TW201435488A - Coating liquid for forming inorganic oxide coating film, inorganic oxide coating film, and display device - Google Patents

Coating liquid for forming inorganic oxide coating film, inorganic oxide coating film, and display device Download PDF

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TW201435488A
TW201435488A TW102136768A TW102136768A TW201435488A TW 201435488 A TW201435488 A TW 201435488A TW 102136768 A TW102136768 A TW 102136768A TW 102136768 A TW102136768 A TW 102136768A TW 201435488 A TW201435488 A TW 201435488A
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oxide film
metal oxide
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TWI637235B (en
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Kazuki Eguchi
Keita Murakaji
Kenichi Motoyama
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Nissan Chemical Ind Ltd
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    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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Abstract

Provided are: a coating liquid for forming a metal oxide coating film, said coating liquid being suitable for forming a metal oxide coating film that can be patterned a metal oxide coating film that is formed using the coating liquid and a highly reliable display device that is provided with the metal oxide coating film. This coating liquid for forming a metal oxide coating film contains metal alkoxide having a double bond in the structure, and a photosensitive polymer containing a photopolymerization initiator.

Description

無機氧化物被膜形成用塗佈液、無機氧化物被膜及顯示裝置 Coating liquid for forming an inorganic oxide film, inorganic oxide film, and display device

本發明係有關適合形成可圖型化之金屬氧化物被膜的金屬氧化物被膜形成用塗佈液、由該塗佈液所得之金屬氧化物被膜及具備該金屬氧化物被膜的顯示裝置。 The present invention relates to a coating liquid for forming a metal oxide film suitable for forming a moldable metal oxide film, a metal oxide film obtained from the coating liquid, and a display device including the metal oxide film.

近年,隨著智慧型手機之普及,同時行動電話之顯示畫面大型化。因此,積極開發可利用顯示器之顯示進行輸入操作之觸控面板。依據觸控面板時,由於不需要壓下式之開關等之輸入手段,故能夠實現顯示畫面之大型化。 In recent years, with the popularization of smart phones, the display screen of mobile phones has been enlarged. Therefore, a touch panel that can perform an input operation using the display of the display is actively developed. According to the touch panel, since the input means such as the switch of the push type is not required, the display screen can be enlarged.

觸控面板係檢測出以手指或筆等所接觸之操作區域的接觸位置。利用此功能,而將觸控面板作為輸入裝置使用。 The touch panel detects a contact position of an operation area that is contacted by a finger or a pen. With this function, the touch panel is used as an input device.

接觸位置之檢測方式例如有電阻膜方式或靜電容量方式等。電阻膜方式係使用對向之2片基板,而靜電容量方式可只使用1片基板。因此,依據靜電容量方式時,可構成薄型之觸控面板,因為適合行動設備等,所以近年已被 積極地開發。 The detection method of the contact position is, for example, a resistive film method or a capacitance method. The resistive film method uses two substrates that are opposed to each other, and the electrostatic capacitance method can use only one substrate. Therefore, according to the electrostatic capacity method, a thin touch panel can be constructed, and since it is suitable for mobile devices, etc., it has been Actively develop.

觸控面板係被組裝於液晶顯示裝置之顯示裝置內,可作為可檢測觸控位置之附觸控面板功能之顯示裝置使用。操作觸控面板者係經由觸控面板辨識顯示裝置,因此透明電極係使用具有光透過性優異的構件。例如使用ITO(氧化銦錫(Indium Tin Oxide))等之無機材料。又,層間絕緣膜為使用可圖型化,且絕緣性的丙烯酸系材料等。 The touch panel is assembled in a display device of a liquid crystal display device, and can be used as a display device with a touch panel function capable of detecting a touch position. Since the touch panel is used to recognize the display device via the touch panel, the transparent electrode is made of a member having excellent light transmittance. For example, an inorganic material such as ITO (Indium Tin Oxide) is used. Further, the interlayer insulating film is made of an acrylic material which is patterned and insulative.

通常,電極上配置絕緣膜層(OC2),此部分也可使用有機丙烯酸樹脂。使用有機丙烯酸樹脂製膜時,一般藉由微影進行圖型化(patterning)。此OC2的目的係保護透明電極,但是有機材料為薄膜,而作為保護膜的硬度不足。與ITO等之透明電極的密著性差,造成觸控面板之信賴性降低的原因之一。 Usually, an insulating film layer (OC2) is disposed on the electrode, and an organic acrylic resin can also be used in this portion. When a film is formed using an organic acrylic resin, patterning is generally performed by lithography. The purpose of this OC2 is to protect the transparent electrode, but the organic material is a film, and the hardness as a protective film is insufficient. The adhesion to a transparent electrode such as ITO is poor, which causes one of the reasons why the reliability of the touch panel is lowered.

這種狀況下,有進行檢討以無機材料為成分的金屬氧化物被膜。以無機材料為成分的膜時,一般硬度高,作為觸控面板之電極保護膜可期待具有高的信賴性。但是以無機材料為成分的金屬氧化物被膜,藉由上述圖型化之製膜困難。 In this case, a metal oxide film containing an inorganic material as a component is reviewed. When a film containing an inorganic material is used as a component, the hardness is generally high, and it is expected to have high reliability as an electrode protective film for a touch panel. However, it is difficult to form a metal oxide film containing an inorganic material as a film by the above-described patterning.

[先行技術文獻] [Advanced technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利第2881847號公報 [Patent Document 1] Japanese Patent No. 2881847

[發明概要] [Summary of the Invention]

本發明有鑑於上述問題點而完成者,本發明之目的係在於提供適合形成可圖型化之金屬氧化物被膜的金屬氧化物被膜形成用塗佈液。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a coating liquid for forming a metal oxide film which is suitable for forming a metal oxide film which can be patterned.

此外,提供以上述方法形成,信賴性優異的金屬氧化物被膜及具備該金屬氧化物被膜之信賴性優異的顯示元件。 In addition, a metal oxide film which is formed by the above method and which is excellent in reliability, and a display element which is excellent in reliability of the metal oxide film are provided.

發明人等為了解決上述課題,而精心研究結果,發現藉由將在含有雙鍵之金屬烷氧化物中添加含有光聚合起始劑的感光性聚合物的組成物使用於金屬氧化物被膜用塗佈液,可解決課題,遂完成本發明。即本發明係以下述為技術特徵。 In order to solve the above-mentioned problems, the inventors have intensively studied the results, and found that a composition for adding a photosensitive polymer containing a photopolymerization initiator to a metal alkoxide containing a double bond is used for coating a metal oxide film. The cloth liquid can solve the problem and the present invention is completed. That is, the present invention is characterized by the following.

(1)一種金屬氧化物被膜形成用塗佈液,其特徵係含有:在結構中含有雙鍵之金屬烷氧化物及具有光聚合起始劑之感光性聚合物。 (1) A coating liquid for forming a metal oxide film, which comprises a metal alkoxide containing a double bond in a structure and a photosensitive polymer having a photopolymerization initiator.

(2)如上述(1)項之金屬氧化物被膜形成用塗佈液,其中光聚合起始劑為介隔共價鍵被導入於感光性聚合物中。 (2) The coating liquid for forming a metal oxide film according to the above (1), wherein the photopolymerization initiator is introduced into the photosensitive polymer by a covalent bond.

(3)如上述(1)或(2)項之金屬氧化物被膜形成用塗佈液,其係含有下述式(I)表示之第1金屬 烷氧化物、以下述式(II)表示之第2金屬烷氧化物(alkoxide)及以下述式(III)表示之金屬鹽、有機溶劑、水、析出防止劑及含有光聚合起始劑之感光性聚合物。 (3) The coating liquid for forming a metal oxide film according to the above (1) or (2), which comprises the first metal represented by the following formula (I) The alkoxide, the second metal alkoxide represented by the following formula (II), the metal salt represented by the following formula (III), the organic solvent, water, the precipitation preventing agent, and the photosensitive agent containing the photopolymerization initiator Polymer.

M1(OR1)n (I) M 1 (OR 1 ) n (I)

(M1係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成群中選出之至少1種金屬。R1係表示碳數1~5之烷基或乙醯氧基。n表示2~5之整數。) (M 1 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc. R 1 represents an alkyl group having 1 to 5 carbon atoms or an ethoxy group. n represents an integer from 2 to 5.)

R2 mSi(OR3)4-m (II) R 2 m Si(OR 3 ) 4-m (II)

(R2係由乙烯基、苯乙烯基、苯基、萘基及丙烯醯基、甲基丙烯醯基或芳基所取代之碳數1~30之烷基所選出的有機基。R3為碳數1~5之烷基或乙醯基。m為1~3之整數。) (R 2 is an organic group selected from an alkyl group having 1 to 30 carbon atoms which is substituted by a vinyl group, a styryl group, a phenyl group, a naphthyl group and an acryloyl group, a methacrylanyl group or an aryl group. R 3 is An alkyl group having 1 to 5 carbon atoms or an ethylene group. m is an integer of 1 to 3.)

M2(X)k或M2之草酸鹽 (III) M 2 (X) k or M 2 oxalate (III)

(M2表示由鋁、銦、鋅、鋯、鉍、鑭、鉭、釔及鈰所成群中選出之至少1種金屬。X表示鹽酸、硝酸、硫酸、乙酸、胺基磺酸、磺酸、乙醯乙酸或乙醯丙酮(acetylacetonate)之殘基或此等鹼性鹽。k表示M2之價數)。 (M 2 represents at least one metal selected from the group consisting of aluminum, indium, zinc, zirconium, hafnium, tantalum, niobium, tantalum and niobium. X represents hydrochloric acid, nitric acid, sulfuric acid, acetic acid, aminosulfonic acid, sulfonic acid The residue of acetamidineacetic acid or acetylacetonate or such basic salt. k represents the valence of M 2 ).

(4)如上述第(1)~(3)項中任一項之金屬氧化物被膜形成用塗佈液,其中再含有以下述式(IV)表示之第3金屬烷氧化物。 (4) The coating liquid for forming a metal oxide film according to any one of the above (1) to (3), further comprising a third metal alkoxide represented by the following formula (IV).

R4 1M3(OR5)p-1 (IV) R 4 1 M 3 (OR 5 ) p-1 (IV)

(M3表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成群中選出之至少1種金屬。R4表示可被氫原子或氟原子取代,且可被鹵原子、乙烯基、環氧丙氧(glycidoxy)基、巰基、甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺基或脲基取代,且可具有雜原子之碳數1~20的烴基。R5表示碳數1~5的烷基。p為2~5之整數,l係p為3時,為1或2,p為4時,為1~3之整數,p為5時,為1~4之整數)。 (M 3 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc. R 4 represents a hydrogen atom or a fluorine atom, and may be substituted by a halogen atom or ethylene. a group having a carbon number of 1 to 20 which is substituted with a glycidoxy group, a mercapto group, a methacryloxy group, an acryloxy group, an isocyanate group, an amine group or a ureido group, and may have a hetero atom. 5 represents an alkyl group having 1 to 5 carbon atoms. p is an integer of 2 to 5, and when l is 3, it is 1 or 2, and when p is 4, it is an integer of 1 to 3, and when p is 5, it is 1 An integer of ~4).

(5)如上述第(1)~(4)項中任一項之金屬氧化物被膜形成用塗佈液,其中第2金屬烷氧化物之含量係相對於全金屬烷氧化物,為25莫耳%以上。 (5) The coating liquid for forming a metal oxide film according to any one of the above (1), wherein the content of the second metal alkoxide is 25 mol with respect to the total metal alkoxide. More than 8% of the ear.

(6)如上述第(1)~(5)項中任一項之金屬氧化物被膜形成用塗佈液,其中含有光聚合起始劑之感光性聚合物之含量係相對於金屬固形分,為20重量%以上。 (6) The coating liquid for forming a metal oxide film according to any one of the above (1), wherein the content of the photosensitive polymer containing the photopolymerization initiator is relative to the metal solid content. It is 20% by weight or more.

(7)如上述第(1)~(6)項中任一項之金屬氧化物被膜形成用塗佈液,其中前述析出防止劑係由N-甲基-吡咯烷酮、乙二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己二醇及此等之衍生物所成群中選出之至少1種。 The coating liquid for forming a metal oxide film according to any one of the above aspects, wherein the precipitation preventing agent is N-methyl-pyrrolidone, ethylene glycol, or dimethyl group. At least one selected from the group consisting of methotrexate, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and the like.

(8)如上述第(3)~(7)項中任一項之金屬氧化物被膜形成用塗佈液,其中金屬鹽之金屬原子之莫耳數(M2)與金屬烷氧化物之金屬原子之合計莫耳數(M)之比為0.01≦M2/M≦0.7。 (8) The coating liquid for forming a metal oxide film according to any one of the above items (3) to (7), wherein the metal atom of the metal salt has a molar number (M 2 ) and a metal alkoxide metal The ratio of the total number of moles (M) of atoms is 0.01 ≦ M 2 / M ≦ 0.7.

(9)如上述第(1)~(8)項中任一項之金屬氧化物被膜形成用塗佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物與鈦烷氧化物之混合物。 The coating liquid for forming a metal oxide film according to any one of the above-mentioned items, wherein the first metal alkoxide-based decane oxide or a partial condensate thereof and the titanium alkoxide a mixture.

(10)如上述第(3)~(9)項中任一項之金屬氧化物被膜形成用塗佈液,其中前述金屬鹽係金屬硝酸鹽、金屬硫酸鹽、金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺基磺酸鹽、金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯基丙酮酸鹽或此等之鹼性鹽。 The coating liquid for forming a metal oxide film according to any one of the above-mentioned items, wherein the metal salt is a metal nitrate, a metal sulfate, a metal acetate or a metal chloride. A metal oxalate, a metal amide sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetyl acetonate or an alkaline salt thereof.

(11)如上述第(3)~(10)項中任一項之金屬氧化物被膜形成用塗佈液,其中第1金屬烷氧化物係矽烷氧化物或其部分縮合物與鈦烷氧化物之混合物,有機溶劑包含烷二醇類或其單醚衍生物。 The coating liquid for forming a metal oxide film according to any one of the above-mentioned items, wherein the first metal alkoxide-based decane oxide or a partial condensate thereof and the titanium alkoxide A mixture of organic solvents comprising an alkanediol or a monoether derivative thereof.

(12)一種金屬氧化物被膜,其特徵係使用如上述第(1)~(11)項中任一項之金屬氧化物被膜形成用塗佈液而得。 (12) A metal oxide film obtained by using the coating liquid for forming a metal oxide film according to any one of the above items (1) to (11).

(13)一種金屬氧化物被膜,其特徵係使用具有1.50~1.70之範圍之折射率之如上述第(1)~(11)項中任一項之金屬氧化物被膜形成用塗佈液而得。 (13) A metal oxide film obtained by using the coating liquid for forming a metal oxide film according to any one of the above items (1) to (11), which has a refractive index in the range of 1.50 to 1.70. .

(14)一種顯示裝置,其特徵係具備如上述第(12)或(13)項之金屬氧化物被膜。 (14) A display device comprising the metal oxide film according to the above item (12) or (13).

