TW201529483A - Method for treating an acidic waste solution - Google Patents

Method for treating an acidic waste solution Download PDF

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TW201529483A
TW201529483A TW103103095A TW103103095A TW201529483A TW 201529483 A TW201529483 A TW 201529483A TW 103103095 A TW103103095 A TW 103103095A TW 103103095 A TW103103095 A TW 103103095A TW 201529483 A TW201529483 A TW 201529483A
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acid solution
solution
spent acid
value
treating
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TW103103095A
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TWI552963B (en
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Yi-Ting Liu
Jing-Yi Lin
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Yi-Ting Liu
Jing-Yi Lin
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Abstract

The present invention provides a method for treating an acidic waste solution comprising the steps of: providing an acidic waste solution; filtering the acidic waste solution to remove impurities from the acidic waste solution; adding an alkaline solution into the acidic waste solution to produce solid fluorosilicates; separating the solid fluorosilicates from the acidic waste solution; adding the first buffer agent into the acidic waste solution, so that the pH value of the acidic waste solution is adjusted to the first pH value; exchanging cationic impurities of the acidic waste solution with cations in a cation-exchange resin; adding the second buffer agent into the acidic waste solution, so that the first pH value of the acidic waste solution is adjusted to the second pH value and the reaction between the acidic waste solution and the buffer agent produces fluorides and an aqueous solution ; separating the fluorides from the aqueous solution to obtain the solid fluorides.

Description

廢酸溶液處理方法 Waste acid solution treatment method

本發明係有關於一種廢酸溶液處理方法,更特別的是一種蝕刻矽晶圓或玻璃的蝕刻溶液所產生的廢酸溶液處理方法。 The present invention relates to a method for treating a spent acid solution, and more particularly to a method for treating a spent acid solution produced by etching an etching solution of a germanium wafer or glass.

近年來半導體產業及光電製造產業的蓬勃發展,相對地在製造過程中產生的廢水種類及數量也隨之增加,例如電子工業矽晶圓清洗或蝕刻製程或者平面顯示器(TFT-LCD)製程中蝕刻玻璃基板所產生的含氫氟酸廢液,因含有氫氟酸及含或不含溶解矽、硝酸、鹽酸或硫酸等不純物,無法再使用,必須當作廢水處理掉。然而這些廢水一般含有氫氟酸、硝酸、鹽酸及溶解矽等不純物,當作廢水處理時,必須耗用大量鹼來中和處理,且添加鈣鹽去除氟會產生很多微細含氟污泥,在處理上非常的困難且需要相當大的費用。此外,無法回收其中的氟有價物以得到工業上可以使用的產品,只能當作污泥處理,實在可惜又浪費資源。 In recent years, the semiconductor industry and the optoelectronic manufacturing industry have flourished, and the types and quantities of wastewater generated during the manufacturing process have increased, such as in the electronics industry, wafer cleaning or etching processes, or etching in planar display (TFT-LCD) processes. The hydrofluoric acid-containing waste liquid produced on the glass substrate cannot be reused because it contains hydrofluoric acid and contains or does not contain impurities such as cesium, nitric acid, hydrochloric acid or sulfuric acid, and must be treated as waste water. However, these wastewaters generally contain impurities such as hydrofluoric acid, nitric acid, hydrochloric acid, and dissolved cesium. When treated as wastewater, a large amount of alkali must be used for neutralization treatment, and the addition of calcium salts to remove fluorine produces a lot of fine fluorine-containing sludge. It is very difficult to handle and requires considerable expense. In addition, it is impossible to recover the fluorine content in order to obtain industrially usable products, and it can only be treated as sludge, which is a waste of resources.

