TW201536867A - Polysiloxane copolymer and antistatic agent containing the same - Google Patents

Polysiloxane copolymer and antistatic agent containing the same Download PDF

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TW201536867A
TW201536867A TW103116591A TW103116591A TW201536867A TW 201536867 A TW201536867 A TW 201536867A TW 103116591 A TW103116591 A TW 103116591A TW 103116591 A TW103116591 A TW 103116591A TW 201536867 A TW201536867 A TW 201536867A
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amine
resin composition
polyoxyalkylene copolymer
anion
mercaptooxyethyl
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TWI638012B (en
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Takehide Kawamichi
Yuusuke Ishii
Rika Okada
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Koei Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/30Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen phosphorus-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/20Applications use in electrical or conductive gadgets
    • C08L2203/206Applications use in electrical or conductive gadgets use in coating or encapsulating of electronic parts

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  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
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Abstract

The present invention provides a novel polysiloxane copolymer and an antistatic agent containing the same, which imparts a high antistatic property to the resin. The polysiloxane copolymer is prepared by the copolymerization of onium salt represented by formula (1) and dialkoxy silane represented by formula (2). (wherein, Q+ represents a nitrogen cation or a phosphorus cation, R1 represents an alkyl group having 1 to 3 carbon atoms, R2 to R4 each individually represent an alkyl group having 1 to 8 carbon atoms, X represents an anion, m and n are independently an integer of 1 to 3); (wherein, R5 represents an alkyl group having 1 to 3 carbon atoms or phenyl group, and R6 represents an alkyl group having 1 to 3 carbon atoms).

Description

聚矽氧烷共聚物及含有前述聚矽氧烷共聚物之抗靜電劑 Polyoxyalkylene copolymer and antistatic agent containing the above polyoxyalkylene copolymer

本發明係有關於聚矽氧烷共聚物及含有前述聚矽氧烷共聚物之抗靜電劑。 The present invention relates to a polyoxyalkylene copolymer and an antistatic agent containing the aforementioned polyoxyalkylene copolymer.

專利文獻1及2中記載之聚矽氧烷化合物已為人知。專利文獻1中記載了將聚矽氧烷化合物使用於疏水性聚矽氧油等增黏劑.凝膠化劑。然而,關於前述聚矽氧烷化合物之抗靜電性方面則沒有記載。專利文獻2中,記載了含聚矽氧烷化合物之膜狀組成物展現出高抗靜電性。然而,本發明群將專利文獻2中記載之膜狀組成物作為抗靜電劑攪入樹脂來使用,結果得知其抗靜電性不夠充分(參照後述比較例)。 The polyoxyalkylene compounds described in Patent Documents 1 and 2 are known. Patent Document 1 describes the use of a polyoxyalkylene compound for a tackifier such as a hydrophobic polyoxygenated oil. Gelling agent. However, there is no description about the antistatic property of the aforementioned polyoxyalkylene compound. Patent Document 2 describes that a film-like composition containing a polyoxyalkylene compound exhibits high antistatic property. However, in the present invention, the film-like composition described in Patent Document 2 was used as an antistatic agent and stirred into a resin, and as a result, it was found that the antistatic property was insufficient (see a comparative example described later).

又,有報告指出,陽離子為具有三烷氧基矽基烷基之銨或鏻、且陰離子為全氟烷基磺醯基醯亞胺的鎓鹽,可作為丙烯酸樹脂用之低分子型抗靜電劑(參照專利文獻3)。然而,本發明群將屬於前述鎓鹽之1種的1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺作為聚矽氧樹脂抗靜電劑來使用的結果,得知雖可對聚矽氧樹脂賦予抗靜電性,然而聚矽氧樹脂的硬化反 應並未充分進行,並無法製得就光學用黏著劑而言具備實用性強度特性的聚矽氧樹脂組成物(參照後述比較例)。 In addition, it has been reported that the cation is an ammonium salt or a ruthenium having a trialkoxyalkylalkyl group, and the anion is a perfluoroalkyl sulfonyl ruthenium imine salt, which can be used as a low molecular type antistatic for acrylic resin. (see Patent Document 3). However, the present invention will belong to one of the aforementioned sulfonium salts of 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium=double As a result of using (trifluoromethanesulfonyl) quinone imine as an antistatic agent for a polyoxyxylene resin, it was found that although the antistatic property can be imparted to the polyoxyxene resin, the hardening of the polyoxyxylene resin is reversed. In the case of the optical adhesive, it is not possible to obtain a polyoxyxylene resin composition having practical strength characteristics (see the comparative example described later).

先前技術文獻 Prior technical literature 專利文獻 Patent literature

[專利文獻1]日本特許公開2006-199918號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-199918

[專利文獻2]日本特許公開2009-286815號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-286815

[專利文獻3]日本特許公開2013-28586號公報 [Patent Document 3] Japanese Patent Publication No. 2013-28586

本發明課題係提供一種可對樹脂賦予高抗靜電性之新穎聚矽氧烷共聚物、含有前述聚矽氧烷共聚物之抗靜電劑及含有前述抗靜電劑之樹脂組成物。又,本發明課題係提供一種聚矽氧樹脂組成物,其具有高抗靜電性,且具有就光學用黏著劑而言很實用的強度特性。 An object of the present invention is to provide a novel polyoxyalkylene copolymer which can impart high antistatic property to a resin, an antistatic agent containing the above polyoxyalkylene copolymer, and a resin composition containing the above antistatic agent. Further, an object of the present invention is to provide a polyoxyxylene resin composition which has high antistatic property and has practical strength properties for an optical adhesive.

本發明群為了解決上述課題而專精進行研討,發現使式(1)所示鎓鹽與式(2)所示二烷氧基矽烷共聚合而製得之聚矽氧烷共聚物。又發現到,將前述聚矽氧烷共聚物作為抗靜電劑而使用於聚碳酸酯樹脂、聚丙烯酸樹脂及聚矽氧樹脂時,可對各個樹脂賦予抗靜電性。進一步,本發明之已將聚矽氧烷共聚物摻混於聚矽氧樹脂而成之聚矽氧樹脂組成物,具有很高的抗靜電性,且具有就作為光學用黏著劑而言堪稱實用的強度特性,而完成了本發明。 In order to solve the above problems, the present invention has been specifically studied, and has found a polyoxyalkylene copolymer obtained by copolymerizing an onium salt represented by the formula (1) with a dialkoxysilane of the formula (2). Further, it has been found that when the polyoxyalkylene copolymer is used as an antistatic agent for a polycarbonate resin, a polyacrylic resin, and a polyoxyxylene resin, it is possible to impart antistatic properties to each of the resins. Further, the polyoxyxylene resin composition of the present invention in which a polyoxyalkylene copolymer has been blended with a polyoxyxylene resin has high antistatic property and is known as an optical adhesive. The present invention has been completed with practical strength characteristics.

亦即,本發明是有關於一種聚矽氧烷共聚物,係 將式(1)所示鎓鹽(以下稱鎓鹽(1))與式(2)所示二烷氧基矽烷(以下稱二烷氧基矽烷(2))共聚合而製得者,以及關於含有前述聚矽氧烷共聚物之抗靜電劑。 That is, the present invention relates to a polyoxyalkylene copolymer, A method of copolymerizing an onium salt represented by the formula (1) (hereinafter referred to as a phosphonium salt (1)) with a dialkoxysilane (hereinafter referred to as a dialkoxysilane (2)) represented by the formula (2), and Regarding an antistatic agent containing the aforementioned polyoxyalkylene copolymer.

一種聚矽氧烷共聚物,係將式(1)所示鎓鹽與式(2)所示二烷氧基矽烷共聚合而製得: A polyoxyalkylene copolymer obtained by copolymerizing an onium salt represented by the formula (1) with a dialkoxysilane of the formula (2):

(式中,Q+表示氮陽離子或磷陽離子,R1表示碳數1~3之烷基,R2~R4各自獨立,表示碳數1~8之烷基,X-表示陰離子,m及n各自獨立,為1~3之整數); (wherein, Q + represents a nitrogen cation or a phosphorus cation, R 1 represents an alkyl group having 1 to 3 carbon atoms, R 2 to R 4 are each independently, and represents an alkyl group having 1 to 8 carbon atoms; X - represents an anion, m and n are independent, an integer from 1 to 3);

(式中,R5表示碳數1~3之烷基或苯基,R6表示碳數1~3之烷基)。 (wherein R 5 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, and R 6 represents an alkyl group having 1 to 3 carbon atoms).

本發明之聚矽氧烷共聚物,藉由使用作為聚碳酸 酯樹脂、聚丙烯酸樹脂及聚矽氧樹脂之抗靜電劑,較之公知聚矽氧烷化合物,可賦予更高的抗靜電性。又,含有前述本發明之聚矽氧烷共聚物之聚矽氧樹脂組成物,具有很高的抗靜電性,且具有就作為光學用黏著劑而言很實用的強度特性。 The polyoxyalkylene copolymer of the present invention is used as a polycarbonate Antistatic agents for ester resins, polyacrylic resins, and polyoxyxylene resins impart higher antistatic properties than known polyoxyalkylene compounds. Further, the polyfluorene oxide resin composition containing the polyoxyalkylene copolymer of the present invention has high antistatic property and has practical strength properties as an optical adhesive.

