TW201522041A - Transparent gas barrier film - Google Patents

Transparent gas barrier film Download PDF

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TW201522041A
TW201522041A TW103135729A TW103135729A TW201522041A TW 201522041 A TW201522041 A TW 201522041A TW 103135729 A TW103135729 A TW 103135729A TW 103135729 A TW103135729 A TW 103135729A TW 201522041 A TW201522041 A TW 201522041A
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Noriaki Mochizuki
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Nippon Kayaku Kk
Polatechno Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • C08J7/0423Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/048Forming gas barrier coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
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Abstract

The present invention addresses the problem of obtaining a film having high gas barrier properties against water vapor, etc., while still having high transmittance. A film having, on a substrate, a cured-substance layer composed of a polymerizable resin composition containing at least one (meth)acrylate compound having a trimethylol propane skeleton or an isocyanuric skeleton, and having on the cured-substance layer a layer with a thickness of 50-500 nm including silicon and nitrogen, wherein the problem is addressed by using a transparent barrier film characterized in that the (meth)acrylate compound content is 40-99 weight parts per 100 weight parts of the polymerizable resin composition, the thickness of the cured layer being 0.1-20 [mu]m, and transmittance being 75% or more.

Description

透明阻氣膜 Transparent gas barrier film

本發明係關於一種透明阻氣膜。 The present invention relates to a transparent gas barrier film.

阻氣性膜係為了於必須阻斷水蒸氣或氧氣等各種氣體之物品或食品之包裝、工業用品、醫藥品等中防止變質而較多地使用。又,除包裝用途以外,亦於液晶顯示元件、太陽電池、有機電致發光(以下,簡稱為OLED(Organic Light Emitting Diode,有機發光二極管))用途中使用。包裝用領域中通常使用之阻氣性膜亦可為透明度較低,又,亦可不具有高程度之阻氣性。因此,該阻氣性膜無法於顯示器材料領域中使用。近年來,使用不為氧化鋁或氧化鎂等透明性較低之材料,而使用氧化矽、氮氧化矽等而不斷開發透明度較高、且水蒸氣阻隔性較高之膜,但透明性、阻氣性、密接性及耐久性均良好之膜尚未被開發,而進行各種研究。 The gas barrier film is used in a large amount to prevent deterioration of articles, foods, foods, and the like of various gases such as water vapor or oxygen. Further, it is used in liquid crystal display elements, solar cells, and organic electroluminescence (hereinafter, simply referred to as OLED (Organic Light Emitting Diode)). The gas barrier film generally used in the field of packaging may also have a low transparency or a high degree of gas barrier properties. Therefore, the gas barrier film cannot be used in the field of display materials. In recent years, the use of ruthenium oxide, ruthenium oxynitride, etc., which are not transparent materials such as alumina or magnesia, has been used to continuously develop a film having high transparency and high water vapor barrier properties, but transparency and resistance. A film having good gas, adhesion, and durability has not been developed, and various studies have been conducted.

尤其於OLED之領域中,針對透明膜,近年來,除大型化及輕量化之要求以外,亦要求長期可靠性較高、形狀之自由度較高、可實現曲面顯示、且不破裂而容易搬運。然而,於OLED之領域中,若含有即便為稍許之水分,則其顯示功能下降,故而要求與玻璃同等之較高之阻氣性。另一方面,若使用玻璃本身,則有於彎曲時或掉落之情形時破裂之問題。因此,無法使用玻璃或其同等之膜。 In particular, in the field of OLEDs, in recent years, in addition to the requirements for enlargement and weight reduction, transparent films are required to have high long-term reliability, high degree of freedom of shape, surface display, and easy handling without cracking. . However, in the field of OLEDs, if a slight amount of water is contained, the display function is lowered, so that a high gas barrier property equivalent to that of glass is required. On the other hand, if the glass itself is used, there is a problem of cracking when it is bent or dropped. Therefore, it is impossible to use glass or its equivalent film.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平2-251429號 [Patent Document 1] Japanese Patent Laid-Open No. 2-251429

[專利文獻2]日本專利特開平6-124785號 [Patent Document 2] Japanese Patent Laid-Open No. 6-124785

[專利文獻3]日本專利第3484891號 [Patent Document 3] Japanese Patent No. 3484891

[專利文獻4]日本專利特開2006-299145號 [Patent Document 4] Japanese Patent Laid-Open No. 2006-299145

[專利文獻5]日本專利特開2011-201135號 [Patent Document 5] Japanese Patent Laid-Open No. 2011-201135

[專利文獻6]日本專利特開2011-238355號 [Patent Document 6] Japanese Patent Laid-Open No. 2011-238355

[非專利文獻] [Non-patent literature]

[非專利文獻1]接著學會志 第71卷(2002)第4號, P12-P16 [Non-Patent Document 1] Continued Learning Society Vol. 71 (2002) No. 4, P12-P16

[非專利文獻2]東海大學紀要工學部Vol.31, No.1, 1991, P23-30 [Non-Patent Document 2] Department of Mechanical Engineering, Tokai University Vol.31, No.1, 1991, P23-30

[非專利文獻3]名古屋大學大學院工學研究科2008年度修士論文報告編號:甲第8422號,深谷康太著 [Non-Patent Document 3] Nagoya University Graduate School of Engineering 2008 Annual Monk Paper Report No.: No. 8422, Fukaya

[非專利文獻4]紫外線硬化系統,綜合技術中心(股)出版,加藤清視著P259-P302 [Non-Patent Document 4] Ultraviolet curing system, integrated technology center (share) publication, Kato clears P259-P302

[非專利文獻5]日本陶瓷協會學術論文志101(1180), 1419-1422, 1993-12-01 [Non-Patent Document 5] Japanese Ceramic Society Academic Papers 101 (1180), 1419-1422, 1993-12-01

[非專利文獻6]窯業協會志88(1021), 511-515, 1980-09-01 [Non-Patent Document 6] Kiln Industry Association 88 (1021), 511-515, 1980-09-01

作為針對上述問題之技術,於專利文獻1至專利文獻3中,揭示有關於阻隔性較高之阻氣膜之技術。然而,透明塑膠等之膜有對於玻璃而阻氣性較差之問題,無法於OLED等中使用。於專利文獻4中,揭示有藉由使用金屬烷氧化物之溶膠-凝膠法而形成之陶瓷膜,於專利文獻5及專利文獻6中,揭示有藉由使用無機化合物與有機化合物而提高阻氣性之技術。然而,即便藉由上述技術,亦無法獲得透明性較高、阻氣性較高、密接性較高、耐久性亦充分良好、且生產性優異之 膜。 As a technique for the above problems, Patent Literature 1 to Patent Document 3 disclose techniques for a gas barrier film having a high barrier property. However, a film such as a transparent plastic has a problem of poor gas barrier properties against glass, and cannot be used in an OLED or the like. Patent Document 4 discloses a ceramic film formed by a sol-gel method using a metal alkoxide, and Patent Document 5 and Patent Document 6 disclose that the resistance is improved by using an inorganic compound and an organic compound. Gas technology. However, even with the above technique, it is not possible to obtain high transparency, high gas barrier properties, high adhesion, sufficient durability, and excellent productivity. membrane.

上述期望中,改良物理氣相成長法(PVD)或化學氣相成長法(CVD),而進一步提高金屬膜性質之技術係揭示於非專利文獻1至3中。已知藉由上述方法所獲得之金屬膜之阻氣性較高。然而,儘管如此,阻氣性亦不充分,尤其是金屬膜對基材之密接性較差、金屬膜之柔軟性較大地下降,故而於將膜彎折時於金屬膜產生龜裂,而阻氣性較大地下降。為了改善其密接性或柔軟性,研究有於由(甲基)丙烯酸酯化合物形成之樹脂硬化物層應用金屬膜,但若應用於該樹脂硬化物層,則通常有表面白濁、產生霧度而透明度下降、密接性下降、於高溫高濕試驗後密接性下降等問題。 Among the above-mentioned proposals, techniques for improving physical properties of metal films by improving physical vapor phase growth (PVD) or chemical vapor deposition (CVD) are disclosed in Non-Patent Documents 1 to 3. It is known that the metal film obtained by the above method has high gas barrier properties. However, in spite of this, the gas barrier property is insufficient, and in particular, the adhesion of the metal film to the substrate is poor, and the flexibility of the metal film is largely lowered. Therefore, cracking occurs in the metal film when the film is bent, and gas barrier is caused. The sex is greatly reduced. In order to improve the adhesion or flexibility, it has been studied to apply a metal film to a cured resin layer formed of a (meth) acrylate compound. However, when applied to the cured layer of the resin, the surface is usually cloudy and haze is generated. The transparency is lowered, the adhesion is lowered, and the adhesion is lowered after the high temperature and high humidity test.

為了解決上述課題,本發明者等人進行努力研究,結果新穎發現:以其係於基材上具有由包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物之聚合性樹脂組合物所形成之樹脂硬化物層,且於該樹脂硬化物層上含有具有50nm至500nm之厚度之包含矽與氮之層之膜,並且該(甲基)丙烯酸酯化合物之含量相對於該聚合性樹脂組合物100重量份為40重量份至99重量份,該樹脂硬化物層之厚度為0.1μm至20μm,透過率為75%以上為特徵之膜之透明性較高、阻氣性較高、密接性較高、耐久性亦充分良好、且生產性亦優異。 In order to solve the above-mentioned problems, the inventors of the present invention have conducted intensive studies, and as a result, have found that they are attached to a substrate and have at least one (meth) group having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton. a cured resin layer formed of a polymerizable resin composition of an acrylate compound, and a film containing a layer of cerium and nitrogen having a thickness of 50 nm to 500 nm on the resin cured layer, and the (meth) acrylate The content of the compound is from 40 parts by weight to 99 parts by weight based on 100 parts by weight of the polymerizable resin composition, the thickness of the cured resin layer is from 0.1 μm to 20 μm, and the transmittance of the film is more than 75%. High, high gas barrier properties, high adhesion, good durability, and excellent productivity.

