TW201608003A - Pressure sensitive adhesive sheet - Google Patents

Pressure sensitive adhesive sheet Download PDF

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TW201608003A
TW201608003A TW104109384A TW104109384A TW201608003A TW 201608003 A TW201608003 A TW 201608003A TW 104109384 A TW104109384 A TW 104109384A TW 104109384 A TW104109384 A TW 104109384A TW 201608003 A TW201608003 A TW 201608003A
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adhesive sheet
acrylate
alkyl
adhesive
meth
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TW104109384A
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TWI668287B (en
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Shigeyuki Yamashita
Tomoharu Miyanaga
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Lintec Corp
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  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Chemical & Material Sciences (AREA)
  • Laser Beam Processing (AREA)
  • Laminated Bodies (AREA)
  • Dicing (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)

Abstract

To provide a pressure sensitive adhesive sheet excellent in expandability, permeability, and heat shrinkability though having a low environmental load, which is used when a modified part is formed by irradiating laser beam to a tabular member and the tabular member is then divided into chips. A pressure sensitive adhesive sheet is used when a modified part is formed by irradiating to a tabular member with laser beam and the tabular member is then divided into chips. The pressure sensitive adhesive sheet includes a substrate and an adhesive layer disposed on one surface of the substrate. The substrate is made of an acrylic film containing, as a main ingredient, an acrylic copolymer (A) that is a copolymer of an alkyl(meth)acrylate (a) of C4-8 alkyl group and an alkyl(meth)acrylate (b) of C1-3 alkyl group.

Description

黏著薄片 Adhesive sheet

本發明係關於使用於對於板狀構件照射雷射光而形成改質部,將板狀構件分割使其晶片化的黏著薄片、及使用該黏著薄片之晶片狀構件的製造方法。 The present invention relates to an adhesive sheet for forming a modified portion by irradiating laser light to a plate member, dividing the plate member into a wafer, and a method of manufacturing the wafer member using the adhesive sheet.

過去作為1種切割法,已知有以雷射光進行內部加工,藉由之後的擴展而分割半導體晶圓的方法,具體可舉出Hamamatsu Photonics公司所提出的隱形切割等。在如此方法中,具體為於半導體晶圓藉由雷射光沿著切割線形成改質部後,使貼合於半導體晶圓之黏著薄片擴展後,將改質部作為起點進行半導體晶圓之分割(切割)而製造半導體晶片。 In the past, as a method of dicing, a method of performing internal processing by laser light and dividing the semiconductor wafer by subsequent expansion is known, and specifically, stealth dicing proposed by Hamamatsu Photonics Co., Ltd., and the like are known. In such a method, after the semiconductor wafer is formed into a modified portion along the dicing line by the laser light, the adhesive sheet attached to the semiconductor wafer is expanded, and the modified portion is used as a starting point for dividing the semiconductor wafer. A semiconductor wafer is fabricated (cut).

在上述分割方法中,於分割晶片之間所產生的所謂割縫(kerf)之間隙僅藉由擴展而產生,故作為黏著薄片,使晶片間隔能充分擴張之具有高擴展性者為必需。又,雷射光因介著黏著薄片而照射於晶圓,故可望為於黏著薄片具有高透過性者。過去,欲滿足這些要求特性,作為使用於上述分割方法之黏著薄片的基材,廣泛使 用聚氯乙烯(PVC)薄膜(例如,參照專利文獻1、2)。 In the above-described dividing method, the gap of the so-called kerf generated between the divided wafers is generated only by expansion, and therefore it is necessary to have a high expandability in which the wafer gap can be sufficiently expanded as the adhesive sheet. Further, since the laser light is irradiated onto the wafer via the adhesive sheet, it is expected that the adhesive sheet has high permeability. In the past, in order to satisfy these required characteristics, as a substrate for an adhesive sheet used in the above-described dividing method, it has been widely used. A polyvinyl chloride (PVC) film is used (for example, refer to Patent Documents 1 and 2).

[先行技術文獻] [Advanced technical literature] [專利文獻] [Patent Literature]

[專利文獻1]特開2011-119548號公報 [Patent Document 1] JP-A-2011-119548

[專利文獻2]特開2009-272611號公報 [Patent Document 2] JP-A-2009-272611

然而,近年來由減輕環境負荷之觀點來看,雖為無鹵素,但可望具有與PVC同程度之高擴展性、高透過性之基材的開發。又,在上述分割方法中,藉由擴展黏著薄片,於黏著薄片之外周部分會產生鬆弛現像。該鬆弛現像因在之後的步驟中造成搬送性等惡化的要因,故經加熱後收縮者為佳,可望該收縮可均勻地進行。 However, in recent years, from the viewpoint of reducing environmental load, although it is halogen-free, development of a substrate having high expandability and high permeability similar to PVC is expected. Further, in the above-described dividing method, by expanding the adhesive sheet, a slack image is generated in the outer peripheral portion of the adhesive sheet. This slack phenomenon is caused by deterioration of conveyability or the like in the subsequent steps. Therefore, it is preferable that the shrinkage after heating is performed, and it is expected that the shrinkage can be performed uniformly.

本發明為有鑑於以上問題點所成者,本發明之課題為提供一種環境負荷低,且具有優良擴展性、透過性、及熱收縮性之黏著薄片。 The present invention has been made in view of the above problems, and an object of the present invention is to provide an adhesive sheet having low environmental load and excellent expandability, permeability, and heat shrinkability.

本發明者們經過詳細檢討結果,發現即使使用環境負荷比較低的丙烯酸薄膜作為基材時,將烷基碳數比較大的烷基(甲基)丙烯酸酯與烷基碳數比較小的烷基(甲基)丙烯酸酯作為構成單體之丙烯酸共聚物作為主成 分時可解決上述課題,而完成以下本發明。 As a result of a detailed review, the present inventors have found that even when an acrylic film having a relatively low environmental load is used as a substrate, an alkyl (meth) acrylate having a relatively large alkyl carbon number and an alkyl group having a small alkyl carbon number are used. (Meth) acrylate as an acrylic copolymer constituting a monomer as a main component The above problem can be solved by time division, and the following invention is completed.

(1)一種黏著薄片,其特徵為使用於於板狀構件照射雷射光形成改質部,分割前述板狀構件使其晶片化時的黏著薄片,其為具備基材與設置於前述基材的一面之黏著劑層, 前述基材係由含有作為主成分的丙烯酸共聚物(A)之丙烯酸薄膜所成者,該丙烯酸共聚物(A)為烷基之碳數為4~8的烷基(甲基)丙烯酸酯(a)、與烷基之碳數為1~3的烷基(甲基)丙烯酸酯(b)的共聚物。 (1) An adhesive sheet characterized in that the sheet-like member is irradiated with laser light to form a modified portion, and the adhesive sheet is formed by dividing the sheet-like member into a wafer, and the substrate is provided with a substrate and a substrate. Adhesive layer on one side, The substrate is composed of an acrylic film containing an acrylic copolymer (A) as a main component, and the acrylic copolymer (A) is an alkyl (meth) acrylate having an alkyl group having 4 to 8 carbon atoms ( a) a copolymer of an alkyl (meth) acrylate (b) having a carbon number of 1 to 3 with an alkyl group.

(2)如(1)之黏著薄片,其中丙烯酸共聚物(A)為將烷基(甲基)丙烯酸酯(a)與烷基(甲基)丙烯酸酯(b)以質量比10:90~40:60進行共聚合者。 (2) The adhesive sheet according to (1), wherein the acrylic copolymer (A) has a mass ratio of alkyl (meth) acrylate (a) to alkyl (meth) acrylate (b) of 10: 90 〜 Co-aggregation at 40:60.

(3)如(1)或(2)之黏著薄片,其中前述丙烯酸共聚物(A)為無規共聚物。 (3) The adhesive sheet according to (1) or (2), wherein the aforementioned acrylic copolymer (A) is a random copolymer.

4.如請求項1~3中任一項之黏著薄片,其中丙烯酸共聚物(A)為混合重量平均分子量為60萬以上之丙烯酸共聚物(A1)、與重量平均分子量為40萬以下之丙烯酸共聚物(A2)而得者。 4. The adhesive sheet according to any one of claims 1 to 3, wherein the acrylic copolymer (A) is an acrylic copolymer (A1) having a weight average molecular weight of 600,000 or more, and acrylic acid having a weight average molecular weight of 400,000 or less. The copolymer (A2) was obtained.

(5)如(4)之黏著薄片,其中丙烯酸共聚物(A1)與丙烯酸共聚物(A2)之混合比率以質量比表示為5:95~35:65。 (5) The adhesive sheet of (4), wherein a mixing ratio of the acrylic copolymer (A1) to the acrylic copolymer (A2) is represented by a mass ratio of 5:95 to 35:65.

(6)如(1)~(5)中任一項之黏著薄片,其中烷基(甲基)丙烯酸酯(a)為烷基的碳數為4~8之烷基丙烯酸酯的同時,烷基(甲基)丙烯酸酯(b)為烷基的碳 數為1~3之烷基甲基丙烯酸酯。 (6) The adhesive sheet according to any one of (1) to (5) wherein the alkyl (meth) acrylate (a) is an alkyl acrylate having an alkyl group having 4 to 8 carbon atoms, and the alkane Base (meth) acrylate (b) is an alkyl carbon The number is 1 to 3 alkyl methacrylate.

(7)如(6)之黏著薄片,其中烷基(甲基)丙烯酸酯(a)為丁基丙烯酸酯,烷基(甲基)丙烯酸酯(b)為甲基甲基丙烯酸酯。 (7) An adhesive sheet according to (6), wherein the alkyl (meth) acrylate (a) is a butyl acrylate, and the alkyl (meth) acrylate (b) is a methyl methacrylate.

(8)如(1)~(7)中任一項之黏著薄片,其中前述基材的楊氏模率為50~500MPa。 (8) The adhesive sheet according to any one of (1) to (7) wherein the substrate has a Young's modulus of 50 to 500 MPa.

(9)如(1)~(8)中任一項之黏著薄片,其中與前述基材的一面為反側的面之中心線平均粗度Ra為0.1μm以下。 (9) The adhesive sheet according to any one of (1) to (8), wherein a center line average roughness Ra of a surface opposite to one surface of the base material is 0.1 μm or less.

(10)如(1)~(9)中任一項之黏著薄片,其中前述基材的一面的中心線平均粗度Ra為0.15μm以上。 (10) The adhesive sheet according to any one of (1) to (9), wherein a center line average roughness Ra of one surface of the substrate is 0.15 μm or more.