以下,具體說明本發明。式(1)中,Q+表示氮陽離子或磷陽離子。R1為碳數1~3之烷基,具體而言可列舉甲基、乙基、丙基及異丙基,以甲基及乙基為佳。R2~R4表示碳數1~8之烷基,直鏈狀及支鏈狀之任一種皆可,以直鏈狀烷基為佳。具體而言,可列舉甲基、乙基、丙基、丁基、己基、辛基等,以甲基、乙基、丙基及丁基為佳。X-表示陰離子。具體而言,X-可列舉氯化物陰離子、溴化物陰離子、三氟甲磺酸陰離子、雙(全氟烷基磺醯基)醯亞胺陰離子、四氟硼酸鹽陰離子、六氟磷酸鹽陰離子等,以氯化物陰離子及雙(三氟甲磺醯基)醯亞胺陰離子為佳,雙(三氟甲磺醯基)醯亞胺陰離子較佳。 Hereinafter, the present invention will be specifically described. In the formula (1), Q + represents a nitrogen cation or a phosphorus cation. R 1 is an alkyl group having 1 to 3 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a propyl group and an isopropyl group, and a methyl group and an ethyl group are preferred. R 2 to R 4 each represent an alkyl group having 1 to 8 carbon atoms, and may be any of a linear chain and a branched chain, and a linear alkyl group is preferred. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, and an octyl group, and a methyl group, an ethyl group, a propyl group, and a butyl group are preferred. X - represents an anion. Specifically, X - may be exemplified by a chloride anion, a bromide anion, a trifluoromethanesulfonate anion, a bis(perfluoroalkylsulfonyl) quinone imine anion, a tetrafluoroborate anion, a hexafluorophosphate anion, or the like. Preferably, a chloride anion and a bis(trifluoromethanesulfonyl) quinone imide are preferred, and a bis(trifluoromethanesulfonyl) quinone imine is preferred.

式(2)中,R5表示碳數1~3之烷基或苯基。R5之具體例方面可列舉甲基、乙基、丙基及苯基,適宜為甲基及苯基。R6表示碳數1~3之烷基。具體而言,R6可列舉甲基、乙基及丙基,以甲基及乙基為佳。 In the formula (2), R 5 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group. Specific examples of R 5 include a methyl group, an ethyl group, a propyl group, and a phenyl group, and a methyl group and a phenyl group are preferable. R 6 represents an alkyl group having 1 to 3 carbon atoms. Specifically, R 6 may, for example, be a methyl group, an ethyl group or a propyl group, and preferably a methyl group or an ethyl group.

鎓鹽(1)之具體例方面,可列舉如下:1-{(3-三甲 氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1- 三丙基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物;1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=三氟 甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=三氟甲磺酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=三氟甲磺酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=三氟甲磺酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=三氟甲磺酸鹽;1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙 氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(三氟甲磺醯基)醯亞胺、1-{(3-三丙 氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(三氟甲磺醯基)醯亞胺;1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙 基}-1,1,1-三甲基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(九氟丁磺醯基)醯亞胺、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(九氟丁磺醯基)醯亞胺;1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=四氟硼 酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=四氟硼酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=四氟硼酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=四氟硼酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=四氟硼酸鹽;1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=六氟磷酸鹽、1-{(3-三乙氧矽基丙基) 胺甲醯基氧基乙基}-1,1,1-三甲基銨=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基 乙基}-1,1,1-三丙基鏻=六氟磷酸鹽、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=六氟磷酸鹽、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=六氟磷酸鹽、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=六氟磷酸鹽。不過本發明並不受該等之限定。 Specific examples of the strontium salt (1) can be enumerated as follows: 1-{(3-Third A) Oxalyl propyl)amine methyl decyloxyethyl}-1,1,1-trimethylammonium = chloride, 1-{(3-triethoxydecylpropyl)amine carbhydryloxy Ethyl}-1,1,1-trimethylammonium=chloride, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethyl Alkyl ammonium = chloride, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-triethylammonium = chloride, 1-{(3-three Ethoxypropyl propyl)amine methyl decyloxyethyl}-1,1,1-triethylammonium = chloride, 1-{(3-tripropoxydecylpropyl)amine methyl hydrazide Ethylethyl}-1,1,1-triethylammonium=chloride, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tripropyl Alkyl ammonium = chloride, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = chloride, 1-{(3- Tripropoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = chloride, 1-{(3-trimethoxydecylpropyl)amine methyl hydrazino Ethylethyl}-1,1,1-tributylammonium=chloride, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-three Butylammonium = chloride, 1-{(3-tripropoxydecylpropyl)amine methyl methoxyethyl}-1,1,1-tributylammonium = chlorine , 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylhydrazine=chloride, 1-{(3-triethoxyindolyl) Propyl)amine-methylmethyloxyethyl}-1,1,1-trimethylhydrazine=chloride, 1-{(3-tripropoxydecylpropyl)amine-methylcarbonyloxyethyl} -1,1,1-trimethylhydrazine=chloride, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=chlorine Compound, 1-{(3-triethoxydecylpropyl)amine,carboxyoxyethyl}-1,1,1-triethylhydrazine=chloride, 1-{(3-tripropoxyfluoride) Propyl)aminomethane oxyethyl}-1,1,1-triethylhydrazine=chloride, 1-{(3-trimethoxydecylpropyl)amine-methyl methoxyethyl} -1,1,1-Tripropyl hydrazine=chloride, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tripropyl hydrazine= Chloride, 1-{(3-tripropoxydecylpropyl)amine,carboxyoxyethyl}-1,1,1- Tripropyl hydrazine = chloride, 1-{(3-trimethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-tributylphosphonium chloride, 1-{(3 -triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium chloride, 1-{(3-tripropoxydecylpropyl)amine formazan Benzyloxyethyl}-1,1,1-tributylphosphonium chloride; 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1- Trimethylammonium = trifluoromethanesulfonate, 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = trifluoromethyl Sulfonic acid salt, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-trimethylammonium = trifluoromethanesulfonate, 1-{( 3-trimethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-triethylammonium = trifluoromethanesulfonate, 1-{(3-triethoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-triethylammonium = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropyl)amine methyl hydrazide }}-1,1,1-triethylammonium = trifluoromethanesulfonate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1- Tripropylammonium = trifluoromethanesulfonate, 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1- Propyl ammonium = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = trifluoromethanesulfonate Acid salt, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributylammonium = trifluoromethanesulfonate, 1-{(3- Triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tributylammonium = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-tributylammonium = trifluoromethanesulfonate, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl} -1,1,1-trimethylhydrazine=trifluoromethanesulfonate, 1-{(3-triethoxydecylpropyl)amine-methyldecyloxyethyl}-1,1,1-three Methyl hydrazine = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-trimethylhydrazine=trifluoro Methanesulfonate, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-triethylhydrazine=trifluoromethanesulfonate, 1-{( 3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropane) Aminomethylaminoethyl}-1,1,1-triethylhydrazine=trifluoromethanesulfonate, 1-{(3-trimethoxydecylpropyl)amine-methylcarbonyloxy }}-1,1,1-tripropyl hydrazine=trifluoromethanesulfonate, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1 -Tripropyl hydrazine = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropyl fluorene = trifluoro Methanesulfonate, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributylphosphonium = trifluoromethanesulfonate, 1-{( 3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium = trifluoromethanesulfonate, 1-{(3-tripropoxydecylpropane) Aminomethyl methoxyethyl}-1,1,1-tributylphosphonium = trifluoromethanesulfonate; 1-{(3-trimethoxydecylpropyl)amine methyl hydrazide +1,1,1-trimethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine Methyl methoxyethyl}-1,1,1-trimethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine formazan Hydroxyethyl}-1,1,1-trimethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine carbhydryloxy Ethyl}-1,1,1-triethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl }-1,1,1-Triethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine carbhydryloxyethyl}- 1,1,1-triethylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1 , 1-tripropylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tri-B Oxalyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium=bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxyfluoride) Alkyl)amine-methylmethyloxyethyl}-1,1,1-tripropylammonium=bis(trifluoromethanesulfonyl)indolide, 1-{(3-trimethoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-tributylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine Methyl methoxyethyl}-1,1,1-tributylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine formazan Ethoxyethyl}-1,1,1-tributylammonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxy Ethyl}-1,1,1-trimethylhydrazine=bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl }-1,1,1-trimethyl hydrazine=bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine carbhydryloxyethyl}- 1,1,1-trimethylsulfonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1 , 1-triethyl hydrazine = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine carbhydryl Oxyethyl}-1,1,1-triethylhydrazine=bis(trifluoromethanesulfonyl)indolide, 1-{(3-tripropoxydecylpropyl)aminecarboxyloxy Ethyl}-1,1,1-triethyl hydrazine=bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecyl propyl)amine methyl decyloxyethyl} -1,1,1-Tripropyl hydrazine = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecyl propyl)amine methionyloxyethyl}-1 1,1,1-Tripropyl hydrazine = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1 , 1-tripropyl hydrazine = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-trimethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1- Tributylphosphonium = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributyl Base 鏻 = bis(trifluoromethanesulfonyl) quinone imine, 1-{(3-tripropyl) Oxalyl propyl)amine methionyloxyethyl}-1,1,1-tributylphosphonium = bis(trifluoromethanesulfonyl) quinone imine; 1-{(3-trimethoxyindolyl) Propyl)amine-methylmethyloxyethyl}-1,1,1-trimethylammonium=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-trimethylammonium=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine Methyl methoxyethyl}-1,1,1-trimethylammonium=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine carbhydryl Oxyethyl}-1,1,1-triethylammonium=bis(nonafluorobutyrylsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)aminecarboxyloxy Ethyl}-1,1,1-triethylammonium=bis(nonafluorobutyrylsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl }-1,1,1-Triethylammonium = bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine-methyl methoxyethyl}-1 1,1,1-Tripropylammonium = bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1 , 1-tripropylammonium = bis(nonafluorobutyrylsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine carbenyl Oxyethyl}-1,1,1-tripropylammonium=bis(nonafluorobutyrylsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine methyl hydrazide -1}-1,1,1-tributylammonium=bis(nonafluorobutyrylsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl} -1,1,1-Tributylammonium = bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1 , 1,1-Tributylammonium = bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1, 1-trimethylhydrazine=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1- Trimethyl hydrazine = bis(nonafluorobutylsulfonyl) quinone imine, 1-{(3-tripropoxydecyl propyl)amine methyl hydrazide }}-1,1,1-trimethylhydrazine=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine-methyl methoxyethyl}- 1,1,1-triethylsulfonium = bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1, 1,1-triethylhydrazine=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1, 1-triethylhydrazine=bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-three Propyl 鏻 = bis(nonafluorobutylsulfonyl) quinone imine, 1-{(3-triethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropyl鏻=bis(nonafluorobutylsulfonyl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropyl hydrazine= Bis(nonafluorobutsulfonyl) quinone imine, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributyl fluorene=double (nine Fluorosulfonyl) quinone imine, 1-{(3-triethoxydecylpropyl)amine, decyloxyethyl}-1,1,1-tributylphosphonium=bis(nonafluorobutene) Sulfhydryl) quinone imine, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributyl fluorene=double Nonafluorobutyrylsulfonyl)imine; 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = tetrafluoroborate, 1-{(3-triethoxydecylpropyl)amine-methyl methoxyethyl}-1,1,1-trimethylammonium = tetrafluoroborate, 1-{(3-tripropoxyfluoride) Alkyl propyl)amine methionyloxyethyl}-1,1,1-trimethylammonium = tetrafluoroborate, 1-{(3-trimethoxydecylpropyl)amine carbhydryloxy }}-1,1,1-triethylammonium = tetrafluoroborate, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-three Ethylammonium = tetrafluoroborate, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-triethylammonium = tetrafluoroborate, 1 -{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tripropylammonium=tetrafluoroboron Acid salt, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = tetrafluoroborate, 1-{(3-three Propionyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = tetrafluoroborate, 1-{(3-trimethoxydecylpropyl)amine carbhydryl Oxyethyl}-1,1,1-tributylammonium = tetrafluoroborate, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1, 1-tributylammonium = tetrafluoroborate, 1-{(3-tripropoxydecylpropyl)amine-methyl methoxyethyl}-1,1,1-tributylammonium = tetrafluoroboric acid Salt, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylhydrazine=tetrafluoroborate, 1-{(3-triethoxy) Mercaptopropyl)amine mercaptooxyethyl}-1,1,1-trimethylhydrazine=tetrafluoroborate, 1-{(3-tripropoxydecylpropyl)aminecarboxyloxy Ethylethyl}-1,1,1-trimethylhydrazine=tetrafluoroborate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1- Triethyl hydrazine = tetrafluoroborate, 1-{(3-triethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-triethyl hydrazine = tetrafluoroborate, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=tetrafluoro Acid salt, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropyl hydrazine=tetrafluoroborate, 1-{(3-triethyl) Oxyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropyl hydrazine = tetrafluoroborate, 1-{(3-tripropoxydecylpropyl)amine carbhydryl Oxyethyl}-1,1,1-tripropylhydrazine=tetrafluoroborate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1 -tributyl hydrazine = tetrafluoroborate, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributylphosphonium = tetrafluoroborate , 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium=tetrafluoroborate; 1-{(3-trimethoxyoxanium) Propyl)amine methylmercaptooxyethyl}-1,1,1-trimethylammonium=hexafluorophosphate, 1-{(3-triethoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-trimethylammonium = hexafluorophosphate, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}- 1,1,1-trimethylammonium = hexafluorophosphate, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-triethylammonium = Hexafluorophosphate, 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-triethylammonium=hexafluorophosphate, 1-{(3 -tripropoxydecylpropyl)amine-methylmethyloxyethyl}-1,1,1-triethylammonium = hexafluorophosphate, 1-{(3-trimethoxydecylpropyl)amine A Mercaptooxyethyl}-1,1,1-tripropylammonium=hexafluorophosphate, 1-{(3-triethoxymercaptopropyl)amine-methyldecyloxyethyl}-1, 1,1-Tripropylammonium = hexafluorophosphate, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tripropylammonium=six Fluorophosphate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tributylammonium=hexafluorophosphate, 1-{(3-three Ethoxypropyl propyl)amine methyl decyloxyethyl}-1,1,1-tributylammonium = hexafluorophosphate, 1-{(3-tripropoxydecylpropyl)amine formazan Ethoxyethyl}-1,1,1-tributylammonium = hexafluorophosphate, 1-{(3-trimethoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-trimethyl hydrazine = hexafluorophosphate, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl} -1,1,1-trimethylsulfonium = hexafluorophosphate, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethyl鏻=hexafluorophosphate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=hexafluorophosphate, 1-{( 3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=hexafluorophosphate, 1-{(3-tripropoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-triethyl hydrazine = hexafluorophosphate, 1-{(3-trimethoxydecyl propyl)amine methyl decyloxyethyl}-1 1,1-Tripropyl hydrazine=hexafluorophosphate, 1-{(3-triethoxydecylpropyl)amine-methyl methoxyethyl}-1,1,1-tripropyl hydrazine= Hexafluorophosphate, 1-{(3-tripropoxydecylpropyl)amine,carboxamoxy Ethyl}-1,1,1-tripropyl hydrazine=hexafluorophosphate, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-three Butyl hydrazine = hexafluorophosphate, 1-{(3-triethoxymercaptopropyl)amine methyl decyloxyethyl}-1,1,1-tributylphosphonium = hexafluorophosphate, 1 -{(3-Tripropoxydecylpropyl)amine-methyldecyloxyethyl}-1,1,1-tributylphosphonium = hexafluorophosphate. However, the invention is not limited by the terms.

