TW201510233A - Treated surface aluminum material and manufacturing method therefor - Google Patents

Treated surface aluminum material and manufacturing method therefor Download PDF

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TW201510233A
TW201510233A TW103125145A TW103125145A TW201510233A TW 201510233 A TW201510233 A TW 201510233A TW 103125145 A TW103125145 A TW 103125145A TW 103125145 A TW103125145 A TW 103125145A TW 201510233 A TW201510233 A TW 201510233A
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oxide film
aluminum
porous
electrode
corrosion
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TW103125145A
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TWI656223B (en
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Tatsuya Mimura
Shinichi Hasegawa
Yukio Honkawa
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Uacj Corp
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005Apparatus specially adapted for electrolytic conversion coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/024Anodisation under pulsed or modulated current or potential
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007Current directing devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • H05K1/053Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an inorganic insulating layer

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

To provide a treated surface aluminum material, on a portion of the surface of which a corrosion-resistant oxide film layer is formed and on the other areas of the surface of which a porous oxide film layer of excellent adhesiveness and closeness of adhesion is formed. A treated surface aluminum material and a manufacturing method therefor. The treated surface aluminum material comprises an aluminum material, a monolayer structure corrosion resistant oxide film formed on a portion of the surface of the aluminum material, and a porous oxide film formed on the other areas of the surface. The corrosion resistant oxide film has a 10- 100 nm thickness and has specified FT-IR analysis characteristics. The porous oxide film is obtained from a 20-500 nm thick porous aluminum oxide film layer formed on the surface side and 3-30 nm barrier aluminum oxide film layer formed on the base side. Pores of 5-30 nm diameter are formed in the porous aluminum oxide film layer. The range of fluctuation in thickness in the overall porous oxide film formed on the surface of the aluminum material is within +-50% of the arithmetic mean thereof.

Description

表面處理鋁材及其製造方法 Surface treated aluminum material and method of manufacturing same 發明領域 Field of invention

本發明係有關於一種施有表面處理之純鋁材或鋁合金材(以下表記為「鋁材」)及其製造方法,詳細而言係有關於一種下述表面處理鋁材及其製造方法,該表面處理鋁材在表面的一部分形成有耐蝕性佳的耐蝕性氧化皮膜層,且在未形成有該耐蝕性氧化皮膜層之表面的部位形成有接著性及密著性優異的多孔性氧化皮膜層。 The present invention relates to a surface-treated pure aluminum material or aluminum alloy material (hereinafter referred to as "aluminum material") and a method for producing the same, and more particularly to a surface-treated aluminum material and a method for producing the same, In the surface-treated aluminum material, a corrosion-resistant oxide film layer having excellent corrosion resistance is formed on a part of the surface, and a porous oxide film excellent in adhesion and adhesion is formed in a portion where the surface of the corrosion-resistant oxide film layer is not formed. Floor.

發明背景 Background of the invention

鋁材相當輕量且具有適度的機械特性,並且具有卓越的美感、成形加工性、耐蝕性等特徵,因此可廣泛使用於各種容器類、結構材、機械零件、電子零件等。藉由對該等鋁材之一部分施行表面處理,可附加及提升耐蝕性、耐磨耗性、樹脂密著性、接著性、親水性、撥水性、抗菌性、創意性、紅外線放射性、高反射性等機能,而多備受利用。 Aluminium is quite lightweight and has moderate mechanical properties, and has excellent aesthetics, formability, and corrosion resistance. It can be widely used in various containers, structural materials, mechanical parts, electronic parts, and the like. By surface treatment of one of the aluminum materials, corrosion resistance, wear resistance, resin adhesion, adhesion, hydrophilicity, water repellency, antibacterial property, creativity, infrared radiation, high reflection can be added and improved. Sexuality and other functions.

例如,作為提升耐蝕性及耐磨耗性之表面處理法,常廣泛使用陽極氧化處理(所謂的鋁陽極氧化處理)。具體上,如非專利文獻1、2中記載係將鋁材浸漬於酸性電解 浴,以直流電流進行電解處理而形成陽極氧化皮膜,並因應用途提出了各種處理方法。 For example, as a surface treatment method for improving corrosion resistance and wear resistance, anodizing treatment (so-called aluminum anodizing treatment) is often widely used. Specifically, as described in Non-Patent Documents 1 and 2, aluminum is immersed in acidic electrolysis. The bath is subjected to electrolytic treatment with a direct current to form an anodized film, and various treatment methods are proposed depending on the application.

又,尤其使樹脂密著性提升之表面處理法則如專利文獻1中提出一種鹼交流電解法。即,使用浴溫35~85℃之鹼性溶液,在電流密度4~50A/dm2下電量超過80C/dm2之時間,進行交流電解處理。藉此獲得形成有膜厚500~5000Å之氧化皮膜的印刷接線用基板。 Further, in particular, a surface treatment method for improving resin adhesion is disclosed in Patent Document 1 as an alkali exchange electrolysis method. That is, an alkaline solution having a bath temperature of 35 to 85 ° C is used, and an AC electrolytic treatment is performed at a current density of 4 to 50 A/dm 2 for a time when the amount of electricity exceeds 80 C/dm 2 . Thereby, a substrate for a printed wiring in which an oxide film having a film thickness of 500 to 5,000 Å is formed is obtained.

先前技術文獻 Prior technical literature 非專利文獻 Non-patent literature

非專利文獻1:鋁指南第7版、179~190頁、2007年、一般社團法人日本鋁協會 Non-Patent Document 1: Aluminum Guide, 7th Edition, 179~190 pages, 2007, General Association of Japan Aluminum Association

非專利文獻2:日本工業規格JIS H8601、「鋁及鋁合金之陽極氧化皮膜」(1999) Non-Patent Document 2: Japanese Industrial Standard JIS H8601, "Anodized Film of Aluminum and Aluminum Alloys" (1999)

專利文獻 Patent literature

專利文獻1:特開平5-191001號公報 Patent Document 1: Japanese Patent Publication No. 5-191001

發明概要 Summary of invention

如上述習知技術中,從直接接線於鋁材進行電解處理,可使鋁材本身成為電極。因此,表面處理係對鋁材觸及電解溶液的區域整體施行。 As in the above-mentioned prior art, the aluminum material itself can be made into an electrode by direct wiring to an aluminum material for electrolytic treatment. Therefore, the surface treatment is performed on the entire area where the aluminum material touches the electrolytic solution.

於鋁材的一部分施行賦予樹脂密著性的表面處理時,會以遮罩膠帶等被覆未施行處理的表面部分。而於未被被覆的部分因會被施行表面處理,因此可提升樹脂密 著性。然而,由於在表面處理後除去了被覆的部分未施有表面處理,故該部分則如預設未被賦予樹脂密著性,而有未獲得耐蝕性之問題。 When a surface treatment for imparting resin adhesion is applied to a part of the aluminum material, the surface portion which is not subjected to the treatment is covered with a mask tape or the like. The uncoated part will be surface treated, thus enhancing the resin density. Sexuality. However, since the portion where the coating is removed after the surface treatment is not subjected to the surface treatment, the portion is not imparted with resin adhesion as it is, and there is a problem that corrosion resistance is not obtained.

此時,對鋁材表面的一部分施行提升樹脂密著性之表面處理後,必須對未施行表面處理的部分進行賦予耐蝕性的表面處理。爰此,便需再度被覆已施行提升樹脂密著性的表面處理之部分,進行第2次的表面處理。所以,進行2次被覆不僅招致成本高漲,又具有另外需要進行第2次表面處理的步驟而降低生產性之問題。 At this time, after performing a surface treatment for improving the adhesion of the resin to a part of the surface of the aluminum material, it is necessary to perform a surface treatment for imparting corrosion resistance to the portion not subjected to the surface treatment. In this case, it is necessary to re-cover the portion of the surface treatment which has been subjected to the improvement of the resin adhesion, and perform the second surface treatment. Therefore, the two-time coating not only causes an increase in cost, but also has a problem that the second surface treatment is required to reduce the productivity.

本發明人等為解決上述課題而重複研討的結果發現一種僅於特定部分形成耐蝕性氧化皮膜且於未使其形成耐蝕性氧化皮膜之部分則形成有具密著性之多孔性氧化皮膜的表面處理鋁材,以及同時形成該等耐蝕性氧化皮膜與多孔性氧化皮膜的表面處理鋁材之製造方法,而達至完成本發明。 As a result of intensive studies to solve the above problems, the present inventors have found that a surface in which a corrosion-resistant oxide film is formed only in a specific portion and a porous oxide film is formed in a portion where a corrosion-resistant oxide film is not formed is formed. The present invention has been accomplished by a method of producing an aluminum material and a surface-treated aluminum material which simultaneously forms the corrosion-resistant oxide film and the porous oxide film.

即,本發明在請求項1中係一種表面處理鋁材,其特徵在於含有:鋁材;耐蝕性氧化皮膜,係形成於該鋁材表面的一部分且具有單層結構;及多孔性氧化皮膜,係形成於前述鋁材表面之未形成耐蝕性氧化皮膜的部位;前述耐蝕性氧化皮膜具有10~100nm之厚度,且令由FT-IR分析而得之尖峰吸收波數為b(cm-1),尖峰吸收波數b中之尖峰吸收率為a(%)時,滿足1≦a≦95且b≧3a+710之關係;前述多孔性氧化皮膜係由形成於表面側且厚度20~500nm的多 孔型鋁氧化皮膜層、及形成於基質側且厚度3~30nm的障蔽型鋁氧化皮膜層所構成,前述多孔型鋁氧化皮膜層形成有直徑5~30nm之小孔,且形成於鋁材表面之多孔性氧化皮膜整體中,前述多孔型鋁氧化皮膜層與障蔽型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。 That is, the invention of claim 1 is a surface-treated aluminum material characterized by comprising: an aluminum material; a corrosion-resistant oxide film formed on a part of the surface of the aluminum material and having a single-layer structure; and a porous oxide film, It is formed on a portion of the surface of the aluminum material where the corrosion-resistant oxide film is not formed; the corrosion-resistant oxide film has a thickness of 10 to 100 nm, and the peak absorption wave number obtained by FT-IR analysis is b (cm -1 ) When the peak absorption rate in the peak absorption wave number b is a (%), the relationship between 1≦a≦95 and b≧3a+710 is satisfied; the porous oxide film is formed on the surface side and has a thickness of 20 to 500 nm. a porous aluminum oxide film layer and a barrier aluminum oxide film layer formed on the substrate side and having a thickness of 3 to 30 nm, wherein the porous aluminum oxide film layer is formed with a small hole having a diameter of 5 to 30 nm and formed on the surface of the aluminum material. In the entire porous oxide film, the fluctuation range of the total thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer is within ±50% of the arithmetic mean of the total thickness.

本發明在請求項2係如請求項1中,前述尖峰吸收波數b(cm-1)係來自Al-O之最強伸縮振動之尖峰的波數,且出現於720≦b≦995之範圍。 According to the invention of claim 2, in the request item 1, the peak absorption wave number b (cm -1 ) is the wave number of the peak of the strongest stretching vibration from the Al-O, and appears in the range of 720 ≦ b ≦ 995.

