TW201519385A - Joint structure and semiconductor device using it - Google Patents
Joint structure and semiconductor device using it Download PDFInfo
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- TW201519385A TW201519385A TW103121214A TW103121214A TW201519385A TW 201519385 A TW201519385 A TW 201519385A TW 103121214 A TW103121214 A TW 103121214A TW 103121214 A TW103121214 A TW 103121214A TW 201519385 A TW201519385 A TW 201519385A
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Abstract
Description
本發明是有關接合構造及使用該接合構造的半導體裝置。 The present invention relates to a bonding structure and a semiconductor device using the bonding structure.
為了接合複數的構件,以往適用錫焊或黏著劑等各式各樣的接合技術。在如此的接合技術之中,像專利文獻1及專利文獻2記載那樣,在構件的接合面設置複數個具有螺旋狀等的形狀之小的構造體,藉由本構造體彼此間的接觸或本構造體與其他構造體的接觸來接合複數的構件之技術也為人所知。 In order to join a plurality of members, various bonding techniques such as soldering or an adhesive have been conventionally applied. In the above-described bonding technique, as described in Patent Document 1 and Patent Document 2, a plurality of structures having a spiral shape or the like are provided on the joint surface of the member, and the structures are in contact with each other or the structure. The technique of joining a body to other structures to join a plurality of members is also known.
專利文獻1記載的技術是在寬度20mm,長度50mm的銅薄板的表面多數立設長度5mm的螺旋狀的接觸導體,藉由纏繞如此的接觸導體來接合銅薄板彼此間。 The technique described in Patent Document 1 is that a spiral contact conductor having a length of 5 mm is provided on a surface of a copper thin plate having a width of 20 mm and a length of 50 mm, and the copper thin plates are joined to each other by winding such contact conductors.
專利文獻2記載的技術是在安裝有半導體元件的電路安裝基板上設有將緩衝材隨機地複數配置於黏著劑內部的導電性彈性體,該緩衝材是形成直徑20~50μm的Au或Al線所構成的螺旋構造或格子構造。藉由在此導 電體彈性體插入設於半導體元件的金屬凸塊來接合半導體元件與電路安裝基板。 In the technique described in Patent Document 2, a conductive elastic body in which a buffer material is randomly disposed inside a pressure-sensitive adhesive is provided on a circuit-mounted substrate on which a semiconductor element is mounted, and the buffer material is formed into an Au or Al wire having a diameter of 20 to 50 μm. A spiral structure or a lattice structure. By guiding here The electric body elastic body is inserted into a metal bump provided on the semiconductor element to bond the semiconductor element and the circuit mounting substrate.
若根據上述那樣的專利文獻1或專利文獻2記載的技術,則電性或機械性或熱性的連接的可靠度會提升。 According to the technique described in Patent Document 1 or Patent Document 2 as described above, the reliability of electrical or mechanical or thermal connection is improved.
[先行技術文獻] [Advanced technical literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本特開2003-299506號公報(段落0016及0020,圖3) [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-299506 (paragraphs 0016 and 0020, Fig. 3)
[專利文獻2]日本特開2006-287091號公報(段落0036及0040,圖1及2) [Patent Document 2] Japanese Laid-Open Patent Publication No. 2006-287091 (paragraphs 0036 and 0040, Figs. 1 and 2)
當荷重或變位作用於接合不同的構件之接合構造時,配置於被接合構件之間的接合部的破斷防止,被接合構件與接合部的界面剝離防止會成問題。因此,期望接合部本身或界面的強度大的接合構造。 When the load or displacement acts on the joint structure for joining the different members, the breakage of the joint portion disposed between the members to be joined prevents the interface from being peeled off between the joint member and the joint portion. Therefore, a joint structure in which the joint itself or the interface is strong is desired.
特別是功率半導體裝置等,由相異的材料所形成的構件組合使用的裝置中,熱應力是不可避免地發生。並且,隨裝置的小型化或高密度化,熱應力會增加,今後也有其傾向。因此,在如此的裝置中,上述的問題更 顯著。 In particular, in a power semiconductor device or the like, in a device in which members formed of different materials are used in combination, thermal stress is inevitably generated. Further, as the device is miniaturized or densified, thermal stress increases, and there is a tendency in the future. Therefore, in such a device, the above problems are more Significant.
對於此,前述的以往技術是難以大幅度提升接合層或構件界面的強度。 In this regard, the aforementioned prior art is difficult to greatly increase the strength of the joint layer or the interface of the member.
於是,本發明是提供一種在接合複數的構件時,可大幅度提升接合層或構件界面的強度之接合構造,及使用該接合構造的半導體裝置。 Accordingly, the present invention provides a bonding structure capable of greatly increasing the strength of a bonding layer or a member interface when a plurality of members are joined, and a semiconductor device using the bonding structure.
為了解決上述課題,在本發明的接合構造中,在被接合構件間的接合部設置具有形狀尺寸未滿1μm亦即奈米級尺度的尺寸之彈簧狀的奈米構造體。 In order to solve the above-described problems, in the joint structure of the present invention, a spring-like nanostructure having a size of a size of less than 1 μm, that is, a nanometer scale, is provided at a joint portion between the members to be joined.
上述那樣的本發明的一形態是具備第1構件,第2構件,及接合第1構件與第2構件的接合部之接合構造,在本接合構造中,接合部是具備複數的彈簧狀的奈米構造體。 According to one aspect of the present invention, the first member, the second member, and the joint structure of the joint portion of the first member and the second member are joined, and in the joint structure, the joint portion has a plurality of spring-shaped nai Rice structure.
另外,第1及第2構件是可為導體,半導體,絕緣體的任一種。並且,彈簧狀的奈米構造體是可使用金屬材料等的導體材料或陶瓷材料等的絕緣材料。並且,彈簧形狀是例如可設為螺旋狀亦即線圈狀,或具有互相連結的複數的直線部之多直線狀或折線狀等的形狀。 Further, the first and second members may be any of a conductor, a semiconductor, and an insulator. Further, the spring-like nanostructure is an insulating material such as a conductive material such as a metal material or a ceramic material. Further, the spring shape may be, for example, a spiral shape, that is, a coil shape, or a shape having a plurality of linear portions or a polygonal line shape in which a plurality of linear portions are connected to each other.
而且,上述本發明的接合構造是可適用在半導體裝置之導線架與放熱基底的接合或導線架與密封樹脂的接合。 Further, the above-described bonding structure of the present invention is applicable to bonding of a lead frame of a semiconductor device to a heat radiation substrate or bonding of a lead frame and a sealing resin.
若根據本發明,則由於奈米構造體本身比塊材料更強度高,及可在接合面配置非常多數的奈米構造體,因此接合部的機械性強度,及構件與接合部的界面的機械性強度會大幅度提升。藉由該等,接合的可靠度會大幅度提升。 According to the present invention, since the nanostructure itself is stronger than the block material and a very large number of nanostructures can be disposed on the joint surface, the mechanical strength of the joint portion and the interface between the member and the joint portion are mechanical. Sexual strength will increase significantly. By this, the reliability of the joint is greatly improved.
上述以外的課題,構成及效果是可藉由以下的實施形態的說明得知。 The configuration and effects of the problems other than the above are known from the following description of the embodiments.
