TW201538441A - Glass substrate manufacturing method and glass substrate manufacturing device - Google Patents

Glass substrate manufacturing method and glass substrate manufacturing device Download PDF

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TW201538441A
TW201538441A TW104108195A TW104108195A TW201538441A TW 201538441 A TW201538441 A TW 201538441A TW 104108195 A TW104108195 A TW 104108195A TW 104108195 A TW104108195 A TW 104108195A TW 201538441 A TW201538441 A TW 201538441A
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gas
molten glass
platinum group
group metal
phase space
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TW104108195A
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TWI551558B (en
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Shingo Fujimoto
Hiroyuki Kawasaki
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Avanstrate Inc
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B7/00Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
    • C03B7/02Forehearths, i.e. feeder channels
    • C03B7/06Means for thermal conditioning or controlling the temperature of the glass
    • C03B7/07Electric means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/167Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

The object of the present invention is to inhibit the oxidation and volatilization of platinum group metal. This invention provides a glass substrate manufacturing method using a processing device for processing molten glass to process the molten glass. By means of forming a vapor space in the upper portion of liquid surface of the molten glass, the method comprises the following steps: molten glass is supplied to the interior of a processing device having an inner wall, at least one portion of which comprises a material containing platinum group metal, so that a gas which acts as an inert gas to the platinum group metal may flow into the vapor space; an exhaust port at the external space connecting the processing device with the vapor space is used for sucking the gas in the vapor space; the oxygen concentration of the gas sucked from the exhaust port is measured, and the inflow of gas that acts as an inert gas to the platinum group metal is adjusted in a manner of maintaining the oxygen concentration in a range below 5.0%.

Description

玻璃基板之製造方法及玻璃基板之製造裝置 Method for producing glass substrate and device for manufacturing glass substrate

本發明係關於一種製造玻璃基板之玻璃基板之製造方法及玻璃基板之製造裝置。 The present invention relates to a method for producing a glass substrate for producing a glass substrate and a device for producing a glass substrate.

一般而言,玻璃基板係經過自玻璃原料生成熔融玻璃後,使熔融玻璃成形為玻璃基板之步驟而製造。於上述步驟中,包括去除熔融玻璃所內包之微小氣泡之步驟(以下亦稱為澄清)。澄清係藉由如下方式而進行:一面加熱澄清管之本體,一面使調配有澄清劑之熔融玻璃通過該澄清管本體,利用澄清劑之氧化還原反應,將熔融玻璃中之泡去除。更具體而言,進而提高粗熔解之熔融玻璃之溫度,使澄清劑發揮功能而使泡浮起消泡其後,使溫度降低,藉此,使熔融玻璃吸收未澈底消泡而殘留之相對較小之泡。即,澄清包括使泡浮起消泡之處理(以下亦稱為消泡處理或消泡步驟)及使小泡吸收至熔融玻璃之處理(以下亦稱為吸收處理或吸收步驟)。 In general, a glass substrate is produced by the step of forming molten glass from a glass raw material, and molding the molten glass into a glass substrate. In the above steps, the step of removing minute bubbles contained in the molten glass (hereinafter also referred to as clarification) is included. The clarification is carried out by heating the body of the clarification tube while passing the molten glass containing the clarifying agent through the clarification tube body, and removing the bubbles in the molten glass by the redox reaction of the clarifying agent. More specifically, the temperature of the molten glass which is coarsely melted is further increased, and the clarifying agent functions to defoam the bubble, and then the temperature is lowered, whereby the molten glass is absorbed by the defoaming and remains relatively low. Small bubble. That is, the clarification includes a treatment for defoaming the bubble (hereinafter also referred to as a defoaming treatment or a defoaming step) and a treatment for absorbing the vesicles to the molten glass (hereinafter also referred to as an absorption treatment or absorption step).

與成形前之高溫熔融玻璃接觸之構件之內壁需要根據與該構件接觸之熔融玻璃之溫度、所要求之玻璃基板之品質等而由適當之材料構成。例如,已知構成上述澄清管本體之材料通常使用鉑族金屬之單質或合金(專利文獻1)。鉑族金屬之熔點較高,且對熔融玻璃之耐蝕性亦優異。 The inner wall of the member that is in contact with the high-temperature molten glass before molding needs to be composed of a suitable material depending on the temperature of the molten glass that is in contact with the member, the quality of the desired glass substrate, and the like. For example, it is known that a material constituting the above-mentioned clarification pipe body is generally a simple substance or an alloy of a platinum group metal (Patent Document 1). The platinum group metal has a high melting point and is excellent in corrosion resistance to molten glass.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2010-111533號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-111533

若熔融玻璃通過於內壁面使用鉑族金屬之處理裝置,則於與經加熱之內部表面之氣相空間(含氧之氛圍)接觸之部分,鉑族金屬會作為氧化物而揮發。另一方面,鉑族金屬之氧化物於處理裝置之溫度局部降低之位置被還原,經還原之鉑族金屬附著於內壁面。有附著於內壁面之鉑族金屬落下並混入至消泡步驟中之熔融玻璃中而作為異物混入至玻璃基板之虞。 When the molten glass passes through a treatment apparatus using a platinum group metal on the inner wall surface, the platinum group metal volatilizes as an oxide in a portion in contact with the vapor phase space (oxygen-containing atmosphere) of the heated inner surface. On the other hand, the oxide of the platinum group metal is reduced at a position where the temperature of the treatment apparatus is locally lowered, and the reduced platinum group metal adheres to the inner wall surface. The platinum group metal adhered to the inner wall surface is dropped and mixed into the molten glass in the defoaming step to be mixed as a foreign matter into the glass substrate.

本發明之目的在於提供一種可抑制鉑族金屬被氧化而揮發且製造品質較高之玻璃基板之玻璃基板之製造方法及製造裝置。 An object of the present invention is to provide a method and a device for producing a glass substrate which can suppress oxidation of a platinum group metal and volatilize it to produce a glass substrate having high quality.

