TW201432080A - Negative pressure dust-free alignment mechanism - Google Patents

Negative pressure dust-free alignment mechanism Download PDF

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TW201432080A
TW201432080A TW102103903A TW102103903A TW201432080A TW 201432080 A TW201432080 A TW 201432080A TW 102103903 A TW102103903 A TW 102103903A TW 102103903 A TW102103903 A TW 102103903A TW 201432080 A TW201432080 A TW 201432080A
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Taiwan
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vacuum pump
accommodating space
platform
fixed platform
value
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TW102103903A
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Chinese (zh)
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TWI467043B (en
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Yu-Ying Qiu
Hao-Wei Li
bo-wei Song
bing-hong Lin
xin-jie Qiu
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Chiuan Yan Technology Co Ltd
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Abstract

Provided is a negative pressure dust-free alignment mechanism including: a fixed platform, four XYθ devices, a movable platform, a leak stopper, a pressure detector and a controller. By this way, when a vacuum pump carries out air extraction of a containing space, the powder dust or oil gas produced from the XYθ devices can be extracted thereby at the same time, so as to keep the containing space clean. Furthermore, an enclosure body and the leak stopper are used to seal the containing space between the fixed platform and the movable platform for further definitely preventing the leakage of powder dust and oil gas. Moreover, the pressure detector is used to detect the pressure value in the containing space at any time to determine whether or not it has reached the standard value. If the pressure value does not reach the standard value, the vacuum pump can be automatically turned on to carry out air extraction.

Description

負壓無塵型對位機構 Negative pressure dust-free alignment mechanism

本發明係關於一種負壓無塵型對位機構,特別是指對位機構環設有一圍體及止漏體,並透過真空幫浦對其抽氣達到負壓真空狀態,藉此,該對位機構在移動時不會有粉塵產生污染無塵室,且保持負壓真空狀態下,使移動平台與XY θ裝置保持良好的緊密性。 The invention relates to a negative pressure dust-free alignment mechanism, in particular to a positioning mechanism ring with a surrounding body and a leak-proof body, and pumping the vacuum through a vacuum pump to reach a vacuum state, whereby the pair When the position mechanism moves, there is no dust to pollute the clean room, and the vacuum platform is kept under vacuum to maintain the tightness of the mobile platform and the XY θ device.

按,無塵室被廣泛地應用在對環境污染特別敏感的行業,例如半導體生產、生化技術、生物技術、精密機械、製藥、醫院等行業等,其中以半導體業其對室內之溫濕度、潔淨度要求尤其嚴格、故其必需控制在某一個需求範圍內,才不會對製程產生影響。 According to the clean room, it is widely used in industries that are particularly sensitive to environmental pollution, such as semiconductor production, biochemical technology, biotechnology, precision machinery, pharmaceuticals, hospitals, etc., among which the semiconductor industry has its indoor temperature and humidity and cleanliness. The degree of requirements is particularly strict, so it must be controlled within a certain range of requirements, so as not to affect the process.

而,於各種液晶面板製造、檢查設備、半導體製造、檢查設置、網印設備或印刷電路板製造、檢查設備中,必須使用對位平台進行對位移動等程序;惟習知市售同性質產品中,由於對位機構其周緣皆為開放式設計,因此在驅動裝置移動時,會產生粉塵或油汙,相當不利於無塵室。雖然有人提出利用對位機構以磁浮系統應用方式來解決上述之 問題,然而其控制程序繁雜,成本過高的問題。 However, in various liquid crystal panel manufacturing, inspection equipment, semiconductor manufacturing, inspection setup, screen printing equipment, or printed circuit board manufacturing and inspection equipment, it is necessary to use the alignment platform to perform the program such as the alignment movement; In the middle, since the periphery of the alignment mechanism is an open design, dust or oil is generated when the driving device moves, which is quite disadvantageous to the clean room. Although it has been proposed to use the alignment mechanism to solve the above problems by using the maglev system. The problem, however, is that the control program is cumbersome and the cost is too high.