1‧‧‧半導體元件 1‧‧‧Semiconductor components
2‧‧‧焊錫 2‧‧‧Solder
3‧‧‧導線架 3‧‧‧ lead frame
4‧‧‧絕緣層 4‧‧‧Insulation
4a,4b,4d‧‧‧彈簧層 4a, 4b, 4d‧‧‧ spring layer
4c‧‧‧樹脂 4c‧‧‧Resin
5‧‧‧放熱基底 5‧‧‧Exothermic substrate
21‧‧‧被接合構件 21‧‧‧Connected components
22‧‧‧表面層 22‧‧‧ surface layer
23‧‧‧蒸鍍原子 23‧‧‧Evaporation of atoms
24‧‧‧彈簧層 24‧‧‧Spring layer
31‧‧‧被接合構件 31‧‧‧Connected components
32‧‧‧彈簧層 32‧‧‧Spring layer
33‧‧‧樹脂 33‧‧‧Resin
121‧‧‧密封樹脂 121‧‧‧ Sealing resin
圖1是第1實施例的半導體裝置的剖面模式圖。 Fig. 1 is a schematic cross-sectional view showing a semiconductor device of a first embodiment.
圖2(a)是表示接合部的破壞模式。 Fig. 2(a) shows the failure mode of the joint portion.
圖2(b)是表示接合部的破壞模式。 Fig. 2(b) is a broken mode showing the joint portion.
圖2(c)是表示接合部的破壞模式。 Fig. 2(c) is a broken mode showing the joint portion.
圖3(a)是表示第1實施例的接合構造的製造方法。 Fig. 3 (a) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖3(b)是表示第1實施例的接合構造的製造方法。 Fig. 3 (b) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖3(c)是表示第1實施例的接合構造的製造方法。 Fig. 3 (c) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖4(a)是表示第1實施例的接合構造的製造方法。 Fig. 4 (a) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖4(b)是表示第1實施例的接合構造的製造方法。 Fig. 4 (b) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖4(c)是表示第1實施例的接合構造的製造方法。 Fig. 4 (c) is a view showing a method of manufacturing the joint structure of the first embodiment.
圖5是彈簧層的上面照片及剖面照片。 Figure 5 is a top photograph and a cross-sectional photograph of the spring layer.
圖6是彈簧層的壓痕試驗裝置的模式圖。 Fig. 6 is a schematic view of an indentation test device for a spring layer.
圖7(a)是表示壓痕試驗的測定結果。 Fig. 7(a) shows the measurement results of the indentation test.
圖7(b)是表示壓痕試驗的測定結果。 Fig. 7(b) shows the measurement results of the indentation test.
圖7(c)是表示壓痕試驗的測定結果。 Fig. 7(c) shows the measurement results of the indentation test.
圖8是第2實施例的接合構造的剖面模式圖。 Fig. 8 is a schematic cross-sectional view showing a joint structure of a second embodiment.
圖9是表示接合構造的性質。 Fig. 9 is a view showing the nature of the joint structure.
圖10是第3實施例的接合構造的剖面模式圖。 Fig. 10 is a schematic cross-sectional view showing a joint structure of a third embodiment.
圖11是多直線形狀的彈簧層的剖面照片。 Fig. 11 is a cross-sectional photograph of a spring layer having a multi-linear shape.
圖12(a)是表示第4實施例的接合構造的製造方法。 Fig. 12 (a) is a view showing a method of manufacturing the joint structure of the fourth embodiment.
圖12(b)是表示第4實施例的接合構造的製造方法。 Fig. 12 (b) is a view showing a method of manufacturing the joined structure of the fourth embodiment.
圖12(c)是表示第4實施例的接合構造的製造方法。 Fig. 12 (c) is a view showing a method of manufacturing the joined structure of the fourth embodiment.
圖13是表示二直線形狀的彈簧的變形舉動的模擬結果。 Fig. 13 is a simulation result showing a deformation behavior of a spring having a two-linear shape.
圖14是表示三直線形狀的彈簧的變形舉動的模擬結果。 Fig. 14 is a simulation result showing a deformation behavior of a spring having a three-linear shape.
圖15(a)是第5實施例的接合構造的剖面模式圖。 Fig. 15 (a) is a schematic cross-sectional view showing a joint structure of a fifth embodiment.
圖15(b)是第5實施例的接合構造的剖面模式圖。 Fig. 15 (b) is a schematic cross-sectional view showing a joint structure of a fifth embodiment.
圖15(c)是第5實施例的接合構造的剖面模式圖。 Fig. 15 (c) is a schematic cross-sectional view showing a joint structure of a fifth embodiment.
圖16是第6實施例的接合構造的剖面模式圖。 Fig. 16 is a schematic cross-sectional view showing a joint structure of a sixth embodiment.
圖17是第7實施例的接合構造的剖面模式圖。 Fig. 17 is a schematic cross-sectional view showing a joint structure of a seventh embodiment.
圖18是第8實施例的半導體裝置的剖面模式圖。 Figure 18 is a cross-sectional schematic view showing a semiconductor device of an eighth embodiment.
以下,利用圖面來說明本發明的實施例。 Hereinafter, embodiments of the present invention will be described using the drawings.
[實施例1] [Example 1]
圖1是本發明的第1實施例的半導體裝置的剖面模式圖。 Fig. 1 is a schematic cross-sectional view showing a semiconductor device according to a first embodiment of the present invention.
在本實施例中,半導體元件1會經由焊錫2來與由金屬材料所構成的導線架3接合,該導線架3與由金屬材料所構成的放熱基底5會經由含絕緣層4的接合部來接合。另外,該等的構件以外,亦設有電性連接設在半導體元件1上面的端子與導線架之接線,或將半導體裝置全體密封的密封材,用以電性連接半導體裝置與外部電路的電極端子等,但在圖1是省略。 In the present embodiment, the semiconductor element 1 is bonded to the lead frame 3 made of a metal material via the solder 2, and the lead frame 3 and the heat releasing substrate 5 composed of a metal material are passed through the joint portion including the insulating layer 4. Engage. In addition to these members, a wiring for electrically connecting the terminal provided on the semiconductor element 1 to the lead frame or a sealing material for sealing the entire semiconductor device is also provided for electrically connecting the electrodes of the semiconductor device and the external circuit. Terminals, etc., are omitted in Figure 1.
在本實施例中,使用形成於1邊約10mm,厚度約0.1mm的矽晶片之IGBT(Insulated Gate Bipolar Transistor)作為半導體元件1。另外,IGBT是作為代表性的功率半導體裝置為周知。 In the present embodiment, an IGBT (Insulated Gate Bipolar Transistor) formed of a germanium wafer having a thickness of about 10 mm and a thickness of about 0.1 mm is used as the semiconductor element 1. Further, IGBT is well known as a representative power semiconductor device.
導線架3是在使用厚度約0.5mm的銅之下降低熱阻及電阻,放熱基底5是在使用鋁之下一邊確保放熱性一邊謀求輕量化。此時,在絕緣層4中,設在導線架3的表面的彈簧層4a與設在放熱基底5的表面的彈簧層4b會機械性地互相纏繞而嵌合,且在也含彈簧層間的導線架3與放熱基底5之間的空間充填樹脂4c作為充填構件。 In the lead frame 3, the thermal resistance and the electric resistance are reduced by using copper having a thickness of about 0.5 mm, and the exothermic substrate 5 is made lightweight while ensuring heat dissipation under the use of aluminum. At this time, in the insulating layer 4, the spring layer 4a provided on the surface of the lead frame 3 and the spring layer 4b provided on the surface of the heat radiation substrate 5 are mechanically intertwined and fitted, and also include the wires between the spring layers. A space between the frame 3 and the heat releasing substrate 5 is filled with a resin 4c as a filling member.
