TW201611974A - Cutting method of ingot - Google Patents

Cutting method of ingot

Info

Publication number
TW201611974A
TW201611974A TW104129592A TW104129592A TW201611974A TW 201611974 A TW201611974 A TW 201611974A TW 104129592 A TW104129592 A TW 104129592A TW 104129592 A TW104129592 A TW 104129592A TW 201611974 A TW201611974 A TW 201611974A
Authority
TW
Taiwan
Prior art keywords
ingot
cut line
cutting
tension
cut
Prior art date
Application number
TW104129592A
Other languages
English (en)
Inventor
Keiiichi Kanbayashi
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of TW201611974A publication Critical patent/TW201611974A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/06—Grinders for cutting-off
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
TW104129592A 2014-09-29 2015-09-08 Cutting method of ingot TW201611974A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014199058A JP6277924B2 (ja) 2014-09-29 2014-09-29 インゴットの切断方法

Publications (1)

Publication Number Publication Date
TW201611974A true TW201611974A (en) 2016-04-01

Family

ID=55629747

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104129592A TW201611974A (en) 2014-09-29 2015-09-08 Cutting method of ingot

Country Status (3)

Country Link
JP (1) JP6277924B2 (zh)
TW (1) TW201611974A (zh)
WO (1) WO2016051668A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111715992A (zh) * 2019-03-22 2020-09-29 必能信超声(上海)有限公司 线束切割方法、装置及超声波焊接机
CN112008902A (zh) * 2019-05-29 2020-12-01 信越半导体株式会社 铸块的切断方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0929607A (ja) * 1995-07-25 1997-02-04 Tokyo Seimitsu Co Ltd ワイヤソーのワイヤ張力制御方法及び装置
JP2005153031A (ja) * 2003-11-20 2005-06-16 Yasunaga Corp ワイヤソー及びワイヤソーの加工液供給方法
JP2008023644A (ja) * 2006-07-20 2008-02-07 Hitachi Cable Ltd 基板の製造方法及びワイヤソー装置
JP5502613B2 (ja) * 2010-06-18 2014-05-28 トーヨーエイテック株式会社 ワーク切断方法及びワイヤソー

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111715992A (zh) * 2019-03-22 2020-09-29 必能信超声(上海)有限公司 线束切割方法、装置及超声波焊接机
CN112008902A (zh) * 2019-05-29 2020-12-01 信越半导体株式会社 铸块的切断方法

Also Published As

Publication number Publication date
JP6277924B2 (ja) 2018-02-14
WO2016051668A1 (ja) 2016-04-07
JP2016068182A (ja) 2016-05-09

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