本發明之金屬氧化物被膜形成用塗佈液可製作信賴性高的金屬氧化物被膜。又,藉由具備所得之金屬氧化物被膜,可提供信賴性高的顯示裝置。 The coating liquid for forming a metal oxide film of the present invention can produce a metal oxide film having high reliability. Moreover, by providing the obtained metal oxide film, it is possible to provide a display device with high reliability.

[實施發明的形態] [Formation of the Invention] <金屬氧化物被膜形成用塗佈液> <Coating liquid for forming a metal oxide film>

本發明之金屬氧化物被膜形成用塗佈液,其特徵係含有在結構中含有雙鍵的金屬烷氧化物及含有光聚合起始劑的感光性聚合物。 The coating liquid for forming a metal oxide film of the present invention is characterized by comprising a metal alkoxide containing a double bond in a structure and a photosensitive polymer containing a photopolymerization initiator.

特別是本發明之金屬氧化物被膜形成用塗佈液含有以下述式(I)表示之第1金屬烷氧化物(alkoxide)、以下述式(II)表示之第2金屬烷氧化物及以下述式(III)表示之金屬鹽、有機溶劑、水及析出防止劑及含有光聚合起始劑的感光性聚合物。 In particular, the coating liquid for forming a metal oxide film of the present invention contains a first metal alkoxide represented by the following formula (I), a second metal alkoxide represented by the following formula (II), and the following A metal salt represented by the formula (III), an organic solvent, water and a precipitation preventive agent, and a photosensitive polymer containing a photopolymerization initiator.

M1(OR1)n (I) M 1 (OR 1 ) n (I)

(M1係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成群中選出之至少1種金屬。R1係表示碳數1~5之烷基或乙醯氧基。n表示2~5之整數。) (M 1 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc. R 1 represents an alkyl group having 1 to 5 carbon atoms or an ethoxy group. n represents an integer from 2 to 5.)

R2 mSi(OR3)4-m (II) R 2 m Si(OR 3 ) 4-m (II)

(R2係由乙烯基、苯乙烯基、苯基、萘基及丙烯醯基、甲基丙烯醯基或芳基所取代之碳數1~30之烷基所選出的有機基。R3為碳數1~5之烷基或乙醯基(acetyl group)。m為1~3之整數。) (R 2 is an organic group selected from an alkyl group having 1 to 30 carbon atoms which is substituted by a vinyl group, a styryl group, a phenyl group, a naphthyl group and an acryloyl group, a methacrylanyl group or an aryl group. R 3 is An alkyl group having 1 to 5 carbon atoms or an acetyl group. m is an integer from 1 to 3.)

M2(X)k或M2之草酸鹽 (III) M 2 (X) k or M 2 oxalate (III)

(M2表示由鋁、銦、鋅、鋯、鉍、鑭、鉭、釔及鈰所成群中選出之至少1種金屬。X表示鹽酸、硝酸、硫酸、乙酸、胺基磺酸、磺酸、乙醯乙酸或乙醯丙酮之殘基或此等鹼性鹽。k表示M2之價數)。 (M 2 represents at least one metal selected from the group consisting of aluminum, indium, zinc, zirconium, hafnium, tantalum, niobium, tantalum and niobium. X represents hydrochloric acid, nitric acid, sulfuric acid, acetic acid, aminosulfonic acid, sulfonic acid The residue of acetamidineacetic acid or acetamidine or such basic salt. k represents the valence of M 2 ).

以下詳述本發明之金屬氧化物被膜形成用塗佈液及該金屬氧化物被膜形成用塗佈液所含有之各構成成分及彼等之較佳態樣。 The respective constituents contained in the coating liquid for forming a metal oxide film of the present invention and the coating liquid for forming the metal oxide film, and the preferred aspects thereof, will be described in detail below.

<第1金屬烷氧化物> <First metal alkoxide>

本發明之金屬氧化物被膜形成用塗佈液含有以下述式(I)表示之第1金屬烷氧化物。 The coating liquid for forming a metal oxide film of the present invention contains the first metal alkoxide represented by the following formula (I).

M1(OR1)n (I) M 1 (OR 1 ) n (I)

式(I)中,M1、R1及n係如上述定義。其中,M1較佳為矽、鈦、鋯或鋁,特佳為矽或鈦。又,n較佳為3或4。 In the formula (I), M 1 , R 1 and n are as defined above. Among them, M 1 is preferably ruthenium, titanium, zirconium or aluminum, and particularly preferably ruthenium or titanium. Also, n is preferably 3 or 4.

式(I)表示之金屬烷氧化物為使用矽烷氧化物或其部分縮合物時,可使用一般式(V)表示之化合物之1種或2種以上之混合物或部分縮合物(較佳為5聚物以下)。 When a metal alkoxide represented by the formula (I) is a decane oxide or a partial condensate thereof, one or a mixture of two or more compounds or a partial condensate (preferably 5) of the compound represented by the general formula (V) can be used. Polymer below).

Si(OR’)4 (V) Si(OR') 4 (V)

式(V)中,R’表示碳數1~5之烷基,較佳為碳數 1~3之烷基或乙醯基。 In the formula (V), R' represents an alkyl group having 1 to 5 carbon atoms, preferably a carbon number. 1 to 3 alkyl or ethyl fluorenyl.

更具體而言,矽烷氧化物可使用例如四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、四乙醯氧基矽烷等四烷氧基矽烷類等。 More specifically, as the decane oxide, for example, a tetraalkoxy decane such as tetramethoxy decane, tetraethoxy decane, tetrapropoxy decane, tetrabutoxy decane or tetraethoxy decane can be used.

另外,以式(I)表示之金屬烷氧化物,使用鈦烷氧化物或其部分縮合物時,可使用以一般式(VI)表示之化合物之1種或2種以上之混合物或部分縮合物(較佳為5聚物以下)。 In addition, when a titanium alkoxide or a partial condensate thereof is used as the metal alkoxide represented by the formula (I), one or a mixture of two or more compounds or a partial condensate of the compound represented by the general formula (VI) may be used. (preferably below the 5-mer).

Ti(OR”)4 (VI) Ti(OR") 4 (VI)

(R”表示碳數1~5之烷基。) (R" represents an alkyl group having 1 to 5 carbon atoms.)

式(VI)表示之金屬烷氧化物,具體而言,鈦烷氧化物可使用四乙氧基鈦(titanium tetraethoxide)、四丙氧基鈦、四丁氧基鈦等之四烷氧基鈦化合物或鈦酸正四丁酯四聚物(Tetrabutyl Orthotitanate Tetramer)等之部分縮合物等。 The metal alkoxide represented by the formula (VI), specifically, a tetraalkoxy titanium compound such as titanium tetraethoxide, tetrapropoxy titanium or tetrabutoxy titanium can be used as the titanium alkoxide. Or a partial condensate such as Tetrabutyl Orthotitanate Tetramer or the like.

以式(I)表示之金屬烷氧化物之其他例,例如有四乙氧基鋯、四丙氧基鋯、四丁氧基鋯(Zirconium tetrabutoxide)等之四烷氧基鋯化合物;三丁氧基鋁、三異丙氧基鋁、三乙氧基鋁等之三烷氧基鋁化合物;五丙氧基鉭、五丁氧基鉭等之五烷氧基鉭化合物等。 Other examples of the metal alkoxide represented by the formula (I) include, for example, a tetraalkoxy zirconium compound such as tetraethoxyzirconium, tetrapropoxyzirconium or zirconium tetrabutoxide; a trialkoxyaluminum compound such as a base aluminum, an aluminum triisopropoxide or a triethoxyaluminum; a pentamoxyquinone compound such as a pentapropyloxyanthracene or a pentabutoxyanthracene;

<第2金屬烷氧化物> <2nd metal alkoxide>

本發明之金屬氧化物被膜形成用塗佈液,較佳為含有以下述式(II)表示之第2金屬烷氧化物。 The coating liquid for forming a metal oxide film of the present invention preferably contains a second metal alkoxide represented by the following formula (II).

R2 mSi(OR3)4-m (II) R 2 m Si(OR 3 ) 4-m (II)

式(II)中,R2係由乙烯基、苯乙烯基、苯基、萘基及丙烯醯基、甲基丙烯醯基或芳基所取代之碳數1~30之烷基所選出的有機基。R3為碳數1~5之烷基或乙醯基。m為1~3之整數。苯基、萘基或芳基均具有芳香環,而芳香環在其結構中具有雙鍵,因此為具有雙鍵之基團。 In the formula (II), R 2 is an organic group selected from an alkyl group having 1 to 30 carbon atoms which is substituted by a vinyl group, a styryl group, a phenyl group, a naphthyl group and an acryloyl group, a methacrylanyl group or an aryl group. base. R 3 is an alkyl group having 1 to 5 carbon atoms or an ethylene group. m is an integer from 1 to 3. The phenyl group, the naphthyl group or the aryl group each have an aromatic ring, and the aromatic ring has a double bond in its structure, and thus is a group having a double bond.

式(II)表示之金屬烷氧化物之具體例,例如有乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三乙醯氧基矽烷、苯乙烯基三甲氧基矽烷、苯乙烯基三乙氧基矽烷、苯乙烯基三丙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三乙醯氧基矽烷、苯乙烯基三甲氧基矽烷、苯乙烯基三乙氧基矽烷、丙烯醯氧基丙基三甲氧基矽烷、丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷、甲基丙烯醯氧基丙基三乙氧基矽烷、烯丙基三乙氧基矽烷、甲基丙烯醯氧基丙基甲基二甲氧基矽烷、甲基丙烯醯氧基丙基甲基二乙氧基矽烷、甲基乙烯基二甲氧基矽烷、甲基乙烯基二乙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷等。此等可單獨使用或組合2種以上使用。 Specific examples of the metal alkoxide represented by the formula (II) include vinyl trimethoxy decane, vinyl triethoxy decane, vinyl triethoxy decane, styryl trimethoxy decane, and styrene. Triethoxy decane, styryl tripropoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, phenyl triethoxy decane, styryl trimethoxy decane, styrene Triethoxy decane, propylene methoxy propyl trimethoxy decane, propylene methoxy propyl triethoxy decane, methacryloxypropyl trimethoxy decane, methacryloxy methoxy propyl Triethoxy decane, allyl triethoxy decane, methacryloxypropyl methyl dimethoxy decane, methacryloxypropyl methyl diethoxy decane, methyl Vinyl dimethoxy decane, methyl vinyl diethoxy decane, diphenyl dimethoxy decane, diphenyl diethoxy decane, and the like. These may be used alone or in combination of two or more.

<第3金屬烷氧化物> <3rd metal alkoxide>

本發明之金屬氧化物被膜形成用塗佈液中,再將以下述式(IV)表示之第3金屬烷氧化物與上述第1金屬烷氧化物一同使用較佳。 In the coating liquid for forming a metal oxide film of the present invention, the third metal alkoxide represented by the following formula (IV) is preferably used together with the first metal alkoxide.

R4 1M3(OR5)p-1 (IV) R 4 1 M 3 (OR 5 ) p-1 (IV)

式(IV)中,M3、R2、R3及p係如上述定義。其中,M3較佳為矽、鈦、鋯或鋁,特佳為矽或鈦。 In the formula (IV), M 3 , R 2 , R 3 and p are as defined above. Among them, M 3 is preferably ruthenium, titanium, zirconium or aluminum, and particularly preferably ruthenium or titanium.

本發明之金屬氧化物被膜形成用塗佈液,因含有第2及第3金屬烷氧化物,而金屬氧化物被膜形成於由丙烯酸材等之有機材料所構成之膜上時,可緩和塗佈膜與有機膜間之熱伸縮性之差異。結果即使在有機膜上形成金屬氧化物被膜,也可防止金屬氧化物被膜產生龜裂。例如觸控面板中,上述層間絕緣膜等使用由丙烯酸材料所構成之有機膜,就算在其上再形成金屬氧化物被膜,也可防止層間絕緣膜上之金屬氧化物被膜產生龜裂。 When the coating liquid for forming a metal oxide film of the present invention contains the second and third metal alkoxides and the metal oxide film is formed on a film made of an organic material such as an acrylic material, the coating can be relaxed. The difference in thermal stretchability between the film and the organic film. As a result, even if a metal oxide film is formed on the organic film, cracking of the metal oxide film can be prevented. For example, in the touch panel, an organic film made of an acrylic material is used for the interlayer insulating film or the like, and even if a metal oxide film is formed thereon, cracking of the metal oxide film on the interlayer insulating film can be prevented.

第2金屬烷氧化物之含量係相對於金屬氧化物被膜形成用塗佈液所含之金屬烷氧化物的合計量,較佳為25莫耳%以上,更佳為30莫耳%以上。 The content of the second metal alkoxide is preferably 25 mol% or more, and more preferably 30 mol% or more, based on the total amount of the metal alkoxide contained in the coating liquid for forming a metal oxide film.

第2金屬烷氧化物之含量未達25莫耳%時,與所添加之含有光聚合起始劑之感光性聚合物的相溶性差,製膜時,膜會產生白化或無法得到充分之圖型化性等的現象。 When the content of the second metal alkoxide is less than 25 mol%, the compatibility with the photosensitive polymer containing the photopolymerization initiator added is inferior, and when the film is formed, the film is whitened or a sufficient image cannot be obtained. A phenomenon such as characterization.

第2金屬烷氧化物使用於本發明之金屬氧化物被膜形成用塗佈液時,本發明之金屬氧化物被膜形成用塗佈液所含之金屬烷氧化物之合計之含量,較佳為0.5~20重量%,更佳為1~15重量%。此比率較大時,金屬氧化物被膜形成用塗佈液之儲藏安定性變差,且金屬氧化物被膜之膜厚控制變得困難。此外,此比率較小時,所得之金屬氧化物被膜之厚度變薄,為了得到所定膜厚時,必須塗佈多次。 When the second metal alkoxide is used in the coating liquid for forming a metal oxide film of the present invention, the total content of the metal alkoxide contained in the coating liquid for forming a metal oxide film of the present invention is preferably 0.5. ~20% by weight, more preferably 1~15% by weight. When the ratio is large, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the film thickness control of the metal oxide film is difficult. Further, when the ratio is small, the thickness of the obtained metal oxide film is reduced, and in order to obtain a predetermined film thickness, it is necessary to apply a plurality of times.

以式(III)表示之較佳的金屬烷氧化物,例如M3為矽時,例如有以下的化合物。 When a preferred metal alkoxide represented by the formula (III), for example, M 3 is ruthenium, for example, the following compounds are mentioned.

