TW201515725A - Cleaning device of substrate end face - Google Patents

Abstract

A cleaning device (1) has: a guiding unit (21) comprising a guiding part (27), whose front (22) having a trench (24) formed thereon for the end face (5a) of the substrate (5) to pass through; and a brush (50) whose position of front end (51) is controlled by the back face (23) of guiding part (27). The trench (24) comprises an opening (25) penetrating the guiding part (27), and the front end (51) of brush (50) contacts with the end face (5a) of substrate (5) passing the trench (24) through the opening (25). The guiding unit (21) comprises: a recess part (70) which accepts at least the front end (51) of brush (50); a sucking opening (73) to suck dusts from the recess part (70).

Description

Substrate end face cleaning device

The present invention relates to an apparatus for cleaning an end face of a substrate.

Japanese Laid-Open Patent Publication No. 2010-207687 discloses an apparatus capable of removing dust from both sides of a substrate in a shorter time than in the past. The apparatus of the patent document 1 has the conveyance means which carries out a board|substrate conveyance, and the pair of rotating brush roll which arrange|positions up the board|substrate which carried out by the carrying- The transporting means includes a first conveyor belt for transporting the substrate, and is disposed on the upstream side of the pair of rotating brush rollers, and a second conveyor belt for transporting the substrate, and is disposed on the downstream side of the pair of rotating brush rollers. . The first conveyor belt and the second conveyor belt are arranged such that a pair of rotating brush rollers are interposed therebetween so as to be in contact with the substrate.

[Advanced technical literature] [Patent Literature] [Patent Document 1]

Japanese Patent Open Gazette 2010-207687

The device described in the cited document 1 is suitable for cleaning the front and back surfaces of the substrate. A device that is required to clean the end faces of the front and back surfaces of the substrate.

According to an aspect of the present invention, a cleaning apparatus includes: a guiding unit including a guiding portion having a groove for receiving an end surface of the substrate at a front surface; and a brush having a front end position controlled by a rear surface of the guiding portion, The groove includes an opening penetrating the guide portion, and the tip end of the brush is in contact with the end surface of the substrate passing through the groove via the opening. The position of the front end is a brush controlled by the rear of the guiding portion, and the end surface of the substrate passing through the groove can be cleaned through an opening formed in the groove. Therefore, it is possible to remove unnecessary substances such as dust from the end surface of the substrate by the brush while the substrate end surface is supported by the groove and while supporting the circuit or the circuit element mounted on the surface or the back surface of the substrate.

Preferably, the guiding unit includes a concave portion that accommodates at least a front end of the brush, and a suction port that attracts dust from the concave portion. The concave portion can be used to suppress the diffusion of dust removed by the brush, and the dust from the suction port can be recovered or removed.

More preferably, the guiding unit includes a groove that engages the suction opening behind the guiding portion in the recess. Dust or the like reaching the tip end of the brush can be recovered or removed from the suction port through the groove on the back surface. Therefore, it is possible to suppress dust from adhering to the substrate again.

The brush can be rotated, front, back, up and down, left and right. The axis of rotation may be parallel to the rear of the guide. The brush including the rotation axis perpendicular to the rear surface of the guide portion contacts the end surface of the substrate passing through the groove of the guide portion from the upper and lower sides, so that the end surface of the substrate can be efficiently cleaned. a rotating brush parallel to the rear or front of the guide, controlled by controlling the position of the rotary shaft The position of the front end of the brush. In contrast, the rotating shaft and the rear of the guiding portion are vertical brushes, and the position of the rotating shaft cannot be controlled, and it is difficult to control the position of the front end of the brush. In this device, the position of the front end of the brush can be controlled by abutting against and holding the rear of the guide. Moreover, even if the front end of the brush is worn out due to cleaning, the position of the front end of the brush can be controlled based on the rear of the guide portion. Therefore, the front end of the brush can be stably brought into contact with the end surface of the substrate passing through the groove of the guide portion, and a stable cleaning effect can be obtained.

Preferably, the guide unit includes a support portion that protrudes from the substrate end surface of the guide portion through the groove toward the rotation axis direction. The position of the rotating brush can be controlled more stably. A typical rotating brush has a rotating round brush.