本發明在請求項3係如請求項1或2中,前述多孔型鋁氧化皮膜層之小孔的總孔面積相對於表觀上之表面積的比為25~75%。 According to the invention of claim 3 or 2, the ratio of the total pore area of the pores of the porous aluminum oxide film layer to the apparent surface area is 25 to 75%.

本發明在請求項4係一種表面處理鋁材之製造方法,其特徵在於使用要表面處理之鋁材的電極、相對電極及已接線於前述鋁材電極之導電材,以pH9~13、液溫35~85℃且已溶鋁濃度為5ppm以上且1000ppm以下之鹼性水溶液為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~60秒鐘之條件下進行交流電解處理,藉此於與相對電極相對向的前述鋁材表面形成多孔性氧化皮膜,並同時於與已接線於鋁材電極之導電材相對向的前述鋁材表面形成耐蝕性氧化皮膜。 The invention of claim 4 is a method for producing a surface-treated aluminum material, which comprises using an electrode of a surface-treated aluminum material, an opposite electrode, and a conductive material connected to the aluminum electrode, at a pH of 9 to 13, and a liquid temperature An alkaline aqueous solution having a dissolved aluminum concentration of 5 ppm or more and 1000 ppm or less is an electrolytic solution at 35 to 85 ° C, and is exchanged at a frequency of 10 to 100 Hz, a current density of 4 to 50 A/dm 2 , and an electrolysis time of 5 to 60 seconds. The electrolytic treatment forms a porous oxide film on the surface of the aluminum material facing the counter electrode, and at the same time forms a corrosion-resistant oxide film on the surface of the aluminum material facing the conductive material connected to the aluminum electrode.

本發明在請求項5係如請求項4中,前述要表面處理之鋁材電極與相對電極同為平板狀,電解溶液中之前述已接線於鋁材電極之導電材的面積係欲使形成耐蝕性氧化 皮膜之面積的80~150%,且前述導電材與鋁材之距離為1~50mm。 According to the invention of claim 5, in the request item 4, the aluminum electrode to be surface-treated and the opposite electrode are in the form of a flat plate, and the area of the conductive material connected to the aluminum electrode in the electrolytic solution is intended to form a corrosion resistant layer. Sexual oxidation The area of the film is 80 to 150%, and the distance between the conductive material and the aluminum material is 1 to 50 mm.

本發明在請求項6係如請求項4或5中,前述已接線於鋁材電極之導電材係由不鏽鋼材或銅材所構成。 According to the invention of claim 6 or claim 5, the electrically conductive material that has been wired to the aluminum electrode is made of a stainless steel material or a copper material.

本發明在請求項7係如請求項4~6中之任一項中,其係將導電材配置於前述鋁材電極之其中一面側並與該面相對向,且將相對電極配置於鋁材電極另一面側並與該面相對向,藉此於鋁材電極之前述其中一面形成耐蝕性氧化皮膜,並於前述另一面形成多孔性氧化皮膜。 The invention of claim 7 is characterized in that, in any one of claims 4 to 6, the conductive material is disposed on one side of the aluminum electrode and faces the surface, and the opposite electrode is disposed on the aluminum material. The other surface side of the electrode faces the surface, whereby a corrosion-resistant oxide film is formed on one surface of the aluminum electrode, and a porous oxide film is formed on the other surface.

本發明在請求項8係如請求項4~6中之任一項中,其係將相對電極配置於前述鋁材電極另一面側並與該面相對向,將導電材配置在該另一面與相對電極之間並與鋁材電極另一面的一部分相對向,並將前述相對電極配置成與鋁材電極另一面的前述一部分互補之其他部位相對向,藉此於鋁材電極另一面的前述一部分形成耐蝕性氧化皮膜,並於鋁材電極之前述其他部位形成多孔性氧化皮膜。 The invention of claim 8 is characterized in that, in any one of claims 4 to 6, the opposite electrode is disposed on the other surface side of the aluminum electrode and faces the surface, and the conductive material is disposed on the other surface The opposing electrodes are opposed to a portion of the other surface of the aluminum electrode, and the opposing electrode is disposed to face the other portion complementary to the other portion of the other surface of the aluminum electrode, thereby forming the aforementioned portion of the other surface of the aluminum electrode. A corrosion-resistant oxide film is formed, and a porous oxide film is formed on the other portions of the aluminum electrode.

藉由本發明,可提供一種表面處理鋁材及其製造方法,該表面處理鋁材之特徵在於其係於表面的一部分形成有耐蝕性氧化皮膜,且於未形成有耐蝕性氧化皮膜之部位形成有具密著性的多孔性氧化皮膜。 According to the present invention, there is provided a surface-treated aluminum material characterized in that a surface-treated aluminum material is formed on a part of the surface to form a corrosion-resistant oxide film, and is formed in a portion where the corrosion-resistant oxide film is not formed. A porous porous oxide film.

1‧‧‧表面處理鋁材 1‧‧‧Surface treated aluminum

2‧‧‧鋁材 2‧‧‧Aluminum

3‧‧‧耐蝕性氧化皮膜 3‧‧‧Corrosion resistant oxide film

4‧‧‧多孔性氧化皮膜 4‧‧‧Porous oxide film

5‧‧‧相對電極 5‧‧‧relative electrode

6‧‧‧導電材 6‧‧‧Electrical materials

7‧‧‧交流電源 7‧‧‧AC power supply

8‧‧‧電解溶液 8‧‧‧Electrolysis solution

41‧‧‧障蔽型鋁氧化皮膜層 41‧‧‧Unobstructed aluminum oxide coating

42‧‧‧多孔型鋁氧化皮膜層 42‧‧‧Porous aluminum oxide coating

420‧‧‧小孔 420‧‧‧ hole

圖1係本發明之表面處理鋁材之一部分的截面示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view showing a portion of a surface treated aluminum material of the present invention.

圖2係本發明之表面處理鋁材之其他部位的截面示意圖。 Fig. 2 is a schematic cross-sectional view showing another portion of the surface-treated aluminum material of the present invention.

圖3係顯示本發明之鋁材之電解裝置的一實施態樣的前視圖。 Fig. 3 is a front elevational view showing an embodiment of an electrolytic apparatus for aluminum of the present invention.

圖4係顯示本發明之鋁材之電解裝置的另一實施態樣的前視圖。 Fig. 4 is a front elevational view showing another embodiment of the electrolysis device for aluminum of the present invention.

用以實施發明之形態 Form for implementing the invention

以下依序說明本發明之細節。 The details of the invention are described in order below.

如圖1所示,本發明之表面處理鋁材1之表面的一部分形成有耐蝕性氧化皮膜3。又,如圖2所示,於未形成有耐蝕性氧化皮膜3之鋁材2的表面部位形成有多孔性氧化皮膜4。 As shown in Fig. 1, a part of the surface of the surface-treated aluminum material 1 of the present invention is formed with a corrosion-resistant oxide film 3. Moreover, as shown in FIG. 2, the porous oxide film 4 is formed in the surface part of the aluminum material 2 in which the corrosion-resistant oxide film 3 was not formed.

A.有關鋁材 A. About aluminum

使用於本發明之鋁材可利用純鋁或鋁合金。鋁合金之成分並無特別限制,可使用包含JIS中規定之合金的各種合金。就形狀而言雖無特別限制,但從可穩定形成處理皮膜之觀點看來適合使用平板狀者。 The aluminum material used in the present invention can utilize pure aluminum or an aluminum alloy. The composition of the aluminum alloy is not particularly limited, and various alloys including the alloy specified in JIS can be used. Although the shape is not particularly limited, it is suitable from the viewpoint of stably forming a treated film.

B.有關鋁材表面之耐蝕性氧化皮膜結構 B. Corrosion resistant oxide film structure on the surface of aluminum

如圖1所示,本發明使用之鋁材2的表面的一部分係形成厚度10~100nm且理想為20~80nm之不定形的耐蝕性氧化皮膜3。該耐蝕性氧化皮膜3為單層結構之皮膜。若為非單層結構的多層結構,表層與中間層之間會發生間隙腐蝕而無法顯示充分的耐蝕性。又,亦可於鋁材2整面形成耐蝕 性氧化皮膜3。耐蝕性氧化皮膜3之厚度小於10nm時,無法獲得充分的耐蝕性。另一方面,超過100nm時則難以控制耐蝕性氧化皮膜厚度而發生處理不均。 As shown in Fig. 1, a part of the surface of the aluminum material 2 used in the present invention is formed into an amorphous corrosion-resistant oxide film 3 having a thickness of 10 to 100 nm and preferably 20 to 80 nm. The corrosion-resistant oxide film 3 is a film of a single-layer structure. In the case of a multilayer structure having a non-single layer structure, crevice corrosion occurs between the surface layer and the intermediate layer, and sufficient corrosion resistance cannot be exhibited. Also, corrosion resistance can be formed on the entire surface of the aluminum material 2 Oxidation film 3. When the thickness of the corrosion-resistant oxide film 3 is less than 10 nm, sufficient corrosion resistance cannot be obtained. On the other hand, when it exceeds 100 nm, it is difficult to control the thickness of the corrosion-resistant oxide film, and processing unevenness occurs.

該耐蝕性氧化皮膜3之膜質係由下述兩項而賦予特徵:以FT-IR(傅立葉轉換式紅外線分光光度計)進行分析時,紅外線吸收光譜之尖峰吸收波數b(cm-1),以及由該尖峰吸收波數中之基線而得的尖峰吸收率(a%)。在此,尖峰吸收波數b(cm-1)係來自Al-O之最強伸縮振動之尖峰的吸收波數。而,尖峰吸收波數b(cm-1)通常係出現在720≦b≦995之範圍。 The film quality of the corrosion-resistant oxide film 3 is characterized by the following two points: the peak absorption wave b (cm -1 ) of the infrared absorption spectrum when analyzed by FT-IR (Fourier transform infrared spectrophotometer). And a peak absorption rate (a%) obtained by absorbing the baseline of the wave number by the peak. Here, the peak absorption wave number b (cm -1 ) is the absorption wave number from the peak of the strongest stretching vibration of Al-O. However, the peak absorption wave number b (cm -1 ) usually appears in the range of 720 ≦ b ≦ 995.

在本發明使用之耐蝕性氧化皮膜中,係規定利用FT-IR進行分析時的上述尖峰吸收率a(%)為1≦a≦95且理想為2≦a≦75。該尖峰吸收率小於1%時,耐蝕性氧化皮膜之厚度會小於10nm而使耐蝕性不足。該尖峰吸收率若超過95%,則耐蝕性氧化皮膜之厚度會超過100nm,而難以控制耐蝕性氧化皮膜厚度,容易引發處理不均。此外在本發明中,尖峰吸收率a(%)與尖峰吸收波數b(cm-1)滿足b≧3a+710且理想為b≧3a+720之關係。若不滿足該關係,耐蝕性氧化皮膜之皮膜形狀會變成多孔質形狀,故會使耐蝕性降低。 In the corrosion-resistant oxide film used in the present invention, the peak absorption rate a (%) at the time of analysis by FT-IR is 1 ≦ a ≦ 95 and preferably 2 ≦ a ≦ 75. When the peak absorption rate is less than 1%, the thickness of the corrosion-resistant oxide film is less than 10 nm, and the corrosion resistance is insufficient. When the peak absorption rate exceeds 95%, the thickness of the corrosion-resistant oxide film exceeds 100 nm, and it is difficult to control the thickness of the corrosion-resistant oxide film, which tends to cause uneven processing. Further, in the present invention, the peak absorption rate a (%) and the peak absorption wave number b (cm -1 ) satisfy the relationship of b ≧ 3a + 710 and desirably b ≧ 3a + 720. If the relationship is not satisfied, the shape of the film of the corrosion-resistant oxide film becomes a porous shape, so that the corrosion resistance is lowered.