因此,如何將這些廢液當作廢水處理之外,又可以將其中的有價氟資源回收以供其他工業使用,是值得期待並且發展的課題。於目前一般經常採用的方法包括,係在前 述的廢液中加入氫氧化鈣(Ca(OH)2)或是氯化鈣(CaCl2),使氟離子(F-)與鈣離子(Ca2+)產生難溶於水的氟化鈣沉澱物。由於廢液中含有溶解性的二氧化矽及硫酸等不純物,因此所產生的氟化鈣沉澱物中會有二氧化矽、硫酸及鈣之共沉澱物,因此只能得到純度低的氟化鈣,無法供應工業上使用,只能當作污泥處理,能夠創造的經濟價值不高。 Therefore, how to treat these waste liquids as wastewater treatment and recycle valuable fluorine resources for use in other industries is a problem worthy of expectation and development. The methods that are commonly used at present, including Calcium hydroxide (Ca(OH)2) or calcium chloride (CaCl2) is added to the waste liquid to cause fluoride ion (F-) and calcium ion (Ca2+) to form a calcium fluoride precipitate which is hardly soluble in water. Since the waste liquid contains impurities such as dissolved cerium oxide and sulfuric acid, the resulting calcium fluoride precipitate has a coprecipitate of cerium oxide, sulfuric acid and calcium, so that only low purity calcium fluoride can be obtained. It cannot be supplied for industrial use and can only be treated as sludge, and the economic value that can be created is not high.

另外,氟化鈣沉澱物非常細微,沉降速度很慢,過濾非常困難,需要很大空間的處理設備,因此相對的投資費用相當龐大,因此在處理含有氫氟酸及含或不含溶解矽、硝酸、鹽酸或硫酸等不純物之廢酸的處理上係需要一種具有經濟效益且低處理成本之廢酸回收處理方法來改善目前的問題。 In addition, the calcium fluoride precipitate is very fine, the sedimentation rate is very slow, the filtration is very difficult, and the processing equipment requires a large space, so the relative investment cost is quite large, so the treatment contains hydrofluoric acid and contains or does not contain dissolved hydrazine, The treatment of waste acid such as nitric acid, hydrochloric acid or sulfuric acid requires an economical and low treatment cost waste acid recovery treatment to improve the current problems.

本發明的主要目的在於揭露一種蝕刻矽晶圓或玻璃之後的廢酸溶液處理方法,並利用鹼性溶液與廢酸溶液反應產生含氟矽酸鹽類,並且再利用緩衝劑來調整廢酸溶液的酸鹼值,使廢酸溶液中的氟離子與緩衝劑反應,而得到高價且較高純度的氟化物,可以供其他工業上應用。 The main object of the present invention is to disclose a method for treating a spent acid solution after etching a germanium wafer or glass, and reacting the alkaline solution with a spent acid solution to produce a fluorine-containing strontium salt, and then using a buffer to adjust the spent acid solution. The pH value causes the fluoride ion in the spent acid solution to react with the buffer to obtain a high-priced and high-purity fluoride, which can be used in other industries.

本發明之另一目的在於蝕刻晶圓或玻璃後之廢酸溶液中因含有氟矽酸,藉由兩段處理程序,可由廢酸溶液中回收有價且純度高的氟矽酸鹽及氟化物。 Another object of the present invention is to recover valuable and highly pure fluoroantimonate and fluoride from a spent acid solution by a two-stage treatment procedure in a spent acid solution after etching a wafer or glass.

