TW201426770A - Optical member with transparent conductive layer - Google Patents

Abstract

This invention provides an optical member with a transparent conductive layer in which the transparent conductive layer is difficult to visually discern. The optical member (1) with a transparent conductive layer is provided with: a high refractive index dielectric layer (21); a patterned transparent conductive layer (23); and a low refractive index dielectric layer (22). The refractive index of the high refractive index dielectric layer (21) is 1.65 to 1.95. The transparent conductive layer (23) is arranged on top of the high refractive index dielectric layer (21). The low refractive index dielectric layer (22) is arranged between the transparent conductive layer (23) and the high refractive index dielectric layer (21). The low refractive index dielectric layer (22) has a lower refractive index than both the transparent conductive layer (23) and the high refractive index dielectric layer (21).

Description

Optical member with transparent conductive layer

The present invention relates to an optical member with a transparent conductive layer.

Previously, for example, a touch panel or the like used an optical film having a patterned transparent conductive layer. Such an optical film has a problem that the patterned transparent conductive layer is visually recognized, and the appearance of the touch panel is deteriorated.

In view of this, Patent Document 1 proposes to reduce the portion in which the transparent conductive layer is provided by disposing the first and second transparent dielectric layers having a specific refractive index and thickness between the film substrate and the transparent conductive layer. The difference in reflectance from the portion where the transparent conductive layer is not provided is difficult for the transparent conductive layer to be visually recognized. Specifically, in the transparent conductive film described in Patent Document 1, the first transparent dielectric layer, the second transparent dielectric layer, and the transparent conductive layer are sequentially formed from the transparent film substrate side. The refractive index n1 of the first transparent dielectric layer is greater than the refractive index n3 of the transparent conductive layer. The refractive index n3 of the transparent conductive layer is greater than the refractive index n2 of the second transparent dielectric layer. Specifically, n1 is 2.0 to 2.3. N2 is 1.4~1.5. N3 is 1.9~2.1. The thickness of the first transparent dielectric layer is 2 nm to 10 nm. The thickness of the second transparent dielectric layer is 20 nm to 55 nm. The transparent conductive layer has a thickness of 15 nm to 30 nm.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent No. 4966924

It is desirable that the transparent conductive layer is further difficult to be visualized, achieving a more excellent appearance.

The main object of the present invention is to provide an optical member with a transparent conductive layer which is difficult to be visually recognized by a transparent conductive layer.

The optical member with a transparent conductive layer of the present invention comprises a high refractive index dielectric layer, a patterned transparent conductive layer, and a low refractive index dielectric layer. The refractive index of the high refractive index dielectric layer is 1.65 to 1.95. The transparent conductive layer is disposed over the high refractive index dielectric layer. The low refractive index dielectric layer is disposed between the transparent conductive layer and the high refractive index dielectric layer. The refractive index of the low refractive index dielectric layer is lower than that of each of the transparent conductive layer and the high refractive index dielectric layer.

The optical member with a transparent conductive layer of the present invention may further include a second high refractive index dielectric layer and a second low refractive index dielectric layer. The second high refractive index dielectric layer is disposed between the transparent conductive layer and the low refractive index dielectric layer, and has a refractive index of 1.65 or more. The second low refractive index dielectric layer is disposed between the transparent conductive layer and the second high refractive index dielectric layer, and has a refractive index higher than that of the transparent conductive layer, the high refractive index dielectric layer, and the second high refractive index dielectric layer. Lower.

Preferably, the refractive index of the high refractive index dielectric layer is equal to or lower than the refractive index of the second high refractive index dielectric layer.

Preferably, the high refractive index dielectric layer and/or the second high refractive index dielectric layer has a thickness of 10 nm or more.

Preferably, the refractive index of the high refractive index dielectric layer and/or the second high refractive index dielectric layer is 1.7 or more.

The high refractive index dielectric layer and/or the second high refractive index dielectric layer may further include a composite oxide containing at least one selected from the group consisting of Ta, Nb, Zr, and Ti and Si.