C.有關鋁材表面之多孔性氧化皮膜結構 C. Porous oxide film structure on the surface of aluminum

如圖2所示,未形成有耐蝕性氧化皮膜之部位的鋁材表面形成有多孔性氧化皮膜4。多孔性氧化皮膜4係由鋁材2之基質側的障蔽型鋁氧化皮膜層41及表層側的多孔型鋁氧化皮膜層42構成。 As shown in FIG. 2, a porous oxide film 4 is formed on the surface of the aluminum material where the corrosion-resistant oxide film is not formed. The porous oxide film 4 is composed of a barrier-type aluminum oxide film layer 41 on the substrate side of the aluminum material 2 and a porous aluminum oxide film layer 42 on the surface layer side.

C-1.多孔型鋁氧化皮膜層 C-1. Porous aluminum oxide film layer

多孔型鋁氧化皮膜層42之厚度為20~500nm。小於20nm時,厚度將不夠充分,因此後述之小孔結構的形成容易變得不夠充分,而使接著力或密著力降低。另一方面,若超過500nm,多孔型鋁氧化皮膜層本身容易內聚破壞而使接著力或密著力降低。多孔型鋁氧化皮膜層42之厚度理想為30~400nm。 The porous aluminum oxide film layer 42 has a thickness of 20 to 500 nm. When the thickness is less than 20 nm, the thickness is insufficient, so that the formation of the pore structure described later tends to be insufficient, and the adhesion or adhesion is lowered. On the other hand, when it exceeds 500 nm, the porous aluminum oxide film layer itself is liable to be cohesively broken and the adhesion or adhesion is lowered. The thickness of the porous aluminum oxide film layer 42 is desirably 30 to 400 nm.

又,多孔型鋁氧化皮膜層42具備自其表面朝深度方向深入的小孔420。小孔420之直徑為5~30nm且理想為10~20nm。該小孔可發揮使樹脂層及接著劑等與鋁氧化皮膜之接觸面積增大以使其接著力或密著力增大之效果。小孔直徑若小於5nm,則接觸面積不足,故而無法獲得充分的接著力或密著力。另一方面,小孔直徑若超過30nm,則多孔型鋁氧化皮膜層整體會變脆而產生內聚破壞,使接著力或密著力降低。 Further, the porous aluminum oxide film layer 42 has a small hole 420 which penetrates deep in the depth direction from the surface. The small holes 420 have a diameter of 5 to 30 nm and desirably 10 to 20 nm. This small hole has an effect of increasing the contact area between the resin layer, the adhesive, and the like with the aluminum oxide film to increase the adhesion or adhesion. If the pore diameter is less than 5 nm, the contact area is insufficient, so that sufficient adhesion or adhesion cannot be obtained. On the other hand, when the pore diameter exceeds 30 nm, the porous aluminum oxide film layer as a whole becomes brittle and cohesive failure occurs, and the adhesion or adhesion is lowered.

小孔之總孔面積相對於多孔型鋁氧化皮膜層之表面積之比並無特別限制。多孔型鋁氧化皮膜層之小孔的總孔面積相對於表觀上之表面積(不考慮表面之微小凹凸等,以長與寬之乘積表示之面積)的比以25~75%為佳。小於25%時,接觸面積可能會不足而無法獲得充分的接著力或密著力。另一方面,若超過75%,多孔型鋁氧化皮膜層整體可能會變脆而產生內聚破壞,使接著力或密著力降低。 The ratio of the total pore area of the small pores to the surface area of the porous aluminum oxide coating layer is not particularly limited. The ratio of the total pore area of the pores of the porous aluminum oxide film layer to the apparent surface area (the area expressed by the product of the length and the width irrespective of the minute unevenness of the surface) is preferably 25 to 75%. When it is less than 25%, the contact area may be insufficient to obtain sufficient adhesion or adhesion. On the other hand, if it exceeds 75%, the porous aluminum oxide film layer as a whole may become brittle and cause cohesive failure, and the adhesion or adhesion may be lowered.

C-2.障蔽型鋁氧化皮膜層 C-2. Barrier aluminum oxide film layer

障蔽型鋁氧化皮膜層41係厚度3~30nm的緻密的氧化 皮膜。厚度小於3nm時,將無法作為中介層對多孔型鋁氧化皮膜層4與鋁基質2之結合賦予充分的結合力,尤其在高溫‧多濕等的嚴苛環境下之結合力將不夠充分。另一方面,一旦超過30nm,便容易受其緻密性影響使障蔽型鋁氧化皮膜層3發生內聚破壞,反而會使接著力或密著力降低。而,障蔽型鋁氧化皮膜層41之厚度理想為5~25nm。 Barrier-type aluminum oxide film layer 41 is densely oxidized with a thickness of 3 to 30 nm Membrane. When the thickness is less than 3 nm, the bonding between the porous aluminum oxide film layer 4 and the aluminum matrix 2 cannot be sufficiently provided as an interposer, and the bonding strength in a severe environment such as high temperature and humidity is insufficient. On the other hand, when it exceeds 30 nm, it is easily affected by the denseness to cause cohesive failure of the barrier-type aluminum oxide film layer 3, and conversely, the adhesion or adhesion is lowered. Further, the thickness of the barrier aluminum oxide film layer 41 is preferably 5 to 25 nm.

C-3.多孔性氧化皮膜之整體厚度的變動幅度 C-3. Variation range of the overall thickness of the porous oxide film

多孔性氧化皮膜4的整體厚度、即C-1中記載之多孔型鋁氧化皮膜層42與C-2中記載之障蔽型鋁氧化皮膜層41的厚度合計,不論在形成有多孔性氧化皮膜4之任何位置作測定,其變動幅度必須在±50%以內且理想在±20%以內。即,令鋁材表面上的任意多數位置(10處位置以上為佳,且在該等各位置上能取10點以上之測定點為佳)測定之多孔性氧化皮膜整體厚度的算術平均值為T(nm)時,該等多數測定位置全部中之多孔性氧化皮膜整體厚度必須在(0.5×T)~(1.5×T)之範圍。若有小於(0.5×T)之位置,其位置之多孔性氧化皮膜會比其周圍更薄。如此一來,在該膜薄之位置中便容易於應接著之接著劑或應密著之樹脂層等與多孔性氧化皮膜之間產生間隙,而無法確保充分的接觸面積,進而使接著力或密著力降低。 The total thickness of the porous oxide film 4, that is, the thickness of the porous aluminum oxide film layer 42 described in C-1 and the thickness of the barrier aluminum oxide film layer 41 described in C-2, is the same regardless of the formation of the porous oxide film 4 For any position measurement, the variation must be within ±50% and ideally within ±20%. In other words, the arithmetic mean value of the total thickness of the porous oxide film measured at any of a plurality of positions on the surface of the aluminum material (preferably at 10 or more positions and preferably at 10 or more points at the respective positions) is T. In the case of (nm), the overall thickness of the porous oxide film in all of the plurality of measurement positions must be in the range of (0.5 × T) to (1.5 × T). If there is a position smaller than (0.5 × T), the porous oxide film at its position will be thinner than its surroundings. As a result, in the thin portion of the film, a gap is formed between the adhesive or the resin layer to be adhered to the porous oxide film, and a sufficient contact area cannot be ensured, thereby further bonding the force or The adhesion is reduced.

另一方面,若存有超過(1.5×T)之位置,則其位置之多孔性氧化皮膜會較周圍的周圍更厚。如此一來,在該膜厚之位置中會集中來自應密著之樹脂層等的應力,而引發在多孔性氧化皮膜之內聚破壞,使接著力或密著力降低。 On the other hand, if there is a position exceeding (1.5 × T), the porous oxide film at the position is thicker than the surrounding circumference. As a result, the stress from the resin layer to be adhered or the like is concentrated at the position of the film thickness, and the cohesive failure in the porous oxide film is caused, and the adhesion or adhesion is lowered.

而,在如上述之多孔性氧化皮膜的整體厚度為膜薄之位置或膜厚之位置中,與周圍相較下其光學特性有所不同,因此可得以目視出有茶褐色或白濁色等色調的變化。 Further, in the position where the overall thickness of the porous oxide film as described above is a position where the film is thin or the film thickness is different from the surrounding phase, the optical characteristics are different, so that a color such as brownish or white turbid color can be visually observed. Variety.

D.有關鋁材之製造方法 D. How to manufacture aluminum materials

用以製造表面具備滿足以上條件之耐蝕性氧化皮膜及多孔性氧化皮膜的表面處理鋁材之一方法可舉如下述方法:使用要表面處理之鋁材電極、接線於鋁材且設置於鋁材表面附近的導電材、及作為相對電極之後述材質的電極,以pH9~13、液溫35~85℃且已溶鋁濃度為5ppm以上且1000ppm以下之鹼性水溶液為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~60秒鐘之條件下進行交流電解處理,藉此於與導電材相對向之鋁材表面的部位形成耐蝕性氧化皮膜,並於與相對電極相對向之鋁材表面的部位形成多孔性氧化皮膜。而,亦可藉由使鋁材之總表面與導電材相對向,於其表面僅形成耐蝕性氧化皮膜。 One of the methods for producing a surface-treated aluminum material having a corrosion-resistant oxide film and a porous oxide film having the above conditions may be a method of using an aluminum electrode to be surface-treated, wiring to an aluminum material, and setting it to an aluminum material. The conductive material in the vicinity of the surface and the electrode as the material of the counter electrode described later are an electrolytic solution having a pH of 9 to 13, a liquid temperature of 35 to 85 ° C, and an dissolved aluminum concentration of 5 ppm or more and 1000 ppm or less as an electrolytic solution at a frequency of 10~. AC electrolysis treatment is carried out under the conditions of 100 Hz, current density of 4 to 50 A/dm 2 and electrolysis time of 5 to 60 seconds, thereby forming a corrosion-resistant oxide film on the surface of the aluminum material opposite to the conductive material, and The electrode forms a porous oxide film with respect to a portion of the surface of the aluminum material. Further, by making the total surface of the aluminum material face the conductive material, only the corrosion-resistant oxide film is formed on the surface.