本發明中所使用的鎓鹽(1)可利用各種方法來製造。代表性的方法可舉:以式(4)所示鹼金屬鹽(以下稱鹼金屬鹽(4))將式(3)所示鎓鹽(以下稱鎓鹽(3))進行離子交換反應之方法。 The onium salt (1) used in the present invention can be produced by various methods. A representative method is an ion exchange reaction of an onium salt represented by the formula (3) (hereinafter referred to as a phosphonium salt (3)) with an alkali metal salt represented by the formula (4) (hereinafter referred to as an alkali metal salt (4)). method.

(式中,Q+、R1~R4、m及n同前述。Y-表示鹵素離子。) (wherein, Q + , R 1 to R 4 , m and n are the same as defined above. Y - represents a halogen ion.)

式(4):M+.X- (4) Equation (4): M + . X - (4)

(式中,M+表示鹼金屬離子。X-同前述。) (wherein M + represents an alkali metal ion. X - is the same as described above.)

鎓鹽(3)方面,可列舉出例如:1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯 基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基銨=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三乙基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丙基鏻=氯化物、1-{(3-三甲氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物、1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物、1-{(3-三丙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=氯化物等。 As the onium salt (3), for example, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = chloride, 1 -{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = chloride, 1-{(3-tripropoxydecylpropyl) Aminomethyl methoxyethyl}-1,1,1-trimethylammonium = chloride, 1-{(3-trimethoxydecylpropyl)amine-methyl methoxyethyl}-1, 1,1-triethylammonium = chloride, 1-{(3-triethoxydecylpropyl)amine formazan Benzyloxyethyl}-1,1,1-triethylammonium=chloride, 1-{(3-tripropoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1 -Triethylammonium = chloride, 1-{(3-trimethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tripropylammonium = chloride, 1-{( 3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tripropylammonium = chloride, 1-{(3-tripropoxydecylpropyl)amine A Mercaptooxyethyl}-1,1,1-tripropylammonium=chloride, 1-{(3-trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1 -tributylammonium = chloride, 1-{(3-triethoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributylammonium = chloride, 1-{ (3-tripropoxydecylpropyl)amine methyl methoxyethyl}-1,1,1-tributylammonium = chloride, 1-{(3-trimethoxydecylpropyl)amine A Mercaptooxyethyl}-1,1,1-trimethylhydrazine=chloride, 1-{(3-triethoxydecylpropyl)amine-methylcarbonyloxyethyl}-1,1, 1-trimethylhydrazine=chloride, 1-{(3-tripropoxydecylpropyl)amine-methyldecyloxyethyl}-1,1,1-trimethylhydrazine=chloride, 1- {(3-Trimethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-triethylhydrazine=chloride, 1-{(3-triethoxy) Alkyl)amine-methylmethyloxyethyl}-1,1,1-triethylhydrazine=chloride, 1-{(3-tripropoxydecylpropyl)amine-methylcarbonyloxyethyl }-1,1,1-Triethyl hydrazine=chloride, 1-{(3-trimethoxydecyl propyl)amine methyl decyloxyethyl}-1,1,1-tripropyl hydrazine= Chloride, 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tripropylhydrazine=chloride, 1-{(3-tripropoxygen) Mercaptopropyl)amine mercaptooxyethyl}-1,1,1-tripropylhydrazine=chloride, 1-{(3-trimethoxydecylpropyl)amine-methylcarbonyloxyethyl }-1,1,1-Tributylphosphonium = chloride, 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium = chloride, 1-{(3-tripropoxydecylpropyl)amine methyl decyloxyethyl}-1,1,1-tributylphosphonium chloride, and the like.