根據上述之目的,本發明揭露一種廢酸溶液處理 方法,包含:提供廢酸溶液;執行過濾步驟,將廢酸溶液進行過濾以去除在廢酸溶液中之雜質;添加鹼性溶液於廢酸溶液中以產生含氟矽酸鹽固體物;第一固液分離步驟,係將含氟矽酸鹽固體物與廢酸溶液分離;調整廢酸溶液之酸鹼值,係將第一緩衝劑加入廢酸溶液中,使得廢酸溶液之該酸鹼值調整至第一酸鹼值;執行陽離子交換處理,係將廢酸溶液之陽離子不純物與陽離子交換樹脂中之陽離子進行置換;調整廢酸溶液之第一酸鹼值至第二酸鹼值,係將第二緩衝劑加入廢酸溶液中,使得廢酸溶液之酸鹼值由第一酸鹼值調整至第二酸鹼值,且廢酸溶液與緩衝劑反應產生氟化物及水溶液;以及第二固液分離步驟,係將氟化物與水溶液分離,以得到固體的氟化物。 According to the above object, the present invention discloses a waste acid solution treatment The method comprises: providing a waste acid solution; performing a filtration step, filtering the waste acid solution to remove impurities in the waste acid solution; adding an alkaline solution to the waste acid solution to produce a fluorine-containing citrate solid; The solid-liquid separation step separates the fluorine-containing citrate solids from the spent acid solution; adjusts the pH value of the waste acid solution by adding the first buffer to the spent acid solution to make the pH value of the spent acid solution Adjusting to the first pH value; performing a cation exchange treatment, replacing the cation impurities of the spent acid solution with the cations in the cation exchange resin; adjusting the first pH value of the waste acid solution to the second pH value, The second buffer is added to the spent acid solution, so that the pH value of the spent acid solution is adjusted from the first pH value to the second pH value, and the spent acid solution reacts with the buffer to generate fluoride and an aqueous solution; and the second solid The liquid separation step separates the fluoride from the aqueous solution to obtain a solid fluoride.

本發明之一實施例中,上述之廢酸溶液包括氫氟酸、氟矽酸、硫酸、硝酸及鹽酸等。 In an embodiment of the invention, the waste acid solution includes hydrofluoric acid, fluoroantimonic acid, sulfuric acid, nitric acid, hydrochloric acid or the like.

本發明之一實施例中,上述之鹼性溶液為氫氧化鈉溶液,其濃度範圍為溶液濃度由10%~60%。 In an embodiment of the invention, the alkaline solution is a sodium hydroxide solution, and the concentration ranges from 10% to 60%.

本發明之一實施例中,上述之第一固液分離步驟係包括一離心步驟、一脫水步驟及一烘乾步驟。 In one embodiment of the invention, the first solid-liquid separation step includes a centrifugation step, a dehydration step, and a drying step.

本發明之一實施例中,上述之第一緩衝劑係為氫氧化鈉溶液,其濃度範圍為10%~60%。 In one embodiment of the present invention, the first buffer is a sodium hydroxide solution having a concentration ranging from 10% to 60%.

本發明之一實施例中,上述之廢酸溶液之第一酸鹼值為2~4。 In one embodiment of the present invention, the first acid-base value of the above-mentioned spent acid solution is 2 to 4.

本發明之一實施例中,上述之陽離子交換處理係利用鈉型(Na-type)陽離子交換樹脂。 In one embodiment of the invention, the cation exchange treatment described above utilizes a sodium-type (Na-type) cation exchange resin.

本發明之一實施例中,上述之第二緩衝劑係為氫氧化鈉溶液,其濃度範圍為10%~60%。 In one embodiment of the present invention, the second buffer is a sodium hydroxide solution having a concentration ranging from 10% to 60%.

本發明之一實施例中,上述之廢酸溶液之第二酸鹼值為8~10。 In an embodiment of the invention, the second acid-base value of the waste acid solution is 8-10.

本發明之一實施例中,上述之第二固液分離步驟係包含一離心步驟、一脫水步驟及一烘乾步驟。 In an embodiment of the invention, the second solid-liquid separation step comprises a centrifugation step, a dehydration step and a drying step.

本發明之上述及其他目的與優點,不難從下述所選用實施例之詳細說明與附圖中,獲得深入了解。 The above and other objects and advantages of the present invention will be readily understood from

當然,本發明在某些另件上,或另件之安排上容許有所不同,但所選用之實施例,則於本說明書中,予以詳細說明,並於附圖中展示其構造。 Of course, the invention may be varied on certain components, or in the arrangement of the components, but the selected embodiments are described in detail in the specification and their construction is shown in the drawings.