換言之,如何使對位機構在移動時產生粉塵及油汙不會外洩汙染環境,藉以使用於無塵室中,是業界重要的討論課題。 In other words, how to make the dust and oil stains when the positioning mechanism moves does not leak the environment, so that it can be used in the clean room, which is an important discussion topic in the industry.

本案發明人鑑於上述習用對位機構無法應用於無塵室的各項缺點,乃亟思加以改良創新,並經多年苦心孤詣潛心研究後,終於成功研發完成本件負壓無塵型對位機構。 The inventor of the present invention succeeded in researching and developing the negative-pressure dust-free alignment mechanism after considering the shortcomings of the above-mentioned conventional counter-institutions that could not be applied to the clean room, and after many years of painstaking research.

本發明之目的即在於提供一種負壓無塵型對位機構,該對位機構之周緣環設有一圍體及一止漏體,藉以封閉該固定平台與移動平台所形成的容置空間,並且由真空幫浦對該容置空間抽氣形成負壓真空狀態,避免粉塵或油汙汙染無塵室。 An object of the present invention is to provide a negative pressure dust-free alignment mechanism, wherein a peripheral ring of the alignment mechanism is provided with a surrounding body and a leakage stop body, thereby closing the accommodation space formed by the fixed platform and the mobile platform, and The vacuum pump draws a vacuum into the accommodating space to prevent the dust or oil from contaminating the clean room.

可達成上述發明目的之負壓無塵型對位機構,包括有:一固定平台,用以提供量測裝置設置或固定,且由固定平台之頂緣平面向上環設有一圍體於固定平台周緣;四XY θ裝置,係設置於固定平台四個象限角上,各該XY θ裝置並受驅動裝置帶動;一移動平台,係共同設置於各象限角的各該XY θ裝置上,透過XY θ裝置可在X方向、Y方向以及θ方向移動;一止漏體,係設置於圍體與移動平台之間,進而封閉該固定平台與移動平台所形成的容置空間,且該止漏體為一具彈性回復材料所構成,當受力解除後會自行回復原先造型;一真空幫浦,係設置於圍體外側,其抽氣端接合於容置空間並對容置空間抽氣使容置空間呈負壓真空狀態,且該真空幫浦受一控制器所控制;一壓力偵測器,設置於圍體外側,其具有一感測端接於容置空間內用於感測容置空間內的壓力上值及下值,並且將壓力值轉換成電訊號傳輸到控制器;一控制器,用於操控該XY θ裝置驅動移動平台朝X方向、Y方向以及θ方向移動、提供設定壓力值使真空幫浦對容置空間進行抽氣以及判定壓力偵測器測得之壓力值是否達到標準,當壓力到達設定上值則停止真空幫浦,若未達到設定下值則自動開啟真空幫浦進行抽氣。 The negative pressure dust-free alignment mechanism capable of achieving the above object includes: a fixed platform for providing a measuring device to be set or fixed, and a peripheral body of the fixed platform is provided with a surrounding body at a periphery of the fixed platform The four XY θ devices are disposed on the four quadrant corners of the fixed platform, and each of the XY θ devices is driven by the driving device; and a moving platform is commonly disposed at each of the quadrant angles of the XY The θ device can be moved in the X direction, the Y direction, and the θ direction through the XY θ device; a stop leak body is disposed between the surrounding body and the moving platform, thereby closing the accommodating space formed by the fixed platform and the moving platform. And the leakage stop body is composed of an elastic recovery material, and will return to the original shape when the force is released; a vacuum pump is disposed outside the enclosure, and the suction end is engaged with the accommodation space and accommodates The space is evacuated to make the accommodating space a negative vacuum state, and the vacuum pump is controlled by a controller; a pressure detector is disposed outside the enclosure, and has a sensing end connected to the accommodating space The method is configured to sense a pressure upper value and a lower value in the accommodating space, and convert the pressure value into an electrical signal to be transmitted to the controller; a controller for controlling the XY θ device to drive the mobile platform toward the X direction, the Y direction, and The θ direction moves, and the set pressure value is provided to enable the vacuum pump to pump the accommodating space and determine whether the pressure value measured by the pressure detector reaches the standard. When the pressure reaches the set upper value, the vacuum pump is stopped, if the setting is not reached. Lower value Move to open the vacuum pump was evacuated.