Preferably, the cleaning device further includes: a unit that presses the brush toward the rear of the guiding portion; and a unit that fixes the position of the brush in a state where the leading end of the brush is deviated from the rear of the guiding portion. When it is necessary to clean the end surface of the substrate, by pressing the brush toward the rear of the guide portion, the position of the front end of the brush can be controlled by the rear surface of the guide portion. Further, when the end surface of the substrate is not cleaned, the fixed unit can be retracted in a state where the brush does not come into contact with the end surface of the substrate.

The cleaning device can be a substrate cleaning device or an end surface cleaning device. Preferably, the cleaning device has: a plurality of guiding units arranged in such a manner that the groove of the surface passes oppositely at the end faces of the substrate; and the plurality of brushes are guided by the plurality of guiding units at the position of the front end Configured in the manner controlled by the back of the department. Furthermore, it is preferable that the cleaning device has means for transporting the substrate so that the both ends of the substrate can pass through the grooves on the front surface of the plurality of guiding portions of the guiding unit. It is possible to simultaneously clean both ends while transporting the substrate.

2‧‧‧ surface

3‧‧‧ below (back)

5‧‧‧Substrate (printed wiring board)

5a, 5b‧‧‧ end face

9‧‧‧Transportation path (moving path, moving path, access)

10‧‧‧ cleaning device (substrate cleaning device)

11‧‧‧Shell

12‧‧‧ Input埠

13‧‧‧ Output埠

20‧‧‧End face cleaning device

21‧‧‧Guiding block (guiding unit)

21a‧‧‧lower block

21b‧‧‧ upper block

22‧‧‧ front

22a‧‧‧ front (surface)

23‧‧‧Back (back)

24‧‧‧ditch

25‧‧‧ openings

24b, 24c‧‧‧ both ends

24a‧‧ Center

24f‧‧‧flat part

27‧‧‧ Guidance Department

28a‧‧‧Upper

28b‧‧‧Bottom

29a, 29b‧‧‧ Guide wall

30‧‧‧Double cleaning device

31, 32‧‧‧ cleaning roller

33‧‧‧Conveyor belt

40‧‧‧Substrate transport unit (conveyor unit)

41a, 41b, 42a, 42b‧‧ ‧ rolls

44‧‧‧Motor

45‧‧‧Drive belt

50‧‧‧ brush

51‧‧‧ front end

52‧‧‧ central part

55‧‧‧Center axis (rotary axis)

56‧‧‧Motor

61‧‧‧Gongpu (vacuum pump)

62‧‧‧ suction hose

65‧‧‧ boards

66‧‧‧Connecting mechanism

70‧‧‧ recess

71‧‧‧Protrusion

73‧‧‧Attraction hole

74‧‧‧ditch

75‧‧‧ recess

79‧‧‧through holes

80‧‧‧support board

82‧‧‧Spring (pressurizing unit)

85‧‧‧Retraction unit

85a‧‧ sales

85b‧‧‧ Protrusion

H1‧‧‧Width (height)

W1‧‧‧Width

W2‧‧‧ length (distance)

W3‧‧ depth

Fig. 1 is a view showing a schematic configuration of a substrate cleaning device.

Fig. 2 is a cross-sectional view showing the structure of the guide block and the brush in the vicinity of the brush of the end face cleaning device. Fig. 2(a) is IIa of Fig. 1, Fig. 2(b) is a sectional view of IIb of Fig. 1, Fig. 2 (Fig. 2) c) is a sectional view of IIa of Fig. 1 showing the state in which the brush is retracted to the rear.

Fig. 3 is a top view showing the configuration of the passage along the substrate of the end face cleaning device.

Fig. 4 is a perspective view showing a schematic configuration of a lower block of the guide block.

Fig. 5 is a view showing a configuration of a lower block, Fig. 5(a) is a front view, Fig. 5(b) is a horizontal sectional view, Fig. 5(c) is a rear view, and Fig. 5(d) is a side view Fig. 5(e) is a longitudinal sectional view, and Fig. 5(f) is a longitudinal sectional view at an off-center position.

Fig. 6 is a cross-sectional view showing a state in which a brush is set at a guiding portion of a guiding unit to perform end surface cleaning of the substrate, and Fig. 6(a) shows a state in which a brush is set in a concave portion of the guiding portion, Fig. 6 (Fig. 6 b) shows the front end of the brush set in the recess, and Fig. 6(c) shows the aspect in which the end face of the substrate is cleaned.