鹼金屬鹽(4)方面,可列舉出例如:三氟甲磺酸 鋰、三氟甲磺酸鈉、三氟甲磺酸鉀、雙三氟甲磺醯基醯亞胺鋰、雙三氟甲磺醯基醯亞胺鈉、雙三氟甲磺醯基醯亞胺鉀、雙九氟丁磺醯基醯亞胺鋰、雙九氟丁磺醯基醯亞胺鈉、雙九氟丁磺醯基醯亞胺鉀、四氟硼酸鋰、四氟硼酸鈉、四氟硼酸鉀、六氟磷酸鋰、六氟磷酸鈉、六氟磷酸鉀等。鹼金屬鹽(4)的使用量,係相對於鎓鹽(3)1莫耳,通常在0.8莫耳以上,以0.9~1.5莫耳為佳。 As the alkali metal salt (4), for example, trifluoromethanesulfonic acid can be cited. Lithium, sodium triflate, potassium trifluoromethanesulfonate, lithium bistrifluoromethanesulfonyl quinone, sodium bistrifluoromethanesulfonyl sulfoximine, bistrifluoromethanesulfonyl ruthenium Potassium, lithium hexafluorobutasulfonyl phthalimide, sodium bis-nonafluorobutasulfonyl sulphonide, potassium hexa-hexafluorobutanesulfonyl phthalimide, lithium tetrafluoroborate, sodium tetrafluoroborate, tetrafluoro Potassium borate, lithium hexafluorophosphate, sodium hexafluorophosphate, potassium hexafluorophosphate, and the like. The amount of the alkali metal salt (4) used is usually from 0.8 mol to 0.9 mol per mol of the bismuth salt (3), preferably from 0.9 to 1.5 mol.

離子交換反應通常在水溶劑中進行。水的使用量,相對於鎓鹽(3)1重量份,通常在20重量份以下,以0.5~10重量份為佳,特別以1~5重量份為佳。又,前述水溶劑中亦可使甲苯、醋酸乙酯、二氯甲烷等有機溶劑共存。 The ion exchange reaction is usually carried out in an aqueous solvent. The amount of water used is usually 20 parts by weight or less, preferably 0.5 to 10 parts by weight, particularly preferably 1 to 5 parts by weight, per part by weight of the cerium salt (3). Further, an organic solvent such as toluene, ethyl acetate or dichloromethane may be coexisted in the aqueous solvent.

鎓鹽(3)、鹼金屬鹽(4)及水的混合順序並沒有特別限定,可在混合了鎓鹽(3)與水之後添加鹼金屬鹽(4),也可在混合鹼金屬鹽(4)與水之後添加鎓鹽(3)。 The order of mixing the onium salt (3), the alkali metal salt (4), and water is not particularly limited, and the alkali metal salt (4) may be added after mixing the onium salt (3) with water, or the alkali metal salt may be mixed ( 4) Add barium salt (3) with water.

離子交換反應的反應溫度宜為高於生成之鎓鹽(1)熔點的溫度,通常10~80℃,以20~40℃為佳。反應時間方面通常在15分以上,以45分~3小時為佳。 The reaction temperature of the ion exchange reaction is preferably a temperature higher than the melting point of the produced cerium salt (1), usually 10 to 80 ° C, preferably 20 to 40 ° C. The reaction time is usually 15 minutes or more, preferably 45 minutes to 3 hours.

從反應終了後之反應混合物取出鎓鹽(1)的方法方面,可列舉以下方法。(i)若是反應液分液成有機層與水層的情況,則自反應液將有機層分離,依據期望將獲得之有機層水洗之後,藉由將水洗後之有機層濃縮,而製得鎓鹽(1)。(ii)若是反應液呈均勻的情況,則使用不溶於水且鎓鹽(1)可溶之有機溶劑將鎓鹽(1)萃取至有機溶劑,依據期望將獲得之有機層水洗之後,藉由將有機溶劑餾去,而製得 鎓鹽(1)。 The method of removing the onium salt (1) from the reaction mixture after the completion of the reaction includes the following methods. (i) If the reaction liquid is separated into an organic layer and an aqueous layer, the organic layer is separated from the reaction liquid, and the obtained organic layer is washed with water, and then the organic layer after water washing is concentrated to obtain hydrazine. Salt (1). (ii) if the reaction solution is uniform, the cerium salt (1) is extracted into an organic solvent using an organic solvent insoluble in water and the cerium salt (1) is soluble, and the obtained organic layer is washed with water as desired. The organic solvent is distilled off, and the obtained Barium salt (1).

接著就鎓鹽(1)與二烷氧基矽烷(2)之共聚合加以說明。鎓鹽(1)與二烷氧基矽烷(2)之共聚合,通常係在鎓鹽(1)與二烷氧基矽烷(2)之混合物中加入可溶解鎓鹽(1)及二烷氧基矽烷(2)雙方之甲醇、乙醇、異丙醇、丙酮等有機溶劑而製成溶液之後,將可成為水解催化劑之酸(以下稱酸(5))或鹼(以下稱鹼(6))、以及水滴下至該溶液來進行。酸(5)或鹼(6)也可以水溶液來進行滴下。 Next, the copolymerization of the onium salt (1) and the dialkoxysilane (2) will be described. Copolymerization of cerium salt (1) with dialkoxy decane (2), usually by adding a soluble cerium salt (1) and a dialkoxy group in a mixture of cerium salt (1) and dialkoxy decane (2) An acid (hereinafter referred to as an acid (5)) or a base (hereinafter referred to as a base (6)) which can be a hydrolysis catalyst after the solution of the ketone (2) is dissolved in an organic solvent such as methanol, ethanol, isopropanol or acetone. And water drops to the solution to proceed. The acid (5) or the base (6) may also be dropped in an aqueous solution.

二烷氧基矽烷(2)方面可列舉如二甲基二甲氧基矽烷、二乙基二甲氧基矽烷、二丙基二甲氧基矽烷、二苯基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二乙氧基矽烷、二丙基二乙氧基矽烷、二苯基二乙氧基矽烷、二甲基二丙氧基矽烷、二乙基二丁氧基矽烷、二丙基二丁氧基矽烷、二苯基二丁氧基矽烷等,以二甲基二甲氧基矽烷及二甲基二乙氧基矽烷為佳,二甲基二甲氧基矽烷較佳。 Examples of the dialkoxy decane (2) include dimethyl dimethoxy decane, diethyl dimethoxy decane, dipropyl dimethoxy decane, diphenyl dimethoxy decane, and dimethyl. Diethoxy decane, diethyl diethoxy decane, dipropyl diethoxy decane, diphenyl diethoxy decane, dimethyl dipropoxy decane, diethyl dibutoxy Decane, dipropyldibutoxydecane, diphenyldibutoxydecane, etc., preferably dimethyldimethoxydecane and dimethyldiethoxydecane, dimethyldimethoxydecane Preferably.

共聚合中之鎓鹽(1)與二烷氧基矽烷(2)之莫耳比,相對於鎓鹽(1)1莫耳,二烷氧基矽烷(2)在4~49莫耳、以二烷氧基矽烷(2)在4~16莫耳為佳,二烷氧基矽烷(2)在4~8莫耳較佳。 The molar ratio of the cerium salt (1) to the dialkoxy decane (2) in the copolymerization, relative to the cerium salt (1) 1 mole, the dialkoxy decane (2) in the range of 4 to 49 moles The dialkoxy decane (2) is preferably 4 to 16 moles, and the dialkoxy decane (2) is preferably 4 to 8 moles.

於共聚合中使用的有機溶劑之使用量,相對於鎓鹽(1)1重量份,通常在20重量份以下,以0.5~10重量份為佳,1~5重量份甚佳。 The amount of the organic solvent to be used in the copolymerization is usually 20 parts by weight or less, preferably 0.5 to 10 parts by weight, and preferably 1 to 5 parts by weight, based on 1 part by weight of the onium salt (1).

於共聚合中使用的酸(5)方面,可列舉如鹽酸、硫酸、硝酸、醋酸、對甲苯磺酸一水合物等。酸(5)之使用 量通常相對於鎓鹽(1)或(2)1莫耳,為0.001~1莫耳,以0.1~0.2莫耳為佳。 Examples of the acid (5) used in the copolymerization include hydrochloric acid, sulfuric acid, nitric acid, acetic acid, p-toluenesulfonic acid monohydrate, and the like. Use of acid (5) The amount is usually 0.001 to 1 mol, preferably 0.1 to 0.2 mol, relative to the strontium salt (1) or (2) 1 mol.

於共聚合中使用的鹼(6)方面,可列舉例如氫氧化鈉、氫氧化鉀、氫氧化鋰等。相對於1莫耳之鎓鹽(1),鹼(6)之使用量通常為0.001~1莫耳,以0.1~0.2莫耳為佳。 Examples of the base (6) used in the copolymerization include sodium hydroxide, potassium hydroxide, and lithium hydroxide. The base (6) is usually used in an amount of 0.001 to 1 mol, preferably 0.1 to 0.2 mol, relative to 1 mol of the barium salt (1).

於共聚合中使用的水量,通常相對於鎓鹽(1)1莫耳為1~10莫耳。 The amount of water used in the copolymerization is usually from 1 to 10 moles per mole of the strontium salt (1).

鎓鹽(1)與二烷氧基矽烷(2)之共聚合中的反應溫度,通常10~80℃,以20~40℃為佳。反應時間通常在3小時以上,以3~72小時為佳。 The reaction temperature in the copolymerization of the onium salt (1) and the dialkoxysilane (2) is usually 10 to 80 ° C, preferably 20 to 40 ° C. The reaction time is usually 3 hours or more, preferably 3 to 72 hours.

本發明之聚矽氧烷共聚物可利用將反應混合物濃縮而製得。反應混合物之濃縮溫度通常為10~120℃,以30~100℃為佳,60~80℃較佳。如此製得之本發明之聚矽氧烷共聚物,可因應需要利用不會與本發明之聚矽氧烷共聚物混合的己烷、庚烷、苯、甲苯等有機溶劑來洗淨。 The polyoxyalkylene copolymer of the present invention can be obtained by concentrating the reaction mixture. The concentration of the reaction mixture is usually from 10 to 120 ° C, preferably from 30 to 100 ° C, and preferably from 60 to 80 ° C. The polyoxyalkylene copolymer of the present invention thus obtained can be washed with an organic solvent such as hexane, heptane, benzene or toluene which is not mixed with the polyoxyalkylene copolymer of the present invention as needed.