1‧‧‧固定平台 1‧‧‧Fixed platform

11‧‧‧圍體 11‧‧‧ enclosure

2‧‧‧第一XY θ裝置 2‧‧‧First XY θ device

21‧‧‧第一移動單元 21‧‧‧First mobile unit

22‧‧‧第一轉動單元 22‧‧‧First rotating unit

23‧‧‧第一驅動裝置 23‧‧‧First drive

3‧‧‧第二XY θ裝置 3‧‧‧Second XY θ device

31‧‧‧第二移動單元 31‧‧‧Second mobile unit

32‧‧‧第二轉動單元 32‧‧‧Second rotating unit

33‧‧‧第二驅動裝置 33‧‧‧Second drive

4‧‧‧第三XY θ裝置 4‧‧‧ Third XY θ device

41‧‧‧第三移動單元 41‧‧‧ Third mobile unit

42‧‧‧第三轉動單元 42‧‧‧ Third rotating unit

43‧‧‧第三驅動裝置 43‧‧‧ Third drive

5‧‧‧第四XY θ裝置 5‧‧‧Fourth XY θ device

51‧‧‧第四移動單元 51‧‧‧4th mobile unit

52‧‧‧第四轉動單元 52‧‧‧fourth rotation unit

6‧‧‧移動平台 6‧‧‧Mobile platform

61‧‧‧止漏體 61‧‧‧ leaking body

7‧‧‧真空幫浦 7‧‧‧vacuum pump

71‧‧‧抽氣端 71‧‧‧Exhaust end

8‧‧‧壓力偵測器 8‧‧‧ Pressure detector

81‧‧‧感測端 81‧‧‧Sense end

9‧‧‧控制器 9‧‧‧ Controller

圖1為本發明負壓無塵型對位機構之立體視圖;圖2為該負壓無塵型對位機構之側視圖;圖3為該負壓無塵型對位機構之立體內部視圖; 圖4為該負壓無塵型對位機構之頂視圖;圖5為該負壓無塵型對位機構之移動平台順時針旋轉示意圖;圖6為該負壓無塵型對位機構之移動平台逆時針旋轉示意圖;圖7為該負壓無塵型對位機構之移動平台X軸移動示意圖;圖8為該負壓無塵型對位機構之移動平台Y軸移動示意圖;以及圖9為該負壓無塵型對位機構之方塊圖。 1 is a perspective view of a negative pressure dust-free alignment mechanism of the present invention; FIG. 2 is a side view of the negative pressure dust-free alignment mechanism; FIG. 3 is a perspective internal view of the negative pressure dust-free alignment mechanism; 4 is a top view of the negative pressure dust-free alignment mechanism; FIG. 5 is a schematic diagram showing clockwise rotation of the mobile platform of the negative pressure dust-free alignment mechanism; FIG. 6 is a movement of the negative pressure dust-free alignment mechanism FIG. 7 is a schematic diagram of X-axis movement of the mobile platform of the negative pressure dust-free alignment mechanism; FIG. 8 is a schematic diagram of Y-axis movement of the mobile platform of the negative pressure dust-free alignment mechanism; A block diagram of the negative pressure dust-free alignment mechanism.

請參閱圖1至圖4,本發明所提供之負壓無塵型對位機構,主要包括有:一固定平台1、四XY θ裝置、一移動平台6、一止漏體61、一真空幫浦7、一壓力偵測器8以及一控制器9所構成。 Referring to FIG. 1 to FIG. 4, the negative pressure dust-free alignment mechanism provided by the present invention mainly includes: a fixed platform 1, a four-XY θ device, a mobile platform 6, a leak-stop body 61, and a vacuum gang. The pump 7, a pressure detector 8 and a controller 9 are formed.