Fig. 7 is a view showing an example of different brushes. Fig. 7(a) shows a front end of the brush attached to the main body, and Fig. 7(b) shows the front end of the brush embedded in the main body.

FIG. 1 shows a schematic configuration of a substrate cleaning device 10. This substrate The cleaning device 10 is a device that can be installed in the middle of the route for transporting the substrate 5, and can clean both end faces of the front and back surfaces of the substrate (printed wiring board) 5 being conveyed. The substrate cleaning device 10 includes a casing 11 , an end surface cleaning device 20 disposed inside the casing 11 , and a double-sided cleaning device 30 . The substrate 5 is discharged from the output port 13 from the input port 12 of the casing 11 through the end face cleaning device 20 and the double-sided cleaning device 30. The double-sided cleaning device 30 includes cleaning rollers 31 and 32 for cleaning the surface 2 and the lower surface (back surface) 3 of the substrate 5, respectively, and a conveying belt 33 for conveying the substrate 5.

The end face cleaning device (end face cleaner) 20 includes: a guiding block (guide unit) 21 that supports and guides near an end surface 5a of the substrate 5; the conveyor belt unit 40 with the end surface 5a along the guiding block 21 moves the way to boot. The guide block 21 is formed with a groove 24 through which the end surface 5a of the substrate 5 passes, in front (surface) 22. The end face cleaning device 20 further has a brush 50 that controls the position of the front end 51 by the guide block 21. The groove 24 includes an opening 25 through which the guide block 21 is opened, and the front end 51 of the brush 50 is in contact with the end surface 5a of the substrate 5 passing through the groove 24 via the opening 25 to clean the end surface 5a.

The conveyor belt unit 40 includes rollers 41a and 41b, 42a and 42b which are moved in such a manner as to cover the ends of the substrate 5 before and after the grooves 24, and the motors 44 for driving the rollers 41a to 42b. ; and drive belt 45. The position of the motor 44 and the arrangement of the drive belt 45 are various, and are not limited to this example. The guide block 21 includes a lower block 21a including lower rollers 41b and 42b and a groove 24, and an upper block 21b for supporting the upper rollers 41a and 42a.

The end face cleaning device 20 further includes a pump (vacuum pump) 61 for sucking dust removed from the substrate 5 by the brush 50 from the guiding block 21. Introduced and removed; and suction hose 62.

2 is an enlarged cross-sectional view showing the configuration of the guide block 21 of the end face cleaning device 20 and the vicinity of the brush 50. Figure 3 shows the construction of the end face cleaning device 20 along the path of the substrate 5 in a top view. In the end face cleaning device 20, the pair of guide blocks 21 are disposed oppositely (opposite), and the end faces 5a and 5b of the substrate 5 passing through the conveyance path are cleaned, and each of the guide blocks 21 is provided with a cleaning brush 50. . The end face cleaning device 20 further includes a plate 65 for supporting the guide blocks 21 and the brush 50, and a connecting mechanism 66 for appropriately adjusting the distance between the plates 65. Since the left and right configurations of the end face cleaning device 20 are common, the specific configuration is mainly described mainly on the guide block 21 shown on the left side.

The end face cleaning device 20 comprises: a guiding block 21 disposed on the plate (the tray) 65; a brush 50 mounted on the guiding block 21; a motor 56 for rotating the brush 50; and a supporting plate 80 for supporting the motor 56 and brush 50; a spring (pressurizing unit) 82 that pressurizes the brush 50 in the direction of the guide block 21 by the support plate 80; and a retracting unit 85 that fixes the support plate 80 at a position deviated from the guide block 21. The pressurizing unit 82 is not limited to a spring, and may be another pressurizing mechanism such as a mechanism for imparting an elastic force or an air cylinder.

As shown in FIGS. 2(a), (b) and 3, the substrate transport unit (conveyor unit) 40 including the rollers 41a and 41b, 42a and 42b is used to transport the substrate 5 to the end surface cleaning device 20. The (removed path, the moving path, the path) 9 is transported, and both end faces 5a and 5b of the substrate 5 to be transported pass through the groove 24 provided on the front surface 22 of the guide block 21 on both sides. A brush 50 is inserted on the back side of the guide block 21, and is rotated about the central axis (rotation axis) 55 in a state where the support plate 80 is pressed by the spring 82 in the direction of the groove 24. Ditch 24 series includes The opening 25 of the front wall of the guide block 21, the front end 51 of the brush 50 projecting from the opening 25 toward the substrate 5, touches both end faces 5a and 5b while rotating, to clean both end faces 5a and 5b of the substrate 5.