將本發明之聚矽氧烷共聚物洗淨時的有機溶劑使用量,相對於本發明之聚矽氧烷共聚物1重量份,通常為1~20重量份,以3~9重量份為佳。 The amount of the organic solvent used when the polyoxyalkylene copolymer of the present invention is washed is usually 1 to 20 parts by weight, preferably 3 to 9 parts by weight, per part by weight of the polyoxyalkylene copolymer of the present invention. .

如此製得之本發明之聚矽氧烷共聚物,可利用攪入於樹脂而對樹脂賦予抗靜電性。該樹脂方面可列舉如聚碳酸酯樹脂、聚丙烯酸樹脂、聚矽氧樹脂等。 The polyoxyalkylene copolymer of the present invention thus obtained can be imparted with antistatic property to the resin by stirring into the resin. Examples of the resin include a polycarbonate resin, a polyacryl resin, a polyoxymethylene resin, and the like.

本發明之聚矽氧烷共聚物攪入樹脂的方法可列舉以下方法。(i)將本發明之聚矽氧烷共聚物與樹脂加熱熔融而攪和之方法。(ii)溶解於二氯甲烷、醋酸乙酯、甲苯等 溶劑中來調製溶液之後,將前述溶液塗佈,並除去溶劑之方法。(iii)以光硬化性樹脂之情況而言,係將含本發明之聚矽氧烷共聚物之樹脂或溶液塗佈之後,利用紫外線照射而硬化之方法。 The method of stirring the polyoxyalkylene copolymer of the present invention into the resin can be exemplified by the following methods. (i) A method in which the polyoxyalkylene copolymer of the present invention is heated and melted with a resin to be stirred. (ii) dissolved in dichloromethane, ethyl acetate, toluene, etc. After the solution is prepared in a solvent, the solution is applied and the solvent is removed. (iii) In the case of a photocurable resin, a method in which a resin or a solution containing the polyoxyalkylene copolymer of the present invention is applied and then cured by ultraviolet irradiation.

關於本發明之聚矽氧烷共聚物相對於樹脂的添加量,相對於樹脂通常為0.01~5重量%,以0.05~1重量%為佳,0.1~0.5重量%甚佳。 The amount of the polyoxyalkylene copolymer of the present invention to be added to the resin is usually 0.01 to 5% by weight based on the resin, preferably 0.05 to 1% by weight, and preferably 0.1 to 0.5% by weight.

[實施例] [Examples]

接著,依據實施例具體說明本發明,惟本發明不受該等之限定。實施例中,1H-NMR係以JEOL Ltd DATUM製AL-400進行測定,在400MHz下以四甲基矽烷為基準算出化學位移。又,表面電阻率係使用三菱化學公司製Hiresta UP(MCP-HT450),在23±3℃、濕度45±5%的條件下進行測定。再者,實施例中,所謂室溫表示20~25℃。 Next, the present invention will be specifically described based on examples, but the present invention is not limited thereto. In the examples, 1 H-NMR was measured by AL-400 manufactured by JEOL Ltd DATUM, and the chemical shift was calculated based on tetramethyl decane at 400 MHz. Further, the surface resistivity was measured using a Hiresta UP (MCP-HT450) manufactured by Mitsubishi Chemical Corporation under the conditions of 23 ± 3 ° C and a humidity of 45 ± 5%. Further, in the examples, the room temperature means 20 to 25 °C.

實施例1 聚矽氧烷共聚物[A]之製造 Example 1 Production of Polyoxane Copolymer [A]

於100mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(三氟甲磺醯基)醯亞胺7.16g(0.01莫耳)、二甲基二甲氧基矽烷10.00g(0.08莫耳)及脫水異丙醇17.16g,並於製得之混合物滴定0.1當量濃度之鹽酸1.65g,在室溫下攪拌一夜。藉由將製得之反應混合物濃縮,而獲得在室溫下為透明液體之聚矽氧烷共聚物[A]17.17g。以下顯示所製得之聚矽氧烷共聚物[A]之1H-NMR分析結果。 In a 100 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium=bis(trifluoromethanesulfonate) was weighed. Sulfhydryl iodide 7.16 g (0.01 mol), dimethyl dimethoxydecane 10.00 g (0.08 mol) and dehydrated isopropanol 17.16 g, and titrated 0.1 equivalent of hydrochloric acid 1.65 in the obtained mixture g, stirred at room temperature overnight. The concentrated polyoxane copolymer [A] 17.17 g which was a transparent liquid at room temperature was obtained by concentrating the obtained reaction mixture. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [A] are shown below.

1H-NMR(CDCl3)δ(ppm)5.40-5.20(m,1H),4.20-4. 00(m,2H),3.20-3.00(m,2H),2.75-2.45(m,2H),2.20-2.00(m,6H),1.70-1.30(m,12H),1.20-1.05(m,9H),1.00-0.80(m,9H),1.65-1.45(m,2H),0.30-0.00(m,28H) 1 H-NMR (CDCl 3 ) δ (ppm) 5.40-5.20 (m, 1H), 4.20-4. 00 (m, 2H), 3.20-3.00 (m, 2H), 2.75-2.45 (m, 2H), 2.20-2.00(m,6H),1.70-1.30(m,12H),1.20-1.05(m,9H),1.00-0.80(m,9H),1.65-1.45(m,2H),0.30-0.00(m , 28H)

實施例2 聚矽氧烷共聚物[B]之製造 Example 2 Production of Polyoxane Copolymer [B]

於100mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物0.66g(0.002莫耳)、二甲基二甲氧基矽烷10.01g(0.08莫耳)及脫水異丙醇10.66g,並於製得之混合物滴定0.1當量濃度鹽酸1.53g,在室溫下攪拌2小時。藉由將製得之反應混合物濃縮,而獲得在25℃下為薄黃色液體之聚矽氧烷共聚物[B]3.68g。以下顯示所製得之聚矽氧烷共聚物[B]之1H-NMR分析結果。 In a 100 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = chloride 0.66 g (0.002) was weighed. 1 part g (0.08 mol) of dimethyl dimethoxy decane and 10.66 g of dehydrated isopropanol, and 1.53 g of 0.1 equivalent hydrochloric acid was titrated in the obtained mixture, and stirred at room temperature for 2 hours. By concentrating the obtained reaction mixture, a polyaluminoxane copolymer [B] of 3.68 g which was a thin yellow liquid at 25 ° C was obtained. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [B] are shown below.

1H-NMR(CDCl3)δ(ppm)4.60(brs,1H),4.40-3.90(m,3H),3.65-3.40(m,9H),3.30-3.10(m,2H),1.20-1.05(m,27H),0.70-0.45(m,2H),0.30-0.00(m,145H) 1 H-NMR (CDCl 3 ) δ (ppm) 4.60 (brs, 1H), 4.40-3.90 (m, 3H), 3.65-3.40 (m, 9H), 3.30-3.10 (m, 2H), 1.20-1.05 ( m, 27H), 0.70-0.45 (m, 2H), 0.30-0.00 (m, 145H)

實施例3 聚矽氧烷共聚物[C]之製造 Example 3 Production of Polyoxane Copolymer [C]

於500mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺35.03g(0.06莫耳)、二甲基二甲氧基矽烷60.00g(0.5莫耳)及脫水異丙醇95.03g,並於製得之混合物滴定0.1當量濃度鹽酸9.99g,在室溫下攪拌一夜。藉由將製得之反應混合物濃縮,而獲得在室溫下為薄黃色液體之聚矽氧烷共聚物[C]45.26g。以下顯示所製得之聚矽氧烷共聚物[C]之1H-NMR分析結果。 In a 500 mL glass reactor, weigh 1-{(3-triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium=bis(trifluoromethanesulfonate)醯 醯 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 35 Stir at room temperature overnight. The polyoxyalkylene copolymer [C] 45.26 g which was a thin yellow liquid at room temperature was obtained by concentrating the obtained reaction mixture. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [C] are shown below.

1H-NMR(CDCl3)δ(ppm)5.80-5.20(s,1H),4.50-4.3 0(s,2H),4.20-4.00(m,2H),3.75-3.50(m,2H),3.25-2.95(m,11H),1.60-1.40(m,2H),1.25-1.05(m,10H),0.60-0.40(m,2H),0.30-0.00(m,33H) 1 H-NMR (CDCl 3 ) δ (ppm) 5.80-5.20 (s, 1H), 4.50-4.3 0 (s, 2H), 4.20-4.00 (m, 2H), 3.75-3.50 (m, 2H), 3.25 -2.95 (m, 11H), 1.60-1.40 (m, 2H), 1.25-1.05 (m, 10H), 0.60-0.40 (m, 2H), 0.30-0.00 (m, 33H)

實施例4 聚矽氧烷共聚物[D]之製造 Example 4 Production of Polyoxane Copolymer [D]

於100mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物3.58g(0.01莫耳)、二甲基二甲氧基矽烷10.01g(0.08莫耳)及脫水異丙醇14.00g,並於製得之混合物滴定0.1當量濃度鹽酸1.66g,在室溫下攪拌2小時。藉由將製得之反應混合物濃縮,而獲得在室溫下為薄黃色蠟狀固體之聚矽氧烷共聚物[D]5.42g。以下顯示所製得之聚矽氧烷共聚物[D]之1H-NMR分析結果。 In a 100 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium chloride 3.58 g (0.01) was weighed. 1 part g (0.08 mol) of dimethyl dimethoxy decane and 14.00 g of dehydrated isopropanol, and 1.66 g of 0.1 equivalent hydrochloric acid was titrated in the obtained mixture, and stirred at room temperature for 2 hours. By concentrating the obtained reaction mixture, a polyaluminoxane copolymer [D] 5.42 g which was a thin yellow waxy solid at room temperature was obtained. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [D] are shown below.