為了解決上述問題,本發明之第1態樣係一種玻璃基板之製造方法,其特徵在於:使用處理熔融玻璃之處理裝置而處理熔融玻璃,且當處理熔融玻璃時,以於熔融玻璃之液面之上部形成氣相空間之方式,對內壁之至少一部分包含含有鉑族金屬之材料之處理裝置之內部供給熔融玻璃,藉由自連接上述氣相空間與上述處理裝置之外部空間之排氣口抽吸上述氣相空間內之氣體,使對於鉑族金屬為惰性之氣體流入至上述氣相空間,測量自上述排氣口抽吸之氣體中之氧濃度,以使上述氧濃度成為5.0%以下之範圍之方式,調節上述對於鉑族金屬為惰性之氣體朝上述氣相空間之流入量。 In order to solve the above problems, a first aspect of the present invention provides a method for producing a glass substrate, which is characterized in that a molten glass is treated by a treatment apparatus for treating molten glass, and a molten glass is used when the molten glass is treated. The upper portion forms a gas phase space, and the inside of the inner wall is provided with a treatment device for containing a material containing a platinum group metal, and the molten glass is supplied from the outer space of the gas phase space and the outer space of the processing device. The gas in the gas phase space is sucked, and a gas inert to the platinum group metal flows into the gas phase space, and the oxygen concentration in the gas sucked from the exhaust port is measured so that the oxygen concentration becomes 5.0% or less. In the manner of the range, the inflow amount of the gas inert to the platinum group metal toward the gas phase space is adjusted.

此處,對於鉑族金屬為惰性之氣體係指於處理裝置中處理熔融玻璃時之氣相空間之溫度下對於鉑族金屬為惰性之氣體、與鉑族金屬之反應性較氧氣低之氣體,例如氮氣(N2)、稀有氣體(例如氬氣 (Ar))、一氧化碳(CO)等。 Here, the gas system which is inert to the platinum group metal refers to a gas which is inert to the platinum group metal at a temperature of the gas phase space when the molten glass is treated in the treatment apparatus, and which is less reactive with the platinum group metal than oxygen. For example, nitrogen (N 2 ), a rare gas (for example, argon (Ar)), carbon monoxide (CO), or the like.

較佳為,以使上述氧濃度成為5.0%以下之範圍之方式調節自上述排氣口之抽吸壓力。進而,較佳為,以使上述氧濃度成為0.1%以上且3.0%以下之範圍之方式調節上述對於鉑族金屬為惰性之氣體之供給量。 Preferably, the suction pressure from the exhaust port is adjusted so that the oxygen concentration is in the range of 5.0% or less. Furthermore, it is preferable to adjust the supply amount of the gas inert to the platinum group metal so that the oxygen concentration is in the range of 0.1% or more and 3.0% or less.

較佳為,對上述處理裝置自上述熔融玻璃之上游側及下游側向上述氣相空間供給上述對於鉑族金屬為惰性之氣體。 Preferably, the treatment device supplies the gas inert to the platinum group metal to the gas phase space from the upstream side and the downstream side of the molten glass.

較佳為,使自上述熔融玻璃之上游側供給之上述對於鉑族金屬為惰性之氣體較自上述熔融玻璃之下游側供給之上述對於鉑族金屬為惰性之氣體多。 Preferably, the gas which is supplied to the upstream side of the molten glass and which is inert to the platinum group metal is supplied with more gas which is inert to the platinum group metal than the gas supplied from the downstream side of the molten glass.

較佳為,於使上述對於鉑族金屬為惰性之氣體流入至上述氣相空間之前將其預熱。例如,較佳為,於使上述對於鉑族金屬為惰性之氣體流入至上述氣相空間之前將其預熱至500℃以上。 Preferably, the gas inert to the platinum group metal is preheated before flowing into the gas phase space. For example, it is preferred to preheat the gas inert to the platinum group metal to 500 ° C or higher before flowing into the gas phase space.

較佳為,上述處理裝置係澄清上述熔融玻璃之澄清處理裝置,且上述澄清處理裝置中之上述熔融玻璃之最高溫度為1600~1720℃。 Preferably, the treatment device clarifies the clarification treatment device for the molten glass, and the maximum temperature of the molten glass in the clarification treatment device is 1600 to 1720 °C.

本發明之第2態樣係一種玻璃基板之製造裝置,其特徵在於使用對熔融玻璃進行澄清處理之澄清處理裝置而處理熔融玻璃,且包括:澄清處理裝置,其內壁之至少一部分包含含有鉑族金屬之材料,內部被供給熔融玻璃,並且於上述熔融玻璃之液面之上部形成氣相空間;氣體供給裝置,其對上述氣相空間供給除氧氣以外之氣體;排氣口,其連接上述氣相空間與上述澄清處理裝置之外部空間;抽吸裝置,其藉由自上述排氣口抽吸上述氣相空間內之氣體, 使除氧氣以外之氣體流入至上述氣相空間;氧濃度計,其測量自上述排氣口抽吸之氣體中之氧濃度;及控制裝置,其根據上述氧濃度計之測量結果,以使上述氧濃度成為特定範圍之方式調節自上述排氣口之抽吸壓力。 A second aspect of the present invention provides a glass substrate manufacturing apparatus characterized by treating a molten glass using a clarification treatment apparatus for clarifying molten glass, and comprising: a clarification treatment apparatus, wherein at least a part of an inner wall thereof contains platinum a material of a group metal, which is internally supplied with molten glass, and forms a gas phase space above the liquid surface of the molten glass; a gas supply device that supplies a gas other than oxygen to the gas phase space; and an exhaust port that connects the above a gas phase space and an outer space of the clarification treatment device; a suction device that sucks gas in the gas phase space from the exhaust port, Flowing a gas other than oxygen into the gas phase space; an oxygen concentration meter measuring the oxygen concentration in the gas sucked from the exhaust port; and a control device according to the measurement result of the oxygen concentration meter to make the above The suction pressure from the above-mentioned exhaust port is adjusted in such a manner that the oxygen concentration becomes a specific range.

根據本發明,藉由以使自排氣口抽吸之氣體中之氧濃度成為特定範圍之方式調節自排氣口之抽吸壓力,可將處理裝置內之氣相空間中之氧濃度調節為所需範圍。藉此,可抑制因氣相空間之氧濃度變高而引起之鉑族金屬之揮發,從而減少揮發之鉑族金屬之析出量。 According to the present invention, by adjusting the suction pressure from the exhaust port in such a manner that the oxygen concentration in the gas sucked from the exhaust port becomes a specific range, the oxygen concentration in the gas phase space in the processing apparatus can be adjusted to The required range. Thereby, the volatilization of the platinum group metal due to the increase in the oxygen concentration in the gas phase space can be suppressed, and the amount of the platinum group metal which is volatilized can be reduced.