(11)如(1)~(10)中任一項之黏著薄片,其中全光線透過率為85%以上,HAZE為7%以下。 (11) The adhesive sheet according to any one of (1) to (10), wherein the total light transmittance is 85% or more and the HAZE is 7% or less.

(12)如(1)~(11)中任一項之黏著薄片,其中前述黏著劑層係由丙烯酸系黏著劑所形成。 (12) The adhesive sheet according to any one of (1) to (11) wherein the adhesive layer is formed of an acrylic adhesive.

(13)一種晶片狀構件之製造方法,其特徵為具備下述步驟者;於板狀構件的一面上,貼合如(1)~(12)中任一項之黏著薄片的步驟、介著貼合於前述板狀構件之黏著薄片,於前述板狀構件照射雷射光而形成改質部之步驟、藉由前述黏著薄片之擴展,分割前述板狀構件而晶片化後得到晶片狀構件之步驟。 (13) A method of producing a wafer-shaped member, comprising the steps of: bonding an adhesive sheet according to any one of (1) to (12) on one surface of a plate member; a step of bonding the adhesive sheet of the plate-like member to the plate-like member to form a modified portion by irradiating the laser beam, and expanding the sheet-like member by the expansion of the adhesive sheet to obtain a wafer-shaped member .

(14)如(13)之晶片狀構件之製造方法,其中進一 步具備前述晶片狀構件貼合於黏著薄片之中央區域,將前述中央區域之外側區域的黏著薄片之外周區域進行加熱使其收縮的步驟。 (14) The method of manufacturing a wafer-shaped member according to (13), wherein one The step includes the step of bonding the wafer-shaped member to the central region of the adhesive sheet, and heating and shrinking the outer peripheral region of the adhesive sheet in the outer region of the central portion.

本發明為提供一種環境負荷為低、擴展性、透過性、及熱收縮性優良的黏著薄片。 The present invention provides an adhesive sheet which is low in environmental load, excellent in expandability, permeability, and heat shrinkability.

10‧‧‧黏著薄片 10‧‧‧Adhesive sheets

10A‧‧‧中央區域 10A‧‧‧Central Area

10B‧‧‧周緣部 10B‧‧‧The Peripheral Department

10C‧‧‧外周區域 10C‧‧‧peripheral area

11‧‧‧基材 11‧‧‧Substrate

12‧‧‧黏著劑層 12‧‧‧Adhesive layer

13‧‧‧環圈框架 13‧‧‧ ring frame

14‧‧‧半導體晶圓(板狀構件) 14‧‧‧Semiconductor wafer (plate-like member)

15‧‧‧雷射光源 15‧‧‧Laser light source

16‧‧‧改質部 16‧‧‧Transformation Department

18‧‧‧半導體晶片 18‧‧‧Semiconductor wafer

20‧‧‧夾具 20‧‧‧ fixture

[圖1]表示本發明之黏著薄片的結構模式截面圖。 Fig. 1 is a cross-sectional view showing the structure of an adhesive sheet of the present invention.

[圖2]表示使用本發明之黏著薄片製造晶片構件之方法的模式截面圖,其中表示於半導體晶圓設置改質部的步驟。 Fig. 2 is a schematic cross-sectional view showing a method of manufacturing a wafer member using the adhesive sheet of the present invention, showing a step of providing a reforming portion on a semiconductor wafer.

[圖3]表示使用本發明之黏著薄片製造晶片構件之方法的模式截面圖,其中表示黏著薄片經擴展之步驟。 Fig. 3 is a schematic cross-sectional view showing a method of manufacturing a wafer member using the adhesive sheet of the present invention, in which the step of expanding the adhesive sheet is shown.

以下對於本發明使用實施形態做詳細說明。且,以下記載中,「重量平均分子量(Mw)」表示藉由凝膠滲透層析法(GPC)法所測定之聚苯乙烯換算值,具體為依據實施例所記載的方法經測定之值。又,例如所謂「(甲基)丙烯酸酯」表示「丙烯酸酯」及「甲基丙烯酸酯」之雙方意思,其他類似用語亦相同。 Hereinafter, the embodiment of the present invention will be described in detail. In the following description, the "weight average molecular weight (Mw)" means a polystyrene-converted value measured by a gel permeation chromatography (GPC) method, and specifically, a value measured according to the method described in the examples. Moreover, for example, "(meth) acrylate" means both "acrylic ester" and "methacrylate", and the other similar terms are also the same.

〔黏著薄片〕 [adhesive sheet]

如圖1所示,本發明之黏著薄片10為,具備基材11與設置於基材11的一面之黏著劑層12,於板狀構件照射雷射光形成改質部,分割該板狀構件使其晶片化的方法中,其為貼合於半導體晶圓等板狀構件而使用的黏著薄片。以下對於各構件之構成做詳細說明。 As shown in Fig. 1, the adhesive sheet 10 of the present invention comprises a base material 11 and an adhesive layer 12 provided on one surface of the base material 11, and the plate-shaped member is irradiated with laser light to form a modified portion, and the plate-shaped member is divided. In the method of wafer formation, it is an adhesive sheet used for bonding to a plate-shaped member, such as a semiconductor wafer. The composition of each member will be described in detail below.

〔基材〕 [substrate]

基材為含有以下丙烯酸共聚物(A)作為主成分的丙烯酸薄膜,該丙烯酸共聚物(A)為烷基碳數4~8之烷基(甲基)丙烯酸酯(a)、與烷基碳數1~3之烷基(甲基)丙烯酸酯(b)的共聚物。 The substrate is an acrylic film containing the following acrylic copolymer (A) as a main component, and the acrylic copolymer (A) is an alkyl (meth) acrylate (a) having an alkyl group having 4 to 8 carbon atoms, and an alkyl carbon. A copolymer of alkyl (meth) acrylate (b) having a number of 1-3.

本發明中,丙烯酸共聚物(A)為含有烷基碳數比較大之(a)成分與烷基碳數比較小之(b)成分作為構成單體,基材為不會表現表面黏著性下具有良好伸展性,故其為具有無產生阻塞下具有優良擴展性者。又,本發明之基材因將丙烯酸共聚物作為主成分而具有優良雷射透過性,且藉由加熱之收縮均勻性良好,故即使施予如後述之加熱收縮亦不會產生皺折。 In the present invention, the acrylic copolymer (A) is a component (b) having a relatively large alkyl group carbon number and a relatively small alkyl carbon number as a constituent monomer, and the substrate does not exhibit surface adhesion. It has good stretchability, so it has excellent extensibility without clogging. Further, since the base material of the present invention has excellent laser permeability as a main component of the acrylic copolymer and good shrinkage uniformity by heating, wrinkles are not generated even when heat shrinkage as described later is applied.

欲使基材無表現表面黏著性而具有優良伸展性,上述(a)成分以烷基丙烯酸酯者為佳,又(b)成分以烷基甲基丙烯酸酯為佳。又,由同樣觀點來看,(a)成分中之烷基碳數以4~6為佳,以4為較佳。另一方面,(b)成分中之烷基碳數以1或2為佳,以1為較佳。 In order to impart excellent surface stretchability to the substrate, the component (a) is preferably an alkyl acrylate, and the component (b) is preferably an alkyl methacrylate. Further, from the same viewpoint, the alkyl group carbon number in the component (a) is preferably 4 to 6, and preferably 4 is preferred. On the other hand, the number of alkyl carbon groups in the component (b) is preferably 1 or 2, and preferably 1 is preferred.

作為本發明可使用的(a)成分,具體可舉出丁基(甲基)丙烯酸酯、戊基(甲基)丙烯酸酯、己基(甲基)丙烯酸酯、庚基(甲基)丙烯酸酯、辛基(甲基)丙烯酸酯等,這些可為直鏈亦可為分支。又,這些之中以丁基(甲基)丙烯酸酯為佳,以丁基丙烯酸酯為較佳。作為(b)成分,可舉出甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、n-丙基(甲基)丙烯酸酯、異丙基(甲基)丙烯酸酯,彼等中亦以甲基甲基丙烯酸酯、乙基甲基丙烯酸酯為佳,以甲基甲基丙烯酸酯為較佳。 Specific examples of the component (a) which can be used in the present invention include butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, and heptyl (meth) acrylate. Octyl (meth) acrylate, etc., these may be linear or branched. Further, among these, butyl (meth) acrylate is preferred, and butyl acrylate is preferred. Examples of the component (b) include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, and isopropyl (meth) acrylate. Methyl methacrylate and ethyl methacrylate are preferred, and methyl methacrylate is preferred.

丙烯酸共聚物(A)係以(a)成分與(b)成分以質量比10:90~40:60共聚合者為佳。若使質量比(以下亦稱為「質量比(a:b)」)在上述範圍內時,於基材不會表現表面黏著性,更容易成為適合伸展性者。由如此觀點來看,質量比(a:b)以15:85~30:70者為較佳。 The acrylic copolymer (A) is preferably a copolymer of the component (a) and the component (b) in a mass ratio of 10:90 to 40:60. When the mass ratio (hereinafter also referred to as "mass ratio (a:b)") is within the above range, the substrate does not exhibit surface tackiness, and it is more likely to be suitable for stretchability. From this point of view, the mass ratio (a:b) is preferably 15:85 to 30:70.

又,因欲使楊氏模量容易成為適當值,質量比(a:b)以15:85~25:75者為更佳。 Further, since the Young's modulus is likely to be an appropriate value, the mass ratio (a:b) is preferably 15:85 to 25:75.

丙烯酸共聚物(A)可採用無規共聚物、嵌段共聚物、交互共聚物等種種結構,以無規共聚物為佳。丙烯酸共聚物(A)若為無規共聚物時,對於熔融物之固化段階,考慮為因構造變化所引起的步驟失敗(例如所得到的膜上產生皺折,無法得到平滑薄膜等)比嵌段共聚物更難產生,可使藉由押出成形法等熔融成形之製膜變的容易。又,丙烯酸共聚物(A)若為無規共聚物時,與交互 共聚物相比較容易合成。 The acrylic copolymer (A) may have various structures such as a random copolymer, a block copolymer, and an interactive copolymer, and a random copolymer is preferred. When the acrylic copolymer (A) is a random copolymer, the step of solidification of the melt is considered to be a failure of the step due to a structural change (for example, wrinkles are formed on the obtained film, and a smooth film cannot be obtained). The segment copolymer is more difficult to produce, and it is easy to form a film by melt molding such as extrusion molding. Further, when the acrylic copolymer (A) is a random copolymer, it interacts with The copolymer is relatively easy to synthesize.