本發明之表面處理鋁材係使用要表面處理之鋁材電極、已接線於鋁材電極之導電材、及相對電極進行交流電解處理。已接線於要表面處理之鋁材電極的導電材在電解溶液中,係配置於欲使形成耐蝕性氧化皮膜之鋁材表面部分的附近,且與該表面部分相對向。於未與導電材相對向的鋁材表面部分則是形成多孔性氧化皮膜。又,在電解溶液中,與鋁材相對向之導電材面積係欲使形成耐蝕性氧化皮膜之鋁材面積的80~150%且理想為90~130%。又, 與鋁材相對向之導電材的距離為1~50mm。導電材之面積小於欲使形成耐蝕性氧化皮膜之鋁材面積的80%時,可能會於欲使形成耐蝕性氧化皮膜之部分形成多孔性氧化皮膜;若超過150%,則可能亦於欲使形成多孔性氧化皮膜之部分形成耐蝕性氧化皮膜。與鋁材相對向之導電材的距離短於1mm時,在導電材及相對向之鋁材之間將難以引起電解溶液之對流,而容易發生耐蝕性氧化皮膜之處理不均。另一方面,該距離若超過50mm,導電材及相對向之鋁材的間隔會過寬而於鋁材整面形成多孔性氧化皮膜。 The surface-treated aluminum material of the present invention is subjected to an AC electrolytic treatment using an aluminum electrode to be surface-treated, a conductive material which is connected to the electrode of the aluminum, and a counter electrode. The electrically conductive material that has been wired to the surface of the aluminum electrode to be surface-treated is disposed in the vicinity of the surface portion of the aluminum material to be formed into the corrosion-resistant oxide film in the electrolytic solution, and is opposed to the surface portion. A porous oxide film is formed on the surface portion of the aluminum material that is not opposed to the conductive material. Further, in the electrolytic solution, the area of the conductive material opposed to the aluminum material is 80 to 150%, and preferably 90 to 130%, of the area of the aluminum material forming the corrosion-resistant oxide film. also, The distance from the conductive material opposite to the aluminum material is 1 to 50 mm. When the area of the conductive material is less than 80% of the area of the aluminum material to form the corrosion-resistant oxide film, a porous oxide film may be formed in a portion where the corrosion-resistant oxide film is to be formed; if it exceeds 150%, it may also be A portion of the porous oxide film is formed to form a corrosion-resistant oxide film. When the distance from the conductive material to the aluminum material is shorter than 1 mm, it is difficult to cause convection of the electrolytic solution between the conductive material and the opposite aluminum material, and the uneven treatment of the corrosion-resistant oxide film is likely to occur. On the other hand, if the distance exceeds 50 mm, the interval between the conductive material and the aluminum material is too wide to form a porous oxide film on the entire surface of the aluminum material.

在交流電解處理步驟中,作為電解溶液使用的鹼性水溶液可使用磷酸鈉、磷酸氫鉀、焦磷酸鈉、焦磷酸鉀及偏磷酸鈉等磷酸鹽;氫氧化鈉及氫氧化鉀等鹼金屬氫氧化物;碳酸鈉、碳酸氫鈉、碳酸鉀等碳酸鹽;氫氧化銨;或該等混合物之水溶液。如後述由必須將電解溶液之pH保持在特定範圍此點看來,宜使用含有可期望緩衝效果之磷酸鹽系物質的鹼水溶液。該鹼性水溶液中所含鹼成分的濃度可適當調整以使電解溶液之pH得以成為期望值,通常為1×10-4~1莫耳/公升且理想為1×10-3~0.8莫耳/公升。而,於該等鹼性水溶液中,為了提升去污能力亦可添加界面活性劑。 In the alternating electrolytic treatment step, as the alkaline aqueous solution used as the electrolytic solution, a phosphate such as sodium phosphate, potassium hydrogen phosphate, sodium pyrophosphate, potassium pyrophosphate or sodium metaphosphate; an alkali metal hydrogen such as sodium hydroxide or potassium hydroxide can be used. An oxide; a carbonate such as sodium carbonate, sodium hydrogencarbonate or potassium carbonate; ammonium hydroxide; or an aqueous solution of such a mixture. As will be described later, from the viewpoint that the pH of the electrolytic solution must be maintained within a specific range, it is preferred to use an aqueous alkali solution containing a phosphate-based substance having a desired buffering effect. The concentration of the alkali component contained in the alkaline aqueous solution can be appropriately adjusted so that the pH of the electrolytic solution becomes a desired value, and is usually 1 × 10 -4 to 1 mol / liter and desirably 1 × 10 -3 to 0.8 mol / liter. Further, in such an alkaline aqueous solution, a surfactant may be added in order to enhance the detergency.

電解溶液之pH須設為9~13,且以設為9.5~12為佳。pH低於9時,電解溶液之鹼蝕刻力會不足而使多孔性氧化皮膜成為不定形皮膜,使預定的多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層之形成不完全。又,pH低於9時將難 以控制耐蝕性氧化皮膜之厚度,而容易發生處理不均。另一方面,pH若超過13,鹼蝕刻力會過剩而使氧化皮膜層難以成長,進而阻礙所期望之多孔性氧化皮膜形成。 The pH of the electrolytic solution must be set to 9 to 13, and it is preferably set to 9.5 to 12. When the pH is less than 9, the alkali etching force of the electrolytic solution is insufficient, and the porous oxide film becomes an amorphous film, and the formation of the predetermined porous aluminum oxide film layer and the barrier aluminum oxide film layer is incomplete. Also, it will be difficult if the pH is below 9. In order to control the thickness of the corrosion-resistant oxide film, uneven processing is likely to occur. On the other hand, when the pH exceeds 13, the alkali etching force is excessive and the oxide film layer is hard to grow, which hinders the formation of a desired porous oxide film.

電解溶液溫度須設為35~85℃,且以設為40~70℃為佳。電解浴溫度低於35℃時,鹼蝕刻力會不足而使多孔性氧化皮膜之形成不完全。另一方面,若超過85℃,鹼蝕刻力則會過剩,而阻礙多孔性氧化皮膜及耐蝕性氧化皮膜之形成。 The temperature of the electrolytic solution must be set to 35 to 85 ° C, and it is preferably set to 40 to 70 ° C. When the temperature of the electrolytic bath is lower than 35 ° C, the alkali etching force is insufficient to cause the formation of the porous oxide film to be incomplete. On the other hand, when it exceeds 85 ° C, the alkali etching force is excessive, and the formation of the porous oxide film and the corrosion-resistant oxide film is inhibited.

電解溶液中所含已溶鋁濃度須設為5ppm以上且1000ppm以下,且以設為10ppm以上且500ppm以下為佳。已溶鋁濃度低於5ppm時,電解反應初始時會急遽產生氧化皮膜的形成反應,因此可能會局部形成厚膜的多孔性氧化皮膜而於耐蝕性氧化皮膜產生參差。另一方面,已溶鋁濃度若超過1000ppm,電解溶液之黏度會增大而在電解步驟中阻礙鋁材表面附近的均勻對流,同時已溶鋁會朝抑制多孔性氧化皮膜形成之方向起作用。結果會局部性地形成較薄的多孔性氧化皮膜。已溶鋁濃度若不在上述範圍,則在已形成於鋁材表面之多孔性氧化皮膜整體中,將難以使前述多孔型鋁氧化皮膜層與障蔽型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。結果會招致獲得之多孔性氧化皮膜的接著力‧密著力降低。 The concentration of dissolved aluminum contained in the electrolytic solution must be 5 ppm or more and 1000 ppm or less, and preferably 10 ppm or more and 500 ppm or less. When the concentration of the dissolved aluminum is less than 5 ppm, the formation reaction of the oxide film is violently generated at the initial stage of the electrolysis reaction, and thus a porous oxide film having a thick film may be locally formed to cause a difference in the corrosion-resistant oxide film. On the other hand, if the concentration of dissolved aluminum exceeds 1000 ppm, the viscosity of the electrolytic solution increases to impede uniform convection in the vicinity of the surface of the aluminum material in the electrolysis step, and the dissolved aluminum acts in the direction of suppressing the formation of the porous oxide film. As a result, a thin porous oxide film is locally formed. When the concentration of the dissolved aluminum is not in the above range, it is difficult to change the total thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer in the entire porous oxide film formed on the surface of the aluminum material. Within ±50% of the arithmetic mean of the total thickness. As a result, the adhesion force ‧ the adhesion of the obtained porous oxide film is lowered.

使用之頻率為10~100Hz。低於10Hz時,就電分解而言直流的要素會提高,結果便無法進行多孔型鋁氧化皮膜層之形成而成為緻密結構。另一方面,若超過100Hz, 陽極與陰極之反轉會過快而使氧化皮膜整體之形成極端減緩,進而使多孔性氧化皮膜及耐蝕性氧化皮膜為了獲得預定的厚度均變成需要極長的時間。而,使用之頻率設為20~80Hz為佳。 The frequency used is 10~100Hz. When the temperature is lower than 10 Hz, the element of direct current is increased in terms of electrolysis, and as a result, the formation of the porous aluminum oxide film layer cannot be performed to form a dense structure. On the other hand, if it exceeds 100 Hz, The reversal of the anode and the cathode is too fast, and the formation of the entire oxide film is extremely slow, and the porous oxide film and the corrosion-resistant oxide film become extremely long in order to obtain a predetermined thickness. However, the frequency used is preferably 20 to 80 Hz.

電流密度須設為4~50A/dm2。電流密度低於4A/dm2時,多孔性氧化皮膜中會優先僅形成障蔽型鋁氧化皮膜層,故而無法獲多孔型鋁氧化皮膜層。另一方面,若超過50A/dm2,電流會過大而難以控制多孔性氧化皮膜及耐蝕性氧化皮膜之厚度,進而容易引起處理不均。而,電流密度設為5~30A/dm2為佳。 The current density must be set to 4~50A/dm 2 . When the current density is less than 4 A/dm 2 , only the barrier aluminum oxide film layer is preferentially formed in the porous oxide film, so that the porous aluminum oxide film layer cannot be obtained. On the other hand, when it exceeds 50 A/dm 2 , the current is too large, and it is difficult to control the thickness of the porous oxide film and the corrosion-resistant oxide film, and the processing unevenness is likely to occur. However, it is preferable that the current density is set to 5 to 30 A/dm 2 .

電解時間須設為5~60秒。在低於5秒的處理時間下,多孔性氧化皮膜之形成會過度急遽而無法充分形成多孔型鋁氧化皮膜層,進而形成由不定形鋁氧化物所構成之氧化皮膜。另一方面,若超過60秒,氧化皮膜會再溶解而無法充分形成耐蝕性氧化皮膜層,且生產性亦降低,故非理想。而,電解時間設為10~50秒為佳。 The electrolysis time must be set to 5 to 60 seconds. At a treatment time of less than 5 seconds, the formation of the porous oxide film is excessively rapid, and the porous aluminum oxide film layer cannot be sufficiently formed, and an oxide film composed of an amorphous aluminum oxide is formed. On the other hand, if it exceeds 60 seconds, the oxide film is redissolved and the corrosion-resistant oxide film layer cannot be sufficiently formed, and the productivity is also lowered, which is not preferable. However, the electrolysis time is preferably set to 10 to 50 seconds.