例如有甲基三甲氧基矽烷、甲基三丙氧基矽烷、甲基三乙醯氧基矽烷、甲基三丁氧基矽烷、甲基三戊氧基矽烷、甲基三戊氧基矽烷、甲基三苯氧基矽烷、甲基三苄氧基矽烷、甲基三苯乙氧基矽烷、縮水甘油氧基甲基三甲氧基矽烷、縮水甘油氧基甲基三乙氧基矽烷、α-縮水甘油氧基乙基三甲氧基矽烷、α-縮水甘油氧基乙基三乙氧基矽烷、β-縮水甘油氧基乙基三甲氧基矽烷、β-縮水甘油氧基乙基三乙氧基矽烷、α-縮水甘油氧基丙基三甲氧基矽烷、α-縮水甘油氧基丙基三乙氧基矽烷、β-縮水甘油氧基丙基三甲氧基矽烷、β-縮水甘油氧基丙基三乙氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、γ-縮水甘油氧基丙基三乙氧基矽烷、γ-縮水甘油氧基丙基三丙氧基矽烷、γ-縮水甘油氧基丙基三丁氧基矽烷、γ-縮水甘油氧基丙基三苯氧基矽烷、α-縮水甘油氧基丁基三甲氧基矽烷、α-縮水甘油氧基丁基三乙氧基矽烷、β-縮水甘油氧基丁基三乙氧基矽烷、γ-縮水甘油氧基丁基三甲氧基矽烷、γ-縮水甘油氧基丁基三乙氧基矽烷、δ-縮水甘油氧基丁基三甲氧基矽烷、δ-縮水甘油氧基丁基三乙氧基矽烷、(3,4-環氧基環己基)甲基三甲氧基矽烷、(3,4-環氧基環己基)甲基三乙氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、β-(3,4-環氧基環己基)乙基三乙氧基矽烷、β-(3,4-環氧基環己基)乙基三丙氧基矽烷、β-(3,4-環氧基環己基) 乙基三丁氧基矽烷、β-(3,4-環氧基環己基)乙基三苯氧基矽烷、γ-(3,4-環氧基環己基)丙基三甲氧基矽烷、γ-(3,4-環氧基環己基)丙基三乙氧基矽烷、δ-(3,4-環氧基環己基)丁基三甲氧基矽烷、δ-(3,4-環氧基環己基)丁基三乙氧基矽烷、縮水甘油氧基甲基甲基二甲氧基矽烷、縮水甘油氧基甲基甲基二乙氧基矽烷、α-縮水甘油氧基乙基甲基二甲氧基矽烷、α-縮水甘油氧基乙基甲基二乙氧基矽烷、β-縮水甘油氧基乙基甲基二甲氧基矽烷、β-縮水甘油氧基乙基乙基二甲氧基矽烷、α-縮水甘油氧基丙基甲基二甲氧基矽烷、α-縮水甘油氧基丙基甲基二乙氧基矽烷、β-縮水甘油氧基丙基甲基二甲氧基矽烷、β-縮水甘油氧基丙基乙基二甲氧基矽烷、γ-縮水甘油氧基丙基甲基二甲氧基矽烷、γ-縮水甘油氧基丙基甲基二乙氧基矽烷、γ-縮水甘油氧基丙基甲基二丙氧基矽烷、γ-縮水甘油氧基丙基甲基二丁氧基矽烷、γ-縮水甘油氧基丙基甲基二苯氧基矽烷、γ-縮水甘油氧基丙基乙基二甲氧基矽烷、γ-縮水甘油氧基丙基乙基二乙氧基矽烷、γ-縮水甘油氧基丙基乙烯基二甲氧基矽烷、γ-縮水甘油氧基丙基乙烯基二乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基三乙醯氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基三乙氧基矽烷、β-氰基乙基三乙氧基矽烷、氯甲基三甲氧基矽烷、氯甲基三乙氧基矽烷、N-(β-胺基乙基)γ-胺基丙基三甲氧基矽烷、N-(β-胺基乙 基)γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、N-(β-胺基乙基)γ-胺基丙基三乙氧基矽烷、N-(β-胺基乙基)γ-胺基丙基甲基二乙氧基矽烷、二甲基二甲氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基甲基二乙氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、二甲基二乙醯氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-巰基甲基二乙氧基矽烷、γ-脲基丙基三乙氧基矽烷、γ-脲基丙基三甲氧基矽烷、γ-脲基丙基三丙氧基矽烷、(R)-N-1-苯基乙基-N’-三乙氧基矽烷基丙基脲、(R)-N-1-苯基乙基-N’-三甲氧基矽烷基丙基脲、3-異氰酸酯基丙基三乙氧基矽烷、三氟丙基三甲氧基矽烷、溴丙基三乙氧基矽烷、二乙基二乙氧基矽烷、二乙基二甲氧基矽烷、三甲基乙氧基矽烷、三甲基甲氧基矽烷等。此等可單獨使用,或組合2種以上使用。 For example, methyltrimethoxydecane, methyltripropoxydecane, methyltriethoxydecane, methyltributoxydecane, methyltripentyloxydecane, methyltripentyloxydecane, Methyltriphenoxydecane, methyltribenzyloxydecane, methyltriphenylethoxydecane, glycidoxymethyltrimethoxydecane, glycidoxymethyltriethoxydecane, α- Glycidoxyethyl trimethoxy decane, α-glycidoxyethyl triethoxy decane, β-glycidoxyethyl trimethoxy decane, β-glycidoxyethyl triethoxy Decane, α-glycidoxypropyltrimethoxydecane, α-glycidoxypropyltriethoxydecane, β-glycidoxypropyltrimethoxydecane, β-glycidoxypropyl Triethoxy decane, γ-glycidoxypropyl trimethoxy decane, γ-glycidoxypropyl triethoxy decane, γ-glycidoxypropyl tripropoxy decane, γ-shrinkage Glycidoxypropyl tributoxy decane, γ-glycidoxypropyl triphenoxy decane, α-glycidoxy butyl Methoxy decane, α-glycidoxybutyl triethoxy decane, β-glycidoxy butyl triethoxy decane, γ-glycidoxy butyl trimethoxy decane, γ-glycidol Oxybutyl triethoxy decane, δ-glycidoxy butyl trimethoxy decane, δ-glycidoxy butyl triethoxy decane, (3,4-epoxycyclohexyl)methyl Trimethoxydecane, (3,4-epoxycyclohexyl)methyltriethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, β-(3,4 -Epoxycyclohexyl)ethyltriethoxydecane, β-(3,4-epoxycyclohexyl)ethyltripropoxydecane, β-(3,4-epoxycyclohexyl) Ethyl tributoxy decane, β-(3,4-epoxycyclohexyl)ethyltriphenoxydecane, γ-(3,4-epoxycyclohexyl)propyltrimethoxydecane, γ -(3,4-epoxycyclohexyl)propyltriethoxydecane, δ-(3,4-epoxycyclohexyl)butyltrimethoxydecane, δ-(3,4-epoxy Cyclohexyl)butyltriethoxydecane, glycidoxymethylmethyldimethoxydecane, glycidoxymethylmethyldiethoxydecane, α-glycidoxyethylmethyldi Methoxydecane, α-glycidoxyethylmethyldiethoxydecane, β-glycidoxyethylmethyldimethoxydecane, β-glycidoxyethylethyldimethoxy Baseline, α-glycidoxypropylmethyldimethoxydecane, α-glycidoxypropylmethyldiethoxydecane, β-glycidoxypropylmethyldimethoxydecane , β-glycidoxypropylethyldimethoxydecane, γ-glycidoxypropylmethyldimethoxydecane, γ-glycidoxypropylmethyldiethoxydecane, γ - glycidoxypropylmethyldipropoxydecane, γ-shrink Glyceroxypropylmethyldibutoxydecane, γ-glycidoxypropylmethyldiphenoxydecane, γ-glycidoxypropylethyldimethoxydecane, γ-glycidyloxy Propyl ethyl diethoxy decane, γ-glycidoxypropyl vinyl dimethoxy decane, γ-glycidoxypropyl vinyl diethoxy decane, ethyl trimethoxy decane, Ethyltriethoxydecane, γ-chloropropyltrimethoxydecane, γ-chloropropyltriethoxydecane, γ-chloropropyltriethoxydecane, 3,3,3-trifluoropropane Trimethoxy decane, γ-mercaptopropyltrimethoxydecane, γ-mercaptopropyltriethoxydecane, β-cyanoethyltriethoxydecane, chloromethyltrimethoxydecane, chloromethyl Triethoxydecane, N-(β-aminoethyl)γ-aminopropyltrimethoxydecane, N-(β-amino B Γ-aminopropylmethyldimethoxydecane, γ-aminopropylmethyldimethoxydecane, N-(β-aminoethyl)γ-aminopropyltriethoxy Decane, N-(β-aminoethyl)γ-aminopropylmethyldiethoxydecane, dimethyldimethoxydecane, phenylmethyldimethoxydecane, dimethyldiethyl Oxydecane, phenylmethyldiethoxydecane, γ-chloropropylmethyldimethoxydecane, γ-chloropropylmethyldiethoxydecane, dimethyldiethoxydecane, Γ-mercaptopropylmethyldimethoxydecane, γ-mercaptomethyldiethoxydecane, γ-ureidopropyltriethoxydecane, γ-ureidopropyltrimethoxydecane, γ-urea Propyltripropoxydecane, (R)-N-1-phenylethyl-N'-triethoxydecylpropylurea, (R)-N-1-phenylethyl-N' -trimethoxydecyl propyl urea, 3-isocyanate propyl triethoxy decane, trifluoropropyltrimethoxy decane, bromopropyltriethoxy decane, diethyldiethoxy decane, two Ethyldimethoxydecane, trimethylethoxysilane, trimethylmethoxydecane, and the like. These may be used alone or in combination of two or more.

又,本發明之金屬氧化物被膜形成用塗佈液中,除了第1金屬烷氧化物、第2金屬烷氧化物外,在不損及本發明之效果的範圍內,可含有其他的金屬烷氧化物。 Further, in the coating liquid for forming a metal oxide film of the present invention, in addition to the first metal alkoxide and the second metal alkoxide, other metal alkane may be contained within a range that does not impair the effects of the present invention. Oxide.

<金屬鹽> <metal salt>

本發明之金屬氧化物被膜形成用塗佈液所含有的金屬鹽係以下述式(III)表示。 The metal salt contained in the coating liquid for forming a metal oxide film of the present invention is represented by the following formula (III).

M2(X)k或M2之草酸鹽 (III) M 2 (X) k or M 2 oxalate (III)

式(III)中,M2、X及k係如上述定義。其中,M2 表示鋁、銦、鈰、鋯較佳。X表示鹽酸、硝酸、乙酸、磺酸、乙醯乙酸或乙醯丙酮之殘基或此等鹼性鹽較佳。上述X中之各酸之殘基,例如硝酸也稱為硝酸根,硫酸也稱為硫酸根,其係含有成為與M2之價數等價的量。又,鹼性鹽係指上述各酸之殘基中含有OH基的情形。 In the formula (III), M 2 , X and k are as defined above. Among them, M 2 represents aluminum, indium, bismuth, and zirconium. X represents a residue of hydrochloric acid, nitric acid, acetic acid, sulfonic acid, acetamidineacetic acid or acetamidineacetone or such a basic salt is preferred. The residue of each acid in the above X, for example, nitric acid is also called nitrate, and sulfuric acid is also called sulfate, which contains an amount equivalent to the valence of M 2 . Further, the basic salt means a case where an OH group is contained in the residue of each of the above acids.

式(III)表示之金屬鹽中,特佳為硝酸鹽、氯化物鹽、草酸鹽或其鹼性鹽。其中,從取得之容易性與金屬氧化物被膜形成用塗佈液之儲藏安定性的觀點,更佳為鋁、銦或鈰之硝酸鹽。 Among the metal salts represented by the formula (III), a nitrate, a chloride salt, an oxalate or an alkali salt thereof is particularly preferred. In particular, from the viewpoint of ease of availability and storage stability of the coating liquid for forming a metal oxide film, it is more preferably a nitrate of aluminum, indium or bismuth.

金屬氧化物被膜形成用塗佈液所含之金屬鹽之含量,係構成金屬烷氧化物之金屬原子之合計莫耳數(M)與上述金屬鹽之金屬原子之莫耳數(M2)之合計的含有比率,較佳為滿足下述之比率(莫耳比)者。 The content of the metal salt contained in the coating liquid for forming a metal oxide film is the total number of moles (M) of metal atoms constituting the metal alkoxide and the number of moles (M 2 ) of the metal atom of the above metal salt. The total content ratio is preferably one that satisfies the ratio (mol ratio) described below.

0.01≦M2/M≦0.7 0.01≦M 2 /M≦0.7

此比率小於0.01時,所得之被膜之機械強度不足,故不佳。又,超過0.7時,塗佈膜對於玻璃基板或透明電極等之基材的密著性會降低。此外,以450℃以下之低溫燒成時,所得之金屬氧化物被膜之耐藥品性有降低的傾向。其中,此比率更佳為0.01~0.6。 When the ratio is less than 0.01, the mechanical strength of the obtained film is insufficient, which is not preferable. Moreover, when it exceeds 0.7, the adhesiveness of the coating film to the base material, such as a glass substrate and a transparent electrode, will fall. Further, when firing at a low temperature of 450 ° C or lower, the chemical resistance of the obtained metal oxide film tends to be lowered. Among them, the ratio is preferably 0.01 to 0.6.

<有機溶劑> <organic solvent>

本發明之金屬氧化物被膜形成用塗佈液中含有有機溶劑。該有機溶劑係在由金屬氧化物被膜形成用塗佈液形成其塗膜,得到金屬氧化物被膜時,調整金屬氧化物被膜形 成用塗佈液之黏度,改善塗佈性用者。 The coating liquid for forming a metal oxide film of the present invention contains an organic solvent. In the organic solvent, when a coating film is formed from a coating liquid for forming a metal oxide film to obtain a metal oxide film, the metal oxide film shape is adjusted. The viscosity of the coating liquid is used to improve the applicability.

金屬氧化物被膜形成用塗佈液中之有機溶劑之含量係相對於金屬氧化物被膜形成用塗佈液所含之全金屬烷氧化物,較佳為80~99.5重量%,更佳為85~99重量%。有機溶劑之含量較少時,所得之金屬氧化物被膜之厚度變薄,為了得到所定膜厚時,必須塗佈多數次。含量較多時,金屬氧化物被膜形成用塗佈液之儲藏安定性變差,且金屬氧化物被膜之膜厚控制困難。 The content of the organic solvent in the coating liquid for forming a metal oxide film is preferably from 80 to 99.5% by weight, more preferably from 85 to 99.5% by weight based on the total metal alkoxide contained in the coating liquid for forming a metal oxide film. 99% by weight. When the content of the organic solvent is small, the thickness of the obtained metal oxide film is reduced, and in order to obtain a predetermined film thickness, it is necessary to apply a plurality of times. When the content is large, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the film thickness of the metal oxide film is difficult to control.

本發明之金屬氧化物被膜形成用塗佈液所用的有機溶劑,例如有甲醇、乙醇、丙醇、丁醇、2-甲基-1-丙醇、2-甲基-2-丙醇等醇類;乙酸乙酯等酯類;乙二醇等二醇類或彼等之酯衍生物;二乙醚等醚類;丙酮、甲基乙基酮、環己酮等酮類;苯、甲苯等之芳香族烴類等。此等可單獨或組合使用。 The organic solvent used for the coating liquid for forming a metal oxide film of the present invention may, for example, be an alcohol such as methanol, ethanol, propanol, butanol, 2-methyl-1-propanol or 2-methyl-2-propanol. Ethyl esters such as ethyl acetate; glycols such as ethylene glycol or ester derivatives thereof; ethers such as diethyl ether; ketones such as acetone, methyl ethyl ketone and cyclohexanone; benzene, toluene, etc. Aromatic hydrocarbons, etc. These can be used singly or in combination.