As shown in FIG. 2(c), when the end faces 5a and 5b are not cleaned, the brush 50 is retracted to the rear of the guide block 21 by the support plate 80 by the retracting unit 85. The retracting unit 85 includes a pin 85a provided on the side of the support plate 80 and a projection 85b provided on the side of the dial plate 65, and a projection of the pin 85a at a position deviated from the guide block 21 above the dial plate 65 At 85b, the support plate 80 can be fixed at a position deviated from the guide block 21. The brush 50 can be exchanged in a state where the support plate 80 is separated from the guide block 21, or the type of the brush 50 can be exchanged depending on the type of the substrate 5 or the state of the substrate.

The lower block 21a of the 4-series extraction guide block 21 shows a schematic configuration in an oblique view. Figure 5 (a) is a front view of the lower block 21a, Figure 5 (b) is a horizontal cross-sectional view, Figure 5 (c) is a rear view, Figure 5 (d) is a side view, Figure 5 (e) is a portrait The cross-sectional view, and Fig. 5(f), is a longitudinal cross-sectional view at a position offset from the center.

The lower block 21a is a block of a convex shape as a whole, and a central portion of the front surface (surface) 22 serves as a guide portion 27 of the substrate 5 that protrudes in the direction (front) of the passage 9. The guide portion 27 includes guide walls 29a and 29b that protrude in such a manner as to surround the passage 9. The upper end 28a of the lower guide wall 29a and the lower end 28b of the upper guide wall 29b are symmetrically shaped by the passage 9 through which the substrate 5 is passed, with the upper end 28a and the lower end 28b in front of the guide portion 27 ( The surface 22a forms a groove 24 through which the end (end surface) 5a of the substrate 5 passes. The groove 24 is such that both ends 24b and 24c are wider in the up and down direction than the center 24a, and are formed along the center 24a. The flat portion 24f extends in the direction of the passage 9.

The width (height) h1 of the center 24a of the groove 24 is preferably about 2 to 6 mm, more preferably about 2 to 4 mm. Further, the length of the flat portion 24f of the center portion is preferably about 10 to 30 mm, more preferably about 15 to 25 mm. Further, the opening angles of the both ends 24b and 24c and the flat portion 24f of the center portion are preferably 30 to 80 degrees, more preferably 40 to 70 degrees.

The upper guide wall 29b and the lower guide wall 29a are connected by a projection 71 projecting from the central portion of the groove 24 toward the rear (back surface, rear surface) 23 of the guide portion 27. The guide walls 29a and 29b of this example are protruded from the front surface 22 of the lower block 21a and are integrated with the lower block 21a. The upper guide wall 29b and the lower guide wall 29a are means for providing a plate integrally formed by the projections 71 projecting toward the back side as a guide portion 27, and may be attached to the guide block 21.

The guide portion 27 of the lower block 21a, that is, the back side (rear side) of the guide walls 29a and 29b is a cylindrical recess 70 in which the front end 51 of the cleaning brush 50 abuts against the bottom surface of the recess 70. That is, the brush 50 is accommodated in such a manner that the rear surface 23 of the guide portion 27 is formed. The groove 24 formed by the guide walls 29a and 29b includes an opening 25 that penetrates the guide portion 27 and opens toward the recess 70. The front end 51 of the brush 50 protrudes from the opening 25 toward the inside of the groove 24 and is in contact with the end surface 5a of the substrate 5 passing through the groove 24 to be cleaned. The opening 25 of the guide portion 27 is provided in the same shape as the groove 24 in the inside of the cylindrical recess 70 except for the projection 71 at the center of the groove 24.