使用於交流電解處理之一對電極中之其中一電極為應經電解處理而被表面處理的鋁材。另一個相對電極則例如可使用黑鉛、鋁、鈦電極等公知電極,惟必須使用不會對電解溶液之鹼成分或溫度產生劣化、導電性佳並且其本身不會引起電化學反應之材質者。由此點看來,相對電極宜使用黑鉛電極。此乃因為黑鉛電極於化學上相當穩定,且可容易以低價入手,再加上藉由存在於黑鉛電極的多數氣孔之作用可使電力線在交流電解步驟中適度擴散, 因此容易使多孔性氧化皮膜及耐蝕性氧化皮膜一起變均勻。 One of the electrodes used in one of the alternating current electrolytic treatments is an aluminum material which is subjected to surface treatment by electrolytic treatment. As the other counter electrode, for example, a known electrode such as a black lead, aluminum or titanium electrode can be used, but it is necessary to use a material which does not deteriorate the alkali component or temperature of the electrolytic solution, has good conductivity, and does not cause an electrochemical reaction itself. . From this point of view, it is preferable to use a black lead electrode for the counter electrode. This is because the black lead electrode is chemically stable and can be easily started at a low price, and the power line can be moderately diffused in the alternating current electrolysis step by the action of most of the pores present in the black lead electrode. Therefore, it is easy to make the porous oxide film and the corrosion-resistant oxide film uniform together.

藉由電解處理而接線於使鋁材上形成耐蝕性氧化皮膜之部分的導電材,相較於鋁材,其電極電位必須為貴電位。藉由將相較於鋁材電極電位為貴電位的導電材與鋁材接線並設置於鋁材附近進行電解,可在導電材表面引起交流電解之陰極反應,並在鋁材及導電材表面引起陽極反應。故而,可於鋁材表面形成利用陽極反應所造成的耐蝕性氧化皮膜。相較於鋁材電極電位為貴電位的導電材例如為金、鉑、銅、鐵、不鏽鋼、鎳等,本發明中則適合使用不鏽鋼或銅。此乃因為該等在鹼溶液中耐蝕性佳、低價且易於加工。 The electrode material is connected to the conductive material which forms part of the corrosion-resistant oxide film on the aluminum material by electrolytic treatment, and the electrode potential must be a noble potential as compared with the aluminum material. By electrolyzing a conductive material that is at a noble potential to the electrode potential of the aluminum electrode and placing it in the vicinity of the aluminum material for electrolysis, a cathodic reaction of alternating current electrolysis can be caused on the surface of the conductive material, and is caused on the surface of the aluminum material and the conductive material. Anode reaction. Therefore, a corrosion-resistant oxide film caused by an anodic reaction can be formed on the surface of the aluminum material. The conductive material having a noble potential with respect to the electrode potential of the aluminum material is, for example, gold, platinum, copper, iron, stainless steel, nickel, or the like. In the present invention, stainless steel or copper is suitably used. This is because these are excellent in corrosion resistance in an alkali solution, low in cost, and easy to process.

本發明中,於應經電解處理的鋁材及相對電極宜一同使用平板狀者,並宜使相對向的鋁材與相對電極之相對面彼此之尺寸大致相同,在靜止狀態下將兩電極進行電解操作。如圖3所示,準備相對電極5,並宜以與相對電極板5相對的方式,將經表面處理之鋁材2表面設置成與相對電極5之表面平行。而,圖中7為交流電源,圖中8為電解溶液。 In the present invention, the aluminum material to be electrolytically treated and the counter electrode should preferably be used together with the flat plate, and the opposite faces of the opposing aluminum material and the opposite electrode should be substantially the same size, and the two electrodes are carried out in a stationary state. Electrolysis operation. As shown in FIG. 3, the counter electrode 5 is prepared, and the surface of the surface-treated aluminum material 2 is preferably disposed in parallel with the surface of the counter electrode 5 in a manner opposed to the counter electrode plate 5. In the figure, 7 is an AC power source, and 8 in the figure is an electrolytic solution.

經與平板狀之要電解處理的鋁材2接線的導電材6的形狀不必為平板狀,可為網狀或多孔狀。如圖3所示,例如於要表面處理之鋁材2之其中一面(圖中左側之面)側以與該面相對向的方式配置導電材6,並於鋁材2之另一面(圖中右側之面)側以與該面相對向的方式配置相對電極5,進 行交流電解,藉此可於鋁材2之上述其中一面形成耐蝕性氧化皮膜,並於上述另一面形成多孔性氧化皮膜。 The shape of the electrically conductive material 6 connected to the flat aluminum material 2 to be electrolytically treated is not necessarily a flat plate shape, and may be a mesh shape or a porous shape. As shown in FIG. 3, for example, on one side (the side on the left side in the drawing) of the aluminum material 2 to be surface-treated, the conductive material 6 is disposed so as to face the surface, and is on the other side of the aluminum material 2 (in the figure) The side of the right side is disposed opposite to the surface so as to face the opposite electrode 5 By performing alternating current electrolysis, a corrosion-resistant oxide film can be formed on one surface of the aluminum material 2, and a porous oxide film can be formed on the other surface.

相較於圖3,如圖4所示,亦可於要表面處理之鋁材2之另一面(圖中右側之面)及與該面相對應之相對電極5之間配置導電材6。此時,使鋁材2之另一面的一部分(圖中之上側一半部分)與導電材6相對向,而鋁材2之另一面的其他部位(圖中之下側一半部分)則是不與導電材6相對向而是與相對電極5相對向。藉由以上述配置進行交流電解,可於與導電材6相對向之鋁材之另一面的一部分形成耐蝕性氧化皮膜,並於與相對電極5相對向而非與導電材6相對向的鋁材之另一面的其他部位形成多孔性氧化皮膜,即可於鋁材2之同一面上形成耐蝕性氧化皮膜及多孔性氧化皮膜。又,在圖4中,亦可使鋁材2之另一面的一部分(圖中之下側一半部分)與導電材6相對向,並將鋁材2之另一面的其他部位(圖中之上側一半部分)配置成不與導電材6相對向而是與相對電極5相對向,藉此於前述另一面的一部分形成耐蝕性氧化皮膜,並於前述另一面之其他部位形成多孔性氧化皮膜。 As shown in FIG. 3, as shown in FIG. 4, the conductive material 6 may be disposed between the other surface of the aluminum material 2 to be surface-treated (the surface on the right side in the drawing) and the counter electrode 5 corresponding to the surface. At this time, a part of the other side of the aluminum material 2 (the upper half of the figure is opposed to the conductive material 6), and the other part of the other side of the aluminum material 2 (the lower half of the figure) is not The conductive material 6 faces the opposite side and faces the opposite electrode 5. By performing alternating current electrolysis in the above-described arrangement, a corrosion-resistant oxide film can be formed on a part of the other surface of the aluminum material facing the conductive material 6, and the aluminum material can be opposed to the opposite electrode 5 instead of the conductive material 6. On the other surface of the other surface, a porous oxide film is formed, and a corrosion-resistant oxide film and a porous oxide film can be formed on the same surface of the aluminum material 2. Further, in Fig. 4, a part of the other side of the aluminum material 2 (the lower half of the figure) may be opposed to the conductive material 6, and the other side of the other side of the aluminum material 2 (the upper side in the drawing) The half portion is disposed so as not to face the conductive material 6 but to face the counter electrode 5, whereby a corrosion-resistant oxide film is formed on a part of the other surface, and a porous oxide film is formed on the other surface of the other surface.

此外,作為鋁材2之另一面的一部分且與使導電材6相對向的部分可設為任意的形狀、大小及位置。而且,可將作為鋁材2之另一面的其他部位且與使相對電極5相對向的部位設在另一面中與前述一部分互補的部分。 Further, a portion that is a part of the other surface of the aluminum material 2 and that faces the conductive material 6 can be set to any shape, size, and position. Further, another portion which is the other surface of the aluminum material 2 and a portion facing the opposite electrode 5 may be provided on the other surface in a portion complementary to the aforementioned portion.

本發明之多孔性氧化皮膜與耐蝕性氧化皮膜的結構觀察及厚度測定,適合使用利用穿透型電子顯微鏡 (TEM)之截面觀察。具體上,多孔性氧化皮膜及耐蝕性氧化皮膜之厚度以及多孔性氧化皮膜層之小孔直徑可藉由超薄切片機等加工成薄片,進行TEM觀察來測定。 The structure observation and thickness measurement of the porous oxide film and the corrosion-resistant oxide film of the present invention are suitable for use using a penetrating electron microscope (TEM) cross section observation. Specifically, the thickness of the porous oxide film and the corrosion-resistant oxide film and the small pore diameter of the porous oxide film layer can be measured by TEM observation by processing into a thin sheet by an ultramicrotome or the like.

實施例 Example

以下,依據實施例及比較例來說明本發明之適當的實施形態。 Hereinafter, appropriate embodiments of the present invention will be described based on examples and comparative examples.

要電解處理之鋁材係使用縱500mm×橫500mm×板厚1.0mm之JIS5052的平板。使用該鋁板作為其中一電極,於相對電極方面則使用縱500mm×橫550mm×板厚2.0mm之黑鉛板或鈦板。在實施例1~23及比較例1~13中,如圖3所示,將相對電極5與鋁材2配設成彼此平行。於鋁合金板2之與相對電極5相反側之面的附近配置導電材6,並於鋁合金板2之導電材6側的一整面形成耐蝕性氧化皮膜,於相對電極側整面形成多孔性氧化皮膜。而,在實施例24中,如圖4所示係配設成使鋁材2之表面另一面(圖中右側之面)的一部分(圖中之上側一半部分)與導電材相對向,並使鋁材2之表面另一面的其他部位(圖中之下側一半部分)不與導電材6相對向而與相對電極5相對向,以使耐蝕性氧化皮膜及多孔性氧化皮膜形成於鋁材2之同一面。 The aluminum material to be electrolytically treated is a flat plate of JIS 5052 having a length of 500 mm × a width of 500 mm × a plate thickness of 1.0 mm. The aluminum plate was used as one of the electrodes, and a black lead plate or a titanium plate having a length of 500 mm × a width of 550 mm × a plate thickness of 2.0 mm was used for the counter electrode. In Examples 1 to 23 and Comparative Examples 1 to 13, as shown in FIG. 3, the counter electrode 5 and the aluminum material 2 were disposed in parallel with each other. The conductive material 6 is disposed in the vicinity of the surface of the aluminum alloy plate 2 opposite to the counter electrode 5, and a corrosion-resistant oxide film is formed on one surface of the aluminum alloy plate 2 on the side of the conductive material 6, and a porous surface is formed on the entire surface of the opposite electrode side. Oxidation film. Further, in the embodiment 24, as shown in Fig. 4, a part (the upper half of the figure in the figure) on the other surface (the side on the right side in the drawing) of the surface of the aluminum material 2 is disposed opposite to the conductive material, and The other portion on the other surface of the surface of the aluminum material 2 (the lower half portion in the drawing) does not face the conductive material 6 and opposes the opposite electrode 5, so that the corrosion-resistant oxide film and the porous oxide film are formed on the aluminum material 2 The same side.