無規共聚物若為以上述(a)成分與(b)成分以無規方式共聚合者即可,例如可舉出藉由各種自由基聚合法進行聚合者。作為自由基聚合法,可舉出溶液聚合、懸浮聚合、乳化聚合等。又,作為於自由基聚合物所使用之聚合起始劑,可舉出偶氮化合物、過氧化物等種種氧化還原起始劑等。 The random copolymer may be a copolymer of the above components (a) and (b) in a random manner, and examples thereof include polymerization by various radical polymerization methods. Examples of the radical polymerization method include solution polymerization, suspension polymerization, emulsion polymerization, and the like. In addition, examples of the polymerization initiator used for the radical polymer include various redox initiators such as an azo compound and a peroxide.

丙烯酸共聚物(A)係以混合重量平均分子量為60萬以上之丙烯酸共聚物(A1)與重量平均分子量為40萬以下之丙烯酸共聚物(A2)者為佳。本發明中,將如此相對性分子量高的共聚物與相對性分子量低之共聚物進行混合時,可提高薄膜之保形性的同時,對於薄膜可容易賦予適度伸展性。 The acrylic copolymer (A) is preferably an acrylic copolymer (A1) having a weight average molecular weight of 600,000 or more and an acrylic copolymer (A2) having a weight average molecular weight of 400,000 or less. In the present invention, when the copolymer having such a relatively high molecular weight is mixed with a copolymer having a relatively low molecular weight, the shape retaining property of the film can be improved, and the film can be easily imparted with moderate stretchability.

由這些觀點來看,丙烯酸共聚物(A1)的重量平均分子量為80萬~130萬之同時,丙烯酸共聚物(A2)的重量平均分子量以1萬~20萬者為較佳,丙烯酸共聚物(A1)的重量平均分子量為90萬~110萬之同時,丙烯酸共聚物(A2)的重量平均分子量為3萬~8萬時為更佳。 From these viewpoints, the weight average molecular weight of the acrylic copolymer (A1) is from 800,000 to 1.3 million, and the weight average molecular weight of the acrylic copolymer (A2) is preferably from 10,000 to 200,000, and the acrylic copolymer ( The weight average molecular weight of A1) is from 900,000 to 1.1 million, and the weight average molecular weight of the acrylic copolymer (A2) is preferably from 30,000 to 80,000.

且,丙烯酸共聚物(A1)及丙烯酸共聚物(A2)各若為上述丙烯酸共聚物(A),構成丙烯酸共聚物(A1)之單體組成(構成單體之種類與各單體之質量比)可與構成丙烯酸共聚物(A2)之單體組成相同或亦可相異。 Further, each of the acrylic copolymer (A1) and the acrylic copolymer (A2) is the above-mentioned acrylic copolymer (A), and constitutes a monomer composition of the acrylic copolymer (A1) (mass ratio of the type of the constituent monomer to each monomer) It may be the same as or different from the monomer composition constituting the acrylic copolymer (A2).

丙烯酸共聚物(A1)與丙烯酸共聚物(A2) 之混合比率(A1:A2)在質量基準下以5:95~35:65為佳,以5:95~25:75為較佳。本發明中,使混合比率在此範圍下時,可使保形性良好下基材之伸展性亦良好。 Acrylic copolymer (A1) and acrylic copolymer (A2) The mixing ratio (A1:A2) is preferably 5:95 to 35:65 in the mass standard, and preferably 5:95 to 25:75. In the present invention, when the mixing ratio is within this range, the stretchability of the substrate is also good when the shape retention property is good.

混合比率(A1:A2)在欲使楊氏模量容易成為適當值時,以8:92~15:85為更佳,特別將混合比率(A1:A2)為8:92~15:85下,使上述質量比(a:b)為15:85~25:75時為最佳。 The mixing ratio (A1:A2) is preferably 8:92 to 15:85 when the Young's modulus is easily made appropriate, and the mixing ratio (A1:A2) is particularly 8:92 to 15:85. It is optimal to make the above mass ratio (a:b) 15:85 to 25:75.

丙烯酸共聚物(A)可為僅將上述(a)及(b)成分作為構成單位者,亦可不損害本發明之效果下,將上述(a)成分、(b)成分與(a)及(b)成分以外的其他單體進行共聚合者。其他單體一般為丙烯酸共聚物(A)之構成單體中的20質量%以下,較佳為5質量%以下。作為其他單體,例如可舉出烷基碳數與(a)及(b)成分之碳數相異的烷基(甲基)丙烯酸酯;具有羥基、羧基、胺基等(甲基)丙烯酸酯;乙酸乙烯酯;苯乙烯;丙烯醯基等。 The acrylic copolymer (A) may be one having only the above components (a) and (b) as a constituent unit, or the components (a) and (b) and (a) and (b) without impairing the effects of the present invention. b) Any monomer other than the component is copolymerized. The other monomer is generally 20% by mass or less, preferably 5% by mass or less, based on the constituent monomers of the acrylic copolymer (A). Examples of the other monomer include an alkyl (meth) acrylate having an alkyl group having a carbon number different from that of the components (a) and (b), and a (meth) acrylate having a hydroxyl group, a carboxyl group or an amine group. Ester; vinyl acetate; styrene; acrylonitrile and the like.

基材以楊氏模量為50~500MPa者為佳。將楊氏模量設定在此範圍時,可維持良好伸展性下,提高基材之機械強度,形成黏著劑層時的步驟適性會良好。例如將成為基材之丙烯酸薄膜組裝於塗布機時,可防止施予張力時的丙烯酸薄膜的不經意延伸。 The substrate preferably has a Young's modulus of 50 to 500 MPa. When the Young's modulus is set in this range, the mechanical strength of the substrate can be improved while maintaining good stretchability, and the step suitability in forming the adhesive layer is good. For example, when the acrylic film to be a substrate is assembled in a coater, it is possible to prevent inadvertent stretching of the acrylic film when tension is applied.

上述楊氏模量由不容易產生阻塞等,且提高機械強度下可使擴展性更為良好之觀點來看,以60~450MPa為較佳,以100~420MPa為更佳,以150~300MPa為進一步 更佳。 The Young's modulus is preferably 60 to 450 MPa, more preferably 100 to 420 MPa, and 150 to 300 MPa from the viewpoint that the clogging is less likely to occur, and the mechanical strength is improved to improve the expandability. further Better.

對於設置基材的黏著劑層之面(第1面)的反面(第2面),其中心線平均粗糙度Ra以、0.1μm以下為佳。將未設置黏著劑層之側的基材表面變的平滑下,提高黏著薄片之光線透過性,藉由雷射照射可良好精度下形成後述改質部。又,第2面之中心線平均粗糙度Ra雖無特別限定,通常為0.02μm以上較佳為0.05μm以上。 The back surface (the second surface) of the surface (first surface) on which the pressure-sensitive adhesive layer of the substrate is provided has a center line average roughness Ra of preferably 0.1 μm or less. The surface of the substrate on the side where the pressure-sensitive adhesive layer is not provided is smoothed to improve the light transmittance of the adhesive sheet, and the modified portion described later can be formed with good precision by laser irradiation. Further, the center line average roughness Ra of the second surface is not particularly limited, but is usually 0.02 μm or more, preferably 0.05 μm or more.

又,設置於基材黏著劑層之側面(第1面)的中心線平均粗糙度Ra以0.15μm以上者為佳,以0.25μm以上者為較佳。又,第1面之中心線平均粗糙度Ra雖無特別限定,通常為3.0μm以下,較佳為1.0μm以下。 Moreover, it is preferable that the center line average roughness Ra of the side surface (first surface) of the base material adhesive layer is 0.15 μm or more, and preferably 0.25 μm or more. Further, the center line average roughness Ra of the first surface is not particularly limited, but is usually 3.0 μm or less, preferably 1.0 μm or less.

第1面因具有以上平均粗糙度,即使將第2面作為平滑面,可防止捲取丙烯酸薄膜時的阻塞。且即使基材之黏著劑層側的表面可具有粗凹凸,藉由層合黏著劑層,因於界面中之光擴散被減低,對於黏著薄片之光線透過性的影響較為小。 Since the first surface has the above average roughness, even if the second surface is used as a smooth surface, clogging during the winding of the acrylic film can be prevented. Further, even if the surface of the adhesive layer side of the substrate can have coarse unevenness, by laminating the adhesive layer, the light diffusion in the interface is reduced, and the influence on the light transmittance of the adhesive sheet is small.

基材厚度較佳為40~200μm,更佳為50~150μm之範圍。 The thickness of the substrate is preferably from 40 to 200 μm, more preferably from 50 to 150 μm.

基材以不損害本發明之目的的範圍下,可近一步含有滑劑、抗氧化劑、紫外線吸收劑、加工助劑、填充劑、帶電防止劑、安定劑、抗菌劑、難燃劑、顏料或染料等著色劑等各種添加劑。又,基材為作為樹脂成分僅由丙烯酸共聚物(A)所成者為佳,但丙烯酸共聚物(A) 以外的樹脂成分可視必要下含有。基材雖以丙烯酸聚合物(A)作為主成分者即可,通常含有丙烯酸共聚物(A)80質量%以上,較佳為含有90質量%以上,更佳為含有95質量%以上。 The substrate may further contain a slip agent, an antioxidant, an ultraviolet absorber, a processing aid, a filler, a charge inhibitor, a stabilizer, an antibacterial agent, a flame retardant, a pigment, or the like in a range not impairing the object of the present invention. Various additives such as a coloring agent such as a dye. Further, the base material is preferably a resin component as the acrylic copolymer (A), but the acrylic copolymer (A) The resin component other than that may be contained as necessary. The base material may be an acrylic polymer (A) as a main component, and usually contains 80% by mass or more of the acrylic copolymer (A), preferably 90% by mass or more, and more preferably 95% by mass or more.

本發明之基材(丙烯酸薄膜)之成形方法雖無特別限定,可舉出使用膨脹法、T型模等押出成形、壓延成型等,彼等之中亦以押出成形為佳。又,欲得到上述中心線平均粗糙度Ra,例如可將押出薄膜經壓花輥進行壓付下可適宜地調整基材表面狀態即可。 The method for forming the substrate (acrylic film) of the present invention is not particularly limited, and examples thereof include extrusion molding, T-die extrusion molding, and calender molding. Among them, extrusion molding is preferred. Further, in order to obtain the center line average roughness Ra, for example, the extruded film may be pressed by an embossing roll to appropriately adjust the surface state of the substrate.