Preferably, the refractive index of the low refractive index dielectric layer and/or the second low refractive index dielectric layer is 1.6 or less.

The low refractive index dielectric layer and/or the second low refractive index dielectric layer may also include ruthenium oxide.

Preferably, the thickness of the low refractive index dielectric layer and/or the second low refractive index dielectric layer is 10 nm or more.

Preferably, the transparent conductive layer has a refractive index of 1.7 to 2.2.

Preferably, the transparent conductive layer has a thickness of 15 nm to 200 nm.

Preferably, the thickness and the refractive index of each of the high refractive index dielectric layer, the second high refractive index dielectric layer, the low refractive index dielectric layer, and the second low refractive index dielectric layer are not set to a high refractive index Compared with the case of the dielectric layer, the second high refractive index dielectric layer, the low refractive index dielectric layer, and the second low refractive index dielectric layer, the light reflectance in the region where the transparent conductive layer is provided is not provided with transparent conductive The difference in the light reflectance in the region of the layer is set to be small.

Preferably, the optical member with a transparent conductive layer of the present invention is applied over the high refractive index dielectric layer or the second high refractive index dielectric layer, and the reflection inhibiting layer is disposed to cover the transparent conductive layer.

According to the present invention, it is possible to provide an optical member with a transparent conductive layer which is difficult to be recognized by a transparent conductive layer.

1, 2‧‧‧ optical components

10‧‧‧Substrate

11‧‧‧ glass plate

12‧‧‧Oxide layer

21‧‧‧High refractive index dielectric layer

22‧‧‧Low-refractive-index dielectric layer

23‧‧‧Transparent conductive layer

24‧‧‧2nd high refractive index dielectric layer

25‧‧‧2nd low refractive index dielectric layer

31‧‧‧Adhesive layer

32‧‧‧ glass plate

33‧‧‧Reflection suppression layer

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an optical member with a transparent conductive layer according to an embodiment of the present invention.

Fig. 2 is a schematic cross-sectional view showing an example of the use of an optical member with a transparent conductive layer according to an embodiment of the present invention.

3 is a view showing a refractive index and a high refractive index dielectric of a high refractive index dielectric layer when a difference in reflectance between wavelengths of 400 nm and 800 nm is minimized between a region in which a transparent conductive layer is disposed and a region in which a transparent conductive layer is not provided. A graph of the relationship between the thicknesses of the layers.

Figure 4 is a schematic cross-sectional view showing an optical member with a transparent conductive layer according to another embodiment of the present invention.

Figure 5 is a view showing an optical member with a transparent conductive layer according to another embodiment of the present invention. A sketched profile of an example of a use case.

Hereinafter, an example of a preferred embodiment for carrying out the invention will be described. However, the following embodiments are merely illustrative. The present invention is not limited to the following embodiments.

In the drawings, which are referred to in the embodiments and the like, members having substantially the same functions are referred to by the same reference numerals. Further, the drawings referred to in the embodiments and the like are schematically described. The ratio of the size of the object depicted in the drawing, etc., may be different from the ratio of the size of the actual object. Between the drawings, there are also cases where the size ratio of the objects is different. The specific size ratio of the object should be judged by referring to the following description.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an optical member 1 with a transparent conductive layer according to an embodiment of the present invention.

As shown in FIG. 1, the optical member 1 is provided with the base material 10. The base material 10 is not particularly limited as long as it has light transmittance. In the present embodiment, the substrate 10 has a glass plate 11 and a ruthenium oxide layer 12 provided on the glass plate 11. The ruthenium oxide layer 12 may have, for example, a function as an alkali barrier layer when the glass plate 11 contains an alkali, or a function as an adhesion layer for improving the adhesion between the high refractive index dielectric layer 21 and the substrate 10 described below. Wait. However, the substrate 10 may be formed of, for example, only a glass plate. Further, the substrate 10 may be formed of a resin plate or a resin plate having a hard coat layer or the like formed on the surface thereof.

