TW201600924A - Pellicle mount apparatus - Google Patents

Abstract

A pellicle mount apparatus includes a bonding unit that includes: a bonding chamber at which bonding of a pellicle and an original plate is performed, the pellicle including a pellicle film and a pellicle frame, the pellicle frame supporting the pellicle film at a side of one end face in a thickness direction of the pellicle frame, having a groove formed at the other end face in the thickness direction of the pellicle frame, and having a through-hole passing between an outer peripheral face of the pellicle frame and a wall surface of the groove, and the original plate having a light irradiation face onto which exposure light is irradiated; and an evacuation tube for evacuating the inside of the groove via the through-hole of the pellicle frame in a state in which the pellicle and the original plate are arranged in the bonding chamber such that the other end face of the pellicle frame and the light irradiation face oppose each other.

Description

Dust-proof film mounting device

The present invention relates to a pellicle assembly mounting device.

The high integration and miniaturization of semiconductor devices (semiconductor devices) are accelerating year by year. For example, a pattern having a line width of about 45 nm is formed by excimer exposure. However, in recent years, with the further miniaturization of semiconductor devices, it has been required to form a pattern having a line width of 32 nm or less. It is difficult to cope with such microfabrication by existing excimer exposure. Therefore, it is being studied to replace the exposure light with a shorter wavelength Ultra Light Violet (EUV) light.

EUV light has characteristics that are easily absorbed by all substances. Therefore, in photolithography (hereinafter also referred to as "EUV lithography") using EUV light as exposure light, exposure is performed using a reflection optical system. Specifically, the EUV light is reflected by the original plate (mask) reflecting the exposure pattern, and the resist is exposed by EUV light as reflected light. At this time, if foreign matter adheres to the original plate, the EUV light is absorbed by the foreign matter or the EUV light is scattered, so that the desired pattern cannot be exposed. Therefore, the EUV light-irradiating surface of the original plate is protected by a pellicle, and specifically, the pellicle is mounted (mounted) on the EUV light-irradiating side of the original plate. The pellicle is configured to have a pellicle film for protecting the EUV light-irradiating surface of the original plate, and a pellicle frame for supporting the pellicle.

As a dustproof film used for EUV lithography, it is required to have high permeability to EUV light, and it is not decomposed and deformed by irradiation of EUV light. As a pellicle film which satisfies such a requirement, a ruthenium crystal film such as a single crystal ruthenium film (for example, Reference 1 and Document 2), an aluminum nitride film laminated on a metal mesh (for example, Reference 3), and graphene are proposed. A film (for example, Reference 4) or the like.

[Patent 1] Japanese Patent Laid-Open No. 2010-256434 [Document 2] Japanese Patent Laid-Open Publication No. 2009-116284 (Document No. 3) Japanese Patent Laid-Open No. 2005-43895 (Document 4) International Publication No. 2011/160861 Bulletin

[Problems to be solved by the invention]

In addition, when the pellicle module including the pellicle film and the pellicle frame is included in the original plate, which is the pellicle for EUV lithography, the pell film assembly and the original plate are sometimes attached. The film surface of the pellicle film is contacted by a device, a jig, a hand, or the like. However, the pellicle film has a property of being easily broken, and therefore it is required to pay careful attention to the treatment of the pellicle film. In the pellicle film, a pellicle film containing an inorganic material (for example, the pellicle film described in Documents 1 to 4) is not only a film that is difficult to be self-supporting, but also a film that is damaged or dusted by mechanical contact. Therefore, further attention is required in its processing. Further, in order to prevent the foreign matter from adhering to the pellicle film, it is required to further pay attention to the miniaturization of the semiconductor device.

From the above point of view, the industry is attaching (installing) the pellicle assembly to the original plate by attaching the pellicle and the original plate, and avoiding the contact of the device, the jig, the hand, etc. with the film surface of the pellicle. The combined pellicle assembly mounting device was studied.

The present invention has been made in view of the above, and it is an object of the present invention to achieve the following objects. That is, an object of the present invention is to provide a method in which the pellicle film assembly is mounted (mounted) on the original plate by bonding the pellicle film assembly and the original plate, and the film surface of the pellicle film can be avoided as much as possible. Fitted pellicle assembly mounting device. [Means for solving the problem]

Specific means for solving the problem are as follows. <1> A pellicle assembly mounting device comprising a bonding unit, the bonding unit comprising: a bonding chamber for bonding a pellicle film to an original plate having a light irradiation surface that can be irradiated with exposure light, The pellicle comprises a pellicle film and a pellicle frame, the pellicle frame supporting the pellicle on the side of one end face in the thickness direction, and having a groove disposed at the other end face in the thickness direction and penetrating the periphery a through hole between the surface and the wall surface of the groove; and an exhaust pipe for the other end surface of the pellicle frame and the light irradiation surface on the pellicle assembly and the original plate The inside of the groove is exhausted through the through hole of the pellicle frame in a state in which the opposing manner is disposed in the bonding chamber.

<2> The pellicle assembly mounting apparatus according to <1>, wherein the bonding unit includes an introduction tube for introducing a gas into the bonding chamber to pressurize the bonding chamber. The pellicle assembly mounting device according to the above aspect, wherein the introduction pipe includes a first introduction pipe, and the first introduction pipe is from the pellicle assembly disposed in the bonding chamber and The pellicle film in the original plate introduces gas to the side, and the bonding unit further includes a gas dispersing member for dispersing a gas introduced from the first introduction pipe. The pellicle assembly mounting device according to any one of <1>, wherein the bonding unit includes a communication member in the fitting chamber and the exhaust gas One end of the tube is connected, and the exhaust pipe is communicated with the through hole of the pellicle frame. <5> The pellicle assembly mounting device according to <4>, wherein the communication member is provided to be movable in a direction of being pushed into an outer peripheral surface of the pellicle frame. <6> The pellicle assembly mounting device according to <4>, wherein the communication member has an open end insertable into the through hole.

The pellicle assembly mounting device according to any one of <1>, wherein the bonding unit includes a master supporting member, and the master supporting member supports and houses in the fitting chamber The light-irradiating surface of the original plate is a peripheral end portion of the surface on the opposite side and at least a part of the outer peripheral surface of the original plate, and a central portion of the surface on the opposite side is not supported. The pellicle assembly mounting device according to any one of the above aspects, wherein the original plate is housed in a master casing and carried into the fitting chamber, the original casing having An opening that exposes the light-irradiating surface of the original plate, and supports at least a part of a peripheral end portion of a surface opposite to the light-irradiating surface of the original plate and an outer peripheral surface of the original plate, and does not support the opposite side In the central portion of the surface, the bonding unit includes a master housing supporting member that supports the master housing that houses the original plate in the bonding chamber. The pellicle assembly mounting apparatus according to any one of the above aspects, further comprising an inspection unit that performs an appearance inspection on the bonded pellicle assembly and the original plate.

The pellicle assembly mounting apparatus according to any one of the above aspects, comprising: the first measuring member, the dustproof member of the pellicle assembly before bonding with the original plate The shape of the film module frame is measured; and the second measuring member measures the shape of the pellicle frame of the pellicle film bonded to the original plate. <11> The pellicle assembly mounting device according to <10>, comprising: an alignment member that performs alignment of the original plate and the pellicle assembly before bonding the original plate and the pellicle assembly And a control member based on the measurement result of the shape of the pellicle frame before the bonding and the measurement result of the shape of the pellicle frame after the bonding, and the use of the alignment member Alignment for feedforward control. <12> The pellicle assembly mounting device according to <10>, comprising: a calculation member that is based on a measurement result of a shape of the pellicle frame before the bonding and the bonded portion The amount of measurement of the shape of the pellicle frame is determined by the difference between the measurement results of the pellicle frame. <13> The pellicle assembly mounting device according to <12>, wherein the bonding unit includes a communication member that is connected to one end of the exhaust pipe in the fitting chamber, and is provided The exhaust pipe communicates with the through hole of the pellicle frame, and is disposed to be movable in a direction of pushing into an outer peripheral surface of the pellicle frame, and the calculating component is based on the strain amount And a control member that performs feedforward control on the amount of pushing of the pellicle frame caused by the communicating member. [Effects of the Invention]

According to the present invention, when the pellicle assembly is mounted (mounted) on the original plate by bonding the pellicle assembly and the original plate, the two can be attached while avoiding contact with the film surface of the pellicle film as much as possible. Dust-proof film assembly mounting device.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings as appropriate. However, the present invention is not limited to the specific embodiments such as the drawings. In addition, the same reference numerals are attached to the elements common to the respective drawings, and the overlapping description will be omitted. Further, in the drawings, in order to easily observe the structure, there is a case where a part of the hidden line is omitted.

The pellicle assembly mounting device of the present embodiment includes a bonding unit including a bonding chamber and an exhaust pipe for illuminating the pellicle and the light having the exposure light The pellicle is provided with a pellicle and a pellicle frame, the pellicle frame supporting the pellicle on the side of one end face in the thickness direction, and having another set in the thickness direction a groove of the end surface and a through hole penetrating between the outer peripheral surface and the wall surface of the groove, the exhaust pipe being used for the pellicle assembly and the original plate to be the other end face of the pellicle frame The inside of the groove is exhausted through the through hole of the pellicle frame in a state in which it is disposed in the bonding chamber so as to face the light irradiation surface.

The pellicle film assembly of the present embodiment includes a pellicle film and a pellicle frame. The pellicle frame supports a pellicle film on the side of one end face in the thickness direction. The pellicle frame has a groove provided at the other end face in the thickness direction thereof. Further, the pellicle frame has a through hole penetrating between the outer peripheral surface thereof and the wall surface of the groove. Further, in the bonding unit of the present embodiment, the pellicle film and the original plate are disposed in such a manner that the other end surface of the pellicle frame is opposed to the light irradiation surface of the original plate, and the exhaust pipe is passed through the exhaust pipe. The through hole of the pellicle frame is vented to the inside of the groove. Thereby, the pressing force can be exerted between the pellicle frame of the pellicle and the original. Therefore, it is possible to avoid bonding (by a device, a jig, a hand, etc.) to the film surface of the pellicle film as much as possible. Therefore, according to the pellicle assembly mounting apparatus of the present embodiment, the film surface of the pellicle film can be prevented from being contacted as much as possible when the pellicle film assembly is mounted (mounted) on the original plate by bonding the pellicle film assembly and the original plate. In the case of the two together. Further, in the present embodiment, the "compression force" has the same meaning as the suction force.

In the present specification, the result of bonding the pellicle assembly to the original plate (that is, the original plate on which the pellicle is mounted) is also referred to as "the original plate with the pellicle assembly" or the "exposure original". The pellicle mounting device of the present embodiment may also be referred to as a "manufacturing device for a master with a pellicle film assembly" or a "manufacturing device for exposing a master."

Further, according to the pellicle assembly mounting apparatus of the present embodiment, it is possible to suppress the adhesion of the foreign matter to the pellicle film or the breakage of the pellicle film due to contact with the film surface of the pellicle film assembly when the pellicle film assembly and the original plate are bonded.