〔黏著劑層〕 [adhesive layer]

黏著劑層為由各種黏著劑所形成,故作為該黏著劑,雖無特別限定,例如可使用橡膠系、丙烯酸系、聚矽氧系、聚乙烯醚等黏著劑,這些之中亦以丙烯酸系黏著劑為佳。使用丙烯酸系黏著劑時,因黏著劑為基材與同種聚合物所構成,故可使基材與黏著劑層之折射率相近。藉此,可容易防止在基材與黏著劑層之界面的雷射光反射。 The adhesive layer is formed of various adhesives, and the adhesive is not particularly limited. For example, an adhesive such as a rubber-based, acrylic-based, polyfluorene-based or polyvinyl ether may be used. Adhesive is preferred. When an acrylic adhesive is used, since the adhesive is composed of the base material and the same polymer, the refractive index of the substrate and the adhesive layer can be made close. Thereby, it is possible to easily prevent the reflection of the laser light at the interface between the substrate and the adhesive layer.

又,對於黏著劑亦可使用能量線硬化型或加熱發泡型、水膨潤型之黏著劑。作為能量線硬化(紫外線硬化、電子線硬化等)型黏著劑,特別以使用紫外線硬化型黏著劑者為佳。藉由使用能量線硬化型黏著劑,在黏著薄片貼合於半導體晶圓或半導體晶片等被黏物的狀態下,確實地可保持或保護被黏物。另一方面,藉由拾取等將晶片自黏著薄片進行剝離時,藉由照射能量線使黏著劑層的 黏著力降低,不會對晶片造成傷害,且於晶片上不會殘留黏著劑,可使黏著薄片自晶片剝離。 Further, as the adhesive, an energy ray-curing type or a heat-foaming type or water-swellable type of adhesive may be used. As the energy line curing (ultraviolet curing, electron beam curing, etc.) type adhesive, it is particularly preferable to use an ultraviolet curing adhesive. By using an energy ray-curable adhesive, the adherend can be surely held or protected in a state in which the adhesive sheet is bonded to an adherend such as a semiconductor wafer or a semiconductor wafer. On the other hand, when the wafer is peeled off from the adhesive sheet by pick-up or the like, the adhesive layer is made by irradiating the energy ray. The adhesion is reduced, no damage is caused to the wafer, and no adhesive remains on the wafer, so that the adhesive sheet can be peeled off from the wafer.

構成黏著劑層之黏著劑組成物其除使用於賦予黏著性的黏著成分,欲改善各種物性,視必要可含有交聯劑等其他成分。作為交聯劑,可舉出有機多價異氰酸酯化合物、有機多價環氧化合物、有機多價亞胺化合物等。又,將黏著劑層以能量線硬化型黏著劑形成時,使用添加能量線硬化型黏著成分與視必要的光聚合起始劑之黏著劑組成物,進而形成黏著劑層為佳。 The adhesive composition constituting the adhesive layer is used for an adhesive component to impart adhesiveness, and is intended to improve various physical properties, and may contain other components such as a crosslinking agent as necessary. Examples of the crosslinking agent include an organic polyvalent isocyanate compound, an organic polyvalent epoxy compound, and an organic polyvalent imine compound. Further, when the adhesive layer is formed of an energy ray-curable adhesive, it is preferred to form an adhesive layer by adding an energy ray-curable adhesive component and an optional photopolymerization initiator.

以下,對於作為黏著劑使用丙烯酸系黏著劑之情況的例子做具體說明。作為黏著劑使用丙烯酸系黏著劑時,黏著劑組成物因賦予充分黏著性及造膜性(薄片加工性),故作為黏著成分含有丙烯酸聚合物(X)。作為丙烯酸聚合物(X),可使用作為黏著劑使用的過去已知的丙烯酸聚合物。丙烯酸聚合物(X)之重量平均分子量(Mw)以1萬~200萬為佳,以10萬~150萬為較佳。 Hereinafter, an example in which an acrylic adhesive is used as an adhesive will be specifically described. When an acrylic adhesive is used as the adhesive, the adhesive composition contains the acrylic polymer (X) as an adhesive component because it imparts sufficient adhesiveness and film-forming property (sheet processability). As the acrylic polymer (X), a conventionally known acrylic polymer used as an adhesive can be used. The weight average molecular weight (Mw) of the acrylic polymer (X) is preferably from 10,000 to 2,000,000, more preferably from 100,000 to 1.5 million.

作為構成上述丙烯酸聚合物(X)之單體,可舉出(甲基)丙烯酸酯單體或其衍生物。例如為烷基碳數為1~18之烷基(甲基)丙烯酸酯,例如可舉出甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、丙基(甲基)丙烯酸酯、丁基(甲基)丙烯酸酯、2-乙基己基(甲基)丙烯酸酯等;具有環狀骨架之(甲基)丙烯酸酯,例如可舉出環烷基(甲基)丙烯酸酯、苯甲基(甲基)丙烯酸酯、異冰片基丙烯酸酯、二環戊基丙烯酸酯、二環戊烯基丙烯 酸酯、二環戊烯基氧基乙基丙烯酸酯、醯亞胺丙烯酸酯等;可舉出具有羥基之2-羥基乙基(甲基)丙烯酸酯、2-羥基丙基(甲基)丙烯酸酯等,可舉出丙烯酸、甲基丙烯酸、衣康酸、縮水甘油基甲基丙烯酸酯、縮水甘油基丙烯酸酯等。又,上述丙烯酸聚合物(X)可為乙酸乙烯酯、丙烯腈、苯乙烯等經共聚合之丙烯酸共聚物。 The monomer constituting the above acrylic polymer (X) may, for example, be a (meth) acrylate monomer or a derivative thereof. For example, an alkyl (meth) acrylate having an alkyl group having 1 to 18 carbon atoms may, for example, be methyl (meth) acrylate, ethyl (meth) acrylate or propyl (meth) acrylate. , butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, etc.; (meth) acrylate having a cyclic skeleton, for example, cycloalkyl (meth) acrylate, benzene Methyl (meth) acrylate, isobornyl acrylate, dicyclopentyl acrylate, dicyclopentenyl propylene An acid ester, a dicyclopentenyloxyethyl acrylate, an oxime imide acrylate, etc.; a 2-hydroxyethyl (meth) acrylate having a hydroxyl group; 2-hydroxypropyl (meth) acrylate Examples of the esters include acrylic acid, methacrylic acid, itaconic acid, glycidyl methacrylate, and glycidyl acrylate. Further, the acrylic polymer (X) may be a copolymerized acrylic copolymer such as vinyl acetate, acrylonitrile or styrene.

又,丙烯酸系黏著劑為能量線硬化型黏著劑時,能量線硬化型黏著成分除丙烯酸聚合物(X)以外,進一部可含有能量線硬化性化合物(Y)。能量線硬化性化合物(Y)為含有能量線聚合性基,接受紫外線、電子線等能量線之照射而進行聚合硬化後,具有降低黏著劑組成物之黏著力的功能者。又,作為能量線硬化型黏著成分,作為兼具上述(X)及(Y)成分之性質者,可使用於主鏈或側鏈上鍵結能量線聚合性基所成的能量線硬化型黏著性聚合物(以下有時記載為(XY)成分)。如此能量線硬化型黏著性聚合物(XY)具有兼備黏著性與能量線硬化性之性質。 When the acrylic adhesive is an energy ray-curable adhesive, the energy ray-curable adhesive component may contain an energy ray-curable compound (Y) in addition to the acrylic polymer (X). The energy ray-curable compound (Y) is an energy ray-polymerizable group, and is subjected to polymerization and curing by irradiation with an energy ray such as an ultraviolet ray or an electron beam, and has a function of lowering the adhesion of the adhesive composition. Further, as the energy ray-curable adhesive component, as the property of the above (X) and (Y) components, the energy ray-curable adhesive which is used for bonding the energy ray-polymerizable group in the main chain or the side chain can be used. Polymer (hereinafter sometimes referred to as (XY) component). Such an energy ray-curable adhesive polymer (XY) has properties of both adhesiveness and energy ray hardenability.

能量線硬化性化合物(Y)係為接受紫外線、電子線等能量線照射而進行聚合硬化的化合物。作為該能量線聚合性化合物之例子,可舉出具有能量線聚合性基之低分子量化合物(單官能、多官能之單體及寡聚物),具體可使用三羥甲基丙烷三丙烯酸酯、四羥甲基甲烷四丙烯酸酯、季戊四醇三丙烯酸酯、二季戊四醇單羥基五丙烯酸酯、二季戊四醇六丙烯酸酯、1,4-丁二醇二丙烯酸酯、 1,6-已二醇二丙烯酸酯等之丙烯酸酯、二環戊二烯二甲氧基二丙烯酸酯、異冰片基丙烯酸酯等之環狀脂肪族骨架含有丙烯酸酯、聚乙二醇二丙烯酸酯、寡酯丙烯酸酯、胺基甲酸酯丙烯酸酯寡聚物、環氧改性丙烯酸酯、聚醚丙烯酸酯、衣康酸寡聚物等之丙烯酸酯系化合物。如此化合物為於分子內具有至少1個聚合性雙鍵,通常分子量或重量平均分子量(Mw)為100~30000,以300~10000程度為佳。一般對於(X)成分100質量份,(Y)成分為10~400質量份,較佳為使用30~350質量份程度之比例。 The energy ray-curable compound (Y) is a compound which undergoes polymerization hardening by irradiation with an energy ray such as an ultraviolet ray or an electron beam. Examples of the energy ray polymerizable compound include low molecular weight compounds (monofunctional, polyfunctional monomers and oligomers) having an energy ray polymerizable group, and specifically, trimethylolpropane triacrylate can be used. Tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butanediol diacrylate, A cyclic aliphatic skeleton such as an acrylate such as 1,6-hexanediol diacrylate, dicyclopentadienyl dimethoxy diacrylate or isobornyl acrylate, or the like, contains an acrylate or a polyethylene glycol diacrylate. An acrylate-based compound such as an ester, an oligoester acrylate, a urethane acrylate oligomer, an epoxy-modified acrylate, a polyether acrylate, or an itaconic acid oligomer. Such a compound has at least one polymerizable double bond in the molecule, and usually has a molecular weight or a weight average molecular weight (Mw) of from 100 to 30,000, preferably from about 300 to 10,000. In general, the (Y) component is 10 to 400 parts by mass, preferably 30 to 350 parts by mass, based on 100 parts by mass of the (X) component.