100‧‧‧熔解裝置 100‧‧‧melting device

101‧‧‧熔解槽 101‧‧‧melting tank

103‧‧‧攪拌槽 103‧‧‧Stirring tank

103a‧‧‧攪拌器 103a‧‧‧Agitator

104‧‧‧移送管 104‧‧‧Transfer tube

105‧‧‧移送管 105‧‧‧Transfer tube

106‧‧‧玻璃供給管 106‧‧‧Glass supply tube

120‧‧‧澄清槽 120‧‧‧Clarification tank

120a‧‧‧氣相空間 120a‧‧‧ gas phase space

121a‧‧‧電極 121a‧‧‧electrode

121b‧‧‧電極 121b‧‧‧electrode

122‧‧‧電源裝置 122‧‧‧Power supply unit

123‧‧‧控制裝置 123‧‧‧Control device

124a‧‧‧沖洗氣體供給管 124a‧‧‧ flushing gas supply pipe

124b‧‧‧沖洗氣體供給管 124b‧‧‧ flushing gas supply pipe

125a‧‧‧沖洗氣體供給裝置 125a‧‧‧ flushing gas supply device

125b‧‧‧沖洗氣體供給裝置 125b‧‧‧ flushing gas supply device

127‧‧‧排氣管 127‧‧‧Exhaust pipe

128‧‧‧氧濃度計 128‧‧‧Oxygen concentration meter

129‧‧‧抽吸裝置 129‧‧‧ suction device

200‧‧‧成形裝置 200‧‧‧Forming device

300‧‧‧切割裝置 300‧‧‧ cutting device

MG‧‧‧熔融玻璃 MG‧‧‧ molten glass

ST1‧‧‧熔解步驟 ST1‧‧‧melting step

ST2‧‧‧澄清步驟 ST2‧‧‧Clarification steps

ST3‧‧‧均質化步驟 ST3‧‧‧ homogenization steps

ST4‧‧‧供給步驟 ST4‧‧‧ supply steps

ST5‧‧‧成形步驟 ST5‧‧‧ forming steps

ST6‧‧‧緩冷步驟 ST6‧‧‧ Slow cooling step

ST7‧‧‧切割步驟 ST7‧‧‧ cutting steps

圖1係表示玻璃基板之製造方法之流程之圖。 Fig. 1 is a view showing the flow of a method of manufacturing a glass substrate.

圖2係玻璃基板之製造裝置之概略圖。 2 is a schematic view showing a manufacturing apparatus of a glass substrate.

圖3係圖2所示之澄清管之概略圖。 Figure 3 is a schematic view of the clarification tube shown in Figure 2.

圖4係澄清管之長度方向之鉛垂剖視圖。 Figure 4 is a vertical cross-sectional view of the longitudinal direction of the clarification tube.

以下,對本發明之玻璃基板之製造方法及玻璃基板製造裝置進行說明。 Hereinafter, a method of producing a glass substrate and a glass substrate manufacturing apparatus of the present invention will be described.

再者,本發明之「處理裝置」包括熔解槽、澄清管、攪拌槽或成形裝置、及於該等裝置之間移送熔融玻璃之移送管、對該等裝置供給玻璃之供給管。處理裝置中之「處理」包括玻璃之熔解處理、熔融玻璃之澄清處理、攪拌處理、成形處理、及熔融玻璃之移送處理、供給處理。 Further, the "processing apparatus" of the present invention includes a melting tank, a clarification tube, a stirring tank or a forming device, and a transfer pipe for transferring molten glass between the devices, and a supply pipe for supplying the glass to the devices. The "treatment" in the processing apparatus includes melting treatment of glass, clarification treatment of molten glass, stirring treatment, molding processing, transfer processing of molten glass, and supply processing.

(玻璃基板之製造方法之整體概要) (Overall outline of the manufacturing method of the glass substrate)

圖1係表示本實施形態之玻璃基板之製造方法之步驟之一例之圖。玻璃基板之製造方法主要包括熔解步驟(ST1)、澄清步驟(ST2)、均質化步驟(ST3)、供給步驟(ST4)、成形步驟(ST5)、緩冷步驟 (ST6)、及切割步驟(ST7)。再者,亦可具有磨削步驟、研磨步驟、清洗步驟、檢查步驟、捆包步驟等。亦可視需要於捆包步驟中將所製造之玻璃基板積層,並搬送給買方業者。 Fig. 1 is a view showing an example of a procedure of a method for producing a glass substrate of the present embodiment. The manufacturing method of the glass substrate mainly includes a melting step (ST1), a clarification step (ST2), a homogenization step (ST3), a supply step (ST4), a forming step (ST5), and a slow cooling step. (ST6), and a cutting step (ST7). Further, it may have a grinding step, a grinding step, a washing step, an inspection step, a packing step, and the like. It is also possible to laminate the produced glass substrate in the packing step as needed and to transport it to the buyer.

於熔解步驟(ST1)中,藉由加熱玻璃原料而製造熔融玻璃。熔融玻璃之加熱可藉由通電加熱而進行,上述通電加熱係使熔融玻璃自身通電而使其發熱從而加熱。進而,亦可利用燃燒器之火焰輔助加熱而使玻璃原料熔解。 In the melting step (ST1), molten glass is produced by heating a glass raw material. The heating of the molten glass can be performed by electric heating, and the electric heating causes the molten glass itself to be energized to generate heat and to be heated. Further, the glass raw material may be melted by the flame assisted heating of the burner.

再者,熔融玻璃含有澄清劑。作為澄清劑,已知有氧化錫、亞砷酸、銻等,但並無特別限制。然而,就減輕環境負荷之方面而言,較佳為使用氧化錫作為澄清劑。 Further, the molten glass contains a clarifying agent. As the clarifying agent, tin oxide, arsenious acid, cerium, or the like is known, but is not particularly limited. However, in terms of reducing environmental load, it is preferred to use tin oxide as a fining agent.

於澄清步驟(ST2)中,藉由使熔融玻璃升溫,而產生含有熔融玻璃中所含之氧、CO2或SO2之泡。該泡吸收因澄清劑之還原反應所產生之氧而成長,浮起並釋放至熔融玻璃之液面。其後,於澄清步驟中,藉由使熔融玻璃之溫度降低,而使因澄清劑之還原反應而獲得之還原物質發生氧化反應。藉此,熔融玻璃中所殘存之泡中之氧氣等氣體成分被再吸收至熔融玻璃中,而使泡消失。利用澄清劑之氧化反應及還原反應係藉由控制熔融玻璃之溫度而進行。 In the clarification step (ST2), by heating the molten glass, a bubble containing oxygen, CO 2 or SO 2 contained in the molten glass is produced. The bubble absorbs and grows due to oxygen generated by the reduction reaction of the clarifying agent, floats and is released to the liquid surface of the molten glass. Thereafter, in the clarification step, the reducing substance obtained by the reduction reaction of the clarifying agent is oxidized by lowering the temperature of the molten glass. Thereby, the gas component such as oxygen in the bubble remaining in the molten glass is reabsorbed into the molten glass to cause the bubble to disappear. The oxidation reaction and the reduction reaction using the clarifying agent are carried out by controlling the temperature of the molten glass.