在彈簧層4a,4b中,具有彈簧形狀的奈米構造體(以下簡稱彈簧)是複數或多數配列。另外,在本實施例中是配列線圈狀的彈簧。在此,所謂奈米構造體是其幾何學的尺寸為比1μm更小的奈米尺度之構造體。 Among the spring layers 4a, 4b, a nanostructure having a spring shape (hereinafter referred to as a spring) is plural or a plurality of arrays. Further, in the present embodiment, a coil-like spring is arranged. Here, the nanostructure is a structure having a geometric dimension of a nanometer scale smaller than 1 μm.
本實施例是分別以氮化矽製亦即陶瓷製的彈 簧來構成設在導線架3的表面的彈簧層4a及設在放熱基底5的表面的彈簧層4b,在樹脂4c使用環氧系樹脂之下,確保導線架3與放熱基底5之間的電性絕緣性。並且,絕緣層4的厚度是按照所被要求的絕緣性能來設為10~100μm。在彈簧層4a,4b中,線圈狀的彈簧會被緊密地配置。各彈簧的形狀是線徑約為40nm,線圈外徑約為120nm,線圈間距約為150nm,越是從導線架3或放熱基底5來離開於垂直方向的位置,線徑或線圈外徑越會變大。 This embodiment is made of tantalum nitride, that is, ceramic bullets. The spring layer 4a provided on the surface of the lead frame 3 and the spring layer 4b provided on the surface of the heat radiation substrate 5 are spring-made, and the electric power between the lead frame 3 and the heat radiation substrate 5 is ensured under the resin 4c using an epoxy resin. Insulation. Further, the thickness of the insulating layer 4 is set to 10 to 100 μm in accordance with the required insulating properties. In the spring layers 4a, 4b, the coil-like springs are closely arranged. The shape of each spring is about 40 nm, the outer diameter of the coil is about 120 nm, and the coil pitch is about 150 nm. The more away from the lead frame 3 or the heat releasing substrate 5, the more the wire diameter or the outer diameter of the coil is. Become bigger.
在本實施例中,因為在導線架3使用銅,在放熱基底5使用鋁,所以絕緣層4是接合線膨張係數不同的材料。因此,一旦半導體裝置的溫度因半導體元件1的動作發熱或使用環境溫度的變化而變化,則雖在導線架3及放熱基底5的熱變形產生差,但會以絕緣層4來吸收此變形差。在本實施例中,絕緣層4是以樹脂4c及由低彈性的奈米構造體所形成的彈簧層4a,4b來構成,因此絕緣層4是彈性率會被減低,可確實地吸收變形。 In the present embodiment, since copper is used for the lead frame 3 and aluminum is used for the heat release substrate 5, the insulating layer 4 is a material having a different joint expansion coefficient. Therefore, once the temperature of the semiconductor device changes due to the heat generation of the semiconductor element 1 or the change in the temperature of the use environment, the thermal deformation of the lead frame 3 and the heat radiation substrate 5 is poor, but the difference in deformation is absorbed by the insulating layer 4. . In the present embodiment, the insulating layer 4 is composed of the resin 4c and the spring layers 4a, 4b formed of the low-elastic nanostructure. Therefore, the insulating layer 4 is reduced in elastic modulus and can be reliably absorbed and deformed.
在本實施例中,因為彈簧層4a,4b的奈米構造體的材料是絕緣性高的氮化矽,所以即使設在導線架3的表面的彈簧層4a與設在放熱基底表面的彈簧層4b藉由嵌合而接觸或鄰接,還是可確保導線架3與放熱基底5的電性絕緣性。 In the present embodiment, since the material of the nanostructure of the spring layers 4a, 4b is tantalum nitride having high insulation, even the spring layer 4a provided on the surface of the lead frame 3 and the spring layer provided on the surface of the heat release substrate 4b is contacted or abutted by fitting, and the electrical insulation of the lead frame 3 from the heat releasing substrate 5 can be ensured.
圖2是表示接合部的代表性的破壞模式。 Fig. 2 is a view showing a typical failure mode of the joint portion.
圖2(a)是被接合部的界面剝離的模式,圖2(b) 是龜裂進展於接合層內部的模式,圖2(c)是彈簧與充填樹脂的界面剝離的模式。 Fig. 2(a) is a mode in which the interface of the joined portion is peeled off, and Fig. 2(b) It is a mode in which the crack progresses inside the bonding layer, and FIG. 2(c) is a mode in which the interface between the spring and the filling resin is peeled off.
在本實施例中,線圈間距約為150nm,因此分別配置於導線架3的表面或放熱基底5的表面的每單位面積(1mm2)的彈簧是約4×107個,線徑約為40nm,因此界面的每單位面積(1mm2)的彈簧的面積是π×(20×10-6)2×4×107=0.05mm2,亦即總面積的5%。一般氮化矽的塊材的強度是約700MPa以上。而且,構成奈米彈簧層的彈簧之材料是奈米尺度的構造體,因此不易在結晶內部發生轉位,如後述的試驗結果那樣,降伏應力或強度要比塊材更大2倍以上。因此,若將彈簧的強度設為塊材的2倍的1400MPa,則界面的強度是成為1400MPa的5%的70MPa。這比使用在樹脂4c的環氧樹脂的強度大數倍。因此,本實施例的接合構造與不具彈簧層的接合構造作比較,對於圖2(a)所示那樣的被接合構件與接合部的界面剝離的模式,可取得高的可靠度。 In the present embodiment, the coil pitch is about 150 nm, so that the springs per unit area (1 mm 2 ) respectively disposed on the surface of the lead frame 3 or the surface of the heat release substrate 5 are about 4 × 10 7 , and the wire diameter is about 40 nm. Therefore, the area of the spring per unit area (1 mm 2 ) of the interface is π × (20 × 10 -6 ) 2 × 4 × 10 7 = 0.05 mm 2 , that is, 5% of the total area. Generally, the strength of the tantalum nitride block is about 700 MPa or more. Further, since the material of the spring constituting the nanospring layer is a nanometer-scale structure, it is difficult to cause indexing inside the crystal, and the stress or strength of the relief is twice or more larger than that of the bulk material as a result of the test described later. Therefore, when the strength of the spring is 1400 MPa which is twice the bulk material, the strength of the interface is 70 MPa which is 5% of 1400 MPa. This is several times larger than the strength of the epoxy resin used in the resin 4c. Therefore, in the joint structure of the present embodiment, compared with the joint structure without the spring layer, high reliability can be obtained in the mode in which the interface between the member to be joined and the joint portion is peeled off as shown in Fig. 2(a).
並且,在本實施例中,由於設在導線架3的表面的彈簧層4a與設在放熱基底5的表面的彈簧層4b嵌合,所以當絕緣層4破斷時,至少設在導線架3的表面的彈簧層4a與設在放熱基底5的表面的彈簧層4b的哪邊會斷線。因此,包含接合層4的接合部的破壞強度是至少相當彈簧層的強度。 Further, in the present embodiment, since the spring layer 4a provided on the surface of the lead frame 3 is fitted to the spring layer 4b provided on the surface of the heat radiation substrate 5, when the insulating layer 4 is broken, it is provided at least in the lead frame 3. On the side of the spring layer 4a provided on the surface of the heat release substrate 5, the spring layer 4a of the surface is broken. Therefore, the breaking strength of the joint portion including the joining layer 4 is at least equivalent to the strength of the spring layer.