The shape of the substrate 10 is not particularly limited. In the present embodiment, the substrate 10 has a plate shape.

A high refractive index dielectric layer 21 is disposed over the substrate 10. The refractive index of the high refractive index dielectric layer 21 is 1.65 to 1.95. The refractive index of the high refractive index dielectric layer 21 is preferably 1.7 or more, more preferably 1.75 or more. The refractive index of the high refractive index dielectric layer 21 is preferably 1.9 or less, more preferably 1.85 or less.

The constituent material of the high refractive index dielectric layer 21 is not particularly limited as long as the refractive index is 1.65 to 1.95. The high refractive index dielectric layer 21 can be formed, for example, by a composite oxide containing at least one selected from the group consisting of Ta, Nb, Zr, and Ti and Si. As a package Specific examples of the composite oxide containing at least one selected from the group consisting of Ta, Nb, Zr, and Ti and Si include a composite oxide of Nb and Si, a composite oxide of Ti and Si, and Zr and Si. A composite oxide, a composite oxide of Ta and Si, or the like. The high refractive index dielectric layer 21 preferably includes an atomic ratio of at least one selected from the group consisting of Ta, Nb, Zr, and Ti to Si (selected from at least one of Ta, Nb, Zr, and Ti) A: Si) is a composite oxide of 15:85 to 80:20, more preferably a composite oxide having an atomic ratio of 25:75 to 70:30.

The thickness of the high refractive index dielectric layer 21 is preferably 10 nm or more, and more preferably 12 nm or more. The thickness of the high refractive index dielectric layer 21 is preferably 40 nm or less, more preferably 35 nm or less.

A transparent conductive layer 23 is disposed on the high refractive index dielectric layer 21. The transparent conductive layer 23 is patterned. Therefore, the transparent conductive layer 23 is disposed on a portion of the high refractive index dielectric layer 21, and the remaining portion of the high refractive index dielectric layer 21 is not covered by the transparent conductive layer 23.

The transparent conductive layer 23 can be formed, for example, by a transparent conductive oxide. Specifically, the transparent conductive layer 23 may be formed of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), or the like.

When the transparent conductive layer 23 is formed of a transparent conductive oxide, the refractive index of the transparent conductive layer 23 is usually about 1.7 to 2.2. Further, from the viewpoint of reducing the sheet resistance, the thickness of the transparent conductive layer 23 is usually about 15 to 200 nm. If the transparent conductive layer 23 is too thick, the absorption of light becomes large. Therefore, the thickness of the transparent conductive layer 23 is more preferably 50 nm or less, further preferably 30 nm or less.

A low refractive index dielectric layer 22 is disposed between the transparent conductive layer 23 and the high refractive index dielectric layer 21. The low refractive index dielectric layer 22 is disposed across a region where the transparent conductive layer 23 is provided and a region where the transparent conductive layer 23 is not provided. In the present embodiment, the low refractive index dielectric layer 22 is provided on substantially the entire entirety of the high refractive index dielectric layer 21 including the region in which the transparent conductive layer 23 is provided. Therefore, the high refractive index dielectric layer 21 is not exposed from the low refractive index dielectric layer 22. The surface of the optical member 1 is formed by the low refractive index dielectric layer 22 and the transparent conductive layer 23.

The refractive index of the low refractive index dielectric layer 22 is lower than the refractive index of the transparent conductive layer 23 and lower than the refractive index of the high refractive index dielectric layer 21. The refractive index of the low refractive index dielectric layer 22 is preferably 1.6 or less, more preferably 1.55 or less. The refractive index of the low refractive index dielectric layer 22 is usually 1.38 or more.

The low refractive index dielectric layer 22 can be formed by, for example, ruthenium oxide, magnesium fluoride, ruthenium fluoride, or the like. The thickness of the low refractive index dielectric layer 22 is preferably 10 nm or more, and more preferably 20 nm or more. The thickness of the low refractive index dielectric layer 22 is preferably 55 nm or less, preferably 50 nm or less.