再者,澄清步驟亦可使用使存在於熔融玻璃之泡於減壓氛圍中成長而消泡之減壓消泡方式。減壓消泡方式於不使用澄清劑之方面有效。然而,減壓消泡方式會導致裝置複雜化及大型化。因此,較佳為採用使用澄清劑並使熔融玻璃溫度上升之澄清方法。 Further, the clarification step may also be a vacuum defoaming method in which the bubbles present in the molten glass are grown in a reduced pressure atmosphere to defoam. The vacuum defoaming mode is effective in not using a clarifying agent. However, the decompression and defoaming method causes the device to be complicated and enlarged. Therefore, it is preferred to use a clarifying method using a clarifying agent to raise the temperature of the molten glass.

於均質化步驟(ST3)中,藉由使用攪拌器攪拌熔融玻璃,而進行玻璃成分之均質化。藉此,可減少導致產生條紋等之玻璃之組成不均。 In the homogenization step (ST3), the glass component is homogenized by stirring the molten glass using a stirrer. Thereby, the composition unevenness of the glass which causes streaks etc. can be reduced.

於供給步驟(ST4)中,將經攪拌後之熔融玻璃供給至成形裝置。 In the supplying step (ST4), the molten glass after the stirring is supplied to the forming apparatus.

成形步驟(ST5)及緩冷步驟(ST6)係利用成形裝置而進行。 The molding step (ST5) and the slow cooling step (ST6) are performed by a molding apparatus.

於成形步驟(ST5)中,使熔融玻璃成形為薄片玻璃,而形成薄片玻璃之流動。成形使用溢流下拉法。 In the forming step (ST5), the molten glass is formed into a sheet glass to form a flow of the sheet glass. Forming uses an overflow down-draw method.

於緩冷步驟(ST6)中,使成形而流動之薄片玻璃成為所需厚度,以不發生內部應變之方式,進而以不發生翹曲之方式進行冷卻。 In the slow cooling step (ST6), the sheet glass which is formed and flows is made to have a desired thickness, and the inner strain is not generated, and the film is cooled without causing warpage.

於切割步驟(ST7)中,藉由將緩冷後之薄片玻璃切割成特定長度,而獲得板狀之玻璃基板。進而將切割而成之玻璃基板切割成特定尺寸,而製造目標尺寸之玻璃基板。 In the cutting step (ST7), a plate-shaped glass substrate is obtained by cutting the slowly cooled sheet glass into a specific length. Further, the cut glass substrate is cut into a specific size to produce a glass substrate of a target size.

圖2係進行本實施形態中之熔解步驟(ST1)~切割步驟(ST7)之玻璃基板之製造裝置之概略圖。如圖2所示,玻璃基板之製造裝置主要包括熔解裝置100、成形裝置200、及切割裝置300。熔解裝置100包括熔解槽101、澄清管120、攪拌槽103、移送管104、105、及玻璃供給管106。 Fig. 2 is a schematic view showing a manufacturing apparatus of a glass substrate which performs the melting step (ST1) to the cutting step (ST7) in the present embodiment. As shown in FIG. 2, the manufacturing apparatus of a glass substrate mainly includes the melting apparatus 100, the shaping apparatus 200, and the cutting apparatus 300. The melting apparatus 100 includes a melting tank 101, a clarification pipe 120, a stirring tank 103, transfer pipes 104 and 105, and a glass supply pipe 106.

於圖2所示之熔解槽101設置有未圖示之燃燒器等加熱機構。對熔解槽投入添加有澄清劑之玻璃原料,進行熔解步驟(ST1)。將於熔解槽101熔融之熔融玻璃經由移送管104供給至澄清管120。 A heating mechanism such as a burner (not shown) is provided in the melting tank 101 shown in Fig. 2 . A glass raw material to which a clarifying agent is added is introduced into the melting tank, and a melting step (ST1) is performed. The molten glass to be melted in the melting tank 101 is supplied to the clarification pipe 120 via the transfer pipe 104.

於澄清管120中,調整熔融玻璃MG之溫度,利用澄清劑之氧化還原反應進行熔融玻璃之澄清步驟(ST2)。將澄清後之熔融玻璃經由移送管105供給至攪拌槽。 In the clarification pipe 120, the temperature of the molten glass MG is adjusted, and the clarification step (ST2) of the molten glass is performed by the oxidation-reduction reaction of the clarifying agent. The clarified molten glass is supplied to the stirring tank via the transfer pipe 105.

於攪拌槽103中,利用攪拌器103a攪拌熔融玻璃而進行均質化步驟(ST3)。將於攪拌槽103中經均質化後之熔融玻璃經由玻璃供給管106供給至成形裝置200(供給步驟ST4)。 In the stirring tank 103, the molten glass is stirred by the stirrer 103a, and the homogenization process (ST3) is performed. The molten glass which has been homogenized in the agitation tank 103 is supplied to the molding apparatus 200 via the glass supply pipe 106 (supply step ST4).

於成形裝置200中,藉由溢流下拉法,自熔融玻璃成形為薄片玻璃(成形步驟ST5),並進行緩冷(緩冷步驟ST6)。 In the molding apparatus 200, the molten glass is formed into a sheet glass by the overflow down-draw method (forming step ST5), and gentle cooling is performed (slow cooling step ST6).

於切割裝置300中,形成自薄片玻璃切出之板狀之玻璃基板(切割步驟ST7)。 In the cutting device 300, a plate-shaped glass substrate cut out from the sheet glass is formed (cutting step ST7).

(澄清管之構成) (constitution of clarification pipe)

接下來,參照圖3、圖4,對澄清管120之構成進行說明。圖3係表示實施形態之澄清管120之構成之概略圖,圖4係澄清管120之長度方向之鉛垂剖視圖。 Next, the configuration of the clarification pipe 120 will be described with reference to Figs. 3 and 4 . 3 is a schematic view showing the configuration of the clarification pipe 120 of the embodiment, and FIG. 4 is a vertical cross-sectional view of the clarification pipe 120 in the longitudinal direction.

如圖3、圖4所示,於澄清管120之長度方向之兩端之外周面設置有電極121a、121b,於澄清管120之與氣相空間接觸之壁,設置有排氣管127。 As shown in FIGS. 3 and 4, electrodes 121a and 121b are provided on the outer peripheral surface of both ends of the clarification pipe 120 in the longitudinal direction, and an exhaust pipe 127 is provided on the wall of the clarification pipe 120 that is in contact with the gas phase space.

