TW201623935A - A system for measuring anisotropy, a method for measuring anisotropy and a calibration method thereof - Google Patents

A system for measuring anisotropy, a method for measuring anisotropy and a calibration method thereof Download PDF

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TW201623935A
TW201623935A TW103146326A TW103146326A TW201623935A TW 201623935 A TW201623935 A TW 201623935A TW 103146326 A TW103146326 A TW 103146326A TW 103146326 A TW103146326 A TW 103146326A TW 201623935 A TW201623935 A TW 201623935A
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sample
tested
reflected light
intensity distribution
analyzer
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TWI542864B (en
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謝易辰
劉志祥
莊凱評
楊富程
魏祥鈞
林友崧
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財團法人工業技術研究院
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Abstract

This invention provides a system embodiment for measuring anisotropy, including a radial polarizer transforming polarization directions of an incident light into radial directions; a (non-polarized beam splitter) NPBS having a transflective surface, in which the incident light partially transmits the transflective surface and becomes a partially incident light; an objective lens receiving the partially incident light and focusing the partially incident light onto a test sample and receiving a reflected light reflected from the test sample, in which the reflected light is reflected back to the transflective; an analyzer receiving the reflected light and generating an output light, in which polarization directions of the output light are transforming into transmission axis of the analyzer; an image sensor receiving the output light and generating an intensity distribution diagram of the test sample; and a operational processor obtaining an reflectance curve of the test sample according to the intensity distribution diagram of the test sample and obtaining anisotropy of the test sample by fitting the reflectance curve of the test sample with a modified Jones calculus model.

Description

異向性量測系統、異向性量測方法及其校正方法 Anisotropy measurement system, anisotropy measurement method and correction method thereof

本發明關於一種異向性量測系統、方法及其校正方法。 The present invention relates to an anisotropic measuring system, method and method of correcting same.

由於高解析度行動裝置的風行,目前橫向電場切換技術(in-plane switching,IPS)面板在陣列(array)段製程將朝逐漸採用光配向(optical alignment)技術,以提高面板解析度。目前常被使用之配向方式是棉刷配向(Rubbing),因薄膜電晶體(thin-film transistor)是山丘狀高低結構,故棉刷配向在高低起伏較大的位置,其配向結果較差,造成對比度降低。 Due to the popularity of high-resolution mobile devices, the current in-plane switching (IPS) panel will gradually adopt optical alignment technology in the array process to improve panel resolution. At present, the alignment method used is the rubbing alignment. Since the thin-film transistor is a hill-like structure, the alignment of the cotton brush is at a high and low undulation, and the alignment result is poor. The contrast is reduced.

光配向是使用紫外光(UV),依所設定的線偏振(linear polarization)入射至配向膜(polyimide,PI),具特定振盪方向的電場打斷配向膜之特定方向鍵結,剩下的配向膜分子呈現異向性(anisotropy),也就是配向膜呈現單光軸(uniaxial)晶體特性。灌入液晶後,液晶分子和配向膜的吸引力,使液晶分子沿著特定方向定位,其中異向性大小就是評 價配向膜定向(錨定)液晶強弱的關鍵參數。 The light alignment is performed by using ultraviolet light (UV), which is incident on the alignment film (PI) according to the set linear polarization. The electric field with a specific oscillation direction interrupts the specific direction bonding of the alignment film, and the remaining alignment The membrane molecules exhibit anisotropy, that is, the alignment film exhibits uniaxial crystal characteristics. After the liquid crystal is poured, the attraction of the liquid crystal molecules and the alignment film causes the liquid crystal molecules to be positioned in a specific direction, wherein the anisotropy is evaluated The key parameters of the orientation alignment (anchoring) of the liquid crystal.

在光配向時需要進行異向性量測的必要性在於面板製造商透過配向膜的材料改良,曝光設備的參數調整(光強度,曝光時間...等),及配向膜的表面處理等方法來調整異向性大小。當異向性小,被施予電場的液晶分子在電場歸零後不會被拉回定位或是排列散亂。再者,異向性不一致是另一問題,液晶面板能夠正確動作,液晶分子必須排列方向一致。因此,單光軸異向性的配向膜扮演重要角色,當配向膜具有一致異向性,則顯示器效果就會好,沒有缺陷產生,但是若異向性不一致,液晶分子排列雜散,或是通電後無法歸位,顯示器就會產生缺陷。目前來說,光配向技術屬新導入的技術,面板製造商對於配向膜的參數掌握度還不足,異向性不一致的問題就被凸顯。 The necessity of performing anisotropy measurement in the optical alignment is the improvement of the material of the panel by the panel manufacturer, the parameter adjustment of the exposure apparatus (light intensity, exposure time, etc.), and the surface treatment of the alignment film. To adjust the size of the anisotropy. When the anisotropy is small, the liquid crystal molecules to which the electric field is applied are not pulled back or scattered after the electric field is zeroed. Furthermore, the inconsistency of the anisotropy is another problem, the liquid crystal panel can operate correctly, and the liquid crystal molecules must be aligned in the same direction. Therefore, the single-optical axis anisotropic alignment film plays an important role. When the alignment film has uniform anisotropy, the display effect is good and no defects are generated. However, if the anisotropy is inconsistent, the liquid crystal molecules are arranged in a stray, or If it cannot be returned after being powered on, the display will be defective. At present, the optical alignment technology is a newly introduced technology, and the panel manufacturer has insufficient grasping of the parameters of the alignment film, and the problem of inconsistent anisotropy is highlighted.

異向性所產生的缺陷在製程前段(array段)無法被監控,其要到製程後段(cell段)才會被發現(透過量測到cell gap不均勻),甚至到模組段才會被發現有缺陷產生,徒然浪費許多材料成本(包括玻璃基板、液晶、偏光板等)。本發明提出之異向性量測技術可簡化機構的複雜度,使探頭的尺寸縮小,較易整合至線上量測設備,並提升可靠度。 The defects generated by the anisotropy cannot be monitored in the front stage (array segment), and it will not be discovered until the latter part of the process (cell segment) (the cell gap is not evenly measured), even the module segment will be It was found that defects occurred, and many material costs (including glass substrates, liquid crystals, polarizing plates, etc.) were wasted. The anisotropic measurement technology proposed by the invention can simplify the complexity of the mechanism, reduce the size of the probe, integrate it easily into the online measuring device, and improve the reliability.

本發明實施例揭露一種異向性量測系統,包括:徑向起偏器,將光源產生之入射光的偏振方向轉變為 徑向;無偏振分光器,具有穿透反射面,入射光部分穿透穿透反射面而形成部分入射光;物鏡,接收部分入射光,將部分入射光聚焦至待測樣品,並接收反射自待測樣品之具有橢圓偏振之反射光後平行入射至穿透反射面;檢偏器,接收反射自穿透反射面之反射光並產生輸出光,輸出光的偏振方向被轉變為檢偏器之穿透軸的方向;影像偵測器,接收輸出光並產生形狀近似為圓之待測樣品反射光強度分佈圖;以及運算處理器,根據待測樣品反射光強度分佈圖求出之待測樣品反射光強度分佈曲線,並藉由修正瓊斯運算模型擬合待測樣品反射光強度分佈曲線以求得待測樣品之異向性。 Embodiments of the present invention disclose an anisotropic measurement system, including: a radial polarizer that converts a polarization direction of incident light generated by a light source into Radial; non-polarizing beam splitter having a penetrating reflecting surface, the incident light partially penetrates the reflecting surface to form part of the incident light; the objective lens receives part of the incident light, focuses part of the incident light to the sample to be tested, and receives the reflection from The sample to be tested has an elliptically polarized reflected light and is incident parallel to the penetrating reflecting surface; the analyzer receives the reflected light reflected from the penetrating reflecting surface and generates output light, and the polarization direction of the output light is converted into an analyzer. The direction of the transmission axis; the image detector receives the output light and generates a reflection light intensity distribution map of the sample to be tested with a shape similar to a circle; and an arithmetic processor, and the sample to be tested is obtained according to the reflected light intensity distribution map of the sample to be tested Reflecting the light intensity distribution curve, and fitting the reflected light intensity distribution curve of the sample to be tested by modifying the Jones operation model to obtain the anisotropy of the sample to be tested.

本發明實施例揭露一種異向性量測系統,包括:線性起偏器,將光源產生之入射光的偏振方向轉變為該線性起偏器的一第一穿透軸的方向;無偏振分光器,具有穿透反射面,入射光部分穿透穿透反射面而形成部分入射光;物鏡,接收部分入射光,將部分入射光聚焦至待測樣品,並接收反射自待測樣品之具有橢圓偏振之反射光後平行入射至穿透反射面;線性檢偏器,接收反射自穿透反射面之反射光並產生一輸出光,該輸出光的偏振方向被轉變為該線性檢偏器的一第二穿透軸方向;影像偵測器,接收輸出光並產生形狀近似為圓之待測樣品反射光強度分佈圖;以及運算處理器,根據待測樣品反射光強度分佈圖求 出之待測樣品反射光強度分佈曲線,並藉由修正瓊斯運算模型擬合該待測樣品反射光強度分佈曲線以求得待測樣品之異向性。 The embodiment of the invention discloses an anisotropic measuring system, comprising: a linear polarizer, converting a polarization direction of incident light generated by a light source into a direction of a first transmission axis of the linear polarizer; and a non-polarization beam splitter , having a penetrating reflecting surface, the incident light partially penetrates the reflecting surface to form part of the incident light; the objective lens receives part of the incident light, focuses part of the incident light to the sample to be tested, and receives the elliptically polarized reflection from the sample to be tested The reflected light is incident parallel to the penetrating reflecting surface; the linear analyzer receives the reflected light reflected from the penetrating reflecting surface and generates an output light, and the polarization direction of the output light is converted into a first of the linear analyzer a transmissive axis direction; an image detector that receives the output light and generates a reflected light intensity distribution map of the sample to be tested with a shape approximately circular; and an arithmetic processor that obtains a map according to the reflected light intensity of the sample to be tested The reflected light intensity distribution curve of the sample to be tested is obtained, and the reflected light intensity distribution curve of the sample to be tested is fitted by a modified Jones operation model to obtain the anisotropy of the sample to be tested.

本發明實施例揭露一種異向性量測方法,包括:藉由起偏器將入射光的偏振方向轉變為起偏器的第一穿透軸的方向;藉由無偏振分光器使得入射光部分穿透無偏振分光器而形成部分入射光;藉由物鏡將部分入射光聚焦至待測樣品並接收反射自待測樣品之具有橢圓偏振之反射光後平行輸出至無偏振分光器;藉由檢偏器接收反射自無偏振分光器之反射光並產生輸出光,其中,輸出光的偏振方向被轉變為檢偏器的第二穿透軸的方向;根據輸出光之形狀近似為圓的待測樣品反射光強度分佈圖求出待測樣品反射光強度分佈曲線;以及藉由修正瓊斯運算模型擬合待測樣品反射光強度分佈曲線以求出待測樣品之異向性。 An embodiment of the present invention discloses an anisotropic measurement method, including: converting a polarization direction of incident light into a direction of a first transmission axis of a polarizer by a polarizer; and making an incident light portion by a non-polarization beam splitter Passing through the non-polarizing beam splitter to form part of the incident light; focusing part of the incident light to the sample to be tested by the objective lens and receiving the reflected light having elliptically polarized reflection from the sample to be tested, and then outputting to the non-polarizing beam splitter in parallel; The polarizer receives the reflected light reflected from the non-polarization beam splitter and generates output light, wherein the polarization direction of the output light is converted into the direction of the second transmission axis of the analyzer; the shape of the output light is approximately a circle to be tested The reflected light intensity distribution map of the sample is used to obtain a reflected light intensity distribution curve of the sample to be tested; and the reflected light intensity distribution curve of the sample to be tested is obtained by modifying the Jones operation model to obtain the anisotropy of the sample to be tested.