兼備上述(X)及(Y)成分性質之能量線硬化型黏著性聚合物(XY)為,於主鏈或側鏈上結合能量線聚合性基而成。能量線硬化型黏著性聚合物(XY)之主骨架並無特別限定,可為與作為黏著劑而泛用之上述丙烯酸共聚物相同者。 The energy ray-curable adhesive polymer (XY) having the properties of the above (X) and (Y) components is obtained by bonding an energy ray polymerizable group to a main chain or a side chain. The main skeleton of the energy ray-curable adhesive polymer (XY) is not particularly limited, and may be the same as the above-mentioned acrylic copolymer which is generally used as an adhesive.

結合於能量線硬化型黏著性聚合物之主鏈或側鏈上的能量線聚合性基,例如為含有能量線聚合性碳-碳雙鍵之基,具體可例示出(甲基)丙烯醯基等。能量線聚合性基可介著伸烷基、伸烷基氧基、聚伸烷基氧基結合於能量線硬化型黏著性聚合物。 The energy ray-polymerizable group bonded to the main chain or the side chain of the energy ray-curable adhesive polymer is, for example, a group containing an energy ray-polymerizable carbon-carbon double bond, and specifically, a (meth) acrylonitrile group is exemplified. Wait. The energy ray polymerizable group may be bonded to the energy ray-curable adhesive polymer via an alkyl group, an alkylene group, or a polyalkylene group.

能量線聚合性基所結合之能量線硬化型黏著性聚合物(XY)的重量平均分子量(Mw)以1萬~200萬為佳,以10萬~150萬為較佳。 The weight average molecular weight (Mw) of the energy ray-curable adhesive polymer (XY) to which the energy ray polymerizable group is bonded is preferably from 10,000 to 2,000,000, preferably from 100,000 to 1.5,000,000.

能量線硬化型黏著性聚合物(XY),例如由將含有羥基、羧基、胺基、取代胺基、環氧基等官能基之丙烯酸 黏著性聚合物與以下含有聚合性基之化合物進行反應而得,該含有聚合性基之化合物係由將與該官能基進行反應之取代基,與每1分子中具有1~5個能量線聚合性碳-碳雙鍵之聚合性基含有化合物進行反應而得者。丙烯酸黏著性聚合物係由具有羥基、羧基、胺基、取代胺基、環氧基等官能基之(甲基)丙烯酸酯單體或構成含有該衍生物之(X)成分的單體所成的共聚物為佳。作為含有聚合性基之化合物,可舉出(甲基)丙烯醯氧基乙基異氰酸酯、對-異丙烯基-α,α-二甲基苯甲基異氰酸酯、(甲基)丙烯醯基異氰酸酯、烯丙基異氰酸酯、縮水甘油基(甲基)丙烯酸酯;(甲基)丙烯酸等。 The energy ray-curable adhesive polymer (XY) is, for example, an acrylic acid which will have a functional group such as a hydroxyl group, a carboxyl group, an amine group, a substituted amine group or an epoxy group. The adhesive polymer is obtained by reacting a polymerizable group-containing compound which has a substituent which reacts with the functional group, and has 1 to 5 energy rays per molecule. The polymerizable group of the carbon-carbon double bond contains a compound and is reacted. The acrylic adhesive polymer is composed of a (meth) acrylate monomer having a functional group such as a hydroxyl group, a carboxyl group, an amine group, a substituted amino group or an epoxy group, or a monomer constituting the (X) component containing the derivative. The copolymer is preferred. Examples of the polymerizable group-containing compound include (meth)acryloxyethyl isocyanate, p-isopropenyl-α,α-dimethylbenzyl isocyanate, and (meth)acryl decyl isocyanate. Allyl isocyanate, glycidyl (meth) acrylate, (meth) acrylic acid, and the like.

含有如上述之丙烯酸聚合物(X)及能量線硬化性化合物(Y)、或能量線硬化型黏著性聚合物(XY)的能量線硬化型黏著成分為藉由能量線照射可硬化者。作為能量線,具體可使用紫外線、電子線等。 The energy ray-curable adhesive component containing the above-described acrylic polymer (X), energy ray-curable compound (Y), or energy ray-curable adhesive polymer (XY) is curable by irradiation with an energy ray. As the energy ray, ultraviolet rays, electron wires, or the like can be specifically used.

作為光聚合起始劑,可舉出安息香化合物、苯乙酮化合物、醯基氧化膦化合物、茂鈦化合物、噻噸酮化合物、過氧化物化合物等光起始劑、胺或醌等光增感劑等,具體可例示出1-羥基環己基苯基酮、安息香、安息香甲基醚、安息香乙基醚、安息香異丙基醚、苯甲基二苯基硫化物、四甲基秋蘭姆單硫化物、偶氮二異丁腈、二苯甲基、二乙醯、β-氯蒽醌、2,4,6-三甲基苯甲醯基二苯基氧化膦等。作為能量線使用紫外線時,藉由添加光聚合起始劑可使照射時間、照射量減少。 The photopolymerization initiator may, for example, be a photoinitiator such as a benzoin compound, an acetophenone compound, a mercaptophosphine oxide compound, a titanocene compound, a thioxanthone compound or a peroxide compound, or an amine or an anthracene. And the like, specifically, 1-hydroxycyclohexyl phenyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl diphenyl sulfide, tetramethyl thiuram Sulfide, azobisisobutyronitrile, diphenylmethyl, diethyl hydrazine, β-chloropurine, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, and the like. When ultraviolet rays are used as the energy ray, the irradiation time and the irradiation amount can be reduced by adding a photopolymerization initiator.

黏著劑層之厚度並無特別限定,以1~20μm為佳,較佳為2~15μm,更佳為3~10μm之範圍。若黏著劑層之厚度在上述範圍時,可保持良好半導體晶圓,在擴展時可防止晶片或環圈框架之脫落。又,黏著劑層之厚度若在上述範圍時,可良好地進行半導體晶片之拾取步驟。 The thickness of the adhesive layer is not particularly limited, and is preferably 1 to 20 μm, more preferably 2 to 15 μm, still more preferably 3 to 10 μm. If the thickness of the adhesive layer is within the above range, a good semiconductor wafer can be maintained, and the wafer or the ring frame can be prevented from falling off when expanded. Further, when the thickness of the adhesive layer is within the above range, the semiconductor wafer picking step can be satisfactorily performed.

本發明之黏著薄片以全光線透過率85%以上、HAZE7%以下者為佳,以透過率90%以上、HAZE6%以下者為較佳。若黏著薄片在如此透過率時,因具有HAZE,故即使介著黏著薄片以雷射光照射半導體晶圓等,可使藉由破壞改質部的加工性變良好。 The adhesive sheet of the present invention preferably has a total light transmittance of 85% or more and HAZE of 7% or less, and preferably has a transmittance of 90% or more and HAZE of 6% or less. When the adhesive sheet has such a transmittance, HAZE is provided, and even if the semiconductor wafer or the like is irradiated with laser light through the adhesive sheet, the workability by breaking the modified portion can be improved.

又,於黏著劑層在使用前欲保護黏著劑層可層合剝離薄片。剝離薄片並無特別限定,例如可使用由聚乙烯對苯二甲酸乙二醇酯、聚丙烯、聚乙烯等樹脂所成的薄膜或彼等發泡薄膜或格拉辛紙、塗佈紙、層合紙等紙上以聚矽氧系、氟系、含有長鏈烷基之胺基甲酸酯等剝離劑進行剝離處理者。 Further, the adhesive layer may be laminated to remove the adhesive sheet before the adhesive layer is used. The release sheet is not particularly limited, and for example, a film made of a resin such as polyethylene terephthalate, polypropylene, or polyethylene, or a foamed film thereof, or a glass paper, a coated paper, or a laminate may be used. Paper or the like is subjected to a release treatment by a release agent such as a polyoxymethylene-based, fluorine-based or long-chain alkyl-containing urethane.

於基材的一面上設置黏著劑層的方法,可為將於剝離薄片上塗布至所定膜厚而形成之黏著劑層轉印製基材表面,亦可於基材表面上直接塗佈而形成黏著劑層。 The method of providing an adhesive layer on one side of the substrate may be a surface of the adhesive layer formed by applying the adhesive layer formed on the release sheet to a predetermined film thickness, or may be directly coated on the surface of the substrate. Adhesive layer.

〔晶片狀構件之製造方法〕 [Method of Manufacturing Wafer-Shaped Member]

其次,對於使用本發明之黏著薄片製造晶片狀構件之方法做說明。晶片狀構件之製造方法為具備於板狀構件之 一面上,貼合上述黏著薄片之步驟、介著貼合於板狀構件之黏著薄片,於板狀構件照射雷射光而形成改質部之步驟、藉由黏著薄片之擴展,分割板狀構件而晶片化後得到晶片狀構件之步驟。 Next, a description will be given of a method of manufacturing a wafer-like member using the adhesive sheet of the present invention. The method for manufacturing a wafer-shaped member is provided in a plate member a step of bonding the adhesive sheet on one side, an adhesive sheet bonded to the plate-like member, a step of irradiating the plate-shaped member to irradiate the laser light to form a modified portion, and dividing the plate-shaped member by the expansion of the adhesive sheet. The step of obtaining a wafer-like member after wafer formation.

以下對於本製造方法,其中板狀構件為半導體晶圓,將製造半導體晶片時的一例子參照圖2、3做詳細說明。 Hereinafter, in the present manufacturing method, the plate member is a semiconductor wafer, and an example of manufacturing a semiconductor wafer will be described in detail with reference to FIGS.

首先,於半導體晶圓14之表面上形成回路。半導體晶圓14可為矽晶圓,亦可為鎵.砒素等晶圓。對於晶圓表面之回路的形成可使用含有蝕刻法、提離法等過去泛用的方法之種種方法進行。晶圓14之研削前厚度並無特別限定,通常為500~1000μm程度。 First, a loop is formed on the surface of the semiconductor wafer 14. The semiconductor wafer 14 can be a germanium wafer or a gallium. Wafers and other wafers. The formation of the circuit on the surface of the wafer can be carried out by various methods including a conventional method such as an etching method or a lift-off method. The thickness of the wafer 14 before grinding is not particularly limited, and is usually about 500 to 1000 μm.