Further, in recent years, with the miniaturization of semiconductor devices, the demand for suppressing the adhesion of foreign matter to the pellicle film assembly has become stronger. In addition, the pattern formation of a line width of 32 nm or less can be performed, for example, by EUV lithography. The dust-proof film containing an inorganic material used for EUV lithography tends to be less likely to stand up than a dust-proof film containing an organic material, and is also liable to cause damage or dusting due to mechanical contact. Therefore, when the pellicle film assembly including the pellicle film containing the inorganic material is mounted on the original plate, the requirement for attaching the pellicle film assembly when the film surface of the pellicle film is contacted as much as possible is high. Here, "self-standing" means that the film shape can be maintained separately. According to the pellicle assembly mounting apparatus of the present embodiment, it is possible to cope with these requirements accompanying the miniaturization of the semiconductor device. Specifically, the pellicle assembly mounting apparatus of the present embodiment is particularly suitable for mounting a lithography dustproof film assembly using exposure light having a short wavelength (for example, EUV light, light having a shorter wavelength than EUV light, etc.) Mounted in the original, it is suitable for mounting (mounting) a pellicle having a pellicle film containing an inorganic material to the original plate.

In the present embodiment, the term "Extreme Ultra Violet (EUV) light" refers to light having a wavelength of 5 nm to 30 nm. The wavelength of the EUV light is preferably from 5 nm to 13.5 nm. In the present embodiment, the EUV light and the light having a shorter wavelength than the EUV light are collectively referred to as "EUV light or the like".

In the present embodiment, the "end surface in the thickness direction" of the pellicle frame is simply referred to as "end surface". In the present embodiment, the term "one end surface and the other end surface in the thickness direction" means, of course, the other of the end faces in the thickness direction and the other end faces in the thickness direction.

Further, in the present embodiment, the pellicle film assembly and the original plate are disposed in the bonding chamber such that the other end surface of the pellicle frame (the end surface on which the groove is provided) faces the light irradiation surface of the original plate. Here, in the pellicle frame of the present embodiment, the groove may be provided not only on the other end surface (opposing surface of the original plate) but also on one end surface (opposing surface of the pell film) (ie, The through hole communicates with the groove). In other words, the pellicle frame of the present embodiment may have the grooves (that is, the grooves that communicate with the through holes) in both the one end surface and the other end surface in the thickness direction. The present invention has an advantage in that a pellicle film assembly including a pellicle frame having the groove in both the one end surface and the other end surface in the thickness direction can be manufactured while avoiding contact with the film surface of the pellicle film as much as possible. The reason for this is that the groove on the one end surface side of the opposing surface of the pellicle film can be exhausted (decompressed) via the through hole. The detailed mechanism and the matte ply membrane assembly are the same as those of the original. A specific example to be described later is mainly described in the case where the pellicle is bonded to the original plate, and the pellicle comprises a pellicle frame having the groove in both the one end surface and the other end face in the thickness direction. However, the groove may be provided on at least the other end surface of the pellicle frame (opposing surface of the original plate).

Further, the pellicle film assembly of the present embodiment may be a frame including only a pellicle film and a pellicle film member, and may have other elements as needed. Other elements include an adhesive layer disposed in contact with the other end surface of the pellicle frame (the opposing surface of the original plate), and an adhesive layer disposed between the pell film and the pellicle frame. A support substrate or the like that is in contact with a dustproof film disposed between the pellicle film and the pellicle frame.

In addition, the original plate (mask) in the present embodiment is not particularly limited as long as it has a light irradiation surface that can be irradiated with light. Here, as the master, for example, a master (mask) including a support substrate, a reflective layer laminated on the support substrate, and an absorber layer formed on the reflective layer can be used. In the original plate, the surface on the side where the reflection layer and the absorber layer are provided becomes a light irradiation surface. By absorbing a part of EUV light or the like by the absorber layer, a desired image can be formed on the sensing substrate (for example, a semiconductor substrate with a photoresist film). The reflective layer can be a multilayer film of molybdenum (Mo) and bismuth (Si). The absorber layer may be a highly absorptive material such as EUV light such as chromium (Cr) or tantalum nitride.

Further, in the present embodiment, it is preferable that the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber to pressurize the bonding chamber. Since the introduction tube can pressurize the inside of the bonding chamber, the difference between the pressure of the entire environment in which the pellicle assembly and the original plate is disposed and the pressure inside the groove (differential pressure) can be further increased. Therefore, the pressing force generated between the pellicle and the original can be further increased, and the two can be more easily attached.

Further, in the present embodiment, it is preferable that the introduction pipe includes a first introduction pipe, and the first introduction pipe is from the pellicle assembly disposed in the bonding chamber and the original plate The pellicle is introduced with gas to the side, and the bonding unit further includes a gas dispersing member for dispersing a gas introduced from the first introduction pipe. In this aspect, the influence of the flow of the gas introduced through the first introduction tube on the pellicle film is reduced.

In the case where the introduction pipe includes the first introduction pipe, the introduction pipe may include a second introduction pipe which is another introduction pipe other than the first introduction pipe, in addition to the first introduction pipe.

In the embodiment, it is preferable that the bonding unit includes a communication member, the communication member is connected to one end of the exhaust pipe in the bonding chamber, and the exhaust pipe and the dustproof film are The through holes of the component frame are in communication. Thereby, when the inside of the groove is exhausted through the through hole of the pellicle frame, the efficiency of the exhaust can be further improved.

The shape of the communicating member may be any shape as long as it can connect the exhaust pipe to the through hole. The shape of the communication member is, for example, a shape having an open end that is in contact with the outer peripheral surface of the pellicle frame, and the diameter of the open end is larger than the diameter of the through hole. In this case, it is easier to align the open end of the communication member with the position of the through hole. Further, as the shape of the communicating member, a shape having an opening end having a diameter smaller than the diameter of the through hole may be cited. In this case, the open end can be inserted into the through hole, so that the open end of the communicating member and the through hole can be connected more securely.

As described above, as the shape of the communication member, for example, a shape having an open end that can be inserted into the through hole of the pellicle frame can be cited. In this case, the open end of the connecting member and the through hole can be connected more securely. As an example of the above, an example in which the through hole of the pellicle frame has a tapered shape that increases in diameter toward the outer peripheral surface of the pellicle frame, and the connecting member has an insertable shape. The open end of the tapered shape of the tapered through hole.

Further, the communication member is preferably provided to be movable in a direction of being pushed into the outer peripheral surface of the pellicle frame. Thereby, the connecting member and the pellicle frame can be connected more securely. Further, even when the pellicle frame is strain-deformed in the exhaust direction by exhausting the inside of the groove through the through hole of the pellicle frame, the pellicle can be pushed in by using the communicating member in advance. The outer peripheral surface of the component frame is used to suppress (correct) the strain deformation of the pellicle frame. Further, in this case, of course, the communication member may be provided not only to move in the direction of pushing into the outer peripheral surface of the pellicle frame, but also to move in the opposite direction (return direction; that is, a method away from the outer peripheral surface). .

Further, in the present embodiment, it is preferable that the bonding unit includes a master supporting member that supports a peripheral end of a surface opposite to a light irradiation surface of the original plate in the bonding chamber. At least a part of the outer peripheral surface of the portion and the original plate does not support the central portion of the surface on the opposite side. In this aspect, the master and the pellicle can be bonded together without being in contact with the central portion of the surface on the opposite side of the original light irradiation surface. The peripheral end portion of the face on the opposite side is preferably a region within 5 mm (more preferably within 3 mm) from the circumferential end of the face on the opposite side.

In the present specification, the original light irradiation surface may be referred to as the "front surface" of the original. In addition, in this specification, the surface opposite to the light irradiation surface of the original plate may be called the "back surface" of the original.

The aspect in which the fitting unit comprises the original supporting member is particularly suitable for the case where the original is an EUV original (EUV mask) used for EUV lithography. That is, in the EUV exposure apparatus used in EUV lithography, when the original plate is fixed in the exposure apparatus, unlike the conventional chuck method, the back surface of the original plate is directly in contact with the mask platform by the electrostatic chuck method. The method is fixed. Therefore, the inventors of the present invention have found that when foreign matter adheres to the central portion of the back surface of the original plate, the flatness of the original plate is impaired due to the unevenness of the foreign matter, and normal exposure cannot be performed. In this aspect, in the aspect in which the bonding unit includes the master supporting member, the original plate and the pellicle can be bonded without contacting the center portion of the back surface of the original plate, so that the foreign matter faces the center portion of the back surface of the original plate. The adhesion is suppressed.

Further, in the present embodiment, it is preferable that the original plate is housed in the original casing and carried into the bonding chamber, and the original casing has an opening for exposing the light irradiation surface of the original plate, and supports The peripheral end portion of the surface opposite to the light irradiation surface of the original plate and at least a portion of the outer peripheral surface of the original plate and the central portion of the surface not supporting the opposite side, the bonding unit including the original case support The member, the master housing support member supports the original housing housing the original plate in the fitting chamber. Also in this aspect, the same effect as the aspect in which the bonding unit includes the original supporting member is exerted. The preferred range of the central portion and the preferred range of the peripheral end portion in the aspect are the same as the preferred range of the central portion and the preferred range of the peripheral end portion of the aspect in which the bonding unit includes the original supporting member. .

As the original casing, a part of a known mask casing can also be used. For example, as a known mask case, an EUV mask or the like can be cited. As a part of the mask case which can be used as the master case, a cover member including an inner pod of the bottom plate and the cover member is exemplified. For the EUV mask box, the internal mask box, the cover member, and the like, for example, the International Publication No. 2013/186929 manual or the like can be appropriately referred to.

Preferably, the pellicle assembly mounting device according to the present embodiment further includes an inspection unit that performs visual inspection of the pellted film assembly and the original plate after the bonding. For the visual inspection, the inspection of the foreign matter attached to at least one of the pellicle and the original plate, the measurement of the shape of the pellicle frame, and the measurement of the misalignment of the pellicle frame and the original plate are exemplified. Further, the "alignment" of the pellicle frame and the original plate may be referred to as "coincidence".

The pellicle assembly mounting apparatus according to the present embodiment preferably includes a first measuring member and a second measuring member, and the first measuring member is the pellicle assembly of the pellicle assembly before bonding with the original plate. The shape of the frame was measured, and the second measuring member measures the shape of the pellicle frame of the pellicle film bonded to the original plate. In this aspect, the presence or absence of deformation of the pellicle frame caused by the bonding (especially the exhaust inside the groove of the pellicle frame) and the amount of deformation can be investigated.