金屬氧化物被膜形成用塗佈液中,含有烷氧基鈦成分時,有機溶劑中所含之烷二醇類或其單醚,例如有乙二醇、二乙二醇、丙二醇、己二醇或彼等之單甲醚、單乙醚、單丙醚、單丁醚或單苯醚等。 In the coating liquid for forming a metal oxide film, when the titanium alkoxide component is contained, the alkylene glycol or the monoether thereof contained in the organic solvent may, for example, be ethylene glycol, diethylene glycol, propylene glycol or hexanediol. Or their monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether.

本發明之金屬氧化物被膜形成用塗佈液所用之有機溶劑中所含之二醇類或其單醚,相對於烷氧基鈦之莫耳比未達1時,對於烷氧基鈦之安定性,效果較少,金屬氧化物被膜形成用塗佈液之儲藏安定性變差。另外,使用多量之二醇類或其單醚並無任何問題。例如,金屬氧化物被膜形成用塗佈液所用之有機溶劑的全部為上述二醇類 或其單醚也無妨。然而,金屬氧化物被膜形成用塗佈液不含烷氧基鈦時,不需特別含有上述二醇及/或其單醚。 When the diol or its monoether contained in the organic solvent used for the coating liquid for forming a metal oxide film of the present invention has a molar ratio of less than 1 to the alkoxide titanium, the stability of the titanium alkoxide The properties and effects are small, and the storage stability of the coating liquid for forming a metal oxide film is deteriorated. In addition, there is no problem in using a large amount of the glycol or its monoether. For example, all of the organic solvents used for the coating liquid for forming a metal oxide film are the above-mentioned glycols. Or its monoether is no problem. However, when the coating liquid for forming a metal oxide film does not contain titanium alkoxide, it is not necessary to particularly contain the above diol and/or its monoether.

<析出防止劑> <Precipitation inhibitor>

本發明之金屬氧化物被膜形成用塗佈液,較佳為含有析出防止劑。本發明中之析出防止劑係指由金屬氧化物被膜形成用塗佈液形成塗佈被膜時,具有防止塗膜中析出金屬鹽之功能的有機溶劑。析出防止劑例如有N-甲基-吡咯烷酮、二甲基甲醯胺、二甲基乙醯胺、乙二醇、二乙二醇、丙二醇或己二醇或彼等之衍生物等。其中,較佳為N-甲基-吡咯烷酮、乙二醇、二乙二醇、丙二醇、己二醇或彼等之衍生物。析出防止劑可使用至少1種以上。 The coating liquid for forming a metal oxide film of the present invention preferably contains a precipitation preventing agent. The precipitation preventing agent in the present invention refers to an organic solvent having a function of preventing precipitation of a metal salt in the coating film when the coating film is formed from the coating liquid for forming a metal oxide film. The precipitation preventing agent is, for example, N-methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol, propylene glycol or hexanediol or derivatives thereof. Among them, preferred are N-methyl-pyrrolidone, ethylene glycol, diethylene glycol, propylene glycol, hexanediol or derivatives thereof. At least one type of the precipitation inhibitor can be used.

金屬氧化物被膜形成用塗佈液中之析出防止劑的含量係將上述金屬鹽之金屬換算成金屬氧化物,以滿足下述比率(重量比)內使用較佳。 The content of the precipitation preventing agent in the coating liquid for forming a metal oxide film is preferably such that the metal of the metal salt is converted into a metal oxide to satisfy the following ratio (weight ratio).

(析出防止劑/金屬氧化物)≧1。 (Precipitation inhibitor/metal oxide) ≧1.

上述比率未達1時,被膜形成時,金屬鹽之析出防止效果變小。另外,使用多量析出防止劑,雖對於金屬氧化物被膜形成用塗佈液無任何影響,但是較佳為200以下。 When the ratio is less than 1, when the film is formed, the effect of preventing precipitation of the metal salt becomes small. Further, the use of a large amount of the precipitation preventing agent does not have any influence on the coating liquid for forming a metal oxide film, but is preferably 200 or less.

析出防止劑可在金屬烷氧化物,特別是矽烷氧化物、鈦烷氧化物或矽烷氧化物與鈦烷氧化物在金屬鹽存在下水解、縮合反應時添加,亦可在水解、縮合反應結束後添加。 The precipitation inhibitor may be added during the hydrolysis or condensation reaction of the metal alkoxide, particularly the decane oxide, the titanium alkoxide or the decane oxide and the titanium alkoxide in the presence of the metal salt, or after the hydrolysis and condensation reaction Add to.

<感光性聚合物> <Photosensitive polymer>

本發明之金屬氧化物被膜形成用塗佈液所含有之感光性聚合物係含有可溶於鹼之有機基及聚合性基的聚合物。 The photosensitive polymer contained in the coating liquid for forming a metal oxide film of the present invention contains a polymer soluble in an alkali group and a polymerizable group.

聚合物例如有使用丙烯酸酯、甲基丙烯酸酯、丙烯醯胺、甲基丙烯醯胺、苯乙烯等之具有不飽和雙鍵之單體,進行共聚合而所得之聚合物。 The polymer is, for example, a polymer obtained by copolymerization using a monomer having an unsaturated double bond such as acrylate, methacrylate, acrylamide, methacrylamide or styrene.

可溶於鹼之有機基例如具有羧基、酚性羥基、酸酐基、順丁烯二醯亞胺基的有機基等。 The alkali-soluble organic group is, for example, an organic group having a carboxyl group, a phenolic hydroxyl group, an acid anhydride group, a maleimide group, or the like.

具有羧基之有機基,例如有丙烯酸、甲基丙烯酸、巴豆酸(Crotonic acid)、單-(2-(丙烯醯氧基)乙基)苯二甲酸酯、單-(2-(甲基丙烯醯氧基)乙基)苯二甲酸酯、N-(羧基苯基)順丁烯二醯亞胺、N-(羧基苯基)甲基丙烯醯胺、N-(羧基苯基)丙烯醯胺、4-乙烯基苯甲酸等。 An organic group having a carboxyl group such as acrylic acid, methacrylic acid, Crotonic acid, mono-(2-(acryloxy)ethyl)phthalate, mono-(2-(methacryl)醯oxy)ethyl)phthalate, N-(carboxyphenyl)maleimide, N-(carboxyphenyl)methacrylamide, N-(carboxyphenyl)propene oxime Amine, 4-vinylbenzoic acid, and the like.

具有酚性羥基之有機基,例如有羥基苯乙烯、N-(羥基苯基)丙烯醯胺、N-(羥基苯基)甲基丙烯醯胺、N-(羥基苯基)順丁烯二醯亞胺等。 An organic group having a phenolic hydroxyl group, for example, hydroxystyrene, N-(hydroxyphenyl)acrylamide, N-(hydroxyphenyl)methacrylamide, N-(hydroxyphenyl)butylene Imine and the like.

具有酸酐基之有機基,例如有馬來酸酐、伊康酸酐等。 The organic group having an acid anhydride group is, for example, maleic anhydride, itaconic anhydride or the like.

具有順丁烯二醯亞胺基之有機基,例如有順丁烯二醯亞胺。 An organic group having a maleimide group such as maleimide.

聚合性基之具體例有丙烯酸酯基、甲基丙烯酸酯基、乙烯基、烯丙基等,但是不限於此等。 Specific examples of the polymerizable group include an acrylate group, a methacrylate group, a vinyl group, an allyl group, and the like, but are not limited thereto.

這種化合物之具體例有二季戊四醇六丙烯酸酯、二季 戊四醇六甲基丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇五甲基丙烯酸酯、季戊四醇四丙烯酸酯、季戊四醇四甲基丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇二甲基丙烯酸酯、四羥甲基丙烷四丙烯酸酯、四羥甲基丙烷四甲基丙烯酸酯、四羥甲基甲烷四丙烯酸酯、四羥甲基甲烷四甲基丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、1,3,5-三丙烯醯基六氫-S-三嗪、1,3,5-三甲基丙烯醯基六氫-S-三嗪、三(羥基乙基丙烯醯基)異氰脲酸酯(isocyanurate)、三(羥基乙基甲基丙烯醯基)異氰脲酸酯、三丙烯醯基甲縮醛(formal)、三甲基丙烯醯基甲縮醛、1,6-己二醇丙烯酸酯、1,6-己二醇甲基丙烯酸酯、新戊二醇二丙烯酸酯、新戊二醇二甲基丙烯酸酯、乙二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、2-羥基丙二醇二丙烯酸酯、2-羥基丙二醇二甲基丙烯酸酯、二乙二醇二丙烯酸酯、二乙二醇二甲基丙烯酸酯、異丙二醇二丙烯酸酯、異丙二醇二甲基丙烯酸酯、三乙二醇二丙烯酸酯、三乙二醇二甲基丙烯酸酯、N,N‘-雙(丙烯醯基)半胱胺酸(cysteine)、N,N‘-雙(甲基丙烯醯基)半胱胺酸、硫二乙二醇二丙烯酸酯、硫二乙二醇二甲基丙烯酸酯、雙酚A二丙烯酸酯、雙酚A二甲基丙烯酸酯、雙酚F二丙烯酸酯、雙酚F二甲基丙烯酸酯、雙酚S二丙烯酸酯、雙酚S二甲基丙烯酸酯、雙苯氧基乙醇茀(fluorene)二丙烯酸酯、雙苯氧基乙醇茀二甲基丙烯酸酯、二烯丙醚雙酚A、 o-二烯丙基雙酚A、馬來酸(Maleic acid)二烯丙酯、三烯丙基三偏苯三酸酯(trimellitate)等,但是不受此等限制。 A specific example of such a compound is dipentaerythritol hexaacrylate, two seasons. Pentaerythritol hexamethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethyl acrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol diacrylic acid Ester, pentaerythritol dimethacrylate, tetramethylolpropane tetraacrylate, tetramethylolpropane tetramethacrylate, tetramethylol methane tetraacrylate, tetramethylol methane tetramethacrylate, three Hydroxymethylpropane triacrylate, trimethylolpropane trimethacrylate, 1,3,5-tripropylenesulfonylhexahydro-S-triazine, 1,3,5-trimethylpropenyl hexa Hydrogen-S-triazine, tris(hydroxyethylpropenyl)isocyanurate, tris(hydroxyethylmethacryloyl)isocyanurate, tripropylene fluorenylacetal ( Formal), trimethyl propylene fluorenyl acetal, 1,6-hexane diol acrylate, 1,6-hexane diol methacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethyl Acrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, 2-hydroxyl Diol diacrylate, 2-hydroxypropanediol dimethacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, isopropyl glycol diacrylate, isopropyl glycol dimethacrylate, triethyl Diol diacrylate, triethylene glycol dimethacrylate, N, N'-bis(acryloyl)cysteine, N,N'-bis(methacrylinyl) cysteine Amine acid, thiodiethylene glycol diacrylate, thiodiethylene glycol dimethacrylate, bisphenol A diacrylate, bisphenol A dimethacrylate, bisphenol F diacrylate, bisphenol F II Methacrylate, bisphenol S diacrylate, bisphenol S dimethacrylate, fluorene diacrylate, bisphenoxyethanol hydrazine dimethacrylate, diallyl ether Bisphenol A, o-Diallyl bisphenol A, maleic acid diallyl ester, triallyl trimellitate, etc., but not limited thereto.

<光聚合起始劑> <Photopolymerization initiator>

本發明之無機氧化物被膜形成用塗佈液中,感光性聚合物所含有之光聚合起始劑,只要是藉由曝光產生自由基者,即無特別限定。具體例有二苯甲酮、N,N’-四甲基-4,4’-二胺基二苯甲酮(米蚩酮)、4,4’-雙(乙基胺基)二苯甲酮、4-甲氧基-4’-二甲基胺基二苯甲酮、2-乙基蒽醌、菲等之芳香族酮、苯偶因甲醚、苯偶因乙醚、苯偶因苯醚等之苯偶因醚類、甲基苯偶因、乙基苯偶因等之苯偶因、2-(o-氯苯基)-4,5-苯基咪唑二聚物、2-(o-氯苯基)-4,5-二(m-甲氧基苯基)咪唑二聚物、2-(o-氟苯基)-4,5-二苯基咪唑二聚物、2-(o-甲氧基苯基)-4,5-二苯基咪唑二聚物、2,4,5-三芳基咪唑二聚物、2-(o-氯苯基)-4,5-二(m-甲基苯基)咪唑二聚物、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮、2-三氯甲基-5-苯乙烯基-1,3,4-噁二唑、2-三氯甲基-5-(p-氰基苯乙烯基)-1,3,4-噁二唑、2-三氯甲基-5-(p-甲氧基苯乙烯基)-1,3,4-噁二唑等之鹵甲基噁二唑化合物、2,4-雙(三氯甲基)-6-p-甲氧基苯乙烯基-S-三嗪、2,4-雙(三氯甲基)-6-(1-p-二甲基胺基苯基-1,3-丁二烯基)-S-三嗪、2-三氯甲基-4-胺基-6-p-甲氧基苯乙烯基-S-三嗪、2-(萘-1-基)- 4,6-雙-三氯甲基-S-三嗪、2-(4-乙氧基-萘-1-基)-4,6-雙-三氯甲基-S-三嗪、2-(4-丁氧基-萘-1-基)-4,6-雙-三氯甲基-S-三嗪等之鹵甲基-S-三嗪系化合物、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、2-甲基-1-〔4-(甲基硫)苯基〕-2-嗎啉基丙酮、1,2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1,1-羥基-環己基-苯基酮、二苯基乙二酮(Benzil)、苯甲醯基苯甲酸、苯甲醯基苯甲酸甲酯、4-苯甲醯基-4’-甲基二苯基硫化物、苄基甲基縮酮、二甲基胺基苯甲酸酯、p-二甲基胺基苯甲酸異戊酯、2-n-丁氧基乙基-4-二甲基胺基苯甲酸酯、2-氯噻噸酮、2,4-二乙基噻噸酮、2,4-二甲基噻噸酮、異丙基噻噸酮、1-(4-苯基硫苯基)-1,2-辛二酮-2-(O-苯甲醯基肟)、乙酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、4-苯甲醯基-甲基二苯基硫化物(sulfide)、1-羥基-環己基-苯基酮、2-苄基-2-(二甲基胺基)-1-[4-(4-嗎啉基(Morpholinyl))苯基]-1-丁酮、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮、α-二甲氧基-α-苯基乙酮、苯基雙(2,4,6-三甲基苯甲醯基)氧化磷、二苯基(2,4,6-三甲基苯甲醯基)氧化磷、2-甲基-1-[4-(甲基硫)苯基]-2-(4-嗎啉基)-1-丙酮等。 In the coating liquid for forming an inorganic oxide film of the present invention, the photopolymerization initiator contained in the photosensitive polymer is not particularly limited as long as it generates radicals by exposure. Specific examples are benzophenone, N,N'-tetramethyl-4,4'-diaminobenzophenone (milaxone), 4,4'-bis(ethylamino)benzol Ketone, 4-methoxy-4'-dimethylaminobenzophenone, 2-ethyl fluorene, phenanthrene and other aromatic ketones, benzoin methyl ether, benzoin ether, benzoin benzene a benzoin such as an ether such as a benzoin ether, a methyl benzene ene or an ethyl benzoate; a 2-(o-chlorophenyl)-4,5-phenylimidazole dimer, 2-( o-Chlorophenyl)-4,5-di(m-methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl)-4,5-diphenylimidazole dimer, 2,4,5-triaryl imidazole dimer, 2-(o-chlorophenyl)-4,5-di (m-methylphenyl)imidazole dimer, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone, 2-trichloromethyl-5- Styryl-1,3,4-oxadiazole, 2-trichloromethyl-5-(p-cyanostyryl)-1,3,4-oxadiazole, 2-trichloromethyl- Halomethyloxadiazole compound of 5-(p-methoxystyryl)-1,3,4-oxadiazole, 2,4-bis(trichloromethyl)-6-p-methoxy Styryl-S-triazine, 2,4-bis(trichloromethyl)-6-(1-p-dimethylaminophenyl) -1,3-butadienyl)-S-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-S-triazine, 2-(naphthalene-1 -base)- 4,6-bis-trichloromethyl-S-triazine, 2-(4-ethoxy-naphthalen-1-yl)-4,6-bis-trichloromethyl-S-triazine, 2- a halomethyl-S-triazine compound such as (4-butoxy-naphthalen-1-yl)-4,6-bis-trichloromethyl-S-triazine or the like, 2,2-dimethoxy -1,2-diphenylethane-1-one, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylacetone, 1,2-benzyl-2- Dimethylamino-1-(4-morpholinylphenyl)-butanone-1,1-hydroxy-cyclohexyl-phenyl ketone, diphenylethylenedione (Benzil), benzhydrylbenzoic acid , methyl benzoyl benzoate, 4-benzylidene-4'-methyldiphenyl sulfide, benzyl methyl ketal, dimethylamino benzoate, p-dimethyl Isoamyl benzoate, 2-n-butoxyethyl-4-dimethylaminobenzoate, 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2, 4-dimethylthioxanthone, isopropylthioxanthone, 1-(4-phenylthiophenyl)-1,2-octanedione-2-(O-benzylidenehydrazine), ethyl ketone , 1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]-1-(O-ethylindenyl), 4-benzylidenyl- Methyl diphenyl sulfide, 1-hydroxy-cyclohexyl-phenyl ketone, 2-benzyl-2-(dimethylamino)-1-[4-(4- Morpholinyl)Phenyl]-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholine) Phenyl]-1-butanone, α-dimethoxy-α-phenylethanone, phenylbis(2,4,6-trimethylbenzylidene)phosphorus oxide, diphenyl ( 2,4,6-trimethylbenzhydryl)phosphorus oxide, 2-methyl-1-[4-(methylthio)phenyl]-2-(4-morpholinyl)-1-propanone, etc. .