即,本發明係關於「(1)一種膜,其特徵在於:其係於基材上具有由包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物之聚合性樹脂組合物形成之硬化物層,且於該硬化物層上含有具有50nm至500nm之厚度之包含矽與氮之層之膜,並且 該(甲基)丙烯酸酯化合物之含量相對於該聚合性樹脂組合物100重量份為40重量份至99重量份,該硬化物層之厚度為0.1μm至20μm,透過率為75%以上;(2)如(1)記載之膜,其中上述聚合性樹脂組合物係相對於該聚合性樹脂組合物100重量份,含有具有二環戊二烯骨架之(甲基)丙烯酸酯化合物10重量份至55重量份;(3)如(1)或(2)記載之膜,其中上述聚合性樹脂組合物係相對於該聚合性樹脂組合物100重量份,含有具有分支型全氟烯基之氟系化合物或其衍生物0.01重量份至1重量份;(4)如(1)至(3)中任一項記載之膜,其中上述包含矽與氮之層進而含有鋁作為元素;(5)一種液晶顯示裝置,其係使用如(1)至(4)中任一項記載之膜;(6)一種有機電致發光元件,其係使用如(1)至(4)中任一項記載之膜;(7)如(1)至(4)中任一項記載之膜,其中上述包含矽與氮之層係藉由離子束輔助蒸鍍法而形成;(8)如(1)至(4)中任一項記載之膜,其中上述包含矽與氮之層係藉由磁控濺鍍法而形成」。 That is, the present invention relates to "(1) a film characterized in that it has a (meth) acrylate containing at least one skeleton having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton on a substrate. a cured layer formed of a polymerizable resin composition of a compound, and a film containing a layer of tantalum and nitrogen having a thickness of 50 nm to 500 nm is contained on the cured layer, and The content of the (meth) acrylate compound is 40 parts by weight to 99 parts by weight based on 100 parts by weight of the polymerizable resin composition, and the thickness of the cured layer is 0.1 μm to 20 μm, and the transmittance is 75% or more; (2) The film according to the above (1), wherein the polymerizable resin composition contains 10 parts by weight of the (meth) acrylate compound having a dicyclopentadiene skeleton to 100 parts by weight of the polymerizable resin composition. (3) The film according to the above-mentioned (1) or (2), wherein the polymerizable resin composition contains a fluorine-based compound having a branched perfluoroalkenyl group in an amount of 100 parts by weight based on 100 parts by weight of the polymerizable resin composition. The film according to any one of (1) to (3), wherein the layer containing ruthenium and nitrogen further contains aluminum as an element; (5) a film A liquid crystal display device using the film according to any one of (1) to (4), wherein the organic electroluminescence device is used according to any one of (1) to (4). (7) The film according to any one of (1) to (4) wherein the layer containing cerium and nitrogen is formed by ion beam assisted vapor deposition. (8) The film according to any one of (1) to (4) wherein the layer containing niobium and nitrogen is formed by magnetron sputtering.

本發明之膜之透明性較高,阻氣性較高,密接性較高,又,耐久性亦充分良好,且生產性優異。 The film of the present invention has high transparency, high gas barrier properties, high adhesion, and good durability, and excellent productivity.

本發明係關於一種膜,其特徵在於:其係於基材上具有由包含 至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物之聚合性樹脂組合物形成之硬化物層,且於該硬化物層上含有具有50nm至500nm之厚度之包含矽與氮之層之膜,並且該(甲基)丙烯酸酯化合物之含量相對於該聚合性樹脂組合物100重量份為40重量份至99重量份,該硬化物層之厚度為0.1μm至20μm,透過率為75%以上。 The present invention relates to a film characterized in that it is attached to a substrate a cured layer formed of a polymerizable resin composition of at least one (meth) acrylate compound having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton, and having a thickness of 50 nm to 500 nm on the cured layer a film comprising a layer of cerium and nitrogen, and the content of the (meth) acrylate compound is 40 parts by weight to 99 parts by weight based on 100 parts by weight of the polymerizable resin composition, and the thickness of the cured layer is 0.1 From μm to 20 μm, the transmittance is 75% or more.

所謂本發明之基材,只要為由可保持透明性與阻氣性之有機材料所形成者,則並無特別限定。作為該有機材料,例如可例示:包含以丙烯酸酯、甲基丙烯酸酯、聚對苯二甲酸乙二酯(以下,簡稱為「PET」)、聚萘二甲酸乙二酯(以下,簡稱為「PEN」)、聚碳酸酯、聚芳酯、聚氯乙烯、聚乙烯、聚丙烯、尼龍、聚醯亞胺、聚醯胺、環烯烴、三乙醯纖維素、倍半矽氧烷作為基本骨架之有機、無機混合之有機材料等,可使用將該等有機材料形成為5μm至500μm之厚度之膜者作為基材。若考慮成本或獲取容易之方面,則較佳為包含PET、PEN、或聚碳酸酯之膜。就雙折射、尤其是相位差較少之方面而言,較佳為藉由包含以環烯烴、三乙醯纖維素、倍半矽氧烷作為基本骨架之有機、無機混合之有機材料所形成之膜。作為包含環烯烴之膜之製品,可例示:ZEON公司製造之Zeonor、JSR公司製造之ARTON、Gunze公司製造之F膜,作為藉由包含以倍半矽氧烷作為基本骨架之有機、無機混合之有機材料所形成之膜,可例示:新日鐵化學公司製造之SILPLUS、Chisso公司製造之Sila-DEC。 The substrate of the present invention is not particularly limited as long as it is formed of an organic material capable of maintaining transparency and gas barrier properties. The organic material may, for example, be acrylate, methacrylate or polyethylene terephthalate (hereinafter abbreviated as "PET") or polyethylene naphthalate (hereinafter, simply referred to as " PEN"), polycarbonate, polyarylate, polyvinyl chloride, polyethylene, polypropylene, nylon, polyimine, polyamine, cyclic olefin, triacetyl cellulose, sesquiterpene oxide as the basic skeleton As the organic or inorganic mixed organic material, a film having a thickness of 5 μm to 500 μm may be used as the substrate. A film comprising PET, PEN, or polycarbonate is preferred if cost or ease of acquisition is considered. In terms of birefringence, especially in that the phase difference is small, it is preferably formed by an organic or inorganic mixed organic material containing a cyclic olefin, triacetyl cellulose, and sesquiterpene alkane as a basic skeleton. membrane. Examples of the product of the film containing a cycloolefin include Zeonor manufactured by ZEON Co., Ltd., ARTON manufactured by JSR Corporation, and F film manufactured by Gunze Co., Ltd. as an organic or inorganic mixture containing sesquiterpene oxide as a basic skeleton. The film formed of the organic material can be exemplified by SILPLUS manufactured by Nippon Steel Chemical Co., Ltd. and Sila-DEC manufactured by Chisso Corporation.

本發明之膜係於基材上設置形成為0.1μm至20μm之硬化物之層。硬化物之層係由聚合性樹脂組合物形成,聚合性樹脂組合物係包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物。該聚合性樹脂組合物例如包含:具有至少1種丙烯醯基之(甲基)丙烯酸酯化合物90至99.9重量份、及聚合起始劑0.1至10重量 份。形成該硬化物層之聚合性樹脂組合物必須包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物,其含量相對於聚合性樹脂組合物100重量份為40重量份至99重量份。為了提高硬化之穩定性,具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物相對於調配有組合物之樹脂量可為50重量%以上,更佳為60重量%以上,進而較佳為70重量%以上。若具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物為40重量%以下,則不發揮本發明之性能,故而欠佳。於本發明中,具有三羥甲基丙烷骨架之(甲基)丙烯酸酯化合物之透明性增高,故而較佳。 The film of the present invention is provided with a layer formed of a cured product of 0.1 μm to 20 μm on a substrate. The layer of the cured product is formed of a polymerizable resin composition, and the polymerizable resin composition contains at least one (meth) acrylate compound having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton. The polymerizable resin composition contains, for example, 90 to 99.9 parts by weight of a (meth) acrylate compound having at least one propylene group, and 0.1 to 10 parts by weight of a polymerization initiator. Share. The polymerizable resin composition forming the cured layer must contain at least one (meth) acrylate compound having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton in an amount of 100 parts by weight relative to the polymerizable resin composition. The serving is from 40 parts by weight to 99 parts by weight. In order to improve the stability of hardening, the (meth) acrylate compound having a trimethylolpropane skeleton or an iso-cyanuric acid skeleton may be 50% by weight or more, more preferably 60% by weight based on the amount of the resin to which the composition is formulated. More than %, more preferably 70% by weight or more. When the (meth) acrylate compound having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton is 40% by weight or less, the performance of the present invention is not exhibited, which is not preferable. In the present invention, the (meth) acrylate compound having a trimethylolpropane skeleton is preferred because it has high transparency.

可使調配有(甲基)丙烯酸酯化合物至少1種與聚合起始劑之聚合性樹脂組合物硬化,而形成包含聚合性樹脂硬化物之層。作為(甲基)丙烯酸酯化合物,具體而言,可使用非專利文獻4中記載之丙烯酸酯單體。並不限定於該等,只要為具有至少1種(甲基)丙烯醯基之(甲基)丙烯酸酯化合物,則並無特別限定。於聚合性樹脂組成中,可添加上述(甲基)丙烯酸酯化合物以外之成分,例如各種聚合物、或低聚物等,只要為不阻礙硬化之成分及其濃度,則可無特別限定而使用。作為添加之量,只要可使聚合性樹脂組合物硬化,則亦可以任意之比率調配,相對於聚合性樹脂組合物100重量份,更佳為40重量份至99重量份。 The polymerizable resin composition containing at least one of the (meth) acrylate compounds and the polymerization initiator can be cured to form a layer containing the polymerizable resin cured product. Specifically, as the (meth) acrylate compound, the acrylate monomer described in Non-Patent Document 4 can be used. The present invention is not limited to these, and is not particularly limited as long as it is a (meth) acrylate compound having at least one (meth) acrylonitrile group. In the polymerizable resin composition, a component other than the above (meth) acrylate compound, for example, various polymers or oligomers may be added, and it may be used without particular limitation as long as it is a component which does not inhibit hardening and its concentration. . The amount of the polymerizable resin composition may be adjusted in an arbitrary ratio, and is preferably 40 parts by weight to 99 parts by weight based on 100 parts by weight of the polymerizable resin composition.

作為具有三羥甲基丙烷骨架之(甲基)丙烯酸酯化合物,可例示:三羥甲基丙烷三丙烯酸酯[日本化藥公司製造之Kayarad TMPTA]、EO改性三羥甲基丙烷三丙烯酸酯[Sartomer公司製造之SR-454]、PO改性三羥甲基丙烷三丙烯酸酯[日本化藥公司製造之TPA-310、TPA-320、TPA-330等]、三羥甲基丙烷三甲基丙烯酸酯[Sartomer製造之SR-350]、三羥甲基丙烷三縮水甘油醚與丙烯酸之反應產物[DENACOL DA-321,長瀨產業(股)製造]等。 As the (meth) acrylate compound having a trimethylolpropane skeleton, trimethylolpropane triacrylate [Kayarad TMPTA manufactured by Nippon Kayaku Co., Ltd.], EO-modified trimethylolpropane triacrylate can be exemplified. [SR-454 manufactured by Sartomer], PO modified trimethylolpropane triacrylate [TPA-310, TPA-320, TPA-330, etc. manufactured by Nippon Kayaku Co., Ltd.], trimethylolpropane trimethyl Acrylate [SR-350 manufactured by Sartomer], reaction product of trimethylolpropane triglycidyl ether and acrylic acid [DENACOL DA-321, manufactured by Nagase Industries Co., Ltd.], and the like.