如上述般,彈簧層的強度是比作為充填樹脂使用的環氧樹脂的強度大數倍。因此,本實施例的接合構 造是對於圖2(b)所示那樣龜裂進展於接合部內部的模式也可取得高的可靠度。 As described above, the strength of the spring layer is several times larger than the strength of the epoxy resin used as the filling resin. Therefore, the joint structure of the present embodiment It is also possible to achieve high reliability in the mode in which the crack progresses inside the joint as shown in Fig. 2(b).
在本實施例中,由於可緊密地排列配置彈簧,因此可在被接合構件的每表面單位體積配置非常多的奈米彈簧。其結果,充填樹脂與持3次元形狀的彈簧的接合面積會變大。彈簧與充填樹脂的界面的應力是在界面所負荷的荷重除以接合面積的值,所以接合面積大的本實施例是可大幅度減低界面的應力。因此,本實施例的接合構造是即使對於圖2(c)所示那樣彈簧與充填樹脂的界面剝離的模式也可取得高的可靠度。 In the present embodiment, since the springs can be arranged closely, a large number of nanosprings can be disposed per unit volume per surface of the member to be joined. As a result, the joint area of the filling resin and the spring having a three-dimensional shape becomes large. The stress at the interface between the spring and the resin is the value of the load applied to the interface divided by the joint area. Therefore, in this embodiment, the joint area is large, and the stress at the interface can be greatly reduced. Therefore, the joint structure of the present embodiment can achieve high reliability even in the mode in which the interface between the spring and the filling resin is peeled off as shown in Fig. 2(c).
可是,就大尺度(macro scale)的接合構造而言,在接合端部的附近,應力比其他的領域更顯著地變大。這是因為接合端部的應力分布成為持特異性的應力特異場(stress singular field),在異材的接合端部,理論上應力是成為無限大。一般顯現此應力特異性的是離接合端部數10~數100nm以上的領域。就使用在本實施例的彈簧層而言,奈米級的構造體會緊密地配置,在大尺度成為特異場的領域也配置有複數的構造體。因此,在彈簧層的端部是應力特異性(stress singularity)未顯著地出現,可防止在接合端部的應力增加。 However, in the case of a joint structure of a macro scale, the stress is more significantly increased in the vicinity of the joint end than in other fields. This is because the stress distribution at the joint end becomes a specific stress singular field, and at the joint end of the dissimilar material, the stress is theoretically infinite. Generally speaking, the stress specificity is in the range of 10 to several 100 nm or more from the joint end. In the spring layer used in the present embodiment, the nano-structures are closely arranged, and a plurality of structures are disposed in a field where a large-scale becomes a specific field. Therefore, the stress singularity at the end of the spring layer does not occur remarkably, and the stress at the joint end can be prevented from increasing.
如以上般,若根據本實施例的接合構造,則對於接合部的任一破壞模式皆可取得高的可靠度。亦即,可大幅度提升接合部本身或接合部與被接合構件的界面的強度。 As described above, according to the joint structure of the present embodiment, high reliability can be obtained for any failure mode of the joint portion. That is, the strength of the joint itself or the interface between the joint portion and the member to be joined can be greatly improved.
其次,在圖3(a)~(c)及圖4(a)~(c)顯示本實施例的接合構造的製造方法。另外,在本製造方法中,例如,使用記載於文獻,Takayuki Kitamura,et al,“FRACTURE NANOMECHANICS”,PAN STANFORD PUBLISHING(2011),ISBN 978-981-4241-83-0之周知的奈米構造體製造方法。 Next, a method of manufacturing the joint structure of the present embodiment is shown in Figs. 3(a) to (c) and Figs. 4(a) to 4(c). Further, in the present production method, for example, a well-known nanostructure described in the literature, Takayuki Kitamura, et al, "FRACTURE NANOMECHANICS", PAN STANFORD PUBLISHING (2011), ISBN 978-981-4241-83-0 is used. Production method.
首先,在形成如圖3(a)所示般的被接合構件21的彈簧層之表面,如圖3(b)所示般,以真空蒸鍍法來形成表面層22。此表面層22是提高被接合構件21與在下個工程形成的彈簧的接合性,且整頓被接合構件21的表面粗度而使平坦化。其次,如圖3(c)所示般,在形成被接合構件21的彈簧層之表面,從斜方向以真空蒸鍍法來使蒸鍍原子23堆積。此時,一邊使被接合構件21旋轉,一邊令蒸鍍原子23堆積,藉此原子會堆積成線圈狀,在被接合構件21的表面形成有附著或黏著的線圈狀的彈簧層24。另外,彈簧是以其長度方向能夠在被接合構件21的表面形成垂直的方向之方式,立設在被接合構件21的表面上。 First, the surface layer 22 is formed by vacuum deposition as shown in Fig. 3(b) on the surface of the spring layer of the member 21 to be joined as shown in Fig. 3(a). This surface layer 22 is to improve the bonding property between the joined member 21 and the spring formed in the next process, and to rectify the surface roughness of the joined member 21 to be flattened. Next, as shown in FIG. 3(c), the vapor deposition atoms 23 are deposited by vacuum deposition from the oblique direction on the surface of the spring layer on which the member 21 to be joined is formed. At this time, while the member to be joined 21 is rotated, the vapor deposition atoms 23 are deposited, whereby atoms are deposited in a coil shape, and a coil-like spring layer 24 adhered or adhered to the surface of the member to be joined 21 is formed. Further, the spring is erected on the surface of the member to be joined 21 so that the longitudinal direction thereof can form a vertical direction on the surface of the member to be joined 21.
其次,如圖4(a)所示般,以形成有各個的奈米彈簧層之面能夠對向的方式配置被接合構件21與被接合構件31。其次,如圖4(b)所示般,在推壓接合構件21與被接合構件31之下,設在被接合構件21的表面的彈簧層24與設在被接合構件31的表面的彈簧層32會被機械性地嵌合。藉此,兩被接合構件會被接合,彼此定位。此 時,依照彈簧的形狀,在推壓被接合構件21與被接合構件31時,以超音波等來附加振動之下,彈簧層彼此間會更容易嵌合。其次,如圖4(c)所示般,在嵌合的彈簧間充填樹脂33之下,被接合構件21與被接合構件31會被更牢固地接合。 Next, as shown in FIG. 4(a), the member to be joined 21 and the member to be joined 31 are disposed so that the surfaces on which the respective nanospring layers are formed can be opposed. Next, as shown in FIG. 4(b), under the pressing and joining member 21 and the member to be joined 31, the spring layer 24 provided on the surface of the member to be joined 21 and the spring layer provided on the surface of the member to be joined 31 are provided. 32 will be mechanically fitted. Thereby, the two engaged members are engaged and positioned relative to each other. this When the member to be joined 21 and the member to be joined 31 are pressed in accordance with the shape of the spring, vibration is added by ultrasonic waves or the like, and the spring layers are more easily fitted to each other. Next, as shown in Fig. 4(c), the joined member 21 and the member to be joined 31 are more firmly joined under the fitting interspring inter-filling resin 33.
此時,被接合構件21與被接合構件31是藉由奈米彈簧的嵌合來接合,因此即使不充填樹脂33還是可接合。此情況,可不損傷恢復被接合構件或彈簧層。另外,可按照接合構造的用途來適當選擇樹脂33的有無。 At this time, since the joined member 21 and the member to be joined 31 are joined by the fitting of the nanospring, the resin 33 can be joined without being filled. In this case, the joined member or the spring layer can be recovered without damage. Further, the presence or absence of the resin 33 can be appropriately selected in accordance with the use of the joint structure.
利用圖5~7來說明彈簧層的力學特性。 The mechanical properties of the spring layer will be described using Figs.