該固定平台1,用以提供XY θ裝置設置或固定,且由固定平台1之頂緣平面向上環設有一圍體11於固定平台1周緣;其中該圍體11與固定平台1之間的間隙可選用矽利康(silicone)或填補劑,藉以增加氣密度。 The fixed platform 1 is configured to provide an XY θ device for setting or fixing, and a peripheral body 11 is disposed on the periphery of the fixed platform 1 by a top edge plane of the fixed platform 1; wherein the gap between the surrounding body 11 and the fixed platform 1 is Silicone or a filler can be used to increase the gas density.

該四XY θ裝置,係設置於固定平台1四個象限角上,各該XY θ裝置並受驅動裝置帶動;進一步說明該XY θ裝置之特點;該第一XY θ裝置2及第三XY θ裝置4具有 第一、三移動單元21、41及第一、三轉動單元22、42,該第一、三移動單元21、41,係設置於固定平台1上,提供受第一、三驅動裝置23、43驅動後具有沿Y方向移動、以及沿一與Y垂直之X移動之裝置;該第一、三轉動單元22、42,係設置於第一、三移動單元21、41上,為提供受驅動後以一朝θ方向之弧線相對滑動;該第二XY θ裝置3具有一第二移動單元31及一第二轉動單元32,該第二移動單元31,係設置於固定平台1上,提供受第二驅動裝置33驅動後具有沿X方向移動、以及沿一與X垂直之Y移動之裝置;該第二轉動單元32,係設置於第二移動單元31上,為提供受驅動後以一朝θ方向之弧線相對滑動;第四XY θ裝置5位於第二XY θ裝置3之不相鄰之相對角處,具有一第四移動單元51及一第四轉動單元52,該第四移動單元51,係設置於固定平台1上,提供受驅動後具有沿X方向移動、以及沿一與X垂直之Y移動之裝置;該第四轉動單元52,係設置於第四移動單元51上,為提供受驅動後以一朝θ方向之弧線相對滑動。藉由第一、二、三驅動裝置23、33、43帶動下,使量測平台移動到指定位置上。 The four XY θ device is disposed on four quadrant corners of the fixed platform 1, and each of the XY θ devices is driven by a driving device; further illustrating the characteristics of the XY θ device; the first XY θ device 2 and the third XY θ Device 4 has The first and third moving units 21 and 41 and the first and third rotating units 22 and 42 are disposed on the fixed platform 1 to provide the first and third driving units 23 and 43. After driving, there is a device that moves in the Y direction and moves along a X that is perpendicular to Y; the first and third rotating units 22, 42 are disposed on the first and third moving units 21, 41 to provide driving The second XY θ device 3 has a second moving unit 31 and a second rotating unit 32. The second moving unit 31 is disposed on the fixed platform 1 and provides the first The second driving device 33 is driven to have a device that moves in the X direction and moves along a Y that is perpendicular to X; the second rotating unit 32 is disposed on the second moving unit 31 to provide a driven θ The arc of the direction is relatively slid; the fourth XY θ device 5 is located at a non-adjacent opposite corner of the second XY θ device 3, and has a fourth moving unit 51 and a fourth rotating unit 52, the fourth moving unit 51, The system is disposed on the fixed platform 1 and is provided to be driven to move in the X direction. And it means a direction perpendicular to the X and Y of movement; the fourth rotary unit 52, are disposed on a fourth mobile unit 51, is provided in an arc relative to the slide direction θ once driven by rear. The measuring platform is moved to the designated position by the first, second and third driving devices 23, 33, 43.

一移動平台6,係共同設置於各象限角的各該XY θ裝置上,透過XY θ裝置可在X方向、Y方向以及θ方向移動。 A moving platform 6 is disposed on each of the XY θ devices of each quadrant angle, and is movable in the X direction, the Y direction, and the θ direction by the XY θ device.