In the case where the pellicle assembly mounting apparatus of the present embodiment includes the first measuring member and the second measuring member, the pellicle assembly mounting device of the present embodiment preferably includes an alignment member and a control member, and the alignment member is provided Aligning the original plate with the pellicle assembly before the original plate and the pellicle assembly are attached, the control member is based on the measurement result of the shape of the pellicle frame before the bonding The result of measurement of the shape of the bonded pellicle frame is subjected to feedforward control by alignment of the alignment member. In this aspect, the deformation of the pellicle frame caused by the bonding is predicted by the control member, and the alignment deviation (position misalignment) caused by the deformation is reduced in advance (preferably the minimum The way to control the alignment of the pellicle assembly with the alignment member with the original. In this aspect, the control member may be omitted, and the adjustment of the alignment by the alignment member may be manually performed.

In the case where the pellicle assembly mounting apparatus of the present embodiment includes the first measuring member and the second measuring member, the pellicle assembly mounting device of the present embodiment preferably includes a calculating member, and the calculating member is based on the pre-bonding The measurement result of the shape of the pellicle frame is different from the measurement result of the shape of the pellicle frame after the bonding, and the pellicle frame is caused by the bonding. The dependent variable. In this aspect, the strain amount of the pellicle frame caused by the bonding is predicted by the calculation member (for example, the strain amount of the pellicle frame due to the exhaust of the groove through the through hole) In advance, the amount of pushing of the pellicle frame caused by the communicating member is controlled in such a manner that the strain of the pellicle frame becomes small (preferably minimized).

In the dust-proof membrane module mounting apparatus according to the present embodiment, in the dust-proof membrane module mounting apparatus of the present embodiment, preferably, the bonding unit includes a communication member in which the bonding member is attached. The chamber is connected to one end of the exhaust pipe, and communicates the exhaust pipe with the through hole of the pellicle frame, and is disposed to be pushed into the outer peripheral surface of the pellicle frame The direction is moved, and the calculation means is a control means for performing feedforward control of the amount of pushing of the pellicle frame caused by the communication member based on the strain amount. In this aspect, the calculation means can not only calculate the strain amount, but also control the amount of pushing of the pellicle frame.

<Specific Example> Next, an example of the present embodiment will be described with reference to Figs. 1 to 20 , but the present invention is not limited to the following examples.

(Specific Example of PSA Module Frame) FIG. 1 and FIG. 2 are schematic perspective views showing an example of a pellicle frame of a pellicle film which is one of the bonding objects in the pellicle assembly mounting apparatus of the present embodiment. 1 is a schematic perspective view of a direction of one end surface in the thickness direction of an example of a pellicle frame which can be observed, and FIG. 2 is a view from the other end surface in the thickness direction of the same example pellicle frame. A schematic perspective view of the observation. Fig. 3 is a partial cross-sectional view showing the dustproof film module frame of the above-described example, and is a cross-sectional view taken along line A-A of Fig. 1 in detail.

As shown in FIGS. 1 and 2, the shape of the pellicle frame 100 is a rectangular frame shape. When the pellicle frame 100 is used as a member of the pellicle assembly, the exposure light passes through the opening 50 surrounded by the pellicle frame 100. The outer shape of the pellicle frame 100 is determined by one end surface 10 in the thickness direction of the pellicle frame 100, the other end surface 20, the outer peripheral surface 30 including four faces, and the inner peripheral surface 40 including four faces. In addition, the shape of the pellicle frame 100 of the present embodiment is not limited to a rectangular shape, and may be a rectangular shape as viewed from the thickness direction. A shape other than (for example, a trapezoidal shape, an outer portion of the frame having a convex shape, or the like).

As shown in FIGS. 1 and 3, a groove 12 is provided on one end surface 10. In this embodiment, the shape of the groove 12 viewed from the thickness direction of the pellicle frame 100 is an endless shape that is wound around the shape of the pellicle frame 100. Hereinafter, a modification of the shape of the groove viewed from the thickness direction of the pellicle frame will be described.

The pellicle frame 100 has a through hole 14A and a through hole 14B. The through hole 14A and the through hole 14B penetrate between the bottom surface of the groove 12 and the outer peripheral surface 30, respectively.

Here, the through hole 14A and the through hole 14B may also pass between the side surface of the groove 12 and the outer peripheral surface 30, respectively. Further, any of the through hole 14A and the through hole 14B may be omitted. That is, in the pellicle frame 100, two through holes (a through hole 14A and a through hole 14B) are connected to one groove (groove 12), but the embodiment is not limited to this. In the present embodiment, at least one through hole may be connected to one trench (groove 12, trench 22).

Further, as shown in FIGS. 2 and 3, a groove 22 is provided on the other end surface 20 opposite to the one end surface 10. In this embodiment, the shape of the groove 22 is also the same as that of the groove 12, and is an endless shape that is wound around the shape of the pellicle frame 100 when viewed from the thickness direction.

The pellicle frame 100 has a through hole 24A and a through hole 24B. The through hole 24A and the through hole 24B penetrate between the bottom surface of the groove 22 and the outer peripheral surface 30, respectively. The change of the through hole 24A and the through hole 24B is the same as that of the through hole 14A and the through hole 14B.

The pellicle frame 100 supports a pellicle film on the side of one end face 10 or on the side of the other end face 20. In other words, the pellicle frame 100 is one of the constituent members of the pellicle assembly of the embodiment.

Hereinafter, the case where the dustproof film is supported on the side of one end surface 10 of the pellicle frame 100 will be mainly described. In this case, the other end surface 20 of the pellicle frame 100 becomes the opposing surface of the original plate. However, the pellicle frame of the present embodiment may be provided with a groove at least as an end surface of the opposite surface of the original plate, and thus may be supported on the side of the other end surface 20 of the pellicle frame 100 as opposed to the above case. The dust-proof film, one end surface 10 of the pellicle frame 100 becomes the opposing surface of the original plate. Further, the groove on the end face on the side where the pellicle is supported and the through hole communicating with the groove may be omitted. In other words, the groove 12, the combination of the through hole 14A and the through hole 14B, and the combination of the groove 22, the through hole 24A, and the through hole 24B may be omitted, and the side supporting the dustproof film may be omitted. End face related combinations.

In the following, a case where a pellicle film (for example, a pellicle film assembly 201 and a pellicle film assembly 200 to be described later) which supports a pellicle film on the side of one end surface 10 of the pellicle frame 100 is attached to the original plate. In the pellicle frame 100, a groove 22 is provided on the other end surface 20 which is the opposite surface of the original plate, and a through hole 24A and a through hole 24B which are connected to the groove 22 are provided. Therefore, when the original plate is fixed to the other end surface 20, the inside of the groove 22 (for example, an exhaust member such as a vacuum pump) is decompressed via the through hole 24A and the through hole 24B, whereby the pellicle can be reduced. The pressure between box 100 and the original. By this pressure reduction, the pressing force can be exerted between the pellicle frame 100 and the original plate, so that the pellicle can be bonded to the original plate while avoiding contact with the film surface of the pellicle film as much as possible.

Further, the pellicle film assembly (for example, the pellicle film assembly 201 and the pellicle film assembly 200 to be described later) which supports the pellicle film on the side of the one end surface 10 of the pellicle frame 100 is provided with a groove not only on the other end surface 20 but also Since the groove is provided on the one end surface 10, it is advantageous in that it can be manufactured while avoiding contact with the film surface of the pellicle film by the same principle as that of bonding the pellicle film assembly to the original plate. Further, since the pellicle frame 100 has grooves (grooves 12 and grooves 22) in both the one end surface 10 and the other end surface 20, there is an advantage in that the end face of the pellicle film and the original plate has a wide selection range.

The size of the pellicle frame 100 can be set, for example, to the following dimensions. The length L1 in the longitudinal direction of the pellicle frame 100 can be, for example, 135 mm to 153 mm, preferably 140 mm to 152 mm, and more preferably 145 mm to 151 mm. The length L2 of the pellicle frame 100 in the short-side direction can be, for example, 100 mm to 130 mm, preferably 105 mm to 125 mm, and more preferably 110 mm to 120 mm. The length L1 in the longitudinal direction and the length L2 in the short-side direction may be the same size. That is, the shape of the pellicle frame 100 may be a square shape. The flame width W of the pellicle frame 100 can be, for example, 1.0 mm to 5.0 mm, preferably 1.2 mm to 3.5 mm, more preferably 1.5 mm to 2.5 mm. Among the four sides of the rectangular pellicle frame 100, the frame width may be the same size or may be set to a different size. Further, the length of the opening portion 50 surrounded by the pellicle frame 100 can be, for example, 130 mm to 152 mm, preferably 135 mm to 151 mm, and more preferably 140 mm to 150 mm. Further, the width of the opening portion 50 can be, for example, 95 mm to 130 mm, preferably 100 mm to 125 mm, and more preferably 105 mm to 120 mm. The thickness t of the pellicle frame can be, for example, 0.5 mm to 5.0 mm, preferably 0.5 mm to 3.0 mm, more preferably 0.5 mm to 2.0 mm.

Further, the width of the groove 12 and the groove 22 can be appropriately set in consideration of the pressure loss at the groove, the relationship with the frame width of the pellicle frame, and the like, and can be, for example, 10 μm to 1.0 mm, preferably 50. Μm to 700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm. Further, the depth of the groove 12 and the groove 22 can be appropriately set in consideration of the relationship between the pressure loss at the groove and the thickness of the pellicle frame, and can be, for example, 10 μm to 1.0 mm, preferably 50 μm. ～700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm.

In addition, the width of the through hole 14A, the through hole 14B, the through hole 24A, and the through hole 24B can be appropriately set in consideration of the relationship between the pressure loss at the through hole and the thickness of the pellicle frame, and can be set, for example, to 10 μm. ～1.0 mm, preferably 50 μm to 700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm. Further, the length of the through hole 14A, the through hole 14B, the through hole 24A, and the through hole 24B can be appropriately set in consideration of reducing the pressure loss at the through hole, and the like, and can be, for example, 0.5 mm to 10 mm, preferably 0.7 mm. 5.0 mm, more preferably 1.0 mm to 2.0 mm. Here, the width of the through hole refers to the passage width of the passage including the through hole (the diameter when the cross section of the through hole is a circular shape), and the length of the through hole refers to the length of the passage of the passage including the through hole. .

The material of the pellicle frame 100 is not particularly limited, and can be used as a normal material used for the pellicle frame. Specific examples of the material of the pellicle frame 100 include aluminum, aluminum alloy (5000 series, 6000 series, 7000 series, etc.), stainless steel, niobium, tantalum alloy, iron, iron alloy, carbon steel, and tool steel. , ceramics, metal-ceramic composites, resins, etc. Among them, aluminum and aluminum alloys are more preferable in terms of light weight and rigidity.

In addition, the pellicle frame 100 may have a protective film on its surface. As the protective film, a protective film which is resistant to hydrogen radicals and EUV light existing in an exposure environment is preferable. As a protective film, an oxide film is mentioned, for example. The oxide film can be formed by a known method such as anodization. Further, the oxide film can be colored by a black dye. When the pellicle frame 100 has an oxide film colored with a black dye, it becomes easier to detect foreign matter on the pellicle frame 100. In addition, as for the other configuration of the pellicle frame 100, for example, a configuration of a known pellicle frame such as JP-A-2014-021217 and JP-A-2010-146027 can be referred to.