Specifically, the front surface 22a of the guide walls 29a and 29b of the guide portion 27 in the front surface 22 of the lower block 21a is a groove through which the substrate 5 passes. The top of 24. On the other hand, the surface 22b of the other portion among the surfaces 22 of the lower block 21a is a surface corresponding to the lower surface (bottom surface) of the groove 24. The rear surface 23 of the guide walls 29a and 29b, which abuts the front end 51 of the brush 50 and controls the position of the front end 51, is fastened to the side of the passage 9 which is closer to the base plate than the front surface 22b which is the bottom surface of the groove 24. The front end 51 of the brush 50 protrudes from the bottom surface 22b of the groove 24 toward the side of the passage 9. Therefore, the front end 51 of the brush 50 is cleaned against the end surface 5a of the substrate 5 passing through the groove 24 while being controlled at the position of the rear surface 23 of the guide walls 29a and 29b of the guide portion 27, thereby cleaning the end surface 5a. In this example, the guide portion 27 is protruded forward with respect to other portions of the lower block 21a to form the groove 24, but the shape and formation method of the groove 24 are not limited thereto. The groove 24 may be formed in front of the lower block 21a, and the lower block 21a may be formed only by the guide portion 27.

The width of the groove 24 (the distance between the upper surface 22a and the lower surface 22b) W1 is preferably about 1 to 5 mm, more preferably about 2 to 4 mm. The distance W2 between the back surface 23 of the guide walls 29a and 29b and the lower surface 22b of the groove is preferably about 0.5 to 2 mm, more preferably about 0.5 to 1.5 mm.

The lower block 21a further includes a suction hole 73 formed in a lower surface of the recess 70. The suction hole 73 is connected to the suction hose 62, and the dust carried by the brush 50 into the concave portion 70 is discharged to the outside. In the present example, the suction hole 73 extends from the side of the rear surface 23 of the recess 70 to the lower side. The brush 50 is rotated in a direction in which the substrate 5 entering the groove 24 is pressed downward, and the tip end of the substrate 5 is prevented from being swayed inside the groove 24. Therefore, the dust picked up by the brush 50 is first discharged to the lower side and discharged through the suction hole 73. Therefore, it is possible to suppress the dust from adhering to the substrate 5 again.

The lower block 21a further includes a groove 74 for discharge which extends to the rear (back surface) 23 of the guide portion 27 which is the bottom surface of the cylindrical recess 70. The radial direction is connected to the suction hole 73, and the depth is about 0.5 to 2 mm. The distal end 51 of the brush 50 rotates while abutting against the rear surface 23 of the guide portion 27, and when reaching the discharge groove 74, the distal end 51 is unconstrained in the discharge groove 74 and reaches the front end. The dust of 51 is discharged to the groove 74 for discharge. In the end face cleaning, the strong and flexible brush 50 is used. Therefore, when the current end 51 is in the state of being pressed against the rear face 23, the dust is easily released when the discharge groove 74 is unconstrained, and then the drain is discharged. 74 is attracted and easily becomes a negative pressure, so the dust that is released is directly recovered.

The lower block 21a further includes a recess 75 which is widened up and down along the opening 25 of the surface 23 after the bottom surface of the cylindrical recess 70, and has a depth W3 of about 0.5 to 2 mm. The distal end 51 of the brush 50 rotates while abutting against the rear surface 23 of the guiding portion 27, and when reaching the recess 75, the distal end 51 is unconstrained, and the distal end 51 protrudes from the opening 25 of the through guiding portion 27 toward the side of the substrate 5. . Therefore, the tip end 51 of the brush 50 is in a state of projecting (extending) substantially perpendicularly to the end surface 5a of the substrate 5, and it is easy to remove dust from the substrate 5. Further, the front end 51 of the brush 50 is rotated in a state where it does not abut against the guide portion 27 or is not easily abutted before and after the opening 25. Therefore, it is difficult for the dust reaching the tip end 51 of the brush 50 to adhere again, and it is easy to collect the dust picked up by the brush 50.

The lower block 21a further includes a through hole 79 that supports the lower rollers 41b and 42b and is inserted into a shaft (not shown) to be driven from the back side of the lower block 21a.

The brush 50 attached to the cylindrical recess 70 of the lower block 21a is a rotating circular brush as shown in Fig. 4, and the rotating shaft 55 is disposed perpendicular to the bottom surface of the recess 70, that is, the rear surface 23 of the guiding portion 27. . The front end 51 of the brush 50 is It is composed of a myriad of wool made of a resin such as nylon or acrylic, and is integrally wound into a cylindrical shape. The center portion 52 of the front end 51 is hollow, and the center portion 52 is aligned with the projection 71 projecting rearward from the bottom surface (back surface) 23 of the recess portion 70 to form a support portion in which the projection 71 extends in the direction of the rotation shaft 55 of the brush 50. . Therefore, the brush 50 is rotated inside the recess 70 in a more stable state.

