TW201614008A - Siloxane resin composition, transparent cured product using said composition, transparent pixel, microlens, and solid-state imaging element - Google Patents
Siloxane resin composition, transparent cured product using said composition, transparent pixel, microlens, and solid-state imaging elementInfo
- Publication number
- TW201614008A TW201614008A TW104131687A TW104131687A TW201614008A TW 201614008 A TW201614008 A TW 201614008A TW 104131687 A TW104131687 A TW 104131687A TW 104131687 A TW104131687 A TW 104131687A TW 201614008 A TW201614008 A TW 201614008A
- Authority
- TW
- Taiwan
- Prior art keywords
- transparent
- composition
- siloxane resin
- microlens
- solid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/07—Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Provided is a siloxane resin composition containing a siloxane resin, mesityl oxide, a solvent, and metal-containing particles. Also provided are a transparent cured product, a transparent pixel, a microlens, and a solid-state imaging element that use the siloxane resin composition.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014205273A JP6013422B2 (en) | 2014-10-03 | 2014-10-03 | Siloxane resin composition, transparent cured product, transparent pixel, microlens, and solid-state imaging device using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201614008A true TW201614008A (en) | 2016-04-16 |
Family
ID=55630345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104131687A TW201614008A (en) | 2014-10-03 | 2015-09-25 | Siloxane resin composition, transparent cured product using said composition, transparent pixel, microlens, and solid-state imaging element |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6013422B2 (en) |
TW (1) | TW201614008A (en) |
WO (1) | WO2016052307A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6001041B2 (en) | 2014-10-03 | 2016-10-05 | 富士フイルム株式会社 | Siloxane resin composition, transparent cured product, transparent pixel, microlens, and solid-state imaging device using the same |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH062703B2 (en) * | 1986-02-15 | 1994-01-12 | 三菱化成株式会社 | Purification method of diacetone alcohol |
DE3631125A1 (en) * | 1986-09-12 | 1988-03-24 | Wacker Chemie Gmbh | METHOD FOR PRODUCING ORGANOPOLYSILOXANELASTOMERS AND NEW ORGANOSILICIUM COMPOUNDS |
JPH0761968B2 (en) * | 1988-07-01 | 1995-07-05 | 三菱化学株式会社 | Diacetone alcohol purification method |
JP3179334B2 (en) * | 1996-04-11 | 2001-06-25 | 大日本塗料株式会社 | Stabilized composition containing hydrolyzable silicon compound |
JPH10306258A (en) * | 1997-03-04 | 1998-11-17 | Nissan Chem Ind Ltd | Coating composition and optical member |
JP4288432B2 (en) * | 1998-08-20 | 2009-07-01 | 日産化学工業株式会社 | Coating composition and optical member |
JP4653961B2 (en) * | 2004-03-26 | 2011-03-16 | 富士フイルム株式会社 | Conductive titanium dioxide fine particles containing cobalt, high refractive index film, composition for forming high refractive index film, and production method thereof |
JP2005272270A (en) * | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | Conductive titanium dioxide fine particle, high refractive index coating, composition for forming high refractive index coating, and method for manufacturing these |
JP4860129B2 (en) * | 2004-09-01 | 2012-01-25 | 日揮触媒化成株式会社 | Coating liquid for forming transparent film and substrate with transparent film |
JP4973093B2 (en) * | 2005-10-03 | 2012-07-11 | 東レ株式会社 | Siloxane resin composition, optical article, and method for producing siloxane resin composition |
TWI428282B (en) * | 2007-10-03 | 2014-03-01 | Nissan Chemical Ind Ltd | Metal oxide complex sol, coating composition and optical member |
WO2009044878A1 (en) * | 2007-10-03 | 2009-04-09 | Nissan Chemical Industries, Ltd. | Modified metal-oxide composite sol, coating composition, and optical member |
JP5255270B2 (en) * | 2007-12-27 | 2013-08-07 | 日揮触媒化成株式会社 | Inorganic oxide fine particles having a core-shell structure, dispersed sol containing the fine particles, and coating solution for optical substrate |