Next, a modification of the pellicle frame will be described. In the pellicle frame 100 shown in FIGS. 1 to 3, one groove is provided on each end surface. However, in the present embodiment, two or more grooves may be provided on each end surface. In the case where two or more grooves are provided on each end surface, it is preferable to connect the through holes to two or more grooves (for example, refer to FIG. 4). Further, in the case where the pellicle frame is rectangular, it is preferable that the four sides of the pellicle frame are grooved from the viewpoint of more effectively exerting the pressing force between the pellicle frame and other members. groove. Here, the aspect of the "there are grooves on the four sides of the pellicle frame" includes, for example, a pattern in which a groove is provided across the four sides of the pellicle frame (for example, refer to FIGS. 1 and 2). Each side of the four sides of the pellicle frame is provided with more than one groove (for example, refer to FIG. 4), a groove is provided across the two sides of the pell frame, and the remaining two sides are spanned And there is a groove shape and the like.

FIG. 4 is a schematic perspective view of the pellicle frame 101 in the modification of the embodiment as seen from the direction in which the other end face in the thickness direction is observed. As shown in FIG. 4, the other end surface 20 of the pellicle frame 101 is provided with four grooves, that is, a groove 22A, a groove 22B, a groove 22C, and a groove 22D. The pellicle frame 101 is provided with a through hole 26A, a through hole 26B, a through hole 26C, and a through hole between the bottom surface of each of the through groove 22A, the groove 22B, the groove 22C, and the groove 22D and the outer circumferential surface 30, respectively. Hole 26D. In the pellicle frame 101, each of the grooves has a shape that spans two sides around the corner portion of the pellicle frame 101 and has an end portion in the middle of the two sides. However, the shape of the groove of the present embodiment may be any shape. Further, in the pellicle frame 101, a through hole is connected to one end portion of each of the grooves. However, in the present embodiment, the position of the through hole connected to the groove may be any portion. In short, the through hole may pass between the wall surface of the groove and the outer peripheral surface of the pellicle frame.

Although not shown in FIG. 4, similarly to the one end surface 10 of the pellicle frame 100, a groove is formed on one end surface of the pellicle frame 101, and a wall surface penetrating through the groove on the one end side is provided. Through hole on the outer peripheral surface. However, the shape of the groove on the one end surface side of the pellicle frame 101 may be the same as the shape of the groove on the other end surface side of the pellicle frame 101. In the pellicle frame 101, the other configuration is the same as that of the pellicle frame 100, and the preferred range is also the same.

(Specific Example of PSA Module) FIG. 5 is a schematic cross-sectional view showing an example of a pellicle film assembly used in the pellicle assembly mounting apparatus of the present embodiment. As shown in FIG. 5, the pellicle film assembly 201 includes a pellicle film 130 and the pellicle frame 100. In the pellicle frame 201, the pellicle frame 100 supports the pellicle film 130 on the side of one end face 10 in the thickness direction. The pellicle frame 100 has at least a groove 22 provided in the other end surface 20 in the thickness direction, and a through hole 24A and a through hole 24B penetrating between the outer peripheral surface 30 and the wall surface of the groove 22. Further, a groove 12 is provided in one end surface 10 of the pellicle frame 100 in the thickness direction, and a through hole 14A and a through hole 14B penetrating between the wall surface of the groove 12 and the outer peripheral surface 30 are further provided.

The pellicle assembly 201 has a configuration in which the pellicle frame member 110 including the pellicle frame 100 is bonded to the pellicle member 120 including the pellicle film 130. Here, the pellicle frame member 110 includes the pellicle frame 100, an adhesive layer 102 that is in contact with one end surface 10 of the pellicle frame 100, and another end face of the pellicle frame 100. The 20-contact adhesive layer 104 and the release liner 106 that is in contact with the adhesive layer 104. On the other hand, the pellicle member 120 is composed of a pellicle film 130 and a support substrate 122 that supports the pellicle film 130. In the pellicle film assembly 201, the pellicle frame member 110 and the pellicle member 120 are bonded together with the support substrate 122 in contact with the adhesive layer 102. The pellicle film assembly 201 of this configuration can be manufactured by exhausting (decompressing) the inside of the groove 12 passing through the through hole 14A and the through hole 14B while avoiding contact with the pellicle film 130 as much as possible.

In the pellicle film assembly 201, the material of the pellicle film 130 is not particularly limited, and may be an organic material, an inorganic material, or a mixture of an organic material and an inorganic material. As an organic material, a fluorine-based polymer etc. are mentioned. Examples of the inorganic material include crystalline germanium (for example, single crystal germanium, polycrystalline germanium, etc.), diamond-like carbon (DLC), graphite, amorphous carbon, graphene, tantalum carbide, tantalum nitride, and nitriding. Aluminum and so on. The pellicle film 130 may contain one type of the above material alone or two or more types.

The pellicle film 130 may have a single layer structure or a structure including two or more layers. The thickness of the pellicle film (the total thickness in the case of including two or more layers) can be, for example, 10 nm to 200 nm, preferably 10 nm to 100 nm, more preferably 10 nm to 70 nm, and particularly preferably 10 nm. ~50 nm.

The support substrate 122 is a member for supporting the pellicle film 130. The support substrate 122 is a frame-shaped member similarly to the pellicle frame 100. In other words, the support substrate 122 is a substrate having an opening portion having a rectangular shape at the center portion. The shape and size of the opening of the support substrate 122 are substantially the same as the shape and size of the opening 50 surrounded by the pellicle frame 100. However, the size of the opening portion of the support substrate 122 and the size of the opening portion 50 need not be completely the same. For example, the size of the opening portion of the support substrate 122 may be smaller than the size of the opening portion 50, or the size of the opening portion of the support substrate 122 may be larger than The size of the opening 50. However, it is preferable to set the difference in the length of one side of the opening to be within 2 mm (preferably within 1 mm).

Examples of the material of the support substrate 122 include aluminum, aluminum alloy (5000 series, 6000 series, and 7000 series), stainless steel, niobium, tantalum alloy, iron, iron alloy, carbon steel, tool steel, ceramic, and metal. - Ceramic composite materials, resins, and the like. Among them, ruthenium and osmium alloys are preferred.

The thickness of the support substrate 122 can be, for example, 0.03 mm to 5.0 mm, preferably 0.05 mm to 3.0 mm, more preferably 0.15 mm to 2.0 mm, and particularly preferably 0.3 mm to 1.0 mm.

In the pellicle film assembly 201, the pellicle film 130 is supported by the support substrate 122. In the case where the pellicle film is a film which is difficult to self-support (for example, a pellicle film containing an inorganic material such as a ruthenium crystal film or a pellicle film having a small thickness), the pellicle film member can be supported by the support substrate. The film shape of the pellicle film is maintained, and the pellicle assembly is manufactured.

The pellicle member 120 including the support substrate 122 and the pellicle film 130 can be produced, for example, by first forming a germanium wafer (for example, 8 inches) as a material for the support substrate 122 (a support substrate before the opening portion is provided). On the tantalum wafer, a tantalum crystal film is formed as the pellicle film 130, and then the central portion of the tantalum wafer is etched from the surface of the tantalum wafer on which the tantalum film is not formed, and the central portion is removed. The wafer is formed to form an opening. Further, when the pellicle film assembly 201 is manufactured, the excess portion of the crucible wafer (the excess portion that is beyond the outer circumference of the pellicle frame 100) is cut (removed) in the middle of the manufacturing stage of the pellicle assembly 201. As the pellicle film 130, in addition to the ruthenium crystal film, another film such as a laminate film of a ruthenium nitride film, a ruthenium crystal film, or a tantalum nitride film may be used. Further, as the support substrate 122, other substrates than the germanium wafer may be used. That is, in the case where other materials (films, substrates) are easily used, the pellicle member can be produced by the same method as described above.

In the pellicle film assembly 201, the adhesive layer 102 is a layer that supports the substrate 122 and the pellicle frame 100, and contains an adhesive. In the present embodiment, the "adhesive" means a generalized adhesive, and the concept of "adhesive" also includes an adhesive. Examples of the adhesive agent contained in the adhesive layer 102 include an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, an anthrone resin adhesive, an inorganic adhesive, a double-sided adhesive tape, and a crucible. A ketone resin adhesive, an acrylic adhesive, a polyolefin adhesive, or the like. Among them, an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, an anthrone resin adhesive, and an inorganic adhesive are preferable. The thickness of the subsequent agent layer 102 is not particularly limited, but is preferably 1 μm to 500 μm, more preferably 10 μm to 400 μm, still more preferably 20 μm to 300 μm.

In the pellicle film assembly 201, the adhesive layer 104 is used to mount the pellicle film assembly on the original plate (that is, the pellicle film assembly and the original plate) by using the pellicle assembly mounting device of the present embodiment. It is a layer of the pellicle frame 100 and contains an adhesive. The adhesive agent contained in the adhesive layer 104 may be the same as the adhesive contained in the adhesive layer 102. Among them, a double-sided adhesive tape, an anthrone resin adhesive, an acrylic adhesive, and a polyolefin adhesive are preferable. Agent. The thickness of the subsequent agent layer 104 is not particularly limited, but is preferably 1 μm to 500 μm, more preferably 10 μm to 400 μm, still more preferably 20 μm to 300 μm.

Further, in the pellicle film assembly 201, the adhesive layer 104 is provided in a portion other than the groove 22 in the other end surface 20 of the pellicle frame 100. Thereby, the exhaust of the grooves 22 passing through the through holes 24A and the through holes 24B can be efficiently performed. The adhesive layer 102 is similarly provided in a portion other than the groove 12 in one end surface 10 of the pellicle frame 100.

The release liner 106 is used to prevent the foreign matter from adhering to the adhesive layer 104 by attaching the pellicle assembly to the original plate (that is, before bonding the pellicle assembly to the original plate) by using the pellicle assembly mounting device of the present embodiment. Attached components. The release liner 106 is removed (peeled) from the pellicle assembly 201 before the pellicle assembly is mounted on the original. The pellicle film assembly 200 (FIG. 6 and the like) to be described later is a pellicle film assembly after the release liner 106 is removed from the pellicle film assembly 201. The removal of the release liner 106 from the pellicle assembly 201 can be performed in the pellicle assembly mounting apparatus of the present embodiment, or can be performed in advance of the pellicle assembly mounting apparatus of the present embodiment.

The release liner is a member also referred to as a release film or separator. As the release liner, a polyethylene terephthalate (PET) film having a release layer such as an anthrone compound can be used without any particular limitation. In the pellicle film assembly 201, the shape of the release liner 106 as viewed from the thickness direction is a shape that spans the pellicle frame 100 and the opening 50 (the opening surrounded by the pellicle frame 100), that is, does not have an opening. The shape of the flat plate. However, the shape of the release liner 106 may be any. The release liner may be a frame-shaped member (a member having an opening) that is in contact only with the surface of the adhesive layer 104. Further, the release liner may be a member larger than the pellicle frame 100, and may have a member that is larger than the outer side of the pellicle frame 100 when viewed from the thickness direction of the pellicle frame 100.