步驟11‧‧‧提供廢酸溶液 Step 11‧‧‧ Provide waste acid solution

步驟13‧‧‧對廢酸溶液進行過濾 Step 13‧‧‧Filter the spent acid solution

步驟15‧‧‧在廢酸溶液中加入鹼性溶液以產生氟矽酸鹽固體物 Step 15‧‧‧ Add an alkaline solution to the spent acid solution to produce a fluorocitrate solid

步驟17‧‧‧第一固液分離步驟 Step 17‧‧‧First solid-liquid separation step

步驟19‧‧‧第一次調整廢酸溶液之酸鹼值 Step 19‧‧‧ Adjust the pH value of the spent acid solution for the first time

步驟21‧‧‧對廢酸溶液進行陽離子交換處理 Step 21 ‧ ‧ cation exchange treatment of spent acid solution

步驟23‧‧‧第二次調整廢酸溶液的酸鹼值 Step 23‧‧‧ Adjust the pH of the spent acid solution for the second time

步驟25‧‧‧第二固液分離步驟以得到氟化物 Step 25‧‧‧Second solid-liquid separation step to obtain fluoride

第1圖係表示本發明所揭露之廢酸溶液處理方法之步驟流程圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a flow chart showing the steps of the method for treating a spent acid solution disclosed in the present invention.

本發明在此所探討的方向為一種廢酸溶液處理方法,係將蝕刻矽晶圓或玻璃後之酸液進行回收,並且將這些回收後之廢酸溶液進行處理,以得到高價的且較純的氟化物,使其可以供其他工業上應用。為了能徹底地瞭解本發明, 將在下列的描述中提出詳盡的步驟及其組成。然而,對於本發明的較佳實施例,則會詳細描述如下,然而除了這些詳細描述之外,本發明還可以廣泛地施行在其他的實施例中,且本發明的範圍不受限定,其以之後的專利範圍為準。 The invention is directed to a method for treating a spent acid solution by recovering an acid solution after etching a wafer or glass, and treating the recovered spent acid solution to obtain a high-priced and relatively pure solution. Fluoride makes it suitable for other industrial applications. In order to thoroughly understand the present invention, Detailed steps and their composition will be set forth in the following description. However, the preferred embodiments of the present invention will be described in detail below, but the present invention may be widely practiced in other embodiments and the scope of the present invention is not limited by the detailed description. The scope of the patents that follow will prevail.

請參考第1圖。第1圖係表示本發明所揭露之廢酸溶液處理方法之步驟流程圖。在第1圖中,步驟11係為提供廢酸溶液。在半導體或光電產業中,對晶圓或是玻璃進行蝕刻,特別是需要須要利用蝕刻溶液來進行蝕刻時,其蝕刻溶液多半為酸性溶液,然而在經過蝕刻後所回收的液體即為廢酸溶液,其廢酸溶液可以是氫氟酸或是混有氫氟酸之酸液,其包含氟矽酸、硫酸、硝酸及鹽酸等。 Please refer to Figure 1. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a flow chart showing the steps of the method for treating a spent acid solution disclosed in the present invention. In Figure 1, step 11 provides a spent acid solution. In the semiconductor or optoelectronic industry, etching wafers or glass, especially when etching is required to etch the solution, the etching solution is mostly an acidic solution, but the liquid recovered after etching is a waste acid solution. The waste acid solution may be hydrofluoric acid or an acid solution mixed with hydrofluoric acid, which includes fluoroantimonic acid, sulfuric acid, nitric acid, hydrochloric acid and the like.