一止漏體61,係設置於圍體11與移動平台6之 間,進而封閉該固定平台1與移動平台6所形成的容置空間,且該止漏體61為一具彈性回復材料所構成,當受力解除後會自行回復原先造型;該止漏體61材料可選用天然橡膠(NR)、苯乙烯丁二基橡膠(SBR)、氯磺化橡膠(CSM)、氯丁基橡膠(CR)、丁基橡膠(IIR)或耐油膠(NBR)等,如圖2所示,該止漏體61的截面概成「亞」字型,當對容置空間抽氣時止漏體61會偏向容置空間,而解除抽氣藉由前述的材料特性,當受力解除後會自行回復原先造型;再者,當止漏體61使用久了難免會有磨損的情況,利用「亞」字型的截面設計,使主要磨損處為靠容置空間一側,而相對一側則持續提供止漏的功效。 a leak stop body 61 is disposed on the enclosure 11 and the mobile platform 6 And further, the accommodating space formed by the fixed platform 1 and the mobile platform 6 is closed, and the leakage preventing body 61 is composed of an elastic recovery material, and the original shape is restored when the force is released; the leakage body 61 Materials can be selected from natural rubber (NR), styrene butyl rubber (SBR), chlorosulfonated rubber (CSM), chlorobutyl rubber (CR), butyl rubber (IIR) or oil resistant rubber (NBR), etc. As shown in FIG. 2, the cross-section of the leakage preventing body 61 is in a "sub" shape. When the accommodating space is evacuated, the leakage preventing body 61 is biased toward the accommodating space, and the suction is released by the aforementioned material characteristics. After the force is released, the original shape will be restored by itself; in addition, when the leak-stop body 61 is used for a long time, it is inevitable that there will be wear and tear, and the "Asian"-shaped cross-section design is adopted, so that the main wear is on the side of the accommodation space. The opposite side continues to provide a leak-stopping effect.

一真空幫浦7,係設置於圍體11外側,其抽氣端71接合於容置空間並對容置空間抽氣使容置空間呈負壓真空狀態,且該真空幫浦7受一控制器9所控制;進一步說明該真空幫浦7的特點,為因應高科技業界對環保及不受油氣污染製程之迫切需求,該真空幫浦7係選用乾式真空幫浦7,使受真空幫浦7抽氣之容置空間中不含油、水氣,藉以得到乾淨製程。 A vacuum pump 7 is disposed on the outer side of the enclosure 11, and the pumping end 71 is engaged with the accommodating space, and the accommodating space is evacuated to make the accommodating space in a vacuum state, and the vacuum pump 7 is controlled by a vacuum. Controlled by the device 9; further illustrating the characteristics of the vacuum pump 7, in response to the high-tech industry's urgent need for environmental protection and oil and gas pollution-free processes, the vacuum pump 7 series uses dry vacuum pump 7 to make the vacuum pump 7 The air-filled space does not contain oil or moisture, so as to get a clean process.

一壓力偵測器8,設置於圍體11外側,其具有一感測端81接於容置空間內用於感測容置空間內的壓力上值及下值,並且將壓力值轉換成電訊號傳輸到控制器9。 A pressure detector 8 is disposed outside the enclosure 11 and has a sensing end 81 connected to the accommodating space for sensing the pressure upper and lower values in the accommodating space, and converting the pressure value into telecommunications The number is transmitted to the controller 9.

一控制器9,用於操控該XY θ裝置驅動移動平 台6朝X方向、Y方向以及θ方向移動、提供設定壓力值使真空幫浦7對容置空間進行抽氣以及判定壓力偵測器8測得之壓力值是否達到標準,當壓力到達設定上值則停止真空幫浦7,若未達到設定下值則自動開啟真空幫浦7進行抽氣。 a controller 9 for controlling the XY θ device to drive the moving flat The table 6 moves in the X direction, the Y direction, and the θ direction, and provides a set pressure value to cause the vacuum pump 7 to evacuate the accommodating space and determine whether the pressure value measured by the pressure detector 8 reaches the standard, when the pressure reaches the setting. The value stops the vacuum pump 7, and if the set value is not reached, the vacuum pump 7 is automatically turned on for pumping.