The thickness of the release liner 106 is not particularly limited, but is preferably 5 μm to 500 μm, more preferably 10 μm to 400 μm, and still more preferably 20 μm to 300 μm.

In the pellicle assembly 201, the preferred range of the thickness of each member is as described above. The thickness of each member is preferably adjusted so that the total thickness of the pellicle film assembly 200 is 5.0 mm or less (more preferably 3.0 μm or less, and further preferably 2.0 mm or less).

At least one constituent member of the pellicle film assembly 201 (excluding the release liner 106) may also form an alignment mark for improving the alignment (position alignment) accuracy with the original plate.

(Specific Example of Bonding Unit) FIG. 6 and FIG. 7 are schematic configuration diagrams showing an example of a bonding unit in the pellicle assembly mounting apparatus according to the present embodiment. The bonding unit is a unit that functions as a pellicle mounting device alone. Fig. 6 is a schematic cross-sectional view showing a state in which a pellicle film assembly and an original plate are bonded together in a bonding chamber of a bonding unit. In FIG. 6, the detailed structure of the bonding chamber is omitted. Fig. 7 is a schematic cross-sectional view showing a detailed configuration of the inside of the bonding chamber and a form in which the pellicle member is carried into the bonding chamber. In FIG. 7, the detailed structure of the pellicle film assembly is omitted.

As shown in FIG. 6, the pellicle film assembly 200 and the original plate 250 are disposed in the bonding chamber 310 of the bonding unit 300. Here, the pellicle film assembly 200 is one in which the release liner 106 is removed from the pellicle film assembly 201. The removal of the release liner 106 from the pellicle assembly 201 can be performed in the pellicle assembly mounting apparatus of the present embodiment, or can be performed in advance of the pellicle assembly mounting apparatus of the present embodiment.

The original plate 250 has a front surface 252 (a surface on which an exposure light can be irradiated; a light irradiation surface) and a back surface 254 (a surface on the opposite side of the front surface 252). As the master 250, for example, an EUV master (EUV mask) including a support substrate, a reflective layer laminated on the support substrate, and an absorber layer formed on the reflective layer is used. In the original plate, the surface on the side where the reflection layer and the absorber layer are provided becomes the front surface 252 (light irradiation surface). The surface on the opposite side of the front surface 252 (the surface supporting the substrate) is the back surface 254. In this example, a desired image can be formed on the sensing substrate (e.g., the semiconductor substrate with the photoresist film) by absorbing a portion of the EUV light by the absorber layer. The reflective layer can be a multilayer film of molybdenum (Mo) and bismuth (Si). The absorber layer may be a highly absorptive material such as EUV light such as chromium (Cr) or tantalum nitride.

In the bonding chamber 310, the pellicle film assembly 200 and the original plate 250 are disposed such that the adhesive layer 104 of the pellicle film assembly 200 faces the front surface 252 of the original plate 250. A groove 22 is provided in the end surface (the other end surface 20) of the pellicle frame 100 on the side opposite to the original plate 250 in the pellicle film assembly 200. Further, the adhesive layer 104 is provided on a portion other than the groove 22 on the other end surface 20 of the pellicle frame 100. In the bonding chamber 310, the inside of the trench 22 is exhausted through the through hole 24B by an exhaust pipe (not shown in FIG. 6; the exhaust pipe 312A and the exhaust pipe 312B in FIG. 7). (decompression) (arrow E2), and exhaust (decompression) inside the groove 22 is performed via the through hole 24A (arrow E1). By the exhaust (decompression), the suction force F (i.e., the pressing force) can be made to function between the pellicle assembly 200 and the original plate 250. By the action of the force F, the two can be bonded together as much as possible while avoiding contact with the pellicle film 130. At this time, it is preferable to introduce the gas into the bonding chamber 310 by an introduction pipe (not shown) to pressurize the inside of the bonding chamber 310. Thereby, the difference between the pressure of the entire environment in the bonding chamber 310 in which the pellicle film assembly 200 and the master 250 is disposed and the pressure inside the groove 22 (differential pressure) can be further increased, so that the force F can be made. Play a more effective role.

The force F (the force applied to the entire pellicle frame) is preferably 1 N or more, more preferably 2 N or more. The force F (the force applied to the entire pellicle frame) is more preferably 10 N or more, and particularly preferably 20 N or more. The upper limit of the force F (the force applied to the entire pellicle frame) is not particularly limited, and is, for example, 500 N, preferably 400 N, in terms of productivity and the like.

Next, the configuration of the bonding unit 300 will be described with reference to Fig. 7 . As shown in FIG. 7 , the bonding unit 300 includes a bonding chamber 310 and a first introduction tube 322 and a second introduction tube for introducing gas into the bonding chamber 310 to pressurize the inside of the bonding chamber 310 . 326 and an exhaust pipe 312A and an exhaust pipe 312B for exhausting the inside of the groove 22 through the through hole 24A and the through hole 24B of the pellicle frame 100 of the pellicle film assembly 200.

Here, when the pellicle film assembly 200 and the original plate 250 are disposed in the bonding chamber 310, the first introduction tube 322 is disposed on the side opposite to the pellicle film assembly 200 (the pellicle film 130) (in this example). The position of the gas is introduced from the upper surface of the bonding chamber 310. The bonding unit 300 may include a plurality of first introduction tubes 322. On the other hand, when the pellicle film assembly 200 and the original plate 250 are disposed in the bonding chamber 310, the second introduction pipe 326 is disposed at a position where the gas can be introduced from the lower side of the original plate 250 and the side surface of the bonding chamber 310. The second introduction pipe 326 is not limited to this position, and may be provided at all positions where gas can be introduced into the bonding chamber 310. Further, the bonding unit 300 may include a plurality of second introduction tubes 326.

The other ends of the first introduction pipe 322 and the second introduction pipe 326 may be connected to a gas supply member such as a gas cylinder, respectively (via other piping or the like as necessary). Further, a valve (not shown) for switching whether or not to introduce gas may be provided in the middle of the first introduction pipe 322 and the second introduction pipe 326. The valve may also be an adjustment valve having a mechanism for adjusting a gas flow rate or the like. In addition, the gas supplied through the first introduction pipe 322 and the second introduction pipe 326 is not particularly limited, and for example, dry air, an inert gas, or the like can be used.

The exhaust pipe 312A and the exhaust pipe 312B are respectively connectable to the through holes of the pellicle frame of the pellicle unit 200 via a communication member connected to one end.

Fig. 8 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes of Fig. 7, that is, the exhaust pipe 312B is connected to the through hole of the pellicle frame. As shown in FIG. 8, a communication member 314 that communicates the through hole 24B of the pellicle frame 100 with the exhaust pipe 312B is connected to one end of the exhaust pipe 312B. When the bonding unit 300 includes the communication member 314, when the inside of the groove 22 passing through the through hole 24B is exhausted, the efficiency of the exhaust gas is further improved. The communication member 314 does not need to be an independent member with respect to the exhaust pipe 312B. That is, the exhaust pipe 312B and the communication member 314 may be one member that is integrally formed.

The shape of the communication member 314 is a shape having an open end that is in contact with the outer peripheral surface of the pellicle frame 100, and the diameter of the open end is larger than the diameter of the through hole. By the shape of the communication member 314 being the shape, the positional alignment of the open end of the communication member 314 with the through hole 14B can be easily performed. More specifically, the shape of the communication member 314 becomes a tapered shape that increases in diameter as it goes away from one end of the exhaust pipe 312B.

Further, the communication member 314 is provided to be movable in a direction (direction of the arrow J2) that is pushed into the outer peripheral surface of the pellicle frame 100. Thereby, the communication member 314 and the pellicle frame 100 can be connected more securely. Further, even if the pellicle frame 100 is strain-deformed in the exhaust direction (direction of the arrow E2) by exhausting the inside of the groove 22 through the through hole 24B of the pellicle frame 100, it is possible to borrow The strain deformation of the pellicle frame 100 is corrected by pushing the outer peripheral surface of the pellicle frame 100 in advance by the communication member 314. Further, of course, the communication member 314 can also move in the opposite direction (return direction) from the arrow J2.

FIG. 9 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to the through hole of the pellicle frame in the modification of the embodiment, and is a portion of FIG. 8 in the example; The corresponding diagram of the section view. As shown in FIG. 9, the through hole 124B of the pellicle frame 103 in the modification has a tapered shape which increases in diameter as it goes toward the outer peripheral surface of the pellicle frame 103. The communication member 316 in the modification has a tapered shape that can be inserted into a tapered shape portion of the through hole 124B. According to this modification, the exhaust pipe 312B and the through hole 124B can be more firmly connected by inserting the communication member 316 into the tapered portion of the through hole 124B (refer to the arrow J12). In the above-described modification, the aspects other than the above are the same as the above-described example, and the preferred aspects are also the same. In addition, even when the communicating member and the through hole have a shape other than the tapered shape, the same effect as the above-described modification can be exerted as long as the connecting member can be inserted into the through hole. For example, when the communication member is a cylindrical member and the through hole is a cylindrical shape, the communication member can be inserted into the through hole by making the diameter of the communication member smaller than the diameter of the through hole.

Further, in the present embodiment, the communication member may be omitted. In short, in the present embodiment, a configuration may be adopted in which the exhaust pipe can communicate with the through hole.

Then, returning to FIG. 7, the other end (not shown) of the exhaust pipe 312A and the exhaust pipe 312B is disposed outside the bonding chamber 310, and the other ends of the exhaust pipe 312A and the exhaust pipe 312B are connected to each other (if necessary, via other pipes, etc.) Exhaust parts such as vacuum mercury. Further, a valve (not shown) for exchanging the exhaust of the groove 22 may be provided in the middle of the exhaust pipe 312A and the exhaust pipe 312B. The valve may also be an adjustment valve having a mechanism for adjusting a gas flow rate or the like.

Further, in the bonding unit 300, two exhaust pipes are provided corresponding to the number (two) of the through holes connected to the grooves 22 of the pellicle frame 100, but the exhaust gas in the present embodiment The number of tubes is of course not limited to two. The number of the exhaust pipes is not particularly limited, and it is preferable to make the number of the ends of the exhaust pipe coincide with the number of the through holes. Further, as the exhaust pipe, a branched exhaust pipe can also be used. In short, in the embodiment, it is preferable that each end portion of the exhaust pipe is connected to each of the through holes connected to the groove, and the groove is disposed on a side of the pellicle frame opposite to the pellicle member. Side end face.