In this example, the projection 71 is provided at a position corresponding to the central portion of the groove 24 through which the substrate 5 passes, and the brush 50 is rotated about the end portion 5a of the substrate 5. Therefore, the front end 51 of the brush 50 is opposed to the end portion 5a of the substrate 5 at the opening 25 on the introduction side of the groove 24 and the opening 25 on the discharge side, and the end portion 5a of the substrate 5 is cleaned from both the upper and lower sides. As described above, in order to suppress the turbulence of the tip end of the substrate 5, it is preferable to rotate the brush 50 such that the tip end 51 of the brush 50 abuts against the substrate 5 from the top to the bottom in the opening 25 in the introduction direction. Therefore, the front end 51 of the brush 50 is rotated in such a manner that the opening 25 on the discharge side of the substrate 5 abuts against the end portion 5a from bottom to top. The rotating shaft 55 of the brush 50 can also be offset from the center of the groove 24 toward the front and rear and up and down.

Fig. 6 is an enlarged view showing a state in which the guide portion 27 of the guide unit 21 sets the brush 50 to clean the end surface 5a of the substrate 5. As shown in Fig. 6(a), a groove 24 through which the end surface 5a of the substrate 5 passes is provided in the front surface 22a of the guide portion 27, and a cylindrical shape for accommodating the front end 51 of the brush 50 is provided at the rear of the guide portion 27. The recess 70. As shown in FIG. 6(b), when the front end 51 of the brush 50 is set in the recess 70, the front end 51 abuts against the rear wall (rear surface) 23 of the guide portion 27, and the front end 51 is controlled at the position of the front end 51. In the state, it protrudes toward the groove 24. As shown in FIG. 6(c), the brush 50 is rotated to clean the end surface 5a of the substrate 5 passing through the groove 24.

The brush 50 is pressed against the rear wall 23 by the spring 82 to be cleaned, and even if the front end 51 changes in the length of the brush 50 due to wear, a certain amount of pushing can be maintained. Therefore, the position of the brush 50 is controlled such that the worn front end 51 can abut against the rear wall 23, and the front end 51 of the brush 50 is always rotated in a state of protruding toward the inside of the groove 24 by a predetermined length, and the end surface 5a of the substrate 5 is subjected to the end surface 5a. clean.

The front end 51 of the brush 50 abuts against the rear wall 23 of the guide portion 27 to accurately control the position. Therefore, the amount (length) of the tip end 51 protruding toward the groove 24 can be accurately controlled, and the position of the tip end 51 can be mechanically determined, so that the length and position of the front end 51 of the brush 50 in contact with the substrate 5 are extremely high and reliable. high. Therefore, even if the brush 50 having a slightly hard bristles is used, there is almost no possibility of damage to the substrate 5 and damage to circuits or circuit components on the substrate 5. Further, since the position of the distal end 51 is controlled such that the distal end 51 abuts against the rear wall 23 by using the slightly stiffer brush 50, the positional accuracy of the distal end 51 is improved. Therefore, in the end face cleaning device 20, not only dust but also a rough brush 50 can be used to remove the burrs caused by the cutting of the substrate or the like.

Further, the recess 70 is provided with a projection 71 projecting rearward from the center of the rear surface 23, that is, the groove 24. The central portion (center portion) 52 of the round brush 50 is inserted into the projection 71 as a recess. Therefore, the front end 51 of the brush 50 is rotated while being guided by the projection 71. Therefore, the brush 50 is stably rotated including the distal end 51 around the rotation shaft 55. Therefore, the possibility of damage on the substrate 5 can be further reduced.

Further, a recess 75 having a depth W3 is provided on the upper and lower sides of the opening 25 of the rear face 23, so that the front end (hair point) 51 is unconstrained and abuts against the substrate in an upright state. End face 5a of 5. Therefore, the front end 51 can be cleaned so that the end face 5a is cleaned, and the dust removal efficiency can be improved. The depth W3 of the pocket 75 is preferably equal to the length W2 at which the tip end 51 protrudes toward the groove 24.