其次,將半導體晶圓14之裏面進行研削。於裏面研削時欲保護表面之回路,於回路面可貼合過去公知之黏著膠帶所構成之表面保護薄片。裏面研削為將晶圓14之回路面側(即表面保護薄片側)藉由夾盤桌等固定後,將未形成回路之裏面側藉由粉碎機進行研削。該結果為研削後之半導體晶圓14的厚度並無特別限定,通常為50~200μm程度。裏面研削步驟之後,可進行除去藉由研削所生成之破碎層的步驟。 Next, the inside of the semiconductor wafer 14 is ground. In order to protect the surface of the circuit during the grinding, the surface protection sheet of the conventionally known adhesive tape can be attached to the circuit surface. The inside grinding is performed by fixing the circuit surface side of the wafer 14 (i.e., the surface protective sheet side) by a chuck table or the like, and grinding the inner side of the unformed loop by a pulverizer. As a result, the thickness of the semiconductor wafer 14 after grinding is not particularly limited, and is usually about 50 to 200 μm. After the grinding step, the step of removing the fracture layer formed by the grinding may be performed.

接著裏面研削步驟之後,視必要於裏面可施予伴著蝕刻處理等發熱的加工處理,或對裏面之金屬膜蒸鍍、如有機膜之燒刻高溫下進行之處理。且進行在高溫之處理時,通常將表面保護薄片剝離後進行對裏面之處理。 After the grinding step is carried out, it is possible to apply a heat treatment such as an etching treatment to the inside, or to perform a high-temperature treatment on the metal film vapor deposition inside, such as an organic film. Further, when the treatment is carried out at a high temperature, the surface protective sheet is usually peeled off and then treated inside.

裏面研削後,於晶圓14之裏面將本發明的黏 著薄片10介著黏著劑層12進行貼合。且,在表面保護薄片貼合於晶圓表面之情況為,於黏著薄片10之貼合前或貼合後剝離表面保護薄片。對於黏著薄片10之晶圓裏面的貼合為,藉由稱為貼片機之裝置進行為一般,並無特別限定。通常半導體晶圓14為如圖2所示,貼合於黏著薄片10之中央區域10A,該中央區域10A之外側的外周區域10C之周緣部10B上貼合環圈框架13。環圈框架為支持後述各步驟中之黏著薄片者。 After grinding inside, the adhesive of the present invention is placed inside the wafer 14. The sheet 10 is bonded via the adhesive layer 12. Further, in the case where the surface protective sheet is bonded to the surface of the wafer, the surface protective sheet is peeled off before or after bonding of the adhesive sheet 10. The bonding of the inside of the wafer of the adhesive sheet 10 is generally performed by a device called a mounter, and is not particularly limited. As shown in FIG. 2, the semiconductor wafer 14 is bonded to the central portion 10A of the adhesive sheet 10, and the ring frame 13 is bonded to the peripheral portion 10B of the outer peripheral region 10C on the outer side of the central portion 10A. The loop frame is for supporting the adhesive sheet in each step described later.

其次,如圖2所示,自黏著薄片10之基材11側介著黏著薄片10,於晶圓14照射雷射光。照射雷射光之雷射光源15係為可產生合併波長及位相之光的裝置,作為雷射光之種類,可舉出產生脈衝雷射光之Nd-YAG雷射、Nd-YVO雷射、Nd-YLF雷射、鈦藍寶石雷射等引起多光子吸收者。雷射光之波長以800~1100nm為佳,以1064nm為更佳。 Next, as shown in FIG. 2, the adhesive sheet 10 is adhered to the substrate 11 side of the adhesive sheet 10, and the laser light is irradiated on the wafer 14. The laser light source 15 for irradiating the laser light is a device capable of generating light of a combined wavelength and phase. As the type of the laser light, an Nd-YAG laser, a Nd-YVO laser, and a Nd-YLF which generate pulsed laser light are exemplified. Lasers, titanium sapphire lasers, etc. cause multiphoton absorption. The wavelength of the laser light is preferably 800 to 1100 nm, and more preferably 1064 nm.

雷射光照射於晶圓內部,沿著切斷預定線,於晶圓內部形成改質部16。對於其中一切斷預定線以雷射光掃描的次數可為1次亦可為數次。較佳為監控雷射光之照射位置與回路間之切斷預定線的位置,一邊進行雷射光位置之合併一邊進行雷射光之照射。 The laser beam is irradiated onto the inside of the wafer, and a modified portion 16 is formed inside the wafer along the line to be cut. The number of times the laser beam is scanned for one of the cut lines may be one or several times. It is preferable to monitor the position of the line to be cut between the irradiation position of the laser light and the circuit, and to perform the irradiation of the laser light while combining the positions of the laser light.

藉由雷射光照射於晶圓內部形成改質部16後進行擴展。擴展並無特別限定,通常為自黏著薄片10之中心賦予向著面方向外側之拉力而進行者。更具體為,如圖3所示,可舉出安裝有複數半導體晶片之黏著薄片10 的中央區域10A、與於環圈框架13被支持之周緣部10B之間的區域之外周區域10C的一部份上,例如設置筒狀夾具20,將周緣部10B往向著重力方向進行拉伸使其降下的方法。 The reforming unit 16 is formed by irradiating the inside of the wafer with laser light and expanding. The expansion is not particularly limited, and it is usually carried out by applying a tensile force to the outside in the surface direction from the center of the adhesive sheet 10. More specifically, as shown in FIG. 3, an adhesive sheet 10 on which a plurality of semiconductor wafers are mounted is exemplified. For example, a cylindrical jig 20 is provided on a portion of the outer peripheral region 10C of the region between the central region 10A and the peripheral portion 10B supported by the loop frame 13, and the peripheral portion 10B is stretched toward the direction of gravity. The way it is lowered.

藉由該黏著薄片10之擴展,半導體晶圓11為將晶圓內部之改質部16作為起點切斷分離為各晶片18。又,可與擴展同時,將黏著薄片10自基材11側,使用夾具等進行刮擦,將晶圓10切斷分離成晶片18。擴展係以5~600mm/分之速度進行為佳。 By the expansion of the adhesive sheet 10, the semiconductor wafer 11 is cut and separated into wafers 18 by using the reforming portion 16 inside the wafer as a starting point. Further, at the same time as the expansion, the adhesive sheet 10 is scraped from the base material 11 side by a jig or the like, and the wafer 10 is cut and separated into the wafer 18. The extension is preferably performed at a speed of 5 to 600 mm/min.

其後,將往重力方向下降的周緣部10B上昇至恢復至原來位置之同時,將外周區域10C(更具體為周緣部10B與中央區域10A之間的區域)藉由未圖示之加熱手段進行加熱後,將對應該加熱區域的部分之黏著薄片經加熱收縮。藉由此步驟,可防止外周區域10C之鬆弛,貼合半導體晶片18之黏著薄片10被搬運至拾取裝置等時的搬送性不會下降。 Thereafter, the peripheral portion 10B that has descended in the direction of gravity is raised to return to the original position, and the outer peripheral region 10C (more specifically, the region between the peripheral portion 10B and the central region 10A) is heated by a heating means (not shown). After heating, the adhesive sheet corresponding to the portion to be heated is heat-shrinked. By this step, the slack in the outer peripheral region 10C can be prevented, and the conveyance property when the adhesive sheet 10 bonded to the semiconductor wafer 18 is transported to the pickup device or the like does not decrease.

其後,各晶片18藉由拾取裝置進行拾取,經由黏接步驟製造出半導體裝置。且,將黏著劑層12以能量線硬化型黏著劑形成時,於拾取步驟之前,欲使黏著劑之黏著力降低使晶片18的剝離更容易進行時照射能量線為佳。 Thereafter, each wafer 18 is picked up by a pick-up device, and a semiconductor device is manufactured through a bonding step. Further, when the adhesive layer 12 is formed of an energy ray-curable adhesive, it is preferable to irradiate the energy ray when the adhesion of the wafer 18 is made easier to be performed before the picking step.

以上對於本發明之黏著薄片的使用例做說明,但本發明之黏著薄片可使用於半導體晶圓以外,亦可使用於玻璃基板、陶瓷基板、FPC等有機材料基板、或將 精密零件等金屬材料等種種板狀構件經切割後得到各種晶片狀構件之方法。 Although the use example of the adhesive sheet of the present invention is described above, the adhesive sheet of the present invention can be used for a semiconductor wafer, or can be used for an organic material substrate such as a glass substrate, a ceramic substrate, or an FPC, or A method of obtaining various wafer-like members by cutting various plate-like members such as metal parts such as precision parts.

[實施例] [Examples]

以下依據實施例對本發明做更詳細說明,但本發明並未受到這些例子的限制。 The invention is illustrated in more detail below on the basis of the examples, but the invention is not limited by these examples.

本發明中之測定方法、評估方法如以下所示。 The measurement method and evaluation method in the present invention are as follows.

〔重量平均分子量(Mw)〕 [weight average molecular weight (Mw)]

對於使用於基材之丙烯酸共聚物,可藉由以下條件進行測定。 The acrylic copolymer used for the substrate can be measured by the following conditions.

裝置:Tosoh公司製HLC-8121GPC/HT Device: HLC-8121GPC/HT manufactured by Tosoh

管柱:Shodex GPC HT-806M×2 Column: Shodex GPC HT-806M×2

烤箱溫度:135℃ Oven temperature: 135 ° C

溶離液:二氯苯 Dissolution: Dichlorobenzene

又,對於使用於黏著劑組成物之丙烯酸聚合物,可藉由以下條件進行測定。 Further, the acrylic polymer used in the adhesive composition can be measured by the following conditions.

使用凝膠滲透層析法裝置(Tosoh公司股份有限公司製,製品名「HLC-8020」),以下述條件下進行測定,使用標準聚苯乙烯換算所測定之值。 Using a gel permeation chromatography apparatus (product name "HLC-8020" manufactured by Tosoh Corporation), the measurement was carried out under the following conditions, and the values measured by standard polystyrene conversion were used.

(測定條件) (measurement conditions)

.管柱:「TSK guard column HXL-H」「TSK gel GMHXL(×2)」「TSK gel G2000HXL」(皆為Tosoh公司股份有限公司製) . Column: "TSK guard column HXL-H" "TSK gel GMHXL (×2)” “TSK gel G2000HXL” (all manufactured by Tosoh Corporation)

.管柱溫度:40℃ . Column temperature: 40 ° C

.展開溶劑:四氫呋喃 . Developing solvent: tetrahydrofuran

.流速:1.0mL/min . Flow rate: 1.0mL/min

〔楊氏模量評估〕 [Young's modulus evaluation]

使用萬能型拉伸試驗機(Orientec公司製TENSILONRTA-T-2M),對於23℃ 50RH%環境下,以寬15mm、夾具間長度100mm之拉伸速度200mm/分下測定基材之拉伸強度及延伸,藉此得到楊氏模量。 Using a universal tensile tester (TENSILONRTA-T-2M manufactured by Orientec Co., Ltd.), the tensile strength of the substrate was measured at a tensile speed of 200 mm/min at a width of 15 mm and a length of 100 mm between the clamps at a temperature of 23 ° C in 50 RH%. Extend, thereby obtaining Young's modulus.