圖5是Ni製的奈米級的線圈被緊密地配置的彈簧層的上面照片及剖面照片。各彈簧的形狀是線徑約為40nm,線圈外徑約為120nm,線圈間距約為150nm,高度約為400nm。本發明者是將壓頭推進此奈米彈簧層,由此時的荷重與變位的關係來檢討奈米彈簧層的力學特性。 Fig. 5 is a photograph of a top surface and a cross-sectional photograph of a spring layer in which a nano-phase coil made of Ni is closely arranged. Each spring has a wire diameter of about 40 nm, a coil outer diameter of about 120 nm, a coil pitch of about 150 nm, and a height of about 400 nm. The present inventors reviewed the mechanical properties of the nanospring layer by advancing the indenter to the nanospring layer and the relationship between the load and the displacement.
在圖6顯示奈米彈簧層的壓痕試驗裝置的模式圖。使用在原子間力顯微鏡中裝入10μN~10mN的微小荷重控制可能的Hysitron社製Triboscope之裝置,取得將曲率半徑10.44μm的圓錐壓頭推進彈簧層時的荷重-變位關係。變位測定分解能是0.2nm。測定是以荷重控制來實施,2度附加同荷重,在荷重-變位關係無變化時判定彈性變形範圍,然後在同位置增加荷重,再度重複2度附加同荷重。藉由重複此程序來求取降伏的荷重及該時的變位。 Fig. 6 is a schematic view showing an indentation test apparatus for a nanospring layer. A device using a Triboscope manufactured by Hysitron Co., Ltd., which is a small load of 10 μN to 10 mN, was placed in an atomic force microscope to obtain a load-displacement relationship when a conical indenter was used to advance a spring layer having a radius of curvature of 10.44 μm. The displacement measurement decomposition energy was 0.2 nm. The measurement is carried out by the load control, and the same load is applied at 2 degrees. The elastic deformation range is determined when the load-displacement relationship does not change, and then the load is increased at the same position, and the same load is repeated again by 2 degrees. By repeating this procedure, the loaded load and the displacement at that time are obtained.
在圖7(a)~(c)顯示測定結果。縱軸為荷重,橫軸為變位量。在荷重19.0μN(圖7(a)),20.2μN(圖7(b))的條件下,第1次與第2次的荷重-變位關係未見變化,為彈性變形範圍。另一方面,在荷重22.0μN(圖7(c))的條件下,第1次與第2次的荷重-變位關係會變化,可判斷藉由第1次的荷重附加而降伏。改變測定位置而實施3次此試驗時,降伏後的荷重是21.9μN,15.2μN,10.6μN,該等對於荷重的變位是分別為21.7nm,24.6nm,20.8nm。平均值是分別為15.9μN,22.4nm。 The measurement results are shown in Figs. 7(a) to (c). The vertical axis is the load and the horizontal axis is the displacement amount. Under the conditions of a load of 19.0 μN (Fig. 7(a)) and 20.2 μN (Fig. 7(b)), the relationship between the first and second load-displacement did not change and was in the range of elastic deformation. On the other hand, under the condition of a load of 22.0 μN (Fig. 7 (c)), the relationship between the first and second load-displacement changes, and it can be judged that the load is increased by the first load addition. When the test position was changed three times, the load after the drop was 21.9 μN, 15.2 μN, 10.6 μN, and the displacements for the load were 21.7 nm, 24.6 nm, and 20.8 nm, respectively. The average values were 15.9 μN and 22.4 nm, respectively.
將線圈彈簧只變位u壓縮時產生的剪應力τ是一般以次式(1)來表示。 The shear stress τ generated when the coil spring is only displaced by u is generally expressed by the following formula (1).
在此,G是橫彈性係數,d是線徑,n是有效卷數,D是平均線圈徑。若在式(1)中代入奈米構造體的彈簧的物性值及尺寸,在變位u中代入發生塑性變形的變位的平均值22.4nm,則塑性變形所產生的剪應力τ是求得759MPa,若變換成Mises的相當應力,則成為1.32GPa。此值是構成彈簧的材料的降伏應力,與Ni塊材的降伏應力作比較大2倍以上。降伏應力比塊材更大是因為在奈米尺度的構造中來自表面的轉位難進入。 Here, G is the transverse elastic coefficient, d is the wire diameter, n is the effective number of rolls, and D is the average coil diameter. When the physical property value and size of the spring of the nanostructure are substituted in the formula (1), and the average value of the displacement of the plastic deformation is 22.4 nm in the displacement u, the shear stress τ generated by the plastic deformation is obtained. 759 MPa, if converted to the equivalent stress of Mises, becomes 1.32 GPa. This value is the relief stress of the material constituting the spring, which is more than twice as large as the relief stress of the Ni block. The lodging stress is larger than the bulk because the index from the surface is difficult to enter in the nanoscale configuration.
[實施例2] [Embodiment 2]
圖8是表示本發明的第2實施例的接合構造的剖面模式圖。與第1實施例不同,設在被接合構件21的表面的彈簧層24與設在被接合構件31的表面的彈簧層32是不機械性地嵌合,在對於被接合構件的接合面垂直方向分離,被接合構件21,31是藉由樹脂33來接合。 Fig. 8 is a schematic cross-sectional view showing a joint structure according to a second embodiment of the present invention. Unlike the first embodiment, the spring layer 24 provided on the surface of the member to be joined 21 is not mechanically fitted to the spring layer 32 provided on the surface of the member to be joined 31, and is perpendicular to the joint surface of the member to be joined. Separated, the joined members 21, 31 are joined by the resin 33.
在本實施例中,雖彈簧層彼此間未被嵌合,但藉由接合層具備彈簧層,對於圖2(a)所示的被接合構件與接合部的界面剝離的模式,圖2(c)所示的彈簧與樹脂的界面剝離的模式之可靠度會提升。藉由樹脂來接合被接合構件時,一般比起圖2(b)所示龜裂進展於樹脂內部的模式,對於圖2(a)或(c)所示的界面剝離的模式之強度更小。因此,藉由在使用樹脂的接合層適用本實施例,圖2(a)或(c)的2個模式的可靠度會提升,可提升接合的可靠度。 In the present embodiment, although the spring layers are not fitted to each other, the joint layer is provided with a spring layer, and the interface between the member to be joined and the joint portion shown in Fig. 2(a) is peeled off, and Fig. 2 (c) The reliability of the mode in which the interface between the spring and the resin is peeled off is improved. When the member to be joined is joined by a resin, generally, the mode in which the crack is advanced in the resin as shown in Fig. 2(b) is smaller, and the mode of the interface peeling shown in Fig. 2 (a) or (c) is smaller. . Therefore, by applying the present embodiment to the bonding layer using the resin, the reliability of the two modes of Fig. 2 (a) or (c) is improved, and the reliability of bonding can be improved.
在圖9中彙整顯示不持彈簧的周知的接合構造,及持具有彈簧的毫米級的面扣件之接合構造,本發明的第1實施例及第2實施例之各接合構造的性質。 In Fig. 9, the known joint structure without a spring and the joint structure of a surface fastener having a millimeter-level spring having a spring are shown, and the properties of the joint structures of the first embodiment and the second embodiment of the present invention are shown.