接著進行步驟13,係表示對廢酸溶液進行過濾。在步驟13中,無論是在半導體工業、太陽能工業或是面板工業,其所使用的材料多半含有矽或是二氧化矽,因此在對晶圓或是玻璃進行蝕刻製程時,含有矽的雜質或是玻璃砂會殘留在蝕刻液內,因此為了避免有雜質殘留在廢酸溶液中而影響後續對於氟化物的回收,故必須要先將廢酸溶液進行過濾,將含有矽的雜質或是玻璃砂由廢酸溶液中移除。 Next, step 13 is performed to filter the spent acid solution. In step 13, whether in the semiconductor industry, the solar industry, or the panel industry, most of the materials used contain germanium or germanium dioxide, so when the wafer or glass is etched, it contains germanium impurities or Glass sand will remain in the etching solution. Therefore, in order to avoid impurities remaining in the waste acid solution and affecting the subsequent recovery of fluoride, it is necessary to first filter the waste acid solution to contain impurities or glass sand. Removed from spent acid solution.

步驟15係表示在廢酸溶液中加入鹼性溶液以產生含氟矽酸鹽固體物之廢酸溶液。在步驟15中,為了要將廢酸溶液中有價的氟(F-)進行回收,係先將鹼性溶液加入廢酸溶液中,使得鹼性溶液與廢酸溶液產生反應而生成氟矽酸鹽固 體物。於本發明的實施例中,鹼性溶液為氫氧化鈉(NaOH)溶液,因此當氫氧化鈉溶液加入廢酸溶液中之後,氫氧化鈉溶液中的鈉離子會與廢酸溶液中的氟矽酸反應而生成氟矽酸鈉(Na2SiF6),其反應方程式為:HF(l)+H2SiF6(l)+2NaOH(l)->Na2SiF6(s)+2H2O(l)+HF(l) (1) Step 15 represents the addition of an alkaline solution to the spent acid solution to produce a spent acid solution of the fluorine-containing citrate solid. In step 15, in order to recover the valuable fluorine (F-) in the spent acid solution, the alkaline solution is first added to the waste acid solution, so that the alkaline solution reacts with the spent acid solution to form a fluoroantimonate. Solid matter. In an embodiment of the invention, the alkaline solution is a sodium hydroxide (NaOH) solution, so after the sodium hydroxide solution is added to the spent acid solution, the sodium ions in the sodium hydroxide solution and the fluorine oxime in the spent acid solution The acid reacts to form sodium fluoroantimonate (Na2SiF6), and the reaction equation is: HF (l) + H 2 SiF 6 (l) + 2 NaOH (l) -> Na 2 SiF 6 (s) + 2H 2 O (l) +HF (l) (1)

接著,步驟17係為第一固液分離步驟。由於在前述步驟15中,由於氫氧化鈉溶液與廢酸溶液反應生成的氟矽酸鈉(Na2SiF6),且此氟矽酸鈉不溶於廢酸溶液中,因此係利用離心步驟、脫水步驟及烘乾步驟等分離步驟,將氟矽酸鈉與廢酸溶液分離。要說明的是,在反應方程式(1)中的氫氟酸(HF)係為混合酸液,其仍然還包含了硫酸、硝酸及鹽酸等酸性溶液,其仍然視為廢酸溶液。 Next, step 17 is the first solid-liquid separation step. Since in the foregoing step 15, the sodium fluorophthalate (Na2SiF6) formed by the reaction of the sodium hydroxide solution with the spent acid solution, and the sodium fluoroantimonate is insoluble in the waste acid solution, the centrifugation step, the dehydration step and the baking are utilized. The separation step such as a dry step separates the sodium fluoroantimonate from the spent acid solution. It is to be noted that the hydrofluoric acid (HF) in the reaction formula (1) is a mixed acid solution which still contains an acidic solution such as sulfuric acid, nitric acid and hydrochloric acid, which is still regarded as a spent acid solution.