作為具有異三聚氰酸骨架之(甲基)丙烯酸酯化合物,可例示:異氰尿酸二丙烯醯氧基乙酯[東亞合成公司製造之Aronix M-215]、異氰尿酸三丙烯醯氧基乙酯[日立化成公司製造之FA-731A]、己內酯改性異氰尿酸三丙烯醯氧基乙酯[東亞合成公司製造之Aronix M-325]、異氰尿酸三甲基丙烯醯氧基乙酯[日立化成公司製造之FA-731M]等。 As the (meth) acrylate compound having a hetero-cyanuric acid skeleton, dimethicone ethyl isocyanurate (Aronix M-215 manufactured by Toagosei Co., Ltd.), tripropylene sulfonate isocyanurate can be exemplified. Ethyl ester [FA-731A manufactured by Hitachi Chemical Co., Ltd.], caprolactone-modified tripropylene methoxyethyl isocyanurate [Aronix M-325 manufactured by Toagosei Co., Ltd.], trimethyl propylene sulfoxyl isocyanurate Ethyl ester [FA-731M manufactured by Hitachi Chemical Co., Ltd.].

進而,藉由使上述聚合性樹脂組合物相對於聚合性樹脂組合物100重量份而含有具有二環戊二烯骨架之(甲基)丙烯酸酯化合物10重量份至55重量份,可獲得透明性進而較高、阻氣性較高、密接性較高、耐久性亦充分良好、且生產性優異之膜。作為具有二環戊二烯骨架之(甲基)丙烯酸酯之較佳之含量,為15重量%至50重量%,作為進而較佳之含量,為20重量%至40重量%。於本發明中,用以形成較佳之聚合性樹脂硬化物之層之聚合性樹脂組合物係包含含有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物、具有二環戊二烯骨架之(甲基)丙烯酸酯、及其聚合起始劑之組合物,用以形成進而較佳之聚合性樹脂硬化物之層之聚合性樹脂組合物係包含含有三羥甲基丙烷骨架之(甲基)丙烯酸酯化合物、具有二環戊二烯骨架之(甲基)丙烯酸酯、及其聚合起始劑之組合物。 Furthermore, by containing 10 parts by weight to 55 parts by weight of the (meth) acrylate compound having a dicyclopentadiene skeleton with respect to 100 parts by weight of the polymerizable resin composition, transparency can be obtained. Further, the film has a high gas barrier property, high adhesion, high durability, and excellent productivity. The preferred content of the (meth) acrylate having a dicyclopentadiene skeleton is 15% by weight to 50% by weight, and more preferably 20% by weight to 40% by weight. In the present invention, the polymerizable resin composition for forming a layer of a preferred polymerizable resin cured product contains a (meth) acrylate compound containing a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton, and has two A composition of a (meth) acrylate of a cyclopentadiene skeleton and a polymerization initiator thereof, and a polymerizable resin composition for forming a layer of a further polymerizable resin cured product, which comprises a trimethylolpropane. A composition of a (meth) acrylate compound of a skeleton, a (meth) acrylate having a dicyclopentadiene skeleton, and a polymerization initiator thereof.

所謂具有二環戊二烯骨架之(甲基)丙烯酸酯化合物,係指例如具有雙環戊基骨架、二環戊烯基骨架或金剛烷骨架之樹脂。其中,為了進一步提高濕熱耐久性,較佳為具有雙環戊基骨架或二環戊烯基骨架之樹脂,最佳為具有雙環戊基骨架之樹脂。作為具有雙環戊基骨架之化合物,例如較佳為:丙烯酸雙環戊酯(日立化成公司製造之FA-513A)、甲基丙烯酸雙環戊酯(日立化成公司製造之FA-513M)或雙環戊基二丙烯酸酯(日本化藥公司製造之Kayarad R-684)等。作為具有二環戊烯基骨架之化合物,例如較佳為:丙烯酸二環戊烯酯(日立化成公司製造之FA-511A)、丙烯酸二環戊烯基氧基乙酯(日立化成公司製 造之FA-512A)或甲基丙烯酸二環戊烯基氧基乙酯(日立化成製造之FA-512M)等。作為具有金剛烷骨架之化合物,例如可例示:甲基丙烯酸2-甲基-2-金剛烷酯(出光興產公司製造之Adamantate MM)、甲基丙烯酸2-乙基-2金剛烷酯(出光興產公司製造之Adamantate EM)、甲基丙烯酸3-羥基-1-金剛烷酯(出光興產公司製造之Adamantate HM)、丙烯酸3-羥基-1-金剛烷酯(出光興產公司製造之Adamantate HA)、丙烯酸2-甲基-2-金剛烷酯(出光興產公司製造之Adamantate MA)或丙烯酸2-乙基-2-金剛烷酯(出光興產公司製造之Adamantate EA)等。 The (meth) acrylate compound having a dicyclopentadiene skeleton means, for example, a resin having a biscyclopentyl skeleton, a dicyclopentenyl skeleton or an adamantane skeleton. Among them, in order to further improve the wet heat durability, a resin having a bicyclopentyl skeleton or a dicyclopentenyl skeleton is preferred, and a resin having a bicyclopentyl skeleton is preferred. As the compound having a bicyclopentyl skeleton, for example, dicyclopentyl acrylate (FA-513A manufactured by Hitachi Chemical Co., Ltd.), dicyclopentanyl methacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.), or dicyclopentyldiamide is preferable. Acrylate (Kayarad R-684, manufactured by Nippon Kayaku Co., Ltd.), etc. The compound having a dicyclopentenyl skeleton is preferably, for example, dicyclopentenyl acrylate (FA-511A manufactured by Hitachi Chemical Co., Ltd.) or dicyclopentenyloxyethyl acrylate (manufactured by Hitachi Chemical Co., Ltd.). FA-512A) or dicyclopentenyloxyethyl methacrylate (FA-512M manufactured by Hitachi Chemical Co., Ltd.). Examples of the compound having an adamantane skeleton include 2-methyl-2-adamantyl methacrylate (Adamantate MM manufactured by Idemitsu Kosan Co., Ltd.) and 2-ethyl-2 adamantyl methacrylate (light-emitting) Adamantate EM manufactured by Hsinchu Co., Ltd., 3-hydroxy-1-adamantyl methacrylate (Adamantate HM manufactured by Idemitsu Kosan Co., Ltd.), 3-hydroxy-1-adamantyl acrylate (Adamantate manufactured by Idemitsu Kosan Co., Ltd.) HA), 2-methyl-2-adamantyl acrylate (Adamantate MA manufactured by Idemitsu Kosan Co., Ltd.) or 2-ethyl-2-adamantyl acrylate (Adamantate EA manufactured by Idemitsu Kosan Co., Ltd.).

於本發明中使用之(甲基)丙烯酸酯化合物或聚合性樹脂組合物藉由紫外線而聚合之情形時,照射紫外線並藉由光聚合起始劑而產生聚合反應。作為光聚合起始劑,例如可列舉:2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1(Ciba Specialty Chemicals公司製造之Irgacure-907)、1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製造之Irgacure-184)、4-(2-羥基乙氧基)-苯基(2-羥基-2-丙基)酮(Ciba Specialty Chemicals公司製造之Irgacure-2959)、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮(Merck公司製造之Darocure-953)、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮(Merck公司製造之Darocure-1116)、2-羥基-2-甲基-1-苯基丙烷-1-酮(Ciba Specialty Chemicals公司製造之Irgacure-1173)、二乙氧基苯乙酮等苯乙酮系化合物、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、2,2-二甲氧基-2-苯基苯乙酮(Ciba Specialty Chemicals公司製造之Irgacure-651)等安息香系化合物、苯甲醯苯甲酸、苯甲醯苯甲酸甲酯、4-苯基二苯甲酮、羥基二苯甲酮、4-苯甲醯基-4'-甲基二苯基硫醚、3,3'-二甲基-4-甲氧基二苯甲酮(日本化藥公司製造之kayacure MBP)等二苯甲酮系化合物、噻噸酮、2-氯噻噸酮(日本化藥公司製造之kayacure CTX)、2-甲基噻噸酮、2,4-二甲基噻噸酮(日本化藥公司製造之kayacure RTX)、 異丙基噻噸酮、2,4-二氯噻噸酮(日本化藥公司製造之kayacure CTX)、2,4-二乙基噻噸酮(日本化藥公司製造之kayacure DETX)、2,4-二異丙基噻噸酮(日本化藥公司製造之kayacure DITX)等噻噸酮系化合物等。更佳為2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1(Ciba Specialty Chemicals公司製造之Irgacure-907)、1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製造之Irgacure-184)或2,2-二甲氧基-2-苯基苯乙酮(Ciba Specialty Chemicals公司製造之Irgacure-651)。該等光聚合起始劑可使用1種亦可以任意之調配比率混合複數種而使用。 When the (meth) acrylate compound or the polymerizable resin composition used in the present invention is polymerized by ultraviolet rays, ultraviolet rays are irradiated and a polymerization reaction is carried out by a photopolymerization initiator. The photopolymerization initiator may, for example, be 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropane-1 (Irgacure-907, manufactured by Ciba Specialty Chemicals Co., Ltd.). 1-hydroxycyclohexyl phenyl ketone (Irgacure-184, manufactured by Ciba Specialty Chemicals, Inc.), 4-(2-hydroxyethoxy)-phenyl(2-hydroxy-2-propyl) ketone (manufactured by Ciba Specialty Chemicals Co., Ltd.) Irgacure-2959), 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one (Darocure-953, manufactured by Merck), 1-(4-isopropyl Phenyl)-2-hydroxy-2-methylpropan-1-one (Darocure-1116, manufactured by Merck), 2-hydroxy-2-methyl-1-phenylpropan-1-one (Ciba Specialty Chemicals, Inc.) Manufacture of Irgacure-1173), diethoxyacetophenone and other acetophenone-based compounds, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-dimethoxy-2 A benzoin-based compound such as phenylacetophenone (Irgacure-651, manufactured by Ciba Specialty Chemicals Co., Ltd.), benzamidine benzoic acid, methyl benzhydrazide, 4-phenylbenzophenone, hydroxybenzophenone 4-Benzylmercapto-4'-methyldiphenyl sulfide , benzophenone-based compound such as 3,3'-dimethyl-4-methoxybenzophenone (kayacure MBP manufactured by Nippon Kayaku Co., Ltd.), thioxanthone, 2-chlorothioxanthone (Japanese Kayacure CTX), 2-methylthioxanthone, 2,4-dimethylthioxanthone (kayacure RTX manufactured by Nippon Kayaku Co., Ltd.) Isopropyl thioxanthone, 2,4-dichlorothioxanthone (kayacure CTX manufactured by Nippon Kayaku Co., Ltd.), 2,4-diethylthioxanthone (kayacure DETX manufactured by Nippon Kayaku Co., Ltd.), 2, A thioxanthone compound such as 4-diisopropylthioxanthone (kayacure DITX manufactured by Nippon Kayaku Co., Ltd.). More preferably, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropane-1 (Irgacure-907, manufactured by Ciba Specialty Chemicals, Inc.), 1-hydroxycyclohexyl phenyl ketone (Irgacure-184, manufactured by Ciba Specialty Chemicals, Inc.) or 2,2-dimethoxy-2-phenylacetophenone (Irgacure-651, manufactured by Ciba Specialty Chemicals, Inc.). These photopolymerization initiators may be used in combination of one kind or a plurality of types in any ratio.