上述光聚合起始劑可容易以市售品取得,其具體例有IRGACURE173、IRGACURE 500、IRGACURE 2959、IRGACURE 754、IRGACURE 907、IRGACURE 369、IRGACURE 1300、IRGACURE 819、IRGACURE 819DW、IRGACURE 1880、IRGACURE 1870、DAROCURE TPO、DAROCURE 4265、IRGACURE 784、IRGACURE OXE01、IRGACURE OXE02、IRGACURE 250(以上為BASF公司製)、KAYACURE DETX-S、KAYACURE CTX、KAYACURE BMS、KAYACURE 2-EAQ(以上為日本化藥公司製)、TAZ-101、TAZ-102、TAZ-103、TAZ-104、TAZ-106、TAZ-107、TAZ-108、TAZ-110、TAZ-113、TAZ-114、TAZ-118、TAZ-122、TAZ-123、TAZ-140、TAZ-204(綠化學公司製)等。 The above photopolymerization initiator can be easily obtained from commercially available products, and specific examples thereof include IRGACURE 173, IRGACURE 500, IRGACURE 2959, IRGACURE 754, IRGACURE 907, and IRGACURE. 369, IRGACURE 1300, IRGACURE 819, IRGACURE 819DW, IRGACURE 1880, IRGACURE 1870, DAROCURE TPO, DAROCURE 4265, IRGACURE 784, IRGACURE OXE01, IRGACURE OXE02, IRGACURE 250 (above, BASF), KAYACURE DETX-S, KAYACURE CTX, KAYACURE BMS, KAYACURE 2-EAQ (above is made by Nippon Kayaku Co., Ltd.), TAZ-101, TAZ-102, TAZ-103, TAZ-104, TAZ-106, TAZ-107, TAZ-108, TAZ-110, TAZ -113, TAZ-114, TAZ-118, TAZ-122, TAZ-123, TAZ-140, TAZ-204 (manufactured by Green Chemical Co., Ltd.) and the like.

此等光聚合起始劑可單獨使用或併用二種類以上使用。 These photopolymerization initiators may be used singly or in combination of two or more kinds.

此外,此等光聚合起始劑與感光性聚合物,分別存在於本發明之無機氧化物被膜形成用塗佈液中時,因光聚合起始劑之種類、量,有時本發明之無機氧化物被膜形成用塗佈液會產生保存安定性的問題。因此,此等光聚合起始劑介於共價鍵,被導入於感光性聚合物中更佳。 In addition, when the photopolymerization initiator and the photosensitive polymer are respectively present in the coating liquid for forming an inorganic oxide film of the present invention, the inorganic substance of the present invention may be present depending on the type and amount of the photopolymerization initiator. The coating liquid for forming an oxide film causes a problem of preservation stability. Therefore, such a photopolymerization initiator is preferably a covalent bond and is preferably introduced into a photosensitive polymer.

感光性聚合物中含有光聚合起始劑之骨架時(以下這種感光性聚合物也稱為附起始功能的聚合物),添加之附起始功能的聚合物係相對於金屬固形分,較佳為含有20重量%以上,更佳為30質量%以上。未達20質量%時,無法得到充分的圖型化性。 When the photosensitive polymer contains a skeleton of a photopolymerization initiator (hereinafter, the photosensitive polymer is also referred to as a polymer having an initial function), and the polymer having an initial function added is relative to the metal solid component. It is preferably contained in an amount of 20% by weight or more, and more preferably 30% by mass or more. When it is less than 20% by mass, sufficient patterning property cannot be obtained.

<其他的成分> <Other ingredients>

本發明之金屬氧化物被膜形成用塗佈液中,只要不損及本發明之效果,亦可含上述其他的成份,例如無機微粒子、金屬氧烷(metalloxanes)寡聚物、金屬氧烷聚合物、平坦劑、界面活性劑等成分。 The coating liquid for forming a metal oxide film of the present invention may contain other components such as inorganic fine particles, metalloxanes oligomers, or metal oxyalkylene polymers as long as the effects of the present invention are not impaired. , components such as flat agents and surfactants.

無機微粒子較佳為二氧化矽微粒子、氧化鋁微粒子、氧化鈦微粒子、氟化鎂微粒子等微粒子,特佳為此等無機微粒子之膠體(colloid)溶液。該膠體溶液可為使無機微粒子粉分散於分散介質中者,亦可為市售品之膠體溶液。 The inorganic fine particles are preferably fine particles such as cerium oxide fine particles, alumina fine particles, titanium oxide fine particles, and magnesium fluoride fine particles, and a colloid solution of inorganic fine particles such as this is particularly preferable. The colloidal solution may be one in which the inorganic fine particle powder is dispersed in a dispersion medium, or may be a colloidal solution of a commercially available product.

本發明中,藉由含有無機微粒子,可賦予所形成之硬化被膜之表面形狀或其他功能。無機微粒子其平均粒徑較佳為0.001~0.2μm,更佳為0.001~0.1μm。無機微粒子之平均粒徑超過0.2μm時,使用所調製之塗佈液形成之硬化被膜之透明性有時會降低。 In the present invention, by containing inorganic fine particles, the surface shape or other functions of the formed cured film can be imparted. The average particle diameter of the inorganic fine particles is preferably 0.001 to 0.2 μm, more preferably 0.001 to 0.1 μm. When the average particle diameter of the inorganic fine particles exceeds 0.2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered.

無機微粒子之分散介質例如有水及有機溶劑。膠體溶液從被膜形成用塗佈液之安定性的觀點而言,pH或pKa較佳為調整為1~10,更佳為2~7。 The dispersion medium of the inorganic fine particles is, for example, water and an organic solvent. The pH or pKa of the colloidal solution is preferably adjusted to 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the coating liquid for film formation.

膠體溶液之分散介質所用之有機溶劑,例如有甲醇、乙醇、丙醇、丁醇、乙二醇、丙二醇、丁二醇、戊二醇、2-甲基-2,4-戊二醇、二乙二醇、二丙二醇、乙二醇單丙醚等醇類;甲基乙基酮、甲基異丁基酮等酮類;甲苯、二甲苯等芳香族烴類;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯烷酮等醯胺類;乙酸乙酯、乙酸丁酯、γ-丁內酯等酯類;四氫呋喃、1,4-二噁烷等醚類。此等中,較佳為醇類及酮類。此等有機溶劑可單獨或組合2種以上 作為分散介質使用。 The organic solvent used for the dispersion medium of the colloidal solution, for example, methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, 2-methyl-2,4-pentanediol, Alcohols such as ethylene glycol, dipropylene glycol, and ethylene glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; dimethylformamide; An amide such as dimethylacetamide or N-methylpyrrolidone; an ester such as ethyl acetate, butyl acetate or γ-butyrolactone; or an ether such as tetrahydrofuran or 1,4-dioxane. Among these, alcohols and ketones are preferred. These organic solvents may be used alone or in combination of two or more. Used as a dispersion medium.

本發明之金屬氧化物被膜形成用塗佈液之固體成分濃度,將上述金屬烷氧化物與金屬鹽以金屬氧化物換算時,較佳為0.5~20重量%之範圍。固體成分超過20重量%時,金屬氧化物被膜形成用塗佈液之儲藏安定性變差,且金屬氧化物被膜之膜厚控制變困難。另一方面,固體成分少於0.5重量%時,所得之金屬氧化物被膜之厚度變薄,為了獲得所定膜厚需要多次塗佈。其中固體成分濃度更佳為1~15重量%。 The solid content concentration of the coating liquid for forming a metal oxide film of the present invention is preferably in the range of 0.5 to 20% by weight in terms of the metal alkoxide and the metal salt in terms of metal oxide. When the solid content is more than 20% by weight, the storage stability of the coating liquid for forming a metal oxide film is deteriorated, and the film thickness control of the metal oxide film is difficult to control. On the other hand, when the solid content is less than 0.5% by weight, the thickness of the obtained metal oxide film is reduced, and it is necessary to apply a plurality of times in order to obtain a predetermined film thickness. The solid content concentration is more preferably from 1 to 15% by weight.

本發明之金屬氧化物被膜形成用塗佈液中,為了使含有上述第1金屬烷氧化物及第2金屬烷氧化物之金屬烷氧化物,在上述金屬鹽之存在下進行水解,得到縮合物,係含有水。此水的量係相對於上述第1及第2金屬烷氧化物之總莫耳,較佳為2~24莫耳。此(水的量(莫耳)/(金屬烷氧化物之總莫耳數)之比率為2以下時,金屬烷氧化物之水解不足,使成膜性降低,或使所得之金屬氧化物被膜之強度降低,故不佳。又,上述比率多於24時,因繼續進行聚縮合,而使儲藏安定性降低,故不佳。其中,此莫耳比更佳為2~20。 In the coating liquid for forming a metal oxide film of the present invention, a metal alkoxide containing the first metal alkoxide and the second metal alkoxide is hydrolyzed in the presence of the metal salt to obtain a condensate. Contains water. The amount of the water is preferably 2 to 24 moles per mole of the total moles of the first and second metal alkoxides. When the ratio of the amount of water (mole) / (the total number of moles of the metal alkoxide) is 2 or less, the hydrolysis of the metal alkoxide is insufficient, the film formability is lowered, or the obtained metal oxide film is obtained. Further, when the ratio is more than 24, it is not preferable because the polycondensation is continued to lower the storage stability, and the molar ratio is preferably 2 to 20.

又,金屬氧化物被膜形成用塗佈液所含有之金屬鹽為含水鹽時,其含水分因參與水解反應,因此金屬氧化物被膜形成用塗佈液所含有之水的量,必須考慮此金屬鹽之含水分。例如共存之金屬鹽為鋁鹽之含水鹽時,該含水分參與反應,因此對於水解所用之水的量,必須考慮鋁鹽之含 水分。 In addition, when the metal salt contained in the coating liquid for forming a metal oxide film is a water-containing salt, since the water content is involved in the hydrolysis reaction, the amount of water contained in the coating liquid for forming a metal oxide film must be considered. The moisture content of the salt. For example, when the coexisting metal salt is an aqueous salt of an aluminum salt, the moisture component participates in the reaction, and therefore, for the amount of water used for hydrolysis, the content of the aluminum salt must be considered. Moisture.

本發明之金屬氧化物被膜形成用塗佈液可形成適合觸控面板的金屬氧化物被膜。此金屬氧化物被膜係以無機物之金屬氧化物為主成分的金屬氧化物被膜,相較於丙烯酸材料等之有機材料膜,具有較高的強度。 The coating liquid for forming a metal oxide film of the present invention can form a metal oxide film suitable for a touch panel. This metal oxide film is a metal oxide film mainly composed of a metal oxide of an inorganic material, and has a high strength compared to an organic material film such as an acrylic material.

又,本發明之金屬氧化物被膜幾乎無熱伸縮性,因此即使將無機材料用於上層之電極保護層,也不會產生龜裂。 Further, since the metal oxide film of the present invention has almost no heat-expandability, even if an inorganic material is used for the electrode protective layer of the upper layer, cracking does not occur.

使用本發明之金屬氧化物被膜用塗佈液所得之金屬氧化物被膜,除了可用於透明電極上之保護膜外,也可適用於使用於靜電容量觸控面板之X軸與Y軸的橋接部分的絕緣層等。 The metal oxide film obtained by using the coating liquid for a metal oxide film of the present invention can be applied to a bridge portion of an X-axis and a Y-axis used for a capacitive touch panel, in addition to a protective film which can be used for a transparent electrode. Insulation layer, etc.

本發明之金屬氧化物被膜之折射率之控制,可藉由控制金屬氧化物被膜形成用塗佈液之組成來達成。換言之,本發明中之金屬氧化物被膜係將上述金屬氧化物被膜形成用塗佈液所含有之金屬烷氧化物進行水解、縮合而製造者,藉由選擇金屬烷氧化物之組成,可將形成之金屬氧化物被膜之折射率在所定之範圍內調整。例如金屬烷氧化物選擇矽烷氧化物與鈦烷氧化物時,藉由調整其混合比率,在後述之所定之範圍內,具體而言,在1.45~2.1程度之範圍內,可調整所得之金屬氧化物被膜的折射率。金屬氧化物被膜之折射率,較佳為1.50~1.70。 The control of the refractive index of the metal oxide film of the present invention can be achieved by controlling the composition of the coating liquid for forming a metal oxide film. In other words, the metal oxide film of the present invention is produced by hydrolyzing and condensing the metal alkoxide contained in the coating liquid for forming a metal oxide film, and by forming the composition of the metal alkoxide, it can be formed. The refractive index of the metal oxide film is adjusted within a predetermined range. For example, when a metal alkoxide is selected from a decane oxide and a titanium alkoxide, the metal oxidization can be adjusted within a range as described later, specifically, in the range of 1.45 to 2.1, by adjusting the mixing ratio thereof. The refractive index of the film. The refractive index of the metal oxide film is preferably 1.50 to 1.70.