〔透過率評估〕 [Transmission rate assessment]

依據JIS 7361-1:1997,使用HAZE METER(日本電色工業公司製NDH-5000)測定黏著薄片之全光線透過率。 According to JIS 7361-1:1997, the total light transmittance of the adhesive sheet was measured using HAZE METER (NDH-5000, manufactured by Nippon Denshoku Industries Co., Ltd.).

〔HAZE評估〕 [HAZE assessment]

依據JIS 7136:2000,使用HAZE METER(日本電色工業公司製NDH-5000)測定黏著薄片之HAZE。 The HAZE of the adhesive sheet was measured using HAZE METER (NDH-5000, manufactured by Nippon Denshoku Industries Co., Ltd.) in accordance with JIS 7136:2000.

〔中心線平均粗糙度Ra〕 [Center line average roughness Ra]

中心線平均粗糙度Ra為使用股份有限公司三豐製SV-3000S4依據JIS B-6001進行測定。 The center line average roughness Ra was measured in accordance with JIS B-6001 using the SV-3000S4 manufactured by the company.

〔分割適性評估〕 [Segmentation suitability assessment]

於黏著薄片貼合矽晶圓及環圈框架,以下述分割條件下,介著黏著薄片照射雷射後於晶圓內部形成改質部。 The adhesive sheet is bonded to the wafer and the ring frame, and the modified portion is formed inside the wafer by irradiating the laser with the adhesive sheet under the following division conditions.

(分割條件) (segmentation condition)

雷射:Nd-YAG、波長:1064nm、重複頻率數:100kHz Laser: Nd-YAG, wavelength: 1064nm, repetition frequency: 100kHz

脈衝幅:30nm、加工速度:100mm/分、 矽晶圓:直徑200mm 、厚度10μm晶片尺寸:5mm×5mm Pulse width: 30nm, processing speed: 100mm / min, 矽 wafer: diameter 200mm , thickness 10μm wafer size: 5mm × 5mm

其後,使用擴展裝置(JCM製ME-300B),以拉落量25mm拉落黏著薄片之周緣部並進行擴展後使矽晶圓個片化。 Thereafter, using an expansion device (ME-300B manufactured by JCM), the peripheral portion of the adhesive sheet was pulled down by a pull amount of 25 mm and expanded to form a wafer.

(加工性評估) (Processability evaluation)

經個片化之晶片的截面使用數位顯微鏡(KEYENCE公司製VHX-1000)進行觀察,在一定間隔下,藉由雷射所形成的改質部為直線狀時評估為“A”,改質部之間隔為不均勻或連接改質部之線非直線時評估為“E”。 The cross section of the individualized wafers was observed using a digital microscope (VHX-1000 manufactured by KEYENCE Co., Ltd.), and the modified portion formed by the laser was evaluated as "A" at a certain interval, and the modified portion was evaluated. The interval is "E" when the interval is uneven or the line connecting the modified portion is non-linear.

(擴展性評估) (extensibility assessment)

又,將如上述之經個片化的晶片轉印製轉印薄片,以數位顯微鏡(KEYENCE公司製VHX-1000)測定晶片間 隔。晶片間隔為測定之任意9點所算出的平均值。 Further, the transfer sheet was transferred as described above to the wafer, and the inter-wafer was measured by a digital microscope (VHX-1000, manufactured by Keyence Corporation). Separate. The wafer interval is an average value calculated from any 9 points of the measurement.

(熱收縮性(HS性)評估) (heat shrinkage (HS) evaluation)

轉印晶片後,將成品(即貼合於環圈框架之黏著薄片)於加熱至50℃之加熱板(加熱面鐵製)上放置30秒,當黏著薄片之鬆弛完全解除時評估為“A”,鬆弛未解除或產生皺折時評估為“E”。 After the wafer was transferred, the finished product (that is, the adhesive sheet attached to the ring frame) was placed on a hot plate (heated surface iron) heated to 50 ° C for 30 seconds, and evaluated as "A" when the relaxation of the adhesive sheet was completely released. "E" is evaluated as "E" when the slack is not released or wrinkles are generated.

〔實施例1〕 [Example 1] (黏著劑組成物之製作) (Production of adhesive composition)

添加丙烯酸聚合物(構成單體比:丁基丙烯酸酯/丙烯酸=90/10(質量比)、重量平均分子量:60萬,以溶劑稀釋之濃度34質量%的稀釋液)34質量份、能量線聚合性化合物(6官能丙烯酸酯寡聚物,Mw=2000,以溶劑稀釋之濃度90質量%的稀釋液)30質量份、光聚合起始劑(BASF公司製「Irgacure184」)0.1質量份、環氧系交聯劑(TETRAD-C三菱氣體化學製)0.04質量份(皆為固體成分換算之份數),以溶劑稀釋後得到黏著劑組成物。 Addition of acrylic polymer (constituting monomer ratio: butyl acrylate / acrylic acid = 90/10 (mass ratio), weight average molecular weight: 600,000, dilution of solvent concentration of 34% by mass) 34 parts by mass, energy line 30 parts by mass of a polymerizable compound (6-functional acrylate oligomer, Mw=2000, a concentration of 90% by mass diluted with a solvent), a photopolymerization initiator ("Irgacure 184" manufactured by BASF Corporation), 0.1 part by mass, and a ring 0.04 parts by mass of oxygen-based crosslinking agent (manufactured by TETRAD-C Mitsubishi Gas Chemical Co., Ltd.) (all in terms of solid content), and diluted with a solvent to obtain an adhesive composition.

(基材之製作) (production of substrate)

將丁基丙烯酸酯(BA)與甲基甲基丙烯酸酯(MAA)以30:70之質量比下進行無規共聚合,各製作出重量平均分子量100萬之丙烯酸共聚物(A1)與重量平均分子量5萬之丙烯酸聚合物(A2),將這些以混合比率 10:90之比例下進行混合者,經押出成型而製膜下壓至壓花輥,得到厚度80μm之丙烯酸薄膜。該丙烯酸薄膜的一面(第1面)之中心線平均粗糙度Ra為0.281μm,另一面(第2面)之中心線平均粗糙度Ra為0.084μm。 The butyl acrylate (BA) and methyl methacrylate (MAA) were randomly copolymerized at a mass ratio of 30:70 to prepare an acrylic copolymer (A1) having a weight average molecular weight of 1,000,000 and a weight average. Acrylic polymer (A2) having a molecular weight of 50,000, which is a mixing ratio When the mixture was mixed at a ratio of 10:90, the film was pressed and formed into a film and pressed down to an embossing roll to obtain an acrylic film having a thickness of 80 μm. The center line average roughness Ra of one surface (first surface) of the acrylic film was 0.281 μm, and the center line average roughness Ra of the other surface (second surface) was 0.084 μm.

(黏著薄片之製作) (production of adhesive sheets)

將上述製作之黏著劑組成物塗布至剝離薄膜(SP-PET381031、Lintec Corporation製)上至乾燥後的厚度成為5μm,在80℃下進行1分鐘乾燥所形成之黏著劑層貼合於作為基材之丙烯酸薄膜,得到附有剝離薄片之黏著薄片。且,黏著劑層之貼合對第1面進行。 The adhesive composition prepared above was applied to a release film (SP-PET381031, manufactured by Lintec Corporation) to a thickness of 5 μm after drying, and an adhesive layer formed by drying at 80 ° C for 1 minute was applied as a substrate. The acrylic film is obtained as an adhesive sheet with a release sheet. Further, the bonding of the adhesive layer is performed on the first surface.

〔實施例2〕 [Example 2]

對於基材,除變更為將丁基丙烯酸酯與甲基甲基丙烯酸酯以30:70的質量比進行無規共聚合後得到重量平均分子量100萬之丙烯酸共聚物(A1)、與重量平均分子量5萬之丙烯酸共聚物(A2)以質量比20:80的比例下混合,將該混合物藉由押出成型進行製膜後得到厚度80μm之丙烯酸薄膜的點以外,實施與實施例1之相同方法。 For the substrate, except that the butyl acrylate and the methyl methacrylate were randomly copolymerized at a mass ratio of 30:70 to obtain an acrylic copolymer (A1) having a weight average molecular weight of 1,000,000, and a weight average molecular weight. The 50,000 acryl copolymer (A2) was mixed at a mass ratio of 20:80, and the same procedure as in Example 1 was carried out except that the mixture was formed by extrusion molding to obtain an acrylic film having a thickness of 80 μm.

〔實施例3〕 [Example 3]

對於基材,除變更為將丁基丙烯酸酯與甲基甲基丙烯酸酯以20:80的質量比進行無規共聚合所得之重量平均分子量100萬的丙烯酸共聚物(A1)與重量平均分子量5 萬的丙烯酸共聚物(A2)以質量比10:90的比例下混合,將該混合物藉由押出成型進行製膜後所得之厚度80μm的丙烯酸薄膜之點以外,實施與實施例1之相同方法。 For the substrate, an acrylic copolymer (A1) having a weight average molecular weight of 1,000,000 and a weight average molecular weight of 5 obtained by random copolymerization of butyl acrylate and methyl methacrylate at a mass ratio of 20:80 was used. The acrylic copolymer (A2) was mixed at a mass ratio of 10:90, and the mixture was molded in the same manner as in Example 1 except that the acrylic film having a thickness of 80 μm obtained by extrusion molding was used.

〔實施例4〕 [Example 4]

對於基材,除變更為將丁基丙烯酸酯與甲基甲基丙烯酸酯以20:80的質量比進行無規共聚合所得之重量平均分子量100萬的丙烯酸共聚物(A1)與重量平均分子量5萬的丙烯酸共聚物(A2)以質量比20:80的比例下混合,將該混合物藉由押出成型進行製膜後所得之厚度80μm的丙烯酸薄膜之點以外,實施與實施例1之相同方法。 For the substrate, an acrylic copolymer (A1) having a weight average molecular weight of 1,000,000 and a weight average molecular weight of 5 obtained by random copolymerization of butyl acrylate and methyl methacrylate at a mass ratio of 20:80 was used. The acrylic copolymer (A2) was mixed at a mass ratio of 20:80, and the mixture was molded in the same manner as in Example 1 except that the acrylic film having a thickness of 80 μm obtained by extrusion molding was used.