本發明揭露一種如前述實施例所述之異向性量測方法之校正方法,包括:取得標準樣品之形狀近似為圓的標準樣品反射光光強度分佈圖;根據標準樣品反射光強度分佈圖求出標準樣品反射光強度分佈曲線;以及藉由瓊斯運算模型擬合標準樣品反射光強度分佈曲線,以求出校正矩陣。 The invention discloses a method for correcting an anisotropic measurement method according to the foregoing embodiment, which comprises: obtaining a reflected light intensity distribution map of a standard sample whose shape is approximately a circle; and obtaining a light intensity distribution map according to a standard sample The reflected light intensity distribution curve of the standard sample is obtained; and the reflected light intensity distribution curve of the standard sample is fitted by a Jones calculation model to obtain a correction matrix.

本發明揭露一種異向性量測方法,包括:藉由線性起偏器將入射光的偏振方向轉變為起偏器的第一穿透 軸的方向,線性起偏器繞第一光軸旋轉360度;藉由無偏振分光器使得入射光部分穿透無偏振分光器而形成部分入射光;藉由物鏡將部分入射光聚焦至待測樣品並接收反射自待測樣品之具有橢圓偏振之反射光後平行輸出至無偏振分光器;藉由線性檢偏器接收反射自無偏振分光器之反射光並產生輸出光,其中,輸出光的偏振方向被轉變為檢偏器的第二穿透軸的方向,線性檢偏器繞第二光軸旋轉360度並與線性檢偏器同步旋轉360度;根據輸出光之形狀近似為圓的待測樣品反射光強度分佈圖求出待測樣品反射光強度分佈曲線;以及根據不同的該待測樣品的待測樣品反射光強度分佈曲線的振幅大小來判斷異向性相對大小。 The invention discloses an anisotropic measurement method, comprising: converting a polarization direction of incident light into a first penetration of a polarizer by a linear polarizer In the direction of the axis, the linear polarizer rotates 360 degrees around the first optical axis; the incident light partially penetrates the non-polarizing beam splitter to form part of the incident light by the non-polarizing beam splitter; and the incident light is focused by the objective lens to be tested And receiving the reflected light having elliptically polarized reflection from the sample to be tested and outputting to the non-polarization beam splitter in parallel; receiving the reflected light reflected from the non-polarization beam splitter by the linear analyzer and generating output light, wherein the output light The polarization direction is converted into the direction of the second transmission axis of the analyzer, the linear analyzer rotates 360 degrees around the second optical axis and rotates 360 degrees synchronously with the linear analyzer; the shape of the output light is approximately circular The reflected light intensity distribution map of the sample is obtained to obtain a reflected light intensity distribution curve of the sample to be tested; and the relative size of the anisotropy is determined according to the amplitude of the reflected light intensity distribution curve of the sample to be tested.

本發明實施例揭露一種異向性量測系統,包括:線性起偏器,將光源產生之入射光的偏振方向轉變為線性起偏器的第一穿透軸的方向,其中線性起偏器繞第一光軸旋轉360度;無偏振分光器,具有穿透反射面,入射光部分穿透穿透反射面而形成部分入射光;物鏡,接收部分入射光,將部分入射光聚焦至待測樣品,並接收反射自待測樣品之具有橢圓偏振之反射光後平行入射至穿透反射面;線性檢偏器,接收反射自穿透反射面之反射光並產生輸出光,輸出光的偏振方向被轉變為線性檢偏器的第二穿透軸方向,其中線性檢偏器繞第二光軸旋轉360度並與線性檢偏器同步旋轉360度;影像偵測器,接收該輸出光並產生 形狀近似為圓之待測樣品反射光強度分佈圖;以及運算處理器,在待測樣品反射光強度分佈圖上之位置擷取待測樣品的待測樣品反射光強度分佈曲線,並根據不同的待測樣品的待測樣品反射光強度分佈曲線的振幅大小來判斷異向性相對大小。 An embodiment of the present invention discloses an anisotropic measurement system, including: a linear polarizer that converts a polarization direction of incident light generated by a light source into a direction of a first transmission axis of a linear polarizer, wherein the linear polarizer is wound The first optical axis rotates 360 degrees; the non-polarizing beam splitter has a penetrating reflecting surface, and the incident light partially penetrates the reflecting surface to form part of the incident light; the objective lens receives part of the incident light, and focuses part of the incident light to the sample to be tested And receiving the reflected light having the elliptical polarization reflected from the sample to be tested and then parallelly incident to the penetrating reflecting surface; the linear analyzer receives the reflected light reflected from the penetrating reflecting surface and generates output light, and the polarization direction of the output light is Converting into a second penetration axis direction of the linear analyzer, wherein the linear analyzer rotates 360 degrees around the second optical axis and rotates 360 degrees synchronously with the linear analyzer; the image detector receives the output light and generates The shape is approximated as a circle of the reflected light intensity distribution of the sample to be tested; and the arithmetic processor extracts the reflected light intensity distribution curve of the sample to be tested on the position of the reflected light intensity distribution of the sample to be tested, and according to different The magnitude of the amplitude of the reflected light intensity distribution curve of the sample to be tested is used to determine the relative size of the anisotropy.

100、200、300、400‧‧‧異向性量測系統 100, 200, 300, 400‧‧‧ anisotropy measurement system

10‧‧‧光源 10‧‧‧Light source

11‧‧‧準直透鏡 11‧‧‧ Collimating lens

12a、12b‧‧‧徑向起偏器 12a, 12b‧‧‧ Radial polarizer

12c、12d‧‧‧線性起偏器 12c, 12d‧‧‧ linear polarizer

14‧‧‧無偏振分光器 14‧‧‧No polarization beam splitter

16‧‧‧物鏡 16‧‧‧ Objective lens

17‧‧‧待測樣品 17‧‧‧Test samples

21‧‧‧基板 21‧‧‧Substrate

18a‧‧‧切向檢偏器 18a‧‧‧ Tangential analyzer

d‧‧‧厚度 D‧‧‧thickness

18b、18c、18d‧‧‧線性檢偏器 18b, 18c, 18d‧‧‧ linear analyzer

20‧‧‧影像偵測器 20‧‧‧Image Detector

22‧‧‧運算處理器 22‧‧‧Operation processor

Lo‧‧‧入射光 Lo‧‧‧ incident light

Lin‧‧‧部分入射光 Lin‧‧‧ Partial incident light

Lreflec‧‧‧反射光 Lreflec‧‧·reflected light

Lout‧‧‧輸出光 Lout‧‧‧ output light

no‧‧‧正常折射率 No‧‧‧normal refractive index

ne‧‧‧異常折射率 Ne‧‧‧Abnormal refractive index

θ‧‧‧部分入射光與光軸的夾角 Θ‧‧‧ The angle between the incident light and the optical axis

θi‧‧‧入射角 Θi‧‧‧ incident angle

Ψ‧‧‧方位角 Ψ‧‧ Azimuth

O‧‧‧圓心 O‧‧‧ Center

P1~Pn‧‧‧點 P1~Pn‧‧‧

C1‧‧‧內圓 C1‧‧‧ inner circle

C2‧‧‧外圓 C2‧‧‧ outer circle

θtilt‧‧‧傾斜角 θtilt‧‧‧Tilt angle

Cstd_fit‧‧‧標準樣品擬合圓 C std_fit ‧‧‧Standard sample fitting circle

Csample_fit‧‧‧待測樣品擬合圓 C sample_fit ‧‧‧Filling sample to fit

a、b、c、d、e‧‧‧路徑 a, b, c, d, e‧‧ path

本發明將搭配所附圖式說明如下。 The invention will be described below in conjunction with the drawings.

第1圖是本發明揭露之第一實施例之異向性量測系統的示意圖。 Figure 1 is a schematic illustration of an anisotropic measurement system of a first embodiment of the present invention.

第2a-2c圖是說明本發明揭露之所有實施範例之異向性量測系統及方法的原理的示意圖。 2a-2c are schematic diagrams illustrating the principles of the anisotropic measurement systems and methods of all embodiments of the present disclosure.

第3a圖使用路徑a,b,c,d,e說明部分入射光與反射光的路徑及本發明異向性量測裝置及方法的原理。 Figure 3a illustrates the principles of the path of partially incident and reflected light and the principles of the anisotropic measuring apparatus and method of the present invention using paths a, b, c, d, e.

第3b圖顯示部分入射光、反射光及輸出光在分別代表上述光的圓(樣品擬合圓)上的位置對應關係。 Figure 3b shows the positional correspondence of the partially incident light, the reflected light, and the output light on a circle (sample fitting circle) representing the above light, respectively.

第4a-4c圖分別繪示本發明揭露之第一至第三實施例之異向性量測系統中,部分入射光、反射光及輸出光的偏振型態及強度。 4a-4c are diagrams showing polarization states and intensities of partially incident light, reflected light, and output light in the anisotropic measuring systems of the first to third embodiments of the present invention.

第4d圖繪示在本發明揭露之第四實施例之異向性量測系統中,部分入射光、反射光及輸出光在線性起偏器及線性同步繞軸旋轉下的偏振型態及強度。 Figure 4d is a diagram showing polarization patterns and intensities of partially incident light, reflected light, and output light in a linear polarizer and linear synchronous pivoting in the anisotropic measuring system of the fourth embodiment of the present invention. .

第4e圖繪示在本發明揭露之第四實施例中,同一待測樣品 以P入射S接收(左圓)及S入射S接收(右圓)的待測樣品反射光強度分佈曲線。 Figure 4e is a diagram showing the same sample to be tested in the fourth embodiment of the present invention. The reflected light intensity distribution curve of the sample to be tested is received by P incidence S (left circle) and S incident S (right circle).

第5圖是本發明揭露之第二實施例之異向性量測系統的示意圖。 Figure 5 is a schematic illustration of an anisotropic measurement system of a second embodiment of the present invention.

第6圖是本發明揭露之第三實施例之異向性量測系統的示意圖。 Figure 6 is a schematic illustration of an anisotropic measurement system of a third embodiment of the present invention.

第7圖是本發明揭露之第四實施例之異向性量測系統的示意圖。 Figure 7 is a schematic illustration of an anisotropic measurement system of a fourth embodiment of the present invention.

第8a圖是說明本發明揭露之第五實施例及第六實施例(含校正程序)之異向性量測方法的流程圖。 Figure 8a is a flow chart illustrating an anisotropic measurement method of a fifth embodiment and a sixth embodiment (including a calibration procedure) according to the present invention.

第8b圖是說明本發明揭露之第五實施例求出標準樣品反射光強度分佈曲線及第六實施例求出待測樣品反射光強度分佈曲線的流程圖。 Fig. 8b is a flow chart for explaining the reflected light intensity distribution curve of the standard sample and the curve of the reflected light intensity of the sample to be tested according to the fifth embodiment of the present invention.

第9a圖是本發明之異向性量測系統及方法實施範例取得之標準樣品強度分佈圖。 Figure 9a is a standard sample intensity profile obtained by an embodiment of the anisotropic measurement system and method of the present invention.

第9b圖上圖是本發明之異向性量測系統及方法實施範例取得之待測樣品強度分佈圖,下圖是待測樣品反射光強度分佈曲線。 Figure 9b is a graph showing the intensity distribution of the sample to be tested obtained by the embodiment of the anisotropic measurement system and method of the present invention. The figure below shows the intensity distribution curve of the sample to be tested.