As shown in FIG. 7, a master support member 330 supporting the master 250 is disposed in the bonding chamber 310. The master support member 330 supports the master 250 in such a manner as to be in contact with a portion of the outer peripheral surface of the master 250 and not in contact with the back surface 254 of the master 250. However, as a modification of the master supporting member 330, a master supporting member that is in contact with a part of the outer peripheral surface of the original plate and that is in contact with a part of the peripheral end portion of the back surface 254 may be used. As in the above examples, the bonding unit 300 preferably includes a master supporting member, and the master supporting member is in the bonding chamber 310 at least with the peripheral end portion of the back surface 254 of the original plate 250 and the outer peripheral surface of the original plate 250. The original plate 250 is supported in such a manner that a part of the contacts does not contact the central portion of the back surface 254. Thereby, the original plate and the pellicle can be bonded together without being in contact with the central portion of the back surface of the original plate, so that the adhesion of the foreign matter to the central portion of the back surface of the original plate is suppressed.

Similarly, it is preferable that the original plate 250 is held by a holding member (not shown) and the original plate 250 is carried into the bonding chamber 310, which is the peripheral end portion of the back surface 254 of the original plate 250 and the original plate. The original plate 250 is supported in such a manner that at least a part of the outer peripheral surface of the 250 contacts and does not contact the central portion of the back surface 254. Examples of the holding member include a hand member provided in the transport robot.

The central portion of the back surface 254 is preferably a region wider than the effective exposure region of the original plate 250. Further, the distance from the outer periphery of the central portion of the back surface 254 to the peripheral end of the back surface is preferably 5 mm or less, more preferably 3 mm or less.

Further, the peripheral end portion of the back surface 254 is preferably a region within 5 mm (more preferably within 3 mm) from the peripheral end of the back surface.

Next, a modification of the mechanism for supporting the original plate 250 in the bonding chamber 310 will be described with reference to FIGS. 10 to 13 in a modification of the present embodiment. Further, in the modified examples, the preferred range of the central portion and the peripheral end portion of the back surface is the same as the above-described example.

In the modification shown in FIG. 10, the master 250 is carried (accommodated) into the bonding chamber 310 in a state of being housed in the original casing 260 having the front surface 252 of the original plate 250. The exposed opening. In this case, the bonding unit 300 includes a master case supporting member 332 (mounting plate) in which the original housing supporting member 332 (mounting plate) accommodates the original plate of the original plate 250. Body 260 is supported. In this modification, the original plate 250 and the pellicle assembly 200 are bonded together while the original plate 250 is held in the original casing 260. Further, the loading of the master casing 260 into the bonding chamber 310 in the modification can be performed using a holding member (for example, a hand member provided in the conveyance robot) capable of holding the original casing 260. The retaining member that holds the master housing 260 can be in contact with any portion of the outer side of the master housing 260. In this modification, a part of the peripheral end portion of the back surface 254 of the master 250 is in contact with the projection 262 provided on the master casing 260, and is not in contact with any portion of the central portion of the back surface 254. Thereby, the original plate and the pellicle can be bonded together without being in contact with the central portion of the back surface of the original plate, so that the adhesion of the foreign matter to the central portion of the back surface of the original plate is suppressed. The material, shape, and the like of the projections 262 are not particularly required. However, as the material, a material having flexibility and difficulty in dusting or a material having conductivity is preferable. As such a material, for example, a carbon-polyimine compound or the like can be mentioned. The position at which the projections 262 are provided is also not particularly limited, but is preferably the four corners of the back surface 254 of the original plate 250.

In the modification shown in FIG. 11, the master 250 is placed on the mounting plate 334 in the bonding chamber 310. In this modification, a part of the peripheral end portion of the back surface 254 of the master 250 is in contact with the projection 362 provided on the placing plate 334, and is not in contact with any portion of the central portion of the back surface 254. Thereby, the original plate and the pellicle can be bonded together without being in contact with the central portion of the back surface of the original plate, so that the adhesion of the foreign matter to the central portion of the back surface of the original plate is suppressed. The preferred material of the protrusions 362 is the same as the preferred material of the protrusions 262. The preferred embodiment of the position in which the projections 362 are provided is also the same as the preferred embodiment in which the projections 262 are provided.

In the modification shown in FIG. 12, the original plate 250 is different from the previous example, and the original plate 250 is disposed in the bonding chamber 310 such that the front surface 252 is on the lower side and the back surface 254 is on the upper side. In this modification, the master support member 336 that supports the master 250 so as to be in contact with the outer peripheral surface of the master 250 and not in contact with the back surface 254 of the master 250 is provided in the bonding chamber 310. In the case of this modification, the pellicle film assembly 200 is different from the previous example in that the dust-proof thin film 130 is carried into the bonding chamber 310 in the downward direction. The aspect in which the pellicle film assembly 200 is attached to the front surface 252 of the original plate 250 is the same as the previous example. In this modification, the original plate and the pellicle can be bonded together without being in contact with the center portion and the peripheral end portion of the back surface of the original plate, so that the adhesion of foreign matter to the back surface of the original plate is suppressed.

The modification shown in FIG. 13 is the same as the modification shown in FIG. 12 except that the original support member 336 in FIG. 12 uses the following original support member 337, and the original support member 337 is in contact with a part of the outer peripheral surface of the original plate 250. And also in contact with the peripheral end portion of the front surface 252 of the master 250.

Then, returning to FIG. 7, the original supporting member 330 may be provided so that the original plate 250 can be moved in the horizontal direction (more specifically, the X direction and the Y direction orthogonal to each other, and the θ direction as the rotation direction), whereby The alignment (position alignment) adjustment of the pellicle assembly 200 to the master 250 can be performed. That is, the master support member 330 in this case functions as an alignment member. Further, in the same manner as the original supporting member, the placing plate, and the original housing supporting member in the respective modifications, it is preferable to function as an alignment member.

A plurality of sensors 340 are further disposed in the bonding chamber 310. The sensor 340 is a member for reading the position of the pellicle assembly 200 (the pellicle frame 100) in the fitting chamber 310. The sensor 340 reads, for example, the position of the alignment mark which is sometimes provided in a part of the pellicle assembly 200, the position of the outer peripheral end of the pellicle frame 100, the position of the inner peripheral end of the pellicle frame 100, and the like. The sensor 340 is disposed to be movable in accordance with the position of the reading object (the alignment mark, the position of the outer peripheral end of the pellicle frame 100, and the position of the inner peripheral end of the pellicle frame 100). The reading by the sensor 340 can be performed by image discrimination. As the sensor 340, a fiber sensor can be preferably applied.

Further, a known mechanism such as an exposure device (for example, a stepper) or a wafer mounting device can be applied to the alignment mechanism in the bonding unit (the movement of the original support substrate, the reading of the position using the center, and the like). Alignment mechanism.

Further, a gas dispersion member 324 for dispersing a gas introduced from the first introduction pipe 322 is further provided in the bonding chamber 310. The gas dispersion member 324 is a cover-shaped member that covers an end portion (a gas introduction port) of the first introduction pipe 322 and a part of an inner wall surface of the upper portion of the bonding chamber 310. Further, a plurality of holes (not shown) are provided on the opposing surface side of the gas dispersion member 324 and the pellicle film 130. The gas introduced from the first introduction pipe 322 first reaches the space formed by the inner wall surface of the upper portion of the bonding chamber 310 and the gas dispersion member 324, and is then dispersed by the plurality of holes. Thereby, the influence of the flow of the gas from the first introduction pipe 322 on the pellicle film 130 is reduced. From the viewpoint of further reducing the influence of the flow of the gas on the pellicle film, it is preferable that the plurality of holes are provided in such a manner that the gas does not come into contact with the central portion of the pellicle film 130.

Further, although not shown in the drawings, the member inlet and outlet are provided in the bonding chamber 310. The loading and unloading of the respective members of the bonding chamber 310 is performed via the member inlet and outlet. Specifically, the pellicle film assembly 200 before bonding and the original plate 250 before bonding are carried into the bonding chamber 310 through the member inlet and outlet. Further, the bonded pellicle film assembly 200 and the original plate 250 are carried out of the bonding chamber 310 via the member inlet and outlet. Further, a closing door (not shown) for opening and closing the member inlet and outlet is provided in the bonding unit 300.

The case where the original plate 250 is carried into the bonding chamber 310 is as described above. Further, the pellicle film assembly 200 is preferably carried into the bonding chamber 310 by a hand member (not shown) that is in contact with the outer peripheral surface of the pellicle frame 100 and that does not contact the pellicle film 130 and the adhesive layer 104. . Further, the bonding chamber 310 is also supported by a supporting member (not shown) that is in contact with the outer peripheral surface of the pellicle frame 100 and that does not come into contact with the pellicle film 130 and the adhesive layer 104.

Next, an example of the flow of the bonding process by the bonding unit 300 (the bonding chamber 310) will be described with reference to FIGS. 14 to 17 . In FIGS. 14 to 17 , in order to make it easier to understand the flow of the bonding process, a part of the configuration of the bonding unit 300 and a part of the configuration of the bonding chamber 310 are omitted.

First, as shown in FIG. 14, the master 250 and the pellicle assembly 200 are respectively carried into the bonding chamber 310. Then, as shown in FIGS. 14 and 15, the exhaust pipe 312A and the exhaust pipe 312B are respectively connected to the through hole 24A and the through hole 24B (arrow J1 and arrow J2) of the pellicle frame 100 of the pellicle film assembly 200. The details of this connection are as described above.

Then, alignment (position alignment) adjustment of the pellicle assembly 200 with the original plate 250 is performed. Then, as shown in FIG. 16, the inside of the groove 22 of the pellicle frame 100 is exhausted (decompressed) via the exhaust pipe 312A, the exhaust pipe 312B, and the through hole of the pellicle frame 100. The exhaust (decompression) is performed by an exhaust member (for example, vacuum mercury) connected to an end portion of the exhaust pipe that is outside the bonding chamber 310. By this exhaust gas, as described with reference to Fig. 6, the suction force F (i.e., the pressing force) acts between the pellicle film assembly 200 and the original plate 250 to bond the two. Thereby, the pellicle film assembly 200 and the original plate 250 can be bonded together while avoiding contact with the film surface of the pellicle film as much as possible.

Then, as shown in FIG. 17, the gas is introduced into the bonding chamber 310 via the first introduction pipe 322. The introduced gas is dispersed in the bonding chamber 310 by the gas dispersion member 324. At this time, it is preferable to disperse the gas so that the gas does not at least touch the central portion of the pellicle film 130 (see an arrow G1). By the introduction of the gas into the bonding chamber 310, the bonding chamber 310 is pressurized, thereby arranging the pressure of the entire environment in the pellicle film assembly and the bonding chamber 310 of the original plate and the pressure inside the groove 22. The difference (differential pressure) increases. Due to the differential pressure, the force F becomes strong, and the pellicle assembly 200 and the original plate 250 are pressed more strongly with each other. In addition, although illustration is abbreviate|omitted in FIG. 17, in addition to the introduction of the gas (pressurization) by the 1st introduction tube 322, the introduction of the gas (pressurization) can also be performed by the 2nd introduction tube.