於導電材方面,在實施例1~14、18~21及比較例1~13中係使用縱500mm×橫500mm×板厚0.5mm之SUS304不鏽鋼板。實施例15中係使用縱500mm×橫500mm×板厚0.5mm之銅板。實施例16中係使用縱500mm×橫500mm、線徑0.5mm、孔隙率64.5%且10網目之SUS304不鏽 鋼金網。實施例17中係使用縱500mm×橫500mm、孔徑6mm、孔間距離(間距)8mm之SUS304不鏽鋼沖孔金屬。實施例22中係使用縱480mm×橫480mm×板厚0.5mm之SUS304不鏽鋼板。實施例23中係使用縱570mm×橫570mm×板厚0.5mm之SUS304不鏽鋼板。實施例24中係使用縱250mm×橫500mm×板厚0.5mm之SUS304不鏽鋼板。而,導電材與鋁合金板之距離在實施例1~17、22~24及比較例1~13中係設為5mm。實施例18中係設為2mm,實施例19中係設為45mm,實施例20中係設為0.5mm,實施例21中係設為55mm。而,在表1所示之導電材相對於鋁材面積的面積比中,導電材面積係由忽略孔隙部的縱橫長度而求出。 For the conductive materials, in Examples 1 to 14, 18 to 21, and Comparative Examples 1 to 13, SUS304 stainless steel sheets having a length of 500 mm × a width of 500 mm × a thickness of 0.5 mm were used. In Example 15, a copper plate of 500 mm in length × 500 mm in width × 0.5 mm in thickness was used. In Example 16, a vertical 500 mm × a width of 500 mm, a wire diameter of 0.5 mm, a porosity of 64.5%, and a 10-mesh SUS304 stainless steel were used. Steel gold mesh. In Example 17, a SUS304 stainless steel punched metal having a length of 500 mm × a width of 500 mm, a hole diameter of 6 mm, and a hole-to-hole distance (pitch) of 8 mm was used. In Example 22, a SUS304 stainless steel plate having a length of 480 mm × a width of 480 mm × a thickness of 0.5 mm was used. In Example 23, a SUS304 stainless steel plate having a length of 570 mm × a width of 570 mm × a thickness of 0.5 mm was used. In Example 24, a SUS304 stainless steel plate having a length of 250 mm × a width of 500 mm × a thickness of 0.5 mm was used. Further, the distance between the conductive material and the aluminum alloy plate was set to 5 mm in Examples 1 to 17, 22 to 24 and Comparative Examples 1 to 13. In Example 18, it was set to 2 mm, in Example 19, it was set to 45 mm, in Example 20, it was set to 0.5 mm, and in Example 21, it was set to 55 mm. On the other hand, in the area ratio of the conductive material shown in Table 1 to the area of the aluminum material, the area of the conductive material was determined by ignoring the longitudinal and lateral lengths of the void portion.

於電解溶液方面係使用具有表1所示pH、溫度及已溶鋁濃度且以焦磷酸鈉為主成分的鹼性水溶液。而,以0.1莫耳/公升之NaOH水溶液來調整電解溶液之pH。鹼性水溶液之鹼成分濃度係設為0.1莫耳/公升。此外,在表1所示之交流電解處理條件下實施電解處理,製作出於鋁板之其中一表面形成有耐蝕性氧化皮膜,並於另一表面形成有多孔性氧化皮膜的表面處理鋁材之供試材。 As the electrolytic solution, an alkaline aqueous solution having a pH, a temperature, and a dissolved aluminum concentration as shown in Table 1 and containing sodium pyrophosphate as a main component was used. On the other hand, the pH of the electrolytic solution was adjusted with a 0.1 mol/liter NaOH aqueous solution. The alkali component concentration of the alkaline aqueous solution was set to 0.1 mol/liter. Further, electrolytic treatment was carried out under the conditions of the alternating current electrolytic treatment shown in Table 1, and a surface-treated aluminum material having a corrosion-resistant oxide film formed on one surface of the aluminum plate and a porous oxide film formed on the other surface was prepared. Test materials.

[表1] [Table 1]

[耐蝕性氧化皮膜之厚度測定] [Measurement of thickness of corrosion resistant oxide film]

對以上述方法製作之供試材,藉由TEM實施耐蝕性氧化皮膜之截面觀察。具體上係測定耐蝕性氧化皮膜之厚度,並且觀察耐蝕性氧化皮膜之結構(皮膜層是否為單層結構)。為進行耐蝕性氧化皮膜之厚度測定以及耐蝕性氧化皮膜之結構觀察,使用超薄切片機從供試材製出截面觀察用薄片試料。接著在該薄片試料中選擇觀察視野(1μm×1μm)中之任意100點,藉由TEM截面觀察測定耐蝕性氧化皮膜之厚度以及觀察耐蝕性氧化皮膜是否為單層結構(單層結構視為○,非單層結構則視為×)。耐蝕性氧化皮膜之厚度為10~100nm且耐蝕性氧化皮膜為單層結構時的評估為合格(○),耐蝕性氧化皮膜之厚度不在10~100nm之範圍及耐蝕性氧化皮膜非為單層結構時之其中至少任一結果的評估為不合格(×)。以上結果顯示於表2。 The cross-section of the corrosion-resistant oxide film was carried out by TEM on the test material prepared by the above method. Specifically, the thickness of the corrosion-resistant oxide film was measured, and the structure of the corrosion-resistant oxide film (whether the film layer was a single-layer structure) was observed. In order to measure the thickness of the corrosion-resistant oxide film and the structure of the corrosion-resistant oxide film, a cross-sectional observation sheet sample was prepared from the test material using an ultramicrotome. Then, any 100 points of the observation field (1 μm × 1 μm) were selected in the sheet sample, and the thickness of the corrosion-resistant oxide film was measured by TEM cross-section observation and whether the corrosion-resistant oxide film was observed as a single-layer structure (single layer structure was regarded as ○) Non-single-layer structure is treated as ×). When the thickness of the corrosion-resistant oxide film is 10 to 100 nm and the corrosion-resistant oxide film is a single-layer structure, the evaluation is acceptable (○), the thickness of the corrosion-resistant oxide film is not in the range of 10 to 100 nm, and the corrosion-resistant oxide film is not a single-layer structure. At least one of the results is evaluated as unacceptable (x). The above results are shown in Table 2.

[表2] [Table 2]

[多孔性氧化皮膜之膜厚測定] [Measurement of film thickness of porous oxide film]

在多孔性氧化皮膜層中,亦藉由TEM實施截面觀察。具體上係測定多孔性氧化皮膜層中之多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層的厚度,以及多孔性氧化皮膜層之小孔直徑。為了測定該等,係使用超薄切片機從供試材製作出截面觀察用薄片試料。接著在該薄片試料中選擇觀察視野(1μm×1μm)中之任意100點,並藉由TEM截面觀察在各點測出多孔性氧化皮膜層中之多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層的厚度以及多孔性氧化皮膜層的小孔直徑。而求出以上述方式所測出之100點的多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層之合計厚度的最大值、最小值及算術平均值。又,亦檢查多孔型鋁氧化皮膜層與障蔽型鋁氧化皮膜層之合計厚度的變動幅度是否在算術平均值的±50%以內。具體上,令算術平均值為T(nm)時,包含最大值及最小值的全部合計厚度均在(0.5×T)~(1.5×T)之範圍時視為合格(○),不在範圍時則視為不合格(×)。而,在實施例24中係使用與相對電極相對向之側面。以上結果顯示於表2。 In the porous oxide film layer, cross-sectional observation was also carried out by TEM. Specifically, the thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer in the porous oxide film layer, and the pore diameter of the porous oxide film layer are measured. In order to measure these, a cross-sectional observation sheet sample was produced from the test material using an ultramicrotome. Then, any 100 points of the observation field (1 μm × 1 μm) were selected in the sheet sample, and the porous aluminum oxide film layer and the barrier aluminum oxide film in the porous oxide film layer were measured at various points by TEM cross-section observation. The thickness of the layer and the pore diameter of the porous oxide film layer. The maximum value, the minimum value, and the arithmetic mean of the total thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer measured at 100 points as described above were determined. Further, it was also examined whether or not the fluctuation range of the total thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer was within ±50% of the arithmetic mean value. Specifically, when the arithmetic mean value is T (nm), all the total thickness including the maximum value and the minimum value are regarded as qualified (○) in the range of (0.5×T) to (1.5×T), and when not in the range It is considered as unqualified (×). However, in the embodiment 24, the side opposite to the opposite electrode was used. The above results are shown in Table 2.

[耐蝕性氧化皮膜之耐蝕性評估] [Evaluation of Corrosion Resistance of Corrosion Oxide Film]

從各供試材準備10片切斷為長50mm且寬50mm之試驗片。耐蝕性試驗係依照鹽水噴霧試驗方法(JIS Z 2371)中記載之CASS試驗進行。將所得之陽極氧化處理品施行CASS試驗3小時後取出,測定耐蝕性氧化皮膜之腐蝕面積並進行腐蝕面積率之評估。在此,腐蝕面積率(%)係定為[(腐蝕面積)/(耐蝕性氧化皮膜之總面積)]×100。 Ten pieces of test pieces each having a length of 50 mm and a width of 50 mm were prepared from each test piece. The corrosion resistance test was carried out in accordance with the CASS test described in the salt spray test method (JIS Z 2371). The obtained anodized product was taken out after 3 hours of CASS test, and the corrosion area of the corrosion-resistant oxide film was measured and the corrosion area ratio was evaluated. Here, the corrosion area ratio (%) is defined as [(corrosion area) / (total area of corrosion-resistant oxide film)] × 100.

○:腐蝕面積率低於10% ○: Corrosion area ratio is less than 10%

△:腐蝕面積率在10%以上且低於50% △: The corrosion area ratio is 10% or more and less than 50%

×:腐蝕面積率在50%以上 ×: The corrosion area ratio is 50% or more

結果顯示於表3。該表中,分別顯示出10個試驗片中之上述○、△、×之個數,全部結果為○時判斷為合格,其以外之結果則判斷為不合格。 The results are shown in Table 3. In the table, the number of the above-mentioned ○, △, and × in the ten test pieces was shown, and when all the results were ○, it was judged as pass, and the other results were judged as unacceptable.

[表3] [table 3]

[耐蝕性氧化皮膜之膜質評估] [Evaluation of Membrane Quality of Corrosion Oxide Film]

藉由FT-IR測出耐蝕性氧化皮膜之尖峰吸收波數b(cm-1)及尖峰吸收波數b中之尖峰吸收率a(%)。FT-IR之偵測器(detector)係使用可測定廣範圍(400~4000cm-1)的波數者,試料面積係設為30mm×50mm。結果顯示於表3。該表中,尖峰吸收率a(%)與尖峰吸收波數b(cm-1)滿足1≦a≦95且尖峰吸收率a(%)及尖峰吸收波數b(cm-1)之關係滿足b≧3a+710的結果視為合格(○),不在範圍的結果則視為不合格(×)。 The peak absorption wave number b (cm -1 ) of the corrosion-resistant oxide film and the peak absorption rate a (%) in the peak absorption wave number b were measured by FT-IR. The detector of the FT-IR uses a wavenumber that can measure a wide range (400 to 4000 cm -1 ), and the sample area is set to 30 mm × 50 mm. The results are shown in Table 3. In the table, the relationship between the peak absorption rate a (%) and the peak absorption wave number b (cm -1 ) satisfying 1≦a ≦ 95 and the peak absorption rate a (%) and the peak absorption wave number b (cm -1 ) are satisfied. The result of b≧3a+710 is regarded as qualified (○), and the result of not being ranged is regarded as unqualified (×).