〔比較例1〕 [Comparative Example 1]

對於丙烯酸薄膜,除變更為構成單體比為伸乙基/甲基丙烯酸=91/9(質量比)之厚度80μm的EMAA(伸乙基甲基丙烯酸共聚物樹脂)薄膜之點以外,實施與實施例1之相同方法。 For the acrylic film, except that it is changed to a film having an EMAA (extended ethyl methacrylic acid copolymer resin) film having a thickness of 80 μm which is a monomer/ethyl methacrylate = 91/9 (mass ratio), The same method as in Example 1.

〔比較例2〕 [Comparative Example 2]

對於丙烯酸薄膜,除變更為EVA(伸乙基乙酸乙烯基共聚物樹脂)薄膜(郡是股份有限公司製「Fan ClaireLEB」、厚度120μm)之點以外,實施與實施例1 之相同方法。 Example 1 was carried out except that it was changed to an EVA (Ethyl Acetate Vinyl Copolymer Resin) film (Fan Claire LEB, manufactured by Kokusai Co., Ltd., thickness: 120 μm). The same method.

〔比較例3〕 [Comparative Example 3]

將實施例1的丙烯酸薄膜變更為PVC薄膜(二乙基己基鄰苯二甲酸酯添加量25質量%,厚度80μm)之點以外,實施與實施例1之相同方法。 The same method as in Example 1 was carried out except that the acrylic film of Example 1 was changed to a PVC film (the amount of diethylhexyl phthalate added was 25% by mass and the thickness was 80 μm).

〔比較例4〕 [Comparative Example 4]

將實施例1的丙烯酸薄膜變更為厚度80μm之PP(聚丙烯)薄膜之點以外,實施與實施例1之相同方法。 The same method as in Example 1 was carried out except that the acrylic film of Example 1 was changed to a PP (polypropylene) film having a thickness of 80 μm.

對於以上的實施例及比較例之基材、黏著薄片的測定結果、及評估結果如表1所示。 The measurement results of the base material and the adhesive sheet of the above Examples and Comparative Examples and the evaluation results are shown in Table 1.

由以上實施例1~4得知,藉由將基材由烷基碳數為4~8之烷基(甲基)丙烯酸酯(a),與烷基碳數為1~3之烷基(甲基)丙烯酸酯(b)的共聚物之丙烯酸共聚物(A)所構成,基材之伸展性及熱收縮性變的良好。因此,藉由擴展可使晶片間隔變的充分廣,可適切地解除藉由熱收縮之擴展所產生之鬆弛。又,基材由丙烯酸 共聚物(A)所構成時,可使透過率或HAZE變為良好值,故藉由雷射加工可高精度下形成改質部。且基材的楊氏模量為適切值,具有優良機械強度與耐阻塞性。 It is known from the above Examples 1 to 4 that the substrate is composed of an alkyl (meth) acrylate (a) having an alkyl group having 4 to 8 carbon atoms and an alkyl group having an alkyl group having 1 to 3 carbon atoms ( The acrylic copolymer (A) of the copolymer of methyl)acrylate (b) is excellent in the stretchability and heat shrinkability of the substrate. Therefore, the spread of the wafer can be sufficiently wide by expansion, and the slack generated by the expansion of the heat shrinkage can be appropriately released. Also, the substrate is made of acrylic When the copolymer (A) is formed, the transmittance or HAZE can be made a good value, so that the modified portion can be formed with high precision by laser processing. Moreover, the Young's modulus of the substrate is a suitable value, and has excellent mechanical strength and blocking resistance.

另一方面,於基材使用丙烯酸共聚物(A)以外之比較例1~4中,基材的擴展性、熱收縮性、雷射透過性中任一項皆非良好者,於板狀構件照射雷射光形成改質部,分割板狀構件使其晶片化時所使用的黏著薄片並未能發揮其優良性能。 On the other hand, in Comparative Examples 1 to 4 except for using the acrylic copolymer (A) for the substrate, any of the substrate's expandability, heat shrinkability, and laser permeability was not good, and the plate member was used. The laser beam is irradiated to form the reforming portion, and the adhesive sheet used for dividing the plate member to be waferized does not exhibit its excellent performance.

Claims (14)

一種黏著薄片,其特徵為使用於於板狀構件照射雷射光形成改質部,分割前述板狀構件使其晶片化時的黏著薄片,其為具備基材與設置於前述基材的一面之黏著劑層,前述基材係由含有作為主成分的丙烯酸共聚物(A)之丙烯酸薄膜所成者,該丙烯酸共聚物(A)為烷基之碳數為4~8的烷基(甲基)丙烯酸酯(a)、與烷基之碳數為1~3的烷基(甲基)丙烯酸酯(b)的共聚物。 An adhesive sheet characterized in that the sheet-like member is irradiated with laser light to form a modified portion, and the adhesive sheet is formed by dividing the sheet-shaped member into a wafer, and the adhesive sheet is provided with a substrate and a surface provided on the substrate. In the agent layer, the substrate is composed of an acrylic film containing an acrylic copolymer (A) as a main component, and the acrylic copolymer (A) is an alkyl group having an alkyl group having 4 to 8 carbon atoms (methyl group). A copolymer of an acrylate (a) and an alkyl (meth) acrylate (b) having an alkyl group having 1 to 3 carbon atoms. 如請求項1之黏著薄片,其中丙烯酸共聚物(A)為將烷基(甲基)丙烯酸酯(a)與烷基(甲基)丙烯酸酯(b)以質量比10:90~40:60進行共聚合者。 The adhesive sheet of claim 1, wherein the acrylic copolymer (A) is a ratio of alkyl (meth) acrylate (a) to alkyl (meth) acrylate (b) in a mass ratio of 10:90 to 40:60. Co-aggregation. 如請求項1或2之黏著薄片,其中前述丙烯酸共聚物(A)為無規共聚物。 The adhesive sheet of claim 1 or 2, wherein the aforementioned acrylic copolymer (A) is a random copolymer. 如請求項1~3中任一項之黏著薄片,其中丙烯酸共聚物(A)為混合重量平均分子量為60萬以上之丙烯酸共聚物(A1)、與重量平均分子量為40萬以下之丙烯酸共聚物(A2)而得者。 The adhesive sheet according to any one of claims 1 to 3, wherein the acrylic copolymer (A) is an acrylic copolymer (A1) having a weight average molecular weight of 600,000 or more, and an acrylic copolymer having a weight average molecular weight of 400,000 or less. (A2) is the winner. 如請求項4之黏著薄片,其中丙烯酸共聚物(A1)與丙烯酸共聚物(A2)之混合比率以質量比表示為5:95~35:65。 The adhesive sheet of claim 4, wherein a mixing ratio of the acrylic copolymer (A1) to the acrylic copolymer (A2) is represented by a mass ratio of 5:95 to 35:65. 如請求項1~5中任一項之黏著薄片,其中烷基(甲基)丙烯酸酯(a)為烷基的碳數為4~8之烷基丙烯酸酯的同時,烷基(甲基)丙烯酸酯(b)為烷基的碳數 為1~3之烷基甲基丙烯酸酯。 The adhesive sheet according to any one of claims 1 to 5, wherein the alkyl (meth) acrylate (a) is an alkyl acrylate having an alkyl group having 4 to 8 carbon atoms, and an alkyl group (methyl) Acrylate (b) is the carbon number of the alkyl group It is an alkyl methacrylate of 1 to 3. 如請求項6之黏著薄片,其中烷基(甲基)丙烯酸酯(a)為丁基丙烯酸酯,烷基(甲基)丙烯酸酯(b)為甲基甲基丙烯酸酯。 The adhesive sheet of claim 6, wherein the alkyl (meth) acrylate (a) is a butyl acrylate and the alkyl (meth) acrylate (b) is a methyl methacrylate. 如請求項1~7中任一項之黏著薄片,其中前述基材的楊氏模率為50~500MPa。 The adhesive sheet according to any one of claims 1 to 7, wherein the substrate has a Young's modulus of 50 to 500 MPa. 如請求項1~8中任一項之黏著薄片,其中與前述基材的一面為反側的面之中心線平均粗度Ra為0.1μm以下。 The adhesive sheet according to any one of claims 1 to 8, wherein a center line average roughness Ra of a surface opposite to one surface of the base material is 0.1 μm or less. 如請求項1~9中任一項之黏著薄片,其中前述基材的一面的中心線平均粗度Ra為0.15μm以上。 The adhesive sheet according to any one of claims 1 to 9, wherein a center line average roughness Ra of one surface of the substrate is 0.15 μm or more. 如請求項1~10中任一項之黏著薄片,其中全光線透過率為85%以上,HAZE為7%以下。 The adhesive sheet according to any one of claims 1 to 10, wherein the total light transmittance is 85% or more and the HAZE is 7% or less. 如請求項1~11中任一項之黏著薄片,其中前述黏著劑層係由丙烯酸系黏著劑所形成。 The adhesive sheet according to any one of claims 1 to 11, wherein the adhesive layer is formed of an acrylic adhesive. 一種晶片狀構件之製造方法,其特徵為具備下述步驟者;於板狀構件的一面上,貼合如請求項1~12中任一項之黏著薄片的步驟、介著貼合於前述板狀構件之黏著薄片,於前述板狀構件照射雷射光而形成改質部之步驟、藉由前述黏著薄片之擴展,分割前述板狀構件而晶片化後得到晶片狀構件之步驟。 A method for producing a wafer-like member, comprising the steps of: adhering an adhesive sheet according to any one of claims 1 to 12 to one side of the plate member; The adhesive sheet of the member is a step of irradiating the laser beam to form a modified portion, and the step of dividing the plate member by the expansion of the adhesive sheet to obtain a wafer-like member. 如請求項13之晶片狀構件之製造方法,其中進 一步具備前述晶片狀構件貼合於黏著薄片之中央區域,將前述中央區域之外側區域的黏著薄片之外周區域進行加熱使其收縮的步驟。 A method of manufacturing a wafer-shaped member according to claim 13, wherein The step of attaching the wafer-shaped member to the central region of the adhesive sheet and heating the outer peripheral region of the adhesive sheet in the outer region of the central portion to shrink the film.
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