第1圖是本發明揭露第一實施例之異向性量測系統100的示意圖。異向性量測裝置100包括光源10、徑向起偏 器(radial polarizer)12a、無偏振分光器14、物鏡16、切向檢偏器(tangential analyzer)18、影像偵測器20及運算處理器22。光源10產生入射光Lo,其中入射光Lo為單波長(single wavelength)及未偏振(non-polarized)的光。在本實施例中,光源10為發光二極體(LED)配合使用帶通濾光片(bandpass filter)使得入射光Lo的波長為633nm,或使用波長633nm的雷射,但並非以此為限。在揭露之所有實施範例中,入射光的波長可視異向性量測裝置的組態而定。 1 is a schematic diagram of an anisotropic measurement system 100 in accordance with a first embodiment of the present invention. The anisotropy measuring device 100 includes a light source 10 and a radial bias A radiator polarizer 12a, a non-polarization beam splitter 14, an objective lens 16, a tangential analyzer 18, an image detector 20, and an arithmetic processor 22. The light source 10 generates incident light Lo, wherein the incident light Lo is a single wavelength and a non-polarized light. In this embodiment, the light source 10 is a light emitting diode (LED) in combination with a bandpass filter such that the wavelength of the incident light Lo is 633 nm, or a laser having a wavelength of 633 nm is used, but not limited thereto. . In all embodiments disclosed, the wavelength of the incident light may depend on the configuration of the anisotropic measuring device.

在第一實施例中,異向性量測裝置100更包括準直透鏡11,準直透鏡11將入射光Lo的光束直徑限制於所需數值,例如約4毫米(mm),但並非以此為限。 In the first embodiment, the anisotropic measuring device 100 further includes a collimating lens 11 that limits the beam diameter of the incident light Lo to a desired value, for example, about 4 millimeters (mm), but not Limited.

徑向起偏器12將入射光Lo的偏振方向轉變為徑向。具有徑向偏振的入射光Lo,其光束每一點的偏振方向均朝向光束中心。 The radial polarizer 12 converts the polarization direction of the incident light Lo into a radial direction. The incident light Lo having a radial polarization has a polarization direction at each point of the beam toward the center of the beam.

無偏振分光器(non-Polarized beam splitter,NPBS)14具有穿透反射面(transflective surface)。NPBS 14根據光強度的比例,例如50:50,使得具有徑向偏振的入射光Lo部分穿透穿透反射面而形成部分入射光Lin。部分入射光Lin的偏振方向不會被NPBS 14改變,故部分入射光Lin的偏振方向仍為徑向。 A non-Polarized Beam Splitter (NPBS) 14 has a transflective surface. The NPBS 14 is caused to partially penetrate the reflecting surface to form part of the incident light Lin according to the ratio of the light intensity, for example, 50:50. The polarization direction of the portion of the incident light Lin is not changed by the NPBS 14, so that the polarization direction of the portion of the incident light Lin is still radial.

物鏡16接收部分入射光Lin,將部分入射光Lin聚焦至待測樣品17,並接收反射自待測樣品17之具有橢圓 偏振之反射光Lreflec後平行入射至穿透反射面。 The objective lens 16 receives a portion of the incident light Lin, focuses a portion of the incident light Lin to the sample 17 to be tested, and receives an ellipse reflected from the sample 17 to be tested. The polarized reflected light Lreflec is then incident parallel to the penetrating reflecting surface.

切向檢偏器18a,接收反射自穿透反射面之反射光Lreflec並產生輸出光Lout,輸出光Lout的偏振方向被轉變為切線方向。具有切向偏振的輸出光Lout,其光束每一點的偏振方向均在切線方向。 The tangential analyzer 18a receives the reflected light Lreflec reflected from the penetrating reflecting surface and generates the output light Lout, and the polarization direction of the output light Lout is converted into a tangential direction. The output light Lout having tangential polarization has a polarization direction at each point of the beam in a tangential direction.

影像偵測器20接收輸出光Lout並產生形狀近似為圓之待測樣品反射光強度分佈圖(參考第9b圖)。在本發明揭露之所有實施範例中,影像偵測器20可為具有二維擷取影像功能之電荷耦合元件(CCD)陣列或互補式金屬氧化物半導體元件(CMOS)陣列。 The image detector 20 receives the output light Lout and generates a reflected light intensity distribution map of the sample to be tested whose shape is approximately a circle (refer to FIG. 9b). In all embodiments of the present disclosure, the image detector 20 can be a charge coupled device (CCD) array or a complementary metal oxide semiconductor device (CMOS) array having a two-dimensional image capture function.

運算處理器22根據待測樣品反射光強度分佈圖求出之待測樣品反射光強度分佈曲線,並藉由修正瓊斯運算模型(modified Jones calculus model)擬合(fitting)待測樣品反射光強度分佈曲線以求得待測樣品之異向性。在本發明揭露之所有實施範例中,運算處理器22可為電子計算機,或具有電子計算機功能之裝置。 The arithmetic processor 22 obtains a reflected light intensity distribution curve of the sample to be tested according to the reflected light intensity distribution map of the sample to be tested, and fits the reflected light intensity distribution of the sample to be tested by a modified Jones calculus model The curve is used to determine the anisotropy of the sample to be tested. In all of the embodiments disclosed herein, the arithmetic processor 22 can be an electronic computer or a device having an electronic computer function.

第2a-2c圖是說明本發明揭露之所有實施範例異向性量測系統及方法的原理的示意圖。 2a-2c are schematic diagrams illustrating the principles of all embodiments of the anisotropy measurement system and method disclosed herein.

在本發明揭露之所有實施範例中,待測樣品17可為單光軸(uniaxial)的異向性材料,例如配向膜等,基板21可為各向同性(isotropy)材料,例如玻璃等。光學折射率橢球(Refractive Index Ellipsoid)用來說明本發明異向性量測系統 及方法的原理。假設配向膜為負單光軸,即正常折射率(ordinary index)no小於異常折射率(extraordinary index)ne,其中異常折射率ne的軸表示光軸,另假設折射率橢球的方位角ψ(azimuthal angle)為0度(光軸在XZ平面),並以一傾斜角θtilt傾斜如第3圖之示意圖所示。入射光可能穿透待測樣品17射至基板21並造成在基板21的反射。但若基板21是各向同性,在基板21的反射並非異向性反射,所以可以忽略基板21的反射並得到待測樣品17的異向性。 In all the embodiments disclosed in the present invention, the sample to be tested 17 may be a uniaxial anisotropic material such as an alignment film or the like, and the substrate 21 may be an isotropic material such as glass or the like. The Refractive Index Ellipsoid is used to illustrate the principles of the anisotropic measurement system and method of the present invention. Suppose the alignment film is a negative uniaxial, i.e., ordinary refractive index (ordinary index) no less than the extraordinary refractive index (extraordinary index) ne, where ne is the extraordinary refractive index axis indicates the optical axis, and the other index ellipsoid is assumed that the azimuth angle [Psi] ( The azimuthal angle is 0 degrees (the optical axis is in the XZ plane) and is inclined at an inclination angle θtilt as shown in the schematic diagram of FIG. The incident light may penetrate the sample 17 to be tested to the substrate 21 and cause reflection at the substrate 21. However, if the substrate 21 is isotropic, the reflection on the substrate 21 is not anisotropic reflection, so the reflection of the substrate 21 can be ignored and the anisotropy of the sample 17 to be tested can be obtained.

參考第2a圖示意圖,當入射的部分偏振光Lin是P波且平行光軸入射單光軸材料,P波感受的折射率為no,所以不會發生雙折射,其中部分偏振光Lin的入射角為θi。此條件下,反射光Lreflec僅具有P波。除了待測樣品17及基板21之間的界面的反射之外,待測樣品17及空氣之間的界面的反射波亦為P波。 Referring to the schematic diagram of Fig. 2a, when the incident partial polarization light Lin is a P wave and the parallel optical axis is incident on the single optical axis material, the P wave senses a refractive index of no, so birefringence does not occur, and the incident angle of the partially polarized light Lin Is θi. Under this condition, the reflected light Lreflec has only P waves. In addition to the reflection of the interface between the sample 17 to be tested and the substrate 21, the reflected wave at the interface between the sample 17 to be tested and the air is also a P wave.

參考第2b圖,當入射的部分偏振光Lin是P波且垂直光軸入射單光軸材料,P波感受的折射率為ne,所以不會發生雙折射。此條件下,反射光Lreflec僅具有P波。 Referring to Fig. 2b, when the incident partial polarized light Lin is a P wave and the vertical optical axis is incident on the single optical axis material, the P wave senses a refractive index of ne, so that birefringence does not occur. Under this condition, the reflected light Lreflec has only P waves.

參考第2c圖示意圖,當入射的部分偏振光Lin具有P波及S波,且與光軸夾一個角度θ入射單光軸材料,部分偏振光Lin感受到兩種折射率no及ne,便會發生雙折射。此時,部分偏振光Lin被分為振動方向垂直主平面(XZ平面)且遵守司乃耳定律(Snell’s law)的尋常光(o-ray,o光),以及振動方向 平行主平面且同樣遵守司乃耳定律的異常光(e-ray,e光)。o光及e光經待測樣品17反射後以S波及P波射回空氣中。此條件下,反射光Lreflec具有S波的分量及P波的分量。當S波的分量及P波的分量的相位差ΔΦ滿足ΔΦ≠,k為整數時,S波的分量及P波的分量干涉並形成具有橢圓偏振的反射光Lreflec,其中,λ為波長,d為待測樣品17的厚度,且折射率差Δn=ne-noReferring to the schematic diagram of Fig. 2c, when the incident partially polarized light Lin has a P wave and an S wave, and the single optical axis material is incident at an angle θ with the optical axis, the partial polarized light Lin senses two refractive indices no and ne, which occurs. Birefringence. At this time, the partially polarized light Lin is divided into a vertical principal plane (XZ plane) of the vibration direction and obeys the ordinary light (o-ray, o-light) of Snell's law, and the vibration direction is parallel to the principal plane and is also observed. Anomalous light (e-ray, e-light) from the law of Sinar. o The light and the e-light are reflected by the sample to be tested 17 and then returned to the air with the S wave and the P wave. Under this condition, the reflected light Lreflec has a component of the S wave and a component of the P wave. When the phase difference ΔΦ of the component of the S wave and the component of the P wave satisfies ΔΦ ≠ , k is an integer, the component of the S wave and the component of the P wave interfere to form a reflected light Lreflec having an elliptically polarized light, wherein , λ is the wavelength, d is the thickness of the sample 17 to be tested, and the refractive index difference Δ n = ne - no .

參考第3a-3b圖之示意圖,部分入射光Lin經物鏡16聚焦後形成錐形光束並射至待測樣品17。錐形光束的路徑a,b,c,c,d,e被用來舉例說明部分入射光Lin、反射光Lreflec及輸出光Lout的在影像偵測器20取樣圓上(後稱樣品擬合圓)的位置對應關係。例如,沿路徑a的部分入射光Lin以入射角θi且平行光軸射至待測樣品17,並以垂直光軸的路徑e反射回物鏡16,並被無偏振分光器17反射後,形成成像於反射光Lreflec及輸出光Lout之樣品擬合圓上90度的光束。路徑c以入射角θi且與光軸夾一個角度θ入射待測樣品17,並對稱法線(Z軸)反向反射回物鏡16,並被無偏振分光器17反射後,形成成像於反射光Lreflec及輸出光Lout之樣品擬合圓上180度的光束。路徑e以入射角θi且垂直光軸射至待測樣品17,並以平行光軸的路徑e反射回物鏡16,並被無偏振分光器17反射後,形成成像於反射光Lreflec及輸出光Lout之樣品擬合圓上270度的光束。餘 此類推,不再贅述。 Referring to the schematic diagram of Fig. 3a-3b, part of the incident light Lin is focused by the objective lens 16 to form a cone beam and is incident on the sample to be tested 17. The paths a, b, c, c, d, e of the cone beam are used to illustrate the partial incident light Lin, the reflected light Lreflec and the output light Lout on the sampling circle of the image detector 20 (hereinafter referred to as the sample fitting circle) Position correspondence. For example, a portion of the incident light Lin along the path a is incident on the sample 17 to be tested at an incident angle θi and a parallel optical axis, and is reflected back to the objective lens 16 by a path e of a vertical optical axis, and is reflected by the non-polarizing beam splitter 17 to form an image. A beam of 90 degrees on the circle is fitted to the sample of the reflected light Lreflec and the output light Lout. The path c is incident on the sample 17 to be tested at an incident angle θi and at an angle θ with the optical axis, and is symmetrically reflected back to the objective lens 16 by a symmetrical normal line (Z-axis), and is reflected by the non-polarization beam splitter 17 to form an image for reflected light. The sample of Lreflec and the output light Lout fits a beam of 180 degrees on the circle. The path e is incident on the sample 17 to be tested at an incident angle θi and perpendicular to the optical axis, and is reflected back to the objective lens 16 by a path e of a parallel optical axis, and is reflected by the non-polarizing beam splitter 17 to form an image of the reflected light Lreflec and the output light Lout. The sample fits a beam of 270 degrees on a circle. Yu This type of push will not be repeated.