澄清管120之本體、電極121a、121b、及排氣管127由鉑族金屬構成。再者,於本說明書中,「鉑族金屬」係指含有鉑族元素之金屬,作為不僅包含由單一之鉑族元素構成之金屬亦包含鉑族元素之合金之用語而使用。此處,鉑族元素係指鉑(Pt)、鈀(Pd)、銠(Rh)、釕(Ru)、鋨(Os)、銥(Ir)等6種元素。鉑族金屬雖然昂貴,但熔點較高,對熔融玻璃之耐蝕性亦優異。 The body of the clarification tube 120, the electrodes 121a, 121b, and the exhaust pipe 127 are made of a platinum group metal. In the present specification, the term "platinum group metal" means a metal containing a platinum group element, and is used as a term which includes not only a metal composed of a single platinum group element but also an alloy containing a platinum group element. Here, the platinum group element means six elements such as platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), osmium (Os), and iridium (Ir). Although the platinum group metal is expensive, it has a high melting point and is excellent in corrosion resistance to molten glass.

再者,於本實施例中,將澄清管120由鉑族金屬構成之情形作為具體例而進行說明,但澄清管120之一部分亦可由耐火物或其他金屬等構成。 Further, in the present embodiment, the case where the clarification pipe 120 is composed of a platinum group metal will be described as a specific example, but a part of the clarification pipe 120 may be composed of a refractory or other metal.

電極121a、121b連接於電源裝置122。藉由對電極121a、121b之間施加電壓,而使電流流至電極121a、121b之間之澄清管120,而對澄清管120通電加熱。藉由該通電加熱,以使澄清管120之本體之最高溫度例如成為1600℃~1750℃、更佳為1630℃~1750℃之方式進行加熱,將自移送管104供給之熔融玻璃之最高溫度加熱至適合消泡之溫度例如1600℃~1720℃、更佳為1620℃~1720℃。 The electrodes 121a and 121b are connected to the power supply device 122. A voltage is applied between the electrodes 121a and 121b to cause a current to flow to the clarification tube 120 between the electrodes 121a and 121b, and the clarification tube 120 is electrically heated. By the electric heating, the maximum temperature of the main body of the clarification pipe 120 is heated to, for example, 1600 ° C to 1750 ° C, more preferably 1630 ° C to 1750 ° C, and the maximum temperature of the molten glass supplied from the transfer pipe 104 is heated. The temperature suitable for defoaming is, for example, 1600 ° C to 1720 ° C, more preferably 1620 ° C to 1720 ° C.

又,藉由利用通電加熱控制熔融玻璃之溫度,而調節熔融玻璃之黏度,藉此,可調節通過澄清管120之熔融玻璃之流速。 Further, by controlling the temperature of the molten glass by electric heating, the viscosity of the molten glass is adjusted, whereby the flow rate of the molten glass passing through the clarification pipe 120 can be adjusted.

又,亦可於電極121a、121b設置有未圖示之溫度測量裝置(熱電偶等)。溫度測量裝置測量電極121a、121b之溫度,並將測量所得之結果輸出至控制裝置123。 Further, a temperature measuring device (such as a thermocouple) (not shown) may be provided on the electrodes 121a and 121b. The temperature measuring device measures the temperatures of the electrodes 121a, 121b, and outputs the measured results to the control device 123.

控制裝置123控制電源裝置122使澄清管120通電之電流量,藉此控制通過澄清管120之熔融玻璃之溫度及流速。控制裝置123為包含CPU(Central Processing Unit,中央處理單元)、記憶體等之電腦。 The control device 123 controls the amount of current that the power supply unit 122 energizes the clarification tube 120, thereby controlling the temperature and flow rate of the molten glass passing through the clarification tube 120. The control device 123 is a computer including a CPU (Central Processing Unit), a memory, and the like.

再者,於本實施形態中,亦可於電極121a設置有沖洗氣體供給管124a,該沖洗氣體供給管124a係用以對澄清管120內之熔融玻璃之液面上方之氣相空間120a供給除氧氣以外之氣體(沖洗氣體)。同樣地,亦可於電極121b設置有沖洗氣體供給管124b,該沖洗氣體供給管124b係用以對澄清管120內之熔融玻璃之液面上方之氣相空間120a供給沖洗氣體。 Further, in the present embodiment, the electrode 121a may be provided with a flushing gas supply pipe 124a for supplying the gas phase space 120a above the liquid surface of the molten glass in the clarification pipe 120. A gas other than oxygen (flush gas). Similarly, the electrode 121b may be provided with a flushing gas supply pipe 124b for supplying a flushing gas to the gas phase space 120a above the liquid surface of the molten glass in the clarification pipe 120.

沖洗氣體供給管124a與沖洗氣體供給裝置125a連接,自沖洗氣體供給裝置125a經由沖洗氣體供給管124a對澄清管120內之氣相空間120a從熔融玻璃之上游側供給沖洗氣體。同樣地,沖洗氣體供給管124b與沖洗氣體供給裝置125b連接,自沖洗氣體供給裝置125b經由沖洗氣體供給管124b對澄清管120內之氣相空間120a從熔融玻璃之下游側供給沖洗氣體。 The flushing gas supply pipe 124a is connected to the flushing gas supply device 125a, and the flushing gas supply device 125a supplies the flushing gas from the upstream side of the molten glass to the vapor phase space 120a in the clarification pipe 120 via the flushing gas supply pipe 124a. Similarly, the flushing gas supply pipe 124b is connected to the flushing gas supply device 125b, and the flushing gas supply device 125b supplies the flushing gas from the downstream side of the molten glass to the vapor phase space 120a in the clarification pipe 120 via the flushing gas supply pipe 124b.

藉由調節沖洗氣體供給管124a、124b之內徑,可調節自沖洗氣體供給管124a、124b供給之沖洗氣體之量。 The amount of the flushing gas supplied from the flushing gas supply pipes 124a, 124b can be adjusted by adjusting the inner diameters of the flushing gas supply pipes 124a, 124b.