於使用二苯甲酮系化合物或噻噸酮系化合物作為光聚合起始劑之情形時,為了促進光聚合反應,亦可併用助劑。作為此種助劑,例如可列舉:三乙醇胺、甲基二乙醇胺、三異丙醇胺、正丁基胺、N-甲基二乙醇胺、甲基丙烯酸二乙基胺基乙酯、米其勒酮、4,4'-二乙基胺基苯酮、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸(正丁氧基)乙酯或4-二甲基胺基苯甲酸異戊酯等胺系化合物。 When a benzophenone-based compound or a thioxanthone-based compound is used as a photopolymerization initiator, an auxiliary agent may be used in combination in order to promote photopolymerization. Examples of such an auxiliary agent include triethanolamine, methyldiethanolamine, triisopropanolamine, n-butylamine, N-methyldiethanolamine, diethylaminoethyl methacrylate, and Michelin. Ketone, 4,4'-diethylaminobenzophenone, ethyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid (n-butoxy)ethyl ester or 4-dimethyl An amine compound such as isoamyl benzoate.

上述光聚合起始劑及助劑較佳為以不引起偏光性能之下降之範圍之添加量而使用,光聚合起始劑之添加量相對於聚合性樹脂組合物中之(甲基)丙烯酸酯化合物100重量份,較佳為0.1重量份以上且12重量份以下,更佳為2重量份以上且10重量份以下左右。又,助劑之添加量係相對於光聚合起始劑,較佳為0.5倍至2倍量左右。 The photopolymerization initiator and the auxiliary agent are preferably used in an amount which does not cause a decrease in the polarizing performance, and the photopolymerization initiator is added in an amount relative to the (meth) acrylate in the polymerizable resin composition. 100 parts by weight of the compound is preferably 0.1 part by weight or more and 12 parts by weight or less, more preferably 2 parts by weight or more and 10 parts by weight or less. Further, the amount of the auxiliary agent added is preferably about 0.5 to 2 times the amount relative to the photopolymerization initiator.

於本發明中使用之(甲基)丙烯酸酯化合物或(甲基)丙烯酸酯樹脂組合物為熱硬化型之情形時,使用聚合起始劑、交聯劑及/或起始觸媒。作為交聯劑,可使用:異氰酸酯系、硼系、鈦酸酯系等各種公知之化合物,只要為促進聚合者,則並無限定。交聯劑之添加量係於聚合性樹脂組合物100重量份中為0.1重量份以上且20重量份以下,較佳為於該組合物100重量份中為1重量份以上且10重量份以下左右。 When the (meth) acrylate compound or the (meth) acrylate resin composition used in the present invention is a thermosetting type, a polymerization initiator, a crosslinking agent and/or a starting catalyst are used. As the crosslinking agent, various known compounds such as an isocyanate type, a boron type, and a titanate type can be used, and it is not limited as long as it promotes polymerization. The amount of the crosslinking agent to be added is 0.1 part by weight or more and 20 parts by weight or less based on 100 parts by weight of the polymerizable resin composition, and preferably 1 part by weight or more and 10 parts by weight or less or less based on 100 parts by weight of the composition. .

於本發明中,使用之(甲基)丙烯酸酯化合物或聚合性樹脂組合物 為紫外線硬化型之情形與熱硬化型之情形相比,於硬化處理中,就對光之穩定性或硬化時間、製造成本之觀點而言,較為有用。 In the present invention, a (meth) acrylate compound or a polymerizable resin composition is used. In the case of the ultraviolet curing type, it is more useful in the hardening treatment from the viewpoint of light stability, hardening time, and manufacturing cost as compared with the case of the heat curing type.

聚合性樹脂組合物之層亦可以塗佈於基材層之方法設置。不僅可使用直接塗佈於基材之方法,亦可使用將預先塗佈於另一膜並硬化之層進行基材轉印、或積層之方法。 The layer of the polymerizable resin composition may also be provided by a method of applying to the substrate layer. It is possible to use not only a method of directly applying to a substrate but also a method of transferring a substrate or laminating a layer which is previously applied to another film and cured.

塗佈之方法並無特別限定,例如可列舉:藉由旋轉塗佈方式、線棒塗佈方式、凹版塗佈方式、微凹版塗佈方式、軋光塗佈方式、噴塗方式或液面彎曲式塗佈方式等之方法。 The method of coating is not particularly limited, and examples thereof include a spin coating method, a bar coating method, a gravure coating method, a micro gravure coating method, a calender coating method, a spray coating method, or a liquid surface bending method. Method of coating method, etc.

於本發明中,進而藉由使聚合性樹脂組合物相對於聚合性樹脂組合物100重量份含有具有分支型全氟烯基之氟化合物或其衍生物0.01重量份至1重量份,可獲得進而透明性較高、阻氣性較高、密接性較高、耐久性充分良好、且生產性優異之膜。具有分支型全氟烯基之氟化合物係式(1)所表示之氟化合物,亦包含該化合物之衍生物。其添加量係於硬化物100重量份中為0.05重量份以上且0.9重量份以下,更佳為於該組合物100重量份中為0.1重量份以上且0.8重量份以下左右。作為具有分支型全氟烯基之氟化合物或其衍生物之離子性,可列舉:陰離子性、陽離子性、非離子性、兩性之類型。作為該氟化合物或其衍生物,進而可列舉:低聚物型、具有反應性之低聚物型。就以少量添加顯示出效果,不會自樹脂硬化物層之析出,且不阻礙用以於之後蒸鍍或濺鍍含有矽及氮之層之再塗佈性之方面而言,較佳為非離子型,更佳為非離子型之低聚物,進而較佳為非離子型之反應性低聚物。 In the present invention, the polymerizable resin composition may further contain 0.01 parts by weight to 1 part by weight of a fluorine compound having a branched perfluoroalkenyl group or a derivative thereof, based on 100 parts by weight of the polymerizable resin composition. A film having high transparency, high gas barrier properties, high adhesion, sufficient durability, and excellent productivity. The fluorine compound having a branched perfluoroalkenyl group is a fluorine compound represented by the formula (1), and also includes a derivative of the compound. The amount thereof is 0.05 parts by weight or more and 0.9 parts by weight or less based on 100 parts by weight of the cured product, and more preferably 0.1 parts by weight or more and 0.8 parts by weight or less or less based on 100 parts by weight of the composition. Examples of the ionicity of the fluorine compound having a branched perfluoroalkenyl group or a derivative thereof include anionic, cationic, nonionic, and amphoteric types. Further, examples of the fluorine compound or a derivative thereof include an oligomer type and a reactive oligomer type. It shows that the effect is shown in a small amount, does not precipitate from the cured layer of the resin, and does not hinder the recoatability for depositing or sputtering a layer containing niobium and nitrogen afterwards, preferably non- The ionic type is more preferably a nonionic oligomer, and further preferably a nonionic reactive oligomer.

[化1] [Chemical 1]

作為含有具有式(1)之骨架之分支型全氟烯基之氟化合物或其衍生物,可例示:NEOS公司所有之FTERGENT系列。FTERGENT系列之中,較佳為710FL、710FM、710FS、730LM、601AD、602A、650A,尤佳為601A、602A、650A,可獲得進而透明性較高、阻氣性較高、密接性較高、耐久性亦充分良好、且生產性優異之膜。 The fluorine compound or a derivative thereof containing a branched perfluoroalkenyl group having a skeleton of the formula (1) may, for example, be a FTERGENT series owned by NEOS. Among the FTERGENT series, it is preferably 710FL, 710FM, 710FS, 730LM, 601AD, 602A, 650A, especially 601A, 602A, 650A, which can obtain higher transparency, higher gas barrier property and higher adhesion. A film which is sufficiently durable and excellent in productivity.

為了使聚合性樹脂硬化層更穩定,亦可添加抗劣化助劑。所謂抗劣化助劑,係指抗氧化劑、光穩定劑。作為抗氧化劑,例如可列舉:受阻酚系或半受阻酚系等酚系抗氧化劑、苯二胺系等胺系抗氧化劑、亞磷酸酯系或亞膦酸酯系等磷系抗氧化劑、硫醚系等硫系抗氧化劑等。作為光穩定劑,例如可列舉:二苯甲酮系或苯并三唑系、三系等紫外線吸收劑、有機鎳錯合物等激發能量吸收劑(Quencher)、碳黑或氧化鈦等紫外線遮蔽劑、具有作為基本骨架之2,2,6,6-四甲基哌啶骨架之受阻胺系光穩定劑(HALS)等。添加濃度並無特別限定,可根據抗劣化助劑之能力而任意添加。通常,相對於將溶劑去除之聚合性樹脂組合物,添加0.01重量%至5重量%,較佳為添加0.05重量%至3重量%。 In order to make the hardened layer of the polymerizable resin more stable, an anti-deterioration aid may be added. The anti-deterioration aid refers to an antioxidant and a light stabilizer. Examples of the antioxidant include a phenolic antioxidant such as a hindered phenol or a semi-hindered phenol, an amine antioxidant such as a phenylenediamine, a phosphorus antioxidant such as a phosphite or a phosphonite, and a thioether. It is a sulfur-based antioxidant or the like. Examples of the light stabilizer include a benzophenone type or a benzotriazole type, and three An ultraviolet absorber such as an ultraviolet absorber or an organic nickel complex such as an excitation energy absorber (Quencher), carbon black or titanium oxide, or a 2,2,6,6-tetramethylpiperidine skeleton as a basic skeleton. A hindered amine light stabilizer (HALS) or the like. The concentration to be added is not particularly limited, and may be arbitrarily added depending on the ability of the anti-deterioration aid. Usually, it is added in an amount of 0.01% by weight to 5% by weight, preferably 0.05% by weight to 3% by weight, based on the polymerizable resin composition from which the solvent is removed.