[多孔性氧化皮膜之接著劑接著性評估] [Adhesive adhesion evaluation of porous oxide film]

從供試材準備2片切斷為長50mm且寬25mm之試驗片。將該等2片供試材彼此沿著總寬度方向以接著寬度10mm將多孔性氧化皮膜之形成面彼此重疊,並藉由市售之2液型環氧接著劑(主劑=改質環氧樹脂、硬化劑=改質聚醯亞胺、重量混合比=主劑100/硬化劑100)將重疊部分黏著而製出剪切試驗片。藉由拉伸試驗機將2片供試材之長度方向的端部在10mm/分之速度下沿長度方向朝反方向拉伸,並藉由其荷重(換算成剪切應力)及剝離狀態以下述基準評估接著劑接著性。而,剪切試驗片係製出10組試驗片並針對各組進行評估。而,在實施例24中係使用與相對電極相對向之側面。 Two pieces of the test piece were cut into test pieces of 50 mm in length and 25 mm in width. The two test pieces were overlapped with each other along the total width direction by a width of 10 mm, and the surface of the porous oxide film was overlapped with each other, and a commercially available two-liquid epoxy adhesive (main agent = modified epoxy) Resin, hardener = modified polyimine, weight mixing ratio = main agent 100 / hardener 100) The overlapping portion was adhered to prepare a shear test piece. The end portions of the two test materials in the longitudinal direction were stretched in the longitudinal direction at a speed of 10 mm/min by a tensile tester, and their loads (converted to shear stress) and peeling state were used. The benchmark evaluates the adhesion of the adhesive. On the other hand, 10 test pieces were prepared by shearing test pieces and evaluated for each group. However, in the embodiment 24, the side opposite to the opposite electrode was used.

○:剪切應力在20N/mm2以上且接著劑層本身呈內聚破壞之狀態 ○: the shear stress is 20 N/mm 2 or more and the adhesive layer itself is in a state of cohesive failure.

△:雖剪切應力在20N/mm2以上,但接著劑層與供試材呈界面剝離之狀態 △: Although the shear stress is 20 N/mm 2 or more, the adhesive layer and the test material are interfacially peeled off.

×:剪切應力低於20N/mm2且接著劑層與供試材呈界面剝離之狀態 ×: the shear stress is lower than 20 N/mm 2 and the adhesive layer is interfacially peeled off from the test material.

結果顯示於表3。該表中,分別顯示出10組試驗片中之上述○、△、×之組數,全部結果為○時判斷為合格,其以外之結果則判斷為不合格。 The results are shown in Table 3. In the table, the number of the above-mentioned groups of ○, △, and × in the ten test pieces was shown, and when all the results were ○, it was judged as pass, and the other results were judged as unacceptable.

[多孔性氧化皮膜之塗膜密著性評估] [Evaluation of Coating Adhesion of Porous Oxide Film]

於上述供試材之多孔性氧化皮膜側的表面塗佈大日本塗料(股)製「V Flon #2000」並使其乾燥(160℃、20分),製作出形成有厚度30μm之樹脂塗膜的密著性試驗片。以依據JIS-K5600-5-6之方法,使用截切刀於該密著性試驗片之樹脂塗膜切出1mm棋盤狀刻痕。接著對試驗片在125℃下施行30分的蒸餾器浸漬處理後,立刻自處理液取出並拭除水分。對該試驗片施行利用透明感壓黏著膠帶之剝離試驗。藉由塗膜殘存率以下述基準評估密著性。而,密著性試驗片係從相同供試材製作出10個試驗片並針對各試驗片進行評估。而,在實施例24中係使用與相對電極相對向之側面。 On the surface of the porous oxide film side of the test material, "V Flon #2000" manufactured by Nippon Paint Co., Ltd. was applied and dried (160 ° C, 20 minutes) to prepare a resin coating film having a thickness of 30 μm. Adhesive test piece. A 1 mm checkerboard-like score was cut out from the resin coating film of the adhesion test piece by a cutting knife according to the method of JIS-K5600-5-6. Next, after the test piece was subjected to a distiller immersion treatment at 125 ° C for 30 minutes, it was taken out from the treatment liquid immediately and the water was removed. The test piece was subjected to a peeling test using a transparent pressure-sensitive adhesive tape. The adhesion was evaluated by the following criteria on the basis of the coating film residual ratio. On the other hand, in the adhesion test piece, 10 test pieces were produced from the same test piece and evaluated for each test piece. However, in the embodiment 24, the side opposite to the opposite electrode was used.

○:塗膜殘存率為100% ○: The residual rate of the coating film is 100%.

△:塗膜殘存率在75%以上且低於100% △: The residual rate of the coating film is 75% or more and less than 100%.

×:塗膜殘存率低於75% ×: The residual rate of the coating film is less than 75%

結果顯示於表3。該表中,分別顯示出10個試驗片中之上述○、△、×之個數,全部結果為○時判斷為合格,其以外之結果則判斷為不合格。 The results are shown in Table 3. In the table, the number of the above-mentioned ○, △, and × in the ten test pieces was shown, and when all the results were ○, it was judged as pass, and the other results were judged as unacceptable.

[綜合評估] [Comprehensive Evaluation]

耐蝕性氧化皮膜之耐蝕性評估與膜質評估、以及多孔 性氧化皮膜之接著劑接著性評估與塗膜密著性評估全部為合格者,其綜合評估視為合格,而該等各評估中之至少任一者為不合格之綜合評估則視為不合格。 Corrosion resistance evaluation and membrance evaluation of corrosion resistant oxide film, and porous The adhesion evaluation of the adhesion of the oxide film and the evaluation of the adhesion of the film are all qualified, and the comprehensive evaluation is regarded as qualified, and the comprehensive evaluation of at least one of the evaluations is considered as unqualified. .

如表2、3所示,在實施例1~24中,由於滿足本發明主要條件,因此耐蝕性氧化皮膜之耐蝕性及膜質良好,且多孔性氧化皮膜之接著劑接著性及塗膜密著性良好,綜合評估為合格。另一方面,在比較例1~13中因不滿足本發明主要條件,所以上述各評估中之至少一項為不合格,綜合評估即為不合格。 As shown in Tables 2 and 3, in Examples 1 to 24, since the main conditions of the present invention were satisfied, the corrosion resistance and the film quality of the corrosion-resistant oxide film were good, and the adhesiveness of the porous oxide film and the adhesion of the coating film were good. Good sex, comprehensive assessment is qualified. On the other hand, in Comparative Examples 1 to 13, since the main conditions of the present invention were not satisfied, at least one of the above evaluations was unacceptable, and the comprehensive evaluation was unacceptable.

具體上,比較例1中由於交流電解中之電解溶液的pH過低,因此鹼蝕刻力不足。所以,多孔型鋁氧化皮膜層中之小孔直徑不足,而障蔽型鋁氧化皮膜層之厚度變得過厚,多孔性氧化皮膜厚度之變動幅度過大。結果,多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 Specifically, in Comparative Example 1, since the pH of the electrolytic solution in the alternating current electrolysis was too low, the alkali etching force was insufficient. Therefore, the diameter of the small pores in the porous aluminum oxide film layer is insufficient, and the thickness of the barrier aluminum oxide film layer becomes too thick, and the variation of the thickness of the porous oxide film is excessively large. As a result, the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例2中,由於交流電解中之電解溶液的pH過高,因而過剩引發鹼蝕刻。所以,耐蝕性氧化皮膜之厚度不足且多孔型鋁氧化皮膜層之厚度不足,小孔直徑過大,又障蔽型鋁氧化皮膜層之厚度不足。結果,耐蝕性氧化皮膜之耐蝕性不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 2, since the pH of the electrolytic solution in the alternating current electrolysis was too high, the alkali etching was excessively caused. Therefore, the thickness of the corrosion-resistant oxide film is insufficient and the thickness of the porous aluminum oxide film layer is insufficient, the pore diameter is too large, and the thickness of the barrier aluminum oxide film layer is insufficient. As a result, the corrosion resistance of the corrosion-resistant oxide film was unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例3中,由於交流電解中之電解溶液的溫度過低,因而鹼蝕刻力不足。所以,障蔽型鋁氧化皮膜層之厚度變厚。又,多孔型鋁氧化皮膜層之小孔直徑變小。結 果,多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 3, since the temperature of the electrolytic solution in the alternating current electrolysis was too low, the alkali etching force was insufficient. Therefore, the thickness of the barrier aluminum oxide film layer becomes thick. Further, the pore diameter of the porous aluminum oxide film layer becomes small. Knot As a result, the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例4中,由於交流電解中之電解溶液的溫度過高,因而過剩引發鹼蝕刻。所以,耐蝕性氧化皮膜之厚度以及多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層之厚度不足。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 4, since the temperature of the electrolytic solution in the alternating current electrolysis was too high, the alkali etching was excessively caused. Therefore, the thickness of the corrosion-resistant oxide film and the thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer are insufficient. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例5中,交流電解之電解溶液中不存有已溶鋁。所以,電解反應初始急遽產生多孔性氧化皮膜的形成反應,而使多孔性氧化皮膜厚度之變動幅度變大。又,耐蝕性氧化皮膜之形成亦不均勻,且厚度不足。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 5, the dissolved aluminum was not present in the electrolytic solution of the alternating current electrolysis. Therefore, the initial reaction of the electrolytic reaction rapidly produces a formation reaction of the porous oxide film, and the fluctuation range of the thickness of the porous oxide film is increased. Further, the formation of the corrosion-resistant oxide film is also uneven and the thickness is insufficient. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例6中,交流電解之電解溶液中存有多量的已溶鋁。所以,障蔽型鋁氧化皮膜層之形成不均勻而局部性地形成膜厚的部分,多孔型鋁氧化皮膜層之小孔直徑變小。此外,多孔性氧化皮膜厚度之變動幅度變大。結果,多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 6, a large amount of dissolved aluminum was present in the electrolytic solution of the alternating current electrolysis. Therefore, the formation of the barrier-type aluminum oxide film layer is uneven and the film thickness is locally formed, and the pore diameter of the porous aluminum oxide film layer becomes small. Further, the variation range of the thickness of the porous oxide film becomes large. As a result, the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例7中,由於交流電解之頻率過低,因而電流之直流成分增強。所以,多孔型鋁氧化皮膜層的形成被抑制而厚度不足。結果,多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 7, since the frequency of the alternating current electrolysis was too low, the direct current component of the current was enhanced. Therefore, the formation of the porous aluminum oxide film layer is suppressed and the thickness is insufficient. As a result, the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例8中,由於交流電解之頻率過高,因而耐蝕性氧化皮膜及多孔型鋁氧化皮膜層的形成被抑制而各自的厚度不足。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 8, since the frequency of the alternating current electrolysis was too high, the formation of the corrosion-resistant oxide film and the porous aluminum oxide film layer was suppressed, and the respective thicknesses were insufficient. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例9中,由於交流電解之電流密度過低,因而耐蝕性氧化皮膜及多孔型鋁氧化皮膜層的形成被抑制而各自的厚度不足。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 9, since the current density of the alternating current electrolysis was too low, the formation of the corrosion-resistant oxide film and the porous aluminum oxide film layer was suppressed, and the respective thicknesses were insufficient. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例10中,由於交流電解之電流密度過高,因而多孔性氧化皮膜及耐蝕性氧化皮膜的形成不均勻。所以,耐蝕性氧化皮膜之厚度以及多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層的厚度變厚。又,多孔性氧化皮膜厚度之變動幅度變大。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 10, since the current density of the alternating current electrolysis was too high, the formation of the porous oxide film and the corrosion-resistant oxide film was uneven. Therefore, the thickness of the corrosion-resistant oxide film and the thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer become thick. Moreover, the fluctuation range of the thickness of the porous oxide film becomes large. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例11中,由於交流電解之電解時間過短,因而耐蝕性氧化皮膜之厚度以及多孔型鋁氧化皮膜層之厚度不足。又,多孔性氧化皮膜厚度之變動幅度變大。結果,耐蝕性氧化皮膜之耐蝕性及膜質不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 11, since the electrolysis time of the alternating current electrolysis was too short, the thickness of the corrosion-resistant oxide film and the thickness of the porous aluminum oxide film layer were insufficient. Moreover, the fluctuation range of the thickness of the porous oxide film becomes large. As a result, the corrosion resistance and the film quality of the corrosion-resistant oxide film were unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例12中,由於交流電解之電解時間過長,因 而多孔性氧化皮膜之形成過度進展。所以,多孔型鋁氧化皮膜層及障蔽型鋁氧化皮膜層的厚度變厚。結果,多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 12, since the electrolysis time of the alternating current electrolysis was too long, The formation of the porous oxide film is excessively advanced. Therefore, the thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer becomes thick. As a result, the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