A suction groove (discharge groove) 74 and a suction hole 73 that is coupled to the suction groove 74 are provided in the recessed portion 70 of the front end 51 of the accommodating brush 50. Therefore, the dust picked up by the brush 50 is discharged from the concave portion 70 by the suction means, and the adhesion to the substrate 5 can be suppressed again. Further, even if the dust adheres again to the front surface 2 or the back surface 3 of the substrate 5, it can be removed by the double-sided cleaning device 30 disposed downstream of the end surface cleaning device 20. Therefore, it is preferable that the end face cleaning device 20 is disposed upstream of the double-sided cleaning device 30.

FIG. 7 shows an example of several different brushes 50 that can be mounted on the end face cleaning device 20. The brush 50 may be such that the front end (bristle portion) 51 is then fixed to the main body 53 as shown in Fig. 7(a), or the front end 51 may be embedded in the main body 53 as shown in Fig. 7(b). The material of the front end 51 may be a hard material such as a metal wire brush, or a soft object such as a bristles or a cloth. The exchange system of the brush 50 can be easily performed in a state where the brush 50 is retracted as shown in Fig. 2(c). Further, the end face cleaning device 20 having brushes having different strengths or hardnesses may be alternately arranged in the conveying direction of the substrate 5 to clean the end faces of the substrates.

As described above, the substrate cleaning apparatus 10 includes the end surface cleaning device 20 upstream of the double-sided cleaning device 30 that cleans both sides of the substrate 5 being conveyed. Therefore, the dust on both sides and both end faces (side faces) 5a and 5b of the substrate 5 can be removed while the substrate 5 is conveyed.

In addition, the above description is taken as an example of the end surface cleaning device 20 built in the substrate cleaning device 10, and the end surface cleaning device 20 is guided by the guiding block 21 The center unitizes a transport unit including a plurality of rollers, a brush 50, and the like, and is also easily attached to an existing device such as a conveyor belt that performs substrate transport.

2‧‧‧ surface

3‧‧‧ below (back)

5‧‧‧Substrate (printed wiring board)

5a‧‧‧ end face

9‧‧‧Transportation path (moving path, moving path, access)

10‧‧‧ cleaning device (substrate cleaning device)

11‧‧‧Shell

12‧‧‧ Input埠

13‧‧‧ Output埠

20‧‧‧End face cleaning device

21‧‧‧Guiding block (guiding unit)

21a‧‧‧lower block

21b‧‧‧ upper block

22‧‧‧ front

24‧‧‧ditch

25‧‧‧ openings

30‧‧‧Double cleaning device

31, 32‧‧‧ cleaning roller

33‧‧‧Conveyor belt

40‧‧‧Substrate transport unit (conveyor unit)

41a, 41b, 42a, 42b‧‧ ‧ rolls

44‧‧‧Motor

45‧‧‧Drive belt

50‧‧‧ brush

51‧‧‧ front end

61‧‧‧Gongpu (vacuum pump)

62‧‧‧ suction hose

Claims (9)

A cleaning device includes: a guiding unit including a guiding portion formed with a groove through which an end surface of the substrate passes; and a brush whose front end is controlled by a rear surface of the guiding portion, wherein the groove includes a through hole In the opening of the guiding portion, the front end of the brush is in contact with the end surface of the substrate passing through the groove via the opening. The cleaning device of claim 1, wherein the guiding unit comprises: a concave portion that accommodates at least a front end of the brush; and a suction port that sucks dust from the concave portion. The cleaning device of claim 2, wherein the guiding unit comprises a groove that is coupled to the suction opening behind the guiding portion in the recess. The cleaning device of claim 1, wherein the brush comprises a rotating shaft that is perpendicular to a rear surface of the guiding portion. The cleaning device according to claim 4, wherein the guiding unit includes a supporting portion that protrudes from the groove through which the substrate end surface of the guiding portion passes in the direction of the rotation axis. The cleaning device of claim 4, wherein the brush system rotates the round brush. A cleaning device according to claim 1, comprising: a unit for pressing the brush toward a rear surface of the guiding portion; and a unit for fixing a position of the brush in a state where a front end of the brush is deviated from a rear surface of the guiding portion . The cleaning device according to any one of claims 1 to 7, further comprising: a plurality of the guiding units, wherein the front groove is disposed in a direction opposite to a position at which both end faces of the substrate pass; and a plurality of the aforementioned brushes, The position of the front end is arranged in such a manner as to be controlled by the rear of the aforementioned guiding portions of the plurality of guiding units. A cleaning device according to claim 8, further comprising: means for transporting the substrate so that both ends of the substrate can pass through the front grooves of the plurality of guiding units.