換言之,塗佈金屬氧化物被膜形成用塗佈液,進行成膜,較佳為經乾燥、燒成後所形成之金屬氧化物被膜中, 要求之折射率已決定時,可決定金屬烷氧化物,例如矽烷氧化物與鈦烷氧化物之組成莫耳比,實現該折射率。 In other words, the coating liquid for forming a metal oxide film is applied to form a film, and it is preferably a metal oxide film formed after drying and baking. When the desired refractive index has been determined, the metal alkoxide, such as the compositional molar ratio of the decane oxide to the titanium alkoxide, can be determined to achieve the refractive index.

例如僅由矽烷氧化物水解所所得之金屬氧化物被膜形成用塗佈液之金屬氧化物被膜的折射率為約1.45。另外,僅由鈦烷氧化物水解所得之金屬氧化物被膜形成用塗佈液之金屬氧化物被膜的折射率為約2.1。因此,將金屬氧化物被膜之折射率在約1.45~2.1之間設定特定的值時,以所定的比例使用矽烷氧化物與鈦烷氧化物,製造金屬氧化物被膜形成用塗佈液,可實現該折射率值。 For example, the refractive index of the metal oxide film of the coating liquid for forming a metal oxide film obtained by hydrolysis of the decane oxide is about 1.45. In addition, the refractive index of the metal oxide film of the coating liquid for forming a metal oxide film obtained by hydrolyzing only the titanium alkoxide is about 2.1. Therefore, when the refractive index of the metal oxide film is set to a specific value between about 1.45 and 2.1, a coating liquid for forming a metal oxide film can be produced by using a decane oxide and a titanium alkoxide at a predetermined ratio. The refractive index value.

又,使用其他的金屬烷氧化物,也可調整所得之金屬氧化物被膜之折射率。此外,本發明中之金屬氧化物被膜之折射率,除組成條件外,可藉由選擇成膜條件來調整。如此可實現金屬氧化物被膜之高硬度,及實現所望之折射率值。 Further, the refractive index of the obtained metal oxide film can also be adjusted by using another metal alkoxide. Further, the refractive index of the metal oxide film in the present invention can be adjusted by selecting film formation conditions in addition to the composition conditions. Thus, the high hardness of the metal oxide film can be achieved, and the desired refractive index value can be achieved.

本發明之金屬氧化物被膜中,特別是為了壓抑透明電極圖型被辨識的現象時,較佳為折射率控制在1.50~1.70之範圍內,更佳為控制在1.52~1.70之範圍內。折射率之控制法如上述,除了控制金屬氧化物被膜形成用塗佈液之成分組成外,也可藉由控制成膜方法來實現。 In the metal oxide film of the present invention, particularly in order to suppress the phenomenon in which the transparent electrode pattern is recognized, the refractive index is preferably controlled in the range of 1.50 to 1.70, more preferably in the range of 1.52 to 1.70. As described above, the refractive index control method can be realized by controlling the film formation method in addition to the composition of the coating liquid for forming a metal oxide film.

金屬氧化物被膜形成用塗佈液中,特別是含有鈦烷氧化物成分時,具有在室溫保存下,黏度慢慢上昇的性質。在實用上雖無成為大問題的疑慮,但是精密控制金屬氧化物被膜之厚度時,對於溫度等慎重地管理較佳。如此黏度上昇係隨著金屬氧化物被膜形成用塗佈液中之鈦 烷氧化物之組成比率變多而更明顯。此乃是鈦烷氧化物相對於矽烷氧化物等,水解速度較高,縮合反應較快的緣故。 In the coating liquid for forming a metal oxide film, particularly when the titanium alkoxide component is contained, the viscosity is gradually increased when stored at room temperature. Although there is no doubt that it is a big problem in practical use, when the thickness of the metal oxide film is precisely controlled, it is preferable to carefully manage the temperature and the like. Such a viscosity rises as a titanium in the coating liquid for forming a metal oxide film The composition ratio of the alkoxide is more and more obvious. This is because the titanium alkoxide has a higher hydrolysis rate and a faster condensation reaction than the decane oxide.

金屬氧化物被膜形成用塗佈液在含有鈦烷氧化物成分時,為了減少黏度變化,以下2種之製法(1)或製法(2)較佳。 When the coating liquid for forming a metal oxide film contains a titanium alkoxide component, in order to reduce the viscosity change, the following two methods (1) or (2) are preferred.

製法(1)鈦烷氧化物在金屬鹽之存在下,進行水解時,預先將二元醇類(glycol)與鈦烷氧化物充分混合後,必要時,與矽烷氧化物混合後,在有機溶劑之存在下進行水解。如此,可得到黏度變化較小的金屬氧化物被膜形成用塗佈液。此製法較有效係因鈦烷氧化物與二元醇類混合時,會發熱,因此鈦烷氧化物之烷氧基與二元醇類之間產生酯交換反應,對於水解、縮合反應為安定化的緣故。 Process (1) Titanium alkoxide is sufficiently mixed with a titanium alkoxide in advance in the presence of a metal salt, and if necessary, mixed with a decane oxide in an organic solvent Hydrolysis is carried out in the presence of it. Thus, a coating liquid for forming a metal oxide film having a small change in viscosity can be obtained. This method is more effective because it is heated when the titanium alkoxide is mixed with a glycol. Therefore, a transesterification reaction occurs between the alkoxy group of the titanium alkoxide and the glycol, and the hydrolysis and condensation reaction are stabilized. The reason.

製法(2)預先將矽烷氧化物在金屬鹽之存在下進行水解反應後,與經與二元醇類混合的鈦烷氧化物溶液混合進行縮合反應,得到金屬氧化物被膜形成用塗佈液。藉此可得到黏度變化較小的金屬氧化物被膜形成用塗佈液。 In the production method (2), the decane oxide is subjected to a hydrolysis reaction in the presence of a metal salt, and then mixed with a titanium alkoxide solution mixed with a glycol to carry out a condensation reaction to obtain a coating liquid for forming a metal oxide film. Thereby, a coating liquid for forming a metal oxide film having a small change in viscosity can be obtained.

此製法較有效係因以下的理由。換言之,矽烷氧化物之水解反應雖以較快的速度進行,但是其後之縮合反應相較於鈦烷氧化物,較慢。因此,水解反應結束後,快速添加鈦烷氧化物時,水解反應後之矽烷氧化物之矽烷醇基與鈦烷氧化物均勻反應。藉此,鈦烷氧化物之縮合反應性使經水解後之矽烷氧化物安定化。 This method is more effective for the following reasons. In other words, although the hydrolysis reaction of the decane oxide proceeds at a relatively fast rate, the subsequent condensation reaction is slower than that of the titanium alkoxide. Therefore, after the completion of the hydrolysis reaction, when the titanium alkoxide is rapidly added, the stanol group of the decane oxide after the hydrolysis reaction is uniformly reacted with the titanium alkoxide. Thereby, the condensation reactivity of the titanium alkoxide stabilizes the hydrolyzed decane oxide.

將預先水解後之矽烷氧化物與鈦烷氧化物混合的方法已經嘗試。但是反應所用的有機溶劑中不含二元醇類時,無法得到儲藏安定性優異的金屬氧化物被膜形成用塗佈液。又,(2)所示的方法也在由具有較快之水解速度之其他的金屬烷氧化物與矽烷氧化物,得到金屬氧化物被膜形成用塗佈液的情形。 A method of mixing a prehydrolyzed decane oxide with a titanium alkoxide has been attempted. However, when the organic solvent used for the reaction does not contain a glycol, a coating liquid for forming a metal oxide film which is excellent in storage stability cannot be obtained. Further, the method shown in (2) is also a case where a coating liquid for forming a metal oxide film is obtained from another metal alkoxide and a decane oxide having a faster hydrolysis rate.

<製膜> <film making>

本發明之金屬氧化物被膜用塗佈液可應用一般進行之塗佈法,使塗膜成膜後,可成為本發明之金屬氧化物被膜。塗佈方法可使用例如浸漬塗佈法、旋轉塗佈法、噴霧塗佈法、流動塗佈法、刷毛塗佈法、棒塗佈法、凹版塗佈法、輥轉印法、刮板塗佈法、空氣刀塗佈法、狹縫塗佈法、網版印刷法、噴墨法、凸版印刷法等。其中,較佳為使用旋轉塗佈法、狹縫塗佈法、刮板塗佈法、噴霧塗佈法。 The coating liquid for a metal oxide film of the present invention can be applied to a metal oxide film of the present invention after a coating film is formed by a coating method which is generally applied. The coating method can be, for example, a dip coating method, a spin coating method, a spray coating method, a flow coating method, a brush coating method, a bar coating method, a gravure coating method, a roll transfer method, or a blade coating method. Method, air knife coating method, slit coating method, screen printing method, inkjet method, letterpress printing method, and the like. Among them, a spin coating method, a slit coating method, a blade coating method, and a spray coating method are preferably used.

<乾燥> <dry>

藉由使形成於基材上之塗膜乾燥、燒成而獲得本發明之金屬氧化物被膜。 The metal oxide film of the present invention is obtained by drying and baking a coating film formed on a substrate.

乾燥步驟較佳為室溫~150℃之溫度範圍,更佳為40~120℃之範圍。其時間較佳為30秒~10分鐘左右,更佳為1~8分鐘左右。乾燥方法較佳為使用加熱板或熱風循環式烘箱等。 The drying step is preferably in the range of room temperature to 150 ° C, more preferably in the range of 40 to 120 ° C. The time is preferably from about 30 seconds to about 10 minutes, more preferably from about 1 to 8 minutes. The drying method is preferably a heating plate or a hot air circulating oven or the like.

<圖型化步驟> <graphical step>

本發明中,在對顯像液保持溶解性之範圍內,對乾燥之膜以包含紫外線區域之光曝光時,附起始功能之聚合物生成自由基,促進與導入聚合物內及無機膜之取代基進行聚合反應,選擇性使曝光部之乾燥膜不溶化。包含紫外線區域之光,例如包含180nm以上、400nm以下之波長之光源已有市售容易取得,故較佳。 In the present invention, when the dried film is exposed to light containing an ultraviolet region within a range in which solubility is maintained in the developing solution, the polymer having the initial function generates radicals, promotes and introduces into the polymer and the inorganic film. The substituent is subjected to a polymerization reaction to selectively insolubilize the dried film of the exposed portion. Light including an ultraviolet region, for example, a light source including a wavelength of 180 nm or more and 400 nm or less is commercially available, and is preferable.

光源例如有水銀燈、金屬鹵素燈、氙氣燈、準分子雷射燈等。 The light source is, for example, a mercury lamp, a metal halide lamp, a xenon lamp, an excimer laser lamp, or the like.

照射量可依據需要適當選擇,以波長365nm換算較佳為100~10,000mJ/cm2,更佳為150~8,000mJ/cm2The irradiation amount can be appropriately selected as needed, and is preferably 100 to 10,000 mJ/cm 2 , more preferably 150 to 8,000 mJ/cm 2 in terms of wavelength 365 nm.

本發明所用之顯像液係進行金屬氧化物被膜之蝕刻者。因此,較佳為使用鹼性化合物溶液或酸性化合物溶液。 The developing liquid used in the present invention is an etched metal oxide film. Therefore, it is preferred to use a basic compound solution or an acidic compound solution.

鹼性化合物溶液(鹼性顯像液)可使用例如鹼金屬、4級銨之氫氧化物、矽酸鹽、磷酸鹽、乙酸鹽、胺類等的水溶液。具體例有氫氧化鈉、氫氧化鉀、氫氧化銨、氫氧化三甲基苄基銨、氫氧化四甲基銨、矽酸鈉、磷酸鈉、乙酸鈉、單乙醇胺、二乙醇胺、三乙醇胺等水溶液。 As the alkaline compound solution (alkaline developing solution), for example, an aqueous solution of an alkali metal, a quaternary ammonium hydroxide, a cerium salt, a phosphate, an acetate, an amine or the like can be used. Specific examples are sodium hydroxide, potassium hydroxide, ammonium hydroxide, trimethylbenzylammonium hydroxide, tetramethylammonium hydroxide, sodium citrate, sodium phosphate, sodium acetate, monoethanolamine, diethanolamine, triethanolamine, etc. Aqueous solution.

酸性化合物溶液(酸性顯像液)較佳為鹽酸、硝酸、硫酸、氫氟酸(Hydrofluoric acid)、磷酸等無機酸、甲酸、乙酸等有機酸之水溶液。惟,鹼性化合物或酸性化合物之量相對於水量,較佳為可充分產生曝光部與未曝光部 之溶解度差之量者。 The acidic compound solution (acidic developing solution) is preferably an aqueous solution of an organic acid such as hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid or phosphoric acid, or an organic acid such as formic acid or acetic acid. However, the amount of the basic compound or the acidic compound is preferably such that the exposed portion and the unexposed portion are sufficiently produced with respect to the amount of water. The amount of solubility is poor.

<燒成> <burning>

燒成步驟係考慮觸控面板之其他構成構件之耐熱性,較佳為100℃~300℃之溫度範圍,更佳為150℃~250℃之範圍內。其時間較佳為5分鐘以上,更佳為15分鐘以上。燒成方法較佳為使用加熱板、熱循環式烘箱、紅外線烘箱等。 The firing step considers the heat resistance of other constituent members of the touch panel, and is preferably in the range of 100 ° C to 300 ° C, more preferably in the range of 150 ° C to 250 ° C. The time is preferably 5 minutes or longer, more preferably 15 minutes or longer. The firing method is preferably a heating plate, a heat cycle oven, an infrared oven or the like.

又,為了控制折射率及提高硬度,在圖型化步驟與燒成步驟之間可另外進行紫外線照射步驟。進行紫外線照射時,藉由選擇其照射量,可調整金屬氧化物被膜之折射率。金屬氧化物被膜中,為了得到所要的折射率時,需要紫外線照射時,例如可使用高壓水銀燈。使用高壓水銀燈時,以365nm換算,全光照射1000mJ/cm2以上之照射量較佳,3000mJ/cm2~10000mJ/cm2之照射量更佳。 Further, in order to control the refractive index and increase the hardness, an ultraviolet irradiation step may be additionally performed between the patterning step and the firing step. When ultraviolet irradiation is performed, the refractive index of the metal oxide film can be adjusted by selecting the amount of irradiation. In the metal oxide film, in order to obtain a desired refractive index, when ultraviolet irradiation is required, for example, a high pressure mercury lamp can be used. When a high-pressure mercury lamp is used, the irradiation amount of 1000 mJ/cm 2 or more for total light irradiation is preferably 365 nm, and the irradiation amount of 3000 mJ/cm 2 to 10000 mJ/cm 2 is more preferable.