The pressing force F (the force applied to the entire dustproof film assembly frame) between the pellicle film assembly and the original plate, which is caused by the difference between the overall pressure in the bonding chamber 310 and the pressure inside the groove (differential pressure), becomes Within the preferred range (e.g., about 2 N), the degree of pressurization and the reduced pressure is adjusted. For example, the pressure in the bonding chamber 310 is adjusted to, for example, about 0.15 MPa.

(Specific example of the pellicle assembly mounting device) The pellicle assembly mounting device according to the present embodiment may be a device including only a bonding unit (for example, the bonding unit 300), but may be provided with a bonding unit and other units. Device. 18 is a schematic configuration diagram of a pellicle assembly mounting device including a bonding unit and another unit, which is an example of the pellicle assembly mounting device of the embodiment.

As shown in FIG. 18, the pellicle assembly mounting apparatus 600 includes a conveyance robot 400 as a conveyance member, a master loader 610, a pellicle assembly loader 620, the bonding unit 300, an inspection unit 650, and an unloader 630.

The transport robot 400 is a transport member for transporting a material (a pellicle film and a master) and an article of manufacture (an original plate (exposure original) with a pellicle film assembly) to each unit (including the respective loaders and unloaders, the same applies hereinafter).

Of course, the original loader 610 and the pellicle assembly loader 620 are respectively units in which the original plate 250 and the pellicle assembly 200 are placed.

The bonding unit 300 is as described above. The bonding unit 300 preferably includes a first measuring member that measures the shape of the pellicle frame of the pellicle frame member before bonding with the pellicle member. The shape of the pellicle frame as described herein may be, for example, the length L1 in the longitudinal direction, the length L2 in the short-side direction (see FIG. 1 above), the degree of orthogonality of the pellicle frame, and the like. Further, the first measuring member includes the sensor 340 having a function of measuring the shape of the pellicle frame. Further, in the bonding unit 300, a member that detects contact with the pellicle frame may be provided as the first measuring member.

Further, it is preferable that the bonding unit 300 is provided with an alignment member that performs alignment (position alignment) of the pellicle film assembly and the original plate before bonding the pellicle film assembly and the original plate. As the alignment member, as described above, a master support member and a master case support member which are provided to be movable in the horizontal direction (X direction, Y direction, and q direction) can be cited. Further, in the pellicle assembly mounting device 600, a robot arm of the transfer robot 400 having a position adjustment function in the horizontal direction may be used in an auxiliary manner as an alignment member.

The inspection unit 650 is a unit that performs visual inspection of the bonded pellicle and the original. Examples of the visual inspection include detection of foreign matter adhering to at least one of the pellicle and the original plate, measurement of the shape of the pellicle frame, and measurement of the position of the pellicle and the original plate. The inspection unit 650 is preferably a second measurement member that measures the shape of the pellicle frame of the pellicle that is bonded to the original. Examples of the second measuring member include the same examples as the first measuring member.

The unloader 630 is a unit that houses the original (exposed original) of the finally manufactured pellicle-attached film assembly.

The pellicle assembly mounting device 600 further includes a control member 660. The control member 660 is a measurement result based on the shape of the pellicle frame before bonding (the measurement result by the first measuring member) and the measurement result of the shape of the pellicle frame after bonding (by the second measuring member) The measurement result) is a control unit that performs feedforward control (FF (feedforward) control) by alignment of the alignment members. However, the control unit 660 may be omitted.

The pellicle assembly mounting device 600 further includes a calculation member 670. The calculation member 670 is a measurement result based on the shape of the pellicle frame before bonding (the measurement result by the first measurement member) and the measurement result of the shape of the pellicle frame after bonding (by the second measurement member) The measurement result) is a calculation means for calculating the amount of strain of the pellicle frame by the bonding in the bonding unit. The calculation unit 670 further includes a function of performing feedforward control (FF control) on the amount of pushing of the pellicle frame 100 by the communication member 314 based on the strain amount. However, the calculation unit 670 may be omitted.

Further, although the pellicle assembly mounting apparatus 600 includes the above-described units, the units other than the bonding unit 300 may be omitted as appropriate. That is, the unit other than the bonding unit 300 may be provided as a device that is independent of the pellicle assembly mounting device including the bonding unit 300.

Further, the pellicle assembly mounting device 600 may be provided with other units than the respective units. For example, when a pellicle having a release liner (for example, the pellicle assembly 201 having the release liner 106) is attached to the pellicle assembly mounting device 600, a release liner peeling unit may be provided. In addition, in the pellicle assembly mounting device 600, a pellicle assembly that is not provided with an adhesive layer for subsequent use of the original plate (for example, the pellicle assembly from which the self-adhesive film member 200 is removed) is disposed. Next, an adhesive layer forming unit (adhesive coating unit) for forming an adhesive layer for subsequent use with the original may be provided.

Further, the pellicle assembly mounting device according to the present embodiment may include an inversion mechanism that reverses each member (the pellicle assembly and the original plate) upside down. In addition, the EUV original (for example, the original 250) is usually stored or transported by a container called an EUV mask. Moreover, before installing the pellicle, the EUV mask is taken apart and the original is taken out. As the original housing 260, a cover member of an inner hood in an EUV mask can be used. In addition, the operation of reversing or disassembling the EUV mask can be performed at any time when the pellicle is mounted.

(An example of the flow of the pellicle assembly by the pellicle assembly mounting device 600) Next, the pellicle assembly mounting process using the pellicle assembly mounting device will be described with reference to Fig. 19 (i.e., the pellicle assembly is mounted on the original plate). An example of the installation process). The process of installing the pellicle film assembly may also be referred to as the manufacturing process of the original plate with the pellicle film assembly. Furthermore, in each step of FIG. 19, the steps (step 702, step 706, step 708) surrounded by broken lines refer to steps that can be omitted in this example.

As shown in Fig. 19, first, as a step 700, the pellicle assembly is placed on the pellicle assembly loader, and the master is placed on the original loader. Then, the pellicle and the original plate are respectively carried into the bonding chamber by robot transportation. Then, as a step 702, the shape (the shape before bonding) of the pellicle frame of the pellicle is measured by the first measuring member in the bonding chamber. Then, in step 704, the alignment of the pellicle assembly with the original is performed by the alignment member in the bonding chamber. Then, the pellicle assembly is bonded to the original in the bonding chamber. Then, in step 706, the pellicle and the original plate are transported to the visual inspection unit, and in the visual inspection unit, the shape of the pellicle frame (the shape after bonding) is measured by the second measuring member. Here, the feedforward control of the alignment member in step 704 is performed based on the measurement result by the first measurement member and the measurement result by the second measurement member as needed (hereinafter, also referred to as "FF1 (alignment) Correct))). FF1 (alignment correction) is performed by the control unit 660.

Then, in step 708, the strain amount of the pellicle frame by the bonding is calculated based on the measurement result by the first measuring member and the measurement result by the second measuring member. The calculation of the dependent variable is performed by the calculation unit 670. Here, the feed-in control of the pellicle frame 100 caused by the communication member 314 in the bonding process of the step 704 is performed based on the calculated strain amount (hereinafter, also referred to as "FF2 (strain). Correct))). In this example, FF2 (strain correction) is also performed by the calculation unit 670. However, as a modification, a control member that performs FF2 (strain correction) may be provided independently of the calculation means for calculating the strain amount.

Then, as a step 710, the pellicle film assembly and the original plate (that is, the original plate (exposure original plate) with the pellicle film assembly) are conveyed to the unloader and stored.

Although an example of the flow of the pellicle assembly installation using the pellicle assembly mounting apparatus has been described above, the present embodiment is not limited to this example. For example, as described above, in the pellicle assembly mounting device 600, the control member 660 and the calculation member 670 may be omitted. That is, FF1 (alignment correction) and FF2 (strain correction) can be manually performed instead of being automatically performed by the control unit. Further, in the pellicle assembly mounting device 600, the control member 660 and the calculation member 670 may be the same control member. That is, FF1 (alignment correction), calculation of the strain amount, and FF2 (strain correction) can be performed by one control unit. Further, as described above, the pellicle assembly mounting device of the present embodiment may be a device including only the bonding unit. In other words, by merely performing the bonding process in step 704, the pellicle film assembly and the original plate can be bonded together while avoiding contact with the pellicle film, thereby attaching the pellicle film assembly to the original plate.

(Specific Example of Exposure Apparatus Providing Original Plate (Exposure Original) Attaching PSA Module) The original plate (exposure original plate) with the pellicle film assembly manufactured by the present embodiment is used in an exposure apparatus. FIG. 20 is a schematic cross-sectional view of an EUV exposure apparatus 800 which is an example of an exposure apparatus including an example of a master of the pellicle film assembly manufactured by the present embodiment. As shown in FIG. 20, the EUV exposure apparatus 800 includes a light source 831 that emits EUV light, an exposure master 850 that is an example of an exposure master of the present embodiment, and an illumination optical system that guides EUV light emitted from the light source 831 to the exposure master 850. 837. The exposure master 850 includes a pellicle film 810 including a pellicle film 812 and a pellicle frame 814, and a master 833 (EUV mask). The exposure original plate 850 is disposed such that EUV light emitted from the light source 831 passes through the pellicle film 812 and is irradiated onto the original plate 833. The original 833 is a person who reflects the irradiated EUV light in a pattern.

The pellicle assembly 810 corresponds to the pellicle assembly 200. The pellicle film 812 corresponds to the pellicle film 130 described above. The pellicle frame 814 corresponds to the composite of the support substrate 122, the adhesive layer 102, the pellicle frame 100, and the adhesive layer 104 described above.

In the EUV exposure apparatus 800, a filter window 820 and a filter window 825 are provided between the light source 831 and the illumination optical system 837, and between the illumination optical system 837 and the original 833, respectively. Further, the EUV exposure apparatus 800 includes a projection optical system 838 that guides the EUV light reflected by the original 833 to the sensing substrate 834.

In the EUV exposure apparatus 800, the EUV light reflected by the original 833 is guided onto the sensing substrate 834 via the projection optical system 838, and the sensing substrate 834 is exposed in a pattern. Further, the exposure by EUV was carried out under reduced pressure.

The EUV light source 831 emits EUV light toward the illumination optical system 837. The EUV light source 831 includes a target, a pulsed laser irradiation unit, and the like. EUV can be obtained by irradiating a pulsed laser onto the target to produce a plasma. When the target is set to Xe, EUV having a wavelength of 13 nm to 14 nm can be obtained. The wavelength of the light emitted by the EUV light source is not limited to 13 nm to 14 nm, and may be any suitable wavelength of light in the range of 5 nm to 30 nm.

The illumination optical system 837 collects light irradiated from the EUV light source 831, and uniformizes the illuminance to illuminate the original 833. The illumination optical system 837 includes a plurality of multilayer film mirrors 832 for adjusting the optical path of the EUV, an optical coupler (optical integrator), and the like. The multilayer film mirror is a multilayer film in which molybdenum (Mo) or bismuth (Si) is alternately laminated.