於形成聚合性樹脂硬化層之情形時,將聚合性樹脂組合物直接或使用適當之溶劑進行稀釋,塗佈於基材。其後,利用加熱等將溶劑去除,進行加熱、或照射紫外線,藉此,可獲得聚合性樹脂硬化物。作為於塗佈時所使用之該組合物之溶液之溶劑,只要為該組合物之溶 解性、塗佈時之於基板上之潤濕性優異而不引起表面性之下降者,則並無特別限制。作為此種溶劑,例如可列舉:水、甲苯、二甲苯等芳香族烴類,苯甲醚、二烷、四氫呋喃等醚類,甲基異丁基酮、甲基乙基酮、環己酮、環戊酮、2-戊酮、3-戊酮、2-己酮、3-己酮、2-庚酮、3-庚酮、4-庚酮或2,6-二甲基-4-庚酮等酮類,正丁醇、2-丁醇、環己醇或異丙醇等醇類,甲基溶纖素、乙酸甲基溶纖素等溶纖素類,乙酸乙酯、乙酸丁酯、乳酸甲酯、丙二醇單甲醚乙酸酯、丙二醇乙醚乙酸酯、乙酸甲氧基乙酯或乙酸乙氧基乙酯等酯類,二甲基亞碸、乙腈、N,N-二甲基乙醯甲醯胺,但並不限定於該等。其中,較佳為甲苯、環戊酮或乙酸乙酯。又,溶劑可為單一亦可為混合物。將該組合物溶解時之該組合物之濃度係根據溶劑溶解性、於基板上之潤濕性、塗佈後之厚度等而有所不同,較佳為5~95重量%,更佳為10~80重量%左右。 In the case of forming a polymerizable resin cured layer, the polymerizable resin composition is diluted directly or by using a suitable solvent to be applied to a substrate. Thereafter, the solvent is removed by heating or the like, heated or irradiated with ultraviolet rays, whereby a polymerizable resin cured product can be obtained. The solvent of the solution of the composition used at the time of coating is not particularly limited as long as it is excellent in solubility of the composition and wettability on the substrate at the time of coating without causing a decrease in surface properties. limit. Examples of such a solvent include aromatic hydrocarbons such as water, toluene, and xylene, and anisole and Ethers such as alkane and tetrahydrofuran, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-pentanone, 3-pentanone, 2-hexanone, 3-hexanone, 2- Ketones such as heptanone, 3-heptanone, 4-heptanone or 2,6-dimethyl-4-heptanone, alcohols such as n-butanol, 2-butanol, cyclohexanol or isopropanol, Cellulose, cellosolve such as methyl cellosolve, ethyl acetate, butyl acetate, methyl lactate, propylene glycol monomethyl ether acetate, propylene glycol diethyl ether acetate, methoxyethyl acetate or An ester such as ethoxyethyl acetate, dimethyl hydrazine, acetonitrile or N,N-dimethylacetamidine, but is not limited thereto. Among them, toluene, cyclopentanone or ethyl acetate is preferred. Further, the solvent may be either a single or a mixture. The concentration of the composition when the composition is dissolved is different depending on solvent solubility, wettability on a substrate, thickness after coating, etc., preferably 5 to 95% by weight, more preferably 10 ~80% by weight or so.

又,於塗佈於基板上時,於該基板上之潤濕性缺乏之情形、或所塗佈之聚合性樹脂組合物之層之表面性較差之情形時,為了改善該等,亦可於該組合物中添加各種調平劑。作為調平劑,可使用:矽系、氟系、聚醚系、丙烯酸共聚物系或鈦酸酯系等各種化合物。其添加量係於聚合性樹脂組合物100重量份中為0.0001重量份以上且10重量份以下,較佳為於該組合物100重量份中為0.1重量份以上且5重量份以下左右。 Moreover, when it is applied to a substrate, when the wettability on the substrate is insufficient or the surface property of the layer of the polymerizable resin composition to be applied is poor, in order to improve the Various leveling agents are added to the composition. As the leveling agent, various compounds such as an anthraquinone type, a fluorine type, a polyether type, an acrylic copolymer type, or a titanate type can be used. The amount thereof is 0.0001 part by weight or more and 10 parts by weight or less based on 100 parts by weight of the polymerizable resin composition, and preferably 0.1 part by weight or more and 5 parts by weight or less or less based on 100 parts by weight of the composition.

於使塗佈於基板上之該組合物層硬化後,所硬化之層與保護膜之密接性較差之情形時,為了改善該等,亦可於該組合物中添加各種交聯劑。作為交聯劑,可使用:異氰酸酯系、硼系、鈦酸酯系或矽系等各種化合物。其添加量係於聚合性樹脂組合物100重量份中為0.0001重量份以上且20重量份以下,更佳為於該組合物100重量份中為0.1重量份以上且10重量份以下左右。 When the composition layer applied to the substrate is cured and the adhesion between the cured layer and the protective film is inferior, various crosslinking agents may be added to the composition in order to improve the properties. As the crosslinking agent, various compounds such as an isocyanate system, a boron system, a titanate system or a ruthenium system can be used. The amount of the polymerizable resin composition is 0.0001 part by weight or more and 20 parts by weight or less, more preferably 0.1 part by weight or more and 10 parts by weight or less per 100 parts by weight of the composition.

本發明之膜之聚合性樹脂硬化層較佳為藉由加熱或紫外線照射而充分聚合,使未反應分儘量少。硬化後之樹脂硬化物100重量份中之未反應之(甲基)丙烯酸酯化合物為0重量份以上且5重量份以下,更佳為0重量份以上且3重量份以下,進而較佳為0重量份以上且1重量份以下。作為獲得此種層之方法,例如可列舉:使塗佈後之樹脂組合物之層之厚度最佳化之方法;使添加之光聚合起始劑之種類或量最佳化之方法;充分之加熱或照射紫外線之方法;改變於氮氣等惰性氣體中進行等之紫外線照射時之環境而使其硬化之方法等。其中,使樹脂組合物之層之厚度最佳化之方法可僅改變樹脂濃度、或改變樹脂塗佈量而最佳化,因此最簡易。使聚合性樹脂組合物硬化所獲得之樹脂硬化物層之厚度為0.1μm至20μm,更佳為0.5μm至18μm,進而較佳為2μm至16μm。若該層之厚度厚於20μm,則殘留未反應單體增加,耐久性不充分,且於乾燥耐久性試驗中有使偏光板變紅之可能性,故而不合適。於厚度薄於0.1μm之層中,反而幾乎無法獲得耐光性提高。紫外線之照射量係根據(甲基)丙烯酸酯化合物之種類、光聚合起始劑之種類與添加量、膜厚而有所不同,例如較佳為100~2000mJ/cm2左右。 The polymerizable resin hardened layer of the film of the present invention is preferably sufficiently polymerized by heating or ultraviolet irradiation to minimize the amount of unreacted components. The unreacted (meth) acrylate compound in 100 parts by weight of the hardened resin after curing is 0 parts by weight or more and 5 parts by weight or less, more preferably 0 parts by weight or more and 3 parts by weight or less, and further preferably 0% by weight. It is more than 1 part by weight and 1 part by weight or less. Examples of the method for obtaining such a layer include a method of optimizing the thickness of the layer of the resin composition after coating, and a method of optimizing the type or amount of the added photopolymerization initiator; A method of heating or irradiating ultraviolet rays; a method of curing the environment by ultraviolet irradiation or the like in an inert gas such as nitrogen gas. Among them, the method of optimizing the thickness of the layer of the resin composition can be optimized by merely changing the resin concentration or changing the amount of resin coating, which is the easiest. The thickness of the cured resin layer obtained by curing the polymerizable resin composition is from 0.1 μm to 20 μm, more preferably from 0.5 μm to 18 μm, still more preferably from 2 μm to 16 μm. When the thickness of the layer is thicker than 20 μm, the amount of residual unreacted monomers increases, the durability is insufficient, and there is a possibility that the polarizing plate becomes red in the drying durability test, which is not preferable. In the layer having a thickness of less than 0.1 μm, the improvement in light resistance is hardly obtained. The amount of the ultraviolet ray to be irradiated varies depending on the type of the (meth) acrylate compound, the type and amount of the photopolymerization initiator, and the film thickness, and is preferably, for example, about 100 to 2,000 mJ/cm 2 .

於本發明中,進而必須將具有50nm至500nm之厚度之包含矽與氮之層設置於樹脂硬化物層。包含矽與氮之層之厚度只要為50nm至500nm,則可達成本發明之膜,較佳為70nm至300nm,進而較佳為90nm至210nm。包含矽與氮之層可以公知之方法形成。作為形成包含矽與氮之層之方法,例如可例示:蒸鍍法、濺鍍法、離子鍍覆法等物理氣相成長法(以下,稱為「PVD」)、化學氣相成長法(以下,稱為「CVD」)等。形成包含矽與氮之層之最佳之方法係離子束輔助蒸鍍法、磁控濺鍍法。作為離子束輔助蒸鍍法,可列舉:於日本專利特開平10-140326號中形成氮化鐵之方法或非專利文獻1、非專利文獻2等 所揭示之技術,作為磁控濺鍍法,可列舉:於非專利文獻3中揭示之方法。若將該PVD或CVD應用於由(甲基)丙烯酸酯化合物形成之樹脂硬化物層,則通常表面白濁,或產生霧度而使透明度下降,或密接性下降,或於高溫高濕試驗後密接性下降,但只要為由本發明之聚合性樹脂組合物形成之樹脂硬化物層,則可獲得透明性較高、阻氣性較高、密接性較高、耐久性亦充分良好、且生產性優異之膜。藉由離子束輔助蒸鍍法所獲得之本發明之膜之透明度非常高、且水蒸氣等之氣體透過率非常低。進而,若使用離子束輔助蒸鍍法,則即便較高亦僅施加50℃左右之熱,可以低溫進行處理,故而成為基材之膜不劣化,而不引起處理應用後之尺寸變化等,因此於包含矽及氮之層不產生龜裂等。另一方面,藉由磁控濺鍍法所獲得之本發明之膜之透明度非常高、密接性非常高、且即便進行彎曲試驗亦不引起表面之裂紋等之非常良好之膜。 In the present invention, it is further necessary to provide a layer containing ruthenium and nitrogen having a thickness of 50 nm to 500 nm in the resin cured layer. The thickness of the layer containing cerium and nitrogen may be from 50 nm to 500 nm, and may be from the film of the invention, preferably from 70 nm to 300 nm, and more preferably from 90 nm to 210 nm. A layer containing cerium and nitrogen can be formed by a known method. As a method of forming a layer containing cerium and nitrogen, for example, a physical vapor phase growth method (hereinafter referred to as "PVD") such as a vapor deposition method, a sputtering method, or an ion plating method, or a chemical vapor phase growth method (hereinafter, , called "CVD"). The best method for forming a layer comprising germanium and nitrogen is ion beam assisted vapor deposition and magnetron sputtering. The ion beam-assisted vapor deposition method is a method of forming iron nitride in Japanese Patent Laid-Open No. Hei 10-140326, Non-Patent Document 1, Non-Patent Document 2, and the like. The disclosed technology is a method disclosed in Non-Patent Document 3 as a magnetron sputtering method. When the PVD or CVD is applied to a cured layer of a resin formed of a (meth) acrylate compound, the surface is usually cloudy, or haze is generated to lower the transparency, or the adhesion is lowered, or after the high temperature and high humidity test. The resin cured layer formed of the polymerizable resin composition of the present invention has high transparency, high gas barrier properties, high adhesion, sufficient durability, and excellent productivity. The film. The film of the present invention obtained by the ion beam assisted vapor deposition method has a very high transparency and a very low gas permeability such as water vapor. Further, when the ion beam assisted vapor deposition method is used, even if it is high, only about 50 ° C of heat is applied, and the treatment can be performed at a low temperature. Therefore, the film of the substrate does not deteriorate, and the dimensional change after the application is not caused. No cracks are formed in the layer containing niobium and nitrogen. On the other hand, the film of the present invention obtained by the magnetron sputtering method has a very high transparency, a very high adhesion, and does not cause a very good film such as cracking of the surface even if a bending test is performed.

