。接著,雜質微粒檢測裝置1開始進行掃描檢測。承座9被控制以一預定速度,帶著雜質微粒檢測裝置1在第二水平軸向反覆移動,例如:由左側掃描至右側,然後再由右側掃描至左側,如此反覆進行。每當雜質微粒檢測裝置1掃描完一行(即,由最左側掃描至最右側或由最右側掃描至最左側)時,傳送裝置5將會移動置放座51一預定距離,然後雜質微粒檢測裝置1再進行下一行之掃描。上述預定距離係根據影像感測器的條狀感測件之長度而定,使得掃描所得的行影像可以拼成完整的金屬遮罩之影像,如第八圖所示的照片即為所得的金屬遮罩影像的一部分。 Please refer to the ninth figure. When the frame 7 is fixed, the placement base 51 is moved by the conveying device 5 to a predetermined initial position below the frame 6. Then, the first support platform 100 (see the first figure) of the impurity particle detecting device 1 is lowered to a predetermined height with respect to the socket 9 (for example, the second support platform 200 shown in the first figure). The metal mask 8 will sag slightly from the center due to gravity. Therefore, the predetermined height can be determined by scanning the metal mask 8 in advance to obtain an average level, thereby compensating for the influence due to gravity. Next, the impurity particle detecting device 1 starts scanning detection. The socket 9 is controlled to move at a predetermined speed with the impurity particle detecting device 1 in the second horizontal axis, for example, scanning from the left side to the right side, and then scanning from the right side to the left side, thus repeating. Whenever the impurity particle detecting device 1 scans one line (ie, scanning from the leftmost side to the far right side or from the rightmost side to the leftmost side), the conveying device 5 will move the placing seat 51 by a predetermined distance, and then the impurity particle detecting device 1 Then scan the next line. The predetermined distance is determined according to the length of the strip-shaped sensing member of the image sensor, so that the scanned line image can be assembled into a complete metal mask image, and the photograph shown in the eighth figure is the obtained metal. Mask a portion of the image.
金屬遮罩檢測裝置根據金屬遮罩之影像判斷金屬遮罩上的雜質微粒之位置,並據此控制一雷射(未繪出)以雷射光束消除該些雜質微粒。金屬遮罩檢測裝置可再一次或多次進行金屬遮罩之掃描,以確認雜質微粒以完全被清除或清除至某一數量以下為止。 The metal mask detecting device determines the position of the impurity particles on the metal mask based on the image of the metal mask, and accordingly controls a laser (not shown) to remove the impurity particles by the laser beam. The metal mask detecting device may scan the metal mask one or more times to confirm that the impurity particles are completely removed or cleared to a certain amount or less.
無論如何,任何人都可以從上述例子的說明獲得足夠教導,並據而了解本發明內容確實不同於先前技術,且具有產業上之利用性,及足具進步性。是本發明確已符合專利要件,爰依法提出申請。 In any event, anyone can obtain sufficient teaching from the description of the above examples, and it is understood that the present invention is indeed different from the prior art, and is industrially usable and progressive. It is the invention that has indeed met the patent requirements and has filed an application in accordance with the law.
10‧‧‧檢測光源 10‧‧‧Detection light source
16‧‧‧金屬表面 16‧‧‧Metal surface
16a‧‧‧檢測區 16a‧‧‧Detection area
20‧‧‧影像感測器 20‧‧‧Image Sensor
22‧‧‧鏡頭 22‧‧‧ lens
24‧‧‧散熱模組 24‧‧‧ Thermal Module
100‧‧‧第一支撐平台 100‧‧‧First support platform
102‧‧‧滑塊平台 102‧‧‧ Slider platform
122‧‧‧第一發光源 122‧‧‧First light source
123‧‧‧帶狀光束 123‧‧‧Belt beam
124‧‧‧馬達 124‧‧‧Motor
126‧‧‧第一驅動機構 126‧‧‧First drive mechanism
128‧‧‧第一弧形槽 128‧‧‧First curved slot
142‧‧‧第二發光源 142‧‧‧second source of illumination
143‧‧‧帶狀光束 143‧‧‧Belt beam
144‧‧‧馬達 144‧‧‧Motor
146‧‧‧第二驅動機構 146‧‧‧Second drive mechanism
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