第4a-4d圖是說明部分輸入光Lin進入物鏡16之前、反射光Lreflec進入各檢偏器之前及輸出光Lout的偏振型態及強度變化的示意圖。本發明第一至第四實施範例分別搭配第4a-4d圖作說明如下。 4a-4d is a schematic diagram illustrating the polarization state and intensity change of the output light Lout before the reflected light Lreflec enters each of the analyzers before the input light Lin enters the objective lens 16. The first to fourth embodiments of the present invention are described below in conjunction with Figs. 4a-4d, respectively.

在本發明第一實施例中,起偏器為徑向起偏器12a,檢偏器為切向檢偏器18a。參考第4a圖示意圖,左圓代表部分輸入光Lin進入物鏡16之前的光束。通過徑向起偏器12a的光束中的每一個位置的偏振方向被轉變為徑向,所以左圓上的每一個位置的偏振方向都在徑向(朝向圓心),其中,左圓上雙箭頭的長度均相等表示強度均相等,且左圓之符號a-e表示左圓上各個位置的光線進入待測樣品17的相應路徑a-e,如第3a圖示意圖所述。 In the first embodiment of the present invention, the polarizer is a radial polarizer 12a, and the analyzer is a tangential analyzer 18a. Referring to the schematic diagram of Fig. 4a, the left circle represents the beam before the partial input light Lin enters the objective lens 16. The polarization direction of each of the light beams passing through the radial polarizer 12a is converted into a radial direction, so the polarization direction of each position on the left circle is in the radial direction (toward the center of the circle), wherein the double arrow on the left circle The equal lengths indicate that the intensities are equal, and the symbol ae of the left circle indicates that the light at each position on the left circle enters the corresponding path ae of the sample 17 to be tested, as described in the schematic diagram of Fig. 3a.

第4a圖的中圓表示反射光Lreflec進入切向檢偏器18a之前的光束。如第2a圖示意圖所述,沿路徑a的進入待測樣品17的部分入射光Lin是P波,故沿路徑e反射離開待測樣品17之反射光Lreflec僅具有P波;沿路徑e的進入待測樣品17的部分入射光Lin是P波,故沿路徑a反射離開待測樣品17之反射光Lreflec僅具有P波。沿路徑c的部分入射光Lin具有P波及S波並與光軸夾一個角度θ入射待測樣品17,所以反射光Lreflec會形成橢圓偏振。中圓之符號a-e表示中圓上每一個位置的光線分別來自相應路徑a-e。沿路徑a前進的部分入射光Lin在被無 偏振分光器14反射之前的偏振方向為X方向,在被無偏振分光器14反射之後(反射光Lreflec)的偏振方向為Z方向,因此左圓上0度及180度位置上的光線的偏振方向為X方向,中圓上90度及270度位置上的光線(分別來自路徑a、e)的偏振方向為Z方向。來自路徑c的反射光Lreflec的偏振被轉變為橢圓偏振,因此中圓上180度位置上的光線的偏振方向被標示為橢圓偏振。 The middle circle of Fig. 4a indicates the light beam before the reflected light Lreflec enters the tangential analyzer 18a. As shown in the schematic diagram of FIG. 2a, part of the incident light Lin entering the sample to be tested 17 along the path a is a P wave, so that the reflected light Lreflec reflected off the sample 17 along the path e has only a P wave; the entry along the path e Part of the incident light Lin of the sample to be tested 17 is a P wave, so that the reflected light Lreflec reflected off the sample 17 along the path a has only a P wave. Part of the incident light Lin along the path c has a P wave and an S wave and enters the sample 17 to be tested at an angle θ with the optical axis, so the reflected light Lreflec forms an elliptical polarization. The symbol a-e of the middle circle indicates that the light at each position on the middle circle comes from the corresponding path a-e. Part of the incident light Lin along the path a is in the absence The polarization direction before the polarization beam splitter 14 reflects is the X direction, and after being reflected by the non-polarization beam splitter 14 (the reflected light Lreflec), the polarization direction is the Z direction, so the polarization direction of the light at the 0 degree and 180 degree positions on the left circle. In the X direction, the polarization directions of the rays at 90 degrees and 270 degrees on the middle circle (from paths a and e, respectively) are the Z direction. The polarization of the reflected light Lreflec from the path c is converted into an elliptical polarization, so the polarization direction of the light at a position of 180 degrees on the middle circle is marked as elliptically polarized.

第4a圖的右圓表示輸出光Lout的光束。因為切向檢偏器18a僅讓切向的偏振分量通過,所以沿路徑a、e且呈現線性偏振的反射光Lreflec被截掉(cut)而無法通過切向檢偏器18a,沿路徑b、c、d且呈現橢圓偏振的反射光Lreflec的切向偏振分量(短軸方向)可以通過切向檢偏器18a。其中,路徑a、e沒有光可以通過,所以是極小值;路徑c的切向偏振分量最大,所以是極大值;路徑b、d則是介於極小值及極大值的數值。輸出光Lout的強度由路徑a的極小值(90度)經路徑b遞增至路徑c的極大值(180度),再經路徑d遞減至路徑e的極小值(270度)。然後,由軸對稱特性可推知,輸出光Lout的強度由路徑e的極小值(270度)遞增至360度的極大值,再遞減至路徑a的極小值。代表輸出光Lout的光束的右圓上的強度因此具有周期性強度分佈,此輸出光Lout週期性的強度分佈攜帶具有待測樣品17的異向性的資訊。 The right circle of Fig. 4a indicates the light beam of the output light Lout. Since the tangential analyzer 18a passes only the tangential polarization component, the reflected light Lreflec that exhibits linear polarization along the paths a, e is cut away from passing through the tangential analyzer 18a, along the path b, The tangential polarization component (short axis direction) of c, d and the reflected light Lreflec exhibiting elliptically polarized light may pass through the tangential analyzer 18a. Among them, the paths a and e have no light to pass, so they are minimum values; the tangential polarization component of the path c is the largest, so it is the maximum value; the paths b and d are the values of the minimum value and the maximum value. The intensity of the output light Lout is incremented by the minimum value of path a (90 degrees) via path b to the maximum value of path c (180 degrees), and then decremented by path d to the minimum value of path e (270 degrees). Then, from the axisymmetric characteristic, it can be inferred that the intensity of the output light Lout is increased from the minimum value of the path e (270 degrees) to the maximum value of 360 degrees, and then decremented to the minimum value of the path a. The intensity on the right circle of the light beam representing the output light Lout thus has a periodic intensity distribution, and the periodic intensity distribution of this output light Lout carries information with the anisotropy of the sample 17 to be tested.

由於本發明光束中每一個位置的偏振型態及強 度分佈具有軸對稱特性,且路徑a、c分別是週期性強度分佈的極小值及極大值,路徑b及d是介於極小值及極大值的數值,所以路徑b及d的橢圓是相等的,且小於路徑c的橢圓。此外,在上述說明中,橢圓偏振的長軸在徑向,但另有橢圓偏振的長軸垂直徑向的可能性,此端視no、ne的數值而定,上述說明雖僅揭露橢圓偏振的長軸在徑向,但並非用於限制本發明。 Due to the polarization pattern and intensity of each position in the beam of the present invention The degree distribution has an axisymmetric property, and the paths a and c are the minimum and maximum values of the periodic intensity distribution, respectively, and the paths b and d are values between the minimum value and the maximum value, so the ellipse of the paths b and d are equal. And less than the ellipse of path c. Further, in the above description, the long axis of the elliptical polarization is in the radial direction, but there is another possibility that the long axis of the elliptical polarization is perpendicular to the radial direction, and the end depends on the values of no and ne, and the above description only discloses the elliptical polarization. The long axis is radial, but is not intended to limit the invention.

第5圖是本發明揭露之第二實施例的異向性量測系統200的示意圖,其中起偏器為徑向起偏器12b,檢偏器為線性檢偏器18b。參考第4b圖示意圖,由於第4b圖的起偏器與第4a圖的起偏器均為徑向起偏器,所以第二實施例的部分輸入光Lin(第4b圖左圓)與反射光Lreflec(第4b圖中圓)的偏振型態及強度變化與第4a圖左圓及第4a圖右圓相同。不同於第一實施例不同的是,第二實施例使用線性檢偏器18b。線性檢偏器18b的穿透軸(transmission axis)設置於Y方向,因此,線性檢偏器18b僅讓反射光Leflec中Y方向的偏振分量通過,所以沿路徑a、e且呈現線性偏振(Z方向)的反射光Lreflec被截掉(cut)而無法通過線性檢偏器18b,沿路徑b、c、d且呈現橢圓偏振的反射光Lreflec的Y方向偏振分量可以通過線性檢偏器18b。其中,路徑a、e沒有光可以通過,所以是極小值;路徑c的Y方向偏振分量最大,所以是極大值;路徑b、d則是介於極小值及極大值的數值。 Figure 5 is a schematic illustration of an anisotropic measurement system 200 in accordance with a second embodiment of the present invention, wherein the polarizer is a radial polarizer 12b and the analyzer is a linear analyzer 18b. Referring to the schematic diagram of FIG. 4b, since the polarizer of FIG. 4b and the polarizer of FIG. 4a are both radial polarizers, part of the input light Lin of the second embodiment (left circle of FIG. 4b) and reflected light The polarization pattern and intensity change of Lreflec (the circle in Fig. 4b) are the same as the left circle of Fig. 4a and the right circle of Fig. 4a. Different from the first embodiment, the second embodiment uses the linear analyzer 18b. The transmission axis of the linear analyzer 18b is set in the Y direction, and therefore, the linear analyzer 18b passes only the polarization component in the Y direction of the reflected light Leflec, so it exhibits linear polarization along the paths a, e (Z The reflected light Lreflec of the direction is cut away from passing through the linear analyzer 18b, and the Y-direction polarization component of the reflected light Lreflec along the paths b, c, d and exhibiting elliptically polarized light can pass through the linear analyzer 18b. Among them, the paths a and e have no light to pass, so they are minimum values; the path c has the largest polarization component in the Y direction, so it is the maximum value; the paths b and d are the values between the minimum value and the maximum value.

第6圖是本發明揭露之第三實施例的異向性量測系統300的示意圖,其中起偏器為線性起偏器12c,檢偏器為線性檢偏器18c。參考第4c圖,第三實施例的線性起偏器12c的穿透軸設置於X方向,因此,部分輸入光Lin的偏振方向均在X方向。 Figure 6 is a schematic illustration of an anisotropic measurement system 300 in accordance with a third embodiment of the present invention, wherein the polarizer is a linear polarizer 12c and the analyzer is a linear analyzer 18c. Referring to Fig. 4c, the transmission axis of the linear polarizer 12c of the third embodiment is disposed in the X direction, and therefore, the polarization directions of the partial input lights Lin are all in the X direction.