接著於步驟19,係表示第一次調整廢酸溶液之酸鹼值。雖然在步驟17中,已藉由添加鹼性溶液使其與廢酸溶液中的氟矽酸反應而生成氟矽酸鹽固體物,但是,廢酸溶液的氫離子(H+)濃度仍然很高,無法直接利用陽離子交換樹脂來進行陽離子的交換,因此在本實施例中,係將第一緩衝劑加入廢酸溶液中,利用第一緩衝劑來調整廢酸溶液的酸鹼值,使得廢酸溶液的酸鹼值調整至第一酸鹼值,其酸鹼值約為2~4。於此步驟中,第一緩衝劑可以是氫氧化鈉溶液,其濃度範圍為10%~60%。 Next, in step 19, it is indicated that the pH value of the spent acid solution is adjusted for the first time. Although in step 17, the fluorocitrate solid has been formed by adding an alkaline solution to react with fluoroantimonic acid in the spent acid solution, the hydrogen ion (H+) concentration of the spent acid solution is still high. The cation exchange resin cannot be directly used for the exchange of cations. Therefore, in the present embodiment, the first buffer is added to the waste acid solution, and the first buffer is used to adjust the pH value of the waste acid solution to make the spent acid solution. The pH value is adjusted to the first pH value, and the pH value is about 2~4. In this step, the first buffer may be a sodium hydroxide solution having a concentration ranging from 10% to 60%.

步驟21係對廢酸溶液進行離子交換處理。在步驟 21中,係將廢酸溶液通過離子交換樹脂(ion exchange resin)特別是指陽離子交換樹脂,讓廢酸溶液中的陽離子與陽離子交換樹脂中的陽離子進行交換,而避免在高酸鹼值的廢酸溶液環境中,廢液中得陽離子會形成氫氧化鹽的不純物。於本發明的實施例中,陽離子交換樹脂係為鈉離子交換樹脂,使得在廢酸溶液中的陽離子例如鎳(Ni)、鐵(Fe)、鋁(Al)、鉻(Cr)等等可以與鈉離子交換樹脂中之鈉離子(Na)進行離子交換,且由鈉離子交換樹脂中釋放出本發明所要利用的鈉離子(Na)。 Step 21 is an ion exchange treatment of the spent acid solution. In the steps In 21, the waste acid solution is passed through an ion exchange resin, particularly a cation exchange resin, to exchange cations in the spent acid solution with cations in the cation exchange resin, thereby avoiding waste in high pH values. In an acid solution environment, cations in the waste liquid form impurities of the hydroxide salt. In an embodiment of the invention, the cation exchange resin is a sodium ion exchange resin, such that cations such as nickel (Ni), iron (Fe), aluminum (Al), chromium (Cr), etc. in the spent acid solution can be combined with The sodium ion (Na) in the sodium ion exchange resin is ion-exchanged, and the sodium ion (Na) to be utilized by the present invention is released from the sodium ion exchange resin.

接著進行步驟23,係表示第二次調整廢酸溶液的酸鹼值。於步驟23中,係將第二緩衝劑加入已經經過離子交換處理之氫氟酸水溶液,使得氫氟酸水溶液的酸鹼值由第一酸鹼值(酸鹼值約為2~4)調整至第二酸鹼值,其第二酸鹼值範圍為8~10。於此步驟中,第二緩衝劑可以是氫氧化鈉溶液,其濃度範圍為10%~60%。此外,在調整廢酸溶液的酸鹼值的同時,可以由第二緩衝劑所提供的鈉離子與廢酸溶液中的氟離子進行反應,而產生氟化物及水溶液,其反應式如下表示:NaOH(l)+HF(l)->NaF(s)+H2O(l) (2) Next, step 23 is performed to adjust the pH value of the spent acid solution for the second time. In the step 23, the second buffer is added to the hydrofluoric acid aqueous solution which has been subjected to ion exchange treatment, so that the pH value of the hydrofluoric acid aqueous solution is adjusted from the first pH value (the pH value is about 2 to 4) to The second pH value has a second pH value ranging from 8 to 10. In this step, the second buffer may be a sodium hydroxide solution having a concentration ranging from 10% to 60%. In addition, while adjusting the pH value of the spent acid solution, the sodium ions provided by the second buffer may be reacted with the fluoride ions in the spent acid solution to produce fluoride and an aqueous solution, and the reaction formula is as follows: NaOH (l) +HF (l) ->NaF (s) +H 2 O (l) (2)