作為透明之包含氮與矽之層,可例示:矽氮化物(Si3N4)、含有氧之氮化矽(SiOxNy,x與y為任意之整數)之層。尤其是設置矽氮化物之層之本發明之膜具有良好之較高之阻氣性。若於包含矽與氮之層中,進而含有鋁作為元素,則可獲得柔軟性更高之包含氮與矽之本發明之膜。氮化矽(SiOxNy)中之氧之含量可藉由於非專利文獻5、非專利文獻6中所記載之方法等而測定。 Examples of the transparent layer containing nitrogen and cerium include a layer of cerium nitride (Si 3 N 4 ) and cerium nitride containing oxygen (SiO x N y , x and y are arbitrary integers). In particular, the film of the invention provided with a layer of tantalum nitride has a good high gas barrier property. When the layer containing bismuth and nitrogen further contains aluminum as an element, a film of the present invention containing nitrogen and hydrazine having higher flexibility can be obtained. The content of oxygen in the cerium nitride (SiO x N y ) can be measured by the methods described in Non-Patent Document 5 and Non-Patent Document 6.

藉由以上之方法,可獲得一種膜,其特徵在於:具備:基材;樹脂硬化物層,其係由包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物作為構成之化合物之聚合性樹脂組合物形成,且具有0.1μm至20μm之厚度;及包含矽與氮之層,其具有50nm至500nm之厚度;並且該(甲基)丙烯酸酯化合物之含量相對於該聚合性樹脂組合物100重量份為40重量份至99重量份,透過率為75%以上。 According to the above method, a film comprising: a substrate; a resin cured layer comprising at least one skeleton having a trimethylolpropane skeleton or an iso-cyanuric acid skeleton (methyl group) is provided. An acrylate compound formed as a polymerizable resin composition of a constituent compound and having a thickness of 0.1 μm to 20 μm; and a layer containing cerium and nitrogen having a thickness of 50 nm to 500 nm; and the (meth) acrylate compound The content is 40% by weight to 99 parts by weight based on 100 parts by weight of the polymerizable resin composition, and the transmittance is 75% or more.

關於本發明之膜,亦可於其單面或兩面,經由接著劑等而設置透明保護層。亦可藉由設置透明保護層,而使形狀穩定、或降低劃傷等外觀損傷。作為形成透明保護層之透明聚合物或膜,較佳為機械強度較高、熱穩定性良好之透明聚合物或膜。 The film of the present invention may be provided with a transparent protective layer on one or both sides via an adhesive or the like. It is also possible to stabilize the shape or reduce the appearance damage such as scratches by providing a transparent protective layer. As the transparent polymer or film forming the transparent protective layer, a transparent polymer or film having high mechanical strength and good thermal stability is preferred.

如此所獲得之本發明之膜可用作要求阻隔水蒸氣等氣體之密封膜。該透明密封膜可有用地用於光電轉換元件、OLED元件。尤其是於用於OLED之情形時,可為了不妨礙來自元件之發光而不降低發光效率,獲得可靠性較高之OLED。又,於作為光電轉換用阻隔膜而用於光電轉換元件之情形時,透明性較高、阻隔性亦較高,故而長期作為光電轉換用阻隔膜而穩定地發揮功能,故而可獲得不降低太陽光之受光而功能之太陽電池。 The film of the present invention thus obtained can be used as a sealing film which is required to block a gas such as water vapor. The transparent sealing film can be usefully used for a photoelectric conversion element, an OLED element. Especially in the case of an OLED, an OLED having higher reliability can be obtained in order not to hinder the light emission from the element without lowering the luminous efficiency. In addition, when it is used as a photoelectric conversion element as a photoelectric conversion resistive film, since it has high transparency and high barrier property, it functions stably as a photoelectric conversion barrier film for a long period of time, so that it is possible to obtain no reduction in the sun. A solar cell that functions as a light.

[實施例] [Examples]

以下,藉由實施例而進而詳細地說明本發明,但本發明並不受該等限定。再者,實施例中所表示之膜之評價係以如下之方式進行。 Hereinafter, the present invention will be described in detail by way of examples, but the invention is not limited thereto. Further, the evaluation of the film shown in the examples was carried out in the following manner.

(全光線透過率) (total light transmittance)

使用Hitachi High-Technologies(股)公司製造之U-4100進行測定。 The measurement was carried out using U-4100 manufactured by Hitachi High-Technologies Co., Ltd.

(膜之白濁之有無) (The presence or absence of white turbidity of the film)

藉由目視而確認白濁之有無。 The presence or absence of white turbidity was confirmed by visual observation.

(密接性) (adhesiveness)

於本發明之膜之聚合性樹脂硬化物之層、與包含矽與氮之層,利用切割器以1mm間隔製作100個方格,使Cellotape(註冊商標)緊緊密接後,於90度方向上逕自剝離,根據下述基準,實施評價。 In the layer of the polymerizable resin cured product of the film of the present invention and the layer containing niobium and nitrogen, 100 squares are formed at intervals of 1 mm by a cutter, and Cellotape (registered trademark) is tightly bonded, and is oriented in the direction of 90 degrees. The diameter was self-peeled, and evaluation was performed based on the following criteria.

良:100/100密接良好 Good: 100/100 is well connected

差:產生剝離 Poor: Peeling

(恆溫恆濕試驗後之密接性) (Adhesion after constant temperature and humidity test)

將本發明之膜於溫度60℃、相對濕度90%之環境下暴露48小時, 於聚合性樹脂硬化物之層、與包含矽與氮之層,利用切割器以1mm間隔製作100個方格,使Cellotape(註冊商標)緊緊密接後,於90度方向上逕自剝離,根據下述之基準,實施評價。 The film of the present invention is exposed to an environment having a temperature of 60 ° C and a relative humidity of 90% for 48 hours. In the layer of the cured polymer resin and the layer containing ruthenium and nitrogen, 100 squares are formed at intervals of 1 mm by a cutter, and Cellotape (registered trademark) is tightly bonded, and then peeled off in a 90-degree direction. The benchmark is described and the evaluation is carried out.

良:100/100密接良好 Good: 100/100 is well connected

差:產生剝離 Poor: Peeling

(阻氣性之測定) (Measurement of gas barrier properties)

阻氣性之測定係使用MOCON公司製造之AQUATRAN(註冊商標),於溫度40℃、相對濕度90%RH下藉由水蒸氣透過率測定而進行。 The gas barrier property was measured by a water vapor transmission rate at a temperature of 40 ° C and a relative humidity of 90% RH using AQUATRAN (registered trademark) manufactured by MOCON Corporation.

[實施例1] [Example 1]

於500cc燒瓶中,將三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份、2-甲基-1-[4-(甲硫基)苯基]-2-(4-嗎啉基)-1-丙酮(商品名:Irgacure-907,BASF製造)2份、1-羥基環己基苯基酮(商品名:Irgacure-184,BASF製造)5份、及甲苯100份於室溫下混合溶解,製作包含至少1種固形物成分50%之包含三羥甲基丙烷骨架之(甲基)丙烯酸酯化合物之組合物。將所獲得之樹脂組合物利用棒式塗佈機塗佈於200μm之聚萘二甲酸乙二酯膜(Teijin DuPont Films公司製造之商品名:Teonex Q65FA 200μm)上,於80℃乾燥機中乾燥2分鐘後,藉由設置有120W高壓水銀燈之紫外線照射裝置,一面進行氮氣沖洗一面於累積光量400mJ/cm2下使其硬化,獲得膜厚8μm之具有樹脂硬化物層之膜。於所獲得之樹脂硬化物層之面,利用離子束輔助蒸鍍裝置(昭和真空公司製造之SGC-26SA-IAD)以矽作為靶原子,於射柱電壓500V、射束電流800mA、AVcc值800V、以氮氣作為來源氣體且流量70sccm之條件下,設置150nm之厚度之氮化矽之層,獲得透明阻隔膜。 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) in a 500 cc flask, 2-methyl-1-[4-(methylthio)phenyl]-2-(4-? 2 parts of morphyl)-1-propanone (trade name: Irgacure-907, manufactured by BASF), 1 part of 1-hydroxycyclohexyl phenyl ketone (trade name: Irgacure-184, manufactured by BASF), and 100 parts of toluene at room temperature The mixture was dissolved by mixing to prepare a composition comprising a (meth) acrylate compound containing at least one solid content of 50% of a trimethylolpropane skeleton. The obtained resin composition was applied onto a 200 μm polyethylene naphthalate film (trade name: Teonex Q65FA 200 μm manufactured by Teijin DuPont Films Co., Ltd.) using a bar coater, and dried in a dryer at 80 ° C. 2 After that, the film was cured by a nitrogen irradiation apparatus equipped with a 120 W high-pressure mercury lamp while being purged with nitrogen at a cumulative light amount of 400 mJ/cm 2 to obtain a film having a resin cured layer having a thickness of 8 μm. On the surface of the obtained resin cured layer, an ion beam assisted vapor deposition apparatus (SGC-26SA-IAD manufactured by Showa Vacuum Co., Ltd.) was used as a target atom at a column voltage of 500 V, a beam current of 800 mA, and an AVcc value of 800 V. Under the condition that nitrogen gas was used as the source gas and the flow rate was 70 sccm, a layer of tantalum nitride having a thickness of 150 nm was provided to obtain a transparent barrier film.

[實施例2] [Embodiment 2]

使用PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)93重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 93 parts by weight of PO-modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330) was used instead of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) 93 weight used in Example 1. A transparent barrier film was obtained in the same manner as in Example 1 except for the portions.

[實施例3] [Example 3]

使用異氰尿酸三(丙烯醯氧基乙基)酯(商品名:日立化成公司製造之FA-731A)93重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 93 parts by weight of tris(propylene methoxyethyl) isocyanurate (trade name: FA-731A manufactured by Hitachi Chemical Co., Ltd.) was used instead of trimethylolpropane triacrylate (trade name) used in Example 1. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of KAYARAD TMPTA) was used.

[實施例4] [Example 4]

使用三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)62重量份及雙環戊基二丙烯酸酯(商品名:KAYARAD R-684)31重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 Instead of the trishydroxyl group used in Example 1, 62 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) and 31 parts by weight of dicyclopentyl diacrylate (trade name: KAYARAD R-684) were used. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of a propane triacrylate (trade name: KAYARAD TMPTA) was used.

[實施例5] [Example 5]

使用PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)62重量份及雙環戊基二丙烯酸酯(商品名:KAYARAD R-684)31重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 62 parts by weight of PO-modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330) and 31 parts by weight of dicyclopentyl diacrylate (trade name: KAYARAD R-684) were used instead of the example 1. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) was used.

[實施例6] [Embodiment 6]

將氮化矽之層設為70nm,除此以外,以與實施例5相同之方式,獲得透明阻隔膜。 A transparent barrier film was obtained in the same manner as in Example 5 except that the layer of tantalum nitride was changed to 70 nm.

[實施例7] [Embodiment 7]

將氮化矽之層設為350nm,除此以外,以與實施例5相同之方 式,獲得透明阻隔膜。 The same layer as in Example 5 was used except that the layer of tantalum nitride was set to 350 nm. A transparent barrier film is obtained.