作為沖洗氣體,可使用除氧氣以外之氣體,尤其係對鉑族金屬而言為惰性之氣體、與鉑族金屬之反應性較氧氣低之氣體。具體而言,可使用氮氣(N2)、稀有氣體(例如氬氣(Ar))、一氧化碳(CO)等。就易操作性而言,較佳為採用N2氣體。另一方面,沖洗氣體於澄清步驟、或澄清後使玻璃溫度降低之步驟中,溶入至溶融玻璃。與N2相比,Ar或CO易於在玻璃結構中移動。因此,即便於溶入至熔融玻璃中之沖洗氣體作為氣泡而產生之情形時,於熔融玻璃之移送中亦容易再次被吸入至玻璃中,就泡品質方面而言,亦可採用Ar。再者,圖4中作為沖洗氣體以氮氣為例進行記載。 As the flushing gas, a gas other than oxygen can be used, and in particular, a gas which is inert to the platinum group metal and a gas which is less reactive with the platinum group metal than oxygen. Specifically, nitrogen (N 2 ), a rare gas (for example, argon (Ar)), carbon monoxide (CO), or the like can be used. In terms of ease of handling, it is preferred to use N 2 gas. On the other hand, the flushing gas is dissolved in the molten glass in the step of lowering the glass temperature after the clarification step or clarification. Ar or CO tends to move in the glass structure compared to N 2 . Therefore, even when the flushing gas dissolved in the molten glass is generated as a bubble, it is easily sucked into the glass again during the transfer of the molten glass, and Ar can also be used in terms of the bubble quality. In addition, in FIG. 4, nitrogen gas is mentioned as a flushing gas as an example.

沖洗氣體供給裝置125a、125b由控制裝置123控制,從而調整沖洗氣體之供給量、供給壓力。 The flushing gas supply devices 125a and 125b are controlled by the control device 123 to adjust the supply amount and supply pressure of the flushing gas.

於澄清管120之與氣相空間接觸之壁,設置有排氣管127。排氣管127設置於氣相空間120a之上部。排氣管127較佳為設置於澄清管120中之熔融玻璃之流動方向之上游側端部與下游側端部之間之位置。排氣管127亦可為自澄清管120之本體外壁面朝外側呈煙囪狀地突出之形狀。排氣管127將氣相空間120a(參照圖4)與澄清管120之外部空間連通。 An exhaust pipe 127 is provided in the wall of the clarification pipe 120 that is in contact with the gas phase space. The exhaust pipe 127 is disposed above the gas phase space 120a. The exhaust pipe 127 is preferably disposed between the upstream end portion and the downstream end portion in the flow direction of the molten glass in the clarification pipe 120. The exhaust pipe 127 may also have a shape protruding from the outer wall surface of the clarification pipe 120 toward the outer side in a chimney shape. The exhaust pipe 127 communicates the gas phase space 120a (refer to FIG. 4) with the outer space of the clarification pipe 120.

於排氣管127設置有抽吸氣相空間120a內之氣體之抽吸裝置129。藉由利用抽吸裝置129對排氣管127側減壓(例如較大氣壓減壓10Pa左右),可有效率地排出氣相空間120a內之氧氣及沖洗氣體。抽吸裝置129由控制裝置123控制。藉由控制抽吸裝置129之抽吸壓,可降低氣相空間120a內之氧之濃度(氧分壓)。又,藉由控制抽吸壓,可調節自沖洗氣體供給裝置125a、125b供給至氣相空間120a之沖洗氣體之量。 A suction device 129 for sucking gas in the gas phase space 120a is provided in the exhaust pipe 127. By decompressing the exhaust pipe 127 side by the suction device 129 (for example, a pressure reduction of about 10 Pa by a large air pressure), the oxygen gas and the flushing gas in the gas phase space 120a can be efficiently discharged. The suction device 129 is controlled by the control device 123. By controlling the suction pressure of the suction device 129, the concentration of oxygen (oxygen partial pressure) in the gas phase space 120a can be lowered. Further, by controlling the suction pressure, the amount of the flushing gas supplied from the flushing gas supply means 125a, 125b to the gas phase space 120a can be adjusted.

於排氣管127設置有氧濃度計128。氧濃度計128測量自排氣管127抽吸之氣體之氧濃度,並將其測量信號輸出至控制裝置123。再者,於不對氣相空間120a供給沖洗氣體之情形時,亦可測量自排氣管127抽吸之氣體中之氧分壓。 An oxygen concentration meter 128 is provided in the exhaust pipe 127. The oxygen concentration meter 128 measures the oxygen concentration of the gas sucked from the exhaust pipe 127, and outputs a measurement signal thereof to the control device 123. Further, when the flushing gas is not supplied to the gas phase space 120a, the partial pressure of oxygen in the gas sucked from the exhaust pipe 127 can also be measured.

於本實施形態中,藉由自排氣管127抽吸氣相空間120a內之氣體,可排出自澄清管120內之熔融玻璃釋放之氧。又,藉由自沖洗氣體供給管124a及沖洗氣體供給管124b對氣相空間120a供給沖洗氣體,可降低氣相空間120a之氧濃度。藉此,可抑制鉑族金屬被氧化而揮發,從而減少因揮發之鉑族金屬被還原而引起之鉑族金屬之析出量。 In the present embodiment, the oxygen released from the molten glass in the clarification pipe 120 can be discharged by sucking the gas in the gas phase space 120a from the exhaust pipe 127. Further, by supplying the flushing gas to the gas phase space 120a from the flushing gas supply pipe 124a and the flushing gas supply pipe 124b, the oxygen concentration in the gas phase space 120a can be lowered. Thereby, the platinum group metal can be suppressed from being volatilized by oxidation, thereby reducing the amount of precipitation of the platinum group metal caused by the reduction of the volatilized platinum group metal.

此處,於本實施形態中,利用氧濃度計128測量自排氣管127排出之氣體之氧濃度,以使氧濃度成為固定範圍(例如5.0%以下之範圍)之方式,調節沖洗氣體之供給量。即,將利用氧濃度計128測量所得 之氧濃度之信號輸出至控制裝置123,控制裝置123根據氧濃度之信號控制沖洗氣體供給裝置125a、125b,從而調整沖洗氣體之供給量、供給壓力。 Here, in the present embodiment, the oxygen concentration of the gas discharged from the exhaust pipe 127 is measured by the oxygen concentration meter 128, and the supply of the flushing gas is adjusted so that the oxygen concentration becomes a fixed range (for example, a range of 5.0% or less). the amount. That is, it will be measured by the oxygen concentration meter 128. The signal of the oxygen concentration is output to the control device 123, and the control device 123 controls the flushing gas supply devices 125a and 125b based on the signal of the oxygen concentration to adjust the supply amount and the supply pressure of the flushing gas.

較佳為,以使自排氣管127抽吸之氣體之氧濃度成為5.0%以下之範圍之方式,調節自排氣口之抽吸壓力或沖洗氣體之供給量。若氧濃度大於5.0%,則會促進鉑族金屬之揮發,而有揮發之鉑族金屬之析出量增大之虞。 Preferably, the suction pressure from the exhaust port or the supply amount of the flushing gas is adjusted so that the oxygen concentration of the gas sucked from the exhaust pipe 127 is in the range of 5.0% or less. If the oxygen concentration is more than 5.0%, the volatilization of the platinum group metal is promoted, and the precipitation amount of the volatilized platinum group metal is increased.