相同於第一及第二實施例,部分入射光Lin沿路徑a、e入射待測樣品17並在90度及270度形成具有線性偏振(Z方向)的反射光Lreflec。不同於第一及第二實施例的是,沿路徑c入射待測樣品17的部分入射光Lin僅具有S波。雖然如此,沿路徑c入射待測樣品17的部分入射光Lin並非平行光軸入射待測樣品17,所以180度的反射光Lreflec仍會是橢圓偏振的。其他角度的反射光Lreflec(路徑b、d)的偏振型態與強度與第一及第二實施例相同。第三實施例的橢圓偏振,其長軸方向均在Y方向。 In the same manner as the first and second embodiments, part of the incident light Lin is incident on the sample 17 to be tested along the paths a, e and forms reflected light Lreflec having linear polarization (Z direction) at 90 degrees and 270 degrees. Unlike the first and second embodiments, a portion of the incident light Lin incident on the sample 17 to be tested along the path c has only S waves. Nonetheless, a portion of the incident light Lin incident on the sample to be tested 17 along the path c is not incident on the sample 17 to be tested on the parallel optical axis, so the 180-degree reflected light Lreflec may still be elliptically polarized. The polarization patterns and intensities of the reflected light Lreflec (paths b, d) at other angles are the same as in the first and second embodiments. The elliptical polarization of the third embodiment has a long axis direction in the Y direction.

第三實施例的線性檢偏器18c的穿透軸設置於Y方向,所以線性檢偏器18c僅讓反射光Leflec中Y方向的偏振分量通過,所以沿路徑a、e且呈現線性偏振(Z方向)的反射光Lreflec被截掉(cut)而無法通過線性檢偏器18b,沿路徑b、c、d且呈現橢圓偏振的反射光Lreflec的Y方向偏振分量可以通過線性檢偏器18b。其中,路徑a、e沒有光可以通過,所以是極小值;路徑c的Y方向偏振分量最大,所以是極大值;路徑b、d則是介於極小值及極大值的數值。 The transmission axis of the linear analyzer 18c of the third embodiment is disposed in the Y direction, so the linear analyzer 18c passes only the polarization component in the Y direction of the reflected light Leflec, so it exhibits linear polarization along the paths a, e (Z The reflected light Lreflec of the direction is cut away from passing through the linear analyzer 18b, and the Y-direction polarization component of the reflected light Lreflec along the paths b, c, d and exhibiting elliptically polarized light can pass through the linear analyzer 18b. Among them, the paths a and e have no light to pass, so they are minimum values; the path c has the largest polarization component in the Y direction, so it is the maximum value; the paths b and d are the values between the minimum value and the maximum value.

第7圖是本發明揭露之第四實施例的異向性量測系統400的示意圖,其中起偏器為線性起偏器12d,檢偏器為線性檢偏器18d。線性起偏器12d的穿透軸初始設置於X方向且藉由馬達(未圖示)帶動而繞光軸(Z軸)旋轉360度,線性檢偏器18d的穿透軸初始設置於Y方向且藉由馬達(未圖示)帶動與線性檢偏器12d的穿透軸同步繞光軸(X軸)旋轉360度。此處光軸表示光行進的方向,其涵義與前述異向性材料的光軸不同,習知技藝者均能知悉兩者涵義之差異。同步繞軸旋轉是同時逆時針或同時順時針的旋轉,並且以等角速度旋轉。第4d圖顯示本發明揭露之第四實施例當線性起偏器12d及線性檢偏器18d旋轉不同角度時,部分輸入光Lin、反射光Lreflec及輸出光Lout的偏振型態及強度變化。當旋轉0度時,部分輸入光Lin、反射光Lreflec及輸出光Lout的偏振型態及強度變化與第三實施例相同。在旋轉90度或180度時,可以觀察到每個位置的偏振型態都分別旋轉90度或180度。其餘的旋轉角度(270度、360度)可以類推得知,不再贅述。我們可以觀察到輸出光Lout的強度亦呈現週期性分佈,只是不同旋轉角度時,偏振方向不同。 Figure 7 is a schematic illustration of an anisotropic measurement system 400 in accordance with a fourth embodiment of the present invention, wherein the polarizer is a linear polarizer 12d and the analyzer is a linear analyzer 18d. The transmission axis of the linear polarizer 12d is initially set in the X direction and is rotated 360 degrees around the optical axis (Z axis) by a motor (not shown), and the transmission axis of the linear analyzer 18d is initially set in the Y direction. And the motor (not shown) rotates 360 degrees around the optical axis (X axis) in synchronization with the transmission axis of the linear analyzer 12d. Here, the optical axis indicates the direction in which the light travels, and its meaning is different from the optical axis of the aforesaid anisotropic material, and those skilled in the art can know the difference between the two. Synchronous pivoting is simultaneous counterclockwise or simultaneous clockwise rotation and rotates at an equal angular velocity. Fig. 4d is a view showing a polarization state and intensity change of a part of the input light Lin, the reflected light Lreflec, and the output light Lout when the linear polarizer 12d and the linear analyzer 18d are rotated at different angles in the fourth embodiment of the present invention. When rotated by 0 degrees, the polarization patterns and intensity changes of the partial input light Lin, the reflected light Lreflec, and the output light Lout are the same as in the third embodiment. When rotated 90 degrees or 180 degrees, it can be observed that the polarization patterns of each position are rotated by 90 degrees or 180 degrees, respectively. The remaining rotation angles (270 degrees, 360 degrees) can be analogized and will not be described again. We can observe that the intensity of the output light Lout also exhibits a periodic distribution, but the polarization directions are different at different rotation angles.

第四實施例的變型可以比較不同待測樣品之異相性相對大小。此變型的元件及運作方式如上述,不再贅述。在影像偵測器20所成影像(即待測樣品反射光強度分佈圖)上選擇某一位置的光強度,可代表部分入射光Lin以P波入射待 測樣品17而輸出光Lou以S波被影像偵測器接收(P入射S接收),或部分入射光Lin以S波入射待測樣品17而輸出光Lou以P波被影像偵測器20接收(S入射P接收)。以線性起偏器12d及線性檢偏器18d的旋轉角度為0度者為例,路徑e即代表P入射S接收的情況。兩者均旋轉360度以後,在該位置擷取不同待測樣品的待測樣品反射光強度分佈圖會得到呈現週期性強度變化之不同待測樣品的待測樣品反射光強度分佈曲線。在此情況下,不需以瓊斯矩陣擬合待測樣品反射光強度分佈曲線來求出異向性的絕對數值,而是在待測樣品反射光強度分佈圖上之一位置擷取待測樣品的待測樣品反射光強度分佈曲線,並根據不同待測樣品的待測樣品反射光強度分佈曲線的振幅大小來判斷其異向性相對大小。 A variation of the fourth embodiment can compare the relative magnitude of the heterogeneity of different samples to be tested. The components and operation modes of this modification are as described above and will not be described again. Selecting the light intensity at a certain position on the image formed by the image detector 20 (ie, the intensity distribution map of the sample to be tested) may represent that part of the incident light Lin is incident on the P wave. The sample 17 is sampled and the output light Lou is received by the image detector by the S wave (P incident S is received), or part of the incident light Lin is incident on the sample 17 to be tested with the S wave, and the output light Lou is received by the image detector 20 with the P wave. (S incident P reception). Taking the rotation angle of the linear polarizer 12d and the linear analyzer 18d as 0 degrees as an example, the path e represents the case where the P incident S is received. After both rotations of 360 degrees, the reflected light intensity distribution map of the sample to be tested of different samples to be tested at this position will obtain the reflected light intensity distribution curve of the sample to be tested which exhibits periodic intensity changes. In this case, it is not necessary to fit the reflected light intensity distribution curve of the sample to be measured by the Jones matrix to obtain the absolute value of the anisotropy, but to take the sample to be tested at a position on the reflected light intensity distribution map of the sample to be tested. The reflected light intensity distribution curve of the sample to be tested, and the relative size of the anisotropy is determined according to the amplitude of the reflected light intensity distribution curve of the sample to be tested.

第4e圖的左圓表示沿路徑e(P入射S接收)的待測樣品反射光強度分佈曲線,其以週期90度呈現週期性強度變化。當不同待測樣品需要比較異向性相對大小時,可由其待測樣品反射光強度分佈曲線的振幅大小來判斷其異向性相對大小,例如振幅較大者異向性較大。在P入射S接收的組態下,折射率橢球的方位角發生於兩較大之極大值之間(45度、315度)的極小值或兩較小之極大值之間(135度、225度)的極小值,即方位角為0度或180度(兩種表示方式等價)。當待測樣品17的方位角為0度(或180度)、光線以P入射S接收時、且旋轉的角度為0度、90度、180度、360度時,待測樣品反射光強度分 佈曲線為極小值;旋轉的角度為45度、135度、225度、315度時,則為極大值,其中45度、315度的極大值稍大於135度、225度的極大值。反射率的極大值與極小值相差約2×10-5The left circle of Fig. 4e shows the reflected light intensity distribution curve of the sample to be tested along the path e (P incident S is received), which exhibits a periodic intensity change at a period of 90 degrees. When different samples to be tested need to compare the relative size of the anisotropy, the relative magnitude of the anisotropy can be judged by the amplitude of the reflected light intensity distribution curve of the sample to be tested. For example, the larger the amplitude, the greater the anisotropy. In the configuration of P incident S reception, the azimuth of the index ellipsoid occurs between the minimum of two large maxima (45 degrees, 315 degrees) or between two smaller maxima (135 degrees, The minimum value of 225 degrees), that is, the azimuth is 0 degrees or 180 degrees (the two representations are equivalent). When the azimuth angle of the sample to be tested 17 is 0 degrees (or 180 degrees), the light is received by the P incident S, and the angle of rotation is 0 degrees, 90 degrees, 180 degrees, 360 degrees, the reflected light intensity distribution of the sample to be tested The curve is a minimum value; when the angle of rotation is 45 degrees, 135 degrees, 225 degrees, and 315 degrees, it is a maximum value, and the maximum values of 45 degrees and 315 degrees are slightly larger than the maximum values of 135 degrees and 225 degrees. The maximum value of the reflectance differs from the minimum value by about 2 × 10 -5 .

第4e圖的右圓表示S入射S接收的待測樣品反射光強度分佈曲線,其以週期180度呈現週期性強度變化。當不同待測樣品需要比較異向性相對大小時,可由其待測樣品反射光強度分佈曲線的振幅大小來判斷其異向性相對大小,例如振幅較大者異向性較大。在S入射S接收的組態下,折射率橢球的方位角發生於兩極大值之間(90度、270度)的極小值或兩極小值之間(0度、360度)的極小值,即方位角為180度或0度(兩種表式方式等價)。當待測樣品17的方位角為180度(或0度)、光線以S入射S接收時、且旋轉的角度為0度、180度、360度時,反射率為極小值;旋轉的角度為90度、270度時,則為極大值,其中極大值均相等。反射率的極大值與極小值相差約2.25×10-3The right circle of Fig. 4e shows the reflected light intensity distribution curve of the sample to be tested received by S incident S, which exhibits a periodic intensity change at a period of 180 degrees. When different samples to be tested need to compare the relative size of the anisotropy, the relative magnitude of the anisotropy can be judged by the amplitude of the reflected light intensity distribution curve of the sample to be tested. For example, the larger the amplitude, the greater the anisotropy. In the configuration of S-incident S-receiving, the azimuth of the index ellipsoid occurs at a minimum between two maxima (90 degrees, 270 degrees) or a minimum between two polar values (0 degrees, 360 degrees). , that is, the azimuth is 180 degrees or 0 degrees (the two forms are equivalent). When the azimuth angle of the sample to be tested 17 is 180 degrees (or 0 degrees), the light is received by the S incident S, and the angle of rotation is 0 degrees, 180 degrees, 360 degrees, the reflectance is a minimum value; the angle of rotation is At 90 degrees and 270 degrees, it is a maximum value, and the maximum values are equal. The maximum value of the reflectance differs from the minimum value by about 2.25 × 10 -3 .