JP2012031353A (en) * | 2010-08-03 | 2012-02-16 | Nissan Chem Ind Ltd | Coating composition and optical member |
JP5557662B2 (en) * | 2010-09-10 | 2014-07-23 | 日揮触媒化成株式会社 | Dispersion of core-shell type inorganic oxide fine particles, process for producing the same, and coating composition containing the dispersion |
JP6049368B2 (en) * | 2011-09-15 | 2016-12-21 | 日揮触媒化成株式会社 | Al-modified inorganic oxide fine particles, production method thereof, dispersion, and coating composition |
US9534122B2 (en) * | 2011-12-21 | 2017-01-03 | Jgc Catalysts And Chemicals Ltd. | Oligomer-modified fine particles, method for producing the same, and coating containing the particles |
JP2014038293A (en) * | 2012-08-20 | 2014-02-27 | Nissan Chem Ind Ltd | Dispersion liquid of titanium oxide-based fine particles, coating composition including particles and base material with transparent film |
JP6080583B2 (en) * | 2013-02-07 | 2017-02-15 | 日揮触媒化成株式会社 | Surface-modified inorganic composite oxide fine particles, production method thereof, dispersion containing the fine particles, coating solution for optical substrate, coating film for optical substrate, and coated substrate |
JP6049521B2 (en) * | 2013-03-29 | 2016-12-21 | 富士フイルム株式会社 | Photosensitive resin composition, cured film, image forming method, solid-state imaging device, color filter, and ultraviolet absorber |
JP5799182B1 (en) * | 2014-10-03 | 2015-10-21 | 富士フイルム株式会社 | Siloxane resin composition, transparent cured product, transparent pixel, microlens, and solid-state imaging device using the same |
-
2014
- 2014-10-03 JP JP2014205273A patent/JP6013422B2/en active Active
-
2015
- 2015-09-24 WO PCT/JP2015/076971 patent/WO2016052307A1/en active Application Filing
- 2015-09-25 TW TW104131687A patent/TW201614008A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP6013422B2 (en) | 2016-10-25 |
WO2016052307A1 (en) | 2016-04-07 |
JP2016074797A (en) | 2016-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
PL3162853T3 (en) | Copolycarbonate resin composition | |
HUE045219T2 (en) | Coding run values based on palette index in palette-based video coding | |
EP3223046A4 (en) | Sheet-shaped, transparent molding, transparent screen provided with same, and image projection device provided with same | |
EP3204887A4 (en) | Interactive image-based communication using image coding | |
EP3104191A4 (en) | Charge modulation element and solid-state imaging device | |
SG11201701691PA (en) | Resin and photosensitive resin composition | |
SG11201701852VA (en) | Thermosetting resin composition | |
EP3103843A4 (en) | Curable silicone composition, cured object thereof, and optical semiconductor device | |
SG11201606603TA (en) | Polycarbonate resin composition | |
EP3196256A4 (en) | Thermosetting resin composition | |
EP3239199A4 (en) | Thermosetting resin composition | |
EP3136173A4 (en) | Radiation-sensitive resin composition, resin film, and electronic component | |
HUE051754T2 (en) | Resin composition and film | |
EP3103842A4 (en) | Curable silicone composition, cured object thereof, and optical semiconductor device | |
SG11201704956UA (en) | Photosensitive resin composition and adhesives composition | |
EP3225647A4 (en) | Resin and photosensitive resin composition | |
EP3239200A4 (en) | Thermosetting resin composition | |
EP3112389A4 (en) | Curable composition, cured product thereof, and wafer level lens | |
TW201614377A (en) | Siloxane resin composition, transparent cured product using same, transparent pixel, microlens and solid-state imaging element | |
SG11201701228TA (en) | Resin cap | |
EP3098266A4 (en) | Liquid silicone resin composition | |
TW201614008A (en) | Siloxane resin composition, transparent cured product using said composition, transparent pixel, microlens, and solid-state imaging element | |
SG11201606206VA (en) | Resin composition for optical component, and optical component produced by using the resin composition | |
PT3137545T (en) | Thermoplastic elastomer composition for encapsulation | |
TWI561921B (en) | Photosensitive resin composition, light blocking layer manufactured using the same, and color filter |