1H-NMR(CDCl3)δ(ppm)4.60(brs,1H),4.40-3.90(m,3H),3.65-3.40(m,9H),3.30-3.10(m,2H),1.35-1.10(m,5H),0.70-0.45(m,2H),0.30-0.00(m,23H) 1 H-NMR (CDCl 3 ) δ (ppm) 4.60 (brs, 1H), 4.40-3.90 (m, 3H), 3.65-3.40 (m, 9H), 3.30-3.10 (m, 2H), 1.35-1.10 ( m, 5H), 0.70-0.45 (m, 2H), 0.30-0.00 (m, 23H)

實施例5 聚矽氧烷共聚物[E]之製造 Example 5 Production of Polyoxane Copolymer [E]

於100mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=氯化物3.58g(0.01莫耳)、二甲基二甲氧基矽烷10.01g(0.08莫耳)及脫水異丙醇14.00g,並於製得之混合物滴定0.1當量濃度鹽酸1.51g,在室溫下攪拌2小時。藉由將製得之反應混合物濃縮,而獲得在室溫下為薄黃色蠟狀固體之聚矽氧烷共聚物[E]5.42g。以下顯示所製得之聚矽氧烷共聚物[E]之1H-NMR分析結果。 In a 100 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium chloride 3.58 g (0.01) was weighed. 1 part g (0.08 mol) of dimethyl dimethoxy decane and 14.00 g of dehydrated isopropanol, and 1.51 g of 0.1 equivalent hydrochloric acid was titrated in the obtained mixture, and stirred at room temperature for 2 hours. The polyoxyalkylene copolymer [E] 5.42 g which was a thin yellow waxy solid at room temperature was obtained by concentrating the obtained reaction mixture. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [E] are shown below.

1H-NMR(CDCl3)δ(ppm)4.43(1H,brs),4.00-3.80(4H,m),3.39(9H,s),3.03(2H,brs),1.50(2H,brs),1.13-1.05(34H, m),0.50-0.45(2H,m),0.05-0.00(26H,m) 1 H-NMR (CDCl 3 ) δ (ppm) 4.43 (1H, brs), 4.00-3.80 (4H, m), 3.39 (9H, s), 3.03 (2H, brs), 1.50 (2H, brs), 1.13 -1.05 (34H, m), 0.50-0.45 (2H, m), 0.05-0.00 (26H, m)

實施例6 聚矽氧烷共聚物[F]之製造 Example 6 Production of Polyoxane Copolymer [F]

於50mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺5.86g(0.01莫耳)、二甲基二甲氧基矽烷10.00g(0.08莫耳)及脫水異丙醇15.00g,並於製得之混合物滴定0.1當量濃度鹽酸1.65g,在室溫下攪拌3小時後,在80℃下濃縮3小時。將獲得之濃縮殘渣以甲苯15.00g洗淨3次後,在80℃下濃縮3小時,藉此而製得在室溫下為薄黃色液體之聚矽氧烷共聚物[F]6.53g。以下顯示所製得之聚矽氧烷共聚物[F]之1H-NMR分析結果。 In a 50 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = bis(trifluoromethanesulfonate) was weighed.醯 醯 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 5.8 After stirring at room temperature for 3 hours, it was concentrated at 80 ° C for 3 hours. The obtained concentrated residue was washed three times with 15.00 g of toluene, and then concentrated at 80 ° C for 3 hours, whereby a polyaluminoxane copolymer [F] of 6.53 g which was a thin yellow liquid at room temperature was obtained. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [F] are shown below.

1H-NMR(CDCl3)δ(ppm)5.89-5.43(0.9H,brm),4.45(2H,s),4.24-4.13(1.1H,brm),4.83-4.71(0.4H,brm),3.64(2H,s),3.54-3.46(0.5H,brm),3.28-3.08(11.8H,brm),1.59(2H,brs),1.25-1.12(7.0H,brm),0.63-0.50(2H,m),0.24-0.02(17.6H,brm) 1 H-NMR (CDCl 3 ) δ (ppm) 5.89-5.43 (0.9H, brm), 4.45 (2H, s), 4.24 - 4.13 (1.1H, brm), 4.83-4.71 (0.4H, brm), 3.64 (2H, s), 3.54-3.46 (0.5H, brm), 3.28-3.08 (11.8H, brm), 1.59 (2H, brs), 1.25-1.12 (7.0H, brm), 0.63-0.50 (2H, m ), 0.24-0.02 (17.6H, brm)

實施例7 聚矽氧烷共聚物[G]之製造 Example 7 Production of Polyoxane Copolymer [G]

於50mL之玻璃反應器,秤取1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺5.91g(0.01莫耳)、二甲基二甲氧基矽烷10.00g(0.08莫耳)及脫水異丙醇15.00g,並於製得之混合物滴定0.1當量濃度鹽酸1.50g,在室溫下攪拌3小時後,在80℃下濃縮3小時。將獲得之濃縮殘渣以甲苯15.00g洗淨3次後,在80℃下濃縮3小時,藉此而製得在室溫下為薄黃色液體之聚矽氧烷共聚物[G]6.91g。以下顯示所製得之聚矽氧烷共聚物[G]之 1H-NMR分析結果。 In a 50 mL glass reactor, 1-{(3-triethoxydecylpropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = bis(trifluoromethanesulfonate) was weighed.醯 醯 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 5.9 After stirring at room temperature for 3 hours, it was concentrated at 80 ° C for 3 hours. The obtained concentrated residue was washed three times with 15.00 g of toluene, and then concentrated at 80 ° C for 3 hours to obtain a polyoxyalkylene copolymer [G] of 6.91 g which was a thin yellow liquid at room temperature. The results of 1 H-NMR analysis of the obtained polyoxyalkylene copolymer [G] are shown below.

1H-NMR(CDCl3)δ(ppm)5.89-5.43(0.9H,brm),4.45(2H,s),4.24-4.13(1.3H,brm),4.83-4.71(0.5H,brm),3.64(2H,s),3.54-3.46(1.1H,brm),3.28-3.08(11.5H,brm),1.59(2H,brs),1.25-1.12(8.5H,brm),0.63-0.50(2H,m),0.24-0.02(13.1H,brm) 1 H-NMR (CDCl 3 ) δ (ppm) 5.89-5.43 (0.9H, brm), 4.45 (2H, s), 4.24 - 4.13 (1.3H, brm), 4.83-4.71 (0.5H, brm), 3.64 (2H, s), 3.54-3.46 (1.1H, brm), 3.28-3.08 (11.5H, brm), 1.59 (2H, brs), 1.25-1.12 (8.5H, brm), 0.63-0.50 (2H, m ), 0.24-0.02 (13.1H, brm)

實施例8 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 8 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

於50mL之試樣瓶,秤取聚碳酸酯樹脂(Sumitomo Dow股份有限公司製、Calibre(註冊商標)200-13 NAT)3.2g與二氯甲烷20mL,調製聚碳酸酯樹脂之二氯甲烷溶液。於製得之溶液添加實施例1之聚矽氧烷共聚物[A]0.0016g來作為抗靜電劑並使之完全溶解後,使之流入模具(12cm×20cm×2cm),使之在室溫下乾燥1小時、進一步在40℃下乾燥1小時,做出聚碳酸酯樹脂組成物試樣(膜厚0.1±0.02mm)。測定已做出之聚碳酸酯樹脂組成物試樣的表面電阻率。將該結果顯示於表1。 In a 50 mL sample bottle, 3.2 g of polycarbonate resin (Calibre (registered trademark) 200-13 NAT) manufactured by Sumitomo Dow Co., Ltd. and 20 mL of dichloromethane were weighed to prepare a dichloromethane solution of a polycarbonate resin. To the obtained solution, 0.0016 g of the polyoxyalkylene copolymer [A] of Example 1 was added as an antistatic agent and completely dissolved, and then poured into a mold (12 cm × 20 cm × 2 cm) to make it at room temperature. The mixture was dried for 1 hour and further dried at 40 ° C for 1 hour to prepare a polycarbonate resin composition sample (film thickness: 0.1 ± 0.02 mm). The surface resistivity of the sample of the polycarbonate resin composition which had been prepared was measured. The results are shown in Table 1.

實施例9 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 9 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用實施例2之聚矽氧烷共聚物[B]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A polycarbonate resin composition sample was prepared and measured in the same manner as in Example 8 except that the polyoxyalkylene copolymer [B] of Example 2 was used instead of the polyoxyalkylene copolymer [A]. Surface resistivity. The results are shown in Table 1.

實施例10 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 10 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用實施例3之聚矽氧烷共聚物[C]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A polycarbonate resin composition sample was prepared and measured in the same manner as in Example 8 except that the polyoxyalkylene copolymer [C] of Example 3 was used instead of the polyoxyalkylene copolymer [A]. Surface resistivity. The results are shown in Table 1.

實施例11 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 11 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用實施例4之聚矽氧烷共聚物[D]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。其結果顯示於表1。 A polycarbonate resin composition sample was prepared and measured in the same manner as in Example 8 except that the polyoxyalkylene copolymer [D] of Example 4 was used instead of the polyoxyalkylene copolymer [A]. Surface resistivity. The results are shown in Table 1.

實施例12 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 12 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用實施例5之聚矽氧烷共聚物[E]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A polycarbonate resin composition sample was prepared and measured in the same manner as in Example 8 except that the polyoxyalkylene copolymer [E] of Example 5 was used instead of the polyoxyalkylene copolymer [A]. Surface resistivity. The results are shown in Table 1.