以下將以第二實施例為例搭配瓊斯運算(Jones calculus)說明本發明第五實施例之異向性量測方法。本發明第五實施例之異向性量測方法適用於前述第一至第四實施例揭露之異向性量測系統。參考第8a圖,當未偏振的入射光Lo穿透徑向起偏器12b後,入射光Lo的偏振方向轉變為徑向偏振。假設入射光Lo的電場強度為Eo,穿透徑向起偏器12b後的電場 強度為Ei,則,其中ψ為代表待測樣品的折射率橢球的方位角(azimuthal angle)。在本發明揭露之所有實施範例,ψ=0。ψ的範圍可由0至π(ψ=0~π)。 Hereinafter, the anisotropy measurement method according to the fifth embodiment of the present invention will be described with reference to the second embodiment as a case of Jones calculus. The anisotropy measurement method according to the fifth embodiment of the present invention is applicable to the anisotropy measurement systems disclosed in the foregoing first to fourth embodiments. Referring to Fig. 8a, when the unpolarized incident light Lo penetrates the radial polarizer 12b, the polarization direction of the incident light Lo changes to a radial polarization. Assuming that the electric field intensity of the incident light Lo is Eo, and the electric field intensity after penetrating the radial polarizer 12b is Ei, then Where ψ is the azimuthal angle representing the refractive index ellipsoid of the sample to be tested. In all embodiments of the present disclosure, ψ =0. The range of ψ can range from 0 to π ( ψ =0~ π ).

物鏡16接收部分入射光Lin,將部分入射光Lin聚焦至待測樣品17,並接收反射自待測樣品17之具有橢圓偏振之反射光Lreflec後平行入射至穿透反射面。在第二實施例中,待測樣品17為配向膜,待測樣品17的瓊斯矩陣為,其中矩陣Rs的4個元素(entry)包括三種參數:待測樣品17的異常折射率ne、正常折射率no及厚度d。換言之,待測樣品17的ne、no及d可藉由求出瓊斯矩陣Rs而被求出。在本發明揭露之所有實施範例中,物鏡16的數值孔徑(NA)可為0.9,對應收光角度(入射角θi的兩倍)約64度。在實際量測時,待測樣品17的ne=1.6391,no=1.6150,d=0.238μm,故異向性=d(ne-no)=5.7358nm。 The objective lens 16 receives a portion of the incident light Lin, focuses a portion of the incident light Lin to the sample 17 to be tested, and receives the reflected light Lreflec having an elliptically polarized reflection from the sample 17 to be tested, and then is incident parallel to the penetrating reflecting surface. In the second embodiment, the sample to be tested 17 is an alignment film, and the Jones matrix of the sample to be tested 17 is The four entries of the matrix R s include three parameters: the abnormal refractive index n e of the sample to be tested 17 , the normal refractive index n o , and the thickness d. In other words, n e , n o and d of the sample to be tested 17 can be obtained by finding the Jones matrix R s . In all of the embodiments disclosed herein, the numerical aperture (NA) of the objective lens 16 may be 0.9, corresponding to a dimming angle (twice the angle of incidence θi) of about 64 degrees. In the actual measurement, the sample 17 to be tested has ne = 1.6391, no = 1.6150, and d = 0.238 μm, so the anisotropy = d (ne-no) = 5.7358 nm.

線性檢偏器18b接收反射自穿透反射面之反射光Lreflec並產生輸出光Lout。在第二實施例中,線性檢偏器18b的穿透軸為Y方向,故線性檢偏器18b的瓊斯矩陣為。橢圓偏振的反射光Lreflec,其偏振方向與線性檢偏器18b的穿透軸方向相同的分量將被擷取出來,而偏振方向 與穿透方向不同的分量無法通過線性檢偏器18b,如第4b圖所述。 The linear analyzer 18b receives the reflected light Lreflec reflected from the penetrating reflecting surface and generates output light Lout. In the second embodiment, the transmission axis of the linear analyzer 18b is in the Y direction, so the Jones matrix of the linear analyzer 18b is . The elliptically polarized reflected light Lreflec whose polarization direction is the same as the direction of the transmission axis of the linear analyzer 18b will be extracted, and the component whose polarization direction is different from the penetration direction cannot pass through the linear analyzer 18b. As described in Figure 4b.

在步驟S4,影像偵測器20接收輸出光Lout並產生形狀近似為圓之待測樣品反射光強度分佈圖(第9b圖上圖)。在步驟S5,運算處理器22根據待測樣品反射光強度分佈圖求出之待測樣品反射光強度分佈曲線(第9b圖下圖)。在步驟S6,運算處理器22藉由修正瓊斯運算模型(modified Jones calculus model)擬合(fitting)待測樣品反射光強度分佈曲線以求得待測樣品之異向性。 In step S4, the image detector 20 receives the output light Lout and generates a reflected light intensity distribution map of the sample to be tested whose shape is approximately circular (Fig. 9b). In step S5, the arithmetic processor 22 obtains a reflected light intensity distribution curve of the sample to be tested according to the reflected light intensity distribution map of the sample to be tested (Fig. 9b, lower drawing). In step S6, the arithmetic processor 22 fits the reflected light intensity distribution curve of the sample to be tested by a modified Jones calculus model to determine the anisotropy of the sample to be tested.

以下將以第二實施例為例搭配瓊斯運算說明本發明第六實施例之包含校正方法之異向性量測方法。本發明第六實施例之包含校正方法之異向性量測方法適用於前述第一至第四實施例揭露之異向性量測系統。參考第8a圖,在第六實施例中,當首次使用異向性量測裝置200時,由於無偏振分光器14與物鏡16改變入射光L0與反射光Lreflec的相位及振幅,影響量測準確性造成誤差,故需要在瓊斯運算中引入校正矩陣Tc以修正NPBS 16及物鏡16造成之誤差。首先進行校正流程以求得校正矩陣Tc。在步驟S0,判斷是否需要取得校正矩陣Tc,當首次使用異向性量測裝置時則判斷為是,反之則判斷為否,流程進入步驟S1。 Hereinafter, the anisotropic measurement method including the correction method according to the sixth embodiment of the present invention will be described with reference to the second embodiment as an example. The anisotropy measurement method including the correction method of the sixth embodiment of the present invention is applicable to the anisotropy measurement systems disclosed in the foregoing first to fourth embodiments. Referring to FIG. 8a, in the sixth embodiment, when the anisotropic measuring device 200 is used for the first time, since the non-polarizing beam splitter 14 and the objective lens 16 change the phase and amplitude of the incident light L0 and the reflected light Lreflec, the measurement accuracy is accurate. Sexuality causes errors, so it is necessary to introduce a correction matrix Tc in the Jones operation to correct the error caused by the NPBS 16 and the objective lens 16. The calibration process is first performed to obtain the correction matrix Tc. In step S0, it is judged whether or not the correction matrix Tc needs to be acquired. When the anisotropy measurement device is used for the first time, the determination is YES, otherwise the determination is NO, and the flow proceeds to step S1.

在步驟S1,取得標準樣品之形狀近似為圓的標準樣品反射光強度分佈圖,如第9a圖所示。在第二實施例 中,標準樣品為鍍鋁反射鏡,流程進入步驟S2。 In step S1, a standard sample reflected light intensity distribution map whose shape of the standard sample is approximately circular is obtained, as shown in Fig. 9a. In the second embodiment The standard sample is an aluminized mirror, and the flow proceeds to step S2.

在步驟S2,根據標準樣品反射光強度分佈圖求出標準樣品反射光強度分佈曲線(未圖示),流程進入步驟S3。 In step S2, a standard sample reflected light intensity distribution curve (not shown) is obtained from the standard sample reflected light intensity distribution map, and the flow proceeds to step S3.

在步驟S3,以瓊斯運算模型擬合標準樣品反射光強度分佈曲線,以求出校正矩陣Tc,其中,瓊斯運算模型如下: In step S3, the standard sample reflected light intensity distribution curve is fitted with a Jones operation model to obtain a correction matrix Tc, wherein the Jones operation model is as follows:

其中,E out 表示影像偵測器20接收到之輸出光Lout的強度,校正矩陣ε c δ c 表示無偏振分光器14與物鏡16的吸收係數(absorption coefficient)及引入的相位差(phase difference);;鍍鋁反射鏡的瓊斯矩陣;入射光及反射光之座標轉換矩陣,檢偏器18的瓊斯矩陣。在瓊斯運算模型中乘上兩次Tc表示光兩次穿透反射無偏振分光器14及物鏡16。 Wherein, E out represents the intensity of the output light Lout received by the image detector 20, and the correction matrix , ε c and δ c represent the absorption coefficient of the non-polarizing beam splitter 14 and the objective lens 16 and the phase difference introduced; ; Jones matrix of aluminized mirrors ; coordinate conversion matrix of incident light and reflected light ; , Jones matrix of analyzer 18 . Multiplying Tc twice in the Jones operation model indicates that the light penetrates the reflection non-polarization beam splitter 14 and the objective lens 16 twice.

在步驟S2中,根據標準樣品反射光強度分佈圖求出標準樣品反射光強度分佈曲線更包括步驟S1_1~S1_5,如第8b圖所示。 In step S2, the standard sample reflected light intensity distribution curve is obtained according to the standard sample reflected light intensity distribution map, and further includes steps S1_1 to S1_5, as shown in FIG. 8b.

在步驟S1_1,在標準樣品反射光強度分佈圖上 選取中心點O(第9a圖),流程進入步驟S1_2。 In step S1_1, on the standard sample reflected light intensity distribution map The center point O is selected (Fig. 9a), and the flow proceeds to step S1_2.

在步驟S1_2,以中心點O為圓心及第一長度為半徑畫圓而構成內圓C1,以中心點O為圓心及第二長度為半徑畫圓而構成外圓C2。內圓C1及外圓C2之間的區域為感興趣區(region of interest,ROI)。流程進入步驟S1_3。 In step S1_2, the inner circle C1 is formed by drawing a circle with the center point O as a center and the first length as a radius, and the outer circle C2 is formed by drawing a circle with the center point O as a center and the second length as a radius. The area between the inner circle C1 and the outer circle C2 is a region of interest (ROI). The flow proceeds to step S1_3.

在步驟S1_3,作中心點O及外圓C2上點P1~Pn的複數連線OP1~OPn,流程進入步驟S1_4。 In step S1_3, the complex lines OP1 to OPn of the points P1 to Pn on the center point O and the outer circle C2 are made, and the flow proceeds to step S1_4.

在步驟S1_4,當連線OP1~OPn上表示的光強度由內而外低於臨界值時(例如最大強度的50%),定義該臨界值所處位置為複數邊界點(第9a圖,十字符號標記者)。流程進入步驟S1_5。 In step S1_4, when the light intensity indicated on the line OP1~OPn is lower than the critical value from the inside to the outside (for example, 50% of the maximum intensity), the position where the critical value is defined is a complex boundary point (Fig. 9a, cross) Symbol marker). The flow proceeds to step S1_5.

在步驟S1_5,擬合該等邊界點得到標準樣品擬合圓Cstd_fit。在標準樣品擬合圓Cstd_fit沿著圓上360度取強度的數值即得到標準樣品反射光強度分佈曲線。 In step S1_5, the boundary points are fitted to obtain a standard sample fitting circle C std_fit . The standard sample reflected light intensity distribution curve is obtained by taking the value of the intensity of the standard sample fitting circle C std_fit along 360 degrees on the circle.

當得知校正矩陣Tc之後,即可進行待測樣品的量測程序,流程進入步驟S4。在步驟S4,取得標準樣品之形狀近似為圓的標準樣品反射光強度分佈圖,如第9b圖所示。在第二實施例中,待測樣品17為配向膜,流程進入步驟S5。 After the correction matrix Tc is known, the measurement procedure of the sample to be tested can be performed, and the flow proceeds to step S4. In step S4, a standard sample reflected light intensity distribution map whose shape of the standard sample is approximately circular is obtained, as shown in Fig. 9b. In the second embodiment, the sample to be tested 17 is an alignment film, and the flow proceeds to step S5.