紫外線之光源除了高壓水銀燈外,可使用低壓水銀燈、金屬鹵素燈、氙氣燈、準分子雷射燈等。利用使用高壓水銀燈以外的光源時,與使用上述高壓水銀燈時相同量的累積光量照射即可。進行紫外線照射時,可在乾燥步驟與燒成步驟之間進行紫外線照射步驟。 In addition to high-pressure mercury lamps, ultraviolet light sources can use low-pressure mercury lamps, metal halide lamps, xenon lamps, and excimer laser lamps. When a light source other than a high-pressure mercury lamp is used, the same amount of accumulated light amount as that used in the above-described high-pressure mercury lamp may be used. When ultraviolet irradiation is performed, an ultraviolet irradiation step can be performed between the drying step and the firing step.

[實施例] [Examples]

以下藉由本發明之實施例更具體說明,但是 不限於此等。 The following is more specifically illustrated by the embodiments of the present invention, but Not limited to this.

本實施例使用之化合物中之簡稱係如下述。 The abbreviations in the compounds used in this example are as follows.

TEOS:四乙氧基矽烷 TEOS: tetraethoxy decane

ACPS:丙烯醯氧基丙基三甲氧基矽烷 ACPS: propylene methoxy propyl trimethoxy decane

MPMS:甲基丙烯醯氧基丙基三甲氧基矽烷 MPMS: methacryloxypropyltrimethoxydecane

StTMS:苯乙烯基三甲氧基矽烷 StTMS: Styryltrimethoxydecane

TTE:四乙氧基鈦 TTE: tetraethoxy titanium

TIPT:四異丙氧基化鈦 TIPT: Titanium tetraisopropoxide

AN:硝酸鋁九水合物 AN: Aluminum nitrate hexahydrate

EG:乙二醇 EG: ethylene glycol

HG:2-甲基-2,4-戊二醇(別名:己二醇) HG: 2-methyl-2,4-pentanediol (alias: hexanediol)

BCS:2-丁氧基乙醇(別名:丁基溶纖素) BCS: 2-butoxyethanol (alias: butyl cellosolve)

PGME:丙二醇單甲醚 PGME: propylene glycol monomethyl ether

EtOH:乙醇 EtOH: ethanol

<合成例1> <Synthesis Example 1> <A1液> <A1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌使AN溶解。其中加入EG 13.4g、HG 38.3g、BCS 36.4g、TEOS 15.5g及MPMS 18.5g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were placed in a 200 mL flask, and the mixture was stirred to dissolve AN. Thereto were added 13.4 g of EG, 38.3 g of HG, 36.4 g of BCS, 15.5 g of TEOS, and 18.5 g of MPMS, and the mixture was stirred at room temperature for 30 minutes.

<A2液> <A2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 57.5g,在室溫下攪拌30分鐘。 TIPT 4.7g and HG 57.5g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes.

將<A1液>與<A2液>混合,室溫下攪拌30分鐘得到溶液(K1)。 The <A1 liquid> was mixed with the <A2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K1).

此溶液K1秤取50.0g,其中添加PGME 99.1g及附起始功能之聚合物UV-H4000(KSM公司製)0.9g,得到溶液(KL1)。 50.0 g of this solution K1 was weighed, and 99.3 g of PGME and 0.9 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KL1).

<合成例2> <Synthesis Example 2>

300mL之燒瓶中加入AN 3.3g、水3.0g及EtOH 76.1g,進行攪拌使AN溶解。此溶液中加入TEOS 8.6g及MPMS 10.2g,室溫下攪拌30分鐘。然後,加入TTE 18.8g,在室溫下再攪拌30分鐘。 In a 300 mL flask, 3.3 g of AN, 3.0 g of water, and 76.1 g of EtOH were placed, and the mixture was stirred to dissolve AN. To the solution were added 8.6 g of TEOS and 10.2 g of MPMS, and the mixture was stirred at room temperature for 30 minutes. Then, 18.8 g of TTE was added, and the mixture was further stirred at room temperature for 30 minutes.

此溶液中加入HG 109.3g及BCS 46.8g,藉由旋轉真空蒸發器(東京理化器械公司製、N-1000S-WD),在60℃下慢慢減壓至80mmHg(10.7kPa),同時餾除溶劑得到200g的溶液(K2)。 HG 109.3g and BCS 46.8g were added to this solution, and the pressure was gradually reduced to 80 mmHg (10.7 kPa) at 60 ° C by a rotary vacuum evaporator (manufactured by Tokyo Chemical Industry Co., Ltd., N-1000S-WD), and distilled off at the same time. The solvent gave 200 g of solution (K2).

此溶液K2秤取50.0g,其中加入PGME 97.0g及附起始功能之聚合物UV-H4000(KSM公司製)3.0g,得到溶液(KL2)。 50.0 g of this solution K2 was weighed, and 97.0 g of PGME and 3.0 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KL2).

<合成例3> <Synthesis Example 3>

300mL之燒瓶中加入AN 3.3g、水3.0g及EtOH 75.4g,進行攪拌使AN溶解。此溶液中加入TEOS 5.2g及MPMS 14.3g,在室溫下攪拌30分鐘。然後,加入TTE 18.8g,在室溫下再攪拌30分鐘。 AN 300 g of AN, 3.0 g of water, and 75.4 g of EtOH were placed in a 300 mL flask, and the mixture was stirred to dissolve AN. To the solution were added 5.2 g of TEOS and 14.3 g of MPMS, and the mixture was stirred at room temperature for 30 minutes. Then, 18.8 g of TTE was added, and the mixture was further stirred at room temperature for 30 minutes.

此溶液中加入HG 108.8g及BCS 46.6g,藉由旋轉真空蒸發器(東京理化器械公司製、N-1000S-WD),在60℃下慢慢減壓至80mmHg(10.7kPa),同時餾除溶劑得到200g的溶液(K3)。 HG 108.8g and BCS 46.6g were added to this solution, and the pressure was gradually reduced to 80 mmHg (10.7 kPa) at 60 ° C by a rotary vacuum evaporator (manufactured by Tokyo Chemical Industry Co., Ltd., N-1000S-WD), and distilled off simultaneously. The solvent gave 200 g of solution (K3).

此溶液K3秤取50.0g,其中加入PGME 98.5g及附起始功能之聚合物UV-H4000(KSM公司製)1.5g,得到溶液(KL3)。 50.0 g of this solution K3 was weighed, and 98.5 g of PGME and 1.5 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KL3).

<合成例4> <Synthesis Example 4> <B1液> <B1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌使AN溶解。其中加入EG 13.5g、HG 38.6g、BCS 36.7g、TEOS 15.5g及ACPS 17.5g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were placed in a 200 mL flask, and the mixture was stirred to dissolve AN. Thereto were added EG 13.5 g, HG 38.6 g, BCS 36.7 g, TEOS 15.5 g, and ACPS 17.5 g, and the mixture was stirred at room temperature for 30 minutes.

<B2液> <B2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 57.9g,在室溫下攪拌30分鐘。 TIPT 4.7g and HG 57.9g were added to a 300 mL flask, and stirred at room temperature for 30 minutes.

將<B1液>與<B2液>混合,在室溫下攪拌30分鐘得到溶液(K4)。 The <B1 liquid> was mixed with the <B2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K4).

此溶液K4秤取50.0g,其中加入PGME 98.5g及附起始功能之聚合物UV-H4000(KSM公司製)1.5g,得到溶液(KL4)。 50.0 g of this solution K4 was weighed, and 98.5 g of PGME and 1.5 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KL4).

<合成例5> <Synthesis Example 5> <C1液> <C1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌使AN溶解。其中加入EG 13.6g、HG 38.8g、BCS 36.8g、TEOS 15.5g及StTMS 16.8g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were placed in a 200 mL flask, and the mixture was stirred to dissolve AN. Thereto were added EG 13.6 g, HG 38.8 g, BCS 36.8 g, TEOS 15.5 g, and StTMS 16.8 g, and the mixture was stirred at room temperature for 30 minutes.

<C2液> <C2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 58.2g,室溫下攪拌30分鐘。 TIPT 4.7g and HG 58.2g were added to a 300 mL flask, and stirred at room temperature for 30 minutes.

將<C1液>與<C2液>混合,室溫下攪拌30分鐘得到溶液(K5)。 The <C1 liquid> was mixed with <C2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K5).

此溶液K5秤取50.0g,其中加入PGME 98.5g及附起始功能之聚合物UV-H4000(KSM公司製)1.5g,得到溶液(KL5)。 50.0 g of this solution K5 was weighed, and 98.5 g of PGME and 1.5 g of a polymer UV-H4000 (manufactured by KSM Corporation) having a starting function were added to obtain a solution (KL5).

<合成例6> <Synthesis Example 6>

300mL之燒瓶中加入AN 3.3g、水3.0g及EtOH 75.4g,進行攪拌使AN溶解。此溶液中加入MPMS 11.7g,室溫下攪拌30分鐘。然後,加入TTE 25.0g,室溫下再攪拌30分鐘。 AN 300 g of AN, 3.0 g of water, and 75.4 g of EtOH were placed in a 300 mL flask, and the mixture was stirred to dissolve AN. 11.7 g of MPMS was added to this solution, and the mixture was stirred at room temperature for 30 minutes. Then, 25.0 g of TTE was added, and the mixture was further stirred at room temperature for 30 minutes.

此溶液中加入HG 110.2g及BCS 47.2g,藉由旋轉真空蒸發器(東京理化器械公司製、N-1000S-WD),在60℃下慢慢減壓至80mmHg(10.7kPa),同時餾除溶劑得到200g的溶液(K6)。 To this solution, 110.2 g of HG and 47.2 g of BCS were added, and the pressure was gradually reduced to 80 mmHg (10.7 kPa) at 60 ° C by a rotary vacuum evaporator (manufactured by Tokyo Chemical Industry Co., Ltd., N-1000S-WD), and distilled off simultaneously. The solvent gave 200 g of solution (K6).

此溶液K6秤取50.0g,其中加入PGME 97.0g及附起 始功能之聚合物UV-H4000(KSM公司製)3.0g,得到溶液(KL6)。 This solution K6 is weighed 50.0g, and PGME 97.0g is added and attached The polymer of the initial function, UV-H4000 (manufactured by KSM Co., Ltd.), 3.0 g, gave a solution (KL6).

<合成例7> <Synthesis Example 7>

將合成例6所得之溶液K6秤取50.0g,其中加入PGME 100g得到溶液(KM1)。 The solution K6 obtained in Synthesis Example 6 was weighed to 50.0 g, and 100 g of PGME was added thereto to obtain a solution (KM1).

<合成例8> <Synthesis Example 8> <D1液> <D1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌使AN溶解。其中加入EG 13.7g、HG 39.1g、BCS 37.1g及TEOS 31.1g,在室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were placed in a 200 mL flask, and the mixture was stirred to dissolve AN. Thereto were added EG 13.7 g, HG 39.1 g, BCS 37.1 g, and TEOS 31.1 g, and the mixture was stirred at room temperature for 30 minutes.

<D2液> <D2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 58.6g,室溫下攪拌30分鐘。 TIPT 4.7g and HG 58.6g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes.

將<D1液>與<D2液>混合,室溫下攪拌30分鐘得到溶液(K7)。 The <D1 liquid> was mixed with the <D2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K7).

此溶液K7秤取50.0g,其中加入PGME 97.0g及附起始功能之聚合物UV-H4000(KSM公司製)3.0g得到溶液(KM2)。 50.0 g of this solution K7 was weighed, and 97.0 g of PGME and 3.0 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KM2).

<合成例9> <Synthesis Example 9> <E1液> <E1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌 使AN溶解。其中加入EG 13.6g、HG 38.9g、BCS 37.0g、TEOS 28.0g及MPMS 3.7g,室溫下攪拌30分鐘。 Add 12.7 g of AN and 3.0 g of water to a 200 mL flask and stir. The AN is dissolved. EG 13.6 g, HG 38.9 g, BCS 37.0 g, TEOS 28.0 g, and MPMS 3.7 g were added, and the mixture was stirred at room temperature for 30 minutes.

<E2液> <E2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 58.4g,室溫下攪拌30分鐘。 TIPT 4.7g and HG 58.4g were added to a 300 mL flask, and the mixture was stirred at room temperature for 30 minutes.

將<E1液>與<E2液>混合,室溫下攪拌30分鐘得到溶液(K8)。 The <E1 liquid> was mixed with the <E2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K8).

此溶液K8秤取50.0g,其中加入PGME 97.0g及附起始功能之聚合物UV-H4000(KSM公司製)3.0g得到溶液(KM3)。 50.0 g of this solution K8 was weighed, and 97.0 g of PGME and 3.0 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution (KM3).

<合成例10> <Synthesis Example 10> <F1液> <F1 liquid>

200mL之燒瓶中加入AN 12.7g及水3.0g,進行攪拌使AN溶解。其中加入EG 13.5g、HG 38.6g、BCS 36.7g、TEOS 21.7g及MPMS 11.1g,室溫下攪拌30分鐘。 12.7 g of AN and 3.0 g of water were placed in a 200 mL flask, and the mixture was stirred to dissolve AN. Thereto were added 13.5 g of EG, 38.6 g of HG, 36.7 g of BCS, 21.7 g of TEOS, and 11.1 g of MPMS, and the mixture was stirred at room temperature for 30 minutes.

<F2液> <F2 liquid>

300mL之燒瓶中加入TIPT 4.7g及HG 57.9g,室溫下攪拌30分鐘。 TIPT 4.7g and HG 57.9g were added to a 300 mL flask, and stirred at room temperature for 30 minutes.

將<F1液>與<F2液>混合,室溫下攪拌30分鐘得到溶液(K9)。 The <F1 liquid> was mixed with the <F2 liquid>, and stirred at room temperature for 30 minutes to obtain a solution (K9).

此溶液K9秤取50.0g,其中加入PGME 99.7g及附起始功能之聚合物UV-H4000(KSM公司製)0.3g得到溶液 (KM4)。 50.0 g of this solution K9 was weighed, and 99.7 g of PGME and 0.3 g of a polymer UV-H4000 (manufactured by KSM Co., Ltd.) having a starting function were added to obtain a solution. (KM4).

<合成例11> <Synthesis Example 11>

將溶液K3秤取50.0g,其中加入PGME 97.0g及聚甲基丙烯酸甲酯(純正化學公司製)3.0g得到溶液(KM5)。 50.0 g of the solution K3 was weighed, and 97.0 g of PGME and 3.0 g of polymethyl methacrylate (manufactured by Junsei Chemical Co., Ltd.) were added to obtain a solution (KM5).

各溶液中,其組成如表1所示。 The composition of each solution is shown in Table 1.

<製膜法> <film forming method>

將實施例之溶液以孔徑0.5μm之薄膜過濾器加壓過濾,藉由旋轉塗佈法塗佈於基板上成膜。使此基板在80℃之加熱板上乾燥3分鐘。 The solution of the example was filtered under pressure with a membrane filter having a pore size of 0.5 μm, and coated on a substrate by spin coating to form a film. The substrate was dried on a hot plate at 80 ° C for 3 minutes.