實施例13 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 13 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用實施例6之聚矽氧烷共聚物[F]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A polycarbonate resin composition sample was prepared and measured in the same manner as in Example 8 except that the polyoxyalkylene copolymer [F] of Example 6 was used instead of the polyoxyalkylene copolymer [A]. Surface resistivity. The results are shown in Table 1.

比較例1 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 1 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

除了不使用聚矽氧烷共聚物[A]以外,與實施例8同樣 施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 The same as in the eighth embodiment except that the polyoxyalkylene copolymer [A] was not used. A sample of the polycarbonate resin composition was prepared, and the surface resistivity thereof was measured. The results are shown in Table 1.

比較例2 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 2 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三甲基銨=雙(三氟甲磺醯基)醯亞胺(以下稱鎓鹽[A])來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 1-{(3-Triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-trimethylammonium = bis(trifluoromethanesulfonyl) quinone imine (hereinafter A polycarbonate resin composition sample was prepared in the same manner as in Example 8 except that the sulfonium salt [A]) was used in place of the polyoxyalkylene copolymer [A], and the surface resistivity thereof was measured. The results are shown in Table 1.

比較例3 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 3 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用1-{(3-三乙氧矽基丙基)胺甲醯基氧基乙基}-1,1,1-三丁基鏻=雙(三氟甲磺醯基)醯亞胺(以下稱鎓鹽[B])來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 1-{(3-Triethoxymercaptopropyl)amine-mercaptooxyethyl}-1,1,1-tributylphosphonium = bis(trifluoromethanesulfonyl) quinone imine (hereinafter A polycarbonate resin composition sample was prepared in the same manner as in Example 8 except that the sulfonium salt [B] was used in place of the polyoxyalkylene copolymer [A], and the surface resistivity thereof was measured. The results are shown in Table 1.

比較例4 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 4 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用三丁基十二烷基鏻=雙(三氟甲磺醯基)醯亞胺(以下稱鎓鹽[C])來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 The polyazepine copolymer [A] was replaced with tributyl lauryl hydrazine = bis(trifluoromethanesulfonyl) quinone imine (hereinafter referred to as hydrazine salt [C]), and the examples were 8 was also carried out, and a polycarbonate resin composition sample was prepared, and the surface resistivity thereof was measured. The results are shown in Table 1.

比較例5 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 5 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

使用鎓鹽[C]0.032g來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A polycarbonate resin composition sample was prepared in the same manner as in Example 8 except that 0.032 g of the onium salt [C] was used instead of the polyoxyalkylene copolymer [A], and the surface resistivity thereof was measured. The results are shown in Table 1.

比較例6 聚碳酸酯樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 6 Preparation of a polycarbonate resin composition sample and measurement of its surface resistivity

參考專利文獻2(日本特開2009-286815號公報)製得已將1-甲基-3-(3-三甲氧矽基丙基)咪唑鎓=四氟硼酸鹽聚合物水解聚合之膜狀組成物(以下稱鎓鹽[D]),使用該鎓鹽[D]來取代聚矽氧烷共聚物[A],除此之外與實施例8同樣施行,作出聚碳酸酯樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表1。 A film-like composition obtained by hydrolyzing a polymer of 1-methyl-3-(3-trimethoxydecylpropyl)imidazolium=tetrafluoroborate polymer was prepared by referring to Patent Document 2 (JP-A-2009-286815). A polycarbonate resin composition sample was prepared in the same manner as in Example 8 except that the sulfonium salt [D] was used instead of the polyoxyalkylene copolymer [A]. And measure its surface resistivity. The results are shown in Table 1.

實施例14 聚丙烯酸樹脂組成物試樣之做出及其表面電阻率之測定 Example 14 Preparation of a sample of a polyacrylic resin composition and measurement of its surface resistivity

將二新戊四醇六丙烯酸酯(A-DPH:新中村化學工業股份有限公司製)0.50g、新戊四醇三丙烯酸酯(A-TMM-3LM-N:新中村化學工業股份有限公司製製)1.50g、三羥甲丙烷三丙烯酸酯(A-TMPT:新中村化學工業股份有限公司製製)0.50g、異丙醇1.75g、膠態二氧化矽之IPA分散液(IPA-ST:二氧化矽固形物30wt%,日產化學工業股份有限公司製)3.60g、作為抗靜電劑之聚矽氧烷共聚物[E]0.54g及作為光聚合引發劑之2-羥基-2-甲基丙醯苯0.15g加以混合。 Dioxonicol hexaacrylate (A-DPH: manufactured by Shin-Nakamura Chemical Co., Ltd.) 0.50 g, pentaerythritol triacrylate (A-TMM-3LM-N: manufactured by Shin-Nakamura Chemical Co., Ltd.) 1.50 g, trimethylolpropane triacrylate (A-TMPT: manufactured by Shin-Nakamura Chemical Co., Ltd.) 0.50 g, isopropanol 1.75 g, colloidal ceria IPA dispersion (IPA-ST: 3 wt% of cerium oxide solids, manufactured by Nissan Chemical Industry Co., Ltd., 3.60 g of polyoxyalkylene copolymer [E] as an antistatic agent, and 2-hydroxy-2-methyl as a photopolymerization initiator 0.15 g of acetophenone was mixed.

使用棒塗佈器,在厚度100μm之聚對苯二甲酸乙二酯薄膜單面,塗佈已獲得之混合物以使其乾燥膜厚成為約5μm,而做出塗膜。以積算光量約400mJ/cm2將高壓水銀UV燈(120W/cm)之紫外線照射於前述塗膜面使之硬化,藉此做出聚丙烯酸樹脂組成物試樣。測定已製成之聚丙烯酸樹脂組成物試樣之表面電阻率。將其結果顯示於表2。 The obtained mixture was applied to one side of a polyethylene terephthalate film having a thickness of 100 μm by a bar coater to have a dry film thickness of about 5 μm, and a coating film was formed. A sample of the polyacrylic resin composition was prepared by irradiating ultraviolet light of a high-pressure mercury UV lamp (120 W/cm) on the surface of the coating film with an integrated light amount of about 400 mJ/cm 2 to cure it. The surface resistivity of the prepared sample of the polyacrylic resin composition was measured. The results are shown in Table 2.

實施例15 聚丙烯酸樹脂組成物試樣之做出及其表面電阻率之測定 Example 15 Preparation of a sample of a polyacrylic resin composition and measurement of its surface resistivity

使用聚矽氧烷共聚物[F]來取代聚矽氧烷共聚物[E],除此之外與實施例14同樣施行,作出聚丙烯酸樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表2。 A sample of the polyacrylic resin composition was prepared in the same manner as in Example 14 except that the polyoxyalkylene copolymer [F] was used instead of the polyoxyalkylene copolymer [E], and the surface resistivity thereof was measured. The results are shown in Table 2.

實施例16 聚丙烯酸樹脂組成物試樣之做出及其表面電阻率之測定 Example 16 Preparation of a sample of a polyacrylic resin composition and determination of its surface resistivity

使用聚矽氧烷共聚物[G]來取代聚矽氧烷共聚物[E],除此之外與實施例14同樣施行,作出聚丙烯酸樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表2。 A sample of the polyacrylic resin composition was prepared in the same manner as in Example 14 except that the polyoxyalkylene copolymer [G] was used instead of the polyoxyalkylene copolymer [E], and the surface resistivity thereof was measured. The results are shown in Table 2.

比較例7 聚丙烯酸樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 7 Preparation of a sample of a polyacrylic resin composition and measurement of its surface resistivity

除了不添加聚矽氧烷共聚物[E]以外,與實施例14同樣施行,作出聚丙烯酸樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表2。 A sample of the polyacrylic resin composition was prepared in the same manner as in Example 14 except that the polyoxyalkylene copolymer [E] was not added, and the surface resistivity thereof was measured. The results are shown in Table 2.

比較例8 聚丙烯酸樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 8 Preparation of a sample of a polyacrylic resin composition and measurement of its surface resistivity

使用鎓鹽[A]0.54g來取代聚矽氧烷共聚物[E],除此之外與實施例14同樣施行,作出聚丙烯酸樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表2。 A sample of the polyacrylic resin composition was prepared in the same manner as in Example 14 except that 0.54 g of the onium salt [A] was used instead of the polyoxyalkylene copolymer [E], and the surface resistivity thereof was measured. The results are shown in Table 2.

實施例17 聚甲基丙烯酸甲酯樹脂組成物試樣之做出及其表面電阻率之測定 Example 17 Preparation of a sample of polymethyl methacrylate resin composition and determination of its surface resistivity

混合甲基丙烯酸甲酯5.00g、偶氮雙異丁腈0.20g及作為抗靜電劑之聚矽氧烷共聚物[E]0.005g。令獲得之混合物流入塑膠容器(內徑5cm×高度1.5cm之圓筒形),在50℃下使之硬化10小時,做出厚度約2mm之聚甲基丙烯酸甲酯樹脂之試樣。測定已製成之聚甲基丙烯酸甲酯樹脂樹脂組成物試樣之表面電阻率。將其結果顯示於表3。 5.00 g of methyl methacrylate, 0.20 g of azobisisobutyronitrile, and a polyoxyalkylene copolymer [E] as an antistatic agent were mixed in an amount of 0.005 g. The obtained mixture was poured into a plastic container (cylindrical shape having an inner diameter of 5 cm and a height of 1.5 cm), and allowed to harden at 50 ° C for 10 hours to prepare a sample of a polymethyl methacrylate resin having a thickness of about 2 mm. The surface resistivity of the prepared sample of the polymethyl methacrylate resin resin composition was measured. The results are shown in Table 3.