在步驟S5,根據待測樣品反射光強度分佈圖求出待測樣品反射光強度分佈曲線(第9b圖下圖),流程進入步驟S6。 In step S5, the reflected light intensity distribution curve of the sample to be tested is obtained according to the reflected light intensity distribution map of the sample to be tested (Fig. 9b is lower), and the flow proceeds to step S6.

在步驟S6,以修正瓊斯運算模型(modified Jones calculus model)擬合標準樣品反射光強度分佈曲線,以求出待測樣品之異向性,其中,修正瓊斯運算模型如下: In step S6, the reflected light intensity distribution curve of the standard sample is fitted with a modified Jones calculus model to determine the anisotropy of the sample to be tested, wherein the modified Jones operation model is as follows:

其中表示影像偵測器20接收到之輸出光Lout的強度(已經校正),(式2)中的校正矩陣Tc使用經由步驟S1~S3所求得的校正矩陣Tc,Rs為配向膜的瓊斯矩陣。R φ R M T a 與(式1)所示者相同。 among them The intensity (already corrected) of the output light Lout received by the image detector 20 is indicated, and the correction matrix Tc in (Formula 2) uses the correction matrix Tc, Rs obtained through the steps S1 to S3 as the Jones matrix of the alignment film. R φ , R M , And T a is the same as that shown in (Formula 1).

在步驟S5中,根據待測樣品反射光強度分佈圖求出待測樣品反射光強度分佈曲線更包括步驟S2_1~S2_5,如第8b圖所示。 In step S5, determining the reflected light intensity distribution curve of the sample to be tested according to the reflected light intensity distribution map of the sample to be tested further includes steps S2_1 to S2_5, as shown in FIG. 8b.

步驟S2_1~S2_5類似於步驟S1_1~S1_5,為了簡化說明,僅選擇步驟S2_5加以說明。在步驟S2_5,擬合該等邊界點得到待測樣品擬合圓Csample_fit。在待測樣品擬合圓Csample_fit沿著圓上360度取強度的數值即為待測樣品反射光強度分佈曲線(第9圖下圖)。 Steps S2_1 to S2_5 are similar to steps S1_1 to S1_5, and in order to simplify the description, only step S2_5 is selected for explanation. In step S2_5, the boundary points are fitted to obtain a sample fitting circle C sample_fit to be tested. In the sample to be tested, the fitting circle C sample_fit takes the intensity of 360 degrees along the circle to obtain the intensity distribution curve of the sample to be tested (Fig. 9 below).

本發明已由說明書搭配實施範例以及所附圖式說明如上,本發明揭露之實施例僅用於說明本發明之異向性量測系統、異向性量測方法及其校正方法的實施範例,但並非用於限定本發明發明之範疇及精神。上述假設不失其一般性且不會產生不自洽(self-inconsistency)。本領域具有通常知識者應能知悉,在不脫離本發明及申請專利範圍發明之範疇及精神的前提下,本發明申請專利範圍當 能作些許變動、增刪及替換。 The present invention has been described above with reference to the embodiments and the accompanying drawings. The embodiments disclosed herein are merely illustrative of the embodiments of the anisotropic measuring system, the anisotropic measuring method and the correcting method thereof. However, it is not intended to limit the scope and spirit of the invention. The above assumptions do not lose their generality and do not create self-inconsistency. It is to be understood by those skilled in the art that the scope of the present invention is not limited by the scope and spirit of the invention and the scope of the invention. Can make some changes, additions, deletions and replacements.

100‧‧‧異向性量測系統 100‧‧‧ anisotropy measurement system

10‧‧‧光源 10‧‧‧Light source

11‧‧‧準直透鏡 11‧‧‧ Collimating lens

12a‧‧‧徑向起偏器 12a‧‧‧ Radial polarizer

14‧‧‧無偏振分光器 14‧‧‧No polarization beam splitter

16‧‧‧物鏡 16‧‧‧ Objective lens

17‧‧‧待測樣品 17‧‧‧Test samples

18a‧‧‧切向檢偏器 18a‧‧‧ Tangential analyzer

20‧‧‧影像偵測器 20‧‧‧Image Detector

21‧‧‧基板 21‧‧‧Substrate

22‧‧‧運算處理器 22‧‧‧Operation processor

Lo‧‧‧入射光 Lo‧‧‧ incident light

Lin‧‧‧部分入射光 Lin‧‧‧ Partial incident light

Lreflec‧‧‧反射光 Lreflec‧‧·reflected light

Lout‧‧‧輸出光 Lout‧‧‧ output light

Claims (20)