是以,上述即為本發明所提供之一種負壓無塵型對位機構之主要構件及其組裝方式之介紹,接著再將其使用特點介紹如下:首先,將欲檢查的元件放置於移動平台6上,並加以固定,並開啟控制器9,設定壓力值使真空幫浦7對容置空間進行抽氣。 Therefore, the above is the main component of the negative pressure dust-free alignment mechanism and the assembly method thereof provided by the present invention, and then the use characteristics thereof are as follows: First, the components to be inspected are placed on the mobile platform. 6, and fixed, and open the controller 9, set the pressure value so that the vacuum pump 7 draws air into the accommodating space.

接著,如圖5當欲使該移動平台6沿順時針方向轉動一預定角度時,則由該第二轉動單元32之第二驅動裝置33往X軸正向端運動,以帶動該第二轉動單元32之第二移動單元31同時產生運動,如此一來該移動平台6便會被帶動而進行順時針之轉動,且該第一XY θ裝置2、第三XY θ裝置4及第四XY θ裝置5亦同時沿著該預定弧度之滑移,使由該第二驅動裝置33作為旋轉運動時之單一驅動源,而能不受干涉地進行精確之驅動。 Then, as shown in FIG. 5, when the moving platform 6 is to be rotated by a predetermined angle in the clockwise direction, the second driving device 33 of the second rotating unit 32 moves toward the positive end of the X-axis to drive the second rotation. The second moving unit 31 of the unit 32 simultaneously generates motion, so that the moving platform 6 is driven to rotate clockwise, and the first XY θ device 2, the third XY θ device 4 and the fourth XY θ The device 5 also slides along the predetermined arc at the same time, so that the second driving device 33 serves as a single driving source for the rotational movement, and can be accurately driven without interference.

再者,如圖6所示,當欲使該移動平台6沿逆時針方向轉動一預定角度時,則由該第二轉動單元32之第二驅動裝置33往X軸負向端運動,以帶動該第二轉動單元32之第二移動單元31同時產生運動,如此一來該移動平台6 便會被帶動而進行逆時針之轉動,且該第一XY θ裝置2、第三XY θ裝置4及第四XY θ裝置5亦同時沿著預定弧度之滑移,使由該第二驅動裝置33作為旋轉動運動時之單一驅動源,而能不受干涉地進行精確之驅動。 Moreover, as shown in FIG. 6, when the moving platform 6 is to be rotated by a predetermined angle in the counterclockwise direction, the second driving device 33 of the second rotating unit 32 moves toward the X-axis negative end to drive The second moving unit 31 of the second rotating unit 32 simultaneously generates motion, so that the mobile platform 6 The first XY θ device 2, the third XY θ device 4, and the fourth XY θ device 5 also slide along a predetermined arc at the same time, so that the second driving device is driven by the second driving device. As a single drive source for rotary motion, 33 can be accurately driven without interference.

接著,如圖7所示,當欲使該移動平台6進行X軸向移動,則由該第二XY θ裝置3之第二驅動裝置33往X軸向運動,以帶動該第二XY θ裝置3之第二移動單元31產生運動,如此一來該移動平台6便會被帶動而進行X軸之移動,且該第一XY θ裝置2、第三XY θ裝置4及該第四XY θ裝置5亦同時被帶動進行X軸向之移動,使由該第二驅動裝置33作為X軸向運動時之單一驅動源,而能不受干涉地進行精確之驅動。 Next, as shown in FIG. 7, when the moving platform 6 is to be moved in the X-axis direction, the second driving device 33 of the second XY θ device 3 is moved to the X-axis to drive the second XY θ device. The second mobile unit 31 generates motion, so that the mobile platform 6 is driven to perform X-axis movement, and the first XY θ device 2, the third XY θ device 4, and the fourth XY θ device At the same time, the movement of the X-axis is also performed to make the second driving device 33 a single driving source when the X-axis is moved, and the precise driving can be performed without interference.