緊接著進行步驟25。步驟25係表示進行第二固液分離步驟以得到氟化物。由於在前述調整廢酸溶液的酸鹼值步驟中,其廢酸溶液係與做為第二緩衝劑的氫氧化鈉溶液進行反應,其反應生成氟化物及水溶液。為了得到氟化物,係 再利用固液分離步驟,例如離心步驟、脫水步驟及烘乾步驟,將水份移除之後可以得到固態且具有較高純度的氟化物,於本發明的實施例中,其氟化物為氟化鈉(NaF)。 Then proceed to step 25. Step 25 represents performing a second solid-liquid separation step to obtain a fluoride. Since the waste acid solution is reacted with the sodium hydroxide solution as the second buffer in the step of adjusting the pH value of the spent acid solution, the reaction forms a fluoride and an aqueous solution. In order to get fluoride, The solid-liquid separation step, such as the centrifugation step, the dehydration step, and the drying step, can be used to remove the water to obtain a solid and higher purity fluoride. In the embodiment of the present invention, the fluoride is fluorinated. Sodium (NaF).

因此根據上述之處理步驟可以得知,可以利用兩階段的方式來處理廢酸溶液,而得到氟化鈉以供應給工業上使用,因此在半導體製程中的廢酸溶液有再生利用的經濟價值,另外由於氟化物不易溶解於水溶液中,因此在經過上述之烘乾步驟之後,可以輕易的將水溶液移除,而不需要有任何的廢棄物處理上的成本,大幅度的降低了廢酸溶液處理的成本以及大幅的降低廢酸溶液對環境的污染。 Therefore, according to the above-mentioned processing steps, it can be known that the waste acid solution can be treated in a two-stage manner, and sodium fluoride is obtained for industrial use, so that the waste acid solution in the semiconductor process has an economic value of recycling. In addition, since the fluoride is not easily dissolved in the aqueous solution, the aqueous solution can be easily removed after the above drying step, without any waste disposal cost, and the waste acid solution treatment is greatly reduced. The cost and the substantial reduction of environmental pollution caused by the waste acid solution.

步驟11‧‧‧提供廢酸溶液 Step 11‧‧‧ Provide waste acid solution

步驟13‧‧‧對廢酸溶液進行過濾 Step 13‧‧‧Filter the spent acid solution

步驟15‧‧‧在廢酸溶液中加入鹼性溶液以產生氟矽酸鹽固體物 Step 15‧‧‧ Add an alkaline solution to the spent acid solution to produce a fluorocitrate solid

步驟17‧‧‧第一固液分離步驟 Step 17‧‧‧First solid-liquid separation step

步驟19‧‧‧第一次調整廢酸溶液的酸鹼值 Step 19‧‧‧ Adjust the pH of the spent acid solution for the first time

步驟21‧‧‧對廢酸溶液進行離子交換處理 Step 21‧‧‧Ion exchange treatment of spent acid solution

步驟23‧‧‧第二次調整廢酸溶液的酸鹼值 Step 23‧‧‧ Adjust the pH of the spent acid solution for the second time

步驟25‧‧‧第二固液分離步驟以得到氟化物 Step 25‧‧‧Second solid-liquid separation step to obtain fluoride

Claims (10)