[實施例8] [Embodiment 8]

使用三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)62重量份、雙環戊基二丙烯酸酯(商品名:KAYARAD R-684)30.5重量份、及具有式(1)之骨架之具有分支型全氟烯基之氟化合物(商品名:NEOS公司製造之FTERGENT 602A)0.5重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 62 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA), 30.5 parts by weight of dicyclopentyl diacrylate (trade name: KAYARAD R-684), and a branch having a skeleton of the formula (1) 0.5 parts by weight of a perfluoroalkenyl fluoride compound (trade name: FTERGENT 602A manufactured by NEOS Co., Ltd.), in place of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, Except for this, a transparent barrier film was obtained in the same manner as in Example 1.

[實施例9] [Embodiment 9]

使用PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)62重量份、雙環戊基二丙烯酸酯(商品名:KAYARAD R-684)30.5重量份、及具有式(1)之骨架之具有分支型全氟烯基之氟化合物(商品名:NEOS公司製造之FTERGENT 602A)0.5重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 62 parts by weight of PO-modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330), 30.5 parts by weight of dicyclopentyl diacrylate (trade name: KAYARAD R-684), and having the formula (1) 0.5 parts by weight of a branched perfluoroalkenyl fluoride compound (trade name: FTERGENT 602A manufactured by NEOS Co., Ltd.) in place of trimethylolpropane triacrylate used in Example 1 (trade name: KAYARAD TMPTA) A transparent barrier film was obtained in the same manner as in Example 1 except for 93 parts by weight.

[實施例10] [Embodiment 10]

於實施例9中所獲得之樹脂硬化物層之面,利用高頻磁控濺鍍裝置(昭和真空公司製造之MPS-2000-HC3),設為真空度1×10-6Pa,將靶原子設為矽、鋁之二維同時濺鍍環,頻率設為13.56MHz,基盤溫度設為常溫,將氣壓0.1~0.2Pa之反應氣體設為氮氣,設置含有鋁之氮化矽之層150nm,獲得透明阻隔膜。 The surface of the cured resin layer obtained in Example 9 was subjected to a high-frequency magnetron sputtering apparatus (MPS-2000-HC3 manufactured by Showa Vacuum Co., Ltd.) to have a degree of vacuum of 1 × 10 -6 Pa, and the target atom was used. It is set as a two-dimensional simultaneous sputtering ring of tantalum and aluminum, the frequency is set to 13.56 MHz, the base temperature is set to normal temperature, the reaction gas of pressure 0.1 to 0.2 Pa is set to nitrogen, and the layer containing aluminum tantalum nitride is set to 150 nm. Transparent barrier film.

[實施例11] [Example 11]

於實施例9中所獲得之樹脂硬化物層之面,利用離子束輔助蒸鍍裝置(昭和真空公司製造之SGC-26SA-IAD),以矽作為靶原子,於射柱電壓300V、射束電流800mA、AVcc值1000V、以氮氣作為來源氣體且流量70sccm之條件下,設置氮化矽之層150nm,獲得透明阻隔 膜。 The surface of the cured resin layer obtained in Example 9 was subjected to an ion beam assisted vapor deposition apparatus (SGC-26SA-IAD manufactured by Showa Vacuum Co., Ltd.) using ruthenium as a target atom at a column voltage of 300 V and a beam current. 800 mA, AVcc value of 1000 V, with nitrogen as the source gas and a flow rate of 70 sccm, the layer of tantalum nitride was set to 150 nm to obtain a transparent barrier. membrane.

[實施例12] [Embodiment 12]

使用PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)58重量份及三環癸烷二羥甲基二丙烯酸酯(商品名:東亞合成公司製造之Aronix M-203s)35重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,將樹脂組合物利用棒式塗佈機塗佈於100μm之環烯烴膜(JSR公司製造之商品名:ARTON)上,於80℃乾燥機中乾燥2分鐘後,藉由設置有120W高壓水銀燈之紫外線照射裝置,一面進行氮氣沖洗一面利用累積光量400mJ/cm2使其硬化,獲得膜厚8μm之具有樹脂硬化物層之膜,除此以外,以實施例1相同之方式,獲得阻隔膜。 58 parts by weight of PO-modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330) and tricyclodecane dimethylol diacrylate (trade name: Aronix M-203s manufactured by Toagosei Co., Ltd.) 35 parts by weight, instead of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, the resin composition was applied to a 100 μm cycloolefin film by a bar coater ( The product name: ARTON manufactured by JSR Co., Ltd. was dried in a dryer at 80 ° C for 2 minutes, and then hardened by a nitrogen irradiation apparatus equipped with a 120 W high-pressure mercury lamp, and the amount of accumulated light was 400 mJ/cm 2 . A barrier film was obtained in the same manner as in Example 1 except that a film having a resin cured layer having a film thickness of 8 μm was obtained.

[實施例13] [Example 13]

將樹脂硬化物層之膜厚設為16μm,且於不具有樹脂硬化物層之聚萘二甲酸乙二酯膜之另一面亦設置氮化矽之層150nm,除此以外,以與實施例4相同之方式,獲得阻隔膜。 The film thickness of the cured resin layer was set to 16 μm, and the layer of tantalum nitride was also provided on the other side of the polyethylene naphthalate film having no resin cured layer, and 150 nm was formed. In the same way, a barrier film is obtained.

[實施例14] [Embodiment 14]

將樹脂硬化物層之膜厚設為16μm,且於不具有樹脂硬化物層之聚萘二甲酸乙二酯膜之另一面亦設置150nm之氮化矽之層,除此以外,以與實施例9相同之方式,獲得阻隔膜。 The film thickness of the cured resin layer was set to 16 μm, and a layer of tantalum nitride of 150 nm was also provided on the other side of the polyethylene naphthalate film having no resin cured layer, and the examples were In the same manner, a barrier film is obtained.

[實施例15] [Example 15]

於不具有樹脂硬化物層之環烯烴膜之另一面亦設置150nm之氮化矽之層,除此以外,以與實施例12相同之方式,獲得阻隔膜。 A barrier film was obtained in the same manner as in Example 12 except that a layer of tantalum nitride of 150 nm was provided on the other surface of the cycloolefin film having no resin cured layer.

[比較例1] [Comparative Example 1]

不設置樹脂硬化物層,而於150nm之聚萘二甲酸乙二酯膜設置氮化矽之層,除此以外,以與實施例1相同之方式,獲得透明膜。 A transparent film was obtained in the same manner as in Example 1 except that the resin cured layer was not provided, and a layer of tantalum nitride was provided on the polyethylene naphthalate film of 150 nm.

[比較例2] [Comparative Example 2]

使用二季戊四醇六丙烯酸酯(商品名:KAYARAD DPHA)93重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 93 parts by weight of dipentaerythritol hexaacrylate (trade name: KAYARAD DPHA) was used instead of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, except In the same manner as in Example 1, a transparent barrier film was obtained.

[比較例3] [Comparative Example 3]

使用四官能之四丙烯酸酯(商品名:KAYARAD R-9591)93重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 93 parts by weight of a tetrafunctional tetraacrylate (trade name: KAYARAD R-9591) was used instead of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, except A transparent barrier film was obtained in the same manner as in Example 1.

[比較例4] [Comparative Example 4]

使用二季戊四醇六丙烯酸酯(商品名:KAYARAD DPHA)62重量份及雙環戊基二丙烯酸酯(商品名:KAYARAD R-684)31重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 62 parts by weight of dipentaerythritol hexaacrylate (trade name: KAYARAD DPHA) and 31 parts by weight of dicyclopentyl diacrylate (trade name: KAYARAD R-684) were used instead of trimethylolpropane three used in Example 1. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of acrylate (trade name: KAYARAD TMPTA) was used.

[比較例5] [Comparative Example 5]

使用雙酚A二縮水甘油醚與丙烯酸之反應產物(商品名:KAYARAD R-115)52重量份及己二醇二丙烯酸酯(商品名:Toyo Chemicals公司製造之Miramer M200)41重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of a reaction product of bisphenol A diglycidyl ether and acrylic acid (trade name: KAYARAD R-115) and 41 parts by weight of hexanediol diacrylate (trade name: Miramer M200 manufactured by Toyo Chemicals Co., Ltd.) were used instead of A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1 was used.

[比較例6] [Comparative Example 6]

使用雙酚A二縮水甘油醚與丙烯酸之反應產物(商品名:KAYARAD R-115)62重量份及含聯苯基之丙烯酸酯(商品名:KAYARAD OPP-1)31重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與 實施例1相同之方式,獲得透明阻隔膜。 In place of Example 1, 62 parts by weight of a reaction product of bisphenol A diglycidyl ether and acrylic acid (trade name: KAYARAD R-115) and 31 parts by weight of a biphenyl group-containing acrylate (trade name: KAYARAD OPP-1) were used. 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in the above, in addition to In the same manner as in Example 1, a transparent barrier film was obtained.

[比較例7] [Comparative Example 7]

使用雙酚A改性丙烯酸酯(商品名:日立化成公司製造之FA-320A)52重量份及含聯苯基之丙烯酸酯(商品名:KAYARAD FRM-1000)41重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of bisphenol A modified acrylate (trade name: FA-320A manufactured by Hitachi Chemical Co., Ltd.) and 41 parts by weight of biphenyl group-containing acrylate (trade name: KAYARAD FRM-1000) were used instead of Example 1. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) was used.

[比較例8] [Comparative Example 8]

使用雙酚A改性丙烯酸酯(商品名:日立化成公司製造之FA-320A)52重量份及含磷酸聯苯基之丙烯酸酯(商品名:KAYARAD R-9663H)41重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of bisphenol A modified acrylate (trade name: FA-320A manufactured by Hitachi Chemical Co., Ltd.) and 41 parts by weight of phenyl phosphate-containing acrylate (trade name: KAYARAD R-9663H) were used instead of Example 1. A transparent barrier film was obtained in the same manner as in Example 1 except that 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in the above was used.

[比較例9] [Comparative Example 9]

使用雙酚A改性丙烯酸酯(商品名:日立化成公司製造之FA-320A)52重量份、含聯苯基之丙烯酸酯(商品名:KAYARAD FRM-1000)40.5重量份、及丙烯酸系調平劑(商品名:BYK-Chemie公司製造之BYK-361N)0.5重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of bisphenol A-modified acrylate (trade name: FA-320A manufactured by Hitachi Chemical Co., Ltd.), biphenyl-containing acrylate (trade name: KAYARAD FRM-1000) 40.5 parts by weight, and acrylic leveling 0.5 parts by weight of the agent (trade name: BYK-361N manufactured by BYK-Chemie Co., Ltd.), in place of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, except In the same manner as in Example 1, a transparent barrier film was obtained.