其次,如圖8所示,當欲使該移動平台6進行Y軸向移動,則由該由第一XY θ裝置2之第一驅動裝置33及該第三XY θ裝置4之第三驅動裝置43同時往Y軸向運動,如此一來該移動平台6便會被帶動而進行Y軸之移動,且該第二XY θ裝置3及第四XY θ裝置5亦同時被帶動進行Y軸向之移動,使由該第一、三驅動裝置作為Y軸向運動時之驅動源,而能以最少驅動源進行精確之驅動。 Next, as shown in FIG. 8, when the moving platform 6 is to be moved in the Y-axis, the first driving device 33 of the first XY θ device 2 and the third driving device of the third XY θ device 4 are used. 43 simultaneously moves in the Y-axis, so that the moving platform 6 is driven to move the Y-axis, and the second XY θ device 3 and the fourth XY θ device 5 are simultaneously driven to perform the Y-axis. The movement is such that the first and third driving devices are driven as the driving source in the Y-axis direction, and the precise driving can be performed with a minimum driving source.

如圖9所示,由於在運作程序中,該真空幫浦7對容置空間進行抽氣使該XY θ裝置時產生的粉塵或油氣一併抽出,使容置空間保持清潔,且該固定平台1與移動平台 6之間藉由圍體11及止漏體61封閉其容置空間更確保粉塵及油氣不會外洩,並且壓力偵測器8隨時監測容置空間之壓力值,是否達到標準,當壓力到達設定上值則停止真空幫浦7,若未達到設定下值則自動開啟真空幫浦7進行抽氣。 As shown in FIG. 9 , in the operation process, the vacuum pump 7 evacuates the accommodating space to extract the dust or oil generated by the XY θ device, so that the accommodating space is kept clean, and the fixed platform is cleaned. 1 and mobile platform By enclosing the accommodation space between the enclosure 11 and the leakage stop 61, it is ensured that dust and oil and gas are not leaked, and the pressure detector 8 monitors the pressure value of the accommodation space at any time, whether the standard is reached, when the pressure reaches When the upper value is set, the vacuum pump 7 is stopped. If the set value is not reached, the vacuum pump 7 is automatically turned on for pumping.

上列詳細說明係針對本發明之一可行實施例之具體說明,惟該實施例並非用以限制本發明之專利範圍,凡未脫離本發明技藝精神所為之等效實施或變更,均應包含於本案之專利範圍中。 The detailed description of the preferred embodiments of the present invention is intended to be limited to the scope of the invention, and is not intended to limit the scope of the invention. The patent scope of this case.

綜上所述,本案不但在空間型態上確屬創新,並能較習用物品增進上述多項功效,應已充分符合新穎性及進步性之法定發明專利要件,爰依法提出申請,懇請 貴局核准本件發明專利申請案,以勵發明,至感德便。 In summary, this case is not only innovative in terms of space type, but also can enhance the above-mentioned multiple functions compared with the customary items. It should fully meet the statutory invention patent requirements of novelty and progressiveness, and apply for it according to law. This invention patent application, in order to invent invention, to the sense of virtue.