一種廢酸溶液處理方法,包含:提供一廢酸溶液;執行一過濾步驟,將該廢酸溶液進行過濾以去除在該廢酸溶液中之一雜質;添加一鹼性溶液於該廢酸溶液中以產生氟矽酸鹽固體物;一第一固液分離步驟,係將該氟矽酸鹽固體物與該廢酸溶液分離;第一次調整該廢酸溶液之一酸鹼值,係將一第一緩衝劑加入該廢酸溶液中,使得該廢酸溶液之該酸鹼值調整至一第一酸鹼值;執行一陽離子交換處理,係將該廢酸溶液之至少一陽離子不純物與一陽離子交換樹脂中之一陽離子進行置換;第二次調整該廢酸溶液之該第一酸鹼值至一第二酸鹼值,係將一第二緩衝劑加入該廢酸溶液中,使得該廢酸溶液之該酸鹼值由該第一酸鹼值調整至該第二酸鹼值,且該廢酸溶液與該緩衝劑反應產生氟化物及水溶液;以及一第二固液分離步驟,係將該氟化物與該水溶液分離,以得到固體的該氟化物。 A waste acid solution treatment method comprising: providing a waste acid solution; performing a filtration step, filtering the waste acid solution to remove one impurity in the waste acid solution; adding an alkaline solution to the waste acid solution To produce a fluorocitrate solid; a first solid-liquid separation step, separating the fluorocitrate solid from the spent acid solution; adjusting the pH value of the spent acid solution for the first time, Adding a first buffer to the spent acid solution to adjust the pH value of the spent acid solution to a first pH value; performing a cation exchange treatment to remove at least one cationic impurity of the spent acid solution with a cation Displacement of one of the cations in the resin; second adjusting the first pH value of the spent acid solution to a second pH value, adding a second buffer to the spent acid solution to make the spent acid The pH value of the solution is adjusted from the first acid base value to the second acid base number, and the spent acid solution reacts with the buffer to produce a fluoride and an aqueous solution; and a second solid-liquid separation step is Fluoride is separated from the aqueous solution to To the fluoride solid. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該廢酸溶液包括:氫氟酸、氟矽酸、硫酸、硝酸及鹽酸。 The method for treating a spent acid solution according to claim 1, wherein the waste acid solution comprises: hydrofluoric acid, fluoroantimonic acid, sulfuric acid, nitric acid and hydrochloric acid. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該鹼性溶液為氫氧化鈉溶液,其濃度範圍為10~60%。 The method for treating a waste acid solution according to claim 1, wherein the alkaline solution is a sodium hydroxide solution, and the concentration ranges from 10 to 60%. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該第一固液分離步驟係包括一離心步驟、一脫水步驟及一烘乾步驟。 The method for treating a spent acid solution according to the first aspect of the invention, wherein the first solid-liquid separation step comprises a centrifugation step, a dehydration step and a drying step. 如申請專利範圍第1項所述之廢酸溶液處理方法,更包含一鹼性溶液加入該氟矽酸鹽以形成氟化物及二氧化矽。 The method for treating a spent acid solution as described in claim 1 further comprises adding an alkali solution to the fluoroantimonate to form fluoride and cerium oxide. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該第一緩衝劑係為氫氧化鈉溶液,其濃度範圍為10~60%。 The method for treating a spent acid solution according to claim 1, wherein the first buffer is a sodium hydroxide solution, and the concentration ranges from 10 to 60%. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該第一酸鹼值為2~4。 The method for treating a spent acid solution according to claim 1, wherein the first acid-base value is 2 to 4. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該陽離子交換處理係利用鈉型(Na-type)陽離子交換樹脂。 The method for treating a spent acid solution according to claim 1, wherein the cation exchange treatment utilizes a sodium-type (Na-type) cation exchange resin. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該第二緩衝劑係為氫氧化鈉溶液,其濃度範圍為10~60%。 The method for treating a spent acid solution according to the first aspect of the invention, wherein the second buffer is a sodium hydroxide solution, and the concentration ranges from 10 to 60%. 如申請專利範圍第1項所述之廢酸溶液處理方法,其中該第二固液分離步驟係包含一離心步驟、一脫水步驟及一烘乾步驟。 The method for treating a spent acid solution according to claim 1, wherein the second solid-liquid separation step comprises a centrifugation step, a dehydration step and a drying step.
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