Fig. 2 is a schematic cross-sectional view showing an example of the use of the optical member 1.

As shown in FIG. 2, the optical member 1 can be used in such a manner that the surface on the side of the transparent conductive layer 23 is adhered to the glass plate 32 by the adhesive layer 31. Generally, the refractive index of the adhesive layer 31 is the same as that of the glass plate 32. Preferably, on the surface of the glass plate 32 opposite to the optical member 1, a reflection suppressing layer 33 for suppressing light reflection from the surface is provided. That is, it is preferable that the reflection suppressing layer 33 is provided on the high refractive index dielectric layer 21 so as to cover the transparent conductive layer 23. The reflection suppressing layer 33 can be formed, for example, by a dielectric multilayer film in which a low refractive index layer having a relatively low refractive index and a high refractive index layer having a relatively high refractive index are alternately laminated.

The thickness and refractive index of each of the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are transparent as compared with the case where the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are not provided. The difference between the light reflectance in the region of the conductive layer 23 and the light reflectance in the region where the transparent conductive layer 23 is not provided is set to be small. The thickness and refractive index of each of the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are preferably in the visible wavelength region (400 nm to 800 nm), and the light reflectance in the region where the transparent conductive layer 23 is provided. The setting is made such that the difference in light reflectance in the region where the transparent conductive layer 23 is not provided is minimized. This is because the transparent conductive layer 23 is difficult to be visually recognized. Preferably, the thickness and the refractive index of each of the high refractive index dielectric layer 21 and the low refractive index dielectric layer 22 are in the visible wavelength region (400 nm to 800 nm) to provide light in the region of the transparent conductive layer 23. Reflectance and area where the transparent conductive layer 23 is not provided The difference between the light reflectances in the domain is set to 0.5% or less, and more preferably, the difference is set to 0.3% or less.

Tables 1 to 4 below show design examples of the optical member 1. In addition, in Tables 1 to 4, "the difference in reflectance at a wavelength of 550 nm" is a difference in reflectance between a region where the transparent conductive layer is provided at a wavelength of 550 nm and a region where the transparent conductive layer is not provided. The "reflectance difference at a wavelength of 550 nm" shown in Tables 1 to 4 is a data of the difference in reflectance when the refractive index of the medium on the transparent conductive layer is 1.5. The ratio shown in the column of the material of the high refractive index dielectric layer is an atomic ratio.

Further, in the case where the high refractive index dielectric layer 21 is a composite oxide of Ti and Si, in order to make the refractive index of the high refractive index dielectric layer 21 1.65 to 1.95, it is only necessary to make Ti:Si 15:85~ It can be around 45:55. In the case where the high refractive index dielectric layer 21 is a composite oxide of Nb and Si, in order to make the refractive index of the high refractive index dielectric layer 21 1.65 to 1.95, the Nb:Si is 30:70 to 70:30. Just left and right. In the case where the high refractive index dielectric layer 21 is a composite oxide of Zr and Si, in order to make the refractive index of the high refractive index dielectric layer 21 1.65 to 1.95, it is only necessary to make Zr:Si 25:75 to 70:30. Just left and right. In the case where the high refractive index dielectric layer 21 is a composite oxide of Ta and Si, in order to make the refractive index of the high refractive index dielectric layer 21 1.65 to 1.95, it is necessary to make Ta:Si 40:60 to 80:20. Just left and right.

3 shows the refractive index and the high refractive index of the high refractive index dielectric layer 21 when the difference in reflectance between the region where the transparent conductive layer 23 is provided and the region where the transparent conductive layer 23 is not provided is minimized. A graph of the relationship between the thicknesses of the refractive index dielectric layers 21. Furthermore, the graph shown in Fig. 3 is a graph of the following conditions.