1‧‧‧固定平台 1‧‧‧Fixed platform

11‧‧‧圍體 11‧‧‧ enclosure

6‧‧‧移動平台 6‧‧‧Mobile platform

7‧‧‧真空幫浦 7‧‧‧vacuum pump

71‧‧‧抽氣端 71‧‧‧Exhaust end

8‧‧‧壓力偵測器 8‧‧‧ Pressure detector

81‧‧‧感測端 81‧‧‧Sense end

9‧‧‧控制器 9‧‧‧ Controller

Claims (3)

一種負壓無塵型對位機構,包含有:一固定平台,用以提供量測裝置設置或固定,且由固定平台之頂緣平面向上環設有一圍體於固定平台周緣;四XY θ裝置,係設置於固定平台四個象限角上,各該XY θ裝置並受驅動裝置帶動;一移動平台,係共同設置於各象限角的各該XY θ裝置上,透過XY θ裝置可在X方向、Y方向以及θ方向移動;一止漏體,係設置於圍體與移動平台之間,進而封閉該固定平台與移動平台所形成的容置空間,且該止漏體為一具彈性回復材料所構成,當受力解除後會自行回復原先造型;一真空幫浦,係設置於圍體外側,其抽氣端接合於容置空間並對容置空間抽氣使容置空間呈負壓真空狀態,且該真空幫浦受一控制器所控制;一壓力偵測器,設置於圍體外側,其具有一感測端接於容置空間內用於感測容置空間內的壓力上值及下值,並且將壓力值轉換成電訊號傳輸到控制器;一控制器,用於操控該XY θ裝置驅動移動平台朝X方向、Y方向以及θ方向移動、提供設定壓力值使真空幫浦對容置空間進行抽氣以及判定壓力偵測器測得之壓力值是否達到標準,當壓力到達設定上值則停止真空幫浦,若 未達到設定下值則自動開啟真空幫浦進行抽氣。 The utility model relates to a negative pressure dust-free alignment mechanism, which comprises: a fixed platform for providing a measuring device to be set or fixed, and a surrounding body is arranged on the top edge of the fixed platform to surround the periphery of the fixed platform; the four XY θ device Provided on the four quadrant corners of the fixed platform, each of the XY θ devices is driven by the driving device; a moving platform is disposed on each of the XY θ devices of each quadrant angle, and can be in the X direction through the XY θ device Moving in the Y direction and the θ direction; a leak stop body is disposed between the surrounding body and the moving platform, thereby closing the accommodating space formed by the fixed platform and the moving platform, and the leakage preventing body is an elastic recovery material The composition will return to the original shape when the force is released; a vacuum pump is placed on the outside of the enclosure, and the pumping end is engaged with the accommodating space and the air is ventilated to make the accommodating space a vacuum. a state, and the vacuum pump is controlled by a controller; a pressure detector is disposed on the outer side of the enclosure, and has a sensing end connected to the accommodating space for sensing the pressure upper value in the accommodating space And the next value, and will be pressed The value is converted into a signal signal and transmitted to the controller; a controller for controlling the XY θ device to drive the mobile platform to move in the X direction, the Y direction and the θ direction, and provide a set pressure value for the vacuum pump to pump the accommodating space And determining whether the pressure value measured by the pressure detector reaches the standard, and stopping the vacuum pump when the pressure reaches the set upper value, if If the set value is not reached, the vacuum pump is automatically turned on for pumping. 如申請專利範圍第1項所述之負壓無塵型對位機構,其中該圍體與固定平台之間的間隙可選用矽利康(silicone)或填補劑,藉以增加氣密度。 The negative pressure dust-free alignment mechanism according to claim 1, wherein a gap between the enclosure and the fixed platform may be a silicone or a filler to increase the gas density. 如申請專利範圍第1項所述之負壓無塵型對位機構,其中該真空幫浦係選用乾式真空幫浦,使受真空幫浦抽氣之容置空間中不含油、水氣。 The negative pressure dust-free alignment mechanism according to the first aspect of the patent application, wherein the vacuum pumping system uses a dry vacuum pump, so that the accommodating space subjected to vacuum pumping does not contain oil or moisture.
TW102103903A 2013-02-01 2013-02-01 Negative pressure dust-free alignment mechanism TW201432080A (en)

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US7338909B2 (en) * 2004-06-18 2008-03-04 Taiwan Semiconductor Manufacturing Co. Ltd. Micro-etching method to replicate alignment marks for semiconductor wafer photolithography
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