不持彈簧的周知的接合構造是僅以剛性低的充填樹脂所構成,因此剛性小,變形吸收性佳。持奈米構造體的彈簧之第1及第2實施例的接合構造也是因為奈米彈簧剛性小,所以變形吸收性佳。另一方面,就持毫米級的面扣件之接合構造而言,因為彈簧的彎曲剛性是與線徑的3次方成比例,所以線徑大的毫米級的面扣件的剛性非常大,變形吸收性低。產生於彈簧的應力是與線徑的2次方成比例。因此,就持奈米構造體的彈簧之接合構造而 言,產生於彈簧的應力小,但就毫米級而言,產生非常大的應力,彈簧本身容易破壞。因此,第1及第2實施例的效果之一的變形吸收性的高度是可在使用奈米級的彈簧層之下實現。 The well-known joining structure which does not hold a spring is comprised only by the filling resin of low rigidity, and it is small in rigidity, and it is excellent in deformation absorption. The joint structure of the first and second embodiments of the spring holding the nanostructure is also because the rigidity of the nanospring is small, so that the deformation absorbability is good. On the other hand, in the joint structure of the millimeter-sized surface fastener, since the bending rigidity of the spring is proportional to the third power of the wire diameter, the millimeter-sized surface fastener having a large wire diameter is extremely rigid. Low deformation absorption. The stress generated in the spring is proportional to the second power of the wire diameter. Therefore, the joint structure of the spring holding the nanostructure is In other words, the stress generated by the spring is small, but in terms of the millimeter level, a very large stress is generated, and the spring itself is easily broken. Therefore, the height of the deformation absorbability which is one of the effects of the first and second embodiments can be achieved under the use of a nano-level spring layer.
對於圖2(a)~(c)所示的3種類的接合層破壞模式,就不持彈簧的周知的接合構造而言,是無藉由彈簧所產生的強度提升。就持毫米級的彈簧的接合構造而言,彈簧本身的強度大,但因為接合端部與彈簧的距離大,所以在無彈簧的領域中圖2(a)所示的模式的防止難。並且,與奈米級的彈簧作比較,因為彈簧的表面積小,所以圖2(c)所示的模式的防止效果小。基於該等的情形,第1及第2實施例的效果之一的接合部的可靠度提升是可在使用奈米級的彈簧層之下實現。 With respect to the three types of joint layer failure modes shown in FIGS. 2(a) to 2(c), the known joint structure without the spring does not have the strength increase by the spring. In the joint structure of the spring of the millimeter-scale spring, the strength of the spring itself is large, but since the distance between the joint end and the spring is large, the prevention of the mode shown in Fig. 2(a) is difficult in the field without the spring. Further, compared with the spring of the nanometer type, since the surface area of the spring is small, the prevention effect of the mode shown in Fig. 2(c) is small. Based on these circumstances, the reliability improvement of the joint portion which is one of the effects of the first and second embodiments can be achieved under the use of a nano-level spring layer.
可是,一般與充填樹脂作比較,使用在彈簧的氮化矽等的材料是熱傳導率大。因此,與不持彈簧的接合構造或上下的彈簧未咬合的接合構造作比較,毫米級,奈米級皆可縮小彈簧咬合的接合構造的熱阻。 However, generally, a material such as tantalum nitride used in a spring has a large thermal conductivity as compared with a filled resin. Therefore, in comparison with the joint structure without the spring or the joint structure in which the upper and lower springs are not engaged, the millimeter-scale, nano-scale can reduce the thermal resistance of the joint structure of the spring-engagement.
有關絕緣性是任一接合構造皆以樹脂厚度的調整來確保。 Regarding insulation, any joint structure is ensured by adjustment of the thickness of the resin.
有關製造性,不持彈簧的接合構造或上下的彈簧未咬合的接合構造是厚度方向的限制小,相對的,持毫米級或奈米級的彈簧的構造是厚度的限制大。但,就持毫米級或奈米級的彈簧之構造而言,由於可常溫接合,因此可縮小接合後的殘留應力,樹脂充填前是可恢復 (repair)。 Regarding manufacturability, the joint structure that does not hold the spring or the joint structure in which the upper and lower springs are not engaged is small in the thickness direction, and the structure of the spring of the millimeter-scale or nano-scale is relatively large in thickness limitation. However, in the case of a spring- or nano-grade spring structure, since it can be joined at room temperature, the residual stress after joining can be reduced, and the resin can be recovered before filling. (repair).
由該等的情形,第1及第2實施例是可考慮上述那樣的性質而按照用途來選擇使用。藉此,可使在各用途被要求的可靠度提升。 In these cases, the first and second embodiments can be selectively used depending on the application in consideration of the above-described properties. Thereby, the reliability required for each use can be improved.
[實施例3] [Example 3]
圖10是表示本發明的第3實施例之接合構造的剖面模式圖。本實施例是與第1及第2實施例不同,為將樹脂與平板狀的被接合構件接合的接合構造。在本實施例中,線圈狀的彈簧層32是只設在樹脂33與被接合構件31的表面之內,被接合構件31的表面,且延伸於被接合構件的樹脂33內。亦即,彈簧層是設在被接合構件31與成為另一方的接合構件的樹脂33的界面。藉由本實施例,也可與第2實施例同樣,對於圖2(a)或(c)的模式取得高的可靠度。 Fig. 10 is a schematic cross-sectional view showing a joint structure according to a third embodiment of the present invention. This embodiment is a joint structure in which a resin and a flat member to be joined are joined, unlike the first and second embodiments. In the present embodiment, the coil-shaped spring layer 32 is provided only in the surface of the resin 33 and the member to be joined 31, the surface of the member to be joined 31, and extends in the resin 33 of the member to be joined. That is, the spring layer is an interface provided between the member to be joined 31 and the resin 33 which is the other joining member. According to the present embodiment, as in the second embodiment, high reliability can be obtained for the mode of Fig. 2 (a) or (c).
[實施例4] [Example 4]
利用圖11~14來說明本發明的第4實施例的接合構造。 The joint structure of the fourth embodiment of the present invention will be described with reference to Figs. 11 to 14 .
在利用圖3及圖4來說明的彈簧層的製造方法中,藉由斜蒸鍍法來使原子堆積時,一旦控制接合構件的旋轉方法,則可使彈簧成長成由複數的直線部所構成的多直線狀或折線狀。 In the method for manufacturing a spring layer described with reference to FIGS. 3 and 4, when atoms are deposited by oblique vapor deposition, when the method of rotating the bonding member is controlled, the spring can be grown to be composed of a plurality of straight portions. More linear or polygonal.
在圖11顯示具有二個的直線部之多直線狀 (以下稱為二直線形狀)的彈簧層的剖面照片,作為具備如此的多直線形狀之奈米構造體的彈簧層的一例。若將彈簧設為多直線狀或折線狀,則可增加彈簧的密度,因此可靠度的提升或熱阻的減低有效。 Figure 11 shows a linear shape with two straight portions A cross-sectional photograph of a spring layer (hereinafter referred to as a two-linear shape) is an example of a spring layer having such a multi-linear nanostructure. If the spring is made linear or polygonal, the density of the spring can be increased, so that the reliability is improved or the thermal resistance is reduced.
圖12(a)~(c)是表示具有三個的直線部之多直線狀(以下記為三直線形狀)的彈簧層之接合構造。 12(a) to 12(c) show a joint structure of a spring layer having a plurality of linear portions (hereinafter referred to as a three-linear shape) having three straight portions.