Refractive index of transparent conductive layer 23: 1.83

Thickness of transparent conductive layer 23: 18 nm

Refractive index of glass plate 11: 1.5

Refractive index of yttrium oxide layer 12: 1.47

Thickness of the yttrium oxide layer 12: 10 nm

According to the results shown in FIG. 3, in the case where the refractive index of the high refractive index dielectric layer exceeds 1.95, in order to make the transparent conductive layer difficult to be visually recognized, the thickness of the high refractive index dielectric layer must be less than 10 nm. However, in the case where the thickness is less than 10 nm, it is difficult to form a uniform high refractive index dielectric layer. Moreover, it is difficult to form the high refractive index dielectric layer to a desired thickness. Further, if the thickness of the formed high refractive index dielectric layer deviates from the design value, the optical characteristics of the high refractive index dielectric layer largely change. Therefore, it is difficult to stably manufacture an optical member in which the transparent conductive layer is not easily recognized.

On the other hand, if the refractive index of the high refractive index dielectric layer is lower than 1.65, even if the refractive index is high It is also difficult to make the difference in light reflectance in the region where the transparent conductive layer is provided and the region where the transparent conductive layer is not provided smaller in the thickness of the transmittance dielectric layer.

On the other hand, in the optical member 1 having a refractive index of 1.65 to 1.95 in the high refractive index dielectric layer 21, the transparent conductive layer 23 can be provided by providing the high refractive index dielectric layer 21 having a thickness of 10 nm or more. The difference in light reflectance between the region and the region where the transparent conductive layer 23 is not provided becomes small. Moreover, since the thickness of the high refractive index dielectric layer 21 can be made 10 nm or more, it is easy to form the high refractive index dielectric layer 21 having a uniform thickness. That is, when the thickness of the formed high refractive index dielectric layer is deviated from the design value, the optical characteristics of the high refractive index dielectric layer are also difficult to change. Therefore, the optical member 1 in which the transparent conductive layer 23 is hard to be seen can be easily and stably manufactured.

The refractive index of the high refractive index dielectric layer 21 is preferably 1.7 or more, and more preferably 1.75 or more, from the viewpoint that the transparent conductive layer 23 is more difficult to be visually recognized.

As shown in FIG. 2, in the case where the reflection suppressing layer 33 is provided over the high refractive index dielectric layer 21 so as to cover the transparent conductive layer 23, the region in which the transparent conductive layer 23 is provided and the transparent conductive layer 23 are not provided. The ratio of the reflectance of the area is relatively large. Therefore, in order to make the difference in light reflectance between the region in which the transparent conductive layer 23 is provided and the region in which the transparent conductive layer 23 is not provided is more clearly recognized, it is more preferable that the refractive index of the high refractive index dielectric layer 21 is 1.65. ~1.95.

Further, unlike the optical member 1, it is also considered to sequentially laminate a low refractive index dielectric layer, a high refractive index dielectric layer, and a transparent conductive layer. However, in this case, the difference in light reflectance between the region in which the transparent conductive layer is provided and the region in which the transparent conductive layer is not provided cannot be sufficiently made small.

Fig. 4 is a schematic cross-sectional view showing an optical member 2 with a transparent conductive layer according to another embodiment of the present invention. In the present embodiment, as in the embodiment shown in FIG. 1, the substrate 10, the high refractive index dielectric layer 21 provided on the substrate 10, and the low refractive index dielectric layer 21 are provided. The refractive index dielectric layer 22 and the transparent electrode layer 23 disposed on the low refractive index dielectric layer 22. In the present embodiment, as shown in FIG. 4, a second high refractive index dielectric layer 24 and a second low refractive index are provided between the low refractive index dielectric layer 22 and the transparent electrode layer 23. Dielectric layer 25. The second high refractive index dielectric layer 24 is disposed on the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 is disposed on the second high refractive index dielectric layer 24.