比較例13中,交流電解之電解溶液中已溶鋁低於5ppm。所以,電解反應初始急遽產生多孔性氧化皮膜之形成反應,使多孔性氧化皮膜厚度之變動幅度變大。又,耐蝕性氧化皮膜之形成亦不均勻而使厚度不足。結果,耐蝕性氧化皮膜之耐蝕性不合格,以及多孔性氧化皮膜之接著劑接著性及塗膜密著性不合格,綜合評估即不合格。 In Comparative Example 13, the dissolved aluminum in the electrolytic solution of the alternating current electrolysis was less than 5 ppm. Therefore, the initial reaction of the electrolysis reaction rapidly causes the formation reaction of the porous oxide film to increase the variation range of the thickness of the porous oxide film. Further, the formation of the corrosion-resistant oxide film is not uniform and the thickness is insufficient. As a result, the corrosion resistance of the corrosion-resistant oxide film was unacceptable, and the adhesiveness of the adhesive of the porous oxide film and the adhesion of the coating film were unacceptable, and the overall evaluation was unacceptable.

產業上之可利用性 Industrial availability

依據本發明,可獲得一種鋁材表面的一部分耐蝕性佳且鋁材表面之其他部位接著性及密著性佳的表面處理鋁材。藉此,本發明之表面處理鋁材適合使用於僅鋁材之一部分需要接著性及密著性的鋁-樹脂接合構件及印刷接線基板等。 According to the present invention, it is possible to obtain a surface-treated aluminum material which is excellent in corrosion resistance of a part of the surface of the aluminum material and which has good adhesion and adhesion to other parts of the surface of the aluminum material. Therefore, the surface-treated aluminum material of the present invention is suitably used for an aluminum-resin joint member, a printed wiring board, and the like which require adhesiveness and adhesion only in one part of the aluminum material.

1‧‧‧表面處理鋁材 1‧‧‧Surface treated aluminum

2‧‧‧鋁材 2‧‧‧Aluminum

3‧‧‧耐蝕性氧化皮膜 3‧‧‧Corrosion resistant oxide film

Claims (8)

一種表面處理鋁材,其特徵在於含有:鋁材;耐蝕性氧化皮膜,係形成於該鋁材表面的一部分且具有單層結構;及多孔性氧化皮膜,係形成於前述鋁材表面之未形成耐蝕性氧化皮膜的部位;前述耐蝕性氧化皮膜具有10~100nm之厚度,且令由FT-IR分析而得之尖峰吸收波數為b(cm-1),尖峰吸收波數b中之尖峰吸收率為a(%)時,滿足1≦a≦95且b≧3a+710之關係;前述多孔性氧化皮膜係由形成於表面側且厚度20~500nm的多孔型鋁氧化皮膜層、及形成於基質側且厚度3~30nm的障蔽型鋁氧化皮膜層所構成,前述多孔型鋁氧化皮膜層上形成有直徑5~30nm之小孔,且形成於鋁材表面之多孔性氧化皮膜整體中,前述多孔型鋁氧化皮膜層與障蔽型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。 A surface-treated aluminum material comprising: an aluminum material; a corrosion-resistant oxide film formed on a part of the surface of the aluminum material and having a single-layer structure; and a porous oxide film formed on the surface of the aluminum material a portion of the corrosion-resistant oxide film; the corrosion-resistant oxide film has a thickness of 10 to 100 nm, and the peak absorption wave number obtained by FT-IR analysis is b (cm -1 ), and the peak absorption in the peak absorption wave number b When the ratio is a (%), the relationship between 1≦a≦95 and b≧3a+710 is satisfied; the porous oxide film is formed of a porous aluminum oxide film layer formed on the surface side and having a thickness of 20 to 500 nm, and formed thereon. a barrier-type aluminum oxide film layer having a thickness of 3 to 30 nm on the side of the substrate, and a pore having a diameter of 5 to 30 nm formed on the porous aluminum oxide film layer and formed on the entire porous oxide film on the surface of the aluminum material, The fluctuation range of the total thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer is within ±50% of the arithmetic mean of the total thickness. 如請求項1之表面處理鋁材,其中前述尖峰吸收波數b(cm-1)係來自Al-O之最強伸縮振動之尖峰的波數,且出現於720≦b≦995之範圍。 The surface-treated aluminum material of claim 1, wherein the peak absorption wave number b (cm -1 ) is a wave number from a peak of the strongest stretching vibration of Al-O, and appears in the range of 720 ≦ b ≦ 995. 如請求項1或2之表面處理鋁材,其中前述多孔型鋁氧化皮膜層之小孔的總孔面積相對於表觀上之表面積的比 為25~75%。 The surface-treated aluminum material of claim 1 or 2, wherein the ratio of the total pore area of the pores of the porous aluminum oxide film layer to the apparent surface area It is 25~75%. 一種表面處理鋁材之製造方法,其特徵在於使用要表面處理之鋁材的電極、相對電極及已接線於前述鋁材電極之導電材,以pH9~13、液溫35~85℃且已溶鋁濃度為5ppm以上且1000ppm以下之鹼性水溶液為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~60秒鐘之條件下進行交流電解處理,藉此於與相對電極相對向的前述鋁材表面形成多孔性氧化皮膜,並同時於與已接線於鋁材電極之導電材相對向的前述鋁材表面形成耐蝕性氧化皮膜。 A method for manufacturing a surface-treated aluminum material, which comprises using an electrode of a surface-treated aluminum material, a counter electrode, and a conductive material connected to the aluminum electrode, at a pH of 9 to 13, a liquid temperature of 35 to 85 ° C, and dissolved An alkaline aqueous solution having an aluminum concentration of 5 ppm or more and 1000 ppm or less is an electrolytic solution, and is subjected to an alternating current electrolysis treatment at a frequency of 10 to 100 Hz, a current density of 4 to 50 A/dm 2 , and an electrolysis time of 5 to 60 seconds. A porous oxide film is formed on the surface of the aluminum material facing the opposite electrode, and at the same time, a corrosion-resistant oxide film is formed on the surface of the aluminum material facing the conductive material connected to the aluminum electrode. 如請求項4之表面處理鋁材之製造方法,其中前述要表面處理之鋁材電極與相對電極同為平板狀,電解溶液中之前述已接線於鋁材電極之導電材的面積係欲使形成耐蝕性氧化皮膜之面積的80~150%,且前述導電材與鋁材之距離為1~50mm。 The method for producing a surface-treated aluminum material according to claim 4, wherein the aluminum electrode to be surface-treated and the opposite electrode are in the form of a flat plate, and the area of the conductive material in the electrolytic solution which has been connected to the electrode of the aluminum is intended to be formed. The area of the corrosion-resistant oxide film is 80 to 150%, and the distance between the conductive material and the aluminum material is 1 to 50 mm. 如請求項4或5之表面處理鋁材之製造方法,其中前述已接線於鋁材電極之導電材係由不鏽鋼材或銅材所構成。 A method of producing a surface-treated aluminum material according to claim 4, wherein the electrically conductive material that has been wired to the aluminum electrode is made of stainless steel or copper. 如請求項4至6中任一項之表面處理鋁材之製造方法,其係將導電材配置於前述鋁材電極之其中一面側並與該面相對向,且將相對電極配置於鋁材電極另一面側並與該面相對向,藉此於鋁材電極之前述其中一面形成耐蝕性氧化皮膜,並於前述另一面形成多孔性氧化皮膜。 The method for producing a surface-treated aluminum material according to any one of claims 4 to 6, wherein the conductive material is disposed on one side of the aluminum electrode and faces the surface, and the opposite electrode is disposed on the aluminum electrode. The other surface side faces the surface, whereby a corrosion-resistant oxide film is formed on one surface of the aluminum electrode, and a porous oxide film is formed on the other surface. 如請求項4至6中任一項之表面處理鋁材之製造方法,其係將相對電極配置於前述鋁材電極另一面側並與該面 相對向,將導電材配置在該另一面與相對電極之間並與鋁材電極另一面的一部分相對向,並將前述相對電極配置成與鋁材電極另一面的前述一部分互補之其他部位相對向,藉此於鋁材電極另一面的前述一部分形成耐蝕性氧化皮膜,並於鋁材電極之前述其他部位形成多孔性氧化皮膜。 The method for producing a surface-treated aluminum material according to any one of claims 4 to 6, wherein the opposite electrode is disposed on the other side of the aluminum electrode and is opposite to the surface In the opposing direction, the conductive material is disposed between the other surface and the opposite electrode and faces a portion of the other surface of the aluminum electrode, and the opposing electrode is disposed to face the other portion complementary to the other portion of the other surface of the aluminum electrode Thereby, a corrosion-resistant oxide film is formed on the other portion of the other surface of the aluminum electrode, and a porous oxide film is formed on the other portion of the aluminum electrode.
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