實施例18 聚甲基丙烯酸甲酯樹脂樹脂組成物試樣之做出及其表面電阻率之測定 Example 18 Preparation of a sample of a polymethyl methacrylate resin resin composition and measurement of its surface resistivity

使用聚矽氧烷共聚物[F]來取代聚矽氧烷共聚物[E],除此之外與實施例17同樣施行,作出聚甲基丙烯酸甲酯樹脂樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表3。 A sample of a polymethyl methacrylate resin resin composition was prepared and measured in the same manner as in Example 17 except that the polyoxyalkylene copolymer [F] was used instead of the polyoxyalkylene copolymer [E]. Surface resistivity. The results are shown in Table 3.

比較例9 聚甲基丙烯酸甲酯樹脂樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 9 Preparation of a sample of a polymethyl methacrylate resin resin composition and measurement of its surface resistivity

除了不添加聚矽氧烷共聚物[E]以外,與實施例17同樣施行,作出聚甲基丙烯酸甲酯樹脂樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表3。 A sample of a polymethyl methacrylate resin resin composition was prepared in the same manner as in Example 17 except that the polyoxyalkylene copolymer [E] was not added, and the surface resistivity thereof was measured. The results are shown in Table 3.

比較例10 聚甲基丙烯酸甲酯樹脂樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 10 Preparation of a sample of a polymethyl methacrylate resin resin composition and measurement of its surface resistivity

使用三丁基甲基銨=雙(三氟甲磺醯基)醯亞胺(以下稱鎓鹽[E])0.50g來取代聚矽氧烷共聚物[E],除此之外與實施例17同樣施行,製出聚甲基丙烯酸甲酯樹脂樹脂組成物試樣,並測定其表面電阻率。將其結果顯示於表3。 The same procedure as in Example 17 except that 0.50 g of tributylmethylammonium = bis(trifluoromethanesulfonyl) quinone imine (hereinafter referred to as sulfonium salt [E]) was used instead of the polyoxyalkylene copolymer [E]. A sample of a polymethyl methacrylate resin resin composition was prepared, and the surface resistivity thereof was measured. The results are shown in Table 3.

實施例19 聚矽氧樹脂組成物試樣之做出及其表面電阻率之測定 Example 19 Preparation of a sample of a polyoxyxene resin composition and determination of its surface resistivity

將過氧化物硬化型聚矽氧黏著劑KR-101-10(固形物60%、信越化學工業股份有限公司製)4.0g、硬化劑BPO(過氧化苯甲醯)0.08g、醋酸乙酯6.2g及作為抗靜電劑之聚矽氧烷共聚物[A]0.049g混合,獲得聚矽氧樹脂黏著劑。 The peroxide-curable polyadhesive adhesive KR-101-10 (solid content 60%, manufactured by Shin-Etsu Chemical Co., Ltd.) 4.0 g, hardener BPO (benzophenone peroxide) 0.08 g, ethyl acetate 6.2 g and 0.049 g of a polyoxyalkylene copolymer [A] as an antistatic agent were mixed to obtain a polyoxyxylene resin adhesive.

使用棒塗佈器,於聚對苯二甲酸乙二酯薄膜(離型紙)單面塗佈前述聚矽氧樹脂黏著劑以使乾燥乾燥膜厚成為約8μm,使之在90℃下加熱乾燥3分鐘、在160℃下加熱乾燥2分鐘,做出聚矽氧樹脂黏著劑層,並測定其表面電阻率。將其結果顯示於表4。 The polyoxyethylene resin adhesive was applied to one side of a polyethylene terephthalate film (release paper) by a bar coater so that the dried and dried film thickness became about 8 μm, and it was dried by heating at 90 ° C. The layer was heated and dried at 160 ° C for 2 minutes to form a polyoxymethylene resin adhesive layer, and the surface resistivity thereof was measured. The results are shown in Table 4.

在具有前述黏著劑層之面貼合三乙醯纖維素薄膜(TAC薄膜),在25℃、50%RH下熟化1小時,做出測試用薄膜。以目測來評價從測試用薄膜剝離脫模紙時黏著劑對脫模紙的附著狀態。將其結果顯示於表4。 A triethylene fluorene cellulose film (TAC film) was bonded to the surface having the above-mentioned pressure-sensitive adhesive layer, and aged at 25 ° C and 50% RH for 1 hour to prepare a test film. The state of adhesion of the adhesive to the release paper when the release paper was peeled off from the test film was visually evaluated. The results are shown in Table 4.

○:看不出黏著劑對脫模紙的附著。 ○: Adhesion of the adhesive to the release paper was not observed.

△:看得出有部分黏著劑對脫模紙的附著。 △: It was observed that some of the adhesive adhered to the release paper.

×:看得出大部分黏著劑對脫模紙的附著。 ×: The adhesion of most of the adhesive to the release paper was observed.

比較例11 聚矽氧樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 11 Preparation of a sample of a polyoxyxene resin composition and measurement of its surface resistivity

除了不使用聚矽氧烷共聚物以外,與實施例19同樣施行,作出聚矽氧樹脂黏著劑層及測試用薄膜,測定其表面電阻率,同時以目測來評價黏著劑對脫模紙的附著狀態。將其結果顯示於表4。 A polyoxyxylene resin adhesive layer and a test film were prepared in the same manner as in Example 19 except that the polyoxyalkylene copolymer was not used, and the surface resistivity was measured, and the adhesion of the adhesive to the release paper was visually evaluated. status. The results are shown in Table 4.

比較例12 聚矽氧樹脂組成物試樣之做出及其表面電阻率之測定 Comparative Example 12 Preparation of a sample of a polyoxyxene resin composition and measurement of its surface resistivity

除了使用鎓鹽[A]來取代聚矽氧烷共聚物[A]以外,與實施例19同樣施行,作出聚矽氧樹脂黏著劑層及測試用薄膜,測定其表面電阻率,同時以目測來評價黏著劑對脫模紙的附著狀態。將其結果顯示於表4。 A polyoxyxylene resin adhesive layer and a test film were prepared in the same manner as in Example 19 except that the sulfonium salt [A] was used instead of the polyoxyalkylene copolymer [A], and the surface resistivity thereof was measured, and visually measured. The adhesion state of the adhesive to the release paper was evaluated. The results are shown in Table 4.

Claims (9)

一種聚矽氧烷共聚物,係將式(1)所示鎓鹽與式(2)所示二烷氧基矽烷共聚合而製得: (式中,Q+表示氮陽離子或磷陽離子,R1表示碳數1~3之烷基,R2~R4各自獨立,表示碳數1~8之烷基,X-表示陰離子,m及n各自獨立,為1~3之整數); (式中,R5表示碳數1~3之烷基或苯基,R6表示碳數1~3之烷基)。 A polyoxyalkylene copolymer obtained by copolymerizing an onium salt represented by the formula (1) with a dialkoxysilane of the formula (2): (wherein, Q + represents a nitrogen cation or a phosphorus cation, R 1 represents an alkyl group having 1 to 3 carbon atoms, R 2 to R 4 are each independently, and represents an alkyl group having 1 to 8 carbon atoms; X - represents an anion, m and n are independent, an integer from 1 to 3); (wherein R 5 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, and R 6 represents an alkyl group having 1 to 3 carbon atoms). 如請求項1之聚矽氧烷共聚物,其中前述式(1)中,X-為鹵素陰離子。 The polyoxyalkylene copolymer of claim 1, wherein in the above formula (1), X - is a halogen anion. 如請求項1之聚矽氧烷共聚物,其中前述式(1)中,X-為含氟陰離子。 The polyoxyalkylene copolymer of claim 1, wherein in the above formula (1), X - is a fluorine-containing anion. 如請求項3之聚矽氧烷共聚物,其中前述含氟陰離子為 選自於由三氟甲磺酸陰離子、雙(全氟烷基磺醯基)醯亞胺陰離子、四氟硼酸鹽陰離子及六氟磷酸鹽陰離子所構成群組中之至少1種陰離子。 The polyoxyalkylene copolymer of claim 3, wherein the fluorine-containing anion is It is selected from at least one anion selected from the group consisting of an anion of a trifluoromethanesulfonate anion, a bis(perfluoroalkylsulfonyl)phosphonium anion, a tetrafluoroborate anion, and a hexafluorophosphate anion. 如請求項1之聚矽氧烷共聚物,其係將前述式(1)所示鎓鹽1莫耳與前述式(2)所示二烷氧基矽烷4~49莫耳共聚合而製得。 The polyoxyalkylene copolymer of claim 1, which is obtained by copolymerizing a sulfonium salt 1 mol represented by the above formula (1) with a dialkoxy decane 4 to 49 represented by the above formula (2). . 一種抗靜電劑,含有如請求項1~5中任一項之聚矽氧烷共聚物。 An antistatic agent comprising the polyoxyalkylene copolymer according to any one of claims 1 to 5. 一種樹脂組成物,含有如請求項6之抗靜電劑。 A resin composition containing the antistatic agent of claim 6. 如請求項7之樹脂組成物,其中前述樹脂組成物係選自於由聚碳酸酯樹脂組成物、聚丙烯酸樹脂組成物及聚矽氧樹脂組成物所構成群組之至少1種樹脂組成物。 The resin composition of claim 7, wherein the resin composition is at least one resin composition selected from the group consisting of a polycarbonate resin composition, a polyacryl resin composition, and a polyoxymethylene resin composition. 一種聚矽氧烷共聚物之製造方法,係用以製造如請求項1之聚矽氧烷共聚物,該製造方法之特徵在於,在水及酸或鹼的存在下,使前述式(1)所示鎓鹽與前述式(2)所示二烷氧基矽烷共聚合。 A method for producing a polyoxyalkylene copolymer, which is used for producing the polyoxyalkylene copolymer of claim 1, which is characterized by the above formula (1) in the presence of water and an acid or a base The onium salt shown is copolymerized with the dialkoxysilane of the above formula (2).
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