一種異向性量測系統,包括:一徑向起偏器,將一光源產生之一入射光的偏振方向轉變為徑向;一無偏振分光器,具有一穿透反射面,該入射光部分穿透該穿透反射面而形成一部分入射光;一物鏡,接收該部分入射光,將該部分入射光聚焦至一待測樣品,並接收反射自該待測樣品之具有橢圓偏振之一反射光後平行入射至該穿透反射面;一檢偏器,接收反射自該穿透反射面之該反射光並產生一輸出光,該輸出光的偏振方向被轉變為該檢偏器之一穿透軸的方向;一影像偵測器,接收該輸出光並產生形狀近似為圓之一待測樣品反射光強度分佈圖;以及一運算處理器,根據該待測樣品反射光強度分佈圖求出之一待測樣品反射光強度分佈曲線,並藉由一修正瓊斯運算模型擬合該待測樣品反射光強度分佈曲線以求得該待測樣品之異向性。 An anisotropic measuring system comprising: a radial polarizer that converts a polarization direction of one incident light into a radial direction; and a non-polarizing beam splitter having a penetrating reflecting surface, the incident light portion Passing through the penetrating reflecting surface to form a part of incident light; an objective lens receiving the part of the incident light, focusing the part of the incident light to a sample to be tested, and receiving the reflected light having one of the elliptical polarizations reflected from the sample to be tested Parallel incidence to the penetrating reflecting surface; an analyzer that receives the reflected light reflected from the penetrating reflecting surface and generates an output light, and the polarization direction of the output light is converted into one of the analyzers The direction of the axis; an image detector receiving the output light and generating a map of the intensity of the reflected light of the sample to be measured in a shape approximated to a circle; and an arithmetic processor, which is obtained according to the reflected light intensity distribution map of the sample to be tested A reflected light intensity distribution curve of the sample to be tested is obtained by fitting a reflected light intensity distribution curve of the sample to be tested by a modified Jones operation model to obtain an anisotropy of the sample to be tested. 如申請專利範圍第1項所述之異向性量測系統,其中該檢偏器為一切向檢偏器,該穿透軸的方向為切向。 The anisotropic measuring system according to claim 1, wherein the analyzer is an all-direction analyzer, and the direction of the transmission axis is tangential. 如申請專利範圍第1項所述之異向性量測系統,其中該檢偏器為一線性檢偏器,該穿透軸的方向為Y方向。 The anisotropic measuring system according to claim 1, wherein the analyzer is a linear analyzer, and the direction of the transmission axis is the Y direction. 一種異向性量測系統,包括: 一線性起偏器,將一光源產生之一入射光的偏振方向轉變為該線性起偏器的一第一穿透軸的方向;一無偏振分光器,具有一穿透反射面,該入射光部分穿透該穿透反射面而形成一部分入射光;一物鏡,接收該部分入射光,將該部分入射光聚焦至一待測樣品,並接收反射自該待測樣品之具有橢圓偏振之一反射光後平行入射至該穿透反射面;一線性檢偏器,接收反射自該穿透反射面之該反射光並產生一輸出光,該輸出光的偏振方向被轉變為該線性檢偏器的一第二穿透軸方向;一影像偵測器,接收該輸出光並產生形狀近似為圓之一待測樣品反射光強度分佈圖;以及一運算處理器,根據該待測樣品反射光強度分佈圖求出之一待測樣品反射光強度分佈曲線,並藉由一修正瓊斯運算模型擬合該待測樣品反射光強度分佈曲線以求得該待測樣品之異向性。 An anisotropic measurement system comprising: a linear polarizer that converts a polarization direction of one of the incident light into a direction of a first transmission axis of the linear polarizer; a non-polarization beam splitter having a penetrating reflection surface, the incident light Partially penetrating the penetrating reflecting surface to form a portion of incident light; an objective lens receiving the portion of the incident light, focusing the portion of the incident light to a sample to be tested, and receiving a reflection of one of the elliptical polarizations reflected from the sample to be tested The light is incident parallel to the penetrating reflecting surface; a linear analyzer receives the reflected light reflected from the penetrating reflecting surface and generates an output light, and the polarization direction of the output light is converted into the linear analyzer a second through-axis direction; an image detector receiving the output light and generating a map of the reflected light intensity of the sample to be measured in a shape approximately circular; and an arithmetic processor for distributing the intensity of the reflected light according to the sample to be tested The figure obtains a reflected light intensity distribution curve of one sample to be tested, and fits the reflected light intensity distribution curve of the sample to be tested by a modified Jones operation model to obtain the anisotropy of the sample to be tested. 如申請專利範圍第4項所述之異向性量測系統,其中該第一穿透軸的方向為X方向,該第二穿透軸的方向為Y方向。 The anisotropic measuring system of claim 4, wherein the direction of the first transmission axis is the X direction, and the direction of the second transmission axis is the Y direction. 如申請專利範圍第4項所述之異向性量測系統,其中該線性起偏器繞一第一光軸旋轉360度,該線性檢偏器繞一第二光軸旋轉360度並與該線性檢偏器同步旋轉360度,該第一光軸Z方向及該第二光軸為X方向,且該第 一穿透軸的起始方向為X方向,該第二穿透軸的起始方向為Y方向。 The anisotropic measuring system of claim 4, wherein the linear polarizer rotates 360 degrees around a first optical axis, and the linear analyzer rotates 360 degrees around a second optical axis and The linear analyzer rotates 360 degrees synchronously, the first optical axis Z direction and the second optical axis are X directions, and the first The starting direction of a penetrating axis is the X direction, and the starting direction of the second penetrating axis is the Y direction. 如申請專利範圍第1項及第4項所述之異向性量測系統,其中,該修正瓊斯運算模型包括一校正矩陣以修正該無偏振分光鏡及該物鏡造成之誤差。 The anisotropic measurement system of claim 1 or 4, wherein the modified Jones operation model includes a correction matrix to correct the error caused by the non-polarization beam splitter and the objective lens. 一種異向性量測方法,包括:藉由一起偏器將一入射光的偏振方向轉變為該起偏器的一第一穿透軸的方向;藉由一無偏振分光器使得該入射光部分穿透該無偏振分光器而形成一部分入射光;藉由一物鏡將該部分入射光聚焦至一待測樣品並接收反射自該待測樣品之具有橢圓偏振之一反射光後平行輸出至該無偏振分光器;藉由一檢偏器接收反射自該無偏振分光器之該反射光並產生一輸出光,其中,該輸出光的偏振方向被轉變為該檢偏器的一第二穿透軸的方向;根據該輸出光之形狀近似為圓的一待測樣品反射光強度分佈圖求出一待測樣品反射光強度分佈曲線;以及藉由一修正瓊斯運算模型擬合該待測樣品反射光強度分佈曲線以求出該待測樣品之異向性。 An anisotropic measuring method comprising: converting a polarization direction of an incident light into a direction of a first transmission axis of the polarizer by a polarizer; and the incident light portion by a non-polarization beam splitter Passing through the non-polarization beam splitter to form a portion of the incident light; focusing the portion of the incident light onto a sample to be tested by an objective lens and receiving the reflected light having one of the elliptically polarized reflections from the sample to be tested, and outputting the parallel light to the a polarization beam splitter; receiving, by an analyzer, the reflected light reflected from the non-polarization beam splitter and generating an output light, wherein a polarization direction of the output light is converted into a second transmission axis of the analyzer The direction of the reflected light intensity of the sample to be tested is obtained according to the reflected light intensity distribution of the sample to be tested, and the reflected light of the sample to be tested is fitted by a modified Jones model The intensity distribution curve is used to determine the anisotropy of the sample to be tested. 如申請專利範圍第8項所述之異向性量測方法,其中,該修正瓊斯運算模型包括一校正矩陣以修正該無偏振分光器及該物鏡造成之誤差。 The anisotropic measurement method according to claim 8, wherein the modified Jones operation model includes a correction matrix to correct the error caused by the non-polarization beam splitter and the objective lens. 如申請專利範圍第8項之異向性量測方法,其中根據該待測樣品反射光強度分佈圖求出該待測樣品反射光強度分佈曲線的步驟更包括:在該待測樣品反射光強度分佈圖上選取一中心點;在該待測樣品反射光強度分佈圖上,以該中心點為圓心及一第一長度為半徑畫圓而構成一內圓,以該中心點為圓心及一第二長度為半徑畫圓而構成一外圓;作該中心點與該外圓上之點的複數連線;當該等連線表示之光強度由內而外低於一臨界值時,定義該臨界值所處位置為複數邊界點;以及擬合該等邊界點得到一待測樣品擬合圓及該待測樣品反射光強度分佈曲線。 The method for determining an anisotropic measurement method according to Item 8 of the patent application, wherein the step of determining a reflected light intensity distribution curve of the sample to be tested according to the reflected light intensity distribution map of the sample to be tested further comprises: reflecting light intensity at the sample to be tested Selecting a center point on the distribution map; forming an inner circle on the reflected light intensity distribution map of the sample to be measured by using the center point as a center and a first length as a radius, and the center point is a center and a first The second length is a circle drawn to form an outer circle; the complex line is connected to the point on the outer circle; and when the light intensity indicated by the line is lower than a critical value from the inside to the outside, The position where the critical value is located is a complex boundary point; and fitting the boundary points to obtain a fitted circle of the sample to be tested and a reflected light intensity distribution curve of the sample to be tested. 如申請專利範圍第8項所述之異向性量測方法,其中該起偏器為一徑向起偏器,該檢偏器為一切向檢偏器,入,且該第一穿透軸的方向為徑向,該第二穿透軸的方向為切向。 The anisotropic measurement method according to claim 8, wherein the polarizer is a radial polarizer, the analyzer is an all-direction analyzer, and the first penetration axis The direction is radial and the direction of the second transmission axis is tangential. 如申請專利範圍第8項所述之異向性量測方法,其中該起偏器為一徑向起偏器,該檢偏器為一線性檢偏器,且 該第一穿透軸的方向為徑向,該第二穿透軸的方向為Y方向。 The anisotropic measurement method according to claim 8, wherein the polarizer is a radial polarizer, and the analyzer is a linear analyzer, and The direction of the first transmission axis is radial, and the direction of the second transmission axis is Y direction. 如申請專利範圍第8項所述之異向性量測方法,其中該起偏器為一線性起偏器,該檢偏器為一線性檢偏器,該第一穿透軸的方向為X方向,該第二穿透軸的方向為Y方向。 The anisotropic measurement method according to claim 8, wherein the polarizer is a linear polarizer, the analyzer is a linear analyzer, and the direction of the first transmission axis is X. Direction, the direction of the second penetration axis is the Y direction. 如申請專利範圍第8項所述之異向性量測方法,其中該起偏器為一線性起偏器,該檢偏器為一線性檢偏器,該線性起偏器繞一第一光軸旋轉360度,該線性檢偏器繞一第二光軸旋轉360度並與該線性檢偏器同步旋轉360度,其中該第一光軸為Z方向及該第二光軸為X方向,且該第一穿透軸的起始方向為X方向,該第二穿透軸的起始方向為Y方向。 The anisotropic measurement method according to claim 8, wherein the polarizer is a linear polarizer, and the analyzer is a linear analyzer, and the linear polarizer surrounds a first light. The shaft rotates 360 degrees, the linear analyzer rotates 360 degrees around a second optical axis and rotates 360 degrees synchronously with the linear analyzer, wherein the first optical axis is the Z direction and the second optical axis is the X direction. And the starting direction of the first transmission axis is the X direction, and the starting direction of the second transmission axis is the Y direction. 一種異向性量測方法,包括:藉由一線性起偏器將一入射光的偏振方向轉變為該起偏器的一第一穿透軸的方向,該線性起偏器繞一第一光軸旋轉360度;藉由一無偏振分光器使得該入射光部分穿透該無偏振分光器而形成一部分入射光;藉由一物鏡將該部分入射光聚焦至一待測樣品並接收反射自該待測樣品之具有橢圓偏振之一反射光後平行輸出至該無偏振分光器; 藉由一線性檢偏器接收反射自該無偏振分光器之該反射光並產生一輸出光,其中,該輸出光的偏振方向被轉變為該檢偏器的一第二穿透軸的方向,該線性檢偏器繞一第二光軸旋轉360度並與該線性檢偏器同步旋轉360度;根據該輸出光之形狀近似為圓的一待測樣品反射光強度分佈圖求出一待測樣品反射光強度分佈曲線;以及根據不同的該待測樣品的該待測樣品反射光強度分佈曲線的振幅大小來判斷異向性相對大小。 An anisotropic measuring method comprising: converting a polarization direction of an incident light into a direction of a first transmission axis of the polarizer by a linear polarizer, the linear polarizer winding around a first light The shaft rotates 360 degrees; the incident light partially penetrates the non-polarization beam splitter to form a portion of the incident light by a non-polarization beam splitter; the incident light is focused by an objective lens to a sample to be tested and received from the object The sample to be tested has one of the elliptically polarized light and is output parallel to the non-polarizing beam splitter; Receiving, by a linear analyzer, the reflected light reflected from the non-polarization beam splitter and generating an output light, wherein a polarization direction of the output light is converted into a direction of a second transmission axis of the analyzer, The linear analyzer rotates 360 degrees around a second optical axis and rotates 360 degrees synchronously with the linear analyzer; and determines a reflected light intensity distribution map of the sample to be tested according to the shape of the output light a reflected light intensity distribution curve of the sample; and determining a relative size of the anisotropy according to different amplitudes of the reflected light intensity distribution curves of the sample to be tested. 如申請專利範圍第15項所述之異向性量測方法,其中該第一光軸為Z方向及該第二光軸為X方向,且該第一穿透軸的起始方向為X方向,該第二穿透軸的起始方向為Y方向。 The anisotropic measurement method according to claim 15, wherein the first optical axis is a Z direction and the second optical axis is an X direction, and a starting direction of the first transmission axis is an X direction. The starting direction of the second transmission axis is the Y direction. 一種如申請專利範圍第8項所述之異向性量測方法之校正方法,包括:取得一標準樣品之形狀近似為圓的一標準樣品反射光強度分佈圖;根據該標準樣品反射光強度分佈圖求出一標準樣品反射光強度分佈曲線;以及藉由一瓊斯運算模型擬合該標準樣品反射光強度分佈曲線,以求出一校正矩陣。 A method for correcting an anisotropic measurement method according to claim 8 of the patent application, comprising: obtaining a standard sample reflected light intensity distribution pattern whose shape is approximately a circle; and determining a reflected light intensity distribution according to the standard sample The figure obtains a reflected light intensity distribution curve of a standard sample; and fits the reflected light intensity distribution curve of the standard sample by a Jones operation model to obtain a correction matrix. 如申請專利範圍第17項所述之校正方法,其中根據該標準樣品反射光強度分佈圖求出該標準樣品反射光強度分佈曲線的步驟更包括:在該標準樣品反射光強度分佈圖上選取一中心點;在該標準樣品反射光強度分佈圖上,以該中心點為圓心及一第一長度為半徑畫圓而構成一內圓,以該中心點為圓心及一第二長度為半徑畫圓而構成一外圓;作該中心點與該外圓上之點的複數連線;當該等連線表示之光強度由內而外低於一臨界值時,定義該臨界值所處位置為複數邊界點;以及擬合該等邊界點得到一標準樣品擬合圓及該標準樣品反射光強度分佈曲線。 The method of claim 17, wherein the step of determining the reflected light intensity distribution curve of the standard sample according to the reflected light intensity distribution map of the standard sample further comprises: selecting one of the reflected light intensity distribution maps of the standard sample; a center point; on the reflected light intensity distribution map of the standard sample, a circle is formed by centering the center point and a radius of the first length, and forming an inner circle with the center point as a center and a second length as a radius And forming an outer circle; making a complex line connecting the center point and the point on the outer circle; when the light intensity indicated by the line is lower than a critical value from the inside to the outside, the position where the threshold value is defined is Complex boundary points; and fitting the boundary points to obtain a standard sample fit circle and the standard sample reflected light intensity distribution curve. 一種異向性量測系統,包括:一線性起偏器,將一光源產生之一入射光的偏振方向轉變為該線性起偏器的一第一穿透軸的方向,其中該線性起偏器繞一第一光軸旋轉360度;一無偏振分光器,具有一穿透反射面,該入射光部分穿透該穿透反射面而形成一部分入射光;一物鏡,接收該部分入射光,將該部分入射光聚焦至一待測樣品,並接收反射自該待測樣品之具有橢圓偏振之一反射光後平行入射至該穿透反射面; 一線性檢偏器,接收反射自該穿透反射面之該反射光並產生一輸出光,該輸出光的偏振方向被轉變為該線性檢偏器的一第二穿透軸方向,其中該線性檢偏器繞一第二光軸旋轉360度並與該線性檢偏器同步旋轉360度;一影像偵測器,接收該輸出光並產生形狀近似為圓之一待測樣品反射光強度分佈圖;以及一運算處理器,在該待測樣品反射光強度分佈圖上之一位置擷取該待測樣品的一待測樣品反射光強度分佈曲線,並根據不同的該待測樣品的該待測樣品反射光強度分佈曲線的振幅大小來判斷異向性相對大小。 An anisotropic measuring system comprising: a linear polarizer that converts a polarization direction of an incident light into a direction of a first transmission axis of the linear polarizer, wherein the linear polarizer Rotating 360 degrees around a first optical axis; a non-polarizing beam splitter having a penetrating reflecting surface that partially penetrates the penetrating reflecting surface to form a portion of incident light; an objective lens that receives the portion of the incident light The portion of the incident light is focused to a sample to be tested, and received from the sample having the elliptically polarized light reflected from the sample to be tested and then incident parallel to the penetrating reflecting surface; a linear analyzer that receives the reflected light reflected from the penetrating reflecting surface and generates an output light whose polarization direction is converted into a second transmission axis direction of the linear analyzer, wherein the linearity The analyzer rotates 360 degrees around a second optical axis and rotates 360 degrees synchronously with the linear analyzer; an image detector receives the output light and generates a reflected light intensity distribution of the sample to be measured in a shape similar to a circle And an arithmetic processor that extracts a reflected light intensity distribution curve of the sample to be tested from a position on the reflected light intensity distribution map of the sample to be tested, and according to the different test sample to be tested The magnitude of the amplitude of the reflected light intensity distribution curve of the sample is used to determine the relative size of the anisotropy. 如申請專利範圍第19項所述之異向性量測系統,其中該第一光軸為Z方向及該第二光軸為X方向,且該第一穿透軸的起始方向為X方向,該第二穿透軸的起始方向為Y方向。 The anisotropic measuring system according to claim 19, wherein the first optical axis is a Z direction and the second optical axis is an X direction, and a starting direction of the first transmission axis is an X direction. The starting direction of the second transmission axis is the Y direction.
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JP5806837B2 (en) * 2011-04-11 2015-11-10 株式会社モリテックス Optical anisotropy parameter measuring device, measuring method and measuring program
CN103558188B (en) * 2013-07-11 2016-03-02 福建华映显示科技有限公司 Arrangement for detecting and method for detecting

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