又,為了更加抑制鉑族之揮發及析出,較佳為以使氧濃度成為3.0%以下之範圍之方式調節沖洗氣體之供給量。於用於製造高解析度顯示器之玻璃基板中,連粗細(直徑)未達1μm之微小缺陷亦不容許,藉由將氧濃度設為3.0%以下,可防止產生粗細(直徑)未達1μm之針狀之鉑缺陷。 Moreover, in order to further suppress the volatilization and precipitation of the platinum group, it is preferable to adjust the supply amount of the flushing gas so that the oxygen concentration becomes 3.0% or less. In the glass substrate for manufacturing a high-resolution display, fine defects having a thickness (diameter) of less than 1 μm are not allowed, and by setting the oxygen concentration to 3.0% or less, the thickness (diameter) of less than 1 μm can be prevented from being generated. Needle-shaped platinum defects.

再者,若以使氧濃度未達0.1%之方式供給沖洗氣體,則藉由沖洗氣體使澄清管120之溫度降低。又,藉由增大沖洗氣體供給量、流速,對熔融玻璃之液面吹送沖洗氣體,使沖洗氣體溶入至熔融玻璃。這樣一來,當熔融玻璃之溫度降低時,有產生溶入之沖洗氣體之氣泡之虞。因此,較佳為以使氧濃度成為0.1%以上之方式調節沖洗氣體之供給量。為了抑制因沖洗氣體使澄清管120溫度降低,並且抑制因溶入之沖洗氣體產生氣泡,尤佳為以使氧濃度成為1%以上之方式調節沖洗氣體之供給量。 Further, when the flushing gas is supplied so that the oxygen concentration is less than 0.1%, the temperature of the clarification tube 120 is lowered by the flushing gas. Further, by increasing the supply amount and flow rate of the flushing gas, the flushing gas is blown to the liquid surface of the molten glass, and the flushing gas is dissolved in the molten glass. As a result, when the temperature of the molten glass is lowered, there is a bubble which causes a bubble of the dissolved flushing gas. Therefore, it is preferable to adjust the supply amount of the flushing gas so that the oxygen concentration becomes 0.1% or more. In order to suppress the temperature of the clarification pipe 120 from being lowered by the flushing gas and to suppress generation of bubbles by the flushing gas to be dissolved, it is particularly preferable to adjust the supply amount of the flushing gas so that the oxygen concentration becomes 1% or more.

根據以上情況,較佳為以使氧濃度成為0.1%以上且3.0%以下之範圍之方式調節沖洗氣體之供給量,更佳為以使氧濃度成為1%以上且3.0%以下之範圍之方式調節沖洗氣體之供給量。 In the above case, it is preferable to adjust the supply amount of the flushing gas so that the oxygen concentration is in the range of 0.1% or more and 3.0% or less, and more preferably, the oxygen concentration is adjusted to be in the range of 1% or more and 3.0% or less. The amount of flushing gas supplied.

為了防止熔融玻璃之冷卻,較佳為於使自沖洗氣體供給裝置125a、125b供給之沖洗氣體流入至氣相空間120a之前將其預熱。沖洗氣體之預熱溫度例如較佳為預熱至500℃以上。 In order to prevent the cooling of the molten glass, it is preferable to preheat the flushing gas supplied from the flushing gas supply devices 125a and 125b before flowing into the vapor phase space 120a. The preheating temperature of the flushing gas is preferably, for example, preheated to 500 ° C or higher.

由於自澄清管120內之熔融玻璃釋放之氧之量於熔融玻璃之上游側較下游側多,故而較佳為使自熔融玻璃之上游側供給之沖洗氣體較自熔融玻璃之下游側供給之沖洗氣體多。即,較佳為使自沖洗氣體供給管124a供給之沖洗氣體之量較自沖洗氣體供給管124b供給之沖洗氣體之量多。藉由使自沖洗氣體供給管124a供給之沖洗氣體之量較自沖洗氣體供給管124b供給之沖洗氣體之量多,可更有效率地利用沖洗氣體稀釋並排出自熔融玻璃釋放之氧。 Since the amount of oxygen released from the molten glass in the clarification pipe 120 is more on the upstream side than the downstream side of the molten glass, it is preferable to supply the flushing gas supplied from the upstream side of the molten glass to the downstream side from the molten glass. More gas. That is, it is preferable that the amount of the flushing gas supplied from the flushing gas supply pipe 124a is larger than the amount of the flushing gas supplied from the flushing gas supply pipe 124b. By making the amount of the flushing gas supplied from the flushing gas supply pipe 124a larger than the amount of the flushing gas supplied from the flushing gas supply pipe 124b, it is possible to more efficiently dilute and discharge the oxygen released from the molten glass by the flushing gas.

以上,對本發明之玻璃基板之製造方法進行了詳細說明,但本發明並不限定於上述實施形態,當然亦可於不脫離本發明之主旨之範圍內,進行各種改良或變更。於上述說明中,作為處理裝置,以澄清管為例進行了說明,但本發明並不限於此,亦可對熔解槽、攪拌槽或成形裝置、移送管、供給管應用本發明。 The method of producing the glass substrate of the present invention has been described in detail above, but the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention. In the above description, the clarification pipe has been described as an example of the treatment device. However, the present invention is not limited thereto, and the present invention may be applied to a melting tank, a stirring tank, a molding apparatus, a transfer pipe, and a supply pipe.

利用本實施形態之製造方法製造之玻璃基板例如較佳地用於液晶顯示器用玻璃基板、有機EL(electro luminescence,電致發光)顯示器用玻璃基板、覆蓋玻璃。再者,亦可用作移動終端機器等之顯示器或殼體用覆蓋玻璃、觸控面板、太陽電池之玻璃基板或覆蓋玻璃。尤其,適合於使用多晶矽TFT(Thin Film Transistor,薄膜電晶體)之液晶顯示器用玻璃基板。 The glass substrate produced by the production method of the present embodiment is preferably used, for example, as a glass substrate for a liquid crystal display, a glass substrate for an organic EL (electroluminescence) display, or a cover glass. Further, it can also be used as a cover glass for a mobile terminal device or the like, a cover glass for a casing, a glass substrate for a solar cell, or a cover glass. In particular, it is suitable for a glass substrate for a liquid crystal display using a polycrystalline silicon TFT (Thin Film Transistor).