[比較例10] [Comparative Example 10]

使用雙酚A改性丙烯酸酯(商品名:日立化成公司製造之FA-320A)52重量份、含聯苯基之丙烯酸酯(商品名:KAYARAD FRM-1000)40.5重量份、及3-巰基丙基三甲氧基矽烷(商品名:信越化學公司製造之KBM-803)0.5重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以 與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of bisphenol A-modified acrylate (trade name: FA-320A manufactured by Hitachi Chemical Co., Ltd.), biphenyl-containing acrylate (trade name: KAYARAD FRM-1000) 40.5 parts by weight, and 3-mercaptopropyl acrylate 0.5 parts by weight of benzyl trimethoxy decane (trade name: KBM-803, manufactured by Shin-Etsu Chemical Co., Ltd.), in place of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, except Beyond this, In the same manner as in Example 1, a transparent barrier film was obtained.

[比較例11] [Comparative Example 11]

使用雙酚A改性丙烯酸酯(商品名:日立化成公司製造之FA-320A)52重量份、含聯苯基之丙烯酸酯(商品名:KAYARAD FRM-1000)40.5重量份、及丙烯酸聚合物系調平劑(商品名:共榮社化學公司製造之Polyflow No.75)0.5重量份,代替實施例1中所使用之三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TMPTA)93重量份,除此以外,以與實施例1相同之方式,獲得透明阻隔膜。 52 parts by weight of bisphenol A-modified acrylate (trade name: FA-320A manufactured by Hitachi Chemical Co., Ltd.), biphenyl-containing acrylate (trade name: KAYARAD FRM-1000) 40.5 parts by weight, and acrylic polymer system 0.5 parts by weight of a leveling agent (trade name: Polyflow No. 75 manufactured by Kyoeisha Chemical Co., Ltd.), instead of 93 parts by weight of trimethylolpropane triacrylate (trade name: KAYARAD TMPTA) used in Example 1, Except for this, a transparent barrier film was obtained in the same manner as in Example 1.

[比較例12] [Comparative Example 12]

使用二季戊四醇六丙烯酸酯(商品名:KAYARAD DPHA)58重量份及三環癸烷二羥甲基二丙烯酸酯(商品名:東亞合成公司製造之Aronix M-203s)35重量份之組合物,代替實施例12中所使用之PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)58重量份及三環癸烷二羥甲基二丙烯酸酯(商品名:東亞合成公司製造之Aronix M-203s)35重量份之組合物,除此以外,以與實施例12相同之方式,獲得透明阻隔膜。 58 parts by weight of dipentaerythritol hexaacrylate (trade name: KAYARAD DPHA) and 35 parts by weight of tricyclodecane dimethylol diacrylate (trade name: Aronix M-203s manufactured by Toagosei Co., Ltd.) were used instead. 58 parts by weight of PO-modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330) used in Example 12 and tricyclodecane dimethylol diacrylate (trade name: manufactured by Toagosei Co., Ltd.) A transparent barrier film was obtained in the same manner as in Example 12 except for the composition of 35 parts by weight of Aronix M-203s.

[比較例13] [Comparative Example 13]

使用雙酚A二縮水甘油醚與丙烯酸之反應產物(商品名:KAYARAD R-115)58重量份及三環癸烷二羥甲基二丙烯酸酯(商品名:東亞合成公司製造之Aronix M-203s)35重量份之組合物,代替實施例12中所使用之PO改性三羥甲基丙烷三丙烯酸酯(商品名:KAYARAD TPA-330)58重量份及三環癸烷二羥甲基二丙烯酸酯(商品名:東亞合成公司製造之Aronix M-203s)35重量份之組合物,除此以外,以與實施例12相同之方式,獲得透明阻隔膜。 58 parts by weight of a reaction product of bisphenol A diglycidyl ether and acrylic acid (trade name: KAYARAD R-115) and tricyclodecane dimethylol diacrylate (trade name: Aronix M-203s manufactured by Toagosei Co., Ltd.) 35 parts by weight of the composition, instead of the PO modified trimethylolpropane triacrylate (trade name: KAYARAD TPA-330) used in Example 12, 58 parts by weight and tricyclodecane dimethylol diacrylate A transparent barrier film was obtained in the same manner as in Example 12 except that the ester (trade name: Aronix M-203s manufactured by Toagosei Co., Ltd.) was used in an amount of 35 parts by weight.

[比較例14] [Comparative Example 14]

於不具有樹脂硬化物層之聚萘二甲酸乙二酯膜之另一面亦設置 氮化矽之層150nm,除此以外,以與比較例5相同之方式,獲得透明阻隔膜。 The other side of the polyethylene naphthalate film which does not have a resin cured layer is also provided A transparent barrier film was obtained in the same manner as in Comparative Example 5 except that the layer of tantalum nitride was 150 nm.

[比較例15] [Comparative Example 15]

於不具有樹脂硬化物層之聚萘二甲酸乙二酯膜之另一面亦設置氮化矽之層150nm,除此以外,以與比較例6相同之方式,獲得透明阻隔膜。 A transparent barrier film was obtained in the same manner as in Comparative Example 6, except that a layer of tantalum nitride was provided on the other side of the polyethylene naphthalate film having no resin cured layer.

由表1之實施例1至15、比較例1至15中之透過率、白濁之有無、密接性、耐久性試驗後之密接性、阻氣性之測定結果,可知本發明之膜係成為透過率、白濁、密接、阻氣性中之任一者均良好之膜。即,藉由不僅設置基材、及氮與矽之層,亦進而設置樹脂硬化物層,而提高各者之性能。進而,可知若比較實施例4與實施例8、或實施例5與實施例9,則藉由含有具有分支型全氟烯基之氟化合物或其衍生物,而阻氣性進一步提高。以如此之方式所獲得之本發明之膜可用作要求水蒸氣等之阻氣性之密封膜。該透明密封膜可有用地用於光電轉換元件、OLED元件。尤其於用於OLED之情形時,可為了不妨礙來自元件之發光而不使發光效率下降,獲得可靠性較高之OLED。又,於作為光電轉換用阻隔膜而用於光電轉換元件之情形時,透明性較高、阻隔性亦較高,故而長期作為光電轉換用阻隔膜而穩定地功能,故而可獲得不使太陽光之受光下降而功能之太陽電池。 From the results of the measurement of the transmittance, the presence or absence of white turbidity, the adhesion, the adhesion after the durability test, and the gas barrier properties in Examples 1 to 15 and Comparative Examples 1 to 15 of Table 1, it was found that the film system of the present invention was permeated. A film that is good in any of rate, white turbidity, adhesion, and gas barrier properties. In other words, by providing not only the substrate, but also the layers of nitrogen and antimony, and further providing the resin cured layer, the performance of each is improved. Further, when Comparative Example 4, Example 8, or Example 5 and Example 9 were compared, it was found that the gas barrier property was further improved by containing a fluorine compound having a branched perfluoroalkenyl group or a derivative thereof. The film of the present invention obtained in such a manner can be used as a sealing film which requires gas barrier properties such as water vapor. The transparent sealing film can be usefully used for a photoelectric conversion element, an OLED element. Particularly in the case of an OLED, an OLED having higher reliability can be obtained in order not to hinder the light emission from the element without lowering the luminous efficiency. In addition, when it is used as a photoelectric conversion element as a photoelectric conversion resistive film, since it has high transparency and high barrier property, it functions stably for a long time as a photoelectric conversion barrier film, so that sunlight can be obtained. A solar cell that functions as a function of light.

Claims (11)

一種膜,其特徵在於:其係於基材上具有由包含至少1種具有三羥甲基丙烷骨架或異三聚氰酸骨架之(甲基)丙烯酸酯化合物之聚合性樹脂組合物形成之硬化物層,且於該硬化物層上含有具有50nm至500nm之厚度之包含矽與氮之層之膜,並且該(甲基)丙烯酸酯化合物之含量相對於該聚合性樹脂組合物100重量份為40重量份至99重量份,該硬化物層之厚度為0.1μm至20μm,透過率為75%以上。 A film having a hardening formed of a polymerizable resin composition containing at least one (meth) acrylate compound having a trimethylolpropane skeleton or a hetero-cyanuric acid skeleton on a substrate. a layer containing a film of a layer containing cerium and nitrogen having a thickness of 50 nm to 500 nm on the cured layer, and the content of the (meth) acrylate compound is 100 parts by weight based on 100 parts by weight of the polymerizable resin composition From 40 parts by weight to 99 parts by weight, the cured layer has a thickness of from 0.1 μm to 20 μm and a transmittance of 75% or more. 如請求項1之膜,其中上述聚合性樹脂組合物係相對於該聚合性樹脂組合物100重量份,含有具有二環戊二烯骨架之(甲基)丙烯酸酯化合物10重量份至55重量份。 The film of claim 1, wherein the polymerizable resin composition contains 10 parts by weight to 55 parts by weight of the (meth) acrylate compound having a dicyclopentadiene skeleton, based on 100 parts by weight of the polymerizable resin composition. . 如請求項1之膜,其中上述聚合性樹脂組合物係相對於該聚合性樹脂組合物100重量份,含有具有分支型全氟烯基之氟系化合物或其衍生物0.01重量份至1重量份。 The film of claim 1, wherein the polymerizable resin composition contains 0.01 parts by weight to 1 part by weight of a fluorine-based compound having a branched perfluoroalkenyl group or a derivative thereof, based on 100 parts by weight of the polymerizable resin composition. . 如請求項2之膜,其中上述聚合性樹脂組合物係相對於該聚合性樹脂組合物100重量份,含有具有分支型全氟烯基之氟系化合物或其衍生物0.01重量份至1重量份。 The film of claim 2, wherein the polymerizable resin composition contains 0.01 parts by weight to 1 part by weight of a fluorine-based compound having a branched perfluoroalkenyl group or a derivative thereof, based on 100 parts by weight of the polymerizable resin composition. . 如請求項1至4中任一項之膜,其中上述包含矽與氮之層進而含有鋁作為元素。 The film according to any one of claims 1 to 4, wherein the layer containing ruthenium and nitrogen further contains aluminum as an element. 一種液晶顯示裝置,其係使用如請求項1至5中任一項之膜。 A liquid crystal display device using the film according to any one of claims 1 to 5. 一種有機電致發光元件,其係使用如請求項1至5中任一項之膜。 An organic electroluminescence device using the film according to any one of claims 1 to 5. 如請求項1至4中任一項之膜,其中上述包含矽與氮之層係藉由 離子束輔助蒸鍍法而形成。 The film of any one of claims 1 to 4, wherein the layer comprising cerium and nitrogen is It is formed by ion beam assisted vapor deposition. 如請求項5之膜,其中上述包含矽與氮之層係藉由離子束輔助蒸鍍法而形成。 The film of claim 5, wherein the layer comprising ruthenium and nitrogen is formed by ion beam assisted evaporation. 如請求項1至4中任一項之膜,其中上述包含矽與氮之層係藉由磁控濺鍍法而形成。 The film of any one of claims 1 to 4, wherein the layer comprising ruthenium and nitrogen is formed by magnetron sputtering. 如請求項5之膜,其中上述包含矽與氮之層係藉由磁控濺鍍法而形成。 The film of claim 5, wherein the layer comprising niobium and nitrogen is formed by magnetron sputtering.
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