Further, by including the second high refractive index dielectric layer 24 and the second low refractive index dielectric layer 25, the transparent conductive layer 23 can be further difficult to be visually recognized.

The refractive index of the second high refractive index dielectric layer 24 is preferably 1.65 or more, more preferably 1.7 or more, still more preferably 1.75 or more. The refractive index of the second high refractive index dielectric layer 24 is preferably 2.2 or less, more preferably 1.9 or less, still more preferably 1.85 or less. As described above, the refractive index of the high refractive index dielectric layer 21 is preferably equal to or lower than the refractive index of the second high refractive index dielectric layer 24. Therefore, the refractive index of the second high refractive index dielectric layer 24 is preferably equal to or higher than the refractive index of the high refractive index dielectric layer 21.

The second high refractive index dielectric layer 24 can be formed, for example, by a composite oxide containing at least one selected from the group consisting of Ta, Nb, Zr, and Ti and Si. Specific examples of the composite oxide containing at least one selected from the group consisting of Ta, Nb, Zr, and Ti and Si include a composite oxide of Nb and Si, a composite oxide of Ti and Si, and Zr and Si. A composite oxide, a composite oxide of Ta and Si, or the like. The second high refractive index dielectric layer 24 preferably includes at least one selected from the group consisting of Ta, Nb, Zr, and Ti and an atomic ratio of Si (selected from at least a group consisting of Ta, Nb, Zr, and Ti) A: Si) is a composite oxide of 15:85 to 80:20, more preferably a composite oxide having an atomic ratio of 25:75 to 70:30.

The thickness of the second high refractive index dielectric layer 24 is preferably 10 nm or more, and more preferably 12 nm or more. The thickness of the second high refractive index dielectric layer 24 is preferably 40 nm or less, more preferably 35 nm or less.

The refractive index of the second low refractive index dielectric layer 25 is lower than the refractive index of the transparent conductive layer 23 and lower than the refractive index of the high refractive index dielectric layer 21, and lower than the refractive index of the second high refractive index dielectric layer 24. rate. The refractive index of the second low refractive index dielectric layer 25 is preferably 1.6 or less, more preferably 1.55 or less. The refractive index of the second low refractive index dielectric layer 25 is usually 1.38 or more.

The second low refractive index dielectric layer 25 can be made of, for example, yttrium oxide, magnesium fluoride, barium fluoride or the like. The thickness of the second low refractive index dielectric layer 25 is preferably 10 nm or more, and more preferably 20 nm or more. The thickness of the second low refractive index dielectric layer 25 is preferably 60 nm or less, more preferably 55 nm or less.

Fig. 5 is a schematic cross-sectional view showing an example of the use of the optical member 2.

As shown in FIG. 5, the second high refractive index dielectric layer 24 and the second low refractive index dielectric layer 25 are provided between the low refractive index dielectric layer 22 and the transparent electrode layer 23, and other figures are shown. The optical member 1 shown in Fig. 2 is used in the same manner. A reflection suppressing layer 33 is provided on the second high refractive index dielectric layer 24 so as to cover the transparent conductive layer 23.

The thickness and refractive index of each of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are not set to a high refractive index The light reflectance in the region where the transparent conductive layer 23 is provided compared to the case where the dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are provided The setting is made such that the difference in light reflectance in the region where the transparent conductive layer 23 is not provided becomes small. Preferably, the thickness and refractive index of each of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are visible. The wavelength region (400 nm to 800 nm) is set such that the difference between the light reflectance in the region where the transparent conductive layer 23 is provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is minimized. This is because the transparent conductive layer 23 is difficult to be visually recognized. Preferably, the thickness and refractive index of each of the high refractive index dielectric layer 21, the second high refractive index dielectric layer 24, the low refractive index dielectric layer 22, and the second low refractive index dielectric layer 25 are visible. The wavelength region (400 nm to 800 nm) is set so that the difference between the light reflectance in the region where the transparent conductive layer 23 is provided and the light reflectance in the region where the transparent conductive layer 23 is not provided is 0.5% or less, and more preferably The setting is performed such that the difference is 0.3% or less.