如圖12(a)所示般,彈簧32(24)是具有:從被接合構件31(21)的表面延伸至上方(下方)的直線部32a(24a),及從直線部32a(24a)的上端(下端)延伸至上方(下方)的直線部32b(24b),及從直線部32b(24b)的上端(下端)延伸至上方(下方)的直線部32c(24c)。該等三直線部會形成互相連結的折線狀,藉此構成一個的彈簧。 As shown in Fig. 12 (a), the spring 32 (24) has a linear portion 32a (24a) extending from the surface of the member to be joined 31 (21) to the upper side (downward), and a straight portion 32a (24a). The upper end (lower end) extends to the upper (lower) straight portion 32b (24b), and the straight portion 32c (24c) that extends from the upper end (lower end) of the straight portion 32b (24b) to the upper (lower) portion. These three straight portions form a line shape which is connected to each other, thereby constituting one spring.
如圖12(a)所示般,使在被接合構件21中設有三直線形狀的彈簧24的面與在被接合構件31中設有三直線形狀的彈簧32的面彼此相向的狀態下,如圖12(b)所示般,推壓被接合構件21與被接合構件31。藉由此時的推壓力,在彈簧產生塑性變形,產生彈簧的直線部間的折彎大的部分。亦即,彈簧24,32變形成鉤狀,產生彼此卡住的地方。藉此,被接合構件21與被接合構件31是以高的可靠度來接合,互相定位。另外,如圖12(c)所示般,藉由充填樹脂33,接合的可靠度會提升。 As shown in Fig. 12 (a), in a state in which the surface of the spring 24 provided with the three linear shapes in the member to be joined 21 and the surface of the spring 32 in which the three linear shapes are provided in the member to be joined 31 face each other, as shown in the figure As shown in FIG. 12(b), the member 21 to be joined and the member to be joined 31 are pressed. By the pressing force at this time, the spring is plastically deformed, and a large portion between the straight portions of the spring is generated. That is, the springs 24, 32 are deformed into hooks to create a place where they are stuck to each other. Thereby, the joined member 21 and the member to be joined 31 are joined with high reliability and positioned to each other. Further, as shown in Fig. 12(c), the reliability of joining is improved by filling the resin 33.
藉由圖11所示的二直線形狀的彈簧也可為與使用圖12所示的三直線形狀的彈簧時同樣的接合構造。另外,如以下所述般,最好使用具有三直線以上的直線部 的彈簧。 The two-linear spring shown in FIG. 11 can also be the same joint structure as when the three-linear spring shown in FIG. 12 is used. Further, as described below, it is preferable to use a straight portion having three straight lines or more. Spring.
圖13及圖14是分別表示以有限元素法來模擬推壓二直線形狀的彈簧及三直線形狀的彈簧時的塑性變形舉動的結果。 FIGS. 13 and 14 are results of plastic deformation behaviors when a spring of a two-linear shape and a spring of a three-linear shape are simulated by a finite element method.
圖13所示的二直線形狀的彈簧時,被推壓之前,直線部b是從直線部a的上端往上方延伸,但被推壓時是在被接合構件表面幾乎形成平行。然後一旦被除荷,則直線部b是藉由回彈而多少接近原來的形狀,因此與堆壓前同樣從直線部a的上端往上方延伸。相對於此,圖14所示的三直線形狀的彈簧時,被推壓之前,直線部C是從直線部b的上端往上方延伸,但被推壓時是從直線部b的端往下方延伸。即使之後被除荷,直線部c還是保持其延伸的方向。亦即,三直線部以上的多直線形狀的彈簧時,塑性變形後,成為比二直線形狀的彈簧時更彎曲情況大的鉤形狀。因此,具有三個以上的直線部的多直線狀的彈簧彼此間是比二直線形狀的彈簧彼此間更容易嵌合。藉此,若使用具有三個以上的直線部的多直線狀的彈簧,則可取得具有更大的接合強度之可靠度高的接合構造。 In the case of the two linear springs shown in Fig. 13, the straight portion b extends upward from the upper end of the straight portion a before being pressed, but is almost parallel to the surface of the member to be joined when pressed. Then, once the load is removed, the straight portion b is somewhat closer to the original shape by the rebound, and therefore extends upward from the upper end of the straight portion a as before the stacking. On the other hand, in the case of the three-linear spring shown in FIG. 14, the straight portion C extends upward from the upper end of the straight portion b before being pressed, but extends downward from the end of the straight portion b when pressed. . Even after being unloaded, the straight portion c maintains its extending direction. In other words, in the case of a multi-linear spring having three straight portions or more, after plastic deformation, the hook shape is larger than that of the two-linear spring. Therefore, the plurality of linear springs having three or more straight portions are more easily fitted to each other than the two linear springs. As a result, when a multi-linear spring having three or more straight portions is used, a highly reliable joint structure having a large joint strength can be obtained.
[實施例5] [Example 5]
圖15(a)~(c)是表示本發明的第5實施例之接合構造的剖面模式圖。在本實施例中,如圖15(a)所示般,與其他的實施例不同,在一方的被接合構件21的表面是設有多直線狀(三直線形狀)的彈簧層24,在另一方的 被接合構件31的表面是設有線圈形狀的彈簧層32。亦即,在上下的被接合構件,彈簧的形狀不同。如圖15(b)所示般,在本接合構造中也是在接合時推壓接合構件之下,如圖14所示般,多直線形狀的彈簧會變形成彎曲情況大的鉤狀。變形後的多直線狀的彈簧與線圈形狀的彈簧咬合之下,被接合構件21,31會被接合,彼此定位。藉此,接合強度會提升,可取得高的接合可靠度。並且,可防止兩構件間的鬆動。而且,如圖15(c)所示般,藉由充填樹脂33,接合的可靠度會提升。 15(a) to 15(c) are schematic cross-sectional views showing a joint structure of a fifth embodiment of the present invention. In the present embodiment, as shown in Fig. 15 (a), unlike the other embodiments, the surface of one of the joined members 21 is provided with a multi-linear (three-linear shape) spring layer 24, in another One side The surface of the member to be joined 31 is a spring layer 32 provided with a coil shape. That is, the shapes of the springs are different in the upper and lower joined members. As shown in Fig. 15 (b), in the present joint structure, the joint member is also pressed under the joint, and as shown in Fig. 14, the spring of the multi-linear shape is deformed into a hook shape having a large bending condition. When the deformed multi-linear spring is engaged with the coil-shaped spring, the engaged members 21, 31 are engaged and positioned to each other. Thereby, the joint strength is improved, and high joint reliability can be obtained. Also, it is possible to prevent looseness between the two members. Further, as shown in Fig. 15 (c), the reliability of joining is improved by filling the resin 33.
[實施例6] [Embodiment 6]
圖16是表示本發明的第6實施例之接合構造的剖面模式圖。與其他的實施例不同,設在被接合構件21的表面之具有四個直線部的多直線狀(以下稱為四直線形狀)的彈簧層24與設在被接合構件31表面之四直線形狀的彈簧層32是不機械性地嵌合,在對被接合構件21,31的各表面垂直方向分離,被接合構件21,31是藉由樹脂33來接合。 Fig. 16 is a schematic cross-sectional view showing a joined structure of a sixth embodiment of the present invention. Unlike the other embodiments, the spring layer 24 having a plurality of straight portions (hereinafter referred to as a four-linear shape) having four straight portions on the surface of the member to be joined 21 and the four straight lines provided on the surface of the member to be joined 31 are provided. The spring layer 32 is not mechanically fitted, and is vertically separated from the respective surfaces of the members to be joined 21, 31, and the joined members 21, 31 are joined by the resin 33.