<圖型化試驗> <Graphation test>

以上述製膜法於蒸鍍Cr之玻璃基板上製造被膜。接著,將蒸鍍Cr之玻璃載置於其基板之一半上,形成可紫 外線曝光部分與未曝光部分。然後,藉由紫外線照射裝置(Eyegraphics公司製,UB 011-3A型),使用高壓水銀燈(輸入電源1000W),以50mW/cm2(波長365nm換算)分別照射2秒(累積照射光量為100mJ/cm2)。 A film was formed on the glass substrate on which Cr was vapor-deposited by the above-described film formation method. Next, the Cr-deposited glass is placed on one of the substrates to form an ultraviolet-exposed portion and an unexposed portion. Then, a high-pressure mercury lamp (input power supply 1000 W) was used for irradiation for 2 seconds at 50 mW/cm 2 (wavelength: 365 nm) by an ultraviolet irradiation device (manufactured by Eyegraphics Co., Ltd., UB 011-3A) (the cumulative irradiation light amount was 100 mJ/cm). 2 ).

然後,浸漬於2.38重量%之氫氧化四甲基銨水溶液中30秒,隨後以吹風機將剩餘之水分吹除後,以目視觀察膜面。 Then, it was immersed in a 2.38 wt% aqueous solution of tetramethylammonium hydroxide for 30 seconds, and then the remaining water was blown off with a blower to visually observe the film surface.

以面內膜為完全未殘留者評價為0,僅邊緣部分有若干殘留者評價為1,面內僅殘留若干膜者評價為2,面內有某程度之膜殘留者評價為3,僅膜表面有若干變質者評價為4,完全沒有變化者評價為5。 The in-plane film was evaluated as 0 in the case where the in-plane film was completely left, and the film was evaluated as 1 only in the edge portion, and the film was evaluated as 2 in the in-plane, and the film was evaluated as 2 in the in-plane. Those with some deterioration on the surface were evaluated as 4, and those with no change at all were evaluated as 5.

<膜狀態> <film state>

蒸鍍Cr之玻璃基板上,以上述製膜法製造被膜。以目視觀察此基板,可均勻製膜者評價為○,產生白化者評價為×。 On the glass substrate on which Cr was vapor-deposited, a film was produced by the above-described film formation method. The substrate was visually observed, and the film was uniformly evaluated as ○, and the whitened person was evaluated as ×.

<折射率> <refractive index>

基板使用矽基板(100),將實施例之溶液以孔徑0.5μm之薄膜過濾器加壓過濾,藉由旋轉塗佈法塗佈於基板上成膜。使此基板在80℃之加熱板上乾燥3分鐘。 The substrate was used as a substrate (100), and the solution of the example was filtered under pressure with a membrane filter having a pore size of 0.5 μm, and coated on a substrate by spin coating to form a film. The substrate was dried on a hot plate at 80 ° C for 3 minutes.

然後,藉由紫外線照射裝置(Eyegraphics公司製,UB 011-3A型),使用高壓水銀燈(輸入電源1000W),以50mW/cm2(波長365nm換算)分別照射2秒(累積照 射光量為100mJ/cm2),以230℃之熱風循環式烘箱進行30分鐘燒成形成被膜。 Then, a high-pressure mercury lamp (input power supply 1000 W) was used for irradiation for 2 seconds at 50 mW/cm 2 (wavelength: 365 nm) by an ultraviolet irradiation device (manufactured by Eyegraphics Co., Ltd., UB 011-3A) (the cumulative irradiation light amount was 100 mJ/cm). 2 ), the film was formed by firing in a hot air circulating oven at 230 ° C for 30 minutes.

使用此基板,以橢圓測厚儀(Ellipsometer)(溝尻光學工業所公司製、DVA-FLVW)測定波長633nm下之折射率。 Using this substrate, the refractive index at a wavelength of 633 nm was measured with an Ellipsometer (DVA-FLVW, manufactured by Gully Optical Co., Ltd.).

圖型化試驗、膜狀態及折射率的結果如表2所示。 The results of the patterning test, film state and refractive index are shown in Table 2.

由表1得知實施例1~6可得到圖型化性及安定的膜狀態。 It is understood from Table 1 that the film states of the patterning property and stability can be obtained in Examples 1 to 6.

比較例1係因未添加附起始功能之丙烯酸聚合物(含有光聚合起始劑的感光性聚合物),因此無法得到圖型化性。 In Comparative Example 1, since the acrylic polymer (photosensitive polymer containing a photopolymerization initiator) having an initial function was not added, patterning property could not be obtained.

比較例2係因不含具有雙鍵之取代基成分(具有雙鍵之金屬烷氧化物),因此缺乏與附起始功能之丙烯酸聚合物之相溶性,且膜產生白化。 In Comparative Example 2, since the substituent component having a double bond (metal alkoxide having a double bond) was not contained, the compatibility with the acrylic polymer having an initial function was lacking, and the film was whitened.

比較例3係因未具有起始劑及起始功能,因此無法得 到圖型化性。 Comparative Example 3 cannot be obtained because it does not have an initiator and an initial function. To the patterning.

如表2中之實施例,金屬氧化物被膜用塗佈液為相對於金屬固形分,添加20重量%以上之附起始功能之丙烯酸聚合物,且主聚合物之無機聚合物組成中具有雙鍵之取代基含有25莫耳%以上,因此可得到安定之膜狀態且具有良好圖型化性之金屬氧化物被膜。 As in the examples in Table 2, the coating liquid for a metal oxide film is a solid component with respect to the metal, and 20% by weight or more of an acrylic polymer having an initial function is added, and the inorganic polymer of the main polymer has a double Since the substituent of the bond contains 25 mol% or more, a metal oxide film having a stable film state and having good patterning property can be obtained.

[產業上之可利用性] [Industrial availability]

本發明之金屬氧化物被膜形成用塗佈液可用於形成信賴性高的金屬氧化物被膜,即使在圖型化形成,膜狀態也可保持安定性等,可用於顯示元件、絕緣層等。 The coating liquid for forming a metal oxide film of the present invention can be used for forming a metal oxide film having high reliability, and can be used for a display element, an insulating layer, etc., even if it is formed in a pattern, and the film state can be maintained in stability.

在此引用2012年10月11日申請之日本專利申請案2012-226156號之說明書、申請專利範圍及摘要之全內容,揭示並納入於本發明之說明書中。 The entire contents of the specification, the scope of the application, and the abstract of the Japanese Patent Application No. 2012-226156, filed on Jan.

Claims (14)

一種金屬氧化物被膜形成用塗佈液,其特徵係含有:在結構中含有雙鍵之金屬烷氧化物及具有光聚合起始劑之感光性聚合物。 A coating liquid for forming a metal oxide film, which comprises a metal alkoxide containing a double bond in a structure and a photosensitive polymer having a photopolymerization initiator. 如申請專利範圍第1項之金屬氧化物被膜形成用塗佈液,其中光聚合起始劑為介隔共價鍵被導入於感光性聚合物中。 The coating liquid for forming a metal oxide film according to the first aspect of the invention, wherein the photopolymerization initiator is introduced into the photosensitive polymer by a covalent bond. 如申請專利範圍第1或2項之金屬氧化物被膜形成用塗佈液,其係由含有前述金屬烷氧化物為以下述式(I)表示之第1金屬烷氧化物、以下述式(II)表示之第2金屬烷氧化物(alkoxide)及以下述式(III)表示之金屬鹽的組成物所構成,且含有有機溶劑、水及析出防止劑,M1(OR1)n (I)(M1係表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成群中選出之至少1種金屬,R1係表示碳數1~5之烷基或乙醯氧基,n表示2~5之整數)R2 mSi(OR3)4-m (II)(R2係由乙烯基、苯乙烯基、苯基、萘基及丙烯醯基、甲基丙烯醯基或芳基所取代之碳數1~30之烷基所選出的有機基,R3為碳數1~5之烷基或乙醯基,m為1~3之整數)M2(X)k或M2之草酸鹽 (III) (M2表示由鋁、銦、鋅、鋯、鉍、鑭、鉭、釔及鈰所成群中選出之至少1種金屬,X表示鹽酸、硝酸、硫酸、乙酸、胺基磺酸、磺酸、乙醯乙酸或乙醯丙酮之殘基或此等鹼性鹽,k表示M2之價數)。 The coating liquid for forming a metal oxide film according to the first or second aspect of the invention, wherein the metal alkoxide is a first metal alkoxide represented by the following formula (I), and the following formula (II) And a composition comprising a second metal alkoxide (alkoxide) and a metal salt represented by the following formula (III), and an organic solvent, water, and a precipitation preventive agent, M 1 (OR 1 ) n (I) (M 1 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc, and R 1 represents an alkyl group having 1 to 5 carbon atoms or an ethoxylated group. n represents an integer of 2 to 5) R 2 m Si(OR 3 ) 4-m (II) (R 2 is a vinyl group, a styryl group, a phenyl group, a naphthyl group and an acryloyl group, a methacryloyl group or An organic group selected from an alkyl group having 1 to 30 carbon atoms substituted by an aryl group, R 3 is an alkyl group having 1 to 5 carbon atoms or an ethylene group, and m is an integer of 1 to 3) M 2 (X) k or M 2 oxalate (III) (M 2 represents at least one metal selected from the group consisting of aluminum, indium, zinc, zirconium, hafnium, tantalum, niobium, tantalum and niobium, and X represents hydrochloric acid, nitric acid, sulfuric acid, Residue of acetic acid, aminosulfonic acid, sulfonic acid, ethyl acetate or acetonitrile or this Basic salts, k represents the valence of M is 2). 如申請專利範圍第1~3項中任一項之金屬氧化物被膜形成用塗佈液,其中再含有以下述式(IV)表示之第3金屬烷氧化物。R4 1M3(OR5)p-1 (IV)(M3表示由矽、鈦、鉭、鋯、硼、鋁、鎂及鋅所成群中選出之至少1種金屬,R4表示可被氫原子或氟原子取代,且可被鹵原子、乙烯基、環氧丙氧(glycidoxy)基、巰基、甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺基或脲基取代,且可具有雜原子之碳數1~20的烴基,R5表示碳數1~5的烷基,p為2~5之整數,l係p為3時,為1或2,p為4時,為1~3之整數,p為5時,為1~4之整數)。 The coating liquid for forming a metal oxide film according to any one of claims 1 to 3, further comprising a third metal alkoxide represented by the following formula (IV). R 4 1 M 3 (OR 5 ) p-1 (IV) (M 3 represents at least one metal selected from the group consisting of ruthenium, titanium, osmium, zirconium, boron, aluminum, magnesium, and zinc, and R 4 represents Substituted by a hydrogen atom or a fluorine atom, and may be substituted by a halogen atom, a vinyl group, a glycidoxy group, a fluorenyl group, a methacryloxy group, an acryloxy group, an isocyanate group, an amine group or a urea group. Further, it may have a hydrocarbon group having 1 to 20 carbon atoms of a hetero atom, R 5 represents an alkyl group having 1 to 5 carbon atoms, p is an integer of 2 to 5, and when 1 is p, it is 1 or 2, and when p is 4 , is an integer from 1 to 3, and when p is 5, it is an integer from 1 to 4.) 如申請專利範圍第1~4項中任一項之金屬氧化物被膜形成用塗佈液,其中前述第2金屬烷氧化物之含量係相對於全金屬烷氧化物,為25莫耳%以上。 The coating liquid for forming a metal oxide film according to any one of claims 1 to 4, wherein the content of the second metal alkoxide is 25 mol% or more based on the total metal alkoxide. 如申請專利範圍第1~5項中任一項之金屬氧化物被膜形成用塗佈液,其中含有前述光聚合起始劑之感光性聚合物之含量係相對於金屬固形分,為20重量%以上。 The coating liquid for forming a metal oxide film according to any one of claims 1 to 5, wherein the content of the photosensitive polymer containing the photopolymerization initiator is 20% by weight based on the solid content of the metal. the above. 如申請專利範圍第1~6項中任一項之金屬氧化物被 膜形成用塗佈液,其中前述析出防止劑係由N-甲基-吡咯烷酮、乙二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己二醇及此等之衍生物所成群中選出之至少1種。 For example, the metal oxide of any one of the claims 1 to 6 is a coating liquid for forming a film, wherein the precipitation preventing agent is N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and At least one selected from the group consisting of such derivatives. 如申請專利範圍第3~7項中任一項之金屬氧化物被膜形成用塗佈液,其中前述金屬鹽之金屬原子之莫耳數(M2)與前述金屬烷氧化物之金屬原子之合計莫耳數(M)之比為0.01≦M2/M≦0.7。 The coating liquid for forming a metal oxide film according to any one of claims 3 to 7, wherein the molar number of the metal atom of the metal salt (M 2 ) and the metal atom of the metal alkoxide are the same The molar ratio (M) is 0.01 ≦ M 2 /M ≦ 0.7. 如申請專利範圍第1~8項中任一項之金屬氧化物被膜形成用塗佈液,其中前述第1金屬烷氧化物係矽烷氧化物或其部分縮合物與鈦烷氧化物混合物。 The coating liquid for forming a metal oxide film according to any one of claims 1 to 8, wherein the first metal alkoxide-based decane oxide or a partial condensate thereof is mixed with a titanium alkoxide. 如申請專利範圍第3~9項中任一項之金屬氧化物被膜形成用塗佈液,其中前述金屬鹽係金屬硝酸鹽、金屬硫酸鹽、金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺基磺酸鹽、金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯基丙酮酸鹽或此等之鹼性鹽。 The coating liquid for forming a metal oxide film according to any one of claims 3 to 9, wherein the metal salt is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride, a metal oxalate, a metal amine sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetyl acetonate or an alkaline salt thereof. 如申請專利範圍第3~10項中任一項之金屬氧化物被膜形成用塗佈液,其中前述第1金屬烷氧化物係矽烷氧化物或其部分縮合物與鈦烷氧化物之混合物,前述有機溶劑包含烷二醇類或其單醚衍生物。 The coating liquid for forming a metal oxide film according to any one of the above claims, wherein the first metal alkoxide-based decane oxide or a mixture of a partial condensate thereof and a titanium alkoxide is the aforementioned The organic solvent contains an alkanediol or a monoether derivative thereof. 一種金屬氧化物被膜,其特徵係使用如申請專利範圍第1~11項中任一項之金屬氧化物被膜形成用塗佈液 而得。 A metal oxide film, which is characterized by using a coating liquid for forming a metal oxide film according to any one of claims 1 to 11. And got it. 一種金屬氧化物被膜,其特徵係使用具有1.50~1.70之範圍之折射率之如申請專利範圍第1~11項中任一項之金屬氧化物被膜形成用塗佈液而得。 A metal oxide film obtained by using a coating liquid for forming a metal oxide film according to any one of claims 1 to 11 which has a refractive index in the range of 1.50 to 1.70. 一種顯示裝置,其特徵係具備如申請專利範圍第12或13項之金屬氧化物被膜。 A display device characterized by having a metal oxide film as disclosed in claim 12 or 13.
TW102136768A 2012-10-11 2013-10-11 Coating liquid for forming an inorganic oxide film, inorganic oxide film, and display device TWI637235B (en)

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