The method of installing the filter window 820 and the filter window 825 is not particularly limited, and examples thereof include a method of attaching via an adhesive or the like, or a method of mechanically fixing the same in an EUV exposure apparatus. A filter window 820 disposed between the light source 831 and the illumination optics 837 captures scattered particles (debris) generated from the light source to prevent scattered particles (debris) from adhering to components within the illumination optics 837 (eg, multiple layers) Membrane mirror 832). On the other hand, the filter window 825 disposed between the illumination optical system 837 and the original 833 captures particles (debris) scattered from the side of the light source 831 to prevent scattered particles (debris) from adhering to the original 833.

Further, since foreign matter adhering to the original plate absorbs EUV light or scatters EUV light, the wafer is poorly analyzed. Therefore, the pellicle assembly 810 is installed in such a manner as to cover the EUV irradiation area of the original 833. The EUV light is irradiated to the original 833 through the pellicle film 812.

The EUV light reflected by the original 833 passes through the pellicle film 812 and is irradiated to the sensing substrate 834 via the projection optical system 838. The projection optical system 838 collects light reflected by the original 833 and irradiates the sensing substrate 834. A plurality of multilayer film mirrors 835, a multilayer film mirror 836, and the like for preparing an optical path of the EUV are included in the projection optical system 838.

The sensing substrate 834 is a substrate or the like on which a resist is applied on a semiconductor wafer, and the resist is exposed in a pattern shape by EUV reflected by the original plate 833. The desired pattern is formed on the semiconductor wafer by developing the resist and etching the semiconductor wafer.

All of the contents disclosed in Japanese Patent Application No. 2014-109482, filed on May 27, 2014, is hereby incorporated by reference. All the documents, patent applications, and technical standards described in the present specification are incorporated into the present specification in the same manner as the following, which is specific and separately describes each document, patent application, And the case where technical standards are incorporated by reference.

10‧‧‧One end
12, 22, 22A, 22B, 22C, 22D‧‧‧ trenches
14A, 14B, 24A, 24B, 26A, 26B, 26C, 26D, 124B‧‧‧ through holes
20‧‧‧Other end face
30‧‧‧ outer perimeter
40‧‧‧ inner circumference
50‧‧‧ openings
100, 101, 103, 814‧‧‧Plastic membrane module frame
102, 104‧‧‧ adhesive layer
106‧‧‧Release liner
110‧‧‧Plastic membrane module frame member
120‧‧‧Dust film components
122‧‧‧Support substrate
130, 812‧‧‧Dust film
200, 201, 810‧‧‧Plastic membrane components
250‧‧‧ original
252‧‧‧ front surface (lighted surface)
254‧‧‧Back
260‧‧‧ original shell
262, 362‧‧ ‧ raised
300‧‧‧Finishing unit
310‧‧‧Fitting chamber
312A, 312B‧‧‧ exhaust pipe
314, 316‧‧‧Connected components
322‧‧‧1st introduction tube
324‧‧‧Gas dispersing members
326‧‧‧2nd introduction tube
330‧‧‧Original support components
332‧‧‧Original shell support member (mounting plate)
334‧‧‧Loading board
336, 337‧‧‧ original support components
340‧‧‧ sensor
400‧‧‧Handling robot
600‧‧‧Pneumatic film assembly mounting device
610‧‧‧Original loader
620‧‧‧Dust film assembly loader
630‧‧‧ Unloader
650‧‧‧Check unit
660‧‧‧Control components
670‧‧‧ Calculated parts
700-710‧‧‧Steps
800‧‧‧EUV exposure device
820, 825‧‧‧ filter window
831‧‧‧Light source
832, 835, 836‧‧‧ multilayer film mirror
833‧‧‧ original (EUV mask)
834‧‧‧Induction substrate
837‧‧‧Lighting optical system
838‧‧‧Projection optical system
850‧‧‧Expo original
E1, E2, G1, J1, J2, J12‧‧‧ arrows
F‧‧‧ suction force (compression force)
L1‧‧‧ Length of the long-side direction of the pellicle frame 100
L2‧‧‧ Length of the short-side direction of the pellicle frame 100
t‧‧‧Thickness of the pellicle frame
W‧‧‧Frame width of the pellicle frame 100

FIG. 1 is a schematic perspective view showing an example of a pellicle frame in the present embodiment as seen from a direction in which one end surface in the thickness direction is observed. Fig. 2 is a schematic perspective view of the pellicle frame shown in Fig. 1 as seen from the direction in which the other end face in the thickness direction is observed. Fig. 3 is a cross-sectional view taken along line A-A of Fig. 1; FIG. 4 is a schematic perspective view showing a modification of the pellicle frame of the present embodiment as seen from the direction of the other end surface in the thickness direction. Fig. 5 is a schematic cross-sectional view showing an example of a pellicle according to the embodiment. FIG. 6 is a schematic configuration diagram showing an example of a bonding unit in the pellicle assembly mounting apparatus according to the embodiment. FIG. 7 is a schematic cross-sectional view showing an example of a bonding unit in the pellicle assembly mounting apparatus according to the embodiment. FIG. 8 is a partial cross-sectional view conceptually showing an example in which one of the exhaust pipes is connected to a through hole of the pellicle frame in the example of the embodiment. Fig. 9 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to a through hole of the pellicle frame in the modification of the embodiment. FIG. 10 is a schematic cross-sectional view showing a mechanism for supporting an original plate in a bonding chamber in a modification of the embodiment. FIG. 11 is a schematic cross-sectional view showing a mechanism for supporting an original plate in a bonding chamber in a modification of the embodiment. FIG. 12 is a schematic cross-sectional view showing a mechanism for supporting an original plate in a bonding chamber in a modification of the embodiment. FIG. 13 is a schematic cross-sectional view showing a mechanism for supporting the original plate in the bonding chamber in a modification of the embodiment. FIG. 14 is a schematic flow chart showing the flow of the bonding process in the example of the embodiment. FIG. 15 is a schematic flowchart showing the flow of the bonding process in the example of the embodiment. FIG. 16 is a schematic flowchart showing the flow of the bonding process in the example of the embodiment. 17 is a schematic flow chart showing the flow of the bonding process in the example of the embodiment. FIG. 18 is a schematic configuration diagram showing an example of a pellicle assembly mounting device according to the present embodiment. FIG. 19 is a flowchart showing an example of a flow of installation of the pellicle assembly in the original plate by the pellicle assembly mounting device in the example of the embodiment. FIG. 20 is a schematic cross-sectional view showing an example of an exposure apparatus including an exposure master manufactured by the present embodiment, that is, an EUV exposure apparatus.

22‧‧‧ trench

24A, 24B‧‧‧through holes

100‧‧‧Plastic membrane module frame

102, 104‧‧‧ adhesive layer

122‧‧‧Support substrate

130‧‧‧Plastic film

200‧‧‧Pneumatic film assembly

250‧‧‧ original

252‧‧‧ front surface (lighted surface)

254‧‧‧Back

300‧‧‧Finishing unit

310‧‧‧Fitting chamber

E1, E2‧‧‧ arrows

F‧‧‧ suction force (compression force)

Claims (13)

A pellicle assembly mounting device comprising a bonding unit, the bonding unit comprising: a bonding chamber for bonding a pellicle film and an original plate having a light irradiation surface that can be irradiated with exposure light, the dustproof The film assembly includes a dustproof film and a pellicle frame, the pellicle frame supporting the pellicle on the side of one end face in the thickness direction, and having a groove disposed on the other end surface in the thickness direction and a through-peripheral surface a through hole between the wall surfaces of the groove; and an exhaust pipe for opposing the light-irradiating surface on the other end surface of the pellicle frame and the original plate The inside of the groove is exhausted through the through hole of the pellicle frame in a state in which the method is disposed in the bonding chamber. The pellicle assembly mounting device according to claim 1, wherein the bonding unit includes an introduction tube for introducing a gas into the bonding chamber to pressurize the bonding chamber. The pellicle assembly mounting device according to the second aspect of the invention, wherein the introduction tube includes a first introduction tube, and the first introduction tube is configured from the pellicle assembly disposed in the bonding chamber and The pellicle film in the original plate introduces gas to the side, and the bonding unit further includes a gas dispersing member for dispersing a gas introduced from the first introduction pipe. The pellicle assembly mounting device according to any one of claims 1 to 3, wherein the bonding unit includes a communication member in the fitting chamber and the exhaust One end of the tube is connected, and the exhaust pipe is communicated with the through hole of the pellicle frame. The pellicle assembly mounting device according to claim 4, wherein the communication member is provided to be movable in a direction of being pushed into an outer peripheral surface of the pellicle frame. The pellicle assembly mounting device of claim 4, wherein the communication member has an open end insertable into the through hole. The pellicle assembly mounting device according to any one of claims 1 to 3, wherein the bonding unit includes a master supporting member, and the master supporting member supports and houses in the fitting chamber The light-irradiating surface of the original plate is a peripheral end portion of the surface on the opposite side and at least a part of the outer peripheral surface of the original plate, and a central portion of the surface on the opposite side is not supported. The pellicle assembly mounting device according to any one of claims 1 to 3, wherein the original plate is housed in a master casing and carried into the fitting chamber, the original casing having An opening that exposes the light-irradiating surface of the original plate, and supports at least a part of a peripheral end portion of a surface opposite to the light-irradiating surface of the original plate and an outer peripheral surface of the original plate, and does not support the opposite side In the central portion of the surface, the bonding unit includes a master housing supporting member that supports the master housing that houses the original plate in the bonding chamber. The pellicle assembly mounting device according to any one of the first to third aspects of the present invention, further comprising an inspection unit that performs an appearance inspection on the bonded pellicle assembly and the original plate. The pellicle assembly mounting device according to any one of the first to third aspect of the invention, further comprising: a first measuring member that is dust-proofing the pellicle assembly before bonding with the original plate The shape of the film module frame is measured; and the second measuring member measures the shape of the pellicle frame of the pellicle film bonded to the original plate. The pellicle assembly mounting device according to claim 10, further comprising: an alignment member that performs alignment of the original plate and the pellicle assembly before bonding the original plate and the pellicle assembly And a control member based on the measurement result of the shape of the pellicle frame before the bonding and the measurement result of the shape of the pellicle frame after the bonding, and the use of the alignment member Alignment for feedforward control. The pellicle assembly mounting device according to claim 10, further comprising: a calculation member that is based on a measurement result of a shape of the pellicle frame before the bonding and the bonded portion The amount of measurement of the shape of the pellicle frame is determined by the difference between the measurement results of the pellicle frame. The pellicle assembly mounting device of claim 12, wherein the bonding unit includes a communication member that is connected to one end of the exhaust pipe in the bonding chamber, and is The exhaust pipe communicates with the through hole of the pellicle frame, and is disposed to be movable in a direction of pushing into an outer peripheral surface of the pellicle frame, and the calculating component is based on the strain amount And a control member that performs feedforward control on the amount of pushing of the pellicle frame caused by the communicating member.