在本實施例中,雖彈簧層未被嵌合,但對於圖2(a)所示之被接合部的界面剝離的模式,及圖2(c)所示之彈簧與充填樹脂的界面剝離的模式之可靠度是可提升。以樹脂來接合時,一般比起圖2(b)所示之龜裂進展於樹脂內部的模式,圖2(a)或(c)所示之界面剝離的模式的強度會更小。因此,藉由本實施例,圖2(a)或(c)的2個模式的可 靠度會提升,所以可提升樹脂之接合的可靠度。 In the present embodiment, although the spring layer is not fitted, the interface peeling of the joined portion shown in Fig. 2(a) and the interface between the spring and the filling resin shown in Fig. 2(c) are peeled off. The reliability of the mode can be improved. When joining by a resin, the mode of the interface peeling shown in Fig. 2 (a) or (c) is generally smaller than the mode in which the crack shown in Fig. 2 (b) progresses inside the resin. Therefore, with the present embodiment, the two modes of FIG. 2(a) or (c) are The reliability will increase, so the reliability of the bonding of the resin can be improved.
並且,在使用多直線狀的彈簧之下,可增加彈簧的密度,因此接合的可靠度的提升或熱阻的減低有效。並且,在本實施例是不使彈簧變形,因此只要是具有二個以上的直線部的多直線狀,便可取得同等的接合強度。 Further, under the use of a multi-linear spring, the density of the spring can be increased, so that the reliability of the joint is improved or the thermal resistance is reduced. Further, in the present embodiment, since the spring is not deformed, the same joint strength can be obtained as long as it has a multi-linear shape having two or more straight portions.
另外,可將彈簧層24及彈簧層32的任一方改變成線圈狀的彈簧層,作為本實施例的變形例。 Further, any one of the spring layer 24 and the spring layer 32 may be changed into a coil-shaped spring layer as a modification of the embodiment.
[實施例7] [Embodiment 7]
圖17是表示本發明的第7實施例之接合構造的剖面模式圖。與其他的實施例不同,在將樹脂33與平板狀的被接合構件31接合的接合構造中使用多直線狀(四直線形狀)的彈簧層。在本實施例中,彈簧層32是只配置在樹脂33與被接合構件31的表面之內,被接合構件的表面。藉此,對於圖2(a)或(c)的模式可取得高的可靠度。並且,在使用多直線狀的彈簧之下,可增加彈簧的密度,因此可靠度的提升或熱阻的減低更有效。 Fig. 17 is a schematic cross-sectional view showing a joint structure of a seventh embodiment of the present invention. Unlike the other embodiments, a multi-linear (four-linear shape) spring layer is used in the joint structure in which the resin 33 and the flat-shaped member to be joined 31 are joined. In the present embodiment, the spring layer 32 is disposed only inside the surface of the resin 33 and the member to be joined 31, and the surface of the member to be joined. Thereby, high reliability can be obtained for the mode of Fig. 2 (a) or (c). Moreover, under the use of a multi-linear spring, the density of the spring can be increased, so that the reliability is improved or the thermal resistance is reduced more effectively.
[實施例8] [Embodiment 8]
圖18是本發明的第8實施例之半導體裝置的剖面模式圖。本實施例是樹脂模製型的半導體裝置,圖1的實施例之半導體元件1,導線架3及放熱基底5的各表面會藉由密封樹脂121來被覆。與第1實施例不同,彈簧 層不僅設於絕緣層4,在導線架3與樹脂121的界面也設有線圈狀的彈簧層4d(參照圖中的擴大圖)。藉由此彈簧層4d,導線架3與密封樹脂121的界面強度會提升,可防止導線架3與密封樹脂121的剝離。 Figure 18 is a cross-sectional schematic view showing a semiconductor device according to an eighth embodiment of the present invention. This embodiment is a resin molded semiconductor device. The semiconductor element 1 of the embodiment of Fig. 1, the surface of the lead frame 3 and the heat radiation substrate 5 are covered with a sealing resin 121. Unlike the first embodiment, the spring The layer is provided not only on the insulating layer 4 but also in the coil-like spring layer 4d at the interface between the lead frame 3 and the resin 121 (see an enlarged view in the drawing). By the spring layer 4d, the interface strength between the lead frame 3 and the sealing resin 121 is increased, and peeling of the lead frame 3 and the sealing resin 121 can be prevented.
另外,本發明是不限於前述的各實施形態,亦含各式各樣的變形例。例如,前述的各實施形態是為了容易了解本發明而詳細說明者,並非限於具備說明的全部的構成者。並且,可將某實施形態的構成的一部分置換成其他實施形態的構成,且亦可在某實施形態的構成中加上其他實形態的構成。而且,可針對各實施例的構成的一部分進行其他構成的追加.削除.置換。 Further, the present invention is not limited to the above-described respective embodiments, and various modifications are also included. For example, the above-described embodiments are described in detail for easy understanding of the present invention, and are not limited to all of the constituents having the description. Further, a part of the configuration of a certain embodiment may be replaced with a configuration of another embodiment, and a configuration of another embodiment may be added to the configuration of a certain embodiment. Further, it is possible to add another configuration to a part of the configuration of each embodiment. Remove. Replacement.
例如,亦可按每個被接合構件或按接合部來使彈簧的尺寸或形狀及配置密度不同。彈簧的材料是不限於上述的氮化矽或鎳,可使用氮化鋁等的陶瓷材料或銅等的金屬材料。亦即,彈簧的尺寸,形狀,配置密度或材料是可按照接合部所具備的機械性強度,電性特性或熱性特性來適當選擇或變更。另外,被接合構件是可適用金屬,樹脂,陶瓷等,各種的固體材料。 For example, the size, shape, and arrangement density of the spring may be different for each member to be joined or by the joint portion. The material of the spring is not limited to the above-described tantalum nitride or nickel, and a ceramic material such as aluminum nitride or a metal material such as copper can be used. That is, the size, shape, arrangement density, or material of the spring can be appropriately selected or changed in accordance with the mechanical strength, electrical characteristics, or thermal characteristics of the joint portion. Further, the member to be joined is applicable to various solid materials such as metal, resin, ceramics, and the like.
並且,在圖1的半導體裝置中,藉由在導線架3之與半導體元件1的接合面設置由鎳等的焊錫浸潤性佳的金屬所構成的彈簧狀的奈米構造體,可一邊確保半導體元件1與導線架3的電氣導電性,一邊可提升接合強度。並且,半導體元件1與導線架3之間的熱阻會被減低,放熱性會提升。本構成是譬如說可將圖10的一方的 被接合構件之樹脂置換成焊錫者。 Further, in the semiconductor device of FIG. 1, a spring-like nanostructure composed of a metal having good solder wettability such as nickel is provided on the surface of the lead frame 3 and the semiconductor element 1, and the semiconductor can be secured. The electrical conductivity of the component 1 and the lead frame 3 improves the bonding strength. Further, the thermal resistance between the semiconductor element 1 and the lead frame 3 is reduced, and the heat dissipation property is improved. This configuration is, for example, one of the ones of FIG. The resin of the member to be joined is replaced with a solder.
1‧‧‧半導體元件 1‧‧‧Semiconductor components
2‧‧‧焊錫 2‧‧‧Solder
3‧‧‧導線架 3‧‧‧ lead frame
4‧‧‧絕緣層 4‧‧‧Insulation
4a,4b,4d‧‧‧彈簧層 4a, 4b, 4d‧‧‧ spring layer
4c‧‧‧樹脂 4c‧‧‧Resin
5‧‧‧放熱基底 5‧‧‧Exothermic substrate
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DE102004048201B4 (en) * | 2004-09-30 | 2009-05-20 | Infineon Technologies Ag | Semiconductor component with a bonding agent layer, and method for its production |
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