104‧‧‧移送管 104‧‧‧Transfer tube

105‧‧‧移送管 105‧‧‧Transfer tube

120‧‧‧澄清槽 120‧‧‧Clarification tank

121a‧‧‧電極 121a‧‧‧electrode

121b‧‧‧電極 121b‧‧‧electrode

122‧‧‧電源裝置 122‧‧‧Power supply unit

123‧‧‧控制裝置 123‧‧‧Control device

124a‧‧‧沖洗氣體供給管 124a‧‧‧ flushing gas supply pipe

124b‧‧‧沖洗氣體供給管 124b‧‧‧ flushing gas supply pipe

125a‧‧‧沖洗氣體供給裝置 125a‧‧‧ flushing gas supply device

125b‧‧‧沖洗氣體供給裝置 125b‧‧‧ flushing gas supply device

127‧‧‧排氣管 127‧‧‧Exhaust pipe

128‧‧‧氧濃度計 128‧‧‧Oxygen concentration meter

129‧‧‧抽吸裝置 129‧‧‧ suction device

Claims (9)

一種玻璃基板之製造方法,其係使用處理熔融玻璃之處理裝置而處理熔融玻璃,當處理熔融玻璃時,以於熔融玻璃之液面之上部形成氣相空間之方式,對內壁之至少一部分包含含有鉑族金屬之材料之處理裝置之內部供給熔融玻璃,藉由自連接上述氣相空間與上述處理裝置之外部空間之排氣口抽吸上述氣相空間內之氣體,使對於鉑族金屬為惰性之氣體流入至上述氣相空間,測量自上述排氣口抽吸之氣體中之氧濃度,以使上述氧濃度成為5.0%以下之範圍之方式,調節上述對於鉑族金屬為惰性之氣體朝上述氣相空間之流入量。 A method for producing a glass substrate, which comprises treating a molten glass by using a processing device for treating molten glass, and when processing the molten glass, forming a gas phase space at a portion above the liquid surface of the molten glass, and including at least a part of the inner wall The inside of the processing device for the material containing the platinum group metal is supplied with the molten glass, and the gas in the gas phase space is sucked from the exhaust port connecting the gas phase space and the outer space of the processing device, so that the platinum group metal is The inert gas flows into the gas phase space, and the oxygen concentration in the gas sucked from the exhaust port is measured, so that the gas having the inertness to the platinum group metal is adjusted so that the oxygen concentration is in the range of 5.0% or less. The inflow amount of the above gas phase space. 如請求項1之玻璃基板之製造方法,其中以使上述氧濃度成為5.0%以下之範圍之方式調整自上述排氣口之抽吸壓力。 The method for producing a glass substrate according to claim 1, wherein the suction pressure from the exhaust port is adjusted so that the oxygen concentration is in a range of 5.0% or less. 如請求項2之玻璃基板之製造方法,其中以使上述氧濃度成為0.1%以上且3.0%以下之範圍之方式調節上述對於鉑族金屬為惰性之氣體之供給量。 The method for producing a glass substrate according to claim 2, wherein the supply amount of the gas inert to the platinum group metal is adjusted so that the oxygen concentration is in a range of 0.1% or more and 3.0% or less. 如請求項2或3之玻璃基板之製造方法,其中對上述處理裝置自上述熔融玻璃之上游側及下游側向上述氣相空間供給對於鉑族金屬為惰性之氣體。 The method for producing a glass substrate according to claim 2 or 3, wherein the processing means supplies a gas inert to the platinum group metal to the gas phase space from the upstream side and the downstream side of the molten glass. 如請求項4之玻璃基板之製造方法,其中使自上述熔融玻璃之上游側供給之上述對於鉑族金屬為惰性之氣體較自上述熔融玻璃之下游側供給之上述對於鉑族金屬為惰性之氣體多。 The method for producing a glass substrate according to claim 4, wherein the gas which is inert to the platinum group metal supplied from the upstream side of the molten glass is supplied to the gas which is inert to the platinum group metal from the downstream side of the molten glass many. 如請求項1至5中任一項之玻璃基板之製造方法,其中於使上述 對於鉑族金屬為惰性之氣體流入至上述氣相空間之前將其預熱。 The method for producing a glass substrate according to any one of claims 1 to 5, wherein The gas inert to the platinum group metal is preheated before flowing into the gas phase space. 如請求項6之玻璃基板之製造方法,其中於使上述對於鉑族金屬為惰性之氣體流入至上述氣相空間之前將其預熱至500℃以上。 The method of producing a glass substrate according to claim 6, wherein the gas inert to the platinum group metal is preheated to 500 ° C or higher before flowing into the gas phase space. 如請求項1至7中任一項之玻璃基板之製造方法,其中上述處理裝置係澄清上述熔融玻璃之澄清處理裝置,且上述澄清處理裝置中之上述熔融玻璃之最高溫度為1600~1720℃。 The method for producing a glass substrate according to any one of claims 1 to 7, wherein the processing device is a clarification processing device for clarifying the molten glass, and wherein the maximum temperature of the molten glass in the clarification treatment device is 1600 to 1720 °C. 一種玻璃基板之製造裝置,其使用對熔融玻璃進行澄清處理之澄清處理裝置而處理熔融玻璃,且包括:澄清處理裝置,其內壁之至少一部分包含含有鉑族金屬之材料,內部被供給熔融玻璃,並且於上述熔融玻璃之液面之上部形成氣相空間;氣體供給裝置,其對上述氣相空間供給除氧氣以外之氣體;排氣口,其連接上述氣相空間與上述澄清處理裝置之外部空間;抽吸裝置,其藉由自上述排氣口抽吸上述氣相空間內之氣體,使除氧氣以外之氣體流入至上述氣相空間;氧濃度計,其測量自上述排氣口抽吸之氣體中之氧濃度;及控制裝置,其根據上述氧濃度計之測量結果,以使上述氧濃度成為特定範圍之方式調節自上述排氣口之抽吸壓力。 A glass substrate manufacturing apparatus for treating molten glass using a clarification treatment apparatus for clarifying molten glass, and comprising: a clarification treatment apparatus, wherein at least a part of an inner wall thereof contains a material containing a platinum group metal, and the inside is supplied with molten glass And forming a gas phase space above the liquid surface of the molten glass; a gas supply device supplying a gas other than oxygen to the gas phase space; and an exhaust port connecting the gas phase space and the outside of the clarification treatment device a suction device that draws gas in the gas phase space from the exhaust port to cause a gas other than oxygen to flow into the gas phase space; an oxygen concentration meter that measures the suction from the exhaust port The oxygen concentration in the gas; and a control device that adjusts the suction pressure from the exhaust port so that the oxygen concentration is within a specific range based on the measurement result of the oxygen concentration meter.
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