Tables 5 to 7 below show design examples of the optical member 2. In addition, in Tables 5 to 7, "the maximum reflectance difference (400-800 nm)" is set in the region of the wavelength of 400 to 800 nm. The difference in reflectance between the region of the transparent conductive layer and the region where the transparent conductive layer is not provided is the difference in reflectance at which the wavelength is the largest. The "average reflectance difference (400-800 nm)" is an average of absolute values of reflectance differences between a region in which a transparent conductive layer is provided in a region having a wavelength of 400 to 800 nm and a region in which a transparent conductive layer is not provided. The "maximum reflectance difference (400-800 nm)" and "average reflectance difference (400-800 nm)" shown in Tables 5 to 7 are reflections when the refractive index of the medium above the transparent conductive layer is 1.5. Information on the rate difference. The ratio shown in the column of the material of the high refractive index dielectric layer and the second high refractive index dielectric layer is an atomic ratio.

1‧‧‧Optical components

10‧‧‧Substrate

11‧‧‧ glass plate

12‧‧‧Oxide layer

21‧‧‧High refractive index dielectric layer

22‧‧‧Low-refractive-index dielectric layer

23‧‧‧Transparent conductive layer

Claims (13)

An optical member with a transparent conductive layer, comprising: a high refractive index dielectric layer having a refractive index of 1.65 to 1.95; a transparent conductive layer disposed on the high refractive index dielectric layer and patterned; The low refractive index dielectric layer is disposed between the transparent conductive layer and the high refractive index dielectric layer, and has a lower refractive index than each of the transparent conductive layer and the high refractive index dielectric layer. The optical member with a transparent conductive layer according to claim 1, further comprising: a second high refractive index dielectric layer disposed between the transparent conductive layer and the low refractive index dielectric layer and having a refractive index of 1.65 or more And a second low refractive index dielectric layer disposed between the transparent conductive layer and the second high refractive index dielectric layer, and having a refractive index higher than the transparent conductive layer, the high refractive index dielectric layer, and the first 2 Each of the high refractive index dielectric layers is lower. An optical member comprising a transparent conductive layer according to claim 2, wherein a refractive index of said high refractive index dielectric layer is lower than a refractive index of said second high refractive index dielectric layer. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the high refractive index dielectric layer and/or the second high refractive index dielectric layer has a thickness of 10 nm or more. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the high refractive index dielectric layer and/or the second high refractive index dielectric layer has a refractive index of 1.7 or more. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the high refractive index dielectric layer and/or the second high refractive index dielectric layer comprises a composite oxide, the composite oxide comprising At least one of the groups consisting of free Ta, Nb, Zr, and Ti One with Si. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the low refractive index dielectric layer and/or the second low refractive index dielectric layer has a refractive index of 1.6 or less. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the low refractive index dielectric layer and/or the second low refractive index dielectric layer comprises ruthenium oxide. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the low refractive index dielectric layer and/or the second low refractive index dielectric layer has a thickness of 10 nm or more. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the transparent conductive layer has a refractive index of 1.7 to 2.2. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the transparent conductive layer has a thickness of 15 nm to 200 nm. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein said high refractive index dielectric layer, said second high refractive index dielectric layer, said low refractive index dielectric layer, and said second low a thickness and a refractive index of each of the refractive index dielectric layers, and the high refractive index dielectric layer, the second high refractive index dielectric layer, the low refractive index dielectric layer, and the second low refractive index are not provided In the case of the dielectric layer, the difference between the light reflectance in the region where the transparent conductive layer is provided and the light reflectance in the region where the transparent conductive layer is not provided is set to be smaller. The optical member with a transparent conductive layer according to any one of claims 1 to 3, wherein the high refractive index dielectric layer or the second high refractive index dielectric layer is disposed over the transparent conductive layer Reflection suppression layer.